WO2022228242A1 - 基站设备、表面清洁系统及烘干处理控制方法 - Google Patents

基站设备、表面清洁系统及烘干处理控制方法 Download PDF

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Publication number
WO2022228242A1
WO2022228242A1 PCT/CN2022/087956 CN2022087956W WO2022228242A1 WO 2022228242 A1 WO2022228242 A1 WO 2022228242A1 CN 2022087956 W CN2022087956 W CN 2022087956W WO 2022228242 A1 WO2022228242 A1 WO 2022228242A1
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WO
WIPO (PCT)
Prior art keywords
drying mechanism
base station
cleaning
base
mechanism according
Prior art date
Application number
PCT/CN2022/087956
Other languages
English (en)
French (fr)
Inventor
曹力
唐成
段飞
Original Assignee
北京顺造科技有限公司
苏州小顺科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN202110456057.2A external-priority patent/CN113243845B/zh
Priority claimed from CN202120880407.3U external-priority patent/CN214712341U/zh
Application filed by 北京顺造科技有限公司, 苏州小顺科技有限公司 filed Critical 北京顺造科技有限公司
Publication of WO2022228242A1 publication Critical patent/WO2022228242A1/zh

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    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00—Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/29—Floor-scrubbing machines characterised by means for taking-up dirty liquid
    • A47L11/30—Floor-scrubbing machines characterised by means for taking-up dirty liquid by suction

Definitions

  • the present disclosure belongs to the field of cleaning technology, and in particular, the present disclosure relates to a base station device with a drying mechanism, a surface cleaning system, and a drying treatment control method.
  • Surface cleaning devices in the prior art can generally be used for humidifying scrubbing to clean hard floors or short-pile carpets. Such cleaning devices usually have one or more brushes or cleaning discs made of woollen material. Stubborn dirt on the floor can be scrubbed by adding water or a water/detergent mixture.
  • the cleaning effect of hot water is remarkably effective. Therefore, cleaning by heating water can be considered.
  • the energy loss can be transferred to the base station. Therefore, a water replenishing base station (base station equipment) is set up, and a water storage tank is set on the base station, and the water in the water storage tank is set to be heated, and the water is heated to a temperature suitable for cleaning stubborn stains and maintained.
  • the surface cleaning device returns to the base station, connects with the water tank of the base station through the water supply connector, realizes automatic water replenishment, and then continues to clean with hot water.
  • the method of spraying hot water on the roller brush for cleaning is not friendly to energy consumption efficiency.
  • the roller brush is generally flocked or fluffy, which has a large surface area, under the condition of low room temperature, a period of time before the hot water is sprayed, due to the preheating of the roller brush and the dissipation of heat, the roller brush is still possible. It is in the state of cold water or warm water. At this time, within a period of time when cleaning starts, the temperature of the hot water of the rolling brush of the cleaning equipment cannot reach the ideal temperature, which affects the cleaning efficiency.
  • the present disclosure provides a base station device with a drying mechanism, a surface cleaning system and a drying process control method, the base station device with a drying mechanism, a surface cleaning system and a drying process of the present disclosure
  • the processing control method is realized by the following technical solutions.
  • a base station device with a drying mechanism including:
  • the base has a cavity structure, and a base air inlet part and a base air outlet part are formed on the base;
  • the drying mechanism is arranged in the cavity structure of the base, the drying mechanism heats the airflow entering through the air inlet of the base, and the heated airflow passes through the base.
  • the output of the air outlet of the base is arranged in the cavity structure of the base, the drying mechanism heats the airflow entering through the air inlet of the base, and the heated airflow passes through the base.
  • a base station device with a drying mechanism the base has a base main casing and a base upper casing, and the base main casing and the base upper casing can be Removably connected.
  • a positioning mechanism is provided on the base, and the positioning mechanism is used for positioning the cleaning device parked on the base.
  • one end of the base is formed with a protruding portion, and the base air outlet portion is provided on the protruding portion.
  • the protruding portion is formed on the base main casing, and a main casing air outlet is formed on the protruding portion, and the protruding portion is formed on the main casing.
  • the main casing air outlet serves as the base air outlet.
  • a base station device with a drying mechanism further includes a tray part, a receiving groove is formed on the base upper casing, and the tray part is provided on the base upper casing Inside the accommodating groove, a cleaning groove is formed on the tray portion.
  • an upper surface of the base has an inclined angle with respect to a horizontal plane, and the upper surface of the base is oriented from a side of the air inlet of the base One side of the air outlet part of the base is inclined downward.
  • the base station device with a drying mechanism further includes an air guide portion, the air guide portion guides the air out of the main casing air outlet portion, and guides the main casing air outlet portion.
  • the air outlet is directed towards the cleaning tank of the tray part.
  • the air guide portion includes a plurality of air guide elements, and an air outlet is formed on the air guide element, and the air outlet of the air guide element faces the air outlet. sink.
  • the air guide part is provided on the base main casing, or the air guide part is integrated with the base main casing form.
  • the air guide part is provided on the tray part, or the air guide part is formed integrally with the tray part.
  • the tray part and the base upper casing are detachably and fixedly connected through a magnetic assembly.
  • the magnetic assembly includes a magnetic part and an iron block, and the magnetic part and the iron block are respectively disposed on the tray part and the base on the upper casing.
  • the positioning mechanism includes a main positioning part and/or an auxiliary positioning part.
  • the drying mechanism has a cavity, the drying mechanism has a drying mechanism air inlet and a drying mechanism air outlet, and the drying mechanism has an air inlet.
  • a fan device and a heating body are arranged in the cavity, and the heating body heats the airflow generated by the fan device, and the heated airflow is output through the air outlet of the drying mechanism.
  • the drying mechanism includes a drying mechanism lower casing and a drying mechanism upper casing, the drying mechanism lower casing and the drying mechanism upper casing The casings together form the cavity structure of the drying mechanism.
  • a base station device with a drying mechanism further includes an airflow dispersing plate, and the airflow dispersing plate disperses the airflow generated by the fan device, so that the heating body disperses the airflow after the dispersion. Fully heat up.
  • the airflow dispersing plate is provided between the fan device and the heating body.
  • the airflow dispersing plate is disposed closer to the fan device.
  • the airflow dispersing plate is a V-shaped plate or a U-shaped plate, and the airflow dispersing plate forms an opening shape, and the opening shape faces the heating body.
  • the fan device is disposed adjacent to the air inlet of the drying mechanism, or is disposed within the air inlet of the drying mechanism.
  • the heating body is fixed in the cavity of the drying mechanism by the heating body fixing part.
  • the drying mechanism further has a water blocking portion, and the water blocking portion is provided in the cavity of the drying mechanism and is provided in the drying mechanism. between the heating body and the air outlet of the drying mechanism of the drying mechanism.
  • the water blocking portion is in the form of a water blocking strip and is disposed parallel to the heating body, and the water blocking portion is disposed on the lower casing of the drying mechanism on the inner wall of the body.
  • a base station device with a drying mechanism, a water storage part or a water storage area is provided on the inner side wall of the lower casing of the drying mechanism, and the water storage part or the water storage area is located in the side of the water blocking part away from the heating body.
  • a water level detection part is provided in the water storage part or the water storage area, and when the water level in the water storage part or the water storage area reaches a preset water level , the water level detection unit generates a trigger signal.
  • the base station device stops supplying power to the drying mechanism based on the trigger signal generated by the water level detection unit.
  • the water level detection part includes a circuit board and at least two electrode parts disposed on the same side of the circuit board, the electrode parts and the water storage part Or the lowest position of the water storage area has a preset spacing.
  • the number of the electrode parts is two and has the same length.
  • the water level detection part is supported within the water storage part or the water storage area by a support part.
  • the base station apparatus with a drying mechanism further includes a liquid storage tank for storing cleaning liquid to provide cleaning liquid to the cleaning apparatus docked at the base station apparatus.
  • the base station apparatus with a drying mechanism further includes a storage box for storing sub-components of the cleaning apparatus.
  • the storage box has a storage box door that can be opened and closed.
  • the storage box has a blowing device capable of blowing air to the inside of the storage box, and an air hole portion of the storage box, so as to cool the inside of the storage box. Drying/ventilation is performed, and the air flow provided by the blowing device is output through the air hole part of the storage box.
  • the air hole portion of the storage box is provided on the top of the storage box.
  • the blowing device is provided inside the storage box.
  • a filter device is provided inside the storage box, and the filter device is used to filter the airflow in the storage box.
  • the base station apparatus with a drying mechanism further includes a support device, the support device is disposed on the base, and the liquid storage tank and the storage box are both disposed on the support on the device.
  • a surface cleaning system comprising:
  • Cleaning equipment which can be dried or preheated by the base station equipment.
  • the base station device further provides cleaning liquid to the cleaning device and/or the base station device further recovers the remaining liquid in the cleaning device.
  • a method for controlling drying processing of cleaning equipment using the base station equipment described in any of the above to perform drying processing on at least one cleaning part of the cleaning equipment, including:
  • the base station device is caused to perform drying processing on the at least one cleaning part of the cleaning device based on the current mode type of the cleaning device.
  • the mode types of the cleaning device include at least a first mode type and a second mode type
  • the first mode type is that the cleaning device is powered on to prepare for cleaning
  • the first mode type is The second mode type is self-cleaning at the end of cleaning equipment.
  • the first mode type includes:
  • the at least one cleaning portion of the cleaning device is driven to rotate at a first speed.
  • the drying mechanism of the base station device is activated to send all the cleaning devices to the cleaning device.
  • the at least one cleaning part provides hot dry air for a first preset duration.
