WO2023032122A1 - 表示装置 - Google Patents
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- WO2023032122A1 WO2023032122A1 PCT/JP2021/032290 JP2021032290W WO2023032122A1 WO 2023032122 A1 WO2023032122 A1 WO 2023032122A1 JP 2021032290 W JP2021032290 W JP 2021032290W WO 2023032122 A1 WO2023032122 A1 WO 2023032122A1
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Images
Classifications
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
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- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
Definitions
- the present invention relates to display devices.
- a display device has been developed in which an imaging unit is provided behind the display surface.
- US 2004/0020000 discloses a plurality of display elements configured to emit light to provide a display, an aperture layer positioned below the plurality of display elements, and a collimator positioned below the aperture layer.
- a configuration is disclosed having a layer and a plurality of photodetector elements positioned below the collimator layer.
- a plurality of wirings and a plurality of electrodes are provided in the display layer provided with the plurality of display elements of Patent Document 1.
- common electrodes, pixel electrodes, electrodes of transistors, wirings between pixel electrodes and transistors, source signal lines, gate signal lines, and power lines are provided. Most or all of these are formed from light shielding conductors. Light-shielding wires and electrodes cause the light to diffract according to its wavelength, creating an interference pattern.
- a captured image on which such an interference pattern is superimposed contains bleeding and periodic noise, and is of low quality.
- An object of one aspect of the present disclosure is to improve the quality of a captured image in a display device in which an imaging unit is provided behind the display surface.
- a display device includes a first layer that includes an image sensor, and a second layer that is positioned above the first layer and includes a light guide element that guides incident light from above to the image sensor below. and a third layer located above the second layer and including a pixel electrode and a pixel circuit connected to the pixel electrode to control the potential of the pixel electrode.
- the display device may have a configuration in which the pixel electrode is a reflective electrode that reflects light.
- the pixel circuit may include wiring or electrodes that reflect or absorb light.
- the display device according to the present disclosure may be configured such that the upper surface of the second layer is in contact with the third layer.
- the third layer has a first region and a second region in which the plurality of pixel circuits and the plurality of pixel electrodes are arranged, respectively, and the pixel circuits in the first region is lower than the density of the pixel circuits in the second region, and the imaging device and the light guide device are arranged so as to overlap the first region in plan view from above, good.
- the light guide element is arranged at a position that does not overlap the plurality of pixel circuits and the plurality of pixel electrodes in the first region when viewed from above. you can
- the display device has a plurality of light guide elements, and the second layer is further disposed between each of the plurality of light guide elements to absorb or reflect light incident from the light guide elements.
- the configuration may include a boundary portion.
- the display device may be configured such that the boundary portion is made of a transparent material having a higher refractive index than the light guide element, or a light shielding material that absorbs or reflects light.
- the third layer may further include a plurality of wirings that absorb or reflect light, and the wirings in the first region may overlap the boundary portion.
- the third layer further includes a plurality of wirings that absorb or reflect light, and the boundary portion overlaps at least part of the wirings in the first region, good.
- the display device according to the present disclosure may be configured such that the boundary portion overlaps all of the wirings in the first region.
- the distance between two adjacent pixel circuits among the plurality of pixel circuits in the first region is the same as that of the conductor arranged between the two pixel circuits.
- the configuration may be larger than 10 times the diameter of the optical element.
- the second layer further includes a light-shielding region, and the light-shielding region includes the plurality of pixel circuits and the plurality of pixel electrodes in the first region when viewed from above. and absorb or reflect light incident from above.
- the light-shielding region may be arranged at a position overlapping all the pixel circuits and all the pixel electrodes in the first region in plan view from above. good.
- the display device may have a configuration in which the light shielding region is arranged at a position overlapping the second region in plan view from above.
- the light shielding area may be made of a light shielding material that absorbs or reflects light.
- the display device may have a configuration in which the boundary portion is made of the same light-shielding material as the light-shielding region.
- the boundary portion is made of a transparent material having a higher refractive index than the light guide element, and the light shielding region is formed by covering the upper surface of the transparent material with the light shielding material. It may be a configuration with
- the display device may be configured such that the boundary portion is further disposed between the light shielding region and the light guide element.
- the display device may have a configuration in which there are a plurality of light shielding regions, and only one light guide element is provided between two light shielding regions adjacent to each other.
- the display device may have a plurality of light shielding regions, and two or more light guide elements may be provided between two light shielding regions adjacent to each other.
- the light shielding regions may be arranged according to the same arrangement pattern as the pixel circuits.
- the light shielding regions may be arranged according to the same arrangement pattern as the imaging elements.
- the third layer may include a self-luminous element including the pixel electrode, a common electrode, and an electroluminescence layer between the pixel electrode and the common electrode. .
- the third layer may further contain liquid crystal.
- the display device may have a configuration in which the first layer includes a camera or an image sensor provided with a plurality of the imaging elements.
- an object is to improve the quality of a captured image.
