WO2021203826A1 - Heat dissipation apparatus and method for manufacturing same, and electronic device - Google Patents

Heat dissipation apparatus and method for manufacturing same, and electronic device Download PDF

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Publication number
WO2021203826A1
WO2021203826A1 PCT/CN2021/075525 CN2021075525W WO2021203826A1 WO 2021203826 A1 WO2021203826 A1 WO 2021203826A1 CN 2021075525 W CN2021075525 W CN 2021075525W WO 2021203826 A1 WO2021203826 A1 WO 2021203826A1
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WIPO (PCT)
Prior art keywords
heat dissipation
cover plate
capillary
dissipation device
layer
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PCT/CN2021/075525
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French (fr)
Chinese (zh)
Inventor
杨鑫
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Oppo广东移动通信有限公司
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Application filed by Oppo广东移动通信有限公司 filed Critical Oppo广东移动通信有限公司
Publication of WO2021203826A1 publication Critical patent/WO2021203826A1/en

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K7/00Constructional details common to different types of electric apparatus
    • H05K7/20Modifications to facilitate cooling, ventilating, or heating
    • H05K7/2029Modifications to facilitate cooling, ventilating, or heating using a liquid coolant with phase change in electronic enclosures
    • H05K7/20336Heat pipes, e.g. wicks or capillary pumps

Definitions

  • This application belongs to the field of heat conduction technology, and specifically relates to a heat dissipation device, a preparation method of the heat dissipation device, and electronic equipment.
  • a heat sink When electronic equipment is in operation, heat is generated, which directly causes the temperature of the electronic equipment to rise sharply. Therefore, a heat sink must be used to quickly dissipate the heat. Take the soaking plate as an example, it uses the phase change of the working fluid to transfer heat to complete the heat dissipation; but in this process, the gaseous working fluid in the vapor chamber interacts with the liquid working fluid in the capillary structure, which causes the flow of each other Interference, thereby reducing the heat transfer speed, affecting the heat dissipation effect, and even losing the heat dissipation effect.
  • the present application provides a heat dissipation device and a method for preparing the heat dissipation device, which is beneficial to gas-liquid separation, effectively avoids the interaction of working fluids between different forms, improves the heat dissipation performance of the heat dissipation device, and realizes efficient heat dissipation; at the same time, it also provides
  • the electronic equipment of the heat dissipation device improves the heat dissipation performance of the electronic equipment, facilitates the heat dissipation of the electronic equipment, and ensures the performance of the electronic equipment.
  • the present application provides a heat dissipation device, including a first cover plate, a second cover plate, a capillary wick, and a working fluid.
  • the first cover plate and the second cover plate cover together to form a sealed container
  • the capillary wick is arranged on the surface of the first cover plate close to the accommodating space, and the working fluid is filled in the accommodating space, wherein the capillary wick includes a support layer and a capillary structure layer
  • the supporting layer includes a plurality of supporting bars and a plurality of hollow areas formed by staggered arrangement of the supporting bars, the capillary structure layer is disposed between the supporting layer and the first cover plate, and the
  • the capillary structure layer includes a plurality of microstructures arranged on the support bar at intervals, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area.
  • the present application provides a method for manufacturing a heat sink, including:
  • a capillary core includes a support layer and a capillary structure layer, the support layer includes a plurality of support bars and a plurality of hollow areas formed by staggered arrangement of the plurality of support bars, the capillary structure layer includes a plurality of Two microstructures spaced apart on the support bar, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area;
  • a first cover plate and a second cover plate are provided, and the first cover plate and the second cover plate are combined to form a closed accommodating space, the capillary core is arranged in the accommodating space, and the capillary
  • the structural layer is arranged between the support layer and the first cover plate;
  • a working fluid is injected into the accommodating space, and a heat dissipation device is formed after sealing.
  • the present application provides an electronic device including a heating element and a heat dissipation device.
  • the heat dissipation device includes a first cover plate, a second cover plate, a capillary core, and a working fluid.
  • the first cover plate and the heat dissipation device The second cover plate is covered to form a closed accommodating space, the capillary wick is disposed on the surface of the first cover plate close to the accommodating space, and the working fluid is filled in the accommodating space, wherein
  • the capillary core includes a support layer and a capillary structure layer.
  • the support layer includes a plurality of support bars and a plurality of hollow areas formed by staggered arrangement of the plurality of support bars.
  • the capillary structure layer is arranged on the support layer and Between the first cover plates, the capillary structure layer includes a plurality of microstructures arranged on the support bar at intervals, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area, and The heat dissipation device is arranged corresponding to the heating element.
  • FIG. 1 is a cross-sectional view of a heat dissipation device provided by an embodiment of the application.
  • Fig. 2 is a top view of a support layer provided by an embodiment of the application.
  • Fig. 3 is a partial enlarged view of a supporting layer provided by an embodiment of the application.
  • Fig. 4 is a partial enlarged view of a supporting layer provided by another embodiment of the application.
  • Fig. 5 is a schematic diagram of a capillary structure layer provided by an embodiment of the application.
  • Fig. 6 is a partial enlarged view of the capillary structure layer of Fig. 5.
  • Fig. 7 is a top view of a capillary wick provided by an embodiment of the application.
  • Fig. 8 is a partial enlarged view of the capillary wick of Fig. 7.
  • FIG. 9 is a schematic flowchart of a method for manufacturing a heat sink provided by an embodiment of the application.
  • FIG. 10 is a schematic structural diagram of an electronic device provided by an embodiment of this application.
  • FIG. 11 is a schematic cross-sectional view of an electronic device provided by another embodiment of this application.
  • the embodiment of the present application provides a heat dissipation device, which includes a first cover plate, a second cover plate, a capillary core, and a working fluid.
  • the first cover plate and the second cover plate cover together to form a closed accommodating space
  • the capillary wick is arranged on the surface of the first cover plate close to the accommodating space, and the working fluid is filled in the accommodating space.
  • the capillary wick includes a support layer and a capillary structure layer.
  • the support layer includes a plurality of support bars and a plurality of hollow areas formed by staggered arrangement of the plurality of support bars, the capillary structure layer is arranged between the support layer and the first cover plate, and the capillary structure
  • the layer includes a plurality of microstructures arranged on the support bar at intervals, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area.
  • a plurality of the microstructures are arranged in an array on the capillary structure layer.
  • the microstructure includes a first microstructure and a second microstructure, the length extension directions of the first microstructure and the second microstructure are staggered, and the first microstructure and the second microstructure are spaced apart from each other. set up.
  • the plurality of support bars includes a plurality of first support bars arranged in parallel and a plurality of second support bars arranged in parallel, and a plurality of the first support bars and a plurality of the second support bars are arranged in a staggered manner.
  • the cloth forms the hollow area.
  • first supporting bar and the second supporting bar intersect to form a supporting node, and the microstructure is arranged on the supporting node.
  • the lateral size of the microstructure is 5 ⁇ m-60 ⁇ m
  • the thickness is 5 ⁇ m-40 ⁇ m
  • the gap between adjacent microstructures is 5 ⁇ m-50 ⁇ m.
  • the thickness of the support layer is 5 ⁇ m-40 ⁇ m, and the lateral dimension of the hollow area is 40 ⁇ m-150 ⁇ m.
  • the material of the capillary core includes at least one of copper, titanium, nickel and tin or stainless steel.
  • the capillary core is an integrally formed structure.
  • the opening areas of the plurality of hollow areas are the same.
  • the distance between the support layer and the second cover plate is 20 ⁇ m-120 ⁇ m.
  • the shape of the microstructure includes at least one of a cube, a rectangular parallelepiped, a cylinder, and an irregular three-dimensional structure.
  • the capillary core further includes a frame, and the frame surrounds the periphery of the support layer and the capillary structure layer.
  • the heat dissipation device further includes a supporting structure, the supporting structure is arranged in the accommodating space and abuts against the first cover plate and the second cover plate.
  • the supporting structure abuts against the supporting layer.
  • the embodiment of the present application also provides a method for manufacturing a heat dissipation device, including:
  • a capillary core includes a support layer and a capillary structure layer, the support layer includes a plurality of support bars and a plurality of hollow areas formed by staggered arrangement of the plurality of support bars, the capillary structure layer includes a plurality of Two microstructures spaced apart on the support bar, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area;
  • a first cover plate and a second cover plate are provided, and the first cover plate and the second cover plate are combined to form a closed accommodating space, the capillary core is arranged in the accommodating space, and the capillary
  • the structural layer is arranged between the support layer and the first cover plate;
  • a working fluid is injected into the accommodating space, and a heat dissipation device is formed after sealing.
  • said providing capillary wick includes:
  • the substrate having a first surface and a second surface that are opposed to each other;
  • a second mask is provided, and the second surface of the substrate is coated with glue, exposed, developed and etched to form the capillary structure layer to obtain the capillary core.
  • the exposure accuracy is 0.5 ⁇ m-5 ⁇ m
  • the etching accuracy is 0.5 ⁇ m-5 ⁇ m.
  • the embodiment of the present application also provides an electronic device, including a heating element and a heat dissipation device.
  • the heat dissipation device includes a first cover plate, a second cover plate, a capillary core, and a working fluid.
  • the first cover plate and the second cover plate The two cover plates are combined to form a closed accommodating space, the capillary wick is arranged on the surface of the first cover plate close to the accommodating space, and the working fluid is filled in the accommodating space, wherein the
  • the capillary core includes a support layer and a capillary structure layer.
  • the support layer includes a plurality of support bars and a plurality of hollow areas formed by staggered arrangement of the plurality of support bars.
  • the capillary structure layer is disposed on the support layer and the capillary structure layer. Between the first cover plates, the capillary structure layer includes a plurality of microstructures spaced apart on the support bar, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area, and the heat dissipation The device is arranged corresponding to the heating element.
  • the electronic equipment further includes a middle plate, and the heat dissipation device is embedded in the middle plate and is arranged in close contact with the heating element.
  • FIG. 1 is a cross-sectional view of a heat dissipation device 100 according to an embodiment of the application.
  • the heat dissipation device 100 includes a first cover plate 10, a second cover plate 20, a capillary core 30 and a working fluid.
  • the first cover plate 10 and the second cover plate The cover plate 20 is covered to form a closed accommodating space 40, the capillary wick 30 is arranged on the surface of the first cover plate 10 close to the accommodating space 40, and a working fluid (not shown in the figure) is filled in the accommodating space 40, wherein
  • the capillary core 30 includes a support layer 31 and a capillary structure layer 32.
  • the support layer 31 includes a plurality of support bars 310 and a plurality of hollow areas 311 formed by staggered arrangement of the plurality of support bars 310.
  • the capillary structure layer 32 is disposed on the support layer 31. Between the capillary structure layer 32 and the first cover plate 10, the capillary structure layer 32 includes a plurality of microstructures 320 arranged on the support bar 310 at intervals, and the gap between adjacent microstructures 320 is smaller than the lateral dimension of the hollow area 311.
  • the first cover plate 10 of the heat sink 100 when the first cover plate 10 of the heat sink 100 is in contact with the heat source, it absorbs heat and is transferred to the liquid working fluid in the capillary core 30.
  • the liquid working fluid absorbs the heat and vaporizes to form a gaseous working fluid, which passes through the heat sink 100
  • the accommodating space 40 which can also be referred to as a steam chamber, transfers heat from the first cover plate 10 to the second cover plate 20, and transfers the heat to the outside through the second cover plate 20.
  • the gaseous working fluid is condensed into a liquid working fluid, and the capillary force generated by the capillary core 30 drains it to the first cover plate 10, and the heat dissipation process described above is cyclically performed to complete the heat dissipation.
  • the heat dissipation device 100 provided in the present application transfers heat through the phase change of the working fluid, and the heat dissipation device 100 may be, but is not limited to, a soaking plate.
  • the capillary wick only has a capillary structure layer. After the liquid working fluid in the capillary structure layer is heated and evaporated, it forms a gaseous working fluid and enters the accommodating space; due to the capillary force of the capillary structure layer, and the accommodating space
  • the interaction force between the gaseous working fluid and the liquid working fluid in the capillary structure layer causes the gaseous working fluid to be affected by the force when it diffuses, and thus cannot fill the containing space, which affects the heat dissipation volume and heat dissipation speed, and makes the entire heat dissipation device Reduced heat dissipation effect may even lose heat dissipation performance; what's more, after reducing the thickness of the heat dissipation device, the interaction force becomes more obvious, and the gaseous working fluid suffers greater resistance during diffusion, which further reduces the heat dissipation volume and heat dissipation speed.
  • the capillary core 30 is provided with a support layer 31 and a capillary structure layer 32, wherein the gap between adjacent microstructures 320 in the capillary structure layer 32 is smaller than the lateral size of the hollow area 311 in the support layer 31, so that The capillary structure layer 32 generates capillary force, while the support layer 31 does not generate capillary force.
  • the liquid working fluid in the capillary structure layer 32 when the liquid working fluid in the capillary structure layer 32 is heated to become a gaseous working fluid, it enters the accommodating space 40 through the hollow area 311 of the support layer 31, and then flows in the direction of the second cover plate 20, Realize the heat transfer; in this process, the hollow area 311 of the support layer 31 does not produce capillary force on the gaseous working fluid, and will not affect the flow of the gaseous working fluid, so that the gaseous working fluid can quickly enter the accommodating space 40 and proceed. Large area diffusion increases the heat dissipation volume and heat dissipation speed.
  • the heat dissipation device 100 provided by the present application is provided with the supporting layer 31 to separate the interaction force between the gaseous working fluid in the accommodating space 40 and the liquid working fluid in the capillary structure layer 32, thereby helping to improve heat dissipation.
  • the gaseous working fluid in the accommodating space 40 and the liquid working fluid in the capillary structure layer 32 will not interact with each other, ensuring the heat dissipation speed and heat dissipation volume, so ,
  • the heat dissipation device 100 provided in the present application can also be light and thin, which is beneficial to its application.
  • the support layer 31 supports the capillary structure layer 32, and the hollow area 311 can be used as a channel for the working fluid to flow in the heat dissipation cycle.
  • the supporting layer 31 includes a plurality of supporting bars 310 and a plurality of hollow areas 311 formed by the plurality of supporting bars 310 staggered, that is, the plurality of supporting bars 310 are staggered to form the supporting layer 31 with a grid structure.
  • FIG. 2 is a top view of the support layer 31 provided by an embodiment of the present application.
  • the support layer 31 includes a plurality of support bars 310 and a plurality of hollow areas 311 formed by staggered arrangement of the plurality of support bars 310.
  • FIG. 3 is a partial enlarged view of the support layer provided by an embodiment of the application, wherein the plurality of support bars 310 includes a plurality of first support bars 3101 arranged in parallel and a plurality of second support bars 3102 arranged in parallel , The plurality of first supporting bars 3101 and the plurality of second supporting bars 3102 are arranged in a staggered manner to form a plurality of hollow areas 311.
  • FIG. 4 which is a partial enlarged view of the support layer provided by another embodiment of this application.
  • the plurality of support bars 310 includes a plurality of first support bars 3101 arranged in parallel, and a plurality of second support bars 3102 arranged in parallel.
