WO2021182532A1 - Dispositif d'impression - Google Patents

Dispositif d'impression Download PDF

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Publication number
WO2021182532A1
WO2021182532A1 PCT/JP2021/009639 JP2021009639W WO2021182532A1 WO 2021182532 A1 WO2021182532 A1 WO 2021182532A1 JP 2021009639 W JP2021009639 W JP 2021009639W WO 2021182532 A1 WO2021182532 A1 WO 2021182532A1
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WO
WIPO (PCT)
Prior art keywords
film
molded
master mold
roll
pressurizing
Prior art date
Application number
PCT/JP2021/009639
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English (en)
Japanese (ja)
Inventor
坂森重則
田中覚
Original Assignee
Ｓｃｉｖａｘ株式会社
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Filing date
Publication date
Application filed by Ｓｃｉｖａｘ株式会社 filed Critical Ｓｃｉｖａｘ株式会社
Publication of WO2021182532A1 publication Critical patent/WO2021182532A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Definitions

  • the present invention relates to an imprinting apparatus for transferring a fine pattern to an object to be molded.
  • nanoimprint technology as a method of forming fine patterns of micro-order and nano-order.
  • a mold having a fine pattern is pressed on an object to be molded such as resin, and the pattern is transferred to the object to be molded by using heat or light (see, for example, Patent Document 1).
  • nanoimprint has come to be used for various optical components in smartphones and vehicles, and it is important to solve stability and cost reduction as mass production technology.
  • Examples of nanoimprint processing of advanced optical components that are currently in practical use include complex multi-stage pattern molding for manufacturing diffractive optical elements (DOE) used for 3D sensors, etc., and light guide path manufacturing used for fingerprint sensors, etc.
  • DOE diffractive optical elements
  • Examples include the molding of resin pillars having an aspect ratio of 10 or more, and the molding of line-and-space extending in various directions for manufacturing a polarizing filter and a retardation filter arranged for each pixel of an AR light guide path or a polarizing camera. For this reason, it is necessary to imprint extremely diverse and complex shapes and release the mold without damaging the pattern.
  • Nanoimprint is a technology for imprint transfer of a mold pattern created by the microfabrication technology developed in the semiconductor process to the resin surface.
  • a Si or quartz glass substrate whose surface has been surface-processed by photolithography or etching is expensive, it is rarely used as a direct mold.
  • the mold is used as a master mold, and the resin to which the pattern is transferred is used as a mold to form a pattern on the target product.
  • the mold transferred from this master mold is called a replica mold.
  • an object of the present invention is to provide an imprinting apparatus capable of seamlessly manufacturing a replica mold and a final product.
  • An imprint device for transferring a fine pattern to an object to be molded in order to achieve the above object, a film supply unit for moving a film between a first roll and a second roll, and the film.
  • the mold release means moves on the film while pressurizing the film and the master mold or the object to be molded, and the release means for separating the film from the master mold or the object to be molded. It may be composed of a release roll.
  • the separating means can be formed so as to move at least one of the first roll and the second roll so that the film is separated from the master mold or the object to be molded.
  • the separating means is formed so as to move at least one of the first roll and the second roll so that the angle between the film and the master mold or the object to be molded is constant. Is preferable.
  • the imprinting apparatus of the present invention may include a gas removing unit for removing gas between the film and the master mold or between the film and the object to be molded.
  • a light irradiation means for irradiating light can be used as the fixing means.
  • the pressurizing portion includes a first pressurizing portion for pressurizing the film and the master mold with a fluid, and a second pressurizing portion for pressurizing the film and the object to be molded with a fluid. You may be prepared.
  • the imprinting apparatus of the present invention can seamlessly produce a replica mold and a final product.
  • the imprinting apparatus of the present invention transfers the replica pattern 21 from the master pattern 11 of the master mold 1 to the film 2, and transfers the fine pattern 31 from the replica pattern 21 of the film 2 to the object 3 to be molded.
  • It is an imprint device for transfer, and is mainly composed of a film supply unit, an arrangement means, a pressurizing unit 6, a fixing means, and a mold release means.
  • the fine pattern 31 means a fine structure that imparts a predetermined function to the object 3 to be molded, and not only a geometric shape composed of irregularities but also a transfer of a mirror surface state having a predetermined surface roughness, for example. Also includes those for transferring a predetermined surface state such as.
