WO2022270283A1 - Coated metal sheet - Google Patents
Coated metal sheet Download PDFInfo
- Publication number
- WO2022270283A1 WO2022270283A1 PCT/JP2022/022754 JP2022022754W WO2022270283A1 WO 2022270283 A1 WO2022270283 A1 WO 2022270283A1 JP 2022022754 W JP2022022754 W JP 2022022754W WO 2022270283 A1 WO2022270283 A1 WO 2022270283A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating layer
- metal plate
- coated metal
- layer
- average thickness
- Prior art date
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 191
- 239000002184 metal Substances 0.000 title claims abstract description 191
- 239000011247 coating layer Substances 0.000 claims abstract description 120
- 150000001875 compounds Chemical class 0.000 claims abstract description 44
- 230000001699 photocatalysis Effects 0.000 claims abstract description 37
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 64
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 43
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 34
- 229910000831 Steel Inorganic materials 0.000 claims description 31
- 239000010959 steel Substances 0.000 claims description 31
- 239000002245 particle Substances 0.000 claims description 20
- 229910052726 zirconium Inorganic materials 0.000 claims description 18
- 239000000377 silicon dioxide Substances 0.000 claims description 16
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 14
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052742 iron Inorganic materials 0.000 claims description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 5
- 229910052720 vanadium Inorganic materials 0.000 claims description 5
- 229910000861 Mg alloy Inorganic materials 0.000 claims description 4
- 229910000611 Zinc aluminium Inorganic materials 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 239000010935 stainless steel Substances 0.000 claims description 4
- 229910001220 stainless steel Inorganic materials 0.000 claims description 4
- -1 zinc-aluminum-magnesium Chemical compound 0.000 claims description 4
- 229910000640 Fe alloy Inorganic materials 0.000 claims description 3
- 229910001335 Galvanized steel Inorganic materials 0.000 claims description 3
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 3
- 239000008397 galvanized steel Substances 0.000 claims description 3
- KFZAUHNPPZCSCR-UHFFFAOYSA-N iron zinc Chemical compound [Fe].[Zn] KFZAUHNPPZCSCR-UHFFFAOYSA-N 0.000 claims description 3
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052698 phosphorus Inorganic materials 0.000 claims description 3
- 238000005096 rolling process Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 125
- 239000011941 photocatalyst Substances 0.000 description 112
- 239000000126 substance Substances 0.000 description 82
- 239000010408 film Substances 0.000 description 62
- 238000007739 conversion coating Methods 0.000 description 43
- 238000006243 chemical reaction Methods 0.000 description 38
- 238000000576 coating method Methods 0.000 description 31
- 239000011248 coating agent Substances 0.000 description 29
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 24
- 239000003795 chemical substances by application Substances 0.000 description 24
- 239000000463 material Substances 0.000 description 21
- 238000012545 processing Methods 0.000 description 19
- 239000011241 protective layer Substances 0.000 description 18
- 230000000840 anti-viral effect Effects 0.000 description 17
- 238000000034 method Methods 0.000 description 16
- 238000012360 testing method Methods 0.000 description 16
- 230000007797 corrosion Effects 0.000 description 15
- 238000005260 corrosion Methods 0.000 description 15
- 235000011007 phosphoric acid Nutrition 0.000 description 15
- 150000003839 salts Chemical class 0.000 description 15
- 229920001864 tannin Polymers 0.000 description 14
- 239000001648 tannin Substances 0.000 description 14
- 235000018553 tannin Nutrition 0.000 description 14
- 230000000694 effects Effects 0.000 description 13
- 239000007787 solid Substances 0.000 description 13
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- 238000007747 plating Methods 0.000 description 11
- 239000011164 primary particle Substances 0.000 description 11
- 150000003682 vanadium compounds Chemical class 0.000 description 11
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 10
- 238000011156 evaluation Methods 0.000 description 9
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- 239000006087 Silane Coupling Agent Substances 0.000 description 8
- 150000003755 zirconium compounds Chemical class 0.000 description 8
- 229920002258 tannic acid Polymers 0.000 description 7
- 235000015523 tannic acid Nutrition 0.000 description 7
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 description 6
- 239000001263 FEMA 3042 Substances 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 6
- LRBQNJMCXXYXIU-PPKXGCFTSA-N Penta-digallate-beta-D-glucose Natural products OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-PPKXGCFTSA-N 0.000 description 6
- 241000700605 Viruses Species 0.000 description 6
- 238000013461 design Methods 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 6
- 229940033123 tannic acid Drugs 0.000 description 6
- 241001163841 Albugo ipomoeae-panduratae Species 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- WRAGBEWQGHCDDU-UHFFFAOYSA-M C([O-])([O-])=O.[NH4+].[Zr+] Chemical compound C([O-])([O-])=O.[NH4+].[Zr+] WRAGBEWQGHCDDU-UHFFFAOYSA-M 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 150000002222 fluorine compounds Chemical class 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 3
- 150000003016 phosphoric acids Chemical class 0.000 description 3
- 238000013032 photocatalytic reaction Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- YOBOXHGSEJBUPB-MTOQALJVSA-N (z)-4-hydroxypent-3-en-2-one;zirconium Chemical compound [Zr].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O YOBOXHGSEJBUPB-MTOQALJVSA-N 0.000 description 2
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 2
- KNTKCYKJRSMRMZ-UHFFFAOYSA-N 3-chloropropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCl KNTKCYKJRSMRMZ-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UEZVMMHDMIWARA-UHFFFAOYSA-N Metaphosphoric acid Chemical compound OP(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-N 0.000 description 2
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 2
- YDHWWBZFRZWVHO-UHFFFAOYSA-N [hydroxy(phosphonooxy)phosphoryl] phosphono hydrogen phosphate Chemical compound OP(O)(=O)OP(O)(=O)OP(O)(=O)OP(O)(O)=O YDHWWBZFRZWVHO-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 230000000845 anti-microbial effect Effects 0.000 description 2
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 2
- WBFZBNKJVDQAMA-UHFFFAOYSA-D dipotassium;zirconium(4+);pentacarbonate Chemical compound [K+].[K+].[Zr+4].[Zr+4].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O WBFZBNKJVDQAMA-UHFFFAOYSA-D 0.000 description 2
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 2
- 238000002296 dynamic light scattering Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000005246 galvanizing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 2
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910000484 niobium oxide Inorganic materials 0.000 description 2
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 229940005657 pyrophosphoric acid Drugs 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- CMZUMMUJMWNLFH-UHFFFAOYSA-N sodium metavanadate Chemical compound [Na+].[O-][V](=O)=O CMZUMMUJMWNLFH-UHFFFAOYSA-N 0.000 description 2
- GQJPVGNFTLBCIQ-UHFFFAOYSA-L sodium;zirconium(4+);carbonate Chemical compound [Na+].[Zr+4].[O-]C([O-])=O GQJPVGNFTLBCIQ-UHFFFAOYSA-L 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- UNXRWKVEANCORM-UHFFFAOYSA-N triphosphoric acid Chemical compound OP(O)(=O)OP(O)(=O)OP(O)(O)=O UNXRWKVEANCORM-UHFFFAOYSA-N 0.000 description 2
- 229940048102 triphosphoric acid Drugs 0.000 description 2
- 229910001935 vanadium oxide Inorganic materials 0.000 description 2
- UUUGYDOQQLOJQA-UHFFFAOYSA-L vanadyl sulfate Chemical compound [V+2]=O.[O-]S([O-])(=O)=O UUUGYDOQQLOJQA-UHFFFAOYSA-L 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- 229910052845 zircon Inorganic materials 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- XJUNLJFOHNHSAR-UHFFFAOYSA-J zirconium(4+);dicarbonate Chemical compound [Zr+4].[O-]C([O-])=O.[O-]C([O-])=O XJUNLJFOHNHSAR-UHFFFAOYSA-J 0.000 description 2
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 2
- MFWFDRBPQDXFRC-LNTINUHCSA-N (z)-4-hydroxypent-3-en-2-one;vanadium Chemical compound [V].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O MFWFDRBPQDXFRC-LNTINUHCSA-N 0.000 description 1
- PAJMKGZZBBTTOY-UHFFFAOYSA-N 2-[[2-hydroxy-1-(3-hydroxyoctyl)-2,3,3a,4,9,9a-hexahydro-1h-cyclopenta[g]naphthalen-5-yl]oxy]acetic acid Chemical compound C1=CC=C(OCC(O)=O)C2=C1CC1C(CCC(O)CCCCC)C(O)CC1C2 PAJMKGZZBBTTOY-UHFFFAOYSA-N 0.000 description 1
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- MBNRBJNIYVXSQV-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propane-1-thiol Chemical compound CCO[Si](C)(OCC)CCCS MBNRBJNIYVXSQV-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
- YLPZIQXAPFXTSN-UHFFFAOYSA-M 3-[diethoxy(methyl)silyl]propyl-dimethyl-octadecylazanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCC[Si](C)(OCC)OCC YLPZIQXAPFXTSN-UHFFFAOYSA-M 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- MHTNZWXLVMAGMO-UHFFFAOYSA-M 3-[dimethoxy(methyl)silyl]propyl-dimethyl-octadecylazanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCC[Si](C)(OC)OC MHTNZWXLVMAGMO-UHFFFAOYSA-M 0.000 description 1
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- KEZMLECYELSZDC-UHFFFAOYSA-N 3-chloropropyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CCCCl KEZMLECYELSZDC-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- NGDQQLAVJWUYSF-UHFFFAOYSA-N 4-methyl-2-phenyl-1,3-thiazole-5-sulfonyl chloride Chemical compound S1C(S(Cl)(=O)=O)=C(C)N=C1C1=CC=CC=C1 NGDQQLAVJWUYSF-UHFFFAOYSA-N 0.000 description 1
- DUFCMRCMPHIFTR-UHFFFAOYSA-N 5-(dimethylsulfamoyl)-2-methylfuran-3-carboxylic acid Chemical compound CN(C)S(=O)(=O)C1=CC(C(O)=O)=C(C)O1 DUFCMRCMPHIFTR-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 1
- 208000025721 COVID-19 Diseases 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 241000711573 Coronaviridae Species 0.000 description 1
- 235000015489 Emblica officinalis Nutrition 0.000 description 1
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 1
- 241000712431 Influenza A virus Species 0.000 description 1
- IMQLKJBTEOYOSI-GPIVLXJGSA-N Inositol-hexakisphosphate Chemical compound OP(O)(=O)O[C@H]1[C@H](OP(O)(O)=O)[C@@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@@H]1OP(O)(O)=O IMQLKJBTEOYOSI-GPIVLXJGSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- IMQLKJBTEOYOSI-UHFFFAOYSA-N Phytic acid Natural products OP(O)(=O)OC1C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C1OP(O)(O)=O IMQLKJBTEOYOSI-UHFFFAOYSA-N 0.000 description 1
- 229910002370 SrTiO3 Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 244000277583 Terminalia catappa Species 0.000 description 1
- 235000011517 Terminalia chebula Nutrition 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 241001478802 Valonia Species 0.000 description 1
- 229910021549 Vanadium(II) chloride Inorganic materials 0.000 description 1
- 229910021551 Vanadium(III) chloride Inorganic materials 0.000 description 1
- 229910021542 Vanadium(IV) oxide Inorganic materials 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 description 1
- QUEDYRXQWSDKKG-UHFFFAOYSA-M [O-2].[O-2].[V+5].[OH-] Chemical compound [O-2].[O-2].[V+5].[OH-] QUEDYRXQWSDKKG-UHFFFAOYSA-M 0.000 description 1
- IARREFARZQUSAH-UHFFFAOYSA-M [Zr+].CCCCCCCCCCCCCCCCCC([O-])=O Chemical compound [Zr+].CCCCCCCCCCCCCCCCCC([O-])=O IARREFARZQUSAH-UHFFFAOYSA-M 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- 229960000583 acetic acid Drugs 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 description 1
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- ZRIUUUJAJJNDSS-UHFFFAOYSA-N ammonium phosphates Chemical compound [NH4+].[NH4+].[NH4+].[O-]P([O-])([O-])=O ZRIUUUJAJJNDSS-UHFFFAOYSA-N 0.000 description 1
- 229940070337 ammonium silicofluoride Drugs 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- BSDOQSMQCZQLDV-UHFFFAOYSA-N butan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] BSDOQSMQCZQLDV-UHFFFAOYSA-N 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 150000001765 catechin Chemical class 0.000 description 1
- ADRVNXBAWSRFAJ-UHFFFAOYSA-N catechin Natural products OC1Cc2cc(O)cc(O)c2OC1c3ccc(O)c(O)c3 ADRVNXBAWSRFAJ-UHFFFAOYSA-N 0.000 description 1
- 235000005487 catechin Nutrition 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229920002770 condensed tannin Polymers 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 229910000388 diammonium phosphate Inorganic materials 0.000 description 1
- 235000019838 diammonium phosphate Nutrition 0.000 description 1
- NMGYKLMMQCTUGI-UHFFFAOYSA-J diazanium;titanium(4+);hexafluoride Chemical compound [NH4+].[NH4+].[F-].[F-].[F-].[F-].[F-].[F-].[Ti+4] NMGYKLMMQCTUGI-UHFFFAOYSA-J 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- WSFMFXQNYPNYGG-UHFFFAOYSA-M dimethyl-octadecyl-(3-trimethoxysilylpropyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCC[Si](OC)(OC)OC WSFMFXQNYPNYGG-UHFFFAOYSA-M 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- DUYCTCQXNHFCSJ-UHFFFAOYSA-N dtpmp Chemical compound OP(=O)(O)CN(CP(O)(O)=O)CCN(CP(O)(=O)O)CCN(CP(O)(O)=O)CP(O)(O)=O DUYCTCQXNHFCSJ-UHFFFAOYSA-N 0.000 description 1
- NFDRPXJGHKJRLJ-UHFFFAOYSA-N edtmp Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCN(CP(O)(O)=O)CP(O)(O)=O NFDRPXJGHKJRLJ-UHFFFAOYSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- MBGQQKKTDDNCSG-UHFFFAOYSA-N ethenyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(C=C)OCC MBGQQKKTDDNCSG-UHFFFAOYSA-N 0.000 description 1
