WO2022036753A1 - 一种用于光刻机的防震装置及光刻机 - Google Patents

一种用于光刻机的防震装置及光刻机 Download PDF

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Publication number
WO2022036753A1
WO2022036753A1 PCT/CN2020/112423 CN2020112423W WO2022036753A1 WO 2022036753 A1 WO2022036753 A1 WO 2022036753A1 CN 2020112423 W CN2020112423 W CN 2020112423W WO 2022036753 A1 WO2022036753 A1 WO 2022036753A1
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WIPO (PCT)
Prior art keywords
magnetic suspension
sealing
lithography machine
moving plate
vibration
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PCT/CN2020/112423
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English (en)
French (fr)
Inventor
葛俊海
黄丽辉
戴成杰
赵永杰
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国为(南京)软件科技有限公司
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Publication of WO2022036753A1 publication Critical patent/WO2022036753A1/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/022—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using dampers and springs in combination
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/03—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using magnetic or electromagnetic means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F2222/00—Special physical effects, e.g. nature of damping effects
    • F16F2222/06—Magnetic or electromagnetic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F2222/00—Special physical effects, e.g. nature of damping effects
    • F16F2222/12—Fluid damping

Definitions

  • the invention relates to an auxiliary shockproof device for a lithography machine, in particular to a shockproof device for a lithography machine and a lithography machine.
  • Lithography machine is also known as: mask alignment exposure machine, exposure system, lithography system, etc.
  • a commonly used lithography machine is mask alignment lithography.
  • the general lithography process needs to go through the steps of cleaning and drying the surface of the silicon wafer, priming, spin-coating photoresist, soft baking, alignment exposure, post-baking, developing, hard baking, and etching. It means the process of using light to make a pattern (process); the process of applying glue on the surface of the silicon wafer, and then transferring the pattern on the mask to the photoresist to temporarily "copy" the device or circuit structure to the silicon wafer.
  • the workpiece body base is a platform for placing the workpiece. Due to the high precision requirements of photolithography, a device that can reduce the transmission of internal vibrations to the workpiece body base is required.
  • the present invention provides a shockproof device for a lithography machine, which can reduce the vibration of the lithography machine during operation, reduce the propagation of external vibrations, and improve the processing accuracy.
  • a shockproof device for a lithography machine comprising: a magnetic suspension shockproof mechanism, the magnetic suspension shockproof mechanism includes a magnetic suspension moving plate, a sealing sliding ball and a a guide plate, the magnetic suspension moving plate is embedded in the guiding plate, and the magnetic suspension moving plate is slidably installed in the guiding plate; the sealing sliding ball is movably installed between the magnetic suspension moving plate and the guiding plate ;
  • the magnetic suspension moving plate has a plurality of sealing partitions, and the sealing partitions are located on both sides of the magnetic suspension moving plate, and both upper and lower sides are arranged; the distance between the sealing partitions is far from the guide plate.
  • the sealing and interlayers are installed relative to each other in a dislocation and contactless manner; the sealing and interlayers are magnetic, the sealing interlayers are magnetic, and the inter-sealing layers are magnetically opposite to the sealing interlayers.
  • the air pressure sealer is fixedly installed in the main body base and used for air sealing the magnetic suspension moving plate and the guide plate in the magnetic suspension anti-vibration mechanism.
  • the main body base includes a main body, a support column, an interlayer foot and a shock absorber
  • the support column is arranged under the main body and is located at the four corners of the main body
  • the interlayer foot is fixedly installed under the support column.
  • One side of the shock absorber is fixedly installed on the support column, and the other side of the shock absorber is fixedly installed under the main body.
  • the shock absorber includes a casing, a pressure release hole and a transmission member, the casing is filled with antifreeze, the pressure release hole is arranged on the surface of the casing, and the transmission member is fixedly arranged on the inner surface of the casing. , and extends to the level of antifreeze;
  • the transmission member has a transmission shovel surface and a fixing section, the fixing section is arranged near the inner surface of the casing, and the transmission shovel surface is arranged on the fixing section for transmitting vibration to the antifreeze.
  • the present invention has a reasonable and simple structure, low production cost, convenient installation, and complete functions, which can meet the rigid requirements and micro-seismic requirements of the lithography machine for the base seat, and provide an installation environment for its supporting equipment;
  • the magnetic suspension moving plate has multiple sealing interlayers and the guide plate has multiple sealing interlayers.
