WO2023037640A1 - Drying device - Google Patents

Drying device Download PDF

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Publication number
WO2023037640A1
WO2023037640A1 PCT/JP2022/016654 JP2022016654W WO2023037640A1 WO 2023037640 A1 WO2023037640 A1 WO 2023037640A1 JP 2022016654 W JP2022016654 W JP 2022016654W WO 2023037640 A1 WO2023037640 A1 WO 2023037640A1
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WO
WIPO (PCT)
Prior art keywords
base material
substrate
coating
drying
coating film
Prior art date
Application number
PCT/JP2022/016654
Other languages
French (fr)
Japanese (ja)
Inventor
和夫 野村
敦 渡邉
徹 中塩屋
Original Assignee
東レエンジニアリング株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東レエンジニアリング株式会社 filed Critical 東レエンジニアリング株式会社
Publication of WO2023037640A1 publication Critical patent/WO2023037640A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C13/00Means for manipulating or holding work, e.g. for separate articles
    • B05C13/02Means for manipulating or holding work, e.g. for separate articles for particular articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/12Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B13/00Machines and apparatus for drying fabrics, fibres, yarns, or other materials in long lengths, with progressive movement
    • F26B13/10Arrangements for feeding, heating or supporting materials; Controlling movement, tension or position of materials
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B13/00Machines and apparatus for drying fabrics, fibres, yarns, or other materials in long lengths, with progressive movement
    • F26B13/10Arrangements for feeding, heating or supporting materials; Controlling movement, tension or position of materials
    • F26B13/101Supporting materials without tension, e.g. on or between foraminous belts
    • F26B13/104Supporting materials without tension, e.g. on or between foraminous belts supported by fluid jets only; Fluid blowing arrangements for flotation dryers, e.g. coanda nozzles
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Definitions

  • the present invention relates to a drying apparatus that dries a coating film formed on a substrate while conveying a sheet-shaped substrate.
  • an electrode material containing an active material, a binder, a conductive aid, and a solvent is applied to a sheet-like base material that is transported by roll-to-roll.
  • the coating film is dried by blowing gas onto the base material to heat the coating film.
  • An outline of this drying apparatus is shown in FIG.
  • the drying device 90 has a housing portion 91 and a nozzle 92 provided inside the housing portion 91, and blows gas from an outlet 93 of the nozzle 92 to the substrate W. spraying.
  • the coating film cannot be touched until drying of the coating film is completed. Therefore, the coating film on the substrate W is dried by the gas blown from the nozzle 92, and the substrate W is floated by the air pressure of the gas.
  • the deformation due to the air pressure blown from the nozzle 92 concentrates on the non-coating portion H, which promotes the vibration of the base material W.
  • FIG. 10(b) the entire base material W is transported over a predetermined transport line indicated by a chain double-dashed line in the drawing. Due to the vibration of the entire base material W in this manner, the base material W may come into contact with the members inside the drying device 90 such as the nozzle 92 and may be damaged.
  • the drying apparatus of the present invention for solving the above problems is a drying apparatus that dries a coating film applied to a substrate while conveying the substrate in a predetermined direction.
  • a drying nozzle that floats the material and dries the coating film, and a touch member that contacts the substrate in a floating region, which is a region where the substrate is floated by the drying nozzle.
  • a coating film is partially formed, and the touch member is characterized in that the non-coating portion, which is a portion where the coating film is not formed, is in contact with the substrate.
  • the touch member is provided, and the touch member contacts the non-coated portion of the base material, thereby suppressing the vibration of the base material due to the gas blown from the drying nozzle without damaging the coating film. Therefore, the substrate can be stably conveyed within the drying device.
  • the drying nozzle has a lower nozzle for blowing gas from below the base material and an upper nozzle for blowing gas from above the base material.
  • the carrier line of the base material is formed so as to undulate vertically in the carrier direction in the floating region.
  • the touch member may have a curved surface portion having a curved surface that is convex toward the base material.
  • the touch member may be a roller.
  • the coating film is formed in a stripe shape in the width direction of the base material, and that the non-coating portion is provided between the coating films.
  • the coating film is formed in stripes like this, there is a possibility that the base material will especially vibrate, but the vibration can be suppressed by the touch member.
  • the wind pressure at the position facing the non-coating portion is lower than the wind pressure at the position facing the coating film.
  • deformation of the non-coated portion can be suppressed without hindering the drying of the coating film by the gas, so vibration of the base material can be further suppressed.
  • it may be configured to have an edge guiding portion that contacts the vicinity of the edge of the base material in the floating region and defines the conveying path of the edge.
  • the drying apparatus of the present invention it is possible to convey the substrate in a stable state when drying the coating film formed on the substrate.
  • FIG. 4 is a schematic diagram showing one embodiment of a touch member in the drying apparatus of the present invention
  • FIG. 5 is a schematic diagram showing another embodiment of the touch member in the drying apparatus of the present invention
  • FIG. 5 is a schematic diagram showing another embodiment of the touch member in the drying apparatus of the present invention
  • It is the schematic which shows the drying apparatus in 2nd embodiment of this invention.
  • It is the schematic which shows the drying apparatus in 3rd embodiment of this invention.
  • 1 is a schematic diagram showing a conventional drying device
  • FIG. FIG. 4 is a schematic diagram showing a transport state of a substrate in a conventional drying device
  • a drying apparatus according to a first embodiment of the present invention will be described with reference to the drawings.
  • the three axes of the orthogonal coordinate system are X, Y, and Z
  • the main horizontal direction in which the substrate is conveyed in the drying apparatus is the X-axis direction
  • the direction perpendicular to the X-axis direction is Y.
  • a direction perpendicular to the XY plane (that is, a vertical direction) is referred to as a Z-axis direction.
  • FIG. 1 is a diagram schematically showing a coating device 1 equipped with a drying device 2 according to the first embodiment.
  • the coating apparatus 1 includes a transport mechanism 11 that transports a sheet-like substrate W, and a first coating mechanism 12 that applies a coating liquid to a predetermined surface of the substrate W to form a coating film (see FIG. 2). , and a second coating mechanism 13 for coating the back surface of a predetermined surface of the base material W with the coating liquid to form a coating film.
  • the drying device 2 is arranged on the transport path of the substrate W by the transport mechanism 11 .
  • the predetermined surface of the substrate W in the present embodiment is the surface on which the coating film is formed by the first coating mechanism 12, and the back surface of the substrate W is the surface opposite to the predetermined surface. 2 is the surface on which the coating film is formed by the coating mechanism 13 of 2.
  • the predetermined surface of the base material W is also referred to as the front surface
  • the opposite surface is also referred to as the back surface of the base material W.
  • the coating apparatus 1 forms coating films on both surfaces of a base material W transported by a transport mechanism 11 by means of a first coating mechanism 12 and a second coating mechanism 13, and these coating films are dried by a drying device 2. Allow to dry.
  • the base material W in the present embodiment is a metal foil that serves as a battery electrode plate for a lithium ion battery, and aluminum foil or the like is used when forming a positive electrode, and copper foil or the like is used when forming a negative electrode.
  • the base material W has a belt-like (sheet-like) shape that is long in one direction, and is conveyed in the longitudinal direction by the conveying mechanism 11 so as to pass through each part constituting the coating apparatus 1 .
  • the coating liquid in the present embodiment is, for example, a slurry containing an active material, a binder, a conductive aid, and a solvent, and is used as a material for electrode plates of lithium ion batteries (so-called electrode material).
  • a coating film is formed on the base material W by applying this coating liquid to the base material W.
  • the transport mechanism 11 in this embodiment is for transporting the base material W by so-called roll-to-roll transport.
  • the transport mechanism 11 includes an unwinding roll 11a for unwinding the base material W, a winding roll 11b for winding the base material W, and a winding roll for winding the base material W unwound from the unwinding roll 11a. It has a transport roll 11c through which the base material W is wound up by the roll 11b, and a backup roll 11d that guides the base material W to a position where the coating liquid is applied by the first coating mechanism 12, which will be described later.
  • Each roll of the conveying mechanism 11 is formed in a columnar shape and rotates about the central axis of the column.
  • the unwinding roll 11a is rotationally driven by a control unit (not shown), and unwinds the substrate W at a predetermined speed.
  • the control unit is configured by, for example, a general-purpose computer device.
  • the take-up roll 11b is rotationally controlled by the control unit in the same manner as the unwind roll 11a, and winds the base material W while applying a predetermined tension to the base material W.
  • tensile_strength here is the tension
  • a plurality of transport rolls 11c are provided as shown in FIG. Some or all of the transport rolls 11c among the plurality of transport rolls 11c are rotationally controlled by the control unit in the same manner as the unwind roll 11a and the winding roll 11b, and apply a predetermined tension to the base material W.
  • the substrate W is conveyed while
  • the backup roll 11d is arranged so as to face the first coating mechanism 12, which will be described later, as shown in FIG. Therefore, the substrate W can be transported while keeping a constant distance from the first coating mechanism 12 .
  • the transport mechanism 11 transports the base material W at a predetermined speed while applying a predetermined tension to the base material W.
  • the first coating mechanism 12 in the present embodiment is for coating a coating liquid on the surface of the substrate W being conveyed to form a coating film in stripes.
  • Forming a coating film in a stripe shape means that a plurality of coating portions T in which a coating film is formed in the width direction of the base material W as shown in FIGS.
  • the coating film is formed so that the substrate W has a non-coating portion H where the coating film is not formed.
  • FIG. 2A shows an example in which the coating portions T having the same width are formed at the same positions on both sides of the base material W, the positions and widths of the coating portions T are not necessarily the same on both sides of the base material W. It doesn't matter if it's not.
  • the first coating mechanism 12 is a slit die for coating the electrode material slurry
  • the first coating mechanism 12 is not limited to the slit die. It may correspond to a coating method for coating or gravure coating. The same applies to the second coating mechanism 13, which will be described later.
  • the first coating mechanism 12 is formed long along the width direction of the substrate W (the Y-axis direction in FIG. 1).
  • the backup roll 11d described above is arranged at a predetermined distance from the first coating mechanism 12 so that the rotation axis direction of the backup roll 11d and the width direction of the first coating mechanism 12 are parallel. It is
  • the first coating mechanism 12 is connected to a supply path (not shown) and includes a manifold 14 that is a space that is long in the width direction and stores the coating liquid, a slit 15 that is wide in the width direction and is connected to the manifold 14, and a slit 15 that is wide in the width direction. It is composed of a discharge port 16 that opens with the same length as the slit 15 and discharges the coating liquid.
  • the coating liquid stored in the manifold 14 is ejected onto the substrate W from the ejection port 16 via the slit 15 .
  • the discharge port 16 faces the backup roll 11d with the substrate W interposed therebetween. That is, the ejection port 16 faces the substrate W on the surface side of the substrate W.
  • the coating liquid can be applied to the surface side of the base material W while maintaining a constant distance between the discharge port 16 and the base material W.