- FIG. 1 is a plan view showing an example of a schematic configuration of a display device according to an embodiment of the present disclosure
- FIG. 2 is a partial cross-sectional view showing an example of a schematic configuration of the display device shown in FIG. 1
- FIG. 3 is a partial plan view showing an example of the vicinity of a boundary between a first area and a second area in the display layer shown in FIG. 2
- FIG. 10 is a partial cross-sectional view showing transmitted light in a display device of a comparative example having no light guide layer between the imaging layer and the display layer
- FIG. 4 is a partial cross-sectional view showing transmitted light in a display according to an embodiment of the present disclosure with a light guide layer between the imaging layer and the display layer;
- FIG. 1 is a plan view showing an example of a schematic configuration of a display device according to an embodiment of the present disclosure
- FIG. 2 is a partial cross-sectional view showing an example of a schematic configuration of the display device shown in FIG. 1
- FIG. 3 is
- FIG. 3 is a partial plan view showing a preferred example of a light guide layer corresponding to the light shielding pattern shown in FIG. 2; 6 is a partial plan view showing the boundary portion shown in FIG. 5 superimposed on the light shielding pattern shown in FIG. 2;
- FIG. 6 is a partial plan view showing an example of a configuration in which an additional boundary portion is provided in addition to the boundary portion shown in FIG. 5, superimposed on the light shielding pattern shown in FIG. 2;
- FIG. 3 is a partial plan view showing another preferred example of a light guide layer corresponding to the light shielding pattern shown in FIG. 2;
- FIG. 9 is a partial plan view showing the boundary portion shown in FIG. 8 superimposed on the light shielding pattern shown in FIG. 2;
- FIG. 10 is a partial plan view showing the vicinity of the boundary between the first area and the second area in the modification of the display layer shown in FIG. 1;
- FIG. 11 is a partial plan view showing a preferred example of a light guide layer corresponding to the light shielding pattern shown in FIG. 10;
- 12 is a partial plan view showing the boundary portion shown in FIG. 11 superimposed on the light shielding pattern shown in FIG. 10;
- FIG. FIG. 4 is a partial cross-sectional view showing an example of a schematic configuration of a display device according to another embodiment of the present disclosure;
- FIG. 14 is a partial plan view showing a first region in the display layer shown in FIG. 13;
- FIG. 4 is a partial cross-sectional view showing an example of a schematic configuration of a display device according to another embodiment of the present disclosure;
- FIG. 1 is a plan view showing an example of a schematic configuration of a display device 100 of Embodiment 1.
- FIG. 1 is a plan view showing an example of a schematic configuration of a display device 100 of Embodiment 1.
- the display device 100 includes a display area DA in which the display pixels DP are provided and a frame area NA in which the display pixels DP are not provided.
- the frame area NA surrounds the display area DA.
- the display area DA includes a low-density area (first area) LA behind which an imaging element is provided and a high-density area (second area) HA behind which no imaging element is provided.
- the display pixels DP are thinned out so that the pixel density is lower than that in the high-density area HA.
- An imaging layer 1 such as a camera including an imaging element or an image sensor is provided on the back surface of the display device 100 so as to overlap the low-density area LA in plan view.
- FIG. 1 shows an example in which the low-density area LA is provided in the central portion of the display device 100, the present invention is not limited to this. It may be provided near, that is, near the edge of the display area DA.
- the low-density area LA is provided in a square shape
- the shape of the low-density area LA is not limited to this, and the shape of the low-density area LA may be, for example, a circle. It may have a shape, an elliptical shape, or the like, and the shape can be determined as appropriate.
- a display area DA of the display device 1 is provided with a plurality of display pixels DP.
- Each display pixel DP includes a green sub-display pixel DPg and a red sub-display pixel DPr, or a green sub-display pixel. It includes DPg and a blue sub-display pixel DPb (see FIG. 3).
- the case where one display pixel DP is composed of two sub-display pixels will be described as an example, but the present invention is not limited to this.
- one display pixel DP may be composed of three or more sub-display pixels such as a red sub-display pixel, a green sub-display pixel and a blue sub-display pixel, or may be composed of only one sub-pixel.
- Each sub-display pixel includes one pixel circuit PC and one or more self-luminous elements ES.
- the pixel circuit PC controls light emission of the corresponding self-luminous element ES.
- the number and distribution of sub-display pixels correspond to the number and distribution of display pixels DP. Therefore, the density of sub-display pixels, pixel circuits PC and self-luminous elements ES in low-density area LA is smaller than the density of sub-display pixels, pixel circuits PC and self-luminous elements ES in high-density area HA.
- the display device 100 may include, for example, the source drive circuit SD at the x-direction end of the frame area NA, and the gate drive circuit GD at the y-direction end of the frame area NA.
- a plurality of wirings (not shown) connected to each of the plurality of display pixels DP are provided from each of the source drive circuit SD and the gate drive circuit GD.
- the direction orthogonal to the display surface of the display device 100 is the z direction
- the plane parallel to the display surface is the xy plane.
- FIG. 2 is a partial cross-sectional view showing an example of a schematic configuration of the low-density area LA of the display device 100 shown in FIG.
- the display device 100 includes an imaging layer 1 (first layer) including imaging pixels IP (imaging elements) and a layer above the imaging layer 1 (right side in FIG. 1). 1), and a light guide layer 2 (second layer) including light guide elements 22 that guide light incident from below (left side in FIG. 1) to imaging pixels IP, and a layer above the light guide layer 2 (see FIG. 1). 1) and includes a display layer 3 (third layer) including display pixels DP.
- the display pixel DP includes a pixel circuit PC and a self-luminous element ES having a pixel electrode 52, as will be described later.
- light means light in the wavelength region used for imaging by the imaging layer 1, unless stated otherwise.
- Light in the present disclosure means, for example, infrared when the imaging layer 1 includes an infrared camera or infrared image sensor, and visible light when the imaging layer 1 includes a visible light camera or visible light image sensor.
- shielding and “shading” mean at least one of absorbing and reflecting light, unless stated otherwise.
- the lower surface 1a and upper surface 1b of the imaging layer 1, the lower surface 2a and upper surface 2b of the light guide layer 2, and the lower surface 3a and upper surface 3b of the display layer 3 are parallel to each other.
- the upper surface 1b of the imaging layer 1 is separated from the light guide layer 2 so that no mechanical load is applied to the imaging layer 1 and the position of the imaging layer 1 can be adjusted for adjustment of the optical system. is preferred.
- the upper surface 2b of the light guide layer 2 is preferably close to the display layer 3, and particularly preferably in contact with it.
