WO2022179370A1 - Light-emitting device, display assembly and method for manufacturing light-emitting device - Google Patents

Light-emitting device, display assembly and method for manufacturing light-emitting device Download PDF

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Publication number
WO2022179370A1
WO2022179370A1 PCT/CN2022/073559 CN2022073559W WO2022179370A1 WO 2022179370 A1 WO2022179370 A1 WO 2022179370A1 CN 2022073559 W CN2022073559 W CN 2022073559W WO 2022179370 A1 WO2022179370 A1 WO 2022179370A1
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Prior art keywords
light
emitting unit
color
emitting device
substrate
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PCT/CN2022/073559
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French (fr)
Chinese (zh)
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谢华飞
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维沃移动通信有限公司
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Publication of WO2022179370A1 publication Critical patent/WO2022179370A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/15Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
    • H01L27/153Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
    • H01L27/156Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • H01L33/505Wavelength conversion elements characterised by the shape, e.g. plate or foil
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/58Optical field-shaping elements
    • H01L33/60Reflective elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0033Processes relating to semiconductor body packages
    • H01L2933/0041Processes relating to semiconductor body packages relating to wavelength conversion elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0033Processes relating to semiconductor body packages
    • H01L2933/0058Processes relating to semiconductor body packages relating to optical field-shaping elements

Definitions

  • the present application belongs to the technical field of light-emitting diode (Light-Emitting Diode, LED) packaging, and in particular relates to a light-emitting device, a display assembly and a method for manufacturing the light-emitting device.
  • LED Light-Emitting Diode
  • Micro LED Micro Light-Emitting Diode, also known as ⁇ LED, that is, micro light-emitting diode
  • ⁇ LED Micro Light-Emitting Diode
  • LED miniaturization and matrix technology that is, LED miniaturization and matrix technology. It refers to a high-density and tiny-sized LED array integrated on a driving substrate. Each pixel of the LED display can be addressed and driven individually. It can be regarded as a miniature version of the outdoor LED display. down to the micron level.
  • the influence of the sidewall effect becomes prominent. Due to the existence of the sidewall effect, the size of the existing Micro LED cannot be further reduced. The resulting display has a lower resolution and cannot achieve ultra-high resolution display.
  • the purpose of the embodiments of the present application is to provide a light-emitting device, a display assembly, and a method for manufacturing the light-emitting device, so as to realize ultra-high-resolution display.
  • an embodiment of the present application provides a light-emitting device, comprising: a substrate, a reflection layer, a light-emitting unit, and a color resistance, the substrate and the reflection layer are stacked and arranged; the light-emitting unit is arranged on the reflection layer, and the color resistance is located between the light-emitting unit and the substrate wherein, at least part of the light emitted by the light emitting unit is reflected to the color resist through the reflective layer, so that the color resist outputs light of a single color and then emits through the substrate.
  • an embodiment of the present application provides a display assembly, including: a plurality of light emitting devices according to any one of the first aspects.
  • embodiments of the present application provide a method for manufacturing a light-emitting device, including: forming a driving circuit layer on a substrate and a metal conductive electrode connected to a semiconductor layer in the driving circuit layer; A color resist is formed between; the light emitting unit is mounted on the color resist; a reflective layer is formed on the light emitting unit.
  • a light-emitting device in the embodiment of the present application, includes a substrate, a light-emitting unit, a reflective layer, and a color resist, wherein the light-emitting unit is disposed on the reflective layer, so that when the light-emitting unit operates to emit light, it emits light. The light is reflected by the reflective layer. Since the substrate and the reflective layer are stacked, the single light passing through the color resist is transmitted to the substrate and emitted through the substrate for display.
  • ultra-high-resolution display can be achieved by controlling the size of the color resistance, which overcomes the influence of sidewall effects on ultra-high-resolution display after the size of Micro LEDs in the related art is reduced.
  • Figure 1 shows a schematic cross-sectional view of an existing Micro LED display screen
  • Fig. 2 shows the film layer structure diagram of the Micro LED display screen in the embodiment of the present application
  • FIG. 3 shows a schematic cross-sectional view of the Micro LED display screen in the embodiment of the present application
  • FIG. 4 shows a schematic cross-sectional view of the Micro LED display screen in the embodiment of the present application
  • FIG. 5 shows a schematic diagram of the luminescent color conversion structure of an ultraviolet (Ultraviolet, UV)/blue light LED plus quantum dot (Quantum Dot, QD);
  • FIG. 6 shows a schematic flowchart of a method for manufacturing a light emitting device according to an embodiment of the present application.
  • Micro LED In the related technical solutions, the advantages of Micro LED are obvious. It inherits the characteristics of high efficiency, high brightness, high reliability and fast response time of inorganic LEDs, and has the characteristics of self-illumination without backlight, which is more energy-saving and structural. Simple, small, thin, and more controllable. In addition, another major feature of Micro LED is its ultra-high resolution. Because it is super small, the resolution of the performance is particularly high. This makes LEDs have a wider range of applications, and thus give birth to higher-tech products.
  • Figure 1 shows a schematic cross-sectional view of an existing Micro LED display screen (R, G, and B represent ⁇ LEDs emitting red, green, and blue light, respectively).
  • the conventional Micro LED display is to prepare TFT (Thin Film Transistor, thin film field effect transistor) drive switches and metal traces on the substrate 1 through the array (backplane array) process, and at the same time prepare the spacer through the photolithography process.
  • TFT Thi Film Transistor, thin film field effect transistor
  • the column prevents cross-color between sub-pixels, and then the Micro LED ( ⁇ LED, micro light-emitting diode) is transferred to the corresponding TFT position through the transfer process for binding and bonding.
  • the substrate 1 provides support for the display screen; the TFT provides the driving and switching function for the display screen; the metal traces provide the conductive function for the display screen; the eutectic connection 12 is the connecting agent between the ⁇ LED and the TFT driving backplane; It is a light-emitting sub-pixel, and R/G/B is an example of different color emission; the isolation column is a black matrix prepared to prevent cross-color between sub-pixels.
  • a light-emitting device which includes: a substrate 1 , a light-emitting unit 13 , a reflective layer 15 and a color resist 14 , wherein the light-emitting unit 13 is arranged on a reflective surface layer 15, so that when the light-emitting unit 13 operates to emit light, the emitted light is reflected by the reflective layer 15. Since the substrate 1 and the reflective layer 15 are laminated, the single light passing through the color resist 14 is transmitted to the substrate 1 and passes through the substrate 1. issue.
  • a light-emitting device in this embodiment, includes a substrate 1 , a light-emitting unit 13 , a reflective layer 15 and a color resist 14 , wherein the light-emitting unit 13 is disposed on the reflective layer 15 so that the light-emitting unit 13 When operating to emit light, the emitted light is reflected by the reflective layer 15. Since the substrate 1 and the reflective layer 15 are stacked, the single light passing through the color resist 14 is transmitted to the substrate 1 and emitted through the substrate 1 for display.
  • an ultra-high-resolution display can be realized by controlling the size of the color resistor 14, which overcomes the influence of the sidewall effect on the ultra-high-resolution display after the size of the Micro LED is reduced in the related art.
  • the provision of the reflective layer 15 also protects the light-emitting unit 13, so that the light-emitting device can be isolated from water and oxygen, and be prevented from being scratched.
  • the light-emitting unit 13 is a micro light-emitting diode, which includes an electrode-anode-light-emitting layer-negative electrode-electrode, and its structure is shown in FIG. be limited.
  • the light-emitting device further includes: a driving circuit layer 16, the driving circuit layer 16 is located on the substrate 1; a metal conductive electrode 10, the metal conductive electrode 10 is located on the driving circuit layer 16, the metal conductive electrode 10 and the driving circuit layer
  • the semiconductor layer 4 in 16 and the power supply terminal of the light-emitting unit 13 are connected to supply power to the light-emitting unit 13 .
  • pixel electrodes such as transparent electrodes or high work function electrodes are used in the Micro LED to realize the conduction of the light emitting unit 13, wherein the pixel electrodes such as transparent electrodes or high work function electrodes can be tin-indium oxide, indium tin oxide, etc. , and the above-mentioned transparent electrodes or high work function electrodes have the characteristics of high cost.
  • the conduction of the light emitting unit 13 can be achieved, but the metal conductive electrode 10 can be used to achieve conduction. Therefore, the manufacturing cost of the light emitting device can be reduced.
  • the metal conductive electrode 10 may be any metal conductive electrode 10, such as any one of copper, iron and gold.
  • the provided driving circuit layer 16 can control the power supply to the light-emitting unit 13 so as to control the output light of the light-emitting unit 13 .
  • a gap 17 is provided between the color resist 14 and the light emitting unit 13 .
  • the color resistance 14 and the light emitting unit 13 are not in direct contact, there is a gap 17 . Therefore, the heat generated by the light emitting unit 13 does not directly act on the color resistor 14, therefore, the heat generated by the light emitting unit 13 or the influence of heat dissipation on the color resistor 14 can be reduced, and the thermal stability of the color resistor 14 can be improved. At the same time, the service life of the color resist 14 is prolonged.
