WO2023145421A1 - Carte de test et appareil de fabrication de caméra - Google Patents

Carte de test et appareil de fabrication de caméra Download PDF

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Publication number
WO2023145421A1
WO2023145421A1 PCT/JP2023/000362 JP2023000362W WO2023145421A1 WO 2023145421 A1 WO2023145421 A1 WO 2023145421A1 JP 2023000362 W JP2023000362 W JP 2023000362W WO 2023145421 A1 WO2023145421 A1 WO 2023145421A1
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WO
WIPO (PCT)
Prior art keywords
slope
camera
block
light
test chart
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Application number
PCT/JP2023/000362
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English (en)
Japanese (ja)
Inventor
真人 根岸
Original Assignee
Ｃｃｔｅｃｈ Ｊａｐａｎ株式会社
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Application filed by Ｃｃｔｅｃｈ Ｊａｐａｎ株式会社 filed Critical Ｃｃｔｅｃｈ Ｊａｐａｎ株式会社
Publication of WO2023145421A1 publication Critical patent/WO2023145421A1/fr

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28—Systems for automatic generation of focusing signals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B17/00—Details of cameras or camera bodies; Accessories therefor
    • G03B17/02—Bodies
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60—Control of cameras or camera modules

Definitions

  • Test Chart A test chart 10 according to the present embodiment will be described with reference to FIGS. 1 and 2.
  • the optical axis direction of the optical system 220 is referred to as the "Z direction" with reference to the camera 20 when the test chart 10 is arranged in the camera manufacturing apparatus 1 (from the test chart 10 toward the camera 20).
  • the X direction one of the pixel arrangement directions of the image pickup device 240 perpendicular to the optical axis of the optical system 220
  • the pixel arrangement direction of the image pickup device 240 is perpendicular to the optical axis of the optical system 220.
  • the other direction, which is orthogonal to the X direction is sometimes referred to as the "Y direction”.
  • the rotation direction about the Z direction is called “ ⁇ Z direction”
  • the rotation direction about the X direction is called “ ⁇ X direction”
  • the rotation direction about the Y direction is called “ ⁇ Y direction”. That's what it means.
  • the test chart 10 of this embodiment has, for example, a three-dimensional structure (three-dimensional structure).
  • the test chart 10 has, for example, a pattern 160 on the slope 140 that is used for adjusting the positions of the optical system 220 and the imaging device 240 in the camera 20 .
  • test chart 10 of this embodiment has, for example, a support plate 190, a three-dimensional block (3D block) 110, and a light shielding portion 150.
  • the support plate 190 is configured as, for example, a plate-like member and configured to support the 3D block 110 .
  • the support plate 190 is made of, for example, black-painted aluminum alloy in order to block the entry of external light, such as room illumination light.
  • the shape of the support plate 190 in plan view is, for example, a quadrangle (rectangle).
  • the support plate 190 is configured to be supported (fixed) by the chart support section 310 in the camera manufacturing apparatus 1, which will be described later.
  • the support plate 190 may have, for example, a fixed portion (not shown) that is fixed at a predetermined position of the chart support portion 310 .
  • Examples of the fixed portion include through holes through which bolts are inserted.
  • the 3D block 110 is provided, for example, on a support plate 190 and has a three-dimensional structure.
  • the 3D block 110 of this embodiment is configured as, for example, a cone.
  • Examples of the pyramid formed by the 3D block 110 include a polygonal pyramid (a triangular pyramid, a quadrangular pyramid, etc.) or a cone.
  • the 3D block 110 is configured as, for example, a quadrangular pyramid (regular quadrangular pyramid).
  • the bottom surface of the 3D block 110 is, for example, in contact with the top surface of the support plate 190 and fixed to the support plate 190 .
  • the shape of the base is, for example, a square with four orthogonal bases.
  • the vertex 120 is provided at a predetermined height from the support plate 190, for example.
  • the slope 140 connects, for example, the base and the vertex 120, and is inclined with respect to the normal direction of the bottom.
