WO2022267896A1 - 表面清洁设备和表面清洁系统 - Google Patents

表面清洁设备和表面清洁系统 Download PDF

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Publication number
WO2022267896A1
WO2022267896A1 PCT/CN2022/097842 CN2022097842W WO2022267896A1 WO 2022267896 A1 WO2022267896 A1 WO 2022267896A1 CN 2022097842 W CN2022097842 W CN 2022097842W WO 2022267896 A1 WO2022267896 A1 WO 2022267896A1
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WO
WIPO (PCT)
Prior art keywords
surface cleaning
cleaning liquid
charging
cover plate
valve body
Prior art date
Application number
PCT/CN2022/097842
Other languages
English (en)
French (fr)
Inventor
谢明健
徐哲
唐成
段飞
Original Assignee
北京顺造科技有限公司
苏州小顺科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN202121377449.1U external-priority patent/CN215016848U/zh
Priority claimed from CN202110688458.0A external-priority patent/CN113303729A/zh
Application filed by 北京顺造科技有限公司, 苏州小顺科技有限公司 filed Critical 北京顺造科技有限公司
Publication of WO2022267896A1 publication Critical patent/WO2022267896A1/zh

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    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00—Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/28—Floor-scrubbing machines, motor-driven
    • A47L11/282—Floor-scrubbing machines, motor-driven having rotary tools
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00—Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40—Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers

Definitions

  • the present disclosure relates to a surface cleaning device and a surface cleaning system.
  • the unit usually has one or more roller brushes or cleaning discs made of woolen material that can be added to water or a water/cleaner mixture to scrub stubborn dirt from the floor.
  • the cleaning quality In order to improve the cleaning quality, it is usually cleaned by mixing detergent and water. According to a certain ratio, the detergent and water are mixed in the clean water tank of the surface cleaning device to form a cleaning fluid, and then the cleaning fluid is applied to the roller brush or cleaning On the plate, achieve a relatively good cleaning effect on stubborn stains. But this means that the proportion of cleaning agent is controlled, the cleaning process of this cleaning agent must also be carried out exclusively, and not every cleaning surface needs to be applied with this cleaning agent, in order to achieve the best cleaning quality and hygiene conditions, This results in increased time expenditure and additional costs.
  • the surface cleaning device is equipped with a hot steam generating device.
  • the atomization heating device of the surface cleaning device will turn the water in the clean water tank Water is used for steam treatment, sprayed onto the roller brush or cleaning disc, especially to clean the surface, in order to soften the stubborn stains and remove them from the surface to achieve the purpose of cleaning.
  • the steam of surface cleaning equipment is not easy to control and often consumes a lot
  • the battery life of the surface cleaning device, and the process of steam implementation often produces additional steam leakage that users do not want, which is not friendly to ordinary household users.
  • the base station is provided with a water inlet and a charging structure at the same time to charge and replenish water for the surface cleaning equipment
  • the surface cleaning equipment when the surface cleaning equipment is placed on the base station or removed from the base station, it is often not desirable to have a water outlet.
  • the cleaning liquid interferes with the charging structure, that is, it is not desirable to have cleaning liquid near the charging structure; when the surface cleaning device is docked with the base station, because the water port of the surface cleaning device is not aligned with the water connection port of the base station, on the one hand it cannot be smoothly docked, on the other hand , can also cause impact damage to surface cleaning devices and base stations.
  • the present disclosure provides a surface cleaning device and a surface cleaning system.
  • a surface cleaning apparatus comprising:
  • a cleaning liquid storage part for storing cleaning liquid
  • the water return assembly communicates with the cleaning liquid storage part, so as to provide cleaning liquid into the cleaning liquid storage part through the return water assembly or discharge the cleaning liquid in the cleaning liquid storage part;
  • a charging coupling structure located at the rear of the surface cleaning apparatus and above the return water assembly;
  • the water return assembly includes a valve assembly and a protective structure
  • the protective structure at least partially surrounds the valve assembly
  • the lowest position of the protective structure is the same as the lowest position of the valve assembly, or lower than the The lowest position of the valve assembly.
  • the charging coupling structure is adjacent to the water return assembly.
  • a frame structure, the protective structure is arranged on the frame structure and is located at the lower end of the frame structure.
  • fixing ribs are formed on the wall of the protection structure along the axial direction of the protection structure.
  • a guide structure, the guide structure is disposed adjacent to the charging coupling structure.
  • the guide structure is a protruding structure formed from the surface of the frame structure, or a concave structure formed on the frame structure.
  • the charging coupling structure is located in the recessed structure.
  • the concave structure includes at least two guide grooves extending along the length direction of the frame structure.
  • the charging coupling structure includes a charging shrapnel.
  • an accommodating space is formed inside the protective structure, and the valve assembly is arranged in the accommodating space of the protective structure; and the protective structure and the valve assembly are A chamber is formed therebetween, and the chamber communicates with the cleaning liquid storage part.
  • a water pipe joint is formed on the upper part of the protective structure, and the water pipe joint communicates with the chamber, so that the water pipe joint is connected to the cleaning liquid storage part, so that A chamber communicates with the cleaning liquid storage.
  • the valve assembly includes:
  • valve body the valve body is fixed to the protective structure, and the inside of the valve body forms a pipeline through which the cleaning liquid circulates, and the pipeline through which the cleansing liquid circulates communicates with the chamber;
  • valve stem slidably disposed within the valve body; and enabling the valve stem to assume a first position and a second position;
  • the plug is arranged at one end of the valve stem, and when the valve stem is in the first position, the pipeline through which the cleaning liquid of the valve body circulates is not communicated with the chamber; When the valve stem is in the second position, the pipeline through which the cleaning liquid of the valve body communicates with the chamber.
  • At least one annular groove for accommodating a sealing ring is formed on the outer surface of the lower half of the valve body, and the sealing ring is disposed in the annular groove.
  • a guide is provided inside the valve body, and the guide is separated from the inner surface of the valve body by a preset distance; the guide is formed with a central hole, The valve rod is slidably arranged in the central hole of the guide piece.
  • the plug when the valve stem is in the first position, the plug is in sealing contact with the inner wall of the valve body, so that the cleaning liquid of the valve body can circulate.
  • the pipeline does not communicate with the chamber; when the valve stem is in the second position, the plug is spaced from the inner wall of the valve body by a certain distance, so that the cleaning liquid of the valve body can circulate through the pipeline Not in communication with the chamber.
  • the other end of the valve stem is formed with a shoulder, one end of the spring is set on the shoulder, the other end is set on the guide, and the spring is in a preset position. Compressed state, so that the valve assembly is normally closed by the elastic force of the spring.
  • a surface cleaning system which includes the above-mentioned surface cleaning device.
  • the surface cleaning system according to at least one embodiment of the present disclosure, further comprising:
  • a base station the base station is used to provide electrical energy to the surface cleaning equipment, and/or realize fluid interaction with the surface cleaning equipment.
  • the base station includes:
  • a cleaning liquid supply part for storing cleaning liquid
  • connection interface is connected to the cleaning liquid supply part, when the surface cleaning equipment docks on the base station, the return water assembly of the surface cleaning equipment is connected to the connection interface, so that the cleaning liquid The cleaning liquid in the liquid supply part is sent to the cleaning liquid storage part through the connection interface, or the cleaning liquid in the cleaning liquid storage part is sent to the cleaning liquid supply part through the connection interface;
  • the cover plate can move between a first position and a second position, wherein, when the cover plate is in the first position, the cover plate covers the connection interface, when the cover plate When in the second position, the connection interface is exposed;
  • a charging structure the charging structure is arranged on the cover plate, the charging structure cooperates with the charging coupling structure of the surface cleaning equipment, and is used to provide electric energy to the surface cleaning equipment docked at the base station, and realize the surface Clean the charging of the device.
  • the base station further includes:
  • a guiding actuating structure, the guiding actuating structure is arranged on the cover plate, the surface cleaning equipment can actuate the cover plate through the guiding actuating structure, and is guided by the guiding actuating structure.
  • the horizontal plane where the charging structure is located is higher than the horizontal plane where the connection interface is located.
  • the guide actuation structure is located above the charging structure and adjacent to the charging structure.
  • the guiding and actuating structure is a convex structure or a concave structure relative to the surface of the cover plate.
  • the cover plate includes a continuous arc surface, and the charging structure is located on the continuous arc surface.
  • the continuous arc surface at least includes a first arc surface and a second arc surface adjacent to each other, and the charging structure is located on the first arc surface or the second arc surface face.
  • the cover plate includes a continuous arc surface, and the guiding and actuating structure is located on the continuous arc surface.
  • the continuous arc surface at least includes a first arc surface and a second arc surface adjacent to each other, and the guiding and actuating structure is located on the first arc surface or the second arc surface. two arcs.
  • the guide actuation structure includes at least one guide piece, and the guide piece is arranged along the length direction of the cover plate; or, the guide actuation structure includes at least one A cylindrical protrusion or hemispherical protrusion.
  • FIG. 1 is a schematic structural view of a surface cleaning device according to an embodiment of the present disclosure.
  • Fig. 2 is a schematic diagram of a connection interface between a surface cleaning device and a base station according to an embodiment of the present disclosure.
  • Fig. 3 is a structural schematic diagram of another angle of a surface cleaning device according to an embodiment of the present disclosure.
  • FIG. 4 is a schematic diagram showing the enlarged structure of part B in FIG. 3 .
