WO2022242188A1 - 显示面板和显示装置 - Google Patents

显示面板和显示装置 Download PDF

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Publication number
WO2022242188A1
WO2022242188A1 PCT/CN2021/143540 CN2021143540W WO2022242188A1 WO 2022242188 A1 WO2022242188 A1 WO 2022242188A1 CN 2021143540 W CN2021143540 W CN 2021143540W WO 2022242188 A1 WO2022242188 A1 WO 2022242188A1
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Prior art keywords
substrate
layer
region
area
color filter
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PCT/CN2021/143540
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English (en)
French (fr)
Inventor
何政航
袁海江
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惠科股份有限公司
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Publication of WO2022242188A1 publication Critical patent/WO2022242188A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes

Definitions

  • the present application relates to the field of display technology, in particular to a display panel and a display device.
  • the liquid crystal display panel is composed of two transparent substrates and a liquid crystal cell sealed between the substrates; moreover, there are two types of support columns in the liquid crystal cell, one with a higher height
  • the main supporting column (main-PS) and a lower supporting column is the sub-supporting column (sub-PS).
  • the main supporting column abuts against two transparent substrates
  • the auxiliary supporting column abuts only one transparent substrate
  • the height difference between the auxiliary supporting column and the main supporting column forms a corresponding liquid crystal cell thickness.
  • the thickness of the corresponding liquid crystal cell is relatively small, and problems such as air bubbles or expansion of the lower part of the liquid crystal are prone to occur.
  • the purpose of the present application is to provide a display panel and a display device to improve the problem of air bubbles in the liquid crystal cell or expansion of the lower part of the liquid crystal.
  • the present application discloses a display panel, including a first substrate, a second substrate, a main support column and a secondary support column, the first substrate and the second substrate are oppositely arranged; the second substrate corresponds to the main support
  • the column position forms a first area
  • the corresponding auxiliary support column position forms a second area
  • the topography of the first area is higher than the topography of the second area; wherein, the number of film layers in the first area, greater than the number of layers in the second region.
  • the present application also discloses a display panel, which includes a color filter substrate and an array substrate oppositely arranged, and a main support column and a secondary support column located between the color filter substrate and the array substrate, the main support column and the secondary support column It is arranged on the side of the color filter substrate close to the array substrate, the number of film layers in the first area of the array substrate is greater than the number of film layers in the second area; the first area includes substrates stacked in sequence, Gate, gate insulating layer, semiconductor layer, source and drain, passivation layer and transparent electrode layer; the second region includes substrate, gate insulating layer, semiconductor layer, source and drain, passivation layer stacked in sequence and a transparent electrode layer; the difference between the topography of the first region and the second region is the thickness of the grid.
  • the present application also discloses a display device, including a display panel and a backlight module that provides a backlight for the display panel, the display panel includes a first substrate, a second substrate, a main support column and a secondary support column, the The first base plate and the second base plate are arranged facing each other; the second base plate forms a first area corresponding to the position of the main support column, and forms a second area corresponding to the position of the auxiliary support column.
  • the topography of the first area is high The topography of the second area; wherein, the number of film layers in the first area is greater than the number of film layers in the second area.
  • the present application does not change the height of the main support column and the height of the auxiliary support column, so that the height difference between the auxiliary support column and the main support column remains unchanged, by changing the auxiliary support column and the main support column Corresponding to the number of film layers in the second substrate area, increase the distance between the sub-support column and the second substrate to achieve the purpose of increasing the thickness and height of the sub-support column corresponding to the liquid crystal cell, thereby increasing the window of the drop-in injection method and improving Solved the problem of air bubbles in the liquid crystal cell and the expansion of the lower part of the liquid crystal.
  • FIG. 1 is a schematic side view of an exemplary display panel
  • Fig. 2 is a sectional view corresponding to Fig. 1;
  • Fig. 3 is a corresponding schematic diagram of the support column made by BPS technology during design and after forming;
  • Fig. 4 is a schematic diagram of the relationship between the amount of liquid crystal and the thickness of the liquid crystal cell
  • FIG. 5 is a schematic diagram of a display panel provided by an embodiment of the present application.
  • Fig. 6 is a sectional view corresponding to Fig. 5;
  • FIG. 7 is a schematic diagram of another display panel provided by an embodiment of the present application.
  • Fig. 8 is a sectional view corresponding to Fig. 7;
  • FIG. 9 is a schematic diagram of another display panel provided by an embodiment of the present application.
  • Fig. 10 is a sectional view corresponding to Fig. 9;
  • Fig. 11 is a schematic diagram of a display panel based on COA technology provided by an embodiment of the present application.
  • Fig. 12 is a schematic diagram of a groove design in the second area provided by an embodiment of the present application.
  • Fig. 13 is a schematic diagram of a display panel provided by another embodiment of the present application.
  • Fig. 14 is a schematic diagram of a display panel provided by another embodiment of the present application.
  • Fig. 15 is a schematic diagram of a display panel provided by another embodiment of the present application.
  • Fig. 16 is a schematic diagram of a display device provided by another embodiment of the present application.
  • first and second are used for descriptive purposes only, and cannot be understood as indicating relative importance, or implicitly indicating the quantity of indicated technical features. Therefore, unless otherwise specified, the features defined as “first” and “second” may explicitly or implicitly include one or more of these features; “plurality” means two or more.
  • the term “comprising” and any variations thereof mean non-exclusive inclusion, possible presence or addition of one or more other features, integers, steps, operations, units, components and/or combinations thereof.
  • the terms “mounted”, “connected” and “connected” should be interpreted in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection , can also be an electrical connection; it can be a direct connection, an indirect connection through an intermediary, or an internal communication between two components.
  • the display panel 200 includes a first substrate 210 (color filter substrate), a second substrate 220 (array substrate), main support columns 230 and auxiliary supports.
  • the main support column 230 and the auxiliary support column 240 are arranged on the first substrate 210, and the distance between the auxiliary support column 240 and the second substrate 220 is equal to the distance between the auxiliary support column 240 and the The height difference between the main support pillars 230, whether it is the main support pillars 230 or the auxiliary support pillars 240, the corresponding array substrate overlaps with the gate electrode 212 and the source and drain electrodes 215 of the array substrate, so only the main support pillars are used
  • the original design heights of 230 and auxiliary support column 240 are different, and the gap is obtained according to the height difference between the two, so the height of the main support column 230 is greater than the height of the auxiliary support column 240, and the thickness Y of the liquid crystal cell corresponding to the auxiliary support column 240 is.
  • the black matrix (Black Matrix, BM) between the support columns (Photo Spacer, PS) and the adjacent color resistors in the display panel 200 is often formed through a process, that is, the BPS technology, that is, the BM Two +PS masks are replaced by one BPS mask, which not only saves the cost of one mask, but also reduces the manufacturing cost.
