WO2022199433A1 - Light-emitting unit and light-emitting module - Google Patents

Light-emitting unit and light-emitting module Download PDF

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Publication number
WO2022199433A1
WO2022199433A1 PCT/CN2022/081058 CN2022081058W WO2022199433A1 WO 2022199433 A1 WO2022199433 A1 WO 2022199433A1 CN 2022081058 W CN2022081058 W CN 2022081058W WO 2022199433 A1 WO2022199433 A1 WO 2022199433A1
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WIPO (PCT)
Prior art keywords
electrode
layer
light
insulating
hole structure
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PCT/CN2022/081058
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French (fr)
Chinese (zh)
Inventor
刁鸿浩
Original Assignee
北京芯海视界三维科技有限公司
视觉技术创投私人有限公司
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Publication of WO2022199433A1 publication Critical patent/WO2022199433A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/075Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
    • H01L25/0753Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/44Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0016Processes relating to electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0025Processes relating to coatings

Definitions

  • the present application relates to the field of semiconductor technology, such as light-emitting units and light-emitting modules.
  • the light-emitting unit can efficiently convert electrical energy into light energy, so it has a wide range of uses in modern society, for example, the light-emitting unit is used to realize lighting, display functions, and the like.
  • a part of the light emitted by the light emitting unit will be conducted in an undesired direction, and the light conducted in the undesired direction will affect the display effect.
  • Embodiments of the present disclosure provide a light-emitting unit and a light-emitting module to solve the technical problem that part of the light emitted by the light-emitting unit is conducted in an undesired direction, and the light conducted in the undesired direction will affect the display effect.
  • the light-emitting unit provided by the embodiments of the present disclosure includes:
  • a light-emitting semiconductor comprising a first semiconductor layer, an active layer, a second semiconductor layer and a recessed structure recessed from the second semiconductor layer to the first semiconductor layer;
  • the insulating layer includes a first insulating portion and a second insulating portion, the first insulating portion is arranged on the top surface of the second semiconductor layer, and the second insulating portion is arranged on the surface of the sunken structure; wherein, the light-emitting unit is provided with a penetration through the insulating layer to reach a first hole structure in the first semiconductor layer, and a second hole structure through the insulating layer to the second semiconductor layer;
  • first electrode is arranged in the first hole structure;
  • second electrode the second electrode is arranged in the second hole structure;
  • the first electrode is disposed at least on the top surface of the second insulating part
  • the second electrode is disposed at least on the top surface of the first insulating portion.
  • the sunken structure includes a slope
  • the first insulating portion is arranged on the top surface of the second semiconductor layer, and the second insulating portion is arranged on the inclined surface.
  • the first hole structure is a hole passing through the insulating layer;
  • the first electrode includes a first ohmic contact layer and a first contact electrode, the first The ohmic contact layer is arranged on the bottom surface of the first hole structure, and the first contact electrode is arranged at least on the first ohmic contact layer in the first hole structure and the top surface of the second insulating part.
  • the first hole structure when the first electrode is disposed at least on the top surface of the second insulating portion, the first hole structure includes a first portion and a second portion penetrating the insulating layer, and the first portion is close to the light emitting semiconductor; wherein the cross section of the first portion The length is different from the cross-sectional length of the second portion; the first electrode includes a first ohmic contact layer and a first contact electrode, the first ohmic contact layer is arranged in the first portion, the first contact electrode is arranged at least in the second portion, and the first ohmic contact layer is arranged in the first portion.
  • the top surface of the two insulating parts when the first electrode is disposed at least on the top surface of the second insulating portion.
  • the second hole structure is a hole passing through the insulating layer;
  • the second electrode includes a second ohmic contact layer and a second contact electrode, the second ohmic contact layer is disposed on the bottom surface of the second hole structure, at least part of the second The contact electrode is disposed on the second ohmic contact layer in the second hole structure.
  • the second hole structure includes a third portion and a fourth portion penetrating the insulating layer, the third portion is located at least in part or all of the top surface of the second semiconductor layer, and the fourth portion is located away from the third portion One side of the second semiconductor layer;
  • the second electrode includes a second ohmic contact layer and a second contact electrode, the second ohmic contact layer is arranged in the third part, and at least part of the second contact electrode is arranged in the fourth part.
  • the third portion is also located on part or all of the side surface of the second semiconductor layer.
  • the first electrode is further disposed on a partial area of the top surface of the first insulating portion.
  • the projection of the portion of the first electrode disposed on the first insulating portion on the plane of the top surface of the second semiconductor layer and the projection of the second ohmic contact layer on the plane of the top surface of the second semiconductor layer Connect or overlap.
  • the second hole structure is a hole passing through the insulating layer;
  • the second electrode includes a second ohmic contact layer and a second contact electrode, the second The ohmic contact layer is arranged on the bottom surface of the second hole structure, and the second contact electrode is arranged at least on the second ohmic contact layer in the second hole structure and on the top surface of the first insulating part.
  • the second hole structure when the second electrode is disposed on at least a top surface of the first insulating portion, the second hole structure includes a third portion and a fourth portion penetrating the insulating layer, and the third portion is located at least on top of the second semiconductor layer Part or all of the area of the surface, the fourth part is located on the side of the third part away from the second semiconductor layer;
  • the second electrode includes a second ohmic contact layer and a second contact electrode, and the second ohmic contact layer is arranged in the third part , the second contact electrode is arranged at least in the fourth part, and is arranged on the top surface of the first insulating part.
  • the third portion is also located on part or all of the side surface of the second semiconductor layer.
  • the second electrode is further disposed on a partial area of the top surface of the second insulating portion.
  • the first hole structure is a hole passing through the insulating layer;
  • the first electrode includes a first ohmic contact layer and a first contact electrode, the first ohmic contact layer is disposed on the bottom surface of the first hole structure, at least part of the first ohmic contact layer
  • the contact electrode is disposed on the first ohmic contact layer in the first hole structure.
  • the first hole structure includes a first portion and a second portion penetrating the insulating layer, and the first portion is close to the light-emitting semiconductor; wherein the cross-sectional length of the first portion and the cross-sectional length of the second portion are different; and the first electrode includes a first portion.
  • the projection of the portion of the second electrode on the second insulating portion on the inclined plane is connected to or overlaps with the projection of the first ohmic contact layer on the inclined plane.
  • the material of the first insulating portion is the same or different from the material of the second insulating portion.
  • the top surface of the first electrode is provided with a metal layer or a non-metal layer.
  • the light-emitting module provided by the embodiments of the present disclosure includes: a light-emitting unit layer, and the light-emitting unit layer includes a plurality of the above-mentioned light-emitting units.
  • the plurality of light emitting units include:
  • LED light emitting diode
  • Mini LED mini light emitting diode
  • Micro LED micro light emitting diode
  • the second electrode is disposed at least on the top surface of the first insulating portion, so as to prevent the light emitted by the light emitting unit from being conducted in an undesired direction, which is beneficial to improve the display effect.
  • FIG. 1 is a schematic structural diagram of a light-emitting unit provided by an embodiment of the present disclosure
  • FIG. 2 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure.
  • FIG. 3 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure.
  • FIG. 4 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure.
  • FIG. 5 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure.
  • FIG. 6 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure.
  • FIG. 7 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure.
  • FIG. 8 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure.
  • FIG. 9 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure.
  • FIG. 10 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure.
  • FIG. 11 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure.
  • FIG. 12 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure.
  • FIG. 13 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure.
  • FIG. 14 is a schematic structural diagram of a light-emitting semiconductor provided by an embodiment of the present disclosure.
  • 15 is a schematic structural diagram of another light-emitting semiconductor provided by an embodiment of the present disclosure.
  • FIG. 16 is a partial structural schematic diagram of a light-emitting unit provided by an embodiment of the present disclosure.
  • FIG. 17 is a schematic structural diagram of a light emitting module provided by an embodiment of the present disclosure.
  • 100 light emitting unit; 101: first insulating part; 102: second insulating part; 104: second semiconductor layer; 105: active layer; 106: first semiconductor layer; 107: first ohmic contact layer; a contact electrode; 109: the second ohmic contact layer; 110: the second contact electrode; 111: the first electrode; 112: the second electrode; 115: the top surface of the second semiconductor layer; 119: the side surface of the second semiconductor layer; 120: the top surface of the second insulating part; L1: the cross-sectional length of the first part; L2: the cross-sectional length of the second part; 121: the non-metallic layer; 122: the top surface of the first insulating part; 200: the light-emitting unit layer; 300 : Lighting module.
  • the embodiment provides a light-emitting unit 100, comprising: a light-emitting semiconductor, including a first semiconductor layer 106, an active layer 105, a second semiconductor layer 104, and a first semiconductor layer 104 that is sunk from the second semiconductor layer 104 to the first semiconductor layer.
  • a light-emitting semiconductor including a first semiconductor layer 106, an active layer 105, a second semiconductor layer 104, and a first semiconductor layer 104 that is sunk from the second semiconductor layer 104 to the first semiconductor layer.
  • the insulating layer includes a first insulating portion 101 and a second insulating portion 102, the first insulating portion 101 is arranged on the top surface 115 of the second semiconductor layer, and the second insulating portion 102 is arranged on the surface of the sunken structure; wherein, in the light-emitting unit 100 a first hole structure that penetrates the insulating layer to reach the first semiconductor layer 106, and a second hole structure that penetrates the insulating layer to the second semiconductor layer 104;
  • the first electrode 111, the first electrode 111 is arranged in the first hole structure; the second electrode 112, the second electrode 112 is arranged in the second hole structure;
  • the first electrode 111 is disposed at least on the top surface 120 of the second insulating portion
  • the second electrode 112 is disposed at least on the top surface 122 of the first insulating portion.
  • the recessed structures may be of different shapes.
  • the sunken structure may be When the sunken structure has an inclined shape, the sunken structure may have an inclined surface, or the sunken structure may have a curved surface.
  • Fig. 1, Fig. 2, Fig. 3, Fig. 4, Fig. 5, Fig. 6, Fig. 7, Fig. 8, Fig. 9, Fig. 10, Fig. 11, Fig. 12 and Fig. 13 are only exemplary to show that the depressed structure has a sloped surface Case.
  • the sunken structure may also be in the shape of a step.
  • the top surface 115 of the second semiconductor layer is the side of the second semiconductor layer 104 away from the active layer 105 , and the position on the second semiconductor layer 104 is shown in FIG. 15 .
  • the side surface 119 of the second semiconductor layer is the surface of the second semiconductor layer 104 close to the second insulating portion 102 , and the position on the second semiconductor layer 104 is shown in FIG. 15 .
  • the side surface 119 of the second semiconductor layer is part of the sunken structure.
  • the side surface 119 of the second semiconductor layer is a part of the slope.
  • the top surface 122 of the first insulating portion is the side of the first insulating portion 101 away from the light-emitting semiconductor, and the position on the first insulating portion 101 is shown in FIG. 16 .
  • the top surface 120 of the second insulating part is the surface of the second insulating part 102 away from the light-emitting semiconductor, and the position in the second insulating part 102 is shown in FIG. 16 .
  • the first electrode 111 is disposed at least on the top surface 120 of the second insulating portion.
  • the second electrode 112 is disposed at least on the top surface 122 of the first insulating portion.
  • the first electrode 111 is disposed at least on the top surface 120 of the second insulating portion, and the second electrode 112 is disposed at least on the top surface 122 of the first insulating portion.
  • the first electrode 111 By disposing the first electrode 111 at least on the top surface 120 of the second insulating part; or by disposing the second electrode 112 at least on the top surface 122 of the first insulating part; or by disposing the first electrode 111 at least on the second insulating part
  • the second electrode 112 is disposed at least on the top surface 122 of the first insulating part to prevent the light emitted by the light emitting unit 100 from being conducted in an undesired direction, which is beneficial to improve the display effect.
  • the sunken structure It includes an inclined surface; the first insulating portion 101 is disposed on the top surface 115 of the second semiconductor layer, and the second insulating portion 102 is disposed on the inclined surface.
  • the first hole structure when the first electrode 111 is disposed on at least the top surface 120 of the second insulating portion, the first hole structure may have two structures.
  • the first hole structure may be a through hole structure as shown in FIG. 1 .
  • the first hole structure may be the structure shown in FIG. 2 .
  • the first hole structure is not a through hole structure, and the first hole structure has two parts with different cross-sectional lengths.
  • the first hole structure is a hole passing through the insulating layer;
  • the first electrode 111 includes a first ohmic contact layer 107 and a first contact electrode 108, the first ohmic contact layer 107 is arranged on the bottom surface of the first hole structure, the first contact electrode 108 is arranged at least on the first ohmic contact layer 107 in the first hole structure, and the second insulating top surface 120 of the part.