  • Fig. 5 is a schematic structural diagram of a protective structure according to an embodiment of the present disclosure.
  • Fig. 6 is a schematic structural view of a water return assembly according to an embodiment of the present disclosure.
  • Fig. 7 is a schematic structural view of a surface cleaning system according to an embodiment of the present disclosure.
  • Fig. 8 is a schematic structural diagram of a base station according to an embodiment of the present disclosure.
  • FIG. 9 is a schematic diagram of an enlarged structure of part A of FIG. 8 .
  • Fig. 10 is a schematic structural diagram of a base station from another angle according to an embodiment of the present disclosure.
  • Fig. 11 is a schematic structural diagram of a base station from another angle according to an embodiment of the present disclosure.
  • Fig. 12 is a schematic structural diagram of a base station from another angle according to an embodiment of the present disclosure.
  • Fig. 13 is a schematic structural diagram of a base station from another angle according to an embodiment of the present disclosure.
  • Fig. 14 is a schematic structural view of a support assembly according to an embodiment of the present disclosure.
  • Fig. 15 is a schematic structural diagram of a connection interface according to an embodiment of the present disclosure.
  • Fig. 16 is a structural schematic view of another angle of the connection interface according to an embodiment of the present disclosure.
  • FIG. 17 is a schematic structural view of a cleaning liquid storage part according to an embodiment of the present disclosure.
  • Fig. 18 is a structural schematic diagram of a guiding actuation structure according to an embodiment of the present disclosure.
  • cross-hatching and/or shading in the figures is generally used to clarify the boundaries between adjacent features. As such, unless stated otherwise, the presence or absence of cross-hatching or shading conveys or indicates no specific material, material properties, dimensions, proportions, commonality between the illustrated components, and/or any other characteristic of the components, Any preferences or requirements for attributes, properties, etc. Also, in the drawings, the size and relative sizes of components may be exaggerated for clarity and/or descriptive purposes. While exemplary embodiments may be implemented differently, a specific process sequence may be performed in an order different from that described. For example, two consecutively described processes may be performed substantially simultaneously or in an order reverse to that described. In addition, the same reference numerals denote the same components.
  • connection When an element is referred to as being “on” or “over”, “connected to” or “coupled to” another element, the element may be directly on, directly connected to, or Or directly bonded to the other component, or intermediate components may be present. However, when an element is referred to as being “directly on,” “directly connected to,” or “directly coupled to” another element, there are no intervening elements present. To this end, the term “connected” may refer to a physical connection, an electrical connection, etc., with or without intervening components.
  • this disclosure may use terms such as “under”, “beneath”, “below”, “under”, “above”, “on”, “on” ... above”, “higher” and “side (e.g., as in “side walls”)”, etc., to describe one component compared to another (other) component as shown in the drawings Relationship.
  • Spatially relative terms are intended to encompass different orientations of the device in use, operation and/or manufacture in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as “below” or “beneath” other elements or features would then be oriented “above” the other elements or features.
  • the exemplary term “below” can encompass both an orientation of "above” and "beneath”.
  • the device may be otherwise positioned (eg, rotated 90 degrees or at other orientations), and as such, the spatially relative descriptors used herein are interpreted accordingly.
  • FIG. 1 is a schematic structural view of a surface cleaning device according to an embodiment of the present disclosure.
  • Fig. 2 is a schematic diagram of a connection interface between a surface cleaning device and a base station according to an embodiment of the present disclosure.
  • Fig. 3 is a structural schematic diagram of another angle of a surface cleaning device according to an embodiment of the present disclosure.
  • FIG. 4 is a schematic diagram showing the enlarged structure of part B in FIG. 3 .
  • a surface cleaning device 200 which includes:
  • the cleaning liquid storage part 210 is used to store cleaning liquid
  • a water return assembly 230 communicates with the cleaning liquid storage part 210 , so as to provide cleaning liquid into the cleaning liquid storage part 210 through the water return assembly 230 or transfer the cleaning liquid storage part 210 the cleaning liquid in the discharge;
  • the charging coupling structure 220 is located at the rear of the surface cleaning device 200 and above the water return assembly 230;
  • the return water assembly 230 includes a valve assembly 231 and a protective structure 232, the protective structure 232 at least partially surrounds the valve assembly 231, and the lowest position of the protective structure 232 is the same as the lowest position of the valve assembly 231 same, or lower than the lowest position of the valve assembly 231 .
  • the lowest position of the protective structure 232 is the lowest position of the entire return water assembly 230 .
  • the charging coupling structure 220 and the water return assembly 230 can be effectively separated;
  • the water return assembly 230 is protected; when the surface cleaning device 200 is parked on the base station 100, the water return assembly 230 will not be damaged.
  • the charging coupling structure 220 is adjacent to the water return component 230 .
  • the surface cleaning equipment 200 also includes:
  • the frame structure 240 , the protective structure 232 is arranged on the frame structure 240 and is located at the lower end of the frame structure 240 .
  • the frame structure 240 and the protective structure 232 can be integrally formed, that is, it only needs to extend downward from the lower end of the frame structure 240; of course, the frame structure 240 and the protective structure 232 can also be formed separately , and keep the protective structure 232 and the frame structure 240 relatively fixed.
  • the wall surface of the protection structure 232 is formed with fixing ribs 233 along the axial direction of the protection structure 232 .
  • the fixing ribs 233 can be formed on the outer wall of the protective structure 232 , or can be formed on the inner wall of the protective structure 232 , and are preferably formed on the inner wall of the protective structure 232 .
  • the strength of the protective structure 232 can be strengthened;
  • the surfaces jointly formed by the connection interface 170 of the 100 and the support base 182 cooperate, they play a fixed role, that is, the relative positional relationship between the surface cleaning device 200 and the base station 100 can be maintained.
  • the surface cleaning equipment 200 further includes:
  • the guide structure 250 is disposed adjacent to the charging coupling structure 220, so that when the surface cleaning device 200 is parked on the base station 100, the position and/or position of the surface cleaning device 200 is limited by the guide structure 250 or motion trajectories.
  • the guide structure 250 is a protruding structure formed from the surface of the frame structure 240 , or a concave structure formed on the frame structure 240 .
  • the charging coupling structure 220 is located in the recessed structure.
  • the concave structure includes at least two guide grooves extending along the length direction of the frame structure 240 .
  • the charging coupling structure 220 includes charging shrapnel; for example, the number of the charging shrapnel is three, the number of the guide grooves is also three, and each charging shrapnel is opposite It is arranged at a position of a guide slot, and when the charging structure 160 of the base station 100 passes through the guide slot, it can be in contact with the charging shrapnel, so as to realize charging to the surface cleaning device 200 .
  • an accommodating space is formed inside the protective structure 232, and the valve assembly 231 is disposed in the accommodating space of the protective structure 232; and the protective structure 232 and the valve A chamber is formed between the components 231 , and the chamber communicates with the cleaning liquid storage part 210 .
  • Fig. 5 is a schematic structural diagram of a protective structure according to an embodiment of the present disclosure.
  • a water pipe joint 234 is formed on the upper part of the protective structure 232 , and the water pipe joint 234 communicates with the chamber, so as to connect the water pipe joint 234 to the cleaning liquid storage part 210 , so that the chamber communicates with the cleaning liquid storage part 210 .
  • Fig. 6 is a schematic structural view of a water return assembly according to an embodiment of the present disclosure.
  • valve assembly 231 includes:
  • valve body 2311 the valve body 2311 is fixed to the protective structure 232, and the interior of the valve body 2311 forms a pipeline for the circulation of the cleaning liquid, and the pipeline for the circulation of the cleaning liquid communicates with the chamber;
  • valve stem 2312 is slidably disposed in the valve body 2311; and enables the valve stem 2312 to be in a first position and a second position;
  • a plug 2313, the plug 2313 is arranged at one end of the valve stem 2312, and when the valve stem 2312 is in the first position, the pipeline that makes the cleaning liquid of the valve body 2311 communicate with the chamber is not connected, and when the valve stem 2312 is in the second position, the pipeline through which the cleaning liquid of the valve body 2311 circulates communicates with the chamber.
  • At least one annular groove for accommodating a sealing ring 2314 is formed on the outer surface of the lower half of the valve body 2311 , and the sealing ring 2314 is disposed in the annular groove.
  • the number of said annular grooves is three, and a sealing ring is arranged in each annular groove.
  • the inside of the valve body 2311 is provided with a guide piece 2315, the guide piece 2315 is at a preset distance from the inner surface of the valve body 2311, and the outer surface of the guide piece 2315 is connected to the The inner surface of the valve body 2311, the cleaning liquid can flow in the gap between the outer surface of the guide 2315 and the inner surface of the valve body 2311; the guide 2315 is formed with a central hole, and the valve stem 2312 can It is slidably disposed in the central hole of the guide member 2315 .
  • the plug 2313 when the valve stem 2312 is in the first position, the plug 2313 is in sealing contact with the inner wall of the valve body 2311, so that the pipeline through which the cleaning liquid of the valve body 2311 communicates with the cavity
  • the chamber is not connected; when the valve stem 2312 is in the second position, the plug 2313 is spaced from the inner wall of the valve body 2311 by a certain distance, so that the pipeline through which the cleaning liquid of the valve body 2311 circulates is in contact with the valve body 2311.
  • the chambers are not connected.
