WO2021250545A1 - Procédé de fabrication d'une tôle d'alliage d'aluminium pour des éléments de chambre à vide - Google Patents

Procédé de fabrication d'une tôle d'alliage d'aluminium pour des éléments de chambre à vide Download PDF

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Publication number
WO2021250545A1
WO2021250545A1 PCT/IB2021/054983 IB2021054983W WO2021250545A1 WO 2021250545 A1 WO2021250545 A1 WO 2021250545A1 IB 2021054983 W IB2021054983 W IB 2021054983W WO 2021250545 A1 WO2021250545 A1 WO 2021250545A1
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WIPO (PCT)
Prior art keywords
plate
range
rolling
temperature
sht
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PCT/IB2021/054983
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English (en)
Inventor
Dennis AUST
Fabian RITZ
Bernd JACOBY
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Aleris Rolled Products Germany Gmbh
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Publication date
Application filed by Aleris Rolled Products Germany Gmbh filed Critical Aleris Rolled Products Germany Gmbh
Priority to CN202180040721.3A priority Critical patent/CN115698355A/zh
Priority to CA3181196A priority patent/CA3181196A1/fr
Priority to JP2022566688A priority patent/JP2023524523A/ja
Priority to EP21730296.7A priority patent/EP4165223A1/fr
Priority to KR1020227038536A priority patent/KR20220156648A/ko
Priority to US17/999,988 priority patent/US20230220522A1/en
Publication of WO2021250545A1 publication Critical patent/WO2021250545A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium
    • C22C21/02—Alloys based on aluminium with silicon as the next major constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium
    • C22C21/06—Alloys based on aluminium with magnesium as the next major constituent
    • C22C21/08—Alloys based on aluminium with magnesium as the next major constituent with silicon
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium
    • C22C21/06—Alloys based on aluminium with magnesium as the next major constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/002—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working by rapid cooling or quenching; cooling agents used therefor
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/04—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon
    • C22F1/047—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon of alloys with magnesium as the next major constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/04—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon
    • C22F1/05—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon of alloys of the Al-Si-Mg type, i.e. containing silicon and magnesium in approximately equal proportions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
    • C25D11/08—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing inorganic acids
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/16—Pretreatment, e.g. desmutting