  • the second mode type includes:
  • the at least one cleaning part of the cleaning device is driven to rotate at a second speed, the at least one cleaning part is applied with cleaning liquid, and the at least one cleaning part is applied with suction treatment so that the at least one cleaning part flows through the at least one
  • the cleaning section liquid is drawn into a recovery tank within the cleaning device;
  • step S2004 When the duration of step S2002 reaches the second preset time period, or when the liquid volume in the sewage tank reaches the preset liquid volume, the at least one cleaning part stops being applied with cleaning liquid and the at least one cleaning part stops being applied A suction process is performed, and the at least one cleaning portion is driven to rotate at a third speed, the third speed being lower than the second speed.
  • the drying mechanism when the at least one cleaning part of the cleaning device is driven to rotate at a third speed, the drying mechanism is activated to rotate the cleaning device to the The at least one cleaning section provides hot dry air.
  • FIG. 1 is one of schematic structural diagrams of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 2 is a second schematic structural diagram of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 3 is a third schematic structural diagram of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 4 is one of the schematic structural diagrams of the base of the base station apparatus according to at least one embodiment of the present disclosure.
  • FIG. 5 is one of partial structural schematic diagrams of a base of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 6 is one of partial structural schematic diagrams of a tray part of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 7 is the second schematic diagram of the partial structure of the tray part of the base station device according to at least one embodiment of the present disclosure.
  • FIG. 8 is one of the exploded structural diagrams of the base of the base station apparatus according to at least one embodiment of the present disclosure.
  • FIG. 9 is a schematic diagram of the overall structure of a drying mechanism of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 10 is one of the schematic diagrams of the internal structure of the drying mechanism of the base station device according to at least one embodiment of the present disclosure.
  • FIG. 11 is the second schematic diagram of the internal structure of the drying mechanism of the base station device according to at least one embodiment of the present disclosure.
  • FIG. 12 is a schematic structural diagram of a water level detection part of a drying mechanism of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 13 is a schematic flowchart of a drying process control method of a cleaning device according to an embodiment of the present disclosure.
  • cross-hatching and/or hatching in the drawings is generally used to clarify boundaries between adjacent components. As such, unless stated, the presence or absence of cross-hatching or shading does not convey or represent any particular material, material properties, dimensions, proportions, commonalities between the illustrated components and/or any other characteristics of the components, any preferences or requirements for attributes, properties, etc. Furthermore, in the drawings, the size and relative sizes of components may be exaggerated for clarity and/or descriptive purposes. When example embodiments may be implemented differently, the specific process sequence may be performed in a different order than described. For example, two consecutively described processes may be performed substantially concurrently or in the reverse order of that described. In addition, the same reference numerals denote the same components.
  • connection When an element is referred to as being “on” or “over”, “connected to” or “coupled to” another element, the element can be directly on, directly connected to, the other element Either directly coupled to the other component, or intermediate components may be present. However, when an element is referred to as being “directly on,” “directly connected to,” or “directly coupled to” another element, there are no intervening elements present. To this end, the term “connected” may refer to a physical connection, electrical connection, etc., with or without intervening components.
  • the present disclosure may use terms such as “under”, “under”, “under”, “under”, “above”, “on”, “at” Spatially relative terms such as “on”, “upper” and “side (eg, in “sidewall”)”, etc., to describe the relationship between one element and another (other) element as shown in the figures relation.
  • spatially relative terms are intended to encompass different orientations of the device in use, operation, and/or manufacture. For example, if the device in the figures is turned over, elements described as “below” or “beneath” other elements or features would then be oriented “above” the other elements or features.
  • the exemplary term “under” can encompass both an orientation of "above” and “below.”
  • the device may be otherwise oriented (eg, rotated 90 degrees or at other orientations) and, as such, the spatially relative descriptors used herein should be interpreted accordingly.
  • FIG. 1 is one of schematic structural diagrams of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 2 is a second schematic structural diagram of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 3 is a third schematic structural diagram of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 4 is one of the schematic structural diagrams of the base of the base station apparatus according to at least one embodiment of the present disclosure.
  • FIG. 5 is one of partial structural schematic diagrams of a base of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 6 is one of partial structural schematic diagrams of a tray part of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 1 is one of schematic structural diagrams of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 2 is a second schematic structural diagram of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 3 is a third schematic
  • FIG. 7 is the second schematic diagram of the partial structure of the tray part of the base station device according to at least one embodiment of the present disclosure.
  • FIG. 8 is one of the exploded structural diagrams of the base of the base station apparatus according to at least one embodiment of the present disclosure.
  • FIG. 9 is a schematic diagram of the overall structure of a drying mechanism of a base station device according to at least one embodiment of the present disclosure.
  • FIG. 10 is one of the schematic diagrams of the internal structure of the drying mechanism of the base station device according to at least one embodiment of the present disclosure.
  • FIG. 11 is the second schematic diagram of the internal structure of the drying mechanism of the base station device according to at least one embodiment of the present disclosure.
  • FIG. 12 is a schematic structural diagram of a water level detection part of a drying mechanism of a base station device according to at least one embodiment of the present disclosure.
  • the base station device with the drying structure of the present disclosure will be described in detail below with reference to FIGS. 1 to 12 .
  • the base station device 100 with a drying mechanism includes:
  • the base 101 has a cavity structure, and the base air inlet 1013 and the base air outlet are formed on the base 101; and,
  • the drying mechanism 109 is arranged in the cavity structure of the base 101.
  • the drying mechanism 109 heats the airflow entering through the base air inlet 1013, and sends the heated airflow out through the base. Department output.
  • the heated airflow output through the air outlet of the base can dry the cleaning part of the cleaning device parked on the base 101 , and the cleaning part of the cleaning device may be a roller brush or the like.
  • the base 101 has a base main casing 1011 and a base upper casing 1012, and the base main casing 1011 and the base upper casing 1012 are detachable connect.
  • the base 101 is provided with a positioning mechanism, and the positioning mechanism is used to position the cleaning equipment parked on the base 101 .
  • FIG. 1 shows the raised portion of an embodiment of the present disclosure.
  • the approximate shape of 1014 can be adjusted by those skilled in the art.
  • the protruding portion 1014 is formed on the base main casing 1011, and the main casing air outlet 1015 is formed on the protruding portion 1014, and the main casing outlet portion 1015 is formed.
  • the air part 1015 serves as the base air outlet.
  • the air outlet portion 1015 of the main casing is basically disposed toward the cleaning device resting on the base 101 .
  • the base station equipment with the drying mechanism in the above-mentioned various embodiments preferably further includes a tray part 102, a receiving groove is formed on the upper casing 1012 of the base, and the tray part 102 is disposed in the receiving groove of the upper casing 1012 on the base Inside the tank, a cleaning tank 112 is formed on the tray portion 102 .
  • the tray portion 102 may be or be regarded as a part of the base 101 .
  • the tray part 102 is detachably disposed in the receiving groove of the casing 1012 on the base.
  • the cleaning device By setting the cleaning groove 112 on the tray part 102, when the cleaning device is docked to the base station device 100, the cleaning device
  • the cleaning portion (eg, roller brush) of the cleaning tank 112 may be at least partially placed in the washing tank 112 for draining.
  • the upper surface of the base 101 has an inclined angle with respect to the horizontal plane, and the upper surface of the base 101 exits from the base air inlet 1013 side toward the base The side of the wind section slopes downward.
  • the upper surface of the base 101 may be composed of a part of the upper surface of the base upper casing 1012 of the base 101 and a part of the upper surface of the tray part 102 , such as the structure of the base 101 shown in FIG. 4 .
  • the upper surface of the base 101 may also be constituted by the upper surface of the tray portion 102 , for example, the structure of the base 101 shown in FIG. 8 .
  • the inclination of the upper surface of the base 101 can be achieved by the inclination of the bearing portion 1021 of the tray portion 102 , for example, the bearing portion can be achieved when the tray portion 102 is installed (non-horizontally) on the base 101 .
  • the upper surface of 1021 is inclined relative to the horizontal plane, that is, when the tray part 102 is placed on the horizontal plane, the upper surface of the carrying part 1021 is not inclined relative to the horizontal plane, and when the tray part 102 is installed on the base 101, the carrying part
  • the upper surface of 1021 is inclined with respect to the horizontal plane, thereby realizing the inclination of the upper surface of the base 101 .
  • the carrying portion 1021 of the tray portion 102 includes an inclined surface.
  • the tray portion 102 is horizontally installed on the base 101 The inclination of the upper surface of the base 101 described above is realized by the inclined surface.
  • the water dripped on the tray part 102 flows toward the raised part 1014 , according to certain embodiments of the present disclosure
  • the water dripping on the tray portion 102 can flow to the cleaning tank 112 of the tray portion 102 .
  • the base upper housing 1012 also has an inclination angle.
  • the base station equipment with the drying mechanism in the above-mentioned various embodiments preferably further includes an air guide portion 113, and the air guide portion 113 guides the air out of the main casing air outlet 1015, and guides the main casing air outlet 1015 The air outlet is directed toward the cleaning tank 112 of the tray part 102 .
  • the drying/drying efficiency of the cleaning portion of the cleaning device can be improved.
  • the air guide portion 113 may be a housing structure, which is preferably detachably connected to the protruding portion 1014 of the base main housing 1011 , and the air guide portion 113 may also be integrally formed with the base main housing 1011 .
  • the air guide portion 113 includes a plurality of air guide elements 1131 , and an air outlet is formed on the air guide element 1131 , and the air outlet of the air guide element 1131 faces the cleaning tank 112 .
  • the plurality of air guiding elements 1131 may be in the form of air guiding sleeves or air guiding pipes, and the air outflowing through the air outlet portion 1015 of the main casing is guided by the plurality of air guiding elements 1131, so that the main casing is ventilated.
  • the outlet air of the part 1015 is directed toward the cleaning tank 112 of the tray part 102 .
  • the air guide portion 113 is provided on the base main casing 1011 , or the air guide portion 113 is formed integrally with the base main casing 1011 .
  • the air guide portion 113 is provided on the tray portion 102 , or the air guide portion 113 is formed integrally with the tray portion 102 .
  • the tray portion 102 and the base upper casing 1012 are detachably and fixedly connected through a magnetic assembly.
