WO2022180808A1

WO2022180808A1 - Optical processing device

Info

Publication number: WO2022180808A1
Application number: PCT/JP2021/007455
Authority: WO
Inventors: 健太須藤
Original assignee: 株式会社ニコン
Priority date: 2021-02-26
Filing date: 2021-02-26
Publication date: 2022-09-01
Also published as: EP4299233A1; CN116917078A; JPWO2022180808A1

Abstract

This optical processing device comprises a combining element that combines a first optical path of a first light beam of a first wavelength and a second optical path of a second light beam of a second wavelength which is longer than the first wavelength, a condensing optical system that has a positive refractive force and condenses each of the first light beam and the second light beam from the combining element toward a workpiece, and a correction optical system having a negative refractive force, wherein the correction optical system is arranged in the first optical path on the incident side of the combining element, one of the first and second light beams is for processing the workpiece and the other of the first and second light beams is for measuring the workpiece.

Description

optical processing equipment

The present invention relates to an optical processing device.

As a processing device capable of processing an object, Patent Document 1 describes a processing device that forms a structure by irradiating the surface of an object with a laser beam. This type of processing apparatus is required to appropriately process an object (Patent Document 1).

U.S. Pat. No. 4,994,639

According to the first aspect, the optical processing device is a synthesizing element for synthesizing a first optical path of a first light flux having a first wavelength and a second optical path of a second light flux having a second wavelength longer than the first wavelength. and a condensing optical system having a positive refractive power and condensing the first light flux and the second light flux from the synthesizing element toward a workpiece, and a corrector having a negative refractive power. and an optical system, wherein the correcting optical system is arranged on the first optical path on the incident side of the combining element, and one of the first light flux and the second light flux processes the workpiece. and the other one of the first and second beams is a beam for measuring the workpiece.
According to the second aspect, the optical processing device is a synthesizing element for synthesizing a first optical path of a first light flux having a first wavelength and a second optical path of a second light flux having a second wavelength longer than the first wavelength. and a condensing optical system having a positive refractive power and condensing the first light flux and the second light flux from the synthesizing element toward an object to be processed, and a corrector having a positive refractive power. and an optical system, wherein the correcting optical system is arranged in the first optical path on the incident side of the combining element, and the back focus of the condensing optical system at the first wavelength is the converging optical system at the second wavelength. one of the first light flux and the second light flux is longer than the back focus of the optical optical system and is a light flux for processing the workpiece, and the other light flux of the first light flux and the second light flux is , the light flux for measuring the workpiece.
According to the third aspect, the optical processing device is a synthesizing element for synthesizing a first optical path of a first light flux having a first wavelength and a second optical path of a second light flux having a second wavelength longer than the first wavelength. and a condensing optical system having a positive refractive power and condensing the first light flux and the second light flux from the synthesizing element toward an object to be processed, and a corrector having a positive refractive power. and an optical system, wherein the correcting optical system is arranged on the second optical path on the incident side of the combining element, and one of the first light flux and the second light flux processes the workpiece. and the other one of the first and second beams is a beam for measuring the workpiece.
According to a fourth aspect, the optical processing device is a synthesizing element that synthesizes a first optical path of a first light flux having a first wavelength and a second optical path of a second light flux having a second wavelength longer than the first wavelength. and a condensing optical system having a positive refractive power and condensing the first light flux and the second light flux from the synthesizing element toward a workpiece, and a corrector having a negative refractive power. and an optical system, wherein the correcting optical system is arranged in the second optical path on the incident side of the combining element, and the back focus of the condensing optical system at the first wavelength is the converging optical system at the second wavelength. one of the first light flux and the second light flux is longer than the back focus of the optical optical system and is a light flux for processing the workpiece, and the other light flux of the first light flux and the second light flux is , the light flux for measuring the workpiece.

The figure which shows roughly the structure of the optical processing apparatus of 1st Embodiment. The figure explaining the state in which a 1st light flux and a 2nd light flux converge on a condensing position. FIG. 4 is a diagram showing an optical design example of the optical device of the first embodiment; The figure which shows roughly the structure of the condensing optical system with which the optical apparatus of 2nd Embodiment is provided. FIG. 10 is a diagram showing an optical design example of the optical device of the second embodiment; The figure which shows roughly the structure of the optical processing apparatus of a modification.

(Optical processing device of the first embodiment)
FIG. 1 is a diagram schematically showing the configuration of an optical processing device 1 of the first embodiment. The X direction, Y direction, and Z direction indicated by arrows in FIG. 1 and each figure to be described later are directions orthogonal to each other, and each of the X direction, Y direction, and Z direction indicates the same direction in each figure. . Further, the XZ direction indicated by the arrow in FIG. 1 is a direction intermediate between the X direction and the Z direction described above, that is, a direction perpendicular to the Y direction and separated from the X direction and the Z direction by 45°. there is Hereinafter, the directions indicated by the arrows will be referred to as +X direction, +Y direction, +Z direction, and +XZ direction, respectively. The position in the X direction is called the X position, the position in the Y direction is called the Y position, and the position in the Z direction is called the Z position.

The optical processing device 1 of the first embodiment includes an optical device 2, a guide 20, a sample stage 19, a control unit 22, a measurement unit 23, a calculation unit 24, position information and a correction unit 25 . In the optical processing device 1 , a first light beam R1 having a first wavelength, which is emitted from a light source 10 and is incident on the optical device 2 via a first optical path P1 , is condensed onto an irradiated surface 17 by the optical device 2 . A workpiece 18 is placed on a sample table 19 , and the workpiece 18 is placed on the sample table 19 so that a surface 18 s to be processed of the workpiece 18 coincides with the surface 17 to be irradiated of the optical device 2 .

Also, the sample stage 19 has a driving member such as a linear motor, and moves on the guide 20 in at least one of the X direction and the Y direction. Note that the sample table 19 may move the workpiece 18 along the Z direction (the optical axis direction of the condensing optical system 16). Also, the optical device 2 may be movable along the Z direction. A focus adjustment optical system (not shown) may be arranged to change the condensing positions of the first light beam R1 and the second light beam R2, which will be described later, on the workpiece 18 along the Z direction.

In this case, the focus adjustment optical system is a front-stage third optical path P3a (in other words, an optical path in which the first optical path P1 and the second optical path P2 are superimposed) between the synthesizing element 12 and the fixed mirror 13 (polarization scanning unit), which will be described later. ). The focus adjustment optical system is positioned on at least one of a first optical path P1 (described later) between the light source 10 and the synthesizing element 12 and a second optical path P2 (described later) between the measuring unit 23 and the synthesizing element 12. may be placed.

The X-position, Y-position, and Z-position of the sample table 19 are measured by an optical encoder 21, for example, and the positional information of the sample table 19 is sent to the controller 22 as a measurement signal S1. Based on the measurement signal S1, the controller 22 sends a control signal S2 to the sample stage 19 to set the sample stage 19 at a desired position.
The sample table 19 can also be referred to as a holder that holds the sample.
Details of the measurement unit 23, the calculation unit 24, and the position information correction unit 25 will be described later.

The optical device 2 includes, in order from the side of the light source 10 supplied with the first light flux R1 of the first wavelength, a correction optical system 11, a synthesizing element 12, a fixed mirror 13, an oscillating mirror 14, and a It has a condensing optical system 16 shown.
A first beam R1, which is supplied from the light source 10 as a parallel beam as an example and travels in the +Z direction, is made up of one or more lenses or mirrors and enters a correction optical system 11 having a predetermined refractive power (power). The first light beam R1 exiting the correction optical system 11 enters the combining element 12 . Here, the refractive power of an optical system or optical element can be the reciprocal of the focal length of the optical system or optical element.

In this specification, the optical path of the first light beam R1 between the light source 10 and the combining element 12 is called the first optical path P1. Therefore, it can be said that the correction optical system 11 is arranged on the first optical path P1. Note that the first optical path P1 is not limited to between the light source 10 and the synthesizing element 12 . For example, in the optical processing device 1 (optical device 2), the first optical path P1 of the first light flux R1 passes from the light source 10 through the combining element 12, the fixed mirror 13, the oscillating mirror 14, and the condensing optical system 16. It can also be said that this is the optical path of the first light beam R1 traveling toward the workpiece 18 . In other words, it can be said that the correction optical system 11 is arranged in the first optical path P1 on the incident side of the first beam R1 of the combining element 12 .

Also, in this specification, the optical path of the second light flux R2 between the measurement unit 23 and the combining element 12 is called a second optical path P2. Therefore, it can be said that the correction optical system 11 is not arranged in the second optical path P2. The measurement unit 23 includes a measurement light source 23a that emits a second light beam R2, a light receiving unit 23c that receives detection light (second light beam R2) returning from the workpiece 18 as will be described later, and light emitted from the measurement light source 23a. It has a beam splitter 23b that separates and combines the light and the light returning from the workpiece 18 . Note that the beam splitter 23b may be a half mirror.

It should be noted that the second optical path P2 is not limited to between the measurement unit 23 and the combining element 12. For example, the second optical path P2 of the second light beam R2 passes from the measurement light source 23a (measurement unit 23) to the combining element 12, the fixed mirror 13, the oscillating mirror 14, and the light condensing device 1 (optical device 2) in the optical processing device 1 (optical device 2). It can also be said that this is the optical path of the second light beam R2 traveling toward the workpiece 18 via the optical system 16 .

A second light beam R2 from the measurement light source 23a (measurement unit 23) to reach the combining element 12 through the second optical path P2 is also incident on the combining element 12. Here, the second light beam R2 is a light beam having a second wavelength different from the first wavelength of the first light beam R1. More specifically, the second wavelength of the second beam R2 is longer than the first wavelength of the first beam R1. In the synthesizing element 12, the first optical path P1 is synthesized with the second optical path P2 from the measurement light source 23a (measurement section 23). Therefore, the combining element 12 combines the first light flux R1 and the second light flux R2. The synthesizing element 12 is, for example, a dichroic prism, and the dichroic reflecting surface 12r transmits a first light flux R1 of a first wavelength and reflects a second light flux R2 of a second wavelength different from the first wavelength.

The synthesizing element 12 is not limited to the dichroic prism described above, and may be composed of flat glass having a dichroic mirror. Alternatively, when the first light flux R1 and the second light flux R2 are linearly polarized lights whose polarization planes are substantially perpendicular to each other, a polarizing beam splitter may be used.

The first light flux R1 and the second light flux R2 combined by the synthesizing element 12 are both emitted from the synthesizing element 12 in the +Z direction and are incident on the fixed mirror 13 . The fixed mirror 13 is, for example, a plane mirror arranged along a plane parallel to the XZ direction and the Y direction. The first light flux R1 and the second light flux R2 that have traveled in the +Z direction and entered the fixed mirror 13 are reflected in the +X direction by the fixed mirror 13 and enter the oscillating mirror 14, which is a plane mirror. The first light beam R1 and the second light beam R2 reflected approximately in the +Z direction by the oscillating mirror 14 enter the condensing optical system 16 .

