WO2022176976A1 - 感光性着色組成物、硬化物、隔壁、有機電界発光素子及び画像表示装置 - Google Patents
感光性着色組成物、硬化物、隔壁、有機電界発光素子及び画像表示装置 Download PDFInfo
- Publication number
- WO2022176976A1 WO2022176976A1 PCT/JP2022/006586 JP2022006586W WO2022176976A1 WO 2022176976 A1 WO2022176976 A1 WO 2022176976A1 JP 2022006586 W JP2022006586 W JP 2022006586W WO 2022176976 A1 WO2022176976 A1 WO 2022176976A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- group
- mass
- less
- ring
- preferable
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 178
- -1 nitrogenous aromatic compounds Chemical class 0.000 claims abstract description 221
- 150000001875 compounds Chemical class 0.000 claims abstract description 98
- 229920005989 resin Polymers 0.000 claims abstract description 77
- 239000011347 resin Substances 0.000 claims abstract description 77
- 239000002270 dispersing agent Substances 0.000 claims abstract description 76
- 239000003086 colorant Substances 0.000 claims abstract description 57
- 239000003999 initiator Substances 0.000 claims abstract description 18
- 238000004040 coloring Methods 0.000 claims description 170
- 239000000049 pigment Substances 0.000 claims description 119
- 238000000034 method Methods 0.000 claims description 81
- 125000004432 carbon atom Chemical group C* 0.000 claims description 62
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 43
- 125000000217 alkyl group Chemical group 0.000 claims description 41
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 41
- 238000005192 partition Methods 0.000 claims description 40
- 238000000576 coating method Methods 0.000 claims description 38
- 239000011248 coating agent Substances 0.000 claims description 36
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 34
- 239000007787 solid Substances 0.000 claims description 30
- 238000005401 electroluminescence Methods 0.000 claims description 25
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 21
- 230000003287 optical effect Effects 0.000 claims description 16
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 14
- 125000005843 halogen group Chemical group 0.000 claims description 14
- 239000001055 blue pigment Substances 0.000 claims description 13
- 239000011342 resin composition Substances 0.000 claims description 13
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 11
- 239000001053 orange pigment Substances 0.000 claims description 11
- 239000001054 red pigment Substances 0.000 claims description 11
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims description 10
- 239000012964 benzotriazole Substances 0.000 claims description 10
- 150000003839 salts Chemical class 0.000 claims description 10
- 229910052801 chlorine Inorganic materials 0.000 claims description 9
- 125000000392 cycloalkenyl group Chemical group 0.000 claims description 7
- 239000001057 purple pigment Substances 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 238000004868 gas analysis Methods 0.000 claims description 6
- 125000003342 alkenyl group Chemical group 0.000 claims description 4
- 125000000304 alkynyl group Chemical group 0.000 claims description 4
- 125000001153 fluoro group Chemical group F* 0.000 claims description 4
- 229910006074 SO2NH2 Inorganic materials 0.000 claims description 3
- 229910006069 SO3H Inorganic materials 0.000 claims description 3
- 125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 claims description 3
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 3
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 125000004434 sulfur atom Chemical group 0.000 claims description 3
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 abstract description 11
- 239000010408 film Substances 0.000 description 110
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 90
- 125000001931 aliphatic group Chemical group 0.000 description 69
- 238000011161 development Methods 0.000 description 67
- 230000003746 surface roughness Effects 0.000 description 63
- 125000003118 aryl group Chemical group 0.000 description 60
- 239000000758 substrate Substances 0.000 description 53
- 239000004593 Epoxy Substances 0.000 description 52
- 125000001424 substituent group Chemical group 0.000 description 50
- 239000002904 solvent Substances 0.000 description 48
- 239000003822 epoxy resin Substances 0.000 description 46
- 229920000647 polyepoxide Polymers 0.000 description 46
- 230000035945 sensitivity Effects 0.000 description 45
- 239000004925 Acrylic resin Substances 0.000 description 42
- 239000006185 dispersion Substances 0.000 description 41
- 239000000178 monomer Substances 0.000 description 39
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 38
- 239000010410 layer Substances 0.000 description 37
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 37
- 239000006229 carbon black Substances 0.000 description 36
- 235000019241 carbon black Nutrition 0.000 description 36
- 230000006866 deterioration Effects 0.000 description 29
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 27
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 27
- 238000006116 polymerization reaction Methods 0.000 description 27
- 239000002253 acid Substances 0.000 description 24
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 24
- 230000036961 partial effect Effects 0.000 description 24
- 230000009467 reduction Effects 0.000 description 24
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 23
- 239000007789 gas Substances 0.000 description 21
- 150000008064 anhydrides Chemical class 0.000 description 20
- 125000004122 cyclic group Chemical group 0.000 description 20
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 20
- 150000007519 polyprotic acids Polymers 0.000 description 20
- 239000000126 substance Substances 0.000 description 20
- 239000000047 product Substances 0.000 description 19
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 18
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 18
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 18
- 239000000975 dye Substances 0.000 description 18
- 238000000059 patterning Methods 0.000 description 18
- 239000000463 material Substances 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 125000000524 functional group Chemical group 0.000 description 15
- 239000007788 liquid Substances 0.000 description 15
- 239000003960 organic solvent Substances 0.000 description 15
- 239000002245 particle Substances 0.000 description 15
- 229920000642 polymer Polymers 0.000 description 15
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 15
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical group C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 14
- 238000009835 boiling Methods 0.000 description 14
- 238000001723 curing Methods 0.000 description 14
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 13
- 125000003545 alkoxy group Chemical group 0.000 description 13
- 150000004945 aromatic hydrocarbons Chemical group 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 13
- 125000001624 naphthyl group Chemical group 0.000 description 13
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 12
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 12
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 12
- 229920001577 copolymer Polymers 0.000 description 12
- DDTBPAQBQHZRDW-UHFFFAOYSA-N cyclododecane Chemical group C1CCCCCCCCCCC1 DDTBPAQBQHZRDW-UHFFFAOYSA-N 0.000 description 12
- 238000001035 drying Methods 0.000 description 12
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 12
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 12
- 230000002829 reductive effect Effects 0.000 description 12
- 239000004094 surface-active agent Substances 0.000 description 12
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 12
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 12
- 244000172533 Viola sororia Species 0.000 description 11
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 11
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 11
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 11
- 230000000694 effects Effects 0.000 description 11
- 239000011521 glass Substances 0.000 description 11
- 150000002430 hydrocarbons Chemical group 0.000 description 11
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 11
- 241000721047 Danaus plexippus Species 0.000 description 10
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 10
- 125000003710 aryl alkyl group Chemical group 0.000 description 10
- 229920001400 block copolymer Polymers 0.000 description 10
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 10
- 239000003112 inhibitor Substances 0.000 description 10
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 10
- 239000011976 maleic acid Substances 0.000 description 10
- 125000000547 substituted alkyl group Chemical group 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 9
- 125000003277 amino group Chemical group 0.000 description 9
- 239000002585 base Substances 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 9
- 229910052791 calcium Inorganic materials 0.000 description 9
- PESYEWKSBIWTAK-UHFFFAOYSA-N cyclopenta-1,3-diene;titanium(2+) Chemical class [Ti+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 PESYEWKSBIWTAK-UHFFFAOYSA-N 0.000 description 9
- 150000002148 esters Chemical group 0.000 description 9
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 9
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 239000011734 sodium Substances 0.000 description 9
- 229910052708 sodium Inorganic materials 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 8
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 8
- 150000001412 amines Chemical class 0.000 description 8
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 8
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 8
- 150000001735 carboxylic acids Chemical class 0.000 description 8
- 238000005227 gel permeation chromatography Methods 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 8
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 8
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 8
- 230000001235 sensitizing effect Effects 0.000 description 8
- 229910052709 silver Inorganic materials 0.000 description 8
- 239000004332 silver Substances 0.000 description 8
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 7
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 7
- 238000010550 living polymerization reaction Methods 0.000 description 7
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 229920003986 novolac Polymers 0.000 description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- 125000001453 quaternary ammonium group Chemical group 0.000 description 7
- 125000003944 tolyl group Chemical group 0.000 description 7
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 6
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 6
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 6
- 239000006087 Silane Coupling Agent Substances 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 125000002252 acyl group Chemical group 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- LMGZGXSXHCMSAA-UHFFFAOYSA-N cyclodecane Chemical group C1CCCCCCCCC1 LMGZGXSXHCMSAA-UHFFFAOYSA-N 0.000 description 6
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 6
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 6
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 238000004090 dissolution Methods 0.000 description 6
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 6
- 229910052753 mercury Inorganic materials 0.000 description 6
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical group C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 6
- 125000000962 organic group Chemical group 0.000 description 6
- 239000012044 organic layer Substances 0.000 description 6
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 6
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 6
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 6
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 6
- 238000007788 roughening Methods 0.000 description 6
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 125000003107 substituted aryl group Chemical group 0.000 description 6
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical compound N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 5
- 239000004793 Polystyrene Substances 0.000 description 5
- 125000003368 amide group Chemical group 0.000 description 5
- 125000005577 anthracene group Chemical group 0.000 description 5
- 239000011324 bead Substances 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- 239000000470 constituent Substances 0.000 description 5
- 238000007334 copolymerization reaction Methods 0.000 description 5
- 125000004093 cyano group Chemical group *C#N 0.000 description 5
- 230000007547 defect Effects 0.000 description 5
- 238000005886 esterification reaction Methods 0.000 description 5
- 230000005525 hole transport Effects 0.000 description 5
- 238000005286 illumination Methods 0.000 description 5
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical group C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 5
- 229920001228 polyisocyanate Polymers 0.000 description 5
- 239000005056 polyisocyanate Substances 0.000 description 5
- 229920002223 polystyrene Polymers 0.000 description 5
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 5
- 150000003254 radicals Chemical class 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 238000006467 substitution reaction Methods 0.000 description 5
- 238000004448 titration Methods 0.000 description 5
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 4
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 238000007259 addition reaction Methods 0.000 description 4
- 125000000129 anionic group Chemical group 0.000 description 4
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 4
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000010304 firing Methods 0.000 description 4
- 238000013007 heat curing Methods 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 235000019239 indanthrene blue RS Nutrition 0.000 description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 4
- BHIWKHZACMWKOJ-UHFFFAOYSA-N methyl isobutyrate Chemical compound COC(=O)C(C)C BHIWKHZACMWKOJ-UHFFFAOYSA-N 0.000 description 4
- 125000002950 monocyclic group Chemical group 0.000 description 4
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- RDOWQLZANAYVLL-UHFFFAOYSA-N phenanthridine Chemical group C1=CC=C2C3=CC=CC=C3C=NC2=C1 RDOWQLZANAYVLL-UHFFFAOYSA-N 0.000 description 4
- 125000004344 phenylpropyl group Chemical group 0.000 description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 4
- 150000005846 sugar alcohols Polymers 0.000 description 4
- 239000000725 suspension Substances 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- DJKGDNKYTKCJKD-BPOCMEKLSA-N (1s,4r,5s,6r)-1,2,3,4,7,7-hexachlorobicyclo[2.2.1]hept-2-ene-5,6-dicarboxylic acid Chemical compound ClC1=C(Cl)[C@]2(Cl)[C@H](C(=O)O)[C@H](C(O)=O)[C@@]1(Cl)C2(Cl)Cl DJKGDNKYTKCJKD-BPOCMEKLSA-N 0.000 description 3
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 3
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 3
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical group CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 3
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 3
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 3
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- ODGCZQFTJDEYNI-UHFFFAOYSA-N 2-methylcyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1(C)C=CCCC1C(O)=O ODGCZQFTJDEYNI-UHFFFAOYSA-N 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- JSGVZVOGOQILFM-UHFFFAOYSA-N 3-methoxy-1-butanol Chemical compound COC(C)CCO JSGVZVOGOQILFM-UHFFFAOYSA-N 0.000 description 3
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 3
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 3
- 125000004062 acenaphthenyl group Chemical group C1(CC2=CC=CC3=CC=CC1=C23)* 0.000 description 3
- 229920006243 acrylic copolymer Polymers 0.000 description 3
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 3
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000002280 amphoteric surfactant Substances 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- TXVHTIQJNYSSKO-UHFFFAOYSA-N benzo[e]pyrene Chemical group C1=CC=C2C3=CC=CC=C3C3=CC=CC4=CC=C1C2=C34 TXVHTIQJNYSSKO-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 238000012661 block copolymerization Methods 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 125000005578 chrysene group Chemical group 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 3
- 230000002542 deteriorative effect Effects 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- PPSZHCXTGRHULJ-UHFFFAOYSA-N dioxazine Chemical compound O1ON=CC=C1 PPSZHCXTGRHULJ-UHFFFAOYSA-N 0.000 description 3
- 238000002296 dynamic light scattering Methods 0.000 description 3
- 230000032050 esterification Effects 0.000 description 3
- 125000003914 fluoranthenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC=C4C1=C23)* 0.000 description 3
- 235000011187 glycerol Nutrition 0.000 description 3
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 125000001041 indolyl group Chemical group 0.000 description 3
- 238000007641 inkjet printing Methods 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 150000002763 monocarboxylic acids Chemical class 0.000 description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 3
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000002736 nonionic surfactant Substances 0.000 description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 238000010943 off-gassing Methods 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 239000012860 organic pigment Substances 0.000 description 3
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 235000021317 phosphate Nutrition 0.000 description 3
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 125000005581 pyrene group Chemical group 0.000 description 3
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical group C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000000565 sulfonamide group Chemical group 0.000 description 3
- 125000000542 sulfonic acid group Chemical group 0.000 description 3
- 239000013076 target substance Substances 0.000 description 3
- 125000005579 tetracene group Chemical group 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 125000005580 triphenylene group Chemical group 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 2
- CSNIZNHTOVFARY-UHFFFAOYSA-N 1,2-benzothiazole Chemical group C1=CC=C2C=NSC2=C1 CSNIZNHTOVFARY-UHFFFAOYSA-N 0.000 description 2
- KTZQTRPPVKQPFO-UHFFFAOYSA-N 1,2-benzoxazole Chemical group C1=CC=C2C=NOC2=C1 KTZQTRPPVKQPFO-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical group C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 2
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical group C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- ONDSSKDTLGWNOJ-UHFFFAOYSA-N 1-methoxyhexan-2-ol Chemical compound CCCCC(O)COC ONDSSKDTLGWNOJ-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- PMUPSYZVABJEKC-UHFFFAOYSA-N 1-methylcyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1(C)CCCCC1C(O)=O PMUPSYZVABJEKC-UHFFFAOYSA-N 0.000 description 2
- CTMHWPIWNRWQEG-UHFFFAOYSA-N 1-methylcyclohexene Chemical compound CC1=CCCCC1 CTMHWPIWNRWQEG-UHFFFAOYSA-N 0.000 description 2
- AOPDRZXCEAKHHW-UHFFFAOYSA-N 1-pentoxypentane Chemical compound CCCCCOCCCCC AOPDRZXCEAKHHW-UHFFFAOYSA-N 0.000 description 2
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 2
- AVRPFRMDMNDIDH-UHFFFAOYSA-N 1h-quinazolin-2-one Chemical group C1=CC=CC2=NC(O)=NC=C21 AVRPFRMDMNDIDH-UHFFFAOYSA-N 0.000 description 2
- HXVNBWAKAOHACI-UHFFFAOYSA-N 2,4-dimethyl-3-pentanone Chemical compound CC(C)C(=O)C(C)C HXVNBWAKAOHACI-UHFFFAOYSA-N 0.000 description 2
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- RFMXKZGZSGFZES-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;2-sulfanylacetic acid Chemical compound OC(=O)CS.OC(=O)CS.OC(=O)CS.CCC(CO)(CO)CO RFMXKZGZSGFZES-UHFFFAOYSA-N 0.000 description 2
- AKVUWTYSNLGBJY-UHFFFAOYSA-N 2-methyl-1-morpholin-4-ylprop-2-en-1-one Chemical compound CC(=C)C(=O)N1CCOCC1 AKVUWTYSNLGBJY-UHFFFAOYSA-N 0.000 description 2
- ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 2-octanone Chemical compound CCCCCCC(C)=O ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 2
- MPAGVACEWQNVQO-UHFFFAOYSA-N 3-acetyloxybutyl acetate Chemical compound CC(=O)OC(C)CCOC(C)=O MPAGVACEWQNVQO-UHFFFAOYSA-N 0.000 description 2
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 2
- IRQWEODKXLDORP-UHFFFAOYSA-N 4-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=C(C=C)C=C1 IRQWEODKXLDORP-UHFFFAOYSA-N 0.000 description 2
- STOOUUMSJPLRNI-UHFFFAOYSA-N 5-amino-4-hydroxy-3-[[4-[4-[(4-hydroxyphenyl)diazenyl]phenyl]phenyl]diazenyl]-6-[(4-nitrophenyl)diazenyl]naphthalene-2,7-disulfonic acid Chemical compound OS(=O)(=O)C1=CC2=CC(S(O)(=O)=O)=C(N=NC=3C=CC(=CC=3)C=3C=CC(=CC=3)N=NC=3C=CC(O)=CC=3)C(O)=C2C(N)=C1N=NC1=CC=C([N+]([O-])=O)C=C1 STOOUUMSJPLRNI-UHFFFAOYSA-N 0.000 description 2
- FFWSICBKRCICMR-UHFFFAOYSA-N 5-methyl-2-hexanone Chemical compound CC(C)CCC(C)=O FFWSICBKRCICMR-UHFFFAOYSA-N 0.000 description 2
- OZJPLYNZGCXSJM-UHFFFAOYSA-N 5-valerolactone Chemical compound O=C1CCCCO1 OZJPLYNZGCXSJM-UHFFFAOYSA-N 0.000 description 2
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- YKXVZTWMMZZVRA-UHFFFAOYSA-N CC1(C=CC=C1)[Ti]C1(C=CC=C1)C Chemical compound CC1(C=CC=C1)[Ti]C1(C=CC=C1)C YKXVZTWMMZZVRA-UHFFFAOYSA-N 0.000 description 2
- DRSHXJFUUPIBHX-UHFFFAOYSA-N COc1ccc(cc1)N1N=CC2C=NC(Nc3cc(OC)c(OC)c(OCCCN4CCN(C)CC4)c3)=NC12 Chemical compound COc1ccc(cc1)N1N=CC2C=NC(Nc3cc(OC)c(OC)c(OCCCN4CCN(C)CC4)c3)=NC12 DRSHXJFUUPIBHX-UHFFFAOYSA-N 0.000 description 2
- 239000004641 Diallyl-phthalate Substances 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- OHJIOAVILUZUIT-UHFFFAOYSA-N O-(1-hydroxybutyl) propanethioate Chemical compound CCCC(O)OC(=S)CC OHJIOAVILUZUIT-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- IPTNXMGXEGQYSY-UHFFFAOYSA-N acetic acid;1-methoxybutan-1-ol Chemical compound CC(O)=O.CCCC(O)OC IPTNXMGXEGQYSY-UHFFFAOYSA-N 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 2
- 239000001000 anthraquinone dye Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000000987 azo dye Substances 0.000 description 2
- 125000003828 azulenyl group Chemical group 0.000 description 2
- MYONAGGJKCJOBT-UHFFFAOYSA-N benzimidazol-2-one Chemical compound C1=CC=CC2=NC(=O)N=C21 MYONAGGJKCJOBT-UHFFFAOYSA-N 0.000 description 2
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 125000006267 biphenyl group Chemical group 0.000 description 2
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- 238000011088 calibration curve Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 238000007607 die coating method Methods 0.000 description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical group C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- NLFBCYMMUAKCPC-KQQUZDAGSA-N ethyl (e)-3-[3-amino-2-cyano-1-[(e)-3-ethoxy-3-oxoprop-1-enyl]sulfanyl-3-oxoprop-1-enyl]sulfanylprop-2-enoate Chemical compound CCOC(=O)\C=C\SC(=C(C#N)C(N)=O)S\C=C\C(=O)OCC NLFBCYMMUAKCPC-KQQUZDAGSA-N 0.000 description 2
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- ZTYYDUBWJTUMHW-UHFFFAOYSA-N furo[3,2-b]furan Chemical group O1C=CC2=C1C=CO2 ZTYYDUBWJTUMHW-UHFFFAOYSA-N 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 239000001056 green pigment Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000002883 imidazolyl group Chemical group 0.000 description 2
- UHOKSCJSTAHBSO-UHFFFAOYSA-N indanthrone blue Chemical compound C1=CC=C2C(=O)C3=CC=C4NC5=C6C(=O)C7=CC=CC=C7C(=O)C6=CC=C5NC4=C3C(=O)C2=C1 UHOKSCJSTAHBSO-UHFFFAOYSA-N 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- RGFNRWTWDWVHDD-UHFFFAOYSA-N isobutyl butyrate Chemical compound CCCC(=O)OCC(C)C RGFNRWTWDWVHDD-UHFFFAOYSA-N 0.000 description 2
- WDAXFOBOLVPGLV-UHFFFAOYSA-N isobutyric acid ethyl ester Natural products CCOC(=O)C(C)C WDAXFOBOLVPGLV-UHFFFAOYSA-N 0.000 description 2
- PXZQEOJJUGGUIB-UHFFFAOYSA-N isoindolin-1-one Chemical compound C1=CC=C2C(=O)NCC2=C1 PXZQEOJJUGGUIB-UHFFFAOYSA-N 0.000 description 2
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 2
- 229920002521 macromolecule Polymers 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 150000002688 maleic acid derivatives Chemical class 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 125000005641 methacryl group Chemical group 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical group C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 2
- 150000004866 oxadiazoles Chemical class 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 125000005327 perimidinyl group Chemical group N1C(=NC2=CC=CC3=CC=CC1=C23)* 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000001007 phthalocyanine dye Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920002492 poly(sulfone) Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 125000003373 pyrazinyl group Chemical group 0.000 description 2
- 125000003226 pyrazolyl group Chemical group 0.000 description 2
- 125000000714 pyrimidinyl group Chemical group 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- MHOZZUICEDXVGD-UHFFFAOYSA-N pyrrolo[2,3-d]imidazole Chemical group C1=NC2=CC=NC2=N1 MHOZZUICEDXVGD-UHFFFAOYSA-N 0.000 description 2
- RQGPLDBZHMVWCH-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole Chemical group C1=NC2=CC=NC2=C1 RQGPLDBZHMVWCH-UHFFFAOYSA-N 0.000 description 2
- GZTPJDLYPMPRDF-UHFFFAOYSA-N pyrrolo[3,2-c]pyrazole Chemical group N1=NC2=CC=NC2=C1 GZTPJDLYPMPRDF-UHFFFAOYSA-N 0.000 description 2
- 125000000168 pyrrolyl group Chemical group 0.000 description 2
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 2
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 2
- 239000001008 quinone-imine dye Substances 0.000 description 2
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 2
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 2
- 238000007670 refining Methods 0.000 description 2
- 229960001755 resorcinol Drugs 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 150000003458 sulfonic acid derivatives Chemical class 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- 125000001302 tertiary amino group Chemical group 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- ONCNIMLKGZSAJT-UHFFFAOYSA-N thieno[3,2-b]furan Chemical group S1C=CC2=C1C=CO2 ONCNIMLKGZSAJT-UHFFFAOYSA-N 0.000 description 2
- VJYJJHQEVLEOFL-UHFFFAOYSA-N thieno[3,2-b]thiophene Chemical group S1C=CC2=C1C=CS2 VJYJJHQEVLEOFL-UHFFFAOYSA-N 0.000 description 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 2
- URAYPUMNDPQOKB-UHFFFAOYSA-N triacetin Chemical compound CC(=O)OCC(OC(C)=O)COC(C)=O URAYPUMNDPQOKB-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 239000001052 yellow pigment Substances 0.000 description 2
- NIDNOXCRFUCAKQ-UMRXKNAASA-N (1s,2r,3s,4r)-bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound C1[C@H]2C=C[C@@H]1[C@H](C(=O)O)[C@@H]2C(O)=O NIDNOXCRFUCAKQ-UMRXKNAASA-N 0.000 description 1
- MAOBFOXLCJIFLV-UHFFFAOYSA-N (2-aminophenyl)-phenylmethanone Chemical compound NC1=CC=CC=C1C(=O)C1=CC=CC=C1 MAOBFOXLCJIFLV-UHFFFAOYSA-N 0.000 description 1
- WJTCHBVEUFDSIK-NWDGAFQWSA-N (2r,5s)-1-benzyl-2,5-dimethylpiperazine Chemical compound C[C@@H]1CN[C@@H](C)CN1CC1=CC=CC=C1 WJTCHBVEUFDSIK-NWDGAFQWSA-N 0.000 description 1
- RXCOGDYOZQGGMK-UHFFFAOYSA-N (3,4-diaminophenyl)-phenylmethanone Chemical class C1=C(N)C(N)=CC=C1C(=O)C1=CC=CC=C1 RXCOGDYOZQGGMK-UHFFFAOYSA-N 0.000 description 1
- RYNQKSJRFHJZTK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) acetate Chemical compound COC(C)(C)CCOC(C)=O RYNQKSJRFHJZTK-UHFFFAOYSA-N 0.000 description 1
- RBKHNGHPZZZJCI-UHFFFAOYSA-N (4-aminophenyl)-phenylmethanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=CC=C1 RBKHNGHPZZZJCI-UHFFFAOYSA-N 0.000 description 1
- JMMVHMOAIMOMOF-UHFFFAOYSA-N (4-prop-2-enoyloxyphenyl) prop-2-enoate Chemical compound C=CC(=O)OC1=CC=C(OC(=O)C=C)C=C1 JMMVHMOAIMOMOF-UHFFFAOYSA-N 0.000 description 1
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- AOOCIXQTDZTCKD-PLNGDYQASA-N (Z)-4-oxo-4-(3-prop-2-enoyloxypropoxy)but-2-enoic acid Chemical compound OC(=O)\C=C/C(=O)OCCCOC(=O)C=C AOOCIXQTDZTCKD-PLNGDYQASA-N 0.000 description 1
- ROZDMUUELHCVQC-ARJAWSKDSA-N (z)-4-oxo-4-(2-prop-2-enoyloxyethoxy)but-2-enoic acid Chemical compound OC(=O)\C=C/C(=O)OCCOC(=O)C=C ROZDMUUELHCVQC-ARJAWSKDSA-N 0.000 description 1
- VSWHQJRSDVAFHJ-WAYWQWQTSA-N (z)-4-oxo-4-(4-prop-2-enoyloxybutoxy)but-2-enoic acid Chemical compound OC(=O)\C=C/C(=O)OCCCCOC(=O)C=C VSWHQJRSDVAFHJ-WAYWQWQTSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- JWTGRKUQJXIWCV-UHFFFAOYSA-N 1,2,3-trihydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(O)C(O)CO JWTGRKUQJXIWCV-UHFFFAOYSA-N 0.000 description 1
- QMMJWQMCMRUYTG-UHFFFAOYSA-N 1,2,4,5-tetrachloro-3-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=C(Cl)C(Cl)=CC(Cl)=C1Cl QMMJWQMCMRUYTG-UHFFFAOYSA-N 0.000 description 1
- SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- CVZBYEKCIDMLRV-UHFFFAOYSA-N 1,4-bis(methylsulfanyl)benzene Chemical compound CSC1=CC=C(SC)C=C1 CVZBYEKCIDMLRV-UHFFFAOYSA-N 0.000 description 1
- LAVARTIQQDZFNT-UHFFFAOYSA-N 1-(1-methoxypropan-2-yloxy)propan-2-yl acetate Chemical compound COCC(C)OCC(C)OC(C)=O LAVARTIQQDZFNT-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- RQQLOWXQARLAAX-UHFFFAOYSA-N 1-(2-methyl-3-sulfanylpropanoyl)oxybutyl 2-methyl-3-sulfanylpropanoate Chemical compound SCC(C)C(=O)OC(CCC)OC(=O)C(C)CS RQQLOWXQARLAAX-UHFFFAOYSA-N 0.000 description 1
- RSZHBVPYGJXEGF-UHFFFAOYSA-N 1-(2-sulfanylacetyl)oxybutyl 2-sulfanylacetate Chemical compound SCC(=O)OC(CCC)OC(=O)CS RSZHBVPYGJXEGF-UHFFFAOYSA-N 0.000 description 1
- UYWJYQBUSUMZDF-UHFFFAOYSA-N 1-(3-sulfanylbutanoyloxy)butyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OC(CCC)OC(=O)CC(C)S UYWJYQBUSUMZDF-UHFFFAOYSA-N 0.000 description 1
- ASOKPJOREAFHNY-UHFFFAOYSA-N 1-Hydroxybenzotriazole Chemical compound C1=CC=C2N(O)N=NC2=C1 ASOKPJOREAFHNY-UHFFFAOYSA-N 0.000 description 1
- BOGFHOWTVGAYFK-UHFFFAOYSA-N 1-[2-(2-propoxyethoxy)ethoxy]propane Chemical compound CCCOCCOCCOCCC BOGFHOWTVGAYFK-UHFFFAOYSA-N 0.000 description 1
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- FUWDFGKRNIDKAE-UHFFFAOYSA-N 1-butoxypropan-2-yl acetate Chemical compound CCCCOCC(C)OC(C)=O FUWDFGKRNIDKAE-UHFFFAOYSA-N 0.000 description 1
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical compound CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 description 1
- SQCZQTSHSZLZIQ-UHFFFAOYSA-N 1-chloropentane Chemical compound CCCCCCl SQCZQTSHSZLZIQ-UHFFFAOYSA-N 0.000 description 1
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- RQUBQBFVDOLUKC-UHFFFAOYSA-N 1-ethoxy-2-methylpropane Chemical compound CCOCC(C)C RQUBQBFVDOLUKC-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 1
- BPIUIOXAFBGMNB-UHFFFAOYSA-N 1-hexoxyhexane Chemical compound CCCCCCOCCCCCC BPIUIOXAFBGMNB-UHFFFAOYSA-N 0.000 description 1
- LRMMVQKUKLVVFR-UHFFFAOYSA-N 1-methoxyhexan-3-one Chemical compound CCCC(=O)CCOC LRMMVQKUKLVVFR-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 1
- GQCZPFJGIXHZMB-UHFFFAOYSA-N 1-tert-Butoxy-2-propanol Chemical compound CC(O)COC(C)(C)C GQCZPFJGIXHZMB-UHFFFAOYSA-N 0.000 description 1
- OWPUOLBODXJOKH-UHFFFAOYSA-N 2,3-dihydroxypropyl prop-2-enoate Chemical compound OCC(O)COC(=O)C=C OWPUOLBODXJOKH-UHFFFAOYSA-N 0.000 description 1
- FXNDIJDIPNCZQJ-UHFFFAOYSA-N 2,4,4-trimethylpent-1-ene Chemical group CC(=C)CC(C)(C)C FXNDIJDIPNCZQJ-UHFFFAOYSA-N 0.000 description 1
- 125000004215 2,4-difluorophenyl group Chemical group [H]C1=C([H])C(*)=C(F)C([H])=C1F 0.000 description 1
- RXAYEPUDXSKVHS-UHFFFAOYSA-N 2-(2-chlorophenyl)-4,5-bis(3-methoxyphenyl)-1h-imidazole Chemical class COC1=CC=CC(C2=C(NC(=N2)C=2C(=CC=CC=2)Cl)C=2C=C(OC)C=CC=2)=C1 RXAYEPUDXSKVHS-UHFFFAOYSA-N 0.000 description 1
- NSWNXQGJAPQOID-UHFFFAOYSA-N 2-(2-chlorophenyl)-4,5-diphenyl-1h-imidazole Chemical class ClC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 NSWNXQGJAPQOID-UHFFFAOYSA-N 0.000 description 1
- UIHRWPYOTGCOJP-UHFFFAOYSA-N 2-(2-fluorophenyl)-4,5-diphenyl-1h-imidazole Chemical class FC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 UIHRWPYOTGCOJP-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- XIOGJAPOAUEYJO-UHFFFAOYSA-N 2-(2-methoxyphenyl)-4,5-diphenyl-1h-imidazole Chemical class COC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 XIOGJAPOAUEYJO-UHFFFAOYSA-N 0.000 description 1
- DRLRGHZJOQGQEC-UHFFFAOYSA-N 2-(2-methoxypropoxy)propyl acetate Chemical compound COC(C)COC(C)COC(C)=O DRLRGHZJOQGQEC-UHFFFAOYSA-N 0.000 description 1
- JUKSUBINMNCBNL-UHFFFAOYSA-N 2-(2-methyl-3-sulfanylpropanoyl)oxyethyl 2-methyl-3-sulfanylpropanoate Chemical compound SCC(C)C(=O)OCCOC(=O)C(C)CS JUKSUBINMNCBNL-UHFFFAOYSA-N 0.000 description 1
- RKYJPYDJNQXILT-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxycarbonyl)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OCCOC(=O)C=C RKYJPYDJNQXILT-UHFFFAOYSA-N 0.000 description 1
- UECGJSXCVLTIMQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxycarbonyl)cyclohexane-1-carboxylic acid Chemical compound OC(=O)C1CCCCC1C(=O)OCCOC(=O)C=C UECGJSXCVLTIMQ-UHFFFAOYSA-N 0.000 description 1
- PSYGHMBJXWRQFD-UHFFFAOYSA-N 2-(2-sulfanylacetyl)oxyethyl 2-sulfanylacetate Chemical compound SCC(=O)OCCOC(=O)CS PSYGHMBJXWRQFD-UHFFFAOYSA-N 0.000 description 1
- UHOPWFKONJYLCF-UHFFFAOYSA-N 2-(2-sulfanylethyl)isoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(CCS)C(=O)C2=C1 UHOPWFKONJYLCF-UHFFFAOYSA-N 0.000 description 1
- BXPKASQEUYICBF-UHFFFAOYSA-N 2-(3-prop-2-enoyloxypropoxycarbonyl)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OCCCOC(=O)C=C BXPKASQEUYICBF-UHFFFAOYSA-N 0.000 description 1
- HHGMODSKOYEYJL-UHFFFAOYSA-N 2-(3-prop-2-enoyloxypropoxycarbonyl)cyclohex-3-ene-1-carboxylic acid Chemical compound OC(=O)C1CCC=CC1C(=O)OCCCOC(=O)C=C HHGMODSKOYEYJL-UHFFFAOYSA-N 0.000 description 1
- TXJZAWRTHMZECY-UHFFFAOYSA-N 2-(3-sulfanylbutanoyloxy)ethyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCCOC(=O)CC(C)S TXJZAWRTHMZECY-UHFFFAOYSA-N 0.000 description 1
- SMLORZJGJAWILX-UHFFFAOYSA-N 2-(4,6-dimethylpyridin-2-yl)-4,6-dimethylpyridine Chemical compound CC1=CC(C)=NC(C=2N=C(C)C=C(C)C=2)=C1 SMLORZJGJAWILX-UHFFFAOYSA-N 0.000 description 1
- NLNVSTLNDJGLTL-UHFFFAOYSA-N 2-(4-ethoxynaphthalen-1-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C12=CC=CC=C2C(OCC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 NLNVSTLNDJGLTL-UHFFFAOYSA-N 0.000 description 1
- FVNIIPIYHHEXQA-UHFFFAOYSA-N 2-(4-methoxynaphthalen-1-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C12=CC=CC=C2C(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 FVNIIPIYHHEXQA-UHFFFAOYSA-N 0.000 description 1
- SNFCQJAJPFWBDJ-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,5-diphenyl-1h-imidazole Chemical class C1=CC(OC)=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 SNFCQJAJPFWBDJ-UHFFFAOYSA-N 0.000 description 1
- QRHHZFRCJDAUNA-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 QRHHZFRCJDAUNA-UHFFFAOYSA-N 0.000 description 1
- ITPZSEHIQWKKAE-UHFFFAOYSA-N 2-(4-prop-2-enoyloxybutoxycarbonyl)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OCCCCOC(=O)C=C ITPZSEHIQWKKAE-UHFFFAOYSA-N 0.000 description 1
- PUBNJSZGANKUGX-UHFFFAOYSA-N 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=C(C)C=C1 PUBNJSZGANKUGX-UHFFFAOYSA-N 0.000 description 1
- KJSGODDTWRXQRH-UHFFFAOYSA-N 2-(dimethylamino)ethyl benzoate Chemical compound CN(C)CCOC(=O)C1=CC=CC=C1 KJSGODDTWRXQRH-UHFFFAOYSA-N 0.000 description 1
- DOAUOEKXSLFJCQ-UHFFFAOYSA-N 2-(furan-2-yl)-5-(trichloromethyl)-1,3,4-oxadiazole Chemical compound O1C(C(Cl)(Cl)Cl)=NN=C1C1=CC=CO1 DOAUOEKXSLFJCQ-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- FWLHAQYOFMQTHQ-UHFFFAOYSA-N 2-N-[8-[[8-(4-aminoanilino)-10-phenylphenazin-10-ium-2-yl]amino]-10-phenylphenazin-10-ium-2-yl]-8-N,10-diphenylphenazin-10-ium-2,8-diamine hydroxy-oxido-dioxochromium Chemical compound O[Cr]([O-])(=O)=O.O[Cr]([O-])(=O)=O.O[Cr]([O-])(=O)=O.Nc1ccc(Nc2ccc3nc4ccc(Nc5ccc6nc7ccc(Nc8ccc9nc%10ccc(Nc%11ccccc%11)cc%10[n+](-c%10ccccc%10)c9c8)cc7[n+](-c7ccccc7)c6c5)cc4[n+](-c4ccccc4)c3c2)cc1 FWLHAQYOFMQTHQ-UHFFFAOYSA-N 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- ZADXFVHUPXKZBJ-UHFFFAOYSA-N 2-[(4-ethenylphenyl)methoxymethyl]oxirane Chemical compound C1=CC(C=C)=CC=C1COCC1OC1 ZADXFVHUPXKZBJ-UHFFFAOYSA-N 0.000 description 1
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- SDHQGBWMLCBNSM-UHFFFAOYSA-N 2-[2-(2-methoxyethoxy)ethoxy]ethyl acetate Chemical compound COCCOCCOCCOC(C)=O SDHQGBWMLCBNSM-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- MPIGKGDPQRWZLU-UHFFFAOYSA-N 2-[4-[(2,6-dichloro-4-nitrophenyl)diazenyl]-n-methylanilino]ethanol Chemical compound C1=CC(N(CCO)C)=CC=C1N=NC1=C(Cl)C=C([N+]([O-])=O)C=C1Cl MPIGKGDPQRWZLU-UHFFFAOYSA-N 0.000 description 1