  • the test chart 10 is supported by the chart support section 310 described later so that the slope 140 is inclined with respect to the optical axis of the optical system 220 of the camera 20 to be adjusted.
  • each of the four slopes 140 is, for example, an isosceles triangle.
  • the slope 140 has, for example, a pattern 160 from which light is emitted.
  • the “pattern 160” referred to here means a pattern or pattern that can be captured by the camera 20 .
  • the “pattern 160 from which light is emitted” here means the case where the light from the bottom side of the 3D block 110 is transmitted through the pattern 160 and emitted, and the case where the 3D block 110 is irradiated from the camera 20 side. and when the light is reflected and emitted by the pattern 160 .
  • the pattern 160 in this embodiment is, for example, the former.
  • "light is emitted” means that light is emitted in all directions except for the 3D block 110, for example.
  • the plurality of patterns 160 may not necessarily have point symmetry.
  • the influence that the orientation of the optical system 220 of the camera 20 before adjustment is not facing the front or the influence of distortion aberration of the optical system 220 can be considered.
  • a plurality of 3D blocks 110 are provided.
  • the plurality of 3D blocks 110 includes, for example, a central block 110a and four outer blocks 110b. Note that, hereinafter, adjacent 3D blocks 110 may be referred to as "neighboring blocks”.
  • the outer block 110b is arranged, for example, at a position away from the center of the field of view of the camera 20, that is, at a position away from the center of the support plate 190.
  • four outer blocks 110b are arranged near the four corners of the support plate 190, respectively.
  • the outer block 110b is configured as, for example, a quadrangular pyramid, but has a shape modified from a regular quadrangular pyramid.
  • the test chart 10 is arranged so that the vertex 120 is positioned at the center of the outer block 110b when the camera 20 takes an image. That is, even if there is distortion in the optical system 220 of the camera 20, the vertex 120 of the outer block 110b is provided at a position biased toward the center of the support plate 190 in real space.
  • the test chart 10 is arranged so as to be positioned in the center of the block 110b.
  • a light blocking portion 150 is provided between a first slope 140 and a second slope 140 adjacent to the first slope 140. As shown in FIG.
  • the light blocking part 150 is configured, for example, to block light from at least the pattern 160 of the first slope 140 toward the second slope 140 .
  • first and second slopes 140 and 140 mean that they are non-parallel to each other and are arranged at a short distance without any member other than the light shielding section 150 interposed therebetween.
  • first slope 140 and the second slope 140 are arranged so that the light from each pattern 160 can enter the other slope 140 if the light shielding portion 150 is absent.
  • the light shielding portion 150 By providing the light shielding portion 150 in this way, it is possible to prevent the light emitted from the pattern 160 of the first slope 140 from overlapping (confusing) the pattern 160 of the second slope 140 .
  • the light blocking part 150 is provided, for example, to block light between the outer block 110b and the 3D block 110 as a neighboring block adjacent to the outer block 110b.
  • the light shielding portions 150 (S2, S3, S5, S6, S1 and S4) are provided. With such a configuration, light traveling from the slope 140 of each outer block 110b to the slope 140 of the neighboring block and light traveling from the slope 140 of the central block 110a to the slope 140 of the outer block 110b as a neighboring block are blocked by each light shielding part. 150 can be blocked.
  • the light blocking section 150 is arranged so as not to block the light directed toward the camera 20 from the patterns 160 of the first slope 140 and the second slope 140, for example.
  • the light shielding part 150 is configured in a plate shape, for example, and arranged so as to be linearly imaged by the camera 20 . That is, the light shielding portion 150 may be arranged obliquely with respect to the normal line of the support plate 190 in real space. With such a configuration, it is possible to stably detect the focal position in each pattern 160 while arranging the light blocking section 150 .
  • test chart 10 is arranged so that the boundary line 162 is linearly inclined with respect to the pixel arrangement direction of the imaging device 240 when the camera 20 captures the image.
  • the inclination angle ⁇ of the boundary line 162 with respect to the pixel array direction is, for example, over 0.02 rad. This makes it possible to interpolate the pixel data of 50 columns and evaluate the index value corresponding to one pixel.
