WO2023040117A1 - Array substrate, display panel, and electronic device - Google Patents

Array substrate, display panel, and electronic device Download PDF

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Publication number
WO2023040117A1
WO2023040117A1 PCT/CN2021/142289 CN2021142289W WO2023040117A1 WO 2023040117 A1 WO2023040117 A1 WO 2023040117A1 CN 2021142289 W CN2021142289 W CN 2021142289W WO 2023040117 A1 WO2023040117 A1 WO 2023040117A1
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WO
WIPO (PCT)
Prior art keywords
aperture area
array substrate
imaging aperture
line
imaging
Prior art date
Application number
PCT/CN2021/142289
Other languages
French (fr)
Chinese (zh)
Inventor
毛晗
郑浩旋
Original Assignee
惠科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Publication of WO2023040117A1 publication Critical patent/WO2023040117A1/en

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line

Definitions

  • the present application relates to the technical field of display devices, in particular to an array substrate, a display panel and electronic devices.
  • the metal traces at the camera hole are all of the same line width, and the metal traces around the camera hole are longer than the non-camera hole positions, which leads to uneven loads on capacitors and resistors. , prone to uneven display problems.
  • the main purpose of this application is to propose an array substrate.
  • the metal wiring at the imaging hole and the cutout of the array substrate the metal wiring at the imaging hole and the rest of the metal wiring have the same load value, thereby Solve the problem of uneven display caused by different loads.
  • the array substrate proposed in this application includes a substrate and a plurality of parallel scanning lines and a plurality of parallel data lines arranged on the substrate, each of the scanning lines and each of the data lines Vertically staggered, the base is provided with a camera hole area;
  • At least two parts of the data lines are arranged around the area of the imaging aperture, at least two parts of the scanning lines are arranged around the area of the imaging aperture, and the setting part is arranged around the area of the imaging aperture
  • the scanning line is the first scanning line
  • the scanning line not surrounding the imaging aperture area is the second scanning line
  • the data line surrounding the imaging aperture area is set as the first data line
  • the scanning line not surrounding the imaging aperture area is set as the first scanning line.
  • the scanning line is the second data line;
  • the width of the portion of the first data line and/or the first scanning line surrounding the imaging aperture area increases gradually.
  • the number of pixel units formed by two adjacent data lines and scanning lines is gradually decreased with tolerances such as the first tolerance
  • the number of pixel units formed by two adjacent scan lines and data lines decreases gradually with a tolerance such as a second tolerance.
  • the width of the part of the first scanning line surrounding the imaging aperture area increases with tolerances such as the third tolerance, wherein, The third tolerance is equal to the first tolerance.
  • the width of the first data line increases with tolerances such as the fourth tolerance, wherein the fourth tolerance is equal to the second tolerance.
  • the shape of the imaging hole area is a drop shape or a bang shape
  • the number of pixel units formed by two adjacent first scanning lines and data lines is in a first non-arithmetic sequence decrease
  • the number of pixel units formed by adjacent two first data lines and scanning lines decreases in a second asymmetric sequence.
  • the width of the part of the first scanning line surrounding the imaging aperture area increases in a first unequal sequence .
  • the width of the part of the first data line surrounding the imaging aperture area increases in a second non-alertometric sequence.
  • each of the first scanning lines includes two first straight line segments and a first arc line segment, and the two ends of the first arc line segment are respectively connected to the two first straight line segments , the first arc segment closest to the camera hole area is spaced from the edge of the camera hole area;
  • each of the first data lines includes two second straight line segments and a second arc segment, the two ends of the second arc segment are respectively connected to the two second straight line segments, and the closest The second arc segment of the camera hole area is spaced apart from the edge of the camera hole area.
  • the present application also proposes a display panel, including a color filter substrate, an array substrate, and a liquid crystal layer, the color filter substrate and the array substrate are arranged in a box, and the array substrate is the array substrate as described above.
  • the present application also proposes an electronic device, which includes a housing and a display panel disposed on the housing, where the display panel is the above-mentioned display panel.
  • the array substrate includes a substrate and data lines and scanning lines arranged on the substrate, and an imaging hole area is also arranged on the substrate, and the data lines and scanning lines are arranged in sequence and staggered.
  • the first A part of a data line surrounds the imaging hole area, and the number of segments that normally form pixels becomes less.
  • the second data line is not affected by the imaging hole area and has a normal length.
  • a part of the first scanning line surrounds the imaging hole. area, the number of segments that normally form pixels is reduced, and the length of the second scanning line is normal. The smaller the number, the corresponding resistance load increases and the capacitive load decreases.
  • the width of the part of the first data line and/or the first scanning line surrounding the imaging aperture area increases gradually, and also That is, reduce the resistive load of the first data line and/or the first scan line, increase the capacitive load of the first data line and/or the first scan line, thereby compensating for the lost pixel load, effectively reducing the Load difference to improve display quality.
  • FIG. 1 is a schematic top view of an array substrate in Embodiment 1 of the present application.
  • FIG. 2 is an arrangement diagram of pixel units in the array substrate shown in FIG. 1;
  • FIG. 3 is a partially enlarged structural schematic diagram of scanning lines in the array substrate shown in FIG. 1;
  • FIG. 4 is a partially enlarged structural schematic diagram of data lines in the array substrate shown in FIG. 1;
  • FIG. 5 is a schematic top view of the array substrate in Embodiment 2 of the present application.
  • FIG. 6 is an arrangement diagram of pixel units of the array substrate shown in FIG. 5;
  • FIG. 7 is a partially enlarged structural schematic diagram of the scanning lines corresponding to the array substrate shown in FIG. 5;
  • FIG. 8 is a partially enlarged structural schematic diagram of data lines corresponding to the array substrate shown in FIG. 5;
  • FIG. 9 is a schematic top view of the array substrate in Embodiment 3 of the present application.
  • FIG. 10 is an arrangement diagram of pixel units of the array substrate shown in FIG. 9;
  • FIG. 11 is a schematic structural diagram of scanning lines corresponding to the array substrate shown in FIG. 9;
  • FIG. 12 is a cross-sectional view of a display panel in Embodiment 4 of the present application.
  • FIG. 13 is a partial structural schematic diagram of the first electronic device in Embodiment 5 of the present application.
  • FIG. 14 is a partial structural schematic diagram of the second electronic device in Embodiment 5 of the present application.
  • FIG. 15 is a partial structural diagram of the third electronic device in Embodiment 5 of the present application.
  • the directional indications are only used to explain the position in a certain posture (as shown in the attached figure). If the specific posture changes, the directional indication will also change accordingly.
  • the present application provides an array substrate 100 .
  • the array substrate 100 includes a substrate 10 and a plurality of parallel scanning lines 50 and a plurality of parallel data lines 30 arranged on the substrate 10, each of the scanning lines 50 and each of the data
  • the lines 30 are vertically staggered, and the substrate 10 is provided with an imaging hole area 10a;
  • At least two parts of the data line 30 are arranged around the imaging aperture area 10a, at least two parts of the scanning line 50 are arranged around the imaging aperture area 10a, and the setting part is arranged around the imaging aperture area 10a.
  • the scanning line 50 of the imaging aperture area 10a is the first scanning line 51
  • the scanning line 50 not surrounding the imaging aperture area 10a is the second scanning line 53
  • the data line 30 surrounding the imaging aperture area 10a is set as The first data line 31, the scanning line 50 not surrounding the imaging aperture area 10a is the second data line 33;
  • the width of the portion of the first data line 31 and/or the first scanning line 51 surrounding the imaging aperture area 10a increases gradually.
  • the array substrate 100 is a multi-layer structure, and each layer structure is formed layer by layer through coating, exposure, development and etching processes.
  • the array substrate 100 includes a base 10 , which provides a basic carrier.
  • the base 10 is transparent, and its material may be a transparent glass plate or a quartz plate, which is not limited here, as long as it does not affect the passage of the backlight. Since the substrate 10 is non-conductive, the movement and arrangement of the medium used for display, such as liquid crystal, need electrons to drive, so the array substrate 100 also includes conductive data lines 30 (Data Line, DL) and scanning lines 50 (SL, Scanning line), thin film transistor (TFT switch) and pixel electrode (Pixel Electrode, PE), etc.
  • Data Line, DL Data Line
  • scanning lines 50 SL, Scanning line
  • TFT switch thin film transistor
  • PE Pixel Electrode
  • a plurality of data lines 30 and a plurality of scan lines 50 are intersected to divide the array substrate 100 to form a plurality of pixel regions, and each region corresponds to a pixel electrode and a thin film transistor, because the data lines 30 and the scanning line 50 are opaque, so the part where they are located forms the non-display area of the pixel area, the thin film transistor is also arranged in the non-display area, and the pixel electrode forms the display area of the pixel area.
  • a camera hole area 10a is also provided on the base 10 to correspond to the camera, so that the camera can realize the function of taking pictures or taking photos through the camera.
  • some sections of the scanning line 50 and the data line 30 arranged in a straight line are arc-shaped, so as to fit the edge of the imaging aperture area 10a.
  • the scanning line 50 partially surrounding the imaging aperture area 10a is set as the first scanning line 51
  • the data line 30 partially surrounding the imaging aperture area 10a is set as the first data line 31
  • the normally arranged scanning lines 50 is the second scanning line 53
  • the normally arranged data lines 30 are the second data lines 33 .
  • each of the first scanning lines 51 includes two first straight line segments 511 and a first arc line segment 513, and the two ends of the first arc line segment 513 are connected to the two first straight line segments 511 respectively.
  • the first arc segment 513 is arranged around the imaging aperture area 10a
  • each of the first data lines 31 includes two second straight line segments 311 and a second arc segment 313, and the two ends of the second arc segment 313
  • the two second straight line segments 311 are respectively connected
  • the second arc segment 313 is arranged around the imaging hole area 10a.
  • the length of the first scanning line 51 is greater than the length of the second scanning line 53, and the closer to the imaging aperture area 10a, the longer the length of the first arc segment 513 is, and the shorter the length of the first straight line segment 511 is;
  • the length of the data line 31 is greater than the length of the second data line 33, and the closer to the imaging aperture area 10a, the longer the length of the second arc segment 313, and the shorter the length of the second straight line segment 311, and the pixel unit of the array substrate 100 10b is formed by interlacing at least two of the second data line 33, the second scanning line 53, the first straight line segment 511, and the second straight line segment 311.
  • the imaging The pixel units 10b formed in the aperture area 10a are less than the pixel units 10b in the non-photographic aperture area, so in order to compensate for the capacitance and resistance load here, the width of the first arc segment 513 and the second arc segment 313 here increase, thereby reducing load differences in different regions.
  • the width of each first arc segment 513 and/or each second arc segment 313 may increase uniformly along its extending direction, or may increase in some sections, which is not limited herein.
  • the imaging hole is generally circular, so the imaging hole area 10a is generally set in the shape of a round hole, a drop shape or a bangs shape. Of course, in other embodiments, it can also be set in a square or polygonal shape, which is not limited here. .
  • the array substrate 100 includes a base 10 and data lines 30 and scan lines 50 provided on the base 10, and an imaging hole area 10a is also arranged on the base 10, and the data lines 30 and scan lines 50 are arranged in a staggered order , when passing through the imaging aperture area 10a, a part of the first data line 31 surrounds the imaging aperture area 10a, and the number of segments normally forming pixels becomes less, and the second data line 33 is not affected by the imaging aperture area 10a, as Normal length, part of the first scanning line 51 surrounds the imaging aperture area 10a, and the number of segments that normally form pixels becomes less, the length of the second scanning line 53 is normal, the closer to the first scanning line of the imaging aperture area 10a 51 and the length of the first data line 31 around the longer, then the number of correspondingly formed pixel units 10b is less, the corresponding resistance load increases, and the capacitive load decreases.
  • the width of the part of the first data line 31 and/or the first scanning line 51 surrounding the imaging aperture area 10a is gradually increased, that is, the resistance load of the first data line 31 and/or the first scanning line 51 is reduced, and the first data line is increased.
  • 31 and/or the capacitive load of the first scan line 51 so as to compensate the lost pixel load, effectively reduce the load difference in different regions of the array substrate 100, and improve the display quality.
