WO2022016815A1

WO2022016815A1 - Moving mechanism and forming method and driving method therefor, electronic device, and imaging apparatus

Info

Publication number: WO2022016815A1
Application number: PCT/CN2020/140873
Authority: WO
Inventors: 韩凤芹; 桂珞; 王邦旭
Original assignee: 中芯集成电路（宁波）有限公司上海分公司
Priority date: 2020-07-21
Filing date: 2020-12-29
Publication date: 2022-01-27
Also published as: CN113965691A; CN113965691B

Abstract

A moving mechanism and a forming method and driving method therefor, an electronic device (700), and an imaging apparatus. The moving mechanism comprises: a fixed platform (10); transverse driving electrodes (13), which are located on the fixed platform (10); transversely movable electrodes (19s), which are transversely arranged relative to the transverse driving electrodes (13) and have a preset spacing (d) therebetween, and comprise first transversely movable electrodes (19sl) opposite the transverse driving electrodes (13); first longitudinal driving electrodes (11b), which are located on the fixed platform (10); longitudinally movable electrodes (19b), which are longitudinally arranged relative to the first longitudinal driving electrodes (11b) and are connected to the transversely movable electrodes (19s); wires (23), one end of which is fixed, and the other end of which is fixedly electrically connected to the transversely movable electrodes (19s) or the longitudinally movable electrodes (19b); first pull-in electrodes (22), which are located above the transversely movable electrodes (19s), the first pull-in electrodes (22) being fixedly connected to the first transversely movable electrodes (19sl) by means of isolation layers (21); and a movable platform (17), which comprises a second pull-in electrode (17b) and a movable polar plate (17a), the second pull-in electrode (17b) being arranged opposite the first pull-in electrodes (22) in the longitudinal direction. The moving mechanism has a high moving precision.

Description

Moving mechanism and its forming method, driving method, electronic device and imaging device

technical field

Embodiments of the present invention relate to the field of semiconductor manufacturing, and in particular, to a moving mechanism and a method for forming the same, a method for driving the same, an electronic device, and an imaging device.

Background technique

In some electronic terminals, it is usually necessary to make some of the components translate, vertically move or tilt, so as to realize some special functions, such as: realizing optical image stabilization (Optical Image Stabilization). image stabilization, OIS), super resolution (Super-Resolution, SR).

Optical image stabilization relies on special lenses or photosensitive elements to minimize image instability caused by shaking or moving objects during use. At present, an optical anti-shake technology usually detects small movements in the gyroscope in the lens, and transmits the signal to the microprocessor to immediately calculate the displacement amount that needs to be compensated, and then through the compensation lens group, according to the shaking direction and displacement This can effectively overcome image blur caused by camera vibration.

There are also some optical image stabilization technologies in various electronic terminals such as cameras, cameras and mobile phones with lens modules, which are usually driven by VCM motors (Voice Coil Actuator/Voice Coil Motor, voice coil motor). The movable lens is displaced in the direction of the optical axis for focusing or zooming, or displaced in the direction perpendicular to the direction of the optical axis to prevent optical shake.

Image super-resolution reconstruction uses a set of low-quality, low-resolution images (or motion sequences) to generate a single high-quality, high-resolution image. The application field of image super-resolution reconstruction is very broad, and there are important application prospects in military, medical, public security, computer vision and so on. In the field of computer vision, image super-resolution reconstruction technology has the potential to transform the image from the detection level to the recognition level, or further to the fine discrimination level.

technical problem

The problem solved by the embodiments of the present invention is to provide a moving mechanism and a method for forming the same, a driving method, an electronic device, and an imaging device, so as to improve the moving accuracy of the moving mechanism.

technical solutions

In order to solve the above problems, an embodiment of the present invention provides a moving mechanism, comprising: a fixed platform, the direction parallel to the surface of the fixed platform is horizontal, and the direction perpendicular to the surface of the fixed platform is vertical; an electrode, located on the fixed platform; a laterally movable electrode, arranged laterally with respect to the laterally driving electrode with a preset distance, the laterally movable electrode comprising a first laterally movable electrode opposite to the laterally driving electrode electrodes; a first longitudinal driving electrode, located on the fixed platform; a longitudinal movable electrode, longitudinally arranged relative to the first longitudinal driving electrode, the longitudinal movable electrode and the first longitudinal driving electrode can electrostatically attract combined, wherein the horizontal movable electrode is connected with the vertical movable electrode; a wire, one end of the wire is fixed, and the other end is fixed and electrically connected to the horizontal movable electrode or the vertical movable electrode, And supporting the horizontal movable electrode and the vertical movable electrode can be in a suspended state; the first suction electrode is located above the horizontal movable electrode, and the first suction electrode is connected to the first suction electrode through an isolation layer. The lateral movable electrode is fixedly connected; the movable platform is used to support the moved part, the movable platform includes a second suction electrode and a movable electrode plate located on the second suction electrode, the second suction electrode The suction electrode is arranged opposite to the first suction electrode in the longitudinal direction.

Correspondingly, an embodiment of the present invention also provides a method for forming a moving mechanism, including: providing a fixed platform, including a work area, a direction parallel to the surface of the fixed platform is lateral, and perpendicular to the surface of the fixed platform A first longitudinal drive electrode is formed on the fixed platform of the working area; a support column is formed on the fixed platform, and the support column of the working area is isolated from the first longitudinal drive electrode forming a lateral drive electrode on the side of the support column; forming a first sacrificial layer conformally covering the support column, the lateral drive electrode and the first longitudinal drive electrode, the first sacrificial layer located on the side of the lateral drive electrode The thickness of the layer is a preset interval; in the working area, a conductive layer is formed on the first sacrificial layer, the conductive layer includes a wire fixed at one end, opposite to the first longitudinal driving electrode and connected to the A longitudinal movable electrode of the wire, and a transverse movable electrode opposite to the transverse driving electrode and connected to the longitudinal movable electrode, wherein the transverse movable electrode includes a first transverse electrode opposite to the side surface of the support column a movable electrode; forming a second sacrificial layer covering the first sacrificial layer and the conductive layer, the second sacrificial layer being flush with the top surface of the conductive layer; forming the second sacrificial layer covering the top surface of the support column an isolation layer between the conductive layer and the second sacrificial layer; in the working area, a first pull-in electrode is formed on the isolation layer above the top surface of the conductive layer; forming a layer covering the second sacrificial layer and the first The third sacrificial layer of the suction electrode; a movable platform is formed on the third sacrificial layer of the working area, and the movable platform includes a second suction electrode and a movable platform on the second suction electrode plate; after the movable platform is formed, the third sacrificial layer, the second sacrificial layer and the first sacrificial layer are removed.

Correspondingly, an embodiment of the present invention further provides a driving method for the aforementioned moving mechanism, including: performing a first initial driving process, making both the first lateral movable electrode and the lateral driving electrode in a floating state, and sending a The first pull-in electrode is loaded with a first drive signal, and the second pull-in electrode is loaded with a second drive signal, so that there is a first electrostatic attraction between the first pull-in electrode and the second pull-in electrode, which is used for The first pull-in electrode and the second pull-in electrode are pulled in; after the first initial driving process is performed, one or more displacement processes are performed, and the step of the displacement process includes: executing a first sub-displacement process to move and fit the first lateral movable electrode to the corresponding lateral drive electrode; after the first sub-displacement process is performed, a second sub-displacement process is performed, the movable platform is fixed, and the The first pull-in electrode is loaded with a third drive signal, and the second pull-in electrode is loaded with a fourth drive signal, so as to separate the first pull-in electrode and the second pull-in electrode, and make the first lateral The movable electrode is moved by twice the preset distance in the direction away from the corresponding lateral drive electrode; after the second sub-displacement process is performed, a third sub-displacement process is performed to move toward the first suction electrode Load a fifth driving signal, and load a sixth driving signal to the second suction electrode, so that there is a second electrostatic attraction between the first suction electrode and the second suction electrode, and the second electrostatic attraction Used to make the first suction electrode and the second suction electrode pull in.

Correspondingly, an embodiment of the present invention further provides an electronic device, including: a moved component; and the moving mechanism provided by the embodiment of the present invention.

Correspondingly, an embodiment of the present invention further provides an imaging device, comprising: the moving mechanism provided by the embodiment of the present invention; a moved part fixed on the movable platform, and the moved part is an image sensor.

beneficial effect

Compared with the prior art, the technical solution of the embodiment of the present invention has the following advantages: the moving mechanism provided by the embodiment of the present invention includes: a lateral driving electrode and a first longitudinal driving electrode located on a fixed platform; Distributed horizontal movable electrodes with preset spacing, the horizontal movable electrodes include first horizontal movable electrodes opposite to the horizontal driving electrodes; the vertical movable electrodes arranged longitudinally relative to the first vertical driving electrodes, The longitudinal movable electrode and the first longitudinal driving electrode can be electrostatically attracted, and the transverse movable electrode is connected with the longitudinal movable electrode; one end of the wire is fixed, and the other end is connected to the transverse movable electrode or the longitudinal movable electrode. Fixed electrical connection, and supports the horizontal movable electrode and the vertical movable electrode to be in a suspended state; the first suction electrode is located above the horizontal movable electrode, and the first suction electrode is connected to the first horizontal electrode through the isolation layer. The movable electrode is fixedly connected; the movable platform is used to support the moved part, the movable platform includes a second suction electrode and a movable electrode plate located on the second suction electrode, the second suction electrode is The closing electrode is arranged opposite to the first suction electrode in the longitudinal direction; in the process that the moving mechanism is used to move the moved part, when the first suction electrode and the second suction electrode are suctioned, the The first lateral movable electrode moves towards the corresponding lateral driving electrode and fits together. Since the first suction electrode is fixedly connected to the first lateral movable electrode through the isolation layer, the first lateral movable electrode drives the movable electrode accordingly. The movable platform is moved laterally by a preset distance, and then, the movable platform is fixed, the first suction electrode and the second suction electrode are separated, and the first lateral movable electrode is moved away from the corresponding lateral direction The direction of the drive electrode is moved by twice the preset distance, that is, the first pull-in electrode is moved in the opposite direction relative to the initial position by the preset distance, and then the first pull-in electrode and the second pull-in electrode are pulled in again. It is equivalent to moving the movable platform by twice the preset distance, because there is a preset distance between the lateral movable electrode and the lateral driving electrode, and the first lateral movable electrode is driven to the corresponding lateral direction by electrostatic force. Drive the electrode to move, so that the first lateral movable electrode moves in a direction away from the corresponding lateral drive electrode, so the lateral movement distance of the first lateral movable electrode can be precisely controlled, and correspondingly, the single lateral movement of the movable platform can be precisely controlled. The mobile platform can be moved with a small step size periodically and accumulated through the reciprocating operation of moving, disengaging, reversing moving and pulling in again. Therefore, the moving mechanism provided by the present invention has the advantage of large stroke.

An embodiment of the present invention further provides an imaging device, the imaging device includes the moving mechanism provided by the embodiment of the present invention and a moved part fixed on a movable platform, the moved part is an image sensor; Compared with other methods, the size of the image sensor is smaller and the weight is lower, and the optical image stabilization is realized by moving the image sensor, which is conducive to saving costs and improving the convenience and stability of the optical image stabilization. Moreover, when the moving mechanism works, it can The single moving step length of the moving platform is precisely controlled, and the moving mechanism has the advantages of large stroke, high moving accuracy, and fast speed, which is conducive to realizing precise translation of the image sensor to achieve super-resolution and improve the imaging The device is used for the effectiveness and accuracy of optical image stabilization, with a corresponding increase in image quality.

Description of drawings

FIG. 1 is a top view of the first embodiment of the moving mechanism of the present invention.

Fig. 2 is a sectional view of the first embodiment of the moving mechanism of the present invention.

FIG. 3 is a top view of the second embodiment of the moving mechanism of the present invention.

4 is a cross-sectional view of a third embodiment of the moving mechanism of the present invention.

5 is a cross-sectional view of a fourth embodiment of the moving mechanism of the present invention.

6 is a cross-sectional view of a fifth embodiment of the moving mechanism of the present invention.

7 is a cross-sectional view of a sixth embodiment of the moving mechanism of the present invention.

8 to 26 are schematic structural diagrams of the first embodiment of the method for forming a moving mechanism of the present invention.

FIG. 27 is a schematic structural diagram of the second embodiment of the method for forming a moving mechanism of the present invention.

FIG. 28 is a schematic structural diagram of the third embodiment of the method for forming a moving mechanism of the present invention.

FIG. 29 is a schematic structural diagram of a fourth embodiment of a method for forming a moving mechanism of the present invention.

FIG. 30 is a schematic diagram of an embodiment of an electronic device of the present invention.

Embodiments of the present invention

It can be known from the background art that a current optical anti-shake method is to move the lens, so that the lens can compensate for the displacement of the imaging point of the object, thereby realizing optical anti-shake. However, the size and weight of the lens are usually large, and it is increasingly difficult to achieve optical image stabilization by shifting the lens. Moreover, it is difficult for the current moving mechanism or driving mechanism to achieve translation with a large stroke and high precision.

In order to solve the technical problem, the moving mechanism provided by the embodiment of the present invention includes: a lateral driving electrode and a first longitudinal driving electrode located on a fixed platform; and lateral movable electrodes arranged laterally with respect to the lateral driving electrode and having a preset interval , the laterally movable electrode includes a first laterally movable electrode opposite to the laterally driven electrode; the longitudinally movable electrodes arranged longitudinally relative to the first longitudinally driven electrode, the longitudinally movable electrode and the first longitudinally driven electrode Electrodes can be electrostatically attracted, and the horizontal movable electrode is connected with the vertical movable electrode; the wire has one end fixed, and the other end is fixed and electrically connected with the horizontal movable electrode or the vertical movable electrode, and supports the horizontal movable electrode. The movable electrode and the vertical movable electrode can be in a suspended state; the first suction electrode is located above the horizontal movable electrode, and the first suction electrode is fixedly connected with the first horizontal movable electrode through the isolation layer; In order to support the moved part, the movable platform includes a second suction electrode and a movable plate on the second suction electrode, and the second suction electrode is longitudinally connected to the first suction electrode. Relatively arranged; in the process that the moving mechanism is used to move the moved part, in the case that the first suction electrode and the second suction electrode are sucked together, the first lateral movable electrode is made to correspond to each other. The lateral drive electrode moves and fits together. Since the first suction electrode is fixedly connected to the first lateral movable electrode through the isolation layer, the lateral movable electrode correspondingly drives the movable platform to move laterally by a preset distance, and then fixed. The movable platform disengages the first suction electrode and the second suction electrode, and moves the first lateral movable electrode twice in the direction away from the corresponding lateral drive electrode by twice the preset value. Set the spacing, that is, make the first suction electrode move in the opposite direction relative to the initial position by a preset distance, and then make the first suction electrode and the second suction electrode pull in again, which is equivalent to moving the movable platform twice. The preset spacing, because there is a preset spacing between the lateral movable electrode and the lateral driving electrode, and the first lateral movable electrode is moved to the corresponding lateral driving electrode by means of electrostatic force driving, so that the first lateral movable electrode can be moved to the corresponding lateral driving electrode. The movable electrode moves in the direction away from the corresponding lateral drive electrode, so the lateral movement distance of the first lateral movable electrode can be precisely controlled, and the single movement step size of the movable platform can be precisely controlled accordingly, thereby improving the movement The movement accuracy of the mechanism, and, through the reciprocating operations of moving, disengaging, reverse moving and re-engaging, the movable platform is periodically accumulated in small steps to achieve a large displacement. Therefore, it also makes The moving mechanism provided by the present invention has the advantage of a large stroke.

In order to make the above objects, features and advantages of the present invention more clearly understood, the specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

1 to 2, FIG. 1 is a top view of the first embodiment of the moving mechanism of the present invention, and FIG. 2 is a cross-sectional view of the first embodiment of the moving mechanism of the present invention.

Among them, for the convenience of illustration, FIG. 1 only illustrates a fixed platform, a displacement module and a movable platform, and FIG. 2 illustrates only two displacement modules.

The moving mechanism provided in the embodiment of the present invention is used to move the moved component in a direction parallel to the surface of the fixed platform 10 .

The moving mechanism includes: a fixed platform 10, the direction parallel to the surface of the fixed platform 10 is the horizontal direction, and the direction perpendicular to the surface of the fixed platform 10 is the vertical direction; the horizontal driving electrode 13 is located on the fixed platform 10; the lateral movable electrodes 19s are arranged laterally with respect to the lateral drive electrodes 13 and have a preset spacing d, the lateral movable electrodes 19s include a first lateral movable electrode opposite to the lateral drive electrodes 13 19sl; the first longitudinal driving electrode 11b, located on the fixed platform 10; the longitudinal movable electrode 19b, longitudinally arranged relative to the first longitudinal driving electrode 11b, the longitudinal movable electrode 19b and the first longitudinal driving electrode 11b can be electrostatically attracted, wherein the horizontal movable electrode 19s is connected with the vertical movable electrode 19b; the wire 23, one end of the wire 23 is fixed, and the other end is connected to the horizontal movable electrode 19s or the The vertical movable electrode 19b is fixed and electrically connected, and supports the horizontal movable electrode 19s and the vertical movable electrode 19b to be in a suspended state; the first suction electrode 22 is located above the horizontal movable electrode 19s, so the The first suction electrode 22 is fixedly connected to the first lateral movable electrode 19s1 through the isolation layer 21; the movable platform 17 is used to support the moved part, and the movable platform 17 includes the second suction electrode 17b, and a movable electrode plate 17a located on the second suction electrode 17b, the second suction electrode 17b is disposed opposite to the first suction electrode 22 in the longitudinal direction.

During the working process of the moving mechanism provided by the implementation of the present invention, in the case that the first suction electrode 22 and the second suction electrode 17b are sucked together, the first lateral movable electrode 19sl is moved to the corresponding lateral direction. The driving electrode 13 moves and attaches. Since the first suction electrode 22 is fixedly connected to the first lateral movable electrode 19s through the isolation layer 21, the first lateral movable electrode 19s correspondingly drives the movable platform 17 to move laterally. The distance d is set, and then the movable platform 17 is fixed, so that the first suction electrode 22 and the second suction electrode 17b are separated, and the first lateral movable electrode 19sl is moved back to the corresponding lateral direction. The direction of the driving electrode 13 is moved twice by the preset distance d, that is, the first suction electrode 22 is moved in the opposite direction relative to the initial position by the preset distance d, and then the first suction electrode 22 and the second suction electrode are moved. 17b is pulled in again, which is equivalent to moving the movable platform 17 by twice the preset distance d. Since there is a preset distance d between the lateral movable electrode 19s and the lateral driving electrode 13, and by loading the driving signal, the The first lateral movable electrode 19sl moves toward the corresponding lateral driving electrode 13, so that the first lateral movable electrode 19sl moves in the direction away from the corresponding lateral driving electrode 13. Therefore, this embodiment uses electrostatic force to drive the electrode 19sl. In this way, the movement and reverse movement can be carried out in such a way that the lateral movement distance of the first lateral movable electrode 19s1 can be precisely controlled, so that the single movement step length of the movable platform 17 can be precisely controlled, and the movement accuracy of the moving mechanism can be correspondingly improved. , and through the reciprocating operations of moving, disengaging, reversing movement and pulling in again, the movable platform 17 is periodically accumulated in small steps to achieve a larger displacement. Therefore, the present invention also provides The moving mechanism has the advantage of a large stroke.