- ZLNAFSPCNATQPQ-UHFFFAOYSA-N ethenyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C=C ZLNAFSPCNATQPQ-UHFFFAOYSA-N 0.000 description 1
- YRMWCMBQRGFNIZ-UHFFFAOYSA-N ethyl 3-oxobutanoate;zirconium Chemical compound [Zr].CCOC(=O)CC(C)=O YRMWCMBQRGFNIZ-UHFFFAOYSA-N 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229920001461 hydrolysable tannin Polymers 0.000 description 1
- XDBSEZHMWGHVIL-UHFFFAOYSA-M hydroxy(dioxo)vanadium Chemical compound O[V](=O)=O XDBSEZHMWGHVIL-UHFFFAOYSA-M 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 208000015181 infectious disease Diseases 0.000 description 1
- 230000002458 infectious effect Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 235000019837 monoammonium phosphate Nutrition 0.000 description 1
- YLBPOJLDZXHVRR-UHFFFAOYSA-N n'-[3-[diethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CCO[Si](C)(OCC)CCCNCCN YLBPOJLDZXHVRR-UHFFFAOYSA-N 0.000 description 1
- LIBWSLLLJZULCP-UHFFFAOYSA-N n-(3-triethoxysilylpropyl)aniline Chemical compound CCO[Si](OCC)(OCC)CCCNC1=CC=CC=C1 LIBWSLLLJZULCP-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- NQKOSCFDFJKWOX-UHFFFAOYSA-N n-[3-[diethoxy(methyl)silyl]propyl]aniline Chemical compound CCO[Si](C)(OCC)CCCNC1=CC=CC=C1 NQKOSCFDFJKWOX-UHFFFAOYSA-N 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- OGUCKKLSDGRKSH-UHFFFAOYSA-N oxalic acid oxovanadium Chemical compound [V].[O].C(C(=O)O)(=O)O OGUCKKLSDGRKSH-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- DYIZHKNUQPHNJY-UHFFFAOYSA-N oxorhenium Chemical compound [Re]=O DYIZHKNUQPHNJY-UHFFFAOYSA-N 0.000 description 1
- SJLOMQIUPFZJAN-UHFFFAOYSA-N oxorhodium Chemical compound [Rh]=O SJLOMQIUPFZJAN-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 229940068041 phytic acid Drugs 0.000 description 1
- 239000000467 phytic acid Substances 0.000 description 1
- 235000002949 phytic acid Nutrition 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003223 protective agent Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910003449 rhenium oxide Inorganic materials 0.000 description 1
- 229910003450 rhodium oxide Inorganic materials 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- BFDQRLXGNLZULX-UHFFFAOYSA-N titanium hydrofluoride Chemical compound F.[Ti] BFDQRLXGNLZULX-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 description 1
- JBIQAPKSNFTACH-UHFFFAOYSA-K vanadium oxytrichloride Chemical compound Cl[V](Cl)(Cl)=O JBIQAPKSNFTACH-UHFFFAOYSA-K 0.000 description 1
- VLOPEOIIELCUML-UHFFFAOYSA-L vanadium(2+);sulfate Chemical compound [V+2].[O-]S([O-])(=O)=O VLOPEOIIELCUML-UHFFFAOYSA-L 0.000 description 1
- ITAKKORXEUJTBC-UHFFFAOYSA-L vanadium(ii) chloride Chemical compound Cl[V]Cl ITAKKORXEUJTBC-UHFFFAOYSA-L 0.000 description 1
- HQYCOEXWFMFWLR-UHFFFAOYSA-K vanadium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[V+3] HQYCOEXWFMFWLR-UHFFFAOYSA-K 0.000 description 1
- 229940041260 vanadyl sulfate Drugs 0.000 description 1
- 229910000352 vanadyl sulfate Inorganic materials 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/14—Paints containing biocides, e.g. fungicides, insecticides or pesticides
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
- A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
- A61L2/08—Radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/063—Titanium; Oxides or hydroxides thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
-
- B01J35/30—
-
- B01J35/39—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/08—Anti-corrosive paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/07—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
Definitions
- the present invention relates to a painted metal plate.
- Patent Document 1 conventionally, there is a known technique for imparting an antiviral function to steel materials in advance.
- This technique is a technique in which a protective layer and a photocatalyst layer are sequentially formed on the coated steel material on the base of the coated steel material.
- the object of the present invention is to provide a coated metal plate that can further improve the photocatalytic effect while suppressing the cost.
- the present inventors have conducted extensive studies and found that, in the conventional technology disclosed in Patent Document 1, the light incident on the surface of the steel material contributes to the expression of the photocatalytic effect. It has been found that only the incident light to the steel material is doing. Based on this knowledge, as a result of further studies, if it is possible to reflect the incident light on the surface of the metal plate with higher efficiency and contribute to the expression of the photocatalytic effect for the reflected light, the photocatalytic effect can be achieved.
- the present invention has been completed based on the idea that it is possible to further improve it.
- the gist of the present invention completed based on such knowledge is as follows.
- a coated metal plate having a coating layer on at least one surface of the metal plate, wherein the coating layer is located on the outermost surface of the coating layer on at least one surface of the metal plate and has photocatalytic activity. It has a first coating layer containing at least a compound, and the average thickness of the first coating layer is 0.05 to 5.00 ⁇ m, and the total thickness from the surface of the metal plate to the outermost surface of the coating layer
- a coated metal sheet having a thickness of 15.00 ⁇ m or less and having a 60° specular gloss of 80% or more as defined in JIS Z8741:1997.
- the first coating layer further contains at least one element of Si or Zr, and the total concentration of the elements is 5 to 50 in terms of silica for Si and zirconia for Zr. % by mass, the coated metal sheet according to (1).
- the coating layer further includes a second coating layer located below the first coating layer and made of an inorganic component containing at least one element selected from Si and Zr.
- the coated metal sheet according to (1) or (2), wherein the second coating layer has an average thickness of 0.10 to 5.00 ⁇ m.
- the ratio of the average thickness of the third coating layer to the average thickness of the first coating layer is 0.5 to 20.0, and the fourth coating layer to the average thickness of the first coating layer
- the coated metal plate according to (6), wherein the ratio of the average thickness of is 0.3 to 20.0.
- the coated metal sheet according to any one of (1) to (8), wherein the compound having photocatalytic activity is anatase type titanium oxide.
- the coated metal sheet according to (9), wherein the anatase-type titanium oxide is metal-supported titanium oxide supported on at least one of Cu and Fe.
- the metal plate is a galvanized steel plate, a zinc-aluminum alloy plated steel plate, a zinc-aluminum-magnesium alloy plated steel plate, an aluminum plated steel plate, a zinc-nickel alloy plated steel plate, a zinc-iron alloy plated steel plate, an aluminum plate, or , a stainless steel plate, the coated metal plate according to any one of (1) to (12).
- FIG. 1A is an explanatory view schematically showing an example of the structure of a coated metal plate according to this embodiment.
- 1B to 2B are explanatory diagrams schematically showing another example of the structure of the coated metal plate according to this embodiment.
- a coated metal plate 1 has a coating layer on at least one surface of the metal plate.
- a layer it has at least a photocatalyst layer 20 as an example of a first coating layer.
- a hard resin base material such as melamine resin
- a metal plate is used as the substrate.
- various metal plates can be used as the metal plate 10 that is the base material.
- metal sheets include galvanized steel sheets, zinc-aluminum alloy plated steel sheets, zinc-aluminum-magnesium alloy plated steel sheets, aluminum plated steel sheets, zinc-nickel alloy plated steel sheets, zinc-iron alloy plated steel sheets, aluminum plates, A stainless steel plate etc. can be mentioned.
- the metal plate By using the metal plate as described above, it is possible to efficiently reflect the light incident on the coated metal plate 1 (in particular, the light in the ultraviolet to visible light band) on the surface of the metal plate 10 . As a result, in the coated metal plate 1 according to the present embodiment, it is possible to use the reflected light reflected by the surface of the metal plate 10 for photocatalytic reaction, as will be described later.
- the above metal plates zinc-aluminum-magnesium alloy plated steel plate, stainless steel plate, aluminum plated steel plate, zinc plated steel plate, zinc-aluminum alloy plated steel plate, etc. can efficiently reflect incident light, so they are particularly preferred.
- a plated surface having a design such as a hairline or spangle pattern is suitable because it can also be used as an exterior component.
- the thickness of the metal plate 10 as described above is not particularly limited. can be set as appropriate.
- the surface of the metal plate 10 (when using a metal plate to which various types of plating are applied as the metal plate 10, the plated surface) has a hairline pattern along the rolling direction of the metal plate, a spangle Various patterns such as patterns may be present. By providing such a pattern, it is possible to further improve the design of the coated metal plate 1 . Further, the design processing itself for providing such a pattern on the surface of the metal plate 10 contributes to further improvement of the 60° specular gloss as described below.
- the plated metal plate 10 focus on the plated metal plate 10 .
- an electroplating method or a hot-dip plating method can be employed.
- fine particles are generated on the plated surface, and as a result, the glossiness of the surface of the plated metal plate 10 (that is, the glossiness of the plated surface) may decrease.
- the surface of the plating is scraped, and as a result, the reflectance of light on the surface of the plating is improved, making it possible to improve the glossiness of the surface.
- the crystal orientation of the plating that reflects light more easily appears on the surface improving the reflectance of light on the plating surface and increasing the surface gloss can be improved.
- the thickness of the photocatalyst layer 20 as the first coating layer, and the thickness of the photocatalyst layer 20 as the first coating layer from the surface of the metal plate 10 in the coated metal plate 1 The total thickness up to the outermost surface is controlled to be in a specific state.
- design processing such as the hairline pattern and spangle pattern as described above is further applied, and such design processing also acts to further improve the 60° specular glossiness as described below. do.
- various known processing methods can be appropriately used.
- the photocatalyst layer 20 as an example of the first coating layer is the outermost surface of the coating layer on at least one surface of the metal plate 10, as schematically shown in FIG. 1A and contains at least a compound having photocatalytic activity (hereinafter sometimes abbreviated as "photocatalytic compound"). Since the photocatalyst layer 20 contains a compound having photocatalytic activity, the compound having such photocatalytic activity causes a photocatalytic reaction by light (in particular, light in the ultraviolet to visible light band) incident on the photocatalyst layer 20.
- light in particular, light in the ultraviolet to visible light band
- the coated metal plate 1 according to this embodiment can achieve various properties including antiviral effects and bactericidal effects.
- Photocatalytic activity mainly react with light in the ultraviolet light band (more specifically, by being excited by light in the ultraviolet light band) and exhibit photocatalytic activity, and compounds that mainly exhibit visible light. and a compound that reacts with light in the optical band (more specifically, is excited by light in the visible band) and exhibits photocatalytic activity.
- Examples of the compound that reacts with light in the ultraviolet band to exhibit photocatalytic activity include titanium oxide (more specifically, anatase-type titanium oxide), zinc oxide, cerium oxide, tin oxide, bismuth oxide, zirconium oxide, oxide Tungsten, chromium oxide, molybdenum oxide, iron oxide, nickel oxide, ruthenium oxide, cobalt oxide, copper oxide, manganese oxide, germanium oxide, lead oxide, cadmium oxide, vanadium oxide, niobium oxide, tantalum oxide, rhodium oxide, rhenium oxide, etc. , metal sulfides such as cadmium sulfide and zinc sulfide, and titanium compounds such as strontium titanate and barium titanate.
- titanium oxide more specifically, anatase-type titanium oxide
- zinc oxide cerium oxide, tin oxide, bismuth oxide, zirconium oxide, oxide Tungsten
- chromium oxide molybdenum oxide
- anatase titanium oxide, zinc oxide, tin oxide, zirconium oxide, tungsten oxide, iron oxide, niobium oxide, strontium titanate, etc. are particularly preferred as compounds that react with light in the ultraviolet light band to exhibit photocatalytic activity. It is preferably used, and anatase titanium oxide is more preferably used.
- the compound that reacts with light in the visible light band to exhibit photocatalytic activity includes, for example, metal-supported titanium oxide supported on at least one of Cu and Fe (more specifically, anatase type titanium oxide), anatase-type titanium oxide supported on Cr, V, Mn, Ni, Pt, anatase-type titanium oxide doped with anions such as nitrogen and sulfur, solid solutions of AgNbO3 and SrTiO3 , and the like. .
- anatase-type titanium oxide supported on at least one of Cu and Fe is particularly preferably used.
