WO2022092221A1 - Microbubble-generating device - Google Patents

Microbubble-generating device Download PDF

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Publication number
WO2022092221A1
WO2022092221A1 PCT/JP2021/039865 JP2021039865W WO2022092221A1 WO 2022092221 A1 WO2022092221 A1 WO 2022092221A1 JP 2021039865 W JP2021039865 W JP 2021039865W WO 2022092221 A1 WO2022092221 A1 WO 2022092221A1
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WO
WIPO (PCT)
Prior art keywords
gas
liquid
baffle plate
center
unit
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Application number
PCT/JP2021/039865
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French (fr)
Japanese (ja)
Inventor
浩 神野
太郎 神野
Original Assignee
オオノ開發株式会社
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Publication of WO2022092221A1 publication Critical patent/WO2022092221A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/10Mixing by creating a vortex flow, e.g. by tangential introduction of flow components
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/20Jet mixers, i.e. mixers using high-speed fluid streams
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40Static mixers

Definitions

  • the present invention relates to an apparatus that generates fine bubbles such as micro bubbles and nano bubbles by refining the bubbles obtained by introducing a gas into a liquid.
  • Patent Document 1 describes fine bubbles as an example of such a gas-liquid generator. The generator is disclosed.
  • the fine bubble generator disclosed in Patent Document 1 includes a container including a conical or truncated cone-shaped space.
  • the liquid is swirled in the container so that the swirling radius of the liquid gradually becomes smaller, and the liquid is moved from one end side to the other end side of the container from one end side of the container toward the swirling center of the liquid.
  • the liquid (air / liquid) containing fine bubbles is discharged from the air / liquid outlet formed on the other end side of the container.
  • An object of the present invention is to obtain a fine bubble generator capable of improving the efficiency of fine bubble generation.
  • the present invention provides the following items.
  • a device that generates fine bubbles A gas-liquid generator that mixes gas with liquid to generate a swirling flow of gas and liquid, A gas / liquid discharge unit that discharges the air / liquid generated in the gas / liquid generation unit, It is provided with a bubble miniaturization section for refining the bubbles of the gas solution discharged from the gas / liquid discharge section.
  • the bubble miniaturization portion includes a baffle plate arranged so as to face the gas / liquid discharge portion via a gap, and a baffle plate support having a shaft portion that supports the baffle plate. A gap is formed between the lumen of the baffle plate and the baffle plate.
  • the baffle plate has a central through hole located at the center and one or more through holes located outside the center, and the shaft portion of the baffle support is inserted into the central through hole. Bubble generator.
  • FIG. 1 is a conceptual diagram for explaining the fine bubble generator 10 of the present invention.
  • FIG. 2A is a diagram for explaining the first type fine bubble generator 100 of the present invention.
  • FIG. 2B is a diagram for explaining the second type of fine bubble generator 200 of the present invention.
  • FIG. 3 is a plan view for explaining the baffle plate 11 used in the fine bubble generator of the present invention.
  • FIG. 4 is a diagram for explaining the fine bubble generator 1000 according to the first embodiment of the present invention.
  • FIG. 5 is a perspective view for explaining a main part of the bubble miniaturization portion 100b including the baffle plate 115 and the baffle plate support 12 in the fine bubble generator 1000 shown in FIG.
  • FIG. 6 is a diagram for explaining the components constituting the fine bubble generator 1000 shown in FIG.
  • FIG. 7 is a vertical sectional view for explaining the operation of the fine bubble generator 1000 shown in FIG.
  • the object of the fine bubble generator of the present invention is to obtain a fine bubble generator capable of improving the efficiency of fine bubble generation, and is a device for generating fine bubbles by mixing a gas with a liquid.
  • a gas-liquid generation section that generates a swirling flow
  • a gas-liquid discharge section that discharges the gas-liquid generated by the gas-liquid generation section
  • a bubble miniaturization that miniaturizes the bubbles of the gas-liquid discharged from the gas-liquid discharge section.
  • the bubble miniaturization portion includes a baffle plate arranged so as to face the gas / liquid discharge portion via a gap, and a baffle plate support having a shaft portion for supporting the baffle plate.
  • a gap is formed between the lumen of the portion and the baffle plate, and the baffle plate has a central through hole located at the center and one or more through holes located outside the center, and the baffle plate has a central through hole. Solves the above-mentioned problems by providing an apparatus in which the shaft portion of the baffle support is inserted.
  • FIG. 1 is a conceptual diagram for explaining the fine bubble generator 10 of the present invention.
  • the apparatus 10 of the present invention has at least a gas / liquid generation unit 100a that generates a swirling flow of air / liquid, a gas / liquid discharge unit 13 that discharges the generated air / liquid, and the discharged air.
  • a bubble miniaturization unit 100b for miniaturizing liquid bubbles is provided, and the bubble miniaturization unit 100b includes a baffle plate 11 arranged to face the gas-liquid discharge unit via a gap, and a shaft portion that supports the baffle plate.
  • a gap S is formed between the cavity C of the bubble miniaturization portion 100b and the baffle plate 11 including the baffle plate support 12 having 12a, and the baffle plate 11 has a central through hole 11a located at the center.
  • the other configuration is particularly limited as long as it has one or more through holes 11b located outside the center and the shaft portion 12a of the baffle support 12 is inserted into the center through hole 11a. It's not something.
  • the gas / liquid generation unit may have any form as long as it generates a swirling flow of gas / liquid which is a liquid containing bubbles.
  • it may be a device that generates a swirling flow of gas and liquid by introducing a gas into the swirling flow of liquid in a state where a swirling flow of liquid is formed (first type fine bubble generator), or a liquid.
  • first type fine bubble generator a device that generates a swirling flow of gas and liquid by introducing a gas into the swirling flow of liquid in a state where a swirling flow of liquid is formed
  • second type fine bubble generator that generates a swirling flow of gas and liquid by swirling the gas and liquid obtained by mixing gas and gas.
  • the method of generating the swirling flow may also be generated by driving a swirling fan provided inside the gas / liquid generating section, or in the tangential direction of the annular view of the cross section so that the liquid fluid spirally swirls toward the discharging section.
  • a liquid fluid may be introduced along the line.
  • the baffle plate 11 may have a central through hole 11a formed at a substantially center thereof and a through hole 11b around the center formed around the substantially center thereof.
  • the substantially center of the baffle plate 11 is the position of the center of gravity of the baffle plate 11, and when the baffle plate 11 rotates, it rotates around the position of the center of gravity.
  • the central through hole 11a may be for inserting the shaft portion 12a of the baffle plate support 12 into the central through hole 11a.
  • the central through hole 11a may be large enough to fix the position of the baffle plate 11 with respect to the shaft portion 12a, or the baffle plate 11 may move in a direction perpendicular to the central axis A of the baffle plate support 12. May be of a size that is regulated within a certain range.
  • the size of the central through hole 11a of the baffle plate 11 is larger than the outer circumference of the shaft portion 12a of the baffle plate support 12, and the baffle plate 11 is the flow rate of the gas and liquid discharged from the gas and liquid discharge portion 13. Therefore, the baffle plate support 12 may be movable in the direction of the central axis A, and may be movable within a certain range in the direction perpendicular to the direction of the central axis A of the baffle plate support 12.
  • the through hole 11b around the center is formed on one surface of the baffle plate 11 (the surface of the baffle plate 11 opposite to the gas / liquid discharge portion 13, for example, the upper surface) and the other surface (gas / liquid discharge of the baffle plate 11).
  • a pressure difference of a fluid for example, air or liquid
  • the air or liquid passes through the baffle plate 11 from one surface side to the other surface side of the baffle plate 11. It is a hole for moving to.
  • the air and liquid discharged from the gas discharge unit 13 passes outside the outer edge of the baffle plate 11.
  • a part of the fluid that has moved from the lower surface side to the upper surface side of the baffle plate 11 returns to the lower surface side of the baffle plate 11 through the through hole 11b around the center.
  • the air-liquid returned to the lower surface side of the baffle plate 11 is disturbed again by the baffle plate 11, and the air bubbles of the air-liquid are further refined.
  • those with a small bubble size in the gas and liquid that are swirling flows gather on the outer peripheral side of the lumen of the fine bubble part, but those with a large bubble size gather on the center side of the lumen, so such bubble size
  • the air and liquid in which a large one is present will return to the lower surface side of the baffle plate 11 through the through hole 11b around the center.
  • the through hole 11b around the center is provided on the center side of the lumen as much as possible in order to efficiently return the one having a large bubble size to the lower surface side.
  • the central through hole 11a has a gap between the central through hole 11a and the shaft portion 12a of the baffle plate support 12 even when the shaft portion 12a of the baffle plate support 12 is inserted into the central through hole 11a. Therefore, it is a flow path of air and liquid from the upper surface side to the lower surface side of the baffle plate 11, but since the baffle plate support 12 is inserted into the central through hole 11a, the opening of the central through hole 11a A part is closed by the shaft portion 12a of the baffle plate support 12. Therefore, the cross-sectional area of the flow path of the central through hole 11a is remarkably narrower than that of the completely open central through hole 11b, and the baffle plate 11 is made from one surface to the other for further miniaturization of gas and liquid.
  • the passage through which the gas and liquid pass toward the surface of the center is not substantially formed by the central through hole 11a but by the through hole 11b around the center.
  • the material of the baffle plate 11 can be any material.
  • it may be plastic or a metal such as aluminum, iron, or stainless steel.
  • the thickness and weight of the baffle plate 11 are not limited, and can be adjusted to any thickness and weight depending on the required discharge amount of gas-liquid GL, the size of fine bubbles, and the like.
  • the shape of the baffle plate 11 can be arbitrary.
  • the outer peripheral shape may be a substantially circular shape, a substantially triangular shape, a substantially quadrangle, or a substantially polygonal shape (pentagon or more).
  • the shape of the through hole 11b around the center of the baffle plate 11 may be arbitrary.
  • the outer peripheral shape may be a substantially circular shape, a substantially triangular shape, a substantially quadrangle, or a substantially polygonal shape (pentagon or more).
  • the arrangement of the through hole 11b around the center may be arbitrary.
  • the plurality of through holes 11b may be evenly arranged around the central through holes 11a, or may be randomly arranged.
  • the through hole 11b around the center is arranged so that the center thereof is closer to the center of the baffle plate 11 than the center between the center and the outer peripheral edge of the baffle plate 11. By doing so, it becomes easy for air and liquid having a large bubble size, which tends to be closer to the center side, to pass through.
  • the through hole 11b around the center is provided only at the center between the center and the outer peripheral edge or only on the center side from the center, but the present invention is not limited thereto.
  • a through hole 11b around the center may be provided on the outer peripheral side in the same manner.
  • the size and number of through holes 11b around the center can be arbitrary.
  • the through holes 11b have a large size and a large number. As a result, it becomes possible to increase the amount of gas and liquid passing through the through hole 11b, and it becomes possible to generate fine bubbles more efficiently.
  • the size of the baffle plate 11 can be about 10 mm to about 300 mm, preferably about 20 mm to about 200 mm. Further, for example, the size of the through hole 11b around the center may be about ⁇ 2 to 10 mm, preferably about ⁇ 3 mm to 5 mm. For example, the number of through holes 11b around the center can be about 4 to about 16, preferably about 8 to about 12. For example, the through hole 11b around the center is located on the center side of about 0.5 mm to about 3 mm, preferably about 1 mm to about 2 mm from the center between the center of the baffle plate 11 and the outer peripheral edge. However, this is just an example, and may be in a numerical range other than that. By setting the size of the baffle plate 11 to about 100 mm or more (for example, about 150 mm), it is possible to eliminate the clogging due to the water quality.
  • liquids and gases are not limited and can be arbitrary.
  • the liquid may be water or a liquid other than water (for example, alcohol, oil, liquid fuel, etc.).
  • the gas may be air or a gas other than air (for example, carbon dioxide gas, nitrogen gas, oxygen gas, hydrogen gas, helium gas, etc.).
  • the first type fine bubble generator 100 and the second type fine bubble generator 200 will be described.
  • FIG. 2A is a diagram for explaining the first type of fine bubble generator 100 of the present invention
  • FIG. 2A (a) is a diagram conceptually showing the fine bubble generator
  • b) is a perspective view schematically showing the appearance of the fine bubble generator shown in FIG. 2A (a).
  • the fine bubble generator 100 has a gas / liquid generation unit 100a, a gas / liquid discharge unit 13, a bubble miniaturization unit 100b including a baffle plate 11 and a baffle plate support 12, and a gas / liquid discharge unit 100c.
  • the baffle plate support 12 also has a function as a gas discharge nozzle for supplying gas to the gas / liquid generation unit 100a.
  • This fine bubble generating device 100 is used on land (in the air), and the bubble micronizing section 100b located between the gas / liquid generating section 100a and the gas / liquid discharging section 100c is housed in the sealed space.
  • the space between the air-liquid generation unit 100a and the air-liquid discharge unit 100c is sealed by the peripheral wall 14. This space is the lumen C of the bubble miniaturization portion 100b, and a gap S is formed between the lumen C and the baffle plate 11.
  • the gas-liquid generation unit 100a temporarily stores and swirls the liquid pumped from the liquid storage unit 4 via the pipe 2 via the pump 3, and swirls the obtained swirling flow of the liquid from the gas discharge nozzle 12.
  • the discharged gas is introduced to generate a swirling flow of gas and liquid.
  • the liquid supplied to the gas-liquid generation unit 100a may be water, and when the target gas-liquid can be generated by the pressure of tap water as the liquid pressure, as shown by the two-point chain line in FIG. 2A.
  • a water pipe 2b provided with a water tap 2b1 may be connected to the gas / liquid generation unit 100a so that water is supplied as a liquid from the water pipe 2b.
  • the gas / liquid discharge unit 13 is a portion that discharges the swirling flow of the liquid generated by the gas / liquid generation unit 100a toward the baffle plate 11, and is composed of, for example, a gas / liquid discharge nozzle 13.
  • the bubble miniaturization unit 100b includes the baffle plate 11 and the baffle plate support 12, and the baffle plate 11 approaches or separates from the gas liquid discharge unit 13 depending on the discharge amount of the swirling flow of the gas liquid. It has become like. Therefore, the bubble miniaturization unit 100b is a portion (turbulent flow) in which the swirling flow of the gas and liquid discharged from the gas and liquid discharge unit 13 of the gas and liquid generation unit 100a is disturbed by the baffle plate 11 to refine the bubbles in the gas and liquid. (Generation part).
  • the baffle plate 11 has, for example, a first through hole (center through hole) 11a formed in the center thereof and a pair of second through holes (through hole around the center) 11b formed around the center.
  • the baffle plate support 12 has a shaft portion 12a at its tip inserted into the central through hole 11a of the baffle plate 11, so that the center of the baffle plate 11 is at least a predetermined distance from the central axis A of the baffle plate support 12.
  • the baffle plate 11 is supported so as not to separate. In this case, the baffle plate 11 can move in the direction of the central axis A of the baffle plate support 12 depending on the flow rate of the air and liquid discharged from the air and liquid discharge unit 13.
  • the through hole 11b around the center of the baffle plate 11 is discharged from the gas / liquid discharge portion 13 and extends beyond the peripheral edge of the baffle plate 11 (that is, the gap S between the lumen C of the bubble miniaturization portion 100b and the baffle plate 11).
  • a part of the swirling flow of the gas-liquid GL toward the gas-liquid discharge unit 100c is returned to the gas-liquid discharge unit 13 side to form a reflux path.
  • the device of the present invention is useful in that the presence of a through hole around the center of the baffle plate enables more efficient miniaturization of bubbles.
  • the gas / liquid discharge unit 100c is a columnar member such as a columnar member that supports the gas / liquid discharge nozzle 12, and inside the air / liquid discharge unit 100b, the air / liquid whose bubbles have been miniaturized by the bubble miniaturization unit 100b is discharged to the outside of the apparatus.
  • a gas-liquid discharge path 101c is formed for this purpose.
  • a gas introduction port 102c is formed on the peripheral wall surface of the gas-liquid discharge section 100c, and the gas introduction port 102c discharges gas and liquid through the gas introduction path 103c formed inside the gas-liquid discharge section 100c. It is connected to the tip opening 12a (see FIG. 5B) of the nozzle 12.
  • the gas / liquid discharge unit 100c may be a portion that discharges the gas / liquid that has passed through the bubble miniaturization unit 100b to the outside of the apparatus, and the specific configuration is not particularly limited. Therefore, the gas / liquid discharge unit 100c is not limited to the one made of a columnar member, but may be made of a prismatic member.
  • the gas liquid discharge unit 100c and the peripheral wall 14 are unnecessary, and the fine bubble generator 100 replaces the gas liquid discharge unit 100c composed of a columnar member. It suffices if a support member such as an arm for supporting the gas discharge nozzle 12 is provided. In this case, the gap S between the lumen C of the bubble miniaturization portion 100b and the baffle plate 11 is formed by the liquid pre-existing around the baffle plate 11 so as to surround the region outside the outer edge of the baffle plate 11. The Rukoto.
  • FIG. 2B is a diagram for explaining the second type of fine bubble generator 200 of the present invention
  • FIG. 2B (a) is a diagram conceptually showing this fine bubble generator
  • FIG. 2B (? b) is a perspective view schematically showing the appearance of the fine bubble generator shown in FIG. 2B (a).
  • This second type of fine bubble generator 200 produces the liquid L in that the bubbles are miniaturized by swirling the gas and liquid obtained by mixing the gas G with the liquid L to generate fine bubbles. It is different from the first type fine bubble generator 100 (see FIG. 2A) in which a gas is introduced into the swirling flow of the liquid L in a swirling state to generate fine bubbles.
  • the second type of fine bubble generator 200 like the first type of fine bubble generator 100, has a gas / liquid generation unit 200a, a gas / liquid discharge unit 13, a baffle plate 11 and a baffle plate support.
  • the bubble micronization unit 200b including the body 22 and the gas / liquid discharge unit 200c are provided, but the gas / liquid generation unit 200a, the bubble micronization unit 200b, and the gas / liquid discharge unit 200c are each of the first type of fineness. Part of the configuration is different from the corresponding air-liquid generation unit 100a, bubble micronization unit 100b, and air-liquid discharge unit 100c in the bubble generator 100.
  • the gas-liquid generation unit 200a has a pipe 2a having a structure different from that of the pipe 2 of the fine bubble generator 100, and this pipe 2a is a liquid L flowing through the main pipe 2a1.