  • a metal layer is first deposited on the substrate 10, and the metal layer is patterned through a photomask to form the data line 30 on the substrate 10, so that the thin film transistor can be provided with an on-off voltage, simultaneously with the data line 30 A grid is also formed.
  • the process of patterning through a photomask is to deposit a photoresist on the metal layer, expose and develop after being covered by a photomask, and then perform etching.
  • the material of the metal layer is an opaque conductive metal material, such as a combination of one or more of molybdenum, titanium, chromium and aluminum, which is not limited herein.
  • a gate insulating layer is formed on the gate and data lines 30, and an active layer, a source electrode and a drain electrode which are in contact with both ends of the active layer and arranged at intervals are sequentially formed on the gate insulating layer, thereby completing the thin film transistor.
  • a passivation layer is deposited on the source, drain, and gate insulating layers, and the passivation layer is patterned through a photomask process to form a via hole through the passivation layer, which can be exposed part of the drain; finally, a transparent conductive layer is formed on the passivation layer, and the transparent conductive layer is patterned through a photomask process to form a pixel electrode of a specific shape, and the pixel electrode is in electrical contact with the drain through a via hole, thereby corresponding to the pixel unit 10b
  • the display area of the display area is provided with the voltage for liquid crystal movement, and the fabrication of the array substrate 100 is completed.
  • the number of pixel units 10b formed by two adjacent data lines 30 and scanning lines 50 decreases gradually with a first tolerance of d1;
  • the number of pixel units 10b formed by two adjacent scanning lines 50 and data lines 30 has a second tolerance of d2 and other tolerances decrease.
  • the extending direction of the scanning line 50 is the horizontal direction
  • the extending direction of the second data line 33 is the vertical direction.
  • the first arc segment 513 of the first scan line 51 is also arranged axisymmetrically with the diameter in the horizontal direction of the imaging aperture area 10a
  • the second arc segment 313 of the first data line 31 is The vertical diameter of the imaging aperture area 10a is arranged axially symmetrically, and the first straight line segment 511 and the second straight line segment 311 are also arranged axially symmetrically with the diameter of the imaging aperture area 10a as the axis.
  • the first straight line segment 511, the second straight line segment 311, the second scanning line 53, and the second data line 33 are composed of
  • the tolerances such as the number of pixel units 10b decrease, and the first tolerance is set to d1, for example, the number of pixel units 10b normally formed on a second scan line 53 is N1, then the first scan line next to the second scan line 53
  • the number of pixel units 10b formed on 51 is N1-d1, and toward the center of the imaging aperture area 10a, the number of pixel units 10b formed by the first scanning line 51 is N1-2d1, N1-3d1..., located at The row where the first scanning line 51 is located on the diameter of the imaging aperture area 10 a forms the least number of pixel units 10 b.
  • the number of pixel units 10b formed by two adjacent scanning lines 50 and data lines 30 is set to a second tolerance of d2 and other tolerances Decrease, for example, the second data line 33 forms N2 pixel units 10b, then the number of pixel units 10b formed by the first data line 31 is N2-d2, N2-2d2, N2-3d2..., so that the data line 30 And the processing of the scanning line 50 makes the distribution of pixels at the edge of the imaging aperture area 10a uniform, without affecting the display effect.
  • the values of N1 and N2 can be the same, for example, the formed pixel unit 10b is a square; of course, the two can also be different, for example, the formed pixel unit 10b is rectangular, similarly, the first tolerance d1 and the second The tolerance d2 can be the same or different, and can be set according to the actual situation.
  • the width of the part of the first scanning line 51 surrounding the imaging aperture area 10a is equal to the second
  • the three tolerances are increments of d3 and other tolerances, wherein said d3 is equal to d1.
  • the width of the first arc segment 513 of the first scanning line 51 is set as D1, which is represented by the first arc segment 513.
  • the three tolerances are that d3 increases with equal tolerance, that is, in the vertical direction, in the direction from one end of the data line 30 to the other end, the width of the first arc segment 513 of the first scan line 51 is increased with equal tolerance first. , and then wait for the tolerance to decrease.
  • setting d3 and d1 to be the same can compensate the load value of missing pixels, thereby minimizing the difference in capacitive and resistive loads between the non-photographic aperture area and the imaging aperture area 10a, so that the display screen at each position is uniform.
  • the width of the first arc segment 513 can be set uniformly, or the width of a certain segment can be increased.
  • the width of the first data line 31 increases with a fourth tolerance of d4 and other tolerances, wherein , d4 is equal to d2.
  • the width of the second arc segment 313 of the first data line 31 is set to be D2, and the fourth Incremental tolerances such as tolerance d4. That is, in the horizontal direction, from one end to the other end of the scan line 50 , the width of the second arc segment 313 of the first data line 31 first waits for the tolerance to increase, and then waits for the tolerance to decrease.
  • setting d4 and d2 to be the same can compensate the load value of missing pixels, thereby minimizing the difference in capacitive and resistive loads between the non-photographic aperture area and the imaging aperture area 10a, so that the display screen at each position is uniform.
  • the width of the second arc segment 313 is set uniformly along its extending direction, which improves the convenience of processing.
  • part of the sections may also be widened, so that the widths are inconsistent in the extending direction.
  • the number of pixel units 10b formed by two adjacent first scanning lines 51 and data lines 30 is equal to or greater than Decrease of the first unequal progression
  • the number of pixel units 10b formed by two adjacent first data lines 31 and scanning lines 50 is the second unequal difference. Decremented sequence.
  • the imaging aperture area 10a is in the shape of a water droplet, which is an inverted shape of a normally falling water droplet, that is, in the vertical direction, the upper dimension of the imaging aperture area 10a is larger and the lower dimension is smaller. Therefore, in the vertical direction, the scanning lines 50 and the data lines 30 at the peripheral edge of the imaging aperture area 10 a are not arranged symmetrically about the axis, nor are they arranged symmetrically about the center. In the horizontal direction, the scan lines 50 and the data lines 30 around the imaging hole area 10a can be arranged axisymmetrically with the center line of the imaging hole area 10a as the axis.
  • the number of pixel units 10b formed on the periphery of the imaging aperture area 10a of the substrate 10 decreases with the first non-alertically differential sequence, for example, normally formed
  • the number of pixel units 10b on each horizontal line is N3, then the number of pixel units 10b formed on the horizontal line where the first scanning line 51 of the second scanning line 53 is located is N3-a1, toward the direction of the imaging aperture area 10a
  • the number of pixel units 10b to be formed is N3-b1, N3-c1, . . . in sequence.
  • the number of pixel units 10b formed by adjacent two first data lines 31 and the scanning line 50 decreases in a second unequal sequence, for example , the number of pixel units 10b on each vertical line that is normally formed is N4, then the number of pixel units 10b formed on the horizontal line where the first scan line 51 adjacent to the second scan line 53 is located is N4-a2.
  • the number of pixel units 10b formed is N4-b2, N4-c2, . . .
  • the number of pixel units 10b formed by the first data line 31 decreases firstly, and then increases, and the first data line 31 is arranged symmetrically with the central axis of the imaging aperture area 10a, Therefore, the processing of the array substrate 100 is more convenient and the processing efficiency is improved.
  • the first scanning line 51 surrounds the imaging aperture area 10a
  • the width increases by the first arithmetic progression.
  • the width of the first arc segment 513 of the first scanning line 51 is in the first unequal progression Incremental, that is, in the vertical direction, in the direction from one end of the data line 30 to the other end, the width D3 of the first arc segment 513 of the first scan line 51 is incrementally increased by the first unequal sequence, That is, D3-a1, D3-b1, D3-c1.
  • the width of the first arc segment 513 can compensate for the load value of the missing pixels, thereby minimizing the capacitive resistance of the non-photographic aperture area and the imaging aperture area 10a The difference of the load, so that the display picture of each position is uniform.
  • the width of the first arc segment 513 may also be set to be different from the reduced number of pixel units 10b at the corresponding position, or within a fluctuation range of the reduced number of pixel units 10b at the corresponding position.
  • the width of the first arc segment 513 can be set uniformly, or a plurality of segments can be increased at intervals.
  • the first data line 31 surrounds the portion of the imaging aperture area 10a The width of increases by the second arithmetic progression.
  • the width of the second arc segment 313 of the first data line 31 increases with a second unequal sequence. That is, in the horizontal direction, in the direction from one end of the scan line 50 to the other end, the width D4 of the second arc segment 313 of the first data line 31 is firstly increased by the second unequal sequence, and then by the inverse Decrease to the second unequal arithmetic sequence, that is, D4-a2, D4-b2, D4-c2....
  • the width of the second arc segment 313 can compensate for the load value of the missing pixel unit 10b, thereby reducing the non-photographic aperture area and the imaging aperture area 10a to the greatest extent.
  • the difference in capacitive and resistive loads, so that the display screen at each position is uniform.
  • the width of the second arc segment 313 may also be set differently from the reduced number of pixel units 10b at the corresponding position, or within a fluctuation range of the reduced number of pixel units 10b at the corresponding position.
  • the width of the second arc segment 313 is set uniformly along its extending direction, which improves the convenience of processing.
  • part of the sections may also be widened, so that the widths are inconsistent in the extending direction.
  • FIG. 9 and FIG. 10 Please refer to FIG. 9 and FIG. 10 in combination.
  • the imaging aperture area 10a is bangs-shaped, in the extending direction of the data line 30 from the end far away from the imaging aperture area 10a to the imaging aperture area 10a, the The number of pixel units 10b formed adjacent to the first scanning line 51 and the data line 30 is decreased by the first non-arithmetic sequence;
  • the number of pixel units 10b formed by two adjacent first data lines 31 and scanning lines 50 is the second unequal difference. Decremented sequence.
  • the notch-shaped shape is roughly trapezoidal, with a slightly wider upper end and a slightly narrower lower end.
  • 30 is neither axisymmetrically arranged nor centrosymmetrically arranged.
  • the scanning lines 50 and the data lines 30 around the imaging aperture area 10a are axisymmetrically arranged with the central line of the imaging aperture area 10a as the axis.
  • the number of pixel units 10b formed on the periphery of the imaging aperture area 10a of the substrate 10 decreases with the first non-alertically differential sequence, for example, normally formed
  • the number of pixel units 10b on each horizontal line is N5, then the number of pixel units 10b formed on the horizontal line where the first scanning line 51 of the second scanning line 53 is located is N5-a1, toward the direction of the imaging aperture area 10a
  • the number of formed pixel units 10b is N5-b1, N5-c1... in sequence.
  • the number of bangs-shaped pixel units 10b can optionally be arranged with a value different from that of the first unequal sequence, for example, the second unequal sequence.
  • the notch-shaped imaging aperture area is the same as the drop-shaped imaging aperture area.
  • two adjacent first data lines 31 and the scanning line 50 form a
  • the number of pixel units 10b decreases in the second unequal progression.
  • the number of pixel units 10b on each vertical line normally formed is N6, then the number of pixel units 10b formed on the horizontal line where the first scan line 51 next to the second scan line 53 is located is N6-a2, to When the direction of the imaging aperture region 10a extends, the number of pixel units 10b formed is N6-b2, N6-c2, . . .
  • the width of the first arc segment 513 of the first scanning line 51 is in the first unequal progression Incremental, that is, in the vertical direction, in the direction from one end of the data line 30 to the other end, the width D5 of the first arc segment 513 of the first scanning line 51 is increasing in the first unequal sequence, That is, D5-a1, D5-b1, D5-c1....
  • the width of the first arc segment 513 can compensate for the load value of the missing pixels, thereby minimizing the capacitive resistance of the non-photographic aperture area and the imaging aperture area 10a The difference of the load, so that the display picture of each position is uniform.
  • the width of the first arc segment 513 may also be set to be different from the reduced number of pixel units 10b at the corresponding position, or within a fluctuation range of the reduced number of pixel units 10b at the corresponding position.
  • the first arc segment 513 closest to the imaging aperture area 10a is spaced apart from the edge of the imaging aperture area 10a;
  • the second arc segment 313 closest to the imaging aperture area 10a is spaced apart from the edge of the imaging aperture area 10a.
