WO2023045667A1 - 液晶手写板、手写系统及手写系统的控制方法 - Google Patents

液晶手写板、手写系统及手写系统的控制方法 Download PDF

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Publication number
WO2023045667A1
WO2023045667A1 PCT/CN2022/114041 CN2022114041W WO2023045667A1 WO 2023045667 A1 WO2023045667 A1 WO 2023045667A1 CN 2022114041 W CN2022114041 W CN 2022114041W WO 2023045667 A1 WO2023045667 A1 WO 2023045667A1
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WIPO (PCT)
Prior art keywords
liquid crystal
photosensitive
substrate
pixel
light
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PCT/CN2022/114041
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English (en)
French (fr)
Inventor
王家星
闫浩
武晓娟
袁洪亮
王建
毕谣
段金帅
葛杨
段智龙
于志强
秦相磊
王修亮
尹晓峰
Original Assignee
京东方科技集团股份有限公司
北京京东方光电科技有限公司
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Publication of WO2023045667A1 publication Critical patent/WO2023045667A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/13306—Circuit arrangements or driving methods for the control of single liquid crystal cells
    • G02F1/13318—Circuits comprising a photodetector
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement

Definitions

  • the present application relates to the field of display technology, in particular to a liquid crystal tablet, a handwriting system and a control method for the handwriting system.
  • a tablet is an electronic device used for writing and drawing.
  • the liquid crystal tablet has the advantages of low power consumption and clear handwriting, and has occupied a large market share in China in recent years.
  • an infrared positioning device In order to be able to partially erase the handwriting displayed on the liquid crystal tablet, it is necessary to integrate an infrared positioning device in the liquid crystal tablet.
  • an erasing tool such as an eraser
  • the position of the erasing tool on the liquid crystal tablet can be determined by an infrared positioning device, so as to determine the position to be erased in the liquid crystal tablet. area.
  • the liquid crystal tablet can control the pixel electrodes in the area to be erased to erase the handwriting in the area to be erased.
  • the positioning accuracy of the infrared positioning device in the liquid crystal writing board is relatively low, which makes the liquid crystal writing board extremely prone to miserasing, and thus results in a poor effect when partially erasing the liquid crystal writing board.
  • Embodiments of the present application provide a liquid crystal tablet, a handwriting system, and a control method for the handwriting system. It can solve the problem of poor effect when partially erasing the liquid crystal tablet in the prior art, and the technical scheme is as follows:
  • a liquid crystal tablet including: a liquid crystal panel, a photosensitive component and a control component;
  • the liquid crystal panel includes: a first substrate and a second substrate oppositely arranged, the first substrate has a plurality of pixel regions, and pixel electrodes located in the pixel regions, and the second substrate has a common electrode;
  • the photosensitive component has a plurality of photosensitive elements, one of the photosensitive elements corresponds to at least one of the pixel areas, and the orthographic projection of the photosensitive elements on the first substrate is at least partly the corresponding at least one of the pixel areas overlap;
  • the control component is electrically connected to the liquid crystal panel and the photosensitive component respectively, and the control component is configured to: detect the position information of the target light irradiating on the liquid crystal panel through the photosensitive component, so as to determine the position information of the pixel area, and apply a pixel voltage to the pixel electrode in the pixel area to be erased, so that a voltage difference is formed between the pixel electrode in the pixel area to be erased and the common electrode.
  • the photosensitive component is located on a side of the first substrate away from the second substrate.
  • the liquid crystal handwriting panel further includes: a black matrix, the black matrix is located between the plurality of pixel electrodes and the plurality of photosensitive elements, the black matrix has a plurality of light holes, and the plurality of Each light through hole is in one-to-one correspondence with the plurality of pixel areas, the orthographic projection of the light through hole on the first substrate is located in the corresponding pixel area, and the photosensitive element is connected to at least one of the light through holes.
  • the orthographic projection of the light through hole on the first substrate at least partially overlaps the orthographic projection of the corresponding photosensitive element on the first substrate.
  • the arrangement direction of any two adjacent light through holes intersects the target direction
  • the The target direction is an arrangement direction of a row of the pixel regions.
  • the plurality of light through holes includes at least one light through hole group, and the distribution position of the orthographic projection of each light through hole in the light through hole group on the first substrate in the corresponding pixel area different.
  • the first substrate includes: a first substrate, and the plurality of pixel electrodes and the plurality of driving thin film transistors TFTs located on the first substrate, the plurality of pixel electrodes and the plurality of driving TFTs TFT one-to-one electrical connection;
  • the black matrix is located on a side of the first substrate away from the second substrate;
  • the black matrix is located on a side of the first substrate facing the second substrate, and the first substrate further includes: a first insulating layer located between the black matrix and the driving TFT.
  • the percentage of the area of the orthographic projection of the light-through hole on the first substrate to the area of the corresponding pixel area ranges from 5% to 20%.
  • the photosensitive component includes: a circuit board, and the plurality of photosensitive elements located on the circuit board, the plurality of photosensitive elements are all electrically connected to the circuit board, and the circuit board is connected to the circuit board Electrically connect the above control components.
  • the photosensitive component is integrated in the first substrate.
  • the photosensitive element is a photosensitive TFT, a plurality of the photosensitive TFTs correspond to the plurality of pixel regions one by one, and the photosensitive TFTs are located in the corresponding pixel regions.
  • the photosensitive component also has a photosensitive signal line electrically connected to the first pole of the photosensitive TFT, and a first sensing line and a second sensing line electrically connected to the second pole of the photosensitive TFT ;
  • control component is electrically connected to the photosensitive signal line, the first sensing line and the second sensing line, and the extension direction of the first sensing line is the same as that of the second sensing line.
  • the direction of extension is vertical.
  • the photosensitive component further has a transfer electrode provided on the same layer as the pixel electrode, and the transfer electrode is respectively electrically connected to the second pole of the photosensitive TFT and the second sensing line.
  • the first substrate includes: a first substrate, and the plurality of pixel electrodes and a plurality of driving TFTs located on the first substrate, the plurality of pixel electrodes and the plurality of driving TFTs
  • the TFTs are electrically connected in one-to-one correspondence, and the plurality of driving TFTs are arranged on the same layer as the plurality of photosensitive TFTs.
  • the liquid crystal panel further includes: a bistable liquid crystal molecular layer located between the first substrate and the second substrate;
  • the bistable liquid crystal molecules in the bistable liquid crystal molecular layer are configured to: change from a focal conic texture to a planar texture after the liquid crystal panel is subjected to external pressure; After a voltage difference is formed between the pixel electrode and the common electrode, the planar texture is transformed into a focal conic texture.
  • a handwriting system including: an erasing tool and the above-mentioned liquid crystal tablet;
  • the erasing tool has a light-emitting component
  • the liquid crystal tablet is configured to: after the light-emitting component of the erasing tool emits target light to the liquid crystal panel, detect the irradiation of the target light through the photosensitive component position information to determine the position information of the pixel area to be erased.
  • a method for controlling a handwriting system which is applied to the above-mentioned handwriting system, and the method includes:
  • the liquid crystal tablet After the light-emitting component of the erasing tool emits target light to the liquid crystal panel, the liquid crystal tablet detects the position information of the target light through the photosensitive component to determine the position information of the pixel area to be erased ;
  • the liquid crystal tablet Based on the position information of the pixel area to be erased, the liquid crystal tablet applies a pixel voltage to the pixel electrode in the pixel area to be erased through the control component, so that the pixel area to be erased A voltage difference is formed between the inner pixel electrode and the common electrode.
  • a liquid crystal tablet includes: a liquid crystal panel, a photosensitive component and a driving component.
  • the handwriting can be erased by using an erasing tool capable of emitting target light. Because the orthographic projection of the photosensitive element in the photosensitive component on the first substrate in the liquid crystal panel at least partially overlaps with the corresponding pixel area. Therefore, after the erasing tool emits the target light to the liquid crystal panel, the photosensitive component can determine the position where the target light irradiates on the liquid crystal panel through at least part of the target light sensed by the photosensitive element, and the position where the target light irradiates on the liquid crystal panel is is the location of the pixel area to be erased.
  • the liquid crystal handwriting panel can apply a pixel voltage to the pixel electrode in the pixel area to be erased through the control component, so as to realize erasing the handwriting in the pixel area to be erased.
  • the photosensitive component will not recognize the area where the user is in contact with the liquid crystal tablet as the pixel area to be erased, thereby reducing the The probability of false erasing on the liquid crystal writing board is reduced, and the erasing effect when the liquid crystal writing board is partially erased is effectively improved.
  • Fig. 1 is the top view of a kind of liquid crystal tablet provided by related art
  • Fig. 2 is the cross-sectional view of the liquid crystal tablet shown in Fig. 1 at A-A ' place;
  • Fig. 3 is the principle diagram that the liquid crystal tablet shown in Fig. 1 presents handwriting
  • Fig. 4 is a schematic structural view of a liquid crystal tablet provided in the embodiment of the present application.
  • Fig. 5 is a schematic structural view of another liquid crystal tablet provided by the implementation of the present application.
  • Fig. 6 is a top view of a first substrate, a black matrix and a photosensitive component after lamination according to an embodiment of the present application;
  • Fig. 7 is the top view of the black matrix in the structure shown in Fig. 6;
  • Fig. 8 is a top view of the photosensitive assembly in the structure shown in Fig. 6;
  • Fig. 9 is a top view of a first substrate provided by an embodiment of the present application.
  • Fig. 10 is a schematic diagram of the film layer structure of the first substrate shown in Fig. 9 at B-B';
  • Fig. 11 is a schematic diagram of another film layer structure at B-B' of the first substrate shown in Fig. 9;
  • Figure 12 is a schematic diagram of the film layer structure of a photosensitive component provided in the embodiment of the present application.
  • Fig. 13 is a schematic structural diagram of another liquid crystal tablet provided by the implementation of the present application.
  • Fig. 14 is a top view of a first substrate provided by an embodiment of the present application and a black film layer after lamination;
  • Fig. 15 is a top view of a pixel region in a first substrate provided by an embodiment of the present application.
  • Fig. 16 is a schematic diagram of the film layer structure of the first substrate shown in Fig. 15 at C-C';
  • Fig. 17 is a structural block diagram of a control component provided by an embodiment of the present application.
  • Fig. 18 is a schematic diagram of the film layer structure of a liquid crystal panel provided in the embodiment of the present application.
  • FIG. 19 is a top view of the first substrate in the liquid crystal panel shown in FIG. 18;
  • Fig. 20 is a schematic structural diagram of a handwriting system provided by an embodiment of the present application.
  • Fig. 21 is a schematic diagram of the product structure of a liquid crystal tablet provided by the embodiment of the present application.
  • Fig. 22 is a flowchart of a control method of a handwriting system provided by an embodiment of the present invention.
  • Fig. 1 is a top view of a liquid crystal tablet provided in the related art
  • Fig. 2 is a cross-sectional view of the liquid crystal tablet shown in Fig. 1 at A-A'.
  • the liquid crystal tablet 00 can generally include: a liquid crystal panel 01 , a black aluminum honeycomb panel 02 and an infrared positioning device 03 .
  • the liquid crystal panel 01 may include: a first substrate 011 and a second substrate 012 disposed opposite to each other, and a liquid crystal layer 013 between them.
  • the first substrate 011 usually has a plurality of pixel electrodes arranged in an array (not shown in the figure), the second substrate 012 has a planar common electrode (not shown in the figure), and the liquid crystal molecules in the liquid crystal layer 013 can be double stable liquid crystal molecules.
  • the black aluminum honeycomb panel 04 is located on the side of the first substrate 011 away from the second substrate 012 .
  • the infrared positioning device 03 is located on the periphery of the liquid crystal panel 01 and the black aluminum honeycomb panel 04.
  • the infrared positioning device 03 needs to protrude from the liquid crystal panel 01 and can emit infrared light to determine the position of the erasing tool on the liquid crystal panel 01.
  • FIG. 3 is a schematic diagram of the liquid crystal tablet shown in FIG. 1 showing handwriting.
  • the writing tool 001 for example, a writing pen
  • the writing tool 001 can apply pressure to the liquid crystal panel 01, so that part of the liquid crystal molecules in the liquid crystal layer 013 in the liquid crystal panel 01 are woven by the focal cone under the action of external pressure. texture into a planar texture.
  • the liquid crystal molecules transformed into planar texture can reflect light of a certain wavelength (for example, green light) in the incident ambient light, so that the liquid crystal tablet can display handwriting.
  • the erasing tool 002 moved on the liquid crystal panel 01, and the liquid crystal handwriting board 00 determined the position of the erasing tool 002 on the liquid crystal panel 01 by the infrared light sent by the infrared positioning device 03, and then The area to be erased can be determined in the liquid crystal tablet 00.
  • the liquid crystal tablet can apply a voltage to the pixel electrodes in the area to be erased, so that a voltage difference can be formed between the pixel electrodes in the area to be erased and the common electrode, and then the liquid crystal molecules in the area to be erased Under the action of voltage difference, the liquid crystal molecules can be rearranged from planar texture to focal conic texture.
  • the liquid crystal molecules transformed into focal conic texture can transmit the incident ambient light, so that the area to be erased can present a black background with the same color as the black aluminum honeycomb panel 04, thereby realizing writing in the area to be erased Handwriting to be erased.
  • the infrared positioning device 03 in the liquid crystal tablet 00 usually needs to distinguish the writing tool 001 and the erasing tool 002, so as to ensure that the writing tool 001 can write on the liquid crystal tablet 00 normally, and ensure that the erasing tool 002 can write on the liquid crystal.
