WO2022098075A1 - Method for preparing phenolic novolac resin - Google Patents

Method for preparing phenolic novolac resin Download PDF

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WO2022098075A1
WO2022098075A1 PCT/KR2021/015763 KR2021015763W WO2022098075A1 WO 2022098075 A1 WO2022098075 A1 WO 2022098075A1 KR 2021015763 W KR2021015763 W KR 2021015763W WO 2022098075 A1 WO2022098075 A1 WO 2022098075A1
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novolak
phenolic resin
reaction
type phenolic
formula
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PCT/KR2021/015763
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French (fr)
Korean (ko)
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김원준
김혜현
박동경
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송원산업 주식회사
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Priority to CN202180075048.7A priority Critical patent/CN116390962A/en
Priority to JP2023525576A priority patent/JP2023548088A/en
Publication of WO2022098075A1 publication Critical patent/WO2022098075A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/10Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols

Definitions

  • the present invention relates to a method for producing a novolak-type phenol resin, and more particularly, to a novolac-type phenol resin that suppresses the reaction of by-products such as ether series or halogen alkyl and minimizes loss of hydroxyl groups during the reaction process. it's about how
  • Novolac-type phenolic resin (Phenolic Novolac Resin) is widely used in adhesives, molding materials, paints, photoresist materials, epoxy resin raw materials, etc. due to excellent heat resistance and moisture resistance.
  • a curing agent such as an epoxy resin
  • electrical and electronic fields such as semiconductor encapsulants and insulating materials for printed wiring boards.
  • Conventional novolak-type phenolic resin is synthesized by adding 4,4'-bis(chloromethyl)-1,1-biphenyl and phenol to an organic solvent or an alcohol-based solvent and then reacting in the presence of an acid catalyst. synthesized
  • An increase in the hydroxyl equivalent weight means a decrease in the number of hydroxyl groups per unit molecule. It causes a problem that the physical and chemical properties of the product may be deteriorated.
  • the present invention has been devised to solve the above-described problems, and an object of the present invention is to provide a high-quality novolak-type phenol resin prepared by suppressing side reactions causing by-products and a method for producing the same.
  • 4,4'-bis(chloromethyl)-1,1-bi is dissolved in water as a reaction solvent in the absence of an acid catalyst. It includes the steps of preparing a mixed solution by adding phenyl and phenol compounds, reacting the mixed solution at 40 to 180° C. for 1 to 10 hours, and evaporating the reaction solvent and residual material to solidify the reactant.
  • the method may further include discharging all or part of the hydrogen chloride generated in the reaction process in a state of dissolving it in water, which is the reaction solvent.
  • the preparing of the mixed solution comprises adding 10 wt% to 500w% of water based on the weight of 4,4'-bis(chloromethyl)-1,1-biphenyl. may include steps.
  • the method may further include adding 1.5 to 5 mol-equivalent of a phenolic compound to the 4,4'-bis(chloromethyl)-1,1-biphenyl.
  • the novolak-type phenolic resin is represented by the following formula (I).
  • the novolak-type phenolic resin composition according to another embodiment of the present invention includes a compound represented by the following formula (I) having a hydroxyl equivalent of 200 to 235 g/eq and a softening point of 86 to 92°C.
  • the content of the compound represented by the following formula (II) or the compound represented by the formula (III) may be less than 0.5 wt% based on the weight of the novolak-type phenol resin composition.
  • the compound represented by the formula (II) or the compound represented by the formula (III) may not be included.
  • the compound represented by Formula 1 may be obtained by condensation reaction of 4,4'-bis(chloromethyl)-1,1-biphenyl with a phenol compound.
  • the phenol compound may be any one of phenol, o-cresol, m-cresol, p-cresol, catechol, hydroquinone, resorcinol, pyrogallol, and a-naphthol.
  • the phenolic compound is phenol.
  • the amount of phenol used is 1.5 to 5 mol-equivalent based on 4,4'-bis(chloromethyl)-1,1-biphenyl. Preferably, 2 to 4.5 mol-equivalents are used.
  • water is used as the reaction solvent in the manufacturing method according to an embodiment of the present invention. Specifically, water as a reaction solvent is introduced into the reactor simultaneously or sequentially with the 4,4'-bis(chloromethyl)-1,1-biphenyl and phenol compounds.
  • Water as a reaction solvent is 10wt% to 300w%, preferably 30wt% to 200w%, more preferably 50wt% to 100w% based on the weight of 4,4'-bis(chloromethyl)-1,1-biphenyl is used
  • reaction solvent When water is used as the reaction solvent, it is possible to achieve the effect of increasing the yield of products by suppressing the formation of by-products such as ether series, halogen alkyl compounds or di-alkyl ether compounds without accompanying loss of hydroxyl groups. .
  • the reaction temperature is set to 40 ⁇ 180 °C under atmospheric conditions.
  • the reaction temperature is 90 ⁇ 110 °C.
  • the reaction time is 1 to 10 hours.
  • Hydrogen chloride gas When the temperature inside the reactor reaches 90 ⁇ 110 °C under the above conditions, hydrogen chloride gas is generated. Hydrogen chloride gas may be dissolved in water as a reaction solvent and discharged to the outside.
  • an organic solvent is added to the reactor to extract organic matter.
  • the organic solvent for extracting the organic material methyl cellosolve, ethyl cellosolve, toluene, xylene, methyl isobutyl ketone, and the like may be used.
  • toluene is used.
  • the hydroxyl equivalent (reciprocal of the number of OH per unit g) of the novolak-type phenol resin represented by Formula 1 obtained through the above-described process is 200 to 235 g/eq. Preferably it is 225-235 g/eq.
  • the hydroxyl equivalent measurement method is as follows.
  • a solution was prepared by mixing 7.8 ml of acetic anhydride and 35 ml of pyridine, and 5 ml of the mixed solution was mixed with 1 g of the sample and reacted at 160 ° C for 1 hour. Then, after adding 1 to 1.5 ml of distilled water, the reaction was further carried out for 15 minutes or more, followed by cooling.