  • a plurality of third support bars 3103 arranged in parallel, a plurality of first support bars 3101, a plurality of second support bars 3102, and a plurality of third support bars 3103 are alternately arranged to form a plurality of hollow areas 311.
  • the plurality of support strips 310 may have different extension directions and arrangements, and are arranged irregularly, forming a hollow area 311 staggered.
  • the length and width of the support bar 310 can be selected according to the needs of the heat sink 100.
  • the length of the support bar 310 can be but not limited to 50mm-1000mm, and the width can be but not limited to 20 ⁇ m-200 ⁇ m.
  • the support layer 31 includes a plurality of support bars 310, and the number of the support bars 310 can be selected according to the performance of the heat dissipation device 100.
  • the number of the support bars 310 in the support layer 31 can be, but is not limited to, more than 50, 100, 150, 200, etc.
  • a plurality of support bars 310 are staggered to form a plurality of hollow areas 311.
  • the cross-section of the hollow areas 311 can be, but not limited to, a square, a rectangle, a diamond, a trapezoid, an irregular shape, and the like.
  • the plurality of hollow areas 311 are regularly arranged on the support layer 31, so that the gaseous working fluid passes through the hollow areas 311 at the same speed during the heat dissipation process, thereby ensuring a stable heat dissipation effect.
  • the opening areas of the plurality of hollow areas 311 are the same, so that the amount of gaseous working fluid passing through the hollow areas 311 during the heat dissipation process is the same, thereby ensuring a stable heat dissipation effect.
  • the first cover plate 10 includes a first area and a second area adjacent to the first area. During the application process, the first area can be set corresponding to the heating element. The opening area of the hollow area 311 corresponding to the first area in the support layer 31 is larger than the opening area of the hollow area 311 corresponding to the second area, so that the gaseous working fluid can enter the accommodating space 40 through the hollow area 311 in a large amount and quickly.
  • the hollow area 311 has a length, a width, and a depth, and the lateral size of the hollow area 311 refers to the size of the hollow area 311 in the length direction.
  • the lateral dimension of the hollow area 311 is 40 ⁇ m-150 ⁇ m, 45 ⁇ m-150 ⁇ m, 50 ⁇ m-140 ⁇ m, 50 ⁇ m-120 ⁇ m, or 65 ⁇ m-110 ⁇ m, so that the hollow area 311 does not have a capillary effect on the working fluid, and thus does not Affect the flow of working fluid.
  • the lateral size of the hollow area 311 may be, but is not limited to, 40 ⁇ m, 55 ⁇ m, 70 ⁇ m, 85 ⁇ m, 95 ⁇ m, 110 ⁇ m, 125 ⁇ m, or 145 ⁇ m.
  • the number of hollow areas 311 can be selected according to actual needs. For example, the number of hollow areas 311 in the support layer 31 is greater than 1000, 1800, 2500, 5000, etc.
  • the material of the support layer 31 can be, but is not limited to, at least one of copper, titanium, nickel, and tin or stainless steel, so that the support layer 31 can conduct heat and at the same time facilitate the working fluid to transfer heat.
  • the material of the support layer 31 is copper, copper-titanium alloy or stainless steel, so that the support layer 31 has better mechanical properties.
  • the thickness of the support layer 31 is 5 ⁇ m-40 ⁇ m, which further reduces the interaction between working fluids of different forms; if the thickness is too small, the capillary structure layer 32 and the accommodating space 40 work in different forms The fluids are more likely to interact with each other and affect the heat dissipation effect; if the thickness is too large, the thickness and weight of the heat dissipation device 100 will increase, which is not conducive to the lightness and thinness of the heat dissipation device 100.
  • the lateral size of the support layer 31 can be selected according to the size of the heat dissipation device 100 and actual needs; at the same time, the cross section of the support layer 31 can be, but is not limited to, square, rectangular, diamond, round, oval, or irregular. Shape etc.
  • the distance between the support layer 31 and the second cover plate 20 is 40 ⁇ m-120 ⁇ m, 50 ⁇ m-115 ⁇ m, or 60 ⁇ m-100 ⁇ m, which further increases the heat dissipation volume of the gaseous working fluid inside the heat dissipation device 100.
  • the capillary structure layer 32 is provided between the support layer 31 and the first cover plate 10.
  • the capillary structure layer 32 includes a plurality of microstructures 320 arranged on the support bar 310 at intervals, and the gap between adjacent microstructures 320 The gap is smaller than the lateral dimension of the hollow area 311.
  • FIG. 5 is a schematic diagram of the capillary structure layer 32 according to an embodiment of the present application.
  • the capillary structure layer 32 includes a plurality of microstructures 320, and there are gaps between adjacent microstructures 320 to generate capillary force.
  • the lateral size of the microstructure 320 is 5 ⁇ m-60 ⁇ m, and the thickness is 5 ⁇ m-40 ⁇ m, so that more microstructures 320 are distributed in a certain area, thereby generating greater capillary force.
  • the lateral dimension of the microstructure 320 is 10 ⁇ m-55 ⁇ m, and the thickness is 10 ⁇ m-35 ⁇ m.
  • the lateral dimension of the microstructure 320 is 10 ⁇ m-45 ⁇ m, and the thickness is 10 ⁇ m-30 ⁇ m.
  • the gap between adjacent microstructures 320 is 5 ⁇ m-50 ⁇ m, so that the capillary structure layer 32 generates a large capillary force, so that the liquid working fluid can quickly flow back into the capillary structure layer 32.
  • the heat of the first cover plate 10 is absorbed, and the next heat dissipation cycle is performed.
  • the gap between adjacent microstructures 320 is 8 ⁇ m-45 ⁇ m.
  • the gap between adjacent microstructures 320 is 10 ⁇ m-40 ⁇ m.
  • the shape of the microstructure 320 can be, but is not limited to, a cube, a cuboid, a cylinder, an irregular three-dimensional structure, and the like.
  • the shape of the microstructure 320 is a cylinder, a cube, or a rectangular parallelepiped, so that the capillary force everywhere in the capillary structure layer 32 is more uniform.
  • a plurality of microstructures 320 are arranged in an array on the capillary structure layer 32, which is beneficial to make the capillary force in the capillary structure layer 32 more uniform, and increase the uniform heat dissipation of the heat dissipation device. And stability. Please refer to FIG. 6, which is an enlarged view of the dotted line part of the capillary structure layer 32 of FIG. 5.
  • the microstructure 320 includes a first microstructure 321 and a second microstructure 322.
  • the directions are staggered, and the first microstructure 321 and the second microstructure 322 are arranged at intervals, so that a gap is generated between the adjacent first microstructure 321 and the second microstructure 322, thereby generating capillary force.
  • the first microstructure 321 and the second microstructure 322 have the same shape, and the first microstructure 321 and the second microstructure 322 are arranged on the support layer 31 at intervals, so that the capillary force in the capillary structure layer 32 is uniform , Thereby improving the stability of heat dissipation.
  • the material of the capillary structure layer 32 can be, but is not limited to, at least one of copper, titanium, nickel, and tin or stainless steel, so that when the capillary structure layer 32 is located between the support layer 31 and the first cover plate 10, It has good mechanical properties, is not easily deformed, and can store working fluid in the gap.
  • the first cover plate 10 includes a first area and a second area adjacent to the first area. During the application process, the first area can be set corresponding to the heating element.
  • the thickness of the microstructure corresponding to the first region of the capillary structure layer 32 is greater than the thickness of the microstructure corresponding to the second region, so that a greater capillary force is generated in the capillary structure layer 32 corresponding to the first region to accommodate more work Fluid, thereby improving the heat dissipation performance of the heat dissipation device 100.
  • FIG. 7 is a top view of the capillary core 30 according to an embodiment of the present application.
  • the capillary core 30 includes a support layer 31 and a capillary structure layer 32.
  • FIG. 8 is an enlarged view of the dotted line part of the capillary core 30 in FIG.
  • the support layer 31 supports and fixes the capillary structure layer 32.
  • a plurality of supporting bars 310 are staggered to form a hollow area 311, the position where the supporting bars 310 intersect is a supporting node, and the microstructure 320 is disposed on the supporting node.
  • the plurality of support bars 310 includes a plurality of first support bars 3111 arranged in parallel and a plurality of second support bars 3112 arranged in parallel, and the first support bars 3111 and the second support bars 3112 intersect to form The supporting node, the microstructure 320 is arranged on the supporting node.
  • the material of the capillary core 30 can be, but is not limited to, at least one of copper, titanium, nickel, and tin or stainless steel to improve the thermal conductivity and mechanical properties of the capillary structure.
  • the capillary core 30 may also include a frame 33 that surrounds the periphery of the support layer 31 and the capillary structure layer 32 to better enable the working fluid to flow in the capillary core and participate Cooling cycle.
  • the capillary core 30 can be formed by, but not limited to, integral molding.
  • a substrate can be provided, and a mask plate corresponding to the required support layer 31 and capillary structure layer 32 can be prepared in advance, and glue coating, exposure, development, and development can be performed on the two opposite surfaces of the substrate. After etching, the capillary core 30 is obtained. Further, the sum of the etching depths on opposite sides of the substrate is greater than or equal to the thickness of the substrate, so that the etching is complete.
  • the exposure precision is 0.5 ⁇ m-5 ⁇ m
  • the etching precision is 0.5 ⁇ m-5 ⁇ m, to form the support layer 31 with the hollow area 311 and the capillary structure layer 32 with the microstructure 320, and the formed support layer 31 and the capillary structure
  • the thickness is controllable and small, which is conducive to reducing the thickness of the heat dissipation device 100.
  • the capillary structure layer is prepared by weaving a copper mesh. Due to the limitation of the diameter of the copper mesh, the thickness of the capillary structure layer cannot be reduced, so that the thickness of the heat sink cannot be further reduced, and the gaseous working fluid is also restricted.
  • the heat dissipation volume is large, the resistance is large when the heat is dissipated, and the heat dissipation speed is slow.
  • the capillary structure layer 32 made by the method of the present application has a controllable thickness, which can greatly reduce the thickness of the capillary structure layer 32, which is beneficial to reduce the thickness of the heat sink 100; at the same time, due to the existence of the support layer 31, it avoids
  • the mutual interference of working fluids of different forms reduces the resistance of the working fluid during the heat dissipation process, and the thickness of the support layer 31 can be further reduced; in addition, even if the thickness of the heat dissipation device 100 is further reduced, the working fluid will still not be affected.
  • the heat dissipation speed affects, that is, it does not affect the heat dissipation performance of the heat dissipation device 100 and is more reliable.
  • the heat dissipation device 100 includes a first cover plate 10 and a second cover plate 20, and the first cover plate 10 and the second cover plate 20 cover together to form a closed accommodating space 40.
  • first and second in this application are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features.
  • the capillary wick 30 is provided on the first cover plate 10. When in use, the surface of the first cover plate 10 away from the second cover plate 20 is attached to the heat source, including direct attachment and indirect attachment through other components. ; Of course, the capillary wick 30 can also be arranged on the second cover plate 20, at this time the second cover plate 20 is away from the surface of the first cover plate 10 and is arranged in close contact with the heat source.
  • the thickness of the first cover plate 10 is less than or equal to 200 ⁇ m, and the thickness of the second cover plate 20 is less than or equal to 200 ⁇ m. Further, the thickness of the first cover plate 10 is less than or equal to 170 ⁇ m, and the thickness of the second cover plate 20 is less than or equal to 170 ⁇ m. Furthermore, the thickness of the first cover plate 10 is less than or equal to 150 ⁇ m, and the thickness of the second cover plate 20 is less than or equal to 150 ⁇ m. In the present application, the first cover plate 10 and the second cover plate 20 are composed of materials with thermal conductivity.
  • the thermal conductivity of the first cover plate 10 is greater than 10 W/(m ⁇ K), and the thermal conductivity of the second cover plate 20 is greater than 10 W/(m ⁇ K), so that the heat dissipation device 100 has an excellent heat dissipation effect .
  • the material of the first cover plate 10 includes at least one of copper, titanium, nickel and tin or stainless steel
  • the material of the second cover plate 20 includes at least one of copper, titanium, nickel and tin or Stainless steel.
  • the material of the first cover plate 10 is titanium, copper-titanium alloy, copper-nickel alloy, copper-tin alloy or stainless steel
  • the material of the second cover plate 20 is titanium, copper-titanium alloy, copper-nickel alloy, copper-tin alloy or stainless steel.
  • the first cover plate 10 includes a first horizontal layer and a first frame arranged on the edge of the surface of the first horizontal layer.
  • the first cover plate 10 can be manufactured by, but not limited to, integral molding.
  • the first cover plate 10 has a horizontal structure.
  • the second cover plate 20 includes a second horizontal layer and a second frame provided on the edge of the surface of the second horizontal layer.
  • the second cover plate 20 can be, but not limited to, be made by integral molding.
  • the second cover 20 has a horizontal structure.
  • the first frame abuts against the second frame to form an accommodating space 40.
  • first frame and the second cover plate 20 of the horizontal structure abut to form an accommodating space 40.
  • the second frame abuts against the first cover plate 10 of the horizontal structure to form the accommodating space 40.
  • the horizontal structure of the first cover plate 10 and the second cover plate 20 can be, but not limited to, forming the accommodating space 40 by welding or gluing, such as laser welding, diffusion welding, solder welding, and glue bonding. Wait.
  • the accommodating space 40 is in a vacuum state, so that the working fluid can easily be vaporized and conduct heat conduction.
  • the vacuum degree in the accommodating space 40 is 10 -3 -10 -1 Pa.
  • the degree of vacuum in the accommodating space 40 is 10 -2 -10 -1 Pa.
  • the working fluid is selected from substances that do not chemically react with the first cover plate 10, the second cover plate 20, and the capillary core 30.
  • the working fluid is selected from water, propylene glycol, acetone or methanol.
  • the working fluid may be, but is not limited to, deionized water.
  • the filling amount of the working fluid in the accommodating space 40 also affects the heat dissipation efficiency of the heat dissipation device 100. If the filling amount is too small, the heat taken away in one heat dissipation cycle is limited, and the filling amount is too much, which increases the weight of the heat dissipation device 100.
  • the filling amount of the working fluid in the accommodating space 40 is 15%-70%, which can effectively dissipate heat without making the heat sink 100 excessively heavy. Further, the filling amount of the working fluid in the accommodating space 40 is 30%-65%.
  • the heat dissipation device 100 further includes a support structure 50, which provides a certain support for the accommodation space 40 of the heat dissipation device 100 effect.
  • the heat dissipation device 100 includes at least one supporting structure 50.
  • the supporting structure 50 is disposed in the accommodating space 40 and abuts against the first cover plate 10 and the second cover plate 20.
  • the supporting structure 50 abuts against the supporting layer 31 in the capillary core 30.
  • the thickness of the support structure 50 is selected according to actual needs, and can be, but is not limited to, 20 ⁇ m-120 ⁇ m. It is understandable that the support structure 50 mainly supports the heat dissipation device 100, and the selection of its material can be selected according to needs, and it can be but not limited to metal, such as copper, copper alloy, and the like.
