WO2022153959A1 - Procédé de production de film conducteur transparent - Google Patents

Procédé de production de film conducteur transparent Download PDF

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Publication number
WO2022153959A1
WO2022153959A1 PCT/JP2022/000471 JP2022000471W WO2022153959A1 WO 2022153959 A1 WO2022153959 A1 WO 2022153959A1 JP 2022000471 W JP2022000471 W JP 2022000471W WO 2022153959 A1 WO2022153959 A1 WO 2022153959A1
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Prior art keywords
transparent conductive
coating layer
conductive film
thickness
coating
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PCT/JP2022/000471
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English (en)
Japanese (ja)
Inventor
純一 長瀬
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日東電工株式会社
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Priority to CN202280009959.4A priority Critical patent/CN116711033A/zh
Priority to KR1020237023320A priority patent/KR20230117607A/ko
Publication of WO2022153959A1 publication Critical patent/WO2022153959A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/12—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by mechanical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/12—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports

Definitions

  • the present invention relates to a method for producing a transparent conductive film.
  • a transparent conductive film obtained by forming a metal oxide layer such as ITO (indium tin oxide) on a transparent resin film is often used as an electrode of the touch sensor.
  • the transparent conductive film provided with this metal oxide layer tends to lose its conductivity due to bending, and has a problem that it is difficult to use in applications requiring flexibility such as a flexible display.
  • a transparent conductive film having high flexibility a transparent conductive film containing metal nanowires is known.
  • Metal nanowires are wire-like conductive substances having a diameter of nanometers.
  • the metal nanowires form a mesh, so that a good electrical conduction path is formed with a small amount of metal nanowires, and an opening is formed in the gap between the meshes. Formed to achieve high light transmittance. Even in a transparent conductive film containing such metal nanowires, improvement of conductivity essentially required for the conductive film is being studied.
  • the present invention has been made to solve the above problems, and an object of the present invention is to provide a method for producing a transparent conductive film containing metal nanowires and having excellent conductivity.
  • the method for producing a transparent conductive film of the present invention includes a coating step of applying a composition for forming a transparent conductive layer containing metal nanowires to a base material to form a coating layer, and a leaving step of leaving the coating layer for a predetermined time.
  • the thickness Tb of the coating layer at the time of starting the ventilation in the coating step includes the blowing step of blowing air to the coating layer after the leaving step, and the thickness Tb of the coating layer is 25 with respect to the thickness Ts of the coating layer in the coating step. % To 90%.
  • the thickness Ts of the coating layer in the coating step is 10 ⁇ m to 50 ⁇ m.
  • the difference between the thickness Tb of the coating layer at the start of ventilation in the coating step and the thickness Ts of the coating layer in the coating step is 2 ⁇ m to 12 ⁇ m.
  • the method for producing a transparent conductive film of the present invention includes a coating step of applying a composition for forming a transparent conductive layer containing metal nanowires to a base material to form a coating layer, and a coating layer. Includes a leaving step of leaving the material for a predetermined time and a blowing step of blowing air to the coating layer after the leaving step.
  • a transparent conductive film including a base material and a transparent conductive layer arranged on one side of the base material can be obtained.
  • the production method of the present invention may include any suitable other steps in addition to the above-mentioned coating step and blowing step.
  • the manufacturing method may further include a drying step of drying the coating layer after the blowing step.
  • the blowing step is a step in which the coating layer can be dried, and the transparent conductive layer is formed through the blowing step.
  • the manufacturing method can be carried out while transporting a substrate.
  • the coating step, the leaving step, and the blowing step (and, if necessary, other steps such as a drying step) are performed while feeding out the rolled base material and transporting the base material.
  • a long transparent conductive film including a base material and a transparent conductive layer arranged on one side of the base material is formed.
  • the transparent conductive film is wound up after formation.
  • the composition for forming a transparent conductive layer containing metal nanowires is applied to the base material by any suitable method to form a coating layer.