- CZNYJWQJSGRKRA-UHFFFAOYSA-N 2-[5-(4-chlorophenyl)-1,3,4-oxadiazol-2-yl]aniline Chemical compound NC1=CC=CC=C1C1=NN=C(C=2C=CC(Cl)=CC=2)O1 CZNYJWQJSGRKRA-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- MHOFGBJTSNWTDT-UHFFFAOYSA-M 2-[n-ethyl-4-[(6-methoxy-3-methyl-1,3-benzothiazol-3-ium-2-yl)diazenyl]anilino]ethanol;methyl sulfate Chemical compound COS([O-])(=O)=O.C1=CC(N(CCO)CC)=CC=C1N=NC1=[N+](C)C2=CC=C(OC)C=C2S1 MHOFGBJTSNWTDT-UHFFFAOYSA-M 0.000 description 1
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- SZTBMYHIYNGYIA-UHFFFAOYSA-N 2-chloroacrylic acid Chemical compound OC(=O)C(Cl)=C SZTBMYHIYNGYIA-UHFFFAOYSA-N 0.000 description 1
- IYGAVZICZNAMTF-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;2-methyl-3-sulfanylpropanoic acid Chemical compound SCC(C)C(O)=O.SCC(C)C(O)=O.SCC(C)C(O)=O.CCC(CO)(CO)CO IYGAVZICZNAMTF-UHFFFAOYSA-N 0.000 description 1
- WBEKRAXYEBAHQF-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;3-sulfanylbutanoic acid Chemical compound CC(S)CC(O)=O.CC(S)CC(O)=O.CC(S)CC(O)=O.CCC(CO)(CO)CO WBEKRAXYEBAHQF-UHFFFAOYSA-N 0.000 description 1
- HXDLWJWIAHWIKI-UHFFFAOYSA-N 2-hydroxyethyl acetate Chemical compound CC(=O)OCCO HXDLWJWIAHWIKI-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- DCBJXJOKADGNAA-UHFFFAOYSA-N 2-methyl-1-[6-(2-methyl-2-morpholin-4-ylpropanoyl)-9-octylcarbazol-3-yl]-2-morpholin-4-ylpropan-1-one Chemical compound C=1C=C2N(CCCCCCCC)C3=CC=C(C(=O)C(C)(C)N4CCOCC4)C=C3C2=CC=1C(=O)C(C)(C)N1CCOCC1 DCBJXJOKADGNAA-UHFFFAOYSA-N 0.000 description 1
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 1
- LLCYXFYLGPOKQO-UHFFFAOYSA-N 2-methyl-6-pyridin-2-ylpyridine Chemical compound CC1=CC=CC(C=2N=CC=CC=2)=N1 LLCYXFYLGPOKQO-UHFFFAOYSA-N 0.000 description 1
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- VHMICKWLTGFITH-UHFFFAOYSA-N 2H-isoindole Chemical compound C1=CC=CC2=CNC=C21 VHMICKWLTGFITH-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- LDBOYMRNYCBDQK-UHFFFAOYSA-N 3-(ethenoxymethyl)-3-ethyloxetane Chemical compound C=COCC1(CC)COC1 LDBOYMRNYCBDQK-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- NTKBNCABAMQDIG-UHFFFAOYSA-N 3-butoxypropan-1-ol Chemical compound CCCCOCCCO NTKBNCABAMQDIG-UHFFFAOYSA-N 0.000 description 1
- JRXXEXVXTFEBIY-UHFFFAOYSA-N 3-ethoxypropanoic acid Chemical compound CCOCCC(O)=O JRXXEXVXTFEBIY-UHFFFAOYSA-N 0.000 description 1
- HTNUUDFQRYBJPH-UHFFFAOYSA-N 3-methoxypropanehydrazide Chemical compound COCCC(=O)NN HTNUUDFQRYBJPH-UHFFFAOYSA-N 0.000 description 1
- YSIKHBWUBSFBRZ-UHFFFAOYSA-N 3-methoxypropanoic acid Chemical group COCCC(O)=O YSIKHBWUBSFBRZ-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- RHLVCLIPMVJYKS-UHFFFAOYSA-N 3-octanone Chemical compound CCCCCC(=O)CC RHLVCLIPMVJYKS-UHFFFAOYSA-N 0.000 description 1
- VATRWWPJWVCZTA-UHFFFAOYSA-N 3-oxo-n-[2-(trifluoromethyl)phenyl]butanamide Chemical compound CC(=O)CC(=O)NC1=CC=CC=C1C(F)(F)F VATRWWPJWVCZTA-UHFFFAOYSA-N 0.000 description 1
- RQPNXPWEGVCPCX-UHFFFAOYSA-N 3-sulfanylbutanoic acid Chemical compound CC(S)CC(O)=O RQPNXPWEGVCPCX-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- MWVTWFVJZLCBMC-UHFFFAOYSA-N 4,4'-bipyridine Chemical compound C1=NC=CC(C=2C=CN=CC=2)=C1 MWVTWFVJZLCBMC-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- ADRCREMWPUFGDU-UHFFFAOYSA-N 4-(1,3-benzothiazol-2-yl)-n,n-diethylaniline Chemical compound C1=CC(N(CC)CC)=CC=C1C1=NC2=CC=CC=C2S1 ADRCREMWPUFGDU-UHFFFAOYSA-N 0.000 description 1
- HYKGLCSXVAAXNC-UHFFFAOYSA-N 4-(1,3-benzothiazol-2-yl)-n,n-dimethylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=NC2=CC=CC=C2S1 HYKGLCSXVAAXNC-UHFFFAOYSA-N 0.000 description 1
- MYHNMZPERVYEKS-UHFFFAOYSA-N 4-(1,3-benzoxazol-2-yl)-n,n-diethylaniline Chemical compound C1=CC(N(CC)CC)=CC=C1C1=NC2=CC=CC=C2O1 MYHNMZPERVYEKS-UHFFFAOYSA-N 0.000 description 1
- NLWWHMRHFRTAII-UHFFFAOYSA-N 4-(1,3-benzoxazol-2-yl)-n,n-dimethylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=NC2=CC=CC=C2O1 NLWWHMRHFRTAII-UHFFFAOYSA-N 0.000 description 1
- KOECQEGGMWDHEV-UHFFFAOYSA-N 4-(1h-benzimidazol-2-yl)-n,n-diethylaniline Chemical compound C1=CC(N(CC)CC)=CC=C1C1=NC2=CC=CC=C2N1 KOECQEGGMWDHEV-UHFFFAOYSA-N 0.000 description 1
- ZKBBGUJBGLTNEK-UHFFFAOYSA-N 4-(1h-benzimidazol-2-yl)-n,n-dimethylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=NC2=CC=CC=C2N1 ZKBBGUJBGLTNEK-UHFFFAOYSA-N 0.000 description 1
- FWTBRYBHCBCJEQ-UHFFFAOYSA-N 4-[(4-phenyldiazenylnaphthalen-1-yl)diazenyl]phenol Chemical compound C1=CC(O)=CC=C1N=NC(C1=CC=CC=C11)=CC=C1N=NC1=CC=CC=C1 FWTBRYBHCBCJEQ-UHFFFAOYSA-N 0.000 description 1
- LGKCTTQKRNEUAL-UHFFFAOYSA-N 4-[5-[4-(diethylamino)phenyl]-1,3,4-thiadiazol-2-yl]-n,n-diethylaniline Chemical compound C1=CC(N(CC)CC)=CC=C1C1=NN=C(C=2C=CC(=CC=2)N(CC)CC)S1 LGKCTTQKRNEUAL-UHFFFAOYSA-N 0.000 description 1
- BBFRYSKTTHYWQZ-UHFFFAOYSA-N 4-anilino-3-nitro-n-phenylbenzenesulfonamide Chemical compound [O-][N+](=O)C1=CC(S(=O)(=O)NC=2C=CC=CC=2)=CC=C1NC1=CC=CC=C1 BBFRYSKTTHYWQZ-UHFFFAOYSA-N 0.000 description 1
- VIERZIUSJOSEGK-UHFFFAOYSA-N 4-cyclopenta[c][1,2]benzoxazin-2-yl-n,n-dimethylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=CC2=NOC3=CC=CC=C3C2=C1 VIERZIUSJOSEGK-UHFFFAOYSA-N 0.000 description 1
- RODDOGQBSBJOCQ-UHFFFAOYSA-N 4-cyclopenta[c][2,1]benzoxazin-2-yl-n,n-dimethylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=CC2=C3C=CC=CC3=NOC2=C1 RODDOGQBSBJOCQ-UHFFFAOYSA-N 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
- NBPGPQJFYXNFKN-UHFFFAOYSA-N 4-methyl-2-(4-methylpyridin-2-yl)pyridine Chemical compound CC1=CC=NC(C=2N=CC=C(C)C=2)=C1 NBPGPQJFYXNFKN-UHFFFAOYSA-N 0.000 description 1
- UTMDJGPRCLQPBT-UHFFFAOYSA-N 4-nitro-1h-1,2,3-benzotriazole Chemical compound [O-][N+](=O)C1=CC=CC2=NNN=C12 UTMDJGPRCLQPBT-UHFFFAOYSA-N 0.000 description 1
- ASUUJFUXBYWYBG-UHFFFAOYSA-N 4-oxo-4-(3-prop-2-enoyloxypropoxy)butanoic acid Chemical compound OC(=O)CCC(=O)OCCCOC(=O)C=C ASUUJFUXBYWYBG-UHFFFAOYSA-N 0.000 description 1
- AFORHNGXSLLDOR-UHFFFAOYSA-N 4-oxo-4-(4-prop-2-enoyloxybutoxy)butanoic acid Chemical compound OC(=O)CCC(=O)OCCCCOC(=O)C=C AFORHNGXSLLDOR-UHFFFAOYSA-N 0.000 description 1
- JAGRUUPXPPLSRX-UHFFFAOYSA-N 4-prop-1-en-2-ylphenol Chemical compound CC(=C)C1=CC=C(O)C=C1 JAGRUUPXPPLSRX-UHFFFAOYSA-N 0.000 description 1
- CDSULTPOCMWJCM-UHFFFAOYSA-N 4h-chromene-2,3-dione Chemical class C1=CC=C2OC(=O)C(=O)CC2=C1 CDSULTPOCMWJCM-UHFFFAOYSA-N 0.000 description 1
- AVERNFJXXRIVQN-XSDYUOFFSA-N 5-[(4-ethoxyphenyl)diazenyl]-2-[(e)-2-[4-[(4-ethoxyphenyl)diazenyl]-2-sulfophenyl]ethenyl]benzenesulfonic acid Chemical compound C1=CC(OCC)=CC=C1N=NC(C=C1S(O)(=O)=O)=CC=C1\C=C\C1=CC=C(N=NC=2C=CC(OCC)=CC=2)C=C1S(O)(=O)=O AVERNFJXXRIVQN-XSDYUOFFSA-N 0.000 description 1
- JPQXNTOALKRJMH-UHFFFAOYSA-N 5-methoxypentyl acetate Chemical compound COCCCCCOC(C)=O JPQXNTOALKRJMH-UHFFFAOYSA-N 0.000 description 1
- RWXZXCZBMQPOBF-UHFFFAOYSA-N 5-methyl-1H-benzimidazole Chemical compound CC1=CC=C2N=CNC2=C1 RWXZXCZBMQPOBF-UHFFFAOYSA-N 0.000 description 1
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 1
- AOCDQWRMYHJTMY-UHFFFAOYSA-N 5-nitro-2h-benzotriazole Chemical class C1=C([N+](=O)[O-])C=CC2=NNN=C21 AOCDQWRMYHJTMY-UHFFFAOYSA-N 0.000 description 1
- NBPBVGLCOMPJOJ-UHFFFAOYSA-N 6-oxo-6-(3-prop-2-enoyloxypropoxy)hexanoic acid Chemical compound C(CCCCC(=O)O)(=O)OCCCOC(C=C)=O NBPBVGLCOMPJOJ-UHFFFAOYSA-N 0.000 description 1
- PVSXAPBKKYQOTF-UHFFFAOYSA-N 6-oxo-6-(4-prop-2-enoyloxybutoxy)hexanoic acid Chemical compound C(CCCCC(=O)O)(=O)OCCCCOC(C=C)=O PVSXAPBKKYQOTF-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- JAJIPIAHCFBEPI-UHFFFAOYSA-N 9,10-dioxoanthracene-1-sulfonic acid Chemical class O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2S(=O)(=O)O JAJIPIAHCFBEPI-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- CQPFMGBJSMSXLP-ZAGWXBKKSA-M Acid orange 7 Chemical compound OC1=C(C2=CC=CC=C2C=C1)/N=N/C1=CC=C(C=C1)S(=O)(=O)[O-].[Na+] CQPFMGBJSMSXLP-ZAGWXBKKSA-M 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- NOEMSRWQFGPZQS-UHFFFAOYSA-N CCC(O)=S.CCC(O)=S.CCC(O)=S.CCC(CO)(CO)CO Chemical compound CCC(O)=S.CCC(O)=S.CCC(O)=S.CCC(CO)(CO)CO NOEMSRWQFGPZQS-UHFFFAOYSA-N 0.000 description 1
- KKBFCPLWFWQNFB-UHFFFAOYSA-M CI Acid Orange 3 Chemical compound [Na+].[O-][N+](=O)C1=CC([N+](=O)[O-])=CC=C1NC(C=C1S([O-])(=O)=O)=CC=C1NC1=CC=CC=C1 KKBFCPLWFWQNFB-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- 229910020366 ClO 4 Inorganic materials 0.000 description 1
- 229940126062 Compound A Drugs 0.000 description 1
- IQFVPQOLBLOTPF-UHFFFAOYSA-L Congo Red Chemical compound [Na+].[Na+].C1=CC=CC2=C(N)C(N=NC3=CC=C(C=C3)C3=CC=C(C=C3)N=NC3=C(C4=CC=CC=C4C(=C3)S([O-])(=O)=O)N)=CC(S([O-])(=O)=O)=C21 IQFVPQOLBLOTPF-UHFFFAOYSA-L 0.000 description 1
- 241000557626 Corvus corax Species 0.000 description 1
- 244000168525 Croton tiglium Species 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- YYLLIJHXUHJATK-UHFFFAOYSA-N Cyclohexyl acetate Chemical compound CC(=O)OC1CCCCC1 YYLLIJHXUHJATK-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 239000006001 Methyl nonyl ketone Substances 0.000 description 1
- 229910016006 MoSi Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 241000517773 Myotis sodalis Species 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- DIQMPQMYFZXDAX-UHFFFAOYSA-N Pentyl formate Chemical compound CCCCCOC=O DIQMPQMYFZXDAX-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- YZCKVEUIGOORGS-IGMARMGPSA-N Protium Chemical compound [1H] YZCKVEUIGOORGS-IGMARMGPSA-N 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- OVSNDJXCFPSPDZ-UHFFFAOYSA-N Reactive red 120 Chemical compound OS(=O)(=O)C1=CC2=CC(S(O)(=O)=O)=CC(NC=3N=C(NC=4C=CC(NC=5N=C(NC=6C7=C(O)C(N=NC=8C(=CC=CC=8)S(O)(=O)=O)=C(C=C7C=C(C=6)S(O)(=O)=O)S(O)(=O)=O)N=C(Cl)N=5)=CC=4)N=C(Cl)N=3)=C2C(O)=C1N=NC1=CC=CC=C1S(O)(=O)=O OVSNDJXCFPSPDZ-UHFFFAOYSA-N 0.000 description 1
- 241000872198 Serjania polyphylla Species 0.000 description 1
- 239000004283 Sodium sorbate Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- FHNINJWBTRXEBC-UHFFFAOYSA-N Sudan III Chemical compound OC1=CC=C2C=CC=CC2=C1N=NC(C=C1)=CC=C1N=NC1=CC=CC=C1 FHNINJWBTRXEBC-UHFFFAOYSA-N 0.000 description 1
- DPOPAJRDYZGTIR-UHFFFAOYSA-N Tetrazine Chemical compound C1=CN=NN=N1 DPOPAJRDYZGTIR-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- KMPQYAYAQWNLME-UHFFFAOYSA-N Undecanal Natural products CCCCCCCCCCC=O KMPQYAYAQWNLME-UHFFFAOYSA-N 0.000 description 1
- 235000005811 Viola adunca Nutrition 0.000 description 1
- 240000009038 Viola odorata Species 0.000 description 1
- 235000013487 Viola odorata Nutrition 0.000 description 1
- 235000002254 Viola papilionacea Nutrition 0.000 description 1
- CQHKDHVZYZUZMJ-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-prop-2-enoyloxypropyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CO)COC(=O)C=C CQHKDHVZYZUZMJ-UHFFFAOYSA-N 0.000 description 1
- YTFVEVTTXDZJHN-UHFFFAOYSA-N [2-(hydroxymethyl)-3-(3-sulfanylbutanoyloxy)-2-(3-sulfanylbutanoyloxymethyl)propyl] 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCC(CO)(COC(=O)CC(C)S)COC(=O)CC(C)S YTFVEVTTXDZJHN-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- HSZUHSXXAOWGQY-UHFFFAOYSA-N [2-methyl-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(C)(COC(=O)C=C)COC(=O)C=C HSZUHSXXAOWGQY-UHFFFAOYSA-N 0.000 description 1
- RUDUCNPHDIMQCY-UHFFFAOYSA-N [3-(2-sulfanylacetyl)oxy-2,2-bis[(2-sulfanylacetyl)oxymethyl]propyl] 2-sulfanylacetate Chemical compound SCC(=O)OCC(COC(=O)CS)(COC(=O)CS)COC(=O)CS RUDUCNPHDIMQCY-UHFFFAOYSA-N 0.000 description 1
- VTLHIRNKQSFSJS-UHFFFAOYSA-N [3-(3-sulfanylbutanoyloxy)-2,2-bis(3-sulfanylbutanoyloxymethyl)propyl] 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCC(COC(=O)CC(C)S)(COC(=O)CC(C)S)COC(=O)CC(C)S VTLHIRNKQSFSJS-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- MDMKOESKPAVFJF-UHFFFAOYSA-N [4-(2-methylprop-2-enoyloxy)phenyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(OC(=O)C(C)=C)C=C1 MDMKOESKPAVFJF-UHFFFAOYSA-N 0.000 description 1
- IURGIPVDZKDLIX-UHFFFAOYSA-M [7-(diethylamino)phenoxazin-3-ylidene]-diethylazanium;chloride Chemical compound [Cl-].C1=CC(=[N+](CC)CC)C=C2OC3=CC(N(CC)CC)=CC=C3N=C21 IURGIPVDZKDLIX-UHFFFAOYSA-M 0.000 description 1
- NOKSMMGULAYSTD-UHFFFAOYSA-N [SiH4].N=C=O Chemical class [SiH4].N=C=O NOKSMMGULAYSTD-UHFFFAOYSA-N 0.000 description 1
- 125000004054 acenaphthylenyl group Chemical group C1(=CC2=CC=CC3=CC=CC1=C23)* 0.000 description 1
- HXGDTGSAIMULJN-UHFFFAOYSA-N acetnaphthylene Natural products C1=CC(C=C2)=C3C2=CC=CC3=C1 HXGDTGSAIMULJN-UHFFFAOYSA-N 0.000 description 1
- 239000006230 acetylene black Substances 0.000 description 1
- XREZMAAQVYVESP-UHFFFAOYSA-N acetyloxymethyl 2-[n-[2-(acetyloxymethoxy)-2-oxoethyl]-2-[2-[2-[bis[2-(acetyloxymethoxy)-2-oxoethyl]amino]-4-fluorophenoxy]ethoxy]-5-fluoroanilino]acetate Chemical compound CC(=O)OCOC(=O)CN(CC(=O)OCOC(C)=O)C1=CC(F)=CC=C1OCCOC1=CC=C(F)C=C1N(CC(=O)OCOC(C)=O)CC(=O)OCOC(C)=O XREZMAAQVYVESP-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 125000003670 adamantan-2-yl group Chemical group [H]C1([H])C(C2([H])[H])([H])C([H])([H])C3([H])C([*])([H])C1([H])C([H])([H])C2([H])C3([H])[H] 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- VEZXCJBBBCKRPI-UHFFFAOYSA-N beta-propiolactone Chemical compound O=C1CCO1 VEZXCJBBBCKRPI-UHFFFAOYSA-N 0.000 description 1
- TUQQUUXMCKXGDI-UHFFFAOYSA-N bis(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C=CC=2)=C1 TUQQUUXMCKXGDI-UHFFFAOYSA-N 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- PIPBVABVQJZSAB-UHFFFAOYSA-N bis(ethenyl) benzene-1,2-dicarboxylate Chemical compound C=COC(=O)C1=CC=CC=C1C(=O)OC=C PIPBVABVQJZSAB-UHFFFAOYSA-N 0.000 description 1
- QDVNNDYBCWZVTI-UHFFFAOYSA-N bis[4-(ethylamino)phenyl]methanone Chemical compound C1=CC(NCC)=CC=C1C(=O)C1=CC=C(NCC)C=C1 QDVNNDYBCWZVTI-UHFFFAOYSA-N 0.000 description 1
- HXTBYXIZCDULQI-UHFFFAOYSA-N bis[4-(methylamino)phenyl]methanone Chemical compound C1=CC(NC)=CC=C1C(=O)C1=CC=C(NC)C=C1 HXTBYXIZCDULQI-UHFFFAOYSA-N 0.000 description 1
- 210000000988 bone and bone Anatomy 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 229940043232 butyl acetate Drugs 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- WVIIMZNLDWSIRH-UHFFFAOYSA-N cyclohexylcyclohexane Chemical group C1CCCCC1C1CCCCC1 WVIIMZNLDWSIRH-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000004186 cyclopropylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C1([H])[H] 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- WXZKPELXXQHDNS-UHFFFAOYSA-N decane-1,1-dithiol Chemical compound CCCCCCCCCC(S)S WXZKPELXXQHDNS-UHFFFAOYSA-N 0.000 description 1
- 125000003493 decenyl group Chemical group [H]C([*])=C([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- 238000004147 desorption mass spectrometry Methods 0.000 description 1
- 125000004985 dialkyl amino alkyl group Chemical group 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- 235000019797 dipotassium phosphate Nutrition 0.000 description 1
- 229910000396 dipotassium phosphate Inorganic materials 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- QCWPZYSLMIXIHM-UHFFFAOYSA-L disodium 4-amino-5-hydroxy-3-[(3-nitrophenyl)diazenyl]-6-phenyldiazenylnaphthalene-2,7-disulfonate Chemical compound [Na+].[Na+].Nc1c(N=Nc2cccc(c2)[N+]([O-])=O)c(cc2cc(c(N=Nc3ccccc3)c(O)c12)S([O-])(=O)=O)S([O-])(=O)=O QCWPZYSLMIXIHM-UHFFFAOYSA-L 0.000 description 1
- DSARWKALPGYFTA-UHFFFAOYSA-L disodium 4-hydroxy-7-[(5-hydroxy-6-phenyldiazenyl-7-sulfonatonaphthalen-2-yl)carbamoylamino]-3-phenyldiazenylnaphthalene-2-sulfonate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)C1=CC2=CC(NC(=O)NC=3C=C4C=C(C(N=NC=5C=CC=CC=5)=C(O)C4=CC=3)S([O-])(=O)=O)=CC=C2C(O)=C1N=NC1=CC=CC=C1 DSARWKALPGYFTA-UHFFFAOYSA-L 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 229910000397 disodium phosphate Inorganic materials 0.000 description 1
- 235000019800 disodium phosphate Nutrition 0.000 description 1
- FPVGTPBMTFTMRT-UHFFFAOYSA-L disodium;2-amino-5-[(4-sulfonatophenyl)diazenyl]benzenesulfonate Chemical compound [Na+].[Na+].C1=C(S([O-])(=O)=O)C(N)=CC=C1N=NC1=CC=C(S([O-])(=O)=O)C=C1 FPVGTPBMTFTMRT-UHFFFAOYSA-L 0.000 description 1
- VQHWSAGRWJWMCJ-UHFFFAOYSA-K disodium;4-chloro-2-methyl-6-[(3-methyl-5-oxo-1-phenylpyrazol-2-id-4-yl)diazenyl]phenolate;chromium(3+);hydron Chemical compound [H+].[Na+].[Na+].[Cr+3].O=C1C(N=NC=2C(=C(C)C=C(Cl)C=2)[O-])=C(C)[N-]N1C1=CC=CC=C1.O=C1C(N=NC=2C(=C(C)C=C(Cl)C=2)[O-])=C(C)[N-]N1C1=CC=CC=C1 VQHWSAGRWJWMCJ-UHFFFAOYSA-K 0.000 description 1
- FPAYXBWMYIMERV-UHFFFAOYSA-L disodium;5-methyl-2-[[4-(4-methyl-2-sulfonatoanilino)-9,10-dioxoanthracen-1-yl]amino]benzenesulfonate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)C1=CC(C)=CC=C1NC(C=1C(=O)C2=CC=CC=C2C(=O)C=11)=CC=C1NC1=CC=C(C)C=C1S([O-])(=O)=O FPAYXBWMYIMERV-UHFFFAOYSA-L 0.000 description 1
- 238000010130 dispersion processing Methods 0.000 description 1
- 238000011978 dissolution method Methods 0.000 description 1
- 125000005066 dodecenyl group Chemical group C(=CCCCCCCCCCC)* 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- IQIJRJNHZYUQSD-UHFFFAOYSA-N ethenyl(phenyl)diazene Chemical compound C=CN=NC1=CC=CC=C1 IQIJRJNHZYUQSD-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- GCMVJZODRSETHG-UHFFFAOYSA-N ethyl 4-[4,6-bis(trichloromethyl)-1,3,5-triazin-2-yl]naphthalene-1-carboxylate Chemical class C12=CC=CC=C2C(C(=O)OCC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 GCMVJZODRSETHG-UHFFFAOYSA-N 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 235000019233 fast yellow AB Nutrition 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 239000000295 fuel oil Substances 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 239000001087 glyceryl triacetate Substances 0.000 description 1
- 235000013773 glyceryl triacetate Nutrition 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- LHGVFZTZFXWLCP-UHFFFAOYSA-N guaiacol Chemical compound COC1=CC=CC=C1O LHGVFZTZFXWLCP-UHFFFAOYSA-N 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- ALPIESLRVWNLAX-UHFFFAOYSA-N hexane-1,1-dithiol Chemical compound CCCCCC(S)S ALPIESLRVWNLAX-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002440 hydroxy compounds Chemical class 0.000 description 1
- UCNNJGDEJXIUCC-UHFFFAOYSA-L hydroxy(oxo)iron;iron Chemical compound [Fe].O[Fe]=O.O[Fe]=O UCNNJGDEJXIUCC-UHFFFAOYSA-L 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 238000004255 ion exchange chromatography Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- JSLCOZYBKYHZNL-UHFFFAOYSA-N isobutyric acid butyl ester Natural products CCCCOC(=O)C(C)C JSLCOZYBKYHZNL-UHFFFAOYSA-N 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 239000006233 lamp black Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- 235000019796 monopotassium phosphate Nutrition 0.000 description 1
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 1
- 235000019799 monosodium phosphate Nutrition 0.000 description 1
- SAQPQTKYCWAAMJ-UHFFFAOYSA-N n,n-diethyl-4-pyridin-2-ylaniline Chemical compound C1=CC(N(CC)CC)=CC=C1C1=CC=CC=N1 SAQPQTKYCWAAMJ-UHFFFAOYSA-N 0.000 description 1
- KVEFSERWIAYNPO-UHFFFAOYSA-N n,n-diethyl-4-quinolin-2-ylaniline Chemical compound C1=CC(N(CC)CC)=CC=C1C1=CC=C(C=CC=C2)C2=N1 KVEFSERWIAYNPO-UHFFFAOYSA-N 0.000 description 1
- QTBGSBRUWVUWCS-UHFFFAOYSA-N n,n-dimethyl-4-pyridin-2-ylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=CC=CC=N1 QTBGSBRUWVUWCS-UHFFFAOYSA-N 0.000 description 1
- RJJJWZAJSLSBKC-UHFFFAOYSA-N n,n-dimethyl-4-pyrimidin-2-ylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=NC=CC=N1 RJJJWZAJSLSBKC-UHFFFAOYSA-N 0.000 description 1
- KLNWLOCDPWWNDS-UHFFFAOYSA-N n,n-dimethyl-4-quinolin-2-ylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=CC=C(C=CC=C2)C2=N1 KLNWLOCDPWWNDS-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- LEGWLJGBFZBZSC-UHFFFAOYSA-N n-[2-[(2,6-dicyano-4-nitrophenyl)diazenyl]-5-(diethylamino)phenyl]acetamide Chemical compound CC(=O)NC1=CC(N(CC)CC)=CC=C1N=NC1=C(C#N)C=C([N+]([O-])=O)C=C1C#N LEGWLJGBFZBZSC-UHFFFAOYSA-N 0.000 description 1
- ZWRDBWDXRLPESY-UHFFFAOYSA-N n-benzyl-n-ethylethanamine Chemical compound CCN(CC)CC1=CC=CC=C1 ZWRDBWDXRLPESY-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- CTIQLGJVGNGFEW-UHFFFAOYSA-L naphthol yellow S Chemical compound [Na+].[Na+].C1=C(S([O-])(=O)=O)C=C2C([O-])=C([N+]([O-])=O)C=C([N+]([O-])=O)C2=C1 CTIQLGJVGNGFEW-UHFFFAOYSA-L 0.000 description 1
- 125000001038 naphthoyl group Chemical group C1(=CC=CC2=CC=CC=C12)C(=O)* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 239000001005 nitro dye Substances 0.000 description 1
- 125000005187 nonenyl group Chemical group C(=CCCCCCCC)* 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- 125000005482 norpinyl group Chemical group 0.000 description 1
- YYZUSRORWSJGET-UHFFFAOYSA-N octanoic acid ethyl ester Natural products CCCCCCCC(=O)OCC YYZUSRORWSJGET-UHFFFAOYSA-N 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- QQBDLJCYGRGAKP-UHFFFAOYSA-N olsalazine Chemical compound C1=C(O)C(C(=O)O)=CC(N=NC=2C=C(C(O)=CC=2)C(O)=O)=C1 QQBDLJCYGRGAKP-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000013500 performance material Substances 0.000 description 1
- DGBWPZSGHAXYGK-UHFFFAOYSA-N perinone Chemical compound C12=NC3=CC=CC=C3N2C(=O)C2=CC=C3C4=C2C1=CC=C4C(=O)N1C2=CC=CC=C2N=C13 DGBWPZSGHAXYGK-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 235000014786 phosphorus Nutrition 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 229940110337 pigment blue 1 Drugs 0.000 description 1
- 229940099800 pigment red 48 Drugs 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000083 poly(allylamine) Polymers 0.000 description 1
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000001325 propanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229960000380 propiolactone Drugs 0.000 description 1
- JCMFJIHDWDKYIL-UHFFFAOYSA-N propyl 3-methoxypropanoate Chemical compound CCCOC(=O)CCOC JCMFJIHDWDKYIL-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- CPNGPNLZQNNVQM-UHFFFAOYSA-N pteridine Chemical compound N1=CN=CC2=NC=CN=C21 CPNGPNLZQNNVQM-UHFFFAOYSA-N 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 238000004451 qualitative analysis Methods 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- 235000012752 quinoline yellow Nutrition 0.000 description 1
- FZUOVNMHEAPVBW-UHFFFAOYSA-L quinoline yellow ws Chemical compound [Na+].[Na+].O=C1C2=CC=CC=C2C(=O)C1C1=NC2=C(S([O-])(=O)=O)C=C(S(=O)(=O)[O-])C=C2C=C1 FZUOVNMHEAPVBW-UHFFFAOYSA-L 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- WPPDXAHGCGPUPK-UHFFFAOYSA-N red 2 Chemical compound C1=CC=CC=C1C(C1=CC=CC=C11)=C(C=2C=3C4=CC=C5C6=CC=C7C8=C(C=9C=CC=CC=9)C9=CC=CC=C9C(C=9C=CC=CC=9)=C8C8=CC=C(C6=C87)C(C=35)=CC=2)C4=C1C1=CC=CC=C1 WPPDXAHGCGPUPK-UHFFFAOYSA-N 0.000 description 1
- KUIXZSYWBHSYCN-UHFFFAOYSA-L remazol brilliant blue r Chemical compound [Na+].[Na+].C1=C(S([O-])(=O)=O)C(N)=C2C(=O)C3=CC=CC=C3C(=O)C2=C1NC1=CC=CC(S(=O)(=O)CCOS([O-])(=O)=O)=C1 KUIXZSYWBHSYCN-UHFFFAOYSA-L 0.000 description 1
- HFIYIRIMGZMCPC-YOLJWEMLSA-J remazole black-GR Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]S(=O)(=O)C1=CC2=CC(S([O-])(=O)=O)=C(\N=N\C=3C=CC(=CC=3)S(=O)(=O)CCOS([O-])(=O)=O)C(O)=C2C(N)=C1\N=N\C1=CC=C(S(=O)(=O)CCOS([O-])(=O)=O)C=C1 HFIYIRIMGZMCPC-YOLJWEMLSA-J 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical class NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 235000019794 sodium silicate Nutrition 0.000 description 1
- NTOOJLUHUFUGQI-UHFFFAOYSA-M sodium;4-(4-acetamidoanilino)-1-amino-9,10-dioxoanthracene-2-sulfonate Chemical compound [Na+].C1=CC(NC(=O)C)=CC=C1NC1=CC(S([O-])(=O)=O)=C(N)C2=C1C(=O)C1=CC=CC=C1C2=O NTOOJLUHUFUGQI-UHFFFAOYSA-M 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000005207 tetraalkylammonium group Chemical group 0.000 description 1
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OVTCUIZCVUGJHS-VQHVLOKHSA-N trans-dipyrrin Chemical compound C=1C=CNC=1/C=C1\C=CC=N1 OVTCUIZCVUGJHS-VQHVLOKHSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229960002622 triacetin Drugs 0.000 description 1
- 125000005208 trialkylammonium group Chemical group 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- ZUCXUTRTSQLRCV-UHFFFAOYSA-K trisodium;1-amino-4-[3-[[4-chloro-6-(3-sulfonatoanilino)-1,3,5-triazin-2-yl]amino]-2,4,6-trimethyl-5-sulfonatoanilino]-9,10-dioxoanthracene-2-sulfonate Chemical compound [Na+].[Na+].[Na+].CC1=C(S([O-])(=O)=O)C(C)=C(NC=2C=3C(=O)C4=CC=CC=C4C(=O)C=3C(N)=C(C=2)S([O-])(=O)=O)C(C)=C1NC(N=1)=NC(Cl)=NC=1NC1=CC=CC(S([O-])(=O)=O)=C1 ZUCXUTRTSQLRCV-UHFFFAOYSA-K 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- KYWIYKKSMDLRDC-UHFFFAOYSA-N undecan-2-one Chemical compound CCCCCCCCCC(C)=O KYWIYKKSMDLRDC-UHFFFAOYSA-N 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 125000001834 xanthenyl group Chemical group C1=CC=CC=2OC3=CC=CC=C3C(C12)* 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
- C08K5/3432—Six-membered rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3442—Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
- C08K5/3445—Five-membered rings
- C08K5/3447—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
- C08K5/3475—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/12—Compositions of unspecified macromolecular compounds characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
- H10K59/8792—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. black layers
Definitions
- the present invention relates to a photosensitive coloring composition, a cured product, partition walls, an organic electroluminescence device, and an image display device.
- a liquid crystal display utilizes the property that the arrangement of liquid crystal molecules changes depending on whether the voltage to the liquid crystal is turned on or off.
- each member constituting a cell of an LCD is often formed by a method using a photosensitive composition, typified by photolithography.
- the application range of this photosensitive composition is expanding further because it facilitates the formation of a fine structure and facilitates the processing of substrates for large screens.
- An image display device including an organic electroluminescent element (also called organic electroluminescence or organic EL) has excellent visibility and responsiveness such as contrast and viewing angle, low power consumption, reduction in thickness and weight, and display main body. It is attracting attention as a next-generation flat panel display (FPD) because it can be made flexible.
- An organic electroluminescent element has a structure in which an organic layer including a light-emitting layer or various functional layers is sandwiched between a pair of electrodes, at least one of which is translucent. 2. Description of the Related Art
- An image display device displays an image by driving a panel in which an organic electroluminescence element is arranged for each pixel. Conventionally, such an organic electroluminescence device is manufactured by forming partition walls (banks) on a substrate and then laminating a light-emitting layer or various functional layers in a region surrounded by the partition walls.
- an evaporation method is mainly applied in which a material is sublimated in a vacuum state and deposited on a substrate to form a film.
- wet processes such as casting, spin coating, and inkjet printing have attracted attention.
- the inkjet printing method can reduce the unevenness of the film thickness when it is applied to a large area, and can improve the definition of the display by different colors during coating, reduce the amount of materials used, and improve the yield. Therefore, it is suitable as a method for forming an organic layer in a large-sized panel.
- a method for easily forming partition walls a method of forming them by photolithography using a photosensitive composition is known.
- a method of imparting a light-shielding property to partition walls and suppressing light leakage between pixels a method of incorporating a coloring agent into a photosensitive composition is known.
- Patent Document 1 describes a colored photosensitive resin composition that suppresses outgassing by using a specific organic black pigment and an alkali-soluble resin.
- Patent Document 2 describes a photosensitive resin composition for forming a protective film containing benzotriazole and its derivatives as a rust preventive.
- top-emission and bottom-emission panels in organic electroluminescent devices.
- a reflective electrode made of silver or the like is used as an electrode, and a cured product such as a barrier rib is formed thereon.
- the electrode surface becomes uneven (hereinafter also referred to as surface roughness), the light-emitting layer cannot be uniformly formed on that portion, and when the organic electroluminescent device is produced, short-circuiting or the like may occur. It may cause display failure.
- the colored photosensitive resin composition described in Patent Document 1 causes surface roughness of the electrode, which poses a practical problem.
- the photosensitive resin composition described in Patent Document 2 does not contain a coloring agent or a dispersing agent, the problem of surface roughness has not occurred.
- the present invention has been made in view of the above circumstances, and provides a photosensitive coloring composition that is less likely to cause surface roughness of the electrode after heat treatment, and a highly reliable organic light emitting device and image display device without display defects. intended to provide
- the gist of the present invention is as follows.
- [1] Contains (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a nitrogen-containing aromatic compound, and (f) a dispersant A photosensitive coloring composition, A photosensitive coloring composition, wherein the nitrogen-containing aromatic compound (e) contains a compound represented by the following general formula (1) and/or the following general formula (2).
- R 1 represents an alkyl group, a carboxy group, or a nitro group
- R 2 represents a hydroxyl group or a hydrogen atom
- l represents 0 to 4 represents an integer.
- R 3 and R 4 each independently represent an alkyl group, and m and n each independently represent an integer of 0 to 4.
- the content of (e) the nitrogen-containing aromatic compound is 0.01% by mass or more and 5% by mass or less with respect to the total solid content of the photosensitive coloring composition of [1] to [3] Any photosensitive coloring composition.
- the photosensitive coloring composition of the second aspect of the present invention [5] consists (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, (e) a nitrogen-containing aromatic compound, and (f) a dispersant
- a photosensitive coloring composition In a coating film having a thickness of 2.0 ⁇ m obtained by curing the photosensitive resin composition, the toluene-equivalent amount of the (e) nitrogen-containing aromatic compound component detected by a heat-generated gas analysis method is 0.01 to A photosensitive coloring composition, characterized in that it is 0.50 ⁇ g/cm 2 .
- the (a) colorant contains at least one selected from the group consisting of red pigments and orange pigments and at least one selected from the group consisting of blue pigments and purple pigments [1] to [5] ] Any photosensitive coloring composition.
- the organic black pigment contains at least one selected from the group consisting of compounds represented by the following general formula (a1), geometric isomers thereof, salts thereof, and salts of geometric isomers thereof, [7 ] photosensitive coloring composition.
- R 11 and R 16 each independently represent a hydrogen atom, CH 3 , CF 3 , a fluorine atom or a chlorine atom;
- An image display device comprising the organic electroluminescence device of [14].
- (meth)acryl means “acryl and/or methacryl", and the same applies to "(meth)acrylate” and "(meth)acryloyl”.
- the "acrylic resin” means a (co)polymer containing (meth)acrylic acid and a (co)polymer containing a (meth)acrylic acid ester having a carboxy group.
- total solid content means all components other than the solvent in the photosensitive resin composition, and even if the components other than the solvent are liquid at room temperature, the component is not included in the solvent and the total Included in solids.
- (Co)polymer means including both a single polymer (homopolymer) and a copolymer (copolymer), and "acid (anhydride)", “(anhydride) ... acid” , is meant to include both acids and their anhydrides.
- the term “monomer” is a term corresponding to so-called high-molecular substances (polymers), and includes dimers, trimers, and oligomers in addition to monomers in the narrow sense.
- weight average molecular weight means the weight average molecular weight (Mw) in terms of polystyrene by GPC (gel permeation chromatography).
- amine value represents the amine value in terms of effective solid content, unless otherwise specified, and is a value represented by the mass of KOH equivalent to the amount of base per 1 g of solid content of the dispersant. .
- the measuring method will be described later.
- acid value represents an acid value in terms of effective solid content and is calculated by neutralization titration.
- C.I means Color Index. In this specification, percentages and parts represented by “mass” are synonymous with percentages and parts represented by "weight”.
- the "colored photosensitive resin composition of the present invention” includes the colored photosensitive resin composition according to the first aspect and the colored photosensitive resin composition according to the second aspect. refers to both things.
- the photosensitive coloring composition of the present invention is (a) a colorant (b) an alkali-soluble resin (c) a photopolymerization initiator (d) an ethylenically unsaturated compound (e) a nitrogen-containing aromatic compound (f) a dispersant are contained as essential components.
- the photosensitive coloring composition of the present invention contains (a) a coloring agent. (a) By containing a coloring agent, it is possible to obtain an appropriate light absorbing property, particularly an appropriate light shielding property when used for forming a light shielding member such as a partition wall.
- the (a) colorant that can be used in the photosensitive coloring composition of the present invention is not particularly limited, and may be a pigment or a dye. From the viewpoint of durability, it is preferable to use a pigment.
- the pigments contained in the colorant may be of one type alone, or may be of two or more types. From the viewpoint of achieving both uniform light blocking in the visible region and OD per unit film thickness, it is preferable to use two or more kinds.
- the pigment that can be used as the colorant is not particularly limited, and examples thereof include organic coloring pigments and black pigments.
- the organic coloring pigment means an organic pigment exhibiting a color other than black, and examples thereof include red pigment, orange pigment, blue pigment, purple pigment, green pigment, and yellow pigment.
- organic pigments are preferable from the viewpoint of high dielectric and low dielectric constant. It is preferable to use an organic coloring pigment from the viewpoint that the absorption of ultraviolet rays is suppressed, the curability is high, and the shape of the cured product is easily controlled. From the viewpoint of light shielding properties, it is preferable to use a black pigment.
- the organic coloring pigments may be used singly or in combination of two or more. In particular, it is more preferable to use a combination of organic coloring pigments of different colors, and it is even more preferable to use a combination of organic coloring pigments that, when combined, exhibit a color close to black.
- organic coloring pigments are not particularly limited, but examples include azo-based, phthalocyanine-based, quinacridone-based, benzimidazolone-based, isoindolinone-based, dioxazine-based, indanthrene-based, and perylene-based pigments. Specific examples of pigments that can be used are shown below by pigment numbers. "C.I.” in “C.I. Pigment Red 2" and the like listed below means a color index.
- C.I. I. Pigment Red 48 1, 122, 149, 168, 177, 179, 194, 202, 206, 207, 209, 224, 242, 254, more preferably C.I. I. Pigment Red 177, 209, 224, 254 may be mentioned.
- C.I. I. Pigment Red 177, 254, 272 is preferably used.
- the photosensitive coloring composition is cured with ultraviolet rays, it is preferable to use a red pigment having a low ultraviolet absorption rate.
