WO2021200511A1 - Compound, method for producing compound, and curable composition - Google Patents

Compound, method for producing compound, and curable composition Download PDF

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WO2021200511A1
WO2021200511A1 PCT/JP2021/012405 JP2021012405W WO2021200511A1 WO 2021200511 A1 WO2021200511 A1 WO 2021200511A1 JP 2021012405 W JP2021012405 W JP 2021012405W WO 2021200511 A1 WO2021200511 A1 WO 2021200511A1
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group
carbon atoms
compound
formula
represented
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PCT/JP2021/012405
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French (fr)
Japanese (ja)
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将太 小林
健一 玉祖
小川 亮
保 永松
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株式会社Adeka
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Priority to KR1020227023881A priority Critical patent/KR20220162687A/en
Priority to CN202180011205.8A priority patent/CN115003709B/en
Priority to JP2022512046A priority patent/JPWO2021200511A1/ja
Publication of WO2021200511A1 publication Critical patent/WO2021200511A1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D301/00Preparation of oxiranes
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D303/00Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02Compounds containing oxirane rings
    • C07D303/12Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
    • C07D303/16Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by esterified hydroxyl radicals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/30Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/32Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32Epoxy compounds containing three or more epoxy groups

Definitions

  • the present invention relates to a compound and a method for producing the same, and more particularly to a curable compound having a reactive unsaturated bond and an epoxy group and a method for producing the same. Further, the present invention relates to at least one of the curable compounds, a curing agent and polymerization. The present invention relates to a curable composition comprising at least one selected from the initiators.
  • the adhesive used for assembling camera modules and the like is required to have low-temperature curability in order to avoid thermal damage to the image sensor and the like due to high-temperature treatment, and also has short-time curability from the viewpoint of improving production efficiency. Required at the same time.
  • ultraviolet curable adhesives and thermosetting epoxy resin adhesives are often used as low-temperature short-time curable adhesives.
  • the ultraviolet curable adhesive can be cured quickly, it has a demerit that it cannot be used for adhering a part that is not exposed to light.
  • thermosetting epoxy resin-based adhesives, even low-temperature short-time curable adhesives must be fixed with jigs or devices in order to maintain the bonding posture during bonding.
  • the viscosity is lowered due to the temperature rise due to heating, causing problems such as sagging immediately before curing and flowing to a portion other than the desired portion, which is not always satisfactory.
  • Patent Document 1 proposes a light and heat-curable composition containing a curable component composed of a compound having a glycidyl group and a (meth) acryloyl group, a polythiol compound, and an epoxy curing accelerator.
  • Patent Document 2 proposes a curable composition containing a compound having a (meth) acryloyl group, a polythiol compound, a photoradical generator, and a latent curing agent, and a compound having a (meth) acryloyl group and an epoxy group.
  • the epoxy (meth) acrylate described in Patent Documents 1 and 2 is a compound obtained by reacting the epoxy group of the epoxy resin with (meth) acrylic acid, and an unreacted epoxy resin remains at the time of production. As a result, it becomes a mixture of a plurality of kinds of compounds, which tends to increase the viscosity, and is not satisfactory for application to a curing system by light and heat.
  • an object of the present invention is to provide a compound which can be produced by an industrially advantageous method with less labor for removing unreacted substances and can be cured by light and heat, and can be cured by light and heat. It is to provide a curable composition which can provide an excellent sealant or adhesive.
  • the present invention provides a compound represented by the following general formula (1).
  • R 1 and R 3 independently represent a hydrogen atom or a methyl group, respectively, and R 2 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a halogen atom, and a substituent.
  • R 2 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a halogen atom, and a substituent.
  • a 1 represents a single bond or an alkylene group having 1 to 4 carbon atoms.
  • the substituent represents 1 to 10 carbon atoms. It is a group selected from an alkyl group, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom.
  • the alcoholic hydroxyl group bonded to A 2 in the obtained compound is an acrylic acid ester or meta.
  • a method for producing a compound represented by the following general formula (1-1), which is esterified using an acrylic acid ester In the formula, R 4 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a group selected from halogen atoms, and A 2 is an alkylene group having 1 to 4 carbon atoms. Represents.
  • M represents a number from 0 to 4.
  • R 101 and R 103 independently represent a hydrogen atom or a methyl group
  • R 4 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom.
  • a 2 represents an alkylene group having 1 to 4 carbon atoms
  • m represents a number of 0 to 4).
  • the hydroxyl group located at the para position with respect to the benzoyl group which may be substituted with R 5 is glycidyl ether.
  • R 5 represents a group selected from an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom.
  • R 201 and R 203 independently represent a hydrogen atom or a methyl group
  • R 5 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom. Represents the group to be selected.
  • P represents a number from 0 to 5.
  • the present invention has a curable composition containing (A) at least one compound represented by the following general formula (1) and (B) at least one selected from a curing agent and a polymerization initiator. It provides things.
  • R 1 and R 3 independently represent a hydrogen atom or a methyl group, respectively, and R 2 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a halogen atom, and a substituent.
  • R 2 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a halogen atom, and a substituent.
  • a 1 represents a single bond or an alkylene group having 1 to 4 carbon atoms.
  • the substituent represents 1 to 10 carbon atoms. It is a group selected from an alkyl group, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom.
  • the present invention provides a method for producing a cured product obtained by curing the curable composition with light and then heat.
  • the present invention provides a cured product obtained by curing the curable composition with light and heat.
  • the compound provided by the present invention is suitable as a material to be cured by light and heat, and the curable composition provided by the present invention is excellent in photocurability and thermosetting. It is possible to carry out dual curing in which temporary curing is performed by heat and then main curing is performed by heat. Due to these characteristics, it can be used in applications such as liquid encapsulants, liquid adhesives, adhesives for camera modules, and liquid crystal sealants. In addition, since it is not necessary to use an excess epoxy resin in the above-mentioned production method for producing the compound represented by the formula (1-1), it is not necessary to remove unreacted substances, and a simple purification method can be used for light and / /. Alternatively, it has the advantage that it can be used for thermosetting.
  • a production method for producing a compound represented by the formula (1-1) using the formula (1-1-1) as a substrate a method using a (meth) acrylic acid chloride such as acryloyl chloride, an acrylic acid ester or the like, etc.
  • a method using the (meth) acrylic acid ester of the above but in the former, there is a possibility that a side reaction may occur with the hydrochloric acid and the epoxy group generated by the reaction. Therefore, by using a (meth) acrylic acid ester, it is possible to suppress the above side reaction.
  • FIG. 1 is a 1 H-NMR measurement result of the compound obtained in Example 1.
  • FIG. 2 shows the measurement results of 1 H-NMR of the compound obtained in Example 2.
  • the compound represented by the formula (1) of the present invention has a glycidyl ether group (sometimes called a "glycidyloxy group”) and a reactive unsaturated bond. Therefore, it is possible to provide a cured product by light and / or heat by using it in combination with various curing agents and various polymerization initiators.
  • the reactive unsaturated bond may also be referred to as an ethylenically unsaturated bond.
  • examples of the alkyl group having 1 to 10 carbon atoms represented by R 2 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group and a second butyl group.
  • Tertiary butyl group amyl group, isoamyl group, tertiary amyl group, hexyl group, heptyl group, octyl group, 2-ethylhexyl group, nonyl group, isononyl group, decyl group, isodecyl group and the like.
  • examples of the alkoxy group having 1 to 10 carbon atoms represented by R 2 include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, an amyroxy group, a hexyloxy group, a pentyroxy group and an octyloxy group. Examples include a group, a nonyloxy group, a decyloxy group and the like.
  • examples of the halogen atom represented by R 2 include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
  • the alkyl group having 1 to 10 carbon atoms as the substituent of the benzoyl group or the benzyl group represented by R 2, the alkoxy group having 1 to 10 carbon atoms, and the halogen atom are R.
  • the above-mentioned groups can be used as the alkyl group having 1 to 10 carbon atoms, the alkoxy group having 1 to 10 carbon atoms, and the halogen atom used in 2.
  • examples of the alkylene group having 1 to 4 carbon atoms represented by A 1 include a methylene group, an ethylene group, a propylene group, an isopropylene group, a butylene group, an isobutylene group and an ethylidene group.
  • examples thereof include a propyridene group, an isopropylidene group and a butylidene group.
  • a 1 is an alkylene group having 1 to 4 carbon atoms
  • n is 0 or R 2 is an alkyl having 1 to 10 carbon atoms.
  • a 1 is a single bond
  • n is 1
  • R 2 is a benzoyl group capable of having a substituent
  • the benzoyl group is relative to the glycidyloxy group represented by the above formula (1 ⁇ ). It is preferable that it is located in the para position.
  • the compound represented by the general formula (1) can be produced more easily.
  • the compound represented by the following general formula (1-1) or (1-2) can be easily produced, and by using various curing agents and / or various polymerization initiators in combination, light It is preferable because it has excellent curability by heat.
  • R 101 and R 103 independently represent a hydrogen atom or a methyl group
  • R 4 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom.
  • a 2 represents an alkylene group having 1 to 4 carbon atoms
  • m represents a number of 0 to 4).
  • R 201 and R 203 independently represent a hydrogen atom or a methyl group
  • R 5 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom. Represents the group to be selected.
  • P represents a number from 0 to 5.
  • the alkyl group having 1 to 10 carbon atoms represented by R 4 and the alkoxy group having 1 to 10 carbon atoms and the halogen atom have the number of carbon atoms represented by R 2.
  • Examples of the alkyl group of 1 to 10, the alkoxy group having 1 to 10 carbon atoms, and the halogen atom include the groups exemplified above.
  • the alkylene group having 1 to 4 carbon atoms represented by A 2 the group exemplified above as the alkylene group having 1 to 4 carbon atoms exemplified as A 1 is used. Can be mentioned.
  • the alkyl group having 1 to 10 carbon atoms represented by R 5 the alkoxy group having 1 to 10 carbon atoms, and the halogen atom have 1 carbon atom represented by R 2.
  • Examples of the alkyl group to 10, the alkoxy group having 1 to 10 carbon atoms, and the halogen atom include the groups exemplified above.
  • a 2 is an ethylene group in terms of availability of raw materials.
  • a 2 is located at the para-position or the meta-position with respect to the glycidyloxy group in terms of ease of producing the compound, particularly at the para-position. It is preferably located at.
  • m is preferably 3 or less, more preferably 2 or less, and further preferably 1 or less, from the viewpoint of ease of raw materials. It is particularly preferable, that is, it is 0, that is, it is most preferable that only the unsaturated ester group having a glycidyloxy group and A 2 and a hydrogen atom are bonded to the benzene ring of the formula (1-1). Further, in the compound represented by the formula (1-1), when m is 1 or more, R 4 is an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or a halogen atom.
  • a raw material preferably an alkyl group having 1 to 2 carbon atoms, an alkoxy group having 1 to 2 carbon atoms, or a halogen atom.
  • m is 2 or more, a plurality of R 4s may be the same or different.
  • R 101 and R 103 independently represent a hydrogen atom or a methyl group, respectively.
  • R 101 is a hydrogen atom because the reactivity of the reactive unsaturated bond is high.
  • R 103 is a hydrogen atom because the reaction with the latent curing agent is quick. From these points, it is preferable that both R 101 and R 103 are hydrogen atoms from the viewpoint of quick curing reaction. Further, it tends to become a liquid at 25 ° C., which has an advantage of improving workability.
  • the compound of the present invention is represented by the above formula (1-2) has an advantage that the rate at the time of thermosetting is high because the reactivity of the epoxy group is structurally high. Further, there is an advantage that the heat resistance of the cured product by light curing and the cured product by light and heat curing is relatively high.
  • p is preferably 4 or less, more preferably 3 or less, and 2 or less from the viewpoint of ease of raw materials. It is particularly preferable, it is more preferably 1 or less, and most preferably 0.
  • R 5 is an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or a halogen atom from the viewpoint of availability of raw materials, and R 5 Is more preferably an alkyl group having 1 to 2 carbon atoms, an alkoxy group having 1 to 2 carbon atoms, or a halogen atom.
  • a plurality of R 5s may be the same or different.
  • R 201 is a hydrogen atom in that the reactivity of the reactive unsaturated bond is high. It is preferable that R 201 is a methyl group because the storage stability of the curable composition is improved and the cured physical properties are excellent. Further , it is preferable that R 203 is a hydrogen atom because it reacts quickly with a latent curing agent.
  • one hydroxyl group is glycidyl etherified by utilizing the difference between the two hydroxyl groups in a compound containing two hydroxyl groups, and then the other hydroxyl group is (meth) acrylic acid esterified.
  • the production method can. More specifically, for example, it can be produced by the production method as shown below.
  • the compound represented by the formula (1-1) is the alcoholic hydroxyl group (A 2 ) of the compound obtained after the phenolic hydroxyl group of the compound represented by the following formula (1-1-1) is glycidyl etherified. It can be produced by esterifying an acrylate or a methacrylic acid (a hydroxyl group bonded to an alkylene group represented by).
  • esterifying an acrylate or a methacrylic acid a hydroxyl group bonded to an alkylene group represented by.
  • the acidity of the phenolic hydroxyl group and the alcoholic hydroxyl group are different, it is considered that the glycidyl etherification of the phenolic hydroxyl group proceeds preferentially.
  • esterifying the alcoholic hydroxyl group the compound represented by the formula (1-1) can be obtained.
  • R 4 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a group selected from halogen atoms
  • a 2 is an alkylene group having 1 to 4 carbon atoms.
  • M represents a number from 0 to 4.
  • the compound represented by the formula (1-2) is, for example, a benzoyl group (formula ) which may be substituted with R 5 in the compound having two hydroxyl groups represented by the following formula (1-2-1).
  • the hydroxyl group located at the ortho position with respect to the benzoyl group is acrylic acid esterified or methacrylic. It can be produced by acid esterification.
  • the acidity of the hydroxyl group at the para position and the hydroxyl group at the ortho position are different with respect to the benzoyl group, it is considered that the glycidyl etherification of the hydroxyl group at the para position proceeds preferentially. Then, by esterifying the hydroxyl group at the ortho position, the compound represented by the formula (1-2) can be obtained.
  • R 5 represents a group selected from an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom.
  • P represents a number from 0 to 5.
  • the hydroxyl group of the compound represented by the general formula (1-1-1), the compound represented by the general formula (1-2-1), or the like is used as a method for converting one hydroxyl group into glycidyl ether.
  • a method of adding an alkali to a mixture of a compound containing two of the above and epihalohydrin to cause a reaction examples include a method of dropping an aqueous alkali solution and a method of adding a solid alkali in a plurality of times.
  • Examples of epichlorohydrin include epichlorohydrin, epibromohydrin, ⁇ -methylepichlorohydrin and the like.
  • Examples of the alkali include metal hydroxides such as sodium hydroxide, potassium hydroxide and calcium hydroxide.
  • An interlayer transfer catalyst can also be used, and examples of the interlayer transfer catalyst include tetramethylammonium chloride, tetrabutylammonium bromide, methyltrioctylammonium chloride, methyltridecylammonium chloride, and N, N-dimethylpyrrolid.
  • the amount of epihalohydrin used is 3 to 50 times, preferably 4 to 30 times, the molar ratio of the compound containing two hydroxyl groups.
  • the reaction is carried out under heating, pressurization or reduced pressure, if necessary.
  • the reaction temperature is preferably 40 ° C. or higher and 120 ° C. or lower, and more preferably 60 ° C. or higher and 80 ° C. or lower. If the chlorhydrinization reaction and the ring closure reaction of the obtained chlorhydrinide occur stepwise, and the reaction temperature of the chlorhydrinization reaction and the reaction temperature of the ring closure reaction are different, the reaction temperature of either one is the above temperature. It is preferably within the range, and more preferably both are within the above range.
  • a method for acrylic acid esterification or methacrylic acid esterification a method performed using an acrylic acid ester and / or a methacrylic acid ester in the presence of a catalyst such as dialkyltin oxide or tetraalkyl titanate, chloride.
  • a catalyst such as dialkyltin oxide or tetraalkyl titanate, chloride.
  • examples thereof include a method using acryloyl and / or methacryloyl chloride in the presence of a neutralizing agent such as triethylamine.
  • the acrylate ester include methyl acrylate, ethyl acrylate, and butyl acrylate.
  • the methacrylic acid ester include methyl methacrylate, ethyl methacrylate and butyl methacrylate.
  • the reaction temperature in the presence of the former (meth) acrylic acid ester and catalyst is preferably, for example, 50 to 100 ° C, more preferably 70 to 90 ° C. preferable. Further, from the viewpoint of shortening the production time and reaction efficiency, the reaction temperature in the presence of the latter (meth) acrylic acid chloride and the neutralizing agent is preferably 0 to 30 ° C., for example.
  • the method for producing the compound represented by the formula (1-1) it is preferable to adopt a method using an acrylic acid ester and / or a methacrylic acid ester from the viewpoint of easily preventing side reactions, and in particular, acrylic. It is preferable to use an acrylic acid ester such as methyl acrylate from the viewpoint of obtaining a compound having excellent reactivity.
  • the curable composition of the present invention includes (A) at least one of the compounds represented by the general formula (1) (hereinafter, may be referred to as “component (A)”) and (B) a curing agent. Alternatively, it contains at least one selected from the polymerization initiators (hereinafter, may be referred to as “component (B)”).
  • a compound having at least one reactive unsaturated bond and one or more epoxy groups other than the component (A) can be used in combination with the curable composition of the present invention, and these are, for example, glycidyl methacrylate and allyl phenol. Examples thereof include glycidyl ether, diglycidyl monoallyl ether, and epoxy acrylates.
  • the curable composition of the present invention may be used in combination with a compound having only an epoxy group or a compound having only a reactive unsaturated bond among the reactive unsaturated bond and the epoxy group.
  • Examples of the compound having only the epoxy group include known epoxy resins.
  • Examples of the epoxy resin include polyglycidyl ether compounds of mononuclear polyvalent phenol compounds such as hydroquinone, resorcin, pyrocatechol, and fluoroglusinol; ethylene glycol, propylene glycol, butylene glycol, hexanediol, polyglycol, and thiodiglycol.
  • Polyglycidyl ethers of polyhydric alcohols such as glycerin, trimethylolpropane, pentaerythritol, sorbitol, bisphenol A-alkylene oxide adduct; maleic acid, fumaric acid, itaconic acid, succinic acid, glutaric acid, sveric acid, adipic acid.
  • Glycidyl esters of group, aromatic or alicyclic polybasic acids homopolymers or copolymers of glycidyl methacrylate; vinylcyclohexene diepoxides, dicyclopentane diene diepoxides, 3,4-epoxycyclohexylmethyl-3,4 -Epoxy cyclohexanecarboxylate, 3,4-epoxy-6-methylcyclohexylmethyl-6-methylcyclohexanecarboxylate, epoxides of cyclic olefin compounds such as bis (3,4-epoxy-6
  • epoxy resins were internally crosslinked with a prepolymer of terminal isocyanate, or polyvalent active hydrogen compounds (polyvalent phenol, polyamine, carbonyl group-containing compound, polyphosphate ester, etc.) were used to increase the molecular weight. It may be a thing.
  • Examples of commercially available products of the epoxy resin include Denacol EX-313, Denacol EX-314, Denacol EX-321, Denacol EX-411, Denacol EX-421, Denacol EX-512, Denacol EX-521, and Denacol EX-611.
  • Examples of the compound having only a reactive unsaturated bond include N-methyl (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N, N-diethyl (meth) acrylamide, and N-isopropyl (meth) acrylamide.
  • hydroxyethyl Unsaturated polyusity such as meta) acrylate malate, hydroxypropyl (meth) acrylate malate, dicyclopentadiene malate or polyfunctional (meth) acrylate having one carboxy group and two or more (meth) acryloyl groups.
  • the content of the component (A) in the curable composition of the present invention is, for example, preferably 15% by mass or more, and 30% by mass or more and 99% by mass in terms of curability and the like in the curable composition. It is preferably 50% by mass or more and 97% by mass, more preferably. Further, when the curable composition contains an epoxy group and / or another compound having a reactive unsaturated bond in addition to the component (A), the amount of the other compound is (in terms of curability and the like). A) It is preferably 100 parts by mass or less, and more preferably 70 parts by mass or less with respect to 100 parts by mass of the component.
  • an amine-based curing agent for example, an amine-based curing agent, a phenol-based curing agent, an acid anhydride-based curing agent, a polythiol compound, an amine-based latent curing agent and the like are mentioned as preferable ones. Be done.
  • amine-based curing agent examples include alkylenediamines such as ethylene dihydric acid, 1,2-diaminopropane, 1,3-diaminopropane, 1,3-diaminobutane, 1,4-diaminobutane, and hexamethylenediamine; diethylenetriamine.
  • alkylenediamines such as ethylene dihydric acid, 1,2-diaminopropane, 1,3-diaminopropane, 1,3-diaminobutane, 1,4-diaminobutane, and hexamethylenediamine; diethylenetriamine.
  • Triethylenetriamine polyalkylpolyamines such as tetraethylenepentamine; 1,4-diaminocyclohexane, 1,3-diaminocyclohexane, 1,3-diaminomethylcyclohexane, 1,2-diaminocyclohexane, 1,4-diamino -3,6-diethylcyclohexane, 4,4'-diaminodicyclohexylmethane, 1,3-bis (aminomethyl) cyclohexane, 1,4-bis (aminomethyl) cyclohexane, 4,4'-diaminodicyclohexylpropane, bis ( 4-Adipic acid dihydric acid) sulfone, 4,4'-diaminodicyclohexyl ether, 2,2'-dimethyl-4,4'-diaminodicyclohexylmethane, isophorone
  • phenol-based curing agent examples include phenol novolac resin, cresol novolac resin, aromatic hydrocarbon formaldehyde resin-modified phenol resin, dicyclopentadienephenol-added resin, phenol aralkyl resin (Zyroc resin), naphthol aralkyl resin, and trisphenylol.
  • polyhydric phenol compounds such as ring-modified novolak resin (polyhydric phenol compound in which a phenol core and an alkoxy group-containing aromatic ring are linked with formaldehyde).
  • Examples of the acid anhydride-based curing agent include hymic anhydride, phthalic anhydride, maleic anhydride, methyl hymic anhydride, succinic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, and methyl anhydride.
  • Hexahydrophthalic anhydride, trialkyltetrahydrophthalic anhydride-maleic anhydride adduct, benzophenone tetracarboxylic acid anhydride, trimellitic anhydride, pyromellitic anhydride, hydride methylnadic acid anhydride and the like can be mentioned.
  • polythiol compound examples include pentaerythritol tetrakis (3-mercaptopropionate), pentaerythritol tetrakis (thioglycolate), dipentaerythritol hexakis (3-mercaptopropionate), and dipentaerythritol hexakis (3-mercaptopropionate).
  • Examples of commercially available products of these polythiol compounds include TS-G manufactured by Shikoku Chemicals Corporation, DPMP and PEMP manufactured by SC Organic Chemistry Co., Ltd., and PETG manufactured by Yodo Chemical Co., Ltd.
  • TS-G manufactured by Shikoku Chemicals Corporation
  • DPMP and PEMP manufactured by SC Organic Chemistry Co., Ltd.
  • PETG manufactured by Yodo Chemical Co., Ltd.
  • Examples of the amine-based latent curing agent include dihydrazide oxalate, dihydrazide malonic acid, dihydrazide succinate, dihydrazide glutarate, dihydrazide adipate, dihydrazide suberic acid, dihydrazide azelaine, dihydrazide sevacinate, and dihydrazide phthalate.
  • Basic acid dihydrazide guanamines such as benzoguanamine and acetoguanamine; dicyandiamide; melamine; dehydration condensates of amine compounds and carboxylic acids, additions of amine compounds and epoxy compounds, additions of amine compounds and isocyanate compounds, amine compounds Examples thereof include a Michael adduct, a Mannig reaction product of an amine compound, a condensate of an amine compound and urea, and a modified amine such as a condensate of an amine compound and a ketone.
  • amine-based latent curing agents those obtained by adducting an amine compound having one or more active hydrogens and a polyepoxy compound and / or a polyisocyanate compound, or a combination thereof with a phenol resin are preferable. Be done.
  • Examples of the amine compound having one or more active hydrogens include ethylenediamine, 1,2-diaminopropane, 1,3-diaminopropane, 1,3-diaminobutane, 1,4-diaminobutane, and hexamethylenediamine.
  • Alkylenediamines such as diethylenetriamine, triethylenetriamine, tetraethylenepentamine; 1,4-diaminocyclohexane, 1,3-diaminocyclohexane, 1,3-diaminomethylcyclohexane, 1,2-diaminocyclohexane, 1,4-diamino-3,6-diethylcyclohexane, 4,4'-diaminodicyclohexylmethane, 1,3-bis (aminomethyl) cyclohexane, 1,4-bis (aminomethyl) cyclohexane, 4,4'-diamino Adicyclic polyamines such as dicyclohexylpropane, bis (4-aminocyclohexyl) sulfone, 4,4'-diaminodicyclohexyl ether, 2,2'-dimethyl-4,4'-
  • polyepoxy compound examples include polyglycidyl ether compounds of mononuclear polyvalent phenol compounds such as hydroquinone, resorcin, pyrocatechol, and fluoroglucolcinol; dihydroxynaphthalene, biphenol, methylenebisphenol (bisphenol F), and methylenebis (orthocresol).
  • mononuclear polyvalent phenol compounds such as hydroquinone, resorcin, pyrocatechol, and fluoroglucolcinol
  • dihydroxynaphthalene biphenol, methylenebisphenol (bisphenol F), and methylenebis (orthocresol).
  • Echiliden bisphenol isopropyridene bisphenol (bisphenol A), isopropyridene bis (orthocresol), tetrabromobisphenol A, 1,3-bis (4-hydroxycumylbenzene), 1,4-bis (4-hydroxycumyl) Benzene), 1,1,3-tris (4-hydroxyphenyl) butane, 1,1,2,2-tetra (4-hydroxyphenyl) ethane, thiobisphenol, sulfonylbisphenol, oxybisphenol, phenol novolac, orthocresol novolac Polyglycidyl ether compounds of polynuclear polyvalent phenolic compounds such as ethylphenol novolac, butylphenol novolac, octylphenol novolac, resorcinnovolac, terpenphenol; ethylene glycol, propylene glycol, butylene glycol, hexanediol, polyglycol, thiodiglycol,
  • polyisocyanate compound examples include 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, diphenylmethane-4,4'-diisocyanate, phenylenedi isocyanate, xylylene diisocyanate, tetramethylxylylene diisocyanate, 1,5.