  • BPS generally uses acryl (Acryl) resin materials
  • the film layer is deposited first, and then a negative photoresist pattern is formed on the film layer, and the BPS pattern is formed after being illuminated, that is, the support column and the black matrix are formed at the same time.
  • the BPS material will shrink in the process of light; and the BPS is formed by a full tone mask (Full tone type) through an exposure process, and the support column produced is elastic and has an island structure, which is prone to overflow.
  • FIG 3 it is the shape of the supporting columns produced by BPS technology in advance design (the upper figure, the supporting column is trapezoidal), and the corresponding graphics after forming (the lower The figure, the support column is arc-shaped).
  • the step difference between the main support column 230 and the auxiliary support column 240 cannot be increased by increasing the height of the support column, nor can the increase of the auxiliary support column 240 be achieved by this method.
  • the step difference between the main support column 230 and the auxiliary support column 240 cannot be increased by increasing the height of the support column, nor can the increase of the auxiliary support column 240 be achieved by this method.
  • FIG 4 it is a schematic diagram of the relationship between the amount of liquid crystal and the thickness of the liquid crystal box provided by the inventor.
  • the abscissa represents the amount of liquid crystal (LC)
  • the ordinate represents the thickness of the liquid crystal cell (Cell gap )
  • the thickness of the liquid crystal cell will gradually increase; but when the amount of liquid crystal is too small, bubbles will be generated in the liquid crystal, and when the amount of liquid crystal is too large, gravity mura will be generated (The lower part of the liquid crystal expands), affecting the uniformity and stability of the LCD screen.
  • the amount of liquid crystal and the thickness of the liquid crystal cell need to be kept within an appropriate range, so as to avoid the problems of air bubbles and gravitational mura caused by too little or too much liquid crystal; among them, the upper and lower limits of the amount of liquid crystal within this appropriate range are also the drop-in method.
  • Injection method window ODF window. Since the support column adopting BPS technology is easy to deform, it is difficult to make the support column high, resulting in the corresponding liquid crystal cell thickness being too small, easily causing bubbles in the liquid crystal layer, causing moving chromatic aberration, and making the display of the display panel 200 poor.
  • the present application provides a display panel 200 and a display device 100, which can increase the thickness of the liquid crystal cell corresponding to the auxiliary support column 240, so that the Cell gap is increased, the ODF window is increased, and the problem caused by the support column using BPS technology is improved. Bubbles are generated in the liquid crystal layer, affecting the display of the panel.
  • FIG. 5-12 it is a schematic diagram of a display panel 200.
  • a display panel 200 is disclosed.
  • the display panel 200 includes a first substrate 210, a second substrate 220, and main support columns. 230 and auxiliary support column 240, the first substrate 210 and the second substrate 220 are oppositely arranged; the first area 250 corresponding to the position of the main support column 230 is formed in the second substrate 220, corresponding to the position of the auxiliary support column 240 The position forms the second area 260; the topography of the first area 250 is higher than the topography of the second area 260; wherein, the number of film layers in the first area 250 is greater than that of the film layers in the second area 260 quantity.
  • the present application does not change the height of the main support column 230 and the height of the auxiliary support column 240, so that the height difference between the auxiliary support column 240 and the main support column 230 remains unchanged, by changing the auxiliary support column 240 and the main support column 230 correspond to the number of film layers in the area of the second substrate 220, and increase the distance between the sub-support column 240 and the second substrate 220 to achieve the purpose of increasing the thickness and height of the sub-support column 240 corresponding to the liquid crystal cell, thereby increasing
  • the window of the drop-in injection method is enlarged, and the problems of bubbles in the liquid crystal cell and expansion of the lower part of the liquid crystal are improved.
  • the scheme increases the auxiliary support by changing the topography, shape and thickness of the film layer corresponding to the auxiliary support column 240 The height between the column 240 and the second substrate 220, thereby increasing the thickness of the sub-support column 240 corresponding to the thickness of the liquid crystal cell, thereby reducing the generation of air bubbles and moving chromatic aberration, and improving the display effect of the display panel 200; and increasing the sub-support column 240 corresponding to the liquid crystal cell
  • the range of the amount of liquid crystal infusion also reaches a larger range, so that the amount of liquid crystal infusion is larger and the saturation of liquid crystal is higher, thereby improving the characteristics of the display panel 200 and making the display panel 200 look and feel better.
  • the first substrate 210 may be a color filter substrate, and the corresponding second substrate 220 is an array substrate; the first substrate 210 may also be an array substrate, and the corresponding second substrate 220 is a color filter substrate. .
  • the main support pillars 230 and secondary support pillars 240 are arranged on the side of the color filter substrate close to the array substrate.
  • the array substrate includes a substrate 211, a gate 212, a gate insulating layer 213, a semiconductor layer 214, a source and drain 215, a passivation layer 216, and a transparent electrode layer 217 stacked in sequence.
  • 230 is in contact with the transparent electrode layer 217
  • the sub-support column 240 is not in contact with the transparent electrode layer 217, and the space between them is filled with liquid crystal to form a corresponding thickness of the liquid crystal cell.
  • the array substrate also includes film layers such as a buffer layer and an alignment layer, which are not listed here.
  • a first area 250 is formed corresponding to the position of the main support column 230, and a second area 260 is formed corresponding to the position of the auxiliary support column 240.
  • the topography of the first area 250 is higher than that of the second area 260. terrain.
  • the number of film layers of the array substrate in the first region 250 and the second region 260 is different, so as to achieve the purpose of increasing the size of the sub-support pillars 240 and the second region 260.
  • the first region 250 includes a substrate 211, a gate 212, a gate insulating layer 213, a semiconductor layer 214, a source and drain 215, a passivation layer 216 and a transparent electrode layer 217 stacked in sequence;
  • the second region 260 includes a substrate 211, a gate insulating layer 213, a semiconductor layer 214, a source and drain 215, a passivation layer 216 and a transparent electrode layer 217 stacked in sequence; the first region 250 and the second region 260 is the thickness of the gate 212 .
  • the distance Y between the auxiliary supporting pillars 240 and the array substrate is equal to the height difference between the main supporting pillars 230 and the auxiliary supporting pillars 240, plus the thickness of the grid 212;
  • the distance between the auxiliary supporting pillars 240 and the array substrate is equal to the height difference between the main supporting pillars 230 and the auxiliary supporting pillars 240, which undoubtedly increases the thickness of the liquid crystal cell corresponding to the auxiliary supporting pillars 240, thereby reducing air bubbles and movement.
  • the generation of chromatic aberration improves the display effect of the display panel 200 .
  • the position of the sub-support pillar 240 corresponding to the grid 212 is avoided, which is also beneficial to increase the aperture ratio of the display panel 200 .