  • the structure is such that the gas G sucked from the branch pipe 2a2 is mixed into the pipe.
  • the gas / liquid generation unit 200a has a fluid swirling unit 201a instead of the gas / liquid generation unit 100a of the fine bubble generator 100, but the fluid swirling unit 201a and the gas / liquid generation unit 100a are introduced in the fluid swirling unit 201a.
  • the fluid to be introduced is a gas-liquid GL
  • the gas-liquid generation unit 100a is different only in that the fluid to be introduced is a liquid L
  • the fluid swirling unit 201a has the same structure as the gas-liquid generation unit 100a. ..
  • the bubble micronization unit 200b of the fine bubble generator 200 has a function as a gas discharge nozzle instead of the baffle plate regulator 12 having a function as a gas discharge nozzle in the bubble miniaturization unit 100b of the fine bubble generator 100. It differs from the bubble miniaturization portion 100b of the fine bubble generator 100 only in that it does not have the baffle plate support 22 and merely has the baffle plate support 22 that regulates the moving range of the baffle plate 11.
  • the gas / liquid discharge unit 200c is not provided with the gas introduction port 102c and the gas introduction path 103c in the gas / liquid discharge unit 100c of the fine bubble generator 100, and only at this point, the gas / liquid discharge unit 200c generates fine bubbles. It is different from the gas / liquid discharge unit 100c of the device 100. Therefore, the gas-liquid discharge unit 200c is formed with a gas-liquid discharge path 201c for discharging the gas-liquid whose bubbles are refined by the bubble miniaturization unit 200b to the outside of the device, similarly to the gas-liquid discharge unit 100c. There is.
  • the liquid L is sucked up from the liquid storage unit 4 by the main pipe 2a1, the gas G is sucked from the branch pipe 2a2, and the main pipe 2a1 and the branch pipe 2a2 are sucked.
  • the liquid L and the gas G are mixed at the joint with the liquid L to generate gas and liquid.
  • the baffle plate 11 has a first through hole 11a formed in the center thereof and a pair of second through holes 11a formed on both sides of the first through hole 11a so as to sandwich the first through hole 11a, as in the case of the fine bubble generator 100. Since it has a through hole 11b, even in this fine bubble generator 200, it is discharged from the gas / liquid discharge section 13 and extends beyond the peripheral edge of the baffle plate 11 (that is, the lumen C of the bubble miniaturization section 100b and the baffle plate 11). A part of the swirling flow of the gas-liquid GL toward the gas-liquid discharge unit 200c (flowing through the gap S) returns to the gas-liquid discharge unit 13 side through the second through hole 11b.
  • FIG. 3 is a plan view for explaining the baffle plate 11 used in the fine bubble generator of the present invention
  • FIG. 3A shows the baffle plate 11 described with reference to FIG. 2A or FIG. 2B.
  • (B) to FIG. 3 (f) show a baffle plate having a shape different from that of the baffle plate 11 shown in FIG. 2A or FIG. 2B.
  • the first through hole (center through hole) 11a into which the shaft portion (tip portion) 12a or 22a of the baffle plate regulator 12 or 22 is inserted is the baffle plate 11.
  • the second through hole (through hole around the center) 11b, which is located at the center and forms the reflux path of the gas-liquid GL, is on the circumference C centered on the center of the baffle plate 111, and is on the circumference C of the baffle plate 111. It may be arranged on both sides of the straight line passing through the center of the above so as to be symmetrical with the first through hole 11a interposed therebetween.
  • both the first through hole 11a and the second through hole 11b have a circular shape.
  • the center of the second through hole 11b is arranged on the center side of the baffle plate 11 with respect to the center between the outer peripheral edge and the center of the baffle plate 11.
  • the number, arrangement, size, and shape of the second through holes formed in the baffle plate 11 are not limited and may be arbitrary.
  • the number of through holes around the center may be one, eight as shown in FIG. 3 (b), or other odd and even numbers.
  • the intervals of the plurality of through holes may be different from each other.
  • the through holes around the center may be arranged at different distances from the center of the baffle plate 112.
  • the shape of the baffle plate is not limited to the circle shown in FIGS. 3 (a) to 3 (d), and may be a quadrangle or the like as shown in FIG. 3 (e).
  • the shape of the through hole around the center is not limited to the circle shown in FIGS. 3 (a) to 3 (e), and may be a quadrangle or the like as shown in FIG. 3 (f).
  • the gas and liquid generation unit 100a is a liquid from a water pipe.
  • the baffle plate 115 shown in FIG. 3 (b) is mentioned. This made it possible to efficiently generate finely divided gas and liquid only by the pressure of tap water without using other pressurizing devices, as shown by the experimental results described later.
  • the pressure of the water supply is about 0.15 MPa to about 0.74 MPa, preferably the water pressure is about 0.2 MPa to about 0.39 MPa, but the water pressure at the faucet is about from the above value.
  • the water pressure can be reduced by about 0.1 MPa (about 0.1 MPa to about 0.29 MPa).
  • FIG. 4A and 4B are views for explaining the fine bubble generator 1000 according to the first embodiment of the present invention, and FIG. 4A is a side view showing the appearance of the fine bubble generator and FIG. 4B. ) Is a vertical sectional view of the fine bubble generator shown in FIG. 4 (a).
  • the fine bubble generator 1000 of the first embodiment mixes a gas G (for example, air) with the introduced liquid L (for example, water) to generate a liquid (gas and liquid) containing bubbles, and the generated air. It is a fine bubble generator that creates fine bubbles by refining the bubbles of the liquid.
  • the liquid is, for example, water and the gas is, for example, air, but the present invention is not limited thereto, and liquids and gases can be arbitrary.
  • the liquid may be alcohol and the gas may be carbon dioxide.
  • the fine bubble generator 1000 has a gas-liquid generation unit 100a that mixes the liquid L and the gas G to generate a swirling flow of the gas-liquid GL, and a gas-liquid discharge unit that discharges the swirling flow of the generated gas-liquid GL. 13, a bubble miniaturization unit (turbulent flow generation unit) 100b that miniaturizes bubbles contained in the gas-liquid GL by disturbing the swirling flow of the discharged gas-liquid GL, and a gas that discharges the gas-liquid GL to the outside of the device. It is provided with a liquid discharge unit 100c.
  • the gas / liquid generation unit 100a is provided on the gantry 100d
  • the bubble miniaturization unit 100b is provided on the gas / liquid generation unit 100a via the gas / liquid discharge unit 13
  • the bubble miniaturization unit 100b is provided.
  • a peripheral wall 14 forming the cavity C of the bubble miniaturization unit 100b is provided between the bubble miniaturization unit 100b and the gas / liquid generation unit 100a, and the air bubble miniaturization unit 100b has a bubble miniaturization unit 100b.
  • the baffle plate 11 constituting the portion 100b and the gas / liquid discharge nozzle as the gas / liquid discharge portion 13 are arranged, and a gap S is formed between the cavity C of the bubble miniaturization portion 100b and the baffle plate 11. There is.
  • the gantry 100d has a support flange 101 that supports the gas-liquid generation portion 100a, and a gantry leg portion 21 that extends downward from the support flange 101.
  • a liquid introduction joint 10a is attached to the support flange 101, a water pipe 2b provided with a water tap 2b1 is connected to the liquid introduction joint 10a, and liquid water is supplied to the gas / liquid generation unit 100a from the water pipe. It has become so.
  • a pipe 2 (see FIG. 2A) to which the pump 3 is attached is connected to the liquid introduction joint 10a, and the liquid is sucked up from the liquid storage unit 4 by the pump 3 to the gas-liquid generation unit 100a and pumped to the gas-liquid generation unit 100a. You may try to do it.
  • the support flange 101 is formed with an insertion hole 101a for inserting the gantry leg portion 21 (see FIG. 6).
  • the bubble miniaturization unit 100b including the baffle plate 115, which is a characteristic portion of the fine bubble generator 1000, will be specifically described.
  • FIG. 5A and 5B are perspective views for explaining the bubble miniaturization section 100b including the baffle plate 115 in the fine bubble generator 1000 shown in FIG. 4, and FIG. 5A shows the appearance of the bubble miniaturization section 100b. , FIG. 5B shows the bubble miniaturization portion 100b decomposed into a plurality of parts.
  • the bubble miniaturization unit 100b is provided so as to be movable so as to be close to or away from the discharge port 13b of the gas / liquid discharge nozzle 13 depending on the discharge amount of the swirling flow of the gas / liquid GL discharged from the gas / liquid discharge nozzle 13. It has a baffle plate 115 and a baffle plate support 12 that supports the baffle plate 115 so that the baffle plate 115 does not move beyond a certain range.
  • the gas / liquid discharge nozzle 13 is a gas / liquid discharge unit that discharges a swirling flow of the gas / liquid GL generated by the gas / liquid generation unit 100a.
  • the lumen C of the bubble miniaturization section 100b is formed by the peripheral wall 14 that seals the space between the gas solution generation section 100a and the gas solution discharge section 100c, and the lumen C and the baffle plate are formed.
  • a gap S is formed between the 11th and the 11th.
  • the baffle plate 115 has a disk shape, and has a first through hole (center through hole) 115a formed in the center thereof and eight second through holes (through holes around the center) formed around the center. ) 115b.
  • the first through hole 115a is a through hole into which the tip end portion (that is, the shaft portion of the baffle plate support) 12a of the gas discharge nozzle constituting the baffle plate support 12 is inserted (see FIGS. 1 and 5). ..
  • the tip portion 12a of the gas discharge nozzle constituting the baffle plate support 12 is the baffle plate 115.
  • the movement range of the baffle plate 115 is restricted so that the center of the baffle plate 115 is not separated from the central axis A (see FIG. 1) of the baffle plate support 12 by a predetermined distance or more. ..
  • the baffle plate 115 can move in the direction of the central axis A of the gas discharge nozzle 12 depending on the flow rate of the gas and liquid discharged from the gas and liquid discharge unit 13.
  • the eight second through holes 115b located around the center of the baffle plate 115 are through holes located at the apex of the regular octagon, and these through holes around the center 115b are the tips of the gas / liquid discharge nozzle 13. Is discharged from the air-liquid discharge port 13b of the above, beyond the peripheral edge of the baffle plate 115 (that is, flows through the gap S between the cavity C of the bubble micronizing unit 100b and the baffle plate 11) and into the air-liquid discharge unit 100c. It is a through hole forming a return path for returning a part of the swirling flow of the gas-liquid GL to the gas-liquid discharge nozzle 13 side.
  • a part of the swirling flow of the gas-liquid GL returns to the discharge port 13b side of the gas-liquid discharge nozzle 13 through the through hole 115b around the center, so that the reciprocating motion of the baffle plate 11 moves toward and away from the gas-liquid discharge nozzle 13. Part of the reciprocating flow is disturbed again and the bubbles inside are further refined.
  • the material of the baffle plate 115 can be any material.
  • it may be plastic or a metal such as aluminum, iron, or stainless steel.
  • the thickness and weight of the baffle plate 115 can be adjusted to any thickness and weight depending on the required discharge amount of gas and liquid GL, the size of fine bubbles, and the like. Generally, if the weight of the baffle plate 115 is reduced by reducing the thickness or using a light material, the reciprocating motion of the baffle plate 115 becomes faster, so that the bubbles contained in the gas-liquid GL are made finer. And the ability to mix can be increased.
  • the thickness of the baffle plate 115 is about 5 mm and the weight is about 5 mm under the condition that the discharge amount of the gas / liquid GL from the gas / liquid discharge nozzle 13 is about 300 L / min. Although it is set to 400 g, the present invention is not limited to this.
  • the fine bubble generating device 1000 of the first embodiment is installed on land, and the bubble micronizing section (turbulent flow generating section) 100b located between the gas / liquid generating section 100a and the gas / liquid discharging section 100c is provided.
  • the space between the air-liquid generation unit 100a and the air-liquid discharge unit 100c is sealed by a peripheral wall 14 (see FIG. 4) so as to be accommodated in the sealed space.
  • the peripheral wall 14 forms a gap S through which air and liquid flow between the lumen C of the bubble miniaturization portion 100b and the baffle plate 115.
  • the gas liquid discharge unit 100c and the peripheral wall 14 are unnecessary, and the fine bubble generator 1000 uses a gas discharge nozzle (instead of the gas liquid discharge unit 100c and the peripheral wall 14). It may have a support frame such as a rod or an arm that supports the baffle plate regulator) 12.
  • the region through which the gas and liquid flow which corresponds to the gap S between the lumen C of the bubble miniaturization portion 100b and the baffle plate 11, is around the baffle plate 115 so as to surround the region outside the outer edge of the baffle plate 115. It will be formed by the liquid pre-existing in the lumen and the baffle plate 11.
  • FIG. 6 is a diagram for explaining the parts constituting the fine bubble generator 1000 shown in FIG. 4, and is a vertical cross-sectional view showing the fine bubble generator shown in FIG. 4 (b) disassembled into a plurality of parts. be.
  • the gas / liquid generation unit 100a includes a swirling flow generating unit 110 that generates a swirling flow of the liquid L by swirling the liquid (water) L introduced from the water distribution 2b via the liquid introduction joint 10a, and the generated liquid. It has a swirling flow development unit 120 that increases the swirling speed of the swirling flow of L, and a swirling flow accelerating unit 130 that accelerates the swirling speed of the swirling flow of the liquid L.
  • the swirling flow generating unit 110 has a swirling guide blade 110a that applies a swirling force to the liquid L, and a blade support 110b that supports the swirling guide blade 110a.
  • the swirl flow generating portion 110 is arranged on the support flange 101 (see FIG. 4).
  • the swirling flow development portion 120 includes an outer cylinder 122 through which the liquid L flows, an upstream flange 102 fixed to the upstream end of the outer cylinder 122, and a downstream fixed to the downstream end of the outer cylinder 122. It has a side flange 103 and an inner cylinder 121 housed inside the outer cylinder 122.
  • an opening 102a as a liquid passage is formed in the center of the upstream flange 102, and an insertion hole 102b for inserting the gantry leg 21 is formed in the peripheral edge of the upstream flange 102.
  • An opening 103a as a liquid passage is also formed in the center of the downstream flange 103, and an insertion hole 103b for inserting the fixed support 22 is formed at the peripheral edge of the downstream flange 103.
  • the downstream end of the inner cylinder 121 is fixed to the downstream flange 103, and the blade support 110b of the swirling flow generating portion 110 is fixed to the upstream end of the inner cylinder 121.
  • the inner cylinder 121 and the outer cylinder 122 are arranged at a predetermined interval so as to form a flow path between them so that a flow path through which the swirling flow of the liquid L generated by the swirling flow generating portion 110 flows can be formed.
  • On the side wall of the inner cylinder 121 a side wall opening 121a for allowing the liquid L flowing between the inner cylinder 121 and the outer cylinder 122 to flow into the inside of the inner cylinder 121 is formed.
  • a guide member such as a fin is attached to the side wall opening 121a so that the swirling direction of the swirling flow of the liquid L flowing into the inside of the inner cylindrical body 121 is reversed.
  • the liquid L flowing between the inner cylindrical body 121 and the outer cylindrical body 122 flows into the inner cylindrical body 121, so that the swirling radius becomes smaller and the swirling speed increases.
  • the swirling flow is disturbed by reversing the swirling direction.
  • the gas G is introduced into the inner cylinder 121 from the gas discharge nozzle 12, the increase in the swirling speed of the liquid L and the disturbance of the swirling flow in the inner cylinder 121 cause the liquid L and the gas G to be disturbed. It will promote mixing.
  • the upstream flange 102 is fixed to the male screw portion of the upper end portion of the gantry leg portion 21 together with the support flange 101 by a pair of nuts 21a and 21b.
  • the swirl flow acceleration unit 130 is a portion that accelerates the velocity of the gas / liquid GL from the swirl flow development unit 120, and is composed of a portion of the gas / liquid discharge nozzle 13 including a truncated cone-shaped space 13a. There is. In the swirling flow accelerating unit 130, the swirling flow of the gas and liquid GL from the swirling flow developing unit 120 heads toward the gas and liquid discharge port 13b while gradually reducing the swirling radius in the truncated cone-shaped space 13a.
  • the gas / liquid discharge nozzle 13 is held by the component holding flange 104, and the component holding flange 104 is attached to the downstream flange 103 by the fixed strut 22 and the nut 22b screwed into the male screw portion at the lower end of the fixed strut. It is fixed.
  • the downstream flange 103 and the component holding flange 104 are formed with insertion holes 103b and 104b for inserting the fixed columns 22, respectively, and the downstream flange 103 is formed with an opening 103a as a passage for gas and liquid GL.
  • the component holding flange 104 is formed with an opening 104a for accommodating the gas / liquid discharge nozzle 13.
  • the constituent materials of parts such as the gas / liquid discharge nozzle 13, the cylindrical bodies 121, 122, the flanges 101 to 104, and the fixed support column 22 constituting the gas / liquid generation unit 100a are not limited, and the constituent materials are not limited to iron, stainless steel, and the like. It may be a metal or a resin such as acrylic or vinyl chloride.
  • the bubble miniaturization unit 100b is provided so as to be movable toward and away from the discharge port 13b of the gas / liquid discharge nozzle 13 and the discharge amount of the swirling flow of the gas / liquid GL from the discharge port 13b.
  • the plate 115, the baffle plate support 12 that supports the baffle plate 115 so that the baffle plate 115 does not move beyond a certain range, and the discharge port 13b of the baffle plate 115 and the gas / liquid discharge nozzle 13 are arranged in a sealed area. As such, it has a cylindrical member 14 provided between the component holding flange 104 and the component mounting flange 105.
  • the cylindrical member 14 is a peripheral wall forming a closed space (inner cavity C of the bubble miniaturization portion 100b) in which the baffle plate 115 is arranged between the gas / liquid generation portion 100a and the gas / liquid discharge portion 100c. ..
  • the tip end portion (shaft portion 12a of the baffle plate support 12) of the gas discharge nozzle 12 is inserted into the first through hole (center through hole 11a) 115a of the baffle plate 115.
  • the baffle plate 115 is not displaced from the position above the discharge port 13b of the gas / liquid discharge nozzle 13, that is, the center of the baffle plate 115 is not separated from the central axis A (see FIG. 1) of the gas discharge nozzle 12 by a predetermined distance or more. As such, the movement of the baffle plate 115 is restricted.
  • the cylindrical member (peripheral wall) 14 has a nut that is screwed into the fixing column 22 and the threaded portion at the tip thereof so that one end thereof is in close contact with the component holding flange 104 and the other end is in close contact with the component mounting flange 105. It is fixed between these two flanges by 22a.
