WO2023037574A1 - Drying device - Google Patents

Drying device Download PDF

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Publication number
WO2023037574A1
WO2023037574A1 PCT/JP2022/004366 JP2022004366W WO2023037574A1 WO 2023037574 A1 WO2023037574 A1 WO 2023037574A1 JP 2022004366 W JP2022004366 W JP 2022004366W WO 2023037574 A1 WO2023037574 A1 WO 2023037574A1
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WO
WIPO (PCT)
Prior art keywords
base material
coating
drying
substrate
coating film
Prior art date
Application number
PCT/JP2022/004366
Other languages
French (fr)
Japanese (ja)
Inventor
和夫 野村
敦 渡邉
徹 中塩屋
Original Assignee
東レエンジニアリング株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東レエンジニアリング株式会社 filed Critical 東レエンジニアリング株式会社
Publication of WO2023037574A1 publication Critical patent/WO2023037574A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/14Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B13/00Machines and apparatus for drying fabrics, fibres, yarns, or other materials in long lengths, with progressive movement
    • F26B13/10Arrangements for feeding, heating or supporting materials; Controlling movement, tension or position of materials
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/06Controlling, e.g. regulating, parameters of gas supply
    • F26B21/12Velocity of flow; Quantity of flow, e.g. by varying fan speed, by modifying cross flow area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/04Processes of manufacture in general
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Definitions

  • the present invention relates to a drying device that dries a coating film formed on a substrate while conveying a sheet-like substrate.
  • an electrode material containing an active material, a binder, a conductive aid, and a solvent is applied to a sheet-like base material that is transported by roll-to-roll.
  • This drying apparatus heats the coating film by blowing hot air onto the surface of the substrate on which the coating film is formed or the surface on which the coating film is not formed, as shown in Patent Document 1 and Patent Document 2 below. , drying the coating film.
  • the coating film may be formed in stripes. That is, there are cases in which the coating film is formed on the substrate so as to have a plurality of coated portions in which the coating film is formed in the width direction of the substrate and a non-coated portion where the coating film is not formed between the plurality of coated portions. be. In this case, since the non-applied portion is lighter than the applied portion, the non-applied portion is more easily deformed by the wind pressure of the hot air blown by the drying device than the applied portion.
  • the drying device blows hot air onto the coated surface of the base material or the uncoated surface of the base material with uniform air pressure, the hot air As shown in FIG. 9, the applied portion T and the non-applied portion H are deformed by different amounts due to wind pressure. As a result, vibration occurs in the entire base material being transported, causing the base material to meander. In addition, the substrate is deformed such that the non-coated portion swells or hangs down. Due to the deformation of the non-coated portion or the vibration of the entire base material, the base material may come into contact with a member in the drying device such as a nozzle for blowing hot air, and may be damaged.
  • a member in the drying device such as a nozzle for blowing hot air
  • the drying apparatus of the present invention for solving the above problems is a drying apparatus that is provided on a conveying path for roll-to-roll conveying a base material and dries a coating film formed on the base material.
  • a coating film is formed in a striped pattern in the width direction of the substrate so that the surface has a plurality of coating portions on which a coating film is formed and a non-coating portion on which no coating film is formed between the plurality of coating portions. and has a drying nozzle for drying the coating film by blowing gas against the predetermined surface of the base material and/or the back surface of the predetermined surface of the base material, and the drying nozzle faces the coating unit. It is characterized by having a wind pressure adjusting means for adjusting the wind pressure at the position facing the non-application portion to be smaller than the wind pressure at the position where the coating is applied.
  • the air pressure of the gas that the drying nozzle blows on the predetermined surface of the base material and/or the back surface of the predetermined surface of the base material is controlled by the air pressure adjusting means so that the position facing the non-coating part is lower than the position facing the coating part. is adjusted to be smaller, it is possible to suppress the difference in the amount of deformation between the applied portion and the non-applied portion due to the wind pressure of the blown gas. Therefore, since the vibration of the conveyed base material can be suppressed, meandering of the base material can be prevented, and the base material can be conveyed in a stable state when drying the coating film formed on the base material. Become. In addition, since it is possible to suppress deformation such that the non-coated portion swells or hangs down, it is possible to prevent the substrate from coming into contact with members in the drying device.
  • the drying nozzle has a blowing part for blowing gas
  • the air pressure adjusting means is a plurality of openings for sucking the gas blown by the blowing part, and the plurality of openings are formed in a base. It is arranged in the width direction of the material, a suction force is generated from each opening from a common suction means, and among the plurality of openings, the area of the opening facing the non-coating portion is larger than the area of the opening facing the coating portion. A configuration in which the area of the opening is larger may be adopted.
  • the wind pressure adjusting means is a plurality of openings for blowing out gas from the drying nozzle, and the plurality of openings are arranged in the width direction of the base material, and the gas supplied from a common supply section is supplied to each of the openings. of the plurality of openings, the area of the openings for blowing the gas to the non-application portion may be smaller than the area of the openings for blowing the gas to the application portion.
  • a plurality of said openings are formed in a plate forming said drying nozzle, A plurality of patterns of the plates may be replaceable.
  • a configuration in which striped coating films are formed on both sides of the substrate may be employed.
  • the base material can be transported in a stable state when drying the coating films formed on both sides of the base material. Become.
  • it may be configured to have an edge guide portion that contacts the width direction end of the base material and defines the conveying path of the end of the base material.
  • the drying apparatus of the present invention it is possible to convey the substrate in a stable state when drying the coating film formed on the substrate.
  • FIG. 1 is a diagram schematically showing a coating device 1 equipped with a drying device 2 according to the first embodiment.
  • 2 and 4 are diagrams for explaining the wind pressure adjusting means 3 in the first embodiment.
  • FIG. 3 is a diagram for explaining the drying nozzle 22 in the first embodiment, and is a side sectional view of the drying nozzle 22 in the Y-axis direction.
  • a coating apparatus 1 equipped with a drying device 2 includes a transport mechanism 11 for transporting a sheet-like substrate W as shown in FIG. It has a first coating mechanism 12 for forming a film M (see FIG. 2) and a second coating mechanism 13 for forming a coating film M by applying a coating liquid to the back surface of a predetermined surface of the substrate W.
  • the drying device 2 is arranged on the transport path of the substrate W by the transport mechanism 11 .
  • the predetermined surface of the base material W in this embodiment is the front surface of the base material W
  • the back surface of the predetermined surface of the base material W is the back surface of the base material W.
  • the surface of the substrate W is the surface on which the coating film M is formed by the first coating mechanism 12 described later, and the back surface of the substrate W is the coating film M formed by the second coating mechanism 13 described later. is the surface on which is formed.
  • the predetermined surface of the substrate W is referred to as the front surface
  • the back surface of the predetermined surface of the substrate W is referred to as the back surface of the substrate W.
  • the coating apparatus 1 in this embodiment forms coating films M on both sides of a substrate W conveyed by a conveying mechanism 11 by means of a first coating mechanism 12 and a second coating mechanism 13, and dries these coating films M. Dry with device 2 .
  • the base material W in the present embodiment is a metal foil that serves as a battery electrode plate for a lithium ion battery, and aluminum foil or the like is used when forming a positive electrode, and copper foil or the like is used when forming a negative electrode.
  • the base material W is a strip-shaped sheet that is long in one direction, and is conveyed by the conveying mechanism 11 so as to pass through each section that constitutes the coating apparatus 1 .
  • the coating liquid in the present embodiment is, for example, a slurry containing an active material, a binder, a conductive aid, and a solvent, and is used as a material for electrode plates of lithium ion batteries (so-called electrode material).
  • the coating film M is formed by coating the substrate W with this coating liquid.
  • the transport mechanism 11 in this embodiment is for transporting the base material W.
  • the transport mechanism 11 includes an unwinding roll 11a for unwinding the base material W, a winding roll 11b for winding the base material W, and a winding roll for winding the base material W unwound from the unwinding roll 11a. It has a transport roll 11c through which the base material W is wound up by the roll 11b, and a coating roll 11d that guides the base material W to a position where the coating liquid is applied by the first coating mechanism 12, which will be described later.
  • Each roll of the conveying mechanism 11 is formed in a columnar shape and rotates about the central axis of the column.
  • the rotation of the unwinding roll 11a is driven and controlled by a control unit (not shown), and unwinds the base material W at a predetermined speed.
  • the control unit is configured by, for example, a general-purpose computer device.
  • the take-up roll 11b like the unwind roll 11a, is driven and controlled in rotation by the control section, and winds the base material W while applying a predetermined tension to the base material W.
  • the tension here means the tension in the conveying direction of the base material W (the X-axis direction in FIG. 1).
  • a plurality of transport rolls 11c are provided as shown in FIG. A part or all of the transport rolls 11c among the plurality of transport rolls 11c are driven and controlled in rotation by the control unit in the same manner as the unwind roll 11a and the winding roll 11b, and apply a predetermined tension to the base material W.
  • the substrate W is conveyed while
  • the coating roll 11d is arranged so as to face a first coating mechanism 12, which will be described later, as shown in FIG. Therefore, the substrate W can be transported while keeping a constant distance from the first coating mechanism 12 .
  • the transport mechanism 11 can transport the base material W at a predetermined speed while applying a predetermined tension to the base material W.
  • the first coating mechanism 12 in this embodiment is for coating a coating liquid on the surface of the substrate W being transported to form the coating film M in stripes.
  • Forming the coating film M in stripes means that the base material W has a plurality of coating portions T on which the coating film M is formed, and the coating film M is formed between the plurality of coating portions T, as shown in FIG. It is to form the coating film M in the width direction of the substrate W so as to have a non-coated portion H that is not covered.
  • the first coating mechanism 12 is a slit die for coating electrode material slurry, but the first coating mechanism 12 is not limited to a slit die. It may correspond to a coating method for use or gravure coating (the same applies to the second coating mechanism 13 to be described later).
  • the first coating mechanism 12 is formed long along the width direction of the substrate W (the Y-axis direction in FIG. 1).
  • the coating roll 11d described above is arranged at a predetermined interval with respect to the first coating mechanism 12 so that the rotation axis direction of the coating roll 11d and the width direction of the first coating mechanism 12 are parallel. It is
  • the first coating mechanism 12 includes a manifold 14 that is connected to a supply path 18 and that is a space that is long in the width direction and that stores the coating liquid, and a slit 15 that is wide in the width direction and connected to the manifold 14. , and an ejection port 16 that has the same length as the slit 15 in the width direction and ejects the coating liquid.
  • the coating liquid stored in the manifold 14 is ejected onto the substrate W from the ejection port 16 via the slit 15 .
  • the ejection port 16 faces the coating roll 11d with the base material W interposed therebetween. That is, the ejection port 16 faces the substrate W on the surface side of the substrate W.
  • the coating liquid can be applied to the base material W while the distance between the ejection port 16 and the base material W is kept constant.
  • the first coating mechanism 12 is further provided with a shim plate (not shown) for forming the coating film M on the base material W in a stripe shape.
  • the shim plate has, for example, a substantially comb shape and is arranged to divide the slit 15 in the width direction.
  • the coating liquid is applied while the slit 15 is divided in the width direction by the shim plate, the coating liquid is applied from the portion without the shim plate and is not applied from the portion with the shim plate. That is, the coating film M can be formed in stripes.
  • the width of the coating film M can be adjusted by changing the shape of the shim plate. That is, the widths of the applied portion T and the non-applied portion H can be adjusted.
  • the supply path 18 connects the manifold 14 and the tank 17 in which the application liquid is stored. Then, the application liquid is supplied from the tank 17 to the manifold 14 through the supply path 18 by a pump (not shown).
  • the coating film M can be formed in stripes on the surface of the substrate W by the first coating mechanism 12 having these configurations.
  • the second coating mechanism 13 in this embodiment is for coating the back surface of the substrate W to be conveyed with the coating liquid to form the coating film M in stripes.
  • the second coating mechanism 13 has the same configuration as the first coating mechanism 12 described above, as shown in FIG. It is arranged so as to face the base material W.
