WO2022080359A1 - Wavelength conversion member molding composition, color resist, color filter, method for manufacturing color resist, light emitting device, and method for manufacturing light emitting device - Google Patents

Wavelength conversion member molding composition, color resist, color filter, method for manufacturing color resist, light emitting device, and method for manufacturing light emitting device Download PDF

Info

Publication number
WO2022080359A1
WO2022080359A1 PCT/JP2021/037703 JP2021037703W WO2022080359A1 WO 2022080359 A1 WO2022080359 A1 WO 2022080359A1 JP 2021037703 W JP2021037703 W JP 2021037703W WO 2022080359 A1 WO2022080359 A1 WO 2022080359A1
Authority
WO
WIPO (PCT)
Prior art keywords
composition
compound
less
particles
wavelength conversion
Prior art date
Application number
PCT/JP2021/037703
Other languages
French (fr)
Japanese (ja)
Inventor
考弘 千秋
祐輔 浦岡
裕基 池上
Original Assignee
パナソニックIpマネジメント株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by パナソニックIpマネジメント株式会社 filed Critical パナソニックIpマネジメント株式会社
Priority to JP2022557000A priority Critical patent/JPWO2022080359A1/ja
Publication of WO2022080359A1 publication Critical patent/WO2022080359A1/en

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/85Arrangements for extracting light from the devices
    • H10K50/854Arrangements for extracting light from the devices comprising scattering means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/102Printing inks based on artificial resins containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/32Inkjet printing inks characterised by colouring agents
    • C09D11/322Pigment inks
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/56Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing sulfur
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/88Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing selenium, tellurium or unspecified chalcogen elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional radiating surfaces