- the imaging layer 1 is provided with a plurality of imaging pixels IP on the upper surface 1b, and is configured to acquire an image based on light incident on the imaging pixels IP.
- the imaging pixels IP are arranged so as to overlap with the low-density area LA in plan view in the z-direction so that sufficient light is incident on the imaging pixels IP.
- the imaging layer 1 may include, for example, cameras such as a far-infrared camera, a near-infrared camera, and a visible light camera, or image sensors such as a finger vein authentication sensor and a retina sensor.
- the light guide layer 2 includes a plurality of light guide elements 22 .
- the light guide element 22 is arranged so as to overlap with the low-density area LA in plan view in the z-direction so that sufficient light enters the imaging pixel IP.
- the light guide elements 22 are arranged at positions in the low-density area LA that do not overlap the display pixels DP when viewed from above in the z direction.
- an aperture area Q an area in which the pixel circuit PC of the display pixel DP and the pixel electrode 52 are not provided in the low-density area LA.
- the light guide element 22 is arranged so that the light guide element 22 overlaps the opening region Q.
- the light guide element 22 is made of a transparent material so as to guide downward the light incident on the light guide element 22 from above.
- Transparent materials include, for example, organic materials such as polyimide and acrylic, and inorganic materials such as silicon oxide, silicon nitride, and silicon oxynitride films, and alumina.
- the light guide layer 2 further includes a plurality of light shielding regions 24.
- the light shielding area 24 is the display pixel DP (the pixel circuit PC and the pixel electrode 52 thereof) in the low density area LA when viewed from above in the z direction. It is arranged in a position overlapping with .
- a region in which the pixel circuits PC of the display pixels DP and the pixel electrodes 52 are provided in the low-density region LA will be referred to as a pixel region R.
- the light shielding region 24 is arranged so that the light shielding region 24 overlaps the pixel region R.
- the light shielding region 24 may also be arranged in a portion of the aperture region Q where light is likely to be diffracted, such as a portion where signal wirings are densely packed.
- the light shielding area 24 is made of a light shielding material including a light reflecting material and a light absorbing material so as to shield light incident on the light shielding area 24 from above.
- the light reflective material may be a metal material that reflects light and is used for reflective electrodes and wiring, such as silver (Ag) alloy, aluminum (Al), tungsten (W), molybdenum (Mo), tantalum (Ta ), chromium (Cr), titanium (Ti), copper (Cu), and the like.
- Light absorbing materials absorb light and include, for example, carbon, silicon, and the like.
- the light guide layer 2 further includes boundary portions 26 arranged between each of the light guide elements 22 .
- the boundary portion 26 is made of a transparent material or a light shielding material having a higher refractive index than the light guide element 22 so as to absorb or reflect the light incident on the boundary portion 26 from the light guide element 22 .
- the boundary portion 26 may further be arranged between the light guide element 22 and the light shielding region 24, or may be arranged so as to surround the entire light guide element 22 and the light shielding region 24 in plan view.
- the light shielding area 24 and the boundary portion 26 may be integrally formed.
- the light shielding region 24 and the boundary portion 26 may be formed simultaneously from the same light shielding material.
- the boundary portion 26 is formed of a transparent material having a higher refractive index than the light guide element 22
- the light shielding region 24 may be formed by covering the upper surface of the transparent material with a light shielding material.
- the light guide element 22 functions like an optical fiber that guides the light incident on the upper surface 2b to the lower surface 2a. Diffraction and interference while the light passes through the light guide layer 2 is thus reduced.
- the imaging pixel IP overlaps the low-density area LA
- the light guide element 22 overlaps the aperture area Q
- the light-shielding area 24 overlaps the pixel area R
- the aperture area Q is displayed in the low-density area LA.
- the pixel area R is an area where the pixels DP are not provided
- the pixel area R is an area where the display pixels DP are provided in the low-density area LA. Therefore, the light that has passed through the light guide element 22 is incident on the imaging element IP that overlaps the opening region Q. As shown in FIG. On the other hand, since the image sensor IP overlapping the pixel region R is shielded by the light shielding region 24, no light is incident thereon.
- the display layer 3 is provided with display pixels DP so as to display an image on the upper surface 3b, and has a low density area LA and a high density area HA.
- display pixels DP are arranged at a density equivalent to that of a display area of a normal display device that does not include an imaging layer.
- the display pixels DP are arranged at a density lower than that in the high-density area HA so that a sufficient amount of light is incident on the imaging pixels IP. Therefore, the density of the pixel circuits PC and the pixel electrodes 52 in the low density area LA is lower than the density of the pixel circuits PC and the pixel electrodes 52 in the high density area HA.
- the display layer 3 has a lower film 10, a barrier layer 12, a thin film transistor layer 4, a light emitting element layer 5, a sealing layer 6, and an upper film 14 in this order from the lower surface 3a to the upper surface 3b.
- the lower film 10 and the upper film 14 are layers that are translucent and prevent the thin film transistor layer 4 and the light emitting element layer 5 from being mechanically damaged.
- the barrier layer 12 and the sealing layer 6 are layers that are translucent and prevent foreign substances such as water and oxygen from entering the thin film transistor layer 4 and the light emitting element layer 5 .
- the thin film transistor layer 4 is a laminate including a light-shielding conductive layer 41 , a light-shielding semiconductor layer 42 , and a translucent insulating layer 43 .
- the conductive layer 41 is, for example, a single layer of metal containing at least one of aluminum (Al), tungsten (W), molybdenum (Mo), tantalum (Ta), chromium (Cr), titanium (Ti), and copper (Cu). It is composed of a layered film or laminated film.
- the semiconductor layer 42 is composed of an oxide semiconductor such as amorphous silicon (a-Si), low-temperature polysilicon (LTPS), or an InGaZnO-based oxide semiconductor.
