WO2022270461A1 - Étoffe maillée conductrice - Google Patents

Étoffe maillée conductrice Download PDF

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Publication number
WO2022270461A1
WO2022270461A1 PCT/JP2022/024523 JP2022024523W WO2022270461A1 WO 2022270461 A1 WO2022270461 A1 WO 2022270461A1 JP 2022024523 W JP2022024523 W JP 2022024523W WO 2022270461 A1 WO2022270461 A1 WO 2022270461A1
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WO
WIPO (PCT)
Prior art keywords
warp
weft
mesh fabric
conductive mesh
filaments
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PCT/JP2022/024523
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English (en)
Japanese (ja)
Inventor
俊典 佐々治
賢吾 三田村
Original Assignee
セーレン株式会社
俊典 佐々治
賢吾 三田村
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by セーレン株式会社, 俊典 佐々治, 賢吾 三田村 filed Critical セーレン株式会社
Priority to CN202280043739.3A priority Critical patent/CN117545886A/zh
Priority to EP22828378.4A priority patent/EP4361329A1/fr
Priority to JP2023530458A priority patent/JPWO2022270461A1/ja
Publication of WO2022270461A1 publication Critical patent/WO2022270461A1/fr

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    • D—TEXTILES; PAPER
    • D03—WEAVING
    • D03D—WOVEN FABRICS; METHODS OF WEAVING; LOOMS
    • D03D15/00—Woven fabrics characterised by the material, structure or properties of the fibres, filaments, yarns, threads or other warp or weft elements used
    • D03D15/40—Woven fabrics characterised by the material, structure or properties of the fibres, filaments, yarns, threads or other warp or weft elements used characterised by the structure of the yarns or threads
    • D03D15/44—Woven fabrics characterised by the material, structure or properties of the fibres, filaments, yarns, threads or other warp or weft elements used characterised by the structure of the yarns or threads with specific cross-section or surface shape
    • D—TEXTILES; PAPER
    • D03—WEAVING
    • D03D—WOVEN FABRICS; METHODS OF WEAVING; LOOMS
    • D03D15/00—Woven fabrics characterised by the material, structure or properties of the fibres, filaments, yarns, threads or other warp or weft elements used
    • D03D15/20—Woven fabrics characterised by the material, structure or properties of the fibres, filaments, yarns, threads or other warp or weft elements used characterised by the material of the fibres or filaments constituting the yarns or threads
    • D—TEXTILES; PAPER
    • D03—WEAVING
    • D03D—WOVEN FABRICS; METHODS OF WEAVING; LOOMS
    • D03D15/00—Woven fabrics characterised by the material, structure or properties of the fibres, filaments, yarns, threads or other warp or weft elements used
    • D03D15/40—Woven fabrics characterised by the material, structure or properties of the fibres, filaments, yarns, threads or other warp or weft elements used characterised by the structure of the yarns or threads
    • D03D15/41—Woven fabrics characterised by the material, structure or properties of the fibres, filaments, yarns, threads or other warp or weft elements used characterised by the structure of the yarns or threads with specific twist
    • D—TEXTILES; PAPER
    • D03—WEAVING
    • D03D—WOVEN FABRICS; METHODS OF WEAVING; LOOMS
    • D03D15/00—Woven fabrics characterised by the material, structure or properties of the fibres, filaments, yarns, threads or other warp or weft elements used
    • D03D15/50—Woven fabrics characterised by the material, structure or properties of the fibres, filaments, yarns, threads or other warp or weft elements used characterised by the properties of the yarns or threads
    • D03D15/533—Woven fabrics characterised by the material, structure or properties of the fibres, filaments, yarns, threads or other warp or weft elements used characterised by the properties of the yarns or threads antistatic; electrically conductive
    • D—TEXTILES; PAPER
    • D03—WEAVING
    • D03D—WOVEN FABRICS; METHODS OF WEAVING; LOOMS
    • D03D9/00—Open-work fabrics
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/83—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with metals; with metal-generating compounds, e.g. metal carbonyls; Reduction of metal compounds on textiles

Definitions

  • the present invention relates to a conductive mesh fabric. More specifically, the present invention relates to a conductive mesh woven fabric having little variation in conductivity in the bias direction even with repeated bending and repeated twisting deformation.
  • a conductive mesh fabric in which a metal film is formed on a mesh fabric made of fibers.
  • a conductive mesh fabric is used as an electromagnetic wave shielding member or as a conducting member for grounding in an electronic device housing. Moreover, it is often used as an electrode of a sensor.
  • Patent Document 1 proposes a conductive tape that is thinner, has excellent grounding properties and high adhesiveness, and can be used as an electromagnetic shielding gasket.