  • the heat dissipation device 100 provided in the present application is provided with a support layer 31, which separates the interaction force between the gaseous working fluid in the accommodating space 40 and the liquid working fluid in the capillary structure layer 32, thereby helping to improve Heat dissipation volume and heat dissipation speed; at the same time, after reducing the thickness of the heat dissipation device 100, there is still no interaction between the gaseous working fluid in the accommodating space 40 and the liquid working fluid in the capillary structure layer 32, ensuring the heat dissipation speed and heat dissipation volume, Therefore, the heat dissipation device 100 provided in the present application can also realize the lightness and thinness of the heat dissipation device 100.
  • the thickness of the heat dissipation device 100 is less than or equal to 280 ⁇ m. Further, the thickness of the heat dissipation device 100 is less than or equal to 250 ⁇ m.
  • the present application also provides a method for preparing a heat dissipation device, and the preparation method prepares the heat dissipation device 100 of any one of the foregoing embodiments.
  • FIG. 9 is a schematic flowchart of a method for manufacturing a heat sink 100 according to an embodiment of the application, including the following steps:
  • Operation 101 Provide a capillary core, the capillary core includes a support layer and a capillary structure layer, the support layer includes a plurality of support bars and a plurality of hollow areas formed by staggered arrangement of the plurality of support bars, and the capillary structure layer includes a plurality of spaces arranged on the support For the microstructures on the strip, the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area.
  • the capillary core 30 may be formed by, but not limited to, integral molding.
  • providing the capillary wick 30 includes: providing a substrate, the substrate having a first surface and a second surface that are opposed to each other; providing a first mask, and applying glue, exposing, developing and engraving on the first surface of the substrate.
  • the support layer 31 is formed by etching treatment; a second mask is provided, and the second surface of the substrate is coated, exposed, developed, and etched to form a capillary structure layer 32 to obtain a capillary core 30.
  • the coating is to coat photoresist
  • the photoresist is mainly prepared from different materials such as resin, photosensitizer, solvent, and functional additives in a certain proportion. According to the nature of photoresist, it can be divided into negative glue and positive glue.
  • the photoresist can be, but is not limited to, polycinnamate photoresist, polyhydrocarbon-bisazide photoresist, such as polyvinyl alcohol cinnamate, polyvinyloxyethyl cinnamate, cyclic Chemical rubber, etc.
  • the photoresist is coated on the first surface and the second surface of the substrate, but not limited to spin coating.
  • the photoresist can be evenly distributed to make the photoresist evenly distributed. After the photoresist is coated, it can be dried to make the photoresist into a film. Further, according to the required structure of the supporting layer 31 and the capillary structure layer 32, the first mask and the second mask are designed. Exposure is performed on the first surface and the second surface of the substrate respectively through the first mask and the second mask. Exposure methods can be divided into contact exposure, proximity exposure and projection exposure.
  • the exposure light source may be ultraviolet light, or may be a mercury lamp, a halogen lamp, or an ultraviolet laser (such as a laser with a wavelength of 255 nm or 355 nm, etc.).
  • etching is performed to selectively remove areas not masked by the photoresist.
  • Etching includes dry etching and wet etching. Dry etching may be, but not limited to, plasma etching, sputter etching, and reactive particle etching; wet etching may be, but not limited to, inorganic solution etching and organic solution etching.
  • the exposure precision is 0.5 ⁇ m-5 ⁇ m
  • the etching precision is 0.5 ⁇ m-5 ⁇ m, to form the support layer 31 with the hollow area 311 and the capillary structure layer 32 with the microstructure 320, and the formed support layer 31 and the capillary structure
  • the thickness is controllable and small, which is conducive to reducing the thickness of the heat dissipation device 100.
  • the sum of the etching depths on opposite sides of the substrate is greater than or equal to the thickness of the substrate to ensure complete etching and form the required support layer 31 and capillary structure layer 32.
  • Operation 102 Provide a first cover plate and a second cover plate, cover the first cover plate and the second cover plate to form a closed accommodating space, the capillary core is arranged in the accommodating space, and the capillary structure layer is arranged on the supporting layer and Between the first cover.
  • the first cover plate 10 and the second cover plate 20 can be made by, but not limited to, directly cut metal plates, and the metal plates can meet the requirements of the first cover plate 10 and the second cover plate 20 in the heat sink 100 The thermal conductivity and mechanical properties are sufficient.
  • the thickness of the first cover plate 10 is less than or equal to 200 ⁇ m
  • the thickness of the second cover plate 20 is less than or equal to 200 ⁇ m.
  • the enclosed accommodating space 40 can be formed but not limited to welding or gluing.
  • the welding includes at least one of laser welding, diffusion welding, and solder welding.
  • Solder welding includes low-temperature solder or high-temperature solder, and diffusion welding includes vacuum diffusion welding or gas shielded diffusion welding.
  • the adhesive material can be, but not limited to, double epoxy-based adhesive material, silicon-based adhesive material, etc.
  • Operation 103 Inject a working fluid into the accommodating space, and form a heat dissipation device after sealing.
  • the accommodating space 40 is in a vacuum state, so that the working fluid can easily be vaporized and conduct heat conduction.
  • the vacuum degree in the accommodating space 40 is 10 -3 -10 -1 Pa.
  • a liquid-filled pipe is welded into the accommodating space 40, a working fluid is injected into the accommodating space 40 through the liquid-filled pipe, and the heat sink 100 is formed after vacuuming and sealing.
  • the preparation method of the heat dissipation device 100 provided in the present application is simple, can be completed without using sophisticated equipment, has low preparation cost, and the prepared heat dissipation device 100 has excellent heat dissipation performance, which is beneficial to application.
  • the present application also provides an electronic device, including the heat dissipation device 100 of any of the foregoing embodiments. It is understandable that the electronic device can be, but is not limited to, a mobile phone, a tablet computer, a notebook computer, a watch, MP3, MP4, GPS navigator, a digital camera, etc., and the heat dissipation device 100 can be, but is not limited to, a heat sink.
  • FIG. 10 is a schematic structural diagram of an electronic device provided by an embodiment of this application.
  • the electronic device includes a panel 300 and a housing 400.
  • the panel 300 and the housing 400 form a receiving space, and the receiving space includes a heating element 200 and the above
  • the heat dissipating device 100 wherein the heating element 200 and the heat dissipating device 100 are arranged correspondingly, can realize rapid heat dissipation and improve the heat dissipation efficiency; at the same time, the heat dissipating device 100 can appropriately reduce the thickness and also take into account excellent heat dissipation performance, thereby helping to realize the electronic equipment Thin and light.
  • the heat sink 100 can directly contact the heating element 200, or contact the heating element 200 through the middle plate.
  • the middle plate can be processed so that the heat sink 100 is embedded in the middle plate.
  • FIG. 11 is a schematic cross-sectional view of an electronic device provided by another embodiment of this application.
  • the electronic device includes a heating element 200, a heat dissipation device 100, and a middle plate 500.
  • the heat dissipation device 100 is embedded in the middle plate 500 and attached to the heating element 200. ⁇ Settings. Taking a mobile phone as an example, if the heat dissipation device 100 is thicker, it will affect the mechanical properties of the midplane 500 of the mobile phone, thereby affecting the overall strength of the mobile phone.
  • the heat dissipation device 100 provided in the present application can reduce its thickness without affecting the heat dissipation device 100.
  • the heat dissipation performance of the mobile phone will not affect the overall performance of the mobile phone.
  • the heat dissipation device 100 provided by the present application can reduce its thickness under the premise of maintaining good heat dissipation performance without excessively increasing the weight of the mobile phone, and has good application prospects. .

Abstract

The present application provides a heat dissipation apparatus, comprising a first cover plate, a second cover plate, a capillary core, and a working fluid. The first cover plate and the second cover plate are combined to form a closed accommodating space; the capillary core is provided on the surface of the first cover plate close to the accommodating space; the working fluid is filled in the accommodating space; the capillary core comprises a support layer and a capillary structure layer; the support layer comprises a plurality of support strips, and a plurality of hollow regions formed by arranging the plurality of support strips in a staggered manner; the capillary structure layer is provided between the support layer and the first cover plate; the capillary structure layer comprises a plurality of microstructures arranged on the support strips at intervals; and the size of a gap between adjacent microstructures is smaller than the transverse size of the hollow regions. The hollow regions do not generate a capillary force to the working fluid, thereby preventing a liquid-state working fluid in the capillary core from interacting with a gas-state working fluid in the accommodating space, implementing gas-liquid separation, and improving the heat dissipation performance of the heat dissipation apparatus.

Description

散热装置、散热装置的制备方法及电子设备Heat dissipation device, preparation method of heat dissipation device, and electronic equipment 技术领域Technical field
本申请属于热传导技术领域,具体涉及散热装置、散热装置的制备方法及电子设备。This application belongs to the field of heat conduction technology, and specifically relates to a heat dissipation device, a preparation method of the heat dissipation device, and electronic equipment.
背景技术Background technique
电子设备运作时会产生热量,直接导致电子设备温度急剧升高,因此,需要借助散热装置将热量快速散发。以均热板为例,其利用工作流体的相变进行热量传递完成散热;但在此过程中,蒸汽腔中的气态工作流体与毛细结构中的液态工作流体产生相互作用,对彼此的流动造成干扰,进而降低热量传递速度,影响散热效果,甚至会丧失散热效果。When electronic equipment is in operation, heat is generated, which directly causes the temperature of the electronic equipment to rise sharply. Therefore, a heat sink must be used to quickly dissipate the heat. Take the soaking plate as an example, it uses the phase change of the working fluid to transfer heat to complete the heat dissipation; but in this process, the gaseous working fluid in the vapor chamber interacts with the liquid working fluid in the capillary structure, which causes the flow of each other Interference, thereby reducing the heat transfer speed, affecting the heat dissipation effect, and even losing the heat dissipation effect.
发明内容Summary of the invention
鉴于此,本申请提供一种散热装置及散热装置的制备方法,有利于气液分离,有效避免不同形态间工作流体的相互作用,提高散热装置的散热性能,实现高效散热;同时,还提供包括所述散热装置的电子设备,提高电子设备的散热性能,有利于电子设备的散热,保证电子设备的性能。In view of this, the present application provides a heat dissipation device and a method for preparing the heat dissipation device, which is beneficial to gas-liquid separation, effectively avoids the interaction of working fluids between different forms, improves the heat dissipation performance of the heat dissipation device, and realizes efficient heat dissipation; at the same time, it also provides The electronic equipment of the heat dissipation device improves the heat dissipation performance of the electronic equipment, facilitates the heat dissipation of the electronic equipment, and ensures the performance of the electronic equipment.
第一方面,本申请提供了一种散热装置,包括第一盖板、第二盖板、毛细芯和工作流体,所述第一盖板和所述第二盖板盖合形成密闭的容置空间,所述毛细芯设置在所述第一盖板靠近所述容置空间的表面,所述工作流体填充在所述容置空间内,其中,所述毛细芯包括支撑层和毛细结构层,所述支撑层包括多个支撑条以及由多个所述支撑条交错排布形成的多个镂空区,所述毛细结构层设置在所述支撑层和所述第一盖板之间,所述毛细结构层包括间隔设置在所述支撑条上的多个微结构,相邻所述微结构之间的间隙小于所述镂空区的横向尺寸。In a first aspect, the present application provides a heat dissipation device, including a first cover plate, a second cover plate, a capillary wick, and a working fluid. The first cover plate and the second cover plate cover together to form a sealed container The capillary wick is arranged on the surface of the first cover plate close to the accommodating space, and the working fluid is filled in the accommodating space, wherein the capillary wick includes a support layer and a capillary structure layer, The supporting layer includes a plurality of supporting bars and a plurality of hollow areas formed by staggered arrangement of the supporting bars, the capillary structure layer is disposed between the supporting layer and the first cover plate, and the The capillary structure layer includes a plurality of microstructures arranged on the support bar at intervals, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area.
第二方面,本申请提供了一种散热装置的制备方法,包括:In the second aspect, the present application provides a method for manufacturing a heat sink, including:
提供毛细芯,所述毛细芯包括支撑层和毛细结构层,所述支撑层包括多个支撑条以及由多个所述支撑条交错排布形成的多个镂空区,所述毛细结构层包括多个间隔设置在所述支撑条上的微结构,相邻所述微结构之间的间隙小于所述镂空区的横向尺寸;A capillary core is provided, the capillary core includes a support layer and a capillary structure layer, the support layer includes a plurality of support bars and a plurality of hollow areas formed by staggered arrangement of the plurality of support bars, the capillary structure layer includes a plurality of Two microstructures spaced apart on the support bar, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area;
提供第一盖板和第二盖板,将所述第一盖板和所述第二盖板盖合形成密闭的容置空间,所述毛细芯设置在所述容置空间内,所述毛细结构层设置在所述支撑层和所述第一盖板之间;A first cover plate and a second cover plate are provided, and the first cover plate and the second cover plate are combined to form a closed accommodating space, the capillary core is arranged in the accommodating space, and the capillary The structural layer is arranged between the support layer and the first cover plate;
向所述容置空间内注入工作流体,密封后形成散热装置。A working fluid is injected into the accommodating space, and a heat dissipation device is formed after sealing.
第三方面,本申请提供了一种电子设备,包括发热元件和散热装置,所述散热装置包括第一盖板、第二盖板、毛细芯和工作流体,所述第一盖板和所述第二盖板盖合形成密闭的容置空间,所述毛细芯设置在所述第一盖板靠近所述容置空间的表面,所述工作流体填充在所述容置空间内,其中,所述毛细芯包括支撑层和毛细结构层,所述支撑层包括多个支撑条以及由多个所述支撑条交错排布形成的多个镂空区,所述毛细结构层设置在所述支撑层和所述第一盖板之间,所述毛细结构层包括多个间隔设置在所述支撑条上的微结构, 相邻所述微结构之间的间隙小于所述镂空区的横向尺寸,所述散热装置与所述发热元件对应设置。In a third aspect, the present application provides an electronic device including a heating element and a heat dissipation device. The heat dissipation device includes a first cover plate, a second cover plate, a capillary core, and a working fluid. The first cover plate and the heat dissipation device The second cover plate is covered to form a closed accommodating space, the capillary wick is disposed on the surface of the first cover plate close to the accommodating space, and the working fluid is filled in the accommodating space, wherein The capillary core includes a support layer and a capillary structure layer. The support layer includes a plurality of support bars and a plurality of hollow areas formed by staggered arrangement of the plurality of support bars. The capillary structure layer is arranged on the support layer and Between the first cover plates, the capillary structure layer includes a plurality of microstructures arranged on the support bar at intervals, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area, and The heat dissipation device is arranged corresponding to the heating element.
附图说明Description of the drawings
为了更清楚地说明本申请实施方式中的技术方案,下面将对本申请实施方式中所需要使用的附图进行说明。In order to more clearly describe the technical solutions in the embodiments of the present application, the drawings that need to be used in the embodiments of the present application will be described below.