  • the first region 250 includes a substrate 211, a gate 212, a gate insulating layer 213, a semiconductor layer 214, a source and drain 215, a passivation layer 216 and a transparent electrode layer 217 stacked in sequence;
  • the second region 260 includes a substrate 211, a gate 212, a gate insulating layer 213, a semiconductor layer 214, a passivation layer 216 and a transparent electrode layer 217 stacked in sequence; the first region 250 and the second region 260 The difference in topography is the thickness of the source and drain electrodes 215 .
  • the distance Y between the auxiliary supporting pillars 240 and the array substrate is equal to the height difference between the main supporting pillars 230 and the auxiliary supporting pillars 240, plus the thickness of the source and drain electrodes 215; compared to FIG. 1
  • the distance between the middle and auxiliary supporting columns 240 and the array substrate is equal to the height difference between the main supporting columns 230 and the auxiliary supporting columns 240, which undoubtedly increases the thickness of the liquid crystal cell corresponding to the auxiliary supporting columns 240, thereby reducing air bubbles and The occurrence of chromatic aberration is moved to improve the display effect of the display panel 200 .
  • the data line is partially bent, so as to avoid the overlapping of the source and drain electrodes 215 and the sub-support pillars 240, thus increasing the overlapping area of the source and drain electrodes 215 and the gate 212, It is beneficial to improve the driving effect of the active switch.
  • the first region 250 includes a substrate 211, a gate 212, a gate insulating layer 213, a semiconductor layer 214, a source and drain 215, a passivation layer 216 and a transparent electrode layer 217 stacked in sequence;
  • the second region 260 includes a substrate 211, a gate insulating layer 213, a semiconductor layer 214, a passivation layer 216 and a transparent electrode layer 217 stacked in sequence; the difference in topography between the first region 250 and the second region 260 , which is the sum of the thicknesses of the source-drain 215 and the gate 212 .
  • the distance Y between the auxiliary supporting pillars 240 and the array substrate is equal to the height difference between the main supporting pillars 230 and the auxiliary supporting pillars 240, plus the thickness of the source and drain electrodes 215 and the gate 212;
  • the liquid crystal cell corresponding to the auxiliary support column 240 is undoubtedly greatly increased. thicker, the generation of air bubbles and shifting color difference is further reduced, and the display effect of the display panel 200 is improved.
  • this embodiment achieves the purpose of increasing the thickness of the liquid crystal cell corresponding to the sub-support column 240 by simultaneously designing the gate 212 to avoid space, and changing the local wiring position of the data line, so that the data line is partially bent. At the same time, it has the comprehensive effect of increasing the aperture ratio of the display panel 200 and improving the driving of the active switch.
  • the gate 212 and the source and drain 215 adopt a thickened design, specifically, the gate 212 and the source and drain 215 adopt a double aluminum or double copper process, and the film thickness is 3000 Between -5500 Angstroms.
  • the array substrate further includes a color-resist layer 218 , a light-shielding layer 219 and a planarization layer 222 , and the color-resist layer 218 and the light-shielding layer 219 are arranged on the side of the passivation layer 216 away from the semiconductor layer 214
  • the flat layer 222 is arranged on the side of the color-resist layer 218 and the light-shielding layer 219 away from the passivation layer 216
  • the transparent electrode layer 217 is arranged on the flat layer 222 and the color-resist layer 218 And one side of the light-shielding layer 219.
  • This embodiment can be further improved based on the above-mentioned multiple embodiments, and the color-resist layer 218 in the color filter substrate can be made on the array substrate.
  • This technology is COT (color filter on TFT) or COA (color filter on Array) technology, its benefits can increase the pixel aperture ratio and reduce the probability of movable mura (movable mura), and can further reduce the resistance and capacitance load; in addition, COT or COA technology is easier to use in combination with BPS technology, so it is more necessary to add secondary support
  • the column 240 corresponds to the thickness of the liquid crystal cell.
  • the light-shielding layer 219 is formed by stacking the color-resist in the color-shielding layer 218, which reduces the process steps of the light-shielding layer 219 and improves production efficiency; 219 overlapping, the orthographic projection of the auxiliary support column 240 overlaps with the color resist layer 218, the light shielding layer 219 is formed by stacking at least two color resists of different colors, and the thickness of each layer of color resist is the same as that of the color resist layer 218 have the same thickness, at this time, the distance Y between the sub-support pillars and the array substrate is at least equal to the sum of the height of the color resist layer and the height difference between the two support pillars, so that the first region 250 and the second region 260 The height difference is further expanded, further reducing the probability of bubbles in the liquid crystal.
  • this application can also achieve the purpose of increasing the thickness of the sub-support column 240 corresponding to the liquid crystal cell by changing the thickness of the film layer in the first region 250 and the second region 260.
  • the thickness of the film layer in the first region 250 can be increased.
  • the thickness of the film layer in the second region 260 can be reduced, wherein not only the thickness of the film layer in the array substrate can be changed, but also the thickness of the film layer in the color filter substrate can be changed.
  • the second The area 260 is provided with a trench 221, and the difference between the topography of the first area 250 and the second area 260 is the depth of the trench 221, that is, the distance Y between the auxiliary support column and the array substrate is the main support column and the distance between the auxiliary supporting columns, and the sum of the depth of the trench.
  • the purpose of increasing the thickness of the liquid crystal cell corresponding to the sub-support column 240 is achieved by reducing the thickness of the film layer overlapping the sub-support column 240 in the array substrate; Make thin, do not need to make whole film layer thin, do not affect the overall performance of film layer; Further, present embodiment is to make the thickness of passivation layer 216 thin, because the film layer of passivation layer 216 is thicker, Therefore, if the trench 221 is disposed in the passivation layer 216 , the depth of the trench 221 can be increased, so that the topographical difference between the first region 250 and the second region 260 can be increased. In addition, in this embodiment, trenches 221 can be simultaneously designed for multiple film layers in the second area 260 to further increase the topographical difference between the first area 250 and the second area 260 .
  • the first substrate 210 is a color filter substrate
  • the second substrate 220 is an array substrate
  • the main support pillars 230 and auxiliary support pillars 240 are arranged on the array substrate.
  • the side of the substrate close to the color filter substrate, the array substrate forms a first area 250 corresponding to the position of the main support column 230, and forms a second area 260 corresponding to the position of the auxiliary support column 240; the first area 260 of the array substrate
  • the number of film layers in the region 250 is greater than the number of film layers in the second region 260; specifically, the design of the first region 250 and the second region 260 of the array substrate in this embodiment can correspond to that of the array substrate in the embodiment shown in FIG. 5-12
  • the design of the first area 250 and the second area 260 is the same.
  • the first substrate 210 is an array substrate
  • the second substrate 220 is a color filter substrate
  • the main support pillars 230 and auxiliary support pillars 240 are arranged on the array substrate.
