WO2021152432A1 - Deposition compositions and methods of making and using same - Google Patents

Deposition compositions and methods of making and using same Download PDF

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Publication number
WO2021152432A1
WO2021152432A1 PCT/IB2021/050463 IB2021050463W WO2021152432A1 WO 2021152432 A1 WO2021152432 A1 WO 2021152432A1 IB 2021050463 W IB2021050463 W IB 2021050463W WO 2021152432 A1 WO2021152432 A1 WO 2021152432A1
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WIPO (PCT)
Prior art keywords
lubricant
solvent
composition
deposition
substrate
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PCT/IB2021/050463
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English (en)
French (fr)
Inventor
Jason M. Kehren
David J. Lundberg
Zai-Ming Qiu
Michael G. Costello
Michael J. Bulinski
Alexandre R. MONTEIL
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3M Innovative Properties Co
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3M Innovative Properties Co
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Priority to JP2022545986A priority Critical patent/JP7720851B2/ja
Priority to MYPI2022004019A priority patent/MY209058A/en
Priority to US17/795,387 priority patent/US11920102B2/en
Priority to CN202180011311.6A priority patent/CN115003744B/zh
Publication of WO2021152432A1 publication Critical patent/WO2021152432A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/37—Thiols
    • C08K5/372—Sulfides, e.g. R-(S)x-R'
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M107/00—Lubricating compositions characterised by the base-material being a macromolecular compound
    • C10M107/38—Lubricating compositions characterised by the base-material being a macromolecular compound containing halogen
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M135/00—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing sulfur, selenium or tellurium
    • C10M135/08—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing sulfur, selenium or tellurium containing a sulfur-to-oxygen bond
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M135/00—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing sulfur, selenium or tellurium
    • C10M135/20—Thiols; Sulfides; Polysulfides
    • C10M135/22—Thiols; Sulfides; Polysulfides containing sulfur atoms bound to acyclic or cycloaliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M169/00—Lubricating compositions characterised by containing as components a mixture of at least two types of ingredient selected from base-materials, thickeners or additives, covered by the preceding groups, each of these compounds being essential
    • C10M169/04—Mixtures of base-materials and additives
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2213/00—Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
    • C10M2213/06—Perfluoro polymers
    • C10M2213/0606—Perfluoro polymers used as base material
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2219/00—Organic non-macromolecular compounds containing sulfur, selenium or tellurium as ingredients in lubricant compositions
    • C10M2219/04—Organic non-macromolecular compounds containing sulfur, selenium or tellurium as ingredients in lubricant compositions containing sulfur-to-oxygen bonds, i.e. sulfones, sulfoxides
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2219/00—Organic non-macromolecular compounds containing sulfur, selenium or tellurium as ingredients in lubricant compositions
    • C10M2219/08—Thiols; Sulfides; Polysulfides; Mercaptals
    • C10M2219/082—Thiols; Sulfides; Polysulfides; Mercaptals containing sulfur atoms bound to acyclic or cycloaliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2020/00—Specified physical or chemical properties or characteristics, i.e. function, of component of lubricating compositions
    • C10N2020/01—Physico-chemical properties
    • C10N2020/017—Specific gravity or density
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2020/00—Specified physical or chemical properties or characteristics, i.e. function, of component of lubricating compositions
    • C10N2020/01—Physico-chemical properties
    • C10N2020/02—Viscosity; Viscosity index
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2040/00—Specified use or application for which the lubricating composition is intended
    • C10N2040/14—Electric or magnetic purposes
    • C10N2040/18—Electric or magnetic purposes in connection with recordings on magnetic tape or disc

Definitions

  • the present disclosure relates to deposition solvent or carrier solvent solutions and methods for coating substrates using same.
  • a solute is dissolved, emulsified, suspended, or otherwise disposed in a solvent to form a solution.
