WO2022110284A1 - Method for regulating output power of 213 nm laser, and apparatus thereof - Google Patents

Method for regulating output power of 213 nm laser, and apparatus thereof Download PDF

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Publication number
WO2022110284A1
WO2022110284A1 PCT/CN2020/134296 CN2020134296W WO2022110284A1 WO 2022110284 A1 WO2022110284 A1 WO 2022110284A1 CN 2020134296 W CN2020134296 W CN 2020134296W WO 2022110284 A1 WO2022110284 A1 WO 2022110284A1
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laser
frequency
crystal
temperature
output power
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PCT/CN2020/134296
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French (fr)
Chinese (zh)
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任俊杰
王家赞
江锐
刘广义
陈彬彬
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北京科益虹源光电技术有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/108Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
    • H01S3/109Frequency multiplication, e.g. harmonic generation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10069Memorized or pre-programmed characteristics, e.g. look-up table [LUT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/1028Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the temperature

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  • the present disclosure relates to the field of laser technology, in particular to a method and a device for regulating the output power of a 213 nm laser.
  • the methods of controlling the laser output power are generally divided into two categories. One is to control the input end, such as controlling the current or voltage of the laser pump source to change the laser output power; the other is to control the output end, such as in the laser.
  • An acousto-optic modulator is inserted at the output end to control the laser output power.
  • the power control at the input end is to regulate the 1064nm power output at the output end of the fundamental frequency laser.
  • the laser needs to perform frequency conversion at least 3 times, changing the input power of the fundamental frequency 1064nm to adjust the output optical power after multiple mixing, which will change the beam quality of the final output light at 213nm, and also make the output power in the frequency conversion, power stability and stability.
  • the beam quality becomes uncontrollable, increasing overall system instability.
  • the present disclosure provides a method and device for regulating the output power of a 213 nm laser, which is practical and reliable, and realizes the precise control of the output power of a 213 nm laser without adding additional optical devices. control.
  • One aspect of the present disclosure provides a method for regulating the output power of a 213 nm laser, which includes: S1, setting the temperature of a frequency triple crystal; S2, using the frequency triple crystal to output a 532 nm laser and a 355 nm laser; S3, pairing The 532nm laser and the 355nm laser are summed to obtain a 213nm laser, and the output power of the 213nm laser is recorded; in S4, S1 to S3 are repeated for several times, wherein the temperature of the frequency tripler crystal is set at different temperatures each time, and recorded at different temperatures According to the output power of the 213nm laser, the corresponding relationship between the temperature of the triple frequency crystal and the output power of the 213nm laser is obtained; S5, according to the corresponding relationship, the temperature of the triple frequency crystal is adjusted to regulate the output power of the 213nm laser.
  • S4 includes: S41, repeating S1 to S3 multiple times, wherein the temperature of the frequency triple crystal is set to be different each time, and recording the output power of the 213 nm laser at different temperatures; S42, processing S41 through a data fitting function The corresponding relationship between the output power of the 213nm laser and the temperature of the 213nm laser at different temperatures obtained in Polynomial expression.
  • S3 includes: S31, using a quintuple frequency crystal to perform sum frequency on the 532nm laser and the 355nm laser to obtain a 213nm laser; S32, using a Perrin Broca prism to separate the 532nm, 355nm and 213nm lasers, and make the 213nm laser The outgoing direction of the laser is perpendicular to the incoming direction of the Perin Broca prism; S33, record the output power of the 213 nm laser.
  • the method further includes: S0, frequency-doubling the fundamental frequency of the 1064 nm laser with a frequency-doubling crystal to generate a 532-nm laser, and outputting the 1064-nm laser and the 532-nm laser to a frequency-tripling crystal.
  • the quintuple crystal in S31 is placed in the third temperature control furnace, and the operating temperature of the quintuple crystal is 120°C to 160°C, and a temperature lock is maintained.
  • the triple frequency crystal in S1 is placed in the second temperature control furnace, and the second temperature control furnace is used to set the temperature of the triple frequency crystal according to the phase matching temperature of the fundamental frequency 1064 nm laser and the 532 nm laser.
  • the method also includes: S2I, using the first dichroic mirror to transmit the 1064nm laser output by the frequency triple crystal, and reflecting the 532nm laser and 355nm laser; S2II, using a wave plate to transmit the 532nm laser and 355nm laser output from the first dichroic mirror The laser polarization direction is adjusted so that the polarization direction of the 532nm laser is consistent with the polarization direction of the 355nm laser; S2III, the second dichromatic mirror is used to transmit the 1064nm laser output by the wave plate again, and reflect the 532nm laser and 355nm laser; The speed mirror increases the laser spot area of the 532nm laser and 355nm laser that has passed through the second dichroic mirror, and outputs the 532nm laser and 355nm laser with the enlarged spot area to the five-fold frequency crystal.
  • the operating temperature range of the triple frequency crystal is 50°C to 70°C.
  • the frequency-doubling crystal in S0 is placed in the first temperature-controlled furnace, and the working temperature of the frequency-doubling crystal is 120°C to 160°C, and a temperature lock is maintained.
  • Another aspect of the present disclosure provides a device for controlling the output power of a 213nm laser, a laser output module including a frequency triple crystal for outputting a 532nm laser and a 355nm laser, and summing the 532nm laser and the 355nm laser to obtain a 213nm laser ;
  • Temperature control module the laser output module is arranged in the temperature control module, which is used to control the temperature of the triple frequency crystal, so that the corresponding 213nm laser output power can be obtained at different temperature of the triple frequency crystal;
  • the laser power The test module is used to measure the output power of the 213nm laser; the temperature control module is used to set different temperatures of the temperature of the triple frequency crystal for many times, and record the output power of the 213nm laser at different temperatures, and then the frequency triple crystal is obtained.
  • the corresponding relationship between the temperature and the output power of the 213nm laser, and according to the corresponding relationship, the temperature of the triple frequency crystal is adjusted to control the output power of the 2
  • the present disclosure provides a method and device for regulating the output power of a 213nm laser.
  • the method utilizes the principle of temperature-phase matching in nonlinear frequency conversion, and adjusts the temperature of a temperature-controlled furnace to change the crystal temperature to control the output power of a five-fold frequency 213nm laser.
  • the whole control process is simple and convenient without changing the beam quality of the 213nm laser and the stability of the entire laser system, and effectively avoiding the walk-off effect of the frequency-doubling crystal.
  • This method is practical and reliable, and does not require additional optical devices. On this basis, the precise control of the output power of the 213nm laser is realized.
  • FIG. 1 schematically shows a flow chart of a method for regulating the output power of a 213 nm laser according to an embodiment of the present disclosure
  • FIG. 2 schematically shows a flow chart of obtaining a 213 nm laser in a method for regulating the output power of a 213 nm laser according to an embodiment of the present disclosure
  • FIG. 3 schematically shows a flow chart of obtaining the corresponding relationship between the output power of the 213 nm laser and the temperature of the triple frequency crystal in the method for regulating the output power of the 213 nm laser according to an embodiment of the present disclosure
  • FIG. 4 schematically shows a structural diagram of a device for regulating the output power of a 213 nm laser according to an embodiment of the present disclosure
  • FIG. 5 schematically shows a diagram of an experimental device for regulating the output power of a 213 nm laser according to an embodiment of the present disclosure.
  • an embodiment of the present disclosure provides a method for regulating the output power of a 213 nm laser.
  • the method includes:
  • the frequency triple crystal is placed in a second temperature-controlled furnace, and the second temperature control furnace is used to set the temperature of the frequency triple crystal according to the phase matching temperature of the fundamental frequency 1064 nm laser and the 532 nm laser, so that the three The operating temperature of the frequency doubling crystal is kept in the range of 50°C ⁇ 70°C.
  • S2 use frequency triple crystal to output 532nm laser and 355nm laser.
  • the 532 nm laser is obtained by frequency doubling the fundamental frequency of the 1064 nm laser through a frequency doubling crystal, and the frequency doubling crystal outputs the remaining 1064 nm laser and 532 nm laser as the incident light of the frequency triple crystal.
  • the double frequency crystal is placed in the first temperature control furnace, and the first temperature control furnace is used to make the double frequency crystal in a stable constant temperature environment to ensure that the fundamental frequency 1064nm frequency doubles to generate a 532nm laser with high beam quality, and its output
  • the 532nm laser is coaxial with the remaining 1064nm laser and has no walk-off effect.
  • the optimal working temperature of the double frequency crystal is 120°C ⁇ 160°C, and a certain temperature within this temperature range is kept locked.
  • the operating temperature of the frequency doubling crystal is set to 150° C., and the temperature is kept locked.
  • the refractive index of the frequency triple crystal is sensitive to temperature changes, and the refractive index of the laser can be changed by changing the temperature of the frequency triple crystal, so as to achieve the purpose of phase matching.
  • the remaining 1064nm laser after the double frequency crystal and the 355nm generated by the sum frequency of the 532nm laser belong to the second type of phase matching.
  • the 1064nm laser is o light
  • the 532nm laser is e light
  • the 355nm laser generated by the sum frequency is o light.
  • the temperature of the frequency doubled crystal makes the laser not have the walk-off effect.
  • the walk-off effect means that when the light propagates in an anisotropic medium, the energy flow direction of the o light and the wave vector are not in the same direction, that is, the o light and the e light are in the same direction in the crystal. It will gradually separate when it propagates in the middle, that is, it has no effect on the output spot of the 355nm laser.