  • the side of the substrate close to the color filter substrate, the main support column 230 is in contact with the color filter substrate, the secondary support column 240 is not in contact with the color filter substrate, and liquid crystal is filled between them, The thickness of the corresponding liquid crystal cell is formed;
  • the first area 250 is formed corresponding to the position of the main support column 230 in the color filter substrate, and the second area 260 is formed corresponding to the position of the auxiliary support column 240;
  • the topography of the first area 250, The terrain is higher than the second area 260 ; wherein, the number of film layers in the first area 250 is greater than the number of film layers in the second area 260 .
  • the distance between the auxiliary support pillars 240 and the color filter substrate is greater than that of the main support pillars 230 and the auxiliary support pillars 240
  • the sub-support pillar 240 can be made to the side of the black matrix 290 close to the array substrate, and the main support pillar can be made to the side of the color resist layer 218 close to the array substrate; thereby reducing air bubbles and The generation of chromatic aberration is moved, and the display effect of the display panel is improved.
  • auxiliary support pillars it is also possible to improve the height of the auxiliary support pillars by changing the shape and position of the wiring of the gate 212 and the source and drain electrodes 215 in the array substrate, as well as the film thickness of the main support pillars 230 and the auxiliary support pillars 240 in other film layers.
  • 240 and the color filter substrate in addition, by changing the thickness of the film layer in the color filter substrate, for example, grooves can be made in the fourth area 280, or protrusions can be made in the third area 270 to further increase The step difference between the third area 270 and the fourth area 280 is large.
  • the first substrate 210 is an array substrate
  • the second substrate 220 is a color filter substrate
  • the main support pillars 230 and auxiliary support pillars 240 are arranged on the color filter substrate.
  • the main support pillars 230 are in contact with the array substrate, and the secondary support pillars 240 are not in contact with the array substrate, and liquid crystals are filled between them to form a corresponding The thickness of the liquid crystal cell;
  • the color filter substrate forms a first area 250 corresponding to the position of the main support column 230, and forms a second area 260 corresponding to the position of the auxiliary support column 240;
  • the topography of the first area 250 is higher than The topography of the second area 260 ; wherein, the number of film layers in the first area 250 is greater than the number of film layers in the second area 260 .
  • the positions of the main support pillars and the auxiliary support pillars can also be changed without changing the film layer structure of the first substrate 210 or the second substrate 220, so as to achieve the effect of the main support pillars 230 and the auxiliary support pillars 240 corresponding to different film layers. Effect.
  • a display device 100 including the above-mentioned display panel 200 , and a backlight module 300 providing a backlight for the display panel 200 .
