WO2021136273A1 - Casing body assembly, casing body assembly preparation method, and electronic device - Google Patents

Casing body assembly, casing body assembly preparation method, and electronic device Download PDF

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Publication number
WO2021136273A1
WO2021136273A1 PCT/CN2020/140883 CN2020140883W WO2021136273A1 WO 2021136273 A1 WO2021136273 A1 WO 2021136273A1 CN 2020140883 W CN2020140883 W CN 2020140883W WO 2021136273 A1 WO2021136273 A1 WO 2021136273A1
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WO
WIPO (PCT)
Prior art keywords
layer
optical film
color
film layer
color layer
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PCT/CN2020/140883
Other languages
French (fr)
Chinese (zh)
Inventor
成乐
Original Assignee
Oppo广东移动通信有限公司
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Filing date
Publication date
Application filed by Oppo广东移动通信有限公司 filed Critical Oppo广东移动通信有限公司
Publication of WO2021136273A1 publication Critical patent/WO2021136273A1/en

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    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04MTELEPHONIC COMMUNICATION
    • H04M1/00Substation equipment, e.g. for use by subscribers
    • H04M1/02Constructional features of telephone sets
    • H04M1/0202Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
    • H04M1/026Details of the structure or mounting of specific components
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04MTELEPHONIC COMMUNICATION
    • H04M1/00Substation equipment, e.g. for use by subscribers
    • H04M1/02Constructional features of telephone sets
    • H04M1/0202Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
    • H04M1/0279Improving the user comfort or ergonomics
    • H04M1/0283Improving the user comfort or ergonomics for providing a decorative aspect, e.g. customization of casings, exchangeable faceplate

Definitions

  • This application belongs to the technical field of electronic products, and specifically relates to a housing assembly, a method for manufacturing the housing assembly, and electronic equipment.
  • the present application provides a housing assembly, a manufacturing method of the housing assembly, and an electronic device that achieve color contrast effects with different textures.
  • the present application provides a housing assembly including a transparent substrate and an optical film layer, a first color layer and a modification layer provided on the transparent substrate;
  • the first color layer is arranged on the surface of the optical film layer, and the first color layer has a hollow part;
  • the modification layer is partly arranged on the surface of the first color layer away from the optical film layer, and partly arranged on the surface of the optical film layer exposed by the hollow part, and the modification layer includes a second color layer and The coating layer on the surface of the second color layer, the second color layer is close to the optical film layer and the optical transmittance is greater than 30%, or the coating layer is close to the optical film layer and the optical transmittance is greater than 30%, the optical transmittance of the first color layer is less than 10%, and the colors of the first color layer and the second color layer are different.
  • the present application provides a method for preparing a housing assembly, including:
  • a transparent substrate is provided, and an optical film layer, a first color layer and a modified layer are formed on the transparent substrate, wherein the first color layer is disposed on the surface of the optical film layer, and the first color layer has Hollow part; the modification layer is partly arranged on the surface of the first color layer away from the optical film layer, and partly arranged on the surface of the optical film layer exposed by the hollow part, the modification layer includes a second color Layer and a coating layer disposed on the surface of the second color layer, the second color layer is close to the optical film layer and the optical transmittance is greater than 30%, or the coating layer is close to the optical film layer and is optically transparent
  • the light rate is greater than 30%, the optical transmittance of the first color layer is less than 10%, and the colors of the second color layer and the first color layer are different.
  • the present application provides an electronic device, including a display screen, and a cover plate and a housing assembly arranged on opposite sides of the display screen.
  • the housing assembly includes a transparent substrate and a housing assembly arranged on the transparent substrate.
  • the first color layer is away from the surface of the optical film layer, and is partially disposed on the surface of the optical film layer exposed by the hollow portion, and the modification layer includes a second color layer and is disposed on the surface of the second color layer
  • the second color layer is close to the optical film layer and the optical transmittance is greater than 30%, or the coating layer is close to the optical film layer and the optical transmittance is greater than 30%, the first color
  • the optical transmittance of the layer is less than 10%, the colors of the second color layer and the first color layer are different, the housing assembly has an inner surface
  • the present application provides a housing assembly and a method for preparing the housing assembly.
  • a first color layer with a hollow part the surface of the transparent substrate is partially covered by the optical film layer and the first color layer, and partly covered by the optical film layer and the first color layer.
  • the film layer, the second color layer, and the coating layer are covered, presenting different colors and gloss texture effects, realizing the contrast effect of different textures, and enriching the visual effects of the shell assembly; this application also provides an electronic device including the above-mentioned shell assembly Equipment to improve the appearance and expressiveness of electronic equipment.
  • FIG. 1 is a schematic structural diagram of a housing assembly according to an embodiment of the application.
  • FIG. 2 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
  • FIG. 3 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
  • FIG. 4 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
  • FIG. 5 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
  • FIG. 6 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
  • FIG. 7 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
  • FIG. 8 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
  • FIG. 9 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
  • FIG. 10 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
  • FIG. 11 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
  • FIG. 12 is a schematic flowchart of a method for manufacturing a housing assembly according to an embodiment of the application.
  • FIG. 13 is a schematic flow chart of a manufacturing method of a housing assembly according to another embodiment of the application.
  • FIG. 14 is a schematic structural diagram of an electronic device according to an embodiment of the application.
  • Transparent substrate-10 optical film layer-20, first color layer-30, modification layer-40, second color layer-41, coating layer-42, second texture layer-43, first texture layer-50, Connection layer-60, protective layer-70, shading layer-80, housing assembly-100, display screen-200, cover plate-300.
  • FIG. 1 is a schematic structural diagram of a housing assembly 100 according to an embodiment of the application.
  • the housing assembly 100 includes a transparent substrate 10 and an optical film layer 20 and a first color layer 30 disposed on the transparent substrate 10.
  • modification layer 40 ; the first color layer 30 is arranged on the surface of the optical film layer 20, the first color layer 30 has a hollow part; the modification layer 40 is partially arranged on the surface of the first color layer 30 away from the optical film layer 20, and is partially arranged on The surface of the optical film layer 20 exposed by the hollow part.
  • the modification layer 40 includes a second color layer 41 and a coating layer 42 disposed on the surface of the second color layer 41.
  • the second color layer 41 is close to the optical film layer 20 and optically The transmittance is greater than 30%, or the coating layer 42 is close to the optical film layer 20 and the optical transmittance is greater than 30%, the optical transmittance of the first color layer 30 is less than 10%, and the first color layer 30 and the first color layer 30 The colors of the two color layers 41 are different.
  • the transparent substrate 10 is partially covered with the first color layer 30, and the area covered with the first color layer 30 has the optical film layer 20 and the first color layer 30 superimposed on the appearance effect of a color and gloss texture; at the same time, a second color layer 41 and a coating layer 42 are arranged in the corresponding area of the hollow part, and the corresponding area of the hollow part has an optical film layer 20, a second color layer 41 and a coating film.
  • the appearance effect of another color and gloss texture superimposed on the layer 42 makes the housing assembly 100 have different color areas, and the gloss texture of the different color areas is also different, which realizes the contrast effect of different textures and enriches the housing
  • the appearance effect of the assembly 100 improves the appearance and expressiveness of the housing assembly 100, and compared with the design scheme that requires an overprinting process, the housing assembly 100 provided in the present application will not have dislocations and boundaries between different color layers. Obvious, poor wiring and other defects, with a good appearance effect.
  • the material for forming the transparent substrate 10 is not particularly limited.
  • the material of the transparent substrate 10 includes at least one of an organic polymer compound and an inorganic non-metallic material.
  • the material of the transparent substrate 10 includes polycarbonate (PC), polymethyl methacrylate (PMMA), polyethylene terephthalate (PET), thermoplastic polyurethane (TPU), glass and ceramics. At least one of.
  • the transparent substrate 10 is formed by stacking a polyethylene terephthalate layer and a polymethyl methacrylate layer.
  • the transparent substrate 10 has certain light transmittance.
  • the optical transmittance of the transparent substrate 10 is greater than 90%.
  • the optical transmittance is the transmittance of light in the 380nm-780nm band.
  • the thickness of the transparent substrate 10 is not particularly limited.
  • the thickness of the transparent substrate 10 is 0.05mm-0.8mm, and specifically can be but not limited to 0.05mm, 0.08mm, 0.15mm, 0.3mm, 0.45mm, 0.5mm, 0.68mm, 0.77mm, 0.8mm, etc., to meet the requirements of the impact resistance of the shell assembly 100, and not to be too thick, to meet the needs of light and thin.
  • the transparent substrate 10 is formed by laminating a polycarbonate layer and a polymethyl methacrylate layer, the thickness of the polycarbonate layer is 0.59 nm, the thickness of the polymethyl methacrylate is 0.05 nm, and the transparent substrate 10 is transparent.
  • the thickness of the substrate 10 is 0.64 mm.
  • the transparent substrate 10 can be, but is not limited to, a back shell and/or a middle frame of an electronic device.
  • the transparent substrate 10 can be used directly as a casing of an electronic device, or it can be used as a casing after a functional film layer is formed on the transparent substrate 10.
  • the specific shape and size of the transparent substrate 10 are not limited, and can be selected and designed according to actual needs.
  • the shape of the transparent substrate 10 can be a 2D shape, a 2.5D shape or a 3D shape.
  • patterns, characters, etc. can be silk-printed on the surface of the transparent substrate 10, specifically, logos, etc. can be silk-printed to improve the visual effect of the housing assembly 100; for example, the thickness of the silk-print is 1 ⁇ m-4 ⁇ m , Bake at 60°C-80°C for 45min-80min.
  • the optical film layer 20 is disposed on the surface of the transparent substrate 10, and the first color 30 and the modification layer 40 are disposed on the surface of the optical film layer 20 away from the transparent substrate 10.
  • the optical film layer 20 is an optical medium material layer that transmits light through its interface, and can change the reflection, refraction, etc. of the light passing through the optical film layer 20, so that the housing assembly 100 exhibits a certain gloss change, such as under different angles. It presents different color gloss and brings metallic texture and other visual effects; by changing the material, thickness and number of layers of the optical film 20, the reflectance, refractive index and light transmittance of the optical film 20 are changed to achieve different visual effects. Meet the needs of different scenarios.
  • the material of the optical film layer 20 is selected from substances that can make the optical film layer 20 have a certain optical effect. Specifically, but not limited to, the optical film layer 20 has a certain refractive index, transmittance, and reflectivity. Wait. In the present application, the optical transmittance of the optical film layer 20 is greater than 15%, so that the visual effects of other layer structures can be presented. Optionally, the optical transmittance of the optical film layer 20 is greater than 50%. Further, the optical transmittance of the optical film layer 20 is greater than 80%.
  • the material of the optical film layer 20 may be inorganic or organic. Optionally, the organic substance includes at least one of polyether, polyester, fluoropolymer, and silicon-containing polymer.
  • the optical film layer 20 When the material of the optical film layer 20 is organic, the optical film layer 20 has good flexibility and flexibility, and can be cut to obtain the optical film layer 20 of a desired size.
  • the inorganic substance includes at least one of elemental metal, inorganic oxide, and inorganic fluoride.
  • the material of the optical film layer 20 includes at least one of simple metals, inorganic oxides, and inorganic fluorides.
  • the material of the optical film layer 20 includes TiO 2 , NbO 2 , Nb 2 O 3 , and Nb 2 At least one of O 2 , Nb 2 O 5 , SiO 2 and ZrO 2 or other non-conductive oxides.
  • the material of the optical film layer 20 may be selected from a combination of at least two of TiO 2 , NbO 2 , Nb 2 O 3 , Nb 2 O 2 , Nb 2 O 5 , SiO 2 and ZrO 2 so that the optical film layer 20 It presents the effect of colorful gloss texture such as blue or purple.
  • the optical film layer 20 may have a single-layer film structure or a multilayer film structure.
  • the material and thickness of each layer and the coordination between the layers can be controlled to achieve the desired function.
  • the optical film layer 20 is formed by alternately laminating at least two optical films with different refractive indexes.
  • the optical film layer 20 is composed of a plurality of optical films, the refractive indexes of adjacent optical films are different.
  • the optical film layer 20 is formed by periodically alternately laminating at least two kinds of films with different refractive indexes.
  • the material and thickness of the multiple optical films can be the same or different. The optical properties of multiple optical films are different.
  • the optical film layer 20 may include, but is not limited to, two, three, four, five, six, seven, or eight optical films.
  • the optical film layer 20 is formed by alternately laminating three layers of silicon dioxide optical films and three layers of titanium dioxide optical films.
  • the thickness of the optical film layer 20 is 80-500nm, specifically but not limited to 80nm, 100nm, 180nm, 250nm, 300nm, 470nm, 500nm, etc., too thin will cause the optical film layer 20 to present a glossy texture effect Too weak or too thick will cause excessive stress in the film layer and easy to fall off.
  • the optical film layer 20 in the present application has a whole-layer structure, and there is no need to shield or etch during the preparation process, and it is easier to prepare the optical film layer 20 with excellent performance.
  • the method of forming the optical film layer 20 is not particularly limited. For example, it may be formed by a physical vapor deposition method or a vacuum coating method. In one embodiment, the optical film layer 20 is formed by a vacuum non-conductive electroplating (NVCM) process.
  • NVCM vacuum non-conductive electroplating
  • the first color layer 30 is disposed on the surface of the optical film layer 20, and the first color layer 30 is used to color the housing assembly 100, so that the housing assembly 100 has a rich appearance effect.
  • the thickness of the first color layer 30 is not particularly limited.