In this specification, the optical path between the synthesizing element 12 and the condensing optical system 16 is called a third optical path P3. Therefore, it can be said that the fixed mirror 13 and the oscillating mirror 14 are arranged in the third optical path P3. Further, in the third optical path P3, a front stage third optical path P3a is between the synthesizing element 12 and the fixed mirror 13, a middle stage third optical path P3b is between the fixed mirror 13 and the oscillating mirror 14, and the oscillating mirror 14 and the condensing optics are arranged. The path to the system 16 is also referred to as a post-stage third optical path P3c. As described above, in the optical processing device 1, the first optical path P1 of the first light beam R1 passes from the light source 10 through the combining element 12, the fixed mirror 13, the oscillating mirror 14, and the condensing optical system 16. It can also be said that this is the optical path of the first light beam R1 traveling toward the workpiece 18 .

In the optical processing device 1, the second optical path P2 of the second light flux R2 passes from the measurement light source 23a (measurement unit 23) through the combining element 12, the fixed mirror 13, the oscillating mirror 14, and the condensing optical system 16. can also be said to be the optical path of the second light flux R2 traveling toward the workpiece 18. Therefore, it can be said that the third optical path P3 is an optical path in which at least a part of the first optical path P1 of the first light flux R1 and the second optical path P2 of the second light flux R2 overlap. In other words, it can be said that the fixed mirror 13 and the oscillating mirror 14 (that is, deflection scanning unit) are arranged on the first optical path P1 and the second optical path P2 between the combining element 12 and the condensing optical system 16 .

The condensing optical system 16 is an optical system including a plurality of lenses (L11 to L15). An optical axis AX of the condensing optical system 16 is indicated by a dashed line in FIG. The optical axis AX of the condensing optical system 16 may be referred to as the exit-side optical axis of the processing device 2 . Among them, the lens L11 arranged on the most incident side is, for example, a lens having a negative refractive power. Below, the lens L11 is also called the first lens. The lenses (L12 to L15) arranged closer to the irradiated surface 17 side (downstream side) than the lens L11 constitute the second lens group G20 and have positive refractive power as a whole. The first light flux R1 and the second light flux R2 are generally condensed on the illuminated surface 17 by the refractive power of the condensing optical system 16 . For convenience of explanation, the first light flux R1 and the second light flux R2 are condensed on the surface to be illuminated 17. It does not have to be on the top (that is, on the irradiated surface 17).

The oscillating mirror 14 is held by the drive member 15 so as to be able to oscillate within a predetermined angle range, for example, about a rotation axis parallel to the Y direction. A so-called galvanomirror may be used as an example of the swing mirror 14 and the driving member 15 . When the oscillating mirror 14 oscillates within a predetermined angular range about the Y direction as the center of rotation, the traveling directions of the first light flux R1 and the second light flux R2 reflected by the oscillating mirror 14 change from the +Z direction to the above-described predetermined direction. It changes (oscillates) between two directions separated in the ±X direction by twice the angle.

When the reflecting surface of the rocking mirror 14 is at the reference position, that is, when the reflecting surface is parallel to the Y direction and the XZ direction, the first light beam R1 and the second light beam R2 reflected by the rocking mirror 14 travel along the central optical path The light generally converges on the central condensing point Fa on the surface 17 to be illuminated through P4a.
When the oscillating mirror 14 rotates counterclockwise around the rotation axis parallel to the Y direction from the reference position, the first light flux R1 and the second light flux R2 reflected by the oscillating mirror 14 pass through the right optical path P4b and are irradiated. The light is generally condensed on the right condensing point Fb located on the +X side of the central condensing point Fa on the surface 17 .

On the other hand, when the swing mirror 14 rotates clockwise around the rotation axis parallel to the Y direction from the reference position, the first light beam R1 and the second light beam R2 reflected by the swing mirror 14 pass through the left optical path P4c. The light generally converges on the left condensing point Fc located on the -X side of the central condensing point Fa on the illuminated surface 17 .
Therefore, it can also be said that the swing mirror 14 is a deflection scanning unit that deflects the first light beam R1 and the second light beam R2 and causes the surface to be illuminated 17 to be scanned.

Note that the deflection scanning unit is not limited to the galvanomirror. For example, the deflection scanning unit deflects the first light beam R1 and the second light beam R2 from the synthesizing element 12, and directs the first light beam R1 and the second light beam R2 toward the workpiece 18 via the condensing optical system 16. An existing member capable of scanning each focal point of the light beam R2 may be used. For example, the deflection scanner may be a polygon mirror.
The control unit 22 sends a control signal S3 to the drive member 15 to set the orientation of the swing mirror 14 to a predetermined orientation.

Hereinafter, the central optical path P4a, the right optical path P4b, and the left optical path P4c are also collectively or individually referred to as the fourth optical path P4. Also, the central condensing point Fa, the right condensing point Fb, and the left condensing point Fc are also collectively or individually referred to as the condensing point FP.

As an example, the condensing optical system 16 is a so-called fθ lens system. When the projection characteristic of the condensing optical system 16 is fθ, the distance from the central condensing point Fa on the illuminated surface 17 to the right condensing point Fb or the left condensing point Fc is the first light flux exiting the swing mirror 14. It is proportional to the deviation angle from the +Z direction of the traveling direction of R1 and the second light beam R2. In other words, the X position of the focal point FP on the illuminated surface 17 is proportional to the rotation angle θ of the swing mirror 14 from the above-described reference position about the Y direction.
Note that the projection characteristic of the condensing optical system 16 is not limited to fθ. The projection characteristic of the condensing optical system 16 may be, for example, an equisolid angle projection characteristic or an orthogonal projection characteristic.

The first light beam R1 supplied from the light source 10 passes through the first optical path P1, the third optical path P3, and the fourth optical path P4, and reaches the processed surface 18s of the workpiece 18 arranged on the irradiated surface 17. be irradiated. The second light beam R2 emitted from the measurement light source 23a (measurement unit 23) passes through the above-described second optical path P2, third optical path P3, and fourth optical path P4, and reaches the workpiece 18 placed on the irradiation surface 17. is applied to the surface 18s to be processed. As with the third optical path P4, the fourth optical path P4 can also be said to be an optical path in which at least a portion of the first optical path P1 for the first light flux R1 and the second optical path P2 for the second light flux R2 overlap.

In the optical processing device 1 of the first embodiment, the first beam R1 is a beam for processing the surface 18s to be processed. That is, the first light beam R1 evaporates or melts the surface to be processed 18s itself (so-called removal processing), adds an object to the surface to be processed 18s (so-called additional processing), alters the surface to be processed 18s, Alternatively, the portion of the surface to be processed 18s irradiated with the first light flux R1 is processed by exposing, evaporating, or causing a chemical reaction in the film material formed on the surface to be processed 18s. Note that the first light beam R1 may not be a light beam for processing the surface 18s to be processed. The first beam R1 may be, for example, a beam for measuring the surface to be processed 18s.

In the optical processing device 1 of the first embodiment, the second light flux R2 of the second wavelength is, for example, a light flux for measuring the position of the surface to be processed 18s. The second light flux R2 is applied to a portion of the surface 18s to be processed, and the second light flux R2 reflected or scattered by the surface 18s to be processed returns to the combining element 12 via the fourth optical path P4 and the third optical path P3. . Then, the second light beam R2 is reflected by the dichroic reflecting surface 12r of the synthesizing element 12, passes through the second optical path P2, and is received by the measuring section 23 (light receiving section 23c). The second light beam R2 reflected or scattered by the surface 18s to be processed and received by the measurement unit 23 (light receiving unit 23c) can also be referred to as detection light. In addition, the second light flux R2 may not be a light flux for measuring the surface to be processed 18s. The second beam R2 may be, for example, a beam for processing the surface 18s to be processed. When the first light beam R1 is for measuring the surface 18s to be processed, the second light beam R2 may be for processing the surface 18s to be processed. When the first light beam R1 is for processing the surface 18s to be processed, the second light beam R2 may also be for processing the surface 18s to be processed. If the first beam R1 is for measuring the surface 18s to be processed, the second beam R2 may also be for measuring the surface 18s to be processed.
Although the second wavelength is longer than the first wavelength in this embodiment, the second wavelength may be shorter than the first wavelength.

Information about the intensity of the detected light detected by the measurement unit 23 (light receiving unit 23c) is sent to the calculation unit 24. The calculator 24 calculates position information about the portion of the surface to be processed 18s irradiated with the second beam R2 based on the information about the intensity of the detection light detected by the measuring unit 23 . The position information calculated by the calculator 24 is one or more of information on the X position, information on the Y position, and information on the Z position of the surface 18s to be processed.

The measurement unit 23 may include an interferometer, for example. A three-dimensional shape measuring device disclosed in Japanese Patent No. 5231883 may be applied as such a position measuring unit.
The calculation unit 24 also calculates the position information regarding the surface 18s to be processed based on the signal S6 including the information regarding the position information of the sample table 19 or the rotation angle of the oscillating mirror 14 transmitted from the control unit 22. Also good.

The position information of the workpiece 18s calculated by the calculator 24 is the coordinates of the workpiece 18s, a point group of a plurality of points included in the workpiece 18s, and a three-dimensional model representing the workpiece 18s. Also good.
Instead of or in addition to the information about the position of the surface 18s to be processed, the measurement unit 23 measures the shape of the surface 18s to be processed, the surface roughness of the surface 18s to be processed, the temperature of the surface 18s to be processed, the reflection of the surface 18s to be processed, At least one of the transmission rate and the transmittance of the surface 18s to be processed may be detected.

FIG. 2 is a conceptual diagram showing a fourth optical path P4 condensed on the surface 17 to be illuminated by the condensing optical system 16. As shown in FIG. In FIG. 2, only one lens L15 closest to the illuminated surface 17 is shown in the condensing optical system 16 for simplification.
Chromatic aberration remains in the condensing optical system 16, although it is slight. Therefore, the condensing point FP of the light irradiated onto the illuminated surface 17 through the fourth optical path P4 is the first condensing point FP1 of the first light beam R1 of the first wavelength, and the light of the first wavelength different from the first wavelength. It is separated into a second condensing point FP2 of a second light flux R2 of two wavelengths.

Hereinafter, the difference in Z position between the first focal point FP1 and the second focal point FP2 will be referred to as axial chromatic aberration D1, and the difference in position in the XY in-plane direction will be referred to as lateral chromatic aberration D2.
In addition, in FIG. 2, as an example, the surface on which the first focal point FP1 is formed is shown as the irradiated surface 17. As shown in FIG. Note that the plane on which the first condensing point FP1 is formed may be referred to as the image plane of the condensing optical system 16 .

