WO2022182157A1 - Composition de résine photosensible pour former des parois de séparation, structure de paroi de séparation fabriquée à l'aide de celle-ci, et dispositif d'affichage comprenant des parois de séparation - Google Patents

Composition de résine photosensible pour former des parois de séparation, structure de paroi de séparation fabriquée à l'aide de celle-ci, et dispositif d'affichage comprenant des parois de séparation Download PDF

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Publication number
WO2022182157A1
WO2022182157A1 PCT/KR2022/002700 KR2022002700W WO2022182157A1 WO 2022182157 A1 WO2022182157 A1 WO 2022182157A1 KR 2022002700 W KR2022002700 W KR 2022002700W WO 2022182157 A1 WO2022182157 A1 WO 2022182157A1
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Prior art keywords
resin composition
photosensitive resin
forming
pigment
barrier rib
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Ceased
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PCT/KR2022/002700
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English (en)
Korean (ko)
Inventor
권민정
김훈식
이재을
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Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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Priority to CN202280014788.4A priority Critical patent/CN116848465A/zh
Publication of WO2022182157A1 publication Critical patent/WO2022182157A1/fr
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013—Fillers, pigments or reinforcing additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0041—Optical brightening agents, organic pigments
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/02—Ingredients treated with inorganic substances
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/04—Ingredients treated with organic substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C08K2003/2237—Oxides; Hydroxides of metals of titanium
    • C08K2003/2241—Titanium dioxide

Definitions

  • the present invention relates to a photosensitive resin composition for forming barrier ribs, a barrier rib structure manufactured using the same, and a display device including the barrier rib structure.
  • a display manufactured using a low temperature process will have great characteristics compared to a display manufactured using a previous high temperature process.
  • it is difficult to proceed with the high-temperature process because the OLED is vulnerable to heat. Therefore, if each is manufactured and later bonded together to manufacture a display, it is difficult to manufacture a flexible or rollable display. Therefore, it is necessary to form a color conversion pixel through a photolithography process on the upper portion of the OLED panel, and the demand for a low-temperature process to form the color conversion pixel is increasing.
  • a barrier rib is formed between each color conversion pixel to prevent color mixing of each color conversion pixel. Due to the conversion efficiency of the color conversion pixel, the barrier rib between each color conversion pixel is about 3 ⁇ m It is formed to a film thickness of 15 ⁇ m to 15 ⁇ m.
  • the conventional photosensitive resin composition for a black matrix has no problem in forming a pattern when the film thickness produced as before is 1 ⁇ m to 1.5 ⁇ m, but the barrier rib of the color conversion pixel has a film thickness of 3 ⁇ m to It is not preferable because it has to be formed to be 15 ⁇ m.
  • the barrier rib is formed of a thick film using the conventional black matrix, there is a problem in that light is not irradiated to the lower end of the pattern due to a decrease in transmittance of ultraviolet (UV) light during the exposure process. Furthermore, since the lower portion of the film is not photocured, the undercut phenomenon is severely induced after the development process, and there is a disadvantage in that the process margin is vulnerable.
  • UV ultraviolet
  • the photosensitive resin composition for a black matrix when the partition wall of the color conversion pixel is manufactured, if the photosensitive resin composition for a black matrix is used, it is difficult to recognize the lower align key when aligning the mask pattern in the exposure process after the coating process. There is a problem in that it is difficult to form a pattern. Therefore, there is a limit to the photosensitive resin composition for a black matrix that is conventionally used as a material for forming the partition wall of the color conversion pixel.
  • the partition wall of the color conversion pixel is manufactured and subjected to a thermal process in a subsequent process. If the reliability such as solvent resistance of the partition wall is low, residues are generated inside the partition wall in the thermal process of manufacturing and passing the partition wall, so that the efficiency of the color conversion pixel And there is a problem of shortening the lifespan.
  • Korean Patent Application Laid-Open No. 10-2007-0094460 aims to provide a photosensitive resin composition for forming a barrier rib having excellent shape stability against heat, but the problem as described above cannot be overcome.
  • the present invention is to improve the above-mentioned prior art problems, and to provide a photosensitive resin composition for forming a barrier rib having excellent reliability such as solvent resistance, no residue other than the pattern forming part, and excellent tapered process characteristics for the purpose of
  • the present invention satisfies the transmittance and reflectance in a specific wavelength band to prevent color mixing of the color conversion panel, improve resolution and light efficiency, and facilitate recognition of an alignment key, photosensitivity for barrier rib formation It is an object of the invention to provide a resin composition.
  • Another object of the present invention is to provide a barrier rib structure and a display device manufactured by using the photosensitive resin composition for forming barrier ribs.
  • the present invention relates to (A) a colorant; (B) alkali-soluble resin; (C) a photopolymerizable compound; (D) a photoinitiator; and (E) a photosensitive resin composition for forming a barrier rib comprising a solvent, wherein the cured film prepared from the photosensitive resin composition has a transmittance of 20% or less at a wavelength of 450 nm when the cured film has a thickness of 3 ⁇ m to 15 ⁇ m, 550 and a reflectance of 10% or more at a wavelength of 650 nm, and a transmittance of 70% or more at a wavelength of 900 nm, providing a photosensitive resin composition for forming a barrier rib.
  • the present invention provides a barrier rib structure made of the photosensitive resin composition for forming barrier ribs and a display device including the same.
  • the photosensitive resin composition for forming a barrier rib and the barrier rib structure according to the present invention can provide effects such as excellent reliability such as solvent resistance, no residue other than the pattern forming part, and excellent tapered process characteristics.