  • the thickness of the first color layer 30 may be 3 ⁇ m-10 ⁇ m, and specifically may be 4 ⁇ m, 5 ⁇ m, 6.5 ⁇ m, 7.2 ⁇ m, 8 ⁇ m, or 9 ⁇ m.
  • the housing assembly 100 can have a good color effect.
  • the first color layer 30 has a hollow portion, that is, the first color layer 30 is provided on a part of the surface of the transparent substrate 10.
  • the hollow part can be, but is not limited to, a preset pattern, text, etc.
  • the shape of the hollow portion is not particularly limited, and the shape of the hollow portion can be designed to make the housing assembly 100 present a rich appearance effect.
  • the first color layer 30 can be formed by at least one of offset printing, silk screen printing, printing and thermal transfer.
  • the position of the material of the first color layer 30 can be controlled by silk screen printing to directly form the first color layer with a hollow part.
  • the first color layer 30 may be formed of an ink having a predetermined color, for example, a UV curable ink or the like.
  • the first color layer 30 may have a single-layer structure or a multi-layer structure, and the colors of the inks forming different layers may be the same or different.
  • the ink color can be, but is not limited to, yellow, red, blue, green, white, black, etc.
  • the silk-screened film pattern is controlled, the optical film layer 20 is coated with a 4 ⁇ m-8 ⁇ m thick color ink, and the first color with a hollow part is formed after baking at 60° C.-90° C. for 30 min-60 min. Layer 30.
  • the optical transmittance of the first color layer 30 is less than 10%, so that the first color layer 30 can block light, and the film layer located behind the first color layer 30 in the light propagation direction has a visual effect.
  • the hollow part in the first color layer 30 can present the visual effect of the rear film layer, thereby creating a difference in visual effect, thereby improving the appearance and expressiveness of the housing assembly 100.
  • the modification layer 40 is disposed on the surface of the transparent substrate 10, and the optical film layer 20 and the first color layer 30 are disposed on the modification layer 40 away from the transparent substrate 10. surface.
  • the modification layer 40 is partly arranged on the surface of the first color layer 30 away from the optical film layer 20, and partly on the surface of the optical film layer 20 exposed by the hollow part, that is, the orthographic projection of the modification layer 40 on the optical film layer 20 is completely Cover the orthographic projection of the hollow part on the optical film layer 20.
  • the modification layer 40 is used to modify and decorate the housing assembly 100 and produce a visual effect different from the non-hollowed area of the first color layer 30.
  • the surface of the modification layer 40 away from the optical film layer 20 is a flat surface.
  • the modification layer 40 includes a second color layer 41 and a coating layer 42 disposed on the surface of the second color layer 41.
  • the optical transmittance of the second color layer 41 and the coating layer 42 that is close to the optical film layer 20 is greater than 30%. That is, in the second color layer 41 and the coating layer 42, when the second color layer 41 is closer to the optical film layer 20, the optical transmittance of the second color layer 41 is greater than 30%, so that the visual effect of the coating layer 42 Can be presented without being blocked by the second color layer 41; when the coating layer 42 is closer to the optical film layer 20, the optical transmittance of the coating layer 42 is greater than 30%, so that the visual effect of the second color layer 41 can be presented , Not blocked by the coating layer 42.
  • the second color layer 41 is used to color the housing assembly 100 so that the housing assembly 100 has a rich appearance effect.
  • the thickness of the second color layer 41 is not particularly limited.
  • the thickness of the second color layer 41 may be 3 ⁇ m-10 ⁇ m, specifically, 4 ⁇ m, 5 ⁇ m, 6 ⁇ m, 7 ⁇ m, 8 ⁇ m, or 9 ⁇ m.
  • the housing assembly 100 can have a good color effect.
  • the second color layer 41 may be formed by at least one of offset printing, silk screen printing, printing, and thermal transfer.
  • the second color layer 41 may be formed of an ink having a predetermined color, for example, a UV curable ink or the like.
  • the second color layer 41 may have a single-layer structure or a multi-layer structure, and the colors of the inks forming different layers may be the same or different.
  • the ink color can be, but is not limited to, yellow, red, blue, green, white, black, etc.
  • the second color layer 41 is formed by silk-screening a color ink with a thickness of 4 ⁇ m-8 ⁇ m and baking at 60° C.-90° C. for 30 min-60 min.
  • the colors of the first color layer 30 and the second color layer 41 are different, so that the housing assembly 100 produces different colors to achieve a color contrast effect.
  • the coating layer 42 has a similar effect to the optical film layer 20. It is an optical medium material layer that transmits light through its interface, and can change the reflection, refraction, etc. of the light passing through the coating layer 42, so that the housing assembly 100 Show a certain gloss change, such as showing different color gloss at different angles, bringing visual effects such as metallic texture; changing the reflectivity, refractive index and transparency of the coating layer 42 by changing the material, thickness and number of layers of the coating layer 42 The light rate can achieve different visual effects to meet the needs of different scenarios.
  • the material of the coating layer 42 is selected from substances that can make the coating layer 42 have a certain optical effect.
  • the coating layer 42 has a certain refractive index, transmittance, and reflectivity.
  • the material of the coating layer 42 may be inorganic or organic.
  • the organic substance includes at least one of polyether, polyester, fluoropolymer, and silicon-containing polymer.
  • the coating layer 42 has good flexibility and flexibility, and can be cut to obtain a coating layer 42 of a desired size.
  • the inorganic substance includes at least one of elemental metal, inorganic oxide, and inorganic fluoride.
  • the material of the coating layer 42 includes at least one of simple metal, inorganic oxide, and inorganic fluoride.
  • the material of the coating layer 42 includes In, Sn, TiO 2 , NbO 2 , Nb 2 O 3 , At least one of Nb 2 O 2 , Nb 2 O 5 , SiO 2 and ZrO 2 or other non-conductive oxides.
  • the material of the coating layer 42 is In-Sn, which produces a metallic texture effect with high reflectivity.
  • the material of the coating layer 42 can be selected from a combination of at least two of TiO 2 , NbO 2 , Nb 2 O 3 , Nb 2 O 2 , Nb 2 O 5 , SiO 2 and ZrO 2 to make the coating layer 42 appear blue. Color or purple and other colored glossy texture effects.
  • the material of the coating layer 42 may be In or In-Sn, so that the coating layer 42 presents a silver metallic texture effect.
  • the plating film layer 42 may have a single-layer film structure or a multilayer film structure.
  • the coating layer 42 is a multilayer film structure, the material and thickness of each layer and the coordination between the layers can be controlled to achieve the desired function.
  • the coating layer 42 is formed by alternately laminating at least two optical films with different refractive indices.
  • the coating layer 42 is composed of a plurality of optical films, the refractive indexes of adjacent optical films are different.
  • the coating layer 42 is formed by periodically alternately laminating at least two kinds of films with different refractive indexes.
  • the material and thickness of the multiple optical films can be the same or different. The optical properties of multiple optical films are different.
  • the coating layer 42 may include, but is not limited to, a 2-layer, 3-layer, 4-layer, 5-layer, 6-layer, 7-layer, or 8-layer optical film.
  • the thickness of the coating layer 42 is 20nm-500nm, specifically, but not limited to 30nm, 80nm, 150nm, 220nm, 300nm, 470nm, 500nm, etc., too thin will cause the coating layer 42 to exhibit too weak gloss texture effect If the thickness is too thick, the stress in the film layer will be too large and easy to fall off.
  • the coating layer 42 in the present application has a whole-layer structure, and there is no need for masking or etching during the preparation process, and it is easier to prepare the coating layer 42 with excellent performance.
  • the method of forming the coating layer 42 is not particularly limited. For example, it can be formed by a physical vapor deposition method or a vacuum coating method.
  • the coating equipment can be a magnetron sputtering furnace or an electron gun evaporation coating.
  • the coating layer 42 is formed by a vacuum non-conductive electroplating (NVCM) process.
  • NVCM vacuum non-conductive electroplating
  • FIG. 2 is a schematic structural diagram of a housing assembly according to another embodiment of the application, in which the modification layer 40 further includes a second texture layer 43, and the second texture layer 43 is disposed on the coating layer 42 close to the optical film layer 20 s surface.
  • the second texture layer 43 can make the housing assembly 100 present a texture visual effect.
  • the second texture layer 43 is superimposed on the coating layer 42, so that the appearance effect of the second texture layer 43 is more clearly presented, and has different effects at different angles.
  • the color of the light changes to present textures with different textures, and the appearance and expressiveness of the housing assembly 100 is improved.
  • the optical transmittance of the second texture layer 43 is greater than 30%. Further, the optical transmittance of the second texture layer 43 is greater than 50%, 70%, 80%, or 90%.
  • the thickness of the second texture layer 43 may be 5 ⁇ m-15 ⁇ m, specifically but not limited to 6 ⁇ m, 7 ⁇ m, 9.5 ⁇ m, 10 ⁇ m, 11.5 ⁇ m, 12 ⁇ m, 15 ⁇ m, etc., within this thickness range, a good texture effect can be formed. Too large a thickness may result in poor impact resistance and easy cracking of the second texture layer 43, and too small a thickness may result in inconspicuous texture formation, and it is difficult to control the preparation process.
  • the second texture layer 43 may only be provided on the surface of the modification layer 40 corresponding to the hollow portion, that is, the orthographic projection of the second texture layer 43 on the coating layer 42 and the orthographic projection of the hollow portion on the coating layer 42 are complete.
  • the second texture layer 43 can be arranged in a small area on the surface of the coating layer 42 to present a texture effect through the hollow part, saving the use of the material of the second texture layer 43.
  • the orthographic projection of the second texture layer 43 on the coating layer 42 completely covers the orthographic projection of the hollow portion on the coating layer 42 and partially covers the orthographic projection of the first color layer 30 on the coating layer 42; this At this time, the orthographic projection of the second texture layer 43 on the coating layer 42 and the orthographic projection of the first color layer 30 on the coating layer 42 can be completely overlapped, which is beneficial to the overall film structure of the housing assembly 100 to be flatter.
  • the second texture layer 43 corresponding to the hollow portion only needs to have a texture, and of course, the whole layer may also have a texture.
  • the second texture layer 43 may be formed on the coating layer 42 by, but not limited to, UV transfer optical texture processing.
  • the second texture layer 43 is formed on the coating layer 42 by a high-scratch-resistant UV transfer glue, a high-hardness UV transfer glue, a high-elastic UV transfer glue or a general-purpose UV transfer glue.
  • the material of the UV transfer adhesive includes polyurethane acrylic resin and the like.
  • the UV transfer glue is coated and cured to form the second texture layer 43.
  • curing comprises curing the LED or a mercury lamp, wherein, LED curing energy 800mJ / cm 2 -2500mJ / cm 2 , a mercury lamp curing energy 550mJ / cm 2 -1500mJ / cm 2 .
  • the housing assembly 100 further includes a first texture layer 50, and the first texture layer 50 is disposed on the surface of the optical film layer 20 away from the modification layer 40.
  • the first texture layer 50 can make the housing assembly 100 present a texture visual effect.
  • the first texture layer 50 is arranged on the surface of the optical film layer 20, so that the appearance effect of the first texture layer 50 is more clearly presented, and has different angles. Different light colors change to present textures with different textures; the first texture layer 50 combined with the first color layer 30, the second color layer 41, etc., can achieve texture visual effects with different colors and textures.
  • the optical transmittance of the first texture layer 50 is greater than 30%. Further, the optical transmittance of the first texture layer 50 is greater than 50%, 70%, 80% or 90%.
  • the thickness of the first texture layer 50 may be 5 ⁇ m-15 ⁇ m, specifically but not limited to 6 ⁇ m, 7 ⁇ m, 8 ⁇ m, 10 ⁇ m, 11 ⁇ m, 12 ⁇ m, 15 ⁇ m, etc., within this thickness range, a good texture effect can be formed. It is likely that the first texture layer 50 has poor impact resistance and is easy to crack. If the thickness is too small, the formed texture may be inconspicuous, and it is difficult to control the preparation process. In one embodiment, the first texture layer 50 completely covers the optical film layer 20.
  • the first texture layer 50 may be formed on the optical film layer 20 by, but not limited to, UV transfer optical texture processing.
  • the first texture layer 50 is formed on the optical film layer 20 by a high-scratch-resistant UV transfer glue, a high-hardness UV transfer glue, a high-elastic UV transfer glue or a general-purpose UV transfer glue.
  • the material of the UV transfer adhesive includes polyurethane acrylic resin and the like.
  • the UV transfer glue is coated and cured to form the first texture layer 50.
  • curing comprises curing the LED or a mercury lamp, wherein, LED curing energy 800mJ / cm 2 -2500mJ / cm 2 , a mercury lamp curing energy 550mJ / cm 2 -1500mJ / cm 2 .
  • the texture of the first texture layer 50 can be, but is not limited to, a nano-level illusion fine texture, which improves the visual effect of the housing assembly 100.
  • the housing assembly 100 when the housing assembly 100 includes the first texture layer 50 and the second texture layer 43, the textures of the first texture layer 50 and the second texture layer 43 are different, so that the area corresponding to the hollow part presents the first texture layer With the superimposed texture effect of 50 and the second texture layer 43, other regions present the texture effect of the first texture layer 50, so that the shell assembly 100 exhibits two texture effects, and improves the appearance expressiveness of the shell assembly 100.
  • the optical film layer 20 is disposed on the surface of the transparent substrate 10, and the first color layer 30 and the modification layer 40 are disposed on the surface of the optical film layer 20 away from the transparent substrate 10.
  • the position corresponding to the hollow part presents the visual effect of the optical film layer 20, the second color layer 41, and the coating layer 42.
  • the other positions present the optical film layer 20 and the first color layer.
  • the superimposed visual effects of 30 make it possible for the housing assembly 100 to present the appearance of different colors and textures. Please refer to FIG.