  • the first coating mechanism 12 is further provided with a shim plate (not shown) for making the coating film formed on the base material W into a striped pattern.
  • the shim plate has, for example, a substantially comb shape and is arranged to divide the slit 15 in the width direction.
  • the coating liquid is applied while the slit 15 is divided in the width direction by the shim plate, the coating liquid is applied from the portion without the shim plate and is not applied from the portion with the shim plate. That is, the coating film can be formed in stripes.
  • the width of the coating film can be adjusted. That is, the widths of the applied portion T and the non-applied portion H can be adjusted.
  • a striped coating can be formed on the surface of the substrate W by the first coating mechanism 12 having these configurations.
  • the second coating mechanism 13 in this embodiment is for coating the back surface of the substrate W to be transported with the coating liquid to form a striped coating film.
  • the second coating mechanism 13 has the same configuration as the first coating mechanism 12 described above, as shown in FIG. It is arranged so as to face the base material W.
  • the second coating mechanism 13 is supplied with the coating liquid from a supply path (not shown), and coats the back surface of the substrate W with the supplied coating liquid. Thereby, a stripe-shaped coating film can be formed on the back surface of the base material W. As shown in FIG.
  • the first coating mechanism 12 and the second coating mechanism 13 can form coating films in stripes on both sides of the substrate W.
  • FIG. 2A shows an example in which the coating portions T having the same width are formed at the same positions on both sides of the base material W, the positions and widths of the coating portions T are not necessarily the same on both sides of the base material W. It doesn't matter if it's not.
  • FIG. Fig.3 (a) is front sectional drawing of the drying apparatus 2
  • FIG.3(b) is AA arrow directional view in Fig.3 (a).
  • the drying device 2 is a so-called drying furnace, and dries by volatilizing the solvent contained in the coating films formed on both sides of the substrate W by the first coating mechanism 12 and the second coating mechanism 13 .
  • the drying device 2 is provided downstream of the first coating mechanism 12 and the second coating mechanism 13 on the transport path of the base material W by the transport mechanism 11, and includes a housing part 21,
  • a drying nozzle 22 is provided inside the housing 21 and blows a gas onto the substrate W.
  • the gas from the drying nozzle 22 dries the coating film on the substrate W and floats the substrate W.
  • a floatation area which is an area in which the base material W floats, is formed in the housing part 21 . If the gas blown from the drying nozzle 22 is hot air, the heat can further accelerate the volatilization of the solvent in the coating film, which is preferable.
  • a touch member 24 is further provided to contact the base material W floating on a predetermined transport line of the base material W in this floating area.
  • the housing part 21 is a box elongated in the direction in which the base material W is conveyed, and is an internal space of the box body and includes a space surrounding the passing base material W and a space through which the base material W enters and exits. has an inlet and an outlet for Then, the substrate W on which the coating film is formed is transported by the transport mechanism 11 so as to pass through the inside of the housing portion 21 .
  • the heat for drying the coating film on the base material W is suppressed from escaping to the outside, and the drying nozzle necessary for floating the base material W is provided. Decrease the air volume from 22.
  • the drying nozzle 22 has a configuration for blowing gas in a predetermined direction, and blows the gas toward the base material W.
  • the drying nozzle 22 includes a lower nozzle 22a which is installed below the base material W in the housing part 21 and has a blowout port 23 for blowing gas to the upper surface, and a lower nozzle 22a which is installed above the base material W within the housing part 21.
  • the lower nozzles 22a and the upper nozzles 22b are arranged alternately in the direction in which the substrate W is conveyed.
  • the drying nozzle 22 has one cavity (not shown) inside, and gas is supplied to this cavity from a supply source (not shown).
  • the blowout port 23 is a slit-like opening extending in the width direction (Y-axis direction) of the base material W as shown in FIG. 3B, and communicates with this cavity.
  • the gas supplied from the supply source is blown out from the blowout port 23 through the hollow portion with a substantially uniform wind pressure.
  • the lower nozzle 22a blows gas toward the substrate W from below the substrate W
  • the upper nozzle 22b blows gas toward the substrate W from above.
  • These gases volatilize the solvent in the coating films formed on both surfaces of the base material W and dry the coating films.
  • a suction port 231 for recovering the gas may be appropriately provided.
  • the above-described transport roll 11c is not arranged inside the housing portion 21.
  • the coating films cannot be touched until drying of the coating films is completed. Therefore, it is preferable that the base material W is conveyed in a non-contact state in the housing part 21 except for at least both ends in the width direction.
  • a predetermined tension is applied to the substrate W by the transport roll 11c arranged on the upstream side and the transport roll 11c arranged on the downstream side of the housing portion 21, and at the same time, A gas is blown from below the substrate W by the nozzle 22a.
  • the base material W is conveyed by the conveying mechanism 11 and passes through the housing part 21 while being given a lift force by the wind pressure of the gas. That is, the gas blown from the drying nozzle 22 dries the coating film and at the same time floats the substrate W.
  • the lower nozzles 22a and the upper nozzles 22b are alternately arranged in the transport direction of the substrate W as described above.
  • the substrate W sprayed with the gas from these drying nozzles 22 forms a transport line in the floatation area in the housing 21 that undulates vertically in the transport direction, as shown in FIG. 3(a).
  • the base material W conveyed in this way floats in the housing part 21 and macroscopically advances in a linear direction (X-axis direction) as indicated by a two-dot chain line in FIG. 3(a).
  • the air volume from the lower nozzle 22a and the air volume from the upper nozzle 22b are not necessarily the same, and for example, the air volume from the lower nozzle 22a may be larger.
  • the touch member 24 is a member that contacts the substrate W on a predetermined transport line of the floating substrate W shown in FIG. located in between. Also, as shown in FIG. 3B, the touch member 24 is in contact with the non-coated portion H of the base material W and does not come into contact with the coating film.
  • the touch member 24 has a roller-like form that rotates around a rotation shaft 24a, and the outer peripheral surface of the touch member 24 is in contact with the non-coated portion H of the base material W. do. Then, due to the frictional force with the base material W, it rotates as the base material W is conveyed.
  • the rotating shaft 24 a is parallel to the width direction (Y-axis direction) of the base material W, and is supported by a supporting member 25 fixed to the housing portion 21 .
  • a plurality of touch members 24 are provided so as to contact each non-application portion H, and each touch member 24 is independently supported by a support member 25 as shown in FIG. 4(b).
  • each touch member 24 is independently supported in this manner, it is possible to provide a difference in height of each touch member 24 in accordance with the ideal conveying shape of the base material W.
  • FIG. At least the outer peripheral surface of the touch member 24 is preferably made of a heat-resistant and soft material, and in this embodiment, it is made of a ceramic material, a plastic material such as MC nylon, or the like.
  • the rotation axis 24a of the touch member 24 is parallel to the width direction (Y-axis direction) of the base material W, but this need not necessarily be the case.
  • the rotation shafts 24a of a pair of touch members 24 arranged in the width direction are inclined to form a substantially V shape extending the substrate W toward both widthwise ends, the substrate W will have A force can be generated that reduces the deflection in the width direction.
  • the substrate W is levitated by blowing gas from the drying nozzle 22 onto the substrate W
  • the touch member 24 were not provided, the flow rate of the gas blown from the drying nozzle 22 would be disturbed.
  • the base material W may vibrate in the gas blowing direction (Z-axis direction) due to changes in wind pressure applied to the base material W, or the like.
  • the coating film is formed in a striped pattern on the substrate W as shown in FIGS. 2 to 4
  • the non-coated portion H is thinner and lighter than the coated portion T, and thus easily deformed by wind pressure. .
  • the deformation of the base material W due to the wind pressure of the gas concentrates on the non-applied portion H, and as a result, the non-applied portion H flutters.
  • This local deformation in the base material W promotes the vibration of the base material W, and there is a risk that the entire base material W will vibrate with a large amplitude.
  • the transportation state of the substrate W is maintained on the predetermined transportation line. Therefore, the base material W stably floats and is conveyed within the housing part 21 .
  • the touch member 24 contacts the non-coated portion H, it is possible to prevent damage to the coating film caused by contact between the touch member 24 and the coating film before the completion of drying.
  • the touch member 24 is roller-shaped and rotates, it is possible to prevent rubbing between the touch member 24 and the base material W, and therefore the base material W can be prevented from being damaged.
  • the contact area between the touch member 24 and the base material W is too large, rubbing will occur between them. Therefore, it is preferable to consider the position of the touch member 24 so as to obtain the optimum contact area.
  • a touch member 24 in another embodiment is shown in FIG.
  • the touch member 24 in this embodiment has a roller-like shape that rotates about a rotating shaft 24a as in the above embodiment.
  • a plurality of touch members 24 have a common rotating shaft 24a, and these touch members 24 rotate synchronously. By sharing the rotating shaft 24a of the plurality of touch members 24 in this manner, the configuration of the device can be simplified.
  • a touch member 24 in still another embodiment is shown in FIG.
  • the touch member 24 in this embodiment does not have a roller shape as in the above-described embodiment, but has a curved surface bent so as to protrude toward the substrate W (non-coated portion H) as shown in FIG. 6(a). It has a curved surface portion, and the curved surface portion contacts the non-application portion H as shown in FIGS. 6(a) and 6(b).
  • it is a member that forms a part of the outer peripheral surface of the cylinder, and is fixed to the housing portion 21 via the support member 25 .
  • At least the outer peripheral surface of the touch member 24 is preferably made of a heat-resistant and soft material such as a ceramic material or a plastic material such as MC nylon, as in the above embodiment.
  • the touch member 24 of this embodiment does not have a rotating mechanism, unlike the roller-shaped touch member 24 described above. Therefore, since there is no sliding between the rotating shaft 24a and the support member 25 caused by the roller-shaped touch member 24, the problem of dust generation that may occur due to this sliding can be ignored.
  • FIG. 7A and 7B are views showing a drying device 2 according to a second embodiment of the present invention, where FIG. 7(a) is a front cross-sectional view and FIG. 7(b) is a BB arrow view in FIG. 7(a).
  • the drying device 2 in this embodiment has an edge nip portion 26 .
  • the edge nip portion 26 is an embodiment of the edge guiding portion in this description, contacts the vicinity of the edge of the substrate W, and defines the conveying path of the edge of the substrate W. As shown in FIG.
  • the edge nip portion 26 is for nipping both ends of the base material W in the width direction, as shown in FIGS.
  • the nip roll 27 is formed in a columnar shape and rotates about the central axis of the column. Each of the nip rolls 27 faces both widthwise end portions of the base material W on the front side and the back side of the base material W, and the pair of nip rolls 27 can nip the base material W from the front side and the back side. placed in position. A plurality of pairs of these nip rolls 27 are arranged in the direction in which the substrate W is conveyed.
  • the two nip rolls 27 located on the same side of the base material W are tilted so that their rotation axes form a substantially V shape as shown in FIG. 7(a). Good.
  • the set of nip rolls 27 is inclined so as to extend the nipped substrate W toward both ends in the width direction. Thereby, the bending of the base material W in the width direction can be reduced.