  • the air guide element 1131 described above forms an air outlet generally facing downward, and the air flow through the air outlet can be guided to the cleaning tub 112 through a smooth transition between the air outlet and the cleaning tub 112 .
  • a first shutter 11311 is formed on the air guide element 1131, and the first shutter 11311 defines the air outlet as an air outlet that faces downward. When cleaning, it prevents water droplets from splashing into the air outlet.
  • each air guide element 1131 may have two air outlets, or may have three air outlets, and each air outlet is formed with a first shutter 11311. Those skilled in the art can The number of air outlets of the air element 1131 is adjusted.
  • FIGS. 6 and 7 show the air guiding portion 113 of another structure.
  • the air guiding portion 113 is integrally provided with an air guiding plate 1133.
  • An air outlet is formed under the air deflector 1133, and the air deflector 1133 can make the air outlet face the direction of the cleaning tank 112 or the rolling brush, so that the air flow can be guided to the cleaning tank 112 or the rolling brush, and flow through the cleaning tank 112 or the rolling brush.
  • the air guide portion 113 has an adjustment portion 1135, and the relative position (rotation position) of the air guide plate 1133 can be adjusted through the adjustment portion 1135, so that the airflow direction of the air outlet can be adjusted. adjust.
  • a blocking portion 1134 is provided at a position close to the air outlet, so that the roller brush prevents water from flowing into the air outlet during self-cleaning or drying, causing potential safety hazards.
  • the wind deflector 1133 in each of the above-mentioned embodiments may be a long strip-shaped plate, or a long strip-shaped plate with an arc, and those skilled in the art can appropriately adjust the structure of the wind deflector 1133 .
  • the blocking portion 1134 in each of the above-mentioned embodiments can also be a long plate, which has a length matching the wind deflector 1133 .
  • the tray part 102 is detachably and fixedly connected with the upper case 1012 of the base through the magnetic assembly, so that the tray part 102 can be easily disassembled and installed with the upper case 1012 of the base.
  • the magnetic assembly includes a magnetic part 114 and an iron block 115 , and the magnetic part 114 and the iron block 115 are respectively arranged on the tray part 102 and the upper casing 1012 on the base .
  • the number of the magnetic parts 114 can be one or more than two, and the number of the iron blocks 115 can be one or more than two.
  • it can be embedded in the tray part 102
  • the iron block 115 can be embedded in the upper case 1012 of the base, for example, or alternatively, the magnetic part 114 can be installed in the upper case 1012 of the base, and the iron block 115 can be installed in the tray part 102 , those skilled in the art can adjust the shape and quantity of the magnetic part 114 and the iron block 115 .
  • the positioning mechanism includes a main positioning part 1081 and/or an auxiliary positioning part 1082 .
  • the main positioning portion 1081 can be used to position the main scroll wheel of the cleaning device, and the auxiliary positioning portion 1082 can be used to position the auxiliary scroll wheel of the cleaning device.
  • the number of the main positioning portion 1081 and the auxiliary positioning portion 1082 And the shape can be adjusted to suit the cleaning equipment matched with the base station equipment 100 , and the positioning mechanism can also include only the main positioning part 1081 or only the auxiliary positioning part 1082 .
  • the drying mechanism 109 has a cavity
  • the drying mechanism 109 has the drying mechanism air inlet and the drying mechanism air outlet 1093
  • the cavity of the drying mechanism 109 A fan device 1094 and a heating body 1096 are arranged in the fan device. The heating body 1096 heats the airflow generated by the fan device 1094, and the heated airflow is output through the air outlet 1093 of the drying mechanism.
  • the number of the fan device 1094 may be one or more than two, and two fan devices 1094 are shown in FIG. 11 .
  • the fan device 1094 is also covered with a buffer layer or a buffer pad.
  • the buffer layer Or the buffer pad can be in the form of a fan cover to buffer the vibration of the fan device 1094 during the working process;
  • the heating body 1096 can have a suitable shape, and the shape and size of the heating body 1096 are not particularly limited in this disclosure, preferably, the heating body 1096 1096 is elongated or cylindrical.
  • the drying mechanism 109 includes a drying mechanism lower casing 1091 and a drying mechanism upper casing 1092, and a drying mechanism lower casing 1091 and a drying mechanism upper casing 1091.
  • the casings 1092 together form the cavity structure of the drying mechanism 109 .
  • the drying mechanism 109 further includes an airflow dispersing plate 1095, and the airflow dispersing plate 1095 disperses the airflow generated by the fan device 1094, so that the heating body 1096 can disperse the dispersed air.
  • the airflow is fully heated.
  • the airflow dispersing plate 1095 is provided between the fan device 1094 and the heating body 1096 .
  • the airflow dispersing plate 1095 is positioned closer to the fan device 1095 .
  • the airflow dispersing plate 1095 is a V-shaped plate or a U-shaped plate, and the airflow dispersing plate 1095 forms an opening shape, and the opening shape faces the heating body 1096 .
  • the fan device 1094 is disposed adjacent to the air inlet of the drying mechanism, or is disposed within the air inlet of the drying mechanism.
  • the heating body 1096 is fixed in the cavity of the drying mechanism 109 through the heating body fixing portion 1097 .
  • the drying mechanism 109 further has a water blocking part 1099, and the water blocking part 1099 is arranged in the cavity of the drying mechanism 109 and is arranged on the heating body 1096 between the air outlet 1093 of the drying mechanism of the drying mechanism 109 .
  • the water blocking portion 1099 is in the form of a water blocking strip, which is arranged parallel to the heating body 1096, and the water blocking portion 1099 is arranged on the inner side wall of the lower casing 1091 of the drying mechanism. superior.
  • a water storage part or a water storage area is provided on the inner side wall of the lower casing 1091 of the drying mechanism, and the water storage part or the water storage area is located in the water blocking part 1099 the side away from the heating body 1096.
  • a water blocking part 1099 is provided between the water storage part or the water storage area and the heating body 1096 .
  • a water level detection part 1098 is provided in the water storage part or the water storage area.
  • the water level The detection unit 1098 generates a trigger signal.
  • the cleaning device when the cleaning device is docked on the base 101 of the base station device, since the cleaning part (eg, roller brush) of the cleaning device may be in a state of dripping water, the dripping water may pass through the base air outlet of the base 101 and the drying mechanism of the drying mechanism 109.
  • the air outlet 1093 of the drying mechanism enters the cavity of the drying mechanism 109. If a lot of water enters, the electrical components or other components in the cavity of the drying mechanism 109 will be damaged.
  • the water level detection unit 1098 The water level in the water storage part or the water storage area can be detected. When the water level reaches a preset alarm water level or warning water level, the water level detection part 1098 generates a trigger signal to remind, for example, a light signal or an acoustic signal to remind.
  • the base station equipment stops supplying power to the drying mechanism based on the trigger signal generated by the water level detection unit 1098 .
  • the water level detection part 1098 includes a circuit board 10982 and at least two electrode parts 10981 arranged on the same side of the circuit board 10982.
  • the electrode parts 10981 and the water storage part or The lowest position of the water storage area has a preset spacing.
  • the preset distance corresponds to the warning water level.
  • the number of electrode parts 10981 is two and has the same length.
  • the water level detection part 1098 is supported in the water storage part or the water storage area through the support part 1090 .
  • the support portion 1090 may be in the form of a support column or a support frame.
  • the base station equipment with the drying mechanism in the above-mentioned various embodiments preferably further includes a liquid storage tank 105 for storing cleaning liquid to provide cleaning liquid to the cleaning equipment parked at the base station equipment.
  • the storage box 103 is further included, and the storage box 103 is used for storing the sub-components of the cleaning equipment.
  • one or more holding structures may be provided in the storage box 103 for holding the cleaning brush 201, the rolling brush 202, and the like.
  • the storage box 103 has a storage box door 1032, and the storage box door 1032 can be opened and closed.
  • the storage box 103 has a blowing device 1033 and an air hole portion 1031 of the storage box. Drying/ventilation is performed, and the airflow provided by the blower 1033 is output through the air hole portion 1031 of the storage box.
  • the air hole portion 1031 of the storage box is provided on the top of the storage box 103 .
  • the air hole portion 1031 of the storage box may be a porous structure
  • FIG. 2 exemplarily shows the porous form of the air hole portion 1031 of the storage box.
  • the blowing device 1033 is provided in the storage box 103 .
  • a filter device 1034 is provided inside the storage box 103 , and the filter device 1034 is used to filter the air flow in the storage box 103 .
  • the filter device 1034 can be Hypa.
  • the cleaning device can be placed on the base 101, the drying mechanism 109 can be activated, and the cleaning device can be cleaned through the base air outlet of the base 101 before the cleaning device is working.
  • the above-described tray part 102 can also be disassembled, and the cleaning part of the cleaning device can be directly placed on the base upper casing 1012 of the base 101 for preheating.
  • the cleaning equipment can be placed on the base 101 , the drying mechanism 109 can be activated, and the air outlet of the base 101 can affect the cleaning equipment.
  • the cleaning section is dried.
  • the base station equipment with the drying mechanism in the above-mentioned various embodiments preferably further includes a support device 106 , which is arranged on the base 101 , and both the liquid storage tank 105 and the storage box 103 are arranged on the support device 106 .
  • the support device 106 may be in the form of a support frame or a support shell.
  • both the storage box 103 and the liquid storage tank 105 are cylindrical structures, and those skilled in the art can also adjust the shapes of the storage box 103 and the liquid storage tank 105 .
  • the top of the liquid storage tank 105 may be provided with a liquid storage tank filling part 1051, and the liquid storage tank filling part 1051 may be in the form of a liquid filling cover and a liquid filling port.
  • the liquid storage tank 105 may also be provided with a handle portion, and the liquid storage tank 105 and the support device 106 are detachably connected.