- the thin film transistor layer 4 forms the pixel circuit PC (see FIG. 2).
- the light-emitting element layer 5 includes a plurality of pixel electrodes 52 , a common electrode 54 facing the plurality of pixel electrodes 52 , and an electroluminescence layer 53 between the pixel electrodes 52 and the common electrode 54 .
- the pixel electrode 52 is a reflective electrode that reflects light, and is composed of a reflective conductive layer.
- the pixel electrode 52 is made of metal including at least one of aluminum (Al), tungsten (W), molybdenum (Mo), tantalum (Ta), chromium (Cr), titanium (Ti), and copper (Cu). It is composed of a layered film or laminated film.
- the pixel electrodes 52 are connected to corresponding pixel circuits PC.
- the common electrode 54 is composed of a translucent conductive layer, for example, composed of a transparent metal oxide such as ITO (Indium Tin Oxide) or IZO (Indium Zincum Oxide).
- the pixel electrode 52 may be either an anode or a cathode of the self-luminous element ES.
- the common electrode 54 is the cathode of the self-luminous element ES when the pixel electrode 52 is the anode of the self-luminous element ES, and the anode of the self-luminous element ES when the pixel electrode 52 is the cathode of the self-luminous element ES. .
- the pixel circuit PC is connected to the corresponding pixel electrode 52 and controls the potential of the connected pixel electrode 52 . Thereby, the pixel circuit PC controls light emission of the corresponding self-luminous element ES.
- the electroluminescence layer 53 includes at least a light-emitting layer containing an inorganic light-emitting material such as an organic light-emitting material or quantum dots. Electroluminescent layer 53 may optionally include additional layers such as charge injection layers, charge transport layers, charge generating layers, and charge blocking layers.
- the pixel electrode 52, the common electrode 54, and the electroluminescence layer 53 form the self-luminous element ES included in the display pixel DP.
- the self-luminous element ES may be an organic light emitting diode (OLED) or a quantum dot light emitting diode (QLED).
- FIG. 3 is a partial plan view showing an example of the display layer 3 near the boundary between the low density area LA and the high density area HA.
- FIG. 3 shows only the conductive layer 41, the semiconductor layer 42 and the pixel electrode 52 and omits other components to facilitate understanding of the present disclosure.
- the display pixels DP are arranged in a pentile arrangement.
- Half of the display pixels DP are made up of combinations of green sub-display pixels DPg and red sub-display pixels DPr, and the other half of display pixels DP are made up of combinations of green sub-display pixels DPg and blue sub-display pixels DPb.
- the display pixels DP are not limited to this, and may be arranged according to other arrangement patterns such as a delta arrangement and a stripe arrangement.
- the density of display pixels DP in the low-density area LA is smaller than the density of display pixels DP in the high-density area HA.
- the density of the display pixels DP in the low density area LA is 1 ⁇ 4 of the density of the display pixels DP in the high density area HA.
- the conductive layer 41 includes wiring 41x extending along the x direction and wiring 41y extending along the y direction.
- the wiring corresponding to the low density area LA among the wirings 41x and 41y extends over the low density area LA and the high density area HA.
- the wiring 41x includes, for example, a source signal line that supplies a signal based on image data from the source drive circuit SD to each sub-display pixel, and a power line that supplies power supply voltage to each sub-display pixel.
- the wiring 41y includes, for example, a gate signal line that supplies a gate signal for controlling writing to each sub-display pixel from the gate drive circuit GD, a light emission signal line that supplies a light emission signal for controlling light emission of each sub-display pixel, and a It includes a refresh potential line for supplying a refresh potential to each sub-display pixel.
- the conductive layer 41 further includes a wiring 41p in the pixel region R.
- the wiring 41p is a gate electrode, a source electrode, and a drain electrode of a transistor included in the pixel circuit PC, a wiring connecting the transistor and the wirings 41x and 41y, a wiring connecting the transistors, and the transistor and the pixel electrode 52. Including wiring etc. connecting between
- the semiconductor layer 42 includes, in the pixel region R, channel layers of transistors included in the pixel circuit PC, wirings connecting the transistors, and the like.
- the pixel electrode 52 includes a red pixel electrode 52r formed in the red sub-display pixel DPr, a green pixel electrode 52g formed in the green sub-display pixel DPg, and a blue pixel electrode 52b formed in the blue sub-display pixel DPb. include.
- the conductive layer 41, the semiconductor layer 42, and the pixel electrode 52 form a light shielding pattern in the display layer 3 as shown in FIG.
- Most of the light shielding pattern is the pixel circuit PC and the pixel electrode 52 and is located in the pixel region R.
- Other parts of the light-shielding pattern are wires connected to the pixel circuits PC, such as the wires 41x and 41y, and are located in both the pixel region R and the aperture region Q.
- FIG. 4 is a partial cross-sectional view showing transmitted light L2 in a display device 1100 of a comparative example having no light guide layer 2 between the imaging layer 1 and the display layer 3.
- FIG. The incident light L1 shown in FIG. 4 is parallel light whose optical axis is parallel to the z direction.
- the captured image of the imaging layer 1 is an image captured without the display layer 3 and the light guide layer 2 (hereinafter referred to as the “original captured image”), and the interference pattern due to the display layer 3 is superimposed. becomes an image.
- a captured image on which such an interference pattern is superimposed contains bleeding and periodic noise, and is of low quality.
- the digital filter processing for removing such interference patterns degrades the quality of captured images.
- FIG. 5 is a partial cross-sectional view showing transmitted light L3 in the display device 100 according to this embodiment having the light guide layer 2 between the imaging layer 1 and the display layer 3.
- FIG. The incident light L1 shown in FIG. 5 is parallel light whose optical axis is parallel to the z direction.