Definitions

  • the present disclosure relates to a composition for forming a wavelength conversion member, a color resist, a color filter, a method for manufacturing a color resist, a light emitting device, and a method for manufacturing a light emitting device.
  • the manufacturing method of the device Regarding the manufacturing method of the device.
  • Patent Document 1 describes an ink composition for forming a light conversion layer used in an inkjet method, which comprises luminescent nanocrystal particles, light scattering particles, a photopolymerizable compound and / or a thermosetting resin. It is disclosed that the contained and light-scattering particles contain titanium oxide and the like. As a result, the light is scattered by the light-scattering particles, thereby increasing the wavelength conversion efficiency of the luminescent nanocrystal particles.
  • the inventor blends light-scattering particles in a molding material as in Patent Document 1 to scatter light in the wavelength conversion member for wavelength conversion efficiency. I was conducting research to increase the number of light.
  • the subject of the present disclosure is a wavelength that can be used for manufacturing a wavelength conversion member, can increase the wavelength conversion efficiency of light when the wavelength conversion member is irradiated with light, and does not easily impair storage stability.
  • the composition for forming a wavelength conversion member according to the first aspect of the present disclosure contains a reaction-curable compound (A), a phosphor (B) and light-scattering particles (C).
  • the light-scattering particle (C) includes a core-shell type particle (C0) having a core portion and a shell covering the core portion.
  • the specific gravity of the core portion is 2.0 or less.
  • the refractive index of the shell is 1.9 or more.
  • the composition for forming a wavelength conversion member according to the second aspect of the present disclosure contains a reaction-curable compound (A), a phosphor (B) and light-scattering particles (C).
  • the light scattering particles (C) contain titanium oxide particles (C1) and hollow particles (C2).
  • the color resist according to the present disclosure includes a cured product of the composition for forming a wavelength conversion member according to the first or second aspect.
  • the color filter according to the present disclosure includes the color resist.
  • the wavelength conversion member molding composition is molded by an inkjet method, and then the wavelength conversion member molding composition is irradiated with ultraviolet rays to be cured.
  • the light emitting device includes the color filter and a light source that irradiates the color filter with light.
  • the method for manufacturing a light emitting device is a method for manufacturing a light emitting device including a color filter including a color resist and a light source for irradiating the color filter with light. Manufactured by the method of manufacturing color resist.
  • FIG. 1A is a schematic cross-sectional view of an example of a liquid crystal display device according to an embodiment of the present disclosure
  • FIG. 1B is a schematic cross-sectional view of an example of an LED display device according to the embodiment of the present disclosure.
  • composition (X) contains a reaction-curable compound (A), a fluorescent substance (B), and light-scattering particles (C).
  • the light scattering particle (C) includes a core shell type particle (C0) having a core portion and a shell covering the core portion.
  • the specific gravity of the core portion is 2.0 or less.
  • the refractive index of the shell is 1.9 or more.
  • the refractive index is the refractive index for the sodium D line (wavelength 589.3 nm) at 25 ° C.
  • the light scattering particles (C) contain titanium oxide particles (C1) and hollow particles (C2).
  • a wavelength conversion member that is, an optical component having a wavelength conversion function of light
  • This wavelength conversion member can be applied to, for example, the color resist 1 in the color filter 2 (see FIGS. 1A and 1B). That is, according to the present embodiment, the color filter 2 including the color resist 1 containing the phosphor (B) can be produced.
  • the wavelength conversion member when the wavelength conversion member is irradiated with light, the light scattering particles (C) can scatter the light in the cured product. Therefore, there are many opportunities for light to reach the phosphor (B) in the cured product, and as a result, the efficiency of wavelength conversion is increased. Therefore, the wavelength conversion member can exhibit high wavelength conversion efficiency in comparison with its size.
  • the titanium oxide particles (C1) in particular have high light scattering properties in the resin, the chances of light reaching the phosphor (B) in the cured product increase, and the efficiency of wavelength conversion is increased. It is effective in increasing.
  • the composition (X) contains titanium oxide particles (C1) having a relatively high specific gravity
  • the light scattering particles (C) are generated during storage of the composition (X). It is difficult to settle, that is, the titanium oxide particles (C1) do not easily impair the storage stability of the composition (X). This is because the light-scattering particles (C) contain the hollow particles (C2) together with the titanium oxide particles (C1), and the interaction between the two causes the precipitation of not only the hollow particles (C2) but also the titanium oxide particles (C1). It is presumed that this is because it becomes difficult to do.
  • the wavelength conversion member when the wavelength conversion member is produced using the composition (X), it is preferably molded by an inkjet method.
  • the wavelength conversion member can be manufactured with high position accuracy. Further, for this reason, the wavelength conversion member can be made high-definition, that is, a minute wavelength conversion member can be manufactured at a high density. Therefore, for example, it is possible to realize high definition (high resolution) of the light emitting device 11 provided with the color filter 2, particularly the display device.
  • the composition (X) when the composition (X) is molded by the inkjet method, foreign matter is less likely to be mixed into the composition (X) and its cured product as compared with the case of molding by a printing method involving contact such as a screen printing method. Therefore, the yield in manufacturing the wavelength conversion member is unlikely to deteriorate.
  • the composition (X) may be molded by a method other than the inkjet method such as a screen printing method.
  • the wavelength conversion member can exhibit high wavelength conversion efficiency in comparison with its size, so that high wavelength conversion efficiency can be exhibited even if the thickness of the wavelength conversion member is small.
  • the composition (X) does not contain a solvent, or the content of the solvent (percentage of the solvent to the whole composition (X)) is 1% by mass or less.
  • outgas derived from the solvent is unlikely to be generated from the composition (X) and the cured product of the composition (X). Therefore, the change in viscosity of the composition (X) due to the volatilization of the solvent is less likely to occur, which enhances the storage stability of the composition (X).
  • the drying step for removing the solvent from the composition (X) and the cured product at the time of producing the wavelength conversion member can be eliminated.
  • the composition (X) does not contain a solvent, or if the content of the solvent is 1% by mass or less, the composition (X) after molding is formed, especially when the composition (X) is molded by an inkjet method.
  • the thickness is less likely to decrease due to the volatilization of the solvent, and therefore the thickness of the wavelength conversion member is less likely to decrease. Therefore, the thickness of the wavelength conversion member can be secured as large as possible while molding by the inkjet method, and the wavelength conversion ability of the wavelength conversion member can be secured as large as possible.
  • the content of the solvent is more preferably 0.5% by mass or less, further preferably 0.3% by mass or less, and particularly preferably 0.1% by mass or less. It is particularly preferable that the composition (X) does not contain a solvent or contains only a solvent that is inevitably mixed. The solvent content of the composition (X) may exceed 1% by mass.
  • the glass transition temperature of the cured product of the composition (X) is preferably 80 ° C. or higher. That is, it is preferable that the composition (X) has a property of becoming a cured product having a glass transition temperature of 80 ° C. or higher when cured.
  • the wavelength conversion member can have good heat resistance. Therefore, for example, when the wavelength conversion member is subjected to a process accompanied by a temperature rise, the wavelength conversion member is less likely to deteriorate. Therefore, for example, when the protective layer is manufactured by a vapor deposition method such as a plasma CVD method so as to cover the wavelength conversion member manufactured from the composition (X), the wavelength conversion member is less likely to deteriorate even if the wavelength conversion member is heated. ..
  • the wavelength conversion member can be adapted to in-vehicle applications where the demand for heat resistance is strict.
  • the glass transition temperature of the cured product is more preferably 90 ° C. or higher, and even more preferably 100 ° C. or higher.
  • the glass transition temperature of this cured product can be achieved by the composition of the composition (X) described in detail below.
  • the viscosity of the composition (X) at 25 ° C. is preferably 30 mPa ⁇ s or less.
  • the composition (X) can be molded by an inkjet method at room temperature. If the viscosity is 25 mPa ⁇ s or less, it is more preferable, if it is 20 mPa ⁇ s or less, it is further preferable, and if it is 15 mPa ⁇ s or less, it is particularly preferable. It is preferable that the viscosity is 1 mPa ⁇ s or more, and it is also preferable that the viscosity is 5 mPa ⁇ s or more.
  • the viscosity of the composition (X) at 40 ° C. is 30 mPa ⁇ s or less.
  • the viscosity can be reduced by slightly heating the composition (X). Therefore, if heated, the composition (X) can be molded by an inkjet method. Further, since the composition (X) can be reduced in viscosity without being significantly heated, it is possible to prevent the composition (X) from changing due to volatilization of the components in the composition (X).
  • the viscosity is 25 mPa ⁇ s or less, it is more preferable, if it is 20 mPa ⁇ s or less, it is further preferable, and if it is 15 mPa ⁇ s or less, it is particularly preferable. It is preferable that the viscosity is 1 mPa ⁇ s or more, and it is also preferable that the viscosity is 5 mPs or more.
  • composition (X) at 25 ° C. or 40 ° C. can be achieved by the composition of composition (X) described in detail below.
  • the volatility when 20 mg of the composition (X) is heated using a thermogravimetric analyzer under the condition of 100 ° C. for 30 minutes is preferably 40% or less.
  • the volatility of the composition (X) is the weight loss of the composition (X) after the treatment with respect to the weight of the composition (X) before the treatment (the weight of the composition (X) before the treatment and the weight after the treatment). It is defined as a percentage of the difference from the weight).
  • the low volatility of the composition (X) can enhance the storage stability of the composition (X).
  • outgas is less likely to be generated from the wavelength conversion member. Therefore, voids due to outgas are less likely to occur in the wavelength conversion member.
  • the volatility of the composition (X) is determined by heating 20 mg of the composition (X) using a thermogravimetric analyzer under the condition of 100 ° C. for 30 minutes, and the weight loss after the treatment with respect to the weight before the treatment. Can be obtained by calculating.
  • the volatility when 20 mg of the composition (X) is heated using a thermogravimetric analyzer at 100 ° C. for 30 minutes is more preferably 30% or less, and further preferably 20% or less. preferable.
  • the lower limit of the volatility of the composition (X) is not particularly limited, but may be, for example, 0.1% or more.
  • composition (X) The components contained in the composition (X) will be described in more detail.
  • reaction-curable compound (A) contains, for example, at least one of a photocurable compound (A1) and a thermosetting compound (A2).
  • the photocurable compound (A1) is a component capable of causing a polymerization reaction by being irradiated with ultraviolet rays in the presence or absence of, for example, a photopolymerization initiator (E).
  • the photopolymerization initiator (E) may contain a curing catalyst.
  • the photocurable compound (A1) contains at least one component selected from the group consisting of, for example, monomers, oligomers and prepolymers.
  • the photocurable compound (A1) contains, for example, at least one of a radically polymerizable compound (A11) and a cationically polymerizable compound (A12).
  • the composition (X) preferably further contains a photoradical polymerization initiator (E1) as a photopolymerization initiator (E). ..
  • the composition (X) contains a photocationic polymerization initiator (E2) (cationic curing catalyst) as the photopolymerization initiator (E). Further, it is preferable to contain it.
  • thermosetting compound (A2) has at least one reactive functional group consisting of, for example, an epoxy group, an oxetane group, an isocyanate group, an amino group, a carboxyl group, a methylol group and the like.
  • the thermosetting compound (A2) contains at least one component selected from the group consisting of, for example, monomers, oligomers and prepolymers.
  • the viscosity of the entire reaction-curable compound (A) at 25 ° C. is preferably 50 mPa ⁇ s or less.
  • the reaction-curable compound (A) can make the composition (X) particularly low in viscosity.
  • the viscosity of the entire reaction-curable compound (A) is more preferably 30 mPa ⁇ s or less, and particularly preferably 20 mPa ⁇ s or less. Further, the viscosity of the entire reaction-curable compound (A) is, for example, 3 mPa ⁇ s or more.
  • the viscosity of the entire reaction-curable compound (A) at 40 ° C. is 50 mPa ⁇ s or less.
  • the reaction-curable compound (A) can make the composition (X) particularly low in viscosity when heated.
  • the viscosity of the entire reaction-curable compound (A) is more preferably 30 mPa ⁇ s or less, and particularly preferably 20 mPa ⁇ s or less.
  • the viscosity of the entire reaction-curable compound (A) is, for example, 3 mPa ⁇ s or more.
  • the percentage of the component having a boiling point of 270 ° C. or higher in the reaction-curable compound (A) is preferably 80% by mass or more. In this case, the storage stability of the composition (X) is particularly unlikely to be impaired, and outgas is particularly unlikely to be generated from the cured product. It is more preferable that the percentage of the component having a boiling point of 280 ° C. or higher in the reaction-curable compound (A) is 80% by mass or more.
  • the reaction-curable compound (A) preferably contains a component having a viscosity at 25 ° C. of 20 mPa ⁇ s or less. In this case, the viscosity of the composition (X) can be reduced.
  • the ratio of the component having a viscosity of 20 mPa ⁇ s or less at 25 ° C. to the total amount of the reaction-curable compound (A) is preferably 50% by mass or more and 100% by mass or less.
  • the composition (X) can be made particularly low in viscosity, and the composition (X) can be applied particularly easily by an inkjet method.
  • This ratio is more preferably 60% by mass or more, and further preferably 70% by mass or more. Further, this ratio is more preferably 95% by mass or less, and further preferably 90% by mass or less.
  • the component having a viscosity at 25 ° C. of 20 mPa ⁇ s or less preferably contains a compound having a glass transition temperature of 80 ° C. or higher.
  • the glass transition temperature of the cured product can be increased while reducing the viscosity of the composition (X). It is more preferable that this component contains a compound having a glass transition temperature of 90 ° C. or higher, and even more preferably if it contains a compound having a glass transition temperature of 100 ° C. or higher.
  • the upper limit of the glass transition temperature of the compound contained in this component is not limited, but is, for example, 150 ° C. or lower.
  • the reaction-curable compound (A) preferably contains a photocurable compound (A1).
  • the light source or the like in the light emitting device 11 can be less likely to be damaged by heat, particularly when the color resist 1 in the light emitting device 11 is manufactured as a wavelength conversion member. ..
  • the photocurable compound (A1) contains a radically polymerizable compound (A11)
  • the radically polymerizable compound (A11) preferably contains an acrylic compound (Y).
  • the acrylic compound (Y) has one or more (meth) acryloyl groups in one molecule.
  • the acrylic compound (Y) preferably contains a polyfunctional acrylic compound (Y1) having two or more radically polymerizable functional groups containing a (meth) acryloyl group in one molecule.
  • the polyfunctional acrylic compound (Y1) can increase the glass transition temperature of the cured product, and thus can increase the heat resistance of the cured product.
  • the ratio of the polyfunctional acrylic compound (Y1) is preferably 50% by mass or more and 100% by mass or less with respect to the entire acrylic compound (Y).
  • the acrylic compound (Y) may contain only the polyfunctional acrylic compound (Y1).
  • the polyfunctional acrylic compound (Y1) is, for example, 1,3-butylene glycol di (meth) acrylate, 1,4-butanediol oligo acrylate, diethylene glycol diacrylate, 1,6-hexanediol oligo acrylate, neopentyl glycol diacrylate, Triethylene glycol diacrylate, tripropylene glycol diacrylate, dipropylene glycol diacrylate, cyclohexanedimethanol diacrylate, tricyclodecanedimethanol diacrylate, bisphenol A polyethoxydiacrylate, bisphenol F polyethoxydiacrylate, pentaerythritol tetraacrylate , Propoxylation (2) Neopentyl glycol diacrylate, Trimethylol propantriacrylate, Tris (2-hydroxyethyl) isocyanurate triacrylate, Pentaerythritol triacrylate, ethoxylated (3) Trimethylol propoxytriacryl
  • the acrylic equivalent of the polyfunctional acrylic compound (Y1) is preferably 150 g / eq or less, and more preferably 90 g / eq or more and 150 g / eq or less.
  • the weight average molecular weight of the polyfunctional acrylic compound (Y1) is, for example, 100 or more and 1000 or less, and more preferably 200 or more and 800 or less.
  • the polyfunctional acrylic compound (Y1) contains a compound (Y11) having a structure represented by the following formula (200).
  • each of R 1 and R 2 is a hydrogen or methyl group
  • n is an integer of 1 or more
  • R 3 is an alkylene group having 1 or more carbon atoms, and when n is 2 or more, it is in one molecule.
  • the plurality of R3s may be the same as or different from each other.
  • the compound (Y11) has the structure represented by the formula (200), and particularly the carbon number of R3 of the formula (200) is 3 or more, it is difficult to increase the affinity of the cured product with water. Therefore, the phosphor (B) is less likely to be deteriorated by water.
  • the carbon number of R 3 is, for example, 1 or more and 15 or less, preferably 3 or more and 15 or less.
  • the compound (Y11) has a structure represented by the formula (200), and in particular, by having two (meth) acryloyl groups in one molecule, the glass transition temperature of the cured product can be increased, and therefore the glass transition temperature can be increased. , The heat resistance of the cured product can be improved.
  • n in the equation (200) is, for example, an integer of 1 or more and 12 or less.
  • the percentage of the compound (Y11) to the acrylic compound (Y) is preferably 50% by mass or more. In this case, it is difficult to increase the affinity of the cured product for water.
  • the percentage of the compound (Y11) to the acrylic compound (Y) is, for example, 100% by mass or less, or 95% by mass or less, preferably 80% by mass or less.
  • the compound (Y11) preferably contains a component having a boiling point of 270 ° C. or higher. That is, the acrylic compound (Y) preferably contains a component having a structure represented by the formula (200) and having a boiling point of 270 ° C. or higher. In this case, the acrylic compound (Y) is less likely to volatilize from the composition (X) during storage of the composition (X) and when the composition (X) is heated. Therefore, the storage stability of the composition (X) is not easily impaired. Further, even if the compound (Y11) remains unreacted in the cured product of the composition (X), outgas caused by the compound (Y11) is unlikely to be generated from the cured product. Therefore, voids due to outgas are unlikely to occur in the color filter 2.
  • the boiling point is the boiling point under normal pressure obtained by converting the boiling point under reduced pressure, and is obtained by, for example, the method shown in Science of Petroleum, Vol.II. P.1281 (1938). It is more preferable that the compound (Y11) contains a component having a boiling point of 280 ° C. or higher.
  • the percentage of the compound (Y11) to the acrylic compound (Y) is preferably 50% by mass or more. In this case, the storage stability of the composition (X) is effectively enhanced, the outgas generation from the cured product is effectively reduced, and the affinity of the cured product with water is particularly difficult to be enhanced.
  • the percentage of the compound (Y11) to the acrylic compound (Y) is, for example, 100% by mass or less, or 95% by mass or less, preferably 80% by mass or less.
  • the viscosity of compound (Y11) at 25 ° C. is preferably 25 mPa ⁇ s or less.
  • the compound (Y11) can reduce the viscosity of the composition (X).
  • the viscosity of the compound (Y11) at 25 ° C. is more preferably 25 mPa ⁇ s or less, further preferably 20 mPa ⁇ s or less, and particularly preferably 15 mPa ⁇ s or less.
  • the viscosity of the compound (Y11) at 25 ° C. is, for example, 1 mPa ⁇ s or more, preferably 3 mPa ⁇ s or more, and even more preferably 5 mPa ⁇ s or more.
  • the compound (Y11) is, for example, at least one compound selected from the group consisting of an alkylene glycol di (meth) acrylate, a polyalkylene glycol di (meth) acrylate, and an alkylene oxide-modified alkylene glycol di (meth) acrylate. contains.
  • the alkylene glycol di (meth) acrylate is a compound in which n is 1 in the formula (200).
  • the carbon number of R3 in the formula (200) is preferably 4 to 12.
  • R3 may be linear or may have a branch.
  • the alkylene glycol di (meth) acrylate is 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, neopentyl glycol diacrylate, 1,6-hexanediol diacrylate, 1,9-nonanediol di.
  • Acrylic 1,10-decanediol diacrylate, 1,4-butanediol dimethacrylate, 1,3-butylene glycol dimethacrylate, neopentyl glycol dimethacrylate, 1,6-hexanediol dimethacrylate, 1,9-nonanediol It preferably contains at least one compound selected from the group consisting of dimethacrylate, 1,10-decanediol dimethacrylate and 1,12-dodecanediol dimethacrylate.
  • the alkylene glycol di (meth) acrylate has a product number SR213 manufactured by Sartmer, a product number V195 manufactured by Osaka Organic Chemical Industry Co., Ltd., a product number SR212 manufactured by Sartmer Co., Ltd., a product number SR247 manufactured by Sartmer Co., Ltd., and a product name light manufactured by Kyoei Chemical Industry Co., Ltd.
  • Product number BD product number SR297 manufactured by Sartmer, product number SR248 manufactured by Sartmer, product name Light Ester NP manufactured by Kyoei Chemical Industry Co., Ltd., product number SR239NS manufactured by Sartmer Co., Ltd., product name Light Ester 1,6HX manufactured by Kyoei Chemical Industry Co., Ltd.
  • Product number HD-N manufactured by Shin-Nakamura Chemical Industry Co., Ltd.
  • product name Light Ester 1,9ND manufactured by Kyoei Chemical Industry Co., Ltd.
  • product number NOD-N manufactured by Shin-Nakamura Chemical Industry Co., Ltd. product name Light Ester 1,10DC manufactured by Kyoei Chemical Industry Co., Ltd.
  • the polyalkylene glycol di (meth) acrylate is, for example, a compound in which n is 2 or more in the formula (200).
  • n is, for example, 2 to 10, preferably 2 to 7, preferably 2 to 6, and preferably 2 to 3.
  • the carbon number of R3 is , for example, 2 to 7, preferably 2 to 5. The higher the number of carbon atoms, the higher the hydrophobicity of the cured product, and the more difficult it is for the cured product to permeate moisture.
  • Polyalkylene glycol di (meth) acrylates include, in particular, diethylene glycol diacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, hexaethylene glycol dimethacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, and tri. It preferably contains at least one compound selected from the group consisting of propylene glycol dimethacrylate, tritetramethylene glycol diacrylate, polyethylene glycol 200 dimethacrylate and polyethylene glycol 200 diacrylate.
  • the polyalkylene glycol di (meth) acrylate is particularly the product number SR230 manufactured by Sartmer, the product number SR508NS manufactured by Sartmer, the product number DPGDA manufactured by Dycel, the product number SR306NS manufactured by Sartmer, the product number TPGDA manufactured by Dysel, and Osaka Organic.
  • Product number V310HP manufactured by Chemical Industry Co., Ltd. Product number APG200 manufactured by Shin-Nakamura Chemical Industry Co., Ltd., Product name Light Acrylate PTMGA-250 manufactured by Kyoei Chemical Industry Co., Ltd., Product number SR231NS manufactured by Sartmer Co., Ltd., Product name Light Ester 2EG manufactured by Kyoei Chemical Industry Co., Ltd.
  • Product number SR205NS manufactured by Sartmer product name Light Ester 3EG manufactured by Kyoei Chemical Industry Co., Ltd.
  • product name SR210NS manufactured by Sartmer Co., Ltd. product name Light Ester 4EG manufactured by Kyoei Chemical Industry Co., Ltd. It is preferable to contain at least one compound selected from the group consisting of product number 3PG manufactured by the company.
  • the alkylene oxide-modified alkylene glycol di (meth) acrylate contains, for example, propylene oxide-modified neopentyl glycol. Further, the alkylene oxide-modified alkylene glycol di (meth) acrylate contains, for example, product number EBECRYL145 manufactured by Daicel Corporation.
  • the acrylic compound (Y) contains a compound (Y11) having a structure represented by the formula (200)
  • the compound (Y11) preferably does not contain a compound having an n value of 5 or more in the formula (200). .. (R 3 -O)
  • n is a polyethylene glycol skeleton
  • the percentage of the compound having a value of n greater than 5 in the formula (200) to the acrylic compound (Y) is 20. It is preferably mass% or less.
  • the compound (Y11) preferably does not contain a compound having an n value greater than 9. It is more preferred that it does not contain compounds with a value greater than 7. In these cases, the increase in viscosity of the composition (X) is particularly unlikely to occur.
  • the polyfunctional acrylic compound (Y1) contains a polyalkylene glycol di (meth) acrylate. Since the polyalkylene glycol di (meth) acrylate has a low viscosity and is hard to volatilize, it can contribute to lowering the viscosity of the composition (X), and the storage stability of the composition (X) is improved and the cured product is used. It can contribute to the reduction of outgas.
  • the ratio of the polyalkylene glycol di (meth) acrylate to the acrylic compound (Y) is 40% by mass or more and 80% by mass or less. Is preferable.
  • the proportion of the polyalkylene glycol di (meth) acrylate is 40% by mass or more, the viscosity of the composition (X) can be effectively reduced.
  • the proportion of the polyalkylene glycol di (meth) acrylate is 80% by mass or less, the proportion of the compound having three or more (meth) acryloyl groups in the molecule increases, and the reactivity of the composition (X) and the reactivity of the composition (X) are increased.
  • the glass transition temperature of the cured product can be increased. This ratio is more preferably 42% by mass or more and 75% by mass or less, and further preferably 45% by mass or more and 70% by mass or less.
  • the polyfunctional acrylic compound (Y1) may contain a compound having three or more radically polymerizable functional groups containing a (meth) acryloyl group in one molecule.
  • the polyfunctional acrylic compound (Y1) can contain at least one selected from the group consisting of, for example, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate and pentaerythritol tetra (meth) acrylate.
  • the glass transition temperature of the cured product can be particularly increased, and therefore the heat resistance of the cured product can be particularly increased.
  • the polyfunctional acrylic compound (Y1) preferably contains pentaerythritol tetra (meth) acrylate.
  • the glass transition temperature of the cured product can be particularly increased, and the reactivity of the composition (X) can be improved.
  • the composition (X) can be easily cured in an environment containing oxygen such as an atmospheric atmosphere.
  • the ratio of pentaerythritol tetra (meth) acrylate to the acrylic compound (Y) shall be 0.5% by mass or more and 10% by mass or less. Is preferable. In this case, it is possible to achieve both high reactivity and low viscosity of the composition (X). This ratio is more preferably 1% by mass or more and 9% by mass or less, and further preferably 2% by mass or more and 8% by mass or less.
  • the polyfunctional acrylic compound (Y1) may have at least one of a benzene ring, an alicyclic and a polar group.
  • the polar group is, for example, at least one of an OH group and an NHCO group.
  • shrinkage when the composition (X) is cured can be particularly reduced.
  • an inorganic compound such as silicon nitride or silicon oxide.
  • the polyfunctional acrylic compound (Y1) is particularly selected from the group consisting of tricyclodecanedimethanol diacrylate, bisphenol A polyethoxydiacrylate, bisphenol F polyethoxydiacrylate, trimethylolpropane triacrylate and pentaerythritol triacrylate. It preferably contains one type of compound.
  • These compounds can particularly reduce shrinkage as the composition (X) cures.
  • these compounds can also enhance the adhesion between the cured product and inorganic compounds such as silicon nitride and silicon oxide.
  • the adhesion between the cured product and the inorganic material is increased, when the color resist 1 is overlapped with a film (inorganic film) made of an inorganic material such as a SiN film, the adhesion between the color resist 1 and the inorganic film is high. Can be obtained. Strictly speaking, the adhesion between the cured resin matrix of the photocurable compound (A1) and the inorganic compound is enhanced, so that the phosphor (B) is an inorganic particle such as a quantum dot phosphor (B1). In the cured product, the adhesion between the resin matrix and the phosphor (B) can be enhanced.
  • the polyfunctional acrylic compound (Y1) contains a polyalkylene glycol di (meth) acrylate and a pentaerythritol tetra (meth) acrylate.
  • the composition (X) has a low viscosity and is excellent in reactivity. Therefore, the composition (X) can be easily cured in an environment containing oxygen such as an atmospheric atmosphere.
  • the acrylic compound (Y) contains a monofunctional acrylic compound (Y2) in which the radically polymerizable functional group in one molecule is only one (meth) acryloyl group.
  • the monofunctional acrylic compound (Y2) can suppress shrinkage of the composition (X) during curing.
  • the amount of the monofunctional acrylic compound (Y2) with respect to the total amount of the acrylic compound (Y) is preferably more than 0% by mass and 50% by mass or less.
  • the amount of the monofunctional acrylic compound (Y2) is more than 0% by mass, the shrinkage of the composition (X) at the time of curing can be suppressed.
  • the amount of the monofunctional acrylic compound (Y2) is 50% by mass or less, the amount of the polyfunctional acrylic compound (Y1) can be 50% by mass or more, so that the heat resistance of the cured product can be particularly improved. It is more preferable that the amount of the monofunctional acrylic compound (Y2) is 5% by mass or more, and further preferably 30% by mass or less.
  • the monofunctional acrylic compound (Y2) is, for example, tetrahydrofurfuryl acrylate, isobornyl acrylate, 2-hydroxyethyl acrylate, 4-hydroxybutyl acrylate, isobutyl acrylate, t-butyl acrylate, isooctyl acrylate, 2-methoxyethyl acrylate.
  • the monofunctional acrylic compound (Y2) may contain at least one compound selected from the group consisting of a compound having an alicyclic structure and a compound having a cyclic ether structure.
  • Compounds having an alicyclic structure include, for example, phenoxyethyl acrylate, cyclohexyl (meth) acrylate, dicyclopentanyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, benzyl acrylate, methylphenoxyethyl acrylate, 4-t-butyl.
  • the number of ring members of the cyclic ether structure in the compound having a cyclic ether structure is preferably 3 or more, and more preferably 3 or more and 4 or less.
  • the number of carbon atoms contained in the cyclic ether structure is preferably 2 or more and 9 or less, and more preferably 2 or more and 6 or less.
  • the compound having a cyclic ether structure contains at least one compound selected from the group consisting of, for example, 3-methacryloyloxymethylcyclohexene oxide and 3-acryloyloxymethylcyclohexene oxide.
  • the acrylic compound (Y) may contain a compound having silicon in the molecular skeleton.
  • Compounds having silicon in the molecular skeleton include, for example, 3- (trimethoxysilyl) propyl acrylate (for example, product number KBM5103 manufactured by Shin-Etsu Chemical Co., Ltd.) and (meth) acrylic group-containing alkoxysilane oligomer (for example, manufactured by Shin-Etsu Chemical Co., Ltd.). It contains at least one compound selected from the group consisting of product number KR-513).
  • the acrylic compound (Y) may contain a compound having phosphorus in the molecular skeleton.
  • a compound having phosphorus in the molecular skeleton include acid phosphoxy (meth) acrylates such as acid phosphooxypolyoxypropylene glycol monomethacrylate.
  • the acrylic compound (Y) may contain a compound having nitrogen in the molecular skeleton.
  • the adhesion between the cured product and the inorganic material is improved.
  • the reactivity of the acrylic compound (Y) is improved, so that outgas is less likely to be generated from the cured product.
  • the compound having nitrogen in the molecular skeleton is selected from the group consisting of compounds having a morpholine skeleton such as acryloyl morpholine and morpholine-4-yl acrylate, diethylacrylamide, dimethylaminopropylacrylamide and pentamethylpiperidylmethacrylate. Contains at least one compound.
  • the acrylic compound (Y) contains a compound having a morpholine skeleton.
  • the reactivity of the composition (X) can be further improved, and the curability of the composition (X) in an air atmosphere can be further improved.
  • the acrylic compound (Y) contains at least one of acryloyl morpholine and morpholine-4-yl acrylate.
  • shrinkage of the composition (X) during curing can be suppressed.
  • the viscosities of acryloyl morpholine and morpholine-4-yl acrylate are low, so that these compounds do not easily increase the viscosity of the composition (X).
  • the storage stability of the composition (X) can be improved.
  • the ratio of the compound having a morpholine skeleton to the acrylic compound (Y) is preferably 5% by mass or more and 50% by mass or less. In this case, there is an advantage that outgas is less likely to be generated from the cured product of the composition (X). This ratio is more preferably 7% by mass or more and 45% by mass or less, and further preferably 10% by mass or more and 40% by mass or less.
  • the acrylic compound (Y) may contain a compound having an isobornyl skeleton.
  • the compound having an isobornyl skeleton can contain, for example, one or more compounds selected from the group consisting of isobornyl acrylate and isobornyl methacrylate.
  • the acrylic compound (Y) may contain a component consisting of a compound having at least one skeleton selected from the group consisting of a dicyclopentadiene skeleton, a dicyclopentanyl skeleton, a dicyclopentenyl skeleton, and a bisphenol skeleton.
  • the acrylic compound (Y) may contain at least one compound selected from the group consisting of, for example, tricyclodecanedimethanol diacrylate, bisphenol A polyethoxydiacrylate and bisphenol F polyethoxydiacrylate. good. In this case, the adhesion between the cured product and the inorganic material can be improved.
  • the acrylic compound (Y) may contain a compound represented by the following formula (100).
  • the reactivity of the composition (X) can be enhanced, and the adhesion between the cured product and the inorganic material can be improved.
  • R0 is an H or a methyl group.
  • X is a single bond or divalent hydrocarbon group.
  • R 1 to R 11 is H, an alkyl group or -R 12 -OH, R 12 is an alkylene group and at least one of R 1 to R 11 is an alkyl group or -R 12 -OH. R 1 to R 11 are not chemically bonded to each other.
  • the acrylic compound (Y) contains at least one compound selected from the group consisting of the compound represented by the following formula (110), the compound represented by the formula (120) and the compound represented by the formula (130). You may.
  • the radically polymerizable compound (A11) may contain a radically polymerizable compound (Z) other than the acrylic compound (Y).
  • the amount of the radically polymerizable compound (Z) with respect to the total amount of the acrylic compound (Y) and the radically polymerizable compound (Z) is, for example, 10% by mass or less.
  • the radically polymerizable compound (Z) is a polyfunctional radically polymerizable compound (Z1) having two or more radically polymerizable functional groups in one molecule, and a monofunctional compound having only one radically polymerizable functional group in one molecule.
  • One or both of the radically polymerizable compound (Z2) can be contained.
  • the polyfunctional radically polymerizable compound (Z1) is, for example, a group consisting of aromatic urethane oligomers, aliphatic urethane oligomers, epoxy acrylate oligomers, polyester acrylate oligomers and other special oligomers having two or more ethylenic double bonds in one molecule. It may contain at least one compound selected from.
  • the components that can be contained in the polyfunctional radically polymerizable compound (Z1) are not limited to the above.
  • the monofunctional radically polymerizable compound (Z2) includes, for example, N-vinylformamide, vinylcaprolactum, vinylpyrrolidone, phenylglycidyl ether, p-tert-butylphenylglycidyl ether, butylglycidyl ether, 2-ethylhexylglycidyl ether, allylglycidyl ether, and the like.
  • the components that can be contained in the monofunctional radically polymerizable compound (Z2) are not limited to the above.
  • the radically polymerizable compound (A11) contains the radically polymerizable compound (Z)
  • the radically polymerizable compound (Z) may contain a compound having nitrogen in the molecular skeleton.
  • Compounds having nitrogen in the molecular skeleton include, for example, at least one compound selected from the group consisting of N-vinylformamide, N-vinylpyrrolidone and N-vinylcaprolactam.
  • the adhesion between the cured product and the inorganic material is improved as in the case where the acrylic compound (Y) contains a compound having nitrogen in the molecular skeleton.
  • the radically polymerizable compound (A11) preferably contains a compound having nitrogen in the molecular skeleton.
  • the compound having nitrogen in the molecular skeleton may contain the compound contained in the acrylic compound (Y) or may contain the compound contained in the radically polymerizable compound (Z).
  • the ratio of the compound having nitrogen in the molecular skeleton to the whole radically polymerizable compound (A11) is preferably 5% by mass or more and 80% by mass or less. When this ratio is 5% by mass or more, the adhesion between the cured product and the inorganic material can be particularly improved.
  • this ratio is 80% by mass or less, the compound having nitrogen in the molecular skeleton does not easily impair the storage stability of the composition (X), and the satellite when the composition (X) is jetted by the inkjet method can be used. Hard to cause. Therefore, the inkjet property of the composition (X) is less likely to be impaired. Further, it is possible to reduce the generation of outgas caused by the compound having nitrogen in the molecular skeleton.
  • This ratio is more preferably 10% by mass or more and 70% by mass or less, further preferably 20% by mass or more and 60% by mass or less, and particularly preferably 25% by mass or more and 50% by mass or less.
  • the photoradical polymerization initiator (E1) is not particularly limited as long as it is a compound that produces radical species when irradiated with ultraviolet rays.
  • the photoradical polymerization initiator (E1) is, for example, aromatic ketones, acylphosphine oxide compounds, aromatic onium salt compounds, organic peroxides, thio compounds (thioxanthone compounds, thiophenyl group-containing compounds, etc.), hexaarylbiimidazole.
  • It contains at least one compound selected from the group consisting of a compound, an oxime ester compound, a borate compound, an azinium compound, a metallocene compound, an active ester compound, a compound having a carbon halogen bond, and an alkylamine compound.
  • the amount of the photoradical polymerization initiator (E1) with respect to 100 parts by mass of the composition (X) is, for example, 1 part by mass or more and 10 parts by mass or less.
  • the photoradical polymerization initiator (E1) preferably contains an initiator having photobleaching properties. In this case, the light transmittance of the cured product can be increased.
  • the photobleaching initiator contains, for example, at least one of a photobleaching oxime ester compound and an acylphosphine oxide compound.
  • the oxime ester compound having photobleaching property contains, for example, at least one of the compound represented by the following formula (401) and the compound represented by the following formula (402). Of these, the compound represented by the formula (402) has particularly high sensitivity, so that the photocurability of the composition (X) can be particularly enhanced.
  • the acylphosphine oxide compound is, for example, at least one selected from the group consisting of 2,4,6-trimethylbenzoyl-diphenylphosphin oxide and bis (2,4,6-trimethylbenzoyl) phenylphosphin oxide. contains.
  • the photoradical polymerization initiator (E1) may contain a sensitizer as a part of the photoradical polymerization initiator (E1).
  • the sensitizer can accelerate the radical generation reaction of the photoradical polymerization initiator (E1), improve the reactivity of the radical polymerization, and improve the crosslink density.
  • the sensitizer is, for example, 9,10-dibutoxyanthracene, 9-hydroxymethylanthracene, thioxanthone, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2-chlorothioxanthone, 2,4-diethylthioxanthone, anthracinone, 1,2-.
  • the components that the sensitizer can contain are not limited to the above.
  • the composition (X) may contain a polymerization accelerator in addition to the photoradical polymerization initiator (E1).
  • the polymerization accelerator include ethyl p-dimethylaminobenzoate, -2-ethylhexyl p-dimethylaminobenzoate, methyl p-dimethylaminobenzoate, -2-dimethylaminoethyl benzoate, and butoxy p-dimethylaminobenzoate.
  • the components that can be contained in the polymerization accelerator are not limited to the above.
  • the cationically polymerizable compound (A12) may be, for example, a polyfunctional cationically polymerizable compound (W1) and a monofunctional cationically polymerizable compound (W2). Contains at least one of them.
  • the polyfunctional cationically polymerizable compound (W1) is either one or both of a polyfunctional cationically polymerizable compound (W11) having no siloxane skeleton and a polyfunctional cationically polymerizable compound (W12) having a siloxane skeleton. Can be contained.
  • the polyfunctional cationically polymerizable compound (W11) does not have a siloxane skeleton and has two or more cationically polymerizable functional groups per molecule.
  • the number of cationically polymerizable functional groups per molecule of the polyfunctional cationically polymerizable compound (W11) is preferably 2 to 4, more preferably 2 to 3.
  • the cationically polymerizable functional group is at least one group selected from the group consisting of, for example, an epoxy group, an oxetane group and a vinyl ether group.
  • the polyfunctional cationically polymerizable compound (W11) is composed of, for example, a polyfunctional alicyclic epoxy compound, a polyfunctional heterocyclic epoxy compound, a polyfunctional oxetane compound, an alkylene glycol diglycidyl ether, and an alkylene glycol monovinyl monoglycidyl ether. It contains at least one compound among the selected compounds.
  • the polyfunctional alicyclic epoxy compound contains, for example, one or both of the compound represented by the following formula (1) and the compound represented by the following formula (20).
  • each of R 1 to R 18 is independently a hydrogen atom, a halogen atom, or a hydrocarbon group.
  • the number of carbon atoms of the hydrocarbon group is preferably in the range of 1 to 20.
  • the hydrocarbon group is an alkyl group having 1 to 20 carbon atoms such as a methyl group, an ethyl group and a propyl group; an alkenyl group having 2 to 20 carbon atoms such as a vinyl group and an allyl group; or an alkenyl group having 2 to 20 carbon atoms such as an ethylidene group and a propylidene group.
  • the hydrocarbon group may contain an oxygen atom or a halogen atom.
  • Each of R 1 to R 18 is preferably a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms independently, more preferably a hydrogen atom or a methyl group, and most preferably a hydrogen atom.
  • Examples of the compound represented by the formula (1) include the compound represented by the following formula (1a) and the compound represented by the following formula (1b).
  • each of R 1 to R 12 is independently a hydrogen atom, a halogen atom, or a hydrocarbon group having 1 to 20 carbon atoms.
  • the halogen atom is, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
  • the hydrocarbon group having 1 to 20 carbon atoms is an alkyl group having 1 to 20 carbon atoms such as a methyl group, an ethyl group and a propyl group; an alkenyl group having 2 to 20 carbon atoms such as a vinyl group and an allyl group; or an ethylidene group and propyridene. It is an alkylidene group having 2 to 20 carbon atoms such as a group.
  • the hydrocarbon group having 1 to 20 carbon atoms may contain an oxygen atom or a halogen atom.
  • Each of R 1 to R 12 is preferably a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms independently, more preferably a hydrogen atom or a methyl group, and most preferably a hydrogen atom.
  • Examples of the compound represented by the formula (20) include a tetrahydroinden epoxide represented by the following formula (20a).
  • the polyfunctional heterocyclic epoxy compound contains, for example, a trifunctional epoxy compound as shown in the following formula (2).
  • the polyfunctional oxetane compound contains, for example, a bifunctional oxetane compound as shown in the following formula (3).
  • the alkylene glycol diglycidyl ether contains, for example, at least one compound selected from the group consisting of the compounds represented by the following formulas (4) to (7).
  • the alkylene glycol monovinyl monoglycidyl ether contains, for example, the compound represented by the following formula (8).
  • the polyfunctional cationically polymerizable compound (W11) includes, for example, celoxide 2021P and celoxide 8010 manufactured by Daicel, TEPIC-VL manufactured by Nissan Chemical Industries, OXT-221 manufactured by Toagosei, and 1, It can contain at least one component selected from the group consisting of 3-PD-DEP, 1,4-BG-DEP, 1,6-HD-DEP, NPG-DEP and butylene glycol monovinyl monoglycidyl ether.
  • the polyfunctional cationically polymerizable compound (W11) preferably contains a polyfunctional alicyclic epoxy compound.
  • the composition (X) can have a particularly high cationic polymerization reactivity.
  • the polyfunctional alicyclic epoxy compound preferably contains either one or both of the compound represented by the formula (1) and the compound represented by the formula (20).
  • the composition (X) can have a higher cationic polymerization reactivity.
  • the compound represented by the formula (1) preferably contains the compound represented by the formula (1a).
  • the composition (X) can have a higher cationic polymerization reactivity and a particularly low viscosity.
  • the composition (X) can have good ultraviolet curability and particularly when the compound represented by the formula (20) is contained. It can have a low viscosity. Further, the compound represented by the formula (20) has a property of being hard to volatilize in spite of having a low viscosity. Therefore, even if the composition (X) contains the compound represented by the formula (20), the composition (X) is unlikely to change in composition due to the volatilization of the compound represented by the formula (20). Therefore, the composition (X) can be reduced in viscosity by containing the compound represented by the formula (20) without impairing the storage stability.
  • the compound represented by the formula (20) can be synthesized, for example, by oxidizing a cyclic olefin compound having a tetrahydroindene skeleton with an oxidizing agent.
  • the compound represented by the formula (20) may contain four stereoisomers based on the configuration of the two epoxy rings.
  • the compound represented by the formula (20) may contain any of the four stereoisomers. That is, the compound represented by the formula (20) can contain at least one component selected from the group consisting of four stereoisomers.
  • the ratio of the total amount of the exo-end form and the end-end form to the four stereoisomers in the compound represented by the formula (20) is 10% by mass or less with respect to the entire epoxy compound (A1). Is preferable, and more preferably 5% by mass or less. In this case, the heat resistance of the cured product can be improved.
  • the ratio of the specific stereoisomer in the compound represented by the formula (20) can be determined based on the peak area ratio appearing in the chromatogram obtained by gas chromatography.
  • the ratio of the polyfunctional cationically polymerizable compound (W11) to the total amount of the resin component is preferably in the range of 5 to 95% by mass. ..
  • the resin component refers to a cationically polymerizable compound in the composition (X), and includes a polyfunctional cationically polymerizable compound (W1) and a monofunctional cationically polymerizable compound (W2).
  • the proportion of the polyfunctional cationically polymerizable compound (W11) is 5% by mass or more, the composition (X) can have particularly excellent reactivity during the photocationic polymerization reaction, whereby the cured product has high strength. Can have (hardness).
  • the ratio of the polyfunctional cationically polymerizable compound (W11) is 95% by mass or less
  • the composition (X) contains the hygroscopic agent (F)
  • the hygroscopic agent (F) is contained in the composition (X).
  • the proportion of the polyfunctional cationically polymerizable compound (W11) is more preferably 12% by mass or more, further preferably 15% by mass or more, further preferably 20% by mass or more, and 25% by mass or more. Is particularly preferable.
  • the proportion of the polyfunctional cationically polymerizable compound (W11) is more preferably 85% by mass or less, and further preferably 60% by mass or less.
  • the proportion of the polyfunctional cationically polymerizable compound (W11) is preferably in the range of 20 to 60% by mass.
  • the polyfunctional alicyclic epoxy compound may be a part of the polyfunctional cationically polymerizable compound (W11), and all of them may be. May be.
  • the ratio of the polyfunctional alicyclic epoxy compound to the polyfunctional cationically polymerizable compound (W11) is preferably in the range of 15 to 100% by mass. When this ratio is 15% by mass or more, the polyfunctional alicyclic epoxy compound can particularly contribute to the improvement of the ultraviolet curability of the composition (X).
  • the polyfunctional cationically polymerizable compound (W12) has a siloxane skeleton and two or more cationically polymerizable functional groups per molecule.
  • the number of cationically polymerizable functional groups per molecule of the polyfunctional cationically polymerizable compound (W12) is preferably 2 to 6, and more preferably 2 to 4.
  • the polyfunctional cationically polymerizable compound (W12) can contribute to the improvement of the cationic polymerization reactivity of the composition (X) and the heat-resistant discoloration of the cured product and the optical component.
  • the polyfunctional cationically polymerizable compound (W12) can also contribute to lowering the elastic modulus of the cured product and the optical component.
  • the polyfunctional cationically polymerizable compound (W12) can also contribute to the improvement of the dispersibility of the hygroscopic agent in the composition (X) and the cured product.
  • the polyfunctional cationically polymerizable compound (W12) is preferably liquid at 25 ° C.
  • the viscosity of the polyfunctional cationically polymerizable compound (W12) at 25 ° C. is preferably in the range of 10 to 300 mPa ⁇ s. In this case, the increase in viscosity of the composition (X) can be suppressed.
  • the cationically polymerizable functional group contained in the polyfunctional cationically polymerizable compound (W12) is at least one group selected from the group consisting of, for example, an epoxy group, an oxetane group and a vinyl ether group.
  • the siloxane skeleton of the polyfunctional cationically polymerizable compound (W12) may be linear, branched or cyclic.
  • the number of Si atoms contained in the siloxane skeleton is preferably in the range of 2 to 14.
  • the composition (X) can have a particularly low viscosity.
  • the number of Si atoms is more preferably in the range of 2 to 10, further preferably in the range of 2 to 7, and particularly preferably in the range of 3 to 6.
  • the polyfunctional cationically polymerizable compound (W12) contains, for example, at least one of the compound represented by the formula (10) and the compound represented by the formula (11).
  • R in each of the formula (10) and the formula (11) is a single bond or a divalent organic group, and is preferably an alkylene group.
  • Y is a siloxane skeleton and may be linear, branched or cyclic, and the number of Si atoms thereof is preferably in the range of 2 to 14, more preferably in the range of 2 to 10. It is more preferably in the range of 2 to 7, and particularly preferably in the range of 3 to 6.
  • n is an integer of 2 or more, preferably in the range of 2-4.
  • the polyfunctional cationically polymerizable compound (W12) contains the compound represented by the following formula (10a).
  • R in the formula (10a) is a single bond or a divalent organic group, and is preferably an alkylene group having 1 to 4 carbon atoms.
  • N in the equation (10a) is an integer of 0 or more.
  • n is preferably in the range of 0 to 12, more preferably in the range of 0 to 8, more preferably in the range of 0 to 5, and particularly preferably in the range of 1 to 4. preferable.
  • the compound represented by the formula (10a) preferably contains the compound represented by the following formula (30). That is, the polyfunctional cationically polymerizable compound (W12) preferably contains the compound represented by the following formula (30).
  • the polyfunctional cationically polymerizable compound (W12) is, for example, product numbers X-40-2669, X-40-2670, X-40-2715, X-40-2732, X manufactured by Shin-Etsu Chemical Co., Ltd. Containing at least one component selected from the group consisting of -22-169AS, X-22-169B, X-22-2046, X-22-343, X-22-163, and X-22-163B. Is preferable.
  • the polyfunctional cationically polymerizable compound (W12) preferably has an alicyclic epoxy structure, and it is particularly preferable that the polyfunctional cationically polymerizable compound (W12) contains the compound represented by the formula (10a).
  • the compound represented by the formula (10a) can particularly contribute to the improvement of the cationic polymerization reactivity and the reduction of the viscosity of the composition (X), and particularly to the improvement of the heat-resistant discoloration property and the low elastic modulus of the cured product and the optical component. Can contribute.
  • the composition (X) contains the hygroscopic agent (F)
  • it can particularly contribute to the improvement of the dispersibility of the hygroscopic agent (F) in the composition (X).
  • the ratio of the polyfunctional cationically polymerizable compound (W12) to the total amount of the resin component is preferably in the range of 5 to 95% by mass. ..
  • the composition (X) contains the hygroscopic agent (F)
  • the dispersibility of the hygroscopic agent (F) in the composition (X) and the cured product is particularly improved, and the composition (X) Can have a particularly high photocationic polymerization reactivity.
  • the monofunctional cationically polymerizable compound (W2) has only one cationically polymerizable functional group per molecule.
  • the cationically polymerizable functional group is at least one group selected from the group consisting of, for example, an epoxy group, an oxetane group and a vinyl ether group.
  • the viscosity of the monofunctional cationically polymerizable compound (W2) at 25 ° C. is preferably 8 mPa ⁇ s or less. In this case, even if the composition (X) does not contain a solvent, the monofunctional cationically polymerizable compound (W2) can reduce the viscosity of the composition (X). In particular, the viscosity of the monofunctional cationically polymerizable compound (W2) at 25 ° C. is preferably in the range of 0.1 to 8 mPa ⁇ s.
  • the monofunctional cationically polymerizable compound (W2) can contain, for example, at least one compound selected from the group consisting of the compounds represented by the following formulas (12) to (17) and limonene oxide.
  • the ratio of the monofunctional cationically polymerizable compound (W2) to the total amount of the resin component is preferably in the range of 5 to 50% by mass.
  • the proportion of the monofunctional cationically polymerizable compound (W2) is 5% by mass or more, the viscosity of the composition (X) can be particularly reduced.
  • the proportion of the monofunctional cationically polymerizable compound (W2) is 50% by mass or less, the composition (X) can have particularly excellent reactivity during the photocationic polymerization reaction, whereby the cured product can be obtained. Can have high strength (hardness).
  • the ratio of the monofunctional cationically polymerizable compound (W2) is more preferably 10% by mass or more, still more preferably 15% by mass or more.
  • the proportion of the monofunctional cationically polymerizable compound (W2) is more preferably 40% by mass or less, further preferably 35% by mass or less, and particularly preferably 30% by mass or less.
  • the proportion of the monofunctional cationically polymerizable compound (W2) is particularly 35% by mass or less, the amount of volatilization of the components in the composition (X) during storage of the composition (X) can be effectively reduced. Therefore, even if the composition (X) is stored for a long period of time, the characteristics of the composition (X) are not easily impaired. Further, it is possible to particularly suppress the occurrence of tack on the cured product.
  • the proportion of the monofunctional cationically polymerizable compound (W2) is preferably in the range of 10 to 35% by mass.
  • the polyfunctional cationically polymerizable compound (W11) is used with respect to the total amount of the resin component.
  • the ratio of the polyfunctional cationically polymerizable compound (W12) is in the range of 15 to 30% by mass, and the ratio of the monofunctional cationically polymerizable compound (W2) is 15 to 40% by mass. It is preferably in the range of%.
  • the cationically polymerizable compound (A12) contains the compound represented by the formula (3) and the compound represented by the formula (16), a photocured product is produced from the composition (X) by adjusting the ratio of both. It is possible to reduce the viscosity of the composition (X) and improve the storage stability while appropriately adjusting the ease of progress of the curing reaction in the case of the above.
  • the amount of the compound represented by the formula (16) is appropriately adjusted so that the composition (X) has the above-mentioned characteristics.
  • the amount of the compound represented by the formula (16) is preferably 10% by mass or more and 40% by mass or less with respect to the total amount of the resin components.
  • the cationically polymerizable compound (A12) preferably contains a compound (f1) represented by the following formula (30) (hereinafter, also referred to as an aromatic epoxy compound (f1)).
  • X is at least one selected from the group consisting of halogen, H, hydrocarbon group and alkylene glucol group, and when there are a plurality of X in one molecule, they are different even if they are the same. You may.
  • the hydrocarbon group is, for example, an alkyl group or an aryl group.
  • X is a hydrocarbon group, the number of carbon atoms of X is, for example, in the range of 1 to 10.
  • R is a single bond or divalent organic group.
  • R is a divalent organic group
  • the divalent organic group is, for example, an alkylene group, an oxyalkylene group, a carbonyloxyalkylene group (for example, -CO-O-CH2-), or -C (Ph) 2-O-.
  • Y is H or a monovalent organic group.
  • the monovalent organic group is, for example, an alkyl group or an aryl group.
  • the aromatic epoxy compound (f1) When the cationically polymerizable compound (A12) contains the aromatic epoxy compound (f1), the aromatic epoxy compound (f1) has a low viscosity, so that the aromatic epoxy compound (f1) lowers the viscosity of the composition (X). I can let you. Further, the aromatic epoxy compound (f1) is less likely to volatilize, so that even if the composition (X) is stored, the composition (X) is less likely to change in composition due to the volatilization of the aromatic epoxy compound (f1). .. Therefore, the aromatic epoxy compound (f1) can enhance the storage stability of the composition (X).
  • the aromatic epoxy compound (f1) since the aromatic epoxy compound (f1) has high reactivity, unreacted components are less likely to remain in the cured product, and therefore outgas is less likely to be generated from the cured product. Further, the aromatic epoxy compound (f1) can increase the glass transition temperature of the cured product, and thus can increase the heat resistance of the cured product.
  • the aromatic epoxy compound (f1) is less likely to generate defective droplets called satellites when the composition (X) is ejected by the inkjet method.
  • a satellite is a droplet that is separated from the original droplet and adheres to a position different from the original droplet attachment position on the coating target when the droplet is ejected by the inkjet method.
  • satellites are generated, the dimensional accuracy of the cured product produced from the composition (X) is deteriorated.
  • R in the formula (30) is a single bond or an alkylene group.
  • n in the formula (30) is 2 or 3
  • at least one of the plurality of Rs in the formula (30) is a single bond or an alkylene group.
  • the aromatic epoxy compound (f1) preferably contains, for example, at least one compound selected from the group consisting of the compounds represented by the following formulas (301) to (318).
  • the aromatic epoxy compound (f1) may contain at least one component selected from the group consisting of the compounds represented by the formulas (301) to (305), (312), (314) and (318), respectively. preferable. These compounds have high reactivity because at least one epoxy group (oxylan) in the compound and a benze ring are bonded by a single bond or an alkylene group, and thus the curability of the composition (X). Can be enhanced.
  • the ratio of the aromatic epoxy compound (f1) to the entire cationically polymerizable compound (A12) is preferably 5% by mass or more. In this case, the above-mentioned action by the aromatic epoxy compound (f1) can be obtained particularly remarkably. This ratio is also preferably 95% by mass or less. In this case, the storage stability of the composition (X) may be good. This ratio is more preferably 10% by mass or more and 90% by mass or less, and further preferably 20% by mass or more and 85% by mass or less.
  • the cationically polymerizable compound (A12) contains a compound (f2) having an oxyalkylene skeleton.
  • the oxyalkylene skeleton is a linear skeleton composed of one or more linear oxyalkylene units.
  • the compound (f2) When the cationically polymerizable compound (A12) contains the compound (f2), the compound (f2) has a low viscosity, so that the compound (f2) can reduce the viscosity of the composition (X). Further, the compound (f2) is less likely to volatilize, and therefore, even if the composition (X) is stored, the composition (X) is less likely to change in composition due to the volatilization of the aromatic epoxy compound (f1). Therefore, the compound (f2) can enhance the storage stability of the composition (X).
  • the compound (f2) is less likely to generate defective droplets called satellites when the composition (X) is ejected by the inkjet method. Further, the compound (f2) can make satellites less likely to occur even if the speed of the droplets ejected by the inkjet method is increased. Therefore, depending on the conditions of inkjet, for example, it is possible to increase the ejection speed of droplets by the inkjet method to 4 m / s or more without causing satellites. If the velocity of the droplet can be increased, the trajectory of the droplet is less likely to be affected by disturbance, so that the dimensional accuracy of the cured product produced from the composition (X) can be improved. Further, since the compound (f2) can enhance the storage stability of the composition (X) as described above, the composition (X) is less likely to generate satellites even if the composition (X) is stored for a long period of time. The properties can be maintained.
  • the oxyalkylene skeleton preferably contains a structure of "-C-C-O-", that is, an oximethylene unit.
  • satellites are less likely to be generated, and satellites are less likely to be generated even if the drive frequency at which the composition (X) is ejected by, for example, an inkjet method is changed.
  • the compound (f2) is less likely to volatilize and has a lower viscosity, and the affinity (wetting property) of the composition (X) with respect to the inorganic material can be enhanced.
  • the number of oxyalkylene units in the oxyalkylene skeleton of compound (f2) is preferably 1 or more and 8 or less. In this case, since the compound (f2) can have a lower viscosity, satellites are less likely to occur, and the crosslink density of the cured product can be increased, so that the glass transition temperature of the cured product can be particularly high.
  • the number of the oxyalkylene units is more preferably 1 or more and 6 or less, and further preferably 1 or more and 4 or less.
  • a substituent other than hydrogen may be bonded to the oxyalkylene unit in the oxyalkylene skeleton of the compound (f2).
  • the oxymethylene unit contained in the oxyalkylene skeleton may have a structure of "-CH (CH 3 ) -CH 2 -O-".
  • the ratio of the compound (f2) is preferably 10% by mass or more with respect to the cationically polymerizable compound (A12). In this case, the ink jet property becomes good and the wettability to the base material becomes good. It is also preferable that this ratio is 70% by weight or less. In this case, the glass transition temperature can be sufficiently increased. This ratio is more preferably 15% by mass or more and 60% by mass or less, and further preferably 20% by mass or more and 50% by mass or less.
  • the compound (f2) contains, for example, at least one compound among a compound (f21) having an oxyalkylene skeleton and an epoxy group and a compound (f22) having an oxyalkylene group and an oxetane group.
  • the compound (f21) is, for example, the compound represented by the above formula (1b), the compound represented by the formula (4), the compound represented by the formula (5), the compound represented by the formula (6), the compound represented by the formula (7), and the formula. It contains at least one compound selected from the group consisting of the compound represented by (8), the compound represented by the formula (13), the compound represented by the formula (14) and the like.
  • the components that can be contained in the compound (f21) are not limited to the above.
  • the compound (f22) is at least one selected from the group consisting of, for example, the compound represented by the above formula (3), the compound represented by the formula (12), the compound represented by the formula (16), and the compound represented by the formula (17). Contains the compound of.
  • the components that can be contained in the compound (f22) are not limited to the above.
  • the sulfur-containing compound preferably has at least one ethylenically unsaturated group in one molecule and at least one sulfur atom in one molecule.
  • the ethylenically unsaturated group may be a (meth) acryloyl group or a group other than the (meth) acryloyl group.
  • the compound having sulfur is particularly preferable to contain a compound having a phenyl sulfide skeleton.
  • the phenyl sulfide skeleton is a structure in which a phenyl group and a sulfur atom are directly bonded by a single bond.
  • the compound having a phenyl sulfide skeleton preferably contains a polyarylene sulfide compound.
  • the polyarylene sulfide compound is a compound having a repeating unit represented by [-Ar-S-] in the molecule.
  • Ar is an arylene group, for example, a phenylene group.
  • the sulfur-containing compound includes, for example, at least one selected from the group consisting of allyl phenyl sulfide, vinyl phenyl sulfide, bis (4-methacryloylthiophenyl) sulfide and the like. In particular, it is preferable that the sulfur-containing compound contains a bis (4-methacryloylthiophenyl) sulfide that does not easily generate an odor.
  • the ratio of the compound having sulfur to the photocurable compound (A1) is, for example, 10% by mass or more and 90% by mass or less, preferably 25% by mass or more and 80% by mass or less, and more preferably 40% by mass or more and 80% by mass or less. ..
  • the cationically polymerizable compound (A12) contains an epoxy compound and the above-mentioned compound (f22).
  • the epoxy compound contains, for example, at least one compound among the compounds having an epoxy group among the compounds that can be contained in the above-mentioned cationically polymerizable compound (A12).
  • the cationically polymerizable compound (A12) contains the epoxy compound and the compound (f22)
  • the curability of the composition (X) when the composition (X) is irradiated with ultraviolet rays is enhanced, and the composition at this time is enhanced. Too rapid curing of (X) is less likely to occur, and therefore deterioration of transparency due to cloudiness or the like is less likely to occur in the cured product.
  • the mechanism that causes this effect is presumed to be as follows. Since the reactivity of the compound (f22) is lower than that of the epoxy compound, when the composition (X) is irradiated with ultraviolet rays, the epoxy compound first reacts. The reaction of this epoxy compound can increase the curability of the composition (X). Subsequently, the reaction of the compound (f22) makes it difficult for the epoxy compound and the compound (f22) to react at once. It is considered that this makes it difficult for an excessively rapid reaction to occur. In this case, the ratio of the compound (f22) to the cationically polymerizable compound (A12) is preferably 20% by mass or more.
  • the compound (f22) can make the composition (X) particularly low in viscosity and particularly enhance the storage stability of the composition (X). Further, the compound (f22) can particularly enhance the curability of the composition (X).
  • the proportion of the compound (f22) is also preferably 90% by mass or less. In this case, the curability of the cured product can be sufficiently enhanced.
  • the ratio of the compound (f22) is more preferably 10% by mass or more and 90% by mass or less, and further preferably 20% by mass or more and 80% by mass or less.
  • the ratio of the epoxy compound in this case is preferably 10% by mass or more and 90% by mass or less, and more preferably 20% by mass or more and 80% by mass or less with respect to the total amount of the cationically polymerizable compound (A12). , 25% by mass or more and 75% by mass or less is more preferable.
  • the unreacted groups in the cured product can be sufficiently reduced to sufficiently enhance the curability of the cured product.
  • the epoxy compound preferably contains a compound having at least one oxylan ring that does not form a glycidyl ether group.
  • the epoxy compound can particularly enhance the curability of the composition (X). It is more preferable that the epoxy compound contains a compound having two or more oxylane rings that do not form a glycidyl ether group. It is also preferable that the epoxy compound contains a compound having no glycidyl ether group. It is particularly preferable that the epoxy compound contains a compound having two or more oxylane rings that do not form a glycidyl ether group and that does not have a glycidyl ether group.
  • the cationically polymerizable compound (A12) contains the compound (f2) and the epoxy compound, and the epoxy compound further contains the above-mentioned aromatic epoxy compound (f1).
  • the composition (X) has particularly excellent storage stability, and when the composition (X) is ejected by an inkjet method, it is particularly difficult to generate defective droplets called satellites. Further, even if the speed of the droplets ejected by the inkjet method is increased, satellites can be made particularly difficult to occur. Further, even if the composition (X) is stored for a long period of time, the characteristic of the composition (X) that satellites are less likely to be generated can be particularly maintained. In this case, it is particularly preferable that the compound (f2) contains the compound (f22).
  • the total ratio of the aromatic epoxy compound (f1) and the compound (f22) to the cationically polymerizable compound (A12) is preferably 55% by mass or more. In this case, the action of the combination of the aromatic epoxy compound (f1) and the compound (f22) is particularly remarkable. This ratio is more preferably 60% by mass or more, and further preferably 70% by mass or more. It is particularly preferable that the cationically polymerizable compound (A12) contains only the aromatic epoxy compound (f1) and the compound (f22).
  • the composition (X) contains the cationically polymerizable compound (A12), it is preferable that the composition (X) further contains a sensitizer.
  • the composition (X) can have a particularly high cationic polymerization reactivity.
  • the sensitizer contains, for example, one or both of 9,10-dibutoxyanthracene and 9,10-diethoxyanthracene.
  • the ratio of the sensitizer to the cationically polymerizable compound (A12) is preferably more than 0% by mass and preferably in the range of 1% by mass or less. In this case, the sensitizer does not easily impair the transparency of the cured product, so that the cured product can have good transparency.
  • the composition (X) contains a cationically polymerizable compound (A12), it is preferable that the composition (X) further contains a photocationic polymerization initiator (E2).
  • the photocationic polymerization initiator (E2) is not particularly limited as long as it is a catalyst that generates protonic acid or Lewis acid by being irradiated with light.
  • the photocationic polymerization initiator (E2) can contain at least one of an ionic photoacid generation type cation curing catalyst and a nonionic photoacid generation type cation curing catalyst.
  • the ionic photoacid generation type cationic curing catalyst can contain at least one of an onium salt and an organic metal complex.
  • onium salts include aromatic diazonium salts, aromatic halonium salts, and aromatic sulfonium salts.
  • organometallic complexes include iron-allene complexes, titanosen complexes, and arylsilanol-aluminum complexes.
  • the ionic photoacid generation type cationic curing catalyst can contain at least one of these components.
  • the nonionic photoacid generation type cationic curing catalyst is at least one selected from the group consisting of, for example, nitrobenzyl ester, sulfonic acid derivative, phosphoric acid ester, phenol sulfonic acid ester, diazonaphthoquinone, and N-hydroxyimide phosphonate.
  • the components that can be contained in the nonionic photoacid generation type cationic curing catalyst are not limited to the above.
  • Photocationic polymerization initiator E2
  • DPI series 105, 106, 109, 201, etc.
  • BI-105 BI-105
  • MPI series 103, 105, 106, etc.
  • BBI series 101, 102, 103, 105, 106, 109, 110, 200, 210, 300, 301, etc.
  • TSP series 102, 103, 105, 106, 109, 200, 300, 1000, etc.
  • HDS-109 MDS series
  • MNPS-109 MNPS-109
  • DTS series 102, 103, 105, 200, etc.
  • NDS series 103, 105, etc.
  • DAM series 101, 102, 103, 105, 201, etc.
  • SI series 105, 106, etc.
  • PI-106, NDI series 105, 106, 109, 1001, 1004, etc.
  • PAI series 01, 101, 106, 1001, 1002, 1003, 1004, etc.
  • PAI series 01, 101, 106, 1001, 1002, 1003, 1004, etc.
  • MBZ-101, PYR-100, NB series 101, 201, etc.
  • the ratio of the photocationic polymerization initiator (E2) to the cationically polymerizable compound (A12) is preferably in the range of 1 to 4% by mass.
  • this ratio is 1% by mass or more, the composition (X) can have a particularly good cationic polymerization reactivity. Further, when this ratio is 4% by mass or less, the composition (X) can have good storage stability, and the production cost is reduced by not containing an excessive photocationic polymerization initiator (E2). Is possible.
  • the fluorophore (B) preferably contains a quantum dot fluorophore (B1).
  • the color resist 1 produced from the composition (X) not only exhibits the same wavelength conversion function as a normal color resist, but also has a color. It is possible to realize a wide color gamut of the light emitted from the filter 2. Therefore, it is possible to realize a wide color gamut of the light emitted from the light emitting device 11 including the color filter 2, particularly the display device.
  • the wide color gamut can be realized by the color filter 2, it is not necessary to separately provide a member such as a filter for widening the color gamut in the light emitting device 11, particularly the display device. Therefore, it is possible to suppress an increase in the number of parts of the light emitting device 11 (display device) in widening the color gamut. Therefore, the light emitting device 11 (display device) can be made thinner, and for example, a bendable flexible light emitting device 11 (display device) can be realized.
  • Quantum dots are semiconductor particles that exhibit a quantum size effect
  • quantum dot phosphors (B1) are phosphors composed of quantum dots.
  • the average particle size of the quantum dot phosphor (B1) is, for example, 1 nm or more and 10 nm or less.
  • the average particle size of the quantum dot phosphor (B1) is preferably 2 nm or more and 6 nm or less. Even if the quantum dot phosphor (B1) has the same composition, the wavelength of fluorescence emitted differs depending on the particle size. Therefore, it is preferable that the quantum dot phosphor (B1) has a particle size corresponding to the wavelength of fluorescence emitted by the wavelength conversion member produced from the composition (X).
  • the quantum dot phosphor (B1) contains at least one semiconductor particle selected from the group consisting of, for example, a semiconductor particle that emits red fluorescence, a semiconductor particle that emits green fluorescence, and a semiconductor particle that emits blue fluorescence. do.
  • the quantum dot phosphor (B1) may contain semiconductor particles that fluoresce in colors other than these.
  • the average particle size of the quantum dot phosphor (B1) is the median diameter calculated from the measurement result by the dynamic light scattering method, that is, the cumulative 50% diameter (D50).
  • D50 the cumulative 50% diameter
  • the measuring device Nanotrack Nanotrac Wave series manufactured by Microtrack Bell Co., Ltd. can be used.
  • the quantum dot phosphor (B1) may contain semiconductor particles having a core-shell structure. Specifically, the quantum dot phosphor (B1) contains semiconductor particles (CdSe / ZnS) having, for example, a core made of CdSe and a shell made of ZnS.
  • the quantum dot phosphor (B1) may contain other suitable semiconductor particles.
  • the quantum dot phosphor (B1) is a GaN, GaP, InN, InP, Ga 2 O 3 , Ga 2 S 3 , In 2 O 3 , In 2 S 3 , ZnO, ZnS, CdO, CdS, or perovskite type semiconductor. And may contain semiconductor particles having at least one semiconductor selected from the group consisting of graphene type semiconductors.
  • the semiconductor particles that the quantum dot phosphor (B1) can contain are not limited to the above.
  • the amount of the quantum dot phosphor (B1) in the composition (X) is, for example, 0.1% by mass or more and 40% by mass or less with respect to the entire composition (X).
  • the amount of the quantum dot phosphor (B1) is 0.1% by mass or more, the cured product of the composition (X) can exhibit the wavelength conversion function.
  • the amount of the quantum dot phosphor (B1) is 40% by mass or less, the composition (X) can be molded by an inkjet method.
  • the amount of the quantum dot phosphor (B1) is more preferably 1% by mass or more, further preferably 2% by mass or more, and particularly preferably 3% by mass or more.
  • the amount of the quantum dot phosphor (B1) is more preferably 35% by mass or less, further preferably 30% by mass or less, and particularly preferably 25% by mass or less.
  • the light scattering particles (C) used in the first embodiment will be described.
  • the light scattering particles (C) are core-shell type particles having a core portion having a specific gravity of 2.0 or less and a shell having a refractive index of 1.9 or more covering the core portion. (C0) is included.
  • the light scattering particles (C) may be all core-shell type particles (C0) or may include some particles of other species having a light scattering function.
  • the core-shell type particles (C0) have a specific gravity of 2.0 or less in the core portion, they are relatively difficult to settle in the composition (X). Further, since the refractive index of the shell is 1.9 or more, the difference in the refractive index between the core-shell type particles (C0) and the cured product of the reaction-curable compound (A) in the wavelength conversion member becomes large, and therefore the wavelength. The light incident on the conversion member can be reflected at the interface between the core-shell type particles (C0) and the cured product of the reaction-curable compound (A). Therefore, light may be scattered in the wavelength conversion member.
  • the specific gravity of the core portion is more preferably 1.2 or less, and further preferably 0.8 or less. Further, the specific gravity of the core portion is, for example, 0.1 or more.
  • the core portion may be composed of tangible particles (core particles) or may be a hollow portion having a void shape.
  • the core particles may contain at least one of organic resin particles and inorganic particles.
  • the specific gravity of the core portion can be reduced.
  • the organic resin particles include, for example, at least one resin selected from the group consisting of acrylic resins, styrene resins and copolymers thereof, and urethane resins.
  • the core particles may contain hollow particles.
  • Hollow particles are particles containing voids.
  • the specific gravity of the core portion can be reduced.
  • the core particles contain hollow particles when the light incident on the wavelength conversion member is incident on the hollow particles, the light is reflected at the interface between the solid and the gas in the hollow particles, and therefore light is scattered. Particles (C) can further scatter light.
  • the hollow particles may contain at least one of organic resin particles (hollow resin particles) and inorganic particles (hollow inorganic particles).
  • the hollow resin particles contain at least one selected from the group consisting of, for example, hollow acrylic resin particles, hollow styrene resin particles, and the like.
  • the hollow inorganic particles contain at least one selected from the group consisting of, for example, hollow silica particles, hollow glass particles, and hollow alumina particles, hollow alumina silicate particles, hollow calcium carbonate particles, and the like.
  • the refractive index of the shell is 1.9 or more.
  • the refractive index of the shell is more preferably 2.2 or more, and even more preferably 2.5 or more.
  • the refractive index of the shell is 4.0 or less.
  • the refractive index of the shell is preferably 0.4 or more higher than the refractive index of the cured product of the reaction-curable compound (A). That is, the refractive index of the shell is higher than the refractive index of the reaction-curable compound (A), and the difference in refractive index between the shell and the cured product of the reaction-curable compound (A) is 0.4 or more. preferable. In this case, light can be particularly reflected at the interface between the light-scattering particles (C) and the cured product of the reaction-curable compound (A).
  • the difference in refractive index is more preferably 0.7 or more, and even more preferably 1.0 or more. The larger the difference in refractive index is, the more preferable it is, but the difference in refractive index is, for example, 2.5 or less.
  • the material of the shell is appropriately selected according to the refractive index required for the shell.
  • the shell contains, for example, at least one selected from the group consisting of titanium oxide, zinc oxide, zirconium oxide, aluminum oxide and barium titanate. In this case, a high refractive index difference can be realized.
  • the shell may cover at least a part of the surface of the core particles. Preferably, the shell covers more than 50% of the surface of the core particles.
  • the light scattering particles (C) can particularly scatter the light. It is particularly preferable that the shell covers the entire surface of the core particles.
  • core-shell type particles (C0) are produced, for example, as follows.
  • Raw material particles are produced by covering the organic resin particles with a shell.
  • the structure of the shell may be the same as when the core portion is a core particle.
  • the raw material particles are heated, for example, at a temperature of 900 ° C. or higher.
  • the particles of the organic resin evaporate to obtain core-shell type particles (C0) having the shell and the hollow portion inside the shell.
  • the crystallinity of the shell can be increased by heating the shell, whereby the refractive index of the shell can be increased.
  • the specific gravity of the light-scattering particles (C) can be lowered, and therefore the light-scattering particles (C) can be less likely to settle.
  • the thickness of the shell is 5 nm or more and 60 nm or less.
  • the thickness is 5 nm or more, light can be particularly reflected at the interface between the core-shell type particles (C0) and the cured product.
  • the thickness is 60 nm or less, the core-shell type particles (C0) are particularly difficult to settle.
  • the thickness is more preferably 10 nm or more, and further preferably 20 nm or more from the viewpoint of light scattering. Further, the thickness is more preferably 40 nm or less, and further preferably 30 nm or less from the viewpoint of sedimentation.
  • the core-shell type particles (C0) may further include at least one of a silica film and an alumina film covering the shell.
  • the shell inhibits the photocationic polymerization reaction of the reaction-curable compound (A). It can be suppressed by a silica film and an alumina film. Therefore, the light-scattering particles (C) are unlikely to reduce the reactivity of the reaction-curable compound (A).
  • the thickness of each of the silica film and the alumina film is preferably sufficiently small so that the silica film and the alumina film do not interfere with the action of the light scattering particles (C) to scatter light.
  • the core-shell type particles (C0) may be provided with an appropriate film that does not inhibit the photocationic polymerization reaction like the silica film and the alumina film.
  • the specific gravity of the core-shell type particles (C0) is preferably 1.5 or less. In this case, the core-shell type particles (C0) are less likely to settle in the composition (X). This specific gravity is more preferably 1.3 or less, and even more preferably 1.2 or less. Further, this specific gravity is, for example, 0.9 or more.
  • the average particle size of the core-shell type particles (C0) is preferably 0.1 ⁇ m or more and 1 ⁇ m or less.
  • the core-shell type particles (C0) can effectively scatter light.
  • the core-shell type particles (C0) are particularly dispersed in the composition (X), so that the core-shell type particles (C0) are particularly difficult to settle.
  • the average particle size is 1 ⁇ m or less, particularly when the composition (X) is formed by an inkjet method, it is possible to prevent damage to the device due to clogging or adhesion of the composition (X) in the inkjet device.
  • the average particle size is more preferably 0.15 ⁇ m or more, and even more preferably 0.2 ⁇ m or more. Further, the average particle size is more preferably 0.8 ⁇ m or less, and further preferably 0.5 ⁇ m or less.
  • the average particle size referred to here is a median diameter calculated from the particle size distribution measured by the dynamic light scattering method. As the measuring device, Nanotrack Nanotrac Wave series manufactured by Microtrack Bell Co., Ltd. can be used.
  • the light scattering particles (C) contain titanium oxide particles (C1) and hollow particles (C2) as described above.
  • the titanium oxide particles (C1) have a high refractive index, so that light can be refracted or reflected at the interface between the titanium oxide particles (C1) and the resin. Therefore, the titanium oxide particles (C1) can reflect light.
  • the average particle size of the titanium oxide particles (C1) is preferably 300 nm or less. In this case, sedimentation of the light-scattering particles (C) is particularly unlikely to occur.
  • the average particle size is more preferably 290 nm or less, further preferably 260 nm or less, and particularly preferably 230 nm or less. It is also preferable that the average particle size of the titanium oxide particles (C1) is 50 nm or more. In this case, the light scattering performance of the titanium oxide particles (C1) can be particularly exhibited.
  • the average particle size is more preferably 80 nm or more, and even more preferably 100 nm or more.
  • the average particle size of the titanium oxide particles (C1) is a median diameter calculated from the particle size distribution obtained from the measurement results by the dynamic light scattering method.
  • the measuring device for example, Nanotrack Nanotrac Wave series manufactured by Microtrack Bell Co., Ltd. can be used.
  • the hollow particles (C2) have a shell portion and a hollow portion inside the shell portion. Therefore, the refractive index changes discontinuously at the interface between the shell portion and the hollow portion inside the hollow particles (C2). Therefore, the hollow particles (C2) can scatter light. Further, since the hollow particles (C2) have a hollow portion, the specific gravity is small, and therefore it is difficult to settle in the composition (X). Therefore, the hollow particles (C2) do not easily impair the storage stability of the composition (X). Further, as described above, the hollow particles (C2) can also suppress the sedimentation of the titanium oxide particles (C1).
  • the specific gravity of the hollow particles (C2) is preferably 0.2 or more and 1.2 or less.
  • the specific gravity is 1.2 or less, the hollow particles (C2) are particularly unlikely to settle in the composition (X), and therefore the storage stability of the composition (X) is not particularly impaired.
  • the specific gravity is 0.2 or more, the phenomenon that the hollow particles (C2) float on the surface at the time of curing is suppressed, the composition of the cured product is made uniform, the physical strength is high, and the hollow particles (hollow particles (C2)). Damage to C2) is also reduced.
  • the specific gravity is more preferably 1.0 or less, and even more preferably 0.8 or less. Further, the specific gravity is more preferably 0.3 or more, and further preferably 0.4 or more.
  • the hollow particles (C2) can contain at least one of the hollow resin particles (C21) and the hollow inorganic particles (C22).
  • the shell portion of the hollow resin particles (C21) is made of resin, and the shell portion of the hollow inorganic particles (C22) is made of an inorganic material.
  • the hollow resin particles (C2) contain the hollow resin particles (C21), the hollow resin particles (C21) do not easily impair the light transmittance of the cured product of the composition (X). Therefore, the light transmittance of the wavelength conversion member can be maintained. Further, the hollow resin particles (C21) are not easily damaged even if a force is applied in a process such as kneading when preparing the composition (X) and a process of producing a cured product from the composition (X).
  • the hollow resin particles (C21) contain at least one selected from the group consisting of, for example, hollow acrylic resin particles and hollow styrene resin particles.
  • the shell portion of the hollow inorganic particles (C22) may be, for example, silica, silicate glass, alumina, alumina silicate, calcium carbonate, titania (titanium oxide) or the like. Contains at least one selected from the group consisting of.
  • the shell portion contains at least one of silica and silicate glass, for example, when the hollow inorganic particles (C22) contain at least one of hollow silica particles and hollow glass particles, the hollow inorganic particles (C22)
  • the light transmittance of the cured product of the composition (X) is not easily impaired.
  • the hollow particles (C2) contain particles containing titania (for example, hollow titania particles), the particles containing titania do not correspond to titanium oxide particles (C1).
  • the average particle size of the hollow particles (C2) is preferably 100 nm or more and 3 ⁇ m or less. When the average particle size is 100 nm or more, the hollow particles (C2) can effectively scatter light. When the average particle size is 3 ⁇ m or less, it is possible to prevent damage to the device due to clogging or adhesion of the composition (X) in the inkjet device.
  • the average particle size is more preferably 150 nm or more, and even more preferably 1 ⁇ m or more. Further, the average particle size is more preferably 800 nm or less, and further preferably 500 nm or less.
  • the average particle size of the hollow particles (C2) is a median diameter calculated from the particle size distribution obtained from the measurement result by the dynamic light scattering method. As the measuring device, for example, Nanotrack Nanotrac Wave series manufactured by Microtrack Bell Co., Ltd. can be used.
  • the average particle size of the hollow particles (C2) is preferably 1 to 15 times the average particle size of the titanium oxide particles (C1). In this case, the sedimentation of the titanium oxide particles (C1) is particularly suppressed, and the storage stability of the composition (X) is further enhanced.
  • This magnification is more preferably 1.5 times or more, and even more preferably 2.0 times or more. Further, this magnification is more preferably 10 times or less, and further preferably 7 times or less.
  • the average particle size of the hollow resin particles (C21) is preferably 1.5 times or more the average particle size of the titanium oxide particles (C1). In this case, the sedimentation of the titanium oxide particles (C1) is particularly suppressed.
  • This magnification is more preferably 1.8 times or more, and even more preferably 2.0 times or more. Further, this magnification is, for example, 10 times or less.
  • the average particle size of the hollow inorganic particles (C22) is preferably 220 nm or more. Further, the average particle size is preferably twice or more the average particle size of the titanium oxide particles (C1). In this case, the sedimentation of the titanium oxide particles (C1) is particularly suppressed. It is more preferable that the average particle size is 300 nm or more. The average particle size is, for example, 1000 nm or less. Further, the magnification of the average particle size is more preferably 10 times or less, and further preferably 7 times or less.
  • the percentage of the hollow particles (C2) to the total of the titanium oxide particles (C1) and the hollow particles (C2) is preferably 10% by volume or more and less than 100% by volume. When this percentage is 10% by volume or more, sedimentation of the light-scattering particles (C) is particularly unlikely to occur. Further, if this percentage is less than 100% by volume, the light-scattering particles (C) can scatter light more effectively. This percentage is more preferably 15% by volume or more, and even more preferably 30% by volume or more. Further, this percentage is more preferably 85% by volume or less, further preferably 70% by volume or less, and further preferably 50% by volume or less.
  • the percentage of the light-scattering particles (C) to the solid content in the composition (X) is preferably 1% by volume or more and 30% by volume or less. When this percentage is 1% by volume or more, the light-scattering particles (C) can scatter light more effectively. When this percentage is 30% by volume or less, the inkjet property of the composition (X) can be improved.
  • the lower side of this percentage is more preferably 5% by volume or more, and even more preferably 10% by volume or more.
  • the upper side of this percentage is more preferably 25% by volume or less, and further preferably 20% by volume or less. The percentage may be 18% by volume or less, and further may be 15% by volume or less.
  • the percentage of the core-shell type particles (C0) to the solid content in the composition (X) is preferably 1% by volume or more and 20% by volume or less.
  • the solid content is a component in the composition (X) excluding the solvent.
  • the percentage is 1% by volume or more, the core-shell type particles (C0) can scatter light more effectively.
  • the percentage is 20% by volume or less, the ink jet property can be improved particularly when the composition (X) is molded by the ink jet method.
  • This percentage is more preferably 5% by volume or more, and even more preferably 10% by volume or more. Further, this percentage is more preferably 18% by volume or less, and further preferably 15% by volume or less.
  • the percentage of the titanium oxide particles (C1) to the solid content in the composition (X) is preferably 1% by volume or more and 20% by volume or less.
  • this percentage is 1% by volume or more, the titanium oxide particles (C1) can scatter light more effectively.
  • this percentage is 20% by volume or less, the inkjet property of the composition (X) is good, and the precipitation of the light scattering particles (C) is particularly unlikely to occur.
  • This percentage is more preferably 5% by volume or more, and even more preferably 8% by volume or more. Further, this percentage is more preferably 15% by volume or less, and further preferably 12% by volume or less.
  • the percentage of the hollow particles (C2) to the solid content in the composition (X) is preferably 0.1% by volume or more and 20% by volume or less. When this percentage is 0.1% by volume or more, sedimentation of the light scattering particles (C) is particularly unlikely to occur. When this percentage is 20% by volume or less, the inkjet property of the composition (X) can be improved. This percentage is more preferably 1% by volume or more, and even more preferably 10% by mass or more.
  • the composition (X) preferably contains a dispersant (D).
  • the dispersant (D) can improve the dispersibility of the fluorophore (B) in the composition (X). Therefore, the dispersant (D) can prevent the increase in viscosity of the composition (X) and the decrease in storage stability due to the fluorescent substance (B). Further, the dispersant (D) can enhance the dispersibility of the light-scattering particles (C) in the composition (X). Therefore, the light-scattering particles (C) are less likely to settle.
  • the dispersant (D) disperses the light-scattering particles (C). It can greatly enhance the sex. It is presumed that this is because the dispersant (D) enhances the interaction between the titanium oxide particles (C1) and the hollow particles (C2).
  • the dispersant (D) is a surfactant that can be adsorbed on the particles.
  • the dispersant (D) generally has an adsorbing group (also referred to as an anchor) that can be adsorbed on the particles and a molecular skeleton (also referred to as a tail) that adheres to the particles when the adsorbing group is adsorbed on the particles.
  • the dispersant (D) is, for example, an acrylic dispersant having an acrylic molecular chain at the tail, a urethane dispersant having a urethane molecular chain at the tail, and a polyester-based dispersion having a polyester molecular chain at the tail. It contains at least one ingredient selected from the group if it is an agent.
  • the adsorbent group contains, for example, at least one of a basic polar functional group and an acidic polar functional group.
  • the basic polar functional group includes, for example, at least one group selected from the group consisting of an amino group, an imino group, an amide group, an imide group, and a nitrogen-containing heterocyclic group.
  • the acidic polar functional group includes, for example, at least one group selected from the group consisting of a carboxyl group and a phosphoric acid group.
  • the dispersant (D) may contain a polymer.
  • the weight average molecular weight of the polymer is, for example, 1000 or more.
  • the polymer include a hydroxyl group-containing carboxylic acid ester, a salt of a long-chain polyaminoamide and a high-molecular-weight acid ester, a salt of a high-molecular-weight polycarboxylic acid, a salt of a long-chain polyaminoamide and a polar acid ester, and a high-molecular-weight unsaturated acid ester.
  • the dispersant (D) contains a polymer, the dispersibility of the light-scattering particles (C) can be further enhanced. For example, in the case of the second embodiment, it is presumed that the titanium oxide particles (C1) are more likely to be entangled with the molecular chain of the polymer, which makes it more difficult for the titanium oxide particles (C1) to settle.
  • the dispersant (D) preferably contains a dispersant (D1) having two or more adsorbent groups in one molecule.
  • the dispersant (D) can more disperse the light scattering particles (C).
  • the dispersant (D1) has two or more adsorbing groups, so that the dispersant (D1) is composed of titanium oxide particles (C1) and hollow particles (C2). It is presumed that this is because it becomes easier to mediate the interaction, and therefore the titanium oxide particles (C1) are less likely to settle.
  • the dispersant (D1) can contain at least one selected from the group consisting of, for example, a two-terminal dispersant, a comb-type dispersant, a side chain-terminal dispersant, and a super-branched dispersant.
  • the bi-terminal dispersant has a structure in which adsorbents are bonded to both ends of the tail.
  • the comb-type dispersant has a structure in which a plurality of adsorbing groups are present in the main chain of a comb-shaped tail having a main chain and a plurality of side chains.
  • the side chain terminal dispersant has a structure in which an adsorbent group is bonded to the end of the side chain of the tail having a main chain and a plurality of side chains, or an adsorbent group is further bonded to one or both ends of the main chain. ..
  • the super-branched dispersant has a structure in which a nucleus having an adsorbent group is covered with a branched tail.
  • the dispersant (D1) contains at least one selected from the group consisting of a two-terminal dispersant, a comb-type dispersant, and a side chain terminal dispersant
  • the dispersant (D) contains the viscosity of the composition (X). Is difficult to raise.
  • the dispersant (D) contains a bi-terminal dispersant
  • the dispersant (D1) is particularly difficult to increase the viscosity of the composition (X). If the dispersant (D1) is difficult to increase the viscosity of the composition (X), the degree of freedom in selecting components other than the dispersant (D1) is increased. A component that can improve the function can be blended into the composition (X), and the viscosity of the composition (X) can be kept low.
  • the viscosity of the dispersant (D) is preferably 50,000 mPa ⁇ s or less. In this case, the dispersant (D) does not easily increase the viscosity of the composition (X).
  • the viscosity of the dispersant (D) is more preferably 20,000 mPa ⁇ s or less, and particularly preferably 10,000 mPa ⁇ s or less.
  • the boiling point of the dispersant (D) is preferably 200 ° C. or higher. In this case, since the dispersant (D) is less likely to volatilize from the composition (X), the storage stability of the composition (X) is further improved.
  • the weight average molecular weight of the dispersant (D) is preferably 200,000 or less. In this case, the dispersant (D) may have a low viscosity.
  • the weight average molecular weight is more preferably 100,000 or less, and even more preferably 50,000 or less.
  • the weight average molecular weight is a polystyrene-equivalent relative weight average molecular weight obtained from the measurement result by gel permeation chromatography.
  • the dispersant (D) for example, the Solsperth series manufactured by Nippon Louvre Resol Co., Ltd., the DISPERBYK series manufactured by Big Chemie Japan Co., Ltd., the Ajinomoto Fine Techno Co., Ltd. Azispar series, and the like can be used.
  • dispersant (D1) having two or more adsorbent groups in one molecule is used as the dispersant (D)
  • the following are exemplified.
  • the dispersant (D1) contains a two-terminal dispersant
  • the dispersant may be, for example, a part number SOLSPERSE41000 manufactured by Lubrizol (a two-terminal dispersant having a phosphoric acid group as an adsorbent, acid value 50 mgKOH /).
  • the dispersant (D1) contains a comb-type dispersant, as the comb-type dispersant, for example, product number SOLSERSE32000 manufactured by Lubrizol (comb-type dispersant having an amino group as an adsorbent, acid value 15 mgKOH / g, amine value). 31 mgKOH / g, viscosity 14000 mP ⁇ s, boiling point 200 ° C or higher), product number SOLSERSE36000 (comb-type dispersant having a phosphate group as an adsorbent, acid value 15 mgKOH / g, amine value 0 mgKOH / g, viscosity 15000 mP) -S, boiling point 200 ° C or higher) can be used.
  • product number SOLSERSE32000 manufactured by Lubrizol comb-type dispersant having an amino group as an adsorbent, acid value 15 mgKOH / g, amine value. 31 mgKOH / g, viscosity 14
  • the side chain terminal dispersant may be, for example, Actflow CBB3098 (side chain terminal dispersant having a carboxyl group as an adsorbing group) manufactured by Soken Kagaku Co., Ltd. , Acid value 98 mgKOH / g, amine value 0 mgKOH / g, viscosity 9000 mPa ⁇ s, boiling point 200 ° C or higher), product name Actflow CB3060 manufactured by Soken Kagaku Co., Ltd. 60 mgKOH / g, amine value 0 mgKOH / g, viscosity 1200 mPa ⁇ s, boiling point 200 ° C. or higher) and the like can be used.
  • Actflow CBB3098 side chain terminal dispersant having a carboxyl group as an adsorbing group
  • Acid value 98 mgKOH / g amine value 0 mgKOH / g, viscosity 9000 mPa ⁇ s, boiling point 200 °
  • the super-branched dispersant may be, for example, a product number DISPERBYK-2152 manufactured by Big Chemie Co., Ltd. (super-branched having a phosphoric acid group protected by a protecting group as an adsorbing group).
  • a type dispersant acid value 0 mgKOH / g, amine value 0 mgKOH / g, viscosity 20000 mPa ⁇ s, boiling point 200 ° C. or higher
  • the acid value is not measured because the phosphoric acid group is protected by a protecting group.
  • the amount of the dispersant (D) in the composition (X) can be set according to the purpose of improving the dispersibility of the phosphor (B) and the light scattering particles (C).
  • the amount of the dispersant (D) with respect to 100 parts by mass of the fluorescent substance (B) is preferably 5 parts by mass or more and 60 parts by mass or less.
  • the amount of the dispersant (D) is 5 parts by mass or more, the function of the dispersant (D) can be effectively exhibited, and when the amount is 60 parts by mass or less, the dispersant (D) in the color resist 1 can be effectively exhibited. It is possible to prevent free molecules from inhibiting the adhesion between the color resist 1 and the member made of the inorganic material.
  • the amount of the dispersant (D) is more preferably 15 parts by mass or more, more preferably 50 parts by mass or less, further preferably 40 parts by mass or less, and particularly preferably 30 parts by mass or less. preferable.
  • the fluorescent substance (B) can be used even if the composition (X) does not contain the dispersant (D). May be well dispersed.
  • the amount (percentage) of the dispersant (D) with respect to the light-scattering particles (C) is preferably 1% by mass or more and 60% by mass or less.
  • this percentage is 1% by mass or more, the dispersibility of the light-scattering particles (C) can be particularly enhanced.
  • this percentage is 60% by mass or less, there is an advantage that the unadsorbed dispersant does not exist in the resin and discoloration due to light is unlikely to occur.
  • This percentage is more preferably 3% by mass or more, and further preferably 7% by mass or more. Further, this percentage is more preferably 40% by mass or less, and further preferably 30% by mass or less.
  • composition (X) does not contain a solvent, or the content of the solvent is 1% by mass or less. Therefore, outgas is less likely to be generated from the composition (X) and the cured product. In addition, the storage stability of the composition (X) is further enhanced.
  • the composition (X) may further contain a hygroscopic agent (F).
  • a hygroscopic agent (F) When the composition (X) contains the hygroscopic agent (F), even if the cured product of the composition (X) and the color resist 1 are exposed to moisture, the hygroscopic agent (F) absorbs the moisture, so that the cured product And the quantum dot phosphor (B1) in the color resist 1 is less likely to deteriorate.
  • the average particle size of the hygroscopic agent (F) is preferably 200 nm or less. In this case, the cured product can have high transparency.
  • the hygroscopic agent (F) is preferably an inorganic particle having hygroscopicity, and contains at least one component selected from the group consisting of, for example, zeolite particles, silica gel particles, calcium chloride particles, and titanium oxide nanotube particles. Is preferable.
  • the components that can be contained in the hygroscopic agent (F) are not limited to the above. It is particularly preferable that the hygroscopic agent (F) contains zeolite particles.
  • Zeolite particles with an average particle size of 200 nm or less can be produced, for example, by pulverizing general industrial zeolite.
  • the zeolite may be crushed and then crystallized by hydrothermal synthesis or the like.
  • the zeolite particles can have particularly high hygroscopicity. Examples of such a method for producing zeolite particles are disclosed in JP-A-2016-69266A, JP-A-2013-049602, and the like.
  • Zeolite particles preferably contain sodium ions, and therefore zeolite particles are preferably produced using zeolite containing sodium ions as a raw material. It is more preferable to use at least one selected from the group consisting of A-type zeolite, X-type zeolite and Y-type zeolite as a raw material among zeolites containing sodium ions. It is particularly preferable that the zeolite particles are produced using 4A-type zeolite as a raw material among A-type zeolites. In these cases, the zeolite particles have a crystal structure suitable for adsorbing water.
  • the average particle size of the hygroscopic agent (F) is preferably 10 nm or more and 200 nm or less. When the average particle size is 200 nm or less, the cured product can have particularly high transparency. Further, when the average particle size is 10 nm or more, good hygroscopicity of the hygroscopic agent (F) can be maintained.
  • the average particle size is the median diameter calculated from the measurement result by the dynamic light scattering method, that is, the cumulative 50% diameter (D50). As the measuring device, Nanotrack Nanotrac Wave series manufactured by Microtrack Bell Co., Ltd. can be used.
  • the average particle size of the hygroscopic agent (F) is more preferably 150 nm or less, further preferably 100 nm or less, and particularly preferably 70 nm or less. Further, the average particle size of the hygroscopic agent (F) is preferably 20 nm or more, and more preferably 50 nm or more. In this case, the cured product can have particularly good transparency and hygroscopicity.
  • the cumulative 90% diameter (D90) of the hygroscopic agent (F) is preferably 300 nm or less, and more preferably 100 nm or less.
  • the cured product can have particularly high transparency.
  • the ratio of the hygroscopic agent (F) to the total amount of the composition (X) is preferably 1% by mass or more and 20% by mass or less.
  • the ratio of the hygroscopic agent (F) is 1% by mass or more, the cured product can have particularly high hygroscopicity.
  • the proportion of the hygroscopic agent (F) is 20% by mass or less, the viscosity of the composition (X) can be particularly reduced, and the composition (X) has a sufficiently low viscosity that can be applied by an inkjet method. You can also.
  • the proportion of the hygroscopic agent (F) is more preferably 3% by mass or more, and particularly preferably 5% by mass or more.
  • the proportion of the hygroscopic agent (F) is more preferably 15% by mass or less, and particularly preferably 13% by mass or less.
  • composition (X) can be prepared by mixing the above-mentioned components.
  • the composition (X) is preferably liquid at 25 ° C.
  • the color resist 1 produced from the composition (X), the color filter 2 including the color resist 1, and the light emitting device 11 including the color filter 2 will be described.
  • the color filter 2 includes, for example, a support substrate 4, a color resist 1 supported on the support substrate 4, and a protective layer 5 covering the color resist 1 (see FIGS. 1A and 1B).
  • the color resist 1 can be produced by molding the composition (X) by an inkjet method and then irradiating the composition (X) with ultraviolet rays to cure it.
  • composition (X) In molding the composition (X) by an inkjet method, when the composition (X) has a sufficiently low viscosity at room temperature, for example, when the viscosity at 25 ° C. is 30 mPa ⁇ s or less, particularly 15 mPa ⁇ s or less. Can be molded by applying the composition (X) by an inkjet method without heating.
  • the composition (X) When the composition (X) has a property of lowering the viscosity by heating, the composition (X) may be heated and then the composition (X) may be applied and molded by an inkjet method.
  • the viscosity of the composition (X) at 40 ° C. is 30 mPa ⁇ s or less, particularly 15 mPa ⁇ s or less, the viscosity of the composition (X) can be reduced by slightly heating, and the viscosity is reduced.
  • the composition (X) can be ejected by an inkjet method.
  • the heating temperature of the composition (X) is, for example, 20 ° C. or higher and 50 ° C. or lower.
  • the fluorescent substance (B) in the composition (X) absorbs ultraviolet rays when the composition (X) is cured, the reaction efficiency is lowered due to the fluorescent substance (B) absorbing the ultraviolet rays. It is preferable to select the wavelength of the ultraviolet rays to irradiate the composition (X) so that it is unlikely to occur. For example, when a green quantum dot phosphor composed of CdSe / ZnS core-shell type semiconductor particles is used, it is preferable that the wavelength of ultraviolet rays irradiating the composition (X) is 395 nm or more.
  • a transparent support substrate 4 is prepared.
  • the support substrate 4 is made of, for example, a transparent resin or glass.
  • a partition wall 3 is formed on one surface of the support substrate 4.
  • the partition wall 3 is made of, for example, a polyimide resin.
  • a plurality of recesses 14 partitioned by the partition wall 3 are formed on the support substrate 4.
  • the composition (X) is ejected into the recess 14 by an inkjet method.
  • the composition (X) in the recess 14 is cured by irradiating it with ultraviolet rays to prepare a color resist 1.
  • the protective layer 5 is prepared so as to cover the color resist 1.
  • the protective layer 5 includes, for example, a layer made of a resin (referred to as a resin layer).
  • the protective layer 5 may include a layer made of an inorganic material (referred to as an inorganic layer).
  • the inorganic layer is made from, for example, silicon nitride or silicon oxide.
  • the protective layer 5 may include either one of the resin layer and the inorganic layer, or may contain both. When the protective layer 5 includes both a resin layer and an inorganic layer, the protective layer 5 may include a plurality of resin layers or may include a plurality of inorganic layers.
  • the protective layer 5 includes a resin layer and an inorganic layer
  • the adjacent resin layer and the inorganic layer are arranged in a direction in which the color resist 1 and the protective layer 5 are arranged side by side.
  • the protective layer 5 includes two inorganic layers and one resin layer, and the inorganic layer, the resin layer, and the inorganic layer may be arranged in this order.
  • the protective layer 5 may include one inorganic layer and two resin layers, and the resin layer, the inorganic layer, and the resin layer may be arranged in this order.
  • the thickness of the protective layer 5 is, for example, 0.1 ⁇ m or more and 2 ⁇ m or less.
  • the inorganic layer can be produced by a vapor deposition method such as a plasma CVD method.
  • a vapor deposition method such as a plasma CVD method.
  • the color resist 1 is exposed to vacuum or reduced pressure, but as described above, in the present embodiment, outgas can be less likely to be generated from the color resist 1 under vacuum or reduced pressure. Therefore, even if the color resist 1 is exposed to vacuum or reduced pressure in the manufacturing process of the color filter 2, voids due to outgas can be less likely to occur in the color filter 2.
  • the step of producing the color resist 1 from the composition (X) does not include a drying step of drying the composition (X) between molding the composition (X) and curing it.
  • the drying step of drying the composition (X) is to remove at least a part of the solvent in the composition (X).
  • the efficiency of producing the color resist 1 can be improved.
  • the composition (X) does not contain a solvent or the content of the solvent is 1% by mass or less, outgas can be less likely to be generated from the color resist 1 without drying the composition (X).
  • the step of producing the color resist 1 from the composition (X) may include a drying step of drying the composition (X), if necessary.
  • the heating temperature of the composition (X) is reduced and the heating time is shortened when the composition (X) is dried. At least one of the transformations can be achieved.
  • the heating temperature can be 120 ° C. or lower, less than 100 ° C., or less than 50 ° C.
  • outgas can be further reduced from the color resist 1.
  • the manufacturing method of the color filter 2 includes manufacturing the color resist 1 and manufacturing the protective layer 5
  • this manufacturing method prepares the color resist 1 from the composition (X) and then prepares the protective layer 5. It is preferable not to include a drying step of drying the color resist 1 until the color resist 1 is produced. In this case, since it is not necessary to dry the color resist 1, the manufacturing efficiency of the color filter 2 can be improved. Further, in the present embodiment, since the composition (X) does not contain a solvent or the content of the solvent is 1% by mass or less, outgas is generated from the color resist 1 even if the color resist 1 is not dried. It can be difficult.
  • the method for producing the color filter 2 is from the production of the color resist 1 from the composition (X) to the production of the protective layer 5.
  • a drying step of drying the color resist 1 may be included.
  • the solvent content of the composition (X) is 1% by mass or less
  • at least one of the reduction of the heating temperature and the shortening of the heating time of the color resist 1 when the color resist 1 is dried. can be realized.
  • the heating temperature can be 120 ° C. or lower, less than 100 ° C., or less than 50 ° C.
  • the method for producing the color filter 2 includes both a drying step of drying the composition (X) and a drying step of drying the color resist 1 from the molding of the composition (X) to the production of the protective layer 5. It is particularly preferable not to include it. However, when the composition (X) contains 1% by mass or less of a solvent, if necessary, the method for producing the color filter 2 includes a drying step of drying at least one of the composition (X) and the color resist 1. It may be included. Also in this case, as described above, at least one of reduction of the heating temperature for drying and shortening of the heating time can be realized.
  • the drying step of drying the composition (X) may include heating the composition (X) under a reduced pressure atmosphere or a vacuum.
  • the drying step of drying the color resist 1 may include heating the color resist 1 under a reduced pressure atmosphere or a vacuum. Also in these cases, for example, the heating temperature can be 120 ° C. or lower, less than 100 ° C., or less than 50 ° C.
  • heating the color resist for a purpose other than drying the color resist 1 after producing the color resist 1 is not included in the drying step of drying the color resist 1.
  • a vapor deposition method such as a plasma CVD method
  • heating the color resist 1 in a chamber under vacuum or reduced pressure is included in the drying step. not.
  • the light emitting device 11 includes, for example, a color filter 2 including a color resist 1 and a light source for irradiating the color filter 2 with light.
  • the light emitting device 11 may be a display device (display) that visually displays information such as an image by light.
  • the light emitting device 11 shown in FIG. 1A is a display device, and more specifically, a liquid crystal display device 12.
  • the liquid crystal display device 12 includes a backlight unit 7 including a light source, a liquid crystal panel 6, and a color filter 2, which are laminated in this order.
  • the light source in the backlight unit 7 is, for example, a cold cathode fluorescent lamp or a light emitting diode.
  • the color resist 1 of the color filter 2 in the liquid crystal display device 12 is, for example, a color resist 1r that emits red fluorescence (hereinafter, also referred to as red color resist 1r) and a color resist 1 g that emits green fluorescence (hereinafter, green color resist). 1 g) and a resist 1b that does not emit fluorescence (hereinafter, also referred to as a transparent resist 1b).
  • red color resist 1r and the composition (X) for producing the red color resist 1r contain a quantum dot phosphor (B1) that emits red fluorescence.
  • composition (X) for producing the green color resist contain a quantum dot phosphor (B1) that emits green fluorescence.
  • the composition for producing the transparent resist 1b may be a transparent cured product, but has, for example, a composition obtained by removing the phosphor (B) from the composition (X).
  • the fluorescent color emitted by the color resist 1 and the fluorescent color emitted by the quantum dot phosphor (B1) in the color filter 2 are not limited to the above.
  • the color resist 1 may include a color resist that emits blue fluorescence (hereinafter, also referred to as a blue color resist) instead of the transparent resist 1b.
  • the blue color resist and the composition (X) for producing the blue color resist contain a quantum dot phosphor (B1) that emits blue fluorescence. In this case as well, full-color display using the three primary colors is possible.
  • the color filter 2 When manufacturing the liquid crystal display device 12, the color filter 2 may be manufactured and then the color filter 2 may be superimposed on the liquid crystal panel 6.
  • the color filter 2 may be produced by stacking the support substrate 4 on the liquid crystal panel 6 and then forming the partition wall 3, the color resist 1 and the protective layer 5 on the support substrate 4 by the above method.
  • the color filter 2 may be produced by directly producing the partition wall 3, the color resist 1, and the protective layer 5 on the liquid crystal panel 6 by the above method.
  • the liquid crystal display device 12 may further include elements other than the above.
  • the liquid crystal display device 12 may further include a transparent substrate that overlaps the color filter 2.
  • the liquid crystal display device 12 may further include a touch panel that overlaps with the color filter 2.
  • the light emitting device 11 shown in FIG. 1B is a display device, and more specifically, an LED (light emitting diode) display device.
  • the LED display device 13 includes a light emitting unit 8 including a plurality of light emitting diodes 9 as a light source, and a color filter 2.
  • the light emitting diode 9 is, for example, a micro light emitting diode or an organic light emitting diode (organic electroluminescence element).
  • the light emitting unit 8 includes a substrate 10, a plurality of light emitting diodes 9 mounted on the substrate 10, and a protective layer 15 that covers the light emitting diodes 9.
  • the protective layer 15 in the light emitting unit 8 includes either one of the resin layer and the inorganic layer, or includes both the resin layer and the inorganic layer, like the protective layer 5 in the color filter 2, for example.
  • the color resist 1 of the color filter 2 in the LED display device 13 includes, for example, a red color resist 1r, a green color resist 1 g, and a transparent resist 1b, as in the case of the liquid crystal display device 12 described above.
  • the plurality of color resists 1 in the color filter 2 are paired with each of the plurality of light emitting diodes 9.
  • the light emitted by the light emitting diode 9 irradiates the paired color resist 1, whereby fluorescence is emitted from the color resist 1. Therefore, when the light emitting diode 9 emits blue light, the light emitted from the LED display device 13 to the outside includes red fluorescence emitted from the red color resist 1r and green fluorescence emitted from the green color resist 1g. Includes blue light passing through the transparent resist 1b. Therefore, full-color display using the three primary colors is possible.
  • the light emitting diode 9 When the light emitting diode 9 emits white light, a blue color resist that emits blue fluorescence may be contained instead of the transparent resist 1b.
  • the light emitting diode 9 is paired with a light emitting diode (first light emitting diode) paired with the red color resist 1r, a light emitting diode (second light emitting diode) paired with the green color resist 1g, and a blue color resist. It may include a light emitting diode (third light emitting diode).
  • the light emitting diode 9 includes a first light emitting diode that irradiates the red color resist 1r with light, a second light emitting diode that irradiates the green color resist 1 g with light, and a third light emitting diode that irradiates the blue color resist with light. And may be included.
  • the light emitted from the LED display device 13 to the outside includes red fluorescence emitted from the red color resist 1r, green fluorescence emitted from the green color resist 1g, and blue fluorescence emitted from the blue color resist. Is included. Therefore, full-color display using the three primary colors is possible.
  • compositions of Examples and Comparative Examples were prepared by mixing the components shown in the table below. In the table, the blending amount of the components other than the light scattering particles is shown by the mass part, and the blending amount of the light scattering particles is shown by the volume percentage based on the entire composition.
  • the details of the components other than the light-scattering particles are as follows.
  • the viscosities of the following components are measured using a rheometer (manufactured by Anton Paar Japan Co., Ltd., model number DHR-2) under the conditions of a temperature of 25 ° C. and a shear rate of 1000 s -1 .
  • -Irgacure 907 BASF, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one.
  • -Irgacure TPO 2,4,6-trimethylbenzoyl-diphenylphosphine oxide manufactured by BASF.
  • -CBB3098 Side chain terminal dispersant having a carboxyl group as an adsorbent, acid value 98 mgKOH / g, viscosity 9000 mP ⁇ s, weight average molecular weight 3000, manufactured by Soken Kagaku, product number CBB3098.
  • -DISPERBYK-2155 Polyurethane structure dispersant having a plurality of tertiary amino groups as adsorbents in one molecule, amine value 48 mgKOH / g, viscosity 13000 mP ⁇ s, weight average molecular weight 20000, manufactured by Big Chemie, product number DISPERBYK- 2155.
  • the refractive index of the hollow particles is the refractive index of the portion of the hollow particles other than the hollow portion.
  • Example A is an Example corresponding to the first embodiment.
  • Example B is an Example corresponding to the second embodiment.
  • a coating film is prepared by applying a composition obtained by mixing only a photocurable compound and a photopolymerizable compound in each Example and Comparative Example.
  • a film having a thickness of 300 ⁇ m is obtained by irradiating the coating film with ultraviolet rays for 20 seconds under the condition of 500 mW / cm 2 using an LED-UV irradiator (peak wavelength 385 nm) manufactured by Panasonic Electric Works Sunkus in an atmospheric atmosphere. Was produced.
  • the refractive index of this sample was measured with respect to light having a wavelength of 589 nm at 25 ° C. using a multi-wavelength Abbe refractometer DR-M4 manufactured by Atago.
  • Viscosity The viscosity of the composition was measured using a rheometer (manufactured by Anton Paar Japan Co., Ltd., model number DHR-2) under the conditions of a temperature of 25 ° C. and a shear rate of 1000s -1 .
  • Viscosity at 40 ° C The viscosity of the composition was measured using a rheometer (manufactured by Anton Paar Japan Co., Ltd., model number DHR-2) under the conditions of a temperature of 40 ° C. and a shear rate of 1000 s -1 .
  • A is when the increase in the peak of the scattering intensity is 1% or less of the initial value
  • B is when the increase in the peak of the scattering intensity is more than 1% and 3% or less of the initial value
  • the scattering intensity is The case where the increase in the peak was more than 3% and 5% or less of the initial value was evaluated as "C”
  • the case where the increase in the peak of the scattering intensity was more than 5% of the initial value was evaluated as "D”.
  • D the sedimentation was not eliminated even if the composition was lightly shaken in the test container.
  • the composition was applied onto quartz glass having a thickness of 1 mm to prepare a coating film.
  • This coating film is irradiated with ultraviolet rays under the condition of 500 mW / cm 2 for 3 seconds (integrated light amount 1500 mJ / cm 2 ) using an LED-UV irradiator (peak wavelength 385 nm) manufactured by Panasonic Electric Works Sunkus in an atmospheric atmosphere.
  • the coating film was cured.
  • a film having a thickness of 10 ⁇ m was produced on quartz glass.
  • the transmittance of light at a wavelength of 450 nm of this film was measured.
  • a spectrophotometer (U-4100 manufactured by Hitachi, Ltd.) was used for the measurement.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Luminescent Compositions (AREA)