  • the photosensitive resin composition for forming a barrier rib and the barrier rib structure according to the present invention can prevent color mixing of the color conversion panel by satisfying the transmittance and reflectance conditions in a specific wavelength band, improve resolution and light efficiency, and provide an alignment key ( Alignment key) may provide an easy recognition effect.
  • FIG. 1 is a view showing transmittance and reflectance spectra of a barrier rib pattern cured film prepared from a photosensitive resin composition for forming barrier ribs according to Examples 1 and 3 of the present invention.
  • FIG. 2 is a view showing transmittance and reflectance spectra of a barrier rib pattern cured film prepared from the photosensitive resin composition for forming barrier ribs according to Comparative Example 2 of the present invention.
  • FIG. 3 is a diagram illustrating a method of measuring a tapered shoulder angle of a barrier rib pattern cured film prepared from a photosensitive resin composition for forming barrier ribs according to Examples and Comparative Examples of the present invention.
  • FIG. 4 is a diagram illustrating criteria for evaluating residual properties of a barrier rib pattern cured film prepared from a photosensitive resin composition for forming barrier ribs according to Examples and Comparative Examples of the present invention.
  • the present invention relates to (A) a colorant; (B) alkali-soluble resin; (C) a photopolymerizable compound; (D) a photoinitiator; and (E) a photosensitive resin composition for forming a barrier rib comprising a solvent, wherein the cured film prepared from the photosensitive resin composition has a transmittance of 20% or less at a wavelength of 450 nm when the cured film has a thickness of 3 ⁇ m to 15 ⁇ m, 550 and a photosensitive resin composition for forming a barrier rib having a reflectance of 10% or more at a wavelength of 650 nm and a transmittance of 70% or more at a wavelength of 900 nm, a barrier rib structure made of the photosensitive resin composition for forming the barrier rib, and a display device comprising the same .
  • the maximum transmittance at a wavelength of 450 nm is 20% or less, preferably 15% or less, more preferably 10% may be below.
  • the cured film prepared from the photosensitive resin composition when the thickness of the cured film is 3 ⁇ m to 15 ⁇ m, the minimum value of reflectance at 550 and 650 nm wavelength is 10% or more, preferably 15% or more, more preferably 20 % or more.
  • the maximum transmittance at a wavelength of 900 nm may be 70% or more, preferably 80% or more.
  • the photosensitive resin composition for partition formation which concerns on this invention, (A) a coloring agent; (B) alkali-soluble resin; (C) a photopolymerizable compound; (D) a photoinitiator; and (E) a solvent.
  • the colorant included in the photosensitive resin composition for forming a barrier rib according to the present invention may include at least one of (a1) a white pigment, (a2) a black pigment, and (a3) a yellow pigment, preferably (a1) ) may include a white pigment, (a2) a black pigment, and (a3) a yellow pigment.
  • the transmittance is controlled by controlling the content of only the black pigment.
  • the content of the white pigment required to increase the reflectance is greatly increased, the total content of the total pigment in the photosensitive resin composition is increased, and the process stability of alkali-soluble resins and photopolymerizable compounds is affected.
  • the content of the given component was lowered, there was a problem in that the process characteristics of the photosensitive resin composition were deteriorated.
  • the photosensitive resin composition according to the present invention includes (a1) a white pigment, (a2) a black pigment, and (a3) a yellow pigment, it is possible to effectively control the light leakage phenomenon as well as to increase the light efficiency of the pixel, and the reflectance As the amount of the white pigment required to secure the white pigment decreases, the total amount of the pigment in the composition decreases, which is preferable because it is possible to provide an effect of improving process characteristics.
  • the white pigment is for the reflective characteristics of the barrier rib structure, and specifically, it improves the reflectivity of the barrier rib structure with respect to light of a red and/or green wavelength, so that light generated from the color conversion element is directed toward the barrier rib. By reflecting light in a wavelength range, luminance can be improved.
  • the average particle size of the white pigment is 150 nm to 400 nm, and when the average particle size is less than 150 nm, it exhibits UV light blocking properties, so that UV light does not sufficiently penetrate downward during the exposure process, so pattern formation is not easy. , and the particle size is too small to improve the transmittance in the visible ray region, which may cause a problem in that the shielding properties are deteriorated.
  • the average particle size exceeds 400 nm, dispersibility and storage stability may be deteriorated, the surface smoothness of the exposed portion may be reduced, and the interface between the exposed portion and the non-exposed portion may not be smooth.
  • the white pigment is titanium oxide (TiO 2 ), silicon dioxide (SiO 2 ), aluminum oxide (Al 2 O 3 ), tin oxide (SnO 2 ), iron oxide (Fe 2 O 3 ), zinc oxide (ZnO) ), magnesium oxide (MgO), zirconium oxide (ZrO 2 ), cerium oxide (CeO 2 ), lithium oxide (Li 2 O), silver oxide (AgO), antimony oxide (Sb 2 O 3 , Sb 2 O 5 ) and oxide It may be at least one selected from the group consisting of calcium (CaO), and preferably titanium oxide (TiO 2 ) may be used.
  • C.I. Pigment White a white pigment known in the art
  • the white pigment for example, C.I. Pigment White 4, 5, 6, 6:1, 7, 18, 18:1, 19, 20, 22, 25, 26, 27, 28 and 32, etc., in terms of reflection efficiency and whiteness, C.I. It is preferred to include Pigment White 6 or 22, and C.I. It is more preferable to include Pigment White 6. These can be used individually or in mixture of 2 or more types.