  • a recess is provided between two adjacent metal conductive electrodes 10, and the color resist 14 is located in the recess.
  • the color resist 14 is located in the recess between two adjacent metal conductive electrodes 10 , so that the thickness of the reflective layer 15 can be reduced, and therefore, the size of the light emitting device can be reduced.
  • the driving circuit layer 16 includes: a TFT driving circuit.
  • the TFT driving circuit acts as a driving switch for driving the output light of the light-emitting unit 13 .
  • the TFT driving circuit includes a light shielding layer 2 on the substrate 1, an insulating layer 3 on the light shielding layer 2, a semiconductor layer 4 formed on the insulating layer 3, and a dielectric layer 5 formed on the semiconductor layer 4, wherein, A gate 6 and a protective layer 7 formed on the gate 6 are formed on the dielectric layer 5.
  • the protective layer 7 is in contact with the semiconductor layer 4 and wraps the dielectric layer 5 and the gate 6.
  • the source and drain electrodes 8 are formed thereon, wherein the source and drain electrodes 8 are in contact with the semiconductor layer 4 and the light shielding layer 2 , and a passivation layer 9 is formed on the protective layer 7 and the source and drain electrodes 8 .
  • the metal conductive electrode 10 formed on the passivation layer 9 is in contact with the semiconductor layer 4 .
  • the color resist 14 includes: a photoluminescent dye film or a pigment material film.
  • the photoluminescent dye film is a dye film with photoluminescence, wherein the photoluminescence refers to the fact that an object relies on an external light source to be irradiated to obtain energy, and the phenomenon that excitation leads to luminescence occurs.
  • Light-emitting dye film to achieve color output.
  • the pigment material film that is, the film structure using the pigment, outputs the color corresponding to the preset color under the irradiation of light, so as to realize the color display.
  • the spacer structure 11 is further included.
  • the spacer structure 11 is disposed on the reflective layer 15 and is located between two adjacent light-emitting units 13 .
  • the spacer structure 11 is provided so that the light emitted by a single light-emitting unit 13 will not escape under the action of the reflective layer 15 .
  • light escape can be understood as reflecting light to the color resistances 14 of adjacent light-emitting devices, so that when the light-emitting unit 13 in one light-emitting device emits light, the color-resistors 14 in the surrounding light-emitting devices also simultaneously Emergence of light.
  • the spacer structure 11 by arranging the spacer structure 11, the mutual influence between two adjacent light-emitting devices is reduced, which facilitates the realization of ultra-high-resolution display.
  • the substrate 1 includes a light-transmitting substrate 1 .
  • a display assembly is proposed, wherein the display assembly includes the light emitting device of the first aspect.
  • the display assembly proposed in the present application includes the light-emitting device according to the first aspect, and specifically includes: a substrate 1, a light-emitting unit 13, a reflective layer 15, and a color resist 14, wherein the light-emitting unit 13 is disposed on the reflective layer 15 so as to emit light when When the unit 13 operates to emit light, the emitted light is reflected by the reflective layer 15 . Since the substrate 1 and the reflective layer 15 are stacked, the single light passing through the color resist 14 is transmitted to the substrate 1 and emitted through the substrate 1 .
  • a display assembly which includes a light-emitting device including a substrate 1, a light-emitting unit 13, a reflective layer 15 and a color resist 14, wherein the light-emitting unit 13 is disposed on the reflective layer 15, so that the light-emitting unit 13 is placed on the reflective layer 15. 13
  • the emitted light is reflected by the reflective layer 15. Since the substrate 1 and the reflective layer 15 are stacked, the single light passing through the color resist 14 is transmitted to the substrate 1 and emitted through the substrate 1 for display.
  • an ultra-high-resolution display can be realized by controlling the size of the color resist 14, which overcomes the influence of the sidewall effect on the ultra-high-resolution display after the size of the Micro LED is reduced in the related art.
  • the provision of the reflective layer 15 also protects the light-emitting unit 13, so that the light-emitting device can be isolated from water and oxygen, and be prevented from being scratched.
  • any two light-emitting devices share one substrate 1 .
  • any two light-emitting devices share one substrate 1, so that when etching is performed to obtain recesses, all light-emitting devices can be etched, so as to improve the manufacturing efficiency and reduce the size of the display assembly .
  • the color resists in the light emitting device include red color resists, green color resists and blue color resists; wherein, the light emitting unit 13 is a blue light emitting unit 13 .
  • the color resists in the light emitting device include red color resists, green color resists, and colorless color resists; wherein, the light emitting unit 13 is a blue light emitting unit 13 .
  • the color display of the display assembly is realized by defining three colors of the color resistance.
  • color display in the preparation of the light emitting device, color display can be realized by performing one bulk transfer, and three bulk transfers are not required, thus reducing the manufacturing cost of the light emitting device.
  • a method for manufacturing a light-emitting device including:
  • Step 602 forming a driving circuit layer and a metal conductive electrode connected to the semiconductor layer in the driving circuit layer on the substrate;
  • Step 604 forming a color resistance between two adjacent metal conductive electrodes
  • Step 606 installing the light-emitting unit on the color resist
  • Step 608 forming a reflective layer on the light-emitting unit.
  • the embodiment of the present application proposes a method for manufacturing a light-emitting device, by forming a color resist 14 between two adjacent metal conductive electrodes 10, and after installing a light-emitting unit 13 on the color resist 14, a reflection is formed on the light-emitting unit 13 Layer 15, due to the formation of the reflective layer 15 and the color resist 14, so that the light emitted by the light emitting unit 13 is reflected by the reflective layer 15 through the color resist 14 to output a single color of light when it receives the light, and passes through the substrate 1 issue.
  • the method used by the light-emitting device to realize the color display is changed, so that the ultra-high-resolution display can be realized by controlling the size of the color resistance 14, which overcomes the problem of the Micro LED in the related art.
  • the provision of the reflective layer 15 also protects the light-emitting unit 13, so that the light-emitting device can be isolated from water and oxygen, and be prevented from being scratched.
  • a photolithography process is used to etch between two adjacent metal conductive electrodes 10 to obtain the color resist 14 .
  • the color resist 14 is located in the recess between two adjacent metal conductive electrodes 10, so that the thickness of the reflective layer can be reduced, and therefore, the size of the light emitting device can be reduced.
  • the color resist 14 includes: a photoluminescent dye film or a pigment material film.
  • the photoluminescent dye film is a dye film with photoluminescence, wherein the photoluminescence refers to the fact that an object relies on an external light source to be irradiated to obtain energy, and the phenomenon that excitation leads to luminescence occurs.
  • Light-emitting dye film to achieve color output.
  • the pigment material film that is, the film structure using the pigment, outputs the color corresponding to the preset color under the irradiation of light, so as to realize the color display.
  • the method before the step of forming the reflective layer 15 on the light-emitting units 13 , the method further includes: forming a spacer structure 11 on the substrate 1 and between two adjacent light-emitting units 13 .
  • the spacer structure 11 is provided so that the light emitted by a single light-emitting unit 13 will not escape under the action of the reflective layer 15 .
  • light escape can be understood as reflecting light to the color resistances 14 of adjacent light-emitting devices, so that when the light-emitting unit 13 in one light-emitting device emits light, the color-resistors 14 in the surrounding light-emitting devices also simultaneously Emergence of light.
  • the spacer structure 11 by arranging the spacer structure 11, the mutual influence between two adjacent light-emitting devices is reduced, which facilitates the realization of ultra-high-resolution display.
  • the driving circuit layer 16 includes: a thin film transistor (Thin Film Transistor, TFT) driving circuit.
  • TFT Thin Film Transistor
  • the TFT driving circuit includes a light shielding layer 2 on the substrate 1, an insulating layer 3 on the light shielding layer 2, a semiconductor layer 4 formed on the insulating layer 3, and a dielectric layer 5 formed on the semiconductor layer 4, wherein, A gate 6 and a protective layer 7 formed on the gate 6 are formed on the dielectric layer 5.
  • the protective layer 7 is in contact with the semiconductor layer 4 and wraps the dielectric layer 5 and the gate 6.
  • the source and drain electrodes 8 are formed thereon, wherein the source and drain electrodes 8 are in contact with the semiconductor layer 4 and the light shielding layer 2 , and a passivation layer 9 is formed on the protective layer 7 and the source and drain electrodes 8 .
  • the metal conductive electrode 10 formed on the passivation layer 9 is in contact with the semiconductor layer 4 .
  • a TFT driving circuit is prepared on the substrate 1 and connected to the metal conductive electrodes 10.
  • the metal conductive electrodes 10 are patterned by a photolithography process to prepare a color resist 14, and the two ends of the color resist 14 are connected to ⁇ LEDs , since the electrodes at both ends of the ⁇ LED need to be connected separately, that is, there will be a gap on the color resistance 14 to isolate the ⁇ LED from the color resistance 14, thereby realizing the non-contact between the color resistance 14 and the ⁇ LED, which can effectively improve the thermal resistance to the color resistance 14.
