WO2022014560A1 - 反射防止部材、並びに前記反射防止部材を用いた偏光板、画像表示装置及び反射防止性物品、並びに、反射防止部材の選定方法 - Google Patents

反射防止部材、並びに前記反射防止部材を用いた偏光板、画像表示装置及び反射防止性物品、並びに、反射防止部材の選定方法 Download PDF

Info

Publication number
WO2022014560A1
WO2022014560A1 PCT/JP2021/026233 JP2021026233W WO2022014560A1 WO 2022014560 A1 WO2022014560 A1 WO 2022014560A1 JP 2021026233 W JP2021026233 W JP 2021026233W WO 2022014560 A1 WO2022014560 A1 WO 2022014560A1
Authority
WO
WIPO (PCT)
Prior art keywords
less
refractive index
index layer
antireflection member
low refractive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2021/026233
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
翔 鈴木
芳成 松田
篤 堀井
徳明 河北
圭介 遠藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to CN202180056486.9A priority Critical patent/CN116057422B/zh
Priority to US18/004,780 priority patent/US12560744B2/en
Priority to KR1020237004885A priority patent/KR102872650B1/ko
Priority to EP21841603.0A priority patent/EP4191291A4/en
Priority to JP2022536367A priority patent/JPWO2022014560A1/ja
Publication of WO2022014560A1 publication Critical patent/WO2022014560A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/02—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by features of form at particular places, e.g. in edge regions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/10—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material
    • B32B3/14—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material characterised by a face layer formed of separate pieces of material which are juxtaposed side-by-side
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133502—Antiglare, refractive index matching layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H05B33/14—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/85—Packages
    • H10H20/855—Optical field-shaping means, e.g. lenses
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/38—Anti-reflection arrangements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/50—Protective arrangements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/03—Function characteristic scattering