Definitions

  • the invention relates to a method of manufacturing an aluminium alloy plate of an Al- Mg-Si alloy (also known as a 6XXX-series aluminium alloy) for forming elements of the vacuum chambers of apparatuses for manufacturing semiconductor devices and liquid crystal devices, such as CVD systems, PVD systems, ion-implanting systems, sputtering systems and dry etching systems, and those placed in the vacuum chambers.
  • the invention relates also to a method of manufacturing vacuum chamber elements from the Al-Mg-Si alloy plate.
  • the invention further relates to methods of manufacturing valves and total assemblies from the Al-Mg-Si alloy plate.
  • Reactive gases, etching gases, and corrosive gases containing halogen as a cleaning gas are supplied into the vacuum chambers of apparatuses for manufacturing semiconductor devices and liquid crystal devices, such as CVD systems, PVD systems, ion-implanting systems, sputtering systems and dry etching systems. Therefore, the vacuum chambers are required to have corrosion resistance to corrosive gases (hereinafter, referred to as “corrosive gas resistance”). Since a halogen plasma is often produced in the vacuum chamber, resistance to plasmas (hereinafter, referred to as “plasma resistance”) is also important. Recently, aluminium and aluminium alloy materials have been used for forming elements of the vacuum chamber because aluminium and aluminium alloy materials are light and excellent in thermal conductivity.
  • US patent document US-2012/0325381-A1 discloses a manufacturing process for a block of aluminium at least 250 mm thick designed for manufacture of an element for a vacuum chamber, the method comprises casting a block of a given 6XXX-series aluminium alloy, optionally homogenizing said cast block, performing a solution heat treatment directly on the cast and optionally homogenized block, quenching the block, stress relieving of the quenched block by means of cold compression, followed by artificial ageing to a T652 condition.
  • a key element of the disclosed process is that prior to the solution heat treatment the block has not been hot or cold worked to reduce its thickness.
  • the resultant plate product is a so-called “cast plate”.
  • a disadvantage of cast plate is that the unavoidable phases resulting from the combination and precipitation at grain boundaries of elements like iron, manganese, magnesium, and silicon, often in an eutectic form after solidification, cannot be fully dissolved in the subsequent processing steps like homogenization and solution heat treatment and remain as sites for crack initiation, thus significantly lowering the mechanical properties (e.g., ultimate tensile strength, elongation, toughness, and others), or as initiators of local corrosion (e.g. pitting corrosion) and are harmful also for final treatments like anodization which is of particular relevance for vacuum chamber elements. Any oxide layer present within the cast alloy will also remain in its original shape therefore also lowering the mechanical properties.
  • cast plate products might be produced more cost effective, because substantially the as-cast microstructure is maintained, and strongly depends on the local cooling speed during the casting operation, there is much more variation in mechanical properties as function of the testing location as compared to rolled plate products, rendering cast plates less suitable for many critical applications.
  • Figure 1 is a sample light microscope image for analysing the phases and particles of the aluminium alloy materials described herein.
  • aluminium alloy designations and temper designations refer to the Aluminium Association designations in Aluminium Standards and Data and the Registration Records, as published by the Aluminium Association in 2019 and are well known to the person skilled in the art.
  • the temper designations are laid down also in European standard EN515.
  • up to 0.08% Zn may include an aluminium alloy having no Zn.
  • Cu up to 0.05%, preferably up to 0.03%;
  • T6 condition e.g., T651
  • T7 condition e.g., T7651
  • the resultant aluminium alloy plate is ideally suitable for manufacturing vacuum chamber elements. It is available in a wide range of thicknesses and is very good anodizable with a hard anodic coating.
  • the aluminium plate material has high mechanical properties providing good shape stability of the vacuum chamber element. Several properties of an anodized element depend on the plate material’s microstructure and composition.
  • the plate product has a microstructure having a uniform distribution of phases within the plate leading to a less affected anodic layer concerning e.g. plate thickness and uniformity at the surface after anodization.
  • the resultant plate product according to this invention provides a high corrosive gas resistance, e.g. as tested in a bubble test using 5% HC1; and has a high breakdown voltage (AC, DC) measured according to ISO- 2376(2010).
  • the Al-Mg-Si alloy plate at thickness 55 mm in T651 condition has a tensile yield strength (YS) of at least 250 MPa, and even of at least 265 MPa, in the in direction in accordance with the applicable norm ISO 6892-1 B.
  • YS tensile yield strength
  • the Al-Mg-Si alloy plate at thickness 55 mm in T651 condition has a tensile strength (UTS) of at least 300 MPa, and even of at least 310 MPa, in the LT- direction in accordance with the applicable norm ISO 6892-1 B.
  • UTS tensile strength
  • the Al-Mg-Si alloy plate at thickness 55 mm in T651 condition has an elongation (Asomm) at least 8%, and even of at least 10%, in the LT-direction in accordance with the applicable norm ISO 6892-1 B.