  • FIG. 8A and 8B are diagrams showing the drying nozzle 22 according to the third embodiment of the present invention
  • FIG. 8A is a schematic diagram of the drying nozzle 22 alone
  • FIG. 1 is a schematic view of the state positioned within the .
  • FIG. 8A is a schematic diagram of the drying nozzle 22 alone
  • FIG. 1 is a schematic view of the state positioned within the .
  • the blowout cover 28 is a member that covers the surface of the drying nozzle 22 on which the blowout openings 23 are provided, and partially covers the multiple blowout openings 23 of the drying nozzle 22 .
  • the blowout cover 28 can be attached at any position in the arrangement direction (Y-axis direction) of the blowout ports 23 .
  • the wind pressure in the vicinity of the portion where the blow-out cover 28 is provided is the same as that in the vicinity of the portion where the blow-out port 23 is exposed. lower than wind pressure. That is, it is possible to provide a difference in air pressure in one drying nozzle 22 .
  • Such a blowout cover 28 is preferably attached at a position facing the non-coating portion H in the transport path of the base material W as shown in FIG. 8(b). By doing so, the wind pressure at the position facing the non-application portion H is lower than the wind pressure at the position facing the application portion T. FIG.
  • the blow-off cover 28 may also be attached to positions facing both width direction end portions of the substrate W on which the coating film is not formed.
  • a coating film may be formed on one side of the material W. That is, the coating device 1 may be configured to have either the first coating mechanism 12 or the second coating mechanism.
  • the coating film formed on the base material sent to the drying device 2 does not necessarily have to be in a wet state containing a solvent on both sides. It does not matter if the coating film on one side has already been dried.
  • the coating does not have to be striped, and may be so-called solid coating.
  • the touch members 24 are preferably provided so as to come into contact with portions of both ends of the substrate W where the coating film is not formed.
  • the drying nozzle 22 is composed of the lower nozzle 22a and the upper nozzle 22b, and the example in which the gas is blown to both surfaces of the base material W to dry the coating film and float the base material W is performed. Although explained, it may be constituted by only the lower nozzle 22a.
  • the touch member 24 is positioned adjacent to the drying nozzle 22 (lower side) in the conveying direction of the substrate W as shown in FIG. Although it is provided in an intermediate portion between the nozzle 22a and the upper nozzle 22b), it is not limited to this, and may be provided so as to face the drying nozzle 22, for example.
  • blowout cover 28 is used as a means for forming a difference in wind pressure in one drying nozzle 22, but the invention is not limited to this.
  • each blowout port 23 may be made independent and then connected to a different supply unit (not shown) so that the wind pressure of the gas supplied to each blowout port 23 may be adjusted.
  • rolls in contact with the front side of the base material W and rolls in contact with the back side of the base material W may be alternately arranged along the conveying direction of the base material W. These rolls contact the vicinity of the edge of the substrate W within the housing portion 21 and dry the coating film formed on the substrate W in a state in which the conveying path of the edge of the substrate W is defined. Thereby, the vibration of the base material W can be reduced. Moreover, even if the substrate W is displaced and comes off the rolls, it can be easily returned to its original position as compared with the case where the substrate W is sandwiched.
  • coating device 2 drying device 11 transport mechanism 11a unwinding roll 11b winding roll 11c transport roll 11d backup roll 12 first coating mechanism 13 second coating mechanism 14 manifold 15 slit 16 discharge port 21 casing 22 drying nozzle 22a lower nozzle 22b upper nozzle 23 blowout port 231 suction port 24 touch member 24a rotating shaft 25 support member 26 edge nip portion 27 nip roll 28 blowout cover H non-coating portion T coating portion W base material

Abstract

To provide a drying device that is capable of conveying a base material in a stable state when drying a coated film formed on the base material. Specifically, a drying device 2 that dries a coated film coated on a base material W while conveying the base material W in a predetermined direction includes a drying nozzle 22 that causes flotation of the base material W and dries the coated film by blowing air toward the base material W, and a touching member 24 that comes into contact with the base material W in a flotation region that is a region in which the base material W is in a floating state due to the drying nozzle 22, wherein the coated film is formed on part of the base material W in a width direction thereof, and the touching member 24 comes into contact with the base material W in a non-coated portion H that is a portion on which the coated film is not formed.

Description

乾燥装置drying equipment
 本発明は、シート状の基材を搬送しながら、基材上に形成された塗膜を乾燥させる乾燥装置に関するものである。 The present invention relates to a drying apparatus that dries a coating film formed on a substrate while conveying a sheet-shaped substrate.
 従来、リチウムイオン電池の電池用極板の生産工程の中には、ロールツーロールで搬送されるシート状の基材に対して、活物質、バインダー、導電助剤、および溶媒を含む電極材料のスラリーを塗布して塗膜を形成し、形成した塗膜を乾燥装置により乾燥させる工程がある。 Conventionally, in the production process of electrode plates for lithium-ion batteries, an electrode material containing an active material, a binder, a conductive aid, and a solvent is applied to a sheet-like base material that is transported by roll-to-roll. There is a step of applying a slurry to form a coating film and drying the formed coating film with a drying device.
 特許文献1に示す乾燥装置では、基材に気体を吹き付けて塗膜を加熱することで、塗膜を乾燥させている。この乾燥装置の概略を図9に示す。図9(a)に示すように、乾燥装置90は筐体部91と、筐体部91の内部に設けられたノズル92とを有し、ノズル92の吹き出し口93から基材Wへ気体を吹き付けている。特に基材Wの両面に塗膜が形成される場合、塗膜の乾燥が完了するまでは塗膜に触れることができない。そのため、ノズル92から吹き付ける気体によって基材W上の塗膜を乾燥させると同時に、気体の風圧によって基材Wを浮揚させる。 In the drying device shown in Patent Document 1, the coating film is dried by blowing gas onto the base material to heat the coating film. An outline of this drying apparatus is shown in FIG. As shown in FIG. 9A, the drying device 90 has a housing portion 91 and a nozzle 92 provided inside the housing portion 91, and blows gas from an outlet 93 of the nozzle 92 to the substrate W. spraying. In particular, when the coating film is formed on both sides of the base material W, the coating film cannot be touched until drying of the coating film is completed. Therefore, the coating film on the substrate W is dried by the gas blown from the nozzle 92, and the substrate W is floated by the air pressure of the gas.
特開2014-173803号公報JP 2014-173803 A
 しかし、上記特許文献1に記載されたような乾燥装置では、基材に形成された塗膜を乾燥させる際に安定した状態で基材を搬送することができない場合があった。具体的には、ノズル92から吹き付ける気体により基材Wを浮揚させる必要性から、比較的大きな風量でノズル92は気体を吹き出さねばならず、一方、風量が大きくなるほど風量バランスを時間的に一定に維持することは困難となる。そして、風量バランスに乱れが生じた場合、基材Wが振動するおそれがある。特に、図9(b)に示すように基材Wの幅方向に非塗布部Hを挟んで複数の塗布部Tが並ぶように、すなわちストライプ状に塗膜を形成する場合、図10(a)に示すようにノズル92から吹き付ける風圧による変形が非塗布部Hに集中し、これが基材Wの振動を助長する。その結果、図10(b)に示すように、図内に二点鎖線で示す所定の搬送ラインを大きくはみだして基材W全体が搬送される。このように基材W全体が振動することにより、基材Wがノズル92などの乾燥装置90内の部材に接触してしまい、傷付いてしまう可能性があった。 However, with the drying apparatus as described in Patent Document 1, there were cases where the substrate could not be transported in a stable state when drying the coating film formed on the substrate. Specifically, since it is necessary to levitate the base material W by the gas blown from the nozzle 92, the nozzle 92 must blow out the gas with a relatively large air volume. It becomes difficult to maintain If the airflow balance is disturbed, the substrate W may vibrate. In particular, as shown in FIG. 9B, when a plurality of coated portions T are arranged in the width direction of the base material W with the non-coated portions H interposed therebetween, that is, when the coating film is formed in a stripe shape, the coating film is formed as shown in FIG. ), the deformation due to the air pressure blown from the nozzle 92 concentrates on the non-coating portion H, which promotes the vibration of the base material W. FIG. As a result, as shown in FIG. 10(b), the entire base material W is transported over a predetermined transport line indicated by a chain double-dashed line in the drawing. Due to the vibration of the entire base material W in this manner, the base material W may come into contact with the members inside the drying device 90 such as the nozzle 92 and may be damaged.
 本発明は、上記問題を鑑みてされたものであり、基材に形成された塗膜を乾燥させる際に安定した状態で基材を搬送することができる乾燥装置を提供することを目的としている。 SUMMARY OF THE INVENTION It is an object of the present invention to provide a drying apparatus capable of conveying a substrate in a stable state when drying a coating film formed on the substrate. .
 上記課題を解決するための本発明の乾燥装置は、所定方向に基材を搬送しながら基材に塗布された塗膜を乾燥させる乾燥装置であり、基材に向けて気体を吹き付けることによって基材を浮揚させるとともに塗膜を乾燥させる乾燥ノズルと、前記乾燥ノズルにより基材が浮揚する状態となる領域である浮揚領域において基材と接触するタッチ部材と、を備え、基材の幅方向において塗膜は一部に形成され、前記タッチ部材は、塗膜が形成されていない部分である非塗布部において基材と接触することを特徴としている。 The drying apparatus of the present invention for solving the above problems is a drying apparatus that dries a coating film applied to a substrate while conveying the substrate in a predetermined direction. A drying nozzle that floats the material and dries the coating film, and a touch member that contacts the substrate in a floating region, which is a region where the substrate is floated by the drying nozzle. In the width direction of the substrate, A coating film is partially formed, and the touch member is characterized in that the non-coating portion, which is a portion where the coating film is not formed, is in contact with the substrate.
 上記乾燥装置によれば、タッチ部材を有し、そのタッチ部材が基材の非塗布部に接触することによって、塗膜を傷つけること無く乾燥ノズルから吹き付ける気体により基材が振動することを抑制するため、乾燥装置内で基材を安定して搬送することができる。 According to the drying apparatus, the touch member is provided, and the touch member contacts the non-coated portion of the base material, thereby suppressing the vibration of the base material due to the gas blown from the drying nozzle without damaging the coating film. Therefore, the substrate can be stably conveyed within the drying device.
 また、前記乾燥ノズルは基材の下方から気体を吹き付ける下側ノズルと、基材の上方から気体を吹き付ける上側ノズルと、を有し、基材の搬送経路に沿って前記下側ノズルと前記上側ノズルとが並べられることにより、前記浮揚領域において搬送方向では上下方向に波打つように基材の搬送ラインが形成されていると良い。 In addition, the drying nozzle has a lower nozzle for blowing gas from below the base material and an upper nozzle for blowing gas from above the base material. By arranging the nozzles, it is preferable that the carrier line of the base material is formed so as to undulate vertically in the carrier direction in the floating region.