  • the swirling flow of the gas-liquid GL discharged from the gas-liquid discharge nozzle 13 of the gas-liquid generation unit 100a is disturbed by the reciprocating motion of the baffle plate 115, so that the bubbles contained in the gas-liquid GL are fine. Will be made. Further, it is discharged from the gas / liquid discharge port 13b at the tip of the air / liquid discharge nozzle 13 and exceeds the peripheral edge of the baffle plate 115 (that is, flows through the gap S between the lumen C of the bubble miniaturization portion 100b and the baffle plate 115).
  • a part of the swirling flow of the gas-liquid GL toward the gas-liquid discharge portion 100c returns to the gas-liquid discharge port 13b side again through the second through hole (through hole 11b around the center) 115b of the baffle plate 115. It will be disturbed by the baffle plate 115. As a result, in the bubble miniaturization section 100b, the bubbles contained in the gas-liquid GL generated by the gas-liquid generation section 100a are effectively miniaturized.
  • the constituent materials of parts such as the baffle plate 115, the gas discharge nozzle 12, the cylindrical member 14, and the flange 105 constituting the bubble micronizing portion 100b are not limited, and may be a metal such as iron or stainless steel. , Acrylic, vinyl chloride and other resins may be used.
  • the gas / liquid discharge unit 100c is attached with a gas / liquid discharge head 150 for discharging the gas / liquid GL containing the fine bubbles refined by the bubble micronization unit 100b to the outside of the fine bubble generator 1000, and a gas / liquid discharge head 150. It has a component mounting flange 105.
  • the component mounting flange 105 is formed with an insertion hole 105b for inserting the fixed support column 22, and the component mounting flange 105 is attached to the fixed column 22 fixed to the component fixing flange 103 by a nut 22a.
  • a screw hole 105a is formed in the central portion of the component mounting flange 105, a male screw portion 150a is formed at one end of the gas / liquid discharge head 150, and the gas / liquid discharge head 150 is a gas / liquid discharge head.
  • the male screw portion 150a at one end of the 150 is fixed to the component mounting flange 105 by screwing into the screw hole 105a at the center of the component mounting flange 105.
  • the gas-liquid discharge head 150 is made of a cylinder made of metal such as iron or stainless steel or resin such as acrylic or vinyl chloride.
  • a gas-liquid discharge path 101c is formed inside the cylinder along the axial direction of the cylinder, and the gas-liquid GL discharged from the gas-liquid discharge nozzle 13 of the gas-liquid generation unit 100a is the gas-liquid discharge head 150. It is designed to be discharged to the outside through the gas / liquid discharge path 101c.
  • a gas introduction port 102c is formed on the outer peripheral surface of the columnar body constituting the gas-liquid discharge head 150, and a gas discharge nozzle 12 for discharging gas G is attached to the end surface of the columnar body on the baffle plate 115 side.
  • the opening (tip opening) 12a at the tip of the gas discharge nozzle 12 is connected to the gas introduction port 102c via the gas introduction path 103c, as shown in FIG. 5 (b).
  • the gas G pumped to the gas introduction port 102c by a pump or the like is sent to the tip opening 102a of the gas discharge nozzle 12 via the gas introduction path 103c of the gas / liquid discharge head 150 (FIG. (Refer to 5 (b)), the gas is discharged from the swirling flow accelerating section 130 of the gas-liquid generating section 100a and introduced into the region straddling the swirling flow developing section 120, and is mixed into the swirling flow of the liquid L.
  • FIG. 7 is a vertical cross-sectional view for explaining the operation of the fine bubble generator 1000 shown in FIG. 4, and shows the flow of gas-liquid GL in the vicinity of the baffle plate 115 in the bubble miniaturization section 100b.
  • the liquid (tap water) L pumped from the water pipe 2b is supplied to the swirling flow generation unit 110 of the gas / liquid generation unit 100a, the liquid is liquid.
  • a swirling force is applied to L by the swirling guide blade 110a to generate a swirling flow of the liquid L, and the swirling flow of the liquid L is introduced into the swirling flow development unit 120.
  • the liquid L flowing between the inner cylindrical body 121 and the outer cylindrical body 122 flows into the inner cylindrical body 121, so that the swirling radius becomes smaller and swirls. As the speed increases, the swirling direction is reversed and the swirling flow is disturbed.
  • the gas G introduced from the gas introduction port 102c reaches the gas discharge nozzle 12 through the gas introduction path 103c, and the gas / liquid discharge nozzle 13 is reached from the tip opening 12a of the gas discharge nozzle 12. Is discharged toward the discharge port 13a.
  • the gas G is introduced into the region extending from the swirling flow acceleration unit 130 of the gas-liquid generation unit 100a to the region straddling the swirling flow development unit 120, and in the gas-liquid generation unit 100a, the gas G is mixed with the swirling liquid L and swirls. Gas-liquid GL is produced.
  • the swirling flow of the gas / liquid GL reaches the gas / liquid discharge port 13b while gradually reducing the swirling radius in the truncated cone-shaped space 13a of the gas / liquid discharge nozzle 13. Therefore, the swirling flow of the gas-liquid GL is discharged from the gas-liquid discharge port 13b toward the baffle plate 115.
  • the baffle plate 115 repeats a reciprocating motion of approaching and moving away from the gas / liquid discharge port 13b according to the discharge amount of the swirling flow of the gas / liquid GL. As a result, the peak of the discharge amount of the swirling flow of the gas-liquid GL discharged from the gas-liquid discharge port 13b is repeated, and the gas-liquid GL is agitated by the reciprocating motion of the baffle plate 115. Bubbles contained in the gas-liquid GL are made finer.
  • the gas / liquid discharge portion is discharged from the gas / liquid discharge port 13b and exceeds the peripheral edge of the baffle plate 115 (that is, flows through the gap S between the lumen C of the bubble miniaturization portion 100b and the baffle plate 115).
  • a part of the swirling flow of the gas-liquid GL toward 100c, GL2 passes through the through hole 11b around the center of the baffle plate 115 and returns to the gas-liquid discharge nozzle 13 side.
  • a part of the swirling flow of the gas-liquid GL, GL2 is disturbed again by the reciprocating motion of the baffle plate 11 that moves toward and away from the gas-liquid discharge nozzle 13, and the bubbles inside are further refined.
  • the other part of the swirling flow of the gas-liquid GL which is discharged from the gas-liquid discharge port 13b and goes over the peripheral edge of the baffle plate 115 toward the gas-liquid discharge unit 100c, is connected to the gas-liquid discharge path 101c of the gas-liquid discharge head 150. come in.
  • the gas-liquid GL containing the bubbles refined by the bubble micronizing unit 100b in this way is discharged to the outside of the fine bubble generator 1000 through the gas-liquid discharge path 101c of the gas-liquid discharge head 150.
  • the gas-liquid generation unit 100a and the gas-liquid generation unit 100a that mix the gas G with the liquid L to generate a swirling flow of the gas-liquid GL since the gas / liquid discharge unit 13 for discharging the generated air / liquid and the baffle plate 115 facing the gas / liquid discharge unit 13 via a gap are provided, the gas / liquid GL discharged from the gas / liquid discharge unit 13 is provided.
  • the baffle plate 115 moves closer to or separates from the gas / liquid discharge portion 13 depending on the discharge amount of the swirling flow of the gas / liquid GL, and the peak of the discharge amount of the swirling flow of the gas / liquid GL is repeated. As a result, the discharge amount of the gas and liquid containing the fine bubbles can be increased, and as a result, the efficiency of generating the fine bubbles can be improved.
  • the baffle plate 115 has a structure having eight through holes 115b formed around the center, the baffle plate 115 is discharged from the gas / liquid discharge port 13b and exceeds the peripheral edge of the baffle plate 115 (that is, the bubble miniaturization portion). A part of the swirling flow of the gas-liquid GL toward the gas-liquid discharge portion 100c (flowing through the gap S between the lumen C of the 100b and the baffle plate 115) is discharged through the through hole 11b around the center of the baffle plate 115. It will return to the nozzle 13 side.
  • the size of fine bubbles, the number of fine bubbles per unit volume, and the amount of gas and liquid discharged per unit time are determined by a device having a through hole around the center of the baffle plate of the embodiment of the present invention.
  • the case and the case where the gas and liquid are generated by a device having no through hole around the center in the baffle plate of the conventional comparative example will be described in comparison.
  • Example 1 A device for generating fine bubbles of the present invention equipped with a baffle plate having an outer circumference of ⁇ 20 mm, a through hole size of about 3 mm around the center, and eight through holes around the center, and a water supply with a pressure of about 0.5 MPa. By supplying water, gas and liquid containing fine bubbles were generated.
  • Comparative Example 1 By supplying tap water having a pressure of about 0.5 MPa to a device that generates fine bubbles having the same configuration as that of the first embodiment except that the baffle plate does not have a through hole around the center, the fine bubbles are contained. Gas and liquid were generated. As a result, although some fine bubbles were generated, the gas and liquid were not turbid and were transparent.
  • the present invention is useful in the field of a device for generating fine bubbles as a device capable of obtaining a fine bubble generating device capable of improving the efficiency of generating fine bubbles.

Abstract

The present invention addresses the problem of obtaining a microbubble-generating device that is capable of enhancing the microbubble generating efficiency. A microbubble-generating device 100 according to the present invention is a device that generates microbubbles, the microbubble-generating device being characterized in that: the device includes a gas-liquid generating unit 100a that generates a swirling flow of a gas-liquid GL by mixing a liquid L and a gas G, a gas-liquid discharging unit 13 that discharges the gas-liquid GL generated by the gas-liquid generating unit 100a, and a bubble atomizing unit 100b that atomizes bubbles in the gas-liquid discharged from the gas-liquid discharging unit 13; the bubble atomizing unit 100b includes a baffle plate 11 disposed so as to face the gas-liquid discharging unit 13 with a gap therebetween and a baffle-plate supporting body 12 having a shaft section that supports the baffle plate 11; a gap S is formed between an inner cavity C of the bubble atomizing unit 100b and the baffle plate 11; the baffle plate 11 has a center through-hole 11a that is positioned at a center thereof and at least one through-hole 11b positioned at positions other than the center; and the shaft section 12a of the baffle supporting body 12 is inserted into the center through-hole 11a.

Description

微細気泡発生装置Fine bubble generator
 本発明は、液体中に気体を導入して得られた気泡を微細化してマイクロバブル、ナノバブルなどの微細気泡を発生させる微細気泡を発生する装置に関するものである。 The present invention relates to an apparatus that generates fine bubbles such as micro bubbles and nano bubbles by refining the bubbles obtained by introducing a gas into a liquid.
 従来から液体と気体とを混合して気泡を含む液体(気液)を発生する気液発生装置が知られており、例えば、特許文献1にはこのような気液発生装置の一例として微細気泡発生装置が開示されている。 Conventionally, a gas-liquid generator that mixes a liquid and a gas to generate a liquid (gas-liquid) containing bubbles has been known. For example, Patent Document 1 describes fine bubbles as an example of such a gas-liquid generator. The generator is disclosed.
 特許文献1に開示の微細気泡発生装置は、円錐形状あるいは円錐台形状のスペースを含む容器を備えている。この微細気泡発生装置では、液体の旋回半径が徐々に小さくなるように液体を容器内で旋回させながら容器の一端側から他端側に移動させつつ、容器の一端側から液体の旋回中心に向けて空気を導入することにより、容器の他端側に形成されている気液出口から微細気泡を含む液体(気液)が排出される。 The fine bubble generator disclosed in Patent Document 1 includes a container including a conical or truncated cone-shaped space. In this fine bubble generator, the liquid is swirled in the container so that the swirling radius of the liquid gradually becomes smaller, and the liquid is moved from one end side to the other end side of the container from one end side of the container toward the swirling center of the liquid. By introducing air, the liquid (air / liquid) containing fine bubbles is discharged from the air / liquid outlet formed on the other end side of the container.
特許第4725707号公報Japanese Patent No. 4725707
 ところが、特許文献1に開示の微細気泡発生装置では、微細気泡の発生量がピーク状態になると、気液出口の近傍部分で容器内の液圧が容器外部の液圧より低くなって液体が逆流する。その結果、微細気泡の発生をピーク状態に持続させることができず、微細気泡の発生量がピーク状態よりも少ない状態で定常状態に落ち着くこととなり、微細気泡の発生を効果的に行うことができないという問題があった。 However, in the fine bubble generator disclosed in Patent Document 1, when the amount of fine bubbles generated reaches a peak state, the liquid pressure inside the container becomes lower than the liquid pressure outside the container in the vicinity of the gas / liquid outlet, and the liquid flows back. do. As a result, the generation of fine bubbles cannot be sustained in the peak state, and the amount of fine bubbles generated is settled in the steady state in a state smaller than the peak state, and the generation of fine bubbles cannot be effectively performed. There was a problem.
 本発明は、微細気泡の発生効率を向上することができる微細気泡発生装置を得ることを目的とする。 An object of the present invention is to obtain a fine bubble generator capable of improving the efficiency of fine bubble generation.
 本発明は、以下の項目を提供する。 The present invention provides the following items.
 (項目1)
 微細気泡を発生する装置であって、
 液体に気体を混合して気液の旋回流を生成する気液生成部と、
 前記気液生成部で生成された気液を吐出する気液吐出部と、
 前記気液吐出部から吐出された気液の気泡を微細化する気泡微細化部と
 を備え、
 前記気泡微細化部は、前記気液吐出部に対して隙間を介して対向配置されたバッフル板と、前記バッフル板を支持する軸部を有するバッフル板支持体とを含み、前記気泡微細化部の内腔と前記バッフル板との間に間隙が形成されており、
 前記バッフル板は、中心に位置する中心貫通孔と、中心以外に位置する1以上の貫通孔とを有し、前記中心貫通孔には前記バッフル支持体の前記軸部が挿入されている、微細気泡発生装置。
(Item 1)
A device that generates fine bubbles
A gas-liquid generator that mixes gas with liquid to generate a swirling flow of gas and liquid,
A gas / liquid discharge unit that discharges the air / liquid generated in the gas / liquid generation unit,
It is provided with a bubble miniaturization section for refining the bubbles of the gas solution discharged from the gas / liquid discharge section.
The bubble miniaturization portion includes a baffle plate arranged so as to face the gas / liquid discharge portion via a gap, and a baffle plate support having a shaft portion that supports the baffle plate. A gap is formed between the lumen of the baffle plate and the baffle plate.
The baffle plate has a central through hole located at the center and one or more through holes located outside the center, and the shaft portion of the baffle support is inserted into the central through hole. Bubble generator.
 (項目2)
 前記バッフル板は、前記気液吐出部から吐出される流量によって前記バッフル板支持体の前記軸方向に移動可能である、項目1に記載の微細気泡発生装置。
(Item 2)
The fine bubble generator according to item 1, wherein the baffle plate can move in the axial direction of the baffle plate support by a flow rate discharged from the gas / liquid discharge portion.
 (項目3)
 前記バッフル板は略円板であり、前記1以上の貫通孔は、前記略円板の中心の周りに配置された複数の貫通孔である、項目1または2に記載の微細気泡発生装置。
(Item 3)
The fine bubble generator according to item 1 or 2, wherein the baffle plate is a substantially disk, and the one or more through holes are a plurality of through holes arranged around the center of the substantially disk.
 (項目4)
 前記1以上の貫通孔の中心は、前記略円板の中心と外周縁との間の中心よりも前記中心側に位置にする、項目3に記載の微細気泡発生装置。
(Item 4)
The fine bubble generator according to item 3, wherein the center of the one or more through holes is located on the center side of the center between the center of the substantially disk and the outer peripheral edge.
 (項目5)
 前記1以上の貫通孔の形状は、略円形である、項目1~4のいずれか一項に記載の微細気泡発生装置。
(Item 5)
The fine bubble generator according to any one of items 1 to 4, wherein the shape of the one or more through holes is substantially circular.
 本発明によれば、微細気泡の発生効率を向上することができる微細気泡を発生する装置を得ることができる。 According to the present invention, it is possible to obtain an apparatus for generating fine bubbles, which can improve the efficiency of generating fine bubbles.
図1は、本発明の微細気泡発生装置10を説明するための概念図である。FIG. 1 is a conceptual diagram for explaining the fine bubble generator 10 of the present invention. 図2Aは、本発明の第1のタイプの微細気泡発生装置100を説明するための図である。FIG. 2A is a diagram for explaining the first type fine bubble generator 100 of the present invention. 図2Bは、本発明の第2のタイプの微細気泡発生装置200を説明するための図である。FIG. 2B is a diagram for explaining the second type of fine bubble generator 200 of the present invention. 図3は、本発明の微細気泡発生装置で用いられるバッフル板11を説明するための平面図である。FIG. 3 is a plan view for explaining the baffle plate 11 used in the fine bubble generator of the present invention. 図4は、本発明の実施形態1による微細気泡発生装置1000を説明するための図である。FIG. 4 is a diagram for explaining the fine bubble generator 1000 according to the first embodiment of the present invention. 図5は、図4に示す微細気泡発生装置1000におけるバッフル板115およびバッフル板支持体12を含む気泡微細化部100bの要部を説明するための斜視図である。FIG. 5 is a perspective view for explaining a main part of the bubble miniaturization portion 100b including the baffle plate 115 and the baffle plate support 12 in the fine bubble generator 1000 shown in FIG. 図6は、図4に示す微細気泡発生装置1000を構成する部品を説明するための図である。FIG. 6 is a diagram for explaining the components constituting the fine bubble generator 1000 shown in FIG. 図7は、図4に示す微細気泡発生装置1000の動作を説明するための縦断面図である。FIG. 7 is a vertical sectional view for explaining the operation of the fine bubble generator 1000 shown in FIG.
 以下、本発明を説明する。本明細書において使用される用語は、特に言及しない限り、当該分野で通常用いられる意味で用いられることが理解されるべきである。したがって、他に定義されない限り、本明細書中で使用される全ての専門用語および科学技術用語は、本発明の属する分野の当業者によって一般的に理解されるのと同じ意味を有する。矛盾する場合、本明細書(定義を含めて)が優先する。 Hereinafter, the present invention will be described. It should be understood that the terms used herein are used in the meaning commonly used in the art unless otherwise noted. Accordingly, unless otherwise defined, all terminology and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. In case of conflict, this specification (including definitions) takes precedence.
 本明細書において、「約」とは、後に続く数字の±10%の範囲内をいう。 In the present specification, "about" means within the range of ± 10% of the number following.