  • the handwriting displayed on board 00 is erased. For this reason, it is necessary to ensure that the surface of the erasing tool 002 in contact with the liquid crystal tablet 00 is much larger than the area in contact with the writing tool 001 and the liquid crystal tablet 00, so that the infrared positioning device 03 can detect the contact area between the object and the liquid crystal tablet 00, and the writing Tool 001 is distinguished from Erase Tool 002.
  • the infrared positioning device 03 can easily recognize the user's hand as the erasing tool 002 , which in turn causes the handwriting displayed in the area where the user's hand is in contact with the liquid crystal tablet 00 to be erased by mistake. In this way, the effect of partial erasing of the liquid crystal tablet 00 is relatively poor.
  • FIG. 4 is a schematic structural diagram of a liquid crystal tablet provided in an embodiment of the present application.
  • the LCD tablet 000 can include:
  • Liquid crystal panel 100 Liquid crystal panel 100 , photosensitive component 200 and control component 300 .
  • the liquid crystal panel 100 may include: a first substrate 101 and a second substrate 102 disposed opposite to each other.
  • the liquid crystal panel 100 may generally further include: a liquid crystal layer 103 located between the first substrate 101 and the second substrate 102 .
  • the liquid crystal layer 103 may be a layer of bistable liquid crystal molecules, that is, the liquid crystal molecules in the liquid crystal layer 103 are bistable liquid crystal molecules.
  • the bistable liquid crystal molecules are configured to change from a focal conic texture to a planar texture when the liquid crystal panel 100 in the liquid crystal tablet 000 is subjected to external pressure.
  • the user when a user writes on the liquid crystal tablet 000 with a writing tool, the user can apply pressure to the liquid crystal panel 100 through the writing tool, so that the bistable liquid crystal molecules in the pressured area of the liquid crystal panel 000 are textured by the focal cone. into a planar texture.
  • the bistable liquid crystal molecules with planar texture can reflect light of a certain wavelength (for example, green light) in the ambient light irradiated on the liquid crystal panel 100, so that the liquid crystal tablet 000 can display corresponding handwriting.
  • the first substrate 101 in the liquid crystal panel 100 has a plurality of pixel regions 101 a (not marked in FIG. 4 , but marked in FIG. 6 hereinafter) and pixel electrodes 1011 located in the pixel regions 101 a.
  • a pixel electrode 1011 may be arranged in each pixel region 101 a in the first substrate 101
  • the pixel electrode 1011 may be a block electrode.
  • the plurality of pixel regions 101 a of the first substrate 101 may be arranged in an array, therefore, the plurality of pixel electrodes 1011 in the first substrate 101 are also arranged in an array.
  • the first substrate 101 usually also has a plurality of data signal lines and a plurality of gate lines (that is, the first gate line G1 mentioned later), any two adjacent data signal lines and any two Adjacent gate lines can form a pixel region 101a, and a pixel electrode 1011 in the first substrate 101 can be located in a pixel region 101a.
  • the second substrate 102 in the liquid crystal panel 100 has a common electrode 1021 , for example, the common electrode 1021 in the second substrate 102 may be a planar electrode, that is, the common electrode 1021 is a whole-layer electrode.
  • the photosensitive component 200 has a plurality of photosensitive elements 201 .
  • One photosensitive element 201 may correspond to at least one pixel region 101a of the first substrate 101, and the orthographic projection of the photosensitive element 201 in the photosensitive component 200 on the first substrate 101 at least partially overlaps with the corresponding at least one pixel region 101a.
  • each photosensitive element 201 in the photosensitive component 200 may correspond to at least one pixel area 101a.
  • the control component 300 is electrically connected to the liquid crystal panel 100 and the photosensitive component 200 respectively.
  • the control component 300 may be electrically connected to each pixel electrode 1011 in the liquid crystal panel 100 , and the control component 300 may also be electrically connected to each photosensitive element 201 in the photosensitive component 200 .
  • control component 300 can be configured to: detect the position information of the target light irradiated on the liquid crystal panel 100 through the photosensitive component 200, so as to determine the position information of the pixel area to be erased, and send the information to the pixels in the pixel area to be erased
  • the electrode 1011 applies a pixel voltage, so that a voltage difference is formed between the pixel electrode 1011 and the common electrode 1021 in the pixel area to be erased.
  • the handwriting displayed on the liquid crystal tablet 000 when the handwriting displayed on the liquid crystal tablet 000 needs to be erased, the handwriting can be erased by using an erasing tool capable of emitting target light. Because the orthographic projection of the photosensitive element 201 in the photosensitive component 200 on the first substrate 101 at least partially overlaps with the corresponding at least one pixel region 101a.
  • the photosensitive elements 201 in the photosensitive component 200 can sense the target light emitted by the erasing tool and pass through the liquid crystal panel 100, and determine it through the control component 300
  • the position where the target light irradiates on the liquid crystal panel 100 , and the position where the light irradiates on the liquid crystal panel 000 is the position of the pixel region to be erased.
  • a plurality of photosensitive elements 201 in the photosensitive assembly 200 can be arranged in an array, therefore, after the control assembly 300 senses the target light emitted by the erasing tool through a certain photosensitive element in the photosensitive assembly 200, control The component 300 can determine the position information of the certain photosensitive element among the plurality of photosensitive elements 201 . Afterwards, the control component 300 can determine the position information of the light irradiated on the liquid crystal panel 100 based on the position information of the certain photosensitive element in the plurality of photosensitive elements 201, and the corresponding relationship between the photosensitive element 201 and the pixel area 101a, that is, The position information of the pixel area to be erased can be obtained.
  • the liquid crystal tablet 000 can detect the position information of the pixel region to be erased through the photosensitive component 200, and then, the liquid crystal tablet 000 can apply a pixel voltage to the pixel electrode 1011 in the pixel region to be erased through the control component 300 , so that a voltage difference is formed between the pixel electrode 1011 and the common electrode 1021 in the pixel area to be erased.
  • the bistable liquid crystal molecules are also configured to change from a planar texture to a focal conic texture after a voltage difference is formed between the pixel electrode 1011 and the common electrode 1021 in the erased pixel area.
  • the user when the user erases on the liquid crystal tablet 000 with an erasing tool capable of emitting light, the user can emit target light to the liquid crystal panel 100 through the erasing tool, so that the control component 300 can determine the pixel area to be erased, And apply a pixel voltage to the pixel electrode 1011 in the pixel area to be erased, so that a voltage difference is formed between it and the common electrode 1021, so that the bistable liquid crystal molecules in the pixel area to be erased in the liquid crystal panel 000 are controlled by the plane
  • the texture returned to the focal conic texture.
  • the bistable liquid crystal molecules in the focal conic texture can transmit the ambient light irradiated on the liquid crystal panel 100 , so as to realize the erasing of handwriting in the pixel area to be erased.
  • the liquid crystal tablet provided by the embodiment of the present application includes: a liquid crystal panel, a photosensitive component and a driving component.
  • the handwriting can be erased by using an erasing tool capable of emitting target light. Because the orthographic projection of the photosensitive element in the photosensitive assembly on the first substrate in the liquid crystal panel at least partially overlaps with the corresponding pixel area.
  • the photosensitive component can determine the position where the target light irradiates on the liquid crystal panel through at least part of the target light sensed by the photosensitive element, and the position where the target light irradiates on the liquid crystal panel is is the location of the pixel area to be erased.
  • the liquid crystal handwriting panel can apply a pixel voltage to the pixel electrode in the pixel area to be erased through the control component, so as to realize erasing the handwriting in the pixel area to be erased.
  • the photosensitive component will not recognize the area where the user is in contact with the liquid crystal tablet as the pixel area to be erased, thereby reducing the The probability of false erasing on the liquid crystal writing board is reduced, and the erasing effect when the liquid crystal writing board is partially erased is effectively improved.
  • the photosensitive component 200 in order for the photosensitive component 200 to distinguish the target light from the ambient light, it is necessary to ensure that the light intensity of the target light is much greater than the light intensity of the ambient light. And because the photosensitive component 200 is usually located on the side of the liquid crystal layer 103 in the liquid crystal panel 100 away from the second substrate 102 . Therefore, the target light generally needs to pass through the liquid crystal layer 103 and then be directed to the photosensitive component 200 .
  • the bistable liquid crystal molecules in the liquid crystal panel 000 are in a planar texture, they can reflect green light. Therefore, in order to allow the target light to normally pass through the bistable liquid crystal molecules in a planar texture, it is necessary to ensure that The target light is the light of other colors except the green light.
  • the target light can be white light, red light or blue light and so on.
  • FIG. 5 is a schematic structural diagram of another liquid crystal tablet provided by the implementation of this application.
  • the photosensitive component 200 of the liquid crystal tablet 000 is located on the side of the first substrate 101 away from the second substrate 102 .
  • the photosensitive component 200 may include: a circuit board 202 , and a plurality of photosensitive elements 201 located on the circuit board 202 .
  • the plurality of photosensitive elements 201 in the photosensitive component 200 can be electrically connected to the circuit board 202
  • the circuit board 202 can be electrically connected to the control component 300 .
  • the control assembly 300 can monitor the parameters of each photosensitive element 201 through the circuit board 202 .
  • each photosensitive element 201 in the photosensitive component 200 may be a photoresistor, a photodiode, or a phototransistor.
  • the photosensitive component 200 can be attached to the side of the first substrate 101 away from the second substrate 102, and it is necessary to ensure that the plurality of photosensitive elements 201 in the photosensitive component 200 face the first substrate 101 to ensure that the liquid crystal
  • the target light from the panel 100 can enter the photosensitive element 201 .
  • the parameter (for example, resistance) of the photosensitive element 201 changes.
  • the control assembly 300 can determine the position of the photosensitive element 201 whose parameter changes among the plurality of photosensitive elements 201 through the circuit board 202. position, and then the position information of the target light irradiated on the liquid crystal panel 100 can be determined.
  • the circuit board 202 in the photosensitive component 200 can be a printed circuit board (English: Printed Circuit Board; abbreviation: PCB) or a flexible circuit board (English: Flexible Printed Circuit; abbreviation: FPC).
  • the plurality of photosensitive elements 201 in the photosensitive component 200 can be connected to the circuit board 202 by using a surface mount (English: Surface Mounted Technology; abbreviation: SMT) chip technology.
  • a plurality of solder pastes can be printed on the circuit board 202 first; then, a plurality of photosensitive elements 201 are transferred to the circuit board 202, so that the plurality of photosensitive elements 201 and the plurality of solder pastes are in one-to-one contact;
  • the circuit board is subjected to reflow soldering, so that each photosensitive element 201 is electrically connected to the circuit board 202 through the corresponding solder paste; finally, an automatic optical inspection (English: Automatic Optic Inspection; abbreviated: AOI) system is used to check the photosensitive elements 201.
  • the circuit board 202 is optically inspected.
  • the liquid crystal tablet 000 may further include: a black matrix 400 .
  • the black matrix 400 in the liquid crystal tablet 000 is located between the plurality of pixel electrodes 1011 of the first substrate 101 and the plurality of photosensitive elements 201 of the photosensitive component 200 .
  • Fig. 6 is a top view of a first substrate, a black matrix and a photosensitive component stacked in the embodiment of the present application
  • Fig. 7 is a black matrix in the structure shown in Fig. 6
  • Figure 8 is a top view of the photosensitive assembly in the structure shown in Figure 6 .
  • the black matrix 400 in the liquid crystal tablet 000 has a plurality of light holes 401 .
  • the plurality of light holes 401 in the black matrix 400 correspond to the plurality of pixel regions 101 a of the first substrate 101 one by one, and the orthographic projection of each light hole 401 on the first substrate 101 is located in the corresponding pixel region 101 a.
  • each photosensitive element 201 in the photosensitive component 200 corresponds to at least one pixel area 101a, therefore, at least one light through hole 401 in the black matrix 400 corresponds to one photosensitive element 201 in the photosensitive component 200, and each of the The orthographic projection of the light through hole 401 on the first substrate 101 is at least partially overlapped with the orthographic projection of the corresponding photosensitive element 201 on the first substrate 101 .
  • the target light directed to each pixel region 101a of the first substrate 101 in the liquid crystal panel 100 may sequentially pass through the corresponding light through hole 401 and then enter the corresponding photosensitive element 201 in the photosensitive assembly 200, so as to It is ensured that the photosensitive component 200 can sense the target light directed to any pixel area 101 a through the plurality of photosensitive elements 201 .
  • FIG. 6 schematically illustrates that the shape of each light through hole 401 in the black matrix 400 is a square as an example.
  • the shape of each light through hole 401 in the black matrix 400 may also be a circle, a rectangle or other shapes, which is not limited in this embodiment of the present application.
  • each photosensitive element 201 in the photosensitive component 200 can correspond to a plurality of pixel regions 101a.
  • each photosensitive element 201 can correspond to 4 pixel regions 101a, and these 4 pixel regions 101a can be arranged in two rows and two columns, and the 4 pixel electrodes 1011 arranged in the 4 pixel regions 101a are arranged in the photosensitive
  • the orthographic projection on the component 200 is located in the area where the corresponding photosensitive element 201 is located.
  • these four pixel areas 101a can form a minimum erasing area, and after any pixel area 101a of these four pixel areas 101a receives the irradiation of the target light, it can be photosensitive by its corresponding The element 201 is detected, so that the handwriting displayed in the smallest erasing area composed of these four pixel areas 101a can be erased.
  • the area of the orthographic projection of the light hole 401 in the black matrix 400 on the first substrate 101 cannot be too small, so as to ensure that the target light can normally pass through the light hole 401 and then enter the photosensitive element 201.
  • the area of the orthographic projection of the light-through hole 401 in the black matrix 400 on the first substrate 101 should not be too large, so as to ensure that the target light can pass through when the bistable liquid crystal molecules in the liquid crystal tablet 000 present a focal conic texture. After passing through the liquid crystal layer 103, it is absorbed by the black matrix 400, so that it presents a black background.