图1为本申请一实施方式提供的散热装置的剖视图。FIG. 1 is a cross-sectional view of a heat dissipation device provided by an embodiment of the application.
图2为本申请一实施方式提供的支撑层的俯视图。Fig. 2 is a top view of a support layer provided by an embodiment of the application.
图3为本申请一实施方式提供的支撑层的局部放大图。Fig. 3 is a partial enlarged view of a supporting layer provided by an embodiment of the application.
图4为本申请另一实施方式提供的支撑层的局部放大图。Fig. 4 is a partial enlarged view of a supporting layer provided by another embodiment of the application.
图5为本申请一实施方式提供的毛细结构层的示意图。Fig. 5 is a schematic diagram of a capillary structure layer provided by an embodiment of the application.
图6为图5的毛细结构层的局部放大图。Fig. 6 is a partial enlarged view of the capillary structure layer of Fig. 5.
图7为本申请一实施方式提供的毛细芯的俯视图。Fig. 7 is a top view of a capillary wick provided by an embodiment of the application.
图8为图7的毛细芯的局部放大图。Fig. 8 is a partial enlarged view of the capillary wick of Fig. 7.
图9为本申请一实施方式提供的散热装置的制备方法的流程示意图。FIG. 9 is a schematic flowchart of a method for manufacturing a heat sink provided by an embodiment of the application.
图10为本申请一实施方式提供的电子设备的结构示意图。FIG. 10 is a schematic structural diagram of an electronic device provided by an embodiment of this application.
图11为本申请另一实施方式提供的电子设备的截面示意图。FIG. 11 is a schematic cross-sectional view of an electronic device provided by another embodiment of this application.
标号说明:Label description:
第一盖板-10,第二盖板-20,毛细芯-30,支撑层-31,支撑条-310,第一支撑条-3101,第二支撑条-3102,第三支撑条-3103,镂空区-311,毛细结构层-32,微结构-320,第一微结构-321,第二微结构-322,边框-33,容置空间-40,支撑结构-50,散热装置-100,发热元件-200,面板-300,壳体-400,中板-500。The first cover plate-10, the second cover plate-20, the capillary core-30, the supporting layer-31, the supporting bar-310, the first supporting bar-3101, the second supporting bar-3102, the third supporting bar-3103, Hollow area-311, capillary structure layer-32, microstructure-320, first microstructure-321, second microstructure-322, frame-33, accommodating space-40, support structure-50, heat dissipation device-100, Heating element-200, panel-300, shell-400, middle plate-500.
具体实施方式Detailed ways
以下是本申请的优选实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本申请原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也视为本申请的保护范围。The following are the preferred embodiments of this application. It should be noted that for those of ordinary skill in the art, without departing from the principles of this application, several improvements and modifications can be made, and these improvements and modifications are also regarded as the original The scope of protection applied for.
下文的公开提供了许多不同的实施方式或例子用来实现本申请的不同结构。为了简化本申请的公开,下文中对特定例子的部件和设置进行描述。当然,它们仅仅为示例,并且目的不在于限制本申请。此外,本申请可以在不同例子中重复参考数字和/或参考字母,这种重复是为了简化和清楚的目的,其本身不指示所讨论各种实施方式和/或设置之间的关系。此外,本申请提供了的各种特定的工艺和材料的例子,但是本领域普通技术人员可以意识到其他工艺的应用和/或其他材料的使用。The following disclosure provides many different embodiments or examples for realizing different structures of the present application. In order to simplify the disclosure of the present application, the components and settings of specific examples are described below. Of course, they are only examples, and are not intended to limit the application. In addition, the present application may repeat reference numerals and/or reference letters in different examples, and this repetition is for the purpose of simplification and clarity, and does not indicate the relationship between the various embodiments and/or settings discussed. In addition, this application provides examples of various specific processes and materials, but those of ordinary skill in the art may be aware of the application of other processes and/or the use of other materials.
本申请实施例提供了一种散热装置,包括第一盖板、第二盖板、毛细芯和工作流体,所述第一盖板和所述第二盖板盖合形成密闭的容置空间,所述毛细芯设置在所述第一盖板靠近所述容置空间的表面,所述工作流体填充在所述容置空间内,其中,所述毛细芯包括支撑层和毛细结构层,所述支撑层包括多个支撑条以及由多个所述支撑条交错排布形成的 多个镂空区,所述毛细结构层设置在所述支撑层和所述第一盖板之间,所述毛细结构层包括间隔设置在所述支撑条上的多个微结构,相邻所述微结构之间的间隙小于所述镂空区的横向尺寸。The embodiment of the present application provides a heat dissipation device, which includes a first cover plate, a second cover plate, a capillary core, and a working fluid. The first cover plate and the second cover plate cover together to form a closed accommodating space, The capillary wick is arranged on the surface of the first cover plate close to the accommodating space, and the working fluid is filled in the accommodating space. The capillary wick includes a support layer and a capillary structure layer. The support layer includes a plurality of support bars and a plurality of hollow areas formed by staggered arrangement of the plurality of support bars, the capillary structure layer is arranged between the support layer and the first cover plate, and the capillary structure The layer includes a plurality of microstructures arranged on the support bar at intervals, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area.
其中,多个所述微结构在所述毛细结构层上呈阵列排布。Wherein, a plurality of the microstructures are arranged in an array on the capillary structure layer.
其中,所述微结构包括第一微结构和第二微结构,所述第一微结构和所述第二微结构的长度延伸方向交错,所述第一微结构和所述第二微结构间隔设置。Wherein, the microstructure includes a first microstructure and a second microstructure, the length extension directions of the first microstructure and the second microstructure are staggered, and the first microstructure and the second microstructure are spaced apart from each other. set up.
其中,多个所述支撑条包括多个平行排布的第一支撑条和多个平行排布的第二支撑条,多个所述第一支撑条和多个所述第二支撑条交错排布形成所述镂空区。Wherein, the plurality of support bars includes a plurality of first support bars arranged in parallel and a plurality of second support bars arranged in parallel, and a plurality of the first support bars and a plurality of the second support bars are arranged in a staggered manner. The cloth forms the hollow area.
其中,所述第一支撑条和所述第二支撑条相交形成支撑节点,所述微结构设置在所述支撑节点上。Wherein, the first supporting bar and the second supporting bar intersect to form a supporting node, and the microstructure is arranged on the supporting node.
其中,所述微结构的横向尺寸为5μm-60μm,厚度为5μm-40μm,相邻所述微结构之间的间隙为5μm-50μm。Wherein, the lateral size of the microstructure is 5 μm-60 μm, the thickness is 5 μm-40 μm, and the gap between adjacent microstructures is 5 μm-50 μm.
其中,所述支撑层的厚度为5μm-40μm,所述镂空区的横向尺寸为40μm-150μm。Wherein, the thickness of the support layer is 5 μm-40 μm, and the lateral dimension of the hollow area is 40 μm-150 μm.
其中,所述毛细芯的材质包括铜、钛、镍和锡中的至少一种或不锈钢。Wherein, the material of the capillary core includes at least one of copper, titanium, nickel and tin or stainless steel.
其中,所述毛细芯为一体成型结构。Wherein, the capillary core is an integrally formed structure.
其中,多个所述镂空区的开口面积相同。Wherein, the opening areas of the plurality of hollow areas are the same.
其中,所述支撑层与所述第二盖板之间的间距为20μm-120μm。Wherein, the distance between the support layer and the second cover plate is 20 μm-120 μm.
其中,所述微结构的形状包括正方体、长方体、圆柱体和不规则立体结构中的至少一种。Wherein, the shape of the microstructure includes at least one of a cube, a rectangular parallelepiped, a cylinder, and an irregular three-dimensional structure.
其中,所述毛细芯还包括边框,所述边框围设所述支撑层和所述毛细结构层的外围。Wherein, the capillary core further includes a frame, and the frame surrounds the periphery of the support layer and the capillary structure layer.
其中,所述散热装置还包括支撑结构,所述支撑结构设置在所述容置空间内,且与所述第一盖板和所述第二盖板抵接。Wherein, the heat dissipation device further includes a supporting structure, the supporting structure is arranged in the accommodating space and abuts against the first cover plate and the second cover plate.
其中,所述支撑结构与所述支撑层抵接。Wherein, the supporting structure abuts against the supporting layer.
本申请实施例还提供了一种散热装置的制备方法,包括:The embodiment of the present application also provides a method for manufacturing a heat dissipation device, including:
提供毛细芯,所述毛细芯包括支撑层和毛细结构层,所述支撑层包括多个支撑条以及由多个所述支撑条交错排布形成的多个镂空区,所述毛细结构层包括多个间隔设置在所述支撑条上的微结构,相邻所述微结构之间的间隙小于所述镂空区的横向尺寸;A capillary core is provided, the capillary core includes a support layer and a capillary structure layer, the support layer includes a plurality of support bars and a plurality of hollow areas formed by staggered arrangement of the plurality of support bars, the capillary structure layer includes a plurality of Two microstructures spaced apart on the support bar, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area;
提供第一盖板和第二盖板,将所述第一盖板和所述第二盖板盖合形成密闭的容置空间,所述毛细芯设置在所述容置空间内,所述毛细结构层设置在所述支撑层和所述第一盖板之间;A first cover plate and a second cover plate are provided, and the first cover plate and the second cover plate are combined to form a closed accommodating space, the capillary core is arranged in the accommodating space, and the capillary The structural layer is arranged between the support layer and the first cover plate;
向所述容置空间内注入工作流体,密封后形成散热装置。A working fluid is injected into the accommodating space, and a heat dissipation device is formed after sealing.
其中,所述提供毛细芯包括:Wherein, said providing capillary wick includes:
提供基板,所述基板具有相对设置的第一表面和第二表面;Providing a substrate, the substrate having a first surface and a second surface that are opposed to each other;
提供第一掩膜板,在所述基板的所述第一表面进行涂胶、曝光、显影和刻蚀处理,形成所述支撑层;Providing a first mask, and performing glue coating, exposure, development and etching treatments on the first surface of the substrate to form the support layer;
提供第二掩膜板,在所述基板的所述第二表面进行涂胶、曝光、显影和刻蚀处理,形 成所述毛细结构层,制得所述毛细芯。A second mask is provided, and the second surface of the substrate is coated with glue, exposed, developed and etched to form the capillary structure layer to obtain the capillary core.
其中,所述曝光精度为0.5μm-5μm,刻蚀精度为0.5μm-5μm。Wherein, the exposure accuracy is 0.5 μm-5 μm, and the etching accuracy is 0.5 μm-5 μm.
本申请实施例还提供了一种电子设备,包括发热元件和散热装置,所述散热装置包括第一盖板、第二盖板、毛细芯和工作流体,所述第一盖板和所述第二盖板盖合形成密闭的容置空间,所述毛细芯设置在所述第一盖板靠近所述容置空间的表面,所述工作流体填充在所述容置空间内,其中,所述毛细芯包括支撑层和毛细结构层,所述支撑层包括多个支撑条以及由多个所述支撑条交错排布形成的多个镂空区,所述毛细结构层设置在所述支撑层和所述第一盖板之间,所述毛细结构层包括多个间隔设置在所述支撑条上的微结构,相邻所述微结构之间的间隙小于所述镂空区的横向尺寸,所述散热装置与所述发热元件对应设置。The embodiment of the present application also provides an electronic device, including a heating element and a heat dissipation device. The heat dissipation device includes a first cover plate, a second cover plate, a capillary core, and a working fluid. The first cover plate and the second cover plate The two cover plates are combined to form a closed accommodating space, the capillary wick is arranged on the surface of the first cover plate close to the accommodating space, and the working fluid is filled in the accommodating space, wherein the The capillary core includes a support layer and a capillary structure layer. The support layer includes a plurality of support bars and a plurality of hollow areas formed by staggered arrangement of the plurality of support bars. The capillary structure layer is disposed on the support layer and the capillary structure layer. Between the first cover plates, the capillary structure layer includes a plurality of microstructures spaced apart on the support bar, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area, and the heat dissipation The device is arranged corresponding to the heating element.
其中,所述电子设备还包括中板,所述散热装置嵌入所述中板中,并与所述发热元件贴合设置。Wherein, the electronic equipment further includes a middle plate, and the heat dissipation device is embedded in the middle plate and is arranged in close contact with the heating element.
请参考图1,为本申请一实施方式提供的散热装置100的剖视图,散热装置100包括第一盖板10、第二盖板20、毛细芯30和工作流体,第一盖板10和第二盖板20盖合形成密闭的容置空间40,毛细芯30设置在第一盖板10靠近容置空间40的表面,工作流体(未在图中示出)填充在容置空间40内,其中,毛细芯30包括支撑层31和毛细结构层32,支撑层31包括多个支撑条310以及由多个支撑条310交错排布形成的多个镂空区311,毛细结构层32设置在支撑层31和第一盖板10之间,毛细结构层32包括间隔设置在支撑条310上的多个微结构320,相邻微结构320之间的间隙小于镂空区311的横向尺寸。Please refer to FIG. 1, which is a cross-sectional view of a heat dissipation device 100 according to an embodiment of the application. The heat dissipation device 100 includes a first cover plate 10, a second cover plate 20, a capillary core 30 and a working fluid. The first cover plate 10 and the second cover plate The cover plate 20 is covered to form a closed accommodating space 40, the capillary wick 30 is arranged on the surface of the first cover plate 10 close to the accommodating space 40, and a working fluid (not shown in the figure) is filled in the accommodating space 40, wherein The capillary core 30 includes a support layer 31 and a capillary structure layer 32. The support layer 31 includes a plurality of support bars 310 and a plurality of hollow areas 311 formed by staggered arrangement of the plurality of support bars 310. The capillary structure layer 32 is disposed on the support layer 31. Between the capillary structure layer 32 and the first cover plate 10, the capillary structure layer 32 includes a plurality of microstructures 320 arranged on the support bar 310 at intervals, and the gap between adjacent microstructures 320 is smaller than the lateral dimension of the hollow area 311.
在本申请中,散热装置100中第一盖板10与热源接触时,吸收热量,并传递至毛细芯30中的液态工作流体,液态工作流体吸收热量后汽化形成气态工作流体,通过散热装置100的容置空间40,也可以称之为蒸汽腔,将热量从第一盖板10传递至第二盖板20,经由第二盖板20传递至外界。在热传递过程中,气态工作流体冷凝变为液态工作流体,毛细芯30产生的毛细作用力将其引流至第一盖板10,循环进行上述散热过程,进而完成散热。本申请提供的散热装置100是通过工作流体的相变进行热量的传递,散热装置100可以但不限于为均热板。In the present application, when the first cover plate 10 of the heat sink 100 is in contact with the heat source, it absorbs heat and is transferred to the liquid working fluid in the capillary core 30. The liquid working fluid absorbs the heat and vaporizes to form a gaseous working fluid, which passes through the heat sink 100 The accommodating space 40, which can also be referred to as a steam chamber, transfers heat from the first cover plate 10 to the second cover plate 20, and transfers the heat to the outside through the second cover plate 20. During the heat transfer process, the gaseous working fluid is condensed into a liquid working fluid, and the capillary force generated by the capillary core 30 drains it to the first cover plate 10, and the heat dissipation process described above is cyclically performed to complete the heat dissipation. The heat dissipation device 100 provided in the present application transfers heat through the phase change of the working fluid, and the heat dissipation device 100 may be, but is not limited to, a soaking plate.