- I. Pigment Red 254, 272 is more preferably used.
- C.I. I. Pigment Orange 1 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48, 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78, 79 can be mentioned.
- C.I. I. Pigment Orange 13, 43, 64, 72 is preferably used.
- the photosensitive coloring composition is cured with ultraviolet rays, it is preferable to use an orange pigment having a low ultraviolet absorption rate.
- Pigment Orange 64, 72 is used.
- C.I. I. Pigment Blue 1 1:2, 9, 14, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 17, 19, 25, 27, 28, 29, 33, 35, 36, 56, 56:1, 60, 61, 61:1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78, 79 can be mentioned.
- C.I. I. Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:6, 60 more preferably C.I. I. Pigment Blue 15:6 may be mentioned.
- C.I. I. Pigment Blue 15:6,16,60 is preferably used.
- the photosensitive coloring composition is cured with ultraviolet light, it is preferable to use a blue pigment having a low ultraviolet absorption rate.
- I. Pigment Blue 60 is more preferably used.
- C.I. I. Pigment Violet 1 1:1, 2, 2:2, 3, 3:1, 3:3, 5, 5:1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, 50 can be mentioned.
- C.I. I. Pigment Violet 19 23, 29, more preferably C.I. I. Pigment Violet 23 may be mentioned.
- C.I. I. Pigment Violet 23 29 is preferably used.
- the photosensitive coloring composition is cured with ultraviolet rays, it is preferable to use a violet pigment having a low ultraviolet absorption rate. I. Pigment Violet 29 is more preferably used.
- C.I. I. Pigment Green 1 2, 4, 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54, 55, 58, 59 .
- C.I. I. Pigment Green 7, 36 can be mentioned.
- C.I. I. Pigment Yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, 185, more preferably C.I. I. Pigment Yellow 83, 138, 139, 150, 180 can be mentioned.
- At least one pigment selected from the group consisting of red pigments, orange pigments, blue pigments and violet pigments.
- Red pigment C.I. I. Pigment Red 177, 254, 272
- Orange pigment C.I. I. Pigment Orange 43, 64, 72
- Blue pigment C.I. I. pigment blue 15:6,60 Purple pigment: C.I. I. Pigment Violet 23, 29
- the combination of organic coloring pigments when two or more organic coloring pigments are used in combination is not particularly limited, but from the viewpoint of light-shielding properties, at least one selected from the group consisting of red pigments and orange pigments, and blue pigments and violet pigments. It is preferable to contain at least one selected from the group consisting of Although the combination of colors is not particularly limited, from the viewpoint of light blocking properties, for example, a combination of a red pigment and a blue pigment, a combination of a blue pigment and an orange pigment, and a combination of a blue pigment, an orange pigment and a violet pigment can be mentioned. .
- Black pigments include organic black pigments and inorganic black pigments. Among them, it is preferable to use an organic black pigment from the viewpoint of light shielding properties, high electrical resistance, and low dielectric constant.
- an organic black pigment from the viewpoint of suppressing the absorption of ultraviolet rays and making it easier to control the shape, a compound represented by the following general formula (a1) (hereinafter sometimes referred to as "compound (a1)”).
- geometric isomers of compound (a1), salts of compound (a1), and organic black pigments containing at least one selected from the group consisting of salts of geometric isomers of compound (a1) hereinafter, “general formula (a1 ) may be referred to as an organic black pigment represented by ).
- R 11 and R 16 each independently represent a hydrogen atom, CH 3 , CF 3 , a fluorine atom or a chlorine atom;
- compound (a1) When compound (a1) is anionic, its charge can be transferred to any known suitable cation such as metallic, organic, inorganic or metal-organic cations, especially alkali metals, alkaline earth metals, transition metals, primary ammonium , secondary ammonium, tertiary ammonium such as trialkylammonium, quaternary ammonium such as tetraalkylammonium, or a salt compensated by an organometallic complex. Also, when the geometric isomer of compound (a1) is anionic, it is preferably a similar salt.
- suitable cation such as metallic, organic, inorganic or metal-organic cations, especially alkali metals, alkaline earth metals, transition metals, primary ammonium , secondary ammonium, tertiary ammonium such as trialkylammonium, quaternary ammonium such as tetraalkylammonium, or a salt compensated by an organometallic complex.
- R 12 , R 14 , R 15 , R 17 , R 19 and R 20 are each independently preferably hydrogen, fluorine or chlorine, more preferably hydrogen.
- R 13 and R 18 are each independently preferably hydrogen atom, NO 2 , OCH 3 , OC 2 H 5 , bromine atom, chlorine atom, CH 3 , C 2 H 5 , N(CH 3 ) 2 , N(CH 3 ) (C 2 H 5 ), N(C 2 H 5 ) 2 , ⁇ -naphthyl, ⁇ -naphthyl, SO 3 H or SO 3 - , more preferably a hydrogen atom or SO 3 H, particularly preferably is a hydrogen atom.
- R 11 and R 16 are each independently preferably a hydrogen atom, CH 3 or CF 3 , more preferably a hydrogen atom.
- at least one combination selected from the group consisting of R 11 and R 16 , R 12 and R 17 , R 13 and R 18 , R 14 and R 19 , and R 15 and R 20 is the same, more preferably is the same as R 16 , R 12 is the same as R 17 , R 13 is the same as R 18 , R 14 is the same as R 19 , and R 15 is the same as R 20 are identical.
- Alkyl groups having 1 to 12 carbon atoms are, for example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, isobutyl group, tert-butyl group, 2-methylbutyl group, n -pentyl group, 2-pentyl group, 3-pentyl group, 2,2-dimethylpropyl group, n-hexyl group, n-heptyl group, n-octyl group, 1,1,3,3-tetramethylbutyl group, 2-ethylhexyl group, nonyl group, decyl group, undecyl group or dodecyl group.
- Cycloalkyl groups having 3 to 12 carbon atoms are, for example, cyclopropyl, cyclopropylmethyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclohexylmethyl, trimethylcyclohexyl, thuzyl, norbornyl, bornyl, and norcalyl groups. , a karyl group, a menthyl group, a norpinyl group, a pinyl group, an adamantan-1-yl group or an adamantan-2-yl group.
- Alkenyl groups having 2 to 12 carbon atoms are, for example, vinyl group, allyl group, 2-propen-2-yl group, 2-buten-1-yl group, 3-buten-1-yl group, 1,3-butadiene -2-yl group, 2-penten-1-yl group, 3-penten-2-yl group, 2-methyl-1-buten-3-yl group, 2-methyl-3-buten-2-yl group, 3-methyl-2-buten-1-yl group, 1,4-pentadien-3-yl group, hexenyl group, octenyl group, nonenyl group, decenyl group or dodecenyl group.
- Cycloalkenyl groups having 3 to 12 carbon atoms are, for example, 2-cyclobuten-1-yl, 2-cyclopenten-1-yl, 2-cyclohexen-1-yl, 3-cyclohexen-1-yl, 2 , 4-cyclohexadien-1-yl group, 1-p-menthen-8-yl group, 4(10)-thugen-10-yl group, 2-norbornen-1-yl group, 2,5-norbornadiene-1 -yl group, 7,7-dimethyl-2,4-norcaladien-3-yl group or camphenyl group.
- Alkynyl groups having 2 to 12 carbon atoms are, for example, 1-propyn-3-yl, 1-butyn-4-yl, 1-pentyn-5-yl, 2-methyl-3-butyn-2-yl group, 1,4-pentadiyn-3-yl group, 1,3-pentadiyn-5-yl group, 1-hexyn-6-yl group, cis-3-methyl-2-penten-4-yn-1-yl group, trans-3-methyl-2-penten-4-yn-1-yl group, 1,3-hexadiyn-5-yl group, 1-octin-8-yl group, 1-nonin-9-yl group, 1-decyn-10-yl group or 1-dodecyn-12-yl group.
- a halogen atom is, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
- the organic black pigment represented by formula (a1) is preferably a compound represented by the following general formula (a2) (hereinafter also referred to as "compound (a2)"), and a geometric isomer of compound (a2)
- organic black pigment is Irgaphor (registered trademark) Black S 0100 CF (manufactured by BASF).
- This organic black pigment is preferably used by dispersing it with a dispersant, solvent, and method, which will be described later.
- a sulfonic acid derivative of the compound (a1), particularly a sulfonic acid derivative of the compound (a2) is present during dispersion, the dispersibility and storage stability may be improved. is preferably included.
- organic black pigments other than the organic black pigment represented by formula (a1) include aniline black and perylene black.
- an inorganic black pigment from the viewpoint of higher light shielding properties.
- inorganic black pigments include carbon black, acetylene black, lamp black, bone black, graphite, iron black, cyanine black, and titanium black.
- Carbon black can be preferably used from the viewpoint of light shielding properties and image characteristics. Examples of carbon black include the following carbon blacks.
- Carbon black that is coated with resin may be used.
- the use of resin-coated carbon black has the effect of improving the adhesion to the glass substrate and the volume resistivity.
- resin-coated carbon black for example, carbon black described in Japanese Patent Application Laid-Open No. 09-71733 can be preferably used.
- Resin-coated carbon black is preferably used in terms of volume resistance and dielectric constant.
- the total content of Na and Ca is preferably 100 ppm or less as the carbon black to be coated with the resin.
- Carbon black usually contains Na, Ca, K, Mg, Al, Fe mixed from raw material oil, combustion oil (or gas), reaction stop water and granulation water at the time of production, and furnace material of the reactor. etc., and contains ash in the order of percent.
- Na and Ca are generally contained in amounts of several hundred ppm or more, respectively. tend to prevent short circuits.
- carbon black is mixed and dispersed in water, hydrochloric acid, or hydrogen peroxide solution, and then a solvent that is sparingly soluble in water is added. Carbon black migrates to the solvent side and is completely separated from water. Most of Na and Ca present in the carbon black together with the carbon black are dissolved and removed in water and acid. In order to reduce the total amount of Na and Ca to 100 ppm or less, it may be possible to use only the carbon black manufacturing process with carefully selected raw materials or the water or acid dissolution method alone. The total amount of Na and Ca can be easily made 100 ppm or less.
- the resin-coated carbon black is preferably so-called acidic carbon black having a pH of 6 or less. Since the diameter of dispersion in water (diameter of agromylate) becomes small, it is possible to coat fine units, which is preferable. Furthermore, it is preferable that the average particle diameter is 40 nm or less. Further, it is preferable that the dibutyl phthalate (DBP) absorption amount is 140 ml/100 g or less. By setting the average particle size and the DBP absorption amount within the above ranges, there is a tendency that a coating film having good light shielding properties can be obtained.
- the average particle diameter means the number average particle diameter. Particle image analysis is performed by taking photographs taken at tens of thousands of times by electron microscope observation and measuring about 2000 to 3000 particles in these photographs with an image processing device. means the equivalent circle diameter determined by
- the method of preparing the resin-coated carbon black is not particularly limited.
- a resin solution obtained by mixing a resin with a solvent such as cyclohexanone, toluene, or xylene and dissolving it by heating, and a suspension obtained by mixing carbon black and water are mixed and stirred to separate carbon black and water, A method in which the composition obtained by removing water and heating and kneading is formed into a sheet, pulverized, and then dried; 2.
- a carboxylic acid such as maleic acid or fumaric acid is dissolved in the solvent exemplified above, carbon black is added, mixed and dried, the solvent is removed to obtain a carboxylic acid-impregnated carbon black, and a resin is added thereto. dry blending; 4.
- a reactive group-containing monomer component constituting the resin to be coated and water are stirred at high speed to prepare a suspension, which is cooled after polymerization to obtain a reactive group-containing resin from the polymer suspension.
- a method of adding carbon black and kneading, reacting the carbon black with a reactive group (grafting the carbon black), cooling and pulverizing; etc. can be adopted.
- the type of resin to be coated is not particularly limited, but synthetic resins are common, and resins with benzene rings in the structure have a stronger action like amphoteric surfactants, so they can be dispersed. It is preferable from the point of view of properties and dispersion stability.
- Specific synthetic resins include thermosetting resins such as phenol resin, melamine resin, xylene resin, diallyl phthalate resin, glyptal resin, epoxy resin, alkylbenzene resin, polystyrene, polycarbonate, polyethylene terephthalate, polybutylene terephthalate, and modified polyphenylene.
- Thermoplastic resins such as oxide, polysulfone, polyparaphenyleneterephthalamide, polyamideimide, polyimide, polyaminobismaleimide, polyethersulfopolyphenylenesulfone, polyarylate, and polyetheretherketone can be used.
- the coating amount of the resin with respect to the carbon black is preferably 1 to 30% by mass with respect to the total amount of the carbon black and the resin.
- the content is equal to or less than the above upper limit, there is a tendency that adhesion between resins can be prevented and dispersibility can be improved.
- Carbon black coated with a resin in this manner can be used as a light-shielding material for colored spacers in a conventional manner, and a color filter having the colored spacer as a component can be produced in a conventional manner.
- a colored spacer having a high light shielding rate and a low surface reflectance can be achieved at low cost. It is also presumed that the coating of the carbon black surface with a resin also works to enclose Ca and Na in the carbon black.
- the average particle size of the pigment is preferably 1 ⁇ m or less, more preferably 0.5 ⁇ m or less, and even more preferably 0.25 ⁇ m or less.
- the standard for the average particle size is the number of pigment particles.
- the average particle size of the pigment is a value determined from the pigment particle size measured by dynamic light scattering (DLS). Particle size measurement is performed using a sufficiently diluted photosensitive coloring composition (usually diluted to prepare a pigment concentration of about 0.005 to 0.2% by mass. However, if there is a concentration recommended by the measuring instrument, according to its concentration) and measured at 25°C.
- Dyes may be used in addition to the above-mentioned organic coloring pigments and black pigments.
- Dyes that can be used as colorants include, for example, azo dyes, anthraquinone dyes, phthalocyanine dyes, quinoneimine dyes, quinoline dyes, nitro dyes, carbonyl dyes, and methine dyes.
- azo dyes examples include C.I. I. Acid Yellow 11, C.I. I. Acid Orange 7, C.I. I. Acid Red 37, C.I. I. Acid Red 180, C.I. I. Acid Blue 29, C.I. I. Direct Red 28, C.I. I. Direct Red 83, C.I. I. Direct Yellow 12, C.I. I. Direct Orange 26, C.I. I. Direct Green 28, C.I. I. Direct Green 59, C.I. I. Reactive Yellow 2, C.I. I. Reactive Red 17, C.I. I. Reactive Red 120, C.I. I. Reactive Black 5, C.I. I. Disperse Orange 5, C.I. I. disperse thread 58, C.I. I. Disperse Blue 165, C.I. I. Basic Blue 41, C.I. I. Basic Red 18, C.I. I. Mordan Tread 7, C.I. I. Mordant Yellow 5, C.I. I. Mordant Black 7 is mentioned.
- anthraquinone dyes examples include C.I. I. bat blue 4, C.I. I. Acid Blue 40, C.I. I. Acid Green 25, C.I. I. Reactive Blue 19, C.I. I. Reactive Blue 49, C.I. I. disperse thread 60, C.I. I. Disperse Blue 56, C.I. I. Disperse Blue 60 may be mentioned.
- phthalocyanine dyes examples include C.I. I. Bat Blue 5 is mentioned.
- quinone imine dyes include C.I. I. Basic Blue 3, C.I. I. Basic Blue 9 is mentioned.
- quinoline dyes examples include C.I. I. Solvent Yellow 33, C.I. I. Acid Yellow 3, C.I. I. Disperse Yellow 64 is mentioned.
- nitro-based dyes examples include C.I. I. Acid Yellow 1, C.I. I. Acid Orange 3, C.I. I. Disperse Yellow 42 is mentioned.
- the (b) alkali-soluble resin used in the present invention is not particularly limited as long as it is a resin exhibiting alkali solubility. Examples thereof include resins containing a carboxy group or a hydroxyl group. ) acrylate-based resins, acrylic-based resins, carboxy-group-containing epoxy resins, carboxy-group-containing urethane resins, novolak-based resins, and polyvinylphenol-based resins. especially, (b1) epoxy (meth)acrylate resin and (b2) acrylic copolymer resin are preferably used from the viewpoint of excellent plate-making properties. These can be used singly or in combination of two or more.
- Epoxy (meth)acrylate resin is a mixture of an epoxy compound (epoxy resin) and an ⁇ , ⁇ -unsaturated monocarboxylic acid and/or an ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxy group in the ester moiety. It is a resin obtained by reacting the hydroxyl groups produced by the reaction with a compound having two or more substituents capable of reacting with hydroxyl groups, such as polybasic acids and/or anhydrides thereof.
- the epoxy (meth)acrylate resin (b1) also includes a resin obtained by reacting the carboxy group of the resin obtained by the above reaction with a compound having a reactive functional group.
- Epoxy (meth)acrylate resins have substantially no epoxy group in terms of chemical structure, and are not limited to "(meth)acrylates", but are made from epoxy compounds (epoxy resins), and , "(meth)acrylate” is a representative example, and is thus named according to common practice.
- the (b1) epoxy (meth)acrylate resin used in the present invention includes an epoxy (meth)acrylate resin (b1-1) and/or an epoxy (meth)acrylate resin (b1-2) (hereinafter referred to as "carboxy group-containing Epoxy (meth)acrylate resin") is preferably used from the viewpoint of developability and reliability.
- the (b1) epoxy (meth)acrylate resin those having an aromatic ring in the main chain can be more preferably used from the viewpoint of outgassing.
- the epoxy resin includes a raw material compound before forming a resin by thermosetting, and the epoxy resin can be appropriately selected and used from known epoxy resins.
- the epoxy resin a compound obtained by reacting a phenolic compound and epihalohydrin can be used.
- the phenolic compound is preferably a compound having a divalent or more divalent phenolic hydroxyl group, and may be a monomer or a polymer.
- types of epoxy resins used as raw materials include cresol novolak type epoxy resin, phenol novolak type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, trisphenolmethane type epoxy resin, biphenyl novolak type epoxy resin, and naphthalene.
- a novolak type epoxy resin an epoxy resin which is a reaction product of a polyaddition reaction product of dicyclopentadiene and phenol or cresol and epihalohydrin, an adamantyl group-containing epoxy resin, and a fluorene type epoxy resin can be suitably used, and the main chain Those having an aromatic ring can be more preferably used.
- Epoxy resins include, for example, bisphenol A type epoxy resins (e.g., Mitsubishi Chemical Corp.'s "jER (registered trademark, hereinafter the same) 828", “jER1001", “jER1002", “jER1004", etc.), bisphenol A type Epoxy resin obtained by reaction of alcoholic hydroxyl group of epoxy resin and epichlorohydrin (for example, "NER-1302” manufactured by Nippon Kayaku Co., Ltd.
- bisphenol A type epoxy resins e.g., Mitsubishi Chemical Corp.'s "jER (registered trademark, hereinafter the same) 828", “jER1001", “jER1002", “jER1004", etc.
- bisphenol A type Epoxy resin obtained by reaction of alcoholic hydroxyl group of epoxy resin and epichlorohydrin for example, "NER-1302” manufactured by Nippon Kayaku Co., Ltd.
- a is an average value and represents a number of 0 to 10
- each R 111 is independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, or a cycloalkyl having 3 to 10 carbon atoms. group, phenyl group, naphthyl group or biphenyl group.
- Plural R 111 in one molecule may be the same or different.
- b1 and b2 are each independently an average value and represent a number of 0 to 10
- R 121 is each independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, and 3 carbon atoms. represents a cycloalkyl group, phenyl group, naphthyl group, or biphenyl group of ⁇ 10; Plural R 121 in one molecule may be the same or different.
- X represents a linking group represented by general formula (B3-1) or (B3-2) below. However, it contains one or more adamantane structures in its molecular structure.
- c represents 2 or 3;
- R 131 to R 134 and R 135 to R 137 are each independently an optionally substituted adamantyl group, a hydrogen atom, or a represents an alkyl group having 1 to 12 carbon atoms which may be substituted, or a phenyl group which may have a substituent, and * represents a bond.
- R 141 and R 142 each independently represent an alkyl group having 1 to 4 carbon atoms or a halogen atom
- R 143 and R 144 Each independently represents an alkylene group having 1 to 4 carbon atoms
- x and y each independently represents an integer of 0 or more.
- epoxy resin it is preferable to use an epoxy resin represented by any one of formulas (B1) to (B4).
- Examples of ⁇ , ⁇ -unsaturated monocarboxylic acids or ⁇ , ⁇ -unsaturated monocarboxylic acid esters having a carboxy group include (meth)acrylic acid, crotonic acid, o-, m- or p-vinylbenzoic acid, Monocarboxylic acids such as ⁇ -position haloalkyl, alkoxyl, halogen, nitro, and cyano-substituted (meth)acrylic acid; 2-(meth)acryloyloxyethyl succinic acid, 2-(meth)acryloyloxyethyladipic acid, 2 - (meth) acryloyloxyethyl phthalate, 2-(meth) acryloyloxyethyl hexahydrophthalate, 2-(meth) acryloyloxyethyl maleate, 2-(meth) acryloyloxypropyl succinate, 2 - (meth) acryloyloxy
- a method for adding an ⁇ , ⁇ -unsaturated monocarboxylic acid or an ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxy group to an epoxy resin a known method can be used. For example, it is possible to react an ⁇ , ⁇ -unsaturated monocarboxylic acid or an ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxy group with an epoxy resin at a temperature of 50 to 150° C. in the presence of an esterification catalyst. can.
- esterification catalyst used here examples include tertiary amines such as triethylamine, trimethylamine, benzyldimethylamine and benzyldiethylamine, and quaternary ammonium salts such as tetramethylammonium chloride, tetraethylammonium chloride and dodecyltrimethylammonium chloride. can.
- tertiary amines such as triethylamine, trimethylamine, benzyldimethylamine and benzyldiethylamine
- quaternary ammonium salts such as tetramethylammonium chloride, tetraethylammonium chloride and dodecyltrimethylammonium chloride.
- Each component of the epoxy resin, the ⁇ , ⁇ -unsaturated monocarboxylic acid or the ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxy group, and the esterification catalyst may be used by selecting each component one by one. , may be used in combination of two or more.
- the amount of the ⁇ , ⁇ -unsaturated monocarboxylic acid or the ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxy group is preferably 0.5 to 1.2 equivalents per equivalent of the epoxy group of the epoxy resin. It is preferably 0.7 to 1.1 equivalents.
- the amount of the ⁇ , ⁇ -unsaturated monocarboxylic acid or the ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group By setting the amount of the ⁇ , ⁇ -unsaturated monocarboxylic acid or the ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group to the above lower limit or more, the shortage of the amount of the unsaturated group to be introduced can be suppressed, and the continuous increase in the amount of the unsaturated group can be suppressed. Reaction with basic acids and/or their anhydrides also tends to be sufficient. By making it equal to or less than the above upper limit, it is possible to suppress the remaining unreacted matter of the ⁇ , ⁇ -unsaturated monocarboxylic acid or the ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxy group, and it is easy to improve the curing characteristics. A trend is recognized.
- polybasic acids and/or anhydrides thereof examples include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexacarboxylic acid, Hydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, biphenyltetracarboxylic acid, and anhydrides thereof.
- maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid, or anhydrides thereof are preferred. Particularly preferred are tetrahydrophthalic acid, biphenyltetracarboxylic acid, tetrahydrophthalic anhydride, and biphenyltetracarboxylic dianhydride.
- the addition reaction of the polybasic acid and/or its anhydride can be performed using a known technique, and an ⁇ , ⁇ -unsaturated monocarboxylic acid or an ⁇ , ⁇ -unsaturated monocarboxylic acid having a carboxy group to the epoxy resin.
- the desired product can be obtained by continuing the reaction under the same conditions as the addition reaction of the carboxylic acid ester.
- the amount of polybasic acid and/or its anhydride component to be added is preferably such that the acid value of the resulting carboxyl group-containing epoxy (meth)acrylate resin is 10 to 150 mgKOH/g, more preferably 20 to It is preferred to be in the order of 140 mg KOH/g.
- Alkali developability tends to be improved by adjusting the content to be at least the above lower limit. Curing performance tends to be good by adjusting the content to be equal to or less than the above upper limit.
- Polyfunctional alcohols such as trimethylolpropane, ditrimethylolpropane, pentaerythritol, dipentaerythritol, trimethylolethane, 1,2,3-propanetriol (polyhydric alcohol ) to introduce a multi-branched structure.
- polyhydric alcohol polyhydric alcohol
- the order of mixing the polybasic acid and/or its anhydride and the polyfunctional alcohol is not particularly limited.
- any hydroxyl group present in the mixture of the reaction product of the epoxy resin and the ⁇ , ⁇ -unsaturated monocarboxylic acid or the ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group and the polyfunctional alcohol undergoes an addition reaction.
- the molecular weight of the (b1) epoxy (meth)acrylate resin can be increased, branches can be introduced into the molecule, and there is a tendency to balance the molecular weight and viscosity.
- the rate of introduction of acid groups into the molecule can be increased, and there is a tendency to easily balance sensitivity, adhesion, and the like.
- Carboxy group-containing epoxy (meth)acrylate resins include those described in Korean Patent Publication No. 10-2013-0022955, in addition to those described above.
- the carboxy group-containing epoxy (meth)acrylate resin preferably has a weight average molecular weight (Mw) in terms of polystyrene measured by gel permeation chromatography (GPC) of 1000 or more, more preferably 1500 or more, and still more preferably 2000 or more, More preferably 3,000 or more, particularly preferably 4,000 or more, and particularly preferably 5,000 or more. Also, it is preferably 30,000 or less, more preferably 20,000 or less, and still more preferably 15,000 or less.
- Mw weight average molecular weight
- GPC gel permeation chromatography
- the content is at least the above lower limit, there is a tendency that the solubility in the developer can be suppressed from becoming too high.
- the solubility in the developer tends to be good.
- the acid value of the carboxy group-containing epoxy (meth)acrylate resin is not particularly limited, but is preferably 20 mgKOH/g or more, more preferably 40 mgKOH/g or more, still more preferably 60 mgKOH/g or more, and even more preferably 80 mgKOH/g or more. , 100 mg KOH/g or more are particularly preferred. Also, it is preferably 200 mgKOH/g or less, more preferably 150 mgKOH/g or less, still more preferably 130 mgKOH/g or less, and particularly preferably 120 mgKOH/g or less. The above upper and lower limits can be combined arbitrarily.
- 20 mg KOH/g to 200 mg KOH/g is preferable, 60 mg KOH/g to 150 mg KOH/g is more preferable, 80 mg KOH/g to 130 mg KOH/g is still more preferable, and 100 mg KOH/g to 130 mg KOH/g is even more preferable.
- the amount is at least the above lower limit, there is a tendency that the development solubility is improved and the resolution is improved.
- the amount is equal to or less than the above upper limit, there is a tendency that the remaining film ratio of the photosensitive coloring composition is improved.
- the chemical structure of the epoxy (meth)acrylate resin is not particularly limited, but from the viewpoint of developability and reliability, an epoxy (meth)acrylate resin having a partial structure represented by the following general formula (b1-I) (hereinafter , Sometimes abbreviated as "(b1-I) epoxy (meth)acrylate resin”.) and / or epoxy (meth)acrylate resin having a partial structure represented by the following general formula (b1-II) ( Hereinafter, it may be abbreviated as “(b1-II) epoxy (meth)acrylate resin”).
- R 11 represents a hydrogen atom or a methyl group
- R 12 represents an optionally substituted divalent hydrocarbon group
- k represents 1 or 2
- the benzene ring in formula (b1-I) may be further substituted with any substituent.
- R 13 each independently represents a hydrogen atom or a methyl group
- R 14 represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain
- R 15 and R 16 each independently represents a divalent aliphatic group which may have a substituent
- m and n each independently represent an integer of 0 to 2
- * represents a bond.
- R 11 represents a hydrogen atom or a methyl group
- R 12 represents an optionally substituted divalent hydrocarbon group
- k represents 1 or 2
- the benzene ring in formula (b1-I) may be further substituted with any substituent.
- R 12 represents a divalent hydrocarbon group which may have a substituent.
- the divalent hydrocarbon group includes a divalent aliphatic group, a divalent aromatic ring group, and a group in which one or more divalent aliphatic groups and one or more divalent aromatic ring groups are linked. mentioned.
- the divalent aliphatic group includes linear, branched and cyclic aliphatic groups.
- a linear aliphatic group is preferred from the viewpoint of development solubility.
- a cyclic aliphatic group is preferable from the viewpoint of reducing permeation of the developer into the exposed area.
- the number of carbon atoms is preferably 1 or more, more preferably 3 or more, and even more preferably 6 or more.
- 20 or less are preferable, 15 or less are more preferable, and 10 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 20 are preferred, 1 to 15 are more preferred, and 1 to 10 are even more preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, surface roughness during development is unlikely to occur, and adhesion to the substrate tends to be good.
- the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- divalent linear aliphatic groups examples include methylene group, ethylene group, n-propylene group, n-butylene group, n-pentylene group, n-hexylene group and n-heptylene group.
- a methylene group is preferred from the viewpoint of rigidity of the skeleton.
- the divalent branched aliphatic group includes the divalent linear aliphatic group described above, and side chains such as methyl, ethyl, n-propyl, isopropyl and n-butyl. , isobutyl, sec-butyl, and tert-butyl groups.
- the number of rings possessed by the divalent cyclic aliphatic group is not particularly limited, it is preferably 1 or more, more preferably 2 or more. Moreover, 12 or less are preferable and 10 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 12 are preferred, 1 to 10 are more preferred, and 2 to 10 are even more preferred.
- the thickness is equal to or higher than the above lower limit, a strong film tends to be obtained, and substrate adhesion tends to be good.
- the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- divalent cyclic aliphatic groups include rings such as cyclohexane ring, cycloheptane ring, cyclodecane ring, cyclododecane ring, norbornane ring, isobornane ring, adamantane ring, cyclododecane ring, dicyclopentadiene, and dicyclopentane.
- a group obtained by removing two hydrogen atoms from is exemplified. From the viewpoint of rigidity of the skeleton, a group obtained by removing two hydrogen atoms from a dicyclopentadiene ring, a dicyclopentane ring, or an adamantane ring is preferable.
- substituents that the divalent aliphatic group may have include an alkoxy group having 1 to 5 carbon atoms such as a methoxy group and an ethoxy group; a hydroxyl group; a nitro group; a cyano group; and a carboxy group. From the viewpoint of ease of synthesis, it is preferably unsubstituted.
- Divalent aromatic ring groups include divalent aromatic hydrocarbon ring groups and divalent aromatic heterocyclic groups. Although the number of carbon atoms is not particularly limited, it is preferably 4 or more, more preferably 5 or more, and even more preferably 6 or more. Moreover, 20 or less are preferable, 15 or less are more preferable, and 10 or less are more preferable. The above upper and lower limits can be combined arbitrarily. For example, 4 to 20 are preferred, 5 to 15 are more preferred, and 6 to 10 are even more preferred. When the content is at least the above lower limit, a strong film can be easily obtained, surface roughness during development is unlikely to occur, and adhesion to the substrate tends to be good. When the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- the aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a monocyclic ring or a condensed ring.
- the divalent aromatic hydrocarbon ring group includes, for example, benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, perylene ring, tetracene ring, pyrene ring, benzpyrene ring, chrysene ring, which have two free valences, triphenylene ring, acenaphthene ring, fluoranthene ring, and fluorene ring.
- the aromatic heterocyclic ring in the divalent aromatic heterocyclic group may be a monocyclic ring or a condensed ring.
- divalent aromatic heterocyclic groups include furan ring, benzofuran ring, thiophene ring, benzothiophene ring, pyrrole ring, pyrazole ring, imidazole ring, oxadiazole ring, and indole ring having two free valences.
- substituents that the divalent aromatic ring group may have include a hydroxy group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. From the viewpoint of developing solubility, non-substitution is preferred.
- one or more of the above-mentioned divalent aliphatic groups and the above-mentioned divalent aromatic ring groups is linked to one or more.
- the number of divalent aliphatic groups is not particularly limited, it is preferably 1 or more, more preferably 2 or more, preferably 10 or less, more preferably 5 or less, and even more preferably 3 or less.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 10 are preferred, 1 to 5 are more preferred, 1 to 3 are even more preferred, and 2 to 3 are particularly preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, surface roughness during development is unlikely to occur, and adhesion to the substrate tends to be good.
- the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- the number of divalent aromatic ring groups is not particularly limited, it is preferably 1 or more, more preferably 2 or more, preferably 10 or less, more preferably 5 or less, and even more preferably 3 or less.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 10 are preferred, 1 to 5 are more preferred, 1 to 3 are even more preferred, and 2 to 3 are particularly preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, surface roughness during development is unlikely to occur, and adhesion to the substrate tends to be good.
- the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- Examples of groups in which one or more divalent aliphatic groups and one or more divalent aromatic ring groups are linked are represented by the following formulas (b1-IA) to (b1-IF).
- a group represented by the following formula (b1-IA) is preferable from the viewpoint of the rigidity of the skeleton and the hydrophobicity of the membrane.
- k represents 1 or 2.
- k is preferably 1 from the viewpoint of adhesion and patterning properties. From the viewpoint of NMP resistance, k is preferably 2.
- the benzene ring in formula (b1-I) may be further substituted with any substituent.
- substituents include, for example, hydroxy, methyl, methoxy, ethyl, ethoxy, propyl, and propoxy groups.
- the number of substituents is also not particularly limited, and may be one or two or more. From the viewpoint of patterning properties, it is preferably non-substituted.
- the partial structure represented by formula (b1-I) is preferably a partial structure represented by the following general formula (b1-I-1) from the viewpoint of ease of synthesis.
- R 11 , R 12 and k are the same as in formula (b1-I), R represents a hydrogen atom or a polybasic acid residue, and * represents a bond. .
- the benzene ring in formula (b1-I-1) may be further substituted with any substituent.
- a polybasic acid residue means a monovalent group obtained by removing one OH group from a polybasic acid.
- polybasic acids include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, and endomethylene. Tetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, biphenyltetracarboxylic acid.
- maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, and biphenyltetracarboxylic acid are preferred, and tetrahydrophthalic acid is more preferred.
- phthalic acid, biphenyltetracarboxylic acid, and biphenyltetracarboxylic acid are preferred.
- the benzene ring in formula (b1-I-1) may be further substituted with any substituent.
- substituent those mentioned for the benzene ring in formula (b1-I) can be preferably employed.
- the partial structure represented by the formula ( b1 -I-1) contained in one epoxy (meth)acrylate resin molecule may be one or two or more. Atoms and those in which R X is a polybasic acid residue may be mixed.
- the number of partial structures represented by formula (b1-I) contained in one molecule of epoxy (meth)acrylate resin is not particularly limited, but is preferably 1 or more, more preferably 3 or more. Moreover, 20 or less are preferable and 15 or less are more preferable. The above upper and lower limits can be combined arbitrarily. 1 to 20 are preferred, 1 to 15 are more preferred, and 3 to 15 are even more preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, and surface roughness during development tends to be less likely to occur.
- the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- the weight average molecular weight (Mw) of the epoxy (meth)acrylate resin measured by gel permeation chromatography (GPC) in terms of polystyrene is not particularly limited, but is preferably 1000 or more, more preferably 1500 or more. , more preferably 2000 or more, still more preferably 3000 or more, particularly preferably 4000 or more, most preferably 5000 or more, preferably 30000 or less, more preferably 20000 or less, and even more preferably 15000 or less.
- the above upper and lower limits can be combined arbitrarily. For example, 1,000 to 30,000 is preferred, 1,500 to 2,000 is more preferred, 1,500 to 15,000 is even more preferred, and 2,000 to 1,500 is even more preferred.
- the content is at least the above lower limit, there is a tendency that the residual film ratio of the photosensitive coloring composition is improved.
- the solubility in the developing solution tends to be improved by adjusting the content to the above upper limit or less.
- the acid value of (b1-I) the epoxy (meth)acrylate resin is not particularly limited, but is preferably 20 mgKOH/g or more, more preferably 40 mgKOH/g or more, still more preferably 60 mgKOH/g or more, and 80 mgKOH/g or more. More preferably, 100 mgKOH/g or more is particularly preferable. Also, it is preferably 200 mgKOH/g or less, more preferably 150 mgKOH/g or less, even more preferably 130 mgKOH/g or less, and particularly preferably 120 mgKOH/g or less. The above upper and lower limits can be combined arbitrarily.
- 20 mg KOH/g to 200 mg KOH/g is preferable, 60 mg KOH/g to 150 mg KOH/g is more preferable, 80 mg KOH/g to 130 mg KOH/g is still more preferable, and 100 mg KOH/g to 130 mg KOH/g is even more preferable.
- the amount is at least the above lower limit, there is a tendency that the development solubility is improved and the resolution is improved.
- the amount is equal to or less than the above upper limit, there is a tendency that the remaining film ratio of the photosensitive coloring composition is improved.
- R 13 each independently represents a hydrogen atom or a methyl group
- R 14 represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain
- R 15 and R 16 each independently represents a divalent aliphatic group which may have a substituent
- m and n each independently represent an integer of 0 to 2
- * represents a bond.
- R 14 represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain.
- the cyclic hydrocarbon group includes an aliphatic ring group or an aromatic ring group.
- the number of rings possessed by the aliphatic ring group is not particularly limited, it is preferably 1 or more, more preferably 2 or more. Moreover, 10 or less are preferable, 5 or less are more preferable, and 3 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 10 are preferred, 1 to 5 are more preferred, 1 to 3 are even more preferred, and 2 to 3 are particularly preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, and surface roughness during development tends to be less likely to occur.
- the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- the number of carbon atoms in the aliphatic ring group is not particularly limited, it is preferably 4 or more, more preferably 6 or more, and even more preferably 8 or more. Moreover, it is preferably 40 or less, more preferably 30 or less, still more preferably 20 or less, and particularly preferably 15 or less.
- the above upper and lower limits can be combined arbitrarily. For example, 4 to 40 are preferred, 4 to 30 are more preferred, 6 to 20 are even more preferred, and 8 to 15 are particularly preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, and surface roughness during development tends to be less likely to occur.
- the aliphatic ring in the aliphatic ring group include cyclohexane ring, cycloheptane ring, cyclodecane ring, cyclododecane ring, norbornane ring, isobornane ring, adamantane ring and cyclododecane ring.
- An adamantane ring is preferred from the viewpoint of the residual film ratio and resolution of the photosensitive coloring composition.
- the number of rings possessed by the aromatic ring group is not particularly limited, it is preferably 1 or more, more preferably 2 or more, and still more preferably 3 or more. Moreover, 10 or less are preferable, 5 or less are more preferable, and 4 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 10 are preferred, 1 to 5 are more preferred, 1 to 4 are even more preferred, 2 to 4 are even more preferred, and 3 to 4 are particularly preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, and surface roughness during development tends to be less likely to occur.
- Aromatic ring groups include aromatic hydrocarbon ring groups and aromatic heterocyclic groups. Although the number of carbon atoms in the aromatic ring group is not particularly limited, it is preferably 4 or more, more preferably 6 or more, still more preferably 8 or more, even more preferably 10 or more, and particularly preferably 12 or more. Moreover, it is preferably 40 or less, more preferably 30 or less, still more preferably 20 or less, and particularly preferably 15 or less. The above upper and lower limits can be combined arbitrarily.
- the content is at least the above lower limit, a strong film can be easily obtained, and surface roughness during development tends to be less likely to occur. Patterning characteristics tend to be good by setting the content to the above upper limit or less.
- the aromatic ring in the aromatic ring group includes, for example, benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, perylene ring, tetracene ring, pyrene ring, benzpyrene ring, chrysene ring, triphenylene ring, acenaphthene ring, fluoranthene ring, fluorene ring.
- a fluorene ring is preferred from the viewpoint of patterning properties.
- the divalent hydrocarbon group in the divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain is not particularly limited, and examples thereof include a divalent aliphatic group, a divalent aromatic ring group, one or more Examples thereof include groups in which a valent aliphatic group and one or more divalent aromatic ring groups are linked.
- the divalent aliphatic group includes linear, branched and cyclic aliphatic groups.
- a linear aliphatic group is preferred from the viewpoint of developing solubility, while a cyclic aliphatic group is preferred from the viewpoint of reducing permeation of the developer into the exposed area.
- the number of carbon atoms is not particularly limited, it is preferably 1 or more, more preferably 3 or more, and even more preferably 6 or more.
- 25 or less are preferable, 20 or less are more preferable, and 15 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 25 are preferred, 3 to 20 are more preferred, and 6 to 15 are even more preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, surface roughness during development is unlikely to occur, and adhesion to the substrate tends to be good.
- the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- divalent linear aliphatic groups examples include methylene group, ethylene group, n-propylene group, n-butylene group, n-pentylene group, n-hexylene group and n-heptylene group.
- a methylene group is preferred from the viewpoint of rigidity of the skeleton.
- the divalent branched aliphatic group includes, for example, the aforementioned divalent straight-chain aliphatic group, and side chains of methyl group, ethyl group, n-propyl group, isopropyl group and n-butyl group. , an isobutyl group, a sec-butyl group, and a structure having a tert-butyl group.