  • an intersection of the end of the first hole structure close to the light-emitting semiconductor and the surface of the first semiconductor layer 106 is used as a boundary, and the surface of the first semiconductor layer 106 located within the intersection is the bottom surface of the first hole structure .
  • the opening of the first hole structure is disposed opposite to the bottom surface of the first hole structure.
  • the first hole structure when the first electrode 111 is disposed at least on the top surface 120 of the second insulating part, the first hole structure includes a first part and a second part penetrating the insulating layer, and the first part is close to the light emitting part Semiconductor; wherein, the cross-sectional length L1 of the first part and the cross-sectional length L2 of the second part are different; the first electrode 111 includes a first ohmic contact layer 107 and a first contact electrode 108, and the first ohmic contact layer 107 is arranged in the first part, The first contact electrode 108 is disposed at least in the second portion, and the top surface 120 of the second insulating portion.
  • the cross-sectional length L1 of the first portion is greater than the cross-sectional length L2 of the second portion.
  • one end of the first part is not in contact with the active layer 105 , and the other end of the first part may extend to the end of the light emitting unit 100 .
  • the second hole structure when the first electrode 111 is disposed at least on the top surface 120 of the second insulating portion, the second hole structure may have two types structure.
  • the second hole structure may be a through hole structure as shown in FIG. 1 and FIG. 2 .
  • the second hole structure may be the structure shown in FIG. 3 , FIG. 4 and FIG. 5 .
  • the second hole structure is not a through hole structure, and the second hole structure has two The two parts have different cross-sectional lengths.
  • the first pore structure and the second pore structure may be selected independently of each other.
  • the first hole structure may be a through hole
  • the second hole structure may be a through hole.
  • the first pore structure may comprise two parts and the second pore structure may comprise two parts.
  • the first hole structure may include two parts
  • the second hole structure may be a through hole.
  • the first hole structure may be a through hole
  • the second hole structure may include two parts.
  • the second hole structure is a hole passing through the insulating layer;
  • the second electrode 112 includes a second ohmic contact layer 109 and a second contact electrode 110 , and the second ohmic contact layer 109 Disposed on the bottom surface of the second hole structure, at least part of the second contact electrode 110 is disposed on the second ohmic contact layer 109 in the second hole structure.
  • an intersection of the end of the second hole structure close to the light-emitting semiconductor and the surface of the second semiconductor layer 104 is used as a boundary, and the surface of the second semiconductor layer 104 located in the intersection is the bottom surface of the second hole structure .
  • the opening of the second hole structure is disposed opposite to the bottom surface of the second hole structure.
  • the second hole structure includes a third portion and a fourth portion penetrating the insulating layer, and the third portion is located at least at a portion of the top surface 115 of the second semiconductor layer. or the whole area, the fourth part is located on the side of the third part away from the second semiconductor layer 104; the second electrode 112 includes a second ohmic contact layer 109 and a second contact electrode 110, and the second ohmic contact layer 109 is disposed on the third part part, at least part of the second contact electrode 110 is provided in the fourth part.
  • FIG. 3 shows a situation where the third portion is located in a partial region of the top surface 115 of the second semiconductor layer.
  • FIG. 4 shows a situation where the third portion is located in the entire area of the top surface 115 of the second semiconductor layer.
  • the third portion is also located in part or all of the side surface 119 of the second semiconductor layer.
  • the first electrode 111 is further disposed on a partial area of the top surface 122 of the first insulating portion.
  • the top surface 122 of the first insulating portion is the surface of the first insulating portion 101 away from the second semiconductor layer 104 .
  • the light emitted from the light emitting unit 100 toward the backlight direction can be completely blocked.
  • the second hole structure when the second electrode 112 is disposed on at least the top surface 122 of the first insulating portion, the second hole structure may Has two structures.
  • the second hole structure may be a through hole structure as shown in FIG. 8 , FIG. 9 and FIG. 10 .
  • the second hole structure may be the structure shown in FIG. 11 , FIG. 12 and FIG. 13 .
  • the second hole structure is not a through hole structure, and the second hole structure has two The two parts have different cross-sectional lengths.
  • the second hole structure is a hole passing through the insulating layer;
  • the second electrode 112 includes a second ohmic contact layer 109 and a second contact electrode 110, the second ohmic contact layer 109 is arranged on the bottom surface of the second hole structure, and the second contact electrode 110 is arranged at least on the second ohmic contact layer 109 in the second hole structure on the top surface 122 of the first insulating portion.
  • an intersection of the end of the second hole structure close to the light-emitting semiconductor and the surface of the second semiconductor layer 104 is used as a boundary, and the surface of the second semiconductor layer 104 located in the intersection is the bottom surface of the second hole structure .
  • the opening of the second hole structure is disposed opposite to the bottom surface of the second hole structure.
  • the second hole structure when the second electrode 112 is disposed on at least the top surface 122 of the first insulating portion, the second hole structure includes a third portion penetrating the insulating layer and a first Four parts, the third part is located at least in part or all of the top surface 115 of the second semiconductor layer, and the fourth part is located on the side of the third part away from the second semiconductor layer 104; the second electrode 112 includes a second ohmic contact layer 109 and the second contact electrode 110, the second ohmic contact layer 109 is provided in the third part, the second contact electrode 110 is provided in at least the fourth part, and is provided on the top surface 122 of the first insulating part.
  • FIG. 11 shows a situation where the third portion is located in a partial region of the top surface 115 of the second semiconductor layer.
  • FIG. 12 shows a situation where the third portion is located in the entire area of the top surface 115 of the second semiconductor layer.
  • the third portion is also located in part or all of the side surface 119 of the second semiconductor layer.
  • the second electrode 112 is further disposed on a partial area of the top surface 120 of the second insulating part.
  • the first hole structure when the second electrode 112 is disposed on at least the top surface 122 of the first insulating portion, the first hole structure may have two structures.
  • the first hole structure may be a through hole structure as shown in FIG. 8 .
  • the first hole structure may be the structure shown in FIG. 10 .
  • the first hole structure is not a through hole structure, and the first hole structure has two parts with different cross-sectional lengths.
  • the first pore structure and the second pore structure may be selected independently of each other.
  • the first hole structure may be a through hole
  • the second hole structure may be a through hole.
  • the first pore structure may comprise two parts and the second pore structure may comprise two parts.
  • the first hole structure may include two parts
  • the second hole structure may be a through hole.
  • the first hole structure may be a through hole
  • the second hole structure may include two parts.
  • the first hole structure is a hole passing through the insulating layer;
  • the first electrode 111 includes a first ohmic contact layer 107 and a first contact electrode 108 , and the first ohmic contact layer 107 is disposed on the first ohmic contact layer 107 .
  • an intersection of the end of the first hole structure close to the light-emitting semiconductor and the surface of the first semiconductor layer 106 is used as a boundary, and the surface of the first semiconductor layer 106 located within the intersection is the bottom surface of the first hole structure .
  • the opening of the first hole structure is disposed opposite to the bottom surface of the first hole structure.
  • the first hole structure includes a first part and a second part penetrating the insulating layer, and the first part is close to the light emitting semiconductor; wherein the cross-sectional length L1 of the first part and the cross-sectional length L2 of the second part Different; the first electrode 111 includes a first ohmic contact layer 107 and a first contact electrode 108, the first ohmic contact layer 107 is provided in the first part, and at least part of the first contact electrode 108 is provided in the second part.
  • the cross-sectional length L1 of the first portion is greater than the cross-sectional length L2 of the second portion.
  • one end of the first part is not in contact with the active layer 105 , and the other end of the first part may extend to the end of the light emitting unit 100 .
  • the projection of the portion of the second electrode 112 on the second insulating portion 102 on the inclined plane is connected or overlapped with the projection of the first ohmic contact layer 107 on the inclined plane.
  • the light emitted from the light emitting unit 100 toward the backlight direction can be completely blocked.
  • the first The material of the insulating portion 101 is the same as or different from the material of the second insulating portion 102 .
  • FIG. 9 and FIG. 10 show a case where the material of the first insulating portion 101 is the same as the material of the second insulating portion 102 .
  • FIGS. 1 , 2 , 3 , 4 , 5 , 6 , 7 , 8 , 11 , 12 and 13 illustrate the material of the first insulating part 101 and the second insulating The case where the material of the part 102 is different.
  • the material of the first insulating part 101 and the material of the second insulating part 102 may be independently selected from silicon nitride, silicon oxide or silicon oxynitride.
  • the top surface of the first electrode 111 is provided with a metal layer or a non-metal layer 121 .
  • the top surface of the first electrode 111 is the surface of the first electrode 111 away from the light emitting semiconductor.
  • FIG. 7 only exemplarily shows the situation where the non-metallic layer 121 is provided on the top surface of the first electrode 111 .
  • the first semiconductor layer may be N-type gallium nitride; alternatively, the second semiconductor layer may be P-type gallium nitride.
  • the active layer may be a multiple quantum well structure.
  • the first ohmic contact layer may be Ni-Au (Ni-Au means that the first ohmic contact layer has two layers, from close to the first semiconductor layer to away from the first semiconductor layer, Ni layer and Au layer in sequence ), Ni-Ag (Ni-Ag indicates that the first ohmic contact layer has two layers, from close to the first semiconductor layer to far away from the first semiconductor layer, Ni layer and Ag layer in sequence), Cr-Al (Cr-Al indicates the first semiconductor layer An ohmic contact layer has two layers, from close to the first semiconductor layer to far away from the first semiconductor layer, Cr layer and Al layer in sequence), TiN or tungsten nitride.
  • Ni-Au means that the first ohmic contact layer has two layers, from close to the first semiconductor layer to away from the first semiconductor layer, Ni layer and Au layer in sequence
  • Ni-Ag indicates that the first ohmic contact layer has two layers, from close to the first semiconductor layer to far away from the first semiconductor layer, Ni layer and Ag layer in sequence
  • the second ohmic contact layer may be ITO-Ag (ITO-Ag means that the second ohmic contact layer has two layers, from close to the second semiconductor layer to far away from the second semiconductor layer, the order is the ITO layer and the Ag layer ), Ni-Ag (Ni-Ag means that the second ohmic contact layer has two layers, from close to the second semiconductor layer to far away from the second semiconductor layer, Ni layer and Ag layer in sequence), ITO-Ni-Ag (ITO-Ni -Ag indicates that the second ohmic contact layer has three layers, from close to the second semiconductor layer to far away from the second semiconductor layer, followed by the ITO layer, the Ni layer and the Ag layer), ITO-Cr-Al (ITO-Cr-Al indicates the first The two ohmic contact layer has three layers, from close to the second semiconductor layer to far away from the second semiconductor layer, the order is ITO layer, Cr layer and Al layer), Ni-Au (Ni-Au means that the second
  • the material of the first contact electrode may include one or at least two of Au, Pt, Ti, Ag, Al or Cu.
  • the material of the second contact electrode may include one or at least two of Au, Pt, Ti, Ag, Al or Cu.
  • an embodiment of the present disclosure provides a light-emitting module 300 , including: a light-emitting unit layer 200 , and the light-emitting unit layer 200 includes a plurality of the above-mentioned light-emitting units 100 .
  • the plurality of light emitting units 100 may include at least one of light emitting diodes LEDs, mini Mini LEDs, and micro Micro LEDs.
  • the plurality of light emitting units 100 may include at least one LED.
  • the plurality of light emitting units 100 may include at least one Mini LED.
  • the plurality of light emitting units 100 may include at least one Micro LED.
  • the plurality of light emitting units 100 may include at least one LED and at least one Mini LED.
  • the plurality of light emitting units 100 may include at least one LED, and at least one Micro LED.
  • the plurality of light emitting units 100 may include at least one Mini LED and at least one Micro LED.
  • the plurality of light emitting units 100 may include at least one LED, at least one Mini LED, and at least one Micro LED.
  • the plurality of light emitting units 100 may include other light emitting devices other than LEDs, Mini LEDs, and Micro LEDs.
  • the device type of the light-emitting unit 100 may be determined according to actual conditions such as process requirements, for example, LED, Mini LED, Micro LED or other light-emitting devices.
  • the plurality of light emitting units 100 are arranged in an array.
  • a first element could be termed a second element, and similarly, a second element could be termed a first element, so long as all occurrences of "the first element” were consistently renamed and all occurrences of "the first element” were named consistently
  • the “second element” can be renamed consistently.
  • the first element and the second element are both elements, but may not be the same element.