  • the first arc segment 513 closest to the imaging hole area 10a is spaced from the edge of the imaging hole area 10a, which can prevent metal wiring from being affected when cutting the imaging hole area 10a, and can also The stability of the metal wiring is ensured, and the performance stability of the array substrate 100 is improved.
  • the second arc segment 313 closest to the imaging aperture area 10a and the imaging aperture are arranged at intervals, so as to further improve the manufacturing efficiency of the array substrate 100 and ensure the stability of its structure.
  • the present application also proposes a display panel 300, the display panel 300 includes a color filter substrate 400, an array substrate 100, and a liquid crystal layer 500, the color filter substrate 400 and the array substrate 100 are arranged in pairs, so
  • the array substrate 100 is the array substrate 100 described in any one of the above embodiments. Since the array substrate 100 of the display panel 300 includes all the technical solutions of all the above-mentioned embodiments, it at least has all the beneficial effects brought by the technical solutions of the above-mentioned embodiments, which will not be repeated here.
  • the color filter substrate 400 of the display panel 300 is also provided with a structure avoiding the imaging aperture area 10a, so as not to affect the installation and function of the camera.
  • the present application also proposes an electronic device 600, the electronic device 600 includes a housing 601 and a display panel 300 disposed on the housing 601, the display panel 300 is as described above Display panel 300 . Since the display panel 300 of the electronic device 600 includes all the technical solutions of all the above-mentioned embodiments, it at least has all the beneficial effects brought by the technical solutions of the above-mentioned embodiments, which will not be repeated here.
  • the electronic device 600 can be a mobile terminal, such as a mobile phone, a notebook computer, a tablet computer, and a wrist-worn device, etc., and the electronic device 600 can also be a household electronic device 600 with a display screen such as a TV, an air conditioner, etc., or any other
  • the electronic device 600 with a camera is not limited here.

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Abstract

Disclosed in the present application are an array substrate (100), a display panel (300), and an electronic device (600). The array substrate (100) comprises a base (10), scanning lines (50) and data lines (30), wherein the scanning lines (50) and the data lines (30) are arranged in a vertically staggered manner, and the base (10) is provided with a camera hole area (10a). The scanning lines (50) that partially surround the camera hole area (10a) are set as first scanning lines (51), and the scanning lines (50) that do not surround the camera hole area (10a) are set as second scanning lines (53); and the data lines (30) that surround the camera hole area (10a) are set as first data lines (31), and the data lines (30) that do not surround the camera hole area (10a) are set as second data lines (33). In the direction from an edge of the camera hole area (10a) to the center thereof, the width of the portion of the first data lines (31) and/or the first scanning lines (51) that surround the camera hole area (10a) increases progressively. In the array substrate (100) in the technical solution of the present application, by means of widening sections of scanning lines (50) and data lines (30) in a camera hole area (10a), the increased wiring length and the reduced number of pixels due to the occupation of the camera hole area (10a) are compensated, thereby ensuring that the resistive load and capacitive load at each position are the same, and solving the problem of non-uniform display.

Description

阵列基板、显示面板及电子设备Array substrate, display panel and electronic equipment
本申请要求于2021年9月18日申请的、申请号为202111096466.2的中国专利申请的优先权,其全部内容通过引用结合在本申请中。This application claims priority to a Chinese patent application with application number 202111096466.2 filed on September 18, 2021, the entire contents of which are incorporated herein by reference.
技术领域technical field
本申请涉及显示设备技术领域,特别涉及一种阵列基板、显示面板及电子设备。The present application relates to the technical field of display devices, in particular to an array substrate, a display panel and electronic devices.
背景技术Background technique
如今,移动电子设备已经成为人们日常生活中不可或缺的部分,如,智能手机、平板电脑等。一般来说,这些电子设备均具备有拍照功能,包括前置和后置摄像头。且随着极窄边框设计的流行,有些产品将前置摄像头做到了显示屏内部,即挖孔屏或者是水滴屏设计,对于使用液晶显示屏(liquid crystal display,LCD)的移动电子设备,为了保证拍照功能不受影响,在液晶显示屏的阵列基板侧的玻璃摄像孔(Camera hole)的周围不能有金属走线,即金属走线需要避开摄像孔。Today, mobile electronic devices have become an indispensable part of people's daily life, such as smart phones, tablet computers, and the like. Generally speaking, these electronic devices all have a camera function, including front and rear cameras. And with the popularity of ultra-narrow bezel design, some products put the front camera inside the display screen, that is, the design of the hole-punch screen or the water drop screen. For mobile electronic devices using liquid crystal displays (LCDs), in order to To ensure that the camera function is not affected, there must be no metal wiring around the glass camera hole (Camera hole) on the array substrate side of the LCD, that is, the metal wiring needs to avoid the camera hole.
目前,市面上使用液晶显示屏的移动电子设备中,其摄像孔处的金属走线均为等线宽,摄像孔外围的金属走线要长于非摄像孔位置,这导致电容电阻的负载不均一,易出现显示不均的问题。At present, in mobile electronic devices using liquid crystal displays on the market, the metal traces at the camera hole are all of the same line width, and the metal traces around the camera hole are longer than the non-camera hole positions, which leads to uneven loads on capacitors and resistors. , prone to uneven display problems.
技术问题technical problem
本申请的主要目的是提出一种阵列基板,通过对阵列基板的摄像孔处和切口处的金属走线进行设计,使摄像孔位置的金属走线与其余金属走线具有一致的负载值,从而解决负载不同导致显示不均的问题。The main purpose of this application is to propose an array substrate. By designing the metal wiring at the imaging hole and the cutout of the array substrate, the metal wiring at the imaging hole and the rest of the metal wiring have the same load value, thereby Solve the problem of uneven display caused by different loads.
技术解决方案technical solution
为实现上述目的,本申请提出的阵列基板包括基底和设于所述基底上的多条并列设置的扫描线和多条并列设置的数据线,每一所述扫描线与每一所述数据线垂直交错设置,所述基底设有摄像孔区域;In order to achieve the above purpose, the array substrate proposed in this application includes a substrate and a plurality of parallel scanning lines and a plurality of parallel data lines arranged on the substrate, each of the scanning lines and each of the data lines Vertically staggered, the base is provided with a camera hole area;
所述数据线中的至少两条部分环绕所述摄像孔区域的周围设置,所述扫描线中的至少两条部分环绕所述摄像孔区域的周围设置,设定部分环绕于所述摄像孔区域的扫描线为第一扫描线,未环绕所述摄像孔区域的扫描线为第二扫描线,设定环绕于所述摄像孔区域的数据线为第一数据线,未环绕所述摄像孔区域的扫描线为第二数据线;At least two parts of the data lines are arranged around the area of the imaging aperture, at least two parts of the scanning lines are arranged around the area of the imaging aperture, and the setting part is arranged around the area of the imaging aperture The scanning line is the first scanning line, the scanning line not surrounding the imaging aperture area is the second scanning line, the data line surrounding the imaging aperture area is set as the first data line, and the scanning line not surrounding the imaging aperture area is set as the first scanning line. The scanning line is the second data line;
在所述摄像孔区域的边缘至其中心的方向上,所述第一数据线和/或第一扫描线环绕于所述摄像孔区域的部分的宽度递增。In the direction from the edge of the imaging aperture area to its center, the width of the portion of the first data line and/or the first scanning line surrounding the imaging aperture area increases gradually.
在本申请的一实施例中,当所述摄像孔区域的形状为圆形时;In an embodiment of the present application, when the shape of the imaging hole area is circular;
在所述第二扫描线至所述摄像孔区域的中心的方向上,相邻两所述数据线与扫描线形成的像素单元的数量以第一公差等公差递减;In the direction from the second scanning line to the center of the imaging aperture area, the number of pixel units formed by two adjacent data lines and scanning lines is gradually decreased with tolerances such as the first tolerance;
且,在所述第二数据线至所述摄像孔区域的中心的方向上,相邻两所述扫描线与数据线形成的像素单元的数量以第二公差等公差递减。Moreover, in the direction from the second data line to the center of the imaging aperture area, the number of pixel units formed by two adjacent scan lines and data lines decreases gradually with a tolerance such as a second tolerance.
在本申请的一实施例中,在所述摄像孔区域的边缘至其中心的方向上,所述第一扫描线环绕所述摄像孔区域的部分的宽度以第三公差等公差递增,其中,所述第三公差等于第一公差。In an embodiment of the present application, in the direction from the edge of the imaging aperture area to its center, the width of the part of the first scanning line surrounding the imaging aperture area increases with tolerances such as the third tolerance, wherein, The third tolerance is equal to the first tolerance.
在本申请的一实施例中,在所述摄像孔区域的边缘至其中心的方向上,所述第一数据线的宽度以第四公差等公差递增,其中,所述第四公差等于第二公差。In an embodiment of the present application, in the direction from the edge of the imaging aperture area to its center, the width of the first data line increases with tolerances such as the fourth tolerance, wherein the fourth tolerance is equal to the second tolerance.
在本申请的一实施例中,当所述摄像孔区域的形状为水滴型或刘海型时;In an embodiment of the present application, when the shape of the imaging hole area is a drop shape or a bang shape;
在所述数据线由远离所述摄像孔区域的一端向所述摄像孔区域的延伸方向上,相邻两所述第一扫描线与数据线形成的像素单元的数量以第一非等差数列递减;In the extending direction of the data line from one end away from the imaging aperture area to the imaging aperture area, the number of pixel units formed by two adjacent first scanning lines and data lines is in a first non-arithmetic sequence decrease;
且,在所述第二扫描线至所述摄像孔区域的中心的方向上,相邻两所述第一数据线与扫描线形成的像素单元的数量以第二非等差数列递减。Moreover, in the direction from the second scanning line to the center of the imaging aperture area, the number of pixel units formed by adjacent two first data lines and scanning lines decreases in a second asymmetric sequence.
在本申请的一实施例中,在所述第二数据线至所述摄像孔区域的方向上,所述第一扫描线环绕所述摄像孔区域的部分的宽度以第一非等差数列递增。In an embodiment of the present application, in the direction from the second data line to the imaging aperture area, the width of the part of the first scanning line surrounding the imaging aperture area increases in a first unequal sequence .
在本申请的一实施例中,在所述摄像孔区域的边缘至其中心的方向上,所述第一数据线环绕所述摄像孔区域的部分的宽度以第二非等差数列递增。In an embodiment of the present application, in the direction from the edge of the imaging aperture area to the center thereof, the width of the part of the first data line surrounding the imaging aperture area increases in a second non-alertometric sequence.
在本申请的一实施例中,每一所述第一扫描线包括两第一直线段和一第一弧线段,所述第一弧线段的两端分别连接两所述第一直线段,最靠近所述摄像孔区域的第一弧线段与所述摄像孔区域的边缘间隔设置;In an embodiment of the present application, each of the first scanning lines includes two first straight line segments and a first arc line segment, and the two ends of the first arc line segment are respectively connected to the two first straight line segments , the first arc segment closest to the camera hole area is spaced from the edge of the camera hole area;
和/或,每一所述第一数据线包括两第二直线段和一第二弧线段,所述第二弧线段的两端分别连接两所述第二直线段,最靠近所述摄像孔区域的第二弧线段与所述摄像孔区域的边缘间隔设置。And/or, each of the first data lines includes two second straight line segments and a second arc segment, the two ends of the second arc segment are respectively connected to the two second straight line segments, and the closest The second arc segment of the camera hole area is spaced apart from the edge of the camera hole area.
本申请还提出一种显示面板,包括彩膜基板、阵列基板和液晶层,所述彩膜基板和所述阵列基板对盒设置,所述阵列基板为如上任一所述的阵列基板。The present application also proposes a display panel, including a color filter substrate, an array substrate, and a liquid crystal layer, the color filter substrate and the array substrate are arranged in a box, and the array substrate is the array substrate as described above.
本申请还提出一种电子设备,所述电子设备包括壳体和设于所述壳体的显示面板,所述显示面板为如上所述的显示面板。The present application also proposes an electronic device, which includes a housing and a display panel disposed on the housing, where the display panel is the above-mentioned display panel.