- the number of rings possessed by the divalent cyclic aliphatic group is not particularly limited, it is preferably 1 or more, more preferably 2 or more. Moreover, 10 or less are preferable, 5 or less are more preferable, and 3 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 10 are preferred, 1 to 5 are more preferred, 1 to 3 are even more preferred, and 2 to 3 are particularly preferred.
- the thickness is equal to or higher than the above lower limit, a strong film tends to be obtained, and substrate adhesion tends to be good. Further, when the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- the divalent cyclic aliphatic group includes, for example, a group obtained by removing two hydrogen atoms from a cyclohexane ring, cycloheptane ring, cyclodecane ring, cyclododecane ring, norbornane ring, isobornane ring, adamantane ring, or cyclododecane ring. is mentioned. From the viewpoint of skeleton rigidity, a group obtained by removing two hydrogen atoms from an adamantane ring is preferable.
- substituents that the divalent aliphatic group may have include an alkoxy group having 1 to 5 carbon atoms such as a methoxy group and an ethoxy group; a hydroxyl group; a nitro group; a cyano group; and a carboxy group. From the viewpoint of ease of synthesis, it is preferably unsubstituted.
- Divalent aromatic ring groups include divalent aromatic hydrocarbon ring groups and divalent aromatic heterocyclic groups. Although the number of carbon atoms is not particularly limited, it is preferably 4 or more, more preferably 5 or more, and even more preferably 6 or more. Moreover, 30 or less are preferable, 20 or less are more preferable, and 15 or less are more preferable. The above upper and lower limits can be combined arbitrarily. For example, 4 to 30 are preferred, 5 to 20 are more preferred, and 6 to 15 are even more preferred. When the content is at least the above lower limit, a strong film can be easily obtained, surface roughness during development is unlikely to occur, and adhesion to the substrate tends to be good. When the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- the aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a monocyclic ring or a condensed ring.
- the divalent aromatic hydrocarbon ring group includes, for example, benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, perylene ring, tetracene ring, pyrene ring, benzpyrene ring, chrysene ring, which have two free valences, triphenylene ring, acenaphthene ring, fluoranthene ring, and fluorene ring.
- the aromatic heterocyclic ring in the divalent aromatic heterocyclic group may be a monocyclic ring or a condensed ring.
- divalent aromatic heterocyclic groups include furan ring, benzofuran ring, thiophene ring, benzothiophene ring, pyrrole ring, pyrazole ring, imidazole ring, oxadiazole ring, and indole ring having two free valences.
- substituents that the divalent aromatic ring group may have include a hydroxy group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. From the viewpoint of developing solubility, non-substitution is preferred.
- one or more of the above-mentioned divalent aliphatic groups and the above-mentioned divalent aromatic ring groups is linked to one or more.
- the number of divalent aliphatic groups is not particularly limited, it is preferably 1 or more, more preferably 2 or more, preferably 10 or less, more preferably 5 or less, and even more preferably 3 or less.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 10 are preferred, 1 to 5 are more preferred, 1 to 3 are even more preferred, and 2 to 3 are particularly preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, surface roughness during development is unlikely to occur, and adhesion to the substrate tends to be good.
- the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- the number of divalent aromatic ring groups is not particularly limited, it is preferably 1 or more, more preferably 2 or more, preferably 10 or less, more preferably 5 or less, and even more preferably 3 or less.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 10 are preferred, 1 to 5 are more preferred, 1 to 3 are even more preferred, and 2 to 3 are particularly preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, surface roughness during development is unlikely to occur, and adhesion to the substrate tends to be good.
- the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- Examples of groups in which one or more divalent aliphatic groups and one or more divalent aromatic ring groups are linked include, for example, the aforementioned formulas (b1-IA) to (b1-IF). and the group to be carried out.
- a group represented by the formula (b1-IC) is preferable from the viewpoint of the rigidity of the skeleton and the hydrophobicity of the membrane.
- the mode of bonding of the side chain cyclic hydrocarbon group to these divalent hydrocarbon groups is not particularly limited. Examples include a mode in which it is substituted with a hydrocarbon group, and a mode in which a cyclic hydrocarbon group, which is a side chain, is formed by including one of the carbon atoms of the aliphatic group.
- R 15 and R 16 each independently represent an optionally substituted divalent aliphatic group.
- the divalent aliphatic group includes linear, branched and cyclic aliphatic groups.
- a linear aliphatic group is preferred from the viewpoint of developing solubility, while a cyclic aliphatic group is preferred from the viewpoint of reducing permeation of the developer into the exposed area.
- the number of carbon atoms is not particularly limited, it is preferably 1 or more, more preferably 3 or more, and even more preferably 6 or more.
- 20 or less are preferable, 15 or less are more preferable, and 10 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 20 are preferred, 3 to 15 are more preferred, and 6 to 10 are even more preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, surface roughness during development is unlikely to occur, and adhesion to the substrate tends to be good.
- the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- divalent linear aliphatic groups examples include methylene group, ethylene group, n-propylene group, n-butylene group, n-pentylene group, n-hexylene group and n-heptylene group.
- a methylene group is preferred from the viewpoint of rigidity of the skeleton.
- the divalent branched aliphatic group includes the divalent linear aliphatic group described above, and side chains such as methyl, ethyl, n-propyl, isopropyl and n-butyl. , isobutyl, sec-butyl, and tert-butyl groups.
- the number of rings possessed by the divalent cyclic aliphatic group is not particularly limited, it is preferably 1 or more, more preferably 2 or more. Moreover, 12 or less are preferable and 10 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 12 are preferred, and 2 to 10 are more preferred.
- the thickness is equal to or higher than the above lower limit, a strong film tends to be obtained, and substrate adhesion tends to be good.
- the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- the divalent cyclic aliphatic group includes, for example, two hydrogen atoms from a cyclohexane ring, cycloheptane ring, cyclodecane ring, cyclododecane ring, norbornane ring, isobornane ring, adamantane ring, cyclododecane ring, and dicyclopentadiene ring.
- groups obtained by dividing From the viewpoint of rigidity of the skeleton a group obtained by removing two hydrogen atoms from a dicyclopentadiene ring or an adamantane ring is preferable.
- substituents that the divalent aliphatic group may have include an alkoxy group having 1 to 5 carbon atoms such as a methoxy group and an ethoxy group; a hydroxyl group; a nitro group; a cyano group; and a carboxy group. From the viewpoint of ease of synthesis, it is preferably unsubstituted.
- m and n each independently represent an integer of 0-2.
- the patterning suitability tends to be good, and surface roughness during development tends to be less likely to occur.
- m and n are preferably 0. It is preferable that m and n are 1 or more from the viewpoint of patterning suitability and suppression of surface roughness that occurs during development.
- the partial structure represented by formula (b1-II) is preferably a partial structure represented by the following general formula (b1-II-1) from the viewpoint of adhesion to the substrate.
- R 13 , R 15 , R 16 , m and n are the same as in formula (b1-II), R ⁇ is a monovalent represents a cyclic hydrocarbon group, p represents an integer of 1 or more, and * represents a bond.
- the benzene ring in formula (b1-II-1) may be further substituted with any substituent.
- R ⁇ represents a monovalent cyclic hydrocarbon group which may have a substituent.
- the cyclic hydrocarbon group includes an aliphatic ring group or an aromatic ring group.
- the number of rings possessed by the aliphatic ring group is not particularly limited, it is preferably 1 or more, more preferably 2 or more. Moreover, 6 or less are preferable, 4 or less are more preferable, and 3 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 6 are preferred, 1 to 4 are more preferred, 1 to 3 are even more preferred, and 2 to 3 are particularly preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, and surface roughness during development tends to be less likely to occur. Patterning characteristics tend to be good by setting the content to the above upper limit or less.
- the number of carbon atoms in the aliphatic ring group is not particularly limited, it is preferably 4 or more, more preferably 6 or more, and even more preferably 8 or more. Moreover, it is preferably 40 or less, more preferably 30 or less, still more preferably 20 or less, and particularly preferably 15 or less.
- the above upper and lower limits can be combined arbitrarily. For example, 4 to 40 are preferred, 4 to 30 are more preferred, 6 to 20 are even more preferred, and 8 to 15 are particularly preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, and surface roughness during development tends to be less likely to occur. Patterning characteristics tend to be good by setting the content to the above upper limit or less.
- Examples of the aliphatic ring in the aliphatic ring group include cyclohexane ring, cycloheptane ring, cyclodecane ring, cyclododecane ring, norbornane ring, isobornane ring, adamantane ring and cyclododecane ring.
- An adamantane ring is preferred from the viewpoint of strong film properties.
- the number of rings possessed by the aromatic ring group is not particularly limited, it is preferably 1 or more, preferably 2 or more, and more preferably 3 or more. Moreover, 10 or less are preferable and 5 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 10 are preferred, 1 to 5 are more preferred, 2 to 5 are even more preferred, and 3 to 5 are particularly preferred.
- Aromatic ring groups include aromatic hydrocarbon ring groups and aromatic heterocyclic groups.
- the number of carbon atoms in the aromatic ring group is not particularly limited, but is preferably 4 or more, more preferably 5 or more, and even more preferably 6 or more. Moreover, 30 or less are preferable, 20 or less are more preferable, and 15 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 4 to 30 are preferred, 5 to 20 are more preferred, and 6 to 15 are even more preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, and surface roughness during development tends to be less likely to occur. Patterning characteristics tend to be good by setting the content to the above upper limit or less.
- aromatic ring in the aromatic ring group examples include benzene ring, naphthalene ring, anthracene ring, phenanthrene ring and fluorene ring.
- a fluorene ring is preferable from the viewpoint of developing solubility.
- Substituents that the cyclic hydrocarbon group may have include, for example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, amyl group, Alkyl groups having 1 to 5 carbon atoms such as isoamyl groups; alkoxy groups having 1 to 5 carbon atoms such as methoxy groups and ethoxy groups; hydroxyl groups; nitro groups; cyano groups; Unsubstituted is preferred from the viewpoint of ease of synthesis.
- p represents an integer of 1 or more, preferably 2 or more. Moreover, 3 or less are preferable. For example, 1 to 3 are preferred, and 2 to 3 are more preferred.
- the content is equal to or higher than the above lower limit, there is a tendency that the film hardening degree and the residual film ratio are improved. Developability tends to be improved by adjusting the content to be equal to or less than the above upper limit.
- R ⁇ is preferably a monovalent aliphatic cyclic group, more preferably an adamantyl group.
- the benzene ring in formula (b1-II-1) may be further substituted with any substituent.
- Substituents include, for example, hydroxy, methyl, methoxy, ethyl, ethoxy, propyl, and propoxy groups.
- the number of substituents is also not particularly limited, and may be one or two or more. From the viewpoint of patterning properties, it is preferably non-substituted.
- the partial structure represented by formula (b1-II) is preferably a partial structure represented by the following general formula (b1-II-2) from the viewpoint of rigidity of the skeleton and membrane hydrophobicity.
- R 13 , R 15 , R 16 , m and n are as defined in formula (b1-II), and R ⁇ is a divalent optionally substituted represents a cyclic hydrocarbon group, and * represents a bond.
- the benzene ring in formula (b1-II-2) may be further substituted with any substituent.
- R ⁇ represents an optionally substituted divalent cyclic hydrocarbon group.
- the cyclic hydrocarbon group includes an aliphatic ring group or an aromatic ring group.
- the number of rings possessed by the aliphatic ring group is not particularly limited, it is preferably 1 or more, more preferably 2 or more. Moreover, 10 or less are preferable and 5 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 10 are preferred, and 2 to 5 are more preferred.
- the content is at least the above lower limit, a strong film tends to be obtained, and surface roughness during development tends to be less likely to occur.
- the content is equal to or less than the above upper limit, it is easy to suppress the deterioration of sensitivity and film reduction during development, and the resolution tends to be improved.
- the number of carbon atoms in the aliphatic ring group is preferably 4 or more, more preferably 6 or more, and even more preferably 8 or more. Moreover, 40 or less are preferable, 35 or less are more preferable, and 30 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 4 to 40 are preferred, 6 to 35 are more preferred, and 8 to 30 are even more preferred.
- Examples of the aliphatic ring in the aliphatic ring group include cyclohexane ring, cycloheptane ring, cyclodecane ring, cyclododecane ring, norbornane ring, isobornane ring, adamantane ring and cyclododecane ring.
- An adamantane ring is preferred from the viewpoint of film reduction during development and resolution.
- the number of rings possessed by the aromatic ring group is not particularly limited, it is preferably 1 or more, more preferably 2 or more, and still more preferably 3 or more. Moreover, 10 or less are preferable and 5 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 10 are preferred, 1 to 5 are more preferred, 2 to 5 are even more preferred, and 3 to 5 are particularly preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, and surface roughness during development tends to be less likely to occur.
- the content is equal to or less than the above upper limit, deterioration of sensitivity and film reduction can be easily suppressed, and resolution tends to be improved.
- Aromatic ring groups include aromatic hydrocarbon ring groups and aromatic heterocyclic groups.
- the number of carbon atoms in the aromatic ring group is preferably 4 or more, more preferably 6 or more, still more preferably 8 or more, and even more preferably 10 or more.
- it is preferably 40 or less, more preferably 30 or less, still more preferably 20 or less, and particularly preferably 15 or less.
- the above upper and lower limits can be combined arbitrarily. For example, 4 to 40 are preferred, 6 to 30 are more preferred, 8 to 20 are even more preferred, and 10 to 15 are particularly preferred.
- the content is at least the above lower limit, a strong film tends to be obtained, and surface roughness during development tends to be less likely to occur.
- the aromatic ring in the aromatic ring group include benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, and fluorene ring.
- a fluorene ring is preferred from the viewpoint of developability.
- Substituents that the cyclic hydrocarbon group may have include, for example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, amyl group, Alkyl groups having 1 to 5 carbon atoms such as isoamyl groups; alkoxy groups having 1 to 5 carbon atoms such as methoxy groups and ethoxy groups; hydroxyl groups; nitro groups; cyano groups; Unsubstituted is preferred from the viewpoint of ease of synthesis.
- R ⁇ is preferably a divalent aliphatic cyclic group, more preferably a divalent adamantane cyclic group.
- R ⁇ is preferably a divalent aromatic ring group, more preferably a divalent fluorene ring group.
- the benzene ring in formula (b1-II-2) may be further substituted with any substituent.
- substituents include, for example, hydroxy, methyl, methoxy, ethyl, ethoxy, propyl, and propoxy groups.
- the number of substituents is also not particularly limited, and may be one or two or more.
- the two benzene rings in formula (b1-II-2), which are linked via R ⁇ may be further linked via a substituent to form a tricyclic structure.
- Substituents in this case include divalent groups such as —O—, —S—, —NH—, and —CH 2 —.
- connecting via -O- to form a tricyclic structure means that the carbon atoms at the ortho position to the carbon atom bonded to R ⁇ on each benzene ring are connected via -O-, It means to form a xanthene skeleton. From the viewpoint of patterning properties, it is preferably non-substituted. Moreover, from the viewpoint of making it difficult to cause film reduction, etc., substitution with a methyl group is preferable.
- the partial structure represented by formula (b1-II) is preferably a partial structure represented by the following general formula (b1-II-3) from the viewpoint of the coating film retention rate and patterning properties.
- R 13 , R 14 , R 15 , R 16 , m and n are the same as in formula (b1-II), and R Z is a hydrogen atom or a polybasic acid residue. show.
- a polybasic acid residue means a monovalent group obtained by removing one OH group from a polybasic acid. Further, another OH group may be removed and shared with R Z in another molecule represented by formula (b1-II-3). In other words, multiple formulas (b1-II-3) may be linked via R Z .
- polybasic acids include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, and endomethylene.
- Tetrahydrophthalic acid chlorendic acid, methyltetrahydrophthalic acid, biphenyltetracarboxylic acid.
- maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, and biphenyltetracarboxylic acid are preferred, and tetrahydrophthalic acid is more preferred.
- phthalic acid, biphenyltetracarboxylic acid, and biphenyltetracarboxylic acid are preferred.
- the partial structure represented by the formula ( b1 -II-3) contained in one epoxy (meth)acrylate resin molecule may be one or two or more. Atoms and those in which R Z is a polybasic acid residue may be mixed.
- the number of partial structures represented by formula (b1-II) contained in one molecule of epoxy (meth)acrylate resin is not particularly limited, but is preferably 1 or more, more preferably 3 or more. Moreover, 20 or less are preferable, 15 or less are more preferable, and 10 or less are more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 20 are preferred, 1 to 15 are more preferred, and 3 to 10 are even more preferred.
- the content is at least the above lower limit, a strong film can be easily obtained, and surface roughness during development tends to be less likely to occur.
- the content is equal to or less than the above upper limit, deterioration of sensitivity and film reduction can be easily suppressed, and resolution tends to be improved.
- the polystyrene-equivalent weight average molecular weight (Mw) measured by gel permeation chromatography (GPC) of the epoxy (meth)acrylate resin is not particularly limited, but is preferably 1000 or more, more preferably 1500 or more. , is more preferably 2000 or more, even more preferably 3000 or more, even more preferably 4000 or more, and particularly preferably 5000 or more. Moreover, it is preferably 10,000 or less, more preferably 8,000 or less, and even more preferably 7,000 or less. The above upper and lower limits can be combined arbitrarily.
- 1,000 to 10,000 is preferred, 1,500 to 10,000 is more preferred, 1,500 to 8,000 is still more preferred, 2,000 to 8,000 is even more preferred, and 2,000 to 7,000 is particularly preferred.
- the content is at least the above lower limit, there is a tendency that the residual film ratio of the photosensitive coloring composition is improved.
- the solubility in the developing solution tends to be improved by adjusting the content to the above upper limit or less.
- the acid value of the epoxy (meth)acrylate resin is not particularly limited, but is preferably 20 mgKOH/g or more, more preferably 40 mgKOH/g or more, still more preferably 60 mgKOH/g or more, and more preferably 80 mgKOH/g or more. More preferably, 100 mgKOH/g or more is particularly preferable. Also, it is preferably 200 mgKOH/g or less, more preferably 150 mgKOH/g or less, even more preferably 130 mgKOH/g or less, and particularly preferably 120 mgKOH/g or less. The above upper and lower limits can be combined arbitrarily.
- 20 mg KOH/g to 200 mg KOH/g is preferable, 60 mg KOH/g to 150 mg KOH/g is more preferable, 80 mg KOH/g to 130 mg KOH/g is still more preferable, and 100 mg KOH/g to 130 mg KOH/g is even more preferable.
- the amount is at least the above lower limit, there is a tendency that the development solubility is improved and the resolution is improved.
- the amount is equal to or less than the above upper limit, there is a tendency that the remaining film ratio of the photosensitive coloring composition is improved.
- a carboxy group-containing epoxy (meth)acrylate resin may be used alone, or two or more resins may be used in combination. Also, a part of the carboxy group-containing epoxy (meth)acrylate resin may be replaced with another binder resin. That is, a carboxy group-containing epoxy (meth)acrylate resin and another binder resin may be used in combination.
- the ratio of the carboxy group-containing epoxy (meth)acrylate resin in the (b) alkali-soluble resin is preferably 50% by mass or more, more preferably 60% by mass or more, and 70% by mass or more. More preferably, it is more preferably 80% by mass or more, and may be 100% by mass or less.
- (b) alkali-soluble resin from the viewpoint of compatibility with pigments, dispersants, etc., it is preferable to use (b2) an acrylic copolymer resin, and those described in Japanese Patent Application Laid-Open No. 2014-137466 are preferably used. be able to.
- the acrylic copolymer resin includes, for example, an ethylenically unsaturated monomer having one or more carboxyl groups (hereinafter referred to as “unsaturated monomer (b2-1)”) and other copolymers. Possible copolymers with ethylenically unsaturated monomers (hereinafter referred to as “unsaturated monomer (b2-2)”) can be mentioned.
- unsaturated monomers (b2-1) include unsaturated monocarboxylic acids such as (meth)acrylic acid, crotonic acid, ⁇ -chloroacrylic acid, and cinnamic acid; maleic acid, maleic anhydride, and fumaric acid; , citraconic acid, citraconic anhydride, mesaconic acid and other unsaturated dicarboxylic acids or their anhydrides; mono[2-(meth)acryloyloxyethyl] succinate, mono[2-(meth)acryloyloxyethyl] phthalate Mono [(meth)acryloyloxyalkyl] esters of polyvalent carboxylic acids with a valence of 2 or more such as; ) acrylates; p-vinylbenzoic acid. These unsaturated monomers (b2-1) can be used alone or in combination of two or more.
- unsaturated monomers (b2-1) can be used alone or in combination of two or more.
- unsaturated monomers (b2-2) examples include N-substituted maleimides such as N-phenylmaleimide and N-cyclohexylmaleimide; aromatic vinyl compounds such as styrene, ⁇ -methylstyrene, p-hydroxystyrene, p-hydroxy- ⁇ -methylstyrene, p-vinylbenzyl glycidyl ether, acenaphthylene;
- Vinyl ethers such as cyclohexyl vinyl ether, isobornyl vinyl ether, tricyclo[5.2.1.0 2,6 ]decan-8-yl vinyl ether, pentacyclopentadecanyl vinyl ether, 3-(vinyloxymethyl)-3-ethyloxetane ; Macromonomers having a mono(meth)acryloyl group at the end of a polymer molecular chain such as polystyrene, polymethyl(meth)acrylate, poly-n-butyl(meth)acrylate and polysiloxane can be mentioned. These unsaturated monomers (b2-2) can be used alone or in combination of two or more.
- the copolymerization ratio of the unsaturated monomer (b2-1) is preferably 5 to 50% by mass. , more preferably 10 to 40% by mass.
- Examples of the copolymer of the unsaturated monomer (b2-1) and the unsaturated monomer (b2-2) include, for example, JP-A-7-140654, JP-A-8-259876, Japanese Unexamined Patent Publication No. 10-31308, Japanese Unexamined Patent Publication No. 10-300922, Japanese Unexamined Patent Publication No. 11-174224, Japanese Unexamined Patent Publication No. 11-258415, Japanese Unexamined Patent Publication No. 2000-56118, Copolymers disclosed in Japanese Patent Application Laid-Open No. 2004-101728 can be mentioned.
- a copolymer of the unsaturated monomer (b2-1) and the unsaturated monomer (b2-2) can be produced by a known method.
- the structure, Mw, and Mw/Mn (Mn is the number average molecular weight) can also be controlled by the methods disclosed in Japanese Patent Application Laid-Open No. 2006-259680 and International Publication No. 2007/029871. .
- the photopolymerization initiator is a component that has the function of directly absorbing light, causing a decomposition reaction or a hydrogen abstraction reaction, and generating polymerization active radicals. Additives such as polymerization accelerators (chain transfer agents) and sensitizing dyes may be added as necessary. Examples of photopolymerization initiators include metallocene compounds including titanocene compounds described in JP-A-59-152396 and JP-A-61-151197; JP-A-2000-56118.
- metallocene compounds include dicyclopentadienyl titanium dichloride, dicyclopentadienyl titanium bisphenyl, dicyclopentadienyl titanium bis(2,3,4,5,6-pentafluorophenyl), dicyclopenta Dienyl titanium bis(2,3,5,6-tetrafluorophenyl), dicyclopentadienyl titanium bis(2,4,6-trifluorophenyl), dicyclopentadienyl titanium di(2,6-difluoro phenyl), dicyclopentadienyl titanium di(2,4-difluorophenyl), di(methylcyclopentadienyl) titanium bis(2,3,4,5,6-pentafluorophenyl), di(methylcyclopenta dienyl) titanium bis(2,6-difluorophenyl), dicyclopentadienyl titanium [2,6-di-fluoro-3-(pyro-1-yl)phenyl
- hexaarylbiimidazole derivatives examples include 2-(2'-chlorophenyl)-4,5-diphenylimidazole dimer, 2-(2'-chlorophenyl)-4,5-bis(3'-methoxyphenyl ) imidazole dimer, 2-(2′-fluorophenyl)-4,5-diphenylimidazole dimer, 2-(2′-methoxyphenyl)-4,5-diphenylimidazole dimer, (4′- methoxyphenyl)-4,5-diphenylimidazole dimer.
- halomethylated oxadiazole derivatives examples include 2-trichloromethyl-5-(2'-benzofuryl)-1,3,4-oxadiazole, 2-trichloromethyl-5-[ ⁇ -(2'- benzofuryl)vinyl]-1,3,4-oxadiazole, 2-trichloromethyl-5-[ ⁇ -(2′-(6′′-benzofuryl)vinyl)]-1,3,4-oxadiazole, 2-trichloromethyl-5-furyl-1,3,4-oxadiazole.
- halomethyl-s-triazine derivatives examples include 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphthyl)-4,6-bis( trichloromethyl)-s-triazine, 2-(4-ethoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-ethoxycarbonylnaphthyl)-4,6-bis(trichloromethyl) -s-triazines.
- Examples of ⁇ -aminoalkylphenone derivatives include 2-methyl-1[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4- morpholinophenyl)-butanone-1,2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, 2-dimethylamino-2-(4-methylbenzyl)-1-( 4-morpholinophenyl)butan-1-one, 3,6-bis(2-methyl-2-morpholinopropionyl)-9-octylcarbazole.
- an oxime ester compound is particularly effective in terms of sensitivity and plate-making properties. compounds are useful. Oxime ester compounds have a structure that absorbs ultraviolet rays, a structure that transmits light energy, and a structure that generates radicals, so they are highly sensitive even in small amounts and are stable against thermal reactions. and it is possible to obtain a highly sensitive photosensitive coloring composition in a small amount.
- oxime ester compounds include compounds represented by the following general formula (IV).
- R 21a represents a hydrogen atom, an optionally substituted alkyl group, or an optionally substituted aromatic ring group.
- R 21b represents any substituent containing an aromatic ring.
- R 22a represents an optionally substituted alkanoyl group or an optionally substituted aryloyl group.
- n represents an integer of 0 or 1;
- the number of carbon atoms in the alkyl group in R 21a is not particularly limited, but from the viewpoint of solubility in solvents and sensitivity, it is preferably 1 or more, more preferably 2 or more, and preferably 20 or less, more preferably 15 or less, and 10. More preferred are:
- alkyl groups include methyl, ethyl, propyl, and cyclopentylethyl groups.
- alkyl group may have include an aromatic ring group, a hydroxyl group, a carboxy group, a halogen atom, an amino group, an amide group, 4-(2-methoxy-1-methyl)ethoxy-2- Examples include a methylphenyl group and an N-acetyl-N-acetoxyamino group. From the viewpoint of ease of synthesis, it is preferably unsubstituted.
- the aromatic ring group for R 21a includes aromatic hydrocarbon ring groups and aromatic heterocyclic groups.
- the number of carbon atoms in the aromatic ring group is not particularly limited, it is preferably 5 or more from the viewpoint of solubility in the photosensitive coloring composition. From the viewpoint of developability, it is preferably 30 or less, more preferably 20 or less, and even more preferably 12 or less. For example, 5-30 is preferred, 5-20 is more preferred, and 5-12 is even more preferred.
- aromatic ring groups include phenyl, naphthyl, pyridyl, and furyl groups. From the viewpoint of developability, a phenyl group or a naphthyl group is preferred, and a phenyl group is more preferred.
- substituents that the aromatic ring group may have include hydroxyl groups, carboxyl groups, halogen atoms, amino groups, amido groups, alkyl groups, alkoxy groups, and groups in which these substituents are linked. From the viewpoint of developability, an alkyl group, an alkoxy group, or a group in which these are linked is preferable, and a linked alkoxy group is more preferable. From the viewpoint of developability, R 21a is preferably an optionally substituted aromatic ring group, more preferably an aromatic ring group having a linked alkoxy group as a substituent.
- R 21b is an optionally substituted carbazolyl group, an optionally substituted thioxanthonyl group, an optionally substituted diphenyl sulfide group, an optionally substituted fluorenyl group or an optionally substituted indolyl group is mentioned. From the viewpoint of sensitivity, an optionally substituted carbazolyl group is preferred. From the viewpoint of electrical reliability, an optionally substituted diphenyl sulfide group is preferred.
- the number of carbon atoms in the alkanoyl group in R 22a is not particularly limited, but from the viewpoint of solubility in solvents and sensitivity, it is preferably 2 or more, preferably 20 or less, more preferably 15 or less, further preferably 10 or less, and 5 The following are particularly preferred.
- alkanoyl groups include acetyl, propanoyl and butanoyl groups.
- substituents that the alkanoyl group may have include an aromatic ring group, a hydroxyl group, a carboxy group, a halogen atom, an amino group, and an amide group. From the viewpoint of ease of synthesis, it is preferably unsubstituted.
- the number of carbon atoms in the aryloyl group in R 22a is not particularly limited, but from the viewpoint of solubility in solvents and sensitivity, it is preferably 7 or more, more preferably 8 or more, and preferably 20 or less, more preferably 15 or less, and 10. More preferred are:
- the aryloyl group includes a benzoyl group and a naphthoyl group. Examples of substituents that the aryloyl group may have include a hydroxyl group, a carboxy group, a halogen atom, an amino group, an amide group, and an alkyl group. From the viewpoint of ease of synthesis, it is preferably unsubstituted. From the viewpoint of sensitivity, R 22a is preferably an optionally substituted alkanoyl group, more preferably an unsubstituted alkanoyl group, and even more preferably an acetyl group.
- the initiator described in Japanese Patent Application Laid-Open No. 2016-133574 can also be preferably used from the viewpoint of reducing contamination by the coloring agent.
- a photoinitiator may be used individually by 1 type, or may use 2 or more types together.
- the photopolymerization initiator can be blended with a sensitizing dye and a polymerization accelerator depending on the wavelength of the image exposure light source, if necessary.
- sensitizing dyes include the xanthene dyes described in JP-A-4-221958 and JP-A-4-219756, JP-A-3-239703 and JP-A-5-289335.
- an amino group-containing sensitizing dye is preferable, and a compound having an amino group and a phenyl group in the same molecule is more preferable.
- 4,4′-dimethylaminobenzophenone, 4,4′-diethylaminobenzophenone, 2-aminobenzophenone, 4-aminobenzophenone, 4,4′-diaminobenzophenone, 3,3′-diaminobenzophenone, 3,4-diamino Benzophenone compounds such as benzophenone; 2-(p-dimethylaminophenyl)benzoxazole, 2-(p-diethylaminophenyl)benzoxazole, 2-(p-dimethylaminophenyl)benzo[4,5]benzoxazole, 2- (p-dimethylaminophenyl)benzo[6,7]benzoxazole, 2,5-bis(p-diethylaminophenyl)-1
- polymerization accelerator examples include aromatic amines such as ethyl p-dimethylaminobenzoate and 2-dimethylaminoethyl benzoate, aliphatic amines such as n-butylamine and N-methyldiethanolamine, and mercapto compounds described later. .
- aromatic amines such as ethyl p-dimethylaminobenzoate and 2-dimethylaminoethyl benzoate
- aliphatic amines such as n-butylamine and N-methyldiethanolamine
- mercapto compounds described later examples include mercapto compounds described later.
- the polymerization accelerator may be used alone or in combination of two or more.
- the photosensitive coloring composition of the present invention contains (d) an ethylenically unsaturated compound.
- Sensitivity is improved by including an ethylenically unsaturated compound.
- the (d) ethylenically unsaturated compound used in the present invention is a compound having at least one ethylenically unsaturated group in the molecule. Specific examples include (meth)acrylic acid, (meth)acrylic acid alkyl esters, acrylonitrile, styrene, carboxylic acids having one ethylenically unsaturated bond, and monoesters of polyhydric or monohydric alcohols.
- polyfunctional ethylenic monomers having two or more ethylenically unsaturated groups in one molecule.
- the number of ethylenically unsaturated groups possessed by the polyfunctional ethylenic monomer is not particularly limited, but is preferably 2 or more, more preferably 4 or more, further preferably 5 or more, and preferably 8 or less, 7 or less is more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 2 to 8 are preferred, 2 to 7 are more preferred, 4 to 7 are even more preferred, and 5 to 7 are particularly preferred. By making it more than the said lower limit, there exists a tendency which becomes high sensitivity.
- polyfunctional ethylenic monomers include esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids; esters of aromatic polyhydroxy compounds and unsaturated carboxylic acids; aliphatic polyhydroxy compounds, aromatic polyhydroxy an ester obtained by an esterification reaction between a polyhydric hydroxy compound such as a compound and an unsaturated carboxylic acid or a polybasic carboxylic acid;
- esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids include ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate, trimethylol ethane triacrylate, pentaerythritol diacrylate, and pentaerythritol triacrylate.
- pentaerythritol tetraacrylate dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, glycerol acrylate, and other aliphatic polyhydroxy compounds
- methacrylic acid esters obtained by replacing these acrylates with methacrylates
- Maleic acid esters in which these acrylates are replaced by maleates
- Esters of aromatic polyhydroxy compounds and unsaturated carboxylic acids include acrylic acid esters and methacryl esters of aromatic polyhydroxy compounds such as hydroquinone diacrylate, hydroquinone dimethacrylate, resorcin diacrylate, resorcin dimethacrylate, and pyrogallol triacrylate. acid esters.
- Esters obtained by the esterification reaction of polybasic carboxylic acids and unsaturated carboxylic acids and polyhydroxy compounds are not necessarily single substances, but for example, acrylic acid, phthalic acid, and ethylene glycol condensates, Condensates of acrylic acid, maleic acid and diethylene glycol, condensates of methacrylic acid, terephthalic acid and pentaerythritol, condensates of acrylic acid, adipic acid, butanediol and glycerin.
- polyfunctional ethylenic monomer used in the present invention for example, a polyisocyanate compound and a hydroxyl group-containing (meth)acrylic acid ester or a polyisocyanate compound, a polyol and a hydroxyl group-containing (meth)acrylic acid ester are reacted.
- Urethane (meth)acrylates such as those obtained; epoxy acrylates such as addition reaction products of polyepoxy compounds and hydroxy (meth) acrylate or (meth) acrylic acid; acrylamides such as ethylenebisacrylamide; diallyl phthalate and vinyl group-containing compounds such as divinyl phthalate.
- Urethane (meth)acrylates include, for example, DPHA-40H, UX-5000, UX-5002D-P20, UX-5003D, UX-5005 (manufactured by Nippon Kayaku Co., Ltd.), U-2PPA, U-6LPA, U- 10PA, U-33H, UA-53H, UA-32P, UA-1100H (manufactured by Shin-Nakamura Chemical Co., Ltd.), UA-306H, UA-510H, UF-8001G (manufactured by Kyoeisha Chemical Co., Ltd.), UV-1700B, UV- 7600B, UV-7605B, UV-7630B, and UV7640B (manufactured by Mitsubishi Chemical Corporation).
- the (d) ethylenically unsaturated compound is a (meth)acrylic acid alkyl ester, a polyisocyanate compound and a hydroxyl group-containing (meth)acrylic acid ester, or a polyisocyanate compound, a polyol, and a hydroxyl group-containing (meth)acrylic acid ester.
- urethane (meth)acrylates obtained by reacting the above, and it is more preferable to use a polyisocyanate compound and a hydroxyl group-containing (meth)acrylic acid ester. These may be used individually by 1 type, and may use 2 or more types together.
- the photosensitive coloring composition of the present invention contains (e) a nitrogen-containing aromatic compound.
- Nitrogen-containing aromatic compounds are presumed to have the effect of protecting metals from corrosive gas components by coordinating with metals such as silver. By adding it to the photosensitive coloring composition, it sublimates from the coating film in the heating and baking process of the partition wall and protects the metal used as the anode material, thereby preventing structural deformation of the electrode that leads to poor lighting of the panel. It is considered to suppress (e) the nitrogen-containing aromatic compound in the photosensitive coloring composition of the first aspect of the present invention includes compounds represented by the following general formula (1) and/or the following general formula (2).
- R 1 represents an alkyl group, a carboxy group, or a nitro group
- R 2 represents a hydroxyl group or a hydrogen atom
- l is an integer of 0 to 4 represents
- alkyl group for R 1 examples include, but are not limited to, methyl group, ethyl group, propyl group, and isopropyl group.
- R 1 is preferably a methyl group.
- R 2 is preferably a hydrogen atom.
- l is preferably 0 to 1, and more preferably 0, that is, no substitution.
- Examples of compounds represented by formula (1) include benzotriazole, 5-methyl-1H-benzotriazole, benzimidazole, 5-methylbenzimidazole, 1-hydroxybenzotriazole, 4-nitrobenzotriazole, 5-nitro Benzotriazoles are included. Benzotriazole is preferred from the viewpoint of surface roughening.
- R 3 and R 4 each independently represent an alkyl group, and m and n each independently represent an integer of 0-4.
- R 3 and R 4 are not particularly limited as long as they are alkyl groups, and examples thereof include methyl group, ethyl group, propyl group and isopropyl group.
- a methyl group is preferable from the viewpoint of suppressing surface roughness.
- each of m and n is preferably 0 to 1, and more preferably 0, that is, no substitution.
- Specific examples of the compound represented by formula (2) include 2,2'-bipyridine, 4,4'-bipyridine, 6-methyl-2,2'-bipyridine, 4,4'-dimethyl-2 ,2′-bipyridine, 4,4′,6,6′-tetramethyl-2,2′-bipyridine. From the viewpoint of suppressing surface roughness, 2,2'-bipyridine is preferred.
- Nitrogen-containing aromatic compounds may be used singly or in combination of two or more.
- a nitrogen-containing heterocyclic 1- to 3-membered ring compound is preferable.
- one-membered ring compounds include pyrazole, imidazole, pyridine, bipyridine, pyridazine, pyrimidine, pyrazine, triazine, and tetrazine.
- Two-membered ring compounds include, for example, indole, isoindole, benzimidazole, benzotriazole, purine, quinoline, isoquinoline, quinoxaline, quinazoline, pteridine, and fusalazine.
- Three-membered ring compounds include, for example, acridine, phenanthridine, and phenazine.
- the nitrogen-containing aromatic compound in the photosensitive coloring composition of the second aspect of the present invention may have a substituent, and examples of the substituent include an alkyl group, a carboxy group, and a nitro group.
- alkyl groups include, but are not particularly limited to, methyl, ethyl, propyl, and isopropyl groups.
- a one-membered ring compound or a two-membered ring compound is preferred from the viewpoint of suppressing surface roughness, benzotriazole and bipyridine are more preferred, and benzotriazole is even more preferred.
- the (e) nitrogen-containing aromatic compound in the photosensitive coloring composition of the second aspect of the present invention may be used alone or in combination of two or more.
- the photosensitive coloring composition of the present invention contains (f) a dispersant in order to finely disperse (a) the colorant and stabilize the dispersion state.
- a dispersant a polymer dispersant having a functional group is preferable, and further, from the viewpoint of dispersion stability, a carboxy group; a phosphoric acid group; a sulfonic acid group; or a base thereof; Polymeric dispersants having functional groups such as amino groups; quaternary ammonium bases; groups derived from nitrogen-containing heterocycles such as pyridine, pyrimidine and pyrazine are preferred.
- Polymer dispersants include, for example, urethane dispersants, acrylic dispersants, polyethyleneimine dispersants, polyallylamine dispersants, dispersants composed of amino group-containing monomers and macromonomers, and polyoxyethylene alkyl ether dispersants. Dispersants, polyoxyethylene diester dispersants, polyether phosphate dispersants, polyester phosphate dispersants, sorbitan aliphatic ester dispersants, and aliphatic modified polyester dispersants can be mentioned.
- dispersants examples include trade names of EFKA (registered trademark, manufactured by BASF), DISPERBYK (registered trademark, manufactured by BYK-Chemie), Disparon (registered trademark, manufactured by Kusumoto Kasei), SOLSPERSE (registered trademark, manufactured by Lubrizol Co., Ltd.), KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow (manufactured by Kyoeisha Chemical Co., Ltd.), and Ajisper (registered trademark, manufactured by Ajinomoto Co., Inc.). Polymer dispersants may be used alone or in combination of two or more.
- the dispersant preferably contains either or both of a functional group-containing urethane polymer dispersant and an acrylic polymer dispersant. is particularly preferred. From the standpoint of dispersibility and storage stability, a polymer dispersant having a basic functional group and either one or both of a polyester bond and a polyether bond is preferred.
- Urethane-based and acrylic-based polymer dispersants include, for example, DISPERBYK-160 to 167, 182 series (all urethane-based), DISPERBYK-2000, 2001, BYK-LPN21116 (all acrylic-based) (all manufactured by BYK-Chemie) ).
- the amine value of the polymeric dispersant having a basic functional group is not particularly limited, but is preferably 1 mgKOH/g or more, more preferably 10 mgKOH/g or more, still more preferably 20 mgKOH/g or more, and even more preferably 40 mgKOH/g or more. , 50 mg KOH/g or more are particularly preferred. Also, it is preferably 140 mgKOH/g or less, more preferably 120 mgKOH/g or less, still more preferably 100 mgKOH/g or less, even more preferably 90 mgKOH/g or less, and particularly preferably 80 mgKOH/g or less. The above upper and lower limits can be combined arbitrarily.
- 1 to 140 mgKOH/g is preferred, 10 to 120 mgKOH/g is more preferred, 20 to 100 mgKOH/g is even more preferred, 40 to 90 mgKOH/g is even more preferred, and 50 to 80 mgKOH/g is particularly preferred.
- the content is equal to or higher than the lower limit, surface roughness of the electrode tends to be suppressed.