  • the base station device 100 with a drying mechanism further has a connector part 104, the connector part 104 includes a charging/communication connector and a liquid connector, and the base station device 100 with a drying mechanism also has a connector partition 1041, and the connector partition 1041 will charge / Communication connections and fluid connections are separated.
  • the base station device 100 with the drying mechanism can charge the cleaning device, and perform data interaction or signal interaction with the cleaning device.
  • the base station device 100 with the drying mechanism can add liquid to the cleaning device, or recover the remaining liquid of the cleaning device.
  • the base station equipment 100 with the drying mechanism also has a bidirectional pump device 111, a first pipeline, a second pipeline and a heating device 110.
  • the bidirectional pump device 111 is connected to the first part of the liquid storage tank 105 and the first pipeline.
  • the second end of the first pipeline is connected to the heating device 110, the heating device 110 is connected between the second end of the first pipeline and the first end of the second pipeline, and the second end of the second pipeline is connected to the heating device 110.
  • the end is connected with the above-mentioned liquid joint, so that the liquid in the liquid storage tank 105 is supplied to the cleaning equipment through the bidirectional pump device 111, the first pipeline, the heating device 110, the second pipeline, and the liquid joint in sequence.
  • the base station device 100 with the drying mechanism further includes a control device 107 , which may be in the form of a control chip or a control circuit board, which may be disposed on or in the support device 106 .
  • the control device 107 controls and/or supplies power to the fan device 1094 , the heating body 1096 , the water level detector 1098 , the heating device 110 , the blower device 1033 and the like of the drying mechanism 109 .
  • the base station apparatus 100 with a drying mechanism of any one of the embodiments of the appeal.
  • the cleaning device can be dried or preheated by the base station device 100 having a drying mechanism.
  • the base station device 100 with the drying mechanism also provides the cleaning device with cleaning liquid and/or the base station device also recovers the remaining liquid in the cleaning device.
  • FIG. 13 is a schematic flowchart of a drying process control method of a cleaning device according to an embodiment of the present disclosure.
  • the drying process control method S100 of the cleaning equipment includes:
  • the mode types of the cleaning device include at least a first mode type and a second mode type.
  • the first mode type is that the cleaning device is powered on to prepare for cleaning
  • the second mode type is that the cleaning device performs self-cleaning after cleaning.
  • the first mode type includes:
  • At least one cleaning portion of the cleaning device is driven to rotate at a first speed.
  • the drying mechanism of the base station device is activated to provide hot dry air of a first preset duration to at least one cleaning part of the cleaning device.
  • the cleaning device is placed on the base before the cleaning work, and the drying mechanism can provide hot dry air to the cleaning portion by rotating the cleaning portion at a low speed to uniformly preheat it.
  • the cleaning part may be driven by a driving device in the cleaning device so that the cleaning part rotates at a first speed for a first preset duration.
  • the cleaning device when the cleaning device is placed on the base, the cleaning device is connected to the base station device in communication, the base station device acquires the mode type of the cleaning device, and the base station device dries the cleaning device accordingly based on the mode type of the cleaning device deal with.
  • the second mode type includes:
  • At least one cleaning part of the cleaning device is driven to rotate at a second speed, at least one cleaning part is applied with cleaning liquid, and at least one cleaning part is applied with suction treatment, so that the liquid flowing through the at least one cleaning part is sucked into cleaning the recovery tank within the equipment;
  • step S2004 When the duration of step S2002 reaches the second preset time length, or, when the liquid volume in the sewage tank reaches the preset liquid volume, at least one cleaning part stops being applied with cleaning liquid and at least one cleaning part stops being applied with suction treatment, And at least one cleaning part is driven to rotate at a third speed, and the third speed is lower than the second speed.
  • the drying mechanism when at least one cleaning part of the cleaning device is driven to rotate at the third speed, the drying mechanism is activated to provide hot dry air to the at least one cleaning part of the cleaning device.
  • the duration of the cleaning portion rotating at the third speed and the duration of the drying mechanism providing the hot dry air may be set to be the same, for example, both are the third preset duration.
  • the cleaning device can be placed on the base 101 , the drying mechanism 109 can be activated, and the cleaning part of the cleaning device can be cleaned by the base air outlet of the base 101 .
  • the tray part 102 described above can also be disassembled, and the cleaning part of the cleaning device can be directly placed on the base upper casing 1012 of the base 101 for preheating.