  • the second coating mechanism 13 is supplied with the coating liquid from the tank 17 by the supply path 18 and a pump (not shown), and coats the back surface of the substrate W with the supplied coating liquid.
  • the stripe-shaped coating film M can be formed on the back surface of the base material W.
  • the supply path 18 and the tank 17 for supplying the coating liquid to the second coating mechanism 13 are separate from the supply path 18 and the tank 17 for supplying the coating liquid to the first coating mechanism 12 in this embodiment. It is provided in
  • the width of the coating film M formed on the back surface of the substrate W by the second coating mechanism 13 is preferably the same as the width of the coating film M formed on the front surface of the substrate W by the first coating mechanism 12. .
  • the first coating mechanism 12 and the second coating mechanism 13 can form the coating film M in stripes on both sides of the substrate W.
  • the drying device 2 in this embodiment is for drying the coating films M formed on both sides of the substrate W by the first coating mechanism 12 and the second coating mechanism 13 .
  • the drying device 2 is provided downstream of the first coating mechanism 12 and the second coating mechanism 13 on the transport path of the base material W by the transport mechanism 11, and includes a housing part 21, A drying nozzle 22 is provided inside the housing 21 and blows a gas onto the substrate W.
  • the gas here is preferably hot air.
  • the gas blown from the drying nozzle 22 to the base material W is called hot air.
  • the housing part 21 is a box elongated in the conveying direction of the base material W, and has a space inside the box for the base material W to pass through, and an entrance for the base material W to enter and exit the space. have an exit. Then, the base material W on which the coating film M is formed is conveyed by the conveying mechanism 11 so as to pass through the housing part 21 .
  • the above-described transport roll 11c is not arranged inside the housing portion 21. Especially when the coating film M is formed on both surfaces of the base material W like this embodiment, the base material W cannot be touched until the coating film M dries. Therefore, in the housing part 21, the base material W is conveyed in a floating state except for at least both ends in the width direction.
  • a predetermined tension is applied to the substrate W by the transport roll 11c arranged on the upstream side and the transport roll 11c arranged on the downstream side of the housing portion 21, and/or
  • the substrate W is conveyed by the conveying mechanism 11 and passes through the housing portion 21 in a state in which a lift force is applied to the substrate W by blowing hot air from the back side of the substrate W from the drying nozzle 22 . ing.
  • the drying nozzle 22 is for heating the coating film M by blowing hot air onto the substrate W.
  • the drying nozzle 22 is elongated in the width direction of the base material W as shown in FIGS. called).
  • the drying nozzles 22 are arranged below the base material W in the housing part 21, and are arranged above the base material W in the housing part 21. There is an upper nozzle 22b for blowing hot air onto the surface of the base material W, and these lower nozzles 22a and upper nozzles 22b are arranged alternately in the conveying direction of the base material W. As shown in FIG. Therefore, the base material W is conveyed in a substantially straight direction in a state in which the base material W is floated by the lift force applied to the base material W. By conveying the base material W substantially linearly in this way, it is possible to accurately convey the base material W in a predetermined direction even in a levitated state.
  • the drying nozzle 22 in this embodiment is composed of a hot air blowing section 23 and a suction mechanism 25 for adjusting the air pressure of the hot air blown by the blowing section 23, as shown in FIGS.
  • the blowout part 23 is formed in a slit shape long in the width direction of the base material W and short in the direction of conveyance of the base material W at each of both ends of the drying nozzle 22 in the direction of conveyance of the base material W.
  • the drying nozzle 22 has a hollow portion 24 that communicates with the blowout portion 23, and hot air is supplied to the hollow portion 24 from a supply source (not shown).
  • a supply source not shown
  • the hot air supplied from the supply source is blown out from the blowing part 23 via the hollow part 24 with substantially uniform wind pressure.
  • the lower nozzle 22a blows hot air toward the substrate W from below
  • the upper nozzle 22b blows hot air toward the substrate W from above.
  • the coating film M is heated by the hot air and the solvent in the coating film M is vaporized, so that the coating film M is dried and solidified.
  • the suction mechanism 25 is a box elongated in the width direction of the base material W as shown in FIGS. ing.
  • the plate member having a predetermined surface of the suction mechanism 25 is the plate 27 described above.
  • the suction mechanism 25 is provided in the hollow portion 24 to form the slit-shaped blowout portion 23 described above.
  • the suction mechanism 25 is a so-called suction means for sucking the hot air blown onto the base material W. As shown in FIGS. have.
  • the air pressure adjusting means 3 is a plurality of openings 31 for sucking the hot air blown out from the blowing part 23 and formed in the plate 27 so as to be arranged in the width direction of the base material W.
  • the suction mechanism 25 has, as shown in FIG.
  • the discharge port 28 is a hole provided so as to discharge the hot air drawn from the opening 31 to the outside of the drying nozzle 22. As shown in FIGS. provided on the side. Therefore, the hot air drawn in from the opening 31 can be discharged without remaining in the cavity 26, so that the cavity 26 has a lower pressure than the space where the substrate W and the plate 27 face each other. As a result, since a suction force is generated in each opening 31 , the hot air is drawn into the hollow portion 26 by being sucked into each opening 31 .
  • a not-shown suction force imparting means for example, a pump that imparts a suction force to the hollow portion 26 may be provided.
  • a suction force imparting means for example, a pump
  • the pressure in the cavity portion 26 becomes further negative. Therefore, the hot air can be more positively sucked from each opening 31 than when there is no suction force applying means.
  • the area of the opening 31b facing the non-application portion H is larger than the area of the opening 31a facing the application portion T.
  • the amount of hot air drawn into the cavity 26 decreases as the area of the opening 31 decreases, and increases as the area of the opening 31 increases. Therefore, as shown in FIG. 4, the wind pressure of the hot air at the position facing the non-coating portion H is smaller than the wind pressure of the hot air at the position facing the coating portion T.
  • the wind pressure of the hot air blown by the drying nozzle 22 onto both surfaces of the substrate W can be adjusted so that the non-coated portion H is smaller than the coated portion T. A difference in the amount of deformation of the non-applied portion H can be suppressed.
  • the non-coated portion H is lighter than the coated portion T on which the coating film M is formed, the non-coated portion H is more likely to be exposed to the air pressure of the hot air blown from the drying nozzle 22 than the coated portion T. Easy to deform. Then, as shown in FIG. 9, when the hot air is blown to the applied portion T and the non-applied portion H with a uniform air pressure without adjusting the air pressure of the hot air, the applied portion T and the non-applied portion H differ in the air pressure of the hot air. Amount of deformation occurs. Therefore, vibration occurs in the entire substrate W being transported, which causes the substrate W to meander. In addition, as shown in FIG.
  • the substrate W is deformed such that the non-coated portion H rises or hangs down. Due to the deformation of the non-application portion H or the vibration of the entire base material W, the base material W may come into contact with a member such as the drying nozzle 22 inside the casing 21 and be damaged.
  • the area of the opening 31b facing the non-application portion H is made larger than the area of the opening 31a facing the application portion T as described above.
  • the wind pressure of the hot air blown out from the drying nozzle 22 is adjusted so that the wind pressure at the position facing the non-coating portion H is smaller than the wind pressure at the position facing the coating portion T. Therefore, the difference in the amount of deformation between the applied portion T and the non-applied portion H due to the wind pressure of the hot air blown can be suppressed. Therefore, since vibration of the substrate W being transported can be suppressed, meandering of the substrate W can be prevented.
  • the substrate W can be transported in a stable state when the coating film M formed on the substrate W is dried.
  • the non-applied portion H can be prevented from being deformed such that it swells or hangs down, the base material W can be prevented from coming into contact with the members inside the housing portion 21 .
  • the air pressure of the hot air that the drying nozzle 22 blows onto the application portion T and the non-application portion H can be adjusted with a simple configuration.
  • the plate 27 is preferably replaceable with plates of multiple patterns. Specifically, the plate 27 is detachable from the drying nozzle 22 (suction mechanism 25), and can be replaced with a plurality of patterns of plates having different sizes, shapes, and arrangements of the openings 31 to be formed. It's becoming That is, it is possible to appropriately change the plate to have a pattern corresponding to the width, thickness, and position of the coating film M.
  • the drying device 2 in the above embodiment it is possible to transport the substrate W in a stable state when drying the coating films M formed on both surfaces of the substrate W.
  • each opening 31 may be connected to a different suction force applying means, and the amount of hot air sucked by each opening 31 may be adjusted. As a result, the air pressure of the hot air blown onto the substrate W can be adjusted without changing the size of the area of the opening 31 .
  • FIG. 5A and 5B are views showing a drying apparatus 2 according to a second embodiment of the present invention
  • FIG. 2 is a side cross-sectional view of body 21.
  • FIG. 5A and 5B are views showing a drying apparatus 2 according to a second embodiment of the present invention
  • FIG. 2 is a side cross-sectional view of body 21.
  • the drying apparatus 2 in the present embodiment has an edge nip portion 4 which is a kind of edge guide portion for contacting the width direction end portion of the base material W and defining the conveying path of the end portion of the base material W. .
  • the edge nip portion 4 is for nipping both ends of the base material W in the width direction as shown in FIGS.
  • the nip roll 41 is formed in a cylindrical shape and rotates about the central axis of the cylinder. Each of the nip rolls 41 is arranged at a position facing both ends in the width direction of the base material W on the front side and the back side of the base material W and capable of nipping the base material W from the front side and the back side. .
  • a plurality of sets of these are arranged in the conveying direction of the base material W as a set of nip rolls 41 . Therefore, it is possible to dry the coating film M formed on the base material W in a state in which at least both widthwise end portions of the base material W are sandwiched within the housing portion 21 to define the conveying path of the end portions of the base material W. can.
  • the two nip rolls 41 located on the same side of the base material W are tilted so that their rotation axes form a substantially V shape as shown in FIG. 5(a). Good.
  • the set of nip rolls 41 is tilted so as to extend the substrate W to be sandwiched toward both ends of the substrate W in the width direction.
  • the base material W can be stretched toward both ends in the width direction of the base material W, so that bending of the base material W in the width direction can be reduced.
  • FIG. 6 the drying nozzle 22 does not have the blowing part 23 and the suction mechanism 25, and a plurality of openings are formed in a plate 27 which is a plate-like member having a surface facing the surface of the substrate W of the drying nozzle 22.
  • This embodiment differs from the first and second embodiments in that hot air adjusted to a predetermined air pressure is blown out from 31 (air pressure adjusting means 3).
  • FIG. 6 is a diagram for explaining the drying nozzle 22 in this embodiment, and is a side sectional view of the drying nozzle 22 in the Y-axis direction.
  • 7 and 8 are diagrams for explaining the wind pressure adjusting means 3 in this embodiment.
  • the drying nozzle 22 in this embodiment has wind pressure adjusting means 3 as shown in FIGS.
  • the wind pressure adjusting means 3 is a plurality of openings 31 for blowing out hot air from the drying nozzles 22 .
  • the plurality of openings 31 are formed in the plate 27 so as to be arranged in the width direction of the base material W. As shown in FIG.
  • the plurality of openings 31 communicate with the hollow portion 24, and hot air is supplied from a common supply portion (not shown). Then, the supplied hot air is blown out from the opening 31 and blown onto the substrate W. As shown in FIG.
  • the area of the opening 31b for blowing hot air toward the non-coating portion H is smaller than the area of the opening 31a for blowing hot air toward the coating portion T.
  • the amount of hot air supplied from the common supply unit and blown out from each opening 31 increases as the area of the opening 31 increases, and decreases as the area of the opening 31 decreases. Therefore, as shown in FIG. 8, the wind pressure of the hot air blown onto the non-application portion H is smaller than the wind pressure of the hot air blown onto the application portion T.
  • the wind pressure of the hot air blown by the drying nozzle 22 onto both surfaces of the substrate W can be adjusted so that the non-coated portion H is smaller than the coated portion T.
  • a difference in the amount of deformation of the non-applied portion H can be suppressed. Therefore, the vibration of the substrate W being transported can be suppressed, and the meandering of the substrate W can be prevented. That is, the substrate W can be transported in a stable state when the coating film M formed on the substrate W is dried.