  • the hydroxyl equivalent was calculated by substituting the values of the measured blank and the sample solution into the following equation.
  • B the measured value of the blank solution
  • V the measured value of the sample solution
  • the softening point of the novolak-type phenol resin represented by the formula (1) is 86 ⁇ 92 °C.
  • the softening point was measured using Metler Toledo's model name DP70. First, the sample to be measured was melted at 140° C. to 160° C., then filled in a cup provided in the measuring device, and then the surface was flattened. A cover was put on the upper part of the cup, and a glass tube was inserted into the lower part to be fixed to the carrier, and then the measurement was started with the carrier inserted into the measuring device.
  • the initial temperature is set at 60°C and held for 10 seconds, heated at a rate of 2°C/min. The temperature was determined as the softening point.
  • the content of the compound represented by Formula 2 or Formula 3 included in the novolak-type phenolic resin composition synthesized through the above-described process is less than 0.5 wt% based on the total weight of the novolak-type phenolic resin composition. Preferably less than 0.3 wt %. More preferably, the novolak-type phenolic resin composition does not substantially include a compound represented by the following Chemical Formula 2 or Chemical Formula 3.
  • the mobile phase THF (GPC grade) was set at 1 ml/min, and after operating the GPC, THF was flowed sufficiently to stabilize it. Thereafter, 0.05 g of the sample was dissolved in THF to prepare a sample solution.
  • the hydroxyl equivalent of the novolak-type phenol resin represented by Formula 1 was 227 g/eq, and the softening point was measured to be 91.6°C.
  • the hydroxyl equivalent of the novolak-type phenol resin was 227 g/eq, and the softening point was measured to be 89.1°C.
  • Hydrochloric acid diluted to a concentration of 35% and 2.1 molar equivalents of phenol based on 4,4'-bis(chloromethyl)-1,1-biphenyl was added to the reactor. Toluene was used as the reaction solvent. 100 wt% of 4,4'-bis(chloromethyl)-1,1-biphenyl was used for water, and 0.8 wt% of hydrochloric acid was used.
  • the temperature of the reactor was raised to 110-115° C. to reflux toluene, and hydrochloric acid gas generated as the reaction progressed was discharged to the outside of the reactor to be collected in water or sodium hydroxide solution.
  • the hydroxyl equivalent of the novolak-type phenol resin represented by Chemical Formula 1 was 244 g/eq, and the softening point was measured to be 85.9°C.

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

Disclosed is a method for preparing a phenolic novolac resin. A method for preparing a phenolic novolac resin according to an embodiment of the present invention is directed to a reaction in the absence of an acid catalyst, the method comprising the steps of: adding 4,4'-bis(chloromethyl)-1,1-biphenyl and phenolic compounds to prepare a mixture solution; subjecting the mixture solution to reaction at 40-180°C for 1-10 hours; and evaporating and removing the reaction solvent and residual materials and solidifying the reaction product.

Description

노볼락형 페놀 수지 그 제조방법Novolak-type phenolic resin manufacturing method
본 발명은 노볼락형 페놀 수지 그 제조방법에 관한 것으로, 보다 상세하게는 에테르 계열 또는 할로겐 알킬 등과 같은 부산물의 반응을 억제하고 반응 과정에서 히드록실 그룹의 소실을 최소화한 노볼락형 페놀 수지 그 제조방법에 관한 것이다.The present invention relates to a method for producing a novolak-type phenol resin, and more particularly, to a novolac-type phenol resin that suppresses the reaction of by-products such as ether series or halogen alkyl and minimizes loss of hydroxyl groups during the reaction process. it's about how
노볼락형 페놀 수지(Phenolic Novolac Resin)은 우수한 내열성 및 내습성 등으로 인해 접착제, 성형 재료, 도료, 포토레지스트 재료, 에폭시 수지 원료 등에 널리 사용되고 있다.Novolac-type phenolic resin (Phenolic Novolac Resin) is widely used in adhesives, molding materials, paints, photoresist materials, epoxy resin raw materials, etc. due to excellent heat resistance and moisture resistance.
특히, 에폭시 수지 등의 경화제로서 반도체 봉지재나 프린트 배선판용 절연 재료 등의 전기전자 분야에서 폭넓게 사용되고 있다.In particular, as a curing agent such as an epoxy resin, it is widely used in electrical and electronic fields such as semiconductor encapsulants and insulating materials for printed wiring boards.
종래의 노볼락형 페놀 수지는 유기 용매 또는 알코올류계 용매에 4,4'-비스(클로로메틸)-1,1-바이페닐과 페놀을 투입한 후, 산 촉매의 존재 하에서 반응시켜 합성시키는 방법으로 합성되었다.Conventional novolak-type phenolic resin is synthesized by adding 4,4'-bis(chloromethyl)-1,1-biphenyl and phenol to an organic solvent or an alcohol-based solvent and then reacting in the presence of an acid catalyst. synthesized
그러나, 반응 공정에서 유기 용매를 사용하는 경우 에테르 계열의 부산물이 발생되는 부반응을 야기하여 히드록실의 g당량(단위 g당 OH 개수의 역수) 값이 높게 나타난다는 문제점이 있었다.However, when an organic solvent is used in the reaction process, there is a problem in that the gram equivalent of hydroxyl (the reciprocal of the number of OH per unit g) value is high due to a side reaction in which ether-based by-products are generated.
히드록실 g당량(hydroxyl equivalent weight)가 높아진다는 것은 단위 분자당 히드록실 그룹의 수가 줄어든다는 것을 의미하는데, 이 경우 에폭시화 될 수 있는 부분이 줄어들게 되어 결과적으로 제품 경화 후 폴리머의 가교밀도 저하로 인해 제품의 물리화학적 특성이 열화될 수 있는 문제를 야기하게 된다.An increase in the hydroxyl equivalent weight means a decrease in the number of hydroxyl groups per unit molecule. It causes a problem that the physical and chemical properties of the product may be deteriorated.