  • a composition for forming a transparent conductive layer containing metal nanowires is applied to the base material to form a coating layer.
  • Base material Any suitable material can be used as the material constituting the base material. Specifically, for example, a polymer base material such as a film or a plastic base material is preferably used. This is because the smoothness of the base material and the wettability to the composition for forming the transparent conductive layer are excellent, and the productivity can be significantly improved by the continuous production by the roll.
  • the material constituting the above base material is typically a polymer film containing a thermoplastic resin as a main component.
  • the thermoplastic resin include polyester resins; cycloolefin resins such as polynorbornene; acrylic resins; polycarbonate resins; cellulose resins and the like. Of these, polyester-based resins, cycloolefin-based resins, and acrylic-based resins are preferable. These resins are excellent in transparency, mechanical strength, thermal stability, moisture shielding property and the like.
  • the above-mentioned thermoplastic resin may be used alone or in combination of two or more. Further, it is also possible to use an optical film such as that used for a polarizing plate, for example, a low retardation base material, a high retardation base material, a retardation plate, a brightness improving film, or the like as a base material.
  • the thickness of the base material is preferably 20 ⁇ m to 200 ⁇ m, more preferably 30 ⁇ m to 150 ⁇ m.
  • the total light transmittance of the base material is preferably 30% or more, more preferably 35% or more, and further preferably 40% or more.
  • Any appropriate method can be adopted as the method for transporting the base material.
  • transport by a transport roll, transport by a transport belt, a combination thereof, and the like can be mentioned.
  • the transport speed is, for example, 5 m / min to 50 m / min.
  • Metal nanowires are conductive substances that are made of metal, have a needle-like or thread-like shape, and have a diameter of nanometers.
  • the metal nanowires may be linear or curved. If a transparent conductive layer made of metal nanowires is used, the metal nanowires form a mesh, so that a good electrical conduction path can be formed even with a small amount of metal nanowires, and the transparency has low electrical resistance. A conductive film can be obtained. Further, since the metal nanowires have a mesh shape, an opening can be formed in the gap between the meshes to obtain a transparent conductive film having high light transmittance.
  • the ratio (aspect ratio: L / d) of the thickness d to the length L of the metal nanowire is preferably 100 to 100,000, more preferably 50 to 100,000, and particularly preferably 100 to 100. It is 10,000.
  • the metal nanowires having such a large aspect ratio are used, the metal nanowires can intersect well and a small amount of metal nanowires can exhibit high conductivity. As a result, a transparent conductive film having high light transmittance can be obtained.
  • the "thickness of the metal nanowire” means the diameter of the metal nanowire when it has a circular cross section, and means its minor diameter when it has an elliptical cross section, and is polygonal. In some cases it means the longest diagonal.
  • the thickness and length of the metal nanowires can be confirmed by a scanning electron microscope or a transmission electron microscope.
  • the thickness of the metal nanowires is preferably less than 500 nm, more preferably less than 200 nm, particularly preferably 10 nm to 100 nm, and most preferably 10 nm to 50 nm. Within such a range, a transparent conductive layer having high light transmittance can be formed.
  • the length of the metal nanowires is preferably 1 ⁇ m to 1000 ⁇ m, more preferably 10 ⁇ m to 500 ⁇ m, and particularly preferably 10 ⁇ m to 100 ⁇ m. Within such a range, a transparent conductive film having high conductivity can be obtained.
  • any suitable metal can be used as long as it is a conductive metal.
  • the metal constituting the metal nanowire include silver, gold, copper, nickel and the like. Further, a material obtained by plating (for example, gold plating) these metals may be used. Of these, silver, copper or gold is preferable, and silver is more preferable, from the viewpoint of conductivity.
  • any appropriate method can be adopted as the method for producing the metal nanowires.
  • Examples thereof include a method of reducing silver nitrate in a solution, a method of applying an applied voltage or a current to the surface of the precursor from the tip of the probe, pulling out a metal nanowire at the tip of the probe, and continuously forming the metal nanowire. ..
  • silver nanowires can be synthesized by liquid-phase reducing a silver salt such as silver nitrate in the presence of a polyol such as ethylene glycol and polyvinylpyrrolidone. Uniform size silver nanowires are available, for example, from Xia, Y. et al. et al. , Chem. Mater. (2002), 14, 4736-4745, Xia, Y. et al. et al. , Nano letters (2003) 3 (7), 955-960, can be mass-produced according to the method described.