  • adding a reflective layer 15 on the top makes the light emitted upward from the ⁇ LED penetrate the ⁇ LED and reflect back to the color resist 14, and penetrates out from the substrate 1, thereby realizing bottom emission.
  • the substrate 1 provides support for the display screen; the TFT provides the driving switch function for the display screen; the metal conductive electrode 10 provides the conductive function for the display component; the eutectic connection 12 is the connecting agent between the ⁇ LED and the TFT driving backplane; ⁇ LED is the light emitting diode , is a light-emitting sub-pixel; the shape of the isolation structure can be a column, a black matrix prepared to prevent cross-color between sub-pixels; the reflective layer 15 is a film layer with light reflection function, which reflects the light emitted by the ⁇ LED upward to the downward direction. At the same time, it provides protection such as isolation of water and oxygen and scratch resistance for the entire display.
  • a color resist 14 is added between the ⁇ LED and the driven substrate 1, and a reflective layer 15 is added on the display screen.
  • the ⁇ LED emits light upward, it is reflected by the reflective layer 15 and passes through the color resist 14 to realize colorization , and penetrates the substrate 1 to emit light from the bottom of the display panel to realize bottom emission.
  • the structure of the embodiment of the present application is different from that of the traditional color conversion scheme.
  • the color resist 14 of this proposal is placed on the substrate 1 and is not in direct contact with the ⁇ LED.
  • the size control of the color resistance 14 can be achieved through the micron-level or even nano-scale semiconductor lithography process, so that it does not depend on the size of the ⁇ LED. Resolution display.
  • the Micro-LED colorization implementation methods mainly include RGB three-color ⁇ LED method (take FIG. 1 as an example), blue LED plus luminescent medium method (take FIG. 4 as an example), and optical lens synthesis method.
  • the RGB three-color ⁇ LED method requires three times of ⁇ LED mass transfer to achieve colorized display. Under the condition of low yield and complex process of the existing mass transfer technology, it brings huge problems to subsequent repairs, and it is difficult to carry out batch processing. production.
  • the optical lens synthesis method encapsulates three red, green, and blue micro-LED arrays on three packaging boards respectively, and connects a control board and a three-color prism. The brightness of the three-color micro-LED array is used to achieve colorization.
  • This method uses a prism to realize the light path conversion.
  • the structure is complex and the display device is bulky, which is not suitable for mobile terminals.
  • the manufacturing method of the light-emitting device proposed in the embodiment of the present application does not require three massive transfers, thus reducing the difficulty of mass production.
  • FIG. 5 shows a schematic diagram of the existing UV/blue LED plus quantum dot (QD) emission color conversion structure.
  • the medium is phosphors or quantum dots. Since the phosphor coating will absorb part of the energy, the conversion rate will be reduced, and the size of the phosphor particles is large, about 1-10 microns. As the size of the micro-LED pixel continues to decrease, The phosphor coating becomes more and more uneven and affects the display quality; while the quantum dot material is not stable and requires high heat dissipation. In the existing technology, quantum dots are coated on the Micro LED.
  • the ⁇ LED Since the ⁇ LED emits a lot of heat, it will It greatly affects the short lifespan of the quantum dots, which greatly limits its application range. Since there is a gap between the color resistance 14 and the light-emitting unit 13 in this application, the existence of the gap reduces the effect of the light-emitting unit 13 on the color resistance 14. Influence, improve the life of the light-emitting device.
  • the embodiments of the present application can be embodied in the form of software products that are essentially or contribute to the prior art, and the computer software products are stored in a storage medium (such as ROM/RAM, magnetic disk, CD-ROM), including several instructions to enable a terminal (which may be a mobile phone, a computer, a server, an air conditioner, or a network device, etc.) to execute the methods of the various embodiments of the present application.
  • a storage medium such as ROM/RAM, magnetic disk, CD-ROM
  • a terminal which may be a mobile phone, a computer, a server, an air conditioner, or a network device, etc.

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Abstract

The present application belongs to the technical field of LED encapsulation. Disclosed are a light-emitting device, a display assembly, and a method for manufacturing a light-emitting device. The light-emitting device comprises: a substrate, a reflecting layer, a light-emitting unit and a color resistor, wherein the substrate and the reflecting layer are arranged in a stacked manner; the light-emitting unit is arranged on the reflecting layer, and the color resistor is located between the light-emitting unit and the substrate; and at least some light emitted by the light-emitting unit is reflected to the color resistor by means of the reflecting layer, such that the color resistor outputs monochromatic light, and the monochromatic light is then emitted by means of the substrate.

Description

发光器件、显示组件和发光器件的制造方法Light-emitting device, display assembly, and manufacturing method of light-emitting device
相关申请的交叉引用CROSS-REFERENCE TO RELATED APPLICATIONS
本申请主张在2021年2月26日在中国提交的中国专利申请号202110217469.0的优先权,其全部内容通过引用包含于此。This application claims priority to Chinese Patent Application No. 202110217469.0 filed in China on February 26, 2021, the entire contents of which are incorporated herein by reference.
技术领域technical field
本申请属于一种发光二极管(Light-Emitting Diode,LED)封装技术领域,具体涉及一种发光器件、显示组件和发光器件的制造方法。The present application belongs to the technical field of light-emitting diode (Light-Emitting Diode, LED) packaging, and in particular relates to a light-emitting device, a display assembly and a method for manufacturing the light-emitting device.
背景技术Background technique
Micro LED(Micro Light-Emitting Diode,又名μLED,即微型发光二极管)技术,即LED微缩化和矩阵化技术。指的是在一个驱动基板上集成的高密度微小尺寸的LED阵列,LED显示屏每一个像素可定址、单独驱动点亮,可看成是户外LED显示屏的微缩版,将像素点距离从毫米级降低至微米级。Micro LED (Micro Light-Emitting Diode, also known as μLED, that is, micro light-emitting diode) technology, that is, LED miniaturization and matrix technology. It refers to a high-density and tiny-sized LED array integrated on a driving substrate. Each pixel of the LED display can be addressed and driven individually. It can be regarded as a miniature version of the outdoor LED display. down to the micron level.
随着相邻两个Micro LED像素点距离的减小,侧壁效应的影响凸显出来,由于侧壁效应的存在,现有Micro LED的尺寸无法进一步减小,现有技术方案中应用Micro LED生产得到的显示屏的分辨率较低,无法实现超高分辨率显示。As the distance between two adjacent Micro LED pixels decreases, the influence of the sidewall effect becomes prominent. Due to the existence of the sidewall effect, the size of the existing Micro LED cannot be further reduced. The resulting display has a lower resolution and cannot achieve ultra-high resolution display.
发明内容SUMMARY OF THE INVENTION
本申请实施例的目的是提供一种发光器件、显示组件和发光器件的制造方法,以实现超高分辨率显示。The purpose of the embodiments of the present application is to provide a light-emitting device, a display assembly, and a method for manufacturing the light-emitting device, so as to realize ultra-high-resolution display.
为了解决上述技术问题,本申请是这样实现的:In order to solve the above technical problems, this application is implemented as follows:
第一方面,本申请实施例提供了一种发光器件,包括:基板、反射层、发光单元以及色阻,基板与反射层层叠设置;发光单元设置在反射层 上,色阻位于发光单元与基板之间;其中,发光单元发出的至少部分光线经由反射层反射至色阻,以使色阻输出单一颜色的光线后通过基板发出。In a first aspect, an embodiment of the present application provides a light-emitting device, comprising: a substrate, a reflection layer, a light-emitting unit, and a color resistance, the substrate and the reflection layer are stacked and arranged; the light-emitting unit is arranged on the reflection layer, and the color resistance is located between the light-emitting unit and the substrate wherein, at least part of the light emitted by the light emitting unit is reflected to the color resist through the reflective layer, so that the color resist outputs light of a single color and then emits through the substrate.
第二方面,本申请实施例提供了一种显示组件,包括:多个如第一方面中中任一项的发光器件。In a second aspect, an embodiment of the present application provides a display assembly, including: a plurality of light emitting devices according to any one of the first aspects.
第三方面,本申请实施例提供了一种发光器件的制造方法,包括:在基板上形成驱动电路层以及与驱动电路层中的半导体层连接的金属导电电极;在相邻两个金属导电电极之间形成色阻;将发光单元安装在色阻上;在发光单元上形成反射层。In a third aspect, embodiments of the present application provide a method for manufacturing a light-emitting device, including: forming a driving circuit layer on a substrate and a metal conductive electrode connected to a semiconductor layer in the driving circuit layer; A color resist is formed between; the light emitting unit is mounted on the color resist; a reflective layer is formed on the light emitting unit.