  • the display device 100 provided in this embodiment, bubbles will not be generated in the liquid crystal, and the amount of liquid crystal dropped is large, which can provide a good display effect during the display process.
  • inventive concept of the present application can form a lot of embodiments, but the space of the application documents is limited and cannot be listed one by one. Therefore, on the premise of not conflicting, the above-described embodiments or each The technical features can be combined arbitrarily to form new embodiments, and the original technical effects will be enhanced after each embodiment or technical features are combined

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  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
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  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

显示面板(200)和显示装置(100)，显示面板(100)包括对向设置的第一基板(210)和第二基板(220)，以及位于第一基板(210)和第二基板(220)之间的主支撑柱(230)和副支撑柱(240)，第二基板(220)中对应主支撑柱(230)位置形成第一区域(250)，对应副支撑柱(240)位置形成第二区域(260)，第一区域(250)的地势，高于第二区域(260)的地势；其中，第一区域(250)中膜层的数量，大于第二区域(260)中膜层的数量。

Description

显示面板和显示装置
本申请要求于2021年05月20日提交中国专利局，申请号为CN2021105509287，申请名称为“显示面板和显示装置”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及显示技术领域，尤其涉及一种显示面板和显示装置。
背景技术
这里的陈述仅提供与本申请有关的背景信息，而不必然地构成现有技术；
随着科技的进步，许多不同的显示设备，例如液晶显示器(Liquid Crystal Display，LCD)已广泛地应用于平面显示器，液晶显示器大部分为背光型液晶显示器，其是由液晶显示面板及背光模块(backlight module)所组成，液晶显示面板是由两片透明基板以及被封于基板之间的液晶盒所构成；而且，液晶盒中设有两种类型的支撑柱，一种高度较高的支撑柱为主支撑柱(main-PS)，一种高度较低的支撑柱为副支撑柱(sub-PS)。主支撑柱与两个透明基板抵接，副支撑柱只与一个透明基板抵接，副支撑柱与主支撑柱之间的高度差形成对应的液晶盒厚。
目前，由于副支撑柱与主支撑柱之间的高度差较小，导致对应的液晶盒厚较小，容易产生气泡或液晶下部膨胀的问题。
发明内容
本申请的目的是提供一种显示面板和显示装置，以改善液晶盒中出现的气泡或液晶下部膨胀的问题。
本申请公开了一种显示面板，包括第一基板、第二基板、主支撑柱和副支撑柱，所述第一基板和第二基板对向设置；所述第二基板中对应所述主支撑柱位置形成第一区域，对应所述副支撑柱位置形成第二区域，所述第一区域的地势，高于所述第二区域的地势；其中，所述第一区域中膜层的数量，大于第二区域中膜层的数量。
本申请还公开了一种显示面板，包括对向设置的彩膜基板和阵列基板，以及位于彩膜基板和阵列基板之间的主支撑柱和副支撑柱，所述主支撑柱和副支撑柱设置在所述彩膜基板靠近所述阵列基板的一侧，所述阵列基板中第一区域的膜层数量，大于第二区域的膜层数量；所述第一区域包括依次堆叠的衬底、栅极、栅极绝缘层、半导体层、源漏极、钝化层和透明 电极层；所述第二区域包括依次堆叠的衬底、栅极绝缘层、半导体层、源漏极、钝化层和透明电极层；所述第一区域和所述第二区域的地势之差为所述栅极的厚度。
本申请还公开了一种显示装置，包括显示面板以及为所述显示面板提供背光源的背光模组，所述显示面板包括第一基板、第二基板、主支撑柱和副支撑柱，所述第一基板和第二基板对向设置；所述第二基板中对应所述主支撑柱位置形成第一区域，对应所述副支撑柱位置形成第二区域，所述第一区域的地势，高于所述第二区域的地势；其中，所述第一区域中膜层的数量，大于第二区域中膜层的数量。。
本申请在不对主支撑柱的高度和副支撑柱的高度做变动，使所述副支撑柱和所述主支撑柱之间的高度差不变的情况下，通过改变副支撑柱和主支撑柱对应第二基板区域的膜层数量，增大副支撑柱与第二基板之间的间距，达到增大副支撑柱对应液晶盒厚高度的目的，从而增大了滴入式注入法窗口，改善了液晶盒中气泡和液晶下部膨胀的问题。
附图说明
所包括的附图用来提供对本申请实施例的进一步的理解，其构成了说明书的一部分，用于例示本申请的实施方式，并与文字描述一起来阐释本申请的原理。显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动性的前提下，还可以根据这些附图获得其他的附图。在附图中：
图1是一种示例性的显示面板的侧视示意图；
图2是图1对应的截面图；
图3是采用BPS技术制作的支撑柱在设计时和成型后分别对应的示意图；
图4是一种液晶量和液晶盒厚的关系示意图；
图5是本申请的一实施例提供的一种显示面板的示意图；
图6是图5对应的截面图；
图7是本申请的一实施例提供的另一种显示面板的示意图；
图8是图7对应的截面图；
图9是本申请的一实施例提供的另一种显示面板的示意图；
图10是图9对应的截面图；
图11是本申请的一实施例提供的一种基于COA技术的显示面板的示意图；
图12是本申请的一实施例提供的一种在第二区域做挖槽设计的示意图；
图13是本申请的另一实施例提供的一种显示面板的示意图；
图14是本申请的另一实施例提供的一种显示面板的示意图；
图15是本申请的另一实施例提供的一种显示面板的示意图；
图16是本申请的另一实施例提供的一种显示装置的示意图。
具体实施方式
需要理解的是，这里所使用的术语、公开的具体结构和功能细节，仅仅是为了描述具体实施例，是代表性的，但是本申请可以通过许多替换形式来具体实现，不应被解释成仅受限于这里所阐述的实施例。
在本申请的描述中，术语“第一”、“第二”仅用于描述目的，而不能理解为指示相对重要性，或者隐含指明所指示的技术特征的数量。由此，除非另有说明，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征；“多个”的含义是两个或两个以上。术语“包括”及其任何变形，意为不排他的包含，可能存在或添加一个或更多其他特征、整数、步骤、操作、单元、组件和/或其组合。
另外，“中心”、“横向”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系的术语，是基于附图所示的方位或相对位置关系描述的，仅是为了便于描述本申请的简化描述，而不是指示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。