  • the area of the orthographic projection of the light through hole 401 in the black matrix 400 on the first substrate 101 accounts for a percentage of the area of the corresponding pixel region 101 a ranging from 5% to 20%.
  • the size of the pixel region 101a of the first substrate 101 is 1mm*1mm (millimeter)
  • the area of the orthographic projection of the light through hole 401 on the first substrate 101 accounts for the percentage of the area of the corresponding pixel region 101a in this application is 10%
  • the size of the light hole 401 in the black matrix 400 is 0.1mm*0.1mm.
  • the arrangement direction of any two adjacent light through holes 401 is the same as that of the target The directions intersect.
  • the arrangement direction of the two light through holes 401 corresponding to any two adjacent pixel regions 101a intersects with the target direction.
  • the target direction is the arrangement direction of a row of pixel regions 101a
  • the arrangement direction of the row of pixel regions 101a may be the row arrangement direction of the pixel regions, the column arrangement direction of the pixel regions, or the oblique arrangement direction of the pixel regions .
  • the multiple light holes 401 in the black matrix 400 include at least one light hole group, and the orthographic projection of each light hole 401 in the light hole group on the first substrate 101 is within the corresponding pixel area 101a The location of the distribution is different.
  • the arrangement of the light through holes 401 in each light through hole group may be the same.
  • 36 light through holes 401 corresponding to every 36 pixel regions 101a may form a light through hole group, and the 36 pixel regions 101a may be arranged in six rows and six columns.
  • the positions of the orthographic projections of the light through holes 401 in each light through hole group on the first substrate 101 in the corresponding pixel area 101a are different.
  • the manufacturing difficulty of the black matrix 400 can be effectively reduced by dividing the plurality of light through holes 401 into groups.
  • FIG. 9 is a top view of a first substrate provided by an embodiment of the present application
  • FIG. 10 is a film layer structure of the first substrate shown in FIG. 9 at BB' schematic diagram.
  • the first substrate 101 in the liquid crystal panel 100 may include: a first substrate 1012, and a plurality of pixel electrodes 1011 and a plurality of driving thin film transistors (English: Thin-film transistor; TFT for short) located on the first substrate 1012 1013.
  • the plurality of pixel electrodes 1011 in the first substrate 101 are electrically connected to the plurality of driving TFTs 1013 in one-to-one correspondence.
  • the black matrix 400 in the liquid crystal tablet 000 is located on the side of the first substrate 1012 in the first substrate 101 away from the second substrate 102 .
  • FIG. 11 is a schematic diagram of another layer structure of the first substrate at B-B' shown in FIG. 9 .
  • the black matrix 400 in the liquid crystal tablet 000 is located on the side of the first substrate 1012 facing the second substrate 102 in the first substrate 101 .
  • the black matrix 400 since the black matrix 400 also has a certain conductivity, in order to avoid short-circuiting of each driving TFT 1013 on the first substrate 1012, it is necessary to set a second electrode between the black matrix 400 and the driving TFT 1013.
  • An insulating layer 1014 is necessary to set a second electrode between the black matrix 400 and the driving TFT 1013.
  • the first insulating layer 1014 can be a transparent insulating layer, so that the black matrix 400 and the driving TFT can be controlled without affecting the target light to pass through the light hole 401 in the black matrix 400 to the photosensitive component 200. 1013 for insulation.
  • the process of forming the black matrix 400 on the first substrate 1012 in the above two cases may be a screen printing process or a patterning process.
  • the black matrix 400 When the black matrix 400 is formed on the first substrate 1012 by using a screen printing process, a layer of black ink can be printed on the first substrate 1012 by using a screen printing device, and the black ink can be obtained after drying it. Matrix 400.
  • a black thin film can be formed on the first substrate 1012 by any one of deposition, coating, sputtering, etc., and then the black thin film
  • the black matrix 400 can be obtained by performing exposure treatment and development treatment.
  • the black matrix 400 in the liquid crystal tablet 000 can replace the black aluminum honeycomb panel in the traditional liquid crystal tablet, and the thickness of the black matrix 400 is smaller than that of the black aluminum honeycomb panel. Therefore, the liquid crystal tablet 000 provided by the embodiment of the present application has a small thickness and a small weight.
  • FIG. 12 is a schematic diagram of a film layer structure of a photosensitive component provided in an embodiment of the present application.
  • the photosensitive component 200 may further include: a flat layer 203 located on a side away from the circuit board 202 of the plurality of photosensitive elements 201 , and the black matrix 400 in the liquid crystal tablet 000 may be located on a side of the flat layer 203 away from the circuit board 202 .
  • the flat layer 203 can be a transparent insulating layer, so that not only can the flat layer 203 improve the flatness of the photosensitive component facing the first substrate 101, so as to ensure the flatness of the black matrix 400, but also
  • the black matrix 400 is insulated from the photosensitive element 201 on the premise that the target light is not affected from passing through the light hole 401 in the black matrix 400 to the photosensitive element 200 .
  • the driving TFT 1013 in the first substrate 101 may include: a gate 1013a, a first pole 1013b, a second pole 1013c and an active layer 1013d.
  • both the first pole 1013b and the second pole 1013c overlap the active layer 1013d, and the active layer 1013d is insulated from the gate 1013a.
  • pole insulating layer 1015 for insulation.
  • the embodiments of the present application are all schematically illustrated by taking the side of the gate 1013a of the driving TFT 1013 close to the substrate 1012 relative to the active layer 1013d as an example, that is, the driving TFT 1013 is a bottom gate type TFT.
  • the driving TFT 1013 may also be a top-gate TFT, which is not limited in this embodiment of the present application. It should also be noted that the first pole 1013b of the driving TFT 1013 can be one of the source and the drain, and the second pole 1013c can be the other of the source and the drain.
  • the first substrate 101 may further include: a second insulating layer 1016 located between the driving TFT 1013 and the pixel electrode 1011.
  • the pixel electrode 1011 can be located on the second insulating layer 1016, and the second insulating layer 1016 can not only protect the driving TFT 1013, but also improve the flatness of the pixel electrode 1011.
  • the second insulating layer 1016 has a first via hole V1, and the pixel electrode 1011 can be electrically connected to the second electrode 1013c in the driving TFT 1013 through the first via hole V1.
  • the first substrate 101 may further include: a third insulating layer 1017 located on a side of the pixel electrode 1011 away from the first substrate 1012 .
  • a third insulating layer 1017 located on a side of the pixel electrode 1011 away from the first substrate 1012 .
  • the first substrate 101 may further include: a first gate line G1 electrically connected to the gate 1013a of the driving TFT 1013, and a data signal line D1 electrically connected to the first electrode 1013b of the TFT 1013.
  • the number of first gate lines G1 is generally multiple, and the multiple first gate lines G1 are arranged in parallel; the number of data signal lines D1 is multiple, and the multiple data signal lines D1 are arranged in parallel. Cloth.
  • the extending direction of the first gate line G1 is perpendicular to the extending direction of the data signal line D1. In this way, any two adjacent first gate lines G1 and any two adjacent data signal lines D1 can enclose a rectangular pixel region 101a.
  • both the first gate line G1 and the data signal line D1 in the first substrate 101 can be electrically connected to the control component 300, so as to ensure that the control component 300 can communicate with the control component 300 through the first gate line G1 and the data signal line D1
  • the pixel electrode 1011 applies a pixel voltage.
  • FIG. 13 is a schematic structural diagram of another liquid crystal tablet provided by the implementation of the present application.
  • the photosensitive component 200 in the liquid crystal tablet 000 can be integrated in the first substrate 100 . In this way, there is no need to attach a circuit board with a photosensitive element to the liquid crystal panel 100 in the liquid crystal tablet 000 , ensuring that the thickness of the liquid crystal tablet 000 is relatively low.
  • the liquid crystal tablet 000 may further include: a black film layer 500 .
  • the black film layer 500 may be located on a side of the liquid crystal layer 103 in the liquid crystal panel 100 away from the second substrate 102 .
  • the target light can pass through the liquid crystal layer 103 and be absorbed by the black film layer 500 , making it present a black background.
  • the difference between the black film layer 500 and the black matrix 400 in the above-mentioned first optional implementation mode is only that there is no need to set a light hole in the black film layer 500. Therefore, the setting of the black film layer 500 For the location and the formation method, reference may be made to the setting location and the formation method of the black matrix 400 in the first optional implementation manner above, which will not be repeated in this embodiment of the present application.
  • FIG. 14 is a top view of a first substrate and a black film layer provided by an embodiment of the present application after lamination.
  • the first substrate 101 is usually a substrate integrated with a plurality of driving TFTs 1013 arranged in an array, in order to ensure that the photosensitive component 200 can be integrated in the first substrate 101, the photosensitive element 201 can be used as a sensor capable of detecting target light.
  • Photosensitive TFT That is, each photosensitive element 201 in the photosensitive component 200 can be a photosensitive TFT 201'.
  • the plurality of photosensitive element TFTs 201' in the first substrate 101 may correspond to the plurality of pixel regions 101a one-to-one, and each photosensitive element TFT 201' may be located in the corresponding pixel region 101a.
  • the target light directed at each pixel region 101a of the first substrate 101 in the liquid crystal panel 100 can be sensed by the photosensitive TFT 201' arranged in each pixel region 101a, so as to ensure that the photosensitive component 200 can pass through A plurality of photosensitive TFTs 201' senses target light directed to any pixel region 101a among the plurality of pixel regions 101a.
  • the photosensitive TFT 201' can sense the target light without excessive light intensity of the target light. It only needs to be slightly stronger than the light intensity of the ambient light, so that the target light directed to the pixel area 101a will not affect the normal operation of the driving TFT 1013.
  • FIG. 15 is a top view of a pixel region in a first substrate provided in the embodiment of the present application
  • FIG. 16 is a view of the first substrate shown in FIG. Schematic diagram of the layer structure at CC'.
  • the first substrate 101 may include: a first substrate 1012, and a plurality of pixel electrodes 1011 and a plurality of driving TFTs 1013 located on the first substrate 1012. It should be noted that, for the way in which the pixel electrode 1011 in the first substrate 101 is connected to the driving TFT 1013, other structures contained in the first substrate 101 can refer to the corresponding content in the above-mentioned first optional implementation mode. The embodiment will not be repeated here.
  • the driving TFT 1012 and the photosensitive TFT 201' in the first substrate 101 are arranged on the same layer. That is, during the manufacturing process of the first substrate 101, the driving TFT 1012 and the photosensitive TFT 201' are formed simultaneously.
  • the photosensitive TFT 201' may include: a gate 201a, a first pole 201b, a second pole 201c and an active layer 201d.
  • the first pole 201b and the second pole 201c are overlapped with the active layer 201d, and the active layer 201d is insulated from the gate 201a, for example, the active layer 201d and the gate 201a can be passed through
  • the gate insulating layer 1015 is insulating.
  • the first pole 201b of the driving photosensitive TFT 201' can be one of the source and the drain
  • the second pole 201c can be the other of the source and the drain.
  • the gate 201a in the photosensitive TFT 201' and the gate 1013a in the driving TFT 1013 are formed by one patterning process; the first pole 201b and the second pole 201c in the photosensitive TFT 201', and the driving The first pole 1013b and the second pole 1013c in the TFT 1013 are formed by one patterning process; the active layer 201d in the photosensitive TFT 201' and the gate 1013d in the driving TFT 1013 are formed by one patterning process.
  • a patterning process in the embodiment of the present application refers to: photoresist coating, exposure, development, etching and photoresist stripping.
  • the photosensitive component 200 also has a photosensitive signal line D2 electrically connected to the first pole 201b of the photosensitive TFT 201', and a first sensor line D2 electrically connected to the second pole 201c of the photosensitive TFT 201'.
  • the control component 200 in the liquid crystal tablet 000 can be electrically connected with the photosensitive signal line D2, the first sensing line L1 and the second sensing line L2 respectively, and the extending direction of the first sensing line L1 is the same as that of the second sensing line.
  • the extending direction of L2 is vertical, and the extending direction of the first sensing line L1 may be parallel to the extending direction of the photosensitive signal line D2.
  • the number of the photosensitive signal line D2, the first sensing line L1 and the second sensing line L2 in the photosensitive component 200 may be multiple.
  • a plurality of photosensitive TFTs 201' are arranged in an array, each photosensitive signal line D2 can be electrically connected to the first pole 201b of a row of photosensitive TFTs 201', and each first sensing line L1 can be connected to a row of photosensitive TFTs 201'
  • Each second sensing line L2 can be electrically connected to the second pole 201c of a row of photosensitive TFTs 201'. In this way, any two intersecting first sensing lines L1 and second sensing lines L2 can be electrically connected to the second pole 201c of the same photosensitive TFT 201' at the intersection position.
  • the control component 300 can simultaneously apply an electrical signal to the photosensitive signal line D2.
  • the control component 300 can simultaneously apply an electrical signal to the photosensitive signal line D2.
  • the electrical signal applied to the photosensitive signal line D2 cannot be transmitted to the first sensing line L1 and the second sensing line L1.
  • both the first sensing line L1 and the second sensing line L2 may be electrically connected to the control assembly 300, so that the control assembly 300 can sense the current change of the first sensing line L1 and the current of the second sensing line L2. The current changes, and the photosensitive TFT 201' that senses the target light is positioned, and then the position where the target light irradiates on the pixel area 101a can be determined.
  • the photosensitive component 200 also has a second gate line G2 electrically connected to the gate 201a of the photosensitive TFT 201'.
  • the second gate line G2 may also be electrically connected to the control component 300 , and the extension direction of the second gate line G2 may be parallel to the extension direction of the second sensing line L2 .
  • the control component 300 can apply a grid voltage to the grid 201a of the photosensitive TFT 201' through the second grid line G2.
