WO2022194341A1 - Carrier for transporting an object in a vacuum chamber, method of manufacturing a carrier, carrier transport system, and vacuum processing apparatus - Google Patents
Carrier for transporting an object in a vacuum chamber, method of manufacturing a carrier, carrier transport system, and vacuum processing apparatus Download PDFInfo
- Publication number
- WO2022194341A1 WO2022194341A1 PCT/EP2021/056515 EP2021056515W WO2022194341A1 WO 2022194341 A1 WO2022194341 A1 WO 2022194341A1 EP 2021056515 W EP2021056515 W EP 2021056515W WO 2022194341 A1 WO2022194341 A1 WO 2022194341A1
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- WIPO (PCT)
- Prior art keywords
- carrier
- magnet holder
- passive magnetic
- unit
- recesses
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 230000005291 magnetic effect Effects 0.000 claims abstract description 96
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- 238000000034 method Methods 0.000 claims description 20
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- 229910001220 stainless steel Inorganic materials 0.000 claims description 5
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- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
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- 238000004140 cleaning Methods 0.000 description 1
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- 230000006866 deterioration Effects 0.000 description 1
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- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67709—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using magnetic elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
Definitions
- Embodiments of the present disclosure relate to apparatuses and methods for transportation of carriers, particularly carriers used for carrying large area substrates. More specifically, embodiments of the present disclosure relate to apparatuses and methods for transportation of carriers employable in processing apparatuses for vertical substrate processing, e.g. material deposition on large area substrates for display production. In particular, embodiments of the present disclosure relate to carrier transport systems, vacuum processing apparatuses, and methods of transporting a carrier in a vacuum chamber.
- An in-line processing system includes a plurality of subsequent processing modules, such as deposition modules and optionally further processing modules, e.g., cleaning modules and/or etching modules, wherein processing aspects are subsequently conducted in the processing modules, such that a plurality of substrates can continuously or quasi-continuously be processed in the in-line processing system.
- subsequent processing modules such as deposition modules and optionally further processing modules, e.g., cleaning modules and/or etching modules, wherein processing aspects are subsequently conducted in the processing modules, such that a plurality of substrates can continuously or quasi-continuously be processed in the in-line processing system.
- the substrate is typically carried by a carrier, i.e. a carrying device for carrying the substrate.
- the carrier is typically transported through a vacuum system using a carrier transport system.
- the carrier transport system may be configured for conveying the carrier carrying the substrate along one or more transport paths.
- the carriers may be guided by rollers and the stronger the load on the rollers, the larger the risk of particle generation, and the shorter the lifetime of the rollers.
- Fully contactless floating carrier transportation systems are complicated and expensive. Magnetic levitation systems with permanent magnets are difficult to realize. At least one degree of freedom has to be stabilized mechanically or with guide elements to overcome Earnshaw’ s theorem.
- a carrier for transporting an object in a vacuum chamber a carrier transport system for transporting a carrier within a vacuum chamber, an apparatus for vacuum processing of a substrate, a method of manufacturing a carrier for transporting an object, and a method of manufacturing a coated substrate according to the independent claims are provided. Further aspects, advantages, and features are apparent from the dependent claims, the description, and the accompanying drawings.
- a carrier for transporting an object in a vacuum chamber includes a first passive magnetic unit provided at a top of the carrier. Additionally, the carrier includes a second passive magnetic unit provided at a bottom or a lateral side of the carrier. At least one of the first passive magnetic unit and the second passive magnetic unit includes a magnet holder having a plurality of recesses being arranged in a cross direction with respect to a longitudinal extension of the magnet holder. Additionally, the second passive magnetic unit includes a plurality of permanent magnets arranged in the plurality of recesses. Further, the second passive magnetic unit includes a holding sheet covering the plurality of permanent magnets.
- a carrier transport system for transporting a carrier within a vacuum chamber.
- the carrier transport system includes a magnetic levitation unit extending in a transport direction.
- the magnetic levitation unit is configured for exerting a levitation force on the carrier.
- the carrier transport system includes a magnetic drive unit having a plurality of active magnets for exerting a driving force on the carrier in the transport direction.
- the carrier transport system includes the carrier according to any of any embodiments described herein.