  • -Aromatic diisocyanates such as naphthylene diisocyanate, 1,5-tetrahydronaphthalenedisocyanate, 3,3'-dimethyldiphenyl-4,4'-diisocyanate, dianisidine diisocyanate, tetramethylxylylene diisocyanate; isophorone diisocyanate, dicyclohexylmethane-4 , 4'-Diisocyanate, trans-1,4-cyclohexyldiisocyanate, norbornene diisocyanate and other alicyclic diisocyanates; tetramethylene diisocyanate, 1,6-hexamethylene diisocyanate, 2,2,4 and / or (2,4,4) )-Adicyclic diisocyanates such as trimethylhexamethylene diisocyanate and lysine diisocyanate; isocyanurate trimersides, burette trimerates, trimethylolpropane
  • diisocyanates triphenylmethane triisocyanates, 1-methylbenzol- Examples thereof include 2,4,6-triisocyanate and dimethyltriphenylmethanetetraisocyanate.
  • isocyanate compounds may be used in the form of carbodiimide modification, isocyanurate modification, biuret modification or the like, or may be used in the form of blocked isocyanate blocked by various blocking agents.
  • phenol resin examples include phenol novolac resin, cresol novolac resin, aromatic hydrocarbon formaldehyde resin-modified phenol resin, dicyclopentadienephenol-added resin, phenol aralkyl resin (Zyroc resin), naphthol aralkyl resin, and trisphenylol methane.
  • Resin tetraphenylol ethane resin, naphthol novolac resin, naphthol-phenol co-condensed novolac resin, naphthol-cresol co-condensed novolac resin, biphenyl-modified phenol resin (polyhydric phenol compound in which phenol nuclei are linked by bismethylene groups), biphenyl-modified Naftor resin (a polyvalent naphthol compound in which a phenol nucleus is linked with a bismethylene group), aminotriazine-modified phenol resin (a compound having a phenol skeleton, a triazine ring and a primary amino group in its molecular structure), and an alkoxy group-containing aromatic ring.
  • polyhydric phenol compounds such as modified novolak resins (polyhydric phenol compounds in which a phenol core and an alkoxy group-containing aromatic ring are linked with formaldehyde).
  • ADEKA Hardener EH-3636S manufactured by ADEKA Corporation; dicyandiamide type latent curing agent
  • ADEKA Hardener EH-4351S manufactured by ADEKA Corporation; dicyandiamide type latent curing agent
  • ADEKA Hardener EH-5011S (manufactured by ADEKA Corporation; imidazole type latent curing agent), ADEKA Hardener EH-5046S (manufactured by ADEKA Corporation; imidazole type latent curing agent), ADEKA Hardener EH-4357S (ADEKA Corporation) Made by Polyamine type latent curing agent), ADEKA Hardener EH-5057P (manufactured by ADEKA Corporation; Polyamine type latent curing agent), ADEKA Hardener EH-5057PK (made by ADEKA Corporation; Polyamine type latent curing agent), Amicure PN -23 (Ajinomoto Fine Techno Co., Ltd .; Amin Adduct-based latent curing agent), Amicure PN-40 (Ajinomoto Fine Techno Co., Ltd .; Amin Adduct-based latent curing agent), Amicure VDH (Ajinomoto Fine Techno Co., Ltd .; Hydrazide-based latent harden
  • the amount of the curing agent used as the component (B) used in the present invention is not particularly limited, but the amount of the component (A) and the epoxy group and / or other compound having a reactive unsaturated bond is used. It is 1 to 100 parts by mass, preferably 2 to 50 parts by mass with respect to 100 parts by mass in total.
  • a curing catalyst can be used in combination with the curing agent as the component (B), and the curing catalyst includes, for example, a phosphine compound such as triphenylphosphine; tetraphenylphospho.
  • Phosphonium salts such as nium bromide; 2-methylimidazole, 2-phenylimidazole, 2-ethyl-4-methylimidazole, 2-undecyl imidazole, 1-cyanoethyl-2-methyl imidazole, 1- ⁇ 3-[(3- Trimethoxysilyl) propylaminocarbonylamino] propyl ⁇ -2-methylimidazole, 1- [3-trimethoxysilylpropylaminomethyl] -4-methylimidazole, 1- [3- (trimethoxysilylpropyl)] imidazole, 1 -[3- (Trimethoxysilylpropyl)] imidazoles such as imidazole; imidazole salts which are salts of the imidazoles with trimellitic acid, isocyanuric acid, boron and the like; benzyldimethylamine, 2,4,6-tris Amines such as (dimethylaminomethyl)
  • the amount of the curing catalyst used is preferably 0.01 to 20 parts by mass with respect to 100 parts by mass in total of the component (A) and the epoxy group and / or other compound having a reactive unsaturated bond.
  • Examples of the polymerization initiator which is the component (B) used in the present invention include a thermal radical polymerization initiator, a photoradical polymerization initiator, and a cationic polymerization initiator.
  • the thermal radical polymerization initiator is not particularly limited as long as it generates radicals by heating, and conventionally known compounds can be used.
  • conventionally known compounds can be used.
  • azo compounds, peroxides, persulfates and the like are preferable. It can be exemplified as a thing.
  • azo compound examples include 2,2'-azobisisobutyronitrile, 2,2'-azobis (methylisobutyrate), 2,2'-azobis-2,4-dimethylvaleronitrile, 1, Examples thereof include 1'-azobis (1-acetoxy-1-phenylethane).
  • peroxide examples include benzoyl peroxide, di-t-butylbenzoyl peroxide, t-butylperoxypivalate, and di (4-t-butylcyclohexyl) peroxydicarbonate.
  • persulfate examples include persulfates such as ammonium persulfate, sodium persulfate and potassium persulfate.
  • the photoradical polymerization initiator is not particularly limited as long as it generates radicals by light irradiation, and conventionally known compounds can be used.
  • a thioxanthone-based compound, an oxime ester-based compound, and the like can be exemplified as preferable ones.
  • acetophenone compound examples include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 4'-isopropyl-2-hydroxy-2-methylpropiophenone, and 2-hydroxymethyl.
  • benzyl compound examples include benzyl and the like.
  • benzophenone compound examples include benzophenone, methyl o-benzoylbenzoate, Michler ketone, 4,4'-bisdiethylaminobenzophenone, 4,4'-dichlorobenzophenone, 4-benzoyl-4'-methyldiphenylsulfide and the like. Be done.
  • thioxanthone-based compound examples include thioxanthone, 2-methylthioxanthone, 2-ethylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, 2,4-diethylthioxanthone and the like.
  • the oxime ester-based compound means a compound having an oxime ester group, and since it has good sensitivity among the photoradical polymerization initiators, it can be preferably used in the curable composition of the present invention.
  • a compound having a carbazole skeleton, a diphenylsulfide skeleton, and a fluorene skeleton is more preferable than the curable composition of the present invention because of its particularly high sensitivity.
  • radical polymerization initiators include phosphine oxide compounds such as 2,4,6-trimethylbenzoyldiphenylphosphine oxide and bis (cyclopentadienyl) -bis [2,6-difluoro-3- (pill-1). -Il)] Titanosen-based compounds such as titanium can be mentioned.
  • radical polymerization initiators include ADEKA PUTMER N-1414, N-1717, N-1919, ADEKA ARCLUS NCI-831, NCI-930 (all manufactured by ADEKA); IRGACURE184, IRGACURE369, IRGACURE651, IRGACURE907, IRGACURE.
  • OXE 01, IRGACURE OXE 02, IRGACURE784 aboveve, manufactured by BASF
  • TR-PBG-304, TR-PBG-305, TR-PBG-309 and TR-PBG-314 aboveve, manufactured by Trolly; and the like.
  • the cationic polymerization initiator may be any compound as long as it can release a substance that initiates cationic polymerization by irradiation with energy rays or heating, but is preferably Lewis acid by irradiation with energy rays. It is a double salt that is an onium salt that releases energy, or a derivative thereof. Typical examples of such compounds include the following general formulas. [A] r + [B] r- The salts of cations and anions represented by are given.
  • the cation [A] r + is preferably onium, and its structure is, for example, the following general formula. [(R 12 ) a Q] r + Can be represented by.
  • R 12 is an organic group having 1 to 60 carbon atoms and may contain any number of atoms other than carbon atoms.
  • a is an integer from 1 to 5.
  • the a R 12s are independent and may be the same or different.
  • at least one is preferably an organic group as described above having an aromatic ring.
  • anion [B] r- is preferably a halide complex, and its structure is, for example, the following general formula. It can be represented by [LY b ] r-.
  • L is a metal or metalloid that is the central atom of the halide complex
  • B P, As, Sb, Fe, Sn, Bi, Al, Ca, In, Ti, Zn, Sc, V, Cr, Mn, Co and the like.
  • Y is a halogen atom.
  • b is an integer of 3 to 7.
  • anion [LY b ] r- of the above general formula include tetrakis (pentafluorophenyl) borate, tetra (3,5-difluoro-4-methoxyphenyl) borate, and tetrafluoroborate (BF 4 ) -,. hexafluorophosphate (PF 6) -, hexafluoroantimonate (SbF 6) -, hexafluoroarsenate (AsF 6) -, hexachloroantimonate (SbCl 6) -, and the like.
  • the anion [B] r- is the following general formula, [LY b-1 (OH)] r
  • the structure represented by is also preferably used. L, Y, and b are the same as above.
  • Other anions that can be used include perchlorate ion (ClO 4 ) - , trifluoromethyl sulfite ion (CF 3 SO 3 ) - , fluorosulfonic acid ion (FSO 3 ) - , and toluene sulfonic acid anion.
  • Trinitrobenzene sulfonic acid anion camphor sulphonate, nonafluorobutane sulphonate, hexadecafluorooctane sulphonate, tetraarylborate, tetrakis (pentafluorophenyl) borate and the like.
  • onium salts it is particularly effective to use the following aromatic onium salts (a) to (c). From these, one of them can be used alone, or two or more of them can be mixed and used.
  • Aryldiazonium salts such as phenyldiazonium hexafluorophosphate, 4-methoxyphenyldiazonium hexafluoroantimonate, 4-methylphenyldiazonium hexafluorophosphate and the like.
  • Diaryl such as diphenyliodonium hexafluoroantimonate, di (4-methylphenyl) iodonium hexafluorophosphate, di (4-tert-butylphenyl) iodonium hexafluorophosphate, trilucmil iodonium tetrakis (pentafluorophenyl) borate, etc.
  • Iodonium salt such as diphenyliodonium hexafluoroantimonate, di (4-methylphenyl) iodonium hexafluorophosphate, di (4-tert-butylphenyl) iodonium hexafluorophosphate, trilucmil iodonium tetrakis (pentafluorophenyl) borate, etc.
  • the amount of the polymerization initiator used is preferably 0.001 to 20 parts by mass with respect to 100 parts by mass in total of the component (A) and the epoxy group and / or other compound having a reactive unsaturated bond. By setting the content to 20 parts by mass or less, it is possible to suppress the influence on various physical properties such as the water absorption rate of the cured product and the strength of the cured product.
  • a sensitizer and a sensitizing aid can be used.
  • the sensitizer and the sensitizer aid include anthracene compounds and naphthalene compounds.
  • anthracene-based compound examples include 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 9,10-dipropoxyanthracene, 9,10-diisopropoxyanthracene, 9,10-dibutoxyanthracene, and 9.
  • naphthalene-based compound examples include 4-methoxy-1-naphthol, 4-ethoxy-1-naphthol, 4-propoxy-1-naphthol, 4-butoxy-1-naphthol, 4-hexyloxy-1-naphthol, and the like.
  • examples thereof include 1,4-dimethoxynaphthalene, 1-ethoxy-4-methoxynaphthalene, 1,4-diethoxynaphthalene, 1,4-dipropoxynaphthalene and 1,4-dibutoxynaphthalene.
  • the curable composition of the present invention is, if necessary, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, N- ( 2-Aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltriethoxysilane, N- (2-aminoethyl) -3-aminopropylmethyldiethoxysilane, N Aminosilanes such as-(2-aminoethyl) -8-aminooctyltrimethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, 3-triethoxysilyl-N- (1,3-dimethylbutylidene) propylamine Compounds; Mer
  • Reactive or non-reactive diluent plasticizer
  • glass fiber carbon fiber, cellulose, silica sand, cement, kaolin, clay, aluminum hydroxide, bentonite, talc, silica, fine powder silica, titanium dioxide, carbon black , Graphite, iron oxide, bituminous substance, etc.
  • fillers or pigments candelilla wax, carnauba wax, wood wax, ibotarou, mitsuro, lanolin, whale wax, montane wax, petroleum wax, fatty acid wax, fatty acid ester, fatty acid ether, Lubricants such as aromatic esters and aromatic ethers; thickeners; thixotropic agents; antioxidants; light stabilizers; ultraviolet absorbers; flame retardants; antifoaming agents; rust preventives; colloidal silica, colloidal alumina, etc.
  • Known additives may be contained, and adhesive resins such as xylene resin and petroleum resin can also be used in combination.
  • the curable composition of the present invention can be cured by light and heat by changing the types of the curing agent and the polymerization initiator as exemplified above or by using a plurality of them in combination.
  • a method can be adopted in which a photopolymerization initiator and a curing agent are used in combination, and after temporary curing by light irradiation, thermosetting is performed.
  • the curing may be insufficient or the cured product may be insufficiently cured.
  • the total amount of the compound having only the epoxy group or the compound having only the reactive unsaturated bond among the epoxy group and the reactive unsaturated bond is 100 parts by mass or less with respect to 100 parts by mass of the compound of the present invention. It is preferably 70 parts by mass or less, and more preferably 70 parts by mass or less.
  • the photopolymerization initiator is preferably a photoradical polymerization initiator.
  • the light to be irradiated may include light having a wavelength of 300 nm to 450 nm.
  • Light sources used for photocuring include low-pressure mercury lamps, medium-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, xenon lamps, metal halogen lamps, electron beam irradiators, X-ray irradiators, lasers (argon lasers, dye lasers, nitrogen lasers, etc.) LED, helium cadmium laser, etc.).
  • the heating temperature in the thermosetting may be any one as long as it can stably cure the composition, and is appropriately set according to the type of the curing agent and the like. For example, it is 10 ° C. or higher and 250 ° C. or lower. It is preferable that the temperature is 60 ° C. or higher and 200 ° C. or lower.
  • the cured product of the curable composition of the present invention is preferably a cured product obtained by heat-curing after photo-curing because of its excellent performance such as heat resistance.
  • the Applicant believes that this statement represents a condition. Even if this description specifies a product by a production method, it takes a lot of experimental time to specify a structure / property other than that described in the present specification for a cured product obtained by curing a curable compound under predetermined conditions. There are impossible and impractical circumstances because it requires.
  • the curable composition of the present invention can be used in a wide range of applications such as paints, adhesives, sealants, pressure-sensitive adhesives, coating agents, fiber sizing agents, building materials, and electronic parts.
  • applications such as paints, adhesives, sealants, pressure-sensitive adhesives, coating agents, fiber sizing agents, building materials, and electronic parts.
  • it since it has excellent curability by light and heat, it can be used in applications where dual curing is possible. That is, it can be suitably used for applications such as a liquid sealant, a liquid adhesive, a liquid crystal sealant, and an adhesive for a camera module.
  • Example 1 Production of compound 1-1a 386.9 g (2.8 mol) of p-hydroxyphenethyl alcohol and 1,295 g (14 mol) of epichlorohydrin are charged in a flask equipped with a reflux device, a stirrer, and a dropping device. , 221.7 g (0.95 mol) of a 48 mass% sodium hydroxide aqueous solution was placed in the dropping device. The aqueous sodium hydroxide solution was added dropwise over reflux at an internal temperature of 65 to 70 ° C. and a reduced pressure of 21 to 24 kPa over 2 hours, and at the same time, water was removed by an azeotropic upstream.
  • Example 2 Production of compound 1-2b 299.9 g (1.4 mol) of 2,4-dihydroxybenzophenone and 1,295 g (14 mol) of epichlorohydrin were placed in a flask equipped with a reflux device, a stirrer, and a dropping device. It was charged and heated at 50 ° C. After dropping 483.9 g of a 40 mass% potassium carbonate aqueous solution over 30 minutes, stirring was continued for 10 hours. After cooling, 490 g of water was added, the mixture was stirred for 30 minutes, and allowed to stand for 1 hour. The separated aqueous layer was extracted and deepichlorohydrin was performed. Then, 400 g of toluene was added and washed with water.
  • detoluene was performed to obtain 470 g of the following chlorohydrin compound 1-2b-1.
  • 500 g of toluene was added, and the mixture was heated to 60 ° C.
  • 32.6 g of solid sodium hydroxide was added in 5 portions (1 division / 20 minutes).
  • the reaction was continued for 5 hours at 60 ° C.
  • it was washed with water, the organic layer was dried over magnesium sulfate, and detoluene was carried out to obtain 98.7 g of the following ring-closed body 1-2b-2.
  • the epoxy equivalent of the ring closure 1-2b-2 is 290 g / eq. Met.
  • a flask equipped with a reflux device, a stirrer, and a dropping device 270 mg of the ring-closed body 1-2b-2 obtained above, 151 mg of triethylamine, and 2 mL of tetrahydrofuran (THF) were charged.
  • 150 mg of methacryloyl chloride was added dropwise over 3 minutes, and the mixture was stirred at room temperature for 6 hours.
  • 10 mL of chloroform was added to the reaction solution, and the mixture was washed with water until the aqueous layer became neutral. Dechloroform was performed to obtain 268 mg of the following compound 1-2b.
  • Compound 1-2b was liquid at 25 ° C.
  • the 1 H-NMR measurement result of the obtained compound is shown in FIG. NMR was measured using ECX-400 manufactured by JEOL Ltd. Deuterated chloroform was used as the measurement solvent.
  • the compound obtained by this production method can be suitably used for light and thermosetting as described later by the above-mentioned simple purification method, and it can be seen that this production method is advantageous.
  • Examples 3 to 6 and Comparative Example 1 The curable compositions of Examples 3 to 6 and Comparative Example 1 were prepared by mixing each component in the amounts shown in Table 1 below.
  • the curable composition prepared above was applied on a glass plate with a bar coater to a thickness of 300 ⁇ m to obtain a coating film.
  • a test piece photo-cured under the following curing conditions and a test piece photo-cured under the following curing conditions and then thermosetting were prepared, and the glass transition point (Tg) was measured. bottom.
  • Tg glass transition point
  • Photocuring Using J-Cure 1500CV manufactured by JATEC, an exposure amount of 3,000 mJ / cm 2 was irradiated and the curability was confirmed.
  • Thermosetting Heated in a heat circulation type oven at 100 ° C. ⁇ 1 h and 150 ° C. ⁇ 2 h.
  • Photocurability After light irradiation, those in which the coating film was sufficiently cured to form a mold-releasable coating film were evaluated as ⁇ , and those in which the coating film could not be peeled off due to insufficient curing were evaluated as x.
  • Physical characteristics of cured product The glass transition point (Tg) was measured using RSA manufactured by TA Instruments. As the test piece, a strip-shaped test piece having a width of 4 mm, a length of 60 mm, and a thickness of 300 ⁇ m was prepared.
  • Compound 1-1a Compound 1-2b obtained in Example 1: Compound PTBPGE obtained in Example 2: p-Triary butylphenol glycidyl ether 2-PEA: 2-Phenylethanol acrylate
  • Irg-184 Alkylphenone-based photopolymerization initiator manufactured by IGM Resins (omnirad184) 2E4MZ: Hardener manufactured by Shikoku Kasei Kogyo Co., Ltd. * 1: Not implemented * 2: Cannot be measured because the test piece could not be manufactured without curing.
  • the compound provided by the present invention can provide a curable composition that can be cured by light or heat.
  • the compound of the present invention can be cured by light and / or heat, and the curable composition obtained by containing the compound can be cured by light and heat. It can be used for applications such as adhesives, adhesives for camera modules, and liquid crystal sealants.

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Abstract

A compound represented by formula (1). (In the formula, R1 and R3 each independently represent a hydrogen atom or a methyl group, R2 represents a C1-10 alkyl group, a C1-10 alkoxy group, a halogen atom, a benzoyl group capable of having a substituent, or a benzyl group capable of having a substituent, and A1 represents a single bond or a C1-4 alkylene group. The substituent is a group selected from C1-10 alkyl groups, C1-10 alkoxy groups, or halogen atoms. However, when A1 is a single bond, an unsaturated ester group is located at the meta position with respect to a glycidyloxy group. n represents an integer of 0-4.)

Description

化合物、化合物の製造方法及び硬化性組成物Compounds, methods for producing compounds, and curable compositions
 本発明は化合物及びその製造方法に関し、詳しくは、反応性不飽和結合とエポキシ基とを有する硬化性化合物及びその製造方法に関するものであり、更に該硬化性化合物の少なくとも一種と、硬化剤及び重合開始剤の中から選ばれる少なくとも一種とを含有してなる硬化性組成物に関する。 The present invention relates to a compound and a method for producing the same, and more particularly to a curable compound having a reactive unsaturated bond and an epoxy group and a method for producing the same. Further, the present invention relates to at least one of the curable compounds, a curing agent and polymerization. The present invention relates to a curable composition comprising at least one selected from the initiators.
 近年、スマートフォン等の携帯機器の薄型化に伴い、スマートフォン等の携帯機器に搭載されるカメラモジュールは小型化されてきている。カメラモジュールの小型化により、カメラモジュールの構成部材同士を接合する部位も微細になってきているため、これらを接合する接着剤から形成される接着層には高い接着強度が要求される。 In recent years, as mobile devices such as smartphones have become thinner, camera modules mounted on mobile devices such as smartphones have become smaller. Due to the miniaturization of the camera module, the parts for joining the constituent members of the camera module are also becoming finer, so that the adhesive layer formed from the adhesive for joining these is required to have high adhesive strength.
 また、カメラモジュール等の組み立てに用いられる接着剤は、高温処理によるイメージセンサー等への熱的ダメージを避けるために低温硬化性が要求され、また、生産効率向上の観点から、短時間硬化性も同時に要求される。このような観点から、低温短時間硬化型接着剤として、紫外線硬化型接着剤や熱硬化エポキシ樹脂系接着剤が多く利用されている。しかし、紫外線硬化型接着剤は、速硬化が可能な反面、光が当たらない部分の接着には使用できない等のデメリットがある。一方、熱硬化エポキシ樹脂系接着剤は、低温短時間硬化型接着剤といえども、接着する間は接着姿勢を保つために接着する部材(部品)を治具や装置で固定しなければならず、また、加熱による温度上昇により粘度が低下して、硬化直前にタレが生じたり、所望部以外に流れてしまったり等の問題を生じ、必ずしも満足できるものではなかった。 In addition, the adhesive used for assembling camera modules and the like is required to have low-temperature curability in order to avoid thermal damage to the image sensor and the like due to high-temperature treatment, and also has short-time curability from the viewpoint of improving production efficiency. Required at the same time. From this point of view, ultraviolet curable adhesives and thermosetting epoxy resin adhesives are often used as low-temperature short-time curable adhesives. However, although the ultraviolet curable adhesive can be cured quickly, it has a demerit that it cannot be used for adhering a part that is not exposed to light. On the other hand, thermosetting epoxy resin-based adhesives, even low-temperature short-time curable adhesives, must be fixed with jigs or devices in order to maintain the bonding posture during bonding. In addition, the viscosity is lowered due to the temperature rise due to heating, causing problems such as sagging immediately before curing and flowing to a portion other than the desired portion, which is not always satisfactory.
 前記のような問題を解決するために、光照射による硬化(予備硬化)により仮固定し、熱によって更に硬化(本硬化)させて接着するタイプの接着剤が提案されている。例えば、特許文献1には、グリシジル基と(メタ)アクリロイル基とを有する化合物からなる硬化性成分、ポリチオール化合物及びエポキシ硬化促進剤を含有する光及び加熱硬化性組成物が提案されている。特許文献2には、(メタ)アクリロイル基を有する化合物、ポリチオール化合物、光ラジカル発生剤、潜在性硬化剤を含む硬化性組成物が提案されており、(メタ)アクリロイル基及びエポキシ基を有する化合物も記載されている。
 しかしながら、特許文献1及び2に記載されているエポキシ(メタ)アクリレートは、エポキシ樹脂のエポキシ基と(メタ)アクリル酸との反応により得られる化合物であり、製造時に未反応のエポキシ樹脂が残存する等して複数種の化合物の混合物となり、粘度が高くなる傾向があったり、光及び熱による硬化システムに適用するには満足できるものではなかった。
In order to solve the above-mentioned problems, an adhesive of a type that is temporarily fixed by curing by light irradiation (pre-curing) and further cured (mainly cured) by heat to be bonded has been proposed. For example, Patent Document 1 proposes a light and heat-curable composition containing a curable component composed of a compound having a glycidyl group and a (meth) acryloyl group, a polythiol compound, and an epoxy curing accelerator. Patent Document 2 proposes a curable composition containing a compound having a (meth) acryloyl group, a polythiol compound, a photoradical generator, and a latent curing agent, and a compound having a (meth) acryloyl group and an epoxy group. Is also described.
However, the epoxy (meth) acrylate described in Patent Documents 1 and 2 is a compound obtained by reacting the epoxy group of the epoxy resin with (meth) acrylic acid, and an unreacted epoxy resin remains at the time of production. As a result, it becomes a mixture of a plurality of kinds of compounds, which tends to increase the viscosity, and is not satisfactory for application to a curing system by light and heat.
特開2009-51954号公報Japanese Unexamined Patent Publication No. 2009-51954 WO2018/181421WO2018 / 181421
 したがって本発明の目的は、未反応物の除去の手間が少なく工業的に有利な方法にて製造でき、光及び熱による硬化が可能な化合物を提供すること、また、光及び熱による硬化性に優れた封止剤あるいは接着剤を提供することのできる硬化性組成物を提供することである。 Therefore, an object of the present invention is to provide a compound which can be produced by an industrially advantageous method with less labor for removing unreacted substances and can be cured by light and heat, and can be cured by light and heat. It is to provide a curable composition which can provide an excellent sealant or adhesive.
 即ち、本発明は、下記一般式(1)で表される化合物を提供するものである。 That is, the present invention provides a compound represented by the following general formula (1).
Figure JPOXMLDOC01-appb-C000010
(式中、R1及びR3はそれぞれ独立して水素原子又はメチル基を表し、R2は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基、ハロゲン原子、置換基を有することのできるベンゾイル基又は置換基を有することのできるベンジル基を表し、A1は単結合又は炭素原子数1~4のアルキレン基を表す。前記置換基は、炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基である。
 但し、A1が単結合の場合には、式(1)中のベンゼン環において、下記式(1α)で表される不飽和エステル基が、下記式(1β)で表されるグリシジルオキシ基に対してメタ位に位置するものである。nは0~4の数を表す。)
Figure JPOXMLDOC01-appb-C000011
(式中の符号の定義は式(1)と同じである。*は結合手である。)
Figure JPOXMLDOC01-appb-C000010
(In the formula, R 1 and R 3 independently represent a hydrogen atom or a methyl group, respectively, and R 2 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a halogen atom, and a substituent. Represents a benzoyl group capable of having or a benzyl group capable of having a substituent, and A 1 represents a single bond or an alkylene group having 1 to 4 carbon atoms. The substituent represents 1 to 10 carbon atoms. It is a group selected from an alkyl group, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom.