또한, 메탄올, 에탄올, 이소프로필알코올 등과 같은 알코올류계 용매를 사용하는 경우 산촉매와 알코올이 반응으로 할로젠화알킬이 생성되고, 할로젠화 알킬은 반응물인 페놀과 반응하여 알킬페놀 등과 같은 다양한 부산물을 형성하게 된다. 부산물의 형성은 최종 제품의 수율을 저하시킬 뿐만 아니라 반응물인 페놀의 회수 및 재사용 과정에서도 추가적은 문제를 야기하게 된다.In addition, when an alcohol-based solvent such as methanol, ethanol, or isopropyl alcohol is used, an acid catalyst and alcohol react to produce an alkyl halide, and the alkyl halide reacts with a reactant phenol to produce various by-products such as alkylphenol. will form The formation of by-products not only lowers the yield of the final product, but also causes additional problems in the recovery and reuse of phenol as a reactant.
이에, 다양한 형태의 부산물을 형성하는 부반응을 억제하면서도 우수한 품질의 노볼락형 페놀 수지를 제조할 수 있는 새로운 제조방법에 대한 필요성이 대두되었다.Accordingly, there has been a need for a new manufacturing method capable of producing a novolak-type phenolic resin of excellent quality while suppressing side reactions that form various types of by-products.
본 발명은 상술한 문제점을 해결하기 위해 안출된 것으로, 본 발명의 목적은 부산물을 야기하는 부반응을 억제하여 제조한 고품질의 노볼락형 페놀 수지 및 그의 제조방법을 제공하는데 있다.The present invention has been devised to solve the above-described problems, and an object of the present invention is to provide a high-quality novolak-type phenol resin prepared by suppressing side reactions causing by-products and a method for producing the same.
본 발명의 과제들은 이상에서 언급한 과제들로 제한되지 않으며, 언급되지 않는 또 다른 과제들은 아래의 기재로부터 당업자에게 명확하게 이해될 수 있을 것이다.The problems of the present invention are not limited to the problems mentioned above, and other problems not mentioned will be clearly understood by those skilled in the art from the following description.
상술한 목적을 달성하기 위한 본 발명의 일 실시예에 따른 노볼락형 페놀 수지 제조방법은, 산 촉매 부재하, 반응 용매인 물에 4,4'-비스(클로로메틸)-1,1-바이페닐 및 페놀류 화합물을 투입하여 혼합 용액을 제조 단계, 상기 혼합 용액을 40~180℃에서 1~10시간 동안 반응시키는 단계 및 상기 반응 용매, 잔여 물질을 증발 제거하고 반응물을 고체화하는 단계를 포함한다.In the novolak-type phenol resin manufacturing method according to an embodiment of the present invention for achieving the above object, 4,4'-bis(chloromethyl)-1,1-bi is dissolved in water as a reaction solvent in the absence of an acid catalyst. It includes the steps of preparing a mixed solution by adding phenyl and phenol compounds, reacting the mixed solution at 40 to 180° C. for 1 to 10 hours, and evaporating the reaction solvent and residual material to solidify the reactant.
본 발명의 일 실시예에 따르면, 반응 과정에서 생성된 염화수소 전부 또는 일부를 상기 반응 용매인 물에 용해시킨 상태로 배출하는 단계를 더 포함할 수 있다.According to an embodiment of the present invention, the method may further include discharging all or part of the hydrogen chloride generated in the reaction process in a state of dissolving it in water, which is the reaction solvent.
본 발명의 일 실시예에 따르면, 상기 혼합 용액을 제조하는 단계는, 상기 4,4'-비스(클로로메틸)-1,1-바이페닐의 중량에 대하여 10wt% 내지 500w%의 물을 투입하는 단계를 포함할 수 있다. According to an embodiment of the present invention, the preparing of the mixed solution comprises adding 10 wt% to 500w% of water based on the weight of 4,4'-bis(chloromethyl)-1,1-biphenyl. may include steps.
본 발명의 일 실시예에 따르면, 상기 4,4'-비스(클로로메틸)-1,1-바이페닐에 대하여 1.5 내지 5mol-당량의 페놀류 화합물을 투입하는 단계를 더 포함할 수 있다.According to an embodiment of the present invention, the method may further include adding 1.5 to 5 mol-equivalent of a phenolic compound to the 4,4'-bis(chloromethyl)-1,1-biphenyl.
본 발명의 일 실시예에 따르면, 노볼락형 페놀 수지는 하기 화학식(I) 로 표현된다.According to an embodiment of the present invention, the novolak-type phenolic resin is represented by the following formula (I).
Figure PCTKR2021015763-appb-I000001
(I)
Figure PCTKR2021015763-appb-I000001
(I)
본 발명의 또 다른 실시예 따른 노볼락형 페놀 수지 조성물은 히드록실 당량이 200~235g/eq이고, 연화점이 86~92℃인 하기 화학식(I)로 표현되는 화합물을 포함한다.The novolak-type phenolic resin composition according to another embodiment of the present invention includes a compound represented by the following formula (I) having a hydroxyl equivalent of 200 to 235 g/eq and a softening point of 86 to 92°C.
Figure PCTKR2021015763-appb-I000002
(I)
Figure PCTKR2021015763-appb-I000002
(I)
본 발명의 일 실시예에 따르면, 하기 화학식(II)로 표시되는 화합물 또는 화학식(III)으로 표시되는 화합물의 함량이 노볼락형 페놀 수지 조성물 중량 대비 0.5wt% 미만일 수 있다.According to an embodiment of the present invention, the content of the compound represented by the following formula (II) or the compound represented by the formula (III) may be less than 0.5 wt% based on the weight of the novolak-type phenol resin composition.
Figure PCTKR2021015763-appb-I000003
(II)
Figure PCTKR2021015763-appb-I000003
(II)
Figure PCTKR2021015763-appb-I000004
(III)
Figure PCTKR2021015763-appb-I000004
(III)
본 발명의 일 실시예에 따르면, 상기 화학식(II)로 표시되는 화합물 또는 화학식(III)로 표시되는 화합물을 포함하지 않을 수 있다.According to an embodiment of the present invention, the compound represented by the formula (II) or the compound represented by the formula (III) may not be included.