Moreover, the moving mechanism can be formed by using a semiconductor process, which is conducive to realizing mass production, lower process cost and higher integration, and has lower requirements on the capability of process line width, enabling sub-micron movement step size.

The stationary platform 10 is used to provide a platform for the moving mechanism to move the moved parts.

In this embodiment, the fixed platform 10 is a substrate. In other embodiments, the fixed platform may also be other functional structures. Specifically, the substrate may be a semiconductor substrate, and the substrate may be formed by a semiconductor manufacturing process. As an example, the substrate is a silicon substrate. In other embodiments, the material of the substrate may also be other materials such as germanium, silicon germanium, silicon carbide, gallium arsenide, or indium gallium.

The lateral driving electrodes 13 are located on the fixed platform 10 , and the lateral movable electrodes 19s are laterally arranged relative to the lateral driving electrodes 13 and have a preset distance d. The opposite first lateral movable electrodes 19sl, the lateral driving electrodes 13 and the first lateral movable electrodes 19sl can be electrostatically attracted, thereby driving the corresponding first lateral movable electrodes 19sl to move laterally by a preset distance d or to move Twice the preset distance d, so that the movable platform 17 is slightly displaced.

In this embodiment, the material of the lateral driving electrodes 13 is a conductive material, so as to facilitate the application of driving signals to the lateral driving electrodes 13 . Specifically, the material of the lateral driving electrodes 13 is a semiconductor material doped with ions (eg, polysilicon doped with ions), which is compatible with semiconductor manufacturing processes, facilitates mass production and reduces process costs. In other embodiments, the material of the lateral driving electrode may also be a metal material, and the metal material includes aluminum, copper or tungsten.

In this embodiment, the material of the lateral movable electrode 19s is a conductive material, for example, a metal material or a semiconductor material doped with ions. For the description of the material of the lateral movable electrode 19s, reference may be made to the corresponding description of the lateral driving electrode 13 above, which will not be repeated here.

In this embodiment, the lateral movable electrodes 19s are electrically isolated from each other, so that the corresponding lateral movable electrodes 19s can be independently loaded with driving signals.

The preset distance d is used to control the single moving step length of the moving mechanism. Among them, the preset distance d is reasonably set according to the movement stroke of the moving mechanism and the requirements of the movement accuracy, and the smaller the preset distance d, the higher the movement accuracy.

It should be noted that the moving mechanism further includes: a second electrode pin 11c, which is located on the fixed platform 10, and the lateral driving electrode 13 is in one-to-one correspondence with the second electrode pin 11c and is connected. The lateral driving electrodes 13 are electrically connected to the second electrode pins 11c, so that driving signals are applied to the corresponding lateral driving electrodes 13 through the second electrode pins 11c.

In this embodiment, the material of the second electrode pin 11c is a conductive material. Specifically, the material of the second electrode pin 11c is a metal material, and the metal material includes aluminum, copper or tungsten. In other embodiments, the material of the second electrode pin may also be a semiconductor material doped with ions.

In this embodiment, the moving mechanism further includes: a support column 12 located on the fixed platform 10 . Correspondingly, the lateral driving electrodes 13 are fixed to the side surfaces of the support columns 12 . The support columns 12 are used to support the lateral driving electrodes 13 , thereby improving the mechanical strength and stability of the lateral driving electrodes 13 .

As an example, the support column 12 is a strip structure, the support column 12 has an extension direction, and in a direction parallel to the fixed platform 10 and perpendicular to the extension direction of the support column 12, the support column 12 has two side surfaces, Transverse driving electrodes 13 are respectively disposed on opposite sides of the same support column 12 .

Specifically, the lateral driving electrodes 13 located on the same support column 12 constitute a lateral driving electrode group 13G. As an example, the support columns 12 correspond to the lateral driving electrode groups 13G one-to-one.

Correspondingly, the support column 12 is also used to electrically isolate the lateral driving electrodes 13 located on two opposite sides thereof, so as to facilitate the application of driving signals to the lateral driving electrodes 13 located on the lateral sides thereof respectively.

In other embodiments, the support column may also be a polygonal structure, and the support column includes a plurality of side surfaces corresponding to each side of the polygon. Correspondingly, any one side surface of the support column is provided with a lateral drive electrode, or a plurality of side surfaces of the support column are respectively provided with lateral drive electrodes, so that the movable platform can be displaced in multiple lateral directions.

In this embodiment, the material of the support column 12 is a dielectric material. As an example, the material of the support column 12 is silicon nitride. Silicon nitride has better insulating properties and greater hardness, which is beneficial to improve the mechanical strength of the support column 12 . In other embodiments, the material of the support column may also be other suitable dielectric materials such as silicon oxide or silicon oxynitride. The support pillars may be formed through a semiconductor process.

In other embodiments, the support column may also include: a conductive column; and a dielectric layer covering the side surface of the support column. Correspondingly, the conductive pillars and the lateral driving electrodes are electrically isolated by the dielectric layer, so that the supporting pillars can also be used to electrically isolate the lateral driving electrodes. The material of the conductive column may be a metal material or a semiconductor material doped with ions; the material of the dielectric layer may be other suitable dielectric materials such as silicon nitride, silicon oxide or silicon oxynitride.

The first longitudinal driving electrode 11b is located on the fixed platform 10, the longitudinal movable electrode 19b is located above the first longitudinal driving electrode 11b and is longitudinally arranged relative to the first longitudinal driving electrode 11b, and the transverse movable electrode 19s It is connected with the vertical movable electrode 19b. Therefore, when the vertical movable electrode 19b moves in the longitudinal direction, the horizontal movable electrode 19s is correspondingly driven to move in the longitudinal direction, so as to make the first suction electrode 22 and the second suction electrode 22 move in the vertical direction. The electrode 17b is separated.

Specifically, in the working process of the moving mechanism, after the first suction electrode 22 drives the movable platform 17 to move the movable platform 17 in the moving direction by a preset step length, the movable platform 17 of the first suction electrode 22 needs to be disengaged, and the movable platform 17 of the first suction electrode 22 needs to be disengaged, and The first pull-in electrode 22 moves in the opposite direction relative to the initial position by a predetermined distance d. Therefore, when there is a potential difference between the longitudinal movable electrode 19b and the first longitudinal driving electrode 11b, a parallel plate capacitor is formed between the longitudinal movable electrode 19b and the first longitudinal driving electrode 11b, correspondingly, the longitudinal movable electrode 19b is electrostatically charged. Under the action of the attractive force, it moves closer to the first longitudinal driving electrode 11b, so that the first suction electrode 22 and the movable platform 17 can be separated better, thereby reducing the first suction electrode 22 during the reverse movement. The probability that a pull-in electrode 22 drives the movable platform 17 to move.

In this embodiment, the material of the first vertical driving electrode 11b is a conductive material, for example, a metal material or a semiconductor material doped with ions. For the description of the material of the first vertical driving electrode 11b, reference may be made to the corresponding description of the horizontal driving electrode 13 above, which will not be repeated here.

It should be noted that, the moving mechanism further includes: a first insulating layer (not shown) located on the top surface of the first longitudinal driving electrode 11b. The first insulating layer can insulate between the first longitudinal driving electrode 11b and the longitudinal movable electrode 19b, so that when the moving mechanism works, there is a potential between the first longitudinal driving electrode 11b and the longitudinal movable electrode 19b When the difference is poor, electrostatic attraction is generated between the first longitudinal driving electrode 11b and the longitudinal movable electrode 19b, and there is no short circuit between the first longitudinal driving electrode 11b and the longitudinal movable electrode 19b.

In this embodiment, the material of the first insulating layer is silicon nitride. In other embodiments, the material of the insulating layer may also be a suitable insulating material such as silicon oxide or silicon oxynitride.

It should also be noted that the moving mechanism further includes: a second insulating layer (not shown), located on the sidewall of the lateral driving electrode 13; or, a third insulating layer (not shown), located on the lateral movable electrode 19s facing the lateral direction The side surface of the drive electrode 13 .

Taking the second insulating layer as an example, the second insulating layer is used to achieve insulation between the lateral movable electrode 19s and the lateral driving electrode 13, so that when the moving mechanism is working, when the lateral movable electrode 19s and the lateral driving electrode 13 are between When there is a potential difference, electrostatic attraction is generated between the lateral movable electrode 19s and the lateral driving electrode 13 , and there is no short circuit between the lateral movable electrode 19s and the lateral driving electrode 13 . Similarly, the third insulating layer is also used to achieve insulation between the lateral movable electrodes 19s and the lateral driving electrodes 13 .

The materials of the second insulating layer and the third insulating layer are dielectric materials. In this embodiment, the materials of the second insulating layer and the third insulating layer are silicon nitride. In other embodiments, the materials of the second insulating layer and the third insulating layer may also be other suitable dielectric materials such as silicon oxide and silicon oxynitride.

The wires 23 are used to support the horizontal movable electrode 19s and the vertical movable electrode 19b to be in a suspended state, so that the horizontal movable electrode 19s and the vertical movable electrode 19b can move. Moreover, one end of the wire 23 is fixed, and the other end is fixed and electrically connected to the horizontal movable electrode 19s or the vertical movable electrode 19b, so that both the horizontal movable electrode 19s and the vertical movable electrode 19b can move and return position, and can also apply a drive signal to the lateral movable electrode 19s or the longitudinal movable electrode 19b through the wire 23 . In addition, the wire 23 has elasticity, and the wire 23 can undergo both tensile deformation and compressive deformation, so that the lateral movable electrode 19s or the longitudinal movable electrode 19b can achieve movable performance.

The wire 23 has a certain width, so that the wire 23 has a certain mechanical strength, so as to support the lateral movable electrode 19s or the longitudinal movable electrode 19b.

The wire 23 is made of conductive material. In this embodiment, the wire 23 is made of a metal material or a semiconductor material doped with ions, and the metal material includes aluminum, copper or tungsten. The wires 23 are formed by using a semiconductor process, and the wires 23 made of the above-mentioned materials are relatively hard, so that the wires 23 have a certain mechanical strength.

In this embodiment, the wire 23 is a spring wire, so it has stretchability. Specifically, the wire 23 is a Z-shaped spring wire. In other embodiments, the wires can also be M-shaped spring wires or U-shaped spring wires.

In this embodiment, the first pull-in electrode 22 is fixedly connected to the first lateral movable electrode 19sl through the isolation layer 21, so as to realize the physical connection between the first pull-in electrode 22 and the first lateral movable electrode 19sl, Correspondingly, when the first lateral movable electrode 19sl moves, the first suction electrode 22 can be driven to move; at the same time, the first suction electrode 22 and the first lateral movable electrode 19sl are electrically isolated, thereby achieving electrical isolation. The first pull-in electrode 22 and the first lateral movable electrode 19s1 can be loaded with driving signals respectively, so as to ensure the normal operation of the moving mechanism.

For example, after the first lateral movable electrode 19s1 is moved and attached to the corresponding lateral driving electrode 13, and the first suction electrode 22 drives the movable platform 17 to move a single step in the moving direction, it is necessary to The moving platform 17 is separated from the first suction electrode 22, and the first lateral movable electrode 19s1 is moved back to the corresponding lateral drive electrode 13 by twice the preset distance d, so that the first suction electrode 19s1 is moved backward by twice the preset distance d. The combined electrode 22 realizes the reverse movement. Therefore, by electrically isolating the first suction electrode 22 from the first lateral movable electrode 19s1, the first suction electrode 22 can be moved in the opposite direction while the movable platform 17 is separated from the first suction electrode 22. . For example, when a driving signal is applied to the first lateral movable electrode 19s1, the first pull-in electrode 22 may be in a floating state.

Wherein, the first suction electrode 22 and the second suction electrode 17b in the movable platform 17 can be electrostatically attracted. Therefore, the movement of the first lateral movable electrode 19sl drives the first suction electrode 22 to move. , thereby driving the movable platform 17 to move. Moreover, by making the first suction electrode 22 and the second suction electrode 17b pull in, so that the first suction electrode 22 and the second suction electrode 17b can realize electrostatic locking, correspondingly, it can be improved or avoided in non-working In this state, the movable platform 17 has the problem of indefinite wandering, so as to further precisely control the displacement of the moved parts. In addition, the first suction electrode 22 and the second suction electrode 17b can be separated, so that the first suction electrode 22 can move in the opposite direction.

Specifically, along the lateral direction, both ends of the first pull-in electrode 22 are fixedly connected to the first lateral movable electrode 19s1 through the isolation layer 21, respectively. That is to say, the first lateral movable electrodes 19s1 corresponding to the lateral driving electrode group 13G are fixedly connected to the same first suction electrode 22 .

Both ends of the first suction electrode 22 are fixedly connected to the first lateral movable electrode 19sl through the isolation layer 21, respectively, during the operation of the moving mechanism, the first lateral movable electrode 19sl The maximum lateral movement distance of is twice the preset distance d, which facilitates further precise control of the single movement step length of the movable platform 17 .

For example, the first lateral movable electrode 19s1 fixedly connected to one end of the first suction electrode 22 is moved and attached to the corresponding lateral driving electrode 13 to drive the movable platform 17 to move laterally, and then the The movable platform 17 disengages the first suction electrode 22 and the second suction electrode 17b, and makes the first lateral movable electrode 19s1 fixedly connected with the other end of the first suction electrode 22 to the corresponding direction. The lateral drive electrode 13 moves and fits, so that the first suction electrode 22 is moved in the opposite direction relative to the initial position by a preset distance d, and then the first suction electrode 22 and the second suction electrode 17b are pulled together again, which is equivalent to As a result, the movable platform 17 is moved by twice the preset distance d.

In this embodiment, the material of the first suction electrode 22 is a conductive material. The conductive material may be a metal material or a semiconductor material doped with ions, and the metal material includes aluminum, copper or tungsten.

In this embodiment, the laterally movable electrode 19s further includes: a second laterally movable electrode 19sr, wherein the first pull-in electrode 22 is electrically connected to the second laterally movable electrode 19sr, so as to pass through the second laterally movable electrode 19sr. The movable electrode 19sr applies a driving signal to the first pull-in electrode 22 .

As an example, in a direction perpendicular to the arrangement direction of the first lateral movable electrodes 19sl and the lateral driving electrodes 13 , the second lateral movable electrodes 19sr are located on one side of the lateral driving electrodes 13 .

Specifically, parallel to the fixed platform 10 and along the extending direction of the support column 12 , the support column 12 has two end surfaces (not shown), and the second lateral movable electrode 19sr is disposed opposite at least one end surface of the support column 12 .

In this embodiment, the second lateral movable electrode 19sr and the first lateral movable electrode 19sl have the same structure and the same material. For the description of the material of the second lateral movable electrode 19sr, reference may be made to the corresponding description of the first lateral movable electrode 19sl, which is not repeated here.

In this embodiment, one end of the horizontal movable electrode 19s is connected to the vertical movable electrode 19b, and the other end is connected to the first suction electrode 22, so as to realize the connection between the vertical movable electrode 19b, the horizontal movable electrode 19s and the first suction electrode 22. In conjunction, the vertical movable electrode 19b, the horizontal movable electrode 19s and the first suction electrode 22 form a movable electrode (not shown). Specifically, the movable electrodes are in one-to-one correspondence with the lateral driving electrode groups 13G, so that the lateral driving electrode groups 13G are located in the space surrounded by the movable electrodes.

In this embodiment, along the arrangement direction of the first lateral movable electrode 19sl and the lateral driving electrode 13, the first suction electrode 22 is suspended and extended to both sides of the first lateral movable electrode 19sl to all the on the fixed platform 10 to increase the contact area between the first suction electrode 22 and the second suction electrode 17b, thereby enhancing the electrostatic attraction between the first suction electrode 22 and the second suction electrode 17b Therefore, the electrostatic locking ability (ie, the fixing ability) of the first suction electrode 22 to the movable platform 17 is improved.

In other embodiments, along the arrangement direction of the first lateral movable electrode and the lateral driving electrode, the end surface of the first suction electrode may also be flush with the side surface of the first lateral movable electrode facing away from the support column.

The movable platform 17 is used to support the moved part, so that when the movable platform 17 moves, it can drive the moved part to move, so that the moved part is displaced. In this embodiment, the movable platform 17 refers to a movable platform.

The movable platform 17 includes a second suction electrode 17b and a movable electrode plate 17a located on the second suction electrode 17b. The second suction electrode 17b is arranged opposite to the first suction electrode 22 in the longitudinal direction. , the second suction electrode 17b and the first suction electrode 22 can be separated or electrostatically attracted.

When the moving mechanism works, the first suction electrode 22 drives the second suction electrode 17b to move, thereby driving the movable electrode plate 17a to move. Among them, the moving mechanism of this embodiment has a higher tolerance to stress and deformation, which is different from using a first engaging part with a first engaging part to replace the first suction electrode, and using a second engaging part with a second engaging part to replace the second engaging part. Compared with the solution of attracting electrodes, this embodiment can avoid the problem of mechanical jamming due to meshing.

The material of the second pull-in electrode 17b is a conductive material. In this embodiment, the material of the second pull-in electrode 17b is a metal material, and the metal material includes aluminum, copper or tungsten. In other embodiments, the material of the second pull-in electrode may also be a semiconductor material doped with ions.

It should also be noted that the moving mechanism further includes: a fourth insulating layer (not shown), located on the surface of the first suction electrode 22 facing the second suction electrode 17b; or, a fifth insulating layer (not shown), It is located on the surface of the second suction electrode 17b facing the first suction electrode 22 .

Taking the fourth insulating layer as an example, the fourth insulating layer is used to realize the insulation between the first suction electrode 22 and the second suction electrode 17b, so that when the moving mechanism works, when the first suction electrode 22 and the second suction electrode 22 When there is a potential difference between the pull-in electrodes 17b, electrostatic attraction is generated between the first pull-in electrode 22 and the second pull-in electrode 17b, and there is no short circuit between the first pull-in electrode 22 and the second pull-in electrode 17b . Similarly, the fifth insulating layer is also used to achieve insulation between the first pull-in electrode 22 and the second pull-in electrode 17b.

The materials of the fourth insulating layer and the fifth insulating layer are dielectric materials. In this embodiment, the material of the fourth insulating layer and the fifth insulating layer may be silicon nitride. In other embodiments, the materials of the fourth insulating layer and the fifth insulating layer may also be other suitable dielectric materials such as silicon oxide and silicon oxynitride.

In this embodiment, the moving mechanism further includes: a fixed electrode 24 located on the fixed platform 10 ; the wire 23 is connected to the fixed electrode 24 .

The fixed electrode 24 is used to fix one end of the lead wire 23, and is also used to achieve electrical connection with the lateral movable electrode 19s and the longitudinal movable electrode 19b, so that the lateral movable electrode 19s and the longitudinal movable electrode 19b are loaded and driven through the fixed electrode 24 Signal.