  • increasing the number of columns in the evaluation area ER which will be described later, tends to deteriorate the resolution in the horizontal direction of the image, that is, the resolution in the Z direction of the focal position. That is, the resolution in the horizontal direction of the image tends to deteriorate as the interpolation accuracy improves. Therefore, in practice, the number of columns in the evaluation area ER is 10 or more and 30 or less.
  • the inclination angle ⁇ of the boundary line 162 with respect to the pixel arrangement direction is, for example, approximately 0.79 rad (45°) or less.
  • the camera 20 captures an image
  • the image is affected by the distortion aberration of the optical system 220 .
  • the test chart when the camera 20 captures an image, the test chart is arranged such that the boundary line 162 is shifted with respect to the pixel arrangement direction of the image sensor 240, which is larger than the shift caused only by the distortion aberration of the optical system 220. 10 are placed. That is, the displacement of the boundary line 162 with respect to the pixel array direction when the camera 20 captures an image includes, for example, a component caused by distortion aberration of the optical system 220 and a component linearly inclined with respect to the pixel array direction of the imaging device 240 (linear tilt Also referred to as a component).
  • the width of the slit on the side closer to the camera 20 becomes wider than the width of the slit on the bottom side due to the difference in imaging magnification. Therefore, in one slit, the boundary line 162a on one side and the boundary line 162b on the other side are non-parallel to each other. However, it is preferable that each of the boundary lines 162a and 162b and the pixel arrangement direction intersect in the image even after taking into consideration the influence caused by the difference in the imaging magnification described above.
  • each of the four base sides of the 3D block 110 is aligned with the four sides of the support plate 190 (the orthogonal pixel arrangement of the imaging device 240). direction).
  • the boundary line 162 on each of the slopes 140 is inclined at a predetermined angle ⁇ with respect to the extending direction of one of the four bases in plan view.
  • the pattern 160 on the slope 140 of each 3D block 110 is arranged so as to approach neighboring blocks due to the configuration in which the boundary line 162 is inclined with respect to the base. Even in such a configuration, the provision of the light shielding portion 150 prevents the light emitted from the inclined pattern 160 of the predetermined slope 140 from overlapping (confusing) with the pattern 160 of the neighboring block. can do.
  • FIG. 1 (2) Camera Manufacturing Apparatus Next, a camera manufacturing apparatus 1 according to this embodiment will be described with reference to FIGS. 1 to 6.
  • FIG. 1 (2) Camera Manufacturing Apparatus
  • the camera manufacturing apparatus 1 of this embodiment is configured to adjust the relative positions of the optical system 220 and the imaging element 240 in the camera 20 based on the detection result of the test chart 10, for example. It is Specifically, the camera manufacturing apparatus 1 includes, for example, a chart support section 310, a relay lens 320, a camera support section 340, a camera adjustment mechanism 360, a camera fixing section 380, and a control section 400. ing.
  • the camera 20 adjusted by the camera manufacturing apparatus 1 will be described with reference to FIG.
  • the camera 20 has, for example, an optical system 220, an autofocus mechanism (not shown), an imaging device 240, a circuit board 260, and a connector 280.
  • the optical system 220 has, for example, a lens group (not shown) including at least one lens and a lens barrel (not shown).
  • the lens barrel supports the lens group as a unit.
  • the autofocus mechanism is configured, for example, so that the lens barrel that supports the lens group can move along the optical axis.
  • autofocus mechanisms include actuators such as voice coil motors.
  • the imaging element 240 is configured as, for example, a solid-state image sensor.
  • Examples of the imaging element 240 include a CCD (Charge Coupled Device) or a CMOS (Complementary Metal-Oxide Semiconductor).
  • the imaging element 240 is arranged, for example, at a position orthogonal to the optical axis of the optical system 220 and at which an image is formed via the optical system 220 .
  • the camera manufacturing apparatus 1 adjusts the relative positions of the imaging device 240 and the optical system 220 .