The optical processing device 1 uses the second beam R2 to determine the irradiation position of the first beam R1 on the surface to be processed 18s based on the position information of the surface to be processed 18s detected and calculated by the measurement unit 23 and the calculation unit 24. , the number of times of irradiation, and irradiation conditions. The number of times of irradiation of the first light beam R1 is the number of times of irradiation of the first light beam R1 per unit time, the number of times of irradiation of the first light beam R1 to a predetermined position on the surface 18s to be processed, and the like. The conditions may include, for example, the intensity of the first light flux R1, the wavelength of the first light flux R1, and the like.

However, the positional information of the surface to be processed 18s detected and calculated by the measuring unit 23 and the calculating unit 24 is positional information measured using the second light beam R2 of the second wavelength. Therefore, this position information has an error corresponding to the above-described axial chromatic aberration D1 and chromatic aberration of magnification D2 with respect to the position of the surface to be processed 18s based on the first light flux R1 of the first wavelength used for optical processing. .

In the optical processing device 1 of the first embodiment, the correction optical system 11 arranged on the first optical path P1 of the optical device 2 is arranged at a condensing position (first condensing position) of the first light beam R1 near the surface 17 to be illuminated. The position of the point FP1) is brought closer to the condensing position of the second light flux R2 (the position of the second condensing point FP2). Therefore, compared to the case where the correction optical system 11 is not provided, the magnitude of the longitudinal chromatic aberration D1 described above is reduced.

Here, when the focal length of the condensing optical system 16 is positive (positive refractive power) and the axial chromatic aberration of the condensing optical system 16 is insufficiently corrected (that is, the back focus of the condensing optical system 16 at the first wavelength is is shorter than the back focus of the condensing optical system 16 at the second wavelength), by making the focal length of the correction optical system 11 arranged in the first optical path P1 of the optical device 2 negative (negative refractive power), The absolute value of the difference between the back focus at the first wavelength of the combined optical system of the light optical system 16 and the correction optical system 11 and the back focus at the second wavelength of the condensing optical system 16 is It can be smaller than the absolute value of the difference between the back focus at the first wavelength and the back focus at the second wavelength of the condensing optical system 16 .

On the other hand, when the focal length of the condensing optical system 16 is positive (positive refractive power) and the longitudinal chromatic aberration of the condensing optical system 16 is overcorrected (that is, the back focus of the condensing optical system 16 at the first wavelength is longer than the back focus of the condensing optical system 16 at the second wavelength), by making the focal length of the correction optical system 11 arranged in the first optical path P1 of the optical device 2 positive (positive refractive power) , the absolute value of the difference between the back focus at the first wavelength of the combined optical system of the condensing optical system 16 and the correction optical system 11 and the back focus of the condensing optical system 16 at the second wavelength, 16 at the first wavelength and the back focus at the second wavelength of the condensing optical system 16 (when the refractive power of the condensing optical system 16 is positive and the condensing optical system 16 is overcorrected, the optical device will be described in detail in the second embodiment).
The back focus of the optical system can be the distance along the optical axis of the optical system from the optical surface of the optical member closest to the emission side of the optical system to the rear focal position of the optical system.
Therefore, the error due to the longitudinal chromatic aberration D1 included in the positional information of the surface to be processed 18s detected and calculated by the measuring unit 23 and the calculating unit 24 is reduced, and the positional information of the surface to be processed 18s is calculated more accurately. be able to.

In general, due to the chromatic aberration remaining in the condensing optical system 16, the angle φ1 of the principal ray R1p of the first light beam R1 with respect to the normal N1 of the surface to be irradiated 17 and the second angle with respect to the normal N2 of the surface to be irradiated 17 The angle φ2 of the principal ray R2p of the luminous flux R2 may be different.

In the optical processing device 1 of the first embodiment, by optimizing the optical design of the optical device 2, the absolute values of the angles φ1 and φ2 are both set to 1° or less. That is, even if the position of the fourth optical path P4 changes to the position of the central optical path P4a, the right optical path P4b, the left optical path P4c, etc. shown in FIG. The light ray R2p is incident on the illuminated surface 17 at an incident angle of 1° or less. It can also be said that the angles of the principal ray R1p of the first light beam R1 and the principal ray R2p of the second light beam R2 with respect to the normal line (Z direction) at the condensing positions are within 1°. It can also be said that the object side (surface to be processed 18s side) of the optical device 2 (optical processing device 1) has telecentric characteristics.

As a result, even if the surface to be processed 18s is slightly displaced in the Z direction from the surface to be irradiated 17 due to unevenness or the like, the desired X and Y positions of the surface to be processed 18s can be obtained. It is possible to irradiate one light flux R1 and accurately process the surface 18s to be processed. Similarly, the desired X-position and Y-position of the surface 18s to be processed can be accurately measured.

In addition, when the surface to be processed 18s can always be accurately aligned with the surface to be irradiated 17, such as when the surface to be processed 18s has little unevenness, the incidence of the principal ray R1p and the principal ray R2p on the surface to be irradiated 17 The angle may be 1° or more.
In this specification, the “principal ray” may be a line connecting the center of gravity of light amount in the cross section of each light beam at different Z positions in each of the first light beam R1 and the second light beam R2.

In the optical processing device 1 and the optical device 2 of the first embodiment, the axial chromatic aberration D1 or the chromatic aberration of magnification D2 occurring between the first light flux R1 and the second light flux R2 is reduced. However, the position information correction unit 25 described below may be used to further reduce the adverse effects of the longitudinal chromatic aberration D1 or the chromatic aberration of magnification D2 by numerical correction.

The position information correction unit 25 is a unit that numerically corrects the longitudinal chromatic aberration D1 or the chromatic aberration of magnification D2. Information about the rotation angle of the oscillating mirror 14 or information about the X position of the focal point FP of the light beam traveling along the fourth optical path P4 determined by the rotation angle of the oscillating mirror 14 is sent from the control unit 22 to the position information correction unit 25. A signal S8 is input, including:

The position information correction unit 25 provides numerical data indicating the relationship between the rotation angle of the swing mirror 14 or the X position of the focal point FP of the light beam traveling along the fourth optical path P4 and at least one of the longitudinal chromatic aberration D1 and the chromatic aberration of magnification D2. The aberration information of the condensing optical system 16 is stored. The position information correction unit 25 may also store information on the so-called telecentricity of the condensing optical system 16 . Hereinafter, the above-described aberration information and information on telecentricity may be collectively referred to as information on the characteristics of the condensing optical system 16 . Based on the information on the rotation angle of the oscillating mirror 14 sent from the control unit 22 or the information on the X position of the focal point FP, the position information correction unit 25 corrects the information on the characteristics of the condensing optical system 16 to: At least one of the longitudinal chromatic aberration D1 and the lateral chromatic aberration D2 at the focal point FP is calculated.

The position information correction unit 25 corrects the position information of the surface to be processed 18s calculated by the calculation unit 24 and transmitted as the signal S9 based on at least one of the axial chromatic aberration D1 and the chromatic aberration of magnification D2 calculated as described above. Then, the position information correction unit 25 sends back the corrected position information of the surface 18s to be processed to the calculation unit 24 as a signal S10.

It should be noted that the position information correction unit 25 may return the amount by which the position information should be corrected as the signal S10 to the calculation unit 24 instead of correcting the position information itself of the surface to be processed 18s described above. In this case, the calculation unit 24 may correct the position information of the surface to be processed 18s using the correction amount transmitted from the position information correction unit 25 .

Note that if the chromatic aberration of the optical device 2 including the condensing optical system 16 is sufficiently suppressed by the correcting optical system 11, the position information corrector 25 may not be provided.
Further, when the longitudinal chromatic aberration D1 generated between the first light beam R1 and the second light beam R2 is sufficiently suppressed by the correction optical system 11 and the chromatic aberration of magnification D2 is large, the position information corrector 25 is used. may be used to correct the position information of the surface to be processed 18s.

(Example of optical design of optical device)
FIG. 3 is a diagram showing an optical design example of the optical device 2. As shown in FIG. As an example, the optical device 2 of the design example shown in FIG. Light is generally condensed on the irradiation surface 17 .

The numerical table shown in FIG. 3 includes the radius of curvature R [mm] of each surface of optical parts such as lenses and mirrors constituting the optical device 2, which is defined by the surface number (Surface No.) shown on the left end, and It represents the surface distance D [mm] and the refractive index of the optical component.

The surface numbers shown in FIG. 3 are the surface numbers of the surfaces on which the light from the light source 10 or the measurement unit 23 is incident among the above-described optical components (correction optical system 11, synthesizing element 12, lenses L11 to L15). is a surface number obtained by adding a to the end of the reference numeral of the optical component. For example, the surface number 11a is the surface number of the surface of the correction optical system 11 on which the light from the light source 10 is incident.

The surface number of the surface from which the light from the light source 10 or the measurement unit 23 is emitted is the surface number obtained by adding b to the end of the reference numeral of the optical component. For example, the surface number L11b is the surface number of the surface of the lens L11 included in the condensing optical system 16 on the side of the lens L12.

Surface numbers

13 and 14 indicate reflecting surfaces of the fixed mirror 13 and the oscillating mirror 14, respectively.

The surface distance D represents the distance between the surface designated by the surface number and the next surface on the irradiated surface 17 side with respect to that surface. Note that the surface distance D shown in the row of the surface number L15b is the distance between the surface of the surface number L15b and the irradiated surface 17. FIG.
Further, the surface distance D between the surface number 13 and the surface number 14 is expressed as a negative numerical value because the fixed mirror 13 is a mirror.

The refractive index represents the refractive index of an optical member arranged between the surface specified by the surface number and the next surface on the illuminated surface 17 side with respect to that surface.
The refractive index in the column labeled WL532 [nm] is the refractive index for light of 532 [nm], which is an example of the wavelength (first wavelength) of the first light flux R1.
The refractive index in the column labeled WL1550 [nm] is the refractive index for light of 1550 [nm], which is an example of the wavelength (second wavelength) of the second light flux R2.

The fixed mirror 13 and the oscillating mirror 14 have a refractive index of -1.
In addition, since the second light beam R2 of the second wavelength does not pass through the first optical path P1 in which the correction optical system 11 is arranged, the correction optical system 11, that is, the

surface numbers

11a and 11b, is refracted at the second wavelength. rate is not shown.

In the optical device 2 shown in FIG. 1, in order to show the size of each optical member with a sufficient size necessary for explanation, of the third optical path P3, the front third optical path P3a and the middle third optical path P3a The length of the optical path P3b is displayed shorter than the design example shown in FIG. The same applies to the distance between the correction optical system 11 and the synthesizing element 12 .

As can be seen from the refractive index shown in FIG. 3, in the optical device 2, the transmitting members (the correcting optical system 11, the synthetic element 12, and the lenses L11 to L15) constituting the optical device 2 are all made of quartz glass, which is the same material. ing. Therefore, originally, it cannot be said that the optical system is suitable for correcting chromatic aberration, especially axial chromatic aberration D1.
However, in the optical design example shown in FIG. 3, the first converging point FP1 (condensing position) of the first light beam R1 in the vicinity of the surface to be illuminated 17 is caused by the correction optical system 11 arranged on the first optical path P1. can be brought closer to the second condensing point FP2 (condensing position) of the second light beam R2.