- an apparatus for vacuum processing of a substrate includes a vacuum chamber, a processing device provided in the vacuum chamber, and a carrier transport system according to any embodiments described herein.
- a method of manufacturing a carrier for transporting an object includes fixing a first passive magnetic unit to a top of a main body of the carrier.
- the main body has a holding section configured for vertically holding the flat object.
- the method includes fixing a second passive magnetic unit to a bottom or a lateral side of the main body of the carrier.
- At least one of the first passive magnetic unit and the second passive magnetic unit includes a magnet holder having a plurality of recesses being arranged in a cross direction with respect to a longitudinal extension of the magnet holder.
- at least one of the first passive magnetic unit and the second passive magnetic unit includes a plurality of permanent magnets arranged in the plurality of recesses.
- a method of coating a substrate particularly for manufacturing an electronic device.
- the electronic device may be an opto-electronical device, e.g. a display.
- the method of coating the substrate includes using at least one of a carrier according to any embodiments described herein, a substrate processing system according to any embodiments described herein, a carrier transport system according to any embodiments described herein, and an apparatus for vacuum processing of a substrate according to any embodiments described herein.
- Embodiments are also directed at apparatuses for carrying out the disclosed methods and include apparatus parts for performing each described method aspect. These method aspects may be performed by way of hardware components, a computer programmed by appropriate software, by any combination of the two or in any other manner. Furthermore, embodiments according to the disclosure are also directed at methods for operating the described apparatus. The methods for operating the described apparatus include method aspects for carrying out every function of the apparatus.
- FIG. 1A shows a schematic front view of a carrier for transporting an object according to embodiments described herein;
- FIG. IB shows a schematic side view of a carrier for transporting an object according to embodiments described herein;
- FIG. 2 shows a schematic view of a magnet holder of a carrier according to embodiments described herein
- FIG. 3 shows a bottom portion of a carrier with the second passive magnetic unit according to embodiments described herein;
- FIG. 4 shows a schematic view of a carrier transport system according to embodiments described herein;
- FIG. 5 shows a schematic view of an apparatus for vacuum processing according to embodiments described herein.
- FIGS. 6 A and 6B show block diagrams for illustrating embodiments of a method of manufacturing a carrier for transporting an object according the present disclosure.
- the carrier 100 includes a first passive magnetic unit 110 provided at a top 101 of the carrier 100. Additionally, the carrier 100 includes a second passive magnetic unit 120 provided at a bottom 102 or a lateral side of the carrier 100. At least one of the first passive magnetic unit 110 and the second passive magnetic unit 120 includes a magnet holder 121 having a plurality of recesses 122. The plurality of recesses 122 are arranged in a cross direction with respect to a longitudinal extension L of the magnet holder 10.
- the second passive magnetic unit 120 includes a plurality of permanent magnets 123 arranged in the plurality of recesses 122. Further, the second passive magnetic unit 120 includes a holding sheet 124 covering the plurality of permanent magnets 123. It is to be understood that the holding sheet 124 may also protect the plurality of permanent magnets 123.
- embodiments of the carrier as described herein are beneficially improved with respect to the prior art, particularly with respect to durability. Further, the carrier as described herein beneficially provides for a reduction in manufacturing and maintenance costs. Yet further, manufacturing and mounting of the carrier is facilitated.
- a “carrier” can be understood as a carrying device configured for carrying an object, e.g. a substrate or a mask, through a vacuum environment.
- the carrier can be a substrate carrier or a mask carrier used in a processing system, e.g. for vertically processing a substrate.
- the carrier may include a carrier body and a holding section.
- the holding section may include a holding device, e.g. a mechanical, electrostatic, or magnetic chucking device, configured for holding the object, e.g. the substrate or the mask, at an object support surface of the carrier body.
- the carrier may be configured to carry a large- area substrate, i.e. a substrate having a size of 1 m 2 or more, particularly 5 m 2 or more, or even 8 m 2 or more.
- the term “substrate” may particularly embrace substantially inflexible substrates, e.g., a wafer, slices of transparent crystal such as sapphire or the like, or a glass plate.
- the present disclosure is not limited thereto, and the term “substrate” may also embrace flexible substrates such as a web or a foil.