在相关技术中,毛细芯仅具有毛细结构层,毛细结构层中的液态工作流体受热蒸发后,形成气态工作流体并进入容置空间中;由于毛细结构层的毛细作用力,以及容置空间中的气态工作流体与毛细结构层中液态工作流体之间的相互作用力,使得气态工作流体在扩散时受到力的作用,进而无法充满容置空间,影响散热体积和散热速度,使整个散热装置的散热效果降低甚至会丧失散热性能;更何况,在降低散热装置厚度后,相互作用力更加明显,气态工作流体在扩散时受到的阻力更大,进一步降低了散热体积和散热速度。在本申请中,通过设置具有支撑层31和毛细结构层32的毛细芯30,其中,毛细结构层32中相邻微结构320之间的间隙小于支撑层31中镂空区311的横向尺寸,使得毛细结构层32产生毛细作用力,而支撑层31不产生毛细作用力。因此,在散热过程中,毛细结构层32中的液态工作流体受热变为气态工作流体时,通过支撑层31的镂空区311进入容置空间40 中,进而向第二盖板20的方向流动,实现热量的传递;在此过程中,支撑层31的镂空区311对气态工作流体不产生毛细作用力,不会影响气态工作流体的流动,使得气态工作流体可以快速进入容置空间40内并进行大面积扩散,增加了散热体积和散热速度。也就是说,本申请提供的散热装置100通过设置了支撑层31,间隔了容置空间40中的气态工作流体与毛细结构层32中液态工作流体之间的相互作用力,进而有利于提高散热体积和散热速度;同时,在降低散热装置100厚度后,容置空间40中的气态工作流体与毛细结构层32中液态工作流体之间还是不会产生相互作用,保证散热速度和散热体积,因此,本申请提供的散热装置100还可以实现轻薄化,有利于其应用。In the related art, the capillary wick only has a capillary structure layer. After the liquid working fluid in the capillary structure layer is heated and evaporated, it forms a gaseous working fluid and enters the accommodating space; due to the capillary force of the capillary structure layer, and the accommodating space The interaction force between the gaseous working fluid and the liquid working fluid in the capillary structure layer causes the gaseous working fluid to be affected by the force when it diffuses, and thus cannot fill the containing space, which affects the heat dissipation volume and heat dissipation speed, and makes the entire heat dissipation device Reduced heat dissipation effect may even lose heat dissipation performance; what's more, after reducing the thickness of the heat dissipation device, the interaction force becomes more obvious, and the gaseous working fluid suffers greater resistance during diffusion, which further reduces the heat dissipation volume and heat dissipation speed. In this application, the capillary core 30 is provided with a support layer 31 and a capillary structure layer 32, wherein the gap between adjacent microstructures 320 in the capillary structure layer 32 is smaller than the lateral size of the hollow area 311 in the support layer 31, so that The capillary structure layer 32 generates capillary force, while the support layer 31 does not generate capillary force. Therefore, during the heat dissipation process, when the liquid working fluid in the capillary structure layer 32 is heated to become a gaseous working fluid, it enters the accommodating space 40 through the hollow area 311 of the support layer 31, and then flows in the direction of the second cover plate 20, Realize the heat transfer; in this process, the hollow area 311 of the support layer 31 does not produce capillary force on the gaseous working fluid, and will not affect the flow of the gaseous working fluid, so that the gaseous working fluid can quickly enter the accommodating space 40 and proceed. Large area diffusion increases the heat dissipation volume and heat dissipation speed. That is to say, the heat dissipation device 100 provided by the present application is provided with the supporting layer 31 to separate the interaction force between the gaseous working fluid in the accommodating space 40 and the liquid working fluid in the capillary structure layer 32, thereby helping to improve heat dissipation. At the same time, after reducing the thickness of the heat sink 100, the gaseous working fluid in the accommodating space 40 and the liquid working fluid in the capillary structure layer 32 will not interact with each other, ensuring the heat dissipation speed and heat dissipation volume, so , The heat dissipation device 100 provided in the present application can also be light and thin, which is beneficial to its application.
在本申请中,支撑层31对毛细结构层32起到支撑作用,同时镂空区311可以作为散热循环中工作流体流动的通道。支撑层31包括多个支撑条310以及由多个支撑条310交错排布形成的多个镂空区311,也就是说,多个支撑条310交错排布形成了具有网格结构的支撑层31。请参阅图2,为本申请一实施方式提供的支撑层31的俯视图,其中支撑层31包括多个支撑条310以及由多个支撑条310交错排布形成的多个镂空区311。In the present application, the support layer 31 supports the capillary structure layer 32, and the hollow area 311 can be used as a channel for the working fluid to flow in the heat dissipation cycle. The supporting layer 31 includes a plurality of supporting bars 310 and a plurality of hollow areas 311 formed by the plurality of supporting bars 310 staggered, that is, the plurality of supporting bars 310 are staggered to form the supporting layer 31 with a grid structure. Please refer to FIG. 2, which is a top view of the support layer 31 provided by an embodiment of the present application. The support layer 31 includes a plurality of support bars 310 and a plurality of hollow areas 311 formed by staggered arrangement of the plurality of support bars 310.
请参阅图3,为本申请一实施方式提供的支撑层的局部放大图,其中多个支撑条310包括多个平行排布的第一支撑条3101和多个平行排布的第二支撑条3102,多个第一支撑条3101和多个第二支撑条3102交错排布形成多个镂空区311。请参阅图4,为本申请另一实施方式提供的支撑层的局部放大图,多个支撑条310包括多个平行排布的第一支撑条3101、多个平行排布的第二支撑条3102以及多个平行排布的第三支撑条3103,多个第一支撑条3101、多个第二支撑条3102以及多个第三支撑条3103相互交错排布形成多个镂空区311。在本申请另一实施方式中,多个支撑条310可以具有不同的延伸方向和排布方式,呈现不规则排布,交错形成镂空区311。在本申请中,支撑条310的长度和宽度可以根据散热装置100的需要进行选择,例如,支撑条310的长度可以但不限于为50mm-1000mm,宽度可以但不限于为20μm-200μm。在本申请中,支撑层31中包括了多个支撑条310,支撑条310的数量可以根据散热装置100的性能进行选择,例如支撑层31中支撑条310的数量可以但不限于大于50个、100个、150个、200个等。Please refer to FIG. 3, which is a partial enlarged view of the support layer provided by an embodiment of the application, wherein the plurality of support bars 310 includes a plurality of first support bars 3101 arranged in parallel and a plurality of second support bars 3102 arranged in parallel , The plurality of first supporting bars 3101 and the plurality of second supporting bars 3102 are arranged in a staggered manner to form a plurality of hollow areas 311. Please refer to FIG. 4, which is a partial enlarged view of the support layer provided by another embodiment of this application. The plurality of support bars 310 includes a plurality of first support bars 3101 arranged in parallel, and a plurality of second support bars 3102 arranged in parallel. And a plurality of third support bars 3103 arranged in parallel, a plurality of first support bars 3101, a plurality of second support bars 3102, and a plurality of third support bars 3103 are alternately arranged to form a plurality of hollow areas 311. In another embodiment of the present application, the plurality of support strips 310 may have different extension directions and arrangements, and are arranged irregularly, forming a hollow area 311 staggered. In this application, the length and width of the support bar 310 can be selected according to the needs of the heat sink 100. For example, the length of the support bar 310 can be but not limited to 50mm-1000mm, and the width can be but not limited to 20μm-200μm. In the present application, the support layer 31 includes a plurality of support bars 310, and the number of the support bars 310 can be selected according to the performance of the heat dissipation device 100. For example, the number of the support bars 310 in the support layer 31 can be, but is not limited to, more than 50, 100, 150, 200, etc.
在本申请中,多个支撑条310交错排布形成了多个镂空区311,镂空区311的横截面可以但不限于为正方形、长方形、菱形、梯形、不规则形状等。在本申请一实施方式中,多个镂空区311在支撑层31上呈规则排布,使得散热过程中气态工作流体通过镂空区311的速度一致,进而保证散热效果稳定。在本申请另一实施方式,多个镂空区311的开口面积相同,使得散热过程中气态工作流体通过镂空区311的量相同,进而保证散热效果稳定。在本申请又一实施方式中,第一盖板10包括了第一区域以及与第一区域相邻接的第二区域,其中在应用过程中,第一区域可以与发热元件对应设置,此时,支撑层31中对应第一区域的镂空区311的开口面积大于对应第二区域的镂空区311的开口面积,进而使得气态工作流体可以大量且快速的通过镂空区311进入容置空间40中,从而向第二盖板20传递热量,提高散热装置100的散热速度。可以理解的,镂空区311具有长度、宽度和深度,镂空区311的横向尺寸是指镂空区311在长度方向上的尺寸。在本申请一实施方式,镂空区311 的横向尺寸为40μm-150μm、45μm-150μm、50μm-140μm、50μm-120μm或65μm-110μm,以使得镂空区311对工作流体不产生毛细作用,进而不会影响工作流体的流动。具体的,镂空区311的横向尺寸可以但不限于为40μm、55μm、70μm、85μm、95μm、110μm、125μm或145μm。在本申请中,镂空区311的数量可以根据实际需要进行选择,例如支撑层31中镂空区311的数量大于1000个、1800个、2500个、5000个等。In the present application, a plurality of support bars 310 are staggered to form a plurality of hollow areas 311. The cross-section of the hollow areas 311 can be, but not limited to, a square, a rectangle, a diamond, a trapezoid, an irregular shape, and the like. In an embodiment of the present application, the plurality of hollow areas 311 are regularly arranged on the support layer 31, so that the gaseous working fluid passes through the hollow areas 311 at the same speed during the heat dissipation process, thereby ensuring a stable heat dissipation effect. In another embodiment of the present application, the opening areas of the plurality of hollow areas 311 are the same, so that the amount of gaseous working fluid passing through the hollow areas 311 during the heat dissipation process is the same, thereby ensuring a stable heat dissipation effect. In another embodiment of the present application, the first cover plate 10 includes a first area and a second area adjacent to the first area. During the application process, the first area can be set corresponding to the heating element. The opening area of the hollow area 311 corresponding to the first area in the support layer 31 is larger than the opening area of the hollow area 311 corresponding to the second area, so that the gaseous working fluid can enter the accommodating space 40 through the hollow area 311 in a large amount and quickly. Thereby, heat is transferred to the second cover plate 20, and the heat dissipation speed of the heat dissipation device 100 is improved. It can be understood that the hollow area 311 has a length, a width, and a depth, and the lateral size of the hollow area 311 refers to the size of the hollow area 311 in the length direction. In one embodiment of the present application, the lateral dimension of the hollow area 311 is 40 μm-150 μm, 45 μm-150 μm, 50 μm-140 μm, 50 μm-120 μm, or 65 μm-110 μm, so that the hollow area 311 does not have a capillary effect on the working fluid, and thus does not Affect the flow of working fluid. Specifically, the lateral size of the hollow area 311 may be, but is not limited to, 40 μm, 55 μm, 70 μm, 85 μm, 95 μm, 110 μm, 125 μm, or 145 μm. In this application, the number of hollow areas 311 can be selected according to actual needs. For example, the number of hollow areas 311 in the support layer 31 is greater than 1000, 1800, 2500, 5000, etc.
在本申请中,支撑层31的材质可以但不限于为铜、钛、镍和锡中的至少一种或不锈钢,使得支撑层31可以进行导热,同时又有利于工作流体对热量进行传递。在一实施例中,支撑层31的材质为铜、铜钛合金或不锈钢,使得支撑层31具有更好力学性能。在本申请一实施方式中,支撑层31的厚度为5μm-40μm,进一步减小了不同形态的工作流体间的相互作用;厚度过小,毛细结构层32与容置空间40中不同形态的工作流体之间较容易产生相互作用,影响散热效果;厚度过大,则会增加散热装置100的厚度和重量,不利于散热装置100的轻薄化。在本申请中,支撑层31的横向尺寸可以根据散热装置100的大小以及实际需要进行选择;同时支撑层31的横截面可以但不限于为正方形、长方形、菱形、圆形、椭圆形、不规则形状等。在本申请实施方式中,支撑层31与第二盖板20之间具有间距,使得气态工作流体在容置空间40中具有更大的扩散体积,提高散热效果。进一步的,支撑层31与第二盖板20之间的间距为20μm-120μm。更进一步的,支撑层31与第二盖板20之间的间距为40μm-120μm、50μm-115μm或60μm-100μm,进一步增加气态工作流体在散热装置100内部的散热体积。In the present application, the material of the support layer 31 can be, but is not limited to, at least one of copper, titanium, nickel, and tin or stainless steel, so that the support layer 31 can conduct heat and at the same time facilitate the working fluid to transfer heat. In one embodiment, the material of the support layer 31 is copper, copper-titanium alloy or stainless steel, so that the support layer 31 has better mechanical properties. In one embodiment of the present application, the thickness of the support layer 31 is 5 μm-40 μm, which further reduces the interaction between working fluids of different forms; if the thickness is too small, the capillary structure layer 32 and the accommodating space 40 work in different forms The fluids are more likely to interact with each other and affect the heat dissipation effect; if the thickness is too large, the thickness and weight of the heat dissipation device 100 will increase, which is not conducive to the lightness and thinness of the heat dissipation device 100. In the present application, the lateral size of the support layer 31 can be selected according to the size of the heat dissipation device 100 and actual needs; at the same time, the cross section of the support layer 31 can be, but is not limited to, square, rectangular, diamond, round, oval, or irregular. Shape etc. In the embodiment of the present application, there is a distance between the support layer 31 and the second cover plate 20, so that the gaseous working fluid has a larger diffusion volume in the accommodating space 40, and the heat dissipation effect is improved. Further, the distance between the support layer 31 and the second cover plate 20 is 20 μm-120 μm. Furthermore, the distance between the support layer 31 and the second cover plate 20 is 40 μm-120 μm, 50 μm-115 μm, or 60 μm-100 μm, which further increases the heat dissipation volume of the gaseous working fluid inside the heat dissipation device 100.