In this embodiment, the fixed electrodes 24 are in one-to-one correspondence with the wires 23 . The material of the fixed electrode 24 is a conductive material. Specifically, the material of the fixed electrode 24 is a metal material or a semiconductor material doped with ions, and the metal material includes aluminum, copper or tungsten.

In this embodiment, the moving mechanism further includes: the first electrode pins 11a located on the fixed platform 10, and the fixed electrodes 24 correspond to and are connected to the first electrode pins 11a one-to-one. The fixed electrode 24 is electrically connected to the first electrode pin 11a, so that a driving signal is applied to the fixed electrode 24 through the first electrode pin 11a.

In this embodiment, the material of the first electrode pin 11a is a conductive material. Specifically, the material of the first electrode pin 11a is a metal material, and the metal material includes aluminum, copper or tungsten. In other embodiments, the material of the first electrode pin may also be a semiconductor material doped with ions.

In this embodiment, the horizontal movable electrode 19s, the vertical movable electrode 19b, the wire 23 and the fixed electrode 24 are integrated into a single structure, thereby improving the connection strength and mechanical strength. Moreover, during the formation process of the moving mechanism, the same process can be used. The horizontal movable electrode 19s, the vertical movable electrode 19b, the conducting wire 23 and the fixed electrode 24 are simultaneously formed in the process, which correspondingly reduces the process complexity of forming the moving mechanism. In other embodiments, the lateral movable electrodes, the longitudinal movable electrodes, the wires and the fixed electrodes may not be of an integral structure.

In this embodiment, the moving mechanism includes a plurality of isolated displacement modules 20. The displacement module 20 includes a lateral driving electrode 13, a lateral movable electrode 19s, a first longitudinal driving electrode 11b, a longitudinal movable electrode 19b, and a wire 23. The moving mechanism A plurality of displacement modules 20 are arranged in an array on the fixed platform 10 . Specifically, the displacement module 20 further includes a fixed electrode 24 and a first suction electrode 22 .

The displacement module 20 is used to drive the movable platform 17 to translate in the lateral direction. The plurality of displacement modules 20 in the moving mechanism are arranged in an array on the fixed platform 10 so that the moving mechanism can translate the moved parts in different directions, thereby improving the flexibility of the moving mechanism. For example, some displacement modules 20 are used to drive the movable platform 17 to displace along the first transverse direction, and the remaining displacement modules 20 are used to drive the movable platform 17 to displace along the second transverse direction, the first transverse direction being perpendicular to the second transverse direction. In other embodiments, according to the usage requirements of the moving mechanism, the plurality of displacement modules may also be arranged in other types on the fixed platform.

As an example, the relative directions of the lateral driving electrodes 13 and the first lateral movable electrodes 19s1 in the plurality of displacement modules 20 are the same, so that the movable platform 17 can move in a one-dimensional plane.

In other embodiments, the opposite directions of the lateral driving electrodes and the first lateral movable electrodes in the plurality of displacement modules are perpendicular to each other. Specifically, part of the displacement modules are used to drive the movable platform to displace along the first transverse direction, and the remaining displacement modules are used to drive the movable platform to displace along the second transverse direction. The first transverse direction is perpendicular to the second transverse direction. Correspondingly, part of The relative direction of the lateral driving electrode and the first lateral movable electrode in the displacement module is the same as the first lateral direction, and the relative direction of the lateral driving electrode and the first lateral movable electrode in the remaining displacement modules is the same as the second lateral direction.

As an example, in the lateral driving electrode group 13G, one lateral driving electrode 13 is the first lateral driving electrode 13a, the lateral driving electrode 13 on the other side is the second lateral driving electrode 13b, and the first lateral driving electrode 13a is used for The corresponding first lateral movable electrode 19sl is driven to be displaced along the first translation direction (X1 direction in FIG. 2 ), and the second lateral driving electrode 13b is used to drive the corresponding first lateral movable electrode 19sl to move along the second translation direction. The direction (shown in the X2 direction in FIG. 2 ) is displaced, and the first translation direction is opposite to the second translation direction, thereby driving the movable platform 17 to move left and right along the first translation direction and the second translation direction.

In this embodiment, the moving mechanism further includes: a locking shaft 33 located at the top of the at least one first suction electrode 22; The slot 18 and the locking shaft 33 can be separated or engaged with each other.

Wherein, the displacement module 20 with the locking shaft 33 is used as the locking module 30 . That is, the locking module 30 not only includes various components in the displacement module 20 , but also includes the locking shaft 33 . Therefore, the process of preparing the locking module 30 is compatible with the process of preparing the displacement module 20, and the process is simple.

When the moving mechanism is not working, the movable platform 17 is in the original position. At this time, the locking shaft 33 and the locking slot 18 are on the same vertical plane, so that the locking slot 18 and the locking shaft 33 can be engaged by the way , to achieve physical locking of the movable platform 17 to ensure a firm locking position, thereby improving or avoiding the problem of indeterminate wandering of the movable platform 17 under non-working conditions, thereby further accurately controlling the position of the moved parts.

Moreover, in the locking module 30, the distance between the lateral movable electrode 19s1 and the corresponding lateral driving electrode 13 can be adjusted by means of electrostatic attraction or electrostatic repulsion, and the first suction electrode 22 can be translated according to the actual situation, so as to realize the locking Alignment of slot 18 with locking shaft 33 .

When the moving mechanism works, the longitudinal movable electrode 19b under the locking shaft 33 and the first longitudinal driving electrode 11b are attracted together under the action of electrostatic attraction, so that the locking slot 18 is separated from the locking shaft 33, and further The movable platform 17 is enabled to move laterally.

In this embodiment, the material of the locking shaft 33 is a dielectric material. The locking module 30 is used to achieve physical locking with the movable platform 17 . Therefore, even if the material of the locking shaft 33 is a medium material, the movable platform 17 and the locking module 30 can be locked. Specifically, the material of the locking shaft 33 may be a suitable dielectric material such as silicon nitride, silicon oxide or silicon oxynitride. In other embodiments, the material of the locking shaft can also be a conductive material, so that not only physical locking can be achieved, but also electrostatic suction can be achieved through the second suction electrode and the locking shaft, so that the movable platform and the locking shaft can be locked. The shaft realizes electrostatic locking. The conductive material may be a metal material or a semiconductor material doped with ions.

In this embodiment, the moving mechanism further includes: a surrounding wall structure 16 located on the fixed platform 10 , the surrounding wall structure 16 encloses a cavity 14 , and the lateral movable electrode 19s and the movable platform 17 are located in the cavity 14 .

The surrounding wall structure 16 is used to limit the movable range of the movable platform 17 in the lateral direction, and the surrounding wall structure 16 is also used to protect the lateral movable electrode 19s and the movable platform 17, preventing the lateral movable electrode 19s. And the movable platform 17 is affected by the external environment.

In this embodiment, the surrounding wall structure 16 and the second suction electrode 17b are provided with flexible wires 32 . The flexible wire 32 is used to realize the electrical connection between the second suction electrode 17b and the external circuit, so that when the moving mechanism works, a driving signal can be loaded on the second suction electrode 17b. Specifically, the flexible wire 32 is electrically connected to the external circuit through the surrounding wall structure 16 .

Specifically, an electrode pin (not shown) may be provided on the surrounding wall structure 16, one end of the flexible wire 32 is connected to the electrode pin, and the other end is connected to the second suction electrode 17b. The electrode pins are used to realize the electrical connection between the second pull-in electrode 17b and the external circuit.

In this embodiment, the flexible wire 32 is a spring wire, so that the second suction electrode 17b and the surrounding wall structure 16 are connected flexibly, so that the second suction electrode 17b can move smoothly through the flexible wire 32 . Specifically, the flexible wire 32 may be a zigzag spring wire.

In this embodiment, the moving mechanism further includes: a top limiting structure 15 , which is located at one end of the surrounding wall structure 16 away from the fixed platform 10 , and extends suspended to a part of the movable platform 17 . The top limiting structure 15 is used to limit the movable range of the movable platform 17 in the longitudinal direction.

Referring to Figure 3, there is shown a top view of a second embodiment of the movement mechanism of the present invention. Wherein, for the convenience of illustration, FIG. 3 only illustrates the fixed platform, the displacement module and the movable platform.

The similarities between the embodiments of the present invention and the foregoing embodiments will not be repeated here. The differences between the embodiments of the present invention and the foregoing embodiments are that the lateral driving electrodes (not shown) in the plurality of displacement modules 60 are the same as those of the first embodiment. The opposite directions of the laterally movable electrodes (not shown) are perpendicular to each other.

In this embodiment, the moving mechanism includes a plurality of isolated displacement modules 60 , and the plurality of displacement modules 60 are arranged in an array on the fixed platform 64 . Among them, part of the displacement modules 60 are used to drive the movable platform 63 to move along the first transverse direction (as shown in the X direction in FIG. 3 ), and the remaining displacement modules 60 are used to drive the movable platform 63 to move along the second transverse direction (as shown in FIG. 3 ). The displacement occurs in the Y direction in the middle), and the first lateral direction is perpendicular to the second lateral direction. Correspondingly, the relative direction of the lateral driving electrode and the first lateral movable electrode in part of the displacement module 60 is the same as the first lateral direction, The opposite directions of the lateral driving electrodes and the first lateral movable electrodes in the remaining displacement module 60 are the same as the second lateral directions.

Through the above arrangement of the displacement modules 60, the movable platform 63 in the moving mechanism can move along the first lateral direction and the second lateral direction, and the movable platform 63 can be controlled to move along the first lateral direction. The number of moves, and the number of moves along the second lateral direction, so that the movable platform can achieve displacement in a two-dimensional plane.

For example, the displacement module 60 includes a first displacement module 61 and a second displacement module 62 . In the first displacement module 61 , the opposite direction of the lateral driving electrode and the first lateral movable electrode is the first lateral direction, and in the second displacement module 62 Among them, the opposite direction of the lateral driving electrodes and the first lateral movable electrodes is the second lateral direction.

For the specific description of the moving mechanism in this embodiment, reference may be made to the corresponding descriptions in the foregoing embodiments, which will not be repeated in this embodiment.

Referring to Figure 4, there is shown a cross-sectional view of a third embodiment of the movement mechanism of the present invention.

The similarities between the embodiments of the present invention and the foregoing embodiments will not be repeated here. The difference between the embodiments of the present invention and the foregoing embodiments is that the moving mechanism further includes: a second longitudinal driving electrode 44 located on the top of the support column 45 . On the surface, the second vertical driving electrodes 44 are separated from the horizontal driving electrodes (not shown), and the second vertical driving electrodes 44 and the first attracting electrodes 41 can be electrostatically attracted.

Wherein, the second vertical driving electrodes 44 are isolated from the horizontal driving electrodes, so that driving signals can be applied to the second vertical driving electrodes 44 and the horizontal driving electrodes respectively.

During the working process of the moving mechanism, when the first suction electrode 41 drives the movable platform (not shown) to move a single step in the moving direction, the movable platform 45 is fixed, so that the first suction electrode 41 and the movable platform 45 are moved. The second pull-in electrode in the platform is disengaged, and the first pull-in electrode 41 is moved reversely by a preset distance relative to the initial position. Therefore, when there is a potential difference between the first pull-in electrode 41 and the second longitudinal driving electrode 44, a parallel plate capacitor will also be formed between the first pull-in electrode 41 and the second longitudinal driving electrode 44, correspondingly making the first pull-in electrode 41 and the second longitudinal driving electrode 44 a parallel plate capacitor. The closing electrodes 41 are brought closer to the second longitudinal driving electrodes 44 under the action of electrostatic attraction.

Therefore, by arranging the second longitudinal driving electrode 44 on the top surface of the support column 45, the pull-down capability and efficiency of the first suction electrode 41 can be improved, so that the second suction electrode and the first suction electrode can be driven faster. 41 Separation.

Similarly, when the moving mechanism is working, the locking module (not shown) is in a pull-down state, so as to be unlocked with the movable platform, thereby enabling the movable platform to move laterally. Therefore, by arranging the second longitudinal driving electrode 44 on the top surface of the support column 45, the pull-down capability and efficiency of the first suction electrode 41 in the locking module can also be improved, so that the movable platform and the lock can be realized more quickly. Unlock the bit module.

In this embodiment, the material of the second vertical driving electrode 44 is a conductive material, for example, a metal material or a semiconductor material doped with ions. For the description of the material of the second longitudinal driving electrode 44 , reference may be made to the corresponding description of the lateral driving electrode in the foregoing embodiments, which will not be repeated here.

Correspondingly, in this embodiment, the second insulating layer (not shown) is also located on top of the second longitudinal driving electrodes 44 .

It should be noted that, for the convenience of illustration, the second lateral movable electrode is not shown in FIG. 4 .

Referring to Figure 5, there is shown a cross-sectional view of a fourth embodiment of the movement mechanism of the present invention. For convenience of illustration, FIG. 5 only shows a cross-sectional view of one displacement module.

The similarities between the embodiments of the present invention and the foregoing embodiments will not be repeated here. The difference between the embodiments of the present invention and the foregoing embodiments is that along the height direction of the support column 51 , the support column 51 includes a plurality of stacked sub-supports column (not labeled).

In the semiconductor process, each sub-support column has a maximum height acceptable to the process. Therefore, by setting the number of sub-support columns, the total height of the support column 51 can be adjusted, so as to increase the height of the support column 51 on the basis of the achievable process. The total height of the support column 51 increases the side surface area of the support column 51 accordingly, thereby increasing the side wall surface area of the lateral driving electrode 52, thereby increasing the distance between the lateral driving electrode 52 and the corresponding first lateral movable electrode 53. The electrostatic attraction force between them increases correspondingly the electrostatic driving force of the moving mechanism during translation and improves the moving speed.

As an example, the support column 51 includes two stacked sub-support columns, respectively a first sub-support column 51b and a second sub-support column 51t located on top of the first sub-support column 51b. In other embodiments, according to actual requirements, the number of sub-support columns may also be three, or more than three.

Referring to Figure 6, there is shown a cross-sectional view of a fifth embodiment of the movement mechanism of the present invention. For convenience of illustration, FIG. 6 only shows a cross-sectional view of one displacement module.

The similarities between the embodiments of the present invention and the foregoing embodiments will not be repeated here. The difference between the embodiments of the present invention and the foregoing embodiments is that the support column 61 includes: a first sub-support column 61a, and a first sub-support column 61a suspended in the first The second sub-support column 61b above the sub-support column 61a, the second sub-support column 61b is located on both sides of the first sub-support column 61a; The bottom surface 62 of the second sub-support column 61b located on the same side of the first sub-support column 61a is connected to the lateral driving electrode 63 located on the side of the second sub-support column 61b facing away from the other second sub-support column 61b.

As an example, the lateral driving electrodes 63 located on the sidewalls of the same side of the first sub-support column 61a and the second sub-support column 61b are the first lateral driving electrodes 63R, located on the first sub-support column 61a and the second sub-support column 61b. The lateral drive electrode 63 on the other side wall of the support column 61b is the second lateral drive electrode 3L.

In the semiconductor process, each sub-support column has a maximum height acceptable to the process. Therefore, through the first sub-support column 61a and the second sub-support column 61b, on the basis of the process achievable, a lateral driving electrode 63 is added The surface area of the sidewall is increased, thereby increasing the electrostatic attraction force between the transverse driving electrode 63 and the corresponding first transverse movable electrode 64, correspondingly increasing the electrostatic driving force of the moving mechanism when moving, and increasing the moving speed.

In this embodiment, the second sub-support pillars 61b include an inner side surface (not shown) and an outer side surface (not shown) opposite to the inner side surface, and the inner side surfaces of the two second sub-support pillars 61b are disposed opposite to each other. The lateral drive electrodes 63 located on the inner side are isolated from the lateral drive electrodes 63 located on the outer side, and the lateral drive electrodes 63 located on the inner side are isolated from the lateral drive electrodes 63 located on the bottom surface 62, so that the same second sub-support column can be aligned. The lateral drive electrodes 63 on opposite sides of 61b are loaded with drive signals, respectively.

Referring to Figure 7, there is shown a cross-sectional view of a sixth embodiment of the movement mechanism of the present invention.

The similarities between the embodiments of the present invention and the foregoing embodiments will not be repeated here. The difference between the embodiments of the present invention and the foregoing embodiments is that a third longitudinal driving electrode 70 a is suspended and fixed above the movable platform 72 , and the third longitudinal The driving electrode 70a faces the movable platform 72; the movable platform 72 further includes a third suction electrode 72b fixed on the movable pole plate 72a, and the third suction electrode 72b and the third longitudinal driving electrode 70a can be separated and pulled together.

After the lateral movable electrode (not shown) drives the movable platform 72 to move laterally by a single step, the third pull-in electrode 72b and the third longitudinal drive electrode 70a are pulled in, thereby fixing the movable platform through the third longitudinal drive electrode 70a. 72. In this case, the lateral movable electrodes and the longitudinal movable electrodes (not shown) are pulled down synchronously, so that all the first suction electrodes are separated from the second suction electrodes, so that all the first suction electrodes are relatively The position is moved in the reverse direction by a preset distance, thereby improving the efficiency of eliminating electrostatic locking and re-electrostatic attraction.

Specifically, when the moving mechanism works, when there is a potential difference between the third suction electrode 72b and the third longitudinal driving electrode 70a, the third suction electrode 72b and the third longitudinal driving electrode 70a can electrostatically attract.

In this embodiment, the third longitudinal driving electrode 70 a is located on the surface of the top limiting structure 70 b facing the movable platform 72 .

The material of the third pull-in electrode 72b is a conductive material. In this embodiment, the material of the third suction electrode 72b is a metal material, and the metal material includes aluminum, copper or tungsten. In other embodiments, the material of the third pull-in electrode may also be a semiconductor material doped with ions.

In this embodiment, the third longitudinal driving electrode 70a is also made of conductive material. Specifically, the material of the third longitudinal driving electrode 70a is a metal material or a semiconductor material doped with ions.

It should be noted that the moving mechanism further includes: a sixth insulating layer (not shown), located on the top surface of the third suction electrode 72b; or, a seventh insulating layer (not shown), located on the third longitudinal driving electrode 70a toward the surface of the third pull-in electrode 72b.

Taking the sixth insulating layer as an example, the sixth insulating layer is used to realize the insulation between the third pull-in electrode 72b and the third longitudinal driving electrode 70a, so that when the moving mechanism works, when the third pull-in electrode 72b and the third pull-in electrode 72b and the third pull-in electrode When there is a potential difference between the vertical drive electrodes 70a, electrostatic attraction is generated between the third pull-in electrode 72b and the third vertical drive electrode 70a, and there is no short circuit between the third pull-in electrode 72b and the third vertical drive electrode 70a . Similarly, the seventh insulating layer is also used to achieve insulation between the third pull-in electrode 72b and the third longitudinal driving electrode 70a.

The materials of the sixth insulating layer and the seventh insulating layer are dielectric materials. In this embodiment, the material of the sixth insulating layer and the seventh insulating layer may be silicon nitride. In other embodiments, the materials of the sixth insulating layer and the seventh insulating layer may also be other suitable dielectric materials such as silicon oxide and silicon oxynitride.