- the term “substantially inflexible” is understood to distinguish over “flexible”.
- a substantially inflexible substrate can have a certain degree of flexibility, e.g. a glass plate having a thickness of 0.5 mm or below, wherein the flexibility of the substantially inflexible substrate is small in comparison to the flexible substrates.
- the substrate may be made of any material suitable for material deposition.
- the substrate may be made of a material selected from the group consisting of glass (for instance soda-lime glass, borosilicate glass etc.), metal, polymer, ceramic, compound materials, carbon fiber materials or any other material or combination of materials which can be coated by a deposition process.
- the carrier 10 can be a substrate carrier or a mask carrier.
- the carrier can be a substrate carrier for large area substrates or a mask carrier for masks employed for masking large area substrates.
- the term “large area substrate” refers to a substrate having a main surface with an area of 0.5 m 2 or larger, particularly of 1 m 2 or larger.
- a large area substrate can be GEN 4.5, which corresponds to about 0.67 m 2 of substrate (0.73 mx0.92 m), GEN 5, which corresponds to about 1.4 m 2 of substrate (1.1 m x 1.3 m), GEN 7.5, which corresponds to about 4.29 m 2 of substrate (1.95 m x 2.2 m), GEN 8.5, which corresponds to about 5.7 m 2 of substrate (2.2 m x 2.5 m), or even GEN 10, which corresponds to about 8.7 m 2 of substrate (2.85 m x 3.05 m). Even larger generations such as GEN 11 and GEN 12 and corresponding substrate areas can similarly be implemented.
- the plurality of recesses 122 provide for a plurality of protrusions 125.
- the protrusions 125 prevent shifting of the plurality of permanent magnets 123 in the longitudinal direction of the longitudinal extension L of the magnet holder 10.
- the plurality of recesses 122 beneficially provide for securing a position of the plurality of permanent magnets 123, such that the plurality of permanent magnets 123 are fixed in the longitudinal direction of the magnet holder 121.
- the longitudinal direction of the longitudinal extension L of the magnet holder 10 corresponds to a transport direction T of the carrier.
- the transport direction T is exemplarily indicated in FIGS. 1A and IB.
- the transport direction T is a horizontal direction.
- the holding sheet 124 secures the vertical position of the plurality of permanent magnets 123.
- the vertical direction V is exemplarily indicated in FIGS. 1A and IB.
- the holding sheet 124 is fixed to the magnet holder 121.
- the holding sheet 124 can be fixed to the magnet holder 121 via a plurality of flaps 127 of the holding sheet 124 which are arranged in a plurality of receptions 126, as exemplarily shown in FIGS. 2 and 3.
- the plurality of flaps 127 may be clamped between the second side 121B of the magnet holder 121 and the bottom 103B of the main body 103, e.g. via an intermediate element 130, particularly an intermediate element of elastic material, such as an O-Ring.
- the holding sheet 124 can be fixed to the magnet holder 121 by employing other fixation techniques, e.g. bolts.
- the bolts can be applied from the sides, i.e. laterally mounted.
- the carrier 100 includes a holding section 104 configured for vertically holding the flat object 10.
- the flat object 10 can be a substrate to be processed or a mask for masking a substrate to be processed.
- FIG. 2 shows a schematic view of a magnet holder 121 of a carrier 100 according to embodiments described herein.
- the magnet holder 121 is made of ferromagnetic material.
- the magnet holder 121 can be made of ferromagnetic stainless steel. Accordingly, beneficially the plurality of permanent magnets 123 can be attached to the magnet holder 121 by magnetic forces, such that usage of adhesives as typically employed in the state of the art can be avoided.
- the magnet holder 121 is a single piece structure.
- the plurality of protrusions 125 may be machined, particularly milled, into the single piece structure. Accordingly, it is to be understood that typically the magnet holder 121 with the plurality of recesses 122 and the plurality of protrusions 125 is an integral single piece.
- the plurality of protrusions 125 have a protrusion height Hp, the protrusion height Hp being Hp ⁇ 0.2 x HM, wherein HM is the height of the permanent magnets 123.
- the protrusion height Hp can beHp ⁇ 0.15 x HM, more particularly Hp ⁇ 0.10 x HM.
