WO2023005563A1 - Non-volatile programmable heterojunction memory - Google Patents

Non-volatile programmable heterojunction memory Download PDF

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WO2023005563A1
WO2023005563A1 PCT/CN2022/101761 CN2022101761W WO2023005563A1 WO 2023005563 A1 WO2023005563 A1 WO 2023005563A1 CN 2022101761 W CN2022101761 W CN 2022101761W WO 2023005563 A1 WO2023005563 A1 WO 2023005563A1
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semiconductor
layer
heterojunction
dielectric layer
top surface
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PCT/CN2022/101761
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Chinese (zh)
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张增星
盛喆
余睿
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上海集成电路制造创新中心有限公司
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B41/00Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1025Channel region of field-effect devices
    • H01L29/1029Channel region of field-effect devices of field-effect transistors
    • H01L29/1033Channel region of field-effect devices of field-effect transistors with insulated gate, e.g. characterised by the length, the width, the geometric contour or the doping structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/26Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, elements provided for in two or more of the groups H01L29/16, H01L29/18, H01L29/20, H01L29/22, H01L29/24, e.g. alloys
    • H01L29/267Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, elements provided for in two or more of the groups H01L29/16, H01L29/18, H01L29/20, H01L29/22, H01L29/24, e.g. alloys in different semiconductor regions, e.g. heterojunctions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B41/00Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/30Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region

Abstract

Provided in the present invention is a non-volatile programmable heterojunction memory. The non-volatile programmable heterojunction memory comprises a control gate layer, a first dielectric layer, a floating gate layer, a second dielectric layer, a heterojunction channel layer and an electrode, wherein the first dielectric layer covers the top face of the control gate layer; the floating gate layer covers the top face of the first dielectric layer; the second dielectric layer is arranged on an upper side of the floating gate layer; the heterojunction channel layer comprises a first semiconductor and a second semiconductor, at least one of the first semiconductor and the second semiconductor is a bipolar semiconductor, and the first semiconductor and the second semiconductor jointly cover the top face of the second dielectric layer; and the electrode covers part of the top face of the heterojunction channel layer, such that a control gate voltage that is applied to the control gate layer enables continuous logic changes and storage of the heterojunction channel layer between different PN junctions and non-PN junctions, so as to realize a low-power-consumption photoelectric testing, thereby realizing the integration of sensing, storage and calculation functions.