  • the terms used in this application are used to describe the embodiments only and not to limit the claims. As used in the description of the embodiments and the claims, the singular forms "a” (a), “an” (an) and “the” (the) are intended to include the plural forms as well, unless the context clearly dictates otherwise. .
  • the term “and/or” as used in this application is meant to include any and all possible combinations of one or more of the associated listings.
  • the term “comprise” and its variations “comprises” and/or including and/or the like refer to stated features, integers, steps, operations, elements, and/or The presence of a component does not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components and/or groupings of these.
  • an element qualified by the phrase “comprising a" does not preclude the presence of additional identical elements in the process, method, or device that includes the element.
  • each embodiment may focus on the differences from other embodiments, and the same and similar parts between the various embodiments may refer to each other.
  • the methods, products, etc. disclosed in the embodiments if they correspond to the method sections disclosed in the embodiments, reference may be made to the descriptions of the method sections for relevant parts.
  • the disclosed methods and products may be implemented in other ways.
  • the apparatus embodiments described above are only illustrative.
  • the division of units may only be a logical function division.
  • multiple units or components may be combined or may be Integration into another system, or some features can be ignored, or not implemented.
  • the shown or discussed mutual coupling or direct coupling or communication connection may be through some interfaces, indirect coupling or communication connection of devices or units, and may be in electrical, mechanical or other forms.
  • Units described as separate components may or may not be physically separated, and components shown as units may or may not be physical units, that is, may be located in one place, or may be distributed over multiple network units. This embodiment may be implemented by selecting some or all of the units according to actual needs.
  • each functional unit in the embodiment of the present disclosure may be integrated into one processing unit, or each unit may exist physically alone, or two or more units may be integrated into one unit.

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Abstract

The present application relates to the technical field of semiconductors. Disclosed is a light-emitting unit, comprising: a light-emitting semiconductor, comprising a first semiconductor layer, an active layer, a second semiconductor layer, and a sunken structure sunken from the second semiconductor layer to the first semiconductor layer, which are sequentially arranged in a stacked manner; and an insulating layer, comprising a first insulating portion and a second insulating portion, the first insulating portion being arranged on a top surface of the second semiconductor layer, and the second insulating portion being arranged on a surface of the sunken structure. Further provided are a first hole structure penetrating the insulating layers and a second hole structure penetrating the insulating layers; a first electrode arranged in the first hole structure; and a second electrode arranged in the second hole structure. At least one of the following conditions is met: the first electrode is at least arranged on a top surface of the second insulating portion; and the second electrode is at least arranged on a top surface of the first insulating portion. The light-emitting unit provided in the present application can prevent conduction of the light emitted by the light-emitting unit in an undesired direction. The present application further discloses a light-emitting module.

Description

发光单元及发光模组Light-emitting unit and light-emitting module
本申请要求在2021年03月23日提交中国知识产权局、申请号为202110304698.6、发明名称为“发光单元及发光模组”的中国专利申请的优先权,其全部内容通过引用结合在本申请中。This application claims the priority of the Chinese patent application with the application number 202110304698.6 and the invention titled "Light-emitting unit and light-emitting module", which was filed with the China Intellectual Property Office on March 23, 2021, the entire contents of which are incorporated by reference into this application .
技术领域technical field
本申请涉及半导体技术领域,例如涉及发光单元及发光模组。The present application relates to the field of semiconductor technology, such as light-emitting units and light-emitting modules.
背景技术Background technique
发光单元可高效地将电能转化为光能,因此在现代社会具有广泛的用途,如发光单元被用于实现照明、显示功能等。The light-emitting unit can efficiently convert electrical energy into light energy, so it has a wide range of uses in modern society, for example, the light-emitting unit is used to realize lighting, display functions, and the like.
在实现本公开实施例的过程中,发现相关技术中至少存在如下问题:In the process of implementing the embodiments of the present disclosure, it is found that at least the following problems exist in the related art:
发光单元发出的光中的一部分会向不希望的方向传导,向不希望的方向传导的光将影响显示效果。A part of the light emitted by the light emitting unit will be conducted in an undesired direction, and the light conducted in the undesired direction will affect the display effect.
发明内容SUMMARY OF THE INVENTION
为了对披露的实施例的一些方面有基本的理解,下面给出了简单的概括。该概括不是泛泛评述,也不是要确定关键/重要组成元素或描绘这些实施例的保护范围,而是作为后面的详细说明的序言。In order to provide a basic understanding of some aspects of the disclosed embodiments, a brief summary is given below. This summary is not intended to be an extensive review, nor to identify key/critical elements or delineate the scope of protection of these embodiments, but rather serves as a prelude to the detailed description that follows.
本公开实施例提供了一种发光单元及发光模组,以解决发光单元发出的光中的一部分会向不希望的方向传导,向不希望的方向传导的光将影响显示效果的技术问题。Embodiments of the present disclosure provide a light-emitting unit and a light-emitting module to solve the technical problem that part of the light emitted by the light-emitting unit is conducted in an undesired direction, and the light conducted in the undesired direction will affect the display effect.
在一些实施例中,本公开实施例提供的发光单元包括:In some embodiments, the light-emitting unit provided by the embodiments of the present disclosure includes:
发光半导体,包括依次叠层设置的第一半导体层、有源层、第二半导体层和由第二半导体层下陷到第一半导体层的下陷结构;A light-emitting semiconductor, comprising a first semiconductor layer, an active layer, a second semiconductor layer and a recessed structure recessed from the second semiconductor layer to the first semiconductor layer;
绝缘层,包括第一绝缘部和第二绝缘部,第一绝缘部设置于第二半导体层的顶面,第二绝缘部设置于下陷结构的表面;其中,发光单元内设置有贯穿绝缘层到达第一半导体层的第一孔结构,以及贯穿绝缘层到达第二半导体层的第二孔结构;The insulating layer includes a first insulating portion and a second insulating portion, the first insulating portion is arranged on the top surface of the second semiconductor layer, and the second insulating portion is arranged on the surface of the sunken structure; wherein, the light-emitting unit is provided with a penetration through the insulating layer to reach a first hole structure in the first semiconductor layer, and a second hole structure through the insulating layer to the second semiconductor layer;
第一电极,第一电极设置在第一孔结构中;第二电极,第二电极设置在第二孔结构中;a first electrode, the first electrode is arranged in the first hole structure; the second electrode, the second electrode is arranged in the second hole structure;
还满足以下条件中至少之一:Also meet at least one of the following conditions:
第一电极至少设置在第二绝缘部的顶面;the first electrode is disposed at least on the top surface of the second insulating part;
第二电极至少设置在第一绝缘部的顶面。The second electrode is disposed at least on the top surface of the first insulating portion.
在一些实施例中,下陷结构包括一个斜面;In some embodiments, the sunken structure includes a slope;
第一绝缘部设置于第二半导体层的顶面,第二绝缘部设置于斜面上。The first insulating portion is arranged on the top surface of the second semiconductor layer, and the second insulating portion is arranged on the inclined surface.
在一些实施例中,当第一电极至少设置在第二绝缘部的顶面时,第一孔结构为贯穿绝缘层的孔;第一电极包括第一欧姆接触层和第一接触电极,第一欧姆接触层设置于第一孔结构的底面,第一接触电极至少设置在第一孔结构中的第一欧姆接触层上,以及第二绝缘部的顶面。In some embodiments, when the first electrode is disposed at least on the top surface of the second insulating portion, the first hole structure is a hole passing through the insulating layer; the first electrode includes a first ohmic contact layer and a first contact electrode, the first The ohmic contact layer is arranged on the bottom surface of the first hole structure, and the first contact electrode is arranged at least on the first ohmic contact layer in the first hole structure and the top surface of the second insulating part.
在一些实施例中,当第一电极至少设置在第二绝缘部的顶面时,第一孔结构包括贯穿绝缘层的第一部分和第二部分,第一部分靠近发光半导体;其中,第一部分的截面长度和第二部分的截面长度不同;第一电极包括第一欧姆接触层和第一接触电极,第一欧姆接触层设置于第一部分中,第一接触电极至少设置在第二部分中,以及第二绝缘部的顶面。In some embodiments, when the first electrode is disposed at least on the top surface of the second insulating portion, the first hole structure includes a first portion and a second portion penetrating the insulating layer, and the first portion is close to the light emitting semiconductor; wherein the cross section of the first portion The length is different from the cross-sectional length of the second portion; the first electrode includes a first ohmic contact layer and a first contact electrode, the first ohmic contact layer is arranged in the first portion, the first contact electrode is arranged at least in the second portion, and the first ohmic contact layer is arranged in the first portion. The top surface of the two insulating parts.
在一些实施例中,第二孔结构为贯穿绝缘层的孔;第二电极包括第二欧姆接触层和第二接触电极,第二欧姆接触层设置于第二孔结构的底面,至少部分第二接触电极设置于第二孔结构中的第二欧姆接触层上。In some embodiments, the second hole structure is a hole passing through the insulating layer; the second electrode includes a second ohmic contact layer and a second contact electrode, the second ohmic contact layer is disposed on the bottom surface of the second hole structure, at least part of the second The contact electrode is disposed on the second ohmic contact layer in the second hole structure.
在一些实施例中,第二孔结构包括贯穿绝缘层的第三部分和第四部分,第三部分至少位于第二半导体层的顶面的部分或全部区域,第四部分位于第三部分的远离第二半导体层的一侧;第二电极包括第二欧姆接触层和第二接触电极,第二欧姆接触层设置于第三部分中,至少部分第二接触电极设置在第四部分中。In some embodiments, the second hole structure includes a third portion and a fourth portion penetrating the insulating layer, the third portion is located at least in part or all of the top surface of the second semiconductor layer, and the fourth portion is located away from the third portion One side of the second semiconductor layer; the second electrode includes a second ohmic contact layer and a second contact electrode, the second ohmic contact layer is arranged in the third part, and at least part of the second contact electrode is arranged in the fourth part.
在一些实施例中,第三部分还位于第二半导体层的侧面的部分或全部区域。In some embodiments, the third portion is also located on part or all of the side surface of the second semiconductor layer.
在一些实施例中,第一电极还设置于第一绝缘部的顶面的部分区域。In some embodiments, the first electrode is further disposed on a partial area of the top surface of the first insulating portion.
在一些实施例中,第一电极设置于第一绝缘部上的部分在第二半导体层的顶面的所在平面的投影与第二欧姆接触层在第二半导体层的顶面的所在平面的投影连接或交叠。In some embodiments, the projection of the portion of the first electrode disposed on the first insulating portion on the plane of the top surface of the second semiconductor layer and the projection of the second ohmic contact layer on the plane of the top surface of the second semiconductor layer Connect or overlap.
在一些实施例中,当第二电极至少设置在第一绝缘部的顶面时,第二孔结构为贯穿绝缘层的孔;第二电极包括第二欧姆接触层和第二接触电极,第二欧姆接触层设置于第二孔结构的底面,第二接触电极至少设置在第二孔结构中的第二欧姆接触层上,以及设置于第一绝缘部的顶面。In some embodiments, when the second electrode is disposed at least on the top surface of the first insulating portion, the second hole structure is a hole passing through the insulating layer; the second electrode includes a second ohmic contact layer and a second contact electrode, the second The ohmic contact layer is arranged on the bottom surface of the second hole structure, and the second contact electrode is arranged at least on the second ohmic contact layer in the second hole structure and on the top surface of the first insulating part.
在一些实施例中,当第二电极至少设置在第一绝缘部的顶面时,第二孔结构包括贯穿绝缘层的第三部分和第四部分,第三部分至少位于第二半导体层的顶面的部分或全部区域,第四部分位于第三部分的远离第二半导体层的一侧;第二电极包括第二欧姆接触层和第二接触电极,第二欧姆接触层设置于第三部分中,第二接触电极至少设置在第四部分中,以及设置于第一绝缘部的顶面。In some embodiments, when the second electrode is disposed on at least a top surface of the first insulating portion, the second hole structure includes a third portion and a fourth portion penetrating the insulating layer, and the third portion is located at least on top of the second semiconductor layer Part or all of the area of the surface, the fourth part is located on the side of the third part away from the second semiconductor layer; the second electrode includes a second ohmic contact layer and a second contact electrode, and the second ohmic contact layer is arranged in the third part , the second contact electrode is arranged at least in the fourth part, and is arranged on the top surface of the first insulating part.
在一些实施例中,第三部分还位于第二半导体层的侧面的部分或全部区域。In some embodiments, the third portion is also located on part or all of the side surface of the second semiconductor layer.