- the incident light L1 is transmitted through the display layer 3, it is partially shielded by the light shielding pattern formed on the display layer 3 described above. Then, the remaining light that has reached the lower surface 3a of the display layer 3 becomes the transmitted light L3.
- the transmitted light L3 enters the light guide layer 2 from the lower surface 3a of the display layer 3.
- the light guide element 22 of the light guide layer 2 functions like an optical fiber and guides the transmitted light L3 to the imaging layer 1 as described above.
- the light shielding region 24 and the boundary portion 26 shield the transmitted light L3.
- the incident light L1 only the light that has entered the aperture region Q and the light guide element L3 can contribute to the captured image.
- the interference pattern due to the light shielding pattern in the aperture region Q is lighter than the interference pattern due to the light shielding pattern in the pixel region R.
- the light guide elements 22 act like optical fibers, light passing through different light guide elements 22 will not interfere with each other. Therefore, while the transmitted light L3 is passing through the light guide elements 22 of the light guide layer 2, the growth of the interference pattern is suppressed.
- the interference pattern affecting the captured image by the configuration shown in FIG. 5 is reduced more than the interference pattern affecting the captured image by the configuration shown in FIG.
- the captured image of the imaging layer 1 in the example shown in FIG. 5 is an image in which the reduced interference pattern is superimposed on the original captured image. Therefore, the captured image shown in FIG. 5 has less bleeding and periodic noise and has higher quality than the captured image shown in FIG.
- the light guide layer 2 can be mounted on the lower surface 3a of the display layer 3 in various ways.
- a light guide film suitable for the light guide layer 2 is manufactured by a known method, and then the light guide film is aligned with the conductive layer 41 and/or the pixel electrode 52 of the display layer 3 to form the display layer.
- the light guide film may be attached on the lower surface 3a of 3.
- the display layer 3 may be manufactured, and then the light guide layer 2 may be formed on the lower surface 3a of the display layer 3 by a method such as inkjet printing.
- the light guide layer 2 may be embedded in the display layer 3.
- the bottom film 10 and/or the barrier layer 12 may be formed so that the bottom film 10 and/or the barrier layer 12 work as the light guide layer 2 .
- an additional layer acting as the light guide layer 2 may be formed between the bottom film 10 and the thin film transistor layer 4 . This additional layer can be formed in a series of deposition steps that form the barrier layer 12 and the thin film transistor layer 4 .
- FIG. 6 is a partial plan view showing a suitable example of the light guide layer 2 corresponding to the light shielding pattern shown in FIG.
- FIG. 7 is a partial plan view showing the boundary portion 26 shown in FIG. 6 superimposed on the light shielding pattern shown in FIG.
- FIG. 8 is a partial plan view showing an example of a configuration in which an additional boundary portion 26 is provided in addition to the boundary portion 26 shown in FIG. 6, superimposed on the light shielding pattern shown in FIG.
- the light guide element 22 overlaps the opening region Q, and the light shielding region 24 overlaps the pixel region R.
- the light transmitted through the display pixel DP is blocked by the light blocking region 24 and does not reach the imaging pixel IP. Therefore, the influence of diffraction and interference by the display pixels DP on the imaging layer 1 is reduced.
- the light transmitted through the aperture region Q is guided by the light guide element 22 and reaches the imaging pixel IP. Therefore, the efficiency with which the imaging layer 1 utilizes the light transmitted through the opening region Q is high. In other words, a large effective aperture area of the imaging layer 1 can be obtained.
- both the display pixels DP and the light shielding regions 24 are arranged in a pentile arrangement. That is, the light shielding regions 24 are arranged according to the same arrangement pattern as the display pixels DP. For this reason, the light shielding region 24 and the light guide element 22 are efficiently arranged so that the light shielding region 24 overlaps the pixel region R having the display pixel DP and the light guide element 22 overlaps the opening region Q having no display pixel DP. can be placed. Since the light shielding regions 24 can be arranged efficiently with respect to the display pixels DP in this way, the effective aperture area of the imaging layer 1 can be increased. Further, it is preferable that the imaging element IP and the light guide element 22 are arranged so that the light guiding element 22 overlaps the imaging element IP.
- the boundary portion 26 overlaps at least part of the wirings 41x and 41y in the low density area LA. Therefore, the influence of diffraction and interference due to the wirings 41x and 41y to the imaging layer 1 is also reduced.
- the boundary portion 26 may be additionally formed so as to overlap more of the wirings 41x and 41y. It may be additionally formed so as to overlap all. The additional formation can further reduce the influence of the wirings 41x and 41y.
- the boundary portion 26 is small, the total area of the light guide elements 22 in the low density area LA, that is, the effective aperture area of the imaging layer 1 can be increased.
- two or more light guide elements 22 may be provided between the light shielding regions 24 adjacent to each other in the x direction or the y direction. In this case, since the opening diameter of the light guide element 22 is small, diffraction and interference inside the light guide element 22 can be reduced.
- the spacing between two adjacent display pixels DP is preferably greater than ten times the diameter of the light guide element 22 in order to sufficiently reduce diffraction and interference.
- FIG. 9 is a partial plan view showing another preferred example of the light guide layer 2 corresponding to the light shielding pattern shown in FIG.
- FIG. 10 is a partial plan view showing the boundary portion 26 shown in FIG. 9 superimposed on the light shielding pattern shown in FIG.
- the light guide element 22 overlaps the opening region Q and the light shielding region 24 overlaps the pixel region R, as in the example shown in FIGS.
- the display pixels DP are arranged according to the pentile arrangement, and the light shielding regions 24 are arranged according to the delta arrangement.
- a virtual triangle T having a vertex at the center of the pixel region R is assumed, the triangle T is spread over the low-density region LA, and each vertex and the center point of each side of the triangle T are the centers.