  • Titanium oxide (TiO 2 ) included in CI Pigment White 6 is inexpensive and has a high refractive index, so it can be used as an effective white pigment because it has excellent reflectance, and in terms of colorability and whiteness, it is preferable to have a rutile structure.
  • the titanium oxide (TiO 2 ) is, if necessary, a resin treatment, a surface treatment using a pigment derivative into which an acidic group or a basic group is introduced, a graft treatment to the pigment surface with a polymer compound, etc., atomization treatment by a sulfuric acid atomization method, or the like It may be one that has been subjected to washing treatment with an organic solvent or water to remove impurities, or ionic impurity removal treatment by an ion exchange method or the like.
  • the titanium oxide (TiO 2 ) is a surface-treated one or more selected from the group consisting of silicon oxide (SiO 2 ), aluminum oxide (Al 2 O 3 ), zirconium oxide (ZrO 2 ) and organic materials.
  • silicon oxide (SiO 2 ), aluminum oxide (Al 2 O 3 ) and zirconium oxide (ZrO 2 ) sequentially surface-treated may be used, and more preferably, the surface-treated oxide Titanium (TiO 2 ) A surface treatment of the outermost surface of the organic material may be used.
  • titanium oxide (TiO 2 ) As the organic material, by coating titanium oxide (TiO 2 ) with a single molecular layer of low polarity and surface treatment, the energy required for dispersion of titanium oxide (TiO 2 ) is lowered, and titanium oxide (TiO 2 ) is compressed and aggregated. It is not particularly limited as long as it is to prevent it, and in one or a plurality of embodiments, stearic acid, trimethylpropane (TMP), pentaerythritol, and the like may be used.
  • TMP trimethylpropane
  • the surface treatment may be a treatment by encapsulation.
  • the content of the titanium oxide (TiO 2 ) core included in the surface-treated titanium oxide (TiO 2 ) is preferably 85 to 95 wt%, based on the total weight of the surface-treated titanium oxide (TiO 2 ).
  • the whiteness is excellent and the reflective brightness is excellent.
  • TiO 2 Commercial products of the titanium oxide (TiO 2 ) include R-101, R-102, R-103, R-104, R-105, R-350, R-706, R-794, R of DuPont. -796, TS-6200, R-900, R-902, R-902+, R-931, R-960, etc. can be exemplified, and furthermore, Huntman's R-FC5, TR81, TR88 and I CR-57 by ISK, etc. can be illustrated.
  • the white pigment may be included in an amount of 1 to 30 wt%, preferably 1 to 28 wt%, based on the total weight of the photosensitive resin composition for forming a barrier rib of the present invention.
  • the content of the white pigment is included in less than 1% by weight, the reflectance for red and/or green-based light may be lowered, and when it is included in excess of the above content, the transmittance of 900 nm is excessively lowered to align key ( Alignment key) may be difficult to recognize, and in the exposure stage, light is scattered from the surface of the coating film by the white pigment, which may cause hardening of the unexposed part. appears, and the shape of the pattern may deteriorate.
  • the (a2) black pigment contained in the (A) colorant of the present invention may be used to absorb light in the ultraviolet and visible wavelength bands.
  • the black pigment can be appropriately selected from a black organic pigment or a black inorganic pigment.
  • the black organic pigment at least one selected from the group consisting of lactam black, perylene black, cyanine black and aniline black may be used.
  • lactam black may be used in terms of blocking blue light and improving transmittance in the infrared region. have.
  • the black inorganic pigment at least one selected from the group consisting of carbon black, chromium oxide, iron oxide and titanium black may be used, and carbon black may be preferably used.
  • a black organic pigment and a black inorganic pigment may be used alone or in combination of two or more.
  • the black pigment may be included in an amount of 0.03 to 5 wt%, preferably 0.05 to 5 wt%, based on the total weight of the photosensitive resin composition for forming barrier ribs of the present invention.
  • the black pigment When included in less than the above content, as the transmittance for light in the wavelength region of the blue light backlight increases, light blocking properties may be weakened and color mixture between pixels may occur. Since the transmittance to light is low, it may be difficult to recognize the lower Align key when aligning the mask pattern in the exposure process, making it difficult to form the pattern at an accurate position. In addition, problems such as undercutting may occur due to lack of deep hardening, and a problem in that the luminous efficiency of the display decreases due to a decrease in reflectivity of the barrier ribs may occur.
  • the yellow pigment (a3) contained in the colorant (A) of the present invention can be used to absorb light in a low wavelength region (shielding blue light) in the visible region, while not inhibiting transmission and reflection of light in other regions. have.
  • the yellow pigment a pigment known in the art may be used when the above conditions are satisfied.
  • the yellow pigment can use at least one selected from anthraquinone-based, isoindolinone-based, and azo-based compounds, and is specifically classified as a pigment in the color index (published by The Society of Dyers and Colorists).
  • C.I. Pigment yellow can be used.
  • the yellow pigment for example, C.I. Pigment Yellow 13, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 129, 137, 138, 139, 147,148, 150, 153, 154, 166, 173, 180 And it may be one or more selected from the group consisting of 185, among them, C.I. Pigment Yellow 129, C.I. Pigment Yellow 138, Pigment Yellow 139, Pigment Yellow 150 and C.I. At least one yellow pigment selected from the group consisting of Pigment Yellow 185 may be preferably used.
  • the yellow pigment may be included in an amount of 0.03 to 5 wt%, preferably 0.05 to 5 wt%, based on the total weight of the photosensitive resin composition for forming barrier ribs of the present invention.
  • the transmittance for light in the wavelength band of about 450 nm is increased, so that color mixing between pixels may occur. 650 nm), the reflectance of the light is lowered, which may cause a problem in that the luminous efficiency of the display is lowered.