在一些实施例中,第二电极还设置于第二绝缘部的顶面的部分区域。In some embodiments, the second electrode is further disposed on a partial area of the top surface of the second insulating portion.
在一些实施例中,第一孔结构为贯穿绝缘层的孔;第一电极包括第一欧姆接触层和第一接触电极,第一欧姆接触层设置于第一孔结构的底面,至少部分第一接触电极设置于第一孔结构中的第一欧姆接触层上。In some embodiments, the first hole structure is a hole passing through the insulating layer; the first electrode includes a first ohmic contact layer and a first contact electrode, the first ohmic contact layer is disposed on the bottom surface of the first hole structure, at least part of the first ohmic contact layer The contact electrode is disposed on the first ohmic contact layer in the first hole structure.
在一些实施例中,第一孔结构包括贯穿绝缘层的第一部分和第二部分,第一部分靠近发光半导体;其中,第一部分的截面长度和第二部分的截面长度不同;第一电极包括第一欧姆接触层和第一接触电极,第一欧姆接触层设置于第一部分中,至少部分第一接触电极设置在第二部分中。In some embodiments, the first hole structure includes a first portion and a second portion penetrating the insulating layer, and the first portion is close to the light-emitting semiconductor; wherein the cross-sectional length of the first portion and the cross-sectional length of the second portion are different; and the first electrode includes a first portion. An ohmic contact layer and a first contact electrode, the first ohmic contact layer is provided in the first part, and at least part of the first contact electrode is provided in the second part.
在一些实施例中,第二电极位于第二绝缘部上的部分在斜面上的投影与第一欧姆接触层在斜面上的投影连接或交叠。In some embodiments, the projection of the portion of the second electrode on the second insulating portion on the inclined plane is connected to or overlaps with the projection of the first ohmic contact layer on the inclined plane.
在一些实施例中,第一绝缘部的材料与第二绝缘部的材料相同或不同。In some embodiments, the material of the first insulating portion is the same or different from the material of the second insulating portion.
在一些实施例中,第一电极的顶面设置金属层或非金属层。In some embodiments, the top surface of the first electrode is provided with a metal layer or a non-metal layer.
在一些实施例中,本公开实施例提供的发光模组包括:发光单元层,发光单元层包括多个如上所述的发光单元。In some embodiments, the light-emitting module provided by the embodiments of the present disclosure includes: a light-emitting unit layer, and the light-emitting unit layer includes a plurality of the above-mentioned light-emitting units.
在一些实施例中,多个发光单元,包括:In some embodiments, the plurality of light emitting units include:
发光二极管(LED)、迷你发光二极管(Mini LED)、微发光二极管(Micro LED)中至少之一。At least one of a light emitting diode (LED), a mini light emitting diode (Mini LED), and a micro light emitting diode (Micro LED).
本公开实施例提供的发光单元及发光模组,可以实现以下技术效果:The light-emitting unit and light-emitting module provided by the embodiments of the present disclosure can achieve the following technical effects:
通过将第一电极至少设置在第二绝缘部的顶面;或通过将第二电极至少设置在第一绝缘部的顶面;或通过将第一电极至少设置在第二绝缘部的顶面,第二电极至少设置在第一绝缘部的顶面,尽量避免发光单元发出的光向不希望的方向传导,有利于改善显示效果。By disposing the first electrode at least on the top surface of the second insulating part; or by disposing the second electrode at least on the top surface of the first insulating part; or by disposing the first electrode at least on the top surface of the second insulating part, The second electrode is disposed at least on the top surface of the first insulating portion, so as to prevent the light emitted by the light emitting unit from being conducted in an undesired direction, which is beneficial to improve the display effect.
以上的总体描述和下文中的描述仅是示例性和解释性的,不用于限制本申请。The foregoing general description and the following description are exemplary and explanatory only and are not intended to limit the application.
附图说明Description of drawings
至少一个实施例通过与之对应的附图进行示例性说明,这些示例性说明和附图并不构成对实施例的限定,附图中具有相同参考数字标号的元件示为类似的元件,附图不构成比例限制,并且其中:At least one embodiment is exemplified by the accompanying drawings, which are not intended to limit the embodiments. Elements with the same reference numerals in the drawings are shown as similar elements. does not constitute a proportional limit, and where:
图1是本公开实施例提供的一种发光单元的结构示意图;FIG. 1 is a schematic structural diagram of a light-emitting unit provided by an embodiment of the present disclosure;
图2是本公开实施例提供的另一种发光单元的结构示意图;FIG. 2 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure;
图3是本公开实施例提供的另一种发光单元的结构示意图;3 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure;
图4是本公开实施例提供的另一种发光单元的结构示意图;FIG. 4 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure;
图5是本公开实施例提供的另一种发光单元的结构示意图;FIG. 5 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure;
图6是本公开实施例提供的另一种发光单元的结构示意图;6 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure;
图7是本公开实施例提供的另一种发光单元的结构示意图;FIG. 7 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure;
图8是本公开实施例提供的另一种发光单元的结构示意图;FIG. 8 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure;
图9是本公开实施例提供的另一种发光单元的结构示意图;FIG. 9 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure;
图10是本公开实施例提供的另一种发光单元的结构示意图;10 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure;
图11是本公开实施例提供的另一种发光单元的结构示意图;11 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure;
图12是本公开实施例提供的另一种发光单元的结构示意图;12 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure;
图13是本公开实施例提供的另一种发光单元的结构示意图;13 is a schematic structural diagram of another light-emitting unit provided by an embodiment of the present disclosure;
图14是本公开实施例提供的一种发光半导体的结构示意图;14 is a schematic structural diagram of a light-emitting semiconductor provided by an embodiment of the present disclosure;
图15是本公开实施例提供的另一种发光半导体的结构示意图;15 is a schematic structural diagram of another light-emitting semiconductor provided by an embodiment of the present disclosure;
图16是本公开实施例提供的一种发光单元的部分结构示意图;FIG. 16 is a partial structural schematic diagram of a light-emitting unit provided by an embodiment of the present disclosure;
图17是本公开实施例提供的发光模组的结构示意图。FIG. 17 is a schematic structural diagram of a light emitting module provided by an embodiment of the present disclosure.
附图标记:Reference number:
100:发光单元;101:第一绝缘部;102:第二绝缘部;104:第二半导体层;105:有源层;106:第一半导体层;107:第一欧姆接触层;108:第一接触电极;109:第二欧姆接触层;110:第二接触电极;111:第一电极;112:第二电极;115:第二半导体层的顶面;119:第二半导体层的侧面;120:第二绝缘部的顶面;L1:第一部分的截面长度;L2:第二部分的截面长度;121:非金属层;122:第一绝缘部的顶面;200:发光单元层;300:发光模组。100: light emitting unit; 101: first insulating part; 102: second insulating part; 104: second semiconductor layer; 105: active layer; 106: first semiconductor layer; 107: first ohmic contact layer; a contact electrode; 109: the second ohmic contact layer; 110: the second contact electrode; 111: the first electrode; 112: the second electrode; 115: the top surface of the second semiconductor layer; 119: the side surface of the second semiconductor layer; 120: the top surface of the second insulating part; L1: the cross-sectional length of the first part; L2: the cross-sectional length of the second part; 121: the non-metallic layer; 122: the top surface of the first insulating part; 200: the light-emitting unit layer; 300 : Lighting module.
具体实施方式Detailed ways
为了能够更加详尽地了解本公开实施例的特点与技术内容,下面结合附图对本公开实施例的实现进行详细阐述,所附附图仅供参考说明之用,并非用来限定本公开实施例。在以下的技术描述中,为方便解释起见,通过多个细节以提供对所披露实施例的充分理解。然而,在没有这些细节的情况下,至少一个实施例仍然可以实施。在其它情况下,为简化附图,熟知的结构和装置可以简化展示。In order to understand the features and technical contents of the embodiments of the present disclosure in more detail, the implementation of the embodiments of the present disclosure will be described in detail below with reference to the accompanying drawings, which are for reference only and are not intended to limit the embodiments of the present disclosure. In the following technical description, for the convenience of explanation, numerous details are provided to provide a thorough understanding of the disclosed embodiments. However, at least one embodiment may be practiced without these details. In other instances, well-known structures and devices may be shown simplified in order to simplify the drawings.
如图1、图2、图3、图4、图5、图6、图7、图8、图9、图10、图11、图12和图13所示,在一些实施例中,本公开实施例提供了一种发光单元100,包括:发光半导体, 包括依次叠层设置的第一半导体层106、有源层105、第二半导体层104和由第二半导体层104下陷到第一半导体层106的下陷结构;1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, and 13, in some embodiments, the present disclosure The embodiment provides a light-emitting unit 100, comprising: a light-emitting semiconductor, including a first semiconductor layer 106, an active layer 105, a second semiconductor layer 104, and a first semiconductor layer 104 that is sunk from the second semiconductor layer 104 to the first semiconductor layer. 106 sunken structure;
绝缘层,包括第一绝缘部101和第二绝缘部102,第一绝缘部101设置于第二半导体层的顶面115,第二绝缘部102设置于下陷结构的表面;其中,发光单元100内设置有贯穿绝缘层到达第一半导体层106的第一孔结构,以及贯穿绝缘层到达第二半导体层104的第二孔结构;The insulating layer includes a first insulating portion 101 and a second insulating portion 102, the first insulating portion 101 is arranged on the top surface 115 of the second semiconductor layer, and the second insulating portion 102 is arranged on the surface of the sunken structure; wherein, in the light-emitting unit 100 a first hole structure that penetrates the insulating layer to reach the first semiconductor layer 106, and a second hole structure that penetrates the insulating layer to the second semiconductor layer 104;
第一电极111,第一电极111设置在第一孔结构中;第二电极112,第二电极112设置在第二孔结构中;The first electrode 111, the first electrode 111 is arranged in the first hole structure; the second electrode 112, the second electrode 112 is arranged in the second hole structure;
还满足以下条件中至少之一:Also meet at least one of the following conditions:
第一电极111至少设置在第二绝缘部的顶面120;The first electrode 111 is disposed at least on the top surface 120 of the second insulating portion;
第二电极112至少设置在第一绝缘部的顶面122。The second electrode 112 is disposed at least on the top surface 122 of the first insulating portion.
在一些实施例中,下陷结构可以为不同的形状。可选地,如图1、图2、图3、图4、图5、图6、图7、图8、图9、图10、图11、图12和图13所示,下陷结构可以为倾斜形状的下陷结构,当下陷结构为倾斜的形状时,下陷结构可以具有一个斜面,或下陷结构可以具有一个曲面。图1、图2、图3、图4、图5、图6、图7、图8、图9、图10、图11、图12和图13中只是示例性地示出了下陷结构具有斜面的情况。可选地,如图14所示,下陷结构还可以为台阶形状。In some embodiments, the recessed structures may be of different shapes. Optionally, as shown in FIG. 1, FIG. 2, FIG. 3, FIG. 4, FIG. 5, FIG. 6, FIG. 7, FIG. 8, FIG. 9, FIG. 10, FIG. 11, FIG. 12 and FIG. 13, the sunken structure may be When the sunken structure has an inclined shape, the sunken structure may have an inclined surface, or the sunken structure may have a curved surface. Fig. 1, Fig. 2, Fig. 3, Fig. 4, Fig. 5, Fig. 6, Fig. 7, Fig. 8, Fig. 9, Fig. 10, Fig. 11, Fig. 12 and Fig. 13 are only exemplary to show that the depressed structure has a sloped surface Case. Optionally, as shown in FIG. 14 , the sunken structure may also be in the shape of a step.
在一些实施例中,如图15所示,第二半导体层的顶面115为第二半导体层104的远离有源层105的一面,在第二半导体层104上的位置如图15所示。可选地,第二半导体层的侧面119为第二半导体层104的靠近第二绝缘部102的面,在第二半导体层104上的位置如图15所示。可选地,第二半导体层的侧面119为下陷结构的一部分。可选地,当下陷结构具有一个斜面时,第二半导体层的侧面119为斜面的一部分。In some embodiments, as shown in FIG. 15 , the top surface 115 of the second semiconductor layer is the side of the second semiconductor layer 104 away from the active layer 105 , and the position on the second semiconductor layer 104 is shown in FIG. 15 . Optionally, the side surface 119 of the second semiconductor layer is the surface of the second semiconductor layer 104 close to the second insulating portion 102 , and the position on the second semiconductor layer 104 is shown in FIG. 15 . Optionally, the side surface 119 of the second semiconductor layer is part of the sunken structure. Optionally, when the recessed structure has a slope, the side surface 119 of the second semiconductor layer is a part of the slope.