  • the cleaning equipment can be placed on the base 101 , the drying mechanism 109 can be activated, and the cleaning equipment can be sent to the cleaning equipment through the base air outlet of the base 101 . the cleaning section for drying.
  • first and second are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implying the number of indicated technical features. Thus, a feature delimited with “first”, “second” may expressly or implicitly include at least one of that feature.
  • plurality means at least two, such as two, three, etc., unless expressly and specifically defined otherwise.

Landscapes

  • Drying Of Solid Materials (AREA)

Abstract

一种具有烘干机构（109）的基站设备（100），包括：基座（101），基座（101）具有腔体结构，基座（101）上形成有基座进气部（1013）及基座出风部；以及，烘干机构（109），烘干机构（109）设置在基座（101）的腔体结构之内，烘干机构（109）对经由基座进气部（1013）进入的气流进行加热，并将加热后的气流经由基座出风部输出。一种表面清洁系统以及清洁设备的烘干处理控制方法。

Description

基站设备、表面清洁系统及烘干处理控制方法 技术领域
本公开属于清洁技术领域，本公开尤其涉及一种具有烘干机构的基站设备、表面清洁系统及烘干处理控制方法。
背景技术
现有技术中的表面清洁装置通常可以用于加湿擦洗清洁硬地板或短毛地毯。这种清洁装置通常具有一个或多个由毛织材料制成的滚刷或清洁盘。可以通过添加水或水/清洁剂混合物来擦洗地板上的顽固污垢。
当清洁设备在污垢上移动时，已经被滚刷擦掉并被水或水/洗涤剂混合物溶解的污垢通过沿滚刷运动方向排列的清洁头吸起，在设置清洁盘的技术中，可以不设置清洁头，污垢直接被清洁盘上的清洁材料吸附。
热水的清洁效果是显著有效的。因此，可以考虑通过加热水的方式进行清洁。但考虑到续航以及续水的问题，为了减少表面清洁装置自身的能量损耗，可以将该能量损耗转移到基站。因此，设置补水基站(基站设备)，并且基站上设置蓄水箱，并且设置对该蓄水箱内的水进行加热，将水加热至适合清理顽固污渍的温度并保持。
表面清洁装置回到基站，通过加水接头与基站水箱对接，实现自动补水，然后继续用热水清扫。
但是在室内温度较低的条件下，热水喷洒到滚刷上清扫的方式，对能量消耗效率来说是不友好的。因为滚刷一般为植毛或绒毛，其具有很大的表面积，在室温较低的情况下，热水喷洒的前一段时间，由于对滚刷的预热和热量的耗散，滚刷仍然有可能是凉水或温水附着状态，此时，在清洁开始的一段时间内，清洁设备的滚刷热水温度始终不能达到理想温度，影响清洁效率。
另外一种情形是，在清洁动作完毕，滚刷自清洁之后，滚刷上和基站托盘上仍然会残留水分，为细菌的附着和滋生创造了条件。因此，清洁工作结束后，需要将滚刷上的水分和托盘上的水分去除。
发明内容
为了解决上述技术问题中的至少一个，本公开提供一种具有烘干机构的基站设备、表面清洁系统及烘干处理控制方法，本公开的具有烘干机构的基站设备、表面清洁系统及烘干处理控制方法通过以下技术方案实现。
根据本公开的一个方面，提供一种具有烘干机构的基站设备，包括：
基座，所述基座具有腔体结构，所述基座上形成有基座进气部及基座出风部；以及，
烘干机构，所述烘干机构设置在所述基座的腔体结构之内，所述烘干机构对经由所述基座进气部进入的气流进行加热，并将加热后的气流经由所述基座出风部输出。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述基座具有基座主壳体及基座上壳体，所述基座主壳体与所述基座上壳体可拆卸地连接。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述基座上设置有定位机构，所述定位机构用于对停靠在基座上的清洁设备进行定位。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述基座的一端形成有凸起部，所述基座出风部设置在所述凸起部上。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述凸起部形成在所述基座主壳体上，且所述凸起部上形成主壳体出风部，所述主壳体出风部作为所述基座出风部。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，还包括托盘部，所述基座上壳体上形成有容纳凹槽，所述托盘部设置在所述基座上壳体的所述容纳凹槽之内，所述托盘部上形成有清洗槽。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，相对于水平面，所述基座的上表面具有倾斜角度，所述基座的上表面由所述基座进气部一侧向所述基座出风部一侧向下倾斜。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，还包括导风部，所述导风部对所述主壳体出风部的出风进行导向，将主壳体出风部的出风导向为朝向 所述托盘部的清洗槽。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述导风部包括多个导风元件，所述导风元件上形成出风口，所述导风元件的出风口朝向所述清洗槽。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述导风部设置在所述基座主壳体上，或者，所述导风部与所述基座主壳体一体地形成。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述导风部设置在托盘部上，或者，所述导风部与所述托盘部一体地形成。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述托盘部与所述基座上壳体通过磁性组件可拆卸地固定连接。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述磁性组件包括磁性部及铁块，所述磁性部及所述铁块分别设置在所述托盘部上和所述基座上壳体上。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述定位机构包括主定位部和/或辅助定位部。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述烘干机构具有腔体，所述烘干机构具有烘干机构进风口以及烘干机构出风口，所述烘干机构的腔体中设置有风机装置及加热体，所述加热体对风机装置产生的气流进行加热，加热后的气流经由所述烘干机构出风口输出。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述烘干机构包括烘干机构下壳体以及烘干机构上壳体，所述烘干机构下壳体以及烘干机构上壳体共同形成烘干机构的所述腔体结构。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述烘干机构还包括气流分散板，所述气流分散板对风机装置产生的气流进行分散，使得加热体对分散后的气流进行充分加热。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述气流分散板设置在所述风机装置与加热体之间。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述气流分散板更临近风机装置设置。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述气流分散板为V形板，或者U形板，所述气流分散板形成开口形状，且所述开口形状朝向所述加热体。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述风机装置临近所述烘干机构进风口设置，或者设置在所述烘干机构进风口之内。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述加热体通过加热体固定部固定在所述烘干机构的腔体之内。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述烘干机构还具有挡水部，所述挡水部设置在所述烘干机构的腔体之内，且设置在所述加热体与所述烘干机构的烘干机构出风口之间。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述挡水部为挡水条形式，平行于所述加热体设置，所述挡水部设置在所述烘干机构下壳体的内侧壁上。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述烘干机构下壳体的内侧壁上设置有存水部或存水区，所述存水部或存水区位于所述挡水部的远离所述加热体的一侧。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述存水部或存水区内设置有水位检测部，当所述存水部或存水区内的水位到达预设水位时，所述水位检测部生成触发信号。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，基站设备基于所述水位检测部生成的触发信号停止对烘干机构进行供电。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述水位检测部包括电路板以及设置在所述电路板的同一侧的至少两根电极部，电极部与所述存水部或存水区的最低位置具有预设间距。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述电极部的数量为两个，且具有相同长度。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述水位检测部通过支撑部被支撑在所述存水部或存水区之内。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，还包括储液箱， 所述储液箱用于存储清洁用液体，以向停靠在基站设备的清洁设备提供清洁用液体。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，还包括收纳箱，所述收纳箱用于收纳清洁设备的子部件。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述收纳箱具有收纳箱门，所述收纳箱门能够被打开及关闭。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述收纳箱具有吹风装置以及收纳箱气孔部，所述吹风装置能够向所述收纳箱的内部进行吹风以对收纳箱的内部进行干燥/换气，吹风装置提供的气流经由收纳箱气孔部输出。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述收纳箱气孔部设置在收纳箱的顶部。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述吹风装置设置在所述收纳箱之内。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，所述收纳箱的内部设置有过滤装置，所述过滤装置用于对所述收纳箱之内的气流进行过滤。
根据本公开的至少一个实施方式的具有烘干机构的基站设备，还包括支撑装置，所述支撑装置设置在所述基座上，所述储液箱以及所述收纳箱均设置在所述支撑装置上。
根据本公开的另一个方面，提供一种表面清洁系统，包括：
上述任一项的基站设备；以及，
清洁设备，所述清洁设备能够被所述基站设备进行干燥处理或预热处理。
根据本公开的至少一个实施方式的表面清洁系统，所述基站设备还对所述清洁设备提供清洁用液体和/或所述基站设备还对所述清洁设备中的余量液体进行回收。
根据本公开的又一个方面，提供一种清洁设备的烘干处理控制方法，使用上述任一项所述的基站设备对清洁设备的至少一个清洁部进行烘干处理，包括：