상술한 노볼락형 페놀 수지 그 제조방법에 따르면 에테르 계열 또는 알킬페놀 등과 같은 부산물의 생성을 억제하여 고순도의 노볼락형 페놀 수지를 제조할 수 있게 된다는 효과를 달성할 수 있다.According to the method for producing the above-described novolak-type phenolic resin, it is possible to achieve the effect that a high-purity novolak-type phenolic resin can be manufactured by suppressing the production of by-products such as ether-based or alkylphenol.
또한, 히드록실의 g당량이 목표 수준에 부합하는 노볼락형 페놀 수지를 제조할 수 있게 된다는 효과를 달성할 수 있다.In addition, the effect of being able to produce a novolak-type phenol resin in which the gram equivalent of hydroxyl meets the target level can be achieved.
본 발명의 효과들은 이상에서 언급한 효과들로 제한되지 않으며, 언급되지 않은 또 다른 효과들은 청구범위의 기재로부터 당업자에게 명확하게 이해될 수 있을 것이다.Effects of the present invention are not limited to the effects mentioned above, and other effects not mentioned will be clearly understood by those skilled in the art from the description of the claims.
이하 본 발명의 실시예에 대하여 첨부한 도면을 참조하여 상세하게 설명하기로 한다. 다만, 첨부된 도면은 본 발명의 내용을 보다 쉽게 개시하기 위하여 설명되는 것일 뿐, 본 발명의 범위가 첨부된 도면의 범위로 한정되는 것이 아님은 이 기술분야의 통상의 지식을 가진 자라면 용이하게 알 수 있을 것이다. Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the accompanying drawings are only described to more easily disclose the contents of the present invention, and those of ordinary skill in the art can easily understand that the scope of the present invention is not limited to the scope of the accompanying drawings. you will know
그리고, 본 발명의 실시예를 설명함에 있어서, 동일 기능을 갖는 구성요소에 대해서는 동일 명칭 및 동일부호를 사용할 뿐 실질적으론 종래기술의 구성요소와 완전히 동일하지 않음을 미리 밝힌다.And, in describing the embodiment of the present invention, the same name and the same reference numerals are used for components having the same function, but substantially not completely the same as the components of the prior art.
또한, 본 출원에서 사용한 용어는 단지 특정한 실시예를 설명하기 위해 사용된 것으로, 본 발명을 한정하려는 의도가 아니다. 단수의 표현은 문맥상 명백하게 다르게 뜻하지 않는 한, 복수의 표현을 포함한다. 본 출원에서, "포함하다" 또는 "가지다" 등의 용어는 명세서상에 기재된 특징, 숫자, 단계, 동작, 구성요소, 부품 또는 이들을 조합한 것이 존재함을 지정하려는 것이지, 하나 또는 그 이상의 다른 특징들이나 숫자, 단계, 동작, 구성요소, 부품 또는 이들을 조합한 것들의 존재 또는 부가 가능성을 미리 배제하지 않는 것으로 이해되어야 한다.In addition, the terms used in the present application are only used to describe specific embodiments, and are not intended to limit the present invention. The singular expression includes the plural expression unless the context clearly dictates otherwise. In the present application, terms such as “comprise” or “have” are intended to designate that a feature, number, step, operation, component, part, or combination thereof described in the specification exists, but one or more other features It should be understood that this does not preclude the existence or addition of numbers, steps, operations, components, parts, or combinations thereof.
화학식 1로 표시되는 화합물은 4,4'-비스(클로로메틸)-1,1-바이페닐과 페놀류 화합물을 축합 반응시켜 얻을 수 있다.The compound represented by Formula 1 may be obtained by condensation reaction of 4,4'-bis(chloromethyl)-1,1-biphenyl with a phenol compound.
Figure PCTKR2021015763-appb-C000001
Figure PCTKR2021015763-appb-C000001
여기에서 페놀류 화합물은, 페놀, o-크레졸, m-크레졸, p-크레졸, 카테콜, 하이드로퀴논, 레조르시놀, 피로갈롤, a-나프톨 중 어느 하나일 수 있다. 바람직하게, 페놀류 화합물은 페놀이다.Here, the phenol compound may be any one of phenol, o-cresol, m-cresol, p-cresol, catechol, hydroquinone, resorcinol, pyrogallol, and a-naphthol. Preferably, the phenolic compound is phenol.
페놀류 화합물로 페놀이 사용되는 경우, 페놀의 사용량은 4,4'-비스(클로로메틸)-1,1-바이페닐을 기준으로 1.5 ~ 5 mol-당량이 사용된다. 바람직하게는, 2 ~ 4.5mol-당량이 사용된다.When phenol is used as the phenol compound, the amount of phenol used is 1.5 to 5 mol-equivalent based on 4,4'-bis(chloromethyl)-1,1-biphenyl. Preferably, 2 to 4.5 mol-equivalents are used.
한편, 본 발명의 일 실시예에 따른 제조 방법에서의 반응 용매는 물이 사용된다. 구체적으로, 반응 용매로서의 물은 반응기에 4,4'-비스(클로로메틸)-1,1-바이페닐, 페놀류 화합물과 동시에 투입되거나 순차적으로 투입된다.Meanwhile, water is used as the reaction solvent in the manufacturing method according to an embodiment of the present invention. Specifically, water as a reaction solvent is introduced into the reactor simultaneously or sequentially with the 4,4'-bis(chloromethyl)-1,1-biphenyl and phenol compounds.