- the average particle size (primary particle size) of anatase-type titanium oxide is preferably 5 nm or more.
- the average particle size (primary particle size) of the anatase-type titanium oxide is 5 nm or more, the anatase-type titanium oxide can be dispersed more uniformly in the photocatalyst layer 20 .
- the average particle size (primary particle size) of anatase-type titanium oxide is more preferably 20 nm or more.
- the average particle size (primary particle size) of the anatase-type titanium oxide (including those in a metal-supported state) is preferably 200 nm or less.
- the anatase titanium oxide By setting the average particle diameter (primary particle diameter) of the anatase titanium oxide to 200 nm or less, the anatase titanium oxide is more uniformly distributed in the photocatalyst layer 20 while suppressing excessive aggregation of the anatase titanium oxide in the photocatalyst layer 20. can be distributed.
- the average particle size (primary particle size) of anatase-type titanium oxide is more preferably 100 nm or less.
- the average particle size of the anatase-type titanium oxide can be measured, for example, by a dynamic light scattering method using laser light. Such a method can easily obtain highly accurate measurement values.
- the size of the aggregates may be measured. It is preferable to check the primary particle size. When the presence of aggregated particles is confirmed as a result of TEM observation, it is preferable to change the dispersion conditions and perform measurement again by the dynamic light scattering method. If it is difficult to completely disperse the particles to the level of the primary particles, the size of the primary particles observed and measured with a TEM can be used as the primary particle size. In this case, the experience of the present inventor has shown that a representative value of all particles can be obtained by measuring approximately 100 or more arbitrarily selected particles.
- the following when measuring the average particle size of the anatase-type titanium oxide contained in the photocatalyst layer 20 after the fact, the following may be performed. That is, a cross section obtained by cutting the photocatalyst layer 20 along the thickness direction can be observed or analyzed using a transmission electron microscope (TEM). By using TEM, the primary particle size of the photocatalyst compound can be measured. Also, by performing EDS analysis together with TEM, the elements contained in the photocatalyst compound can be measured.
- TEM transmission electron microscope
- the crystal structure of the photocatalyst compound (for example, in the case of titanium oxide, whether it is anatase type or rutile type) can be known by electron beam diffraction. Based on the experience of the present inventor, it has been found that a representative value of all particles can be obtained by measuring approximately 100 or more arbitrarily selected particles.
- the concentration of anatase-type titanium oxide (including metal-supported titanium oxide) in the photocatalyst layer 20 is preferably 50% by mass or more in terms of titania.
- concentration of anatase-type titanium oxide in the photocatalyst layer 20 is 50% by mass or more, various photocatalytic effects including antiviral effects can be reliably exhibited.
- concentration of anatase-type titanium oxide in the photocatalyst layer 20 is more preferably 60% by mass or more in terms of titania.
- the concentration of anatase-type titanium oxide (including metal-supported titanium oxide) in the photocatalyst layer 20 is preferably 95% by mass or less in terms of titania.
- concentration of anatase-type titanium oxide in the photocatalyst layer 20 By setting the concentration of anatase-type titanium oxide in the photocatalyst layer 20 to 95% by mass or less, it is possible to exhibit various photocatalytic effects such as an antiviral effect while suppressing an increase in manufacturing costs.
- concentration of anatase-type titanium oxide in the photocatalyst layer 20 is more preferably 80% by mass or less in terms of titania.
- photocatalyst compounds other than anatase-type titanium oxide preferably have an average particle size of 5 to 200 nm, and the concentration thereof is preferably 50 to 95% by mass.
- Photocatalyst compounds represented by anatase-type titanium oxide and the like as described above include not only particulate substances, but also sol substances that cannot be said to be particulate, substances produced by heating metal complexes, and the like. can also be used as needed.
- the photocatalyst layer 20 further contains at least one element of Si or Zr, and the total concentration of such elements is 5% by mass or more in terms of silica for Si and zirconia for Zr. is preferred.
- the photocatalyst layer 20 is an inorganic film having a three-dimensional network structure inorganic component skeleton containing at least one element of Si or Zr and, in some cases, impurities.
- the total concentration of at least one element of Zr is preferably 5% by mass or more in terms of silica for Si and zirconia for Zr.
- the total content of at least one element selected from Si and Zr is more preferably 10% by mass or more.
- the photocatalyst layer 20 further contains at least one element of Si or Zr, and the total concentration of such elements is 50% by mass or less in terms of silica for Si and zirconia for Zr. is preferred.
- the total content of at least one element selected from Si and Zr is more preferably 40% by mass or less.
- Si or Zr to be contained preferably has excellent light transmittance, and is preferably an inorganic component that is less susceptible to decomposition by photocatalyst. Examples of such inorganic components containing Si and Zr include silica and zirconia.
- the photocatalyst layer 20 containing the above photocatalyst compound may contain an antibacterial agent, an adsorbent such as activated carbon or zeolite, if necessary, as long as the effects of the present invention are not impaired.
- the average thickness d 1 of the photocatalyst layer 20 (in the case of the layer structure shown in FIG. 1A, the total thickness d from the surface of the metal plate 10 to the outermost surface of the photocatalyst layer 20 (can also be regarded as the outermost surface of the coating layer). T ) is 0.05 ⁇ m or more.
- T is 0.05 ⁇ m or more.
- the average thickness d 1 of the photocatalyst layer 20 (in the case of the layer structure shown in FIG. 1A, it is also the total thickness d T from the surface of the metal plate 10 to the outermost surface of the photocatalyst layer 20) is 5.00 ⁇ m or less. is. If the average thickness d1 of the photocatalyst layer 20 exceeds 5.00 ⁇ m, the resulting photocatalytic effect is saturated, but the manufacturing cost increases, which is not preferable.
- the photocatalyst layer is an inorganic coating, workability is lowered.
- the average thickness d1 to 5.00 ⁇ m or less, it is possible to uniformly exhibit a desired photocatalytic effect over the entire photocatalytic layer 20 while suppressing an increase in manufacturing cost and a decrease in workability.
- the photocatalyst layer 20 Normally, light that passes through the photocatalyst layer 20 without impinging on the photocatalyst compound occurs with a certain probability. Conventionally, such light that does not act on the photocatalyst compound becomes light that does not have a photocatalytic effect. In the present embodiment, by reflecting such light on the surface of the metal plate 10, it is possible to increase the probability that the light incident on the photocatalyst layer 20 collides with the photocatalyst compound. Thereby, in this embodiment, the photocatalyst effect can be further improved. In the case of the layer structure shown in FIG. 1A, the total thickness dT from the surface of the metal plate 10 to the outermost surface of the photocatalyst layer 20 is naturally 15.00 ⁇ m or less.
- the reflected light reflected at the interface between the metal plate 10 and the photocatalyst layer 20 can be used for the photocatalytic reaction by the photocatalytic compound, so the photocatalytic effect is further improved while suppressing the cost. be able to.
- the average thickness d1 of the photocatalyst layer 20 is preferably 0.10 ⁇ m or more, more preferably 0.15 ⁇ m or more. Also, the average thickness d1 of the photocatalyst layer 20 is preferably 2.00 ⁇ m or less, more preferably 1.00 ⁇ m or less.
- the coated metal plate 1 having the layer structure as shown in FIG. The 60° specular gloss defined by JIS Z8741:1997 measured from the side provided with is 80% or more.
- the coated metal plate 1 according to the present embodiment has a 60° specular glossiness of 80% or more as described above, so that the reflected light generated at the interface between the metal plate 10 and the photocatalyst layer 20 can be effectively It can be used for , and exhibits excellent antiviral performance.
- the light colliding with the photocatalyst is not detected as reflected light, such light is a very small part of the whole in the coating structure of the present invention.
- the antiviral property is excellent if the 60° specular glossiness specified in the present invention is 80% or more.
- the 60° specular glossiness is preferably 90% or more, more preferably 130% or more.
- the upper limit of the 60° specular glossiness is not particularly specified, it is difficult to exceed 200%, and such a value is considered to be the substantial upper limit.
- the 60° specular gloss can be measured using a gloss meter conforming to the JIS standard.
- the coated metal plate 1 according to the present embodiment which has a layer structure as shown in FIG. 1A, has a further coating layer that functions as a chemical conversion coating layer between the metal plate 10 and the photocatalyst layer 20.
- a chemical conversion coating layer between the metal plate 10 and the photocatalyst layer 20 may be provided.
- the adhesion between the metal plate 10 and the photocatalyst layer 20 can be further improved.
- the coated metal plate 1 when a chemical conversion coating layer is further provided, the following two types of layer configurations are realized according to the type of compound component constituting the chemical conversion coating layer. is preferred.
- FIGS. 1B to 3 the layer structure of a coated metal sheet having a chemical conversion film layer will be described in detail.
- 1B to 2 are explanatory diagrams schematically showing another example of the structure of the coated metal plate according to this embodiment.
- FIG. 3 is an explanatory diagram for explaining the coated metal plate according to this embodiment.
- FIGS. 1B and 1C are schematic views schematically showing the layer structure of the coated metal plate 1 when an inorganic chemical conversion coating layer made of inorganic components is provided as the chemical conversion coating layer.
- the coated metal plate 1 according to the present embodiment has an inorganic chemical conversion coating layer 30 as an example of the second coating layer between the metal plate 10 and the photocatalyst layer 20 as described above.
- Photocatalyst compounds typified by anatase-type titanium oxide have extremely excellent oxidizing properties, so when a coating layer is provided on the lower layer side than the layer in which the photocatalyst compound is present, protection for protecting such coating layer It often forms layers.
- the chemical conversion coating layer from an inorganic component, it becomes possible to dispose the chemical conversion coating layer without providing a protective layer.
- the inorganic chemical conversion treatment film layer 30 is formed by chemical conversion treatment after removing impurities such as oil and surface oxides adhering to the surface of the metal plate 10 by a known degreasing process and washing process.
- the inorganic chemical conversion coating layer 30 is made of an inorganic component containing at least one element of Si and Zr.
- the inorganic chemical conversion treatment film layer 30 may further contain an inorganic component containing at least one of P and V elements.
- the film-forming properties after application of the chemical conversion treatment liquid and the barrier properties of the coating against corrosive factors such as moisture and corrosive ions ( Denseness) and adhesion of the film to the surface of the metal plate are improved, contributing to raising the corrosion resistance of the film.
- Examples of inorganic components containing Si include ⁇ -(2-aminoethyl)aminopropyltrimethoxysilane, ⁇ -(2-aminoethyl)aminopropylmethyldimethoxysilane, ⁇ -(2- aminoethyl)aminopropyltriethoxysilane and the like.
- Examples of inorganic components containing Zr include zirconium carbonate, ammonium zirconium carbonate, potassium zirconium carbonate, sodium zirconium carbonate, and ammonium zirconium carbonate.
- inorganic components containing P include phosphoric acids such as phosphoric acid, orthophosphoric acid, metaphosphoric acid, pyrophosphoric acid, triphosphoric acid and tetraphosphoric acid, salts thereof, ammonium dihydrogen phosphate, and the like. be able to.
- inorganic components containing V include ammonium metavanadate (V), potassium metavanadate (V), sodium metavanadate (V), and vanadyl sulfate (IV).
- inorganic chemical conversion treatment film layer 30 it is possible to use the various inorganic components described above either singly or in combination.
- the content of various inorganic components as described above may also be adjusted as appropriate.
- the average thickness d2 of the inorganic chemical conversion coating layer 30 is preferably 0.10 ⁇ m or more , more preferably 0.20 ⁇ m or more. As a result, while uniformly forming the inorganic chemical conversion coating layer 30 on the surface of the metal plate 10, it is possible to stably exhibit the various effects of providing the chemical conversion coating layer as described above. . Also, the average thickness d2 of the inorganic chemical conversion coating layer 30 is preferably 5.00 ⁇ m or less, more preferably 1.00 ⁇ m or less. As a result, while uniformly forming the inorganic chemical conversion coating layer 30 on the surface of the metal plate 10, it is possible to stably exhibit the various effects of providing the chemical conversion coating layer as described above. .
- the ratio (d 2 /d 1 ) of the average thickness d 2 of the inorganic chemical conversion coating layer 30 to the average thickness d 1 of the photocatalyst layer 20 is preferably 0.3 or more, and is 0.5 or more. It is more preferable to have This makes it possible to further improve the working adhesion.
- the ratio (d 2 /d 1 ) of the average thickness d 2 of the inorganic chemical conversion coating layer 30 to the average thickness d 1 of the photocatalyst layer 20 is preferably 12.0 or less, and 5.0 or less. It is more preferable to have This makes it possible to further improve the working adhesion.
- coated metal plate 1 according to the present embodiment may further have various known layers, including layers and the like.
- the reflected light reflected by the surface of the metal plate 10 (in other words, the interface between the metal plate 10 and the photocatalyst layer 20) is converted into a photocatalyst by the photocatalyst compound. Since it can be used for the reaction, it is possible to further improve the photocatalytic effect while suppressing an increase in cost.
- the 60° specular gloss defined by JIS Z8741:1997, which is measured from the side on which the photocatalyst layer 20 is provided, of the coated metal plate 1 is 80% or more. becomes.
- the total thickness dT is 15.00 ⁇ m or less and the 60° specular glossiness is 80% or more, the incident light reflected on the surface of the metal plate 10 is treated as a photocatalyst by the photocatalyst compound. It can be considered that it is used for the reaction.