Abstract

The present invention addresses the problem of providing a wavelength conversion member molding composition that is used to produce a wavelength conversion member, is capable of increasing the wavelength conversion efficiency of light when the wavelength conversion member is irradiated with the light, and does not tend to impair preservation stability. This wavelength conversion member molding composition contains a reaction curable compound (A), a phosphor (B), and light scattering particles (C). The light scattering particles (C) include a core-shell particle (C0) having a core part and a shell covering the core part. The specific gravity of the core part is 2.0 or less. The refractive index of the shell is 1.9 or more.

Description

波長変換部材成形用組成物、カラーレジスト、カラーフィルタ、カラーレジストの製造方法、発光装置、及び発光装置の製造方法A composition for forming a wavelength conversion member, a color resist, a color filter, a method for manufacturing a color resist, a light emitting device, and a method for manufacturing a light emitting device.
 本開示は、波長変換部材成形用組成物、カラーレジスト、カラーフィルタ、カラーレジストの製造方法、発光装置、及び発光装置の製造方法に関し、詳しくは、蛍光体を含有する波長変換部材成形用組成物、この波長変換部材成形用組成物から作製されたカラーレジスト、このカラーレジストを備えるカラーフィルタ、このカラーレジストの製造方法、このカラーフィルタを備える発光装置及び前記波長変換部材成形用組成物を用いる発光装置の製造方法に関する。 The present disclosure relates to a composition for forming a wavelength conversion member, a color resist, a color filter, a method for manufacturing a color resist, a light emitting device, and a method for manufacturing a light emitting device. , A color resist produced from this wavelength conversion member molding composition, a color filter including this color resist, a method for manufacturing this color resist, a light emitting device equipped with this color filter, and light emission using the wavelength conversion member molding composition. Regarding the manufacturing method of the device.
 特許文献1には、インクジェット方式で用いられる光変換層形成用のインク組成物であって、発光性ナノ結晶粒子と、光散乱性粒子と、光重合性化合物及び/又は熱硬化性樹脂とを含有し、光散乱性粒子が、酸化チタン等を含むことが、開示されている。これにより光散乱性粒子で光を散乱させることで、発光性ナノ結晶粒子による波長変換効率を高めている。 Patent Document 1 describes an ink composition for forming a light conversion layer used in an inkjet method, which comprises luminescent nanocrystal particles, light scattering particles, a photopolymerizable compound and / or a thermosetting resin. It is disclosed that the contained and light-scattering particles contain titanium oxide and the like. As a result, the light is scattered by the light-scattering particles, thereby increasing the wavelength conversion efficiency of the luminescent nanocrystal particles.
国際公開第2018/123103号International Publication No. 2018/123103
 発明者は、カラーフィルタなどの波長変換部材を作製するにあたり、特許文献1のように成形材料中に光散乱性の粒子を配合することで、波長変換部材内で光を散乱させて波長変換効率を高める研究を進めていた。 In manufacturing a wavelength conversion member such as a color filter, the inventor blends light-scattering particles in a molding material as in Patent Document 1 to scatter light in the wavelength conversion member for wavelength conversion efficiency. I was conducting research to increase the number of light.
 しかし、発明者の独自の調査によると、光散乱性の粒子として特許文献1の場合のような酸化チタン粒子などの屈折率の高い粒子を用いると、高い光散乱性は得られるものの、組成物中で粒子が沈降しやすく、そのため組成物の保存安定性が損なわれてしまう。 However, according to the inventor's own research, if particles having a high refractive index such as titanium oxide particles as in the case of Patent Document 1 are used as the light scattering particles, high light scattering properties can be obtained, but the composition. Particles tend to settle inside, which impairs the storage stability of the composition.
 本開示の課題は、波長変換部材を作製するために用いることができ、波長変換部材に光が照射された場合の光の波長変換効率を高めることができ、かつ保存安定性が損なわれにくい波長変換部材成形用組成物、この波長変換部材成形用組成物から作製されたカラーレジスト、このカラーレジストを備えるカラーフィルタ、このカラーレジストの製造方法、このカラーフィルタを備える発光装置及び前記波長変換部材成形用組成物を用いる発光装置の製造方法を提供することである。 The subject of the present disclosure is a wavelength that can be used for manufacturing a wavelength conversion member, can increase the wavelength conversion efficiency of light when the wavelength conversion member is irradiated with light, and does not easily impair storage stability. A composition for forming a conversion member, a color resist produced from the composition for forming a wavelength conversion member, a color filter including the color resist, a method for manufacturing the color resist, a light emitting device equipped with the color filter, and molding of the wavelength conversion member. It is an object of the present invention to provide a method of manufacturing a light emitting device using a composition for use.
 本開示の第一の態様に係る波長変換部材成形用組成物は、反応硬化性化合物(A)、蛍光体(B)及び光散乱粒子(C)を含有する。前記光散乱粒子(C)は、コア部と、前記コア部を覆うシェルとを有する、コアシェル型粒子(C0)を含む。前記コア部の比重は2.0以下である。前記シェルの屈折率は、1.9以上である。 The composition for forming a wavelength conversion member according to the first aspect of the present disclosure contains a reaction-curable compound (A), a phosphor (B) and light-scattering particles (C). The light-scattering particle (C) includes a core-shell type particle (C0) having a core portion and a shell covering the core portion. The specific gravity of the core portion is 2.0 or less. The refractive index of the shell is 1.9 or more.
 本開示の第二の態様に係る波長変換部材成形用組成物は、反応硬化性化合物(A)、蛍光体(B)及び光散乱粒子(C)を含有する。前記光散乱粒子(C)は、酸化チタン粒子(C1)と、中空粒子(C2)とを含有する。 The composition for forming a wavelength conversion member according to the second aspect of the present disclosure contains a reaction-curable compound (A), a phosphor (B) and light-scattering particles (C). The light scattering particles (C) contain titanium oxide particles (C1) and hollow particles (C2).
 本開示に係るカラーレジストは、前記第一または第二の態様における波長変換部材成形用組成物の硬化物を含む。 The color resist according to the present disclosure includes a cured product of the composition for forming a wavelength conversion member according to the first or second aspect.
 本開示に係るカラーフィルタは、前記カラーレジストを備える。 The color filter according to the present disclosure includes the color resist.
 本開示の一態様に係るカラーレジストの製造方法は、前記波長変換部材成形用組成物をインクジェット法で成形してから、前記波長変換部材成形用組成物に紫外線を照射して硬化させる。 In the method for producing a color resist according to one aspect of the present disclosure, the wavelength conversion member molding composition is molded by an inkjet method, and then the wavelength conversion member molding composition is irradiated with ultraviolet rays to be cured.
 本開示に係る発光装置は、前記カラーフィルタと、前記カラーフィルタへ光を照射する光源とを備える。 The light emitting device according to the present disclosure includes the color filter and a light source that irradiates the color filter with light.
 本開示の一態様に係る発光装置の製造方法は、カラーレジストを備えるカラーフィルタと、前記カラーフィルタへ光を照射する光源とを備える発光装置を製造する方法であり、前記カラーレジストを、前記のカラーレジストの製造方法で製造する。 The method for manufacturing a light emitting device according to one aspect of the present disclosure is a method for manufacturing a light emitting device including a color filter including a color resist and a light source for irradiating the color filter with light. Manufactured by the method of manufacturing color resist.
図1Aは本開示の実施形態における液晶表示装置の一例の概略の断面図であり、図1Bは本開示の実施形態におけるLED表示装置の一例の概略の断面図である。FIG. 1A is a schematic cross-sectional view of an example of a liquid crystal display device according to an embodiment of the present disclosure, and FIG. 1B is a schematic cross-sectional view of an example of an LED display device according to the embodiment of the present disclosure.
 以下、本開示の好ましい実施形態について説明する。 Hereinafter, preferred embodiments of the present disclosure will be described.
 本実施形態に係る波長変換部材成形用組成物(以下、組成物(X)ともいう)は、反応硬化性化合物(A)、蛍光体(B)及び光散乱粒子(C)を含有する。 The composition for forming a wavelength conversion member according to the present embodiment (hereinafter, also referred to as composition (X)) contains a reaction-curable compound (A), a fluorescent substance (B), and light-scattering particles (C).
 第一の実施形態において、光散乱粒子(C)は、コア部と、コア部を覆うシェルとを有するコアシェル型粒子(C0)を含む。前記コア部の比重は2.0以下である。前記シェルの屈折率は、1.9以上である。 In the first embodiment, the light scattering particle (C) includes a core shell type particle (C0) having a core portion and a shell covering the core portion. The specific gravity of the core portion is 2.0 or less. The refractive index of the shell is 1.9 or more.
 なお、屈折率とは、25℃におけるナトリウムD線(波長589.3nm)についての屈折率である。 The refractive index is the refractive index for the sodium D line (wavelength 589.3 nm) at 25 ° C.
 第二の実施形態において、光散乱粒子(C)は、酸化チタン粒子(C1)と、中空粒子(C2)とを含有する。 In the second embodiment, the light scattering particles (C) contain titanium oxide particles (C1) and hollow particles (C2).
 本実施形態によれば、組成物(X)を成形してから硬化させることで、波長変換部材(すなわち、光の波長変換機能を有する光学部品)を作製できる。この波長変換部材を、例えばカラーフィルタ2におけるカラーレジスト1に適用できる(図1A及び図1B参照)。すなわち、本実施形態によれば、蛍光体(B)を含有するカラーレジスト1を備えるカラーフィルタ2を作製できる。 According to this embodiment, a wavelength conversion member (that is, an optical component having a wavelength conversion function of light) can be produced by molding the composition (X) and then curing it. This wavelength conversion member can be applied to, for example, the color resist 1 in the color filter 2 (see FIGS. 1A and 1B). That is, according to the present embodiment, the color filter 2 including the color resist 1 containing the phosphor (B) can be produced.
 本実施形態では、波長変換部材に光が照射された場合、光散乱粒子(C)が硬化物内で光を散乱させることができる。そのため、硬化物内で光が蛍光体(B)に到達する機会が多くなり、その結果、波長変換の効率が高くなる。そのため、波長変換部材は、そのサイズに比して高い波長変換効率を発現できる。 In the present embodiment, when the wavelength conversion member is irradiated with light, the light scattering particles (C) can scatter the light in the cured product. Therefore, there are many opportunities for light to reach the phosphor (B) in the cured product, and as a result, the efficiency of wavelength conversion is increased. Therefore, the wavelength conversion member can exhibit high wavelength conversion efficiency in comparison with its size.
 第二の実施形態においては、特に酸化チタン粒子(C1)は樹脂中で高い光散乱性を有するため、硬化物内で光が蛍光体(B)に到達する機会が多くなり、波長変換の効率を高めるのに有効である。 In the second embodiment, since the titanium oxide particles (C1) in particular have high light scattering properties in the resin, the chances of light reaching the phosphor (B) in the cured product increase, and the efficiency of wavelength conversion is increased. It is effective in increasing.
 また、第二の実施形態において、組成物(X)は、比較的比重の高い酸化チタン粒子(C1)を含有するにもかかわらず、組成物(X)の保管時に光散乱粒子(C)が沈降しにくく、すなわち酸化チタン粒子(C1)は組成物(X)の保存安定性を損ないにくい。これは、光散乱粒子(C)が酸化チタン粒子(C1)とともに中空粒子(C2)も含有することで、両者の相互作用により、中空粒子(C2)だけでなく酸化チタン粒子(C1)も沈降しにくくなるためであると、推察される。 Further, in the second embodiment, although the composition (X) contains titanium oxide particles (C1) having a relatively high specific gravity, the light scattering particles (C) are generated during storage of the composition (X). It is difficult to settle, that is, the titanium oxide particles (C1) do not easily impair the storage stability of the composition (X). This is because the light-scattering particles (C) contain the hollow particles (C2) together with the titanium oxide particles (C1), and the interaction between the two causes the precipitation of not only the hollow particles (C2) but also the titanium oxide particles (C1). It is presumed that this is because it becomes difficult to do.
 本開示の好ましい実施形態では、組成物(X)を用いて波長変換部材を作製するとき、インクジェット法で成形されることが好ましい。この場合、波長変換部材を位置精度良く作製できる。さらに、そのため、波長変換部材を高精細化でき、すなわち微少な波長変換部材を高密度に作製できる。このため、例えばカラーフィルタ2を備える発光装置11、特に表示装置の、高精細化(高解像度化)を実現できる。また、スクリーン印刷法などの接触を伴う印刷法で成形する場合と比べて、組成物(X)をインクジェット法で成形する場合は、組成物(X)及びその硬化物に異物が混入しにくく、そのため、波長変換部材を作製するに当たっての歩留まりが悪化しにくい。なお、組成物(X)をスクリーン印刷法などのインクジェット法以外の方法で成形してもよい。 In a preferred embodiment of the present disclosure, when the wavelength conversion member is produced using the composition (X), it is preferably molded by an inkjet method. In this case, the wavelength conversion member can be manufactured with high position accuracy. Further, for this reason, the wavelength conversion member can be made high-definition, that is, a minute wavelength conversion member can be manufactured at a high density. Therefore, for example, it is possible to realize high definition (high resolution) of the light emitting device 11 provided with the color filter 2, particularly the display device. Further, when the composition (X) is molded by the inkjet method, foreign matter is less likely to be mixed into the composition (X) and its cured product as compared with the case of molding by a printing method involving contact such as a screen printing method. Therefore, the yield in manufacturing the wavelength conversion member is unlikely to deteriorate. The composition (X) may be molded by a method other than the inkjet method such as a screen printing method.
 組成物(X)をインクジェット法で成形すると、組成物(X)から作製される波長変換部材の厚み寸法は大きくすることは難しく、そのため波長変換部材の厚みは例えば10μm以下である。しかし、本実施形態では上記のとおり波長変換部材は、そのサイズに比して高い波長変換効率を発現できるため、波長変換部材の厚みが小さくても高い波長変換効率を発現できる。 When the composition (X) is molded by the inkjet method, it is difficult to increase the thickness dimension of the wavelength conversion member produced from the composition (X), so that the thickness of the wavelength conversion member is, for example, 10 μm or less. However, in the present embodiment, as described above, the wavelength conversion member can exhibit high wavelength conversion efficiency in comparison with its size, so that high wavelength conversion efficiency can be exhibited even if the thickness of the wavelength conversion member is small.
 組成物(X)は溶剤を含有せず、又は溶剤の含有量(組成物(X)全体に対する溶剤の百分比)が1質量%以下であることが好ましい。この場合、組成物(X)及び組成物(X)の硬化物からは、溶剤に由来するアウトガスが発生しにくい。このため、溶剤の揮発に起因する組成物(X)の粘度変化が生じにくくなり、これにより組成物(X)の保存安定性が高まる。また、波長変換部材内にアウトガスに起因する空隙を生じにくくできる。このため空隙を通じて波長変換部材に水が到達するようなことを起こりにくくして、波長変換部材中の蛍光体(B)が水により劣化しにくくできる。また、波長変換部材の作製時に組成物(X)及び硬化物から溶剤を除去するための乾燥工程を不要にできる。組成物(X)及び硬化物の少なくとも一方から溶剤を除去するための乾燥工程があってもよいが、この場合は乾燥工程における加熱温度の低減と加熱時間の短縮化との、少なくとも一方を可能とできる。このため、波長変換部材の製造効率を低下させることなく、波長変換部材からアウトガスを生じにくくできる。さらに、組成物(X)は溶剤を含有せず、又は溶剤の含有量が1質量%以下であれば、組成物(X)を特にインクジェット法で成形する場合に、成形後の組成物(X)から溶剤が揮発することによる厚みの減少が生じにくく、そのため波長変換部材の厚みの減少が生じにくい。そのため、インクジェット法で成形しながら、波長変換部材の厚みをできるだけ大きく確保して、波長変換部材による波長変換能をできるだけ大きく確保することができる。溶剤の含有量は、0.5質量%以下であればより好ましく、0.3質量%以下であれば更に好ましく、0.1質量%以下であれば特に好ましい。組成物(X)は、溶剤を含有せず、又は不可避的に混入する溶剤のみを含有することが、特に好ましい。なお、組成物(X)の溶剤の含有量が1質量%を超えていてもよい。 It is preferable that the composition (X) does not contain a solvent, or the content of the solvent (percentage of the solvent to the whole composition (X)) is 1% by mass or less. In this case, outgas derived from the solvent is unlikely to be generated from the composition (X) and the cured product of the composition (X). Therefore, the change in viscosity of the composition (X) due to the volatilization of the solvent is less likely to occur, which enhances the storage stability of the composition (X). Further, it is possible to prevent the formation of voids due to outgas in the wavelength conversion member. Therefore, it is difficult for water to reach the wavelength conversion member through the void, and the phosphor (B) in the wavelength conversion member is less likely to be deteriorated by water. Further, the drying step for removing the solvent from the composition (X) and the cured product at the time of producing the wavelength conversion member can be eliminated. There may be a drying step for removing the solvent from at least one of the composition (X) and the cured product, but in this case, at least one of reduction of the heating temperature and shortening of the heating time in the drying step is possible. Can be done. Therefore, outgas can be less likely to be generated from the wavelength conversion member without lowering the manufacturing efficiency of the wavelength conversion member. Further, if the composition (X) does not contain a solvent, or if the content of the solvent is 1% by mass or less, the composition (X) after molding is formed, especially when the composition (X) is molded by an inkjet method. ), The thickness is less likely to decrease due to the volatilization of the solvent, and therefore the thickness of the wavelength conversion member is less likely to decrease. Therefore, the thickness of the wavelength conversion member can be secured as large as possible while molding by the inkjet method, and the wavelength conversion ability of the wavelength conversion member can be secured as large as possible. The content of the solvent is more preferably 0.5% by mass or less, further preferably 0.3% by mass or less, and particularly preferably 0.1% by mass or less. It is particularly preferable that the composition (X) does not contain a solvent or contains only a solvent that is inevitably mixed. The solvent content of the composition (X) may exceed 1% by mass.
 組成物(X)の硬化物のガラス転移温度は80℃以上であることが好ましい。すなわち、組成物(X)は、硬化することでガラス転移温度が80℃以上の硬化物になる性質を有することが好ましい。この場合、波長変換部材は良好な耐熱性を有することができる。そのため、例えば波長変換部材に温度上昇を伴う処理が施された場合に、波長変換部材が劣化しにくい。このため、例えば組成物(X)から作製された波長変換部材を覆うように保護層をプラズマCVD法といった蒸着法で作製する場合、波長変換部材が加熱されても、波長変換部材が劣化しにくい。また、耐熱性を高めることで、波長変換部材を、耐熱性に対する要求が厳しい車載用途に適合させることもできる。硬化物のガラス転移温度は90℃以上であればより好ましく、100℃以上であれば更に好ましい。この硬化物のガラス転移温度は、下記で詳細に説明される組成物(X)の組成によって達成可能である。 The glass transition temperature of the cured product of the composition (X) is preferably 80 ° C. or higher. That is, it is preferable that the composition (X) has a property of becoming a cured product having a glass transition temperature of 80 ° C. or higher when cured. In this case, the wavelength conversion member can have good heat resistance. Therefore, for example, when the wavelength conversion member is subjected to a process accompanied by a temperature rise, the wavelength conversion member is less likely to deteriorate. Therefore, for example, when the protective layer is manufactured by a vapor deposition method such as a plasma CVD method so as to cover the wavelength conversion member manufactured from the composition (X), the wavelength conversion member is less likely to deteriorate even if the wavelength conversion member is heated. .. Further, by increasing the heat resistance, the wavelength conversion member can be adapted to in-vehicle applications where the demand for heat resistance is strict. The glass transition temperature of the cured product is more preferably 90 ° C. or higher, and even more preferably 100 ° C. or higher. The glass transition temperature of this cured product can be achieved by the composition of the composition (X) described in detail below.
 組成物(X)の25℃での粘度は、30mPa・s以下であることが好ましい。この場合、組成物(X)を常温下でインクジェット法で成形することができる。この粘度が25mPa・s以下であればより好ましく、20mPa・s以下であれば更に好ましく、15mPa・s以下であれば特に好ましい。この粘度が1mPa・s以上であることも好ましく、5mPa・s以上であることも好ましい。 The viscosity of the composition (X) at 25 ° C. is preferably 30 mPa · s or less. In this case, the composition (X) can be molded by an inkjet method at room temperature. If the viscosity is 25 mPa · s or less, it is more preferable, if it is 20 mPa · s or less, it is further preferable, and if it is 15 mPa · s or less, it is particularly preferable. It is preferable that the viscosity is 1 mPa · s or more, and it is also preferable that the viscosity is 5 mPa · s or more.
 組成物(X)の40℃にa・おける粘度が30mPa・s以下であることも好ましい。この場合、常温における組成物(X)の粘度がいかなる値であっても、組成物(X)を僅かに加熱すれば低粘度化させることが可能である。このため、加熱すれば、組成物(X)をインクジェット法で成形することができる。また、組成物(X)を大きく加熱することなく低粘度化させることができるので、組成物(X)中の成分が揮発することによる組成物(X)の組成の変化を生じにくくできる。この粘度が25mPa・s以下であればより好ましく、20mPa・s以下であれば更に好ましく、15mPa・s以下であれば特に好ましい。この粘度が1mPa・s以上であることも好ましく、5mPs以上であることも好ましい。 It is also preferable that the viscosity of the composition (X) at 40 ° C. is 30 mPa · s or less. In this case, regardless of the viscosity of the composition (X) at room temperature, the viscosity can be reduced by slightly heating the composition (X). Therefore, if heated, the composition (X) can be molded by an inkjet method. Further, since the composition (X) can be reduced in viscosity without being significantly heated, it is possible to prevent the composition (X) from changing due to volatilization of the components in the composition (X). If the viscosity is 25 mPa · s or less, it is more preferable, if it is 20 mPa · s or less, it is further preferable, and if it is 15 mPa · s or less, it is particularly preferable. It is preferable that the viscosity is 1 mPa · s or more, and it is also preferable that the viscosity is 5 mPs or more.
 このような組成物(X)の25℃又は40℃における低い粘度は、下記で詳細に説明される組成物(X)の組成によって達成可能である。 The low viscosity of such composition (X) at 25 ° C. or 40 ° C. can be achieved by the composition of composition (X) described in detail below.
 組成物(X)20mgを、熱重量分析計を用いて100℃30分の条件で加熱する処理をした場合の揮発性は、40%以下であることが好ましい。組成物(X)の揮発性は、処理前の組成物(X)の重量に対する、処理後の組成物(X)の重量減少量(組成物(X)の、処理前の重量と処理後の重量との差)の百分比で規定される。この場合、組成物(X)の揮発性が低いことで、組成物(X)の保存安定性を高めることができる。また、波長変換部材からアウトガスが生じにくくなる。そのため、波長変換部材内にアウトガスに起因する空隙が更に生じにくくなる。組成物(X)の揮発性は、組成物(X)20mgを熱重量分析計を用いて100℃30分の条件で加熱する処理をし、処理前の重量に対する処理後の重量の重量減少量を算出することで求めることができる。組成物(X)20mgを、熱重量分析計を用いて100℃30分の条件で加熱する処理をした場合の揮発性は、30%以下であることがより好ましく、20%以下であれば更に好ましい。組成物(X)の揮発性の下限は特に限定されないが、例えば、0.1%以上であってよい。 The volatility when 20 mg of the composition (X) is heated using a thermogravimetric analyzer under the condition of 100 ° C. for 30 minutes is preferably 40% or less. The volatility of the composition (X) is the weight loss of the composition (X) after the treatment with respect to the weight of the composition (X) before the treatment (the weight of the composition (X) before the treatment and the weight after the treatment). It is defined as a percentage of the difference from the weight). In this case, the low volatility of the composition (X) can enhance the storage stability of the composition (X). In addition, outgas is less likely to be generated from the wavelength conversion member. Therefore, voids due to outgas are less likely to occur in the wavelength conversion member. The volatility of the composition (X) is determined by heating 20 mg of the composition (X) using a thermogravimetric analyzer under the condition of 100 ° C. for 30 minutes, and the weight loss after the treatment with respect to the weight before the treatment. Can be obtained by calculating. The volatility when 20 mg of the composition (X) is heated using a thermogravimetric analyzer at 100 ° C. for 30 minutes is more preferably 30% or less, and further preferably 20% or less. preferable. The lower limit of the volatility of the composition (X) is not particularly limited, but may be, for example, 0.1% or more.
 組成物(X)が含有する成分について、更に詳しく説明する。 The components contained in the composition (X) will be described in more detail.
 <反応硬化性化合物(A)>
 まず反応硬化性化合物(A)について説明する。反応硬化性化合物(A)は、例えば光硬化性化合物(A1)と熱硬化性化合物(A2)とのうち、少なくとも一方を含有する。
<Reaction-curable compound (A)>
First, the reaction-curable compound (A) will be described. The reaction-curable compound (A) contains, for example, at least one of a photocurable compound (A1) and a thermosetting compound (A2).
 光硬化性化合物(A1)は、例えば光重合開始剤(E)の存在下又は不存在下で、紫外線の照射を受けて重合反応を生じうる成分である。光重合開始剤(E)は硬化触媒を含んでもよい。光硬化性化合物(A1)は、例えばモノマー、オリゴマー及びプレポリマーからなる群から選択される少なくとも一種の成分を含有する。 The photocurable compound (A1) is a component capable of causing a polymerization reaction by being irradiated with ultraviolet rays in the presence or absence of, for example, a photopolymerization initiator (E). The photopolymerization initiator (E) may contain a curing catalyst. The photocurable compound (A1) contains at least one component selected from the group consisting of, for example, monomers, oligomers and prepolymers.
 光硬化性化合物(A1)は、例えばラジカル重合性化合物(A11)とカチオン重合性化合物(A12)とのうち少なくとも一方を含有する。光硬化性化合物(A1)がラジカル重合性化合物(A11)を含有する場合、組成物(X)は、光重合開始剤(E)として光ラジカル重合開始剤(E1)を更に含有することが好ましい。光硬化性化合物(A1)がカチオン重合性化合物(A12)を含有する場合、組成物(X)は、光重合開始剤(E)として、光カチオン重合開始剤(E2)(カチオン硬化触媒)を更に含有することが好ましい。 The photocurable compound (A1) contains, for example, at least one of a radically polymerizable compound (A11) and a cationically polymerizable compound (A12). When the photocurable compound (A1) contains a radically polymerizable compound (A11), the composition (X) preferably further contains a photoradical polymerization initiator (E1) as a photopolymerization initiator (E). .. When the photocurable compound (A1) contains a cationically polymerizable compound (A12), the composition (X) contains a photocationic polymerization initiator (E2) (cationic curing catalyst) as the photopolymerization initiator (E). Further, it is preferable to contain it.
 また、熱硬化性化合物(A2)は、例えばエポキシ基、オキセタン基、イソシアネート基、アミノ基、カルボキシル基、又はメチロール基などからなる少なくとも一種の、反応性官能基を有する。熱硬化性化合物(A2)は、例えばモノマー、オリゴマー及びプレポリマーからなる群から選択される少なくとも一種の成分を含有する。 Further, the thermosetting compound (A2) has at least one reactive functional group consisting of, for example, an epoxy group, an oxetane group, an isocyanate group, an amino group, a carboxyl group, a methylol group and the like. The thermosetting compound (A2) contains at least one component selected from the group consisting of, for example, monomers, oligomers and prepolymers.
 反応硬化性化合物(A)全体の25℃での粘度は50mPa・s以下であることが好ましい。この場合、反応硬化性化合物(A)は組成物(X)を特に低粘度化させることができる。反応硬化性化合物(A)全体の粘度は30mPa・s以下であれば更に好ましく、20mPa・s以下であれば特に好ましい。また、反応硬化性化合物(A)全体の粘度は例えば3mPa・s以上である。 The viscosity of the entire reaction-curable compound (A) at 25 ° C. is preferably 50 mPa · s or less. In this case, the reaction-curable compound (A) can make the composition (X) particularly low in viscosity. The viscosity of the entire reaction-curable compound (A) is more preferably 30 mPa · s or less, and particularly preferably 20 mPa · s or less. Further, the viscosity of the entire reaction-curable compound (A) is, for example, 3 mPa · s or more.
 反応硬化性化合物(A)全体の40℃での粘度が50mPa・s以下であることも好ましい。この場合、反応硬化性化合物(A)は、加熱された場合の組成物(X)を特に低粘度化させることができる。反応硬化性化合物(A)全体の粘度は30mPa・s以下であれば更に好ましく、20mPa・s以下であれば特に好ましい。また、反応硬化性化合物(A)全体の粘度は、例えば3mPa・s以上である。 It is also preferable that the viscosity of the entire reaction-curable compound (A) at 40 ° C. is 50 mPa · s or less. In this case, the reaction-curable compound (A) can make the composition (X) particularly low in viscosity when heated. The viscosity of the entire reaction-curable compound (A) is more preferably 30 mPa · s or less, and particularly preferably 20 mPa · s or less. The viscosity of the entire reaction-curable compound (A) is, for example, 3 mPa · s or more.
 反応硬化性化合物(A)中の、沸点が270℃以上である成分の百分比は、80質量%以上であることが好ましい。この場合、組成物(X)の保存安定性が特に損なわれにくく、かつ硬化物からアウトガスが特に生じにくい。反応硬化性化合物(A)中の、沸点が280℃以上である成分の百分比が80質量%以上であれば、更に好ましい。 The percentage of the component having a boiling point of 270 ° C. or higher in the reaction-curable compound (A) is preferably 80% by mass or more. In this case, the storage stability of the composition (X) is particularly unlikely to be impaired, and outgas is particularly unlikely to be generated from the cured product. It is more preferable that the percentage of the component having a boiling point of 280 ° C. or higher in the reaction-curable compound (A) is 80% by mass or more.
 反応硬化性化合物(A)は、25℃での粘度が20mPa・s以下である成分を含有することが好ましい。この場合、組成物(X)を低粘度化できる。 The reaction-curable compound (A) preferably contains a component having a viscosity at 25 ° C. of 20 mPa · s or less. In this case, the viscosity of the composition (X) can be reduced.
 反応硬化性化合物(A)全量に対する、25℃での粘度が20mPa・s以下である成分の割合は、50質量%以上100質量%以下であることが好ましい。この場合、組成物(X)を特に低粘度化でき、組成物(X)をインクジェット法で特に容易に塗布できる。この割合は、60質量%以上であることがより好ましく、70質量%以上であることが更に好ましい。また、この割合は、95質量%以下であることもより好ましく、90質量%以下であることも更に好ましい。 The ratio of the component having a viscosity of 20 mPa · s or less at 25 ° C. to the total amount of the reaction-curable compound (A) is preferably 50% by mass or more and 100% by mass or less. In this case, the composition (X) can be made particularly low in viscosity, and the composition (X) can be applied particularly easily by an inkjet method. This ratio is more preferably 60% by mass or more, and further preferably 70% by mass or more. Further, this ratio is more preferably 95% by mass or less, and further preferably 90% by mass or less.
 25℃での粘度が20mPa・s以下である成分は、80℃以上のガラス転移温度を有する化合物を含有することが好ましい。この場合、組成物(X)を低粘度化しながら、硬化物のガラス転移温度を高めることができる。この成分は、90℃以上のガラス転移温度を有する化合物を含有すればより好ましく、100℃以上のガラス転移温度を有する化合物を含有すれば更に好ましい。この成分に含まれる化合物のガラス転移温度の上限に制限はないが、例えば150℃以下である。 The component having a viscosity at 25 ° C. of 20 mPa · s or less preferably contains a compound having a glass transition temperature of 80 ° C. or higher. In this case, the glass transition temperature of the cured product can be increased while reducing the viscosity of the composition (X). It is more preferable that this component contains a compound having a glass transition temperature of 90 ° C. or higher, and even more preferably if it contains a compound having a glass transition temperature of 100 ° C. or higher. The upper limit of the glass transition temperature of the compound contained in this component is not limited, but is, for example, 150 ° C. or lower.
 反応硬化性化合物(A)は、特に光硬化性化合物(A1)を含有することが好ましい。この場合、組成物(X)を硬化させるに当たって加熱する必要がないため、特に波長変換部材として発光装置11におけるカラーレジスト1を作製する場合に、発光装置11における光源等が熱により損傷しにくくできる。 The reaction-curable compound (A) preferably contains a photocurable compound (A1). In this case, since it is not necessary to heat the composition (X) in order to cure it, the light source or the like in the light emitting device 11 can be less likely to be damaged by heat, particularly when the color resist 1 in the light emitting device 11 is manufactured as a wavelength conversion member. ..
 光硬化性化合物(A1)がラジカル重合性化合物(A11)を含有する場合、ラジカル重合性化合物(A11)は、アクリル化合物(Y)を含有することが好ましい。アクリル化合物(Y)は、一分子中に一つ以上の(メタ)アクリロイル基を有する。 When the photocurable compound (A1) contains a radically polymerizable compound (A11), the radically polymerizable compound (A11) preferably contains an acrylic compound (Y). The acrylic compound (Y) has one or more (meth) acryloyl groups in one molecule.
 アクリル化合物(Y)が含みうる化合物について説明する。 The compound that the acrylic compound (Y) can contain will be described.
 アクリル化合物(Y)は、一分子中に(メタ)アクリロイル基を含む二つ以上のラジカル重合性官能基を有する多官能アクリル化合物(Y1)を含有することが好ましい。この場合、多官能アクリル化合物(Y1)は、硬化物のガラス転移温度を高めることができ、このため、硬化物の耐熱性を高めることができる。多官能アクリル化合物(Y1)の割合は、アクリル化合物(Y)全体に対して50質量%以上100質量%以下であることが好ましい。アクリル化合物(Y)は、多官能アクリル化合物(Y1)のみを含有してもよい。 The acrylic compound (Y) preferably contains a polyfunctional acrylic compound (Y1) having two or more radically polymerizable functional groups containing a (meth) acryloyl group in one molecule. In this case, the polyfunctional acrylic compound (Y1) can increase the glass transition temperature of the cured product, and thus can increase the heat resistance of the cured product. The ratio of the polyfunctional acrylic compound (Y1) is preferably 50% by mass or more and 100% by mass or less with respect to the entire acrylic compound (Y). The acrylic compound (Y) may contain only the polyfunctional acrylic compound (Y1).
 多官能アクリル化合物(Y1)は、例えば1,3-ブチレングリコールジ(メタ)アクリレート、1,4-ブタンジオールオリゴアクリレート、ジエチレングリコールジアクリレート、1,6-ヘキサンジオールオリゴアクリレート、ネオペンチルグリコールジアクリレート、トリエチレングリコールジアクリレート、トリプロピレングリコールジアクリレート、ジプロピレングリコールジアクリレート、シクロヘキサンジメタノールジアクリレート、トリシクロデカンジメタノールジアクリレート、ビスフェノールAポリエトキシジアクリレート、ビスフェノールFポリエトキシジアクリレート、ペンタエリスリトールテトラアクリレート、プロポキシ化(2)ネオペンチルグリコールジアクリレート、トリメチロールプロパントリアクリレート、トリス(2-ヒドロキシエチル)イソシアヌレートトリアクリレート、ペンタエリスリトールトリアクリレート、エトキシ化(3)トリメチロールプロパントリアクリレート、プロポキシ化(3)グリセリルトリアクリレート、ペンタエリスリトールテトラアクリレート、ジトリメチロールプロパンテトラアクリレート、エトキシ化(4)ペンタエリスリトールテトラアクリレート、ジペンタエリスリトールペンタアクリレート、アクリル酸2-(2-エトキシエトキシ)エチル、ヘキサジオールジアクリレート、ポリエチレングリコールジアクリレート、ポリエチレングリコールジメタクリレート、トリプロピレングリコールトリアクリレート、ビスペンタエリスリトールヘキサアクリレート、エチレングリコールジアクリレート、1,6-ヘキサンジオールジアクリレート、エトキシ化1,6-ヘキサンジオールジアクリレート、ポリプロピレングリコールジアクリレート、1,4-ブタンジオールジアクリレート、1,9-ノナンジオールジアクリレート、テトラエチレングリコールジアクリレート、2-n-ブチル-2-エチル-1,3-プロパンジオールジアクリレート、ヒドロキシピバリン酸ネオペンチルグリコールジアクリレート、ヒドロキシピバリン酸トリメチロールプロパントリアクリレート、エトキシ化リン酸トリアクリレート、エトキシ化トリプロピレングリコールジアクリレート、ネオペンチルグリコール変性トリメチロールプロパンジアクリレート、ステアリン酸変性ペンタエリスリトールジアクリレート、テトラメチロールプロパントリアクリレート、テトラメチロールメタントリアクリレート、カプロラクトン変性トリメチロールプロパントリアクリレート、プロポキシレートグリセリルトリアクリレート、テトラメチロールメタンテトラアクリレート、エトキシ化ペンタエリスリトールテトラアクリレート、ジペンタエリスリトールヘキサアクリレート、カプロラクトン変性ジペンタエリスリトールヘキサアクリレート、ジペンタエリスリトールヒドロキシペンタアクリレート、ネオペンチルグリコールオリゴアクリレート、トリメチロールプロパンオリゴアクリレート、ペンタエリスリトールオリゴアクリレート、エトキシ化ネオペンチルグリコールジ(メタ)アクリレート、プロポキシ化ネオペンチルグリコールジ(メタ)アクリレート、トリプロピレングリコールジ(メタ)アクリレート、エトキシ化トリメチロールプロパントリアクリレート、プロポキシ化トリメチロールプロパントリアクリレート、及びアクリル酸2-(2-ビニロキシエトキシ)エチル、からなる群から選択される少なくとも一種の化合物を含有する。 The polyfunctional acrylic compound (Y1) is, for example, 1,3-butylene glycol di (meth) acrylate, 1,4-butanediol oligo acrylate, diethylene glycol diacrylate, 1,6-hexanediol oligo acrylate, neopentyl glycol diacrylate, Triethylene glycol diacrylate, tripropylene glycol diacrylate, dipropylene glycol diacrylate, cyclohexanedimethanol diacrylate, tricyclodecanedimethanol diacrylate, bisphenol A polyethoxydiacrylate, bisphenol F polyethoxydiacrylate, pentaerythritol tetraacrylate , Propoxylation (2) Neopentyl glycol diacrylate, Trimethylol propantriacrylate, Tris (2-hydroxyethyl) isocyanurate triacrylate, Pentaerythritol triacrylate, ethoxylated (3) Trimethylol propoxytriacrylate, Propoxylation (3) ) Glyceryltriacrylate, pentaerythritol tetraacrylate, ditrimethylolpropanetetraacrylate, ethoxylated (4) pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, 2- (2-ethoxyethoxy) ethyl acrylate, hexadiol diacrylate, polyethylene Glycol diacrylate, polyethylene glycol dimethacrylate, tripropylene glycol triacrylate, bispentaerythritol hexaacrylate, ethylene glycol diacrylate, 1,6-hexanediol diacrylate, ethoxylated 1,6-hexanediol diacrylate, polypropylene glycol diacrylate , 1,4-Butanediol diacrylate, 1,9-nonanediol diacrylate, tetraethylene glycol diacrylate, 2-n-butyl-2-ethyl-1,3-propanediol diacrylate, neopentyl glycol hydroxypivalate Diacrylate, hydroxypivalic acid trimethylolpropane triacrylate, ethoxylated phosphate triacrylate, ethoxylated tripropylene glycol diacrylate, neopentyl glycol-modified trimethylol propanediacrylate, stearate-modified pentaerythritol diacrylate, tetramethylol propanetriac Relate, tetramethylolmethane triacrylate, caprolactone-modified trimethylolpropane triacrylate, propoxylate glyceryl triacrylate, tetramethylolmethane tetraacrylate, ethoxylated pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, caprolactone-modified dipentaerythritol hexaacrylate, di Pentaerythritol hydroxypentaacrylate, neopentyl glycol oligoacrylate, trimethylolpropane oligoacrylate, pentaerythritol oligoacrylate, ethoxylated neopentyl glycol di (meth) acrylate, propoxylated neopentyl glycol di (meth) acrylate, tripropylene glycol di ( It contains at least one compound selected from the group consisting of meth) acrylates, ethoxylated trimethylolpropane triacrylates, propoxylated trimethylolpropane triacrylates, and 2- (2-vinyloxyethoxy) ethyl acrylate.
 多官能アクリル化合物(Y1)のアクリル当量は、150g/eq以下であることが好ましく、90g/eq以上150g/eq以下であることがより好ましい。多官能アクリル化合物(Y1)の重量平均分子量は、例えば100以上1000以下であり、200以上800以下がより好ましい。 The acrylic equivalent of the polyfunctional acrylic compound (Y1) is preferably 150 g / eq or less, and more preferably 90 g / eq or more and 150 g / eq or less. The weight average molecular weight of the polyfunctional acrylic compound (Y1) is, for example, 100 or more and 1000 or less, and more preferably 200 or more and 800 or less.
 多官能アクリル化合物(Y1)が、下記式(200)に示す構造を有する化合物(Y11)を含有することが好ましい。 It is preferable that the polyfunctional acrylic compound (Y1) contains a compound (Y11) having a structure represented by the following formula (200).
 CH=CR-COO-(R-O)-CO-CR=CH  …(200)
式(200)において、R及びRの各々は水素又はメチル基、nは1以上の整数、Rは炭素数1以上のアルキレン基であり、nが2以上の場合は一分子中の複数のRは互いに同一であっても異なっていてもよい。
CH 2 = CR 1 -COO- (R 3 -O) n -CO-CR 2 = CH 2 ... (200)
In formula (200), each of R 1 and R 2 is a hydrogen or methyl group, n is an integer of 1 or more, R 3 is an alkylene group having 1 or more carbon atoms, and when n is 2 or more, it is in one molecule. The plurality of R3s may be the same as or different from each other.
 化合物(Y11)は、式(200)に示す構造を有すること、特に式(200)のRの炭素数が3以上であることにより、硬化物の水との親和性を高めにくい。このため、蛍光体(B)が水によって劣化しにくい。Rの炭素数は、例えば1以上15以下であり、好ましくは3以上15以下である。また、化合物(Y11)は、式(200)に示す構造を有すること、特に一分子中に二つの(メタ)アクリロイル基を有することにより、硬化物のガラス転移温度を高めることができ、このため、硬化物の耐熱性を高めることができる。また、式(200)のnは、例えば1以上12以下の整数である。 Since the compound (Y11) has the structure represented by the formula (200), and particularly the carbon number of R3 of the formula (200) is 3 or more, it is difficult to increase the affinity of the cured product with water. Therefore, the phosphor (B) is less likely to be deteriorated by water. The carbon number of R 3 is, for example, 1 or more and 15 or less, preferably 3 or more and 15 or less. Further, the compound (Y11) has a structure represented by the formula (200), and in particular, by having two (meth) acryloyl groups in one molecule, the glass transition temperature of the cured product can be increased, and therefore the glass transition temperature can be increased. , The heat resistance of the cured product can be improved. Further, n in the equation (200) is, for example, an integer of 1 or more and 12 or less.
 アクリル化合物(Y)に対する化合物(Y11)の百分比は50質量%以上であることが好ましい。この場合、硬化物の水に対する親和性が特に高められにくい。アクリル化合物(Y)に対する化合物(Y11)の百分比は、例えば100質量%以下であり、又は95質量%以下であり、好ましくは80質量%以下である。 The percentage of the compound (Y11) to the acrylic compound (Y) is preferably 50% by mass or more. In this case, it is difficult to increase the affinity of the cured product for water. The percentage of the compound (Y11) to the acrylic compound (Y) is, for example, 100% by mass or less, or 95% by mass or less, preferably 80% by mass or less.
 化合物(Y11)は、特に沸点が270℃以上である成分を含有することが好ましい。すなわち、アクリル化合物(Y)は、式(200)に示す構造を有し、かつ沸点が270℃以上である成分を含有することが好ましい。この場合、組成物(X)の保存中及び組成物(X)が加熱された場合に、組成物(X)からアクリル化合物(Y)が揮発しにくい。そのため、組成物(X)の保存安定性が損なわれにくい。また、組成物(X)の硬化物中に化合物(Y11)が未反応で残留していても、硬化物から化合物(Y11)に起因するアウトガスが生じにくい。そのため、カラーフィルタ2内に、アウトガスによる空隙が生じにくい。カラーフィルタ2中に空隙があると空隙を通じてカラーレジスト1に水分が侵入してしまうおそれがあるが、空隙が生じにくいと、カラーレジスト1に水分が侵入しにくい。なお、沸点は、減圧下の沸点を換算して得られる常圧下の沸点であり、例えばScience of Petroleum, Vol.II. P.1281(1938)に示される方法で求められる。化合物(Y11)が沸点が280℃以上である成分を含有すればより好ましい。 The compound (Y11) preferably contains a component having a boiling point of 270 ° C. or higher. That is, the acrylic compound (Y) preferably contains a component having a structure represented by the formula (200) and having a boiling point of 270 ° C. or higher. In this case, the acrylic compound (Y) is less likely to volatilize from the composition (X) during storage of the composition (X) and when the composition (X) is heated. Therefore, the storage stability of the composition (X) is not easily impaired. Further, even if the compound (Y11) remains unreacted in the cured product of the composition (X), outgas caused by the compound (Y11) is unlikely to be generated from the cured product. Therefore, voids due to outgas are unlikely to occur in the color filter 2. If there are voids in the color filter 2, water may invade the color resist 1 through the voids, but if the voids are less likely to occur, it is difficult for water to invade the color resist 1. The boiling point is the boiling point under normal pressure obtained by converting the boiling point under reduced pressure, and is obtained by, for example, the method shown in Science of Petroleum, Vol.II. P.1281 (1938). It is more preferable that the compound (Y11) contains a component having a boiling point of 280 ° C. or higher.
 アクリル化合物(Y)に対する化合物(Y11)の百分比は50質量%以上であることが好ましい。この場合、組成物(X)の保存安定性が効果的に高められ、かつ硬化物からのアウトガス発生が効果的に低減され、更に硬化物の水に対する親和性が特に高められにくい。アクリル化合物(Y)に対する化合物(Y11)の百分比は、例えば100質量%以下であり、又は95質量%以下であり、好ましくは80質量%以下である。 The percentage of the compound (Y11) to the acrylic compound (Y) is preferably 50% by mass or more. In this case, the storage stability of the composition (X) is effectively enhanced, the outgas generation from the cured product is effectively reduced, and the affinity of the cured product with water is particularly difficult to be enhanced. The percentage of the compound (Y11) to the acrylic compound (Y) is, for example, 100% by mass or less, or 95% by mass or less, preferably 80% by mass or less.
 化合物(Y11)の25℃での粘度は25mPa・s以下であることが好ましい。この場合、化合物(Y11)は組成物(X)の粘度を低めることができる。化合物(Y11)の25℃での粘度は、25mPa・s以下であればより好ましく、20mPa・s以下であれば更に好ましく、15mPa・s以下であれば特に好ましい。また、化合物(Y11)の25℃での粘度は、例えば1mPa・s以上であり、3mPa・s以上であれば好ましく、5mPa・s以上であれば更に好ましい。 The viscosity of compound (Y11) at 25 ° C. is preferably 25 mPa · s or less. In this case, the compound (Y11) can reduce the viscosity of the composition (X). The viscosity of the compound (Y11) at 25 ° C. is more preferably 25 mPa · s or less, further preferably 20 mPa · s or less, and particularly preferably 15 mPa · s or less. The viscosity of the compound (Y11) at 25 ° C. is, for example, 1 mPa · s or more, preferably 3 mPa · s or more, and even more preferably 5 mPa · s or more.
 化合物(Y11)は、例えばアルキレングリコールジ(メタ)アクリレートと、ポリアルキレングルコールジ(メタ)アクリレートと、アルキレンオキサイド変性アルキレングリコールジ(メタ)アクリレートとからなる群から選択される少なくとも一種の化合物を含有する。 The compound (Y11) is, for example, at least one compound selected from the group consisting of an alkylene glycol di (meth) acrylate, a polyalkylene glycol di (meth) acrylate, and an alkylene oxide-modified alkylene glycol di (meth) acrylate. contains.
 アルキレングリコールジ(メタ)アクリレートは、式(200)においてnが1である化合物である。この場合、式(200)におけるRの炭素数は4~12であることが好ましい。Rは、直鎖状でもよく、分岐を有していてもよい。特にアルキレングリコールジ(メタ)アクリレートは、1,4-ブタンジオールジアクリレート、1,3-ブチレングリコールジアクリレート、ネオペンチルグリコールジアクリレート、1,6-ヘキサンジオールジアクリレート、1,9-ノナンジオールジアクリレート、1,10-デカンジオールジアクリレート、1,4-ブタンジオールジメタクリレート、1,3-ブチレングリコールジメタクリレート、ネオペンチルグリコールジメタクリレート、1,6-ヘキサンジオールジメタクリレート、1,9-ノナンジオールジメタクリレート、1,10-デカンジオールジメタクリレート、1,12-ドデカンジオールジメタクリレートからなる群から選択される少なくとも一種の化合物を含有することが好ましい。また、アルキレングリコールジ(メタ)アクリレートは、サートマー社製の品番SR213、大阪有機化学工業社製の品番V195、サートマー社製の品番SR212、サートマー社製の品番SR247、共栄化学工業社製の品名ライトアクリレートNP-A、サートマー社製の品番SR238NS、大阪有機化学工業社製の品番V230、ダイセル社製の品番HDDA、共栄化学工業社製の品番1,6HX-A、大阪有機化学工業社製の品番V260、共栄化学工業社製の品番1,9-ND-A、新中村化学工業社製の品番A-NOD-A、サートマー社製の品番CD595、サートマー社製の品番SR214NS、新中村化学工業社製の品番BD、サートマー社製の品番SR297、サートマー社製の品番SR248、共栄化学工業社製の品名ライトエステルNP、サートマー社製の品番SR239NS、共栄化学工業社製の品名ライトエステル1,6HX、新中村化学工業社製の品番HD-N、共栄化学工業社製の品名ライトエステル1,9ND、新中村化学工業社製の品番NOD-N、共栄化学工業社製の品名ライトエステル1,10DC、新中村化学工業社製の品番DOD-N、及びサートマー社製の品番SR262からなる群から選択される少なくとも一種の化合物を含有することが好ましい。 The alkylene glycol di (meth) acrylate is a compound in which n is 1 in the formula (200). In this case , the carbon number of R3 in the formula (200) is preferably 4 to 12. R3 may be linear or may have a branch. In particular, the alkylene glycol di (meth) acrylate is 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, neopentyl glycol diacrylate, 1,6-hexanediol diacrylate, 1,9-nonanediol di. Acrylic, 1,10-decanediol diacrylate, 1,4-butanediol dimethacrylate, 1,3-butylene glycol dimethacrylate, neopentyl glycol dimethacrylate, 1,6-hexanediol dimethacrylate, 1,9-nonanediol It preferably contains at least one compound selected from the group consisting of dimethacrylate, 1,10-decanediol dimethacrylate and 1,12-dodecanediol dimethacrylate. In addition, the alkylene glycol di (meth) acrylate has a product number SR213 manufactured by Sartmer, a product number V195 manufactured by Osaka Organic Chemical Industry Co., Ltd., a product number SR212 manufactured by Sartmer Co., Ltd., a product number SR247 manufactured by Sartmer Co., Ltd., and a product name light manufactured by Kyoei Chemical Industry Co., Ltd. Acrylate NP-A, product number SR238NS manufactured by Sartmer, product number V230 manufactured by Osaka Organic Chemical Industry Co., Ltd., product number HDDA manufactured by Daicel Co., Ltd., product number 1,6HX-A manufactured by Kyoei Chemical Industry Co., Ltd., product number manufactured by Osaka Organic Chemical Industry Co., Ltd. V260, product number 1,9-ND-A manufactured by Kyoei Chemical Industry Co., Ltd., product number A-NOD-A manufactured by Shin-Nakamura Chemical Industry Co., Ltd., product number CD595 manufactured by Sartmer Co., Ltd., product number SR214NS manufactured by Sartmer Co., Ltd. Product number BD, product number SR297 manufactured by Sartmer, product number SR248 manufactured by Sartmer, product name Light Ester NP manufactured by Kyoei Chemical Industry Co., Ltd., product number SR239NS manufactured by Sartmer Co., Ltd., product name Light Ester 1,6HX manufactured by Kyoei Chemical Industry Co., Ltd. Product number HD-N manufactured by Shin-Nakamura Chemical Industry Co., Ltd., product name Light Ester 1,9ND manufactured by Kyoei Chemical Industry Co., Ltd., product number NOD-N manufactured by Shin-Nakamura Chemical Industry Co., Ltd., product name Light Ester 1,10DC manufactured by Kyoei Chemical Industry Co., Ltd. It is preferable to contain at least one compound selected from the group consisting of the product number DOD-N manufactured by Shin-Nakamura Chemical Industry Co., Ltd. and the product number SR262 manufactured by Sartmer Co., Ltd.