  • the other end of the valve stem 2312 is formed with a shoulder 2316, one end of the spring is set on the shoulder 2316, the other end is set on the guide 2315, and the spring It is in a pre-compressed state, so that the valve assembly 231 is normally closed by the elastic force of the spring.
  • Fig. 7 is a schematic structural view of a surface cleaning system according to an embodiment of the present disclosure.
  • a surface cleaning system which includes the aforementioned surface cleaning device 200 .
  • the surface cleaning system further includes:
  • the base station 100, the base station 100 is used to provide electric energy to the surface cleaning equipment 200, and/or provide cleaning liquid to the surface cleaning equipment 200, or discharge the cleaning liquid in the surface cleaning equipment 200 to the base station 100.
  • FIG. 8 is a schematic structural diagram of a base station according to an embodiment of the present disclosure.
  • FIG. 9 is a schematic diagram of an enlarged structure of part A of FIG. 8 .
  • a base station 100 which includes:
  • Cleaning liquid supply part 151 described cleaning liquid supply part 151 is used for storing cleaning liquid
  • a charging structure 160 the charging structure 160 is used to provide electric energy to the surface cleaning equipment 200 docked at the base station 100, and realize charging of the surface cleaning equipment 200;
  • connection interface 170 is connected to the cleaning liquid supply part 151, when the surface cleaning device 200 docks on the base station 100, the cleaning liquid storage part 210 of the surface cleaning device 200 is connected to the
  • the connection interface 170 is used to deliver the cleaning liquid in the cleaning liquid supply part 151 to the cleaning liquid storage part 210 through the connection port 170, or to transfer the cleaning liquid in the cleaning liquid storage part 210 through the connection interface 170 to the cleaning liquid supply part 151; that is, to achieve fluid interaction between the cleaning liquid storage part and the cleaning liquid supply part when the cleaning liquid storage part communicates with the cleaning liquid supply part;
  • the cover plate 190 can move between a first position and a second position, wherein, when the cover plate 190 is in the first position, the cover plate 190 covers the connection interface 170, When the cover plate 190 is at the second position, the connection interface 170 is exposed;
  • a guiding actuating structure 140, the guiding actuating structure 140 is arranged on the cover plate 190, the surface cleaning equipment 200 can actuate the cover plate 190 through the guiding actuating structure 140, and is driven by the guiding Moving structure 140 guide;
  • the charging structure 160 is disposed on the cover plate 190 to provide electric energy to the surface cleaning device 200 through the charging structure 160 .
  • the horizontal position of the charging structure 160 is higher than the horizontal position of the connection interface 170 .
  • the base station 100 of the present disclosure facilitates the connection between the surface cleaning equipment 200 and the base station 100 through the setting of the cover plate 190 and the guide actuating structure 140 when in use, and also effectively prevents the surface cleaning equipment 200 from being placed on the base station 100 to replenish cleaning liquid And/or when charging, or when the surface cleaning device 200 is removed from the base station 100, the charging structure may be stained with cleaning liquid from the connection interface 170, or the cleaning liquid may be splashed onto the charging structure, resulting in short circuit and fire hazards.
  • the guide actuating structure 140 is located above the charging structure 160 and is adjacent to the charging structure 160 .
  • the guiding and actuating structure 140 is a convex structure or a concave structure relative to the surface of the cover plate 190 .
  • the cover plate 190 includes a continuous arc surface, and the charging structure 160 is located on the continuous arc surface.
  • the continuous arc surface at least includes a first arc surface 191 and a second arc surface 192 adjacent to each other, and the charging structure 160 is located on the first arc surface 191 or the second arc surface 192 .
  • the cover plate 190 includes a continuous arc surface, and the guiding and actuating structure 140 is located on the continuous arc surface.
  • the continuous arc surface at least includes a first arc surface 191 and a second arc surface 192 adjacent to each other, and the guiding and actuating structure 140 is located on the first arc surface 191 or the second arc surface 192 .
  • Fig. 18 is a structural schematic diagram of a guiding actuation structure according to an embodiment of the present disclosure.
  • the guide actuating structure 140 includes at least one guide piece 141, and the guide piece 141 is arranged along the length direction of the cover plate 190; or,
  • the guiding and actuating structure 140 includes at least one cylindrical protrusion or hemispherical protrusion.
  • the guide actuation structure 140 can be formed on the cover plate 190, or in other words, the guide actuation structure 140 and the cover plate 190 are integrally formed;
  • the moving structure 140 is set separately from the cover plate 190.
  • the positions of the guide actuating structure 140 and the cover plate 190 are relatively fixed, and can be located outside the cover plate 190, for example, directly fixed to the cover plate 190.
  • the guide actuation structure 140 also includes a fixing part 142, and the fixing part 142 is fixed to the cover plate 190 and is located inside the cover plate 190; at this time, on the cover plate 190 An opening is formed so that the guide piece 141 fixed on the fixing portion 142 passes through the opening of the cover plate 190 and is located outside the cover plate 190 .
  • the guide actuation structure 140 can also be a groove formed on the cover plate 190; or, alternatively, as shown in FIG. on the cover plate 190 and located on the inner side of the cover plate 190; the fixing portion 142 is provided with a groove, and the actuation of the cover plate 190 is realized through the groove opened on the fixing portion 142, and Guiding of the surface cleaning device 200 is also possible.
  • the charging structure 160 can be arranged on the cover plate 190, or, the charging structure 160 can be arranged on the fixing portion 142 of the guide actuating structure 140, at this time, the guide leads to The fixed part 142 of the movable structure 140 is located inside the cover plate 190, and an opening is formed on the cover plate 190, so that the charging structure 160 fixed on the fixed part 142 passes through the opening of the cover plate 190 and is located in the The outside of the cover plate 190 .
  • the charging structure 160 includes charging contacts, and the charging coupling structure 220 of the surface cleaning device 200 includes charging contacts.
  • the base station 100 provides electric energy to the surface cleaning device 200; or, the charging structure 160 includes a charging contact piece, and the charging coupling structure 220 of the surface cleaning device 200 includes a charging contacts, when the charging contacts of the charging structure 160 are brought into contact with the charging contacts of the charging structure 160 , the base station 100 provides electric energy to the surface cleaning device 200 .
  • the charging contact of the charging structure 160 is located inside the cover 190 .
  • the charging contacts of the charging structure 160 are fixed to the fixing portion of the guiding actuating structure 140 and are located inside the guiding actuating structure 140.
  • the cover plate 190 is relatively opposite to the charging structure.
  • the position of the charging contact piece 160 is formed with an opening, so that the charging contact of the charging coupling structure 220 of the surface cleaning device 200 passes through the opening of the cover plate 190 and contacts the charging contact piece of the charging structure 160 .
  • Fig. 14 is a schematic structural view of a support assembly according to an embodiment of the present disclosure.
  • the base station 100 further includes:
  • the supporting component 180 is disposed on the shell 165 of the base station 100 and used to support the connection interface 170 .
  • connection interface 170 when the connection interface 170 is supported by the support assembly 180, the part of the support assembly 180 away from the housing 165 of the base station 100 is formed as an inclined surface 183, wherein the inclined surface 183 is in line with the horizontal surface. An included angle is formed between them, so that the cleaning liquid flows down along the inclined surface 183 .
  • the support assembly 180 includes:
  • the support plate 181 is fixed to the housing 165 of the base station 100, or the support plate 181 is formed as a part of the housing 165 of the base station 100;
  • the support seat 182 the support seat 182 extends upwards a preset distance from the support plate 181, and the middle part of the support seat 182 is hollow, so that the part of the connection interface 170 passes through the support seat 182, Connect to the second pipeline 1072.
  • Fig. 15 is a schematic structural diagram of a connection interface according to an embodiment of the present disclosure.
  • Fig. 16 is a structural schematic view of another angle of the connection interface according to an embodiment of the present disclosure.
  • connection interface 170 includes:
  • the main body 171, the main body 171 is hollow;
  • the base portion 172 is disposed at the lower end of the main body portion 171, and is used to close the lower end of the main body portion 171;
  • the flange portion 173 is disposed on the upper end of the main body portion 171, and at least a part of the outer edge of the flange portion 173 is supported on the upper end of the support base 182;
  • connection joint 174 is arranged on the base part 172, and is located below the base part 172, so as to be connected to the second pipeline 1072 through the connection joint 174, so that the connection interface 170 and the cleaning liquid supply part 151 communicates.
  • connection interface 170 also includes:
  • a resisting member 175, one end of the resisting member 175 is arranged on the base portion 172 and is located above the base portion 172, and the upper end of the resisting member 175 is separated from the base portion 172 by a predetermined distance; more preferably , the cross section of the resisting member 175 is cross-shaped.
  • the upper end of the flange portion 173 is inclined upward.
  • the upper surface of the support plate 181 is formed as an inclined surface, wherein the upper surface of the support plate 181 is inclined downward along the direction away from the housing 165 of the base station 100 to prevent the cleaning liquid from Build up on the upper surface of the support plate 181 .
  • the angle between the upper surface of the support plate 181 and the horizontal plane is 10-20°.
  • connection interface 170 and the support base 182 may be provided with fixing ribs.
  • the cover plate 190 when an external force is applied to the cover plate 190, the cover plate 190 moves from the first position to the second position, and when the external force disappears, the cover plate 190 moves from the first position to the second position.
  • the second position moves to the first position.
  • one end of the cover plate 190 is rotatably connected to the housing 165 of the base station 100, and the cover plate 190 can swing between the first position and the second position.