在一些实施例中,如图16所示,第一绝缘部的顶面122为第一绝缘部101的远离发光半导体的一面,在第一绝缘部101上的位置如图16所示。In some embodiments, as shown in FIG. 16 , the top surface 122 of the first insulating portion is the side of the first insulating portion 101 away from the light-emitting semiconductor, and the position on the first insulating portion 101 is shown in FIG. 16 .
在一些实施例中,如图16所示,第二绝缘部的顶面120为第二绝缘部102的远离发光半导体的面,在第二绝缘部102中的位置如图16所示。In some embodiments, as shown in FIG. 16 , the top surface 120 of the second insulating part is the surface of the second insulating part 102 away from the light-emitting semiconductor, and the position in the second insulating part 102 is shown in FIG. 16 .
在一些实施例中,如图1、图2、图3、图4、图5、图6和图7所示,第一电极111至少设置在第二绝缘部的顶面120。可选地,如图8、图9、图10、图11、图12和图13所示,第二电极112至少设置在第一绝缘部的顶面122。可选地,第一电极111至少设置在第二绝缘部的顶面120,第二电极112至少设置在第一绝缘部的顶面122。In some embodiments, as shown in FIG. 1 , FIG. 2 , FIG. 3 , FIG. 4 , FIG. 5 , FIG. 6 and FIG. 7 , the first electrode 111 is disposed at least on the top surface 120 of the second insulating portion. Optionally, as shown in FIG. 8 , FIG. 9 , FIG. 10 , FIG. 11 , FIG. 12 and FIG. 13 , the second electrode 112 is disposed at least on the top surface 122 of the first insulating portion. Optionally, the first electrode 111 is disposed at least on the top surface 120 of the second insulating portion, and the second electrode 112 is disposed at least on the top surface 122 of the first insulating portion.
通过将第一电极111至少设置在第二绝缘部的顶面120;或通过将第二电极112至少 设置在第一绝缘部的顶面122;或通过将第一电极111至少设置在第二绝缘部的顶面120,第二电极112至少设置在第一绝缘部的顶面122,尽量避免发光单元100发出的光向不希望的方向传导,有利于改善显示效果。By disposing the first electrode 111 at least on the top surface 120 of the second insulating part; or by disposing the second electrode 112 at least on the top surface 122 of the first insulating part; or by disposing the first electrode 111 at least on the second insulating part The second electrode 112 is disposed at least on the top surface 122 of the first insulating part to prevent the light emitted by the light emitting unit 100 from being conducted in an undesired direction, which is beneficial to improve the display effect.
如图1、图2、图3、图4、图5、图6、图7、图8、图9、图10、图11、图12和图13所示,在一些实施例中,下陷结构包括一个斜面;第一绝缘部101设置于第二半导体层的顶面115,第二绝缘部102设置于斜面上。1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, and 13, in some embodiments, the sunken structure It includes an inclined surface; the first insulating portion 101 is disposed on the top surface 115 of the second semiconductor layer, and the second insulating portion 102 is disposed on the inclined surface.
在一些实施例中,如图1和图2所示,当第一电极111至少设置在第二绝缘部的顶面120时,第一孔结构可以具有两种结构。可选地,第一孔结构可以为如图1所示的通孔结构。可选地,第一孔结构可以为如图2所示的结构,在图2中,第一孔结构并非通孔结构,第一孔结构具有两个部分,两个部分的截面长度不同。In some embodiments, as shown in FIGS. 1 and 2 , when the first electrode 111 is disposed on at least the top surface 120 of the second insulating portion, the first hole structure may have two structures. Optionally, the first hole structure may be a through hole structure as shown in FIG. 1 . Optionally, the first hole structure may be the structure shown in FIG. 2 . In FIG. 2 , the first hole structure is not a through hole structure, and the first hole structure has two parts with different cross-sectional lengths.
在一些实施例中,如图1所示,当第一电极111至少设置在第二绝缘部的顶面120时,第一孔结构为贯穿绝缘层的孔;第一电极111包括第一欧姆接触层107和第一接触电极108,第一欧姆接触层107设置于第一孔结构的底面,第一接触电极108至少设置在第一孔结构中的第一欧姆接触层107上,以及第二绝缘部的顶面120。In some embodiments, as shown in FIG. 1 , when the first electrode 111 is disposed at least on the top surface 120 of the second insulating portion, the first hole structure is a hole passing through the insulating layer; the first electrode 111 includes a first ohmic contact layer 107 and a first contact electrode 108, the first ohmic contact layer 107 is arranged on the bottom surface of the first hole structure, the first contact electrode 108 is arranged at least on the first ohmic contact layer 107 in the first hole structure, and the second insulating top surface 120 of the part.
在一些实施例中,以第一孔结构的靠近发光半导体的一端与第一半导体层106的表面的交线为边界,位于交线内的第一半导体层106的表面为第一孔结构的底面。可选地,第一孔结构的开口与第一孔结构的底面相对设置。In some embodiments, an intersection of the end of the first hole structure close to the light-emitting semiconductor and the surface of the first semiconductor layer 106 is used as a boundary, and the surface of the first semiconductor layer 106 located within the intersection is the bottom surface of the first hole structure . Optionally, the opening of the first hole structure is disposed opposite to the bottom surface of the first hole structure.
在一些实施例中,如图2所示,当第一电极111至少设置在第二绝缘部的顶面120时,第一孔结构包括贯穿绝缘层的第一部分和第二部分,第一部分靠近发光半导体;其中,第一部分的截面长度L1和第二部分的截面长度L2不同;第一电极111包括第一欧姆接触层107和第一接触电极108,第一欧姆接触层107设置于第一部分中,第一接触电极108至少设置在第二部分中,以及第二绝缘部的顶面120。In some embodiments, as shown in FIG. 2 , when the first electrode 111 is disposed at least on the top surface 120 of the second insulating part, the first hole structure includes a first part and a second part penetrating the insulating layer, and the first part is close to the light emitting part Semiconductor; wherein, the cross-sectional length L1 of the first part and the cross-sectional length L2 of the second part are different; the first electrode 111 includes a first ohmic contact layer 107 and a first contact electrode 108, and the first ohmic contact layer 107 is arranged in the first part, The first contact electrode 108 is disposed at least in the second portion, and the top surface 120 of the second insulating portion.
在一些实施例中,如图2所示,第一部分的截面长度L1大于第二部分的截面长度L2。可选地,第一部分的一端不与有源层105接触,第一部分的另一端可以延伸至发光单元100的端部。In some embodiments, as shown in FIG. 2 , the cross-sectional length L1 of the first portion is greater than the cross-sectional length L2 of the second portion. Optionally, one end of the first part is not in contact with the active layer 105 , and the other end of the first part may extend to the end of the light emitting unit 100 .
在一些实施例中,如图1、图2、图3、图4和图5所示,当第一电极111至少设置在第二绝缘部的顶面120时,第二孔结构可以具有两种结构。可选地,第二孔结构可以为如图1和图2所示的通孔结构。可选地,第二孔结构可以为如图3、图4和图5所示的结构,在图3、图4和图5中,第二孔结构并非通孔结构,第二孔结构具有两个部分,两个部分的截面长度不同。In some embodiments, as shown in FIG. 1 , FIG. 2 , FIG. 3 , FIG. 4 and FIG. 5 , when the first electrode 111 is disposed at least on the top surface 120 of the second insulating portion, the second hole structure may have two types structure. Optionally, the second hole structure may be a through hole structure as shown in FIG. 1 and FIG. 2 . Optionally, the second hole structure may be the structure shown in FIG. 3 , FIG. 4 and FIG. 5 . In FIG. 3 , FIG. 4 and FIG. 5 , the second hole structure is not a through hole structure, and the second hole structure has two The two parts have different cross-sectional lengths.
在一些实施例中,第一孔结构和第二孔结构可以彼此独立地选择为何种结构。可选地, 第一孔结构可以为通孔,第二孔结构可以为通孔。可选地,第一孔结构可以包括两个部分,第二孔结构可以包括两个部分。可选地,第一孔结构可以包括两个部分,第二孔结构可以为通孔。可选地,第一孔结构可以为通孔,第二孔结构可以包括两个部分。In some embodiments, the first pore structure and the second pore structure may be selected independently of each other. Optionally, the first hole structure may be a through hole, and the second hole structure may be a through hole. Alternatively, the first pore structure may comprise two parts and the second pore structure may comprise two parts. Alternatively, the first hole structure may include two parts, and the second hole structure may be a through hole. Alternatively, the first hole structure may be a through hole, and the second hole structure may include two parts.
在一些实施例中,如图1和图2所示,第二孔结构为贯穿绝缘层的孔;第二电极112包括第二欧姆接触层109和第二接触电极110,第二欧姆接触层109设置于第二孔结构的底面,至少部分第二接触电极110设置于第二孔结构中的第二欧姆接触层109上。In some embodiments, as shown in FIG. 1 and FIG. 2 , the second hole structure is a hole passing through the insulating layer; the second electrode 112 includes a second ohmic contact layer 109 and a second contact electrode 110 , and the second ohmic contact layer 109 Disposed on the bottom surface of the second hole structure, at least part of the second contact electrode 110 is disposed on the second ohmic contact layer 109 in the second hole structure.
在一些实施例中,以第二孔结构的靠近发光半导体的一端与第二半导体层104的表面的交线为边界,位于交线内的第二半导体层104的表面为第二孔结构的底面。可选地,第二孔结构的开口与第二孔结构的底面相对设置。In some embodiments, an intersection of the end of the second hole structure close to the light-emitting semiconductor and the surface of the second semiconductor layer 104 is used as a boundary, and the surface of the second semiconductor layer 104 located in the intersection is the bottom surface of the second hole structure . Optionally, the opening of the second hole structure is disposed opposite to the bottom surface of the second hole structure.
在一些实施例中,如图3、图4和图5所示,第二孔结构包括贯穿绝缘层的第三部分和第四部分,第三部分至少位于第二半导体层的顶面115的部分或全部区域,第四部分位于第三部分的远离第二半导体层104的一侧;第二电极112包括第二欧姆接触层109和第二接触电极110,第二欧姆接触层109设置于第三部分中,至少部分第二接触电极110设置在第四部分中。In some embodiments, as shown in FIGS. 3 , 4 and 5 , the second hole structure includes a third portion and a fourth portion penetrating the insulating layer, and the third portion is located at least at a portion of the top surface 115 of the second semiconductor layer. or the whole area, the fourth part is located on the side of the third part away from the second semiconductor layer 104; the second electrode 112 includes a second ohmic contact layer 109 and a second contact electrode 110, and the second ohmic contact layer 109 is disposed on the third part part, at least part of the second contact electrode 110 is provided in the fourth part.
在一些实施例中,图3中示出了第三部分位于第二半导体层的顶面115的部分区域的情形。In some embodiments, FIG. 3 shows a situation where the third portion is located in a partial region of the top surface 115 of the second semiconductor layer.
在一些实施例中,图4中示出了第三部分位于第二半导体层的顶面115的全部区域的情形。In some embodiments, FIG. 4 shows a situation where the third portion is located in the entire area of the top surface 115 of the second semiconductor layer.
在一些实施例中,如图5所示,第三部分还位于第二半导体层的侧面119的部分或全部区域。In some embodiments, as shown in FIG. 5 , the third portion is also located in part or all of the side surface 119 of the second semiconductor layer.
在一些实施例中,如图6所示,第一电极111还设置于第一绝缘部的顶面122的部分区域。如图16所示,可选地,第一绝缘部的顶面122为第一绝缘部101的远离第二半导体层104的面。可选地,第一电极111设置于第一绝缘部101上的部分在第二半导体层的顶面115的所在平面的投影与第二欧姆接触层109在第二半导体层的顶面115的所在平面的投影连接或交叠。In some embodiments, as shown in FIG. 6 , the first electrode 111 is further disposed on a partial area of the top surface 122 of the first insulating portion. As shown in FIG. 16 , optionally, the top surface 122 of the first insulating portion is the surface of the first insulating portion 101 away from the second semiconductor layer 104 . Optionally, the projection of the portion of the first electrode 111 disposed on the first insulating portion 101 on the plane where the top surface 115 of the second semiconductor layer is located and the location of the second ohmic contact layer 109 on the top surface 115 of the second semiconductor layer. Projections of planes join or overlap.
本申请中,通过第三部分中的第二欧姆接触层109与第一电极111的配合,可以完全遮挡发光单元100向背光方向出射的光线。In the present application, through the cooperation between the second ohmic contact layer 109 in the third part and the first electrode 111 , the light emitted from the light emitting unit 100 toward the backlight direction can be completely blocked.