  • the non-applied portion H can be prevented from being deformed such that it swells or hangs down, the base material W can be prevented from coming into contact with the members inside the housing portion 21 .
  • the air pressure of the hot air that the drying nozzle 22 blows onto the application portion T and the non-application portion H can be adjusted with a simple configuration.
  • the wind pressure adjusting means 3 is a plurality of openings 31, and among the plurality of openings 31 to which hot air is supplied from a common supply section, the area of the opening 31a through which the hot air is blown toward the application section T
  • each opening 31 may be connected to a different supply unit (not shown) to adjust the amount of hot air supplied to each opening 31 .
  • the air pressure of the hot air blown onto the substrate W can be adjusted without changing the size of the area of the opening 31 .
  • the wind pressure adjusting means 3 may be a slit (not shown). Specifically, the slit is formed on the plate 27 or in the vicinity of the plate 27 to be wider in the width direction of the base material W, and the portion blows hot air toward the non-coating portion H than the portion blowing hot air toward the coating portion T. is formed narrower in the conveying direction of the substrate W. As a result, the air pressure of the hot air blown toward the non-application portion H can be adjusted to be smaller than the air pressure of the hot air blown toward the application portion T.
  • the embodiments of the present invention have been described in detail with reference to the drawings, but the configurations and combinations thereof in each embodiment are examples, and additions, omissions, Substitutions and other modifications are possible.
  • a coating film M may be formed on one side of the substrate W. That is, the coating device 1 may be configured to have either the first coating mechanism 12 or the second coating mechanism.
  • the coating film M may be dried by blowing hot air on the . That is, the drying apparatus 2 may be configured such that the drying nozzle 22 is arranged on either the front surface side or the rear surface side of the substrate W. As shown in FIG.
  • the opening 31 is represented by a circle, but it is not limited to this.
  • each transport roll 11c may be arranged at a position where a desired tension can be applied to the base material W.
  • both ends of the base material W are nipped by a plurality of nip rolls 41
  • rolls in contact with the front side of the base material W and rolls in contact with the back side of the base material W may be alternately arranged. Since these rolls are in contact with the vicinity of the width direction end of the base material W within the housing part 21, the coating film formed on the base material W in a state in which the conveying path of the end part of the base material W is defined. M can be dried. Thereby, the vibration of the base material W can be suppressed. Moreover, even if the substrate W is misaligned and comes off the rolls, it can be easily returned to its original position as compared with the case where the substrate W is clamped.
  • the openings 31 provided in the drying nozzle 22 are arranged so as not to exceed the range of dimensions in the width direction of the base material W. They may be arranged beyond the range of dimensions in the width direction of W. As a result, the wind pressure of the hot air blown onto the base material W by the drying nozzle 22 can be adjusted from a range exceeding the dimension in the width direction of the base material W, so that the vibration of the base material W can be further suppressed.

Abstract

A purpose of the present invention is to provide a drying device that can convey a base material in a stable state when drying a coating film formed on the base material. This drying device is provided on a conveyance path for roll-to-roll conveyance of a base material, and dries a coating film formed on the base material. The coating film is formed on a prescribed surface of the base material in a stripe pattern in the width direction of the base material so as to have a plurality of application sections on which the coating film is formed, and non-application sections where the coating film is not formed between the plurality of application sections. The drying device includes a drying nozzle that dries the coating film by blowing a gas on the prescribed surface of the base material and/or the reverse surface from the prescribed surface of the base material. The drying nozzle has a wind pressure regulation means for regulating such that the wind pressure at locations facing the non-application sections is lower than the wind pressure at locations facing the application sections.

Description

乾燥装置drying equipment
 本発明は、シート状の基材を搬送しながら、基材に形成された塗膜を乾燥する乾燥装置に関するものである。 The present invention relates to a drying device that dries a coating film formed on a substrate while conveying a sheet-like substrate.
 従来、リチウムイオン電池の電池用極板の生産工程の中には、ロールツーロールで搬送されるシート状の基材に対して、活物質、バインダー、導電助剤、および溶媒を含む電極材料のスラリーを塗布して塗膜を形成し、形成した塗膜を乾燥装置により乾燥する工程がある。 Conventionally, in the production process of electrode plates for lithium-ion batteries, an electrode material containing an active material, a binder, a conductive aid, and a solvent is applied to a sheet-like base material that is transported by roll-to-roll. There is a step of applying a slurry to form a coating film and drying the formed coating film with a drying device.
 この乾燥装置は、下記特許文献1や下記特許文献2に示されるように基材の塗膜が形成された面または塗膜が形成されていない面に熱風を吹き付けて塗膜を加熱することで、塗膜を乾燥させている。 This drying apparatus heats the coating film by blowing hot air onto the surface of the substrate on which the coating film is formed or the surface on which the coating film is not formed, as shown in Patent Document 1 and Patent Document 2 below. , drying the coating film.
特開2012-97917号公報JP 2012-97917 A 特開2014-173803号公報JP 2014-173803 A
 しかし、上記特許文献1や上記特許文献2に記載されたような乾燥装置では、基材に形成された塗膜を乾燥させる際に安定した状態で基材を搬送することができない場合があった。 However, in the drying apparatus as described in Patent Document 1 and Patent Document 2, there are cases where the substrate cannot be conveyed in a stable state when drying the coating film formed on the substrate. .
 具体的に説明する。基材に塗膜を形成する際に塗膜をストライプ状に形成する場合がある。すなわち、基材の幅方向において塗膜が形成された複数の塗布部と、複数の塗布部の間に塗膜が形成されていない非塗布部を有するよう基材に塗膜を形成する場合がある。この場合、非塗布部は塗布部よりも軽いため、塗布部よりも非塗布部の方が乾燥装置により吹き付けられる熱風の風圧によって変形しやすくなっている。 I will explain in detail. When forming a coating film on a base material, the coating film may be formed in stripes. That is, there are cases in which the coating film is formed on the substrate so as to have a plurality of coated portions in which the coating film is formed in the width direction of the substrate and a non-coated portion where the coating film is not formed between the plurality of coated portions. be. In this case, since the non-applied portion is lighter than the applied portion, the non-applied portion is more easily deformed by the wind pressure of the hot air blown by the drying device than the applied portion.
 そのため、塗膜を乾燥させる際に、乾燥装置により基材の塗膜が形成された面、または基材に塗膜が形成されていない面に均一の風圧で熱風を吹きつけると、その熱風の風圧により図9に示すように塗布部Tと非塗布部Hに異なる量の変形が生じる。これにより、搬送される基材全体に振動が生じてしまい、基材が蛇行する原因となる。また、非塗布部が盛り上がる、または垂れ下がるよう基材が変形する。この非塗布部の変形、または基材全体が振動することにより、基材が熱風を吹き付けるノズルなどの乾燥装置内の部材に接触してしまい、傷付いてしまう可能性があった。 Therefore, when drying the coating film, if the drying device blows hot air onto the coated surface of the base material or the uncoated surface of the base material with uniform air pressure, the hot air As shown in FIG. 9, the applied portion T and the non-applied portion H are deformed by different amounts due to wind pressure. As a result, vibration occurs in the entire base material being transported, causing the base material to meander. In addition, the substrate is deformed such that the non-coated portion swells or hangs down. Due to the deformation of the non-coated portion or the vibration of the entire base material, the base material may come into contact with a member in the drying device such as a nozzle for blowing hot air, and may be damaged.
 本発明は、上記問題を鑑みてされたものであり、基材に形成された塗膜を乾燥させる際に安定した状態で基材を搬送することができる乾燥装置を提供することを目的としている。 SUMMARY OF THE INVENTION It is an object of the present invention to provide a drying apparatus capable of conveying a substrate in a stable state when drying a coating film formed on the substrate. .
 上記課題を解決するための本発明の乾燥装置は、基材をロールツーロール搬送する搬送経路上に設けられ、基材に形成された塗膜を乾燥させる乾燥装置であって、基材の所定面には、塗膜が形成された複数の塗布部と、複数の前記塗布部の間に塗膜が形成されていない非塗布部を有するよう基材の幅方向にストライプ状に塗膜が形成されており、基材の前記所定面または/および基材の前記所定面の裏面に対して気体を吹き付けて前記塗膜を乾燥させる乾燥ノズルを有し、前記乾燥ノズルは、前記塗布部と対向する位置における風圧よりも前記非塗布部と対向する位置における風圧の方が小さくなるよう調節する風圧調節手段を有していることを特徴としている。 The drying apparatus of the present invention for solving the above problems is a drying apparatus that is provided on a conveying path for roll-to-roll conveying a base material and dries a coating film formed on the base material. A coating film is formed in a striped pattern in the width direction of the substrate so that the surface has a plurality of coating portions on which a coating film is formed and a non-coating portion on which no coating film is formed between the plurality of coating portions. and has a drying nozzle for drying the coating film by blowing gas against the predetermined surface of the base material and/or the back surface of the predetermined surface of the base material, and the drying nozzle faces the coating unit. It is characterized by having a wind pressure adjusting means for adjusting the wind pressure at the position facing the non-application portion to be smaller than the wind pressure at the position where the coating is applied.
 上記乾燥装置によれば、乾燥ノズルが基材の所定面または/および基材の所定面の裏面に吹き付ける気体の風圧を風圧調節手段により塗布部と対向する位置よりも非塗布部と対向する位置の方が小さくなるよう調節するので、吹き付けられる気体の風圧による塗布部と非塗布部の変形量の差を抑えることができる。したがって、搬送される基材の振動を抑制することができるため、基材の蛇行を防ぎ、基材に形成された塗膜を乾燥させる際に安定した状態で基材を搬送することが可能となる。また、非塗布部が盛り上がる、または垂れ下がるよう変形することを抑制することができるため、基材が乾燥装置内の部材に接触することを防ぐことができる。 According to the drying apparatus, the air pressure of the gas that the drying nozzle blows on the predetermined surface of the base material and/or the back surface of the predetermined surface of the base material is controlled by the air pressure adjusting means so that the position facing the non-coating part is lower than the position facing the coating part. is adjusted to be smaller, it is possible to suppress the difference in the amount of deformation between the applied portion and the non-applied portion due to the wind pressure of the blown gas. Therefore, since the vibration of the conveyed base material can be suppressed, meandering of the base material can be prevented, and the base material can be conveyed in a stable state when drying the coating film formed on the base material. Become. In addition, since it is possible to suppress deformation such that the non-coated portion swells or hangs down, it is possible to prevent the substrate from coming into contact with members in the drying device.
 また、前記乾燥ノズルは、気体を吹き出す吹き出し部を有しており、前記風圧調節手段は、前記吹き出し部により吹き付けられる気体を吸引するための複数の開口であって、複数の前記開口は、基材の幅方向に配列され、共通の吸引手段から吸引力を各々の開口から発生させ、複数の前記開口のうち、前記塗布部と対向する前記開口の面積よりも前記非塗布部と対向する前記開口の面積の方が大きい構成としてもよい。 Further, the drying nozzle has a blowing part for blowing gas, and the air pressure adjusting means is a plurality of openings for sucking the gas blown by the blowing part, and the plurality of openings are formed in a base. It is arranged in the width direction of the material, a suction force is generated from each opening from a common suction means, and among the plurality of openings, the area of the opening facing the non-coating portion is larger than the area of the opening facing the coating portion. A configuration in which the area of the opening is larger may be adopted.
 この構成によれば、簡単な構成で塗布部と対向する位置における風圧よりも前記非塗布部と対向する位置における風圧の方が小さくなるよう調節することが可能となる。 According to this configuration, it is possible to adjust with a simple configuration so that the wind pressure at the position facing the non-application portion is smaller than the wind pressure at the position facing the application portion.