  • the gate voltage applied to the gate 201a of the TFT 201' cannot control the conduction of the first pole 201b and the second pole 201c of the photosensitive TFT 201'.
  • Applying a gate voltage with a smaller volt value to the gate 201a of the photosensitive TFT 201' through the second gate line G2 can ensure that when the target light is incident on the active layer 201d of the photosensitive TFT 201', the first gate of the photosensitive TFT 201' The pole 201b and the second pole 201c are turned on.
  • the data signal line D1, the photosensitive signal line D2 and the first sensing signal line L1 in the first substrate 101 can be arranged in the same layer, that is, The source-drain metal layer including the data signal line D1, the photosensitive signal line D2 and the first sensing signal line L1 can be formed simultaneously by one patterning process; and the first gate line G1 and the second gate line in the first substrate 101 can be The line G2 and the first sensing signal line L2 are arranged in the same layer, that is, the gate metal layer including the first gate line G1, the second gate line G2 and the second sensing signal line L2 can be formed simultaneously by one patterning process.
  • the source-drain metal layer may further include: the first pole and the second pole of the TFT integrated in the first substrate 101
  • the gate metal layer may further include: the gate of the TFT integrated in the first substrate 101 .
  • the photosensitive signal line D2 can be directly electrically connected to the first pole 201b of the photosensitive TFT 201', and the first sensing signal line L1 can be directly connected to the second pole 201b of the photosensitive TFT 201'.
  • the pole 201c is electrically connected.
  • the first substrate 101 there is usually a gate insulating layer 1014 between the gate metal layer and the source-drain metal layer, in order to ensure that the second sensing signal line L2 can be electrically connected to the second pole 201c of the photosensitive TFT 201' , the second sensing signal line L2 and the second pole 201c of the photosensitive TFT 201' can be connected by a transfer electrode.
  • the photosensitive component 200 also has a transfer electrode 204 provided on the same layer as the pixel electrode 1011, and the transfer electrode 204 can be electrically connected to the second pole 201c of the photosensitive TFT 201' and the second sensing signal line L2 respectively.
  • the second insulating layer 1016 in the first substrate 101 also has a second via hole V2, and the gate insulating layer 1015 and the second insulating layer 1016 in the first substrate 101 have a third via hole V3 communicating with each other.
  • the transfer electrode 204 can be electrically connected to the second pole 201c of the photosensitive TFT 201' through the second via hole V2, and the transfer electrode 204 can also be electrically connected to the second sensing signal line L2 through the third via hole V3.
  • the pixel electrode 1011 and the transfer electrode 204 can be formed by the same patterning process, and the pixel electrode 1011 and the transfer electrode 204 can be insulated by the slit d.
  • the data signal lines D1 and photosensitive signal lines D2 in the first substrate 101 may be multiplexed.
  • the first pole 201b of the photosensitive TFT 201' and the second pole 1013c of the driving TFT 1013 can be connected to the same data line.
  • the driving component 300 can respectively drive the photosensitive TFT 201' and the driving TFT 1013a to work by means of time-sharing driving.
  • each driving cycle can be a first sub-period and a second sub-period respectively.
  • the control component 300 can send a first driving signal to the data line to ensure that the photosensitive TFT 201' can work, and then it can be determined
  • the control component 300 can send a second driving signal to the data line to ensure that the driving TFT 1013 can work, and then the pixel electrode in the pixel area to be erased can be realized. 1011 Apply pixel voltage.
  • the active layer 201d in the photosensitive TFT 201' has a channel region, and the channel region refers to the region in the active layer 201d where the active layer 201d is in contact with the first pole 201b, and the active layer 201d is in contact with the area between the second pole 201c.
  • the active layer 201d in the TFT 201' has a channel region which can be an inline channel region, a U-shaped channel region or an L-shaped channel region.
  • the aspect ratio of the channel region of the active layer 201d may range from (4 ⁇ 10)/(2.5 ⁇ 6).
  • the aspect ratio of the channel region of the active layer 201d may be 5/4.
  • the structure of the driving TFT 1013 in the first substrate 101 can be the same as that of the photosensitive TFT 201′, that is, the channel region of the active layer 1013d in the driving TFT 1013 can be an inline channel region , U-shaped channel region or L-shaped channel region.
  • Fig. 17 is a structural block diagram of a control component provided by an embodiment of the present application.
  • the control component 300 may include: a sensing chip 301 and a driving chip 302 .
  • the sensing chip 301 can be electrically connected with the driving chip 302 .
  • the driving chip 302 in the control component 300 can be electrically connected to the first substrate 101 in the liquid crystal panel 100 ; the sensing chip 201 in the control component 300 can be electrically connected to the photosensitive component 200 .
  • the sensing chip 201 can determine the position of the photosensitive element 201 that senses the target light in the plurality of photosensitive elements 201 through the photosensitive component 200, so as to determine the position information of the pixel area to be erased; after that, the sensing chip 301 can The location information of the pixel area to be erased is sent to the driving chip 302, so that the driving chip 302 can apply a pixel voltage to the pixel electrode in the pixel area to be erased.
  • the sensing chip 301 in the control assembly 300 can be electrically connected with the circuit board 202 in the photosensitive assembly 200;
  • the driving chip 302 in the assembly 300 may be electrically connected to the first gate line G1 and the data signal line D1 in the first substrate 101 respectively.
  • the sensing chip 301 in the control component 300 can be connected to the first sensing line L1 in the photosensitive component 200 respectively. and the second sensing line L2; the driving chip 302 in the control assembly 300 can be electrically connected to the first gate line G1 and the data signal line D1 in the first substrate 101 respectively, and the driving chip 302 can also be connected to the photosensitive
  • the second gate line G2 in the assembly 200 is electrically connected to the photosensitive signal line D2.
  • Figure 18 is a schematic diagram of the film layer structure of a liquid crystal panel provided by the embodiment of this application
  • Figure 19 is a top view of the first substrate in the liquid crystal panel shown in Figure 18
  • the first substrate 101 in the liquid crystal tablet 000 may also include: an auxiliary electrode line 1018 located on the base substrate 101, the auxiliary electrode line 1018 may be arranged on the same layer as the first gate line G1, and the extension of the auxiliary electrode line 1018 The direction is the same as the extending direction of the first gate line G1.
  • the pixel electrodes 1011 in the first substrate 101 are arranged in multiple rows, and the number of auxiliary electrode lines 1018 in the first substrate 101 is the same as the number of rows of pixel electrodes 1011 .
  • the orthographic projection of each auxiliary electrode line 1018 on the first substrate 1012 overlaps the orthographic projection of the corresponding row of pixel electrodes 1011 on the first substrate 1012, and the auxiliary electrode line 1018 can be connected to the row of pixel electrodes 1011.
  • Each pixel electrode 1011 constitutes a storage capacitor Cst.
  • the storage capacitor Cst can be used to maintain the pixel voltage of the pixel electrode 1011.
  • the storage capacitor Cst can prevent the voltage change of the pixel electrode 1011 in the pixel area to be erased from affecting its The voltage of the surrounding pixel electrode 1011 can avoid affecting the display effect of the pixel area around the pixel area to be erased.
  • the second substrate 102 in the liquid crystal panel 100 includes: a second substrate 1022 , and a common electrode 1021 located on the second substrate 1022 in the second substrate 102 .
  • a constant common voltage for example, 0 volts
  • the second substrate 1022 may be a flexible substrate, and the material of the second substrate 1022 may include: polyethylene terephthalate (English: Polyethylene Terephthalate; PET for short).
  • the material of the pixel electrode 1011 in the first substrate 101 and the common electrode 1021 in the second substrate 102 may include: Indium Tin Oxide (English: Indium Tin Oxide; Abbreviation: ITO) or Indium Zinc Oxide (English: Indium Zinc Oxide; Abbreviation: IZO) and other transparent conductive materials. In this way, it can be ensured that the target light can pass through the liquid crystal surface 100 and then go to the photosensitive component 200 .
  • the liquid crystal tablet provided by the embodiment of the present application includes: a liquid crystal panel, a photosensitive component and a driving component.
  • the handwriting can be erased by using an erasing tool capable of emitting target light. Because the orthographic projection of the photosensitive element in the photosensitive assembly on the first substrate in the liquid crystal panel at least partially overlaps with the corresponding pixel area.
  • the photosensitive component can determine the position where the target light irradiates on the liquid crystal panel through at least part of the target light sensed by the photosensitive element, and the position where the target light irradiates on the liquid crystal panel is is the location of the pixel area to be erased.
  • the liquid crystal handwriting panel can apply a pixel voltage to the pixel electrode in the pixel area to be erased through the control component, so as to realize erasing the handwriting in the pixel area to be erased.
  • the photosensitive component will not recognize the area where the user is in contact with the liquid crystal tablet as the pixel area to be erased, thereby reducing the The probability of false erasing on the liquid crystal writing board is reduced, and the erasing effect when the liquid crystal writing board is partially erased is effectively improved.
  • the embodiment of the present application also provides a handwriting system, please refer to FIG. 20 , which is a schematic structural diagram of a handwriting system provided in the embodiment of the present application.
  • the handwriting system may include: an erasing tool 111 and a liquid crystal tablet 000 .
  • the liquid crystal tablet 000 may be the liquid crystal tablet in the above embodiments, for example, the liquid crystal tablet 000 may be the liquid crystal tablet shown in FIG. 4 , FIG. 5 or FIG. 13 .
  • the erasing tool 111 may have a light emitting component 111a for emitting target light.
  • the light intensity of the target light emitted by the light-emitting component 111a needs to be much greater than the light intensity of the ambient light, so that the photosensitive component 200 in the liquid crystal tablet 000 can distinguish the target light from the ambient light; the target light emitted by the light-emitting component 111a It is the light of other colors before the green light, so as to ensure that the target light will not be reflected by the bistable liquid crystal molecules in the planar texture.
  • the liquid crystal tablet 000 can be configured to: after the light-emitting component 111a of the erasing tool 111 emits the target light to the liquid crystal panel 100, the photosensitive component 200 detects the position information of the target light to determine the position to be erased. Delete the location information of the area.
  • the light emitting component 111 a in the erasing tool 111 can be used to emit target light to the area to be erased on the liquid crystal panel 000 .
  • the liquid crystal tablet 000 can detect the position information of the target light on the liquid crystal panel 000 through the photosensitive component 200, so that the control component 300 in the liquid crystal tablet 000 can reach the position of the target light through the photosensitive component 200 Information, determine the position information of the pixel area to be erased, and apply pixel voltage to the pixel electrode in the pixel area to be erased, so that the handwriting in the pixel area to be erased is erased.
  • FIG. 21 is a schematic diagram of a product structure of a liquid crystal tablet provided by an embodiment of the present application.
  • a switch 600 can be set in the liquid crystal tablet 000 .
  • the switching switch 600 can be electrically connected with the control component 300, and the switching switch 600 is used to control the liquid crystal tablet 000 to switch between the erasing mode and the writing mode.
  • the control assembly 300 and the photosensitive assembly 200 are all in a non-working state.
  • the liquid crystal tablet 000 does not need to supply power to the control assembly 300 and the photosensitive assembly 200; In the except mode, both the control component 300 and the photosensitive component 200 are in the working state. At this time, the liquid crystal tablet 000 needs to supply power to the control component 300 and the photosensitive component 200 . In this way, only when the liquid crystal tablet 000 is in the erasing mode, the liquid crystal tablet 000 needs to consume power, which effectively reduces the power consumption of the liquid crystal tablet 000 .
  • a switch button 111b may also be set in the eraser tool 111 in the handwriting system.
  • the user can make the light-emitting component 111a in the eraser tool 111 emit target light or stop emitting target light by pressing the switch button 111b in the eraser tool 111b.
  • the embodiment of the present application also provides a control method of the handwriting system, please refer to FIG. 22 , which is a flowchart of a control method of the handwriting system provided by the embodiment of the present invention.
  • the method for controlling the handwriting system can be applied to the handwriting system in the above embodiments, for example, the handwriting system can be the handwriting system shown in FIG. 20 or FIG. 21 .
  • the control method of the handwriting system may include:
  • Step S1 After the light-emitting component of the erasing tool emits target light to the liquid crystal panel, the liquid crystal tablet detects the position information of the target light through the photosensitive component to determine the position information of the pixel area to be erased.
  • Step S2 based on the position information of the pixel area to be erased, the liquid crystal handwriting panel applies a pixel voltage to the pixel electrode in the pixel area to be erased through the control component, so that the pixel electrode in the pixel area to be erased and the common electrode A voltage difference is formed between them.
  • first and second are used for descriptive purposes only, and should not be construed as indicating or implying relative importance.
  • the term “plurality” means two or more, unless otherwise clearly defined.