  • the chart support section 310 of the present embodiment has the slope 140 inclined with respect to the optical axis of the optical system 220, and the boundary line 162 and the pixel arrangement direction of the image sensor 240 are not aligned when the camera 20 captures an image. It is configured to support the test chart 10 so that it is parallel.
  • the chart supporter 310 is configured, for example, to screw the test chart 10 in the arrangement described above.
  • the sides of the camera manufacturing apparatus 1 are preferably covered with an opaque acrylic plate or a blackout curtain to block light.
  • the relay lens 320 is configured, for example, to form an image of the test chart 10 at the position of the imaging device 240 .
  • the relay lens 320 is configured as, for example, a convex lens. With such a configuration, the distance between objects in the camera manufacturing apparatus 1 can be shortened.
  • the camera support section 340 is configured, for example, to support at least part of the camera 20 having the optical system 220 and the imaging device 240 at a position where the test chart 10 can be imaged.
  • camera support 340 is configured to support, for example, imaging device 240 , circuit board 260 and connector 280 .
  • a connector 280 of the camera 20 is connected to the camera support portion 340 . Thereby, the test chart 10 can be imaged by the imaging element 240 in the camera manufacturing apparatus 1 .
  • Camera adjustment mechanism 360 is configured to adjust the relative positions of optical system 220 and imaging element 240 based on, for example, the focal position of camera 20 .
  • the camera adjustment mechanism 360 is configured to be able to adjust the optical system 220 in, for example, the Z direction, the X direction, the Y direction, the ⁇ Z direction, the ⁇ X direction, and the ⁇ Y direction. Furthermore, the camera adjustment mechanism 360 may be configured, for example, to be able to adjust the camera support section 340 that supports the imaging element 240 in the X direction and the Y direction.
  • the camera fixing section 380 is configured, for example, to fix the optical system 220 and the imaging device 240 .
  • the camera fixing portion 380 is configured as a light source that emits ultraviolet rays, for example.
  • the optical system 220 and the imaging element 240 can be fixed by irradiating the ultraviolet rays from the camera fixing portion 380 toward the adhesive 262 on the circuit board 260 to cure the adhesive 262 .
  • the control unit 400 is configured, for example, to control each unit of the camera manufacturing apparatus 1 and adjust the camera 20 based on the image of the test chart 10 captured by the camera 20 .
  • the control unit 400 is configured as a computer, and includes, for example, a CPU (Central Processing Unit) 410, a RAM (Random Access Memory) 420, a storage device 430, an I/O It has a port 440 , an input section 450 and a display section 460 .
  • RAM 420 , storage device 430 and I/O port 440 are configured to be able to exchange data with CPU 410 .
  • the I/O port 440 is connected to, for example, the chart light source 312, the camera support section 340, the camera adjustment mechanism 360, and the camera fixing section 380. Note that the I/O port 440 is connected to the imaging device 240 of the camera 20 via the camera support section 340 .
  • the storage device 430 is configured to store, for example, a program related to focus detection of the camera 20, a program for controlling the camera adjustment mechanism 360, an image of the test chart 10, and the like.
  • the storage device 430 is, for example, an HDD (Hard disk drive) or an SSD (Solid State Drive).
  • the RAM 420 is configured to temporarily hold programs, information, etc. read from the storage device 430 by the CPU 410 .
  • the CPU 410 is configured to function as an image analysis section and a camera adjustment control section by executing a predetermined program stored in the storage device 430 .
  • the image analysis unit is configured, for example, to analyze an image obtained by capturing the test chart 10 and detect the focus position of the camera 20 .
  • the camera adjustment control unit is configured to control the camera adjustment mechanism 360 to adjust the relative positions of the optical system 220 and the imaging device 240 based on, for example, the focal position of the camera 20 . The details of the camera manufacturing method by the above-described units will be described later.
  • a predetermined program for realizing each unit described above is used by being installed in a computer configured by the control unit 400, for example.
  • the program may be stored in a computer-readable storage medium and provided, for example, prior to its installation.