 また、前記風圧調節手段は、前記乾燥ノズルから気体を吹き出すための複数の開口であって、複数の前記開口は、基材の幅方向に配列され、共通の供給部から供給された気体を各々の前記開口から吹き出し、複数の前記開口のうち、前記塗布部に気体を吹き出す前記開口の面積よりも前記非塗布部に気体を吹き出す前記開口の面積の方が小さい構成としてもよい。 Further, the wind pressure adjusting means is a plurality of openings for blowing out gas from the drying nozzle, and the plurality of openings are arranged in the width direction of the base material, and the gas supplied from a common supply section is supplied to each of the openings. of the plurality of openings, the area of the openings for blowing the gas to the non-application portion may be smaller than the area of the openings for blowing the gas to the application portion.
 この構成によれば、簡単な構成で塗布部と対向する位置における風圧よりも前記非塗布部と対向する位置における風圧の方が小さくなるよう調節することが可能となる。 According to this configuration, it is possible to adjust with a simple configuration so that the wind pressure at the position facing the non-application portion is smaller than the wind pressure at the position facing the application portion.
 また、複数の前記開口が、前記乾燥ノズルを形成するプレートに形成されており、
 複数パターンの前記プレートが交換可能である構成としてもよい。
Also, a plurality of said openings are formed in a plate forming said drying nozzle,
A plurality of patterns of the plates may be replaceable.
 この構成によれば、塗布部と非塗布部の位置に対応して、風圧を調節するための開口の大きさを容易に調節することが可能となる。 According to this configuration, it is possible to easily adjust the size of the opening for adjusting the air pressure, corresponding to the positions of the applied portion and the non-applied portion.
 また、ストライプ状の塗膜が基材の両面に形成されている構成としてもよい。 Also, a configuration in which striped coating films are formed on both sides of the substrate may be employed.
 この構成によれば、基材の両面に塗膜を形成した場合であっても、基材の両面に形成された塗膜を乾燥させる際に安定した状態で基材を搬送することが可能となる。 According to this configuration, even when coating films are formed on both sides of the base material, the base material can be transported in a stable state when drying the coating films formed on both sides of the base material. Become.
 また、基材の幅方向端部と接触し、基材の前記端部の搬送経路を規定するエッジ誘導部を有している構成としてもよい。 Further, it may be configured to have an edge guide portion that contacts the width direction end of the base material and defines the conveying path of the end of the base material.
 この構成によれば、基材の幅方向端部とエッジ誘導部が接触しているため、基材の振動を抑えることができ、基材に形成された塗膜を乾燥させる際により安定した状態で基材を搬送することが可能となる。 According to this configuration, since the width direction end portion of the base material and the edge guiding portion are in contact with each other, the vibration of the base material can be suppressed, and the coating film formed on the base material can be dried in a more stable state. It becomes possible to convey the base material with
 本発明の乾燥装置によれば、基材に形成された塗膜を乾燥させる際に安定した状態で基材を搬送することが可能となる。 According to the drying apparatus of the present invention, it is possible to convey the substrate in a stable state when drying the coating film formed on the substrate.
本発明の第一実施形態における乾燥装置を備えた塗工装置を概略的に示す図である。BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows roughly the coating apparatus provided with the drying apparatus in 1st embodiment of this invention. 本発明の第一実施形態における風圧調節手段を説明するための図である。It is a figure for demonstrating the wind pressure adjustment means in 1st embodiment of this invention. 本発明の第一実施形態における乾燥ノズルを説明するための図である。It is a figure for demonstrating the drying nozzle in 1st embodiment of this invention. 本発明の第一実施形態における風圧調節手段を説明するための図である。It is a figure for demonstrating the wind pressure adjustment means in 1st embodiment of this invention. 本発明の第二実施形態における乾燥装置を示す図である。It is a figure which shows the drying apparatus in 2nd embodiment of this invention. 本発明の第三実施形態における乾燥ノズルを説明するための図である。It is a figure for demonstrating the drying nozzle in 3rd embodiment of this invention. 本発明の第三実施形態における風圧調節手段を説明するための図である。It is a figure for demonstrating the wind pressure adjustment means in 3rd embodiment of this invention. 本発明の第三実施形態における風圧調節手段を説明するための図である。It is a figure for demonstrating the wind pressure adjustment means in 3rd embodiment of this invention. 従来の乾燥装置における基材への空気の吹き付け方を示す図である。It is a figure which shows how to blow air to the base material in the conventional drying apparatus.
 〔第一実施形態〕
 本発明の第一実施形態における乾燥装置について図面を参照しながら説明する。なお、以下の説明では、直交座標系の3軸をX、Y、Zとし、水平方向をX軸方向、Y軸方向と表現し、XY平面と垂直な方向(つまり、鉛直方向)をZ軸方向と表現する。
[First embodiment]
A drying apparatus according to a first embodiment of the present invention will be described with reference to the drawings. In the following description, the three axes of the orthogonal coordinate system are X, Y, and Z, the horizontal direction is expressed as the X-axis direction and the Y-axis direction, and the direction perpendicular to the XY plane (that is, the vertical direction) is the Z-axis. expressed as direction.
 図1は、第一実施形態における乾燥装置2を備えた塗工装置1を概略的に示す図である。図2および図4は、第一実施形態における風圧調節手段3を説明するための図である。図3は、第一実施形態における乾燥ノズル22を説明するための図であり、Y軸方向における乾燥ノズル22の側面断面図である。 FIG. 1 is a diagram schematically showing a coating device 1 equipped with a drying device 2 according to the first embodiment. 2 and 4 are diagrams for explaining the wind pressure adjusting means 3 in the first embodiment. FIG. 3 is a diagram for explaining the drying nozzle 22 in the first embodiment, and is a side sectional view of the drying nozzle 22 in the Y-axis direction.
 本実施形態における乾燥装置2を備えた塗工装置1は、図1に示すようにシート状の基材Wを搬送する搬送機構11と、基材Wの所定面に塗布液を塗布して塗膜M(図2を参照)形成する第1の塗布機構12と、基材Wの所定面の裏面に塗布液を塗布して塗膜Mを形成する第2の塗布機構13とを有している。乾燥装置2は、搬送機構11による基材Wの搬送経路上に配置されている。なお、本実施形態における基材Wの所定面とは基材Wの表面のことであり、基材Wの所定面の裏面とは基材Wの裏面のことである。ここでいう、基材Wの表面とは後述する第1の塗布機構12により塗膜Mが形成される面であり、基材Wの裏面とは後述する第2の塗布機構13により塗膜Mが形成される面のことである。以下、基材Wの所定面を表面、基材Wの所定面の裏面を基材Wの裏面と呼ぶ。 A coating apparatus 1 equipped with a drying device 2 according to the present embodiment includes a transport mechanism 11 for transporting a sheet-like substrate W as shown in FIG. It has a first coating mechanism 12 for forming a film M (see FIG. 2) and a second coating mechanism 13 for forming a coating film M by applying a coating liquid to the back surface of a predetermined surface of the substrate W. there is The drying device 2 is arranged on the transport path of the substrate W by the transport mechanism 11 . In addition, the predetermined surface of the base material W in this embodiment is the front surface of the base material W, and the back surface of the predetermined surface of the base material W is the back surface of the base material W. As shown in FIG. Here, the surface of the substrate W is the surface on which the coating film M is formed by the first coating mechanism 12 described later, and the back surface of the substrate W is the coating film M formed by the second coating mechanism 13 described later. is the surface on which is formed. Hereinafter, the predetermined surface of the substrate W is referred to as the front surface, and the back surface of the predetermined surface of the substrate W is referred to as the back surface of the substrate W.
 本実施形態における塗工装置1は、搬送機構11により搬送される基材Wの両面に第1の塗布機構12と第2の塗布機構13により塗膜Mを形成し、これら塗膜Mを乾燥装置2により乾燥させる。 The coating apparatus 1 in this embodiment forms coating films M on both sides of a substrate W conveyed by a conveying mechanism 11 by means of a first coating mechanism 12 and a second coating mechanism 13, and dries these coating films M. Dry with device 2 .
 本実施形態における基材Wは、リチウムイオン電池の電池用極板となる金属箔であり、正極を構成する場合はアルミニウム箔などが用いられ、負極を構成する場合は銅箔などが用いられる。この基材Wは、一方向に長い帯状のシートであり、搬送機構11により塗工装置1を構成する各部を経由するよう搬送される。 The base material W in the present embodiment is a metal foil that serves as a battery electrode plate for a lithium ion battery, and aluminum foil or the like is used when forming a positive electrode, and copper foil or the like is used when forming a negative electrode. The base material W is a strip-shaped sheet that is long in one direction, and is conveyed by the conveying mechanism 11 so as to pass through each section that constitutes the coating apparatus 1 .
 本実施形態における塗布液は、たとえば、活物質、バインダー、導電助剤、および溶媒を含むスラリーのことであり、リチウムイオン電池の電池用極板の材料(所謂、電極材料)として用いられる。この塗布液を基材Wに塗布することで、塗膜Mが形成される。 The coating liquid in the present embodiment is, for example, a slurry containing an active material, a binder, a conductive aid, and a solvent, and is used as a material for electrode plates of lithium ion batteries (so-called electrode material). The coating film M is formed by coating the substrate W with this coating liquid.
 本実施形態における搬送機構11は、基材Wを搬送するためのものである。搬送機構11は、図1に示すように基材Wを巻き出す巻出ロール11aと、基材Wを巻き取る巻取ロール11bと、巻出ロール11aから巻き出された基材Wが巻取ロール11bに巻き取られるまでに経由する搬送ロール11cと、後述する第1の塗布機構12により塗布液を塗布する位置に基材Wを案内する塗布ロール11dとを有している。この搬送機構11が有する各々のロールは、円柱状に形成され、この円柱の中心軸を回転軸として回転する。 The transport mechanism 11 in this embodiment is for transporting the base material W. As shown in FIG. 1, the transport mechanism 11 includes an unwinding roll 11a for unwinding the base material W, a winding roll 11b for winding the base material W, and a winding roll for winding the base material W unwound from the unwinding roll 11a. It has a transport roll 11c through which the base material W is wound up by the roll 11b, and a coating roll 11d that guides the base material W to a position where the coating liquid is applied by the first coating mechanism 12, which will be described later. Each roll of the conveying mechanism 11 is formed in a columnar shape and rotates about the central axis of the column.
 巻出ロール11aは、図示しない制御部により回転を駆動制御され、所定の速度で基材Wを巻き出す。制御部は、たとえば、汎用のコンピュータ装置によって構成されている。また、巻取ロール11bは、巻出ロール11aと同様に制御部により回転を駆動制御され、基材Wに所定の張力を付与しながら基材Wを巻き取る。なお、ここでいう張力は、基材Wの搬送方向(図1におけるX軸方向)の張力のことである。 The rotation of the unwinding roll 11a is driven and controlled by a control unit (not shown), and unwinds the base material W at a predetermined speed. The control unit is configured by, for example, a general-purpose computer device. The take-up roll 11b, like the unwind roll 11a, is driven and controlled in rotation by the control section, and winds the base material W while applying a predetermined tension to the base material W. As shown in FIG. It should be noted that the tension here means the tension in the conveying direction of the base material W (the X-axis direction in FIG. 1).
 搬送ロール11cは、図1に示すように複数設けられ、基材Wが塗工装置1を構成する各部を経由するよう配置されている。この複数の搬送ロール11cのうち一部、またはすべての搬送ロール11cは、巻出ロール11aおよび巻取ロール11bと同様に制御部により回転を駆動制御され、基材Wに所定の張力を付与しながら基材Wを搬送する。 A plurality of transport rolls 11c are provided as shown in FIG. A part or all of the transport rolls 11c among the plurality of transport rolls 11c are driven and controlled in rotation by the control unit in the same manner as the unwind roll 11a and the winding roll 11b, and apply a predetermined tension to the base material W. The substrate W is conveyed while
 塗布ロール11dは、図1に示すように後述する第1の塗布機構12と対向するよう配置されている。そのため、第1の塗布機構12と一定間隔を保ちながら基材Wを搬送することができる。 The coating roll 11d is arranged so as to face a first coating mechanism 12, which will be described later, as shown in FIG. Therefore, the substrate W can be transported while keeping a constant distance from the first coating mechanism 12 .