- the protrusion height Hp may be selected from an interval between a lower protrusion height limit HPL and an upper protrusion height limit Hpu, i.e. HPL ⁇ Hp ⁇ Hpu.
- the plurality of recesses 122 are provided on a first side 121 A of the magnet holder 121.
- the first side 121 A of the magnet holder 121 is a bottom side of the magnet holder 121, as exemplarily shown in FIG.2.
- the second side 121B of the magnet holder 121 opposite the first side 121 A may include a plurality of receptions 126.
- the plurality of receptions 126 are configured for receiving a plurality of flaps 127 of the holding sheet 124, as exemplarily shown in FIG. 3. From FIG.
- a plurality of flaps 127 of the holding sheet 124 can be used for fixing the holding sheet 124 to the magnet holder 121.
- the magnet holder 121 is attached to a bottom 103B of a main body 103 of the carrier 10. Additionally or alternatively, the magnet holder 121 can be attached to a top 103T of the main body 103 of the carrier 10. Additionally or alternatively, the magnet holder 121 may be attached to a lateral side of the main body 103 of the carrier 10, particularly a lower lateral side of the main body 103 of the carrier 10.
- the holding sheet 124 is made of non- ferromagnetic material.
- the holding sheet 124 can be made of non-ferromagnetic stainless steel.
- the holding sheet 124 is a metal sheet having a thickness of less than or equal to 0.5 mm, particularly less than or equal to 0.3 mm, for example 0.2 mm ⁇ 0.05 mm, more particularly 0.1 mm ⁇ 0.25 mm.
- the holding sheet 124 is an integral single piece structure, which may be bent or formed into shape.
- the first passive magnetic unit 110 is configured to interact with a magnetic levitation unit 210 of a carrier transport system 200.
- the magnetic levitation unit 210 is configured for generating a carrier levitation force FL counteracting a weight force of the carrier 100.
- the second passive magnetic unit 120 is configured to interact with a magnetic drive unit 220 of the carrier transport system 200.
- the drive unit 220 is configured to move the carrier in a transport direction T.
- a “transport system for transporting a carrier” can be understood as a system or apparatus configured for moving a carrier along a transport path in a transport direction T.
- the transport system may be configured for transporting an essentially vertically oriented carrier.
- “Essentially vertically” as used herein may encompass a deviation of 10° or less from an exactly vertical orientation.
- the carrier transport system 200 includes a magnetic levitation unit 210 extending in a transport direction T.
- the magnetic levitation unit 210 is configured for exerting a levitation force on the carrier 100.
- typically the magnetic levitation unit 210 is arranged above the carrier 10 to be transported, particularly opposite the first passive magnetic unit 110. More specifically, the magnetic levitation unit 210 is arranged to interact with the first passive magnetic unit 110 provided at a top 101 of the carrier 100.
- the first passive magnetic unit 110 includes one or more passive magnetic elements made of a ferromagnetic material and may have permanent magnetic properties.
- a “passive magnetic unit” as used herein may be understood as a magnet which is not actively controlled, e.g. via a feedback control.
- a “passive magnetic unit” may include one or more permanent magnets.
- a “passive magnetic element” or “passive magnet” may include one or more electromagnets which may not be actively controlled.
- a “magnetic levitation unit” can be understood as a unit configured for holding an object, e.g. a carrier as described herein, in a contactless manner by using magnetic force.
- the term “levitating” or “levitation” refers to a state of an object, e.g. a carrier carrying a substrate or a mask, wherein the object floats without mechanical contact or support. Accordingly, in other words, typically the magnetic levitation unit is configured for contactlessly levitating a carrier as described herein.
- “contactlessly levitating” can be understood in the sense that a weight, e.g. the weight of a carrier, particularly the weight of a carrier carrying a substrate or a mask, is not held by a mechanical contact or mechanical forces, but is held by a magnetic force.
- the term “contactless” can be understood in that a carrier is held in a levitating or floating state using magnetic forces instead of mechanical forces, i.e. contact forces.
- the magnetic levitation unit 210 includes one or more electromagnetic actuators.
- the one or more electromagnetic actuators are controllable electromagnets.