 この構成によれば、基材を浮揚させた形態で所定の方向に正確に搬送することができる。 According to this configuration, it is possible to accurately convey the base material in a levitated form in a predetermined direction.
 また、前記タッチ部材は、基材に向かって凸となるよう屈曲した曲面を有する曲面部を有しても良い。 Further, the touch member may have a curved surface portion having a curved surface that is convex toward the base material.
 この構成によれば、タッチ部材における発塵を軽減することができる。 According to this configuration, dust generation on the touch member can be reduced.
 また、前記タッチ部材は、ローラーであっても良い。 Also, the touch member may be a roller.
 この構成によれば、タッチ部材と基材におけるこすれを防ぐことができる。 With this configuration, it is possible to prevent rubbing between the touch member and the base material.
 また、塗膜は基材の幅方向にストライプ状に形成され、塗膜と塗膜の間に前記非塗布部を有すると良い。 In addition, it is preferable that the coating film is formed in a stripe shape in the width direction of the base material, and that the non-coating portion is provided between the coating films.
 このようにストライプ状に塗膜が形成される場合、特に基材の振動が大きくなる可能性があるが、タッチ部材によってその振動を抑制することができる。 When the coating film is formed in stripes like this, there is a possibility that the base material will especially vibrate, but the vibration can be suppressed by the touch member.
 また、前記乾燥ノズルにおいて、前記非塗布部と対向する位置における風圧が塗膜と対向する位置における風圧よりも低いと良い。 Further, in the drying nozzle, it is preferable that the wind pressure at the position facing the non-coating portion is lower than the wind pressure at the position facing the coating film.
 この構成によれば、気体による塗膜の乾燥を妨げること無く非塗布部の変形を抑えることができるため、基材の振動をさらに抑制することができる。 According to this configuration, deformation of the non-coated portion can be suppressed without hindering the drying of the coating film by the gas, so vibration of the base material can be further suppressed.
 また、前記浮揚領域内で基材のエッジ近傍と接触し、当該エッジの搬送経路を規定するエッジ誘導部を有している構成としてもよい。 Further, it may be configured to have an edge guiding portion that contacts the vicinity of the edge of the base material in the floating region and defines the conveying path of the edge.
 この構成によれば、基材の端部の搬送位置が固定されるため、基材の振動をさらに低減させることができる。 According to this configuration, since the transport position of the edge of the base material is fixed, the vibration of the base material can be further reduced.
 本発明の乾燥装置によれば、基材に形成された塗膜を乾燥させる際に安定した状態で基材を搬送することが可能となる。 According to the drying apparatus of the present invention, it is possible to convey the substrate in a stable state when drying the coating film formed on the substrate.
乾燥装置を備えた塗工装置を示す概略図である。It is a schematic diagram showing a coating device provided with a drying device. 塗膜が形成された基材の一例である。It is an example of a substrate on which a coating film is formed. 本発明の第一実施形態における乾燥装置を示す概略図である。It is a schematic diagram showing a drying device in a first embodiment of the present invention. 本発明の乾燥装置におけるタッチ部材の一実施形態を示す概略図である。FIG. 4 is a schematic diagram showing one embodiment of a touch member in the drying apparatus of the present invention; 本発明の乾燥装置におけるタッチ部材の他の実施形態を示す概略図である。FIG. 5 is a schematic diagram showing another embodiment of the touch member in the drying apparatus of the present invention; 本発明の乾燥装置におけるタッチ部材の他の実施形態を示す概略図である。FIG. 5 is a schematic diagram showing another embodiment of the touch member in the drying apparatus of the present invention; 本発明の第二実施形態における乾燥装置を示す概略図である。It is the schematic which shows the drying apparatus in 2nd embodiment of this invention. 本発明の第三実施形態における乾燥装置を示す概略図である。It is the schematic which shows the drying apparatus in 3rd embodiment of this invention. 従来の乾燥装置を示す概略図である。1 is a schematic diagram showing a conventional drying device; FIG. 従来の乾燥装置における基材の搬送状態を示す概略図である。FIG. 4 is a schematic diagram showing a transport state of a substrate in a conventional drying device;
 〔第一実施形態〕
 本発明の第一実施形態における乾燥装置について図面を参照しながら説明する。なお、以下の説明では、直交座標系の3軸をX、Y、Zとし、水平方向のうち乾燥装置において基材が搬送される主方向をX軸方向、X軸方向と直交する方向をY軸方向と表現し、XY平面と垂直な方向(つまり、鉛直方向)をZ軸方向と表現する。
[First embodiment]
A drying apparatus according to a first embodiment of the present invention will be described with reference to the drawings. In the following description, the three axes of the orthogonal coordinate system are X, Y, and Z, the main horizontal direction in which the substrate is conveyed in the drying apparatus is the X-axis direction, and the direction perpendicular to the X-axis direction is Y. A direction perpendicular to the XY plane (that is, a vertical direction) is referred to as a Z-axis direction.
 図1は、第一実施形態における乾燥装置2を備えた塗工装置1を概略的に示す図である。 FIG. 1 is a diagram schematically showing a coating device 1 equipped with a drying device 2 according to the first embodiment.
 塗工装置1は、シート状の基材Wを搬送する搬送機構11と、基材Wの所定面に塗布液を塗布して塗膜(図2を参照)形成する第1の塗布機構12と、基材Wの所定面の裏面に塗布液を塗布して塗膜を形成する第2の塗布機構13とを有している。乾燥装置2は、搬送機構11による基材Wの搬送経路上に配置されている。なお、本実施形態における基材Wの所定面とは第1の塗布機構12により塗膜が形成される面であり、基材Wの裏面とは上記所定面の反対側の面であり、第2の塗布機構13により塗膜が形成される面のことである。以下、基材Wの所定面を表面、その反対面を基材Wの裏面とも呼ぶ。 The coating apparatus 1 includes a transport mechanism 11 that transports a sheet-like substrate W, and a first coating mechanism 12 that applies a coating liquid to a predetermined surface of the substrate W to form a coating film (see FIG. 2). , and a second coating mechanism 13 for coating the back surface of a predetermined surface of the base material W with the coating liquid to form a coating film. The drying device 2 is arranged on the transport path of the substrate W by the transport mechanism 11 . Note that the predetermined surface of the substrate W in the present embodiment is the surface on which the coating film is formed by the first coating mechanism 12, and the back surface of the substrate W is the surface opposite to the predetermined surface. 2 is the surface on which the coating film is formed by the coating mechanism 13 of 2. Hereinafter, the predetermined surface of the base material W is also referred to as the front surface, and the opposite surface is also referred to as the back surface of the base material W.
 本実施形態における塗工装置1は、搬送機構11により搬送される基材Wの両面に第1の塗布機構12と第2の塗布機構13により塗膜を形成し、これら塗膜を乾燥装置2により乾燥させる。 The coating apparatus 1 according to the present embodiment forms coating films on both surfaces of a base material W transported by a transport mechanism 11 by means of a first coating mechanism 12 and a second coating mechanism 13, and these coating films are dried by a drying device 2. Allow to dry.
 本実施形態における基材Wは、リチウムイオン電池の電池用極板となる金属箔であり、正極を構成する場合はアルミニウム箔などが用いられ、負極を構成する場合は銅箔などが用いられる。この基材Wは、一方向に長い帯状(シート状)の形態を有し、搬送機構11により塗工装置1を構成する各部を経由するよう、長尺方向に搬送される。 The base material W in the present embodiment is a metal foil that serves as a battery electrode plate for a lithium ion battery, and aluminum foil or the like is used when forming a positive electrode, and copper foil or the like is used when forming a negative electrode. The base material W has a belt-like (sheet-like) shape that is long in one direction, and is conveyed in the longitudinal direction by the conveying mechanism 11 so as to pass through each part constituting the coating apparatus 1 .
 本実施形態における塗布液は、たとえば、活物質、バインダー、導電助剤、および溶媒を含むスラリーのことであり、リチウムイオン電池の電池用極板の材料(所謂、電極材料)として用いられる。この塗布液を基材Wに塗布することで、基材W上に塗膜が形成される。 The coating liquid in the present embodiment is, for example, a slurry containing an active material, a binder, a conductive aid, and a solvent, and is used as a material for electrode plates of lithium ion batteries (so-called electrode material). A coating film is formed on the base material W by applying this coating liquid to the base material W. FIG.
 本実施形態における搬送機構11は、いわゆるロールツーロール搬送で基材Wを搬送するためのものである。搬送機構11は、図1に示すように基材Wを巻き出す巻出ロール11aと、基材Wを巻き取る巻取ロール11bと、巻出ロール11aから巻き出された基材Wが巻取ロール11bに巻き取られるまでに経由する搬送ロール11cと、後述する第1の塗布機構12により塗布液を塗布する位置に基材Wを案内するバックアップロール11dとを有している。この搬送機構11が有する各々のロールは、円柱状に形成され、この円柱の中心軸を回転軸として回転する。 The transport mechanism 11 in this embodiment is for transporting the base material W by so-called roll-to-roll transport. As shown in FIG. 1, the transport mechanism 11 includes an unwinding roll 11a for unwinding the base material W, a winding roll 11b for winding the base material W, and a winding roll for winding the base material W unwound from the unwinding roll 11a. It has a transport roll 11c through which the base material W is wound up by the roll 11b, and a backup roll 11d that guides the base material W to a position where the coating liquid is applied by the first coating mechanism 12, which will be described later. Each roll of the conveying mechanism 11 is formed in a columnar shape and rotates about the central axis of the column.
 巻出ロール11aは、図示しない制御部により回転駆動を制御され、所定の速度で基材Wを巻き出す。制御部は、たとえば、汎用のコンピュータ装置によって構成されている。また、巻取ロール11bは、巻出ロール11aと同様に制御部により回転駆動を制御され、基材Wに所定の張力を付与しながら基材Wを巻き取る。なお、ここでいう張力は、基材Wの搬送方向の張力のことである。 The unwinding roll 11a is rotationally driven by a control unit (not shown), and unwinds the substrate W at a predetermined speed. The control unit is configured by, for example, a general-purpose computer device. The take-up roll 11b is rotationally controlled by the control unit in the same manner as the unwind roll 11a, and winds the base material W while applying a predetermined tension to the base material W. As shown in FIG. In addition, the tension|tensile_strength here is the tension|tensile_strength of the conveyance direction of the base material W. FIG.
 搬送ロール11cは、図1に示すように複数設けられ、基材Wが塗工装置1を構成する各部を経由するよう配置されている。この複数の搬送ロール11cのうち一部、またはすべての搬送ロール11cは、巻出ロール11aおよび巻取ロール11bと同様に制御部により回転駆動を制御され、基材Wに所定の張力を付与しながら基材Wを搬送する。 A plurality of transport rolls 11c are provided as shown in FIG. Some or all of the transport rolls 11c among the plurality of transport rolls 11c are rotationally controlled by the control unit in the same manner as the unwind roll 11a and the winding roll 11b, and apply a predetermined tension to the base material W. The substrate W is conveyed while
 バックアップロール11dは、図1に示すように後述する第1の塗布機構12と対向するよう配置されている。そのため、第1の塗布機構12と一定間隔を保ちながら基材Wを搬送することができる。 The backup roll 11d is arranged so as to face the first coating mechanism 12, which will be described later, as shown in FIG. Therefore, the substrate W can be transported while keeping a constant distance from the first coating mechanism 12 .