 これら構成により、搬送機構11は、所定の張力を基材Wに付与しながら基材Wを所定の速度で搬送することができる。 With these configurations, the transport mechanism 11 can transport the base material W at a predetermined speed while applying a predetermined tension to the base material W.
 本実施形態における第1の塗布機構12は、搬送される基材Wの表面に塗布液を塗布してストライプ状に塗膜Mを形成するためのものである。ストライプ状に塗膜Mを形成するとは、図2に示すように基材Wが、塗膜Mが形成された複数の塗布部Tと、複数の塗布部Tの間に塗膜Mが形成されていない非塗布部Hを有するよう基材Wの幅方向に塗膜Mを形成することである。なお、本実施形態では第1の塗布機構12が、電極材料のスラリーを塗布するスリットダイであるものを例に説明するが、第1の塗布機構12はスリットダイに限らず、たとえば、インクジェット塗布用やグラビア塗布用の塗布方式に対応するものであってもよい(後述する第2の塗布機構13も同様)。 The first coating mechanism 12 in this embodiment is for coating a coating liquid on the surface of the substrate W being transported to form the coating film M in stripes. Forming the coating film M in stripes means that the base material W has a plurality of coating portions T on which the coating film M is formed, and the coating film M is formed between the plurality of coating portions T, as shown in FIG. It is to form the coating film M in the width direction of the substrate W so as to have a non-coated portion H that is not covered. In this embodiment, the first coating mechanism 12 is a slit die for coating electrode material slurry, but the first coating mechanism 12 is not limited to a slit die. It may correspond to a coating method for use or gravure coating (the same applies to the second coating mechanism 13 to be described later).
 第1の塗布機構12は、基材Wの幅方向(図1におけるY軸方向)に沿って長く形成されている。ここで、前述した塗布ロール11dが、第1の塗布機構12に対して、塗布ロール11dの回転軸方向と第1の塗布機構12の幅方向とが平行になるよう所定の間隔を空けて配置されている。 The first coating mechanism 12 is formed long along the width direction of the substrate W (the Y-axis direction in FIG. 1). Here, the coating roll 11d described above is arranged at a predetermined interval with respect to the first coating mechanism 12 so that the rotation axis direction of the coating roll 11d and the width direction of the first coating mechanism 12 are parallel. It is
 また、第1の塗布機構12は、図1に示すように供給路18に接続され、幅方向に長く塗布液を溜める空間であるマニホールド14と、このマニホールド14と繋がった幅方向に広いスリット15と、幅方向においてスリット15と同一の長さで開口し、塗布液を吐出する吐出口16により構成される。これにより、マニホールド14に溜められた塗布液がスリット15を経由して、吐出口16から基材Wに吐出される。また、吐出口16は、塗布ロール11dと基材Wを挟んで対向している。すなわち、吐出口16は基材Wの表面側で基材Wと対向している。これにより、吐出口16と基材Wとの間隔を一定に保った状態で、基材Wに塗布液を塗布することができる。 As shown in FIG. 1, the first coating mechanism 12 includes a manifold 14 that is connected to a supply path 18 and that is a space that is long in the width direction and that stores the coating liquid, and a slit 15 that is wide in the width direction and connected to the manifold 14. , and an ejection port 16 that has the same length as the slit 15 in the width direction and ejects the coating liquid. As a result, the coating liquid stored in the manifold 14 is ejected onto the substrate W from the ejection port 16 via the slit 15 . Further, the ejection port 16 faces the coating roll 11d with the base material W interposed therebetween. That is, the ejection port 16 faces the substrate W on the surface side of the substrate W. As shown in FIG. As a result, the coating liquid can be applied to the base material W while the distance between the ejection port 16 and the base material W is kept constant.
 そして、第1の塗布機構12には、基材Wに形成する塗膜Mをストライプ状にするための図示しないシム板がさらに設けられている。シム板は、たとえば、略櫛型状を有しており、スリット15を幅方向に分割するよう配置されている。このシム板によりスリット15を幅方向に分割した状態で塗布液を塗布すると、シム板がない部分から塗布液が塗布され、シム板がある部分から塗布液が塗布されないようになる。すなわち、塗膜Mをストライプ状に形成することができる。なお、このシム板の形状を変更することで、塗膜Mの幅を調節することができるようになっている。すなわち、塗布部Tと非塗布部Hの幅を調節することができる。 The first coating mechanism 12 is further provided with a shim plate (not shown) for forming the coating film M on the base material W in a stripe shape. The shim plate has, for example, a substantially comb shape and is arranged to divide the slit 15 in the width direction. When the coating liquid is applied while the slit 15 is divided in the width direction by the shim plate, the coating liquid is applied from the portion without the shim plate and is not applied from the portion with the shim plate. That is, the coating film M can be formed in stripes. The width of the coating film M can be adjusted by changing the shape of the shim plate. That is, the widths of the applied portion T and the non-applied portion H can be adjusted.
 供給路18は、マニホールド14と塗布液が貯留されているタンク17を接続している。そして、図示しないポンプによりタンク17から供給路18を介してマニホールド14に塗布液を供給する。 The supply path 18 connects the manifold 14 and the tank 17 in which the application liquid is stored. Then, the application liquid is supplied from the tank 17 to the manifold 14 through the supply path 18 by a pump (not shown).
 これらの構成を有する第1の塗布機構12によって、基材Wの表面にストライプ状に塗膜Mを形成することができる。 The coating film M can be formed in stripes on the surface of the substrate W by the first coating mechanism 12 having these configurations.
 本実施形態における第2の塗布機構13は、搬送される基材Wの裏面に塗布液を塗布してストライプ状に塗膜Mを形成するためのものである。第2の塗布機構13は、図1に示すように前述した第1の塗布機構12と同様な構成をしており、第2の塗布機構13の吐出口16は、基材Wの裏面側で基材Wと対向して配置されている。 The second coating mechanism 13 in this embodiment is for coating the back surface of the substrate W to be conveyed with the coating liquid to form the coating film M in stripes. The second coating mechanism 13 has the same configuration as the first coating mechanism 12 described above, as shown in FIG. It is arranged so as to face the base material W.
 そして、第2の塗布機構13は、供給路18と図示しないポンプによりタンク17から塗布液が供給され、この供給された塗布液を基材Wの裏面に塗布液を塗布する。これにより、基材Wの裏面にストライプ状の塗膜Mを形成することができる。なお、第2の塗布機構13に塗布液を供給するための供給路18とタンク17は、本実施形態では第1の塗布機構12に塗布液を供給するための供給路18とタンク17は別個に設けられたものである。また、第2の塗布機構13により基材Wの裏面に形成する塗膜Mの幅は、第1の塗布機構12により基材Wの表面に形成する塗膜Mの幅と同一であるとよい。 Then, the second coating mechanism 13 is supplied with the coating liquid from the tank 17 by the supply path 18 and a pump (not shown), and coats the back surface of the substrate W with the supplied coating liquid. Thereby, the stripe-shaped coating film M can be formed on the back surface of the base material W. As shown in FIG. The supply path 18 and the tank 17 for supplying the coating liquid to the second coating mechanism 13 are separate from the supply path 18 and the tank 17 for supplying the coating liquid to the first coating mechanism 12 in this embodiment. It is provided in The width of the coating film M formed on the back surface of the substrate W by the second coating mechanism 13 is preferably the same as the width of the coating film M formed on the front surface of the substrate W by the first coating mechanism 12. .
 これら第1の塗布機構12および第2の塗布機構13により基材Wの両面にストライプ状に塗膜Mを形成することができる。 The first coating mechanism 12 and the second coating mechanism 13 can form the coating film M in stripes on both sides of the substrate W.
 本実施形態における乾燥装置2は、第1の塗布機構12および第2の塗布機構13により基材Wの両面に形成された塗膜Mを乾燥させるためのものである。乾燥装置2は、図1に示すように搬送機構11による基材Wの搬送経路上において第1の塗布機構12および第2の塗布機構13よりも下流側に設けられ、筐体部21と、筐体部21の内部に設けられ、基材Wに気体を吹き付ける乾燥ノズル22とを有している。なお、ここでいう気体は、熱風であるとよい。以下、乾燥ノズル22から基材Wに吹き付ける気体を熱風と呼ぶ。 The drying device 2 in this embodiment is for drying the coating films M formed on both sides of the substrate W by the first coating mechanism 12 and the second coating mechanism 13 . As shown in FIG. 1, the drying device 2 is provided downstream of the first coating mechanism 12 and the second coating mechanism 13 on the transport path of the base material W by the transport mechanism 11, and includes a housing part 21, A drying nozzle 22 is provided inside the housing 21 and blows a gas onto the substrate W. It should be noted that the gas here is preferably hot air. Hereinafter, the gas blown from the drying nozzle 22 to the base material W is called hot air.
 筐体部21は、基材Wの搬送方向に長く形成された箱体であり、この箱体の内部に基材Wが通過する空間と、この空間に基材Wが出入りするための入口および出口を有している。そして、塗膜Mが形成された基材Wが搬送機構11により筐体部21内を通過するよう搬送される。 The housing part 21 is a box elongated in the conveying direction of the base material W, and has a space inside the box for the base material W to pass through, and an entrance for the base material W to enter and exit the space. have an exit. Then, the base material W on which the coating film M is formed is conveyed by the conveying mechanism 11 so as to pass through the housing part 21 .
 なお、筐体部21内には、前述した搬送ロール11cが配置されていない。特に本実施形態のように基材Wの両面に塗膜Mが形成される場合、塗膜Mが乾燥するまで基材Wに触れることができない。そのため、筐体部21内では、基材Wの少なくとも幅方向の両端部以外は浮いた状態で搬送される。これに対して、本実施形態では、筐体部21よりも上流側に配置された搬送ロール11cと下流側に配置された搬送ロール11cにより基材Wに所定の張力を付与、または/および後述する乾燥ノズル22により基材Wの裏面側から熱風を吹き付けることで基材Wに揚力を付与した状態で、搬送機構11により基材Wが搬送されて筐体部21内を通過するようになっている。 It should be noted that the above-described transport roll 11c is not arranged inside the housing portion 21. Especially when the coating film M is formed on both surfaces of the base material W like this embodiment, the base material W cannot be touched until the coating film M dries. Therefore, in the housing part 21, the base material W is conveyed in a floating state except for at least both ends in the width direction. On the other hand, in the present embodiment, a predetermined tension is applied to the substrate W by the transport roll 11c arranged on the upstream side and the transport roll 11c arranged on the downstream side of the housing portion 21, and/or The substrate W is conveyed by the conveying mechanism 11 and passes through the housing portion 21 in a state in which a lift force is applied to the substrate W by blowing hot air from the back side of the substrate W from the drying nozzle 22 . ing.
 乾燥ノズル22は、基材Wに熱風を吹き付けることにより塗膜Mを加熱するためのものである。この乾燥ノズル22は、図1および図2に示すように基材Wの幅方向に長く形成されており、基材Wの表面または裏面と対向する面を有する板状部材(以下、プレート27と呼ぶ)を有している。 The drying nozzle 22 is for heating the coating film M by blowing hot air onto the substrate W. The drying nozzle 22 is elongated in the width direction of the base material W as shown in FIGS. called).
 そして、乾燥ノズル22は、筐体部21内で基材Wの下方に配置されて基材Wの裏面に熱風を吹き付ける下側ノズル22aと、筐体21内で基材Wの上方に配置されて基材Wの表面に熱風を吹き付ける上側ノズル22bとがあり、これら下側ノズル22aと上側ノズル22bは、基材Wの搬送方向に交互に配置されている。そのため、基材Wに揚力が付与されて基材Wが浮揚した状態で、基材Wは略直線方向に搬送される。このように略直線的に基材Wを搬送させることにより、基材Wを浮揚させた状態であっても所定の方向に正確に搬送することができる。 The drying nozzles 22 are arranged below the base material W in the housing part 21, and are arranged above the base material W in the housing part 21. There is an upper nozzle 22b for blowing hot air onto the surface of the base material W, and these lower nozzles 22a and upper nozzles 22b are arranged alternately in the conveying direction of the base material W. As shown in FIG. Therefore, the base material W is conveyed in a substantially straight direction in a state in which the base material W is floated by the lift force applied to the base material W. By conveying the base material W substantially linearly in this way, it is possible to accurately convey the base material W in a predetermined direction even in a levitated state.