在本申请实施例中,提出了一种发光器件,提出的发光器件包括基板、发光单元,反射层以及色阻,其中,发光单元设置在反射层上,以便在发光单元运行发出光线时,发出的光线被反射层反射,由于基板与反射层层叠设置,通过色阻后的单一光线传输到基板,并通过基板发出,以便进行显示。在该设计中,通过控制色阻的尺寸即可实现超高分辨率的显示,克服了相关技术中Micro LED尺寸减小后,侧壁效应对超高分辨率的显示的影响。In the embodiment of the present application, a light-emitting device is proposed. The proposed light-emitting device includes a substrate, a light-emitting unit, a reflective layer, and a color resist, wherein the light-emitting unit is disposed on the reflective layer, so that when the light-emitting unit operates to emit light, it emits light. The light is reflected by the reflective layer. Since the substrate and the reflective layer are stacked, the single light passing through the color resist is transmitted to the substrate and emitted through the substrate for display. In this design, ultra-high-resolution display can be achieved by controlling the size of the color resistance, which overcomes the influence of sidewall effects on ultra-high-resolution display after the size of Micro LEDs in the related art is reduced.
附图说明Description of drawings
图1示出了现有Micro LED显示屏截面示意图;Figure 1 shows a schematic cross-sectional view of an existing Micro LED display screen;
图2示出了本申请实施例中的Micro LED显示屏膜层结构图;Fig. 2 shows the film layer structure diagram of the Micro LED display screen in the embodiment of the present application;
图3示出了本申请实施例中的Micro LED显示屏截面示意图;FIG. 3 shows a schematic cross-sectional view of the Micro LED display screen in the embodiment of the present application;
图4示出了本申请实施例中的Micro LED显示屏截面示意图;FIG. 4 shows a schematic cross-sectional view of the Micro LED display screen in the embodiment of the present application;
图5示出了有紫外线(Ultraviolet,UV)/蓝光LED加量子点(Quantum Dot,QD)发光色转换结构示意图;FIG. 5 shows a schematic diagram of the luminescent color conversion structure of an ultraviolet (Ultraviolet, UV)/blue light LED plus quantum dot (Quantum Dot, QD);
图6示出了根据本申请实施例的发光器件的制造方法的流程示意图。FIG. 6 shows a schematic flowchart of a method for manufacturing a light emitting device according to an embodiment of the present application.
图1至图5中的附图标记与部件名称之间的对应关系为:The correspondence between the reference numerals and component names in Figures 1 to 5 is:
1基板,2遮光层,3绝缘层,4半导体层,5介电层,6栅极,7保护层,8源漏极,9钝化层,10金属导电电极,11间隔结构,12共晶连接,13发光单元,14色阻,15反射层,16驱动电路层,17间隙。1 substrate, 2 light shielding layer, 3 insulating layer, 4 semiconductor layer, 5 dielectric layer, 6 gate, 7 protective layer, 8 source and drain, 9 passivation layer, 10 metal conductive electrode, 11 spacer structure, 12 eutectic Connections, 13 light-emitting units, 14 color resists, 15 reflective layers, 16 driver circuit layers, 17 gaps.
具体实施方式Detailed ways
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the protection scope of the present application.
本申请的说明书和权利要求书中的术语“第一”、“第二”等是用于区别类似的对象,而不用于描述特定的顺序或先后次序。应该理解这样使用的数据在适当情况下可以互换,以便本申请的实施例能够以除了在这里图示或描述的那些以外的顺序实施。此外,说明书以及权利要求中“和/或”表示所连接对象的至少其中之一,字符“/”,一般表示前后关联对象是一种“或”的关系。The terms "first", "second" and the like in the description and claims of the present application are used to distinguish similar objects, and are not used to describe a specific order or sequence. It is to be understood that data so used may be interchanged under appropriate circumstances so that embodiments of the application can be practiced in sequences other than those illustrated or described herein. In addition, "and/or" in the description and claims indicates at least one of the connected objects, and the character "/" generally indicates that the associated objects are in an "or" relationship.
下面结合附图,通过具体的实施例及其应用场景对本申请实施例提供的发光器件、显示组件和发光器件的制造方法进行详细地说明。The light-emitting device, the display assembly, and the manufacturing method of the light-emitting device provided in the embodiments of the present application will be described in detail below with reference to the accompanying drawings through specific embodiments and application scenarios thereof.
相关技术方案中,Micro LED优点表现的很明显,它继承了无机LED的高效率、高亮度、高可靠度及反应时间快等特点,并且具自发光无需背光源的特性,更具节能、机构简易、体积小、薄型、可控性更强等优势。除此之外,Micro LED还有一大特性就是解析度超高。因为超微小,表现的解析度特别高。这使得LED有着更广阔的应用范围,并由此诞生出更高科技的产品。In the related technical solutions, the advantages of Micro LED are obvious. It inherits the characteristics of high efficiency, high brightness, high reliability and fast response time of inorganic LEDs, and has the characteristics of self-illumination without backlight, which is more energy-saving and structural. Simple, small, thin, and more controllable. In addition, another major feature of Micro LED is its ultra-high resolution. Because it is super small, the resolution of the performance is particularly high. This makes LEDs have a wider range of applications, and thus give birth to higher-tech products.
图1示出了现有Micro LED显示屏截面示意图(R、G、B分别代表发红、绿、蓝光的μLED)。Figure 1 shows a schematic cross-sectional view of an existing Micro LED display screen (R, G, and B represent μLEDs emitting red, green, and blue light, respectively).
如图1所示,常规Micro LED显示屏为在基板1上通过array(背板阵列)工艺制备TFT(Thin Film Transistor,薄膜场效应晶体管)驱动开关及金属走线,同时通过光刻工艺制备间隔柱防止各子像素间串色,再通过转移工艺将Micro LED(μLED,微型发光二极管)转印到对应的TFT位置进行绑定键合。其中,基板1为显示屏提供支撑作用;TFT为显示屏提供驱动开关作用;金属走线为显示屏提供导电作用;共晶连接12是μLED与TFT驱动背板的连接剂;μLED为发光二极管,是发光子像素,R/G/B为 不同颜色发射示范例;隔离柱为防止各子像素间串色而制备的黑色矩阵。As shown in Figure 1, the conventional Micro LED display is to prepare TFT (Thin Film Transistor, thin film field effect transistor) drive switches and metal traces on the substrate 1 through the array (backplane array) process, and at the same time prepare the spacer through the photolithography process. The column prevents cross-color between sub-pixels, and then the Micro LED (μLED, micro light-emitting diode) is transferred to the corresponding TFT position through the transfer process for binding and bonding. Among them, the substrate 1 provides support for the display screen; the TFT provides the driving and switching function for the display screen; the metal traces provide the conductive function for the display screen; the eutectic connection 12 is the connecting agent between the μLED and the TFT driving backplane; It is a light-emitting sub-pixel, and R/G/B is an example of different color emission; the isolation column is a black matrix prepared to prevent cross-color between sub-pixels.
就如上文所记载的那样,随着相邻两个Micro LED像素点距离的减小,侧壁效应的影响凸显出来,由于侧壁效应的存在,现有Micro LED的尺寸无法进一步减小,现有技术方案中应用Micro LED生产得到的显示屏的分辨率较低,无法实现超高分辨率显示。As described above, as the distance between two adjacent Micro LED pixels decreases, the influence of sidewall effect becomes prominent. Due to the existence of sidewall effect, the size of existing Micro LEDs cannot be further reduced. In the technical solution, the resolution of the display screen produced by the application of Micro LED is low, and ultra-high-resolution display cannot be realized.
在本申请的一个实施例中,如图2和图3所示,提出了一种发光器件,包括:基板1、发光单元13,反射层15以及色阻14,其中,发光单元13设置在反射层15上,以便在发光单元13运行发出光线时,发出的光线被反射层15反射,由于基板1与反射层15层叠设置,通过色阻14后的单一光线传输到基板1,并通过基板1发出。In an embodiment of the present application, as shown in FIG. 2 and FIG. 3 , a light-emitting device is proposed, which includes: a substrate 1 , a light-emitting unit 13 , a reflective layer 15 and a color resist 14 , wherein the light-emitting unit 13 is arranged on a reflective surface layer 15, so that when the light-emitting unit 13 operates to emit light, the emitted light is reflected by the reflective layer 15. Since the substrate 1 and the reflective layer 15 are laminated, the single light passing through the color resist 14 is transmitted to the substrate 1 and passes through the substrate 1. issue.
在该实施例中,提出了一种发光器件,提出的发光器件包括基板1、发光单元13,反射层15以及色阻14,其中,发光单元13设置在反射层15上,以便在发光单元13运行发出光线时,发出的光线被反射层15反射,由于基板1与反射层15层叠设置,通过色阻14后的单一光线传输到基板1,并通过基板1发出,以便进行显示。在该设计中,通过控制色阻14的尺寸即可实现超高分辨率的显示,克服了相关技术中Micro LED尺寸减小后,侧壁效应对超高分辨率的显示的影响。In this embodiment, a light-emitting device is proposed. The proposed light-emitting device includes a substrate 1 , a light-emitting unit 13 , a reflective layer 15 and a color resist 14 , wherein the light-emitting unit 13 is disposed on the reflective layer 15 so that the light-emitting unit 13 When operating to emit light, the emitted light is reflected by the reflective layer 15. Since the substrate 1 and the reflective layer 15 are stacked, the single light passing through the color resist 14 is transmitted to the substrate 1 and emitted through the substrate 1 for display. In this design, an ultra-high-resolution display can be realized by controlling the size of the color resistor 14, which overcomes the influence of the sidewall effect on the ultra-high-resolution display after the size of the Micro LED is reduced in the related art.