  • the fine pattern 31 is formed in various sizes such as 100 ⁇ m or less, 10 ⁇ m or less, 2 ⁇ m or less, 1 ⁇ m or less, 100 nm or less, 10 nm or less, and the minimum dimensions of the width, height, and depth of the convex portion and the concave portion in the plane direction are 100 ⁇ m or less.
  • the microstructure corresponds to, for example, a structure for an optical element, a structure for cell culture, and the like. It also includes a microstructure for forming a predetermined structure on the substrate using the object 3 to be molded as a mask.
  • the replica pattern 21 is for transferring the fine pattern 31. Therefore, the replica pattern 21 has a shape obtained by reversing the fine pattern 31.
  • the master pattern 11 is a fine structure formed on the master mold 1 and is for transferring the replica pattern 21. Therefore, the master pattern 11 has an inverted shape of the replica pattern 21, and has substantially the same shape as the fine pattern 31.
  • the master mold 1 is manufactured by surface-processing a substrate such as silicon (Si) or quartz glass by photolithography or etching. Therefore, the master mold 1 is expensive and is rarely used directly as a mold, and usually, a resin to which the replica pattern 21 is transferred from the mold is used as a replica mold.
  • the object to be molded 3 means a fluid material capable of forming a fine pattern 31 from a replica pattern 21.
  • a photocurable resin for example, a thermosetting resin, or a thermoplastic resin can be used.
  • photocurable resin or thermosetting resin examples include unsaturated hydrocarbons such as vinyl groups and allyl groups such as epoxide-containing compounds, (meth) acrylic acid ester compounds, vinyl ether compounds, and bisallyl nadiimide compounds. Group-containing compounds and the like can be used.
  • a photoreactive initiator may be added to allow the polymerization reaction to proceed by light irradiation to form a molding pattern.
  • a photoreactive radical initiator an acetophenone derivative, a benzophenone derivative, a benzoin ether derivative, a xanthone derivative and the like can be preferably used.
  • thermosetting resin a polymerization-reactive group-containing compound can be used alone for thermal polymerization, and a thermal-reactive initiator is used to improve the thermosetting property. It can also be added and used. Organic peroxides and azo compounds can be preferably used as the heat-reactive radical initiator.
  • the reactive monomer may be used without a solvent, or may be used by dissolving it in a solvent and removing the solvent after coating.
  • thermoplastic resin examples include cyclic olefin resins such as cyclic olefin ring-opening polymerization / hydrogenated products (COP) and cyclic olefin copolymers (COC), acrylic resins, polycarbonates, vinyl ether resins, and perfluoroalkoxyalkanes (PFA). ), Polytetrafluoroethylene (PTFE) and other fluororesins, polystyrene, polyimide-based resins, polyester-based resins and the like can be used.
  • cyclic olefin resins such as cyclic olefin ring-opening polymerization / hydrogenated products (COP) and cyclic olefin copolymers (COC), acrylic resins, polycarbonates, vinyl ether resins, and perfluoroalkoxyalkanes (PFA).
  • PTFE Polytetrafluoroethylene
  • other fluororesins polystyrene
  • the object to be molded 3 usually means a film formed on a substrate made of an inorganic compound such as glass, a resin, a metal, or the like, but is simply a substrate or a flexible film. It doesn't matter.
  • the film 2 is for holding the replica material 20 for forming the replica pattern 21, and is made of a flexible resin.
  • the film 2 may be any film that can hold the replica material 20 and can be used in the imprint process.
  • the replica material 20 means a fluid material capable of forming the replica pattern 21 from the master pattern 11 or a material capable of having fluidity by heating or the like.
  • a photocurable resin, a thermosetting resin, or a thermoplastic resin can be used as the replica material 20.
  • photocurable resin or thermosetting resin examples include unsaturated hydrocarbons such as vinyl groups and allyl groups such as epoxide-containing compounds, (meth) acrylic acid ester compounds, vinyl ether compounds, and bisallyl nadiimide compounds. Group-containing compounds and the like can be used.
  • a photoreactive initiator may be added to allow the polymerization reaction to proceed by light irradiation to form a molding pattern.
  • a photoreactive radical initiator an acetophenone derivative, a benzophenone derivative, a benzoin ether derivative, a xanthone derivative and the like can be preferably used.
  • thermosetting resin a polymerization-reactive group-containing compound can be used alone for thermal polymerization, and a thermal-reactive initiator is used to improve the thermosetting property. It can also be added and used. Organic peroxides and azo compounds can be preferably used as the heat-reactive radical initiator.