 ポリアルキレングリコールジ(メタ)アクリレートは、例えば式(200)においてnが2以上である化合物である。nは例えば2~10であり、2~7であることが好ましく、2~6であることも好ましく、2~3であることも好ましい。Rの炭素数は例えば2~7であり、好ましくは2~5である。炭素数が多いほど、硬化物の疎水性が高くなり、硬化物が水分を透過させにくい。ポリアルキレングリコールジ(メタ)アクリレートは、特にジエチレングリコールジアクリレート、ジエチレングリコールジメタクリレート、トリエチレングリコールジメタクリレート、テトラエチレングリコールジメタクリレート、ヘキサエチレングリコールジメタクリレート、ジプロピレングリコールジアクリレート、トリプロピレングリコールジアクリレート、トリプロピレングリコールジメタクリレート、トリテトラメチレングリコールジアクリレート、ポリエチレングリコール200ジメタクリレート及びポリエチレングリコール200ジアクリレートからなる群から選択される少なくとも一種の化合物を含有することが好ましい。また、ポリアルキレングリコールジ(メタ)アクリレートは、特にサートマー社製の品番SR230、サートマー社製の品番SR508NS、ダイセル社製の品番DPGDA、サートマー社製の品番SR306NS、ダイセル社製の品番TPGDA、大阪有機化学工業社製の品番V310HP、新中村化学工業社製の品番APG200、共栄化学工業株式会社製の品名ライトアクリレートPTMGA-250、サートマー社製の品番SR231NS、共栄化学工業社製の品名ライトエステル2EG、サートマー社製の品番SR205NS、共栄化学工業社製の品名ライトエステル3EG、サートマー社製の品番SR210NS、共栄化学工業社製の品名ライトエステル4EG、三菱化学社製の品名アクリエステルHX及び新中村化学工業社製の品番3PGからなる群から選択される少なくとも一種の化合物を含有することが好ましい。 The polyalkylene glycol di (meth) acrylate is, for example, a compound in which n is 2 or more in the formula (200). n is, for example, 2 to 10, preferably 2 to 7, preferably 2 to 6, and preferably 2 to 3. The carbon number of R3 is , for example, 2 to 7, preferably 2 to 5. The higher the number of carbon atoms, the higher the hydrophobicity of the cured product, and the more difficult it is for the cured product to permeate moisture. Polyalkylene glycol di (meth) acrylates include, in particular, diethylene glycol diacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, hexaethylene glycol dimethacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, and tri. It preferably contains at least one compound selected from the group consisting of propylene glycol dimethacrylate, tritetramethylene glycol diacrylate, polyethylene glycol 200 dimethacrylate and polyethylene glycol 200 diacrylate. Further, the polyalkylene glycol di (meth) acrylate is particularly the product number SR230 manufactured by Sartmer, the product number SR508NS manufactured by Sartmer, the product number DPGDA manufactured by Dycel, the product number SR306NS manufactured by Sartmer, the product number TPGDA manufactured by Dysel, and Osaka Organic. Product number V310HP manufactured by Chemical Industry Co., Ltd., Product number APG200 manufactured by Shin-Nakamura Chemical Industry Co., Ltd., Product name Light Acrylate PTMGA-250 manufactured by Kyoei Chemical Industry Co., Ltd., Product number SR231NS manufactured by Sartmer Co., Ltd., Product name Light Ester 2EG manufactured by Kyoei Chemical Industry Co., Ltd. Product number SR205NS manufactured by Sartmer, product name Light Ester 3EG manufactured by Kyoei Chemical Industry Co., Ltd., product name SR210NS manufactured by Sartmer Co., Ltd., product name Light Ester 4EG manufactured by Kyoei Chemical Industry Co., Ltd. It is preferable to contain at least one compound selected from the group consisting of product number 3PG manufactured by the company.
 アルキレンオキサイド変性アルキレングリコールジ(メタ)アクリレートは、例えばプロピレンオキサイド変性ネオペンチルグリコールを含有する。また、アルキレンオキサイド変性アルキレングリコールジ(メタ)アクリレートは、例えばダイセル社製の品番EBECRYL145を含有する。 The alkylene oxide-modified alkylene glycol di (meth) acrylate contains, for example, propylene oxide-modified neopentyl glycol. Further, the alkylene oxide-modified alkylene glycol di (meth) acrylate contains, for example, product number EBECRYL145 manufactured by Daicel Corporation.
 アクリル化合物(Y)が式(200)に示す構造を有する化合物(Y11)を含有する場合、化合物(Y11)は、式(200)中のnの値が5以上の化合物を含まないことが好ましい。(R-O)がポリエチレングリコール骨格である場合に、式(200)中のnの値が5より大きい化合物を含まないことが特に好ましい。化合物(Y11)が式(200)中のnの値が5より大きい化合物を含む場合でも、アクリル化合物(Y)に対する、式(200)中のnの値が5より大きい化合物の百分比は、20質量%以下であることが好ましい。また、化合物(Y11)が式(200)中のnの値が5より大きい化合物を含む場合でも、化合物(Y11)は、nの値が9よりも大きい化合物を含まないことが好ましく、nの値が7よりも大きい化合物を含まないことが更に好ましい。これらの場合、組成物(X)の粘度上昇が特に生じにくくなる。 When the acrylic compound (Y) contains a compound (Y11) having a structure represented by the formula (200), the compound (Y11) preferably does not contain a compound having an n value of 5 or more in the formula (200). .. (R 3 -O) When n is a polyethylene glycol skeleton, it is particularly preferable that the compound having a value of n greater than 5 in the formula (200) is not contained. Even when compound (Y11) contains a compound having a value of n greater than 5 in the formula (200), the percentage of the compound having a value of n greater than 5 in the formula (200) to the acrylic compound (Y) is 20. It is preferably mass% or less. Further, even when the compound (Y11) contains a compound having an n value greater than 5 in the formula (200), the compound (Y11) preferably does not contain a compound having an n value greater than 9. It is more preferred that it does not contain compounds with a value greater than 7. In these cases, the increase in viscosity of the composition (X) is particularly unlikely to occur.
 多官能アクリル化合物(Y1)がポリアルキレングリコールジ(メタ)アクリレートを含有すれば、特に好ましい。ポリアルキレングリコールジ(メタ)アクリレートは、粘度が低く、かつ揮発しにくいため、組成物(X)の低粘度化に寄与でき、かつ組成物(X)の保存安定性の向上及び硬化物からのアウトガスの低減に寄与できる。 It is particularly preferable if the polyfunctional acrylic compound (Y1) contains a polyalkylene glycol di (meth) acrylate. Since the polyalkylene glycol di (meth) acrylate has a low viscosity and is hard to volatilize, it can contribute to lowering the viscosity of the composition (X), and the storage stability of the composition (X) is improved and the cured product is used. It can contribute to the reduction of outgas.
 多官能アクリル化合物(Y1)がポリアルキレングリコールジ(メタ)アクリレートを含有する場合、アクリル化合物(Y)に対するポリアルキレングリコールジ(メタ)アクリレートの割合は、40質量%以上80質量%以下であることが好ましい。ポリアルキレングリコールジ(メタ)アクリレートの割合が40質量%以上であると、組成物(X)の粘度を効果的に低下できる。ポリアルキレングリコールジ(メタ)アクリレートの割合が80質量%以下であると、分子中に三つ以上の(メタ)アクリロイル基を有する化合物の割合が増加し、組成物(X)の反応性、及び硬化物のガラス転移温度を高めることができる。この割合は42質量%以上75質量%以下であればより好ましく、45質量%以上70質量%以下であれば更に好ましい。 When the polyfunctional acrylic compound (Y1) contains a polyalkylene glycol di (meth) acrylate, the ratio of the polyalkylene glycol di (meth) acrylate to the acrylic compound (Y) is 40% by mass or more and 80% by mass or less. Is preferable. When the proportion of the polyalkylene glycol di (meth) acrylate is 40% by mass or more, the viscosity of the composition (X) can be effectively reduced. When the proportion of the polyalkylene glycol di (meth) acrylate is 80% by mass or less, the proportion of the compound having three or more (meth) acryloyl groups in the molecule increases, and the reactivity of the composition (X) and the reactivity of the composition (X) are increased. The glass transition temperature of the cured product can be increased. This ratio is more preferably 42% by mass or more and 75% by mass or less, and further preferably 45% by mass or more and 70% by mass or less.
 多官能アクリル化合物(Y1)は、一分子中に(メタ)アクリロイル基を含む三つ以上のラジカル重合性官能基を有する化合物を含有してもよい。この場合、多官能アクリル化合物(Y1)は、例えばトリメチロールプロパントリアクリレート、トリメチロールプロパントリメタクリレート及びペンタエリスリトールテトラ(メタ)アクリレートからなる群から選択される少なくとも一種を含有できる。この場合、硬化物のガラス転移温度を特に高めることができ、このため、硬化物の耐熱性を特に高めることができる。 The polyfunctional acrylic compound (Y1) may contain a compound having three or more radically polymerizable functional groups containing a (meth) acryloyl group in one molecule. In this case, the polyfunctional acrylic compound (Y1) can contain at least one selected from the group consisting of, for example, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate and pentaerythritol tetra (meth) acrylate. In this case, the glass transition temperature of the cured product can be particularly increased, and therefore the heat resistance of the cured product can be particularly increased.
 多官能アクリル化合物(Y1)は、特にペンタエリスリトールテトラ(メタ)アクリレートを含有することが好ましい。この場合、硬化物のガラス転移温度を特に高めることができ、かつ組成物(X)の反応性を向上させることができる。組成物(X)の反応性が向上すると、大気雰囲気等の酸素を含む環境下で組成物(X)を容易に硬化させることができる。 The polyfunctional acrylic compound (Y1) preferably contains pentaerythritol tetra (meth) acrylate. In this case, the glass transition temperature of the cured product can be particularly increased, and the reactivity of the composition (X) can be improved. When the reactivity of the composition (X) is improved, the composition (X) can be easily cured in an environment containing oxygen such as an atmospheric atmosphere.
 多官能アクリル化合物(Y1)がペンタエリスリトールテトラ(メタ)アクリレートを含有する場合、アクリル化合物(Y)に対するペンタエリスリトールテトラ(メタ)アクリレートの割合は、0.5質量%以上10質量%以下であることが好ましい。この場合、組成物(X)の高い反応性と低粘度とを両立可能である。この割合は1質量%以上9質量%以下であればより好ましく、2質量%以上8質量%以下であれば更に好ましい。 When the polyfunctional acrylic compound (Y1) contains pentaerythritol tetra (meth) acrylate, the ratio of pentaerythritol tetra (meth) acrylate to the acrylic compound (Y) shall be 0.5% by mass or more and 10% by mass or less. Is preferable. In this case, it is possible to achieve both high reactivity and low viscosity of the composition (X). This ratio is more preferably 1% by mass or more and 9% by mass or less, and further preferably 2% by mass or more and 8% by mass or less.
 多官能アクリル化合物(Y1)は、ベンゼン環、脂環及び極性基のうち少なくとも一つを有してもよい。極性基は、例えばOH基及びNHCO基のうち少なくとも一方である。この場合、組成物(X)が硬化する際の収縮を特に低減できる。さらに、硬化物と、窒化ケイ素、酸化ケイ素といった無機化合物との間の密着性を高めることもできる。多官能アクリル化合物(Y1)は、特にトリシクロデカンジメタノールジアクリレート、ビスフェノールAポリエトキシジアクリレート、ビスフェノールFポリエトキシジアクリレート、トリメチロールプロパントリアクリレート及びペンタエリスリトールトリアクリレートからなる群から選択される少なくとも一種の化合物を含有することが好ましい。これらの化合物は、組成物(X)が硬化する際の収縮を特に低減できる。さらに、これらの化合物は、硬化物と、窒化ケイ素、酸化ケイ素といった無機化合物との間の密着性を高めることもできる。 The polyfunctional acrylic compound (Y1) may have at least one of a benzene ring, an alicyclic and a polar group. The polar group is, for example, at least one of an OH group and an NHCO group. In this case, shrinkage when the composition (X) is cured can be particularly reduced. Further, it is possible to enhance the adhesion between the cured product and an inorganic compound such as silicon nitride or silicon oxide. The polyfunctional acrylic compound (Y1) is particularly selected from the group consisting of tricyclodecanedimethanol diacrylate, bisphenol A polyethoxydiacrylate, bisphenol F polyethoxydiacrylate, trimethylolpropane triacrylate and pentaerythritol triacrylate. It preferably contains one type of compound. These compounds can particularly reduce shrinkage as the composition (X) cures. Furthermore, these compounds can also enhance the adhesion between the cured product and inorganic compounds such as silicon nitride and silicon oxide.
 硬化物と無機材料との密着性が高まると、カラーレジスト1がSiN膜などの無機材料製の膜(無機質膜)と重ねられる場合には、カラーレジスト1と無機質膜との間の高い密着性が得られうる。また、厳密には光硬化性化合物(A1)が硬化した樹脂マトリクスと無機化合物との密着性が高まるため、蛍光体(B)が量子ドット蛍光体(B1)のような無機質の粒子である場合には、硬化物中で、樹脂マトリクスと蛍光体(B)との密着性が高まりうる。 When the adhesion between the cured product and the inorganic material is increased, when the color resist 1 is overlapped with a film (inorganic film) made of an inorganic material such as a SiN film, the adhesion between the color resist 1 and the inorganic film is high. Can be obtained. Strictly speaking, the adhesion between the cured resin matrix of the photocurable compound (A1) and the inorganic compound is enhanced, so that the phosphor (B) is an inorganic particle such as a quantum dot phosphor (B1). In the cured product, the adhesion between the resin matrix and the phosphor (B) can be enhanced.
 多官能アクリル化合物(Y1)がポリアルキレングリコールジ(メタ)アクリレートとペンタエリスリトールテトラ(メタ)アクリレートとを含有すれば特に好ましい。この場合、組成物(X)は低粘度でかつ反応性に優れる。このため、大気雰囲気等の酸素を含む環境下で組成物(X)を容易に硬化させることができる。 It is particularly preferable that the polyfunctional acrylic compound (Y1) contains a polyalkylene glycol di (meth) acrylate and a pentaerythritol tetra (meth) acrylate. In this case, the composition (X) has a low viscosity and is excellent in reactivity. Therefore, the composition (X) can be easily cured in an environment containing oxygen such as an atmospheric atmosphere.
 アクリル化合物(Y)は、一分子中のラジカル重合性官能基が一つの(メタ)アクリロイル基のみである単官能アクリル化合物(Y2)を含有することも好ましい。単官能アクリル化合物(Y2)は、組成物(X)の硬化時の収縮を抑制できる。 It is also preferable that the acrylic compound (Y) contains a monofunctional acrylic compound (Y2) in which the radically polymerizable functional group in one molecule is only one (meth) acryloyl group. The monofunctional acrylic compound (Y2) can suppress shrinkage of the composition (X) during curing.
 アクリル化合物(Y)全量に対する単官能アクリル化合物(Y2)の量は、0質量%より多く50質量%以下であることが好ましい。単官能アクリル化合物(Y2)の量が0質量%より多ければ、組成物(X)の硬化時の収縮を抑制できる。また、単官能アクリル化合物(Y2)の量が50質量%以下であれば、多官能アクリル化合物(Y1)の量が50質量%以上になりうることで、硬化物の耐熱性を特に向上できる。単官能アクリル化合物(Y2)の量が5質量%以上であれば更に好ましく、30質量%以下であることも更に好ましい。 The amount of the monofunctional acrylic compound (Y2) with respect to the total amount of the acrylic compound (Y) is preferably more than 0% by mass and 50% by mass or less. When the amount of the monofunctional acrylic compound (Y2) is more than 0% by mass, the shrinkage of the composition (X) at the time of curing can be suppressed. Further, when the amount of the monofunctional acrylic compound (Y2) is 50% by mass or less, the amount of the polyfunctional acrylic compound (Y1) can be 50% by mass or more, so that the heat resistance of the cured product can be particularly improved. It is more preferable that the amount of the monofunctional acrylic compound (Y2) is 5% by mass or more, and further preferably 30% by mass or less.
 単官能アクリル化合物(Y2)は、例えば、テトラヒドロフルフリルアクリレート、イソボルニルアクリレート、2-ヒドロキシエチルアクリレート、4-ヒドロキシブチルアクリレート、イソブチルアクリレート、t-ブチルアクリレート、イソオクチルアクリレート、2-メトキシエチルアクリレート、メトキシトリエチレングリコールアクリレート、2-エトキシエチルアクリレート、3-メトキシブチルアクリレート、エトキシエチルアクリレート、ブトキシエチルアクリレート、エトキシジエチレングリコールアクリレート、メトキシジキシルエチルアクリレート、エチルジグリコールアクリレート、環状トリメチロールプロパンフォルマルモノアクリレート、イミドアクリレート、イソアミルアクリレート、エトキシ化コハク酸アクリレート、トリフルオロエチルアクリレート、ω-カルボキシポリカプロラクトンモノアクリレート、シクロヘキシルアクリレート、2-(2-エトキシエトキシ)エチルアクリレート、ステアリルアクリレート、ジエチレングリコールモノブチルエーテルアクリレート、ラウリルアクリレート、イソデシルアクリレート、3,3,5-トリメチルシクロヘキサノールアクリレート、イソオクチルアクリレート、オクチル/デシルアクリレート、トリデシルアクリレート、カプロラクトンアクリレート、エトキシ化(4)ノニルフェノールアクリレート、メトキシポリエチレングリコール(350)モノアクリレート、メトキシポリエチレングリコール(550)モノアクリレート、フェノキシエチルアクリレート、シクロヘキシル(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート、ベンジルアクリレート、メチルフェノキシエチルアクリレート、4-t-ブチルシクロヘキシルアクリレート、カプロラクトン変性テトラヒドロフルフリルアクリレート、トリブロモフェニルアクリレート、エトキシ化トリブロモフェニルアクリレート、2-フェノキシエチルアクリレート、2-フェノキシエチルアクリレートのエチレンオキサイド付加物、2-フェノキシエチルアクリレートのプロピレンオキサイド付加物、アクリロイルモルホリン、アクリル酸モルホリン-4-イル、ジシクロペンタニルアクリレ-ト、フェノキシジエチレングリコールアクリレート、2-ヒドロキシ-3-フェノキシプロピルアクリレート、1,4-シクロヘキサンジメタノールモノアクリレート、3-メタクリロイルオキシメチルシクロヘキセンオキサイド及び3-アクリロイルオキシメチルシクロヘキセンオキサイドからなる群から選択される少なくとも一種の化合物を含有する。 The monofunctional acrylic compound (Y2) is, for example, tetrahydrofurfuryl acrylate, isobornyl acrylate, 2-hydroxyethyl acrylate, 4-hydroxybutyl acrylate, isobutyl acrylate, t-butyl acrylate, isooctyl acrylate, 2-methoxyethyl acrylate. , Methoxytriethylene glycol acrylate, 2-ethoxyethyl acrylate, 3-methoxybutyl acrylate, ethoxyethyl acrylate, butoxyethyl acrylate, ethoxydiethylene glycol acrylate, methoxydixyl ethyl acrylate, ethyl diglycol acrylate, cyclic trimethyl propaneformal monoacrylate, Iimide acrylate, isoamyl acrylate, ethoxylated succinic acid acrylate, trifluoroethyl acrylate, ω-carboxypolycaprolactone monoacrylate, cyclohexyl acrylate, 2- (2-ethoxyethoxy) ethyl acrylate, stearyl acrylate, diethylene glycol monobutyl ether acrylate, lauryl acrylate, Isodecyl acrylate, 3,3,5-trimethylcyclohexanol acrylate, isooctyl acrylate, octyl / decyl acrylate, tridecyl acrylate, caprolactone acrylate, ethoxylated (4) nonylphenol acrylate, methoxypolyethylene glycol (350) monoacrylate, methoxypolyethylene Glycol (550) monoacrylate, phenoxyethyl acrylate, cyclohexyl (meth) acrylate, dicyclopentanyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, benzyl acrylate, methylphenoxyethyl acrylate, 4-t-butylcyclohexyl acrylate, Caprolactone-modified tetrahydrofurfuryl acrylate, tribromophenyl acrylate, ethoxylated tribromophenyl acrylate, 2-phenoxyethyl acrylate, ethylene oxide adduct of 2-phenoxyethyl acrylate, propylene oxide adduct of 2-phenoxyethyl acrylate, acryloylmorpholine, Morpholine-4-yl acrylate, dicyclopentanyl acrylate, phenoxydiethylene glycol acrylate, 2-hydroxy-3-phenoxypropyl acrylate Contains at least one compound selected from the group consisting of 1,4-cyclohexanedimethanol monoacrylate, 3-methacryloyloxymethylcyclohexene oxide and 3-acryloyloxymethylcyclohexene oxide.
 単官能アクリル化合物(Y2)は、脂環式構造を有する化合物及び環状エーテル構造を有する化合物からなる群から選択される少なくとも一種の化合物を含有してもよい。 The monofunctional acrylic compound (Y2) may contain at least one compound selected from the group consisting of a compound having an alicyclic structure and a compound having a cyclic ether structure.
 脂環式構造を有する化合物は、例えばフェノキシエチルアクリレート、シクロヘキシル(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート、ベンジルアクリレート、メチルフェノキシエチルアクリレート、4-t-ブチルシクロヘキシルアクリレート、カプロラクトン変性テトラヒドロフルフリルアクリレート、トリブロモフェニルアクリレート、エトキシ化トリブロモフェニルアクリレート、2-フェノキシエチルアクリレート、2-フェノキシエチルアクリレートのエチレンオキサイド付加物、2-フェノキシエチルアクリレートのプロピレンオキサイド付加物、アクリロイルモルホリン、アクリル酸モルホリン-4-イル、イソボルニルアクリレート、ジシクロペンタニルアクリレ-ト、フェノキシジエチレングリコールアクリレート、2-ヒドロキシ-3-フェノキシプロピルアクリレート、及び1,4-シクロヘキサンジメタノールモノアクリレートからなる群から選択される少なくとも一種の化合物を含有する。 Compounds having an alicyclic structure include, for example, phenoxyethyl acrylate, cyclohexyl (meth) acrylate, dicyclopentanyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, benzyl acrylate, methylphenoxyethyl acrylate, 4-t-butyl. Cyclohexyl acrylate, caprolactone-modified tetrahydrofurfuryl acrylate, tribromophenyl acrylate, ethoxylated tribromophenyl acrylate, 2-phenoxyethyl acrylate, ethylene oxide adduct of 2-phenoxyethyl acrylate, propylene oxide adduct of 2-phenoxyethyl acrylate, From acryloylmorpholin, morpholin-4-yl acrylate, isobornyl acrylate, dicyclopentanyl acrylate, phenoxydiethylene glycol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, and 1,4-cyclohexanedimethanol monoacrylate Contains at least one compound selected from the group.
 環状エーテル構造を有する化合物における環状エーテル構造の環員数は3以上が好ましく、3以上4以下がより好ましい。環状エーテル構造に含まれる炭素原子数は、2以上9以下が好ましく、2以上6以下がより好ましい。環状エーテル構造を有する化合物は、例えば3-メタクリロイルオキシメチルシクロヘキセンオキサイド及び3-アクリロイルオキシメチルシクロヘキセンオキサイドからなる群から選択される少なくとも一種の化合物を含有する。 The number of ring members of the cyclic ether structure in the compound having a cyclic ether structure is preferably 3 or more, and more preferably 3 or more and 4 or less. The number of carbon atoms contained in the cyclic ether structure is preferably 2 or more and 9 or less, and more preferably 2 or more and 6 or less. The compound having a cyclic ether structure contains at least one compound selected from the group consisting of, for example, 3-methacryloyloxymethylcyclohexene oxide and 3-acryloyloxymethylcyclohexene oxide.
 アクリル化合物(Y)は、分子骨格中にケイ素を有する化合物を含有してもよい。この場合、硬化物と無機材料との間の密着性が向上する。分子骨格中にケイ素を有する化合物は、例えばアクリル酸3-(トリメトキシシリル)プロピル(例えば信越化学工業社製の品番KBM5103)及び(メタ)アクリル基含有アルコキシシランオリゴマー(例えば信越化学工業社製の品番KR-513)からなる群から選択される少なくとも一種の化合物を含有する。 The acrylic compound (Y) may contain a compound having silicon in the molecular skeleton. In this case, the adhesion between the cured product and the inorganic material is improved. Compounds having silicon in the molecular skeleton include, for example, 3- (trimethoxysilyl) propyl acrylate (for example, product number KBM5103 manufactured by Shin-Etsu Chemical Co., Ltd.) and (meth) acrylic group-containing alkoxysilane oligomer (for example, manufactured by Shin-Etsu Chemical Co., Ltd.). It contains at least one compound selected from the group consisting of product number KR-513).
 アクリル化合物(Y)は、分子骨格中にリンを有する化合物を含有してもよい。この場合、硬化物と無機材料との間の密着性が向上する。分子骨格中にリンを有する化合物は、例えばアシッドホスホオキシポリオキシプロピレングリコールモノメタクリレートといった、アシッドホスホキシ(メタ)アクリレートを含む。 The acrylic compound (Y) may contain a compound having phosphorus in the molecular skeleton. In this case, the adhesion between the cured product and the inorganic material is improved. Compounds having phosphorus in the molecular skeleton include acid phosphoxy (meth) acrylates such as acid phosphooxypolyoxypropylene glycol monomethacrylate.
 アクリル化合物(Y)は、分子骨格中に窒素を有する化合物を含有してもよい。この場合、硬化物と無機材料との間の密着性が向上する。また、アクリル化合物(Y)の反応性が向上し、そのため硬化物からアウトガスが生じにくくなる。分子骨格中に窒素を有する化合物は、例えばアクリロイルモルホリン、アクリル酸モルホリン-4-イルといったモルホリン骨格を有する化合物、ジエチルアクリルアミド、ジメチルアミノプロピルアクリルアミド及びペンタメチルピペリジルメタクリレ-トからなる群から選択される少なくとも一種の化合物を含む。 The acrylic compound (Y) may contain a compound having nitrogen in the molecular skeleton. In this case, the adhesion between the cured product and the inorganic material is improved. In addition, the reactivity of the acrylic compound (Y) is improved, so that outgas is less likely to be generated from the cured product. The compound having nitrogen in the molecular skeleton is selected from the group consisting of compounds having a morpholine skeleton such as acryloyl morpholine and morpholine-4-yl acrylate, diethylacrylamide, dimethylaminopropylacrylamide and pentamethylpiperidylmethacrylate. Contains at least one compound.
 アクリル化合物(Y)が、モルホリン骨格を有する化合物を含有することが特に好ましい。この場合、組成物(X)の反応性を更に向上でき、大気雰囲気下における組成物(X)の硬化性を更に高めることができる。アクリル化合物(Y)が、アクリロイルモルホリンとアクリル酸モルホリン-4-イルとのうち少なくとも一方を含有すれば特に好ましい。この場合、組成物(X)の硬化時の収縮を抑制できる。また、アクリロイルモルホリン及びアクリル酸モルホリン-4-イルの粘度は低く、そのため、これらの化合物は組成物(X)の粘度を増大させにくい。さらに、これらの化合物揮発しにくいため、組成物(X)の保存安定性を向上させうる。 It is particularly preferable that the acrylic compound (Y) contains a compound having a morpholine skeleton. In this case, the reactivity of the composition (X) can be further improved, and the curability of the composition (X) in an air atmosphere can be further improved. It is particularly preferable that the acrylic compound (Y) contains at least one of acryloyl morpholine and morpholine-4-yl acrylate. In this case, shrinkage of the composition (X) during curing can be suppressed. In addition, the viscosities of acryloyl morpholine and morpholine-4-yl acrylate are low, so that these compounds do not easily increase the viscosity of the composition (X). Furthermore, since these compounds are less likely to volatilize, the storage stability of the composition (X) can be improved.
 アクリル化合物(Y)に対するモルホリン骨格を有する化合物の割合は、5質量%以上50質量%以下であることが好ましい。この場合、組成物(X)の硬化物からアウトガスが発生しにくくなるという利点がある。この割合は7質量%以上45質量%以下であればより好ましく、10質量%以上40質量%以下であれば更に好ましい。 The ratio of the compound having a morpholine skeleton to the acrylic compound (Y) is preferably 5% by mass or more and 50% by mass or less. In this case, there is an advantage that outgas is less likely to be generated from the cured product of the composition (X). This ratio is more preferably 7% by mass or more and 45% by mass or less, and further preferably 10% by mass or more and 40% by mass or less.
 アクリル化合物(Y)が、イソボルニル骨格を有する化合物を含有してもよい。イソボルニル骨格を有する化合物は、例えば、イソボルニルアクリレート及びイソボルニルメタクリレートからなる群から選択される一種以上の化合物を含有できる。 The acrylic compound (Y) may contain a compound having an isobornyl skeleton. The compound having an isobornyl skeleton can contain, for example, one or more compounds selected from the group consisting of isobornyl acrylate and isobornyl methacrylate.
 アクリル化合物(Y)は、ジシクロペンタジエン骨格、ジシクロペンタニル骨格、ジシクロペンテニル骨格、及びビスフェノール骨格からなる群から選択される少なくとも一種の骨格を有する化合物からなる成分を含有してもよい。具体的には、アクリル化合物(Y)は、例えばトリシクロデカンジメタノールジアクリレート、ビスフェノールAポリエトキシジアクリレート及びビスフェノールFポリエトキシジアクリレートからなる群から選択される少なくとも一種の化合物を含有してもよい。この場合、硬化物と無機材料との密着性を高めることができる。 The acrylic compound (Y) may contain a component consisting of a compound having at least one skeleton selected from the group consisting of a dicyclopentadiene skeleton, a dicyclopentanyl skeleton, a dicyclopentenyl skeleton, and a bisphenol skeleton. Specifically, the acrylic compound (Y) may contain at least one compound selected from the group consisting of, for example, tricyclodecanedimethanol diacrylate, bisphenol A polyethoxydiacrylate and bisphenol F polyethoxydiacrylate. good. In this case, the adhesion between the cured product and the inorganic material can be improved.
 アクリル化合物(Y)は、下記式(100)に示す化合物を含有してもよい。この場合、組成物(X)の反応性を高めることができ、かつ硬化物と無機材料との密着性を向上できる。 The acrylic compound (Y) may contain a compound represented by the following formula (100). In this case, the reactivity of the composition (X) can be enhanced, and the adhesion between the cured product and the inorganic material can be improved.
Figure JPOXMLDOC01-appb-C000001
Figure JPOXMLDOC01-appb-C000001
 式(100)において、RはH又はメチル基である。Xは単結合又は二価の炭化水素基である。RからR11の各々はH、アルキル基又は-R12-OH、R12はアルキレン基でありかつRからR11のうち少なくとも一つはアルキル基又は-R12-OHである。RからR11は互いに化学結合していない。 In formula (100), R0 is an H or a methyl group. X is a single bond or divalent hydrocarbon group. Each of R 1 to R 11 is H, an alkyl group or -R 12 -OH, R 12 is an alkylene group and at least one of R 1 to R 11 is an alkyl group or -R 12 -OH. R 1 to R 11 are not chemically bonded to each other.
 具体的には、例えばアクリル化合物(Y)は、下記式(110)に示す化合物、式(120)に示す化合物及び式(130)に示す化合物からなる群から選択される少なくとも一種の化合物を含有してもよい。 Specifically, for example, the acrylic compound (Y) contains at least one compound selected from the group consisting of the compound represented by the following formula (110), the compound represented by the formula (120) and the compound represented by the formula (130). You may.
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
 ラジカル重合性化合物(A11)は、アクリル化合物(Y)以外のラジカル重合性化合物(Z)を含有してもよい。アクリル化合物(Y)とラジカル重合性化合物(Z)との合計量に対するラジカル重合性化合物(Z)の量は、例えば10質量%以下である。ラジカル重合性化合物(Z)は、一分子に二つ以上のラジカル重合性官能基を有する多官能ラジカル重合性化合物(Z1)と、一分子に一つのみのラジカル重合性官能基を有する単官能ラジカル重合性化合物(Z2)とのうち、いずれか一方又は両方を含有できる。多官能ラジカル重合性化合物(Z1)は、例えば一分子中にエチレン性二重結合を2つ以上有する芳香族ウレタンオリゴマー、脂肪族ウレタンオリゴマー、エポキシアクリレートオリゴマー、ポリエステルアクリレートオリゴマー及びその他特殊オリゴマーからなる群から選択される少なくとも一種の化合物を含有してもよい。なお、多官能ラジカル重合性化合物(Z1)が含みうる成分は前記には限られない。単官能ラジカル重合性化合物(Z2)は、例えばN-ビニルホルムアミド、ビニルカプロラクタム、ビニルピロリドン、フェニルグリシジルエーテル、p-tert-ブチルフェニルグリシジルエーテル、ブチルグリシジルエーテル、2-エチルヘキシルグリシジルエーテル、アリルグリシジルエーテル、1,2-ブチレンオキサイド、1,3-ブタジエンモノオキサイド、1,2-エポキシドデカン、エピクロロヒドリン、1,2-エポキシデカン、スチレンオキサイド、シクロヘキセンオキサイド、3-ビニルシクロヘキセンオキサイド、4-ビニルシクロヘキセンオキサイド、N-ビニルピロリドン及びN-ビニルカプロラクタムからなる群から選択される少なくとも一種の化合物を含有する。なお、単官能ラジカル重合性化合物(Z2)が含みうる成分は前記には限られない。 The radically polymerizable compound (A11) may contain a radically polymerizable compound (Z) other than the acrylic compound (Y). The amount of the radically polymerizable compound (Z) with respect to the total amount of the acrylic compound (Y) and the radically polymerizable compound (Z) is, for example, 10% by mass or less. The radically polymerizable compound (Z) is a polyfunctional radically polymerizable compound (Z1) having two or more radically polymerizable functional groups in one molecule, and a monofunctional compound having only one radically polymerizable functional group in one molecule. One or both of the radically polymerizable compound (Z2) can be contained. The polyfunctional radically polymerizable compound (Z1) is, for example, a group consisting of aromatic urethane oligomers, aliphatic urethane oligomers, epoxy acrylate oligomers, polyester acrylate oligomers and other special oligomers having two or more ethylenic double bonds in one molecule. It may contain at least one compound selected from. The components that can be contained in the polyfunctional radically polymerizable compound (Z1) are not limited to the above. The monofunctional radically polymerizable compound (Z2) includes, for example, N-vinylformamide, vinylcaprolactum, vinylpyrrolidone, phenylglycidyl ether, p-tert-butylphenylglycidyl ether, butylglycidyl ether, 2-ethylhexylglycidyl ether, allylglycidyl ether, and the like. 1,2-butylene oxide, 1,3-butadiene monooxide, 1,2-epoxydodecane, epichlorohydrin, 1,2-epoxydecane, styrene oxide, cyclohexene oxide, 3-vinylcyclohexene oxide, 4-vinylcyclohexene It contains at least one compound selected from the group consisting of oxide, N-vinylpyrrolidone and N-vinylcaprolactam. The components that can be contained in the monofunctional radically polymerizable compound (Z2) are not limited to the above.
 ラジカル重合性化合物(A11)がラジカル重合性化合物(Z)を含有する場合、ラジカル重合性化合物(Z)が分子骨格中に窒素を有する化合物を含有してもよい。分子骨格中に窒素を有する化合物は、例えばN-ビニルホルムアミド、N-ビニルピロリドン及びN-ビニルカプロラクタムからなる群から選択される少なくとも一種の化合物を含む。この場合、アクリル化合物(Y)が分子骨格中に窒素を有する化合物を含有する場合と同様、硬化物と無機材料との間の密着性が向上する。 When the radically polymerizable compound (A11) contains the radically polymerizable compound (Z), the radically polymerizable compound (Z) may contain a compound having nitrogen in the molecular skeleton. Compounds having nitrogen in the molecular skeleton include, for example, at least one compound selected from the group consisting of N-vinylformamide, N-vinylpyrrolidone and N-vinylcaprolactam. In this case, the adhesion between the cured product and the inorganic material is improved as in the case where the acrylic compound (Y) contains a compound having nitrogen in the molecular skeleton.
 言い換えると、ラジカル重合性化合物(A11)は、分子骨格中に窒素を有する化合物を含有することが好ましい。この分子骨格中に窒素を有する化合物は、アクリル化合物(Y)に含まれる化合物を含有してもよく、ラジカル重合性化合物(Z)に含まれる化合物を含有してもよい。この場合、硬化物と無機材料との間の密着性が向上する。ラジカル重合性化合物(A11)全体に対する分子骨格中に窒素を有する化合物の割合は、5質量%以上80質量%以下であることが好ましい。この割合が5質量%以上であることで硬化物と無機材料との間の密着性が特に向上しうる。この割合が80質量%以下であることで、分子骨格中に窒素を有する化合物が組成物(X)の保存安定性を阻害しにくく、組成物(X)をインクジェット法で噴射する場合のサテライトを生じさせにくい。このため組成物(X)のインクジェット性が阻害されにくい。さらに、分子骨格中に窒素を有する化合物に起因するアウトガスを生じにくくできる。この割合は10質量%以上70質量%以下であればより好ましく、20質量%以上60質量%以下であれば更に好ましく、25質量%以上50質量%が特に望ましい。 In other words, the radically polymerizable compound (A11) preferably contains a compound having nitrogen in the molecular skeleton. The compound having nitrogen in the molecular skeleton may contain the compound contained in the acrylic compound (Y) or may contain the compound contained in the radically polymerizable compound (Z). In this case, the adhesion between the cured product and the inorganic material is improved. The ratio of the compound having nitrogen in the molecular skeleton to the whole radically polymerizable compound (A11) is preferably 5% by mass or more and 80% by mass or less. When this ratio is 5% by mass or more, the adhesion between the cured product and the inorganic material can be particularly improved. When this ratio is 80% by mass or less, the compound having nitrogen in the molecular skeleton does not easily impair the storage stability of the composition (X), and the satellite when the composition (X) is jetted by the inkjet method can be used. Hard to cause. Therefore, the inkjet property of the composition (X) is less likely to be impaired. Further, it is possible to reduce the generation of outgas caused by the compound having nitrogen in the molecular skeleton. This ratio is more preferably 10% by mass or more and 70% by mass or less, further preferably 20% by mass or more and 60% by mass or less, and particularly preferably 25% by mass or more and 50% by mass or less.
 光ラジカル重合開始剤(E1)は、紫外線が照射されるとラジカル種を生じさせる化合物であれば、特に制限されない。光ラジカル重合開始剤(E1)は、例えば芳香族ケトン類、アシルフォスフィンオキサイド化合物、芳香族オニウム塩化合物、有機過酸化物、チオ化合物(チオキサントン化合物、チオフェニル基含有化合物など)、ヘキサアリールビイミダゾール化合物、オキシムエステル化合物、ボレート化合物、アジニウム化合物、メタロセン化合物、活性エステル化合物、炭素ハロゲン結合を有する化合物、及びアルキルアミン化合物からなる群から選択される少なくとも一種の化合物を含有する。組成物(X)100質量部に対する光ラジカル重合開始剤(E1)の量は、例えば1質量部以上10質量部以下である。 The photoradical polymerization initiator (E1) is not particularly limited as long as it is a compound that produces radical species when irradiated with ultraviolet rays. The photoradical polymerization initiator (E1) is, for example, aromatic ketones, acylphosphine oxide compounds, aromatic onium salt compounds, organic peroxides, thio compounds (thioxanthone compounds, thiophenyl group-containing compounds, etc.), hexaarylbiimidazole. It contains at least one compound selected from the group consisting of a compound, an oxime ester compound, a borate compound, an azinium compound, a metallocene compound, an active ester compound, a compound having a carbon halogen bond, and an alkylamine compound. The amount of the photoradical polymerization initiator (E1) with respect to 100 parts by mass of the composition (X) is, for example, 1 part by mass or more and 10 parts by mass or less.
 光ラジカル重合開始剤(E1)は、フォトブリーチング性を有する開始剤を含有することが好ましい。この場合、硬化物の光透過性が高まりうる。 The photoradical polymerization initiator (E1) preferably contains an initiator having photobleaching properties. In this case, the light transmittance of the cured product can be increased.
 フォトブリーチング性を有する開始剤は、例えばフォトブリーチング性を有するオキシムエステル化合物とアシルフォスフィンオキサイド化合物とのうち少なくとも一方を含有する。 The photobleaching initiator contains, for example, at least one of a photobleaching oxime ester compound and an acylphosphine oxide compound.
 フォトブリーチング性を有するオキシムエステル化合物は、例えば下記式(401)に示す化合物と、下記式(402)に示す化合物とのうち、少なくとも一方を含有する。このうち式(402)に示す化合物は特に高感度であるため、組成物(X)の光硬化性を特に高めることができる。 The oxime ester compound having photobleaching property contains, for example, at least one of the compound represented by the following formula (401) and the compound represented by the following formula (402). Of these, the compound represented by the formula (402) has particularly high sensitivity, so that the photocurability of the composition (X) can be particularly enhanced.
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
 アシルフォスフィンオキサイド化合物は、例えば、2,4,6-トリメチルベンゾイル-ジフェニルフォスフィンオキサイド、及びビス(2,4,6-トリメチルベンゾイル)フェニルフォスフィンオキサイドからなる群から選択される少なくとも1種を含有する。 The acylphosphine oxide compound is, for example, at least one selected from the group consisting of 2,4,6-trimethylbenzoyl-diphenylphosphin oxide and bis (2,4,6-trimethylbenzoyl) phenylphosphin oxide. contains.
 光ラジカル重合開始剤(E1)は、この光ラジカル重合開始剤(E1)の一部として増感剤を含有してもよい。増感剤は、光ラジカル重合開始剤(E1)のラジカル生成反応を促進させて、ラジカル重合の反応性を向上させ、かつ架橋密度を向上させうる。増感剤は、例えば9,10-ジブトキシアントラセン、9-ヒドロキシメチルアントラセン、チオキサントン、2-イソプロピルチオキサントン、4-イソプロピルチオキサントン、2-クロロチオキサントン、2,4-ジエチルチオキサントン、アントラキノン、1,2-ジヒドロキシアントラキノン、2-エチルアントラキノン、1,4-ジエトキシナフタレン、p-ジメチルアミノアセトフェノン、p-ジエチルアミノアセトフェノン、p-ジメチルアミノベンゾフェノン、p-ジエチルアミノベンゾフェノン、4,4’-ビス(ジメチルアミノ)ベンゾフェノン、4,4’-ビス(ジエチルアミノ)ベンゾフェノン、p-ジメチルアミノベンズアルデヒド、及びp-ジエチルアミノベンズアルデヒドからなる群から選択される少なくとも一種の化合物を含有できる。なお、増感剤が含みうる成分は前記には限られない。 The photoradical polymerization initiator (E1) may contain a sensitizer as a part of the photoradical polymerization initiator (E1). The sensitizer can accelerate the radical generation reaction of the photoradical polymerization initiator (E1), improve the reactivity of the radical polymerization, and improve the crosslink density. The sensitizer is, for example, 9,10-dibutoxyanthracene, 9-hydroxymethylanthracene, thioxanthone, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2-chlorothioxanthone, 2,4-diethylthioxanthone, anthracinone, 1,2-. Dihydroxyanthracene, 2-ethylanthracene, 1,4-diethoxynaphthalene, p-dimethylaminoacetophenone, p-diethylaminoacetophenone, p-dimethylaminobenzophenone, p-diethylaminobenzophenone, 4,4'-bis (dimethylamino) benzophenone, It can contain at least one compound selected from the group consisting of 4,4'-bis (diethylamino) benzophenone, p-dimethylaminobenzaldehyde, and p-diethylaminobenzaldehyde. The components that the sensitizer can contain are not limited to the above.
 組成物(X)中の増感剤の含有量は、例えば組成物(X)の固形分100質量部に対して、0.1質量部以上5質量部以下であり、好ましくは0.1質量部以上3質量部以下である。増感剤の含有量がこのような範囲であれば、空気中で組成物(X)を硬化させることができ、組成物(X)の硬化を窒素雰囲気等の不活性雰囲気下で行う必要がなくなる。 The content of the sensitizer in the composition (X) is, for example, 0.1 part by mass or more and 5 parts by mass or less, preferably 0.1 part by mass, with respect to 100 parts by mass of the solid content of the composition (X). It is 3 parts or more and 3 parts by mass or less. When the content of the sensitizer is in such a range, the composition (X) can be cured in air, and the composition (X) needs to be cured in an inert atmosphere such as a nitrogen atmosphere. It disappears.
 組成物(X)は、光ラジカル重合開始剤(E1)に加えて、重合促進剤を含有してもよい。重合促進剤は、例えば、p-ジメチルアミノ安息香酸エチル、p-ジメチルアミノ安息香酸-2-エチルヘキシル、p-ジメチルアミノ安息香酸メチル、安息香酸-2-ジメチルアミノエチル、p-ジメチルアミノ安息香酸ブトキシエチルといったアミン化合物を含有する。なお、重合促進剤が含有しうる成分は前記には限られない。 The composition (X) may contain a polymerization accelerator in addition to the photoradical polymerization initiator (E1). Examples of the polymerization accelerator include ethyl p-dimethylaminobenzoate, -2-ethylhexyl p-dimethylaminobenzoate, methyl p-dimethylaminobenzoate, -2-dimethylaminoethyl benzoate, and butoxy p-dimethylaminobenzoate. Contains amine compounds such as ethyl. The components that can be contained in the polymerization accelerator are not limited to the above.
 光硬化性化合物(A1)がカチオン重合性化合物(A12)を含有する場合、カチオン重合性化合物(A12)は、例えば多官能カチオン重合性化合物(W1)と単官能カチオン重合性化合物(W2)とのうち少なくとも一方を含有する。 When the photocurable compound (A1) contains the cationically polymerizable compound (A12), the cationically polymerizable compound (A12) may be, for example, a polyfunctional cationically polymerizable compound (W1) and a monofunctional cationically polymerizable compound (W2). Contains at least one of them.
 多官能カチオン重合性化合物(W1)は、シロキサン骨格を有さない多官能カチオン重合性化合物(W11)と、シロキサン骨格を有する多官能カチオン重合性化合物(W12)とのうち、いずれか一方又は両方を含有できる。 The polyfunctional cationically polymerizable compound (W1) is either one or both of a polyfunctional cationically polymerizable compound (W11) having no siloxane skeleton and a polyfunctional cationically polymerizable compound (W12) having a siloxane skeleton. Can be contained.
 多官能カチオン重合性化合物(W11)は、シロキサン骨格を有さず、一分子あたり二以上のカチオン重合性官能基を有する。多官能カチオン重合性化合物(W11)の一分子あたりのカチオン重合性官能基の数は2~4個であることが好ましく、2~3個であれば更に好ましい。 The polyfunctional cationically polymerizable compound (W11) does not have a siloxane skeleton and has two or more cationically polymerizable functional groups per molecule. The number of cationically polymerizable functional groups per molecule of the polyfunctional cationically polymerizable compound (W11) is preferably 2 to 4, more preferably 2 to 3.
 カチオン重合性官能基は、例えばエポキシ基、オキセタン基及びビニルエーテル基からなる群から選択される少なくとも一種の基である。 The cationically polymerizable functional group is at least one group selected from the group consisting of, for example, an epoxy group, an oxetane group and a vinyl ether group.
 多官能カチオン重合性化合物(W11)は、例えば多官能脂環式エポキシ化合物、多官能ヘテロ環式エポキシ化合物、多官能オキセタン化合物、アルキレングリコールジグリシジルエーテル、及びアルキレングリコールモノビニルモノグリシジルエーテルからなる群から選択される化合物のうち、少なくとも一種の化合物を含有する。 The polyfunctional cationically polymerizable compound (W11) is composed of, for example, a polyfunctional alicyclic epoxy compound, a polyfunctional heterocyclic epoxy compound, a polyfunctional oxetane compound, an alkylene glycol diglycidyl ether, and an alkylene glycol monovinyl monoglycidyl ether. It contains at least one compound among the selected compounds.
 多官能脂環式エポキシ化合物は、例えば下記式(1)に示す化合物と下記式(20)に示す化合物とのうち、いずれか一方又は両方を含有する。 The polyfunctional alicyclic epoxy compound contains, for example, one or both of the compound represented by the following formula (1) and the compound represented by the following formula (20).
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
 式(1)において、R1~R18の各々は独立に水素原子、ハロゲン原子、又は炭化水素基である。炭化水素基の炭素数は1~20の範囲内であることが好ましい。炭化水素基は、例えばメチル基、エチル基、プロピル基といった炭素数1~20のアルキル基;ビニル基、アリル基といった炭素数2~20のアルケニル基;又はエチリデン基、プロピリデン基といった炭素数2~20のアルキリデン基である。炭化水素基は、酸素原子若しくはハロゲン原子を含んでいてもよい。R1~R18の各々は独立に、水素原子又は炭素数1~20の炭化水素基であることが好ましく、水素原子又はメチル基であることがより好ましく、水素原子であることが最も好ましい。 In formula (1), each of R 1 to R 18 is independently a hydrogen atom, a halogen atom, or a hydrocarbon group. The number of carbon atoms of the hydrocarbon group is preferably in the range of 1 to 20. The hydrocarbon group is an alkyl group having 1 to 20 carbon atoms such as a methyl group, an ethyl group and a propyl group; an alkenyl group having 2 to 20 carbon atoms such as a vinyl group and an allyl group; or an alkenyl group having 2 to 20 carbon atoms such as an ethylidene group and a propylidene group. There are 20 alkylidene groups. The hydrocarbon group may contain an oxygen atom or a halogen atom. Each of R 1 to R 18 is preferably a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms independently, more preferably a hydrogen atom or a methyl group, and most preferably a hydrogen atom.
 式(1)において、Xは単結合又は二価の有機基であり、有機基は、例えば-CO-O-CH2-である。 In the formula (1), X is a single bond or a divalent organic group, and the organic group is, for example, -CO-O-CH2-.
 式(1)に示す化合物の例は、下記式(1a)に示す化合物及び下記式(1b)に示す化合物を含む。 Examples of the compound represented by the formula (1) include the compound represented by the following formula (1a) and the compound represented by the following formula (1b).
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
 式(20)中、R1~R12の各々は独立に、水素原子、ハロゲン原子、又は炭素数1~20の炭化水素基である。ハロゲン原子は、例えばフッ素原子、塩素原子、臭素原子又はヨウ素原子である。炭素数1~20の炭化水素基は、例えばメチル基、エチル基、プロピル基といった炭素数1~20のアルキル基;ビニル基、アリル基といった炭素数2~20のアルケニル基;又はエチリデン基、プロピリデン基といった炭素数2~20のアルキリデン基である。炭素数1~20の炭化水素基は、酸素原子若しくはハロゲン原子を含んでいてもよい。 In formula (20), each of R 1 to R 12 is independently a hydrogen atom, a halogen atom, or a hydrocarbon group having 1 to 20 carbon atoms. The halogen atom is, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom. The hydrocarbon group having 1 to 20 carbon atoms is an alkyl group having 1 to 20 carbon atoms such as a methyl group, an ethyl group and a propyl group; an alkenyl group having 2 to 20 carbon atoms such as a vinyl group and an allyl group; or an ethylidene group and propyridene. It is an alkylidene group having 2 to 20 carbon atoms such as a group. The hydrocarbon group having 1 to 20 carbon atoms may contain an oxygen atom or a halogen atom.
 R1~R12の各々は独立に、水素原子又は炭素数1~20の炭化水素基であることが好ましく、水素原子又はメチル基であることがより好ましく、水素原子であることが最も好ましい。 Each of R 1 to R 12 is preferably a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms independently, more preferably a hydrogen atom or a methyl group, and most preferably a hydrogen atom.
 式(20)に示す化合物の例は、下記式(20a)に示すテトラヒドロインデンジエポキシドを含む。 Examples of the compound represented by the formula (20) include a tetrahydroinden epoxide represented by the following formula (20a).
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 多官能ヘテロ環式エポキシ化合物は、例えば下記式(2)に示すような三官能エポキシ化合物を含有する。 The polyfunctional heterocyclic epoxy compound contains, for example, a trifunctional epoxy compound as shown in the following formula (2).
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
 多官能オキセタン化合物は、例えば下記式(3)に示すような二官能オキセタン化合物を含有する。 The polyfunctional oxetane compound contains, for example, a bifunctional oxetane compound as shown in the following formula (3).
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 アルキレングリコールジグリシジルエーテルは、例えば下記式(4)~(7)に示す化合物からなる群から選択される少なくとも一種の化合物を含有する。 The alkylene glycol diglycidyl ether contains, for example, at least one compound selected from the group consisting of the compounds represented by the following formulas (4) to (7).
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 アルキレングリコールモノビニルモノグリシジルエーテルは、例えば下記式(8)に示す化合物を含有する。 The alkylene glycol monovinyl monoglycidyl ether contains, for example, the compound represented by the following formula (8).
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
 より具体的には、多官能カチオン重合性化合物(W11)は、例えばダイセル製のセロキサイド2021P及びセロキサイド8010、日産化学製のTEPIC-VL、東亞合成製のOXT-221、並びに四日市合成製の1,3-PD-DEP、1,4-BG-DEP、1,6-HD-DEP、NPG-DEP及びブチレングリコールモノビニルモノグリシジルエーテルからなる群から選択される少なくとも一種の成分を含有できる。 More specifically, the polyfunctional cationically polymerizable compound (W11) includes, for example, celoxide 2021P and celoxide 8010 manufactured by Daicel, TEPIC-VL manufactured by Nissan Chemical Industries, OXT-221 manufactured by Toagosei, and 1, It can contain at least one component selected from the group consisting of 3-PD-DEP, 1,4-BG-DEP, 1,6-HD-DEP, NPG-DEP and butylene glycol monovinyl monoglycidyl ether.
 多官能カチオン重合性化合物(W11)は、多官能脂環式エポキシ化合物を含有することも好ましい。この場合、組成物(X)は特に高いカチオン重合反応性を有することができる。 The polyfunctional cationically polymerizable compound (W11) preferably contains a polyfunctional alicyclic epoxy compound. In this case, the composition (X) can have a particularly high cationic polymerization reactivity.
 多官能脂環式エポキシ化合物は、特に式(1)に示す化合物及び式(20)に示す化合物のうち、いずれか一方又は両方を含有することが好ましい。この場合、組成物(X)はより高いカチオン重合反応性を有することができる。 The polyfunctional alicyclic epoxy compound preferably contains either one or both of the compound represented by the formula (1) and the compound represented by the formula (20). In this case, the composition (X) can have a higher cationic polymerization reactivity.
 多官能脂環式エポキシ化合物が式(1)に示す化合物を含有する場合、式(1)に示す化合物は、式(1a)に示す化合物を含有することが好ましい。この場合、組成物(X)は、より高いカチオン重合反応性を有するとともに、特に低い粘度を有することができる。 When the polyfunctional alicyclic epoxy compound contains the compound represented by the formula (1), the compound represented by the formula (1) preferably contains the compound represented by the formula (1a). In this case, the composition (X) can have a higher cationic polymerization reactivity and a particularly low viscosity.