  • the temperature of the frequency triple crystal is changed.
  • the output power of the output laser is the highest. Under the condition that other conditions remain unchanged, fine-tuning the triple frequency temperature within a certain range can change the phase matching degree, so that the output power of the laser changes and the beam quality of the laser does not change.
  • a 532nm laser and a 355nm laser are combined with a frequency-five crystal to obtain a laser of 213nm, wherein the five-fold crystal is placed in a third temperature-controlled furnace, and the third temperature-controlled furnace is used to make The quintuple crystal is in a set high temperature environment to ensure that the boundary temperature of the quintuple crystal is constant. temperature lock.
  • the quintuple crystal is sensitive to temperature, its temperature changes slightly, not only the output power of the 213nm laser will change greatly, but also the output spot of the 213nm laser will be affected, because the 532nm laser and the 355nm laser All belong to o light, and the generated 213nm belongs to e light, which has a walk-off effect, resulting in an unsatisfactory roundness of the output 213nm laser spot. It is not feasible to control the output power at 213nm by adjusting the temperature of the quintuple crystal.
  • the temperature of the quintuple crystal is adjusted to a suitable temperature and locked, that is, the selected operating temperature of the quintuple crystal is 150° C., and the temperature is kept locked.
  • different temperatures of the frequency-doubling crystal are set by the second temperature control furnace, steps S1 and S3 are repeated for many times, the output power of the 213 nm laser at different temperatures is recorded, and then the temperature and the frequency of the frequency-doubling crystal are obtained.
  • the corresponding relationship between the output power of the 213nm laser, the corresponding relationship can be a one-to-one correspondence between the temperature of the triple frequency crystal and the output power of the 213nm laser in a tabular format, or the polynomial expression of the output power of the 213nm laser and the temperature of the triple frequency crystal relationship, etc.
  • S3 includes: S31 , using a quintuple frequency crystal to sum-frequency the 532 nm laser and the 355 nm laser to obtain a 213 nm laser; S32 , using a Pelinbroca prism to combine the 532 nm, 355 nm laser And 213nm laser separation processing, and make the 213nm laser's outgoing direction perpendicular to its incident direction into the Pelin Broca prism; S33, record the 213nm laser output power.
  • the Pelin Broca prism is used to separate 532 nm, 355 nm and 213 nm laser light. Since the three wavelength bands of laser light have different refractive indices in the Pelin Broca prism, the corresponding outgoing light has different There will be differences in the deflection direction. According to the calculation, the exit direction of the 213nm laser is perpendicular to the incident direction of the 213nm laser and the incident direction of the 213nm laser is set perpendicular to the incident direction of the 213nm laser for convenience.
  • the integrated design of the laser device corresponding to the method enables better output of the 213 nm laser in the state of ensuring that the lasers of each wavelength are separated, and at the same time reduces the difficulty of the fabrication process of the laser device.
  • S4 includes: S41 , repeating S1 to S3 multiple times, wherein the temperature of the frequency triple crystal is set to be different each time, and the output power of the 213 nm laser at different temperatures is recorded ; S42, process the output power data of the corresponding 213nm laser at different temperatures obtained in S41 by the data fitting function, and obtain the corresponding relationship between the temperature of the triple frequency crystal and the output power of the 213nm laser, wherein the corresponding relationship is the 213nm laser A polynomial expression of output power versus tripled crystal temperature.
  • the frequency triple crystal temperature and 213nm laser output power data are sorted out to prepare for the next stage of data fitting.
  • a matlab fitting function is used to process the data of the triple frequency crystal temperature and the 213 nm output power to obtain the relationship between them, and a commonly used fitting method is a polynomial fitting function.
  • the given N is different, and the fitted polynomial is also different. Accuracy also varies widely.
  • the value of the polynomial order N makes the squared error precision of y be controlled below 0.1, and the value of the polynomial order N can be determined.
  • the polynomial relationship between the temperature of the triple frequency crystal and the output power of the 213nm laser can be obtained.
  • the temperature of the triple frequency crystal corresponding to the output power of the 213nm laser can be obtained at any location, then the The output power of the 213nm laser was controlled by adjusting the temperature of the triple frequency crystal.
  • the method further includes: S2I, using the first dichroic mirror to transmit the 1064 nm laser light, and reflecting the 532 nm laser light and the 355 nm laser light; S2II, using a wave plate to adjust the polarization directions of the 532 nm laser light and the 355 nm laser light to make The polarization direction of the 532nm laser is the same as that of the 355nm laser; S2III, the second dichroic mirror is used to transmit the 1064nm laser again, and the 532nm laser and 355nm laser are reflected; S2IV, the beam expander is used to transmit the 532nm laser and The 355nm laser is used to increase the laser spot area, and the 532nm laser and 355nm laser with the enlarged spot area are output to the quintuple frequency crystal.
  • the first dichroic mirror and the second dichroic mirror are both HR@532nm+355nm, AR@1064nm dichroic mirrors, which are used for transmitting 1064nm laser light and reflecting 532nm laser light and 355nm laser light, so that 532nm laser light and 355nm laser light
  • the laser enters the beam expander and participates in the next stage of the five-fold frequency crystal and frequency processing, and the remaining 1064nm laser after the three-fold frequency crystal does not enter the next stage of frequency conversion.
  • the wave plate is a wave plate with performance parameters of ⁇ /2@532nm and ⁇ @355nm, which is used to rotate the polarization state direction of the 532nm laser to be consistent with the polarization state of the 355nm laser, but it is not suitable for the 355nm laser. There is no change in the direction of the polarization state.
  • the beam expander is used to increase the spot area of the incident light entering the quintuple crystal, so that the spot size of the 532 nm laser and the 355 nm laser becomes larger, and the beam divergence angle becomes smaller, which is conducive to generating a better beam quality.
  • 213nm output laser improve crystal life and improve 213nm output spot shape.
  • FIG. 4 schematically shows a structural diagram of a device for regulating the output power of a 213 nm laser according to an embodiment of the present disclosure.
  • the device includes a laser output module 410 , a temperature control module 420 and an optical power test module 430 .
  • the laser output module 410 includes a frequency triple crystal for outputting a 532nm laser and a 355nm laser.
  • the 532nm laser and the 355nm laser are summed to obtain a 213nm laser.
  • the temperature control module 420 this laser output module is arranged in the temperature control module, and it is used for controlling the temperature of the laser output module 410, so that the corresponding 213nm laser output power is obtained under the temperature of different triple frequency crystals;
  • the laser power test module 430 is used to measure the output power of the 213 nm laser; wherein, the temperature control module is used to set different temperatures of the frequency triple crystal for many times, and record the output power of the 213 nm laser at different temperatures, thereby obtaining the frequency triple crystal
  • the corresponding relationship between the temperature of the 213nm laser and the output power of the 213nm laser, and according to the corresponding relationship, the temperature of the frequency triple crystal is adjusted to control the output power of the 213nm laser.
  • the laser output module 410 further includes a frequency doubling crystal and a frequency doubling crystal.
  • the frequency doubling crystal is used for frequency doubling the laser with a fundamental frequency of 1064 nm to obtain a 532 nm laser, and outputting the 1064 nm laser and the 532 nm laser to the Frequency triple crystal, frequency triple crystal is used to phase-match 1064nm laser and 532nm laser to obtain 355nm laser, frequency triple crystal outputs the remaining 532nm laser and 355nm laser to frequency quintuple crystal, frequency doubling crystal is used to combine The 532nm laser and the 355nm laser are summed to obtain a 213nm laser.
  • the 1064nm laser, 532nm laser and 355nm laser output by the triple frequency crystal are further processed by the first dichroic mirror, the wave plate, the second dichroic mirror and the beam expander in sequence before being incident on the five frequency doubler crystal.
  • the processing process and principle thereof are shown in the above content, and will not be described in detail here.
  • the temperature control module 420 includes a first temperature control furnace, a second temperature control furnace, and a third temperature control furnace, the double frequency crystal is placed in the first temperature control furnace, and the triple frequency crystal is placed in the first temperature control furnace.
  • the quintuple frequency crystal is placed in the third temperature control furnace, and the first temperature control furnace, the second temperature control furnace and the third temperature control furnace are respectively used to make the frequency doubling crystal, The frequency doubling crystal and the quintuple frequency crystal are in the set temperature environment.
  • the 532nm laser, 355nm laser and 213nm laser output by the quintuple frequency crystal are output after being separated by the Pelin-Broca prism. According to the calculation, the outgoing direction of the 213nm laser is perpendicular to the incident direction of the 213nm laser entering the Pelin Broca prism.
  • the schematic diagram of the experimental device corresponding to the device is shown in FIG. 5 .
  • the fundamental frequency 1064 nm laser is incident on the frequency-doubling crystal 11 placed in the first temperature-controlled furnace 10 .
  • the frequency of the 1064nm laser is doubled to generate a 532nm laser, and output to the triple frequency crystal 21 placed in the second temperature control furnace 20.
  • the phase matching of the 1064 nm laser and the 532 nm laser is achieved, and the result is obtained
  • the laser wavelength is 355nm laser
  • the frequency triple crystal 21 outputs the remaining 1064nm, remaining 532nm and 355nm lasers through the first dichroic mirror 30 to transmit the 1064nm laser, reflect the 532nm laser and 355nm laser and output to the wave plate 40, the wave plate 40 will
  • the polarization direction of the 532nm laser and 355nm laser is adjusted so that the polarization direction of the 532nm laser is consistent with the polarization direction of the 355nm laser.