  • FIG. 3 which is a schematic structural diagram of a housing assembly according to another embodiment of the application, in which the modification layer 40 is disposed on the surface of the transparent substrate 10, and the optical film layer 20 and the first color layer 30 are disposed far away from the modification layer 40.
  • the position corresponding to the hollow part presents the visual effect of the optical film layer 20, the second color layer 41, and the coating layer 42.
  • the other positions present the optical film layer 20 and the first color layer.
  • the superimposed visual effects of 30 make it possible for the housing assembly 100 to present the appearance of different colors and textures. Both of these two setting methods can achieve appearance effects of different colors and textures in a certain direction of the housing assembly 100.
  • the second color layer 41 is closer to the optical film layer 20.
  • the optical transmittance of the second color layer 41 is greater than 30%, so that the coating layer 42 can be displayed.
  • the second color layer 41 and the first color layer 30 have different colors.
  • the transmittance of the second color layer 41 is greater than that of the first color layer 30, which distinguishes the two colors more clearly and forms a more obvious color contrast effect.
  • the second color layer 41 only covers the surface of the optical film layer 20 exposed by the hollow portion.
  • the surface of the second color layer 41 away from the optical film layer 20 may be flush with the surface of the first color layer 30 away from the optical film layer 20, saving the use of materials for the second color layer 41.
  • the second color layer 41 may partially cover the surface of the optical film layer 20 exposed by the hollow portion and partially cover the first color layer 30.
  • the first color layer 30 and the second color layer 41 There is no obvious boundary, no dislocation phenomenon, good appearance effect, and easier operation and realization in the preparation process.
  • the modification layer 40 further includes the second texture layer 43, referring to FIG. 2, the second texture layer 43 is disposed between the second color layer 41 and the coating layer 42.
  • the optical transmittance of the second texture layer 43 is greater than 30%, so that the appearance effect of the coating layer 42 can be presented.
  • FIG. 4 is a schematic structural diagram of a housing assembly according to another embodiment of the application, which is substantially the same as the housing assembly provided in FIG. 1, except that, compared with the second color layer 41, the coating layer 42 is more Close to the optical film layer 20, at this time, the optical transmittance of the coating layer 42 is greater than 30%, so that the appearance effect of the second color layer 41 can be presented.
  • the coating layer 42 only covers the surface of the optical film layer 20 exposed by the hollow portion.
  • the surface of the coating layer 42 away from the optical film layer 20 may be flush with the surface of the first color layer 30 away from the optical film layer 20, saving the use of the material of the coating layer 42.
  • the coating layer 42 may partially cover the surface of the optical film layer 20 exposed in the hollow portion, and partially cover the first color layer 30. At this time, there will be no obvious difference between the first color layer 30 and the coating layer 42. It will not produce dislocation phenomenon, the appearance effect is good, and it is easier to operate and realize in the preparation process.
  • the modification layer 40 further includes the second texture layer 43, please refer to FIG. 5, which is a schematic structural diagram of a housing assembly according to another embodiment of the application, which is substantially the same as the housing assembly provided in FIG. 2, except that: Compared with the second color layer 41, the coating layer 42 is closer to the optical film layer 20.
  • the optical transmittance of the coating layer 42 is greater than 30%, so that the appearance effect of the second color layer 41 can be presented.
  • the second texture layer 43 is disposed between the optical film layer 20 and the coating layer 42.
  • the optical transmittance of the second texture layer 43 is greater than 30%, so that the appearance effect of the coating layer 42 can be presented.
  • the second texture layer 43 only covers the surface of the optical film layer 20 exposed by the hollow portion.
  • the surface of the second texture layer 43 away from the optical film layer 20 may be flush with the surface of the first color layer 30 away from the optical film layer 20, saving the use of the material of the second texture layer 43.
  • the second texture layer 43 may partially cover the surface of the optical film layer 20 exposed by the hollow portion, and partially cover the first color layer 30. At this time, the first color layer 30 and the second texture layer 43 may be separated from each other. There is no obvious boundary, no dislocation phenomenon, good appearance effect, and easier operation and realization in the preparation process.
  • FIG. 6, is a schematic structural diagram of a housing assembly according to another embodiment of the application, which is substantially the same as the housing assembly provided in FIG. Between the transparent substrate 10 and the optical film layer 20 to connect the transparent substrate 10 and the optical film layer 20.
  • FIG. 7, is a schematic structural diagram of a housing assembly according to another embodiment of the application, which is substantially the same as the housing assembly provided in FIG. Between the transparent substrate 10 and the modified layer 40 to connect the transparent substrate 10 and the modified layer 40.
  • the optical transmittance of the connecting layer 60 is greater than 30%. Further, the optical transmittance of the connecting layer 60 is greater than 50%, 70%, 80% or 90%.
  • the thickness of the connection layer 60 may be 5 ⁇ m-15 ⁇ m, specifically but not limited to 6 ⁇ m, 7 ⁇ m, 8 ⁇ m, 9 ⁇ m, 10 ⁇ m, 12 ⁇ m, 15 ⁇ m, etc.
  • the material of the connection layer 60 can be, but is not limited to, a UV curable glue.
  • the UV curable adhesive is spray coated, and the connection layer 60 is formed after curing.
  • the curing energy may be 400 mJ/cm 2 -1200 mJ/cm 2 .
  • connection layer 60 includes at least one of urethane acrylate, silicone resin, and perfluoropolyether acrylate, so that the surface hardness of the connection layer 60 is improved.
  • surface hardness of the connecting layer 60 is 1H-6H, which can further protect the film structure in the housing assembly 100 to a certain extent.
  • FIG. 8 is a schematic structural diagram of a housing assembly according to another embodiment of the application, which is substantially the same as the housing assembly provided in FIG. 1, except that it further includes a protective layer 70, which is disposed on the transparent liner. The bottom 10 is away from the surface of the optical film layer 20.
  • FIG. 9 which is a schematic structural diagram of a housing assembly according to another embodiment of the application, which is substantially the same as the housing assembly provided in FIG. 3, except that it also includes a protective layer 70, which is disposed on the optical film The layer 20 is far away from the surface of the transparent substrate 10.
  • the above are two ways of setting the protective layer 70, and the protective layer 70 is used to protect each film layer of the housing assembly 100.
  • the optical transmittance of the protective layer 70 is greater than 30%. Further, the optical transmittance of the protective layer 70 is greater than 50%, 70%, 80% or 90%.
  • the thickness of the protective layer 70 may be 3 ⁇ m-20 ⁇ m, specifically, but not limited to 4 ⁇ m, 6 ⁇ m, 8 ⁇ m, 11 ⁇ m, 15 ⁇ m, 16 ⁇ m, 18 ⁇ m, etc.
  • the protective layer 70 includes at least one of a hardened layer and an anti-fingerprint layer.
  • the material of the hardened layer can be, but is not limited to, ultraviolet curing glue.
  • the UV curable adhesive is spray coated and cured to form a hardened layer.
  • the curing energy may be 400 mJ/cm 2 -1200 mJ/cm 2 .
  • the material of the hardening layer includes at least one of urethane acrylate, silicone resin, and perfluoropolyether acrylate.
  • the surface hardness of the hardened layer is 3H-6H, which can further protect the film structure in the housing assembly 100 to a certain extent.
  • the anti-fingerprint layer has the functions of anti-fouling and anti-fingerprint adhesion.
  • the material of the anti-fingerprint layer includes a fluorine-containing anti-fingerprint agent.
  • the material of the anti-fingerprint layer can be, but is not limited to, perfluoropolyethers, polytetrafluoroethylene, fluoroalkyl ether-siloxane, magnesium aluminum oxide fluoride, and the like.
  • the contact angle of the surface of the anti-fingerprint layer can be, but is not limited to, greater than 105°, which is beneficial to improve the ability of preventing fingerprints and contaminants from adhering to the surface.
  • FIG. 10 is a schematic structural diagram of a housing assembly according to another embodiment of the application, which is substantially the same as the housing assembly provided in FIG. 1, except that it also includes a light-shielding layer 80, which is disposed on the modification layer. 40 is far away from the surface of the transparent substrate 10.
  • FIG. 11 which is a schematic structural diagram of a housing assembly according to another embodiment of the present application. It is substantially the same as the housing assembly provided in FIG. 3, except that it also includes a light-shielding layer 80, which is disposed on the transparent lining. The bottom 10 is away from the surface of the optical film layer 20.
  • the above are two ways of disposing the light shielding layer 80.
  • the light shielding layer 80 plays a role of shielding, so that when the housing assembly 100 is used, for example, when used in an electronic device, the electronic components inside the electronic device are shielded.
  • the thickness of the light-shielding layer 80 is not particularly limited, as long as the requirements are met, those skilled in the art can flexibly choose according to needs.
  • the thickness of the light shielding layer 80 is 10 ⁇ m-30 ⁇ m.
  • the thickness of the light shielding layer 80 may be, but is not limited to, 10 ⁇ m, 12 ⁇ m, 18 ⁇ m, 22 ⁇ m, 28 ⁇ m, or 30 ⁇ m.
  • the optical transmittance of the light shielding layer 80 is less than 10%.
  • the color of the light-shielding layer 80 is not particularly limited, as long as the requirements are met, those skilled in the art can flexibly choose according to needs, for example, it may include but not limited to red, orange, gray, black, white, and the like. Thus, any different colors can be selected to meet the needs of different users. Specifically, multiple coatings can be used to prevent light leakage and improve the shielding effect.
  • the light shielding layer 80 is an ink layer, which may include but is not limited to being formed by screen printing or inkjet printing. For example, by screen printing the ink to form the light-shielding layer 80, this method can be applied to various types of inks.
  • the ink layer has strong covering power and is not limited by the surface shape and area size of the substrate. It has great flexibility and Broad applicability.
  • the present application also provides a method for preparing the housing assembly.
  • the method for preparing the housing assembly 100 of any of the above embodiments includes:
  • a transparent substrate 10 is provided, and an optical film layer 20, a first color layer 30 and a modification layer 40 are formed on the transparent substrate 10.
  • the first color layer 30 is provided on the surface of the optical film layer 20, and the first color layer 30 has Hollowed part; the modification layer 40 is partly arranged on the surface of the first color layer 30 away from the optical film layer 20, and partly arranged on the surface of the optical film layer 20 exposed in the hollow part.
  • the modification layer 40 includes a second color layer 41 and arranged on the second color layer 41.
  • the coating layer 42 on the surface of the color layer 41, the second color layer 41 is close to the optical film layer 20 and has an optical transmittance greater than 30%, or the coating layer 42 is close to the optical film layer 20 and has an optical transmittance If it is greater than 30%, the optical transmittance of the first color layer 30 is less than 10%, and the colors of the second color layer 41 and the first color layer 30 are different.
  • FIG. 12 is a schematic flowchart of a method for manufacturing a housing assembly according to an embodiment of the application, including the following steps:
  • Operation 101 forming an optical film layer on the surface of the transparent substrate.
  • the transparent substrate 10 has a certain light transmittance, and its shape, size, material, etc. are not limited, and the selection is made according to actual needs.
  • the transparent substrate 10 can be, but is not limited to, a back shell and/or a middle frame of an electronic device.
  • the transparent substrate 10 can be used directly as a casing of an electronic device, or it can be used as a casing after a functional film layer is formed on the transparent substrate 10.
  • the housing assembly 100 of a desired shape can be formed by a high pressure molding process.
  • 3D hot bending forming can be performed in a high-pressure forming machine to obtain a 3D shell assembly 100 with a desired curvature.
  • a desired curvature can be, but not limited to, 130°C-240°C, molding pressure 15Bar-100Bar, and hot pressing for 0.3min-2min.
  • the required housing assembly 100 is in a shape with a certain curvature, such as 2.5D, 3D, etc., you can choose to form each film layer on the transparent substrate 10 and then perform hot press molding.
  • the distribution of the various film layers on the housing assembly 100 can be made uniform, and the visual effect is excellent; when the required housing assembly 100 is in the shape of a flat plate, the transparent substrate 10 of the required shape can be directly provided, and then each film layer For the preparation of, it is also possible to form each film layer on the transparent substrate 10, and then perform hot press forming.
  • the method of forming the optical film layer 20 is not particularly limited. For example, it may be formed by a physical vapor deposition method or a vacuum coating method. In one embodiment, the optical film layer 20 is formed by a vacuum non-conductive electroplating process. In the present application, the material of the optical film layer 20 includes at least one of TiO 2 , NbO 2 , Nb 2 O 3 , Nb 2 O 2 , Nb 2 O 5 , SiO 2 and ZrO 2 or other non-conductive oxides. Optionally, the thickness of the optical film layer 20 is 80 nm-500 nm. In an embodiment, operation 101 further includes silk-printing a pattern on the surface of the transparent substrate 10. Specifically, the visual effect of the housing assembly 100 can be improved by, but not limited to, silk-screened logos, texts, and the like.
  • Operation 102 forming a first color layer on the surface of the optical film layer away from the transparent substrate, the first color layer has a hollow portion, and the optical transmittance of the first color layer is less than 10%.
  • the first color layer 30 can be formed by at least one of offset printing, silk screen printing, printing and thermal transfer.
  • the position of the material of the first color layer 30 can be controlled by silk screen printing to directly form the first color layer 30 with a hollow part.
  • Color layer 30 it is also possible to coat a whole layer of the first color layer 30 material on the surface of the optical film layer 20, and form a hollow part by etching after curing; it is also possible to pre-set a mask on the optical film layer 20, Direct silk-printing forms the first color layer 30 with a hollow part.