Correspondingly, an embodiment of the present invention also provides a method for forming a moving mechanism.

8, a fixed platform 100 is provided, including a work area 100a, a direction parallel to the surface of the fixed platform 100 is a transverse direction, and a direction perpendicular to the surface of the fixed platform 100 is a longitudinal direction.

The forming method is used to form a moving mechanism, and the work area 100a is a movable area of the moving mechanism.

The stationary platform 100 is used to provide a process platform for the formation of the mobile mechanism.

In this embodiment, the fixed platform 100 is a substrate. In other embodiments, the fixed platform may also be other functional structures. Specifically, the substrate may be a semiconductor substrate, and the substrate may be formed by a semiconductor manufacturing process. As an example, the substrate is a silicon substrate. In other embodiments, the material of the substrate may also be other materials such as germanium, silicon germanium, silicon carbide, gallium arsenide or indium gallium.

In this embodiment, the fixed platform 100 further includes a limiting area 100b surrounding the working area 100a.

Subsequently, a surrounding wall structure is formed in the limiting area 100 b of the fixed platform 100 , and the surrounding wall structure is used to limit the movable range of the movable platform along the direction parallel to the surface of the fixed platform 100 during the operation of the moving mechanism.

It should be noted that, for the convenience of illustration, this embodiment only shows part of the working area 100a and part of the limiting area 100b.

Referring to FIG. 8 and FIG. 9 , first longitudinal driving electrodes 111 and an insulating layer 120 (as shown in FIG. 9 ) covering the first longitudinal driving electrodes 111 are formed on the fixed platform 100 of the working area 100 a.

Subsequently, a longitudinal movable electrode will be formed above the first longitudinal driving electrode 111 , and the first longitudinal driving electrode 111 and the longitudinal movable electrode can be electrostatically attracted, so that the longitudinal movable electrode can be pulled down by the first longitudinal driving electrode 111 . moving electrode.

During the operation of the moving mechanism, the insulating layer 120 can insulate between the first longitudinal driving electrode 111 and the longitudinal movable electrode, so that when the moving mechanism works, when the first longitudinal driving electrode 111 and the longitudinal movable electrode are When there is a potential difference between the electrodes, electrostatic attraction is generated between the first longitudinal driving electrode 111 and the longitudinal movable electrode, and there is no short circuit between the first longitudinal driving electrode 111 and the longitudinal movable electrode. Moreover, in the subsequent etching process, the insulating layer 120 can protect the first vertical driving electrode 111 .

In this embodiment, the material of the insulating layer 120 is silicon nitride. In other embodiments, the material of the insulating layer may also be a suitable insulating material such as silicon oxide or silicon oxynitride.

In this embodiment, the steps of forming the first vertical driving electrode 111 and the insulating layer 120 covering the first vertical driving electrode 111 include: as shown in FIG. 8 , forming a first sub-insulating layer 121 on the fixed platform 100 ; An electrode opening 124 exposing the fixed platform 100 is formed in the sub-insulating layer 121; as shown in FIG. 9, a first vertical driving electrode 111 is formed in the electrode opening 124; The second sub-insulating layer 122 , the second sub-insulating layer 122 and the first sub-insulating layer 121 are used to constitute the insulating layer 120 .

Specifically, the first longitudinal driving electrodes 111 are formed in the electrode openings 124 using a deposition process and a planarization process (eg, a chemical mechanical polishing process) in sequence.

In other embodiments, an insulating layer covering the first vertical driving electrodes may also be formed after the first vertical driving electrodes are formed on the fixed platform. Correspondingly, the step of forming the first vertical driving electrode includes: forming a vertical electrode material layer covering the fixed platform; and performing a patterning process (eg, etching process) on the vertical electrode material layer to form the first vertical driving electrode.

In this embodiment, the material of the first longitudinal driving electrode 111 is a conductive material. Specifically, the material of the first longitudinal driving electrode 111 is a metal material, including aluminum, copper or tungsten. In other embodiments, the material of the first vertical driving electrode may also be a semiconductor material doped with ions.

In this embodiment, in the step of forming the first vertical driving electrodes 111, the first electrode pins 113 and the second electrode pins 112 are also formed on the fixed platform 100 of the working area 100a. Specifically, the first electrode lead 113 and the second electrode lead 112 are formed in the electrode opening 124 .

The first electrode pins 113 are used for one-to-one correspondence and connection with the subsequently formed fixed electrodes. The fixed electrodes are electrically connected to the first electrode pins 113 , so that driving signals are applied to the fixed electrodes through the first electrode pins 113 .

The second electrode pins 112 are used for one-to-one correspondence and connection with the lateral driving electrodes formed subsequently. The lateral driving electrodes are electrically connected to the second electrode pins 112 , so that driving signals are applied to the corresponding lateral driving electrodes through the second electrode pins 112 .

It should be noted that the first longitudinal driving electrodes 111 , the first electrode pins 113 and the second electrode pins 112 are isolated from each other, so as to avoid the first longitudinal driving electrodes 111 , the first electrode pins 113 and the second electrode pins 112 . The pins 112 are short-circuited to each other, thereby ensuring that the displacement module can work normally.

It should also be noted that the fixed platform 100 further includes a limiting area 100b, therefore, the insulating layer 120 covers the fixing platform 100 in the limiting area 100b.

Continuing to refer to FIG. 9 , after the insulating layer 120 is formed, the forming method further includes: forming an interconnection opening 123 in the insulating layer 120 , and the second electrode pin 112 is exposed at the bottom of the interconnection opening 123 .

Subsequently, a support column isolated from the first vertical drive electrode 111 will be formed on the fixed platform 100 of the working area 100a, and a lateral drive electrode will be formed on the side of the support column. When driving the electrodes, the lateral driving electrodes can be formed in the interconnection openings 123 and connected with the second electrode pins 112 . Moreover, by forming the interconnection openings 123 before forming the support pillars, it is beneficial to reduce the difficulty of the photolithography process when forming the interconnection openings 123 .

In this embodiment, the insulating layer 120 is etched by using a dry etching process (eg, an anisotropic dry etching process). The dry etching process has the characteristics of anisotropic etching, which is beneficial to improve the topography quality of the sidewalls of the interconnection openings 123 and the dimensional accuracy in the direction parallel to the surface of the fixed platform 100 .

Referring to FIG. 10 , a support column 130 is formed on the fixed platform 100 , and the support column 130 of the working area 100 a is isolated from the first longitudinal driving electrode 111 .

Later, lateral driving electrodes are formed on the side surfaces of the support columns 130, and the supporting columns 130 are used to support the lateral driving electrodes, thereby improving the mechanical strength and stability of the lateral driving electrodes.

As an example, the support column 130 is a strip-shaped structure, and the support column 130 has an extension direction. Along the extension direction of the support column 130 , the support column 130 has two opposite end faces, which are perpendicular to the extension direction of the support column 130 . Directionally, the support column 130 has two opposite sides.

Correspondingly, the support column 130 is also used to electrically isolate the lateral driving electrodes located on the side thereof, so as to facilitate the application of driving signals to the lateral driving electrodes located on the side thereof respectively.

In this embodiment, the material of the support column 130 is a dielectric material. As an example, the material of the support pillar 130 is silicon nitride. In other embodiments, the material of the support column may also be other suitable dielectric materials such as silicon oxide or silicon oxynitride. Specifically, the support pillars 130 are formed by sequentially performing a deposition process and an etching process.

In other embodiments, the step of forming the support column includes: forming a conductive column on the insulating layer on the side of the first vertical driving electrode by using a deposition process and an etching process in sequence; forming a conformal covering the conductive column and the insulating layer Dielectric film; the dielectric film is etched by anisotropic etching process, and the remaining dielectric film on the side of the conductive column is reserved as the dielectric layer. Correspondingly, electrical isolation is achieved between the conductive pillars and the lateral driving electrodes through the dielectric layer, and the support pillars can also be used to electrically isolate the lateral driving electrodes.

It should be noted that the support column 130 is also formed on the insulating layer 120 of the limiting region 100b. The support column 130 in the limiting area 100b is used as a part of the surrounding wall structure.

It should also be noted that, in other embodiments, the interconnection openings may also be formed after the supporting pillars are formed.

Referring to FIG. 11 , lateral driving electrodes 140 are formed on the side surfaces of the support pillars 130 .

The lateral driving electrodes 140 are disposed opposite to the lateral movable electrodes formed subsequently. During the operation of the moving mechanism, the lateral driving electrodes 140 are used to drive the lateral movable electrodes to displace in a direction parallel to the surface of the fixed platform 100 .

In this embodiment, the lateral driving electrodes 140 located on one side of the support column 130 serve as the first lateral driving electrodes 140a, the lateral driving electrodes 140 located on the other side of the supporting column 130 serve as the second lateral driving electrodes 140b, and the first lateral driving electrodes 140a The second lateral driving electrode 140b is used for driving the laterally movable electrode to be displaced along the first translation direction, and the second laterally movable electrode 140b is used to drive the laterally movable electrode to be displaced along the second translation direction. The first translation direction is opposite to the second translation direction, thereby driving the movable platform to move left and right.

Specifically, the step of forming the lateral driving electrode 140 includes: forming a driving electrode material layer (not shown), and the driving electrode material layer conformally covers the support post 130, the insulating layer 120 and the second electrode pin 112; An etching process is performed, and the driving electrode material layers located on the side surfaces of the support pillars 130 and in the interconnection openings 123 are retained as the lateral driving electrodes 140 .

Wherein, during the etching process, a photomask may be used to define a region to be etched in the driving electrode material layer, so that the driving electrode material layer located on the side surfaces of the support pillars 130 and in the interconnection openings 123 is retained.

The lateral driving electrodes 140 are also formed in the interconnection openings 123 and connected to the second electrode pins 112 , so that the lateral driving electrodes 140 and the second electrode pins 112 are electrically connected.

In this embodiment, the material of the lateral driving electrode 140 is a conductive material. Specifically, the material of the lateral driving electrode 140 is a semiconductor material doped with ions, so as to be compatible with the semiconductor manufacturing process. In other embodiments, the material of the lateral driving electrode may also be a metal material, and the metal material includes aluminum, copper or tungsten.

Referring to FIG. 12 , a first sacrificial layer 150 conformally covering the support pillars 130 , the lateral driving electrodes 140 and the first vertical driving electrodes 111 is formed, and the thickness T of the first sacrificial layer 150 on the lateral driving electrodes 140 is a predetermined distance.

Subsequently, in the working area 100a, a conductive layer is formed on the first sacrificial layer 150, and the conductive layer includes a wire with one end fixed and a longitudinal movable electrode opposite to the first vertical driving electrode 111 and connected to the wire. electrode, and a lateral movable electrode opposite to the lateral driving electrode 140 and connected to the longitudinal movable electrode, the lateral movable electrode includes a first lateral movable electrode opposite to the side of the support column 130, therefore, Subsequently, by removing the first sacrificial layer 150 , the wires, the vertical movable electrodes and the lateral movable electrodes can be suspended above the support columns 130 , the lateral driving electrodes 140 and the fixed platform 100 .

Therefore, the material of the first sacrificial layer 150 is easy to be removed, and there is a high etching selectivity ratio between the first sacrificial layer 150 and the insulating layer 120, thereby reducing the difficulty of removing the first sacrificial layer 150, and Damage to the insulating layer 120 caused by the process of removing the first sacrificial layer 150 is reduced. In this embodiment, the etching selectivity ratio of the first sacrificial layer 150 and the insulating layer 120 is greater than 3:1.

In this embodiment, the material of the first sacrificial layer 150 is silicon oxide. In other embodiments, the material of the first sacrificial layer may also be amorphous carbon or germanium.

In this embodiment, the thickness T of the first sacrificial layer 150 located on the lateral side of the lateral driving electrode 140 is a predetermined distance. The preset spacing is used to determine the spacing between the subsequent lateral movable electrodes and the corresponding lateral driving electrodes, thereby determining the single movement step size of the moving mechanism. Therefore, the thickness T of the first sacrificial layer 150 is reasonably set according to the requirements of the movement stroke and movement accuracy of the movement mechanism. The smaller the thickness T of the first sacrificial layer 150, the higher the movement accuracy.

It should be noted that the first sacrificial layer 150 also conformally covers the support pillars 130 and the lateral driving electrodes 140 of the limiting region 100b, so that the surrounding wall structure can be formed in the same process, the process compatibility is improved, and the formation of the moving mechanism is reduced. process complexity.

It should also be noted that, using the insulating layer 120 formed above as the first insulating layer, before forming the first sacrificial layer 150, the forming method further includes: forming a second insulating layer on the sidewalls of the lateral driving electrodes 140 (Fig. or, after the first sacrificial layer 150 is formed, a third insulating layer (not shown) that conformally covers the first sacrificial layer 150 is formed.

Taking the second insulating layer as an example, the second insulating layer is used to achieve insulation between the lateral movable electrode and the lateral driving electrode 140, so that when the moving mechanism works, there is a potential between the lateral movable electrode and the lateral driving electrode 140. When the difference is poor, electrostatic attraction is generated between the lateral movable electrode and the lateral driving electrode 140 , and there is no short circuit between the lateral movable electrode and the lateral driving electrode 140 . Similarly, the third insulating layer is also used to achieve insulation between the lateral movable electrodes and the lateral driving electrodes 140 .

13 and 14 , the first sacrificial layer 150 and the insulating layer 200 exposed by the support pillars 130 are etched, and a fixing opening 126 is formed in the first sacrificial layer 150 and the insulating layer 120 (as shown in FIG. 14 ).

The fixing opening 126 is used to provide a space for the subsequent formation of the fixed electrode, so that the fixed electrode is fixed on the fixed platform 100 . Specifically, the bottom of the fixing opening 126 exposes the first electrode pin 113 , so that the fixed electrode can be electrically connected to the first electrode pin 113 .

In this embodiment, the step of etching the first sacrificial layer 150 and the insulating layer 200 exposed by the support pillar 130 includes: as shown in FIG. 13 , performing a first etching process on the first sacrificial layer 150 ; as shown in FIG. 14 , After the first etching process, a second etching process is performed on the insulating layer 120 .

After the first etching process, the remaining first sacrificial layer 150 exposes the insulating layer 120 above the first electrode pins 113 to prepare for the subsequent second etching. Wherein, during the first etching process, the first sacrificial layer 150 located on the top of the insulating layer 120 in the limiting region 100b is also etched and removed to expose the insulating layer 120 of the limiting region 100b.

In the subsequent process, when the first conductive layer is formed on the first sacrificial layer 150 and filled in the fixing openings 126, the first conductive layer is also formed in the limiting region 100b, by exposing the insulating layer of the limiting region 100b 120 , so that the first conductive layer formed in the limiting region 100 b is in contact with the insulating layer 120 , so that the first conductive layer in the limiting region 100 b is fixed on the fixing platform 100 through the insulating layer 120 .

Specifically, a first etching process is performed on the first sacrificial layer 150 by using a mask, so that only a part of the first sacrificial layer 150 on the insulating layer 120 is removed.

In this embodiment, after the first etching process, another photomask is used to perform a second etching process on the insulating layer 200 to etch and remove the insulating layer 120 on the top of the first electrode pin 113a, so that the first sacrificial layer 120 is removed by etching. Fixed openings 126 are formed in layer 150 and insulating layer 200 .

In this embodiment, the processes of the first etching process and the second etching process are both dry etching processes (eg, anisotropic dry etching process), so that the quality of the pattern outline after etching is better .

Referring to FIG. 15 , in the working area 100a, a conductive layer 160 is formed on the first sacrificial layer 150. The conductive layer 160 includes a wire 162 fixed at one end and a longitudinal movable electrode opposite to the first longitudinal driving electrode 111 and connected to the wire 162 161 , and a lateral movable electrode 166 opposite to the lateral driving electrode 140 and connected to the longitudinal movable electrode 161 , wherein the lateral movable electrode 166 includes a first lateral movable electrode 164 opposite to the side of the support column 130 .

Subsequently, a first pull-in electrode is formed on the lateral movable electrode 166, the first pull-in electrode is fixedly connected to the first lateral movable electrode 164 through an isolation layer, and a movable platform is formed above the first pull-in electrode. The mobile platform has a second suction electrode, and the first suction electrode is used for electrostatic suction and separation with the second suction electrode, and drives the movable platform to translate, so that the movable platform drives the moved parts to move.

Specifically, in the case of electrostatic attraction between the first attraction electrode and the movable platform, when the electrostatic attraction between the first lateral movable electrode 164 and the corresponding lateral driving electrode 140 is performed, there will be a Under driving, the first lateral movable electrode 164 is made to fit with the corresponding lateral driving electrode 140 , so that the movable platform is slightly displaced.

When the first suction electrode and the second suction electrode are pulled together, the first lateral movable electrode 164 fixedly connected to one end of the first suction electrode is moved to the corresponding lateral driving electrode 140 and attached, thereby Drive the movable platform to move laterally, and then fix the movable platform to separate the first suction electrode and the second suction electrode, and make the first lateral movable electrode 164 fixedly connected to the other end of the first suction electrode to move toward each other. The corresponding lateral drive electrodes 140 move and fit together, so that the first suction electrode moves in the opposite direction relative to the initial position by a preset distance, and then the first suction electrode and the second suction electrode are pulled back together, and the movement is repeated. action, which is equivalent to moving the movable platform twice the preset distance, and since there is a preset distance between the first lateral movable electrode 164 and the lateral driving electrode 140, this embodiment uses the electrostatic force to drive The movement and reverse movement can precisely control the single movement step length, so that the single movement step length of the mobile platform can be accurately controlled, and the movement accuracy of the moving mechanism is correspondingly improved. The operations of moving and re-engaging make the movable platform move and accumulate periodically in small steps to achieve a larger displacement. Therefore, the moving mechanism provided by the present invention has the advantage of a large stroke.

The wire 162 has a certain width, so that the wire 162 has a certain mechanical strength, so as to support the lateral movable electrode 166 and the first longitudinal driving electrode 1113 .

The wires 162 can undergo tensile deformation or compression deformation, so as to realize flexible connection, and then enable the lateral movable electrodes 166 to move.

In this embodiment, the wire 162 is a spring wire, so it has stretchability. Specifically, the wire 162 is a Z-shaped spring wire. In other embodiments, the wires can also be M-shaped spring wires or U-shaped spring wires.

In this embodiment, in the step of forming the conductive layer 160 on the first sacrificial layer 150 , the conductive layer 160 further includes a fixed electrode 163 on the fixed platform 100 .

Specifically, the fixed electrode 163 is formed in the fixed opening 126 (as shown in FIG. 14 ), and the wire 162 is connected to the fixed electrode 163 .

The fixed electrode 163 is used to fix one end of the wire 162, and is also used to achieve electrical connection with the lateral movable electrode 166 and the first longitudinal movable electrode 161, so that the lateral movable electrode 166 and the first longitudinal movable electrode 161 are electrically connected through the fixed electrode 163. The electrode 161 is loaded with a drive signal. In this embodiment, the fixed electrodes 163 are in one-to-one correspondence with the wires 162 , and the fixed electrodes 163 are electrically connected to the first electrode pins 113 at the bottom of the fixed opening 126 .