Definitions

  • the present disclosure relates to an antireflection member, a polarizing plate using the antireflection member, an image display device and an antireflection article, and a method for selecting an antireflection member.
  • a liquid crystal display device an organic EL display device, a display device such as a micro LED display device, a showcase, or the like is provided with an antireflection member on the surface of the device in order to improve visibility.
  • touch panel type image display devices such as in-vehicle displays such as car navigation systems, tablets, smartphones, etc., which the user directly touches the screen to operate, have become widespread, and antireflection members are also used in touch panel type image display devices. Is provided.
  • the antireflection member is manufactured, for example, by forming an antireflection layer on a light-transmitting substrate.
  • an antireflection layer a dry method of forming an inorganic thin film having a different refractive index by a sputtering method or the like, a wet method of forming a resin layer containing fine particles by coating, and the like are known.
  • the antireflection member having a resin layer has advantages that the change in the oblique reflection hue is small, the chemical stability such as alkali resistance is excellent, and the cost is low, as compared with the antireflection member having an inorganic thin film. Excellent in sex.
  • the antireflection member having a resin layer tends to be inferior in mechanical properties such as scratch resistance as compared with the antireflection member having an inorganic thin film. Therefore, the antireflection member having a resin layer is required to have improved scratch resistance.
  • the low refractive index layer contains hollow inorganic nanoparticles such as silica and solid inorganic nanoparticles. Further, the solid inorganic nanoparticles are unevenly distributed on the interface side with the hard coat, and the hollow inorganic nanoparticles are unevenly distributed on the opposite side of the interface. By doing so, both high scratch resistance and low reflectance are achieved.
  • the reactive silica fine particles in the low refractive index layer are unevenly distributed at the interface on the hard coat layer side and / or the interface on the opposite side to the hard coat layer, and the hollow silica fine particles are densely distributed in the low refractive index layer. It is disclosed that the surface hardness is improved by putting the particles in a filled state.
  • Patent Document 4 discloses that an antireflection film in which hollow silica fine particles and fine silica particles are dispersed in a binder containing reactive silanes as a main component is formed on an optical substrate.
  • the antireflection member having the resin layers of Patent Documents 1 to 4 could not obtain the same steel wool resistance as the antireflection member having the inorganic thin film.
  • the antireflection members of Patent Documents 1 to 4 contain hollow particles in the low refractive index layer in order to realize low reflectance. Hollow particles tend to achieve low reflectance, but have low strength. Therefore, it is considered that the antireflection members of Patent Documents 1 to 4 containing hollow particles are difficult to realize excellent steel wool resistance.
  • the antireflection member is often applied to a touch panel or other place where a person often touches it. Therefore, the antireflection member having poor steel wool resistance cannot be said to have high versatility.
  • An antireflection member having a low refractive index layer containing a binder resin and hollow particles on a light-transmitting substrate which satisfies the following condition 1.
  • ⁇ Condition 1> By performing spatial frequency analysis of elevation in a region of 5 ⁇ m ⁇ 5 ⁇ m on the surface of the antireflection member on the side having the low refractive index layer with reference to the light transmissive substrate, the power spectrum of elevation for each wavelength is performed. Calculate the strength. After calculating the sum of the power spectral intensities of the elevations of all the measurement wavelengths, the sum is standardized to 1.
  • the antireflection member is arranged on the display element so that the surface of the antireflection member according to the above [1] on the low refractive index layer side faces the side opposite to the display element.
  • An image display device placed on the outermost surface.
  • the surface of the antireflection member according to the above [1] on the low refractive index layer side is arranged on the member so as to face the side opposite to the member, and the antireflection member is the outermost surface.
  • Anti-reflective article placed in.
  • the following condition 1 is evaluated for the antireflection member having a low refractive index layer containing a binder resin and hollow particles on a light transmissive substrate, and the following condition 1 is performed.
  • a method of selecting antireflection members that satisfy the requirements. ⁇ Condition 1> By performing spatial frequency analysis of elevation in a region of 5 ⁇ m ⁇ 5 ⁇ m on the surface of the antireflection member on the side having the low refractive index layer with reference to the light transmissive substrate, the power spectrum of elevation for each wavelength is performed. Calculate the strength. After calculating the sum of the power spectral intensities of the elevations of all the measurement wavelengths, the sum is standardized to 1. When the power spectral intensity at an altitude at a wavelength of 1.25 ⁇ m is defined as P1 with respect to the total power spectral intensity at an altitude standardized in 1, P1 indicates 0.015 or more.
  • the antireflection member of the present disclosure and the polarizing plate, the image display device, and the antireflection article using the same, can improve the scratch resistance.
  • the antireflection member of the present disclosure is an antireflection member having a low refractive index layer containing a binder resin and hollow particles on a light-transmitting substrate, and satisfies the following condition 1.
  • ⁇ Condition 1> By performing spatial frequency analysis of elevation in a region of 5 ⁇ m ⁇ 5 ⁇ m on the surface of the antireflection member on the side having the low refractive index layer with reference to the light transmissive substrate, the power spectrum of elevation for each wavelength is performed. Calculate the strength. After calculating the sum of the power spectral intensities of the altitudes of all the measurement wavelengths, the sum is standardized to 1.
  • P1 indicates 0.015 or more.
  • FIG. 1 is a schematic cross-sectional view of the cross-sectional shape of the antireflection member 100 of the present disclosure.
  • the antireflection member 100 of FIG. 1 has a low refractive index layer 40 containing a binder resin 41 and hollow particles 42 on a light transmissive base material 10.
  • the antireflection member 100 of FIG. 1 has a hard coat layer 20 and a high refractive index layer 30 between the light transmissive base material 10 and the low refractive index layer 40.
  • FIG. 1 is a schematic cross-sectional view. That is, the scale of each layer constituting the antireflection member 100, the scale of each material, and the like are schematicized for easy illustration, and are different from the actual scale and the like. The same applies to FIGS. 2, 5 and 7.
  • the upper surface of FIG. 1 corresponds to "the surface of the antireflection member on the side having the low refractive index layer with respect to the light transmissive substrate".
  • the surface of the antireflection member on the side having the low refractive index layer with reference to the light transmissive substrate may be referred to as “the surface on the low refractive index layer side”.
  • the antireflection member of the present disclosure is not limited to the laminated configuration of FIG. 1 as long as it has a low refractive index layer containing a binder resin and hollow particles on a light transmissive substrate and satisfies condition 1.
  • the antireflection member may have a laminated structure in which at least one of the hard coat layer and the high refractive index layer is removed from the laminated structure shown in FIG.
  • a preferred embodiment of the laminated structure of the antireflection member is the laminated structure of FIG. 1, which has a hard coat layer, a high refractive index layer, and a low refractive index layer in this order on a light transmissive substrate.
  • the light-transmitting substrate is preferably one having light-transmitting property, smoothness, heat resistance, and excellent mechanical strength.
  • Examples of such a light-transmitting substrate include polyester, triacetyl cellulose (TAC), cellulose diacetate, cellulose acetate butyrate, polyamide, polyimide, polyether sulphon, polysulphon, polypropylene, polymethylpentene, and polyvinyl chloride.
  • TAC triacetyl cellulose
  • cellulose diacetate cellulose acetate butyrate
  • polyamide polyimide
  • polyether sulphon polysulphon
  • polypropylene polymethylpentene
  • polyvinyl chloride examples thereof include plastic films such as polyvinyl acetal, polyether ketone, polymethyl methacrylate, polycarbonate, polyurethane and amorphous olefin (Cyclo-Olfin-Polymer: COP).
  • the light-transmitting substrate may be made by laminating two or more plastic films.
  • stretched polyesters such as polyethylene terephthalate and polyethylene naphthalate, which have been stretched, particularly biaxially stretched, are preferable.
  • TAC and acrylic are suitable from the viewpoint of light transmission and optical isotropic properties.
  • COP and polyester are suitable because they have excellent weather resistance.
  • the thickness of the light-transmitting substrate is preferably 5 ⁇ m or more and 300 ⁇ m or less, more preferably 20 ⁇ m or more and 200 ⁇ m or less, and further preferably 30 ⁇ m or more and 120 ⁇ m or less.
  • the preferable upper limit of the thickness of the light-transmitting substrate is 60 ⁇ m, and the more preferable upper limit is 50 ⁇ m.
  • the light-transmitting substrate is a low-moisture-permeable substrate such as polyester, COP, or acrylic
  • the preferable upper limit of the thickness of the light-transmitting substrate for thinning is 40 ⁇ m, and the more preferable upper limit is 20 ⁇ m. be.
  • the thickness of the light-transmitting substrate can be measured with a Digimatic standard outer micrometer (Mitutoyo Co., Ltd., product number "MDC-25SX") or the like.
  • the thickness of the light-transmitting substrate may be such that the average value measured at any 10 points is the above-mentioned numerical value.
  • Embodiments in a preferable range of the thickness of the light-transmitting substrate are 5 ⁇ m or more and 300 ⁇ m or less, 5 ⁇ m or more and 200 ⁇ m or less, 5 ⁇ m or more and 120 ⁇ m or less, 5 ⁇ m or more and 60 ⁇ m or less, 5 ⁇ m or more and 50 ⁇ m or less, 5 ⁇ m or more and 40 ⁇ m or less, 5 ⁇ m or more and 20 ⁇ m or less.
  • the surface of the light-transmitting base material may be subjected to physical treatment such as corona discharge treatment or chemical treatment, or an easy-adhesion layer may be formed in order to improve the adhesiveness.
  • the antireflection member of the present disclosure is required to satisfy the condition 1.
  • ⁇ Condition 1> By performing spatial frequency analysis of elevation in a region of 5 ⁇ m ⁇ 5 ⁇ m on the surface of the antireflection member on the side having the low refractive index layer with reference to the light transmissive substrate, the power spectrum of elevation for each wavelength is performed. Calculate the strength. After calculating the sum of the power spectral intensities of the elevations of all the measurement wavelengths, the sum is standardized to 1. When the power spectral intensity at an altitude at a wavelength of 1.25 ⁇ m is defined as P1 with respect to the total power spectral intensity at an altitude standardized in 1, P1 indicates 0.015 or more.
  • the spatial frequency analysis of the altitude may be performed on the surface of the low refractive index layer.
  • spatial frequency analysis of altitude may be performed on the surface of the other layer.
  • the term “elevation” means “elevation of the surface on the low refractive index layer side”.
  • the “elevation of the surface on the low refractive index layer side” means an arbitrary point P on the surface of the antireflection member on the side having the low refractive index layer with reference to the light-transmitting substrate, and the surface thereof. It means the linear distance in the direction of the normal line V of the antireflection member with respect to the virtual plane M having the average height of (see FIG. 5).
  • the altitude of the virtual plane M is 0 ⁇ m as a reference.
  • the direction of the normal V is the normal direction in the virtual plane M.
  • the wavelength and elevation power spectral intensities can be obtained by Fourier transforming the three-dimensional coordinate data of the surface on the low refractive index layer side. The method for calculating the power spectral intensity of the wavelength and the altitude from the three-dimensional coordinate data of the surface on the low refractive index layer side will be described later.
  • the wording including “elevation” means the altitude based on the above average height unless otherwise specified.
  • P1 indicates 0.015 or more when the power spectrum intensity of the altitude at a wavelength of 1.25 ⁇ m is defined as P1 with respect to the total power spectrum intensity of the altitude standardized to 1.
  • the "wavelength” generally correlates with the “distance between the convex portions (period of the convex portions)”.
  • the "elevation power spectral intensity” generally correlates with the "change in elevation of the convex portion having a predetermined interval". Under condition 1, since the measurement region is 5 ⁇ m ⁇ 5 ⁇ m, the wavelength is in the range of more than 0 ⁇ m and 5 ⁇ m or less.
  • the condition 1 "calculate the power spectral intensity of the elevation for each wavelength” is generally “calculate the amount of change in the elevation of the convex portion on the surface on the low refractive index layer side for each period of the convex portion”.
  • "P1" indicating the condition 1 "the power spectral intensity of the elevation at a wavelength of 1.25 ⁇ m with respect to the sum of the power spectral intensities of the elevation standardized to 1” is generally “the elevation of the convex portion of various periods”. It can be said to indicate “the ratio of the amount of change in the elevation of the convex portion having a period of 1.25 ⁇ m to the total amount of change". Therefore, the condition 1 "P1 is 0.015 or more" indicates that "the abundance ratio of the convex portion having a period of 1.25 ⁇ m on the surface on the low refractive index layer side is a predetermined value or more". I can say.
  • the average primary particle diameter of hollow particles is about 50 nm or more and 100 nm or less. Therefore, on the surface on the low refractive index layer side, the "convex portion having a period of 1.25 ⁇ m" is considered to be due to the convex portion formed by the aggregation of hollow particles.
  • the hollow particles 42 are not aggregated in the vicinity of the center, the hollow particles 42 are aggregated on the left side and the right side, and the convex portions are formed by the aggregated hollow particles 42.
  • the hollow particles 42 are dispersed without agglomeration and are arranged in an orderly manner on the surface of the low refractive index layer 40.
  • 3 and 4 are views of the surfaces of the antireflection members of Example 1 and Comparative Example 1 on the low refractive index layer side, taken with an atomic force microscope (AFM).
  • AFM atomic force microscope
  • FIGS. 3 and 4 it is considered that the region having a high concentration indicates the location of the hollow particles. That is, the antireflection member of Example 1 of FIG. 3 has a region in which hollow particles are gathered in the plane, whereas the antireflection member of Comparative Example 1 of FIG. 4 has an in-plane region. Hollow particles are evenly dispersed.
  • the fact that the hollow particles are agglomerated in the antireflection member of the present disclosure and the hollow particles are dispersed in the conventional antireflection member is supported by the image pickup result of AFM.