  • the reactive monomer used for the photocurable resin or the thermoplastic resin may be used without a solvent, or may be used after being dissolved in a solvent and coated with a solvent.
  • thermoplastic resin examples include cyclic olefin resins such as cyclic olefin ring-opening polymerization / hydrogenated products (COP) and cyclic olefin copolymers (COC), acrylic resins, polycarbonates, vinyl ether resins, and perfluoroalkoxyalkanes (PFA). ), Polytetrafluoroethylene (PTFE) and other fluororesins, polystyrene, polyimide-based resins, polyester-based resins and the like can be used.
  • the film 2 itself may be used as the thermoplastic resin.
  • the film supply unit is for moving the film 2 between the first roll 41 and the second roll 42.
  • the film supply unit may be any as long as the film 2 can be moved to the place where the master mold 1 or the object to be molded 3 is placed.
  • the film 2 wound around the first roll 41 may be formed so that the second roll 42 rotates and winds the film 2 and moves the film 2 from the first roll 41 to the second roll 42.
  • the first roll 41 and the second roll 42 may have any shape as long as the film 2 can be wound around them, but they are usually formed in a cylindrical shape or a cylindrical shape.
  • the first roll 41 and the second roll 42 may have, for example, a rotating shaft for rotating the roll, and may be configured to rotate the rotating shaft by a rotating means such as an electric motor. Of course, it is also possible to rotate it manually.
  • the arranging means is for arranging the film 2 so that at least one of the master mold 1 and the object 3 to be molded overlaps.
  • Examples of the arranging means include a master mold moving means for horizontally aligning the film 2 and the master mold 1, a moving object moving means for horizontally aligning the film 2 and the object 3 to be molded, and the film 2.
  • An elevating means for aligning the master mold 1 with the master mold 1 or the object to be molded 3 in the height direction may be used.
  • the master mold moving means may be any one as long as the master mold 1 or the master mold stage 51 on which the master mold 1 is placed can be moved to a position where it overlaps with the film 2, and a well-known conventionally known one is used. Can be done.
  • any means for moving the object to be molded may be used as long as the object 3 to be molded or the stage 52 for the object to be molded on which the object 3 to be molded can be placed can be moved to a position where it overlaps with the film 2, and has been conventionally known. Well-known ones can be used.
  • the elevating means may be configured to move up and down at least one of the first roll 41 and the second roll 42 of the film supply unit, for example.
  • the pressurizing unit 6 is for pressurizing the film 2 and the master mold 1 or the film 2 and the object 3 to be molded with a fluid.
  • the pressurizing portion 6 may be any one as long as the film 2 and the master mold 1 or the object to be molded 3 can be pressurized.
  • a pressurizing chamber for forming a pressurizing chamber is used.
  • a sealing means 62 that seals between the pressure chamber housing 61 and the pressurizing chamber housing 61 and the film 2, an opening / closing means that opens and closes between the pressurizing chamber housing 61 and the film 2, and a pressurizing chamber. It can be composed of a pressurizing means 64 for adjusting the atmospheric pressure of the.
  • the pressurizing chamber housing 61 is formed in a bottomed tubular shape having an opening, and the opening is closed by the film 2 to form a pressurized chamber which is a closed space. This opening is formed to be at least larger than the region of the replica pattern 21 transferred to the film 2.
  • the material may be any material as long as it has a pressure resistance that can withstand the pressure during molding, and for example, an iron material such as carbon steel or a metal such as SUS can be used.
  • the sealing means 62 brings the pressurizing chamber housing 61 and the film 2 into close contact with each other in order to make the pressurizing chamber closed.
  • an O-ring can be used as the sealing means 62.
  • the O-ring may be arranged in a concave groove shallower than the diameter of the cross section of the O-ring at the film-side end of the side wall of the pressure chamber housing 61.
  • the pressurizing section 6 includes a first pressurizing section for pressurizing the film 2 and the master mold 1, and a second pressurizing section for pressurizing the film 2 and the object 3 to be molded with a fluid. It is also possible to provide two types of pressurizing parts.
  • the fixing means is to fix the replica pattern 21 transferred from the master pattern 11 to the film 2. Further, the fine pattern 31 transferred from the replica pattern 21 is fixed to the object 3 to be molded.
  • an electromagnetic wave having a predetermined wavelength capable of curing the photocurable resin for example, a light source that emits ultraviolet rays can be used as the fixing means.
  • the light source may be a single light source or a plurality of light sources as long as the photocurable resin can be irradiated with light, and the light source should have a uniform illuminance distribution in the resin as much as possible.