  • Mg in combination with Si are the main alloying elements in the aluminium alloy to provide strength by the formation of Mg2Si phases.
  • the Mg should be in a range of 0.80% to 1.05%, and preferably in a range of 0.85% to 1.05%.
  • a preferred upper-limit for the Mg content is 1.0%.
  • a too high Mg content may lead to lead to the formation of coarse Mg2Si phases having an adverse effect of the quality of a subsequently applied anodization coating.
  • a too low Mg content has an adverse effect on the tensile properties of the aluminium plate.
  • the Si should be in a range of 0.70% to 1.0%. In an embodiment the Si content is at least 0.75%, preferably at least 0.80%, and most preferably at least 0.84%. In an embodiment the upper-limit for the Si-content is 0.95%.
  • the ratio of Mg/Si, in wt.% is more than 0.9, and preferably more than 1.0, and most preferably more than 1.05. Reducing the amount of free Si in the aluminium alloy favours an increased elongation in the aluminium plate after SHT at relative high temperatures as done in accordance with the invention.
  • Mn Another important alloying element is Mn and should be in a range of 0.70% to 0.90% to increase the strength in the aluminium plate and to control the grain structure and leads recrystallisation after solution heat treatment and quenching.
  • a preferred lower limit is 0.75%.
  • a preferred upper-limit is 0.85%.
  • Fe is an impurity element which should not exceed 0.20%.
  • the Fe level is preferably up to 0.12%. However, it is preferred that at least 0.03% is present, and more preferably at least 0.04%.
  • a too low Fe content may lead to undesirable recrystallized grain coarsening and makes the aluminium alloy too expensive.
  • a too high Fe content results in reduced tensile properties and has an adverse effect on for example the breakdown voltage after anodization due to the formation of amongst others AlFeSi phases and has also an adverse effect on the corrosive gas resistance.
  • Zn up to about 0.08%, Cu up to about 0.05%, and Cr up to about 0.03% are tolerable impurities and have an adverse effect on the quality of a subsequently applied anodization coating, e.g. reduced corrosive gas resistance.
  • the Zn is up to about 0.05%, and preferably up to about 0.03%.
  • the Cu is up to about 0.03%, and preferably up to about 0.02%.
  • the Cr is up to about 0.02%.
  • Ti up to 0.06% is added as a grain refiner of the as-cast microstructure. In an embodiment it is present in a range of about 0.01% to 0.06%, and preferably in a range of about 0.01% to 0.04%.
  • Impurities are present up to 0.03% each and up to 0.10% total.
  • the Al-Mg-Si aluminium alloy has a composition consisting of, in wt.%, Mg 0.80% to 1.05%, Si 0.70% to 1.0%, Mn 0.70% to 0.90%, Fe up to 0.20%, Zn up to 0.08%, Cu up to 0.05%, Cr up to 0.03%, Ti up to 0.06%, unavoidable impurities each up to 0.03%, total up to 0.10%, balance aluminium, and with preferred narrower ranges as herein described and claimed.
  • the Al-Mg-Si aluminium alloy has a composition comprising, in wt.%,
  • the Al-Mg-Si-Mn aluminium alloy is provided as an ingot or slab for fabrication into a hot rolled plate product by casting techniques regular in the art for cast products, e.g. Direct- Chill (DC)-casting, Electro-Magnetic-Casting (EMC)-casting, Electro-Magnetic-Stirring (EMS)-casting, and preferably having an ingot thickness in a range of about 220 mm or more, e.g. 400 mm, 500 mm or 600 mm.
  • the as-cast ingot is commonly scalped to remove segregation zones near the cast surface of the ingot.
  • Grain refiners such as those containing titanium and boron, or titanium and carbon, are used as is well-known in the art to obtain a fine as-cast grain structure.
  • the purpose of a homogenisation heat treatment has at least the following objectives: (i) to dissolve as much as possible coarse soluble phases formed during solidification, and (ii) to reduce concentration gradients to facilitate the dissolution step.
  • a preheat treatment achieves also some of these objectives.
  • the homogenisation process is done a temperature range of 550°C to 595°C.
  • the homogenization temperature is at least 555°C, and more preferably at least 565°C.
  • the soaking time at the homogenisation temperature is in the range of about 1 to 20 hours, and preferably does not exceed about 15 hours, and is more preferably in a range of about 5 to 15 hours.
  • the heat-up rates that can be applied are those which are regular in the art.
  • the hot rolling is performed to a hot rolling plate thickness of 10 mm or more.
  • the upper-limit is about 230 mm, preferably about 200 mm and more preferably about 180 mm.
  • a next important process step is solution heat treating (“SHT”) of the hot rolled plate material.
  • the plate product should be heated to bring as much as possible all or substantially all portions of the soluble alloying elements into solution.
  • SHT is preferably carried out at a temperature in the temperature range of about 540°C to 590°C.
  • a higher SHT temperature provides more favourable mechanical properties, e.g. an increased Rm.
  • the lower-limit for the SHT temperature is 545°C, preferably it is 550°C.
  • the upper-limit for the SHT temperature is about 580°C, and more preferably about 575°C.
  • a low SHT temperature reduces the strength of the aluminium plate and some large Mg2Si phases main remain undissolved and may create so called “hot spots” and reducing the corrosion resistance after anodization and reduce the breakdown voltage. It is believed that shorter soaking times are very useful, for example in the range of about 10 to 180 minutes, preferably in a range of 10 to 40 minutes, and more preferably in a range of 10 to 35 minutes, for example for plate thicknesses up to 50 mm.