  • composition for forming a transparent conductive layer contains metal nanowires.
  • metal nanowires are dispersed in any suitable solvent to prepare a composition for forming a transparent conductive layer.
  • the solvent include water, alcohol solvents, ketone solvents, ether solvents, hydrocarbon solvents, aromatic solvents and the like.
  • the composition for forming a transparent conductive layer may further contain additives such as a resin (binder resin), a conductive material other than metal nanowires (for example, conductive particles), and a leveling agent.
  • the composition for forming a transparent conductive layer includes a plasticizer, a heat stabilizer, a light stabilizer, a lubricant, an antioxidant, an ultraviolet absorber, a flame retardant, a colorant, an antioxidant, a compatibilizer, a cross-linking agent, and an increase. It may contain additives such as mucilages, inorganic particles, surfactants, and dispersants.
  • the viscosity of the composition for forming a transparent conductive layer is preferably 5 mP ⁇ s / 25 ° C. to 300 mP ⁇ s / 25 ° C., more preferably 10 mP ⁇ s / 25 ° C. to 100 mP ⁇ s / 25 ° C. Within such a range, the effect of the present invention becomes remarkable.
  • the viscosity of the composition for forming a transparent conductive layer can be measured with a rheometer (for example, MCR302 manufactured by Anton Pearl Co., Ltd.).
  • the dispersion concentration of the metal nanowires in the composition for forming the transparent conductive layer is preferably 0.01% by weight to 5% by weight. Within such a range, the effect of the present invention becomes remarkable.
  • any suitable method can be adopted as the coating method of the composition for forming the transparent conductive layer.
  • the coating method include spray coating, bar coating, roll coating, die coating, inkjet coating, screen coating, dip coating, letterpress printing method, intaglio printing method, gravure printing method and the like.
  • the basis weight of the coating layer is preferably 0.3 g / m 2 to 30 g / m 2 , and more preferably 1.6 g / m 2 to 16 g / m 2 .
  • the metal nanowires can be satisfactorily dispersed by the ventilation in the ventilation step, and a transparent conductive film having a smaller conductive anisotropic can be produced.
  • the thickness Ts of the coating layer in the coating step is preferably 10 ⁇ m to 50 ⁇ m, more preferably 13 ⁇ m to 40 ⁇ m, further preferably 13 ⁇ m to 30 ⁇ m, and particularly preferably 13 ⁇ m to 20 ⁇ m. Within such a range, a transparent conductive film having particularly excellent conductivity can be obtained.
  • the thickness Ts (hereinafter, also referred to as the initial thickness Ts of the coating layer) means the thickness (wet thickness) of the coating layer immediately after the coating.
  • the thickness Ts (wet thickness) of the coating layer can be measured by an optical interferometry film thickness meter (for example, "spectrometer FLAME-S" manufactured by ocean insight).
  • the leaving step is a step of leaving the coating layer for a predetermined time as described above. More specifically, it is a step of leaving the laminated structure including the base material and the coating layer in an environment where the coating layer is 25 ° C. or lower (preferably 20 ° C. to 25 ° C.) and there is no wind.
  • the windless state means a state in which the wind speed (relative wind speed in the case of transporting the base material) is less than 0.5 m / s.
  • “leaving” means reducing the thickness of the coating layer in a windless state, and includes an operation of reducing the thickness of the coating layer while conveying the laminated structure including the base material and the coating layer. It is a concept.
  • the time for leaving the coating layer is, for example, 1 second to 300 seconds.
  • the time for leaving the coating layer to stand corresponds to the time from the formation of the coating layer in the previous step to the start of ventilation in the subsequent step.
  • a transparent conductive film having excellent conductivity can be obtained by performing the ventilation step of the next step after leaving the coating layer for a predetermined time.
  • the transparent conductive film obtained by the production method of the present invention the transparent conductive film obtained by drying the coating layer without blowing air, or the transparent conductivity obtained by blowing air to the coating layer immediately after coating.
  • the conductivity per unit weight of the metal nanowire is superior to the transparent conductive film obtained by the production method of the present invention.
  • the flow of the metal nanowires in the coating layer can be preferably adjusted, and the number of contact points between the metal nanowires increases. It is thought that the effect will be obtained.