  • the laser output from the wave plate 40 passes through the second dichroic mirror 50 to transmit the 1064nm laser again, and reflects the 532nm laser and 355nm laser.
  • the laser beam passing through the second dichroic mirror 50 then passes through the beam expander 60 to increase the spot area of the 532nm laser and 355nm laser, and the 532nm laser and 355nm laser after the increased spot area are summed by the five-fold frequency crystal 31 to obtain a 213nm laser
  • the fivefold frequency crystal 31 is placed in the third temperature-controlled furnace 70, and it outputs the remaining 532nm laser, the remaining 355nm laser and the 213nm laser to the Pelinbroca prism 80, and the Pelinbroca prism 80 converts the 532nm, 355nm laser and 213nm laser separation processing, and make the exit direction of the 213nm laser perpendicular to the incident direction of the 213nm laser entering the Pelin Broca prism 80, as shown in FIG.
  • Instrument 90 use the laser power tester 90 to test the output power of the 213nm laser, set the temperature of the frequency triple crystal 21 to be different each time, repeat the above steps many times, and test the output power of the 213nm laser at different temperatures by the laser power tester 90. output power, and record the output power, and then obtain the corresponding relationship between the temperature of the frequency triple crystal 21 and the output power of the 213nm laser. According to the corresponding relationship, adjust the temperature of the frequency triple crystal 21 to adjust the output power of the 213nm laser.
  • FIG. 5 only in accordance with A schematic diagram of the structure of an experimental device exemplified in the embodiment of the present disclosure, in the actual application process, some components in the device can be replaced by other components with the same or similar functions, or the structure of the experimental principle device is more simplified or complicated, and this embodiment does not constitute a Definition of this experimental setup.

Abstract

Provided are a method for regulating the output power of a 213 nm laser, and an apparatus thereof, said method comprising: setting the temperature of a frequency tripling crystal (21) (S1); using the frequency tripling crystal (21) to output a 532 nm laser and a 355 nm laser (S2); summing the frequencies of the 532 nm laser and the 355 nm laser to obtain a 213 nm laser, and recording the output power of the 213 nm laser (S3); repeating the described steps (S1-S3) multiple times, the temperature of the frequency tripling crystal (21) being set differently each time, and recording the output power of the 213 nm laser at different temperatures to obtain a correlation between the temperature of the frequency tripling crystal (21) and the output power of the 213 nm laser (S4); according to said correlation, adjusting the temperature of the frequency tripling crystal (21) so as to regulate the output power of the 213 nm laser (S5).

Description

一种调控213nm激光输出功率的方法及其装置A method and device for regulating 213nm laser output power 技术领域technical field
本公开涉及激光技术领域,具体涉及一种调控213nm激光输出功率的方法及其装置。The present disclosure relates to the field of laser technology, in particular to a method and a device for regulating the output power of a 213 nm laser.
背景技术Background technique
控制激光输出功率的方式一般分为两类,一类是在输入端进行调控,例如控制激光泵浦源的电流或电压从而改变激光输出功率;另一类是在输出端进行控制,例如在激光输出端插入声光调制器用于控制激光输出功率。The methods of controlling the laser output power are generally divided into two categories. One is to control the input end, such as controlling the current or voltage of the laser pump source to change the laser output power; the other is to control the output end, such as in the laser. An acousto-optic modulator is inserted at the output end to control the laser output power.
但是,对于213nm激光器而言,首先,市面上没有可利用的在输出端进行功率控制的光学器件,其次,在输入端进行功率控制即在基频激光器的输出端调控1064nm功率输出,由于产生213nm激光需要进行至少3次频率转换,改变基频1064nm输入功率来调整多次混频后的输出光功率,会改变最终输出光213nm的光束质量,也使得频率转换中的输出功率、功率稳定性及光束质量变得不可控,增加了整个系统不稳定性。总的来说,现有市场上没有可利用的调控五倍频213nm激光输出功率的方法与装置。However, for the 213nm laser, firstly, there are no optical devices available on the market for power control at the output end, and secondly, the power control at the input end is to regulate the 1064nm power output at the output end of the fundamental frequency laser. The laser needs to perform frequency conversion at least 3 times, changing the input power of the fundamental frequency 1064nm to adjust the output optical power after multiple mixing, which will change the beam quality of the final output light at 213nm, and also make the output power in the frequency conversion, power stability and stability. The beam quality becomes uncontrollable, increasing overall system instability. In general, there are no available methods and devices on the market for regulating the output power of a quintuple 213 nm laser.
发明内容SUMMARY OF THE INVENTION
为了解决现有技术中上述问题,本公开提供了一种调控213nm激光输出功率的方法及其装置,该方法实用可靠且在不需要增加额外光学器件的基础上实现了对213nm激光输出功率的精确控制。In order to solve the above problems in the prior art, the present disclosure provides a method and device for regulating the output power of a 213 nm laser, which is practical and reliable, and realizes the precise control of the output power of a 213 nm laser without adding additional optical devices. control.
本公开的一个方面提供了一种调控213nm激光输出功率的方法,其特征在于,包括:S1,设置三倍频晶体的温度;S2,利用三倍频晶体输出532nm激光及355nm激光;S3,对532nm激光及355nm激光进行和 频得到213nm激光,并记录该213nm激光的输出功率;S4,重复执行S1~S3多次,其中,每次设置三倍频晶体的温度不同,并记录在不同温度下213nm激光的输出功率,进而得到三倍频晶体的温度与213nm激光的输出功率的对应关系;S5,根据该对应关系,调节三倍频晶体的温度,以调控213nm激光的输出功率。One aspect of the present disclosure provides a method for regulating the output power of a 213 nm laser, which includes: S1, setting the temperature of a frequency triple crystal; S2, using the frequency triple crystal to output a 532 nm laser and a 355 nm laser; S3, pairing The 532nm laser and the 355nm laser are summed to obtain a 213nm laser, and the output power of the 213nm laser is recorded; in S4, S1 to S3 are repeated for several times, wherein the temperature of the frequency tripler crystal is set at different temperatures each time, and recorded at different temperatures According to the output power of the 213nm laser, the corresponding relationship between the temperature of the triple frequency crystal and the output power of the 213nm laser is obtained; S5, according to the corresponding relationship, the temperature of the triple frequency crystal is adjusted to regulate the output power of the 213nm laser.
进一步地,S4包括:S41,重复执行S1~S3多次,其中,每次设置三倍频晶体的温度不同,并记录在不同温度下213nm激光的输出功率;S42,通过数据拟合函数处理S41中得到的不同温度下对应的213nm激光的输出功率数据,得到三倍频晶体的温度与213nm激光的输出功率的对应关系,其中,该对应关系为213nm激光的输出功率与三倍频晶体温度的多项式表达式。Further, S4 includes: S41, repeating S1 to S3 multiple times, wherein the temperature of the frequency triple crystal is set to be different each time, and recording the output power of the 213 nm laser at different temperatures; S42, processing S41 through a data fitting function The corresponding relationship between the output power of the 213nm laser and the temperature of the 213nm laser at different temperatures obtained in Polynomial expression.
进一步地,S3包括:S31,利用五倍频晶体对532nm激光及355nm激光进行和频得到213nm的激光;S32,利用佩林布洛卡棱镜将532nm、355nm及213nm的激光分离处理,并使得213nm激光的出射方向与其进入佩林布洛卡棱镜的入射方向垂直;S33,记录213nm激光的输出功率。Further, S3 includes: S31, using a quintuple frequency crystal to perform sum frequency on the 532nm laser and the 355nm laser to obtain a 213nm laser; S32, using a Perrin Broca prism to separate the 532nm, 355nm and 213nm lasers, and make the 213nm laser The outgoing direction of the laser is perpendicular to the incoming direction of the Perin Broca prism; S33, record the output power of the 213 nm laser.
进一步地,该方法还包括:S0,利用二倍频晶体将基频为1064nm激光倍频产生532nm激光,并将1064nm激光及532nm激光输出至三倍频晶体。Further, the method further includes: S0, frequency-doubling the fundamental frequency of the 1064 nm laser with a frequency-doubling crystal to generate a 532-nm laser, and outputting the 1064-nm laser and the 532-nm laser to a frequency-tripling crystal.
进一步地,S31中五倍频晶体放置在第三温控炉内,该五倍频晶体的工作温度为120℃~160℃,并保持一温度锁定。Further, the quintuple crystal in S31 is placed in the third temperature control furnace, and the operating temperature of the quintuple crystal is 120°C to 160°C, and a temperature lock is maintained.
进一步地,S1中三倍频晶体放置在第二温控炉内,第二温控炉用于根据基频1064nm激光与532nm激光相位匹配温度设置三倍频晶体的温度。Further, the triple frequency crystal in S1 is placed in the second temperature control furnace, and the second temperature control furnace is used to set the temperature of the triple frequency crystal according to the phase matching temperature of the fundamental frequency 1064 nm laser and the 532 nm laser.