  • the conductive tape uses a conductive mesh fabric having a metal film on its surface, and has an adhesive film made of an adhesive only at its openings. On both sides of the conductive mesh fabric, the metal film is exposed without being covered with the adhesive film, and at least a part of the yarns constituting the conductive mesh fabric contains a thermoplastic synthetic monofilament yarn.
  • Patent Document 2 discloses inserting a mesh-like extensible conductive knitted fabric into a mold during injection molding when molding a conductive molded article having electromagnetic wave shielding properties.
  • the conductive knitted fabric has a porosity of 20% or more and 80% or less, and the entire knitted fabric made of a fiber material such as polyester fiber is subjected to an electroless plating treatment to impart conductivity.
  • Patent Document 3 a conductive cloth is used as a capacitive detection electrode arranged on the surface of a sheet-shaped base material, and a mesh cloth having openings formed of twisted wires is plated with a metal.
  • An invention is described that relates to capacitive sensors.
  • the conductive mesh woven fabric described in Patent Document 1 and the conductive knitted fabric described in Patent Document 2 are irrelevant to the problem of variations in conductivity due to repeated deformation, and of course, there is no suggestion of a solution.
  • the detection electrode described in Patent Document 3 is made of a conductive cloth obtained by plating a mesh cloth with metal, it is necessary to further improve the effect of suppressing variations in conductivity.
  • the present invention focuses on such problems, and aims to provide a conductive mesh fabric that can suppress variations in conductivity even with repeated deformation. More specifically, the present invention provides a conductive mesh woven fabric in which variation in conductivity in the bias direction is suppressed even by repeated bending deformation and repeated twisting deformation.
  • the present invention has twisted yarns made of synthetic fiber filaments as warps and wefts, a metal film covering the warps and the wefts is formed, an aperture ratio of 40 to 80%, and the warps and the wefts In the crossing portion, the surface of the warp that is in contact with the weft has a recess, and the surface of the weft that is in contact with the warp has a recess. It is a mesh fabric.
  • warp filaments that make up the warp that are in contact with the filaments that make up the weft (hereinafter referred to as weft filaments), and the weft that is in contact with the warp filaments. It is preferable that one or more are formed on the surface of the filament.
  • At least one of the recesses formed on the surface of the warp filaments and the recesses formed on the surface of the warp filaments has a substantially circular shape with a diameter of the warp filament +80 ⁇ m or less and/or a diameter of the weft filament +80 ⁇ m or less, A depth of 4 to 20 ⁇ m is preferred.
  • the recess preferably has a diameter of 20 to 80 ⁇ m and a depth of 4 to 20 ⁇ m. Further, at a portion where the warp and the weft intersect, the concave portion of the surface of the warp that is in contact with the weft and the concave portion of the surface of the weft that is in contact with the warp are meshed with each other. is preferred.
  • the twist number of the twisted yarn is preferably 300 to 2,000 T/m. If the number of twists of the twisted yarn is within the range of 300 to 2,000 T/m, it is possible to obtain a conductive mesh fabric in which variations in conductivity due to repeated deformation are further suppressed.
  • the variation coefficient of the measured resistance value in the bias direction is preferably 5.0% or less.
  • the variation coefficient of the resistance value in the bias direction is 5.0% or less.
  • the conductive mesh fabric of the present invention includes a weaving process of fabricating a mesh fabric using twisted yarns made of synthetic fiber filaments as warps and wefts, a heat treatment process of heat-treating the mesh fabric obtained in the weaving process, and a mesh subjected to the heat treatment. and a metal film forming step of forming a metal film on the woven fabric.
  • the number of twists of the twisted yarn is preferably 300 to 2,000 T/m.
  • the temperature condition in the heat treatment step is preferably 150 to 220.degree.
  • the present invention it is possible to extremely effectively suppress misalignment of the warp and the weft at a portion where the warp and the weft constituting the conductive mesh fabric intersect (hereinafter referred to as "intersection portion"). It is possible to obtain a conductive mesh fabric in which variation in conductivity in the bias direction due to bending deformation and repeated twisting deformation is suppressed. It is possible to provide a conductive mesh woven fabric capable of imparting conductivity that can withstand repeated bending and twisting by incorporating it into a member having flexibility that causes deformation during use.
  • FIG. 1 is an enlarged photograph showing an example of a conductive mesh fabric according to the present invention
  • FIG. 2 is an enlarged photograph of the warp yarns of the conductive mesh fabric according to the present invention extracted and observed.
  • FIG. FIG. 4 is an image diagram showing a state where concave portions of warp and weft are interlocked with each other in the present invention.