  • the thickness of the coating layer after the leaving step is preferably more than 1 ⁇ m, more preferably 2 ⁇ m or more. That is, it is preferable to end the leaving step before the thickness of the coating layer becomes 1 ⁇ m or less (preferably less than 2 ⁇ m). By doing so, the flow of the metal nanowires in the coating layer can be preferably adjusted, and the number of contact points between the metal nanowires can be increased.
  • the standing time is determined based on the thickness Ts of the coating layer in the coating step and the thickness of the coating layer after the leaving step (thickness Tb of the coating layer when the ventilation is started in the ventilation step). Will be done.
  • the thickness Tb of the coating layer at the start of ventilation in the blowing step is 25% to 90%, more preferably 27% to 90% with respect to the thickness Ts of the coating layer in the coating step. It is 89%, more preferably 30% to 88%.
  • the flow of the metal nanowires in the coating layer can be preferably adjusted, and the number of contact points between the metal nanowires increases. Therefore, a transparent conductive film having high conductivity per unit weight of the metal nanowires. Can be obtained.
  • the coating layer is preferably left to stand until the thickness of the coating layer is 2 ⁇ m to 12 ⁇ m thinner than the initial thickness Ts of the coating layer, and 4 ⁇ m to 11 ⁇ m than the initial thickness Ts of the coating layer. It is more preferable to leave the coating layer until it becomes thin, and it is more preferable to leave the coating layer until it becomes 6 ⁇ m to 10 ⁇ m thinner than the initial thickness Ts of the coating layer, more preferably than the initial thickness Ts of the coating layer. It is preferable to leave the coating layer until the thickness becomes 6 ⁇ m to 9 ⁇ m thinner. Within such a range, the flow of the metal nanowires in the coating layer can be preferably adjusted, and the number of contact points between the metal nanowires can be increased.
  • the coating layer When the initial thickness Ts of the coating layer is 10 ⁇ m to 13 ⁇ m, it is preferable to leave the coating layer until the thickness Tb of the coating layer reaches 2.5 ⁇ m to 9 ⁇ m, and until the thickness Tb of the coating layer reaches 3 ⁇ m to 5 ⁇ m. It is more preferable to leave the coating layer.
  • the initial thickness Ts of the coating layer exceeds 13 ⁇ m and is less than 16 ⁇ m, it is preferable to leave the coating layer until the thickness Tb of the coating layer becomes 4 ⁇ m to 12 ⁇ m, and the thickness Tb of the coating layer becomes 5 ⁇ m to 7 ⁇ m. It is more preferable to leave the coating layer until.
  • the coating layer is left to stand until the thickness Tb of the coating layer reaches 6 ⁇ m to 14 ⁇ m. It is more preferable to leave the coating layer until the thickness Tb of the coating layer reaches 7 ⁇ m to 9 ⁇ m.
  • the flow of the metal nanowires in the coating layer can be preferably adjusted, and the number of contact points between the metal nanowires can be increased.
  • Blower step Blower to the coating layer can be performed by any suitable method.
  • a blower located above (opposite to the substrate) and / or side of the coating layer may be used to blow air to the coating layer.
  • the blowing direction is any suitable direction.
  • the air blowing direction may be such that the air is provided at a predetermined angle (for example, 10 ° to 170 °) with respect to the coating layer surface, and the air is blown substantially parallel to the coating layer surface (for example, less than 10 ° with respect to the coating layer surface). May be good.
  • a spirally blowing wind may be sent.
  • the blowing direction can be adjusted by, for example, providing a louver on the blower and adjusting the blowing direction according to the direction of the louver.
  • the blowing direction is defined by the opening direction of the louver.
  • a blower having a spiral wind direction plate at the air outlet can be used.
  • the wind speed of the above wind is preferably 0.5 m / s to 10 m / s, and more preferably 1 m / s to 5 m / s. Within such a range, the metal nanowires are well dispersed, and a transparent conductive film having excellent conductivity can be produced. In addition, a transparent conductive film having excellent surface smoothness and thickness uniformity can be obtained.
  • the wind speed can be appropriately set depending on the solvent and the like contained in the composition for forming the transparent conductive layer. When a composition for forming a transparent conductive layer prepared with water is used, the wind speed is preferably 0.5 m / s to 10 m / s, more preferably 1 m / s to 5 m / s. In the present specification, the wind speed means the wind speed at the time of reaching the coating layer.
  • the temperature of the wind is preferably 10 ° C to 50 ° C, more preferably 15 ° C to 30 ° C.
  • the wind speed can be appropriately set depending on the solvent and the like contained in the composition for forming the transparent conductive layer.
  • the temperature of the wind is preferably 10 ° C. to 50 ° C., more preferably 15 ° C. to 30 ° C.
  • the wind temperature means the temperature of the wind at the time of reaching the coating layer.