- the coated metal plate 1 when an organic chemical conversion coating layer containing an organic component is provided as the chemical conversion coating layer.
- the coated metal plate 1 according to the present embodiment includes an organic chemical conversion treatment film layer 40 as an example of a third film layer and a fourth film between the metal plate 10 and the photocatalyst layer 20 as described above. and a protective layer 50 as an example of a layer.
- Organic chemical conversion coating layer 40 is a layer located below the photocatalyst layer 20 (more specifically, the surface of the metal plate 10), and removes impurities such as oil adhering to the surface of the metal plate 10 and surface oxides. , is formed by chemical conversion treatment after removal by known degreasing and washing processes.
- the organic chemical conversion treatment film layer 40 includes, for example, resins, silane coupling agents, zirconium compounds, silica, phosphoric acid and salts thereof, fluorides, vanadium compounds, and a group consisting of tannin or tannic acid. Any one or more selected from may be contained. By containing these substances, it is possible to further improve the film-forming property after applying the chemical conversion treatment solution, the barrier property (denseness) of the film against corrosion factors such as moisture and corrosive ions, and the film adhesion to the surface of the metal plate. etc., and contributes to raising the corrosion resistance of the film.
- the organic chemical conversion treatment film layer 40 contains one or more of a silane coupling agent or a zirconium compound, a crosslinked structure is formed in the organic chemical conversion treatment film layer 40, and the surface of the metal plate is formed. Since bonding is also strengthened, it is possible to further improve the adhesion and barrier properties of the film.
- the organic chemical conversion treatment film layer 40 contains at least one of silica, phosphoric acid and its salts, fluoride, or vanadium compound, it functions as an inhibitor, and a precipitated film or passivation film is formed on the surface of the metal plate. By forming a film, it becomes possible to further improve the corrosion resistance.
- resins examples include known organic resins such as polyester resins, polyurethane resins, epoxy resins, phenol resins, acrylic resins, and polyolefin resins.
- organic resins such as polyester resins, polyurethane resins, epoxy resins, phenol resins, acrylic resins, and polyolefin resins.
- the resin may be used alone or in combination of two or more.
- the content of the resin in the organic chemical conversion coating layer 40 is, for example, preferably 0% by mass or more, more preferably 1% by mass or more, relative to the solid content of the coating. Thereby, corrosion resistance can be improved.
- the content of the resin in the organic chemical conversion coating layer 40 is, for example, preferably 85% by mass or less, more preferably 60% by mass or less, and 40% by mass or less relative to the solid content of the coating. is more preferable. By setting the resin content to 85% by mass or less, it is possible to improve the corrosion resistance of the coating while ensuring the performance required of the coating other than the corrosion resistance.
- Silane coupling agents include, for example, ⁇ -(2-aminoethyl)aminopropyltrimethoxysilane, ⁇ -(2-aminoethyl)aminopropylmethyldimethoxysilane, ⁇ -(2-aminoethyl)aminopropyltriethoxysilane.
- the addition amount of the silane coupling agent in the chemical conversion treatment agent for forming the organic chemical conversion treatment film layer 40 can be, for example, 2 to 80 g/L.
- the addition amount of the silane coupling agent By setting the addition amount of the silane coupling agent to 2 g/L or more, it is possible to improve the adhesion to the surface of the metal plate and improve the processing adhesion of the coating film. Further, by setting the amount of the silane coupling agent added to 80 g/L or less, it is possible to maintain the cohesive force of the chemical conversion film and improve the processing adhesion of the coating film.
- the silane coupling agents as exemplified above may be used alone or in combination of two or more.
- zirconium compound examples include zirconium normal propylate, zirconium normal butyrate, zirconium tetraacetylacetonate, zirconium monoacetylacetonate, zirconium bisacetylacetonate, zirconium monoethylacetoacetate, zirconium acetylacetonate bisethylacetoacetate, Zirconium acetate, zirconium monostearate, zirconium carbonate, ammonium zirconium carbonate, potassium zirconium carbonate, sodium zirconium carbonate and the like can be mentioned.
- the amount of the zirconium compound added in the chemical conversion treatment agent for forming the organic chemical conversion treatment film layer 40 can be, for example, 2 to 80 g/L.
- the addition amount of the zirconium compound By setting the addition amount of the zirconium compound to 2 g/L or more, it is possible to improve the adhesion to the surface of the metal plate and to improve the processing adhesion of the coating film. Further, by setting the amount of the zirconium compound to be added to 80 g/L or less, it is possible to maintain the cohesive force of the chemical conversion film and improve the processing adhesion of the coating film.
- Such zirconium compounds may be used alone or in combination of two or more.
- silica examples include commercially available products such as “Snowtex N”, “Snowtex C”, “Snowtex UP”, and “Snowtex PS” manufactured by Nissan Chemical Industries, Ltd., and “Adelite AT-20Q” manufactured by ADEKA Corporation. or powdered silica such as Aerosil #300 manufactured by Nippon Aerosil Co., Ltd. can be used. Silica can be appropriately selected according to the required performance of the coated metal sheet.
- the amount of silica added to the chemical conversion agent for forming the organic chemical conversion coating layer 40 is preferably 1 to 40 g/L. By setting the amount of silica to be added to 1 g/L or more, it is possible to improve the processing adhesion of the coating film. Further, by setting the amount of silica to be added to 40 g/L or less, it is possible to achieve both effects of working adhesion and corrosion resistance while suppressing an increase in cost.
- phosphoric acid and salts thereof examples include phosphoric acids such as orthophosphoric acid, metaphosphoric acid, pyrophosphoric acid, triphosphoric acid and tetraphosphoric acid and salts thereof, ammonium salts such as triammonium phosphate and diammonium hydrogen phosphate, Phosphonic acids such as aminotri(methylenephosphonic acid), 1-hydroxyethylidene-1,1-diphosphonic acid, ethylenediaminetetra(methylenephosphonic acid), diethylenetriaminepenta(methylenephosphonic acid) and their salts, organic phosphoric acids such as phytic acid and salts thereof.
- phosphoric acids such as orthophosphoric acid, metaphosphoric acid, pyrophosphoric acid, triphosphoric acid and tetraphosphoric acid and salts thereof
- ammonium salts such as triammonium phosphate and diammonium hydrogen phosphate
- Phosphonic acids such as aminotri(methylenephosphonic acid), 1-hydroxyethylidene-1,1-
- salts of phosphoric acid other than ammonium salts include metal salts with Na, Mg, Al, K, Ca, Mn, Ni, Zn, Fe, and the like.
- Phosphoric acid and its salt may be used alone or in combination of two or more.
- the content of phosphoric acid and its salt is preferably 0% by mass or more, more preferably 1% by mass or more, relative to the solid content of the film. Also, the content of phosphoric acid and its salt is preferably 20% by mass or less, more preferably 10% by mass or less, relative to the coating solid content. When the content of phosphoric acid and its salts is 20% by mass or less, embrittlement of the film can be prevented, and deterioration of the working adhesion of the film during molding of the coated metal sheet can be prevented. .
- fluorides include ammonium zircon fluoride, ammonium silicofluoride, ammonium titanium fluoride, sodium fluoride, potassium fluoride, calcium fluoride, lithium fluoride, titanium hydrofluoric acid, and zircon hydrofluoric acid. . Such fluorides may be used alone or in combination of two or more.
- the content of fluoride is preferably 0% by mass or more, more preferably 1% by mass or more, relative to the solid content of the film.
- the content of fluoride is preferably 20% by mass or less, more preferably 10% by mass or less, relative to the solid content of the film.
- vanadium compound examples include vanadium pentoxide, metavanadic acid, ammonium metavanadate, sodium metavanadate, vanadium oxytrichloride, and other vanadium compounds obtained by reducing pentavalent vanadium compounds to divalent to tetravalent vanadium trioxide. , vanadium dioxide, vanadium oxysulfate, vanadium oxyoxalate, vanadium oxyacetylacetonate, vanadium acetylacetonate, vanadium trichloride, phosphovanadomolybdic acid, vanadium sulfate, vanadium dichloride, vanadium oxide, etc.
- a vanadium compound etc. can be mentioned.
- Such vanadium compounds may be used alone or in combination of two or more.
- the content of the vanadium compound is preferably 0% by mass or more, more preferably 1% by mass or more, relative to the solid content of the film. Moreover, the content of the vanadium compound is preferably 20% by mass or less, more preferably 10% by mass or less, relative to the solid content of the film. When the content of the vanadium compound is 20% by mass or less, embrittlement of the film can be prevented, and deterioration of working adhesion of the film during molding of the coated metal sheet can be prevented.
- tannin or tannic acid Both hydrolyzable tannin and condensed tannin can be used as tannin or tannic acid.
- tannins and tannic acids include hamameta tannins, quintuple tannins, gallic tannins, myrobalan tannins, divisibi tannins, algarovira tannins, valonia tannins, catechins, and the like.
- the amount of tannin or tannic acid added to the chemical conversion agent for forming the organic chemical conversion coating layer 40 can be 2 to 80 g/L. By setting the amount of tannin or tannic acid added to 2 g/L or more, the adhesion to the metal plate surface can be improved, and the processing adhesion of the coating film can be improved. Further, by setting the amount of tannin or tannic acid to be added to 80 g/L or less, the cohesive force of the chemical conversion film can be maintained, and the processing adhesion of the coating film can be improved.
- an acid, an alkali, or the like may be added to the chemical conversion treatment agent for forming the organic chemical conversion treatment film layer 40 for pH adjustment within a range that does not impair the performance.
- the average thickness d3 of the organic chemical conversion coating layer 40 is preferably 0.10 ⁇ m or more, more preferably 0.20 ⁇ m or more, and even more preferably 0.30 ⁇ m or more. As a result, while the organic chemical conversion coating layer 40 is formed uniformly on the surface of the metal plate 10, various effects of providing the chemical conversion coating layer as described above can be stably exhibited. . Also, the average thickness d3 of the organic chemical conversion coating layer 40 is preferably 5.00 ⁇ m or less, more preferably 4.00 ⁇ m or less, and even more preferably 3.00 ⁇ m or less. As a result, while the organic chemical conversion coating layer 40 is formed uniformly on the surface of the metal plate 10, various effects of providing the chemical conversion coating layer as described above can be stably exhibited. .
- the ratio ( d3/d1) of the average thickness d3 of the organic chemical conversion coating layer 40 to the average thickness d1 of the photocatalyst layer 20 is preferably 0.5 or more, and 2.0 or more. It is more preferable to have This makes it possible to further improve the adhesion of the processed portion.
- the ratio ( d3/d1) of the average thickness d3 of the organic chemical conversion coating layer 40 to the average thickness d1 of the photocatalyst layer 20 is preferably 20.0 or less, and 10.0 or less. It is more preferable to have This makes it possible to further improve the adhesion of the processed portion.
- the protective layer 50 is a layer provided between the photocatalyst layer 20 and the organic chemical conversion treatment film layer 40 (more preferably directly under the photocatalyst layer 20), and is protected from the oxidizing power of the photocatalyst compound contained in the photocatalyst layer 20. , are provided to protect layers located below the photocatalyst layer 20 .
- the specific components of the protective layer 50 can contain various known components. Examples of such components include inorganic oxides such as silica and zirconia. Moreover, the specific contents of these components may also be adjusted as appropriate.
- the protective layer 50 also preferably has excellent light transmittance, like the photocatalyst layer 20 .
- the protective layer 50 having excellent light transmittance, it is possible to use, for example, the same components as the components other than the photocatalyst compound in the photocatalyst layer 20 .
- the average thickness d4 of the protective layer 50 is preferably 0.05 ⁇ m or more, more preferably 0.20 ⁇ m or more. This makes it possible to reliably protect the layers located below the protective layer 50 from the oxidizing power of the photocatalyst compound while suppressing deterioration in workability. Also, the average thickness d4 of the protective layer 50 is preferably 5.00 ⁇ m or less, more preferably 0.60 ⁇ m or less. This makes it possible to reliably protect the layers located below the protective layer 50 from the oxidizing power of the photocatalyst compound while suppressing deterioration in workability.
- the ratio (d 4 /d 1 ) of the average thickness d 4 of the protective layer 50 to the average thickness d 1 of the photocatalyst layer 20 is preferably 0.3 or more, more preferably 1.0 or more. preferable. This makes it possible to reliably suppress the decomposition of the organic chemical conversion coating layer 40 by the photocatalyst layer 20 .
- the ratio (d 4 /d 1 ) of the average thickness d 4 of the protective layer 50 to the average thickness d 1 of the photocatalyst layer 20 is preferably 20.0 or less, more preferably 3.0 or less. preferable. This makes it possible to reliably suppress the decomposition of the organic chemical conversion coating layer 40 by the photocatalyst layer 20 .
- the coated metal plate 1 has various colors, for example, between the photocatalyst layer 20 and the protective layer 50 and the organic chemical conversion coating layer 40. It may further have various known layers including a colored layer containing a pigment.
- the reflected light reflected by the surface of the metal plate 10 (in other words, the interface between the metal plate 10 and the photocatalyst layer 20) is converted into a photocatalyst by the photocatalyst compound. Since it can be used for reactions, it is possible to further improve the photocatalytic effect while suppressing costs.
- the 60° specular glossiness defined by JIS Z8741:1997 measured from the side where the photocatalyst layer 20 is provided is 80% or more.