进一步地,该方法还包括:S2I,利用第一双色镜将三倍频晶体输出的1064nm激光透射,并反射532nm激光及355nm激光;S2II,采用波片将第一双色镜输出的532nm激光及355nm激光偏振方向进行调整,以使532nm激光的偏振方向与355nm激光的偏振方向一致;S2III,利用第二双色镜将波片输出的1064nm激光再次透射,并反射532nm激光 及355nm激光;S2IV,采用扩速镜将经过第二双色镜的532nm激光及355nm激光进行激光光斑面积增大,并将光斑面积增大后的532nm激光及355nm激光输出至五倍频晶体。Further, the method also includes: S2I, using the first dichroic mirror to transmit the 1064nm laser output by the frequency triple crystal, and reflecting the 532nm laser and 355nm laser; S2II, using a wave plate to transmit the 532nm laser and 355nm laser output from the first dichroic mirror The laser polarization direction is adjusted so that the polarization direction of the 532nm laser is consistent with the polarization direction of the 355nm laser; S2III, the second dichromatic mirror is used to transmit the 1064nm laser output by the wave plate again, and reflect the 532nm laser and 355nm laser; The speed mirror increases the laser spot area of the 532nm laser and 355nm laser that has passed through the second dichroic mirror, and outputs the 532nm laser and 355nm laser with the enlarged spot area to the five-fold frequency crystal.
进一步地,三倍频晶体的工作温度范围为50℃~70℃。Further, the operating temperature range of the triple frequency crystal is 50°C to 70°C.
进一步地,S0中二倍频晶体放置在第一温控炉内,该二倍频晶体的工作温度为120℃~160℃,并保持一温度锁定。Further, the frequency-doubling crystal in S0 is placed in the first temperature-controlled furnace, and the working temperature of the frequency-doubling crystal is 120°C to 160°C, and a temperature lock is maintained.
本公开的另一个方面提供了一种调控213nm激光输出功率的装置,激光输出模块,包括三倍频晶体,用于输出532nm激光及355nm激光,并将532nm激光及355nm激光进行和频得到213nm激光;温度控制模块,该激光输出模块设置于温度控制模块内,其用于控制该三倍频晶体的温度,以使在不同的三倍频晶体的温度下得到对应的213nm激光输出功率;激光功率测试模块,用于测量213nm激光的输出功率;其中,通过温度控制模块多次设置三倍频晶体的温度的不同温度,并记录在不同温度下213nm激光的输出功率,进而得到三倍频晶体的温度与213nm激光的输出功率的对应关系,并根据该对应关系,调节三倍频晶体的温度,以调控213nm激光的输出功率。Another aspect of the present disclosure provides a device for controlling the output power of a 213nm laser, a laser output module including a frequency triple crystal for outputting a 532nm laser and a 355nm laser, and summing the 532nm laser and the 355nm laser to obtain a 213nm laser ; Temperature control module, the laser output module is arranged in the temperature control module, which is used to control the temperature of the triple frequency crystal, so that the corresponding 213nm laser output power can be obtained at different temperature of the triple frequency crystal; The laser power The test module is used to measure the output power of the 213nm laser; the temperature control module is used to set different temperatures of the temperature of the triple frequency crystal for many times, and record the output power of the 213nm laser at different temperatures, and then the frequency triple crystal is obtained. The corresponding relationship between the temperature and the output power of the 213nm laser, and according to the corresponding relationship, the temperature of the triple frequency crystal is adjusted to control the output power of the 213nm laser.
本公开提供的一种调控213nm激光输出功率的方法及其装置,该方法利用非线性频率转换中温度相位匹配原理,通过调节温控炉的温度从而改变晶体温度达到调控五倍频213nm激光输出功率的目的,整个调控过程简单方便且不会改变213nm激光的光束质量和整个激光系统的稳定性,且有效避免了倍频晶体的走离效应,该方法实用可靠且在不需要增加额外光学器件的基础上实现了对213nm激光输出功率的精确控制。The present disclosure provides a method and device for regulating the output power of a 213nm laser. The method utilizes the principle of temperature-phase matching in nonlinear frequency conversion, and adjusts the temperature of a temperature-controlled furnace to change the crystal temperature to control the output power of a five-fold frequency 213nm laser. The whole control process is simple and convenient without changing the beam quality of the 213nm laser and the stability of the entire laser system, and effectively avoiding the walk-off effect of the frequency-doubling crystal. This method is practical and reliable, and does not require additional optical devices. On this basis, the precise control of the output power of the 213nm laser is realized.
附图说明Description of drawings
为了更完整地理解本公开及其优势,现在将参考结合附图的以下描述,其中:For a more complete understanding of the present disclosure and its advantages, reference will now be made to the following description taken in conjunction with the accompanying drawings, in which:
图1示意性示出了根据本公开实施例的调控213nm激光输出功率的方法流程图;FIG. 1 schematically shows a flow chart of a method for regulating the output power of a 213 nm laser according to an embodiment of the present disclosure;
图2示意性示出了根据本公开实施例的调控213nm激光输出功率的方法中得到213nm激光的流程图;2 schematically shows a flow chart of obtaining a 213 nm laser in a method for regulating the output power of a 213 nm laser according to an embodiment of the present disclosure;
图3示意性示出了根据本公开实施例的调控213nm激光输出功率的方法中得到213nm激光的输出功率与三倍频晶体温度对应关系的流程图;3 schematically shows a flow chart of obtaining the corresponding relationship between the output power of the 213 nm laser and the temperature of the triple frequency crystal in the method for regulating the output power of the 213 nm laser according to an embodiment of the present disclosure;
图4示意性示出了根据本公开实施例的调控213nm激光输出功率的装置结构图;FIG. 4 schematically shows a structural diagram of a device for regulating the output power of a 213 nm laser according to an embodiment of the present disclosure;
图5示意性示出了根据本公开实施例的调控213nm激光输出功率的实验装置图。FIG. 5 schematically shows a diagram of an experimental device for regulating the output power of a 213 nm laser according to an embodiment of the present disclosure.
具体实施方式Detailed ways
以下,将参照附图来描述本公开的实施例。但是应该理解,这些描述只是示例性的,而并非要限制本公开的范围。在下面的详细描述中,为便于解释,阐述了许多具体的细节以提供对本公开实施例的全面理解。然而,明显地,一个或多个实施例在没有这些具体细节的情况下也可以被实施。此外,在以下说明中,省略了对公知结构和技术的描述,以避免不必要地混淆本公开的概念。Hereinafter, embodiments of the present disclosure will be described with reference to the accompanying drawings. It should be understood, however, that these descriptions are exemplary only, and are not intended to limit the scope of the present disclosure. In the following detailed description, for convenience of explanation, numerous specific details are set forth in order to provide a thorough understanding of the embodiments of the present disclosure. It will be apparent, however, that one or more embodiments may be practiced without these specific details. Also, in the following description, descriptions of well-known structures and techniques are omitted to avoid unnecessarily obscuring the concepts of the present disclosure.
在此使用的术语仅仅是为了描述具体实施例,而并非意在限制本公开。在此使用的术语“包括”、“包含”等表明了所述特征、步骤、操作和/或部件的存在,但是并不排除存在或添加一个或多个其他特征、步骤、操作或部件。The terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the present disclosure. The terms "comprising", "comprising" and the like as used herein indicate the presence of stated features, steps, operations and/or components, but do not preclude the presence or addition of one or more other features, steps, operations or components.
在此使用的所有术语(包括技术和科学术语)具有本领域技术人员通常所理解的含义,除非另外定义。应注意,这里使用的术语应解释为具有与本说明书的上下文相一致的含义,而不应以理想化或过于刻板的方式来解释。All terms (including technical and scientific terms) used herein have the meaning as commonly understood by one of ordinary skill in the art, unless otherwise defined. It should be noted that terms used herein should be construed to have meanings consistent with the context of the present specification and should not be construed in an idealized or overly rigid manner.
如图1所示,本公开的实施例提供了一种调控213nm激光输出功率的方法。As shown in FIG. 1 , an embodiment of the present disclosure provides a method for regulating the output power of a 213 nm laser.
如图1所示,该方法包括:As shown in Figure 1, the method includes:
S1,设置三倍频晶体的温度。S1, set the temperature of the frequency triple crystal.
本公开的实施例中,该三倍频晶体放置在第二温控炉内,第二温控炉用于根据基频1064nm激光与532nm激光相位匹配温度设置三倍频晶体的温度,以使三倍频晶体工作温度保持在50℃~70℃范围内。In the embodiment of the present disclosure, the frequency triple crystal is placed in a second temperature-controlled furnace, and the second temperature control furnace is used to set the temperature of the frequency triple crystal according to the phase matching temperature of the fundamental frequency 1064 nm laser and the 532 nm laser, so that the three The operating temperature of the frequency doubling crystal is kept in the range of 50℃~70℃.
S2,利用三倍频晶体输出532nm激光及355nm激光。S2, use frequency triple crystal to output 532nm laser and 355nm laser.
本公开的实施例中,该532nm激光通过二倍频晶体将基频为1064nm激光倍频得到,该二倍频晶体输出剩余的1064nm激光及532nm激光作为三倍频晶体的入射光。其中,二倍频晶体放置在第一温控炉内,第一温控炉用于使得二倍频晶体处于稳定的恒温环境中,保证基频1064nm倍频产生高光束质量的532nm激光,其输出的532nm激光与剩余的1064nm激光同轴且没有走离效应,该二倍频晶体最佳的工作温度为120℃~160℃,并保持该温度范围内的某一温度锁定。本公开的实施例中,该二倍频晶体的工作温度设为150℃,并保持该温度锁定。In the embodiment of the present disclosure, the 532 nm laser is obtained by frequency doubling the fundamental frequency of the 1064 nm laser through a frequency doubling crystal, and the frequency doubling crystal outputs the remaining 1064 nm laser and 532 nm laser as the incident light of the frequency triple crystal. Among them, the double frequency crystal is placed in the first temperature control furnace, and the first temperature control furnace is used to make the double frequency crystal in a stable constant temperature environment to ensure that the fundamental frequency 1064nm frequency doubles to generate a 532nm laser with high beam quality, and its output The 532nm laser is coaxial with the remaining 1064nm laser and has no walk-off effect. The optimal working temperature of the double frequency crystal is 120℃~160℃, and a certain temperature within this temperature range is kept locked. In the embodiment of the present disclosure, the operating temperature of the frequency doubling crystal is set to 150° C., and the temperature is kept locked.