  • the AFM images of FIGS. 3 and 4 are regions of 5 ⁇ m ⁇ 5 ⁇ m. That is, it can be said that the fact that P1 is 0.015 or more indicates that the proportion of hollow particles aggregated to form convex portions in the low refractive index layer is high.
  • the reason why the scratch resistance is improved when P1 is 0.015 or more is considered as follows. Comparing FIGS. 1 and 2, the hollow particles 42 in FIG. 1 are covered with the binder resin 41 more than in FIG. 2. Some of the hollow particles 42 in FIG. 2 are exposed from the surface of the low refractive index layer 40. In the case of the antireflection member 100 of FIG. 2, the hollow particles 42 gather in the vicinity of the surface of the low refractive index layer 40 without aggregating, and the binder resin covering the hollow particles is insufficient in the vicinity of the surface, so that a part of the hollow particles 42 is partially formed. It is considered that the low refractive index layer 40 is exposed from the surface. On the other hand, in the case of the antireflection member 100 of FIG.
  • the hollow particles 42 are present at various positions in the thickness direction of the low refractive index layer, so that the binder covers the low refractive index particles 42 near the surface of the low refractive index layer 40. Since there is no shortage of resin, it is considered that the hollow particles 42 are covered with the binder resin and are not exposed from the surface of the low refractive index layer 40. That is, when P1 is 0.015 or more (because the ratio of hollow particles aggregated to form convex portions in the low refractive index layer is large), the surface of the hollow particles is easily covered with the binder resin. Therefore, it can be said that the number of hollow particles exposed from the surface of the low refractive index layer is reduced.
  • the surface of the hollow particles is covered with the binder resin, and the number of hollow particles exposed from the surface of the low refractive index layer is reduced. Therefore, when the surface of the low refractive index layer is rubbed with steel wool or the like, the hollow particles have low strength. Since steel wool and the like do not come into direct contact with the particles, it is considered that scratch resistance can be improved.
  • the binder resin of the low refractive index layer contains a resin having good slipperiness, or when the low refractive index layer contains an additive having good slipperiness such as a leveling agent, the surface of the hollow particles slips. Since it is covered with a binder resin or the like having good properties, it is considered that the scratch resistance can be easily improved.
  • P1 is more preferably 0.017 or more, preferably 0.020 or more, more preferably 0.025 or more, more preferably 0.028 or more, and 0.030 or more. Is more preferable, 0.032 or more is more preferable, and 0.035 or more is more preferable. If P1 is too large, SCE (Specular Component Exclude) tends to increase due to the aggregated structure of the particles. Therefore, P1 is preferably 0.075 or less, more preferably 0.070 or less, more preferably 0.060 or less, still more preferably 0.055 or less, and 0. It is more preferably 050 or less, and more preferably 0.045 or less.
  • various parameters such as numerical values relating to the power spectral intensity of altitudes such as P1 and P2, and optical properties such as haze, total light transmittance and visual reflectance Y value are not specified unless otherwise specified.
  • the 16 measurement points are the intersections when a region 0.5 cm from the outer edge of the measurement sample is removed as a margin and a line is drawn to divide the remaining region into five equal parts in the vertical and horizontal directions. It is preferable to set 16 points as the center of measurement.
  • the measurement sample when the measurement sample is a rectangle, the area 0.5 cm from the outer edge of the rectangle is removed as a margin, and the remaining area is divided into five equal parts in the vertical and horizontal directions. It is preferable to calculate the parameter with the average value.
  • the measurement sample has a shape other than a rectangle such as a circle, an ellipse, a triangle, or a pentagon, it is preferable to draw a rectangle inscribed in these shapes and measure 16 points of the rectangle by the above method.
  • various parameters such as numerical values relating to the power spectral intensity of altitudes such as P1 and P2, and optical properties such as haze, total light transmittance and visual reflectance Y value are not specified unless otherwise specified.
  • the temperature is 23 ⁇ 5 ° C.
  • the relative humidity is 40% or more and 65% or less.
  • the antireflection member of the present disclosure further satisfies the following condition 2.
  • P2 the power spectrum intensity at an altitude of 0.075 ⁇ m
  • P1 / P2 indicates 4.0 or more.
  • the “elevation power spectral intensity at a wavelength of 0.075 ⁇ m” in Condition 2 is generally “the elevation power spectral intensity of the primary particles of the hollow particles”. It can be said that it is equivalent to.
  • the "elevation power spectral intensity at a wavelength of 1.25 ⁇ m” generally corresponds to the "elevation power spectral intensity of the convex portion formed by the aggregated hollow particles”. Therefore, it can be said that the larger the value of "P1 / P2" in the condition 2, the higher the rate of agglomeration of hollow particles.
  • P1 / P2 is 4.0 or more indicates that the surface of the hollow particles is likely to be covered with the binder resin, and the number of hollow particles exposed from the surface of the low refractive index layer is likely to be small. Therefore, by setting P1 / P2 to 4.0 or more, it is possible to easily improve the scratch resistance of the antireflection member.
  • P1 / P2 is more preferably 4.5 or more, and further preferably 5.0 or more.
  • the upper limit of P1 / P2 is not particularly limited, but is preferably 20.0 or less, more preferably 15.0 or less, and even more preferably 12.0 or less.
  • P1 / P2 preferred range embodiments are 4.0 or more and 20.0 or less, 4.0 or more and 15.0 or less, 4.0 or more and 12.0 or less, 4.5 or more and 20.0 or less, 4.5. Examples thereof include 15.0 or more, 4.5 or more and 12.0 or less, 5.0 or more and 20.0 or less, 5.0 or more and 15.0 or less, and 5.0 or more and 12.0 or less.
  • the antireflection member of the present disclosure further satisfies the following condition 3A.
  • ⁇ Condition 3A> Similar to the above condition 1, after calculating the total of the power spectral intensities of the altitudes of all the measurement wavelengths, the total is standardized to 1.
  • P3 When the power spectrum intensity of the altitude at a wavelength of 5 ⁇ m is defined as P3 with respect to the total power spectrum intensity of the altitude standardized in 1, P3 shows 0.050 or less.
  • P3 is more preferably 0.045 or less, and further preferably 0.040 or less.
  • the lower limit of P3 is not particularly limited, but is preferably 0.010 or more, and more preferably 0.015 or more.
  • Preferred ranges of P3 are 0.010 or more and 0.050 or less, 0.010 or more and 0.045 or less, 0.010 or more and 0.040 or less, 0.015 or more and 0.050 or less, 0.015 or more and 0. .045 or less, 0.015 or more and 0.040 or less.
  • the antireflection member satisfies the following conditions 3B and 3C.
  • ⁇ Condition 3B> Similar to the above condition 1, after calculating the total of the power spectral intensities of the altitudes of all the measurement wavelengths, the total is standardized to 1.
  • P4 the power spectrum intensity of the altitude at a wavelength of 2.5 ⁇ m
  • P4 indicates 0.050 or less.
  • ⁇ Condition 3C> Similar to the above condition 1, after calculating the total of the power spectral intensities of the altitudes of all the measurement wavelengths, the total is standardized to 1.
  • P5 When the power spectral intensity at an altitude at a wavelength of 1.67 ⁇ m is defined as P5 with respect to the total power spectral intensity at an altitude standardized in 1, P5 indicates 0.050 or less.
  • the embodiments of the preferred range of P4 under condition 3B and the preferred range of P5 under condition 3C are the same as the preferred range of P3 under condition 3A.
  • the "1.67 ⁇ m" of the condition 3C is, to be exact, "5/3 [ ⁇ m] (1.666 [ ⁇ m])".
  • the "elevation of the surface on the low refractive index layer side” is arbitrary on the surface of the antireflection member on the side having the low refractive index layer with reference to the light-transmitting substrate. It means the linear distance between the point P of the above point P and the virtual plane M having the average height of the surface in the direction of the normal line V of the antireflection member (see FIG. 5).
  • the altitude of the virtual plane M is 0 ⁇ m as a reference.
  • the direction of the normal V is the normal direction in the virtual plane M.
  • the elevation of the surface of the antireflection member on the low refractive index layer side is a two-dimensional function of the coordinates (x, y). It can be expressed as h (x, y).
  • the elevation of the surface on the low refractive index layer side is preferably measured using an atomic force microscope (AFM).
  • AFM atomic force microscope
  • Examples of the AFM include an atomic force microscope "trade name: NanoScopeV” manufactured by Bruker.
  • the resolution required for the measuring machine is preferably 0.01 ⁇ m or less, more preferably 0.005 ⁇ m or less in both the horizontal direction and the vertical direction.
  • the measured area of altitude is 5 ⁇ m ⁇ 5 ⁇ m.
  • the two-dimensional function H (fx, fy) is obtained from the two-dimensional function h (x, y) by the two-dimensional Fourier transform defined by the following equation (1).
  • fx and fy are frequencies in the x-direction and the y-direction, respectively, and have dimensions of the reciprocal of the length.
  • ⁇ is the pi and i is the imaginary unit.
  • FIG. 6 is a schematic diagram showing a state in which the function h (x, y) representing the altitude is obtained discretely. As shown in FIG.
  • the in-plane Cartesian coordinates of the surface on the low refractive index layer side are displayed as (x, y), and the line divided by ⁇ x in the x-axis direction and the y-axis direction on the projection surface Sp.
  • the line divided by ⁇ y is shown by a broken line, in actual measurement, the elevation of the surface on the low refractive index layer side is obtained as a discrete elevation value at each intersection of the broken lines on the projection surface Sp.
  • the elevation of the point P on the surface on the low refractive index layer side corresponding to the point of interest A is h (j ⁇ x). , K ⁇ y).
  • j is 0 or more and M-1 or less
  • k is 0 or more and N-1 or less.
  • both ⁇ x and ⁇ y depend on the horizontal resolution of the measuring instrument, and in order to evaluate the fine uneven surface with high accuracy, as described above, both ⁇ x and ⁇ y are preferably 0.01 ⁇ m or less, more preferably 0. It is 005 ⁇ m or less. As described above, the measurement ranges X and Y are both 5 ⁇ m.
  • the function representing the elevation of the surface on the low refractive index layer side is obtained as a discrete function h (x, y) having M ⁇ N values.
  • the discrete function H (fx, fy) is obtained by performing the discrete Fourier transform defined by the following equation (2) on the discrete function h (x, y) obtained by the measurement, and the discrete function H (fx, fy) is obtained.
  • the discrete function H 2 (fx, fy) of the two-dimensional power spectrum can be obtained.
  • ⁇ fx and ⁇ fy are frequency intervals in the x and y directions, respectively, and are defined by the following equations (3) and (4).
  • the discrete function H 2 (fx, fy) of the two-dimensional power spectrum calculated as described above represents the spatial frequency distribution of the uneven surface of the antireflection member. If the reciprocal of the spatial frequency is taken, it can be converted into wavelength.
  • FIGS. 8 to 15 show the ratio of the power spectral intensity of each wavelength to the sum of the power spectral intensities of the elevations of all the measured wavelengths for the antireflection members of Examples 1 to 4 and Comparative Examples 1 to 4. (However, the total sum is standardized to 1.).
  • the horizontal axis shows the wavelength (unit is “ ⁇ m”)
  • the vertical axis shows the ratio of the power spectral intensity of each wavelength to the total (unit is dimensionless).
  • the low index of refraction layer contains at least a binder resin and hollow particles.
  • the low refractive index layer is preferably located on the outermost surface of the antireflection member on the side having the low refractive index layer with reference to the light transmissive substrate.
  • the antireflection member of the present disclosure contains hollow particles having low strength in the low refractive index layer, the scratch resistance can be improved because the condition 1 is satisfied.
  • the following (a) to (g) can be mentioned as means for facilitating the satisfaction of the condition 1. By appropriately combining these means, it is possible to easily obtain an antireflection member satisfying the condition 1.
  • (A) The surface of the hollow particles is treated with a methacryloyl group.
  • (B) The content of solid particles with respect to hollow particles is set to a certain level or higher.
  • C A solvent having a slow evaporation rate is used as the solvent.
  • D The wettability between the low refractive index layer and the lower layer of the low refractive index layer is improved.
  • the content of hollow particles in the binder resin is set to a certain level or higher.
  • (F) Slow down the initial drying.
  • (G) The ratio of the acrylate resin component in the binder resin is set to a certain level or more.
  • the low refractive index layer preferably contains a cured product of the curable resin composition as the binder resin.
  • the ratio of the cured product of the curable resin composition to the total binder resin of the low refractive index layer is preferably 50% by mass or more, more preferably 70% by mass or more, more preferably 90% by mass or more, and most preferably 100. It is mass%.
  • the curable resin composition of the low refractive index layer include a thermosetting resin composition and an ionizing radiation curable resin composition, and an ionizing radiation curable resin composition is preferable. That is, the low refractive index layer preferably contains a cured product of the ionizing radiation curable resin composition as the binder resin.
  • the thermosetting resin composition is a composition containing at least a thermosetting resin, and is a resin composition that is cured by heating.
  • the thermosetting resin include acrylic resin, urethane resin, phenol resin, urea melamine resin, epoxy resin, unsaturated polyester resin, silicone resin and the like.
  • a curing agent is added to these curable resins as needed.
  • the ionizing radiation curable resin composition is a composition containing a compound having an ionizing radiation curable functional group (hereinafter, also referred to as “ionizing radiation curable compound”).
  • ionizing radiation curable compound examples include an ethylenically unsaturated bond group such as a (meth) acryloyl group, a vinyl group and an allyl group, an epoxy group and an oxetanyl group.
  • the ionizing radiation curable compound preferably has two or more ionizing radiation curable functional groups.
  • a compound having an ethylenically unsaturated bond group is preferable.
  • (meth) acrylate compounds having a (meth) acryloyl group are more preferable.
  • a (meth) acrylate-based compound having four or more ethylenically unsaturated bond groups is referred to as a “polyfunctional (meth) acrylate-based compound”.
  • a (meth) acrylate-based compound having 2 or more and 3 or less ethylenically unsaturated bond groups is referred to as a “low-functional (meth) acrylate-based compound”.
  • the (meth) acrylate compound either a monomer or an oligomer can be used.
  • the cured product of the (meth) acrylate compound is contained in an amount of 50% by mass or more, and more preferably 70% by mass or more, based on the total amount of the binder resin.