Description

非易失性可编程异质结存储器Nonvolatile Programmable Heterojunction Memory
交叉引用cross reference
本申请要求2021年07月29日提交的申请号为2021108641935的中国申请的优先权。上述申请的内容以引用方式被包含于此。This application claims the priority of the Chinese application with application number 2021108641935 filed on July 29, 2021. The content of the above application is incorporated herein by reference.
技术领域technical field
本发明涉及半导体技术领域,尤其涉及一种非易失性可编程异质结存储器。The invention relates to the technical field of semiconductors, in particular to a nonvolatile programmable heterojunction memory.
背景技术Background technique
物联网时代,海量数据的获取和处理对信息传输能力、信息处理速度和能耗等都造成了巨大压力,发展边缘计算和存储成为解决该问题的有效途径之一,其中研制感、存、算一体的新型智能传感器,实现器件内的信息获取、处理与存储,对提升系统的能效、降低信号延迟,满足万物互联时代日益增长的海量数据获取和处理需求具有重要意义。视觉是信息获取的主要来源之一,其主要核心部位之一为光电探测器。In the era of the Internet of Things, the acquisition and processing of massive data has put enormous pressure on information transmission capabilities, information processing speed, and energy consumption. The development of edge computing and storage has become one of the effective ways to solve this problem. The integrated new smart sensor realizes information acquisition, processing and storage in the device, which is of great significance to improve the energy efficiency of the system, reduce signal delay, and meet the growing demand for massive data acquisition and processing in the Internet of Everything era. Vision is one of the main sources of information acquisition, and one of its main core parts is a photodetector.
传统光电探测器功能单一,只具有光电转换功能,无法面对海量信息时代对智能传感器提出的更高要求,因此,发展感、存、算一体的新原理低功耗光电探测器元器件具有重要意义。Traditional photodetectors have a single function and only have the function of photoelectric conversion, which cannot meet the higher requirements for smart sensors in the era of massive information. significance.
因此,有必要提供一种新型的非易失性可编程异质结存储器以解决现有技术中存在的上述问题。Therefore, it is necessary to provide a new type of non-volatile programmable heterojunction memory to solve the above-mentioned problems in the prior art.
发明内容Contents of the invention
本发明的目的在于提供一种非易失性可编程异质结存储器,实现所述异质结沟道层在不同PN结和非PN结之间的连续逻辑变化和存储,降低光电测试的高,实现感、存、算功能的一体化。The purpose of the present invention is to provide a non-volatile programmable heterojunction memory, to realize the continuous logic change and storage of the heterojunction channel layer between different PN junctions and non-PN junctions, and reduce the high cost of photoelectric testing. , to realize the integration of sense, storage and calculation functions.
为实现上述目的,本发明的所述非易失性可编程异质结存储器,依次包括:In order to achieve the above purpose, the non-volatile programmable heterojunction memory of the present invention includes in turn:
控制栅层;control gate layer;
第一电介质层,覆盖所述控制栅层的顶面;a first dielectric layer covering the top surface of the control gate layer;
浮栅层,覆盖所述第一电介质层的顶面;a floating gate layer covering the top surface of the first dielectric layer;
第二电介质层,覆盖所述浮栅层的顶面;a second dielectric layer covering the top surface of the floating gate layer;
异质结沟道层,所述异质结沟道层包括第一半导体和第二半导体,所述第一半导体和所述第二半导体中至少一种为双极性半导体,所述第一半导体和所述第二半导体共同覆盖所述第二电介质层的顶面;以及A heterojunction channel layer, the heterojunction channel layer includes a first semiconductor and a second semiconductor, at least one of the first semiconductor and the second semiconductor is an ambipolar semiconductor, and the first semiconductor co-covering the top surface of the second dielectric layer with the second semiconductor; and
电极,覆盖所述异质结沟道层的部分顶面。An electrode covering part of the top surface of the heterojunction channel layer.
所述非易失性可编程异质结存储器的有益效果在于:所述异质结沟道层包括第一半导体和第二半导体,所述第一半导体和所述第二半导体中至少一种为双极性半导体,使得施加在所述控制栅层上的控制栅电压可以实现所述异质结沟道层在不同PN结和非PN结之间的连续逻辑变化和存储,并可以利用PN结的光伏模式,实现低功耗的光电测试,从而实现所述非易失性可编程异质结存储器的感、存、算功能的一体化。The beneficial effect of the nonvolatile programmable heterojunction memory is that: the heterojunction channel layer includes a first semiconductor and a second semiconductor, at least one of the first semiconductor and the second semiconductor is Bipolar semiconductor, so that the control gate voltage applied on the control gate layer can realize the continuous logic change and storage of the heterojunction channel layer between different PN junctions and non-PN junctions, and can utilize the PN junction The photovoltaic mode realizes the photoelectric test with low power consumption, thereby realizing the integration of sensing, storage and computing functions of the non-volatile programmable heterojunction memory.
优选地,所述电极包括源电极和漏电极,所述源电极覆盖所述第一半导体的部分顶面,所述漏电极覆盖所述第二半导体的部分顶面。Preferably, the electrodes include a source electrode and a drain electrode, the source electrode covers part of the top surface of the first semiconductor, and the drain electrode covers part of the top surface of the second semiconductor.
进一步优选地,所述源电极的材料为金或铬,所述漏电极的材料为金或铬。Further preferably, the material of the source electrode is gold or chromium, and the material of the drain electrode is gold or chromium.
优选地,所述双极性半导体的材料为二硒化钨。Preferably, the material of the ambipolar semiconductor is tungsten diselenide.
优选地,所述第一电介质层的材料和所述第二电介质层的材料均为二氧化铪。Preferably, the material of the first dielectric layer and the material of the second dielectric layer are hafnium dioxide.
优选地,所述浮栅层的材料和所述控制栅层的材料均为金。Preferably, the materials of the floating gate layer and the control gate layer are both gold.
附图说明Description of drawings
图1为本发明实施例的非易失性可编程异质结存储器的结构示意图;FIG. 1 is a schematic structural diagram of a non-volatile programmable heterojunction memory according to an embodiment of the present invention;
图2为本发明实施例的非易失性可编程异质结存储器的功能曲线图。FIG. 2 is a function curve diagram of the non-volatile programmable heterojunction memory according to the embodiment of the present invention.
具体实施方式Detailed ways