  • (A) color material according to the present invention may further include organic pigments, inorganic pigments, dyes, etc. commonly used in the art within a range that does not impair the object of the present invention.
  • organic pigment various pigments used in printing inks, inkjet inks, etc. can be used, and specifically, water-soluble azo pigments, insoluble azo pigments, phthalocyanine pigments, quinacridone pigments, isoindolinone pigments, isoin Doline pigments, periren pigments, perinone pigments, dioxazine pigments, anthraquinone pigments, dianthraquinonyl pigments, anthrapyrimidine pigments, anthanthrone pigments, indanthrone pigments, prabanthrone pigments, pyran and a pyranthrone pigment or a diketopyrrolopyrrole pigment.
  • the inorganic pigment examples include metal compounds such as metal oxides and metal complex salts, and specifically, oxides or composite metals of metals such as iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, zinc or antimony. oxides and the like.
  • organic and inorganic pigments examples include compounds classified as pigments in the color index (published by The Society of Dyers and Colorists), and more specifically, pigments having the following color index (C.I.) numbers. include, but are not necessarily limited to:
  • C.I. orange pigments such as pigment orange 13, 15, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65 and 71;
  • Green pigments such as pigment green 7, 10, 15, 25, 36, 47, 58, 59;
  • C.I. blue pigments such as pigment blue 15 (15:3, 15:4, 15:6, etc.), 21, 28, 60, 64 and 76; or
  • C.I. Violet pigments such as pigment violet 1, 14, 19, 23, 29, 32, 33, 36, 37 and 38;
  • brown pigments such as C.I Pigment Brown 28;
  • the dye may be used without limitation as long as it has solubility in organic solvents or is dispersible.
  • an acid dye having an acid group such as sulfonic acid or carboxylic acid, a salt of an acid dye and a nitrogen-containing compound, a sulfonamide compound of an acid dye, and derivatives thereof may be used.
  • azo-based, xanthene-based, phthalocyanine Acid dyes and derivatives thereof can also be selected.
  • the dye is a compound classified as a dye in the color index (published by The Society of Dyers and Colorists), or a known dye described in a dyeing note (color dye).
  • C.I. red dyes such as solvent red 8, 45, 49, 89, 111, 122, 125, 130, 132, 146, 179;
  • the pigments and dyes may be used alone or in combination of two or more.
  • the pigment dispersant is added to deagglomerate and maintain stability of the pigment, and may be used without limitation in the art, and specific examples of the pigment dispersant include cationic, anionic, nonionic, amphoteric, Surfactants, such as polyester type and polyamine type, etc. are mentioned, These can be used individually or in combination of 2 or more types, respectively.
  • the pigment dispersant preferably includes an acrylate-based dispersant (hereinafter, acrylate-based dispersant) including butyl methacrylate (BMA) or N,N-dimethylaminoethyl methacrylate (DMAEMA).
  • acrylate-based dispersant including butyl methacrylate (BMA) or N,N-dimethylaminoethyl methacrylate (DMAEMA).
  • BMA butyl methacrylate
  • DMAEMA N,N-dimethylaminoethyl methacrylate
  • the rate-based dispersant may be used alone or in combination of two or more.
  • a pigment dispersant of a resin type other than the acrylate-based dispersant may be used.
  • the pigment dispersants of the other resin types include known resin type pigment dispersants, in particular polyurethane, polycarboxylic acid esters typified by polyacrylates, unsaturated polyamides, polycarboxylic acids, polycarboxylic acids (partially) amine salts, ammonium salts of polycarboxylic acids, alkylamine salts of polycarboxylic acids, polysiloxanes, long-chain polyaminoamide phosphate salts, esters of hydroxyl-containing polycarboxylic acids and modified products thereof, or free ) oily dispersants such as amides or salts thereof formed by the reaction of a polyester having a carboxyl group with poly (lower alkyleneimine); water-soluble resins or water-soluble polymer compounds such as (meth)acrylic acid-styrene copolymer, (meth)acrylic acid
  • a cationic resin dispersant for example, BYK (Big) Chemi Corporation's trade names: DISPER BYK-160, DISPER BYK-161, DISPER BYK-162, DISPER BYK-163, DISPER BYK-164, DISPER BYK-166, DISPER BYK-171, DISPER BYK-182, DISPER BYK-184; BASF trade names: EFKA-44, EFKA-46, EFKA-47, EFKA-48, EFKA-4010, EFKA-4050, EFKA-4055, EFKA-4020, EFKA-4015, EFKA-4060, EFKA-4300, EFKA- 4330, EFKA-4400, EFKA-4406, EFKA-4510, EFKA-4800; Trade names from Lubrizol: SOLSPERS-24000, SOLSPERS-32550, NBZ
  • resin-type pigment dispersants may be used alone or in combination of two or more, or may be used in combination with an acrylate-based dispersant.
  • the pigment dispersant may be included in an amount of 1 to 50 parts by weight, preferably 5 to 30 parts by weight, based on 100 parts by weight of the solid content of the colorant.
  • the content of the pigment dispersant is within the above range, it is preferable because it is possible to obtain a dispersed pigment having a uniform particle size. If the content of the dispersant is more than 50 parts by weight, the viscosity may increase, and if it is less than 1 part by weight, it may be difficult to atomize the pigment, or it may cause problems such as gelation after dispersion.
  • the alkali-soluble resin of the present invention is a component that imparts solubility to the alkali developer used in the developing step, and acts as a dispersion medium for the pigment.