  • the light irradiation direction may be any direction as long as the resin is cured. For example, the light may be irradiated from the film 2 side or the stage side.
  • the replica material 20 or the object to be molded 3 is a thermosetting resin
  • a heating means capable of heating to a temperature at which the resin cures can be used as the fixing means.
  • a well-known heater or the like can be used as the heating means.
  • a heating means capable of heating the thermoplastic resin to a glass transition temperature or higher or a melting temperature or higher and a glass transition of the thermoplastic resin are performed. Cooling means capable of cooling below the temperature or below the melting temperature can be used.
  • the heating means may be any as long as it can heat the thermoplastic resin above the glass transition temperature or above the melting temperature.
  • a heater is provided on the stage side to heat the thermoplastic resin from the stage side. Can be used.
  • a resin provided in the pressurizing chamber of the pressurizing unit 6 and heating the thermoplastic resin by radiation from electromagnetic waves such as far infrared rays can also be used.
  • a ceramic heater or a halogen heater provided on the pressurizing chamber side of the pressurizing chamber housing 61 may be used. It is also possible to heat the gas supplied by the pressurizing means 64 and heat it with the gas. Of course, the heating means may be a combination of a plurality of these.
  • the cooling means may be any as long as it can cool the thermoplastic resin below the glass transition temperature or below the melting temperature. Further, the thermoplastic resin may be cooled from the stage side or from the pressurizing chamber side. For example, a cooling water channel provided in the stage to cool the thermoplastic resin from the stage side can be used.
  • the mold release means is for releasing the film 2 from the master mold 1 or the object to be molded 3.
  • the release means can be composed of, for example, a release means 81 and a release roll 82.
  • the separating means 81 is for separating the film 2 from the master mold 1 or the object to be molded 3. Anything may be used as long as the film 2 and the master mold 1 or the object to be molded 3 can be separated from each other.
  • the first roll 41 and the second roll 42 are separated from the master mold 1 or the object to be molded 3 so that the film 2 is separated from the master mold 1 or the object to be molded 3. Any one that moves at least one of the above can be used. Specifically, either the first roll 41 or the second roll 42 may be moved upward to separate the film 2 from the master mold 1 or the object 3 to be molded.
  • the separating means 81 can also serve as the above-mentioned elevating means.
  • the separating means 81 should move at least one of the first roll 41 and the second roll 42 so that the angle between the film 2 and the master mold 1 or the object to be molded 3 is constant. This is good. As a result, any portion of the replica pattern 21 or the fine pattern 31 can be released under the same conditions.
  • the release roll 82 is for moving on the film 2 while pressing the film 2 and the master mold 1 or the object 3 to be molded. If the film 2 is peeled off at once when the film 2 is released, an excessive force or an unbalanced force is applied to the film 2, and the replica pattern 21 and the fine pattern 31 may be damaged. Therefore, in order to prevent this, the release roll 82 is moved from one end to the other end of the master mold 1 or the object to be molded 3 while applying a uniform and appropriate force, so that the replica pattern 21 and the fine pattern 31 are damaged. It can be prevented from doing so.
  • the imprinting apparatus of the present invention may further include a gas removing portion for removing gas between the film 2 and the master mold 1 or the object to be molded 3.
  • the reason for providing the gas removing unit 9 is that when gas exists between the film 2 and the master mold 1 or the film 2 and the object to be molded 3, the film 2 and the master mold 1 or the film 2 and the object to be molded 3 are sufficiently pressed. This is because it cannot be done and may cause transfer failure.
  • a decompression chamber containing at least the master pattern 11 or the replica pattern 21 is formed, and the decompression chamber is depressurized to reduce the pressure between the film 2 and the master mold 1 or between the film 2 and the object 3 to be molded. Anything that removes gas may be used.
  • the pressure is reduced by the master mold stage 51 or the stage 52 for the object to be molded, the frame 91 (see FIG. 16) surrounding the outer periphery of the master mold stage 51 or the stage 52 for the object to be molded, and the film 2. Make up the room.
  • a first moving means capable of relatively moving the pressure chamber housing 61 and the master mold stage 51 or the object to be molded stage 52 in the contacting / separating direction, and the pressure chamber housing 61 and the frame 91.
  • a second moving means capable of relatively moving in the contacting / separating direction and a decompression means 92 such as a decompression pump for depressurizing the pressurizing chamber and the depressurizing chamber are provided. Then, the pressure is reduced in the pressure chamber composed of the pressure chamber housing 61 and the film 2, the master mold stage 51 or the stage 52 for the object to be molded, and the pressure reducing chamber composed of the frame 91 and the film 2.