However, when A 1 is a single bond, the unsaturated ester group represented by the following formula (1α) becomes a glycidyloxy group represented by the following formula (1β) in the benzene ring in the formula (1). On the other hand, it is located in the meta position. n represents a number from 0 to 4. )
Figure JPOXMLDOC01-appb-C000011
(The definition of the sign in the equation is the same as in equation (1). * Is a bond.)
 また本発明は、下記一般式(1-1-1)で表される化合物のフェノール性水酸基をグリシジルエーテル化した後で、得られる化合物におけるA2に結合したアルコール性水酸基をアクリル酸エステル又はメタアクリル酸エステルを用いてエステル化する、下記一般式(1-1)で表される化合物の製造方法を提供する。
Figure JPOXMLDOC01-appb-C000012
(式中、R4は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基を表し、A2は炭素原子数1~4のアルキレン基を表す。mは0~4の数を表す。)
Figure JPOXMLDOC01-appb-C000013
(式中、R101及びR103はそれぞれ独立して水素原子又はメチル基を表し、R4は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基を表し、A2は炭素原子数1~4のアルキレン基を表す。mは0~4の数を表す。)
Further, in the present invention, after the phenolic hydroxyl group of the compound represented by the following general formula (1-1-1) is glycidyl etherified, the alcoholic hydroxyl group bonded to A 2 in the obtained compound is an acrylic acid ester or meta. Provided is a method for producing a compound represented by the following general formula (1-1), which is esterified using an acrylic acid ester.
Figure JPOXMLDOC01-appb-C000012
(In the formula, R 4 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a group selected from halogen atoms, and A 2 is an alkylene group having 1 to 4 carbon atoms. Represents. M represents a number from 0 to 4.)
Figure JPOXMLDOC01-appb-C000013
(In the formula, R 101 and R 103 independently represent a hydrogen atom or a methyl group, and R 4 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom. Represents the group to be selected, A 2 represents an alkylene group having 1 to 4 carbon atoms, and m represents a number of 0 to 4).
 また本発明は、下記一般式(1-2-1)で表される水酸基を2個有する化合物において、R5で置換されていてもよいベンゾイル基に対してパラ位に位置する水酸基をグリシジルエーテル化した後で、前記ベンゾイル基に対してオルト位に位置する水酸基をアクリル酸エステル化又はメタアクリル酸エステル化する、下記式(1-2)で表される化合物の製造方法を提供する。
Figure JPOXMLDOC01-appb-C000014
(式中、R5は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基を表す。pは0~5の数を表す。)
Figure JPOXMLDOC01-appb-C000015
(式中、R201及びR203はそれぞれ独立して水素原子又はメチル基を表し、R5は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基を表す。pは0~5の数を表す。)
Further, in the present invention, in a compound having two hydroxyl groups represented by the following general formula (1-2-1), the hydroxyl group located at the para position with respect to the benzoyl group which may be substituted with R 5 is glycidyl ether. Provided is a method for producing a compound represented by the following formula (1-2), in which the hydroxyl group located at the ortho position with respect to the benzoyl group is esterified or methacrylic acid esterified after the conversion.
Figure JPOXMLDOC01-appb-C000014
(In the formula, R 5 represents a group selected from an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom. P represents a number from 0 to 5.)
Figure JPOXMLDOC01-appb-C000015
(In the formula, R 201 and R 203 independently represent a hydrogen atom or a methyl group, and R 5 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom. Represents the group to be selected. P represents a number from 0 to 5.)
 また、本発明は、(A)下記一般式(1)で表される化合物の少なくとも一種と、(B)硬化剤及び重合開始剤の中から選ばれる少なくとも一種とを含有してなる硬化性組成物を提供するものである。 Further, the present invention has a curable composition containing (A) at least one compound represented by the following general formula (1) and (B) at least one selected from a curing agent and a polymerization initiator. It provides things.
Figure JPOXMLDOC01-appb-C000016
(式中、R1及びR3はそれぞれ独立して水素原子又はメチル基を表し、R2は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基、ハロゲン原子、置換基を有することのできるベンゾイル基又は置換基を有することのできるベンジル基を表し、A1は単結合又は炭素原子数1~4のアルキレン基を表す。前記置換基は、炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基である。
 但し、A1が単結合の場合には、式(1)中のベンゼン環において、下記式(1α)で表される不飽和エステル基が、下記式(1β)で表されるグリシジルオキシ基に対してメタ位に位置するものである。nは0~4の数を表す。)
Figure JPOXMLDOC01-appb-C000017
(式中の符号の定義は式(1)と同じである。*は結合手である。)
Figure JPOXMLDOC01-appb-C000016
(In the formula, R 1 and R 3 independently represent a hydrogen atom or a methyl group, respectively, and R 2 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a halogen atom, and a substituent. Represents a benzoyl group capable of having or a benzyl group capable of having a substituent, and A 1 represents a single bond or an alkylene group having 1 to 4 carbon atoms. The substituent represents 1 to 10 carbon atoms. It is a group selected from an alkyl group, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom.
However, when A 1 is a single bond, the unsaturated ester group represented by the following formula (1α) becomes a glycidyloxy group represented by the following formula (1β) in the benzene ring in the formula (1). On the other hand, it is located in the meta position. n represents a number from 0 to 4. )
Figure JPOXMLDOC01-appb-C000017
(The definition of the sign in the equation is the same as in equation (1). * Is a bond.)
 また、本発明は前記硬化性組成物を光により硬化させた後、熱により硬化させてなる硬化物の製造方法を提供するものである。 Further, the present invention provides a method for producing a cured product obtained by curing the curable composition with light and then heat.
 更に、本発明は前記硬化性組成物を光及び熱により硬化してなる硬化物を提供するものである。 Furthermore, the present invention provides a cured product obtained by curing the curable composition with light and heat.
 本発明によって提供される化合物は、光及び熱により硬化させる材料として好適なものであり、本発明により提供される硬化性組成物は、光硬化性に優れ、熱硬化性に優れることから、光によって仮硬化し、その後熱によって本硬化を行うデュアル硬化を実施することができる。これらの特性から、液状封止剤、液状接着剤、カメラモジュール用接着剤、液晶シール剤等の用途に使用することができるものである。
 また、式(1-1)で表される化合物を製造する上記製造方法には、過剰なエポキシ樹脂を用いる必要がないため未反応物の除去の手間が少なく簡便な精製方法にて光及び/又は熱硬化に用いることができる利点がある。また式(1-1-1)を基質に式(1-1)で表される化合物を製造する製造方法には、塩化アクリロイル等の(メタ)アクリル酸クロリドを用いる方法と、アクリル酸エステル等の(メタ)アクリル酸エステルを用いる方法とが挙げられるが、前者では反応に伴い発生する塩酸とエポキシ基と副反応を生じる可能性がある。このため、(メタ)アクリル酸エステルを用いることで、上記副反応を抑制することが可能となる。
 また、式(1-2)で表される化合物を製造する上記製造方法には、過剰なエポキシ樹脂を用いる必要がないため未反応物の除去の手間が少なく、簡便な精製方法にて光及び/又は熱硬化に用いることができる利点がある。
The compound provided by the present invention is suitable as a material to be cured by light and heat, and the curable composition provided by the present invention is excellent in photocurability and thermosetting. It is possible to carry out dual curing in which temporary curing is performed by heat and then main curing is performed by heat. Due to these characteristics, it can be used in applications such as liquid encapsulants, liquid adhesives, adhesives for camera modules, and liquid crystal sealants.
In addition, since it is not necessary to use an excess epoxy resin in the above-mentioned production method for producing the compound represented by the formula (1-1), it is not necessary to remove unreacted substances, and a simple purification method can be used for light and / /. Alternatively, it has the advantage that it can be used for thermosetting. Further, as a production method for producing a compound represented by the formula (1-1) using the formula (1-1-1) as a substrate, a method using a (meth) acrylic acid chloride such as acryloyl chloride, an acrylic acid ester or the like, etc. There is a method using the (meth) acrylic acid ester of the above, but in the former, there is a possibility that a side reaction may occur with the hydrochloric acid and the epoxy group generated by the reaction. Therefore, by using a (meth) acrylic acid ester, it is possible to suppress the above side reaction.
Further, in the above-mentioned production method for producing the compound represented by the formula (1-2), it is not necessary to use an excess epoxy resin, so that it takes less time to remove unreacted substances, and light and a simple purification method can be used. / Or has the advantage that it can be used for thermosetting.
図1は、実施例1で得られた化合物の1H-NMRの測定結果である。 FIG. 1 is a 1 H-NMR measurement result of the compound obtained in Example 1. 図2は、実施例2で得られた化合物の1H-NMRの測定結果である。 FIG. 2 shows the measurement results of 1 H-NMR of the compound obtained in Example 2.
 以下、本発明の化合物について詳細に説明する。 Hereinafter, the compound of the present invention will be described in detail.
 本発明の前記式(1)で表される化合物は、前記に示した通り、グリシジルエーテル基(「グリシジルオキシ基」とよばれることもある。)と反応性不飽和結合とを有するものであるため、各種硬化剤、各種重合開始剤と併用することによって光及び/又は熱により硬化物を提供することが可能である。なお、反応性不飽和結合は、エチレン性不飽和結合とも呼ばれることがある。 As shown above, the compound represented by the formula (1) of the present invention has a glycidyl ether group (sometimes called a "glycidyloxy group") and a reactive unsaturated bond. Therefore, it is possible to provide a cured product by light and / or heat by using it in combination with various curing agents and various polymerization initiators. The reactive unsaturated bond may also be referred to as an ethylenically unsaturated bond.
 前記一般式(1)中、R2で表される炭素原子数1~10のアルキル基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、第二ブチル基、第三ブチル基、アミル基、イソアミル基、第三アミル基、ヘキシル基、ヘプチル基、オクチル基、2-エチルヘキシル基、ノニル基、イソノニル基、デシル基、イソデシル基等が挙げられる。 In the general formula (1) , examples of the alkyl group having 1 to 10 carbon atoms represented by R 2 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group and a second butyl group. , Tertiary butyl group, amyl group, isoamyl group, tertiary amyl group, hexyl group, heptyl group, octyl group, 2-ethylhexyl group, nonyl group, isononyl group, decyl group, isodecyl group and the like.
 前記一般式(1)中、R2で表される炭素原子数1~10のアルコキシ基としては、例えば、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基、アミロキシ基、ヘキシロキシ基、ペンチロキシ基、オクチロキシ基、ノニルオキシ基、デシルオキシ基等が挙げられる。 In the general formula (1) , examples of the alkoxy group having 1 to 10 carbon atoms represented by R 2 include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, an amyroxy group, a hexyloxy group, a pentyroxy group and an octyloxy group. Examples include a group, a nonyloxy group, a decyloxy group and the like.
 前記一般式(1)中、R2で表されるハロゲン原子としては、例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられる。 In the general formula (1) , examples of the halogen atom represented by R 2 include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
 前記一般式(1)中、R2で表されるベンゾイル基又はベンジル基の置換基としての炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基、ハロゲン原子としては、R2に用いられる炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基、ハロゲン原子として前述した基を用いることができる。 In the general formula (1), the alkyl group having 1 to 10 carbon atoms as the substituent of the benzoyl group or the benzyl group represented by R 2, the alkoxy group having 1 to 10 carbon atoms, and the halogen atom are R. The above-mentioned groups can be used as the alkyl group having 1 to 10 carbon atoms, the alkoxy group having 1 to 10 carbon atoms, and the halogen atom used in 2.
 前記一般式(1)中、A1で表される炭素原子数1~4のアルキレン基としては、例えば、メチレン基、エチレン基、プロピレン基、イソプロピレン基、ブチレン基、イソブチレン基、エチリデン基、プロピリデン基、イソプロピリデン基、ブチリデン基等が挙げられる。 In the general formula (1) , examples of the alkylene group having 1 to 4 carbon atoms represented by A 1 include a methylene group, an ethylene group, a propylene group, an isopropylene group, a butylene group, an isobutylene group and an ethylidene group. Examples thereof include a propyridene group, an isopropylidene group and a butylidene group.
 前記一般式(1)で表される化合物の中でも、A1が炭素原子数1~4のアルキレン基である場合には、nが0であるか或いはR2が炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基、ハロゲン原子又は置換基を有することのできるベンジル基であることが好ましく、nが0であるか或いはR2が炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子であることがより好ましい。またA1が単結合である場合にはnが1であり、R2は置換基を有することができるベンゾイル基であり、当該ベンゾイル基が上記式(1β)で表されるグリシジルオキシ基に対してパラ位に位置していることが好ましい。これらの場合、前記一般式(1)で表される化合物をより容易に製造できるからである。とりわけ、下記一般式(1-1)又は(1-2)で表される化合物が、容易に製造することが可能であり、各種硬化剤及び/又は各種重合開始剤を併用することで、光及び熱による硬化性に優れるため好ましい。 Among the compounds represented by the general formula (1), when A 1 is an alkylene group having 1 to 4 carbon atoms, n is 0 or R 2 is an alkyl having 1 to 10 carbon atoms. A group, an alkoxy group having 1 to 10 carbon atoms, a halogen atom or a benzyl group capable of having a substituent, preferably an alkyl group in which n is 0 or R 2 is 1 to 10 carbon atoms. It is more preferably an alkoxy group or a halogen atom having 1 to 10 carbon atoms. Further, when A 1 is a single bond, n is 1, and R 2 is a benzoyl group capable of having a substituent, and the benzoyl group is relative to the glycidyloxy group represented by the above formula (1β). It is preferable that it is located in the para position. In these cases, the compound represented by the general formula (1) can be produced more easily. In particular, the compound represented by the following general formula (1-1) or (1-2) can be easily produced, and by using various curing agents and / or various polymerization initiators in combination, light It is preferable because it has excellent curability by heat.
Figure JPOXMLDOC01-appb-C000018
(式中、R101及びR103はそれぞれ独立して水素原子又はメチル基を表し、R4は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基を表し、A2は炭素原子数1~4のアルキレン基を表す。mは0~4の数を表す。)
Figure JPOXMLDOC01-appb-C000018
(In the formula, R 101 and R 103 independently represent a hydrogen atom or a methyl group, and R 4 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom. Represents the group to be selected, A 2 represents an alkylene group having 1 to 4 carbon atoms, and m represents a number of 0 to 4).
Figure JPOXMLDOC01-appb-C000019
(式中、R201及びR203はそれぞれ独立して水素原子又はメチル基を表し、R5は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基を表す。pは0~5の数を表す。)
Figure JPOXMLDOC01-appb-C000019
(In the formula, R 201 and R 203 independently represent a hydrogen atom or a methyl group, and R 5 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom. Represents the group to be selected. P represents a number from 0 to 5.)
 前記式(1-1)中、R4で表される炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基及びハロゲン原子としては、前記R2で表される炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基及びハロゲン原子としてそれぞれ上記で例示した基が挙げられる。
 前記式(1-1)中、A2で表される炭素原子数1~4のアルキレン基としては、前記A1として例示された炭素原子数1~4のアルキレン基として上記で例示した基が挙げられる。
 前記式(1-2)中、R5で表される炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基及びハロゲン原子としては、R2で表される炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基及びハロゲン原子としてそれぞれ上記で例示した基が挙げられる。
In the above formula (1-1), the alkyl group having 1 to 10 carbon atoms represented by R 4 and the alkoxy group having 1 to 10 carbon atoms and the halogen atom have the number of carbon atoms represented by R 2. Examples of the alkyl group of 1 to 10, the alkoxy group having 1 to 10 carbon atoms, and the halogen atom include the groups exemplified above.
In the above formula (1-1), as the alkylene group having 1 to 4 carbon atoms represented by A 2 , the group exemplified above as the alkylene group having 1 to 4 carbon atoms exemplified as A 1 is used. Can be mentioned.
In the above formula (1-2), the alkyl group having 1 to 10 carbon atoms represented by R 5 , the alkoxy group having 1 to 10 carbon atoms, and the halogen atom have 1 carbon atom represented by R 2. Examples of the alkyl group to 10, the alkoxy group having 1 to 10 carbon atoms, and the halogen atom include the groups exemplified above.
 本発明の化合物が前記式(1-1)で表される場合、A2としては、特にエチレン基であることが原料入手容易性の点で最も好ましい。 When the compound of the present invention is represented by the above formula (1-1), it is most preferable that A 2 is an ethylene group in terms of availability of raw materials.
 本発明の化合物が前記式(1-1)で表される場合、A2はグリシジルオキシ基に対してパラ位又はメタ位に位置することが化合物の製造容易性の点で好ましく、特にパラ位に位置することが好ましい。 When the compound of the present invention is represented by the above formula (1-1), it is preferable that A 2 is located at the para-position or the meta-position with respect to the glycidyloxy group in terms of ease of producing the compound, particularly at the para-position. It is preferably located at.
 本発明の化合物が前記式(1-1)で表される場合、原料容易性の点から、mは3以下であることが好ましく、2以下であることが更に好ましく、1以下であることが特に好ましく、0である、つまり、式(1-1)のベンゼン環に、グリシジルオキシ基とA2を有する不飽和エステル基と水素原子のみが結合していることが最も好ましい。
 また式(1-1)で表される化合物はmが1以上である場合、R4が炭素原子数1~5のアルキル基、炭素原子数1~5のアルコキシ基、又はハロゲン原子であることが原料の入手容易性の点から好ましく、炭素原子数1~2のアルキル基、炭素原子数1~2のアルコキシ基、又はハロゲン原子であることがより好ましい。なおmが2以上である場合、複数存在するR4は同一でも異なっていてもよい。
When the compound of the present invention is represented by the above formula (1-1), m is preferably 3 or less, more preferably 2 or less, and further preferably 1 or less, from the viewpoint of ease of raw materials. It is particularly preferable, that is, it is 0, that is, it is most preferable that only the unsaturated ester group having a glycidyloxy group and A 2 and a hydrogen atom are bonded to the benzene ring of the formula (1-1).
Further, in the compound represented by the formula (1-1), when m is 1 or more, R 4 is an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or a halogen atom. Is preferable from the viewpoint of availability of a raw material, and more preferably an alkyl group having 1 to 2 carbon atoms, an alkoxy group having 1 to 2 carbon atoms, or a halogen atom. When m is 2 or more, a plurality of R 4s may be the same or different.
 本発明の化合物が前記式(1-1)で表される場合、特に下記式(1-1A)で表される化合物であることが、上記で述べた観点から好ましい。 When the compound of the present invention is represented by the above formula (1-1), it is particularly preferable that the compound is represented by the following formula (1-1A) from the viewpoint described above.
Figure JPOXMLDOC01-appb-C000020
(式中、R101及びR103はそれぞれ独立して水素原子又はメチル基を表す。)
Figure JPOXMLDOC01-appb-C000020
(In the formula, R 101 and R 103 independently represent a hydrogen atom or a methyl group, respectively.)
 本発明の化合物が前記式(1-1)又は(1-1A)で表される場合、R101としては、水素原子であることが反応性不飽和結合の反応性が高くなる点で好ましい。
 またR103が水素原子であることが潜在性硬化剤との反応が早い点から好ましい。
 これらの点から、R101及びR103がいずれも水素原子であることは、硬化反応が早い点から好ましい。また25℃で液体となりやすく、作業性が向上する利点がある。
When the compound of the present invention is represented by the above formula (1-1) or (1-1A), it is preferable that R 101 is a hydrogen atom because the reactivity of the reactive unsaturated bond is high.
Further , it is preferable that R 103 is a hydrogen atom because the reaction with the latent curing agent is quick.
From these points, it is preferable that both R 101 and R 103 are hydrogen atoms from the viewpoint of quick curing reaction. Further, it tends to become a liquid at 25 ° C., which has an advantage of improving workability.
 本発明の化合物が前記式(1-2)で表されることは、エポキシ基の反応性が構造上高いので、熱硬化時の速度が速いという利点がある。また、光硬化による硬化物、及び光及び熱硬化による硬化物の耐熱性が比較的高いという利点もある。本発明の化合物が前記式(1-2)で表される場合、原料容易性の点から、pは4以下であることが好ましく、3以下であることが更に好ましく、2以下であることが特に好ましく、1以下であることが更に好ましく、0であることが最も好ましい。
 pが1以上である場合、R5が炭素原子数1~5のアルキル基、炭素原子数1~5のアルコキシ基、又はハロゲン原子であることが原料の入手容易性の点から好ましく、R5が炭素原子数1~2のアルキル基、炭素原子数1~2のアルコキシ基、又はハロゲン原子であることがより好ましい。なおpが2以上である場合、複数存在するR5は同一でも異なっていてもよい。
The fact that the compound of the present invention is represented by the above formula (1-2) has an advantage that the rate at the time of thermosetting is high because the reactivity of the epoxy group is structurally high. Further, there is an advantage that the heat resistance of the cured product by light curing and the cured product by light and heat curing is relatively high. When the compound of the present invention is represented by the above formula (1-2), p is preferably 4 or less, more preferably 3 or less, and 2 or less from the viewpoint of ease of raw materials. It is particularly preferable, it is more preferably 1 or less, and most preferably 0.
When p is 1 or more, it is preferable that R 5 is an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or a halogen atom from the viewpoint of availability of raw materials, and R 5 Is more preferably an alkyl group having 1 to 2 carbon atoms, an alkoxy group having 1 to 2 carbon atoms, or a halogen atom. When p is 2 or more, a plurality of R 5s may be the same or different.
 本発明の化合物が前記式(1-2)で表される場合、R201としては、水素原子であることが反応性不飽和結合の反応性が高くなる点で好ましい。R201がメチル基であることは硬化性組成物の保存安定性が向上し、硬化物物性が優れる点で好ましい。
 またR203が水素原子であることは潜在性硬化剤との反応が早い点で好ましい。
When the compound of the present invention is represented by the above formula (1-2), it is preferable that R 201 is a hydrogen atom in that the reactivity of the reactive unsaturated bond is high. It is preferable that R 201 is a methyl group because the storage stability of the curable composition is improved and the cured physical properties are excellent.
Further , it is preferable that R 203 is a hydrogen atom because it reacts quickly with a latent curing agent.
 以下、本発明の化合物の好適な製造方法を説明する。
 本製造方法は、水酸基を2個含有する化合物における2つの水酸基の違いを利用して一方の水酸基をグリシジルエーテル化した後、他方の水酸基を(メタ)アクリル酸エステル化することによって製造することができる。より具体的には、例えば、下記に示したような製造方法により製造することができる。
Hereinafter, a suitable method for producing the compound of the present invention will be described.
In this production method, one hydroxyl group is glycidyl etherified by utilizing the difference between the two hydroxyl groups in a compound containing two hydroxyl groups, and then the other hydroxyl group is (meth) acrylic acid esterified. can. More specifically, for example, it can be produced by the production method as shown below.
 前記式(1-1)で表される化合物は、下記式(1-1-1)で表される化合物のフェノール性水酸基をグリシジルエーテル化した後で、得られる化合物のアルコール性水酸基(A2で表されるアルキレン基に結合した水酸基)をアクリル酸エステル化又はメタアクリル酸エステル化することによって製造することができる。ここで、フェノール性水酸基とアルコール性水酸基では酸性度が異なるため、フェノール性水酸基のグリシジルエーテル化が優先的に進むものと考えられる。その後アルコール性水酸基をエステル化することで、式(1-1)で表される化合物を得ることができる。 The compound represented by the formula (1-1) is the alcoholic hydroxyl group (A 2 ) of the compound obtained after the phenolic hydroxyl group of the compound represented by the following formula (1-1-1) is glycidyl etherified. It can be produced by esterifying an acrylate or a methacrylic acid (a hydroxyl group bonded to an alkylene group represented by). Here, since the acidity of the phenolic hydroxyl group and the alcoholic hydroxyl group are different, it is considered that the glycidyl etherification of the phenolic hydroxyl group proceeds preferentially. Then, by esterifying the alcoholic hydroxyl group, the compound represented by the formula (1-1) can be obtained.
Figure JPOXMLDOC01-appb-C000021
(式中、R4は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基を表し、A2は炭素原子数1~4のアルキレン基を表す。mは0~4の数を表す。)
Figure JPOXMLDOC01-appb-C000021
(In the formula, R 4 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a group selected from halogen atoms, and A 2 is an alkylene group having 1 to 4 carbon atoms. Represents. M represents a number from 0 to 4.)
 前記式(1-2)で表される化合物は、例えば、下記式(1-2-1)で表される水酸基を2個有する化合物における、R5で置換されていてもよいベンゾイル基(式(1-2-1)における左側のベンゾイル基)に対してパラ位に位置する水酸基をグリシジルエーテル化した後で、該ベンゾイル基に対してオルト位に位置する水酸基をアクリル酸エステル化又はメタアクリル酸エステル化することにより製造することができる。ここで、前記ベンゾイル基に対してパラ位にある水酸基とオルト位にある水酸基とでは酸性度が異なるため、パラ位にある水酸基のグリシジルエーテル化が優先的に進むものと考えられる。その後オルト位にある水酸基をエステル化することにより、式(1-2)で表される化合物を得ることができる。 The compound represented by the formula (1-2) is, for example, a benzoyl group (formula ) which may be substituted with R 5 in the compound having two hydroxyl groups represented by the following formula (1-2-1). After glycidyl etherification of the hydroxyl group located at the para position with respect to the benzoyl group on the left side in (1-2-1), the hydroxyl group located at the ortho position with respect to the benzoyl group is acrylic acid esterified or methacrylic. It can be produced by acid esterification. Here, since the acidity of the hydroxyl group at the para position and the hydroxyl group at the ortho position are different with respect to the benzoyl group, it is considered that the glycidyl etherification of the hydroxyl group at the para position proceeds preferentially. Then, by esterifying the hydroxyl group at the ortho position, the compound represented by the formula (1-2) can be obtained.
Figure JPOXMLDOC01-appb-C000022
(式中、R5は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基を表す。pは0~5の数を表す。)
Figure JPOXMLDOC01-appb-C000022
(In the formula, R 5 represents a group selected from an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom. P represents a number from 0 to 5.)
 ここで前述した一方の水酸基をグリシジルエーテル化する方法としては、前記一般式(1-1-1)で表される化合物、前記一般式(1-2-1)で表される化合物等の水酸基を2個含有する化合物とエピハロヒドリンとの混合物に対してアルカリを添加して反応させる方法が挙げられる。アルカリの添加方法としては、アルカリ水溶液を滴下する方法及び固体のアルカリを好ましくは複数回に分けて添加する方法が挙げられる。 Here, as a method for converting one hydroxyl group into glycidyl ether, the hydroxyl group of the compound represented by the general formula (1-1-1), the compound represented by the general formula (1-2-1), or the like is used. There is a method of adding an alkali to a mixture of a compound containing two of the above and epihalohydrin to cause a reaction. Examples of the method for adding the alkali include a method of dropping an aqueous alkali solution and a method of adding a solid alkali in a plurality of times.