  • 4 is an enlarged photograph of the warp of the conductive mesh fabric obtained in Example 1, which is extracted and observed.
  • 4 is a graph showing the measurement results of surface unevenness of the warp of the conductive mesh fabric obtained in Example 1.
  • FIG. 4 is an enlarged photograph of the warp of the fabric obtained in Comparative Example 1, which is extracted and observed. 4 is a graph showing the measurement results of surface unevenness of the warp of the fabric obtained in Comparative Example 1.
  • FIG. 1 is an enlarged photograph showing an example of a conductive mesh fabric according to the present invention
  • FIG. 2 is an enlarged photograph of the warp yarns of the conductive mesh fabric according to the
  • the conductive mesh fabric of the present invention has twisted yarns made of synthetic fiber filaments as warp and weft yarns.
  • Synthetic fibers include polyester fibers such as polyethylene terephthalate and polybutylene terephthalate, polyamide fibers such as nylon 6 and nylon 66, polyolefin fibers such as polyethylene and polypropylene, polyacrylonitrile fibers, polyvinyl alcohol fibers, and polyurethane fibers. etc. can be mentioned.
  • polyester fibers and polyamide fibers are preferably used from the viewpoint of strength, versatility, and chemical resistance.
  • a plurality of filaments made of the above synthetic fibers are bundled and twisted to use twisted threads as warp and weft.
  • the number of filaments is preferably 2-20, more preferably 4-10.
  • the single filament fineness of the filament is preferably 3 to 50 dtex, more preferably 4 to 20 dtex.
  • the filament diameter is preferably 20-45 ⁇ m, more preferably 23-28 ⁇ m.
  • the total fineness of the twisted yarn obtained by bundling a plurality of filaments is preferably 22-84 dtex, more preferably 33-55 dtex.
  • the diameter of the strands is preferably 45-90 ⁇ m, more preferably 55-75 ⁇ m.
  • the twist number of the warp and weft is preferably 300 to 2,000 T/m, more preferably 500 to 1,000 T/m.
  • the number of twists of the synthetic fiber filament is 300 to 2,000 T/m, gentle unevenness (for example, about 20 ⁇ m or less in depth) is formed on the surface of the yarn. Due to the presence of the unevenness, it is possible to suppress misalignment of the warp threads and the weft threads at the intersections of the warp threads and the weft threads.
  • a mesh fabric is woven by a normal weaving method using the warp and the weft. Specific examples of weaving methods include water jet, air jet, and rapier.
  • a mesh fabric is a fabric in which adjacent warp yarns and adjacent weft yarns are spaced apart from each other and have relatively large voids, that is, openings in the fabric structure (see FIG. 1).
  • the thickness of the resulting mesh fabric varies depending on the thickness of the twisted yarn used and is not particularly limited, but is preferably 80 to 180 ⁇ m, more preferably 90 to 140 ⁇ m.
  • opening ratio when the mesh fabric is projected onto a plane, the ratio of the area of the openings per unit area is called the opening ratio.
  • the finally obtained conductive mesh fabric has an open area ratio of 40 to 80%, preferably 50 to 70%. Since the conductive mesh fabric has an open area ratio of 40 to 80%, it is possible to obtain followability to bending and twisting deformation, and it is possible to enhance the effect of suppressing the conductivity variation in the bias direction of the conductive mesh fabric. .
  • the aperture ratio was calculated by the following formula (Equation 1).
  • Equation 1 the opening area and the fiber area are calculated by viewing the mesh fabric from above with a microscope (magnification: 140 times) manufactured by Hylox, and measuring with image processing software.
  • Opening ratio (%) opening area / (opening area + fiber area)
  • metal film covering the warp and the weft is formed.
  • Gold, silver, copper, platinum, nickel, zinc, tin and the like are used as the metal species constituting the metal film.
  • it can be an alloy containing a plurality of metals selected from these metal species. More preferably, the metal species constituting the metal coating are copper and/or nickel.
  • the total amount of metal applied to form the metal film is preferably 5 to 20 g/m 2 with respect to the mesh fabric. If the total amount of metal added is within this range, a conductive mesh fabric with an excellent balance between flexibility and conductivity can be obtained. Also, the thickness of the metal film is preferably 0.5 to 2.0 ⁇ m.
  • a method for forming the metal film known methods such as vapor deposition, sputtering, electroplating, and electroless plating are used. Among them, electroless plating and/or electroplating are preferable in that a uniform metal film is formed in all directions.
  • the metal film into a multi-layered structure by electroplating after first performing electroless plating.
  • Copper, nickel, and silver are preferred as metals for electroless plating.