  • the formation of the hollow part can be controlled by controlling the film, so as to form the first color layer 30 with the hollow part on the optical film layer 20.
  • the silk-screened film pattern is controlled, the optical film layer 20 is coated with a 4 ⁇ m-8 ⁇ m thick color ink, and the first color with a hollow part is formed after baking at 60° C.-90° C. for 30 min-60 min. Layer 30. Further, after baking at 65° C.-90° C. for 30 min-50 min, the first color layer 30 with the hollow part is formed.
  • Operation 103 molding a modified layer on the surface of the first color layer away from the optical film layer, the modified layer is partially disposed on the surface of the first color layer away from the optical film layer, and partially disposed on the hollow Part of the exposed surface of the optical film layer, the modification layer includes a second color layer and a coating layer disposed on the surface of the second color layer, the second color layer 41 is close to the optical film layer 20 and is optically The transmittance is greater than 30%, or the coating layer 42 is close to the optical film layer 20 and the optical transmittance is greater than 30%, the second color layer and the first color layer have different colors.
  • the modification layer 40 includes a second color layer 41 and a plating layer 42.
  • the second color layer 41 may be formed by at least one process of offset printing, silk screen printing, printing, and thermal transfer.
  • the second color layer 41 is formed by silk-screening a color ink with a thickness of 4 ⁇ m-8 ⁇ m and baking at 60° C.-90° C. for 30 min-60 min. Further, the second color layer 41 is formed after baking at 70° C.-85° C. for 35 min-55 min.
  • the material of the coating layer 42 includes In, Sn, TiO 2 , NbO 2 , Nb 2 O 3 , Nb 2 O 2 , Nb 2 O 5 , SiO 2 and ZrO 2 or other non-conductive oxides. At least one. Further, the material of the coating layer 42 is In-Sn, which produces a metallic texture effect with high reflectivity.
  • the method of forming the coating layer 42 is not particularly limited. For example, it can be formed by a physical vapor deposition method or a vacuum coating method.
  • the coating equipment can be a magnetron sputtering furnace or an electron gun evaporation coating. In one embodiment, the coating layer 42 is formed by a vacuum non-conductive electroplating process.
  • the first color layer 30 with the hollow part is prepared, so that the subsequent preparation of the second color layer 41 can be made without overprinting, which avoids the obvious color boundary line caused by overprinting. , Or occurrence of misalignment and other problems, to avoid the appearance of inconsistent visual effects, so that the color overlap in the color collision area is natural, seamless overlap is realized, and the appearance expressiveness is improved.
  • FIG. 13 is a schematic flowchart of a manufacturing method of the housing assembly 100 according to another embodiment of the application, including the following steps:
  • Operation 201 forming a modified layer on the surface of the transparent substrate, the modified layer including a second color layer and a coating layer provided on the surface of the second color layer.
  • a modification layer 40 is formed on the transparent substrate 10, and the modification layer 40 includes a second color layer 41 and a coating layer 42.
  • the second color layer 41 may be formed by at least one process of offset printing, silk screen printing, printing, and thermal transfer.
  • the coating layer 42 can be formed by a physical vapor deposition method or a vacuum coating method.
  • the surface of the modified layer 40 away from the transparent substrate 10 has a convex structure, that is, the surface of the modified layer 40 away from the transparent substrate 10 is uneven.
  • the molding process can be controlled, such as offset printing, silk screen printing, printing, and thermal transfer. , Deposition, evaporation, etc., directly produce a plane with raised structures.
  • the surface of the modified layer 40 away from the transparent substrate 10 may be etched to form the raised structure.
  • Operation 202 forming a first color layer on the surface of the modification layer away from the transparent substrate, the first color layer has a hollow part, the modification layer partially fills the hollow part, the first color layer and The colors of the second color layer are different, and the optical transmittance of the first color layer is less than 10%.
  • the formed first color layer 30 has a hollow portion.
  • the surface of the modified layer 40 away from the transparent substrate 10 has a convex structure.
  • the first color layer 30 is formed on the surface of the modified layer 40 away from the transparent substrate 10, and the formed first color layer The surface of 30 is flush with the surface of the raised structure.
  • the first color layer 30 can be formed by at least one of offset printing, silk screen printing, printing, and thermal transfer.
  • Operation 203 forming an optical film layer on the surface of the first color layer and the modified layer exposed by the hollow portion, the second color layer 41 is close to the optical film layer 20 and the optical transmittance is greater than 30% , Or the coating layer 42 is close to the optical film layer 20 and the optical transmittance is greater than 30%.
  • the method of forming the optical film layer 20 is not particularly limited. For example, it may be formed by a physical vapor deposition method, or may be formed by a vacuum coating method. In one embodiment, the optical film layer 20 is formed by a vacuum non-conductive electroplating (NVCM) process.
  • NVCM vacuum non-conductive electroplating
  • the preparation method of the modified layer 40 includes forming a second color layer 41 on the surface of the optical film layer 20 exposed at the hollow portion, and the optical transmittance of the second color layer 41 is greater than 30%;
  • a coating layer 42 is formed on the surface of the color layer 41, and the orthographic projection of the coating layer 42 on the optical film layer 20 completely covers the orthographic projection of the hollow area on the optical film layer 20.
  • the preparation method of the modified layer 40 includes forming a coating layer 42 on the surface of the optical film layer 20 exposed at the hollow portion, and the optical transmittance of the coating layer 42 is greater than 30%; on the surface of the coating layer 42 The second color layer 41 is formed, and the orthographic projection of the second color layer 41 on the optical film layer 20 completely covers the orthographic projection of the hollow area on the optical film layer 20.
  • the preparation method of the modification layer 40 further includes forming a second texture layer 43 on the surface of the coating layer 42 close to the optical film layer 20.
  • the second texture layer 43 can be formed on the coating layer 42 through UV transfer optical texture processing, but is not limited to.
  • the second texture layer 43 is formed on the coating layer 42 by a high-scratch-resistant UV transfer glue, a high-hardness UV transfer glue, a high-elastic UV transfer glue or a general-purpose UV transfer glue.
  • the material of the UV transfer adhesive includes polyurethane acrylic resin and the like.
  • the UV transfer glue is coated and cured to form the second texture layer 43.
  • curing comprises curing the LED or a mercury lamp, wherein, LED curing energy 800mJ / cm 2 -2500mJ / cm 2 , a mercury lamp curing energy 550mJ / cm 2 -1500mJ / cm 2 . Further, LED curing energy 1000mJ / cm 2 -2000mJ / cm 2 , a mercury lamp curing energy 600mJ / cm 2 -1200mJ / cm 2 .
  • the manufacturing method of the housing assembly 100 further includes forming the first texture layer 50 on the surface of the optical film layer 20 away from the modification layer 40.
  • the first texture layer 50 can be formed but not limited to UV transfer optical texture processing.
  • the first texture layer 50 is formed on the optical film layer 20 by a high-scratch-resistant UV transfer glue, a high-hardness UV transfer glue, a high-elastic UV transfer glue or a general-purpose UV transfer glue.
  • the material of the UV transfer adhesive includes polyurethane acrylic resin and the like.
  • the UV transfer glue is coated and cured to form the first texture layer 50.
  • curing comprises curing the LED or a mercury lamp, wherein, LED curing energy 800mJ / cm 2 -2500mJ / cm 2 , a mercury lamp curing energy 550mJ / cm 2 -1500mJ / cm 2 . Further, LED curing energy 900mJ / cm 2 -2200mJ / cm 2 , a mercury lamp curing energy 600mJ / cm 2 -1000mJ / cm 2 .
  • the texture of the first texture layer 50 can be, but is not limited to, a nano-level illusion fine texture, which improves the visual effect of the housing assembly 100.
  • the effects of the two texture layers can be well formed on the housing assembly 100, avoiding overprinting.
  • the resulting problems such as obvious boundaries and poor bonding wires can improve the visual effect of the housing assembly 100.
  • the method for preparing the housing assembly 100 further includes forming a connecting layer between the optical film layer 20 and the transparent substrate 10 60.
  • the connection layer 60 is used to connect the transparent substrate 10 and the optical film layer 20.
  • the material of the connection layer 60 can be, but is not limited to, a UV curable glue.
  • the UV curable adhesive is spray coated, and the connection layer 60 is formed after curing.
  • the curing energy may be 400 mJ/cm 2 -1200 mJ/cm 2 .
  • the manufacturing method of the housing assembly 100 further includes forming a protective layer 70 on the surface of the transparent substrate 10 away from the optical film layer 20.
  • the protective layer 70 includes a hardened layer and an anti-fingerprint layer.
  • the UV curable adhesive is spray coated and cured to form a hardened layer.
  • the curing energy may be 400 mJ/cm 2 -1200 mJ/cm 2 .
  • the surface hardness of the hardened layer is 3H-6H, which can further protect the film structure in the housing assembly 100 to a certain extent.
  • the anti-fingerprint layer has the functions of anti-fouling and anti-fingerprint adhesion.
  • the contact angle of the surface of the anti-fingerprint layer can be, but is not limited to, greater than 105°, which is beneficial to improve the ability of preventing fingerprints and contaminants from adhering to the surface.
  • the manufacturing method of the housing assembly 100 further includes forming a light-shielding layer 80 on the surface of the modification layer 40 away from the transparent substrate 10. It may include but is not limited to being formed by screen printing or inkjet printing. Specifically, multiple coatings can be used to prevent light leakage and improve the shielding effect.
  • the method for preparing the housing assembly 100 further includes forming a connecting layer 60 between the modification layer 40 and the transparent substrate 10 .
  • the manufacturing method of the housing assembly 100 further includes forming a protective layer 70 on the surface of the optical film layer 20 away from the transparent substrate 10.
  • the protective layer 70 includes a hardened layer and an anti-fingerprint layer.
  • the manufacturing method of the housing assembly 100 further includes forming a light-shielding layer 80 on the surface of the transparent substrate 10 away from the modification layer 40.
  • the selection and preparation method of the connection layer 60, the protection layer 70 and the light shielding layer 80 can be selected in the above related description, and there is no limitation on this.
  • the method for preparing the housing assembly 100 further includes performing computer digital control precision machining (CNC processing) on the housing assembly 100.
  • CNC machining can mill off the excess leftover material to obtain the final housing assembly 100 with a matching size to be assembled.
  • the present application also provides an electronic device, including the housing assembly 100 of any of the above embodiments. It is understandable that electronic devices can be, but are not limited to, mobile phones, tablet computers, notebook computers, watches, MP3, MP4, GPS navigators, digital cameras, and the like. Let's take a mobile phone as an example for description.
  • FIG. 14 is a schematic structural diagram of an electronic device according to another embodiment of the application.
  • the electronic device includes a display screen 200, and a cover 300 and a housing assembly 100 disposed on opposite sides of the display screen 200.
  • the housing assembly 100 includes a transparent substrate 10 and an optical film layer 20, a first color layer 30, and a modification layer 40 disposed on the transparent substrate 10; the first color layer 30 is disposed on the surface of the optical film layer 20, and the first color layer 30 has Hollowed part; the modification layer 40 is partly arranged on the surface of the first color layer 30 away from the optical film layer 20, and partly arranged on the surface of the optical film layer 20 exposed in the hollow part.
  • the modification layer 40 includes a second color layer 41 and arranged on the second color layer 41.
  • the coating layer 42 on the surface of the color layer 41, the second color layer 41 is close to the optical film layer 20 and has an optical transmittance greater than 30%, or the coating layer 42 is close to the optical film layer 20 and has an optical transmittance Greater than 30%, the optical transmittance of the first color layer 30 is less than 10%, the second color layer 41 and the first color layer 30 have different colors, the housing assembly 100 has opposite inner and outer surfaces, and the optical film layer The direction from 20 to the modification layer 40 is consistent with the direction from the outer surface to the inner surface. It can be understood that the housing assembly 100 has an inner surface and an outer surface that are opposed to each other, wherein the inner surface and the outer surface are based on the use state of the housing assembly 100.
  • the housing assembly 100 is applied to an electronic device, and the side facing the inside of the electronic device is the inner surface, and the side facing the outside of the electronic device is the outer surface.
  • the visual effect of the superposition of the optical film layer 20, the second color layer 41 and the coating layer 42 is presented, and the superposition of the optical film layer 20 and the first color layer 30 is presented in other positions.
  • the color collision area is seamlessly overlapped, and the appearance effect is excellent, so that the electronic device presents the appearance of different colors and textures, forming an obvious color collision effect, and enriching the appearance of the electronic device.

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  • Laminated Bodies (AREA)

Abstract

The present application provides a casing body assembly, comprising a transparent substrate and an optical film layer, a first color layer, and a decoration layer all arranged on the transparent substrate; the first color layer is arranged on the surface of the optical film layer, and said first color layer has a hollow portion; the decoration layer is partially arranged on the surface of the first color layer that is away from the optical film layer, and partially arranged on the surface of the optical film layer exposed at the hollow portion; the decoration layer comprises a second color layer and a coating layer arranged on the surface of the second color layer; the layer among the second color layer and the coating layer that is closest to the optical film layer has an optical transmittance greater than 30%, the first color layer has an optical transmittance less than 10%, and the first color layer and the second color layer are different colors. The casing body assembly achieves the effect of different texture color contrast, and improves the visual effect and aesthetic expressiveness of the casing body. The present application further provides a casing body assembly preparation method and an electronic device comprising said casing body assembly.

Description

壳体组件、壳体组件的制备方法及电子设备Shell assembly, preparation method of shell assembly and electronic equipment 技术领域Technical field
本申请属于电子产品技术领域,具体涉及壳体组件、壳体组件的制备方法及电子设备。This application belongs to the technical field of electronic products, and specifically relates to a housing assembly, a method for manufacturing the housing assembly, and electronic equipment.