반응 용매로서의 물은 4,4'-비스(클로로메틸)-1,1-바이페닐의 중량에 대하여 10wt% 내지 300w%, 바람직하게는 30wt% 내지 200w%, 더욱 바람직하게는 50wt% 내지 100w%가 사용된다.Water as a reaction solvent is 10wt% to 300w%, preferably 30wt% to 200w%, more preferably 50wt% to 100w% based on the weight of 4,4'-bis(chloromethyl)-1,1-biphenyl is used
반응 용매로서 물을 사용하면 히드록실 그룹의 소실을 수반하지 않으면서도 에테르 계열, 할로겐 알킬 화합물 또는 디-알킬 에테르 화합물과 같은 부산물의 생성을 억제하여 제품의 수율을 높일 수 있다는 효과를 달성할 수 있다.When water is used as the reaction solvent, it is possible to achieve the effect of increasing the yield of products by suppressing the formation of by-products such as ether series, halogen alkyl compounds or di-alkyl ether compounds without accompanying loss of hydroxyl groups. .
또한, 반응 과정에서 필연적으로 발생하는 가스상의 HCl을 포집하기 위한 대용량의 스크러버 장치를 구비하지 않더라도 HCL의 전부 또는 일부를 반응 용매엔 물에 용해시켜 배출할 수 있게 된다는 효과를 달성할 수 있다.In addition, even without a large-capacity scrubber device for collecting gaseous HCl that is inevitably generated in the reaction process, it is possible to achieve the effect of dissolving all or part of HCL in water in the reaction solvent to be discharged.
또한, 반응 물질로 투입되는 페놀류 화합물이 반응 과정 중 타 화합물과 반응하는 것을 억제할 수 있게 되는바 페놀류 화합물의 회수 및 재사용을 용이하게 할 수 있다는 효과를 달성할 수 있다.In addition, since it is possible to suppress the reaction of the phenolic compound input as a reaction material with other compounds during the reaction process, the effect of facilitating the recovery and reuse of the phenolic compound can be achieved.
상술한 반응 물질 및 반응 용매를 반응기에 투입한 후 상압 조건 하에서 반응온도를 40~180℃로 설정한다. 바람직하게는 반응 온도는 90~110℃이다. 또한, 반응 시간은 1~10시간이다.After introducing the above-described reaction material and reaction solvent to the reactor, the reaction temperature is set to 40 ~ 180 ℃ under atmospheric conditions. Preferably the reaction temperature is 90 ~ 110 ℃. In addition, the reaction time is 1 to 10 hours.
상술한 조건 하에서 반응기 내부의 온도가 90~110℃에 도달하면 염화수소 기체가 발생한다. 염화수소 기체는 반응 용매인 물에 용해되어 외부로 배출할 수 있다.When the temperature inside the reactor reaches 90 ~ 110 ℃ under the above conditions, hydrogen chloride gas is generated. Hydrogen chloride gas may be dissolved in water as a reaction solvent and discharged to the outside.
반응이 종료되면 반응기에 유기 용매를 투입하여 유기물을 추출한다. 유기물을 추출하기 위한 유기 용매로는 메틸 셀로솔브, 에틸 셀로솔브, 톨루엔, 자일렌, 메틸 이소부틸 케톤 등이 사용될 수 있다. 바람직하게는 톨루엔이 사용된다.When the reaction is completed, an organic solvent is added to the reactor to extract organic matter. As the organic solvent for extracting the organic material, methyl cellosolve, ethyl cellosolve, toluene, xylene, methyl isobutyl ketone, and the like may be used. Preferably toluene is used.
추가적으로, 반응 용매인 물과 페놀 등을 분류관을 이용하여 증발 제거하고 여과를 통해 각종 이물질을 제거한다. 증류가 모두 완료되면 제품을 냉각하여 고체화시킨다. Additionally, water and phenol, which are reaction solvents, are evaporated and removed using a fractionation tube, and various foreign substances are removed through filtration. When the distillation is complete, the product is cooled and solidified.
상술한 공정을 통해 획득한 화학식 1로 표시되는 노볼락형 페놀 수지의 히드록실 당량(단위 g당 OH의 개수의 역수)는 200 ~ 235 g/eq이다. 바람직하게는 225~235 g/eq이다.The hydroxyl equivalent (reciprocal of the number of OH per unit g) of the novolak-type phenol resin represented by Formula 1 obtained through the above-described process is 200 to 235 g/eq. Preferably it is 225-235 g/eq.
히드록실 당량 측정 방법은 다음과 같다.The hydroxyl equivalent measurement method is as follows.
전위차 측정기 : Metrohm 社 888titrandoPotentiometer: Metrohm 888titrando
전극 : metrohm 社 6.0229.100 SolvotrodeElectrode: metrohm 6.0229.100 Solvotrode
먼저, 무수초산 7.8ml와 피리딘 35ml를 혼합하여 용액을 조제하고, 혼합용액 5ml를 시료 1g과 혼합하여 160°C에서 1시간 반응시켰다. 이후, 증류수를 1~1.5ml 추가한 후 15분이상 추가 반응시키고 냉각하였다.First, a solution was prepared by mixing 7.8 ml of acetic anhydride and 35 ml of pyridine, and 5 ml of the mixed solution was mixed with 1 g of the sample and reacted at 160 ° C for 1 hour. Then, after adding 1 to 1.5 ml of distilled water, the reaction was further carried out for 15 minutes or more, followed by cooling.
다음으로, THF와 아세톤을 투입하여 희석시키고 해당 샘플용액과 Blank를 각각 0.5N-KOH(EtOH) 용액을 이용하여 전위차 적정을 하였다.Next, THF and acetone were added to dilute, and potentiometric titration was performed for the sample solution and the blank using 0.5N-KOH (EtOH) solution, respectively.
측정된 Blank와 샘플용액의 값을 다음식에 대입하여 히드록실 당량을 산출하였다.The hydroxyl equivalent was calculated by substituting the values of the measured blank and the sample solution into the following equation.
28.05 * (B-V) * F / 시료양[g] = OH value[KOH mg/g]28.05 * (B-V) * F / sample amount [g] = OH value [KOH mg/g]
여기에서, B = Blank 용액의 측정값이고, V는 샘플 용액의 측정값이다.Here, B = the measured value of the blank solution, and V is the measured value of the sample solution.