本公开的实施例中,三倍频晶体的折射率对温度变化较为敏感,可以通过改变三倍频晶体温度的方法来改变激光的折射率,从而达到相位匹配的目的。其中,经过二倍频晶体剩余的1064nm激光与532nm激光和频产生的355nm属于第二类相位匹配,1064nm激光为o光,532nm激光为e光,和频产生的355nm激光为o光,调节三倍频晶体温度并使得激光没有发生走离效应,走离效应是指光在各向异性介质中传播时,o光的能流方向与波矢不是同一方向上,即o光和e光在晶体中传播时将逐渐分开,即其对355nm激光输出光斑没有影响。当入射光沿非线性三倍频晶体所确定的方向传播时,改变三倍频晶体的温度,当三倍频晶体温度等于激光的相位匹配温度时,该输出激光的输出功率最高。在其他条件均不变的情况下,一定范围内微调三倍频温度可使相位匹配度发生改变从而使得激光的输出功率发生变化且激光的光束质量不发生变化。In the embodiment of the present disclosure, the refractive index of the frequency triple crystal is sensitive to temperature changes, and the refractive index of the laser can be changed by changing the temperature of the frequency triple crystal, so as to achieve the purpose of phase matching. Among them, the remaining 1064nm laser after the double frequency crystal and the 355nm generated by the sum frequency of the 532nm laser belong to the second type of phase matching. The 1064nm laser is o light, the 532nm laser is e light, and the 355nm laser generated by the sum frequency is o light. The temperature of the frequency doubled crystal makes the laser not have the walk-off effect. The walk-off effect means that when the light propagates in an anisotropic medium, the energy flow direction of the o light and the wave vector are not in the same direction, that is, the o light and the e light are in the same direction in the crystal. It will gradually separate when it propagates in the middle, that is, it has no effect on the output spot of the 355nm laser. When the incident light propagates along the direction determined by the nonlinear frequency triple crystal, the temperature of the frequency triple crystal is changed. When the temperature of the frequency triple crystal is equal to the phase matching temperature of the laser, the output power of the output laser is the highest. Under the condition that other conditions remain unchanged, fine-tuning the triple frequency temperature within a certain range can change the phase matching degree, so that the output power of the laser changes and the beam quality of the laser does not change.
S3,对532nm激光及355nm激光进行和频得到213nm激光,并记录该213nm激光的输出功率。S3 , summing the 532 nm laser and the 355 nm laser to obtain a 213 nm laser, and recording the output power of the 213 nm laser.
本公开的实施例中,利用五倍频晶体对532nm激光及355nm激光 行和频得到213nm的激光,其中,五倍频晶体放置在第三温控炉内,该第三温控炉用于使得五倍频晶体处于设定好的高温环境中,保证五倍频晶体边界温度恒定不变,该五倍频晶体最佳的工作温度为120℃~160℃,并保持该温度范围内的某一温度锁定。In the embodiment of the present disclosure, a 532nm laser and a 355nm laser are combined with a frequency-five crystal to obtain a laser of 213nm, wherein the five-fold crystal is placed in a third temperature-controlled furnace, and the third temperature-controlled furnace is used to make The quintuple crystal is in a set high temperature environment to ensure that the boundary temperature of the quintuple crystal is constant. temperature lock.
本公开的实施例中,由于五倍频晶体对温度敏感,其温度稍有变化,不仅213nm激光输出功率会发生较大变化,还会对213nm激光的输出光斑产生影响,因为532nm激光与355nm激光都属于o光,产生的213nm属于e光,其存在走离效应,导致输出的213nm激光光斑圆度不理想,五倍频晶体温度的变化对e光敏感,导致输出激光的光斑变化,因此,利用调整五倍频晶体温度来控制213nm输出功率不可行。在本公开的实施例中,将五倍频晶体温度调控至适宜温度并锁定,即选取的五倍频晶体的工作温度为150℃,并保持该温度锁定。In the embodiment of the present disclosure, since the quintuple crystal is sensitive to temperature, its temperature changes slightly, not only the output power of the 213nm laser will change greatly, but also the output spot of the 213nm laser will be affected, because the 532nm laser and the 355nm laser All belong to o light, and the generated 213nm belongs to e light, which has a walk-off effect, resulting in an unsatisfactory roundness of the output 213nm laser spot. It is not feasible to control the output power at 213nm by adjusting the temperature of the quintuple crystal. In the embodiment of the present disclosure, the temperature of the quintuple crystal is adjusted to a suitable temperature and locked, that is, the selected operating temperature of the quintuple crystal is 150° C., and the temperature is kept locked.
S4,重复执行S1~S3多次,其中,每次设置三倍频晶体的温度不同,并记录在不同温度下213nm激光的输出功率,进而得到三倍频晶体的温度与213nm激光的输出功率的对应关系。S4, repeating S1 to S3 multiple times, wherein the temperature of the frequency tripler crystal is set to be different each time, and the output power of the 213nm laser at different temperatures is recorded, and then the temperature of the frequency tripler crystal and the output power of the 213nm laser are obtained. Correspondence.
本公开的实施例中,通过第二温控炉设置不同的三倍频晶体的温度,重复S1与S3步骤多次,记录在不同温度下213nm激光的输出功率,进而得到倍频晶体的温度与213nm激光的输出功率的对应关系,该对应关系可以是三倍频晶体温度与213nm激光的输出功率以表格式一一对应的关系,或是213nm激光的输出功率与三倍频晶体温度的多项式表达式关系等。In the embodiment of the present disclosure, different temperatures of the frequency-doubling crystal are set by the second temperature control furnace, steps S1 and S3 are repeated for many times, the output power of the 213 nm laser at different temperatures is recorded, and then the temperature and the frequency of the frequency-doubling crystal are obtained. The corresponding relationship between the output power of the 213nm laser, the corresponding relationship can be a one-to-one correspondence between the temperature of the triple frequency crystal and the output power of the 213nm laser in a tabular format, or the polynomial expression of the output power of the 213nm laser and the temperature of the triple frequency crystal relationship, etc.
S5,根据该对应关系,调节三倍频晶体的温度,以调控213nm激光的输出功率。S5, according to the corresponding relationship, adjust the temperature of the frequency triple crystal to adjust the output power of the 213 nm laser.
根据本公开的实施例,如图2所示,S3包括:S31,利用五倍频晶体对532nm激光及355nm激光进行和频得到213nm的激光;S32,利用佩林布洛卡棱镜将532nm、355nm及213nm的激光分离处理,并使得213nm激光的出射方向与其进入佩林布洛卡棱镜的入射方向垂直;S33,记录213nm激光的输出功率。According to an embodiment of the present disclosure, as shown in FIG. 2 , S3 includes: S31 , using a quintuple frequency crystal to sum-frequency the 532 nm laser and the 355 nm laser to obtain a 213 nm laser; S32 , using a Pelinbroca prism to combine the 532 nm, 355 nm laser And 213nm laser separation processing, and make the 213nm laser's outgoing direction perpendicular to its incident direction into the Pelin Broca prism; S33, record the 213nm laser output power.
根据本公开的实施例,该佩林布洛卡棱镜用于将532nm、355nm及 213nm激光分离,由于三个波段的激光在佩林布洛卡棱镜中的折射率不同,其相应的出射光的偏折方向会有差异,根据计算使得213nm激光的出射方向与其进入佩林布洛卡棱镜的入射方向垂直,将213nm激光的出射方向与其进入佩林布洛卡棱镜的入射方向设置垂直是为了方便该方法对应的激光装置的集成设计,使得在保证各波长激光分离的状态下较好的输出213nm激光的同时降低激光装置的制备工艺难度。According to an embodiment of the present disclosure, the Pelin Broca prism is used to separate 532 nm, 355 nm and 213 nm laser light. Since the three wavelength bands of laser light have different refractive indices in the Pelin Broca prism, the corresponding outgoing light has different There will be differences in the deflection direction. According to the calculation, the exit direction of the 213nm laser is perpendicular to the incident direction of the 213nm laser and the incident direction of the 213nm laser is set perpendicular to the incident direction of the 213nm laser for convenience. The integrated design of the laser device corresponding to the method enables better output of the 213 nm laser in the state of ensuring that the lasers of each wavelength are separated, and at the same time reduces the difficulty of the fabrication process of the laser device.