 本発明の微細気泡発生装置は、微細気泡の発生効率を向上することができる微細気泡発生装置を得ることを課題とし、微細気泡を発生する装置であって、液体に気体を混合して気液の旋回流を生成する気液生成部と、気液生成部で生成された気液を吐出する気液吐出部と、気液吐出部から吐出された気液の気泡を微細化する気泡微細化部とを備え、気泡微細化部は、気液吐出部に対して隙間を介して対向配置されたバッフル板と、バッフル板を支持する軸部を有するバッフル板支持体とを含み、気泡微細化部の内腔とバッフル板との間に間隙が形成されており、バッフル板は、中心に位置する中心貫通孔と、中心以外に位置する1以上の貫通孔とを有し、中心貫通孔にはバッフル支持体の軸部が挿入されている、装置を提供することにより、上記の課題を解決したものである。 The object of the fine bubble generator of the present invention is to obtain a fine bubble generator capable of improving the efficiency of fine bubble generation, and is a device for generating fine bubbles by mixing a gas with a liquid. A gas-liquid generation section that generates a swirling flow, a gas-liquid discharge section that discharges the gas-liquid generated by the gas-liquid generation section, and a bubble miniaturization that miniaturizes the bubbles of the gas-liquid discharged from the gas-liquid discharge section. The bubble miniaturization portion includes a baffle plate arranged so as to face the gas / liquid discharge portion via a gap, and a baffle plate support having a shaft portion for supporting the baffle plate. A gap is formed between the lumen of the portion and the baffle plate, and the baffle plate has a central through hole located at the center and one or more through holes located outside the center, and the baffle plate has a central through hole. Solves the above-mentioned problems by providing an apparatus in which the shaft portion of the baffle support is inserted.
 図1は、本発明の微細気泡発生装置10を説明するための概念図である。 FIG. 1 is a conceptual diagram for explaining the fine bubble generator 10 of the present invention.
 本発明の装置10は、図1に示すように、少なくとも、気液の旋回流を生成する気液生成部100aと、生成された気液を吐出する気液吐出部13と、吐出された気液の気泡を微細化する気泡微細化部100bとを備え、気泡微細化部100bは、気液吐出部に対して隙間を介して対向配置されたバッフル板11と、バッフル板を支持する軸部12aを有するバッフル板支持体12とを含み、気泡微細化部100bの内腔Cとバッフル板11との間に間隙Sが形成されており、バッフル板11は、中心に位置する中心貫通孔11aと、中心以外に位置する1以上の貫通孔11bとを有し、中心貫通孔11aにはバッフル支持体12の軸部12aが挿入されているものであれば、その他の構成は、特に限定されるものではない。 As shown in FIG. 1, the apparatus 10 of the present invention has at least a gas / liquid generation unit 100a that generates a swirling flow of air / liquid, a gas / liquid discharge unit 13 that discharges the generated air / liquid, and the discharged air. A bubble miniaturization unit 100b for miniaturizing liquid bubbles is provided, and the bubble miniaturization unit 100b includes a baffle plate 11 arranged to face the gas-liquid discharge unit via a gap, and a shaft portion that supports the baffle plate. A gap S is formed between the cavity C of the bubble miniaturization portion 100b and the baffle plate 11 including the baffle plate support 12 having 12a, and the baffle plate 11 has a central through hole 11a located at the center. The other configuration is particularly limited as long as it has one or more through holes 11b located outside the center and the shaft portion 12a of the baffle support 12 is inserted into the center through hole 11a. It's not something.
 例えば、気液生成部は、気泡を含む液体である気液の旋回流を生成するものであれば、任意の形態であり得る。例えば、液体の旋回流を形成した状態で、液体の旋回流に気体を導入することにより気液の旋回流を生成するもの(第1のタイプの微細気泡発生装置)でもよいし、あるいは、液体と気体とを混合して得られた気液を旋回させることにより気液の旋回流を発生するもの(第2のタイプの微細気泡発生装置)でもよい。 For example, the gas / liquid generation unit may have any form as long as it generates a swirling flow of gas / liquid which is a liquid containing bubbles. For example, it may be a device that generates a swirling flow of gas and liquid by introducing a gas into the swirling flow of liquid in a state where a swirling flow of liquid is formed (first type fine bubble generator), or a liquid. It may be a device (second type fine bubble generator) that generates a swirling flow of gas and liquid by swirling the gas and liquid obtained by mixing gas and gas.
 旋回流の生成方法も気液生成部内部に設けた旋回ファンの駆動により生成してもよいし、液流体が、吐出部に向かって螺旋状に旋回するように、断面視環状の接線方向に沿って液流体を導入するようにしてもよい。 The method of generating the swirling flow may also be generated by driving a swirling fan provided inside the gas / liquid generating section, or in the tangential direction of the annular view of the cross section so that the liquid fluid spirally swirls toward the discharging section. A liquid fluid may be introduced along the line.
 バッフル板11は、その略中心に形成された中心貫通孔11aと、その略中心の周りに形成された中心周りの貫通孔11bとを有するものであればよい。 The baffle plate 11 may have a central through hole 11a formed at a substantially center thereof and a through hole 11b around the center formed around the substantially center thereof.
 ここで、バッフル板11の略中心は、バッフル板11の重心の位置であり、バッフル板11が回転する場合はこの重心の位置を中心として回転する。 Here, the substantially center of the baffle plate 11 is the position of the center of gravity of the baffle plate 11, and when the baffle plate 11 rotates, it rotates around the position of the center of gravity.
 中心貫通孔11aは、中心貫通孔11aにバッフル板支持体12の軸部12aが挿入されるためのものであり得る。中心貫通孔11aは、バッフル板11が軸部12aに対して位置が固定される程度大きさであってもよいし、バッフル板支持体12の中心軸Aに垂直な方向のバッフル板11の移動が一定範囲内に規制されるような大きさであってもよい。例えば、バッフル板11の中心貫通孔11aの大きさはバッフル板支持体12の軸部12aの外周よりも大きくなっており、バッフル板11は、気液吐出部13から吐出される気液の流量によって、バッフル板支持体12の中心軸Aの方向に移動可能であり、かつ、バッフル板支持体12の中心軸Aの方向に垂直な方向には、一定範囲内で移動可能であり得る。 The central through hole 11a may be for inserting the shaft portion 12a of the baffle plate support 12 into the central through hole 11a. The central through hole 11a may be large enough to fix the position of the baffle plate 11 with respect to the shaft portion 12a, or the baffle plate 11 may move in a direction perpendicular to the central axis A of the baffle plate support 12. May be of a size that is regulated within a certain range. For example, the size of the central through hole 11a of the baffle plate 11 is larger than the outer circumference of the shaft portion 12a of the baffle plate support 12, and the baffle plate 11 is the flow rate of the gas and liquid discharged from the gas and liquid discharge portion 13. Therefore, the baffle plate support 12 may be movable in the direction of the central axis A, and may be movable within a certain range in the direction perpendicular to the direction of the central axis A of the baffle plate support 12.
 中心周り貫通孔11bは、バッフル板11の一方の面(バッフル板11の気液吐出部13とは反対側の面、例えば、上面)側と、その他方の面(バッフル板11の気液吐出部13側の面、例えば、下面)側で流体(例えば、気液)の圧力差が生じた場合に、気液がバッフル板11を通り抜けてバッフル板11の一方の面側から他方の面側へ移動するようにするための孔である。 The through hole 11b around the center is formed on one surface of the baffle plate 11 (the surface of the baffle plate 11 opposite to the gas / liquid discharge portion 13, for example, the upper surface) and the other surface (gas / liquid discharge of the baffle plate 11). When a pressure difference of a fluid (for example, air or liquid) occurs on the surface on the portion 13 side, for example, the lower surface) side, the air or liquid passes through the baffle plate 11 from one surface side to the other surface side of the baffle plate 11. It is a hole for moving to.
 例えば、気泡微細化部100bでは、バッフル板11の下面側でその上面側より気液の圧力が低下した場合、気体吐出部13から吐出された気液がバッフル板11の外縁よりも外側を通ってバッフル板11の下面側から上面側に移動した流体の一部が、中心周り貫通孔11bを通ってバッフル板11の下面側に戻ることとなる。この場合、バッフル板11の下面側に戻った気液は、再度バッフル板11により乱されることとなり、気液の気泡のさらなる微細化が行われる。特に、旋回流である気液中の気泡サイズが小さいものは気泡微細部の内腔の外周側に集まるが、気泡サイズが大きいものは内腔の中心側に集まるため、そのような気泡サイズの大きいものが存在する気液は中心周りの貫通孔11bを通ってバッフル板11の下面側に戻ることとなる。気泡サイズの大きいものを効率的に下面側に戻すために、中心周りの貫通孔11bは、可能な限り内腔の中心側に設けることが好ましい。 For example, in the bubble miniaturization unit 100b, when the pressure of the gas and liquid on the lower surface side of the baffle plate 11 is lower than that on the upper surface side, the air and liquid discharged from the gas discharge unit 13 passes outside the outer edge of the baffle plate 11. A part of the fluid that has moved from the lower surface side to the upper surface side of the baffle plate 11 returns to the lower surface side of the baffle plate 11 through the through hole 11b around the center. In this case, the air-liquid returned to the lower surface side of the baffle plate 11 is disturbed again by the baffle plate 11, and the air bubbles of the air-liquid are further refined. In particular, those with a small bubble size in the gas and liquid that are swirling flows gather on the outer peripheral side of the lumen of the fine bubble part, but those with a large bubble size gather on the center side of the lumen, so such bubble size The air and liquid in which a large one is present will return to the lower surface side of the baffle plate 11 through the through hole 11b around the center. It is preferable that the through hole 11b around the center is provided on the center side of the lumen as much as possible in order to efficiently return the one having a large bubble size to the lower surface side.
 なお、中心貫通孔11aは、中心貫通孔11aにバッフル板支持体12の軸部12aが挿入された状態でも中心貫通孔11aとバッフル板支持体12の軸部12aとの間には隙間があるので、バッフル板11の上面側から下面側への気液の流路とはなっているが、中心貫通孔11aにはバッフル板支持体12が挿入されることから、中心貫通孔11aの開口の一部はバッフル板支持体12の軸部12aで塞がれている。このため、中心貫通孔11aの流路の断面積は、完全に開口している中心周り貫通孔11bに比べると著しく狭く、気液のさらなる微細化のためにバッフル板11の一方の面から他方の面へ向けて気液を通過させる通路は、実質的には、中心貫通孔11aではなく、中心周り貫通孔11bによって形成されている。 The central through hole 11a has a gap between the central through hole 11a and the shaft portion 12a of the baffle plate support 12 even when the shaft portion 12a of the baffle plate support 12 is inserted into the central through hole 11a. Therefore, it is a flow path of air and liquid from the upper surface side to the lower surface side of the baffle plate 11, but since the baffle plate support 12 is inserted into the central through hole 11a, the opening of the central through hole 11a A part is closed by the shaft portion 12a of the baffle plate support 12. Therefore, the cross-sectional area of the flow path of the central through hole 11a is remarkably narrower than that of the completely open central through hole 11b, and the baffle plate 11 is made from one surface to the other for further miniaturization of gas and liquid. The passage through which the gas and liquid pass toward the surface of the center is not substantially formed by the central through hole 11a but by the through hole 11b around the center.
 なお、バッフル板11の材質は任意の材質であり得る。例えば、プラスチックであってもよいし、アルミ、鉄、ステンレスなどの金属であってもよい。バッフル板11の厚さおよび重さは限定されるものではなく、求められる気液GLの吐出量や微細気泡の大きさなどにより任意の厚さおよび重さに調整し得る。 The material of the baffle plate 11 can be any material. For example, it may be plastic or a metal such as aluminum, iron, or stainless steel. The thickness and weight of the baffle plate 11 are not limited, and can be adjusted to any thickness and weight depending on the required discharge amount of gas-liquid GL, the size of fine bubbles, and the like.
 また、バッフル板11の形状は任意であり得る。例えば、外周形状は略円形、略三角形、略四角形、略多角形(五角形以上)であってもよい。 Further, the shape of the baffle plate 11 can be arbitrary. For example, the outer peripheral shape may be a substantially circular shape, a substantially triangular shape, a substantially quadrangle, or a substantially polygonal shape (pentagon or more).
 また、バッフル板11の中心周りの貫通孔11bの形状も任意であり得る。例えば、外周形状は略円形、略三角形、略四角形、略多角形(五角形以上)であってもよい。 Further, the shape of the through hole 11b around the center of the baffle plate 11 may be arbitrary. For example, the outer peripheral shape may be a substantially circular shape, a substantially triangular shape, a substantially quadrangle, or a substantially polygonal shape (pentagon or more).
 また、中心周りの貫通孔11bの配置についても任意であり得る。複数設けられる貫通孔11bは中心貫通孔11a周りに均等に配置されていてもよいし、ランダムに配置されていてもよい。好ましくは、中心周りの貫通孔11bは、その中心がバッフル板11の中心と外周縁との間の中央よりもバッフル板11の中心側に配置される。このようにすることで、中心側に寄りがちな気泡サイズの大きい気液が通過しやすくなる。 Further, the arrangement of the through hole 11b around the center may be arbitrary. The plurality of through holes 11b may be evenly arranged around the central through holes 11a, or may be randomly arranged. Preferably, the through hole 11b around the center is arranged so that the center thereof is closer to the center of the baffle plate 11 than the center between the center and the outer peripheral edge of the baffle plate 11. By doing so, it becomes easy for air and liquid having a large bubble size, which tends to be closer to the center side, to pass through.
 なお、図1、3などに示す形態において、中心周りの貫通孔11bは、中心と外周縁との間の中央または、中央より中心側のみ設けられているが、本発明はこれに限定されない。中心周りの貫通孔11bを外周側にも同様に設けてもよい。 In the form shown in FIGS. 1 and 3, the through hole 11b around the center is provided only at the center between the center and the outer peripheral edge or only on the center side from the center, but the present invention is not limited thereto. A through hole 11b around the center may be provided on the outer peripheral side in the same manner.
  また、中心周りの貫通孔11bの大きさおよび数も任意であり得る。好ましくは、貫通孔11bの大きさは大きく、かつ数を多く設ける。それにより、貫通孔11bを通過する気液を増やすことが可能となり、微細気泡をより効率的に発生させることが可能となる。 Also, the size and number of through holes 11b around the center can be arbitrary. Preferably, the through holes 11b have a large size and a large number. As a result, it becomes possible to increase the amount of gas and liquid passing through the through hole 11b, and it becomes possible to generate fine bubbles more efficiently.
 例えば、バッフル板11の大きさは、約10mm~約300mm、好ましくは、約20mm~約200mmであり得る。また、例えば、中心周りの貫通孔11bの大きさは約φ2~10mm、好ましくは、約φ3mm~5mmであり得る。例えば、中心周りの貫通孔11bの数は約4個~約16個、好ましくは、約8個~約12個であり得る。例えば、中心周りの貫通孔11bは、バッフル板11の中心と外周縁との間の中心から約0.5mm~約3mm中心側、好ましくは、約1mm~約2mm中心側に位置している。しかし、これはあくまで一例であって、それ以外の数値範囲であってもよい。バッフル板11の大きさを約100mm以上(例えば、約150mm)とすることにより水質の関係で詰まりを解消することが可能となる。 For example, the size of the baffle plate 11 can be about 10 mm to about 300 mm, preferably about 20 mm to about 200 mm. Further, for example, the size of the through hole 11b around the center may be about φ2 to 10 mm, preferably about φ3 mm to 5 mm. For example, the number of through holes 11b around the center can be about 4 to about 16, preferably about 8 to about 12. For example, the through hole 11b around the center is located on the center side of about 0.5 mm to about 3 mm, preferably about 1 mm to about 2 mm from the center between the center of the baffle plate 11 and the outer peripheral edge. However, this is just an example, and may be in a numerical range other than that. By setting the size of the baffle plate 11 to about 100 mm or more (for example, about 150 mm), it is possible to eliminate the clogging due to the water quality.
 また、液体および気体は限定されるものではなく、任意であり得る。例えば、液体は、水でもよいし、水以外の液体(例えば、アルコール、油、液体燃料など)でもよい。気体は、空気でもよいし、空気以外の気体(例えば、炭酸ガス、窒素ガス、酸素ガス、水素ガス、ヘリウムガスなど)でもよい。 Also, liquids and gases are not limited and can be arbitrary. For example, the liquid may be water or a liquid other than water (for example, alcohol, oil, liquid fuel, etc.). The gas may be air or a gas other than air (for example, carbon dioxide gas, nitrogen gas, oxygen gas, hydrogen gas, helium gas, etc.).
 以下、本発明の微細気泡発生装置10のより具体的な例として、第1のタイプの微細気泡発生装置100と第2のタイプの微細気泡発生装置200とを説明する。 Hereinafter, as a more specific example of the fine bubble generator 10 of the present invention, the first type fine bubble generator 100 and the second type fine bubble generator 200 will be described.
 〔第1のタイプの微細気泡発生装置100〕
 図2Aは、本発明の第1のタイプの微細気泡発生装置100を説明するための図であり、図2A(a)は、この微細気泡発生装置を概念的に示す図であり、図2A(b)は、図2A(a)に示す微細気泡発生装置の外観を模式的に示す斜視図である。
[First type fine bubble generator 100]
FIG. 2A is a diagram for explaining the first type of fine bubble generator 100 of the present invention, and FIG. 2A (a) is a diagram conceptually showing the fine bubble generator, FIG. 2A (FIG. 2A). b) is a perspective view schematically showing the appearance of the fine bubble generator shown in FIG. 2A (a).
 この微細気泡発生装置100は、気液生成部100aと、気液吐出部13と、バッフル板11およびバッフル板支持体12を含む気泡微細化部100bと、気液排出部100cとを有する。ここで、バッフル板支持体12は、気液生成部100aに気体を供給する気体吐出ノズルとしての機能も有している。この微細気泡発生装置100は、陸上(空気中)で使用するものであり、気液生成部100aと気液排出部100cとの間に位置する気泡微細化部100bが密封空間内に収容されるように、気液生成部100aと気液排出部100cとの間の空間が周壁14により密閉されている。この空間は、気泡微細化部100bの内腔Cとなっており、内腔Cとバッフル板11との間には隙間Sが形成されている。 The fine bubble generator 100 has a gas / liquid generation unit 100a, a gas / liquid discharge unit 13, a bubble miniaturization unit 100b including a baffle plate 11 and a baffle plate support 12, and a gas / liquid discharge unit 100c. Here, the baffle plate support 12 also has a function as a gas discharge nozzle for supplying gas to the gas / liquid generation unit 100a. This fine bubble generating device 100 is used on land (in the air), and the bubble micronizing section 100b located between the gas / liquid generating section 100a and the gas / liquid discharging section 100c is housed in the sealed space. As described above, the space between the air-liquid generation unit 100a and the air-liquid discharge unit 100c is sealed by the peripheral wall 14. This space is the lumen C of the bubble miniaturization portion 100b, and a gap S is formed between the lumen C and the baffle plate 11.