In this embodiment, the fixed electrode 163 , the wire 162 , the first longitudinal movable electrode 161 and the lateral movable electrode 166 are formed in the same step, which reduces the process complexity of forming the moving mechanism. Moreover, the fixed electrode 163, the lead wire 162, the first longitudinal movable electrode 161 and the lateral movable electrode 166 are of a one-piece structure, thereby improving the connection strength and mechanical strength.

In this embodiment, in the step of forming the conductive layer 160, the conductive layer 160 also covers the first sacrificial layer 150 in the limiting region 100b. Specifically, in the limiting region 100 b , the conductive layer 160 conformally covers the first sacrificial layer 150 and the insulating layer 120 exposed by the first sacrificial layer 150 .

Wherein, the conductive layers 160 of the working area 100a and the limiting area 100b are isolated, so as to avoid short circuit between the conductive layers 160 of the working area 100a and the limiting area 100b, thereby ensuring the normal operation of the displacement module.

Specifically, the step of forming the conductive layer 160 includes: forming a conductive material layer conformally covering the first sacrificial layer 150 and the insulating layer 120, and the conductive material layer is also filled in the fixed opening 126; patterning the conductive material by an etching process layer to form the conductive layer 160 . Wherein, etching is performed by using a mask, so as to realize the patterning of the conductive material layer.

In this embodiment, the material of the conductive layer 160 is a conductive material, such as a metal material or a semiconductor material doped with ions.

In this embodiment, in the step of forming the conductive layer 160 on the first sacrificial layer 150 , the lateral movable electrode 166 further includes a second lateral movable electrode 165 opposite to the end face of the support column 130 . The second lateral movable electrode 165 Isolated from the first lateral movable electrode 164 .

When the first suction electrode is subsequently formed above the lateral movable electrode 166 , the first suction electrode and the second lateral movable electrode 165 are fixed and electrically connected, so that the first suction electrode 165 is connected to the first The pull-in electrode loads the drive signal.

Specifically, along the extending direction of the support column 130 , the support column 130 has two end surfaces (not shown), and the second lateral movable electrode 165 is disposed opposite at least one end surface of the support column 130 .

The second lateral movable electrode 165 is isolated from the first lateral movable electrode 164, so that the second lateral movable electrode 165 and the first lateral movable electrode 164 are electrically isolated from each other, so that the second lateral movable electrode 164 can be independently 165 and the first lateral movable electrode 164 are loaded with driving signals.

It should be noted that, in other embodiments, according to the actual circuit design, the second lateral movable electrode may not be formed.

It should also be noted that, in this embodiment, the support column 130 is subsequently retained. In other embodiments, the support posts of the work area are subsequently removed.

Referring to FIG. 16 , a second sacrificial layer 171 covering the first sacrificial layer 150 and the conductive layer 160 is formed, and the second sacrificial layer 171 is flush with the top surface of the conductive layer 160 .

The second sacrificial layer 171 is used to provide a process platform for the subsequent formation of the first pull-in electrode.

The second sacrificial layer 171 needs to be removed later. Therefore, the material of the second sacrificial layer 171 is easy to be removed, and the second sacrificial layer 171 and the insulating layer 120 have a high etching selectivity ratio, thereby reducing the removal rate. The process difficulty of the second sacrificial layer 171 is reduced, and the damage to the insulating layer 120 caused by the process of removing the second sacrificial layer 171 is reduced. In this embodiment, the etching selectivity ratio between the second sacrificial layer 171 and the insulating layer 120 is greater than 3:1.

In this embodiment, the materials of the second sacrificial layer 171 and the first sacrificial layer 150 are the same, so that the second sacrificial layer 171 and the first sacrificial layer 150 can be removed simultaneously. For a specific description of the second sacrificial layer 171 , reference may be made to the foregoing description of the first sacrificial layer 150 , which will not be repeated here.

In this embodiment, the second sacrificial layer 171 is flush with the top surface of the conductive layer 160 , thereby exposing the top surface of the conductive layer 160 , thereby preparing for the subsequent formation of an isolation layer on the top surface of the conductive layer 160 . Moreover, the second sacrificial layer 171 is formed by sequentially performing the deposition process and the planarization process. The top surface is used as the stop position of the planarization process, which is beneficial to improve the flatness of the top surface of the second sacrificial layer 171 .

Referring to FIG. 17 , an isolation layer 172 covering the conductive layer 160 and the second sacrificial layer 171 over the top surfaces of the support pillars 130 is formed.

In the working area 100a, a first pull-in electrode is subsequently formed on the isolation layer 172 above the top surface of the conductive layer 160, and the isolation layer 172 is used to realize the physical connection between the first pull-in electrode and the first lateral movable electrode 164, and Electrical isolation of the first pull-in electrode and the first lateral movable electrode 164 is achieved.

Therefore, in this embodiment, the material of the isolation layer 172 is a dielectric material, for example, a suitable dielectric material such as silicon nitride, silicon oxide, or silicon oxynitride.

In this embodiment, in the step of forming the isolation layer 172 , the isolation layer 172 also covers the second sacrificial layer 172 . In the subsequent process of forming the first pull-in electrode, the first pull-in electrode material layer needs to be formed by a deposition process. Therefore, by making the isolation layer 172 cover the second sacrificial layer 172, the first pull-in electrode material layer is formed. The formation provides a flat surface, thereby reducing the technological difficulty of forming the first pull-in electrode.

In this embodiment, after forming the isolation layer 172 , the forming method further includes: forming a first opening 173 in the isolation layer 172 of the working area 100 a , and the first opening 173 exposes the top of the second lateral movable electrode 165 .

By forming the first opening 173 , the first suction electrode is also formed in the first opening 173 , so that the first suction electrode and the second lateral movable electrode 165 are electrically connected.

In this embodiment, the forming method further includes: forming a second opening 175 in the isolation layer 172 of the limiting region 100 b , and the second opening 175 exposes the top of the conductive layer 160 .

In the subsequent step of forming the first pull-in electrode, a first limiting layer is also formed on the isolation layer 172 above the top surface of the conductive layer 160 in the limiting region 100b. Two openings 175 , so that the first limiting layer is also formed in the second opening 175 , so as to realize the electrical connection between the first limiting layer and the conductive layer 160 .

In this embodiment, the first opening 173 and the second opening 175 are formed in the same process, and the process is simple.

Specifically, the isolation layer 172 is etched using a dry etching process (eg, an anisotropic dry etching process) to form the first opening 173 and the second opening 175, respectively, thereby increasing the first opening 173 and the second opening 175. Sidewall smoothness and dimensional accuracy of opening 175 .

It should be noted that, in this embodiment, after the isolation layer 172 is formed, the isolation layer 172 covers the entire second sacrificial layer 171, thereby providing a flat surface for the subsequent formation of the first suction electrode material layer, thereby reducing the subsequent formation of the first suction electrode material layer. The process difficulty of the combined electrode.

18 and 19, in the working area 100a, a first pull-in electrode 182 is formed on the isolation layer 172 above the top surface of the conductive layer 160 (as shown in FIG. 19).

In this embodiment, in the working area 100a, the first suction electrode 182 , the lateral driving electrode 140 , the lateral movable electrode 166 , the first longitudinal driving electrode 111 , the longitudinal movable electrode 161 , the wire 162 and the fixed electrode 163 Forms the displacement module (not shown).

It should be noted that the support column 130 is retained subsequently, and therefore, the displacement module further includes the support column 130 accordingly.

The first attraction electrode 182 is used for electrostatic attraction with the movable platform, and the displacement module is used to control the movable platform to move along the moving direction. In the case of electrostatic attraction between the movable platform and the first suction electrode 182, when the first lateral movable electrode 164 located on one side of the support column 130 moves closer to the corresponding lateral driving electrode 140, the movable platform is driven accordingly. Move in the moving direction.

Specifically, the steps of forming the first pull-in electrode 182 include: as shown in FIG. 18 , forming a first pull-in electrode material layer 180 covering the isolation layer 172 ; as shown in FIG. 19 , patterning the first pull-in electrode material layer 180 , forming a first pull-in electrode 182 .

It should be noted that the first opening 173 is formed in the isolation layer 172 , and therefore, the first pull-in electrode material layer 180 is also filled in the first opening 173 . Correspondingly, the first suction electrode 182 of the working area 100 a is also filled in the first opening 173 and connected to the second lateral movable electrode 165 .

In this embodiment, a dry etching process (eg, anisotropic dry etching process) is used for etching to pattern the first pull-in electrode material layer 180 , thereby increasing the side of the first pull-in electrode 182 Wall smoothness and dimensional accuracy.

In this embodiment, in the step of forming the first pull-in electrode 182 , in the direction perpendicular to the side surface of the support column 130 , the two ends of the first pull-in electrode 182 pass through the isolation layer 172 and are respectively connected to the support column 130 . The first lateral movable electrodes 164 on both sides of the column 130 are fixedly connected.

In this embodiment, in the step of forming the first pull-in electrode 182 , in a direction perpendicular to the side surface of the support column 130 , the first pull-in electrode 182 extends to both sides of the support column 130 to the second sacrificial layer 171 . on some areas.

As shown in FIG. 19 , in this embodiment, in the step of forming the first pull-in electrode 182 , the first limiting layer 184 is also formed on the isolation layer 172 above the top surface of the conductive layer 160 in the limiting region 100 b , The first limiting layer 184 is filled in the second opening 175 and is connected to the conductive layer 160 of the limiting area 100b, and a flexible wire 185 is also formed at the junction of the working area 100a and the limiting area 100b. One end is connected to the first limiting layer 184 .

The first limiting layer 184 is used as a part of the surrounding wall structure. By forming the first limiting layer 184 electrically connected to the conductive layer 160 , the surrounding wall structure has conductivity.

One end of the flexible wire 185 is connected to the first limiting layer 184, and the other end is connected to the movable platform formed subsequently. The flexible wire 185 is used to realize the electrical connection between the movable platform and the external circuit, so that when the moving mechanism works, The movable platform can be loaded with drive signals through the enclosure wall structure and the flexible wires 185 .

In this embodiment, the flexible wire 185 is a spring wire, so that the movable platform and the surrounding wall structure are connected flexibly, so that when the movable platform moves in a direction parallel to the surface of the fixed platform 100, the movable platform can pass through The flexible wire 185 moves smoothly. Specifically, the flexible wire 185 may be a zigzag spring wire.

In this embodiment, the forming method further includes: forming a locking shaft 181 located on the top of the at least one first suction electrode 182 .

When the movable platform is subsequently formed, at the position corresponding to the locking shaft 181, a locking groove is formed in the surface of the movable platform facing the fixed platform 100, and the locking shaft 181 is used to be able to separate or engage with the locking groove. When the moving mechanism is not working, the movable platform is in the original position. At this time, the locking shaft 181 and the locking groove are on the same vertical plane, so that the locking shaft 181 and the locking groove can be engaged with each other. The mobile platform realizes physical locking to ensure a firm locking position, thereby improving or avoiding the problem of non-stationary wandering of the movable platform in the non-working state, and further accurately controlling the position of the moved parts.

Moreover, the distance between the first lateral movable electrode 164 under the locking shaft 181 and the corresponding lateral driving electrode 140 can be adjusted by means of electrostatic attraction or electrostatic repulsion, and the first suction electrode 182 can be translated according to the actual situation, so as to realize the lock Alignment of the bit slot with the locking shaft 181 .

In this embodiment, the material of the locking shaft 181 is a dielectric material. The locking shaft 181 is used to achieve physical locking with the locking groove, so even if the material of the locking shaft 181 is a medium material, the locking shaft 181 and the locking groove can be engaged with each other.

Specifically, the material of the locking shaft 181 may be a suitable dielectric material such as silicon nitride, silicon oxide or silicon oxynitride. In other embodiments, the material of the locking shaft can also be a conductive material, so that not only physical locking can be achieved, but also electrostatic suction can be achieved through the second suction electrode and the locking shaft, so that the movable platform and the locking shaft can be locked. The shaft realizes electrostatic locking. The conductive material may be a metal material or a semiconductor material doped with ions.

In this embodiment, after the first pull-in electrode material layer 180 is formed and before the first pull-in electrode material layer 180 is patterned, the locking shaft 181 is formed.

Specifically, the locking shaft 181 is formed on the first pull-in electrode material layer 180 above the top of the at least one support pillar 130 by using a deposition process and an etching process in sequence. The first pull-in electrode material layer 180 covers the entire isolation layer 172 , and the first pull-in electrode material layer 180 has a flat surface, thereby reducing the difficulty of forming the locking shaft 181 .

In this embodiment, the displacement module having the locking shaft 181 is used as the locking module (not shown).

When the moving mechanism is not working, the locking module is used to realize the physical locking with the movable platform, so as to improve or avoid the problem that the movable platform wanders in a non-steady state in a non-working state.

Continuing to refer to FIG. 19 , in this embodiment, after forming the first suction electrode 182 , the first limiting layer 184 , the flexible wire 185 and the locking shaft 181 , the forming method further includes: removing the first suction electrode 182 , The first limiting layer 184 and the isolation layer 172 of the flexible wire 185 are exposed.

By removing the isolation layer 172 in a part of the area, the isolation layer 172 directly under the first pull-in electrode 182 , the first limiting layer 184 and the flexible wire 185 is retained, and a third layer in contact with the second sacrificial layer 171 is formed for the subsequent Prepare the sacrificial layer.

Referring to FIG. 20 , a third sacrificial layer 190 covering the second sacrificial layer 171 and the first pull-in electrode 182 is formed.

Subsequently, a movable platform is formed on the third sacrificial layer 190 , and by forming the third sacrificial layer 190 , the movable platform can be suspended above the first pull-in electrode 182 .

In this embodiment, the third sacrificial layer 190 also conformally covers the locking shaft 181 , and also covers the flexible wire 185 and the first limiting layer 184 .

In this embodiment, the materials of the third sacrificial layer 190 and the first sacrificial layer 150 are the same, so that the third sacrificial layer 190 , the second sacrificial layer 171 and the first sacrificial layer 150 can be removed simultaneously. For a specific description of the third sacrificial layer 190 , reference may be made to the foregoing description of the first sacrificial layer 150 , which is not repeated here.

In this embodiment, after the third sacrificial layer 190 is formed, the forming method further includes: forming a fifth insulating layer 191 conformally covering the third sacrificial layer 190 .

Correspondingly, a movable platform is subsequently formed on the fifth insulating layer 191 , that is, a fifth insulating layer 191 is formed on the surface of the movable platform facing the second displacement electrode 182 . The movable platform formed subsequently includes a second suction electrode and a movable electrode plate located on the second suction electrode. The fifth insulating layer 191 is used to realize the connection between the first suction electrode 182 and the second suction electrode. Therefore, when the moving mechanism works, when there is a potential difference between the first suction electrode 182 and the second suction electrode, an electrostatic attraction is generated between the first suction electrode 182 and the second suction electrode, In addition, the first suction electrode 182 and the second suction electrode will not be short-circuited.

The material of the fifth insulating layer 191 is a dielectric material. In this embodiment, the material of the fifth insulating layer 191 may be silicon nitride. In other embodiments, the material of the fifth insulating layer may also be other suitable dielectric materials such as silicon oxide and silicon oxynitride.

In other embodiments, a fourth insulating layer conformally covering the first pull-in electrode material layer and the lock shaft may be formed after the locking shaft is formed and before the first pull-in electrode material layer is patterned. Correspondingly, after the first suction electrode is formed, a fourth insulating layer is formed on the surface of the first suction electrode. Similarly, the fourth insulating layer is also used to achieve insulation between the first pull-in electrode and the second pull-in electrode.

21 , after forming the third sacrificial layer 190 , the forming method further includes: in the limiting region 100 b , forming a third opening 193 and a fourth opening 192 in the third sacrificial layer 190 , and the third opening 193 is exposed In the first limiting layer 184 , the fourth opening 192 exposes one end of the flexible wire 185 that is not connected to the first limiting layer 184 .

The third opening 193 is formed to prepare for the subsequent formation of the second limiting layer; the fourth opening 192 is formed to prepare for the subsequent electrical connection between the movable platform and the flexible wire 185 .

In this embodiment, the third sacrificial layer 190 is etched by a dry etching process (eg, an anisotropic dry etching process), thereby improving the smoothness of the sidewalls of the third opening 193 and the fourth opening 192 and dimensional accuracy.

Referring to FIG. 22 , a movable platform 200 is formed on the third sacrificial layer 190 of the working area 100 a . The movable platform 200 includes a second suction electrode 210 and a movable electrode plate 220 on the second suction electrode 210 .

The movable platform 200 is used to support the moved part, so that when the movable platform 200 moves, it can drive the moved part to move, so that the moved part is displaced.

Specifically, the step of forming the movable platform 200 includes: forming a second pull-in electrode material layer (not shown) covering the third sacrificial layer 190 , and the second pull-in electrode material layer is further formed on the third opening 193 (as shown in the figure) 21) and the fourth opening 192 (shown in FIG. 21); form a movable electrode material layer (not shown) covering the second suction electrode material layer; etch the movable electrode material layer and the first The second pull-in electrode material layer forms the movable electrode plate 220 and the second pull-in electrode 210 in the working area 100a.

In this embodiment, the movable platform 200 is further formed in the fourth opening 192 and connected to the flexible wire 185 .

Moreover, in this embodiment, in order to simplify the process steps, after the movable electrode plate material layer and the second suction electrode material layer are etched, a second limiting layer 230 is formed in the third opening 193 . 230 is isolated from the movable platform 200, and in the limiting region 100b, the second limiting layer 230, the first limiting layer 184, the conductive layer 160, the first sacrificial layer 150, the lateral driving electrodes 140 and the supporting pillars 130 Used to form a wall structure (not shown).

The surrounding wall structure is used to limit the movable range of the movable platform 200 in the direction parallel to the fixed platform 100, and the surrounding wall structure is also used to protect the displacement module, the locking module and the movable platform 200 from displacement. The module, the locking module and the movable platform 200 are affected by the external environment.

23 , it should be noted that after the movable platform 200 and the second limiting layer 230 are formed, the forming method further includes: removing the fifth insulating layer 191 exposed by the movable platform 200 and the second limiting layer 230 .

The fifth insulating layer 191 exposed by the movable platform 200 and the second limiting layer 230 is removed to expose the third sacrificial layer 190 , so that the fourth sacrificial layer and the third sacrificial layer 190 formed subsequently are in contact.

In this embodiment, the fifth insulating layer 191 is etched by using a dry etching process (eg, an anisotropic dry etching process).

Referring to FIG. 24 , after forming the second limiting layer 230 , the forming method further includes: forming a fourth sacrificial layer 240 on the movable platform 200 and the third sacrificial layer 190 exposed by the second limiting layer 230 . The layer 240 covers the movable platform 200 and exposes the top surface of the second limiting layer 230 .

The subsequent process further includes forming a top limiting structure on the top surface of the second limiting layer 230, and the top limiting structure also extends to a partial area of the movable platform 200. The fourth sacrificial layer 240 is used for isolating the top limiting structure and the The movable platform 200 is thus prevented from being connected to the movable platform 200 by the top limiting structure.