根据本公开的实施例,如图3所示,S4包括:S41,重复执行S1~S3多次,其中,每次设置三倍频晶体的温度不同,并记录在不同温度下213nm激光的输出功率;S42,通过数据拟合函数处理S41中得到的不同温度下对应的213nm激光的输出功率数据,得到三倍频晶体的温度与213nm激光的输出功率的对应关系,其中,该对应关系为213nm激光的输出功率与三倍频晶体温度的多项式表达式。According to an embodiment of the present disclosure, as shown in FIG. 3 , S4 includes: S41 , repeating S1 to S3 multiple times, wherein the temperature of the frequency triple crystal is set to be different each time, and the output power of the 213 nm laser at different temperatures is recorded ; S42, process the output power data of the corresponding 213nm laser at different temperatures obtained in S41 by the data fitting function, and obtain the corresponding relationship between the temperature of the triple frequency crystal and the output power of the 213nm laser, wherein the corresponding relationship is the 213nm laser A polynomial expression of output power versus tripled crystal temperature.
例如,对三倍频晶体的温度进行扫描,并实时记录213nm输出功率,设激光相位匹配温度记为T 0,此时213nm输出功率最高,记为P 0,随后在T0的基础上每次增加0.1℃,分别记为T 1、T 2、T 3、...、T n-1、T n,相应的213nm输出功率分别记为P 1、P 2、P 3、...、P n-1、P n,直至到213nm激光输出功率约为10mW,将三倍频晶体温度与213nm激光输出功率数据进行整理,为下一阶段的数据拟合做准备。 For example, scan the temperature of the frequency triple crystal, and record the output power at 213 nm in real time. Let the laser phase matching temperature be recorded as T 0 . At this time, the output power at 213 nm is the highest, recorded as P 0 , and then increase each time on the basis of T0 0.1°C, respectively denoted as T 1 , T 2 , T 3 , ..., T n-1 , T n , and the corresponding 213nm output powers were denoted as P 1 , P 2 , P 3 , ... , P n respectively -1 , P n , until the laser output power at 213nm is about 10mW, the frequency triple crystal temperature and 213nm laser output power data are sorted out to prepare for the next stage of data fitting.
根据本公开的实施例,采用matlab拟合函数处理三倍频晶体温度与213nm输出功率的数据得到它们之间的关系,一般常用的拟合方式为多项式拟合函数。在matlab中,使用的多项式拟合函数命令为y=polyfit(x,y,N),其中,函数polyfit第一个参数x的含义是拟合数据的自变量,x为三倍频晶体的温度,第二个参数y的含义是因变量,y是213nm激光的输出功率,第三个参数N代表的是拟合多项式的阶数,给定的N不同,拟合出的多项式亦不同,其精度也相差很大。通过优化matlab函数程序,多项式阶数N的取值使得y的误差平方和精度控制在0.1以下,即可确定多项式阶数N的数值。经过matlab的计算,可以得到三倍频晶体温度与213nm激光的输出功率的多项式关系,有了该已知多项式,即可得到任意一处213nm激光输出功率对应的三倍频晶体温度, 则实现了通过调节三倍频晶体温度调控213nm激光输出功率。According to an embodiment of the present disclosure, a matlab fitting function is used to process the data of the triple frequency crystal temperature and the 213 nm output power to obtain the relationship between them, and a commonly used fitting method is a polynomial fitting function. In matlab, the polynomial fitting function command used is y=polyfit(x, y, N), where the meaning of the first parameter x of the function polyfit is the independent variable of the fitted data, and x is the temperature of the triple frequency crystal , the meaning of the second parameter y is the dependent variable, y is the output power of the 213nm laser, and the third parameter N represents the order of the fitting polynomial. The given N is different, and the fitted polynomial is also different. Accuracy also varies widely. By optimizing the matlab function program, the value of the polynomial order N makes the squared error precision of y be controlled below 0.1, and the value of the polynomial order N can be determined. Through the calculation of matlab, the polynomial relationship between the temperature of the triple frequency crystal and the output power of the 213nm laser can be obtained. With the known polynomial, the temperature of the triple frequency crystal corresponding to the output power of the 213nm laser can be obtained at any location, then the The output power of the 213nm laser was controlled by adjusting the temperature of the triple frequency crystal.
根据本公开的实施例,该方法还包括:S2I,利用第一双色镜将1064nm激光透射,并反射532nm激光及355nm激光;S2II,采用波片对532nm激光及355nm激光偏振方向进行调整,以使532nm激光的偏振方向与355nm激光的偏振方向一致;S2III,利用第二双色镜再次将1064nm激光透射,并反射532nm激光及355nm激光;S2IV,采用扩束镜将经过第二双色镜的532nm激光及355nm激光进行激光光斑面积增大,并将光斑面积增大后的532nm激光及355nm激光输出至五倍频晶体。According to an embodiment of the present disclosure, the method further includes: S2I, using the first dichroic mirror to transmit the 1064 nm laser light, and reflecting the 532 nm laser light and the 355 nm laser light; S2II, using a wave plate to adjust the polarization directions of the 532 nm laser light and the 355 nm laser light to make The polarization direction of the 532nm laser is the same as that of the 355nm laser; S2III, the second dichroic mirror is used to transmit the 1064nm laser again, and the 532nm laser and 355nm laser are reflected; S2IV, the beam expander is used to transmit the 532nm laser and The 355nm laser is used to increase the laser spot area, and the 532nm laser and 355nm laser with the enlarged spot area are output to the quintuple frequency crystal.
根据本公开的实施例,第一双色镜与第二双色镜均为HR@532nm+355nm、AR@1064nm的双色镜,其用于透射1064nm激光,反射532nm激光和355nm激光,使得532nm激光和355nm激光进入扩束镜参与下一阶段的五倍频晶体和频处理,而三倍频晶体后剩余的1064nm激光不再进入下一阶段的频率变换。According to the embodiment of the present disclosure, the first dichroic mirror and the second dichroic mirror are both HR@532nm+355nm, AR@1064nm dichroic mirrors, which are used for transmitting 1064nm laser light and reflecting 532nm laser light and 355nm laser light, so that 532nm laser light and 355nm laser light The laser enters the beam expander and participates in the next stage of the five-fold frequency crystal and frequency processing, and the remaining 1064nm laser after the three-fold frequency crystal does not enter the next stage of frequency conversion.
根据本公开的实施例,波片为λ/2@532nm、λ@355nm性能参数的波片,其用于将532nm激光的偏振态方向旋转到与355nm激光的偏振态一致,但其对355nm激光的偏振态方向没有任何改变。According to an embodiment of the present disclosure, the wave plate is a wave plate with performance parameters of λ/2@532nm and λ@355nm, which is used to rotate the polarization state direction of the 532nm laser to be consistent with the polarization state of the 355nm laser, but it is not suitable for the 355nm laser. There is no change in the direction of the polarization state.
根据本公开的实施例,扩束镜用于增大进入五倍频晶体入射光的光斑面积,使得532nm激光和355nm激光的光斑变大,光束发散角变小,有利于产生光束质量较好的213nm输出激光,提高晶体使用寿命以及改善213nm输出光斑形态。According to the embodiment of the present disclosure, the beam expander is used to increase the spot area of the incident light entering the quintuple crystal, so that the spot size of the 532 nm laser and the 355 nm laser becomes larger, and the beam divergence angle becomes smaller, which is conducive to generating a better beam quality. 213nm output laser, improve crystal life and improve 213nm output spot shape.
图4示意性示出了根据本公开实施例的调控213nm激光输出功率的装置结构图。FIG. 4 schematically shows a structural diagram of a device for regulating the output power of a 213 nm laser according to an embodiment of the present disclosure.
如图4所示,该装置包括激光输出模块410、温度控制模块420及光功率测试模块430。As shown in FIG. 4 , the device includes a laser output module 410 , a temperature control module 420 and an optical power test module 430 .
激光输出模块410,包括三倍频晶体,用于输出532nm激光及355nm激光,将532nm激光及355nm激光进行和频得到213nm激光。The laser output module 410 includes a frequency triple crystal for outputting a 532nm laser and a 355nm laser. The 532nm laser and the 355nm laser are summed to obtain a 213nm laser.
温度控制模块420,该激光输出模块设置于温度控制模块内,其用于控制激光输出模块410的温度,以使在不同的三倍频晶体的温度下得 到对应的213nm激光输出功率;The temperature control module 420, this laser output module is arranged in the temperature control module, and it is used for controlling the temperature of the laser output module 410, so that the corresponding 213nm laser output power is obtained under the temperature of different triple frequency crystals;
激光功率测试模块430,用于测量213nm激光的输出功率;其中,通过温度控制模块多次设置三倍频晶体的不同温度,并记录在不同温度下213nm激光的输出功率,进而得到三倍频晶体的温度与213nm激光的输出功率的对应关系,并根据该对应关系,调节三倍频晶体的温度,以调控213nm激光的输出功率。The laser power test module 430 is used to measure the output power of the 213 nm laser; wherein, the temperature control module is used to set different temperatures of the frequency triple crystal for many times, and record the output power of the 213 nm laser at different temperatures, thereby obtaining the frequency triple crystal The corresponding relationship between the temperature of the 213nm laser and the output power of the 213nm laser, and according to the corresponding relationship, the temperature of the frequency triple crystal is adjusted to control the output power of the 213nm laser.