  • the two are installed opposite to each other at intervals, and the sliding balls are used to prevent them from colliding with each other.
  • the magnetic properties of the interlayer are opposite, avoiding up and down collisions and reducing damage.
  • Another object of the present invention is to provide a lithography machine, including the above-mentioned shockproof device for the lithography machine.
  • the lithography machine uses ultraviolet light as a light source.
  • the wavelength of the ultraviolet light is between 10-365 nm.
  • the lithography machine in the present invention adopts the shockproof device for the lithography machine provided in the present invention, which reduces the internal vibration transmitted to the base of the workpiece body.
  • the work is more stable, and the quality law is higher.
  • FIG. 1 is a schematic diagram of an anti-vibration device for a lithography machine according to an embodiment of the present invention
  • FIG. 2 is a schematic top view of the shock-proof device for the lithography machine in FIG. 1;
  • FIG. 3 is a schematic front view of the shock-proof device for the lithography machine in FIG. 1;
  • FIG. 4 is a left side schematic view of the shock-proof device for the lithography machine in FIG. 1;
  • Fig. 5 is the enlarged view schematic diagram at A place in Fig. 3;
  • Fig. 6 is the enlarged view schematic diagram at B in Fig. 4;
  • a shock-proof device for a lithography machine which can reduce vibration during processing and improve processing accuracy.
  • it includes a main body base 1, an air pressure seal
  • the magnetic suspension anti-vibration mechanism 2 and the air pressure sealer 3 are respectively installed in the main body base 1, and the air pressure seal 3 releases the gas to make the magnetic suspension anti-vibration mechanism 2 perform preliminary suspension under the action of air pressure,
  • the magnetic suspension device 4 of the magnetic suspension anti-vibration mechanism 2 in the main body base 1 is also included, and the magnetic suspension device 4 is a common magnetic suspension method.
  • the magnetic suspension anti-vibration mechanism 2 includes a magnetic suspension moving plate 21 , a sealing sliding ball 22 and a guide plate 23 . Both sides of the magnetic suspension moving plate 21 are respectively embedded in the guiding plate 23 , and the magnetic suspension moving plate 21 slides in the guiding plate 23 . Installation, the sealing sliding ball 22 is movably installed between the magnetic suspension moving plate 21 and the guide plate 23 .
  • a plurality of sealing partitions 211 are provided on the surface of the magnetic suspension moving plate 21, and the sealing partitions 211 are located on both sides of the magnetic suspension moving plate 21, and are arranged in the upper and lower directions; The distance between the sealing layers 211 is gradually reduced in the direction away from the guide plate 23 in order to make the pressure between each compartment the same.
  • the guide plate 23 also has a sealing interlayer 231, and the sealing interlayer 211 and the sealing interlayer 231 are installed relative to each other at a dislocation.
  • the sealing spacer 211 has magnetism
  • the sealing spacer 231 has magnetism
  • the sealing spacer 231 is magnetically opposite to the sealing spacer 211 .
  • collision is further avoided and damage is reduced by this method.
  • the main body base 1 specifically includes: a main body 11 , a supporting column 12 , an interlayer foot 13 and a shock absorber 14 , the supporting column 12 is arranged under the main body 11 and is located at the four corners of the main body 11 , and the interlayer foot 13 is fixedly installed on the Under the support column 12, the shock absorber 14 is fixedly installed on the support column 12 on one side, and the shock absorber 14 is fixedly installed under the main body 11 on the other side; the structure is simple and the support effect is obvious. It includes a casing 141 , a pressure release hole 142 and a transmission member 143 .
  • Antifreeze is filled in the casing 141 , the pressure release hole 142 is provided on the surface of the casing 141 , and the transmission member 143 is fixedly arranged on the inner surface of the casing 141 and extends to In the liquid level of antifreeze; in actual use, the vibration received by the casing 141 is reduced when it passes through the pressure relief hole 142.
  • there are multiple pressure relief holes 142 on the surface of the casing 141 and only in this way can the Vibration transmission is reduced, and at the same time, the antifreeze in the casing 141 has a shock-absorbing function by utilizing liquid properties.
  • the antifreeze is injected into the casing 141 through the pressure relief hole 142 .
  • the transmission member 143 has a transmission shovel surface 1431 and a fixed section 1432, the fixed section 1432 is disposed near the inner surface of the housing 141, and the transmission shovel surface 1431 is disposed on the fixed section 1432 for transmitting vibration to the antifreeze.
  • the anti-vibration device for a lithography machine has a reasonable and simple structure, low production cost, convenient installation, and complete functions, which can meet the rigid requirements of the lithography machine for the base seat and the requirements for anti-micro-vibration, and can reduce the Vibration to further improve machining accuracy.
  • the anti-vibration device in this embodiment can be widely used in various lithography systems to form a complete lithography machine. These lithography systems can use ultraviolet light as their light source, and the wavelength of the light source can be 10-365 nm.