The optical design example shown in FIG. 3 will be described in further detail below.
The correction optical system 11 has a negative refractive power, and the focal length fc at the first wavelength 532 [nm] is -1133.2 [mm]. The condensing optical system 16 includes a lens L11 (first lens) arranged on the incident side and having negative refractive power, and a second lens group G20 including a plurality of lenses L12 to L15 and having positive refractive power as a whole. have. The condensing optical system 16 has positive refractive power as a whole, and the focal length fg at the first wavelength of 532 [nm] is 100.0 [mm].

Therefore, the focal length fc of the correcting optical system 11 and the focal length fg of the condensing optical system 16 are in the relationship of the following formula (1).
|fc| > 10×fg (1)
That is, the absolute value of the focal length fc of the correction optical system 11 is set to be ten times or more the focal length fg of the condensing optical system 16. In other words, the absolute value of the refractive power of the correction optical system 11 (| 1/fc|) is set to 1/10 or less of the refractive power of the condensing optical system 16 .

As a result, the optical device 2 as a whole can appropriately correct chromatic aberration without causing the correcting optical system 11 to correct excessive chromatic aberration, and the longitudinal chromatic aberration D1 or the chromatic aberration of magnification D2 can be further reduced. It becomes possible.
In addition, when the longitudinal chromatic aberration D1 or the chromatic aberration of magnification D2 may remain to some extent, the correction optical system 11 and the condensing optical system 16 do not necessarily have to satisfy the formula (1).

In the optical design example shown in FIG. 3, the back focus of the combined optical system of the condensing optical system 16 and the correction optical system 11 at the first wavelength is 144.7 mm, and the back focus of the condensing optical system 16 at the second wavelength is 144.7 mm. is 144.7 mm. The back focus of the condensing optical system 16 at the first wavelength is 137.0 mm, and the back focus of the condensing optical system 16 at the second wavelength is 144.7 mm. Therefore, the absolute value of the difference between the back focus of the combined optical system of the condensing optical system 16 and the correction optical system 11 at the first wavelength and the back focus of the condensing optical system 16 at the second wavelength is 0 mm. It is set to be smaller than the absolute value (7.7 mm) of the difference between the back focus of the condensing optical system 16 at one wavelength and the back focus of the condensing optical system 16 at the second wavelength.

As a result, the condensing position of the first light flux R1 (the position of the first condensing point FP1) in the vicinity of the illuminated surface 17 is brought closer to the condensing position of the second light flux R2 (the position of the second condensing point FP2). becomes possible.
The correction optical system 11 is not limited to an optical system having negative refractive power, as described above or later, and may be an optical system having positive refractive power.

In the first embodiment, instead of arranging the correction optical system 11 having a negative focal length (negative refractive power) in the first optical path P1 on the incident side of the first light beam R1 of the synthesizing element 12, the positive focal point The correction optical system 11 having a distance (positive refractive power) is placed on the second optical path P2 (for example, It may be arranged in the second optical path P2) between the measurement unit 23 and the combining element 12). Note that the correction optical system 11 having a positive focal length (positive refractive power) may be arranged on the second optical path P2 between the measurement light source 23a and the synthesizing element 12. FIG.

Here, when the focal length of the condensing optical system 16 is positive (positive refractive power) and the axial chromatic aberration of the condensing optical system 16 is insufficiently corrected (that is, the back focus of the condensing optical system 16 at the second wavelength is longer than the back focus of the condensing optical system 16 at the first wavelength), the focal length of the correcting optical system 11 arranged in the second optical path P2 on the incident side of the second light flux R2 of the combining element 12 is positive (refractive By making the power positive, the back focus at the second wavelength of the combined optical system of the condensing optical system 16 and the correcting optical system 11 (correcting optical system having a positive focal length) and the back focus of the condensing optical system 16 The absolute value of the difference between the back focus at the first wavelength and the absolute value of the difference between the back focus at the second wavelength of the condensing optical system 16 and the back focus at the first wavelength of the condensing optical system 16 is greater than can be made smaller.
In addition, when the correction optical system 11 is arranged in the second optical path P2 instead of the first optical path P1, it can be said that the correction optical system is not arranged in the first optical path P1.

Note that the condensing optical system 16 may be provided interchangeably with a second condensing optical system different from the illustrated condensing optical system 16 (hereinafter also referred to as "first condensing optical system"). . Further, the correction optical system 11 may be provided interchangeably with a second correction optical system different from the illustrated correction optical system 11 (hereinafter also referred to as "first correction optical system"). In this case, the first condensing optical system and the second condensing optical system are exchanged by a member exchange mechanism (not shown) such as a turret or an auto tool changer so that one of the optical systems is arranged in the optical path. It may be configured to be possible. Similarly, the first correction optical system and the second correction optical system can be exchanged so that one of them is placed in the optical path by a member exchange mechanism (not shown) such as a turret or an auto tool changer. may be configured.

In this case, when the above-described second condensing optical system is used as the condensing optical system 16, the above-described second correcting optical system may be used as the correcting optical system 11. FIG.
Back focal lengths may be different between the first condensing optical system and the second condensing optical system, and focal lengths may be different between the first correcting optical system and the second correcting optical system.

Further, when the back focus of the first condensing optical system is shorter than the back focus of the second condensing optical system, the focal length of the second correcting optical system may be longer than the focal length of the first correcting optical system.
If the back focus of the first condensing optical system is longer than the back focus of the second condensing optical system, the focal length of the second correcting optical system may be shorter than the focal length of the first correcting optical system.

(Effect of the optical processing device of the first embodiment)
(1) The optical processing device 1 of the first embodiment described above has a first optical path P1 for the first light flux R1 of the first wavelength and a second light flux R2 for the second wavelength longer than the first wavelength. A synthesizing element 12 for synthesizing the two optical paths P2, and a condensing element having positive refractive power for converging the first light flux R1 and the second light flux R2 from the synthesizing element 12 toward the workpiece 18. It has an optical system 16 and a correction optical system 11 having a negative refractive power. The correction optical system 11 is arranged on the first optical path P1 on the incident side of the combining element 12, and one of the first light beam R1 and the second light beam R2 is a light beam for processing the workpiece 18. The other one of the first light beam R1 and the second light beam R2 is a light beam for measuring the workpiece 18 .
With this configuration, the position of the surface 18s to be processed of the workpiece 18 can be detected by the second light beam R2 of the second wavelength, and the surface 18s to be processed can be processed by the first light beam R1 of the first wavelength. Therefore, the position of the surface to be processed 18s can be detected with high accuracy, and the surface to be processed 18s can be processed with high accuracy based on the highly accurate detection result.

(Optical processing device of the second embodiment)
FIG. 4 is a diagram schematically showing the configuration of the condensing optical system 16a of the optical device 2a provided in the optical processing apparatus of the second embodiment. The optical device 2a includes the optical device 2 provided in the optical processing device 1 of the first embodiment described above, except that the condensing optical system 16 is replaced with the condensing optical system 16a and the design data of the correction optical system 11 is changed. , the same reference numerals are given to the same configurations, and the description thereof will be omitted as appropriate.
The optical processing device of the second embodiment is obtained by replacing the optical device 2 of the optical processing device 1 of the first embodiment with an optical device 2a.

Similar to the optical device 2 provided in the optical processing device 1 of the first embodiment shown in FIG. ing. After the first light beam R1 and the second light beam R2 from the measurement unit 23 are merged by the combining element 12, they are reflected by the fixed mirror 13 and the swing mirror 14, and enter the condensing optical system 16a. Then, the first light flux R1 and the second light flux R2 are generally condensed on the illuminated surface 17 by the condensing optical system 16 . Also in the optical processing device 1 (optical device 2a) of the second embodiment, as in the first embodiment, the first wavelength of the first light beam R1 and the second wavelength of the second light beam R2 are different from each other. The wavelength is longer than the first wavelength.
FIG. 4 shows only the correction optical system 11S, the oscillating mirror 14, and the condensing optical system 16a of the optical device 2a, and the rest of the configuration is omitted.

The condensing optical system 16a is an optical system including a plurality of lenses (L21 to L28). Among them, the lens L21 arranged on the most incident side is, for example, a lens having a negative refractive power. Below, the lens L21 is also called the first lens. The lenses (L22 to L28) arranged closer to the irradiated surface 17 side (downstream side) than the lens L21 constitute the second lens group G21 and have positive refractive power as a whole. The first light flux R1 and the second light flux R2 are generally condensed on the illuminated surface 17 by the refractive power of the condensing optical system 16a.

(Example of optical design of an optical device included in the optical processing device of the second embodiment)
FIG. 5 is a diagram showing an optical design example of the optical device 2a included in the optical processing device of the second embodiment. The items described in the numerical table shown in FIG. 5 are the same as the items shown in the numerical table shown in FIG. The surface number on the left end of the numerical table shown in FIG. 5 is the same as the surface number in FIG. It is obtained by adding b if it is a surface on the exit side.

As can be seen from the refractive index shown in FIG. 5, in the optical device 2a, each of the transmitting members (the correction optical system 11, the synthetic element 12, and the lenses L11 to L15) constituting the optical device 2a is made of quartz glass and fluorite. made of any of the following materials: Compared to the optical device 2 described above, the optical device 2a has a configuration in which the chromatic aberration of magnification D2 is corrected more by the condensing optical system 16a, and the longitudinal chromatic aberration D1 is overcorrected.

In addition, the correction optical system 11S arranged on the first optical path P1 can bring the overcorrection of the longitudinal chromatic aberration D1 of the condensing optical system 16a closer to a proper correction state. can be brought closer to the second condensing point FP2 (condensing position) of the second light flux R2.
That is, in the optical processing device 1 (optical device 2a) of the second embodiment, the correction optical system 11S arranged in the first optical path P1 of the optical device 2a converges the first light flux R1 in the vicinity of the irradiated surface 17. The light position (the position of the first condensing point FP1) is brought closer to the condensing position of the second light flux R2 (the position of the second condensing point FP2). Therefore, compared with the case where the correction optical system 11S is not provided, the magnitude of the longitudinal chromatic aberration D1 described above is reduced.

Here, when the focal length of the condensing optical system 16a is positive (positive refractive power) and the longitudinal chromatic aberration D1 of the condensing optical system 16a is overcorrected (that is, the back of the condensing optical system 16a at the first wavelength). When the focus is longer than the back focus of the condensing optical system 16a at the second wavelength), the focal length of the correction optical system 11S arranged in the first optical path P1 of the optical device 2a is made positive (the refractive power is positive). Thus, the absolute value of the difference between the back focus at the first wavelength of the combined optical system of the condensing optical system 16a and the correcting optical system 11S and the back focus at the second wavelength of the condensing optical system 16a is It can be made smaller than the absolute value of the difference between the back focus of the optical system 16a at the first wavelength and the back focus of the condensing optical system 16a at the second wavelength.

