WO2023025937A3 - Verfahren zur herstellung mindestens eines laserchips und laserchip - Google Patents
Verfahren zur herstellung mindestens eines laserchips und laserchip Download PDFInfo
- Publication number
- WO2023025937A3 WO2023025937A3 PCT/EP2022/073777 EP2022073777W WO2023025937A3 WO 2023025937 A3 WO2023025937 A3 WO 2023025937A3 EP 2022073777 W EP2022073777 W EP 2022073777W WO 2023025937 A3 WO2023025937 A3 WO 2023025937A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- laser chip
- substrate
- active zone
- semiconductor layer
- producing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 4
- 239000004065 semiconductor Substances 0.000 abstract 3
- 238000003486 chemical etching Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 238000003631 wet chemical etching Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
Es wird ein Verfahren zur Herstellung mindestens eines Laserchips (20) angegeben, das Verfahren umfassend die Schritte Aufwachsen einer Halbleiterschichtenfolge (21) mit einer aktiven Zone (22) auf einem Substrat (23), Abtragen eines Teils des Substrats (23), eines Teils der aktiven Zone (22) und eines Teils der Halbleiterschichtenfolge (21) durch trockenchemisches Ätzen, so dass mindestens eine Seitenkante (24) gebildet wird, welche sich zumindest stellenweise quer oder senkrecht zur Haupterstreckungsebene des Substrats (23) erstreckt, und Abtragen eines Teils des Substrats (23), eines Teils der aktiven Zone (22) und eines Teils der Halbleiterschichtenfolge (21) an der Seitenkante (24) durch nasschemisches Ätzen, wobei die aktive Zone (22) dazu ausgelegt ist Laserstrahlung zu emittieren. Außerdem wird ein Laserchip (20) angegeben.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE112022003320.7T DE112022003320A5 (de) | 2021-08-26 | 2022-08-26 | Verfahren zur Herstellung mindestens eines Laserchips und Laserchip |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102021122145.5A DE102021122145A1 (de) | 2021-08-26 | 2021-08-26 | Verfahren zur Herstellung mindestens eines Laserchips und Laserchip |
DE102021122145.5 | 2021-08-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2023025937A2 WO2023025937A2 (de) | 2023-03-02 |
WO2023025937A3 true WO2023025937A3 (de) | 2023-04-20 |
Family
ID=83508980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2022/073777 WO2023025937A2 (de) | 2021-08-26 | 2022-08-26 | Verfahren zur herstellung mindestens eines laserchips und laserchip |
Country Status (2)
Country | Link |
---|---|
DE (2) | DE102021122145A1 (de) |
WO (1) | WO2023025937A2 (de) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110243169A1 (en) * | 2008-11-21 | 2011-10-06 | Osram Opto Semiconductors Gmbh | Edge Emitting Semiconductor Laser Chip |
US20140080287A1 (en) * | 2011-03-31 | 2014-03-20 | Osram Opto Semiconductors Gmbh | Method for singulating a component composite assembly |
US20190348568A1 (en) * | 2018-05-11 | 2019-11-14 | Osram Opto Semiconductors Gmbh | Optoelectronic Semiconductor Device and Method of Manufacturing an Optoelectronic Semiconductor Device |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1041585A (ja) | 1996-07-17 | 1998-02-13 | Toyoda Gosei Co Ltd | 3族窒化物半導体レーザダイオードの製造方法 |
JP2011228570A (ja) | 2010-04-22 | 2011-11-10 | Renesas Electronics Corp | 半導体レーザ及びその製造方法 |
DE102012106943B4 (de) | 2012-07-30 | 2019-06-27 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung einer Halbleiterlaserdiode und Halbleiterlaserdiode |
US9184563B1 (en) | 2012-08-30 | 2015-11-10 | Soraa Laser Diode, Inc. | Laser diodes with an etched facet and surface treatment |
-
2021
- 2021-08-26 DE DE102021122145.5A patent/DE102021122145A1/de not_active Withdrawn
-
2022
- 2022-08-26 WO PCT/EP2022/073777 patent/WO2023025937A2/de active Application Filing
- 2022-08-26 DE DE112022003320.7T patent/DE112022003320A5/de active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110243169A1 (en) * | 2008-11-21 | 2011-10-06 | Osram Opto Semiconductors Gmbh | Edge Emitting Semiconductor Laser Chip |
US20140080287A1 (en) * | 2011-03-31 | 2014-03-20 | Osram Opto Semiconductors Gmbh | Method for singulating a component composite assembly |
US20190348568A1 (en) * | 2018-05-11 | 2019-11-14 | Osram Opto Semiconductors Gmbh | Optoelectronic Semiconductor Device and Method of Manufacturing an Optoelectronic Semiconductor Device |
Also Published As
Publication number | Publication date |
---|---|
DE112022003320A5 (de) | 2024-04-11 |
WO2023025937A2 (de) | 2023-03-02 |
DE102021122145A1 (de) | 2023-03-02 |
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