  • One end of the cover plate 190 connected to the shell 165 of the base station 100 is located inside the shell 165 of the base station 100, and the shell 165 of the base station 100 is provided with a through hole.
  • the cover plate 190 moves to the first position , the lower end of the cover plate 190 passes through the shell 165 of the base station 100, is located outside the shell 165 of the base station 100, and covers the connection interface 170; when the cover plate 190 moves to the second position , at least part of the cover plate 190 is located in the casing 165 of the base station 100 .
  • the cover 190 is slidably disposed on the casing 165 of the base station 100 , and the cover 190 can move between the first position and the second position.
  • a limiting portion 1731 is formed on the flange portion 173 of the connecting interface 170, and when the cover plate 190 is in the first position, the limiting portion 1731 contacts at least a part of the upper surface of the cover plate, Further movement of the cover plate 190 is restricted by the limiting portion 1731 .
  • the limiting portion 1731 is formed on a part of the flange away from the housing 165 of the base station 100 .
  • the base station 100 of the present disclosure may further include: a base 101, the base 101 may be a cavity structure, the base 101 may be provided with a tray part 102, and the tray part 102 may be provided with two main scroll wheel positioning seats 1021, those skilled in the art can adjust the number and structure of the main rolling wheel positioning seat 1021 based on the specific rolling wheel form of the surface cleaning equipment.
  • the base station 100 can adaptively only have Main scroll wheel positioning seat 1021.
  • the tray part 102 of the base station 100 is also preferably formed with a draining groove 1023, the shape of the draining groove 1023 can be adapted to the shape of parts such as the roller brush of the surface cleaning equipment, when the surface cleaning equipment docks to the base station 100, the roller of the surface cleaning equipment The brush can be placed in the drain tank 1023.
  • the tray part 102 is detachably connected to the base 101 .
  • the base 101 of the base station 100 is a cavity structure, and an air supply device (the air supply device may have a heating component to provide hot air) is arranged in the cavity structure of the base 101, and the base 101 is formed with The base air outlet 1011 and the base air inlet 1012, correspondingly, the tray portion 102 is provided with a tray air outlet at the position corresponding to the base air outlet 1011, so that the airflow output by the air supply device can pass through the base air outlet 1011 and the base air outlet 1011.
  • the tray air outlet is applied to components such as roller brushes of the surface cleaning equipment placed in the drain tank 1023 to dry the roller brushes and other components.
  • the base air inlet 1012 may be disposed at a suitable position of the base 101 , and the number thereof may be one or more than two.
  • the susceptor inlet 1012 may be porous.
  • the base 101 may be in a substantially square shape, or in other suitable shapes.
  • the base station 100 has a housing 165 fixedly connected to one end of the base 101 , and the housing 165 has an extension dimension along the vertical direction.
  • the base station 100 may also be provided with a storage box 103, the storage box 103 and the cleaning liquid supply part 151 are both supported and held by the casing 165, and the storage box 103 may have a box door that can be opened.
  • both the storage box 103 and the cleaning liquid supply part 151 are cylindrical structures, and those skilled in the art can also adjust the shapes of the storage box 103 and the cleaning liquid supply part 151 .
  • a liquid filling part 1511 may be provided on the top of the cleaning liquid supply part 151, and the liquid filling part 1511 may be in the form of a liquid filling cap matched with a liquid filling port.
  • a handle 1512 may also be provided on the cleaning liquid supply part 151 , and the cleaning liquid supply part 151 is detachably connected to the housing 165 .
  • FIG. 17 is a schematic structural view of a cleaning liquid storage part according to an embodiment of the present disclosure.
  • the base station 100 also has a bidirectional pump device, a first pipeline 1071, a second pipeline 1072 and a heating device 106, and the bidirectional pump device is connected to the valve assembly 153 Between the first end of the first pipeline 1071, the second end of the first pipeline 1071 is connected to the heating device 106, and the heating device 106 is connected to the second end of the first pipeline 1071 and the second end of the second pipeline 1072.