此外,反射层15的设置还起到对发光单元13保护作用,以便发光器件能够隔绝水氧、防止被刮伤等情况的出现。In addition, the provision of the reflective layer 15 also protects the light-emitting unit 13, so that the light-emitting device can be isolated from water and oxygen, and be prevented from being scratched.
在其中一个实施例中,发光单元13即微型发光二极管,其包括电极-正极-发光层-负极-电极,其结构如图3所示,其中,微型发光二极管,即μLED的结构在此不再进行限定。In one of the embodiments, the light-emitting unit 13 is a micro light-emitting diode, which includes an electrode-anode-light-emitting layer-negative electrode-electrode, and its structure is shown in FIG. be limited.
在其中一个实施例中,发光器件还包括:驱动电路层16,驱动电路层16位于基板1上;金属导电电极10,金属导电电极10位于驱动电路层16上,金属导电电极10与驱动电路层16中的半导体层4以及发光单元13的供电端连接,用于向发光单元13供电。In one embodiment, the light-emitting device further includes: a driving circuit layer 16, the driving circuit layer 16 is located on the substrate 1; a metal conductive electrode 10, the metal conductive electrode 10 is located on the driving circuit layer 16, the metal conductive electrode 10 and the driving circuit layer The semiconductor layer 4 in 16 and the power supply terminal of the light-emitting unit 13 are connected to supply power to the light-emitting unit 13 .
相关技术方案中,Micro LED中使用透明电极或高功函数电极等像素电极来实现发光单元13的导电,其中,透明电极或高功函数电极等像素电极可以是锡-铟氧化物、氧化铟锡,而上述透明电极或高功函数电极具有 成本高昂的特点。In the related technical solution, pixel electrodes such as transparent electrodes or high work function electrodes are used in the Micro LED to realize the conduction of the light emitting unit 13, wherein the pixel electrodes such as transparent electrodes or high work function electrodes can be tin-indium oxide, indium tin oxide, etc. , and the above-mentioned transparent electrodes or high work function electrodes have the characteristics of high cost.
本申请实施例中,可以不使用透明电极或高功函数电极等像素电极来实现发光单元13的导电,而是可以使用金属导电电极10来实现导电,因此,可以降低发光器件的制造成本。In the embodiment of the present application, instead of using a pixel electrode such as a transparent electrode or a high work function electrode, the conduction of the light emitting unit 13 can be achieved, but the metal conductive electrode 10 can be used to achieve conduction. Therefore, the manufacturing cost of the light emitting device can be reduced.
其中,金属导电电极10可以是任意金属导电电极10,如铜、铁和金中的任意一种。The metal conductive electrode 10 may be any metal conductive electrode 10, such as any one of copper, iron and gold.
此外,设置的驱动电路层16可以起到了对发光单元13供电的控制,以便控制发光单元13输出光线的控制。In addition, the provided driving circuit layer 16 can control the power supply to the light-emitting unit 13 so as to control the output light of the light-emitting unit 13 .
在上述任一实施例中,如图4所示,色阻14与发光单元13之间设置有间隙17。In any of the above embodiments, as shown in FIG. 4 , a gap 17 is provided between the color resist 14 and the light emitting unit 13 .
在该实施例中,由于色阻14与发光单元13之间并非直接进行接触的,即存在间隙17。因此,发光单元13发光所产生的热量并非直接作用在色阻14上,因此,可以降低发光单元13发光所产生的热量或散热对色阻14的影响,提高了色阻14的热稳定性,同时,延长了色阻14的使用寿命。In this embodiment, since the color resistance 14 and the light emitting unit 13 are not in direct contact, there is a gap 17 . Therefore, the heat generated by the light emitting unit 13 does not directly act on the color resistor 14, therefore, the heat generated by the light emitting unit 13 or the influence of heat dissipation on the color resistor 14 can be reduced, and the thermal stability of the color resistor 14 can be improved. At the same time, the service life of the color resist 14 is prolonged.
在上述任一实施例中,相邻两个金属导电电极10之间设置有凹陷,色阻14位于凹陷内。In any of the above embodiments, a recess is provided between two adjacent metal conductive electrodes 10, and the color resist 14 is located in the recess.
在该实施例中,色阻14位于相邻两个金属导电电极10之间的凹陷中,使得反射层15的厚度得以降低,因此,可以降低发光器件的尺寸。In this embodiment, the color resist 14 is located in the recess between two adjacent metal conductive electrodes 10 , so that the thickness of the reflective layer 15 can be reduced, and therefore, the size of the light emitting device can be reduced.
在上述任一实施例中,驱动电路层16包括:TFT驱动电路。In any of the above embodiments, the driving circuit layer 16 includes: a TFT driving circuit.
在该实施例中,TFT驱动电路起到的驱动开关作用,用于驱动发光单元13的输出光线。In this embodiment, the TFT driving circuit acts as a driving switch for driving the output light of the light-emitting unit 13 .
其中,TFT驱动电路包括位于基板1上的遮光层2、在遮光层2上的绝缘层3、在绝缘层3上形成的半导体层4以及在半导体层4上形成的介电层5,其中,介电层5上形成有栅极6以及在栅极6上形成的保护层7,该保护层7与半导体层4接触,将介电层5和栅极6包裹起来,同时,在保护层7上形成有源漏极8,其中,源漏极8与半导体层4和遮光层2接触,此外,在保护层7和源漏极8上形成钝化层9。The TFT driving circuit includes a light shielding layer 2 on the substrate 1, an insulating layer 3 on the light shielding layer 2, a semiconductor layer 4 formed on the insulating layer 3, and a dielectric layer 5 formed on the semiconductor layer 4, wherein, A gate 6 and a protective layer 7 formed on the gate 6 are formed on the dielectric layer 5. The protective layer 7 is in contact with the semiconductor layer 4 and wraps the dielectric layer 5 and the gate 6. At the same time, on the protective layer 7 The source and drain electrodes 8 are formed thereon, wherein the source and drain electrodes 8 are in contact with the semiconductor layer 4 and the light shielding layer 2 , and a passivation layer 9 is formed on the protective layer 7 and the source and drain electrodes 8 .
其中,钝化层9上形成的金属导电电极10与半导体层4接触。The metal conductive electrode 10 formed on the passivation layer 9 is in contact with the semiconductor layer 4 .
在上述任一实施例中,色阻14包括:光致发光染料膜或颜料材料膜。In any of the above embodiments, the color resist 14 includes: a photoluminescent dye film or a pigment material film.
在该实施例中,光致发光染料膜即具备光致发光的染料膜,其中,光致发光是指物体依赖外界光源进行照射,从而获得能量,产生激发导致发光的现象,通过使用具备光致发光的染料膜来实现色彩的输出。同理,颜料材料膜,即使用颜料的膜结构,在光线的照射下,输出与预先设定好的颜色所对应的颜色,以实现彩色显示。In this embodiment, the photoluminescent dye film is a dye film with photoluminescence, wherein the photoluminescence refers to the fact that an object relies on an external light source to be irradiated to obtain energy, and the phenomenon that excitation leads to luminescence occurs. Light-emitting dye film to achieve color output. In the same way, the pigment material film, that is, the film structure using the pigment, outputs the color corresponding to the preset color under the irradiation of light, so as to realize the color display.
在上述任一实施例中,还包括:间隔结构11,间隔结构11设置在反射层15上,位于相邻两个发光单元13之间。In any of the above embodiments, the spacer structure 11 is further included. The spacer structure 11 is disposed on the reflective layer 15 and is located between two adjacent light-emitting units 13 .
在该实施例中,通过设置的间隔结构11,以便单一发光单元13发出的不会在反射层15的作用下,出现光线逃逸这一情况的出现。其中,光线逃逸可以理解为,将光线反射到相邻发光器件的色阻14上,以便在一个发光器件中的发光单元13发出光线时,该发光器件周边的发光器件中的色阻14也同时发出光线这一情况的出现。In this embodiment, the spacer structure 11 is provided so that the light emitted by a single light-emitting unit 13 will not escape under the action of the reflective layer 15 . Wherein, light escape can be understood as reflecting light to the color resistances 14 of adjacent light-emitting devices, so that when the light-emitting unit 13 in one light-emitting device emits light, the color-resistors 14 in the surrounding light-emitting devices also simultaneously Emergence of light.
此外,通过设置间隔结构11,减少了相邻两个发光器件之间的相互影响,便于实现超高分辨率的显示。In addition, by arranging the spacer structure 11, the mutual influence between two adjacent light-emitting devices is reduced, which facilitates the realization of ultra-high-resolution display.
在其中一个实施例中,基板1包括透光基板1。In one of the embodiments, the substrate 1 includes a light-transmitting substrate 1 .