  • the alkali-soluble resin may be used without limitation as long as it is soluble in an alkali developer, and may preferably include a cardo-based alkali-soluble resin, an acrylic alkali-soluble resin, or a mixture thereof.
  • the cardo-based alkali-soluble resin has reactivity and alkali solubility under the action of light or heat, and the cardo-based alkali-soluble resin contained in the photosensitive resin composition for forming a partition wall of the present invention functions as a binder resin for a colorant containing a white pigment. and is not limited as long as it is a resin soluble in an alkaline developer.
  • the cardo-based alkali-soluble resin of the present invention may include at least one of the compounds represented by Chemical Formulas 1-1 and 1-2.
  • R1, R2, R3 and R4 are each independently an alkyl group having 1 to 5 carbon atoms, a cycloalkyl group having 4 to 8 carbon atoms, or
  • X is a hydrogen atom; an alkyl group having 1 to 5 carbon atoms; or a hydroxyl group,
  • R5 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
  • the compound represented by Formula 1-1 may be synthesized as a compound represented by Formula 2-1 below, and the compound represented by Formula 1-2 may be synthesized using a compound represented by Formula 2-2. .
  • acrylic alkali-soluble resin it is preferable to manufacture by copolymerizing the ethylenically unsaturated monomer which has a carboxyl group.
  • ethylenically unsaturated monomer having a carboxyl group examples include monocarboxylic acids such as acrylic acid, methacrylic acid, and crotonic acid; dicarboxylic acids such as fumaric acid, mesaconic acid, and itaconic acid; and an anhydride of said dicarboxylic acid; Polymer mono(meth)acrylates having a carboxyl group and a hydroxyl group at both terminals, such as ⁇ -carboxypolycaprolactone mono(meth)acrylate, etc. are mentioned, and acrylic acid and methacrylic acid are preferable.
  • monocarboxylic acids such as acrylic acid, methacrylic acid, and crotonic acid
  • dicarboxylic acids such as fumaric acid, mesaconic acid, and itaconic acid
  • an anhydride of said dicarboxylic acid Polymer mono(meth)acrylates having a carboxyl group and a hydroxyl group at both terminals, such as ⁇ -
  • the alkali-soluble resin can be prepared by polymerizing the ethylenically unsaturated monomer having the carboxyl group and the copolymerizable unsaturated monomer.
  • the copolymerizable unsaturated polymerization monomer examples include glycidyl methacrylate, which is an unsaturated monomer having a glycidyl group; 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, N -ethylenically unsaturated monomers having a hydroxyl group such as hydroxyethyl (meth)acrylates such as hydroxyethyl acrylamide; Styrene, vinyltoluene, ⁇ -methylstyrene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzylmethyl ether, m-vinylbenzylmethyl ether, p-vinyl aromatic vinyl
  • Each of the above copolymerizable unsaturated monomers may be used alone or in combination of two or more.
  • the acid value of the alkali-soluble resin is 30 to 200 mgKOH/g.
  • the acid value of the alkali-soluble resin is less than 30 mgKOH/g, it is difficult for the photosensitive resin composition for forming barrier ribs to secure a sufficient development speed. A problem occurs in compatibility with the color material, and the color material in the photosensitive resin composition is precipitated, or the storage stability of the photosensitive resin composition is lowered and the viscosity tends to increase.
  • the 'acid value' is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer, and can be usually obtained by titration using an aqueous potassium hydroxide solution.
  • the polystyrene reduced weight average molecular weight (hereinafter simply referred to as 'weight average molecular weight') measured by gel permeation chromatography (GPC; tetrahydrofuran is used as the elution solvent) is 2,000 to 20,000, preferably 3,000 to 10,000.
  • GPC gel permeation chromatography
  • a cardo-type resin or an acrylic-type alkali-soluble resin is preferable.
  • film loss in the developing process may be suppressed and pattern stability may be improved.
  • the alkali-soluble resin may be included in an amount of 5 to 85 wt%, preferably 5 to 60 wt%, based on the total weight of the photosensitive resin composition for forming a barrier rib according to the present invention.
  • the solubility in the developer is sufficient to facilitate the formation of a cured film, and the film reduction of the pixel portion of the exposed portion is prevented during development, so that the omission property of the unexposed portion is improved. .
  • the photopolymerizable compound is a compound that can be polymerized by the action of the photopolymerization initiator (D) below, and may be a monofunctional monomer, a bifunctional monomer or a polyfunctional monomer, and preferably a polyfunctional monomer having a bifunctional or higher function may be used. .
  • the monofunctional monomer examples include nonylphenyl carbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, 2-hydroxyethyl acrylate, or N-vinyl acrylate. Rollidone, and the like, but is not limited thereto.
  • bifunctional monomer examples include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and triethylene glycol di (meth) acrylate. , bis (acryloyloxyethyl) ether of bisphenol A, or 3-methylpentanediol di (meth) acrylate, but is not limited thereto.
  • polyfunctional monomer examples include trimethylol propane tri (meth) acrylate, ethoxylated trimethylolpropane tri (meth) acrylate, propoxylated trimethylol propane tri (meth) acrylate, pentaerythritol tri (meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, ethoxylated dipentaerythritol hexa(meth)acrylate, propoxylated dipentaerythritol hexa(meth) acrylate or dipentaerythritol hexa(meth)acrylate, but is not limited thereto.
  • the photopolymerizable compound may be included in an amount of 5 to 50% by weight based on the total weight of the photosensitive resin composition for forming barrier ribs.
  • the photopolymerizable compound is included within the above range, it is preferable in terms of strength and smoothness.