  • the (meth) acrylate compound is preferably an acrylic compound.
  • the bifunctional (meth) acrylate-based compound includes isocyanuric acid di (meth) acrylate, ethylene glycol di (meth) acrylate, polyethylene glycol diacrylate, polybutylene glycol di (meth) acrylate and the like.
  • examples thereof include polyalkylene glycol di (meth) acrylate, bisphenol A tetraethoxydiacrylate, bisphenol A tetrapropoxydiacrylate, and 1,6-hexanediol diacrylate.
  • Examples of the trifunctional (meth) acrylate compound include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, and isocyanuric acid-modified tri (meth) acrylate.
  • Examples of the tetrafunctional or higher functional (meth) acrylate compound include pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and dipentaerythritol tetra (meth) acrylate. These (meth) acrylate compounds may be modified as described later.
  • Examples of the (meth) acrylate-based oligomer include acrylate-based polymers such as urethane (meth) acrylate, epoxy (meth) acrylate, polyester (meth) acrylate, and polyether (meth) acrylate.
  • Urethane (meth) acrylate is obtained, for example, by reacting a polyhydric alcohol and an organic diisocyanate with a hydroxy (meth) acrylate.
  • the preferred epoxy (meth) acrylate is a (meth) acrylate obtained by reacting a trifunctional or higher aromatic epoxy resin, an alicyclic epoxy resin, an aliphatic epoxy resin, or the like with a (meth) acrylic acid, and a bifunctional or higher functional one.
  • (Meta) acrylate obtained by reacting aromatic epoxy resin, alicyclic epoxy resin, aliphatic epoxy resin, etc. with polybasic acid and (meth) acrylic acid, and bifunctional or higher functional aromatic epoxy resin, alicyclic. It is a (meth) acrylate obtained by reacting a group epoxy resin, an aliphatic epoxy resin or the like with phenols and (meth) acrylic acid.
  • the above (meth) acrylate compound may be a compound in which a part of the molecular skeleton is modified from the viewpoint of suppressing uneven shrinkage due to cross-linking.
  • those modified with ethylene oxide, propylene oxide, caprolactone, isocyanuric acid, alkyl, cyclic alkyl, aromatic, bisphenol and the like can also be used.
  • the ionizing radiation curable resin can be used alone or in combination of two or more.
  • the coating liquid for a low refractive index layer preferably contains an additive such as a photopolymerization initiator or a photopolymerization accelerator.
  • a photopolymerization initiator one or more selected from acetophenone, benzophenone, ⁇ -hydroxyalkylphenone, Michler ketone, benzoin, benzyldimethylketal, benzoylbenzoate, ⁇ -acyloxime ester, ⁇ -aminoalkylphenone, thioxanthones and the like are used. Can be mentioned.
  • the photopolymerization accelerator can reduce the polymerization inhibition due to air at the time of curing and accelerate the curing rate, and is selected from, for example, p-dimethylaminobenzoic acid isoamyl ester, p-dimethylaminobenzoic acid ethyl ester and the like. One or more types can be mentioned.
  • the hollow particle means a particle having an outer shell layer, the inside of the particle surrounded by the outer shell layer is a cavity, and the inside of the cavity contains air.
  • Hollow particles are particles whose refractive index decreases in proportion to the occupancy rate of gas as compared with the refractive index of the outer shell layer due to the inclusion of air.
  • the material of the outer shell layer of the hollow particles may be either an inorganic compound such as silica or magnesium fluoride or an organic compound, but silica is preferable from the viewpoint of low refractive index and strength. That is, the low refractive index layer preferably contains hollow silica particles as hollow particles.
  • the lower limit of the average primary particle diameter of the hollow particles is preferably 50 nm or more, more preferably 65 nm or more, and the upper limit is preferably 100 nm or less. , 80 nm or less is more preferable.
  • Preferable embodiments of the average primary particle diameter of the hollow particles include 50 nm or more and 100 nm or less, 50 nm or more and 80 nm or less, 65 nm or more and 100 nm or less, and 65 nm or more and 80 nm or less.
  • the average primary particle diameters of the hollow particles, the solid particles described later, and the high refraction particles described later can be calculated by the following operations (A1) to (A3).
  • A1 The cross section of the antireflection member is imaged by TEM or STEM.
  • the acceleration voltage of TEM or STEM is preferably 10 kv or more and 30 kV or less, and the magnification is preferably 50,000 times or more and 300,000 times or less.
  • Arbitrary 10 particles are extracted from the observation image, and the particle diameter of each particle is calculated. The particle diameter is measured as the distance between straight lines in a combination of two straight lines such that the distance between the two straight lines is maximized when the cross section of the particle is sandwiched between two arbitrary parallel straight lines.
  • A3) The same operation is performed 5 times in the observation image on another screen of the same sample, and the value obtained from the number average of the particle diameters of a total of 50 particles is taken as the average primary particle diameter of the particles.
  • the lower limit of the porosity of the hollow particles is preferably 5% or more, more preferably 10% or more, still more preferably 20% or more from the viewpoint of lowering the refractive index, and the upper limit is preferably 80 from the viewpoint of strength. % Or less, more preferably 70% or less, still more preferably 60% or less.
  • the void ratio of the hollow particles is determined by measuring the diameter of the hollow particles and the thickness of the outer shell portion excluding the void portion by observing the cross section of the hollow particles, and assuming that the hollow particles are spherical, the volume of the void portion of the hollow particles and the volume of the void portion.
  • the volume of the hollow particle when there is no void portion is calculated, and it can be calculated from ⁇ (volume of the void portion of the hollow particle) / (volume of the hollow particle when there is no void portion) ⁇ ⁇ 100. can.
  • Embodiments in a preferred range of porosity of hollow particles are 5% or more and 80% or less, 5% or more and 70% or less, 5% or more and 60% or less, 10% or more and 80% or less, 10% or more and 70% or less, 10%. Examples include 60% or more, 20% or more and 80% or less, 20% or more and 70% or less, and 20% or more and 60% or less.
  • the content of the hollow particles is preferably 100 parts by mass or more, more preferably 150 parts by mass or more, and further preferably 175 parts by mass or more with respect to 100 parts by mass of the binder resin. Further, by increasing the content of the hollow particles, the hollow particles are likely to aggregate, and the condition 1 can be easily satisfied. On the other hand, if the content of the hollow particles in the binder resin is too large, the hollow particles are easily exposed from the binder resin, and the amount of the binder resin bonded between the hollow particles is reduced, so that the scratch resistance of the low refractive index layer is reduced. There is a tendency for the mechanical strength of the particles to decrease.
  • the content of the hollow particles is preferably 400 parts by mass or less, more preferably 300 parts by mass or less, and further preferably 250 parts by mass or less with respect to 100 parts by mass of the binder resin.
  • Embodiments in a preferable range of the content of hollow particles with respect to 100 parts by mass of the binder resin are 100 parts by mass or more and 400 parts by mass or less, 100 parts by mass or more and 300 parts by mass or less, 100 parts by mass or more and 250 parts by mass or less, and 150 parts by mass or more.
  • 400 parts by mass or less 150 parts by mass or more and 300 parts by mass or less, 150 parts by mass or more and 250 parts by mass or less, 175 parts by mass or more and 400 parts by mass or less, 175 parts by mass or more and 300 parts by mass or less, 175 parts by mass or more and 250 parts by mass or less Can be mentioned.
  • the surface of the hollow particles is preferably coated with a silane coupling agent.
  • the silane coupling agent preferably has a (meth) acryloyl group or an epoxy group, and more preferably has a methacryloyl group.
  • the low refractive index layer preferably contains solid particles from the viewpoint of improving scratch resistance.
  • solid particles inorganic compounds such as silica and magnesium fluoride are preferable, and silica is more preferable.
  • the average primary particle size of the solid particles is preferably smaller than the average primary particle size of the hollow particles.
  • the lower limit of the average primary particle diameter of the solid particles is preferably 5 nm or more, more preferably 10 nm or more, and the upper limit is preferably 20 nm or less, more preferably 15 nm or less.
  • Examples of embodiments in a preferable range of the average primary particle diameter of the solid particles include 5 nm or more and 20 nm or less, 5 nm or more and 15 nm or less, 10 nm or more and 20 nm or less, and 10 nm or more and 15 nm or less.
  • the content of the solid particles is preferably 10 parts by mass or more, more preferably 50 parts by mass or more, and 70 parts by mass with respect to 100 parts by mass of the binder resin from the viewpoint of improving the scratch resistance.
  • the amount is more preferably 100 parts by mass or more, and more preferably 100 parts by mass or more.
  • the content of the solid particles is preferably 200 parts by mass or less, and more preferably 150 parts by mass or less with respect to 100 parts by mass of the binder resin.
  • Embodiments in a preferable range of the content of solid particles with respect to 100 parts by mass of the binder resin are 10 parts by mass or more and 200 parts by mass or less, 10 parts by mass or more and 150 parts by mass or less, 50 parts by mass or more and 200 parts by mass or less, and 50 parts by mass. Examples thereof include 150 parts by mass or less, 70 parts by mass or more and 200 parts by mass or less, 70 parts by mass or more and 150 parts by mass or less, 100 parts by mass or more and 200 parts by mass or less, and 100 parts by mass or more and 150 parts by mass or less.
  • the content of the solid particles is preferably 30 parts by mass or more, and preferably 40 parts by mass or more with respect to 100 parts by mass of the hollow particles.
  • the hollow particles are less likely to flow, so that the hollow particles are more likely to aggregate, and the condition 1 can be easily satisfied. If the content of solid particles relative to hollow particles is too high, the reflectance tends to increase. Therefore, the content of the solid particles is preferably 80 parts by mass or less, and more preferably 70 parts by mass or less with respect to 100 parts by mass of the hollow particles.
  • Embodiments in a preferable range of the content of solid particles with respect to 100 parts by mass of hollow particles are 30 parts by mass or more and 80 parts by mass or less, 30 parts by mass or more and 70 parts by mass or less, 40 parts by mass or more and 80 parts by mass or less, and 40 parts by mass. More than 70 parts by mass and less.
  • the lower limit of the refractive index of the low refractive index layer is preferably 1.10 or more, more preferably 1.20 or more, more preferably 1.26 or more, more preferably 1.28 or more, and even more preferably 1.30 or more.
  • the upper limit is preferably 1.48 or less, more preferably 1.45 or less, more preferably 1.40 or less, more preferably 1.38 or less, and even more preferably 1.35 or less.
  • the refractive index of the layers constituting the antireflection layer such as the low refractive index layer and the high refractive index layer means a value at a wavelength of 589.3 nm.
  • Embodiments in a preferable range of the refractive index of the low refractive index layer are 1.10 or more and 1.48 or less, 1.10 or more and 1.45 or less, 1.10 or more and 1.40 or less, 1.10 or more and 1.38 or less.
  • the lower limit of the thickness of the low refractive index layer is preferably 80 nm or more, more preferably 85 nm or more, more preferably 90 nm or more, and the upper limit is preferably 150 nm or less, more preferably 110 nm or less, and even more preferably 105 nm or less.
  • Embodiments in a preferable range of the thickness of the low refractive index layer are 80 nm or more and 150 nm or less, 80 nm or more and 110 nm or less, 80 nm or more and 105 nm or less, 85 nm or more and 150 nm or less, 85 nm or more and 110 nm or less, 85 nm or more and 105 nm or less, 90 nm or more and 150 nm or less, 90 nm. Examples thereof include 110 nm or less and 90 nm or more and 105 nm or less.
  • the low refractive index layer may further contain additives such as a leveling agent, an antistatic agent, an antioxidant, a surfactant, a dispersant and an ultraviolet absorber.
  • a leveling agent such as a fluorine-based leveling agent and a silicone-based leveling agent
  • the content of the leveling agent is preferably 0.1 part by mass or more and 20 parts by mass or less with respect to 100 parts by mass of the binder resin of the low refractive index layer, and more preferably 1 part by mass or more and 15 parts by mass or less.
  • the content of the leveling agent may be 0.1 part by mass or more and 15 parts by mass or less, or 1 part by mass or more and 20 parts by mass or less with respect to 100 parts by mass of the binder resin of the low refractive index layer. good.
  • the low-refractive index layer can be formed by applying a coating liquid for a low-refractive index layer containing components and a solvent constituting the low-refractive index layer, drying, and if necessary, irradiating with ionizing radiation to cure. ..
  • solvent solvents include, for example, ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone (MIBK), cyclohexanone; ethers such as dioxane and tetrahydrofuran; aliphatic hydrocarbons such as hexane; alicyclic hydrocarbons such as cyclohexane; toluene.
  • ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone (MIBK), cyclohexanone
  • ethers such as dioxane and tetrahydrofuran
  • aliphatic hydrocarbons such as hexane
  • alicyclic hydrocarbons such as cyclohexane
  • toluene solvents include, for example, ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone (MIBK),
  • Aromatic hydrocarbons such as xylene; carbon halides such as dichloromethane and dichloroethane; esters such as methyl acetate, ethyl acetate, butyl acetate; alcohols such as isopropanol, butanol, cyclohexanol; methyl cellosolve, ethyl cellosolve, etc. Serosolves; glycol ethers such as propylene glycol monomethyl ether acetate; cellosolve acetates; sulfoxides such as dimethyl sulfoxide; amides such as dimethylformamide and dimethylacetamide; and the like can be exemplified and may be a mixture thereof. ..
  • the solvent of the low refractive index layer preferably contains a solvent having a slow evaporation rate.
  • a solvent having a slow evaporation rate means a solvent having an evaporation rate of less than 100 when the evaporation rate of butyl acetate is 100.
  • the evaporation rate of the solvent having a slow evaporation rate is preferably 20 or more and 60 or less, and more preferably 40 or more and 50 or less.
  • Examples of the solvent having a slow evaporation rate include cyclohexanone having an evaporation rate of 32 and 1-methoxy-2-propyl acetate having an evaporation rate of 44.
  • the content of the solvent having a slow evaporation rate is preferably 20% by mass or more, more preferably 25% by mass or more, based on the total amount of the solvent in the low refractive index layer.
  • a solvent having a slow evaporation rate means a solvent having an evaporation rate of 100 or more when the evaporation rate of butyl acetate is 100.
  • the evaporation rate of the solvent having a high evaporation rate is preferably 120 or more and 300 or less, and more preferably 130 or more and 180 or less.
  • Examples of the solvent having a high evaporation rate include methyl isobutyl ketone having an evaporation rate of 160, toluene having an evaporation rate of 200, and methyl ethyl ketone having an evaporation rate of 370.
  • the mass ratio of the solvent having a high evaporation rate to the solvent having a slow evaporation rate is preferably 50:50 to 80:20, more preferably 60:40 to 75:25.