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Abstract

一种用于光刻机的防震装置以及采用该防震装置的光刻机，具体涉及零部件检测领域，防震装置包括主体基座（1）、气压密封器（3）和磁悬防震机构（2），磁悬防震机构（2）与气压密封器（3）分别安装在主体基座（1）中，气压密封器（3）通过释放气体，在气压作用下使得磁悬防震机构（2）进行初步悬浮，磁悬防震机构（2）包括磁悬移动板（21）、密封滑球（22）和导向板（23），磁悬移动板（21）内嵌在导向板（23）中，磁悬移动板（21）在导向板（23）中滑动安装；密封滑球（22）活动安装在磁悬移动板（21）与导向板（23）之间；防震装置结构合理简单、生产成本低、安装方便，功能齐全，能满足光刻机对基座的刚性需求和防微震要求，能够减少振动，进一步地提高加工精度。

Description

一种用于光刻机的防震装置及光刻机 技术领域
本发明涉及光刻机辅助防震装置，具体涉及一种用于光刻机的防震装置及光刻机。
背景技术
光刻机又名：掩模对准曝光机，曝光系统，光刻系统等。常用的光刻机是掩膜对准光刻。一般的光刻工艺要经历硅片表面清洗烘干、涂底、旋涂光刻胶、软烘、对准曝光、后烘、显影、硬烘、刻蚀等工序。意思是用光来制作一个图形(工艺)；在硅片表面匀胶，然后将掩模版上的图形转移光刻胶上的过程将器件或电路结构临时“复制”到硅片上的过程。
其中工件主体基座顾名思义就是放工件的平台，由于光刻加工的精度要求高，所以需要一个能够具备减少内部振动传递至工件主体基座的装置。
发明内容
针对现有技术存在的不足，本发明提供一种用于光刻机的防震装置，能够减少光刻机工作时的振动，同时减少外部振动的传播，提高加工精度。
为了实现上述目的，本发明是通过如下的技术方案来实现：一种用于光刻机的防震装置，包括：磁悬防震机构，所述磁悬防震机构包括磁悬移动板、密封滑球和导向板，所述磁悬移动板内嵌在所述导向板中，所述磁悬移动板在所述导向板中滑动安装；所述密封滑球活动安装在磁悬移动板与导向板之间；所述磁悬移动板具有多个密封隔层，所述密封隔层位于磁悬移动板两侧位置，且上下两侧均有设置；所述密封隔层之间的距离，在远离导向板的方向，距离逐渐减少；所述导向板具有密封间层，所述密封间层位于导向板中，靠近磁悬移动板方向，且同时设置 在上下两侧，所述密封间层位与所述密封隔层错位无接触相对安装；所述密封隔层具有磁性，所述密封间层具有磁性，所述密封间层位与所述密封隔层磁性相反。
进一步的，还包括主体基座与气压密封器，所述气压密封器固定安装在主体基座中，用于对磁悬防震机构中的磁悬移动板与导向板，进行气封。
进一步的，所述主体基座包括主体、支撑立柱、隔层地脚和吸震器，所述支撑立柱设置在主体下，位于主体四角处，所述隔层地脚固定安装在所述支撑立柱下，所述吸震器一面固定安装在所述支撑立柱上，吸震器另一面固定安装在所述主体下。
进一步的，所述吸震器包括壳体、释压孔与传递件，所述壳体中装入有防冻液、所述释压孔设在壳体表面，所述传递件固定设置在壳体内表面，并延伸至防冻液的液位中；