有益效果Beneficial effect
本申请技术方案中,该阵列基板包括基底和设于基底的数据线和扫描线,在基底上还设置有摄像孔区域,数据线和扫描线依次排列交错设置,当经过摄像孔区域时,第一数据线的部分区段环绕摄像孔区域,则正常形成像素的区段变少,第二数据线则不受摄像孔区域的影响,为正常长度,第一扫描线的部分区段环绕摄像孔区域,则正常形成像素的区段变少,第二扫描线的长度为正常的,越靠近摄像孔区域的第一扫描线和第一数据线的环绕长度越长,则对应形成的像素单元的数量越少,对应的电阻负载增加、电容负载降低,如此,在摄像孔区域的边缘至中心的方向上,第一数据线和/或第一扫描线环绕摄像孔区域的部分的宽度递增,也即,降低第一数据线和/或第一扫描线的电阻负载,增加第一数据线和/或第一扫描线的电容负载,从而补偿损失的像素负载,有效减小阵列基板的不同区域的负载差异,提高显示质量。In the technical solution of the present application, the array substrate includes a substrate and data lines and scanning lines arranged on the substrate, and an imaging hole area is also arranged on the substrate, and the data lines and scanning lines are arranged in sequence and staggered. When passing through the imaging hole area, the first A part of a data line surrounds the imaging hole area, and the number of segments that normally form pixels becomes less. The second data line is not affected by the imaging hole area and has a normal length. A part of the first scanning line surrounds the imaging hole. area, the number of segments that normally form pixels is reduced, and the length of the second scanning line is normal. The smaller the number, the corresponding resistance load increases and the capacitive load decreases. In this way, in the direction from the edge to the center of the imaging aperture area, the width of the part of the first data line and/or the first scanning line surrounding the imaging aperture area increases gradually, and also That is, reduce the resistive load of the first data line and/or the first scan line, increase the capacitive load of the first data line and/or the first scan line, thereby compensating for the lost pixel load, effectively reducing the Load difference to improve display quality.
附图说明Description of drawings
为了更清楚地说明本申请实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图示出的结构获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present application, and those skilled in the art can also obtain other drawings according to the structures shown in these drawings without creative effort.
图1为本申请实施例一中阵列基板的俯视示意图;FIG. 1 is a schematic top view of an array substrate in Embodiment 1 of the present application;
图2为图1所示阵列基板中的像素单元的排布图;FIG. 2 is an arrangement diagram of pixel units in the array substrate shown in FIG. 1;
图3为图1所示阵列基板中的扫描线的部分放大结构示意图;FIG. 3 is a partially enlarged structural schematic diagram of scanning lines in the array substrate shown in FIG. 1;
图4为图1所示阵列基板中的数据线的部分放大结构示意图;FIG. 4 is a partially enlarged structural schematic diagram of data lines in the array substrate shown in FIG. 1;
图5为本申请实施例二中阵列基板的俯视示意图;FIG. 5 is a schematic top view of the array substrate in Embodiment 2 of the present application;
图6为图5所示阵列基板的像素单元的排布图;FIG. 6 is an arrangement diagram of pixel units of the array substrate shown in FIG. 5;
图7为图5所示阵列基板对应的扫描线的部分放大结构示意图;FIG. 7 is a partially enlarged structural schematic diagram of the scanning lines corresponding to the array substrate shown in FIG. 5;
图8为图5所示阵列基板对应的数据线的部分放大结构示意图;FIG. 8 is a partially enlarged structural schematic diagram of data lines corresponding to the array substrate shown in FIG. 5;
图9为本申请实施例三中阵列基板的俯视示意图;FIG. 9 is a schematic top view of the array substrate in Embodiment 3 of the present application;
图10为图9所示阵列基板的像素单元的排布图;FIG. 10 is an arrangement diagram of pixel units of the array substrate shown in FIG. 9;
图11为图9所示阵列基板对应的扫描线的结构示意图;FIG. 11 is a schematic structural diagram of scanning lines corresponding to the array substrate shown in FIG. 9;
图12为本申请实施例四中显示面板的剖视图;FIG. 12 is a cross-sectional view of a display panel in Embodiment 4 of the present application;
图13为本申请实施例五中第一种电子设备的部分结构示意图;FIG. 13 is a partial structural schematic diagram of the first electronic device in Embodiment 5 of the present application;
图14为本申请实施例五中第二种电子设备的部分结构示意图;FIG. 14 is a partial structural schematic diagram of the second electronic device in Embodiment 5 of the present application;
图15为本申请实施例五中第三种电子设备的部分结构示意图。FIG. 15 is a partial structural diagram of the third electronic device in Embodiment 5 of the present application.
附图标号说明:Explanation of reference numbers:
100:阵列基板;10:基底;10a:摄像孔区域;10b:像素单元;30:数据线;31:第一数据线;311:第二直线段;313:第二弧线段;33:第二数据线;50:扫描线;51:第一扫描线;511:第一直线段;513:第一弧线段;53:第二扫描线;300:显示面板;400:彩膜基板;500:液晶层;600:电子设备;601:壳体。100: array substrate; 10: base; 10a: camera hole area; 10b: pixel unit; 30: data line; 31: first data line; 311: second straight line segment; 313: second arc segment; 33: first Two data lines; 50: scanning line; 51: first scanning line; 511: first straight line segment; 513: first arc segment; 53: second scanning line; 300: display panel; 400: color film substrate; 500 : liquid crystal layer; 600: electronic equipment; 601: housing.
本申请目的的实现、功能特点及优点将结合实施例,参照附图做进一步说明。The realization, functional features and advantages of the present application will be further described in conjunction with the embodiments and with reference to the accompanying drawings.
本发明的实施方式Embodiments of the present invention
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本申请的一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present application with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of this application.
需要说明,若本申请实施例中有涉及方向性指示(诸如上、下、左、右、前、后……),则该方向性指示仅用于解释在某一特定姿态(如附图所示)下各部件之间的相对位置关系、运动情况等,如果该特定姿态发生改变时,则该方向性指示也相应地随之改变。It should be noted that if there are directional indications (such as up, down, left, right, front, back...) in the embodiment of the present application, the directional indications are only used to explain the position in a certain posture (as shown in the attached figure). If the specific posture changes, the directional indication will also change accordingly.
另外,若本申请实施例中有涉及“第一”、“第二”等的描述,则该“第一”、“第二”等的描述仅用于描述目的,而不能理解为指示或暗示其相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。另外,各个实施例之间的技术方案可以相互结合,但是必须是以本领域普通技术人员能够实现为基础,当技术方案的结合出现相互矛盾或无法实现时应当认为这种技术方案的结合不存在,也不在本申请要求的保护范围之内。In addition, if there are descriptions involving "first", "second", etc. in the embodiments of the present application, the descriptions of "first", "second", etc. are only for descriptive purposes, and cannot be interpreted as indications or hints Its relative importance or implicitly indicates the number of technical features indicated. Thus, the features defined as "first" and "second" may explicitly or implicitly include at least one of these features. In addition, the technical solutions of the various embodiments can be combined with each other, but it must be based on the realization of those skilled in the art. When the combination of technical solutions is contradictory or cannot be realized, it should be considered that the combination of technical solutions does not exist , nor within the scope of protection required by the present application.
实施例一Embodiment one
本申请提供一种阵列基板100。The present application provides an array substrate 100 .
参照图1,阵列基板100包括基底10和设于所述基底10上的多条并列设置的扫描线50和多条并列设置的数据线30,每一所述扫描线50与每一所述数据线30垂直交错设置,所述基底10设有摄像孔区域10a;1, the array substrate 100 includes a substrate 10 and a plurality of parallel scanning lines 50 and a plurality of parallel data lines 30 arranged on the substrate 10, each of the scanning lines 50 and each of the data The lines 30 are vertically staggered, and the substrate 10 is provided with an imaging hole area 10a;
所述数据线30中的至少两条部分环绕所述摄像孔区域10a的周围设置,所述扫描线50中的至少两条部分环绕所述摄像孔区域10a的周围设置,设定部分环绕于所述摄像孔区域10a的扫描线50为第一扫描线51,未环绕所述摄像孔区域10a的扫描线50为第二扫描线53,设定环绕于所述摄像孔区域10a的数据线30为第一数据线31,未环绕所述摄像孔区域10a的扫描线50为第二数据线33;At least two parts of the data line 30 are arranged around the imaging aperture area 10a, at least two parts of the scanning line 50 are arranged around the imaging aperture area 10a, and the setting part is arranged around the imaging aperture area 10a. The scanning line 50 of the imaging aperture area 10a is the first scanning line 51, the scanning line 50 not surrounding the imaging aperture area 10a is the second scanning line 53, and the data line 30 surrounding the imaging aperture area 10a is set as The first data line 31, the scanning line 50 not surrounding the imaging aperture area 10a is the second data line 33;
在所述摄像孔区域10a的边缘至其中心的方向上,所述第一数据线31和/或第一扫描线51环绕于所述摄像孔区域10a的部分的宽度递增。In the direction from the edge of the imaging aperture area 10a to its center, the width of the portion of the first data line 31 and/or the first scanning line 51 surrounding the imaging aperture area 10a increases gradually.
可以理解的,阵列基板100为多层结构,每层结构均通过镀膜、曝光、显影与蚀刻工艺层层叠加形成。具体地,阵列基板100包括有基底10,基底10提供基础的载体,基底10为透明的,其材质可以是透明玻璃板或石英板,在此不作限定,不影响背光源的穿过即可。因基底10不导电,用于显示的介质例如液晶,其运动和排列均需要电子来驱动,故而阵列基板100还包括有导电的数据线30(Data Line,DL)和扫描线50(SL,Scanning line)、薄膜晶体管(TFT开关)和像素电极(Pixel Electrode,PE)等。俯视阵列基板100,多条数据线30和多条扫描线50交叉设置以将阵列基板100分割形成多个像素区域,在每一个所述区域上对应有一个像素电极和薄膜晶体管,因数据线30和扫描线50不透光,故两者所在的部分形成像素区域的非显示区域,薄膜晶体管也设于非显示区域,而像素电极则形成像素区域的显示区域。It can be understood that the array substrate 100 is a multi-layer structure, and each layer structure is formed layer by layer through coating, exposure, development and etching processes. Specifically, the array substrate 100 includes a base 10 , which provides a basic carrier. The base 10 is transparent, and its material may be a transparent glass plate or a quartz plate, which is not limited here, as long as it does not affect the passage of the backlight. Since the substrate 10 is non-conductive, the movement and arrangement of the medium used for display, such as liquid crystal, need electrons to drive, so the array substrate 100 also includes conductive data lines 30 (Data Line, DL) and scanning lines 50 (SL, Scanning line), thin film transistor (TFT switch) and pixel electrode (Pixel Electrode, PE), etc. Looking down at the array substrate 100, a plurality of data lines 30 and a plurality of scan lines 50 are intersected to divide the array substrate 100 to form a plurality of pixel regions, and each region corresponds to a pixel electrode and a thin film transistor, because the data lines 30 and the scanning line 50 are opaque, so the part where they are located forms the non-display area of the pixel area, the thin film transistor is also arranged in the non-display area, and the pixel electrode forms the display area of the pixel area.
可以理解的,在基底10上还设置有摄像孔区域10a,用于与摄像头对应,从而使得摄像头能够透过实现摄像或拍照功能。此处,为了避让摄像孔区域10a,呈直线设置的扫描线50和数据线30部分区段为弧线形,从而与摄像孔区域10a的边缘相适配。此处,设定部分区段环绕摄像孔区域10a的扫描线50为第一扫描线51,部分区段环绕摄像孔区域10a的数据线30为第一数据线31,而正常排布的扫描线50为第二扫描线53,正常排布的数据线30为第二数据线33。同时,设定每一所述第一扫描线51包括两第一直线段511和一第一弧线段513,所述第一弧线段513的两端分别连接两所述第一直线段511,第一弧线段513环绕摄像孔区域10a设置,每一所述第一数据线31包括两第二直线段311和一第二弧线段313,所述第二弧线段313的两端分别连接两所述第二直线段311,第二弧线段313环绕摄像孔区域10a设置。It can be understood that a camera hole area 10a is also provided on the base 10 to correspond to the camera, so that the camera can realize the function of taking pictures or taking photos through the camera. Here, in order to avoid the imaging aperture area 10a, some sections of the scanning line 50 and the data line 30 arranged in a straight line are arc-shaped, so as to fit the edge of the imaging aperture area 10a. Here, the scanning line 50 partially surrounding the imaging aperture area 10a is set as the first scanning line 51, the data line 30 partially surrounding the imaging aperture area 10a is set as the first data line 31, and the normally arranged scanning lines 50 is the second scanning line 53 , and the normally arranged data lines 30 are the second data lines 33 . At the same time, it is set that each of the first scanning lines 51 includes two first straight line segments 511 and a first arc line segment 513, and the two ends of the first arc line segment 513 are connected to the two first straight line segments 511 respectively. , the first arc segment 513 is arranged around the imaging aperture area 10a, each of the first data lines 31 includes two second straight line segments 311 and a second arc segment 313, and the two ends of the second arc segment 313 The two second straight line segments 311 are respectively connected, and the second arc segment 313 is arranged around the imaging hole area 10a.