在本申请的第二方面的实施例中,提出了一种显示组件,其中,该显示组件包括如第一方面的发光器件。In an embodiment of the second aspect of the present application, a display assembly is proposed, wherein the display assembly includes the light emitting device of the first aspect.
本申请提出的显示组件包括如第一方面的发光器件,具体地,包括:基板1、发光单元13,反射层15以及色阻14,其中,发光单元13设置在反射层15上,以便在发光单元13运行发出光线时,发出的光线被反射层15反射,由于基板1与反射层15层叠设置,通过色阻14后的单一光线传输到基板1,并通过基板1发出。The display assembly proposed in the present application includes the light-emitting device according to the first aspect, and specifically includes: a substrate 1, a light-emitting unit 13, a reflective layer 15, and a color resist 14, wherein the light-emitting unit 13 is disposed on the reflective layer 15 so as to emit light when When the unit 13 operates to emit light, the emitted light is reflected by the reflective layer 15 . Since the substrate 1 and the reflective layer 15 are stacked, the single light passing through the color resist 14 is transmitted to the substrate 1 and emitted through the substrate 1 .
在该实施例中,提出了一种显示组件,其包含的发光器件包括基板1、发光单元13,反射层15以及色阻14,其中,发光单元13设置在反射层15上,以便在发光单元13运行发出光线时,发出的光线被反射层15反射,由于基板1与反射层15层叠设置,通过色阻14后的单一光线传输到基板1,并通过基板1发出,以便进行显示。在该设计中,通过控制色阻 14的尺寸即可实现超高分辨率的显示,克服了相关技术中Micro LED尺寸减小后,侧壁效应对超高分辨率的显示的影响。In this embodiment, a display assembly is proposed, which includes a light-emitting device including a substrate 1, a light-emitting unit 13, a reflective layer 15 and a color resist 14, wherein the light-emitting unit 13 is disposed on the reflective layer 15, so that the light-emitting unit 13 is placed on the reflective layer 15. 13 When the light is emitted during operation, the emitted light is reflected by the reflective layer 15. Since the substrate 1 and the reflective layer 15 are stacked, the single light passing through the color resist 14 is transmitted to the substrate 1 and emitted through the substrate 1 for display. In this design, an ultra-high-resolution display can be realized by controlling the size of the color resist 14, which overcomes the influence of the sidewall effect on the ultra-high-resolution display after the size of the Micro LED is reduced in the related art.
此外,反射层15的设置还起到对发光单元13保护作用,以便发光器件能够隔绝水氧、防止被刮伤等情况的出现。In addition, the provision of the reflective layer 15 also protects the light-emitting unit 13, so that the light-emitting device can be isolated from water and oxygen, and be prevented from being scratched.
在其中一个实施例中,任一两个发光器件共用一个基板1。In one of the embodiments, any two light-emitting devices share one substrate 1 .
在该实施例中,任一两个发光器件共用一个基板1,以便在进行刻蚀以得到凹陷时,可以对所有的发光器件进行刻蚀,在提高制作效率的同时,以便降低显示组件的尺寸。In this embodiment, any two light-emitting devices share one substrate 1, so that when etching is performed to obtain recesses, all light-emitting devices can be etched, so as to improve the manufacturing efficiency and reduce the size of the display assembly .
在其中一个实施例中,发光器件中的色阻包括红色色阻、绿色色阻和蓝色色阻;其中,发光单元13为蓝光发光单元13。In one embodiment, the color resists in the light emitting device include red color resists, green color resists and blue color resists; wherein, the light emitting unit 13 is a blue light emitting unit 13 .
在其中一个实施例中,发光器件中的色阻包括红色色阻、绿色色阻和无色色阻;其中,发光单元13为蓝光发光单元13。In one embodiment, the color resists in the light emitting device include red color resists, green color resists, and colorless color resists; wherein, the light emitting unit 13 is a blue light emitting unit 13 .
在该实施例中,通过限定色阻的三种颜色,以实现显示组件的彩色显示。In this embodiment, the color display of the display assembly is realized by defining three colors of the color resistance.
相关技术方案中,如图5所示,以现有UV/蓝光LED加量子点(QD)发光色转换为例,为了实现彩色显示,需要对发光器件进行三次巨量转移,而转移次数的增加会造成发光器件制造成功的几率降低,进而造成发光器件制造成本的增加。In the related technical solution, as shown in FIG. 5, taking the existing UV/blue LED plus quantum dot (QD) emission color conversion as an example, in order to realize color display, it is necessary to perform three massive transfers on the light-emitting device, and the number of transfers increases. This will reduce the probability of successful manufacture of the light-emitting device, thereby increasing the manufacturing cost of the light-emitting device.
在该实施例中,在发光器件的制备中,执行一次巨量转移即可实现彩色显示,无需进行三次巨量转移,因此,降低发光器件的制造成本。In this embodiment, in the preparation of the light emitting device, color display can be realized by performing one bulk transfer, and three bulk transfers are not required, thus reducing the manufacturing cost of the light emitting device.
此外,在发光器件的制备中,巨量转移的次数有所降低,降低了量产的难度。In addition, in the preparation of light-emitting devices, the number of mass transfers is reduced, which reduces the difficulty of mass production.
在本申请的第三方面的实施例中,如图6所示,提出了一种发光器件的制造方法,包括:In an embodiment of the third aspect of the present application, as shown in FIG. 6 , a method for manufacturing a light-emitting device is proposed, including:
步骤602,在基板上形成驱动电路层以及与驱动电路层中的半导体层连接的金属导电电极; Step 602, forming a driving circuit layer and a metal conductive electrode connected to the semiconductor layer in the driving circuit layer on the substrate;
步骤604,在相邻两个金属导电电极之间形成色阻; Step 604, forming a color resistance between two adjacent metal conductive electrodes;
步骤606,将发光单元安装在色阻上; Step 606, installing the light-emitting unit on the color resist;
步骤608,在发光单元上形成反射层。 Step 608, forming a reflective layer on the light-emitting unit.
本申请实施例提出了一种发光器件的制造方法,通过在相邻两个金属导电电极10之间形成色阻14,并在色阻14上安装发光单元13之后,在发光单元13上形成反射层15,由于反射层15和色阻14的形成,以便发光单元13发出的光线在反射层15的反射作用下经由色阻14在接收到光线的情况下输出单一颜色的光线,并通过基板1发出。相对于现有技术方案,本申请实施例中通过改变发光器件在实现彩色显示所采用的方式,以便通过控制色阻14的尺寸即可实现超高分辨率的显示,克服了相关技术中Micro LED尺寸减小后,侧壁效应对超高分辨率的显示的影响。The embodiment of the present application proposes a method for manufacturing a light-emitting device, by forming a color resist 14 between two adjacent metal conductive electrodes 10, and after installing a light-emitting unit 13 on the color resist 14, a reflection is formed on the light-emitting unit 13 Layer 15, due to the formation of the reflective layer 15 and the color resist 14, so that the light emitted by the light emitting unit 13 is reflected by the reflective layer 15 through the color resist 14 to output a single color of light when it receives the light, and passes through the substrate 1 issue. Compared with the prior art solution, in the embodiment of the present application, the method used by the light-emitting device to realize the color display is changed, so that the ultra-high-resolution display can be realized by controlling the size of the color resistance 14, which overcomes the problem of the Micro LED in the related art. The effect of sidewall effects on ultra-high-resolution displays after size reduction.
此外,反射层15的设置还起到对发光单元13保护作用,以便发光器件能够隔绝水氧、防止被刮伤等情况的出现。In addition, the provision of the reflective layer 15 also protects the light-emitting unit 13, so that the light-emitting device can be isolated from water and oxygen, and be prevented from being scratched.
在其中一个实施例中,采用光刻工艺在相邻两个金属导电电极10之间进行刻蚀,以得到色阻14。In one embodiment, a photolithography process is used to etch between two adjacent metal conductive electrodes 10 to obtain the color resist 14 .
在该实施例中,色阻14位于相邻两个金属导电电极10之间的凹陷中,使得反射层的厚度得以降低,因此,可以降低发光器件的尺寸。In this embodiment, the color resist 14 is located in the recess between two adjacent metal conductive electrodes 10, so that the thickness of the reflective layer can be reduced, and therefore, the size of the light emitting device can be reduced.
在其中一个实施例中,色阻14包括:光致发光染料膜或颜料材料膜。In one embodiment, the color resist 14 includes: a photoluminescent dye film or a pigment material film.
在该实施例中,光致发光染料膜即具备光致发光的染料膜,其中,光致发光是指物体依赖外界光源进行照射,从而获得能量,产生激发导致发光的现象,通过使用具备光致发光的染料膜来实现色彩的输出。同理,颜料材料膜,即使用颜料的膜结构,在光线的照射下,输出与预先设定好的颜色所对应的颜色,以实现彩色显示。In this embodiment, the photoluminescent dye film is a dye film with photoluminescence, wherein the photoluminescence refers to the fact that an object relies on an external light source to be irradiated to obtain energy, and the phenomenon that excitation leads to luminescence occurs. Light-emitting dye film to achieve color output. In the same way, the pigment material film, that is, the film structure using the pigment, outputs the color corresponding to the preset color under the irradiation of light, so as to realize the color display.