在本申请中,毛细结构层32设置在支撑层31和第一盖板10之间,毛细结构层32包括间隔设置在支撑条310上的多个微结构320,相邻微结构320之间的间隙小于镂空区311的横向尺寸。请参阅图5,为本申请一实施方式提供的毛细结构层32的示意图,毛细结构层32包括了多个微结构320,相邻微结构320之间存在间隙,以产生毛细作用力。在本申请中,微结构320的横向尺寸为5μm-60μm,厚度为5μm-40μm,以使得在一定面积内分布较多的微结构320,进而产生更大的毛细作用力。进一步的,微结构320的横向尺寸为10μm-55μm,厚度为10μm-35μm。更进一步的,微结构320的横向尺寸为10μm-45μm,厚度为10μm-30μm。在本申请一实施方式中,相邻微结构320之间的间隙为5μm-50μm,使得毛细结构层32产生较大的毛细作用力,以使得液态工作流体可以快速回流至毛细结构层32中,吸收第一盖板10的热量,进行下一轮的散热循环。进一步的,相邻微结构320之间的间隙为8μm-45μm。更进一步的,相邻微结构320之间的间隙为10μm-40μm。在本申请中,微结构320的形状可以但不限于为正方体、长方体、圆柱体、不规则立体结构等。在一实施方式中,微结构320的形状为圆柱体、正方体或长方体,以使得毛细结构层32中各处的毛细作用力更加均匀。在本申请一实施方式中,多个微结构320在毛细结构层32上呈阵列排布,有利于使得毛细结构层32中各处的毛细作用力更加均匀,增加散热装置的各处的散热均匀和稳定。请参阅图6,为图5的毛细结构层32中虚线部分的放大图,微结构320包括第一微结构321和第二微结构322,第一微结构321和第二微结构322的长度延伸方向交错,第一微结构321和第二微结构322间隔设置,以使得相邻的第一微结构321和 第二微结构322之间产生间隙,进而产生毛细作用力。在一实施方式中,第一微结构321和第二微结构322的形状相同,第一微结构321和第二微结构322间隔设置在支撑层31上,使得毛细结构层32中毛细作用力均匀,进而提高散热的稳定性。In the present application, the capillary structure layer 32 is provided between the support layer 31 and the first cover plate 10. The capillary structure layer 32 includes a plurality of microstructures 320 arranged on the support bar 310 at intervals, and the gap between adjacent microstructures 320 The gap is smaller than the lateral dimension of the hollow area 311. Please refer to FIG. 5, which is a schematic diagram of the capillary structure layer 32 according to an embodiment of the present application. The capillary structure layer 32 includes a plurality of microstructures 320, and there are gaps between adjacent microstructures 320 to generate capillary force. In the present application, the lateral size of the microstructure 320 is 5 μm-60 μm, and the thickness is 5 μm-40 μm, so that more microstructures 320 are distributed in a certain area, thereby generating greater capillary force. Further, the lateral dimension of the microstructure 320 is 10 μm-55 μm, and the thickness is 10 μm-35 μm. Furthermore, the lateral dimension of the microstructure 320 is 10 μm-45 μm, and the thickness is 10 μm-30 μm. In an embodiment of the present application, the gap between adjacent microstructures 320 is 5 μm-50 μm, so that the capillary structure layer 32 generates a large capillary force, so that the liquid working fluid can quickly flow back into the capillary structure layer 32. The heat of the first cover plate 10 is absorbed, and the next heat dissipation cycle is performed. Further, the gap between adjacent microstructures 320 is 8 μm-45 μm. Furthermore, the gap between adjacent microstructures 320 is 10 μm-40 μm. In this application, the shape of the microstructure 320 can be, but is not limited to, a cube, a cuboid, a cylinder, an irregular three-dimensional structure, and the like. In one embodiment, the shape of the microstructure 320 is a cylinder, a cube, or a rectangular parallelepiped, so that the capillary force everywhere in the capillary structure layer 32 is more uniform. In one embodiment of the present application, a plurality of microstructures 320 are arranged in an array on the capillary structure layer 32, which is beneficial to make the capillary force in the capillary structure layer 32 more uniform, and increase the uniform heat dissipation of the heat dissipation device. And stability. Please refer to FIG. 6, which is an enlarged view of the dotted line part of the capillary structure layer 32 of FIG. 5. The microstructure 320 includes a first microstructure 321 and a second microstructure 322. The directions are staggered, and the first microstructure 321 and the second microstructure 322 are arranged at intervals, so that a gap is generated between the adjacent first microstructure 321 and the second microstructure 322, thereby generating capillary force. In one embodiment, the first microstructure 321 and the second microstructure 322 have the same shape, and the first microstructure 321 and the second microstructure 322 are arranged on the support layer 31 at intervals, so that the capillary force in the capillary structure layer 32 is uniform , Thereby improving the stability of heat dissipation.
在本申请中,毛细结构层32的材质可以但不限于为铜、钛、镍和锡中的至少一种或不锈钢,使得毛细结构层32位于支撑层31与第一盖板10之间时,具有良好的力学性能,不易发生形变,又可以在间隙中存储工作流体。在本申请一实施方式中,第一盖板10包括了第一区域以及与第一区域相邻接的第二区域,其中在应用过程中,第一区域可以与发热元件对应设置,此时,毛细结构层32对应第一区域的微结构的厚度大于对应第二区域的微结构的厚度,进而使得对应于第一区域的毛细结构层32中产生更大的毛细作用力,容纳更多的工作流体,进而提高散热装置100的散热性能。In the present application, the material of the capillary structure layer 32 can be, but is not limited to, at least one of copper, titanium, nickel, and tin or stainless steel, so that when the capillary structure layer 32 is located between the support layer 31 and the first cover plate 10, It has good mechanical properties, is not easily deformed, and can store working fluid in the gap. In an embodiment of the present application, the first cover plate 10 includes a first area and a second area adjacent to the first area. During the application process, the first area can be set corresponding to the heating element. At this time, The thickness of the microstructure corresponding to the first region of the capillary structure layer 32 is greater than the thickness of the microstructure corresponding to the second region, so that a greater capillary force is generated in the capillary structure layer 32 corresponding to the first region to accommodate more work Fluid, thereby improving the heat dissipation performance of the heat dissipation device 100.
请参阅图7,为本申请一实施方式提供的毛细芯30的俯视图,毛细芯30包括支撑层31和毛细结构层32。请参阅图8,为图7的毛细芯30中虚线部分的放大图,毛细结构层32中的微结构320设置在支撑层31的支撑条310上。在本申请中,支撑层31对毛细结构层32起到支撑和固定的作用。在一实施方式中,多个支撑条310相互交错形成镂空区311,支撑条310相交的位置为支撑节点,微结构320设置在支撑节点上。在另一实施方式中,多个支撑条310包括多个平行排布的第一支撑条3111和多个平行排布的第二支撑条3112,第一支撑条3111和第二支撑条3112相交形成支撑节点,微结构320设置在支撑节点上。在本申请中,毛细芯30的材质可以但不限于为铜、钛、镍和锡中的至少一种或不锈钢,以提高毛细结构的导热性能和力学性能。在本申请一实施方式中,请参阅图7,毛细芯30还可以包括边框33,边框33围设支撑层31和毛细结构层32的外围,更好地使工作流体在毛细芯中流动,参与散热循环。Please refer to FIG. 7, which is a top view of the capillary core 30 according to an embodiment of the present application. The capillary core 30 includes a support layer 31 and a capillary structure layer 32. Please refer to FIG. 8, which is an enlarged view of the dotted line part of the capillary core 30 in FIG. In the present application, the support layer 31 supports and fixes the capillary structure layer 32. In one embodiment, a plurality of supporting bars 310 are staggered to form a hollow area 311, the position where the supporting bars 310 intersect is a supporting node, and the microstructure 320 is disposed on the supporting node. In another embodiment, the plurality of support bars 310 includes a plurality of first support bars 3111 arranged in parallel and a plurality of second support bars 3112 arranged in parallel, and the first support bars 3111 and the second support bars 3112 intersect to form The supporting node, the microstructure 320 is arranged on the supporting node. In the present application, the material of the capillary core 30 can be, but is not limited to, at least one of copper, titanium, nickel, and tin or stainless steel to improve the thermal conductivity and mechanical properties of the capillary structure. In an embodiment of the present application, please refer to FIG. 7, the capillary core 30 may also include a frame 33 that surrounds the periphery of the support layer 31 and the capillary structure layer 32 to better enable the working fluid to flow in the capillary core and participate Cooling cycle.
在本申请中,毛细芯30可以但不限于一体成型制成。在本申请一实施方式中,可以通过提供基板,以及预先制得与所需支撑层31以及毛细结构层32相对应的掩模板,在基板的相对的两个表面进行涂胶、曝光、显影和刻蚀,制得毛细芯30。进一步的,基板相对两侧的刻蚀深度之和大于或等于基板的厚度,使得刻蚀完全。进一步的,曝光精度为0.5μm-5μm,刻蚀精度为0.5μm-5μm,以形成具有镂空区311的支撑层31以及具有微结构320的毛细结构层32,并且形成的支撑层31以及毛细结构的厚度可控且较小,有利于散热装置100厚度的降低。相关技术中,通过编制铜网的方式制备毛细结构层,因受限于铜网的直径,进而无法减小毛细结构层的厚度,从而无法进一步降低散热装置的厚度,并且也限制了气态工作流体的散热体积,散热时阻力较大,散热速度慢。而采用本申请的方式制得的毛细结构层32,其厚度可控,可以极大降低毛细结构层32的厚度,有利于降低散热装置100的厚度;同时,由于支撑层31的存在,避免了不同形态件工作流体的相互干扰,使得工作流体在散热过程中受到的阻力减小,并且支撑层31的厚度可以进一步降低;此外,即使进一步降低散热装置100的厚度,仍然不会对工作流体的散热速度造成影响,也就是说不会影响散热装置100的散热性能,更加可靠。In the present application, the capillary core 30 can be formed by, but not limited to, integral molding. In one embodiment of the present application, a substrate can be provided, and a mask plate corresponding to the required support layer 31 and capillary structure layer 32 can be prepared in advance, and glue coating, exposure, development, and development can be performed on the two opposite surfaces of the substrate. After etching, the capillary core 30 is obtained. Further, the sum of the etching depths on opposite sides of the substrate is greater than or equal to the thickness of the substrate, so that the etching is complete. Further, the exposure precision is 0.5μm-5μm, and the etching precision is 0.5μm-5μm, to form the support layer 31 with the hollow area 311 and the capillary structure layer 32 with the microstructure 320, and the formed support layer 31 and the capillary structure The thickness is controllable and small, which is conducive to reducing the thickness of the heat dissipation device 100. In the related art, the capillary structure layer is prepared by weaving a copper mesh. Due to the limitation of the diameter of the copper mesh, the thickness of the capillary structure layer cannot be reduced, so that the thickness of the heat sink cannot be further reduced, and the gaseous working fluid is also restricted. The heat dissipation volume is large, the resistance is large when the heat is dissipated, and the heat dissipation speed is slow. The capillary structure layer 32 made by the method of the present application has a controllable thickness, which can greatly reduce the thickness of the capillary structure layer 32, which is beneficial to reduce the thickness of the heat sink 100; at the same time, due to the existence of the support layer 31, it avoids The mutual interference of working fluids of different forms reduces the resistance of the working fluid during the heat dissipation process, and the thickness of the support layer 31 can be further reduced; in addition, even if the thickness of the heat dissipation device 100 is further reduced, the working fluid will still not be affected. The heat dissipation speed affects, that is, it does not affect the heat dissipation performance of the heat dissipation device 100 and is more reliable.
在本申请中,散热装置100包括第一盖板10和第二盖板20,第一盖板10和第二盖板 20盖合形成密闭的容置空间40。可以理解的,本申请中的术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。其中,毛细芯30设置在第一盖板10上,在应用时,第一盖板10远离第二盖板20的表面与热源贴合设置,包括直接贴合设置以及通过其他部件间接贴合设置;当然毛细芯30也可以设置在第二盖板20上,此时第二盖板20远离第一盖板10的表面与热源贴合设置。In the present application, the heat dissipation device 100 includes a first cover plate 10 and a second cover plate 20, and the first cover plate 10 and the second cover plate 20 cover together to form a closed accommodating space 40. It is understandable that the terms "first" and "second" in this application are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Wherein, the capillary wick 30 is provided on the first cover plate 10. When in use, the surface of the first cover plate 10 away from the second cover plate 20 is attached to the heat source, including direct attachment and indirect attachment through other components. ; Of course, the capillary wick 30 can also be arranged on the second cover plate 20, at this time the second cover plate 20 is away from the surface of the first cover plate 10 and is arranged in close contact with the heat source.
在本申请中,为了实现散热装置100的轻薄化,可选的,第一盖板10的厚度小于或等于200μm,第二盖板20的厚度小于或等于200μm。进一步的,第一盖板10的厚度小于或等于170μm,第二盖板20的厚度小于或等于170μm。更进一步的,第一盖板10的厚度小于或等于150μm,第二盖板20的厚度小于或等于150μm。在本申请中,第一盖板10和第二盖板20由具有导热性能的材质组成。在一实施例中,第一盖板10的导热系数大于10W/(m·K),第二盖板20的导热系数大于10W/(m·K),以使得散热装置100具有优异的散热效果。在一实施例中,第一盖板10的材质包括铜、钛、镍和锡中的至少一种或不锈钢,第二盖板20的材质包括铜、钛、镍和锡中的至少一种或不锈钢。进一步的,第一盖板10的材质为钛、铜钛合金、铜镍合金、铜锡合金或不锈钢,第二盖板20的材质为钛、铜钛合金、铜镍合金、铜锡合金或不锈钢,以使得第一盖板10和第二盖板20具有较好的力学性能,有利于降低其厚度的同时保证散热装置100的良好性能。可以理解的,第一盖板10和第二盖板20的材质可以相同,也可以不同,第一盖板10或第二盖板20与毛细芯30的材质可以相同,也可以不同。在一实施例中,第一盖板10和第二盖板20可以为单层结构,也可以为多层结构,具体的根据实际需要进行选择。In this application, in order to realize the lightness and thinness of the heat dissipation device 100, optionally, the thickness of the first cover plate 10 is less than or equal to 200 μm, and the thickness of the second cover plate 20 is less than or equal to 200 μm. Further, the thickness of the first cover plate 10 is less than or equal to 170 μm, and the thickness of the second cover plate 20 is less than or equal to 170 μm. Furthermore, the thickness of the first cover plate 10 is less than or equal to 150 μm, and the thickness of the second cover plate 20 is less than or equal to 150 μm. In the present application, the first cover plate 10 and the second cover plate 20 are composed of materials with thermal conductivity. In an embodiment, the thermal conductivity of the first cover plate 10 is greater than 10 W/(m·K), and the thermal conductivity of the second cover plate 20 is greater than 10 W/(m·K), so that the heat dissipation device 100 has an excellent heat dissipation effect . In an embodiment, the material of the first cover plate 10 includes at least one of copper, titanium, nickel and tin or stainless steel, and the material of the second cover plate 20 includes at least one of copper, titanium, nickel and tin or Stainless steel. Further, the material of the first cover plate 10 is titanium, copper-titanium alloy, copper-nickel alloy, copper-tin alloy or stainless steel, and the material of the second cover plate 20 is titanium, copper-titanium alloy, copper-nickel alloy, copper-tin alloy or stainless steel. , So that the first cover plate 10 and the second cover plate 20 have better mechanical properties, which is beneficial to reduce their thickness while ensuring the good performance of the heat dissipation device 100. It is understandable that the materials of the first cover plate 10 and the second cover plate 20 may be the same or different, and the materials of the first cover plate 10 or the second cover plate 20 and the capillary core 30 may be the same or different. In an embodiment, the first cover plate 10 and the second cover plate 20 may have a single-layer structure or a multi-layer structure, which can be specifically selected according to actual needs.