  • the program may be provided to the computer through a communication line (optical fiber or the like) connecting with the control unit 400, for example.
  • the display unit 460 is configured to display, for example, an image of the test chart 10 and analysis results.
  • the display unit 460 is, for example, a liquid crystal display, an organic EL (OLED) display, or the like.
  • the input unit 450 is configured, for example, so that the user can input information for performing a predetermined operation to the control unit 400 .
  • the input unit 450 is, for example, a mouse, keyboard, or the like.
  • the patterns 160 of all the 3D blocks 110 are imaged at once. Also, at this time, for example, due to the arrangement of the test chart 10 described above, the boundary line 162 of the test chart 10 and the pixel arrangement direction are not parallel in the image.
  • the focal position of the camera 20 is detected based on the detection result of the boundary line 162 in the captured image of the test chart 10 .
  • an index value (pixel value) of at least one of pixel color, shade, and brightness is obtained.
  • the corrected pixel number d' calculated from a reference line passing through the corner of the evaluation area ER and parallel to the boundary line 162 is obtained. Since the boundary line 162 is inclined at an angle ⁇ with respect to the pixel array direction, the corrected number of pixels d' is obtained by the following equation (1).
  • d' d+n tan ⁇ (1)
  • d is the number of pixels (the number of pixel rows) (unit: pixel) from one end of the evaluation region ER to the pixel array direction (longitudinal direction of the evaluation region ER, vertical direction in the figure) that intersects the boundary line 162 within the evaluation region ER.
  • n is the number of pixel columns in the evaluation area ER.
  • the vertical axis in FIG. 9 is, for example, brightness (luminance) as an index value.
  • the correspondence relationship of the optimum spatial frequency with respect to the center position (L) of each evaluation area ER in the direction along the boundary line 162 is obtained, and the highest spatial frequency is obtained as the peak spatial frequency.
  • the position at which the peak spatial frequency is obtained is specified as the provisional focus position on the boundary line 162 .
  • the tilt angles ⁇ x and ⁇ y of the focal plane of the camera 20 and the center of the focal plane are calculated based on the coordinates B m of the optimum focal position. Find the coordinates of the position (C x , Cy , C z ).
  • the error between each value and the target value is calculate.
  • the error obtained in this way is hereinafter also referred to as "focus error”.
  • the optical system 220 is adjusted in the Z direction, the X direction, the Y direction, the ⁇ Z direction, the ⁇ X direction, and the ⁇ Y direction so that the focus error described above becomes 0 (zero).
  • the focal position of the camera 20 can be detected early based on the captured images of all the patterns 160 in the plurality of 3D blocks 110 .
  • the problem that the light of the patterns 160 on the slopes 140 overlaps as described above may be solved by irradiating light on each 3D block 110 and acquiring an image of the pattern 160 on each slope 140 .
  • image acquisition and analysis are performed by light irradiation for each 3D block 110, the time required for measurement and analysis increases in proportion to the number of 3D blocks 110 concerned.
  • the present embodiment it is possible to suppress the overlap of the light of the patterns 160 on the slopes 140 in an image obtained by once capturing all the patterns 160 in the plurality of 3D blocks 110 .
  • the focus position of the camera 20 can be detected at an early stage while suppressing deterioration in detection accuracy based on only one image in which the overlap of the light of the pattern 160 is suppressed. That is, it is possible to achieve both suppression of deterioration in focus position detection accuracy and shortening of focus position detection time.
  • the light blocking section 150 is arranged, for example, so as not to block light directed toward the camera 20 from the pattern 160 of each of the first slope 140 and the second slope 140 . Thereby, when the camera 20 captures an image of the pattern 160 , it is possible to suppress the loss of the pattern 160 caused by the light shielding portion 150 . As a result, it is possible to stably detect the optimum focus position using the entire pattern 160 while arranging the light blocking portion 150 .
  • the light shielding section 150 is configured in a plate shape and arranged so as to be linearly imaged by the camera 20 . This makes it possible to more stably suppress loss of the pattern 160 caused by the light shielding portion 150 .