 また、特に式(20)に示す化合物は、低い粘度を有するため、式(20)に示す化合物を含有する場合、組成物(X)は、良好な紫外線硬化性を有することができるとともに、特に低い粘度を有することができる。さらに、式(20)に示す化合物は、低い粘度を有するわりには、揮発しにくい性質を有する。そのため、組成物(X)が式(20)に示す化合物を含有しても、組成物(X)には、式(20)に示す化合物の揮発による組成の変化が生じにくい。このため、組成物(X)は、式(20)に示す化合物を含有することで、保存安定性を損なうことなく低粘度化されうる。 Further, since the compound represented by the formula (20) has a low viscosity, the composition (X) can have good ultraviolet curability and particularly when the compound represented by the formula (20) is contained. It can have a low viscosity. Further, the compound represented by the formula (20) has a property of being hard to volatilize in spite of having a low viscosity. Therefore, even if the composition (X) contains the compound represented by the formula (20), the composition (X) is unlikely to change in composition due to the volatilization of the compound represented by the formula (20). Therefore, the composition (X) can be reduced in viscosity by containing the compound represented by the formula (20) without impairing the storage stability.
 式(20)に示す化合物は、例えばテトラヒドロインデン骨格を有する環状オレフィン化合物を、酸化剤を用いて酸化することで合成できる。 The compound represented by the formula (20) can be synthesized, for example, by oxidizing a cyclic olefin compound having a tetrahydroindene skeleton with an oxidizing agent.
 式(20)に示す化合物は、2つのエポキシ環の立体配置に基づく4つの立体異性体を含みうる。式(20)に示す化合物は、4つの立体異性体のいずれを含んでもよい。すなわち、式(20)に示す化合物は、4つの立体異性体からなる群から選択される少なくとも一種の成分を含有できる。式(20)に示す化合物中における、4つの立体異性体のうちのエキソ-エンド体とエンド-エンド体の合計量の割合は、エポキシ化合物(A1)全体に対して10質量%以下であることが好ましく、5質量%以下であれば更に好ましい。この場合、硬化物の耐熱性を向上できる。なお、式(20)に示す化合物中の特定の立体異性体の割合は、ガスクロマトグラフィーで得られるクロマトグラムに現れるピーク面積比に基づいて、求めることができる。 The compound represented by the formula (20) may contain four stereoisomers based on the configuration of the two epoxy rings. The compound represented by the formula (20) may contain any of the four stereoisomers. That is, the compound represented by the formula (20) can contain at least one component selected from the group consisting of four stereoisomers. The ratio of the total amount of the exo-end form and the end-end form to the four stereoisomers in the compound represented by the formula (20) is 10% by mass or less with respect to the entire epoxy compound (A1). Is preferable, and more preferably 5% by mass or less. In this case, the heat resistance of the cured product can be improved. The ratio of the specific stereoisomer in the compound represented by the formula (20) can be determined based on the peak area ratio appearing in the chromatogram obtained by gas chromatography.
 式(20)に示す化合物中のエキソ-エンド体及びエンド-エンド体の量を少なくするためには、式(20)に示す化合物を精密蒸留する方法、シリカゲルなどを充填剤として用いたカラムクロマトグラフィーを適用する方法といった、適宜の方法を適用できる。 In order to reduce the amount of exo-end compound and end-end compound in the compound represented by the formula (20), a method for precision distillation of the compound represented by the formula (20), column chromatography using silica gel or the like as a filler is used. Any method can be applied, such as the method of applying the technique.
 組成物(X)が多官能カチオン重合性化合物(W11)を含有する場合、樹脂成分全量に対する多官能カチオン重合性化合物(W11)の割合は、5~95質量%の範囲内であることが好ましい。なお、樹脂成分とは、組成物(X)中のカチオン重合性を有する化合物のことをいい、多官能カチオン重合性化合物(W1)及び単官能カチオン重合性化合物(W2)を含む。多官能カチオン重合性化合物(W11)の割合が5質量%以上であれば組成物(X)は光カチオン重合反応時に特に優れた反応性を有することができ、またそれによって、硬化物が高い強度(硬度)を有することができる。また、多官能カチオン重合性化合物(W11)の割合が95質量%以下であれば、組成物(X)が吸湿剤(F)を含有する場合に、組成物(X)中で吸湿剤(F)を特に均一性高く分散させうる。この多官能カチオン重合性化合物(W11)の割合は、12質量%以上であればより好ましく、15質量%以上であれば更に好ましく、20質量%以上であれば更に好ましく、25質量%以上であれば特に好ましい。またこの多官能カチオン重合性化合物(W11)の割合は、85質量%以下であればより好ましく、60質量%以下であれば更に好ましい。例えば多官能カチオン重合性化合物(W11)の割合が20~60質量%の範囲内であることが好ましい。 When the composition (X) contains the polyfunctional cationically polymerizable compound (W11), the ratio of the polyfunctional cationically polymerizable compound (W11) to the total amount of the resin component is preferably in the range of 5 to 95% by mass. .. The resin component refers to a cationically polymerizable compound in the composition (X), and includes a polyfunctional cationically polymerizable compound (W1) and a monofunctional cationically polymerizable compound (W2). When the proportion of the polyfunctional cationically polymerizable compound (W11) is 5% by mass or more, the composition (X) can have particularly excellent reactivity during the photocationic polymerization reaction, whereby the cured product has high strength. Can have (hardness). Further, when the ratio of the polyfunctional cationically polymerizable compound (W11) is 95% by mass or less, when the composition (X) contains the hygroscopic agent (F), the hygroscopic agent (F) is contained in the composition (X). ) Can be dispersed with particularly high uniformity. The proportion of the polyfunctional cationically polymerizable compound (W11) is more preferably 12% by mass or more, further preferably 15% by mass or more, further preferably 20% by mass or more, and 25% by mass or more. Is particularly preferable. The proportion of the polyfunctional cationically polymerizable compound (W11) is more preferably 85% by mass or less, and further preferably 60% by mass or less. For example, the proportion of the polyfunctional cationically polymerizable compound (W11) is preferably in the range of 20 to 60% by mass.
 多官能カチオン重合性化合物(W11)が多官能脂環式エポキシ化合物を含有する場合、多官能脂環式エポキシ化合物は、多官能カチオン重合性化合物(W11)の一部であってもよく、全部であってもよい。多官能カチオン重合性化合物(W11)に対する、多官能脂環式エポキシ化合物の割合は、15~100質量%の範囲内であることが好ましい。この割合が15質量%以上であると、多官能脂環式エポキシ化合物は組成物(X)の紫外線硬化性の向上に特に寄与できる。 When the polyfunctional cationically polymerizable compound (W11) contains a polyfunctional alicyclic epoxy compound, the polyfunctional alicyclic epoxy compound may be a part of the polyfunctional cationically polymerizable compound (W11), and all of them may be. May be. The ratio of the polyfunctional alicyclic epoxy compound to the polyfunctional cationically polymerizable compound (W11) is preferably in the range of 15 to 100% by mass. When this ratio is 15% by mass or more, the polyfunctional alicyclic epoxy compound can particularly contribute to the improvement of the ultraviolet curability of the composition (X).
 多官能カチオン重合性化合物(W12)は、シロキサン骨格と、一分子あたり二以上のカチオン重合性官能基とを有する。多官能カチオン重合性化合物(W12)の一分子あたりのカチオン重合性官能基の数は、2~6個であることが好ましく、2~4個であれば更に好ましい。多官能カチオン重合性化合物(W12)は、組成物(X)のカチオン重合反応性の向上に寄与できるとともに、硬化物及び光学部品の耐熱変色性の向上に寄与できる。多官能カチオン重合性化合物(W12)は硬化物及び光学部品の低弾性率化にも寄与できる。組成物(X)が吸湿剤を含有する場合、多官能カチオン重合性化合物(W12)は組成物(X)中及び硬化物中の吸湿剤の分散性の向上にも寄与できる。 The polyfunctional cationically polymerizable compound (W12) has a siloxane skeleton and two or more cationically polymerizable functional groups per molecule. The number of cationically polymerizable functional groups per molecule of the polyfunctional cationically polymerizable compound (W12) is preferably 2 to 6, and more preferably 2 to 4. The polyfunctional cationically polymerizable compound (W12) can contribute to the improvement of the cationic polymerization reactivity of the composition (X) and the heat-resistant discoloration of the cured product and the optical component. The polyfunctional cationically polymerizable compound (W12) can also contribute to lowering the elastic modulus of the cured product and the optical component. When the composition (X) contains a hygroscopic agent, the polyfunctional cationically polymerizable compound (W12) can also contribute to the improvement of the dispersibility of the hygroscopic agent in the composition (X) and the cured product.
 多官能カチオン重合性化合物(W12)は、25℃で液体であることが好ましい。特に多官能カチオン重合性化合物(W12)の25℃における粘度は、10~300mPa・sの範囲内であることが好ましい。この場合、組成物(X)の粘度上昇を抑制できる。 The polyfunctional cationically polymerizable compound (W12) is preferably liquid at 25 ° C. In particular, the viscosity of the polyfunctional cationically polymerizable compound (W12) at 25 ° C. is preferably in the range of 10 to 300 mPa · s. In this case, the increase in viscosity of the composition (X) can be suppressed.
 多官能カチオン重合性化合物(W12)が有するカチオン重合性官能基は、例えばエポキシ基、オキセタン基及びビニルエーテル基からなる群から選択される少なくとも一種の基である。 The cationically polymerizable functional group contained in the polyfunctional cationically polymerizable compound (W12) is at least one group selected from the group consisting of, for example, an epoxy group, an oxetane group and a vinyl ether group.
 多官能カチオン重合性化合物(W12)が有するシロキサン骨格は、直鎖状でも分岐鎖状でも環状でもよい。シロキサン骨格が有するSi原子の数は、2~14の範囲内であることが好ましい。この場合、組成物(X)は特に低い粘度を有することができる。このSi原子の数は、2~10の範囲内であればより好ましく、2~7の範囲内であれば更に好ましく、3~6の範囲内であれば特に好ましい。 The siloxane skeleton of the polyfunctional cationically polymerizable compound (W12) may be linear, branched or cyclic. The number of Si atoms contained in the siloxane skeleton is preferably in the range of 2 to 14. In this case, the composition (X) can have a particularly low viscosity. The number of Si atoms is more preferably in the range of 2 to 10, further preferably in the range of 2 to 7, and particularly preferably in the range of 3 to 6.
 多官能カチオン重合性化合物(W12)は、例えば式(10)に示す化合物と、式(11)に示す化合物とのうち、少なくとも一方を含有する。 The polyfunctional cationically polymerizable compound (W12) contains, for example, at least one of the compound represented by the formula (10) and the compound represented by the formula (11).
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
 式(10)及び式(11)の各々におけるRは、単結合又は二価の有機基であり、アルキレン基であることが好ましい。Yはシロキサン骨格であり、直鎖状、分岐状及び環状のいずれでもよく、そのSi原子の数は2~14の範囲内であることが好ましく、2~10の範囲内であることがより好ましく、2~7の範囲内であれば更に好ましく、3~6の範囲内であれば特に好ましい。nは2以上の整数であり、2~4の範囲内であることが好ましい。 R in each of the formula (10) and the formula (11) is a single bond or a divalent organic group, and is preferably an alkylene group. Y is a siloxane skeleton and may be linear, branched or cyclic, and the number of Si atoms thereof is preferably in the range of 2 to 14, more preferably in the range of 2 to 10. It is more preferably in the range of 2 to 7, and particularly preferably in the range of 3 to 6. n is an integer of 2 or more, preferably in the range of 2-4.
 より具体的には、例えば多官能カチオン重合性化合物(W12)は、次の式(10a)に示す化合物を含有する。 More specifically, for example, the polyfunctional cationically polymerizable compound (W12) contains the compound represented by the following formula (10a).
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
 式(10a)におけるRは、単結合又は二価の有機基であり、炭素数1~4のアルキレン基であることが好ましい。式(10a)におけるnは0以上の整数である。nは、0~12の範囲内であることが好ましく、0~8の範囲内であることがより好ましく、0~5の範囲内であれば更に好ましく、1~4の範囲内であれば特に好ましい。 R in the formula (10a) is a single bond or a divalent organic group, and is preferably an alkylene group having 1 to 4 carbon atoms. N in the equation (10a) is an integer of 0 or more. n is preferably in the range of 0 to 12, more preferably in the range of 0 to 8, more preferably in the range of 0 to 5, and particularly preferably in the range of 1 to 4. preferable.
 式(10a)に示す化合物は、下記式(30)に示す化合物を含有することが好ましい。すなわち、多官能カチオン重合性化合物(W12)は、下記式(30)に示す化合物を含有することが好ましい。 The compound represented by the formula (10a) preferably contains the compound represented by the following formula (30). That is, the polyfunctional cationically polymerizable compound (W12) preferably contains the compound represented by the following formula (30).
 より具体的には、多官能カチオン重合性化合物(W12)は、例えば信越化学株式会社製の品番X-40-2669、X-40-2670、X-40-2715、X-40-2732、X-22-169AS、X-22-169B、X-22-2046、X-22-343、X-22-163、及びX-22-163Bからなる群から選択される少なくとも一種の成分を含有することが好ましい。 More specifically, the polyfunctional cationically polymerizable compound (W12) is, for example, product numbers X-40-2669, X-40-2670, X-40-2715, X-40-2732, X manufactured by Shin-Etsu Chemical Co., Ltd. Containing at least one component selected from the group consisting of -22-169AS, X-22-169B, X-22-2046, X-22-343, X-22-163, and X-22-163B. Is preferable.
 多官能カチオン重合性化合物(W12)は脂環式エポキシ構造を有することが好ましく、多官能カチオン重合性化合物(W12)が式(10a)に示す化合物を含有すれば特に好ましい。式(10a)に示す化合物は、組成物(X)のカチオン重合反応性の向上と低粘度化とに特に寄与できるとともに、硬化物及び光学部品の耐熱変色性の向上及び低弾性率化に特に寄与できる。組成物(X)が吸湿剤(F)を含有する場合は組成物(X)中の吸湿剤(F)の分散性向上にも特に寄与できる。 The polyfunctional cationically polymerizable compound (W12) preferably has an alicyclic epoxy structure, and it is particularly preferable that the polyfunctional cationically polymerizable compound (W12) contains the compound represented by the formula (10a). The compound represented by the formula (10a) can particularly contribute to the improvement of the cationic polymerization reactivity and the reduction of the viscosity of the composition (X), and particularly to the improvement of the heat-resistant discoloration property and the low elastic modulus of the cured product and the optical component. Can contribute. When the composition (X) contains the hygroscopic agent (F), it can particularly contribute to the improvement of the dispersibility of the hygroscopic agent (F) in the composition (X).
 組成物(X)が多官能カチオン重合性化合物(W12)を含有する場合、樹脂成分全量に対する多官能カチオン重合性化合物(W12)の割合は、5~95質量%の範囲内であることが好ましい。この場合、特に組成物(X)が吸湿剤(F)を含有すると、組成物(X)中及び硬化物中での吸湿剤(F)の分散性が特に向上し、かつ組成物(X)が特に高い光カチオン重合反応性を有することができる。 When the composition (X) contains the polyfunctional cationically polymerizable compound (W12), the ratio of the polyfunctional cationically polymerizable compound (W12) to the total amount of the resin component is preferably in the range of 5 to 95% by mass. .. In this case, particularly when the composition (X) contains the hygroscopic agent (F), the dispersibility of the hygroscopic agent (F) in the composition (X) and the cured product is particularly improved, and the composition (X) Can have a particularly high photocationic polymerization reactivity.
 単官能カチオン重合性化合物(W2)は、カチオン重合性官能基を一分子に対して一つのみ有する。カチオン重合性官能基は、例えばエポキシ基、オキセタン基及びビニルエーテル基からなる群から選択される少なくとも一種の基である。 The monofunctional cationically polymerizable compound (W2) has only one cationically polymerizable functional group per molecule. The cationically polymerizable functional group is at least one group selected from the group consisting of, for example, an epoxy group, an oxetane group and a vinyl ether group.
 単官能カチオン重合性化合物(W2)の25℃における粘度は8mPa・s以下であることが好ましい。この場合、組成物(X)が溶媒を含有しなくても、単官能カチオン重合性化合物(W2)は組成物(X)の粘度を低減できる。特に単官能カチオン重合性化合物(W2)の25℃における粘度は、0.1~8mPa・sの範囲内であることが好ましい。 The viscosity of the monofunctional cationically polymerizable compound (W2) at 25 ° C. is preferably 8 mPa · s or less. In this case, even if the composition (X) does not contain a solvent, the monofunctional cationically polymerizable compound (W2) can reduce the viscosity of the composition (X). In particular, the viscosity of the monofunctional cationically polymerizable compound (W2) at 25 ° C. is preferably in the range of 0.1 to 8 mPa · s.
 単官能カチオン重合性化合物(W2)は、例えば下記式(12)~(17)に示す化合物及びリモネンオキシドからなる群から選択される少なくとも一種の化合物を含有できる。 The monofunctional cationically polymerizable compound (W2) can contain, for example, at least one compound selected from the group consisting of the compounds represented by the following formulas (12) to (17) and limonene oxide.
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
 樹脂成分全量に対する単官能カチオン重合性化合物(W2)の割合は、5~50質量%の範囲内であることが好ましい。単官能カチオン重合性化合物(W2)の割合が5質量%以上であれば組成物(X)の粘度を特に低減できる。また、単官能カチオン重合性化合物(W2)の割合が50質量%以下であれば、組成物(X)は光カチオン重合反応時に特に優れた反応性を有することができ、またそれによって、硬化物が高い強度(硬度)を有することができる。この単官能カチオン重合性化合物(W2)の割合は、10質量%以上であればより好ましく、15質量%以上であれば更に好ましい。また、この単官能カチオン重合性化合物(W2)の割合は、40質量%以下であればより好ましく、35質量%以下であれば更に好ましく、30質量%以下であれば特に好ましい。単官能カチオン重合性化合物(W2)の割合が特に35質量%以下であれば、組成物(X)を保管している間の組成物(X)中の成分の揮発量を効果的に低減でき、そのため組成物(X)を長期間保存しても組成物(X)の特性が損なわれにくい。さらに、硬化物にタックが生じることを特に抑制できる。例えば単官能カチオン重合性化合物(W2)の割合が10~35質量%の範囲内であることが好ましい。 The ratio of the monofunctional cationically polymerizable compound (W2) to the total amount of the resin component is preferably in the range of 5 to 50% by mass. When the proportion of the monofunctional cationically polymerizable compound (W2) is 5% by mass or more, the viscosity of the composition (X) can be particularly reduced. Further, when the proportion of the monofunctional cationically polymerizable compound (W2) is 50% by mass or less, the composition (X) can have particularly excellent reactivity during the photocationic polymerization reaction, whereby the cured product can be obtained. Can have high strength (hardness). The ratio of the monofunctional cationically polymerizable compound (W2) is more preferably 10% by mass or more, still more preferably 15% by mass or more. The proportion of the monofunctional cationically polymerizable compound (W2) is more preferably 40% by mass or less, further preferably 35% by mass or less, and particularly preferably 30% by mass or less. When the proportion of the monofunctional cationically polymerizable compound (W2) is particularly 35% by mass or less, the amount of volatilization of the components in the composition (X) during storage of the composition (X) can be effectively reduced. Therefore, even if the composition (X) is stored for a long period of time, the characteristics of the composition (X) are not easily impaired. Further, it is possible to particularly suppress the occurrence of tack on the cured product. For example, the proportion of the monofunctional cationically polymerizable compound (W2) is preferably in the range of 10 to 35% by mass.
 また、特に組成物(X)が多官能カチオン重合性化合物(W11)と多官能カチオン重合性化合物(W12)とを含有する場合、樹脂成分全量に対して、多官能カチオン重合性化合物(W11)の割合は、30~60質量%の範囲内、多官能カチオン重合性化合物(W12)の割合は15~30質量%の範囲内、単官能カチオン重合性化合物(W2)の割合は15~40質量%の範囲内であることが好ましい。この場合、組成物(X)の良好な保存安定性と低い粘度と良好なカチオン重合反応性とをバランス良く達成でき、更に硬化物の優れた透明性、及び優れた吸湿性をバランス良く達成できる。 Further, particularly when the composition (X) contains the polyfunctional cationically polymerizable compound (W11) and the polyfunctional cationically polymerizable compound (W12), the polyfunctional cationically polymerizable compound (W11) is used with respect to the total amount of the resin component. The ratio of the polyfunctional cationically polymerizable compound (W12) is in the range of 15 to 30% by mass, and the ratio of the monofunctional cationically polymerizable compound (W2) is 15 to 40% by mass. It is preferably in the range of%. In this case, good storage stability of the composition (X), low viscosity, and good cationic polymerization reactivity can be achieved in a well-balanced manner, and further, excellent transparency of the cured product and excellent hygroscopicity can be achieved in a well-balanced manner. ..
 カチオン重合性化合物(A12)が、式(3)に示す化合物と式(16)に示す化合物とを含有すれば、両者の比率を調整することで、組成物(X)から光硬化物を作製する場合の硬化反応の進行のしやすさを適度に調整しつつ、組成物(X)の低粘度化と保存安定性の向上とを実現できる。 If the cationically polymerizable compound (A12) contains the compound represented by the formula (3) and the compound represented by the formula (16), a photocured product is produced from the composition (X) by adjusting the ratio of both. It is possible to reduce the viscosity of the composition (X) and improve the storage stability while appropriately adjusting the ease of progress of the curing reaction in the case of the above.
 式(16)に示す化合物の量は、組成物(X)が前記の特性を有するように適宜調整される。例えば式(16)に示す化合物の量は、樹脂成分全量に対して10質量%以上40質量%以下であることが好ましい。 The amount of the compound represented by the formula (16) is appropriately adjusted so that the composition (X) has the above-mentioned characteristics. For example, the amount of the compound represented by the formula (16) is preferably 10% by mass or more and 40% by mass or less with respect to the total amount of the resin components.
 カチオン重合性化合物(A12)は、下記式(30)で示される化合物(f1)(以下、芳香族エポキシ化合物(f1)ともいう)を含有することが好ましい。 The cationically polymerizable compound (A12) preferably contains a compound (f1) represented by the following formula (30) (hereinafter, also referred to as an aromatic epoxy compound (f1)).
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
 式(30)中、Xはハロゲン、H、炭化水素基及びアルキレングルコール基からなる群から選択される少なくとも一種であり、一分子中にXが複数ある場合は互いに同一であっても異なっていてもよい。炭化水素基は、例えばアルキル基又はアリール基である。Xが炭化水素基である場合のXの炭素数は例えば1から10までの範囲内である。Rは単結合又は二価の有機基である。Rが二価の有機基である場合、二価の有機基は例えばアルキレン基、オキシアルキレン基、カルボニルオキシアルキレン基(例えば-CO-O-CH2-)、又は-C(Ph)2-O-CH2-基である。YはH又は一価の有機基である。Yが一価の有機基である場合、一価の有機基は例えばアルキル基又はアリール基である。 In formula (30), X is at least one selected from the group consisting of halogen, H, hydrocarbon group and alkylene glucol group, and when there are a plurality of X in one molecule, they are different even if they are the same. You may. The hydrocarbon group is, for example, an alkyl group or an aryl group. When X is a hydrocarbon group, the number of carbon atoms of X is, for example, in the range of 1 to 10. R is a single bond or divalent organic group. When R is a divalent organic group, the divalent organic group is, for example, an alkylene group, an oxyalkylene group, a carbonyloxyalkylene group (for example, -CO-O-CH2-), or -C (Ph) 2-O-. CH2-group. Y is H or a monovalent organic group. When Y is a monovalent organic group, the monovalent organic group is, for example, an alkyl group or an aryl group.
 カチオン重合性化合物(A12)が芳香族エポキシ化合物(f1)を含有すると、芳香族エポキシ化合物(f1)は低い粘度を有するため、芳香族エポキシ化合物(f1)は組成物(X)を低粘度化させうる。また、芳香族エポキシ化合物(f1)は揮発しにくく、そのため組成物(X)を保存していても、組成物(X)には芳香族エポキシ化合物(f1)の揮発による組成の変化が生じにくい。そのため芳香族エポキシ化合物(f1)は組成物(X)の保存安定性を高めうる。また、芳香族エポキシ化合物(f1)は高い反応性を有するため、硬化物中に未反応の成分が残留しにくく、そのため硬化物からアウトガスを発生させにくい。さらに、芳香族エポキシ化合物(f1)は硬化物のガラス転移温度を高めることができ、そのため硬化物の耐熱性を高めうる。 When the cationically polymerizable compound (A12) contains the aromatic epoxy compound (f1), the aromatic epoxy compound (f1) has a low viscosity, so that the aromatic epoxy compound (f1) lowers the viscosity of the composition (X). I can let you. Further, the aromatic epoxy compound (f1) is less likely to volatilize, so that even if the composition (X) is stored, the composition (X) is less likely to change in composition due to the volatilization of the aromatic epoxy compound (f1). .. Therefore, the aromatic epoxy compound (f1) can enhance the storage stability of the composition (X). Further, since the aromatic epoxy compound (f1) has high reactivity, unreacted components are less likely to remain in the cured product, and therefore outgas is less likely to be generated from the cured product. Further, the aromatic epoxy compound (f1) can increase the glass transition temperature of the cured product, and thus can increase the heat resistance of the cured product.
 また、芳香族エポキシ化合物(f1)は、組成物(X)をインクジェット法で吐出する場合に、サテライトと呼ばれる不良な液滴を生じさせにくい。サテライトとは、インクジェット法で液滴を吐出する場合に、本来の液滴から分離して、塗布対象における本来の液滴の付着位置とは異なる位置に付着してしまう液滴である。サテライトが生じると、組成物(X)から作製される硬化物の寸法精度の悪化を招いてしまう。 Further, the aromatic epoxy compound (f1) is less likely to generate defective droplets called satellites when the composition (X) is ejected by the inkjet method. A satellite is a droplet that is separated from the original droplet and adheres to a position different from the original droplet attachment position on the coating target when the droplet is ejected by the inkjet method. When satellites are generated, the dimensional accuracy of the cured product produced from the composition (X) is deteriorated.
 式(30)中のRが単結合又はアルキレン基であることが好ましい。式(30)中のnが2又は3である場合には、式(30)中の複数のRのうち少なくとも一つが単結合又はアルキレン基であることが好ましい。これらの場合、芳香族エポキシ化合物(f1)の反応性が高くなり、そのため組成物(X)に紫外線を照射した場合の組成物(X)の硬化性が高くなりうる。 It is preferable that R in the formula (30) is a single bond or an alkylene group. When n in the formula (30) is 2 or 3, it is preferable that at least one of the plurality of Rs in the formula (30) is a single bond or an alkylene group. In these cases, the reactivity of the aromatic epoxy compound (f1) becomes high, and therefore the curability of the composition (X) when the composition (X) is irradiated with ultraviolet rays can be high.
 芳香族エポキシ化合物(f1)は、例えば下記式(301)~(318)にそれぞれ示される化合物からなる群から選択される少なくとも一種の化合物を含有することが好ましい。 The aromatic epoxy compound (f1) preferably contains, for example, at least one compound selected from the group consisting of the compounds represented by the following formulas (301) to (318).
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
 特に芳香族エポキシ化合物(f1)が式(301)~(305)、(312)、(314)及び(318)にそれぞれ示される化合物からなる群から選択される少なくとも一種の成分を含有することが好ましい。これらの化合物は、化合物中の少なくとも一つのエポキシ基(オキシラン)とベンゼ環とが単結合又はアルキレン基で結合されていることで、高い反応性を有し、そのため組成物(X)の硬化性を高めうる。 In particular, the aromatic epoxy compound (f1) may contain at least one component selected from the group consisting of the compounds represented by the formulas (301) to (305), (312), (314) and (318), respectively. preferable. These compounds have high reactivity because at least one epoxy group (oxylan) in the compound and a benze ring are bonded by a single bond or an alkylene group, and thus the curability of the composition (X). Can be enhanced.
 カチオン重合性化合物(A12)全体に対する芳香族エポキシ化合物(f1)の割合は、5質量%以上であることが好ましい。この場合、芳香族エポキシ化合物(f1)による上記の作用が特に顕著に得られうる。この割合は、95質量%以下であることも好ましい。この場合、組成物(X)の保存安定性が良好となりうる。この割合は10質量%以上90質量%以下であればより好ましく、20質量%以上85質量%以下であれば更に好ましい。 The ratio of the aromatic epoxy compound (f1) to the entire cationically polymerizable compound (A12) is preferably 5% by mass or more. In this case, the above-mentioned action by the aromatic epoxy compound (f1) can be obtained particularly remarkably. This ratio is also preferably 95% by mass or less. In this case, the storage stability of the composition (X) may be good. This ratio is more preferably 10% by mass or more and 90% by mass or less, and further preferably 20% by mass or more and 85% by mass or less.
 カチオン重合性化合物(A12)が、オキシアルキレン骨格を有する化合物(f2)を含有することも好ましい。オキシアルキレン骨格とは、一又は複数の直鎖状のオキシアルキレン単位からなる直鎖状の骨格である。 It is also preferable that the cationically polymerizable compound (A12) contains a compound (f2) having an oxyalkylene skeleton. The oxyalkylene skeleton is a linear skeleton composed of one or more linear oxyalkylene units.
 カチオン重合性化合物(A12)が化合物(f2)を含有すると、化合物(f2)は低い粘度を有するため、化合物(f2)は組成物(X)を低粘度化させうる。また、化合物(f2)は揮発しにくく、そのため組成物(X)を保存していても、組成物(X)には芳香族エポキシ化合物(f1)の揮発による組成の変化が生じにくい。そのため化合物(f2)は組成物(X)の保存安定性を高めうる。 When the cationically polymerizable compound (A12) contains the compound (f2), the compound (f2) has a low viscosity, so that the compound (f2) can reduce the viscosity of the composition (X). Further, the compound (f2) is less likely to volatilize, and therefore, even if the composition (X) is stored, the composition (X) is less likely to change in composition due to the volatilization of the aromatic epoxy compound (f1). Therefore, the compound (f2) can enhance the storage stability of the composition (X).
 また、化合物(f2)は、組成物(X)をインクジェット法で吐出する場合に、サテライトと呼ばれる不良な液滴を生じさせにくい。さらに、化合物(f2)は、インクジェット法で吐出される液滴の速度を速くしてもサテライトを生じにくくできる。そのため、インクジェットの条件にもよるが、例えばサテライトを生じさせることなくインクジェット法による液滴の吐出速度を4m/s又はそれ以上にすることも可能である。液滴の速度を速くできると、液滴の軌跡が外乱の影響を受けにくくなるので、組成物(X)から作製される硬化物の寸法精度を高めることができる。さらに、化合物(f2)は上述のとおり組成物(X)の保存安定性を高めることができるので、組成物(X)を長期間保管しても、サテライトを生じにくいという組成物(X)の特性が維持されうる。 Further, the compound (f2) is less likely to generate defective droplets called satellites when the composition (X) is ejected by the inkjet method. Further, the compound (f2) can make satellites less likely to occur even if the speed of the droplets ejected by the inkjet method is increased. Therefore, depending on the conditions of inkjet, for example, it is possible to increase the ejection speed of droplets by the inkjet method to 4 m / s or more without causing satellites. If the velocity of the droplet can be increased, the trajectory of the droplet is less likely to be affected by disturbance, so that the dimensional accuracy of the cured product produced from the composition (X) can be improved. Further, since the compound (f2) can enhance the storage stability of the composition (X) as described above, the composition (X) is less likely to generate satellites even if the composition (X) is stored for a long period of time. The properties can be maintained.
 オキシアルキレン骨格は、特に「-C-C-O-」という構造、すなわちオキシメチレン単位を含むことが好ましい。この場合、サテライトが特に生じにくくなり、例えばインクジェット法で組成物(X)を吐出するに当たっての駆動周波数を変動させてもサテライトが生じにくくなる。また、化合物(f2)がより揮発しにくく、かつより低粘度になり、更に組成物(X)の無機材料に対する親和性(濡れ性)が高まりうる。 The oxyalkylene skeleton preferably contains a structure of "-C-C-O-", that is, an oximethylene unit. In this case, satellites are less likely to be generated, and satellites are less likely to be generated even if the drive frequency at which the composition (X) is ejected by, for example, an inkjet method is changed. Further, the compound (f2) is less likely to volatilize and has a lower viscosity, and the affinity (wetting property) of the composition (X) with respect to the inorganic material can be enhanced.
 化合物(f2)におけるオキシアルキレン骨格中のオキシアルキレン単位の数は1以上8以下であることが好ましい。この場合、化合物(f2)がより低粘度になりうるため、サテライトが特に生じにくくなり、かつ硬化物の架橋密度が高くなりうることで硬化物のガラス転移温度が特に高くなりうる。このオキシアルキレン単位の数は1以上6以下であればより好ましく、1以上4以下であれば更に好ましい。 The number of oxyalkylene units in the oxyalkylene skeleton of compound (f2) is preferably 1 or more and 8 or less. In this case, since the compound (f2) can have a lower viscosity, satellites are less likely to occur, and the crosslink density of the cured product can be increased, so that the glass transition temperature of the cured product can be particularly high. The number of the oxyalkylene units is more preferably 1 or more and 6 or less, and further preferably 1 or more and 4 or less.
 なお、化合物(f2)におけるオキシアルキレン骨格中のオキシアルキレン単位には、水素以外の置換基が結合していてもよい。例えばオキシアルキレン骨格に含まれているオキシメチレン単位が「-CH(CH3)-CH2-O-」という構造を有してもよい。 A substituent other than hydrogen may be bonded to the oxyalkylene unit in the oxyalkylene skeleton of the compound (f2). For example, the oxymethylene unit contained in the oxyalkylene skeleton may have a structure of "-CH (CH 3 ) -CH 2 -O-".
 化合物(f2)の割合はカチオン重合性化合物(A12)に対して10質量%以上であることが好ましい。この場合、インクジェット性が良好となり、基材への濡れ性がよくなる。この割合が70重量%以下であることも好ましい。この場合、十分にガラス転移温度を高めることができる。この割合は15質量%以上60質量%以下であればより好ましく、20質量%以上50質量%以下であれば更に好ましい。 The ratio of the compound (f2) is preferably 10% by mass or more with respect to the cationically polymerizable compound (A12). In this case, the ink jet property becomes good and the wettability to the base material becomes good. It is also preferable that this ratio is 70% by weight or less. In this case, the glass transition temperature can be sufficiently increased. This ratio is more preferably 15% by mass or more and 60% by mass or less, and further preferably 20% by mass or more and 50% by mass or less.
 化合物(f2)は、例えばオキシアルキレン骨格とエポキシ基とを有する化合物(f21)と、オキシアルキレン基とオキセタン基とを有する化合物(f22)とのうち、少なくとも一種の化合物を含有する。 The compound (f2) contains, for example, at least one compound among a compound (f21) having an oxyalkylene skeleton and an epoxy group and a compound (f22) having an oxyalkylene group and an oxetane group.
 化合物(f21)は、例えば上記の式(1b)に示す化合物、式(4)に示す化合物、式(5)に示す化合物、式(6)に示す化合物、式(7)に示す化合物、式(8)に示す化合物、式(13)に示す化合物、式(14)に示す化合物等からなる群から選択される少なくとも一種の化合物を含有する。なお、化合物(f21)が含有しうる成分は前記のみには制限されない。 The compound (f21) is, for example, the compound represented by the above formula (1b), the compound represented by the formula (4), the compound represented by the formula (5), the compound represented by the formula (6), the compound represented by the formula (7), and the formula. It contains at least one compound selected from the group consisting of the compound represented by (8), the compound represented by the formula (13), the compound represented by the formula (14) and the like. The components that can be contained in the compound (f21) are not limited to the above.
 化合物(f22)は、例えば上記の式(3)に示す化合物、式(12)に示す化合物、式(16)に示す化合物、及び式(17)に示す化合物からなる群から選択される少なくとも一種の化合物を含有する。なお、化合物(f22)が含有しうる成分は前記のみには制限されない。 The compound (f22) is at least one selected from the group consisting of, for example, the compound represented by the above formula (3), the compound represented by the formula (12), the compound represented by the formula (16), and the compound represented by the formula (17). Contains the compound of. The components that can be contained in the compound (f22) are not limited to the above.
 硫黄を有する化合物は、1分子中に少なくとも一つのエチレン性不飽和基を有し、かつ1分子中に少なくとも一つの硫黄原子を有することが好ましい。エチレン性不飽和基は、(メタ)アクリロイル基であってもよく、(メタ)アクリロイル基以外の基であってもよい。硫黄を有する化合物は、特にフェニルスルフィド骨格を有する化合物を含有することが好ましい。フェニルスルフィド骨格とは、フェニル基と硫黄原子とが単結合で直接結合した構造をいう。フェニルスルフィド骨格を有する化合物は、ポリアリーレンスルフィド化合物を含有することが好ましい。ポリアリーレンスルフィド化合物とは、分子内に、[-Ar-S-]で示す繰り返し単位を有する化合物である。Arは、アリーレン基であり、例えばフェニレン基である。硫黄を有する化合物は、例えばアリルフェニルスルフィド、ビニルフェニルスルフィド、及びビス(4-メタクリロイルチオフェニル)スルフィド等からなる群から選択される少なくとも一種を含む。特に、硫黄を有する化合物が、臭気を発生させにくいビス(4-メタクリロイルチオフェニル)スルフィドを含有することが好ましい。光硬化性化合物(A1)に対する硫黄を有する化合物の割合は、例えば10質量%以上90質量%以下、好ましくは25質量%以上80質量%以下、更に好ましくは40質量%以上80質量%以下である。 The sulfur-containing compound preferably has at least one ethylenically unsaturated group in one molecule and at least one sulfur atom in one molecule. The ethylenically unsaturated group may be a (meth) acryloyl group or a group other than the (meth) acryloyl group. The compound having sulfur is particularly preferable to contain a compound having a phenyl sulfide skeleton. The phenyl sulfide skeleton is a structure in which a phenyl group and a sulfur atom are directly bonded by a single bond. The compound having a phenyl sulfide skeleton preferably contains a polyarylene sulfide compound. The polyarylene sulfide compound is a compound having a repeating unit represented by [-Ar-S-] in the molecule. Ar is an arylene group, for example, a phenylene group. The sulfur-containing compound includes, for example, at least one selected from the group consisting of allyl phenyl sulfide, vinyl phenyl sulfide, bis (4-methacryloylthiophenyl) sulfide and the like. In particular, it is preferable that the sulfur-containing compound contains a bis (4-methacryloylthiophenyl) sulfide that does not easily generate an odor. The ratio of the compound having sulfur to the photocurable compound (A1) is, for example, 10% by mass or more and 90% by mass or less, preferably 25% by mass or more and 80% by mass or less, and more preferably 40% by mass or more and 80% by mass or less. ..
 カチオン重合性化合物(A12)は、エポキシ化合物と上記の化合物(f22)とを含有することも好ましい。エポキシ化合物は、例えば上述のカチオン重合性化合物(A12)に含まれうる化合物のうちのエポキシ基を有する化合物のうち、少なくとも一種の化合物を含有する。カチオン重合性化合物(A12)がエポキシ化合物と化合物(f22)とを含有すると、組成物(X)に紫外線が照射された場合の組成物(X)の硬化性が高まり、かつこのときの組成物(X)の急激過ぎる硬化が起こりにくくなり、そのため硬化物に白濁などによる透明性の悪化が起こりにくくなる。この作用を生じさせる機序は次のとおりであると推察される。化合物(f22)の反応性はエポキシ化合物の反応性よりも低いことから、組成物(X)に紫外線が照射されると、まずエポキシ化合物が反応する。このエポキシ化合物の反応によって、組成物(X)の硬化性が高くなりうる。続いて、化合物(f22)が反応することで、エポキシ化合物と化合物(f22)とが一度に反応する事態を生じにくくできる。これにより急激過ぎる反応が起こりにくくなると考えられる。この場合のカチオン重合性化合物(A12)に対する化合物(f22)の割合は、20質量%以上であることが好ましい。この場合、化合物(f22)によって、組成物(X)を特に低粘度化させ、かつ組成物(X)の保存安定性を特に高めうる。さらに、化合物(f22)によって組成物(X)の硬化性を特に高めうる。化合物(f22)の割合は、90質量%以下であることも好ましい。この場合、硬化物の硬化性を十分に高めることができる。化合物(f22)の割合は10質量%以上90質量%以下であればより好ましく、20質量%以上80質量%以下であれば更に好ましい。また、この場合のエポキシ化合物の割合は、カチオン重合性化合物(A12)の総量に対して10質量%以上90質量%以下であることが好ましく、20質量%以上80質量%以下であればより好ましく、25質量%以上75質量%以下であれば更に好ましい。これらの場合、硬化物中の未反応基を十分に減少させて、硬化物の硬化性を十分に高めることができる。 It is also preferable that the cationically polymerizable compound (A12) contains an epoxy compound and the above-mentioned compound (f22). The epoxy compound contains, for example, at least one compound among the compounds having an epoxy group among the compounds that can be contained in the above-mentioned cationically polymerizable compound (A12). When the cationically polymerizable compound (A12) contains the epoxy compound and the compound (f22), the curability of the composition (X) when the composition (X) is irradiated with ultraviolet rays is enhanced, and the composition at this time is enhanced. Too rapid curing of (X) is less likely to occur, and therefore deterioration of transparency due to cloudiness or the like is less likely to occur in the cured product. The mechanism that causes this effect is presumed to be as follows. Since the reactivity of the compound (f22) is lower than that of the epoxy compound, when the composition (X) is irradiated with ultraviolet rays, the epoxy compound first reacts. The reaction of this epoxy compound can increase the curability of the composition (X). Subsequently, the reaction of the compound (f22) makes it difficult for the epoxy compound and the compound (f22) to react at once. It is considered that this makes it difficult for an excessively rapid reaction to occur. In this case, the ratio of the compound (f22) to the cationically polymerizable compound (A12) is preferably 20% by mass or more. In this case, the compound (f22) can make the composition (X) particularly low in viscosity and particularly enhance the storage stability of the composition (X). Further, the compound (f22) can particularly enhance the curability of the composition (X). The proportion of the compound (f22) is also preferably 90% by mass or less. In this case, the curability of the cured product can be sufficiently enhanced. The ratio of the compound (f22) is more preferably 10% by mass or more and 90% by mass or less, and further preferably 20% by mass or more and 80% by mass or less. Further, the ratio of the epoxy compound in this case is preferably 10% by mass or more and 90% by mass or less, and more preferably 20% by mass or more and 80% by mass or less with respect to the total amount of the cationically polymerizable compound (A12). , 25% by mass or more and 75% by mass or less is more preferable. In these cases, the unreacted groups in the cured product can be sufficiently reduced to sufficiently enhance the curability of the cured product.
 エポキシ化合物は、グリシジルエーテル基を構成しないオキシラン環を少なくとも一つ有する化合物を含有することが好ましい。この場合、エポキシ化合物は、組成物(X)の硬化性を特に高めうる。エポキシ化合物が、グリシジルエーテル基を構成しないオキシラン環を二以上有する化合物を含有すれば、より好ましい。エポキシ化合物が、グリシジルエーテル基を有さない化合物を含有することも好ましい。エポキシ化合物が、グリシジルエーテル基を構成しないオキシラン環を二以上有し、かつグリシジルエーテル基を有さない化合物を含有すれば、特に好ましい。 The epoxy compound preferably contains a compound having at least one oxylan ring that does not form a glycidyl ether group. In this case, the epoxy compound can particularly enhance the curability of the composition (X). It is more preferable that the epoxy compound contains a compound having two or more oxylane rings that do not form a glycidyl ether group. It is also preferable that the epoxy compound contains a compound having no glycidyl ether group. It is particularly preferable that the epoxy compound contains a compound having two or more oxylane rings that do not form a glycidyl ether group and that does not have a glycidyl ether group.
 カチオン重合性化合物(A12)が化合物(f2)とエポキシ化合物とを含有し、更にエポキシ化合物が上述の芳香族エポキシ化合物(f1)を含有すれば、特に好ましい。この場合、組成物(X)は特に優れた保存安定性を有し、また組成物(X)をインクジェット法で吐出する場合に、サテライトと呼ばれる不良な液滴を特に生じさせにくい。さらに、インクジェット法で吐出される液滴の速度を速くしてもサテライトを特に生じにくくできる。さらに、組成物(X)を長期間保管しても、サテライトを生じにくいという組成物(X)の特性が特に維持されうる。この場合に化合物(f2)が化合物(f22)を含有すれば特に好ましい。 It is particularly preferable that the cationically polymerizable compound (A12) contains the compound (f2) and the epoxy compound, and the epoxy compound further contains the above-mentioned aromatic epoxy compound (f1). In this case, the composition (X) has particularly excellent storage stability, and when the composition (X) is ejected by an inkjet method, it is particularly difficult to generate defective droplets called satellites. Further, even if the speed of the droplets ejected by the inkjet method is increased, satellites can be made particularly difficult to occur. Further, even if the composition (X) is stored for a long period of time, the characteristic of the composition (X) that satellites are less likely to be generated can be particularly maintained. In this case, it is particularly preferable that the compound (f2) contains the compound (f22).
 カチオン重合性化合物(A12)に対する芳香族エポキシ化合物(f1)と化合物(f22)との合計の割合は、55質量%以上であることが好ましい。この場合、芳香族エポキシ化合物(f1)と化合物(f22)との組み合わせによる作用が特に顕著に得られる。この割合は60質量%以上であればより好ましく、70質量%以上であれば更に好ましい。カチオン重合性化合物(A12)が芳香族エポキシ化合物(f1)と化合物(f22)とのみを含有すれば特に好ましい。 The total ratio of the aromatic epoxy compound (f1) and the compound (f22) to the cationically polymerizable compound (A12) is preferably 55% by mass or more. In this case, the action of the combination of the aromatic epoxy compound (f1) and the compound (f22) is particularly remarkable. This ratio is more preferably 60% by mass or more, and further preferably 70% by mass or more. It is particularly preferable that the cationically polymerizable compound (A12) contains only the aromatic epoxy compound (f1) and the compound (f22).
 組成物(X)がカチオン重合性化合物(A12)を含有する場合、組成物(X)は、増感剤を更に含有することが好ましい。この場合、組成物(X)は特に高いカチオン重合反応性を有することができる。増感剤は、例えば9,10-ジブトキシアントラセン及び9,10-ジエトキシアントラセンのうちいずれか一方又は両方を含有する。カチオン重合性化合物(A12)に対する増感剤の割合は、0質量%より多く、1質量%以下の範囲内であることが好ましい。この場合、増感剤が硬化物の透明性を阻害しにくく、そのため硬化物は良好な透明性を有することができる。 When the composition (X) contains the cationically polymerizable compound (A12), it is preferable that the composition (X) further contains a sensitizer. In this case, the composition (X) can have a particularly high cationic polymerization reactivity. The sensitizer contains, for example, one or both of 9,10-dibutoxyanthracene and 9,10-diethoxyanthracene. The ratio of the sensitizer to the cationically polymerizable compound (A12) is preferably more than 0% by mass and preferably in the range of 1% by mass or less. In this case, the sensitizer does not easily impair the transparency of the cured product, so that the cured product can have good transparency.
 組成物(X)がカチオン重合性化合物(A12)を含有する場合、組成物(X)は、光カチオン重合開始剤(E2)を更に含有することが好ましい。光カチオン重合開始剤(E2)は、光照射を受けてプロトン酸又はルイス酸を発生する触媒であれば、特に制限されない。光カチオン重合開始剤(E2)は、イオン性光酸発生型のカチオン硬化触媒と、非イオン性光酸発生型のカチオン硬化触媒とのうち、少なくとも一方を含有できる。 When the composition (X) contains a cationically polymerizable compound (A12), it is preferable that the composition (X) further contains a photocationic polymerization initiator (E2). The photocationic polymerization initiator (E2) is not particularly limited as long as it is a catalyst that generates protonic acid or Lewis acid by being irradiated with light. The photocationic polymerization initiator (E2) can contain at least one of an ionic photoacid generation type cation curing catalyst and a nonionic photoacid generation type cation curing catalyst.
 イオン性光酸発生型のカチオン硬化触媒は、オニウム塩類と有機金属錯体とのうち少なくとも一方を含有できる。オニウム塩類の例は、芳香族ジアゾニウム塩、芳香族ハロニウム塩、及び芳香族スルホニウム塩を含む。有機金属錯体の例は、鉄-アレン錯体、チタノセン錯体、及びアリールシラノール-アルミニウム錯体を含む。イオン性光酸発生型のカチオン硬化触媒は、これらの成分のうち少なくとも一種の成分を含有できる。 The ionic photoacid generation type cationic curing catalyst can contain at least one of an onium salt and an organic metal complex. Examples of onium salts include aromatic diazonium salts, aromatic halonium salts, and aromatic sulfonium salts. Examples of organometallic complexes include iron-allene complexes, titanosen complexes, and arylsilanol-aluminum complexes. The ionic photoacid generation type cationic curing catalyst can contain at least one of these components.
 非イオン性光酸発生型のカチオン硬化触媒は、例えばニトロベンジルエステル、スルホン酸誘導体、リン酸エステル、フェノールスルホン酸エステル、ジアゾナフトキノン、及びN-ヒドロキシイミドホスホナートからなる群から選択される少なくとも一種の成分を含有できる。なお、非イオン性光酸発生型のカチオン硬化触媒が含有しうる成分は前記には限られない。 The nonionic photoacid generation type cationic curing catalyst is at least one selected from the group consisting of, for example, nitrobenzyl ester, sulfonic acid derivative, phosphoric acid ester, phenol sulfonic acid ester, diazonaphthoquinone, and N-hydroxyimide phosphonate. Can contain the components of. The components that can be contained in the nonionic photoacid generation type cationic curing catalyst are not limited to the above.
 光カチオン重合開始剤(E2)が含有できる化合物のより具体的な例は、みどり化学製のDPIシリーズ(105,106、109、201など)、BI-105、MPIシリーズ(103、105、106、109など)、BBIシリーズ(101、102、103、105、106、109、110、200、210、300、301など)、TSPシリーズ(102、103、105、106、109、200、300、1000など)、HDS-109、MDSシリーズ(103、105、109、203、205、209など)、BDS-109、MNPS-109、DTSシリーズ(102、103、105、200など)、NDSシリーズ(103、105、155、165など)、DAMシリーズ(101、102、103、105、201など)、SIシリーズ(105、106など)、PI-106、NDIシリーズ(105、106、109、1001、1004など)、PAIシリーズ(01、101、106、1001、1002、1003、1004など)、MBZ-101、PYR-100、NBシリーズ(101、201など)、NAIシリーズ(100、1002,1003、1004、101、105、106、109など)、TAZシリーズ(100、101、102、103、104、107、108、109、110、113、114、118、122、123、203、204など)、NBC-101、ANC-101、TPS-Acetate、DTS-Acetate、Di-Boc Bisphinol A、tert-Butyl lithocholate、tert-Butyl deoxycholate、tert-Butyl cholate、BX、BC-2、MPI-103、BDS-105、TPS-103、NAT-103、BMS-105、及びTMS-105;
米国ユニオンカーバイド社製のサイラキュアUVI-6970、サイラキュアUVI-6974、サイラキュアUVI-6990、及びサイラキュアUVI-950;
BASF社製のイルガキュア250、イルガキュア261及びイルガキュア264;
チバガイギー社製のCG-24-61;
株式会社ADEKA製のアデカオプトマーSP-150、アデカオプトマーSP-151、アデカオプトマーSP-170及びアデカオプトマーSP-171;
株式会社ダイセル製のDAICAT II;
ダイセル・サイテック株式会社製のUVAC1590及びUVAC1591;
日本曹達株式会社製のCI-2064、CI-2639、CI-2624、CI-2481、CI-2734、CI-2855、CI-2823、CI-2758、及びCIT-1682;
ローディア社製のテトラキス(ペンタフルオロフェニル)ボレート トルイルクミルヨードニウム塩であるPI-2074;
3M社製のFFC509;
米国Sartomer社製のCD-1010、CD-1011及びCD-1012;
サンアプロ株式会社製のCPI-100P、CPI-101A、CPI-110P、CPI-110A及びCPI-210S;並びに
ダウ・ケミカル社製のUVI-6992及びUVI-6976を、含む。光カチオン重合開始剤(E2)は、これらの化合物からなる群から選択される少なくとも一種の化合物を含有できる。
More specific examples of compounds that can be contained in the photocationic polymerization initiator (E2) are DPI series (105, 106, 109, 201, etc.), BI-105, MPI series (103, 105, 106, etc.) manufactured by Midori Kagaku. 109, etc.), BBI series (101, 102, 103, 105, 106, 109, 110, 200, 210, 300, 301, etc.), TSP series (102, 103, 105, 106, 109, 200, 300, 1000, etc.) ), HDS-109, MDS series (103, 105, 109, 203, 205, 209, etc.), BDS-109, MNPS-109, DTS series (102, 103, 105, 200, etc.), NDS series (103, 105, etc.) , 155, 165, etc.), DAM series (101, 102, 103, 105, 201, etc.), SI series (105, 106, etc.), PI-106, NDI series (105, 106, 109, 1001, 1004, etc.), PAI series (01, 101, 106, 1001, 1002, 1003, 1004, etc.), MBZ-101, PYR-100, NB series (101, 201, etc.), NAI series (100, 1002, 1003, 1004, 101, 105, etc.) , 106, 109, etc.), TAZ series (100, 101, 102, 103, 104, 107, 108, 109, 110, 113, 114, 118, 122, 123, 203, 204, etc.), NBC-101, ANC- 101, TPS-Actate, DTS-Actate, Di-Boc Bisphinol A, tert-Butyl lithocholate, tert-Butyl deoxycholate, tert-Butyl cholate, BX, BC-2, MPI-103, BDS-105, TP -103, BMS-105, and TMS-105;