  • the solution is then applied to a substrate, before evaporating or otherwise removing the solvent, leaving the solute on the substrate (e.g., in the form of a thin film or coating).
  • Application of the solution to the substrate may be carried out using many techniques including dip or drain coating, spin coating, spray coating, or roll-to-roll coating.
  • the solvents used for these applications and techniques require a balance of properties including:
  • Solvent blends can be an option in some cases where a solvent - typically a fluorinated solvent - has the desired properties for deposition but lacks sufficient solubility for the solute.
  • the solvent may be blended with an organic solvent having higher affinity for the solute, but that, by itself, does not have the desired properties of a deposition solvent.
  • Some examples of these co-solvents include alcohols including isopropanol, and trans-1,2-dichloroethylene. These systems can be made to work in some cases, but such solvent blends have several drawbacks including:
  • solubility of the solute e.g., natural evaporation of one component from the mixture will impart a change in properties relative to the solution
  • safety e.g., quality of the deposited solute film
  • hydrofluorothioethers as deposition solvents or carrier solvents.
  • hydrofluorothioethers have strong solubility for several key solutes including perfluoropolyether (PFPE) lubricants, silicones, and fluoropolymers, while also providing of balance of properties that satisfy most if not all of the requirements outlined above.
  • PFPE perfluoropolyether
  • silicones silicones
  • fluoropolymers fluoropolymers
  • fluoro- for example, in reference to a group or moiety, such as in the case of "fluoroalkylene” or “fluoroalkyl” or “fluorocarbon" or “fluorinated” means partially fluorinated such that there is at least one carbon-bonded hydrogen atom
  • perfluoro- for example, in reference to a group or moiety, such as in the case of "perfluoroalkylene” or “perfluoroalkyl” or “perfluorocarbon" or “perfluorinated” means completely fluorinated such that, except as may be otherwise indicated, there are no carbon-bonded hydrogen atoms replaceable with fluorine.
  • the present disclosure is directed to deposition compositions that include one or more hydrofluorothioether compounds and a solute (or material that is otherwise dispersed in the hydrofluorothioether and intended for deposition onto a substrate).
  • suitable hydrofluorothioethers are represented by the following structural formula (I):
  • Rf is a partially fluorinated or perfluorinated group having 2 to 9, 2 to 6, 2 to 5, or 2 to 4 carbon atoms that is saturated or unsaturated, linear or branched, acyclic or cyclic, and optionally includes one or more catenated heteroatoms, chlorine atoms, or bromine atoms.
  • Rf is partially fluorinated.
  • Rf has no more than two hydrogen atoms.
  • Rf is perfluorinated.
  • Rf is a perfluorinated, saturated, branched group having 3 to 6 carbon atoms.
  • Rh is a non-fluorinated hydrocarbon group having 1-3 or 1- 2 carbon atoms that is saturated or unsaturated, linear or branched, and optionally includes one or more catenated heteroatoms. In some embodiments, Rh is CH 3 or CH 3 CH 2 . In some embodiments, Rh is CH 3 .
  • suitable hydrofluorothioethers are represented by the following structural formula (II):
  • At least one R 1 , R 2 , R 3 , and R 4 is a partially fluorinated group having 1 to 4 carbon atoms.
  • R 1 , R 2 , R 3 , and R 4 are, independently, a fluorine atom or a perfluorinated group having 1 to 4 carbon atoms.
  • none of R 1 , R 2 , R 3 , and R 4 have more than two hydrogen atoms.
  • any of the above discussed catenated heteroatoms may be secondary O heteroatoms wherein the O is bonded to two carbon atoms. In some embodiments, any of the above discussed catenated heteroatoms may be tertiary N heteroatoms wherein the N is bonded to three carbon atoms.
  • the fluorine content in the hydrofluorothioether compounds of the present disclosure may be sufficient to make the compounds non-flammable according to ASTM D-3278-96 e-1 test method (“Flash Point of Liquids by Small Scale Closed Cup Apparatus”).