- the magnetic field of the one or more electromagnetic actuators may be actively controllable for maintaining and / or adjusting the distance between the magnetic levitation unit and the carrier.
- the carrier transport system 200 includes a magnetic drive unit 220 having a plurality of active magnets for exerting a driving force on the carrier 100 in the transport direction T.
- the magnetic drive unit 220 is arranged below the carrier 10 to be transported, particularly opposite the second passive magnetic unit 120, as exemplarily shown in FIG. 4. It is to be understood that typically the second passive magnetic unit 120 is configured as the first passive magnetic unit 110.
- the magnetic drive unit 220 includes one or more electromagnets which may represent a stator part of an electromagnetic linear motor.
- the one or more electromagnets of the drive unit 220 are arranged to interact with one or more passive magnetic elements of the second passive magnetic unit 120.
- the one or more passive magnetic elements of the second passive magnetic unit 120 can be made of a ferromagnetic material and may have permanent magnetic properties. It is to be understood, that although not explicitly shown, the drive unit can be arranged above and/or lateral of a correspondingly adapted carrier.
- a “magnetic drive unit” can be understood as a unit configured for moving a carrier as described herein in the transport direction.
- the drive unit as described herein may be configured to generate a magnetic force acting on the carrier in the transport direction T.
- the drive unit can be a linear motor.
- a drive unit for moving or transporting the carrier can be understood as a unit configured for providing a driving force, e.g. a force in a direction different from the levitation force, wherein the carrier is moved from one position to another, different position, for example a different position along the transport direction.
- the carrier may carry a substrate or a mask and can be levitated by the magnetic levitation unit, i.e. by a force counteracting gravity.
- the device can be moved by the drive unit in the transport direction T (different from a direction parallel to gravity) while being levitated.
- the carrier transport system 200 typically includes the carrier 100 according to any embodiments described herein.
- the apparatus 300 for vacuum processing includes a vacuum chamber 301, a processing device 310 provided in the vacuum chamber 301, and a carrier transport system 200 according to any embodiments described herein.
- vacuum can be understood in the sense of a technical vacuum having a vacuum pressure of less than, for example, 10 mbar.
- the pressure in a vacuum chamber as described herein may be between 10 3 mbar and about 10 11 mbar, more typically between 10 8 mbar and 10 11 mbar, or even less than 10 11 mbar.
- the carrier transport system 200 includes a magnetic levitation unit 210 extending in a transport direction T.
- the magnetic levitation unit 210 is configured for exerting a levitation force on the carrier 100.
- the carrier transport system 200 includes a magnetic drive unit 220 having a plurality of active magnets for exerting a driving force on the carrier 100 in the transport direction T.
- the carrier transport system 200 includes the carrier 100 according to any embodiments described herein.
- the processing device 310 may be selected from the group consisting of a deposition source, an evaporation source, and a sputter source, or other processing devices used for the processing of large area substrates employed for display manufacturing.
- the processing device 310 is a deposition source, wherein a material to be deposited is indicated by dotted arrows 311.
- the method 400 includes fixing (represented by block 410 in FIGS. 6A and 6B) a first passive magnetic unit 110 to a top 103T of a main body 103 of the carrier 10.
- the main body has a holding section 104 configured for vertically holding the flat object 10.
- the method 400 includes fixing (represented by block 420 in FIGS. 6A and 6B) a second passive magnetic unit 120 to a bottom 103B of the main body 103 of the carrier 10.
- the second passive magnetic unit 120 includes a magnet holder 121, a plurality of permanent magnets 123, and a holding sheet 124.
- the magnet holder 121 includes a plurality of recesses 122 which are arranged in a cross direction with respect to a longitudinal extension L of the magnet holder 121.
- the plurality of permanent magnets 123 are arranged in the plurality of recesses 122.
- the holding sheet 124 covers the plurality of permanent magnets 123.
- the method 400 further includes manufacturing (represented by block 401 in Fig. 6B) the second passive magnetic unit 120.
- manufacturing 401 the second passive magnetic unit 120 typically includes producing (represented by block 402 in Fig. 6B) a magnet holder 121 according to embodiments described herein.