所述传递件具有传递铲面与固定段，所述固定段设置在靠近壳体内表面处，所述传递铲面设置在固定段上，用于将振动传递给防冻液中。
上述用于光刻机的防震装置的有益效果是：
(1)本发明结构合理简单、生产成本低、安装方便，功能齐全，能满足该光刻机对基础座的刚性需求和防微震要求，以及提供其配套设备的安装环境；
(2)通过磁悬方式，将用于光刻刻蚀的移动板进行悬浮，极大的减少了外部振动带来加工误差，进一步地提高了加工精度。
(3)在磁悬移动板具有多个密封隔层与导向板具有多个密封间层，两者两两间隔相对安装，且通过密封滑球防止其左右相撞，并通过密封隔层与密封间层的磁性相反，避免上下碰撞，减少损伤。
本发明的另一目的是提供一种光刻机，包括上述的用于光刻机的防震装置。
进一步的，该光刻机采用紫外光作为光源。
进一步的，所述紫外光的波长在10-365nm之间。
本发明中的光刻机，采用了本发明中提供的于光刻机的防震装置，由于减少了传递至工件主体基座的内部振动。工作更为稳定，良品律更 高。
附图说明
为了更清楚地说明本发明具体实施方式的技术方案，下面将对具体实施方式中所需要使用的附图作简单地介绍。附图中，各部分并不一定按照实际的比例绘制。
图1为本发明实施例中的用于光刻机的防震装置的示意图；
图2为图1中的用于光刻机的防震装置的俯视示意图；
图3为图1中的用于光刻机的防震装置的主视示意图；
图4为图1中的用于光刻机的防震装置的左视示意图；
图5为图3中A处放大视示意图；
图6为图4中的B处放大视示意图；
附图标记：主体基座1；主体11；支撑立柱12；隔层地脚13；吸震器14；壳体141；释压孔142；传递件143；传递铲面1431；固定段1432；磁悬防震机构2；密封隔层211；密封间层231；磁悬移动板21；密封滑球22；导向板23；气压密封器3；磁悬装置4。
具体实施方式
为使本发明的上述目的、特征和优点能够更加明显易懂，下面结合附图对本发明的具体实施方式做详细的说明。在下面的描述中阐述了很多具体细节以便于充分理解本发明。但是本发明能够以很多不同于在此描述的其它方式来实施，本领域技术人员可以在不违背本发明内涵的情况下做类似改进，因此发明不受下面公开的具体实施的限制。
需要说明的是，当元件被称为“固定于”另一个元件，它可以直接在另一个元件上或者也可以存在居中的元件。当一个元件被认为是“连接”另一个元件，它可以是直接连接到另一个元件或者可能同时存在居中元件。本文所使用的术语“垂直的”、“水平的”、“左”、“右”以及类似的表述只是为了说明的目的，并不表示是唯一的实施方式。
在本实施例中，详情参考图1-图6所示，提供一种用于光刻机的防 震装置，能够减少在加工中的振动，提高加工精度，具体地包括主体基座1、气压密封器3和磁悬防震机构2，磁悬防震机构2与气压密封器3分别安装在主体基座1中，气压密封器3通过释放气体，在气压作用下使得磁悬防震机构2进行初步悬浮，当然了还包括磁悬防震机构2在主体基座1中本身的磁悬装置4，该磁悬装置4为常见的磁悬方式。