 これら構成により、搬送機構11は、所定の張力を基材Wに付与しながら基材Wを所定の速度で搬送する。 With these configurations, the transport mechanism 11 transports the base material W at a predetermined speed while applying a predetermined tension to the base material W.
 本実施形態における第1の塗布機構12は、搬送される基材Wの表面に塗布液を塗布してストライプ状に塗膜を形成するためのものである。ストライプ状に塗膜を形成するとは、図2(a)および(b)に示すように基材Wの幅方向において塗膜が形成された複数の塗布部Tと、複数の塗布部Tの間に塗膜が形成されていない非塗布部Hを基材Wが有するよう塗膜を形成することである。なお、図2(a)では基材Wの両面において同じ位置に同じ幅の塗布部Tが形成された例を示しているが、必ずしも基材Wの両面において塗布部Tの位置、幅が同じでなくても構わない。 The first coating mechanism 12 in the present embodiment is for coating a coating liquid on the surface of the substrate W being conveyed to form a coating film in stripes. Forming a coating film in a stripe shape means that a plurality of coating portions T in which a coating film is formed in the width direction of the base material W as shown in FIGS. The coating film is formed so that the substrate W has a non-coating portion H where the coating film is not formed. Although FIG. 2A shows an example in which the coating portions T having the same width are formed at the same positions on both sides of the base material W, the positions and widths of the coating portions T are not necessarily the same on both sides of the base material W. It doesn't matter if it's not.
 ここで、本実施形態では、第1の塗布機構12が電極材料のスラリーを塗布するスリットダイであるものを例に説明するが、第1の塗布機構12はスリットダイに限らず、たとえば、インクジェット塗布用やグラビア塗布用の塗布方式に対応するものであっても良い。なお、後述する第2の塗布機構13も同様である。 Here, in the present embodiment, an example in which the first coating mechanism 12 is a slit die for coating the electrode material slurry will be described, but the first coating mechanism 12 is not limited to the slit die. It may correspond to a coating method for coating or gravure coating. The same applies to the second coating mechanism 13, which will be described later.
 第1の塗布機構12は、基材Wの幅方向(図1におけるY軸方向)に沿って長く形成されている。ここで、前述したバックアップロール11dが、第1の塗布機構12に対して、バックアップロール11dの回転軸方向と第1の塗布機構12の幅方向とが平行になるよう所定の間隔を空けて配置されている。 The first coating mechanism 12 is formed long along the width direction of the substrate W (the Y-axis direction in FIG. 1). Here, the backup roll 11d described above is arranged at a predetermined distance from the first coating mechanism 12 so that the rotation axis direction of the backup roll 11d and the width direction of the first coating mechanism 12 are parallel. It is
 また、第1の塗布機構12は、図示しない供給路に接続され、幅方向に長く塗布液を溜める空間であるマニホールド14と、このマニホールド14と繋がった幅方向に広いスリット15と、幅方向においてスリット15と同一の長さで開口し、塗布液を吐出する吐出口16により構成される。これにより、マニホールド14に溜められた塗布液がスリット15を経由して、吐出口16から基材Wに吐出される。また、吐出口16は、バックアップロール11dと基材Wを挟んで対向している。すなわち、吐出口16は基材Wの表面側で基材Wと対向している。これにより、吐出口16と基材Wとの間隔を一定に保った状態で、基材Wの表面側に塗布液を塗布することができる。 The first coating mechanism 12 is connected to a supply path (not shown) and includes a manifold 14 that is a space that is long in the width direction and stores the coating liquid, a slit 15 that is wide in the width direction and is connected to the manifold 14, and a slit 15 that is wide in the width direction. It is composed of a discharge port 16 that opens with the same length as the slit 15 and discharges the coating liquid. As a result, the coating liquid stored in the manifold 14 is ejected onto the substrate W from the ejection port 16 via the slit 15 . Further, the discharge port 16 faces the backup roll 11d with the substrate W interposed therebetween. That is, the ejection port 16 faces the substrate W on the surface side of the substrate W. As shown in FIG. As a result, the coating liquid can be applied to the surface side of the base material W while maintaining a constant distance between the discharge port 16 and the base material W.
 そして、第1の塗布機構12には、基材Wに形成する塗膜をストライプ状にするための図示しないシム板がさらに設けられている。シム板は、たとえば、略櫛型状を有しており、スリット15を幅方向に分割するよう配置されている。このシム板によりスリット15を幅方向に分割した状態で塗布液を塗布すると、シム板がない部分から塗布液が塗布され、シム板がある部分から塗布液が塗布されないようになる。すなわち、塗膜をストライプ状に形成することができる。なお、このシム板の形状を変更することで、塗膜の幅を調節することができるようになっている。すなわち、塗布部Tと非塗布部Hの幅を調節することができる。 The first coating mechanism 12 is further provided with a shim plate (not shown) for making the coating film formed on the base material W into a striped pattern. The shim plate has, for example, a substantially comb shape and is arranged to divide the slit 15 in the width direction. When the coating liquid is applied while the slit 15 is divided in the width direction by the shim plate, the coating liquid is applied from the portion without the shim plate and is not applied from the portion with the shim plate. That is, the coating film can be formed in stripes. By changing the shape of the shim plate, the width of the coating film can be adjusted. That is, the widths of the applied portion T and the non-applied portion H can be adjusted.
 これらの構成を有する第1の塗布機構12によって、基材Wの表面にストライプ状に塗膜を形成することができる。 A striped coating can be formed on the surface of the substrate W by the first coating mechanism 12 having these configurations.
 本実施形態における第2の塗布機構13は、搬送される基材Wの裏面に塗布液を塗布してストライプ状に塗膜を形成するためのものである。第2の塗布機構13は、図1に示すように前述した第1の塗布機構12と同様な構成をしており、第2の塗布機構13の吐出口16は、基材Wの裏面側で基材Wと対向して配置されている。 The second coating mechanism 13 in this embodiment is for coating the back surface of the substrate W to be transported with the coating liquid to form a striped coating film. The second coating mechanism 13 has the same configuration as the first coating mechanism 12 described above, as shown in FIG. It is arranged so as to face the base material W.
 そして、第2の塗布機構13は、図示しない供給路から塗布液が供給され、この供給された塗布液を基材Wの裏面に塗布液を塗布する。これにより、基材Wの裏面にストライプ状の塗膜を形成することができる。 Then, the second coating mechanism 13 is supplied with the coating liquid from a supply path (not shown), and coats the back surface of the substrate W with the supplied coating liquid. Thereby, a stripe-shaped coating film can be formed on the back surface of the base material W. As shown in FIG.
 これら第1の塗布機構12および第2の塗布機構13により基材Wの両面にストライプ状に塗膜を形成することができる。 The first coating mechanism 12 and the second coating mechanism 13 can form coating films in stripes on both sides of the substrate W.
 なお、図2(a)では基材Wの両面において同じ位置に同じ幅の塗布部Tが形成された例を示しているが、必ずしも基材Wの両面において塗布部Tの位置、幅が同じでなくても構わない。 Although FIG. 2A shows an example in which the coating portions T having the same width are formed at the same positions on both sides of the base material W, the positions and widths of the coating portions T are not necessarily the same on both sides of the base material W. It doesn't matter if it's not.
 本実施形態における乾燥装置2を図3に示す。図3(a)は乾燥装置2の正面断面図であり、図3(b)は図3(a)におけるAA矢視図である。 The drying device 2 in this embodiment is shown in FIG. Fig.3 (a) is front sectional drawing of the drying apparatus 2, FIG.3(b) is AA arrow directional view in Fig.3 (a).
 乾燥装置2は、いわゆる乾燥炉であり、第1の塗布機構12および第2の塗布機構13により基材Wの両面に形成された塗膜に含まれる溶剤を揮発させることによって乾燥させる。乾燥装置2は、図1に示すように搬送機構11による基材Wの搬送経路上において第1の塗布機構12および第2の塗布機構13よりも下流側に設けられ、筐体部21と、筐体部21の内部に設けられ、基材Wに気体を吹き付ける乾燥ノズル22とを有している。この乾燥ノズル22による気体により基材W上の塗膜を乾燥させるとともに基材Wを浮揚させる。すなわち、筐体部21内には、基材Wが浮揚する状態となる領域である浮揚領域が形成される。なお、乾燥ノズル22から吹き付ける気体が熱風であれば、熱によって塗膜の溶剤の揮発をさらに促進させることができ、好ましい。 The drying device 2 is a so-called drying furnace, and dries by volatilizing the solvent contained in the coating films formed on both sides of the substrate W by the first coating mechanism 12 and the second coating mechanism 13 . As shown in FIG. 1, the drying device 2 is provided downstream of the first coating mechanism 12 and the second coating mechanism 13 on the transport path of the base material W by the transport mechanism 11, and includes a housing part 21, A drying nozzle 22 is provided inside the housing 21 and blows a gas onto the substrate W. The gas from the drying nozzle 22 dries the coating film on the substrate W and floats the substrate W. As shown in FIG. That is, a floatation area, which is an area in which the base material W floats, is formed in the housing part 21 . If the gas blown from the drying nozzle 22 is hot air, the heat can further accelerate the volatilization of the solvent in the coating film, which is preferable.
 また、筐体部21内には、この浮遊領域において基材Wの所定の搬送ライン上で浮揚する基材Wと接触するタッチ部材24がさらに設けられている。 Further, in the housing part 21, a touch member 24 is further provided to contact the base material W floating on a predetermined transport line of the base material W in this floating area.
 筐体部21は、基材Wの搬送方向に長く形成された箱体であり、この箱体の内部空間であって通過する基材Wを囲う空間と、この空間に基材Wが出入りするための入口および出口を有している。そして、塗膜が形成された基材Wが搬送機構11により筐体部21内を通過するよう搬送される。また、筐体部21が基材Wを囲うことによって、基材W上の塗膜を乾燥させるための熱が外部に逃げることを抑制するとともに、基材Wを浮揚させるために必要な乾燥ノズル22からの風量を小さくする。 The housing part 21 is a box elongated in the direction in which the base material W is conveyed, and is an internal space of the box body and includes a space surrounding the passing base material W and a space through which the base material W enters and exits. has an inlet and an outlet for Then, the substrate W on which the coating film is formed is transported by the transport mechanism 11 so as to pass through the inside of the housing portion 21 . In addition, by surrounding the base material W with the housing part 21, the heat for drying the coating film on the base material W is suppressed from escaping to the outside, and the drying nozzle necessary for floating the base material W is provided. Decrease the air volume from 22.