Incidentally, in the optical processing device 1 and the optical device 2a of the second embodiment, the chromatic aberration of magnification D2 occurring between the first light flux R1 and the second light flux R2 is corrected by the condensing optical system 16a. At this time, there is an advantage that the chromatic aberration of magnification D2 can be easily corrected by overcorrecting the axial chromatic aberration D1 of the condensing optical system 16a.

Also in the optical processing device 1 of the second embodiment provided with the optical device 2a, the principal ray R1p and the principal ray R2p (see FIG. 2) are incident on the irradiated surface 17 at an incident angle within 1°. is designed to The angle of incidence of the principal ray R1p and the principal ray R2p on the irradiated surface 17 may be 1° or more. It can also be said that the angle of the principal ray R1p and the principal ray R2p with respect to the normal line (Z direction) at each condensing position is within 1°. It can also be said that the object side (the side of the processed surface 18s) of the optical device 2a has telecentric characteristics.

The optical design example of the optical device 2a shown in FIG. 5 will be described in further detail below. In the optical device 2a, the correction optical system 11S has positive refractive power, and the focal length fc at the first wavelength 532 [nm] is 6361.5 [mm]. The condensing optical system 16a includes a lens L21 (first lens) arranged on the incident side and having negative refractive power, and a second lens group G21 including a plurality of lenses L22 to L28 and having positive refractive power as a whole. have.

The condensing optical system 16a as a whole has positive refractive power, and the focal length fg at the first wavelength of 532 [nm] is 100.0 [mm].
Therefore, also in the optical device 2a, the focal length fc of the correcting optical system 11 and the focal length fg of the condensing optical system 16a satisfy the relationship of the above-described formula (1).

The second lens group G21 has a positive refractive power and includes at least one positive lens such as a lens L28 made of fluorite, which is the first lens material. It includes at least one negative lens such as lens L27 made of some quartz glass. Below, the Abbe number ν of the lens material is calculated using the refractive index n1 for the first wavelength (533 [nm]) and the refractive index n2 for the second wavelength (1550 [nm]) of the lens material, ν=(n2 -1)/(n2-n1).

In the optical device 2a, the Abbe number .nu.1 of the first lens material (fluorite) and the Abbe number .nu.2 of the second lens material (quartz glass) satisfy the relationship of formula (2).
ν1 > ν2 (2)
As a result, the chromatic aberration of the condensing optical system 16 can be satisfactorily corrected, and the axial chromatic aberration D1 or the chromatic aberration of magnification D2 can be further reduced.
In addition, when the axial chromatic aberration D1 or the chromatic aberration of magnification D2 may remain to some extent, the Abbe number ν1 and the Abbe number ν2 do not necessarily have to satisfy the formula (2).

In the optical design example shown in FIG. 5, the back focus of the combined optical system of the condensing optical system 16a and the correction optical system 11S at the first wavelength is 99.9 mm, and the back focus of the condensing optical system 16 at the second wavelength is 99.9 mm. is 100.0 mm. The back focus of the condensing optical system 16 at the first wavelength is 101.5 mm, and the back focus of the condensing optical system 16 at the second wavelength is 100.0 mm. Therefore, the absolute value of the difference between the back focus of the combined optical system of the condensing optical system 16a and the correction optical system 11S at the first wavelength and the back focus of the condensing optical system 1a at the second wavelength is 0.1 mm. , is set smaller than the absolute value (1.5 mm) of the difference between the back focus of the condensing optical system 16a for the first wavelength and the back focus of the condensing optical system 16a for the second wavelength.
As a result, the condensing position of the first light flux R1 (the position of the first condensing point FP1) in the vicinity of the illuminated surface 17 is brought closer to the condensing position of the second light flux R2 (the position of the second condensing point FP2). becomes possible.

In the second embodiment, the correcting optical system 11S having a positive focal length (positive refractive power) is positioned on the first optical path on the incident side of the first light beam R1 of the synthesizing element 12 of the optical processing device 1 (optical device 2a). Instead of arranging it in P1, the correction optical system 11S having a negative focal length (negative refractive power) is arranged in the second optical path P2 (for example, the measuring unit 23 and the combining element 12 in the second optical path P2). Note that the correction optical system 11S having a negative focal length (negative refractive power) may be arranged on the second optical path P2 between the measurement light source 23a and the synthesizing element 12. FIG.

Here, when the focal length of the condensing optical system 16a is positive (the refractive power is positive) and the axial chromatic aberration of the condensing optical system 16a is overcorrected (that is, the back focus of the condensing optical system 16a at the second wavelength is shorter than the back focus of the condensing optical system 16a at the first wavelength), the focal length of the correcting optical system 11S arranged in the second optical path P2 on the incident side of the second light beam R2 of the combining element 12 is negative ( By making the refractive power negative, the back focus at the second wavelength of the combined optical system of the condensing optical system 16a and the correcting optical system 11S (correcting optical system having a negative focal length) and the condensing optical system 16a from the absolute value of the difference between the back focus at the first wavelength of the condensing optical system 16a and the back focus at the first wavelength of the condensing optical system 16a can be made smaller.

The chromatic aberration of magnification D2 occurring between the first light beam R1 and the second light beam R2 is corrected by the condensing optical system 16a. Therefore, there is an advantage that it becomes easy to correct the chromatic aberration of magnification D2.

Note that the condensing optical system 16a may be provided interchangeably with a second condensing optical system different from the illustrated condensing optical system 16a (hereinafter also referred to as "first condensing optical system"). . Further, the correction optical system 11S may be provided interchangeably with a second correction optical system different from the illustrated correction optical system 11S (hereinafter also referred to as "first correction optical system"). In this case, the first condensing optical system and the second condensing optical system are exchanged by a member exchange mechanism (not shown) such as a turret or an auto tool changer so that one of the optical systems is arranged in the optical path. It may be configured to be possible. Similarly, the first correction optical system and the second correction optical system can be exchanged so that one of them is placed in the optical path by a member exchange mechanism (not shown) such as a turret or an auto tool changer. may be configured.

In this case, when the second condensing optical system described above is used as the condensing optical system 16a, the second correcting optical system described above may be used as the correcting optical system 11S.
Back focal lengths may be different between the first condensing optical system and the second condensing optical system, and focal lengths may be different between the first correcting optical system and the second correcting optical system.

As in the second embodiment, the focal length of the condensing optical system 16a is positive (the refractive power is positive), the axial chromatic aberration D1 of the condensing optical system 16a is overcorrected, and the first optical path P1 of the optical device 2a has When the focal length of the correction optical system 11S to be arranged is positive (positive refractive power), the magnitude of the back focus at the first wavelength of the first condensing optical system at the first wavelength of the second condensing optical system is If it is shorter than the back focus, the focal length of the second correction optical system at the first wavelength may be longer than the focal length of the first correction optical system at the first wavelength.

On the other hand, when the back focus at the first wavelength of the first condensing optical system is longer than the back focus at the first wavelength of the second condensing optical system, the focal length at the first wavelength of the first correcting optical system is longer than the focal length of the second The correction optical system may have a short focal length at the first wavelength.

Note that when the absolute value of the back focus at the first wavelength of the first condensing optical system is smaller than the absolute value of the back focus at the first wavelength of the second condensing optical system, the first correction optical system at the first wavelength The absolute value of the focal length at the first wavelength of the second correction optical system may be larger than the absolute value of the focal length.
On the other hand, when the absolute value of the back focus at the first wavelength of the first condensing optical system is greater than the absolute value of the back focus at the first wavelength of the second condensing optical system, the first correction optical system at the first wavelength The absolute value of the focal length of the second correction optical system at the first wavelength may be smaller than the absolute value of the focal length.

As in the second embodiment, the focusing optical system 16a has a positive focal length (positive refractive power) and the longitudinal chromatic aberration D1 of the focusing optical system 16a is overcorrected. Instead of the correcting optical system 11S having a focal length (negative refractive power), a correcting optical system 11S having a negative focal length (negative refractive power) is provided at the second beam R2 incident side of the combining element 12. When arranged on the optical path P2 (for example, the second optical path P2 between the measurement unit 23 and the synthesizing element 12), the back focus at the second wavelength of the first condensing optical system is the second wavelength of the second condensing optical system. If the wavelength is shorter than the back focus, the focal length of the second correction optical system at the second wavelength may be longer than the focal length of the first correction optical system at the second wavelength.
On the other hand, when the back focus at the second wavelength of the first condensing optical system is longer than the back focus at the second wavelength of the second condensing optical system, the focal length of the first correction optical system at the second wavelength is longer than the focal length of the second The correction optical system may have a short focal length at the second wavelength.

Note that when the absolute value of the back focus at the second wavelength of the first condensing optical system is smaller than the absolute value of the back focus at the second wavelength of the second condensing optical system, at the second wavelength of the first correction optical system The absolute value of the focal length of the second correction optical system at the second wavelength may be larger than the absolute value of the focal length.
On the other hand, when the absolute value of the back focus at the second wavelength of the first condensing optical system is greater than the absolute value of the back focus at the second wavelength of the second condensing optical system, The absolute value of the focal length of the second correction optical system at the second wavelength may be smaller than the absolute value of the focal length.

In each of the embodiments described above, modified examples described later, and embodiments described later, the number of lenses constituting the condensing

optical systems

16 and 16a is not limited to the number described above, and may be any other number. or may include mirrors or diffractive optical elements.
Also, the condensing

optical systems

16 and 16a do not have a cemented lens, but may be an optical system having a cemented lens.
The correction

optical systems

11 and 11S may also have a plurality of lenses instead of a single lens, or may include mirrors or diffractive optical elements.

The wavelengths of the first wavelength used for optical processing and the second wavelength used for measurement are not limited to the wavelengths described above, and may be other wavelengths.
Also, the first lens material and the second lens material are not limited to the above-described fluorite and quartz glass, respectively, and other translucent materials may be used.

The oscillating mirror 14 may oscillate not only about the rotation axis parallel to the Y direction, but also about the rotation axis parallel to the XZ direction as described above. In this case, the position of the focal point FP on the illuminated surface 17 can be moved not only in the X direction described above but also in the Y direction. Note that the oscillating mirror 14 may oscillate about a rotation axis parallel to the XZ direction instead of the Y direction. In this case, the position of the focal point FP on the illuminated surface 17 can be moved in the Y direction.
If it is sufficient to move the sample stage 19 with respect to the guide 20 to move the workpiece 18 and the focal point FP relative to each other in the X and Y directions, the oscillating mirror 14 may not be provided. .