  • the photopolymerization initiator according to the present invention is a compound that generates a radical capable of initiating polymerization of the photopolymerizable compound by exposure to radiation such as visible light, ultraviolet light, far ultraviolet light, electron beam, or X-ray.
  • an acetophenone-based compound for example, an acetophenone-based compound, a benzophenone-based compound, a biimidazole-based compound, a triazine-based compound, an oxime ester-based compound, and a thioxanthone-based compound may be used.
  • acetophenone-based compound examples include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethyl ketal, 2-hydroxy-1-[4-(2-hydroxyl) oxyethoxy)phenyl]-2-methylpropan-1-one, 1-hydroxycyclohexylphenylketone, 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one; 2-Benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, 2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propane-1 -one, 2-(4-methylbenzyl)-2-(dimethylamino)-1-(4-morpholinophenyl)butan-1-one, etc. are mentioned.
  • benzophenone-based compound examples include benzophenone, methyl O-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenylsulfide, 3,3',4,4'-tetra (tert) -Butylperoxycarbonyl)benzophenone, 2,4,6-trimethylbenzophenone, etc. are mentioned.
  • biimidazole compound examples include 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichloro Phenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetra(alkoxyphenyl)biimidazole , 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (trialkoxyphenyl) biimidazole, 2,2-bis (2,6-dichlorophenyl) -4, 4'5,5'-tetraphenyl-1,2'-biimidazole or the imidazole compound in which the phenyl group at the 4,4',5,5'-position is substituted by the carboalkoxy group, etc.
  • 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl)-4,4' ,5,5'-tetraphenylbiimidazole and 2,2-bis(2,6-dichlorophenyl)-4,4'5,5'-tetraphenyl-1,2'-biimidazole are preferably used do.
  • triazine-based compound examples include 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6 -(4-Methoxynaphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine, 2,4-bis (trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(5-methylfuran-2- yl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)ethenyl]-1,3,5-triazine , 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)ethenyl]
  • oxime ester compound examples include o-ethoxycarbonyl- ⁇ -oxyimino-1-phenylpropan-1-one, 1,2-octadione,-1-(4-phenylthio)phenyl, -2 -(o-benzoyloxime), ethanone,-1-(9-ethyl)-6-(2-methylbenzoyl-3-yl)-,1-(o-acetyloxime), etc.
  • thioxanthone-based compound examples include 2-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxythioxanthone, and the like. have.
  • the photopolymerization initiator may be used alone or in combination of two or more.
  • the photopolymerization initiator may be included in an amount of 0.01 to 10% by weight, preferably 0.01 to 5% by weight, based on the total weight of the photosensitive resin composition for forming barrier ribs.
  • the photopolymerization initiator is included within the above range, it is preferable because the photopolymerization reaction rate is appropriate to prevent an increase in the overall process time and to prevent deterioration of the physical properties of the final cured film due to overreaction.
  • the photosensitive resin composition for forming a barrier rib according to the present invention may further include a photopolymerization initiator auxiliary in addition to the photopolymerization initiator.
  • a photopolymerization initiation auxiliary is used together with the photopolymerization initiator, the photosensitive resin composition becomes more sensitive and productivity is improved.
  • the photopolymerization initiation adjuvant is a compound used to promote polymerization of a polymerizable compound whose polymerization is initiated by the photopolymerization initiator, and at least one compound selected from the group consisting of amines and carboxylic acid compounds may be preferably used.
  • the photopolymerization initiation auxiliary agent When the photopolymerization initiation auxiliary agent is included, its content may be typically greater than 0 moles to 10 moles or less, preferably 0.01 moles to 5 moles, based on 1 mole of the photopolymerization initiator. When the photopolymerization initiation adjuvant is included within the above range, it is preferable because the productivity improvement effect can be expected by improving the photopolymerization efficiency.
  • an organic solvent known in the art may be used without particular limitation.
  • the solvent examples include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether , Diethylene glycol dibutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, dipropylene glycol dimethyl ether, dipropylene glycol diethyl ether, dipropylene glycol dipropyl ethers such as ether and dipropylene glycol dibutyl ether; aromatic hydrocarbons such as benzene, toluene, xylene and mesitylene; ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl
  • an organic solvent having a boiling point of 100 to 200° C. in terms of applicability and dryness among the solvents may be used, and more preferably, alkylene glycol alkyl ether acetates, ketones, 3-ethoxypropionate ethyl, or 3-methyl Esters such as methyl oxypropionate may be used, and more preferably, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, 3-ethoxypropionate ethyl, 3-methoxypropionate methyl, etc. may be used.
  • solvents can be used individually or in mixture of 2 or more types, respectively.
  • the content of the solvent may be included in a residual amount such that the total weight of the photosensitive resin composition for forming a barrier rib is 100% by weight.
  • residual amount means a remaining amount such that the total weight of the composition further including the essential components and other additional components of the present invention is 100% by weight, and due to the meaning of the "residual amount", the The photosensitive resin composition for forming barrier ribs is not limited to those that do not contain additional components.
  • the solvent may be included in an amount of 60 to 90% by weight, preferably 70 to 85% by weight, based on the total weight of the photosensitive resin composition for forming barrier ribs, but is not limited thereto. but.
  • the solvent is contained within the above content range, the effect of improving the applicability when applied with an application device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes referred to as a die coater), inkjet, etc. It is preferable to provide
  • the photosensitive resin composition for forming a barrier rib according to the present invention may further include additives such as fillers, other polymer compounds, curing agents, surfactants, adhesion promoters, antioxidants, ultraviolet absorbers, and anti-aggregation agents, if necessary.