在本申请实施方式中,第一盖板10包括第一水平层和设置在第一水平层表面边缘的第一边框,此时第一盖板10可以但不限于为一体成型制得。在本申请另一实施方式中,第一盖板10为水平结构。在本申请实施方式中,第二盖板20包括第二水平层和设置在第二水平层表面边缘的第二边框,此时第二盖板20可以但不限于为一体成型制得。在本申请另一实施方式中,第二盖板20为水平结构。在一实施例中,第一边框与第二边框抵接,形成容置空间40。在另一实施例中,第一边框和水平结构的第二盖板20抵接形成容置空间40。在另一实施例中,第二边框和水平结构的第一盖板10抵接形成容置空间40。在另一实施例中,水平结构的第一盖板10和第二盖板20可以但不限于通过焊接、胶粘形成容置空间40,例如激光焊接、扩散焊接、焊料焊接、胶材粘结等。In the embodiment of the present application, the first cover plate 10 includes a first horizontal layer and a first frame arranged on the edge of the surface of the first horizontal layer. In this case, the first cover plate 10 can be manufactured by, but not limited to, integral molding. In another embodiment of the present application, the first cover plate 10 has a horizontal structure. In the embodiment of the present application, the second cover plate 20 includes a second horizontal layer and a second frame provided on the edge of the surface of the second horizontal layer. In this case, the second cover plate 20 can be, but not limited to, be made by integral molding. In another embodiment of the present application, the second cover 20 has a horizontal structure. In one embodiment, the first frame abuts against the second frame to form an accommodating space 40. In another embodiment, the first frame and the second cover plate 20 of the horizontal structure abut to form an accommodating space 40. In another embodiment, the second frame abuts against the first cover plate 10 of the horizontal structure to form the accommodating space 40. In another embodiment, the horizontal structure of the first cover plate 10 and the second cover plate 20 can be, but not limited to, forming the accommodating space 40 by welding or gluing, such as laser welding, diffusion welding, solder welding, and glue bonding. Wait.
在本申请中,容置空间40为真空状态,以使工作流体可以容易地实现汽化,进行热量传导。可选的,容置空间40内的真空度为10 -3-10 -1Pa。进一步的,容置空间40内的真空度为10 -2-10 -1Pa。可以理解的,工作流体选自与第一盖板10、第二盖板20和毛细芯30不发生化学反应的物质。可选的,工作流体选自水、丙二醇、丙酮或甲醇。具体的,工作流体可以但不限于为去离子水。工作流体在容置空间40的填充量也会影响散热装置100的散热效率,填充量过少,一个散热循环中带走的热量有限,填充量过多,增加散热装置100重量。可选的,容置空间40内工作流体的填充量为15%-70%,即可以有效的进行散热,又不会使散热装置100过重。进一步的,容置空间40内工作流体的填充量为30%-65%。 In the present application, the accommodating space 40 is in a vacuum state, so that the working fluid can easily be vaporized and conduct heat conduction. Optionally, the vacuum degree in the accommodating space 40 is 10 -3 -10 -1 Pa. Further, the degree of vacuum in the accommodating space 40 is 10 -2 -10 -1 Pa. It is understandable that the working fluid is selected from substances that do not chemically react with the first cover plate 10, the second cover plate 20, and the capillary core 30. Optionally, the working fluid is selected from water, propylene glycol, acetone or methanol. Specifically, the working fluid may be, but is not limited to, deionized water. The filling amount of the working fluid in the accommodating space 40 also affects the heat dissipation efficiency of the heat dissipation device 100. If the filling amount is too small, the heat taken away in one heat dissipation cycle is limited, and the filling amount is too much, which increases the weight of the heat dissipation device 100. Optionally, the filling amount of the working fluid in the accommodating space 40 is 15%-70%, which can effectively dissipate heat without making the heat sink 100 excessively heavy. Further, the filling amount of the working fluid in the accommodating space 40 is 30%-65%.
在本申请中,为了满足散热装置100轻薄化的需求,同时又要具备较强的力学性能,因此,散热装置100还包括支撑结构50,对散热装置100的容置空间40起到一定的支撑作用。在一实施方式中,请参阅图1,散热装置100包括至少一个支撑结构50,支撑结构50设置在容置空间40内,且与第一盖板10和第二盖板20抵接。在一实施例中,支撑结构50与毛细芯30中的支撑层31抵接。在本申请中,支撑结构50的厚度根据实际需要进行选择,可以但不限于为20μm-120μm。可以理解的,支撑结构50主要对散热装置100起到支撑作用,其材质的选择可以根据需要进行选定,可以但不限于为金属,例如铜、铜合金等。In this application, in order to meet the needs of light and thin heat dissipation device 100, and at the same time have strong mechanical properties, therefore, the heat dissipation device 100 further includes a support structure 50, which provides a certain support for the accommodation space 40 of the heat dissipation device 100 effect. In one embodiment, referring to FIG. 1, the heat dissipation device 100 includes at least one supporting structure 50. The supporting structure 50 is disposed in the accommodating space 40 and abuts against the first cover plate 10 and the second cover plate 20. In an embodiment, the supporting structure 50 abuts against the supporting layer 31 in the capillary core 30. In the present application, the thickness of the support structure 50 is selected according to actual needs, and can be, but is not limited to, 20 μm-120 μm. It is understandable that the support structure 50 mainly supports the heat dissipation device 100, and the selection of its material can be selected according to needs, and it can be but not limited to metal, such as copper, copper alloy, and the like.
在本申请中,本申请提供的散热装置100通过设置了支撑层31,间隔了容置空间40中的气态工作流体与毛细结构层32中液态工作流体之间的相互作用力,进而有利于提高散热体积和散热速度;同时,在降低散热装置100厚度后,容置空间40中的气态工作流体与毛细结构层32中液态工作流体之间还是不会产生相互作用,保证散热速度和散热体积,因此,本申请提供的散热装置100还可以实现散热装置100的轻薄化。可选的,散热装置100的厚度小于或等于280μm。进一步的,散热装置100的厚度小于或等于250μm。In the present application, the heat dissipation device 100 provided in the present application is provided with a support layer 31, which separates the interaction force between the gaseous working fluid in the accommodating space 40 and the liquid working fluid in the capillary structure layer 32, thereby helping to improve Heat dissipation volume and heat dissipation speed; at the same time, after reducing the thickness of the heat dissipation device 100, there is still no interaction between the gaseous working fluid in the accommodating space 40 and the liquid working fluid in the capillary structure layer 32, ensuring the heat dissipation speed and heat dissipation volume, Therefore, the heat dissipation device 100 provided in the present application can also realize the lightness and thinness of the heat dissipation device 100. Optionally, the thickness of the heat dissipation device 100 is less than or equal to 280 μm. Further, the thickness of the heat dissipation device 100 is less than or equal to 250 μm.
本申请还提供了一种散热装置的制备方法,该制备方法制备上述任一实施例的散热装置100。请参阅图9,为本申请一实施方式提供的散热装置100的制备方法的流程示意图,包括如下步骤:The present application also provides a method for preparing a heat dissipation device, and the preparation method prepares the heat dissipation device 100 of any one of the foregoing embodiments. Please refer to FIG. 9, which is a schematic flowchart of a method for manufacturing a heat sink 100 according to an embodiment of the application, including the following steps:
操作101:提供毛细芯,毛细芯包括支撑层和毛细结构层,支撑层包括多个支撑条以及由多个支撑条交错排布形成的多个镂空区,毛细结构层包括多个间隔设置在支撑条上的微结构,相邻微结构之间的间隙小于镂空区的横向尺寸。Operation 101: Provide a capillary core, the capillary core includes a support layer and a capillary structure layer, the support layer includes a plurality of support bars and a plurality of hollow areas formed by staggered arrangement of the plurality of support bars, and the capillary structure layer includes a plurality of spaces arranged on the support For the microstructures on the strip, the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area.
在操作101中,毛细芯30可以但不限于一体成型制成。在一实施方式中,提供毛细芯30包括:提供基板,基板具有相对设置的第一表面和第二表面;提供第一掩膜板,在基板的第一表面进行涂胶、曝光、显影和刻蚀处理,形成支撑层31;提供第二掩膜板,在基板的第二表面进行涂胶、曝光、显影和刻蚀处理,形成毛细结构层32,制得毛细芯30。In operation 101, the capillary core 30 may be formed by, but not limited to, integral molding. In one embodiment, providing the capillary wick 30 includes: providing a substrate, the substrate having a first surface and a second surface that are opposed to each other; providing a first mask, and applying glue, exposing, developing and engraving on the first surface of the substrate. The support layer 31 is formed by etching treatment; a second mask is provided, and the second surface of the substrate is coated, exposed, developed, and etched to form a capillary structure layer 32 to obtain a capillary core 30.
在本申请一实施方式中,涂胶为涂覆光刻胶,光刻胶主要是由树脂、感光剂、溶剂及功能性添加剂等不同材料按一定比例配制而成。根据光刻胶的性质,可以分为负性胶和正性胶。具体的,光刻胶可以但不限于为聚肉桂酸酯类光刻胶、聚烃类-双叠氮类光刻胶,例如聚乙烯醇肉桂酸酯、聚乙烯氧乙基肉桂酸酯、环化橡胶等。在一实施例中,在基板的第一表面和第二表面涂覆光刻胶,可以但不限于采用旋涂法,具体的还可以进行匀胶,以使光刻胶均匀分布。涂覆光刻胶后还可以进行烘干,以使光刻胶成膜状。进一步的,根据所需支撑层31以及毛细结构层32的结构,设计第一掩膜板和第二掩膜板。通过第一掩膜板和第二掩膜板分别在基板的第一表面和第二表面进行曝光。曝光方式可以分为接触式曝光、接近式曝光和投影式曝光。在一实施方式中,曝光光源可以为紫外光,也可以是汞灯、卤素灯或紫外激光(如波长为255nm或355nm激光等)。之后进行刻蚀,选择性地将未被光刻胶掩蔽的区域去除。刻蚀包括干法刻蚀和湿法刻蚀。干法刻蚀可以但不限于为等离子刻蚀、溅射刻蚀和反应粒子刻蚀;湿法刻蚀可以但不限于为无机溶液刻蚀和有机溶液刻蚀。进一 步的,曝光精度为0.5μm-5μm,刻蚀精度为0.5μm-5μm,以形成具有镂空区311的支撑层31以及具有微结构320的毛细结构层32,并且形成的支撑层31以及毛细结构的厚度可控且较小,有利于散热装置100厚度的降低。在本申请中,基板相对两侧的刻蚀深度之和大于或等于基板的厚度,以保证刻蚀完全,形成所需的支撑层31和毛细结构层32。In one embodiment of the present application, the coating is to coat photoresist, and the photoresist is mainly prepared from different materials such as resin, photosensitizer, solvent, and functional additives in a certain proportion. According to the nature of photoresist, it can be divided into negative glue and positive glue. Specifically, the photoresist can be, but is not limited to, polycinnamate photoresist, polyhydrocarbon-bisazide photoresist, such as polyvinyl alcohol cinnamate, polyvinyloxyethyl cinnamate, cyclic Chemical rubber, etc. In one embodiment, the photoresist is coated on the first surface and the second surface of the substrate, but not limited to spin coating. Specifically, the photoresist can be evenly distributed to make the photoresist evenly distributed. After the photoresist is coated, it can be dried to make the photoresist into a film. Further, according to the required structure of the supporting layer 31 and the capillary structure layer 32, the first mask and the second mask are designed. Exposure is performed on the first surface and the second surface of the substrate respectively through the first mask and the second mask. Exposure methods can be divided into contact exposure, proximity exposure and projection exposure. In one embodiment, the exposure light source may be ultraviolet light, or may be a mercury lamp, a halogen lamp, or an ultraviolet laser (such as a laser with a wavelength of 255 nm or 355 nm, etc.). Afterwards, etching is performed to selectively remove areas not masked by the photoresist. Etching includes dry etching and wet etching. Dry etching may be, but not limited to, plasma etching, sputter etching, and reactive particle etching; wet etching may be, but not limited to, inorganic solution etching and organic solution etching. Further, the exposure precision is 0.5μm-5μm, and the etching precision is 0.5μm-5μm, to form the support layer 31 with the hollow area 311 and the capillary structure layer 32 with the microstructure 320, and the formed support layer 31 and the capillary structure The thickness is controllable and small, which is conducive to reducing the thickness of the heat dissipation device 100. In the present application, the sum of the etching depths on opposite sides of the substrate is greater than or equal to the thickness of the substrate to ensure complete etching and form the required support layer 31 and capillary structure layer 32.
操作102:提供第一盖板和第二盖板,将第一盖板和第二盖板盖合形成密闭的容置空间,毛细芯设置在容置空间内,毛细结构层设置在支撑层和第一盖板之间。Operation 102: Provide a first cover plate and a second cover plate, cover the first cover plate and the second cover plate to form a closed accommodating space, the capillary core is arranged in the accommodating space, and the capillary structure layer is arranged on the supporting layer and Between the first cover.
在操作102中,第一盖板10和第二盖板20可以但不限于直接裁切金属板制得,金属板能够满足散热装置100中的第一盖板10和第二盖板20所需的导热性能和力学性能即可。为了实现散热装置100的轻薄化,可选的,第一盖板10的厚度小于或等于200μm,第二盖板20的厚度小于或等于200μm。在本申请实施方式中,可以但不限于通过焊接、胶粘的方式形成密闭的容置空间40。可选的,焊接包括激光焊接、扩散焊接、焊料焊接中的至少一种。焊料焊接包括低温焊料或高温焊料,扩散焊接包括真空扩散焊或气体保护扩散焊,胶粘的材料可以但不限于为双环氧基胶材、硅基胶材等。当散热装置100还包括支撑结构50时,支撑结构50设置在容置空间40内,并与第一盖板10和第二盖板20抵接。In operation 102, the first cover plate 10 and the second cover plate 20 can be made by, but not limited to, directly cut metal plates, and the metal plates can meet the requirements of the first cover plate 10 and the second cover plate 20 in the heat sink 100 The thermal conductivity and mechanical properties are sufficient. In order to realize the lightness and thinness of the heat dissipation device 100, optionally, the thickness of the first cover plate 10 is less than or equal to 200 μm, and the thickness of the second cover plate 20 is less than or equal to 200 μm. In the embodiment of the present application, the enclosed accommodating space 40 can be formed but not limited to welding or gluing. Optionally, the welding includes at least one of laser welding, diffusion welding, and solder welding. Solder welding includes low-temperature solder or high-temperature solder, and diffusion welding includes vacuum diffusion welding or gas shielded diffusion welding. The adhesive material can be, but not limited to, double epoxy-based adhesive material, silicon-based adhesive material, etc. When the heat dissipation device 100 further includes a supporting structure 50, the supporting structure 50 is disposed in the accommodating space 40 and abuts against the first cover plate 10 and the second cover plate 20.
操作103:向容置空间内注入工作流体,密封后形成散热装置。Operation 103: Inject a working fluid into the accommodating space, and form a heat dissipation device after sealing.