  • the drying temperature of the coating liquid for a low refractive index layer is preferably 45 ° C. or higher and 60 ° C. or lower, and more preferably 47 ° C. or higher and 53 ° C. or lower. By drying at a relatively low temperature in this way, the hollow particles are likely to aggregate, and the condition 1 can be easily satisfied.
  • the wind speed of the dry air of the coating liquid for a low refractive index layer is preferably 0.1 m / s or more and 10 m / s or less, and more preferably 0.3 m / s or more and 7 m / s or less.
  • the coating liquid for a low refractive index layer may be dried in two steps.
  • Examples of the two-step drying include the following (1) and (2), and combinations thereof.
  • the drying temperature in the following (1) and (2) is preferably within the above temperature range.
  • (1) The wind speed of the dry air is changed between the first stage drying and the second stage drying.
  • the wind speed of the first stage ⁇ the wind speed of the second stage.
  • (2) The drying temperature is changed between the first stage drying and the second stage drying.
  • drying temperature of the first stage ⁇ drying temperature of the second stage".
  • the antireflection member preferably has one or more layers selected from a hard coat layer and a high refractive index layer between the light transmissive base material and the low refractive index layer, and the hard coat layer and the high refractive index layer. It is more preferable to have both layers.
  • the hard coat layer By having the hard coat layer, the scratch resistance of the antireflection member can be improved easily.
  • the high refractive index layer the reflectance of the antireflection member can be easily lowered.
  • the antireflection member is a light transmissive base material, a hard coat layer, and a high refractive index layer. And it is preferable to have a low refractive index layer in this order.
  • the hard coat layer preferably contains a cured product of a curable resin composition such as a thermosetting resin composition or an ionizing radiation curable resin composition as a main component.
  • the main component means that it is 50% by mass or more of the resin component constituting the hard coat layer, preferably 70% by mass or more, and more preferably 90% by mass or more.
  • the curable resin composition such as the thermosetting resin composition or the ionizing radiation curable resin composition include those similar to those exemplified for the low refractive index layer.
  • the lower limit of the thickness of the hard coat layer is preferably 0.5 ⁇ m or more, more preferably 1 ⁇ m or more, and the upper limit is preferably 30 ⁇ m or less, more preferably 10 ⁇ m or less.
  • the thickness of the hard coat layer By setting the thickness of the hard coat layer within the above range, it is possible to easily suppress the occurrence of cracks during processing such as cutting while improving scratch resistance.
  • Embodiments in a preferable range of the thickness of the hard coat layer include 0.5 ⁇ m or more and 30 ⁇ m or less, 0.5 ⁇ m or more and 10 ⁇ m or less, 1 ⁇ m or more and 30 ⁇ m or less, and 1 ⁇ m or more and 10 ⁇ m or less.
  • the hard coat layer may further contain additives such as a leveling agent, an antistatic agent, an antioxidant, a surfactant, a dispersant and an ultraviolet absorber.
  • additives such as a leveling agent, an antistatic agent, an antioxidant, a surfactant, a dispersant and an ultraviolet absorber.
  • the high refractive index layer can be formed from, for example, a coating liquid for forming a high refractive index layer containing a binder resin composition and high refractive index particles. That is, the high refractive index layer preferably contains a binder resin and high refractive index particles.
  • the binder resin of the high refractive index layer preferably contains a cured product of the curable resin composition.
  • the ratio of the cured product of the curable resin composition to the total binder resin of the high refractive index layer is preferably 50% by mass or more, more preferably 70% by mass or more, more preferably 90% by mass or more, and most preferably 100. It is mass%.
  • the curable resin composition of the high refractive index layer include a thermosetting resin composition and an ionizing radiation curable resin composition.
  • the curable resin composition such as the thermosetting resin composition or the ionizing radiation curable resin composition include those similar to those exemplified for the low refractive index layer.
  • high refractive index particles examples include antimony pentoxide (1.79), zinc oxide (1.90), titanium oxide (2.3 or more and 2.7 or less), cerium oxide (1.95), and tin-doped indium oxide (1). .95 or more and 2.00 or less), antimony-doped tin oxide (1.75 or more and 1.85 or less), yttrium oxide (1.87), zirconium oxide (2.10) and the like.
  • the number in parentheses is the index of refraction of each high-refractive index particle.
  • the average primary particle diameter of the high-refractive index particles is preferably 2 nm or more, more preferably 5 nm or more, still more preferably 10 nm or more.
  • the average primary particle diameter of the high refractive index particles is preferably 200 nm or less, more preferably 100 nm or less, more preferably 80 nm or less, more preferably 60 nm or less, and even more preferably 30 nm or less from the viewpoint of whitening suppression and transparency.
  • Embodiments in a preferable range of the average primary particle diameter of high refractive index particles are 2 nm or more and 200 nm or less, 2 nm or more and 100 nm or less, 2 nm or more and 80 nm or less, 2 nm or more and 60 nm or less, 2 nm or more and 30 nm or less, 5 nm or more and 200 nm or less, 5 nm or more and 100 nm.
  • 5 nm or more and 80 nm or less, 5 nm or more and 60 nm or less, 5 nm or more and 30 nm or less, 10 nm or more and 200 nm or less, 10 nm or more and 100 nm or less, 10 nm or more and 80 nm or less, 10 nm or more and 60 nm or less, 10 nm or more and 30 nm or less can be mentioned.
  • the lower limit of the content of the high refractive index particles is preferably 100 parts by mass or more, more preferably 150 parts by mass or more, and more preferably 250 parts by mass or more with respect to 100 parts by mass of the binder resin.
  • the upper limit is preferably 500 parts by mass or less, more preferably 400 parts by mass or less, and further preferably 350 parts by mass or less.
  • Embodiments in a preferable range of the content of high refractive index particles with respect to 100 parts by mass of the binder resin are 100 parts by mass or more and 500 parts by mass or less, 100 parts by mass or more and 400 parts by mass or less, 100 parts by mass or more and 350 parts by mass or less, 150 parts by mass.
  • 500 parts by mass or less 150 parts by mass or more and 400 parts by mass or less, 150 parts by mass or more and 350 parts by mass or less, 250 parts by mass or more and 500 parts by mass or less, 250 parts by mass or more and 400 parts by mass or less, 250 parts by mass or more and 350 parts by mass or less.
  • the lower limit of the refractive index of the high refractive index layer is preferably 1.53 or more, more preferably 1.54 or more, more preferably 1.55 or more, more preferably 1.56 or more, and the upper limit is 1.85 or less. Is preferable, 1.80 or less is more preferable, 1.75 or less is more preferable, and 1.70 or less is more preferable. Embodiments in a preferable range of the refractive index of the high refractive index layer are 1.53 or more and 1.85 or less, 1.53 or more and 1.80 or less, 1.53 or more and 1.75 or less, and 1.53 or more and 1.70 or less.
  • the upper limit of the thickness of the high refractive index layer is preferably 200 nm or less, more preferably 180 nm or less, further preferably 150 nm or less, and the lower limit is preferably 50 nm or more, more preferably 70 nm or more.
  • Embodiments in a preferable range of the thickness of the high refractive index layer include 50 nm or more and 200 nm or less, 50 nm or more and 180 nm or less, 50 nm or more and 150 nm or less, 70 nm or more and 200 nm or less, 70 nm or more and 180 nm or less, and 70 nm or more and 150 nm or less.
  • the high refractive index layer may further contain additives such as a leveling agent, an antistatic agent, an antioxidant, a surfactant, a dispersant and an ultraviolet absorber.
  • additives such as a leveling agent, an antistatic agent, an antioxidant, a surfactant, a dispersant and an ultraviolet absorber.
  • the content of the leveling agent in the high refractive index layer is preferably 3 parts by mass or less with respect to 100 parts by mass of the binder resin, and is preferably 1 part by mass or less. It is more preferable to have.
  • the antireflection member may further have a layer other than the above-mentioned layers such as an antifouling layer and an antistatic layer.
  • the total light transmittance of JIS K7361-1: 1997 is preferably 70% or more, more preferably 80% or more, and further preferably 85% or more.
  • the light incident surface when measuring the total light transmittance and the haze described later is on the side opposite to the surface on the low refractive index layer side.
  • the antireflection member preferably has a haze of JIS K7136: 2000 of 1.0% or less, more preferably 0.7% or less, and further preferably 0.5% or less.
  • a haze of JIS K7136 2000 of 1.0% or less, more preferably 0.7% or less, and further preferably 0.5% or less.
  • the lower limit of the haze is not particularly limited, but is usually 0.1% or more.
  • Preferable embodiments of the haze of the antireflection member include 0.1% or more and 1.0% or less, 0.1% or more and 0.7% or less, and 0.1% or more and 0.5% or less.
  • the antireflection member preferably has a visual reflectance Y value of 1.0% or less, which is measured at a light incident angle of 5 degrees from the side having a low refractive index layer with the light transmissive substrate as a reference. It is more preferably 0.7% or less, and further preferably 0.5% or less.
  • the lower limit of the visual reflectance Y value is not particularly limited, but is usually 0.1% or more.
  • Embodiments in a preferable range of the visual reflectance Y value of the antireflection member are 0.1% or more and 1.0% or less, 0.1% or more and 0.7% or less, and 0.1% or more and 0.5% or less. Can be mentioned.
  • a sample was prepared in which a black plate was bonded to the surface of the antireflection member on the light transmissive substrate side via a transparent adhesive layer, and the low refractive index of the sample was prepared. It is assumed that light is incident from the layer side at an incident angle of 5 ° for measurement.
  • the condition of the light source when calculating the reflectance is preferably C light source.
  • the difference in refractive index between the member in contact with the transparent pressure-sensitive adhesive layer of the sample (for example, a light-transmitting substrate) and the transparent pressure-sensitive adhesive layer is preferably 0.15 or less, more preferably 0.10 or less. It is more preferably within 0.05.
  • the black plate preferably has a total light transmittance of JIS K7361-1: 1997 of 1% or less, and more preferably 0%.
  • the difference between the refractive index of the resin constituting the black plate and the refractive index of the transparent pressure-sensitive adhesive layer is preferably 0.15 or less, more preferably 0.10 or less, and preferably 0.05 or less. More preferred.
  • the steel wool resistance of the surface of the antireflection member on the low refractive index layer side is preferably 750 g or more, more preferably 900 g or more, still more preferably 1000 g or more under the illumination of a fluorescent lamp. It is even more preferable that the weight is 1200 g or more.
  • the upper limit of steel wool resistance is not particularly limited, but is about 2000 g or less. Examples of the preferred range of steel wool resistance of the antireflection member include 750 g or more and 2000 g or less, 900 g or more and 2000 g or less, 1000 g or more and 2000 g or less, and 1200 g or more and 2000 g or less.
  • the steel wool resistance is observed while changing the angle between the fluorescent lamp and the antireflection member after rubbing the surface of the antireflection member on the low refractive index layer side with steel wool while applying a load under the following conditions.
  • the maximum load is set when no scratches are observed with the naked eye and there are no scratches.
  • the observation is performed under the illumination of a fluorescent lamp having an illuminance of 200 Lx or more and 2000 Lx or less, and the distance from the light emitting portion of the fluorescent lamp to the antireflection member is 10 cm or more and 300 cm or less.
  • Examples of the fluorescent lamp used for observation include a three-wavelength fluorescent lamp (model number: FHF32EX-N-H) manufactured by Panasonic.
  • Area steel wool in contact with the surface of the low refractive index layer side of the anti-reflection member is in the range of 0.5 cm 2 or more 5.0 cm 2 or less.
  • the shape of the surface where the steel wool and the low refractive index layer of the antireflection member are in contact with each other can be circular, triangular, polygonal, or the like, but is preferably circular.
  • steel wool is moved back and forth over a one-way movement distance of 30 mm or more (movement distance of 60 mm or more per round trip) at the same location.
  • the one-way travel distance is appropriately set according to the size of the device to which the antireflection member is applied.
  • the arithmetic mean roughness Ra of JIS B0601: 1994 at a cutoff value of 0.8 mm is preferably 0.05 ⁇ m or less, and more preferably 0.03 ⁇ m or less.
  • the lower limit of Ra is not particularly limited, but is preferably 0.005 ⁇ m or more. Examples of the embodiment in the preferable range of Ra include 0.005 ⁇ m or more and 0.05 ⁇ m or less, and 0.005 ⁇ m or more and 0.03 ⁇ m or less.
  • the antireflection member may be in the form of a single leaf cut to a predetermined size, or may be in the form of a roll obtained by winding a long sheet into a roll.
  • the size of the single leaf is not particularly limited, but the maximum diameter is about 2 inches or more and 500 inches or less.
  • the "maximum diameter" means the maximum length when any two points of the antireflection member are connected. For example, when the antireflection member is rectangular, the diagonal line of the rectangle is the maximum diameter. When the antireflection member is circular, the diameter of the circle is the maximum diameter.
  • the width and length of the roll shape are not particularly limited, but generally, the width is 500 mm or more and 3000 mm or less, and the length is about 500 m or more and 5000 m or less.
  • the antireflection member in the form of a roll can be cut into a single leaf shape according to the size of an image display device or the like and used. When cutting, it is preferable to exclude the end of the roll whose physical characteristics are not stable.
  • the surface shape of the antireflection member on the opposite side to the uneven surface is not particularly limited, but it is preferably substantially smooth. Approximately smooth means that the arithmetic mean roughness Ra of JIS B0601: 1994 at a cutoff value of 0.8 mm is less than 0.03 ⁇ m, and is preferably 0.02 ⁇ m or less.
  • the polarizing plate of the present disclosure includes a polarizing element, a first transparent protective plate arranged on one side of the polarizing element, and a second transparent protective plate arranged on the other side of the polarizing element.
  • One of the first transparent protective plate and the second transparent protective plate is the antireflection member of the present disclosure described above, and is on the light transmissive substrate side.
  • the antireflection member is arranged so that the surface faces the polarizing element side.
  • the polarizing plate is used, for example, to impart antireflection property in combination with a ⁇ / 4 retardation plate.
  • the ⁇ / 4 retardation plate is arranged on the display element of the image display device, and the polarizing plate is arranged on the viewer side of the ⁇ / 4 retardation plate.