背景技术Background technique
随着电子设备的不断发展,用户对壳体外观效果的要求也越来越高,单一色调的外观已经无法满足用户需求。因此,越来越多的壳体的外观效果朝向多样化发展。With the continuous development of electronic devices, users have higher and higher requirements for the appearance of the casing, and the appearance of a single color can no longer meet the needs of users. Therefore, the appearance effects of more and more housings are diversified.
发明内容Summary of the invention
鉴于此,本申请提供了一种实现不同质感的撞色效果的壳体组件、壳体组件的制备方法和电子设备。In view of this, the present application provides a housing assembly, a manufacturing method of the housing assembly, and an electronic device that achieve color contrast effects with different textures.
第一方面,本申请提供了一种壳体组件,包括透明衬底和设置在所述透明衬底上的光学膜层、第一颜色层和修饰层;In a first aspect, the present application provides a housing assembly including a transparent substrate and an optical film layer, a first color layer and a modification layer provided on the transparent substrate;
所述第一颜色层设置在所述光学膜层的表面,所述第一颜色层具有镂空部;The first color layer is arranged on the surface of the optical film layer, and the first color layer has a hollow part;
所述修饰层部分设置在所述第一颜色层远离所述光学膜层的表面,部分设置在所述镂空部露出的所述光学膜层的表面,所述修饰层包括第二颜色层和设置在所述第二颜色层表面的镀膜层,所述第二颜色层靠近所述光学膜层且光学透过率大于30%,或者所述镀膜层靠近所述光学膜层且光学透过率大于30%,所述第一颜色层的光学透过率小于10%,所述第一颜色层和所述第二颜色层的颜色不同。The modification layer is partly arranged on the surface of the first color layer away from the optical film layer, and partly arranged on the surface of the optical film layer exposed by the hollow part, and the modification layer includes a second color layer and The coating layer on the surface of the second color layer, the second color layer is close to the optical film layer and the optical transmittance is greater than 30%, or the coating layer is close to the optical film layer and the optical transmittance is greater than 30%, the optical transmittance of the first color layer is less than 10%, and the colors of the first color layer and the second color layer are different.
第二方面,本申请提供了一种壳体组件的制备方法,包括:In a second aspect, the present application provides a method for preparing a housing assembly, including:
提供透明衬底,在所述透明衬底上成型光学膜层、第一颜色层和修饰层,其中,所述第一颜色层设置在所述光学膜层的表面,所述第一颜色层具有镂空部;所述修饰层部分设置在所述第一颜色层远离所述光学膜层的表面,部分设置在所述镂空部露出的所述光学膜层的表面,所述修饰层包括第二颜色层和设置在所述第二颜色层表面的镀膜层,所述第二颜色层靠近所述光学膜层且光学透过率大于30%,或者所述镀膜层靠近所述光学膜层且光学透光率大于30%,所述第一颜色层的光学透过率小于10%,所述第二颜色层和所述第一颜色层的颜色不同。A transparent substrate is provided, and an optical film layer, a first color layer and a modified layer are formed on the transparent substrate, wherein the first color layer is disposed on the surface of the optical film layer, and the first color layer has Hollow part; the modification layer is partly arranged on the surface of the first color layer away from the optical film layer, and partly arranged on the surface of the optical film layer exposed by the hollow part, the modification layer includes a second color Layer and a coating layer disposed on the surface of the second color layer, the second color layer is close to the optical film layer and the optical transmittance is greater than 30%, or the coating layer is close to the optical film layer and is optically transparent The light rate is greater than 30%, the optical transmittance of the first color layer is less than 10%, and the colors of the second color layer and the first color layer are different.
第三方面,本申请提供了一种电子设备,包括显示屏,以及设置在所述显示屏相对两侧的盖板和壳体组件,所述壳体组件包括透明衬底和设置在所述透明衬底上的光学膜层、第一颜色层和修饰层;所述第一颜色层设置在所述光学膜层的表面,所述第一颜色层具有镂空部;所述修饰层部分设置在所述第一颜色层远离所述光学膜层的表面,部分设置在所述镂空部露出的所述光学膜层的表面,所述修饰层包括第二颜色层和设置在所述第二颜色层表面的镀膜层,所述第二颜色层靠近所述光学膜层且光学透过率大于30%,或者所述镀膜层靠近所述光学膜层且光学透过率大于30%,所述第一颜色层的光学透过率小于10%,所述第二颜色层和所述第一颜色层的颜色不同,所述壳体组件具有相对设置的内表面和外表面,所述光学膜层至所述修饰层的方向与所述外表面至所述内表面的方向一致。In a third aspect, the present application provides an electronic device, including a display screen, and a cover plate and a housing assembly arranged on opposite sides of the display screen. The housing assembly includes a transparent substrate and a housing assembly arranged on the transparent substrate. The optical film layer, the first color layer and the modification layer on the substrate; the first color layer is arranged on the surface of the optical film layer, the first color layer has a hollow part; the modification layer is partially arranged on the surface The first color layer is away from the surface of the optical film layer, and is partially disposed on the surface of the optical film layer exposed by the hollow portion, and the modification layer includes a second color layer and is disposed on the surface of the second color layer The second color layer is close to the optical film layer and the optical transmittance is greater than 30%, or the coating layer is close to the optical film layer and the optical transmittance is greater than 30%, the first color The optical transmittance of the layer is less than 10%, the colors of the second color layer and the first color layer are different, the housing assembly has an inner surface and an outer surface that are arranged oppositely, and the optical film layer reaches the The direction of the modified layer is consistent with the direction from the outer surface to the inner surface.
本申请提供了一种壳体组件和壳体组件的制备方法,通过设置具有镂空部的第一颜色层,以使得透明衬底的表面部分被光学膜层和第一颜色层覆盖,部分被光学膜层、第二颜色层和镀膜层覆盖,呈现了不同的颜色和光泽质感效果,实现不同质感的撞色效果,丰富壳体组件的视觉效果;本申请还提供了包括上述壳体组件的电子设备,以提高电子设备的外观表现力。The present application provides a housing assembly and a method for preparing the housing assembly. By providing a first color layer with a hollow part, the surface of the transparent substrate is partially covered by the optical film layer and the first color layer, and partly covered by the optical film layer and the first color layer. The film layer, the second color layer, and the coating layer are covered, presenting different colors and gloss texture effects, realizing the contrast effect of different textures, and enriching the visual effects of the shell assembly; this application also provides an electronic device including the above-mentioned shell assembly Equipment to improve the appearance and expressiveness of electronic equipment.
附图说明Description of the drawings
为了更清楚地说明本申请实施方式中的技术方案,下面将对本申请实施方式中所需要 使用的附图进行说明。In order to more clearly describe the technical solutions in the embodiments of the present application, the drawings that need to be used in the embodiments of the present application will be described below.
图1为本申请一实施例的壳体组件的结构示意图。FIG. 1 is a schematic structural diagram of a housing assembly according to an embodiment of the application.
图2为本申请另一实施例的壳体组件的结构示意图。FIG. 2 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
图3为本申请另一实施例的壳体组件的结构示意图。FIG. 3 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
图4为本申请另一实施例的壳体组件的结构示意图。FIG. 4 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
图5为本申请另一实施例的壳体组件的结构示意图。FIG. 5 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
图6为本申请另一实施例的壳体组件的结构示意图。FIG. 6 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
图7为本申请另一实施例的壳体组件的结构示意图。FIG. 7 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
图8为本申请另一实施例的壳体组件的结构示意图。FIG. 8 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
图9为本申请另一实施例的壳体组件的结构示意图。FIG. 9 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
图10为本申请另一实施例的壳体组件的结构示意图。FIG. 10 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
图11为本申请另一实施例的壳体组件的结构示意图。FIG. 11 is a schematic structural diagram of a housing assembly according to another embodiment of the application.
图12为本申请一实施例的壳体组件的制备方法的流程示意图。FIG. 12 is a schematic flowchart of a method for manufacturing a housing assembly according to an embodiment of the application.
图13为本申请另一实施例的壳体组件的制备方法的流程示意图。FIG. 13 is a schematic flow chart of a manufacturing method of a housing assembly according to another embodiment of the application.
图14为本申请一实施例的电子设备的结构示意图。FIG. 14 is a schematic structural diagram of an electronic device according to an embodiment of the application.
附图说明:Description of the drawings:
透明衬底-10,光学膜层-20,第一颜色层-30,修饰层-40,第二颜色层-41,镀膜层-42,第二纹理层-43,第一纹理层-50,连接层-60,保护层-70,遮光层-80,壳体组件-100,显示屏-200,盖板-300。Transparent substrate-10, optical film layer-20, first color layer-30, modification layer-40, second color layer-41, coating layer-42, second texture layer-43, first texture layer-50, Connection layer-60, protective layer-70, shading layer-80, housing assembly-100, display screen-200, cover plate-300.
具体实施方式Detailed ways
以下是本申请的优选实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本申请原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也视为本申请的保护范围。The following are the preferred embodiments of this application. It should be noted that for those of ordinary skill in the art, without departing from the principles of this application, several improvements and modifications can be made, and these improvements and modifications are also regarded as the original The scope of protection applied for.
下文的公开提供了许多不同的实施方式或例子用来实现本申请的不同结构。为了简化本申请的公开,下文中对特定例子的部件和设置进行描述。当然,它们仅仅为示例,并且目的不在于限制本申请。此外,本申请可以在不同例子中重复参考数字和/或参考字母,这种重复是为了简化和清楚的目的,其本身不指示所讨论各种实施方式和/或设置之间的关系。此外,本申请提供了的各种特定的工艺和材料的例子,但是本领域普通技术人员可以意识到其他工艺的应用和/或其他材料的使用。The following disclosure provides many different embodiments or examples for realizing different structures of the present application. In order to simplify the disclosure of the present application, the components and settings of specific examples are described below. Of course, they are only examples, and are not intended to limit the application. In addition, the present application may repeat reference numerals and/or reference letters in different examples, and this repetition is for the purpose of simplification and clarity, and does not indicate the relationship between the various embodiments and/or settings discussed. In addition, this application provides examples of various specific processes and materials, but those of ordinary skill in the art may be aware of the application of other processes and/or the use of other materials.
请参考图1,图1为本申请一实施例的壳体组件100的结构示意图,壳体组件100包括透明衬底10和设置在透明衬底10上的光学膜层20、第一颜色层30和修饰层40;第一颜色层30设置在光学膜层20的表面,第一颜色层30具有镂空部;修饰层40部分设置在第一颜色层30远离光学膜层20的表面,部分设置在镂空部露出的光学膜层20的表面,修饰层40包括第二颜色层41和设置在第二颜色层41表面的镀膜层42,所述第二颜色层41靠近所述光学膜层20且光学透过率大于30%,或者所述镀膜层42靠近所述光学膜层20且光学透过率大于30%,第一颜色层30的光学透过率小于10%,第一颜色层30和第二颜色层41的颜色不同。Please refer to FIG. 1, which is a schematic structural diagram of a housing assembly 100 according to an embodiment of the application. The housing assembly 100 includes a transparent substrate 10 and an optical film layer 20 and a first color layer 30 disposed on the transparent substrate 10. And modification layer 40; the first color layer 30 is arranged on the surface of the optical film layer 20, the first color layer 30 has a hollow part; the modification layer 40 is partially arranged on the surface of the first color layer 30 away from the optical film layer 20, and is partially arranged on The surface of the optical film layer 20 exposed by the hollow part. The modification layer 40 includes a second color layer 41 and a coating layer 42 disposed on the surface of the second color layer 41. The second color layer 41 is close to the optical film layer 20 and optically The transmittance is greater than 30%, or the coating layer 42 is close to the optical film layer 20 and the optical transmittance is greater than 30%, the optical transmittance of the first color layer 30 is less than 10%, and the first color layer 30 and the first color layer 30 The colors of the two color layers 41 are different.
通过设置光学膜层20和具有镂空部的第一颜色层30,使得透明衬底10上部分覆盖第一颜色层30,覆盖有第一颜色层30的区域具有光学膜层20和第一颜色层30叠加呈现的一种颜色和光泽质感的外观效果;同时,在镂空部对应区域设置了第二颜色层41和镀膜层42,镂空部对应区域具有光学膜层20、第二颜色层41和镀膜层42叠加呈现的另一种颜色和光泽质感的外观效果,使得壳体组件100具有不同的颜色区域,并且不同颜色区域的光泽质感也不同,实现了不同质感的撞色效果,丰富了壳体组件100的外观效果,提高了壳体组件100的外观表现力,并且相较于需要进行套印工艺进行设计的方案,本申请提供的壳体组件100中不同颜色层之间不会出现错位、界限明显、搭接线不良等瑕疵,具有 良好的外观效果。By arranging the optical film layer 20 and the first color layer 30 with the hollow part, the transparent substrate 10 is partially covered with the first color layer 30, and the area covered with the first color layer 30 has the optical film layer 20 and the first color layer 30 superimposed on the appearance effect of a color and gloss texture; at the same time, a second color layer 41 and a coating layer 42 are arranged in the corresponding area of the hollow part, and the corresponding area of the hollow part has an optical film layer 20, a second color layer 41 and a coating film. The appearance effect of another color and gloss texture superimposed on the layer 42 makes the housing assembly 100 have different color areas, and the gloss texture of the different color areas is also different, which realizes the contrast effect of different textures and enriches the housing The appearance effect of the assembly 100 improves the appearance and expressiveness of the housing assembly 100, and compared with the design scheme that requires an overprinting process, the housing assembly 100 provided in the present application will not have dislocations and boundaries between different color layers. Obvious, poor wiring and other defects, with a good appearance effect.