确定清洁设备的当前的模式类型；以及，
使得所述基站设备基于所述清洁设备的当前的模式类型对所述清洁设备的所述至少一个清洁部进行烘干处理。
根据本公开的至少一个实施方式的烘干处理控制方法，所述清洁设备的模式类型至少包括第一模式类型以及第二模式类型，所述第一模式类型为清洁设备开机准备清洁，所述第二模式类型为清洁设备清洁结束进行自清洁。
根据本公开的至少一个实施方式的烘干处理控制方法，所述第一模式类型包括：
所述清洁设备的所述至少一个清洁部被驱动以第一速度进行旋转。
根据本公开的至少一个实施方式的烘干处理控制方法，当所述清洁设备的当前的模式类型为第一模式类型时，所述基站设备的烘干机构被启动以向所述清洁设备的所述至少一个清洁部提供第一预设时长的热干风。
根据本公开的至少一个实施方式的烘干处理控制方法，所述第二模式类型包括：
S2002、清洁设备的所述至少一个清洁部被驱动以第二速度进行旋转，所述至少一个清洁部被施加清洁液体，所述至少一个清洁部被施加抽吸处理以使得流经所述至少一个清洁部的液体被抽吸入所述清洁设备之内的污水箱；以及，
S2004、当步骤S2002持续时间达到第二预设时长，或者，当污水箱内的液量达到预设液量，所述至少一个清洁部停止被施加清洁液体以及所述至少一个清洁部停止被施加抽吸处理，且所述至少一个清洁部被驱动以第三速度进行旋转，所述第三速度低于所述第二速度。
根据本公开的至少一个实施方式的烘干处理控制方法，当所述清洁设备的所述至少一个清洁部被驱动以第三速度旋转时，所述烘干机构被启动以向所述清洁设备的所述至少一个清洁部提供热干风。
附图说明
附图示出了本公开的示例性实施方式，并与其说明一起用于解释本公开的原理，其中包括了这些附图以提供对本公开的进一步理解，并且附图包括在本说明书中并构成本说明书的一部分。
图1是本公开的至少一个实施方式的基站设备的结构示意图之一。
图2是本公开的至少一个实施方式的基站设备的结构示意图之二。
图3是本公开的至少一个实施方式的基站设备的结构示意图之三。
图4是本公开的至少一个实施方式的基站设备的基座的结构示意图之一。
图5是本公开的至少一个实施方式的基站设备的基座的局部结构示意图之一。
图6是本公开的至少一个实施方式的基站设备的托盘部的局部结构示意图之一。
图7是本公开的至少一个实施方式的基站设备的托盘部的局部结构示意图之二。
图8是本公开的至少一个实施方式的基站设备的基座的分解结构示意图之一。
图9是本公开的至少一个实施方式的基站设备的烘干机构的整体结构示意图。
图10是本公开的至少一个实施方式的基站设备的烘干机构的内部结构示意图之一。
图11是本公开的至少一个实施方式的基站设备的烘干机构的内部结构示意图之二。
图12是本公开的至少一个实施方式的基站设备的烘干机构的水位检测部的结构示意图。
图13是本公开的一个实施方式的清洁设备的烘干处理控制方法的流程示意图。
具体实施方式
下面结合附图和实施方式对本公开作进一步的详细说明。可以理解的是，此处所描述的具体实施方式仅用于解释相关内容，而非对本公开的限定。另外还需要说明的是，为了便于描述，附图中仅示出了与本公开相关的部分。
需要说明的是，在不冲突的情况下，本公开中的实施方式及实施方式中的特征可以相互组合。下面将参考附图并结合实施方式来详细说明本公开的技术方案。
除非另有说明，否则示出的示例性实施方式/实施例将被理解为提供可以在实践中实施本公开的技术构思的一些方式的各种细节的示例性特征。因此，除非另有说明，否则在不脱离本公开的技术构思的情况下，各种实施方式/实施例的特征可以另外地组合、分离、互换和/或重新布置。
在附图中使用交叉影线和/或阴影通常用于使相邻部件之间的边界变得清晰。如此，除非说明，否则交叉影线或阴影的存在与否均不传达或表示对部件的具体材料、材料性质、尺寸、比例、示出的部件之间的共性和/或部件的任何其它特性、属性、性质等的任何偏好或者要求。此外，在附图中，为了清楚和/或描述性的目的，可以夸大部件的尺寸和相对尺寸。当可以不同地实施示例性实施例时，可以以不同于所描述的顺序来执行具体的工艺顺序。例如，可以基本同时执行或者以与所描述的顺序相反的顺序执行两个连续描述的工艺。此外，同样的附图标记表示同样的部件。
当一个部件被称作“在”另一部件“上”或“之上”、“连接到”或“结合到”另一部件时，该部件可以直接在所述另一部件上、直接连接到或直接结合到所述另一部件，或者可以存在中间部件。然而，当部件被称作“直接在”另一部件“上”、“直接连接到”或“直接结合到”另一部件时，不存在中间部件。为此，术语“连接”可以指物理连接、电气连接等，并且具有或不具有中间部件。
为了描述性目的，本公开可使用诸如“在……之下”、“在……下方”、“在……下”、“下”、“在……上方”、“上”、“在……之上”、“较高的”和“侧(例如，在“侧壁”中)”等的空间相对术语，从而来描述如附图中示出的一个部件与另一(其它)部件的关系。除了附图中描绘的方位之外，空间相对术语还意图包含设备在使用、操作和/或制造中的不同方位。例如，如果附图中的设备被翻转，则被描述为“在”其它部件或特征“下方”或“之下”的部件将随后被定位为“在”所述其它部件或特征“上方”。因此，示例性术语“在……下方”可以包含“上方”和“下方”两种方位。此外，设备可被另外定位(例如，旋转90度或者在其它方位处)，如此，相应地解释这里使用的空间相对描述语。
这里使用的术语是为了描述具体实施例的目的，而不意图是限制性的。如这里所使用的，除非上下文另外清楚地指出，否则单数形式“一个(种、者)”和“所述(该)”也意图包括复数形式。此外，当在本说明书中使用术语“包含”和/或“包括”以及它们的变型时，说明存在所陈述的特征、整体、步骤、操作、部件、组件和/或它们的组，但不排除存在或附加一个或更多个其它特征、整体、步骤、操作、部件、组件和/或它们的组。还要注意的是，如这里使用的，术语“基本上”、“大约”和其它类似的术语被用作近似术语而不用作程度术语，如此，它们被用来解释本领域普通技术人员将认识到的测量值、计算值和/或提供的值的固有偏差。
图1是本公开的至少一个实施方式的基站设备的结构示意图之一。图2是本公开的至少一个实施方式的基站设备的结构示意图之二。图3是本公开的至少一个实施方式的基站设备的结构示意图之三。图4是本公开的至少一个实施方式的基站设备的基座的结构示意图之一。图5是本公开的至少一个实施方式的基站设备的基座的局部结构示意图之一。图6是本公开的至少一个实施方式的基站设备的托盘部的局部结构示意图之一。图7是本公开的至少一个实施方式的基站设备的托盘部的局部结构示意图之二。图8是本公开的至少一个实施方式的基站设备的基座的分解结构示意图之一。图9是本公开的至少一个实施方式的基站设备的烘干机构的整体结构示意图。图10是本公开的至少一个实施方式的基站设备的烘干机构的内部结构示意图之一。图11是本公开的至少一个实施方式的基站设备的烘干机构的内部结构示意图之二。图12 是本公开的至少一个实施方式的基站设备的烘干机构的水位检测部的结构示意图。
下文结合图1至图12对本公开的具有烘干结构的基站设备进行详细说明。
根据本公开的一个实施方式，具有烘干机构的基站设备100，包括：
基座101，基座101具有腔体结构，基座101上形成有基座进气部1013及基座出风部；以及，
烘干机构109，烘干机构109设置在基座101的腔体结构之内，烘干机构109对经由基座进气部1013进入的气流进行加热，并将加热后的气流经由基座出风部输出。
其中，经由基座出风部输出的加热后的气流能够对停靠在基座101上的清洁设备的清洁部进行烘干，清洁设备的清洁部可以是滚刷等。
对于上述实施方式的具有烘干机构的基站设备，优选地，基座101具有基座主壳体1011及基座上壳体1012，基座主壳体1011与基座上壳体1012可拆卸地连接。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，基座101上设置有定位机构，定位机构用于对停靠在基座101上的清洁设备进行定位。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，如图1所示，基座101的一端形成有凸起部1014，基座出风部设置在凸起部1014上。
通过将基座出风部设置在凸起部1014上，可以使得加热后的气流能够以更有利的风向吹到清洁设备的清洁部上，图1示出了本公开一个实施方式的凸起部1014的大致形状，本领域技术人员可以对其形状进行调整。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，凸起部1014形成在基座主壳体1011上，且凸起部1014上形成主壳体出风部1015，主壳体出风部1015作为基座出风部。
如图4所示，由于主壳体出风部1015设置在凸起部1014上，主壳体出风部1015基本朝向停靠在基座101上的清洁设备设置。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，还包括托盘部102，基座上壳体1012上形成有容纳凹槽，托盘部102设置在基座上壳体1012的容纳凹槽之内，托盘部102上形成有清洗槽112。
其中，托盘部102可以作为或者被视为基座101的一部分。
如图4所示，托盘部102可拆卸地设置在基座上壳体1012的容纳凹槽之内，通过在托盘部102上设置清洗槽112，使得清洁设备停靠至基站设备100时，清洁设备的清洁部(例如滚刷)至少可以部分地被放置在清洗槽112内进行沥水。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，相对于水平面，基座101的上表面具有倾斜角度，基座101的上表面由基座进气部1013一侧向基座出风部一侧向下倾斜。
本领域技术人员可以对上述倾斜角度进行合适的设置、调整。
基座101的上表面可以由基座101的基座上壳体1012的部分上表面和托盘部102的部分上表面共同构成，例如图4中示出的基座101的结构。
基座101的上表面也可以由托盘部102的上表面构成，例如图8示出的基座101的结构。
如图8所示，基座101的上表面的倾斜程度可以通过托盘部102的承载部1021的倾斜程度实现，例如可以通过托盘部102被安装(非水平安装)在基座101上时承载部1021的上表面相对于水平面倾斜来实现，即，当托盘部102被置于水平面时，承载部1021的上表面相对于水平面不倾斜，当托盘部102被安装在基座101上时，承载部1021的上表面相对于水平面倾斜，从而实现基座101的上表面的倾斜。
根据本公开的另一个优选实施方式，托盘部102的承载部1021包括倾斜面，本实施方式中，通过将承载部1021的上表面设置为倾斜面，使得托盘部102被水平安装在基座101上时，通过倾斜面来实现上文描述的基座101的上表面的倾斜。
如图1所示，通过将基座101的上表面设置为具有倾斜角度，使得清洁设备停靠在基站设备100时，滴在托盘部102上的水朝向凸起部1014流动，根据本公开的某些实施方式，滴在托盘部102上的水能够流向托盘部102的清洗槽112。
根据本公开的优选实施方式，基座上壳体1012也具有倾斜角度。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，还包括导风部113，导风部113对主壳体出风部1015的出风进行导向，将主壳体出风部1015的出风导向为朝向托盘部102的清洗槽112。
通过设置导风部113，使得主壳体出风部1015的出风被导向为朝向托盘部102的清洗槽112，可以提高对清洁设备的清洁部的干燥/烘干效率。
导风部113可以为壳体结构，其优选地与基座主壳体1011的凸起部1014可拆卸地连接，导风部113也可以与基座主壳体1011一体地形成。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，导风部113包括多个导风元件1131，导风元件1131上形成出风口，导风元件1131的出风口朝向清洗槽112。
如图5所示，多个导风元件1131可以为导风套或者导风管等形式，经由主壳体出风部1015的出风被多个导风元件1131导向，使得主壳体出风部1015的出风被导向为朝向托盘部102的清洗槽112。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，导风部113设置在基座主壳体1011上，或者，导风部113与基座主壳体1011一体地形成。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，导风部113设置在托盘部102上，或者，导风部113与托盘部102一体地形成。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，托盘部102与基座上壳体1012通过磁性组件可拆卸地固定连接。