  • a too long soaking time at a relative high SHT temperature results in the growth of several phases adversely affecting the ductility of the aluminium plate.
  • the SHT is typically carried out in a batch or a continuous furnace.
  • the plate material be cooled with a high cooling rate to a temperature of 100°C or lower, preferably to below 40°C, to prevent or minimise the uncontrolled precipitation of secondary phases.
  • cooling rates should preferably not be too high to allow for a sufficient flatness and low level of residual stresses in the plate product. Suitable cooling rates can be achieved with the use of water, e.g. water immersion or water jets.
  • the SHT and quenched plate material is further cold worked, preferably by means of stretching in the range of about 1% to 5% of its original length to relieve residual stresses therein and to improve the flatness of the plate product.
  • the stretching is in the range of about 1.5% to 4%, more preferably of about 2% to 3.5%.
  • the stretched plate material is aged, preferably artificially aged, more preferably to provide a T6 condition, more preferably a T651 condition.
  • the artificial ageing is performed at a temperature in the range of 150°C to 190°C, and preferably for a time of 5 to 60 hours.
  • the stretch plate material is aged to an over-aged T7 condition, preferably to a T74 or T76 condition, and more preferably to an T7651 condition.
  • a vacuum chamber element in a further aspect of the invention it relates to a method of manufacturing a vacuum chamber element, the method comprising the steps of manufacturing the Al-Mg-Si alloy plate having a thickness of at least 10 mm as herein set forth and claimed, and further comprising the subsequent steps of: (h) machining said aged plate, e.g. in T6, T651, T7, T74, T76, or T7651 condition, into a vacuum chamber element of predetermined shape and dimensions;
  • the product thus anodized is hydrated or sealed in deionised water at a temperature of at least 80°C and preferably of at least 98°C, preferably for a duration of at least about 1 hour.
  • the hydration is performed in two steps, a first steps with a duration of at least 10 minutes at a temperature of 30°C to 70°C, and a second step with a duration of at least about 1 hour at a temperature of at least 98°C.
  • the anodization is performed using an electrolytic solution comprising at least sulfuric acid at a temperature about 15°C to 30°C and a current density from about 1.0 A/dm 2 to about 2 A/dm 2 .
  • the acid concentration in the anodizing bath is typically in a range of about 5 to 20 vol.%.
  • the process takes from about 0.5 to 60 minutes, depending on the desired oxide layer thickness.
  • the sulfuric anodizing generally yields an oxide layer with a thickness from about 8 microns to about 40 microns.
  • the anodization is performed in an electrolytic solution comprising at least sulfuric acid at a temperature from about 0°C to about 10°C and a current density from about 3 A/dm 2 to about 4.5 A/dm 2 .
  • the process generally takes from about 20 minutes to about 120 minutes.
  • This hardcoat anodizing generally yields an oxide layer with a thickness from about 30 microns to about 80 microns, or even thicker.
  • the material described herein can have a density of phases and particles having a size greater than 10 pm 2 of less than 400 phases per mm 2 .
  • the material can have a density of phases and particles having a size greater than 10 pm 2 ranging from 100 to 400 phases per mm 2 or from 250 to 350 phases per mm 2 .
  • the phases and particles can include AlFeSi-type phases and particles and Mg2Si phases and particles.
  • Sample 1 a sample having a thickness of 130 mm
  • Sample 2 a sample having a thickness of 40 mm
  • Sample 3 a sample having a thickness of 14 mm
  • Each of the samples was analyzed at three positions, including the near surface position (“surface”), quarter thickness position (“s/4”), and half thickness position (“s/2”).
  • Seven images were captured per position at 1280 x 1024 pixel 2 (0.382 pm/pixel).
  • 0.191 mm 2 /image was analyzed for seven images, approximately 1.34 mm 2 for each position was investigated, amounting to 12.05 mm 2 in total.
  • the samples were extensively studied.
  • the images were taken using a light microscope at a magnification of 200x.
  • the samples were prepared in the same manner. No etching was performed. Grinding and polishing was performed for each sample, with special attention paid to avoid any impact on the data due to the preparation method, such as, for example, pores or scratches that could potentially be misinterpreted due to the use of greyscale analyzing tools.
  • the phases and particles analyzed were mainly AlFeSi-type phases and particles along with Mg2Si phases and particles.
  • the detection was performed using ImageJ software, and the analysis was performed in grayscale.
  • a sample image is shown in Figure 1.
  • a filter was used to only count particles having an area of greater than 10 pm 2 . The results are shown below in Table 1.
  • the density for each position is shown in the column labeled “Density (phases/mm 2 ),” the average density for each sample (calculated by taking the average of the three positions for each sample) is shown in the column labeled “Average Density (phases/mm 2 )”, and the total average density calculated by taking the average of the nine measurements (three samples and three positions per sample) is shown in the column labeled “Total Average Density for All Samples (phases/mm 2 ).” As shown in Table 1, the densities ranged from 250 to 320 phases/mm 2 .