  • Preferred metals for electroplating are gold, silver, nickel and tin. More specifically, the metal film is preferably formed by electroless copper plating followed by nickel electrolytic plating.
  • the amount of metal applied by electroless plating is preferably 5 to 25 g/m 2 with respect to the mesh fabric.
  • the amount of metal applied by electroplating is preferably 0.5 to 3.0 g/m 2 with respect to the mesh fabric.
  • the mesh woven fabric may be formed after the metal film is formed at the yarn stage, or the metal film may be formed after the mesh woven fabric is formed. More preferably, the metal coating is formed after fabricating the mesh fabric.
  • plating is performed while the contact pressure between the warp and weft is secured, so the contact pressure at the contact point (intersection) between the warp and weft is further improved.
  • nickel electroplating to the mesh fabric that has undergone electroless copper plating and covering it with a nickel film, oxidation of the copper plating can be suppressed, and at the contact points between the warp and weft, Conductivity can also be improved.
  • the bias direction is a direction that is in the plane of the conductive mesh fabric and that is not parallel to either the extending direction of the warp yarns or the extending direction of the weft yarns. In general terms, it can be said to be an oblique direction (an acute angle of about 45° with respect to the longitudinal direction of each of the warp and weft) with respect to the texture of the conductive mesh fabric.
  • FIG. 1 shows an example of the bias direction (D).
  • the electrical connection at the intersection is important. As described above, adjacent warp yarns and adjacent weft yarns of the mesh fabric are spaced apart from each other, so the intersections greatly contribute to conduction in the bias direction.
  • the conductivity of the conductive mesh fabric in the bias direction will vary significantly. If the threads are displaced at the intersections due to repeated deformation, the metal film formed at the intersections is destroyed or torn, resulting in defects.
  • the present invention by twisting the warp and the weft, it is possible to suppress the misalignment of the yarn due to the gentle unevenness formed on the surface.
  • the effect of suppressing the displacement of the yarn can be enhanced.
  • the formation of the recesses described later at the intersections dramatically enhances the effect of suppressing the slippage of the threads.
  • Concave portion (1) Configuration of concave portion In the present invention, in order to further suppress yarn misalignment at the crossing portion, a concave portion is provided on the surface of the warp that is in contact with the weft at the crossing portion, and the warp It is configured to have a concave portion on the surface of the weft that is in contact with the weft.
  • One or more of the recesses are formed on the surface of the filament (warp filament) that makes up the warp that is in contact with the filament that makes up the weft (weft filament), and the surface of the weft filament that is in contact with the warp filament. It is preferable that one or more are formed.
  • the concave portion is formed by intersecting one filament (one warp filament and one weft filament) and has a substantially circular shape (hereinafter, “substantially circular concave portion”).
  • substantially circular concave portion approximately circular recesses are formed in the lengthwise direction on the filament as many as the number of intersecting mating filaments.
  • approximately circular recesses are formed on the warp filaments up to the number of weft filaments, so up to 6 approximately circular recesses may be formed.
  • the substantially circular recesses of the present invention are formed in the longitudinal direction of the surface of the warp filaments or the weft filaments, with the maximum number of intersecting mating filaments. Also, the substantially circular recesses thus formed are preferably formed in parallel in the longitudinal direction of the surface of the filament (see FIG. 2).
  • substantially circular recess does not have to be perfectly circular, and may be a deformed substantially circular recess having a longitudinal direction and a lateral direction.
  • a plurality of substantially circular depressions formed close to each other in the longitudinal direction on the surface of the warp filaments or weft filaments can be integrated with each other.
  • a plurality of substantially circular recesses may be integrated to form one recess, and the integrated recess may have a substantially elliptical shape (hereinafter referred to as a substantially elliptical recess) along the longitudinal direction of the filament.
  • a substantially elliptical recess formed in this manner can also be counted as one of the recesses of the present invention.
  • all of the plurality of substantially circular recesses formed in parallel in the longitudinal direction may be integrated. Only the parts may be integrated. For example, when using a multifilament strand consisting of 6 monofilaments, only 3 of the 6 substantially circular recesses formed at the intersection are integrated to form a substantially elliptical recess, and the others are each It may be a substantially circular recess.
  • ⁇ Integrated recess> In a thread-like bundle of a plurality of monofilaments (warp filaments or weft filaments) having approximately elliptical recesses formed therein, the approximately elliptical recesses formed in adjacent filaments are integrated to form larger approximately circular recesses (integration abbreviation). circular recesses) may be formed. Also, generally circular recesses across adjacent filaments may merge to form a circular or elliptical integrated recess.