 乾燥ノズル22は所定方向に気体を吹き出す構成を有し、基材Wに向けて気体を吹き付ける。乾燥ノズル22は、筐体部21内で基材Wの下方に設置されて上面に気体を吹き出す吹き出し口23を有する下側ノズル22aと、筐体部21内で基材Wの上方に設置されて下面に吹き出し口23を有する上側ノズル22bとがあり、本実施形態では、下側ノズル22aと上側ノズル22bとが基材Wの搬送方向に交互に配置されている。 The drying nozzle 22 has a configuration for blowing gas in a predetermined direction, and blows the gas toward the base material W. The drying nozzle 22 includes a lower nozzle 22a which is installed below the base material W in the housing part 21 and has a blowout port 23 for blowing gas to the upper surface, and a lower nozzle 22a which is installed above the base material W within the housing part 21. In this embodiment, the lower nozzles 22a and the upper nozzles 22b are arranged alternately in the direction in which the substrate W is conveyed.
 乾燥ノズル22は、内部に図示しない空洞部を1つ有し、この空洞部へ図示しない供給源から気体が供給される。吹き出し口23は図3(b)に示すように基材Wの幅方向(Y軸方向)に延びるスリット状の開口であり、この空洞部と連通する。これにより、供給源から供給された気体が空洞部を経由して吹き出し口23から略均一な風圧で吹き出される。この構成により、下側ノズル22aは基材Wの下方から基材Wに向かって気体を吹き付け、また、上側ノズル22bは基材Wの上方から基材Wに向かって気体を吹き付ける。これら気体により、基材Wの両面に形成された塗膜中の溶剤を揮発させ、塗膜を乾燥させる。また、吹き出し口23から発せられた気体が乾燥ノズル22近傍で滞留することを防ぐため、気体を回収するための吸引口231が適宜設けられていても良い。 The drying nozzle 22 has one cavity (not shown) inside, and gas is supplied to this cavity from a supply source (not shown). The blowout port 23 is a slit-like opening extending in the width direction (Y-axis direction) of the base material W as shown in FIG. 3B, and communicates with this cavity. As a result, the gas supplied from the supply source is blown out from the blowout port 23 through the hollow portion with a substantially uniform wind pressure. With this configuration, the lower nozzle 22a blows gas toward the substrate W from below the substrate W, and the upper nozzle 22b blows gas toward the substrate W from above. These gases volatilize the solvent in the coating films formed on both surfaces of the base material W and dry the coating films. Moreover, in order to prevent the gas emitted from the blowing port 23 from accumulating in the vicinity of the drying nozzle 22, a suction port 231 for recovering the gas may be appropriately provided.
 ここで、筐体部21内には、前述した搬送ロール11cが配置されていない。特に本実施形態のように基材Wの両面に塗膜が形成される場合、塗膜の乾燥が完了するまで塗膜に触れることができない。そのため、筐体部21内では、基材Wの少なくとも幅方向の両端部以外は非接触の状態で搬送されることが好ましい。これに対して、本実施形態では、筐体部21よりも上流側に配置された搬送ロール11cと下流側に配置された搬送ロール11cにより基材Wに所定の張力を付与すると同時に、下側ノズル22aにより基材Wの下方から気体を吹き付ける。この気体の風圧により、基材Wは揚力が付与された状態で、搬送機構11により搬送されて筐体部21内を通過する。すなわち、乾燥ノズル22から吹き付ける気体は、塗膜を乾燥させると同時に基材Wを浮揚させるように作用する。 Here, the above-described transport roll 11c is not arranged inside the housing portion 21. In particular, when coating films are formed on both sides of the substrate W as in the present embodiment, the coating films cannot be touched until drying of the coating films is completed. Therefore, it is preferable that the base material W is conveyed in a non-contact state in the housing part 21 except for at least both ends in the width direction. On the other hand, in the present embodiment, a predetermined tension is applied to the substrate W by the transport roll 11c arranged on the upstream side and the transport roll 11c arranged on the downstream side of the housing portion 21, and at the same time, A gas is blown from below the substrate W by the nozzle 22a. The base material W is conveyed by the conveying mechanism 11 and passes through the housing part 21 while being given a lift force by the wind pressure of the gas. That is, the gas blown from the drying nozzle 22 dries the coating film and at the same time floats the substrate W.
 また、本実施形態では、上記の通り下側ノズル22aと上側ノズル22bとが基材Wの搬送方向に交互に配置されている。これらの乾燥ノズル22から気体を吹き付けられた基材Wは、図3(a)に示すように搬送方向では上下方向に波打つような搬送ラインを筐体部21内の浮揚領域で形成する。このように搬送される基材Wは、筐体部21内で浮揚しながらも、巨視的には図3(a)に二点鎖線で示すような直線方向(X軸方向)に進む。このように略直線的に基材Wを搬送させることにより、基材Wを浮揚させた形態であっても所定の方向に正確に搬送することができる。ここで、下側ノズル22aからの風量と上側ノズル22bからの風量は必ずしも同じである必要はなく、たとえば下側ノズル22aからの風量の方が大きくても良い。 In addition, in the present embodiment, the lower nozzles 22a and the upper nozzles 22b are alternately arranged in the transport direction of the substrate W as described above. The substrate W sprayed with the gas from these drying nozzles 22 forms a transport line in the floatation area in the housing 21 that undulates vertically in the transport direction, as shown in FIG. 3(a). The base material W conveyed in this way floats in the housing part 21 and macroscopically advances in a linear direction (X-axis direction) as indicated by a two-dot chain line in FIG. 3(a). By conveying the substrate W substantially linearly in this way, even if the substrate W is in a levitated form, it can be accurately conveyed in a predetermined direction. Here, the air volume from the lower nozzle 22a and the air volume from the upper nozzle 22b are not necessarily the same, and for example, the air volume from the lower nozzle 22a may be larger.
 タッチ部材24は、図3(a)に示す浮揚する基材Wの所定の搬送ライン上で基材Wと接触する部材であり、基材Wの搬送方向において下側ノズル22aと上側ノズル22bの間に位置する。また、タッチ部材24は、図3(b)に示すように、基材Wの非塗布部Hと接触しており、塗膜とは接触しない。 The touch member 24 is a member that contacts the substrate W on a predetermined transport line of the floating substrate W shown in FIG. located in between. Also, as shown in FIG. 3B, the touch member 24 is in contact with the non-coated portion H of the base material W and does not come into contact with the coating film.
 また、本実施形態では、図4(a)に示すようにタッチ部材24は回転軸24aを軸に回転するローラー状の形態を有し、その外周面が基材Wの非塗布部Hと接触する。そして、基材Wとの間の摩擦力により、基材Wの搬送にともなって回転する。回転軸24aは基材Wの幅方向(Y軸方向)と平行であり、筐体部21に固定された支持部材25に支持されている。また、タッチ部材24は各々の非塗布部Hに接触するよう複数個設けられており、図4(b)に示す通り各々のタッチ部材24が独立して支持部材25に支持されている。このように各々のタッチ部材24が独立して支持されていることにより、基材Wの理想的な搬送形状に合わせてそれぞれのタッチ部材24の高さに差を設けることも可能である。また、タッチ部材24の少なくとも外周面は熱に強く軟らかい材料で形成されることが好ましく、本実施形態ではセラミック材料、MCナイロンなどのプラスチック材料などにより形成されている。 Further, in the present embodiment, as shown in FIG. 4A, the touch member 24 has a roller-like form that rotates around a rotation shaft 24a, and the outer peripheral surface of the touch member 24 is in contact with the non-coated portion H of the base material W. do. Then, due to the frictional force with the base material W, it rotates as the base material W is conveyed. The rotating shaft 24 a is parallel to the width direction (Y-axis direction) of the base material W, and is supported by a supporting member 25 fixed to the housing portion 21 . A plurality of touch members 24 are provided so as to contact each non-application portion H, and each touch member 24 is independently supported by a support member 25 as shown in FIG. 4(b). Since each touch member 24 is independently supported in this manner, it is possible to provide a difference in height of each touch member 24 in accordance with the ideal conveying shape of the base material W. FIG. At least the outer peripheral surface of the touch member 24 is preferably made of a heat-resistant and soft material, and in this embodiment, it is made of a ceramic material, a plastic material such as MC nylon, or the like.
 ここで、本実施形態では、上記の通りタッチ部材24の回転軸24aは基材Wの幅方向(Y軸方向)と平行であるが、必ずしもそうでなくても構わない。たとえば、幅方向に配列された1組のタッチ部材24の回転軸24aが基材Wを幅方向両端部に向かって伸ばすように略V字を形成するよう傾いている場合、基材Wに生じる幅方向の撓みを軽減する力を生じさせうる。 Here, in the present embodiment, as described above, the rotation axis 24a of the touch member 24 is parallel to the width direction (Y-axis direction) of the base material W, but this need not necessarily be the case. For example, if the rotation shafts 24a of a pair of touch members 24 arranged in the width direction are inclined to form a substantially V shape extending the substrate W toward both widthwise ends, the substrate W will have A force can be generated that reduces the deflection in the width direction.
 本発明の通り乾燥装置2がタッチ部材24を有することで得られる効果を以下に説明する。 The effect obtained by having the touch member 24 in the drying device 2 according to the present invention will be described below.
 本実施形態のように乾燥ノズル22から基材Wに気体を吹き付けて基材Wを浮揚させる形態において、仮にタッチ部材24が無かった場合には、乾燥ノズル22から吹き付ける気体の風量バランスの乱れによる基材Wが受ける風圧の変化などに起因して気体の吹き付け方向(Z軸方向)に基材Wが振動するおそれがある。特に、図2乃至図4に示すように基材W上に塗膜がストライプ状に形成される場合、塗布部Tと比較して非塗布部Hの方が薄く軽いため、風圧により変形しやすい。そのため、気体の風圧による基材Wの変形は非塗布部Hに集中し、その結果、非塗布部Hがばたつく。基材Wにおけるこの局所的な変形は、基材Wの振動を助長し、大きな振幅で基材W全体が振動するおそれがある。 In the embodiment in which the substrate W is levitated by blowing gas from the drying nozzle 22 onto the substrate W, if the touch member 24 were not provided, the flow rate of the gas blown from the drying nozzle 22 would be disturbed. The base material W may vibrate in the gas blowing direction (Z-axis direction) due to changes in wind pressure applied to the base material W, or the like. In particular, when the coating film is formed in a striped pattern on the substrate W as shown in FIGS. 2 to 4, the non-coated portion H is thinner and lighter than the coated portion T, and thus easily deformed by wind pressure. . Therefore, the deformation of the base material W due to the wind pressure of the gas concentrates on the non-applied portion H, and as a result, the non-applied portion H flutters. This local deformation in the base material W promotes the vibration of the base material W, and there is a risk that the entire base material W will vibrate with a large amplitude.