可知的,第一扫描线51的长度大于第二扫描线53的长度,且越靠近摄像孔区域10a的第一弧线段513的长度越长,第一直线段511的长度越短;第一数据线31的长度大于第二数据线33的长度,且越靠近摄像孔区域10a的第二弧线段313的长度越长,第二直线段311的长度越短,而阵列基板100的像素单元10b是由第二数据线33、第二扫描线53、第一直线段511及第二直线段311中的至少两者交错形成的,因此,沿第一扫描线51的延伸方向上,在摄像孔区域10a形成的像素单元10b要比非摄像孔区域的像素单元10b少,故而为了弥补此处的电容和电阻负载,将此处的第一弧线段513和第二弧线段313的宽度增加,从而减少不同区域的负载差异。此处,每一第一弧线段513和/或每一第二弧线段313的宽度可以在其延伸方向上均匀增加,也可以是部分区段增加,在此不做限定。且根据摄像孔的形状一般为圆形,故摄像孔区域10a一般设置为圆孔型、水滴形或刘海型,当然,于其他实施例中,也可以设置方形或多边形等,在此不做限定。It can be seen that the length of the first scanning line 51 is greater than the length of the second scanning line 53, and the closer to the imaging aperture area 10a, the longer the length of the first arc segment 513 is, and the shorter the length of the first straight line segment 511 is; The length of the data line 31 is greater than the length of the second data line 33, and the closer to the imaging aperture area 10a, the longer the length of the second arc segment 313, and the shorter the length of the second straight line segment 311, and the pixel unit of the array substrate 100 10b is formed by interlacing at least two of the second data line 33, the second scanning line 53, the first straight line segment 511, and the second straight line segment 311. Therefore, along the extending direction of the first scanning line 51, the imaging The pixel units 10b formed in the aperture area 10a are less than the pixel units 10b in the non-photographic aperture area, so in order to compensate for the capacitance and resistance load here, the width of the first arc segment 513 and the second arc segment 313 here increase, thereby reducing load differences in different regions. Here, the width of each first arc segment 513 and/or each second arc segment 313 may increase uniformly along its extending direction, or may increase in some sections, which is not limited herein. And according to the shape of the imaging hole is generally circular, so the imaging hole area 10a is generally set in the shape of a round hole, a drop shape or a bangs shape. Of course, in other embodiments, it can also be set in a square or polygonal shape, which is not limited here. .
本申请技术方案中,该阵列基板100包括基底10和设于基底10的数据线30和扫描线50,在基底10上还设置有摄像孔区域10a,数据线30和扫描线50依次排列交错设置,当经过摄像孔区域10a时,第一数据线31的部分区段环绕摄像孔区域10a,则正常形成像素的区段变少,第二数据线33则不受摄像孔区域10a的影响,为正常长度,第一扫描线51的部分区段环绕摄像孔区域10a,则正常形成像素的区段变少,第二扫描线53的长度为正常的,越靠近摄像孔区域10a的第一扫描线51和第一数据线31的环绕长度越长,则对应形成的像素单元10b的数量越少,对应的电阻负载增加、电容负载降低,如此,在摄像孔区域10a的边缘至中心的方向上,第一数据线31和/或第一扫描线51环绕摄像孔区域10a的部分的宽度递增,也即,降低第一数据线31和/或第一扫描线51的电阻负载,增加第一数据线31和/或第一扫描线51的电容负载,从而补偿损失的像素负载,有效减小阵列基板100的不同区域的负载差异,提高显示质量。In the technical solution of the present application, the array substrate 100 includes a base 10 and data lines 30 and scan lines 50 provided on the base 10, and an imaging hole area 10a is also arranged on the base 10, and the data lines 30 and scan lines 50 are arranged in a staggered order , when passing through the imaging aperture area 10a, a part of the first data line 31 surrounds the imaging aperture area 10a, and the number of segments normally forming pixels becomes less, and the second data line 33 is not affected by the imaging aperture area 10a, as Normal length, part of the first scanning line 51 surrounds the imaging aperture area 10a, and the number of segments that normally form pixels becomes less, the length of the second scanning line 53 is normal, the closer to the first scanning line of the imaging aperture area 10a 51 and the length of the first data line 31 around the longer, then the number of correspondingly formed pixel units 10b is less, the corresponding resistance load increases, and the capacitive load decreases. In this way, in the direction from the edge to the center of the imaging aperture area 10a, The width of the part of the first data line 31 and/or the first scanning line 51 surrounding the imaging aperture area 10a is gradually increased, that is, the resistance load of the first data line 31 and/or the first scanning line 51 is reduced, and the first data line is increased. 31 and/or the capacitive load of the first scan line 51, so as to compensate the lost pixel load, effectively reduce the load difference in different regions of the array substrate 100, and improve the display quality.
在加工工序上,首先在基底10上沉积一层金属层,通过光罩图案化金属层,形成位于基底10上的数据线30,从而可以为薄膜晶体管提供开启关闭的电压,与数据线30同时形成的还有栅极。此处,通过光罩图案化的过程是在金属层上沉积光阻胶,通过光罩遮盖后进行曝光并显影,然后再进行蚀刻。金属层的材质为不透光导电金属材料,例如,钼、钛、铬以及铝中的一种或多种的组合,在此不做限定。In the processing procedure, a metal layer is first deposited on the substrate 10, and the metal layer is patterned through a photomask to form the data line 30 on the substrate 10, so that the thin film transistor can be provided with an on-off voltage, simultaneously with the data line 30 A grid is also formed. Here, the process of patterning through a photomask is to deposit a photoresist on the metal layer, expose and develop after being covered by a photomask, and then perform etching. The material of the metal layer is an opaque conductive metal material, such as a combination of one or more of molybdenum, titanium, chromium and aluminum, which is not limited herein.
其次,在栅极和数据线30上成型栅极绝缘层,并在栅极绝缘层上依次形成有源层、与有源层两端接触且间隔设置的源极和漏极,从而完成薄膜晶体管的加工;再者,在源极、漏极及栅极绝缘层上还沉积钝化层,通过一道光罩制程图案化钝化层,形成贯穿有钝化层的过孔,该过孔可以裸露部分漏极;最后,在钝化层上形成透明导电层,并通过光罩制程图案化透明导电层形成特定形状的像素电极,该像素电极通过过孔与漏极电接触,从而对应像素单元10b的显示区域,为显示区域提供液晶运动的电压,完成阵列基板100的制作。Next, a gate insulating layer is formed on the gate and data lines 30, and an active layer, a source electrode and a drain electrode which are in contact with both ends of the active layer and arranged at intervals are sequentially formed on the gate insulating layer, thereby completing the thin film transistor. processing; moreover, a passivation layer is deposited on the source, drain, and gate insulating layers, and the passivation layer is patterned through a photomask process to form a via hole through the passivation layer, which can be exposed part of the drain; finally, a transparent conductive layer is formed on the passivation layer, and the transparent conductive layer is patterned through a photomask process to form a pixel electrode of a specific shape, and the pixel electrode is in electrical contact with the drain through a via hole, thereby corresponding to the pixel unit 10b The display area of the display area is provided with the voltage for liquid crystal movement, and the fabrication of the array substrate 100 is completed.
参照图2,在本申请的实施例一中,当所述摄像孔区域10a的形状为圆形时;Referring to FIG. 2, in Embodiment 1 of the present application, when the shape of the imaging aperture area 10a is circular;
在所述第二扫描线53至所述摄像孔区域10a的中心的方向上,相邻两所述数据线30与扫描线50形成的像素单元10b的数量以第一公差为d1等公差递减;In the direction from the second scanning line 53 to the center of the imaging aperture area 10a, the number of pixel units 10b formed by two adjacent data lines 30 and scanning lines 50 decreases gradually with a first tolerance of d1;
且,在所述第二数据线33至所述摄像孔区域10a的中心的方向上,相邻两所述扫描线50与数据线30形成的像素单元10b的数量以第二公差为d2等公差递减。In addition, in the direction from the second data line 33 to the center of the imaging aperture area 10a, the number of pixel units 10b formed by two adjacent scanning lines 50 and data lines 30 has a second tolerance of d2 and other tolerances decrease.
此处,设定扫描线50的延伸方向为水平方向,第二数据线33的延伸方向为竖直方向,本实施例中,当摄像孔区域10a的形状为圆形时,因圆形为中心对称和轴对称图形,则第一扫描线51的第一弧线段513也以摄像孔区域10a的水平方向上的直径为轴线轴对称设置,第一数据线31的第二弧线段313以摄像孔区域10a的竖直方向上的直径为轴线轴对称设置,第一直线段511和第二直线段311也会以摄像孔区域10a的的直径为轴线轴对称设置。Here, it is assumed that the extending direction of the scanning line 50 is the horizontal direction, and the extending direction of the second data line 33 is the vertical direction. Symmetrical and axisymmetric figures, then the first arc segment 513 of the first scan line 51 is also arranged axisymmetrically with the diameter in the horizontal direction of the imaging aperture area 10a, and the second arc segment 313 of the first data line 31 is The vertical diameter of the imaging aperture area 10a is arranged axially symmetrically, and the first straight line segment 511 and the second straight line segment 311 are also arranged axially symmetrically with the diameter of the imaging aperture area 10a as the axis.
因此,在第二扫描线53至摄像孔区域10a的中心的方向上,由第一直线段511、第二直线段311、第二扫描线53、第二数据线33中的至少两者组成的像素单元10b的数量等公差递减,且第一公差设为d1,例如,正常在一第二扫描线53上形成的像素单元10b的数量为N1,则紧邻第二扫描线53的第一扫描线51上形成的像素单元10b的数量为N1-d1,再向摄像孔区域10a的中心的方向上,第一扫描线51形成的像素单元10b的数量为N1-2d1、N1-3d1……,位于摄像孔区域10a的直径上的第一扫描线51所在的一行形成的像素单元10b的数量最少。同理的,在第二数据线33至所述摄像孔区域10a的中心的方向上,相邻两所述扫描线50与数据线30形成的像素单元10b的数量以第二公差为d2等公差递减,例如,第二数据线33形成N2个像素单元10b,则第一数据线31形成的像素单元10b的数量为N2-d2、N2-2d2、N2-3d2……,如此则方便数据线30和扫描线50的加工,使得摄像孔区域10a的边缘的像素分布均匀,不影响显示效果。Therefore, in the direction from the second scanning line 53 to the center of the imaging aperture area 10a, at least two of the first straight line segment 511, the second straight line segment 311, the second scanning line 53, and the second data line 33 are composed of The tolerances such as the number of pixel units 10b decrease, and the first tolerance is set to d1, for example, the number of pixel units 10b normally formed on a second scan line 53 is N1, then the first scan line next to the second scan line 53 The number of pixel units 10b formed on 51 is N1-d1, and toward the center of the imaging aperture area 10a, the number of pixel units 10b formed by the first scanning line 51 is N1-2d1, N1-3d1..., located at The row where the first scanning line 51 is located on the diameter of the imaging aperture area 10 a forms the least number of pixel units 10 b. Similarly, in the direction from the second data line 33 to the center of the imaging aperture area 10a, the number of pixel units 10b formed by two adjacent scanning lines 50 and data lines 30 is set to a second tolerance of d2 and other tolerances Decrease, for example, the second data line 33 forms N2 pixel units 10b, then the number of pixel units 10b formed by the first data line 31 is N2-d2, N2-2d2, N2-3d2..., so that the data line 30 And the processing of the scanning line 50 makes the distribution of pixels at the edge of the imaging aperture area 10a uniform, without affecting the display effect.