  • At least one of the substantially circular concave portion formed on the surface of the one warp filament and the substantially circular concave portion formed on the surface of the one warp filament preferably has an upper limit of diameter. and/or the thickness of filaments constituting the weft (diameter: 25 to 45 ⁇ m) + 50 to 90 ⁇ m, more preferably the thickness of the filament (diameter: 25 to 45 ⁇ m) + 80 ⁇ m.
  • the lower limit of the diameter of the substantially circular concave portion is preferably -5 to -25 ⁇ m in thickness of the filament, more preferably -20 ⁇ m in thickness of the filament.
  • the depth of the substantially circular recess is preferably smaller than the thickness of the twisted thread (thickness of the conductive mesh fabric; 90 to 140 ⁇ m), more preferably smaller than the thickness of the filament, still more preferably 5 to 20 ⁇ m, particularly preferably 8 ⁇ 15 ⁇ m.
  • the depth of the recesses in the present invention refers to the depth of the furthest (deepest) point from the surface of the twisted yarn that constitutes the mesh fabric. More preferably, it refers to the depth of the farthest (deepest) point from the surface of the filaments constituting the twisted yarn.
  • the substantially elliptical recess formed by integrating a plurality of substantially circular recesses has the same upper and lower limits as in the case of the above-described substantially circular recess, and the upper limit is preferably the length of the filament.
  • the thickness is +50 to 90 ⁇ m, more preferably the filament thickness +80 ⁇ m, and the lower limit is preferably the filament thickness ⁇ 5 to ⁇ 25 ⁇ m, more preferably the filament thickness ⁇ 20 ⁇ m.
  • the upper limit of the length in the longitudinal direction of the substantially elliptical concave portion is preferably the thickness of the twisted yarn (thread-shaped bundle of a plurality of filaments) + 50 to 90 ⁇ m, and more preferably the thickness of the twisted yarn + 80 ⁇ m.
  • the lower limit is not particularly limited, it is preferably about the thickness of the two filaments minus 10 ⁇ m.
  • the approximate diameter preferably has an upper limit of the thickness of the twist yarn + 50 to 90 ⁇ m, more preferably the thickness of the twist yarn. +80 ⁇ m.
  • the lower limit is preferably about ⁇ 5 to ⁇ 25 ⁇ m in thickness of the filament (monofilament), more preferably ⁇ 20 ⁇ m in thickness of the filament.
  • FIG. 2 shows an example of an electron micrograph in which one strand is extracted from the conductive mesh fabric of the present invention and the crossing portion is observed from the side where the intersecting strand is in contact.
  • FIG. 2 is an electron microscope photograph of the crossing portion R and the vicinity of the intersecting portion R, which was observed from the side where the weft 3 was in contact with the warp 2 extracted from the conductive mesh fabric 1 .
  • a recessed portion 4 (substantially circular recessed portion) is formed in the area corresponding to the intersection portion R and in contact with the weft yarn 3 .
  • recesses (substantially circular recesses) are formed in regions corresponding to the intersections R and in contact with the warp yarns 2.
  • substantially circular recesses or substantially elliptical recesses formed in adjacent warp filaments are further integrated to form larger substantially circular recesses (integrated substantially circular recesses). can also be formed.
  • the warp is formed on the surface of the warp in contact with the weft and the surface of the weft in contact with the warp. It is desirable that the recesses fit together.
  • the concave portion 4 of the warp 2 and the concave portion of the weft 3 are brought into contact with each other and fitted together, thereby effectively suppressing the displacement of the warp 2 and the weft 3 . That is, it is possible to obtain a conductive mesh fabric in which the misalignment of the warp and the weft is extremely effectively suppressed by the fitting, and the variation in conductivity in the bias direction due to repeated bending deformation and repeated twisting deformation is suppressed.
  • FIG. 3 shows an image diagram showing a state where recesses of warp and weft are interlocked at the crossing portion of the present invention.
  • the term "fitting" as used in the present invention refers to a relationship in which the recesses are fitted to each other, but this fitting state is not necessarily the same as a mechanically precise fitting.
  • the recesses do not necessarily have to be closely or firmly attached to each other, and it is preferable that the warp threads and the weft threads are loosely or tightly meshed with each other.
  • the twisted yarn composed of a plurality of filaments is expressed as a cylinder (single yarn) for convenience in order to make the interlocking state easier to understand, and the interlocking portion by the recess is only one place at the crossing portion.
  • at least one concave portion is formed at each intersection of the monofilaments that constitute the warp strands and the monofilaments that constitute the weft strands.
  • the intersection may have a plurality of recesses (substantially circular recesses) (see FIG. 2). Then, they fit into each other to form a fitting state unique to the present invention, and the effect of suppressing misalignment between the warp and the weft can be exhibited.