  • the second end of the second pipeline 1072 is connected to the above connection interface, so that the liquid in the cleaning liquid supply part 151 passes through the valve assembly 153, the bidirectional pump device, the first pipeline 1071, the heating device 106, the second Two tubing 1072, the connection interface is supplied to the surface cleaning equipment.
  • the cleaning liquid supply part 151 is disposed on the housing 165 through the lower end cover 152 , and the valve assembly 153 is disposed in the lower end cover 152 .
  • the cleaning liquid supply part 151 is detachable from the lower cover 152 .
  • first and second are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features.
  • the features defined as “first” and “second” may explicitly or implicitly include at least one of these features.
  • “plurality” means at least two, such as two, three, etc., unless otherwise specifically defined.

Abstract

本公开提供一种表面清洁设备，其包括：清洁液体存储部，所述清洁液体存储部用于存储清洁液体；回水组件，所述回水组件与所述清洁液体存储部连通，以通过所述回水组件向所述清洁液体存储部内提供清洁液体或者将所述清洁液体存储部内的清洁液体排出；以及充电耦合结构，所述充电耦合结构位于所述表面清洁设备后部且位于所述回水组件的上方；其中，所述回水组件包括阀组件和防护结构，所述防护结构至少部分地围绕所述阀组件，且所述防护结构的最低位置与所述阀组件的最低位置相同，或者低于所述阀组件的最低位置。本公开还提供一种表面清洁系统。

Description

表面清洁设备和表面清洁系统 技术领域
本公开涉及一种表面清洁设备和表面清洁系统。
背景技术
当今的表面清洁装置用于湿清洁硬地板或短毛地毯。该装置通常具有一个或多个由毛织材料制成的滚刷或清洁盘，它们可以通过添加水或水/清洁剂混合物来擦洗地板上的顽固污垢。
当机器在污垢上移动时，已经被滚刷擦掉并被水或水/洗涤剂混合物溶解的污垢用沿滚刷运动方向排列的清洁头吸起，在设置清洁盘的技术中，可以不设置清洁头，污垢直接被清洁盘上的清洁材料吸附。
但是，顽固的污渍通常难以清理，奶渍、果汁和酱汁等，散落在地板表面，水分蒸发后，则会在清洁表面形成难以祛除的顽固污渍。通常，在擦洗过程中，并非所有这些顽固的污垢都可以通过吸尘来清除，因此其中一些残留在地板上，从而降低了清洁质量。
为了提高清洁质量，通常使用清洁剂和水混合的方式来清理，按照一定比例将清洁剂和水在表面清洁装置的清水箱内混合，形成清洁流体，然后将该清洁流体施加到滚刷或清洁盘上，达到较为良好的顽固污渍的清洁效果。但这意味着清洁剂比例的控制，还必须专门地执行该清洁剂的清洁过程，并且并不是清洁表面的每一处都需要施加这种清洁剂，以实现最佳的清洁质量和卫生状况，这导致增加的时间花费和额外的成本。
另一种方式就是实施蒸汽处理，表面清洁装置中设置了热蒸汽发生装置，在清洁特定的顽固污渍表面的时候，通过控制信号的输入，表面清洁装置的雾化加热装置，将清水箱中的水进行蒸汽处理，喷洒到滚刷或清洁盘，特别是清洁表面，以软化该顽固的污渍，使其脱离表面，达到清洁目的，但是，表面清洁设备的蒸汽不容易控制，往往会极大消耗表面清洁装置的续航能力，并且蒸汽实施的过程中，往往会产生用户不希望的额外蒸汽外泄，这对于普通家庭的用户是体验并不友好。
现有的表面清洁装置，无论是自主移动式清洁装置还是手持式清洁装置，由于其结构和体积的天然限制，自身携带的清水箱体积有限，在清洁大面积的情况，特别是带有上述的污渍时候，需要频繁更换清水，续航较短，这带来了体验上的下降，因此，将储水箱设置在基站上逐渐成为一种趋势。
但是，当储水箱设置于基站时，由于基站同时设置接水口和充电结构，以给表面清洁设备充电和补水，因此表面清洁设备放置于基站或者从基站上取下时，往往不希望接水口的清洁液体与充电结构干涉，即不希望充电结构附近存在清洁液体；当表面清洁装置和基站对接时，由于表面清洁装置的水口与基站的接水口不对正，一方面无法实现顺利对接，另一方面，也会对表面清洁装置和基站产生冲击损伤。
因此需要一种能解决上述问题的技术。
发明内容
为了解决上述技术问题之一，本公开提供了一种表面清洁设备和表面清洁系统。
根据本公开的一个方面，提供了一种表面清洁设备，其包括：
清洁液体存储部，所述清洁液体存储部用于存储清洁液体；
回水组件，所述回水组件与所述清洁液体存储部连通，以通过所述回水组件向所述清洁液体存储部内提供清洁液体或者将所述清洁液体存储部内的清洁液体排出；以及
充电耦合结构，所述充电耦合结构位于所述表面清洁设备后部且位于所述回水组件的上方；
其中，所述回水组件包括阀组件和防护结构，所述防护结构至少部分地围绕所述阀组件，且所述防护结构的最低位置与所述阀组件的最低位置相同，或者低于所述阀组件的最低位置。
根据本公开的至少一个实施方式的表面清洁设备，所述充电耦合结构邻近所述回水组件。
根据本公开的至少一个实施方式的表面清洁设备，还包括：
框架结构，所述防护结构设置于所述框架结构，并位于所述框架结构的下端。
根据本公开的至少一个实施方式的表面清洁设备，所述防护结构的壁面沿所述防护结构的轴线方向形成有固定肋条。
根据本公开的至少一个实施方式的表面清洁设备，还包括：
导向结构，所述导向结构邻近所述充电耦合结构设置。
根据本公开的至少一个实施方式的表面清洁设备，所述导向结构为从所述框架结构的表面所形成的凸起结构，或者在所述框架结构上所形成的凹陷结构。
根据本公开的至少一个实施方式的表面清洁设备，当所述导向结构为凹陷结构时，所述充电耦合结构位于所述凹陷结构内。
根据本公开的至少一个实施方式的表面清洁设备，所述凹陷结构包括至少两个沿所述框架结构的长度方向延伸的导槽。
根据本公开的至少一个实施方式的表面清洁设备，所述充电耦合结构包括充电弹片。
根据本公开的至少一个实施方式的表面清洁设备，所述防护结构的内部形成有容置空间，所述阀组件设置于所述防护结构的容置空间内；并且所述防护结构和阀组件之间形成有腔室，所述腔室与所述清洁液体存储部连通。
根据本公开的至少一个实施方式的表面清洁设备，所述防护结构的上部形成有水管接头，所述水管接头与所述腔室连通，以通过将水管接头连接于清洁液体存储部的方式，使得腔室与所述清洁液体存储部连通。
根据本公开的至少一个实施方式的表面清洁设备，所述阀组件包括：
阀体，所述阀体固定于所述防护结构，并且所述阀体的内部形成清洁液体流通的管路，所述清洁液体流通的管路与所述腔室连通；
阀杆，所述阀杆可滑动地设置于所述阀体内；并使得所述阀杆能够处于第一位置和第二位置；以及
堵头，所述堵头设置于所述阀杆的一端，并且当所述阀杆位于第一位置时，使得所述阀体的清洁液体流通的管路与所述腔室不连通，并且当所述阀杆位于第二位置时，使得所述阀体的清洁液体流通的管路与所述腔室连通。
根据本公开的至少一个实施方式的表面清洁设备，所述阀体的下半部分的外表面形成有至少一个容置密封圈的环形凹槽，所述环形凹槽内设置有密封圈。
根据本公开的至少一个实施方式的表面清洁设备，所述阀体的内部设置有导向件，所述导向件与所述阀体的内表面间隔预设距离；所述导向件形成有中心孔，所述阀杆可滑动地设置于所述导向件的中心孔内。
根据本公开的至少一个实施方式的表面清洁设备，当所述阀杆位于第一位置时，所述堵头与所述阀体的内壁面密封接触，以使得所述阀体的清洁液体流通的管路与所述腔室不连通；当所述阀杆位于第二位置时，所述堵头与所述阀体的内壁面间隔一定距离，以使得所述阀体的清洁液体流通的管路与所述腔室不连通。
根据本公开的至少一个实施方式的表面清洁设备，所述阀杆的另一端形成有轴肩，弹簧的一端设置于所述轴肩，另一端设置于所述导向件，并且所述弹簧处于预压缩状态，以通过所述弹簧的弹力使得所述阀组件为常闭状态。
根据本公开的另一方面，提供一种表面清洁系统，其包括上述的表面清洁设备。
根据本公开的至少一个实施方式的表面清洁系统，还包括：
基站，所述基站用于向所述表面清洁设备提供电能，和/或，实现与表面清洁设备的流体交互。
根据本公开的至少一个实施方式的表面清洁系统，所述基站包括：
清洁液体供给部，所述清洁液体供给部用于存储清洁液体；
连接接口，所述连接接口连接至所述清洁液体供给部，当所述表面清洁设备停靠于所述基站时，所述表面清洁设备的回水组件连接于所述连接接口，以将所述清洁液体供给部的清洁液体通过所述连接接口输送至所述清洁液体存储部，或者将所述清洁液体存储部内的清洁液体通过所述连接接口输送至所述清洁液体供给部；以及
盖板，所述盖板能够在第一位置和第二位置之间运动，其中，当所述盖板位于所述第一位置时，所述盖板覆盖所述连接接口，当所述盖板位于第二位置时，使得所述连接接口露出；以及
充电结构，所述充电结构设置于所述盖板，所述充电结构与所述表面清洁设备的充电耦合结构配合，用于向停靠于所述基站的表面清洁设备提供电能，并实现所述表面清洁设备的充电。
根据本公开的至少一个实施方式的表面清洁系统，所述基站还包括：
导向致动结构，所述导向致动结构设置于所述盖板，所述表面清洁设备能够通过所述导向致动结构致动所述盖板，且被所述导向致动结构导向。