Abstract

一种液晶手写板（000）、手写系统及手写系统的控制方法，属于显示技术领域。液晶手写板（000）包括：液晶面板（100）、光敏组件（200）和驱动组件（300）。当需要对液晶手写板（000）所显示的书写笔迹进行擦除时，可以采用能够发射目标光线的擦除工具（111）对该书写笔迹进行擦除。在擦除工具（111）向液晶面板（100）发射目标光线后，光敏组件（200）可以通过至少部分光敏元件（201）所感应到的目标光线，确定目标光线照射到液晶面板（100）上的位置，目标光线照射到液晶面板（100）上的位置即为待擦除的像素区域（101a）的位置。如此，液晶手写板（000）可以通过控制组件（300）向待擦除的像素区域（101a）内的像素电极（1011）施加像素电压，以实现对待擦除的像素区域（101a）内的书写笔迹进行擦除。

Description

液晶手写板、手写系统及手写系统的控制方法
本申请要求于2021年09月24日提交的申请号为202111124118.1、发明名称为“液晶手写板、手写系统及手写系统的控制方法”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及显示技术领域，特别涉及一种液晶手写板、手写系统及手写系统的控制方法。
背景技术
手写板是一种用于实现文字书写和绘画的电子设备。其中，液晶手写板具有功耗低且笔迹清晰的优势，近年来在占据了较多的市场份额。
为了能够对液晶手写板所显示的书写笔迹进行局部擦除，需要在液晶手写板中集成红外定位装置。在采用擦除工具(例如，板擦)对液晶手写板显示的书写笔迹进行擦除时，可以通过红外定位装置确定擦除工具在液晶手写板上的位置，以在液晶手写板中确定待擦除区域。之后，液晶手写板可以对待擦除区域内的像素电极进行控制，以擦除待擦除区域内的书写笔迹。
然而，液晶手写板中的红外定位装置的定位精度较低，导致液晶手写板极易出现误擦现象，进而导致对液晶手写板进行局部擦除时的效果较差。
发明内容
本申请实施例提供了一种液晶手写板、手写系统及手写系统的控制方法。可以解决现有技术中对液晶手写板进行局部擦除时的效果较差的问题，所述技术方案如下：
一方面，提供了一种液晶手写板，包括：液晶面板、光敏组件和控制组件；
所述液晶面板包括：相对设置的第一基板和第二基板，所述第一基板具有多个像素区域，以及位于所述像素区域内的像素电极，所述第二基板具有公共电极；
所述光敏组件具有多个光敏元件，一个所述光敏元件与至少一个所述像素区域对应，且所述光敏元件在所述第一基板上的正投影与对应的至少一个所述 像素区域至少部分交叠；
所述控制组件分别与所述液晶面板和所述光敏组件电连接，所述控制组件被配置为：通过所述光敏组件检测目标光线照射在所述液晶面板上的位置信息，以确定待擦除的像素区域的位置信息，并向所述待擦除的像素区域内的像素电极施加像素电压，以使所述待擦除的像素区域内的像素电极与所述公共电极之间形成电压差。
可选的，所述光敏组件位于所述第一基板远离所述第二基板的一侧。
可选的，所述液晶手写板还包括：黑矩阵，所述黑矩阵位于所述多个像素电极与所述多个光敏元件之间，所述黑矩阵具有多个通光孔，所述多个通光孔与所述多个像素区域一一对应，所述通光孔在所述第一基板上的正投影位于对应的像素区域内，且所述光敏元件与至少一个所述通光孔对应，所述通光孔在所述第一基板上的正投影与对应的光敏元件在所述第一基板上的正投影至少部分交叠。
可选的，在目标方向上，至少两个相邻的像素区域所对应的至少两个通光孔中，任意两个相邻的通光孔的排布方向与所述目标方向相交，所述目标方向为一排所述像素区域的排列方向。
可选的，所述多个通光孔包括至少一个通光孔组，所述通光孔组中的各个通光孔在所述第一基板上的正投影在对应的像素区域内的分布位置不同。
可选的，所述第一基板包括：第一衬底，以及位于所述第一衬底上的所述多个像素电极和多个驱动薄膜晶体管TFT，所述多个像素电极与多个驱动TFT一一对应电连接；
其中，所述黑矩阵位于所述第一衬底背离所述第二基板的一侧；
或者，所述黑矩阵位于所述第一衬底朝向所述第二基板的一侧，且所述第一基板还包括：位于所述黑矩阵与所述驱动TFT之间的第一绝缘层。
可选的，所述通光孔在所述第一基板上的正投影的面积占对应的像素区域的面积的百分比的范围为5％至20％。
可选的，所述光敏组件包括：电路板，以及位于所述电路板上的所述多个光敏元件，所述多个光敏元件均与所述电路板电连接，且所述电路板与所述控制组件电连接。
可选的，所述光敏组件集成在所述第一基板内。所述光敏元件为光敏TFT，多个所述光敏TFT与所述多个像素区域一一对应，且所述光敏TFT位于对应的 像素区域内。
可选的，所述光敏组件还具有与所述光敏TFT的第一极电连接的光敏信号线，以及与所述光敏TFT的第二极电连接的第一感测线和第二感测线；
其中，所述控制组件分别与所述光敏信号线、所述第一感测线和所述第二感测线电连接，且所述第一感测线的延伸方向与第二感测线的延伸方向垂直。
可选的，所述光敏组件还具有与所述像素电极同层设置的转接电极，所述转接电极分别与所述光敏TFT的第二极和所述第二感测线电连接。
可选的，所述第一基板包括：第一衬底，以及位于所述第一衬底上的所述多个像素电极和多个驱动TFT，所述多个像素电极与所述多个驱动TFT一一对应电连接，所述多个驱动TFT与多个所述光敏TFT同层设置。
可选的，所述液晶面板还包括：位于所述第一基板和所述第二基板之间的双稳态液晶分子层；
所述双稳态液晶分子层中的双稳态液晶分子被配置为：在所述液晶面板受到外部压力后，由焦锥织构转变为平面织构；在所述待擦除的像素区域内的像素电极与所述公共电极之间形成电压差后，由平面织构转变为焦锥织构。
另一方面，提供了一种手写系统，包括：擦除工具和上述的液晶手写板；
其中，所述擦除工具具有发光组件，所述液晶手写板被配置为：在所述擦除工具的发光组件向所述液晶面板发射目标光线后，通过所述光敏组件检测所述目标光线照射的位置信息，以确定待擦除的像素区域的位置信息。
又一方面，提供了一种手写系统的控制方法，应用于上述的手写系统，所述方法包括：
在所述擦除工具的发光组件向所述液晶面板发射目标光线后，所述液晶手写板通过所述光敏组件检测所述目标光线照射的位置信息，以确定待擦除的像素区域的位置信息；
所述液晶手写板基于所述待擦除的像素区域的位置信息，通过所述控制组件向所述待擦除的像素区域内的像素电极施加像素电压，以使所述待擦除的像素区域内的像素电极与所述公共电极之间形成电压差。
本申请实施例提供的技术方案带来的有益效果至少包括：
一种液晶手写板包括：液晶面板、光敏组件和驱动组件。当需要对液晶手写板所显示的书写笔迹进行擦除时，可以采用能够发射目标光线的擦除工具对该书写笔迹进行擦除。由于光敏组件中的光敏元件在液晶面板中的第一基板上 的正投影与对应的像素区域至少部分交叠。因此，在擦除工具向液晶面板发射目标光线后，光敏组件可以通过至少部分光敏元件所感应到的目标光线，确定目标光线照射到液晶面板上的位置，目标光线照射到液晶面板上的位置即为待擦除的像素区域的位置。如此，液晶手写板可以通过控制组件向待擦除的像素区域内的像素电极施加像素电压，以实现对待擦除的像素区域内的书写笔迹进行擦除。在这种情况下，即使用户在书写的过程中，用户的手部与液晶手写板进行接触，光敏组件也不会将用户与液晶手写板接触的区域识别为待擦除的像素区域，进而降低了液晶手写板出现误擦现象的概率，有效的提高了液晶手写板进行局部擦除时的擦除效果。
附图说明
为了更清楚地说明本申请实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是相关技术提供的一种液晶手写板的俯视图；
图2是图1示出的液晶手写板在A-A’处的截面图；
图3是图1示出的液晶手写板呈现书写笔迹的原理图；
图4是本申请实施例提供的一种液晶手写板的结构示意图；
图5是本申请实施提供的另一种液晶手写板的结构示意图；
图6是本申请实施例的一种第一基板、黑矩阵和光敏组件叠层后的俯视图；
图7是图6示出的结构中的黑矩阵的俯视图；
图8是图6示出的结构中的光敏组件的俯视图；
图9是本申请实施例提供的一种第一基板的俯视图；
图10是图9示出的第一基板在B-B’处的膜层结构示意图；
图11是图9示出的第一基板在B-B’处的另一种膜层结构示意图；
图12是本申请实施例提供一种的光敏组件的膜层结构示意图；
图13是本申请实施提供的又一种液晶手写板的结构示意图；
图14是本申请实施例提供的一种第一基板和黑色膜层叠层后的俯视图；
图15是本申请实施例提供的一种第一基板中的一个像素区域的俯视图；
图16是图15示出的第一基板在C-C’处的膜层结构示意图；
图17是本申请实施例提供的一种控制组件的结构框图；
图18是本申请实施例提供的一种液晶面板的膜层结构示意图；
图19是图18示出的液晶面板中的第一基板的俯视图；
图20是本申请实施例提供的一种手写系统的结构示意图；
图21是本申请实施例提供的一种液晶手写板的产品结构示意图；
图22是本发明实施例提供的一种手写系统的控制方法的流程图。
具体实施方式
为使本申请的目的、技术方案和优点更加清楚，下面将结合附图对本申请实施方式作进一步地详细描述。
在相关技术中，请参考图1和图2，图1是相关技术提供的一种液晶手写板的俯视图，图2是图1示出的液晶手写板在A-A’处的截面图。液晶手写板00通常可以包括：液晶面板01、黑色铝蜂窝板02和红外定位装置03。
其中，液晶面板01可以包括：相对设置的第一基板011和第二基板012，以及位于二者之间的液晶层013。第一基板011通常具有阵列排布的多个像素电极(图中未画出)，第二基板012具有面状的公共电极(图中未画出)，液晶层013中的液晶分子可以为双稳态液晶分子。
黑色铝蜂窝板04和位于第一基板011远离第二基板012的一侧。红外定位装置03位于液晶面板01和黑色铝蜂窝板04的外围，红外定位装置03需要凸出于液晶面板01，并且可以发出红外光，以确定液晶面板01上的擦除工具的位置。
如图3所示，图3是图1示出的液晶手写板呈现书写笔迹的原理图。当液晶手写板00处于书写模式时，书写工具001(例如，书写笔)可以向液晶面板01施加压力，使得液晶面板01中的液晶层013内的部分液晶分子受外部压力的作用由焦锥织构转变为平面织构。这样，转变为平面织构的液晶分子能够对射入的环境光线中的一定波长的光线(例如，绿色光线)进行反射，使得液晶手写板可以显示书写笔迹。
当液晶手写板00处于书写模式时，擦除工具002在液晶面板01上进行移动，液晶手写板00通过红外定位装置03发出的红外光，确定擦除工具002在液晶面板01上的位置，进而可以在液晶手写板00中确定待擦除区域。之后，液晶手写板可以向待擦除区域内的像素电极施加电压，以使待擦除区域内的像 素电极与公共电极之间能够形成电压差，进而使得待擦除区域内的液晶分子在该电压差的作用下重新排列，也即液晶分子可以由平面织构转变为焦锥织构。这样，转变为焦锥织构的液晶分子能够对射入的环境光线进行透射，使得待擦除区域可以呈现出与黑色铝蜂窝板04颜色相同的黑色背景，进而实现对待擦除区域内的书写笔迹进行擦除。
液晶手写板00中的红外定位装置03通常需要对书写工具001和擦除工具002进行区分，以保证书写工具001能够正常在液晶手写板00上进行书写，且保证擦除工具002能够对液晶手写板00所显示的书写笔迹进行擦除。为此，需要保证擦除工具002与液晶手写板00接触的面远大于书写工具001与液晶手写板00接触的面积，使得红外定位装置03通过检测物体与液晶手写板00的接触面积，对书写工具001与擦除工具002进行区分。
然而，用户在通过书写工具001在液晶手写板00进行书写的过程中，用户的手部极易与液晶手写板00进行接触，而用户的手部与液晶手写板00接触的面积通常较大，导致红外定位装置03极易将用户的手部识别为擦除工具002，进而导致用户的手部与液晶手写板00接触的区域所显示的书写笔迹被误擦。如此，液晶手写板00进行局部擦除时的效果较差。
请参考图4，图4是本申请实施例提供的一种液晶手写板的结构示意图。该液晶手写板000可以包括：
液晶面板100、光敏组件200和控制组件300。
液晶面板100可以包括：相对设置的第一基板101和第二基板102。在本申请实施例中，液晶面板100通常还可以包括：位于第一基板101和第二基板102之间的液晶层103。其中，液晶层103可以为双稳态液晶分子层，也即是，该液晶层103中的液晶分子为双稳态液晶分子。示例的，双稳态液晶分子被配置为：在液晶手写板000中的液晶面板100受到外部压力时，由焦锥织构转变为平面织构。例如，在用户通过书写工具在液晶手写板000上进行书写时，用户可以通过书写工具向液晶面板100施加压力，使得液晶面板000中受到压力的区域内的双稳态液晶分子由焦锥织构转变为平面织构。在这种情况下，呈平面织构的双稳态液晶分子能够反射照射在液晶面板100上环境光线中的一定波长的光线(例如，绿色光线)进行反射，以使液晶手写板000可以显示相应的书写笔迹。
其中，液晶面板100中的第一基板101具有多个像素区域101a(图4中未标注，在后文中的图6中进行了标注)以及，位于像素区域内101a的像素电极1011。示例的，第一基板101中的每个像素区域101a内均可以布置一个像素电极1011，且该像素电极1011可以为块状的电极。第一基板101的多个像素区域101a可以呈阵列排布，因此，第一基板101中的多个像素电极1011也是阵列排布的。需要说明的是，第一基板101通常还具有多条数据信号线和多条栅线(也即后文中提到的第一栅线G1)，任意两条相邻的数据信号线与任意两条相邻的栅线能够围成一个像素区域101a，第一基板101中的一个像素电极1011可以位于一个像素区域101a内。