In this embodiment, the materials of the fourth sacrificial layer 240 and the first sacrificial layer 150 are the same, so that the fourth sacrificial layer 240 , the third sacrificial layer 190 , the second sacrificial layer 171 and the first sacrificial layer 150 can be removed simultaneously. For a specific description of the fourth sacrificial layer 240 , reference may be made to the foregoing description of the first sacrificial layer 150 , which will not be repeated here.

Specifically, the fourth sacrificial layer 240 is formed by sequentially performing a deposition process and an etching process.

Referring to FIG. 25 , a top limiting structure 250 is formed on the top of the second limiting layer 230 , and the top limiting structure 250 also extends to a partial area of the movable platform 200 .

The top limiting structure 250 is used to limit the movable range of the movable platform 200 along the normal direction of the surface of the fixed platform 100 .

In this embodiment, the material of the top limiting structure 250 is a dielectric material, and the fourth sacrificial layer 240 , the third sacrificial layer 190 , the second sacrificial layer 171 and the first sacrificial layer 150 are higher than the top limiting structure 250 The etching selectivity ratio of, for example, the etching selectivity ratio is greater than 3:1.

Specifically, the materials of the fourth sacrificial layer 240 , the third sacrificial layer 190 , the second sacrificial layer 171 and the first sacrificial layer 150 are all silicon oxide, and the material of the top limiting structure 250 is correspondingly silicon nitride. In other embodiments, the material of the top limiting structure may also be a conductive material.

Referring to FIG. 26 , after the movable platform 200 is formed, the fourth sacrificial layer 240 (shown in FIG. 25 ), the third sacrificial layer 190 (shown in FIG. 25 ), and the second sacrificial layer 171 (shown in FIG. 25 ) are removed and the first sacrificial layer 150 (shown in FIG. 25 ).

By removing the fourth sacrificial layer 240 , the third sacrificial layer 190 , the second sacrificial layer 171 and the first sacrificial layer 150 , the wires 162 , the vertical movable electrodes 161 , the lateral movable electrodes 166 and the first pull-in electrodes 182 are suspended above the support column 130 , the lateral driving electrode 140 and the fixed platform 100 .

In this embodiment, a wet etching process is used to remove the fourth sacrificial layer 240 , the third sacrificial layer 190 , the second sacrificial layer 171 and the first sacrificial layer 150 . The wet etching process has isotropic etching characteristics, so that the exposed fourth sacrificial layer 240 , the third sacrificial layer 190 , the second sacrificial layer 171 and the first sacrificial layer 150 can be removed.

In this embodiment, after removing the fourth sacrificial layer 240 , the third sacrificial layer 190 , the second sacrificial layer 171 and the first sacrificial layer 150 , a locking groove 260 is formed in the surface of the movable platform 200 facing the locking shaft 181 , The locking slot 260 is engaged with the locking shaft 181 .

It should be noted that, in the limiting region 100b, the conductive layer 160 is in contact with the insulating layer 120, that is, the conductive layer 160 covers the first sacrificial layer 150, so that the first sacrificial layer between the conductive layer 160 and the support column 130 is formed. 150 is retained, which is correspondingly beneficial to improve the mechanical strength of the surrounding wall structure.

It should also be noted that, in this embodiment, after removing the fourth sacrificial layer 240 , the third sacrificial layer 190 , the second sacrificial layer 171 and the first sacrificial layer 150 , the support pillars 130 of the working area 100 a remain. In other embodiments, the support column of the work area can also be removed according to actual needs.

In addition, the present embodiment adopts the semiconductor process to form the moving mechanism, which is beneficial to realize mass production, lower process cost and higher integration.

The similarities between the embodiments of the present invention and the foregoing embodiments are not repeated here. The differences between the embodiments of the present invention and the foregoing embodiments are: in the step of forming the movable platform 270 on the third sacrificial layer in the work area, The movable platform 270 further includes a third suction electrode 272 located on the movable pole plate 271; before forming the top limiting structure 282 on the top of the second limiting layer (not shown), the forming method further includes: A third longitudinal driving electrode 281 is formed on the top surface of the first limiting layer, and the third longitudinal driving electrode 281 also extends to a partial area of the movable platform 270 .

Correspondingly, the top limiting structure 282 is formed on the third longitudinal driving electrode 281 .

After the first attracting electrode drives the movable platform 270 to move a single moving step in the moving direction, the third attracting electrode 272 and the third longitudinal driving electrode 281 are electrostatically attracted, so as to be fixed by the third longitudinal driving electrode 281 The movable platform 270, in this case, pulls down the lateral movable electrodes and the longitudinal movable electrodes synchronously, so that all the first suction electrodes and the second suction electrodes are separated, so that all the first suction electrodes are relative to the initial position The preset distance is moved in the opposite direction, and the second suction electrode is attracted again, so as to improve the efficiency of eliminating the locking position and re-locking the position.

The material of the third pull-in electrode 272 is a conductive material. In this embodiment, the material of the third pull-in electrode 272 is a metal material, and the metal material includes aluminum, copper or tungsten. In other embodiments, the material of the third pull-in electrode is a semiconductor material doped with ions. Similarly, the third longitudinal driving electrode 281 is also made of conductive material. Specifically, the material of the third longitudinal driving electrode 281 is a metal material or a semiconductor material doped with ions.

It should be noted that, before forming the fourth sacrificial layer, the forming method further includes: forming a sixth insulating layer (not shown) on the top surface of the third pull-in electrode 272; Before the third vertical driving electrodes 281 are formed on the top surface, a seventh insulating layer is formed on the top surface of the second limiting layer, and the seventh insulating layer also extends to a part of the movable platform 270; the third vertical driving electrodes 281 are formed accordingly on the seventh insulating layer.

Taking the sixth insulating layer as an example, the sixth insulating layer is used to realize the insulation between the third pull-in electrode 272 and the third longitudinal driving electrode 281, so that when the moving mechanism works, when the third pull-in electrode 272 and the third pull-in electrode When there is a potential difference between the vertical drive electrodes 281, electrostatic attraction is generated between the third pull-in electrode 272 and the third vertical drive electrode 281, and there is no short circuit between the third pull-in electrode 272 and the third vertical drive electrode 281 . Similarly, the seventh insulating layer is also used to achieve insulation between the third pull-in electrode 272 and the third longitudinal driving electrode 281 .

The similarities between the embodiments of the present invention and the foregoing embodiments will not be repeated here. The difference between the embodiments of the present invention and the foregoing embodiments is that in the step of forming the lateral driving electrodes 510 on the side surfaces of the support columns 500, the supporting The top surfaces of the pillars 500 form the second longitudinal driving electrodes 520 , which are separated from the lateral driving electrodes 510 .

The second vertical driving electrodes 520 are isolated from the horizontal driving electrodes 510, so that driving signals can be applied to the second vertical driving electrodes 520 and the horizontal driving electrodes 530, respectively.

During the operation of the moving mechanism, after the first suction electrode drives the movable platform to move a single step in the moving direction, the movable platform is fixed so that the first suction electrode and the second suction electrode in the movable platform are The electrode is disengaged, and the first suction electrode is moved reversely by a preset distance relative to the initial position. Therefore, when there is a potential difference between the first pull-in electrode and the second longitudinal drive electrode 520, a parallel plate capacitor will also be formed between the first pull-in electrode and the second longitudinal drive electrode 520, so that the first pull-in electrode The second longitudinal driving electrode 520 is approached under the action of electrostatic attraction.

Therefore, by arranging the second longitudinal driving electrode 520 on the top surface of the support column 500, the pull-down capability and efficiency of the first suction electrode can be improved, so that the second suction electrode can be separated from the first suction electrode more quickly. .

Similarly, when the moving mechanism is working, the locking module is in a pull-down state, so as to be unlocked with the movable platform, thereby enabling the movable platform to move laterally. Therefore, by arranging the second longitudinal driving electrode 520 on the top surface of the support column 500, the pull-down capability and efficiency of the first suction electrode in the locking module can also be improved, so that the movable platform and the locking position can be realized more quickly. Unlock the module.

In this embodiment, the material of the second vertical driving electrode 520 is a conductive material, such as a metal material or a semiconductor material doped with ions. For the description of the material of the second longitudinal driving electrode 520 , reference may be made to the corresponding description of the lateral driving electrode in the foregoing embodiments, which will not be repeated here.

Specifically, the steps of forming the lateral driving electrodes 510 and the second vertical driving electrodes 520 include: forming a driving electrode material layer (not shown), and the driving electrode material layer conformally covers the support post 500, an insulating layer (not shown), a second Electrode pins (not marked) and fourth electrode pins (not marked); the driving electrode material layer is etched. Wherein, during the etching process, a photomask may be used to define a region to be etched in the driving electrode material layer.

Correspondingly, in this embodiment, when the first sacrificial layer is subsequently formed, the first sacrificial layer also covers the second vertical driving electrode 520 .

For the specific description of the forming method in this embodiment, reference may be made to the corresponding description in the foregoing embodiment, which is not repeated in this embodiment.

FIG. 29 is a schematic structural diagram of a fourth embodiment of the method for forming a moving mechanism of the present invention.

The similarities between the embodiments of the present invention and the foregoing embodiments are not repeated here. The differences between the embodiments of the present invention and the foregoing embodiments are that the step of forming the support column 560 includes: forming multiple A stack of sub-support columns (not shown).

In the semiconductor process, each sub-support column has a maximum height acceptable to the process. Therefore, by reasonably setting the number of sub-support columns, the total height of the support column 560 can be adjusted, so as to increase the height of the support column 560 on the basis of the achievable process. The overall height of the support column 560 is increased, which correspondingly increases the side surface area of the support column 560, thereby increasing the electrostatic attraction force between the lateral driving electrode 570 and the corresponding first lateral movable electrode, and correspondingly improving the translation performance of the moving mechanism. The electrostatic driving force of the time increases the movement speed.

As an example, the support column 560 includes two stacked sub-support columns, namely a first sub-support column 561 and a second sub-support column 562 located on top of the first sub-support column 561 . In other embodiments, according to actual requirements, the number of sub-support columns may also be three, or more than three.

Correspondingly, the present invention also provides a driving method of the moving mechanism of the foregoing embodiment.

The driving method provided by this embodiment is used to drive the moving mechanism provided by the embodiment of the present invention, so that the moving mechanism provided by the embodiment of the present invention can realize the movement of the moved component.

Through the driving method provided by the embodiment of the present invention, the moving mechanism can work normally. Specifically, the driving method can precisely control the step size of a single movement, the step size of a single movement is small, and the movable platform is periodically accumulated in small steps to achieve a larger displacement, so that the movable platform can be moved The platform undergoes periodic accumulation of small-step movements to achieve large displacements, and is conducive to realizing precise control of the displacement of the moving parts, and correspondingly, optical anti-shake and super-resolution can be achieved simultaneously.

In order to make the above objects, features and advantages of the embodiments of the present invention more clearly understood, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

1 and 2, FIG. 1 is a top view of an embodiment of the moving mechanism of the present invention, and FIG. 2 is a cross-sectional view of an embodiment of the moving mechanism of the present invention.

In this embodiment, the driving method includes: performing a first initial driving process, making both the first lateral movable electrode 19sl and the lateral driving electrode 13 in a floating state, and loading the first pull-in electrode 22 with the first A drive signal is applied to the second pull-in electrode 17b, so that there is a first electrostatic attraction between the first pull-in electrode 22 and the second pull-in electrode 17b, so that the first pull-in electrode 22 and the second pull-in electrode 17b have a first electrostatic attraction force. The second pull-in electrode 17b pulls in.

By pulling the first suction electrode 22 and the second suction electrode 17b together, the position of the movable platform 17 is fixed by the first suction electrode 22, thereby avoiding the problem of the movable platform 17 from wandering in an indeterminate state, correspondingly Precisely control the position of the parts being moved and prepare for subsequent displacement processing.

In this embodiment, when the displacement module (not shown) is in the initial state, the movable platform 17 is suspended above the first suction electrode 22 , that is, there is a gap between the second suction electrode 17 b and the first suction electrode 22 . When there is a first electrostatic attraction between the second attraction electrode 17b and the first attraction electrode 22, the direction of the first electrostatic attraction is perpendicular to the surface of the fixed platform 10, and the first electrostatic attraction makes the second attraction electrode 17b It is attracted with the first pull-in electrode 22, so that the position of the second pull-in electrode 17b is fixed.

Specifically, load the first drive signal to the first pull-in electrode 22 and load the second drive signal to the second pull-in electrode 17b, so that there is a first potential difference between the second pull-in electrode 17b and the first pull-in electrode 22 , the first potential difference is used to make the second suction electrode 17b and the first suction electrode 22 have a first electrostatic attractive force, so that the first suction electrode 22 and the movable platform 17 can achieve electrostatic locking.

In this embodiment, both the first lateral movable electrode 19sl and the lateral driving electrode 13 are in a floating state, the first lateral movable electrode 19sl and the lateral driving electrode 13 are disconnected, and the first lateral movable electrode 19sl and the lateral driving electrode 13 are prevented from being connected to each other. Electrostatic attraction is generated between the electrodes 13, thereby preventing the first attraction electrode 22 from moving in a direction parallel to the surface of the fixed platform 10, so as to prevent the attraction between the first attraction electrode 22 and the second attraction electrode 17b It produces an influence and prepares for the subsequent movement of the first lateral movable electrode 19sl in the lateral direction.

In this embodiment, the moving mechanism further includes: a locking shaft 33 located on the top of the at least one first suction electrode 22; correspondingly, the movable platform 17 has a locking groove 18 in the surface facing the locking shaft 33, The locking groove 18 and the locking shaft 33 can be separated or engaged with each other. Wherein, the displacement module 20 with the locking shaft 33 is used as the locking module 30 .

Therefore, when the moving mechanism is not working, the movable platform 17 is in the original position, at this time, the locking shaft 33 and the locking slot 18 are on the same vertical plane, and the locking slot 18 is engaged with the locking shaft 33, thereby The movable platform 17 is physically locked by the locking module 30 to ensure a firm locking position, thereby improving or avoiding the problem of indeterminate wandering of the movable platform 17 in the non-working state, thereby further accurately controlling the moved parts s position. Correspondingly, during the process of executing the first initial driving process, the locking slot 18 is engaged with the locking shaft 33 .

Therefore, after the first initial driving process is performed and before the subsequent displacement processing is performed, the driving method further includes: performing a second initial driving process, and loading the longitudinal movable electrode 19b under the locking shaft 33 with the first Nine driving signals, the tenth driving signal is applied to the first vertical driving electrode 11b under the locking shaft 33, so that there is a second potential difference between the vertical movable electrode 19b and the first vertical driving electrode 11b, and the second potential difference is used for There is a fourth electrostatic attraction between the longitudinal movable electrode 19b and the first longitudinal driving electrode 11b, and the fourth electrostatic attraction is used to make the longitudinal movable electrode 19b and the first longitudinal driving electrode 11b attract and make the locking shaft 33 is separated from the locking slot 18 .

In this embodiment, the driving method further includes: after performing the first initial driving process and the second initial driving process, performing one or more displacement processes.

During the first displacement process, the movable platform 17 is moved by the preset distance d through the first displacement process, and starting from the second displacement process, the movable platform 17 is moved twice by the preset distance d for each displacement process, The single moving step size is small, which can precisely control the single moving step size of the movable platform 17. Therefore, by performing multiple displacement processing, the movable platform 17 can be accumulated in periodic small steps to achieve larger Therefore, the moving mechanism has the advantages of large stroke and high moving accuracy, which is conducive to realizing precise control of the displacement of the moved component, so that optical anti-shake and super-resolution can be realized at the same time.

As shown in FIG. 2 , the steps of the displacement processing include: performing a first sub-displacement processing, so that the first lateral movable electrodes 19s1 are moved toward the corresponding lateral driving electrodes 13 and attached to each other.

Under the driving of the lateral driving electrode 13, the first lateral movable electrode 19s1 is moved to the corresponding lateral driving electrode 13 by a predetermined distance d. Both ends of a pull-in electrode 22 are fixedly connected to the first lateral movable electrode 19s1 through the isolation layer 21, respectively, and the first pull-in electrode 22 drives the movable platform 17 to move the movable platform 17 laterally by a preset distance d, thereby making the movable platform 17 A small displacement occurs.

Specifically, along the lateral direction, both ends of the first suction electrode 22 are fixedly connected to the first lateral movable electrode 19s1 through the isolation layer 21, respectively. The fixedly connected first lateral movable electrodes 19sl move toward the corresponding lateral driving electrodes 13 and fit together.

In this embodiment, in the lateral driving electrode group 13G, the lateral driving electrodes 13 on one side of the support column 12 serve as the first lateral driving electrodes 13a, and the lateral driving electrodes 13 on the other side of the supporting column 12 serve as the second lateral driving electrodes 13b; the first lateral drive electrode 13a is used to drive the corresponding first lateral movable electrode 19sl to displace along the first translation direction (as shown in the X1 direction in FIG. 2 ), and the second lateral drive electrode 13b is used to drive the corresponding The first lateral movable electrode 19s1 is displaced along the second translation direction (as shown in the X2 direction in FIG. 2 ), and the first translation direction is opposite to the second translation direction, thereby driving the movable platform 17 to be able to move along the first translation direction and the second translation direction. The second translation direction realizes left and right movement.

In this embodiment, the description is given by driving the first lateral movable electrode 19sl to move in the first translation direction as an example.

Therefore, when the first lateral movable electrode 19s1 moves toward the first lateral driving electrode 13a and attaches, the wire 23 on the side of the first lateral driving electrode 13a is stretched and deformed, and the wire 23 on the side of the second lateral driving electrode 13b is stretched and deformed. The lead wire 23 undergoes compression deformation.

As an example, the twelfth drive signal is applied to the first lateral drive electrode 13a, and the thirteenth drive signal is applied to the first lateral movable electrode 19s1 corresponding to the first lateral drive electrode 13a, so that the first lateral drive electrode 19s1 is loaded with the thirteenth drive signal. There is a third potential difference between 13a and the corresponding first lateral movable electrode 19sl, and the third potential difference is used to cause a fifth electrostatic charge between the first lateral driving electrode 13a and the corresponding first lateral movable electrode 19sl The attractive force, the fifth electrostatic attractive force, is used to move the first lateral movable electrode 19sl toward the first lateral driving electrode 13a and attract the first lateral driving electrode 13a.

As shown in FIG. 1 , in this embodiment, the moving mechanism includes a plurality of isolated displacement modules 20 , and the plurality of displacement modules 20 in the moving mechanism are arranged in an array on the fixed platform 10 .

Specifically, the relative directions of the lateral driving electrodes 13 and the first lateral movable electrodes 19s1 in the plurality of displacement modules 20 are the same. Therefore, a tenth load is applied to the first lateral driving electrodes 13a in all the displacement modules 20. Two driving signals, the thirteenth driving signal is applied to the first lateral movable electrodes 19sl corresponding to the first lateral driving electrodes 13a in all the displacement modules 20, so that all the first lateral movable electrodes 19sl move in the same translation direction .