此处,N1与N2的值可以相同,例如,形成的像素单元10b为正方形;当然,两者也可以不同,例如,形成的像素单元10b为长方形,同理的,第一公差d1与第二公差d2可以相同,也可以不相同,可以根据实际情况进行设定。Here, the values of N1 and N2 can be the same, for example, the formed pixel unit 10b is a square; of course, the two can also be different, for example, the formed pixel unit 10b is rectangular, similarly, the first tolerance d1 and the second The tolerance d2 can be the same or different, and can be set according to the actual situation.
请参照图3,在本申请的一实施例中,在所述摄像孔区域10a的边缘至其中心的方向上,所述第一扫描线51环绕所述摄像孔区域10a的部分的宽度以第三公差为d3等公差递增,其中,所述d3等于d1。Please refer to FIG. 3 , in an embodiment of the present application, in the direction from the edge of the imaging aperture area 10a to its center, the width of the part of the first scanning line 51 surrounding the imaging aperture area 10a is equal to the second The three tolerances are increments of d3 and other tolerances, wherein said d3 is equal to d1.
为了使得各个区域的负载大致相同,本实施例中,在摄像孔区域10a的边缘至其中心的方向上,设定第一扫描线51的第一弧线段513的宽度为D1,其以第三公差为d3呈等公差递增,也即,在竖直方向上,从数据线30的一端至另一端的方向上,第一扫描线51的第一弧线段513的宽度是先等公差递增,然后再等公差递减。此处,将d3与d1设置相同,能够补偿由缺失的像素的负载值,从而最大程度减少非摄像孔区域和摄像孔区域10a的电容电阻负载的差异,以使得各个位置的显示画面均匀。当然,于其他实施例中,也可以设置d3与d1不同,或者在d1的一个波动范围内。In order to make the loads of each area approximately the same, in the present embodiment, in the direction from the edge of the imaging aperture area 10a to its center, the width of the first arc segment 513 of the first scanning line 51 is set as D1, which is represented by the first arc segment 513. The three tolerances are that d3 increases with equal tolerance, that is, in the vertical direction, in the direction from one end of the data line 30 to the other end, the width of the first arc segment 513 of the first scan line 51 is increased with equal tolerance first. , and then wait for the tolerance to decrease. Here, setting d3 and d1 to be the same can compensate the load value of missing pixels, thereby minimizing the difference in capacitive and resistive loads between the non-photographic aperture area and the imaging aperture area 10a, so that the display screen at each position is uniform. Certainly, in other embodiments, it is also possible to set d3 to be different from d1, or to be within a fluctuation range of d1.
此处,第一弧线段513的宽度可为均匀设置,也可以是某一段的宽度增加。Here, the width of the first arc segment 513 can be set uniformly, or the width of a certain segment can be increased.
请参照图4,在本申请的一实施例中,在所述摄像孔区域10a的边缘至其中心的方向上,所述第一数据线31的宽度以第四公差为d4等公差递增,其中,d4等于d2。Please refer to FIG. 4 , in an embodiment of the present application, in the direction from the edge of the imaging aperture area 10a to its center, the width of the first data line 31 increases with a fourth tolerance of d4 and other tolerances, wherein , d4 is equal to d2.
本实施例中,同理的,在水平方向上,且摄像孔区域10a的边缘至其中心的方向上,设定第一数据线31的第二弧线段313的宽度为D2,以第四公差d4等公差递增。也即,在水平方向上,从扫描线50的一端至另一端的方向上,第一数据线31的第二弧线段313的宽度是先等公差递增,然后再等公差递减。此处,将d4与d2设置相同,能够补偿由缺失的像素的负载值,从而最大程度减少非摄像孔区域和摄像孔区域10a的电容电阻负载的差异,以使得各个位置的显示画面均匀。当然,于其他实施例中,也可以设置d4与d2不同,或者在d2的一个波动范围内。In this embodiment, similarly, in the horizontal direction, and in the direction from the edge of the imaging aperture area 10a to its center, the width of the second arc segment 313 of the first data line 31 is set to be D2, and the fourth Incremental tolerances such as tolerance d4. That is, in the horizontal direction, from one end to the other end of the scan line 50 , the width of the second arc segment 313 of the first data line 31 first waits for the tolerance to increase, and then waits for the tolerance to decrease. Here, setting d4 and d2 to be the same can compensate the load value of missing pixels, thereby minimizing the difference in capacitive and resistive loads between the non-photographic aperture area and the imaging aperture area 10a, so that the display screen at each position is uniform. Certainly, in other embodiments, it is also possible to set d4 to be different from d2, or to be within a fluctuation range of d2.
此处,第二弧线段313的宽度在其延伸方向上为均匀设置,提高加工的便利性。当然,于其他实施例中,也可以部分区段加宽,使得宽度在其延伸方向上不一致。Here, the width of the second arc segment 313 is set uniformly along its extending direction, which improves the convenience of processing. Of course, in other embodiments, part of the sections may also be widened, so that the widths are inconsistent in the extending direction.
实施例二Embodiment two
请结合参照图5和图6,当所述摄像孔区域10a的形状为水滴型;Please refer to FIG. 5 and FIG. 6 in conjunction, when the shape of the imaging hole area 10a is a drop shape;
在所述数据线30由远离所述摄像孔区域10a的一端向所述摄像孔区域10a的延伸方向上,相邻两所述第一扫描线51与数据线30形成的像素单元10b的数量以第一非等差数列递减;In the extending direction of the data line 30 from one end away from the imaging aperture area 10a to the imaging aperture area 10a, the number of pixel units 10b formed by two adjacent first scanning lines 51 and data lines 30 is equal to or greater than Decrease of the first unequal progression;
且,在所述第二扫描线53至所述摄像孔区域10a的中心的方向上,相邻两所述第一数据线31与扫描线50形成的像素单元10b的数量以第二非等差数列递减。Moreover, in the direction from the second scanning line 53 to the center of the imaging aperture area 10a, the number of pixel units 10b formed by two adjacent first data lines 31 and scanning lines 50 is the second unequal difference. Decremented sequence.
本实施例中,摄像孔区域10a为水滴型,此处的水滴型为正常下落的水滴的倒置形状,也即,在竖直方向上,摄像孔区域10a的上方尺寸大,下方尺寸小。因此,在竖直方向上,摄像孔区域10a周缘的扫描线50和数据线30不呈轴对称设置,也没有呈中心对称设置。而在水平方向上,摄像孔区域10a周缘的扫描线50和数据线30可以摄像孔区域10a的中线为轴呈轴对称设置。在数据线30由远离摄像孔区域10a的一端向摄像孔区域10a延伸时,在基底10的摄像孔区域10a的周缘形成的像素单元10b的数量以第一非等差数列递减,例如,正常形成的每一水平线上的像素单元10b的数量为N3,则紧邻第二扫描线53的第一扫描线51所在的水平线上形成的像素单元10b的数量为N3-a1,向摄像孔区域10a的方向延伸时,形成的像素单元10b的数量依次为N3-b1、N3-c1……。In this embodiment, the imaging aperture area 10a is in the shape of a water droplet, which is an inverted shape of a normally falling water droplet, that is, in the vertical direction, the upper dimension of the imaging aperture area 10a is larger and the lower dimension is smaller. Therefore, in the vertical direction, the scanning lines 50 and the data lines 30 at the peripheral edge of the imaging aperture area 10 a are not arranged symmetrically about the axis, nor are they arranged symmetrically about the center. In the horizontal direction, the scan lines 50 and the data lines 30 around the imaging hole area 10a can be arranged axisymmetrically with the center line of the imaging hole area 10a as the axis. When the data line 30 extends from the end far away from the imaging aperture area 10a to the imaging aperture area 10a, the number of pixel units 10b formed on the periphery of the imaging aperture area 10a of the substrate 10 decreases with the first non-alertically differential sequence, for example, normally formed The number of pixel units 10b on each horizontal line is N3, then the number of pixel units 10b formed on the horizontal line where the first scanning line 51 of the second scanning line 53 is located is N3-a1, toward the direction of the imaging aperture area 10a When extending, the number of pixel units 10b to be formed is N3-b1, N3-c1, . . . in sequence.
而此时,在第二扫描线53至摄像孔区域10a的中心的方向上,相邻两第一数据线31与扫描线50形成的像素单元10b的数量以第二非等差数列递减,例如,正常形成的每一竖直线上的像素单元10b的数量为N4,则紧邻第二扫描线53的第一扫描线51所在的水平线上形成的像素单元10b的数量为N4-a2,向摄像孔区域10a的方向延伸时,形成的像素单元10b的数量依次为N4-b2、N4-c2……。也即在水平方向上,第一数据线31所形成的像素单元10b的数量先非等差递减,再非等差递增,第一数据线31以摄像孔区域10a的中轴线为轴对称设置,从而使得该阵列基板100加工更加方便,提高加工效率。At this time, in the direction from the second scanning line 53 to the center of the imaging aperture area 10a, the number of pixel units 10b formed by adjacent two first data lines 31 and the scanning line 50 decreases in a second unequal sequence, for example , the number of pixel units 10b on each vertical line that is normally formed is N4, then the number of pixel units 10b formed on the horizontal line where the first scan line 51 adjacent to the second scan line 53 is located is N4-a2. When the direction of the hole region 10a extends, the number of pixel units 10b formed is N4-b2, N4-c2, . . . That is to say, in the horizontal direction, the number of pixel units 10b formed by the first data line 31 decreases firstly, and then increases, and the first data line 31 is arranged symmetrically with the central axis of the imaging aperture area 10a, Therefore, the processing of the array substrate 100 is more convenient and the processing efficiency is improved.
请结合图7,在本申请的一实施例中,在所述第二数据线33至所述摄像孔区域10a的方向上,所述第一扫描线51环绕所述摄像孔区域10a的部分的宽度以第一非等差数列递增。Please refer to FIG. 7, in an embodiment of the present application, in the direction from the second data line 33 to the imaging aperture area 10a, the first scanning line 51 surrounds the imaging aperture area 10a The width increases by the first arithmetic progression.
本实施例中,为了使得各个区域的负载大致相同,在第二数据线33至摄像孔区域10a的方向上,第一扫描线51的第一弧线段513的宽度以第一非等差数列递增,也即,在竖直方向上,从数据线30的一端至另一端的方向上,第一扫描线51的第一弧线段513的宽度D3是以第一非等差数列递增的,也即,D3-a1、D3-b1、D3-c1……。此处,将第一弧线段513的宽度与减少的像素单元10b的数量设置为一致,能够补偿由缺失的像素的负载值,从而最大程度减少非摄像孔区域和摄像孔区域10a的电容电阻负载的差异,以使得各个位置的显示画面均匀。当然,于其他实施例中,也可以设置第一弧线段513的宽度与对应位置的像素单元10b的减少数量不同,或者在对应位置的像素单元10b的减少数量的一个波动范围内。In this embodiment, in order to make the loads of each area approximately the same, in the direction from the second data line 33 to the imaging aperture area 10a, the width of the first arc segment 513 of the first scanning line 51 is in the first unequal progression Incremental, that is, in the vertical direction, in the direction from one end of the data line 30 to the other end, the width D3 of the first arc segment 513 of the first scan line 51 is incrementally increased by the first unequal sequence, That is, D3-a1, D3-b1, D3-c1.... Here, setting the width of the first arc segment 513 to be consistent with the reduced number of pixel units 10b can compensate for the load value of the missing pixels, thereby minimizing the capacitive resistance of the non-photographic aperture area and the imaging aperture area 10a The difference of the load, so that the display picture of each position is uniform. Of course, in other embodiments, the width of the first arc segment 513 may also be set to be different from the reduced number of pixel units 10b at the corresponding position, or within a fluctuation range of the reduced number of pixel units 10b at the corresponding position.