  • the concave portion 4 in FIG. 2 is in a state in which the surface of the warp filaments constituting the warp yarn 2 is deformed and crushed (the state in FIG. 2; forming a substantially circular concave portion), but the present invention is not limited to this.
  • a plurality of substantially circular recesses 4 are formed on the warp filaments that make up the warp 2 by intersecting with a plurality of weft filaments that make up the weft, A generally elliptical recess may be formed by their integration.
  • substantially circular recesses and/or substantially elliptical recesses formed in adjacent warp filaments are integrated to form a larger substantially circular recess or substantially elliptical recess.
  • recesses integrated recesses
  • the cross-sectional shape of the entire filament may be crushed.
  • the thickness of the warp yarns 2 (dimension in the thickness direction of the conductive mesh fabric 1) may be reduced at the intersections R depending on the difference in the arrangement state of the plurality of filaments in the warp yarns 2.
  • the yarn represented in the columnar shape in FIG. 3 is a twisted yarn made of a plurality of monofilaments
  • the cross-sectional shape of the entire twisted yarn may be crushed.
  • both a and b in FIG. 3 correspond to the diameter of the recess, and at least one of a and b is preferably 20 to 80 ⁇ m, more preferably 30 to 60 ⁇ m. Desirably, both a and b are 20 to 80 ⁇ m, more preferably 30 to 60 ⁇ m.
  • c corresponds to the depth of the recess, specifically the depth of the farthest (deepest) point from the yarn surface.
  • c is preferably 2 to 20 ⁇ m, more preferably 4 to 10 ⁇ m.
  • Manufacturing Method A method for manufacturing the conductive mesh fabric of the present invention will be described. First, a mesh fabric having twisted yarns made of synthetic fiber filaments as warp yarns 2 and weft yarns 3 is produced by a normal weaving method. Next, a step of forming the recesses 4 on the surfaces of the warp yarns 2 and the weft yarns 3 at the intersections R is performed.
  • Examples of the method for forming the recesses 4 include a method of performing calendering while heating, and a method of heat setting while applying tension in two directions of the warp and three directions of the weft. Since the mesh fabric used in the present invention is composed of twisted yarns made of synthetic fiber filaments, it is heated to a temperature above the glass transition temperature and below the melting point of the synthetic fiber filaments to be used. The recesses 4 can be formed by applying pressure.
  • the glass transition temperature is usually about 69°C and the melting point is about 260°C. be.
  • the conditions for calendering include a temperature of 90-180°C and a linear pressure of 15-40 kg/cm.
  • Preferred in the present invention is a heat setting treatment in which heat is applied while applying constant tension in the warp and/or weft directions.
  • a method of applying tension there is a method of setting by adjusting the set width of the heat setting processing device (with a specific width ratio). At this time, the tension is applied in the weft direction (set width direction; perpendicular to the take-up direction of the fabric).
  • Preferable conditions for the heat setting treatment include a temperature of 150 to 220° C. and a tentering ratio of 1.0 to 8.0%.
  • the step of forming a metal coating is performed.
  • the method for forming the metal film is as described above, and electroless plating and electroplating are preferred.
  • the recesses of the present invention are formed before the formation of the metal film, and the diameter of the filament (monofilament), which is the standard for the shape (size) of the recesses, does not include the thickness of the metal film.
  • the metal film is not usually formed on the surface of the recesses of the conductive mesh fabric obtained after the formation of the metal film.
  • the conductive mesh fabric of the present invention has a bending radius of 2.5 mm, a bending angle of ⁇ 135°, a bending rate of 60 cycles/minute, and a total bending number of 1,000 cycles, and the bending time is 0.33 seconds during a repeated bending test. It is preferable that the variation coefficient of the resistance value in the bias direction measured at intervals is 5.0% or less.
  • the conductive mesh fabric of the present invention was twisted at intervals of 0.33 seconds during a repeated twisting test with a twisting angle of ⁇ 90°, a twisting speed of 60 cycles/minute, and a total twisting number of 1,000 cycles.
  • the variation coefficient of the measured resistance value in the bias direction is preferably 5.0% or less.
  • the bending tester and twisting tester used to measure the above physical properties are not particularly limited, and a general bending tester or twisting tester commonly used by those skilled in the art can be used.
  • ⁇ 100 is calculated as the coefficient of variation (%). If the coefficient of variation of resistance in the bias direction during bending and twisting tests is 5.0% or less, it can be used for various purposes as a conductive mesh fabric that suppresses variations in conductivity in the bias direction even when deformed. becomes.