 また、本実施形態における乾燥ノズル22は、図2および図3に示すよう熱風を吹き出し部23と、吹き出し部23により吹き出された熱風の風圧を調節する吸引機構25により構成されている。 In addition, the drying nozzle 22 in this embodiment is composed of a hot air blowing section 23 and a suction mechanism 25 for adjusting the air pressure of the hot air blown by the blowing section 23, as shown in FIGS.
 吹き出し部23は、図2に示すように基材Wの搬送方向における乾燥ノズル22の両端部のそれぞれに、基材Wの幅方向に長く基材Wの搬送方向に短いスリット状に形成されている。そして、乾燥ノズル22は、図3に示すように吹き出し部23と連通する空洞である空洞部24を有し、この空洞部24に図示しない供給源から熱風が供給される。これにより、供給源から供給された熱風が空洞部24を経由して吹き出し部23から略均一な風圧で吹き出される。この構成により、下側ノズル22aは基材Wの下方から基材Wに向かって熱風を吹き付け、また、上側ノズル22bは基材Wの上方から基材Wに向かって熱風を吹き付ける。これら熱風により塗膜Mが加熱されて塗膜M中の溶剤が気化することで、塗膜Mは乾燥させられて固化する。 As shown in FIG. 2, the blowout part 23 is formed in a slit shape long in the width direction of the base material W and short in the direction of conveyance of the base material W at each of both ends of the drying nozzle 22 in the direction of conveyance of the base material W. there is As shown in FIG. 3, the drying nozzle 22 has a hollow portion 24 that communicates with the blowout portion 23, and hot air is supplied to the hollow portion 24 from a supply source (not shown). As a result, the hot air supplied from the supply source is blown out from the blowing part 23 via the hollow part 24 with substantially uniform wind pressure. With this configuration, the lower nozzle 22a blows hot air toward the substrate W from below, and the upper nozzle 22b blows hot air toward the substrate W from above. The coating film M is heated by the hot air and the solvent in the coating film M is vaporized, so that the coating film M is dried and solidified.
 吸引機構25は、図2および図3に示すように基材Wの幅方向に長く形成された箱体であり、所定の面が基材Wの面と対向するように空洞部24に設けられている。なお、吸引機構25の所定の面を有する板状部材が前述したプレート27である。この吸引機構25が、空洞部24に設けられることで前述したスリット状の吹き出し部23が形成されている。 The suction mechanism 25 is a box elongated in the width direction of the base material W as shown in FIGS. ing. The plate member having a predetermined surface of the suction mechanism 25 is the plate 27 described above. The suction mechanism 25 is provided in the hollow portion 24 to form the slit-shaped blowout portion 23 described above.
 また、吸引機構25は、基材Wに吹き付けられた熱風を吸引する所謂吸引手段であり、図2および図3に示すように基材Wに吹き付ける熱風の風圧を調節するための風圧調節手段3を有している。 The suction mechanism 25 is a so-called suction means for sucking the hot air blown onto the base material W. As shown in FIGS. have.
 風圧調節手段3は、吹き出し部23から吹き出された熱風を吸引するための複数の開口31であり、基材Wの幅方向に配列するようプレート27に形成されている。そして、吸引機構25は、図3に示すように複数の開口31と連通する空洞である空洞部26と、開口31から引き込んだ熱風を排出する排出口28とを有している。排出口28は、開口31から引き込まれた熱風を乾燥ノズル22の外部へ排出できるよう設けられた孔であり、図3および図5に示すように基材Wの幅方向における吸引機構25の各側面に設けられている。そのため、開口31から引き込まれた熱風が空洞部26に滞留しないように排出することができるので、空洞部26は基材Wとプレート27が対向する空間よりも負圧になる。これにより、各々の開口31に吸引力が発生するため、熱風が各々の開口31に吸引されて空洞部26に引き込まれるようになっている。 The air pressure adjusting means 3 is a plurality of openings 31 for sucking the hot air blown out from the blowing part 23 and formed in the plate 27 so as to be arranged in the width direction of the base material W. The suction mechanism 25 has, as shown in FIG. The discharge port 28 is a hole provided so as to discharge the hot air drawn from the opening 31 to the outside of the drying nozzle 22. As shown in FIGS. provided on the side. Therefore, the hot air drawn in from the opening 31 can be discharged without remaining in the cavity 26, so that the cavity 26 has a lower pressure than the space where the substrate W and the plate 27 face each other. As a result, since a suction force is generated in each opening 31 , the hot air is drawn into the hollow portion 26 by being sucked into each opening 31 .
 また、空洞部26に吸引力を付与する図示しない吸引力付与手段(たとえば、ポンプ)を設けてもよい。吸引力付与手段により空洞部に吸引力が付与されることで、空洞部26がさらに負圧になる。そのため、吸引力付与手段がない場合よりも各々の開口31から熱風を積極的に吸引することができる。 Further, a not-shown suction force imparting means (for example, a pump) that imparts a suction force to the hollow portion 26 may be provided. By applying a suction force to the cavity portion by the suction force applying means, the pressure in the cavity portion 26 becomes further negative. Therefore, the hot air can be more positively sucked from each opening 31 than when there is no suction force applying means.
 また、図2に示すように複数の開口31のうち、塗布部Tと対向する開口31aの面積よりも非塗布部Hと対向する開口31bの面積の方が大きくなっている。空洞部26に引き込まれる熱風の風量は、開口31の面積が小さくなるにつれて少なくなり、開口31の面積が大きくなるにつれて多くなる。そのため、図4に示すように塗布部Tと対向する位置における熱風の風圧よりも非塗布部Hと対向する位置における熱風の風圧の方が小さくなる。 Further, as shown in FIG. 2, among the plurality of openings 31, the area of the opening 31b facing the non-application portion H is larger than the area of the opening 31a facing the application portion T. The amount of hot air drawn into the cavity 26 decreases as the area of the opening 31 decreases, and increases as the area of the opening 31 increases. Therefore, as shown in FIG. 4, the wind pressure of the hot air at the position facing the non-coating portion H is smaller than the wind pressure of the hot air at the position facing the coating portion T. As shown in FIG.
 これにより、乾燥ノズル22が基材Wの両面に吹き付ける熱風の風圧を塗布部Tよりも非塗布部Hの方が小さくなるよう調節することができるので、吹き付けられる熱風の風圧による塗布部Tと非塗布部Hの変形量の差を抑えることができる。 As a result, the wind pressure of the hot air blown by the drying nozzle 22 onto both surfaces of the substrate W can be adjusted so that the non-coated portion H is smaller than the coated portion T. A difference in the amount of deformation of the non-applied portion H can be suppressed.
 具体的には、塗膜Mが形成された塗布部Tよりも非塗布部Hの方が軽いため、塗布部Tよりも非塗布部Hの方が、乾燥ノズル22から吹き付けられる熱風の風圧によって変形しやすくなっている。そして、図9に示すように熱風の風圧を調節せずに塗布部Tと非塗布部Hに均一の風圧で熱風を吹き付けた場合、その熱風の風圧により塗布部Tと非塗布部Hに異なる量の変形が生じる。そのため、搬送される基材W全体に振動が生じてしまい、基材Wが蛇行する原因となってしまう。また、図9に示すように非塗布部Hが盛り上がる、または垂れ下がるよう基材Wが変形する。この非塗布部Hの変形、または基材W全体が振動することにより、基材Wが乾燥ノズル22などの筐体部21内の部材に接触してしまい、傷付いてしまう可能性がある。 Specifically, since the non-coated portion H is lighter than the coated portion T on which the coating film M is formed, the non-coated portion H is more likely to be exposed to the air pressure of the hot air blown from the drying nozzle 22 than the coated portion T. Easy to deform. Then, as shown in FIG. 9, when the hot air is blown to the applied portion T and the non-applied portion H with a uniform air pressure without adjusting the air pressure of the hot air, the applied portion T and the non-applied portion H differ in the air pressure of the hot air. Amount of deformation occurs. Therefore, vibration occurs in the entire substrate W being transported, which causes the substrate W to meander. In addition, as shown in FIG. 9, the substrate W is deformed such that the non-coated portion H rises or hangs down. Due to the deformation of the non-application portion H or the vibration of the entire base material W, the base material W may come into contact with a member such as the drying nozzle 22 inside the casing 21 and be damaged.
 これに対して、前述したように塗布部Tと対向する開口31aの面積よりも非塗布部Hと対向する開口31bの面積の方を大きくしている。これにより、図4に示すように乾燥ノズル22から吹き出された熱風の風圧が、塗布部Tと対向する位置における風圧よりも非塗布部Hと対向する位置における風圧の方が小さくなるよう調節することができるため、吹き付けられる熱風の風圧による塗布部Tと非塗布部Hの変形量の差を抑えることができる。したがって、搬送される基材Wの振動を抑制することができるため、基材Wの蛇行を防ぐことができる。すなわち、基材Wに形成された塗膜Mを乾燥させる際に安定した状態で基材Wを搬送することが可能となる。また、非塗布部Hが盛り上がる、または垂れ下がるよう変形することを抑制することができるため、基材Wが筐体部21内の部材に接触することを防ぐことができる。また、簡単な構成で乾燥ノズル22が塗布部Tと非塗布部Hに吹き付ける熱風の風圧を調節することができる。 On the other hand, the area of the opening 31b facing the non-application portion H is made larger than the area of the opening 31a facing the application portion T as described above. As a result, as shown in FIG. 4, the wind pressure of the hot air blown out from the drying nozzle 22 is adjusted so that the wind pressure at the position facing the non-coating portion H is smaller than the wind pressure at the position facing the coating portion T. Therefore, the difference in the amount of deformation between the applied portion T and the non-applied portion H due to the wind pressure of the hot air blown can be suppressed. Therefore, since vibration of the substrate W being transported can be suppressed, meandering of the substrate W can be prevented. That is, the substrate W can be transported in a stable state when the coating film M formed on the substrate W is dried. In addition, since the non-applied portion H can be prevented from being deformed such that it swells or hangs down, the base material W can be prevented from coming into contact with the members inside the housing portion 21 . In addition, the air pressure of the hot air that the drying nozzle 22 blows onto the application portion T and the non-application portion H can be adjusted with a simple configuration.
 また、プレート27は複数パターンのプレートに交換可能であるとよい。具体的には、プレート27は、乾燥ノズル22(吸引機構25)から取り外し可能になっており、形成される開口31の面積の大きさ、形状、および配置が異なる複数パターンのプレートに交換可能になっている。すなわち、塗膜Mの幅、厚み、および位置に対応したパターンのプレートに適宜変更することが可能となっている。 Also, the plate 27 is preferably replaceable with plates of multiple patterns. Specifically, the plate 27 is detachable from the drying nozzle 22 (suction mechanism 25), and can be replaced with a plurality of patterns of plates having different sizes, shapes, and arrangements of the openings 31 to be formed. It's becoming That is, it is possible to appropriately change the plate to have a pattern corresponding to the width, thickness, and position of the coating film M.
 このように上記実施形態における乾燥装置2によれば、基材Wの両面に形成された塗膜Mを乾燥させる際に安定した状態で基材Wを搬送することが可能となる。 As described above, according to the drying device 2 in the above embodiment, it is possible to transport the substrate W in a stable state when drying the coating films M formed on both surfaces of the substrate W.
 なお、本実施形態では、空洞部26と連通する複数の開口31のうち、塗布部Tと対向する開口31aの面積よりも非塗布部Hと対向する開口31bの方を大きくすることにより基材Wに吹き付けられる熱風の風圧を調節する例について説明したが、これに限られない。たとえば、各々の開口31をそれぞれ異なる前述した吸引力付与手段と接続し、各々の開口31ごとに吸引する熱風の風量を調節するような構成としてもよい。これにより、開口31の面積の大きさを変更することなく、基材Wに吹き付ける熱風の風圧を調節することができる。 In the present embodiment, among the plurality of openings 31 communicating with the hollow portion 26, the area of the opening 31b facing the non-applied portion H is larger than the area of the opening 31a facing the applied portion T. Although the example of adjusting the wind pressure of the hot air blown to W has been described, the present invention is not limited to this. For example, each opening 31 may be connected to a different suction force applying means, and the amount of hot air sucked by each opening 31 may be adjusted. As a result, the air pressure of the hot air blown onto the substrate W can be adjusted without changing the size of the area of the opening 31 .