Union Carbide, USA Cyracure UVI-6970, Cyracure UVI-6974, Cyracure UVI-6990, and Cyracure UVI-950;
BASF's Irgacure 250, Irgacure 261 and Irgacure 264;
CG-24-61 manufactured by Ciba Geigy Co., Ltd .;
ADEKA CORPORATION ADEKA CORPORATION SP-150, ADEKA CORPORATION SP-151, ADEKA CORPORATION SP-170 and ADEKA CORPORATION SP-171;
DAICAT II manufactured by Daicel Corporation;
UVAC1590 and UVAC1591 manufactured by Daicel Cytec Co., Ltd .;
CI-2064, CI-2369, CI-2624, CI-2481, CI-2734, CI-2855, CI-2823, CI-2758, and CIT-1682; manufactured by Nippon Soda Corporation;
PI-2074, a tetrakis (pentafluorophenyl) borate toluyl cumyliodonium salt manufactured by Rhodia;
3M FFC509;
CD-1010, CD-1011 and CD-1012 manufactured by Sartomer, USA;
Includes CPI-100P, CPI-101A, CPI-110P, CPI-110A and CPI-210S from Sun Appro Co., Ltd .; and UVI-6992 and UVI-6976 from Dow Chemical. The photocationic polymerization initiator (E2) can contain at least one compound selected from the group consisting of these compounds.
 カチオン重合性化合物(A12)に対する光カチオン重合開始剤(E2)の割合は、1~4質量%の範囲内であることが好ましい。この割合が1質量%以上であることで、組成物(X)は特に良好なカチオン重合反応性を有することができる。また、この割合が4質量%以下であることで、組成物(X)は良好な保存安定性を有することができ、また過剰な光カチオン重合開始剤(E2)を含有しないことで製造コスト削減が可能である。 The ratio of the photocationic polymerization initiator (E2) to the cationically polymerizable compound (A12) is preferably in the range of 1 to 4% by mass. When this ratio is 1% by mass or more, the composition (X) can have a particularly good cationic polymerization reactivity. Further, when this ratio is 4% by mass or less, the composition (X) can have good storage stability, and the production cost is reduced by not containing an excessive photocationic polymerization initiator (E2). Is possible.
 <蛍光体(B)>
 次に、蛍光体(B)について説明する。蛍光体(B)は、量子ドット蛍光体(B1)を含有することが好ましい。蛍光体(B)が量子ドット蛍光体(B1)を含有する場合、組成物(X)から作製されるカラーレジスト1は、通常のカラーレジストと同様の波長変換機能を発揮するだけでなく、カラーフィルタ2から発せられる光の広色域化を実現させうる。そのため、カラーフィルタ2を備える発光装置11、特に表示装置から発せられる光の広色域化を実現させうる。また、カラーフィルタ2によって広色域化を実現できるので、発光装置11、特に表示装置に、広色域化のためのフィルタなどの部材を別途設けなくてもよい。このため、広色域化に当たっての発光装置11(表示装置)の部品点数の増大を抑制できる。このため、発光装置11(表示装置)の薄型化が可能であり、例えば曲げ可能なフレキシブルな発光装置11(表示装置)を実現させうる。
<Fluorescent body (B)>
Next, the fluorescent substance (B) will be described. The fluorophore (B) preferably contains a quantum dot fluorophore (B1). When the phosphor (B) contains the quantum dot phosphor (B1), the color resist 1 produced from the composition (X) not only exhibits the same wavelength conversion function as a normal color resist, but also has a color. It is possible to realize a wide color gamut of the light emitted from the filter 2. Therefore, it is possible to realize a wide color gamut of the light emitted from the light emitting device 11 including the color filter 2, particularly the display device. Further, since the wide color gamut can be realized by the color filter 2, it is not necessary to separately provide a member such as a filter for widening the color gamut in the light emitting device 11, particularly the display device. Therefore, it is possible to suppress an increase in the number of parts of the light emitting device 11 (display device) in widening the color gamut. Therefore, the light emitting device 11 (display device) can be made thinner, and for example, a bendable flexible light emitting device 11 (display device) can be realized.
 量子ドットとは量子サイズ効果を示す半導体粒子のことであり、量子ドット蛍光体(B1)は量子ドットからなる蛍光体である。量子ドット蛍光体(B1)の平均粒径は例えば1nm以上10nm以下である。量子ドット蛍光体(B1)の平均粒径は2nm以上6nm以下であることが好ましい。なお、量子ドット蛍光体(B1)は、同じ組成を有しても、粒径が異なれば発する蛍光の波長が異なる。そのため、量子ドット蛍光体(B1)は、組成物(X)から作製される波長変換部材が発する蛍光の波長に応じた粒径を有することが好ましい。量子ドット蛍光体(B1)は、例えば赤色の蛍光を発する半導体粒子と、緑色の蛍光を発する半導体粒子と、青色の蛍光を発する半導体粒子とからなる群から選択される少なくとも一種の半導体粒子を含有する。量子ドット蛍光体(B1)は、これら以外の色の蛍光を発する半導体粒子を含有してもよい。 Quantum dots are semiconductor particles that exhibit a quantum size effect, and quantum dot phosphors (B1) are phosphors composed of quantum dots. The average particle size of the quantum dot phosphor (B1) is, for example, 1 nm or more and 10 nm or less. The average particle size of the quantum dot phosphor (B1) is preferably 2 nm or more and 6 nm or less. Even if the quantum dot phosphor (B1) has the same composition, the wavelength of fluorescence emitted differs depending on the particle size. Therefore, it is preferable that the quantum dot phosphor (B1) has a particle size corresponding to the wavelength of fluorescence emitted by the wavelength conversion member produced from the composition (X). The quantum dot phosphor (B1) contains at least one semiconductor particle selected from the group consisting of, for example, a semiconductor particle that emits red fluorescence, a semiconductor particle that emits green fluorescence, and a semiconductor particle that emits blue fluorescence. do. The quantum dot phosphor (B1) may contain semiconductor particles that fluoresce in colors other than these.
 なお、量子ドット蛍光体(B1)の平均粒径は、動的光散乱法による測定結果から算出されるメディアン径、すなわち累積50%径(D50)である。測定装置としては、マイクロトラック・ベル株式会社のナノトラックNanotrac Waveシリーズを用いることができる。 The average particle size of the quantum dot phosphor (B1) is the median diameter calculated from the measurement result by the dynamic light scattering method, that is, the cumulative 50% diameter (D50). As the measuring device, Nanotrack Nanotrac Wave series manufactured by Microtrack Bell Co., Ltd. can be used.
 量子ドット蛍光体(B1)は、コアシェル構造を有する半導体粒子を含有してもよい。具体的には、量子ドット蛍光体(B1)は、例えばCdSeからなるコアとZnSからなるシェルとを有する半導体粒子(CdSe/ZnS)を含有する。量子ドット蛍光体(B1)は、これ以外の適宜の半導体粒子を含有してもよい。例えば量子ドット蛍光体(B1)は、GaN、GaP、InN、InP、Ga23、Ga23、In23、In23、ZnO、ZnS、CdO、CdS、ペロブスカイト型の半導体及びグラフェンタイプの半導体からなる群から選択される少なくとも一種の半導体を有する半導体粒子を含有してもよい。なお、量子ドット蛍光体(B1)が含みうる半導体粒子は前記に限られない。 The quantum dot phosphor (B1) may contain semiconductor particles having a core-shell structure. Specifically, the quantum dot phosphor (B1) contains semiconductor particles (CdSe / ZnS) having, for example, a core made of CdSe and a shell made of ZnS. The quantum dot phosphor (B1) may contain other suitable semiconductor particles. For example, the quantum dot phosphor (B1) is a GaN, GaP, InN, InP, Ga 2 O 3 , Ga 2 S 3 , In 2 O 3 , In 2 S 3 , ZnO, ZnS, CdO, CdS, or perovskite type semiconductor. And may contain semiconductor particles having at least one semiconductor selected from the group consisting of graphene type semiconductors. The semiconductor particles that the quantum dot phosphor (B1) can contain are not limited to the above.
 組成物(X)中の量子ドット蛍光体(B1)の量は、例えば組成物(X)全体に対して0.1質量%以上40質量%以下である。量子ドット蛍光体(B1)の量が0.1質量%以上であることで、組成物(X)の硬化物が波長変換機能を発現しうる。また、量子ドット蛍光体(B1)の量が40質量%以下であれば、組成物(X)をインクジェット法で成形できる。量子ドット蛍光体(B1)の量は、1質量%以上であればより好ましく、2質量%以上であれば更に好ましく、3質量%以上であれば特に好ましい。また量子ドット蛍光体(B1)の量は、35質量%以下であればより好ましく、30質量%以下であれば更に好ましく、25質量%以下であれば特に好ましい。 The amount of the quantum dot phosphor (B1) in the composition (X) is, for example, 0.1% by mass or more and 40% by mass or less with respect to the entire composition (X). When the amount of the quantum dot phosphor (B1) is 0.1% by mass or more, the cured product of the composition (X) can exhibit the wavelength conversion function. Further, when the amount of the quantum dot phosphor (B1) is 40% by mass or less, the composition (X) can be molded by an inkjet method. The amount of the quantum dot phosphor (B1) is more preferably 1% by mass or more, further preferably 2% by mass or more, and particularly preferably 3% by mass or more. The amount of the quantum dot phosphor (B1) is more preferably 35% by mass or less, further preferably 30% by mass or less, and particularly preferably 25% by mass or less.
 <光散乱粒子(C)>
 次に、光散乱粒子(C)について説明する。
<Light scattering particles (C)>
Next, the light scattering particles (C) will be described.
 まず第一の実施形態において用いられる光散乱粒子(C)について説明する。第一の実施形態において、光散乱粒子(C)は、上述のとおり、比重が2.0以下のコア部と、コア部を覆う屈折率が1.9以上のシェルと、を有するコアシェル型粒子(C0)を含む。なお光散乱粒子(C)は、全てがコアシェル型粒子(C0)であっても、光散乱機能を有するその他の種の粒子を一部含むものであってもよい。 First, the light scattering particles (C) used in the first embodiment will be described. In the first embodiment, as described above, the light scattering particles (C) are core-shell type particles having a core portion having a specific gravity of 2.0 or less and a shell having a refractive index of 1.9 or more covering the core portion. (C0) is included. The light scattering particles (C) may be all core-shell type particles (C0) or may include some particles of other species having a light scattering function.
 コアシェル型粒子(C0)は前記コア部の比重が2.0以下であるため、組成物(X)中で比較的沈降しにくい。また、シェルの屈折率が1.9以上であるため、波長変換部材内におけるコアシェル型粒子(C0)と反応硬化性化合物(A)の硬化物との間の屈折率差が大きくなり、そのため波長変換部材内に入射した光が、コアシェル型粒子(C0)と反応硬化性化合物(A)の硬化物との界面で反射しうる。そのため、波長変換部材内で光が散乱しうる。 Since the core-shell type particles (C0) have a specific gravity of 2.0 or less in the core portion, they are relatively difficult to settle in the composition (X). Further, since the refractive index of the shell is 1.9 or more, the difference in the refractive index between the core-shell type particles (C0) and the cured product of the reaction-curable compound (A) in the wavelength conversion member becomes large, and therefore the wavelength. The light incident on the conversion member can be reflected at the interface between the core-shell type particles (C0) and the cured product of the reaction-curable compound (A). Therefore, light may be scattered in the wavelength conversion member.
 前記コア部の比重は1.2以下であればより好ましく、0.8以下であれば更に好ましい。また前記コア部の比重は例えば0.1以上である。 The specific gravity of the core portion is more preferably 1.2 or less, and further preferably 0.8 or less. Further, the specific gravity of the core portion is, for example, 0.1 or more.
 前記コア部は、有体の粒子(コア粒子)で構成されていても、空隙状である中空部であってもよい。 The core portion may be composed of tangible particles (core particles) or may be a hollow portion having a void shape.
 前記コア粒子は、有機樹脂粒子と無機粒子とのうち、少なくとも一方を含んでよい。特に前記コア粒子が有機樹脂粒子を含むと、前記コア部の比重を低減させうる。有機樹脂粒子は、例えばアクリル樹脂、スチレン樹脂及びその共重合体、並びにウレタン樹脂などからなる群から選択される少なくとも一種の樹脂を含む。 The core particles may contain at least one of organic resin particles and inorganic particles. In particular, when the core particles contain organic resin particles, the specific gravity of the core portion can be reduced. The organic resin particles include, for example, at least one resin selected from the group consisting of acrylic resins, styrene resins and copolymers thereof, and urethane resins.
 前記コア粒子は、中空粒子を含んでもよい。中空粒子は、空隙を内包した粒子である。前記コア粒子が中空粒子を含むと、前記コア部の比重を低減させうる。また、前記コア粒子が中空粒子を含むと、波長変換部材内に入射した光が中空粒子内に入射した場合に、中空粒子内の固体と気体との界面で光が反射し、そのため、光散乱粒子(C)が光を更に散乱させうる。 The core particles may contain hollow particles. Hollow particles are particles containing voids. When the core particles contain hollow particles, the specific gravity of the core portion can be reduced. Further, when the core particles contain hollow particles, when the light incident on the wavelength conversion member is incident on the hollow particles, the light is reflected at the interface between the solid and the gas in the hollow particles, and therefore light is scattered. Particles (C) can further scatter light.
 中空粒子は、有機樹脂粒子(中空樹脂粒子)と無機粒子(中空無機粒子)とのうち、少なくとも一方を含んでよい。中空樹脂粒子は、例えば中空アクリル樹脂粒子、及び中空スチレン樹脂粒子、などからなる群から選択される少なくとも一種を含有する。中空無機粒子は、例えば中空シリカ粒子、中空ガラス粒子、及び中空アルミナ粒子、中空アルミナシリケート粒子、中空炭酸カルシウム粒子などからなる群から選択される少なくとも一種を含有する。 The hollow particles may contain at least one of organic resin particles (hollow resin particles) and inorganic particles (hollow inorganic particles). The hollow resin particles contain at least one selected from the group consisting of, for example, hollow acrylic resin particles, hollow styrene resin particles, and the like. The hollow inorganic particles contain at least one selected from the group consisting of, for example, hollow silica particles, hollow glass particles, and hollow alumina particles, hollow alumina silicate particles, hollow calcium carbonate particles, and the like.
 上記のとおり、前記シェルの屈折率は、1.9以上である。前記シェルの屈折率は、2.2以上であればより好ましく、2.5以上であれば更に好ましい。前記シェルの屈折率は高いほど好ましく上限は特に限定されないが、例えば前記シェルの屈折率は4.0以下である。 As mentioned above, the refractive index of the shell is 1.9 or more. The refractive index of the shell is more preferably 2.2 or more, and even more preferably 2.5 or more. The higher the refractive index of the shell is, the more preferable it is, and the upper limit is not particularly limited. For example, the refractive index of the shell is 4.0 or less.
 また、前記シェルの屈折率は、反応硬化性化合物(A)の硬化物の屈折率よりも0.4以上高いことが好ましい。すなわち、前記シェルの屈折率は反応硬化性化合物(A)の屈折率よりも高く、かつ前記シェルと反応硬化性化合物(A)の硬化物との屈折率差は0.4以上であることが好ましい。この場合、光散乱粒子(C)と反応硬化性化合物(A)の硬化物との界面で光が特に反射しうる。この屈折率差は0.7以上であればより好ましく、1.0以上であれば更に好ましい。屈折率差は大きいほど好ましいが、屈折率差は例えば2.5以下である。 Further, the refractive index of the shell is preferably 0.4 or more higher than the refractive index of the cured product of the reaction-curable compound (A). That is, the refractive index of the shell is higher than the refractive index of the reaction-curable compound (A), and the difference in refractive index between the shell and the cured product of the reaction-curable compound (A) is 0.4 or more. preferable. In this case, light can be particularly reflected at the interface between the light-scattering particles (C) and the cured product of the reaction-curable compound (A). The difference in refractive index is more preferably 0.7 or more, and even more preferably 1.0 or more. The larger the difference in refractive index is, the more preferable it is, but the difference in refractive index is, for example, 2.5 or less.
 前記シェルの材質は、前記シェルに要求される屈折率に応じて適宜選択される。前記シェルは、例えば酸化チタン、酸化亜鉛、酸化ジルコニウム、酸化アルミニウム及びチタン酸バリウムからなる群から選択される少なくとも一種を含有する。この場合、高い屈折率差を実現しうる。 The material of the shell is appropriately selected according to the refractive index required for the shell. The shell contains, for example, at least one selected from the group consisting of titanium oxide, zinc oxide, zirconium oxide, aluminum oxide and barium titanate. In this case, a high refractive index difference can be realized.
 前記シェルは前記コア粒子の表面の少なくとも一部を覆っていればよい。好ましくは、前記シェルは前記コア粒子の表面の50%以上を覆う。この場合、光散乱粒子(C)が光を特に散乱させうる。前記シェルが前記コア粒子の表面全体を覆っていれば特に好ましい。 The shell may cover at least a part of the surface of the core particles. Preferably, the shell covers more than 50% of the surface of the core particles. In this case, the light scattering particles (C) can particularly scatter the light. It is particularly preferable that the shell covers the entire surface of the core particles.
 前記コア部が中空部である場合、コアシェル型粒子(C0)は例えば次のように作製される。有機樹脂の粒子をシェルで覆うことで原料粒子を作製する。前記シェルの構成は、前記コア部がコア粒子である場合と同じでよい。この原料粒子を、例えば900℃以上の温度で加熱する。そうすると、有機樹脂の粒子が蒸発することで、前記シェルと当該シェルの内側の中空部とを有するコアシェル型粒子(C0)が得られる。この場合、前記シェルを加熱することで当該シェルの結晶性を高めることができ、これにより前記シェルの屈折率を高めることができる。また、コアシェル型粒子(C0)の中空率を高めることで光散乱粒子(C)の比重を低くすることができ、このため光散乱粒子(C)を沈降しにくくできる。 When the core portion is a hollow portion, core-shell type particles (C0) are produced, for example, as follows. Raw material particles are produced by covering the organic resin particles with a shell. The structure of the shell may be the same as when the core portion is a core particle. The raw material particles are heated, for example, at a temperature of 900 ° C. or higher. Then, the particles of the organic resin evaporate to obtain core-shell type particles (C0) having the shell and the hollow portion inside the shell. In this case, the crystallinity of the shell can be increased by heating the shell, whereby the refractive index of the shell can be increased. Further, by increasing the hollowness ratio of the core-shell type particles (C0), the specific gravity of the light-scattering particles (C) can be lowered, and therefore the light-scattering particles (C) can be less likely to settle.
 前記シェルの厚みが5nm以上60nm以下であることも好ましい。厚みが5nm以上であると、コアシェル型粒子(C0)と硬化物との界面で光が特に反射しうる。また、厚みが60nm以下であると、コアシェル型粒子(C0)が特に沈降しにくい。厚みは光の散乱の観点から10nm以上であればより好ましく、20nm以上であれば更に好ましい。また厚みは沈降の観点から40nm以下であればより好ましく、30nm以下であれば更に好ましい。 It is also preferable that the thickness of the shell is 5 nm or more and 60 nm or less. When the thickness is 5 nm or more, light can be particularly reflected at the interface between the core-shell type particles (C0) and the cured product. Further, when the thickness is 60 nm or less, the core-shell type particles (C0) are particularly difficult to settle. The thickness is more preferably 10 nm or more, and further preferably 20 nm or more from the viewpoint of light scattering. Further, the thickness is more preferably 40 nm or less, and further preferably 30 nm or less from the viewpoint of sedimentation.
 コアシェル型粒子(C0)は、前記シェルを覆うシリカ膜とアルミナ膜とのうち少なくとも一方を更に備えてもよい。この場合、特に組成物(X)中に反応硬化性化合物(A)が光カチオン重合性を有する場合には、前記シェルが反応硬化性化合物(A)の光カチオン重合反応を阻害することを、シリカ膜及びアルミナ膜によって抑制できる。このため、光散乱粒子(C)が反応硬化性化合物(A)の反応性を低下させにくい。シリカ膜及びアルミナ膜の各々の厚みは、シリカ膜及びアルミナ膜が光散乱粒子(C)による光を散乱させる作用を阻害しないように、十分に小さいことが好ましい。コアシェル型粒子(C0)は、シリカ膜及びアルミナ膜の代りに、シリカ膜及びアルミナ膜と同様に光カチオン重合反応を阻害しない適宜の膜を備えてもよい。 The core-shell type particles (C0) may further include at least one of a silica film and an alumina film covering the shell. In this case, particularly when the reaction-curable compound (A) has photocationic polymerizable properties in the composition (X), the shell inhibits the photocationic polymerization reaction of the reaction-curable compound (A). It can be suppressed by a silica film and an alumina film. Therefore, the light-scattering particles (C) are unlikely to reduce the reactivity of the reaction-curable compound (A). The thickness of each of the silica film and the alumina film is preferably sufficiently small so that the silica film and the alumina film do not interfere with the action of the light scattering particles (C) to scatter light. Instead of the silica film and the alumina film, the core-shell type particles (C0) may be provided with an appropriate film that does not inhibit the photocationic polymerization reaction like the silica film and the alumina film.
 コアシェル型粒子(C0)の比重は、1.5以下であることが好ましい。この場合、組成物(X)中でコアシェル型粒子(C0)が沈降しにくい。この比重は1.3以下であることがより好ましく、1.2以下であれば更に好ましい。またこの比重は例えば0.9以上である。 The specific gravity of the core-shell type particles (C0) is preferably 1.5 or less. In this case, the core-shell type particles (C0) are less likely to settle in the composition (X). This specific gravity is more preferably 1.3 or less, and even more preferably 1.2 or less. Further, this specific gravity is, for example, 0.9 or more.
 コアシェル型粒子(C0)の平均粒径は、0.1μm以上1μm以下であることが好ましい。平均粒径が0.1nm以上であると、コアシェル型粒子(C0)は光を効果的に散乱させうる。平均粒径が1μm以下であると、コアシェル型粒子(C0)が組成物(X)中に特に分散し、そのためコアシェル型粒子(C0)が特に沈降しにくくなる。また、平均粒径が1μm以下であると、特に組成物(X)がインクジェット法で成形される場合、インクジェット装置内での組成物(X)の詰まりや付着による装置のダメージを生じにくくできる。平均粒径は0.15μm以上であればより好ましく、0.2μm以上であれば更に好ましい。また、平均粒径は0.8μm以下であればより好ましく、0.5μm以下であれば更に好ましい。なお、ここでいう平均粒径は、動的光散乱法による測定された粒度分布から算出されるメジアン径である。測定装置としては、マイクロトラック・ベル株式会社のナノトラックNanotrac Waveシリーズを用いることができる。 The average particle size of the core-shell type particles (C0) is preferably 0.1 μm or more and 1 μm or less. When the average particle size is 0.1 nm or more, the core-shell type particles (C0) can effectively scatter light. When the average particle size is 1 μm or less, the core-shell type particles (C0) are particularly dispersed in the composition (X), so that the core-shell type particles (C0) are particularly difficult to settle. Further, when the average particle size is 1 μm or less, particularly when the composition (X) is formed by an inkjet method, it is possible to prevent damage to the device due to clogging or adhesion of the composition (X) in the inkjet device. The average particle size is more preferably 0.15 μm or more, and even more preferably 0.2 μm or more. Further, the average particle size is more preferably 0.8 μm or less, and further preferably 0.5 μm or less. The average particle size referred to here is a median diameter calculated from the particle size distribution measured by the dynamic light scattering method. As the measuring device, Nanotrack Nanotrac Wave series manufactured by Microtrack Bell Co., Ltd. can be used.
 次に、第二の実施形態において用いられる光散乱粒子(C)について説明する。 Next, the light scattering particles (C) used in the second embodiment will be described.
 第二の実施形態において、光散乱粒子(C)は、上述のとおり、酸化チタン粒子(C1)と、中空粒子(C2)とを含有する。 In the second embodiment, the light scattering particles (C) contain titanium oxide particles (C1) and hollow particles (C2) as described above.
 酸化チタン粒子(C1)は高い屈折率を有し、そのため酸化チタン粒子(C1)と樹脂との界面で光が屈折又は反射しうる。そのため、酸化チタン粒子(C1)は、光を反射させうる。 The titanium oxide particles (C1) have a high refractive index, so that light can be refracted or reflected at the interface between the titanium oxide particles (C1) and the resin. Therefore, the titanium oxide particles (C1) can reflect light.
 酸化チタン粒子(C1)の平均粒径は、300nm以下であることが好ましい。この場合、光散乱粒子(C)の沈降が特に生じにくくなる。この平均粒径は、290nm以下であればより好ましく、260nm以下であれば更に好ましく、230nm以下であれば特に好ましい。酸化チタン粒子(C1)の平均粒径が50nm以上であることも好ましい。この場合、酸化チタン粒子(C1)の光散乱性能が特に発現しうる。この平均粒径は80nm以上であればより好ましく、100nm以上であれば更に好ましい。なお、酸化チタン粒子(C1)の平均粒径は、動的光散乱法による測定結果から得られる粒度分布から算出されるメディアン径である。測定装置としては、例えばマイクロトラック・ベル株式会社のナノトラックNanotrac Waveシリーズを用いることができる。 The average particle size of the titanium oxide particles (C1) is preferably 300 nm or less. In this case, sedimentation of the light-scattering particles (C) is particularly unlikely to occur. The average particle size is more preferably 290 nm or less, further preferably 260 nm or less, and particularly preferably 230 nm or less. It is also preferable that the average particle size of the titanium oxide particles (C1) is 50 nm or more. In this case, the light scattering performance of the titanium oxide particles (C1) can be particularly exhibited. The average particle size is more preferably 80 nm or more, and even more preferably 100 nm or more. The average particle size of the titanium oxide particles (C1) is a median diameter calculated from the particle size distribution obtained from the measurement results by the dynamic light scattering method. As the measuring device, for example, Nanotrack Nanotrac Wave series manufactured by Microtrack Bell Co., Ltd. can be used.
 中空粒子(C2)は、シェル部分と、シェル部分の内側の中空部分とを有する。このため、中空粒子(C2)の内部におけるシェル部分と中空部分との界面で、屈折率が不連続に変化する。このため、中空粒子(C2)は光を散乱させうる。また、中空粒子(C2)は中空部を有することで比重が小さく、そのため組成物(X)中で沈降しにくい。そのため、中空粒子(C2)は組成物(X)の保存安定性を損ないにくい。また、上述のとおり、中空粒子(C2)は酸化チタン粒子(C1)の沈降も抑制できる。 The hollow particles (C2) have a shell portion and a hollow portion inside the shell portion. Therefore, the refractive index changes discontinuously at the interface between the shell portion and the hollow portion inside the hollow particles (C2). Therefore, the hollow particles (C2) can scatter light. Further, since the hollow particles (C2) have a hollow portion, the specific gravity is small, and therefore it is difficult to settle in the composition (X). Therefore, the hollow particles (C2) do not easily impair the storage stability of the composition (X). Further, as described above, the hollow particles (C2) can also suppress the sedimentation of the titanium oxide particles (C1).
 中空粒子(C2)の比重は0.2以上1.2以下であることが好ましい。比重が1.2以下であると、中空粒子(C2)は組成物(X)中で特に沈降しにくく、そのため組成物(X)の保存安定性を特に損ないにくい。また、比重が0.2以上であると、硬化時に中空粒子(C2)が表面に浮き上がる現象が抑制され、硬化物の組成が均一化され、また、物理的強度が高くなり、かつ中空粒子(C2)の破損も少なくなる。比重は1.0以下であればより好ましく、0.8以下であれば更に好ましい。また比重は0.3以上であればより好ましく、0.4以上であれば更に好ましい。 The specific gravity of the hollow particles (C2) is preferably 0.2 or more and 1.2 or less. When the specific gravity is 1.2 or less, the hollow particles (C2) are particularly unlikely to settle in the composition (X), and therefore the storage stability of the composition (X) is not particularly impaired. Further, when the specific gravity is 0.2 or more, the phenomenon that the hollow particles (C2) float on the surface at the time of curing is suppressed, the composition of the cured product is made uniform, the physical strength is high, and the hollow particles (hollow particles (C2)). Damage to C2) is also reduced. The specific gravity is more preferably 1.0 or less, and even more preferably 0.8 or less. Further, the specific gravity is more preferably 0.3 or more, and further preferably 0.4 or more.
 中空粒子(C2)は、中空樹脂粒子(C21)と中空無機粒子(C22)とのうち、少なくとも一方を含有できる。中空樹脂粒子(C21)のシェル部分は樹脂からなり、中空無機粒子(C22)のシェル部分は無機材料からなる。 The hollow particles (C2) can contain at least one of the hollow resin particles (C21) and the hollow inorganic particles (C22). The shell portion of the hollow resin particles (C21) is made of resin, and the shell portion of the hollow inorganic particles (C22) is made of an inorganic material.
 中空粒子(C2)が中空樹脂粒子(C21)を含有する場合、中空樹脂粒子(C21)は組成物(X)の硬化物の光透過性を損ないにくい。このため、波長変換部材の光透過性が維持されうる。また、中空樹脂粒子(C21)は、組成物(X)を調製する場合の混練等の過程及び組成物(X)から硬化物を作製する過程で力が加わっても破損しにくい。中空樹脂粒子(C21)は、例えば中空アクリル樹脂粒子、及び中空スチレン樹脂粒子などからなる群から選択される少なくとも一種を含有する。 When the hollow particles (C2) contain the hollow resin particles (C21), the hollow resin particles (C21) do not easily impair the light transmittance of the cured product of the composition (X). Therefore, the light transmittance of the wavelength conversion member can be maintained. Further, the hollow resin particles (C21) are not easily damaged even if a force is applied in a process such as kneading when preparing the composition (X) and a process of producing a cured product from the composition (X). The hollow resin particles (C21) contain at least one selected from the group consisting of, for example, hollow acrylic resin particles and hollow styrene resin particles.
 中空粒子(C2)が中空無機粒子(C22)を含有する場合、中空無機粒子(C22)におけるシェル部分は、例えばシリカ、ケイ酸塩ガラス、アルミナ、アルミナシリケート、炭酸カルシウム及びチタニア(酸化チタン)などからなる群から選択される少なくとも一種を含有する。シェル部分がシリカとケイ酸塩ガラスとの少なくとも一方を含有する場合、例えば中空無機粒子(C22)が中空シリカ粒子と中空ガラス粒子とのうち少なくとも一方を含有する場合、中空無機粒子(C22)は組成物(X)の硬化物の光透過性を損ないにくい。なお、中空粒子(C2)がチタニアを含む粒子(例えば中空チタニア粒子)を含有する場合、このチタニアを含む粒子は、酸化チタン粒子(C1)には該当しない。 When the hollow particles (C2) contain hollow inorganic particles (C22), the shell portion of the hollow inorganic particles (C22) may be, for example, silica, silicate glass, alumina, alumina silicate, calcium carbonate, titania (titanium oxide) or the like. Contains at least one selected from the group consisting of. When the shell portion contains at least one of silica and silicate glass, for example, when the hollow inorganic particles (C22) contain at least one of hollow silica particles and hollow glass particles, the hollow inorganic particles (C22) The light transmittance of the cured product of the composition (X) is not easily impaired. When the hollow particles (C2) contain particles containing titania (for example, hollow titania particles), the particles containing titania do not correspond to titanium oxide particles (C1).
 中空粒子(C2)の平均粒径は、100nm以上3μm以下であることが好ましい。平均粒径が100nm以上であると、中空粒子(C2)は光を効果的に散乱させうる。平均粒径が3μm以下であると、インクジェット装置内での組成物(X)の詰まりや付着による装置のダメージを生じにくくできる。平均粒径は150nm以上であればより好ましく、1μm以上であれば更に好ましい。また、平均粒径は、800nm以下であればより好ましく、500nm以下であれば更に好ましい。なお、中空粒子(C2)の平均粒径は、動的光散乱法による測定結果から得られる粒度分布から算出されるメディアン径である。測定装置としては、例えばマイクロトラック・ベル株式会社のナノトラックNanotrac Waveシリーズを用いることができる。 The average particle size of the hollow particles (C2) is preferably 100 nm or more and 3 μm or less. When the average particle size is 100 nm or more, the hollow particles (C2) can effectively scatter light. When the average particle size is 3 μm or less, it is possible to prevent damage to the device due to clogging or adhesion of the composition (X) in the inkjet device. The average particle size is more preferably 150 nm or more, and even more preferably 1 μm or more. Further, the average particle size is more preferably 800 nm or less, and further preferably 500 nm or less. The average particle size of the hollow particles (C2) is a median diameter calculated from the particle size distribution obtained from the measurement result by the dynamic light scattering method. As the measuring device, for example, Nanotrack Nanotrac Wave series manufactured by Microtrack Bell Co., Ltd. can be used.
 中空粒子(C2)の平均粒径は、酸化チタン粒子(C1)の平均粒径の1倍以上15倍以下であることが好ましい。この場合、酸化チタン粒子(C1)の沈降が特に抑制され、組成物(X)の保存安定性がより高められる。この倍率は、1.5倍以上であればより好ましく、2.0倍以上であれば更に好ましい。またこの倍率は10倍以下であればより好ましく7倍以下であれば更に好ましい。 The average particle size of the hollow particles (C2) is preferably 1 to 15 times the average particle size of the titanium oxide particles (C1). In this case, the sedimentation of the titanium oxide particles (C1) is particularly suppressed, and the storage stability of the composition (X) is further enhanced. This magnification is more preferably 1.5 times or more, and even more preferably 2.0 times or more. Further, this magnification is more preferably 10 times or less, and further preferably 7 times or less.
 特に、中空樹脂粒子(C21)の平均粒径は、酸化チタン粒子(C1)の平均粒径の1.5倍以上であることが好ましい。この場合、酸化チタン粒子(C1)の沈降が特に抑制される。この倍率は1.8倍以上であることがより好ましく、2.0倍以上であれば更に好ましい。またこの倍率は例えば10倍以下である。 In particular, the average particle size of the hollow resin particles (C21) is preferably 1.5 times or more the average particle size of the titanium oxide particles (C1). In this case, the sedimentation of the titanium oxide particles (C1) is particularly suppressed. This magnification is more preferably 1.8 times or more, and even more preferably 2.0 times or more. Further, this magnification is, for example, 10 times or less.
 また、中空無機粒子(C22)の平均粒径は、220nm以上であることが好ましい。また、この平均粒径は酸化チタン粒子(C1)の平均粒径の2倍以上であることが好ましい。この場合、酸化チタン粒子(C1)の沈降が特に抑制される。平均粒径は300nm以上であればより好ましい。また平均粒径は例えば1000nm以下である。また、平均粒径の倍率は10倍以下であることがより好ましく、7倍以下であれば更に好ましい。 Further, the average particle size of the hollow inorganic particles (C22) is preferably 220 nm or more. Further, the average particle size is preferably twice or more the average particle size of the titanium oxide particles (C1). In this case, the sedimentation of the titanium oxide particles (C1) is particularly suppressed. It is more preferable that the average particle size is 300 nm or more. The average particle size is, for example, 1000 nm or less. Further, the magnification of the average particle size is more preferably 10 times or less, and further preferably 7 times or less.
 酸化チタン粒子(C1)と中空粒子(C2)との合計に対する中空粒子(C2)の百分比は、10体積%以上100体積%未満であることが好ましい。この百分比が10体積%以上であれば、光散乱性粒子(C)の沈降が特に生じにくい。また、この百分比が100体積%未満であれば、光散乱性粒子(C)がより効果的に光を散乱させうる。この百分比は15体積%以上であればより好ましく、30体積%以上であれば更に好ましい。またこの百分比は85体積%以下であればより好ましく、70体積%以下であれば更に好ましく、50体積%以下であればさらに望ましい。 The percentage of the hollow particles (C2) to the total of the titanium oxide particles (C1) and the hollow particles (C2) is preferably 10% by volume or more and less than 100% by volume. When this percentage is 10% by volume or more, sedimentation of the light-scattering particles (C) is particularly unlikely to occur. Further, if this percentage is less than 100% by volume, the light-scattering particles (C) can scatter light more effectively. This percentage is more preferably 15% by volume or more, and even more preferably 30% by volume or more. Further, this percentage is more preferably 85% by volume or less, further preferably 70% by volume or less, and further preferably 50% by volume or less.
 本開示の好ましい実施形態において、組成物(X)中の固形分に対する光散乱性粒子(C)の百分比は、1体積%以上30体積%以下であることが好ましい。この百分比が1体積%以上であれば、光散乱性粒子(C)がより効果的に光を散乱させうる。この百分比が30体積%以下であれば、組成物(X)のインクジェット性が良好になりうる。この百分比の下位側は、5体積%以上であればより好ましく、10体積%以上であれば更に好ましい。またこの百分比の上位側は25体積%以下であればより好ましく、20体積%以下であれば更に好ましい。百分比は18体積%以下であってもよく、さらに15体積%以下であってもよい。 In a preferred embodiment of the present disclosure, the percentage of the light-scattering particles (C) to the solid content in the composition (X) is preferably 1% by volume or more and 30% by volume or less. When this percentage is 1% by volume or more, the light-scattering particles (C) can scatter light more effectively. When this percentage is 30% by volume or less, the inkjet property of the composition (X) can be improved. The lower side of this percentage is more preferably 5% by volume or more, and even more preferably 10% by volume or more. Further, the upper side of this percentage is more preferably 25% by volume or less, and further preferably 20% by volume or less. The percentage may be 18% by volume or less, and further may be 15% by volume or less.
 特に、第一の実施形態において、組成物(X)中の固形分に対するコアシェル型粒子(C0)の百分比は、1体積%以上20体積%以下であることが好ましい。固形分とは、組成物(X)中の溶剤を除く成分である。百分比が1体積%以上であると、コアシェル型粒子(C0)がより効果的に光を散乱させうる。百分比が20体積%以下であると、特に組成物(X)をインクジェト法で成形する場合の、インクジェット性が良好になりうる。この百分比は、5体積%以上であることがより好ましく、10体積%以上であれば更に好ましい。またこの百分比は18体積%以下であればより好ましく、15体積%以下であれば更に好ましい。 In particular, in the first embodiment, the percentage of the core-shell type particles (C0) to the solid content in the composition (X) is preferably 1% by volume or more and 20% by volume or less. The solid content is a component in the composition (X) excluding the solvent. When the percentage is 1% by volume or more, the core-shell type particles (C0) can scatter light more effectively. When the percentage is 20% by volume or less, the ink jet property can be improved particularly when the composition (X) is molded by the ink jet method. This percentage is more preferably 5% by volume or more, and even more preferably 10% by volume or more. Further, this percentage is more preferably 18% by volume or less, and further preferably 15% by volume or less.
 また、特に第二の実施形態において、組成物(X)中の固形分に対する酸化チタン粒子(C1)の百分比は、1体積%以上20体積%以下であることが好ましい。この百分比が1体積%以上であれば、酸化チタン粒子(C1)がより効果的に光を散乱させうる。この百分比が20体積%以下であれば、組成物(X)のインクジェット性が良好になり、かつ光散乱粒子(C)の沈降が特に生じにくい。この百分比は、5体積%以上であればより好ましく、8体積%以上であれば更に好ましい。またこの百分比は15体積%以下であればより好ましく、12体積%以下であれば更に好ましい。 Further, particularly in the second embodiment, the percentage of the titanium oxide particles (C1) to the solid content in the composition (X) is preferably 1% by volume or more and 20% by volume or less. When this percentage is 1% by volume or more, the titanium oxide particles (C1) can scatter light more effectively. When this percentage is 20% by volume or less, the inkjet property of the composition (X) is good, and the precipitation of the light scattering particles (C) is particularly unlikely to occur. This percentage is more preferably 5% by volume or more, and even more preferably 8% by volume or more. Further, this percentage is more preferably 15% by volume or less, and further preferably 12% by volume or less.
 また組成物(X)中の固形分に対する中空粒子(C2)の百分比は、0.1体積%以上20体積%以下であることが好ましい。この百分比が0.1体積%以上であれば、光散乱粒子(C)の沈降が特に生じにくい。この百分比が20体積%以下であれば、組成物(X)のインクジェット性が良好になりうる。この百分比は、1体積%以上であればより好ましく、10質量%以上であれば更に好ましい。 Further, the percentage of the hollow particles (C2) to the solid content in the composition (X) is preferably 0.1% by volume or more and 20% by volume or less. When this percentage is 0.1% by volume or more, sedimentation of the light scattering particles (C) is particularly unlikely to occur. When this percentage is 20% by volume or less, the inkjet property of the composition (X) can be improved. This percentage is more preferably 1% by volume or more, and even more preferably 10% by mass or more.
 <分散剤(D)>
 本開示の好ましい実施形態において、組成物(X)は、分散剤(D)を含有することが好ましい。分散剤(D)は組成物(X)中での蛍光体(B)の分散性を向上できる。このため、分散剤(D)は、蛍光体(B)に起因する組成物(X)の粘度の増大と保存安定性の低下とを生じにくくすることができる。また、分散剤(D)は、組成物(X)中での光散乱性粒子(C)の分散性を高めることができる。このため、光散乱性粒子(C)が、より沈降しにくくなる。
<Dispersant (D)>
In a preferred embodiment of the present disclosure, the composition (X) preferably contains a dispersant (D). The dispersant (D) can improve the dispersibility of the fluorophore (B) in the composition (X). Therefore, the dispersant (D) can prevent the increase in viscosity of the composition (X) and the decrease in storage stability due to the fluorescent substance (B). Further, the dispersant (D) can enhance the dispersibility of the light-scattering particles (C) in the composition (X). Therefore, the light-scattering particles (C) are less likely to settle.
 特に第二の実施形態のように、光散乱性粒子(C)が酸化チタン粒子(C1)と中空粒子(C2)とを含有すると、分散剤(D)は光散乱性粒子(C)の分散性を大きく高めうる。これは、分散剤(D)が酸化チタン粒子(C1)と中空粒子(C2)との間の相互作用を高めるためであると、推察される。 In particular, when the light-scattering particles (C) contain titanium oxide particles (C1) and hollow particles (C2) as in the second embodiment, the dispersant (D) disperses the light-scattering particles (C). It can greatly enhance the sex. It is presumed that this is because the dispersant (D) enhances the interaction between the titanium oxide particles (C1) and the hollow particles (C2).
 分散剤(D)は、粒子に吸着しうる界面活性剤である。分散剤(D)は、一般に、粒子に吸着されうる吸着基(アンカーともいう)と、吸着基が粒子に吸着することでこの粒子に付着する分子骨格(テールともいう)とを、有する。分散剤(D)は、例えばテールがアクリル系の分子鎖であるアクリル系分散剤と、テールがウレタン系の分子鎖であるウレタン系分散剤と、テールがポリエステル系の分子鎖であるポリエステル系分散剤とからなら群から選択される少なくとも一種の成分を含有する。吸着基は、例えば塩基性の極性官能基と酸性の極性官能基とのうち少なくとも一方を含む。塩基性の極性官能基は、例えばアミノ基、イミノ基、アミド基、イミド基、及び含窒素複素環基からなる群から選択される少なくとも一種の基を含む。酸性の極性官能基は、例えばカルボキシル基とリン酸基とからなる群から選択される少なくとも一種の基を含む。 The dispersant (D) is a surfactant that can be adsorbed on the particles. The dispersant (D) generally has an adsorbing group (also referred to as an anchor) that can be adsorbed on the particles and a molecular skeleton (also referred to as a tail) that adheres to the particles when the adsorbing group is adsorbed on the particles. The dispersant (D) is, for example, an acrylic dispersant having an acrylic molecular chain at the tail, a urethane dispersant having a urethane molecular chain at the tail, and a polyester-based dispersion having a polyester molecular chain at the tail. It contains at least one ingredient selected from the group if it is an agent. The adsorbent group contains, for example, at least one of a basic polar functional group and an acidic polar functional group. The basic polar functional group includes, for example, at least one group selected from the group consisting of an amino group, an imino group, an amide group, an imide group, and a nitrogen-containing heterocyclic group. The acidic polar functional group includes, for example, at least one group selected from the group consisting of a carboxyl group and a phosphoric acid group.
 分散剤(D)は、ポリマーを含んでもよい。ポリマーの重量平均分子量は例えば1000以上である。ポリマーは、例えば、水酸基含有カルボン酸エステル、長鎖ポリアミノアマイドと高分子量酸エステルとの塩、高分子量ポリカルボン酸の塩、長鎖ポリアミノアマイドと極性酸エステルとの塩、高分子量不飽和酸エステル、変性ポリウレタン、変性ポリアクリレート、ポリエーテルエステル型アニオン系活性剤、ナフタレンスルホン酸ホルマリン縮合物の塩、ポリオキシエチレンアルキルリン酸エステル、ポリオキシエチレンノニルフェニルエーテル、ポリエステルポリアミン、及びステアリルアミンアセテートからなる群から選択される少なくとも一種の成分を含有する。分散剤(D)がポリマーを含有すると、光散乱性粒子(C)の分散性がより高まりうる。例えば、第二の実施形態の場合では、ポリマーの分子鎖に酸化チタン粒子(C1)が絡みやすくなることで酸化チタン粒子(C1)が更に沈降しにくくなるためであると推察される。 The dispersant (D) may contain a polymer. The weight average molecular weight of the polymer is, for example, 1000 or more. Examples of the polymer include a hydroxyl group-containing carboxylic acid ester, a salt of a long-chain polyaminoamide and a high-molecular-weight acid ester, a salt of a high-molecular-weight polycarboxylic acid, a salt of a long-chain polyaminoamide and a polar acid ester, and a high-molecular-weight unsaturated acid ester. , Modified polyurethane, modified polyacrylate, polyether ester type anionic activator, salt of naphthalene sulfonic acid formalin condensate, polyoxyethylene alkyl phosphate ester, polyoxyethylene nonylphenyl ether, polyester polyamine, and stearylamine acetate. Contains at least one ingredient selected from the group. When the dispersant (D) contains a polymer, the dispersibility of the light-scattering particles (C) can be further enhanced. For example, in the case of the second embodiment, it is presumed that the titanium oxide particles (C1) are more likely to be entangled with the molecular chain of the polymer, which makes it more difficult for the titanium oxide particles (C1) to settle.
 分散剤(D)は、一分子中に二つ以上の吸着基を有する分散剤(D1)を含有することが好ましい。この場合、分散剤(D)は、光散乱性粒子(C)をより分散させうる。例えば、第二の実施形態の場合では、分散剤(D1)の分子が2つ以上の吸着基を有することで、分散剤(D1)が酸化チタン粒子(C1)と中空粒子(C2)との相互作用を媒介しやすくなり、そのため酸化チタン粒子(C1)がより沈降しにくくなるからであると、推察される。 The dispersant (D) preferably contains a dispersant (D1) having two or more adsorbent groups in one molecule. In this case, the dispersant (D) can more disperse the light scattering particles (C). For example, in the case of the second embodiment, the dispersant (D1) has two or more adsorbing groups, so that the dispersant (D1) is composed of titanium oxide particles (C1) and hollow particles (C2). It is presumed that this is because it becomes easier to mediate the interaction, and therefore the titanium oxide particles (C1) are less likely to settle.
 分散剤(D1)は、例えば両末端型分散剤、櫛型分散剤、側鎖末端型分散剤及び超分岐型分散剤からなる群から選択される少なくとも一種を含有できる。両末端型分散剤はテールの両末端に吸着基が結合した構造を有する。櫛型分散剤は、主鎖と複数の側鎖とを有する櫛型のテールの主鎖に複数の吸着基がある構造を有する。側鎖末端型分散剤は、主鎖と複数の側鎖とを有するテールの側鎖の末端に吸着基が結合し、又は更に主鎖の一方若しくは両方の末端に吸着基が結合した構造を有する。超分岐型分散剤は、吸着基を有する核が、分岐したテールで覆われた構造を有する。 The dispersant (D1) can contain at least one selected from the group consisting of, for example, a two-terminal dispersant, a comb-type dispersant, a side chain-terminal dispersant, and a super-branched dispersant. The bi-terminal dispersant has a structure in which adsorbents are bonded to both ends of the tail. The comb-type dispersant has a structure in which a plurality of adsorbing groups are present in the main chain of a comb-shaped tail having a main chain and a plurality of side chains. The side chain terminal dispersant has a structure in which an adsorbent group is bonded to the end of the side chain of the tail having a main chain and a plurality of side chains, or an adsorbent group is further bonded to one or both ends of the main chain. .. The super-branched dispersant has a structure in which a nucleus having an adsorbent group is covered with a branched tail.
 分散剤(D1)が両末端型分散剤、櫛型分散剤、及び側鎖末端型分散剤からなる群から選択される少なくとも一種を含有すると、分散剤(D)は組成物(X)の粘度を上昇させにくい。分散剤(D)が両末端型分散剤を含有すると、分散剤(D1)は組成物(X)の粘度を特に上昇させにくい。分散剤(D1)が組成物(X)の粘度を上昇させにくければ、分散剤(D1)以外の成分の選択の自由度が高くなり、例えばやや高粘度であっても組成物(X)の機能を向上させうる成分を組成物(X)に配合し、かつ組成物(X)の粘度を低く維持することができる。 When the dispersant (D1) contains at least one selected from the group consisting of a two-terminal dispersant, a comb-type dispersant, and a side chain terminal dispersant, the dispersant (D) contains the viscosity of the composition (X). Is difficult to raise. When the dispersant (D) contains a bi-terminal dispersant, the dispersant (D1) is particularly difficult to increase the viscosity of the composition (X). If the dispersant (D1) is difficult to increase the viscosity of the composition (X), the degree of freedom in selecting components other than the dispersant (D1) is increased. A component that can improve the function can be blended into the composition (X), and the viscosity of the composition (X) can be kept low.
 分散剤(D)の粘度は50000mPa・s以下であることが好ましい。この場合、分散剤(D)は、組成物(X)の粘度を上昇させにくい。分散剤(D)の粘度は20000mPa・s以下であればより好ましく、10000mPa・s以下であれば特に好ましい。 The viscosity of the dispersant (D) is preferably 50,000 mPa · s or less. In this case, the dispersant (D) does not easily increase the viscosity of the composition (X). The viscosity of the dispersant (D) is more preferably 20,000 mPa · s or less, and particularly preferably 10,000 mPa · s or less.
 分散剤(D)の沸点は200℃以上であることが好ましい。この場合、組成物(X)から分散剤(D)が揮発しにくいことから、組成物(X)の保存安定性が更に向上する。 The boiling point of the dispersant (D) is preferably 200 ° C. or higher. In this case, since the dispersant (D) is less likely to volatilize from the composition (X), the storage stability of the composition (X) is further improved.
 分散剤(D)の重量平均分子量は200000以下であることが好ましい。この場合、分散剤(D)が低い粘度を有しうる。重量平均分子量は100000以下であることがより好ましく、50000以下であれば更に好ましい。なお、本明細書において、重量平均分子量は、ゲル浸透クロマトグラフィーによる測定結果から得られる、ポリスチレン換算の相対重量平均分子量である。 The weight average molecular weight of the dispersant (D) is preferably 200,000 or less. In this case, the dispersant (D) may have a low viscosity. The weight average molecular weight is more preferably 100,000 or less, and even more preferably 50,000 or less. In the present specification, the weight average molecular weight is a polystyrene-equivalent relative weight average molecular weight obtained from the measurement result by gel permeation chromatography.
 分散剤(D)の市販品としては、例えば日本ルーブルリゾール株式会社製のソルスパースシリーズ、ビックケミー・ジャパン株式会社製のDISPERBYKシリーズ、味の素ファインテクノ株式会社製のアジスパーシリーズなどが使用可能である。 As a commercially available product of the dispersant (D), for example, the Solsperth series manufactured by Nippon Louvre Resol Co., Ltd., the DISPERBYK series manufactured by Big Chemie Japan Co., Ltd., the Ajinomoto Fine Techno Co., Ltd. Azispar series, and the like can be used.