液晶面板100中的第二基板102具有公共电极1021，示例的，第二基板102中的公共电极1021可以为面状的电极，也即是，公共电极1021为整层的电极。
光敏组件200具有多个光敏元件201。一个光敏元件201可以与第一基板101的至少一个像素区域101a对应，并且，光敏组件200中的光敏元件201在第一基板101上的正投影与对应的至少一个像素区域101a至少部分交叠。在本申请中，光敏组件200中的每个光敏元件201可以与至少一个像素区域101a对应。
控制组件300分别与连接液晶面板100和光敏组件200电连接。示例的，控制组件300可以与液晶面板100中的各个像素电极1011电连接，该控制组件300还可以与光敏组件200中的各个光敏元件201电连接。
其中，控制组件300可以被配置为：通过光敏组件200检测目标光线照射在液晶面板100上的位置信息，以确定待擦除的像素区域的位置信息，并向待擦除的像素区域内的像素电极1011施加像素电压，以使待擦除的像素区域内的像素电极1011与公共电极1021之间形成电压差。
在本申请实施例中，当需要对液晶手写板000所显示的书写笔迹进行擦除时，可以采用能够发射目标光线的擦除工具对该书写笔迹进行擦除。由于光敏组件200中的光敏元件201在第一基板101上的正投影与对应的至少一个像素区域101a至少部分交叠。因此，在擦除工具向液晶面板100发射目标光线后，光敏组件200中的至少部分光敏元件201可以感测到由擦除工具发出并穿过液晶面板100的目标光线，并通过控制组件300确定该目标光线照射到液晶面板100上的位置，该光线照射到液晶面板000上的位置即为待擦除的像素区域的位置。
示例的，光敏组件200中的多个光敏元件201可以是阵列排布的，因此，控制组件300在通过光敏组件200中的某个光敏元件感测到由擦除工具发出的目标光线后，控制组件300可以确定该某个光敏元件在多个光敏元件201中的位置信息。之后，控制组件300可以基于该某个光敏元件在多个光敏元件201中的位置信息，以及光敏元件201与像素区域101a之间的对应关系，确定光线照射在液晶面板100上的位置信息，即可得到待擦除的像素区域的位置信息。
如此，液晶手写板000通过光敏组件200可以检测到待擦除的像素区域的位置信息，之后，该液晶手写板000可以通过控制组件300向待擦除的像素区域内的像素电极1011施加像素电压，使得待擦除的像素区域内的像素电极1011与公共电极1021之间形成电压差。示例的，双稳态液晶分子还被配置为：在擦除的像素区域内的像素电极1011与公共电极1021之间形成电压差后，由平面织构转变为焦锥织构。例如，在用户通过能够发出光线的擦除工具在液晶手写板000上擦除时，用户可以通过擦除工具向液晶面板100发射目标光线，使得控制组件300可以确定出待擦除的像素区域，并向待擦除的像素区域内的像素电极1011施加像素电压，使得其与公共电极1021之间形成电压差，进而使得液晶面板000中待擦除的像素区域内的双稳态液晶分子由平面织构恢复为焦锥织构。如此，呈焦锥织构的双稳态液晶分子能够透射照射在液晶面板100上的环境光线，以实现对待擦除的像素区域内的书写笔迹进行擦除。
综上所述，本申请实施例提供的液晶手写板，包括：液晶面板、光敏组件和驱动组件。当需要对液晶手写板所显示的书写笔迹进行擦除时，可以采用能够发射目标光线的擦除工具对该书写笔迹进行擦除。由于光敏组件中的光敏元件在液晶面板中的第一基板上的正投影与对应的像素区域至少部分交叠。因此，在擦除工具向液晶面板发射目标光线后，光敏组件可以通过至少部分光敏元件所感应到的目标光线，确定目标光线照射到液晶面板上的位置，目标光线照射到液晶面板上的位置即为待擦除的像素区域的位置。如此，液晶手写板可以通过控制组件向待擦除的像素区域内的像素电极施加像素电压，以实现对待擦除的像素区域内的书写笔迹进行擦除。在这种情况下，即使用户在书写的过程中，用户的手部与液晶手写板进行接触，光敏组件也不会将用户与液晶手写板接触的区域识别为待擦除的像素区域，进而降低了液晶手写板出现误擦现象的概率，有效的提高了液晶手写板进行局部擦除时的擦除效果。
需要说明的是，为了让光敏组件200能够对目标光线与环境光线进行区别， 需要保证目标光线的光强远大于环境光线的光强。又由于光敏组件200通常位于液晶面板100中的液晶层103远离第二基板102的一侧。因此，目标光线通常需要穿过液晶层103后射向光敏组件200。而当液晶面板000中的双稳态液晶分子在呈平面织构时，其能够反射绿色的光线，为此，为了能够让目标光线正常穿过呈平面织构的双稳态液晶分子，需要保证目标光线为除绿色光线之前的其他颜色的光线。例如，目标光线可以为白光、红光或蓝光等。
在本申请实施例中，液晶手写板000中的光敏组件200的结构有多种，本申请实施例以以下两种可选的实现方式为例进行示意性的说明：
第一种可选的实现方式，请参考图5，图5是本申请实施提供的另一种液晶手写板的结构示意图。液晶手写板000中光敏组件200位于第一基板101远离第二基板102的一侧。示例的，光敏组件200可以包括：电路板202，以及位于电路板202上的多个光敏元件201。其中，光敏组件200中的多个光敏元件201均可以与电路板202电连接，且该电路板202可以与控制组件300电连接。其中，控制组件300可以通过电路板202对各个光敏元件201的参数进行监测。可选的，光敏组件200中的各个光敏元件201均可以为光敏电阻、光敏二极管或光敏三极管等。
在这种情况下，光敏组件200可以贴合在第一基板101远离第二基板102的一侧，且需要保证光敏组件200中的多个光敏元件201朝向第一基板101，以保证穿过液晶面板100的目标光线能够射入光敏元件201。在光敏元件201接收到目标光线后，光敏元件201的参数(例如，电阻)发生变化，这样，控制组件300通过电路板202能够确定出参数发生变化的光敏元件201在多个光敏元件201中的位置，进而可以确定出目标光线照射在液晶面板100上的位置信息。需要说明的是，光敏组件200中的电路板202可以为印刷电路板(英文：Printed Circuit Board；简称：PCB)或柔性电路板(英文：Flexible Printed Circuit；简称：FPC)。
示例的，可以采用表面组装(英文：Surface Mounted Technology；简称：SMT)贴片工艺将光敏组件200中的多个光敏元件201与电路板202进行连接。例如，可以先在电路板202上印刷多个锡膏；然后，将多个光敏元件201转移到电路板202上，以使多个光敏元件201和多个锡膏一一对应接触；之后，对电路板进行回流焊接，以使每个光敏元件201通过对应锡膏与电路板202电连接；最后，采用自动光学检测(英文：Automatic Optic Inspection；简称：AOI)系统对 具有多个光敏元件201的电路板202进行光学检测。
在本申请实施例中，液晶手写板000还可以包括：黑矩阵400。液晶手写板000中的黑矩阵400位于可以第一基板101的多个像素电极1011与光敏组件200的多个光敏元件201之间。
如图6、图7和图8所示，图6是本申请实施例的一种第一基板、黑矩阵和光敏组件叠层后的俯视图，图7是图6示出的结构中的黑矩阵的俯视图，图8是图6示出的结构中的光敏组件的俯视图。液晶手写板000中的黑矩阵400具有与多个通光孔401。黑矩阵400中的多个通光孔401与第一基板101的多个像素区域101a一一对应，且每个通光孔401在第一基板101上的正投影位于对应的像素区域101a内。又由于光敏组件200中的每个光敏元件201与至少一个像素区域101a对应，因此，黑矩阵400中的至少一个通光孔401与光敏组件200中的一个光敏元件201对应，且每个所述通光孔401在第一基板101上的正投影与对应的光敏元件201在第一基板101上的正投影位于至少部分交叠。
在这种情况下，射向液晶面板100中的第一基板101的各个像素区域101a的目标光线，可以依次穿过对应的通光孔401后射入光敏组件200中对应的光敏元件201，以保证光敏组件200可以通过多个光敏元件201感测到射向任一像素区域101a的目标光线。
需要说明的是，图6是以黑矩阵400中的各个通光孔401的形状为正方形为例进行示意性说明的。在其他可能的实现方式中，黑矩阵400中的各个通光孔401的形状还可以为圆形、矩形或其他形状，本申请实施例对此不做限定。
示例的，由于用户通过书写工具在液晶手写板000上进行书写时的书写笔迹通常较宽，而像素区域101a的宽度通常较小。因此，为了提高对书写笔迹的擦除效率，需要保证光敏组件200中的每个光敏元件201能够对应多个像素区域101a。例如，每个光敏元件201可以与4个像素区域101a对应，且这4个像素区域101a可以排布为两行和两列，这4个像素区域101a内排布的4个像素电极1011在光敏组件200上的正投影位于对应的光敏元件201所在区域内。
在这种情况下，这4个像素区域101a能够组成一个最小的擦除区域，在这4个像素区域101a中的任一像素区域101a接收到目标光线的照射后，均可以被与其对应的光敏元件201检测到，从而能够将这4个像素区域101a组成的最小的擦除区域所显示的书写笔迹进行擦除。
可选的，黑矩阵400中的通光孔401在第一基板101上的正投影的面积不 能过小，以保证目标光线能够正常穿过通光孔401后进入光敏元件201。黑矩阵400中的通光孔401在第一基板101上的正投影的面积也不能过大，以保证液晶手写板000中的双稳态液晶分子在呈现焦锥织构时，目标光线能够穿过液晶层103后被黑矩阵400吸收，使得其呈现出黑色背景。示例的，黑矩阵400中的通光孔401在第一基板101上的正投影的面积占对应的像素区域101a的面积的百分比的范围为5％至20％。例如，假设，第一基板101的像素区域101a的尺寸为1mm*1mm(毫米)，本申请中通光孔401在第一基板101上的正投影的面积占对应的像素区域101a的面积的百分比为10％，则，黑矩阵400中的通光孔401的尺寸为0.1mm*0.1mm。
在本申请实施例中，在目标方向上，至少两个相邻的像素区域101a所对应的至少两个通光孔401中，任意两个相邻的通光孔401的排布方向与该目标方向相交。例如，任意两个相邻的像素区域101a所对应的两个通光孔401的排布方向与该目标方向相交。其中，目标方向为一排像素区域101a的排布方向，该一排像素区域101a的排布方向可以为像素区域的行排布方向、像素区域的列排布方向或像素区域的倾斜排布方向。如此，可以保证黑矩阵400中的多个通光孔401是呈杂乱分布的，以避免黑矩阵400中的通光孔401在排布呈一行或排布为一列时，在液晶面板000的背面出现漏光后让其呈现出亮线的问题。
可选的，黑矩阵400中的多个通光孔401包括至少一个通光孔组，通光孔组中的各个通光孔401在第一基板101上的正投影在对应的像素区域101a内的分布位置不同。在本申请中，黑矩阵400中的多个通光孔401被划分为多个通光孔组时，各个通光孔组中的通光孔401的排布方式可以相同。例如，每36个像素区域101a对应的36个通光孔401可以组成一个通光孔组，且这36个像素区域101a可以排布为六行和六列。每个通光孔组中的各个通光孔401在第一基板101上的正投影在对应的像素区域101a内的位置不同。通过对多个通光孔401进行分组划分的方式，可以有效的降低黑矩阵400的制造难度。
可选的，请参考图9和图10，图9是本申请实施例提供的一种第一基板的俯视图，图10是图9示出的第一基板在B-B’处的膜层结构示意图。液晶面板100中的第一基板101可以包括：第一衬底1012，以及位于第一衬底1012上的多个像素电极1011和多个驱动薄膜晶体管(英文：Thin-film transistor；简称：TFT)1013。其中，第一基板101中的多个像素电极1011和多个驱动TFT 1013一一对应电连接。
在本申请实施例中，液晶手写板000中的黑矩阵400的位置有多种位置，本申请实施例以以下两种情况对应的实现方式为例进行示意性的说明。
第一种情况，如图10所示，液晶手写板000中的黑矩阵400位于第一基板101中的第一衬底1012背离第二基板102的一侧。
第二种情况，如图11所示，图11是图9示出的第一基板在B-B’处的另一种膜层结构示意图。液晶手写板000中的黑矩阵400位于第一基板101中的第一衬底1012朝向第二基板102的一侧。在这种情况下，由于黑矩阵400也具备一定的导电性能，因此，为了避免第一衬底1012上的各个驱动TFT 1013发生短路的现象，需要在黑矩阵400与驱动TFT 1013之间设置第一绝缘层1014。示例的，该第一绝缘层1014可以为透明的绝缘层，这样，可以在不影响目标光线通过黑矩阵400中的通光孔401射向光敏组件200的前提下，对黑矩阵400与驱动TFT 1013进行绝缘。
在本申请实施例中，上述的两种情况中的黑矩阵400在第一衬底1012上形成的工艺均可以为：丝网印刷工艺或构图工艺。
当采用丝网印刷工艺在第一衬底1012上形成黑矩阵400时，可以采用丝网印刷设备在第一衬底1012上印刷一层黑色油墨，并对其进行烘干处理后即可得黑矩阵400。
当采用构图工艺在第一衬底1012上形成黑矩阵400时，可以在第一衬底1012通过沉积、涂敷、溅射等多种方式中的任一种形成黑色薄膜，然后对该黑色薄膜进行曝光处理和显影处理即可得到黑矩阵400。
在本申请实施例中，由于液晶手写板000中的黑矩阵400能够替代传统的液晶手写板中的黑色铝蜂窝板，且黑矩阵400的厚度相对于黑色铝蜂窝板的厚度较小。因此，本申请实施例提供的液晶手写板000的厚度较小，且重量较小。