In other embodiments, the second lateral driving electrode can also be used to displace the first lateral movable electrode along the moving direction. In this solution, the fourteenth drive signal is applied to the second lateral drive electrode, and the fifteenth drive signal is applied to the first lateral movable electrode corresponding to the second lateral drive electrode, so that the second lateral drive electrode and the phase are loaded with the fifteenth drive signal. The corresponding first lateral movable electrodes have the same potential, so that there is a first electrostatic repulsion force between the second lateral driving electrode and the corresponding first lateral movable electrode, and the first electrostatic repulsion force is used to make the first lateral movable electrode The electrodes move away from the corresponding second lateral driving electrodes, and make the first lateral driving electrodes and the corresponding first lateral movable electrodes fit together.

In the process of the first displacement processing, the moving step size of the first sub-displacement processing is determined by the preset distance d.

As shown in FIG. 2 , the step of the displacement processing further includes: after the first sub-displacement processing is performed, a second sub-displacement processing is performed, the movable platform 10 is fixed, and a third driving signal is applied to the first suction electrode 22 , the fourth drive signal is applied to the second pull-in electrode 17b, so that the first pull-in electrode 22 and the second pull-in electrode 17b are separated, and the first lateral movable electrode 19sl is moved back to the corresponding lateral drive electrode 13 The direction is moved twice the preset distance d.

By performing the second sub-displacement process, the first suction electrode 22 and the second suction electrode 17b are separated, and the first suction electrode 22 is moved in the opposite direction.

Wherein, the first suction electrode 22 and the second suction electrode 17b are disengaged, and the first lateral movable electrode 19s1 is moved in the direction away from the corresponding lateral driving electrode 13 by twice the preset distance d, Therefore, after the second sub-displacement process, the first suction electrode 22 is moved in the opposite direction relative to the initial position by the preset distance d. Correspondingly, after the first suction electrode 22 and the second suction electrode 17b are subsequently pulled together again , the movable platform 17 is equivalent to moving twice the preset distance d in the moving direction, so that the movable platform 17 starts the second displacement process, and each displacement process makes the movable platform 17 move twice the preset distance d, thereby improving the movement accuracy.

In this embodiment, the first lateral movable electrode 19sl is moved toward the corresponding lateral driving electrode 13 by electrostatic force driving, so that the first lateral movable electrode 19sl is moved away from the corresponding lateral driving electrode 13 Therefore, the lateral movement distance of the first lateral movable electrode 19sl can be precisely controlled, correspondingly, the single movement step length of the movable platform 17 can be precisely controlled, thereby improving the movement accuracy of the moving mechanism.

Specifically, when the first sub-displacement process is performed, the first lateral movable electrode 19s1 fixedly connected to the other end of the first suction electrode 22 is moved to the corresponding lateral driving electrode 13 and attached. Both ends of the first pull-in electrode 22 are fixedly connected to the first lateral movable electrode 19sl through the isolation layer 21, respectively. Therefore, during the operation of the moving mechanism, the first lateral movable electrode 19sl The maximum lateral movement distance of is twice the preset distance d, which facilitates further precise control of the single movement step length of the movable platform 17 .

In this embodiment, the moving mechanism includes a plurality of isolated displacement modules 20. After the first sub-displacement processing is performed, the plurality of displacement modules 20 are divided into multiple groups; after the first sub-displacement processing is performed, the The plurality of groups of displacement modules 20 perform the second sub-displacement processing and the subsequent third sub-displacement processing.

For example, the plurality of displacement modules 20 are divided into a first group and a second group, and after the first sub-displacement processing is performed, the first group is kept in the state after the first sub-displacement processing is performed, that is, the first sub-displacement processing is performed. The first electrostatic attraction force is maintained between the first suction electrode 22 and the second suction electrode 19b in the displacement modules 20 of the group, so that the first suction electrode 22 and the second suction electrode 22 in the displacement module 20 of the first group are attracted to each other. Then the second sub-displacement processing and the subsequent third sub-displacement processing are sequentially performed on the displacement modules 20 of the second group. After the displacement modules 20 of the second group complete the third sub-displacement processing , and then perform the second sub-displacement processing and the third sub-displacement processing on the displacement modules 20 of the first group in turn, so as to always keep the first suction electrodes 22 and the movable platform 17 in some displacement modules 20 to achieve electrostatic locking. The movable platform 17 in the step-by-step process is fixed, thereby fixing the position of the movable platform 17 .

In this embodiment, the third driving signal is applied to the first suction electrode 22, and the fourth driving signal is applied to the second suction electrode 17b, so that the first suction electrode 22 and the second suction electrode 17b are separated, so as to ensure the When the position of the movable platform 17 is fixed, the first suction electrode 22 is moved in the opposite direction.

In this embodiment, a third driving signal is applied to the first suction electrode 22 to make the first suction electrode 22 in a floating state, so that the first suction electrode 17 b and the first suction electrode 22 are connected to each other. The electrostatic attractive force disappears, and the second suction electrode 17b and the first suction electrode 22 are separated from each other.

In other embodiments, in the process of performing the second sub-displacement process, a third driving signal may also be applied to the first pull-in electrode 22, and a fourth drive signal may be applied to the second pull-in electrode, so that the second pull-in electrode and the second pull-in electrode are loaded with a fourth drive signal. There is a sixth electrostatic attractive force between the first suction electrodes, and the sixth electrostatic attractive force is smaller than the first electrostatic attractive force, and is used to separate the second suction electrode from the first suction electrode. Wherein, the sixth electrostatic attraction is smaller than the first electrostatic attraction, thereby reducing the electrostatic attraction between the second attraction electrode and the first attraction electrode, which can also make the second attraction electrode and the first attraction electrode break away.

In this embodiment, in the process of performing the second sub-displacement process, the sixteenth driving signal is applied to the second lateral driving electrode 13b, and the first lateral movable electrode 19sl corresponding to the second lateral driving electrode 13b is loaded with the sixth driving signal. Seventeen driving signals, so that there is a fourth potential difference between the second lateral driving electrode 13b and the corresponding first lateral movable electrode 19s1, and the fourth potential difference is used to make the second lateral driving electrode 13b and the corresponding first lateral driving electrode 19sl. There is a seventh electrostatic attractive force between the lateral movable electrodes 19sl, and the seventh electrostatic attractive force is used to move the first lateral movable electrode 19sl to the second lateral driving electrode 13b and attract with the second lateral driving electrode 13b.

Correspondingly, in this embodiment, in the process of performing the second sub-displacement process, the first lateral driving electrodes 13a and the first lateral movable electrodes 19sl corresponding to the first lateral driving electrodes 13a are in a floating state, Thereby, the fifth electrostatic attraction force is eliminated.

In other embodiments, the first laterally movable electrode can also be used to move the first laterally movable electrode in the opposite direction. In this solution, the eighteenth drive signal is applied to the first lateral drive electrode, and the nineteenth drive signal is applied to the first lateral movable electrode corresponding to the first lateral drive electrode, so that the first lateral drive electrode and the phase are loaded with the nineteenth drive signal. The corresponding first lateral movable electrodes have the same potential, so that there is a second electrostatic repulsion force between the first lateral driving electrodes and the corresponding first lateral movable electrodes, and the second electrostatic repulsion force is used to make the first lateral movable electrodes The electrodes move away from the corresponding first lateral driving electrodes, and make the second lateral driving electrodes and the corresponding first lateral movable electrodes fit together.

It should be noted that, in this embodiment, the displacement module 20 further includes: a first longitudinal driving electrode 11b located on the fixed platform 10 below the first bottom electrode 19b. Therefore, in the process of executing the second sub-displacement process, the seventh driving signal is also applied to the longitudinal movable electrode 19b, and the eighth driving signal is applied to the first longitudinal driving electrode 11b, so that the longitudinal movable electrode 19b and the first longitudinal electrode 11b are loaded with the eighth driving signal. There is a fifth potential difference between the driving electrodes 11b, and the fifth potential difference is used to cause a third electrostatic attraction between the longitudinal movable electrode 19b and the first longitudinal driving electrode 11b, and the third electrostatic attraction is used to make the longitudinal The movable electrode 19b moves toward the first longitudinal drive electrode 11b.

In the process of performing the second sub-displacement process, it is necessary to disengage the second suction electrode 17b from the first suction electrode 22, and to move the first suction electrode 22 in the opposite direction relative to the initial position by a preset distance. Therefore, by The longitudinal movable electrode 19b is moved to the first longitudinal driving electrode 11b, so that the second pull-in electrode 17b and the first pull-in electrode 22 can be separated better, thereby reducing the movement of the movable platform during the reverse movement. 17 Probability of moving.

Wherein, the first vertical driving electrode 11b is connected to the horizontal movable electrode 19s, so the driving signals loaded on the first vertical driving electrode 11b and the horizontal movable electrode 19s are the same.

As shown in FIG. 2 , the step of the displacement processing further includes: after the second sub-displacement processing is performed, a third sub-displacement processing is performed, a fifth driving signal is applied to the first pull-in electrode 22 , and a fifth drive signal is applied to the second pull-in electrode 22 . 17b is loaded with the sixth drive signal, so that there is a sixth potential difference between the first suction electrode 22 and the second suction electrode 17b, and the sixth potential difference is used to make the first suction electrode 22 and the second suction electrode 17b. There is a second electrostatic attraction between them, and the second electrostatic attraction is used to make the first attraction electrode 22 and the second attraction electrode 17b attract.

By performing the third sub-displacement process, the first suction electrode 22 and the movable platform 17 can be electrostatically locked again, so as to prepare for the next displacement process.

Moreover, when the second sub-displacement process is performed, the first lateral movable electrode 19s1 moves in the opposite direction with respect to the initial position by the preset distance d. Therefore, after the first suction electrode 22 is electrostatically locked with the movable platform 17 again , which is equivalent to that the movable platform 17 moves twice the preset distance in the moving direction.

It should be noted that, in the process of performing the third sub-displacement process, the first lateral movable electrode 19s1 fixedly connected to the other end of the first suction electrode 22 is kept in contact with the corresponding lateral driving electrode 13, thereby fixing the the position of the movable platform 17 and prepare for the next displacement processing.

It should also be noted that, in other embodiments, the opposite directions of the lateral driving electrodes and the first lateral movable electrodes in the plurality of displacement modules are perpendicular to each other. Specifically, part of the displacement modules are used to drive the movable platform to displace along the first transverse direction, and the remaining displacement modules are used to drive the movable platform to displace along the second transverse direction, and the first transverse direction is perpendicular to the second transverse direction; The relative direction of the lateral driving electrode and the first lateral movable electrode in the displacement module is the same as the first lateral direction, and the relative direction of the lateral driving electrode and the first lateral movable electrode in the remaining displacement modules is the same as the second lateral direction.

In this solution, in the process of performing the displacement processing, the displacement processing of the first number of times is performed on the displacement module corresponding to the first horizontal direction, and the displacement processing of the second number of times is performed on the displacement module corresponding to the second horizontal direction.

Specifically, the first number of times and the second number of times may be different or the same. Wherein, by performing the displacement processing for the first number of times on the displacement modules corresponding to the first lateral direction, and performing the displacement processing for the second number of times on the displacement modules corresponding to the second lateral direction, the movable platform can be moved along the first lateral direction. and the second transverse direction move respectively, so that the movable platform can realize the movement of the two-dimensional plane.

The present invention also provides another driving method of the aforementioned moving mechanism. With reference to FIG. 4 , FIG. 4 is a cross-sectional view of another embodiment of the moving mechanism of the present invention.

The similarities between the embodiments of the present invention and the previous embodiments will not be repeated here. The differences between the embodiments of the present invention and the previous embodiments are: as shown in FIG. 4 , the moving mechanism further includes: a second longitudinal driving electrode 44, Located on the top surface of the support column 45 , the second vertical driving electrodes 44 are separated from the horizontal driving electrodes (not shown), and the second vertical driving electrodes 44 and the first attracting electrodes 41 can be electrostatically attracted.

Correspondingly, in the process of executing the second sub-displacement process, the eleventh drive signal is also applied to the second longitudinal driving electrode 44, so that there is a fifth electrostatic attraction between the first attracting electrode 41 and the second longitudinal driving electrode 44. The fifth electrostatic attraction force is used to move the first pull-in electrode 41 toward the second longitudinal driving electrode 44 .

Similar to the first longitudinal driving electrode, after the lateral movable electrode drives the movable platform to move laterally by a single moving step, the second longitudinal driving electrode 44 and the first suction electrode 41 are electrostatically attracted, so that the first suction electrode 41 is electrostatically attracted. 41 is separated from the second suction electrode. Therefore, by arranging the second longitudinal driving electrode 44 on the top surface of the support column 45, the pull-down capability and efficiency of the second suction electrode can be improved, so that the second suction electrode can be pulled into the first suction electrode more quickly. The electrodes 41 are separated.

Specifically, in the process of executing the second sub-displacement process, the eleventh drive signal is also loaded to the second longitudinal driving electrode 44, so that there is a seventh potential difference between the second pulling electrode and the second longitudinal driving electrode 44, The seventh potential difference causes a fifth electrostatic attraction force between the first pull-in electrode 41 and the second longitudinal driving electrode 44 .

Therefore, in the process of performing the second sub-displacement process, the first pull-in electrode 41 is not in a floating state. Correspondingly, load the third drive signal to the first suction electrode 41 and load the fourth drive signal to the second suction electrode, so that there is a seventh electrostatic attraction between the first suction electrode 41 and the second suction electrode, The seventh electrostatic attractive force is smaller than the first electrostatic attractive force, and is used to separate the first suction electrode 41 and the second suction electrode.

Similarly, when the moving mechanism is working, the locking module is in a pull-down state, so as to be unlocked with the movable platform, thereby enabling the movable platform to move. Therefore, in the locking module, by electrostatically attracting the second longitudinal driving electrode 44 and the first attracting electrode 41, the pull-down capability and efficiency of the locking module are improved, so that the movable platform and the locking module can be realized more quickly. Unlock the bit module.

For the specific description of the driving method in this embodiment, reference may be made to the corresponding descriptions in the foregoing embodiments, which will not be repeated in this embodiment.

The present invention also provides yet another driving method of the aforementioned moving mechanism. With reference to FIG. 7 , FIG. 7 is a cross-sectional view of yet another embodiment of the moving mechanism of the present invention.

The similarities between the embodiments of the present invention and the foregoing embodiments will not be repeated here. The differences between the embodiments of the present invention and the foregoing embodiments are: as shown in FIG. 7 , the moving mechanism further includes: a surrounding wall structure (not shown). marked), located on the fixed platform (not marked), and the surrounding wall structure encloses a cavity (not marked); the top limiting structure 70b is located at the end of the surrounding wall structure away from the fixed platform, and extends to the part of the movable platform 72 in the air on the area.

The transverse movable electrode (not shown) and the movable platform 72 are located in the cavity; the movable platform 72 is provided with a third longitudinal driving electrode 70a, and the third longitudinal driving electrode 70a faces the movable platform 72; the movable platform 72 It also includes a third pull-in electrode 72b located on the movable pole plate 72a, and the third pull-in electrode 72b and the third longitudinal driving electrode 70a can be separated and pulled in.

Correspondingly, in the process of executing the second sub-displacement process, the twelfth drive signal is also loaded to the third vertical drive electrode 70a, and the thirteenth drive signal is loaded to the third pull-in electrode 72b, so that the third vertical drive There is an eighth potential difference between the electrode 70a and the third pull-in electrode 72b, and the eighth potential difference causes a sixth electrostatic attraction between the third longitudinal driving electrode 70a and the third pull-in electrode 72b, and the sixth electrostatic attraction is used for The third longitudinal driving electrode 70 a and the third pulling electrode 72 b are pulled together to fix the movable platform 72 .

After the lateral movable electrode (not shown) drives the movable platform 72 to move laterally by a single moving step, the third longitudinal driving electrode 70a and the third suction electrode 72b are pulled together, so that the movable platform 72 moves toward the top limit structure. 70b close together, so that the movable platform 72 is fixed by the third longitudinal drive electrode 70a, in this case, the lateral movable electrode (not shown) and the longitudinal movable electrode (not shown) are pulled down synchronously, so that all the first pull-in The electrodes are separated from the second suction electrodes (not shown), so that all the first suction electrodes move in the opposite direction relative to the initial position by a preset distance, thereby improving the efficiency of eliminating electrostatic locking and re-electrostatic suction.

It should be noted that, in this embodiment, the second suction electrode in the movable platform is powered off, so that the second suction electrode is in a floating state, so that the first displacement electrode can be loaded with the required potential, or, The first displacement electrode is in a floating state, and the driving method is more flexible.

Correspondingly, an embodiment of the present invention further provides an electronic device. Referring to FIG. 30, a schematic structural diagram of an embodiment of an electronic device of the present invention is shown.

The electronic device 700 in the embodiment of the present invention includes: a moved component; and the moving mechanism provided by the present invention.

Wherein, the moved parts include image sensors, radio frequency generators, mirrors, prisms, gratings or waveguides.

Using the moving mechanism provided in the embodiment of the present invention to move the moved component is beneficial to achieve a larger stroke and precise displacement, reduce process costs, and improve the user's experience with the electronic device 700 .

The electronic device may be an intermediate assembly, such as an imaging device, a lens assembly, and the like. The electronic device may also be a terminal device. For example, the electronic device 700 may be a mobile phone, a tablet computer, a camera, or a video camera, and other devices with shooting functions.

As an example, when the moving part is an image sensor, the electronic device 700 can be an imaging device, and the image sensor is moved by using the moving mechanism, and super-resolution is realized by precisely controlling the single moving step size of the moving mechanism; At the same time, by precisely controlling the multi-step movement to achieve the effect of a large stroke, the image sensor can compensate for the displacement of the imaging point, thereby realizing optical anti-shake.

Moreover, compared with the method of moving the lens, the size of the image sensor is smaller and the weight is lower, and the optical anti-shake is realized by moving the image sensor, which is beneficial to saving costs and improving the convenience and stability of the optical anti-shake, and the present invention provides The moving mechanism has the advantages of large stroke, high moving accuracy and fast speed, which is conducive to realizing precise translation of the image sensor to achieve super-resolution, and at the same time improving the effectiveness and accuracy of electronic equipment for optical anti-shake, and correspondingly improve image quality.

As an example, when the electronic device 700 is a terminal device with a shooting function, in the electronic device 700 of the embodiment of the present invention, the image sensor can be moved by a moving mechanism, thereby simultaneously realizing super-resolution and optical image stabilization.

Moreover, compared with the method of moving the lens, the size of the image sensor is smaller and the weight is lower, and the optical anti-shake is realized by moving the image sensor, which is beneficial to saving costs and improving the convenience and stability of the optical anti-shake, and the present invention provides The moving mechanism has the advantages of large stroke, high moving accuracy and fast speed, which is conducive to realizing precise translation of the image sensor to achieve super-resolution, and at the same time improving the effectiveness and accuracy of the imaging assembly for optical image stabilization, Correspondingly improving the imaging quality, for example, improving the imaging clarity, correspondingly improves the shooting quality of the electronic device 700, and is also conducive to improving the user's experience in use.

Correspondingly, an embodiment of the present invention further provides an imaging device, including: the moving mechanism provided by the embodiment of the present invention; a moved part fixed on a movable platform, and the moved part is an image sensor.