  • the polarizing plate is used for a liquid crystal display device, it is used to impart the function of a liquid crystal shutter.
  • the liquid crystal display device is arranged in the order of the lower polarizing plate, the liquid crystal display element, and the upper polarizing plate, and the absorption axis of the polarizing element of the lower polarizing plate and the absorption axis of the polarizing element of the upper polarizing plate are orthogonal to each other. Be placed.
  • the polarizing plate of the present disclosure it is preferable to use the polarizing plate of the present disclosure as the upper polarizing plate.
  • the polarizing plate of the present disclosure includes the antireflection member of the present disclosure described above as at least one of the first transparent protective plate and the second transparent protective plate.
  • both the first transparent protective plate and the second transparent protective plate include the antireflection member of the present disclosure described above.
  • the other transparent protective plate is not particularly limited, but an optically isotropic transparent protective plate is preferable. ..
  • the optical isotropic refers to those having an in-plane phase difference of 20 nm or less, preferably 10 nm or less, and more preferably 5 nm or less.
  • Acrylic films and triacetyl cellulose (TAC) films tend to impart optical isotropic properties.
  • the transparent protective plate on the light emitting side includes the above-mentioned antireflection member of the present disclosure.
  • sheet-type polarizing elements such as a polyvinyl alcohol film, a polyvinyl formal film, a polyvinyl acetal film, and an ethylene-vinyl acetate copolymerization system saponified film dyed and stretched with iodine or the like; arranged in parallel.
  • sheet-type polarizing elements such as a polyvinyl alcohol film, a polyvinyl formal film, a polyvinyl acetal film, and an ethylene-vinyl acetate copolymerization system saponified film dyed and stretched with iodine or the like; arranged in parallel.
  • Examples include a wire grid type polarizing element composed of a large number of metal wires; a lyotropic liquid crystal or a coating type polarizing element coated with a dichroic guest-host material; a multilayer thin film type polarizing element; and the like.
  • These splitters may be reflective modulators having a function of reflecting a polarizing component that does not transmit.
  • the polarizing element so that the direction of the absorption axis and the average of the directions of the slow axis of the plastic film for optics are substantially parallel or substantially vertical.
  • Approximately parallel means 0 degrees ⁇ 5 degrees or less, preferably 0 degrees ⁇ 3 degrees or less, and more preferably 0 degrees ⁇ 1 degrees or less.
  • Approximately vertical means within 90 degrees ⁇ 5 degrees, preferably within 90 degrees ⁇ 3 degrees, and more preferably within 90 degrees ⁇ 1 degree.
  • the image display device of the present disclosure is arranged on the display element so that the surface of the antireflection member of the present disclosure on the low refractive index layer side faces the side opposite to the display element, and the antireflection is prevented.
  • the members are arranged on the outermost surface (see FIG. 7).
  • Examples of the display element include an EL display element such as a liquid crystal display element, an organic EL display element and an inorganic EL display element, a plasma display element, and the like, and further, an LED display element such as a micro LED display element can be mentioned. These display elements may have a touch panel function inside the display element.
  • Examples of the liquid crystal display method of the liquid crystal display element include an IPS method, a VA method, a multi-domain method, an OCB method, an STN method, and a TSTN method. If the display element is a liquid crystal display element, a backlight is required. The backlight is arranged on the side opposite to the side on which the antireflection member of the liquid crystal display element is arranged.
  • the image display device of the present disclosure may be an image display device with a touch panel having a touch panel between the display element and the antireflection member.
  • the antireflection member may be arranged on the outermost surface of the image display device with the touch panel, and the antireflection member may be arranged so that the surface of the antireflection member on the low refractive index layer side faces the side opposite to the display element.
  • the size of the image display device is not particularly limited, but the maximum diameter of the effective display area is about 2 inches or more and 500 inches or less.
  • the effective display area of the image display device is an area in which an image can be displayed. For example, when the image display device has a housing that surrounds the display element, the area inside the housing is the effective display area.
  • the maximum diameter of the effective display area means the maximum length when any two points in the effective display area are connected. For example, if the effective display area is a rectangle, the diagonal of the rectangle is the maximum diameter. If the effective display area is circular, the diameter of the circle is the maximum diameter.
  • the antireflection article of the present disclosure is arranged on the member so that the surface of the antireflection member of the present disclosure on the low refractive index layer side faces the opposite side of the member, and the antireflection member is provided. It is placed on the outermost surface.
  • the member and the antireflection member are preferably laminated via an adhesive layer.
  • Examples of members include instrument panels, clocks, showcases, show windows and windows.
  • the member may be transparent or opaque, and the color tone is not particularly limited.
  • the following condition 1 is evaluated for an antireflection member having a low refractive index layer containing a binder resin and hollow particles on a light transmissive substrate, and the following condition 1 is satisfied. It is to select the thing.
  • ⁇ Condition 1> By performing spatial frequency analysis of elevation in a region of 5 ⁇ m ⁇ 5 ⁇ m on the surface of the antireflection member on the side having the low refractive index layer with reference to the light transmissive substrate, the power spectrum of elevation for each wavelength is performed. Calculate the strength. After calculating the sum of the power spectral intensities of the elevations of all the measurement wavelengths, the sum is standardized to 1. When the power spectral intensity at an altitude at a wavelength of 1.25 ⁇ m is defined as P1 with respect to the total power spectral intensity at an altitude standardized in 1, P1 indicates 0.015 or more.
  • condition 1 conforms to the preferred embodiment of the antireflection member of the present disclosure described above.
  • P1 is preferably 0.017 or more, more preferably 0.020 or more, more preferably 0.025 or more, and more preferably 0.028 or more. It is preferably 0.030 or more, more preferably 0.032 or more, and even more preferably 0.035 or more.
  • P1 is preferably 0.075 or less, more preferably 0.070 or less, more preferably 0.060 or less, and even more preferably 0.055 or less. It is more preferably 0.050 or less, and more preferably 0.045 or less.
  • the method for selecting the antireflection member of the present disclosure further has additional determination conditions.
  • additional determination condition an embodiment exemplified as a suitable embodiment in the antireflection member of the present disclosure described above can be mentioned.
  • the additional determination conditions include, for example, the following. That is, it is preferable that the method for selecting the antireflection member of the present disclosure has one or more selected from the following additional determination conditions.
  • ⁇ Additional judgment condition 3> The visual reflectance Y value measured at a light incident angle of 5 degrees from the side having the low refractive index layer with the light transmissive substrate as a reference is 1.0% or less.
  • ⁇ Additional judgment condition 4> The steel wool resistance of the surface on the low refractive index layer side shall be 750 g or more under the illumination of a fluorescent lamp.
  • the arithmetic average roughness Ra of JIS B0601: 1994 at a cutoff value of 0.8 mm shall be 0.05 ⁇ m or less.
  • the antireflection members of Examples and Comparative Examples were measured and evaluated as follows.
  • the atmosphere at the time of each measurement and evaluation was a temperature of 23 ⁇ 5 ° C. and a relative humidity of 40% or more and 65% or less.
  • the target sample was exposed to the atmosphere for 30 minutes or more, and then the measurement and evaluation were performed.
  • AFM body Product name "MultiMode 8” manufactured by Bruker AFM controller: Brand name “NanoScopeV” manufactured by Bruker Mode: Tapping mode
  • Probe "Product number: RTESS300” manufactured by Bruker (resonance frequency: 300 kHz, spring constant: 40 N / m)
  • Tilt correction Surface fit
  • Table 1 shows P1 of condition 1 and P1 / P2 of condition 2.
  • 8 to 15 show the ratio of the power spectral intensity of each wavelength to the sum of the power spectral intensities of the elevations of all the measured wavelengths for the antireflection members of Examples 1 to 4 and Comparative Examples 1 to 4. (However, the total sum is standardized to 1.).
  • the horizontal axis shows the wavelength (unit is “ ⁇ m”)
  • the vertical axis shows the ratio of the power spectral intensity of each wavelength to the total (unit is dimensionless).
  • Scratch-resistant PET film (manufactured by Toyobo Co., Ltd., trade name "Cosmo Shine A4300”) is fixed to the base of a Gakushin wear tester (SAM JEE TECH, trade name "SJTR-053”) with a jig. did.
  • Set steel wool # 0000 (manufactured by Nippon Steel Wool Co., Ltd., trade name "Bonster B-204") and bring it into contact with the surface of the PET film. ),
  • the steel wool was reciprocated 200 times while applying a load of 500 g.
  • the above-mentioned operation is generally performed in order to suppress the variation in each test.
  • the contact area between the steel wool and the PET film was 4 cm 2 .
  • the Bonster B-204 is a commercial size having a width of about 390 mm, a length of about 75 mm, and a thickness of about 110 mm.
  • each antireflection member was visually observed under the illumination of a fluorescent lamp, and the number of scratches was evaluated.
  • a fluorescent lamp a three-wavelength fluorescent lamp (model number: FHF32EX-N-H) manufactured by Panasonic was used.
  • the illuminance on the sample was 800 Lx or more and 1200 Lx or less.
  • the observation distance was 30 cm.
  • Steel wool resistance was expressed as the maximum load (g) per unit area when no scratches were observed after the test and there were no scratches.
  • Example 1 A coating liquid 1 for a hard coat layer having the following formulation was applied onto a triacetyl cell roll film having a thickness of 80 ⁇ m, and then dried at 70 ° C. for 1 minute to volatilize the solvent. Subsequently, a hard coat layer having a dry thickness of 10 ⁇ m was formed by irradiating with ultraviolet rays at an integrated light intensity of 100 mJ / cm 2. Next, the coating liquid 1 for a high refractive index layer having the following formulation was applied onto the hard coat layer, and then dried at 70 ° C. for 1 minute to volatilize the solvent.
  • a high refractive index layer having a dry thickness of 150 nm was formed by irradiating with ultraviolet rays at an integrated light amount of 100 mJ / cm 2.
  • the coating liquid 1 for the low refractive index layer according to the following formulation was applied onto the high refractive index layer, dried at 50 ° C. ⁇ 30 seconds (drying air velocity 0.5 m / s), and then further dried at 50 ° C. ⁇ 30.
  • the solvent was volatilized by drying in seconds (drying air velocity 5 m / s).
  • Example 1 An antireflection member of Example 1 was obtained.
  • Example 2 The antireflection member of Example 2 was obtained in the same manner as in Example 1 except that the coating liquid 1 for the low refractive index layer was changed to the coating liquid 2 for the low refractive index layer described below.
  • Example 3 The hollow silica particles of the coating liquid 1 for the low refractive index layer were changed to hollow silica particles having an average primary particle diameter of 60 nm and surface-treated with a silane coupling agent having a methacryloyl group. Similarly, the antireflection member of Example 3 was obtained.
  • the silicone-based leveling agent of the coating liquid 1 for the low refractive index layer is a fluorosilicone-based leveling agent (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "X-71-1203M", solid content 20% by mass, solvent: methyl isobutyl ketone).
  • the antireflection member of Example 4 was obtained in the same manner as in Example 1 except that it was changed to.
  • Comparative Example 1 The antireflection member of Comparative Example 1 was obtained in the same manner as in Example 1 except that the coating liquid 1 for the low refractive index layer was changed to the coating liquid 4 for the low refractive index layer described below.
  • ⁇ Coating liquid 4 for forming a low refractive index layer 10 parts by mass of PETA (manufactured by Nippon Kayaku Co., Ltd., trade name "KAYARAD PET-30", 100% solid content) 90 parts by mass of a fluorine-containing compound having a (meth) acryloyl group, a reactive silane unit, and a silane unit having a perfluoropolyether group (manufactured by Shin-Etsu Chemical Industry Co., Ltd., trade name "X-71-1203M”) , Solid content 20% by mass, Solvent: Methyl isobutyl ketone) -Hollow silica particles 140 parts by mass (particles surface-treated with a silane coupling agent having an average primary particle diameter of 75 nm and a methacryloyl group) 25 parts by mass of solid silica particles (particles surface-treated with a silane coupling agent having an average primary particle diameter of 12.5 nm and a methacryl
  • Comparative Example 2 The coating liquid 1 for the high refractive index layer was changed to the coating liquid 2 for the high refractive index layer described below. Further, the coating liquid 1 for the low refractive index layer is changed to the coating liquid 5 for the low refractive index layer described below, and the drying conditions for applying the low refractive index layer are set to 50 ° C. ⁇ 1 minute (drying wind speed 5 m / s). The anti-refractive index member of Comparative Example 2 was obtained in the same manner as in Example 1.
  • Example 3 The coating liquid 1 for the high refractive index layer was changed to the coating liquid 2 for the high refractive index layer described above. Further, the coating liquid 1 for the low refractive index layer is changed to the coating liquid 6 for the low refractive index layer described below, and the drying conditions for applying the low refractive index layer are set to 50 ° C. ⁇ 1 minute (drying wind speed 5 m / s). The anti-refractive index member of Comparative Example 3 was obtained in the same manner as in Example 1.
  • Comparative Example 4 The antireflection member of Comparative Example 4 was obtained in the same manner as in Comparative Example 1 except that the content of the hollow silica particles in the coating liquid 4 for the low refractive index layer was changed to 200 parts by mass.
  • the antireflection member of the embodiment satisfying the condition 1 has good scratch resistance even though it contains hollow particles having low strength. It is considered that the antireflection members of Examples 1 to 4 are likely to satisfy the condition 1 because the content of the solid silica in the hollow silica is large and the initial drying of the low refractive index layer is slow. On the other hand, it is considered that the antireflection members of Comparative Examples 1 and 4 are difficult to satisfy the condition 1 because the amount of the acrylate resin is small as the binder resin of the low refractive index layer and the content of the solid silica is small. It is considered that the antireflection members of Comparative Example 2 and Comparative Example 3 are difficult to satisfy the condition 1 because the content of solid silica is small and the initial drying of the low refractive index layer is fast.