  • the frame body 91 is provided with a sealing means 93 such as an O-ring that seals between the frame body 91 and the film 2 in the same manner as the sealing means 62 formed in the pressure chamber housing 61 described above. ..
  • a sealing means 94 such as an O-ring between the frame body 91 and the stage 51 for master molding or the stage 52 for an object to be molded.
  • the imprinting apparatus of the present invention may include a master mold coating means and a molded object coating means.
  • the master mold coating means is for coating the replica material 20 on the master mold 1, and for example, a spin coater or the like can be used.
  • the object to be molded object coating means is for coating the object to be molded 3 on a substrate or the like, and for example, a spin coater or the like can be used.
  • the imprint method of the present invention is mainly composed of the replica pattern forming steps shown in FIGS. 1 to 5 and the fine pattern forming steps shown in FIGS. 6 to 10.
  • the replica pattern forming step is a step of forming the replica pattern 21 from the master pattern 11 of the master mold 1, and is composed of a first placement step, a first pressurizing step, a replica pattern fixing step, and a first mold release step. Will be done.
  • the first placement step is a step of stacking the film 2 and the master mold 1.
  • the master mold stage 51 is moved by the master mold moving means to align the film 2 and the master mold 1 in the horizontal direction.
  • the roll 41 and the roll 42 are moved by the elevating means to align the positions of the film 2 and the master mold 1 in the height direction.
  • the film 2 movable between the first roll 41 and the second roll 42 and the master mold 1 coated with the replica material 20 by the replica material coating step are formed.
  • This is the process of pressurizing. Any method may be applied as long as the film 2 and the master mold 1 can be brought into close contact with each other and the master pattern 11 can be filled with the replica material 20.
  • the imprinting apparatus of the present invention is used.
  • the pressure portion 6 of the film 2 may increase the air pressure on the opposite side of the film 2 to the master mold 1 to pressurize the film 2.
  • the replica material coating step is a step of coating the replica material 20 on the master pattern 11 before performing the first pressurizing step. Any method may be used as long as the replica material 20 can be coated on the master mold 1, and for example, a master mold coating means such as a spin coater may be used.
  • a master mold coating means such as a spin coater may be used.
  • the replica pattern fixing step is a step of fixing the replica material 20 and forming the replica pattern 21 on the film 2.
  • the replica material 20 when the replica material 20 is a photocurable resin, it may be cured by irradiating it with an electromagnetic wave having a predetermined wavelength capable of curing the photocurable resin, for example, ultraviolet rays.
  • the replica material 20 is a thermosetting resin
  • the resin may be heated and cured to a temperature at which the thermosetting resin can be cured.
  • the replica material 20 is a thermoplastic resin or the film 2 is used as a thermoplastic resin without using the replica material, the resin is heated to a glass transition temperature or a melting temperature or higher to have fluidity.
  • the first pressurizing step described above may be performed, and then the resin may be cooled to a temperature lower than the glass transition temperature or melting temperature and cured.
  • the replica pattern fixing step may be performed in the pressurizing chamber at the time of pressurization, or may be performed after the pressurizing chamber is opened.
  • the first mold release step is a step of releasing the master mold 1 and the film 2.
  • the master mold 1 and the film 2 may be released in any way as long as they can be released. For example, as shown in FIGS. 4 and 5, the master mold 1 and the film 2 may be separated from the edges and peeled off. .. At this time, as shown in FIG. 4, it is preferable that the master mold 1 and the film 2 are pressed by the release roll 82, and the release roll 82 is released while moving at a constant speed. Further, it is preferable to release the mold while keeping the angle at which the master mold 1 and the film 2 are separated from each other.
  • the fine pattern transfer step is a step of transferring the fine pattern 31 to the object 3 to be molded using the replica pattern 21 created in the replica pattern transfer step, and is a second arrangement step, a second pressurization step, and a fine pattern. It is composed of a fixing process and a second mold release process.
  • the second arrangement step is a step of stacking the film 2 and the object to be molded 3.
  • the stage 52 for the object to be molded is moved by the object moving means to align the film 2 and the object 3 in the horizontal direction.
  • the first roll 41 and the second roll 42 are moved by the elevating means to align the positions of the film 2 and the object 3 in the height direction.