 〔第二実施形態〕
 次に本発明の第二実施形態における乾燥装置2について図5を用いて説明する。本実施形態では、乾燥装置2がエッジニップ部4を有している点で第一実施形態と異なっている。
[Second embodiment]
Next, a drying device 2 according to a second embodiment of the present invention will be described with reference to FIG. This embodiment differs from the first embodiment in that the drying device 2 has an edge nip portion 4 .
 図5は、本発明の第二実施形態における乾燥装置2を示す図であり、図5(a)は基材Wの表面側から見たエッジニップ部4を示す図、図5(b)は筐体21の側面断面図である。 5A and 5B are views showing a drying apparatus 2 according to a second embodiment of the present invention, FIG. 2 is a side cross-sectional view of body 21. FIG.
 本実施形態における乾燥装置2は、基材Wの幅方向端部と接触し、基材Wの端部の搬送経路を規定するためのエッジ誘導部の一種であるエッジニップ部4を有している。エッジニップ部4は、図5(a)および図5(b)に示すように基材Wの幅方向両端部を挟持するためのものであり、複数のニップロール41により構成される。ニップロール41は、円柱状に形成され、この円柱の中心軸を回転軸として回転する。各々のニップロール41は、基材Wの表面側および裏面側におけるそれぞれの基材Wの幅方向両端部に対向し、かつ、基材Wを表面側と裏面側から挟み込める位置に配置されている。これを一組のニップロール41として基材Wの搬送方向に複数組配置する。そのため、筐体部21内で基材Wの少なくとも幅方向両端部を挟持して基材Wの端部の搬送経路を規定した状態で基材Wに形成された塗膜Mを乾燥させることができる。 The drying apparatus 2 in the present embodiment has an edge nip portion 4 which is a kind of edge guide portion for contacting the width direction end portion of the base material W and defining the conveying path of the end portion of the base material W. . The edge nip portion 4 is for nipping both ends of the base material W in the width direction as shown in FIGS. The nip roll 41 is formed in a cylindrical shape and rotates about the central axis of the cylinder. Each of the nip rolls 41 is arranged at a position facing both ends in the width direction of the base material W on the front side and the back side of the base material W and capable of nipping the base material W from the front side and the back side. . A plurality of sets of these are arranged in the conveying direction of the base material W as a set of nip rolls 41 . Therefore, it is possible to dry the coating film M formed on the base material W in a state in which at least both widthwise end portions of the base material W are sandwiched within the housing portion 21 to define the conveying path of the end portions of the base material W. can.
 これにより、基材Wの幅方向両端部を挟持した状態で、基材Wの両面に熱風が吹き付けられるため、搬送される基材Wの振動をより抑制することができる。したがって、基材Wに形成された塗膜Mを乾燥させる際により安定した状態で基材Wを搬送することが可能となる。 As a result, hot air is blown onto both sides of the base material W while both widthwise ends of the base material W are sandwiched, so that vibration of the base material W being transported can be further suppressed. Therefore, it becomes possible to transport the substrate W in a more stable state when drying the coating film M formed on the substrate W.
 また、一組のニップロール41のうち、基材Wの同一面側に位置する二つのニップロール41は、図5(a)に示すように互いの回転軸が略V字を形成するよう傾いているとよい。このとき、一組のニップロール41は、挟持する基材Wを基材Wの幅方向両端部に向かって伸ばすように傾いている。これにより、基材Wを基材Wの幅方向両端部に向かって伸ばすことができるため、基材Wに生じる幅方向の撓みを軽減することができる。 Further, of the pair of nip rolls 41, the two nip rolls 41 located on the same side of the base material W are tilted so that their rotation axes form a substantially V shape as shown in FIG. 5(a). Good. At this time, the set of nip rolls 41 is tilted so as to extend the substrate W to be sandwiched toward both ends of the substrate W in the width direction. As a result, the base material W can be stretched toward both ends in the width direction of the base material W, so that bending of the base material W in the width direction can be reduced.
 〔第三実施形態〕
 次に本発明の第三実施形態における乾燥装置2について図6、図7、および図8を用いて説明する。本実施形態では、乾燥ノズル22が吹き出し部23と吸引機構25を有さず、乾燥ノズル22の基材Wの面と対向する面を有する板状部材であるプレート27に形成された複数の開口31(風圧調節手段3)から所定の風圧に調節された熱風を吹き出すようになっている点で第一実施形態および第二実施形態と異なっている。
[Third Embodiment]
Next, a drying device 2 according to a third embodiment of the present invention will be described with reference to FIGS. 6, 7 and 8. FIG. In the present embodiment, the drying nozzle 22 does not have the blowing part 23 and the suction mechanism 25, and a plurality of openings are formed in a plate 27 which is a plate-like member having a surface facing the surface of the substrate W of the drying nozzle 22. This embodiment differs from the first and second embodiments in that hot air adjusted to a predetermined air pressure is blown out from 31 (air pressure adjusting means 3).
 図6は本実施形態における乾燥ノズル22を説明するための図であり、Y軸方向における乾燥ノズル22の側面断面図である。図7および図8は、本実施形態における風圧調節手段3を説明するための図である。 FIG. 6 is a diagram for explaining the drying nozzle 22 in this embodiment, and is a side sectional view of the drying nozzle 22 in the Y-axis direction. 7 and 8 are diagrams for explaining the wind pressure adjusting means 3 in this embodiment.
 本実施形態における乾燥ノズル22は、図6および図7に示すように風圧調節手段3を有している。風圧調節手段3は、乾燥ノズル22から熱風を吹き出すための複数の開口31である。これら複数の開口31は、基材Wの幅方向に配列するようプレート27に形成されている。そして、複数の開口31は空洞部24に連通しており、図示しない共通の供給部から熱風が供給される。そして、供給された熱風が開口31から吹き出されて基材Wに吹き付けられる。 The drying nozzle 22 in this embodiment has wind pressure adjusting means 3 as shown in FIGS. The wind pressure adjusting means 3 is a plurality of openings 31 for blowing out hot air from the drying nozzles 22 . The plurality of openings 31 are formed in the plate 27 so as to be arranged in the width direction of the base material W. As shown in FIG. The plurality of openings 31 communicate with the hollow portion 24, and hot air is supplied from a common supply portion (not shown). Then, the supplied hot air is blown out from the opening 31 and blown onto the substrate W. As shown in FIG.
 また、図7に示すように複数の開口31のうち、塗布部Tに向けて熱風を吹き出す開口31aの面積よりも非塗布部Hに向けて熱風を吹き出す開口31bの面積の方が小さくなっている。共通の供給部から供給されて各々の開口31から吹き出される熱風の風量は、開口31の面積が大きくなるにつれて多くなり、開口31の面積が小さくなるにつれて少なくなる。そのため、図8に示すように塗布部Tに吹き付ける熱風の風圧よりも非塗布部Hに吹き付ける熱風の風圧の方が小さくなる。 Further, as shown in FIG. 7, among the plurality of openings 31, the area of the opening 31b for blowing hot air toward the non-coating portion H is smaller than the area of the opening 31a for blowing hot air toward the coating portion T. there is The amount of hot air supplied from the common supply unit and blown out from each opening 31 increases as the area of the opening 31 increases, and decreases as the area of the opening 31 decreases. Therefore, as shown in FIG. 8, the wind pressure of the hot air blown onto the non-application portion H is smaller than the wind pressure of the hot air blown onto the application portion T. As shown in FIG.
 これにより、乾燥ノズル22が基材Wの両面に吹き付ける熱風の風圧を塗布部Tよりも非塗布部Hの方が小さくなるよう調節することができるので、吹き付けられる熱風の風圧による塗布部Tと非塗布部Hの変形量の差を抑えることができる。したがって、搬送される基材Wの振動を抑制することができ、基材Wの蛇行を防ぐことができる。すなわち、基材Wに形成された塗膜Mを乾燥させる際に安定した状態で基材Wを搬送することが可能となる。また、非塗布部Hが盛り上がる、または垂れ下がるよう変形することを抑制することができるため、基材Wが筐体部21内の部材に接触することを防ぐことができる。また、簡単な構成で乾燥ノズル22が塗布部Tと非塗布部Hに吹き付ける熱風の風圧を調節することができる。 As a result, the wind pressure of the hot air blown by the drying nozzle 22 onto both surfaces of the substrate W can be adjusted so that the non-coated portion H is smaller than the coated portion T. A difference in the amount of deformation of the non-applied portion H can be suppressed. Therefore, the vibration of the substrate W being transported can be suppressed, and the meandering of the substrate W can be prevented. That is, the substrate W can be transported in a stable state when the coating film M formed on the substrate W is dried. In addition, since the non-applied portion H can be prevented from being deformed such that it swells or hangs down, the base material W can be prevented from coming into contact with the members inside the housing portion 21 . In addition, the air pressure of the hot air that the drying nozzle 22 blows onto the application portion T and the non-application portion H can be adjusted with a simple configuration.
 なお、本実施形態では、風圧調節手段3が複数の開口31であり、共通の供給部から熱風が供給される複数の開口31のうち、塗布部Tに向けて熱風を吹き出す開口31aの面積よりも非塗布部Hに向けて熱風を吹き出す開口31bの面積の方を小さくすることにより、基材Wに吹き付ける熱風の風圧を調節する例について説明したが、これに限られない。たとえば、各々の開口31をそれぞれ異なる図示しない供給部と接続し、各々の開口31ごとに供給する熱風の量を調節するような構成としてもよい。これにより、開口31の面積の大きさを変更することなく、基材Wに吹き付ける熱風の風圧を調節することができる。 In this embodiment, the wind pressure adjusting means 3 is a plurality of openings 31, and among the plurality of openings 31 to which hot air is supplied from a common supply section, the area of the opening 31a through which the hot air is blown toward the application section T Although an example in which the air pressure of the hot air blown onto the substrate W is adjusted by reducing the area of the opening 31b through which the hot air is blown toward the non-application portion H has been described, the present invention is not limited to this. For example, each opening 31 may be connected to a different supply unit (not shown) to adjust the amount of hot air supplied to each opening 31 . As a result, the air pressure of the hot air blown onto the substrate W can be adjusted without changing the size of the area of the opening 31 .
 また、風圧調節手段3は、図示しないスリットでもよい。具体的には、スリットは、プレート27またはプレート27の近傍に基材Wの幅方向に広く形成され、塗布部Tに向けて熱風を吹き出す部分よりも非塗布部Hに向けて熱風を吹き出す部分の方が基材Wの搬送方向に狭く形成されている。これにより、塗布部Tに吹き出される熱風の風圧よりも非塗布部Hに向けて吹き出す熱風の風圧の方が小さくなるよう調節することができる。 Also, the wind pressure adjusting means 3 may be a slit (not shown). Specifically, the slit is formed on the plate 27 or in the vicinity of the plate 27 to be wider in the width direction of the base material W, and the portion blows hot air toward the non-coating portion H than the portion blowing hot air toward the coating portion T. is formed narrower in the conveying direction of the substrate W. As a result, the air pressure of the hot air blown toward the non-application portion H can be adjusted to be smaller than the air pressure of the hot air blown toward the application portion T. FIG.