- the total thickness dT is 15.00 ⁇ m or less and the 60° specular glossiness is 80% or more, the incident light reflected on the surface of the metal plate 10 is treated as a photocatalyst by the photocatalyst compound. It can be considered that it is used for the reaction.
- each layer including the photocatalyst layer 20 is provided on one side surface of the metal plate 10, but each layer including the photocatalyst layer 20 is the metal plate 10. may be provided on both sides of the In this case, the total thickness dT from the surface of the metal plate 10 to the surface of the photocatalyst layer 20 on each surface of the coated metal plate 1 is set to 15.00 ⁇ m or less. Also, the 60° specular glossiness is 80% or more on each side of the coated metal plate 1 . Moreover, when the inorganic chemical conversion coating layer 30 described above is provided, the protective layer 50 as described above may be formed.
- coated metal plate according to the present embodiment has been described in detail above with reference to FIGS. 1A to 3.
- the average thickness of each layer including the photocatalyst layer can be measured by observing the layer of interest with a microscope from the cross-sectional direction.
- a method for preparing a sample to be observed from the cross-sectional direction known methods such as embedding in resin and polishing the observation surface, FIB processing, and microtome method can be used.
- the type of microscope known devices such as SEM and TEM can be used.
- the surface of the metal plate serving as the base material is subjected to various pretreatments such as cleaning as necessary, and then the photocatalyst layer is formed.
- the photocatalyst treatment agent, the chemical conversion treatment agent for forming the chemical conversion coating layer, and the protective treatment agent for forming the protective layer are applied to form the desired layer structure, and then dried and baked. can do.
- various coating materials can be applied by generally known coating methods such as roll coating, curtain flow coating, air spray, airless spray, immersion, bar coating, and brush coating.
- roll coating is a feature of this product and enables stable coating with a thin film.
- conditions for drying and baking are not particularly limited, and may be set appropriately according to the paint used.
- coated metal sheet according to the present invention will be specifically described below while showing examples and comparative examples.
- the examples shown below are merely examples of the coated metal sheet according to the present invention, and the coated metal sheet according to the present invention is not limited to the following examples.
- Table 1 Eight types of metal plates shown in Table 1 below were prepared as base metal plates.
- the six types of metal sheets represented by SD, ZL, GI, GL, AL, and GA are various plated steel sheets using steel sheets as base materials.
- the plate thickness of each metal plate, and the plating composition and coating amount/standard of each plated steel plate are shown in Table 1 below.
- photocatalytic compounds As compounds having photocatalytic activity (photocatalytic compounds), seven types of compounds shown in Table 2 below were prepared. Any photocatalyst compound used what is marketed. The supported metals and average particle diameters are also shown in Table 2.
- Table 3 shows the raw materials of the water-based paint (chemical conversion treatment agent) for forming the inorganic chemical conversion treatment film and the organic chemical conversion treatment film used, and the concentration in the dry film. The amount added was adjusted so that the concentration of each component in the dry film would be a predetermined concentration. The solid concentration of the treatment agent was adjusted by adding ion-exchanged water so that the inorganic chemical conversion treatment film had a solid content concentration of 10 mass % and the organic chemical conversion treatment film had a solid content concentration of 20 mass %. Each treatment agent was applied so as to have a dry film thickness shown in Tables 4-1 and 4-2 below. After that, the metal plate was dried in an induction heating furnace so that the reaching temperature of the metal plate was 150° C., and then water-cooled by spraying.
- the photocatalyst treatment agent used and the method for preparing the protective treatment agent will be described.
- the protective treatment agent was adjusted to have a solid concentration of 8% by mass in consideration of storage stability. The concentration was adjusted by diluting with n-butanol.
- the photocatalyst treatment agent was prepared by adding a predetermined amount of the compound shown in Table 2 to the following protective treatment agent.
- the solid content concentration of the photocatalyst compound is as shown in Tables 4-1 and 4-2 below.
- Protective film treatment agent Si-based: tetraethoxysilane (22.5 parts by mass), methacryloxypropyltrimethoxysilane (2.8 parts by mass), n-butanol (26 parts by mass), were mixed and stirred at 60° C. for 2 hours. While this mixture was stirred, a mixture of 26% by mass hydrochloric acid (3 parts by mass) and n-butanol (26 parts by mass) was added dropwise at a rate of 1 drop/second. After that, the mixture was kept at 60° C. for 2 hours with stirring to obtain a treating agent. A series of operations were performed in a nitrogen atmosphere.
- Protective film treatment agent Zr-based: zirconium n-butoxide (34.5 parts by mass), n-butanol (11.6 parts by mass), and 1,5-diaminopentane (0.5 parts by mass) ) and yttrium nitrate (2.8 parts by mass) were mixed and stirred for 1 hour. After that, glacial acetic acid (4.8 parts by mass) was added, and the mixture was stirred for 40 hours. After that, concentrated nitric acid (0.6 parts by mass) was added dropwise at a rate of 1 drop/second and stirred for 2 hours to obtain a treating agent. A series of operations were performed in a nitrogen atmosphere.
- coated metal plates having the configurations shown in Tables 4-1 and 4-2 below were produced by roll coating. Each layer was formed on one side of the metal plate. Also, for some of the coated metal plates, the surface of the metal plate was subjected to design processing to form a hairline pattern. In addition, for some painted metal sheets, a hot-dip galvanizing bath containing 0.1% by mass of Sb and 0.2% by mass of Al is used, and by adjusting the solidification speed of the hot-dip galvanizing, spangle A patterned plated steel sheet was used as the substrate.
- the average film thickness of each layer in the coated metal plate as described above was measured by embedding the obtained coated metal plate in resin and observing the observation surface obtained by polishing the cross section with a microscope.
- the 60° specular gloss was measured with a gloss meter (UGV-6P manufactured by Suga Test Instruments Co., Ltd.) conforming to JIS Z8741:1997.
- the obtained coated metal plate was evaluated from the viewpoint of antiviral properties, processing adhesion, and corrosion resistance. Detailed evaluation methods are as follows.
- the antiviral properties were verified by measuring the virus infectivity titer through the following antiviral test in accordance with the antiviral standards stipulated by the Antimicrobial Product Technology Council. More specifically, each coated metal plate was placed on a petri dish with the evaluation surface facing up, and a virus suspension containing influenza A virus was dropped onto the evaluation surface. After that, the coated metal plate was covered with a film to bring the virus suspension into close contact with the entire surface to be evaluated, and then the petri dish was covered with a lid. The petri dish was allowed to stand for 24 hours in a room at 25° C. with an illumination of 1000 lux, simulating a room in a general office. After that, the film surface and the evaluation surface were washed to remove viruses, and the virus infectivity titer (unit: PFU/cm 2 , PFU: Plaque Forming Units) in the obtained washing solution was measured by the plaque measurement method.
- the virus infectivity titer unit: PFU/cm 2 , PFU: Plaque
- each metal plate without a photocatalyst layer was also subjected to the same antiviral test.
- the extent to which the infectious titer decreased was evaluated as the activity value. If the virus is reduced by 10 2 or more (in other words, if the activity value is 1 ⁇ 10 2 or more), the use of the certified seal stipulated by the Antimicrobial Product Technology Council is permitted. Those with an activity value of 1 ⁇ 10 2 or more were judged to be acceptable. Table 5 below shows the logarithmic values of the obtained activity values.
- a salt spray test (SST) in accordance with JIS Z 2371 was performed for 72 hours with the end face of the test material tape-sealed. After the end of the test, the state of rust generation on the flat portion was observed, and the corrosion resistance was evaluated according to the following evaluation criteria. The pass level was 3 or higher.
- White rust generated area is less than 1% of the total area of one side of the test material 4: White rust generated area is 1% or more and less than 5% of the total area of one side of the test material 3: White rust The generated area is 5% or more and less than 10% of the total area of one side of the test material 2: The white rust generation area is 10% or more and less than 30% of the total area of one side of the test material 1: White rust The generated area is 30% or more of the total area of one side of the test material
- coated metal plate 10 metal plate 20 photocatalyst layer (first coating layer) 30 Inorganic chemical conversion coating layer (second coating layer) 40 Organic chemical conversion coating layer (third coating layer) 50 protective layer (fourth coating layer)
Abstract
Description
かかる知見に基づき完成された本発明の要旨は、以下の通りである。 In order to solve the above problems, the present inventors have conducted extensive studies and found that, in the conventional technology disclosed in
The gist of the present invention completed based on such knowledge is as follows.
(2)前記第1皮膜層は、更に、Si又はZrの少なくとも何れか1種の元素を含有し、前記元素の合計濃度は、Siについてはシリカ換算、Zrについてはジルコニア換算で、5~50質量%である、(1)に記載の塗装金属板。
(3)前記皮膜層として、前記第1皮膜層の下層に位置し、Si又はZrの少なくとも何れか1種以上の元素を有する無機系成分からなる第2皮膜層を更に有しており、前記第2皮膜層の平均厚みは、0.10~5.00μmである、(1)又は(2)に記載の塗装金属板。
(4)前記第2皮膜層は、更に、P又はVの少なくとも何れか1種の元素を有する無機系成分を含有する、(3)に記載の塗装金属板。
(5)前記第1皮膜層の平均厚みに対する、前記第2皮膜層の平均厚みの比率は、0.3~12.0である、(3)又は(4)に記載の塗装金属板。
(6)前記皮膜層として、前記第1皮膜層の下層に位置する、有機系成分を含む第3皮膜層と、前記第1皮膜層と前記第3皮膜層との間に位置する第4皮膜層と、を更に有しており、前記第3皮膜層の平均厚みは、0.10~5.00μmであり、前記第4皮膜層の平均厚みは、0.05~5.00μmである、(1)又は(2)に記載の塗装金属板。
(7)前記第1皮膜層の平均厚みに対する、前記第3皮膜層の平均厚みの比率は、0.5~20.0であり、前記第1皮膜層の平均厚みに対する、前記第4皮膜層の平均厚みの比率は、0.3~20.0である、(6)に記載の塗装金属板。
(8)前記金属板の表面から前記第1皮膜層の最表面までの合計厚みは、10.00μm以下である、(1)~(7)の何れか1つに記載の塗装金属板。
(9)前記光触媒活性を有する化合物は、アナターゼ型酸化チタンである、(1)~(8)の何れか1つに記載の塗装金属板。
(10)前記アナターゼ型酸化チタンは、Cu又はFeの少なくとも何れか一方の金属に担持された、金属担持型の酸化チタンである、(9)に記載の塗装金属板。
(11)前記第1皮膜層における前記アナターゼ型酸化チタンの濃度は、チタニア換算で、50~95質量%である、(9)又は(10)に記載の塗装金属板。
(12)前記アナターゼ型酸化チタンの平均粒径は、5~200nmである、(9)~(11)の何れか1つに記載の塗装金属板。
(13)前記金属板は、亜鉛めっき鋼板、亜鉛-アルミニウム合金めっき鋼板、亜鉛-アルミニウム-マグネシウム合金めっき鋼板、アルミニウムめっき鋼板、亜鉛-ニッケル合金めっき鋼板、亜鉛-鉄合金めっき鋼板、アルミニウム板、又は、ステンレス板である、(1)~(12)の何れか1つに記載の塗装金属板。
(14)前記金属板の表面には、当該金属板の圧延方向に沿ったヘアラインが存在する、(1)~(13)の何れか1つに記載の塗装金属板。
(15)前記金属板の表面には、スパングル模様が存在する、(1)~(13)の何れか1つに記載の塗装金属板。 (1) A coated metal plate having a coating layer on at least one surface of the metal plate, wherein the coating layer is located on the outermost surface of the coating layer on at least one surface of the metal plate and has photocatalytic activity. It has a first coating layer containing at least a compound, and the average thickness of the first coating layer is 0.05 to 5.00 μm, and the total thickness from the surface of the metal plate to the outermost surface of the coating layer A coated metal sheet having a thickness of 15.00 µm or less and having a 60° specular gloss of 80% or more as defined in JIS Z8741:1997.
(2) The first coating layer further contains at least one element of Si or Zr, and the total concentration of the elements is 5 to 50 in terms of silica for Si and zirconia for Zr. % by mass, the coated metal sheet according to (1).
(3) The coating layer further includes a second coating layer located below the first coating layer and made of an inorganic component containing at least one element selected from Si and Zr. The coated metal sheet according to (1) or (2), wherein the second coating layer has an average thickness of 0.10 to 5.00 μm.
(4) The coated metal sheet according to (3), wherein the second coating layer further contains an inorganic component having at least one element of P or V.
(5) The coated metal sheet according to (3) or (4), wherein the ratio of the average thickness of the second coating layer to the average thickness of the first coating layer is 0.3 to 12.0.
(6) As the coating layers, a third coating layer containing an organic component positioned below the first coating layer, and a fourth coating positioned between the first coating layer and the third coating layer. and a layer, wherein the average thickness of the third coating layer is 0.10 to 5.00 μm, and the average thickness of the fourth coating layer is 0.05 to 5.00 μm. The coated metal plate according to (1) or (2).
(7) The ratio of the average thickness of the third coating layer to the average thickness of the first coating layer is 0.5 to 20.0, and the fourth coating layer to the average thickness of the first coating layer The coated metal plate according to (6), wherein the ratio of the average thickness of is 0.3 to 20.0.