 (気液生成部100a)
 気液生成部100aは、例えば、液体貯留部4から配管2を介してポンプ3で圧送されてきた液体を一時的に貯留して旋回させ、得られた液体の旋回流に気体吐出ノズル12から吐出された気体を導入して気液の旋回流を発生させる。なお、気液生成部100aに供給する液体は水でもよく、液体の圧力として水道水の圧力で目的とする気液の発生が可能である場合には、図2Aの二点鎖線で示すように、気液生成部100aには、水道栓2b1が設けられた水道管2bを接続して、水道管2bから液体として水が供給されるようにしてもよい。
(Gas and liquid generation unit 100a)
The gas-liquid generation unit 100a temporarily stores and swirls the liquid pumped from the liquid storage unit 4 via the pipe 2 via the pump 3, and swirls the obtained swirling flow of the liquid from the gas discharge nozzle 12. The discharged gas is introduced to generate a swirling flow of gas and liquid. The liquid supplied to the gas-liquid generation unit 100a may be water, and when the target gas-liquid can be generated by the pressure of tap water as the liquid pressure, as shown by the two-point chain line in FIG. 2A. A water pipe 2b provided with a water tap 2b1 may be connected to the gas / liquid generation unit 100a so that water is supplied as a liquid from the water pipe 2b.
 (気液吐出部13)
 気液吐出部13は、気液生成部100aで生成された液体の旋回流をバッフル板11に向けて吐出する部分であり、例えば、気液吐出ノズル13で構成されている。
(Air / liquid discharge unit 13)
The gas / liquid discharge unit 13 is a portion that discharges the swirling flow of the liquid generated by the gas / liquid generation unit 100a toward the baffle plate 11, and is composed of, for example, a gas / liquid discharge nozzle 13.
 (気泡微細化部100b)
 気泡微細化部100bは、バッフル板11およびバッフル板支持体12を含み、バッフル板11は、気液の旋回流の吐出量によって気液吐出部13に近づいたり気液吐出部13から離れたりするようになっている。従って、気泡微細化部100bは、気液生成部100aの気液吐出部13から吐出された気液の旋回流をバッフル板11で乱して気液中の気泡を微細化する部分(乱流発生部)となっている。
(Bubble miniaturization unit 100b)
The bubble miniaturization unit 100b includes the baffle plate 11 and the baffle plate support 12, and the baffle plate 11 approaches or separates from the gas liquid discharge unit 13 depending on the discharge amount of the swirling flow of the gas liquid. It has become like. Therefore, the bubble miniaturization unit 100b is a portion (turbulent flow) in which the swirling flow of the gas and liquid discharged from the gas and liquid discharge unit 13 of the gas and liquid generation unit 100a is disturbed by the baffle plate 11 to refine the bubbles in the gas and liquid. (Generation part).
 また、バッフル板11は、例えば、その中心に形成された第1の貫通孔(中心貫通孔)11aと、中心周りに形成された一対の第2の貫通孔(中心周り貫通孔)11bとを有する。バッフル板支持体12は、その先端部である軸部12aがバッフル板11の中心貫通孔11aに挿入されることにより、バッフル板11の中心がバッフル板支持体12の中心軸Aから所定距離以上離れないようにバッフル板11を支持する。この場合、バッフル板11は、気液吐出部13から吐出される気液の流量によってバッフル板支持体12の中心軸Aの方向に移動可能である。また、バッフル板11の中心周り貫通孔11bは、気液吐出部13から吐出されてバッフル板11の周縁を越えて(すなわち、気泡微細化部100bの内腔Cとバッフル板11との隙間Sを流れて)気液排出部100cに向かう気液GLの旋回流の一部を気液吐出部13側に戻す還流経路を形成するものである。気液吐出部13から吐出される気液と、中心周り貫通孔11bを介して還流経路により気液吐出部13側に戻る気液とが衝突することにより、さらに乱流が発生し気泡の微細化が向上する。さらに、気液GLの旋回流の一部が中心周り貫通孔11bを通って気液吐出部13側に戻ることにより、移動するバッフル板11によって気液GLの旋回流の一部が乱されて内部の気泡がさらに微細化される。したがって、気液吐出部から吐出された気液がバッフル板に衝突しつつ、気泡微細化部100bの内腔Cとバッフル板11との隙間Sに流れ、そのまま気液排出部100cに流れていく装置に対して、本発明の装置は、バッフル板の中心周り貫通孔の存在により、より効率的に気泡の微細化を図ることができる点で有用である。 Further, the baffle plate 11 has, for example, a first through hole (center through hole) 11a formed in the center thereof and a pair of second through holes (through hole around the center) 11b formed around the center. Have. The baffle plate support 12 has a shaft portion 12a at its tip inserted into the central through hole 11a of the baffle plate 11, so that the center of the baffle plate 11 is at least a predetermined distance from the central axis A of the baffle plate support 12. The baffle plate 11 is supported so as not to separate. In this case, the baffle plate 11 can move in the direction of the central axis A of the baffle plate support 12 depending on the flow rate of the air and liquid discharged from the air and liquid discharge unit 13. Further, the through hole 11b around the center of the baffle plate 11 is discharged from the gas / liquid discharge portion 13 and extends beyond the peripheral edge of the baffle plate 11 (that is, the gap S between the lumen C of the bubble miniaturization portion 100b and the baffle plate 11). A part of the swirling flow of the gas-liquid GL toward the gas-liquid discharge unit 100c is returned to the gas-liquid discharge unit 13 side to form a reflux path. When the gas and liquid discharged from the gas and liquid discharge part 13 collide with the gas and liquid returning to the gas and liquid discharge part 13 side by the reflux path through the through hole 11b around the center, further turbulence is generated and the bubbles are fine. Will improve. Further, a part of the swirling flow of the gas-liquid GL returns to the gas-liquid discharge portion 13 side through the through hole 11b around the center, so that a part of the swirling flow of the gas-liquid GL is disturbed by the moving baffle plate 11. The bubbles inside are further refined. Therefore, while the gas liquid discharged from the gas liquid discharge part collides with the baffle plate, it flows into the gap S between the lumen C of the bubble miniaturization part 100b and the baffle plate 11 and flows directly to the gas liquid discharge part 100c. In contrast to the device, the device of the present invention is useful in that the presence of a through hole around the center of the baffle plate enables more efficient miniaturization of bubbles.
 その結果、従来の装置では加圧用のデバイスなどを使用しないと達成できなかった微細化された気泡(または大きなサイズの気泡が少ない)を含む気液を、例えば水道水の水圧でも生成することが可能となった
 (気液排出部100c)
 気液排出部100cは、気液吐出ノズル12を支持する円柱状部材などの柱状部材であり、内部には、気泡微細化部100bで気泡の微細化が行われた気液を装置外部に排出するための気液排出路101cが形成されている。また、気液排出部100cの周壁面には、気体導入口102cが形成されており、気体導入口102cは、気液排出部100cの内部に形成された気体導入路103cを介して気液吐出ノズル12の先端開口12a(図5(b)参照)に繋がっている。
As a result, it is possible to generate gas and liquid containing finely divided bubbles (or few large-sized bubbles) that could not be achieved without using a pressurizing device or the like with a conventional device, even with the water pressure of tap water, for example. It became possible (air-liquid discharge part 100c)
The gas / liquid discharge unit 100c is a columnar member such as a columnar member that supports the gas / liquid discharge nozzle 12, and inside the air / liquid discharge unit 100b, the air / liquid whose bubbles have been miniaturized by the bubble miniaturization unit 100b is discharged to the outside of the apparatus. A gas-liquid discharge path 101c is formed for this purpose. Further, a gas introduction port 102c is formed on the peripheral wall surface of the gas-liquid discharge section 100c, and the gas introduction port 102c discharges gas and liquid through the gas introduction path 103c formed inside the gas-liquid discharge section 100c. It is connected to the tip opening 12a (see FIG. 5B) of the nozzle 12.
 なお、気液排出部100cは、気泡微細化部100bを通過した気液を装置外部に排出する部分であればよく、具体的な構成は特に限定されるものではない。従って、気液排出部100cは、円柱状部材で構成されたものに限定されず、角柱状部材で構成されたものでもよい。 The gas / liquid discharge unit 100c may be a portion that discharges the gas / liquid that has passed through the bubble miniaturization unit 100b to the outside of the apparatus, and the specific configuration is not particularly limited. Therefore, the gas / liquid discharge unit 100c is not limited to the one made of a columnar member, but may be made of a prismatic member.
 また、微細気泡発生装置100を液中で使用する場合は、気液排出部100cおよび周壁14は不要であり、微細気泡発生装置100には、柱状部材で構成された気液排出部100cの代わりに気体吐出ノズル12を支持するアームなどの支持部材が設けられていればよい。この場合、気泡微細化部100bの内腔Cとバッフル板11との隙間Sは、バッフル板11の外縁よりも外側の領域を囲むように、バッフル板11の周囲に予め存在する液体により形成されることとなる。 Further, when the fine bubble generator 100 is used in the liquid, the gas liquid discharge unit 100c and the peripheral wall 14 are unnecessary, and the fine bubble generator 100 replaces the gas liquid discharge unit 100c composed of a columnar member. It suffices if a support member such as an arm for supporting the gas discharge nozzle 12 is provided. In this case, the gap S between the lumen C of the bubble miniaturization portion 100b and the baffle plate 11 is formed by the liquid pre-existing around the baffle plate 11 so as to surround the region outside the outer edge of the baffle plate 11. The Rukoto.
 〔第2のタイプの微細気泡発生装置200〕
 図2Bは、本発明の第2のタイプの微細気泡発生装置200を説明するための図であり、図2B(a)は、この微細気泡発生装置を概念的に示す図であり、図2B(b)は、図2B(a)に示す微細気泡発生装置の外観を模式的に示す斜視図である。
[Second type fine bubble generator 200]
2B is a diagram for explaining the second type of fine bubble generator 200 of the present invention, FIG. 2B (a) is a diagram conceptually showing this fine bubble generator, and FIG. 2B (? b) is a perspective view schematically showing the appearance of the fine bubble generator shown in FIG. 2B (a).
 この第2のタイプの微細気泡発生装置200は、液体Lに気体Gを混合して得られた気液を旋回させることにより気泡の微細化を行って微細気泡を発生させる点で、液体Lを旋回させている状態で液体Lの旋回流に気体を導入して微細気泡を発生させる第1のタイプの微細気泡発生装置100(図2A参照)と異なる。 This second type of fine bubble generator 200 produces the liquid L in that the bubbles are miniaturized by swirling the gas and liquid obtained by mixing the gas G with the liquid L to generate fine bubbles. It is different from the first type fine bubble generator 100 (see FIG. 2A) in which a gas is introduced into the swirling flow of the liquid L in a swirling state to generate fine bubbles.
 すなわち、この第2のタイプの微細気泡発生装置200は、第1のタイプの微細気泡発生装置100と同様に、気液生成部200aと、気液吐出部13と、バッフル板11およびバッフル板支持体22を含む気泡微細化部200bと、気液排出部200cとを備えているが、気液生成部200a、気泡微細化部200b、および気液排出部200cはそれぞれ、第1のタイプの微細気泡発生装置100における対応する気液生成部100a、気泡微細化部100b、および気液排出部100cとは一部の構成が異なっている。 That is, the second type of fine bubble generator 200, like the first type of fine bubble generator 100, has a gas / liquid generation unit 200a, a gas / liquid discharge unit 13, a baffle plate 11 and a baffle plate support. The bubble micronization unit 200b including the body 22 and the gas / liquid discharge unit 200c are provided, but the gas / liquid generation unit 200a, the bubble micronization unit 200b, and the gas / liquid discharge unit 200c are each of the first type of fineness. Part of the configuration is different from the corresponding air-liquid generation unit 100a, bubble micronization unit 100b, and air-liquid discharge unit 100c in the bubble generator 100.
 (気液生成部200a)
 すなわち、この微細気泡発生装置200では、気液生成部200aは、微細気泡発生装置100の配管2とは異なる構造の配管2aを有しており、この配管2aは、主配管2a1を流れる液体Lに枝管2a2から吸い込まれた気体Gが混入される構造となっている。気液生成部200aは、微細気泡発生装置100の気液生成部100aに代わる流体旋回部201aを有しているが、流体旋回部201aと気液生成部100aとは、流体旋回部201aでは導入される流体が気液GLであるのに対し、気液生成部100aでは導入される流体が液体Lである点で異なるのみであり、流体旋回部201aは気液生成部100aと同じ構造を有する。
(Gas and liquid generation unit 200a)
That is, in the fine bubble generator 200, the gas-liquid generation unit 200a has a pipe 2a having a structure different from that of the pipe 2 of the fine bubble generator 100, and this pipe 2a is a liquid L flowing through the main pipe 2a1. The structure is such that the gas G sucked from the branch pipe 2a2 is mixed into the pipe. The gas / liquid generation unit 200a has a fluid swirling unit 201a instead of the gas / liquid generation unit 100a of the fine bubble generator 100, but the fluid swirling unit 201a and the gas / liquid generation unit 100a are introduced in the fluid swirling unit 201a. The fluid to be introduced is a gas-liquid GL, whereas the gas-liquid generation unit 100a is different only in that the fluid to be introduced is a liquid L, and the fluid swirling unit 201a has the same structure as the gas-liquid generation unit 100a. ..
 (気泡微細化部200b)
 この微細気泡発生装置200の気泡微細化部200bは、微細気泡発生装置100の気泡微細化部100bにおける気体吐出ノズルとしての機能を有するバッフル板規制体12に代えて、気体吐出ノズルとしての機能は持たず、単にバッフル板11の移動範囲を規制するバッフル板支持体22を有する点でのみ、微細気泡発生装置100の気泡微細化部100bとは異なる。
(Bubble miniaturization unit 200b)
The bubble micronization unit 200b of the fine bubble generator 200 has a function as a gas discharge nozzle instead of the baffle plate regulator 12 having a function as a gas discharge nozzle in the bubble miniaturization unit 100b of the fine bubble generator 100. It differs from the bubble miniaturization portion 100b of the fine bubble generator 100 only in that it does not have the baffle plate support 22 and merely has the baffle plate support 22 that regulates the moving range of the baffle plate 11.
 (気液排出部200c)
 気液排出部200cには、微細気泡発生装置100の気液排出部100cにおける気体導入口102cおよび気体導入路103cは設けられておらず、この点でのみ、気液排出部200cは微細気泡発生装置100の気液排出部100cとは異なる。従って、気液排出部200cには、気液排出部100cと同様に、気泡微細化部200bで気泡が微細化された気液を装置外部に排出するための気液排出路201cが形成されている。
(Air / liquid discharge unit 200c)
The gas / liquid discharge unit 200c is not provided with the gas introduction port 102c and the gas introduction path 103c in the gas / liquid discharge unit 100c of the fine bubble generator 100, and only at this point, the gas / liquid discharge unit 200c generates fine bubbles. It is different from the gas / liquid discharge unit 100c of the device 100. Therefore, the gas-liquid discharge unit 200c is formed with a gas-liquid discharge path 201c for discharging the gas-liquid whose bubbles are refined by the bubble miniaturization unit 200b to the outside of the device, similarly to the gas-liquid discharge unit 100c. There is.
 従って、この第2のタイプの微細気泡発生装置200の配管2aでは、液体Lは、主管2a1により液体貯留部4から吸い上げられ、気体Gは、枝管2a2から吸引され、主管2a1と枝管2a2とのつなぎ目で液体Lと気体Gとが混合されて気液が生成される。 Therefore, in the pipe 2a of the second type fine bubble generator 200, the liquid L is sucked up from the liquid storage unit 4 by the main pipe 2a1, the gas G is sucked from the branch pipe 2a2, and the main pipe 2a1 and the branch pipe 2a2 are sucked. The liquid L and the gas G are mixed at the joint with the liquid L to generate gas and liquid.
 配管2aで生成された気液は、流体旋回部201aに導入されると、旋回させられて気液の旋回流が生成され、気液GLの旋回流が気液吐出部13からバッフル板11に向けて吐出される。 When the air-liquid generated in the pipe 2a is introduced into the fluid swirling section 201a, it is swirled to generate a swirling flow of the gas-liquid, and the swirling flow of the gas-liquid GL is swirled from the gas-liquid discharge section 13 to the baffle plate 11. It is discharged toward.
 バッフル板11は、微細気泡発生装置100におけるものと同様、その中心に形成された第1の貫通孔11aと、第1の貫通孔11aを挟むようにその両側に形成された一対の第2の貫通孔11bとを有するので、この微細気泡発生装置200においても、気液吐出部13から吐出されてバッフル板11の周縁を越えて(すなわち、気泡微細化部100bの内腔Cとバッフル板11との隙間Sを流れて)気液排出部200cに向かう気液GLの旋回流の一部が、第2の貫通孔11bを介して気液吐出部13側に戻る。気液吐出部13から吐出される気液と、中心周り貫通孔11bを介して還流経路により気液吐出部13に還流した気液とが衝突することにより、さらに乱流が発生し気泡の微細化が向上する。さらに、気液GLの旋回流の一部が、第2の貫通孔11bを介して気液吐出部13側に戻ることにより、その内部に含まれる気泡がさらに微細化される。 The baffle plate 11 has a first through hole 11a formed in the center thereof and a pair of second through holes 11a formed on both sides of the first through hole 11a so as to sandwich the first through hole 11a, as in the case of the fine bubble generator 100. Since it has a through hole 11b, even in this fine bubble generator 200, it is discharged from the gas / liquid discharge section 13 and extends beyond the peripheral edge of the baffle plate 11 (that is, the lumen C of the bubble miniaturization section 100b and the baffle plate 11). A part of the swirling flow of the gas-liquid GL toward the gas-liquid discharge unit 200c (flowing through the gap S) returns to the gas-liquid discharge unit 13 side through the second through hole 11b. When the gas and liquid discharged from the gas and liquid discharge unit 13 collide with the gas and liquid recirculated to the gas and liquid discharge unit 13 by the recirculation path through the through hole 11b around the center, further turbulence is generated and the bubbles are fine. Is improved. Further, a part of the swirling flow of the gas-liquid GL returns to the gas-liquid discharge portion 13 side through the second through hole 11b, so that the bubbles contained therein are further refined.