- the hexagons corresponding to the vertices of the triangle T are the light shielding regions 24, and the hexagons corresponding to the center points of the sides of the triangle T are the regions in which the light guide elements 22 are provided.
- Such a light guide layer 2 is useful for a configuration in which the imaging pixels IP of the imaging layer 1 are arranged according to a delta arrangement.
- the light-shielding regions 24 and the aperture regions Q follow the same arrangement pattern as the imaging pixels IP of the imaging layer 1 .
- the light shielding region 24 and the light guide element 22 can be efficiently arranged so that the imaging pixel IP overlaps the opening region Q (especially the light guide element 22). Since the light guide elements 22 can be arranged efficiently with respect to the imaging pixels IP in this manner, the effective aperture area of the imaging layer 1 can be increased. Further, it is preferable that the imaging element IP and the light guide element 22 are arranged so that the light guide element 22 overlaps the opening area Q. As shown in FIG.
- boundary portion 26 may be additionally formed in the same manner as described above.
- FIG. 11 is a partial plan view showing the vicinity of the boundary between the low density area LA and the high density area HA in the modified example of the display layer 3 shown in FIG.
- FIG. 11 shows only the conductive layer 41, the semiconductor layer 42 and the pixel electrode 52 and omits other components to facilitate understanding of the present disclosure.
- 12 is a partial plan view showing a preferred example of the light guide layer 2 corresponding to the light shielding pattern shown in FIG. 11.
- FIG. FIG. 13 is a partial plan view showing the boundary portion 26 shown in FIG. 12 superimposed on the light shielding pattern shown in FIG.
- the density of the display pixels DP in the low-density area LA of the display layer 3 may be even lower.
- the density of the display pixels DP in the low density area LA is 1/8 of the density of the display pixels DP in the high density area HA.
- the light guide element 22 is formed in an octagonal shape overlapping with the opening region Q, and the light shielding region 24 is formed in a rectangular shape overlapping with the pixel region R in plan view in the z direction. preferably formed. Additionally, a border 26 may be additionally formed, similar to that described above. Further, it is preferable that the imaging pixels IP are arranged so as to overlap the light guide elements 22 .
- FIG. 14 is a partial cross-sectional view showing an example of a schematic configuration of the display device 200 according to Embodiment 2 of the present disclosure.
- the display device 200 includes an imaging layer 1, a light guide layer 202, and a display layer 203.
- the display layer 203 according to the present embodiment is configured such that the density of the display pixels DP in the low-density area LA is equal to the density of the display pixels DP in the high-density area HA. It has the same configuration as the display layer 3 according to the first embodiment.
- the light guide layer 202 according to this embodiment has the same configuration as the light guide layer 2 according to the first embodiment described above, except that the light shielding region 24 is not provided.
- FIG. 15 is a partial plan view showing low density area LA in display layer 203 shown in FIG.
- FIG. 15 shows only the conductive layer 41, the semiconductor layer 42 and the pixel electrode 52 and omits other components to facilitate understanding of the present disclosure.
- the conductive layer 41, the semiconductor layer 42, and the pixel electrode 52 form a light-shielding pattern on the display layer 203 in plan view in the z-direction. Therefore, in order to reduce the effects of diffraction and interference, it is preferable that the opening diameter of the light guide element 22 is equal to or less than the wiring interval d in plan view in the z direction.
- the wiring interval d is, for example, the minimum distance between the wirings 41x or the minimum distance between the wirings 41y.
- FIG. 16 is a partial cross-sectional view showing an example of a schematic configuration of a display device 300 according to Embodiment 3 of the present disclosure.
- the display device 300 includes an imaging layer 1, a light guide layer 2, and a display layer 303.
- the display layer 303 includes, for example, a supporting substrate 310, a thin film transistor layer 4, a pixel electrode 52, an alignment film 306, a liquid crystal layer 307, and a common electrode 54 from the bottom surface 3a to the top surface 3b. , a polarizing layer 308, a color filter layer 309, and a counter substrate 312 in this order.
- the pixel circuit PC is connected to the corresponding pixel electrode 52 and controls the potential of the connected pixel electrode 52 .
- the orientation of the liquid crystal overlying each electrode is responsive to the electric field between each pixel electrode 52 and the common electrode 54 . With these, the pixel circuit PC controls the orientation of the liquid crystal above the corresponding pixel electrode.
- the support substrate 310 and the counter substrate 312 are respectively transparent substrates that transmit light and are rigid, non-flexible substrates.
- the support substrate 310 and the counter substrate 312 are, for example, glass substrates or quartz substrates.
- the alignment film 306 is a transparent layer that transmits light, and aligns the alignment of liquid crystals contained in the liquid crystal layer 306 .
- the alignment film 306 may be an organic alignment film obtained by subjecting an organic film to a labyrinth treatment, or may be an inorganic alignment film.
- the liquid crystal layer 307 contains liquid crystal and is sealed between the support substrate 310 and the counter substrate 312 .
- the liquid crystal layer 307 may include spacers (not shown).
- the polarizing layer 308 transmits light in a specific polarized state.
- the polarizing layer 308 may be of any configuration known, for example, as a polarizing plate or film.
- the color filter 309 may have any configuration known as a color filter.
- the color filter 309 includes, for example, a red transmission portion 309R that transmits only red light, a green transmission portion 309G that transmits only green light, and a blue transmission portion 309B that transmits only blue light.
- Red light is, for example, light in a wavelength band of more than 600 nm and less than or equal to 780 nm.
- green light is, for example, light in a wavelength band of more than 500 nm and less than or equal to 600 nm.
- blue light is light in a wavelength band of, for example, 400 nm or more and 500 nm or less.
- the color filter 309 preferably further includes a transparent region 309T arranged so as to overlap the aperture region Q.