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
PCT/JP2021/026233 2020-07-15 2021-07-13 反射防止部材、並びに前記反射防止部材を用いた偏光板、画像表示装置及び反射防止性物品、並びに、反射防止部材の選定方法 Ceased WO2022014560A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
CN202180056486.9A CN116057422B (zh) 2020-07-15 2021-07-13 防反射构件、以及使用上述防反射构件的偏振片、图像显示装置和防反射性物品、以及防反射构件的选定方法
US18/004,780 US12560744B2 (en) 2020-07-15 2021-07-13 Antireflective member, and polarizing plate, image display device, and antireflective article in which said antireflective member is used, as well as method for selecting antireflective member
KR1020237004885A KR102872650B1 (ko) 2020-07-15 2021-07-13 반사 방지 부재, 그리고 상기 반사 방지 부재를 사용한 편광판, 화상 표시 장치 및 반사 방지성 물품, 그리고, 반사 방지 부재의 선정 방법
EP21841603.0A EP4191291A4 (en) 2020-07-15 2021-07-13 ANTI-REFLECTIVE ELEMENT AND POLARIZATION PLATE, IMAGE DISPLAY DEVICE AND ANTI-REFLECTIVE ARTICLE COMPRISING THIS ANTI-REFLECTIVE ELEMENT AND METHOD FOR SELECTING THE ANTI-REFLECTIVE ELEMENT
JP2022536367A JPWO2022014560A1 (https=) 2020-07-15 2021-07-13