而磁悬防震机构2包括磁悬移动板21、密封滑球22和导向板23，磁悬移动板21的两侧分别内嵌在导向板23中，磁悬移动板21在导向板23中滑动安装，密封滑球22活动安装在磁悬移动板21与导向板23之间。
为了减少磁悬防震机构2用于密封的气流流体，在磁悬移动板21表面具有多个密封隔层211，密封隔层211位于磁悬移动板21两侧位置，且上下方向均有设置；通过隔层间隔的设置，延长密封气流的流程，为了使得各个间隔间的压力相同，在密封隔层211之间的距离，在远离导向板23的方向，距离逐渐减少。当然了在导向板23中还具有密封间层231，密封隔层211与密封间层231之间错位相对安装。
为了防止碰撞磁悬移动板21和导向板23，在密封隔层211具有磁性，密封间层231具有磁性，密封间层231与密封隔层211磁性相反。实际运用中，通过该方式进一步地避免了碰撞，减少损伤。
主体基座1具体的包括：主体11、支撑立柱12、隔层地脚13和吸震器14，支撑立柱12设置在主体11下，位于主体11四角处，隔层地脚13固定安装在所述支撑立柱12下，吸震器14一面固定安装在所述支撑立柱12上，吸震器14另一面固定安装在所述主体11下；该结构简单，支撑效果明显，同时为了继续减震，吸震器14包括壳体141、释压孔142与传递件143，壳体141中装入有防冻液、释压孔142设在壳体141表面，传递件143固定设置在壳体141内表面，并延伸至防冻液的液位中；实际运用中，壳体141接收到的振动，在经过释压孔142时，被减少，当然了壳体141表面的释压孔142具有多处，只有这样才能尽量的减少振动传递，同时在壳体141内的防冻液利用液体特性具有吸震功能，当然防冻液通过释压孔142注入进壳体141内。
传递件143具有传递铲面1431与固定段1432，固定段1432设置 在靠近壳体141内表面处，传递铲面1431设置在固定段1432上，用于将振动传递给防冻液中。
综上所述，该一种用于光刻机的防震装置，结构合理简单、生产成本低、安装方便，功能齐全，能满足该光刻机对基础座的刚性需求和防微震要求，能够减少振动，进一步地提高加工精度。
本实施例中的防震装置可广泛的用于各类光刻系统中，形成完整的光刻机，这些光刻系统，可采用紫外光作为其光源，光源的波长可采用在10-365nm。
以上显示和描述了本发明的基本原理和主要特征和本发明的优点,对于本领域技术人员而言，显然本发明不限于上述示范性实施例的细节，而且在不背离本发明的精神或基本特征的情况下，能够以其他的具体形式实现本发明。因此，无论从哪一点来看，均应将实施例看作是示范性的，而且是非限制性的，本发明的范围由所附权利要求而不是上述说明限定，因此旨在将落在权利要求的等同要件的含义和范围内的所有变化囊括在本发明内。不应将权利要求中的任何附图标记视为限制所涉及的权利要求。
此外，应当理解，虽然本说明书按照实施方式加以描述，但并非每个实施方式仅包含一个独立的技术方案，说明书的这种叙述方式仅仅是为清楚起见，本领域技术人员应当将说明书作为一个整体，各实施例中的技术方案也可以经适当组合，形成本领域技术人员可以理解的其他实施方式。