如图5所示，上文描述的导风元件1131形成大致朝向下方的出风口，气流经过出风口可经过出风口与清洗槽112之间的平滑过渡部被导引至清洗槽112。具体地，在本实施方式中，导风元件1131上形成第一遮挡件11311，第一遮挡件11311将出风口限定为大致朝向下方的出风口，第一遮挡件11311能够起到在滚刷自清洁时，防止水滴溅射进入出风口的作用。如图5所示，每个导风元件1131可以具有两个出风口，也可以具有三个出风口，每个出风口上均形成一个第一遮挡件11311，本领域技术人员可以对每个导风元件1131的出风口数量进行调整。
根据本公开的又一个优选实施方式，为提高导风效率，图6、7示出了另一种结构的导风部113，本实施方式中，导风部113整体设置一个导风板1133，导风板1133下方形成出风口，导风板1133能够使得出风口朝向清洗槽112或者滚刷方向，以使得气流能够被导向清洗槽112或者滚刷，并流经清洗槽112或者滚刷。
对于上述实施方式的导风部113，优选地，导风部113具有调节部1135，通过调节部1135可以对导风板1133的相对位置(转动位置)进行调节，从而使得出风口的气流朝向可调节。
对于上述实施方式的导风部113，优选地，在临近出风口的位置，设置阻挡部1134，滚刷在自清洁或者烘干过程中防止水流入出风口引发安全隐患。
上述各个实施方式的导风板1133可以为长条形板、或者具有弧度的长条形板，本领域技术人员可以对导风板1133的结构进行适当的调整。
优选地，上述各个实施方式的阻挡部1134也可以为长条形板，其具有与导风板1133相匹配的长度。
如图8所示，通过磁性组件将托盘部102与基座上壳体1012可拆卸地固定连接，使得托盘部102更容易地与基座上壳体1012拆卸和安装。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，磁性组件包括磁性部114及铁块115，磁性部114及铁块115分别设置在托盘部102上和基座上壳体1012上。
如图8所示，磁性部114的数量可以是一个或者两个以上，铁块115的数量可以是一个或者两个以上，优选地，磁性部114与铁块115具有匹配的尺寸，磁性部114例如可以嵌入至托盘部102，铁块115例如可以嵌入至基座上壳体1012，可替换地，可以将磁性部114设置在基座上壳体1012，以及将铁块115设置在托盘部102，本领域技术人员可以对磁性部114、铁块115的形状及数量等进行调整。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，定位机构包括主定位部1081和/或辅助定位部1082。
主定位部1081可以用于对清洁设备的主滚动轮进行定位，辅助定位部1082可以对清洁设备的辅助滚动轮进行定位，本领域技术人员应当理解，主定位部1081、辅助定位部1082的数量以及形状可以进行调整，以适应与基站设备100相配合的清洁设备，而且，定位机构也可以仅包括主定位部1081，或者仅包括辅助定位部1082。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，烘干机构109具有腔体，烘干机构109具有烘干机构进风口以及烘干机构出风口1093，烘干机构109的腔体中设置有风机装置1094及加热体1096，加热体1096对风机装置1094产生的气流进行加热，加热后的气流经由烘干机构出风口1093输出。
风机装置1094的数量可以是一个也可以是两个以上，图11中示出了两个风机装置1094，根据本公开的实施方式，风机装置1094上还套设有缓冲层或缓冲垫，缓冲层或缓冲垫可以是风机套的形式，以缓冲风机装置1094在工作过程的振动；加热体1096可以具有合适的形状，本公开对加热体1096的形状及尺寸不做特别限定，优选地，加热体1096为长条形或者圆柱形。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，烘干机构109包括烘干机构下壳体1091以及烘干机构上壳体1092，烘干机构下壳体1091以及烘干机构上壳体1092共同形成烘干机构109的腔体结构。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，烘干机构109还包括气流分散板1095，气流分散板1095对风机装置1094产生的气流进行分散，使得加热体1096对分散后的气流进行充分加热。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，气流分散板1095设置在风机装置1094与加热体1096之间。
优选地，气流分散板1095更临近风机装置1095设置。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，气流分散板1095为V形板，或者U形板，气流分散板1095形成开口形状，且开口形状朝向加热体1096。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，风机装置1094临近烘干机构进风口设置，或者设置在烘干机构进风口之内。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，加热体1096通过加热体固定部1097固定在烘干机构109的腔体之内。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，烘干机构109还具有挡水部1099，挡水部1099设置在烘干机构109的腔体之内，且设置在加热体1096与烘干机构109的烘干机构出风口1093之间。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，挡水部1099为挡水条形式，平行于加热体1096设置，挡水部1099设置在烘干机构下壳体1091的内侧壁上。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，烘干机构下壳体1091的内侧壁上设置有存水部或存水区，存水部或存水区位于挡水部1099的远离加热体1096的一侧。
如图10和图11所示，即存水部或存水区与加热体1096之间设置挡水部1099。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，存水部或存水区内设置有水位检测部1098，当存水部或存水区内的水位到达预设水位时，水位检测部1098生成触发信号。
例如当清洁设备停靠在基站设备的基座101上时，由于清洁设备的清洁部(例如滚刷)可能处于滴水状态，滴水可能经由基座101的基座出风部以及烘干机构109的烘干机构出风口1093进入烘干机构109的腔体之内，如果进入的水较多，将会导致烘干机构109的腔体内的用电部件或者其他部件受损，通过设置水位检测部1098，可以实施检测存水部或存水区内的水位，当水位到达预设的报警水位或者警戒水位时，水位检测部1098生成触发信号以进行提醒，例如通过光信号或者声信号进行提醒。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，基站设备基于水位检测部1098生成的触发信号停止对烘干机构进行供电。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，水位检测部1098包括电路板10982以及设置在电路板10982的同一侧的至少两根电极部10981，电极部10981与存水部或存水区的最低位置具有预设间距。
其中，预设间距即对应警戒水位。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，电极部10981的数量为两个，且具有相同长度。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，水位检测部1098通过支撑部1090被支撑在存水部或存水区之内。
其中，支撑部1090可以是支撑柱的形式也可以是支撑架的形式。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，还包括储液箱105，储液箱105用于存储清洁用液体，以向停靠在基站设备的清洁设备提供清洁用液体。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，还包括收纳箱103，收纳箱103用于收纳清洁设备的子部件。
其中，清洁设备的子部件例如清洁刷201、滚刷202等，收纳箱103之内可以设置一个或者多个保持结构，用于对清洁刷201、滚刷202等进行保持。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，收纳箱103具有收纳箱门1032，收纳箱门1032能够被打开及关闭。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，收纳箱103具有吹风装置1033以及收纳箱气孔部1031，吹风装置1033能够向收纳箱103的内部进行 吹风以对收纳箱103的内部进行干燥/换气，吹风装置1033提供的气流经由收纳箱气孔部1031输出。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，收纳箱气孔部1031设置在收纳箱103的顶部。
其中，收纳箱气孔部1031可以为多孔结构，图2示例性地示出了收纳箱气孔部1031的多孔形式。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，吹风装置1033设置在收纳箱103之内。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，收纳箱103的内部设置有过滤装置1034，过滤装置1034用于对收纳箱103之内的气流进行过滤。
其中，过滤装置1034可以采用海帕。
本公开的具有烘干机构的基站设备，可以在清洁设备工作之间，将清洁设备置于基座101上，启动烘干机构109，通过基座101的基座出风部对清洁设备的清洁部(例如滚刷)进行预热，也可以拆卸下上文描述的托盘部102，直接将清洁设备的清洁部放置于基座101的基座上壳体1012上进行预热。
本公开的具有烘干机构的基站设备，还可以在清洁设备工作结束之后，将清洁设备置于基座101上，启动烘干机构109，通过基座101的基座出风部对清洁设备的清洁部进行烘干。
对于上述各个实施方式的具有烘干机构的基站设备，优选地，还包括支撑装置106，支撑装置106设置在基座101上，储液箱105以及收纳箱103均设置在支撑装置106上。
其中，支撑装置106可以是支撑架或者支撑壳体的形式。
图1至图4中，收纳箱103以及储液箱105均为圆柱形结构，本领域技术人员也可以对收纳箱103及储液箱105的形状进行调整。
储液箱105的顶部可以设置储液箱加液部1051，储液箱加液部1051可以是加液盖配合加液口的形式。
储液箱105上还可以设置有提手部，储液箱105与支撑装置106为可拆卸连接。
优选地，具有烘干机构的基站设备100还具有接头部104，接头部104包括充电/通讯接头和液体接头，具有烘干机构的基站设备100还具有接头分隔部1041，接头分隔部1041将充电/通讯接头和液体接头分隔开。
通过充电/通讯接头，具有烘干机构的基站设备100能够对清洁设备进行充电，以及与清洁设备进行数据交互或者信号交互。
通过液体接头，具有烘干机构的基站设备100能够对清洁设备进行加液，或者对清洁设备的余量液体进行回收。
优选地，具有烘干机构的基站设备100还具有双向泵装置111、第一管路、第二管路及加热装置110，双向泵装置111连接在储液箱105与第一管路的第一端之间，第一管路的第二端与加热装置110连接，加热装置110连接在第一管路的第二端与第二管路的第一端之间，第二管路的第二端与上述液体接头连接，使得储液箱105中的液体依次经由双向泵装置111、第一管路、加热装置110、第二管路、液体接头被供应给清洁设备。
具有烘干机构的基站设备100还包括控制装置107，控制装置107可以是控制芯片的形式，也可以是控制电路板的形式，其可以被设置在支撑装置106上或者支撑装置106之内。
控制装置107对烘干机构109的风机装置1094、加热体1096、水位检测部1098、加热装置110、吹风装置1033等进行控制和/或供电。
根据本公开的一个实施方式的表面清洁系统，包括：
上诉任一个实施方式的具有烘干机构的基站设备100；以及，
清洁设备，清洁设备能够被具有烘干机构的基站设备100进行干燥处理或预热处理。
对于上述实施方式的表面清洁系统，具有烘干机构的基站设备100还对清洁设备提供清洁用液体和/或基站设备还对清洁设备中的余量液体进行回收。
图13是本公开的一个实施方式的清洁设备的烘干处理控制方法的流程示意图。
如图13所示，清洁设备的烘干处理控制方法S100，包括：
S102、确定清洁设备的当前的模式类型；以及，
S104、使得基站设备基于清洁设备的当前的模式类型对清洁设备的至少一个清洁部进行烘干处理。