此处,第一弧线段513的宽度可为均匀设置,也可以是多段的宽度间隔增加。Here, the width of the first arc segment 513 can be set uniformly, or a plurality of segments can be increased at intervals.
请参照图8,在本申请的一实施例中,在所述摄像孔区域10a的水平方向上的边缘至其中心的方向上,所述第一数据线31环绕所述摄像孔区域10a的部分的宽度以第二非等差数列递增。Please refer to FIG. 8 , in an embodiment of the present application, in the direction from the edge of the imaging aperture area 10a in the horizontal direction to its center, the first data line 31 surrounds the portion of the imaging aperture area 10a The width of increases by the second arithmetic progression.
本实施例中,在水平方向上,且摄像孔区域10a的边缘至其中心的方向上,第一数据线31的第二弧线段313的宽度以第二非等差数列递增。也即,在水平方向上,从扫描线50的一端至另一端的方向上,第一数据线31的第二弧线段313的宽度D4是先以第二非等差数列递增,然后以反向的第二非等差数列递减,也即,D4-a2、D4-b2、D4-c2……。此处,将第二弧线段313的宽度与对应位置的像素单元10b的减少数量设置相同,能够补偿由缺失的像素单元10b的负载值,从而最大程度减少非摄像孔区域和摄像孔区域10a的电容电阻负载的差异,以使得各个位置的显示画面均匀。当然,于其他实施例中,也可以第二弧线段313的宽度与对应位置的像素单元10b的减少数量设置不同,或者在对应位置的像素单元10b的减少的数量值一个波动范围内。In this embodiment, in the horizontal direction, and in the direction from the edge of the imaging aperture area 10 a to its center, the width of the second arc segment 313 of the first data line 31 increases with a second unequal sequence. That is, in the horizontal direction, in the direction from one end of the scan line 50 to the other end, the width D4 of the second arc segment 313 of the first data line 31 is firstly increased by the second unequal sequence, and then by the inverse Decrease to the second unequal arithmetic sequence, that is, D4-a2, D4-b2, D4-c2.... Here, setting the width of the second arc segment 313 to be the same as the reduced number of pixel units 10b at the corresponding position can compensate for the load value of the missing pixel unit 10b, thereby reducing the non-photographic aperture area and the imaging aperture area 10a to the greatest extent. The difference in capacitive and resistive loads, so that the display screen at each position is uniform. Of course, in other embodiments, the width of the second arc segment 313 may also be set differently from the reduced number of pixel units 10b at the corresponding position, or within a fluctuation range of the reduced number of pixel units 10b at the corresponding position.
此处,第二弧线段313的宽度在其延伸方向上为均匀设置,提高加工的便利性。当然,于其他实施例中,也可以部分区段加宽,使得宽度在其延伸方向上不一致。Here, the width of the second arc segment 313 is set uniformly along its extending direction, which improves the convenience of processing. Of course, in other embodiments, part of the sections may also be widened, so that the widths are inconsistent in the extending direction.
实施例三Embodiment Three
请结合参照图9和图10,当所述摄像孔区域10a为刘海型时,在所述数据线30由远离所述摄像孔区域10a的一端向所述摄像孔区域10a的延伸方向上,相邻两所述第一扫描线51与数据线30形成的像素单元10b的数量以第一非等差数列递减;Please refer to FIG. 9 and FIG. 10 in combination. When the imaging aperture area 10a is bangs-shaped, in the extending direction of the data line 30 from the end far away from the imaging aperture area 10a to the imaging aperture area 10a, the The number of pixel units 10b formed adjacent to the first scanning line 51 and the data line 30 is decreased by the first non-arithmetic sequence;
且,在所述第二扫描线53至所述摄像孔区域10a的中心的方向上,相邻两所述第一数据线31与扫描线50形成的像素单元10b的数量以第二非等差数列递减。Moreover, in the direction from the second scanning line 53 to the center of the imaging aperture area 10a, the number of pixel units 10b formed by two adjacent first data lines 31 and scanning lines 50 is the second unequal difference. Decremented sequence.
本实施例中,摄像孔区域10a为刘海型时,刘海型的形状大致呈梯形,上端稍宽,下端稍窄,因此,在竖直方向上,摄像孔区域10a周缘的扫描线50和数据线30不呈轴对称设置,也没有呈中心对称设置。而在水平方向上,摄像孔区域10a周缘的扫描线50和数据线30以摄像孔区域10a的中线为轴呈轴对称设置。在数据线30由远离摄像孔区域10a的一端向摄像孔区域10a延伸时,在基底10的摄像孔区域10a的周缘形成的像素单元10b的数量以第一非等差数列递减,例如,正常形成的每一水平线上的像素单元10b的数量为N5,则紧邻第二扫描线53的第一扫描线51所在的水平线上形成的像素单元10b的数量为N5-a1,向摄像孔区域10a的方向延伸时,形成的像素单元10b的数量依次为N5-b1、N5-c1……。当然,此处,刘海型的像素单元10b的数量也可选的以不同于第一非等差数列的数值进行排布,例如,为第二非等差数列。In this embodiment, when the imaging hole area 10a is notch-shaped, the notch-shaped shape is roughly trapezoidal, with a slightly wider upper end and a slightly narrower lower end. 30 is neither axisymmetrically arranged nor centrosymmetrically arranged. In the horizontal direction, the scanning lines 50 and the data lines 30 around the imaging aperture area 10a are axisymmetrically arranged with the central line of the imaging aperture area 10a as the axis. When the data line 30 extends from the end far away from the imaging aperture area 10a to the imaging aperture area 10a, the number of pixel units 10b formed on the periphery of the imaging aperture area 10a of the substrate 10 decreases with the first non-alertically differential sequence, for example, normally formed The number of pixel units 10b on each horizontal line is N5, then the number of pixel units 10b formed on the horizontal line where the first scanning line 51 of the second scanning line 53 is located is N5-a1, toward the direction of the imaging aperture area 10a When extending, the number of formed pixel units 10b is N5-b1, N5-c1... in sequence. Of course, here, the number of bangs-shaped pixel units 10b can optionally be arranged with a value different from that of the first unequal sequence, for example, the second unequal sequence.
同理的,刘海型的摄像孔区域也同水滴型的摄像孔区域一样,在第二扫描线53至摄像孔区域10a的中心的方向上,相邻两第一数据线31与扫描线50形成的像素单元10b的数量以第二非等差数列递减。例如,正常形成的每一竖直线上的像素单元10b的数量为N6,则紧邻第二扫描线53的第一扫描线51所在的水平线上形成的像素单元10b的数量为N6-a2,向摄像孔区域10a的方向延伸时,形成的像素单元10b的数量依次为N6-b2、N6-c2……。Similarly, the notch-shaped imaging aperture area is the same as the drop-shaped imaging aperture area. In the direction from the second scanning line 53 to the center of the imaging aperture area 10a, two adjacent first data lines 31 and the scanning line 50 form a The number of pixel units 10b decreases in the second unequal progression. For example, the number of pixel units 10b on each vertical line normally formed is N6, then the number of pixel units 10b formed on the horizontal line where the first scan line 51 next to the second scan line 53 is located is N6-a2, to When the direction of the imaging aperture region 10a extends, the number of pixel units 10b formed is N6-b2, N6-c2, . . .
请参照图11,为了使得各个区域的负载大致相同,在第二数据线33至摄像孔区域10a的方向上,第一扫描线51的第一弧线段513的宽度以第一非等差数列递增,也即,在竖直方向上,从数据线30的一端至另一端的方向上,第一扫描线51的第一弧线段513的宽度D5是以第一非等差数列递增的,也即,D5-a1、D5-b1、D5-c1……。此处,将第一弧线段513的宽度与减少的像素单元10b的数量设置为一致,能够补偿由缺失的像素的负载值,从而最大程度减少非摄像孔区域和摄像孔区域10a的电容电阻负载的差异,以使得各个位置的显示画面均匀。当然,于其他实施例中,也可以设置第一弧线段513的宽度与对应位置的像素单元10b的减少数量不同,或者在对应位置的像素单元10b的减少数量的一个波动范围内。Please refer to FIG. 11 , in order to make the loads of each area approximately the same, in the direction from the second data line 33 to the imaging aperture area 10a, the width of the first arc segment 513 of the first scanning line 51 is in the first unequal progression Incremental, that is, in the vertical direction, in the direction from one end of the data line 30 to the other end, the width D5 of the first arc segment 513 of the first scanning line 51 is increasing in the first unequal sequence, That is, D5-a1, D5-b1, D5-c1.... Here, setting the width of the first arc segment 513 to be consistent with the reduced number of pixel units 10b can compensate for the load value of the missing pixels, thereby minimizing the capacitive resistance of the non-photographic aperture area and the imaging aperture area 10a The difference of the load, so that the display picture of each position is uniform. Of course, in other embodiments, the width of the first arc segment 513 may also be set to be different from the reduced number of pixel units 10b at the corresponding position, or within a fluctuation range of the reduced number of pixel units 10b at the corresponding position.
参照图3,在本申请的一实施例中,最靠近所述摄像孔区域10a的第一弧线段513与所述摄像孔区域10a的边缘间隔设置;Referring to FIG. 3 , in an embodiment of the present application, the first arc segment 513 closest to the imaging aperture area 10a is spaced apart from the edge of the imaging aperture area 10a;
和/或,最靠近所述摄像孔区域10a的第二弧线段313与所述摄像孔区域10a的边缘间隔设置。And/or, the second arc segment 313 closest to the imaging aperture area 10a is spaced apart from the edge of the imaging aperture area 10a.
本实施例中,为了方便加工,最靠近摄像孔区域10a的第一弧线段513与摄像孔区域10a的边缘间隔设置,能够防止在摄像孔区域10a进行切割时影响金属走线,同时也能够保证金属走线的稳定性,提高阵列基板100的性能稳定性。In this embodiment, in order to facilitate processing, the first arc segment 513 closest to the imaging hole area 10a is spaced from the edge of the imaging hole area 10a, which can prevent metal wiring from being affected when cutting the imaging hole area 10a, and can also The stability of the metal wiring is ensured, and the performance stability of the array substrate 100 is improved.
同理的,在最靠近摄像孔区域10a的第一弧线段513与摄像孔区域10a的边缘是否间隔设置的基础上,再将最靠近摄像孔区域10a的第二弧线段313与摄像孔区域10a的边缘间隔设置,从而进一步提升阵列基板100的制作效率,并保证其结构的稳定性。In the same way, on the basis of whether the first arc segment 513 closest to the imaging aperture area 10a is spaced from the edge of the imaging aperture area 10a, then the second arc segment 313 closest to the imaging aperture area 10a and the imaging aperture The edges of the regions 10a are arranged at intervals, so as to further improve the manufacturing efficiency of the array substrate 100 and ensure the stability of its structure.
实施例四Embodiment four
请参照图12,本申请还提出一种显示面板300,该显示面板300包括彩膜基板400、阵列基板100和液晶层500,所述彩膜基板400和所述阵列基板100对盒设置,所述阵列基板100为如上任一实施例所述的阵列基板100。由于本显示面板300的阵列基板100包括上述所有实施例的全部技术方案,因此至少具有上述实施例的技术方案所带来的所有有益效果,在此不再一一赘述。Please refer to FIG. 12 , the present application also proposes a display panel 300, the display panel 300 includes a color filter substrate 400, an array substrate 100, and a liquid crystal layer 500, the color filter substrate 400 and the array substrate 100 are arranged in pairs, so The array substrate 100 is the array substrate 100 described in any one of the above embodiments. Since the array substrate 100 of the display panel 300 includes all the technical solutions of all the above-mentioned embodiments, it at least has all the beneficial effects brought by the technical solutions of the above-mentioned embodiments, which will not be repeated here.
其中,显示面板300的彩膜基板400上也设置有避让摄像孔区域10a的结构,从而不影响摄像头的安装与功能。Wherein, the color filter substrate 400 of the display panel 300 is also provided with a structure avoiding the imaging aperture area 10a, so as not to affect the installation and function of the camera.