 これに対し、所定の搬送ライン上でタッチ部材24が基材Wに接触することによって基材Wが振動することを抑制するため、基材Wの搬送状態は所定の搬送ラインを維持する。そのため、筐体部21内で基材Wは安定して浮揚し、搬送される。また、タッチ部材24が非塗布部Hと接触するため、乾燥完了前の塗膜とタッチ部材24とが接触して塗膜を破損させることを防ぐことができる。 On the other hand, in order to suppress the substrate W from vibrating due to the touch member 24 coming into contact with the substrate W on the predetermined transportation line, the transportation state of the substrate W is maintained on the predetermined transportation line. Therefore, the base material W stably floats and is conveyed within the housing part 21 . In addition, since the touch member 24 contacts the non-coated portion H, it is possible to prevent damage to the coating film caused by contact between the touch member 24 and the coating film before the completion of drying.
 また、タッチ部材24がローラー状であって回転することにより、タッチ部材24と基材Wとの間でこすれが生じることを防ぎ、そのため、基材Wが傷つくことを防ぐことができる。 In addition, since the touch member 24 is roller-shaped and rotates, it is possible to prevent rubbing between the touch member 24 and the base material W, and therefore the base material W can be prevented from being damaged.
 ここで、タッチ部材24と基材Wとの接触面積が大きくなるほど、タッチ部材24による基材Wの振動を防ぐ効果を大きく得ることができる。一方、タッチ部材24と基材Wとの接触面積が大きすぎると両者の間でこすれが生じるため、最適な接触面積となるようタッチ部材24の位置を検討することが好ましい。 Here, the greater the contact area between the touch member 24 and the substrate W, the greater the effect of preventing the vibration of the substrate W by the touch member 24 . On the other hand, if the contact area between the touch member 24 and the base material W is too large, rubbing will occur between them. Therefore, it is preferable to consider the position of the touch member 24 so as to obtain the optimum contact area.
 他の実施形態におけるタッチ部材24を図5に示す。この実施形態におけるタッチ部材24は、図5(a)に示すように、上記実施形態と同様に回転軸24aを軸に回転するローラー状の形態を有している。一方、本実施形態では、図5(b)に示すように複数のタッチ部材24の回転軸24aは共通であり、これらタッチ部材24は同期して回転する。このように複数のタッチ部材24の回転軸24aを共通にすることにより、装置構成を簡略化することができる。 A touch member 24 in another embodiment is shown in FIG. As shown in FIG. 5(a), the touch member 24 in this embodiment has a roller-like shape that rotates about a rotating shaft 24a as in the above embodiment. On the other hand, in this embodiment, as shown in FIG. 5(b), a plurality of touch members 24 have a common rotating shaft 24a, and these touch members 24 rotate synchronously. By sharing the rotating shaft 24a of the plurality of touch members 24 in this manner, the configuration of the device can be simplified.
 さらに他の実施形態におけるタッチ部材24を図6に示す。この実施形態におけるタッチ部材24は、上記実施形態のようにローラー状でなく、図6(a)に示すように基材W(非塗布部H)に向かって凸となるよう屈曲した曲面を有する曲面部を有し、図6(a)および(b)に示すように曲面部が非塗布部Hと接触する。具体的には、本実施形態では円柱の外周面の一部分を形成する部材であり、支持部材25を介して筐体部21に固定されている。このタッチ部材24も、上記実施形態と同様に少なくとも外周面はセラミック材料、MCナイロンなどのプラスチック材料などのように熱に強く軟らかい材料で形成されることが好ましい。 A touch member 24 in still another embodiment is shown in FIG. The touch member 24 in this embodiment does not have a roller shape as in the above-described embodiment, but has a curved surface bent so as to protrude toward the substrate W (non-coated portion H) as shown in FIG. 6(a). It has a curved surface portion, and the curved surface portion contacts the non-application portion H as shown in FIGS. 6(a) and 6(b). Specifically, in the present embodiment, it is a member that forms a part of the outer peripheral surface of the cylinder, and is fixed to the housing portion 21 via the support member 25 . At least the outer peripheral surface of the touch member 24 is preferably made of a heat-resistant and soft material such as a ceramic material or a plastic material such as MC nylon, as in the above embodiment.
 本実施形態のタッチ部材24は、上記のローラー状のタッチ部材24とは異なり、回転機構を有していない。そのため、上記のローラー状のタッチ部材24で生じる回転軸24aと支持部材25の間での摺動は無いため、この摺動により生じる可能性がある発塵という問題を無視することができる。 The touch member 24 of this embodiment does not have a rotating mechanism, unlike the roller-shaped touch member 24 described above. Therefore, since there is no sliding between the rotating shaft 24a and the support member 25 caused by the roller-shaped touch member 24, the problem of dust generation that may occur due to this sliding can be ignored.
 〔第二実施形態〕
 次に本発明の第二実施形態における乾燥装置2について図7を用いて説明する。本実施形態では、乾燥装置2がエッジニップ部26を有している点で第一実施形態と異なっている。
[Second embodiment]
Next, a drying device 2 according to a second embodiment of the present invention will be described with reference to FIG. This embodiment differs from the first embodiment in that the drying device 2 has an edge nip portion 26 .
 図7は、本発明の第二実施形態における乾燥装置2を示す図であり、図7(a)は正面断面図、図7(b)は図7(a)におけるBB矢視図である。 7A and 7B are views showing a drying device 2 according to a second embodiment of the present invention, where FIG. 7(a) is a front cross-sectional view and FIG. 7(b) is a BB arrow view in FIG. 7(a).
 本実施形態における乾燥装置2は、エッジニップ部26を有している。このエッジニップ部26は、本説明におけるエッジ誘導部の一実施形態であり、基材Wのエッジ近傍と接触し、基材Wのエッジの搬送経路を規定する。 The drying device 2 in this embodiment has an edge nip portion 26 . The edge nip portion 26 is an embodiment of the edge guiding portion in this description, contacts the vicinity of the edge of the substrate W, and defines the conveying path of the edge of the substrate W. As shown in FIG.
 エッジニップ部26は、図7(a)および図7(b)に示すように基材Wの幅方向両端部を挟持するためのものであり、複数のニップロール27により構成される。ニップロール27は、円柱状に形成され、この円柱の中心軸を回転軸として回転する。各々のニップロール27は、基材Wの表面側および裏面側におけるそれぞれの基材Wの幅方向両端部に対向し、かつ、一対のニップロール27で基材Wを表面側と裏面側から挟持可能な位置に配置されている。これらニップロール27の対が、基材Wの搬送方向に複数組配置される。このエッジニップ部26によって筐体部21内の浮揚領域で基材Wの幅方向両端部を挟持することにより、基材Wの塗布部Tおよび非塗布部Hは浮揚するものの基材Wの端部の搬送位置が固定されるため、基材Wの振動をさらに低減させることができる。 The edge nip portion 26 is for nipping both ends of the base material W in the width direction, as shown in FIGS. The nip roll 27 is formed in a columnar shape and rotates about the central axis of the column. Each of the nip rolls 27 faces both widthwise end portions of the base material W on the front side and the back side of the base material W, and the pair of nip rolls 27 can nip the base material W from the front side and the back side. placed in position. A plurality of pairs of these nip rolls 27 are arranged in the direction in which the substrate W is conveyed. By nipping both ends of the base material W in the width direction in the floating area in the housing part 21 by the edge nip parts 26, the coated part T and the non-coated part H of the base material W are floated, but the ends of the base material W are floated. is fixed, the vibration of the substrate W can be further reduced.
 また、一組のニップロール27のうち、基材Wの同一面側に位置する二つのニップロール27は、図7(a)に示すように互いの回転軸が略V字を形成するよう傾いているとよい。このとき、一組のニップロール27は、挟持する基材Wを幅方向両端部に向かって伸ばすように傾いている。これにより、基材Wに生じる幅方向の撓みを軽減することができる。 Further, of the pair of nip rolls 27, the two nip rolls 27 located on the same side of the base material W are tilted so that their rotation axes form a substantially V shape as shown in FIG. 7(a). Good. At this time, the set of nip rolls 27 is inclined so as to extend the nipped substrate W toward both ends in the width direction. Thereby, the bending of the base material W in the width direction can be reduced.
 〔第三実施形態〕
 次に本発明の第三実施形態における乾燥装置2の特に乾燥ノズル22について図8を用いて説明する。本実施形態では、乾燥装置2の乾燥ノズル22が吹き出しカバー28を有している点で第一実施形態と異なっている。
[Third embodiment]
Next, the drying device 2 in the third embodiment of the present invention, particularly the drying nozzle 22, will be described with reference to FIG. This embodiment differs from the first embodiment in that the drying nozzle 22 of the drying device 2 has a blowout cover 28 .
 図8は、本発明の第三実施形態における乾燥ノズル22を示す図であり、図8(a)は乾燥ノズル22単体の概略図、図8(b)はこの乾燥ノズル22が筐体部21内に配置された状態の概略図である。 8A and 8B are diagrams showing the drying nozzle 22 according to the third embodiment of the present invention, FIG. 8A is a schematic diagram of the drying nozzle 22 alone, and FIG. 1 is a schematic view of the state positioned within the . FIG.
 吹き出しカバー28は、乾燥ノズル22の吹き出し口23が設けられた面を覆う部材であり、乾燥ノズル22が有する複数の吹き出し口23の一部を覆い隠す。この吹き出しカバー28は、吹き出し口23の配列方向(Y軸方向)の任意の位置に取り付けが可能となっている。 The blowout cover 28 is a member that covers the surface of the drying nozzle 22 on which the blowout openings 23 are provided, and partially covers the multiple blowout openings 23 of the drying nozzle 22 . The blowout cover 28 can be attached at any position in the arrangement direction (Y-axis direction) of the blowout ports 23 .
 この吹き出しカバー28によって一部の吹き出し口23を覆い隠した状態で乾燥ノズル22が気体を吹き出した場合、吹き出しカバー28が設けられた部分近傍の風圧は吹き出し口23が露出している部分近傍の風圧よりも低くなる。すなわち、一つの乾燥ノズル22において風圧に高低差を持たせることができる。 When the drying nozzle 22 blows out gas with the blow-out cover 28 partially covering the blow-out port 23, the wind pressure in the vicinity of the portion where the blow-out cover 28 is provided is the same as that in the vicinity of the portion where the blow-out port 23 is exposed. lower than wind pressure. That is, it is possible to provide a difference in air pressure in one drying nozzle 22 .
 このような吹き出しカバー28は、図8(b)に示すように基材Wの搬送経路において非塗布部Hと対向する位置に取り付けると良い。こうすることにより、非塗布部Hと対向する位置における風圧が塗布部Tと対向する位置における風圧よりも低くなる。このように非塗布部Hに位置する部分の風圧を比較的低くすることにより、気体による塗膜の乾燥を妨げること無く非塗布部Hの変形を抑えることができるため、基材Wの振動をさらに抑制することができる。また、この吹き出しカバー28は、図8(b)に示すように、塗膜が形成されない基材Wの幅方向両端部に対向する位置にも取り付けられても良い。 Such a blowout cover 28 is preferably attached at a position facing the non-coating portion H in the transport path of the base material W as shown in FIG. 8(b). By doing so, the wind pressure at the position facing the non-application portion H is lower than the wind pressure at the position facing the application portion T. FIG. By making the wind pressure of the portion located in the non-coating portion H relatively low in this manner, the deformation of the non-coating portion H can be suppressed without hindering the drying of the coating film by the gas, so that the vibration of the base material W can be suppressed. can be suppressed further. Moreover, as shown in FIG. 8(b), the blow-off cover 28 may also be attached to positions facing both width direction end portions of the substrate W on which the coating film is not formed.