(8) The coated metal sheet according to any one of (1) to (7), wherein the total thickness from the surface of the metal sheet to the outermost surface of the first coating layer is 10.00 μm or less.
(9) The coated metal sheet according to any one of (1) to (8), wherein the compound having photocatalytic activity is anatase type titanium oxide.
(10) The coated metal sheet according to (9), wherein the anatase-type titanium oxide is metal-supported titanium oxide supported on at least one of Cu and Fe.
(11) The coated metal plate according to (9) or (10), wherein the concentration of the anatase-type titanium oxide in the first coating layer is 50 to 95% by mass in terms of titania.
(12) The coated metal sheet according to any one of (9) to (11), wherein the anatase-type titanium oxide has an average particle size of 5 to 200 nm.
(13) The metal plate is a galvanized steel plate, a zinc-aluminum alloy plated steel plate, a zinc-aluminum-magnesium alloy plated steel plate, an aluminum plated steel plate, a zinc-nickel alloy plated steel plate, a zinc-iron alloy plated steel plate, an aluminum plate, or , a stainless steel plate, the coated metal plate according to any one of (1) to (12).
(14) The coated metal plate according to any one of (1) to (13), wherein the surface of the metal plate has a hairline along the rolling direction of the metal plate.
(15) The coated metal plate according to any one of (1) to (13), wherein the surface of the metal plate has a spangle pattern.
<塗装金属板の構造>
以下では、まず、図1A~図2Bを参照しながら、本発明の実施形態に係る塗装金属板の構造について説明する。図1Aは、本実施形態に係る塗装金属板の構造の一例を模式的に示した説明図である。図1B~図2Bは、本実施形態に係る塗装金属板の構造の他の一例を模式的に示した説明図である。 (About painted metal plate)
<Structure of coated metal plate>
First, the structure of a coated metal plate according to an embodiment of the present invention will be described below with reference to FIGS. 1A to 2B. FIG. 1A is an explanatory view schematically showing an example of the structure of a coated metal plate according to this embodiment. 1B to 2B are explanatory diagrams schematically showing another example of the structure of the coated metal plate according to this embodiment.
本実施形態に係る塗装金属板1において、母材である金属板10としては、各種の金属板を用いることが可能である。このような金属板として、例えば、亜鉛めっき鋼板、亜鉛-アルミニウム合金めっき鋼板、亜鉛-アルミニウム-マグネシウム合金めっき鋼板、アルミニウムめっき鋼板、亜鉛-ニッケル合金めっき鋼板、亜鉛-鉄合金めっき鋼板、アルミニウム板、ステンレス板等を挙げることができる。 [Regarding the metal plate 10]
In the coated
本実施形態に係る塗装金属板1において、第1皮膜層の一例としての光触媒層20は、図1Aに模式的に示したように、金属板10の少なくとも一方の面において、皮膜層の最表面に位置している層であり、光触媒活性を有する化合物(以下、「光触媒化合物」と略記することがある。)を少なくとも含有する。光触媒層20が光触媒活性を有する化合物を含有することで、かかる光触媒活性を有する化合物は、光触媒層20に入射した光(特に、紫外~可視光帯域の光)によって、光触媒反応を生じさせる。その結果、本実施形態に係る光触媒層20において、抗ウイルス効果や殺菌効果をはじめとする、各種の光触媒効果が発現する。これにより、本実施形態に係る塗装金属板1は、抗ウイルス効果や殺菌効果をはじめとする各種の特性を実現することができる。 [About the photocatalyst layer 20]
In the coated
図1Aに示したような層構成を有する塗装金属板1では、金属板10による光の反射と、上記のような平均厚みd1を有する光触媒層20とにより、塗装金属板1を光触媒層20が設けられた側から測定したJIS Z8741:1997で規定される60°鏡面光沢度が、80%以上となる。換言すれば、本実施形態に係る塗装金属板1は、上記のように60°鏡面光沢度が80%以上となることで、金属板10と光触媒層20との界面で生じる反射光を効果的に利用することが可能となり、優れた抗ウイルス性能を発現する。なお、光触媒と衝突した光は反射光として検出されないが、本発明の皮膜構成においては、このような光は全体のごく一部である。そのため、光触媒による減少を考慮しても、本発明で規定する60°鏡面光沢度が80%以上である旨を満足することで、優れた抗ウイルス性を有すると判断できる。本実施形態に係る塗装金属板1において、60°鏡面光沢度は、好ましくは90%以上であり、より好ましくは130%以上である。また、かかる60°鏡面光沢度の上限値は、特に規定するものではないが、200%を超えることは難しく、かかる値が実質的な上限と考えられる。なお、かかる60°鏡面光沢度は、上記JIS規格に則した光沢度計を用いて測定することが可能である。 [60° specular gloss]
In the coated metal plate 1 having the layer structure as shown in FIG. The 60° specular gloss defined by JIS Z8741:1997 measured from the side provided with is 80% or more. In other words, the coated
図1Aに示したような層構成を有する、本実施形態に係る塗装金属板1は、金属板10と光触媒層20との間に、化成処理皮膜層として機能する更なる皮膜層を有していてもよい。金属板10と光触媒層20との間に化成処理皮膜層を設けることで、金属板10と光触媒層20との間の密着性を更に向上させることが可能となる。更に、本実施形態に係る塗装金属板1の耐食性等を更に向上させることも可能となる。 <Modification>
The coated
図1B~図2は、本実施形態に係る塗装金属板の構造の他の一例を模式的に示した説明図である。図3は、本実施形態に係る塗装金属板について説明するための説明図である。 In the coated
1B to 2 are explanatory diagrams schematically showing another example of the structure of the coated metal plate according to this embodiment. FIG. 3 is an explanatory diagram for explaining the coated metal plate according to this embodiment.
図1B及び図1Cは、化成処理皮膜層として無機系成分からなる無機系化成処理皮膜層を設ける場合の、塗装金属板1の層構成を模式的に示した模式図である。
かかる場合、本実施形態に係る塗装金属板1は、上記のような金属板10と光触媒層20との間に、第2皮膜層の一例としての無機系化成処理皮膜層30を有する。 [When providing an inorganic chemical conversion coating layer]
FIGS. 1B and 1C are schematic views schematically showing the layer structure of the coated
In this case, the coated
図2A及び図2Bは、化成処理皮膜層として有機系成分を含む有機系化成処理皮膜層を設ける場合の、塗装金属板1の層構成を模式的に示した模式図である。
かかる場合、本実施形態に係る塗装金属板1は、上記のような金属板10と光触媒層20との間に、第3皮膜層の一例としての有機系化成処理皮膜層40と、第4皮膜層の一例としての保護層50と、を有する。 [When providing an organic chemical conversion coating layer]
2A and 2B are schematic views schematically showing the layer structure of the coated
In this case, the coated
有機系化成処理皮膜層40は、光触媒層20の下層(より詳細には、金属板10の表面)に位置する層であり、金属板10の表面に付着した油分などの不純物及び表面酸化物を、公知の脱脂工程及び洗浄工程で取り除いた後、化成処理により形成される。 <<Organic chemical conversion
The organic chemical
樹脂としては、例えば、ポリエステル樹脂、ポリウレタン樹脂、エポキシ樹脂、フェノール樹脂、アクリル樹脂、ポリオレフィン樹脂等といった、公知の有機樹脂を使用することができる。金属板との密着性を更に高めるためには、分子鎖中に強制部位や極性官能基をもつ樹脂(ポリエステル樹脂、ウレタン樹脂、エポキシ樹脂、アクリル樹脂等)の少なくとも一つを使用することが好ましい。樹脂は、単独で用いてもよく、2種以上を併用してもよい。 [resin]
Examples of resins that can be used include known organic resins such as polyester resins, polyurethane resins, epoxy resins, phenol resins, acrylic resins, and polyolefin resins. In order to further improve the adhesion to the metal plate, it is preferable to use at least one resin (polyester resin, urethane resin, epoxy resin, acrylic resin, etc.) having a forced site or a polar functional group in the molecular chain. . The resin may be used alone or in combination of two or more.
シランカップリング剤としては、例えば、γ-(2-アミノエチル)アミノプロピルトリメトキシシラン、γ-(2-アミノエチル)アミノプロピルメチルジメトキシシラン、γ-(2-アミノエチル)アミノプロピルトリエトキシシラン、γ-(2-アミノエチル)アミノプロピルメチルジエトキシシラン、γ-(2-アミノエチル)アミノプロピルメチルジメトキシシラン、γ-メタクリロキシプロピルトリメトキシシラン、γ-メタクリロキシプロピルメチルジメトキシシラン、γ-メタクリロキシプロピルトリエトキシシラン、γ-メタクリロキシプロピルメチルジエトキシシラン、N-β-(N-ビニルベンジルアミノエチル)-γ-アミノプロピルトリメトキシシラン、N-β-(N-ビニルベンジルアミノエチル)-γ-アミノプロピルメチルジメトキシシラン、N-β-(N-ビニルベンジルアミノエチル)-γ-アミノプロピルトリエトキシシラン、N-β-(N-ビニルベンジルアミノエチル)-γ-アミノプロピルメチルジエトキシシラン、γ-グリシドキシプロピルトリメトキシシラン、γ-グリシドキシプロピルメチルジメトキシシラン、γ-グリシドキシプロピルトリエトキシシラン、γ-グリシドキシプロピルメチルジエトキシシラン、γ-メルカプトプロピルトリメトキシシラン、γ-メルカプトプロピルメチルジメトキシシラン、γ-メルカプトプロピルトリエトキシシラン、γ-メルカプトプロピルメチルジエトキシシラン、メチルトリメトキシシラン、ジメチルジメトキシシラン、メチルトリエトキシシラン、ジメチルジエトキシシラン、ビニルトリアセトキシシラン、γ-クロロプロピルトリメトキシシラン、γ-クロロプロピルメチルジメトキシシラン、γ-クロロプロピルトリエトキシシラン、γ-クロロプロピルメチルジエトキシシラン、ヘキサメチルジシラザン、γ-アニリノプロピルトリメトキシシラン、γ-アニリノプロピルメチルジメトキシシラン、γ-アニリノプロピルトリエトキシシラン、γ-アニリノプロピルメチルジエトキシシラン、ビニルトリメトキシシラン、ビニルメチルジメトキシシラン、ビニルトリエトキシシラン、ビニルメチルジエトキシシラン、オクタデシルジメチル[3-(トリメトキシシリル)プロピル]アンモニウムクロライド、オクタデシルジメチル[3-(メチルジメトキシシリル)プロピル]アンモニウムクロライド、オクタデシルジメチル[3-(トリエトキシシリル)プロピル]アンモニウムクロライド、オクタデシルジメチル[3-(メチルジエトキシシリル)プロピル]アンモニウムクロライド、γ-クロロプロピルメチルジメトキシシラン、γ-メルカプトプロピルメチルジメトキシシラン、メチルトリクロロシラン、ジメチルジクロロシラン、トリメチルクロロシラン等を挙げることができる。有機系化成処理皮膜層40を形成するための化成処理剤中のシランカップリング剤の添加量は、例えば、2~80g/Lとすることができる。シランカップリング剤の添加量を2g/L以上とすることで、金属板表面との密着性を向上させて、塗膜の加工密着性を向上させることが可能となる。また、シランカップリング剤の添加量を80g/L以下とすることで、化成処理皮膜の凝集力を保持させて、塗膜の加工密着性を向上させることが可能となる。上記に例示したようなシランカップリング剤は、1種で使用してもよく、2種以上を併用してもよい。 [Silane coupling agent]
Silane coupling agents include, for example, γ-(2-aminoethyl)aminopropyltrimethoxysilane, γ-(2-aminoethyl)aminopropylmethyldimethoxysilane, γ-(2-aminoethyl)aminopropyltriethoxysilane. , γ-(2-aminoethyl)aminopropylmethyldiethoxysilane, γ-(2-aminoethyl)aminopropylmethyldimethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropylmethyldimethoxysilane, γ- methacryloxypropyltriethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, N-β-(N-vinylbenzylaminoethyl)-γ-aminopropyltrimethoxysilane, N-β-(N-vinylbenzylaminoethyl) -γ-aminopropylmethyldimethoxysilane, N-β-(N-vinylbenzylaminoethyl)-γ-aminopropyltriethoxysilane, N-β-(N-vinylbenzylaminoethyl)-γ-aminopropylmethyldiethoxy Silane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-mercaptopropyltrimethoxysilane , γ-mercaptopropylmethyldimethoxysilane, γ-mercaptopropyltriethoxysilane, γ-mercaptopropylmethyldiethoxysilane, methyltrimethoxysilane, dimethyldimethoxysilane, methyltriethoxysilane, dimethyldiethoxysilane, vinyltriacetoxysilane, γ-chloropropyltrimethoxysilane, γ-chloropropylmethyldimethoxysilane, γ-chloropropyltriethoxysilane, γ-chloropropylmethyldiethoxysilane, hexamethyldisilazane, γ-anilinopropyltrimethoxysilane, γ-ani linopropylmethyldimethoxysilane, γ-anilinopropyltriethoxysilane, γ-anilinopropylmethyldiethoxysilane, vinyltrimethoxysilane, vinylmethyldimethoxysilane, vinyltriethoxysilane, vinylmethyldiethoxysilane, octadecyldimethyl [3 -(trimethoxysilyl)propyl]ammonium chloride, octadecyldimethyl[3-(methyldimethoxysilyl)propyl]ammonium chloride, octade sildimethyl[3-(triethoxysilyl)propyl]ammonium chloride, octadecyldimethyl[3-(methyldiethoxysilyl)propyl]ammonium chloride, γ-chloropropylmethyldimethoxysilane, γ-mercaptopropylmethyldimethoxysilane, methyltrichlorosilane, Examples include dimethyldichlorosilane and trimethylchlorosilane. The addition amount of the silane coupling agent in the chemical conversion treatment agent for forming the organic chemical conversion