在本申请中,形成透明衬底10的材质不受特别限制,例如可以为任何已知的可以用于电子设备壳体的材料。可选的,透明衬底10的材质包括有机高分子化合物和无机非金属材料中的至少一种。进一步的,透明衬底10的材质包括聚碳酸酯(PC)、聚甲基丙烯酸甲酯(PMMA)、聚对苯二甲酸乙二醇酯(PET)、热塑性聚氨酯(TPU)、玻璃和陶瓷中的至少一种。在一实施例中,透明衬底10是由聚对苯二甲酸乙二醇酯层和聚甲基丙烯酸甲酯层层叠形成。在本申请中,透明衬底10具有一定的透光性。可选的,透明衬底10的光学透过率大于90%。其中,光学透过率为在380nm-780nm波段下光线的透过率。具体的,透明衬底10的厚度不受特别限制,例如透明衬底10的厚度为0.05mm-0.8mm,具体的可以但不限于为0.05mm、0.08mm、0.15mm、0.3mm、0.45mm、0.5mm、0.68mm、0.77mm、0.8mm等,以满足壳体组件100抗冲击力的要求,并且不至于过厚,符合轻薄化的需求。在一实施例中,透明衬底10是由聚碳酸酯层和聚甲基丙烯酸甲酯层层叠形成,聚碳酸酯层的厚度为0.59nm,聚甲基丙烯酸甲酯的厚度为0.05nm,透明衬底10的厚度为0.64mm。在本申请中,透明衬底10可以但不限于为电子设备的后壳和/或中框。例如,透明衬底10可以直接作为电子设备的壳体使用,也可以在透明衬底10上形成功能膜层后,再将其作为壳体使用。在本申请中,对透明衬底10具体形状和尺寸不作限定,可以根据实际需要进行选择和设计,例如透明衬底10的形状可以为2D形状、2.5D形状或3D形状。在一实施例中,可以在透明衬底10的表面丝印图案、文字等,具体的,可以丝印商标图案(Logo)等,提高壳体组件100的视觉效果;例如,丝印的厚度为1μm-4μm,在60℃-80℃烘烤45min-80min即可。In the present application, the material for forming the transparent substrate 10 is not particularly limited. For example, it may be any known material that can be used for the housing of an electronic device. Optionally, the material of the transparent substrate 10 includes at least one of an organic polymer compound and an inorganic non-metallic material. Further, the material of the transparent substrate 10 includes polycarbonate (PC), polymethyl methacrylate (PMMA), polyethylene terephthalate (PET), thermoplastic polyurethane (TPU), glass and ceramics. At least one of. In one embodiment, the transparent substrate 10 is formed by stacking a polyethylene terephthalate layer and a polymethyl methacrylate layer. In the present application, the transparent substrate 10 has certain light transmittance. Optionally, the optical transmittance of the transparent substrate 10 is greater than 90%. Among them, the optical transmittance is the transmittance of light in the 380nm-780nm band. Specifically, the thickness of the transparent substrate 10 is not particularly limited. For example, the thickness of the transparent substrate 10 is 0.05mm-0.8mm, and specifically can be but not limited to 0.05mm, 0.08mm, 0.15mm, 0.3mm, 0.45mm, 0.5mm, 0.68mm, 0.77mm, 0.8mm, etc., to meet the requirements of the impact resistance of the shell assembly 100, and not to be too thick, to meet the needs of light and thin. In one embodiment, the transparent substrate 10 is formed by laminating a polycarbonate layer and a polymethyl methacrylate layer, the thickness of the polycarbonate layer is 0.59 nm, the thickness of the polymethyl methacrylate is 0.05 nm, and the transparent substrate 10 is transparent. The thickness of the substrate 10 is 0.64 mm. In the present application, the transparent substrate 10 can be, but is not limited to, a back shell and/or a middle frame of an electronic device. For example, the transparent substrate 10 can be used directly as a casing of an electronic device, or it can be used as a casing after a functional film layer is formed on the transparent substrate 10. In this application, the specific shape and size of the transparent substrate 10 are not limited, and can be selected and designed according to actual needs. For example, the shape of the transparent substrate 10 can be a 2D shape, a 2.5D shape or a 3D shape. In an embodiment, patterns, characters, etc., can be silk-printed on the surface of the transparent substrate 10, specifically, logos, etc. can be silk-printed to improve the visual effect of the housing assembly 100; for example, the thickness of the silk-print is 1 μm-4 μm , Bake at 60℃-80℃ for 45min-80min.
可以理解的,所述光学膜层20设置在所述透明衬底10的表面,所述第一颜色30和所述修饰层40设置在所述光学膜层20远离所述透明衬底10的表面。光学膜层20是一种通过其界面传播光线的光学介质材料层,可以改变穿过光学膜层20的光线的反射、折射等,使得壳体组件100呈现一定的光泽变化,如在不同角度下呈现出不同颜色光泽、带来金属质感等视觉效果;通过改变光学膜层20的材质、厚度和层数等改变光学膜层20的反射率、折射率和透光率,实现不同的视觉效果,满足不同场景下的需求。在本申请中,光学膜层20的材质选自能够使光学膜层20具有一定光学效果的物质,具体的可以但不限于为使光学膜层20具有一定的折射率、透过率、反射率等。在本申请中,光学膜层20的光学透过率大于15%,以使得其他层结构的视觉效果可以呈现出来。可选的,光学膜层20的光学透过率大于50%。进一步的,光学膜层20的光学透过率大于80%。光学膜层20的材质可以为无机物,也可以为有机物。可选的,有机物包括聚醚、聚酯、氟代聚合物和含硅聚合物中的至少一种。当光学膜层20的材质为有机物时,光学膜层20柔性好,可弯曲性好,能够进行剪裁得到所需尺寸的光学膜层20。可选的,无机物包括金属单质、无机氧化物和无机氟化物中的至少一种。在一实施例中,光学膜层20的材质包括金属单质、无机氧化物和无机氟化物中的至少一种,例如光学膜层20的材质包括TiO 2、NbO 2、Nb 2O 3、Nb 2O 2、Nb 2O 5、SiO 2和ZrO 2或者其他不导电氧化物中的至少一种。例如,光学膜层20的材料可以选自TiO 2、NbO 2、Nb 2O 3、Nb 2O 2、Nb 2O 5、SiO 2和ZrO 2中至少两种的组合,以使得光学膜层20呈现蓝色或紫色等彩色光泽质感的效果。 It is understandable that the optical film layer 20 is disposed on the surface of the transparent substrate 10, and the first color 30 and the modification layer 40 are disposed on the surface of the optical film layer 20 away from the transparent substrate 10. . The optical film layer 20 is an optical medium material layer that transmits light through its interface, and can change the reflection, refraction, etc. of the light passing through the optical film layer 20, so that the housing assembly 100 exhibits a certain gloss change, such as under different angles. It presents different color gloss and brings metallic texture and other visual effects; by changing the material, thickness and number of layers of the optical film 20, the reflectance, refractive index and light transmittance of the optical film 20 are changed to achieve different visual effects. Meet the needs of different scenarios. In the present application, the material of the optical film layer 20 is selected from substances that can make the optical film layer 20 have a certain optical effect. Specifically, but not limited to, the optical film layer 20 has a certain refractive index, transmittance, and reflectivity. Wait. In the present application, the optical transmittance of the optical film layer 20 is greater than 15%, so that the visual effects of other layer structures can be presented. Optionally, the optical transmittance of the optical film layer 20 is greater than 50%. Further, the optical transmittance of the optical film layer 20 is greater than 80%. The material of the optical film layer 20 may be inorganic or organic. Optionally, the organic substance includes at least one of polyether, polyester, fluoropolymer, and silicon-containing polymer. When the material of the optical film layer 20 is organic, the optical film layer 20 has good flexibility and flexibility, and can be cut to obtain the optical film layer 20 of a desired size. Optionally, the inorganic substance includes at least one of elemental metal, inorganic oxide, and inorganic fluoride. In one embodiment, the material of the optical film layer 20 includes at least one of simple metals, inorganic oxides, and inorganic fluorides. For example, the material of the optical film layer 20 includes TiO 2 , NbO 2 , Nb 2 O 3 , and Nb 2 At least one of O 2 , Nb 2 O 5 , SiO 2 and ZrO 2 or other non-conductive oxides. For example, the material of the optical film layer 20 may be selected from a combination of at least two of TiO 2 , NbO 2 , Nb 2 O 3 , Nb 2 O 2 , Nb 2 O 5 , SiO 2 and ZrO 2 so that the optical film layer 20 It presents the effect of colorful gloss texture such as blue or purple.
在本申请中,光学膜层20可以为单层膜结构,也可以为多层膜结构。当光学膜层20为多层膜结构时,可以通过控制每一层的材质和厚度,以及各层之间的配合,以达到所需的功能。可选的,光学膜层20由至少两种具有不同折射率的光学薄膜交替层叠形成。也就是说,光学膜层20由多个光学薄膜组成时,相邻的光学薄膜的折射率不同。进一步的,光学膜层20由至少两种具有不同折射率的薄膜周期性地交替层叠形成。多个光学薄膜的材质、厚度可以相同,可以不同。多个光学薄膜的光学性质不同,光线通过多个光学薄膜后,每个光线薄膜表面均会发生反射和折射,产生更加丰富的外观效果。具体的,光学膜 层20可以但不限于包括2层、3层、4层、5层、6层、7层或8层光学薄膜。在一实施例中,光学膜层20由三层二氧化硅光学薄膜和三层二氧化钛光学薄膜交替层叠形成。可选的,光学膜层20的厚度为80-500nm,具体的可以但不限于为80nm、100nm、180nm、250nm、300nm、470nm、500nm等,过薄会导致光学膜层20呈现的光泽质感效果太弱,过厚会导致的膜层内的应力过大,容易脱落,该厚度范围有利于呈现光学膜层20的视觉效果,同时保证光学膜层20的使用寿命。本申请中的光学膜层20为整层结构,制备过程中无需遮蔽或刻蚀,更易制备性能优异的光学膜层20。在本申请中,光学膜层20的形成方法不受特别限制,例如可以通过物理气相沉积法形成,也可以通过真空镀膜法形成。在一实施例中,光学膜层20通过真空不导电电镀(NVCM)工艺形成。当壳体组件100具有光学膜层20时,壳体组件100可以在不同角度下反射出一定的光泽质感,提高壳体组件100的外观表现力。In the present application, the optical film layer 20 may have a single-layer film structure or a multilayer film structure. When the optical film layer 20 has a multilayer film structure, the material and thickness of each layer and the coordination between the layers can be controlled to achieve the desired function. Optionally, the optical film layer 20 is formed by alternately laminating at least two optical films with different refractive indexes. In other words, when the optical film layer 20 is composed of a plurality of optical films, the refractive indexes of adjacent optical films are different. Further, the optical film layer 20 is formed by periodically alternately laminating at least two kinds of films with different refractive indexes. The material and thickness of the multiple optical films can be the same or different. The optical properties of multiple optical films are different. After light passes through the multiple optical films, the surface of each light film will be reflected and refracted, resulting in a richer appearance effect. Specifically, the optical film layer 20 may include, but is not limited to, two, three, four, five, six, seven, or eight optical films. In one embodiment, the optical film layer 20 is formed by alternately laminating three layers of silicon dioxide optical films and three layers of titanium dioxide optical films. Optionally, the thickness of the optical film layer 20 is 80-500nm, specifically but not limited to 80nm, 100nm, 180nm, 250nm, 300nm, 470nm, 500nm, etc., too thin will cause the optical film layer 20 to present a glossy texture effect Too weak or too thick will cause excessive stress in the film layer and easy to fall off. This thickness range is conducive to presenting the visual effect of the optical film layer 20 and at the same time guarantees the service life of the optical film layer 20. The optical film layer 20 in the present application has a whole-layer structure, and there is no need to shield or etch during the preparation process, and it is easier to prepare the optical film layer 20 with excellent performance. In the present application, the method of forming the optical film layer 20 is not particularly limited. For example, it may be formed by a physical vapor deposition method or a vacuum coating method. In one embodiment, the optical film layer 20 is formed by a vacuum non-conductive electroplating (NVCM) process. When the housing assembly 100 has the optical film layer 20, the housing assembly 100 can reflect a certain gloss texture at different angles, which improves the appearance and expressiveness of the housing assembly 100.
在本申请中,第一颜色层30设置在光学膜层20的表面,第一颜色层30用于对壳体组件100进行着色,使壳体组件100具有丰富的外观效果。具体的,第一颜色层30的厚度不受特别限制,例如第一颜色层30的厚度可以为3μm-10μm,具体的可以为4μm、5μm、6.5μm、7.2μm、8μm或9μm等。第一颜色层30的厚度在上述范围时,可以使壳体组件100具有良好的颜色效果。In the present application, the first color layer 30 is disposed on the surface of the optical film layer 20, and the first color layer 30 is used to color the housing assembly 100, so that the housing assembly 100 has a rich appearance effect. Specifically, the thickness of the first color layer 30 is not particularly limited. For example, the thickness of the first color layer 30 may be 3 μm-10 μm, and specifically may be 4 μm, 5 μm, 6.5 μm, 7.2 μm, 8 μm, or 9 μm. When the thickness of the first color layer 30 is in the above range, the housing assembly 100 can have a good color effect.