在操作103中,容置空间40为真空状态,以使工作流体可以容易地实现汽化,进行热量传导。可选的,容置空间40内的真空度为10 -3-10 -1Pa。在一实施例中,向容置空间40内焊接充液管,经充液管向容置空间40内注入工作流体,经抽真空和密封后形成散热装置100。 In operation 103, the accommodating space 40 is in a vacuum state, so that the working fluid can easily be vaporized and conduct heat conduction. Optionally, the vacuum degree in the accommodating space 40 is 10 -3 -10 -1 Pa. In one embodiment, a liquid-filled pipe is welded into the accommodating space 40, a working fluid is injected into the accommodating space 40 through the liquid-filled pipe, and the heat sink 100 is formed after vacuuming and sealing.
本申请提供的散热装置100的制备方法简单,无需使用精密的设备即可完成,制备成本低,且制得的散热装置100散热性能优异,有利于应用。The preparation method of the heat dissipation device 100 provided in the present application is simple, can be completed without using sophisticated equipment, has low preparation cost, and the prepared heat dissipation device 100 has excellent heat dissipation performance, which is beneficial to application.
本申请还提供了一种电子设备,包括上述任一实施例的散热装置100。可以理解的,电子设备可以但不限于为手机、平板电脑、笔记本电脑、手表、MP3、MP4、GPS导航仪、数码相机等,散热装置100可以但不限于为均热板。The present application also provides an electronic device, including the heat dissipation device 100 of any of the foregoing embodiments. It is understandable that the electronic device can be, but is not limited to, a mobile phone, a tablet computer, a notebook computer, a watch, MP3, MP4, GPS navigator, a digital camera, etc., and the heat dissipation device 100 can be, but is not limited to, a heat sink.
请参阅图10,为本申请一实施方式提供的电子设备的结构示意图,电子设备包括面板300和壳体400,面板300和壳体400形成收容空间,收容空间内包括了发热元件200和上述的散热装置100,其中,发热元件200与散热装置100对应设置,可以实现快速的散热,提高散热效率;同时该散热装置100可以适当降低厚度还能兼顾优异的散热性能,进而有利于实现电子设备的轻薄化。在实际应用中,散热装置100可以直接与发热元件200接触,也可以通过中板与发热元件200接触,此时可以对中板进行处理,使散热装置100嵌入中板内。请参阅图11,为本申请另一实施方式提供的电子设备的截面示意图,电子设备包括发热元件200、散热装置100和中板500,散热装置100嵌入中板500中,并与发热元件200贴合设置。以手机为例,散热装置100较厚,则会影响手机的中板500的力学性能,进而影响手机整体强度,而本申请提供的散热装置100可以将其厚度降低,并且还不影响散热装置100的散热性能,进而不会影响手机整体性能,同时,本申请提供的散热装置100在保持良好散热性能的前提下,还可以降低其厚度,不会过多增加手机的重量,具有良好 的应用前景。Please refer to FIG. 10, which is a schematic structural diagram of an electronic device provided by an embodiment of this application. The electronic device includes a panel 300 and a housing 400. The panel 300 and the housing 400 form a receiving space, and the receiving space includes a heating element 200 and the above The heat dissipating device 100, wherein the heating element 200 and the heat dissipating device 100 are arranged correspondingly, can realize rapid heat dissipation and improve the heat dissipation efficiency; at the same time, the heat dissipating device 100 can appropriately reduce the thickness and also take into account excellent heat dissipation performance, thereby helping to realize the electronic equipment Thin and light. In practical applications, the heat sink 100 can directly contact the heating element 200, or contact the heating element 200 through the middle plate. At this time, the middle plate can be processed so that the heat sink 100 is embedded in the middle plate. Please refer to FIG. 11, which is a schematic cross-sectional view of an electronic device provided by another embodiment of this application. The electronic device includes a heating element 200, a heat dissipation device 100, and a middle plate 500. The heat dissipation device 100 is embedded in the middle plate 500 and attached to the heating element 200.合Settings. Taking a mobile phone as an example, if the heat dissipation device 100 is thicker, it will affect the mechanical properties of the midplane 500 of the mobile phone, thereby affecting the overall strength of the mobile phone. The heat dissipation device 100 provided in the present application can reduce its thickness without affecting the heat dissipation device 100. The heat dissipation performance of the mobile phone will not affect the overall performance of the mobile phone. At the same time, the heat dissipation device 100 provided by the present application can reduce its thickness under the premise of maintaining good heat dissipation performance without excessively increasing the weight of the mobile phone, and has good application prospects. .
以上对本申请实施方式所提供的内容进行了详细介绍,本文对本申请的原理及实施方式进行了阐述与说明,以上说明只是用于帮助理解本申请的方法及其核心思想;同时,对于本领域的一般技术人员,依据本申请的思想,在具体实施方式及应用范围上均会有改变之处,综上所述,本说明书内容不应理解为对本申请的限制。The above provides a detailed introduction to the content provided by the implementation of the application. This article explains and explains the principles and implementations of the application. The above description is only used to help understand the methods and core ideas of the application; at the same time, for the field General technical personnel, based on the idea of this application, will have changes in the specific implementation and scope of application. In summary, the content of this specification should not be construed as a limitation to this application.

Claims (20)

  1. 一种散热装置,其特征在于,包括第一盖板、第二盖板、毛细芯和工作流体,所述第一盖板和所述第二盖板盖合形成密闭的容置空间,所述毛细芯设置在所述第一盖板靠近所述容置空间的表面,所述工作流体填充在所述容置空间内,其中,所述毛细芯包括支撑层和毛细结构层,所述支撑层包括多个支撑条以及由多个所述支撑条交错排布形成的多个镂空区,所述毛细结构层设置在所述支撑层和所述第一盖板之间,所述毛细结构层包括间隔设置在所述支撑条上的多个微结构,相邻所述微结构之间的间隙小于所述镂空区的横向尺寸。A heat dissipation device, which is characterized in that it comprises a first cover plate, a second cover plate, a capillary core and a working fluid. The first cover plate and the second cover plate are combined to form a closed accommodation space, and the The capillary wick is arranged on the surface of the first cover plate close to the accommodating space, and the working fluid is filled in the accommodating space, wherein the capillary wick includes a support layer and a capillary structure layer, and the support layer The capillary structure layer is arranged between the support layer and the first cover plate, and the capillary structure layer includes: A plurality of microstructures are arranged on the support bar at intervals, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area.
  2. 如权利要求1所述的散热装置,其特征在于,多个所述微结构在所述毛细结构层上呈阵列排布。The heat dissipation device of claim 1, wherein a plurality of the microstructures are arranged in an array on the capillary structure layer.
  3. 如权利要求1所述的散热装置,其特征在于,所述微结构包括第一微结构和第二微结构,所述第一微结构和所述第二微结构的长度延伸方向交错,所述第一微结构和所述第二微结构间隔设置。The heat dissipation device of claim 1, wherein the microstructure comprises a first microstructure and a second microstructure, and the length extension directions of the first microstructure and the second microstructure are staggered, and the The first microstructure and the second microstructure are arranged at intervals.
  4. 如权利要求1所述的散热装置,其特征在于,多个所述支撑条包括多个平行排布的第一支撑条和多个平行排布的第二支撑条,多个所述第一支撑条和多个所述第二支撑条交错排布形成所述镂空区。The heat sink according to claim 1, wherein the plurality of support bars comprise a plurality of first support bars arranged in parallel and a plurality of second support bars arranged in parallel, and a plurality of the first supports The strips and the plurality of second supporting strips are arranged alternately to form the hollow area.
  5. 如权利要求4所述的散热装置,其特征在于,所述第一支撑条和所述第二支撑条相交形成支撑节点,所述微结构设置在所述支撑节点上。The heat dissipation device according to claim 4, wherein the first supporting bar and the second supporting bar intersect to form a supporting node, and the microstructure is disposed on the supporting node.
  6. 如权利要求1所述的散热装置,其特征在于,所述微结构的横向尺寸为5μm-60μm,厚度为5μm-40μm,相邻所述微结构之间的间隙为5μm-50μm。The heat dissipation device of claim 1, wherein the lateral dimension of the microstructure is 5 μm-60 μm, the thickness is 5 μm-40 μm, and the gap between adjacent microstructures is 5 μm-50 μm.
  7. 如权利要求1所述的散热装置,其特征在于,所述支撑层的厚度为5μm-40μm,所述镂空区的横向尺寸为40μm-150μm。The heat dissipation device according to claim 1, wherein the thickness of the support layer is 5 μm-40 μm, and the lateral dimension of the hollow area is 40 μm-150 μm.
  8. 如权利要求1所述的散热装置,其特征在于,所述毛细芯的材质包括铜、钛、镍和锡中的至少一种或不锈钢。The heat dissipation device of claim 1, wherein the material of the capillary core includes at least one of copper, titanium, nickel, and tin, or stainless steel.
  9. 如权利要求1所述的散热装置,其特征在于,所述毛细芯为一体成型结构。The heat sink of claim 1, wherein the capillary core is an integrally formed structure.
  10. 如权利要求1所述的散热装置,其特征在于,多个所述镂空区的开口面积相同。5. The heat dissipation device of claim 1, wherein the opening areas of the plurality of hollow regions are the same.
  11. 如权利要求1所述的散热装置,其特征在于,所述支撑层与所述第二盖板之间的间距为20μm-120μm。The heat dissipation device of claim 1, wherein the distance between the supporting layer and the second cover plate is 20 μm-120 μm.
  12. 如权利要求1所述的散热装置,其特征在于,所述微结构的形状包括正方体、长方体、圆柱体和不规则立体结构中的至少一种。The heat dissipation device of claim 1, wherein the shape of the microstructure includes at least one of a cube, a rectangular parallelepiped, a cylinder, and an irregular three-dimensional structure.
  13. 如权利要求1所述的散热装置,其特征在于,所述毛细芯还包括边框,所述边框围设所述支撑层和所述毛细结构层的外围。The heat dissipation device of claim 1, wherein the capillary core further comprises a frame, and the frame surrounds the periphery of the support layer and the capillary structure layer.
  14. 如权利要求1所述的散热装置,其特征在于,所述散热装置还包括支撑结构,所述支撑结构设置在所述容置空间内,且与所述第一盖板和所述第二盖板抵接。The heat dissipation device according to claim 1, wherein the heat dissipation device further comprises a supporting structure, the supporting structure is disposed in the accommodating space and is connected to the first cover plate and the second cover The board abuts.
  15. 如权利要求11所述的散热装置,其特征在于,所述支撑结构与所述支撑层抵接。The heat dissipation device of claim 11, wherein the supporting structure abuts against the supporting layer.
  16. 一种散热装置的制备方法,其特征在于,包括:A method for preparing a heat sink, which is characterized in that it comprises:
    提供毛细芯,所述毛细芯包括支撑层和毛细结构层,所述支撑层包括多个支撑条以及由多个所述支撑条交错排布形成的多个镂空区,所述毛细结构层包括多个间隔设置在所述支撑条上的微结构,相邻所述微结构之间的间隙小于所述镂空区的横向尺寸;A capillary core is provided, the capillary core includes a support layer and a capillary structure layer, the support layer includes a plurality of support bars and a plurality of hollow areas formed by staggered arrangement of the plurality of support bars, the capillary structure layer includes a plurality of Two microstructures spaced apart on the support bar, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area;
    提供第一盖板和第二盖板,将所述第一盖板和所述第二盖板盖合形成密闭的容置空间,所述毛细芯设置在所述容置空间内,所述毛细结构层设置在所述支撑层和所述第一盖板之间;A first cover plate and a second cover plate are provided, and the first cover plate and the second cover plate are combined to form a closed accommodating space, the capillary core is arranged in the accommodating space, and the capillary The structural layer is arranged between the support layer and the first cover plate;
    向所述容置空间内注入工作流体,密封后形成散热装置。A working fluid is injected into the accommodating space, and a heat dissipation device is formed after sealing.
  17. 如权利要求16所述的制备方法,其特征在于,所述提供毛细芯包括:The preparation method according to claim 16, wherein said providing a capillary core comprises:
    提供基板,所述基板具有相对设置的第一表面和第二表面;Providing a substrate, the substrate having a first surface and a second surface that are opposed to each other;
    提供第一掩膜板,在所述基板的所述第一表面进行涂胶、曝光、显影和刻蚀处理,形成所述支撑层;Providing a first mask, and performing glue coating, exposure, development and etching treatments on the first surface of the substrate to form the support layer;
    提供第二掩膜板,在所述基板的所述第二表面进行涂胶、曝光、显影和刻蚀处理,形成所述毛细结构层,制得所述毛细芯。A second mask is provided, and the second surface of the substrate is coated, exposed, developed, and etched to form the capillary structure layer to obtain the capillary core.
  18. 如权利要求17所述的制备方法,其特征在于,所述曝光精度为0.5μm-5μm,刻蚀精度为0.5μm-5μm。The preparation method according to claim 17, wherein the exposure accuracy is 0.5 μm-5 μm, and the etching accuracy is 0.5 μm-5 μm.
  19. 一种电子设备,其特征在于,包括发热元件和散热装置,所述散热装置包括第一盖板、第二盖板、毛细芯和工作流体,所述第一盖板和所述第二盖板盖合形成密闭的容置空间,所述毛细芯设置在所述第一盖板靠近所述容置空间的表面,所述工作流体填充在所述容置空间内,其中,所述毛细芯包括支撑层和毛细结构层,所述支撑层包括多个支撑条以及由多个所述支撑条交错排布形成的多个镂空区,所述毛细结构层设置在所述支撑层和所述第一盖板之间,所述毛细结构层包括多个间隔设置在所述支撑条上的微结构,相邻所述微结构之间的间隙小于所述镂空区的横向尺寸,所述散热装置与所述发热元件对应设置。An electronic device, characterized by comprising a heating element and a heat dissipation device, the heat dissipation device comprising a first cover plate, a second cover plate, a capillary core and a working fluid, the first cover plate and the second cover plate Covering to form a closed accommodating space, the capillary wick is disposed on the surface of the first cover plate close to the accommodating space, and the working fluid is filled in the accommodating space, wherein the capillary wick includes A support layer and a capillary structure layer, the support layer includes a plurality of support strips and a plurality of hollow areas formed by staggered arrangement of the plurality of support strips, the capillary structure layer is arranged on the support layer and the first Between the cover plates, the capillary structure layer includes a plurality of microstructures spaced apart on the support bar, and the gap between adjacent microstructures is smaller than the lateral dimension of the hollow area. The heating elements are correspondingly arranged.
  20. 如权利要求19所述的电子设备,其特征在于,所述电子设备还包括中板,所述散热装置嵌入所述中板中,并与所述发热元件贴合设置。The electronic device according to claim 19, wherein the electronic device further comprises a middle plate, and the heat dissipation device is embedded in the middle plate and is arranged in close contact with the heating element.
PCT/CN2021/075525 2020-04-08 2021-02-05 Heat dissipation apparatus and method for manufacturing same, and electronic device WO2021203826A1 (en)

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