- the red transmission portion 309R, the green transmission portion 309G, and the blue transmission portion 309B are arranged in the color filter 309 so as to correspond to the arrangement of red, green, and blue of the image sensor IP. It is also preferable to have
- the display layer 303 is not limited to the configuration shown in FIG. 16, and may have any configuration known as a reflective liquid crystal display.
- the display layer 303 may have a configuration in which the common electrode 54 is located on the same side as the pixel electrode 52 with respect to the liquid crystal layer 307 . That is, the display layer 303 may be of the so-called In-Plane-Swithing method or Advanced Fringe-Field-Swithing method.
- the configuration of the display device 300 according to this embodiment may be combined with the configuration of the display device 200 according to the second embodiment described above.
- the density of the display pixels DP in the low-density area LA is less than the density of the display pixels DP in the high-density area HA. It may be configured to be equivalent to density.
- the display device 300 according to this embodiment includes the light guide layer 202 according to the second embodiment instead of the light guide layer 2 according to the first embodiment.
- the display device 300 does not have to include the color filter 309 .
- the present invention is not limited to the above-described embodiments, but can be modified in various ways within the scope of the claims, and can be obtained by appropriately combining technical means disclosed in different embodiments. is also included in the technical scope of the present invention. Furthermore, new technical features can be formed by combining the technical means disclosed in each embodiment.
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Abstract
Description
(表示装置の平面構成)
図1は、実施形態1の表示装置100の概略構成の一例を示す平面図である。
図2は、図1に示した表示装置100の低密度領域LAにおける概略構成の一例を示す部分断面図である。
撮像層1は、上面1bに撮像画素IPが複数設けられており撮像画素IPに入射した光に基づいて画像を取得するように構成されている。撮像画素IPに十分な光が入射するように、撮像画素IPは、z方向から見る平面視で、低密度領域LAと重畳するように配置されている。撮像層1は、例えば、遠赤外線カメラ、近赤外線カメラ、および可視光カメラなどのカメラを含んでも、指静脈認証センサ、網膜センサなどの画像センサを含んでもよい。
導光層2は、導光素子22を複数備える。撮像画素IPに十分な光が入射するように、導光素子22は、z方向から見る平面視で、低密度領域LAと重畳するように配置されている。表示画素DPによって回折した光が撮像画素IPに入射しないように、導光素子22は、z方向から見る平面視で、低密度領域LAのうちの表示画素DPと重畳しない位置に配置されている。以降、低密度領域LAにおける表示画素DPの画素回路PCおよび画素電極52が設けられていない領域を開口領域Qと称する。換言すると、導光素子22には、導光素子22が開口領域Qに重畳するように、配置されている。
表示層3は、上面3bに画像を表示するように表示画素DPが設けられており、低密度領域LAと高密度領域HAとを有する。高密度領域HAには、撮像層を内蔵しない通常の表示装置の表示領域と同等の密度で、表示画素DPが配置されている。一方、低密度領域LAには、撮像画素IPに十分量の光が入射するように、高密度領域HAよりも小さい密度で表示画素DPが配置されている。したがって、低密度領域LAにおける画素回路PCおよび画素電極52の密度は、高密度領域HAにおける画素回路PCおよび画素電極52の密度よりも小さい。
以下、図3を参照して、表示層3の平面構成、特に表示層3の遮光パターンについて説明する。
以下、図4および図5を参照して、導光層2による撮像画像の品位の向上について説明する。
導光層2は、種々の方法で、表示層3の下面3a上に実装することができる。
以下、図6から図8を参照して、導光層2の導光素子22の好適な配置について説明する。
以下、図9および図10を参照して、導光層2の導光素子22の別の好適な配置について説明する。
図11は、図2に示した表示層3の変形例における、低密度領域LAと高密度領域HAとの境界近傍を示す部分平面図である。図11は、本開示への理解を容易にするために、導電層41、半導体層42および画素電極52のみを示し、その他の構成要素を省略する。図12は、図11に示した遮光パターンに対応する導光層2の好適例を示す部分平面図である。図13は、図12に示した境界部26を、図11に示した遮光パターンに重畳して示す部分平面図である。
本発明の他の実施形態について、以下に説明する。なお、説明の便宜上、上記実施形態にて説明した部材と同じ機能を有する部材については、同じ符号を付記し、その説明を繰り返さない。
図15は、図14に示した表示層203における低密度領域LAを示す部分平面図である。図15は、本開示への理解を容易にするために、導電層41、半導体層42および画素電極52のみを示し、その他の構成要素を省略する。
本発明の他の実施形態について、以下に説明する。なお、説明の便宜上、上記実施形態にて説明した部材と同じ機能を有する部材については、同じ符号を付記し、その説明を繰り返さない。
本実施形態に係る表示装置300の構成は、前述の実施形態2に係る表示装置200の構成と組み合わされてもよい。
2、202 導光層(第2層)
2b 上面
3、203、303 表示層(第3層)
22 導光素子
24 遮光領域
26 境界部
306 液晶層
41x、41y 配線
52 画素電極
100、200、300 表示装置
HA 高密度領域
LA 低密度領域