  • representative examples of the compounds of general formula (I) include the following:
  • representative examples of the compounds of general formula (II) include the following:
  • the hydrofluorothioethers of the present disclosure may be synthesized in a one-step process by the reaction of i) perfluoroalkyl iodide with dialkyl sulfide or dialkyl disulfide and alkali metal alkanethiolate under UV or thermal conditions as disclosed in US3816277; or ii) perfluoroalkyl anion generated from perfluoroalkenes and a metal fluoride (MF) or Rf-I or Rf-Br with Rh-SCN as disclosed in J. Org.
  • MF metal fluoride
  • Rf-I or Rf-Br with Rh-SCN as disclosed in J. Org.
  • hydrofluorothioethers of the present disclosure may be synthesized in a two-step process by the reaction of a perfluorinated olefin with sulfur in the catalytic amount of MF to form a cyclic dithietane (e.g. as disclosed in J. Org. Chem., 1982, 47 (2), 377), followed by alkylation with a suitable alkylating reagent (e.g. as disclosed in Izvestiya Akademii Nauk SSSR, Seriya Khimicheskaya 1989, 6, 1380-3).
  • hydrofluorothioethers of the present disclosure may be synthesized via the methods described in US3749794 and/or Russ. Chem. Bull., 1985, 34, 1906, which is herein incorporated by reference in its entirety.
  • one or more of the above-described hydrofluorothioether compounds may be provided in the deposition compositions in an amount of at least 50 wt. %, at least 70 wt. %, at least 90 wt. %; at least 95 wt. %, or at least 99 wt. %, based on the total weight of the composition.
  • the deposition compositions may also include one or more additional solvents (for example, ethers, alkanes, alkenes, perfluorocarbons, perfluorinated tertiary amines, perfluoroethers, cycloalkanes, esters, ketones, aromatics, siloxanes, hydrochlorocarbons, hydrochlorofluorocarbons, hydrofluorocarbons, and the like, and mixtures thereof).
  • additional solvents for example, ethers, alkanes, alkenes, perfluorocarbons, perfluorinated tertiary amines, perfluoroethers, cycloalkanes, esters, ketones, aromatics, siloxanes, hydrochlorocarbons, hydrochlorofluorocarbons, hydrofluorocarbons, and the like, and mixtures thereof).
  • co-solvents are preferably at least partially fluorinated, and can be chosen to modify or enhance the properties of a composition for a particular use, and can be utilized in ratios (of co-solvent(s) to hydrofluorothioether (s)) such that the resulting composition preferably has no flash point.
  • additional solvents may be present in the deposition composition, but may be present in an amount of less than 10 wt. %, less than 5 wt. %, or less than 1 wt. %, based on the total weight of the deposition composition.
  • the deposition compositions may consist essentially of one or more of the above-described hydrofluorothioether compounds and one or more solutes.
  • compositions can comprise conventional additives such as, for example, surfactants, coloring agents, stabilizers, anti-oxidants, flame retardants, and the like, and mixtures thereof.
  • the hydrofluorothioether compounds may have a low environmental impact.
  • the hydrofluorothioether compounds of the present disclosure may have a global warming potential (GWP) of less than 500, 300, 200, 100,
  • GWP is a relative measure of the global warming potential of a compound based on the structure of the compound.
  • the GWP of a compound as defined by the Intergovernmental Panel on Climate Change (IPCC) in 1990 and updated in 2007, is calculated as the warming due to the release of 1 kilogram of a compound relative to the warming due to the release of 1 kilogram of CO2 over a specified integration time horizon (ITH).
  • ai is the radiative forcing per unit mass increase of a compound in the atmosphere (the change in the flux of radiation through the atmosphere due to the IR absorbance of that compound),
  • C is the atmospheric concentration of a compound
  • t is the atmospheric lifetime of a compound
  • t is time
  • i is the compound of interest.