在本申请中,第一颜色层30具有镂空部,也就是说,第一颜色层30设置在透明衬底10的部分表面。镂空部可以但不限于为预设的图案、文字等。具体的,镂空部的形状等不受特别限制,可以通过对镂空部的形状进行设计,使壳体组件100呈现丰富的外观效果。具体的,可以通过胶印、丝印、打印和热转印中至少一种工艺成型第一颜色层30,例如可以通过丝印控制第一颜色层30材料的位置,直接形成具有镂空部的第一颜色层30;也可以在光学膜层20的表面涂覆整层的第一颜色层30材料,经固化后通过刻蚀处理形成镂空部;还可以预先在光学膜层20上设置掩膜板,直接丝印形成具有镂空部的第一颜色层30。在一实施例中,可以通过控制菲林片来控制镂空部的形成,以在光学膜层20上成型具有镂空部的第一颜色层30。在一实施例中,第一颜色层30可以由具有预定颜色的油墨形成,具体的如UV固化型油墨等。第一颜色层30可以为单层结构,也可以为多层结构,形成不同层的油墨颜色可以相同也可以不同。具体的,油墨颜色可以但不限于为黄色、红色、蓝色、绿色、白色、黑色等。在一具体实施例中,控制丝印的菲林片图案,在光学膜层20上涂覆4μm-8μm厚的颜色油墨,在60℃-90℃烘烤30min-60min后形成具有镂空部的第一颜色层30。在本申请中,第一颜色层30的光学透过率小于10%,以使得第一颜色层30可以对光线产生阻挡作用,在光线传播方向上位于第一颜色层30后方的膜层的视觉效果,而第一颜色层30中的镂空部则可以呈现后方膜层的视觉效果,进而产生视觉效果差异,从而提高壳体组件100的外观表现力。In the present application, the first color layer 30 has a hollow portion, that is, the first color layer 30 is provided on a part of the surface of the transparent substrate 10. The hollow part can be, but is not limited to, a preset pattern, text, etc. Specifically, the shape of the hollow portion is not particularly limited, and the shape of the hollow portion can be designed to make the housing assembly 100 present a rich appearance effect. Specifically, the first color layer 30 can be formed by at least one of offset printing, silk screen printing, printing and thermal transfer. For example, the position of the material of the first color layer 30 can be controlled by silk screen printing to directly form the first color layer with a hollow part. 30; It is also possible to coat a whole layer of the first color layer 30 material on the surface of the optical film layer 20, and form a hollow part by etching after curing; it is also possible to pre-set a mask on the optical film layer 20 and directly screen print A first color layer 30 having a hollow part is formed. In an embodiment, the formation of the hollow part can be controlled by controlling the film, so as to form the first color layer 30 with the hollow part on the optical film layer 20. In an embodiment, the first color layer 30 may be formed of an ink having a predetermined color, for example, a UV curable ink or the like. The first color layer 30 may have a single-layer structure or a multi-layer structure, and the colors of the inks forming different layers may be the same or different. Specifically, the ink color can be, but is not limited to, yellow, red, blue, green, white, black, etc. In a specific embodiment, the silk-screened film pattern is controlled, the optical film layer 20 is coated with a 4 μm-8 μm thick color ink, and the first color with a hollow part is formed after baking at 60° C.-90° C. for 30 min-60 min. Layer 30. In the present application, the optical transmittance of the first color layer 30 is less than 10%, so that the first color layer 30 can block light, and the film layer located behind the first color layer 30 in the light propagation direction has a visual effect. The hollow part in the first color layer 30 can present the visual effect of the rear film layer, thereby creating a difference in visual effect, thereby improving the appearance and expressiveness of the housing assembly 100.
在本申请中,所述修饰层40设置在所述透明衬底10的表面,所述光学膜层20和所述第一颜色层30设置在所述修饰层40远离所述透明衬底10的表面。修饰层40部分设置在第一颜色层30远离光学膜层20的表面,部分设置在镂空部露出的光学膜层20的表面,也就是说,修饰层40在光学膜层20上的正投影完全覆盖镂空部在光学膜层20上的正投影。修饰层40用于对壳体组件100进行修饰、装饰效果,并产生与第一颜色层30非镂空区域不同的视觉效果。在一实施例中,修饰层40远离光学膜层20的表面为平整表面。修饰层40包括第二颜色层41和设置在第二颜色层41表面的镀膜层42,第二颜色层41和镀膜层42中靠近光学膜层20的层的光学透过率大于30%,也就是说,第二颜色层41和镀膜层42中,当第二颜色层41更靠近光学膜层20时,第二颜色层41的光学透过率大于30%,以使得镀膜层42的视觉效果可以呈现出来,不被第二颜色层41遮挡;当镀膜层42更靠近光学膜层20时,镀膜层42的光学透过率大于30%,以使得第二颜色层41的视觉效果可以呈现出来,不被镀膜层42遮挡。In the present application, the modification layer 40 is disposed on the surface of the transparent substrate 10, and the optical film layer 20 and the first color layer 30 are disposed on the modification layer 40 away from the transparent substrate 10. surface. The modification layer 40 is partly arranged on the surface of the first color layer 30 away from the optical film layer 20, and partly on the surface of the optical film layer 20 exposed by the hollow part, that is, the orthographic projection of the modification layer 40 on the optical film layer 20 is completely Cover the orthographic projection of the hollow part on the optical film layer 20. The modification layer 40 is used to modify and decorate the housing assembly 100 and produce a visual effect different from the non-hollowed area of the first color layer 30. In one embodiment, the surface of the modification layer 40 away from the optical film layer 20 is a flat surface. The modification layer 40 includes a second color layer 41 and a coating layer 42 disposed on the surface of the second color layer 41. The optical transmittance of the second color layer 41 and the coating layer 42 that is close to the optical film layer 20 is greater than 30%. That is, in the second color layer 41 and the coating layer 42, when the second color layer 41 is closer to the optical film layer 20, the optical transmittance of the second color layer 41 is greater than 30%, so that the visual effect of the coating layer 42 Can be presented without being blocked by the second color layer 41; when the coating layer 42 is closer to the optical film layer 20, the optical transmittance of the coating layer 42 is greater than 30%, so that the visual effect of the second color layer 41 can be presented , Not blocked by the coating layer 42.
第二颜色层41用于对壳体组件100进行着色,使壳体组件100具有丰富的外观效果。具体的,第二颜色层41的厚度不受特别限制,例如第二颜色层41的厚度可以为3μm-10μm,具体的可以为4μm、5μm、6μm、7μm、8μm或9μm等。第二颜色层41的厚度在上述范围时,可以使壳体组件100具有良好的颜色效果。具体的,可以通过胶印、丝印、打印和热转印中至少一种工艺成型第二颜色层41。在一实施例中,第二颜色层41可以由具有预定颜色的油墨形成,具体的如UV固化型油墨等。第二颜色层41可以为单层结构,也可以为多层结构,形成不同层的油墨颜色可以相同也可以不同。具体的,油墨颜色可以但不限于为黄色、红色、蓝色、绿色、白色、黑色等。在一具体实施例中,通过丝印4μm-8μm厚的颜色油墨,在60℃-90℃烘烤30min-60min后形成第二颜色层41。在本申请中,第一颜色层30和第二颜色层41的颜色不同,使得壳体组件100产生不同的颜色,实现撞色效果。The second color layer 41 is used to color the housing assembly 100 so that the housing assembly 100 has a rich appearance effect. Specifically, the thickness of the second color layer 41 is not particularly limited. For example, the thickness of the second color layer 41 may be 3 μm-10 μm, specifically, 4 μm, 5 μm, 6 μm, 7 μm, 8 μm, or 9 μm. When the thickness of the second color layer 41 is within the above range, the housing assembly 100 can have a good color effect. Specifically, the second color layer 41 may be formed by at least one of offset printing, silk screen printing, printing, and thermal transfer. In an embodiment, the second color layer 41 may be formed of an ink having a predetermined color, for example, a UV curable ink or the like. The second color layer 41 may have a single-layer structure or a multi-layer structure, and the colors of the inks forming different layers may be the same or different. Specifically, the ink color can be, but is not limited to, yellow, red, blue, green, white, black, etc. In a specific embodiment, the second color layer 41 is formed by silk-screening a color ink with a thickness of 4 μm-8 μm and baking at 60° C.-90° C. for 30 min-60 min. In the present application, the colors of the first color layer 30 and the second color layer 41 are different, so that the housing assembly 100 produces different colors to achieve a color contrast effect.
可以理解的,镀膜层42与光学膜层20的效果类似,是一种通过其界面传播光线的光学介质材料层,可以改变穿过镀膜层42的光线的反射、折射等,使得壳体组件100呈现一定的光泽变化,如在不同角度下呈现出不同颜色光泽、带来金属质感等视觉效果;通过改变镀膜层42的材质、厚度和层数等改变镀膜层42的反射率、折射率和透光率,实现不同的视觉效果,满足不同场景下的需求。在本申请中,镀膜层42的材质选自能够使镀膜层42具有一定光学效果的物质,具体的可以但不限于为使镀膜层42具有一定的折射率、透过率、反射率等。镀膜层42的材质可以为无机物,也可以为有机物。可选的,有机物包括聚醚、聚酯、氟代聚合物和含硅聚合物中的至少一种。当镀膜层42的材质为有机物时,镀膜层42柔性好,可弯曲性好,能够进行剪裁得到所需尺寸的镀膜层42。可选的,无机物包括金属单质、无机氧化物和无机氟化物中的至少一种。在一实施例中,镀膜层42的材质包括金属单质、无机氧化物和无机氟化物中的至少一种,例如镀膜层42的材质包括In、Sn、TiO 2、NbO 2、Nb 2O 3、Nb 2O 2、Nb 2O 5、SiO 2和ZrO 2或者其他不导电氧化物中的至少一种。进一步的,镀膜层42的材质为In-Sn,产生高反射率的金属质感效果。例如,镀膜层42的材料可以选自TiO 2、NbO 2、Nb 2O 3、Nb 2O 2、Nb 2O 5、SiO 2和ZrO 2中至少两种的组合,以使得镀膜层42呈现蓝色或紫色等彩色光泽质感的效果。又如,镀膜层42的材质可以为In或In-Sn,以使得镀膜层42呈现银色金属质感效果。 It is understandable that the coating layer 42 has a similar effect to the optical film layer 20. It is an optical medium material layer that transmits light through its interface, and can change the reflection, refraction, etc. of the light passing through the coating layer 42, so that the housing assembly 100 Show a certain gloss change, such as showing different color gloss at different angles, bringing visual effects such as metallic texture; changing the reflectivity, refractive index and transparency of the coating layer 42 by changing the material, thickness and number of layers of the coating layer 42 The light rate can achieve different visual effects to meet the needs of different scenarios. In the present application, the material of the coating layer 42 is selected from substances that can make the coating layer 42 have a certain optical effect. Specifically, but not limited to, the coating layer 42 has a certain refractive index, transmittance, and reflectivity. The material of the coating layer 42 may be inorganic or organic. Optionally, the organic substance includes at least one of polyether, polyester, fluoropolymer, and silicon-containing polymer. When the material of the coating layer 42 is organic, the coating layer 42 has good flexibility and flexibility, and can be cut to obtain a coating layer 42 of a desired size. Optionally, the inorganic substance includes at least one of elemental metal, inorganic oxide, and inorganic fluoride. In one embodiment, the material of the coating layer 42 includes at least one of simple metal, inorganic oxide, and inorganic fluoride. For example, the material of the coating layer 42 includes In, Sn, TiO 2 , NbO 2 , Nb 2 O 3 , At least one of Nb 2 O 2 , Nb 2 O 5 , SiO 2 and ZrO 2 or other non-conductive oxides. Further, the material of the coating layer 42 is In-Sn, which produces a metallic texture effect with high reflectivity. For example, the material of the coating layer 42 can be selected from a combination of at least two of TiO 2 , NbO 2 , Nb 2 O 3 , Nb 2 O 2 , Nb 2 O 5 , SiO 2 and ZrO 2 to make the coating layer 42 appear blue. Color or purple and other colored glossy texture effects. For another example, the material of the coating layer 42 may be In or In-Sn, so that the coating layer 42 presents a silver metallic texture effect.