Moving the moved component by the moving mechanism provided in the embodiment of the present invention is beneficial to realize a larger stroke and precise displacement, thereby improving the imaging quality.

In this embodiment, the moved component is an image sensor.

Specifically, the imaging device further includes: a lens assembly corresponding to the image sensor, the lens assembly being located above the image sensor and supported by a fixed frame on the periphery of the moving mechanism.

Therefore, the moving mechanism provided in this embodiment is used to move the image sensor, and the lens assembly corresponds to the image sensor and is located above the image sensor, so as to adjust the optical path and achieve clear imaging; by using the moving mechanism to move the image sensor, super-resolution is achieved; The image sensor compensates for the displacement of the imaging point, thereby realizing optical image stabilization.

Moreover, compared with the method of moving the lens group, the size of the image sensor is smaller and the weight is lower, and the optical anti-shake is realized by moving the image sensor, which is beneficial to saving costs and improving the convenience and stability of the optical anti-shake, and the present invention The provided moving mechanism has the advantages of large stroke, high moving accuracy and high speed, thereby facilitating the realization of precise translation of the image sensor to achieve super-resolution, and at the same time improving the effectiveness and accuracy of the imaging device for optical image stabilization , correspondingly improve the image quality.

In this embodiment, the fixed platform includes an integrated circuit board, or the fixed platform is located on the integrated circuit board; the lateral driving electrodes, the lateral movable electrodes, the first vertical driving electrodes, the vertical movable electrodes and the lead wires connected to the integrated circuit board.

In this embodiment, the moving mechanism is formed by a semiconductor process, and the moving mechanism has high process compatibility with the manufacturing process of the driving circuit of the imaging device, that is, the moving mechanism can be formed in the same semiconductor process and integrated circuit boards.

In other embodiments, the moving mechanism and the image sensor may also be formed in the same semiconductor process. In addition, the moving mechanism is formed by a semiconductor process. Therefore, when the imaging device is fabricated by a packaging process, the imaging device can be fabricated by wafer-level packaging, which is beneficial to improve packaging efficiency and packaging reliability.

Specifically, the image sensor includes a CMOS image sensor or a CCD image sensor.

Although the present invention is disclosed above, the present invention is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention should be based on the scope defined by the claims.

Claims

A moving mechanism, characterized in that it includes:

The fixed platform, the direction parallel to the surface of the fixed platform is the transverse direction, and the direction perpendicular to the surface of the fixed platform is the longitudinal direction;

a lateral drive electrode, located on the fixed platform;

The lateral movable electrodes are arranged laterally with respect to the lateral driving electrodes and have a preset spacing, and the lateral movable electrodes include a first lateral movable electrode opposite to the lateral driving electrodes;

a first longitudinal driving electrode, located on the fixed platform;

The longitudinal movable electrodes are arranged longitudinally relative to the first longitudinal driving electrodes, and the longitudinal movable electrodes and the first longitudinal driving electrodes can be electrostatically attracted, wherein the transverse movable electrodes and the longitudinal The moving electrodes are connected;

a wire, one end of the wire is fixed, and the other end is fixed and electrically connected to the horizontal movable electrode or the vertical movable electrode, and supports the horizontal movable electrode and the vertical movable electrode to be in a suspended state;

a first pull-in electrode, located above the lateral movable electrode, and the first pull-in electrode is fixedly connected to the first lateral movable electrode through an isolation layer;

A movable platform for supporting the moved part, the movable platform includes a second suction electrode and a movable pole plate located on the second suction electrode, the second suction electrode is in the longitudinal direction The upper part is arranged opposite to the first suction electrode.
The moving mechanism of claim 1, wherein the moving mechanism further comprises: a support column located on the fixed platform;

The lateral driving electrodes are fixed on the side surfaces of the support columns.
The moving mechanism according to claim 1, characterized in that, along the lateral direction, both ends of the first suction electrode are fixedly connected to the first lateral movable electrode through the isolation layer, respectively.
The moving mechanism according to claim 1, characterized in that, along the arrangement direction of the first laterally movable electrode and the laterally driving electrode, the first suction electrode moves toward the two sides of the first laterally movable electrode. The side overhangs extend over a partial area of the fixed platform.
The moving mechanism according to claim 1, wherein the moving mechanism further comprises: a locking shaft located on the top of at least one of the first suction electrodes;

A surface of the movable platform facing the locking shaft has a locking groove, and the locking groove and the locking shaft can be separated or engaged with each other.
The moving mechanism of claim 1, wherein the laterally movable electrode further comprises: a second laterally movable electrode;

The first pull-in electrode is fixed and electrically connected to the second lateral movable electrode.
The moving mechanism according to claim 2, wherein the moving mechanism further comprises: a second longitudinal driving electrode located on the top surface of the support column, the second longitudinal driving electrode being in phase with the lateral driving electrode isolation, the second longitudinal drive electrode and the first pull-in electrode can electrostatically pull in.
The moving mechanism of claim 2, wherein, along the height direction of the support column, the support column includes a plurality of stacked sub-support columns.
The moving mechanism according to claim 2, wherein the support column comprises: a first sub-support column, and a second sub-support column suspended above the first sub-support column, the second sub-support column the support columns are located on both sides of the first sub-support column in the lateral direction;

Wherein, the lateral drive electrodes located on the side of the first sub-support column are connected to the second sub-support column via the bottom surface of the second sub-support column located on the same side of the first sub-support column. The lateral drive electrodes facing away from the other side of the second sub-support column are connected.
The moving mechanism according to claim 1, wherein the moving mechanism further comprises: a surrounding wall structure located on the fixed platform, the surrounding wall structure enclosing a cavity;

The laterally movable electrode and the movable platform are located in the cavity.
The moving mechanism according to claim 10, wherein a flexible wire is arranged between the surrounding wall structure and the second suction electrode.
12. The moving mechanism of claim 11, wherein the flexible wire comprises a spring wire.
The moving mechanism according to claim 10, characterized in that, the moving mechanism further comprises: a top limiting structure, located at one end of the surrounding wall structure away from the fixed platform, and extending suspended to the end of the movable platform. on some areas.
The moving mechanism of claim 1, wherein a third longitudinal driving electrode is suspended and fixed above the movable platform, and the third longitudinal driving electrode faces the movable platform;

The movable platform further includes a third suction electrode fixed on the movable pole plate, and the third suction electrode and the third longitudinal driving electrode can be separated and pulled together.
The moving mechanism according to claim 1, wherein the moving mechanism further comprises: a fixed electrode located on the fixed platform;

The wire is connected to the fixed electrode.
The moving mechanism according to claim 1, wherein the moving mechanism comprises a plurality of isolated displacement modules, and the displacement modules comprise the lateral driving electrodes, the lateral movable electrodes, the first longitudinal driving electrodes, the longitudinal driving electrodes, and the longitudinal driving electrodes. The movable electrodes and the wires, and the plurality of displacement modules in the moving mechanism are arranged in an array on the fixed platform.
17. The moving mechanism according to claim 16, wherein the transverse driving electrodes and the first transverse movable electrodes in the plurality of displacement modules have the same relative direction or are perpendicular to each other.
The moving mechanism according to claim 1, wherein the lead wire, the vertical movable electrode and the lateral movable electrode are integral structures.
A method for forming a moving mechanism, comprising:

A fixed platform is provided, including a work area, the direction parallel to the surface of the fixed platform is the transverse direction, and the direction perpendicular to the surface of the fixed platform is the longitudinal direction;

forming a first longitudinal drive electrode on the fixed platform of the working area;

A support column is formed on the fixed platform, and the support column of the working area is isolated from the first longitudinal driving electrode;

forming lateral drive electrodes on the sides of the support column;

forming a first sacrificial layer conformally covering the support column, the lateral driving electrode and the first vertical driving electrode, and the thickness of the first sacrificial layer located on the lateral side of the lateral driving electrode is a preset distance;

In the working area, a conductive layer is formed on the first sacrificial layer, the conductive layer includes a wire with one end fixed, a longitudinal movable electrode opposite to the first longitudinal driving electrode and connected to the wire, and a lateral movable electrode opposite to the lateral driving electrode and connected to the longitudinal movable electrode, wherein the lateral movable electrode includes a first lateral movable electrode opposite to the side surface of the support column;

forming a second sacrificial layer covering the first sacrificial layer and the conductive layer, the second sacrificial layer being flush with the top surface of the conductive layer;

forming an isolation layer covering the conductive layer and the second sacrificial layer above the top surfaces of the support pillars;

In the working area, a first pull-in electrode is formed on the isolation layer above the top surface of the conductive layer;

forming a third sacrificial layer covering the second sacrificial layer and the first pull-in electrode;

A movable platform is formed on the third sacrificial layer of the working area, and the movable platform includes a second suction electrode and a movable electrode plate located on the second suction electrode;

After the movable platform is formed, the third sacrificial layer, the second sacrificial layer and the first sacrificial layer are removed.
The method for forming a moving mechanism according to claim 19, wherein in the step of forming the first suction electrode, the first suction electrode is in a direction perpendicular to the side surface of the support column. extending to a partial area of the second sacrificial layer toward both sides of the support column.
The method for forming a moving mechanism according to claim 19, wherein, before forming the third sacrificial layer covering the second sacrificial layer and the first suction electrode, the forming method further comprises: forming at least one of the the locking shaft on the top of the first suction electrode;

In the step of forming the third sacrificial layer, the third sacrificial layer also conformally covers the locking shaft;

After removing the third sacrificial layer, the second sacrificial layer and the first sacrificial layer, a locking groove is formed in the surface of the movable platform facing the locking shaft.
The method for forming a moving mechanism according to claim 19, wherein in the step of forming the conductive layer on the first sacrificial layer, the lateral movable electrode further comprises a first surface opposite to the end surface of the support column. two lateral movable electrodes, the second lateral movable electrodes are isolated from the first lateral movable electrodes;

After the isolation layer is formed and before the first pull-in electrode is formed, the forming method further includes: forming a first opening in the isolation layer of the working area, and the first opening exposes the second laterally adjustable the top of the moving electrode;

In the step of forming the first pull-in electrode, the first pull-in electrode of the working area is also filled in the first opening and connected to the second lateral movable electrode.
The method for forming a moving mechanism according to claim 19, wherein in the step of forming a lateral driving electrode on the side surface of the supporting column, a second longitudinal driving electrode is also formed on the top surface of the supporting column, the second longitudinal drive electrodes are isolated from the lateral drive electrodes;

In the step of forming the first sacrificial layer, the first sacrificial layer also covers the second vertical driving electrode.
The method for forming a moving mechanism according to claim 19, wherein in the step of forming an isolation layer covering the top surface of the conductive layer, the isolation layer also covers the second sacrificial layer;

After forming the first pull-in electrode and before forming the third sacrificial layer, the forming method further includes: removing the isolation layer exposed by the first pull-in electrode.
The method for forming a moving mechanism according to claim 19, wherein the fixed platform further comprises a limit area surrounding the work area;

In the step of forming the conductive layer, the conductive layer further covers the first sacrificial layer in the limiting region, and the working region is isolated from the conductive layer in the limiting region;

After the isolation layer is formed and before the first pull-in electrode is formed, the forming method further includes: forming a second opening in the isolation layer of the limiting region, and the second opening exposes the conductive layer. top;

In the step of forming the first pull-in electrode, in the limiting region, a first limiting layer is formed on the isolation layer above the top surface of the conductive layer, and the first limiting layer is filled in the The second opening is connected to the conductive layer of the limiting area, and a flexible wire is also formed at the junction of the working area and the limiting area, and one end of the flexible wire is connected to the first limiting layer. connected;

In the step of forming the third sacrificial layer, the third sacrificial layer also covers the flexible wire and the first limiting layer;

Before forming the movable platform on the third sacrificial layer in the working area, the forming method further includes: in the limiting area, forming a third opening and a fourth opening in the third sacrificial layer, so that the The third opening exposes the first limiting layer, and the fourth opening exposes the end of the flexible wire that is not connected to the first limiting layer;

In the step of forming a movable platform on the third sacrificial layer of the working area, the movable platform is further formed in the fourth opening and connected with the flexible wire, and also in the third opening A second limit layer is formed, the second limit layer is isolated from the movable platform, and in the limit area, the second limit layer, the first limit layer, the conductive layer, the first limit The sacrificial layer, the lateral drive electrodes and the support pillars are used to form the surrounding wall structure.
The method for forming a moving mechanism according to claim 25, wherein after forming the second limiting layer, the forming method further comprises:

A fourth sacrificial layer is formed on the movable platform and the third sacrificial layer exposed from the second limiting layer, the fourth sacrificial layer covers the movable platform and exposes the second limiting layer top surface;

A top limiting structure is formed on the top of the second limiting layer, and the top limiting structure also extends to a partial area of the movable platform.
The method for forming a moving mechanism according to claim 26, wherein in the step of forming a movable platform on the third sacrificial layer of the working area, the movable platform further comprises a movable plate located on the movable plate. on the third pull-in electrode;

Before forming the top limiting structure on the top of the second limiting layer, the forming method further includes: forming a third longitudinal driving electrode on the top surface of the first limiting layer, the third longitudinal driving electrode further extending over a part of the movable platform;

The top limiting structure is formed on the third longitudinal driving electrode.
The method for forming a moving mechanism according to claim 19, wherein the step of forming the support column comprises: forming a plurality of stacked sub-support columns on the fixed platform.
The method for forming a moving mechanism according to claim 19, wherein in the step of forming the conductive layer on the first sacrificial layer, the conductive layer further comprises a fixed electrode on the fixed platform;

The wire is connected to the fixed electrode.
A driving method for a moving mechanism as claimed in any one of claims 1 to 18, characterized in that, comprising:

A first initial drive process is performed, so that both the first lateral movable electrode and the lateral drive electrode are in a floating state, and a first drive signal is loaded to the first pull-in electrode and loaded to the second pull-in electrode a second driving signal, to make a first electrostatic attraction force between the first suction electrode and the second suction electrode, and to make the first suction electrode and the second suction electrode pull in;

After the first initial driving process is performed, one or more displacement processes are performed, and the steps of the displacement process include:

performing a first sub-displacement process to move and fit the first lateral movable electrodes to the corresponding lateral driving electrodes;

After the first sub-displacement process is performed, a second sub-displacement process is performed, the movable platform is fixed, and a third drive signal is applied to the first pull-in electrode, and a third drive signal is applied to the second pull-in electrode. Four driving signals to separate the first pull-in electrode and the second pull-in electrode, and move the first lateral movable electrode by twice the preset distance in the direction away from the corresponding lateral drive electrode ;

After the second sub-displacement process is performed, a third sub-displacement process is performed, a fifth drive signal is applied to the first pull-in electrode, and a sixth drive signal is applied to the second pull-in electrode, so that the first pull-in electrode is loaded with a sixth drive signal. There is a second electrostatic attraction between a suction electrode and a second suction electrode, and the second electrostatic attraction is used to make the first suction electrode and the second suction electrode attract.
31. The driving method according to claim 30, wherein during the second sub-displacement process, a seventh driving signal is also applied to the vertical movable electrode, and a seventh driving signal is applied to the first vertical driving electrode. Eight driving signals, so that there is a third electrostatic attractive force between the longitudinal movable electrode and the first longitudinal driving electrode, and the third electrostatic attractive force is used to move the longitudinal movable electrode toward the first longitudinal driving electrode.
The driving method according to claim 30, wherein the moving mechanism further comprises: a locking shaft located on the top of at least one of the first suction electrodes;

A surface of the movable platform facing the locking shaft is provided with a locking groove, and the locking groove and the locking shaft can be separated or engaged with each other;

During the process of performing the first initial driving process, the locking slot is engaged with the locking shaft;

After performing the first initial driving process and before performing the displacement processing, the driving method further includes: performing a second initial driving process, and applying a ninth driving signal to the longitudinal movable electrode below the locking shaft, A tenth driving signal is applied to the first longitudinal driving electrode below the locking shaft, so that there is a fourth electrostatic attraction between the longitudinal movable electrode and the first longitudinal driving electrode, and the fourth electrostatic attraction is used for The longitudinal movable electrode and the first longitudinal driving electrode are pulled together, and the locking shaft and the locking groove are separated.
The driving method according to claim 30, wherein the moving mechanism further comprises: a second longitudinal driving electrode located on the top surface of the support column, the second longitudinal driving electrode being in phase with the transverse driving electrode isolation, the second longitudinal drive electrode and the first pull-in electrode can electrostatically pull in;

During the process of executing the second sub-displacement process, an eleventh drive signal is also applied to the second longitudinal driving electrode, so that there is a fifth electrostatic attraction between the first attracting electrode and the second longitudinal driving electrode force, and the fifth electrostatic attractive force is used to move the first attracting electrode toward the second longitudinal driving electrode.
The driving method according to claim 30, wherein the moving mechanism further comprises: a surrounding wall structure, located on the fixed platform, the surrounding wall structure enclosing a cavity; a top limit structure, located on the One end of the surrounding wall structure is far away from the fixed platform, and is suspended to extend to a part of the movable platform; wherein,

the laterally movable electrode and the movable platform are located in the cavity;

A third longitudinal driving electrode is arranged above the movable platform, and the third longitudinal driving electrode faces the movable platform;

The movable platform further includes a third suction electrode located on the movable pole plate, and the third suction electrode and the third longitudinal driving electrode can be separated and pulled together;

In the process of executing the second sub-displacement process, the step of fixing the movable platform includes: applying a twelfth drive signal to the third longitudinal drive electrode, and applying a thirteenth drive signal to the third pull-in electrode The driving signal enables a sixth electrostatic attraction force between the third longitudinal driving electrode and the third suction electrode, and is used for electrostatically attracting the third longitudinal driving electrode and the third suction electrode.
The driving method according to claim 30, wherein the moving mechanism comprises a plurality of isolated displacement modules, and the displacement modules comprise the lateral driving electrodes, the lateral movable electrodes, the first longitudinal driving electrodes, the longitudinal driving electrodes, and the longitudinal driving electrodes. a movable electrode and the wire;

In the process of performing the displacement processing, after the first sub-displacement processing is performed, a plurality of the displacement modules are divided into multiple groups, and the second sub-displacement modules are sequentially performed on the displacement modules of the multiple groups respectively. deal with.
An electronic device, comprising:

moving parts;

A moving mechanism as claimed in any one of claims 1 to 18.
37. The electronic device of claim 36, wherein the moved component comprises an image sensor, a radio frequency generator, a mirror, a prism, a grating, or a waveguide.
An imaging device, characterized in that it includes:

The moving mechanism of any one of claims 1 to 18;

The moved part is fixed on the movable platform, and the moved part is an image sensor.
The imaging device of claim 38, wherein the fixed platform comprises an integrated circuit board, or the fixed platform is located on the integrated circuit board;

The horizontal driving electrodes, the horizontal movable electrodes, the first vertical driving electrodes, the vertical movable electrodes and the wires are electrically connected to the integrated circuit board.
The imaging device of claim 38, wherein the imaging device further comprises: a lens assembly corresponding to the image sensor, the lens assembly is located above the image sensor, and is surrounded by the moving mechanism fixed frame support.