  • the commonly accepted ITH is 100 years representing a compromise between short-term effects (20 years) and longer-term effects (500 years or longer).
  • the concentration of an organic compound, z, in the atmosphere is assumed to follow pseudo first order kinetics (i.e., exponential decay).
  • the concentration of CO2 over that same time interval incorporates a more complex model for the exchange and removal of CO2 from the atmosphere (the Bern carbon cycle model).
  • the hydrofluorothioethers of the present disclosure may have an ozone depletion potential (ODP) of zero or near zero.
  • ODP ozone depletion potential
  • the hydrofluorothioethers provide excellent wettability including low surface tension and low viscosity.
  • the surface tension of the hydrofluorothioether may be less than 25 dyne per centimeter (dyn/cm), or less than 20 dyn/cm, or less than 15 dyn/cm.
  • the viscosity of the hydrofluorothioether may be less than 2 centipoise (cps), or less than 1 cps.
  • the hydrofluorothioethers evaporate uniformly and completely off the substrate after the deposition process. Evaporation of the solvent is controlled by the boiling point and heat of vaporization of the solvent. In some embodiments, the boiling point of the hydrofluorothioether is less than 150 degrees Celsius (°C), less than 130°C, less than 100°C or less than 80°C. In some embodiments, the heat of vaporization of the hydrofluorothioether is less than 50 calories per gram (cal/g), less than 40 cal/g, less than 35 cal/g, or less than 30 cal/g.
  • the solutes of the deposition compositions may include pigments, lubricants, stabilizers, adhesives, anti-oxidants, dyes, polymers, pharmaceuticals, document preservation materials (for example, alkaline materials used in the deacidification of paper), release agents, inorganic oxides, and the like, and combinations thereof.
  • coating materials may include any one or combination of perfluoropolyethers, hydrocarbons, silicone lubricants, polymers or copolymers of various fluorocarbon or perfluorocarbon monomers (e.g., tetrafluoroethylene, vinylidenedifluoride, fluorinated acrylates) or combinations thereof.
  • suitable coating materials include titanium dioxide, iron oxides, magnesium oxide, polysiloxanes, stearic acid, acrylic adhesives, or combinations thereof.
  • the deposition compositions may include 0.001 to 10 weight percent, 0.1 to 10 weight percent, or 0.1 to 5 weight percent, of any one or combination of the above-described solutes, based on the total weight of the deposition composition.
  • Particular applications for the deposition compositions of the present disclosure include disc lube in the hard disk drive industry (PFPE lubricants), needle deposition in the medical industry (silicones), and deposition of fluoropolymer coatings for electrical components including printed circuit board assemblies (PCBA) and sensors.
  • Other applications include carrier solvent for fingerprint developer or particle deposition.
  • a magnetic layer on a disk also called the media.
  • This magnetic layer is protected by a diamond like carbon (DLC) layer and a lubricant.
  • the information in the magnetic layer on the media is read using sensors in a head that “flies” over the media as the media rotates.
  • DLC diamond like carbon
  • the thickness of the DLC and lubricant layers along with the fly height of the head determine this separation.
  • the lubricants typically used are functionalized perfluoropolyethers (PFPE).
  • PFPE perfluoropolyethers
  • the PFPE polymer is typically linear.
  • An alcohol is a common functional group.
  • Z-Dol available from Solvay
  • Z-Dol has two alcohol groups and was used as a lubricant by the HDD industry for many years:
  • n to m is about 1 and the molecular weight can range from 1000 to 6000.
  • new lubricants are being introduced. Some examples of these include Z-Tetraol (available from Solvay) with 4 alcohol groups:
  • Z is -OCH2CF 2 0-(-CF 2 CF 2 0-)n-(-CF 2 O-)m-CF 2 CH20-.
  • PFPE lubricants with 6 alcohol groups along with molecules with other polar groups are also being evaluated.