 図3は、本発明の微細気泡発生装置で用いられるバッフル板11を説明するための平面図であり、図3(a)は、図2Aあるいは図2Bで説明したバッフル板11を示し、図3(b)~図3(f)は、図2Aあるいは図2Bに示すバッフル板11とは形状が異なるバッフル板を示す。 FIG. 3 is a plan view for explaining the baffle plate 11 used in the fine bubble generator of the present invention, and FIG. 3A shows the baffle plate 11 described with reference to FIG. 2A or FIG. 2B. (B) to FIG. 3 (f) show a baffle plate having a shape different from that of the baffle plate 11 shown in FIG. 2A or FIG. 2B.
 (バッフル板11)
 図3(a)に示すバッフル板11では、バッフル板規制体12あるいは22の軸部(先端部)12aあるいは22aが挿入される第1の貫通孔(中心貫通孔)11aは、バッフル板11の中心に位置しており、気液GLの還流経路を形成する第2の貫通孔(中心周り貫通孔)11bは、バッフル板111の中心を中心とする円周C上であって、バッフル板11の中心を通る直線上に、第1の貫通孔11aを挟んで対称となるようにその両側に配置されていてもよい。ここで、第1の貫通孔11aおよび第2の貫通孔11bはいずれも円形形状を有する。好ましくは、第2の貫通孔11bの中心は、バッフル板11の外周縁と中心との間の中央に対してバッフル板11の中心側に配置される。
(Baffle plate 11)
In the baffle plate 11 shown in FIG. 3A, the first through hole (center through hole) 11a into which the shaft portion (tip portion) 12a or 22a of the baffle plate regulator 12 or 22 is inserted is the baffle plate 11. The second through hole (through hole around the center) 11b, which is located at the center and forms the reflux path of the gas-liquid GL, is on the circumference C centered on the center of the baffle plate 111, and is on the circumference C of the baffle plate 111. It may be arranged on both sides of the straight line passing through the center of the above so as to be symmetrical with the first through hole 11a interposed therebetween. Here, both the first through hole 11a and the second through hole 11b have a circular shape. Preferably, the center of the second through hole 11b is arranged on the center side of the baffle plate 11 with respect to the center between the outer peripheral edge and the center of the baffle plate 11.
 ただし、バッフル板11に形成される第2の貫通孔の個数、配列、大きさ、形状は限定されるものではなく任意であり得る。例えば、中心周りの貫通孔の数は1個であってもよいし、図3(b)に示すように8個であっても良いし、それ以外の奇数および偶数であってもよい。また、図3(c)に示すように、複数の貫通孔のそれぞれの間隔を異ならせても良い。 However, the number, arrangement, size, and shape of the second through holes formed in the baffle plate 11 are not limited and may be arbitrary. For example, the number of through holes around the center may be one, eight as shown in FIG. 3 (b), or other odd and even numbers. Further, as shown in FIG. 3C, the intervals of the plurality of through holes may be different from each other.
 また、中心周りの貫通孔は、図3(d)に示すように、バッフル板112の中心からの距離が異なる位置に配置されていてもよい。 Further, as shown in FIG. 3D, the through holes around the center may be arranged at different distances from the center of the baffle plate 112.
 また、バッフル板の形状は、図3(a)~(d)に示す円形に限らず、図3(e)に示すように、四角形などであってもよい。 Further, the shape of the baffle plate is not limited to the circle shown in FIGS. 3 (a) to 3 (d), and may be a quadrangle or the like as shown in FIG. 3 (e).
 さらに、中心周りの貫通孔の形状も、図3(a)~(e)に示す円形に限らず、図3(f)に示すように、四角形などであってもよい。 Further, the shape of the through hole around the center is not limited to the circle shown in FIGS. 3 (a) to 3 (e), and may be a quadrangle or the like as shown in FIG. 3 (f).
 ただし、以下の実施形態では、微細気泡発生装置として、液体の旋回流に気体を導入することにより気液を生成する第1のタイプのもの(特に、気液生成部100aには水道管から液体として水を供給するもの)を挙げ、バッフル板としては、図3(b)に示すバッフル板115を挙げる。これは、後述する実験結果が示すように、他の加圧装置を使用せず水道の圧力のみで微細化された気液を効率的に生成することが可能となった。ここで、上水道の圧力は、約0.15MPa~約0.74MPaであり、好ましくは、水圧は、約0.2MPa~約0.39MPaであるが、蛇口での水圧は、上記の値から約0.1MPaほど減少した水圧(約0.1MPa~約0.29MPa)となり得る。 However, in the following embodiment, as a fine bubble generator, a first type of device that generates gas and liquid by introducing a gas into a swirling flow of liquid (particularly, the gas and liquid generation unit 100a is a liquid from a water pipe). As a baffle plate, the baffle plate 115 shown in FIG. 3 (b) is mentioned. This made it possible to efficiently generate finely divided gas and liquid only by the pressure of tap water without using other pressurizing devices, as shown by the experimental results described later. Here, the pressure of the water supply is about 0.15 MPa to about 0.74 MPa, preferably the water pressure is about 0.2 MPa to about 0.39 MPa, but the water pressure at the faucet is about from the above value. The water pressure can be reduced by about 0.1 MPa (about 0.1 MPa to about 0.29 MPa).
 以下、本発明の実施形態について図面を参照しながら説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.
 (実施形態1)
 図4は、本発明の実施形態1による微細気泡発生装置1000を説明するための図であり、図4(a)は、この微細気泡発生装置の外観を示す側面図であり、図4(b)は、図4(a)に示す微細気泡発生装置の縦断面図である。
(Embodiment 1)
4A and 4B are views for explaining the fine bubble generator 1000 according to the first embodiment of the present invention, and FIG. 4A is a side view showing the appearance of the fine bubble generator and FIG. 4B. ) Is a vertical sectional view of the fine bubble generator shown in FIG. 4 (a).
 この実施形態1の微細気泡発生装置1000は、導入された液体L(例えば、水)に気体G(例えば、空気)を混入して気泡を含む液体(気液)を生成し、生成された気液の気
 泡を微細化して微細気泡を生成する微細気泡発生装置である。この実施形態では、液体は、例えば、水とし、気体は、例えば、空気としているが、本発明はこれに限定されず、液体および気体は任意であり得る。例えば、液体はアルコールでもよいし、気体は炭酸ガスでもよい。
The fine bubble generator 1000 of the first embodiment mixes a gas G (for example, air) with the introduced liquid L (for example, water) to generate a liquid (gas and liquid) containing bubbles, and the generated air. It is a fine bubble generator that creates fine bubbles by refining the bubbles of the liquid. In this embodiment, the liquid is, for example, water and the gas is, for example, air, but the present invention is not limited thereto, and liquids and gases can be arbitrary. For example, the liquid may be alcohol and the gas may be carbon dioxide.
 この微細気泡発生装置1000は、液体Lと気体Gとを混合して気液GLの旋回流を生成する気液生成部100aと、生成された気液GLの旋回流を吐出する気液吐出部13と、吐出された気液GLの旋回流を乱すことにより気液GLに含まれる気泡を微細化する気泡微細化部(乱流発生部)100bと、気液GLを装置外部に排出する気液排出部100cとを備えている。 The fine bubble generator 1000 has a gas-liquid generation unit 100a that mixes the liquid L and the gas G to generate a swirling flow of the gas-liquid GL, and a gas-liquid discharge unit that discharges the swirling flow of the generated gas-liquid GL. 13, a bubble miniaturization unit (turbulent flow generation unit) 100b that miniaturizes bubbles contained in the gas-liquid GL by disturbing the swirling flow of the discharged gas-liquid GL, and a gas that discharges the gas-liquid GL to the outside of the device. It is provided with a liquid discharge unit 100c.
 ここで、気液生成部100aは架台100d上に設けられ、気液生成部100a上には気液吐出部13を介して気泡微細化部100bが設けられ、さらに、気泡微細化部100b上には気液排出部100cが設けられている。気泡微細化部100bと気液生成部100aとの間には、気泡微細化部100bの内腔Cを形成する周壁14が設けられ、気泡微細化部100bの内腔Cには、気泡微細化部100bを構成するバッフル板11、および気液吐出部13としての気液吐出ノズルが配置されており、気泡微細化部100bの内腔Cとバッフル板11との間に隙間Sが形成されている。 Here, the gas / liquid generation unit 100a is provided on the gantry 100d, the bubble miniaturization unit 100b is provided on the gas / liquid generation unit 100a via the gas / liquid discharge unit 13, and further, the bubble miniaturization unit 100b is provided. Is provided with a gas / liquid discharge unit 100c. A peripheral wall 14 forming the cavity C of the bubble miniaturization unit 100b is provided between the bubble miniaturization unit 100b and the gas / liquid generation unit 100a, and the air bubble miniaturization unit 100b has a bubble miniaturization unit 100b. The baffle plate 11 constituting the portion 100b and the gas / liquid discharge nozzle as the gas / liquid discharge portion 13 are arranged, and a gap S is formed between the cavity C of the bubble miniaturization portion 100b and the baffle plate 11. There is.
 なお、架台100dは、気液生成部100aを支持する支持フランジ101と、支持フランジ101から下方に延びる架台脚部21とを有している。支持フランジ101には液体導入継手10aが取り付けられ、液体導入継手10aには水道栓2b1が設けられた水道管2bが接続され、気液生成部100aには水道管から液体である水が供給されるようになっている。なお、液体導入継手10aにはポンプ3を取り付けた配管2(図2A参照)を接続し、気液生成部100aには液体貯留部4からポンプ3で液体を吸い上げて気液生成部100aに圧送するようにしてもよい。なお、支持フランジ101には架台脚部21を挿入するための挿入孔101aが形成されている(図6参照)。 The gantry 100d has a support flange 101 that supports the gas-liquid generation portion 100a, and a gantry leg portion 21 that extends downward from the support flange 101. A liquid introduction joint 10a is attached to the support flange 101, a water pipe 2b provided with a water tap 2b1 is connected to the liquid introduction joint 10a, and liquid water is supplied to the gas / liquid generation unit 100a from the water pipe. It has become so. A pipe 2 (see FIG. 2A) to which the pump 3 is attached is connected to the liquid introduction joint 10a, and the liquid is sucked up from the liquid storage unit 4 by the pump 3 to the gas-liquid generation unit 100a and pumped to the gas-liquid generation unit 100a. You may try to do it. The support flange 101 is formed with an insertion hole 101a for inserting the gantry leg portion 21 (see FIG. 6).
 まず、この微細気泡発生装置1000の特徴部分であるバッフル板115を含む気泡微細化部100bを具体的に説明する。 First, the bubble miniaturization unit 100b including the baffle plate 115, which is a characteristic portion of the fine bubble generator 1000, will be specifically described.
 図5は、図4に示す微細気泡発生装置1000におけるバッフル板115を含む気泡微細化部100bを説明するための斜視図であり、図5(a)は、気泡微細化部100bの外観を示し、図5(b)は、気泡微細化部100bを複数の部品に分解して示す。 5A and 5B are perspective views for explaining the bubble miniaturization section 100b including the baffle plate 115 in the fine bubble generator 1000 shown in FIG. 4, and FIG. 5A shows the appearance of the bubble miniaturization section 100b. , FIG. 5B shows the bubble miniaturization portion 100b decomposed into a plurality of parts.
 気泡微細化部100bは、気液吐出ノズル13から吐出される気液GLの旋回流の吐出量により気液吐出ノズル13の吐出口13bに対して近接あるいは離反するように移動可能に設けられたバッフル板115と、バッフル板115が一定範囲以上に移動しないようにバッフル板115を支持するバッフル板支持体12とを有する。 The bubble miniaturization unit 100b is provided so as to be movable so as to be close to or away from the discharge port 13b of the gas / liquid discharge nozzle 13 depending on the discharge amount of the swirling flow of the gas / liquid GL discharged from the gas / liquid discharge nozzle 13. It has a baffle plate 115 and a baffle plate support 12 that supports the baffle plate 115 so that the baffle plate 115 does not move beyond a certain range.
 ここで、気液吐出ノズル13は、気液生成部100aで生成された気液GLの旋回流を吐出する気液吐出部である。気泡微細化部100bでは、気液生成部100aと気液排出部100cとの間の空間を密閉する周壁14により気泡微細化部100bの内腔Cが形成されており、内腔Cとバッフル板11との間には隙間Sが形成されている。バッフル板115は、円板形状を有し、その中心に形成された第1の貫通孔(中心貫通孔)115aと、中心周りに形成された8個の第2の貫通孔(中心周り貫通孔)115bとを有する。 Here, the gas / liquid discharge nozzle 13 is a gas / liquid discharge unit that discharges a swirling flow of the gas / liquid GL generated by the gas / liquid generation unit 100a. In the bubble miniaturization section 100b, the lumen C of the bubble miniaturization section 100b is formed by the peripheral wall 14 that seals the space between the gas solution generation section 100a and the gas solution discharge section 100c, and the lumen C and the baffle plate are formed. A gap S is formed between the 11th and the 11th. The baffle plate 115 has a disk shape, and has a first through hole (center through hole) 115a formed in the center thereof and eight second through holes (through holes around the center) formed around the center. ) 115b.
 第1の貫通孔115aは、バッフル板支持体12を構成する気体吐出ノズルの先端部(すなわち、バッフル板支持体の軸部)12aが挿入される貫通孔である(図1、図5参照)。バッフル板支持体12を構成する気体吐出ノズルの先端部12aがバッフル板115
の中心貫通孔115aに挿入されることにより、バッフル板115の中心がバッフル板支持体12の中心軸A(図1参照)から所定距離以上離れないようにバッフル板115の移動範囲が規制される。この場合、バッフル板115は、気液吐出部13から吐出される気液の流量によって気体吐出ノズル12の中心軸Aの方向に移動可能である。
The first through hole 115a is a through hole into which the tip end portion (that is, the shaft portion of the baffle plate support) 12a of the gas discharge nozzle constituting the baffle plate support 12 is inserted (see FIGS. 1 and 5). .. The tip portion 12a of the gas discharge nozzle constituting the baffle plate support 12 is the baffle plate 115.
By being inserted into the center through hole 115a of the baffle plate 115, the movement range of the baffle plate 115 is restricted so that the center of the baffle plate 115 is not separated from the central axis A (see FIG. 1) of the baffle plate support 12 by a predetermined distance or more. .. In this case, the baffle plate 115 can move in the direction of the central axis A of the gas discharge nozzle 12 depending on the flow rate of the gas and liquid discharged from the gas and liquid discharge unit 13.
 また、バッフル板115の中心周りに位置する8個の第2の貫通孔115bは、正八角形の頂点に位置する貫通孔であり、これらの中心周り貫通孔115bは、気液吐出ノズル13の先端の気液吐出口13bから吐出されてバッフル板115の周縁を越えて(すなわち、気泡微細化部100bの内腔Cとバッフル板11との間の隙間Sを流れて)気液排出部100cに向かう気液GLの旋回流の一部を気液吐出ノズル13側に戻す還流経路を形成する貫通孔である。気液GLの旋回流の一部は中心周り貫通孔115bを通って気液吐出ノズル13の吐出口13b側に戻ることにより、気液吐出ノズル13に近づいたり離れたりするバッフル板11の往復運動によって旋回流の一部は再度攪乱されて内部の気泡がさらに微細化される。 Further, the eight second through holes 115b located around the center of the baffle plate 115 are through holes located at the apex of the regular octagon, and these through holes around the center 115b are the tips of the gas / liquid discharge nozzle 13. Is discharged from the air-liquid discharge port 13b of the above, beyond the peripheral edge of the baffle plate 115 (that is, flows through the gap S between the cavity C of the bubble micronizing unit 100b and the baffle plate 11) and into the air-liquid discharge unit 100c. It is a through hole forming a return path for returning a part of the swirling flow of the gas-liquid GL to the gas-liquid discharge nozzle 13 side. A part of the swirling flow of the gas-liquid GL returns to the discharge port 13b side of the gas-liquid discharge nozzle 13 through the through hole 115b around the center, so that the reciprocating motion of the baffle plate 11 moves toward and away from the gas-liquid discharge nozzle 13. Part of the reciprocating flow is disturbed again and the bubbles inside are further refined.
 バッフル板115の材質は任意の材質であり得る。例えば、プラスチックであってもよいし、アルミ、鉄、ステンレスなどの金属であってもよい。 The material of the baffle plate 115 can be any material. For example, it may be plastic or a metal such as aluminum, iron, or stainless steel.
 バッフル板115の厚さおよび重さは、求められる気液GLの吐出量や微細気泡の大きさなどにより任意の厚さおよび重さに調整し得る。一般的には、厚さを薄くしたり軽い材料を用いたりしてバッフル板115の重さを軽くすれば、バッフル板115の往復運動が速くなるため、気液GLに含まれる気泡の微細化および混合する能力を高くできる。例えば、1つの具体的な実施形態においては、気液吐出ノズル13からの気液GLの吐出量が約300L/minの条件に対して、バッフル板115の厚さを約5mm、重さを約400gとしているが、本発明はこれに限定されない。 The thickness and weight of the baffle plate 115 can be adjusted to any thickness and weight depending on the required discharge amount of gas and liquid GL, the size of fine bubbles, and the like. Generally, if the weight of the baffle plate 115 is reduced by reducing the thickness or using a light material, the reciprocating motion of the baffle plate 115 becomes faster, so that the bubbles contained in the gas-liquid GL are made finer. And the ability to mix can be increased. For example, in one specific embodiment, the thickness of the baffle plate 115 is about 5 mm and the weight is about 5 mm under the condition that the discharge amount of the gas / liquid GL from the gas / liquid discharge nozzle 13 is about 300 L / min. Although it is set to 400 g, the present invention is not limited to this.