 より具体的に、分散剤(D)として一分子中に二つ以上の吸着基を有する分散剤(D1)を用いる場合には、以下のようなものが例示される。 More specifically, when a dispersant (D1) having two or more adsorbent groups in one molecule is used as the dispersant (D), the following are exemplified.
 分散剤(D1)が両末端型分散剤を含有する場合、両末端型分散剤として、例えばルーブリゾール社製の品番SOLSPERSE41000(吸着基としてリン酸基を有する両末端型分散剤、酸価50mgKOH/g、アミン価0mgKOH/g、粘度1500mP・s、沸点200℃以上)、ルーブリゾール社製の品番SOLSPERSE45000(吸着基としてリン酸基を有する両末端型分散剤、酸価235mgKOH/g、アミン価0mgKOH/g、粘度1500mP・s、沸点200℃以上)などが使用できる。 When the dispersant (D1) contains a two-terminal dispersant, the dispersant may be, for example, a part number SOLSPERSE41000 manufactured by Lubrizol (a two-terminal dispersant having a phosphoric acid group as an adsorbent, acid value 50 mgKOH /). g, amine value 0 mgKOH / g, viscosity 1500 mP · s, boiling point 200 ° C or higher), product number SOLSERSE45000 manufactured by Lubrizol (biterminal dispersant having a phosphoric acid group as an adsorbent, acid value 235 mgKOH / g, amine value 0 mgKOH) / G, viscosity 1500 mP · s, boiling point 200 ° C or higher) and the like can be used.
 分散剤(D1)が櫛型分散剤を含有する場合、櫛型分散剤として、例えばルーブリゾール社製の品番SOLSPERSE32000(吸着基としてアミノ基を有する櫛型分散剤、酸価15mgKOH/g、アミン価31mgKOH/g、粘度14000mP・s、沸点200℃以上)、ルーブリゾール社製の品番SOLSPERSE36000(吸着基としてリン酸基を有する櫛型分散剤、酸価15mgKOH/g、アミン価0mgKOH/g、粘度15000mP・s、沸点200℃以上)などが使用できる。 When the dispersant (D1) contains a comb-type dispersant, as the comb-type dispersant, for example, product number SOLSERSE32000 manufactured by Lubrizol (comb-type dispersant having an amino group as an adsorbent, acid value 15 mgKOH / g, amine value). 31 mgKOH / g, viscosity 14000 mP · s, boiling point 200 ° C or higher), product number SOLSERSE36000 (comb-type dispersant having a phosphate group as an adsorbent, acid value 15 mgKOH / g, amine value 0 mgKOH / g, viscosity 15000 mP) -S, boiling point 200 ° C or higher) can be used.
 分散剤(D1)が側鎖末端型分散剤を含有する場合、側鎖末端型分散剤としては、例えば綜研化学社製の品名アクトフローCBB3098(吸着基としてカルボキシル基を有する側鎖末端型分散剤、酸価98mgKOH/g、アミン価0mgKOH/g、粘度9000mPa・s、沸点200℃以上)、綜研化学社製の品名アクトフローCB3060(吸着基としてカルボキシル基を有する側鎖末端型分散剤、酸価60mgKOH/g、アミン価0mgKOH/g、粘度1200mPa・s、沸点200℃以上)などが使用できる。 When the dispersant (D1) contains a side chain terminal dispersant, the side chain terminal dispersant may be, for example, Actflow CBB3098 (side chain terminal dispersant having a carboxyl group as an adsorbing group) manufactured by Soken Kagaku Co., Ltd. , Acid value 98 mgKOH / g, amine value 0 mgKOH / g, viscosity 9000 mPa · s, boiling point 200 ° C or higher), product name Actflow CB3060 manufactured by Soken Kagaku Co., Ltd. 60 mgKOH / g, amine value 0 mgKOH / g, viscosity 1200 mPa · s, boiling point 200 ° C. or higher) and the like can be used.
 分散剤(D1)が超分岐型分散剤を含有する場合、超分岐型分散剤としては、例えばビックケミー社製の品番DISPERBYK-2152(吸着基として保護基で保護されたリン酸基を有する超分岐型分散剤、酸価0mgKOH/g、アミン価0mgKOH/g、粘度20000mPa・s、沸点200℃以上)などが使用できる。なお、DISPERBYK-2152においては、リン酸基は保護基で保護されているため、酸価は測定されない。 When the dispersant (D1) contains a super-branched dispersant, the super-branched dispersant may be, for example, a product number DISPERBYK-2152 manufactured by Big Chemie Co., Ltd. (super-branched having a phosphoric acid group protected by a protecting group as an adsorbing group). A type dispersant, acid value 0 mgKOH / g, amine value 0 mgKOH / g, viscosity 20000 mPa · s, boiling point 200 ° C. or higher) and the like can be used. In DISPERBYK-2152, the acid value is not measured because the phosphoric acid group is protected by a protecting group.
 組成物(X)における分散剤(D)の量は、蛍光体(B)ならびに光散乱性粒子(C)の分散性を向上させるという目的に応じて設定できる。 The amount of the dispersant (D) in the composition (X) can be set according to the purpose of improving the dispersibility of the phosphor (B) and the light scattering particles (C).
 例えば、蛍光体(B)の分散性を向上させる場合、蛍光体(B)100質量部に対する分散剤(D)の量は、5質量部以上60質量部以下であることが好ましい。分散剤(D)の量が5質量部以上であることで分散剤(D)の機能が効果的に発現でき、また60質量部以下であることでカラーレジスト1中の分散剤(D)の遊離の分子がカラーレジスト1と無機材料製の部材との間の密着性を阻害することを抑制できる。また、分散剤(D)の量は15質量部以上であればより好ましく、50質量部以下であることもより好ましく、40質量部以下であればより更に好ましく、30質量部以下であれば特に好ましい。なお、蛍光体(B)に分散性向上のための表面処理が施されている場合などには、組成物(X)が分散剤(D)を含有しなくても、蛍光体(B)が良好に分散しうることがある。 For example, when improving the dispersibility of the fluorescent substance (B), the amount of the dispersant (D) with respect to 100 parts by mass of the fluorescent substance (B) is preferably 5 parts by mass or more and 60 parts by mass or less. When the amount of the dispersant (D) is 5 parts by mass or more, the function of the dispersant (D) can be effectively exhibited, and when the amount is 60 parts by mass or less, the dispersant (D) in the color resist 1 can be effectively exhibited. It is possible to prevent free molecules from inhibiting the adhesion between the color resist 1 and the member made of the inorganic material. Further, the amount of the dispersant (D) is more preferably 15 parts by mass or more, more preferably 50 parts by mass or less, further preferably 40 parts by mass or less, and particularly preferably 30 parts by mass or less. preferable. When the fluorescent substance (B) is subjected to a surface treatment for improving the dispersibility, the fluorescent substance (B) can be used even if the composition (X) does not contain the dispersant (D). May be well dispersed.
 光散乱性粒子(C)の分散性を向上させる場合、光散乱性粒子(C)に対する分散剤(D)の量(百分比)は、1質量%以上60質量%以下であることが好ましい。この百分比が1質量%以上であれば、光散乱性粒子(C)の分散性が特に高まりうる。この百分比が60質量%以下であれば、未吸着の分散剤が樹脂中に存在しなくなり、光による変色が生じにくいという利点がある。この百分比は、3質量%以上であればより好ましく、7質量%以上であれば更に好ましい。またこの百分比は、40質量%以下であればより好ましく、30質量%以下であれば更に好ましい。 When improving the dispersibility of the light-scattering particles (C), the amount (percentage) of the dispersant (D) with respect to the light-scattering particles (C) is preferably 1% by mass or more and 60% by mass or less. When this percentage is 1% by mass or more, the dispersibility of the light-scattering particles (C) can be particularly enhanced. When this percentage is 60% by mass or less, there is an advantage that the unadsorbed dispersant does not exist in the resin and discoloration due to light is unlikely to occur. This percentage is more preferably 3% by mass or more, and further preferably 7% by mass or more. Further, this percentage is more preferably 40% by mass or less, and further preferably 30% by mass or less.
 <その他の成分>
 本開示の好ましい実施形態では、組成物(X)は溶剤を含有せず、又は溶剤の含有量が1質量%以下であることが好ましい。このため、組成物(X)及び硬化物からアウトガスが生じにくい。また、組成物(X)の保存安定性が更に高くなる。
<Other ingredients>
In a preferred embodiment of the present disclosure, it is preferable that the composition (X) does not contain a solvent, or the content of the solvent is 1% by mass or less. Therefore, outgas is less likely to be generated from the composition (X) and the cured product. In addition, the storage stability of the composition (X) is further enhanced.
 組成物(X)は吸湿剤(F)を更に含有してもよい。組成物(X)が吸湿剤(F)を含有すると、組成物(X)の硬化物及びカラーレジスト1が水分に曝されても、吸湿剤(F)が水分を吸収することで、硬化物及びカラーレジスト1中の量子ドット蛍光体(B1)が劣化しにくくなる。吸湿剤(F)の平均粒径は200nm以下であることが好ましい。この場合、硬化物は高い透明性を有することができる。 The composition (X) may further contain a hygroscopic agent (F). When the composition (X) contains the hygroscopic agent (F), even if the cured product of the composition (X) and the color resist 1 are exposed to moisture, the hygroscopic agent (F) absorbs the moisture, so that the cured product And the quantum dot phosphor (B1) in the color resist 1 is less likely to deteriorate. The average particle size of the hygroscopic agent (F) is preferably 200 nm or less. In this case, the cured product can have high transparency.
 吸湿剤(F)は、吸湿性を有する無機粒子であることが好ましく、例えばゼオライト粒子、シリカゲル粒子、塩化カルシウム粒子、及び酸化チタンナノチューブ粒子からなる群から選択される少なくとも一種の成分を含有することが好ましい。なお、吸湿剤(F)が含有しうる成分は前記には限られない。吸湿剤(F)がゼオライト粒子を含有することが特に好ましい。 The hygroscopic agent (F) is preferably an inorganic particle having hygroscopicity, and contains at least one component selected from the group consisting of, for example, zeolite particles, silica gel particles, calcium chloride particles, and titanium oxide nanotube particles. Is preferable. The components that can be contained in the hygroscopic agent (F) are not limited to the above. It is particularly preferable that the hygroscopic agent (F) contains zeolite particles.
 平均粒径200nm以下のゼオライト粒子は、例えば一般的な工業用ゼオライトを粉砕することで製造できる。ゼオライト粒子を製造するに当たって、ゼオライトを粉砕してから水熱合成などによって結晶化させてもよく、この場合、ゼオライト粒子は特に高い吸湿性を有することができる。このようなゼオライト粒子の製造方法の例は、特開2016-69266号公報、特開2013-049602号公報などに開示されている。 Zeolite particles with an average particle size of 200 nm or less can be produced, for example, by pulverizing general industrial zeolite. In producing the zeolite particles, the zeolite may be crushed and then crystallized by hydrothermal synthesis or the like. In this case, the zeolite particles can have particularly high hygroscopicity. Examples of such a method for producing zeolite particles are disclosed in JP-A-2016-69266A, JP-A-2013-049602, and the like.
 ゼオライト粒子はナトリウムイオンを含有することが好ましく、そのためゼオライト粒子はナトリウムイオンを含有するゼオライトを原料として作製されることが好ましい。ナトリウムイオンを含有するゼオライトのうちA型ゼオライト、X型ゼオライト及びY型ゼオライトからなる群から選択される少なくとも一種を原料とすることがより好ましい。ゼオライト粒子が、A型ゼオライトのうち4A型ゼオライトを原料として作製されることが特に好ましい。これらの場合、ゼオライト粒子は、水分の吸着に好適な結晶構造を有する。 Zeolite particles preferably contain sodium ions, and therefore zeolite particles are preferably produced using zeolite containing sodium ions as a raw material. It is more preferable to use at least one selected from the group consisting of A-type zeolite, X-type zeolite and Y-type zeolite as a raw material among zeolites containing sodium ions. It is particularly preferable that the zeolite particles are produced using 4A-type zeolite as a raw material among A-type zeolites. In these cases, the zeolite particles have a crystal structure suitable for adsorbing water.
 吸湿剤(F)の平均粒径は、10nm以上200nm以下であることが好ましい。この平均粒径が200nm以下であれば、硬化物は特に高い透明性を有することができる。また、この平均粒径が10nm以上であれば、吸湿剤(F)の良好な吸湿性を維持できる。なお、この平均粒径は、動的光散乱法による測定結果から算出されるメディアン径、すなわち累積50%径(D50)である。なお、測定装置としては、マイクロトラック・ベル株式会社のナノトラックNanotrac Waveシリーズを用いることができる。 The average particle size of the hygroscopic agent (F) is preferably 10 nm or more and 200 nm or less. When the average particle size is 200 nm or less, the cured product can have particularly high transparency. Further, when the average particle size is 10 nm or more, good hygroscopicity of the hygroscopic agent (F) can be maintained. The average particle size is the median diameter calculated from the measurement result by the dynamic light scattering method, that is, the cumulative 50% diameter (D50). As the measuring device, Nanotrack Nanotrac Wave series manufactured by Microtrack Bell Co., Ltd. can be used.
 吸湿剤(F)の平均粒径は、150nm以下であることがより好ましく、100nm以下であれば更に好ましく、70nm以下であれば特に好ましい。また、吸湿剤(F)の平均粒径が20nm以上であることが好ましく、50nm以上であればより好ましい。この場合、硬化物は、特に良好な透明性と吸湿性とを有することができる。 The average particle size of the hygroscopic agent (F) is more preferably 150 nm or less, further preferably 100 nm or less, and particularly preferably 70 nm or less. Further, the average particle size of the hygroscopic agent (F) is preferably 20 nm or more, and more preferably 50 nm or more. In this case, the cured product can have particularly good transparency and hygroscopicity.
 吸湿剤(F)の累積90%径(D90)が300nm以下であることが好ましく、100nm以下であれば更に好ましい。この場合、硬化物は特に高い透明性を有することができる。 The cumulative 90% diameter (D90) of the hygroscopic agent (F) is preferably 300 nm or less, and more preferably 100 nm or less. In this case, the cured product can have particularly high transparency.
 組成物(X)が吸湿剤(F)を含有する場合、組成物(X)の全量に対する吸湿剤(F)の割合は、1質量%以上20質量%以下であることが好ましい。吸湿剤(F)の割合が1質量%以上であれば硬化物は特に高い吸湿性を有することができる。また、吸湿剤(F)の割合が20質量%以下であれば組成物(X)の粘度を特に低減でき、組成物(X)がインクジェット法で塗布可能な程度の十分な低粘度を有することもできる。吸湿剤(F)の割合は、3質量%以上であれば更に好ましく、5質量%以上であれば特に好ましい。また、吸湿剤(F)の割合は、15質量%以下であればより好ましく、13質量%以下であれば特に好ましい。 When the composition (X) contains the hygroscopic agent (F), the ratio of the hygroscopic agent (F) to the total amount of the composition (X) is preferably 1% by mass or more and 20% by mass or less. When the ratio of the hygroscopic agent (F) is 1% by mass or more, the cured product can have particularly high hygroscopicity. Further, if the proportion of the hygroscopic agent (F) is 20% by mass or less, the viscosity of the composition (X) can be particularly reduced, and the composition (X) has a sufficiently low viscosity that can be applied by an inkjet method. You can also. The proportion of the hygroscopic agent (F) is more preferably 3% by mass or more, and particularly preferably 5% by mass or more. The proportion of the hygroscopic agent (F) is more preferably 15% by mass or less, and particularly preferably 13% by mass or less.
 上述の成分を混合することで、組成物(X)を調製できる。組成物(X)は25℃で液状であることが好ましい。 The composition (X) can be prepared by mixing the above-mentioned components. The composition (X) is preferably liquid at 25 ° C.
 組成物(X)から作製されるカラーレジスト1、カラーレジスト1を備えるカラーフィルタ2、及びカラーフィルタ2を備える発光装置11について、説明する。 The color resist 1 produced from the composition (X), the color filter 2 including the color resist 1, and the light emitting device 11 including the color filter 2 will be described.
 カラーフィルタ2は、例えば支持基板4、支持基板4上に支持されたカラーレジスト1、及びカラーレジスト1を覆う保護層5を備える(図1A及び図1B参照)。 The color filter 2 includes, for example, a support substrate 4, a color resist 1 supported on the support substrate 4, and a protective layer 5 covering the color resist 1 (see FIGS. 1A and 1B).
 組成物(X)をインクジェット法で成形してから、組成物(X)に紫外線を照射して硬化することで、カラーレジスト1を作製できる。 The color resist 1 can be produced by molding the composition (X) by an inkjet method and then irradiating the composition (X) with ultraviolet rays to cure it.
 組成物(X)をインクジェット法で成形するに当たっては、組成物(X)が常温で十分に低い粘度を有する場合、例えば25℃における粘度が30mPa・s以下、特に15mPa・s以下である場合には、組成物(X)を加熱せずにインクジェット法で塗布することで成形できる。 In molding the composition (X) by an inkjet method, when the composition (X) has a sufficiently low viscosity at room temperature, for example, when the viscosity at 25 ° C. is 30 mPa · s or less, particularly 15 mPa · s or less. Can be molded by applying the composition (X) by an inkjet method without heating.
 組成物(X)が加熱されることで低粘度化する性質を有する場合、組成物(X)を加熱してから組成物(X)をインクジェット法で塗布して成形してもよい。組成物(X)の40℃における粘度が30mPa・s以下、特に15mPa・s以下である場合、組成物(X)を僅かに加熱しただけで低粘度化させることができ、この低粘度化した組成物(X)をインクジェット法で吐出することができる。組成物(X)の加熱温度は、例えば20℃以上50℃以下である。 When the composition (X) has a property of lowering the viscosity by heating, the composition (X) may be heated and then the composition (X) may be applied and molded by an inkjet method. When the viscosity of the composition (X) at 40 ° C. is 30 mPa · s or less, particularly 15 mPa · s or less, the viscosity of the composition (X) can be reduced by slightly heating, and the viscosity is reduced. The composition (X) can be ejected by an inkjet method. The heating temperature of the composition (X) is, for example, 20 ° C. or higher and 50 ° C. or lower.
 また、組成物(X)を硬化させる際、組成物(X)中の蛍光体(B)が紫外線を吸収する場合には、蛍光体(B)が紫外線を吸収することによる反応効率の低下が生じ難いように、組成物(X)へ照射する紫外線の波長を選択することが好ましい。例えばCdSe/ZnSコアシェル型半導体粒子からなる緑色量子ドット蛍光体が使用される場合は、組成物(X)へ照射する紫外線の波長が395nm以上であることが好ましい。 Further, when the fluorescent substance (B) in the composition (X) absorbs ultraviolet rays when the composition (X) is cured, the reaction efficiency is lowered due to the fluorescent substance (B) absorbing the ultraviolet rays. It is preferable to select the wavelength of the ultraviolet rays to irradiate the composition (X) so that it is unlikely to occur. For example, when a green quantum dot phosphor composed of CdSe / ZnS core-shell type semiconductor particles is used, it is preferable that the wavelength of ultraviolet rays irradiating the composition (X) is 395 nm or more.
 より具体的には、例えばまず、透明な支持基板4を準備する。支持基板4は、例えば透明な樹脂又はガラスから作製される。この支持基板4の一面上に隔壁3を作製する。隔壁3は、例えばポリイミド樹脂から作製される。これにより、支持基板4の上に、隔壁3で仕切られた複数の凹所14が形成される。次に、凹所14内に組成物(X)をインクジェット法で吐出する。続いて、凹所14内の組成物(X)に紫外線を照射することで硬化させて、カラーレジスト1を作製する。 More specifically, for example, first, a transparent support substrate 4 is prepared. The support substrate 4 is made of, for example, a transparent resin or glass. A partition wall 3 is formed on one surface of the support substrate 4. The partition wall 3 is made of, for example, a polyimide resin. As a result, a plurality of recesses 14 partitioned by the partition wall 3 are formed on the support substrate 4. Next, the composition (X) is ejected into the recess 14 by an inkjet method. Subsequently, the composition (X) in the recess 14 is cured by irradiating it with ultraviolet rays to prepare a color resist 1.
 次に、カラーレジスト1を覆うように保護層5を作製する。保護層5は、例えば樹脂から作製された層(樹脂層という)を含む。保護層5は、無機質材料から作製された層(無機質層という)を含んでもよい。無機質層は、例えば窒化ケイ素又は酸化ケイ素から作製される。保護層5は、樹脂層と無機質層とのうちいずれか一方を含んでもよく、両方を含んでもよい。保護層5が樹脂層と無機質層とを両方含む場合、保護層5は複数の樹脂層を含んでもよく、複数の無機質層を含んでもよい。保護層5が樹脂層と無機質層とを含む場合、保護層5内では、隣り合う樹脂層と無機質層とは、カラーレジスト1と保護層5とが並ぶ方向に並んでいる。例えば保護層5は、二つの無機質層と一つの樹脂層とを含み、無機質層、樹脂層及び無機質層が、この順に並んでいてもよい。保護層5が、一つの無機質層と二つの樹脂層とを含み、樹脂層、無機質層及び樹脂層が、この順に並んでいてもよい。保護層5の厚みは、例えば0.1μm以上2μm以下である。 Next, the protective layer 5 is prepared so as to cover the color resist 1. The protective layer 5 includes, for example, a layer made of a resin (referred to as a resin layer). The protective layer 5 may include a layer made of an inorganic material (referred to as an inorganic layer). The inorganic layer is made from, for example, silicon nitride or silicon oxide. The protective layer 5 may include either one of the resin layer and the inorganic layer, or may contain both. When the protective layer 5 includes both a resin layer and an inorganic layer, the protective layer 5 may include a plurality of resin layers or may include a plurality of inorganic layers. When the protective layer 5 includes a resin layer and an inorganic layer, in the protective layer 5, the adjacent resin layer and the inorganic layer are arranged in a direction in which the color resist 1 and the protective layer 5 are arranged side by side. For example, the protective layer 5 includes two inorganic layers and one resin layer, and the inorganic layer, the resin layer, and the inorganic layer may be arranged in this order. The protective layer 5 may include one inorganic layer and two resin layers, and the resin layer, the inorganic layer, and the resin layer may be arranged in this order. The thickness of the protective layer 5 is, for example, 0.1 μm or more and 2 μm or less.
 保護層5が無機質層を含む場合、無機質層は、例えばプラズマCVD法といった蒸着法で作製できる。この場合、カラーレジスト1は真空下又は減圧下に曝されるが、上記のとおり、本実施形態では真空下又は減圧下でカラーレジスト1からアウトガスを発生しにくくできる。このため、カラーフィルタ2の製造工程においてカラーレジスト1が真空下又は減圧下に曝されても、カラーフィルタ2にアウトガスによる空隙が生じにくくできる。 When the protective layer 5 contains an inorganic layer, the inorganic layer can be produced by a vapor deposition method such as a plasma CVD method. In this case, the color resist 1 is exposed to vacuum or reduced pressure, but as described above, in the present embodiment, outgas can be less likely to be generated from the color resist 1 under vacuum or reduced pressure. Therefore, even if the color resist 1 is exposed to vacuum or reduced pressure in the manufacturing process of the color filter 2, voids due to outgas can be less likely to occur in the color filter 2.
 組成物(X)からカラーレジスト1を作製する工程は、組成物(X)を成形してから硬化させるまでの間に、組成物(X)を乾燥させる乾燥工程を含まないことが好ましい。組成物(X)を乾燥させる乾燥工程とは、組成物(X)中の溶剤の少なくとも一部を除去することである。この場合、組成物(X)を乾燥させることが不要であることで、カラーレジスト1を作製する効率を高めることができる。特に組成物(X)が溶剤を含有せず、又は溶剤の含有量が1質量%以下であれば、組成物(X)を乾燥させなくても、カラーレジスト1からアウトガスを発生しにくくできる。 It is preferable that the step of producing the color resist 1 from the composition (X) does not include a drying step of drying the composition (X) between molding the composition (X) and curing it. The drying step of drying the composition (X) is to remove at least a part of the solvent in the composition (X). In this case, since it is not necessary to dry the composition (X), the efficiency of producing the color resist 1 can be improved. In particular, when the composition (X) does not contain a solvent or the content of the solvent is 1% by mass or less, outgas can be less likely to be generated from the color resist 1 without drying the composition (X).
 組成物(X)が1質量%以下の溶剤を含有する場合、必要により、組成物(X)からカラーレジスト1を作製する工程が、組成物(X)を乾燥させる乾燥工程を含んでもよい。この場合、特に組成物(X)の溶剤の含有量が1質量%以下であれば、組成物(X)を乾燥させる場合の、組成物(X)の加熱温度の低減化と加熱時間の短縮化の少なくとも一方を実現しうる。例えば加熱温度を120℃以下にすることができ、100℃未満にすることもでき、50℃未満にすることもできる。組成物(X)を乾燥させると、カラーレジスト1からアウトガスを更に発生しにくくできる。 When the composition (X) contains 1% by mass or less of a solvent, the step of producing the color resist 1 from the composition (X) may include a drying step of drying the composition (X), if necessary. In this case, particularly when the solvent content of the composition (X) is 1% by mass or less, the heating temperature of the composition (X) is reduced and the heating time is shortened when the composition (X) is dried. At least one of the transformations can be achieved. For example, the heating temperature can be 120 ° C. or lower, less than 100 ° C., or less than 50 ° C. When the composition (X) is dried, outgas can be further reduced from the color resist 1.
 カラーフィルタ2の製造方法が、カラーレジスト1を作製することと保護層5を作製することとを含む場合、この製造方法は、組成物(X)からカラーレジスト1を作製してから保護層5を作製するまでの間、カラーレジスト1を乾燥させる乾燥工程を含まないことが好ましい。この場合、カラーレジスト1を乾燥させることが不要であることで、カラーフィルタ2の製造効率を高めることができる。また、本実施形態では組成物(X)が溶剤を含有せず、又は溶剤の含有量が1質量%以下であるため、カラーレジスト1を乾燥させなくても、カラーレジスト1からアウトガスを発生しにくくできる。 When the manufacturing method of the color filter 2 includes manufacturing the color resist 1 and manufacturing the protective layer 5, this manufacturing method prepares the color resist 1 from the composition (X) and then prepares the protective layer 5. It is preferable not to include a drying step of drying the color resist 1 until the color resist 1 is produced. In this case, since it is not necessary to dry the color resist 1, the manufacturing efficiency of the color filter 2 can be improved. Further, in the present embodiment, since the composition (X) does not contain a solvent or the content of the solvent is 1% by mass or less, outgas is generated from the color resist 1 even if the color resist 1 is not dried. It can be difficult.
 組成物(X)が1質量%以下の溶剤を含有する場合、必要により、カラーフィルタ2の製造方法が、組成物(X)からカラーレジスト1を作製してから保護層5を作製するまでの間、カラーレジスト1を乾燥させる乾燥工程を含んでもよい。この場合、組成物(X)の溶剤の含有量が1質量%以下であることで、カラーレジスト1を乾燥させる場合の、カラーレジスト1の加熱温度の低減化と加熱時間の短縮化の少なくとも一方を実現しうる。例えば加熱温度を120℃以下にすることができ、100℃未満にすることもでき、50℃未満にすることもできる。カラーレジスト1を乾燥させると、カラーレジスト1からアウトガスを更に発生しにくくできる。 When the composition (X) contains 1% by mass or less of a solvent, if necessary, the method for producing the color filter 2 is from the production of the color resist 1 from the composition (X) to the production of the protective layer 5. In the meantime, a drying step of drying the color resist 1 may be included. In this case, when the solvent content of the composition (X) is 1% by mass or less, at least one of the reduction of the heating temperature and the shortening of the heating time of the color resist 1 when the color resist 1 is dried. Can be realized. For example, the heating temperature can be 120 ° C. or lower, less than 100 ° C., or less than 50 ° C. When the color resist 1 is dried, it is possible to further reduce the generation of outgas from the color resist 1.
 カラーフィルタ2の製造方法が、組成物(X)を成形してから保護層5を作製するまでの間、組成物(X)を乾燥させる乾燥工程及びカラーレジスト1を乾燥させる乾燥工程をいずれも含まないことが、特に好ましい。ただし、組成物(X)が1質量%以下の溶剤を含有する場合、必要により、カラーフィルタ2の製造方法が、組成物(X)とカラーレジスト1とのうち少なくとも一方を乾燥させる乾燥工程を含んでもよい。この場合も、上述のとおり、乾燥のための加熱温度の低減化と加熱時間の短縮化の少なくとも一方を実現しうる。 The method for producing the color filter 2 includes both a drying step of drying the composition (X) and a drying step of drying the color resist 1 from the molding of the composition (X) to the production of the protective layer 5. It is particularly preferable not to include it. However, when the composition (X) contains 1% by mass or less of a solvent, if necessary, the method for producing the color filter 2 includes a drying step of drying at least one of the composition (X) and the color resist 1. It may be included. Also in this case, as described above, at least one of reduction of the heating temperature for drying and shortening of the heating time can be realized.
 組成物(X)を乾燥させる乾燥工程は組成物(X)を減圧雰囲気下又は真空下で加熱することを含んでもよい。カラーレジスト1を乾燥させる乾燥工程はカラーレジスト1を減圧雰囲気下又は真空下で加熱することを含んでもよい。これらの場合も、例えば加熱温度を120℃以下にすることができ、100℃未満にすることもでき、50℃未満にすることもできる。 The drying step of drying the composition (X) may include heating the composition (X) under a reduced pressure atmosphere or a vacuum. The drying step of drying the color resist 1 may include heating the color resist 1 under a reduced pressure atmosphere or a vacuum. Also in these cases, for example, the heating temperature can be 120 ° C. or lower, less than 100 ° C., or less than 50 ° C.
 なお、カラーレジスト1を作製した後に、カラーレジスト1を乾燥させる以外の目的でカラーレジストを加熱することは、カラーレジスト1を乾燥させる乾燥工程には含まれない。例えば、カラーレジスト1の上に上述の無機質層をプラズマCVD法といった蒸着法で作製するために、カラーレジスト1がチャンバー内で真空下又は減圧下で加熱されることは、乾燥工程には含まれない。 It should be noted that heating the color resist for a purpose other than drying the color resist 1 after producing the color resist 1 is not included in the drying step of drying the color resist 1. For example, in order to form the above-mentioned inorganic layer on the color resist 1 by a vapor deposition method such as a plasma CVD method, heating the color resist 1 in a chamber under vacuum or reduced pressure is included in the drying step. not.
 次に、カラーフィルタ2を備える発光装置11について説明する。発光装置11は、例えばカラーレジスト1を備えるカラーフィルタ2と、カラーフィルタ2へ光を照射する光源とを備える。発光装置11は、光によって映像等の情報を可視表示する表示装置(ディスプレイ)であってもよい。 Next, the light emitting device 11 provided with the color filter 2 will be described. The light emitting device 11 includes, for example, a color filter 2 including a color resist 1 and a light source for irradiating the color filter 2 with light. The light emitting device 11 may be a display device (display) that visually displays information such as an image by light.
 図1Aに示す発光装置11は、表示装置であり、より具体的には液晶表示装置12である。液晶表示装置12は、光源を含むバックライトユニット7、液晶パネル6、及びカラーフィルタ2を備え、これらはこの順番に積層している。バックライトユニット7における光源は、例えば冷陰極管又は発光ダイオードである。 The light emitting device 11 shown in FIG. 1A is a display device, and more specifically, a liquid crystal display device 12. The liquid crystal display device 12 includes a backlight unit 7 including a light source, a liquid crystal panel 6, and a color filter 2, which are laminated in this order. The light source in the backlight unit 7 is, for example, a cold cathode fluorescent lamp or a light emitting diode.
 この液晶表示装置12におけるカラーフィルタ2のカラーレジスト1は、例えば赤色の蛍光を発するカラーレジスト1r(以下、赤色カラーレジスト1rともいう)と、緑色の蛍光を発するカラーレジスト1g(以下、緑色カラーレジスト1gともいう)と、蛍光を発しないレジスト1b(以下、透明レジスト1bともいう)とを含む。この場合、光源が青色光を発するならば、三原色を利用したフルカラー表示が可能である。赤色カラーレジスト1r及びこれを作製するための組成物(X)は、赤色の蛍光を発する量子ドット蛍光体(B1)を含有する。緑色カラーレジスト1g及びこれを作製するための組成物(X)は、緑色の蛍光を発する量子ドット蛍光体(B1)を含有する。透明レジスト1bを作製するための組成物は、透明な硬化物を作製できればよいが、例えば組成物(X)から蛍光体(B)を除いた組成を有する。 The color resist 1 of the color filter 2 in the liquid crystal display device 12 is, for example, a color resist 1r that emits red fluorescence (hereinafter, also referred to as red color resist 1r) and a color resist 1 g that emits green fluorescence (hereinafter, green color resist). 1 g) and a resist 1b that does not emit fluorescence (hereinafter, also referred to as a transparent resist 1b). In this case, if the light source emits blue light, full-color display using the three primary colors is possible. The red color resist 1r and the composition (X) for producing the red color resist 1r contain a quantum dot phosphor (B1) that emits red fluorescence. 1 g of the green color resist and the composition (X) for producing the green color resist contain a quantum dot phosphor (B1) that emits green fluorescence. The composition for producing the transparent resist 1b may be a transparent cured product, but has, for example, a composition obtained by removing the phosphor (B) from the composition (X).
 なお、カラーフィルタ2におけるカラーレジスト1の発する蛍光の色、及び量子ドット蛍光体(B1)の発する蛍光の色は、前記には限られない。例えば、光源が白色光を発する場合、カラーレジスト1は、透明レジスト1bに代えて、青色の蛍光を発するカラーレジスト(以下、青色カラーレジストともいう)を含んでもよい。青色カラーレジスト及びこれを作製するための組成物(X)は、青色の蛍光を発する量子ドット蛍光体(B1)を含有する。この場合も、三原色を利用したフルカラー表示が可能である。 The fluorescent color emitted by the color resist 1 and the fluorescent color emitted by the quantum dot phosphor (B1) in the color filter 2 are not limited to the above. For example, when the light source emits white light, the color resist 1 may include a color resist that emits blue fluorescence (hereinafter, also referred to as a blue color resist) instead of the transparent resist 1b. The blue color resist and the composition (X) for producing the blue color resist contain a quantum dot phosphor (B1) that emits blue fluorescence. In this case as well, full-color display using the three primary colors is possible.
 液晶表示装置12を製造する場合には、カラーフィルタ2を作製してから、カラーフィルタ2を液晶パネル6に重ねてもよい。液晶パネル6の上に支持基板4を重ねてから、この支持基板4上に上記の方法で隔壁3、カラーレジスト1及び保護層5を作製することで、カラーフィルタ2を作製してもよい。液晶パネル6の上に直接上記の方法で隔壁3、カラーレジスト1及び保護層5を作製することで、カラーフィルタ2を作製してもよい。 When manufacturing the liquid crystal display device 12, the color filter 2 may be manufactured and then the color filter 2 may be superimposed on the liquid crystal panel 6. The color filter 2 may be produced by stacking the support substrate 4 on the liquid crystal panel 6 and then forming the partition wall 3, the color resist 1 and the protective layer 5 on the support substrate 4 by the above method. The color filter 2 may be produced by directly producing the partition wall 3, the color resist 1, and the protective layer 5 on the liquid crystal panel 6 by the above method.
 液晶表示装置12は、上記以外の要素を更に備えてもよい。例えば液晶表示装置12は、カラーフィルタ2に重なる透明な基板を更に備えてもよい。液晶表示装置12は、カラーフィルタ2に重なるタッチパネルを更に備えてもよい。 The liquid crystal display device 12 may further include elements other than the above. For example, the liquid crystal display device 12 may further include a transparent substrate that overlaps the color filter 2. The liquid crystal display device 12 may further include a touch panel that overlaps with the color filter 2.
 図1Bに示す発光装置11は、表示装置であり、より具体的にはLED(発光ダイオード)表示装置である。LED表示装置13は、光源である複数の発光ダイオード9を含む発光ユニット8と、カラーフィルタ2とを備える。発光ダイオード9は、例えばマイクロ発光ダイオード又は有機発光ダイオード(有機エレクトロルミネッセンス素子)である。 The light emitting device 11 shown in FIG. 1B is a display device, and more specifically, an LED (light emitting diode) display device. The LED display device 13 includes a light emitting unit 8 including a plurality of light emitting diodes 9 as a light source, and a color filter 2. The light emitting diode 9 is, for example, a micro light emitting diode or an organic light emitting diode (organic electroluminescence element).
 発光ユニット8は、基板10と、基板10上に搭載されている複数の発光ダイオード9と、発光ダイオード9を覆う保護層15とを備える。発光ユニット8における保護層15は、例えばカラーフィルタ2における保護層5と同様に、樹脂層と無機質層とのうちいずれか一方を含み、又は樹脂層と無機質層との両方を含む。 The light emitting unit 8 includes a substrate 10, a plurality of light emitting diodes 9 mounted on the substrate 10, and a protective layer 15 that covers the light emitting diodes 9. The protective layer 15 in the light emitting unit 8 includes either one of the resin layer and the inorganic layer, or includes both the resin layer and the inorganic layer, like the protective layer 5 in the color filter 2, for example.
 このLED表示装置13におけるカラーフィルタ2のカラーレジスト1は、例えば上記の液晶表示装置12の場合と同様、赤色カラーレジスト1r、緑色カラーレジスト1g及び透明レジスト1bを含む。カラーフィルタ2における複数のカラーレジスト1は、複数の発光ダイオード9のそれぞれと対になっている。発光ダイオード9が発する光は、対となるカラーレジスト1に照射され、それによってカラーレジスト1から蛍光が発せられる。このため、発光ダイオード9が青色光を発する場合、LED表示装置13から外部に発せられる光には、赤色カラーレジスト1rから発せられる赤色の蛍光と、緑色カラーレジスト1gから発せられる緑色の蛍光と、透明レジスト1bを通過する青色の光とが含まれる。このため、三原色を利用したフルカラー表示が可能である。 The color resist 1 of the color filter 2 in the LED display device 13 includes, for example, a red color resist 1r, a green color resist 1 g, and a transparent resist 1b, as in the case of the liquid crystal display device 12 described above. The plurality of color resists 1 in the color filter 2 are paired with each of the plurality of light emitting diodes 9. The light emitted by the light emitting diode 9 irradiates the paired color resist 1, whereby fluorescence is emitted from the color resist 1. Therefore, when the light emitting diode 9 emits blue light, the light emitted from the LED display device 13 to the outside includes red fluorescence emitted from the red color resist 1r and green fluorescence emitted from the green color resist 1g. Includes blue light passing through the transparent resist 1b. Therefore, full-color display using the three primary colors is possible.
 なお、発光ダイオード9が白色の光を発する場合には、透明レジスト1bに代えて、青色の蛍光を発する青色カラーレジストを含んでもよい。この場合、発光ダイオード9は、赤色カラーレジスト1rと対となる発光ダイオード(第一発光ダイオード)と、緑色カラーレジスト1gと対となる発光ダイオード(第二発光ダイオード)と、青色カラーレジストと対になる発光ダイオード(第三発光ダイオード)とを含んでもよい。換言すると、発光ダイオード9は、赤色カラーレジスト1rに光を照射する第一発光ダイオードと、緑色カラーレジスト1gに光を照射する第二発光ダイオードと、青色カラーレジストに光を照射する第三発光ダイオードとを含んでもよい。この場合、LED表示装置13から外部に発せられる光には、赤色カラーレジスト1rから発せられる赤色の蛍光と、緑色カラーレジスト1gから発せられる緑色の蛍光と、青色カラーレジストから発せられる青色の蛍光とが含まれる。このため、三原色を利用したフルカラー表示が可能である。 When the light emitting diode 9 emits white light, a blue color resist that emits blue fluorescence may be contained instead of the transparent resist 1b. In this case, the light emitting diode 9 is paired with a light emitting diode (first light emitting diode) paired with the red color resist 1r, a light emitting diode (second light emitting diode) paired with the green color resist 1g, and a blue color resist. It may include a light emitting diode (third light emitting diode). In other words, the light emitting diode 9 includes a first light emitting diode that irradiates the red color resist 1r with light, a second light emitting diode that irradiates the green color resist 1 g with light, and a third light emitting diode that irradiates the blue color resist with light. And may be included. In this case, the light emitted from the LED display device 13 to the outside includes red fluorescence emitted from the red color resist 1r, green fluorescence emitted from the green color resist 1g, and blue fluorescence emitted from the blue color resist. Is included. Therefore, full-color display using the three primary colors is possible.
 1.組成物の調製
 下記表に示す成分を混合することで、実施例及び比較例の組成物を調製した。表中では、光散乱粒子以外の成分の配合量を質量部で示し、光散乱粒子の配合量を組成物全体を基準とする体積百分率で示す。
1. 1. Preparation of Composition The compositions of Examples and Comparative Examples were prepared by mixing the components shown in the table below. In the table, the blending amount of the components other than the light scattering particles is shown by the mass part, and the blending amount of the light scattering particles is shown by the volume percentage based on the entire composition.
 表中に示される成分のうち、光散乱粒子以外の成分の詳細は次のとおりである。また、下記の各成分の粘度はレオメータ(アントンパール・ジャパン社製、型番DHR-2)を使用し、温度25℃、せん断速度1000s-1の条件で測定された値である。 Among the components shown in the table, the details of the components other than the light-scattering particles are as follows. The viscosities of the following components are measured using a rheometer (manufactured by Anton Paar Japan Co., Ltd., model number DHR-2) under the conditions of a temperature of 25 ° C. and a shear rate of 1000 s -1 .
 <反応硬化性化合物>
-アクリロイルモルホリン:沸点265℃、粘度12mPa・s。
-ジプロピレングリコールジアクリレート:沸点120℃、粘度10mPa・s。
-トリエチレングリコールジメタクリレート:沸点290℃。粘度8mPa・s。
-1,9-ノナンジオールジアクリレート:沸点342℃。粘度8mPa・s。
-ペンタエリスリトールテトラアクリレート:沸点450℃、粘度350mPa・s。
<Reaction curable compound>
-Acryloyl morpholine: Boiling point 265 ° C., viscosity 12 mPa · s.
-Dipropylene glycol diacrylate: Boiling point 120 ° C., viscosity 10 mPa · s.
-Triethylene glycol dimethacrylate: Boiling point 290 ° C. Viscosity 8 mPa · s.
-1,9-Nonanediol diacrylate: Boiling point 342 ° C. Viscosity 8 mPa · s.
-Pentaerythritol tetraacrylate: boiling point 450 ° C., viscosity 350 mPa · s.
 <光重合開始剤>
-Irgacure907:BASF製、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルフォリノプロパン-1-オン。
-IrgacureTPO:BASF製、2,4,6-トリメチルベンゾイル-ジフェニルフォスフィンオキサイド。
<Photopolymerization initiator>
-Irgacure 907: BASF, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one.
-Irgacure TPO: 2,4,6-trimethylbenzoyl-diphenylphosphine oxide manufactured by BASF.
 <量子ドット蛍光体>
-緑色量子ドット蛍光体:CdSe/ZnSコアシェル型半導体粒子、メディアン径3.3nm、SIGMA-ALDRICH社製、製品名CdSe/ZnS530。
-赤色量子ドット蛍光体:CdSe/ZnSコアシェル型半導体粒子、メディアン系5.2nm、SIGMA-ALDRICH社製、製品名CdSe/ZnS610。
<Quantum dot phosphor>
-Green quantum dot phosphor: CdSe / ZnS core-shell type semiconductor particle, median diameter 3.3 nm, manufactured by SIGMA-ALDRICH, product name CdSe / ZnS530.
-Red quantum dot phosphor: CdSe / ZnS core-shell type semiconductor particles, median-based 5.2 nm, manufactured by SIGMA-ALDRICH, product name CdSe / ZnS610.
 <分散剤>
-CBB3098:吸着基としてカルボキシル基を有する側鎖末端型分散剤、酸価98mgKOH/g、粘度9000mP・s、重量平均分子量3000、綜研化学製、品番CBB3098。
-DISPERBYK-2155:吸着基として第三級アミノ基を一分子中に複数個有するポリウレタン構造の分散剤、アミン価48mgKOH/g、粘度13000mP・s、重量平均分子量20000、ビックケミー社製、品番DISPERBYK-2155。
<Dispersant>
-CBB3098: Side chain terminal dispersant having a carboxyl group as an adsorbent, acid value 98 mgKOH / g, viscosity 9000 mP · s, weight average molecular weight 3000, manufactured by Soken Kagaku, product number CBB3098.
-DISPERBYK-2155: Polyurethane structure dispersant having a plurality of tertiary amino groups as adsorbents in one molecule, amine value 48 mgKOH / g, viscosity 13000 mP · s, weight average molecular weight 20000, manufactured by Big Chemie, product number DISPERBYK- 2155.
 また、表中に示される成分のうち、光散乱粒子の詳細は、下記のとおりである。なお、中空粒子の屈折率は、中空粒子における中空部分以外の部分の屈折率である。 The details of the light-scattering particles among the components shown in the table are as follows. The refractive index of the hollow particles is the refractive index of the portion of the hollow particles other than the hollow portion.
 表1及び表2は、実施例A、比較例Aにおいて用いた光散乱粒子の詳細を示している。なお実施例Aは第一の実施形態に対応した実施例である。 Tables 1 and 2 show the details of the light-scattering particles used in Example A and Comparative Example A. In addition, Example A is an Example corresponding to the first embodiment.
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000029
Figure JPOXMLDOC01-appb-T000029
 表3は、実施例B、比較例Bにおいて用いた光散乱粒子の詳細を示している。なお実施例Bは第二の実施形態に対応した実施例である。 Table 3 shows the details of the light-scattering particles used in Example B and Comparative Example B. In addition, Example B is an Example corresponding to the second embodiment.
Figure JPOXMLDOC01-appb-T000030
Figure JPOXMLDOC01-appb-T000030
 2.反応硬化性化合物の硬化物の屈折率の測定
 各実施例及び比較例における光硬化性化合物と光重合性化合物とのみを混合して得られた組成物を塗布して塗膜を作製し、この塗膜を、大気雰囲気下、パナソニック電工サンクス製のLED-UV照射器(ピーク波長385nm)を用いて、500mW/cm2の条件で20秒間紫外線照射して光硬化させることで、厚み300μmのフィルムを作製した。このサンプルの屈折率を、波長589nmの光についての、25℃での屈折率を、アタゴ社製の多波長アッベ屈折計DR-M4を用いて測定した。
2. 2. Measurement of Refractive Index of Cured Product of Reaction Curable Compound A coating film is prepared by applying a composition obtained by mixing only a photocurable compound and a photopolymerizable compound in each Example and Comparative Example. A film having a thickness of 300 μm is obtained by irradiating the coating film with ultraviolet rays for 20 seconds under the condition of 500 mW / cm 2 using an LED-UV irradiator (peak wavelength 385 nm) manufactured by Panasonic Electric Works Sunkus in an atmospheric atmosphere. Was produced. The refractive index of this sample was measured with respect to light having a wavelength of 589 nm at 25 ° C. using a multi-wavelength Abbe refractometer DR-M4 manufactured by Atago.
 3.評価試験
 実施例及び比較例について、次の評価試験を実施した。実施例Aおよび比較例Aの結果を表4から表6に示す。また、実施例Bおよび比較例Bの結果を表7と表8に示す。
3. 3. Evaluation test The following evaluation test was carried out for Examples and Comparative Examples. The results of Example A and Comparative Example A are shown in Tables 4 to 6. The results of Example B and Comparative Example B are shown in Tables 7 and 8.
 (1)25℃粘度
 組成物の粘度を、レオメータ(アントンパール・ジャパン社製、型番DHR-2)を使用して、温度25℃、せん断速度1000s-1の条件で測定した。
(1) 25 ° C. Viscosity The viscosity of the composition was measured using a rheometer (manufactured by Anton Paar Japan Co., Ltd., model number DHR-2) under the conditions of a temperature of 25 ° C. and a shear rate of 1000s -1 .
 (2)40℃粘度
 組成物の粘度を、レオメータ(アントンパール・ジャパン社製、型番DHR-2)を使用して、温度40℃、せん断速度1000s-1の条件で測定した。
(2) Viscosity at 40 ° C. The viscosity of the composition was measured using a rheometer (manufactured by Anton Paar Japan Co., Ltd., model number DHR-2) under the conditions of a temperature of 40 ° C. and a shear rate of 1000 s -1 .
 (3)インクジェット性
 組成物をインクジェットプリンター(リコー製、形式MH2420)のカートリッジに入れ、インクジェットプリンターにおけるノズルからカートリッジ内の組成物を吐出しうることを確認してから、ノズルから組成物を吐出させてテストパターンを連続で印刷した。その結果、組成物を1時間吐出できるとともに吐出動作が安定していた場合を「A」、組成物を1時間吐出できたが吐出動作が断続的に不安定になった場合を「B」、吐出開始から1時間経過前にノズルが詰まって組成物を吐出できなくなった場合を「C」と、評価した。
(3) Inkjet property The composition is placed in a cartridge of an inkjet printer (manufactured by Ricoh, type MH2420), and after confirming that the composition in the cartridge can be ejected from the nozzle of the inkjet printer, the composition is ejected from the nozzle. The test pattern was printed continuously. As a result, "A" indicates that the composition can be discharged for 1 hour and the discharge operation is stable, and "B" indicates that the composition can be discharged for 1 hour but the discharge operation becomes intermittently unstable. The case where the nozzle was clogged and the composition could not be discharged 1 hour before the start of discharge was evaluated as "C".
 (4)沈降安定性
 組成物について、次の試験を行った。組成物を容量20cm3の透明の専用試験容器に高さ41mmまで入れ、三洋貿易社製高機能液中分散安定性評価装置 Turbiscan Labを用いて、波長880nmの光を組成物に照射した際の、試験容器の底部から高さ3mm以内の部分における組成物の散乱強度のピークを測定した(初期値)。続いて、組成物を入れた試験容器を40℃の高温槽内で14日間静置してから、同じ試験を行った。
(4) Precipitation stability The following tests were carried out on the composition. When the composition was placed in a transparent dedicated test container with a capacity of 20 cm 3 to a height of 41 mm and the composition was irradiated with light having a wavelength of 880 nm using the Turbiscan Lab, a high-performance dispersion stability evaluation device manufactured by Sanyo Trading Co., Ltd. , The peak of the scattering intensity of the composition was measured in the portion within 3 mm in height from the bottom of the test container (initial value). Subsequently, the test container containing the composition was allowed to stand in a high temperature bath at 40 ° C. for 14 days, and then the same test was performed.
 評価では、散乱強度のピークの増加量が初期値の1%以下の場合を「A」、散乱強度のピークの増加が初期値の1%超3%以下の場合を「B」、散乱強度のピークの増加が初期値の3%超5%以下の場合を「C」、散乱強度のピークの増加が初期値の5%超である場合を「D」と、評価した。なお、「D」の場合は、試験容器内で組成物を軽く振っても沈降が解消されなかった。 In the evaluation, "A" is when the increase in the peak of the scattering intensity is 1% or less of the initial value, "B" is when the increase in the peak of the scattering intensity is more than 1% and 3% or less of the initial value, and the scattering intensity is The case where the increase in the peak was more than 3% and 5% or less of the initial value was evaluated as "C", and the case where the increase in the peak of the scattering intensity was more than 5% of the initial value was evaluated as "D". In the case of "D", the sedimentation was not eliminated even if the composition was lightly shaken in the test container.
 (5)光散乱評価
 組成物について、次の試験を行った。組成物を厚さ1mmの石英ガラス上に塗布して、塗膜を作製した。この塗膜に、大気雰囲気下、パナソニック電工サンクス製のLED-UV照射器(ピーク波長385nm)を用いて、紫外線を500mW/cm2の条件で3秒間(積算光量1500mJ/cm2)照射して、塗膜を硬化させた。これにより、石英ガラス上に、厚み10μmのフィルムを作製した。このフィルムの、波長450nmの光の透過率を測定した。測定に当たっては、分光光度計(株式会社日立製作所製 U-4100)を用いた。
(5) Evaluation of light scattering The following tests were conducted on the composition. The composition was applied onto quartz glass having a thickness of 1 mm to prepare a coating film. This coating film is irradiated with ultraviolet rays under the condition of 500 mW / cm 2 for 3 seconds (integrated light amount 1500 mJ / cm 2 ) using an LED-UV irradiator (peak wavelength 385 nm) manufactured by Panasonic Electric Works Sunkus in an atmospheric atmosphere. , The coating film was cured. As a result, a film having a thickness of 10 μm was produced on quartz glass. The transmittance of light at a wavelength of 450 nm of this film was measured. A spectrophotometer (U-4100 manufactured by Hitachi, Ltd.) was used for the measurement.
 その結果、透過率が60%以下である場合を「A」、透過率が60%より高く75%以下である場合を「B」、透過率が75%より高い場合を「C」と、評価した。 As a result, the case where the transmittance is 60% or less is evaluated as "A", the case where the transmittance is higher than 60% and 75% or less is evaluated as "B", and the case where the transmittance is higher than 75% is evaluated as "C". bottom.
Figure JPOXMLDOC01-appb-T000031
Figure JPOXMLDOC01-appb-T000031
Figure JPOXMLDOC01-appb-T000032
Figure JPOXMLDOC01-appb-T000032
Figure JPOXMLDOC01-appb-T000033
Figure JPOXMLDOC01-appb-T000033
Figure JPOXMLDOC01-appb-T000034
Figure JPOXMLDOC01-appb-T000034
Figure JPOXMLDOC01-appb-T000035
Figure JPOXMLDOC01-appb-T000035