  • the ventilation time is preferably 1 minute to 10 minutes, more preferably 2 minutes to 5 minutes.
  • the metal nanowires are well dispersed, and a transparent conductive film having a smaller conductive anisotropy can be produced.
  • the metal nanowires can be appropriately dispersed over the entire coating layer.
  • a transparent conductive film having excellent surface smoothness and thickness uniformity can be obtained.
  • the ventilation may be divided into multiple stages.
  • the air may be blown stepwise by dividing into zones so that the wind direction, the wind speed, the temperature, and the like are different.
  • any appropriate treatment may be performed.
  • a composition for forming a transparent conductive layer containing a binder resin it may be cured by irradiation with ultraviolet rays or the like.
  • a drying step may be performed after the sending step. Examples of the drying method include oven heating, natural drying and the like.
  • FIG. 1 is a schematic cross-sectional view of a transparent conductive film obtained by the production method according to one embodiment of the present invention.
  • the transparent conductive film 100 includes a base material 10 and a transparent conductive layer 20 arranged on one side of the base material 10.
  • the transparent conductive layer 20 contains metal nanowires (not shown).
  • the surface resistance value of the transparent conductive film is preferably 0.1 ⁇ / ⁇ to 1000 ⁇ / ⁇ , more preferably 0.5 ⁇ / ⁇ to 300 ⁇ / ⁇ , and particularly preferably 1 ⁇ / ⁇ to 200 ⁇ / ⁇ . Yes, most preferably 1 ⁇ / ⁇ to 150 ⁇ / ⁇ .
  • the surface resistance value can be measured by "Automatic resistivity measurement system MCP-S620 type / MCP-S521 type" manufactured by Mitsubishi Chemical Analytech.
  • the surface resistance value of the transparent conductive film of the present invention is 90% or less of the surface resistance value of the comparative conductive film obtained in the same manner as the transparent conductive film except that the above blowing step is not performed. Is more preferable, 85% or less is more preferable, and 80% or less is further preferable.
  • the haze value of the transparent conductive film is preferably 20% or less, more preferably 10% or less, and further preferably 0.1% to 5%.
  • the total light transmittance of the transparent conductive film is preferably 30% or more, more preferably 35% or more, and particularly preferably 40% or more.
  • the basis weight of the transparent conductive layer is preferably 0.001 g / m 2 to 0.09 g / m 2 , and more preferably 0.005 g / m 2 to 0.05 g / m 2 .
  • the thickness of the transparent conductive layer is preferably 2 ⁇ m to 10 ⁇ m, more preferably 3 ⁇ m to 9 ⁇ m, and further preferably 4 ⁇ m to 8 ⁇ m.
  • the content ratio of the metal nanowires in the transparent conductive layer is preferably 0.1 parts by weight to 50 parts by weight, more preferably 0.1 parts by weight or more, based on 100 parts by weight of the binder resin constituting the transparent conductive layer. It is 30 parts by weight. Within such a range, a transparent conductive film having excellent conductivity and light transmission can be obtained.
  • a is preferably 0.7 or more, more preferably 0.75 or more, more preferably 0.77 or more, still more preferably 0.79 or more.
  • a transparent conductive film having excellent conductivity can be obtained.
  • the conductivity is the reciprocal of the surface resistance value.
  • the evaluation method in the examples is as follows.
  • the thickness was measured with an optical interferometry film thickness meter (“Spectroscope FLAME-S” manufactured by ocean insight).
  • the surface resistance value of the transparent conductive film (the surface resistance value of MD and TD) is measured by the eddy current method using the non-contact surface resistance meter brand name "EC-80" manufactured by Napson Corporation. It was measured. The measurement temperature was 23 ° C.
  • Example 1 A PET film (manufactured by Mitsubishi Plastics, trade name "S100”) was used as a base material.
  • Examples 2 to 9, Comparative Examples 1 to 6 The transparent conductive film is the same as in Example 1 except that the initial thickness Ts of the coating layer and the thickness Tb of the coating layer when the ventilation is started in the ventilation process (at the start of ventilation) are as shown in Table 1.
  • Got The obtained transparent conductive film was subjected to the above evaluations (1) and (2). The results are shown in Table 1. Further, FIG. 2 shows the relationship between the thickness Tb of the coating layer at the start of blowing air and the surface resistance value of the obtained transparent conductive film.
  • a transparent conductive film having excellent conductivity can be obtained by performing the leaving step. Further, by optimizing the coating layer thickness at the start of ventilation (optimizing the leaving time) according to the initial thickness of the coating layer, the conductive effect becomes more remarkable.
  • Base material 20 Transparent conductive layer 100 Transparent conductive film