히드록실 당량[g/eq]=26110 / OH value[KOH mg/g]Hydroxyl equivalent [g/eq]=26110 / OH value [KOH mg/g]
한편, 화학식 1로 표시되는 노볼락형 페놀 수지의 연화점은 86~92℃ 이다. On the other hand, the softening point of the novolak-type phenol resin represented by the formula (1) is 86 ~ 92 ℃.
연화점은 Metler Toledo 社의 모델명 DP70을 이용하여 측정하였다. 먼저, 측정하고자 하는 시료를 140℃ ~ 160℃로 용융시킨 후 측정장치에 구비된 컵에 가득 채운 후 표면을 평평하게 만들었다. 컵의 상부에는 덮개를 씌우고, 하부는 유리관을 꽂아 캐리어에 고정시킨 후 캐리어를 측정장치에 투입한 상태로 측정을 시작하였다.The softening point was measured using Metler Toledo's model name DP70. First, the sample to be measured was melted at 140° C. to 160° C., then filled in a cup provided in the measuring device, and then the surface was flattened. A cover was put on the upper part of the cup, and a glass tube was inserted into the lower part to be fixed to the carrier, and then the measurement was started with the carrier inserted into the measuring device.
측정장치에 시료를 투입한 후, 초기 온도를 60℃로 설정하고 10초간 유지한 상태에서 2℃/min의 속도로 가열하여 컵 내의 시료가 연화되어 흘러내려 중력에 의해 최종지점에 도달할 때의 온도를 연화점으로 결정하였다.After inserting the sample into the measuring device, the initial temperature is set at 60°C and held for 10 seconds, heated at a rate of 2°C/min. The temperature was determined as the softening point.
또한, 상술한 공정을 통해 합성한 노볼락형 페놀 수지 조성물에 포함된 화학식 2 또는 화학식 3으로 표시되는 화합물의 함량은 전체 노볼락형 페놀 수지 조성물 중량 대비 0.5 wt%미만이다. 바람직하게는 0.3 wt%미만이다. 더욱 바람직하게는 노볼락형 페놀 수지 조성물은 하기 화학식 2 또는 화학식 3으로 표시되는 화합물을 실질적으로 포함하지 않는다.In addition, the content of the compound represented by Formula 2 or Formula 3 included in the novolak-type phenolic resin composition synthesized through the above-described process is less than 0.5 wt% based on the total weight of the novolak-type phenolic resin composition. Preferably less than 0.3 wt %. More preferably, the novolak-type phenolic resin composition does not substantially include a compound represented by the following Chemical Formula 2 or Chemical Formula 3.
Figure PCTKR2021015763-appb-C000002
Figure PCTKR2021015763-appb-C000002
Figure PCTKR2021015763-appb-C000003
Figure PCTKR2021015763-appb-C000003
상기 화학식 2 및 화학식 3으로 표시되는 부산물의 함량은 GPC(Gel Permeation Chromatograph) 분석을 통해 측정하였다.The content of by-products represented by Chemical Formulas 2 and 3 was measured through Gel Permeation Chromatograph (GPC) analysis.
컬럼 : Shoedex 社 KF-801, 802, 803Column: Shoedex KF-801, 802, 803
검출기 : water 社 2414RIDetector: water company 2414RI
펌프 : water 社 1515Pump: water company 1515
오토샘플러 : water 社 2707Auto sampler: water company 2707
이동상 : THF(GPC grade) 1ml/minMobile phase: THF (GPC grade) 1ml/min
이동상 THF(GPC grade)를 1ml/min으로 설정하고, GPC를 가동 후 THF를 충분히 흘려주며 안정화시켰다. 이후, 샘플 0.05g을 THF에 용해시켜 샘플 용액을 조제하였다.The mobile phase THF (GPC grade) was set at 1 ml/min, and after operating the GPC, THF was flowed sufficiently to stabilize it. Thereafter, 0.05 g of the sample was dissolved in THF to prepare a sample solution.
Blank THF와 샘플용액을 50μl씩 주입하여 각각 분석을 진행하였다. 모든 피크에 대해 base line이 수평하도록 적분한 후 각 피크의 Valley를 기준으로 수직하게 분할한다. 측정된 샘플분석결과에서 Blank와 대조하여 공통된 피크를 배제하고 각 피크의 Area%를 기입하였다.Each 50 μl of blank THF and sample solution was injected and each analysis was performed. After integrating so that the base line is horizontal for all peaks, it is divided vertically based on the Valley of each peak. In the measured sample analysis result, a common peak was excluded by contrast with the blank, and the area% of each peak was written.
이하, 본 발명을 보다 구체적으로 설명하지만, 본 발명은 하기의 예에 한정되는 것은 아니다.Hereinafter, although this invention is demonstrated more concretely, this invention is not limited to the following example.
[실시예 1][Example 1]
4,4'-비스(클로로메틸)-1,1-바이페닐을 기준으로 페놀 2.3몰-당량을 반응기에 투입하였다. 반응 용매로는 물을 사용하였다. 물은 4,4'-비스(클로로메틸)-1,1-바이페닐을 기준 50wt% 사용하였다.Based on 4,4'-bis(chloromethyl)-1,1-biphenyl, 2.3 molar-equivalent of phenol was added to the reactor. Water was used as the reaction solvent. As water, 50 wt% of 4,4'-bis(chloromethyl)-1,1-biphenyl was used.
이후, 반응기의 온도를 80~110℃로 상승시킨 후 반응이 진행됨에 따라 발생한 염산 기체를 반응기 외부로 배출하여 물 또는 수산화나트륨 용액에 포집되도록 하였다. Then, after raising the temperature of the reactor to 80 ~ 110 ℃, the hydrochloric acid gas generated as the reaction proceeds was discharged to the outside of the reactor to be collected in water or sodium hydroxide solution.