  • the vertex 120 of the outer block 110b is provided at a position biased toward the center of the support plate 190 in real space. Due to the shape of the outer block 110b, at least one inclined surface 140 of the outer block 110b is arranged nearly perpendicular to the support plate 190. As shown in FIG. For this reason, the light from the near-perpendicular slope 140 of the outer block 110b is more likely to be directed toward the slope 140 of the neighboring block and more likely to overlap the pattern 160 of the neighboring block.
  • the area of at least one slope 140 of the outer block 110b is widened, and the pattern 160 on the slope 140 is enlarged. For this reason, the light from the wide slope 140 of the outer block 110b is more likely to irradiate the slope 140 of the neighboring block and easily overlap the pattern 160 of the neighboring block.
  • the light shielding portion 150 is provided between the outer block 110b and the neighboring block, so that the light traveling from the near-perpendicular slope 140 of the outer block 110b toward the slope 140 of the neighboring block is blocked. can be blocked. In addition, it is possible to prevent the light from the wide slope 140 of the outer block 110b from irradiating the slope 140 of the adjacent block.
  • the slope 140 is inclined with respect to the optical axis of the optical system 220, and the boundary line 162 and the pixel arrangement direction of the image sensor 240 are not parallel when the camera 20 takes an image.
  • the test chart 10 is arranged.
  • an index value in which the number of corrected pixels d' is shifted by tan ⁇ can be obtained for each row of the evaluation area ER.
  • tan ⁇ 1 that is, ⁇ 0.79 rad (45°)
  • the index value of each pixel can be plotted at a pitch shorter than the pixel pitch. That is, it is possible to virtually shorten the sampling pitch.
  • the focus position (the temporary focus position described above) at the boundary line 162 can be accurately detected.
  • the light shielding portion 150 allows the light from the pattern 160 of the first slope 140 to It is arranged so as to prevent it from overlapping the boundary line 162 .
  • the boundary line 162 is non-parallel to the pixel arrangement direction, the boundary line 162 will be arranged tilted with respect to the base of the 3D block 110 as described above.
  • the pattern 160 on the slope 140 of each 3D block 110 is positioned closer to neighboring blocks.
  • the light from the pattern 160 approaching the neighboring block is more likely to irradiate the slope 140 of the neighboring block and overlap the pattern 160 of the neighboring block.
  • the light shielding portion 150 is provided between the slopes 140 whose boundary lines 162 are non-parallel to the pixel array direction. It is possible to suppress irradiation of the slope 140 of the neighboring block. As a result, even in a situation where the light of the pattern 160 is likely to overlap due to the shape of the boundary line 162 that is not parallel to the pixel arrangement direction, an index value finer than one pixel can be obtained at the boundary line 162. Changes can be accurately grasped. As a result, it becomes possible to stably suppress the deterioration of the detection accuracy of the focus position of the camera 20 .
  • Test Chart A test chart 10 according to this embodiment will be described with reference to FIG.
  • the 3D block 110 has, for example, multiple ridgelines 130 and multiple slopes 140 .
  • the light shielding part 150 is arranged so as not to block the light directed toward the camera 20 from the patterns 160 of the first slope 140 and the second slope 140, for example.
  • the test chart 10 has a plurality of ridgelines 130 arranged radially, and the light shielding portion 150 is provided between a pair of slopes 140 that are in contact with each other other than the ridgelines 130 .
  • the spacing between the patterns 160 of the pair of slopes 140 in contact with each other is narrow. Therefore, the light from the pattern 160 on one slope 140 of the pair of slopes 140 is more likely to irradiate the other slope 140 and overlap the pattern 160 on the other slope 140 more easily.
  • Test Chart A test chart 10 according to this embodiment will be described with reference to FIG.
  • the 3D block 110 of this embodiment is similar to the 3D block 110 of the second embodiment, for example.
  • the 2D block 170 has, for example, at least one boundary line 182 as the 2D pattern 180 .
  • Boundary line 182 forms a boundary of at least one of color, shade, and brightness, for example.
