WO2022169170A3 - 카르빈 층을 포함하는 극자외선 리소그라피용 펠리클 막 및 그 제조방법 - Google Patents

카르빈 층을 포함하는 극자외선 리소그라피용 펠리클 막 및 그 제조방법 Download PDF

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Publication number
WO2022169170A3
WO2022169170A3 PCT/KR2022/001276 KR2022001276W WO2022169170A3 WO 2022169170 A3 WO2022169170 A3 WO 2022169170A3 KR 2022001276 W KR2022001276 W KR 2022001276W WO 2022169170 A3 WO2022169170 A3 WO 2022169170A3
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WO
WIPO (PCT)
Prior art keywords
carbyne
layer
extreme ultraviolet
pellicle film
ultraviolet lithography
Prior art date
Application number
PCT/KR2022/001276
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English (en)
French (fr)
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WO2022169170A2 (ko
Inventor
최재혁
조상진
우란
김청
서경원
김경수
이소윤
문성용
Original Assignee
주식회사 에프에스티
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 주식회사 에프에스티 filed Critical 주식회사 에프에스티
Publication of WO2022169170A2 publication Critical patent/WO2022169170A2/ko
Publication of WO2022169170A3 publication Critical patent/WO2022169170A3/ko

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/158—Carbon nanotubes
    • C01B32/168—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/182—Graphene
    • C01B32/194—After-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Paints Or Removers (AREA)

Abstract

본 발명은 극자외선 리소그라피용 펠리클 막 및 그 제조방법에 관한 것으로서, 더욱 상세하게는 카르빈(carbyne) 층을 포함하는 극자외선 리소그라피용 펠리클 막 및 그 제조방법에 관한 것이다. 본 발명은 카르빈(carbyne) 분자들과 용매를 혼합하여 제조한 코팅액을 도포한 후 건조하는 방법으로 제조됨으로써, 카르빈 분자들이 얽혀있는 구조를 가지는 카르빈 층을 포함하는 극자외선 리소그래피용 펠리클 막을 제공한다. 본 발명에 따른 극자외선 리소그래피용 펠리클 막은 카르빈 층을 코어 층으로 사용하므로, 열적 안정성이 높으며, 강도도 매우 높다. 또한, 카르빈 층을 보호하기 위한 별도의 캐핑 층이 강제되지 않는다는 장점도 있다.
PCT/KR2022/001276 2021-02-02 2022-01-25 카르빈 층을 포함하는 극자외선 리소그라피용 펠리클 막 및 그 제조방법 WO2022169170A2 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020210014584A KR102349295B1 (ko) 2021-02-02 2021-02-02 카르빈(carbyne) 층을 포함하는 극자외선 리소그라피용 펠리클 막 및 그 제조방법
KR10-2021-0014584 2021-02-02

Publications (2)

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WO2022169170A2 WO2022169170A2 (ko) 2022-08-11
WO2022169170A3 true WO2022169170A3 (ko) 2022-10-06

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PCT/KR2022/001276 WO2022169170A2 (ko) 2021-02-02 2022-01-25 카르빈 층을 포함하는 극자외선 리소그라피용 펠리클 막 및 그 제조방법

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KR (1) KR102349295B1 (ko)
WO (1) WO2022169170A2 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102349295B1 (ko) * 2021-02-02 2022-01-10 주식회사 에프에스티 카르빈(carbyne) 층을 포함하는 극자외선 리소그라피용 펠리클 막 및 그 제조방법

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