반응을 3시간 지속한 후, 반응이 종결되면 유기 용매인 톨루엔을 투입하여 유수 층분리를 통해 산폐수를 제거하였다. 그리고, 증류를 통해 반응 용매인 물과 부산물인 염산, 추출용매인 톨루엔 및 잔여 페놀을 제거하였다. 증류가 완료되면 최종산물을 냉각시켜 화학식 1로 표시되는 화합물을 포함하는 노볼락형 페놀 수지 조성물을 수득하였다. After the reaction was continued for 3 hours, when the reaction was completed, toluene, an organic solvent, was added, and acid wastewater was removed through oil-water layer separation. Then, water as a reaction solvent, hydrochloric acid as a by-product, toluene as an extraction solvent, and residual phenol were removed through distillation. Upon completion of the distillation, the final product was cooled to obtain a novolak-type phenolic resin composition containing the compound represented by Chemical Formula 1.
상술한 과정을 통해 수득한 노볼락형 페놀 수지 조성물에 포함된 화학식 2 또는 화힉식 3으로 표시되는 화합물은 검출되지 않았다.The compound represented by Formula 2 or Formula 3 contained in the novolak-type phenol resin composition obtained through the above-described process was not detected.
또한, 화학식 1로 표시되는 노볼락형 페놀 수지의 히드록실 당량은 227g/eq, 연화점은 91.6℃로 측정되었다.In addition, the hydroxyl equivalent of the novolak-type phenol resin represented by Formula 1 was 227 g/eq, and the softening point was measured to be 91.6°C.
[실시예 2][Example 2]
4,4'-비스(클로로메틸)-1,1-바이페닐을 기준으로 페놀 2.5 몰-당량을 반응기에 투입하였다. 반응 용매로는 물을 사용하였다. 물은 4,4'-비스(클로로메틸)-1,1-바이페닐을 기준 100wt% 사용하였다.2.5 molar-equivalent of phenol based on 4,4'-bis(chloromethyl)-1,1-biphenyl was introduced into the reactor. Water was used as the reaction solvent. As for water, 100 wt% of 4,4'-bis(chloromethyl)-1,1-biphenyl was used.
이후, 반응기의 온도를 80~110℃로 상승시킨 후 반응이 진행됨에 따라 발생한 염산 기체를 반응기 외부로 배출하여 물 또는 수산화나트륨 용액에 포집되도록 하였다.Then, after raising the temperature of the reactor to 80 ~ 110 ℃, the hydrochloric acid gas generated as the reaction proceeds was discharged to the outside of the reactor to be collected in water or sodium hydroxide solution.
반응을 3시간 지속한 후, 반응이 종결되면 유기 용매인 톨루엔을 투입하여 유수 층분리를 통해 산폐수를 제거하였다. 그리고, 증류를 통해 반응 용매인 물과 부산물인 염산, 추출용매인 톨루엔 및 잔여 페놀을 제거하였다. 증류가 완료되면 최종산물을 냉각시켜 화학식 1로 표시되는 화합물을 포함하는 노볼락형 페놀 수지 조성물을 수득하였다. After the reaction was continued for 3 hours, when the reaction was completed, toluene, an organic solvent, was added, and acid wastewater was removed through oil-water layer separation. Then, water as a reaction solvent, hydrochloric acid as a by-product, toluene as an extraction solvent, and residual phenol were removed through distillation. Upon completion of the distillation, the final product was cooled to obtain a novolak-type phenolic resin composition containing the compound represented by Chemical Formula 1.
상술한 과정을 통해 수득한 노볼락형 페놀 수지 조성물에 포함된 화학식 2 또는 화학식 3으로 표시되는 화합물은 0.06wt% 임을 확인하였다.It was confirmed that the compound represented by Formula 2 or Formula 3 contained in the novolak-type phenol resin composition obtained through the above-described process was 0.06 wt%.
또한, 노볼락형 페놀 수지의 히드록실 당량은 227g/eq, 연화점은 89.1℃로 측정되었다.In addition, the hydroxyl equivalent of the novolak-type phenol resin was 227 g/eq, and the softening point was measured to be 89.1°C.
[비교예 1][Comparative Example 1]
4,4'-비스(클로로메틸)-1,1-바이페닐을 기준으로 페놀 2.1 몰-당량과 35% 농도로 희석시킨 염산을 반응기에 투입하였다. 반응 용매로는 톨루엔을 사용하였다. 물은 4,4'-비스(클로로메틸)-1,1-바이페닐을 기준 100wt% 사용하였으며, 염산은 0.8wt%를 사용하였다.Hydrochloric acid diluted to a concentration of 35% and 2.1 molar equivalents of phenol based on 4,4'-bis(chloromethyl)-1,1-biphenyl was added to the reactor. Toluene was used as the reaction solvent. 100 wt% of 4,4'-bis(chloromethyl)-1,1-biphenyl was used for water, and 0.8 wt% of hydrochloric acid was used.
이후, 반응기의 온도를 110~115℃로 상승시켜 톨루엔을 환류시키며 반응이 진행됨에 따라 발생한 염산 기체를 반응기 외부로 배출하여 물 또는 수산화나트륨 용액에 포집되도록 하였다. Thereafter, the temperature of the reactor was raised to 110-115° C. to reflux toluene, and hydrochloric acid gas generated as the reaction progressed was discharged to the outside of the reactor to be collected in water or sodium hydroxide solution.
반응을 8시간 지속한 후, 반응이 종결되면 증류를 통해 반응 용매인 톨루엔과 촉매 및 부산물인 염산 및 잔여 페놀을 제거하였다. 증류가 완료되면 최종산물을 냉각시켜 화학식 1로 표시되는 노볼락형 페놀 수지 조성물을 수득하였다.After the reaction was continued for 8 hours, when the reaction was completed, toluene, a reaction solvent, and hydrochloric acid and residual phenol as a catalyst and by-products were removed through distillation. Upon completion of the distillation, the final product was cooled to obtain a novolak-type phenolic resin composition represented by Chemical Formula 1.
상술한 과정을 통해 수득한 노볼락형 페놀 수지 조성물에 포함된 화학식 2 또는 화힉식 3 으로 표시되는 화합물은 4.55 wt% 임을 확인하였다.It was confirmed that the compound represented by Formula 2 or Formula 3 contained in the novolak-type phenol resin composition obtained through the above-described process was 4.55 wt%.