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Abstract

L'invention concerne un procédé de production d'un film conducteur transparent qui comprend des nanofils métalliques et présente une électroconductivité exceptionnelle.　Un procédé de production d'un film conducteur transparent selon la présente invention comprend : une étape de revêtement pour revêtir une composition de formation de couche conductrice transparente qui comprend des nanofils métalliques sur un substrat de façon à former une couche de revêtement ; une étape de sortie pour laisser la couche de revêtement seule pendant un temps prescrit ; et une étape de soufflage pour souffler de l'air sur l'étape de revêtement après l'étape de sortie, l'épaisseur Tb de la couche de revêtement lors du début du soufflage dans l'étape de revêtement étant de 25 à 90 % de l'épaisseur Ts de la couche de revêtement dans l'étape de revêtement.
PCT/JP2022/000471 2021-01-13 2022-01-11 Procédé de production de film conducteur transparent WO2022153959A1 (fr)

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Application Number Priority Date Filing Date Title
CN202280009959.4A CN116711033A (zh) 2021-01-13 2022-01-11 透明导电性膜的制造方法
KR1020237023320A KR20230117607A (ko) 2021-01-13 2022-01-11 투명 도전성 필름의 제조 방법

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Application Number Priority Date Filing Date Title
JP2021-003467 2021-01-13
JP2021003467A JP2022108460A (ja) 2021-01-13 2021-01-13 透明導電性フィルムの製造方法

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WO2011001961A1 (fr) * 2009-06-30 2011-01-06 Dic株式会社 Procede de formation de motif pour couche conductrice transparente
WO2011013618A1 (fr) * 2009-07-30 2011-02-03 住友化学株式会社 Elément électroluminescent organique
WO2013121556A1 (fr) * 2012-02-16 2013-08-22 大倉工業株式会社 Procédé de fabrication de matériau de base conducteur transparent et matériau de base conducteur transparent
WO2015177967A1 (fr) * 2014-05-20 2015-11-26 デクセリアルズ株式会社 Procédé de fabrication d'un film électriquement conducteur transparent et film électriquement conducteur transparent
WO2019172423A1 (fr) * 2018-03-09 2019-09-12 大日本印刷株式会社 Film électro-conducteur, capteur, panneau tactile et dispositif d'affichage d'image

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JP5546763B2 (ja) 2005-08-12 2014-07-09 カンブリオス テクノロジーズ コーポレイション ナノワイヤに基づく透明導電体

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Publication number Priority date Publication date Assignee Title
WO2011001961A1 (fr) * 2009-06-30 2011-01-06 Dic株式会社 Procede de formation de motif pour couche conductrice transparente
WO2011013618A1 (fr) * 2009-07-30 2011-02-03 住友化学株式会社 Elément électroluminescent organique
WO2013121556A1 (fr) * 2012-02-16 2013-08-22 大倉工業株式会社 Procédé de fabrication de matériau de base conducteur transparent et matériau de base conducteur transparent
WO2015177967A1 (fr) * 2014-05-20 2015-11-26 デクセリアルズ株式会社 Procédé de fabrication d'un film électriquement conducteur transparent et film électriquement conducteur transparent
WO2019172423A1 (fr) * 2018-03-09 2019-09-12 大日本印刷株式会社 Film électro-conducteur, capteur, panneau tactile et dispositif d'affichage d'image

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