为使本发明的目的、技术方案和优点更加清楚,下面将结合本发明的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本发明的一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。除非另外定义,此处使用的技术术语或者科学术语应当为本发明所属领域内具有一般技能的人士所理解的通常意义。本文中使用的“包括”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同,而不排除其他元件或者物件。In order to make the purpose, technical solutions and advantages of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings of the present invention. Obviously, the described embodiments are part of the present invention Examples, not all examples. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention. Unless otherwise defined, the technical terms or scientific terms used herein shall have the usual meanings understood by those skilled in the art to which the present invention belongs. As used herein, "comprising" and similar words mean that the elements or items appearing before the word include the elements or items listed after the word and their equivalents, without excluding other elements or items.
针对现有技术存在的问题,本发明的实施例提供了一种非易失性可编程异质结存储器。参照图1,所述非易失性可编程异质结存储器100依次包括控制栅层101、第一电介质层102、浮栅层103、第二电介质层104、异质结沟道层105和电极106,所述第一电介质层102覆盖所述控制栅层101的顶面,所述浮栅层103覆盖所述第一电介质层102的顶面,所述第二电介质104层覆盖所述浮栅层103的顶面,所述异质结沟道层105包括第一半导体1051和第二半导体1052,所述第一半导体1051和所述第二半导体1052中至少一种为双极性半导体,所述第一半导体1051和所述第二半导体1052共同覆盖所述第二电介质层104的顶面,所述电极覆盖所述异质结沟道层105的部分顶面。Aiming at the problems existing in the prior art, the embodiment of the present invention provides a non-volatile programmable heterojunction memory. Referring to FIG. 1, the nonvolatile programmable heterojunction memory 100 sequentially includes a control gate layer 101, a first dielectric layer 102, a floating gate layer 103, a second dielectric layer 104, a heterojunction channel layer 105 and an electrode 106, the first dielectric layer 102 covers the top surface of the control gate layer 101, the floating gate layer 103 covers the top surface of the first dielectric layer 102, and the second dielectric layer 104 covers the floating gate The top surface of the layer 103, the heterojunction channel layer 105 includes a first semiconductor 1051 and a second semiconductor 1052, at least one of the first semiconductor 1051 and the second semiconductor 1052 is an ambipolar semiconductor, so The first semiconductor 1051 and the second semiconductor 1052 jointly cover the top surface of the second dielectric layer 104 , and the electrode covers part of the top surface of the heterojunction channel layer 105 .
所述非易失性可编程异质结存储器中所述异质结沟道层包括第一半导体和第二半导体,所述第一半导体和所述第二半导体中至少一种为双极性半导体,使得施加在所述控制栅层上的控制栅电压可以实现所述异质结沟道层在不同PN结和非PN结之间的连续逻辑变化和存储,并可以利用PN结的光伏模式,实现低功耗的光电测试,从而实现所述非易失性可编程异质结存储器的感、存、算 功能的一体化,并且具有半导体工艺兼容性,具有大规模生产的潜力。The heterojunction channel layer in the nonvolatile programmable heterojunction memory includes a first semiconductor and a second semiconductor, at least one of the first semiconductor and the second semiconductor is a bipolar semiconductor , so that the control gate voltage applied on the control gate layer can realize the continuous logic change and storage of the heterojunction channel layer between different PN junctions and non-PN junctions, and can utilize the photovoltaic mode of the PN junction, The photoelectric test with low power consumption is realized, so as to realize the integration of sensing, storage and calculation functions of the non-volatile programmable heterojunction memory, and has semiconductor process compatibility, and has the potential for mass production.
图2为本发明一些实施例中非易失性可编程异质结存储器的功能曲线图。参照图2,可以看出,在辐照所述非易失性可编程异质结存储器上的光功率为10nW时,施加在所述控制栅层上的控制栅电压V CG可以连续调制所述非易失性可编程异质结存储器所产生的光伏电压V OC,即使得所述非易失性可编程异质结存储器的光电探测能力得到连续调制,并具有存储功能。 FIG. 2 is a functional graph of a non-volatile programmable heterojunction memory in some embodiments of the present invention. Referring to FIG. 2, it can be seen that when the optical power irradiated on the nonvolatile programmable heterojunction memory is 10nW, the control gate voltage V CG applied to the control gate layer can continuously modulate the The photovoltaic voltage V OC generated by the nonvolatile programmable heterojunction memory makes the photodetection capability of the nonvolatile programmable heterojunction memory continuously modulated and has a storage function.
参照图1,所述电极106包括源电极1061和漏电极1062,所述源电极1061覆盖所述第一半导体1051的部分顶面,所述漏电极1062覆盖所述第二半导体1052的部分顶面,其中,所述源电极1061的材料为金或铬,所述漏电极1062的材料为金(Au)或铬(Cr)。1, the electrode 106 includes a source electrode 1061 and a drain electrode 1062, the source electrode 1061 covers part of the top surface of the first semiconductor 1051, and the drain electrode 1062 covers part of the top surface of the second semiconductor 1052 , wherein, the material of the source electrode 1061 is gold or chromium, and the material of the drain electrode 1062 is gold (Au) or chromium (Cr).
一些实施中,所述双极性半导体的材料为二硒化钨(WSe 2),所述第一电介质层的材料和所述第二电介质层的材料均为二氧化铪(HfO 2),所述浮栅层的材料和所述控制栅层的材料均为金(Au)。 In some implementations, the material of the ambipolar semiconductor is tungsten diselenide (WSe 2 ), the material of the first dielectric layer and the material of the second dielectric layer are both hafnium dioxide (HfO 2 ), so The material of the floating gate layer and the material of the control gate layer are gold (Au).
虽然在上文中详细说明了本发明的实施方式,但是对于本领域的技术人员来说显而易见的是,能够对这些实施方式进行各种修改和变化。但是,应理解,这种修改和变化都属于权利要求书中所述的本发明的范围和精神之内。而且,在此说明的本发明可有其它的实施方式,并且可通过多种方式实施或实现。Although the embodiments of the present invention have been described in detail above, it will be apparent to those skilled in the art that various modifications and changes can be made to the embodiments. However, it should be understood that such modifications and changes are within the scope and spirit of the present invention described in the claims. Furthermore, the invention described herein is capable of other embodiments and of being practiced or carried out in various ways.