根据本公开的实施例,激光输出模块410还包括二倍频晶体及五倍频晶体,二倍频晶体用于将基频为1064nm激光倍频得到532nm激光,并将1064nm激光与532nm激光输出给三倍频晶体,三倍频晶体用于将1064nm激光与532nm激光通过相位匹配,得到355nm激光,三倍频晶体输出剩余的532nm激光及355nm激光至五倍频晶体,五倍频晶体用于将532nm激光及355nm激光进行和频得到213nm的激光。According to an embodiment of the present disclosure, the laser output module 410 further includes a frequency doubling crystal and a frequency doubling crystal. The frequency doubling crystal is used for frequency doubling the laser with a fundamental frequency of 1064 nm to obtain a 532 nm laser, and outputting the 1064 nm laser and the 532 nm laser to the Frequency triple crystal, frequency triple crystal is used to phase-match 1064nm laser and 532nm laser to obtain 355nm laser, frequency triple crystal outputs the remaining 532nm laser and 355nm laser to frequency quintuple crystal, frequency doubling crystal is used to combine The 532nm laser and the 355nm laser are summed to obtain a 213nm laser.
根据本公开的实施例,三倍频晶体输出的1064nm激光、532nm激光及355nm激光入射到五倍频晶体前还依次经过第一双色镜、波片、第二双色镜及扩束镜的处理,其处理过程及原理如上文内容所示,此处不再详细表述。According to the embodiment of the present disclosure, the 1064nm laser, 532nm laser and 355nm laser output by the triple frequency crystal are further processed by the first dichroic mirror, the wave plate, the second dichroic mirror and the beam expander in sequence before being incident on the five frequency doubler crystal. The processing process and principle thereof are shown in the above content, and will not be described in detail here.
根据本公开的实施例,温度控制模块420包括第一温控炉、第二温控炉及第三温控炉,该二倍频晶体放置在第一温控炉内,该三倍频晶体放置在第二温控炉内,该五倍频晶体放置在第三温控炉内,第一温控炉、第二温控炉及第三温控炉分别用于以使二倍频晶体、三倍频晶体及五倍频晶体处于设定的温度环境中。According to an embodiment of the present disclosure, the temperature control module 420 includes a first temperature control furnace, a second temperature control furnace, and a third temperature control furnace, the double frequency crystal is placed in the first temperature control furnace, and the triple frequency crystal is placed in the first temperature control furnace. In the second temperature control furnace, the quintuple frequency crystal is placed in the third temperature control furnace, and the first temperature control furnace, the second temperature control furnace and the third temperature control furnace are respectively used to make the frequency doubling crystal, The frequency doubling crystal and the quintuple frequency crystal are in the set temperature environment.
根据本公开的实施例,五倍频晶体输出的532nm激光、355nm激光及213nm激光经过佩林布洛卡棱镜分离处理后输出,由于三个波段的激光在佩林布洛卡棱镜中的折射率不同,其相应的出射光的偏折方向会有差异,根据计算使得213nm激光的出射方向与其进入佩林布洛卡棱镜的入射方向垂直。According to the embodiment of the present disclosure, the 532nm laser, 355nm laser and 213nm laser output by the quintuple frequency crystal are output after being separated by the Pelin-Broca prism. According to the calculation, the outgoing direction of the 213nm laser is perpendicular to the incident direction of the 213nm laser entering the Pelin Broca prism.
根据本公开的实施例,根据该对应关系,调节三倍频晶体的温度,以调控213nm激光的输出功率的原理如上述内容所示,再次不再详细表述。According to the embodiments of the present disclosure, according to the corresponding relationship, the principle of adjusting the temperature of the frequency triple crystal to adjust the output power of the 213 nm laser is shown in the above content, and will not be described in detail again.
根据本公开的实施例,该装置对应的实验装置原理图如图5所示,基频1064nm激光入射到放置在第一温控炉10内的二倍频晶体11,二倍频晶体11将基频为1064nm激光倍频产生532nm激光,并输出给放置在第二温控炉20内的三倍频晶体21,根据三倍频晶体21的预设温度实现1064nm激光与532nm激光的相位匹配,得到激光波长为355nm激光,三倍频晶体21输出剩余的1064nm、剩余的532nm及355nm激光经过第一双色镜30将1064nm激光透射,反射532nm激光及355nm激光并输出至波片40,波片40将532nm激光及355nm激光偏振方向进行调整,以使532nm激光的偏振方向与355nm激光的偏振方向一致,波片40输出的激光再次经过第二双色镜50再次透射1064nm激光,并反射532nm激光及355nm激光,经过第二双色镜50的激光再经过扩束镜60进行532nm激光及355nm激光的光斑面积增大,光斑面积增大后的532nm激光及355nm激光经过五倍频晶体31进行和频得到213nm激光,五倍频晶体31放置在第三温控炉70内,其输出剩余的532nm激光、剩余的355nm激光及213nm激光至佩林布洛卡棱镜80,佩林布洛卡棱镜80将532nm、355nm及213nm的激光分离处理,并使得213nm激光的出射方向与其进入佩林布洛卡棱镜80的入射方向垂直,如图5所示,该输出激光通过佩林布洛卡棱镜80输出至激光功率测试仪90,通过激光功率测试仪90测试该213nm激光的输出功率,每次设置三倍频晶体21的温度不同,多次重复上述步骤,并通过激光功率测试仪90测试在不同温度下213nm激光的输出功率,并记录该输出功率,进而得到三倍频晶体21的温度与213nm激光的输出功率的对应关系,根据该对应关系,调节三倍频晶体21的温度,以调控213nm激光的输出功率。According to the embodiment of the present disclosure, the schematic diagram of the experimental device corresponding to the device is shown in FIG. 5 . The fundamental frequency 1064 nm laser is incident on the frequency-doubling crystal 11 placed in the first temperature-controlled furnace 10 . The frequency of the 1064nm laser is doubled to generate a 532nm laser, and output to the triple frequency crystal 21 placed in the second temperature control furnace 20. According to the preset temperature of the triple frequency crystal 21, the phase matching of the 1064 nm laser and the 532 nm laser is achieved, and the result is obtained The laser wavelength is 355nm laser, the frequency triple crystal 21 outputs the remaining 1064nm, remaining 532nm and 355nm lasers through the first dichroic mirror 30 to transmit the 1064nm laser, reflect the 532nm laser and 355nm laser and output to the wave plate 40, the wave plate 40 will The polarization direction of the 532nm laser and 355nm laser is adjusted so that the polarization direction of the 532nm laser is consistent with the polarization direction of the 355nm laser. The laser output from the wave plate 40 passes through the second dichroic mirror 50 to transmit the 1064nm laser again, and reflects the 532nm laser and 355nm laser. , the laser beam passing through the second dichroic mirror 50 then passes through the beam expander 60 to increase the spot area of the 532nm laser and 355nm laser, and the 532nm laser and 355nm laser after the increased spot area are summed by the five-fold frequency crystal 31 to obtain a 213nm laser , the fivefold frequency crystal 31 is placed in the third temperature-controlled furnace 70, and it outputs the remaining 532nm laser, the remaining 355nm laser and the 213nm laser to the Pelinbroca prism 80, and the Pelinbroca prism 80 converts the 532nm, 355nm laser and 213nm laser separation processing, and make the exit direction of the 213nm laser perpendicular to the incident direction of the 213nm laser entering the Pelin Broca prism 80, as shown in FIG. Instrument 90, use the laser power tester 90 to test the output power of the 213nm laser, set the temperature of the frequency triple crystal 21 to be different each time, repeat the above steps many times, and test the output power of the 213nm laser at different temperatures by the laser power tester 90. output power, and record the output power, and then obtain the corresponding relationship between the temperature of the frequency triple crystal 21 and the output power of the 213nm laser. According to the corresponding relationship, adjust the temperature of the frequency triple crystal 21 to adjust the output power of the 213nm laser.
尽管已经在附图和前面的描述中详细地图示和描述了本公开,但是这样的图示和描述应认为是说明性的或示例性的而非限制性的,如图5所示仅是根据本公开实施例例举的一实验装置结构示意图,在实际应用过程中该装置中某些部件可用其他相同或类似功能的部件替代或是实验原理装置结构更加简化或复杂,此实施例并不构成对该实验装置的限定。While the present disclosure has been illustrated and described in detail in the accompanying drawings and the foregoing description, such illustration and description are to be considered illustrative or exemplary and not restrictive, as shown in FIG. 5 only in accordance with A schematic diagram of the structure of an experimental device exemplified in the embodiment of the present disclosure, in the actual application process, some components in the device can be replaced by other components with the same or similar functions, or the structure of the experimental principle device is more simplified or complicated, and this embodiment does not constitute a Definition of this experimental setup.
本领域技术人员可以理解,本公开的各个实施例和/或权利要求中记载的特征可以进行多种范围组合和/或结合,即使这样的组合或结合没有明确记载于本公开中。特别地,在不脱离本公开精神和教导的情况下,本公开的各个实施例和/或权利要求中记载的特征可以进行多种组合和/或结合。所有这些组合和/或结合均落入本公开的范围。Those skilled in the art will appreciate that various range combinations and/or combinations of features recited in various embodiments and/or claims of the present disclosure are possible, even if such combinations or combinations are not expressly recited in the present disclosure. In particular, various combinations and/or combinations of the features recited in the various embodiments of the present disclosure and/or in the claims may be made without departing from the spirit and teachings of the present disclosure. All such combinations and/or combinations fall within the scope of this disclosure.