 エピハロヒドリンとしては、エピクロルヒドリン、エピブロモヒドリン、β-メチルエピクロルヒドリン等が挙げられる。
 アルカリとしては、例えば、水酸化ナトリウム、水酸化カリウム、水酸化カルシウム等の金属水酸化物が挙げられる。
 また、層間移動触媒を使用することもでき、該層間移動触媒としては、例えば、テトラメチルアンモニウムクロリド、テトラブチルアンモニウムブロミド、メチルトリオクチルアンモニウムクロリド、メチルトリデシルアンモニウムクロリド、N,N-ジメチルピロリジニウムクロリド、N-エチル-N-メチルピロリジニウムヨージド、N-ブチル-N-メチルピロリジニウムブロミド、N-ベンジル-N-メチルピロリジニウムクロリド、N-エチル-N-メチルピロリジニウムブロミド、N-ブチル-N-メチルモルホリニウムブロミド、N-ブチル-N-メチルモルホリニウムヨージド、N-アリル-N-メチルモルホリニウムブロミド、N-メチル-N-ベンジルピペリジニウムクロリド、N-メチル-N-ベンジルピペリジニウムブロミド、N,N-ジメチルピペリジニウムヨージド、N-メチル-N-エチルピペリジニウムアセテート、N-メチル-N-エチルピペリジニウムヨージド等が挙げられる。
Examples of epichlorohydrin include epichlorohydrin, epibromohydrin, β-methylepichlorohydrin and the like.
Examples of the alkali include metal hydroxides such as sodium hydroxide, potassium hydroxide and calcium hydroxide.
An interlayer transfer catalyst can also be used, and examples of the interlayer transfer catalyst include tetramethylammonium chloride, tetrabutylammonium bromide, methyltrioctylammonium chloride, methyltridecylammonium chloride, and N, N-dimethylpyrrolid. Nium chloride, N-ethyl-N-methylpyrrolidinium iodide, N-butyl-N-methylpyrrolidinium bromide, N-benzyl-N-methylpyrrolidinium chloride, N-ethyl-N-methylpyrrolidinium Bromid, N-butyl-N-methylmorpholinium bromide, N-butyl-N-methylmorpholinium iodide, N-allyl-N-methylmorpholinium bromide, N-methyl-N-benzylpiperidinium chloride , N-Methyl-N-benzylpiperidinium bromide, N, N-dimethylpiperidinium iodide, N-methyl-N-ethylpiperidinium acetate, N-methyl-N-ethylpiperidinium iodide, etc. Can be mentioned.
 ここで、エピハロヒドリンの使用量は前記水酸基を2個含有する化合物に対し、モル比で3~50倍、好ましくは、4~30倍である。
 反応は、必要に応じて加熱下、加圧又は減圧下で行われる。
 製造時間の短縮や反応効率の点から好ましい反応温度としては、40℃以上120℃以下であることが好ましく、60℃以上80℃以下であることがより好ましい。なおクロルヒドリン化反応及び得られたクロルヒドリン化物の閉環化反応が段階的に起こり、且つクロルヒドリン化反応の反応温度、及び、閉環化反応の反応温度が異なる場合、そのいずれか一方の反応温度が上記温度範囲内であることが好ましく、両方が上記の範囲内であることが更に好ましい。
Here, the amount of epihalohydrin used is 3 to 50 times, preferably 4 to 30 times, the molar ratio of the compound containing two hydroxyl groups.
The reaction is carried out under heating, pressurization or reduced pressure, if necessary.
From the viewpoint of shortening the production time and reaction efficiency, the reaction temperature is preferably 40 ° C. or higher and 120 ° C. or lower, and more preferably 60 ° C. or higher and 80 ° C. or lower. If the chlorhydrinization reaction and the ring closure reaction of the obtained chlorhydrinide occur stepwise, and the reaction temperature of the chlorhydrinization reaction and the reaction temperature of the ring closure reaction are different, the reaction temperature of either one is the above temperature. It is preferably within the range, and more preferably both are within the above range.
 一方、アクリル酸エステル化又はメタアクリル酸エステル化する方法としては、アクリル酸エステル及び/又はメタアクリル酸エステルを用いて、ジアルキル錫オキサイド、テトラアルキルチタネート等の触媒の存在下に行われる方法、塩化アクリロイル及び/又は塩化メタクリロイルを用いてトリエチルアミン等の中和剤の存在下で行う方法が挙げられる。アクリル酸エステルとしては、アクリル酸メチル、アクリル酸エチル、アクリル酸ブチルが挙げられる。メタアクリル酸エステルとしては、メタアクリル酸メチル、メタクリル酸エチル、メタクリル酸ブチルが挙げられる。
 製造時間の短縮や反応効率の点から前者の(メタ)アクリル酸エステル及び触媒の存在下で行う場合の反応温度は例えば50~100℃であることが好ましく、70~90℃であることがより好ましい。また製造時間の短縮や反応効率の点から後者の(メタ)アクリル酸クロリド及び中和剤の存在下で行う場合の反応温度は、例えば0~30℃であることが好ましい。
On the other hand, as a method for acrylic acid esterification or methacrylic acid esterification, a method performed using an acrylic acid ester and / or a methacrylic acid ester in the presence of a catalyst such as dialkyltin oxide or tetraalkyl titanate, chloride. Examples thereof include a method using acryloyl and / or methacryloyl chloride in the presence of a neutralizing agent such as triethylamine. Examples of the acrylate ester include methyl acrylate, ethyl acrylate, and butyl acrylate. Examples of the methacrylic acid ester include methyl methacrylate, ethyl methacrylate and butyl methacrylate.
From the viewpoint of shortening the production time and reaction efficiency, the reaction temperature in the presence of the former (meth) acrylic acid ester and catalyst is preferably, for example, 50 to 100 ° C, more preferably 70 to 90 ° C. preferable. Further, from the viewpoint of shortening the production time and reaction efficiency, the reaction temperature in the presence of the latter (meth) acrylic acid chloride and the neutralizing agent is preferably 0 to 30 ° C., for example.
 特に、式(1-1)で表される化合物の製造方法については、アクリル酸エステル及び/又はメタアクリル酸エステルを用いる方法を採用することが副反応を防止しやすい点から好ましく、特に、アクリル酸メチル等のアクリル酸エステルを用いることが反応性に優れる化合物を得る点から好ましい。 In particular, as for the method for producing the compound represented by the formula (1-1), it is preferable to adopt a method using an acrylic acid ester and / or a methacrylic acid ester from the viewpoint of easily preventing side reactions, and in particular, acrylic. It is preferable to use an acrylic acid ester such as methyl acrylate from the viewpoint of obtaining a compound having excellent reactivity.
 次に、本発明の硬化性組成物について詳述する。 Next, the curable composition of the present invention will be described in detail.
 本発明の硬化性組成物には、(A)前記一般式(1)で表される化合物の少なくとも一種(以下「(A)成分」と記載することがある。)と、(B)硬化剤又は重合開始剤の中から選ばれる少なくとも一種(以下「(B)成分」と記載することがある。)とを含有してなるものである。 The curable composition of the present invention includes (A) at least one of the compounds represented by the general formula (1) (hereinafter, may be referred to as "component (A)") and (B) a curing agent. Alternatively, it contains at least one selected from the polymerization initiators (hereinafter, may be referred to as "component (B)").
 本発明の硬化性組成物には、前記(A)成分以外の反応性不飽和結合及びエポキシ基をそれぞれ1個以上有する化合物を併用することができ、これらは、例えば、グリシジルメタクリレート、アリルフェノールのグリシジルエーテル、ジグリシジルモノアリルエーテル、エポキシアクリレート類等が挙げられる。 A compound having at least one reactive unsaturated bond and one or more epoxy groups other than the component (A) can be used in combination with the curable composition of the present invention, and these are, for example, glycidyl methacrylate and allyl phenol. Examples thereof include glycidyl ether, diglycidyl monoallyl ether, and epoxy acrylates.
 また、本発明の硬化性組成物には、反応性不飽和結合及びエポキシ基のうち、エポキシ基のみを有する化合物又は反応性不飽和結合のみを有する化合物を併用することもできる。 Further, the curable composition of the present invention may be used in combination with a compound having only an epoxy group or a compound having only a reactive unsaturated bond among the reactive unsaturated bond and the epoxy group.
 前記のエポキシ基のみを有する化合物としては、例えば、公知のエポキシ樹脂が挙げられる。前記エポキシ樹脂としては、例えば、ハイドロキノン、レゾルシン、ピロカテコール、フロログルシノール等の単核多価フェノール化合物のポリグリシジルエーテル化合物;エチレングリコール、プロピレングリコール、ブチレングリコール、ヘキサンジオール、ポリグリコール、チオジグリコール、グリセリン、トリメチロールプロパン、ペンタエリスリトール、ソルビトール、ビスフェノールA-アルキレンオキシド付加物等の多価アルコール類のポリグリシジルエーテル;マレイン酸、フマル酸、イタコン酸、コハク酸、グルタル酸、スベリン酸、アジピン酸、アゼライン酸、セバシン酸、ダイマー酸、トリマー酸、フタル酸、イソフタル酸、テレフタル酸、トリメリット酸、トリメシン酸、ピロメリット酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、エンドメチレンテトラヒドロフタル酸等の脂肪族、芳香族又は脂環族多塩基酸のグリシジルエステル類;グリシジルメタクリレートの単独重合体又は共重合体;ビニルシクロヘキセンジエポキシド、ジシクロペンタンジエンジエポキサイド、3,4-エポキシシクロヘキシルメチル-3,4-エポキシシクロヘキサンカルボキシレート、3,4-エポキシ-6-メチルシクロヘキシルメチル-6-メチルシクロヘキサンカルボキシレート、ビス(3,4-エポキシ-6-メチルシクロヘキシルメチル)アジペート等の環状オレフィン化合物のエポキシ化物;エポキシ化ポリブタジエン、エポキシ化スチレン-ブタジエン共重合物等のエポキシ化共役ジエン重合体、トリグリシジルイソシアヌレート等の複素環化合物が挙げられる。また、これらのエポキシ樹脂は末端イソシアネートのプレポリマーによって内部架橋されたもの、あるいは多価の活性水素化合物(多価フェノール、ポリアミン、カルボニル基含有化合物、ポリリン酸エステル等)を用いて高分子量化したものでもよい。 Examples of the compound having only the epoxy group include known epoxy resins. Examples of the epoxy resin include polyglycidyl ether compounds of mononuclear polyvalent phenol compounds such as hydroquinone, resorcin, pyrocatechol, and fluoroglusinol; ethylene glycol, propylene glycol, butylene glycol, hexanediol, polyglycol, and thiodiglycol. , Polyglycidyl ethers of polyhydric alcohols such as glycerin, trimethylolpropane, pentaerythritol, sorbitol, bisphenol A-alkylene oxide adduct; maleic acid, fumaric acid, itaconic acid, succinic acid, glutaric acid, sveric acid, adipic acid. , Azelaic acid, sebacic acid, dimer acid, trimeric acid, phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, trimesic acid, pyromellitic acid, tetrahydrophthalic acid, hexahydrophthalic acid, endomethylene tetrahydrophthalic acid and other fats Glycidyl esters of group, aromatic or alicyclic polybasic acids; homopolymers or copolymers of glycidyl methacrylate; vinylcyclohexene diepoxides, dicyclopentane diene diepoxides, 3,4-epoxycyclohexylmethyl-3,4 -Epoxy cyclohexanecarboxylate, 3,4-epoxy-6-methylcyclohexylmethyl-6-methylcyclohexanecarboxylate, epoxides of cyclic olefin compounds such as bis (3,4-epoxy-6-methylcyclohexylmethyl) adipate; epoxy Examples thereof include epoxidized conjugated diene polymers such as polybutadiene and epoxidized styrene-butadiene copolymers, and heterocyclic compounds such as triglycidyl isocyanurate. In addition, these epoxy resins were internally crosslinked with a prepolymer of terminal isocyanate, or polyvalent active hydrogen compounds (polyvalent phenol, polyamine, carbonyl group-containing compound, polyphosphate ester, etc.) were used to increase the molecular weight. It may be a thing.
 前記エポキシ樹脂の市販品としては、例えば、デナコールEX-313、デナコールEX-314、デナコールEX-321、デナコールEX-411、デナコールEX-421、デナコールEX-512、デナコールEX-521、デナコールEX-611、デナコールEX-612、デナコールEX-614、デナコールEX-622、デナコールEX-830、デナコールEX-832、デナコールEX-841、デナコールEX-861デナコールEX-920、デナコールEX-931、デナコールEX-201、デナコールEX-711、デナコールEX-721、(ナガセケムテックス社製);エポライト200E、エポライト400E、エポライト70P、エポライト200P、エポライト400P(共栄社化学社製)、アデカレジンEP-4088S、EP-4088L、EP-4080E、アデカレジンEP-4000、アデカレジンEP-4005、アデカレジンEP-4100、アデカレジンEP-4901(ADEKA社製);オグソールPG-100、オグソールEG-200、オグソールEG-210、オグソールEG-250(大阪ガスケミカル社製);YDシリーズ、YDFシリーズ、YDPNシリーズ、TDCNシリーズ(新日鉄住金化学);セロキサイド2021P、セロキサイド2081(ダイセル社製);TECHMORE VG-3101L(プリンテック社製);EOCN-1020、EOCN-102S、EOCN-103S、EOCN-104S、XD-1000、NC-3000、EPPN-501H、EPPN-501HY、EPPN-502H、NC-7000L(日本化薬社製);YX8800(三菱ケミカル製);HP4032、HP4032D、HP4700(DIC社製)等が挙げられる。 Examples of commercially available products of the epoxy resin include Denacol EX-313, Denacol EX-314, Denacol EX-321, Denacol EX-411, Denacol EX-421, Denacol EX-512, Denacol EX-521, and Denacol EX-611. , Denacol EX-612, Denacol EX-614, Denacol EX-622, Denacol EX-830, Denacol EX-832, Denacol EX-841, Denacol EX-861 Denacol EX-920, Denacol EX-931, Denacol EX-201, Denacol EX-711, Denacol EX-721, (manufactured by Nagase ChemteX); Epolite 200E, Epolite 400E, Epolite 70P, Epolite 200P, Epolite 400P (manufactured by Kyoei Kagaku Co., Ltd.), Adeka Resin EP-4088S, EP-4088L, EP- 4080E, Adeka Resin EP-4000, Adeka Resin EP-4005, Adeka Resin EP-4100, Adeka Resin EP-4901 (manufactured by ADEKA); Ogsol PG-100, Ogsol EG-200, Ogsol EG-210, Ogsol EG-250 (Osaka Gas Chemical) YD series, YDF series, YDPN series, TDCN series (Nippon Steel & Sumitomo Metal Chemical); Selokiside 2021P, Selokiside 2081 (manufactured by Daicel); TECHMORE VG-3101L (manufactured by Printec); EOCN-1020, EOCN-102S , EOCN-103S, EOCN-104S, XD-1000, NC-3000, EPPN-501H, EPPN-501HY, EPPN-502H, NC-7000L (manufactured by Nippon Kayaku Co., Ltd.); YX8800 (manufactured by Mitsubishi Chemical Corporation); HP4032, HP4032D , HP4700 (manufactured by DIC Corporation) and the like.
 前記反応性不飽和結合のみを有する化合物としては、例えば、N-メチル(メタ)アクリルアミド、N,N-ジメチル(メタ)アクリルアミド、N,N-ジエチル(メタ)アクリルアミド、N-イソプロピル(メタ)アクリルアミド、N-ブチル(メタ)アクリルアミド、N-ヘキシル(メタ)アクリルアミド等のN-アルキル基含有(メタ)アクリルアミド誘導体;N-メチロール(メタ)アクリルアミド、N-ヒドロキシエチル(メタ)アクリルアミド、N-メチロール-N-プロパン(メタ)アクリルアミド、N-メトキシメチルアクリルアミド、N-エトキシメチルアクリルアミド等のN-アルコキシ基含有(メタ)アクリルアミド誘導体、N-アクリロイルモルホリン、N-アクリロイルピペリジン、N-メタクリロイルピペリジン、N-アクリロイルピロリジン等の(メタ)アクリルアミド誘導体;エチレン、プロピレン、ブチレン、イソブチレン、塩化ビニル、塩化ビニリデン、フッ化ビニリデン、テトラフルオロエチレン等の不飽和脂肪族炭化水素;(メタ)アクリル酸、α―クロルアクリル酸、イタコン酸、マレイン酸、シトラコン酸、フマル酸、ハイミック酸、クロトン酸、イソクロトン酸、ビニル酢酸、アリル酢酸、桂皮酸、ソルビン酸、メサコン酸、コハク酸モノ[2-(メタ)アクリロイロキシエチル]、フタル酸モノ[2-(メタ)アクリロイロキシエチル]、ω-カルボキシポリカプロラクトンモノ(メタ)アクリレート等の両末端にカルボキシ基と水酸基とを有するポリマーのモノ(メタ)アクリレート;ヒドロキシエチル(メタ)アクリレート・マレート、ヒドロキシプロピル(メタ)アクリレート・マレート、ジシクロペンタジエン・マレート或いは1個のカルボキシ基と2個以上の(メタ)アクリロイル基とを有する多官能(メタ)アクリレート等の不飽和多塩基酸;(メタ)アクリル酸-2-ヒドロキシエチル、(メタ)アクリル酸-2-ヒドロキシプロピル、(メタ)アクリル酸メチル、(メタ)アクリル酸ブチル、(メタ)アクリル酸イソブチル、(メタ)アクリル酸-t-ブチル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸n-オクチル、(メタ)アクリル酸イソオクチル、(メタ)アクリル酸イソノニル、(メタ)アクリル酸ステアリル、(メタ)アクリル酸ラウリル、(メタ)アクリル酸メトキシエチル、(メタ)アクリル酸ジメチルアミノメチル、(メタ)アクリル酸ジメチルアミノエチル、(メタ)アクリル酸アミノプロピル、(メタ)アクリル酸ジメチルアミノプロピル、(メタ)アクリル酸エトキシエチル、(メタ)アクリル酸ポリ(エトキシ)エチル、(メタ)アクリル酸ブトキシエトキシエチル、(メタ)アクリル酸エチルヘキシル、(メタ)アクリル酸フェノキシエチル、(メタ)アクリル酸テトラヒドロフリル、(メタ)アクリル酸ビニル、(メタ)アクリル酸アリル、(メタ)アクリル酸ベンジル、エチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、ポリエチレングリコールジ(メタ)アクリレート、プロピレングリコールジ(メタ)アクリレート、1,4-ブタンジオールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、トリメチロールエタントリ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、トリシクロデカンジメチロールジ(メタ)アクリレート、トリ[(メタ)アクリロイルエチル]イソシアヌレート、ポリエステル(メタ)アクリレートオリゴマー等の不飽和一塩基酸及び多価アルコール又は多価フェノールのエステル;(メタ)アクリル酸亜鉛、(メタ)アクリル酸マグネシウム等の不飽和多塩基酸の金属塩;マレイン酸無水物、イタコン酸無水物、シトラコン酸無水物、メチルテトラヒドロ無水フタル酸、テトラヒドロ無水フタル酸、トリアルキルテトラヒドロ無水フタル酸、5-(2,5-ジオキソテトラヒドロフリル)-3-メチル-3-シクロヘキセン-1,2-ジカルボン酸無水物、トリアルキルテトラヒドロ無水フタル酸-無水マレイン酸付加物、ドデセニル無水コハク酸、無水メチルハイミック酸等の不飽和多塩基酸の酸無水物;アクロレイン等の不飽和アルデヒド;(メタ)アクリロニトリル、α-クロロアクリロニトリル、シアン化ビニリデン、シアン化アリル等の不飽和ニトリル;スチレン、4-メチルスチレン、4-エチルスチレン、4-メトキシスチレン、4-ヒドロキシスチレン、4-クロロスチレン、ジビニルベンゼン、ビニルトルエン、ビニル安息香酸、ビニルフェノール、ビニルスルホン酸、4-ビニルベンゼンスルホン酸、ビニルベンジルメチルエーテル、ビニルベンジルグリシジルエーテル等の不飽和芳香族化合物;メチルビニルケトン等の不飽和ケトン;ビニルアミン、アリルアミン、N-ビニルピロリドン、ビニルピペリジン等の不飽和アミン化合物;アリルアルコール、クロチルアルコール等のビニルアルコール;ビニルメチルエーテル、ビニルエチルエーテル、n-ブチルビニルエーテル、イソブチルビニルエーテル、アリルグリシジルエーテル等のビニルエーテル;マレイミド、N-フェニルマレイミド、N-シクロヘキシルマレイミド等の不飽和イミド類;インデン、1-メチルインデン等のインデン類;1,3-ブタジエン、イソプレン、クロロプレン等の脂肪族共役ジエン類;ポリスチレン、ポリメチル(メタ)アクリレート、ポリ-n-ブチル(メタ)アクリレート、ポリシロキサン等の重合体分子鎖の末端にモノ(メタ)アクリロイル基を有するマクロモノマー類;ビニルクロリド、ビニリデンクロリド、ジビニルスクシナート、ジアリルフタラート、トリアリルホスファート、トリアリルイソシアヌラート、ビニルチオエーテル、ビニルイミダゾール、ビニルオキサゾリン、ビニルカルバゾール、ビニルピロリドン、ビニルピリジン、水酸基含有ビニルモノマー及びポリイソシアネート化合物のビニルウレタン化合物、水酸基含有ビニルモノマー及びポリエポキシ化合物のビニルエポキシ化合物が挙げられる。 Examples of the compound having only a reactive unsaturated bond include N-methyl (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N, N-diethyl (meth) acrylamide, and N-isopropyl (meth) acrylamide. , N-butyl (meth) acrylamide, N-hexyl (meth) acrylamide and other N-alkyl group-containing (meth) acrylamide derivatives; N-methylol (meth) acrylamide, N-hydroxyethyl (meth) acrylamide, N-methylol- N-alkoxy group-containing (meth) acrylamide derivatives such as N-propane (meth) acrylamide, N-methoxymethylacrylamide, N-ethoxymethylacrylamide, N-acryloylmorpholine, N-acryloylpiperidin, N-methacryloylpiperidin, N-acryloyl (Meta) acrylamide derivatives such as pyrrolidine; unsaturated aliphatic hydrocarbons such as ethylene, propylene, butylene, isobutylene, vinyl chloride, vinylidene chloride, vinylidene fluoride, tetrafluoroethylene; (meth) acrylic acid, α-chloroacrylic acid , Itaconic acid, maleic acid, citraconic acid, fumaric acid, hymic acid, crotonic acid, isocrotonic acid, vinyl acetic acid, allylacetic acid, cinnamic acid, sorbic acid, mesaconic acid, mono-succinic acid [2- (meth) acrylicyloxyethyl ], Mono (meth) phthalic acid [2- (meth) acrylicyloxyethyl], ω-carboxypolycaprolactone Mono (meth) acrylate, etc. Polymer mono (meth) acrylate having carboxy groups and hydroxyl groups at both ends; hydroxyethyl ( Unsaturated polyusity such as meta) acrylate malate, hydroxypropyl (meth) acrylate malate, dicyclopentadiene malate or polyfunctional (meth) acrylate having one carboxy group and two or more (meth) acryloyl groups. Basic acid; -2-hydroxyethyl (meth) acrylate, -2-hydroxypropyl (meth) acrylate, methyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, (meth) acrylic Acid-t-butyl, cyclohexyl (meth) acrylate, n-octyl (meth) acrylate, isooctyl (meth) acrylate, isononyl (meth) acrylate, stearyl (meth) acrylate, lauryl (meth) acrylate, (Meta) methoxyethyl acrylate, (meth) dimethylaminomethyl acrylate, Dimethylaminoethyl (meth) acrylic acid, aminopropyl (meth) acrylic acid, dimethylaminopropyl (meth) acrylic acid, ethoxyethyl (meth) acrylic acid, poly (ethoxy) ethyl (meth) acrylic acid, (meth) acrylic acid Butoxyethoxyethyl, ethylhexyl (meth) acrylate, phenoxyethyl (meth) acrylate, tetrahydrofuryl (meth) acrylate, vinyl (meth) acrylate, allyl (meth) acrylate, benzyl (meth) acrylate, ethylene glycol Di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-Hexanediol di (meth) acrylate, trimethylol ethanetri (meth) acrylate, trimethylpropanthry (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, pentaerythritol Unsaturated monobasic acids such as tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, tricyclodecanedimethylol di (meth) acrylate, tri [(meth) acryloylethyl] isocyanurate, polyester (meth) acrylate oligomer, and the like. Esters of polyhydric alcohol or polyhydric phenol; metal salts of unsaturated polybasic acids such as zinc (meth) acrylate, magnesium (meth) acrylate; maleic acid anhydride, itaconic acid anhydride, citraconic acid anhydride, methyl Tetrahydro phthalic acid anhydride, tetrahydrophthalic acid anhydride, trialkyltetrahydrophthalic acid anhydride, 5- (2,5-dioxotetrahydrofuryl) -3-methyl-3-cyclohexene-1,2-dicarboxylic acid anhydride, trialkyltetrahydro Acid anhydrides of unsaturated polybasic acids such as phthalic acid anhydride-maleic acid anhydride adduct, succinic anhydride, methylhymic acid anhydride; unsaturated aldehydes such as achlorine; (meth) acrylic nitrile, α-chloroacrylic acid, cyanide Unsaturated nitriles such as vinylidene silicate and allyl cyanide; styrene, 4-methylstyrene, 4-ethylstyrene, 4-methoxystyrene, 4-hydroxystyrene, 4-chlorostyrene, divinylbenzene, vinyl tolue , Vinyl benzoic acid, vinyl phenol, vinyl sulfonic acid, 4-vinylbenzene sulfonic acid, vinyl benzyl methyl ether, vinyl benzyl glycidyl ether and other unsaturated aromatic compounds; unsaturated ketones such as methyl vinyl ketone; vinyl amine, allyl amine, Unsaturated amine compounds such as N-vinylpyrrolidone and vinylpiperidin; vinyl alcohols such as allyl alcohol and crotyl alcohol; vinyl ethers such as vinyl methyl ether, vinyl ethyl ether, n-butyl vinyl ether, isobutyl vinyl ether and allyl glycidyl ether; maleimide, Unsaturated imides such as N-phenylmaleimide and N-cyclohexylmaleimide; indens such as inden and 1-methylinden; aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; polystyrene, polymethyl (meth) Macromonomonics having a mono (meth) acryloyl group at the end of polymer molecular chains such as acrylate, poly-n-butyl (meth) acrylate, polysiloxane; vinyl chloride, vinylidene chloride, divinyl succinate, diallyl phthalate, Triallyl phosphate, triallyl isocyanurate, vinyl thioether, vinyl imidazole, vinyl oxazoline, vinyl carbazole, vinyl pyrrolidone, vinyl pyridine, hydroxyl group-containing vinyl monomer and polyisocyanate compound vinyl urethane compound, hydroxyl group-containing vinyl monomer and polyepoxy compound. Vinyl epoxy compound of.