IP 撮像画素(撮像素子)
DP 表示画素
ES 自発光素子
L1 光
PC 画素回路
Claims (26)
- 撮像素子を含む第1層と、
前記第1層よりも上層に位置し、上方から入射した光を下方の前記撮像素子に導く導光素子を含む第2層と、
前記第2層よりも上層に位置し、画素電極および前記画素電極に接続して前記画素電極の電位を制御する画素回路を含む第3層と、を備える、表示装置。 - 前記画素電極は、光を反射する反射電極であることを特徴とする請求項1に記載の表示装置。
- 前記画素回路は、光を反射または吸収する配線または電極を含むことを特徴とする請求項1または2に記載の表示装置。
- 前記第2層の上面は、前記第3層と接する請求項1~3の何れか1項に記載の表示装置。
- 前記第3層は、それぞれ複数の前記画素回路および複数の前記画素電極が配置された、第1領域と第2領域とを有し、
前記第1領域における前記画素回路の密度は、前記第2領域における前記画素回路の密度よりも小さく、
前記撮像素子および前記導光素子は、上方から見る平面視で前記第1領域と重畳するように配置された請求項1~4の何れか1項に記載の表示装置。 - 前記導光素子は、上方から見る平面視で、前記第1領域のうちの複数の前記画素回路および複数の前記画素電極と重畳しない位置に配置された請求項5に記載の表示装置。
- 前記導光素子は複数であり、
前記第2層はさらに、複数の前記導光素子の各間に配置され、前記導光素子から入射した光を吸収または反射する境界部を含む請求項6に記載の表示装置。 - 前記境界部は、前記導光素子よりも屈折率が高い透明材料、または光を吸収または反射する遮光材料から成る請求項7に記載の表示装置。
- 前記第3層はさらに、光を吸収または反射する複数の配線を含み、
前記第1領域における前記配線が、前記境界部と重畳する、請求項7または8に記載の表示装置。 - 前記第3層はさらに、光を吸収または反射する複数の配線を含み、
前記境界部は、前記第1領域における前記配線の少なくとも一部と重畳する、請求項7または8に記載の表示装置。 - 前記境界部は、前記第1領域における前記配線の全部と重畳する、請求項10に記載の表示装置。
- 上方から見る平面視で、前記第1領域における複数の前記画素回路のうち隣り合う2つの画素回路の間隔は、当該2つの画素回路の間に配置された前記導光素子の径の10倍よりも大きい請求項7~11の何れか1項に記載の表示装置。
- 前記第2層はさらに、遮光領域を含み、
前記遮光領域は、上方から見る平面視で、前記第1領域のうちの複数の前記画素回路および複数の前記画素電極と重なる位置に配置され、かつ、上方から入射した光を吸収または反射する請求項7~12の何れか1項に記載の表示装置。 - 前記遮光領域は、上方から見る平面視で、前記第1領域のうちの全ての前記画素回路および全ての前記画素電極と重なる位置に配置される請求項13に記載の表示装置。
- 前記遮光領域は、上方から見る平面視で、前記第2領域と重なる位置に配置される請求項13または14に記載の表示装置。
- 前記遮光領域は、光を吸収または反射する遮光材料から成る請求項13~15の何れか1項に記載の表示装置。
- 前記境界部が、前記遮光領域と同一の遮光材料から成る請求項16に記載の表示装置。
- 前記境界部は、前記導光素子よりも屈折率が高い透明材料から成り、
前記遮光領域は、上記透明材料の上面を上記遮光材料が覆うことによって、形成されている請求項16に記載の表示装置。 - 前記境界部はさらに、前記遮光領域と前記導光素子との間に配置された請求項13~18の何れか1項に記載の表示装置。
- 前記遮光領域は、複数であり、
互いに隣り合う2つの前記遮光領域の間に、前記導光素子は1つだけある請求項13~19の何れか1項に記載の表示装置。 - 前記遮光領域は、複数であり、
互いに隣り合う2つの前記遮光領域の間に、前記導光素子は2つ以上ある請求項13~19の何れか1項に記載の表示装置。 - 前記遮光領域は、前記画素回路と同一の配列様式に従って配列される請求項13~21の何れか1項に記載の表示装置。
- 前記遮光領域は、前記撮像素子と同一の配列様式に従って配列される請求項13~21の何れか1項に記載の表示装置。
- 前記第3層は、前記画素電極と、共通電極と、前記画素電極と前記共通電極との間のエレクトロルミネッセンス層とを含む自発光素子を含む請求項1~23の何れか1項に記載の表示装置。
- 前記第3層は、液晶層をさらに含む請求項1~23の何れか1項に記載の表示装置。
- 前記第1層は、前記撮像素子が複数設けられたカメラまたは画像センサを含む請求項1~25の何れか1項に記載の表示装置。
Priority Applications (2)
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US20200066809A1 (en) * | 2017-09-30 | 2020-02-27 | Kunshan Go-Visionox Opto-Electronics Co., Ltd. | Display screen and display apparatus |
JP2020035327A (ja) * | 2018-08-31 | 2020-03-05 | マイクロメトリックステクノロジーズプライベイトリミティッド | アンダーディスプレイ型指紋認証用センサモジュールおよびアンダーディスプレイ型指紋認証装置 |
US20200200596A1 (en) * | 2018-12-19 | 2020-06-25 | Synaptics Incorporated | Systems and methods for detecting ambient light or proximity with an optical sensor |
US20200279090A1 (en) * | 2018-10-08 | 2020-09-03 | Shenzhen GOODIX Technology Co., Ltd. | Lens-pinhole array designs in ultra thin under-screen optical sensors for on-screen fingerprint sensing |
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Publication number | Priority date | Publication date | Assignee | Title |
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US20200066809A1 (en) * | 2017-09-30 | 2020-02-27 | Kunshan Go-Visionox Opto-Electronics Co., Ltd. | Display screen and display apparatus |
JP2020035327A (ja) * | 2018-08-31 | 2020-03-05 | マイクロメトリックステクノロジーズプライベイトリミティッド | アンダーディスプレイ型指紋認証用センサモジュールおよびアンダーディスプレイ型指紋認証装置 |
US20200279090A1 (en) * | 2018-10-08 | 2020-09-03 | Shenzhen GOODIX Technology Co., Ltd. | Lens-pinhole array designs in ultra thin under-screen optical sensors for on-screen fingerprint sensing |
US20200200596A1 (en) * | 2018-12-19 | 2020-06-25 | Synaptics Incorporated | Systems and methods for detecting ambient light or proximity with an optical sensor |
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