实施例五Embodiment five
请参照图13至图15,本申请还提出一种电子设备600,所述电子设备600包括壳体601和设于所述壳体601的显示面板300,所述显示面板300为如上所述的显示面板300。由于本电子设备600的显示面板300包括上述所有实施例的全部技术方案,因此至少具有上述实施例的技术方案所带来的所有有益效果,在此不再一一赘述。Please refer to FIG. 13 to FIG. 15 , the present application also proposes an electronic device 600, the electronic device 600 includes a housing 601 and a display panel 300 disposed on the housing 601, the display panel 300 is as described above Display panel 300 . Since the display panel 300 of the electronic device 600 includes all the technical solutions of all the above-mentioned embodiments, it at least has all the beneficial effects brought by the technical solutions of the above-mentioned embodiments, which will not be repeated here.
其中,电子设备600可为移动终端,例如,手机、笔记本电脑、平板电脑以及腕戴设备等,电子设备600还可以是电视机、空调等带有显示屏的家用电子设备600等,或者其他任何带有摄像头的电子设备600,在此不作限定。Wherein, the electronic device 600 can be a mobile terminal, such as a mobile phone, a notebook computer, a tablet computer, and a wrist-worn device, etc., and the electronic device 600 can also be a household electronic device 600 with a display screen such as a TV, an air conditioner, etc., or any other The electronic device 600 with a camera is not limited here.
以上所述仅为本申请的优选实施例,并非因此限制本申请的专利范围,凡是在本申请的构思下,利用本申请说明书及附图内容所作的等效结构变换,或直接/间接运用在其他相关的技术领域均包括在本申请的专利保护范围内。The above is only the preferred embodiment of the application, and does not limit the patent scope of the application. Under the conception of the application, the equivalent structural transformation made by using the specification and drawings of the application, or directly/indirectly used in Other relevant technical fields are included in the scope of patent protection of this application.

Claims (15)

  1. 一种阵列基板(100),所述阵列基板(100)包括基底(10)、设于所述基底(10)上的多条并列设置的扫描线(50)和多条并列设置的数据线(30),每一所述扫描线(50)与每一所述数据线(30)垂直交错设置,所述基底(10)设有摄像孔区域(10a),其中:An array substrate (100), the array substrate (100) comprising a substrate (10), a plurality of parallel scan lines (50) and a plurality of parallel data lines ( 30), each of the scanning lines (50) and each of the data lines (30) are vertically interlaced, and the substrate (10) is provided with an imaging hole area (10a), wherein:
    所述数据线(30)中的至少两条部分环绕所述摄像孔区域(10a)的周围设置,所述扫描线(50)中的至少两条部分环绕所述摄像孔区域(10a)的周围设置,设定部分环绕于所述摄像孔区域(10a)的扫描线(50)为第一扫描线(51),未环绕所述摄像孔区域(10a)的扫描线(50)为第二扫描线(53),设定环绕于所述摄像孔区域(10a)的数据线(30)为第一数据线(31),未环绕所述摄像孔区域(10a)的扫描线(50)为第二数据线(33);At least two parts of the data lines (30) are arranged around the periphery of the imaging aperture area (10a), and at least two parts of the scanning lines (50) are arranged around the periphery of the imaging aperture area (10a) Setting, setting the scanning line (50) partially surrounding the imaging aperture area (10a) as the first scanning line (51), and the scanning line (50) not surrounding the imaging aperture area (10a) as the second scanning line line (53), set the data line (30) surrounding the imaging aperture area (10a) as the first data line (31), and the scanning line (50) not surrounding the imaging aperture area (10a) as the second Two data lines (33);
    在所述摄像孔区域(10a)的边缘至其中心的方向上,所述第一数据线(31)和/或第一扫描线(51)环绕于所述摄像孔区域(10a)的部分的宽度递增。In the direction from the edge of the imaging aperture area (10a) to its center, the first data line (31) and/or the first scanning line (51) surrounds a part of the imaging aperture area (10a) width increments.
  2. 如权利要求1所述的阵列基板(100),其中,当所述摄像孔区域(10a)的形状为圆形时;The array substrate (100) according to claim 1, wherein when the shape of the imaging hole area (10a) is circular;
    在所述第二扫描线(53)至所述摄像孔区域(10a)的中心的方向上,相邻两所述数据线(30)与扫描线(50)形成的像素单元(10b)的数量以第一公差等公差递减;In the direction from the second scanning line (53) to the center of the imaging aperture area (10a), the number of pixel units (10b) formed by two adjacent data lines (30) and scanning lines (50) Decrease by first tolerance and other tolerances;
    且,在所述第二数据线(33)至所述摄像孔区域(10a)的中心的方向上,相邻两所述扫描线(50)与数据线(30)形成的像素单元(10b)的数量以第二公差等公差递减。Moreover, in the direction from the second data line (33) to the center of the imaging aperture area (10a), two adjacent pixel units (10b) formed by the scanning line (50) and the data line (30) The quantity of is decremented by the second tolerance and other tolerances.
  3. 如权利要求2所述的阵列基板(100),其中,在所述摄像孔区域(10a)的边缘至其中心的方向上,所述第一扫描线(51)环绕所述摄像孔区域(10a)的部分的宽度以第三公差等公差递增,其中,所述第三公差等于第一公差。The array substrate (100) according to claim 2, wherein, in the direction from the edge of the imaging aperture area (10a) to its center, the first scanning line (51) surrounds the imaging aperture area (10a) ) in increments of a third tolerance equal to the first tolerance.
  4. 如权利要求2所述的阵列基板(100),其中,在所述摄像孔区域(10a)的边缘至其中心的方向上,所述第一数据线(31)的宽度以第四公差等公差递增,其中,所述第四公差等于第二公差。The array substrate (100) according to claim 2, wherein, in the direction from the edge of the imaging aperture area (10a) to its center, the width of the first data line (31) is equal to the fourth tolerance Incrementally, wherein the fourth tolerance is equal to the second tolerance.
  5. 如权利要求1所述的阵列基板(100),其中,当所述摄像孔区域(10a)的形状为水滴型或刘海型时;The array substrate (100) according to claim 1, wherein when the shape of the imaging hole area (10a) is a drop shape or a notch shape;
    在所述数据线(30)由远离所述摄像孔区域(10a)的一端向所述摄像孔区域(10a)的延伸方向上,相邻两所述第一扫描线(51)与数据线(30)形成的像素单元(10b)的数量以第一非等差数列递减;In the extension direction of the data line (30) from the end far away from the imaging aperture area (10a) to the imaging aperture area (10a), two adjacent first scanning lines (51) and data lines ( 30) The number of pixel units (10b) to be formed is decremented by the first non-arithmetic sequence;
    且,在所述第二扫描线(53)至所述摄像孔区域(10a)的中心的方向上,相邻两所述第一数据线(31)与扫描线(50)形成的像素单元(10b)的数量以第二非等差数列递减。Moreover, in the direction from the second scanning line (53) to the center of the imaging aperture area (10a), the pixel units ( 10b) is decremented by the second unequal progression.
  6. 如权利要求5所述的阵列基板(100),其中,在所述第二数据线(33)至所述摄像孔区域(10a)的方向上,所述第一扫描线(51)环绕所述摄像孔区域(10a)的部分的宽度以第一非等差数列递增。The array substrate (100) according to claim 5, wherein, in the direction from the second data line (33) to the imaging hole area (10a), the first scanning line (51) surrounds the The width of the portion of the camera aperture area (10a) increases in increments of the first non-arithmetic sequence.
  7. 如权利要求5所述的阵列基板(100),其中,在所述摄像孔区域(10a)的水平方向的边缘至其中心的方向上,所述第一数据线(31)环绕所述摄像孔区域(10a)的部分的宽度以第二非等差数列递增。The array substrate (100) according to claim 5, wherein, in the direction from the horizontal edge of the imaging aperture area (10a) to its center, the first data line (31) surrounds the imaging aperture The width of the portion of the region (10a) increases in the second arithmetic progression.
  8. 如权利要求1所述的阵列基板(100),其中,每一所述第一扫描线(51)包括两第一直线段(511)和一第一弧线段(513),所述第一弧线段(513)的两端分别连接两所述第一直线段(511),最靠近所述摄像孔区域(10a)的第一弧线段(513)与所述摄像孔区域(10a)的边缘间隔设置;The array substrate (100) according to claim 1, wherein each of the first scanning lines (51) includes two first straight line segments (511) and a first arc segment (513), the first Both ends of the arc segment (513) are respectively connected to the two first straight line segments (511), and the first arc segment (513) closest to the camera hole area (10a) is connected to the camera hole area (10a) The edge interval setting of ;
    和/或,每一所述第一数据线(31)包括两第二直线段(311)和一第二弧线段(313),所述第二弧线段(313)的两端分别连接两所述第二直线段(311),最靠近所述摄像孔区域(10a)的第二弧线段(313)与所述摄像孔区域(10a)的边缘间隔设置。And/or, each of the first data lines (31) includes two second straight line segments (311) and a second arc segment (313), and the two ends of the second arc segment (313) are respectively connected to The two second straight line segments (311), the second arc segment (313) closest to the imaging aperture area (10a) and the edge of the imaging aperture area (10a) are arranged at intervals.
  9. 如权利要求1所述的阵列基板(100),其中,所述阵列基板(100),多条所述数据线(30)和多条所述扫描线(50)交叉设置以将所述阵列基板(100)分割形成多个像素区域。The array substrate (100) according to claim 1, wherein the array substrate (100), a plurality of the data lines (30) and a plurality of the scanning lines (50) are intersected so that the array substrate (100) Segment to form a plurality of pixel regions.
  10. 如权利要求8所述的阵列基板(100),其中,所述第一扫描线(51)的长度大于所述第二扫描线(53)的长度,越靠近摄像孔区域(10a)的所述第一弧线段(513)的长度越长,所述第一直线段(511)的长度越短。The array substrate (100) according to claim 8, wherein the length of the first scanning line (51) is greater than the length of the second scanning line (53), and the closer to the imaging aperture area (10a) the The longer the length of the first arc segment (513), the shorter the length of the first straight line segment (511).
  11. 如权利要求8所述的阵列基板(100),其中,所述第一数据线(31)的长度大于所述第二数据线(33)的长度,越靠近摄像孔区域(10a)的所述第二弧线段(313)的长度越长,所述第二直线段(311)的长度越短。The array substrate (100) according to claim 8, wherein the length of the first data line (31) is greater than the length of the second data line (33), and the closer to the imaging hole area (10a) the The longer the length of the second arc segment (313), the shorter the length of the second straight line segment (311).
  12. 如权利要求8所述的阵列基板(100),其中,所述阵列基板(100)的所述像素单元(10b)是由所述第二数据线(33)、所述第二扫描线(53)、所述第一直线段(511)及所述第二直线段(311)中的至少两个交错形成。The array substrate (100) according to claim 8, wherein the pixel unit (10b) of the array substrate (100) is composed of the second data line (33), the second scan line (53 ), at least two of the first straight line segment (511) and the second straight line segment (311) are formed alternately.
  13. 一种显示面板(300),其中,所述显示面板(300)包括彩膜基板(400)、阵列基板(100)和液晶层(500),所述彩膜基板(400)和所述阵列基板(100)对盒设置,所述阵列基板(100)为如权利要求1所述的阵列基板(100)。A display panel (300), wherein the display panel (300) comprises a color filter substrate (400), an array substrate (100) and a liquid crystal layer (500), the color filter substrate (400) and the array substrate (100) arranged in a box, the array substrate (100) is the array substrate (100) according to claim 1.
  14. 如权利要求13所述的显示面板,其中,所述显示面板(300)的彩膜基板(400)设置有避让摄像孔区域(10a)的结构。The display panel according to claim 13, wherein the color filter substrate (400) of the display panel (300) is provided with a structure avoiding the imaging aperture area (10a).
  15. 一种电子设备(600),其中,所述电子设备(600)包括壳体(601)和设于所述壳体(601)的显示面板(300),所述显示面板(300)为如权利要求13所述的显示面板(300)。An electronic device (600), wherein the electronic device (600) comprises a casing (601) and a display panel (300) arranged on the casing (601), the display panel (300) is as claimed in The display panel (300) of claim 13.
PCT/CN2021/142289 2021-09-18 2021-12-29 Array substrate, display panel, and electronic device WO2023040117A1 (en)

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