 本発明の硬化性組成物における(A)成分の含有量は例えば例えば15質量%以上であることが好ましく、30質量%以上99質量%であることが硬化性組成物における硬化性等の点で好ましく、50質量%以上97質量%であることがより好ましい。更に硬化性組成物が、(A)成分に加えてエポキシ基及び/又は反応性不飽和結合を有するその他の化合物を含有する場合には、硬化性等の点で該その他の化合物の量は(A)成分100質量部に対し、100質量部以下であることが好ましく、70質量部以下であることがより好ましい。 The content of the component (A) in the curable composition of the present invention is, for example, preferably 15% by mass or more, and 30% by mass or more and 99% by mass in terms of curability and the like in the curable composition. It is preferably 50% by mass or more and 97% by mass, more preferably. Further, when the curable composition contains an epoxy group and / or another compound having a reactive unsaturated bond in addition to the component (A), the amount of the other compound is (in terms of curability and the like). A) It is preferably 100 parts by mass or less, and more preferably 70 parts by mass or less with respect to 100 parts by mass of the component.
 本発明で使用する(B)成分である硬化剤としては、例えば、アミン系硬化剤、フェノール系硬化剤、酸無水物系硬化剤、ポリチオール化合物、アミン系潜在性硬化剤等が好ましいものとして挙げられる。 As the curing agent which is the component (B) used in the present invention, for example, an amine-based curing agent, a phenol-based curing agent, an acid anhydride-based curing agent, a polythiol compound, an amine-based latent curing agent and the like are mentioned as preferable ones. Be done.
 前記アミン系硬化剤としては、例えば、エチレンジアミン、1,2-ジアミノプロパン、1,3-ジアミノプロパン、1,3-ジアミノブタン、1,4-ジアミノブタン、ヘキサメチレンジアミン等のアルキレンジアミン類;ジエチレントリアミン、トリエチレントリアミン、テトラエチレンペンタミン等のポリアルキルポリアミン類;1,4-ジアミノシクロヘキサン、1,3-ジアミノシクロヘキサン、1,3-ジアミノメチルシクロヘキサン、1,2-ジアミノシクロヘキサン、1,4-ジアミノ-3,6-ジエチルシクロヘキサン、4,4’-ジアミノジシクロヘキシルメタン、1,3-ビス(アミノメチル)シクロヘキサン、1,4-ビス(アミノメチル)シクロヘキサン、4,4’-ジアミノジシクロヘキシルプロパン、ビス(4-アミノシクロヘキシル)スルホン、4,4’-ジアミノジシクロヘキシルエーテル、2,2’-ジメチル-4,4‘-ジアミノジシクロヘキシルメタン、イソホロンジアミン、ノルボルネンジアミン等の脂環式ポリアミン類;m-キシリレンジアミン、ジアミノジフェニルメタン、ジアミノジフェニルスルホン、ジエチルトルエンジアミン、1-メチル-3,5-ジエチル-2,4-ジアミンベンゼン、1-メチル-3,5-ジエチル-2,6-ジアミノベンゼン、1,3,5-トリエチル-2,6-ジアミノベンゼン、3,3’-ジエチル-4,4’-ジアミノジフェニルメタン、3,5,3’、5’-テトラメチル-4,4‘-ジアミノジフェニルメタン等の芳香族ポリアミン類;ベンゾグアナミン、アセトグアナミン等のグアナミン類;2-メチルイミダゾール、2-エチル-4-メチルイミダゾール、2-イソプロピルイミダゾール、2-ウンデシルイミダゾール、2-ヘプタデシルイミダゾール、2-フェニルイミダゾール、2-フェニル-4-メチルイミダゾール、2-アミノプロピルイミダゾール等のイミダゾール類;シュウ酸ジヒドラジド、マロン酸ジヒドラジド、コハク酸ジヒドラジド、グルタル酸ジヒドラジド、アジピン酸ジヒドラジド、スベリン酸ジヒドラジド、アゼライン酸ジヒドラジド、セバシン酸ジヒドラジド、フタル酸ジヒドラジド等のジヒドラジド類;N,N-ジメチルアミノエチルアミン、N,N-ジエチルアミノエチルアミン、N,N-ジイソプロピルアミノエチルアミン、N,N-ジアリルアミノエチルアミン、N,N-ベンジルメチルアミノエチルアミン、N,N-ジベンジルアミノエチルアミン、N,N-シクロヘキシルメチルアミノエチルアミン、N,N-ジシクロヘキシルアミノエチルアミン、N-(2-アミノエチル)ピロリジン、N-(2-アミノエチル)ピペリジン、N-(2-アミノエチル)モルホリン、N-(2-アミノエチル)ピペラジン、N-(2-アミノエチル)-N’-メチルピペラジン、N,N-ジメチルアミノプロピルアミン、N,N-ジエチルアミノプロピルアミン、N,N-ジイソプロピルアミノプロピルアミン、N,N-ジアリルアミノプロピルアミン、N,N-ベンジルメチルアミノプロピルアミン、N,N-ジベンジルアミノプロピルアミン、N,N-シクロヘキシルメチルアミノプロピルアミン、N,N-ジシクロヘキシルアミノプロピルアミン、N-(3-アミノプロピル)ピロリジン、N-(3-アミノプロピル)ピペリジン、N-(3-アミノプロピル)モルホリン、N-(3-アミノプロピル)ピペラジン、N-(3-アミノプロピル)-N’-メチルピペリジン、4-(N,N-ジメチルアミノ)ベンジルアミン、4-(N,N-ジエチルアミノ)ベンジルアミン、4-(N,N-ジイソプロピルアミノ)ベンジルアミン、N,N,-ジメチルイソホロンジアミン、N,N-ジメチルビスアミノシクロヘキサン、N,N,N’-トリメチルエチレンジアミン、N’-エチル-N,N-ジメチルエチレンジアミン、N,N,N’-トリメチルエチレンジアミン、N’-エチル-N,N-ジメチルプロパンジアミン、N’-エチル-N,N-ジベンジルアミノプロピルアミン;N,N-(ビスアミノプロピル)-N-メチルアミン、N,N-ビスアミノプロピルエチルアミン、N,N-ビスアミノプロピルプロピルアミン、N,N-ビスアミノプロピルブチルアミン、N,N-ビスアミノプロピルペンチルアミン、N,N-ビスアミノプロピルヘキシルアミン、N,N-ビスアミノプロピル-2-エチルヘキシルアミン、N,N-ビスアミノプロピルシクロヘキシルアミン、N,N-ビスアミノプロピルベンジルアミン、N,N-ビスアミノプロピルアリルアミン、ビス〔3-(N,N-ジメチルアミノプロピル)〕アミン、ビス〔3-(N,N-ジエチルアミノプロピル)〕アミン、ビス〔3-(N,N-ジイソプロピルアミノプロピル)〕アミン、ビス〔3-(N,N-ジブチルアミノプロピル)〕アミン等が挙げられる。 Examples of the amine-based curing agent include alkylenediamines such as ethylene dihydric acid, 1,2-diaminopropane, 1,3-diaminopropane, 1,3-diaminobutane, 1,4-diaminobutane, and hexamethylenediamine; diethylenetriamine. , Triethylenetriamine, polyalkylpolyamines such as tetraethylenepentamine; 1,4-diaminocyclohexane, 1,3-diaminocyclohexane, 1,3-diaminomethylcyclohexane, 1,2-diaminocyclohexane, 1,4-diamino -3,6-diethylcyclohexane, 4,4'-diaminodicyclohexylmethane, 1,3-bis (aminomethyl) cyclohexane, 1,4-bis (aminomethyl) cyclohexane, 4,4'-diaminodicyclohexylpropane, bis ( 4-Adipic acid dihydric acid) sulfone, 4,4'-diaminodicyclohexyl ether, 2,2'-dimethyl-4,4'-diaminodicyclohexylmethane, isophorone dihydric acid, norbornene diamine and other adipic polyamines; m-xylylene dihydrium , Diaminodiphenylmethane, diaminodiphenylsulfone, diethyltoludidiamine, 1-methyl-3,5-diethyl-2,4-diaminebenzene, 1-methyl-3,5-diethyl-2,6-diaminobenzene, 1,3 Fragrances such as 5-triethyl-2,6-diaminobenzene, 3,3'-diethyl-4,4'-diaminodiphenylmethane, 3,5,3', 5'-tetramethyl-4,4'-diaminodiphenylmethane Polyamines; guanamines such as benzoguanamine and acetoguanamine; 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-isopropylimidazole, 2-undecyl imidazole, 2-heptadecyl imidazole, 2-phenyl imidazole, 2- Imidazoles such as phenyl-4-methylimidazole and 2-aminopropyl imidazole; dihydrazide oxalic acid, dihydrazide malonate, dihydrazide succinic acid, dihydrazide glutalide, dihydrazide adipic acid, dihydrazide dihydric acid, dihydrazide azelaide, dihydrazide sevacinic acid Dihydrazides such as acid dihydrazide; N, N-dimethylaminoethylamine, N, N-diethylaminoethylamine, N, N-diisopropylaminoethylamine, N, N-diallylaminoethylamine, N, N-benzylmethi Luaminoethylamine, N, N-dibenzylaminoethylamine, N, N-cyclohexylmethylaminoethylamine, N, N-dicyclohexylaminoethylamine, N- (2-aminoethyl) pyrrolidine, N- (2-aminoethyl) piperidine, N- (2-aminoethyl) morpholine, N- (2-aminoethyl) piperazine, N- (2-aminoethyl) -N'-methylpiperazine, N, N-dimethylaminopropylamine, N, N-diethylaminopropyl Amine, N, N-diisopropylaminopropylamine, N, N-diallylaminopropylamine, N, N-benzylmethylaminopropylamine, N, N-dibenzylaminopropylamine, N, N-cyclohexylmethylaminopropylamine, N, N-dicyclohexylaminopropylamine, N- (3-aminopropyl) pyrrolidine, N- (3-aminopropyl) piperidine, N- (3-aminopropyl) morpholine, N- (3-aminopropyl) piperazine, N -(3-Aminopropyl) -N'-methylpiperidin, 4- (N, N-dimethylamino) benzylamine, 4- (N, N-diethylamino) benzylamine, 4- (N, N-diisopropylamino) benzyl Amine, N, N, -dimethylisophoronediamine, N, N-dimethylbisaminocyclohexane, N, N, N'-trimethylethylenediamine, N'-ethyl-N, N-dimethylethylenediamine, N, N, N'-trimethyl Ethylenediamine, N'-ethyl-N, N-dimethylpropanediamine, N'-ethyl-N, N-dibenzylaminopropylamine; N, N- (bisaminopropyl) -N-methylamine, N, N-bis Aminopropylethylamine, N, N-bisaminopropylpropylamine, N, N-bisaminopropylbutylamine, N, N-bisaminopropylpentylamine, N, N-bisaminopropylhexylamine, N, N-bisaminopropyl -2-Ethylhexylamine, N, N-bisaminopropylcyclohexylamine, N, N-bisaminopropylbenzylamine, N, N-bisaminopropylallylamine, bis [3- (N, N-dimethylaminopropyl)] amine , Bis [3- (N, N-diethylaminopropyl)] amine, bis [3- (N, N-diisopropylaminopropyl)] amine, bis [3- (N, N-dibutylaminopropyl)] Amine and the like can be mentioned.
 フェノール系硬化剤としては、例えば、フェノールノボラック樹脂、クレゾールノボラック樹脂、芳香族炭化水素ホルムアルデヒド樹脂変性フェノール樹脂、ジシクロペンタジエンフェノール付加型樹脂、フェノールアラルキル樹脂(ザイロック樹脂)、ナフトールアラルキル樹脂、トリスフェニロールメタン樹脂、テトラフェニロールエタン樹脂、ナフトールノボラック樹脂、ナフトール-フェノール共縮合ノボラック樹脂、ナフトール-クレゾール共縮合ノボラック樹脂、ビフェニル変性フェノール樹脂(ビスメチレン基でフェノール核が連結された多価フェノール化合物)、ビフェニル変性ナフトール樹脂(ビスメチレン基でフェノール核が連結された多価ナフトール化合物)、アミノトリアジン変性フェノール樹脂(フェノール骨格、トリアジン環及び1級アミノ基を分子構造中に有する化合物)、及び、アルコキシ基含有芳香環変性ノボラック樹脂(ホルムアルデヒドでフェノール核及びアルコキシ基含有芳香環が連結された多価フェノール化合物)等の多価フェノール化合物が挙げられる。 Examples of the phenol-based curing agent include phenol novolac resin, cresol novolac resin, aromatic hydrocarbon formaldehyde resin-modified phenol resin, dicyclopentadienephenol-added resin, phenol aralkyl resin (Zyroc resin), naphthol aralkyl resin, and trisphenylol. Methan resin, tetraphenylol ethane resin, naphthol novolac resin, naphthol-phenol cocondensation novolac resin, naphthol-cresol cocondensation novolac resin, biphenyl-modified phenol resin (polyhydric phenol compound in which phenol nuclei are linked by bismethylene groups), biphenyl Modified naphthol resin (polyvalent naphthol compound in which a phenol nucleus is linked with a bismethylene group), aminotriazine-modified phenol resin (a compound having a phenol skeleton, a triazine ring and a primary amino group in its molecular structure), and an alkoxy group-containing fragrance. Examples thereof include polyhydric phenol compounds such as ring-modified novolak resin (polyhydric phenol compound in which a phenol core and an alkoxy group-containing aromatic ring are linked with formaldehyde).
 酸無水物系硬化剤としては、例えば、無水ハイミック酸、無水フタル酸、無水マレイン酸、無水メチルハイミック酸、無水コハク酸、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、トリアルキルテトラヒドロ無水フタル酸-無水マレイン酸付加物、ベンゾフェノンテトラカルボン酸無水物、無水トリメリット酸、無水ピロメリット酸、及び水素化メチルナジック酸無水物等が挙げられる。 Examples of the acid anhydride-based curing agent include hymic anhydride, phthalic anhydride, maleic anhydride, methyl hymic anhydride, succinic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, and methyl anhydride. Hexahydrophthalic anhydride, trialkyltetrahydrophthalic anhydride-maleic anhydride adduct, benzophenone tetracarboxylic acid anhydride, trimellitic anhydride, pyromellitic anhydride, hydride methylnadic acid anhydride and the like can be mentioned.
 前記ポリチオール化合物としては、例えば、ペンタエリスリトールテトラキス(3-メルカプトプロピオネート)、ペンタエリスリトールテトラキス(チオグリコレート)、ジペンタエリスリトールヘキサキス(3-メルカプトプロピオネート)、ジペンタエリスリトール ヘキサキス(3-メルカプトブチレート)、1,3,4,6-テトラキス(2-メルカプトエチル)-1,3,4,6-テトラアザオクヒドロペンタレン-2,5-ジオン、1,3,5-トリス(3-メルカブトプロピル)-1,3,5-トリアジン-2,4,6(1H,3H,5H)-トリオン、4-メルカプトメチル-1,8-ジメルカプト-3,6-ジチアオクタン、4,8-、4,7-若しくは5,7-ジメルカプトメチル-1,11-ジメルカプト-3,6,9-トリチアウンデカン、1,3,4,6-テトラキス(2-メルカプトエチル)グリコールウリル、1,2,3-トリス(メルカプトメチルチオ)プロパン、1,2,3-トリス(2-メルカプトエチルチオ)プロパン、1,2,3-トリス(3-メルカプトプロピルチオ)プロパン、4-メルカプトメチル-1,8-ジメルカプト-3,6-ジチアオクタン、5,7-ジメルカプトメチル-1,11-ジメルカプト-3,6,9-トリチアウンデカン、4,7-ジメルカプトメチル-1,11-ジメルカプト-3,6,9-トリチアウンデカン、4,8-ジメルカプトメチル-1,11-ジメルカプト-3,6,9-トリチアウンデカン、テトラキス(メルカプトメチルチオメチル)メタン、テトラキス(2-メルカプトエチルチオメチル)メタン、テトラキス(3-メルカプトプロピルチオメチル)メタン、1,1,3,3-テトラキス(メルカプトメチルチオ)プロパン、1,1,2,2-テトラキス(メルカプトメチルチオ)エタン、4,6-ビス(メルカプトメチルチオ)-1,3-ジチアン、1,1,5,5-テトラキス(メルカプトメチルチオ)-3-チアペンタン、1,1,6,6-テトラキス(メルカプトメチルチオ)-3,4-ジチアヘキサン、2,2-ビス(メルカプトメチルチオ)エタンチオール、3-メルカプトメチルチオ-1,7-ジメルカプト-2,6-ジチアヘプタン、3,6-ビス(メルカプトメチルチオ)-1,9-ジメルカプト-2,5,8-トリチアノナン、3-メルカプトメチルチオ-1,6-ジメルカプト-2,5-ジチアヘキサン、1,1,9,9-テトラキス(メルカプトメチルチオ)-5-(3,3-ビス(メルカプトメチルチオ)-1-チアプロピル)3,7-ジチアノナン、トリス(2,2-ビス(メルカプトメチルチオ)エチル)メタン、トリス(4,4-ビス(メルカプトメチルチオ)-2-チアブチル)メタン、テトラキス(2,2-ビス(メルカプトメチルチオ)エチル)メタン、テトラキス(4,4-ビス(メルカプトメチルチオ)-2-チアブチル)メタン、3,5,9,11-テトラキス(メルカプトメチルチオ)-1,13-ジメルカプト-2,6,8,12-テトラチアトリデカン、3,5,9,11,15,17-ヘキサキス(メルカプトメチルチオ)-1,19-ジメルカプト-2,6,8,12,14,18-ヘキサチアノナデカン、9-(2,2-ビス(メルカプトメチルチオ)エチル)-3,5,13,15-テトラキス(メルカプトメチルチオ)-1,17-ジメルカプト-2,6,8,10,12,16-ヘキサチアヘプタデカン、3,4,8,9-テトラキス(メルカプトメチルチオ)-1,11-ジメルカプト-2,5,7,10-テトラチアウンデカン、3,4,8,9,13,14-ヘキサキス(メルカプトメチルチオ)-1,16-ジメルカプト-2,5,7,10,12,15-ヘキサチアヘキサデカン、8-[ビス(メルカプトメチルチオ)メチル]-3,4,12,13-テトラキス(メルカプトメチルチオ)-1,15-ジメルカプト-2,5,7,9,11,14-ヘキサチアペンタデカン、4,6-ビス[3,5-ビス(メルカプトメチルチオ)-7-メルカプト-2,6-ジチアヘプチルチオ]-1,3-ジチアン、4-[3,5-ビス(メルカプトメチルチオ)-7‐メルカプト-2,6-ジチアヘプチルチオ]-6-メルカプトメチルチオ-1,3-ジチアン、1,1-ビス[4-(6-メルカプトメチルチオ)-1,3-ジチアニルチオ]-1,3-ビス(メルカプトメチルチオ)プロパン、1-[4-(6-メルカプトメチルチオ)-1,3-ジチアニルチオ]-3-[2,2-ビス(メルカプトメチルチオ)エチル]-7,9-ビス(メルカプトメチルチオ)-2,4,6,10-テトラチアウンデカン、1,5-ビス[4-(6-メルカプトメチルチオ)-1,3-ジチアニルチオ]-3-[2-(1,3-ジチエタニル)]メチル-2,4-ジチアペンタン、3-[2-(1,3-ジチエタニル)]メチル-7,9-ビス(メルカプトメチルチオ)-1,11-ジメルカプト-2,4,6,10-テトラチアウンデカン、9-[2-(1,3-ジチエタニル)]メチル-3,5,13,15-テトラキス(メルカプトメチルチオ)-1,17-ジメルカプト-2,6,8,10,12,16-ヘキサチアヘプタデカン、3-[2-(1,3-ジチエタニル)]メチル-7,9,13,15-テトラキス(メルカプトメチルチオ)-1,17-ジメルカプト-2,4,6,10,12,16-ヘキサチアヘプタデカン、3,7-ビス[2-(1,3-ジチエタニル)]メチル-1,9-ジメルカプト-2,4,6,8-テトラチアノナン、4,6-ビス{3-[2-(1,3-ジチエタニル)]メチル-5-メルカプト-2,4-ジチアペンチルチオ}-1,3-ジチアン、4,6-ビス[4-(6-メルカプトメチルチオ)-1,3-ジチアニルチオ]-6-[4-(6‐メルカプトメチルチオ)-1,3-ジチアニルチオ]-1,3-ジチアン、4-[3,4,8,9‐テトラキス(メルカプトメチルチオ)-11-メルカプト-2,5,7,10-テトラチアウンデシル]-5-メルカプトメチルチオ-1,3-ジチオラン、4,5-ビス[3,4-ビス(メルカプトメチルチオ)-6-メルカプト-2,5-ジチアヘキシルチオ]-1,3-ジチオラン、4-[3,4-ビス(メルカプトメチルチオ)-6-メルカプト-2,5-ジチアヘキシルチオ]-5-メルカプトメチルチオ-1,3-ジチオラン、4-[3-ビス(メルカプトメチルチオ)メチル-5,6-ビス(メルカプトメチルチオ)-8-メルカプト-2,4,7-トリチアオクチル]-5-メルカプトメチルチオ-1,3-ジチオラン、2-{ビス[3,4-ビス(メルカプトメチルチオ)-6-メルカプト-2,5-ジチアヘキシルチオ]メチル}-1,3-ジチエタン、2-[3,4-ビス(メルカプトメチルチオ)-6-メルカプト-2,5-ジチアヘキシルチオ]メルカプトメチルチオメチル-1,3-ジチエタン、2-[3,4,8,9-テトラキス(メルカプトメチルチオ)-11-メルカプト-2,5,7,10-テトラチアウンデシルチオ]メルカプトメチルチオメチル-1,3-ジチエタン、2-[3-ビス(メルカプトメチルチオ)メチル-5,6-ビス(メルカプトメチルチオ)-8-メルカプト-2,4,7-トリチアオクチル]メルカプトメチルチオメチル-1,3-ジチエタン、4,5-ビス{1-[2-(1,3-ジチエタニル)]-3-メルカプト-2-チアプロピルチオ}-1,3-ジチオラン、4-{1-[2-(1,3-ジチエタニル)]-3-メルカプト-2-チアプロピルチオ}-5-[1,2-ビス(メルカプトメチルチオ)-4-メルカプト-3-チアブチルチオ]-1,3-ジチオラン、2-{ビス[4-(5-メルカプトメチルチオ-1,3-ジチオラニル)チオ]メチル}-1,3-ジチエタン、4-[4-(5-メルカプトメチルチオ-1,3-ジチオラニル)チオ]-5-{1-[2-(1,3-ジチエタニル)]-3-メルカプト-2-チアプロピルチオ}-1,3-ジチオラン等が挙げられる。
 これらポリチオール化合物の市販品としては、例えば、四国化成工業(株)製TS-G、SC有機化学(株)製DPMP、PEMP、淀化学(株)PETG等が挙げられる。
 特に、4価以上のポリチオール化合物を使用することによって硬化性に優れるものが得られるため好ましい。
Examples of the polythiol compound include pentaerythritol tetrakis (3-mercaptopropionate), pentaerythritol tetrakis (thioglycolate), dipentaerythritol hexakis (3-mercaptopropionate), and dipentaerythritol hexakis (3-mercaptopropionate). Mercaptobutyrate), 1,3,4,6-tetrakis (2-mercaptoethyl) -1,3,4,6-tetraazaocthydropentalene-2,5-dione, 1,3,5-tris ( 3-Mercaptopropyl) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione, 4-mercaptomethyl-1,8-dimercapto-3,6-dithiaoctane, 4,8 -, 4,7- or 5,7-dimercaptomethyl-1,11-dimercapto-3,6,9-trithiaundecane, 1,3,4,6-tetrakis (2-mercaptoethyl) glycoluryl, 1 , 2,3-Tris (mercaptomethylthio) propane, 1,2,3-tris (2-mercaptoethylthio) propane, 1,2,3-tris (3-mercaptopropylthio) propane, 4-mercaptomethyl-1 , 8-dimercapto-3,6-dithiaoctane, 5,7-dimercaptomethyl-1,11-dimercapto-3,6,9-trithiaundecane, 4,7-dimercaptomethyl-1,11-dimercapto-3 , 6,9-Trithiandecane, 4,8-Dimercaptomethyl-1,11-Dimercapto-3,6,9-Trithiandecane, Tetrakiss (mercaptomethylthiomethyl) methane, Tetraquis (2-mercaptoethylthiomethyl) Methane, tetrakis (3-mercaptopropylthiomethyl) methane, 1,1,3,3-tetrakis (mercaptomethylthio) propane, 1,1,2,2-tetrakis (mercaptomethylthio) ethane, 4,6-bis (mercapto) Methylthio) -1,3-dithian, 1,1,5,5-tetrakis (mercaptomethylthio) -3-thiapentane, 1,1,6,6-tetrakis (mercaptomethylthio) -3,4-dithiahexane, 2,2 -Bis (mercaptomethylthio) ethanethiol, 3-mercaptomethylthio-1,7-dimercapto-2,6-dithiaheptan, 3,6-bis (mercaptomethylthio) -1,9-dimercapto-2,5,8-trithianonan, 3-Mercaptomethylthio-1,6-dimercapto-2,5-dithiahexa , 1,1,9,9-tetrakis (mercaptomethylthio) -5- (3,3-bis (mercaptomethylthio) -1-thiapropyl) 3,7-dithianonan, tris (2,2-bis (mercaptomethylthio) Ethyl) methane, tris (4,5-bis (mercaptomethylthio) -2-thiabutyl) methane, tetrakis (2,2-bis (mercaptomethylthio) ethyl) methane, tetrakis (4,4-bis (mercaptomethylthio) -2 -Thiabutyl) Methane, 3,5,9,11-Tetrakiss (Mercaptomethylthio) -1,13-Dimercapto-2,6,8,12-Tetrathiatridecane, 3,5,9,11,15,17- Hexakis (mercaptomethylthio) -1,19-dimercapto-2,6,8,12,14,18-hexathianonadecane, 9- (2,2-bis (mercaptomethylthio) ethyl) -3,5,13, 15-Tetrakiss (Mercaptomethylthio) -1,17-Dimercapto-2,6,8,10,12,16-Hexatiaheptadecane, 3,4,8,9-Tetrakis (Mercaptomethylthio) -1,11-Dimercapto -2,5,7,10-Tetrathiaundecane, 3,4,8,9,13,14-Hexakis (mercaptomethylthio) -1,16-dimercapto-2,5,7,10,12,15-hexa Thiahexadecane, 8- [bis (mercaptomethylthio) methyl] -3,4,12,13-tetrakis (mercaptomethylthio) -1,15-dimercapto-2,5,7,9,11,14-hexathiapentadecane, 4,6-bis [3,5-bis (mercaptomethylthio) -7-mercapto-2,6-dithiaheptilthio] -1,3-ditian, 4- [3,5-bis (mercaptomethylthio) -7 -Mercapto-2,6-dithiaheptilthio] -6-Mercaptomethylthio-1,3-dithian, 1,1-bis [4- (6-mercaptomethylthio) -1,3-dithianilthio] -1,3- Bis (mercaptomethylthio) propane, 1- [4- (6-mercaptomethylthio) -1,3-dithianylthio] -3- [2,2-bis (mercaptomethylthio) ethyl] -7,9-bis (mercaptomethylthio) -2,4,5,6,10-Tetrathiaundecane, 1,5-bis [4- (6-mercaptomethylthio) -1,3-dithianylthio] -3- [2- (1,3-dithietanyl)] methyl- 2,4-Dithiapentane, 3- [2- (1,3-Dithietane)] Methyl-7,9-bis (mercaptomethylthio) -1,11-dimercapto-2,4,6,10-tetrathiandecan, 9- [2- (1,3) -Dithietane)] Methyl-3,5,13,15-Tetrax (mercaptomethylthio) -1,17-dimercapto-2,6,8,10,12,16-hexathiaheptadecane, 3-[2- (1) , 3-Dithietane)] Methyl-7,9,13,15-Tetrax (mercaptomethylthio) -1,17-dimercapto-2,4,6,10,12,16-hexathiaheptadecane, 3,7-bis [2- (1,3-Dithietane)] Methyl-1,9-dimercapto-2,4,6,8-tetrathianonane, 4,6-bis {3- [2- (1,3-dithietane)] Methyl-5-mercapto-2,4-dithiapentylthio} -1,3-dithiolane, 4,6-bis [4- (6-mercaptomethylthio) -1,3-dithianilthio] -6- [4-( 6-Mercaptomethylthio) -1,3-dithianylthio] -1,3-dithiane, 4- [3,4,8,9-tetrakis (mercaptomethylthio) -11-mercapto-2,5,7,10-tetrathia Undecyl] -5-mercaptomethylthio-1,3-dithiolane, 4,5-bis [3,4-bis (mercaptomethylthio) -6-mercapto-2,5-dithiahexylthio] -1,3-dithiolane , 4- [3,4-bis (mercaptomethylthio) -6-mercapto-2,5-dithiahexylthio] -5-mercaptomethylthio-1,3-dithiolane, 4- [3-bis (mercaptomethylthio) methyl -5,6-bis (mercaptomethylthio) -8-mercapto-2,4,7-trithiaoctyl] -5-mercaptomethylthio-1,3-dithiolane, 2-{bis [3,4-bis (mercaptomethylthio) ) -6-Mercapto-2,5-dithiahexylthio] methyl} -1,3-dithietane, 2- [3,4-bis (mercaptomethylthio) -6-mercapto-2,5-dithiahexylthio] Mercaptomethylthiomethyl-1,3-dithietane, 2- [3,4,8,9-tetrakis (mercaptomethylthio) -11-mercapto-2,5,7,10-tetrathiandesylthio] mercaptomethylthiomethyl-1 , 3-Dithietane, 2- [3-bis (mercaptomethylthio) methyl-5,6-bis (mercaptomethylthio) -8-me Lucapto-2,4,5-trithiaoctyl] mercaptomethylthiomethyl-1,3-dithietane, 4,5-bis {1- [2- (1,3-dithietanyl)]-3-mercapto-2-thiapropyl Thio} -1,3-dithiolane, 4- {1- [2- (1,3-dithietane)]-3-mercapto-2-thiapropylthio} -5- [1,2-bis (mercaptomethylthio)- 4-Mercapto-3-thiabutylthio] -1,3-dithiolane, 2- {bis [4- (5-mercaptomethylthio-1,3-dithiolanyl) thio] methyl} -1,3-dithietane, 4- [4- [4- (5-Mercaptomethylthio-1,3-dithiolanyl) Thio] -5- {1- [2- (1,3-dithietanyl)]-3-Mercapto-2-thiapropylthio} -1,3-dithiolane, etc. Can be mentioned.