需要说明的是，液晶手写板000中的黑矩阵400不仅可以集成在第一基板101内，也可以集成在光敏组件200内。示例的，如图12所示，图12是本申请实施例提供一种的光敏组件的膜层结构示意图。光敏组件200还可以包括：位于多个光敏元件201远离电路板202一侧的平坦层203，液晶手写板000中的黑矩阵400可以位于平坦层203远离电路板202的一侧。其中，该平坦层203可以为透明的绝缘层，这样，不仅可以保证平坦层203能够提高光敏组件朝向第一基板101一侧的平坦性，以保证黑矩阵400的平坦性较号，还可以在不影响目标光线通过黑矩阵400中的通光孔401射向光敏组件200的前提下，对黑矩 阵400与光敏元件201进行绝缘。
可选的，如图10和图11所示，第一基板101中的驱动TFT 1013可以包括：栅极1013a、第一极1013b、第二极1013c和有源层1013d。在驱动TFT 1013中，第一极1013b和第二极1013c均与有源层1013d搭接，且有源层1013d与栅极1013a绝缘，例如，有源层1013d与栅极1013a之间可以通过栅极绝缘层1015绝缘。需要说明的是，本申请实施例均是以驱动TFT 1013中的栅极1013a相对于有源层1013d靠近衬底1012的一侧为例进行示意性说明的，也即是驱动TFT1013为底栅型的TFT。在其他可能的实现方式中，驱动TFT 1013还可以为顶栅型的TFT，本申请实施例对此不做限定。还需要说明的是，驱动TFT 1013中的第一极1013b可以为源极和漏极中的一个，第二极1013c可以为源极和漏极中的另一个。
在本申请实施例中，如图10和图11所示，第一基板101还可以包括：位于驱动TFT 1013与像素电极1011之间的第二绝缘层1016。其中，该像素电极1011可以位于第二绝缘层1016上，该第二绝缘层1016不仅能够对驱动TFT 1013进行保护，还能够提高像素电极1011的平坦性。在这种情况下，该第二绝缘层1016具有第一过孔V1，像素电极1011可以通过该第一过孔V1与驱动TFT 1013中的第二极1013c电连接。
第一基板101还可以包括：位于像素电极1011远离第一衬底1012一侧的第三绝缘层1017。在将第一基板101与第二基板102相对设置时，由于设备环境非无尘环境，因此会导致第一基板101与第二基板102之间出现异物，通过第三绝缘层1017可以用于防止位于第一基板101与第二基板102之间的异物，导通第一基板101中的像素电极1011和第二基板102中的公共电极1021。
如图9所示，第一基板101还可以包括：与驱动TFT 1013中的栅极1013a电连接的第一栅线G1，以及与TFT 1013中的第一极1013b电连接的数据信号线D1。其中，第一栅线G1的条数通常为多条，且多条第一栅线G1是平行排布的；数据信号线D1的条数为多条，且多条数据信号线D1是平行排布的。该第一栅线G1的延伸方向与数据信号线D1的延伸方向是垂直的。如此，任意两条相邻的第一栅线G1与任意两条相邻的数据信号线D1可以围成一个呈矩形状的像素区域101a。
在本申请实施例中，第一基板101中的第一栅线G1与数据信号线D1均可以与控制组件300电连接，以保证控制组件300能够通过第一栅线G1与数据信 号线D1向像素电极1011施加像素电压。
第二种可选的实现方式，请参考图13，图13是本申请实施提供的又一种液晶手写板的结构示意图。液晶手写板000中的光敏组件200可以集成在第一基板100内。如此，无需在液晶手写板000中的液晶面板100贴合具有光敏元件的电路板，保证液晶手写板000的厚度较低。
在本申请实施例中，液晶手写板000还可以包括：黑色膜层500。其中，黑色膜层500可以位于液晶面板100中的液晶层103远离第二基板102的一侧。如此，液晶手写板000中的双稳态液晶分子在呈现焦锥织构时，目标光线能够穿过液晶层103后被黑色膜层500吸收，使得其呈现出黑色背景。需要说明的是，黑色膜层500与上述第一种可选的实现方式中的黑矩阵400的区别仅在于：黑色膜层500中无需设置通光孔，为此，该黑色膜层500的设置位置和形成方式均可以参考上述第一种可选的实现方式中的黑矩阵400的设置位置和形成方式，本申请实施例对此不再赘述。
如图14所示，图14是本申请实施例提供的一种第一基板和黑色膜层叠层后的俯视图。由于第一基板101通常为集成了多个阵列排布的驱动TFT 1013的基板，因此，为了保证光敏组件200能够集成在第一基板101内，可以将光敏元件201作为能够对目标光线进行检测的光敏TFT。也即是，光敏组件200中的各个光敏元件201均可以为光敏TFT 201’。
在本申请实施例中，第一基板101中的多个光敏元件TFT 201’可以与多个像素区域101a一一对应的，且每个光敏元件TFT 201’可以位于对应的像素区域101a内。
在这种情况下，射向液晶面板100中的第一基板101的各个像素区域101a的目标光线，可以被各个像素区域101a内设置的光敏TFT 201’进行感测，以保证光敏组件200可以通过多个光敏TFT 201’感测到射向多个像素区域101a中的任一像素区域101a的目标光线。并且，通过单独的光敏TFT 201’感测射向像素区域101a的目标光线时，无需目标光线的光强过大便能够让光敏TFT 201’感测到目标光线，这样，仅需要保证目标光线的光强略大于环境光线的光强即可，使得射向像素区域101a的目标光线不会影响驱动TFT 1013的正常工作。
在本申请实施例中，如图15和图16所示，图15是本申请实施例提供的一种第一基板中的一个像素区域的俯视图，图16是图15示出的第一基板在C-C’ 处的膜层结构示意图。第一基板101可以包括：第一衬底1012，以及位于第一衬底1012上的多个像素电极1011和多个驱动TFT 1013。需要说明的是，第一基板101中的像素电极1011与驱动TFT 1013连接的方式，第一基板101中包含的其他结构均可以参考上述第一种可选的实现方式中的对应内容，本申请实施例在此不再赘述。为了简化第一基板101的制造工艺，需要保证第一基板101内的驱动TFT 1012与光敏TFT 201’同层设置。也即是，在第一基板101的制造过程中，驱动TFT 1012与光敏TFT 201’是同时形成的。
示例的，光敏TFT 201’可以包括：栅极201a、第一极201b、第二极201c和有源层201d。在光敏TFT 201’中，第一极201b和第二极201c均与有源层201d搭接，且有源层201d与栅极201a绝缘，例如，有源层201d与栅极201a之间可以通过栅极绝缘层1015绝缘。需要说明的是，驱动光敏TFT 201’中的第一极201b可以为源极和漏极中的一个，第二极201c可以为源极和漏极中的另一个。
在这种情况下，光敏TFT 201’中的栅极201a与驱动TFT 1013中的栅极1013a是通过一次构图工艺形成的；光敏TFT 201’中的第一极201b和第二极201c，和驱动TFT 1013中的第一极1013b和第二极1013c是通过一次构图工艺形成的；光敏TFT 201’中的有源层201d与驱动TFT 1013中的栅极1013d是通过一次构图工艺形成的。需要说明的是，本申请实施例中的一次构图工艺是指：光刻胶涂覆、曝光、显影、刻蚀和光刻胶剥离。
可选的，如图15所示，光敏组件200还具有与光敏TFT 201’的第一极201b电连接的光敏信号线D2，以及与光敏TFT 201’的第二极201c电连接的第一感测线L1和第二感测线L2。其中，液晶手写板000中控制组件200可以分别与光敏信号线D2、第一感测线L1和第二感测线L2电连接，且第一感测线L1的延伸方向与第二感测线L2的延伸方向垂直，第一感测线L1的延伸方向可以与光敏信号线D2的延伸方向平行。
在本申请实施例中，光敏组件200中的光敏信号线D2、第一感测线L1和第二感测线L2的条数均可以为多条。多个光敏TFT 201’是呈阵列排布的，每条光敏信号线D2可以与一列光敏TFT 201’的第一极201b电连接，且每条第一感测线L1可以与一列光敏TFT 201’的第二极201c电连接，每条第二感测线L2可以与一行光敏TFT 201’的第二极201c电连接。如此，任意两条相交的第一感测线L1与第二感测线L2在交叉位置可以与同一个感光TFT 201’的第二 极201c电连接。
在这种情况下，在感光组件200处于工作状态时，控制组件300可以同时向光敏信号线D2施加电信号。在没有目标光线照射的情况下，光敏TFT 201’的第一极201b和第二极201c之间无法导通，使得光敏信号线D2上施加电信号无法传输给第一感测线L1和第二感测线L2。在目标光线照射的情况下，光敏TFT 201’的有源层201d内的空穴-电子对的数量增加，使得该光敏TFT 201’中的漏电流增大，使得光敏TFT 201’的第一极201b和第二极201c导通，进而使得光敏信号线D2上施加电信号可以传输给第一感测线L1和第二感测线L2。并且，第一感测线L1和第二感测线L2可以均与控制组件300电连接，如此，控制组件300能够通过感测第一感测线L1的电流变化和第二感测线L2的电流变化，对感测到目标光线的光敏TFT 201’进行定位，进而可以确出定目标光线照射到像素区域101a的位置。
可选的，光敏组件200还具有与光敏TFT 201’的栅极201a电连接的第二栅线G2。第二栅线G2也可以与控制组件300电连接，且该第二栅线G2的延伸方向可以与第二感测线L2的延伸方向平行。在感光组件200处于工作状态时，控制组件300可以通过第二栅线G2向光敏TFT 201’的栅极201a施加栅极电压，该栅极电压较小，在没有目标光线照射的情况下，光敏TFT 201’的栅极201a上加载的栅极电压无法控制光敏TFT 201’的第一极201b和第二极201c导通。通过第二栅线G2向光敏TFT 201’的栅极201a施加伏值较小的栅极电压，可以保证目标光线在射向光敏TFT201’的有源层201d时，让光敏TFT 201’的第一极201b和第二极201c导通。
在本申请实施例中，为了简化第一基板101的制造难度，可以将第一基板101内的数据信号线D1、光敏信号线D2和第一感测信号线L1同层设置，也即是，可以采用一次构图工艺同时形成包括数据信号线D1、光敏信号线D2和第一感测信号线L1的源漏极金属层；且可以将第一基板101内的第一栅线G1、第二栅线G2和第一感测信号线L2同层设置，也即是，可以采用一次构图工艺同时形成包括第一栅线G1、第二栅线G2和第二感测信号线L2的栅极金属层。其中，源漏极金属层还可以包括：第一基板101内集成的TFT的第一极和第二极，栅极金属层还可以包括：第一基板101内集成的TFT的栅极。
在这种情况下，如图16所示，光敏信号线D2可以直接与光敏TFT 201’中的第一极201b电连接，第一感测信号线L1可以直接与光敏TFT 201’中的第 二极201c电连接。而第一基板101中的栅极金属层与源漏极金属层之间通常存在栅极绝缘层1014，为了保证第二感测信号线L2能够与光敏TFT 201’中的第二极201c电连接，可以采用转接电极连接第二感测信号线L2和光敏TFT 201’中的第二极201c。
示例的，感光组件200还具有与像素电极1011同层设置的转接电极204，该转接电极204可以分别与光敏TFT 201’中的第二极201c和第二感测信号线L2电连接。例如，第一基板101中的第二绝缘层1016还具有第二过孔V2，且第一基板101中的栅极绝缘层1015和第二绝缘层1016具有相互连通的第三过孔V3。如此，转接电极204可以通过第二过孔V2与光敏TFT 201’中的第二极201c电连接，转接电极204还可以通过第三过孔V3与第二感测信号线L2电连接。
需要说明的是，像素电极1011可以与转接电极204采用同一次构图工艺形成，且像素电极1011与转接电极204之间可以通过狭缝d绝缘。
可选的，为了减小第一基板101内的走线数量，可以将第一基板101内的数据信号线D1与光敏信号线D2进行复用。在这样情况下，光敏TFT 201’中的第一极201b与驱动TFT 1013中的第二极1013c可以与同一条数据线连接。驱动组件300可以通过分时驱动的方式分别驱动光敏TFT 201’和驱动TFT1013a进行工作。例如，每个驱动周期可以分别第一子周期和第二子周期，在第一子周期内，控制组件300可以向数据线发出第一驱动信号，以保证光敏TFT201’能够进行工作，进而可以确定出目标光线的照射位置；在第二子周期内，控制组件300可以向数据线发出第二驱动信号，以保证驱动TFT 1013能够进行工作，进而能够实现向待擦除的像素区域内的像素电极1011施加像素电压。
在本申请实施例中，光敏TFT 201’中的有源层201d具有沟道区，沟道区是指有源层201d中位于有源层201d与第一极201b接触的区域，和有源层201d与第二极201c接触的区域之间的区域。其中，TFT 201’中的有源层201d具有沟道区可以为一字型沟道区、U型沟道区或L型沟道区。在本申请中，该有源层201d的沟道区的长宽比的范围可以为(4～10)/(2.5～6)。例如，该有源层201d的沟道区的长宽比可以为5/4。需要说明的是，第一基板101中的驱动TFT1013的结构可以与光敏TFT 201’的结构相同，也即是，驱动TFT 1013中的有源层1013d的沟道区可以为一字型沟道区、U型沟道区或L型沟道区。
结合上述两种可选的实现方式，请参考图17，图17是本申请实施例提供的 一种控制组件的结构框图。控制组件300可以包括：感测芯片301和驱动芯片302。其中，感测芯片301可以与驱动芯片302电连接。控制组件300中的驱动芯片302可以与液晶面板100中的第一基板101电连接；控制组件300中的感测芯片201可以与光敏组件200电连接。这里，感测芯片201可以通过光敏组件200确定感应到目标光线的光敏元件201在多个光敏元件201中的位置，以确定待擦除的像素区域的位置信息；之后，该感测芯片301可以将待擦除的像素区域的位置信息发送给驱动芯片302，使得驱动芯片302能够向待擦除的像素区域内的像素电极施加像素电压。