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Conductive Materials (AREA)
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Abstract

L'invention concerne un procédé de fabrication d'une tôle d'alliage d'aluminium pour des éléments de chambre à vide, des vannes ou des ensembles totaux, le procédé comprenant les étapes consistant à : (a) utiliser un matériau de produit de départ de laminage en alliage d'aluminium Al-Mg-Si ayant une composition comprenant, en % en poids, 0,80 % à 1,05 % de Mg, 0,70 % à 1,0 % de Si, 0,70 % à 0,90 % de Mn, jusqu'à 0,20 % de Fe, jusqu'à 0,08 % de Zn, jusqu'à 0,05 % de Cu, jusqu'à 0,03 % de Cr, jusqu'à 0,06 % de Ti, des impuretés inévitables et le reste d'aluminium ; (b) homogénéiser le produit de départ de laminage à une température dans une plage de 550 à 595 °C ; (c) laminer à chaud le produit de départ de laminage homogénéisé en une ou plusieurs étapes de laminage en une tôle laminée à chaud ayant une épaisseur d'au moins 10 mm ; (d) traiter thermiquement en solution (SHT'') la tôle laminée à chaud à une température dans une plage de 540 à 590 °C ; (e) refroidir rapidement la tôle SHT ; (f) étirer la tôle SHT refroidie pour obtenir un allongement permanent de 1 à 5 % ; et (g) faire vieillir artificiellement la tôle étirée.
PCT/IB2021/054983 2020-06-10 2021-06-07 Procédé de fabrication d'une tôle d'alliage d'aluminium pour des éléments de chambre à vide WO2021250545A1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
CN202180040721.3A CN115698355A (zh) 2020-06-10 2021-06-07 制造用于真空室元件的铝合金板的方法
CA3181196A CA3181196A1 (fr) 2020-06-10 2021-06-07 Procede de fabrication d'une tole d'alliage d'aluminium pour des elements de chambre a vide
JP2022566688A JP2023524523A (ja) 2020-06-10 2021-06-07 真空槽部材用のアルミニウム合金板を製造するための方法
EP21730296.7A EP4165223A1 (fr) 2020-06-10 2021-06-07 Procédé de fabrication d'une tôle d'alliage d'aluminium pour des éléments de chambre à vide
KR1020227038536A KR20220156648A (ko) 2020-06-10 2021-06-07 진공 챔버 요소용 알루미늄 합금 플레이트의 제조 방법
US17/999,988 US20230220522A1 (en) 2020-06-10 2021-06-07 Method of manufacturing an aluminium alloy plate for vacuum chamber elements

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP20179258.7A EP3922743A1 (fr) 2020-06-10 2020-06-10 Procédé de fabrication de plaque d'aluminium pour chambres à vide
EP20179258.7 2020-06-10

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WO2021250545A1 true WO2021250545A1 (fr) 2021-12-16

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US (1) US20230220522A1 (fr)
EP (2) EP3922743A1 (fr)
JP (1) JP2023524523A (fr)
KR (1) KR20220156648A (fr)
CN (1) CN115698355A (fr)
CA (1) CA3181196A1 (fr)
WO (1) WO2021250545A1 (fr)

Cited By (1)

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Publication number Priority date Publication date Assignee Title
WO2023233090A1 (fr) 2022-06-01 2023-12-07 Constellium Valais Sa Toles pour elements de chambres a vide en alliage d'aluminium

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JP2023524523A (ja) 2023-06-12
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EP3922743A1 (fr) 2021-12-15
CA3181196A1 (fr) 2021-12-16
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