- the amount is not more than the upper limit, compatibility with the (b) alkali-soluble resin tends to be good.
- the acrylic dispersant is preferably an AB or BAB block copolymer composed of an A block having the functional group and a B block having no functional group.
- the A block in addition to the partial structure derived from the unsaturated group-containing monomer containing the functional group, the A block contains a partial structure derived from the unsaturated group-containing monomer that does not contain the functional group. These may be contained in the A block in any form of random copolymerization or block copolymerization.
- the content of the partial structure containing no functional group in the A block is preferably 80% by mass or less, more preferably 50% by mass or less, even more preferably 30% by mass or less, and even more preferably 10% by mass or less, Particularly preferably, it is 0% by mass.
- the B block preferably consists only of a partial structure derived from an unsaturated group-containing monomer that does not contain the functional group, and two or more monomers in one B block Body-derived partial structures may be contained, and these may be contained in the B block in any form of random copolymerization or block copolymerization.
- the AB or BAB block copolymer is prepared, for example, by the following living polymerization method.
- the living polymerization method includes an anion living polymerization method, a cationic living polymerization method, and a radical living polymerization method. Of these, in the anionic living polymerization method, the polymerization active species is an anion, and is represented by, for example, the following scheme.
- Ar 1 is a monovalent organic group
- Ar 2 is a monovalent organic group different from Ar 1
- M is a metal atom
- s and t are integers of 1 or more.
- the polymerization active species is a radical, as shown in the scheme below.
- Ar 1 is a monovalent organic group
- Ar 2 is a monovalent organic group different from Ar 1
- j and k are each an integer of 1 or more
- Ra is a hydrogen atom or 1 is a valent organic group
- R b is a hydrogen atom or a monovalent organic group different from R a .
- the acrylic dispersant that can be used in the present invention may be an AB block copolymer or a BAB block copolymer.
- the block ratio is also not particularly limited, preferably 1/99 to 80/20 (mass ratio), more preferably 5/95 to 60/40 (mass ratio). Within this range, it tends to be easy to ensure a balance between dispersibility and storage stability.
- the amount of the quaternary ammonium base in 1 g of the AB block copolymer or BAB block copolymer that can be used in the present invention is preferably 0.1 to 10 mmol. Within this range, it tends to be easy to ensure good dispersibility.
- the amine value of the acrylic dispersant is preferably 1 mgKOH/g or more, more preferably 10 mgKOH/g or more, still more preferably 20 mgKOH/g or more, even more preferably 40 mgKOH/g or more, and particularly preferably 50 mgKOH/g or more. Also, it is preferably 140 mgKOH/g or less, more preferably 120 mgKOH/g or less, still more preferably 100 mgKOH/g or less, even more preferably 90 mgKOH/g or less, and particularly preferably 80 mgKOH/g or less.
- the above upper and lower limits can be combined arbitrarily.
- 1 to 140 mgKOH/g is preferred, 10 to 120 mgKOH/g is more preferred, 20 to 100 mgKOH/g is even more preferred, 40 to 90 mgKOH/g is even more preferred, and 50 to 80 mgKOH/g is particularly preferred.
- the content is equal to or higher than the lower limit, dispersibility tends to be good.
- the amount is not more than the upper limit, compatibility with the (b) alkali-soluble resin tends to be good.
- the amine value of the acrylic dispersant is expressed by the mass of KOH equivalent to the base amount per 1 g of the solid content excluding the solvent in the dispersant sample, and is measured by the following method.
- Amine value [mgKOH/g] (561 x V)/(W x S) [However, W: Amount of weighed dispersant sample [g], V: Amount of titration [mL] at the end point of titration, S: Solid content concentration [% by mass] of dispersant sample. ]
- the weight average molecular weight (Mw) of the acrylic dispersant is not particularly limited, it is preferably 1000 or more, more preferably 3000 or more, even more preferably 4000 or more, and particularly preferably 5000 or more. Moreover, it is preferably 50,000 or less, more preferably 20,000 or less, and even more preferably 15,000 or less.
- the above upper and lower limits can be combined arbitrarily. For example, it is preferably from 1,000 to 50,000, more preferably from 3,000 to 50,000, even more preferably from 4,000 to 20,000, and particularly preferably from 5,000 to 15,000.
- the content is at least the above lower limit, the dispersibility tends to be good, and when it is at most the above upper limit, the viscosity tends to be less likely to change.
- the acrylic dispersant has a quaternary ammonium base as a functional group
- the chemical structure of the repeating unit containing the quaternary ammonium base is not particularly limited.
- the acrylic dispersant preferably has a repeating unit represented by the following general formula (V) (hereinafter sometimes referred to as "repeating unit (V)").
- each of R 31 to R 33 is independently a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted and two or more of R 31 to R 33 may combine with each other to form a cyclic structure.
- R34 is a hydrogen atom or a methyl group.
- X is a divalent linking group and Y ⁇ is a counter anion.
- the optionally substituted alkyl group in R 31 to R 33 of formula (V) may be linear or branched. Also, it may contain a cyclic structure such as a cyclohexyl group or a cyclohexylmethyl group.
- the number of carbon atoms in the alkyl group is not particularly limited, but is preferably 1 or more, preferably 10 or less, more preferably 6 or less, further preferably 4 or less, and particularly preferably 2 or less. For example, 1 to 10 are preferred, 1 to 6 are more preferred, 1 to 4 are even more preferred, and 1 to 2 are particularly preferred.
- alkyl groups include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl and octyl groups, and methyl, ethyl, propyl, butyl, pentyl and hexyl groups. is preferred, methyl group, ethyl group, propyl group and butyl group are more preferred, and methyl group and ethyl group are even more preferred.
- the number of carbon atoms in the optionally substituted aryl group in R 31 to R 33 of formula (V) is not particularly limited, but is preferably 6 or more, preferably 16 or less, and more preferably 12 or less. For example, 6-16 is preferred, and 6-12 is more preferred.
- aryl group examples include phenyl group, methylphenyl group, ethylphenyl group, dimethylphenyl group, diethylphenyl group, naphthyl group and anthracenyl group, and phenyl group, methylphenyl group, ethylphenyl group, dimethylphenyl group, A diethylphenyl group is preferred, and a phenyl group, a methylphenyl group and an ethylphenyl group are more preferred.
- the number of carbon atoms in the optionally substituted aralkyl group in R 31 to R 33 of formula (V) is not particularly limited, but is preferably 7 or more, preferably 16 or less, more preferably 12 or less, 10 or less is more preferable, and 8 or less is particularly preferable.
- 7 to 16 are preferred, 7 to 12 are more preferred, 7 to 10 are even more preferred, and 7 to 8 are particularly preferred.
- the aralkyl group includes, for example, a phenylmethyl group, a phenylethyl group, a phenylpropyl group, a phenylbutyl group and a phenylisopropyl group, preferably a phenylmethyl group, a phenylethyl group, a phenylpropyl group and a phenylbutyl group.
- a phenylethyl group is more preferred.
- each of R 31 to R 33 is preferably an alkyl group or an aralkyl group, and each of R 31 to R 33 is preferably a methyl group or a phenylmethyl group.
- Y ⁇ in Formula (V) includes, for example, Cl ⁇ , Br ⁇ , I ⁇ , ClO 4 ⁇ , BF 4 ⁇ , CH 3 COO ⁇ and PF ⁇ .
- aromatic dicarboxylic acid imide anions, aromatic sulfonate anions, aromatic phosphonate anions, and aromatic carboxylate anions described in WO 2018/079659; alkyl sulfate anions described in WO 2019/107020. , an alkylsulfonate anion; can also be suitably used.
- Y ⁇ is preferably Cl ⁇ from the viewpoint of development mode. Alkylsulfonate anions are preferred from the viewpoint of suppressing surface roughness.
- repeating unit (VI) a repeating unit represented by the following general formula (VI) (hereinafter referred to as “repeating unit (VI)") It is preferable to have
- R 35 and R 36 are each independently a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, or a substituted and R 35 and R 36 may combine with each other to form a cyclic structure.
- R37 is a hydrogen atom or a methyl group.
- Z is a divalent linking group.
- R 35 and R 36 in formula (VI) As the optionally substituted alkyl group for R 35 and R 36 in formula (VI), those exemplified for R 31 to R 33 in formula (V) can be preferably employed.
- R 31 to R 33 in formula (V) As the optionally substituted aryl group for R 35 and R 36 in formula (VI), those exemplified for R 31 to R 33 in formula (V) can be preferably employed.
- R 31 to R 33 in formula (V) can be preferably employed.
- each of R 35 and R 36 is preferably an optionally substituted alkyl group, more preferably a methyl group or an ethyl group.
- substituents that the alkyl group, aralkyl group or aryl group in R 31 to R 33 of formula (V) and R 35 and R 36 of formula (VI) may have include a halogen atom, an alkoxy group, A benzoyl group and a hydroxyl group are mentioned.
- Examples of X in formula (V) and Z in formula (VI) are, for example, an alkylene group having 1 to 10 carbon atoms, an arylene group having 6 to 12 carbon atoms, a —CONH—R 43 — group, and —COOR 44 —.
- R 43 and R 44 are a single bond, an alkylene group having 1 to 10 carbon atoms, or an ether group (alkyloxyalkyl group) having 2 to 10 carbon atoms), preferably —COO—R 44 - group, more preferably -COO-C 2 H 4 - group.
- the content of the repeating unit (V) is not particularly limited, but from the viewpoint of suppressing dispersibility and surface roughness, the total content of the repeating unit (V) and the repeating unit (VI) is preferably 60 mol%. or less, more preferably 50 mol % or less, still more preferably 40 mol % or less, and particularly preferably 35 mol % or less. Also, it is preferably 5 mol % or more, more preferably 8 mol % or more, even more preferably 10 mol % or more, and particularly preferably 12 mol % or more.
- the above upper and lower limits can be combined arbitrarily. For example, 5 to 60 mol% is preferable, 8 to 50 mol% is more preferable, 10 to 40 mol% is still more preferable, and 12 to 35 mol% is particularly preferable.
- the content of the repeating unit (V) in the total repeating units of the dispersant is not particularly limited, but from the viewpoint of dispersibility, it is preferably 1 mol% or more, more preferably 3 mol% or more, and further preferably 5 mol% or more. , 8 mol % or more is particularly preferred. Also, it is preferably 50 mol % or less, more preferably 30 mol % or less, even more preferably 20 mol % or less, and particularly preferably 15 mol % or less.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 50 mol% is preferable, 3 to 30 mol% is more preferable, 5 to 20 mol% is still more preferable, and 8 to 15 mol% is particularly preferable.
- the content of the repeating unit (VI) is not particularly limited, but from the viewpoint of suppressing dispersibility and surface roughness, it is preferably 100 mol% of the total content of the repeating unit (V) and the repeating unit (VI). or less, more preferably 95 mol % or less, still more preferably 90 mol % or less, and particularly preferably 85 mol % or less. Also, it is preferably 10 mol % or more, more preferably 30 mol % or more, still more preferably 50 mol % or more, and particularly preferably 60 mol % or more. The above upper and lower limits can be combined arbitrarily. For example, 10 to 100 mol % is preferred, 30 to 95 mol % is more preferred, 50 to 90 mol % is even more preferred, and 60 to 85 mol % is particularly preferred.
- the content of the repeating unit (VI) in the total repeating units of the dispersant is not particularly limited, but from the viewpoint of suppressing dispersibility and surface roughness, it is preferably 5 mol% or more, more preferably 10 mol% or more, and 15 mol. % or more is more preferable, and 20 mol % or more is particularly preferable. Also, it is preferably 60 mol % or less, more preferably 40 mol % or less, even more preferably 30 mol % or less, and particularly preferably 25 mol % or less.
- the above upper and lower limits can be combined arbitrarily. For example, 5 to 60 mol% is preferable, 10 to 40 mol% is more preferable, 15 to 30 mol% is still more preferable, and 20 to 25 mol% is particularly preferable.
- the acrylic dispersant has a repeating unit represented by the following general formula (VII) (hereinafter referred to as "repeating unit (VII)" It is preferable to have
- R40 is an ethylene group or a propylene group
- R41 is an optionally substituted alkyl group
- R42 is a hydrogen atom or a methyl group.
- n is an integer from 1 to 20;
- the optionally substituted alkyl group in R 41 of formula (VII) may be linear or branched. Moreover, a cyclic structure such as a cyclohexyl group or a cyclohexylmethyl group may be included.
- the number of carbon atoms in the alkyl group is not particularly limited, but is preferably 1 or more, more preferably 2 or more. Moreover, 10 or less are preferable, 6 or less are more preferable, and 4 or less are more preferable.
- alkyl groups include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl and octyl groups, and methyl, ethyl, propyl, butyl, pentyl and hexyl groups. group is preferred, and methyl group, ethyl group, propyl group and butyl group are more preferred.
- n in formula (VII) is preferably 1 or more, more preferably 2 or more. Moreover, 10 or less are preferable and 5 or less are more preferable. The above upper and lower limits can be combined arbitrarily. For example, 1 to 10 are preferred, and 2 to 5 are more preferred.
- the content of the repeating unit (VII) in the total repeating units of the dispersant is not particularly limited, but is preferably 1 mol% or more, more preferably 2 mol% or more, and even more preferably 4 mol% or more. Also, it is preferably 30 mol % or less, more preferably 20 mol % or less, and even more preferably 10 mol % or less.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 30 mol % is preferred, 2 to 20 mol % is more preferred, and 4 to 10 mol % is even more preferred. Within the above range, compatibility with a binder component such as a solvent and dispersion stability tend to be compatible.
- the acrylic dispersant has a repeating unit represented by the following general formula (VIII) (hereinafter referred to as "repeating unit (VIII) ).
- R 38 is an optionally substituted alkyl group, an optionally substituted aryl group, or an optionally substituted aralkyl group.
- R39 is a hydrogen atom or a methyl group.
- the optionally substituted alkyl group in R 38 of formula (VIII) may be linear or branched. Moreover, a cyclic structure such as a cyclohexyl group or a cyclohexylmethyl group may be included. Although the number of carbon atoms in the alkyl group is not particularly limited, it is preferably 1 or more, more preferably 2 or more, and even more preferably 4 or more. Moreover, 10 or less are preferable and 8 or less are more preferable.
- alkyl group examples include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group and 2-ethylhexyl group, and methyl group, ethyl group, propyl group and butyl group.
- pentyl group, hexyl group and 2-ethylhexyl group are preferred, and methyl group, ethyl group, propyl group, butyl group and 2-ethylhexyl group are more preferred.
- the number of carbon atoms in the optionally substituted aryl group in R 38 of formula (VIII) is not particularly limited, it is preferably 6 or more. Also, it is preferably 16 or less, more preferably 12 or less, and even more preferably 8 or less. For example, 6 to 16 are preferred, 6 to 12 are more preferred, and 6 to 8 are even more preferred.
- Aryl groups include phenyl, methylphenyl, ethylphenyl, dimethylphenyl, diethylphenyl, naphthyl, anthracenyl groups and the like, and phenyl, methylphenyl, ethylphenyl, dimethylphenyl, diethyl A phenyl group is preferred, and a phenyl group, a methylphenyl group and an ethylphenyl group are more preferred.
- the number of carbon atoms in the optionally substituted aralkyl group in R 38 of formula (VIII) is not particularly limited, but is preferably 7 or more, preferably 16 or less, more preferably 12 or less, and 10 or less. More preferred. For example, 7 to 16 are preferred, 7 to 12 are more preferred, and 7 to 10 are even more preferred.
- the aralkyl group includes a phenylmethyl group, a phenylethyl group, a phenylpropyl group, a phenylbutyl group, a phenylisopropyl group and the like, preferably a phenylmethyl group, a phenylethyl group, a phenylpropyl group and a phenylbutyl group.
- a phenylmethyl group and a phenylethyl group are more preferable.
- R 38 is preferably an alkyl group or an aralkyl group, more preferably a methyl group, an ethyl group, a butyl group, a 2-ethylhexyl group or a phenylmethyl group.
- substituents that the alkyl group in R 38 may have include a halogen atom and an alkoxy group.
- substituents that the aryl group or aralkyl group may have include a chain alkyl group, a halogen atom, and an alkoxy group.
- the chain-like alkyl group represented by R 38 includes both straight-chain and branched-chain alkyl groups.
- the content of repeating units (VIII) in the total repeating units of the dispersant is preferably 30 mol% or more, more preferably 40 mol% or more, and even more preferably 50 mol% or more.
- 80 mol% or less is preferable, and 70 mol% or less is more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, 30 to 80 mol% is preferred, 40 to 80 mol% is more preferred, and 50 to 70 mol% is even more preferred.
- the acrylic dispersant may have repeating units other than repeating units (V), repeating units (VI), repeating units (VII) and repeating units (VIII).
- Such repeating units include, for example, styrene-based monomers such as styrene and ⁇ -methylstyrene; (meth)acrylate-based monomers such as (meth)acrylic acid chloride; (meth)acrylamide, N- (Meth)acrylamide-based monomers such as methylolacrylamide; repeating units derived from monomers such as vinyl acetate, acrylonitrile, allyl glycidyl ether, glycidyl crotonate, and N-methacryloylmorpholine;
- the acrylic dispersant has an A block having the repeating unit (V) and the repeating unit (VI) and a B block having no repeating unit (V) and the repeating unit (VI). and is preferably a block copolymer.
- the block copolymer is an AB block copolymer or a BAB block copolymer. Introducing not only a quaternary ammonium base but also a tertiary amino group into the A block unexpectedly tends to significantly improve the dispersing ability of the dispersant.
- the B block preferably has the repeating unit (VII), and more preferably has the repeating unit (VIII).
- the repeating unit (V) and the repeating unit (VI) may be contained in either random copolymerization or block copolymerization mode. Further, two or more types of repeating units (V) and repeating units (VI) may be contained in one A block, in which case each repeating unit is random copolymerized, block It may be contained in any mode of copolymerization.
- a repeating unit other than the repeating unit (V) and the repeating unit (VI) may be contained in the A block. and repeating units derived from The content of repeating units other than the repeating unit (V) and the repeating unit (VI) in the A block is preferably 0 to 50 mol%, more preferably 0 to 20 mol%. It is particularly preferred not to be contained in blocks.
- a repeating unit other than the repeating unit (VII) and the repeating unit (VIII) may be contained in the B block, and such repeating units include, for example, styrene, styrene-based monomers such as ⁇ -methylstyrene ; (meth)acrylic acid salt-based monomers such as (meth)acrylic acid chloride; (meth)acrylamide-based monomers such as (meth)acrylamide and N-methylolacrylamide; vinyl acetate, acrylonitrile, allyl glycidyl ether, croton repeating units derived from monomers such as acid glycidyl ether and N-methacryloylmorpholine;
- the content of the repeating unit other than the repeating unit (VII) and the repeating unit (VIII) in the B block is preferably 0 to 50 mol%, more preferably 0 to 20 mol%. It is particularly preferred not to be contained in blocks.
- the photosensitive coloring composition of the present invention contains adhesion improvers such as silane coupling agents, surfactants, pigment derivatives, photoacid generators, cross-linking agents, mercapto compounds, polymerization inhibitors, and the like. Additives can be appropriately blended.
- the photosensitive coloring composition of the present invention may contain an adhesion improver in order to improve adhesion to a substrate.
- Preferred adhesion improvers are silane coupling agents and phosphoric acid group-containing compounds.
- silane coupling agent for example, epoxy-based, (meth)acrylic-based, and amino-based agents may be used singly or in combination of two or more.
- silane coupling agents include (meth)acryloxysilanes such as 3-methacryloxypropylmethyldimethoxysilane and 3-methacryloxypropyltrimethoxysilane, and 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane. , epoxysilanes such as 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, ureidosilanes such as 3-ureidopropyltriethoxysilane, Examples include isocyanate silanes such as 3-isocyanatopropyltriethoxysilane.
- Silane coupling agents of the epoxysilane class are particularly preferred.
- the phosphoric acid group-containing compound (meth)acryloyl group-containing phosphates are preferable, and those represented by the following general formula (g1), (g2) or (g3) are preferable.
- R 51 represents a hydrogen atom or a methyl group
- l and l' are integers of 1-10
- m is 1, 2 or 3.
- the photosensitive coloring composition of the present invention may contain a surfactant in order to improve coating properties.
- Nonionic surfactants are preferred because they are less likely to adversely affect various properties, and fluorine-based or silicone-based surfactants are more preferred in terms of coatability.
- examples of such surfactants include TSF4460 (manufactured by Momentive Performance Materials), DFX-18 (manufactured by Neos), BYK-300, BYK-325, BYK-330 (manufactured by BYK-Chemie), KP340.
- F-470, F-475, F-478, F-554, F-559 manufactured by DIC
- SH7PA manufactured by Dow Corning Toray
- DS-401 manufactured by Daikin
- L-77 manufactured by Nippon Unicar
- FC4430 manufactured by 3M.
- One type of surfactant may be used, or two or more types may be used in combination.
- the photosensitive coloring composition of the present invention may contain a pigment derivative as a dispersing aid in order to improve dispersibility and storage stability.
- pigment derivatives include azo-based, phthalocyanine-based, quinacridone-based, benzimidazolone-based, quinophthalone-based, isoindolinone-based, dioxazine-based, anthraquinone-based, indanthrene-based, perylene-based, perinone-based, and diketopyrrolopyrroles. and dioxazine-based derivatives, and phthalocyanine-based and quinophthalone-based derivatives are preferred.
- Substituents of pigment derivatives include, for example, sulfonic acid groups, sulfonamide groups and their quaternary salts, phthalimidomethyl groups, dialkylaminoalkyl groups, hydroxyl groups, carboxyl groups, and amide groups directly on the pigment skeleton, or, for example, alkyl groups, aryl groups, and heterocyclic groups, preferably sulfonic acid groups.
- a single pigment skeleton may be substituted with a plurality of substituents, or may be substituted with a plurality of types of substituents.
- pigment derivatives include phthalocyanine sulfonic acid derivatives, quinophthalone sulfonic acid derivatives, anthraquinone sulfonic acid derivatives, quinacridone sulfonic acid derivatives, diketopyrrolopyrrole sulfonic acid derivatives, and dioxazine sulfonic acid derivatives. These may be used individually by 1 type, and may use 2 or more types together.
- a mercapto compound can be added as a polymerization accelerator and for improving adhesion to the substrate.
- Mercapto compounds include, for example, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, hexanedithiol, decanedithiol, 1,4-dimethylmercaptobenzene, butanediol bisthiopropionate, butanediol bis Thioglycolate, ethylene glycol bisthioglycolate, trimethylolpropane tristhioglycolate, butanediol bisthiopropionate, trimethylolpropane tristhiopropionate, trimethylolpropane tristhioglycolate, pentaerythritol tetrakisthiopropio pentaerythritol tetrakisthioglycolate, trishydroxyethyl tristhiopropionate, ethylene glycol bis(3-mercaptobutyrate), butanediol bis(3
- the photosensitive coloring composition of the present invention may contain a polymerization inhibitor from the viewpoint of controlling the shape of the cured product. It is thought that the taper angle (the angle formed by the support and the cured product in the cross section of the cured product) can be controlled because the polymerization inhibitor inhibits the radical polymerization of the lower layer of the coating film.
- Polymerization inhibitors include, for example, hydroquinone, hydroquinone monomethyl ether, methylhydroquinone, methoxyphenol, and 2,6-di-tert-butyl-4-cresol (BHT). From the viewpoint of shape control, 2,6-di-tert-butyl-4-cresol is preferred.
- Hydroquinone monomethyl ether and methylhydroquinone are preferred from the viewpoint of their particularly excellent safety to the human body.
- a polymerization inhibitor may be used individually by 1 type, and may use 2 or more types together.
- the resin may contain a polymerization inhibitor, which may be used as the polymerization inhibitor of the present invention. The same or different polymerization inhibitor may be added during the production of the photosensitive coloring composition.
- the content is not particularly limited, relative to the total solid content of the photosensitive coloring composition, preferably 0.0005% by mass or more, more preferably 0.001 % by mass or more, more preferably 0.01% by mass or more, and preferably 0.3% by mass or less, more preferably 0.2% by mass or less, and even more preferably 0.1% by mass or less.
- the above upper and lower limits can be combined arbitrarily. For example, 0.0005% by mass to 0.3% by mass is preferable, 0.001% by mass to 0.2% by mass is more preferable, and 0.01% by mass to 0.1% by mass is even more preferable.
- the content is at least the above lower limit, there is a tendency that the shape of the cured product can be controlled. By making it equal to or less than the above upper limit, there is a tendency that the required sensitivity can be maintained.
- the photosensitive coloring composition of the present invention preferably contains a solvent. By containing a solvent, the colorant can be dispersed or dissolved in the solvent, and coating is facilitated.
- the photosensitive coloring composition of the present invention includes, for example, (a) a coloring agent, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, and (e) a nitrogen-containing aromatic compound. , (f) a dispersant, and other various materials used as necessary are used in a state of being dissolved or dispersed in a solvent. Organic solvents are preferred from the viewpoint of dispersibility and coatability.
- an organic solvent having a boiling point of 100 to 300°C, more preferably 120 to 280°C is preferable to select an organic solvent having a boiling point of 100 to 300°C, more preferably 120 to 280°C.
- the boiling point referred to here means the boiling point at a pressure of 1013.25 hPa, and the same applies to the boiling points below.
- organic solvents examples include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, and propylene glycol mono-n-butyl ether.
- propylene glycol-t-butyl ether diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, methoxymethylpentanol, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, 3-methoxybutanol, 3-methyl - glycol monoalkyl ethers such as 3-methoxybutanol, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, tripropylene glycol methyl ether; glycol dialkyl ethers such as ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, dipropylene glycol dimethyl ether;
- aromatic hydrocarbons such as benzene, toluene, xylene, cumene; Amyl formate, ethyl formate, ethyl acetate, butyl acetate, propyl acetate, amyl acetate, methyl isobutyrate, ethylene glycol acetate, ethyl propionate, propyl propionate, butyl butyrate, isobutyl butyrate, methyl isobutyrate, ethyl Caprylate, butyl stearate, ethyl benzoate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, 3-methoxypropionic acid Chain or cyclic esters such as butyl, ⁇ -butyrolactone; Alkoxycarboxylic acids such as 3-methoxypropi
- organic solvents examples include Mineral Spirit, Valsol #2, Apco #18 Solvent, Apco Thinner, Socal Solvent No. 1 and no. 2, Solvesso #150, Shell TS28 Solvent, carbitol, ethyl carbitol, butyl carbitol, methyl cellosolve (“cellosolve” is a registered trademark. The same shall apply hereinafter.), ethyl cellosolve, ethyl cellosolve acetate, methyl cellosolve acetate, diglyme (any (also trade name) can be used. These organic solvents may be used alone or in combination of two or more.
- the organic solvent When forming partition walls by photolithography, the organic solvent preferably has a boiling point of 100 to 240°C, more preferably 120 to 200°C, and even more preferably 120 to 170°C. .
- Glycol alkyl ether acetates are preferred because they have a good balance of applicability, surface tension, etc., and relatively high solubility of the components in the composition.
- Glycol alkyl ether acetates may be used individually by 1 type, and may use 2 or more types together.
- Glycol alkyl ether acetates may be used alone, or may be used in combination with other organic solvents.
- Glycol monoalkyl ethers are preferable as the organic solvent used in combination. Propylene glycol monomethyl ether is preferred because of the solubility of the components in the composition.
- Glycol monoalkyl ethers have a high polarity, and if the amount added is too large, the pigment tends to aggregate, and the viscosity of the photosensitive coloring composition obtained later tends to decrease in storage stability.
- the proportion of glycol monoalkyl ethers in the mixture is preferably 5% to 30% by mass, more preferably 5% to 20% by mass.
- the photosensitive coloring composition is difficult to dry, but the pigment is uniformly dispersed in the composition.
- a high boiling point solvent may be used in combination. For example, it has the effect of preventing the occurrence of foreign matter defects due to deposition and solidification of a coloring agent or the like at the tip of a slit nozzle.
- diethylene glycol mono-n-butyl ether diethylene glycol mono-n-butyl ether acetate, and diethylene glycol monoethyl ether acetate are preferably used in combination.
- the content of the high-boiling solvent in the organic solvent is preferably 3% to 50% by mass, more preferably 5% to 40% by mass, particularly 5% to 30% by mass. preferable.
- the drying time is set to the above upper limit or less, it tends to be possible to suppress the drying time of the composition from becoming long, and to suppress problems such as takt failure in the reduced pressure drying process and pin marks during prebaking.
- the high boiling point solvent may be glycol alkyl ether acetates or glycol alkyl ethers. In this case, it is not necessary to separately contain the high boiling point solvent.
- Preferred high-boiling solvents include, for example, diethylene glycol mono-n-butyl ether acetate, diethylene glycol monoethyl ether acetate, dipropylene glycol methyl ether acetate, 1,3-butylene glycol diacetate, 1,6-hexanol diacetate and triacetin. .
- the content of (a) the coloring agent in the photosensitive coloring composition of the present invention is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, relative to the total solid content of the photosensitive coloring composition. 15% by mass or more is more preferable, and 20% by mass or more is even more preferable. Also, it is preferably 50% by mass or less, more preferably 40% by mass or less, even more preferably 30% by mass or less, and particularly preferably 25% by mass or less. The above upper and lower limits can be combined arbitrarily.
- 5 to 50% by mass is preferable, 10 to 40% by mass is more preferable, 15 to 40% by mass is more preferable, 15 to 30% by mass is even more preferable, and 15 to 25% by mass is particularly preferable.
- the content is equal to or less than the above upper limit, the amount of the dispersant can be reduced, and there is a tendency that surface roughness can be suppressed.
- the content is not particularly limited, but is preferably 5% by mass or more in the total solid content of the photosensitive coloring composition, and more than 20% by mass. It is preferably 30% by mass or more, more preferably 35% by mass or more, and particularly preferably 35% by mass or more. Moreover, it is preferably 70% by mass or less, more preferably 60% by mass or less, and particularly preferably 50% by mass or less.
- the above upper and lower limits can be combined arbitrarily. For example, 5 to 70% by mass is preferable, 20 to 70% by mass is more preferable, 20 to 60% by mass is even more preferable, and 20 to 50% by mass is particularly preferable.
- the content is at least the above lower limit, there is a tendency for the light-shielding property to be enhanced while suppressing the loss of ultraviolet light necessary for curing.
- the NMP resistance tends to be improved by making it equal to or less than the above upper limit.
- the total content of the red pigment and the orange pigment is not particularly limited. 10% by mass or more is more preferable, and 12% by mass or more is particularly preferable. Moreover, it is preferably 40% by mass or less, more preferably 30% by mass or less, and particularly preferably 20% by mass or less.
- the above upper and lower limits can be combined arbitrarily. For example, 5 to 40% by mass is preferable, 8 to 40% by mass is more preferable, 10 to 30% by mass is more preferable, and 12 to 20% by mass is particularly preferable.
- the content is equal to or higher than the lower limit, there is a tendency that a color tone close to black can be obtained.
- the content is equal to or less than the upper limit, there is a tendency for the sensitivity to be high.
- the total content of the blue pigment and the purple pigment is not particularly limited, but is preferably 30% by mass or more, and preferably 50% by mass in the colorant (a).
- the above is more preferable, 70% by mass or more is even more preferable, and 80% by mass or more is particularly preferable.
- it is preferably 95% by mass or less, more preferably 92% by mass or less, and particularly preferably 90% by mass or less.
- the above upper and lower limits can be combined arbitrarily. For example, 30 to 95% by mass is preferable, 50 to 95% by mass is more preferable, 70 to 92% by mass is even more preferable, and 80 to 90% by mass is particularly preferable.
- the content is equal to or higher than the lower limit, the light-shielding property tends to be enhanced.
- the NMP resistance tends to be improved by making it equal to or less than the above upper limit.
- the content is not particularly limited, but preferably 2% by mass or more, more preferably 3% by mass or more, in the total solid content of the photosensitive coloring composition, 5% by mass or more is more preferable, 10% by mass or more is even more preferable, and 20% by mass or more is particularly preferable. Moreover, it is preferably 60% by mass or less, more preferably 50% by mass or less, and particularly preferably 40% by mass or less.
- the above upper and lower limits can be combined arbitrarily. For example, 2 to 60% by mass is preferable, 5 to 60% by mass is more preferable, 10 to 50% by mass is even more preferable, and 20 to 40% by mass is particularly preferable.
- the content is equal to or higher than the lower limit, the light-shielding property tends to be enhanced.
- the NMP resistance tends to be improved by making it equal to or less than the above upper limit.
- the content is not particularly limited, preferably 2% by mass or more in the total solid content of the photosensitive coloring composition, more preferably 3% by mass or more , more preferably 5% by mass or more, even more preferably 10% by mass or more, and particularly preferably 20% by mass or more. Moreover, it is preferably 60% by mass or less, more preferably 50% by mass or less, and particularly preferably 40% by mass or less.
- the above upper and lower limits can be combined arbitrarily. For example, 2 to 60% by mass is preferable, 5 to 60% by mass is more preferable, 10 to 50% by mass is even more preferable, and 20 to 40% by mass is particularly preferable.
- the content is equal to or higher than the lower limit, the light-shielding property tends to be enhanced.
- the NMP resistance tends to be improved by making it equal to or less than the above upper limit.
- the content of the colorant (a) is not particularly limited, but the content of the colorant (a) is preferably 5% by mass or more, more preferably 10% by mass or more, and further preferably 15% by mass or more. Preferably, 20% by mass or more is particularly preferable. Moreover, it is preferably 100% by mass or less, more preferably 80% by mass or less, and particularly preferably 70% by mass or less.
- the above upper and lower limits can be combined arbitrarily. For example, 5 to 100% by mass is preferable, 10 to 100% by mass is more preferable, 15 to 80% by mass is even more preferable, and 20 to 70% by mass is particularly preferable.
- the content is equal to or higher than the lower limit, the light-shielding property tends to be enhanced.
- the NMP resistance tends to be improved by making it equal to or less than the above upper limit.
- the content is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, and 15% by mass in the colorant (a)
- the above is more preferable.
- it is preferably 60% by mass or less, more preferably 50% by mass or less, and particularly preferably 40% by mass or less.
- the above upper and lower limits can be combined arbitrarily. For example, 5 to 60% by mass is preferable, 10 to 50% by mass is more preferable, and 15 to 40% by mass is even more preferable.
- the content is equal to or higher than the lower limit, the light-shielding property tends to be enhanced.
- the NMP resistance tends to be improved by making it equal to or less than the above upper limit.
- the total content is not particularly limited. % by mass or more is more preferable. Moreover, it is preferably 100% by mass or less, more preferably 70% by mass or less, and particularly preferably 50% by mass or less.
- the above upper and lower limits can be combined arbitrarily. For example, 5 to 100% by mass is preferable, 10 to 70% by mass is more preferable, and 15 to 50% by mass is even more preferable.
- the content is equal to or higher than the lower limit, the light-shielding property tends to be enhanced.
- the NMP resistance tends to be improved by making it equal to or less than the above upper limit.
- the content of the alkali-soluble resin is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, and still more preferably 20% by mass relative to the total solid content of the photosensitive coloring composition of the present invention. % or more, more preferably 30% by mass or more, particularly preferably 40% by mass or more, preferably 85% by mass or less, more preferably 80% by mass or less, even more preferably 70% by mass or less, and even more preferably is 60% by mass or less, particularly preferably 55% by mass or less.
- the above upper and lower limits can be combined arbitrarily.
- % by weight is particularly preferred.
- the amount is at least the above lower limit, there is a tendency that the deterioration of the solubility of the unexposed portion in the developing solution can be suppressed, and the poor development can be suppressed.
- the amount is at least the above lower limit or less, there is a tendency that appropriate sensitivity can be maintained, dissolution of the exposed portion by the developer can be suppressed, and deterioration of the sharpness and adhesion of the pattern can be suppressed.
- the content of (b1) epoxy (meth) acrylate resin is not particularly limited, but the photosensitive coloring composition of the present invention Preferably 5% by mass or more, more preferably 10% by mass or more, still more preferably 15% by mass or more, even more preferably 20% by mass or more, even more preferably 30% by mass or more, particularly preferably It is 40% by mass or more, preferably 80% by mass or less, more preferably 70% by mass or less, still more preferably 60% by mass or less, and particularly preferably 55% by mass or less.
- the above upper and lower limits can be combined arbitrarily.
- % by weight is particularly preferred.
- the content is at least the above lower limit, there is a tendency that the solubility of the unexposed portion in the developer can be ensured.
- the amount is not more than the above upper limit, there is a tendency that appropriate sensitivity can be maintained, dissolution of the exposed portion by the developer can be suppressed, and deterioration of the sharpness and adhesion of the pattern can be suppressed.
- the content ratio of (b1) epoxy (meth)acrylate resin contained in (b) alkali-soluble resin is not particularly limited, It is preferably 20% by mass or more, more preferably 30% by mass or more, still more preferably 40% by mass or more, and is preferably 100% by mass or less, more preferably 90% by mass or less, further preferably 80% by mass or less. be.
- the above upper and lower limits can be combined arbitrarily. For example, 20 to 90% by mass is preferable, 30 to 80% by mass is more preferable, and 40 to 80% by mass is even more preferable.
- the content is at least the above lower limit, there is a tendency that the solubility of the unexposed portion in the developer can be ensured.
- the amount By adjusting the amount to the above upper limit or less, there is a tendency that appropriate sensitivity can be maintained, dissolution of the exposed portion by the developer can be suppressed, and deterioration of the sharpness and adhesion of the pattern can be suppressed.
- the content of the photopolymerization initiator is not particularly limited, but is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, relative to the total solid content of the photosensitive coloring composition of the present invention. , More preferably 1% by mass or more, still more preferably 2% by mass or more, particularly preferably 3% by mass or more, and preferably 15% by mass or less, more preferably 10% by mass or less, and still more preferably 8% by mass % or less, particularly preferably 6 mass % or less.
- the above upper and lower limits can be combined arbitrarily.
- 0.1 to 15% by mass is preferable, 0.5 to 15% by mass is more preferable, 1 to 10% by mass is more preferable, 2 to 8% by mass is even more preferable, and 3 to 6% by mass is particularly preferable.
- the amount is equal to or less than the above upper limit, there is a tendency that the deterioration of the solubility in the developing solution of the unexposed portion can be suppressed, and the poor development can be suppressed.
- the content of the polymerization accelerator is not particularly limited, but preferably 0.05% by mass or more relative to the total solid content of the photosensitive coloring composition of the present invention. and preferably 10% by mass or less, more preferably 5% by mass or less. For example, 0.05 to 10% by mass is preferable, and 0.05 to 5% by mass is more preferable.
- the polymerization accelerator is preferably used in a proportion of 0.1 to 50 parts by mass, more preferably 0.1 to 20 parts by mass, per 100 parts by mass of the photopolymerization initiator (c).
- the content of the polymerization accelerator is not particularly limited, but from the viewpoint of sensitivity, the total solid content in the photosensitive coloring composition is preferably 20% by mass. Below, more preferably 15% by mass or less, still more preferably 10% by mass or less.
- the content of the ethylenically unsaturated compound is not particularly limited, but is preferably 1% by mass or more, more preferably 5% by mass or more, still more preferably 5% by mass or more, based on the total solid content of the photosensitive coloring composition of the present invention. is 10% by mass or more, particularly preferably 15% by mass or more, and is preferably 30% by mass or less, more preferably 25% by mass or less, and still more preferably 20% by mass or less.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 30% by mass is preferable, 5 to 20% by mass is more preferable, and 10 to 20% by mass is even more preferable.
- the amount is at least the above lower limit, it tends to be possible to maintain an appropriate sensitivity, suppress dissolution of the exposed portion by the developer, and suppress deterioration of the sharpness and adhesion of the pattern.
- it becomes easy to obtain a good image by suppressing an increase in the permeability of the developer to the exposed area.
- the content of the nitrogen-containing aromatic compound is not particularly limited, but is preferably 0.01% by mass or more, more preferably 0.05% by mass, based on the total solid content of the photosensitive coloring composition of the present invention. Above, more preferably 0.1% by mass or more, particularly preferably 0.5% by mass or more, and preferably 10% by mass or less, more preferably 5% by mass or less, still more preferably 2% by mass or less .
- the above upper and lower limits can be combined arbitrarily. For example, 0.01 to 10% by mass is preferable, 0.01 to 5% by mass is more preferable, 0.05 to 5% by mass is even more preferable, and 0.1 to 2% by mass is particularly preferable.
- the content is equal to or higher than the above lower limit, the effect of protecting the electrode surface appears and there is a tendency to suppress erosion.
- the amount is equal to or less than the above upper limit, there is a tendency that the development time of the unexposed portion does not become too fast and it becomes easy to obtain a good image.
- the content of the dispersant is not particularly limited, but is preferably 1% by mass or more, more preferably 2% by mass or more, and still more preferably 3% by mass or more, relative to the total solid content of the photosensitive coloring composition. Also, it is preferably 20% by mass or less, more preferably 15% by mass or less, still more preferably 10% by mass or less, and even more preferably 7% by mass or less.
- the above upper and lower limits can be combined arbitrarily. For example, 1 to 20% by mass is preferable, 2 to 15% by mass is more preferable, 3 to 10% by mass is even more preferable, and 3 to 7% by mass is particularly preferable.