 なお、実施形態1の微細気泡発生装置1000は陸上に設置されるものであり、気液生成部100aと気液排出部100cとの間に位置する気泡微細化部(乱流発生部)100bが密封空間内に収容されるように、気液生成部100aと気液排出部100cとの間の空間が周壁14(図4参照)により密閉されている。この周壁14により、気泡微細化部100bの内腔Cとバッフル板115との間に気液を流す隙間Sが形成されている。ただし、微細気泡発生装置1000を水中で使用する場合は、気液排出部100cおよび周壁14は不要であり、微細気泡発生装置1000は、気液排出部100cおよび周壁14の代わりに気体吐出ノズル(バッフル板規制体)12を支持するロッドあるいはアームなどの支持フレームを有するものであればよい。この場合、気泡微細化部100bの内腔Cとバッフル板11との隙間Sに相当する、気液を流す領域は、バッフル板115の外縁よりも外側の領域を囲むようにバッフル板115の周囲に予め存在する液体と、バッフル板11とにより形成されることとなる。 The fine bubble generating device 1000 of the first embodiment is installed on land, and the bubble micronizing section (turbulent flow generating section) 100b located between the gas / liquid generating section 100a and the gas / liquid discharging section 100c is provided. The space between the air-liquid generation unit 100a and the air-liquid discharge unit 100c is sealed by a peripheral wall 14 (see FIG. 4) so as to be accommodated in the sealed space. The peripheral wall 14 forms a gap S through which air and liquid flow between the lumen C of the bubble miniaturization portion 100b and the baffle plate 115. However, when the fine bubble generator 1000 is used in water, the gas liquid discharge unit 100c and the peripheral wall 14 are unnecessary, and the fine bubble generator 1000 uses a gas discharge nozzle (instead of the gas liquid discharge unit 100c and the peripheral wall 14). It may have a support frame such as a rod or an arm that supports the baffle plate regulator) 12. In this case, the region through which the gas and liquid flow, which corresponds to the gap S between the lumen C of the bubble miniaturization portion 100b and the baffle plate 11, is around the baffle plate 115 so as to surround the region outside the outer edge of the baffle plate 115. It will be formed by the liquid pre-existing in the lumen and the baffle plate 11.
 次に、実施形態1の微細気泡発生装置1000の各部の構造を図4~図6を参照してより具体的に説明する。 Next, the structure of each part of the fine bubble generator 1000 of the first embodiment will be described more specifically with reference to FIGS. 4 to 6.
 図6は、図4に示す微細気泡発生装置1000を構成する部品を説明するための図であり、図4(b)に示す微細気泡発生装置を複数の部品に分解して示す縦断面図である。 FIG. 6 is a diagram for explaining the parts constituting the fine bubble generator 1000 shown in FIG. 4, and is a vertical cross-sectional view showing the fine bubble generator shown in FIG. 4 (b) disassembled into a plurality of parts. be.
 〔気液生成部100a〕
 気液生成部100aは、水道配2bから液体導入継手10aを介して導入された液体(水)Lを旋回させることにより液体Lの旋回流を生成する旋回流発生部110と、生成された液体Lの旋回流の旋回速度を高める旋回流発達部120と、液体Lの旋回流の旋回速度を加速的に高める旋回流加速部130とを有する。
[Gas and liquid generation unit 100a]
The gas / liquid generation unit 100a includes a swirling flow generating unit 110 that generates a swirling flow of the liquid L by swirling the liquid (water) L introduced from the water distribution 2b via the liquid introduction joint 10a, and the generated liquid. It has a swirling flow development unit 120 that increases the swirling speed of the swirling flow of L, and a swirling flow accelerating unit 130 that accelerates the swirling speed of the swirling flow of the liquid L.
 旋回流発生部110は、液体Lに旋回力を与える旋回ガイド羽根110aと、旋回ガイド羽根110aを支持する羽根支持体110bとを有する。旋回流発生部110は、支持フランジ101上に配置されている(図4参照)。 The swirling flow generating unit 110 has a swirling guide blade 110a that applies a swirling force to the liquid L, and a blade support 110b that supports the swirling guide blade 110a. The swirl flow generating portion 110 is arranged on the support flange 101 (see FIG. 4).
 旋回流発達部120は、内部を液体Lが流れる外側円筒体122と、外側円筒体122の上流側端に固定された上流側フランジ102と、外側円筒体122の下流側端に固定された下流側フランジ103と、外側円筒体122の内側に収容された内側円筒体121とを有する。 The swirling flow development portion 120 includes an outer cylinder 122 through which the liquid L flows, an upstream flange 102 fixed to the upstream end of the outer cylinder 122, and a downstream fixed to the downstream end of the outer cylinder 122. It has a side flange 103 and an inner cylinder 121 housed inside the outer cylinder 122.
 ここで、上流側フランジ102の中央には液体の通路としての開口102aが形成され、上流側フランジ102の周縁部には架台脚部21を挿入する挿入孔102bが形成されている。下流側フランジ103の中央にも液体の通路としての開口103aが形成され、下流側フランジ103の周縁部には固定支柱22を挿入する挿入孔103bが形成されている。 Here, an opening 102a as a liquid passage is formed in the center of the upstream flange 102, and an insertion hole 102b for inserting the gantry leg 21 is formed in the peripheral edge of the upstream flange 102. An opening 103a as a liquid passage is also formed in the center of the downstream flange 103, and an insertion hole 103b for inserting the fixed support 22 is formed at the peripheral edge of the downstream flange 103.
 内側円筒体121の下流側端は下流側フランジ103に固定されており、内側円筒体121の上流側端には、旋回流発生部110の羽根支持体110bが固定されている。内側円筒体121と外側円筒体122とはこれらの間に、旋回流発生部110で生成された液体Lの旋回流が流れ込む流路が形成されるように所定の間隔を空けて配置されており、内側円筒体121の側壁には、内側円筒体121と外側円筒体122との間を流れる液体Lを内側円筒体121の内部に流入させるための側壁開口121aが形成されている。側壁開口121aには、内側円筒体121の内部に流入する液体Lの旋回流の旋回方向が反転するようにフィンなどのガイド部材(図示せず)が取り付けられている。 The downstream end of the inner cylinder 121 is fixed to the downstream flange 103, and the blade support 110b of the swirling flow generating portion 110 is fixed to the upstream end of the inner cylinder 121. The inner cylinder 121 and the outer cylinder 122 are arranged at a predetermined interval so as to form a flow path between them so that a flow path through which the swirling flow of the liquid L generated by the swirling flow generating portion 110 flows can be formed. On the side wall of the inner cylinder 121, a side wall opening 121a for allowing the liquid L flowing between the inner cylinder 121 and the outer cylinder 122 to flow into the inside of the inner cylinder 121 is formed. A guide member (not shown) such as a fin is attached to the side wall opening 121a so that the swirling direction of the swirling flow of the liquid L flowing into the inside of the inner cylindrical body 121 is reversed.
 このような構造の旋回流発達部120では、内側円筒体121と外側円筒体122との間を流れる液体Lが内側円筒体121内に流れ込むことにより旋回半径が小さくなって旋回速度が増大するとともに、旋回方向が反転することにより旋回流が攪乱される。また、内側円筒体121内には、気体吐出ノズル12から気体Gが導入されるので、内側円筒体121内での液体Lの旋回速度の増大および旋回流の攪乱が液体Lと気体Gとの混合を促進することとなる。 In the swirling flow developing portion 120 having such a structure, the liquid L flowing between the inner cylindrical body 121 and the outer cylindrical body 122 flows into the inner cylindrical body 121, so that the swirling radius becomes smaller and the swirling speed increases. , The swirling flow is disturbed by reversing the swirling direction. Further, since the gas G is introduced into the inner cylinder 121 from the gas discharge nozzle 12, the increase in the swirling speed of the liquid L and the disturbance of the swirling flow in the inner cylinder 121 cause the liquid L and the gas G to be disturbed. It will promote mixing.
 なお、上流側フランジ102は、一対のナット21a、21bにより架台脚部21の上端部分の雄ネジ部分に支持フランジ101とともに固定されている。 The upstream flange 102 is fixed to the male screw portion of the upper end portion of the gantry leg portion 21 together with the support flange 101 by a pair of nuts 21a and 21b.
 旋回流加速部130は、旋回流発達部120からの気液GLの速度を加速的に増大させる部分であり、気液吐出ノズル13のうちの円錐台形状のスペース13aを含む部分により構成されている。この旋回流加速部130では、旋回流発達部120からの気液GLの旋回流が円錐台形状のスペース13aで旋回半径を徐々に小さくしながら気液吐出口13bに向かう。気液吐出ノズル13は、部品保持フランジ104により保持されており、部品保持フランジ104は、固定支柱22と、固定支柱の下端の雄ネジ部に螺合するナット22bとにより、下流側フランジ103に固定されている。なお、下流側フランジ103および部品保持フランジ104にはそれぞれ固定支柱22を挿入するための挿入孔103bおよび104bが形成されており、下流側フランジ103には気液GLの通路としての開口103aが形成され、部品保持フランジ104には気液吐出ノズル13を収容するための開口104aが形成されている。 The swirl flow acceleration unit 130 is a portion that accelerates the velocity of the gas / liquid GL from the swirl flow development unit 120, and is composed of a portion of the gas / liquid discharge nozzle 13 including a truncated cone-shaped space 13a. There is. In the swirling flow accelerating unit 130, the swirling flow of the gas and liquid GL from the swirling flow developing unit 120 heads toward the gas and liquid discharge port 13b while gradually reducing the swirling radius in the truncated cone-shaped space 13a. The gas / liquid discharge nozzle 13 is held by the component holding flange 104, and the component holding flange 104 is attached to the downstream flange 103 by the fixed strut 22 and the nut 22b screwed into the male screw portion at the lower end of the fixed strut. It is fixed. The downstream flange 103 and the component holding flange 104 are formed with insertion holes 103b and 104b for inserting the fixed columns 22, respectively, and the downstream flange 103 is formed with an opening 103a as a passage for gas and liquid GL. The component holding flange 104 is formed with an opening 104a for accommodating the gas / liquid discharge nozzle 13.
 なお、気液生成部100aを構成する気液吐出ノズル13、円筒体121、122、フランジ101~104、固定支柱22などの部品の構成材料は、限定されるものではなく、鉄、ステンレスなどの金属でもよいし、アクリル、塩化ビニールなどの樹脂でもよい。 The constituent materials of parts such as the gas / liquid discharge nozzle 13, the cylindrical bodies 121, 122, the flanges 101 to 104, and the fixed support column 22 constituting the gas / liquid generation unit 100a are not limited, and the constituent materials are not limited to iron, stainless steel, and the like. It may be a metal or a resin such as acrylic or vinyl chloride.
 〔気泡微細化部100b〕
 気泡微細化部100bは、気液吐出ノズル13の吐出口13bと、吐出口13bからの気液GLの旋回流の吐出量により吐出口13bに近接および離反するように移動可能に設けられたバッフル板115と、バッフル板115が一定範囲以上に移動しないようにバッフル板115を支持するバッフル板支持体12と、バッフル板115および気液吐出ノズル13の吐出口13bが密閉された領域内に配置されるように、部品保持フランジ104と部品取付フランジ105との間に設けられた円筒状部材14とを有する。この円筒状部材14は、気液生成部100aと気液排出部100cとの間におけるバッフル板115が配置される密閉空間(気泡微細化部100bの内腔C)を形成する周壁となっている。
[Bubble miniaturization unit 100b]
The bubble miniaturization unit 100b is provided so as to be movable toward and away from the discharge port 13b of the gas / liquid discharge nozzle 13 and the discharge amount of the swirling flow of the gas / liquid GL from the discharge port 13b. The plate 115, the baffle plate support 12 that supports the baffle plate 115 so that the baffle plate 115 does not move beyond a certain range, and the discharge port 13b of the baffle plate 115 and the gas / liquid discharge nozzle 13 are arranged in a sealed area. As such, it has a cylindrical member 14 provided between the component holding flange 104 and the component mounting flange 105. The cylindrical member 14 is a peripheral wall forming a closed space (inner cavity C of the bubble miniaturization portion 100b) in which the baffle plate 115 is arranged between the gas / liquid generation portion 100a and the gas / liquid discharge portion 100c. ..
 この気泡微細化部100bでは、バッフル板115の第1の貫通孔(中心貫通孔11a)115aに気体吐出ノズル12の先端部(バッフル板支持体12の軸部12a)が挿入されることにより、バッフル板115が気液吐出ノズル13の吐出口13bの上の位置からずれないように、すなわち、バッフル板115の中心が気体吐出ノズル12の中心軸A(図1参照)から所定距離以上離れないように、バッフル板115の移動が規制される。 In the bubble miniaturization portion 100b, the tip end portion (shaft portion 12a of the baffle plate support 12) of the gas discharge nozzle 12 is inserted into the first through hole (center through hole 11a) 115a of the baffle plate 115. The baffle plate 115 is not displaced from the position above the discharge port 13b of the gas / liquid discharge nozzle 13, that is, the center of the baffle plate 115 is not separated from the central axis A (see FIG. 1) of the gas discharge nozzle 12 by a predetermined distance or more. As such, the movement of the baffle plate 115 is restricted.
 ここで、円筒状部材(周壁)14は、その一端が部品保持フランジ104に密着し、その他端が部品取付フランジ105に密着するように、固定支柱22とその先端のネジ部に螺合するナット22aとにより、これらの2つのフランジの間に固定されている。 Here, the cylindrical member (peripheral wall) 14 has a nut that is screwed into the fixing column 22 and the threaded portion at the tip thereof so that one end thereof is in close contact with the component holding flange 104 and the other end is in close contact with the component mounting flange 105. It is fixed between these two flanges by 22a.
 気泡微細化部100bでは、気液生成部100aの気液吐出ノズル13から吐出された気液GLの旋回流がバッフル板115の往復運動によって乱されることにより気液GLに含まれる気泡が微細化される。さらに、気液吐出ノズル13先端の気液吐出口13bから吐出されてバッフル板115の周縁を越えて(すなわち、気泡微細化部100bの内腔Cとバッフル板115との隙間Sを流れて)気液排出部100cに向かう気液GLの旋回流の一部は、バッフル板115の第2の貫通孔(中心周り貫通孔11b)115bを介して気液吐出口13b側に戻ることにより、再度バッフル板115により攪乱されることとなる。これにより気泡微細化部100bでは、気液生成部100aで生成された気液GLに含まれる気泡が効果的に微細化される。 In the bubble miniaturization unit 100b, the swirling flow of the gas-liquid GL discharged from the gas-liquid discharge nozzle 13 of the gas-liquid generation unit 100a is disturbed by the reciprocating motion of the baffle plate 115, so that the bubbles contained in the gas-liquid GL are fine. Will be made. Further, it is discharged from the gas / liquid discharge port 13b at the tip of the air / liquid discharge nozzle 13 and exceeds the peripheral edge of the baffle plate 115 (that is, flows through the gap S between the lumen C of the bubble miniaturization portion 100b and the baffle plate 115). A part of the swirling flow of the gas-liquid GL toward the gas-liquid discharge portion 100c returns to the gas-liquid discharge port 13b side again through the second through hole (through hole 11b around the center) 115b of the baffle plate 115. It will be disturbed by the baffle plate 115. As a result, in the bubble miniaturization section 100b, the bubbles contained in the gas-liquid GL generated by the gas-liquid generation section 100a are effectively miniaturized.
 なお、気泡微細化部100bを構成するバッフル板115、気体吐出ノズル12、円筒状部材14、フランジ105などの部品の構成材料は、限定されるものではなく、鉄、ステンレスなどの金属でもよいし、アクリル、塩化ビニールなどの樹脂でもよい。 The constituent materials of parts such as the baffle plate 115, the gas discharge nozzle 12, the cylindrical member 14, and the flange 105 constituting the bubble micronizing portion 100b are not limited, and may be a metal such as iron or stainless steel. , Acrylic, vinyl chloride and other resins may be used.
 〔気液排出部100c〕
 気液排出部100cは、気泡微細化部100bで微細化された微細気泡を含む気液GLを微細気泡発生装置1000の外部に排出する気液排出ヘッド150と、気液排出ヘッド150が取り付けられる部品取付フランジ105とを有する。
[Air / liquid discharge unit 100c]
The gas / liquid discharge unit 100c is attached with a gas / liquid discharge head 150 for discharging the gas / liquid GL containing the fine bubbles refined by the bubble micronization unit 100b to the outside of the fine bubble generator 1000, and a gas / liquid discharge head 150. It has a component mounting flange 105.
 部品取付フランジ105には固定支柱22を挿入する挿入孔105bが形成されており、部品取付フランジ105は、ナット22aにより、部品固定フランジ103に固定された固定支柱22に取付られている。 The component mounting flange 105 is formed with an insertion hole 105b for inserting the fixed support column 22, and the component mounting flange 105 is attached to the fixed column 22 fixed to the component fixing flange 103 by a nut 22a.
 また、部品取付フランジ105の中央部にはネジ穴105aが形成されており、気液排出ヘッド150の一端には雄ネジ部150aが形成されており、気液排出ヘッド150は、気液排出ヘッド150の一端の雄ネジ部150aが部品取付フランジ105の中央部のネジ穴105aに螺合することにより部品取付フランジ105に固定されている。 Further, a screw hole 105a is formed in the central portion of the component mounting flange 105, a male screw portion 150a is formed at one end of the gas / liquid discharge head 150, and the gas / liquid discharge head 150 is a gas / liquid discharge head. The male screw portion 150a at one end of the 150 is fixed to the component mounting flange 105 by screwing into the screw hole 105a at the center of the component mounting flange 105.
 この気液排出ヘッド150は、鉄、ステンレスなどの金属製あるいはアクリル、塩化ビニールなどの樹脂製の円柱体で構成されている。この円柱体の内部には、円柱体の軸方向に沿って気液排出路101cが形成され、気液生成部100aの気液吐出ノズル13から吐出された気液GLが気液排出ヘッド150の気液排出路101cを通って外部に排出されるようになっている。また、気液排出ヘッド150を構成する円柱体の外周面には気体導入口102cが形成され、円柱体のうちのバッフル板115側の端面には気体Gを吐出する気体吐出ノズル12が取り付けられており、気体吐出ノズル12の先端の開口(先端開口)12aは、図5(b)に示すように、気体導入路103cを介して気体導入口102cにつながっている。 The gas-liquid discharge head 150 is made of a cylinder made of metal such as iron or stainless steel or resin such as acrylic or vinyl chloride. A gas-liquid discharge path 101c is formed inside the cylinder along the axial direction of the cylinder, and the gas-liquid GL discharged from the gas-liquid discharge nozzle 13 of the gas-liquid generation unit 100a is the gas-liquid discharge head 150. It is designed to be discharged to the outside through the gas / liquid discharge path 101c. Further, a gas introduction port 102c is formed on the outer peripheral surface of the columnar body constituting the gas-liquid discharge head 150, and a gas discharge nozzle 12 for discharging gas G is attached to the end surface of the columnar body on the baffle plate 115 side. The opening (tip opening) 12a at the tip of the gas discharge nozzle 12 is connected to the gas introduction port 102c via the gas introduction path 103c, as shown in FIG. 5 (b).