上述实施方式中，清洁设备的模式类型至少包括第一模式类型以及第二模式类型，第一模式类型为清洁设备开机准备清洁，第二模式类型为清洁设备清洁结束进行自清洁。
优选地，第一模式类型包括：
清洁设备的至少一个清洁部被驱动以第一速度进行旋转。
优选地，当清洁设备的当前的模式类型为第一模式类型时，基站设备的烘干机构被启动以向清洁设备的至少一个清洁部提供第一预设时长的热干风。
其中，清洁设备在进行清洁工作之前，被置于基座上，可以通过使得清洁部进行低速旋转，烘干机构向清洁部提供热干风以对其进行均匀预热。
可以通过清洁设备之内的驱动装置对清洁部进行驱动以使得清洁部以第一速进行第一预设时长的旋转。
本实施方式中，可以在清洁设备被置于基座上时，清洁设备与基站设备通信连接，基站设备获取清洁设备的模式类型，基站设备基于清洁设备的模式类型对清洁设备进行相应地烘干处理。
对于上述各个实施方式的清洁设备的烘干处理控制方法，第二模式类型包括：
S2002、清洁设备的至少一个清洁部被驱动以第二速度进行旋转，至少一个清洁部被施加清洁液体，至少一个清洁部被施加抽吸处理以使得流经至少一个清洁部的液体被抽吸入清洁设备之内的污水箱；以及，
S2004、当步骤S2002持续时间达到第二预设时长，或者，当污水箱内的液量达到预设液量，至少一个清洁部停止被施加清洁液体以及至少一个清洁部停止被施加抽吸处理，且至少一个清洁部被驱动以第三速度进行旋转，第三速度低于第二速度。
对于上述实施方式的清洁设备的烘干处理方法，当清洁设备的至少一个清洁部被驱动以第三速度旋转时，烘干机构被启动以向清洁设备的至少一个清洁部提供热干风。
其中，可以将清洁部以第三速度旋转的时长与烘干机构提供热干风的时长设置为相同，例如均为第三预设时长。
本公开的具有烘干机构的基站设备，可以在清洁设备工作之前，将清洁设备置于基座101上，启动烘干机构109，通过基座101的基座出风部对清洁设备的清洁部(例如滚刷)进行预热，也可以拆卸下上文描述的托盘部102，直接将清洁设备的清洁部放置于基座101的基座上壳体1012上进行预热。
本公开的具有烘干机构的基站设备，还可以在清洁设备清洁工作结束之后，将清洁设备置于基座101上，启动烘干机构109，通过基座101的基座出风部对清洁设备的清洁部进行烘干。
在本说明书的描述中，参考术语“一个实施例/方式”、“一些实施例/方式”、“示例”、“具体示例”或“一些示例”等的描述意指结合该实施例/方式或示例描述的具体特征、结构、材料或者特点包含于本公开的至少一个实施例/方式或示例中。在本说明书中，对上述术语的示意性表述不必须针对的是相同的实施例/方式或示例。而且，描述的具体特征、结构、材料或者特点可以在任一个或多个实施例/方式或示例中以合适的方式结合。此外，在不相互矛盾的情况下，本领域的技术人员可以将本说明书中描述的不同实施例/方式或示例以及不同实施例/方式或示例的特征进行结合和组合。
此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。在本公开的描述中，“多个”的含义是至少两个，例如两个，三个等，除非另有明确具体的限定。
本领域的技术人员应当理解，上述实施方式仅仅是为了清楚地说明本公开，而并非是对本公开的范围进行限定。对于所属领域的技术人员而言，在上述公开的基础上还可以做出其它变化或变型，并且这些变化或变型仍处于本公开的范围内。

Claims (46)

  1. 一种具有烘干机构的基站设备，其特征在于，包括：
    基座，所述基座具有腔体结构，所述基座上形成有基座进气部及基座出风部；以及
    烘干机构，所述烘干机构设置在所述基座的腔体结构之内，所述烘干机构对经由所述基座进气部进入的气流进行加热，并将加热后的气流经由所述基座出风部输出。
  2. 根据权利要求1所述的具有烘干机构的基站设备，其特征在于，所述基座具有基座主壳体及基座上壳体，所述基座主壳体与所述基座上壳体可拆卸地连接。
  3. 根据权利要求2所述的具有烘干机构的基站设备，其特征在于，所述基座上设置有定位机构，所述定位机构用于对停靠在基座上的清洁设备进行定位。
  4. 根据权利要求2所述的具有烘干机构的基站设备，其特征在于，所述基座的一端形成有凸起部，所述基座出风部设置在所述凸起部上。
  5. 根据权利要求4所述的具有烘干机构的基站设备，其特征在于，所述凸起部形成在所述基座主壳体上，且所述凸起部上形成主壳体出风部，所述主壳体出风部作为所述基座出风部。
  6. 根据权利要求5所述的具有烘干机构的基站设备，其特征在于，还包括托盘部，所述基座上壳体上形成有容纳凹槽，所述托盘部设置在所述基座上壳体的所述容纳凹槽之内，所述托盘部上形成有清洗槽。
  7. 根据权利要求6所述的具有烘干机构的基站设备，其特征在于，相对于水平面，所述基座的上表面具有倾斜角度，所述基座的上表面由所述基座进气部一侧向所述基座出风部一侧向下倾斜。
  8. 根据权利要求6所述的具有烘干机构的基站设备，其特征在于，还包括导风部，所述导风部对所述主壳体出风部的出风进行导向，将主壳体出风部的出风导向为朝向所述托盘部的清洗槽。
  9. 根据权利要求8所述的具有烘干机构的基站设备，其特征在于，所述导风部包括多个导风元件，所述导风元件上形成出风口，所述导风元件的出风口朝向所述清洗槽。
  10. 根据权利要求8所述的具有烘干机构的基站设备，其特征在于，所述导风部设置在所述基座主壳体上，或者，所述导风部与所述基座主壳体一体地形成。
  11. 根据权利要求8所述的具有烘干机构的基站设备，其特征在于，所述导风部设置在托盘部上，或者，所述导风部与所述托盘部一体地形成。
  12. 根据权利要求6所述的具有烘干机构的基站设备，其特征在于，所述托盘部与所述基座上壳体通过磁性组件可拆卸地固定连接。
  13. 根据权利要求12所述的具有烘干机构的基站设备，其特征在于，所述磁性组件包括磁性部及铁块，所述磁性部及所述铁块分别设置在所述托盘部上和所述基座上壳体上。
  14. 根据权利要求3所述的具有烘干机构的基站设备，其特征在于，所述定位机构包括主定位部和/或辅助定位部。
  15. 根据权利要求1至14中任一项所述的具有烘干机构的基站设备，其特征在于，所述烘干机构具有腔体，所述烘干机构具有烘干机构进风口以及烘干机构出风口，所述烘干机构的腔体中设置有风机装置及加热体，所述加热体对风机装 置产生的气流进行加热，加热后的气流经由所述烘干机构出风口输出。
  16. 根据权利要求15所述的具有烘干机构的基站设备，其特征在于，所述烘干机构包括烘干机构下壳体以及烘干机构上壳体，所述烘干机构下壳体以及烘干机构上壳体共同形成烘干机构的所述腔体结构。
  17. 根据权利要求15所述的具有烘干机构的基站设备，其特征在于，所述烘干机构还包括气流分散板，所述气流分散板对风机装置产生的气流进行分散，使得加热体对分散后的气流进行充分加热。
  18. 根据权利要求17所述的具有烘干机构的基站设备，其特征在于，所述气流分散板设置在所述风机装置与加热体之间。
  19. 根据权利要求18所述的具有烘干机构的基站设备，其特征在于，所述气流分散板更临近风机装置设置。
  20. 根据权利要求18所述的具有烘干机构的基站设备，其特征在于，所述气流分散板为V形板，或者U形板，所述气流分散板形成开口形状，且所述开口形状朝向所述加热体。
  21. 根据权利要求15所述的具有烘干机构的基站设备，其特征在于，所述风机装置临近所述烘干机构进风口设置，或者设置在所述烘干机构进风口之内。
  22. 根据权利要求15所述的具有烘干机构的基站设备，其特征在于，所述加热体通过加热体固定部固定在所述烘干机构的腔体之内。
  23. 根据权利要求15所述的具有烘干机构的基站设备，其特征在于，所述烘干机构还具有挡水部，所述挡水部设置在所述烘干机构的腔体之内，且设置在所述加热体与所述烘干机构的烘干机构出风口之间。
  24. 根据权利要求23所述的具有烘干机构的基站设备，其特征在于，所述挡水部为挡水条形式，平行于所述加热体设置，所述挡水部设置在所述烘干机构下壳体的内侧壁上。
  25. 根据权利要求23所述的具有烘干机构的基站设备，其特征在于，所述烘干机构下壳体的内侧壁上设置有存水部或存水区，所述存水部或存水区位于所述挡水部的远离所述加热体的一侧。
  26. 根据权利要求25所述的具有烘干机构的基站设备，其特征在于，所述存水部或存水区内设置有水位检测部，当所述存水部或存水区内的水位到达预设水位时，所述水位检测部生成触发信号。
  27. 根据权利要求26所述的具有烘干机构的基站设备，其特征在于，基站设备基于所述水位检测部生成的触发信号停止对烘干机构进行供电。
  28. 根据权利要求26所述的具有烘干机构的基站设备，其特征在于，所述水位检测部包括电路板以及设置在所述电路板的同一侧的至少两根电极部，电极部与所述存水部或存水区的最低位置具有预设间距。
  29. 根据权利要求28所述的具有烘干机构的基站设备，其特征在于，所述电极部的数量为两个，且具有相同长度。
  30. 根据权利要求28所述的具有烘干机构的基站设备，其特征在于，所述水位检测部通过支撑部被支撑在所述存水部或存水区之内。
  31. 根据权利要求1所述的具有烘干机构的基站设备，其特征在于，还包括储液箱，所述储液箱用于存储清洁用液体，以向停靠在基站设备的清洁设备提供清洁用液体。
  32. 根据权利要求31所述的具有烘干机构的基站设备，其特征在于，还包括收纳箱，所述收纳箱用于收纳清洁设备的子部件。
  33. 根据权利要求32所述的具有烘干机构的基站设备，其特征在于，所述收纳箱具有收纳箱门，所述收纳箱门能够被打开及关闭。
  34. 根据权利要求32所述的具有烘干机构的基站设备，其特征在于，所述收纳箱具有吹风装置以及收纳箱气孔部，所述吹风装置能够向所述收纳箱的内部进行吹风以对收纳箱的内部进行干燥/换气，吹风装置提供的气流经由收纳箱气孔部输出。
  35. 根据权利要求34所述的具有烘干机构的基站设备，其特征在于，所述收纳箱气孔部设置在收纳箱的顶部。
  36. 根据权利要求34所述的具有烘干机构的基站设备，其特征在于，所述吹风装置设置在所述收纳箱之内。
  37. 根据权利要求32所述的具有烘干机构的基站设备，其特征在于，所述收纳箱的内部设置有过滤装置，所述过滤装置用于对所述收纳箱之内的气流进行过滤。
  38. 根据权利要求32所述的具有烘干机构的基站设备，其特征在于，还包括支撑装置，所述支撑装置设置在所述基座上，所述储液箱以及所述收纳箱均设置在所述支撑装置上。
  39. 一种表面清洁系统，其特征在于，包括：
    权利要求1至38中任一项所述的基站设备；以及
    清洁设备，所述清洁设备能够被所述基站设备进行干燥处理或预热处理。
  40. 根据权利要求39所述的表面清洁系统，其特征在于，所述基站设备还对所述清洁设备提供清洁用液体和/或所述基站设备还对所述清洁设备中的余量液体进行回收。
  41. 一种清洁设备的烘干处理控制方法，其特征在于，使用权利要求1至38中任一项所述的基站设备对清洁设备的至少一个清洁部进行烘干处理，包括：
    确定清洁设备的当前的模式类型；以及
    使得所述基站设备基于所述清洁设备的当前的模式类型对所述清洁设备的所述至少一个清洁部进行烘干处理。
  42. 根据权利要求41所述的烘干处理控制方法，其特征在于，所述清洁设备的模式类型至少包括第一模式类型以及第二模式类型，所述第一模式类型为清洁设备开机准备清洁，所述第二模式类型为清洁设备清洁结束进行自清洁。
  43. 根据权利要求42所述的烘干处理控制方法，其特征在于，所述第一模式类型包括：
    所述清洁设备的所述至少一个清洁部被驱动以第一速度进行旋转。
  44. 根据权利要求43所述的烘干处理控制方法，其特征在于，当所述清洁设备的当前的模式类型为第一模式类型时，所述基站设备的烘干机构被启动以向所述清洁设备的所述至少一个清洁部提供第一预设时长的热干风。
  45. 根据权利要求41所述的烘干处理控制方法，其特征在于，所述第二模式类型包括：
    S2002、清洁设备的所述至少一个清洁部被驱动以第二速度进行旋转，所述至少一个清洁部被施加清洁液体，所述至少一个清洁部被施加抽吸处理以使得流经所述至少一个清洁部的液体被抽吸入所述清洁设备之内的污水箱；以及
    S2004、当步骤S2002的持续时间达到第二预设时长，或者，当污水箱内的液量达到预设液量，所述至少一个清洁部停止被施加清洁液体以及所述至少一个清洁部停止被施加抽吸处理，且所述至少一个清洁部被驱动以第三速度进行旋 转，所述第三速度低于所述第二速度。
  46. 根据权利要求45所述的烘干处理方法，其特征在于，当所述清洁设备的所述至少一个清洁部被驱动以第三速度旋转时，所述烘干机构被启动以向所述清洁设备的所述至少一个清洁部提供热干风。
PCT/CN2022/087956 2021-04-26 2022-04-20 基站设备、表面清洁系统及烘干处理控制方法 WO2022228242A1 (zh)

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