对于控制组件300与第一基板101之间的电连接，以及与光敏组件200之间的电连接。由于光敏组件200的结构有两种可选的实现方式，为此，本申请实施例将以以下两种情况分别进行说明。
第一种情况，当光敏组件200的结构为上述第一种可选的实现方式示出的结构时，控制组件300中的感测芯片301可以与光敏组件200中的电路板202电连接；控制组件300中的驱动芯片302可以分别与第一基板101中的第一栅线G1和数据信号线D1电连接。
第二种情况，当光敏组件200的结构为上述第二种可选的实现方式示出的结构时，控制组件300中的感测芯片301可以分别与光敏组件200中的第一感测线L1和第二感测线L2电连接；控制组件300中的驱动芯片302可以分别与第一基板101中的第一栅线G1和数据信号线D1电连接，且该驱动芯片302还可以分别与光敏组件200中的第二栅线G2和感光信号线D2电连接。
在本申请中，如图18和图19所示，图18是本申请实施例提供的一种液晶面板的膜层结构示意图，图19是图18示出的液晶面板中的第一基板的俯视图。液晶手写板000中的第一基板101还可以包括：位于衬底基板101上的辅助电极线1018，该辅助电极线1018可以与第一栅线G1同层设置，且该辅助电极线1018的延伸方向与第一栅线G1的延伸方向相同。
示例的，第一基板101中的像素电极1011排布为多行，该第一基板101中的辅助电极线1018的条数为与像素电极1011的行数相同。每条辅助电极线1018在第一衬底1012上的正投影，与对应的一行像素电极1011在第一衬底1012上的正投影交叠，该辅助电极线1018可以与一行像素电极1011中的每个像素电极1011构成存储电容Cst。该存储电容Cst可以用于保持像素电极1011的像素电压，因此，当液晶手写板000进行擦除时，该存储电容Cst可以避免待擦除的 像素区域内的像素电极1011的电压变化，影响其周围的像素电极1011的电压，进而避免了影响待擦除的像素区域周围的像素区域的显示效果。
可选的，液晶面板100中的第二基板102包括：第二衬底1022，以及位于第二基板102中第二衬底1022上的公共电极1021。其中，公共电极1021上可以加载恒定的公共电压(例如，0伏电压)，从而可以保证在像素电极1011被施加像素电压时，二者之间能够形成电压差。第二衬底1022可以为柔性衬底，该第二衬底1022的材料可以包括：聚对苯二甲酸乙二醇酯(英文：Polyethylene Terephthalate；简称：PET)。
在本申请实施例中，第一基板101中的像素电极1011和第二基板102中的公共电极1021的材料均可以包括：氧化铟锡(英文：Indium Tin Oxide；简称：ITO)或氧化铟锌(英文：Indium Zinc Oxide；简称：IZO)等透明导电材料。如此，可以保证目标光线可以穿过液晶面100后射向光敏组件200。
综上所述，本申请实施例提供的液晶手写板，包括：液晶面板、光敏组件和驱动组件。当需要对液晶手写板所显示的书写笔迹进行擦除时，可以采用能够发射目标光线的擦除工具对该书写笔迹进行擦除。由于光敏组件中的光敏元件在液晶面板中的第一基板上的正投影与对应的像素区域至少部分交叠。因此，在擦除工具向液晶面板发射目标光线后，光敏组件可以通过至少部分光敏元件所感应到的目标光线，确定目标光线照射到液晶面板上的位置，目标光线照射到液晶面板上的位置即为待擦除的像素区域的位置。如此，液晶手写板可以通过控制组件向待擦除的像素区域内的像素电极施加像素电压，以实现对待擦除的像素区域内的书写笔迹进行擦除。在这种情况下，即使用户在书写的过程中，用户的手部与液晶手写板进行接触，光敏组件也不会将用户与液晶手写板接触的区域识别为待擦除的像素区域，进而降低了液晶手写板出现误擦现象的概率，有效的提高了液晶手写板进行局部擦除时的擦除效果。
本申请实施例还提供了一种手写系统，请参考图20，图20是本申请实施例提供的一种手写系统的结构示意图。该手写系统可以包括：擦除工具111和液晶手写板000。其中，液晶手写板000可以为上述实施例中的液晶手写板，例如，该液晶手写板000可以为图4、图5或图13示出的液晶手写板。擦除工具111可以具有发光组件111a，该发光组件111a用于发出目标光线。这里，发光组件111a所发出的目标光线的光强需要远大于环境光线的光强，使得液晶手写板000 中的光敏组件200能够对目标光线和环境光线进行区别；发光组件111a所发出的目标光线为除绿色光线之前的其他颜色的光线，以保证目标光线不会被呈平面织构的双稳态液晶分子反射。
在本申请实施例中，液晶手写板000可以被配置为：在擦除工具111的发光组件111a向液晶面板100发射目标光线后，通过光敏组件200检测目标光线照射的位置信息，以确定待擦除区域的位置信息。
示例的，在需要对液晶手写板000所显示的书写笔迹进行擦除时，可以采用擦除工具111中的发光组件111a向液晶面板000的待擦除区域发射目标光线。之后，液晶手写板000可以通过光敏组件200检测目标光线在液晶面板000上的照射的位置信息，如此，液晶手写板000中的控制组件300便能够通过光敏组件200到的目标光线的照射的位置信息，确定出待擦除的像素区域的位置信息，并向该待擦除的像素区域内的像素电极施加像素电压，使得待擦除的像素区域内的书写笔迹被擦除。
可选的，请参考图21，图21是本申请实施例提供的一种液晶手写板的产品结构示意图。为了保证液晶手写板000的功耗较低，可以在液晶手写板000中设置切换开关600。其中，切换开关600可以与控制组件300电连接，该切换开关600用于控制液晶手写板000进行擦除模式和书写模式之间的切换。其中，在液晶手写板000处于书写模式时，控制组件300和光敏组件200均处于非工作状态，此时，液晶手写板000无需为控制组件300和光敏组件200供电；在液晶手写板000处于擦除模式时，控制组件300和光敏组件200均处于工作状态，此时，液晶手写板000才需要为控制组件300和光敏组件200供电。如此，仅在液晶手写板000处于擦除模式时，液晶手写板000才需要消耗电能，有效的降低了液晶手写板000的功耗。
在本申请实施例中，如图21所示，手写系统中的板擦工具111中也可以设置有开关按钮111b。用户可以通过对板擦工具111b中的开关按钮111b的按压操作，让板擦工具111中的发光组件111a发射目标光线或停止发射目标光线。
本申请实施例还提供了一种手写系统的控制方法，请参考图22，图22是本发明实施例提供的一种手写系统的控制方法的流程图。该手写系统的控制方法可以应用于上述实施例中的手写系统，例如，该手写系统可以为图20或图21示出的手写系统。该手写系统的控制方法可以包括：
步骤S1、在擦除工具的发光组件向液晶面板发射目标光线后，液晶手写板通过光敏组件检测目标光线照射的位置信息，以确定待擦除的像素区域的位置信息。
步骤S2、液晶手写板基于待擦除的像素区域的位置信息，通过控制组件向待擦除的像素区域内的像素电极施加像素电压，以使待擦除的像素区域内的像素电极与公共电极之间形成电压差。
所属领域的技术人员可以清楚地了解到，为描述的方便和简洁，上述描述的手写系统的控制方法的具体工作原理，可以参考前述手写系统的结构的实施例和液晶手写面板的结构实施例中的对应部分，在此不再赘述。
需要指出的是，在附图中，为了图示的清晰可能夸大了层和区域的尺寸。而且可以理解，当元件或层被称为在另一元件或层“上”时，它可以直接在其他元件上，或者可以存在中间的层。另外，可以理解，当元件或层被称为在另一元件或层“下”时，它可以直接在其他元件下，或者可以存在一个以上的中间的层或元件。另外，还可以理解，当层或元件被称为在两层或两个元件“之间”时，它可以为两层或两个元件之间惟一的层，或还可以存在一个以上的中间层或元件。通篇相似的参考标记指示相似的元件。
在本申请中，术语“第一”和“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性。术语“多个”指两个或两个以上，除非另有明确的限定。
以上所述仅为本申请的可选的实施例，并不用以限制本申请，凡在本申请的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本申请的保护范围之内。

Claims (15)

  1. 一种液晶手写板，其特征在于，包括：液晶面板、光敏组件和控制组件；
    所述液晶面板包括：相对设置的第一基板和第二基板，所述第一基板具有多个像素区域，以及位于所述像素区域内的像素电极，所述第二基板具有公共电极；
    所述光敏组件具有多个光敏元件，一个所述光敏元件与至少一个所述像素区域对应，且所述光敏元件在所述第一基板上的正投影与对应的至少一个所述像素区域至少部分交叠；
    所述控制组件分别与所述液晶面板和所述光敏组件电连接，所述控制组件被配置为：通过所述光敏组件检测目标光线照射在所述液晶面板上的位置信息，以确定待擦除的像素区域的位置信息，并向所述待擦除的像素区域内的像素电极施加像素电压，以使所述待擦除的像素区域内的像素电极与所述公共电极之间形成电压差。
  2. 根据权利要求1所述的液晶手写板，其特征在于，所述光敏组件位于所述第一基板远离所述第二基板的一侧。
  3. 根据权利要求2所述的液晶手写板，其特征在于，所述液晶手写板还包括：黑矩阵，所述黑矩阵位于所述多个像素电极与所述多个光敏元件之间，所述黑矩阵具有多个通光孔，所述多个通光孔与所述多个像素区域一一对应，所述通光孔在所述第一基板上的正投影位于对应的像素区域内，且所述光敏元件与至少一个所述通光孔对应，所述通光孔在所述第一基板上的正投影与对应的光敏元件在所述第一基板上的正投影至少部分交叠。
  4. 根据权利要求3所述的液晶手写板，其特征在于，在目标方向上，至少两个相邻的像素区域所对应的至少两个通光孔中，任意两个相邻的通光孔的排布方向与所述目标方向相交，所述目标方向为一排所述像素区域的排列方向。
  5. 根据权利要求4所述的液晶手写板，其特征在于，所述多个通光孔包括至少一个通光孔组，所述通光孔组中的各个通光孔在所述第一基板上的正投影在 对应的像素区域内的分布位置不同。
  6. 根据权利要求3所述的液晶手写板，其特征在于，所述第一基板包括：第一衬底，以及位于所述第一衬底上的所述多个像素电极和多个驱动薄膜晶体管TFT，所述多个像素电极与多个驱动TFT一一对应电连接；
    其中，所述黑矩阵位于所述第一衬底背离所述第二基板的一侧；
    或者，所述黑矩阵位于所述第一衬底朝向所述第二基板的一侧，且所述第一基板还包括：位于所述黑矩阵与所述驱动TFT之间的第一绝缘层。
  7. 根据权利要求3所述的液晶手写板，其特征在于，所述通光孔在所述第一基板上的正投影的面积占对应的像素区域的面积的百分比的范围为5％至20％。
  8. 根据权利要求2-7任一所述的液晶手写板，其特征在于，所述光敏组件包括：电路板，以及位于所述电路板上的所述多个光敏元件，所述多个光敏元件均与所述电路板电连接，且所述电路板与所述控制组件电连接。
  9. 根据权利要求1所述的液晶手写板，其特征在于，所述光敏组件集成在所述第一基板内，所述光敏元件为光敏TFT，多个所述光敏TFT与所述多个像素区域一一对应，且所述光敏TFT位于对应的像素区域内。
  10. 根据权利要求9所述的液晶手写板，其特征在于，所述光敏组件还具有与所述光敏TFT的第一极电连接的光敏信号线，以及与所述光敏TFT的第二极电连接的第一感测线和第二感测线；
    其中，所述控制组件分别与所述光敏信号线、所述第一感测线和所述第二感测线电连接，且所述第一感测线的延伸方向与第二感测线的延伸方向垂直。
  11. 根据权利要求10所述的液晶手写板，其特征在于，所述光敏组件还具有与所述像素电极同层设置的转接电极，所述转接电极分别与所述光敏TFT的第二极和所述第二感测线电连接。
  12. 根据权利要求9-11任一所述的液晶手写板，其特征在于，所述第一基板 包括：第一衬底，以及位于所述第一衬底上的所述多个像素电极和多个驱动TFT，所述多个像素电极与所述多个驱动TFT一一对应电连接，所述多个驱动TFT与多个所述光敏TFT同层设置。
  13. 根据权利要求1-7、9-11任一所述的液晶手写板，其特征在于，所述液晶面板还包括：位于所述第一基板和所述第二基板之间的双稳态液晶分子层；
    所述双稳态液晶分子层中的双稳态液晶分子被配置为：在所述液晶面板受到外部压力后，由焦锥织构转变为平面织构；在所述待擦除的像素区域内的像素电极与所述公共电极之间形成电压差后，由平面织构转变为焦锥织构。
  14. 一种手写系统，其特征在于，包括：擦除工具和权利要求1-13任一所述的液晶手写板；
    其中，所述擦除工具具有发光组件，所述液晶手写板被配置为：在所述擦除工具的发光组件向所述液晶面板发射目标光线后，通过所述光敏组件检测所述目标光线照射的位置信息，以确定待擦除的像素区域的位置信息。
  15. 一种手写系统的控制方法，其特征在于，应用于权利要求14所述的手写系统，所述方法包括：
    在所述擦除工具的发光组件向所述液晶面板发射目标光线后，所述液晶手写板通过所述光敏组件检测所述目标光线照射的位置信息，以确定待擦除的像素区域的位置信息；
    所述液晶手写板基于所述待擦除的像素区域的位置信息，通过所述控制组件向所述待擦除的像素区域内的像素电极施加像素电压，以使所述待擦除的像素区域内的像素电极与所述公共电极之间形成电压差。
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