在一些实施例中,如图8、图9、图10、图11、图12和图13所示,当第二电极112至少设置在第一绝缘部的顶面122时,第二孔结构可以具有两种结构。可选地,第二孔结构可以为如图8、图9和图10所示的通孔结构。可选地,第二孔结构可以为如图11、图12和图13所示的结构,在图11、图12和图13中,第二孔结构并非通孔结构,第二孔结构 具有两个部分,两个部分的截面长度不同。In some embodiments, as shown in FIG. 8 , FIG. 9 , FIG. 10 , FIG. 11 , FIG. 12 and FIG. 13 , when the second electrode 112 is disposed on at least the top surface 122 of the first insulating portion, the second hole structure may Has two structures. Optionally, the second hole structure may be a through hole structure as shown in FIG. 8 , FIG. 9 and FIG. 10 . Optionally, the second hole structure may be the structure shown in FIG. 11 , FIG. 12 and FIG. 13 . In FIGS. 11 , 12 and 13 , the second hole structure is not a through hole structure, and the second hole structure has two The two parts have different cross-sectional lengths.
在一些实施例中,如图8、图9和图10所示,当第二电极112至少设置在第一绝缘部的顶面122时,第二孔结构为贯穿绝缘层的孔;第二电极112包括第二欧姆接触层109和第二接触电极110,第二欧姆接触层109设置于第二孔结构的底面,第二接触电极110至少设置在第二孔结构中的第二欧姆接触层109上,以及设置于第一绝缘部的顶面122。In some embodiments, as shown in FIG. 8 , FIG. 9 and FIG. 10 , when the second electrode 112 is disposed at least on the top surface 122 of the first insulating portion, the second hole structure is a hole passing through the insulating layer; the second electrode 112 includes a second ohmic contact layer 109 and a second contact electrode 110, the second ohmic contact layer 109 is arranged on the bottom surface of the second hole structure, and the second contact electrode 110 is arranged at least on the second ohmic contact layer 109 in the second hole structure on the top surface 122 of the first insulating portion.
在一些实施例中,以第二孔结构的靠近发光半导体的一端与第二半导体层104的表面的交线为边界,位于交线内的第二半导体层104的表面为第二孔结构的底面。可选地,第二孔结构的开口与第二孔结构的底面相对设置。In some embodiments, an intersection of the end of the second hole structure close to the light-emitting semiconductor and the surface of the second semiconductor layer 104 is used as a boundary, and the surface of the second semiconductor layer 104 located in the intersection is the bottom surface of the second hole structure . Optionally, the opening of the second hole structure is disposed opposite to the bottom surface of the second hole structure.
在一些实施例中,如图11、图12和图13所示,当第二电极112至少设置在第一绝缘部的顶面122时,第二孔结构包括贯穿绝缘层的第三部分和第四部分,第三部分至少位于第二半导体层的顶面115的部分或全部区域,第四部分位于第三部分的远离第二半导体层104的一侧;第二电极112包括第二欧姆接触层109和第二接触电极110,第二欧姆接触层109设置于第三部分中,第二接触电极110至少设置在第四部分中,以及设置于第一绝缘部的顶面122。In some embodiments, as shown in FIGS. 11 , 12 and 13 , when the second electrode 112 is disposed on at least the top surface 122 of the first insulating portion, the second hole structure includes a third portion penetrating the insulating layer and a first Four parts, the third part is located at least in part or all of the top surface 115 of the second semiconductor layer, and the fourth part is located on the side of the third part away from the second semiconductor layer 104; the second electrode 112 includes a second ohmic contact layer 109 and the second contact electrode 110, the second ohmic contact layer 109 is provided in the third part, the second contact electrode 110 is provided in at least the fourth part, and is provided on the top surface 122 of the first insulating part.
在一些实施例中,图11中示出了第三部分位于第二半导体层的顶面115的部分区域的情形。In some embodiments, FIG. 11 shows a situation where the third portion is located in a partial region of the top surface 115 of the second semiconductor layer.
在一些实施例中,图12中示出了第三部分位于第二半导体层的顶面115的全部区域的情形。In some embodiments, FIG. 12 shows a situation where the third portion is located in the entire area of the top surface 115 of the second semiconductor layer.
在一些实施例中,如图13所示,第三部分还位于第二半导体层的侧面119的部分或全部区域。In some embodiments, as shown in FIG. 13 , the third portion is also located in part or all of the side surface 119 of the second semiconductor layer.
在一些实施例中,如图9和图10所示,第二电极112还设置于第二绝缘部的顶面120的部分区域。In some embodiments, as shown in FIG. 9 and FIG. 10 , the second electrode 112 is further disposed on a partial area of the top surface 120 of the second insulating part.
在一些实施例中,如图8和图10所示,当第二电极112至少设置在第一绝缘部的顶面122时,第一孔结构可以具有两种结构。可选地,第一孔结构可以为如图8所示的通孔结构。可选地,第一孔结构可以为如图10所示的结构,在图10中,第一孔结构并非通孔结构,第一孔结构具有两个部分,两个部分的截面长度不同。In some embodiments, as shown in FIGS. 8 and 10 , when the second electrode 112 is disposed on at least the top surface 122 of the first insulating portion, the first hole structure may have two structures. Optionally, the first hole structure may be a through hole structure as shown in FIG. 8 . Optionally, the first hole structure may be the structure shown in FIG. 10 . In FIG. 10 , the first hole structure is not a through hole structure, and the first hole structure has two parts with different cross-sectional lengths.
在一些实施例中,第一孔结构和第二孔结构可以彼此独立地选择为何种结构。可选地,第一孔结构可以为通孔,第二孔结构可以为通孔。可选地,第一孔结构可以包括两个部分,第二孔结构可以包括两个部分。可选地,第一孔结构可以包括两个部分,第二孔结构可以为通孔。可选地,第一孔结构可以为通孔,第二孔结构可以包括两个部分。In some embodiments, the first pore structure and the second pore structure may be selected independently of each other. Optionally, the first hole structure may be a through hole, and the second hole structure may be a through hole. Alternatively, the first pore structure may comprise two parts and the second pore structure may comprise two parts. Alternatively, the first hole structure may include two parts, and the second hole structure may be a through hole. Alternatively, the first hole structure may be a through hole, and the second hole structure may include two parts.
在一些实施例中,如图8所示,第一孔结构为贯穿绝缘层的孔;第一电极111包括第 一欧姆接触层107和第一接触电极108,第一欧姆接触层107设置于第一孔结构的底面,至少部分第一接触电极108设置于第一孔结构中的第一欧姆接触层107上。In some embodiments, as shown in FIG. 8 , the first hole structure is a hole passing through the insulating layer; the first electrode 111 includes a first ohmic contact layer 107 and a first contact electrode 108 , and the first ohmic contact layer 107 is disposed on the first ohmic contact layer 107 . On the bottom surface of a hole structure, at least part of the first contact electrode 108 is disposed on the first ohmic contact layer 107 in the first hole structure.
在一些实施例中,以第一孔结构的靠近发光半导体的一端与第一半导体层106的表面的交线为边界,位于交线内的第一半导体层106的表面为第一孔结构的底面。可选地,第一孔结构的开口与第一孔结构的底面相对设置。In some embodiments, an intersection of the end of the first hole structure close to the light-emitting semiconductor and the surface of the first semiconductor layer 106 is used as a boundary, and the surface of the first semiconductor layer 106 located within the intersection is the bottom surface of the first hole structure . Optionally, the opening of the first hole structure is disposed opposite to the bottom surface of the first hole structure.
在一些实施例中,如图10所示,第一孔结构包括贯穿绝缘层的第一部分和第二部分,第一部分靠近发光半导体;其中,第一部分的截面长度L1和第二部分的截面长度L2不同;第一电极111包括第一欧姆接触层107和第一接触电极108,第一欧姆接触层107设置于第一部分中,至少部分第一接触电极108设置在第二部分中。In some embodiments, as shown in FIG. 10 , the first hole structure includes a first part and a second part penetrating the insulating layer, and the first part is close to the light emitting semiconductor; wherein the cross-sectional length L1 of the first part and the cross-sectional length L2 of the second part Different; the first electrode 111 includes a first ohmic contact layer 107 and a first contact electrode 108, the first ohmic contact layer 107 is provided in the first part, and at least part of the first contact electrode 108 is provided in the second part.
在一些实施例中,如图10所示,第一部分的截面长度L1大于第二部分的截面长度L2。可选地,第一部分的一端不与有源层105接触,第一部分的另一端可以延伸至发光单元100的端部。In some embodiments, as shown in FIG. 10 , the cross-sectional length L1 of the first portion is greater than the cross-sectional length L2 of the second portion. Optionally, one end of the first part is not in contact with the active layer 105 , and the other end of the first part may extend to the end of the light emitting unit 100 .
在一些实施例中,如图10所示,第二电极112位于第二绝缘部102上的部分在斜面上的投影与第一欧姆接触层107在斜面上的投影连接或交叠。In some embodiments, as shown in FIG. 10 , the projection of the portion of the second electrode 112 on the second insulating portion 102 on the inclined plane is connected or overlapped with the projection of the first ohmic contact layer 107 on the inclined plane.
本申请中,通过第一部分中的第一欧姆接触层107与第二电极112的配合,可以完全遮挡发光单元100向背光方向出射的光线。In the present application, through the cooperation of the first ohmic contact layer 107 and the second electrode 112 in the first part, the light emitted from the light emitting unit 100 toward the backlight direction can be completely blocked.
在一些实施例中,如图1、图2、图3、图4、图5、图6、图7、图8、图9、图10、图11、图12和图13所示,第一绝缘部101的材料与第二绝缘部102的材料相同或不同。可选地,图9和图10中示出了第一绝缘部101的材料与第二绝缘部102的材料相同的情形。可选地,图1、图2、图3、图4、图5、图6、图7、图8、图11、图12和图13示出了第一绝缘部101的材料和第二绝缘部102的材料不同的情形。可选地,第一绝缘部101的材料和第二绝缘部102的材料可以彼此独立地选自氮化硅、氧化硅或氮氧化硅。In some embodiments, as shown in FIGS. 1 , 2 , 3 , 4 , 5 , 6 , 7 , 8 , 9 , 10 , 11 , 12 and 13 , the first The material of the insulating portion 101 is the same as or different from the material of the second insulating portion 102 . Alternatively, FIG. 9 and FIG. 10 show a case where the material of the first insulating portion 101 is the same as the material of the second insulating portion 102 . Optionally, FIGS. 1 , 2 , 3 , 4 , 5 , 6 , 7 , 8 , 11 , 12 and 13 illustrate the material of the first insulating part 101 and the second insulating The case where the material of the part 102 is different. Optionally, the material of the first insulating part 101 and the material of the second insulating part 102 may be independently selected from silicon nitride, silicon oxide or silicon oxynitride.
在一些实施例中,如图7所示,第一电极111的顶面设置金属层或非金属层121。可选地,第一电极111的顶面为第一电极111的远离发光半导体的面。图7中只是示例性地示出了第一电极111的顶面设置非金属层121的情形。In some embodiments, as shown in FIG. 7 , the top surface of the first electrode 111 is provided with a metal layer or a non-metal layer 121 . Optionally, the top surface of the first electrode 111 is the surface of the first electrode 111 away from the light emitting semiconductor. FIG. 7 only exemplarily shows the situation where the non-metallic layer 121 is provided on the top surface of the first electrode 111 .
在一些实施例中,第一半导体层可以为N型氮化镓;可选地,第二半导体层可以为P型氮化镓。可选地,有源层可以是多量子阱结构。In some embodiments, the first semiconductor layer may be N-type gallium nitride; alternatively, the second semiconductor layer may be P-type gallium nitride. Alternatively, the active layer may be a multiple quantum well structure.
在一些实施例中,第一欧姆接触层可以是Ni-Au(Ni-Au表示第一欧姆接触层具有两层,从靠近第一半导体层到远离第一半导体层,依次为Ni层和Au层),Ni-Ag(Ni-Ag表示第一欧姆接触层具有两层,从靠近第一半导体层到远离第一半导体层,依次为Ni层和Ag层)、Cr-Al(Cr-Al表示第一欧姆接触层具有两层,从靠近第一半导体层到远离第一半 导体层,依次为Cr层和Al层)、TiN或氮化钨。In some embodiments, the first ohmic contact layer may be Ni-Au (Ni-Au means that the first ohmic contact layer has two layers, from close to the first semiconductor layer to away from the first semiconductor layer, Ni layer and Au layer in sequence ), Ni-Ag (Ni-Ag indicates that the first ohmic contact layer has two layers, from close to the first semiconductor layer to far away from the first semiconductor layer, Ni layer and Ag layer in sequence), Cr-Al (Cr-Al indicates the first semiconductor layer An ohmic contact layer has two layers, from close to the first semiconductor layer to far away from the first semiconductor layer, Cr layer and Al layer in sequence), TiN or tungsten nitride.