또한, 화학식 1료 표시되는 노볼락형 페놀 수지의 히드록실 당량은 244g/eq, 연화점은 85.9℃로 측정되었다. In addition, the hydroxyl equivalent of the novolak-type phenol resin represented by Chemical Formula 1 was 244 g/eq, and the softening point was measured to be 85.9°C.
이상과 같이 본 발명에 따른 바람직한 실시예를 살펴보았으며, 앞서 설명된 실시예 이외에도 본 발명이 그 취지나 범주에서 벗어남이 없이 다른 특정 형태로 구체화될 수 있다는 사실은 해당 기술에 통상의 지식을 가진 이들에게는 자명한 것이다. 그러므로, 상술된 실시예는 제한적인 것이 아니라 예시적인 것으로 여겨져야 하고, 이에 따라 본 발명은 상술한 설명에 한정되지 않고 첨부된 청구항의 범주 및 그 동등 범위 내에서 변경될 수도 있다.As described above, preferred embodiments according to the present invention have been reviewed, and the fact that the present invention can be embodied in other specific forms without departing from the spirit or scope of the present invention in addition to the above-described embodiments is one of ordinary skill in the art. It is obvious to them. Therefore, the above-described embodiments are to be regarded as illustrative rather than restrictive, and accordingly, the present invention is not limited to the above description, but may be modified within the scope of the appended claims and their equivalents.

Claims (8)

  1. 산 촉매 부재하에서의 반응으로, 4,4'-비스(클로로메틸)-1,1-바이페닐 및 페놀류 화합물의 혼합 용액을 제조 단계;preparing a mixed solution of 4,4'-bis(chloromethyl)-1,1-biphenyl and a phenol compound by reaction in the absence of an acid catalyst;
    상기 혼합 용액을 40~180℃에서 1~10시간 동안 반응시키는 단계; 및reacting the mixed solution at 40 to 180° C. for 1 to 10 hours; and
    상기 반응 용매 및 잔여 물질을 증발 제거하고 반응물을 고체화하는 단계를 포함하는 노볼락형 페놀 수지 제조방법.A method for producing a novolak-type phenolic resin comprising the steps of evaporating the reaction solvent and residual material and solidifying the reactant.
  2. 제1항에 있어서,The method of claim 1,
    반응 과정에서 생성된 염화수소 전부 또는 일부를 상기 반응 용매인 물에 용해시킨 상태로 배출하는 단계를 더 포함하는 노볼락형 페놀 수지 제조방법.The method for producing a novolak-type phenolic resin further comprising discharging all or part of the hydrogen chloride generated in the reaction process in a state of dissolving it in water, which is the reaction solvent.
  3. 제1항에 있어서,The method of claim 1,
    상기 혼합 용액을 제조하는 단계는,The step of preparing the mixed solution,
    상기 4,4'-비스(클로로메틸)-1,1-바이페닐의 중량에 대하여 10wt% 내지 500wt%의 물을 투입하는 단계를 포함하는 노볼락형 페놀 수지 제조방법.A method for producing a novolak-type phenolic resin comprising the step of adding 10 wt% to 500 wt% of water based on the weight of the 4,4'-bis(chloromethyl)-1,1-biphenyl.
  4. 제3항에 있어서,4. The method of claim 3,
    상기 4,4'-비스(클로로메틸)-1,1-바이페닐에 대하여 1.5 내지 5mol-당량의 페놀류 화합물을 투입하는 단계를 더 포함하는 노볼락형 페놀 수지 제조방법.The method for producing a novolak-type phenolic resin further comprising the step of adding 1.5 to 5 mol-equivalent of a phenol compound to the 4,4'-bis(chloromethyl)-1,1-biphenyl.
  5. 제1항 내지 제4항 중 어느 한 항에 있어서,5. The method according to any one of claims 1 to 4,
    노볼락형 페놀 수지는 하기 화학식(I) 로 표현되는 노볼락형 페놀 수지 제조방법.The novolak-type phenolic resin is a method for producing a novolak-type phenolic resin represented by the following formula (I).
    Figure PCTKR2021015763-appb-I000005
    (I)
    Figure PCTKR2021015763-appb-I000005
    (I)
  6. 히드록실 당량이 200~235g/eq이고, 연화점이 86~92℃인 하기 화학식(I)로 표현되는 화합물을 포함하는 노볼락형 페놀 수지 조성물.A novolak-type phenolic resin composition comprising a compound represented by the following formula (I) having a hydroxyl equivalent weight of 200 to 235 g/eq and a softening point of 86 to 92 °C.
    Figure PCTKR2021015763-appb-I000006
    (I)
    Figure PCTKR2021015763-appb-I000006
    (I)
  7. 하기 화학식(II)로 표시되는 화합물 또는 화학식(III)으로 표시되는 화합물의 함량이 노볼락형 페놀 수지 조성물 중량 대비 0.5wt% 미만인 노볼락형 페놀 수지 조성물.A novolak-type phenolic resin composition in which the content of the compound represented by the following formula (II) or the compound represented by the formula (III) is less than 0.5 wt% based on the weight of the novolak-type phenolic resin composition.
    Figure PCTKR2021015763-appb-I000007
    Figure PCTKR2021015763-appb-I000007
    (II)(II)
    Figure PCTKR2021015763-appb-I000008
    Figure PCTKR2021015763-appb-I000008
    (III)(III)
  8. 제7항에 있어서,8. The method of claim 7,
    상기 화학식(II)로 표시되는 화합물 또는 화학식(III)로 표시되는 화합물을 포함하지 않는 노볼락형 페놀 수지 조성물.A novolak-type phenolic resin composition that does not contain the compound represented by the formula (II) or the compound represented by the formula (III).
PCT/KR2021/015763 2020-11-06 2021-11-03 Method for preparing phenolic novolac resin WO2022098075A1 (en)

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