在其中一个实施例中,在发光单元13上形成反射层15的步骤之前,还包括:在基板1上且位于相邻两个发光单元13之间形成间隔结构11。In one embodiment, before the step of forming the reflective layer 15 on the light-emitting units 13 , the method further includes: forming a spacer structure 11 on the substrate 1 and between two adjacent light-emitting units 13 .
在该实施例中,通过设置的间隔结构11,以便单一发光单元13发出的不会在反射层15的作用下,出现光线逃逸这一情况的出现。其中,光线逃逸可以理解为,将光线反射到相邻发光器件的色阻14上,以便在一个发光器件中的发光单元13发出光线时,该发光器件周边的发光器件中的色阻14也同时发出光线这一情况的出现。In this embodiment, the spacer structure 11 is provided so that the light emitted by a single light-emitting unit 13 will not escape under the action of the reflective layer 15 . Wherein, light escape can be understood as reflecting light to the color resistances 14 of adjacent light-emitting devices, so that when the light-emitting unit 13 in one light-emitting device emits light, the color-resistors 14 in the surrounding light-emitting devices also simultaneously Emergence of light.
此外,通过设置间隔结构11,减少了相邻两个发光器件之间的相互影 响,便于实现超高分辨率的显示。In addition, by arranging the spacer structure 11, the mutual influence between two adjacent light-emitting devices is reduced, which facilitates the realization of ultra-high-resolution display.
在其中一个实施例中,驱动电路层16包括:薄膜晶体管(Thin Film Transistor,TFT)驱动电路。In one embodiment, the driving circuit layer 16 includes: a thin film transistor (Thin Film Transistor, TFT) driving circuit.
其中,TFT驱动电路包括位于基板1上的遮光层2、在遮光层2上的绝缘层3、在绝缘层3上形成的半导体层4以及在半导体层4上形成的介电层5,其中,介电层5上形成有栅极6以及在栅极6上形成的保护层7,该保护层7与半导体层4接触,将介电层5和栅极6包裹起来,同时,在保护层7上形成有源漏极8,其中,源漏极8与半导体层4和遮光层2接触,此外,在保护层7和源漏极8上形成钝化层9。The TFT driving circuit includes a light shielding layer 2 on the substrate 1, an insulating layer 3 on the light shielding layer 2, a semiconductor layer 4 formed on the insulating layer 3, and a dielectric layer 5 formed on the semiconductor layer 4, wherein, A gate 6 and a protective layer 7 formed on the gate 6 are formed on the dielectric layer 5. The protective layer 7 is in contact with the semiconductor layer 4 and wraps the dielectric layer 5 and the gate 6. At the same time, on the protective layer 7 The source and drain electrodes 8 are formed thereon, wherein the source and drain electrodes 8 are in contact with the semiconductor layer 4 and the light shielding layer 2 , and a passivation layer 9 is formed on the protective layer 7 and the source and drain electrodes 8 .
其中,钝化层9上形成的金属导电电极10与半导体层4接触。The metal conductive electrode 10 formed on the passivation layer 9 is in contact with the semiconductor layer 4 .
在本申请的实施例中,在基板1上制备TFT驱动电路并连接金属导电电极10,金属导电电极10间通过光刻工艺图案化制备上色阻14,在色阻14的两端上面连接μLED,由于μLED两端电极需单独连接,即在色阻14上会有空隙将μLED与色阻14隔离开来,从而实现了色阻14与μLED的不接触,可有效改善热对色阻14的影响;同时在上面增加反射层15使μLED向上发射的光穿透μLED反射回到色阻14,从基板1上穿透出,从而实现底发射。In the embodiment of the present application, a TFT driving circuit is prepared on the substrate 1 and connected to the metal conductive electrodes 10. The metal conductive electrodes 10 are patterned by a photolithography process to prepare a color resist 14, and the two ends of the color resist 14 are connected to μLEDs , since the electrodes at both ends of the μLED need to be connected separately, that is, there will be a gap on the color resistance 14 to isolate the μLED from the color resistance 14, thereby realizing the non-contact between the color resistance 14 and the μLED, which can effectively improve the thermal resistance to the color resistance 14. At the same time, adding a reflective layer 15 on the top makes the light emitted upward from the μLED penetrate the μLED and reflect back to the color resist 14, and penetrates out from the substrate 1, thereby realizing bottom emission.
其中,基板1为显示屏提供支撑作用;TFT为显示屏提供驱动开关作用;金属导电电极10为显示组件提供导电作用;共晶连接12是μLED与TFT驱动背板的连接剂;μLED为发光二极管,是发光子像素;隔离结构的形状可以是柱状,为防止各子像素间串色而制备的黑色矩阵;反射层15为具有光反射功能的膜层,将μLED向上发射的光反射到向下发射,同时为整个显示屏提供隔离水氧、防刮等保护作用。Among them, the substrate 1 provides support for the display screen; the TFT provides the driving switch function for the display screen; the metal conductive electrode 10 provides the conductive function for the display component; the eutectic connection 12 is the connecting agent between the μLED and the TFT driving backplane; μLED is the light emitting diode , is a light-emitting sub-pixel; the shape of the isolation structure can be a column, a black matrix prepared to prevent cross-color between sub-pixels; the reflective layer 15 is a film layer with light reflection function, which reflects the light emitted by the μLED upward to the downward direction. At the same time, it provides protection such as isolation of water and oxygen and scratch resistance for the entire display.
本申请实施例在μLED与驱动的基板1之间增加了色阻14,以及在显示屏上增加了反射层15,当μLED向上发射光时被反射层15反射回来穿过色阻14实现彩色化,并穿透基板1从显示面板的底部发射出光从而实现底发射,本申请实施例与传统色转换方案之间的结构不同,本提案的色阻14放置于基板1上,不与μLED直接接触,可有效隔绝μLED发光产生热量以及散热对色阻14的影响,从而改善显示寿命;同时通过微米级甚 至纳米级半导体光刻工艺可实现色阻14尺寸控制,从而不依赖μLED尺寸大小而实现高分辨率显示。In the embodiment of the present application, a color resist 14 is added between the μLED and the driven substrate 1, and a reflective layer 15 is added on the display screen. When the μLED emits light upward, it is reflected by the reflective layer 15 and passes through the color resist 14 to realize colorization , and penetrates the substrate 1 to emit light from the bottom of the display panel to realize bottom emission. The structure of the embodiment of the present application is different from that of the traditional color conversion scheme. The color resist 14 of this proposal is placed on the substrate 1 and is not in direct contact with the μLED. , which can effectively isolate the influence of the heat generated by the μLED light emission and the heat dissipation on the color resistance 14, thereby improving the display life; at the same time, the size control of the color resistance 14 can be achieved through the micron-level or even nano-scale semiconductor lithography process, so that it does not depend on the size of the μLED. Resolution display.
此外,相关技术方案中,Micro-LED彩色化实现方法主要包括RGB三色μLED法(以图1为例)、蓝光LED加发光介质法(以图4为例)、光学透镜合成法。In addition, in the related technical solution, the Micro-LED colorization implementation methods mainly include RGB three-color μLED method (take FIG. 1 as an example), blue LED plus luminescent medium method (take FIG. 4 as an example), and optical lens synthesis method.
其中,RGB三色μLED法由于需要进行三次μLED巨量转移来实现彩色化显示,在现有巨量转移技术良率低且工序复杂的情况下,给后续修复带来了巨大难题,难以进行批量化生产。光学透镜合成法将三个红、绿、蓝三色的micro-LED阵列分别封装在三块封装板上,并连接一块控制板与一个三色棱镜,之后可通过驱动面板来传输图片信号,调整三色micro-LED阵列的亮度以实现彩色化,该方法通过棱镜来实现光路转换,结构复杂,显示设备体积庞大,不适合应用于移动终端。而本申请实施例提出的发光器件的制造方法无需进行三次巨量转移,因此,降低了量产的难度。Among them, the RGB three-color μLED method requires three times of μLED mass transfer to achieve colorized display. Under the condition of low yield and complex process of the existing mass transfer technology, it brings huge problems to subsequent repairs, and it is difficult to carry out batch processing. production. The optical lens synthesis method encapsulates three red, green, and blue micro-LED arrays on three packaging boards respectively, and connects a control board and a three-color prism. The brightness of the three-color micro-LED array is used to achieve colorization. This method uses a prism to realize the light path conversion. The structure is complex and the display device is bulky, which is not suitable for mobile terminals. However, the manufacturing method of the light-emitting device proposed in the embodiment of the present application does not require three massive transfers, thus reducing the difficulty of mass production.