根据本公开的至少一个实施方式的表面清洁系统，所述充电结构所处于的水平面 位置高于所述连接接口所处于的水平面的位置。
根据本公开的至少一个实施方式的表面清洁系统，所述导向致动结构位于所述充电结构上方，并临近所述充电结构。
根据本公开的至少一个实施方式的表面清洁系统，所述导向致动结构为相对于所述盖板表面的凸起结构或凹陷结构。
根据本公开的至少一个实施方式的表面清洁系统，所述盖板包括连续的弧面，所述充电结构位于所述连续的弧面上。
根据本公开的至少一个实施方式的表面清洁系统，所述连续的弧面至少包括相互邻接设置的第一弧面和第二弧面，所述充电结构位于所述第一弧面或第二弧面上。
根据本公开的至少一个实施方式的表面清洁系统，所述盖板包括连续的弧面，所述导向致动结构位于所述连续的弧面上。
根据本公开的至少一个实施方式的表面清洁系统，所述连续的弧面至少包括相互邻接设置的第一弧面和第二弧面，所述导向致动结构位于所述第一弧面或第二弧面上。
根据本公开的至少一个实施方式的表面清洁系统，所述导向致动结构包括至少一个导向片，所述导向片沿着所述盖板的长度方向设置；或者，所述导向致动结构包括至少一个圆柱形凸起或者半球形凸起。
附图说明
附图示出了本公开的示例性实施方式，并与其说明一起用于解释本公开的原理，其中包括了这些附图以提供对本公开的进一步理解，并且附图包括在本说明书中并构成本说明书的一部分。
图1是根据本公开的一个实施方式的表面清洁设备的结构示意图。
图2是根据本公开的一个实施方式的表面清洁设备与基站的连接接口配合示意图。
图3是根据本公开的一个实施方式的表面清洁设备的另一角度的结构示意图。
图4是图3的B部放大结构示意图。
图5是根据本公开的一个实施方式的防护结构的结构示意图。
图6是根据本公开的一个实施方式的回水组件的结构示意图。
图7是根据本公开的一个实施方式的表面清洁系统的结构示意图。
图8是根据本公开的一个实施方式的基站的结构示意图。
图9是图8的A部放大结构示意图。
图10是根据本公开的一个实施方式的基站的另一角度的结构示意图。
图11是根据本公开的一个实施方式的基站的另一角度的结构示意图。
图12是根据本公开的一个实施方式的基站的另一角度的结构示意图。
图13是根据本公开的一个实施方式的基站的另一角度的结构示意图。
图14是根据本公开的一个实施方式的支撑组件的结构示意图。
图15是根据本公开的一个实施方式的连接接口的结构示意图。
图16是根据本公开的一个实施方式的连接接口的另一角度的结构示意图。
图17是根据本公开的一个实施方式的清洁液体存储部的结构示意图。
图18是根据本公开的一个实施方式的导向致动结构的结构示意图。
具体实施方式
下面结合附图和实施方式对本公开作进一步的详细说明。可以理解的是，此处所描述的具体实施方式仅用于解释相关内容，而非对本公开的限定。另外还需要说明的是，为了便于描述，附图中仅示出了与本公开相关的部分。
需要说明的是，在不冲突的情况下，本公开中的实施方式及实施方式中的特征可以相互组合。下面将参考附图并结合实施方式来详细说明本公开的技术方案。
除非另有说明，否则示出的示例性实施方式/实施例将被理解为提供可以在实践中实施本公开的技术构思的一些方式的各种细节的示例性特征。因此，除非另有说明，否则在不脱离本公开的技术构思的情况下，各种实施方式/实施例的特征可以另外地组合、分离、互换和/或重新布置。
在附图中使用交叉影线和/或阴影通常用于使相邻部件之间的边界变得清晰。如此，除非说明，否则交叉影线或阴影的存在与否均不传达或表示对部件的具体材料、材料性质、尺寸、比例、示出的部件之间的共性和/或部件的任何其它特性、属性、性质等的任何偏好或者要求。此外，在附图中，为了清楚和/或描述性的目的，可以夸大部件的尺寸和相对尺寸。当可以不同地实施示例性实施例时，可以以不同于所描述的顺序来执行具体的工艺顺序。例如，可以基本同时执行或者以与所描述的顺序相反的顺序执行两个连续描述的工艺。此外，同样的附图标记表示同样的部件。
当一个部件被称作“在”另一部件“上”或“之上”、“连接到”或“结合到”另一部件时，该部件可以直接在所述另一部件上、直接连接到或直接结合到所述另一部件，或者可以存在中间部件。然而，当部件被称作“直接在”另一部件“上”、“直接连接到”或“直接结合到”另一部件时，不存在中间部件。为此，术语“连接”可以指物理连接、电气连接等，并且具有或不具有中间部件。
为了描述性目的，本公开可使用诸如“在……之下”、“在……下方”、“在……下”、“下”、“在……上方”、“上”、“在……之上”、“较高的”和“侧(例如，如在“侧壁”中)”等的空间相对术语，从而来描述如附图中示出的一个部件与另一(其它)部件的关系。除了附图中描绘的方位之外，空间相对术语还意图包含设备在使用、操作和/或制造中的不同方位。例如，如果附图中的设备被翻转，则被描述为“在”其它部件或特征“下方”或“之下”的部件将随后被定位为“在”所述其它部件或特征“上方”。因此，示例性术语“在……下方”可以包含“上方”和“下方”两种方位。此外，设备可被另外定位(例如，旋转90度或者在其它方位处)，如此，相应地解释这里使用的空间相对描述语。
这里使用的术语是为了描述具体实施例的目的，而不意图是限制性的。如这里所使用的，除非上下文另外清楚地指出，否则单数形式“一个(种、者)”和“所述(该)”也意图包括复数形式。此外，当在本说明书中使用术语“包含”和/或“包括”以及它们的变型时，说明存在所陈述的特征、整体、步骤、操作、部件、组件和/或它们的组，但不排除存在或附加一个或更多个其它特征、整体、步骤、操作、部件、组件和/或它们的组。还要注意的是，如这里使用的，术语“基本上”、“大约”和其它类似的术语被用作近似术语而不用作程度术语，如此，它们被用来解释本领域普通技术人员将认识到的测量值、计算值和/或提供的值的固有偏差。
图1是根据本公开的一个实施方式的表面清洁设备的结构示意图。图2是根据本公开的一个实施方式的表面清洁设备与基站的连接接口配合示意图。图3是根据本公开的一个实施方式的表面清洁设备的另一角度的结构示意图。图4是图3的B部放大结构示意图。
如图1至图4所示，本公开提供一种表面清洁设备200，其包括：
清洁液体存储部210，所述清洁液体存储部210用于存储清洁液体；
回水组件230，所述回水组件230与所述清洁液体存储部210连通，以通过所述回水组件230向所述清洁液体存储部210内提供清洁液体或者将所述清洁液体存储部210内的清洁液体排出；以及
充电耦合结构220，所述充电耦合结构220位于所述表面清洁设备200的后部，且位于所述回水组件230的上方；
其中，所述回水组件230包括阀组件231和防护结构232，所述防护结构232至少部分地围绕所述阀组件231，且所述防护结构232的最低位置与所述阀组件231的最低位置相同，或者低于所述阀组件231的最低位置。
换句话说，所述防护结构232的最低位置是整个回水组件230的最低位置。
本公开的表面清洁设备200在使用中，通过所述防护结构232的设置，一方面能够有效地将所述充电耦合结构220和回水组件230分隔开，另一方面也能够有效地对所述回水组件230进行保护；当将表面清洁设备200停靠于基站100时，不会发生回水组件230损坏的情况。
在本公开的一个可选实施例中，所述充电耦合结构220邻近所述回水组件230。
本公开中，所述的表面清洁设备200还包括：
框架结构240，所述防护结构232设置于所述框架结构240，并位于所述框架结构240的下端。
一方面，所述框架结构240与所述防护结构232可以一体成型，即从所述框架结构240的下端向下延伸即可；当然，所述框架结构240与所述防护结构232也可以分离成型，并且使得所述防护结构232与所述框架结构240之间保持相对固定即可。
根据本公开至少一个实施方式，如图4所示，所述防护结构232的壁面沿所述防护结构232的轴线方向形成有固定肋条233。
即，所述固定肋条233可以形成于所述防护结构232的外壁面，也可以形成在所述防护结构232的内壁面，并且优选地形成在所述防护结构232的内壁面。
以此，通过所述固定肋条233的设置，一方面能够加强所述防护结构232的强度，另一方面，当所述表面清洁设备200与基站100配合时，所述固定肋条233与所述基站100的连接接口170以及支撑座182共同形成的面配合时，起到固定的作用，即能够保持表面清洁设备200和基站100的相对位置关系。
在本公开的一个可选实施例中，所述的表面清洁设备200还包括：
导向结构250，所述导向结构250邻近所述充电耦合结构220设置，以当将所述表面清洁设备200停靠于基站100时，通过所述导向结构250限制所述表面清洁设备 200的位置和/或运动轨迹。
优选地，所述导向结构250为从所述框架结构240的表面所形成的凸起结构，或者在所述框架结构240上所形成的凹陷结构。
更优选地，如图4所示，当所述导向结构250为凹陷结构时，所述充电耦合结构220位于所述凹陷结构内。
例如，所述凹陷结构包括至少两个沿所述框架结构240的长度方向延伸的导槽。
在本公开的一个可选实施例中，所述充电耦合结构220包括充电弹片；例如，所述充电弹片的数量为3个，所述导槽的数量也为三个，并且每个充电弹片相对于一个导槽的位置设置，当基站100的充电结构160穿过所述导槽后，能够与所述充电弹片接触，以此实现向表面清洁设备200的充电。
在本公开的一个可选实施例中，所述防护结构232的内部形成有容置空间，所述阀组件231设置于所述防护结构232的容置空间内；并且所述防护结构232和阀组件231之间形成有腔室，所述腔室与所述清洁液体存储部210连通。
图5是根据本公开的一个实施方式的防护结构的结构示意图。
更优选地，如图5所示，所述防护结构232的上部形成有水管接头234，所述水管接头234与所述腔室连通，以通过将水管接头234连接于清洁液体存储部210的方式，使得腔室与所述清洁液体存储部210连通。
图6是根据本公开的一个实施方式的回水组件的结构示意图。
在本公开的一个可选实施例中，如图6所示，所述阀组件231包括：
阀体2311，所述阀体2311固定于所述防护结构232，并且所述阀体2311的内部形成清洁液体流通的管路，所述清洁液体流通的管路与所述腔室连通；
阀杆2312，所述阀杆2312可滑动地设置于所述阀体2311内；并使得所述阀杆2312能够处于第一位置和第二位置；以及
堵头2313，所述堵头2313设置于所述阀杆2312的一端，并且当所述阀杆2312位于第一位置时，使得所述阀体2311的清洁液体流通的管路与所述腔室不连通，并且当所述阀杆2312位于第二位置时，使得所述阀体2311的清洁液体流通的管路与所述腔室连通。
本公开中，所述阀体2311的下半部分的外表面上形成有至少一个容置密封圈2314的环形凹槽，所述环形凹槽内设置有密封圈2314。
更具体地，所述环形凹槽的数量为3个，每个环形凹槽内设置有一个密封圈。