- the content ratio of the nitrogen-containing aromatic compound (e) to 100 parts by mass of the dispersant is not particularly limited, but is preferably 0.1 parts by mass or more, more preferably 1.0 parts by mass or more, and 10 parts by mass or more. It is more preferably 20 parts by mass or more, more preferably 50 parts by mass or less, preferably 30 parts by mass or less, and even more preferably 25 parts by mass or less.
- the above upper and lower limits can be combined arbitrarily.
- it is preferably 0.1 to 50 parts by mass, more preferably 1.0 to 30 parts by mass, still more preferably 10 to 25 parts by mass, and particularly preferably 20 to 25 parts by mass.
- the content ratio of (f) dispersant to 100 parts by mass of (a) colorant is not particularly limited, but is preferably 5 parts by mass or more, more preferably 10 parts by mass or more, further preferably 15 parts by mass or more, or 50 parts by mass. Parts or less is preferable, and 30 parts by mass or less is more preferable.
- the above upper and lower limits can be combined arbitrarily. For example, it is preferably 5 to 50 parts by mass, more preferably 10 to 50 parts by mass, even more preferably 15 to 30 parts by mass. By making it more than the said lower limit, there exists a tendency which is easy to obtain sufficient dispersibility. By making it equal to or less than the above upper limit, there is a tendency that surface roughness of the electrode surface can be suppressed.
- the content ratio of the alkali-soluble resin (b) to 100 parts by mass of the ethylenically unsaturated compound is not particularly limited, but is preferably 100 parts by mass or more, more preferably 200 parts by mass or more, and further preferably 250 parts by mass or more. More preferably 300 parts by mass or more, particularly preferably 350 parts by mass or more. Also, it is preferably 700 parts by mass or less, more preferably 500 parts by mass or less, even more preferably 450 parts by mass or less, and particularly preferably 400 parts by mass or less. The above upper and lower limits can be combined arbitrarily.
- it is preferably 100 to 700 parts by mass, more preferably 200 to 700 parts by mass, even more preferably 250 to 500 parts by mass, even more preferably 250 to 450 parts by mass, and particularly preferably 250 to 400 parts by mass.
- amount is at least the above lower limit, there is a tendency to obtain an appropriate dissolution and development state without peeling or the like.
- content is equal to or less than the above upper limit, there is a tendency that an appropriate dissolution time can be obtained in the developer.
- the content is not particularly limited, relative to the total solid content of the photosensitive coloring composition, preferably 0.1 to 5 mass%, more preferably 0.2 to 3 mass%, More preferably, it is 0.4 to 2% by mass. There is a tendency that a sufficient effect of improving adhesion can be obtained by setting the content to be at least the above lower limit. When the content is equal to or less than the upper limit, it tends to be possible to prevent the sensitivity from deteriorating and the residue remaining after development from becoming a defect.
- its content is not particularly limited, relative to the total solid content of the photosensitive coloring composition, preferably 0.001 to 10 wt%, more preferably 0.005 to 1 wt%, More preferably 0.01 to 0.5% by mass, particularly preferably 0.03 to 0.3% by mass.
- the content is equal to or less than the above upper limit, smoothness and uniformity of the coating film are likely to be exhibited, and deterioration of other properties tends to be suppressed.
- the photosensitive coloring composition of the present invention has a content ratio of the total solid content of preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 15% by mass or more, and It is preferably adjusted to 50% by mass or less, more preferably 30% by mass or less, and even more preferably 25% by mass or less.
- concentration is preferably 5 to 50% by mass, more preferably 10 to 30% by mass, still more preferably 15 to 25% by mass.
- the photosensitive coloring composition of the present invention has a reduced content of chlorine atoms in the photosensitive coloring composition.
- the chlorine atoms in the photosensitive coloring composition are decomposed, volatilized, or sublimated during heat treatment, particularly during baking, to metals such as silver. It is thought that corrosion or migration to the electrode can be suppressed, and surface roughness can be suppressed.
- Chlorine atoms in the photosensitive coloring composition are mainly contained in constituent materials such as (a) colorant, (b) alkali-soluble resin, and (f) dispersant, but may also be contained in other materials. be.
- the chlorine content of one constituent material may be reduced, or the chlorine content of each material may be reduced to bring it into the specified numerical range. It may be designed as
- the content of chlorine atoms in the photosensitive coloring composition is not particularly limited, but is preferably 0.05% by mass or less, more preferably 0.04% by mass or less, with respect to the total solid content of the photosensitive coloring composition, 0 0.03% by mass or less is more preferable, and 0.01% by mass or less is even more preferable.
- the lower limit is not particularly limited, it is preferably 0.0005% by mass or more, more preferably 0.001% by mass or more, and even more preferably 0.002% by mass or more.
- the above upper and lower limits can be combined arbitrarily.
- 0.0005 to 0.05% by mass is preferable, 0.0005 to 0.04% by mass is more preferable, 0.001 to 0.03% by mass is more preferable, and 0.002 to 0.01% by mass is Especially preferred.
- the content of chlorine atoms in the photosensitive coloring composition is preferably 100 ⁇ g/g or less, more preferably 80 ⁇ g/g or less, and 50 ⁇ g/g or less with respect to the total mass of the photosensitive coloring composition including the solvent. More preferably, 30 ⁇ g/g or less is even more preferable, and 10 ⁇ g/g or less is particularly preferable.
- the lower limit is not particularly limited, it is preferably 0.5 ⁇ g/g or more, more preferably 1.0 ⁇ g/g or more, and even more preferably 2.0 ⁇ g/g or more.
- the content By making the content equal to or higher than the above lower limit, it is possible to relax the refining at the time of manufacturing each constituent material.
- the above upper and lower limits can be combined arbitrarily. For example, 0.5 to 100 ⁇ g/g is preferable, 0.5 to 80 ⁇ g/g is more preferable, 1.0 to 50 ⁇ g/g is more preferable, 1.0 to 30 ⁇ g/g is even more preferable, and 2.0 to 10 ⁇ g/g is particularly preferred.
- the content of chlorine atoms in the photosensitive coloring composition is preferably 0.20% by mass or less, and 0.15% by mass or less, relative to 100% by mass of the content of the (a) colorant in the photosensitive coloring composition is more preferable, 0.10% by mass or less is more preferable, 0.05% by mass or less is even more preferable, and 0.03% by mass or less is particularly preferable.
- the lower limit is not particularly limited, it is preferably 0.001% by mass or more, more preferably 0.005% by mass or more, and still more preferably 0.01% by mass.
- the content of chlorine atoms in the photosensitive coloring composition can be measured, for example, by combustion ion chromatography.
- the optical density (OD) per 1 ⁇ m of the coating film thickness is not particularly limited, but is preferably 0.2 or more, more preferably 0.5 or more, and 0.7 or more. It is more preferably 0.9 or more, preferably 4.0 or less, more preferably 3.0 or less, still more preferably 2.0 or less, and particularly preferably 1.5 or less.
- the above upper and lower limits can be combined arbitrarily. For example, 0.2 to 4.0 is preferred, 0.5 to 4.0 is more preferred, 0.5 to 3.0 is more preferred, 0.5 to 2.0 is even more preferred, and 0.7 to 2.0 is particularly preferred, and 0.9 to 1.5 are particularly preferred.
- the optical density (OD) per 1 ⁇ m of the film thickness of the coating film may be measured using the coating film obtained by curing the photosensitive coloring composition of the present invention. It can be measured using a coating film of about 0.5 ⁇ m.
- the optical density is the transmission optical density in which the spectral sensitivity characteristic of the light receiving portion is indicated by ISO visual density in the ISO 5-3 standard. Normally, the A light source defined by CIE (International Commission on Illumination) is used as the light source.
- CIE International Commission on Illumination
- An example of a measuring instrument that can be used to measure transmission optical density is X-Rite 361T(V) manufactured by Sakata Inx Engineering.
- the colored photosensitive resin composition according to the second aspect of the present invention comprises (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) an ethylenically unsaturated compound, and (e) A photosensitive coloring composition containing a nitrogen-containing aromatic compound and (f) a dispersant, and in a coating film having a thickness of 2.0 ⁇ m obtained by curing, (e) is detected by a heat generated gas analysis method
- the toluene-equivalent amount of the nitrogen-containing aromatic compound component is 0.01 to 0.50 ⁇ g/cm 2 .
- the surface of the electrode tends to be less likely to be roughened after the photosensitive coloring composition is heat-treated.
- the photosensitive coloring composition containing the component (e) is heat-treated, the sublimated nitrogen-containing aromatic compound (e) can protect the electrode surface, and the electrode surface becomes rough. presumed to be less likely to occur.
- the heat-generated gas analysis method can be performed, for example, by Temperature Programmed Desorption-Mass Spectrometry method (TPD-MS method).
- TPD-MS method a mass spectrometer (MS) is directly connected to a special heating device with a temperature controller, and according to a predetermined heating program, changes in the concentration of gas generated from the heated sample are measured according to temperature or time. This is a method of tracking as a function. Since it is an online analysis, it is possible to simultaneously detect inorganic and organic components in a single measurement. In addition, qualitative analysis of organic components is possible by GC/MC analysis of the trapped substances collected.
- the substrate for gas amount measurement can be prepared by coating a support with a photosensitive resin composition, drying, exposing, and, if necessary, developing.
- the amount of gas is based on a coating film thickness of 2.0 ⁇ m and an area of 1 cm 2 obtained by curing the photosensitive resin composition. It may be converted into a gas amount value per film thickness or unit area.
- the peak area is measured using toluene with a known concentration in advance, and the calibration curve is used to calculate the toluene equivalent gas amount ( ⁇ g/cm 2 ). .
- the toluene equivalent gas amount per unit area ( ⁇ g/cm 2 ) can be calculated.
- the amount of gas converted to toluene is preferably 0.01 ⁇ g/cm 2 or more, more preferably 0.03 ⁇ g/cm 2 or more, still more preferably 0.10 ⁇ g/cm 2 or more, and even more preferably 0.20 ⁇ g/cm 2 or more. 0.30 ⁇ g/cm 2 or more is particularly preferred.
- it is preferably 0.50 ⁇ g/cm 2 or less, more preferably 0.45 ⁇ g/cm 2 or less, and even more preferably 0.40 ⁇ g/cm 2 or less.
- the above upper and lower limits can be combined arbitrarily. For example, 0.01 to 0.50 ⁇ g/cm 2 is preferred, 0.03 to 0.45 ⁇ g/cm 2 is more preferred, 0.10 to 0.45 ⁇ g/cm 2 is even more preferred, and 0.20 to 0.40 ⁇ g /cm 2 is even more preferred, and 0.30 to 0.40 ⁇ g/cm 2 is particularly preferred.
- the content is equal to or higher than the lower limit, there is a tendency that the surface roughness of the electrode is improved. In addition, there is a tendency that the amount of outgassing can be suppressed by making it equal to or less than the upper limit.
- the photosensitive coloring composition of the invention is produced according to a conventional method.
- the colorant is preferably dispersed in advance using a paint conditioner, sand grinder, ball mill, roll mill, stone mill, jet mill, homogenizer, or the like. Since the (a) colorant is finely divided by the dispersion treatment, the application properties of the photosensitive coloring composition are improved.
- Dispersion treatment includes a system in which (a) a colorant, (f) a dispersant and a solvent, and (b) a part or all of an alkali-soluble resin are used in combination, or (a) a colorant, (f) a dispersant, and a solvent, and (b) a part or all of the alkali-soluble resin (hereinafter, the composition obtained by the dispersion treatment may be referred to as "pigment dispersion").
- a polymer dispersant as (f) the dispersant, because the increase in viscosity of the obtained pigment dispersion and photosensitive coloring composition over time is suppressed, that is, the dispersion stability is excellent.
- (a) colorant, (f) dispersant, and solvent that can be used in the pigment dispersion those described as those that can be used in the photosensitive coloring composition can be preferably employed.
- the content ratio of each colorant in (a) the colorant in the pigment dispersion the content ratio described as the content ratio in the photosensitive coloring composition can be preferably employed.
- dispersion treatment When dispersion treatment is performed on a liquid containing all the components to be blended in the photosensitive coloring composition, highly reactive components may be denatured due to heat generated during the dispersion treatment. Therefore, it is preferable to carry out the dispersion treatment in a system containing a polymer dispersant.
- a polymer dispersant When dispersing (a) the colorant with a sand grinder, glass beads or zirconia beads having a particle size of about 0.1 to 8 mm are preferably used.
- the temperature is preferably from 0°C to 100°C, more preferably from room temperature to 80°C.
- the appropriate dispersion time varies depending on the composition of the liquid, the size of the dispersion treatment apparatus, etc., and is therefore adjusted as appropriate.
- the aim of dispersion is to control the glossiness of the pigment dispersion so that the 20° specular glossiness (JIS Z8741) of the photosensitive coloring composition is in the range of 50-300.
- the glossiness of the photosensitive coloring composition is low, dispersion processing is often insufficient and coarse pigment (coloring agent) particles remain, resulting in insufficient developability, adhesion, resolution, etc. there is a possibility. If the dispersion treatment is carried out until the gloss value exceeds the above range, the pigment is crushed to produce a large number of ultrafine particles, which tends to impair the dispersion stability.
- the dispersed particle size of the pigment dispersed in the pigment dispersion liquid is preferably 0.03 to 0.3 ⁇ m, and can be measured by a dynamic light scattering method.
- the pigment dispersion liquid obtained by the dispersion treatment and the other components contained in the photosensitive coloring composition are mixed to form a uniform solution or dispersion liquid.
- fine dust since fine dust may be mixed in the liquid, it is desirable to filter the obtained photosensitive coloring composition with a filter or the like.
- the cured product of the present invention can be obtained by curing the photosensitive coloring composition of the present invention.
- a cured product obtained by curing the photosensitive coloring composition of the present invention can be suitably used as a partition wall.
- the photosensitive coloring composition of the present invention can be suitably used for forming partition walls, particularly partition walls for partitioning the organic layers of an organic electroluminescence device.
- the organic layer used in the organic electroluminescent device includes, for example, a hole injection layer, a hole transport layer, or a hole transport layer on the hole injection layer, as described in Japanese Patent Application Laid-Open No. 2016-165396.
- the organic layer used can be mentioned.
- the material of the support for forming the partition is not particularly limited as long as it has an appropriate strength.
- Substrates are mainly used, and materials such as polyester resins such as polyethylene terephthalate, polyolefin resins such as polypropylene and polyethylene, thermoplastic resin sheets such as polycarbonate, polymethyl methacrylate, and polysulfone, and epoxy resins are used. , unsaturated polyester resins, thermosetting resin sheets such as poly(meth)acrylic resins, and various glasses. From the viewpoint of heat resistance, glass and heat-resistant resin are preferable. In some cases, transparent electrodes such as ITO and IZO, or metal electrodes such as silver, gold, platinum, aluminum and magnesium are deposited on the surface of the substrate. Other than the substrates described above, it can also be formed on a TFT array.
- the support may be subjected, if necessary, to, for example, corona discharge treatment, ozone treatment, and thin film formation treatment using various resins such as silane coupling agents and urethane resins.
- the thickness of the substrate is preferably in the range of 0.05-10 mm, more preferably 0.1-7 mm.
- the film thickness is preferably in the range of 0.01 to 10 ⁇ m, more preferably in the range of 0.05 to 5 ⁇ m.
- the photosensitive coloring composition of the present invention is used for the same applications as known photosensitive coloring compositions for color filters, but hereinafter, the photosensitive coloring of the present invention when used as a partition wall is described below. A specific example of a method for forming partition walls using the composition will be described.
- a photosensitive coloring composition is supplied in the form of a film or in a pattern by a method such as coating on a substrate on which partition walls are to be provided, and the solvent is dried. Subsequently, a pattern is formed by a method such as a photolithography method in which exposure and development are performed. After that, additional exposure or heat curing treatment is performed as necessary to form partition walls on the substrate.
- the photosensitive coloring composition of the present invention is preferably supplied onto a substrate in a state of being dissolved or dispersed in a solvent.
- the supply method can be a conventionally known method such as a spinner method, a wire bar method, a flow coating method, a die coating method, a roll coating method, or a spray coating method.
- the ink may be supplied in a pattern by an inkjet method or a printing method.
- the die coating method the amount of coating liquid used is greatly reduced, there is no effect of mist etc. that adheres when using the spin coating method, the generation of foreign matter is suppressed, etc. From a comprehensive point of view. preferable.
- the coating amount varies depending on the application, but in the case of partition walls, for example, the dry film thickness is preferably 0.5 ⁇ m to 10 ⁇ m, more preferably 1 ⁇ m to 9 ⁇ m, and particularly preferably 1 ⁇ m to 7 ⁇ m. It is important that the dry film thickness or the finally formed barrier rib height is uniform over the entire substrate. By reducing the variation, the light-emitting layer can be formed uniformly, and display defects at the time of light emission can be suppressed.
- the finally formed partition walls have different heights.
- the substrate known substrates such as glass substrates and array substrates can be used.
- the substrate surface is planar.
- Drying after supplying the photosensitive coloring composition onto the substrate is preferably by a drying method using a hot plate, an IR oven, or a convection oven.
- a reduced pressure drying method in which drying is performed in a reduced pressure chamber without raising the temperature, may be combined.
- the drying conditions can be appropriately selected according to the type of solvent component and the performance of the dryer used.
- the drying time is preferably selected in the range of 15 seconds to 5 minutes at a temperature of 40 ° C. to 130 ° C., more preferably 50 ° C. to 110 ° C., depending on the type of solvent component, the performance of the dryer used, etc.
- the temperature is selected in the range of 30 seconds to 3 minutes.
- Exposure is carried out by overlaying a negative mask pattern on the coating film of the photosensitive coloring composition, and irradiating a light source of ultraviolet light or visible light through this mask pattern.
- a method of bringing the exposure mask close to the coating film of the photosensitive coloring composition, or placing the exposure mask at a position away from the coating film of the photosensitive coloring composition, the exposure mask It is also possible to use a method of projecting the exposure light through.
- a scanning exposure method using a laser beam without using a mask pattern may also be used.
- the exposure may be carried out in an oxygen-free atmosphere or after forming an oxygen blocking layer such as a polyvinyl alcohol layer on the photopolymerizable layer. good too.
- a light shielding portion (light transmittance of 0%) and a plurality of openings having the highest average light transmittance
- An exposure mask is used which has apertures (intermediate transmission apertures) with a smaller average light transmittance than the normal transmission apertures (perfect transmission apertures).
- the difference in the average light transmittance between the intermediate transmission opening and the complete transmission opening that is, the difference in the amount of exposure, causes the difference in the residual film ratio.
- a method is known in which the intermediate transmission openings are formed by, for example, a matrix-shaped light shielding pattern having minute polygonal light shielding units.
- an absorber for example, a method is known in which a film of chromium-based, molybdenum-based, tungsten-based, or silicon-based material is used to control light transmittance.
- the light source used for exposure is not particularly limited.
- light sources include lamp light sources such as xenon lamps, halogen lamps, tungsten lamps, high-pressure mercury lamps, ultra-high pressure mercury lamps, metal halide lamps, medium-pressure mercury lamps, low-pressure mercury lamps, carbon arcs, and fluorescent lamps, argon ion lasers, YAG lasers,
- lamp light sources such as xenon lamps, halogen lamps, tungsten lamps, high-pressure mercury lamps, ultra-high pressure mercury lamps, metal halide lamps, medium-pressure mercury lamps, low-pressure mercury lamps, carbon arcs, and fluorescent lamps, argon ion lasers, YAG lasers
- laser light sources such as excimer lasers, nitrogen lasers, helium-cadmium lasers, blue-violet semiconductor lasers, and near-infrared semiconductor lasers.
- An optical filter can also be used when using it by irradiating the light of a specific wavelength.
- the optical filter may be, for example, a thin film type capable of controlling the light transmittance at the exposure wavelength, and the material in that case may be, for example, a Cr compound (Cr oxide, nitride, oxynitride, fluoride, etc.). , MoSi, Si, W, and Al.
- a Cr compound Cr oxide, nitride, oxynitride, fluoride, etc.
- MoSi Si, W, and Al.
- the exposure dose is not particularly limited, it is preferably 1 mJ/cm 2 or more, more preferably 5 mJ/cm 2 or more, still more preferably 10 mJ/cm 2 or more, and more preferably 300 mJ/cm 2 or less. is 200 mJ/cm 2 or less, more preferably 150 mJ/cm 2 or less.
- the distance between the exposure target and the mask pattern is not particularly limited, but is preferably 10 ⁇ m or more, more preferably 50 ⁇ m or more, still more preferably 75 ⁇ m or more, and preferably 500 ⁇ m or less. It is more preferably 400 ⁇ m or less, still more preferably 300 ⁇ m or less.
- an image pattern can be formed on the substrate by development using an aqueous solution of an alkaline compound or an organic solvent.
- the aqueous solution of alkaline compound may further contain, for example, surfactants, organic solvents, buffers, complexing agents, dyes or pigments.
- alkaline compounds include sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, sodium silicate, potassium silicate, sodium metasilicate, sodium phosphate, phosphorus Inorganic alkaline compounds such as potassium phosphate, sodium hydrogen phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate, ammonium hydroxide, mono-, di- or triethanolamine, mono-, di- or organic compounds such as trimethylamine, mono-, di- or triethylamine, mono- or diisopropylamine, n-butylamine, mono-, di- or triisopropanolamine, ethyleneimine, ethylenediimine, tetramethylammonium hydroxide (TMAH), choline Alkaline compounds are mentioned. These alkaline compounds may be used singly or in combination of two or more.
- TMAH tetramethylammonium hydroxide
- surfactants include nonionic surfactants such as polyoxyethylene alkyl ethers, polyoxyethylene alkylaryl ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, monoglyceride alkyl esters; Anionic surfactants such as salts, alkylnaphthalenesulfonates, alkylsulfates, alkylsulfonates, and sulfosuccinate ester salts; and amphoteric surfactants such as alkylbetaines and amino acids.
- organic solvents examples include isopropyl alcohol, benzyl alcohol, ethyl cellosolve, butyl cellosolve, phenyl cellosolve, propylene glycol, and diacetone alcohol. These organic solvents may be used in combination of two or more. Also, the organic solvent may be used alone or in combination with water or an aqueous solution of an alkaline compound.
- the conditions for development processing are not particularly limited, and the development temperature is preferably 10 to 50°C, more preferably 15 to 45°C, still more preferably 20 to 40°C.
- the development method can be, for example, an immersion development method, a spray development method, a brush development method, or an ultrasonic development method.
- the substrate after development may be subjected to post-exposure by the same method as the above exposure method.
- heat curing treatment also referred to as baking
- the heat curing treatment conditions are preferably a temperature of 100° C. to 280° C., more preferably 150° C. to 250° C., and a time of 5 minutes to 60 minutes.
- the optical density (OD) per 1 ⁇ m of the barrier ribs of the present invention is preferably 0.7 or more, more preferably 1.2 or more, still more preferably 1.5 or more, and 1.8 or more from the viewpoint of light shielding properties. Especially preferred. Moreover, it is preferably 4.0 or less, more preferably 3.0 or less. For example, 0.7 to 4.0 is preferred, 1.2 to 4.0 is more preferred, 1.5 to 3.0 is even more preferred, and 1.8 to 3.0 is particularly preferred.
- the optical density (OD) is a value measured by the method described later.
- the organic electroluminescence device of the present invention comprises a cured product, such as partition walls, formed from the photosensitive coloring composition of the present invention.
- various organic electroluminescence devices are manufactured using a substrate provided with a partition pattern manufactured by the method described above.
- the method for forming the organic electroluminescent device is not particularly limited, but preferably, after forming the partition pattern on the substrate by the method described above, the functional material is sublimated in a vacuum state to form a region surrounded by the partition on the substrate.
- An organic electroluminescence device is manufactured by forming an organic layer such as a pixel by a vapor deposition method in which a film is formed by adhering to the inside, or by a wet process such as a casting method, a spin coating method, or an inkjet printing method.
- Types of organic electroluminescence devices include bottom emission type and top emission type.
- partition walls are formed on a glass substrate laminated with transparent electrodes, and a hole transport layer, a light emitting layer, an electron transport layer, and a metal electrode layer are laminated in an opening surrounded by the partition walls.
- barrier ribs are formed on a glass substrate laminated with a metal electrode layer as a reflective layer, and an electron transport layer, a light emitting layer, a hole transport layer, and a transparent electrode layer are formed in an opening surrounded by the barrier ribs.
- the light-emitting layer examples include organic electroluminescent layers as described in Japanese Patent Application Laid-Open No. 2009-146691 and Japanese Patent No. 5734681. Quantum dots as described in Japanese Patent No. 5653387 and Japanese Patent No. 5653101 may also be used.
- each layer of the hole transport layer and the electron transport layer may have a laminated structure of two or more layers from the viewpoint of luminous efficiency.
- the thickness of each layer is not particularly limited, it is preferably 1 to 500 nm from the viewpoint of luminous efficiency and luminance.
- the organic electroluminescence element may be formed by dividing each color of RGB for each opening, or two or more colors may be laminated in one opening. From the viewpoint of improving reliability, the organic electroluminescence device may have a sealing layer.
- the sealing layer has a function of preventing moisture in the air from being adsorbed on the organic electroluminescence element and reducing the luminous efficiency.
- the organic electroluminescence element may be provided with a low-reflection film at the interface with air from the viewpoint of improving light extraction efficiency. By arranging the low-reflection film at the interface between the air and the device, it is expected that the refractive index gap can be reduced and the reflection at the interface can be suppressed. For such a low-reflection film, for example, a moth-eye structure or super-multilayer film technology can be applied.
- an organic electroluminescent element When an organic electroluminescent element is used as a pixel of an image display device, it is necessary to prevent the light from the light emitting layer of one pixel from leaking to other pixels. Since it is necessary to prevent the image quality from deteriorating due to the reflection of light, it is preferable to impart a light-shielding property to the partition wall constituting the organic electroluminescence device.
- the organic electroluminescence device it is necessary to provide electrodes on the upper and lower surfaces of the partition, so from the viewpoint of insulation, the partition preferably has a high resistance and a low dielectric constant. Therefore, when a colorant is used to impart a light-shielding property to the barrier ribs, it is preferable to use the organic pigment having high resistance and low dielectric constant.
- Examples of the image display device of the present invention include an organic EL display device having partition walls containing the cured product of the present invention and organic electroluminescence elements.
- the organic EL display device is not particularly limited in terms of the type and structure of the image display device as long as it contains the above-described organic electroluminescence device. can.
- it can be formed by the method described in "Organic EL Display” (Ohmsha, Aug. 20, 2004, Shizuo Tokito, Chihaya Adachi, Hideyuki Murata).
- an image may be displayed by combining an organic electroluminescent element that emits white light and a color filter, or an image may be displayed by combining organic electroluminescent elements emitting different colors such as RGB.
- An organic electroluminescence device containing the cured product of the present invention can be used for illumination. There are no particular restrictions on the type and structure of the lighting, and the organic electroluminescence device containing the cured product of the present invention can be assembled in accordance with conventional methods.
- the organic electroluminescence element may be of a simple matrix drive system or an active matrix drive system. In order for the illumination to emit white light, an organic electroluminescent device that emits white light may be used. Alternatively, organic electroluminescence elements emitting different colors may be combined to form a white color by mixing the colors, or a color mixing ratio may be adjusted to provide a toning function.
- ** represents the connection part.
- TMP trimethylolpropane
- BPDA biphenyltetracarboxylic dianhydride
- THPA tetrahydrophthalic anhydride
- ⁇ Dispersant-I> A methacrylic copolymer having an amine value of 60 mgKOH/g and having repeating units represented by the following formulas (1) and (2). (The content of repeating units represented by the following formulas (1) and (2) in all repeating units is 11.6 mol% and 4.6 mol%, respectively)
- DPHA-40H Urethane acrylate manufactured by Nippon Kayaku Co., Ltd.
- Benzotriazole manufactured by Tokyo Chemical Industry Co., Ltd. It is a compound having the following structure and corresponds to the structure of general formula (1).
- TINUVIN384-2 UV absorber manufactured by BASF. It is a compound represented by the following structural formula and does not correspond to the structures of general formulas (1) and (2).
- m 7-9.
- the optical density per unit film thickness was measured by the following procedure. First, the prepared photosensitive coloring composition was applied to a glass substrate with a spin coater so that the film thickness after baking was 1.5 ⁇ m, dried under reduced pressure for 1 minute, and then hot plated at 100 ° C. for 120 seconds. Dried. The obtained coating film was exposed without using an exposure mask. A high-pressure mercury lamp having an intensity of 40 mW/cm 2 at a wavelength of 365 nm was used as the irradiation light source, and the exposure amount was 50 mJ/cm 2 . Subsequently, a resist-coated substrate 1 was obtained by heating and curing in an oven at 230° C.
- the optical density (OD value) of the obtained resist-coated substrate 1 was measured with a 361T (V) transmission densitometer manufactured by X-Rite (color temperature of illumination light source: about 2850 K (equivalent to CIE standard light source A), spectral sensitivity of light receiving part Characteristics: ISO visual density in ISO 5-3 standard), the film thickness is measured by a non-contact surface/layer cross-sectional shape measurement system VertScan (R) 2.0 manufactured by Ryoka System Co., Ltd., and the optical density ( The optical density (unit OD value) per unit film thickness (1 ⁇ m) was calculated from the OD value) and the film thickness.
- the OD value is a numerical value that indicates the light shielding ability, and the larger the number, the higher the light shielding ability.
- each photosensitive coloring composition was applied with a spin coater so that the film thickness after baking was 1.5 ⁇ m, dried under reduced pressure for 1 minute, and dried at 100 ° C. for 120 seconds on a hot plate. .
- the substrate provided with the coating film of the obtained photosensitive coloring composition and the electrode substrate having a silver thin film having a thickness of 60 nm deposited on the entire surface of the glass substrate were prepared so that the silver surface and the photosensitive coloring composition coating film surface They were placed facing each other and separated by 50 ⁇ m and heated in an oven at 230° C. for 30 minutes.
- the surface roughness (Sa: arithmetic mean height) of the obtained electrode substrate was measured using a non-contact surface/layer cross-sectional shape measurement system VertScan (R) 2.0 manufactured by Ryoka Systems. A smaller surface roughness value indicates less surface roughness. Moreover, it determined as follows. A is the best. A: Surface roughness (Sa) 1.0 nm or less. B: Surface roughness (Sa) greater than 1.0 nm and less than or equal to 1.8 nm. C: Surface roughness (Sa) greater than 1.8 nm.
- Pigment Dispersions 1 and 2 A pigment, a dispersant, an alkali-soluble resin, and a solvent shown in Table 1 were mixed so as to have the mass ratio shown in Table 1. This mixed liquid was subjected to dispersion treatment for 3 hours in the range of 25 to 45° C. using a paint shaker. As the beads, 0.5 mm ⁇ zirconia beads were used, and 2.5 times the mass of the dispersion liquid was added. After finishing the dispersion, the beads and the dispersion liquid were separated by a filter. Pigment dispersions 1 and 2 were prepared. The amount of solvent in Table 1 also includes the amount of solvent derived from the dispersant and the alkali-soluble resin.
- Example 5 Pigment dispersion liquid 1 was changed to pigment dispersion liquid 2, except that each component was added so that the values described in Table 2 were performed in the same manner as in Example 4, and the photosensitive coloring composition of Example 5 adjusted.
- Table 2 shows the unit OD value and the evaluation results of the surface roughness of the electrode.
- Comparative Example 3 A photosensitive composition of Comparative Example 3 was prepared in the same manner as in Example 1 by adding each component to the values shown in Table 2, except that Pigment Dispersion Liquid 1 was not used.
- Comparative Example 1 which does not contain a nitrogen-containing aromatic compound, unevenness was formed on the electrode (silver) surface, resulting in a large surface roughness value. It is considered that the surface of the electrode was attacked by the gas component generated when the coating film of the photosensitive coloring composition was heated at 230°C.
- Examples 1 to 5 containing the compound represented by the formula (1) or the compound represented by the formula (2) as the nitrogen-containing aromatic compound the surface roughness is low, and the content in the photosensitive coloring composition It was confirmed that the addition of the nitrogen aromatic compound has the effect of suppressing corrosion of the electrode surface.
- Example 1 On a glass substrate, the photosensitive coloring compositions of Example 1, Example 2 and Comparative Example 2 were applied with a spin coater so that the film thickness after curing was 2.0 ⁇ m, and dried under reduced pressure for 1 minute. It was dried on a hot plate at 100° C. for 120 seconds. The resulting coating film was exposed to ultraviolet light at 40 mJ/cm 2 using a high-pressure mercury lamp without using a mask. At this time, the light intensity at a wavelength of 365 nm was 40 mW/cm 2 .
- the amount of gas during firing was measured by the heat generated gas analysis method as follows.
- the produced gas amount measurement substrate (5 mm ⁇ 10 mm, 1 to 10 sheets) was heated in a heating furnace at 230 ° C. for 30 minutes, and the gas generated was collected by cooling with liquid nitrogen, and the trapped matter was collected by GC. /MS (manufactured by Agilent Technologies, trade name "5973N”) was used to measure the outgas amount of the nitrogen-containing aromatic compound.
- the areas of the peak components corresponding to the nitrogen-containing aromatic compounds-I to III were calculated.
- a calibration curve was prepared by measuring the peak area using toluene with a known concentration.
- the amount of toluene was converted from the peak areas corresponding to the obtained nitrogen-containing aromatic compounds-I to III, and the amount was divided by the measured substrate area to calculate the gas amount ( ⁇ g/cm 2 ) converted to toluene per unit area. .
- the results were as follows.