- producing 402 the magnet holder includes machining (represented by block 403 in Fig. 6B), particularly milling, a plurality of recesses 122 in a magnet holder body such that the plurality of recesses 122 are arranged in a cross direction with respect to a longitudinal extension L of the magnet holder 121.
- the magnet holder body is an elongated block of material, particularly ferromagnetic material (e.g. ferromagnetic stainless steel).
- ferromagnetic material e.g. ferromagnetic stainless steel.
- the plurality of recesses 122 can be arranged perpendicular with respect to the longitudinal direction of the longitudinal extension L.
- the plurality of recesses 122 may have an orientation which is perpendicular, i.e. 90°, with respect to the longitudinal direction.
- the plurality of recesses 122 can have an orientation which deviates from perpendicularity with respect to the longitudinal direction, for example by 2° or less, 5° or less, or 10° or less.
- the plurality of recesses 122 can have an orientation which deviates from perpendicularity with respect to the longitudinal direction by a deviation angel a which may be selected from an interval between a lower deviation angel limit OIL and an upper deviation angel limit au, i.e. OIL £ a ⁇ au.
- manufacturing 401 the second passive magnetic unit 120 typically includes arranging (represented by block 404 in Fig. 6B) a plurality of permanent magnets 123 in the plurality of recesses 122. Moreover, manufacturing 401 the second passive magnetic unit 120 includes securing (represented by block 405) in Fig. 6B) the vertical position of the plurality of permanent magnets 123 by a holding sheet 124 covering the plurality of permanent magnets 123. As exemplarily described with reference to FIG. 3, the holding sheet 124 may be fixed to the magnet holder 121 by arranging a plurality of flaps 127 of the holding sheet 124 in a corresponding plurality of receptions 126 as exemplarily described with reference to FIGS 2 and 3.
- embodiments of the present disclosure beneficially provide a carrier for transporting an object in a vacuum chamber, a carrier transport system for transporting a carrier within a vacuum chamber, as well as an apparatus for vacuum processing of a substrate which are improved compared to the state of the art. Further, an improved method of manufacturing a carrier for transporting an object and a method of manufacturing a coated substrate are provided.
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Abstract
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Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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PCT/EP2021/056515 WO2022194341A1 (en) | 2021-03-15 | 2021-03-15 | Carrier for transporting an object in a vacuum chamber, method of manufacturing a carrier, carrier transport system, and vacuum processing apparatus |
CN202180095761.8A CN117099193A (en) | 2021-03-15 | 2021-03-15 | Carrier for transporting objects in a vacuum chamber, method for manufacturing a carrier, carrier transport system and vacuum treatment device |
KR1020237034658A KR20230154081A (en) | 2021-03-15 | 2021-03-15 | Carrier for transporting objects in a vacuum chamber, method of manufacturing the carrier, carrier transport system, and vacuum processing device |
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PCT/EP2021/056515 WO2022194341A1 (en) | 2021-03-15 | 2021-03-15 | Carrier for transporting an object in a vacuum chamber, method of manufacturing a carrier, carrier transport system, and vacuum processing apparatus |
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KR (1) | KR20230154081A (en) |
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Citations (3)
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EP0848412A2 (en) * | 1996-12-11 | 1998-06-17 | Applied Materials, Inc. | Wafer extraction platform |
US20100073653A1 (en) * | 2008-09-22 | 2010-03-25 | Nikon Corporation | Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method |
WO2017050350A1 (en) * | 2015-09-21 | 2017-03-30 | Applied Materials, Inc. | Substrate carrier, and sputter deposition apparatus and method using the same |
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2021
- 2021-03-15 WO PCT/EP2021/056515 patent/WO2022194341A1/en active Application Filing
- 2021-03-15 KR KR1020237034658A patent/KR20230154081A/en active Search and Examination
- 2021-03-15 CN CN202180095761.8A patent/CN117099193A/en active Pending
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EP0848412A2 (en) * | 1996-12-11 | 1998-06-17 | Applied Materials, Inc. | Wafer extraction platform |
US20100073653A1 (en) * | 2008-09-22 | 2010-03-25 | Nikon Corporation | Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method |
WO2017050350A1 (en) * | 2015-09-21 | 2017-03-30 | Applied Materials, Inc. | Substrate carrier, and sputter deposition apparatus and method using the same |
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