  • Twisted yarns (33 dtex/6 f, Z-twisted 800 T/m) made of polyester fiber filaments were used for both the warp and weft, and a water jet loom was used as the weaving method to produce a plain weave mesh fabric.
  • the warp density was 68/inch and the weft density was 88/inch.
  • a heat setting machine was used to heat set the fabric in the weft direction at a width ratio of 2.5% at a temperature of 185°C for 1 minute.
  • the resulting mesh fabric was provided with a PdCl 2 and SnCl 2 colloidal solution as a catalyst for electroless plating, and then subjected to electroless copper plating and electroless nickel plating in succession.
  • Electroless copper plating used a plating solution containing CuCl 2 , formaldehyde, and sodium hydroxide.
  • nickel electroplating a plating solution containing NiSO 4 .6H 2 O and sodium citrate was used.
  • the amount of copper applied by electroless copper plating was 9.0 g/m 2
  • the amount of nickel applied by electronic nickel plating was 1.4 g/m 2
  • the total amount of metal applied was 10.4 g/m 2 . rice field.
  • the aperture ratio of the obtained conductive mesh fabric was 58.3%.
  • the aperture ratio in this example was calculated by the above formula (Equation 1).
  • Equation 1 the opening area and the fiber area were calculated by viewing the mesh fabric from above with a microscope (magnification of 140 times) manufactured by Hylox, and measuring with image processing software.
  • Fig. 4 shows an electron micrograph of the crossing portion of the conductive mesh woven fabric, in which one arbitrary warp is extracted and the crossing portion is observed from the side where the weft is in contact.
  • the electron microscope used was trade name "S-3000N” (manufactured by Hitachi, Ltd.) and had a magnification of 1000 times.
  • FIG. 5 shows the results of measuring the surface unevenness of the warp of the conductive mesh fabric as a graph.
  • the measurement was performed along the cross section AB in FIG. 4 using a surface unevenness measuring instrument (manufactured by KEYENCE CORPORATION; trade name "laser microscope VK-X3000").
  • the solid line 5 represents the actual surface unevenness measurement result.
  • the starting points of the recesses are connected by a natural line estimated from the surface unevenness measurement results before and after the intersection, and the resulting arc is displayed as a dotted line 6 as a baseline.
  • the width of deviation (7 in FIG. 5) at the point where the width of deviation is maximum was taken as the depth.
  • the conductivity in the bias direction during repeated bending tests was evaluated.
  • a ribbon-shaped test piece of 15 cm ⁇ 8 mm was cut from the conductive mesh fabric in the bias direction (45° to the warp) so that the longitudinal direction of the test piece was in the bias direction.
  • the obtained test piece was subjected to bending radius of 2.5 mm, bending angle of ⁇ 135°, and bending speed of 60 cycles/min using a bending tester manufactured by Yuasa System Co., Ltd. (trade name “TCDMLS-P150”).
  • a repeated bending test was conducted with 1000 cycles of repeated bending.
  • the resistance value between 12 cm in the bias direction of the conductive mesh fabric resistance value between two points arbitrarily selected at 12 cm intervals in the bias direction (longitudinal direction) of the cut test piece
  • was measured at intervals of 0.33 seconds. Measurements were taken (3 measurements per second 1/3 second interval).
  • a milliohm tester manufactured by Hioki Electric Co., Ltd. (trade name “RM-3545-02”) was used to measure the resistance value.
  • the obtained conductive mesh fabric was evaluated for conductivity in the bias direction during repeated twisting tests.
  • a ribbon-shaped test piece of 15 cm ⁇ 8 mm was cut from the conductive mesh fabric in the bias direction (45° to the warp) so that the longitudinal direction of the test piece was in the bias direction.
  • TCDMLH-FT twisting tester manufactured by Yuasa System Co., Ltd.
  • TCDMLH-FT twisting tester
  • the obtained test piece was repeatedly twisted once under the conditions of a twisting angle of ⁇ 90° and a twisting speed of 60 cycles/min. ,000 cycles of repeated twisting tests were performed.
  • the resistance value was measured for 12 cm in the bias direction of the conductive mesh fabric at intervals of 0.33 seconds.
  • a milliohm tester (RM-3545-02) manufactured by Hioki Electric Co., Ltd. was used to measure the resistance value.
  • FIG. 6 shows an electron micrograph obtained by extracting an arbitrary warp from the conductive plain fabric and observing the crossing portion from the side where the weft was in contact with an electron microscope.
  • the electron microscope used was "S-3000N" (manufactured by Hitachi Ltd.) and the magnification was 1000 times. According to FIG. 6, no distinct recesses were formed at the intersections of the conductive plain weave.