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
本願は、2021年2月18日に日本に出願された特願2021-024489号に基づき優先権を主張し、その内容をここに援用する。
有機電界発光素子は、少なくとも一方が透光性を有する一対の電極間に、発光層あるいは種々の機能層を含む有機層が狭持された構造を有するものである。画像表示装置は画素毎に有機電界発光素子が配置されたパネルを駆動させることにより、画像表示を行うものである。
従来からこのような有機電界発光素子は、基板上に、隔壁(バンク)を形成した後に、隔壁に囲まれた領域内に、発光層あるいは種々の機能層を積層して製造されている。
近年では、キャスト法、スピンコート法、インクジェット印刷法といったウェットプロセスにて成膜する方法が注目されている。特に、インクジェット印刷法は、大面積にした場合の膜厚ムラを低減することができるとともに、塗布時の塗り分けによるディスプレイの高精細化、材料の使用量の削減、歩留まりの向上を図ることが可能となるため、大型パネルにおける有機層の成膜方法として好適である。
即ち本発明の要旨は以下のとおりである。
[1](a)着色剤、(b)アルカリ可溶性樹脂、(c)光重合開始剤、(d)エチレン性不飽和化合物、(e)含窒素芳香族化合物及び(f)分散剤を含有する感光性着色組成物であって、
前記(e)含窒素芳香族化合物が、下記一般式(1)及び/又は下記一般式(2)で表される化合物を含むことを特徴とする感光性着色組成物。
[3]前記(e)含窒素芳香族化合物が、ベンゾトリアゾールを含む、[2]の感光性着色組成物。
[4]前記(e)含窒素芳香族化合物の含有割合が感光性着色組成物の全固形分質量に対し0.01質量%以上、5質量%以下である、[1]~[3]のいずれかの感光性着色組成物。
[5](a)着色剤、(b)アルカリ可溶性樹脂、(c)光重合開始剤、(d)エチレン性不飽和化合物、(e)含窒素芳香族化合物及び(f)分散剤を含有する感光性着色組成物であって、
前記感光性樹脂組成物を硬化させて得られる膜厚2.0μmの塗膜において、加熱発生ガス分析法で検出される前記(e)含窒素芳香族化合物成分のトルエン換算量が0.01~0.50μg/cm2であることを特徴とする、感光性着色組成物。
[7]前記(a)着色剤が、有機黒色顔料を含む、[1]~[6]のいずれかの感光性着色組成物。
[8]前記有機黒色顔料が、下記一般式(a1)で表される化合物、その幾何異性体、その塩、及びその幾何異性体の塩からなる群から選ばれる少なくとも1種を含む、[7]の感光性着色組成物。
R12、R13、R14、R15、R17、R18、R19及びR20は各々独立に、水素原子、ハロゲン原子、R21、COOH、COOR21、COO-、CONH2、CONHR21、CONR21R22、CN、OH、OR21、COCR21、OOCNH2、OOCNHR21、OOCNR21R22、NO2、NH2、NHR21、NR21R22、NHCOR22、NR21COR22、N=CH2、N=CHR21、N=CR21R22、SH、SR21、SOR21、SO2R21、SO3R21、SO3H、SO3 -、SO2NH2、SO2NHR21又はSO2NR21R22を表し;
R12とR13、R13とR14、R14とR15、R17とR18、R18とR19、及びR19とR20からなる群から選ばれる少なくとも1つの組み合わせは、互いに直接結合してもよく、又は酸素原子、硫黄原子、NH若しくはNR21ブリッジによって互いに結合してもよく;
R21及びR22は各々独立に、炭素数1~12のアルキル基、炭素数3~12のシクロアルキル基、炭素数2~12のアルケニル基、炭素数3~12のシクロアルケニル基又は炭素数2~12のアルキニル基を表す。)
[10]硬化した塗膜の膜厚1μmあたりの光学濃度が0.5以上である、[1]~[9]のいずれかの感光性着色組成物。
[11]有機電界発光素子の隔壁を形成するために用いられる、[1]~[10]のいずれかの感光性着色組成物。
[12][1]~[11]のいずれかの感光性着色組成物を硬化させた硬化物。
[13][1]~[11]のいずれかの感光性着色組成物を硬化させた隔壁。
[14][12]の硬化物を含む有機電界発光素子。
[15][14]の有機電界発光素子を含む画像表示装置。
本発明において、「(メタ)アクリル」とは「アクリル及び/又はメタクリル」を意味し、「(メタ)アクリレート」、「(メタ)アクリロイル」についても同様である。
本発明において「アクリル系樹脂」とは、(メタ)アクリル酸を含む(共)重合体、カルボキシ基を有する(メタ)アクリル酸エステルを含む(共)重合体を意味する。
本発明において、「全固形分」とは、感光性樹脂組成物における溶剤以外の全成分を意味し、溶剤以外の成分が常温で液体であっても、その成分は溶剤には含めず、全固形分に含める。
「(共)重合体」とは、単一重合体(ホモポリマー)と共重合体(コポリマー)の双方を含むことを意味し、「酸(無水物)」、「(無水)…酸」とは、酸とその無水物の双方を含むことを意味する。
本発明において「モノマー」とは、いわゆる高分子物質(ポリマー)に相対する用語であり、狭義の単量体(モノマー)の他に、二量体、三量体、オリゴマーも含む意味である。
本発明において、「重量平均分子量」とは、GPC(ゲルパーミエーションクロマトグラフィー)によるポリスチレン換算の重量平均分子量(Mw)を意味する。
本発明において、「アミン価」とは、特に断りのない限り、有効固形分換算のアミン価を表し、分散剤の固形分1gあたりの塩基量と当量のKOHの質量で表される値である。なお、測定方法については後述する。「酸価」とは、特に断りのない限り、有効固形分換算の酸価を表し、中和滴定により算出される。
顔料に関し、「C.I.」とはカラーインデックスを意味する。
本明細書において、「質量」で表される百分率や部は「重量」で表される百分率や部と同義である。
本発明の感光性着色組成物は、
(a)着色剤
(b)アルカリ可溶性樹脂
(c)光重合開始剤
(d)エチレン性不飽和化合物
(e)含窒素芳香族化合物
(f)分散剤
を必須成分として含有する。
本発明の感光性着色組成物は、(a)着色剤を含有する。(a)着色剤を含有することで、適度な光吸収性、特に隔壁等の遮光部材を形成する用途に用いる場合には適度な遮光性を得ることができる。
(a)着色剤として用いることができる顔料は特に限定されないが、例えば、有機着色顔料や黒色顔料が挙げられる。ここで、有機着色顔料とは、黒色以外の色を呈する有機顔料のことを意味し、例えば、赤色顔料、橙色顔料、青色顔料、紫色顔料、緑色顔料、黄色顔料が挙げられる。
赤色顔料:C.I.ピグメントレッド177、254、272
橙色顔料:C.I.ピグメントオレンジ43、64、72
青色顔料:C.I.ピグメントブルー15:6、60
紫色顔料:C.I.ピグメントバイオレット23、29
なお、色の組み合わせについては特に限定されないが、遮光性の観点からは、例えば、赤色顔料と青色顔料の組み合わせ、青色顔料と橙色顔料の組み合わせ、青色顔料と橙色顔料と紫色顔料の組み合わせが挙げられる。
有機黒色顔料において、紫外線の吸収を抑制して形状をコントロールしやすくするとの観点からは、下記一般式(a1)で表される化合物(以下、「化合物(a1)」と称する場合がある。)、化合物(a1)の幾何異性体、化合物(a1)の塩、及び化合物(a1)の幾何異性体の塩からなる群から選ばれる少なくとも1種を含む有機黒色顔料(以下、「一般式(a1)で表される有機黒色顔料」と称する場合がある。)を用いることが好ましい。
R12、R13、R14、R15、R17、R18、R19及びR20は各々独立に、水素原子、ハロゲン原子、R21、COOH、COOR21、COO-、CONH2、CONHR21、CONR21R22、CN、OH、OR21、COCR21、OOCNH2、OOCNHR21、OOCNR21R22、NO2、NH2、NHR21、NR21R22、NHCOR22、NR21COR22、N=CH2、N=CHR21、N=CR21R22、SH、SR21、SOR21、SO2R21、SO3R21、SO3H、SO3 -、SO2NH2、SO2NHR21又はSO2NR21R22を表し;
R12とR13、R13とR14、R14とR15、R17とR18、R18とR19、及びR19とR20からなる群から選ばれる少なくとも1つの組み合わせは、互いに直接結合してもよく、又は酸素原子、硫黄原子、NH若しくはNR21ブリッジによって互いに結合してもよく;
R21及びR22は各々独立に、炭素数1~12のアルキル基、炭素数3~12のシクロアルキル基、炭素数2~12のアルケニル基、炭素数3~12のシクロアルケニル基又は炭素数2~12のアルキニル基を表す。
R12、R14、R15、R17、R19及びR20は各々独立に、好ましくは水素原子、フッ素原子、又は塩素原子であり、さらに好ましくは水素原子である。
R13及びR18は各々独立に、好ましくは水素原子、NO2、OCH3、OC2H5、臭素原子、塩素原子、CH3、C2H5、N(CH3)2、N(CH3)(C2H5)、N(C2H5)2、α-ナフチル、β-ナフチル、SO3H又はSO3 -であり、さらに好ましくは水素原子又はSO3Hであり、特に好ましくは水素原子である。
好ましくは、R11とR16、R12とR17、R13とR18、R14とR19、及びR15とR20からなる群から選ばれる少なくとも1つの組み合わせが同一であり、より好ましくは、R11はR16と同一であり、R12はR17と同一であり、R13はR18と同一であり、R14はR19と同一であり、かつ、R15はR20と同一である。
この有機黒色顔料は、好ましくは後述される分散剤、溶剤、方法によって分散して使用される。また、分散の際に化合物(a1)のスルホン酸誘導体、特に化合物(a2)のスルホン酸誘導体が存在すると、分散性や保存性が向上する場合があるため、有機黒色顔料がこれらのスルホン酸誘導体を含むことが好ましい。
無機黒色顔料としては、例えば、カーボンブラック、アセチレンブラック、ランプブラック、ボーンブラック、黒鉛、鉄黒、シアニンブラック、チタンブラックが挙げられる。遮光性、画像特性の観点からカーボンブラックを好ましく用いることができる。カーボンブラックの例としては、以下のようなカーボンブラックが挙げられる。
デグサ社製:Printex(登録商標、以下同じ。)3、Printex3OP、Printex30、Printex30OP、Printex40、Printex45、Printex55、Printex60、Printex75、Printex80、Printex85、Printex90、Printex A、Printex L、Printex G、Printex P、Printex U、Printex V、PrintexG、SpecialBlack550、SpecialBlack350、SpecialBlack250、SpecialBlack100、SpecialBlack6、SpecialBlack5、SpecialBlack4、Color Black FW1、Color Black FW2、Color Black FW2V、Color Black FW18、Color Black FW18、Color Black FW200、Color Black S160、Color Black S170
キャボット社製:Monarch(登録商標、以下同じ。)120、Monarch280、Monarch460、Monarch800、Monarch880、Monarch900、Monarch1000、Monarch1100、Monarch1300、Monarch1400、Monarch4630、REGAL(登録商標、以下同じ。)99、REGAL99R、REGAL415、REGAL415R、REGAL250、REGAL250R、REGAL330、REGAL400R、REGAL55R0、REGAL660R、BLACK PEARLS480、PEARLS130、VULCAN(登録商標、以下同じ。) XC72R、ELFTEX(登録商標)-8
ビルラー社製:RAVEN(登録商標、以下同じ。)11、RAVEN14、RAVEN15、RAVEN16、RAVEN22、RAVEN30、RAVEN35、RAVEN40、RAVEN410、RAVEN420、RAVEN450、RAVEN500、RAVEN780、RAVEN850、RAVEN890H、RAVEN1000、RAVEN1020、RAVEN1040、RAVEN1060U、RAVEN1080U、RAVEN1170、RAVEN1190U、RAVEN1250、RAVEN1500、RAVEN2000、RAVEN2500U、RAVEN3500、RAVEN5000、RAVEN5250、RAVEN5750、RAVEN7000
平均粒子径は数平均粒子径を意味し、電子顕微鏡観察により数万倍で撮影された写真を数視野撮影し、これらの写真の粒子を画像処理装置により2000~3000個程度計測する粒子画像解析により求められる円相当径を意味する。
1.樹脂とシクロヘキサノン、トルエン、キシレン等の溶剤とを混合して加熱溶解させた樹脂溶液と、カーボンブラック及び水を混合した懸濁液とを混合撹拌し、カーボンブラックと水とを分離させた後、水を除去して加熱混練して得られた組成物をシート状に成形し、粉砕した後、乾燥させる方法;
2.前記と同様にして調製した樹脂溶液と懸濁液とを混合撹拌してカーボンブラック及び樹脂を粒状化した後、得られた粒状物を分離、加熱して残存する溶剤及び水を除去する方法;
3.前記例示した溶剤にマレイン酸、フマル酸等のカルボン酸を溶解させ、カーボンブラックを添加、混合して乾燥させ、溶剤を除去してカルボン酸添着カーボンブラックを得た後、これに樹脂を添加してドライブレンドする方法;
4.被覆させる樹脂を構成する反応性基含有モノマー成分と水とを高速撹拌して懸濁液を調製し、重合後冷却して重合体懸濁液から反応性基含有樹脂を得た後、これにカーボンブラックを添加して混練し、カーボンブラックと反応性基とを反応させ(カーボンブラックをグラフトさせ)、冷却及び粉砕する方法;
等を採用することができる。
具体的な合成樹脂としては、フェノール樹脂、メラミン樹脂、キシレン樹脂、ジアリルフタレート樹脂、グリプタル樹脂、エポキシ樹脂、アルキルベンゼン樹脂等の熱硬化性樹脂や、ポリスチレン、ポリカーボネート、ポリエチレンテレフタレート、ポリブチレンテレフタレート、変性ポリフェニレンオキサイド、ポリスルフォン、ポリパラフェニレンテレフタルアミド、ポリアミドイミド、ポリイミド、ポリアミノビスマレイミド、ポリエーテルスルフォポリフェニレンスルフォン、ポリアリレート、ポリエーテルエーテルケトン等の熱可塑性樹脂が使用できる。カーボンブラックに対する樹脂の被覆量は、カーボンブラックと樹脂の合計量に対し1~30質量%が好ましく、前記下限値以上とすることで被覆を十分なものとすることができる傾向がある。一方、前記上限値以下とすることで、樹脂同士の粘着を防ぎ、分散性が良好なものとすることができる傾向がある。
本発明の感光性着色組成物において、顔料の平均粒子径は、動的光散乱(DLS)により測定された顔料粒子径から求めた値である。粒子径測定は、十分に希釈された感光性着色組成物(通常は希釈して、顔料濃度0.005~0.2質量%程度に調製する。但し測定機器により推奨された濃度があれば、その濃度に従う。)に対して行い、25℃にて測定する。
キノンイミン系染料として、例えば、C.I.ベーシックブルー3、C.I.ベーシックブルー9が挙げられる。
キノリン系染料として、例えば、C.I.ソルベントイエロー33、C.I.アシッドイエロー3、C.I.ディスパースイエロー64が挙げられる。
ニトロ系染料として、例えば、C.I.アシッドイエロー1、C.I.アシッドオレンジ3、C.I.ディスパースイエロー42が挙げられる。
本発明で用いる(b)アルカリ可溶性樹脂としては、アルカリ可溶性を示す樹脂であれば特に限定はなく、例えば、カルボキシ基又は水酸基を含む樹脂が挙げられ、より具体的には、例えば、エポキシ(メタ)アクリレート系樹脂、アクリル系樹脂、カルボキシ基含有エポキシ樹脂、カルボキシ基含有ウレタン樹脂、ノボラック系樹脂、ポリビニルフェノール系樹脂が挙げられる。特に、
(b1)エポキシ(メタ)アクリレート系樹脂
(b2)アクリル共重合樹脂
が優れた製版性の観点から好適に用いられる。これらは1種を単独で、あるいは2種以上を併用することができる。
(b1)エポキシ(メタ)アクリレート系樹脂は、エポキシ化合物(エポキシ樹脂)とα,β-不飽和モノカルボン酸及び/又はエステル部分にカルボキシ基を有するα,β-不飽和モノカルボン酸エステルとの反応により生成した水酸基を、さらに多塩基酸及び/又はその無水物等の水酸基と反応し得る置換基を2個以上有する化合物と反応させて得られる樹脂である。
上記、多塩基酸及び/又はその無水物を水酸基と反応させる前に、水酸基と反応し得る置換基を2個以上有する化合物を反応させた後、多塩基酸及び/又はその無水物を反応させて得られる樹脂も、(b1)エポキシ(メタ)アクリレート系樹脂に含まれる。
エポキシ(メタ)アクリレート系樹脂は化学構造上、実質的にエポキシ基を有さず、かつ「(メタ)アクリレート」に限定されるものではないが、エポキシ化合物(エポキシ樹脂)が原料であり、かつ、「(メタ)アクリレート」が代表例であるので慣用に従いこのように命名されている。
(b1)エポキシ(メタ)アクリレート系樹脂としては、アウトガスの観点から、主鎖に芳香族環を有するものをより好適に用いることができる。
エポキシ樹脂にα,β-不飽和モノカルボン酸又はカルボキシ基を有するα,β-不飽和モノカルボン酸エステルを付加させ、さらに、多塩基酸及び/又はその無水物を反応させることによって得られたアルカリ可溶性樹脂。
<エポキシ(メタ)アクリレート系樹脂(b1-2)>
エポキシ樹脂にα,β-不飽和モノカルボン酸又はカルボキシ基を有するα,β-不飽和モノカルボン酸エステルを付加させ、さらに、多価アルコール、及び多塩基酸及び/又はその無水物と反応させることによって得られたアルカリ可溶性樹脂。
原料となるエポキシ樹脂の種類としては、例えば、クレゾールノボラック型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、トリスフェノールメタン型エポキシ樹脂、ビフェニルノボラック型エポキシ樹脂、ナフタレンノボラック型エポキシ樹脂、ジシクロペンタジエンとフェノール又はクレゾールとの重付加反応物とエピハロヒドリンとの反応生成物であるエポキシ樹脂、アダマンチル基含有エポキシ樹脂、フルオレン型エポキシ樹脂を好適に用いることができ、主鎖に芳香族環を有するものをより好適に用いることができる。
α,β-不飽和モノカルボン酸又はカルボキシ基を有するα,β-不飽和モノカルボン酸エステルの使用量は、エポキシ樹脂のエポキシ基1当量に対し0.5~1.2当量が好ましく、さらに好ましくは0.7~1.1当量である。α,β-不飽和モノカルボン酸又はカルボキシ基を有するα,β-不飽和モノカルボン酸エステルの使用量を前記下限値以上とすることで不飽和基の導入量の不足が抑制でき、引き続く多塩基酸及び/又はその無水物との反応も十分なものとしやすい傾向がある。前記上限値以下とすることでα,β-不飽和モノカルボン酸又はカルボキシ基を有するα,β-不飽和モノカルボン酸エステルの未反応物の残存を抑制でき、硬化特性を良好なものとしやすい傾向が認められる。
式(b1-I)中のベンゼン環は、さらに任意の置換基により置換されていてもよい。
式(b1-I)中のベンゼン環は、さらに任意の置換基により置換されていてもよい。
前記式(b1-I)において、R12は置換基を有していてもよい2価の炭化水素基を表す。
2価の炭化水素基としては、2価の脂肪族基、2価の芳香族環基、1以上の2価の脂肪族基と1以上の2価の芳香族環基とを連結した基が挙げられる。
2価の分岐鎖状の脂肪族基としては、前述の2価の直鎖状の脂肪族基に、側鎖として、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基を有する構造が挙げられる。
2価の環状の脂肪族基が有する環の数は特に限定されないが、1以上が好ましく、2以上がより好ましい。また、12以下が好ましく、10以下がより好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、1~12が好ましく、1~10がより好ましく、2~10がさらに好ましい。前記下限値以上とすることで強固な膜となり、基板密着性が良好となる傾向がある。前記上限値以下とすることで感度の悪化や現像時の膜減りを抑制しやすく、解像性が向上する傾向がある。
2価の環状の脂肪族基としては、例えば、シクロヘキサン環、シクロヘプタン環、シクロデカン環、シクロドデカン環、ノルボルナン環、イソボルナン環、アダマンタン環、シクロドデカン環、ジシクロペンタジエン、ジシクロペンタン等の環から水素原子を2つ除した基が挙げられる。骨格の剛直性の観点から、ジシクロペンタジエン環、ジシクロペンタン環、アダマンタン環から水素原子を2つ除した基が好ましい。
2価の芳香族複素環基における芳香族複素環としては、単環であっても縮合環であってもよい。2価の芳香族複素環基としては、例えば、2個の遊離原子価を有する、フラン環、ベンゾフラン環、チオフェン環、ベンゾチオフェン環、ピロール環、ピラゾール環、イミダゾール環、オキサジアゾール環、インドール環、カルバゾール環、ピロロイミダゾール環、ピロロピラゾール環、ピロロピロール環、チエノピロール環、チエノチオフェン環、フロピロール環、フロフラン環、チエノフラン環、ベンゾイソオキサゾール環、ベンゾイソチアゾール環、ベンゾイミダゾール環、ピリジン環、ピラジン環、ピリダジン環、ピリミジン環、トリアジン環、キノリン環、イソキノリン環、シノリン環、キノキサリン環、フェナントリジン環、ベンゾイミダゾール環、ペリミジン環、キナゾリン環、キナゾリノン環、アズレン環が挙げられる。
パターニング特性の観点から、2個の遊離原子価を有するベンゼン環又はナフタレン環が好ましく、2個の遊離原子価を有するベンゼン環がより好ましい。
2価の脂肪族基の数は特に限定されないが、1以上が好ましく、2以上がより好ましく、10以下が好ましく、5以下がより好ましく、3以下がさらに好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、1~10が好ましく、1~5がより好ましく、1~3がさらに好ましく、2~3が特に好ましい。前記下限値以上とすることで強固な膜が得られやすく、現像時に生じる表面荒れが生じにくく、基板への密着性が良好となる傾向がある。前記上限値以下とすることで感度の悪化や現像時の膜減りを抑制しやすく、解像性が向上する傾向がある。
2価の芳香族環基の数は特に限定されないが、1以上が好ましく、2以上がより好ましく、10以下が好ましく、5以下がより好ましく、3以下がさらに好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、1~10が好ましく、1~5がより好ましく、1~3がさらに好ましく、2~3が特に好ましい。前記下限値以上とすることで強固な膜が得られやすく、現像時に生じる表面荒れが生じにくく、基板への密着性が良好となる傾向がある。前記上限値以下とすることで感度の悪化や現像時の膜減りを抑制しやすく、解像性が向上する傾向がある。
パターニング特性の観点から、無置換であることが好ましい。
式(b1-I-1)中のベンゼン環は、さらに任意の置換基により置換されていてもよい。
パターニング特性の観点から、好ましくは、マレイン酸、コハク酸、イタコン酸、フタル酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、ピロメリット酸、トリメリット酸、ビフェニルテトラカルボン酸であり、より好ましくは、テトラヒドロフタル酸、ビフェニルテトラカルボン酸、ビフェニルテトラカルボン酸である。
式(b1-II)において、R14は、環状炭化水素基を側鎖として有する2価の炭化水素基を表す。
環状炭化水素基としては、脂肪族環基又は芳香族環基が挙げられる。
脂肪族環基の炭素数は特に限定されないが、4以上が好ましく、6以上がより好ましく、8以上がさらに好ましい。また、40以下が好ましく、30以下がより好ましく、20以下がさらに好ましく、15以下が特に好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、4~40が好ましく、4~30がより好ましく、6~20がさらに好ましく、8~15が特に好ましい。前記下限値以上とすることで強固な膜が得られやすく、現像時に生じる表面荒れが生じにくくなる傾向がある。前記上限値以下とすることで感度の悪化や現像時の膜減りを抑制しやすく、解像性が向上する傾向がある。
脂肪族環基における脂肪族環としては、例えば、シクロヘキサン環、シクロヘプタン環、シクロデカン環、シクロドデカン環、ノルボルナン環、イソボルナン環、アダマンタン環、シクロドデカン環が挙げられる。感光性着色組成物の残膜率と解像性の観点から、アダマンタン環が好ましい。
芳香族環基としては、芳香族炭化水素環基、芳香族複素環基が挙げられる。芳香族環基の炭素数は特に限定されないが、4以上が好ましく、6以上がより好ましく、8以上がさらに好ましく、10以上がよりさらに好ましく、12以上が特に好ましい。また、40以下が好ましく、30以下がより好ましく、20以下がさらに好ましく、15以下が特に好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、4~40が好ましく、6~40がより好ましく、8~30がさらに好ましく、10~20がよりさらに好ましく、12~15が特に好ましい。前記下限値以上とすることで強固な膜が得られやすく、現像時に生じる表面荒れが生じにくくなる傾向がある。前記上限値以下とすることでパターニング特性が良好となる傾向がある。
芳香族環基における芳香族環としては、例えば、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、ペリレン環、テトラセン環、ピレン環、ベンズピレン環、クリセン環、トリフェニレン環、アセナフテン環、フルオランテン環、フルオレン環が挙げられる。パターニング特性の観点から、フルオレン環が好ましい。
2価の分岐鎖状の脂肪族基としては、例えば、前述の2価の直鎖状の脂肪族基に、側鎖としてメチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基を有する構造が挙げられる。
2価の環状の脂肪族基が有する環の数は特に限定されないが、1以上が好ましく、2以上がより好ましい。また、10以下が好ましく、5以下がより好ましく、3以下がさらに好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、1~10が好ましく、1~5がより好ましく、1~3がさらに好ましく、2~3が特に好ましい。前記下限値以上とすることで強固な膜となり、基板密着性と良好となる傾向がある。また、前記上限値以下とすることで感度の悪化や現像時の膜減りを抑制しやすく、解像性が向上する傾向がある。
2価の環状の脂肪族基としては、例えば、シクロヘキサン環、シクロヘプタン環、シクロデカン環、シクロドデカン環、ノルボルナン環、イソボルナン環、アダマンタン環、シクロドデカン環の環から水素原子を2つ除した基が挙げられる。骨格の剛直性の観点から、アダマンタン環から水素原子を2つ除した基が好ましい。
2価の芳香族複素環基における芳香族複素環としては、単環であっても縮合環であってもよい。2価の芳香族複素環基としては、例えば、2個の遊離原子価を有する、フラン環、ベンゾフラン環、チオフェン環、ベンゾチオフェン環、ピロール環、ピラゾール環、イミダゾール環、オキサジアゾール環、インドール環、カルバゾール環、ピロロイミダゾール環、ピロロピラゾール環、ピロロピロール環、チエノピロール環、チエノチオフェン環、フロピロール環、フロフラン環、チエノフラン環、ベンゾイソオキサゾール環、ベンゾイソチアゾール環、ベンゾイミダゾール環、ピリジン環、ピラジン環、ピリダジン環、ピリミジン環、トリアジン環、キノリン環、イソキノリン環、シノリン環、キノキサリン環、フェナントリジン環、ベンゾイミダゾール環、ペリミジン環、キナゾリン環、キナゾリノン環、アズレン環が挙げられる。パターニング特性の観点から、2個の遊離原子価を有するベンゼン環又はナフタレン環が好ましく、2個の遊離原子価を有するベンゼン環がより好ましい。
2価の脂肪族基の数は特に限定されないが、1以上が好ましく、2以上がより好ましく、10以下が好ましく、5以下がより好ましく、3以下がさらに好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、1~10が好ましく、1~5がより好ましく、1~3がさらに好ましく、2~3が特に好ましい。前記下限値以上とすることで強固な膜が得られやすく、現像時に生じる表面荒れが生じにくく、基板への密着性が良好となる傾向がある。前記上限値以下とすることで感度の悪化や現像時の膜減りを抑制しやすく、解像性が向上する傾向がある。
2価の芳香族環基の数は特に限定されないが、1以上が好ましく、2以上がより好ましく、10以下が好ましく、5以下がより好ましく、3以下がさらに好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、1~10が好ましく、1~5がより好ましく、1~3がさらに好ましく、2~3が特に好ましい。前記下限値以上とすることで強固な膜が得られやすく、現像時に生じる表面荒れが生じにくく、基板への密着性が良好となる傾向がある。前記上限値以下とすることで感度の悪化や現像時の膜減りを抑制しやすく、解像性が向上する傾向がある。
式(b1-II)において、R15及びR16は各々独立に、置換基を有していてもよい2価の脂肪族基を表す。
2価の分岐鎖状の脂肪族基としては、前述の2価の直鎖状の脂肪族基に、側鎖として、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基を有する構造が挙げられる。
2価の環状の脂肪族基が有する環の数は特に限定されないが、1以上が好ましく、2以上がより好ましい。また、12以下が好ましく、10以下がより好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、1~12が好ましく、2~10がより好ましい。前記下限値以上とすることで強固な膜となり、基板密着性が良好となる傾向がある。前記上限値以下とすることで感度の悪化や現像時の膜減りを抑制しやすく、解像性が向上する傾向がある。
2価の環状の脂肪族基としては、例えば、シクロヘキサン環、シクロヘプタン環、シクロデカン環、シクロドデカン環、ノルボルナン環、イソボルナン環、アダマンタン環、シクロドデカン環、ジシクロペンタジエン環から水素原子を2つ除した基が挙げられる。骨格の剛直性の観点から、ジシクロペンタジエン環、アダマンタン環から水素原子を2つ除した基が好ましい。
式(b1-II)において、m及びnは各々独立に0~2の整数を表す。前記下限値以上とすることでパターニング適正が良好となり、現像時に生じる表面荒れが生じにくくなる傾向があり、また、前記上限値以下とすることで現像性が良好となる傾向がある。現像性の観点からm及びnが0であることが好ましい。パターニング適正、現像時に生じる表面荒れを抑制する観点からm及びnが1以上であることが好ましい。
式(b1-II-1)において、Rαは、置換基を有していてもよい1価の環状炭化水素基を表す。
環状炭化水素基としては、脂肪族環基又は芳香族環基が挙げられる。
脂肪族環基の炭素数は特に限定されないが、4以上が好ましく、6以上がより好ましく、8以上がさらに好ましい。また、40以下が好ましく、30以下がより好ましく、20以下がさらに好ましく、15以下が特に好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、4~40が好ましく、4~30がより好ましく、6~20がさらに好ましく、8~15が特に好ましい。前記下限値以上とすることで強固な膜が得られやすく、現像時に生じる表面荒れが生じにくくなる傾向がある。前記上限値以下とすることでパターニング特性が良好となる傾向がある。
脂肪族環基における脂肪族環としては、例えば、シクロヘキサン環、シクロヘプタン環、シクロデカン環、シクロドデカン環、ノルボルナン環、イソボルナン環、アダマンタン環、シクロドデカン環が挙げられる。強固な膜特性の観点から、アダマンタン環が好ましい。
芳香族環基としては、芳香族炭化水素環基、芳香族複素環基が挙げられる。また、芳香族環基の炭素数は特に限定されないが、4以上が好ましく、5以上がより好ましく、6以上がさらに好ましい。また、30以下が好ましく、20以下がより好ましく、15以下がさらに好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、4~30が好ましく、5~20がより好ましく、6~15がさらに好ましい。前記下限値以上とすることで強固な膜が得られやすく、現像時に生じる表面荒れが生じにくくなる傾向がある。前記上限値以下とすることでパターニング特性が良好となる傾向がある。
芳香族環基における芳香族環としては、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、フルオレン環が挙げられる。現像溶解性の観点から、フルオレン環が好ましい。
パターニング特性の観点から、無置換であることが好ましい。
式(b1-II-2)中のベンゼン環は、さらに任意の置換基により置換されていてもよい。
式(b1-II-2)において、Rβは、置換基を有していてもよい2価の環状炭化水素基を表す。
環状炭化水素基としては、脂肪族環基又は芳香族環基が挙げられる。
脂肪族環基の炭素数は4以上が好ましく、6以上がより好ましく、8以上がさらに好ましい。また、40以下が好ましく、35以下がより好ましく、30以下がさらに好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、4~40が好ましく、6~35がより好ましく、8~30がさらに好ましい。前記下限値以上とすることで現像時の膜表面の荒れを抑制する傾向がある。前記上限値以下とすることで感度の悪化や現像時の膜減りを抑制しやすく、解像性が向上する傾向がある。
脂肪族環基における脂肪族環としては、例えば、シクロヘキサン環、シクロヘプタン環、シクロデカン環、シクロドデカン環、ノルボルナン環、イソボルナン環、アダマンタン環、シクロドデカン環が挙げられる。現像時の膜減り、解像性の観点から、アダマンタン環が好ましい。
芳香族環基としては、芳香族炭化水素環基、芳香族複素環基が挙げられる。
芳香族環基の炭素数は4以上が好ましく、6以上がより好ましく、8以上がさらに好ましく、10以上がよりさらに好ましい。また、40以下が好ましく、30以下がより好ましく、20以下がさらに好ましく、15以下が特に好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、4~40が好ましく、6~30がより好ましく、8~20がさらに好ましく、10~15が特に好ましい。前記下限値以上とすることで強固な膜が得られやすく、現像時に生じる表面荒れが生じにくくなる傾向がある。前記上限値以下とすることで感度の悪化や膜減りを抑制しやすく、解像性が向上する傾向がある。
芳香族環基における芳香族環としては、例えば、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、フルオレン環が挙げられる。現像性の観点から、フルオレン環が好ましい。
また、式(b1-II-2)中の2つのベンゼン環はRβを介して連結しているところ、さらに、置換基を介して連結して三環構造を形成していてもよい。この場合の置換基としては、-O-、-S-、-NH-、-CH2-等の2価の基が挙げられる。例えば、-O-を介して連結して三環構造を形成するとは、それぞれのベンゼン環上でRβに結合する炭素原子のオルト位の炭素原子同士が-O-を介して連結して、キサンテン骨格を形成することを意味する。
パターニング特性の観点から、無置換であることが好ましい。また、膜減り等を生じにくくする観点から、メチル基置換であることが好ましい。
多塩基酸としては、例えば、マレイン酸、コハク酸、イタコン酸、フタル酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、ピロメリット酸、トリメリット酸、ベンゾフェノンテトラカルボン酸、メチルヘキサヒドロフタル酸、エンドメチレンテトラヒドロフタル酸、クロレンド酸、メチルテトラヒドロフタル酸、ビフェニルテトラカルボン酸が挙げられる。
パターニング特性の観点から、好ましくは、マレイン酸、コハク酸、イタコン酸、フタル酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、ピロメリット酸、トリメリット酸、ビフェニルテトラカルボン酸であり、より好ましくは、テトラヒドロフタル酸、ビフェニルテトラカルボン酸、ビフェニルテトラカルボン酸である。
また、前述のカルボキシ基含有エポキシ(メタ)アクリレート系樹脂の一部を、他のバインダー樹脂に置き換えて用いてもよい。即ち、カルボキシ基含有エポキシ(メタ)アクリレート系樹脂と他のバインダー樹脂を併用してもよい。この場合において、(b)アルカリ可溶性樹脂におけるカルボキシ基含有エポキシ(メタ)アクリレート系樹脂の割合を、50質量%以上とすることが好ましく、60質量%以上とすることがより好ましく、70質量%以上とすることがさらに好ましく、80質量%以上とすることが特に好ましく、100質量%以下であってよい。
不飽和単量体(b2-1)としては、例えば、(メタ)アクリル酸、クロトン酸、α-クロルアクリル酸、けい皮酸等の不飽和モノカルボン酸;マレイン酸、無水マレイン酸、フマル酸、シトラコン酸、無水シトラコン酸、メサコン酸等の不飽和ジカルボン酸又はその無水物;こはく酸モノ〔2-(メタ)アクリロイロキシエチル〕、フタル酸モノ〔2-(メタ)アクリロイロキシエチル〕等の2価以上の多価カルボン酸のモノ〔(メタ)アクリロイロキシアルキル〕エステル;ω-カルボキシポリカプロラクトンモノ(メタ)アクリレート等の両末端にカルボキシ基と水酸基とを有するポリマーのモノ(メタ)アクリレート;p-ビニル安息香酸を挙げることができる。
これらの不飽和単量体(b2-1)は、単独で又は2種以上を併用することができる。
スチレン、α-メチルスチレン、p-ヒドロキシスチレン、p-ヒドロキシ-α-メチルスチレン、p-ビニルベンジルグリシジルエーテル、アセナフチレン等の芳香族ビニル化合物;
ポリスチレン、ポリメチル(メタ)アクリレート、ポリ-n-ブチル(メタ)アクリレート、ポリシロキサン等の重合体分子鎖の末端にモノ(メタ)アクリロイル基を有するマクロモノマーを挙げることができる。
これらの不飽和単量体(b2-2)は、単独で又は2種以上を併用することができる。
不飽和単量体(b2-1)と不飽和単量体(b2-2)の共重合体は、公知の方法により製造することができるが、例えば、日本国特開2003-222717号公報、日本国特開2006-259680号公報、国際公開第2007/029871号公報に開示されている方法により、その構造やMw、Mw/Mn(Mnは数平均分子量である。)を制御することもできる。
(c)光重合開始剤は、光を直接吸収し、分解反応又は水素引き抜き反応を起こし、重合活性ラジカルを発生する機能を有する成分である。必要に応じて重合促進剤(連鎖移動剤)、増感色素等の付加剤を添加して使用してもよい。
光重合開始剤としては、例えば、日本国特開昭59-152396号公報、日本国特開昭61-151197号公報に記載のチタノセン化合物を含むメタロセン化合物;日本国特開2000-56118号公報に記載のヘキサアリールビイミダゾール誘導体類;日本国特開平10-39503号公報記載のハロメチル化オキサジアゾール誘導体類、ハロメチル-s-トリアジン誘導体類;α-アミノアルキルフェノン誘導体類;日本国特開2000-80068号公報、日本国特開2006-36750号公報等に記載されているオキシムエステル系化合物が挙げられる。
R21bは芳香環を含む任意の置換基を示す。
R22aは、置換基を有していてもよいアルカノイル基、又は、置換基を有していてもよいアリーロイル基を示す。
nは0又は1の整数を示す。
アルキル基が有していてもよい置換基としては、例えば、芳香族環基、水酸基、カルボキシ基、ハロゲン原子、アミノ基、アミド基、4-(2-メトキシ-1-メチル)エトキシ-2-メチルフェニル基、N-アセチル-N-アセトキシアミノ基が挙げられる。合成容易性の観点からは、無置換であることが好ましい。
芳香族環基が有していてもよい置換基としては、例えば、水酸基、カルボキシ基、ハロゲン原子、アミノ基、アミド基、アルキル基、アルコキシ基、これらの置換基が連結した基が挙げられる。現像性の観点からアルキル基、アルコキシ基、これらを連結した基が好ましく、連結したアルコキシ基がより好ましい。
現像性の観点から、R21aが置換基を有していてもよい芳香族環基であることが好ましく、連結したアルコキシ基を置換基に有する芳香族環基であることがさらに好ましい。
アルカノイル基が有していてもよい置換基としては、例えば、芳香族環基、水酸基、カルボキシ基、ハロゲン原子、アミノ基、アミド基が挙げられる。合成容易性の観点からは、無置換であることが好ましい。
アリーロイル基が有していてもよい置換基としては、例えば、水酸基、カルボキシ基、ハロゲン原子、アミノ基、アミド基、アルキル基が挙げられる。合成容易性の観点からは、無置換であることが好ましい。
感度の観点から、R22aが置換基を有していてもよいアルカノイル基であることが好ましく、無置換のアルカノイル基であることがより好ましく、アセチル基であることがさらに好ましい。
光重合開始剤には、必要に応じて、感応感度を高める目的で、画像露光光源の波長に応じた増感色素、重合促進剤を配合させることができる。増感色素としては、例えば、日本国特開平4-221958号公報、日本国特開平4-219756号公報に記載のキサンテン色素、日本国特開平3-239703号公報、日本国特開平5-289335号公報に記載の複素環を有するクマリン色素、日本国特開平3-239703号公報、日本国特開平5-289335号公報に記載の3-ケトクマリン化合物、日本国特開平6-19240号公報に記載のピロメテン色素、日本国特開昭47-2528号公報、日本国特開昭54-155292号公報、日本国特公昭45-37377号公報、日本国特開昭48-84183号公報、日本国特開昭52-112681号公報、日本国特開昭58-15503号公報、日本国特開昭60-88005号公報、日本国特開昭59-56403号公報、日本国特開平2-69号公報、日本国特開昭57-168088号公報、日本国特開平5-107761号公報、日本国特開平5-210240号公報、日本国特開平4-288818号公報に記載のジアルキルアミノベンゼン骨格を有する色素を挙げることができる。
増感色素は、1種を単独で用いてもよく、2種以上を併用してもよい。
本発明の感光性着色組成物は、(d)エチレン性不飽和化合物を含む。(d)エチレン性不飽和化合物を含むことで、感度が向上する。
本発明に用いられる(d)エチレン性不飽和化合物は、分子内にエチレン性不飽和基を少なくとも1個有する化合物である。具体的には、例えば、(メタ)アクリル酸、(メタ)アクリル酸アルキルエステル、アクリロニトリル、スチレン、エチレン性不飽和結合を1個有するカルボン酸、多価又は1価アルコールのモノエステルが挙げられる。
多官能エチレン性単量体としては、例えば、脂肪族ポリヒドロキシ化合物と不飽和カルボン酸とのエステル;芳香族ポリヒドロキシ化合物と不飽和カルボン酸とのエステル;脂肪族ポリヒドロキシ化合物、芳香族ポリヒドロキシ化合物等の多価ヒドロキシ化合物と、不飽和カルボン酸及び多塩基性カルボン酸とのエステル化反応により得られるエステル;が挙げられる。
これらは1種を単独で用いてもよく、2種以上を併用してもよい。
本発明の感光性着色組成物においては、(e)含窒素芳香族化合物を含む。
(e)含窒素芳香族化合物は銀などの金属に配位することで金属を侵食するようなガス成分から保護する効果があると推定される。感光性着色組成物中に添加しておくことで隔壁の加熱焼成工程において塗膜から昇華し陽極の材料として用いられる金属を保護することで、パネルの点灯不良につながるような電極の構造変形を抑制すると考えられる。
本発明の第1の態様の感光性着色組成物における(e)含窒素芳香族化合物は、下記一般式(1)及び/又は下記一般式(2)で表される化合物を含む。
表面荒れの観点から、R1はメチル基が好ましい。
表面荒れの観点から、R2は水素原子が好ましい。
表面荒れを抑制する観点から、lは0~1が好ましく、0即ち無置換がより好ましい。
表面荒れを抑制する観点から、m、nは、それぞれ0~1が好ましく、0即ち無置換がより好ましい。
(e)含窒素芳香族化合物は、1種を単独で使用してもよく、また2種以上を併用してもよい。
1員環化合物としては、例えば、ピラゾール、イミダゾール、ピリジン、ビピリジン、ピリダジン、ピリミジン、ピラジン、トリアジン、テトラジンが挙げられる。2員環化合物としては、例えば、インドール、イソインドール、ベンゾイミダゾール、ベンゾトリアゾール、プリン、キノリン、イソキノリン、キノキサリン、キナゾリン、プテリジン、フサラジンが挙げられる。3員環化合物としては、例えば、アクリジン、フェナントリジン、フェナジンが挙げられる。
本発明の第2の態様の感光性着色組成物における(e)含窒素芳香族化合物は置換基を有してもよく、置換基としては、アルキル基、カルボキシ基、又はニトロ基が挙げられる。アルキル基としては、特に限定されないが、例えば、メチル基、エチル基、プロピル基、イソプロピル基が挙げられる。
これらのうち、表面荒れ抑制の観点から1員環化合物、又は2員環化合物が好ましく、ベンゾトリアゾール、ビピリジンがより好ましく、ベンゾトリアゾールがさらに好ましい。
品質の安定性を確保する目的で、(a)着色剤を微細に分散させ、且つその分散状態を安定化させるため、本発明の感光性着色組成物は(f)分散剤を含む。
(f)分散剤としては、官能基を有する高分子分散剤が好ましく、さらに、分散安定性の面からカルボキシ基;リン酸基;スルホン酸基;又はこれらの塩基;一級、二級又は三級アミノ基;四級アンモニウム塩基;ピリジン、ピリミジン、ピラジン等の含窒素ヘテロ環由来の基、等の官能基を有する高分子分散剤が好ましい。特に、一級、二級又は三級アミノ基;四級アンモニウム塩基;ピリジン、ピリミジン、ピラジン等の含窒素ヘテロ環由来の基、等の塩基性官能基を有する高分子分散剤が少量の分散剤で顔料を分散することができるとの観点から特に好ましい。
高分子分散剤は、1種を単独で用いてもよく、2種以上を併用してもよい。
分散性、保存性の面からは、塩基性官能基を有し、ポリエステル結合及びポリエーテル結合のいずれか一方又は両方を有する高分子分散剤が好ましい。
A-B又はB-A-Bブロック共重合体は、例えば、以下に示すリビング重合法にて調製される。
リビング重合法には、アニオンリビング重合法、カチオンリビング重合法、ラジカルリビング重合法があり、このうち、アニオンリビング重合法は、重合活性種がアニオンであり、例えば下記スキームで表される。
本発明で用いることができるA-Bブロック共重合体、B-A-Bブロック共重合体1g中の4級アンモニウム塩基の量は、0.1~10mmolであることが好ましい。この範囲内にすることで良好な分散性を確保しやすい傾向がある。
ここで、アクリル系分散剤のアミン価は、分散剤試料中の溶剤を除いた固形分1gあたりの塩基量と当量のKOHの質量で表し、次の方法により測定する。