此外，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，或是两个元件内部的连通。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本申请中的具体含义。
如图1-2所示，是一种显示面板200平面和截面的示意图，显示面板200包括第一基板210(彩膜基板)、第二基板220(阵列基板)、主支撑柱230和副支撑柱240，所述主支撑柱230和副支撑柱240设置在所述第一基板210上，所述副支撑柱240和所述第二基板220的间距，等于所述副支撑柱240和所述主支撑柱230之间的高度差，这里不管是主支撑柱230还是副支撑柱240，对应的阵列基板中都与阵列基板的栅极212和源漏极215重叠，因此仅是利用主支撑柱230与副支撑柱240原始设计的高度不同，根据两者的高度差得到断差，所以主支撑柱230的高度大于副支撑柱240的高度多少，副支撑柱240对应液晶盒厚度Y就是多少。
在制作支撑柱时，常常会将支撑柱(Photo Spacer，PS)与显示面板200中相邻色阻之间的黑矩阵(Black Matrix，BM)通过一道制程形成，即BPS技术，也就是将BM+PS两张光罩用BPS一张光罩取代，这样不仅节省了一张光罩的费用，而且还使制成本下降。
但是由于通过BPS一般采用亚克力(Acryl)树脂材料，在制程中，先沉积完膜层，然后在膜层上形成负性光刻胶图案，照光后形成BPS图案，即同时形成支撑柱和黑矩阵，但是 BPS材料在光照的过程中会发生膜缩现象；而且BPS利用全色调掩膜(Full tone type)经一道曝光工艺形成，制作出的支撑柱有弹性且为岛状结构，易发生溢出，导致支撑柱图形变形，具体如图3所示，是利用BPS技术制作出的支撑柱分别在事先设计时的形状(上方的图，支撑柱为梯形)，以及成型后形状对应的图型(下方的图，支撑柱为圆弧形)。
由于利用BPS技术制作的支撑柱容易变形，因此不能通过增大支撑柱高度的方法来增加主支撑柱230和副支撑柱240之间的段差，亦不能通过这种方法达到增大副支撑柱240对应液晶盒厚的目的。
如图4所示，是发明人提供的一种液晶量和液晶盒厚的关系示意图，在图4的直角坐标系中，横坐标表示液晶(LC)量，纵坐标表示液晶盒厚(Cell gap)，图中可以看出随着液晶量的增大，液晶盒厚会逐渐增大；但是当液晶量过小的时候，液晶中会产生气泡，而当液晶量过大的时候会产生重力mura(液晶下部膨胀)，影响LCD画面的均匀性和稳定性。因此液晶量和液晶盒厚需要保持在一个适合范围内，从而避免液晶量太少或太多导致的气泡和重力mura问题；其中，这一适合范围内液晶量的上限和下限也即滴入式注入法窗口(ODF window)。由于采用BPS技术的支撑柱容易变形，使得支撑柱难以做高，导致对应的液晶盒厚过小，容易导致液晶层中产生气泡，会造成移动色差，使得显示面板200的显示观感差。
基于此，本申请提供一种显示面板200和显示装置100，可以增大副支撑柱240对应的液晶盒厚，使得Cell gap增大，ODF window增大，改善由于支撑柱采用BPS技术而导致的液晶层中产生气泡，影响面板显示的问题。下面参考附图和可选的实施例对本申请作详细说明。
如图5-12所示，是一种显示面板200的示意图，作为本申请的一实施例，公开了一种显示面板200，显示面板200包括第一基板210、第二基板220、主支撑柱230和副支撑柱240，所述第一基板210和第二基板220对向设置；所述第二基板220中对应所述主支撑柱230位置形成第一区域250，对应所述副支撑柱240位置形成第二区域260；所述第一区域250的地势，高于所述第二区域260的地势；其中，所述第一区域250中膜层的数量，大于第二区域260中膜层的数量。
由于采用BPS技术形成的支撑柱容易变形，使得支撑柱的高度难以提高，从而限制了主支撑柱230和副支撑柱240之间的段差。本申请在不对主支撑柱230的高度和副支撑柱240的高度做变动，使所述副支撑柱240和所述主支撑柱230之间的高度差不变的情况下，通过改变副支撑柱240和主支撑柱230对应第二基板220区域的膜层数量，增大副支撑柱240与第二基板220之间的间距，达到增大副支撑柱240对应液晶盒厚高度的目的，从而增大了滴入式注入法窗口，改善了液晶盒中气泡和液晶下部膨胀的问题。
具体的，本申请在图1的基础上，在不改变支撑柱和副支撑柱240形状和位置的情况下， 方案通过改变副支撑柱240对应的膜层的地形、形状及厚度来增加副支撑柱240与第二基板220之间的高度，从而增加副支撑柱240对应液晶盒厚高度，进而减少气泡和移动色差的产生，提高显示面板200的显示效果；并且增大副支撑柱240对应液晶盒厚高度后，液晶滴入量范围也相应达到更大的范围，这样液晶的滴入量就更大，液晶饱和度就更高，从而提高显示面板200特性，使得显示面板200的观感效果好。
其中，所述第一基板210可以为彩膜基板，对应的所述第二基板220为阵列基板；所述第一基板210也可以为阵列基板，对应的所述第二基板220为彩膜基板。
当所述第一基板210可以为彩膜基板，对应的所述第二基板220为阵列基板时，所述主支撑柱230和副支撑柱240设置在所述彩膜基板靠近所述阵列基板的一侧，所述阵列基板包括依次堆叠设置的衬底211、栅极212、栅极绝缘层213、半导体层214、源漏极215、钝化层216和透明电极层217，所述主支撑柱230和透明电极层217抵接，所述副支撑柱240与所述透明电极层217之间未抵接，两者之间填充有液晶，形成对应的液晶盒厚。当然阵列基板还包括缓冲层和配向层等膜层，在此不一一列举。
所述阵列基板中对应所述主支撑柱230位置形成第一区域250，对应所述副支撑柱240位置形成第二区域260，所述第一区域250的地势，高于所述第二区域260的地势。如图5-10所示，分别是通过改变第二区域260的膜层位置和形状，使得第一区域250和第二区域260中阵列基板膜层数量不同，从而达到增大副支撑柱240与阵列基板间距的三种实施方式。
图5-6中，所述第一区域250包括依次堆叠的衬底211、栅极212、栅极绝缘层213、半导体层214、源漏极215、钝化层216和透明电极层217；所述第二区域260包括依次堆叠的衬底211、栅极绝缘层213、半导体层214、源漏极215、钝化层216和透明电极层217；所述第一区域250和所述第二区域260的地势之差为所述栅极212的厚度。本实施例中，副支撑柱240和阵列基板之间的间距Y，等于所述主支撑柱230与副支撑柱240的高度之差，加上所述栅极212的厚度；相对于图1中副支撑柱240和阵列基板之间的间距，等于所述主支撑柱230与副支撑柱240的高度之差来说，无疑增大了副支撑柱240对应的液晶盒厚，从而减少气泡和移动色差的产生，提高显示面板200的显示效果。而且，本实施例是通过将副支撑柱240对应栅极212位置做避空，这样还有利于提高显示面板200开口率。
图7-8中，所述第一区域250包括依次堆叠的衬底211、栅极212、栅极绝缘层213、半导体层214、源漏极215、钝化层216和透明电极层217；所述第二区域260包括依次堆叠的衬底211、栅极212、栅极绝缘层213、半导体层214、钝化层216和透明电极层217；所述第一区域250和所述第二区域260的地势之差为所述源漏极215的厚度。本实施例中，副支撑柱240和阵列基板之间的间距Y，等于所述主支撑柱230与副支撑柱240的高度之差，加上所述源漏极215的厚度；相对于图1中副支撑柱240和阵列基板之间的间距，等于所述 主支撑柱230与副支撑柱240的高度之差来说，无疑增大了副支撑柱240对应的液晶盒厚，从而减少气泡和移动色差的产生，提高显示面板200的显示效果。而且，本实施例是通过改变数据线的局部走线位置，使数据线局部弯曲，避免源漏极215与副支撑柱240重叠，这样增大了源漏极215与栅极212的重叠面积，有利于提高主动开关的驱动效果。