尽管已经参照本公开的特定示例性实施例示出并描述了本公开,但是本领域技术人员应该理解,在不背离所附权利要求及其等同物限定的本公开的精神和范围的情况下,可以对本公开进行形式和细节上的多种改变。因此,本公开的范围不应该限于上述实施例,而是应该不仅由所附权利要求来进行确定,还由所附权利要求的等同物来进行限定。Although the present disclosure has been shown and described with reference to specific exemplary embodiments of the present disclosure, those skilled in the art will appreciate that, without departing from the spirit and scope of the present disclosure as defined by the appended claims and their equivalents, Various changes in form and detail have been made in the present disclosure. Therefore, the scope of the present disclosure should not be limited to the above-described embodiments, but should be determined not only by the appended claims, but also by their equivalents.

Claims (10)

  1. 一种调控213nm激光输出功率的方法,其特征在于,包括:A method for regulating 213nm laser output power, comprising:
    S1,设置三倍频晶体的温度;S1, set the temperature of the triple frequency crystal;
    S2,利用所述三倍频晶体输出532nm激光及355nm激光;S2, using the triple frequency crystal to output a 532nm laser and a 355nm laser;
    S3,对所述532nm激光及所述355nm激光进行和频得到213nm激光,并记录该213nm激光的输出功率;S3, summing the 532nm laser and the 355nm laser to obtain a 213nm laser, and recording the output power of the 213nm laser;
    S4,重复执行S1~S3多次,其中,每次设置所述三倍频晶体的温度不同,并记录在不同温度下所述213nm激光的输出功率,进而得到所述三倍频晶体的温度与213nm激光的输出功率的对应关系;S4, repeating S1 to S3 multiple times, wherein the temperature of the frequency triple crystal is set to be different each time, and the output power of the 213 nm laser at different temperatures is recorded, and then the temperature and the frequency of the frequency triple crystal are obtained. Corresponding relationship of output power of 213nm laser;
    S5,根据所述对应关系,调节所述三倍频晶体的温度,以调控所述213nm激光的输出功率。S5, according to the corresponding relationship, adjust the temperature of the frequency triple crystal to adjust the output power of the 213 nm laser.
  2. 根据权利要求1所述的调控213nm激光输出功率的方法,其特征在于,所述S4包括:The method for regulating 213nm laser output power according to claim 1, wherein the S4 comprises:
    S41,重复执行S1~S3多次,其中,每次设置所述三倍频晶体的温度不同,并记录在不同温度下所述213nm激光的输出功率;S41, repeating S1 to S3 multiple times, wherein the temperature of the frequency triple crystal is set to be different each time, and the output power of the 213 nm laser at different temperatures is recorded;
    S42,通过数据拟合函数处理所述S41中得到的不同温度下对应的所述213nm激光的输出功率数据,得到所述三倍频晶体的温度与213nm激光的输出功率的对应关系,其中,该对应关系为213nm激光的输出功率与所述三倍频晶体温度的多项式表达式。S42, processing the output power data of the 213 nm laser corresponding to the different temperatures obtained in S41 through a data fitting function to obtain the corresponding relationship between the temperature of the triple frequency crystal and the output power of the 213 nm laser, wherein the The corresponding relationship is the polynomial expression of the output power of the 213 nm laser and the temperature of the frequency tripled crystal.
  3. 根据权利要求1所述的调控213nm激光输出功率的方法,其特征在于,所述S3包括:The method for regulating 213nm laser output power according to claim 1, wherein the S3 comprises:
    S31,利用五倍频晶体对所述532nm激光及所述355nm激光进行和频得到213nm的激光;S31, using a frequency-five crystal to perform sum frequency on the 532nm laser and the 355nm laser to obtain a 213nm laser;
    S32,利用佩林布洛卡棱镜将所述532nm、355nm及213nm的激光分离处理,并使得所述213nm激光的出射方向与其进入所述佩林布洛卡棱镜的入射方向垂直;S32, separate and process the 532nm, 355nm and 213nm lasers by using a Pelinbroca prism, and make the exit direction of the 213nm laser perpendicular to the incident direction of the 213nm laser entering the Pelinbroca prism;
    S33,记录所述213nm激光的输出功率。S33, recording the output power of the 213 nm laser.
  4. 根据权利要求1所述的调控213nm激光输出功率的方法,其特征在于,该方法还包括:S0,利用二倍频晶体将基频为1064nm激光倍 频产生532nm激光,并将所述1064nm激光及532nm激光输出至所述三倍频晶体。The method for regulating 213nm laser output power according to claim 1, characterized in that, the method further comprises: S0, using a frequency-doubling crystal to frequency double the fundamental frequency of a 1064nm laser to generate a 532nm laser, and combine the 1064nm laser and the The 532nm laser is output to the frequency triple crystal.
  5. 根据权利要求3所述的调控213nm激光输出功率的方法,其特征在于,所述S31中所述五倍频晶体放置在第三温控炉内,所述五倍频晶体的工作温度为120℃~160℃,并保持一温度锁定。The method for regulating 213nm laser output power according to claim 3, wherein the quintuple crystal in S31 is placed in a third temperature-controlled furnace, and the operating temperature of the quintuple crystal is 120°C ~160°C and maintain a temperature lock.
  6. 根据权利要求4所述的调控213nm激光输出功率的方法,其特征在于,所述S1中所述三倍频晶体放置在第二温控炉内,所述第二温控炉用于根据所述基频1064nm激光与所述532nm激光相位匹配温度设置所述三倍频晶体的温度。The method for regulating the output power of a 213 nm laser according to claim 4, wherein the triple frequency crystal in the S1 is placed in a second temperature-controlled furnace, and the second temperature-controlled furnace is used to The fundamental frequency 1064nm laser and the 532nm laser phase matching temperature set the temperature of the triple frequency crystal.
  7. 根据权利要求6所述的调控213nm激光输出功率的方法,其特征在于,该方法还包括:The method for regulating 213nm laser output power according to claim 6, wherein the method further comprises:
    S2I,利用第一双色镜将所述三倍频晶体输出的所述1064nm激光透射,并反射所述532nm激光及所述355nm激光;S2I, using the first dichroic mirror to transmit the 1064nm laser output from the triple frequency crystal, and to reflect the 532nm laser and the 355nm laser;
    S2II,采用波片将所述第一双色镜输出的所述532nm激光及所述355nm激光偏振方向进行调整,以使所述532nm激光的偏振方向与所述355nm激光的偏振方向一致;S2II, using a wave plate to adjust the polarization directions of the 532nm laser and the 355nm laser output by the first dichroic mirror, so that the polarization direction of the 532nm laser is consistent with the polarization direction of the 355nm laser;
    S2III,利用第二双色镜将所述波片输出的所述1064nm激光再次透射,并反射所述532nm激光及所述355nm激光;S2III, using the second dichroic mirror to transmit the 1064nm laser output from the wave plate again, and to reflect the 532nm laser and the 355nm laser;
    S2IV,采用扩速镜将经过所述第二双色镜的所述532nm激光及所述355nm激光进行激光光斑面积增大,并将光斑面积增大后的所述532nm激光及所述355nm激光输出至所述五倍频晶体。S2IV, the expansion mirror is used to increase the laser spot area of the 532nm laser and the 355nm laser passing through the second dichroic mirror, and the 532nm laser and the 355nm laser with the enlarged spot area are output to The quintuple frequency crystal.
  8. 根据权利要求6所述的调控213nm激光输出功率的方法,其特征在于,所述三倍频晶体的工作温度范围为50℃~70℃。The method for regulating the output power of a 213 nm laser according to claim 6, wherein the operating temperature range of the triple frequency crystal is 50°C to 70°C.
  9. 根据权利要求4所述的调控213nm激光输出功率的方法,其特征在于,所述S0中所述二倍频晶体放置在第一温控炉内,所述二倍频晶体的工作温度为120℃~160℃,并保持一温度锁定。The method for regulating 213nm laser output power according to claim 4, wherein the frequency-doubling crystal in the S0 is placed in a first temperature control furnace, and the working temperature of the frequency-doubling crystal is 120°C ~160°C and maintain a temperature lock.
  10. 一种调控213nm激光输出功率的装置,其特征在于,包括:A device for regulating 213nm laser output power, characterized in that it includes:
    激光输出模块,包括三倍频晶体,用于输出532nm激光及355nm激光,并将所述532nm激光及所述355nm激光进行和频得到213nm激 光;The laser output module includes a frequency tripled crystal for outputting a 532nm laser and a 355nm laser, and summing the 532nm laser and the 355nm laser to obtain a 213nm laser;
    温度控制模块,所述激光输出模块设置于所述温度控制模块内,其用于控制所述三倍频晶体的温度,以使在不同的三倍频晶体的温度下得到对应的所述213nm激光输出功率;A temperature control module, the laser output module is arranged in the temperature control module, which is used to control the temperature of the frequency triple crystal, so that the corresponding 213nm laser can be obtained at different temperatures of the frequency triple crystal Output Power;
    激光功率测试模块,用于测量所述213nm激光的输出功率;A laser power test module for measuring the output power of the 213nm laser;
    其中,通过温度控制模块多次设置所述三倍频晶体的温度的不同温度,并记录在不同温度下所述213nm激光的输出功率,进而得到所述三倍频晶体的温度与213nm激光的输出功率的对应关系,并根据所述对应关系,调节所述三倍频晶体的温度,以调控所述213nm激光的输出功率。The temperature control module is used to set different temperatures of the temperature of the frequency triple crystal for many times, and record the output power of the 213nm laser at different temperatures, so as to obtain the temperature of the frequency triple crystal and the output of the 213nm laser. The corresponding relationship of power, and according to the corresponding relationship, the temperature of the frequency triple crystal is adjusted to adjust the output power of the 213 nm laser.
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