  • test chart 10 has the 3D block 110 and the 2D block 170 , and the light shielding section 150 is provided between the 3D block 110 and the 2D block 170 .
  • the light shielding portion 150 as the auxiliary light shielding portion is provided between the 3D block 110 and the 2D block 170 as described above. can be suppressed from irradiating the slope 140 of the 3D block 110 . As a result, even in a situation where the pattern 160 is likely to overlap due to the arrangement of the 2D blocks 170, it is possible to stably suppress the deterioration of the detection accuracy of the focus position of the camera 20. .
  • the slope 140 of the 3D block 110 has slits as the pattern 160 . It may have a light non-transmissive region and a light transmissive region separated by a .
  • the shape of the light shielding part 150 is not limited as long as the light shielding part 150 does not block the light from each pattern 160 toward the camera 20.
  • the light shielding part 150 is shown to be linearly imaged when captured by a camera, but the shape of the line is not limited as long as the light shielding part 150 is linearly imaged.
  • the light shielding part 150 may be imaged in a curved or bent line, for example.
  • each 3D block 110 has a plurality of slopes 140
  • the present disclosure is not limited to this case.
  • Each 3D block 110 may have only one bevel 140 . Even with such a configuration, by providing the light shielding portion 150 between the plurality of 3D blocks 110, it is possible to suppress the overlap of the light of the pattern 160.
  • FIG. 1 is a diagrammatic representation of the light shielding portion 150 between the plurality of 3D blocks 110.
  • the light shielding portion 150 is provided between a pair of adjacent slopes 140 and the light shielding portion 150 blocks light from the patterns 160 on both of the pair of slopes 140 has been described. , but not limited to this case.
  • the light blocking portion 150 may be configured to block only the light from the pattern 160 on one slope 140 .
  • the light blocking portion 150 is configured not only to block light between the 3D blocks 110, but also as an auxiliary light blocking portion to block light traveling from the 2D block 170 to the 3D block 110.
  • the present disclosure is not limited to this case.
  • a light blocking portion 150 that blocks light between the 3D blocks 110 and an auxiliary light blocking portion that blocks light traveling from the 2D blocks 170 to the 3D blocks 110 may be provided separately.
  • test chart for adjusting a camera, a first beveled surface having a pattern from which light is emitted; a second slope having a light emitting pattern and arranged adjacent to the first slope; a light shielding portion provided between the first slope and the second slope for blocking light from at least the pattern on the first slope toward the second slope; a test chart.
  • Appendix 2 The test chart according to appendix 1, wherein the light shielding part is arranged so as not to block light directed toward the camera from the patterns of the first slope and the second slope.
  • Appendix 3 The test chart according to appendix 1 or appendix 2, wherein the light shielding part is formed in a plate shape and arranged so as to be linearly imaged when the camera takes an image.
  • Appendix 5 Provided at a predetermined height, comprising a plurality of ridges radially arranged around the optical axis of the camera, The first slope is inclined from a first ridgeline of the plurality of ridgelines, The test chart according to any one of appendices 1 to 4, wherein the second slope is inclined from a second edge line adjacent to the first edge line and is in contact with the first slope.
  • (Appendix 9) an outer block positioned away from the center of the field of view of the camera; a neighboring block adjacent to the outer block; with The outer block is a vertex provided at a predetermined height at a position biased toward the center; at least the first slope inclined from the vertex; has the outer block is arranged such that the vertex is positioned at the center of the outer block when the camera captures the image; the neighboring block has at least the second slope; 9.
  • a test chart for adjusting a camera an outer block positioned away from the center of the field of view of the camera; a neighboring block adjacent to the outer block; a light blocking portion that blocks light between the outer block and the neighboring block; with
  • the outer block is a vertex provided at a predetermined height at a position biased toward the center; at least a first sloping surface slanted from the apex and having a pattern in which light is emitted; has the outer block is arranged such that the vertex is positioned at the center of the outer block when the camera captures the image; said neighboring block has at least a second beveled surface having a pattern from which light is emitted and arranged adjacent to said first beveled surface;
  • the light shielding part is provided between the first slope and the second slope, and is provided to block light from at least the first slope of the outer block toward the second slope of the neighboring block.