ジルコニウム化合物としては、例えば、ジルコニウムノルマルプロピレート、ジルコニウムノルマルブチレート、ジルコニウムテトラアセチルアセトネート、ジルコニウムモノアセチルアセトネート、ジルコニウムビスアセチルアセトネート、ジルコニウムモノエチルアセトアセテート、ジルコニウムアセチルアセトネートビスエチルアセトアセテート、ジルコニウムアセテート、ジルコニウムモノステアレート、炭酸ジルコニウム、炭酸ジルコニウムアンモニウム、炭酸ジルコニウムカリウム、炭酸ジルコニウムナトリウム等を挙げることができる。有機系化成処理皮膜層40を形成するための化成処理剤中のジルコニウム化合物の添加量は、例えば、2~80g/Lとすることができる。ジルコニウム化合物の添加量を2g/L以上とすることで、金属板表面との密着性を向上させて、塗膜の加工密着性を向上させることが可能となる。また、ジルコニウム化合物の添加量を80g/L以下とすることで、化成処理皮膜の凝集力を保持させて、塗膜の加工密着性を向上させることが可能となる。かかるジルコニウム化合物は、単独で用いてもよく、2種以上を併用してもよい。 [Zirconium compound]
Examples of zirconium compounds include zirconium normal propylate, zirconium normal butyrate, zirconium tetraacetylacetonate, zirconium monoacetylacetonate, zirconium bisacetylacetonate, zirconium monoethylacetoacetate, zirconium acetylacetonate bisethylacetoacetate, Zirconium acetate, zirconium monostearate, zirconium carbonate, ammonium zirconium carbonate, potassium zirconium carbonate, sodium zirconium carbonate and the like can be mentioned. The amount of the zirconium compound added in the chemical conversion treatment agent for forming the organic chemical conversion
シリカとしては、例えば、日産化学株式会社製の「スノーテックスN」、「スノーテックスC」、「スノーテックスUP」、「スノーテックスPS」、株式会社ADEKA製の「アデライトAT-20Q」等の市販のシリカゲル、又は、日本アエロジル株式会社製のアエロジル#300等の粉末シリカを用いることができる。シリカは、必要とされる塗装金属板の性能に応じて、適宜選択することができる。有機系化成処理皮膜層40を形成するための化成処理剤中のシリカの添加量は、1~40g/Lとすることが好ましい。シリカの添加量を1g/L以上とすることで、塗膜の加工密着性を向上させることが可能となる。また、シリカの添加量を40g/L以下とすることで、コストの増加を抑制しつつ、加工密着性及び耐食性の効果の両立を図ることが可能となる。 [silica]
Examples of silica include commercially available products such as "Snowtex N", "Snowtex C", "Snowtex UP", and "Snowtex PS" manufactured by Nissan Chemical Industries, Ltd., and "Adelite AT-20Q" manufactured by ADEKA Corporation. or powdered silica such as Aerosil #300 manufactured by Nippon Aerosil Co., Ltd. can be used. Silica can be appropriately selected according to the required performance of the coated metal sheet. The amount of silica added to the chemical conversion agent for forming the organic chemical
リン酸及びその塩としては、例えば、オルトリン酸、メタリン酸、ピロリン酸、三リン酸、四リン酸等のリン酸類及びそれらの塩、リン酸三アンモニウム、リン酸水素二アンモニウム等のアンモニウム塩、アミノトリ(メチレンホスホン酸)、1-ヒドロキシエチリデン-1,1-ジホスホン酸、エチレンジアミンテトラ(メチレンホスホン酸)、ジエチレントリアミンペンタ(メチレンホスホン酸)等のホスホン酸類及びそれらの塩、フィチン酸等の有機リン酸類及びそれらの塩等が挙げられる。なお、リン酸の塩として、アンモニウム塩以外の塩としては、Na、Mg、Al、K、Ca、Mn、Ni、Zn、Fe等との金属塩が挙げられる。リン酸及びその塩は、単独で用いてもよく、2種以上を併用してもよい。 [Phosphoric acid and its salts]
Examples of phosphoric acid and salts thereof include phosphoric acids such as orthophosphoric acid, metaphosphoric acid, pyrophosphoric acid, triphosphoric acid and tetraphosphoric acid and salts thereof, ammonium salts such as triammonium phosphate and diammonium hydrogen phosphate, Phosphonic acids such as aminotri(methylenephosphonic acid), 1-hydroxyethylidene-1,1-diphosphonic acid, ethylenediaminetetra(methylenephosphonic acid), diethylenetriaminepenta(methylenephosphonic acid) and their salts, organic phosphoric acids such as phytic acid and salts thereof. Examples of salts of phosphoric acid other than ammonium salts include metal salts with Na, Mg, Al, K, Ca, Mn, Ni, Zn, Fe, and the like. Phosphoric acid and its salt may be used alone or in combination of two or more.
フッ化物としては、例えば、ジルコンフッ化アンモニウム、ケイフッ化アンモニウム、チタンフッ化アンモニウム、フッ化ナトリウム、フッ化カリウム、フッ化カルシウム、フッ化リチウム、チタンフッ化水素酸、ジルコンフッ化水素酸等を挙げることができる。かかるフッ化物は、単独で用いてもよく、2種以上を併用してもよい。 [Fluoride]
Examples of fluorides include ammonium zircon fluoride, ammonium silicofluoride, ammonium titanium fluoride, sodium fluoride, potassium fluoride, calcium fluoride, lithium fluoride, titanium hydrofluoric acid, and zircon hydrofluoric acid. . Such fluorides may be used alone or in combination of two or more.
バナジウム化合物としては、例えば、五酸化バナジウム、メタバナジン酸、メタバナジン酸アンモニウム、メタバナジン酸ナトリウム、オキシ三塩化バナジウム等の5価のバナジウム化合物を還元剤で2~4価に還元したバナジウム化合物、三酸化バナジウム、二酸化バナジウム、オキシ硫酸バナジウム、オキシ蓚酸バナジウム、バナジウムオキシアセチルアセトネート、バナジウムアセチルアセトネート、三塩化バナジウム、リンバナドモリブデン酸、硫酸バナジウム、二塩化バナジウム、酸化バナジウム等の酸化数4~2価のバナジウム化合物等を挙げることができる。かかるバナジウム化合物は、単独で用いてもよく、2種以上を併用してもよい。 [Vanadium compound]
Examples of vanadium compounds include vanadium pentoxide, metavanadic acid, ammonium metavanadate, sodium metavanadate, vanadium oxytrichloride, and other vanadium compounds obtained by reducing pentavalent vanadium compounds to divalent to tetravalent vanadium trioxide. , vanadium dioxide, vanadium oxysulfate, vanadium oxyoxalate, vanadium oxyacetylacetonate, vanadium acetylacetonate, vanadium trichloride, phosphovanadomolybdic acid, vanadium sulfate, vanadium dichloride, vanadium oxide, etc. A vanadium compound etc. can be mentioned. Such vanadium compounds may be used alone or in combination of two or more.
タンニン又はタンニン酸は、加水分解できるタンニン、縮合タンニンのいずれも用いることができる。タンニン及びタンニン酸の例としては、ハマメタタンニン、五倍子タンニン、没食子タンニン、ミロバランのタンニン、ジビジビのタンニン、アルガロビラのタンニン、バロニアのタンニン、カテキン等を挙げることができる。有機系化成処理皮膜層40を形成するための化成処理剤中のタンニン又はタンニン酸の添加量は、2~80g/Lとすることができる。タンニン又はタンニン酸の添加量を2g/L以上とすることで、金属板表面との密着性を向上させて、塗膜の加工密着性を向上させることができる。また、タンニン又はタンニン酸の添加量の添加量を80g/L以下とすることで、化成処理皮膜の凝集力を保持させて、塗膜の加工密着性を向上させることができる。 [Tannin or tannic acid]
Both hydrolyzable tannin and condensed tannin can be used as tannin or tannic acid. Examples of tannins and tannic acids include hamameta tannins, quintuple tannins, gallic tannins, myrobalan tannins, divisibi tannins, algarovira tannins, valonia tannins, catechins, and the like. The amount of tannin or tannic acid added to the chemical conversion agent for forming the organic chemical
保護層50は、光触媒層20と有機系化成処理皮膜層40との間(より好ましくは、光触媒層20の直下)に設けられる層であり、光触媒層20に含有される光触媒化合物の酸化力から、光触媒層20よりも下方に位置する層を保護するために設けられる。 <<
The
ここで、光触媒層をはじめとする各層の平均厚みは、着目する層を断面方向から顕微鏡で観察することで測定することが可能である。断面方向から観察する試料の作製方法としては、例えば、樹脂に埋め込み、観察面を研磨する方法、FIB加工する方法、ミクロトーム法など公知の方法を用いることができる。また、顕微鏡の種類としては、SEM、TEM等の公知の装置を用いることができる。 <Method for measuring the average thickness of each layer>
Here, the average thickness of each layer including the photocatalyst layer can be measured by observing the layer of interest with a microscope from the cross-sectional direction. As a method for preparing a sample to be observed from the cross-sectional direction, known methods such as embedding in resin and polishing the observation surface, FIB processing, and microtome method can be used. Further, as the type of microscope, known devices such as SEM and TEM can be used.
以上説明したような本実施形態に係る塗装金属板は、母材となる金属板の表面に対して、必要に応じて洗浄等の各種の前処理を施したうえで、光触媒層を形成するための光触媒処理剤や、化成処理皮膜層を形成するための化成処理剤や、保護層を形成するための保護処理剤を、所望の層構成となるように塗布した後、乾燥・焼き付けることで製造することができる。 (About manufacturing method of coated metal plate)
In the coated metal plate according to the present embodiment as described above, the surface of the metal plate serving as the base material is subjected to various pretreatments such as cleaning as necessary, and then the photocatalyst layer is formed. The photocatalyst treatment agent, the chemical conversion treatment agent for forming the chemical conversion coating layer, and the protective treatment agent for forming the protective layer are applied to form the desired layer structure, and then dried and baked. can do.
使用した無機系化成処理皮膜、有機系化成処理皮膜を形成するための水系塗料(化成処理剤)の原料、及び、乾燥皮膜中の濃度を、以下の表3に示した。各成分濃度が乾燥皮膜中で所定の濃度となるように、添加量を調整した。処理剤の固形分濃度は、無機系化成処理皮膜では10質量%となり、有機系化成処理皮膜では20質量%となるように、イオン交換水を加えて調整した。各処理剤を、以下の表4-1、表4-2に示す乾燥膜厚となるように、塗布した。その後、金属板到達温度が150℃となるように誘導加熱炉で乾燥させ、その後、スプレーで水冷処理した。 <Inorganic/organic chemical conversion treatment agent>
Table 3 below shows the raw materials of the water-based paint (chemical conversion treatment agent) for forming the inorganic chemical conversion treatment film and the organic chemical conversion treatment film used, and the concentration in the dry film. The amount added was adjusted so that the concentration of each component in the dry film would be a predetermined concentration. The solid concentration of the treatment agent was adjusted by adding ion-exchanged water so that the inorganic chemical conversion treatment film had a solid content concentration of 10 mass % and the organic chemical conversion treatment film had a solid content concentration of 20 mass %. Each treatment agent was applied so as to have a dry film thickness shown in Tables 4-1 and 4-2 below. After that, the metal plate was dried in an induction heating furnace so that the reaching temperature of the metal plate was 150° C., and then water-cooled by spraying.
使用した光触媒処理剤、及び、保護処理剤の作成方法について説明する。
保護処理剤は、貯蔵安定性を考慮して、固形分濃度が8質量%となるように調整した。濃度は、n-ブタノールで希釈することで、調整した。光触媒処理剤は、表2に示した化合物を、以下の保護処理剤に所定量加えることで、作製した。光触媒化合物の固形分濃度は、以下の表4-1、表4-2に示した通りである。 <Photocatalytic agent, protective agent>
The photocatalyst treatment agent used and the method for preparing the protective treatment agent will be described.
The protective treatment agent was adjusted to have a solid concentration of 8% by mass in consideration of storage stability. The concentration was adjusted by diluting with n-butanol. The photocatalyst treatment agent was prepared by adding a predetermined amount of the compound shown in Table 2 to the following protective treatment agent. The solid content concentration of the photocatalyst compound is as shown in Tables 4-1 and 4-2 below.