Examples of commercially available products of these polythiol compounds include TS-G manufactured by Shikoku Chemicals Corporation, DPMP and PEMP manufactured by SC Organic Chemistry Co., Ltd., and PETG manufactured by Yodo Chemical Co., Ltd.
In particular, it is preferable to use a polythiol compound having a valence of 4 or more because a compound having excellent curability can be obtained.
 前記アミン系潜在性硬化剤としては、例えば、シュウ酸ジヒドラジド、マロン酸ジヒドラジド、コハク酸ジヒドラジド、グルタル酸ジヒドラジド、アジピン酸ジヒドラジド、スベリン酸ジヒドラジド、アゼライン酸ジヒドラジド、セバシン酸ジヒドラジド、フタル酸ジヒドラジド等の二塩基酸ジヒドラジド;ベンゾグアナミン、アセトグアナミン等のグアナミン;ジシアンジアミド;メラミン;アミン化合物とカルボン酸との脱水縮合物、アミン化合物とエポキシ化合物との付加物、アミン化合物とイソシアネート化合物との付加物、アミン化合物のマイケル付加物、アミン化合物のマンニッヒ反応物、アミン化合物と尿素との縮合物、アミン化合物とケトンとの縮合物等の変性アミン等が挙げられる。 Examples of the amine-based latent curing agent include dihydrazide oxalate, dihydrazide malonic acid, dihydrazide succinate, dihydrazide glutarate, dihydrazide adipate, dihydrazide suberic acid, dihydrazide azelaine, dihydrazide sevacinate, and dihydrazide phthalate. Basic acid dihydrazide; guanamines such as benzoguanamine and acetoguanamine; dicyandiamide; melamine; dehydration condensates of amine compounds and carboxylic acids, additions of amine compounds and epoxy compounds, additions of amine compounds and isocyanate compounds, amine compounds Examples thereof include a Michael adduct, a Mannig reaction product of an amine compound, a condensate of an amine compound and urea, and a modified amine such as a condensate of an amine compound and a ketone.
 前記アミン系潜在性硬化剤の中でも、活性水素を1個以上有するアミン化合物とポリエポキシ化合物及び/又はポリイソシアネート化合物との付加物、あるいはこれにフェノール樹脂を組み合わせて得られるものが好ましいものとして挙げられる。 Among the amine-based latent curing agents, those obtained by adducting an amine compound having one or more active hydrogens and a polyepoxy compound and / or a polyisocyanate compound, or a combination thereof with a phenol resin are preferable. Be done.
 前記活性水素を1個以上有するアミン化合物としては、例えば、エチレンジアミン、1,2-ジアミノプロパン、1,3-ジアミノプロパン、1,3-ジアミノブタン、1,4-ジアミノブタン、ヘキサメチレンジアミン等のアルキレンジアミン類;ジエチレントリアミン、トリエチレントリアミン、テトラエチレンペンタミン等のポリアルキルポリアミン類;1,4-ジアミノシクロヘキサン、1,3-ジアミノシクロヘキサン、1,3-ジアミノメチルシクロヘキサン、1,2-ジアミノシクロヘキサン、1,4-ジアミノ-3,6-ジエチルシクロヘキサン、4,4’-ジアミノジシクロヘキシルメタン、1,3-ビス(アミノメチル)シクロヘキサン、1,4-ビス(アミノメチル)シクロヘキサン、4,4’-ジアミノジシクロヘキシルプロパン、ビス(4-アミノシクロヘキシル)スルホン、4,4’-ジアミノジシクロヘキシルエーテル、2,2’-ジメチル-4,4‘-ジアミノジシクロヘキシルメタン、イソホロンジアミン、ノルボルネンジアミン等の脂環式ポリアミン類;m-キシリレンジアミン、ジアミノジフェニルメタン、ジアミノジフェニルスルホン、ジエチルトルエンジアミン、1-メチル-3,5-ジエチル-2,4-ジアミンベンゼン、1-メチル-3,5-ジエチル-2,6-ジアミノベンゼン、1,3,5-トリエチル-2,6-ジアミノベンゼン、3,3’-ジエチル-4,4’-ジアミノジフェニルメタン、3,5,3’、5’-テトラメチル-4,4‘-ジアミノジフェニルメタン等の芳香族ポリアミン類;ベンゾグアナミン、アセトグアナミン等のグアナミン類;2-メチルイミダゾール、2-エチル-4-メチルイミダゾール、2-イソプロピルイミダゾール、2-ウンデシルイミダゾール、2-ヘプタデシルイミダゾール、2-フェニルイミダゾール、2-フェニル-4-メチルイミダゾール、2-アミノプロピルイミダゾール等のイミダゾール類;シュウ酸ジヒドラジド、マロン酸ジヒドラジド、コハク酸ジヒドラジド、グルタル酸ジヒドラジド、アジピン酸ジヒドラジド、スベリン酸ジヒドラジド、アゼライン酸ジヒドラジド、セバシン酸ジヒドラジド、フタル酸ジヒドラジド等のジヒドラジド類;N,N-ジメチルアミノエチルアミン、N,N-ジエチルアミノエチルアミン、N,N-ジイソプロピルアミノエチルアミン、N,N-ジアリルアミノエチルアミン、N,N-ベンジルメチルアミノエチルアミン、N,N-ジベンジルアミノエチルアミン、N,N-シクロヘキシルメチルアミノエチルアミン、N,N-ジシクロヘキシルアミノエチルアミン、N-(2-アミノエチル)ピロリジン、N-(2-アミノエチル)ピペリジン、N-(2-アミノエチル)モルホリン、N-(2-アミノエチル)ピペラジン、N-(2-アミノエチル)-N’-メチルピペラジン、N,N-ジメチルアミノプロピルアミン、N,N-ジエチルアミノプロピルアミン、N,N-ジイソプロピルアミノプロピルアミン、N,N-ジアリルアミノプロピルアミン、N,N-ベンジルメチルアミノプロピルアミン、N,N-ジベンジルアミノプロピルアミン、N,N-シクロヘキシルメチルアミノプロピルアミン、N,N-ジシクロヘキシルアミノプロピルアミン、N-(3-アミノプロピル)ピロリジン、N-(3-アミノプロピル)ピペリジン、N-(3-アミノプロピル)モルホリン、N-(3-アミノプロピル)ピペラジン、N-(3-アミノプロピル)-N’-メチルピペリジン、4-(N,N-ジメチルアミノ)ベンジルアミン、4-(N,N-ジエチルアミノ)ベンジルアミン、4-(N,N-ジイソプロピルアミノ)ベンジルアミン、N,N,-ジメチルイソホロンジアミン、N,N-ジメチルビスアミノシクロヘキサン、N,N,N’-トリメチルエチレンジアミン、N’-エチル-N,N-ジメチルエチレンジアミン、N,N,N’-トリメチルエチレンジアミン、N’-エチル-N,N-ジメチルプロパンジアミン、N’-エチル-N,N-ジベンジルアミノプロピルアミン;N,N-(ビスアミノプロピル)-N-メチルアミン、N,N-ビスアミノプロピルエチルアミン、N,N-ビスアミノプロピルプロピルアミン、N,N-ビスアミノプロピルブチルアミン、N,N-ビスアミノプロピルペンチルアミン、N,N-ビスアミノプロピルヘキシルアミン、N,N-ビスアミノプロピル-2-エチルヘキシルアミン、N,N-ビスアミノプロピルシクロヘキシルアミン、N,N-ビスアミノプロピルベンジルアミン、N,N-ビスアミノプロピルアリルアミン、ビス〔3-(N,N-ジメチルアミノプロピル)〕アミン、ビス〔3-(N,N-ジエチルアミノプロピル)〕アミン、ビス〔3-(N,N-ジイソプロピルアミノプロピル)〕アミン、ビス〔3-(N,N-ジブチルアミノプロピル)〕アミン等が挙げられる。 Examples of the amine compound having one or more active hydrogens include ethylenediamine, 1,2-diaminopropane, 1,3-diaminopropane, 1,3-diaminobutane, 1,4-diaminobutane, and hexamethylenediamine. Alkylenediamines; polyalkylpolyamines such as diethylenetriamine, triethylenetriamine, tetraethylenepentamine; 1,4-diaminocyclohexane, 1,3-diaminocyclohexane, 1,3-diaminomethylcyclohexane, 1,2-diaminocyclohexane, 1,4-diamino-3,6-diethylcyclohexane, 4,4'-diaminodicyclohexylmethane, 1,3-bis (aminomethyl) cyclohexane, 1,4-bis (aminomethyl) cyclohexane, 4,4'-diamino Adicyclic polyamines such as dicyclohexylpropane, bis (4-aminocyclohexyl) sulfone, 4,4'-diaminodicyclohexyl ether, 2,2'-dimethyl-4,4'-diaminodicyclohexylmethane, isophorondiamine, norbornenediamine; m-xylylene diamine, diaminodiphenylmethane, diaminodiphenylsulfone, diethyltoludidiamine, 1-methyl-3,5-diethyl-2,4-diaminebenzene, 1-methyl-3,5-diethyl-2,6-diaminobenzene , 1,3,5-triethyl-2,6-diaminobenzene, 3,3'-diethyl-4,4'-diaminodiphenylmethane, 3,5,3', 5'-tetramethyl-4,4'-diamino Aromatic polyamines such as diphenylmethane; guanamines such as benzoguanamine and acetoguanamine; 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-isopropylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2- Imidazoles such as phenyl imidazole, 2-phenyl-4-methyl imidazole, 2-aminopropyl imidazole; dihydrazide oxalic acid, dihydrazide malonic acid, dihydrazide succinic acid, dihydrazide glutalic acid, dihydrazide adipic acid, dihydrazide siberic acid, dihydrazide azelaic acid Dihydrazides such as sebasic acid dihydrazide and phthalic acid dihydrazide; N, N-dimethylaminoethylamine, N, N-diethylaminoethylamine, N, N-diisopropylaminoethylamine, N, N-diallylaminoethylamine , N, N-benzylmethylaminoethylamine, N, N-dibenzylaminoethylamine, N, N-cyclohexylmethylaminoethylamine, N, N-dicyclohexylaminoethylamine, N- (2-aminoethyl) pyrrolidine, N- (2) -Aminoethyl) piperidine, N- (2-aminoethyl) morpholine, N- (2-aminoethyl) piperazine, N- (2-aminoethyl) -N'-methylpiperazine, N, N-dimethylaminopropylamine, N, N-diethylaminopropylamine, N, N-diisopropylaminopropylamine, N, N-diallylaminopropylamine, N, N-benzylmethylaminopropylamine, N, N-dibenzylaminopropylamine, N, N- Cyclohexylmethylaminopropylamine, N, N-dicyclohexylaminopropylamine, N- (3-aminopropyl) pyrrolidine, N- (3-aminopropyl) piperidine, N- (3-aminopropyl) morpholine, N- (3- (3-aminopropyl) Aminopropyl) piperazine, N- (3-aminopropyl) -N'-methylpiperidine, 4- (N, N-dimethylamino) benzylamine, 4- (N, N-diethylamino) benzylamine, 4- (N, N-diisopropylamino) benzylamine, N, N, -dimethylisophoronediamine, N, N-dimethylbisaminocyclohexane, N, N, N'-trimethylethylenediamine, N'-ethyl-N, N-dimethylethylenediamine, N, N, N'-trimethylethylenediamine, N'-ethyl-N, N-dimethylpropanediamine, N'-ethyl-N, N-dibenzylaminopropylamine; N, N- (bisaminopropyl) -N-methylamine , N, N-bisaminopropyl ethylamine, N, N-bisaminopropylpropylamine, N, N-bisaminopropylbutylamine, N, N-bisaminopropylpentylamine, N, N-bisaminopropylhexylamine, N , N-bisaminopropyl-2-ethylhexylamine, N, N-bisaminopropylcyclohexylamine, N, N-bisaminopropylbenzylamine, N, N-bisaminopropylallylamine, bis [3- (N, N-) Dimethylaminopropyl)] amine, bis [3- (N, N-diethylaminopropyl)] amine, bis [3- (N, N-diisopropylaminopropyl)] amine, bis [3- (N, N-dib) Tylaminopropyl)] Amine and the like can be mentioned.
 前記ポリエポキシ化合物としては、例えば、ハイドロキノン、レゾルシン、ピロカテコール、フロログルシノール等の単核多価フェノール化合物のポリグリシジルエーテル化合物;ジヒドロキシナフタレン、ビフェノール、メチレンビスフェノール(ビスフェノールF)、メチレンビス(オルトクレゾール)、エチリデンビスフェノール、イソプロピリデンビスフェノール(ビスフェノールA)、イソプロピリデンビス(オルトクレゾール)、テトラブロモビスフェノールA、1,3-ビス(4-ヒドロキシクミルベンゼン)、1,4-ビス(4-ヒドロキシクミルベンゼン)、1,1,3-トリス(4-ヒドロキシフェニル)ブタン、1,1,2,2-テトラ(4-ヒドロキシフェニル)エタン、チオビスフェノール、スルホニルビスフェノール、オキシビスフェノール、フェノールノボラック、オルソクレゾールノボラック、エチルフェノールノボラック、ブチルフェノールノボラック、オクチルフェノールノボラック、レゾルシンノボラック、テルペンフェノール等の多核多価フェノール化合物のポリグリシジルエーテル化合物;エチレングリコール、プロピレングリコール、ブチレングリコール、ヘキサンジオール、ポリグリコール、チオジグリコール、グリセリン、トリメチロールプロパン、ペンタエリスリトール、ソルビトール、ビスフェノールA-アルキレンオキシド付加物等の多価アルコール類のポリグリシジルエーテル;マレイン酸、フマル酸、イタコン酸、コハク酸、グルタル酸、スベリン酸、アジピン酸、アゼライン酸、セバシン酸、ダイマー酸、トリマー酸、フタル酸、イソフタル酸、テレフタル酸、トリメリット酸、トリメシン酸、ピロメリット酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、エンドメチレンテトラヒドロフタル酸等の脂肪族、芳香族又は脂環族多塩基酸のグリシジルエステル類、及び、グリシジルメタクリレートの単独重合体又は共重合体;N,N-ジグリシジルアニリン、ビス(4-(N-メチル-N-グリシジルアミノ)フェニル)メタン、ジグリシジルオルトトルイジン等のグリシジルアミノ基を有するエポキシ化合物;ビニルシクロヘキセンジエポキシド、ジシクロペンタンジエンジエポキサイド、3,4-エポキシシクロヘキシルメチル-3,4-エポキシシクロヘキサンカルボキシレート、3,4-エポキシ-6-メチルシクロヘキシルメチル-6-メチルシクロヘキサンカルボキシレート、ビス(3,4-エポキシ-6-メチルシクロヘキシルメチル)アジペート等の環状オレフィン化合物のエポキシ化物;エポキシ化ポリブタジエン、エポキシ化スチレン-ブタジエン共重合物等のエポキシ化共役ジエン重合体、トリグリシジルイソシアヌレート等の複素環化合物が挙げられる。 Examples of the polyepoxy compound include polyglycidyl ether compounds of mononuclear polyvalent phenol compounds such as hydroquinone, resorcin, pyrocatechol, and fluoroglucolcinol; dihydroxynaphthalene, biphenol, methylenebisphenol (bisphenol F), and methylenebis (orthocresol). , Echiliden bisphenol, isopropyridene bisphenol (bisphenol A), isopropyridene bis (orthocresol), tetrabromobisphenol A, 1,3-bis (4-hydroxycumylbenzene), 1,4-bis (4-hydroxycumyl) Benzene), 1,1,3-tris (4-hydroxyphenyl) butane, 1,1,2,2-tetra (4-hydroxyphenyl) ethane, thiobisphenol, sulfonylbisphenol, oxybisphenol, phenol novolac, orthocresol novolac Polyglycidyl ether compounds of polynuclear polyvalent phenolic compounds such as ethylphenol novolac, butylphenol novolac, octylphenol novolac, resorcinnovolac, terpenphenol; ethylene glycol, propylene glycol, butylene glycol, hexanediol, polyglycol, thiodiglycol, glycerin, Polyglycidyl ethers of polyhydric alcohols such as trimethylolpropane, pentaerythritol, sorbitol, bisphenol A-alkylene oxide adduct; maleic acid, fumaric acid, itaconic acid, succinic acid, glutaric acid, suberic acid, adipic acid, azelaic acid , Sevacinic acid, dimer acid, trimeric acid, phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, trimesic acid, pyromellitic acid, tetrahydrophthalic acid, hexahydrophthalic acid, endomethylene tetrahydrophthalic acid and other aliphatic and aromatic Glycidyl esters of group or alicyclic polybasic acids, and homopolymers or copolymers of glycidyl methacrylate; N, N-diglycidylaniline, bis (4- (N-methyl-N-glycidylamino) phenyl) Epoxy compounds having a glycidyl amino group such as methane, diglycidyl orthotoluidine; vinylcyclohexene diepoxide, dicyclopentanediene diepoxyside, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 3,4-epoxy -6-Methylcyclohexylmethyl-6-methi Epoxides of cyclic olefin compounds such as lucyclohexanecarboxylate, bis (3,4-epoxy-6-methylcyclohexylmethyl) adipate; epoxidized conjugated diene polymers such as epoxidized polybutadiene, epoxidized styrene-butadiene copolymer, Examples thereof include heterocyclic compounds such as triglycidyl isocyanurate.
 前記ポリイソシアネート化合物としては、例えば、2,4-トリレンジイソシアネート、2,6-トリレンジイソシアネート、ジフェニルメタン-4,4‘-ジイソシアネート、フェニレンジイソシアネート、キシリレンジイソシアネート、テトラメチルキシリレンジイソシアネート、1,5-ナフチレンジイソシアネート、1,5-テトラヒドロナフタレンジイソシアネート、3,3’-ジメチルジフェニル-4,4‘-ジイソシアネート、ジアニシジンジイソシアネート、テトラメチルキシリレンジイソシアネート等の芳香族ジイソシアネート;イソホロンジイソシアネート、ジシクロヘキシルメタン-4,4’-ジイソシアネート、トランス-1,4-シクロヘキシルジイソシアネート、ノルボルネンジイソシアネート等の脂環式ジイソシアネート;テトラメチレンジイソシアネート、1,6-ヘキサメチレンジイソシアネート、2,2,4及び/又は(2,4,4)-トリメチルヘキサメチレンジイソシアネート、リシンジイソシアネート等の脂肪族ジイソシアネート;前記例示のジイソシアネートのイソシアヌレート三量化物、ビューレット三量化物、トリメチロールプロパンアダクト化物等;トリフェニルメタントリイソシアネート、1-メチルベンゾール-2,4,6-トリイソシアネート、ジメチルトリフェニルメタンテトライソシアネート等が挙げられる。
 更にこれらのイソシアネート化合物はカルボジイミド変性、イソシアヌレート変性、ビウレット変性等の形で用いてもよく、各種のブロッキング剤によってブロックされたブロックイソシアネートの形で用いてもよい。
Examples of the polyisocyanate compound include 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, diphenylmethane-4,4'-diisocyanate, phenylenedi isocyanate, xylylene diisocyanate, tetramethylxylylene diisocyanate, 1,5. -Aromatic diisocyanates such as naphthylene diisocyanate, 1,5-tetrahydronaphthalenedisocyanate, 3,3'-dimethyldiphenyl-4,4'-diisocyanate, dianisidine diisocyanate, tetramethylxylylene diisocyanate; isophorone diisocyanate, dicyclohexylmethane-4 , 4'-Diisocyanate, trans-1,4-cyclohexyldiisocyanate, norbornene diisocyanate and other alicyclic diisocyanates; tetramethylene diisocyanate, 1,6-hexamethylene diisocyanate, 2,2,4 and / or (2,4,4) )-Adicyclic diisocyanates such as trimethylhexamethylene diisocyanate and lysine diisocyanate; isocyanurate trimersides, burette trimerates, trimethylolpropane adductates, etc. of the above-exemplified diisocyanates; triphenylmethane triisocyanates, 1-methylbenzol- Examples thereof include 2,4,6-triisocyanate and dimethyltriphenylmethanetetraisocyanate.
Further, these isocyanate compounds may be used in the form of carbodiimide modification, isocyanurate modification, biuret modification or the like, or may be used in the form of blocked isocyanate blocked by various blocking agents.
 前記フェノール樹脂としては、例えば、フェノールノボラック樹脂、クレゾールノボラック樹脂、芳香族炭化水素ホルムアルデヒド樹脂変性フェノール樹脂、ジシクロペンタジエンフェノール付加型樹脂、フェノールアラルキル樹脂(ザイロック樹脂)、ナフトールアラルキル樹脂、トリスフェニロールメタン樹脂、テトラフェニロールエタン樹脂、ナフトールノボラック樹脂、ナフトール-フェノール共縮合ノボラック樹脂、ナフトール-クレゾール共縮合ノボラック樹脂、ビフェニル変性フェノール樹脂(ビスメチレン基でフェノール核が連結された多価フェノール化合物)、ビフェニル変性ナフトール樹脂(ビスメチレン基でフェノール核が連結された多価ナフトール化合物)、アミノトリアジン変性フェノール樹脂(フェノール骨格、トリアジン環及び1級アミノ基を分子構造中に有する化合物)、及び、アルコキシ基含有芳香環変性ノボラック樹脂(ホルムアルデヒドでフェノール核及びアルコキシ基含有芳香環が連結された多価フェノール化合物)等の多価フェノール化合物が挙げられる。 Examples of the phenol resin include phenol novolac resin, cresol novolac resin, aromatic hydrocarbon formaldehyde resin-modified phenol resin, dicyclopentadienephenol-added resin, phenol aralkyl resin (Zyroc resin), naphthol aralkyl resin, and trisphenylol methane. Resin, tetraphenylol ethane resin, naphthol novolac resin, naphthol-phenol co-condensed novolac resin, naphthol-cresol co-condensed novolac resin, biphenyl-modified phenol resin (polyhydric phenol compound in which phenol nuclei are linked by bismethylene groups), biphenyl-modified Naftor resin (a polyvalent naphthol compound in which a phenol nucleus is linked with a bismethylene group), aminotriazine-modified phenol resin (a compound having a phenol skeleton, a triazine ring and a primary amino group in its molecular structure), and an alkoxy group-containing aromatic ring. Examples thereof include polyhydric phenol compounds such as modified novolak resins (polyhydric phenol compounds in which a phenol core and an alkoxy group-containing aromatic ring are linked with formaldehyde).