  • additives such as fillers, other polymer compounds, curing agents, surfactants, adhesion promoters, antioxidants, ultraviolet absorbers, and anti-aggregation agents, if necessary.
  • the above additives may be used alone or in combination of two or more.
  • the filler specifically, glass, silica, alumina, etc. may be used, but the present invention is not limited thereto.
  • the other high molecular compounds include curable resins such as epoxy resins and maleimide resins, and thermoplastic resins such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ether, polyfluoroalkyl acrylate, polyester, and polyurethane.
  • curable resins such as epoxy resins and maleimide resins
  • thermoplastic resins such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ether, polyfluoroalkyl acrylate, polyester, and polyurethane.
  • the present invention is not limited thereto.
  • surfactant examples include silicone-based, fluorine-based, ester-based, cationic, anionic, nonionic, and amphoteric surfactants, and these may be used alone or in combination of two or more. .
  • the antioxidant may include, for example, at least one selected from the group consisting of phosphorus-based antioxidants, sulfur-based antioxidants, and phenol-based antioxidants, and in this case, color change that may occur at high temperatures during the process or a light source after display manufacturing It can inhibit the occurrence of yellowing that can be caused by
  • the antioxidant may include at least one selected from the group consisting of a phenolic compound, a phosphorus compound, and a sulfur compound, which are a phenolic-phosphorus compound, a phenolic-sulfur compound, a phosphorus-sulfur compound, or a phenolic-phosphorus compound. -Can be used in combination with sulfur compounds.
  • the adhesion promoter is specifically, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris(2-methoxyethoxy)silane, N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane, N -(2-aminoethyl)-3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltri One or a mixture thereof selected from the group consisting of methoxysilane, 3-iso
  • the aggregation inhibitor may be specifically sodium polyacrylate, but is not limited thereto.
  • the additive may be appropriately added and used by those skilled in the art in a range that does not impair the effects of the present invention.
  • the additive may be used in an amount of 0.05 to 10% by weight, preferably 0.1 to 10% by weight, more preferably 0.1 to 5% by weight, based on the total weight of the photosensitive resin composition for forming barrier ribs, but is not limited thereto.
  • the present invention provides a barrier rib structure made of the photosensitive resin composition for forming barrier ribs and a display device including the same.
  • a display device including a barrier rib structure formed by using the photosensitive resin composition for forming barrier ribs of the present invention prevents color mixing between pixels, is advantageous for forming a fine pattern, and has a barrier rib with little line width change according to a change in development time in the developing process can be manufactured.
  • the color conversion pixel can secure sufficient space and has the advantage of realizing a high-quality image.
  • the barrier rib structure is preferably formed to have a height or thickness of 3 to 20 ⁇ m, preferably 3 to 15 ⁇ m.
  • the display device may include a liquid crystal display device, an organic light emitting diode, a flexible display, and the like, but is not limited thereto, and all display devices known in this field that can be applied may be exemplified.
  • the barrier rib may be formed by applying the above-described composition on one surface of a substrate and forming a cured film through photocuring and developing processes.
  • the color conversion pixel and the color conversion panel barrier rib structure for distinguishing the pixel may be formed using a photolithography process.
  • each photosensitive resin composition is applied on one surface of a substrate to form a barrier rib, and then volatile components such as a solvent are removed by heating and drying to obtain a smooth cured film.
  • the coating method of the composition is not particularly limited, and examples thereof include spin coating, cast coating method, roll coating method, slit and spin coating or slit coating method.
  • pre-baking After applying the composition, heat drying (pre-baking, pre-baking) is performed, or drying under reduced pressure is followed by heating to volatilize volatile components such as solvents.
  • the heating temperature may be typically 70 to 150 °C, preferably 80 to 130 °C, but is not limited thereto.
  • ultraviolet rays are irradiated through a mask so that the portion irradiated with ultraviolet rays is cured.
  • a device such as a mask aligner or a stepper to uniformly irradiate parallel rays to the entire exposed portion and to adjust the positions of the mask and the cured film substrate to be precisely aligned.
  • the ultraviolet rays g-rays (wavelength: 436 nm), h-rays, i-rays (wavelength: 365 nm), etc. may be used, and the amount of ultraviolet radiation may be appropriately selected as needed.
  • a cured film of a target pattern can be formed by contacting the cured coating film with a developer to dissolving the unexposed portion and developing.
  • the cured film formed in this way can be cured harder than the cured product through an additional heat curing process (post-baking, post-baking), in which case the heating temperature may be 90 to 230 °C, and the heating time is 5 to 180 minutes. , It may preferably be 15 to 90 minutes, but is not limited thereto.
  • Example 1 Colorant composition (weight%) white pigment (a1) black pigment (a2) yellow pigment (a3) dispersant Sum a2-1 a2-2 a3-1 a3-2 a3-3
  • Example 1 6 0.5 - One - - 0.2 7.7
  • Example 2 4 0.3 - 2 - - 0.2 6.5
  • Example 3 2 0.2 - 3 - - 0.2 5.4
  • Example 4 20 0.7 - One - - 0.2 21.9
  • Example 5 30 1.5 - One - - 0.2 32.7
  • Example 6 2 0.03 - 0.03 - - 0.2 2.26
  • Example 7 6 - 0.5 One - - 0.2 7.7
  • Example 8 2 0.2 - - 3 - 0.2 5.4
  • Example 9 2 0.2 - - - 3 0.2 5.4 Comparative Example 1 15 One - - - - 0.2 16.2 Comparative Example 2 6 One - - - - 0.2 7.2 Comparative Example 3 - 2 - 2 -
  • Alkali-soluble resin acrylic alkali-soluble resin (CX-65-C, SHOWA DENKO K.K.)