Claims (6)

  1. 一种非易失性可编程异质结存储器,其特征在于,依次包括:A nonvolatile programmable heterojunction memory, characterized in that it comprises in sequence:
    控制栅层;control gate layer;
    第一电介质层,覆盖所述控制栅层的顶面;a first dielectric layer covering the top surface of the control gate layer;
    浮栅层,覆盖所述第一电介质层的顶面;a floating gate layer covering the top surface of the first dielectric layer;
    第二电介质层,覆盖所述浮栅层的顶面;a second dielectric layer covering the top surface of the floating gate layer;
    异质结沟道层,所述异质结沟道层包括第一半导体和第二半导体,所述第一半导体和所述第二半导体中至少一种为双极性半导体,所述第一半导体和所述第二半导体共同覆盖所述第二电介质层的顶面;以及A heterojunction channel layer, the heterojunction channel layer includes a first semiconductor and a second semiconductor, at least one of the first semiconductor and the second semiconductor is an ambipolar semiconductor, and the first semiconductor co-covering the top surface of the second dielectric layer with the second semiconductor; and
    电极,覆盖所述异质结沟道层的部分顶面。An electrode covering part of the top surface of the heterojunction channel layer.
  2. 根据权利要求1所述的非易失性可编程异质结存储器,其特征在于,所述电极包括源电极和漏电极,所述源电极覆盖所述第一半导体的部分顶面,所述漏电极覆盖所述第二半导体的部分顶面。The nonvolatile programmable heterojunction memory according to claim 1, wherein the electrodes include a source electrode and a drain electrode, the source electrode covers part of the top surface of the first semiconductor, and the drain electrode The pole covers part of the top surface of the second semiconductor.
  3. 根据权利要求2所述的非易失性可编程异质结存储器,其特征在于,所述源电极的材料为金或铬,所述漏电极的材料为金或铬。The nonvolatile programmable heterojunction memory according to claim 2, wherein the material of the source electrode is gold or chromium, and the material of the drain electrode is gold or chromium.
  4. 根据权利要求1所述的非易失性可编程异质结存储器,其特征在于,所述双极性半导体的材料为二硒化钨。The nonvolatile programmable heterojunction memory according to claim 1, wherein the material of the bipolar semiconductor is tungsten diselenide.
  5. 根据权利要求1所述的非易失性可编程异质结存储器,其特征在于,所述第一电介质层的材料和所述第二电介质层的材料均为二氧化铪。The nonvolatile programmable heterojunction memory according to claim 1, wherein the material of the first dielectric layer and the material of the second dielectric layer are both hafnium dioxide.
  6. 根据权利要求1所述的非易失性可编程异质结存储器,其特征在于,所述浮栅层的材料和所述控制栅层的材料均为金。The nonvolatile programmable heterojunction memory according to claim 1, wherein the material of the floating gate layer and the material of the control gate layer are both gold.
PCT/CN2022/101761 2021-07-29 2022-06-28 Non-volatile programmable heterojunction memory WO2023005563A1 (en)

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