  • the test chart is a first beveled surface having a pattern from which light is emitted; a second slope having a light emitting pattern and arranged adjacent to the first slope; a light shielding portion provided between the first slope and the second slope for blocking light from at least the pattern on the first slope toward the second slope;
  • a camera manufacturing apparatus comprising:
  • the test chart is a three-dimensional block having a slope; a two-dimensional block arranged orthogonal to the optical axis of the camera and having a two-dimensional pattern from which light is emitted; an auxiliary light shielding part provided between the three-dimensional block and the two-dimensional block for blocking at least light from the two-dimensional pattern toward the slope of the three-dimensional block;
  • a camera manufacturing apparatus comprising:
  • the test chart is an outer block positioned away from the center of the field of view of the camera; a neighboring block adjacent to the outer block; a light blocking portion that blocks light between the outer block and the neighboring block; with The outer block is a vertex provided at a predetermined height at a position biased toward the center; at least a first sloping surface slanted from the apex and having a pattern in which light is emitted; has the outer block is arranged such that the vertex is positioned at the center of the outer block when the camera captures the image; said neighboring block has at least
  • (Appendix 15) preparing a predetermined test chart; a step of capturing an image of the test chart using a camera having an optical system and an imaging device; a step of analyzing an image obtained by capturing the test chart and detecting a focus position of the camera; adjusting the relative positions of the optical system and the imaging device based on the focal position of the camera; has In the step of preparing the test chart, As the test chart, a first beveled surface having a pattern from which light is emitted; a second slope having a light emitting pattern and arranged adjacent to the first slope; a light shielding portion provided between the first slope and the second slope for blocking light from at least the pattern on the first slope toward the second slope; Prepare a chart comprising a camera manufacturing method.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Optics & Photonics (AREA)
  • Studio Devices (AREA)
  • Camera Bodies And Camera Details Or Accessories (AREA)
  • Automatic Focus Adjustment (AREA)

Abstract

La présente invention supprime la diminution de la précision de la détection d'une position de mise au point. Une mire pour le réglage d'une caméra est fournie, comprenant : une première surface inclinée ayant un motif dans lequel la lumière est rayonnée ; une seconde surface inclinée ayant un motif dans lequel la lumière est rayonnée et disposée à côté de la première surface inclinée ; et une partie bloquant la lumière qui est fournie entre la première surface inclinée et la seconde surface inclinée, et qui bloque au moins la lumière se déplaçant du motif de la première surface inclinée vers la seconde surface inclinée.
PCT/JP2023/000362 2022-01-28 2023-01-11 Carte de test et appareil de fabrication de caméra WO2023145421A1 (fr)

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JP2022-011850 2022-01-28
JP2022011850A JP2023110418A (ja) 2022-01-28 2022-01-28 テストチャートおよびカメラ製造装置

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0969973A (ja) * 1994-11-28 1997-03-11 Matsushita Electric Ind Co Ltd 固体撮像素子の位置調整方法
JP2015072444A (ja) * 2013-10-03 2015-04-16 チコニー エレクトロニクス カンパニー リミテッド 立体によるピント調整方法及びそのシステム
WO2020188761A1 (fr) * 2019-03-19 2020-09-24 株式会社Ｐｆａ Dispositif de fabrication de module de caméra et procédé de fabrication de module de caméra

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0969973A (ja) * 1994-11-28 1997-03-11 Matsushita Electric Ind Co Ltd 固体撮像素子の位置調整方法
JP2015072444A (ja) * 2013-10-03 2015-04-16 チコニー エレクトロニクス カンパニー リミテッド 立体によるピント調整方法及びそのシステム
WO2020188761A1 (fr) * 2019-03-19 2020-09-24 株式会社Ｐｆａ Dispositif de fabrication de module de caméra et procédé de fabrication de module de caméra

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