100mLのビーカーに分散剤試料の0.5~1.5gを精秤し、50mLの酢酸で溶解する。pH電極を備えた自動滴定装置を使って、この溶液を0.1mol/LのHClO4酢酸溶液にて中和滴定する。滴定pH曲線の変曲点を滴定終点とし次式によりアミン価を求める。
〔但し、W:分散剤試料秤取量[g]、V:滴定終点での滴定量[mL]、S:分散剤試料の固形分濃度[質量%]を表す。〕
アルキル基としては、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基が挙げられ、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基が好ましく、メチル基、エチル基、プロピル基、ブチル基がより好ましく、メチル基、エチル基がさらに好ましい。
式(V)における、Y-としては、例えば、Cl-、Br-、I-、ClO4 -、BF4 -、CH3COO-、PF-が挙げられる。
また、国際公開2018/079659号に記載された芳香族ジカルボン酸イミドアニオン、芳香族スルホン酸アニオン、芳香族ホスホン酸アニオン、芳香族カルボン酸アニオン;国際公開2019/107020号に記載されたアルキル硫酸アニオン、アルキルスルホン酸アニオン;も好適に用いうる。
Y-としては、現像形態の観点からはCl-が好ましい。表面荒れを抑制する観点からは、アルキルスルホン酸アニオンが好ましい。
式(VI)のR35及びR36における、置換基を有していてもよいアリール基としては、式(V)のR31~R33として例示したものを好ましく採用することができる。
式(VI)のR35及びR36における、置換基を有していてもよいアラルキル基としては、式(V)のR31~R33として例示したものを好ましく採用することができる。
R38における、アルキル基が有していてもよい置換基としては、例えば、ハロゲン原子、アルコキシ基が挙げられる。アリール基又はアラルキル基が有していてもよい置換基としては、例えば、鎖状のアルキル基、ハロゲン原子、アルコキシ基が挙げられる。R38で示される鎖状のアルキル基には、直鎖状及び分岐鎖状のいずれも含まれる。
これらのアクリル系分散剤は1種を単独で使用してもよく、又は2種以上を併用してもよい。
本発明の感光性着色組成物には、上述の成分の他、シランカップリング剤等の密着向上剤、界面活性剤、顔料誘導体、光酸発生剤、架橋剤、メルカプト化合物、重合禁止剤等の添加剤を適宜配合することができる。
本発明の感光性着色組成物には、基板との密着性を改善するため、密着向上剤を含有させてもよい。密着向上剤としては、シランカップリング剤、燐酸基含有化合物が好ましい。
シランカップリング剤としては、例えば、エポキシ系、(メタ)アクリル系、アミノ系等種々のものを1種単独で用いても、2種以上を併用してもよい。
燐酸基含有化合物としては、(メタ)アクリロイル基含有ホスフェート類が好ましく、下記一般式(g1)、(g2)又は(g3)で表されるものが好ましい。
これらの燐酸基含有化合物は、1種単独で用いても、2種以上を併用してもよい。
本発明の感光性着色組成物は、塗布性向上ため、界面活性剤を含有してもよい。
このような界面活性剤としては、例えば、TSF4460(モメンティブ・パフォーマンス・マテリアルズ社製)、DFX-18(ネオス社製)、BYK-300、BYK-325、BYK-330(ビックケミー社製)、KP340(信越シリコーン社製)、F-470、F-475、F-478、F-554、F-559(DIC社製)、SH7PA(東レ・ダウコーニング社製)、DS-401(ダイキン社製)、L-77(日本ユニカー社製)、FC4430(3M社製)が挙げられる。
界面活性剤は、1種を用いてもよく、2種以上を併用してもよい。
本発明の感光性着色組成物には、分散性、保存性向上のため、分散助剤として顔料誘導体を含有させてもよい。
顔料誘導体としては、例えば、アゾ系、フタロシアニン系、キナクリドン系、ベンズイミダゾロン系、キノフタロン系、イソインドリノン系、ジオキサジン系、アントラキノン系、インダンスレン系、ペリレン系、ペリノン系、ジケトピロロピロール系、ジオキサジン系の誘導体が挙げられ、フタロシアニン系、キノフタロン系が好ましい。
顔料誘導体の置換基としては、例えば、スルホン酸基、スルホンアミド基及びその4級塩、フタルイミドメチル基、ジアルキルアミノアルキル基、水酸基、カルボキシ基、アミド基が顔料骨格に直接、又は、例えば、アルキル基、アリール基、複素環基を介して結合したものが挙げられ、好ましくはスルホン酸基である。置換基は一つの顔料骨格に複数置換していてもよく、複数種の置換基が置換していてもよい。
重合促進剤として、また、基板への密着性の向上のため、メルカプト化合物を添加することも可能である。
本発明の感光性着色組成物には、硬化物の形状制御の観点から、重合禁止剤を含有させてもよい。重合禁止剤を含有することでそれが塗布膜下層のラジカル重合を阻害することから、テーパー角(硬化物断面において支持体と硬化物のなす角度)を制御できると考えられる。
重合禁止剤としては、例えば、ハイドロキノン、ハイドロキノンモノメチルエーテル、メチルヒドロキノン、メトキシフェノール、2,6-ジ-tert-ブチル-4-クレゾール(BHT)が挙げられる。形状制御の観点から、2,6-ジ-tert-ブチル-4-クレゾールが好ましい。人体への安全性が特に優れるとの観点から、ハイドロキノンモノメチルエーテル、メチルヒドロキノンが好ましい。
重合禁止剤は、1種単独で用いてもよく、2種以上を併用してもよい。
(b)アルカリ可溶性樹脂を製造する際に、樹脂中に重合禁止剤が含まれることがあり、それを本発明の重合禁止剤として用いてもよいし、樹脂中に重合禁止剤の他に、それと同一、又は異なる重合禁止剤を感光性着色組成物製造時に添加してもよい。
本発明の感光性着色組成物は、溶剤を含むことが好ましい。溶剤を含むことで、着色剤を溶剤中に分散又は溶解でき、また、塗布が容易となる。
本発明の感光性着色組成物は、例えば、(a)着色剤、(b)アルカリ可溶性樹脂、(c)光重合開始剤、(d)エチレン性不飽和化合物、(e)含窒素芳香族化合物、(f)分散剤、及び必要に応じて使用されるその他の各種材料が、溶剤に溶解又は分散した状態で使用される。分散性や塗布性の観点から有機溶剤が好ましい。
エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールジプロピルエーテル、ジエチレングリコールジブチルエーテル、ジプロピレングリコールジメチルエーテルのようなグリコールジアルキルエーテル類;
エチレングリコールジアセテート、1,3-ブチレングリコールジアセテート、1,6-ヘキサノールジアセテート等のグリコールジアセテート類;
シクロヘキサノールアセテート等のアルキルアセテート類;
アミルエーテル、ジエチルエーテル、ジプロピルエーテル、ジイソプロピルエーテル、ジブチルエーテル、ジアミルエーテル、エチルイソブチルエーテル、ジヘキシルエーテルのようなエーテル類;
エタノール、プロパノール、ブタノール、ヘキサノール、シクロヘキサノール、エチレングリコール、プロピレングリコール、ブタンジオール、ジエチレングリコール、ジプロピレングリコール、トリエチレングリコール、メトキシメチルペンタノール、グリセリン、ベンジルアルコールのような1価又は多価アルコール類;
n-ペンタン、n-オクタン、ジイソブチレン、n-ヘキサン、ヘキセン、イソプレン、ジペンテン、ドデカンのような脂肪族炭化水素類;
シクロヘキサン、メチルシクロヘキサン、メチルシクロヘキセン、ビシクロヘキシルのような脂環式炭化水素類;
アミルホルメート、エチルホルメート、酢酸エチル、酢酸ブチル、酢酸プロピル、酢酸アミル、メチルイソブチレート、エチレングリコールアセテート、エチルプロピオネート、プロピルプロピオネート、酪酸ブチル、酪酸イソブチル、イソ酪酸メチル、エチルカプリレート、ブチルステアレート、エチルベンゾエート、3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、3-メトキシプロピオン酸メチル、3-メトキシプロピオン酸エチル、3-メトキシプロピオン酸プロピル、3-メトキシプロピオン酸ブチル、γ-ブチロラクトンのような鎖状又は環状エステル類;
3-メトキシプロピオン酸、3-エトキシプロピオン酸のようなアルコキシカルボン酸類;
ブチルクロリド、アミルクロリドのようなハロゲン化炭化水素類;
メトキシメチルペンタノンのようなエーテルケトン類;
アセトニトリル、ベンゾニトリルのようなニトリル類;が挙げられる。
これらの有機溶剤は、単独で用いてもよく、2種以上を併用してもよい。
グリコールアルキルエーテルアセテート類は、1種を単独で用いてもよく、2種以上を併用してもよい。
グリコールアルキルエーテルアセテート類のみで使用してもよいが、他の有機溶剤を併用してもよい。併用する有機溶剤としては、グリコールモノアルキルエーテル類が好ましい。組成物中の構成成分の溶解性から、プロピレングリコールモノメチルエーテルが好ましい。
グリコールモノアルキルエーテル類は極性が高く、添加量が多すぎると顔料が凝集しやすく、後に得られる感光性着色組成物の粘度が上がっていく等の保存安定性が低下する傾向があるので、溶剤中のグリコールモノアルキルエーテル類の割合は5質量%~30質量%が好ましく、5質量%~20質量%がより好ましい。
好ましい高沸点溶剤として、例えば、ジエチレングリコールモノ-n-ブチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート、ジプロピレングリコールメチルエーテルアセテート、1,3-ブチレングリコールジアセテート、1,6-ヘキサノールジアセテート、トリアセチンが挙げられる。
本発明の感光性着色組成物における(a)着色剤の含有割合は特に限定されないが、感光性着色組成物の全固形分量に対して5質量%以上が好ましく、10質量%以上がより好ましく、15質量%以上がさらに好ましく、20質量%以上がよりさらに好ましい。また、50質量%以下が好ましく、40質量%以下がより好ましく、30質量%以下がさらに好ましく、25質量%以下が特に好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、5~50質量%が好ましく、10~40質量%がより好ましく、15~40質量%がさらに好ましく、15~30質量%がよりさらに好ましく、15~25質量%が特に好ましい。前記下限値以上とすることで遮光性を確保出来る傾向がある。前記上限値以下とすることで分散剤量を減らすことができ、表面荒れを抑止できる傾向がある。
(c)光重合開始剤と共に増感色素を用いる場合、増感色素の含有割合は特に限定されないが、感度の観点から感光性着色組成物中の全固形分量に対して、好ましくは20質量%以下、より好ましくは15質量%以下、さらに好ましくは10質量%以下である。
感光性着色組成物中の塩素原子の含有量を少なくすることにより、加熱処理時に、特に焼成時に、感光性着色組成物中の塩素原子が分解、揮発、あるいは昇華することによる、銀などの金属電極に対する腐食あるいはマイグレーションを抑制し、表面荒れを抑制できると考えられる。
感光性着色組成物中の塩素原子は、主に(a)着色剤、(b)アルカリ可溶性樹脂、(f)分散剤といった構成材料に含有されるが、他の材料にも含有される場合がある。塩素原子の含有量を本発明の規定する数値範囲に入れるためには、一つの構成材料の塩素含有量を減らしてもよく、あるいは各々の材料における塩素含有量を減らし、規定の数値範囲に入るように設計してもよい。
下限値は特に限定されないが、0.0005質量%以上が好ましく、0.001質量%以上がより好ましく、0.002質量%以上がさらに好ましい。前記下限値以上とすることで、各構成材料の製造時に精製を緩和化できる。
上記の上限及び下限は任意に組み合わせることができる。例えば、0.0005~0.05質量%が好ましく、0.0005~0.04質量%がより好ましく、0.001~0.03質量%がさらに好ましく、0.002~0.01質量%が特に好ましい。
下限値は特に限定されないが、0.5μg/g以上が好ましく、1.0μg/g以上がより好ましく、2.0μg/g以上がさらに好ましい。前記下限値以上とすることで、各構成材料の製造時に精製を緩和化できる。
上記の上限及び下限は任意に組み合わせることができる。例えば、0.5~100μg/gが好ましく、0.5~80μg/gがより好ましく、1.0~50μg/gがさらに好ましく、1.0~30μg/gがよりさらに好ましく、2.0~10μg/gが特に好ましい。
下限値は特に限定されないが、0.001質量%以上が好ましく、0.005質量%以上がより好ましく、0.01質量%がさらに好ましい。前記下限値以上とすることで、各構成材料の製造時に精製を緩和化できる点で有効である。
上記の上限及び下限は任意に組み合わせることができる。例えば、0.001~0.20質量%が好ましく、0.001~0.15質量%がより好ましく、0.005~0.10質量%がさらに好ましく、0.005~0.05質量%がよりさらに好ましく、0.01~0.03質量%が特に好ましい。
本発明の感光性着色組成物は、その塗膜の膜厚1μm当たりの光学濃度(OD)は特に限定されないが、0.2以上が好ましく、0.5以上がより好ましく、0.7以上がさらに好ましく、0.9以上がさらに好ましく、また、4.0以下が好ましく、3.0以下がより好ましく、2.0以下がさらに好ましく、1.5以下が特に好ましい。上記の上限及び下限は任意に組み合わせることができる。例えば、0.2~4.0が好ましく、0.5~4.0がより好ましく、0.5~3.0がさらに好ましく、0.5~2.0がよりさらに好ましく、0.7~2.0がことさらに好ましく、0.9~1.5が特に好ましい。前記下限値以上とすることで、十分な遮光性が得られる傾向がある。前記上限値以下とすることで電極の表面荒れが抑制される傾向がある。
塗膜の膜厚1μm当たりの光学濃度(OD)は、本発明の感光性着色組成物を硬化した塗膜を用いて測定すればよく、230℃で20分間加熱硬化させた0.5~1.5μm程度の塗膜を用いて測定することができる。
光学濃度とは、受光部の分光感度特性がISO 5-3規格におけるISO visual densityで示される透過光学濃度をいう。通常、光源としては、CIE(国際照明委員会)が規定するA光源が用いられる。透過光学濃度の測定に用いることができる測定器としては、例えば、サカタインクスエンジニアリング社のX-Rite 361T(V)を挙げることができる。
本発明の第2の態様に係る着色感光性樹脂組成物は、(a)着色剤、(b)アルカリ可溶性樹脂、(c)光重合開始剤、(d)エチレン性不飽和化合物、(e)含窒素芳香族化合物及び(f)分散剤を含有する感光性着色組成物であって、硬化させて得られる膜厚2.0μmの塗膜において、加熱発生ガス分析法で検出される(e)含窒素芳香族化合物成分のトルエン換算量が0.01~0.50μg/cm2である。
加熱発生ガス分析法で検出される(e)成分が上記範囲内であることにより、感光性着色組成物を加熱処理した後に電極の表面荒れを生じにくい傾向がある。
そのメカニズムは定かではないが、(e)成分を含有する感光性着色組成物を加熱処理した際、昇華した(e)含窒素芳香族化合物が電極表面を保護することができ、電極の表面荒れを生じにくくする、と推定される。
ガス量測定用基板は、後述記載のように、支持体に感光性樹脂組成物を塗布、乾燥、露光を、必要に応じて現像を行い、作成することができる。ガス量は感光性樹脂組成物を硬化して得られる塗膜の膜厚2.0μm、面積1cm2を基準としているが、測定時は、機器の検出感度に合わせた試料で測定を行い、単位膜厚、単位面積に対するガス量値に換算してもよい。
検出されたピーク成分の面積を計算したのち、予め濃度既知のトルエンを用いてピーク面積を測定して検量線を用いることにより、トルエン換算のガス量(μg/cm2)を算出することができる。
本発明において、検出されたピーク成分のうち、(e)含窒素芳香族化合物に該当するピーク成分の面積より、単位面積あたりのトルエン換算のガス量(μg/cm2)を算出することができる。
トルエン換算のガス量は0.01μg/cm2以上が好ましく、0.03μg/cm2以上がより好ましく、0.10μg/cm2以上がさらに好ましく、0.20μg/cm2以上がよりさらに好ましく、0.30μg/cm2以上が特に好ましい。また、0.50μg/cm2以下が好ましく、0.45μg/cm2以下がより好ましく、0.40μg/cm2以下がさらに好ましい。
上記の上限及び下限は任意に組み合わせることができる。例えば、0.01~0.50μg/cm2が好ましく、0.03~0.45μg/cm2がより好ましく、0.10~0.45μg/cm2がさらに好ましく、0.20~0.40μg/cm2がよりさらに好ましく、0.30~0.40μg/cm2が特に好ましい。
下限値以上することで、電極の表面荒れが良化する傾向がある。また、上限値以下とすることで、アウトガス量を抑制できる傾向がある。
本発明の感光性着色組成物は、常法に従って製造される。
(a)着色剤は、予めペイントコンディショナー、サンドグラインダー、ボールミル、ロールミル、ストーンミル、ジェットミル、ホモジナイザー等を用いて分散処理されるのが好ましい。分散処理により(a)着色剤が微粒子化されるため、感光性着色組成物の塗布特性が向上する。
顔料分散液に用いることができる(a)着色剤、(f)分散剤、及び溶剤としては、それぞれ感光性着色組成物に用いることができるものとして記載したものを好ましく採用することができる。顔料分散液における(a)着色剤の各着色剤の含有割合としては、感光性着色組成物における含有割合として記載したものを好ましく採用することができる。
サンドグラインダーで(a)着色剤を分散させる場合には、0.1~8mm程度の粒子径のガラスビーズ又はジルコニアビーズが好ましく用いられる。分散処理条件は、温度は0℃から100℃が好ましく、室温から80℃がより好ましい。分散時間は液の組成及び分散処理装置のサイズ等により適正時間が異なるため適宜調節する。感光性着色組成物の20度鏡面光沢度(JIS Z8741)が50~300の範囲となるように、顔料分散液の光沢を制御するのが分散の目安である。感光性着色組成物の光沢度が低い場合には、分散処理が十分でなく荒い顔料(着色剤)粒子が残っていることが多く、現像性、密着性、解像性等が不十分となる可能性がある。光沢値が上記範囲を超えるまで分散処理を行うと、顔料が破砕して超微粒子が多数生じるため、却って分散安定性が損なわれる傾向がある。
顔料分散液中に分散した顔料の分散粒径は0.03~0.3μmが好ましく、動的光散乱法により測定されうる。
本発明の感光性着色組成物を硬化させることで、本発明の硬化物を得ることができる。本発明の感光性着色組成物を硬化してなる硬化物は、隔壁として好適に用いることができる。
本発明の感光性着色組成物は隔壁、特に有機電界発光素子の有機層を区画するための隔壁を形成するために好適に用いることができる。有機電界発光素子に用いる有機層としては、例えば日本国特開2016-165396号公報に記載されているような、正孔注入層、正孔輸送層あるいは正孔注入層上の正孔輸送層に用いる有機層が挙げられる。
隔壁を形成するための支持体としては、適度の強度があれば、その材質は特に限定されるものではない。主に基板が使用されるが、材質としては、例えば、ポリエチレンテレフタレート等のポリエステル系樹脂、ポリプロピレン、ポリエチレン等のポリオレフィン系樹脂、ポリカーボネート、ポリメチルメタクリレート、ポリスルフォン等の熱可塑性樹脂製シート、エポキシ樹脂、不飽和ポリエステル樹脂、ポリ(メタ)アクリル系樹脂等の熱硬化性樹脂シート、各種ガラスが挙げられる。耐熱性の観点からガラス、耐熱性樹脂が好ましい。また、基板の表面にITO、IZO等の透明電極、あるいは銀、金、白金、アルミニウム、マグネシウムのような金属電極が成膜されている場合もある。上述の基板以外では、TFTアレイ上に形成することも可能である。
基板の厚さは、好ましくは0.05~10mm、より好ましくは0.1~7mmの範囲とされる。また各種樹脂の薄膜形成処理を行う場合、その膜厚は、好ましくは0.01~10μm、より好ましくは0.05~5μmの範囲である。
本発明の感光性着色組成物は、公知のカラーフィルター用感光性着色組成物と同様の用途に使用されるが、以下、隔壁として使用される場合について、本発明の感光性着色組成物を用いた隔壁の形成方法の具体例に従って説明する。
[1]基板への供給方法
本発明の感光性着色組成物は、溶剤に溶解あるいは分散された状態で、基板上へ供給されることが好ましい。その供給方法としては、従来公知の方法、例えば、スピナー法、ワイヤーバー法、フローコート法、ダイコート法、ロールコート法、スプレーコート法によって行うことができる。また、例えば、インクジェット法や印刷法により、パターン状に供給されてもよい。ダイコート法によれば、塗布液の使用量が大幅に削減され、かつ、スピンコート法によった際に付着するミスト等の影響が全くない、異物発生が抑制される等、総合的な観点から好ましい。
基板上に感光性着色組成物を供給した後の乾燥は、ホットプレート、IRオーブン、コンベクションオーブンを使用した乾燥方法によるのが好ましい。温度を高めず、減圧チャンバー内で乾燥を行う、減圧乾燥法を組み合わせてもよい。
露光は、感光性着色組成物の塗布膜上に、ネガのマスクパターンを重ね、このマスクパターンを介し、紫外線又は可視光線の光源を照射して行う。露光マスクを用いて露光を行う場合には、露光マスクを感光性着色組成物の塗布膜に近接させる方法や、露光マスクを感光性着色組成物の塗布膜から離れた位置に配置し、露光マスクを介した露光光を投影する方法によってもよい。マスクパターンを用いないレーザー光による走査露光方式によってもよい。必要に応じ、酸素による光重合性層の感度の低下を防ぐため、脱酸素雰囲気下で行ったり、光重合性層上にポリビニルアルコール層等の酸素遮断層を形成した後に露光を行ったりしてもよい。
中間透過開口部は、例えば、微小な多角形の遮光ユニットを有するマトリックス状遮光パターンによって作成する方法が知られている。吸収体として、例えば、クロム系、モリブデン系、タングステン系、シリコン系材料の膜によって、光透過率を制御し作成する方法が知られている。
近接露光方式の場合には、露光対象とマスクパターンとの距離としては、特に限定されないが、好ましくは10μm以上、より好ましくは50μm以上、さらに好ましくは75μm以上であり、また、好ましくは500μm以下、より好ましくは400μm以下、さらに好ましくは300μm以下である。
上記の露光を行った後、アルカリ性化合物の水溶液、又は有機溶剤を用いる現像によって、基板上に画像パターンを形成することができる。アルカリ性化合物の水溶液は、さらに、例えば、界面活性剤、有機溶剤、緩衝剤、錯化剤、染料又は顔料が含まれていてもよい。
現像の後の基板には、必要により上記の露光方法と同様な方法により追露光を行ってもよい。現像後、又は追露光後、熱硬化処理(焼成ともいう)を行ってもよい。熱硬化処理条件は、温度が好ましくは100℃~280℃、より好ましくは150℃~250℃であり、時間が5分間~60分間である。
本発明の隔壁としての1μm当たりの光学濃度(OD)は、遮光性の観点から、0.7以上が好ましく、1.2以上がより好ましく、1.5以上がさらに好ましく、1.8以上が特に好ましい。また4.0以下であることが好ましく、3.0以下であることがより好ましい。例えば、0.7~4.0が好ましく、1.2~4.0がより好ましく、1.5~3.0がさらに好ましく、1.8~3.0が特に好ましい。ここで光学濃度(OD)は後述する方法にて測定した値である。
本発明の有機電界発光素子は、本発明の感光性着色組成物で形成される硬化物、例えば隔壁を備える。
例えば、上述した方法により製造された隔壁パターンを備える基板を用いて、種々の有機電界発光素子が製造される。有機電界発光素子を形成する方法は特に限定されないが、好ましくは、上述した方法により基板上に隔壁のパターンを形成した後に、機能材料を真空状態で昇華させ、基板上の隔壁により囲まれた領域内に付着させて成膜する蒸着法や、キャスト法、スピンコート法、インクジェット印刷法といったウェットプロセスにて画素等の有機層を形成することによって、有機電界発光素子が製造される。
ボトムエミッション型では、例えば、透明電極を積層したガラス基板上に隔壁を形成し、隔壁で囲まれた開口部に正孔輸送層、発光層、電子輸送層、金属電極層を積層して作成される。一方でトップエミッション型では、例えば、反射層として金属電極層を積層したガラス基板上に隔壁を形成し、隔壁で囲まれた開口部に電子輸送層、発光層、正孔輸送層、透明電極層を積層して作成される。
発光層としては、日本国特開2009-146691号公報や日本国特許第5734681号公報に記載されているような有機電界発光層が挙げられる。また、日本国特許第5653387号公報や日本国特許第5653101号公報に記載されているような量子ドットを用いてもよい。
有機電界発光素子においては、隔壁の上面及び下面に電極を付与することが必要であるため、絶縁性の観点から、隔壁は高抵抗、低誘電率であることが好ましい。そのため、隔壁に遮光性を付与するために着色剤を使用する場合には、高抵抗かつ低誘電率である前記有機顔料を用いることが好ましい。
本発明の画像表示装置としては、本発明の硬化物を含む隔壁や有機電界発光素子を有する有機EL表示装置を挙げることができる。
有機EL表示装置は、上述の有機電界発光素子を含むものであれば画像表示装置の型式や構造については特に制限はなく、例えば、アクティブ駆動型有機電界発光素子を用いて常法に従って組み立てることができる。例えば、「有機ELディスプレイ」(オーム社、平成16年8月20日発行、時任静士、安達千波矢、村田英幸著)に記載されているような方法で形成することができる。例えば、白色光を発光する有機電界発光素子とカラーフィルターとを組み合わせて画像表示させてもよいし、RGB等の発光色の異なる有機電界発光素子を組み合わせて画像表示させてもよい。
本発明の硬化物を含む有機電界発光素子は、照明に用いられうる。照明の型式や構造について特に制限はなく、本発明の硬化物を含む有機電界発光素子を用いて常法に従って組み立てることができる。有機電界発光素子としては、単純マトリックス駆動方式としてもよいし、アクティブマトリックス駆動方式としてもよい。
照明が白色光を発光するものとするために、白色光を発光する有機電界発光素子を用いてもよい。また、発光色の異なる有機電界発光素子を組み合わせて、各色が混色して白色となるよう構成してもよいし、混色比率を調整できるように構成して調色機能を付与してもよい。
以下の実施例及び比較例で用いた感光性着色組成物の構成成分、並びにそれらの評価方法は次の通りである。
日本化薬社製「ZCR-8035H」(重量平均分子量Mw=7000、酸価=82mgKOH/g)。下記一般式(C-1)、及び下記一般式(C-2)で表される部分構造を有する。
次いで、上記反応により得られた反応液にトリメチロールプロパン(TMP)9.2質量部、ビフェニルテトラカルボン酸2無水物(BPDA)115.6質量部、テトラヒドロフタル酸無水物(THPA)25.1質量部を、温度計、攪拌機、冷却管を取り付けたフラスコに入れ、攪拌しながら105℃までゆっくり昇温し反応させ、固形分酸価104mgKOH/g、GPCで測定したポリスチレン換算の重量平均分子量(Mw)13000であるアルカリ可溶性樹脂-IIを得た。
BASF社製、Irgaphor(登録商標) Black S 0100 CF(下記式(II)で表される化学構造を有する。)
C.I.ピグメントオレンジ64
<顔料-III>
C.I.ピグメントバイオレット29
<顔料-IV>
C.I.ピグメントブルー60
アミン価は60mgKOH/gであり、下記式(1)及び(2)で表される繰り返し単位を有するメタクリル系共重合体。(全繰り返し単位中における下記式(1)及び(2)で表される繰り返し単位の含有割合は、それぞれ11.6モル%及び4.6モル%)
PGMEA:プロピレングリコールモノメチルエーテルアセテート
<溶剤-II>
MB:3-メトキシ-1-ブタノール
<溶剤-III>
MBA:3-メトキシ-ブチルアセテート
以下の化学構造を有するオキシムエステル系光重合開始剤
DPHA-40H:日本化薬社製 ウレタンアクリレート
DIC社製 メガファック F-559
ベンゾトリアゾール:東京化成工業社製。下記構造の化合物で、一般式(1)の構造に該当する。
2,2‘-ビピリジン:東京化成工業社製。下記構造の化合物で、一般式(2)の構造に該当する。
TINUVIN384-2:BASF社製、紫外線吸収剤。下記構造式で表される化合物で、一般式(1)及び(2)の構造に該当しない。
単位膜厚当たりの光学濃度は以下の手順にて測定した。
まず、調製した感光性着色組成物を、焼成後の膜厚が1.5μmとなるようにスピンコーターにてガラス基板に塗布し、1分間減圧乾燥した後に、ホットプレートにて100℃で120秒間乾燥した。得られた塗布膜に対し、露光マスクを用いず、露光を行った。照射光源としては波長365nmでの強度が40mW/cm2である高圧水銀灯を用い、露光量は50mJ/cm2とした。続いてオーブン230℃で30分間加熱硬化する事で、レジスト塗工基板1を得た。
得られたレジスト塗工基板1の光学濃度(OD値)をX-Rite社製361T(V)透過濃度計(照明光源の色温度:約2850K(CIE標準光源A相当)、受光部の分光感度特性:ISO 5-3規格でのISO visual density)を用いて測定し、膜厚を菱化システム社製非接触表面・層断面形状計測システム VertScan(R)2.0により測定し、光学濃度(OD値)及び膜厚から、単位膜厚(1μm)当たりの光学濃度(単位OD値)を算出した。なお、OD値は遮光能力を示す数値であり、数値が大きいほど高遮光性であることを示す。
ガラス基板上に、各感光性着色組成物を、焼成後の膜厚が1.5μmとなるようにスピンコーターで塗布し、1分間減圧乾燥した後に、ホットプレートにて100℃で120秒間乾燥した。得られた感光性着色組成物の塗膜を備える基板、及びガラス基板上の全面に膜厚60nmの銀の薄膜が蒸着された電極基板を、銀表面と感光性着色組成物塗膜表面とが向き合い、かつ50μm離れるように配置し、230℃で30分間オーブン中にて加熱した。得られた電極基板の表面粗度(Sa:算術平均高さ)を菱化システム社製非接触表面・層断面形状計測システム VertScan(R)2.0を用いて測定した。表面粗度の数値が小さいほど、表面荒れが少ないことを示す。
また以下のように判定した。Aがもっとも良好であることを示す。
A:表面粗度(Sa) 1.0nm以下。
B:表面粗度(Sa) 1.0nmより大きく、1.8nm以下。
C:表面粗度(Sa) 1.8nmより大きい。
表1に記載の顔料、分散剤、アルカリ可溶性樹脂、及び溶剤を、表1に記載の質量比となるように混合した。この混合液をペイントシェーカーにより25~45℃の範囲で3時間分散処理を行った。ビーズとしては、0.5mmφのジルコニアビーズを用い、分散液の2.5倍の質量を加えた。分散終了後、フィルターによりビーズと分散液を分離した。顔料分散液1、2を調製した。
なお、表1中の溶剤の量は、分散剤及びアルカリ可溶性樹脂由来の溶剤の量も含まれる。
実施例1~3、比較例1~2には顔料分散液1にさらに分散剤-Iを加え、全固形分量中に占める各成分の固形分の含有割合が表2に記載の値になるように各成分を加え、さらにPGMEA/MB/MBA=72/20/8、全固形分量の含有割合が17質量%となるように溶剤を加え、攪拌、溶解させて、実施例1~4及び比較例1~2の感光性着色組成物を調製した。
単位OD値、電極の表面荒れの評価結果を表2に示す。
顔料分散液1を顔料分散液2に変更し、表2に記載の値になるように各成分を加えた以外は、実施例4と同様の操作を行い、実施例5の感光性着色組成物を調整した。
単位OD値、電極の表面荒れの評価結果を表2に示す。
顔料分散液1を用いない以外は、表2に記載の値になるように各成分を加え、実施例1と同様の操作を行い、比較例3の感光性組成物を調整した。
含窒素芳香族化合物として式(1)で表される化合物又は式(2)で表される化合物を含む実施例1~5ではいずれも低い表面粗度となり、感光性着色組成物中への含窒素芳香族化合物の添加は電極表面の浸食を抑制する効果があることが確認された。このことは式(1)で表される化合物又は式(2)で表される化合物が230℃にて加熱した際に感光性着色組成物塗膜表面から昇華し対向側の銀電極表面に配位することで、塗膜から発生するガス成分から電極表面を保護する効果を発現し、電極の浸食を抑制していると考えられる。
含窒素芳香族化合物として式(1)又は式(2)で表される化合物に該当しない含窒素芳香族化合物を添加した比較例2においては、含窒素芳香族化合物が昇華しづらく電極表面を保護する効果が発現しなかったため表面粗度が大きな値となったと考えられる。
比較例3では、電極表面の表面粗度の変化は少なく、顔料分散体を含まない組成物では、そもそも本願発明の課題が生じないことがわかる。
ガラス基板上に、実施例1、実施例2及び比較例2の感光性着色組成物を、硬化後の膜厚が2.0μmとなるようにスピンコーターで塗布し、1分間減圧乾燥した後に、ホットプレートにて100℃で120秒間乾燥した。
得られた塗膜を、マスクを使用せずに高圧水銀灯にて40mJ/cm2の紫外線露光を行った。この時の波長365nmにおける光強度は40mW/cm2であった。
検出されたピーク成分のうち、含窒素芳香族化合物-I~IIIに該当するピーク成分の面積を計算した。予め濃度既知のトルエンを用いてピーク面積を測定して検量線を作成した。得られた含窒素芳香族化合物-I~IIIに該当するピーク面積よりトルエン量に換算し、測定した基板面積で除し、単位面積あたりのトルエン換算のガス量(μg/cm2)を算出した。結果は以下の通りであった。
対象物質;含窒素芳香族化合物-I
ガス量 ;0.39μg/cm2
実施例2の感光性着色組成物
対象物質;含窒素芳香族化合物-II
ガス量 ;0.03μg/cm2
比較例2の感光性着色組成物
対象物質;含窒素芳香族化合物-III
ガス量 ;未検出(0.01μg/cm2未満)
実施例2よりも実施例1の方が、ガス量も多く、電極表面荒れも少なかったことより、(e)含窒素芳香族化合物のガス量が多いほうがより好ましい。
Claims (15)
- 前記(e)含窒素芳香族化合物が、前記一般式(1)で表される化合物を含む請求項1に記載の感光性着色組成物。
- 前記(e)含窒素芳香族化合物が、ベンゾトリアゾールを含む、請求項2に記載の感光性着色組成物。
- 前記(e)含窒素芳香族化合物の含有割合が感光性着色組成物の全固形分質量に対し0.01質量%以上、5質量%以下である、請求項1~3のいずれか1項に記載の感光性着色組成物。
- (a)着色剤、(b)アルカリ可溶性樹脂、(c)光重合開始剤、(d)エチレン性不飽和化合物、(e)含窒素芳香族化合物及び(f)分散剤を含有する感光性着色組成物であって、
前記感光性樹脂組成物を硬化させて得られる膜厚2.0μmの塗膜において、加熱発生ガス分析法で検出される前記(e)含窒素芳香族化合物成分のトルエン換算量が0.01~0.50μg/cm2であることを特徴とする、感光性着色組成物。 - 前記(a)着色剤が、赤色顔料及び橙色顔料からなる群から選ばれる少なくとも1種と、青色顔料及び紫色顔料からなる群から選ばれる少なくとも1種を含む、請求項1~5のいずれか1項に記載の感光性着色組成物。
- 前記(a)着色剤が、有機黒色顔料を含む、請求項1~6のいずれか1項に記載の感光性着色組成物。
- 前記有機黒色顔料が、下記一般式(a1)で表される化合物、その幾何異性体、その塩、及びその幾何異性体の塩からなる群から選ばれる少なくとも1種を含む、請求項7に記載の感光性着色組成物。
R12、R13、R14、R15、R17、R18、R19及びR20は各々独立に、水素原子、ハロゲン原子、R21、COOH、COOR21、COO-、CONH2、CONHR21、CONR21R22、CN、OH、OR21、COCR21、OOCNH2、OOCNHR21、OOCNR21R22、NO2、NH2、NHR21、NR21R22、NHCOR22、NR21COR22、N=CH2、N=CHR21、N=CR21R22、SH、SR21、SOR21、SO2R21、SO3R21、SO3H、SO3 -、SO2NH2、SO2NHR21又はSO2NR21R22を表し;
R12とR13、R13とR14、R14とR15、R17とR18、R18とR19、及びR19とR20からなる群から選ばれる少なくとも1つの組み合わせは、互いに直接結合してもよく、又は酸素原子、硫黄原子、NH若しくはNR21ブリッジによって互いに結合してもよく;
R21及びR22は各々独立に、炭素数1~12のアルキル基、炭素数3~12のシクロアルキル基、炭素数2~12のアルケニル基、炭素数3~12のシクロアルケニル基又は炭素数2~12のアルキニル基を表す。) - 前記(a)着色剤の含有割合が感光性着色組成物の全固形分量に対して10質量%以上である、請求項1~8のいずれか1項に記載の感光性着色組成物。
- 硬化した塗膜の膜厚1μmあたりの光学濃度が0.5以上である、請求項1~9のいずれか1項に記載の感光性着色組成物。
- 有機電界発光素子の隔壁を形成するために用いられる、請求項1~10のいずれか1項に記載の感光性着色組成物。
- 請求項1~11のいずれか1項に記載の感光性着色組成物を硬化させた硬化物。
- 請求項1~11のいずれか1項に記載の感光性着色組成物を硬化させた隔壁。
- 請求項12に記載の硬化物を含む有機電界発光素子。
- 請求項14に記載の有機電界発光素子を含む画像表示装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2023500939A JPWO2022176976A1 (ja) | 2021-02-18 | 2022-02-18 | |
KR1020237022655A KR20230146514A (ko) | 2021-02-18 | 2022-02-18 | 감광성 착색 조성물, 경화물, 격벽, 유기 전계 발광소자 및 화상 표시 장치 |
CN202280014523.4A CN116848463A (zh) | 2021-02-18 | 2022-02-18 | 感光性着色组合物、固化物、间隔壁、有机电致发光元件及图像显示装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021-024489 | 2021-02-18 | ||
JP2021024489 | 2021-02-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2022176976A1 true WO2022176976A1 (ja) | 2022-08-25 |
Family
ID=82932279
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2022/006586 WO2022176976A1 (ja) | 2021-02-18 | 2022-02-18 | 感光性着色組成物、硬化物、隔壁、有機電界発光素子及び画像表示装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2022176976A1 (ja) |
KR (1) | KR20230146514A (ja) |
CN (1) | CN116848463A (ja) |
TW (1) | TW202244161A (ja) |
WO (1) | WO2022176976A1 (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04502521A (ja) * | 1988-12-23 | 1992-05-07 | イーストマン コダック カンパニー | コバルト(3)化合物および酸化還元移行性配位子を含有するフォトレジスト組成物 |
JP2011094192A (ja) * | 2009-10-29 | 2011-05-12 | Fujifilm Corp | 被めっき層形成用組成物、金属パターン材料の作製方法、及び金属パターン材料 |
WO2017208848A1 (ja) * | 2016-05-31 | 2017-12-07 | 富士フイルム株式会社 | 感光性樹脂組成物、転写フィルム、加飾パターン、及びタッチパネル |
WO2020008969A1 (ja) * | 2018-07-05 | 2020-01-09 | 東レ株式会社 | 樹脂組成物、遮光膜、遮光膜の製造方法および隔壁付き基板 |
JP2020181038A (ja) * | 2019-04-24 | 2020-11-05 | 東洋インキScホールディングス株式会社 | 着色組成物、感光性着色組成物、カラーフィルタ、および液晶表示装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7112827B2 (ja) | 2015-12-25 | 2022-08-04 | 旭化成株式会社 | 感光性樹脂組成物、感光性樹脂積層体、樹脂パターン製造方法、硬化膜パターン製造方法及び表示装置 |
KR102131590B1 (ko) | 2016-12-02 | 2020-07-08 | 미쯔비시 케미컬 주식회사 | 착색 감광성 수지 조성물, 안료 분산액, 격벽, 유기 전계 발광 소자, 화상 표시 장치 및 조명 |
-
2022
- 2022-02-17 TW TW111105791A patent/TW202244161A/zh unknown
- 2022-02-18 JP JP2023500939A patent/JPWO2022176976A1/ja active Pending
- 2022-02-18 KR KR1020237022655A patent/KR20230146514A/ko unknown
- 2022-02-18 WO PCT/JP2022/006586 patent/WO2022176976A1/ja active Application Filing
- 2022-02-18 CN CN202280014523.4A patent/CN116848463A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04502521A (ja) * | 1988-12-23 | 1992-05-07 | イーストマン コダック カンパニー | コバルト(3)化合物および酸化還元移行性配位子を含有するフォトレジスト組成物 |
JP2011094192A (ja) * | 2009-10-29 | 2011-05-12 | Fujifilm Corp | 被めっき層形成用組成物、金属パターン材料の作製方法、及び金属パターン材料 |
WO2017208848A1 (ja) * | 2016-05-31 | 2017-12-07 | 富士フイルム株式会社 | 感光性樹脂組成物、転写フィルム、加飾パターン、及びタッチパネル |
WO2020008969A1 (ja) * | 2018-07-05 | 2020-01-09 | 東レ株式会社 | 樹脂組成物、遮光膜、遮光膜の製造方法および隔壁付き基板 |
JP2020181038A (ja) * | 2019-04-24 | 2020-11-05 | 東洋インキScホールディングス株式会社 | 着色組成物、感光性着色組成物、カラーフィルタ、および液晶表示装置 |
Also Published As
Publication number | Publication date |
---|---|
TW202244161A (zh) | 2022-11-16 |
JPWO2022176976A1 (ja) | 2022-08-25 |
CN116848463A (zh) | 2023-10-03 |
KR20230146514A (ko) | 2023-10-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6988780B2 (ja) | 着色感光性樹脂組成物、顔料分散液、隔壁、有機電界発光素子、画像表示装置及び照明 | |
TWI711882B (zh) | 感光性著色組合物、硬化物、著色間隔件、圖像顯示裝置 | |
TW201835682A (zh) | 感光性著色組合物、硬化物、著色間隔物、圖像顯示裝置 | |
TW201800844A (zh) | 著色間隔件形成用感光性著色組合物、硬化物、著色間隔件、圖像顯示裝置 | |
JP2022078139A (ja) | 感光性着色組成物、硬化物、着色スペーサー、画像表示装置 | |
JP2018205605A (ja) | 着色感光性樹脂組成物、硬化物、有機電界発光素子、画像表示装置及び照明 | |
KR102615366B1 (ko) | 화상 표시 장치용의 안료 분산액 | |
WO2022215712A1 (ja) | 感光性着色樹脂組成物、硬化物、隔壁、有機電界発光素子、画像表示装置及び化合物 | |
WO2022176976A1 (ja) | 感光性着色組成物、硬化物、隔壁、有機電界発光素子及び画像表示装置 | |
JP2017053942A (ja) | 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置 | |
WO2023238902A1 (ja) | 感光性樹脂組成物、硬化物、隔壁、有機電界発光素子及び画像表示装置 | |
WO2024122565A1 (ja) | 感光性着色樹脂組成物、硬化物、隔壁、有機電界発光素子、カラーフィルター及び画像表示装置 | |
WO2024034637A1 (ja) | 感光性着色樹脂組成物、顔料分散液、硬化物、隔壁、有機電界発光素子、カラーフィルター及び画像表示装置 | |
WO2023249070A1 (ja) | 感光性樹脂組成物、硬化物及びその形成方法、隔壁並びに画像表示装置 | |
JP2023057606A (ja) | 感光性着色組成物、硬化物、及び画像表示装置 | |
TW202225842A (zh) | 感光性著色組合物、硬化物、有機電致發光元件及圖像顯示裝置 | |
WO2022230792A1 (ja) | 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置 | |
TW202413470A (zh) | 感光性著色樹脂組合物、顏料分散液、硬化物、阻隔壁、有機電致發光元件、彩色濾光器及圖像顯示裝置 | |
KR20200023297A (ko) | 감광성 착색 조성물, 경화물, 착색 스페이서, 및 화상 표시 장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 22756293 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2023500939 Country of ref document: JP Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 202280014523.4 Country of ref document: CN |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 22756293 Country of ref document: EP Kind code of ref document: A1 |