  • finding a solvent to meet the performance requirements has become difficult.
  • the present hydrofluorothioethers provide such a single solvent solution given their solubility for highly polar lubricants and other properties that satisfy the previously mentioned deposition solvent requirements.
  • the above-described deposition compositions can be useful in depositing films or coatings, where the hydrofluorothioethers function as a carrier for a coating material (also referred to herein as a solute) to enable deposition of the material on the surface of a substrate.
  • the present disclosure further relates to a process for depositing a coating on a substrate surface using the deposition compositions of the present disclosure.
  • the process comprises the step of applying to at least a portion of at least one surface of a substrate a coating of a deposition composition comprising (a) a solvent composition that includes one or more hydrofluorothioethers compounds as described above; and (b) one or more coating materials which are soluble or otherwise dispersible in the solvent composition, and optionally any of the above described co- dispersants, co-solvents, or more additives.
  • the coating can be of any desired thickness, and, in practice, the thickness will be determined by such factors as the viscosity of the coating material, the temperature at which the deposition composition is applied, and the rate of withdrawal (if immersion is utilized).
  • the deposition process of the disclosure can be carried out by applying the deposition composition to a substrate by any conventional technique.
  • the composition can be brushed or sprayed (e.g., as an aerosol) onto the substrate, or the substrate can be spin-coated.
  • the substrate may be coated by immersion in the composition. Immersion can be carried out at any suitable temperature and can be maintained for any convenient length of time. If the substrate is a tubing, such as a catheter, and it is desired to ensure that the composition coats the lumen wall, the composition may be drawn into the lumen by the application of reduced pressure.
  • the process may further include the step of removing the solvent composition from the coating by, e.g., allowing evaporation (which can be aided by the application of, e.g., heat or vacuum).
  • Both organic and inorganic substrates can be coated by the processes of the present disclosure.
  • Representative examples of the substrates include metals, ceramics, glass, polycarbonate, polystyrene, acrylonitrile-butadiene-styrene copolymer, natural fibers (and fabrics derived therefrom) such as cotton, silk, fur, suede, leather, linen, and wool, synthetic fibers (and fabrics) such as polyester, rayon, acrylics, nylon, or blends thereof, fabrics including a blend of natural and synthetic fibers, and composites of the foregoing materials.
  • substrates that may be coated include, for example, magnetic hard disks with perfluoropolyether lubricants, medical devices with silicone lubricants, or electrical connectors with copolymers of various fluorocarbon or perfluorocarbon monomers.
  • the method comprises applying a coating of a lubricant composition to a substrate followed by removing the solvent from the coating to form a neat lubricant film.
  • the lubricant composition may include 0.001 to 10 wt.% perfluoropolyether lubricant or silicone lubricant and about 90.0 to about 99.99 weight percent of one or more of the above-described hydrofluorothioether compounds, based on the weight of the lubricant composition.
  • the hydrofluorothioether solvent may then be removed during a drying step.
  • the substrate may be magnetic media including, for example, thin films and hard disks, or a medical device.
  • the magnetic media may include a base layer such as glass, aluminum or a polymeric material and a magnetic layer containing iron, cobalt, nickel, or the like.
  • the magnetic media can contain optional layers of carbon or other materials to enhance, for example, durability and performance of the media.
  • the lubricant may be applied as the outermost layer.
  • Example 1 Perfluoroisopropyl methyl thioether (PFIPTE) (CF 3 ) 2 CFSCH 3
  • PFIPTE Perfluoroisopropyl methyl thioether
  • CF 3 Perfluoroisopropyl methyl thioether
  • N,N- dimethylformamide 300 mL
  • the reactor was sealed and the contents were heated to 60 °C with stirring. Once the reactor stabilized at this temperature, hexafluoropropene (150 g, 1.0 mol) was added at a rate of 6 g/min, maintaining the temperature below 65 °C.