 以上の乾燥装置により、基材に形成された塗膜を乾燥させる際に安定した状態で基材を搬送することが可能である。 With the drying apparatus described above, it is possible to convey the substrate in a stable state when drying the coating film formed on the substrate.
 以上、本発明の実施形態について図面を参照しながら詳述したが、各実施形態における構成およびそれらの組み合わせ等は一例であり、本発明の趣旨から逸脱しない範囲内で、構成の追加、省略、置換、およびその他の変更が可能である。たとえば、上記実施形態では、基材Wの両面にストライプ状の塗膜を形成する例について説明したが、用途に応じて第1の塗布機構12と第2の塗布機構13のどちらか一方により基材Wの片面に塗膜を形成してもよい。すなわち、塗工装置1は第1の塗布機構12または第2の塗布機構のどちらか一方を有している構成としてもよい。 As described above, the embodiments of the present invention have been described in detail with reference to the drawings, but the configurations and combinations thereof in each embodiment are examples, and additions, omissions, Substitutions and other modifications are possible. For example, in the above-described embodiment, an example in which striped coating films are formed on both surfaces of the substrate W has been described. A coating film may be formed on one side of the material W. That is, the coating device 1 may be configured to have either the first coating mechanism 12 or the second coating mechanism.
 また、基材Wの両面に塗膜が形成されている場合であっても、乾燥装置2へ送られる基材に形成されている塗膜は必ずしも両面とも溶剤を含んだ湿潤状態である必要は無く、片面の塗膜が既に乾燥が完了した状態であっても構わない。 Further, even if the coating film is formed on both sides of the base material W, the coating film formed on the base material sent to the drying device 2 does not necessarily have to be in a wet state containing a solvent on both sides. It does not matter if the coating film on one side has already been dried.
 また、塗膜はストライプ状でなくても構わず、いわゆるベタ塗りであっても構わない。この場合、タッチ部材24は基材Wの両端部の塗膜が形成されていない部分に接触するように設けられていると良い。 In addition, the coating does not have to be striped, and may be so-called solid coating. In this case, the touch members 24 are preferably provided so as to come into contact with portions of both ends of the substrate W where the coating film is not formed.
 また、上記実施形態では、乾燥ノズル22は下側ノズル22aと上側ノズル22bとから構成され、基材Wの両面に対して気体を吹き付けて塗膜の乾燥および基材Wの浮揚を行う例について説明したが、下側ノズル22aのみで構成されていても良い。 Further, in the above embodiment, the drying nozzle 22 is composed of the lower nozzle 22a and the upper nozzle 22b, and the example in which the gas is blown to both surfaces of the base material W to dry the coating film and float the base material W is performed. Although explained, it may be constituted by only the lower nozzle 22a.
 また、上記実施形態では、タッチ部材24の位置調整、メンテナンスを容易にする観点から、図3(a)に示すようにタッチ部材24は基材Wの搬送方向において隣接する乾燥ノズル22(下側ノズル22aと上側ノズル22b)の中間部に設けられているが、これに限らず、たとえば乾燥ノズル22に対向するように設けられていても良い。 In the above-described embodiment, from the viewpoint of facilitating position adjustment and maintenance of the touch member 24, the touch member 24 is positioned adjacent to the drying nozzle 22 (lower side) in the conveying direction of the substrate W as shown in FIG. Although it is provided in an intermediate portion between the nozzle 22a and the upper nozzle 22b), it is not limited to this, and may be provided so as to face the drying nozzle 22, for example.
 また、上記実施形態では、一つの乾燥ノズル22において風圧の高低差を形成させる手段として吹き出しカバー28を用いているが、これに限られない。たとえば、各々の吹き出し口23を独立させた上でそれぞれ異なる図示しない供給部と接続し、各々の吹き出し口23ごとに供給する気体の風圧を調節するような構成としてもよい。 Also, in the above embodiment, the blowout cover 28 is used as a means for forming a difference in wind pressure in one drying nozzle 22, but the invention is not limited to this. For example, each blowout port 23 may be made independent and then connected to a different supply unit (not shown) so that the wind pressure of the gas supplied to each blowout port 23 may be adjusted.
 また、上記実施形態では、エッジ誘導部の説明において複数のニップロール27によって基材Wの両端部を挟持する例について説明したが、これに限られない。たとえば、基材Wの表面側と接触するロールおよび裏面側と接触するロールが基材Wの搬送方向に沿って交互に配置されていてもよい。これらロールは、筐体部21内で基材Wのエッジ近傍に接触し、基材Wのエッジの搬送経路を規定した状態で基材Wに形成された塗膜を乾燥させる。これにより、基材Wの振動を低減させることができる。また、基材Wが位置ずれしてロールから外れてしまっても、基材Wを挟持する場合と比較して容易にもとの位置に戻すことができる。 In addition, in the above embodiment, an example in which both ends of the base material W are nipped by a plurality of nip rolls 27 has been described in the description of the edge guiding portion, but the present invention is not limited to this. For example, rolls in contact with the front side of the base material W and rolls in contact with the back side of the base material W may be alternately arranged along the conveying direction of the base material W. These rolls contact the vicinity of the edge of the substrate W within the housing portion 21 and dry the coating film formed on the substrate W in a state in which the conveying path of the edge of the substrate W is defined. Thereby, the vibration of the base material W can be reduced. Moreover, even if the substrate W is displaced and comes off the rolls, it can be easily returned to its original position as compared with the case where the substrate W is sandwiched.
 1 塗工装置
 2 乾燥装置
 11 搬送機構
 11a 巻出ロール
 11b 巻取ロール
 11c 搬送ロール
 11d バックアップロール
 12 第1の塗布機構
 13 第2の塗布機構
 14 マニホールド
 15 スリット
 16 吐出口
 21 筐体部
 22 乾燥ノズル
 22a 下側ノズル
 22b 上側ノズル
 23 吹き出し口
 231 吸引口
 24 タッチ部材
 24a 回転軸
 25 支持部材
 26 エッジニップ部
 27 ニップロール
 28 吹き出しカバー
 H 非塗布部
 T 塗布部
 W 基材
1 coating device 2 drying device 11 transport mechanism 11a unwinding roll 11b winding roll 11c transport roll 11d backup roll 12 first coating mechanism 13 second coating mechanism 14 manifold 15 slit 16 discharge port 21 casing 22 drying nozzle 22a lower nozzle 22b upper nozzle 23 blowout port 231 suction port 24 touch member 24a rotating shaft 25 support member 26 edge nip portion 27 nip roll 28 blowout cover H non-coating portion T coating portion W base material

Claims (7)

  1.  所定方向に基材を搬送しながら基材に塗布された塗膜を乾燥させる乾燥装置であり、
     基材に向けて気体を吹き付けることによって基材を浮揚させるとともに塗膜を乾燥させる乾燥ノズルと、
     前記乾燥ノズルにより基材が浮揚する状態となる領域である浮揚領域において基材と接触するタッチ部材と、
    を備え、
     基材の幅方向において塗膜は一部に形成され、前記タッチ部材は、塗膜が形成されていない部分である非塗布部において基材と接触することを特徴とする、乾燥装置。
    A drying device for drying a coating film applied to a substrate while conveying the substrate in a predetermined direction,
    A drying nozzle that floats the substrate and dries the coating film by blowing gas toward the substrate;
    a touch member that contacts the substrate in a floating region, which is a region in which the substrate floats due to the drying nozzle;
    with
    A drying apparatus, wherein a coating film is partially formed in a width direction of a base material, and the touch member is in contact with the base material in a non-coating part, which is a part where the coating film is not formed.
  2.  前記乾燥ノズルは基材の下方から気体を吹き付ける下側ノズルと、基材の上方から気体を吹き付ける上側ノズルと、を有し、基材の搬送経路に沿って前記下側ノズルと前記上側ノズルとが並べられることにより、前記浮揚領域において搬送方向では上下方向に波打つように基材の搬送ラインが形成されていることを特徴とする、請求項1に記載の乾燥装置。 The drying nozzle has a lower nozzle for blowing gas from below the base material and an upper nozzle for blowing gas from above the base material, and the lower nozzle and the upper nozzle are arranged along the conveying path of the base material. 2. The drying apparatus according to claim 1, wherein a transport line for the substrate is formed so as to undulate vertically in the transport direction in the floating area by arranging the substrates.
  3.  前記タッチ部材は、基材に向かって凸となるよう屈曲した曲面を有する曲面部を有することを特徴とする、請求項1もしくは2に記載の乾燥装置。 The drying apparatus according to claim 1 or 2, characterized in that the touch member has a curved surface portion that is curved so as to be convex toward the substrate.
  4.  前記タッチ部材は、ローラーであることを特徴とする、請求項1もしくは2に記載の乾燥装置。 The drying device according to claim 1 or 2, wherein the touch member is a roller.
  5.  塗膜は基材の幅方向にストライプ状に形成され、塗膜と塗膜の間に前記非塗布部を有することを特徴とする、請求項1から4のいずれかに記載の乾燥装置。 The drying apparatus according to any one of claims 1 to 4, characterized in that the coating film is formed in stripes in the width direction of the base material and has the non-coating portion between the coating films.
  6.  前記乾燥ノズルにおいて、前記非塗布部と対向する位置における風圧が塗膜と対向する位置における風圧よりも低いことを特徴とする、請求項5に記載の乾燥装置。 The drying apparatus according to claim 5, characterized in that the air pressure at a position facing the non-coating portion of the drying nozzle is lower than the wind pressure at a position facing the coating film.
  7.  前記浮揚領域内で基材のエッジ近傍と接触し、当該エッジの搬送経路を規定するエッジ誘導部を有することを特徴とする、請求項1から6のいずれかに記載の乾燥装置。 7. The drying apparatus according to any one of claims 1 to 6, characterized by comprising an edge guide portion that contacts the vicinity of the edge of the base material in the floating area and defines the conveying path of the edge.
PCT/JP2022/016654 2021-09-13 2022-03-31 Drying device WO2023037640A1 (en)

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JP2002348009A (en) * 2001-05-28 2002-12-04 Dainippon Ink & Chem Inc Heat treatment method, heat treatment device and warp inhibition supporting tool for band-like web
JP2010225467A (en) * 2009-03-24 2010-10-07 Toyota Motor Corp Drying device of strip body
WO2013098970A1 (en) * 2011-12-27 2013-07-04 株式会社 東芝 Method for producing electrode and method for producing non-aqueous electrolyte battery

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