  • a 5 cm ⁇ 5 cm glass substrate (Corning) was washed with a neutral detergent and water, and then dried.
  • each of the photosensitive resin composition solids according to Examples and Comparative Examples was diluted to a concentration of 30% using a propylene glycol methyl ether acetate (PGMEA) solvent.
  • Spin coating was carried out so that the final film thickness was 10 ⁇ m, pre-baking at 80°C, and drying for 2 minutes to remove the solvent. Thereafter, a mask including a line/space pattern of 1 to 100 ⁇ m or a 40 mm ⁇ 40 mm pattern was exposed at an exposure amount of 100 mJ/cm 2 , and the unexposed portion was removed using an aqueous alkali solution.
  • the prepared cured film was then baked at 180° C. for 30 minutes to prepare a barrier rib pattern cured film having a thickness of 10 ⁇ m.
  • the cured film of the barrier rib pattern prepared from the photosensitive resin composition according to the above Examples and Comparative Examples was inspected using an electron microscope (model name: SU-8010, HITACHI Corporation), and the angle of the tapered shoulder was measured as shown in FIG. 3 . , the results are shown in Table 3 below.
  • ⁇ more than 110 °, less than 140 °
  • the cured film of the barrier rib pattern prepared from the photosensitive resin composition according to the Examples and Comparative Examples was immersed in a PGMEA solvent at 90° C. for 10 minutes, and the amount of film thickness change before and after immersion was measured and evaluated for comparative evaluation, and the results are shown in Table 3 below. It was.
  • ⁇ More than 0.1 ⁇ m, 0.3 ⁇ m or less
  • the surface of the cured film of the barrier rib pattern prepared from the photosensitive resin composition according to the Examples and Comparative Examples was observed using an optical microscope, and evaluated according to the residue measurement criteria shown in FIG. 4 , and the results are shown in Table 3 below.
  • the transmittance and reflectance for each wavelength of the barrier rib pattern cured film having a thickness of 10 ⁇ m were measured using a spectrophotometer (CM-3700d).
  • the transmittance or reflectance evaluation criteria according to each wavelength are as follows, and the results are shown in Table 4 below.
  • ⁇ more than 5%, less than 20%
  • ⁇ 10% or more, less than 15%
  • ⁇ 10% or more, less than 15%
  • the cured film of the barrier rib pattern prepared by using the photosensitive resin composition according to the embodiment has a transmittance of 20% or less at a wavelength of 450 nm, and a reflectance of 10% or more at a wavelength of 550 and 650 nm. , it can be confirmed that the transmittance is 70% or more at a wavelength of 900 nm. Accordingly, when a cured film of a barrier rib pattern of a display device is formed using the photosensitive resin composition according to the present invention, it effectively prevents color mixing of the color conversion panel, and the resolution and Light efficiency may be improved, and an effect of easy recognition of an alignment key may be provided.
  • the cured film of the barrier rib pattern prepared using the photosensitive resin composition according to the embodiment particularly the barrier rib pattern prepared using the photosensitive resin composition according to Examples 1 to 4 and 7 to 9, reliability of solvent resistance, etc. It can be confirmed that the result is excellent, no residue other than the pattern forming part remains, and the process characteristic of the tapered property is excellent.
  • the cured film of the barrier rib pattern prepared using the photosensitive resin composition according to Comparative Examples 1 to 4, which does not contain at least one of a white pigment, a black pigment, and a yellow pigment, has a transmittance and reflectance range at a wavelength according to the present invention. It was confirmed that it was not satisfied, and it can be confirmed that the process characteristics such as tapered shoulder angle, solvent resistance and residue were also inferior to those of the embodiment.
  • the photosensitive resin composition for forming a barrier rib and the barrier rib structure according to the present invention can provide effects such as excellent reliability such as solvent resistance, no residue other than the pattern forming portion, and excellent tapered process characteristics.

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Abstract

La présente invention concerne une composition de résine photosensible destinée à former des parois de séparation, une structure de paroi de séparation fabriquée à l'aide de la composition de résine photosensible destinée à former des parois de séparation, et un dispositif d'affichage les comprenant, la composition de résine photosensible comprenant (A) un colorant, (B) une résine soluble en milieu alcalin, (C) un composé photopolymérisable, (D) un initiateur de photopolymérisation et (E) un solvant. Un film durci fabriqué à l'aide de la composition de résine photosensible présente une transmittance de 20 % ou moins à une longueur d'onde de 450 nm, une réflectance de 10 % ou plus à des longueurs d'onde de 550 nm et de 650 nm, et une transmittance de 70 % ou plus à une longueur d'onde de 900 nm lorsque l'épaisseur du film durci est comrpis entre 3 et 15 µm.
PCT/KR2022/002700 2021-02-26 2022-02-24 Composition de résine photosensible pour former des parois de séparation, structure de paroi de séparation fabriquée à l'aide de celle-ci, et dispositif d'affichage comprenant des parois de séparation Ceased WO2022182157A1 (fr)

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KR1020210026916A KR102834243B1 (ko) 2021-02-26 2021-02-26 격벽 형성용 감광성 수지 조성물, 이를 이용하여 제조된 격벽 구조물 및 상기 격벽 구조물을 포함하는 표시 장치

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024131280A1 (fr) * 2022-12-23 2024-06-27 惠州华星光电显示有限公司 Fond de panier d'affichage et son procédé de fabrication, et terminal mobile
EP4575639A1 (fr) * 2023-12-21 2025-06-25 Aledia Procédé de fabrication de motifs à parois incurvées par photolithographie

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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