It should be noted that when the swinging mirror 14 is provided as described above, the X position (or further the Y position) of the focal point FP on the irradiated surface 17 can be moved at high speed. As a result, the focal point FP can be moved at high speed on the surface 18s to be processed of the workpiece 18, and the throughput of the optical processing apparatus 1 can be further improved.

Note that instead of the fixed mirror 13, a rocking mirror that can rock may be arranged. In this case, the oscillating mirror instead of the fixed mirror 13 may oscillate around the rotation axis parallel to the XZ direction, and the oscillation mirror 14 may oscillate around the rotation axis parallel to the Y direction as described above. It can swing. In this case, the first light beam R1 and the second light beam R2 are scanned in the X direction and the Y direction within the plane of the irradiated surface 17 .

In addition to the oscillating mirror 14, a plurality of oscillating mirrors may be arranged in the third optical path P3 (that is, an optical path in which at least a portion of the first optical path P1 and the second optical path P2 overlap). In this case, the fixed mirror 13 may be removed from the third optical path P3.

As described above, the optical processing device 1 and the optical processing device of the second embodiment may not include the position information correction section 25 .
Further, the optical processing device 1 does not have to include the calculator 24 . If the calculation unit 24 is not provided, the measurement unit 23 transmits information about the detected light amount signal of the second light flux R2 to an external calculation unit (not shown), and the external calculation unit determines the position of the surface to be processed 18. information should be calculated. It should be noted that the optical processing device 1a of a modified example, which will be described later, does not have to include the position information corrector 25 either.

The optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) may not have the light source 10. For example, , the optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) from the light source provided outside the light guide member such as an optical fiber The first light beam L1 may be supplied via the . The optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) may not have the measurement light source 23a. , the optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) from the light source provided outside the light guide member such as an optical fiber may receive the supply of the second light beam L2 via. The optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) include a control unit 22, a calculation unit 24, and a position information correction unit. 25, for example, the optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) It may be provided outside. At least one of the light source 10 and the measurement unit 23 may be included in the optical device 2 and the optical device 2a. At least one of the control unit 22 and the calculation unit 24 may be included in the optical device 2 and the optical device 2a.

It should be noted that in each of the embodiments described above, modified examples described later, and embodiments described later, the measuring unit 23 may not be an interferometric measuring device as described above. For example, the measurement unit 23 may be an optical coherence tomography (OCT) type measurement device. An example of an OCT-type measuring device is described in Japanese Patent Application Laid-Open No. 2020-101499. For example, the measurement unit 23 may be a measurement device that includes a white confocal displacement meter. An example of a white confocal displacement meter is described in JP-A-2020-085633. For example, the measurement unit 23 may be a phase modulation type measurement device. An example of the phase modulation type measuring device is described in Japanese Patent Application Laid-Open No. 2010-025922. For example, the measurement unit 23 may be an intensity modulation type measurement device. An example of the intensity modulation type measuring device is described in Japanese Patent Application Laid-Open No. 2016-510415 and US Patent Application Publication No. 2014/226145.

In each of the embodiments described above, modified examples described later, and embodiments described later, before processing the workpiece 18 with the first beam R1, the optical processing device 1 and the optical processing device of the second embodiment , the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) use the second beam R2 to detect and calculate the position information of the surface 18s to be processed by the measuring unit 23 and the calculating unit 24. At least one of the irradiation position of the first light flux R1 on the surface to be processed 18s, the number of times of irradiation, and irradiation conditions may be determined based on the above.

Further, in each embodiment described above, modifications described later, and embodiments described later, the optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the third embodiment After processing the surface 18s to be processed by the first light beam R1, the optical processing device (described later) measures the portion processed by the first light beam R1 by the second light beam R2, and determines the quality of the portion processed by the first light beam R1. and quality. For example, the optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) process the surface 18s to be processed by the first beam R1. After that, the position information of the portion processed by the first beam R1 is calculated, and the calculated position information and predetermined reference position information (for example, CAD data of the workpiece 18) are compared to obtain the first beam R1 It may be determined whether to re-process or finish the processing of the portion processed in .

When reprocessing the portion processed by the first beam R1, the optical processing device 1, the optical processing device of the second embodiment, the optical processing device 1a (described later), and the optical processing device of the third embodiment (described later) are Based on the positional information of the portion processed by the first light beam R1, at least one of the irradiation position of the first light beam R1 on the surface 18s to be processed, the number of times of irradiation, and irradiation conditions is determined, and the portion processed by the first light beam R1 is determined. May be reworked. Further, the

optical processing apparatuses

1 and 1a calculate the position information of the portion processed by the first light flux R1 after processing the surface 18s to be processed by the first light flux R1, and the calculated position information and the predetermined reference position information ( For example, CAD data of the workpiece 18) may be compared to determine whether or not the portion processed by the first beam R1 has been processed into the desired shape.

In each of the embodiments described above, the optical processing device 1, the optical processing device of the second embodiment, and the optical processing device of the third embodiment (described later) process the workpiece 18 with the first beam R1. Meanwhile, measurement of the workpiece 18 (detection of detection light from the workpiece surface 18s and calculation of position information, etc.) may be performed using the second light flux R2. In this case, machining and measurement of the workpiece 18 can be performed simultaneously.

The optical processing device 1, the optical processing device of the second embodiment, and the optical processing device of the third embodiment (described later) process the workpiece 18 with the first beam R1 and the workpiece with the second beam R2. When measuring the object 18 at the same time, the object 18 is processed by the first beam R1 and the detection light from the surface 18s to be processed is processed. It may be performed after the processing of 18.

(Effect of the optical processing device of the second embodiment)
(2) The optical processing apparatus of the second embodiment described above has a first optical path P1 for the first light flux R1 of the first wavelength and a second light path P1 for the second light flux R2 of the second wavelength longer than the first wavelength. a synthesizing element 12 for synthesizing the optical path P2; It comprises a system 16a and a correction optical system 11S having positive refractive power. The correction optical system 11S is arranged on the second optical path P2 on the incident side of the synthesizing element 12, and one of the first light flux R1 and the second light flux R2 is a light flux for processing the workpiece 18. The other one of the first light beam R1 and the second light beam R2 is a light beam for measuring the workpiece 18 .
This configuration has the same effect as the optical processing device 1 of the first embodiment described above.

(Modified optical processing device)
Hereinafter, the optical processing device 1a of the modified example will be described with reference to FIG. Since the configuration of the optical processing device 1a is generally common to the optical processing device 1 of the first embodiment and the second embodiment described above, the same reference numerals are given to the same configurations, and the description is omitted as appropriate. .

The optical processing apparatus 1a of the modified example differs from the above-described first and second embodiments in that the variable mirror 26 is arranged on the second optical path P2 between the measurement unit 23 and the combining element 12. It differs from the optical processing device 1 . By setting the azimuth angle of the reflecting surface of the variable mirror 26 to a predetermined angle, the second light flux R2 is second condensed at the first converging point FP1 of the first light flux R1 on the surface 18s of the workpiece 18 to be processed. The position of the point FP2 can be shifted by a predetermined distance in the XY plane direction. Note that the variable mirror 26 may be configured such that the azimuth angle of the reflecting surface can be set to a predetermined angle around an axis parallel to the Y direction.

In the portion being processed by being irradiated with the first beam R1, there is a fear that high-precision measurement cannot be performed with the second beam R2 due to fumes generated from the surface to be processed 18s.
In the optical processing apparatus 1a of the modified example, the information about the position or state of the surface 18s to be processed can be detected at a position different from the position processed by the first light beam R1, so that deterioration in measurement accuracy due to fumes or the like can be prevented. can be prevented.

The optical processing device 1a of the modified example may measure the workpiece 18 with the second beam R2 while machining the workpiece 18 with the first beam R1. In this case, machining and measurement of the workpiece 18 can be performed simultaneously while preventing deterioration of measurement accuracy due to fumes and the like. The optical processing apparatus 1a of the modified example processes the workpiece 18 with the first beam R1 and measures the workpiece 18 with the second beam R2 (detection of the detection light from the workpiece surface 18s and position information etc.) are performed at the same time, the workpiece 18 is processed by the first beam R1 and the detection light from the workpiece surface 18s is processed. It may be performed after the processing of 18.

Instead of deflecting the second light beam R2 by the variable mirror 26, for example, a relay lens system may be arranged in the second optical path P2, and parallel plate glass may be placed in the vicinity of the intermediate focal point formed by the relay lens system. Good to place. In this case, by inclining the normal direction of the incident surface and the exit surface of the parallel plate glass from the traveling direction of the second light beam R2, the position of the second condensing point FP2 with respect to the first condensing point FP1 on the surface to be processed 18s can be shifted by a predetermined distance in the XY plane direction.

In addition, in the optical processing device 1a, the position where the variable mirror 26 is arranged is not limited to the second optical path P2 between the measurement unit 23 and the combining element 12. For example, the deformable mirror 26 may be placed in the first optical path P1 between the light source 10 and the combining element 12. FIG. In addition to the variable mirror 26 arranged on the second optical path P2 between the measurement unit 23 and the combining element 12, another variable mirror is arranged on the first optical path P1 between the light source 10 and the combining element 12. may

(Optical processing device of the third embodiment)
The optical processing apparatus of the third embodiment will be described below.
However, the configuration of the optical processing apparatus of the third embodiment is substantially the same as the configuration of the optical processing apparatuses of the first and second embodiments shown in FIGS. 1 to 5. FIG. Therefore, hereinafter, with reference to FIGS. 1 and 2, the differences of the optical processing apparatus of the third embodiment with respect to the optical processing apparatuses of the first and second embodiments will be described, and common configurations will be described as appropriate. Description is omitted.

The optical processing apparatus of the third embodiment does not have the correction optical system 11 . Therefore, the amount of longitudinal chromatic aberration D1 or chromatic aberration of magnification D2 in the vicinity of the illuminated surface 17 becomes a large value compared to the optical processing apparatuses of the first and second embodiments described above.
Also in the optical processing apparatus of the third embodiment, the position of the surface to be processed 18s is calculated by the measuring unit 23 and the calculating unit 24 using the second light flux R2 of the second wavelength.

The optical processing device of the third embodiment includes the position information corrector 25 described above. Then, the position information correction unit 25 is a condensing optical system that is numerical data indicating the relationship between the rotation angle of the swing mirror 14 or the X position of the condensing point FP and at least one of the longitudinal chromatic aberration D1 and the chromatic aberration of magnification D2. 16 pieces of aberration information are stored. The position information correction unit 25 may also store information on the so-called telecentricity of the condensing optical system 16 .

Based on the information on the rotation angle of the oscillating mirror 14 sent from the control unit 22 or the information on the X position of the focal point FP, the position information correction unit 25 corrects the information on the characteristics of the condensing optical system 16 to: At least one of the longitudinal chromatic aberration D1 and the lateral chromatic aberration D2 at the focal point FP is calculated. The position information correction unit 25 corrects the position information of the surface to be processed 18s calculated by the calculation unit 24 and transmitted as the signal S9 based on at least one of the axial chromatic aberration D1 and the chromatic aberration of magnification D2 calculated as described above. Then, the position information correction unit 25 sends back the corrected position information of the surface 18s to be processed to the calculation unit 24 as a signal S10.