此外,对于蓝光LED加发光介质法是目前最为接近实现量产的方法,图5示出现有UV/蓝光LED加量子点(QD)发光色转换结构示意图,如图5所示,目前现有发光介质为荧光粉或量子点,由于荧光粉涂层将会吸收部分能量,降低了转化率且荧光粉颗粒的尺寸较大,约为1-10微米,随着micro-LED像素尺寸不断减小,荧光粉涂覆变的愈加不均匀且影响显示质量;而量子点材料稳定性不好、对散热要求高,现有技术将量子点涂敷在Micro LED上面,由于μLED发光会产生大量热量将会极大的影响量子点显示寿命短,这极大了限制了其应用范围,由于本申请中色阻14与发光单元13之间存在间隙,间隙的存在,降低了发光单元13对色阻14的影响,提高了发光器件的寿命。In addition, the blue LED plus luminescent medium method is currently the closest method to mass production. Figure 5 shows a schematic diagram of the existing UV/blue LED plus quantum dot (QD) emission color conversion structure. The medium is phosphors or quantum dots. Since the phosphor coating will absorb part of the energy, the conversion rate will be reduced, and the size of the phosphor particles is large, about 1-10 microns. As the size of the micro-LED pixel continues to decrease, The phosphor coating becomes more and more uneven and affects the display quality; while the quantum dot material is not stable and requires high heat dissipation. In the existing technology, quantum dots are coated on the Micro LED. Since the μLED emits a lot of heat, it will It greatly affects the short lifespan of the quantum dots, which greatly limits its application range. Since there is a gap between the color resistance 14 and the light-emitting unit 13 in this application, the existence of the gap reduces the effect of the light-emitting unit 13 on the color resistance 14. Influence, improve the life of the light-emitting device.
需要说明的是,在本文中,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、方法、物品或者装置不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、方法、物品或者装置所固有的要素。在没有更多限制的情况下,由语句“包括一个......”限定的要素,并不排除在包括该要素的过程、方法、物品或者装置中还存在另外的相同要素。此外,需 要指出的是,本申请实施方式中的方法和装置的范围不限按示出或讨论的顺序来执行功能,还可包括根据所涉及的功能按基本同时的方式或按相反的顺序来执行功能,例如,可以按不同于所描述的次序来执行所描述的方法,并且还可以添加、省去、或组合各种步骤。另外,参照某些示例所描述的特征可在其他示例中被组合。It should be noted that, herein, the terms "comprising", "comprising" or any other variation thereof are intended to encompass non-exclusive inclusion, such that a process, method, article or device comprising a series of elements includes not only those elements, It also includes other elements not expressly listed or inherent to such a process, method, article or apparatus. Without further limitation, an element qualified by the phrase "comprising a..." does not preclude the presence of additional identical elements in a process, method, article or apparatus that includes the element. Furthermore, it should be noted that the scope of the methods and apparatus in the embodiments of the present application is not limited to performing the functions in the order shown or discussed, but may also include performing the functions in a substantially simultaneous manner or in the reverse order depending on the functions involved. To perform functions, for example, the described methods may be performed in an order different from that described, and various steps may also be added, omitted, or combined. Additionally, features described with reference to some examples may be combined in other examples.
通过以上的实施方式的描述,本领域的技术人员可以清楚地了解到上述实施例方法可借助软件加必需的通用硬件平台的方式来实现,当然也可以通过硬件,但很多情况下前者是更佳的实施方式。基于这样的理解,本申请的实施例本质上或者说对现有技术做出贡献的部分可以以软件产品的形式体现出来,该计算机软件产品存储在一个存储介质(如ROM/RAM、磁碟、光盘)中,包括若干指令用以使得一台终端(可以是手机,计算机,服务器,空调器,或者网络设备等)执行本申请各个实施例的方法。From the description of the above embodiments, those skilled in the art can clearly understand that the method of the above embodiment can be implemented by means of software plus a necessary general hardware platform, and of course can also be implemented by hardware, but in many cases the former is better implementation. Based on this understanding, the embodiments of the present application can be embodied in the form of software products that are essentially or contribute to the prior art, and the computer software products are stored in a storage medium (such as ROM/RAM, magnetic disk, CD-ROM), including several instructions to enable a terminal (which may be a mobile phone, a computer, a server, an air conditioner, or a network device, etc.) to execute the methods of the various embodiments of the present application.
上面结合附图对本申请的实施例进行了描述,但是本申请并不局限于上述的具体实施方式,上述的具体实施方式仅仅是示意性的,而不是限制性的,本领域的普通技术人员在本申请的启示下,在不脱离本申请宗旨和权利要求所保护的范围情况下,还可做出很多形式,均属于本申请的保护之内。The embodiments of the present application have been described above in conjunction with the accompanying drawings, but the present application is not limited to the above-mentioned specific embodiments, which are merely illustrative rather than restrictive. Under the inspiration of this application, without departing from the scope of protection of the purpose of this application and the claims, many forms can be made, which all fall within the protection of this application.

Claims (10)

  1. 一种发光器件,包括:基板、反射层、发光单元以及色阻;A light-emitting device, comprising: a substrate, a reflective layer, a light-emitting unit and a color resistance;
    所述基板与所述反射层层叠设置;the substrate and the reflective layer are stacked and arranged;
    所述发光单元设置在所述反射层上,所述色阻位于所述发光单元与所述基板之间;The light-emitting unit is disposed on the reflective layer, and the color resist is located between the light-emitting unit and the substrate;
    其中,所述发光单元发出的至少部分光线经由所述反射层反射至所述色阻,以使所述色阻输出单一颜色的光线后通过所述基板发出。Wherein, at least part of the light emitted by the light emitting unit is reflected to the color resist through the reflective layer, so that the color resist outputs a single color of light and then emits light through the substrate.
  2. 根据权利要求1所述的发光器件,还包括:The light emitting device of claim 1, further comprising:
    驱动电路层,所述驱动电路层设置在所述基板上;a driving circuit layer, the driving circuit layer is disposed on the substrate;
    金属导电电极,所述金属导电电极位于所述驱动电路层上,所述金属导电电极与所述驱动电路层中的半导体层以及所述发光单元的供电端连接,用于向所述发光单元供电;a metal conductive electrode, the metal conductive electrode is located on the driving circuit layer, the metal conductive electrode is connected to the semiconductor layer in the driving circuit layer and the power supply terminal of the light-emitting unit, and is used for supplying power to the light-emitting unit ;
    相邻两个所述金属导电电极之间设置有凹陷,所述色阻位于所述凹陷内。A recess is provided between two adjacent metal conductive electrodes, and the color resistor is located in the recess.
  3. 根据权利要求2所述的发光器件,其中,所述色阻与所述发光单元之间设置有间隙。The light emitting device according to claim 2, wherein a gap is provided between the color resistor and the light emitting unit.
  4. 根据权利要求1至3中任一项所述的发光器件,还包括:The light emitting device according to any one of claims 1 to 3, further comprising:
    间隔结构,所述间隔结构设置在所述反射层上,位于相邻两个发光单元之间。A spacer structure is provided on the reflective layer and is located between two adjacent light-emitting units.
  5. 一种显示组件,包括:A display assembly comprising:
    多个如权利要求1至4中任一项所述的发光器件。A plurality of light emitting devices as claimed in any one of claims 1 to 4.
  6. 根据权利要求5所述的显示组件,其中,任一两个发光器件共用一个基板。The display assembly of claim 5, wherein any two light emitting devices share one substrate.
  7. 根据权利要求5或6所述的显示组件,其中,所述发光器件中的色阻包括红色色阻、绿色色阻和蓝色色阻;The display assembly according to claim 5 or 6, wherein the color resistance in the light emitting device comprises red color resistance, green color resistance and blue color resistance;
    其中,所述发光器件中的发光单元为蓝光发光单元。Wherein, the light-emitting unit in the light-emitting device is a blue light-emitting unit.
  8. 根据权利要求5或6所述的显示组件,其中,A display assembly according to claim 5 or 6, wherein,
    所述发光器件中的色阻包括红色色阻、绿色色阻和无色色阻;The color resistance in the light-emitting device includes red color resistance, green color resistance and colorless color resistance;
    其中,所述发光器件中的发光单元为蓝光发光单元。Wherein, the light-emitting unit in the light-emitting device is a blue light-emitting unit.
  9. 一种发光器件的制造方法,包括:A method of manufacturing a light-emitting device, comprising:
    在基板上形成驱动电路层以及与所述驱动电路层中的半导体层连接的金属导电电极;forming a driving circuit layer and a metal conductive electrode connected with the semiconductor layer in the driving circuit layer on the substrate;
    在相邻两个所述金属导电电极之间形成色阻;forming a color resistance between two adjacent metal conductive electrodes;
    将发光单元安装在所述色阻上;installing the light-emitting unit on the color resist;
    在所述发光单元上形成反射层。A reflective layer is formed on the light emitting unit.
  10. 根据权利要求9所述的发光器件的制造方法,其中,采用光刻工艺在相邻两个所述金属导电电极之间进行刻蚀,以得到色阻。The method for manufacturing a light-emitting device according to claim 9, wherein a photolithography process is used to perform etching between two adjacent metal conductive electrodes to obtain color resistance.
PCT/CN2022/073559 2021-02-26 2022-01-24 Light-emitting device, display assembly and method for manufacturing light-emitting device WO2022179370A1 (en)

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