  • the second pressurizing step is a step of pressurizing the film 2 and the object to be molded 3 that can be moved between the first roll 41 and the second roll 42, as shown in FIG. Any method may be applied as long as the film 2 and the object 3 to be molded can be brought into close contact with each other and the replica pattern 21 can be filled with the object 3 to be molded.
  • the present invention The pressure unit 6 of the imprint device may increase the air pressure on the side of the film 2 opposite to the object 3 to be molded and pressurize the film 2.
  • the object to be molded 3 may have a step of applying the object to be molded to the substrate or the like.
  • the object to be molded application step is a step of applying the object to be molded 3 on the substrate before performing the second pressurizing step. Any method may be used as long as the object 3 to be molded can be coated on the substrate, and for example, a means for coating the object to be molded such as a spin coater may be used.
  • the fine pattern fixing step is a step of fixing the object 3 to be molded to form the fine pattern 31.
  • the object 3 to be molded is a photocurable resin
  • it may be cured by irradiating an electromagnetic wave having a predetermined wavelength capable of curing the photocurable resin, for example, ultraviolet rays.
  • the object 3 to be molded is a thermosetting resin
  • the resin may be heated and cured to a temperature at which the thermosetting resin can be cured.
  • the object 3 to be molded is a thermoplastic resin
  • the resin is heated to a temperature equal to or higher than the glass transition temperature or the melting temperature to provide fluidity, and then the above-mentioned second pressurizing step is performed. It may be cured by cooling to a temperature lower than the glass transition temperature or the melting temperature.
  • the second mold release step is a step of releasing the object 3 to be molded and the film 2. Any method may be used as long as the object 3 to be molded and the film 2 can be released. For example, as shown in FIGS. 9 and 10, the object 3 to be molded and the film 2 are separated from the edges. Just peel it off. At this time, as shown in FIG. 9, it is preferable that the object to be molded 3 and the film 2 are pressed by the release roll 82, and the release roll 82 is released while moving at a constant speed. Further, it is preferable to release the mold while keeping the angle at which the object 3 to be molded and the film 2 are separated from each other.
  • the fine pattern transfer step described above can be repeated many times as long as the replica pattern 21 does not deteriorate. After performing one or more fine pattern transfer steps, the process may return to the first placement step as shown in FIG.
  • the imprint method of the present invention may further include a first gas removing step of removing the gas between the film 2 and the master mold 1.
  • a first gas removing step of removing the gas between the film 2 and the master mold 1. For example, as shown in FIG. 13, the master mold 1 is arranged under the film 2 in the first arrangement step, and as shown in FIG. 14, the film 2 is placed on the side wall and the frame 91 of the pressure chamber housing 61. It is sandwiched between the two to form a decompression chamber. By depressurizing this decompression chamber, the gas between the film 2 and the master mold 1 is removed. After that, the master mold 1 and the film 3 may be overlapped in the first arrangement step to seal the space between the film 2 and the master mold 1.
  • the imprint method of the present invention may further include a gas removing step of removing the gas between the film 2 and the object to be molded 3 in the same manner as the first gas removing step.

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Abstract

Le but de la présente invention est de fournir un dispositif d'impression capable de fabriquer en continu un moule de réplique et un produit final.　Ce dispositif d'impression pour transférer un motif fin à un objet à mouler 3 comprend : une unité d'alimentation en film pour déplacer un film 2 entre un premier rouleau 41 et un second rouleau 42 ; un moyen d'agencement pour agencer un moule maître 1 pour former un motif de réplique et l'objet 3 à mouler de telle sorte qu'au moins l'un parmi le motif de réplique et l'objet 3 à mouler chevauche le film 2 ; une unité de pressage 6 pour presser le film 2 et le moule maître 1 ou l'objet 3 à mouler avec un fluide ; un moyen de fixation pour fixer le motif de réplique ou le motif fin ; et un moyen de démoulage pour démouler le film 2 à partir du moule maître 1 ou de l'objet 3 à mouler.
PCT/JP2021/009639 2020-03-11 2021-03-10 Dispositif d'impression WO2021182532A1 (fr)

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JP2020042501 2020-03-11
JP2020-042501 2020-03-11

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WO2021182532A1 true WO2021182532A1 (fr) 2021-09-16

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Citations (9)

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JP2007165812A (ja) * 2005-12-09 2007-06-28 Obducat Ab 中間スタンプを用いたパターン複製装置
WO2008047540A1 (fr) * 2006-09-27 2008-04-24 Toray Industries, Inc. Système de formation de film intermittent et procédé de formation de film intermittent
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