在一些实施例中,第二欧姆接触层可以是ITO-Ag(ITO-Ag表示第二欧姆接触层具有两层,从靠近第二半导体层到远离第二半导体层,依次为ITO层和Ag层)、Ni-Ag(Ni-Ag表示第二欧姆接触层具有两层,从靠近第二半导体层到远离第二半导体层,依次为Ni层和Ag层)、ITO-Ni-Ag(ITO-Ni-Ag表示第二欧姆接触层具有三层,从靠近第二半导体层到远离第二半导体层,依次为ITO层、Ni层和Ag层)、ITO-Cr-Al(ITO-Cr-Al表示第二欧姆接触层具有三层,从靠近第二半导体层到远离第二半导体层,依次为ITO层、Cr层和Al层)、Ni-Au(Ni-Au表示第二欧姆接触层具有两层,从靠近第二半导体层到远离第二半导体层,依次为Ni层和Au层)、TiN或氮化钨。In some embodiments, the second ohmic contact layer may be ITO-Ag (ITO-Ag means that the second ohmic contact layer has two layers, from close to the second semiconductor layer to far away from the second semiconductor layer, the order is the ITO layer and the Ag layer ), Ni-Ag (Ni-Ag means that the second ohmic contact layer has two layers, from close to the second semiconductor layer to far away from the second semiconductor layer, Ni layer and Ag layer in sequence), ITO-Ni-Ag (ITO-Ni -Ag indicates that the second ohmic contact layer has three layers, from close to the second semiconductor layer to far away from the second semiconductor layer, followed by the ITO layer, the Ni layer and the Ag layer), ITO-Cr-Al (ITO-Cr-Al indicates the first The two ohmic contact layer has three layers, from close to the second semiconductor layer to far away from the second semiconductor layer, the order is ITO layer, Cr layer and Al layer), Ni-Au (Ni-Au means that the second ohmic contact layer has two layers, From close to the second semiconductor layer to far away from the second semiconductor layer, the order is Ni layer and Au layer), TiN or tungsten nitride.
在一些实施例中,第一接触电极的材料可以包括Au、Pt、Ti、Ag、Al或Cu中的一种或至少两种。In some embodiments, the material of the first contact electrode may include one or at least two of Au, Pt, Ti, Ag, Al or Cu.
在一些实施例中,第二接触电极的材料可以包括Au、Pt、Ti、Ag、Al或Cu中的一种或至少两种。In some embodiments, the material of the second contact electrode may include one or at least two of Au, Pt, Ti, Ag, Al or Cu.
如图17所示,本公开实施例提供一种发光模组300,包括:发光单元层200,发光单元层200包括多个上述的发光单元100。As shown in FIG. 17 , an embodiment of the present disclosure provides a light-emitting module 300 , including: a light-emitting unit layer 200 , and the light-emitting unit layer 200 includes a plurality of the above-mentioned light-emitting units 100 .
在一些实施例中,多个发光单元100可以包括:发光二极管LED、迷你Mini LED、微Micro LED中至少之一。可选地,多个发光单元100可以包括至少一个LED。可选地,多个发光单元100可以包括至少一个Mini LED。可选地,多个发光单元100可以包括至少一个Micro LED。可选地,多个发光单元100可以包括至少一个LED、以及至少一个Mini LED。可选地,多个发光单元100可以包括至少一个LED、以及至少一个Micro LED。可选地,多个发光单元100可以包括至少一个Mini LED、以及至少一个Micro LED。可选地,多个发光单元100可以包括至少一个LED、至少一个Mini LED、以及至少一个Micro LED。可选地,多个发光单元100可以包括除了LED、Mini LED、Micro LED以外的其他发光器件。In some embodiments, the plurality of light emitting units 100 may include at least one of light emitting diodes LEDs, mini Mini LEDs, and micro Micro LEDs. Optionally, the plurality of light emitting units 100 may include at least one LED. Optionally, the plurality of light emitting units 100 may include at least one Mini LED. Optionally, the plurality of light emitting units 100 may include at least one Micro LED. Optionally, the plurality of light emitting units 100 may include at least one LED and at least one Mini LED. Optionally, the plurality of light emitting units 100 may include at least one LED, and at least one Micro LED. Optionally, the plurality of light emitting units 100 may include at least one Mini LED and at least one Micro LED. Optionally, the plurality of light emitting units 100 may include at least one LED, at least one Mini LED, and at least one Micro LED. Optionally, the plurality of light emitting units 100 may include other light emitting devices other than LEDs, Mini LEDs, and Micro LEDs.
在一些实施例中,可以根据工艺需求等实际情况确定发光单元100的器件类型,例如:LED、Mini LED、Micro LED或其他发光器件。In some embodiments, the device type of the light-emitting unit 100 may be determined according to actual conditions such as process requirements, for example, LED, Mini LED, Micro LED or other light-emitting devices.
在一些实施例中,多个发光单元100呈阵列排布。In some embodiments, the plurality of light emitting units 100 are arranged in an array.
以上描述和附图充分地示出了本公开的实施例,以使本领域技术人员能够实践它们。其他实施例可以包括结构的、逻辑的、电气的、过程的以及其他的改变。实施例仅代表可能的变化。除非明确要求,否则单独的部件和功能是可选的,并且操作的顺序可以变化。一些实施例的部分和特征可以被包括在或替换其他实施例的部分和特征。本公开实施例的 范围包括权利要求书的整个范围,以及权利要求书的所有可获得的等同物。当用于本申请中时,虽然术语“第一”、“第二”等可能会在本申请中使用以描述各元件,但这些元件不应受到这些术语的限制。这些术语仅用于将一个元件与另一个元件区别开。比如,在不改变描述的含义的情况下,第一元件可以叫做第二元件,并且同样地,第二元件可以叫做第一元件,只要所有出现的“第一元件”一致重命名并且所有出现的“第二元件”一致重命名即可。第一元件和第二元件都是元件,但可以不是相同的元件。而且,本申请中使用的用词仅用于描述实施例并且不用于限制权利要求。如在实施例以及权利要求的描述中使用的,除非上下文清楚地表明,否则单数形式的“一个”(a)、“一个”(an)和“所述”(the)旨在同样包括复数形式。类似地,如在本申请中所使用的术语“和/或”是指包含一个或一个以上相关联的列出的任何以及所有可能的组合。另外,当用于本申请中时,术语“包括”(comprise)及其变型“包括”(comprises)和/或包括(comprising)等指陈述的特征、整体、步骤、操作、元素,和/或组件的存在,但不排除一个或一个以上其它特征、整体、步骤、操作、元素、组件和/或这些的分组的存在或添加。在没有更多限制的情况下,由语句“包括一个…”限定的要素,并不排除在包括该要素的过程、方法或者设备中还存在另外的相同要素。本文中,每个实施例重点说明的可以是与其他实施例的不同之处,各个实施例之间相同相似部分可以互相参见。对于实施例公开的方法、产品等而言,如果其与实施例公开的方法部分相对应,那么相关之处可以参见方法部分的描述。The foregoing description and drawings sufficiently illustrate the embodiments of the present disclosure to enable those skilled in the art to practice them. Other embodiments may include structural, logical, electrical, process, and other changes. The examples represent only possible variations. Unless expressly required, individual components and functions are optional and the order of operations may vary. Portions and features of some embodiments may be included in or substituted for those of other embodiments. The scope of the disclosed embodiments includes the full scope of the claims, along with all available equivalents of the claims. When used in this application, although the terms "first," "second," etc. may be used in this application to describe various elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another. For example, without changing the meaning of the description, a first element could be termed a second element, and similarly, a second element could be termed a first element, so long as all occurrences of "the first element" were consistently renamed and all occurrences of "the first element" were named consistently The "second element" can be renamed consistently. The first element and the second element are both elements, but may not be the same element. Also, the terms used in this application are used to describe the embodiments only and not to limit the claims. As used in the description of the embodiments and the claims, the singular forms "a" (a), "an" (an) and "the" (the) are intended to include the plural forms as well, unless the context clearly dictates otherwise. . Similarly, the term "and/or" as used in this application is meant to include any and all possible combinations of one or more of the associated listings. Additionally, when used in this application, the term "comprise" and its variations "comprises" and/or including and/or the like refer to stated features, integers, steps, operations, elements, and/or The presence of a component does not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components and/or groupings of these. Without further limitation, an element qualified by the phrase "comprising a..." does not preclude the presence of additional identical elements in the process, method, or device that includes the element. Herein, each embodiment may focus on the differences from other embodiments, and the same and similar parts between the various embodiments may refer to each other. For the methods, products, etc. disclosed in the embodiments, if they correspond to the method sections disclosed in the embodiments, reference may be made to the descriptions of the method sections for relevant parts.
本领域技术人员可以意识到,结合本文中所公开的实施例描述的各示例的单元及算法步骤,能够以电子硬件、或者计算机软件和电子硬件的结合来实现。这些功能究竟以硬件还是软件方式来执行,可以取决于技术方案的特定应用和设计约束条件。本领域技术人员可以对每个特定的应用来使用不同方法以实现所描述的功能,但是这种实现不应认为超出本公开实施例的范围。本领域技术人员可以清楚地了解到,为描述的方便和简洁,上述描述的系统、装置和单元的工作过程,可以参考前述方法实施例中的对应过程,在此不再赘述。Those skilled in the art can realize that the units and algorithm steps of each example described in conjunction with the embodiments disclosed herein can be implemented by electronic hardware, or a combination of computer software and electronic hardware. Whether these functions are performed in hardware or software may depend on the specific application and design constraints of the technical solution. Skilled artisans may use different methods for implementing the described functionality for each particular application, but such implementations should not be considered beyond the scope of the disclosed embodiments. Those skilled in the art can clearly understand that, for the convenience and brevity of the description, for the working process of the above-described systems, devices and units, reference may be made to the corresponding processes in the foregoing method embodiments, which will not be repeated here.
本文所披露的实施例中,所揭露的方法、产品(包括但不限于装置、设备等),可以通过其它的方式实现。例如,以上所描述的装置实施例仅仅是示意性的,例如,单元的划分,可以仅仅为一种逻辑功能划分,实际实现时可以有另外的划分方式,例如多个单元或组件可以结合或者可以集成到另一个系统,或一些特征可以忽略,或不执行。另外,所显示或讨论的相互之间的耦合或直接耦合或通信连接可以是通过一些接口,装置或单元的间接耦合或通信连接,可以是电性,机械或其它的形式。作为分离部件说明的单元可以是或者也可以不是物理上分开的,作为单元显示的部件可以是或者也可以不是物理单元,即可以位 于一个地方,或者也可以分布到多个网络单元上。可以根据实际的需要选择其中的部分或者全部单元来实现本实施例。另外,在本公开实施例中的各功能单元可以集成在一个处理单元中,也可以是各个单元单独物理存在,也可以两个或两个以上单元集成在一个单元中。In the embodiments disclosed herein, the disclosed methods and products (including but not limited to apparatuses, devices, etc.) may be implemented in other ways. For example, the apparatus embodiments described above are only illustrative. For example, the division of units may only be a logical function division. In actual implementation, there may be other division methods. For example, multiple units or components may be combined or may be Integration into another system, or some features can be ignored, or not implemented. In addition, the shown or discussed mutual coupling or direct coupling or communication connection may be through some interfaces, indirect coupling or communication connection of devices or units, and may be in electrical, mechanical or other forms. Units described as separate components may or may not be physically separated, and components shown as units may or may not be physical units, that is, may be located in one place, or may be distributed over multiple network units. This embodiment may be implemented by selecting some or all of the units according to actual needs. In addition, each functional unit in the embodiment of the present disclosure may be integrated into one processing unit, or each unit may exist physically alone, or two or more units may be integrated into one unit.
在附图中,考虑到清楚性和描述性,可以夸大元件或层等结构的宽度、长度、厚度等。当元件或层等结构被称为“设置在”(或“安装在”、“铺设在”、“贴合在”、“涂布在”等类似描述)另一元件或层“上方”或“上”时,该元件或层等结构可以直接“设置在”上述的另一元件或层“上方”或“上”,或者可以存在与上述的另一元件或层之间的中间元件或层等结构,甚至有一部分嵌入上述的另一元件或层。In the drawings, the width, length, thickness, etc. of structures such as elements or layers may be exaggerated for clarity and descriptiveness. When an element or layer or the like is referred to as being "disposed on" (or "mounted on," "laying on," "adhering to," "coating on," and the like) another element or layer "over" or "above" When referring to “on”, the element or layer and other structures may be directly “disposed on” “above” or “on” the above-mentioned another element or layer, or there may be intervening elements or layers between the above-mentioned another element or layer, etc. structure, even partially embedded in another element or layer as described above.