By providing the position information correction unit 25, the optical processing apparatus of the third embodiment can accurately detect the position of the surface to be processed 18s even when using the optical apparatus 2 with relatively large longitudinal chromatic aberration D1 or chromatic aberration of magnification D2. 18s of surfaces to be processed can be processed with high precision.
Note that, like the optical processing apparatuses of the first and second embodiments described above, both the position information correction unit 25 and the correction optical system 11 may be provided to correct chromatic aberration with higher accuracy.

(Effect of the optical processing device of the third embodiment)
(3) In the optical processing apparatus of the third embodiment, the first light flux R1 having the first wavelength supplied along the first optical path P1 and the first light flux R1 having the first wavelength supplied along the second optical path P2 are different from each other. a synthesizing element 12 for combining the second light flux R2 of two wavelengths, a condensing optical system 16 for condensing the first light flux R1 and the second light flux R2 combined by the synthesizing element 12 onto the illuminated surface 17; A holding unit 19 that holds the workpiece 18 so that the surface 18s to be processed matches the surface 17 to be irradiated, and the second light beam R2 is reflected or scattered by the surface 18s to be processed, and is combined with the condensing optical system 16. and a measurement unit 23 that detects the detection light that has returned to the second optical path P2 via the element 12 . Then, based on information about the intensity of the detection light detected by the measurement unit 23, a calculation unit 24 for calculating position information of a portion of the surface to be processed 18s irradiated with the second beam R2; and a position information correction unit 25 for correcting the position information calculated by the calculation unit 24 based on the aberration information.
With this configuration, even if an optical device 2 with a relatively large longitudinal chromatic aberration D1 or a relatively large chromatic aberration of magnification D2 is used, the position of the surface 18s to be processed can be accurately detected, and the surface 18s to be processed can be processed with high accuracy. can be done.

The present invention is not limited to the above contents. Other aspects conceivable within the scope of the technical idea of the present invention are also included in the scope of the present invention. This embodiment may combine all or part of the above aspects.

(Appendix)
It will be appreciated by those skilled in the art that the above-described multiple embodiments or variations thereof are specific examples of the following aspects.

(Section 1)
a synthesizing element for synthesizing a first optical path of a first light beam having a first wavelength and a second optical path of a second light beam having a second wavelength longer than the first wavelength; A condensing optical system condensing the first light beam and the second light beam from the element, and a correction optical system having a negative refractive power, wherein the correction optical system is located on the incident side of the combining element. optical device arranged in the first optical path in

(Section 2)
a synthesizing element for synthesizing a first optical path of a first light beam having a first wavelength and a second optical path of a second light beam having a second wavelength longer than the first wavelength; A condensing optical system for condensing the first light beam and the second light beam from the element toward a workpiece, and a correcting optical system having a positive refractive power, wherein the correcting optical system is , an optical device arranged in the first optical path on the incident side of the combining element, wherein the back focus of the condensing optical system at the first wavelength is longer than the back focus of the condensing optical system at the second wavelength. .

(Section 3)
In the optical device according to item 1 or item 2, the back focus of the combined optical system of the condensing optical system and the correcting optical system at the first wavelength and the back focus of the condensing optical system at the second wavelength is smaller than the absolute value of the difference between the back focus of the condensing optical system at the first wavelength and the back focus of the condensing optical system at the second wavelength.

(Section 4)
a synthesizing element for synthesizing a first optical path of a first light beam having a first wavelength and a second optical path of a second light beam having a second wavelength longer than the first wavelength; A condensing optical system for condensing the first light beam and the second light beam from the element, and a correction optical system having a positive refractive power, wherein the correction optical system is located on the incident side of the combining element. optical device arranged in the second optical path in

(Section 5)
a synthesizing element for synthesizing a first optical path of a first light beam having a first wavelength and a second optical path of a second light beam having a second wavelength longer than the first wavelength; A condensing optical system for condensing the first light beam and the second light beam from the element toward a workpiece, and a correction optical system having a negative refractive power, wherein the correction optical system is , an optical device arranged in the second optical path on the incident side of the combining element, wherein the back focus of the condensing optical system at the first wavelength is longer than the back focus of the condensing optical system at the second wavelength. .

(Section 6)
6. In the optical device according to item 4 or 5, the back focus of the combined optical system of the condensing optical system and the correcting optical system at the second wavelength and the back focus of the condensing optical system at the first wavelength is smaller than the absolute value of the difference between the back focus of the condensing optical system at the second wavelength and the back focus of the condensing optical system at the first wavelength.

(Section 7)
In the optical device according to any one of items 1 to 6, when the condensing optical system is the first condensing optical system and the correcting optical system is the first correcting optical system, the first The first condensing optical system is exchangeably provided with a second condensing optical system different from the first condensing optical system, and the first correcting optical system is a second correcting optical system different from the first correcting optical system. optical device provided interchangeably with

(Section 8)
8. The optical apparatus according to claim 7, wherein when the second condensing optical system is used as the condensing optical system, the second correcting optical system is used as the correcting optical system.

(Section 9)
9. In the optical device according to item 7 or 8, the first condensing optical system and the second condensing optical system have different back focal lengths, and the first correcting optical system and the second correcting optical system are optical devices with different focal lengths.

(Section 10)
9. The optical device according to any one of items 7 to 9 quoting any one of items 1 to 3, wherein the back focus of the first light collecting optical system is the second light collecting optical system system, the focal length of the second correcting optical system is longer than the focal length of the first correcting optical system, and the back focus of the first condensing optical system is the second condensing optical system. is longer than the back focus of the second correction optical system, the focal length of the second correction optical system is shorter than the focal length of the first correction optical system.

(Section 11)
9. The optical device according to any one of items 7 to 9, citing item 2, wherein the back focus of the first light collecting optical system at the first wavelength is the when the back focus at the first wavelength is shorter than the focal length at the first wavelength of the first correction optical system, the focal length at the first wavelength of the second correction optical system is longer than the focal length at the first wavelength of the first correction optical system; if the back focus at the first wavelength of the system is longer than the back focus at the first wavelength of the second condensing optical system, the second correction is longer than the focal length at the first wavelength of the first correcting optical system. An optical device, wherein the optical system has a short focal length at the first wavelength.

(Section 12)
9. The optical device according to any one of items 7 to 9, citing item 5, wherein the back focus at the second wavelength of the first condensing optical system is the when the back focus at the second wavelength is shorter than the focal length at the second wavelength of the first correction optical system, the focal length at the second wavelength of the second correction optical system is longer than the focal length at the second wavelength of the first condensing optical system; if the back focus at the second wavelength of the system is longer than the back focus at the second wavelength of the second collection optical system, the second correction is longer than the focal length at the second wavelength of the first correction optical system. The optical device, wherein the optical system has a short focal length at the second wavelength.

(Section 13)
In the optical device according to any one of items 1 to 3, or any one of items 7 to 11 quoting any one of items 1 to 3, the correction The optical device, wherein the optical system is not arranged in the second optical path.

(Section 14)
The optical device according to any one of items 4 to 6, or any one of items 7 to 10 and 12 quoting any one of items 4 to 6. 3. The optical device according to claim 1, wherein the correcting optical system is not arranged in the first optical path.

(Section 15)
15. The optical device according to any one of items 1 to 14, wherein the condensing optical system includes, in order from the combining element side, a first lens having negative refractive power and a lens having positive refractive power as a whole. and a second lens group having a power, wherein the focal length fc of the correction optical system at the first wavelength and the focal length fg of the condensing optical system at the first wavelength are |fc|>10×fg An optical device that satisfies the relationship of

(Section 16)
16. The optical device according to any one of items 1 to 15, wherein the condensing optical system includes, in order from the combining element side, a first lens having negative refractive power and a lens having positive refractive power as a whole. a second lens group having positive refractive power, said second lens group having positive refractive power, one or more positive lenses made of the first lens material, having negative refractive power; and one or more negative lenses made of a lens material, wherein the Abbe number ν of the lens material is defined as ν=( The optical device, wherein when n2−1)/(n2−n1), the Abbe number ν1 of the first lens material and the Abbe number ν2 of the second lens material satisfy the relationship ν1>ν2.

(Section 17)
17. The optical device according to any one of items 1 to 16, wherein the first light flux and the Deflection scanning in which the second light flux is deflected to move the condensing positions of the first light flux and the second light flux emitted from the condensing optical system along an axis intersecting the optical axis of the condensing optical system. An optical device, comprising:

(Section 18)
18. The optical device according to any one of items 1 to 17, wherein the angles of the principal rays of the first light beam and the second light beam with respect to the normal line at each condensing position are within 1°. is an optical device.

(Section 19)
19. The optical device according to any one of items 1 to 18, and a support for supporting a workpiece, wherein one of the first light flux and the second light flux The optical processing device, wherein the light flux is for processing a workpiece, and the other light flux of the first light flux and the second light flux is a light flux for measuring the workpiece.

(Section 20)
20. In the optical processing apparatus according to item 19, the one beam is applied to the workpiece through the synthesizing element and the condensing optical system, and the other beam is applied to the synthesizing element and the condensing optical system. The apparatus further comprises a measurement unit that irradiates the workpiece through an optical system and detects detection light generated by the other light flux that irradiates the workpiece through the condensing optical system and the synthesizing element. , optical processing equipment.

(Section 21)
21. The optical processing apparatus according to claim 20, further comprising a calculator that generates information about the measurement result of the workpiece based on the detected light detected by the measuring unit.
(Section 22)
22. The optical processing apparatus according to claim 21, wherein the other light flux is emitted based on information on the measurement result.

(Section 23)
23. The optical processing apparatus according to claim 22, wherein at least one of the irradiation position, the number of times of irradiation, and irradiation conditions of the other light beam on the workpiece is determined based on the information about the measurement result.

(Section 24)
24. The optical processing apparatus according to claim 23, wherein the irradiation condition is at least one of intensity and wavelength of the other light flux with which the workpiece is irradiated.
(Section 25)
22. The optical processing apparatus according to claim 21, wherein the information on the measurement result includes information on the position of the portion of the workpiece irradiated with the one light flux.

(Section 26)
26. The optical processing device according to claim 25, wherein the other light beam is applied based on the information regarding the position.
(Section 27)
27. The optical processing apparatus according to claim 26, wherein at least one of the irradiation position of the other light beam on the workpiece, the number of times of irradiation, and irradiation conditions is determined based on the information regarding the position.

(Section 28)
28. The optical processing apparatus according to item 27, wherein the irradiation condition is at least one of intensity and wavelength of the other light flux with which the workpiece is irradiated.
(Section 29)
29. The optical processing device according to any one of items 19 to 28, wherein the one light flux is the second light flux and the other light flux is the first light flux.