Claims (9)

  1. 一种用于光刻机的防震装置，其特征在于，包括：
    磁悬防震机构，所述磁悬防震机构包括磁悬移动板、密封滑球和导向板，所述磁悬移动板内嵌在所述导向板中，所述磁悬移动板在所述导向板中滑动安装；
    所述密封滑球活动安装在磁悬移动板与导向板之间；
    所述磁悬移动板具有多个密封隔层，所述密封隔层位于磁悬移动板两侧位置，且上下两侧均有设置；
    所述导向板具有多个密封间层，所述密封间层位于导向板中，靠近磁悬移动板方向，且同时设置在上下两侧，所述密封间层位与所述密封隔层错位无接触相对安装。
  2. 根据权利要求1所述的一种用于光刻机的防震装置，其特征在于，还包括主体基座与气压密封器，所述气压密封器固定安装在主体基座中，用于对磁悬防震机构中的磁悬移动板与导向板，进行气封。
  3. 根据权利要求2所述的一种用于光刻机的防震装置，其特征在于，所述主体基座包括主体、支撑立柱、隔层地脚和吸震器，所述支撑立柱设置在主体下，位于主体四角处，所述隔层地脚固定安装在所述支撑立柱下，所述吸震器一面固定安装在所述支撑立柱上，所述吸震器另一面固定安装在所述主体下。
  4. 根据权利要求3所述的一种用于光刻机的防震装置，其特征在于，所述吸震器包括壳体、释压孔与传递件，所述壳体中装入有防冻液、所述释压孔设在壳体表面，所述传递件固定设置在壳体内表面，并延伸至防冻液的液位中；
    所述传递件具有传递铲面与固定段，所述固定段设置在靠近壳体内表面处，所述传递铲面设置在固定段上，用于将振动传递给防冻液中。
  5. 根据权利要求1所述的一种用于光刻机的防震装置，其特征在于，所述密封隔层之间的距离，在远离导向板的方向，距离逐渐减少。
  6. 根据权利要求1所述的一种用于光刻机的防震装置，其特征在于，所述密封隔层具有磁性，所述密封间层具有磁性，所述密封间层位于所述 密封隔层磁性相反。
  7. 一种光刻机，其特征在于：包括如权利要求1-6中任一所述的用于光刻机的防震装置。
  8. 根据权利要求7所述的一种光刻机，其特征在于，所述光刻机采用紫外光作为光源。
  9. 根据权利要求8所述的一种光刻机，其特征在于，所述紫外光的波长在10-365nm之间。
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Publication number Priority date Publication date Assignee Title
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000145885A (ja) * 1998-11-16 2000-05-26 Michio Takaoka 自己シール浮上の免震装置
TW201416559A (zh) * 2012-10-17 2014-05-01 Hon Hai Prec Ind Co Ltd 導風件
CN205085675U (zh) * 2015-10-29 2016-03-16 谢进义 数控机床磁悬浮传动工作台
JP2016090034A (ja) * 2014-11-11 2016-05-23 オイレス工業株式会社 制振装置
CN208334911U (zh) * 2018-07-02 2019-01-04 协伟集成电路设备（上海）有限公司 一种用于干式和沉浸式光刻机防微振基础座
CN111365400A (zh) * 2020-04-24 2020-07-03 浙江路得坦摩汽车部件股份有限公司 一种阻尼可调和具有限位功能的减振器

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0771516A (ja) * 1993-08-31 1995-03-17 Showa Electric Wire & Cable Co Ltd 精密除振台
US20040100007A1 (en) * 2002-11-21 2004-05-27 Nikon Corporation Vibration damping devices and methods
CN103062292B (zh) * 2012-12-19 2015-04-22 哈尔滨工业大学 双层气浮正交解耦与滑动关节轴承角度解耦的电磁阻尼隔振器
CN106292193B (zh) * 2015-05-24 2019-01-29 上海微电子装备（集团）股份有限公司 吸振装置及吸振方法、光刻机系统
CN107450284B (zh) * 2017-09-27 2019-06-07 武汉华星光电技术有限公司 曝光设备及透明基板的曝光方法
CN110376849A (zh) * 2019-07-03 2019-10-25 杭州鸿运彩印包装有限公司 一种晒版机

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000145885A (ja) * 1998-11-16 2000-05-26 Michio Takaoka 自己シール浮上の免震装置
TW201416559A (zh) * 2012-10-17 2014-05-01 Hon Hai Prec Ind Co Ltd 導風件
JP2016090034A (ja) * 2014-11-11 2016-05-23 オイレス工業株式会社 制振装置
CN205085675U (zh) * 2015-10-29 2016-03-16 谢进义 数控机床磁悬浮传动工作台
CN208334911U (zh) * 2018-07-02 2019-01-04 协伟集成电路设备（上海）有限公司 一种用于干式和沉浸式光刻机防微振基础座
CN111365400A (zh) * 2020-04-24 2020-07-03 浙江路得坦摩汽车部件股份有限公司 一种阻尼可调和具有限位功能的减振器

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