Claims (24)

  1. 反応硬化性化合物(A)、
    蛍光体(B)及び
    光散乱粒子(C)を含有し、
    光散乱粒子(C)は、コア部と、前記コア部を覆うシェルとを有するコアシェル型粒子(C0)を含み、
    前記コア部の比重は2.0以下であり、
    前記シェルの屈折率は、1.9以上である、
    波長変換部材成形用組成物。
    Reaction curable compound (A),
    Containing a phosphor (B) and a light scattering particle (C),
    The light scattering particles (C) include core-shell type particles (C0) having a core portion and a shell covering the core portion.
    The specific gravity of the core portion is 2.0 or less, and the core portion has a specific gravity of 2.0 or less.
    The refractive index of the shell is 1.9 or more.
    Composition for forming a wavelength conversion member.
  2. 前記コア部は、有機樹脂粒子を含む、
    請求項1に記載の波長変換部材成形用組成物。
    The core portion contains organic resin particles.
    The composition for molding a wavelength conversion member according to claim 1.
  3. 前記コア部は、中空粒子を含む、
    請求項1又は2に記載の波長変換部材成形用組成物。
    The core portion contains hollow particles.
    The composition for forming a wavelength conversion member according to claim 1 or 2.
  4. 前記コア部は、中空部を含む、
    請求項1から3のいずれか一項に記載の波長変換部材成形用組成物。
    The core portion includes a hollow portion.
    The composition for forming a wavelength conversion member according to any one of claims 1 to 3.
  5. 前記コアシェル型粒子(C0)の平均粒径は50nm以上3000nm以下である、
    請求項1から4のいずれか一項に記載の波長変換部材成形用組成物。
    The average particle size of the core-shell type particles (C0) is 50 nm or more and 3000 nm or less.
    The composition for forming a wavelength conversion member according to any one of claims 1 to 4.
  6. 前記シェルの厚みは、5nm以上60nm以下である、
    請求項1から5のいずれか一項に記載の波長変換部材成形用組成物。
    The thickness of the shell is 5 nm or more and 60 nm or less.
    The composition for forming a wavelength conversion member according to any one of claims 1 to 5.
  7. 前記波長変換部材成形用組成物中の固形分に対する前記コアシェル型粒子(C0)の百分比は、1体積%以上20体積%以下である、
    請求項1から6のいずれか一項に記載の波長変換部材成形用組成物。
    The percentage of the core-shell type particles (C0) to the solid content in the composition for forming a wavelength conversion member is 1% by volume or more and 20% by volume or less.
    The composition for forming a wavelength conversion member according to any one of claims 1 to 6.
  8. 反応硬化性化合物(A)、
    蛍光体(B)及び
    光散乱粒子(C)を含有し、
    前記光散乱粒子(C)は、酸化チタン粒子(C1)と、中空粒子(C2)とを含有する、
    波長変換部材成形用組成物。
    Reaction curable compound (A),
    Containing a phosphor (B) and a light scattering particle (C),
    The light scattering particles (C) contain titanium oxide particles (C1) and hollow particles (C2).
    Composition for forming a wavelength conversion member.
  9. 前記酸化チタン粒子(C1)の平均粒径は、300nm以下である、
    請求項8に記載の波長変換部材成形用組成物。
    The average particle size of the titanium oxide particles (C1) is 300 nm or less.
    The composition for molding a wavelength conversion member according to claim 8.
  10. 前記波長変換部材成形用組成物中の固形分に対する前記酸化チタン粒子(C1)の百分比は、1体積%以上20体積%以下である、
    請求項8又は9に記載の波長変換部材成形用組成物。
    The percentage of the titanium oxide particles (C1) to the solid content in the composition for forming a wavelength conversion member is 1% by volume or more and 20% by volume or less.
    The composition for forming a wavelength conversion member according to claim 8 or 9.
  11. 前記中空粒子(C2)は、中空樹脂粒子(C21)を含有し、
    前記中空樹脂粒子(C21)の平均粒径は、前記酸化チタン粒子(C1)の平均粒径の1.5倍以上である、
    請求項8から10のいずれか一項に記載の波長変換部材成形用組成物。
    The hollow particles (C2) contain hollow resin particles (C21), and the hollow particles (C2) contain hollow resin particles (C21).
    The average particle size of the hollow resin particles (C21) is 1.5 times or more the average particle size of the titanium oxide particles (C1).
    The composition for forming a wavelength conversion member according to any one of claims 8 to 10.
  12. 前記中空粒子(C2)は、中空無機粒子(C22)を含有し、
    前記中空無機粒子(C22)の平均粒径は、220nm以上、かつ前記酸化チタン粒子(C1)の平均粒径の2倍以上である、
    請求項8から11のいずれか一項に記載の波長変換部材成形用組成物。
    The hollow particles (C2) contain hollow inorganic particles (C22), and the hollow particles (C2) contain hollow inorganic particles (C22).
    The average particle size of the hollow inorganic particles (C22) is 220 nm or more, and is twice or more the average particle size of the titanium oxide particles (C1).
    The composition for forming a wavelength conversion member according to any one of claims 8 to 11.
  13. 前記波長変換部材成形用組成物中の固形分に対する前記中空粒子(C2)の百分比は、0.1体積%以上20体積%以下である、
    請求項8から12のいずれか一項に記載の波長変換部材成形用組成物。
    The percentage of the hollow particles (C2) to the solid content in the composition for forming a wavelength conversion member is 0.1% by volume or more and 20% by volume or less.
    The composition for forming a wavelength conversion member according to any one of claims 8 to 12.
  14. 分散剤(D)を更に含有する、
    請求項1から13のいずれか一項に記載の波長変換部材成形用組成物。
    Further containing the dispersant (D),
    The composition for forming a wavelength conversion member according to any one of claims 1 to 13.
  15. 分散剤(D)を更に含有し、
    前記分散剤(D)は、一分子中に二以上の吸着基を有する分散剤(D1)を含む、
    請求項8から13のいずれか一項に記載の波長変換部材成形用組成物。
    Further containing the dispersant (D),
    The dispersant (D) contains a dispersant (D1) having two or more adsorbent groups in one molecule.
    The composition for forming a wavelength conversion member according to any one of claims 8 to 13.
  16. 前記反応硬化性化合物(A)は、光硬化性化合物を含有する、
    請求項1から15のいずれか一項に記載の波長変換部材成形用組成物。
    The reaction-curable compound (A) contains a photocurable compound.
    The composition for forming a wavelength conversion member according to any one of claims 1 to 15.
  17. 前記蛍光体(B)は、量子ドット蛍光体(B1)を含有する、
    請求項1から16のいずれか一項に記載の波長変換部材成形用組成物。
    The fluorophore (B) contains a quantum dot fluorophore (B1).
    The composition for forming a wavelength conversion member according to any one of claims 1 to 16.
  18. 25℃での粘度が30mPa・s以下であることと、40℃における粘度が30mPa・s以下であることとのうち、少なくとも一方を満たす、
    請求項1から17のいずれか一項に記載の波長変換部材成形用組成物。
    Satisfying at least one of the viscosity at 25 ° C. being 30 mPa · s or less and the viscosity at 40 ° C. being 30 mPa · s or less.
    The composition for forming a wavelength conversion member according to any one of claims 1 to 17.
  19. 請求項1から18のいずれか一項に記載の波長変換部材成形用組成物の硬化物を含む、
    カラーレジスト。
    A cured product of the composition for forming a wavelength conversion member according to any one of claims 1 to 18.
    Color resist.
  20. 請求項19に記載のカラーレジストを備える、
    カラーフィルタ。
    19. The color resist according to claim 19.
    Color filter.
  21. 請求項20に記載のカラーフィルタと、前記カラーフィルタへ光を照射する光源とを備える、
    発光装置。
    The color filter according to claim 20 and a light source for irradiating the color filter with light.
    Light emitting device.
  22. 表示装置である、
    請求項21に記載の発光装置。
    It is a display device,
    The light emitting device according to claim 21.
  23. 請求項1から18のいずれか一項に記載の波長変換部材成形用組成物をインクジェット法で成形してから、前記波長変換部材成形用組成物に紫外線を照射して硬化させる、
    カラーレジストの製造方法。
    The composition for molding a wavelength conversion member according to any one of claims 1 to 18 is molded by an inkjet method, and then the composition for molding a wavelength conversion member is irradiated with ultraviolet rays to be cured.
    A method for manufacturing a color resist.
  24. カラーレジストを備えるカラーフィルタと、前記カラーフィルタへ光を照射する光源とを備える発光装置を製造する方法であり、
    前記カラーレジストを、請求項23に記載の方法で製造することを含む、
    発光装置の製造方法。
    It is a method of manufacturing a light emitting device including a color filter including a color resist and a light source for irradiating the color filter with light.
    23. The color resist is produced by the method according to claim 23.
    Manufacturing method of light emitting device.
PCT/JP2021/037703 2020-10-12 2021-10-12 Wavelength conversion member molding composition, color resist, color filter, method for manufacturing color resist, light emitting device, and method for manufacturing light emitting device WO2022080359A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022557000A JPWO2022080359A1 (en) 2020-10-12 2021-10-12

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2020172203 2020-10-12
JP2020-172203 2020-10-12
JP2020209679 2020-12-17
JP2020-209679 2020-12-17

Publications (1)

Publication Number Publication Date
WO2022080359A1 true WO2022080359A1 (en) 2022-04-21

Family

ID=81208251

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2021/037703 WO2022080359A1 (en) 2020-10-12 2021-10-12 Wavelength conversion member molding composition, color resist, color filter, method for manufacturing color resist, light emitting device, and method for manufacturing light emitting device

Country Status (2)

Country Link
JP (1) JPWO2022080359A1 (en)
WO (1) WO2022080359A1 (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014006987A1 (en) * 2012-07-04 2014-01-09 シャープ株式会社 Florescent material, florescent coating, phosphor substrate, electronic instrument, and led package
JP2018510367A (en) * 2015-01-06 2018-04-12 コーニング精密素材株式会社Corning Precision Materials Co., Ltd. Quantum dot composite and photoelectric device including the same
KR20180077935A (en) * 2016-12-29 2018-07-09 코오롱인더스트리 주식회사 Quantum Dot Composition And Color Conversion Film
WO2018128144A1 (en) * 2017-01-06 2018-07-12 Jsr株式会社 Composition containing fluorescent particles, wavelength conversion layer, and production method for wavelength conversion layer
JP2018531421A (en) * 2015-09-29 2018-10-25 メルク パテント ゲーエムベーハー Photosensitive composition and color conversion film
JP2019040179A (en) * 2017-08-24 2019-03-14 Jsr株式会社 Laminate and display including laminate
WO2019126688A1 (en) * 2017-12-22 2019-06-27 Lumileds Llc Particle system for monolithic led arrays
US20200040255A1 (en) * 2018-08-06 2020-02-06 Samsung Electronics Co., Ltd. Composition, quantum dot-polymer composite, and display device including same

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014006987A1 (en) * 2012-07-04 2014-01-09 シャープ株式会社 Florescent material, florescent coating, phosphor substrate, electronic instrument, and led package
JP2018510367A (en) * 2015-01-06 2018-04-12 コーニング精密素材株式会社Corning Precision Materials Co., Ltd. Quantum dot composite and photoelectric device including the same
JP2018531421A (en) * 2015-09-29 2018-10-25 メルク パテント ゲーエムベーハー Photosensitive composition and color conversion film
KR20180077935A (en) * 2016-12-29 2018-07-09 코오롱인더스트리 주식회사 Quantum Dot Composition And Color Conversion Film
WO2018128144A1 (en) * 2017-01-06 2018-07-12 Jsr株式会社 Composition containing fluorescent particles, wavelength conversion layer, and production method for wavelength conversion layer
JP2019040179A (en) * 2017-08-24 2019-03-14 Jsr株式会社 Laminate and display including laminate
WO2019126688A1 (en) * 2017-12-22 2019-06-27 Lumileds Llc Particle system for monolithic led arrays
US20200040255A1 (en) * 2018-08-06 2020-02-06 Samsung Electronics Co., Ltd. Composition, quantum dot-polymer composite, and display device including same

Also Published As

Publication number Publication date
JPWO2022080359A1 (en) 2022-04-21

Similar Documents

Publication Publication Date Title
JP7320787B2 (en) UV-Curable Resin Composition, Method for Manufacturing Light-Emitting Device, and Light-Emitting Device
JP6854431B2 (en) Ultraviolet curable resin composition, manufacturing method of organic EL light emitting device, organic EL light emitting device, and touch panel
JP7199004B2 (en) UV curable resin composition and organic EL light emitting device
JP2020172648A (en) Ultraviolet curable resin composition, method for manufacturing light-emitting device and light-emitting device
WO2022203081A1 (en) Photocurable resin composition, optical component, method for producing optical component, and light emitting device
JP2023156307A (en) Ultraviolet curable resin composition, manufacturing method of light emitting device, light emitting device, and touch panel
JP7170246B2 (en) UV-Curable Resin Composition, Method for Manufacturing Light-Emitting Device, and Light-Emitting Device
JP7228804B2 (en) Ultraviolet curable resin composition, color filter, light emitting device, method for producing color filter, and method for producing light emitting device
WO2022080359A1 (en) Wavelength conversion member molding composition, color resist, color filter, method for manufacturing color resist, light emitting device, and method for manufacturing light emitting device
JP2022047977A (en) Uv-curable resin composition, optical component, method for producing optical component, light-emitting device, and method for producing light-emitting device
JP7442121B2 (en) Ultraviolet curable resin composition, color resist, color filter, light emitting device, and method for producing color resist
JP7489612B2 (en) Ultraviolet-curable resin composition, method for manufacturing light-emitting device, and light-emitting device
JP7457941B2 (en) Method for producing ultraviolet curable resin composition and method for producing light emitting device
JP2022068006A (en) Composition for forming wavelength conversion member, color resist, color filter, manufacturing method for collar resist, light emitting device, and manufacturing method for light emitting device
JP2022056388A (en) Ultraviolet-curable resin composition, optical component, method for manufacturing optical component, light-emitting device, and method for manufacturing light-emitting device
CN113248952B (en) Ultraviolet curable resin composition, optical member and method for producing same, light-emitting device and method for producing same
JP2022093086A (en) Uv-curable resin composition, optical component, method for producing optical component, light-emitting device, and method for producing light-emitting device
CN112578634A (en) Ultraviolet-curable resin composition, color filter, color resist, light-emitting device, and methods for producing these
JP2022142674A (en) Photocurable resin composition, optical component, manufacturing method of optical component, light emitting device, and manufacturing method of light emitting device
JP2022142676A (en) Photocurable resin composition, optical component, manufacturing method of optical component, light emitting device, and manufacturing method of light emitting device
JP2022142673A (en) Photocurable resin composition, optical component, manufacturing method of optical component, light emitting device, and manufacturing method of light emitting device
JP2022142675A (en) Photocurable resin composition, optical component, method for producing optical component, light-emitting device, and method for producing light-emitting device
JP2022052565A (en) Uv curable resin composition, optical component, manufacturing method of optical component, light emitting device, manufacturing method of light emitting device
JP2022064231A (en) Photocurable resin composition, optical component, method for producing optical component, light-emitting device, and method for producing light-emitting device
WO2024111659A1 (en) Photocurable resin composition, optical component, production method for optical component, light-emitting device, and production method for light-emitting device

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 21880098

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2022557000

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 21880098

Country of ref document: EP

Kind code of ref document: A1