 このような構造の気液排出ヘッド150では、気体導入口102cにポンプなどで圧送された気体Gは、気液排出ヘッド150の気体導入路103cを介して気体吐出ノズル12の先端開口102a(図5(b)参照)から吐出し、気液生成部100aの旋回流加速部130から旋回流発達部120に跨る領域に導入され、液体Lの旋回流に混入されることとなる。 In the gas / liquid discharge head 150 having such a structure, the gas G pumped to the gas introduction port 102c by a pump or the like is sent to the tip opening 102a of the gas discharge nozzle 12 via the gas introduction path 103c of the gas / liquid discharge head 150 (FIG. (Refer to 5 (b)), the gas is discharged from the swirling flow accelerating section 130 of the gas-liquid generating section 100a and introduced into the region straddling the swirling flow developing section 120, and is mixed into the swirling flow of the liquid L.
 次に、実施形態1の微細気泡発生装置1000の動作を説明する。 Next, the operation of the fine bubble generator 1000 of the first embodiment will be described.
 図7は、図4に示す微細気泡発生装置1000の動作を説明するための縦断面図であり、気泡微細化部100bにおけるバッフル板115の近傍部分での気液GLの流れを示す。 FIG. 7 is a vertical cross-sectional view for explaining the operation of the fine bubble generator 1000 shown in FIG. 4, and shows the flow of gas-liquid GL in the vicinity of the baffle plate 115 in the bubble miniaturization section 100b.
 本実施形態1の微細気泡発生装置1000では、図2Aに示すように水道配管2bから圧送された液体(水道水)Lが気液生成部100aの旋回流生成部110に供給されると、液体Lは旋回ガイド羽根110aにより旋回力を与えられて液体Lの旋回流が生成され、液体Lの旋回流は旋回流発達部120に導入される。 In the fine bubble generator 1000 of the first embodiment, as shown in FIG. 2A, when the liquid (tap water) L pumped from the water pipe 2b is supplied to the swirling flow generation unit 110 of the gas / liquid generation unit 100a, the liquid is liquid. A swirling force is applied to L by the swirling guide blade 110a to generate a swirling flow of the liquid L, and the swirling flow of the liquid L is introduced into the swirling flow development unit 120.
 旋回流発達部120では、図4(b)に示すように、内側円筒体121と外側円筒体122との間を流れる液体Lが内側円筒体121内に流れ込むことにより旋回半径が小さくなって旋回速度が増大するとともに、旋回方向が反転することにより旋回流が攪乱される。 In the swirling flow developing portion 120, as shown in FIG. 4B, the liquid L flowing between the inner cylindrical body 121 and the outer cylindrical body 122 flows into the inner cylindrical body 121, so that the swirling radius becomes smaller and swirls. As the speed increases, the swirling direction is reversed and the swirling flow is disturbed.
 この状態で、気液排出ヘッド150では、気体導入口102cから導入された気体Gが気体導入路103cを通って気体吐出ノズル12に至り、気体吐出ノズル12の先端開口12aから気液吐出ノズル13の吐出口13aに向けて吐出される。これにより気体Gが気液生成部100aの旋回流加速部130から旋回流発達部120に跨る領域に導入され、気液生成部100aでは、旋回する液体Lに気体Gが混合されて、旋回する気液GLが生成される。 In this state, in the gas / liquid discharge head 150, the gas G introduced from the gas introduction port 102c reaches the gas discharge nozzle 12 through the gas introduction path 103c, and the gas / liquid discharge nozzle 13 is reached from the tip opening 12a of the gas discharge nozzle 12. Is discharged toward the discharge port 13a. As a result, the gas G is introduced into the region extending from the swirling flow acceleration unit 130 of the gas-liquid generation unit 100a to the region straddling the swirling flow development unit 120, and in the gas-liquid generation unit 100a, the gas G is mixed with the swirling liquid L and swirls. Gas-liquid GL is produced.
 そして、旋回流加速部130では、図7に示すように、気液GLの旋回流が気液吐出ノズル13の円錐台形状のスペース13aで旋回半径を徐々に小さくしながら気液吐出口13bに至り、気液GLの旋回流は気液吐出口13bからバッフル板115に向けて吐出される。 Then, in the swirling flow accelerating unit 130, as shown in FIG. 7, the swirling flow of the gas / liquid GL reaches the gas / liquid discharge port 13b while gradually reducing the swirling radius in the truncated cone-shaped space 13a of the gas / liquid discharge nozzle 13. Therefore, the swirling flow of the gas-liquid GL is discharged from the gas-liquid discharge port 13b toward the baffle plate 115.
 バッフル板115は、気液GLの旋回流の吐出量に応じて気液吐出口13bに近づいたり離れたりする往復運動を繰り返すこととなる。これにより、気液吐出口13bから吐出される気液GLの旋回流の吐出量のピークが繰り返されることとなり、またこのようなバッフル板115の往復運動により気液GLが攪拌されることにより、気液GLに含まれる気泡が微細化される。 The baffle plate 115 repeats a reciprocating motion of approaching and moving away from the gas / liquid discharge port 13b according to the discharge amount of the swirling flow of the gas / liquid GL. As a result, the peak of the discharge amount of the swirling flow of the gas-liquid GL discharged from the gas-liquid discharge port 13b is repeated, and the gas-liquid GL is agitated by the reciprocating motion of the baffle plate 115. Bubbles contained in the gas-liquid GL are made finer.
 さらに、このとき、気液吐出口13bから吐出されてバッフル板115の周縁を越えて(すなわち、気泡微細化部100bの内腔Cとバッフル板115との隙間Sを流れて)気液排出部100cに向かう気液GLの旋回流の一部GL2がバッフル板115の中心周り貫通孔11bを通って気液吐出ノズル13側に戻る。これにより、気液吐出ノズル13に近づいたり離れたりするバッフル板11の往復運動によって気液GLの旋回流の一部GL2は再度攪乱されて内部の気泡がさらに微細化される。気液吐出口13bから吐出されてバッフル板115の周縁を越えて気液排出部100cに向かう気液GLの旋回流の他の一部GL1は、気液排出ヘッド150の気液排出路101cに入る。 Further, at this time, the gas / liquid discharge portion is discharged from the gas / liquid discharge port 13b and exceeds the peripheral edge of the baffle plate 115 (that is, flows through the gap S between the lumen C of the bubble miniaturization portion 100b and the baffle plate 115). A part of the swirling flow of the gas-liquid GL toward 100c, GL2, passes through the through hole 11b around the center of the baffle plate 115 and returns to the gas-liquid discharge nozzle 13 side. As a result, a part of the swirling flow of the gas-liquid GL, GL2, is disturbed again by the reciprocating motion of the baffle plate 11 that moves toward and away from the gas-liquid discharge nozzle 13, and the bubbles inside are further refined. The other part of the swirling flow of the gas-liquid GL, which is discharged from the gas-liquid discharge port 13b and goes over the peripheral edge of the baffle plate 115 toward the gas-liquid discharge unit 100c, is connected to the gas-liquid discharge path 101c of the gas-liquid discharge head 150. come in.
  このようにして気泡微細化部100bで微細化された気泡を含む気液GLは気液排出ヘッド150の気液排出路101cを通って微細気泡発生装置1000の外部に排出される。 The gas-liquid GL containing the bubbles refined by the bubble micronizing unit 100b in this way is discharged to the outside of the fine bubble generator 1000 through the gas-liquid discharge path 101c of the gas-liquid discharge head 150.
 このように、本実施形態1では、微細気泡を発生する装置1000において、液体Lに気体Gを混合して気液GLの旋回流を生成する気液生成部100aと、気液生成部100aで生成された気液を吐出する気液吐出部13と、気液吐出部13に対して隙間を介して対向するバッフル板115とを備えたので、気液吐出部13から吐出される気液GLの旋回流の吐出量によりバッフル板115が気液吐出部13に近接したり離反したりすることとなり、気液GLの旋回流の吐出量のピークが繰り返されることとなる。これにより、微細気泡を含む気液の吐出量を増大させることができ、その結果、微細気泡の発生効率を向上させることができる。 As described above, in the first embodiment, in the apparatus 1000 that generates fine bubbles, the gas-liquid generation unit 100a and the gas-liquid generation unit 100a that mix the gas G with the liquid L to generate a swirling flow of the gas-liquid GL. Since the gas / liquid discharge unit 13 for discharging the generated air / liquid and the baffle plate 115 facing the gas / liquid discharge unit 13 via a gap are provided, the gas / liquid GL discharged from the gas / liquid discharge unit 13 is provided. The baffle plate 115 moves closer to or separates from the gas / liquid discharge portion 13 depending on the discharge amount of the swirling flow of the gas / liquid GL, and the peak of the discharge amount of the swirling flow of the gas / liquid GL is repeated. As a result, the discharge amount of the gas and liquid containing the fine bubbles can be increased, and as a result, the efficiency of generating the fine bubbles can be improved.
 また、バッフル板115を、中心周りに形成された8個の貫通孔115bを有する構造としたので、気液吐出口13bから吐出されてバッフル板115の周縁を越えて(すなわち、気泡微細化部100bの内腔Cとバッフル板115との隙間Sを流れて)気液排出部100cに向かう気液GLの旋回流の一部が、バッフル板115の中心周り貫通孔11bを通って気液吐出ノズル13側に戻ることとなる。これにより、気液吐出部13から吐出された気液の旋回流の一部は再度バッフル板115により攪乱されて内部の気泡がさらに微細化される。その結果、微細気泡の発生効率をさらに向上させることができる。 Further, since the baffle plate 115 has a structure having eight through holes 115b formed around the center, the baffle plate 115 is discharged from the gas / liquid discharge port 13b and exceeds the peripheral edge of the baffle plate 115 (that is, the bubble miniaturization portion). A part of the swirling flow of the gas-liquid GL toward the gas-liquid discharge portion 100c (flowing through the gap S between the lumen C of the 100b and the baffle plate 115) is discharged through the through hole 11b around the center of the baffle plate 115. It will return to the nozzle 13 side. As a result, a part of the swirling flow of the gas and liquid discharged from the gas and liquid discharge unit 13 is disturbed again by the baffle plate 115, and the bubbles inside are further refined. As a result, the efficiency of generating fine bubbles can be further improved.
 以下、微細気泡のサイズ、単位体積当たりの微細気泡の個数、単位時間当たりの気液の吐出量を、本発明の実施例のバッフル板に中心周りの貫通孔を有する装置で気液を生成した場合と、従来の比較例のバッフル板に中心周りの貫通孔を有さない装置で気液を生成した場合とで対比して説明する。
(実施例1)
 外周φ20mm、中心周りの貫通孔の大きさφ約3mm、中心周りの貫通孔の個数が8個であるバッフル板を備えた本発明の微細気泡を発生する装置に、圧力約0.5MPaの水道水を供給することにより微細気泡を含む気液を発生させた。その結果、非常に微細な気泡を含む気液が大量に発生し、気液全体が白く濁った。また、同じ気体の供給量に対してφ100μm以上の大きな気泡の発生率が、比較例1に比べて少なくなった。
(比較例1)
 中心周りの貫通孔を有さないバッフル板であること以外は、実施例1と同じ構成である微細気泡を発生する装置に、圧力約0.5MPaの水道水を供給することにより微細気泡を含む気液を発生させた。その結果、微細気泡は多少発生するが気液は濁ることは無く、透明であった。
Hereinafter, the size of fine bubbles, the number of fine bubbles per unit volume, and the amount of gas and liquid discharged per unit time are determined by a device having a through hole around the center of the baffle plate of the embodiment of the present invention. The case and the case where the gas and liquid are generated by a device having no through hole around the center in the baffle plate of the conventional comparative example will be described in comparison.
(Example 1)
A device for generating fine bubbles of the present invention equipped with a baffle plate having an outer circumference of φ20 mm, a through hole size of about 3 mm around the center, and eight through holes around the center, and a water supply with a pressure of about 0.5 MPa. By supplying water, gas and liquid containing fine bubbles were generated. As a result, a large amount of gas and liquid containing very fine bubbles was generated, and the entire gas and liquid became cloudy. Further, the generation rate of large bubbles having a diameter of 100 μm or more with respect to the supply amount of the same gas was smaller than that of Comparative Example 1.
(Comparative Example 1)
By supplying tap water having a pressure of about 0.5 MPa to a device that generates fine bubbles having the same configuration as that of the first embodiment except that the baffle plate does not have a through hole around the center, the fine bubbles are contained. Gas and liquid were generated. As a result, although some fine bubbles were generated, the gas and liquid were not turbid and were transparent.
 この結果から、中心周りの貫通孔を有するバッフル板を備えた実施例1の微細気泡を発生する装置を用いることにより、中心周りの貫通孔を有さないバッフル板を備える比較例の微細気泡を発生する装置に比べて、微細気泡を効率よく大量に発生させることができることが確認された。 From this result, by using the device for generating the fine bubbles of Example 1 provided with the baffle plate having the through hole around the center, the fine bubbles of the comparative example provided with the baffle plate having no through hole around the center can be obtained. It was confirmed that a large amount of fine bubbles can be efficiently generated as compared with the device that generates them.
 以上のように、本発明の好ましい実施形態を用いて本発明を例示してきたが、本発明は、この実施形態に限定して解釈されるべきものではない。本発明は、特許請求の範囲によってのみその範囲が解釈されるべきであることが理解される。当業者は、本発明の具体的な好ましい実施形態の記載から、本発明の記載および技術常識に基づいて等価な範囲を実施することができることが理解される。本明細書において引用した文献は、その内容自体が具体的に本明細書に記載されているのと同様にその内容が本明細書に対する参考として援用されるべきであることが理解される。 As described above, the present invention has been exemplified using the preferred embodiment of the present invention, but the present invention should not be construed as being limited to this embodiment. It is understood that the invention should be construed only by the claims. It will be understood by those skilled in the art that from the description of a specific preferred embodiment of the present invention, an equivalent range can be implemented based on the description of the present invention and common general technical knowledge. It is understood that the references cited herein should be incorporated by reference in their content as they are specifically described herein.
 本発明は、微細気泡を発生する装置の分野において、微細気泡の発生効率を向上することができる微細気泡発生装置を得ることができるものとして有用である。 The present invention is useful in the field of a device for generating fine bubbles as a device capable of obtaining a fine bubble generating device capable of improving the efficiency of generating fine bubbles.
 10、100、200、1000 微細気泡発生装置
 11、115 バッフル板
 11a、115a 第1の貫通孔(中心貫通孔)
 11b、115b 第2の貫通孔(中心周り貫通孔)
 12 気体吐出ノズル(バッフル板支持体)
 12a 先端開口
 13 気液吐出部(気液吐出ノズル)
 13a 気液吐出口
 14 周壁(円筒体部材)
 100a 気液生成部
 100b 気泡微細化部(乱流発生部)
 100c 気液排出部
 G 気体
 GL 気液
 L 液体
 S 空間(領域)
10, 100, 200, 1000 Fine bubble generator 11, 115 Baffle plate 11a, 115a First through hole (center through hole)
11b, 115b Second through hole (through hole around the center)
12 Gas discharge nozzle (baffle plate support)
12a Tip opening 13 Gas / liquid discharge part (gas / liquid discharge nozzle)
13a Gas / liquid discharge port 14 Peripheral wall (cylindrical member)
100a Gas-liquid generation part 100b Bubble miniaturization part (turbulent flow generation part)
100c Gas-liquid discharge part G Gas GL Gas-liquid L Liquid S Space (region)

Claims (5)

  1.  微細気泡を発生する装置であって、
     液体に気体を混合して気液の旋回流を生成する気液生成部と、
     前記気液生成部で生成された気液を吐出する気液吐出部と、
     前記気液吐出部から吐出された気液の気泡を微細化する気泡微細化部と
     を備え、
     前記気泡微細化部は、前記気液吐出部に対して隙間を介して対向配置されたバッフル板と、前記バッフル板を支持する軸部を有するバッフル板支持体とを含み、前記気泡微細化部の内腔と前記バッフル板との間に間隙が形成されており、
     前記バッフル板は、中心に位置する中心貫通孔と、中心以外に位置する1以上の貫通孔とを有し、前記中心貫通孔には前記バッフル支持体の前記軸部が挿入されている、微細気泡発生装置。
    A device that generates fine bubbles
    A gas-liquid generator that mixes gas with liquid to generate a swirling flow of gas and liquid,
    A gas / liquid discharge unit that discharges the air / liquid generated in the gas / liquid generation unit,
    It is provided with a bubble miniaturization section for refining the bubbles of the gas solution discharged from the gas / liquid discharge section.
    The bubble miniaturization portion includes a baffle plate arranged so as to face the gas / liquid discharge portion via a gap, and a baffle plate support having a shaft portion that supports the baffle plate. A gap is formed between the lumen of the baffle plate and the baffle plate.
    The baffle plate has a central through hole located at the center and one or more through holes located outside the center, and the shaft portion of the baffle support is inserted into the central through hole. Bubble generator.
  2.  前記バッフル板は、前記気液吐出部から吐出される流量によって前記バッフル板支持体の前記軸方向に移動可能である、請求項1に記載の微細気泡発生装置。 The fine bubble generator according to claim 1, wherein the baffle plate can move in the axial direction of the baffle plate support by a flow rate discharged from the gas / liquid discharge unit.
  3.  前記バッフル板は略円板であり、前記1以上の貫通孔は、前記略円板の中心の周りに配置された複数の貫通孔である、請求項1または2に記載の微細気泡発生装置。 The fine bubble generator according to claim 1 or 2, wherein the baffle plate is a substantially disk, and the one or more through holes are a plurality of through holes arranged around the center of the substantially disk.
  4.  前記1以上の貫通孔の中心は、前記略円板の中心と外周縁との間の中心よりも前記中心側に位置にする、請求項3に記載の微細気泡発生装置。 The fine bubble generator according to claim 3, wherein the center of the one or more through holes is located on the center side of the center between the center of the substantially disk and the outer peripheral edge.
  5.  前記1以上の貫通孔の形状は、略円形である、請求項1~4のいずれか一項に記載の微細気泡発生装置。 The fine bubble generator according to any one of claims 1 to 4, wherein the shape of the one or more through holes is substantially circular.
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