  • Solubility of Z-Tetraol and ZTMD lubricants in PFIPTE (Example 1) and Comparative Examples CE1 and CE2 was determined at room temperature as follows. A glass vial having a PTFE lined cap was weighed to 4 decimal places using a standard laboratory balance. Lubricant was added to the vial and the mass was recorded. Solvent was then added to the vial dropwise or in increments until the lubricant was completely solubilized in the solvent.
  • the gross weight of the container was measured, the mass of the solvent was determined by subtracting the weights of the vial and the lubricant, and the weight percentage of lubricant was calculated as the amount of lubricant divided by the total weight of lubricant and solvent. Solubility was determined as the maximum value of the weight percentage of lubricant for which the lubricant completely solubilized in the solvent. Results are presented in Table 2.
  • Comparative Examples CE1 and CE3 was determined at room temperature as follows. An empty vial was placed on a standard laboratory balance and tared. Solvent was added to the vial and the weight recorded. The desired lubricant solute was added to the vial and the mass of the solute was recorded. The vial was sealed, agitated and the solubility observed. If the solute completely dissolved, additional solute was added, and the mass recorded, repeating the above steps. Addition of solute continued until the solute was no longer soluble or the solubility was greater than 75% by weight. Solubility was determined as a weight percentage of lubricant to the total weight of lubricant and solvent.
  • Example 1 The boiling point and vapor pressure for Example 1 was determined using the procedures in ASTM E1719-97 “Standard Test Method for Vapor Pressure of Liquids by Ebulliometry.” First, vapor pressure was measured, then the boiling point was calculated as described in section 10 of ASTM method El 719-97.
  • Heat of vaporization for Example 1 was calculated using the vapor pressure data and the Clausius-Clapeyron equation.
  • the atmospheric lifetime of each test material was determined from relative rate studies utilizing chloromethane (CH 3 CI) as a reference compound.
  • the pseudo-first order reaction rates of the reference compound and the test compound with hydroxyl radicals (OH) was determined in a laboratory chamber system.
  • the atmospheric lifetime of the reference compound is documented in the literature.
  • the atmospheric lifetime for each specimen was calculated from the reaction rates for the test compound relative to the reference compounds and the reported lifetime of the reference compounds as shown below: where is the atmospheric lifetime of test material, is the atmospheric lifetime of the reference compound, and k x and k r are the rate constants for the reaction of hydroxyl radical with test material and the reference compound, respectively.
  • the concentrations of gases in the test chamber were quantified by Fourier transform infrared spectroscopy (FTIR). The measured atmospheric lifetime value of each fluid was subsequently used for the GWP calculation.
  • FTIR Fourier transform infrared spectroscopy
  • GWP Global Warming Potential
  • Flash points were measured according to the procedures outlined in ASTM D- 3278-96 e-1 “Standard Test Methods for Flash Point of Liquids by Small Scale Closed- Cup Apparatus.” Materials that demonstrated no flash point were considered to be non- flammable according to the ASTM test method.
  • Example 1 has evaporation (boiling point and heat of vaporization) and deposition (density, surface tension and viscosity) properties on par with CE1 and CE2, while having significantly lower GWP and improved solubility for solutes of interest (see Tables 2 and 3).

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  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Medicinal Chemistry (AREA)
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PCT/IB2021/050463 2020-01-29 2021-01-21 Deposition compositions and methods of making and using same Ceased WO2021152432A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2022545986A JP7720851B2 (ja) 2020-01-29 2021-01-21 堆積組成物、並びにそれを製造及び使用する方法
MYPI2022004019A MY209058A (en) 2020-01-29 2021-01-21 Deposition compositions and methods of making and using same
US17/795,387 US11920102B2 (en) 2020-01-29 2021-01-21 Deposition compositions and methods of making and using same
CN202180011311.6A CN115003744B (zh) 2020-01-29 2021-01-21 沉积组合物及其制备和使用方法

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