更优选地，所述阀体2311的内部设置有导向件2315，所述导向件2315与所述阀体2311的内表面间隔预设距离，所述导向件2315的外表面通过连接件连接于所述阀体2311的内表面，清洁液体可以在所述导向件2315的外表面和阀体2311的内表面之间的空隙内流动；所述导向件2315形成有中心孔，所述阀杆2312可滑动地设置于所述导向件2315的中心孔内。
相应地，当所述阀杆2312位于第一位置时，所述堵头2313与所述阀体2311的内壁面密封接触，以使得所述阀体2311的清洁液体流通的管路与所述腔室不连通；当所述阀杆2312位于第二位置时，所述堵头2313与所述阀体2311的内壁面间隔一定距离，以使得所述阀体2311的清洁液体流通的管路与所述腔室不连通。
在本公开的一个可选实施例中，所述阀杆2312的另一端形成有轴肩2316，弹簧的一端设置于所述轴肩2316，另一端设置于所述导向件2315，并且所述弹簧处于预压缩状态，以通过所述弹簧的弹力使得所述阀组件231为常闭状态。
图7是根据本公开的一个实施方式的表面清洁系统的结构示意图。
根据本公开的另一方面，如图7所示，提供一种表面清洁系统，其包括前述的表面清洁设备200。
在本公开的一个可选实施例中，所述表面清洁系统还包括：
基站100，所述基站100用于向所述表面清洁设备200提供电能，和/或，向所述表面清洁设备200提供清洁液体，或者将所述表面清洁设备200中的清洁液体排出至所述基站100。
图8是根据本公开的一个实施方式的基站的结构示意图。图9是图8的A部放大结构示意图。
如图8和图9所示，本公开提供一种基站100，其包括：
清洁液体供给部151，所述清洁液体供给部151用于存储清洁液体；
充电结构160，所述充电结构160用于向停靠于所述基站100的表面清洁设备200提供电能，并实现所述表面清洁设备200的充电；
连接接口170，所述连接接口170连接至所述清洁液体供给部151，当所述表面清洁设备200停靠于所述基站100时，所述表面清洁设备200的清洁液体存储部210连接于所述连接接口170，以将所述清洁液体供给部151的清洁液体通过所述连接接 口170输送至所述清洁液体存储部210，或者将所述清洁液体存储部210内的清洁液体通过所述连接接口170输送至所述清洁液体供给部151；即，以当所述清洁液体存储部与所述清洁液体供给部连通时，实现所述清洁液体存储部和清洁液体供给部之间的流体交互；
盖板190，所述盖板190能够在第一位置和第二位置之间运动，其中，当所述盖板190位于所述第一位置时，所述盖板190覆盖所述连接接口170，当所述盖板190位于第二位置时，使得所述连接接口170露出；以及
导向致动结构140，所述导向致动结构140设置于所述盖板190，所述表面清洁设备200能够通过所述导向致动结构140致动所述盖板190，且被所述导向致动结构140导向；
其中，所述充电结构160设置于所述盖板190，以通过所述充电结构160向表面清洁设备200提供电能。
优选地，所述充电结构160所处于的水平面位置高于所述连接接口170所处于的水平面的位置。
本公开的基站100在使用时，通过盖板190和导向致动结构140的设置，方便了表面清洁设备200和基站100的连接，并且也有效地避免表面清洁设备200放置于基站100补充清洁液体和/或充电时，或者表面清洁设备200从基站100取下时，充电结构可能会沾到来自于连接接口170的清洁液体，或者清洁液体溅到充电结构，产生短路和着火隐患的问题。
作为一种实现形式，所述导向致动结构140位于所述充电结构160上方，并临近所述充电结构160。
更优选地，所述导向致动结构140为相对于所述盖板190表面的凸起结构或凹陷结构。
本公开中，所述盖板190包括连续的弧面，所述充电结构160位于所述连续的弧面上。
更优选地，所述连续的弧面至少包括相互邻接设置的第一弧面191和第二弧面192，所述充电结构160位于所述第一弧面191或第二弧面192上。
本公开中，所述盖板190包括连续的弧面，所述导向致动结构140位于所述连续的弧面上。
所述连续的弧面至少包括相互邻接设置的第一弧面191和第二弧面192，所述导向致动结构140位于所述第一弧面191或第二弧面192上。
图18是根据本公开的一个实施方式的导向致动结构的结构示意图。
在本公开的一个可选实施例中，如图18所示，所述导向致动结构140包括至少一个导向片141，所述导向片141沿着所述盖板190的长度方向设置；或者，所述导向致动结构140包括至少一个圆柱形凸起或者半球形凸起。
也就是说，一方面，所述导向致动结构140可以形成于所述盖板190上，或者说所述导向致动结构140与所述盖板190一体成型；另一方面，所述导向致动结构140与所述盖板190分离设置，此时所述导向致动结构140与所述盖板190的位置相对固定，并且可以位于所述盖板190的外侧，例如直接固定于所述盖板190；或者，所述导向致动结构140还包括固定部142，所述固定部142固定于所述盖板190，并位于所述盖板190的内侧；此时，所述盖板190上形成有开口，并使得固定于所述固定部142上的导向片141穿过所述盖板190的开口位于所述盖板190的外部。
而且，所述导向致动结构140也可以为形成于所述盖板190的槽；或者，或者，如图18所示，所述导向致动结构140包括固定部142，所述固定部142固定于所述盖板190，并且位于所述盖板190的内侧；所述固定部142上开设有槽，并且通过所述固定部142上开设的槽实现对所述盖板190的致动，并且也能够实现对所述表面清洁设备200的导向。
相似地，一方面，所述充电结构160可以设置于所述盖板190上，或者，所述充电结构160设置于所述导向致动结构140的固定部142上，此时，所述导向致动结构140的固定部142位于所述盖板190的内侧，所述盖板190上形成有开口，并使得固定于所述固定部142上的充电结构160穿过所述盖板190的开口位于所述盖板190的外部。
作为一种实现形式，如图18所示，所述充电结构160包括充电触点，所述表面清洁设备200的充电耦合结构220包括充电触片，当将所述充电结构160的充电触点接触所述充电结构160的充电触片时，所述基站100向所述表面清洁设备200提供电能；或者，所述充电结构160包括充电触片，所述表面清洁设备200的充电耦合结构220包括充电触点，当将所述充电结构160的充电触片接触所述充电结构160的充电触点时，所述基站100向所述表面清洁设备200提供电能。
本公开中，当所述充电结构160为充电触片时，所述充电结构160的充电触片位于所述盖板190的内侧。或者，所述充电结构160的充电触片固定于所述导向致动结构140的固定部，并且位于所述导向致动结构140的内侧，此时，所述盖板190相对于所述充电结构160的充电触片的位置形成有开口，以使得所述表面清洁设备200的充电耦合结构220的充电触点穿过所述盖板190的开口，与所述充电结构160的充电触片接触。
图14是根据本公开的一个实施方式的支撑组件的结构示意图。
在本公开的一个可选实施例中，如图14所示，所述的基站100还包括：
支撑组件180，所述支撑组件180设置于所述基站100的外壳165，用于支撑所述连接接口170。
根据本公开至少一个实施方式，当通过支撑组件180支撑所述连接接口170时，所述支撑组件180远离所述基站100的外壳165的部分形成为倾斜面183，其中所述倾斜面183与水平面之间形成一夹角，以便清洁液体沿所述倾斜面183向下流动。
本公开中，优选地，所述支撑组件180包括：
支撑板181，所述支撑板181固定于所述基站100的外壳165，或者所述支撑板181形成为所述基站100的外壳165的一部分；以及
支撑座182，所述支撑座182从所述支撑板181向上延伸预设距离，并且所述支撑座182的中部呈中空状，以使得所述连接接口170的部分穿过所述支撑座182，连接于第二管路1072。
图15是根据本公开的一个实施方式的连接接口的结构示意图。图16是根据本公开的一个实施方式的连接接口的另一角度的结构示意图。
在本公开的一个可选实施例中，如图15和图16所示，所述连接接口170包括：
主体部171，所述主体部171呈中空状；
底座部172，所述底座部172设置于所述主体部171的下端，用于封闭所述主体部171的下端；
法兰部173，所述法兰部173设置于所述主体部171的上端，并且所述法兰部173的外边缘的至少一部分支撑在所述支撑座182的上端；以及
连接接头174，所述连接接头174设置于底座部172，并位于所述底座部172的下方，以通过所述连接接头174连接于第二管路1072，使得连接接口170与所述清洁液体供给部151连通。
优选地，所述连接接口170还包括：
抵触件175，所述抵触件175的一端设置于所述底座部172，并且位于所述底座部172的上方，所述抵触件175的上端与所述底座部172间隔预设距离；更优选地，所述抵触件175的横截面为十字形。
根据本公开至少一个实施方式，沿远离所述基站100的外壳165的方向，所述法兰部173的上端向上倾斜。
根据本公开至少一个实施方式，所述支撑板181的上表面形成为倾斜表面，其中，所述支撑板181的上表面沿远离所述基站100的外壳165的方向向下倾斜，以防止清洁液体在支撑板181的上表面积聚。
更优选地，所述支撑板181的上表面与水平面的夹角为10-20°。
本公开中，所述连接接口170和支撑座182的外表面可以设置有固定肋条。
在本公开的一个可选实施例中，当向所述盖板190施加外力时，所述盖板190从第一位置运动至第二位置，并且当外力消失时，所述盖板190从第二位置运动至第一位置，其中，当所述盖板190从第二位置运动至第一位置时，可以利用所述盖板190的重力实现，也可以利用弹簧提供的恢复力实现。
优选地，所述盖板190的一端可转动地连接于所述基站100的外壳165，并且所述盖板190能够在所述第一位置和第二位置之间摆动。
所述盖板190连接于所述基站100的外壳165的一端位于所述基站100的外壳165的内部，所述基站100的外壳165开设有通孔，当所述盖板190运动至第一位置时，所述盖板190的下端穿过所述基站100的外壳165，位于所述基站100的外壳165的外部，并覆盖所述连接接口170；当所述盖板190运动至第二位置时，所述盖板190的至少部分位于所述基站100的外壳165内。
另一方面，所述盖板190可滑动地设置于所述基站100的外壳165，并且所述盖板190能够在所述第一位置和第二位置之间移动。
所述连接接口170的法兰部173上形成有限位部1731，当所述盖板190位于所述第一位置时，所述限位部1731与所述盖板的上表面的至少一部分接触，以通过所述限位部1731限制所述盖板190的进一步移动。
本公开中，所述限位部1731形成于所述法兰远离所述基站100的外壳165的部 分。