 前記アミン系潜在性硬化剤の市販品としては、例えば、アデカハードナー EH-3636S(株式会社ADEKA製;ジシアンジアミド型潜在性硬化剤)、アデカハードナー EH-4351S(株式会社ADEKA製;ジシアンジアミド型潜在性硬化剤)、アデカハードナー EH-5011S(株式会社ADEKA製;イミダゾール型潜在性硬化剤)、アデカハードナー EH-5046S(株式会社ADEKA製;イミダゾール型潜在性硬化剤)、アデカハードナー EH-4357S(株式会社ADEKA製;ポリアミン型潜在性硬化剤)、アデカハードナー EH-5057P(株式会社ADEKA製;ポリアミン型潜在性硬化剤)、アデカハードナー EH-5057PK(株式会社ADEKA製;ポリアミン型潜在性硬化剤)、アミキュアPN-23(味の素ファインテクノ株式会社製;アミンアダクト系潜在性硬化剤)、アミキュアPN-40(味の素ファインテクノ株式会社製;アミンアダクト系潜在性硬化剤)、アミキュアVDH(味の素ファインテクノ株式会社製;ヒドラジド系潜在性硬化剤)、フジキュアFXR-1020(株式会社T&K TOKA製;潜在性硬化剤)等が挙げられる。 Commercially available products of the amine-based latent curing agent include, for example, ADEKA Hardener EH-3636S (manufactured by ADEKA Corporation; dicyandiamide type latent curing agent) and ADEKA Hardener EH-4351S (manufactured by ADEKA Corporation; dicyandiamide type latent curing agent). ADEKA Hardener EH-5011S (manufactured by ADEKA Corporation; imidazole type latent curing agent), ADEKA Hardener EH-5046S (manufactured by ADEKA Corporation; imidazole type latent curing agent), ADEKA Hardener EH-4357S (ADEKA Corporation) Made by Polyamine type latent curing agent), ADEKA Hardener EH-5057P (manufactured by ADEKA Corporation; Polyamine type latent curing agent), ADEKA Hardener EH-5057PK (made by ADEKA Corporation; Polyamine type latent curing agent), Amicure PN -23 (Ajinomoto Fine Techno Co., Ltd .; Amin Adduct-based latent curing agent), Amicure PN-40 (Ajinomoto Fine Techno Co., Ltd .; Amin Adduct-based latent curing agent), Amicure VDH (Ajinomoto Fine Techno Co., Ltd .; Hydrazide-based latent hardener), Fujicure FXR-1020 (manufactured by T & K TOKA Corporation; latent hardener) and the like.
 本発明に使用される(B)成分である硬化剤の使用量は、特に限定されるものではないが、(A)成分とエポキシ基及び/又は反応性不飽和結合を有するその他の化合物との合計100質量部に対し、1~100質量部、好ましくは2~50質量部である。 The amount of the curing agent used as the component (B) used in the present invention is not particularly limited, but the amount of the component (A) and the epoxy group and / or other compound having a reactive unsaturated bond is used. It is 1 to 100 parts by mass, preferably 2 to 50 parts by mass with respect to 100 parts by mass in total.
 また、本発明の硬化性組成物には、(B)成分である硬化剤とともに硬化触媒を併用することができ、該硬化触媒としては、例えば、トリフェニルホスフィン等のホスフィン化合物;テトラフェニルホスフォニウムブロマイド等のホスホニウム塩;2-メチルイミダゾール、2-フェニルイミダゾール、2-エチル-4-メチルイミダゾール、2-ウンデシルイミダゾール、1-シアノエチル-2-メチルイミダゾール、1-{3-〔(3-トリメトキシシリル)プロピルアミノカルボニルアミノ〕プロピル}-2-メチルイミダゾール、1-〔3-トリメトキシシリルプロピルアミノメチル〕-4-メチルイミダゾール、1-〔3-(トリメトキシシリルプロピル)〕イミダゾール、1-〔3-(トリメトキシシリルプロピル)〕イミダゾール等のイミダゾール類;前記イミダゾール類と、トリメリット酸、イソシアヌル酸、硼素等との塩であるイミダゾール塩類;ベンジルジメチルアミン、2,4,6-トリス(ジメチルアミノメチル)フェノール等のアミン類;トリメチルアンモニウムクロライド等の4級アンモニウム塩類;3-(p-クロロフェニル)-1,1-ジメチルウレア、3-(3,4-ジクロロフェニル)-1,1-ジメチルウレア、3-フェニル-1,1-ジメチルウレア、イソホロンジイソシアネート-ジメチルウレア、トリレンジイソシアネート-ジメチルウレア等のウレア類;及び、三フッ化硼素と、アミン類やエーテル化合物等との錯化合物等を例示することができる。これらの硬化促進剤は、単独で使用してもよいし、2種類以上を併用してもよい。 Further, in the curable composition of the present invention, a curing catalyst can be used in combination with the curing agent as the component (B), and the curing catalyst includes, for example, a phosphine compound such as triphenylphosphine; tetraphenylphospho. Phosphonium salts such as nium bromide; 2-methylimidazole, 2-phenylimidazole, 2-ethyl-4-methylimidazole, 2-undecyl imidazole, 1-cyanoethyl-2-methyl imidazole, 1- {3-[(3- Trimethoxysilyl) propylaminocarbonylamino] propyl} -2-methylimidazole, 1- [3-trimethoxysilylpropylaminomethyl] -4-methylimidazole, 1- [3- (trimethoxysilylpropyl)] imidazole, 1 -[3- (Trimethoxysilylpropyl)] imidazoles such as imidazole; imidazole salts which are salts of the imidazoles with trimellitic acid, isocyanuric acid, boron and the like; benzyldimethylamine, 2,4,6-tris Amines such as (dimethylaminomethyl) phenol; quaternary ammonium salts such as trimethylammonium chloride; 3- (p-chlorophenyl) -1,1-dimethylurea, 3- (3,4-dichlorophenyl) -1,1- Ureas such as dimethylurea, 3-phenyl-1,1-dimethylurea, isophoronediisocyanate-dimethylurea, tolylene diisocyanate-dimethylurea; and complex compounds of boron trifluoride with amines, ether compounds, etc. Can be exemplified. These curing accelerators may be used alone or in combination of two or more.
 前記硬化触媒の使用量としては、(A)成分とエポキシ基及び/又は反応性不飽和結合を有するその他の化合物の合計100質量部に対し、0.01~20質量部であることが好ましい。 The amount of the curing catalyst used is preferably 0.01 to 20 parts by mass with respect to 100 parts by mass in total of the component (A) and the epoxy group and / or other compound having a reactive unsaturated bond.
 本発明に使用される(B)成分である重合開始剤としては、熱ラジカル重合開始剤、光ラジカル重合開始剤、カチオン重合開始剤が挙げられる。 Examples of the polymerization initiator which is the component (B) used in the present invention include a thermal radical polymerization initiator, a photoradical polymerization initiator, and a cationic polymerization initiator.
 熱ラジカル重合開始剤としては、加熱によりラジカルを発生するものであれば特に制限されず従来既知の化合物を用いることが可能であり、例えば、アゾ系化合物、過酸化物及び過硫酸塩等を好ましいものとして例示することができる。 The thermal radical polymerization initiator is not particularly limited as long as it generates radicals by heating, and conventionally known compounds can be used. For example, azo compounds, peroxides, persulfates and the like are preferable. It can be exemplified as a thing.
 前記アゾ系化合物としては、例えば、2,2′-アゾビスイソブチロニトリル、2,2′-アゾビス(メチルイソブチレ-ト)、2,2’-アゾビス-2,4-ジメチルバレロニトリル、1,1’-アゾビス(1-アセトキシ-1-フェニルエタン)等が挙げられる。 Examples of the azo compound include 2,2'-azobisisobutyronitrile, 2,2'-azobis (methylisobutyrate), 2,2'-azobis-2,4-dimethylvaleronitrile, 1, Examples thereof include 1'-azobis (1-acetoxy-1-phenylethane).
 前記過酸化物としては、例えば、ベンゾイルパーオキサイド、ジ-t-ブチルベンゾイルパーオキサイド、t-ブチルパーオキシピバレート及びジ(4-t-ブチルシクロヘキシル)パーオキシジカーボネート等が挙げられる。 Examples of the peroxide include benzoyl peroxide, di-t-butylbenzoyl peroxide, t-butylperoxypivalate, and di (4-t-butylcyclohexyl) peroxydicarbonate.
 前記過硫酸塩としては、例えば、過硫酸アンモニウム、過硫酸ナトリウム及び過硫酸カリウム等の過硫酸塩等が挙げられる。 Examples of the persulfate include persulfates such as ammonium persulfate, sodium persulfate and potassium persulfate.
 前記光ラジカル重合開始剤としては、光照射によりラジカルを発生するものであれば特に制限されず従来既知の化合物を用いることが可能であり、例えば、アセトフェノン系化合物、ベンジル系化合物、ベンゾフェノン系化合物、チオキサントン系化合物及びオキシムエステル系化合物等を好ましいものとして例示することができる。 The photoradical polymerization initiator is not particularly limited as long as it generates radicals by light irradiation, and conventionally known compounds can be used. For example, acetophenone compounds, benzyl compounds, benzophenone compounds, etc. A thioxanthone-based compound, an oxime ester-based compound, and the like can be exemplified as preferable ones.
 前記アセトフェノン系化合物としては、例えば、ジエトキシアセトフェノン、2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン、4’-イソプロピル-2-ヒドロキシ-2-メチルプロピオフェノン、2-ヒドロキシメチル-2-メチルプロピオフェノン、2,2-ジメトキシ-1,2-ジフェニルエタン-1-オン、p-ジメチルアミノアセトフェノン、p-ターシャリブチルジクロロアセトフェノン、p-ターシャリブチルトリクロロアセトフェノン、p-アジドベンザルアセトフェノン、1-ヒドロキシシクロヘキシルフェニルケトン、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルフォリノプロパノン-1、2-ベンジル-2-ジメチルアミノ-1-(4-モルフォリノフェニル)-ブタノン-1、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾイン-n-ブチルエーテル、ベンゾインイソブチルエーテル及び1-[4-(2-ヒドロキシエトキシ)-フェニル]-2-ヒドロキシ-2-メチル-1-プロパン-1-オン等が挙げられる。 Examples of the acetophenone compound include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 4'-isopropyl-2-hydroxy-2-methylpropiophenone, and 2-hydroxymethyl. -2-Methylpropiophenone, 2,2-dimethoxy-1,2-diphenylethane-1-one, p-dimethylaminoacetophenone, p-tershalibutyldichloroacetophenone, p-tershaributyltrichloroacetophenone, p-azide Benzalacetophenone, 1-hydroxycyclohexylphenylketone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropanone-1, 2-benzyl-2-dimethylamino-1- (4-morpholino) Phenyl) -butanone-1, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin-n-butyl ether, benzoin isobutyl ether and 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy- Examples thereof include 2-methyl-1-propane-1-one.
 前記ベンジル系化合物としては、例えば、ベンジル等が挙げられる。 Examples of the benzyl compound include benzyl and the like.
 前記ベンゾフェノン系化合物としては、例えば、ベンゾフェノン、o-ベンゾイル安息香酸メチル、ミヒラーケトン、4,4’-ビスジエチルアミノベンゾフェノン、4,4’-ジクロロベンゾフェノン及び4-ベンゾイル-4’-メチルジフェニルスルフィド等が挙げられる。 Examples of the benzophenone compound include benzophenone, methyl o-benzoylbenzoate, Michler ketone, 4,4'-bisdiethylaminobenzophenone, 4,4'-dichlorobenzophenone, 4-benzoyl-4'-methyldiphenylsulfide and the like. Be done.
 前記チオキサントン系化合物としては、例えば、チオキサントン、2-メチルチオキサントン、2-エチルチオキサントン、2-クロロチオキサントン、2-イソプロピルチオキサントン、2,4-ジエチルチオキサントン等が挙げられる。 Examples of the thioxanthone-based compound include thioxanthone, 2-methylthioxanthone, 2-ethylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, 2,4-diethylthioxanthone and the like.
 前記オキシムエステル系化合物とは、オキシムエステル基を有する化合物を意味し、前記光ラジカル重合開始剤の中でも感度が良好であることから、本発明の硬化性組成物に好ましく使用することができる。 The oxime ester-based compound means a compound having an oxime ester group, and since it has good sensitivity among the photoradical polymerization initiators, it can be preferably used in the curable composition of the present invention.
 前記オキシムエステル系化合物の中でもカルバゾール骨格、ジフェニルスルフィド骨格、フルオレン骨格を有する化合物は、特に感度が高いことから本発明の硬化性組成物に対してより好ましい。 Among the oxime ester compounds, a compound having a carbazole skeleton, a diphenylsulfide skeleton, and a fluorene skeleton is more preferable than the curable composition of the present invention because of its particularly high sensitivity.
 その他のラジカル重合開始剤としては、2,4,6-トリメチルベンゾイルジフェニルフォスフィンオキサイド等のホスフィンオキサイド系化合物及びビス(シクロペンタジエニル)-ビス[2,6-ジフルオロ-3-(ピル-1-イル)]チタニウム等のチタノセン系化合物等が挙げられる。 Other radical polymerization initiators include phosphine oxide compounds such as 2,4,6-trimethylbenzoyldiphenylphosphine oxide and bis (cyclopentadienyl) -bis [2,6-difluoro-3- (pill-1). -Il)] Titanosen-based compounds such as titanium can be mentioned.
 市販のラジカル重合開始剤としては、アデカオプトマーN-1414、N-1717、N-1919、アデカアークルズNCI-831、NCI-930(以上、ADEKA製);IRGACURE184、IRGACURE369、IRGACURE651、IRGACURE907、IRGACURE OXE 01、IRGACURE OXE 02、IRGACURE784(以上、BASF製);TR-PBG-304、TR-PBG-305、TR-PBG-309及びTR-PBG-314(以上、Tronly製);等が挙げられる。 Commercially available radical polymerization initiators include ADEKA PUTMER N-1414, N-1717, N-1919, ADEKA ARCLUS NCI-831, NCI-930 (all manufactured by ADEKA); IRGACURE184, IRGACURE369, IRGACURE651, IRGACURE907, IRGACURE. OXE 01, IRGACURE OXE 02, IRGACURE784 (above, manufactured by BASF); TR-PBG-304, TR-PBG-305, TR-PBG-309 and TR-PBG-314 (above, manufactured by Trolly); and the like.
 前記カチオン重合開始剤とは、エネルギー線照射又は加熱によりカチオン重合を開始させる物質を放出させることが可能な化合物であればどのようなものでも差し支えないが、好ましくは、エネルギー線の照射によってルイス酸を放出するオニウム塩である複塩、又はその誘導体である。かかる化合物の代表的なものとしては、下記一般式、
[A]r+[B]r-
で表される陽イオンと陰イオンの塩をあげることができる。
The cationic polymerization initiator may be any compound as long as it can release a substance that initiates cationic polymerization by irradiation with energy rays or heating, but is preferably Lewis acid by irradiation with energy rays. It is a double salt that is an onium salt that releases energy, or a derivative thereof. Typical examples of such compounds include the following general formulas.
[A] r + [B] r-
The salts of cations and anions represented by are given.
 ここで陽イオン[A]r+はオニウムであることが好ましく、その構造は、例えば、下記一般式、
[(R12aQ]r+
で表すことができる。
Here, the cation [A] r + is preferably onium, and its structure is, for example, the following general formula.
[(R 12 ) a Q] r +
Can be represented by.
 更にここで、R12は炭素原子数が1~60であり、炭素原子以外の原子をいくつ含んでいてもよい有機の基である。aは1~5なる整数である。a個のR12は各々独立で、同一でも異なっていてもよい。また、少なくとも1つは、芳香環を有する上記の如き有機の基であることが好ましい。QはS,N,Se,Te,P,As,Sb,Bi,O,I,Br,Cl,F,N=Nからなる群から選ばれる原子あるいは原子団である。また、陽イオン[A]r+中のQの原子価をqとしたとき、r=a-qなる関係が成り立つことが必要である(但し、N=Nは原子価0として扱う)。 Further, here, R 12 is an organic group having 1 to 60 carbon atoms and may contain any number of atoms other than carbon atoms. a is an integer from 1 to 5. The a R 12s are independent and may be the same or different. Further, at least one is preferably an organic group as described above having an aromatic ring. Q is an atom or atomic group selected from the group consisting of S, N, Se, Te, P, As, Sb, Bi, O, I, Br, Cl, F, N = N. Further, when the valence of Q in the cation [A] r + is q, it is necessary that the relationship r = aq is established (however, N = N is treated as having a valence of 0).
 また、陰イオン[B]r-は、ハロゲン化物錯体であることが好ましく、その構造は、例えば、下記一般式、
[LYbr-
表すことができる。
Further, the anion [B] r- is preferably a halide complex, and its structure is, for example, the following general formula.
It can be represented by [LY b ] r-.
 更にここで、Lはハロゲン化物錯体の中心原子である金属又は半金属(Metalloid)であり、B,P,As,Sb,Fe,Sn,Bi,Al,Ca,In,Ti,Zn,Sc,V,Cr,Mn,Co等である。Yはハロゲン原子である。bは3~7なる整数である。また、陰イオン[B]r-中のLの原子価をpとしたとき、r=b-pなる関係が成り立つことが必要である。 Further, here, L is a metal or metalloid that is the central atom of the halide complex, and B, P, As, Sb, Fe, Sn, Bi, Al, Ca, In, Ti, Zn, Sc, V, Cr, Mn, Co and the like. Y is a halogen atom. b is an integer of 3 to 7. Further, when the valence of L in the anion [B] r- is p, it is necessary that the relationship r = bp is established.
 上記一般式の陰イオン[LYbr-の具体例としては、テトラキス(ペンタフルオロフェニル)ボレート、テトラ(3,5-ジフルオロ-4-メトキシフェニル)ボレート、テトラフルオロボレート(BF4-、ヘキサフルオロフォスフェート(PF6-、ヘキサフルオロアンチモネート(SbF6-、ヘキサフルオロアルセネート(AsF6-、ヘキサクロロアンチモネート(SbCl6-等を挙げることができる。 Specific examples of the anion [LY b ] r- of the above general formula include tetrakis (pentafluorophenyl) borate, tetra (3,5-difluoro-4-methoxyphenyl) borate, and tetrafluoroborate (BF 4 ) -,. hexafluorophosphate (PF 6) -, hexafluoroantimonate (SbF 6) -, hexafluoroarsenate (AsF 6) -, hexachloroantimonate (SbCl 6) -, and the like.
 また、陰イオン[B]r-は、下記一般式、
[LYb-1(OH)]r
で表される構造のものも好ましく用いることができる。L,Y,bは上記と同様である。
 また、その他用いることのできる陰イオンとしては、過塩素酸イオン(ClO4-、トリフルオロメチル亜硫酸イオン(CF3SO3-、フルオロスルホン酸イオン(FSO3-、トルエンスルホン酸陰イオン、トリニトロベンゼンスルホン酸陰イオン、カンファースルフォネート、ノナフロロブタンスルフォネート、ヘキサデカフロロオクタンスルフォネート、テトラアリールボレート、テトラキス(ペンタフルオロフェニル)ボレート等を挙げることができる。
The anion [B] r- is the following general formula,
[LY b-1 (OH)] r
The structure represented by is also preferably used. L, Y, and b are the same as above.
Other anions that can be used include perchlorate ion (ClO 4 ) - , trifluoromethyl sulfite ion (CF 3 SO 3 ) - , fluorosulfonic acid ion (FSO 3 ) - , and toluene sulfonic acid anion. , Trinitrobenzene sulfonic acid anion, camphor sulphonate, nonafluorobutane sulphonate, hexadecafluorooctane sulphonate, tetraarylborate, tetrakis (pentafluorophenyl) borate and the like.
 本発明では、このようなオニウム塩の中でも、下記の(イ)~(ハ)の芳香族オニウム塩を使用することが特に有効である。これらの中から、その1種を単独で、又は2種以上を混合して使用することができる。 In the present invention, among such onium salts, it is particularly effective to use the following aromatic onium salts (a) to (c). From these, one of them can be used alone, or two or more of them can be mixed and used.
(イ)フェニルジアゾニウムヘキサフルオロホスフェート、4-メトキシフェニルジアゾニウムヘキサフルオロアンチモネート、4-メチルフェニルジアゾニウムヘキサフルオロホスフェート等のアリールジアゾニウム塩 (A) Aryldiazonium salts such as phenyldiazonium hexafluorophosphate, 4-methoxyphenyldiazonium hexafluoroantimonate, 4-methylphenyldiazonium hexafluorophosphate and the like.
(ロ)ジフェニルヨードニウムヘキサフルオロアンチモネート、ジ(4-メチルフェニル)ヨードニウムヘキサフルオロホスフェート、ジ(4-tert-ブチルフェニル)ヨードニウムヘキサフルオロホスフェート、トリルクミルヨードニウムテトラキス(ペンタフルオロフェニル)ボレート等のジアリールヨードニウム塩 (B) Diaryl such as diphenyliodonium hexafluoroantimonate, di (4-methylphenyl) iodonium hexafluorophosphate, di (4-tert-butylphenyl) iodonium hexafluorophosphate, trilucmil iodonium tetrakis (pentafluorophenyl) borate, etc. Iodonium salt
(ハ)下記群I又は群IIで表されるスルホニウムカチオンとヘキサフルオロアンチモンイオン、ヘキサフルオロフォスフェートイオン、テトラキス(ペンタフルオロフェニル)ボレートイオン等のスルホニウム塩 (C) Sulfonium cations represented by Group I or Group II below and sulfonium salts such as hexafluoroantimon ion, hexafluorophosphate ion, and tetrakis (pentafluorophenyl) borate ion.
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
 前記重合開始剤の使用量は、(A)成分とエポキシ基及び/又は反応性不飽和結合を有するその他の化合物の合計100質量部に対し、0.001~20質量部であることが好ましい。20質量部以下とすることで硬化物の吸水率や硬化物強度等の諸物性への影響を抑制することができる。 The amount of the polymerization initiator used is preferably 0.001 to 20 parts by mass with respect to 100 parts by mass in total of the component (A) and the epoxy group and / or other compound having a reactive unsaturated bond. By setting the content to 20 parts by mass or less, it is possible to suppress the influence on various physical properties such as the water absorption rate of the cured product and the strength of the cured product.
 本発明の硬化性組成物を、重合開始剤を用いて光硬化する際には、増感剤及び増感助剤を使用することができる。増感剤及び増感助剤としては、アントラセン系化合物、ナフタレン系化合物等が挙げられる。 When the curable composition of the present invention is photocured with a polymerization initiator, a sensitizer and a sensitizing aid can be used. Examples of the sensitizer and the sensitizer aid include anthracene compounds and naphthalene compounds.
 前記アントラセン系化合物としては、例えば、9,10-ジメトキシアントラセン、9,10-ジエトキシアントラセン、9,10-ジプロポキシアントラセン、9,10-ジイソプロポキシアントラセン、9,10-ジブトキシアントラセン、9,10-ジペンチルオキシアントラセン、9,10-ジヘキシルオキシアントラセン、9,10-ビス(2-メトキシエトキシ)アントラセン、9,10-ビス(2-エトキシエトキシ)アントラセン、 9,10-ビス(2-ブトキシエトキシ)アントラセン、9,10-ビス(3-ブトキシプロポキシ)アントラセン、2-メチル-又は2-エチル-9,10-ジメトキシアントラセン、2-メチル-又は2-エチル-9,10-ジエトキシアントラセン、2-メチル-又は2-エチル-9,10-ジプロポキシアントラセン、2-メチル-又は2-エチル-9,10-ジイソプロポキシアントラセン、2-メチル-又は2-エチル-9,10-ジブトキシアントラセン、2-メチル-又は2-エチル-9,10-ジペンチルオキシアントラセン、2-メチル-又は2-エチル-9,10-ジヘキシルオキシアントラセン等が挙げられる。 Examples of the anthracene-based compound include 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 9,10-dipropoxyanthracene, 9,10-diisopropoxyanthracene, 9,10-dibutoxyanthracene, and 9. , 10-Dipentyloxyanthracene, 9,10-dihexyloxyanthracene, 9,10-bis (2-methoxyethoxy) anthracene, 9,10-bis (2-ethoxyethoxy) anthracene, 9,10-bis (2-butoxy) Ethoxy) anthracene, 9,10-bis (3-butoxypropoxy) anthracene, 2-methyl- or 2-ethyl-9,10-dimethoxyanthracene, 2-methyl- or 2-ethyl-9,10-diethoxyanthracene, 2-Methyl- or 2-ethyl-9,10-dipropoxyanthracene, 2-methyl- or 2-ethyl-9,10-diisopropoxyanthracene, 2-methyl- or 2-ethyl-9,10-dibutoxy Anthracene, 2-methyl- or 2-ethyl-9,10-dipentyloxyanthracene, 2-methyl- or 2-ethyl-9,10-dihexyloxyanthracene and the like can be mentioned.
 前記ナフタレン系化合物としては、例えば、4-メトキシ-1-ナフトール、4-エトキシ-1-ナフトール、4-プロポキシ-1-ナフトール、4-ブトキシ-1-ナフトール、4-ヘキシルオキシ-1-ナフトール、1,4-ジメトキシナフタレン、1-エトキシ-4-メトキシナフタレン、1,4-ジエトキシナフタレン、1,4-ジプロポキシナフタレン、1,4-ジブトキシナフタレン等が挙げられる。 Examples of the naphthalene-based compound include 4-methoxy-1-naphthol, 4-ethoxy-1-naphthol, 4-propoxy-1-naphthol, 4-butoxy-1-naphthol, 4-hexyloxy-1-naphthol, and the like. Examples thereof include 1,4-dimethoxynaphthalene, 1-ethoxy-4-methoxynaphthalene, 1,4-diethoxynaphthalene, 1,4-dipropoxynaphthalene and 1,4-dibutoxynaphthalene.