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020121363 2020-07-15
JP2020-121363 2020-07-15

Publications (1)

Publication Number Publication Date
WO2022014560A1 true WO2022014560A1 (ja) 2022-01-20

Family

ID=79555531

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2021/026233 Ceased WO2022014560A1 (ja) 2020-07-15 2021-07-13 反射防止部材、並びに前記反射防止部材を用いた偏光板、画像表示装置及び反射防止性物品、並びに、反射防止部材の選定方法

Country Status (6)

Country Link
US (1) US12560744B2 (https=)
EP (1) EP4191291A4 (https=)
JP (1) JPWO2022014560A1 (https=)
KR (1) KR102872650B1 (https=)
CN (1) CN116057422B (https=)
WO (1) WO2022014560A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025182862A1 (ja) * 2024-02-28 2025-09-04 大日本印刷株式会社 光学シート、シート物品、偏光板、表示装置、パネル、光学シートの選定方法、及び光学シートの製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008268357A (ja) * 2007-04-17 2008-11-06 Fujifilm Corp 反射防止フィルム
WO2012157682A1 (ja) * 2011-05-16 2012-11-22 大日本印刷株式会社 反射防止フィルムの製造方法、反射防止フィルム、偏光板、及び画像表示装置
JP2014016476A (ja) * 2012-07-09 2014-01-30 Dainippon Printing Co Ltd 光学フィルム、偏光板、液晶パネルおよび画像表示装置
JP2018128541A (ja) * 2017-02-07 2018-08-16 大日本印刷株式会社 反射防止光学フィルム及び低屈折率層用組成物
WO2019139150A1 (ja) * 2018-01-12 2019-07-18 大日本印刷株式会社 光学積層体、偏光板、ディスプレイパネル及び画像表示装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007078711A (ja) 2005-09-09 2007-03-29 Asahi Kasei Corp 反射防止膜
JP2012159691A (ja) * 2011-01-31 2012-08-23 Fujifilm Corp 防眩フィルム、偏光板、画像表示装置、及び防眩フィルムの製造方法
JP6011527B2 (ja) 2011-04-26 2016-10-19 大日本印刷株式会社 反射防止フィルム、偏光板及び画像表示装置
KR20140131518A (ko) * 2012-02-29 2014-11-13 스미또모 가가꾸 가부시키가이샤 방현 필름
JP5470433B2 (ja) * 2012-10-04 2014-04-16 日東電工株式会社 防眩性ハードコートフィルム、それを用いた偏光板、画像表示装置
JP2014119650A (ja) * 2012-12-18 2014-06-30 Sumitomo Chemical Co Ltd 防眩性偏光板および画像表示装置
US10670776B2 (en) * 2015-03-20 2020-06-02 Dai Nippon Printing Co., Ltd. Antireflection film, display device in which said antireflection film is used, and method for selecting antireflection film
EP3376266B1 (en) * 2016-03-09 2025-04-23 Xinmei Fontana Holding (Hong Kong) Limited Anti-reflective film
JP7567168B2 (ja) * 2019-01-10 2024-10-16 大日本印刷株式会社 反射防止部材、並びに、これを備える偏光板、画像表示装置及び反射防止性物品
JP2019148805A (ja) * 2019-04-08 2019-09-05 大日本印刷株式会社 反射防止フィルム、偏光板、および画像表示装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008268357A (ja) * 2007-04-17 2008-11-06 Fujifilm Corp 反射防止フィルム
WO2012157682A1 (ja) * 2011-05-16 2012-11-22 大日本印刷株式会社 反射防止フィルムの製造方法、反射防止フィルム、偏光板、及び画像表示装置
JP2014016476A (ja) * 2012-07-09 2014-01-30 Dainippon Printing Co Ltd 光学フィルム、偏光板、液晶パネルおよび画像表示装置
JP2018128541A (ja) * 2017-02-07 2018-08-16 大日本印刷株式会社 反射防止光学フィルム及び低屈折率層用組成物
WO2019139150A1 (ja) * 2018-01-12 2019-07-18 大日本印刷株式会社 光学積層体、偏光板、ディスプレイパネル及び画像表示装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP4191291A4 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025182862A1 (ja) * 2024-02-28 2025-09-04 大日本印刷株式会社 光学シート、シート物品、偏光板、表示装置、パネル、光学シートの選定方法、及び光学シートの製造方法

Also Published As

Publication number Publication date
EP4191291A1 (en) 2023-06-07
US20230258845A1 (en) 2023-08-17
KR102872650B1 (ko) 2025-10-20
CN116057422B (zh) 2026-04-14
KR20230036147A (ko) 2023-03-14
EP4191291A4 (en) 2024-10-30
US12560744B2 (en) 2026-02-24
CN116057422A (zh) 2023-05-02
TW202210875A (zh) 2022-03-16
JPWO2022014560A1 (https=) 2022-01-20

Similar Documents

Publication Publication Date Title
JP7567168B2 (ja) 反射防止部材、並びに、これを備える偏光板、画像表示装置及び反射防止性物品
KR20200103803A (ko) 광학 적층체, 편광판, 디스플레이 패널 및 화상 표시 장치
CN103308959A (zh) 光学膜、偏振片、液晶面板及图像显示装置
WO2023074779A1 (ja) 防眩フィルム、並びに、それを用いた偏光板、表面板、画像表示パネル及び画像表示装置
JP6565094B2 (ja) タッチパネル、表示装置及び光学シート、並びに光学シートの選別方法及び光学シートの製造方法
JP2024027126A (ja) 光学フィルム、画像表示パネル及び画像表示装置
JP7343024B1 (ja) 光学フィルム、並びに、前記光学フィルムを用いた偏光板、表面板、画像表示パネル及び画像表示装置、並びに、前記光学フィルムの製造方法、並びに、光学フィルムの選定方法、並びに、指紋拭き取り性の評価方法
US12560744B2 (en) Antireflective member, and polarizing plate, image display device, and antireflective article in which said antireflective member is used, as well as method for selecting antireflective member
KR102795519B1 (ko) 광학 필름, 그리고, 상기 광학 필름을 사용한 편광판, 표면판, 화상 표시 패널 및 화상 표시 장치, 그리고, 상기 광학 필름의 제조 방법
JP6565096B2 (ja) タッチパネル、表示装置及び光学シート、並びに光学シートの選別方法及び光学シートの製造方法
JP6484847B2 (ja) タッチパネル、表示装置及び光学シート、並びに光学シートの選別方法及び光学シートの製造方法
JP7343023B1 (ja) 光学フィルム、並びに、前記光学フィルムを用いた偏光板、表面板、画像表示パネル及び画像表示装置、並びに、前記光学フィルムの製造方法、並びに、光学フィルムの選定方法
TW202406752A (zh) 光學膜、影像顯示面板及影像顯示裝置
JP6484846B2 (ja) タッチパネル、表示装置及び光学シート、並びに光学シートの選別方法及び光学シートの製造方法
TWI917412B (zh) 抗反射構件、以及使用該抗反射構件之偏光板、影像顯示裝置及抗反射物品、以及抗反射構件之篩選方法
US20250155606A1 (en) Antireflective member, and polarizing plate, image display panel, image display device, and antireflective article which use said antireflective member, and method for selecting antireflective member
CN118033794B (zh) 光学膜及使用所述光学膜的偏光板、表面板、图像显示面板和图像显示装置、所述光学膜的制造方法及选定方法、指纹擦拭性的评价方法
JP6565095B2 (ja) タッチパネル、表示装置及び光学シート、並びに光学シートの選別方法及び光学シートの製造方法
US20240411055A1 (en) Anti-glare film, and polarizing plate, surface plate, image display panel, and image display device that use same

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 21841603

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2022536367

Country of ref document: JP

Kind code of ref document: A

ENP Entry into the national phase

Ref document number: 20237004885

Country of ref document: KR

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 2021841603

Country of ref document: EP

Effective date: 20230215

WWG Wipo information: grant in national office

Ref document number: 18004780

Country of ref document: US