抗ウイルス性については、抗菌製品技術協議会が規定する抗ウイルス基準に則り、以下のような抗ウイルス試験により、ウイルス感染価を測定することで検証した。より詳細には、各塗装金属板の評価面を上にしてシャーレに載置し、A型インフルエンザウイルスを含むウイルス懸濁液を、評価面上に滴下した。その後、塗装金属板上にフィルムをかぶせてウイルス懸濁液を評価面全面に密着させた後、シャーレの蓋をかぶせた。かかるシャーレを、一般的な事務所の室内を模擬して、1000ルクスの照度を有する25℃の室内で、24時間静置した。その後、フィルム表面と、評価面表面のウイルスを洗浄し、得られた洗浄液中のウイルス感染価(単位:PFU/cm2、PFU:Plaque Forming Units)を、プラーク測定法により測定した。 <Antiviral properties>
The antiviral properties were verified by measuring the virus infectivity titer through the following antiviral test in accordance with the antiviral standards stipulated by the Antimicrobial Product Technology Council. More specifically, each coated metal plate was placed on a petri dish with the evaluation surface facing up, and a virus suspension containing influenza A virus was dropped onto the evaluation surface. After that, the coated metal plate was covered with a film to bring the virus suspension into close contact with the entire surface to be evaluated, and then the petri dish was covered with a lid. The petri dish was allowed to stand for 24 hours in a room at 25° C. with an illumination of 1000 lux, simulating a room in a general office. After that, the film surface and the evaluation surface were washed to remove viruses, and the virus infectivity titer (unit: PFU/cm 2 , PFU: Plaque Forming Units) in the obtained washing solution was measured by the plaque measurement method.
供試材に0T曲げ(180°折り曲げ)加工を施し、折り曲げ部外側の被膜を粘着テープ(ニチバン社製セロテープ(登録商標)テープ幅15mm)で剥離したのち、テープ側への被膜付着状況を観察した。そして、加工密着性を下記の評価基準で評価した。かかる密着性試験において、合格レベルは3以上とした。具体的には、評点が4以上の場合、密着性に優れ、3以上は許容できる(合格レベルである)と判断した。 <Processing Adhesion>
After applying 0T bending (180° bending) processing to the test material and peeling off the film on the outside of the bent part with adhesive tape (Nichiban Co., Ltd. Sellotape (registered trademark) tape width 15 mm), observe the state of film adhesion to the tape side. did. Then, the processing adhesion was evaluated according to the following evaluation criteria. In this adhesion test, the passing level was 3 or higher. Specifically, when the score was 4 or more, it was judged that the adhesiveness was excellent, and 3 or more was judged to be acceptable (acceptable level).
5:テープ側に被膜付着無し
4:テープ側に数点の被膜剥離ある状態で、鋼板側の剥離長が、供試材の片面の加工部の総長に対して5%未満
3:テープ側に数点の被膜剥離ある状態で、鋼板側の剥離長が、供試材の片面の加工部の総長に対して5%以上、10%未満
2:テープ側に被膜剥離あり、鋼板側の剥離長が、供試材の片面の加工部の総長に対して10%以上、20%未満
1:テープ側に被膜剥離あり、鋼板側の剥離長が、供試材の片面の加工部の総長に対して20%以上 (Evaluation criteria)
5: No coating adhered to the tape side 4: The peeled length on the steel plate side is less than 5% of the total length of the processed part on one side of the test material in a state where several points of the coating are peeled off on the tape side 3: On the tape side The peeled length on the steel plate side is 5% or more and less than 10% with respect to the total length of the processed part on one side of the test material with several peeled coatings 2: There is peeled coating on the tape side, and the peeled length on the steel plate side is 10% or more and less than 20% of the total length of the processed part on one side of the test material. 20% or more
供試材の端面をテープシールしてJIS Z 2371に準拠した塩水噴霧試験(SST)を72時間行った。そして、平面部分の錆発生状況を試験終了後に観察し、下記の評価基準で耐食性を評価した。合格レベルは3以上とした。 <Corrosion resistance>
A salt spray test (SST) in accordance with JIS Z 2371 was performed for 72 hours with the end face of the test material tape-sealed. After the end of the test, the state of rust generation on the flat portion was observed, and the corrosion resistance was evaluated according to the following evaluation criteria. The pass level was 3 or higher.
5:白錆発生面積が供試材の片面の総面積に対して1%未満
4:白錆発生面積が供試材の片面の総面積に対して1%以上、5%未満
3:白錆発生面積が供試材の片面の総面積に対して5%以上、10%未満
2:白錆発生面積が供試材の片面の総面積に対して10%以上、30%未満
1:白錆発生面積が供試材の片面の総面積に対して30%以上 (Evaluation criteria)
5: White rust generated area is less than 1% of the total area of one side of the test material 4: White rust generated area is 1% or more and less than 5% of the total area of one side of the test material 3: White rust The generated area is 5% or more and less than 10% of the total area of one side of the test material 2: The white rust generation area is 10% or more and less than 30% of the total area of one side of the test material 1: White rust The generated area is 30% or more of the total area of one side of the test material
以下の表5から明らかなように、本発明の実施例に該当する塗装金属板は、優れた抗ウイルス性、加工密着性及び耐食性を示す一方で、本発明の比較例に該当する塗装金属板は、抗ウイルス性又は加工密着性の評価結果が不合格となった。 The results obtained are summarized in Table 5 below.
As is clear from Table 5 below, the coated metal plates corresponding to the examples of the present invention exhibit excellent antiviral properties, processing adhesion and corrosion resistance, while the coated metal plates corresponding to the comparative examples of the present invention. was unsuccessful in the evaluation results of antiviral properties or processing adhesion.
10 金属板
20 光触媒層(第1皮膜層)
30 無機系化成処理皮膜層(第2皮膜層)
40 有機系化成処理皮膜層(第3皮膜層)
50 保護層(第4皮膜層)
1 coated
30 Inorganic chemical conversion coating layer (second coating layer)
40 Organic chemical conversion coating layer (third coating layer)
50 protective layer (fourth coating layer)
Claims (15)
- 金属板の少なくとも一方の面に皮膜層を有する塗装金属板であって、
前記皮膜層として、前記金属板の少なくとも一方の面において前記皮膜層の最表面に位置し、光触媒活性を有する化合物を少なくとも含有する第1皮膜層を有しており、
前記第1皮膜層の平均厚みは、0.05~5.00μmであり、
前記金属板の表面から前記皮膜層の最表面までの合計厚みは、15.00μm以下であり、
前記塗装金属板について、JIS Z8741:1997で規定される60°鏡面光沢度が、80%以上である、塗装金属板。 A coated metal plate having a coating layer on at least one surface of the metal plate,
The coating layer has a first coating layer located on the outermost surface of the coating layer on at least one surface of the metal plate and containing at least a compound having photocatalytic activity,
The average thickness of the first coating layer is 0.05 to 5.00 μm,
The total thickness from the surface of the metal plate to the outermost surface of the coating layer is 15.00 μm or less,
The coated metal sheet has a 60° specular gloss of 80% or more as defined in JIS Z8741:1997. - 前記第1皮膜層は、更に、Si又はZrの少なくとも何れか1種の元素を含有し、
前記元素の合計濃度は、Siについてはシリカ換算、Zrについてはジルコニア換算で、5~50質量%である、請求項1に記載の塗装金属板。 The first coating layer further contains at least one element of Si or Zr,
2. The coated metal sheet according to claim 1, wherein the total concentration of the elements is 5 to 50% by mass in terms of silica for Si and zirconia for Zr. - 前記皮膜層として、前記第1皮膜層の下層に位置し、Si又はZrの少なくとも何れか1種以上の元素を有する無機系成分からなる第2皮膜層を更に有しており、
前記第2皮膜層の平均厚みは、0.10~5.00μmである、請求項1又は2に記載の塗装金属板。 The coating layer further comprises a second coating layer located below the first coating layer and made of an inorganic component containing at least one element of Si or Zr,
3. The coated metal sheet according to claim 1, wherein the average thickness of said second coating layer is 0.10 to 5.00 μm. - 前記第2皮膜層は、更に、P又はVの少なくとも何れか1種の元素を有する無機系成分を含有する、請求項3に記載の塗装金属板。 The coated metal sheet according to claim 3, wherein the second coating layer further contains an inorganic component containing at least one element of P and V.
- 前記第1皮膜層の平均厚みに対する、前記第2皮膜層の平均厚みの比率は、0.3~12.0である、請求項3又は4に記載の塗装金属板。 The coated metal sheet according to claim 3 or 4, wherein the ratio of the average thickness of the second coating layer to the average thickness of the first coating layer is 0.3 to 12.0.
- 前記皮膜層として、
前記第1皮膜層の下層に位置する、有機系成分を含む第3皮膜層と、
前記第1皮膜層と前記第3皮膜層との間に位置する第4皮膜層と、
を更に有しており、
前記第3皮膜層の平均厚みは、0.10~5.00μmであり、
前記第4皮膜層の平均厚みは、0.05~5.00μmである、請求項1又は2に記載の塗装金属板。 As the coating layer,
a third coating layer containing an organic component located below the first coating layer;
a fourth coating layer located between the first coating layer and the third coating layer;
and
The average thickness of the third coating layer is 0.10 to 5.00 μm,
3. The coated metal sheet according to claim 1, wherein the fourth coating layer has an average thickness of 0.05 to 5.00 μm. - 前記第1皮膜層の平均厚みに対する、前記第3皮膜層の平均厚みの比率は、0.5~20.0であり、
前記第1皮膜層の平均厚みに対する、前記第4皮膜層の平均厚みの比率は、0.3~20.0である、請求項6に記載の塗装金属板。 The ratio of the average thickness of the third coating layer to the average thickness of the first coating layer is 0.5 to 20.0,
7. The coated metal sheet according to claim 6, wherein the ratio of the average thickness of said fourth coating layer to the average thickness of said first coating layer is 0.3 to 20.0. - 前記金属板の表面から前記第1皮膜層の最表面までの合計厚みは、10.00μm以下である、請求項1~7の何れか1項に記載の塗装金属板。 The coated metal sheet according to any one of claims 1 to 7, wherein the total thickness from the surface of the metal sheet to the outermost surface of the first coating layer is 10.00 µm or less.
- 前記光触媒活性を有する化合物は、アナターゼ型酸化チタンである、請求項1~8の何れか1項に記載の塗装金属板。 The coated metal plate according to any one of claims 1 to 8, wherein the compound having photocatalytic activity is anatase-type titanium oxide.
- 前記アナターゼ型酸化チタンは、Cu又はFeの少なくとも何れか一方の金属に担持された、金属担持型の酸化チタンである、請求項9に記載の塗装金属板。 The coated metal plate according to claim 9, wherein the anatase-type titanium oxide is metal-supported titanium oxide supported on at least one of Cu and Fe.
- 前記第1皮膜層における前記アナターゼ型酸化チタンの濃度は、チタニア換算で、50~95質量%である、請求項9又は10に記載の塗装金属板。 The coated metal sheet according to claim 9 or 10, wherein the concentration of said anatase-type titanium oxide in said first coating layer is 50 to 95% by mass in terms of titania.
- 前記アナターゼ型酸化チタンの平均粒径は、5~200nmである、請求項9~11の何れか1項に記載の塗装金属板。 The coated metal sheet according to any one of claims 9 to 11, wherein the anatase-type titanium oxide has an average particle size of 5 to 200 nm.
- 前記金属板は、亜鉛めっき鋼板、亜鉛-アルミニウム合金めっき鋼板、亜鉛-アルミニウム-マグネシウム合金めっき鋼板、アルミニウムめっき鋼板、亜鉛-ニッケル合金めっき鋼板、亜鉛-鉄合金めっき鋼板、アルミニウム板、又は、ステンレス板である、請求項1~12の何れか1項に記載の塗装金属板。 The metal plate is a galvanized steel plate, a zinc-aluminum alloy plated steel plate, a zinc-aluminum-magnesium alloy plated steel plate, an aluminum plated steel plate, a zinc-nickel alloy plated steel plate, a zinc-iron alloy plated steel plate, an aluminum plate, or a stainless steel plate. The coated metal plate according to any one of claims 1 to 12, wherein
- 前記金属板の表面には、当該金属板の圧延方向に沿ったヘアラインが存在する、請求項1~13の何れか1項に記載の塗装金属板。 The coated metal plate according to any one of claims 1 to 13, wherein hairlines along the rolling direction of the metal plate are present on the surface of the metal plate.
- 前記金属板の表面には、スパングル模様が存在する、請求項1~13の何れか1項に記載の塗装金属板。
The coated metal plate according to any one of claims 1 to 13, wherein a surface of said metal plate has a spangle pattern.
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JPH10264299A (en) * | 1997-03-26 | 1998-10-06 | Nisshin Steel Co Ltd | Coated metal plate with excellent stain resistance and its manufacture |
WO1998058736A1 (en) * | 1997-06-20 | 1998-12-30 | Sumitomo Metal Industries, Ltd. | Titanium oxide-based photocatalyst, process for preparing the same, and use thereof |
JP2001286766A (en) * | 2000-04-11 | 2001-10-16 | Nippon Soda Co Ltd | Photocatalyst-bearing structure body, production method of the same, composition for intermediate layer |
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JPH10264299A (en) * | 1997-03-26 | 1998-10-06 | Nisshin Steel Co Ltd | Coated metal plate with excellent stain resistance and its manufacture |
WO1998058736A1 (en) * | 1997-06-20 | 1998-12-30 | Sumitomo Metal Industries, Ltd. | Titanium oxide-based photocatalyst, process for preparing the same, and use thereof |
JP2001286766A (en) * | 2000-04-11 | 2001-10-16 | Nippon Soda Co Ltd | Photocatalyst-bearing structure body, production method of the same, composition for intermediate layer |
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