图9-10中，所述第一区域250包括依次堆叠的衬底211、栅极212、栅极绝缘层213、半导体层214、源漏极215、钝化层216和透明电极层217；所述第二区域260包括依次堆叠的衬底211、栅极绝缘层213、半导体层214、钝化层216和透明电极层217；所述第一区域250和所述第二区域260的地势之差，为所述源漏极215和所述栅极212的厚度之和。本实施例中，副支撑柱240和阵列基板之间的间距Y，等于所述主支撑柱230与副支撑柱240的高度之差，加上所述源漏极215和栅极212的厚度；相对于图1中副支撑柱240和阵列基板之间的间距，等于所述主支撑柱230与副支撑柱240的高度之差来说，无疑极大地增大了副支撑柱240对应的液晶盒厚，进一步减少了气泡和移动色差的产生，提高显示面板200的显示效果。而且，本实施例是通过同时对栅极212做避空设计，并改变数据线的局部走线位置，使数据线局部弯曲，来达到增大副支撑柱240对应的液晶盒厚的目的，因此同时具备上述提高显示面板200开口率、提高主动开关的驱动的综合效果。
进一步的，在上述多个实施例中，所述栅极212和源漏极215采用加厚设计，具体的，栅极212和源漏极215采用双铝或双铜制程，并且膜厚在3000-5500埃米之间。通过这样的设计，能够进一步提高副支撑柱240对应的液晶盒厚，进一步改善气泡问题；并且还可以减小电阻电容负载(RC loading，Resistance Capacitor loading)，因为由电容公式C＝ε0εrA/d可知，其中，ε为介电常数，其中A为面积，d为膜层厚度。可知d越小，则电容越大，而电容越大，则电容负载也就越大。因此，通过增大栅极212和源漏极215的厚度，还能够达到改善电阻电容负载的问题。
如图11所示，所述阵列基板还包括色阻层218、遮光层219和平坦层222，所述色阻层218和遮光层219设置在所述钝化层216远离所述半导体层214的一侧，所述平坦层222设置在所述色阻层218和遮光层219远离所述钝化层216的一侧，所述透明电极层217设置在所述平坦层222所述色阻层218和遮光层219的一侧。本实施例可以基于上述多个实施例的进一步改进，将彩膜基板中的色阻层218做到阵列基板上，这一技术为COT(color filter on TFT)或是COA(color filter on Array)技术，其好处可以提升画素开口率并降低移动色差(movable mura)的发生机率，并且还可以进一步减小电阻电容负载；另外COT或COA技术更容易与BPS技术结合使用，因此更加需要增加副支撑柱240对应的液晶盒厚。
其中，所述遮光层219由色阻层218中的色阻堆叠而成，这样减小了遮光层219的制程步骤，提高生产效率；且所述主支撑柱230的正投影与所述遮光层219重叠，所述副支撑柱 240的正投影与所述色阻层218重叠，所述遮光层219至少由两种不同颜色的色阻堆叠而成，每层色阻的厚度都与色阻层218的厚度相同，此时副支撑柱和阵列基板之间的间距Y，最少等于色阻层的高度与两种支撑柱之间的高度差之和，这样使得第一区域250与第二区域260的高度差进一步扩大，进一步减小液晶中气泡产生的几率。
当然本申请还可以通过改变第一区域250和第二区域260中膜层的厚度来达到增大副支撑柱240对应液晶盒厚的目的，具体可以增加第一区域250中膜层的厚度，也可以减小第二区域260中膜层的厚度，其中不仅可以改变阵列基板中膜层的厚度，还可以改变彩膜基板中膜层的厚度。
如图12所示，是一种减小第二区域260中膜层厚度的设计，在第一区域250中膜层的数量大于第二区域260中膜层的数量的前提下，所述第二区域260设有挖槽221，所述第一区域250和所述第二区域260的地势之差为所述挖槽221的深度，即副支撑柱与阵列基板之间的间距Y为主支撑柱和副支撑柱之间的间距，与挖槽的深度之和。本实施例是通过减小阵列基板中与副支撑柱240重叠膜层的厚度，来达到增大副支撑柱240对应液晶盒厚的目的；本实施例只是将与副支撑柱240重叠的膜层做薄，并不用将整道膜层做薄，并不影响膜层的整体性能；进一步的，本实施例是将钝化层216的厚度做薄，由于钝化层216的膜层较厚，因此挖槽221设置在钝化层216中的话，可以增大挖槽221的深度，使得第一区域250和所述第二区域260的地势差增大。另外，本实施例还可以同时对第二区域260中多个膜层同时进行挖槽221设计，进一步增大第一区域250和所述第二区域260的地势差。
如图13所示，在另一实施例中，所述第一基板210为彩膜基板，所述第二基板220为阵列基板，所述主支撑柱230和副支撑柱240设置在所述阵列基板靠近所述彩膜基板的一侧，所述阵列基板对应所述主支撑柱230位置形成第一区域250，对应所述副支撑柱240位置形成第二区域260；所述阵列基板中第一区域250的膜层数量，大于第二区域260的膜层数量；具体的，本实施例中阵列基板第一区域250和第二区域260的设计，可以与图5-12对应实施例中阵列基板第一区域250和第二区域260的设计相同。
如图14所示，在另一实施例中，所述第一基板210为阵列基板，所述第二基板220为彩膜基板，所述主支撑柱230和副支撑柱240设置在所述阵列基板靠近所述彩膜基板的一侧，所述主支撑柱230与彩膜基板抵接，所述副支撑柱240与所述彩膜基板之间不抵接，两者之间填充有液晶，形成对应的液晶盒厚；所述彩膜基板中对应所述主支撑柱230位置形成第一区域250，对应所述副支撑柱240位置形成第二区域260；所述第一区域250的地势，高于所述第二区域260的地势；其中，所述第一区域250中膜层的数量，大于第二区域260中膜层的数量。
在本实施例中，通过改变彩膜基板中第一区域250和第二区域260的膜层数量，使得副 支撑柱240和彩膜基板之间的间距，大于主支撑柱230和副支撑柱240之间的段差；例如可以将副支撑柱240做到黑矩阵290靠近所述阵列基板的一侧，而将主支撑柱做到色阻层218靠近所述阵列基板的一侧；从而减少气泡和移动色差的产生，提高显示面板的显示效果。
另外，还可以通过改变阵列基板中栅极212和源漏极215的走线形状和位置，以及其它膜层中与主支撑柱230、副支撑柱240的膜厚，这些方案来提高副支撑柱240与彩膜基板之间的间距；另外，还通过改变彩膜基板中膜层的厚度，例如可以在第四区域280中做挖槽，或者在第三区域270中做凸起，来进一步增大第三区域270和第四区域280的段差。
如图15所示，在另一实施例中，所述第一基板210为阵列基板，所述第二基板220为彩膜基板，所述主支撑柱230和副支撑柱240设置在所述彩膜基板靠近所述阵列基板的一侧，主支撑柱230与所述阵列基板抵接，所述副支撑柱240与所述阵列基板之间不抵接，两者之间填充有液晶，形成对应的液晶盒厚；所述彩膜基板中对应所述主支撑柱230位置形成第一区域250，对应所述副支撑柱240位置形成第二区域260；所述第一区域250的地势，高于所述第二区域260的地势；其中，所述第一区域250中膜层的数量，大于第二区域260中膜层的数量。
当然本申请中还可以改变主支撑柱和副支撑柱的位置，而不改变第一基板210或第二基板220的膜层结构，来达到主支撑柱230和副支撑柱240对应不同膜层的效果。
作为本申请的另一实施例，如图14所示，还公开了一种显示装置100，包括如上所述的显示面板200，以及为所述显示面板200提供背光源的背光模组300。采用本实施例提供的显示装置100，不会在液晶中产生气泡，且液晶的滴入量较多，在显示过程中能够提供良好的显示效果。
需要说明的是,本申请的发明构思可以形成非常多的实施例，但是申请文件的篇幅有限，无法一一列出，因而，在不相冲突的前提下,以上描述的各实施例之间或各技术特征之间可以任意组合形成新的实施例，各实施例或技术特征组合之后，将会增强原有的技术效果