优选地，本公开的基站100还可以包括：基座101，基座101可以为腔体结构，基座101上可以设置有托盘部102，托盘部102上可以设置有两个主滚动轮定位座1021，本领域技术人员可以基于表面清洁设备的具体地滚动轮形式对主滚动轮定位座1021的数量和结构进行调整，对于不具有辅助滚动轮的表面清洁设备，基站100可以适应性地仅具有主滚动轮定位座1021。
基站100的托盘部102上还优选地形成有沥水槽1023，沥水槽1023的形状可以与表面清洁设备的滚刷等部件的形状适配，表面清洁设备停靠至基站100时，表面清洁设备的滚刷可以被置于沥水槽1023之中。
优选地，托盘部102与基座101可拆卸地连接。
根据本公开的优选实施方式，基站100的基座101为腔体结构，基座101的腔体结构内设置送风装置(送风装置可以具有加热组件以提供热风)，基座101上形成有基座出风口1011以及基座进气部1012，相应地，托盘部102上与基座出风口1011的对应位置设置有托盘出风口，使得送风装置输出的气流能够经由基座出风口1011及托盘出风口施加到被置于沥水槽1023中的表面清洁设备的滚刷等部件上，以对滚刷等部件进行干燥。
基座进气部1012可以设置在基座101的合适部位，其数量可以是一个或者两个以上。基座进气部1012可以是多孔形式。
基座101可以为大致方形形状，也可以为其他合适的形状。
本公开中，基站100具有外壳165，外壳165与基座101的一端固定连接，外壳165沿着竖直方向具有延伸尺寸。
基站100还可以设置有收纳箱103，收纳箱103与清洁液体供给部151均被外壳165支撑以及保持，收纳箱103可以具有可被打开的箱门。
优选地，收纳箱103以及清洁液体供给部151均为圆柱形结构，本领域技术人员也可以对收纳箱103及清洁液体供给部151的形状进行调整。
清洁液体供给部151的顶部可以设置加液部1511，加液部1511可以是加液盖配合加液口的形式。
清洁液体供给部151上还可以设置有提手部1512，清洁液体供给部151与外壳165为可拆卸连接。
图17是根据本公开的一个实施方式的清洁液体存储部的结构示意图。
优选地，如图8至图13，以及图17所示，所述基站100还具有双向泵装置、第一管路1071、第二管路1072及加热装置106，双向泵装置连接在阀组件153与第一管路1071的第一端之间，第一管路1071的第二端与加热装置106连接，加热装置106连接在第一管路1071的第二端与第二管路1072的第一端之间，第二管路1072的第二端与上述连接接口连接，使得清洁液体供给部151中的液体依次经由阀组件153、双向泵装置、第一管路1071、加热装置106、第二管路1072、连接接口被供应给表面清洁设备。
优选地，清洁液体供给部151通过下端盖152设置在外壳165上，阀组件153设置在下端盖152中。清洁液体供给部151能够从下端盖152上取下。
在本说明书的描述中，参考术语“一个实施例/方式”、“一些实施例/方式”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例/方式或示例描述的具体特征、结构、材料或者特点包含于本申请的至少一个实施例/方式或示例中。在本说明书中，对上述术语的示意性表述不必须针对的是相同的实施例/方式或示例。而且，描述的具体特征、结构、材料或者特点可以在任一个或多个实施例/方式或示例中以合适的方式结合。此外，在不相互矛盾的情况下，本领域的技术人员可以将本说明书中描述的不同实施例/方式或示例以及不同实施例/方式或示例的特征进行结合和组合。
此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。在本申请的描述中，“多个”的含义是至少两个，例如两个，三个等，除非另有明确具体的限定。
本领域的技术人员应当理解，上述实施方式仅仅是为了清楚地说明本公开，而并非是对本公开的范围进行限定。对于所属领域的技术人员而言，在上述公开的基础上还可以做出其它变化或变型，并且这些变化或变型仍处于本公开的范围内。

Claims (28)

  1. 一种表面清洁设备，其特征在于，包括：
    清洁液体存储部，所述清洁液体存储部用于存储清洁液体；
    回水组件，所述回水组件与所述清洁液体存储部连通，以通过所述回水组件向所述清洁液体存储部内提供清洁液体或者将所述清洁液体存储部内的清洁液体排出；以及
    充电耦合结构，所述充电耦合结构位于所述表面清洁设备后部且位于所述回水组件的上方；
    其中，所述回水组件包括阀组件和防护结构，所述防护结构至少部分地围绕所述阀组件，且所述防护结构的最低位置与所述阀组件的最低位置相同，或者低于所述阀组件的最低位置。
  2. 如权利要求1所述的表面清洁设备，其特征在于，所述充电耦合结构邻近所述回水组件。
  3. 如权利要求1所述的表面清洁设备，其特征在于，还包括：
    框架结构，所述防护结构设置于所述框架结构，并位于所述框架结构的下端。
  4. 如权利要求3所述的表面清洁设备，其特征在于，所述防护结构的壁面沿所述防护结构的轴线方向形成有固定肋条。
  5. 如权利要求3所述的表面清洁设备，其特征在于，还包括：
    导向结构，所述导向结构邻近所述充电耦合结构设置。
  6. 如权利要求5所述的表面清洁设备，其特征在于，所述导向结构为从所述框架结构的表面所形成的凸起结构，或者在所述框架结构上所形成的凹陷结构。
  7. 如权利要求6所述的表面清洁设备，其特征在于，当所述导向结构为凹陷结构时，所述充电耦合结构位于所述凹陷结构内。
  8. 如权利要求7所述的表面清洁设备，其特征在于，所述凹陷结构包括至少两个沿所述框架结构的长度方向延伸的导槽。
  9. 如权利要求1所述的表面清洁设备，其特征在于，所述充电耦合结构包括充电弹片。
  10. 如权利要求1所述的表面清洁设备，其特征在于，所述防护结构的内部形成有容置空间，所述阀组件设置于所述防护结构的容置空间内；并且所述防护结构和阀组件之间形成有腔室，所述腔室与所述清洁液体存储部连通。
  11. 如权利要求10所述的表面清洁设备，其特征在于，所述防护结构的上部形成有水管接头，所述水管接头与所述腔室连通，以通过将水管接头连接于清洁液体存储部的方式，使得腔室与所述清洁液体存储部连通。
  12. 如权利要求11所述的表面清洁设备，其特征在于，所述阀组件包括：
    阀体，所述阀体固定于所述防护结构，并且所述阀体的内部形成清洁液体流通的管路，所述清洁液体流通的管路与所述腔室连通；
    阀杆，所述阀杆可滑动地设置于所述阀体内；并使得所述阀杆能够处于第一位置和第二位置；以及
    堵头，所述堵头设置于所述阀杆的一端，并且当所述阀杆位于第一位置时，使得所述阀体的清洁液体流通的管路与所述腔室不连通，并且当所述阀杆位于第二位置时，使得所述阀体的清洁液体流通的管路与所述腔室连通。
  13. 如权利要求12所述的表面清洁设备，其特征在于，所述阀体的下半部分的外表面形成有至少一个容置密封圈的环形凹槽，所述环形凹槽内设置有密封圈。
  14. 如权利要求12所述的表面清洁设备，其特征在于，所述阀体的内部设置 有导向件，所述导向件与所述阀体的内表面间隔预设距离；所述导向件形成有中心孔，所述阀杆可滑动地设置于所述导向件的中心孔内。
  15. 如权利要求12所述的表面清洁设备，其特征在于，当所述阀杆位于第一位置时，所述堵头与所述阀体的内壁面密封接触，以使得所述阀体的清洁液体流通的管路与所述腔室不连通；当所述阀杆位于第二位置时，所述堵头与所述阀体的内壁面间隔一定距离，以使得所述阀体的清洁液体流通的管路与所述腔室不连通。
  16. 如权利要求14所述的表面清洁设备，其特征在于，所述阀杆的另一端形成有轴肩，弹簧的一端设置于所述轴肩，另一端设置于所述导向件，并且所述弹簧处于预压缩状态，以通过所述弹簧的弹力使得所述阀组件为常闭状态。
  17. 一种表面清洁系统，其特征在于，包括权利要求1-16之一所述的表面清洁设备。
  18. 如权利要求17所述的表面清洁系统，其特征在于，还包括：
    基站，所述基站用于向所述表面清洁设备提供电能，和/或，实现与表面清洁设备的流体交互。
  19. 如权利要求18所述的表面清洁系统，其特征在于，所述基站包括：
    清洁液体供给部，所述清洁液体供给部用于存储清洁液体；
    连接接口，所述连接接口连接至所述清洁液体供给部，当所述表面清洁设备停靠于所述基站时，所述表面清洁设备的回水组件连接于所述连接接口，以将所述清洁液体供给部的清洁液体通过所述连接接口输送至所述清洁液体存储部，或者将所述清洁液体存储部内的清洁液体通过所述连接接口输送至所述清洁液体供给部；以及
    盖板，所述盖板能够在第一位置和第二位置之间运动，其中，当所述盖板位于所述第一位置时，所述盖板覆盖所述连接接口，当所述盖板位于第二位置时，使得所述连接接口露出；以及
    充电结构，所述充电结构设置于所述盖板，所述充电结构与所述表面清洁设备的充电耦合结构配合，用于向停靠于所述基站的表面清洁设备提供电能，并实现所述表面清洁设备的充电。
  20. 如权利要求19所述的表面清洁系统，其特征在于，所述基站还包括：
    导向致动结构，所述导向致动结构设置于所述盖板，所述表面清洁设备能够通过所述导向致动结构致动所述盖板，且被所述导向致动结构导向。
  21. 如权利要求20所述的表面清洁系统，其特征在于，所述充电结构所处于的水平面位置高于所述连接接口所处于的水平面的位置。
  22. 如权利要求20所述的表面清洁系统，其特征在于，所述导向致动结构位于所述充电结构上方，并临近所述充电结构。
  23. 如权利要求20所述的表面清洁系统，其特征在于，所述导向致动结构为相对于所述盖板表面的凸起结构或凹陷结构。
  24. 如权利要求19所述的表面清洁系统，其特征在于，所述盖板包括连续的弧面，所述充电结构位于所述连续的弧面上。
  25. 如权利要求24所述的表面清洁系统，其特征在于，所述连续的弧面至少包括相互邻接设置的第一弧面和第二弧面，所述充电结构位于所述第一弧面或第二弧面上。
  26. 如权利要求20所述的表面清洁系统，其特征在于，所述盖板包括连续的弧面，所述导向致动结构位于所述连续的弧面上。
  27. 如权利要求26所述的表面清洁系统，其特征在于，所述连续的弧面至少包括相互邻接设置的第一弧面和第二弧面，所述导向致动结构位于所述第一弧面 或第二弧面上。
  28. 如权利要求20所述的表面清洁系统，其特征在于，所述导向致动结构包括至少一个导向片，所述导向片沿着所述盖板的长度方向设置；或者，所述导向致动结构包括至少一个圆柱形凸起或者半球形凸起。
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