Claims (20)

  1. 一种发光单元,包括:A light-emitting unit, comprising:
    发光半导体,包括依次叠层设置的第一半导体层、有源层、第二半导体层和由所述第二半导体层下陷到所述第一半导体层的下陷结构;a light-emitting semiconductor, comprising a first semiconductor layer, an active layer, a second semiconductor layer and a sunken structure recessed from the second semiconductor layer to the first semiconductor layer;
    绝缘层,包括第一绝缘部和第二绝缘部,所述第一绝缘部设置于所述第二半导体层的顶面,所述第二绝缘部设置于所述下陷结构的表面;其中,所述发光单元内设置有贯穿所述绝缘层到达所述第一半导体层的第一孔结构,以及贯穿所述绝缘层到达所述第二半导体层的第二孔结构;an insulating layer, comprising a first insulating portion and a second insulating portion, the first insulating portion is arranged on the top surface of the second semiconductor layer, and the second insulating portion is arranged on the surface of the sunken structure; wherein, the The light-emitting unit is provided with a first hole structure penetrating the insulating layer to reach the first semiconductor layer, and a second hole structure penetrating the insulating layer and reaching the second semiconductor layer;
    第一电极,所述第一电极设置在所述第一孔结构中;第二电极,所述第二电极设置在所述第二孔结构中;a first electrode, the first electrode is arranged in the first hole structure; a second electrode, the second electrode is arranged in the second hole structure;
    还满足以下条件中至少之一:Also meet at least one of the following conditions:
    所述第一电极至少设置在所述第二绝缘部的顶面;the first electrode is disposed at least on the top surface of the second insulating part;
    所述第二电极至少设置在所述第一绝缘部的顶面。The second electrode is disposed at least on the top surface of the first insulating portion.
  2. 根据权利要求1所述的发光单元,其中,所述下陷结构包括一个斜面;The light-emitting unit of claim 1, wherein the sunken structure comprises a slope;
    所述第一绝缘部设置于所述第二半导体层的顶面,所述第二绝缘部设置于所述斜面上。The first insulating portion is arranged on the top surface of the second semiconductor layer, and the second insulating portion is arranged on the inclined surface.
  3. 根据权利要求1所述的发光单元,其中,当所述第一电极至少设置在所述第二绝缘部的顶面时,所述第一孔结构为贯穿所述绝缘层的孔;所述第一电极包括第一欧姆接触层和第一接触电极,所述第一欧姆接触层设置于所述第一孔结构的底面,所述第一接触电极至少设置在所述第一孔结构中的所述第一欧姆接触层上,以及所述第二绝缘部的顶面。The light-emitting unit according to claim 1, wherein when the first electrode is disposed at least on the top surface of the second insulating portion, the first hole structure is a hole passing through the insulating layer; the first hole structure is a hole passing through the insulating layer; An electrode includes a first ohmic contact layer and a first contact electrode, the first ohmic contact layer is disposed on the bottom surface of the first hole structure, and the first contact electrode is disposed at least in all of the first hole structure. on the first ohmic contact layer and on the top surface of the second insulating portion.
  4. 根据权利要求1所述的发光单元,其中,当所述第一电极至少设置在所述第二绝缘部的顶面时,所述第一孔结构包括贯穿所述绝缘层的第一部分和第二部分,所述第一部分靠近所述发光半导体;其中,所述第一部分的截面长度和第二部分的截面长度不同;所述第一电极包括第一欧姆接触层和第一接触电极,所述第一欧姆接触层设置于所述第一部分中,所述第一接触电极至少设置在所述第二部分中,以及所述第二绝缘部的顶面。The light emitting unit of claim 1, wherein, when the first electrode is disposed on at least a top surface of the second insulating portion, the first hole structure comprises a first portion and a second portion penetrating the insulating layer part, the first part is close to the light-emitting semiconductor; wherein the cross-sectional length of the first part and the cross-sectional length of the second part are different; the first electrode includes a first ohmic contact layer and a first contact electrode, and the first An ohmic contact layer is disposed in the first portion, the first contact electrode is disposed in at least the second portion, and a top surface of the second insulating portion.
  5. 根据权利要求3或4所述的发光单元,其中,所述第二孔结构为贯穿所述绝缘层的孔;所述第二电极包括第二欧姆接触层和第二接触电极,所述第二欧姆接触层设置于所述第二孔结构的底面,至少部分所述第二接触电极设置于所述第二孔结构中的所述第二欧姆接触层上。The light-emitting unit according to claim 3 or 4, wherein the second hole structure is a hole passing through the insulating layer; the second electrode comprises a second ohmic contact layer and a second contact electrode, the second The ohmic contact layer is disposed on the bottom surface of the second hole structure, and at least part of the second contact electrode is disposed on the second ohmic contact layer in the second hole structure.
  6. 根据权利要求3或4所述的发光单元,其中,所述第二孔结构包括贯穿所述绝缘层的第三部分和第四部分,所述第三部分至少位于所述第二半导体层的顶面的部分或全部区域,所述第四部分位于所述第三部分的远离所述第二半导体层的一侧;所述第二电极包括 第二欧姆接触层和第二接触电极,所述第二欧姆接触层设置于所述第三部分中,至少部分所述第二接触电极设置在所述第四部分中。The light emitting unit of claim 3 or 4, wherein the second hole structure includes a third portion and a fourth portion penetrating the insulating layer, the third portion being located at least on top of the second semiconductor layer Part or all of the area of the surface, the fourth part is located on the side of the third part away from the second semiconductor layer; the second electrode includes a second ohmic contact layer and a second contact electrode, the first A two ohmic contact layer is provided in the third portion, and at least part of the second contact electrode is provided in the fourth portion.
  7. 根据权利要求6所述的发光单元,其中,所述第三部分还位于所述第二半导体层的侧面的部分或全部区域。The light emitting unit of claim 6, wherein the third portion is further located in part or all of a side surface of the second semiconductor layer.
  8. 根据权利要求6所述的发光单元,其中,所述第一电极还设置于所述第一绝缘部的顶面的部分区域。The light emitting unit according to claim 6, wherein the first electrode is further disposed on a partial area of the top surface of the first insulating portion.
  9. 根据权利要求8所述的发光单元,其中,所述第一电极设置于所述第一绝缘部上的部分在所述第二半导体层的顶面的所在平面的投影与所述第二欧姆接触层在所述第二半导体层的顶面的所在平面的投影连接或交叠。The light-emitting unit according to claim 8, wherein a projection of a portion of the first electrode disposed on the first insulating portion on a plane where a top surface of the second semiconductor layer is located is in contact with the second ohmic contact The layers are connected or overlapped by a projection of the plane on which the top surface of the second semiconductor layer is located.
  10. 根据权利要求1所述的发光单元,其中,当所述第二电极至少设置在所述第一绝缘部的顶面时,所述第二孔结构为贯穿所述绝缘层的孔;所述第二电极包括第二欧姆接触层和第二接触电极,所述第二欧姆接触层设置于所述第二孔结构的底面,所述第二接触电极至少设置在所述第二孔结构中的所述第二欧姆接触层上,以及设置于所述第一绝缘部的顶面。The light-emitting unit according to claim 1, wherein, when the second electrode is disposed at least on the top surface of the first insulating portion, the second hole structure is a hole passing through the insulating layer; the first The second electrode includes a second ohmic contact layer and a second contact electrode, the second ohmic contact layer is disposed on the bottom surface of the second hole structure, and the second contact electrode is disposed at least in all of the second hole structure. on the second ohmic contact layer and on the top surface of the first insulating part.
  11. 根据权利要求1所述的发光单元,其中,当所述第二电极至少设置在所述第一绝缘部的顶面时,所述第二孔结构包括贯穿所述绝缘层的第三部分和第四部分,所述第三部分至少位于所述第二半导体层的顶面的部分或全部区域,所述第四部分位于所述第三部分的远离所述第二半导体层的一侧;所述第二电极包括第二欧姆接触层和第二接触电极,所述第二欧姆接触层设置于所述第三部分中,所述第二接触电极至少设置在所述第四部分中,以及设置于所述第一绝缘部的顶面。The light emitting unit of claim 1, wherein when the second electrode is disposed on at least a top surface of the first insulating part, the second hole structure comprises a third part and a second hole penetrating through the insulating layer four parts, the third part is located at least in part or all of the top surface of the second semiconductor layer, the fourth part is located on the side of the third part away from the second semiconductor layer; the The second electrode includes a second ohmic contact layer and a second contact electrode, the second ohmic contact layer is provided in the third portion, the second contact electrode is provided at least in the fourth portion, and is provided in the top surface of the first insulating part.
  12. 根据权利要求11所述的发光单元,其中,所述第三部分还位于所述第二半导体层的侧面的部分或全部区域。The light emitting unit of claim 11, wherein the third portion is further located in part or all of a side surface of the second semiconductor layer.
  13. 根据权利要求10或11所述的发光单元,其中,所述第二电极还设置于所述第二绝缘部的顶面的部分区域。The light-emitting unit according to claim 10 or 11, wherein the second electrode is further disposed on a partial area of the top surface of the second insulating portion.
  14. 根据权利要求13所述的发光单元,其中,所述第一孔结构为贯穿所述绝缘层的孔;所述第一电极包括第一欧姆接触层和第一接触电极,所述第一欧姆接触层设置于所述第一孔结构的底面,至少部分所述第一接触电极设置于所述第一孔结构中的所述第一欧姆接触层上。The light emitting unit of claim 13, wherein the first hole structure is a hole passing through the insulating layer; the first electrode comprises a first ohmic contact layer and a first contact electrode, the first ohmic contact The layer is disposed on the bottom surface of the first hole structure, and at least part of the first contact electrode is disposed on the first ohmic contact layer in the first hole structure.
  15. 根据权利要求13所述的发光单元,其中,所述第一孔结构包括贯穿所述绝缘层的第一部分和第二部分,所述第一部分靠近所述发光半导体;其中,所述第一部分的截面长度和第二部分的截面长度不同;所述第一电极包括第一欧姆接触层和第一接触电极,所述 第一欧姆接触层设置于所述第一部分中,至少部分所述第一接触电极设置在所述第二部分中。The light emitting unit of claim 13, wherein the first hole structure includes a first portion and a second portion penetrating the insulating layer, the first portion being adjacent to the light emitting semiconductor; wherein a cross section of the first portion The length is different from the cross-sectional length of the second part; the first electrode includes a first ohmic contact layer and a first contact electrode, the first ohmic contact layer is arranged in the first part, and at least part of the first contact electrode set in the second part.
  16. 根据权利要求15所述的发光单元,其中,所述第二电极位于所述第二绝缘部上的部分在所述斜面上的投影与所述第一欧姆接触层在所述斜面上的投影连接或交叠。The light-emitting unit according to claim 15, wherein the projection of the part of the second electrode on the second insulating part on the slope is connected to the projection of the first ohmic contact layer on the slope or overlapping.
  17. 根据权利要求1所述的发光单元,其中,所述第一绝缘部的材料与所述第二绝缘部的材料相同或不同。The light emitting unit of claim 1, wherein a material of the first insulating portion is the same as or different from a material of the second insulating portion.
  18. 根据权利要求1所述的发光单元,其中,所述第一电极的顶面设置金属层或非金属层。The light emitting unit according to claim 1, wherein a metal layer or a non-metal layer is provided on the top surface of the first electrode.
  19. 一种发光模组,包括:发光单元层,所述发光单元层包括多个如权利要求1至18中任一项所述的发光单元。A light-emitting module, comprising: a light-emitting unit layer, wherein the light-emitting unit layer includes a plurality of light-emitting units according to any one of claims 1 to 18.
  20. 根据权利要求19所述的发光模组,其中,多个所述发光单元,包括:The light-emitting module according to claim 19, wherein the plurality of light-emitting units comprise:
    发光二极管LED、迷你发光二极管Mini LED、微发光二极管Micro LED中至少之一。At least one of light-emitting diode LED, mini light-emitting diode Mini LED, and micro light-emitting diode Micro LED.
PCT/CN2022/081058 2021-03-23 2022-03-16 Light-emitting unit and light-emitting module WO2022199433A1 (en)

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