以上内容是结合具体的可选实施方式对本申请所作的进一步详细说明，不能认定本申请的具体实施只局限于这些说明。对于本申请所属技术领域的普通技术人员来说，在不脱离本申请构思的前提下，还可以做出若干简单推演或替换，都应当视为属于本申请的保护范围。

Claims (19)

  1. 一种显示面板，包括对向设置的第一基板和第二基板，以及位于第一基板和第二基板之间的主支撑柱和副支撑柱，所述第二基板中对应所述主支撑柱位置形成第一区域，对应所述副支撑柱位置形成第二区域，所述第一区域的地势，高于所述第二区域的地势；
    其中，所述第一区域中膜层的数量，大于第二区域中膜层的数量。
  2. 根据权利要求1所述的显示面板，其中，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述主支撑柱和副支撑柱设置在所述彩膜基板靠近所述阵列基板的一侧，所述阵列基板中第一区域的膜层数量，大于第二区域的膜层数量。
  3. 根据权利要求1所述的显示面板，其中，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述主支撑柱和副支撑柱设置在所述阵列基板靠近所述彩膜基板的一侧，所述阵列基板中第一区域的膜层数量，大于第二区域的膜层数量。
  4. 根据权利要求2所述的显示面板，其中，所述第一区域包括依次堆叠的衬底、栅极、栅极绝缘层、半导体层、源漏极、钝化层和透明电极层；
    所述第二区域包括依次堆叠的衬底、栅极绝缘层、半导体层、源漏极、钝化层和透明电极层；
    所述第一区域和所述第二区域的地势之差为所述栅极的厚度。
  5. 根据权利要求2所述的显示面板，其中，所述第一区域包括依次堆叠的衬底、栅极、栅极绝缘层、半导体层、源漏极、钝化层和透明电极层；
    所述第二区域包括依次堆叠的衬底、栅极、栅极绝缘层、半导体层、钝化层和透明电极层；
    所述第一区域和所述第二区域的地势之差为所述源漏极的厚度。
  6. 根据权利要求2所述的显示面板，其中，所述第一区域包括依次堆叠的衬底、栅极、栅极绝缘层、半导体层、源漏极、钝化层和透明电极层；
    所述第二区域包括依次堆叠的衬底、栅极绝缘层、半导体层、钝化层和透明电极层；
    所述第一区域和所述第二区域的地势之差，为所述源漏极和所述栅极的厚度之和。
  7. 根据权利要求2所述的显示面板，其中，所述阵列基板包括依次堆叠的衬底、栅极、栅极绝缘层、半导体层、源漏极、钝化层和透明电极层；
    所述阵列基板还包括色阻层、遮光层和平坦层，所述色阻层和遮光层设置在所述钝化层远离所述半导体层的一侧，所述平坦层设置在所述色阻层和遮光层远离所述钝化层的一侧，所述透明电极层设置在所述平坦层远离所述色阻层和遮光层的一侧；
    所述遮光层由色阻层中的色阻堆叠而成，且所述主支撑柱的正投影与所述遮光层重叠， 所述副支撑柱的正投影与所述色阻层重叠。
  8. 根据权利要求2所述的显示面板，其中，所述第一区域包括依次堆叠的衬底、栅极、栅极绝缘层、半导体层、源漏极、钝化层和透明电极层；所述栅极和源漏极采用双铝或双铜制程。
  9. 根据权利要求2所述的显示面板，其中，所述第一区域包括依次堆叠的衬底、栅极、栅极绝缘层、半导体层、源漏极、钝化层和透明电极层；所述栅极和所述源漏极的膜层厚度为3000-5500埃米。
  10. 根据权利要求2所述的显示面板，其中，所述第二区域设有挖槽，所述第一区域和所述第二区域的地势之差为所述挖槽的深度。
  11. 根据权利要求1所述的显示面板，其中，所述第一基板为阵列基板，所述第二基板为彩膜基板，所述主支撑柱和副支撑柱设置在所述彩膜基板靠近所述阵列基板的一侧，所述彩膜基板中第一区域的膜层数量，大于第二区域的膜层数量。
  12. 根据权利要求1所述的显示面板，其中，所述第一基板为阵列基板，所述第二基板为彩膜基板，所述主支撑柱和副支撑柱设置在所述阵列基板靠近所述彩膜基板的一侧，所述彩膜基板中第一区域的膜层数量，大于第二区域的膜层数量。
  13. 根据权利要求1所述的显示面板，其中，所述第一基板为阵列基板，所述第二基板为彩膜基板，所述主支撑柱和副支撑柱设置在所述彩膜基板上，主支撑柱与所述阵列基板抵接，所述副支撑柱与所述阵列基板之间不抵接，两者之间填充有液晶，形成对应的液晶盒厚；所述彩膜基板中对应所述主支撑柱位置形成第一区域，对应所述副支撑柱位置形成第二区域；所述第一区域的地势，高于所述第二区域的地势；其中，所述第一区域中膜层的数量，大于第二区域中膜层的数量。
  14. 根据权利要求1所述的显示面板，其中，所述第一基板为阵列基板，所述第二基板为彩膜基板，所述主支撑柱和副支撑柱设置在所述阵列基板上，所述主支撑柱与彩膜基板抵接，所述副支撑柱与所述彩膜基板之间不抵接，两者之间填充有液晶，形成对应的液晶盒厚；所述彩膜基板中对应所述主支撑柱位置形成第一区域，对应所述副支撑柱位置形成第二区域；所述第一区域的地势，高于所述第二区域的地势；其中，所述第一区域中膜层的数量，大于第二区域中膜层的数量。
  15. 一种显示面板，包括对向设置的彩膜基板和阵列基板，以及位于彩膜基板和阵列基板之间的主支撑柱和副支撑柱，所述主支撑柱和副支撑柱设置在所述彩膜基板靠近所述阵列基板的一侧，所述阵列基板中第一区域的膜层数量，大于第二区域的膜层数量；
    所述第一区域包括依次堆叠的衬底、栅极、栅极绝缘层、半导体层、源漏极、钝化层和透明电极层；
    所述第二区域包括依次堆叠的衬底、栅极绝缘层、半导体层、源漏极、钝化层和透明电极层；
    所述第一区域和所述第二区域的地势之差为所述栅极的厚度。
  16. 一种显示装置，包括显示面板，以及为所述显示面板提供背光源的背光模组；所述显示面板包括对向设置的第一基板和第二基板，以及位于第一基板和第二基板之间的主支撑柱和副支撑柱，所述第二基板中对应所述主支撑柱位置形成第一区域，对应所述副支撑柱位置形成第二区域，所述第一区域的地势，高于所述第二区域的地势；
    其中，所述第一区域中膜层的数量，大于第二区域中膜层的数量。
  17. 根据权利要求16所述的显示装置，其中，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述主支撑柱和副支撑柱设置在所述阵列基板靠近所述彩膜基板的一侧，所述阵列基板中第一区域的膜层数量，大于第二区域的膜层数量；
    所述第一区域包括依次堆叠的衬底、栅极、栅极绝缘层、半导体层、源漏极、钝化层和透明电极层；
    所述第二区域包括依次堆叠的衬底、栅极、栅极绝缘层、半导体层、钝化层和透明电极层；
    所述第一区域和所述第二区域的地势之差为所述源漏极的厚度。
  18. 根据权利要求16所述的显示装置，其中，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述主支撑柱和副支撑柱设置在所述彩膜基板靠近所述阵列基板的一侧，所述阵列基板中第一区域的膜层数量，大于第二区域的膜层数量；
    所述第一区域包括依次堆叠的衬底、栅极、栅极绝缘层、半导体层、源漏极、钝化层和透明电极层；
    所述第二区域包括依次堆叠的衬底、栅极绝缘层、半导体层、钝化层和透明电极层；所述第一区域和所述第二区域的地势之差，为所述源漏极和所述栅极的厚度之和。
  19. 根据权利要求16所述的显示装置，其中，所述阵列基板包括依次堆叠的衬底、栅极、栅极绝缘层、半导体层、源漏极、钝化层和透明电极层；
    所述阵列基板还包括色阻层、遮光层和平坦层，所述色阻层和遮光层设置在所述钝化层远离所述半导体层的一侧，所述平坦层设置在所述色阻层和遮光层远离所述钝化层的一侧，所述透明电极层设置在所述平坦层远离所述色阻层和遮光层的一侧；
    所述遮光层由色阻层中的色阻堆叠而成，且所述主支撑柱的正投影与所述遮光层重叠，所述副支撑柱的正投影与所述色阻层重叠。
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