(Section 30)
a condensing optical system that converges the first light beam and the second light beam from the synthesizing element; and a correction optical system that is arranged in the optical path of the first light flux on the incident side of the synthesizing element. , the distance between the condensing position of the first light flux and the condensing position of the second light flux when the correction optical system is arranged in the optical path is equal to the distance between the convergence position of the first light flux and the convergence position of the second light flux when the correction optical system is not arranged in the optical path; An optical device, wherein a distance between a condensing position of one light flux and a condensing position of the second light flux is shorter.

(Section 31)
31. In the optical device according to item 30, the optical axis of the condensing optical system between the condensing position of the first light beam and the condensing position of the second light beam when the correction optical system is arranged in the optical path is shorter than the distance along the optical axis between the condensing position of the first light flux and the condensing position of the second light flux when the correcting optical system is not arranged in the optical path.

(Section 32)
a synthesizing element for synthesizing a first luminous flux of a first wavelength supplied along a first optical path and a second luminous flux of a second wavelength different from the first wavelength supplied along a second optical path; a condensing optical system for condensing the first light flux and the second light flux synthesized by a synthesizing element onto a surface to be irradiated; a holding unit that holds the second light beam; and a measuring unit that detects the detection light that is reflected or scattered by the surface to be processed and returned to the second optical path via the condensing optical system and the synthesizing element, out of the second light flux. a calculation unit for calculating position information of a portion of the surface to be processed irradiated with the second beam based on information on the intensity of the detection light detected by the measurement unit; and a position information correction unit that corrects the position information calculated by the calculation unit based on information about characteristics.

(Section 33)
32. In the optical processing apparatus according to item 32, arranged on the first optical path, the condensing position of the first light flux in the vicinity of the surface to be illuminated is shifted in the optical axis direction of the condensing optical system to the second An optical processing device, further comprising a correction optical system that brings the light beam closer to the condensing position.
(Section 34)
34. The optical processing apparatus according to item 32 or 33, wherein the irradiation position of the first light flux on the surface to be processed is determined based on the position information of the surface to be processed.

It should be noted that the configurations of the 32nd to 34th items described above may further include the configuration described in any of the 1st to 9th items described above.

1: optical processing device, 2, 2a: optical device, P1: first optical path, P2: second optical path, P3: third optical path, P4: fourth optical path, R1: first light flux, R2: second light flux, 10 : Light source 11: Correction optical system 12: Synthesis element 13: Fixed mirror 14: Oscillating mirror 16: Condensing optical system L11, L21: First lens G20, G21: Second lens group 17 : irradiated surface, 18: workpiece, 18s: processed surface, 19: sample stage, 20: guide, 22: control unit, 23: measurement unit, 24: calculation unit, 25: position information correction unit

Claims

a synthesizing element for synthesizing a first optical path of a first light beam having a first wavelength and a second optical path of a second light beam having a second wavelength longer than the first wavelength;
a condensing optical system that has a positive refractive power and converges the first light flux and the second light flux from the synthesizing element toward an object to be processed;
a correction optical system having negative refractive power,
The correction optical system is arranged on the first optical path on the incident side of the combining element,
one of the first light flux and the second light flux is a light flux for processing the workpiece;
The optical processing device, wherein the other one of the first and second beams is a beam for measuring the workpiece.
a synthesizing element for synthesizing a first optical path of a first light beam having a first wavelength and a second optical path of a second light beam having a second wavelength longer than the first wavelength;
a condensing optical system that has a positive refractive power and converges the first light flux and the second light flux from the synthesizing element toward an object to be processed;
a correction optical system having a positive refractive power,
The correction optical system is arranged on the first optical path on the incident side of the combining element,
the back focus of the condensing optical system at the first wavelength is longer than the back focus of the condensing optical system at the second wavelength;
one of the first light flux and the second light flux is a light flux for processing the workpiece,
The optical processing device, wherein the other of the first and second light beams is a light beam for measuring the workpiece.
In the optical processing device according to claim 1 or claim 2,
The absolute value of the difference between the back focus of the combining optical system of the condensing optical system and the correcting optical system at the first wavelength and the back focus of the condensing optical system at the second wavelength is the An optical processing device, wherein the absolute value of the difference between the back focus of the light collecting optical system and the back focus of the light collecting optical system at the second wavelength is smaller.
a synthesizing element for synthesizing a first optical path of a first light beam having a first wavelength and a second optical path of a second light beam having a second wavelength longer than the first wavelength;
a condensing optical system that has a positive refractive power and converges the first light flux and the second light flux from the synthesizing element toward an object to be processed;
a correction optical system having a positive refractive power,
The correction optical system is arranged on the second optical path on the incident side of the combining element,
one of the first light flux and the second light flux is a light flux for processing the workpiece;
The optical processing device, wherein the other one of the first and second beams is a beam for measuring the workpiece.
a synthesizing element for synthesizing a first optical path of a first light beam having a first wavelength and a second optical path of a second light beam having a second wavelength longer than the first wavelength;
a condensing optical system that has a positive refractive power and converges the first light flux and the second light flux from the synthesizing element toward an object to be processed;
a correction optical system having negative refractive power,
The correction optical system is arranged on the second optical path on the incident side of the combining element,
the back focus of the condensing optical system at the first wavelength is longer than the back focus of the condensing optical system at the second wavelength;
one of the first light flux and the second light flux is a light flux for processing the workpiece,
The optical processing device, wherein the other of the first and second light beams is a light beam for measuring the workpiece.
In the optical processing device according to claim 4 or claim 5,
The absolute value of the difference between the back focus of the combining optical system of the condensing optical system and the correction optical system at the second wavelength and the back focus of the condensing optical system at the first wavelength is the An optical processing device, wherein the absolute value of the difference between the back focus of the light collecting optical system and the back focus of the light collecting optical system at the first wavelength is smaller.
In the optical processing device according to any one of claims 1 to 6,
When the condensing optical system is the first condensing optical system and the correcting optical system is the first correcting optical system,
The first condensing optical system is provided interchangeably with a second condensing optical system different from the first condensing optical system,
The optical processing apparatus, wherein the first correction optical system is replaceable with a second correction optical system different from the first correction optical system.
In the optical processing device according to claim 7,
An optical processing apparatus, wherein when the second condensing optical system is used as the condensing optical system, the second correcting optical system is used as the correcting optical system.
In the optical processing device according to claim 7 or claim 8,
The first condensing optical system and the second condensing optical system have different back focal lengths,
The optical processing apparatus, wherein the first correction optical system and the second correction optical system have different focal lengths.
In the optical processing device according to any one of claims 7 to 9 citing claim 1 or claim 4,
When the back focus of the first condensing optical system is shorter than the back focus of the second condensing optical system, the focal length of the second correction optical system is longer than the focal length of the first correction optical system,
When the back focus of the first condensing optical system is longer than the back focus of the second condensing optical system, the focal length of the second correction optical system is shorter than the focal length of the first correction optical system, light processing equipment.
In the optical processing device according to any one of claims 7 to 9 citing claim 2,
When the back focus of the first condensing optical system at the first wavelength is shorter than the back focus of the second condensing optical system at the first wavelength, the focal length of the first correction optical system at the first wavelength The focal length at the first wavelength of the second correction optical system is longer than
When the back focus of the first condensing optical system at the first wavelength is longer than the back focus of the second condensing optical system at the first wavelength, the focal length of the first correcting optical system at the first wavelength wherein the focal length of the second correction optical system at the first wavelength is shorter than the optical processing apparatus.
In the optical processing device according to any one of claims 7 to 9 citing claim 5,
When the back focus of the first condensing optical system at the second wavelength is shorter than the back focus of the second condensing optical system at the second wavelength, the focal length of the first correction optical system at the second wavelength The focal length at the second wavelength of the second correction optical system is longer than
When the back focus of the first condensing optical system at the second wavelength is longer than the back focus of the second condensing optical system at the second wavelength, the focal length of the first correction optical system at the second wavelength wherein the focal length of the second correction optical system at the second wavelength is shorter than the optical processing apparatus.
In the optical processing device according to any one of claims 1 to 3 or claims 7 to 11 citing any one of claims 1 to 3,
The optical processing device, wherein the correction optical system is not arranged in the second optical path.
The optical processing device according to any one of claims 7 to 10 or claim 12, citing any one of claims 4 to 6 or claims 4 to 6. in
The optical processing device, wherein the correction optical system is not arranged on the first optical path.
In the optical processing device according to any one of claims 1 to 14,
The condensing optical system has, in order from the synthetic element side, a first lens having a negative refractive power and a second lens group having a positive refractive power as a whole,
The focal length fc of the correction optical system at the first wavelength and the focal length fg of the condensing optical system at the first wavelength are
satisfying the relationship |fc| > 10 x fg,
Optical processing equipment.
In the optical processing device according to any one of claims 1 to 15,
The condensing optical system has, in order from the synthetic element side, a first lens having a negative refractive power and a second lens group having a positive refractive power as a whole,
The second lens group is
one or more positive lenses having positive refractive power and made of a first lens material;
one or more negative lenses having negative refractive power and made of a second lens material;
including
When the Abbe number ν of the lens material is ν=(n2−1)/(n2−n1) with respect to the refractive index n1 of the lens material for the first wavelength and the refractive index n2 for the second wavelength,
The Abbe number ν1 of the first lens material and the Abbe number ν2 of the second lens material are
satisfying the relationship ν1 > ν2,
Optical processing equipment.
In the optical processing device according to any one of claims 1 to 16,
arranged on the first optical path and the second optical path between the synthesizing element and the condensing optical system, deflecting the first light flux and the second light flux and exiting from the condensing optical system; An optical processing apparatus comprising a deflection scanning unit that moves the condensing positions of the first light beam and the second light beam along an axis that intersects the optical axis of the light condensing optical system.
In the optical processing device according to any one of claims 1 to 17,
The optical processing device, wherein the angles of the principal rays of the first light beam and the second light beam with respect to normals at respective condensing positions are within 1°.
In the optical processing device according to any one of claims 1 to 18,
the other light beam of the first light beam and the second light beam is irradiated onto the workpiece via the synthesizing element and the condensing optical system;
An optical processing apparatus, further comprising a measurement unit that detects detection light generated by the other light flux with which the workpiece is irradiated via the condensing optical system and the synthesizing element.
In the optical processing device according to claim 19,
a calculating unit that generates position information about a position of a portion of the workpiece irradiated with the one of the first light beam and the second light beam, based on the detection light detected by the measuring unit; An optical processing device.
In the optical processing device according to claim 20,
An optical processing device that emits the one of the first light beam and the second light beam based on the position information.
In the optical processing device according to any one of claims 1 to 21,
the one light flux is a second light flux,
The optical processing device, wherein the other light flux is the first light flux.