  • FIG. 7 shows the measurement result of the surface unevenness of the warp of this conductive plain fabric as a graph.
  • the measurement was performed along the cross section A'-B' in FIG. 6 using a surface unevenness measuring instrument (manufactured by Keyence Corporation; trade name "laser microscope VK-X3000").
  • the actual surface unevenness measurement result is indicated by a solid line 5', and the baseline is indicated by a dotted line 6'. It was confirmed that there was almost no separation between the solid line 5' and the dotted line 6', and no recess was formed.
  • Table 1 shows the results of measuring the resistance value during the repeated deformation (bending, twisting) test of the obtained conductive fabric in the same manner as in Example 1.

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  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Woven Fabrics (AREA)

Abstract

La présente invention aborde le problème de la réalisation d'une étoffe maillée conductrice dans laquelle une variation de conductivité dans la direction de polarisation est supprimée même sous flexion, déformation en torsion, déformation par compression, et similaires répétées. L'objectif est également de réaliser une étoffe maillée conductrice capable de conférer une conductivité élevée en étant incorporée à un élément ayant une flexibilité concomitante à la déformation pendant l'utilisation. La solution selon l'invention porte sur une étoffe maillée conductrice dans laquelle un fil torsadé comprenant des filaments de fibres composites est utilisé en tant que chaîne et trame, un revêtement métallique est formé recouvrant la chaîne et la trame, et le rapport d'ouverture est compris entre 40 et 80 %. Dans les portions où la chaîne et la trame se croisent, des évidements se trouvent sur la surface de la chaîne là où cette surface est en contact avec la trame, et des évidements se trouvent sur la surface de la trame là où cette surface est en contact avec la chaîne.
PCT/JP2022/024523 2021-06-22 2022-06-20 Étoffe maillée conductrice WO2022270461A1 (fr)

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EP22828378.4A EP4361329A1 (fr) 2021-06-22 2022-06-20 Étoffe maillée conductrice
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CN116590831A (zh) * 2023-07-17 2023-08-15 山东得洲科技股份有限公司 一种高弹及微弹双组织多重交织立体感一体成型机织面料

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JP2007175970A (ja) 2005-12-27 2007-07-12 Asahi Kasei Chemicals Corp 電磁波シールド性を有する導電性成形体、及びその成形方法
WO2008001958A1 (fr) * 2006-06-30 2008-01-03 Seiren Co., Ltd. maillage de BLOCAGE Des ondes électromagnétiques
JP2010261138A (ja) * 2009-05-07 2010-11-18 Yamanaka Sangyo Kk アルミニウム蒸着した導電性織物
JP2013018956A (ja) 2011-06-16 2013-01-31 Seiren Co Ltd 導電テープ及びその製造方法
EP3281540A1 (fr) * 2016-08-10 2018-02-14 Carraro S.R.L. Cagoule avec protection du visage pour vêtement de protection
CN211106114U (zh) * 2019-09-02 2020-07-28 吴江市励华纺织有限公司 一种抗静电低缩率涤纶面料
JP2021082573A (ja) 2019-07-23 2021-05-27 パナソニックＩｐマネジメント株式会社 静電容量センサ及び静電容量センサの製造方法

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Publication number Priority date Publication date Assignee Title
JP2007175970A (ja) 2005-12-27 2007-07-12 Asahi Kasei Chemicals Corp 電磁波シールド性を有する導電性成形体、及びその成形方法
WO2008001958A1 (fr) * 2006-06-30 2008-01-03 Seiren Co., Ltd. maillage de BLOCAGE Des ondes électromagnétiques
JP2010261138A (ja) * 2009-05-07 2010-11-18 Yamanaka Sangyo Kk アルミニウム蒸着した導電性織物
JP2013018956A (ja) 2011-06-16 2013-01-31 Seiren Co Ltd 導電テープ及びその製造方法
EP3281540A1 (fr) * 2016-08-10 2018-02-14 Carraro S.R.L. Cagoule avec protection du visage pour vêtement de protection
JP2021082573A (ja) 2019-07-23 2021-05-27 パナソニックＩｐマネジメント株式会社 静電容量センサ及び静電容量センサの製造方法
CN211106114U (zh) * 2019-09-02 2020-07-28 吴江市励华纺织有限公司 一种抗静电低缩率涤纶面料

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116590831A (zh) * 2023-07-17 2023-08-15 山东得洲科技股份有限公司 一种高弹及微弹双组织多重交织立体感一体成型机织面料
CN116590831B (zh) * 2023-07-17 2023-09-19 山东得洲科技股份有限公司 一种高弹及微弹双组织多重交织立体感一体成型机织面料

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