 以上、本発明の実施形態について図面を参照しながら詳述したが、各実施形態における構成およびそれらの組み合わせ等は一例であり、本発明の趣旨から逸脱しない範囲内で、構成の追加、省略、置換、およびその他の変更が可能である。たとえば、上記実施形態では、基材Wの両面にストライプ状の塗膜Mを形成する例について説明したが、用途に応じて第1の塗布機構12と第2の塗布機構13のどちらか一方により基材Wの片面に塗膜Mを形成してもよい。すなわち、塗工装置1は第1の塗布機構12または第2の塗布機構のどちらか一方を有している構成としてもよい。 As described above, the embodiments of the present invention have been described in detail with reference to the drawings, but the configurations and combinations thereof in each embodiment are examples, and additions, omissions, Substitutions and other modifications are possible. For example, in the above-described embodiment, an example in which the striped coating film M is formed on both sides of the substrate W has been described. A coating film M may be formed on one side of the substrate W. That is, the coating device 1 may be configured to have either the first coating mechanism 12 or the second coating mechanism.
 また、上記実施形態では、基材Wの両面に対して熱風を吹き付けて塗膜Mを乾燥させる例について説明したが、塗膜Mが形成された基材Wの面とその裏面のどちらか一方に熱風を吹き付けて塗膜Mを乾燥させてもよい。すなわち、乾燥装置2は乾燥ノズル22を基材Wの表面側と裏面側のどちらか一方に配置する構成としてもよい。 Further, in the above embodiment, an example in which the coating film M is dried by blowing hot air onto both surfaces of the base material W has been described. The coating film M may be dried by blowing hot air on the . That is, the drying apparatus 2 may be configured such that the drying nozzle 22 is arranged on either the front surface side or the rear surface side of the substrate W. As shown in FIG.
 また、図2および図7では、開口31を円形で表しているがこれに限られない。 Also, in FIGS. 2 and 7, the opening 31 is represented by a circle, but it is not limited to this.
 また、塗工装置1を構成する各部の数や配置は、図1に示すものに限られない。たとえば、搬送ロール11cをさらに設け、基材Wに所望の張力を付与できるような位置に各々の搬送ロール11cを配置してもよい。 Also, the number and arrangement of the parts constituting the coating device 1 are not limited to those shown in FIG. For example, further transport rolls 11c may be provided, and each transport roll 11c may be arranged at a position where a desired tension can be applied to the base material W.
 また、上記実施形態では基材Wの両面において同じ位置に同じ幅の塗膜Mが形成された例を示しているが、必ずしも基材Wの両面に形成される塗膜Mの位置、幅が同じでなくても構わない。 Further, in the above-described embodiment, an example in which the coating films M having the same width are formed at the same positions on both sides of the substrate W is shown, but the positions and widths of the coating films M formed on both sides of the substrate W are not always the same. It does not matter if they are not the same.
 また、上記実施形態では、エッジ誘導部の説明において複数のニップロール41によって基材Wの両端部を挟持する例について説明したが、これに限られない。たとえば、基材Wの表面側と接触するロールおよび裏面側と接触するロールが互いに交互に配置されていてもよい。これらロールは、筐体部21内で基材Wの幅方向端部の近傍に接触しているため、基材Wの端部の搬送経路を規定した状態で基材Wに形成された塗膜Mを乾燥させることができる。これにより、基材Wの振動を抑制することができる。また、基材Wが、位置ずれしてロールから外れてしまっても、基材Wを挟持する場合と比較して容易にもとの位置に戻すことができる。 In addition, in the above embodiment, an example in which both ends of the base material W are nipped by a plurality of nip rolls 41 has been described in the description of the edge guiding portion, but the present invention is not limited to this. For example, rolls in contact with the front side of the base material W and rolls in contact with the back side of the base material W may be alternately arranged. Since these rolls are in contact with the vicinity of the width direction end of the base material W within the housing part 21, the coating film formed on the base material W in a state in which the conveying path of the end part of the base material W is defined. M can be dried. Thereby, the vibration of the base material W can be suppressed. Moreover, even if the substrate W is misaligned and comes off the rolls, it can be easily returned to its original position as compared with the case where the substrate W is clamped.
 また、上記実施形態では、図2および図7に示すように乾燥ノズル22に設けられた開口31が、基材Wの幅方向における寸法の範囲を越えないように配列しているが、基材Wの幅方向における寸法の範囲を越えて配列してもよい。これにより、乾燥ノズル22により基材Wに対して吹き付ける熱風の風圧を基材Wの幅方向における寸法を越える範囲からも調節できるため、基材Wが振動することをより抑制することができる。 2 and 7, the openings 31 provided in the drying nozzle 22 are arranged so as not to exceed the range of dimensions in the width direction of the base material W. They may be arranged beyond the range of dimensions in the width direction of W. As a result, the wind pressure of the hot air blown onto the base material W by the drying nozzle 22 can be adjusted from a range exceeding the dimension in the width direction of the base material W, so that the vibration of the base material W can be further suppressed.
 1 塗工装置
 11 搬送機構
 11a 巻出ロール
 11b 巻取ロール
 11c 搬送ロール
 11d 塗布ロール
 12 第1の塗布機構
 13 第2の塗布機構
 14 マニホールド
 15 スリット
 16 吐出口
 17 タンク
 18 供給路
 2 乾燥装置
 21 筐体部
 22 乾燥ノズル
 22a 下側乾燥ノズル
 22b 上側乾燥ノズル
 23 吹き出し部
 24 空洞部
 25 吸引機構
 26 空洞部
 27 プレート
 28 排気口
 3 風圧調節手段
 31 開口
 31a 開口
 31b 開口
 4 エッジニップ部
 41 ニップロール
 W 基材
 M 塗膜
 T 塗布部
 H 非塗布部
1 Coating Device 11 Conveying Mechanism 11a Unwinding Roll 11b Winding Roll 11c Conveying Roll 11d Coating Roll 12 First Coating Mechanism 13 Second Coating Mechanism 14 Manifold 15 Slit 16 Discharge Port 17 Tank 18 Supply Path 2 Drying Device 21 Case Body Part 22 Drying Nozzle 22a Lower Drying Nozzle 22b Upper Drying Nozzle 23 Blowing Part 24 Cavity 25 Suction Mechanism 26 Cavity 27 Plate 28 Exhaust Port 3 Wind Pressure Adjusting Means 31 Opening 31a Opening 31b Opening 4 Edge Nip Part 41 Nip Roll W Substrate M Coating film T Coated part H Non-coated part

Claims (6)

  1.  基材をロールツーロール搬送する搬送経路上に設けられ、基材に形成された塗膜を乾燥させる乾燥装置であって、
     基材の所定面には、塗膜が形成された複数の塗布部と、複数の前記塗布部の間に塗膜が形成されていない非塗布部を有するよう基材の幅方向にストライプ状に塗膜が形成されており、
     基材の前記所定面または/および基材の前記所定面の裏面に対して気体を吹き付けて前記塗膜を乾燥させる乾燥ノズルを有し、
     前記乾燥ノズルは、前記塗布部と対向する位置における風圧よりも前記非塗布部と対向する位置における風圧の方が小さくなるよう調節する風圧調節手段を有していることを特徴とする乾燥装置。
    A drying device provided on a transport path for transporting a base material roll-to-roll and drying a coating film formed on the base material,
    A predetermined surface of the base material is striped in the width direction of the base material so as to have a plurality of coated parts on which a coating film is formed and a non-coated part on which no coating film is formed between the plurality of the coated parts. A coating film is formed,
    a drying nozzle for drying the coating film by blowing gas against the predetermined surface of the substrate and/or the back surface of the predetermined surface of the substrate;
    A drying apparatus, wherein the drying nozzle has air pressure adjusting means for adjusting the air pressure at a position facing the non-application portion to be smaller than the air pressure at a position facing the application portion.
  2.  前記乾燥ノズルは、気体を吹き出す吹き出し部を有しており、
     前記風圧調節手段は、前記吹き出し部により吹き付けられる気体を吸引するための複数の開口であって、
     複数の前記開口は、基材の幅方向に配列され、共通の吸引手段から吸引力を各々の開口から発生させ、
     複数の前記開口のうち、前記塗布部と対向する前記開口の面積よりも前記非塗布部と対向する前記開口の面積の方が大きいことを特徴とする請求項1に記載の乾燥装置。
    The drying nozzle has a blowing part for blowing gas,
    The wind pressure adjusting means is a plurality of openings for sucking the gas blown by the blowing part,
    The plurality of openings are arranged in the width direction of the substrate, and a common suction means generates a suction force from each opening,
    2. The drying apparatus according to claim 1, wherein, among the plurality of openings, an area of the opening facing the non-coating portion is larger than an area of the opening facing the coating portion.
  3.  前記風圧調節手段は、前記乾燥ノズルから気体を吹き出すための複数の開口であって、
     複数の前記開口は、基材の幅方向に配列され、共通の供給部から供給された気体を各々の前記開口から吹き出し、
     複数の前記開口のうち、前記塗布部に気体を吹き出す前記開口の面積よりも前記非塗布部に気体を吹き出す前記開口の面積の方が小さいことを特徴とする請求項1に記載の乾燥装置。
    The wind pressure adjusting means is a plurality of openings for blowing gas from the drying nozzle,
    The plurality of openings are arranged in the width direction of the substrate, and the gas supplied from a common supply unit is blown out from each of the openings,
    2. The drying apparatus according to claim 1, wherein, among the plurality of openings, the area of the openings for blowing gas to the non-coating portion is smaller than the area of the openings for blowing gas to the coating portion.
  4.  複数の前記開口が、前記乾燥ノズルを形成するプレートに形成されており、
     複数パターンの前記プレートが交換可能であることを特徴とする請求項2若しくは請求項3のいずれかに記載の乾燥装置。
    a plurality of said openings formed in a plate forming said drying nozzle;
    4. The drying apparatus according to claim 2, wherein said plates of a plurality of patterns are replaceable.
  5.  ストライプ状の塗膜が基材の両面に形成されていることを特徴とする請求項1から請求項4のいずれかに記載の乾燥装置。 The drying apparatus according to any one of claims 1 to 4, characterized in that striped coating films are formed on both sides of the substrate.
  6.  基材の幅方向端部と接触し、基材の前記端部の搬送経路を規定するエッジ誘導部を有していることを特徴とする請求項1から請求項5のいずれかに記載の乾燥装置。 6. The dryer according to any one of claims 1 to 5, further comprising an edge guiding portion that contacts the widthwise end of the base material and defines a conveying path of the end of the base material. Device.
PCT/JP2022/004366 2021-09-10 2022-02-04 Drying device WO2023037574A1 (en)

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Citations (7)

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Publication number Priority date Publication date Assignee Title
JP2003272612A (en) * 2002-03-18 2003-09-26 Tdk Corp Drying device for manufacturing of battery electrode and manufacturing method of battery electrode
JP2010225467A (en) * 2009-03-24 2010-10-07 Toyota Motor Corp Drying device of strip body
JP2012198012A (en) * 2011-03-10 2012-10-18 Toray Ind Inc Coating film drying apparatus and drying method
JP2014100622A (en) * 2012-11-16 2014-06-05 Nitto Kogyo:Kk Dust collector
JP2019147370A (en) * 2018-02-27 2019-09-05 株式会社リコー Gas blow-out device, dryer, liquid discharge device, and process liquid providing device
JP2019166425A (en) * 2018-03-22 2019-10-03 東レエンジニアリング株式会社 Application device
JP2020180765A (en) * 2019-04-26 2020-11-05 芝浦機械株式会社 Air knife

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003272612A (en) * 2002-03-18 2003-09-26 Tdk Corp Drying device for manufacturing of battery electrode and manufacturing method of battery electrode
JP2010225467A (en) * 2009-03-24 2010-10-07 Toyota Motor Corp Drying device of strip body
JP2012198012A (en) * 2011-03-10 2012-10-18 Toray Ind Inc Coating film drying apparatus and drying method
JP2014100622A (en) * 2012-11-16 2014-06-05 Nitto Kogyo:Kk Dust collector
JP2019147370A (en) * 2018-02-27 2019-09-05 株式会社リコー Gas blow-out device, dryer, liquid discharge device, and process liquid providing device
JP2019166425A (en) * 2018-03-22 2019-10-03 東レエンジニアリング株式会社 Application device
JP2020180765A (en) * 2019-04-26 2020-11-05 芝浦機械株式会社 Air knife

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