 本発明の硬化性組成物は、必要に応じて、3-アミノプロピルトリメトキシシラン、3-アミノプロピルトリエトキシシラン、N-(2-アミノエチル)-3-アミノプロピルトリメトキシシラン、N-(2-アミノエチル)-3-アミノプロピルメチルジメトキシシラン、N-(2-アミノエチル)-3-アミノプロピルトリエトキシシラン、N-(2-アミノエチル)-3-アミノプロピルメチルジエトキシシラン、N-(2-アミノエチル)-8-アミノオクチルトリメトキシシラン、N-フェニル-3-アミノプロピルトリメトキシシラン、3-トリエトキシシリル-N-(1,3-ジメチルブチリデン)プロピルアミン等のアミノシラン化合物;3-メルカプトプロピルトリメトキシシラン等のメルカプトシラン化合物;2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、3-グリシドキシプロピルメチルジメトキシシラン、3-グリシドキシプロピルトリメトキシシラン、3-グリシドキシプロピルメチルジエトキシシラン、3-グリシドキシプロピルトリエトキシシラン等のエポキシシラン化合物等のシランカップリング剤、モノグリシジルエーテル類、ジオクチルフタレート、ジブチルフタレート、ベンジルアルコール、コールタール等の反応性又は非反応性の希釈剤(可塑剤);ガラス繊維、炭素繊維、セルロース、ケイ砂、セメント、カオリン、クレー、水酸化アルミニウム、ベントナイト、タルク、シリカ、微粉末シリカ、二酸化チタン、カーボンブラック、グラファイト、酸化鉄、瀝青物質等の充填剤又は顔料;キャンデリラワックス、カルナウバワックス、木ろう、イボタロウ、みつろう、ラノリン、鯨ろう、モンタンワックス、石油ワックス、脂肪酸ワックス、脂肪酸エステル、脂肪酸エーテル、芳香族エステル、芳香族エーテル等の潤滑剤;増粘剤;チキソトロピック剤;酸化防止剤;光安定剤;紫外線吸収剤;難燃剤;消泡剤;防錆剤;コロイダルシリカ、コロイダルアルミナ等の公知の添加物を含有してもよく、更に、キシレン樹脂や石油樹脂等の、粘着性の樹脂類を併用することもできる。 The curable composition of the present invention is, if necessary, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, N- ( 2-Aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltriethoxysilane, N- (2-aminoethyl) -3-aminopropylmethyldiethoxysilane, N Aminosilanes such as-(2-aminoethyl) -8-aminooctyltrimethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, 3-triethoxysilyl-N- (1,3-dimethylbutylidene) propylamine Compounds; Mercaptosilane compounds such as 3-mercaptopropyltrimethoxysilane; 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropyltrimethoxysilane, Silane coupling agents such as epoxysilane compounds such as 3-glycidoxypropylmethyldiethoxysilane and 3-glycidoxypropyltriethoxysilane, monoglycidyl ethers, dioctylphthalate, dibutylphthalate, benzyl alcohol, coaltal and the like. Reactive or non-reactive diluent (plasticizer); glass fiber, carbon fiber, cellulose, silica sand, cement, kaolin, clay, aluminum hydroxide, bentonite, talc, silica, fine powder silica, titanium dioxide, carbon black , Graphite, iron oxide, bituminous substance, etc. fillers or pigments; candelilla wax, carnauba wax, wood wax, ibotarou, mitsuro, lanolin, whale wax, montane wax, petroleum wax, fatty acid wax, fatty acid ester, fatty acid ether, Lubricants such as aromatic esters and aromatic ethers; thickeners; thixotropic agents; antioxidants; light stabilizers; ultraviolet absorbers; flame retardants; antifoaming agents; rust preventives; colloidal silica, colloidal alumina, etc. Known additives may be contained, and adhesive resins such as xylene resin and petroleum resin can also be used in combination.
 本発明の硬化性組成物は、前記に例示したごとき硬化剤及び重合開始剤の種類を変えたり、複数組み合わせて使用することによって、光及び熱により硬化することが可能なものである。
 その中でも光重合開始剤と硬化剤とを併用し、光照射によって仮硬化をした後で熱硬化する方法を採用ことができる。その場合には、エポキシ基及び反応性不飽和結合のうちエポキシ基のみを有する化合物又は反応性不飽和結合のみを有する化合物の量を多く含有すると、硬化が不十分な場合があったり、硬化物の物性が低下するおそれがある。このため、エポキシ基及び反応性不飽和結合のうちエポキシ基のみを有する化合物又は反応性不飽和結合のみを有する化合物の量が合計で、本発明の化合物100質量部に対して100質量部以下であることが好ましく、70質量部以下であることが更に好ましい。また光重合開始剤は光ラジカル重合開始剤であることが好ましい。
The curable composition of the present invention can be cured by light and heat by changing the types of the curing agent and the polymerization initiator as exemplified above or by using a plurality of them in combination.
Among them, a method can be adopted in which a photopolymerization initiator and a curing agent are used in combination, and after temporary curing by light irradiation, thermosetting is performed. In that case, if a large amount of the compound having only an epoxy group or the compound having only a reactive unsaturated bond among the epoxy group and the reactive unsaturated bond is contained, the curing may be insufficient or the cured product may be insufficiently cured. There is a risk that the physical properties of the Therefore, the total amount of the compound having only the epoxy group or the compound having only the reactive unsaturated bond among the epoxy group and the reactive unsaturated bond is 100 parts by mass or less with respect to 100 parts by mass of the compound of the present invention. It is preferably 70 parts by mass or less, and more preferably 70 parts by mass or less. Further, the photopolymerization initiator is preferably a photoradical polymerization initiator.
 光硬化において、照射される光としては、波長300nm~450nmの光を含むものとすることができる。光硬化に用いる光源としては、低圧水銀灯、中圧水銀灯、高圧水銀灯、超高圧水銀灯、キセノンランプ、メタルハロゲンランプ、電子線照射装置、X線照射装置、レーザー(アルゴンレーザー、色素レーザー、窒素レーザー、LED、ヘリウムカドミウムレーザー等)が挙げられる。 In photocuring, the light to be irradiated may include light having a wavelength of 300 nm to 450 nm. Light sources used for photocuring include low-pressure mercury lamps, medium-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, xenon lamps, metal halogen lamps, electron beam irradiators, X-ray irradiators, lasers (argon lasers, dye lasers, nitrogen lasers, etc.) LED, helium cadmium laser, etc.).
 熱硬化における加熱温度としては、上記組成物を安定的に硬化できるものであればよく、上記硬化剤の種類等に応じて適宜設定されるものであるが、例えば、10℃以上250℃以下とすることが好ましく、なかでも、60℃以上200℃以下であることがより好ましい。 The heating temperature in the thermosetting may be any one as long as it can stably cure the composition, and is appropriately set according to the type of the curing agent and the like. For example, it is 10 ° C. or higher and 250 ° C. or lower. It is preferable that the temperature is 60 ° C. or higher and 200 ° C. or lower.
 本発明の硬化性組成物の硬化物は、光硬化の後に熱硬化がなされて得られた硬化物であることが、耐熱性等の性能に優れる点で好ましい。本記載は状態を表すものであると出願人は考えている。本記載が仮に製造方法により物を特定するものだとしても、硬化性化合物を所定条件で硬化した硬化物について本明細書に記載された以外の構造・特性を特定することには多大な実験時間を要するため不可能・非実際的な事情がある。 The cured product of the curable composition of the present invention is preferably a cured product obtained by heat-curing after photo-curing because of its excellent performance such as heat resistance. The Applicant believes that this statement represents a condition. Even if this description specifies a product by a production method, it takes a lot of experimental time to specify a structure / property other than that described in the present specification for a cured product obtained by curing a curable compound under predetermined conditions. There are impossible and impractical circumstances because it requires.
 本発明の硬化性組成物は、例えば、塗料、接着剤、封止剤、粘着剤、コーティング剤、繊維集束剤、建築材料、電子部品等の広範な用途に使用できるものである。とりわけ、光及び熱による硬化性に優れたものであるため、デュアル硬化が可能な用途に使用することができる。すなわち、液状封止剤、液状接着剤、液晶シール剤、カメラモジュール用接着剤等の用途に好適に用いることができる。 The curable composition of the present invention can be used in a wide range of applications such as paints, adhesives, sealants, pressure-sensitive adhesives, coating agents, fiber sizing agents, building materials, and electronic parts. In particular, since it has excellent curability by light and heat, it can be used in applications where dual curing is possible. That is, it can be suitably used for applications such as a liquid sealant, a liquid adhesive, a liquid crystal sealant, and an adhesive for a camera module.
 次に、実施例により、本発明を更に詳細に説明するが、本発明はこれら実施例により制限されるものではない。 Next, the present invention will be described in more detail by way of examples, but the present invention is not limited by these examples.
〔実施例1〕化合物1-1aの製造
 還流装置、攪拌装置、滴下装置を備えたフラスコ中に、p-ヒドロキシフェネチルアルコール386.9g(2.8mol)、及びエピクロルヒドリン1,295g(14mol)を仕込み、滴下装置中に48質量%水酸化ナトリウム水溶液221.7g(0.95mol)を入れた。水酸化ナトリウム水溶液を、内部温度65~70℃、減圧度21~24kPaの還流下で2時間かけて滴下し、同時に、共沸上流により水を除去した。その後、更に1時間反応させた後、脱エピクロルヒドリン、水洗、脱溶剤及びろ過をして、下記化合物1-1a-1を得た。
 前記化合物1-1a-1のエポキシ当量は216g/eq.であった。
 還流装置、攪拌装置を備えたフラスコ中に、前記により得られた化合物1-1a-1の498.2g(2.6mol)、アクリル酸メチル1.102g(12.8モル)及びチタンテトラ-n-ブトキシド21.8g(0.06mol)を仕込み、還流下に生成したメタノールを留去しながら反応を行った。反応温度78℃~87℃で10時間反応させ、化合物1-1aへの転化率が95%以上に達したところで反応を終了した。反応液を冷却し、トルエン500g、水30gを加え60℃で1時間攪拌し、触媒を加水分解した。トルエンと水を蒸留除去し得られた濃縮液を冷却後、ろ過して析出した触媒分解物を除去し、化合物1-1aを得た。化合物1-1aは25℃で液体であった。
 得られた化合物1-1aの1H-NMR測定結果を図1に示した。
 NMRは日本電子製ECX-400を用いて測定した。測定溶媒として重クロロホルムを用いた。
 本製造方法で得られた化合物は上記簡便な精製方法により、後述の通り、光及び熱硬化に好適に用いることができ、本製造方法が有利であることが判る。
[Example 1] Production of compound 1-1a 386.9 g (2.8 mol) of p-hydroxyphenethyl alcohol and 1,295 g (14 mol) of epichlorohydrin are charged in a flask equipped with a reflux device, a stirrer, and a dropping device. , 221.7 g (0.95 mol) of a 48 mass% sodium hydroxide aqueous solution was placed in the dropping device. The aqueous sodium hydroxide solution was added dropwise over reflux at an internal temperature of 65 to 70 ° C. and a reduced pressure of 21 to 24 kPa over 2 hours, and at the same time, water was removed by an azeotropic upstream. Then, after further reacting for 1 hour, it was deepichlorohydrin, washed with water, desolvated and filtered to obtain the following compound 1-1a-1.
The epoxy equivalent of the compound 1-1a-1 is 216 g / eq. Met.
In a flask equipped with a reflux device and a stirrer, 498.2 g (2.6 mol) of the compound 1-1a-1 obtained above, 1.102 g (12.8 mol) of methyl acrylate and titanium tetra-n were placed. -Butoxide was charged in an amount of 21.8 g (0.06 mol), and the reaction was carried out while distilling off the methanol produced under reflux. The reaction was carried out at a reaction temperature of 78 ° C. to 87 ° C. for 10 hours, and the reaction was terminated when the conversion rate to compound 1-1a reached 95% or more. The reaction mixture was cooled, 500 g of toluene and 30 g of water were added, and the mixture was stirred at 60 ° C. for 1 hour to hydrolyze the catalyst. The concentrated solution obtained by distilling and removing toluene and water was cooled, and then filtered to remove the precipitated catalytic decomposition product to obtain Compound 1-1a. Compound 1-1a was a liquid at 25 ° C.
The 1 H-NMR measurement result of the obtained compound 1-1a is shown in FIG.
NMR was measured using ECX-400 manufactured by JEOL Ltd. Deuterated chloroform was used as the measurement solvent.
The compound obtained by this production method can be suitably used for light and thermosetting as described later by the above-mentioned simple purification method, and it can be seen that this production method is advantageous.
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
〔実施例2〕化合物1-2bの製造
 還流装置、攪拌装置、滴下装置を備えたフラスコ中に、2,4-ジヒドロキシベンゾフェノン299.9g(1.4mol)、及びエピクロルヒドリン1,295g(14mol)を仕込み、50℃で加温した。40質量%炭酸カリウム水溶液483.9gを30分かけて滴下した後、10時間攪拌を続けた。冷却し、水490g加えて30分攪拌し、1時間静置した。分離した水層を抜き出し、脱エピクロルヒドリンを行った。その後、トルエンを400g追加し、水洗を行った。水層が中性になったのを確認した後、脱トルエンを行い、下記のクロロヒドリン体1-2b-1を470g得た。
 得られたクロロヒドリン体1-2b-1の250gにトルエン500gを加え、60℃に加温した。その後、固体状の水酸化ナトリウム32.6gを5分割で加えた(1分割/20分)。5分割目を加えた後、60℃のまま5時間反応を続けた。その後、水洗を行い、有機層を硫酸マグネシウムで乾燥し、脱トルエンを行い、下記の閉環体1-2b-2を98.7g得た。閉環体1-2b-2のエポキシ当量は290g/eq.であった。
 還流装置、攪拌装置、滴下装置を備えたフラスコ中に、前記で得られた閉環体1-2b-2を270mg、トリエチルアミン151mg、テトラヒドロフラン(THF) 2mLを仕込んだ。その後、塩化メタクリロイル150mgを3分間かけて滴下し、室温のまま6時間攪拌した。その後、反応溶液にクロロホルムを10mL入れ、水層が中性になるまで水洗した。脱クロロホルムを行い、下記化合物1-2bを268mg得た。化合物1-2bは25℃で液体であった。
 得られた化合物の1H-NMR測定結果を図2に示した。
 NMRは日本電子製ECX-400を用いて測定した。測定溶媒として重クロロホルムを用いた。
 本製造方法で得られた化合物は上記簡便な精製方法により、後述の通り、光及び熱硬化に好適に用いることができ、本製造方法が有利であることが判る。
[Example 2] Production of compound 1-2b 299.9 g (1.4 mol) of 2,4-dihydroxybenzophenone and 1,295 g (14 mol) of epichlorohydrin were placed in a flask equipped with a reflux device, a stirrer, and a dropping device. It was charged and heated at 50 ° C. After dropping 483.9 g of a 40 mass% potassium carbonate aqueous solution over 30 minutes, stirring was continued for 10 hours. After cooling, 490 g of water was added, the mixture was stirred for 30 minutes, and allowed to stand for 1 hour. The separated aqueous layer was extracted and deepichlorohydrin was performed. Then, 400 g of toluene was added and washed with water. After confirming that the aqueous layer became neutral, detoluene was performed to obtain 470 g of the following chlorohydrin compound 1-2b-1.
To 250 g of the obtained chlorohydrin compound 1-2b-1, 500 g of toluene was added, and the mixture was heated to 60 ° C. Then, 32.6 g of solid sodium hydroxide was added in 5 portions (1 division / 20 minutes). After adding the 5th division, the reaction was continued for 5 hours at 60 ° C. Then, it was washed with water, the organic layer was dried over magnesium sulfate, and detoluene was carried out to obtain 98.7 g of the following ring-closed body 1-2b-2. The epoxy equivalent of the ring closure 1-2b-2 is 290 g / eq. Met.
In a flask equipped with a reflux device, a stirrer, and a dropping device, 270 mg of the ring-closed body 1-2b-2 obtained above, 151 mg of triethylamine, and 2 mL of tetrahydrofuran (THF) were charged. Then, 150 mg of methacryloyl chloride was added dropwise over 3 minutes, and the mixture was stirred at room temperature for 6 hours. Then, 10 mL of chloroform was added to the reaction solution, and the mixture was washed with water until the aqueous layer became neutral. Dechloroform was performed to obtain 268 mg of the following compound 1-2b. Compound 1-2b was liquid at 25 ° C.
The 1 H-NMR measurement result of the obtained compound is shown in FIG.
NMR was measured using ECX-400 manufactured by JEOL Ltd. Deuterated chloroform was used as the measurement solvent.
The compound obtained by this production method can be suitably used for light and thermosetting as described later by the above-mentioned simple purification method, and it can be seen that this production method is advantageous.
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
〔実施例3~6並びに比較例1〕
 下記表1に示す量で各成分を混合して、実施例3~6並びに比較例1の硬化性組成物を調製した。
 ガラス板上に、前記で調製した硬化性組成物をバーコーターにより300μm厚で塗布して塗膜を得た。得られた塗膜について、下記硬化条件にて光硬化させた試験片、及び、下記硬化条件で光硬化させた後に熱硬化させた試験片、をそれぞれ作成してガラス転移点(Tg)を測定した。光硬化の際、下記評価基準にて光硬化性を確認した。
 これらの結果を下記の表1に示した。
[Examples 3 to 6 and Comparative Example 1]
The curable compositions of Examples 3 to 6 and Comparative Example 1 were prepared by mixing each component in the amounts shown in Table 1 below.
The curable composition prepared above was applied on a glass plate with a bar coater to a thickness of 300 μm to obtain a coating film. For the obtained coating film, a test piece photo-cured under the following curing conditions and a test piece photo-cured under the following curing conditions and then thermosetting were prepared, and the glass transition point (Tg) was measured. bottom. At the time of photocuring, the photocurability was confirmed according to the following evaluation criteria.
These results are shown in Table 1 below.
〔硬化条件〕
光硬化:JATEC製J-Cure1500CVを用いて、露光量3,000mJ/cm2照射し硬化性を確認した。
熱硬化:熱循環式オーブンにて100℃×1h、150℃×2h加熱した。
[Curing conditions]
Photocuring: Using J-Cure 1500CV manufactured by JATEC, an exposure amount of 3,000 mJ / cm 2 was irradiated and the curability was confirmed.
Thermosetting: Heated in a heat circulation type oven at 100 ° C. × 1 h and 150 ° C. × 2 h.
〔評価基準〕
光硬化性:光照射後、硬化が十分に行われ離型可能な塗膜が出来たものを〇とし、硬化が不十分で塗膜を剥離できなかったものを×とした。
硬化物の物性:TAインスツルメント製RSAを用いて、ガラス転移点(Tg)を測定した。試験片としては幅4mm×長さ60mm×厚さ300μmの短冊状の試験片を作成した。
〔Evaluation criteria〕
Photocurability: After light irradiation, those in which the coating film was sufficiently cured to form a mold-releasable coating film were evaluated as 〇, and those in which the coating film could not be peeled off due to insufficient curing were evaluated as x.
Physical characteristics of cured product: The glass transition point (Tg) was measured using RSA manufactured by TA Instruments. As the test piece, a strip-shaped test piece having a width of 4 mm, a length of 60 mm, and a thickness of 300 μm was prepared.
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000027
化合物1-1a:前記実施例1で得られた化合物
化合物1-2b:前記実施例2で得られた化合物
PTBPGE:p-第三ブチルフェノールグリシジルエーテル
2-PEA:2-フェニルエタノールアクリレート
Irg-184:IGMレジンズ社製アルキルフェノン系光重合開始剤(omnirad184)
2E4MZ:四国化成工業(株)製硬化剤
*1:未実施
*2:硬化せず試験片が製造できなかったため測定不能。
Compound 1-1a: Compound 1-2b obtained in Example 1: Compound PTBPGE obtained in Example 2: p-Triary butylphenol glycidyl ether 2-PEA: 2-Phenylethanol acrylate Irg-184: Alkylphenone-based photopolymerization initiator manufactured by IGM Resins (omnirad184)
2E4MZ: Hardener manufactured by Shikoku Kasei Kogyo Co., Ltd. * 1: Not implemented * 2: Cannot be measured because the test piece could not be manufactured without curing.
 表1に示す結果から明らかなように、本発明により提供される化合物は、光、熱による硬化が可能な硬化性組成物を提供できる。 As is clear from the results shown in Table 1, the compound provided by the present invention can provide a curable composition that can be cured by light or heat.
 本発明の化合物は、光及び/又は熱による硬化が可能であり、また、それを含有して得られる硬化性組成物は、光及び熱により硬化可能であることから、液状封止剤、液状接着剤、カメラモジュール用接着剤、液晶シール剤等の用途に使用することができるものである。 The compound of the present invention can be cured by light and / or heat, and the curable composition obtained by containing the compound can be cured by light and heat. It can be used for applications such as adhesives, adhesives for camera modules, and liquid crystal sealants.

Claims (9)

  1.  下記一般式(1)で表される化合物。
    Figure JPOXMLDOC01-appb-C000001
    (式中、R1及びR3はそれぞれ独立して水素原子又はメチル基を表し、R2は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基、ハロゲン原子、置換基を有することのできるベンゾイル基又は置換基を有することのできるベンジル基を表し、A1は単結合又は炭素原子数1~4のアルキレン基を表す。前記置換基は、炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基である。
     但し、A1が単結合の場合には、式(1)中のベンゼン環において、下記式(1α)で表される不飽和エステル基が、下記式(1β)で表されるグリシジルオキシ基に対してメタ位に位置するものである。nは0~4の数を表す。)
    Figure JPOXMLDOC01-appb-C000002
    (式中の符号の定義は式(1)と同じである。*は結合手である。)
    A compound represented by the following general formula (1).
    Figure JPOXMLDOC01-appb-C000001
    (In the formula, R 1 and R 3 independently represent a hydrogen atom or a methyl group, respectively, and R 2 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a halogen atom, and a substituent. Represents a benzoyl group capable of having or a benzyl group capable of having a substituent, and A 1 represents a single bond or an alkylene group having 1 to 4 carbon atoms. The substituent represents 1 to 10 carbon atoms. It is a group selected from an alkyl group, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom.
    However, when A 1 is a single bond, the unsaturated ester group represented by the following formula (1α) becomes a glycidyloxy group represented by the following formula (1β) in the benzene ring in the formula (1). On the other hand, it is located in the meta position. n represents a number from 0 to 4. )
    Figure JPOXMLDOC01-appb-C000002
    (The definition of the sign in the equation is the same as in equation (1). * Is a bond.)
  2.  前記一般式(1)が、下記一般式(1-1)で表される、請求項1に記載の化合物。
    Figure JPOXMLDOC01-appb-C000003
    (式中、R101及びR103はそれぞれ独立して水素原子又はメチル基を表し、R4は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基を表し、A2は炭素原子数1~4のアルキレン基を表す。mは0~4の数を表す。)
    The compound according to claim 1, wherein the general formula (1) is represented by the following general formula (1-1).
    Figure JPOXMLDOC01-appb-C000003
    (In the formula, R 101 and R 103 independently represent a hydrogen atom or a methyl group, and R 4 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom. Represents the group to be selected, A 2 represents an alkylene group having 1 to 4 carbon atoms, and m represents a number of 0 to 4).
  3.  前記一般式(1-1)が、下記一般式(1-1A)で表される、請求項2に記載の化合物。
    Figure JPOXMLDOC01-appb-C000004
    (式中、R101及びR103はそれぞれ独立して水素原子又はメチル基を表す。)
    The compound according to claim 2, wherein the general formula (1-1) is represented by the following general formula (1-1A).
    Figure JPOXMLDOC01-appb-C000004
    (In the formula, R 101 and R 103 independently represent a hydrogen atom or a methyl group, respectively.)
  4.  下記一般式(1-1-1)で表される化合物のフェノール性水酸基をグリシジルエーテル化した後で、得られる化合物のアルコール性水酸基をアクリル酸エステル又はメタアクリル酸エステルを用いてエステル化する、請求項2又は3に記載の化合物の製造方法。
    Figure JPOXMLDOC01-appb-C000005
    (式中、R4は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基を表し、A2は炭素原子数1~4のアルキレン基を表す。mは0~4の数を表す。)
    After the phenolic hydroxyl group of the compound represented by the following general formula (1-1-1) is glycidyl etherified, the alcoholic hydroxyl group of the obtained compound is esterified with an acrylic acid ester or a methacrylic acid ester. The method for producing a compound according to claim 2 or 3.
    Figure JPOXMLDOC01-appb-C000005
    (In the formula, R 4 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a group selected from halogen atoms, and A 2 is an alkylene group having 1 to 4 carbon atoms. Represents. M represents a number from 0 to 4.)
  5.  前記一般式(1)が、下記一般式(1-2)で表される、請求項1に記載の化合物。
    Figure JPOXMLDOC01-appb-C000006
    (式中、R201及びR203はそれぞれ独立して水素原子又はメチル基を表し、R5は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基を表す。pは0~5の数を表す。)
    The compound according to claim 1, wherein the general formula (1) is represented by the following general formula (1-2).
    Figure JPOXMLDOC01-appb-C000006
    (In the formula, R 201 and R 203 independently represent a hydrogen atom or a methyl group, and R 5 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom. Represents the group to be selected. P represents a number from 0 to 5.)
  6.  下記一般式(1-2-1)で表される水酸基を2個有する化合物において、R5で表される置換基を有することのできるベンゾイル基に対してパラ位に位置する水酸基をグリシジルエーテル化した後で、前記ベンゾイル基に対してオルト位に位置する水酸基をアクリル酸エステル化又はメタアクリル酸エステル化する、請求項5記載の化合物の製造方法。
    Figure JPOXMLDOC01-appb-C000007
    (式中、R5は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基を表す。pは0~5の数を表す。)
    In a compound having two hydroxyl groups represented by the following general formula (1-2-1), the hydroxyl group located at the para position with respect to the benzoyl group capable of having a substituent represented by R 5 is glycidyl etherified. The method for producing a compound according to claim 5, wherein the hydroxyl group located at the ortho position with respect to the benzoyl group is subjected to acrylic acid esterification or methacrylic acid esterification.
    Figure JPOXMLDOC01-appb-C000007
    (In the formula, R 5 represents a group selected from an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom. P represents a number from 0 to 5.)
  7.  (A)下記一般式(1)で表される化合物の少なくとも一種と、(B)硬化剤及び重合開始剤の中から選ばれる少なくとも一種とを含有してなる硬化性組成物。
    Figure JPOXMLDOC01-appb-C000008
    (式中、R1及びR3はそれぞれ独立して水素原子又はメチル基を表し、R2は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基、ハロゲン原子、置換基を有することのできるベンゾイル基又は置換基を有することのできるベンジル基を表し、A1は単結合又は炭素原子数1~4のアルキレン基を表す。前記置換基は、炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子の中から選ばれる基である。
     但し、A1が単結合の場合には、式(1)中のベンゼン環において、下記式(1α)で表される不飽和エステル基が、下記式(1β)で表されるグリシジルオキシ基に対してメタ位に位置するものである。nは0~4の数を表す。)
    Figure JPOXMLDOC01-appb-C000009
    (式中の符号の定義は式(1)と同じである。*は結合手である。)
    A curable composition comprising (A) at least one compound represented by the following general formula (1) and (B) at least one selected from a curing agent and a polymerization initiator.
    Figure JPOXMLDOC01-appb-C000008
    (In the formula, R 1 and R 3 independently represent a hydrogen atom or a methyl group, respectively, and R 2 is an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a halogen atom, and a substituent. Represents a benzoyl group capable of having or a benzyl group capable of having a substituent, and A 1 represents a single bond or an alkylene group having 1 to 4 carbon atoms. The substituent represents 1 to 10 carbon atoms. It is a group selected from an alkyl group, an alkoxy group having 1 to 10 carbon atoms, or a halogen atom.
    However, when A 1 is a single bond, the unsaturated ester group represented by the following formula (1α) becomes a glycidyloxy group represented by the following formula (1β) in the benzene ring in the formula (1). On the other hand, it is located in the meta position. n represents a number from 0 to 4. )
    Figure JPOXMLDOC01-appb-C000009
    (The definition of the sign in the equation is the same as in equation (1). * Is a bond.)
  8.  請求項7に記載された硬化性組成物を光により硬化させた後、熱により硬化させる硬化物の製造方法。 A method for producing a cured product, wherein the curable composition according to claim 7 is cured by light and then cured by heat.
  9.  請求項7に記載された硬化性組成物を光及び熱により硬化してなる硬化物。 A cured product obtained by curing the curable composition according to claim 7 with light and heat.
PCT/JP2021/012405 2020-03-31 2021-03-24 Compound, method for producing compound, and curable composition WO2021200511A1 (en)

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