在本申请中,镀膜层42可以为单层膜结构,也可以为多层膜结构。当镀膜层42为多层膜结构时,可以通过控制每一层的材质和厚度,以及各层之间的配合,以达到所需的功能。可选的,镀膜层42由至少两种具有不同折射率的光学薄膜交替层叠形成。也就是说,镀膜层42由多个光学薄膜组成时,相邻的光学薄膜的折射率不同。进一步的,镀膜层42由至少两种具有不同折射率的薄膜周期性地交替层叠形成。多个光学薄膜的材质、厚度可以相同,可以不同。多个光学薄膜的光学性质不同,光线通过多个光学薄膜后,每个光线薄膜表面均会发生反射和折射,产生更加丰富的外观效果。具体的,镀膜层42可以但不限于包括2层、3层、4层、5层、6层、7层或8层光学薄膜。可选的,镀膜层42的厚度为20nm-500nm,具体的可以但不限于为30nm、80nm、150nm、220nm、300nm、470nm、500nm等,过薄会导致镀膜层42呈现的光泽质感效果太弱,过厚会导致的膜层内的应力过大,容易脱落,该厚度范围有利于呈现镀膜层42的视觉效果,同时保证镀膜层42的使用寿命。本申请中的镀膜层42为整层结构,制备过程中无需遮蔽或刻蚀,更易制备性能优异的镀膜层42。在本申请中,镀膜层42的形成方法不受特别限制,例如可以通过物理气相沉积法形成,也可以通过真空镀膜法形成。镀膜设备可以为磁控溅射炉或者电子枪蒸发镀。在一实施例中,镀膜层42通过真空不导电电镀(NVCM)工艺形成。当壳体组件100具有镀膜层42时,壳体组件100可以在不同角度下反射出一定的光泽质感,提高壳体组件100的外观表现力。In the present application, the plating film layer 42 may have a single-layer film structure or a multilayer film structure. When the coating layer 42 is a multilayer film structure, the material and thickness of each layer and the coordination between the layers can be controlled to achieve the desired function. Optionally, the coating layer 42 is formed by alternately laminating at least two optical films with different refractive indices. In other words, when the coating layer 42 is composed of a plurality of optical films, the refractive indexes of adjacent optical films are different. Further, the coating layer 42 is formed by periodically alternately laminating at least two kinds of films with different refractive indexes. The material and thickness of the multiple optical films can be the same or different. The optical properties of multiple optical films are different. After light passes through the multiple optical films, the surface of each light film will be reflected and refracted, resulting in a richer appearance effect. Specifically, the coating layer 42 may include, but is not limited to, a 2-layer, 3-layer, 4-layer, 5-layer, 6-layer, 7-layer, or 8-layer optical film. Optionally, the thickness of the coating layer 42 is 20nm-500nm, specifically, but not limited to 30nm, 80nm, 150nm, 220nm, 300nm, 470nm, 500nm, etc., too thin will cause the coating layer 42 to exhibit too weak gloss texture effect If the thickness is too thick, the stress in the film layer will be too large and easy to fall off. This thickness range is beneficial to present the visual effect of the coating layer 42 and at the same time ensure the service life of the coating layer 42. The coating layer 42 in the present application has a whole-layer structure, and there is no need for masking or etching during the preparation process, and it is easier to prepare the coating layer 42 with excellent performance. In the present application, the method of forming the coating layer 42 is not particularly limited. For example, it can be formed by a physical vapor deposition method or a vacuum coating method. The coating equipment can be a magnetron sputtering furnace or an electron gun evaporation coating. In one embodiment, the coating layer 42 is formed by a vacuum non-conductive electroplating (NVCM) process. When the housing assembly 100 has the coating layer 42, the housing assembly 100 can reflect a certain gloss texture at different angles, which improves the appearance and expressiveness of the housing assembly 100.
请参考图2,图2为本申请另一实施例的壳体组件的结构示意图,其中,修饰层40还包括第二纹理层43,第二纹理层43设置在镀膜层42靠近光学膜层20的表面。第二纹理 层43可以使壳体组件100呈现纹理视觉效果,同时,第二纹理层43叠加镀膜层42,使第二纹理层43的外观效果更加清晰地呈现出来,并在不同角度具有不同的光线色泽变化,呈现不同质感的纹理,提高壳体组件100的外观表现力。Please refer to FIG. 2, which is a schematic structural diagram of a housing assembly according to another embodiment of the application, in which the modification layer 40 further includes a second texture layer 43, and the second texture layer 43 is disposed on the coating layer 42 close to the optical film layer 20 s surface. The second texture layer 43 can make the housing assembly 100 present a texture visual effect. At the same time, the second texture layer 43 is superimposed on the coating layer 42, so that the appearance effect of the second texture layer 43 is more clearly presented, and has different effects at different angles. The color of the light changes to present textures with different textures, and the appearance and expressiveness of the housing assembly 100 is improved.
在本申请一实施例中,第二纹理层43的光学透过率大于30%。进一步的,第二纹理层43的光学透过率大于50%、70%、80%或90%。第二纹理层43的厚度可以为5μm-15μm,具体的可以但不限于为6μm、7μm、9.5μm、10μm、11.5μm、12μm、15μm等,在此厚度范围内,可以形成良好的纹理效果,厚度过大可能导致第二纹理层43的抗冲击效果差,容易开裂,厚度过小可能导致形成的纹理不明显,制备工艺控制难度大。在一实施例中,第二纹理层43可以仅设置在镂空部对应的修饰层40表面,即第二纹理层43在镀膜层42上的正投影与镂空部在镀膜层42上的正投影完全重合,此时可以在镀膜层42表面较小范围内设置第二纹理层43,透过镂空部呈现纹理效果,节省第二纹理层43材料的使用。在另一实施例中,第二纹理层43在镀膜层42上的正投影完全覆盖镂空部在镀膜层42上的正投影,并且部分覆盖第一颜色层30在镀膜层42的正投影;此时可以使得第二纹理层43在镀膜层42上的正投影与第一颜色层30在镀膜层42上的正投影完全重合,有利于壳体组件100整体膜层结构更加平整。在本申请中,在对应镂空部的第二纹理层43存在纹理即可,当然也可以整层均存在纹理。在一实施例中,可以但不限于通过UV转印光学纹理处理在镀膜层42上形成第二纹理层43。可选的,通过高抗刮型UV转印胶、高硬度型UV转印胶、高弹性型UV转印胶或通用型UV转印胶在镀膜层42上形成第二纹理层43。具体的,UV转印胶的材质包括聚氨酯丙烯酸树脂等。具体的,将UV转印胶涂覆后经固化形成第二纹理层43。可选的,固化包括在LED或汞灯固化,其中,LED固化能量800mJ/cm 2-2500mJ/cm 2,汞灯固化能量550mJ/cm 2-1500mJ/cm 2In an embodiment of the present application, the optical transmittance of the second texture layer 43 is greater than 30%. Further, the optical transmittance of the second texture layer 43 is greater than 50%, 70%, 80%, or 90%. The thickness of the second texture layer 43 may be 5 μm-15 μm, specifically but not limited to 6 μm, 7 μm, 9.5 μm, 10 μm, 11.5 μm, 12 μm, 15 μm, etc., within this thickness range, a good texture effect can be formed. Too large a thickness may result in poor impact resistance and easy cracking of the second texture layer 43, and too small a thickness may result in inconspicuous texture formation, and it is difficult to control the preparation process. In one embodiment, the second texture layer 43 may only be provided on the surface of the modification layer 40 corresponding to the hollow portion, that is, the orthographic projection of the second texture layer 43 on the coating layer 42 and the orthographic projection of the hollow portion on the coating layer 42 are complete. In this case, the second texture layer 43 can be arranged in a small area on the surface of the coating layer 42 to present a texture effect through the hollow part, saving the use of the material of the second texture layer 43. In another embodiment, the orthographic projection of the second texture layer 43 on the coating layer 42 completely covers the orthographic projection of the hollow portion on the coating layer 42 and partially covers the orthographic projection of the first color layer 30 on the coating layer 42; this At this time, the orthographic projection of the second texture layer 43 on the coating layer 42 and the orthographic projection of the first color layer 30 on the coating layer 42 can be completely overlapped, which is beneficial to the overall film structure of the housing assembly 100 to be flatter. In the present application, the second texture layer 43 corresponding to the hollow portion only needs to have a texture, and of course, the whole layer may also have a texture. In an embodiment, the second texture layer 43 may be formed on the coating layer 42 by, but not limited to, UV transfer optical texture processing. Optionally, the second texture layer 43 is formed on the coating layer 42 by a high-scratch-resistant UV transfer glue, a high-hardness UV transfer glue, a high-elastic UV transfer glue or a general-purpose UV transfer glue. Specifically, the material of the UV transfer adhesive includes polyurethane acrylic resin and the like. Specifically, the UV transfer glue is coated and cured to form the second texture layer 43. Alternatively, curing comprises curing the LED or a mercury lamp, wherein, LED curing energy 800mJ / cm 2 -2500mJ / cm 2 , a mercury lamp curing energy 550mJ / cm 2 -1500mJ / cm 2 .
请继续参考图2,其中,壳体组件100还包括第一纹理层50,第一纹理层50设置在光学膜层20远离修饰层40的表面。第一纹理层50可以使壳体组件100呈现纹理视觉效果,第一纹理层50设置在光学膜层20的表面,使第一纹理层50的外观效果更加清晰地呈现出来,并在不同角度具有不同的光线色泽变化,呈现不同质感的纹理;第一纹理层50结合第一颜色层30、第二颜色层41等,可以实现具有不同颜色、质感的纹理视觉效果。Please continue to refer to FIG. 2, where the housing assembly 100 further includes a first texture layer 50, and the first texture layer 50 is disposed on the surface of the optical film layer 20 away from the modification layer 40. The first texture layer 50 can make the housing assembly 100 present a texture visual effect. The first texture layer 50 is arranged on the surface of the optical film layer 20, so that the appearance effect of the first texture layer 50 is more clearly presented, and has different angles. Different light colors change to present textures with different textures; the first texture layer 50 combined with the first color layer 30, the second color layer 41, etc., can achieve texture visual effects with different colors and textures.
在本申请一实施例中,第一纹理层50的光学透过率大于30%。进一步的,第一纹理层50的光学透过率大于50%、70%、80%或90%。第一纹理层50的厚度可以为5μm-15μm,具体的可以但不限于为6μm、7μm、8μm、10μm、11μm、12μm、15μm等,在此厚度范围内,可以形成良好的纹理效果,厚度过大可能导致第一纹理层50的抗冲击效果差,容易开裂,厚度过小可能导致形成的纹理不明显,制备工艺控制难度大。在一实施例中,第一纹理层50完全覆盖光学膜层20。在一实施例中,可以但不限于通过UV转印光学纹理处理在光学膜层20上形成第一纹理层50。可选的,通过高抗刮型UV转印胶、高硬度型UV转印胶、高弹性型UV转印胶或通用型UV转印胶在光学膜层20上形成第一纹理层50。具体的,UV转印胶的材质包括聚氨酯丙烯酸树脂等。具体的,将UV转印胶涂覆后经固化形成第一纹理层50。可选的,固化包括在LED或汞灯固化,其中,LED固化能量800mJ/cm 2-2500mJ/cm 2,汞灯固化能量550mJ/cm 2-1500mJ/cm 2。第一纹理层50的纹理可以但不限于为纳米级的幻彩细纹理,提高壳体组件100的视觉效果。在本申请中,当壳体组件100包括第一纹理层50和第二纹理层43时,第一纹理层50和第二纹理层43的纹理不同,以使得镂空部对应区域呈现第一纹理层50和第二纹理层43叠加的纹理效果,其他区域呈现第一纹理层50的纹理效果,使得壳体组件100呈现两种纹理效果,提高壳体组件100的外观表现力。 In an embodiment of the present application, the optical transmittance of the first texture layer 50 is greater than 30%. Further, the optical transmittance of the first texture layer 50 is greater than 50%, 70%, 80% or 90%. The thickness of the first texture layer 50 may be 5 μm-15 μm, specifically but not limited to 6 μm, 7 μm, 8 μm, 10 μm, 11 μm, 12 μm, 15 μm, etc., within this thickness range, a good texture effect can be formed. It is likely that the first texture layer 50 has poor impact resistance and is easy to crack. If the thickness is too small, the formed texture may be inconspicuous, and it is difficult to control the preparation process. In one embodiment, the first texture layer 50 completely covers the optical film layer 20. In an embodiment, the first texture layer 50 may be formed on the optical film layer 20 by, but not limited to, UV transfer optical texture processing. Optionally, the first texture layer 50 is formed on the optical film layer 20 by a high-scratch-resistant UV transfer glue, a high-hardness UV transfer glue, a high-elastic UV transfer glue or a general-purpose UV transfer glue. Specifically, the material of the UV transfer adhesive includes polyurethane acrylic resin and the like. Specifically, the UV transfer glue is coated and cured to form the first texture layer 50. Alternatively, curing comprises curing the LED or a mercury lamp, wherein, LED curing energy 800mJ / cm 2 -2500mJ / cm 2 , a mercury lamp curing energy 550mJ / cm 2 -1500mJ / cm 2 . The texture of the first texture layer 50 can be, but is not limited to, a nano-level illusion fine texture, which improves the visual effect of the housing assembly 100. In the present application, when the housing assembly 100 includes the first texture layer 50 and the second texture layer 43, the textures of the first texture layer 50 and the second texture layer 43 are different, so that the area corresponding to the hollow part presents the first texture layer With the superimposed texture effect of 50 and the second texture layer 43, other regions present the texture effect of the first texture layer 50, so that the shell assembly 100 exhibits two texture effects, and improves the appearance expressiveness of the shell assembly 100.
请继续参阅图1,其中光学膜层20设置在透明衬底10的表面,第一颜色层30和修饰层40设置在光学膜层20远离透明衬底10的表面。在修饰层40至光学膜层20的方向上,镂空部对应的位置呈现光学膜层20、第二颜色层41、镀膜层42叠加的视觉效果,其他位 置呈现光学膜层20和第一颜色层30叠加的视觉效果,使得可以壳体组件100呈现了不同颜色、质感的外观。请参阅图3,为本申请另一实施例的壳体组件的结构示意图,其中,修饰层40设置在透明衬底10的表面,光学膜层20和第一颜色层30设置在修饰层40远离透明衬底10的表面。在修饰层40至光学膜层20的方向上,镂空部对应的位置呈现光学膜层20、第二颜色层41、镀膜层42叠加的视觉效果,其他位置呈现光学膜层20和第一颜色层30叠加的视觉效果,使得可以壳体组件100呈现了不同颜色、质感的外观。此两种设置方式,均可以在壳体组件100的某一方向上实现不同颜色、质感的外观效果。Please continue to refer to FIG. 1, where the optical film layer 20 is disposed on the surface of the transparent substrate 10, and the first color layer 30 and the modification layer 40 are disposed on the surface of the optical film layer 20 away from the transparent substrate 10. In the direction from the modification layer 40 to the optical film layer 20, the position corresponding to the hollow part presents the visual effect of the optical film layer 20, the second color layer 41, and the coating layer 42. The other positions present the optical film layer 20 and the first color layer. The superimposed visual effects of 30 make it possible for the housing assembly 100 to present the appearance of different colors and textures. Please refer to FIG. 3, which is a schematic structural diagram of a housing assembly according to another embodiment of the application, in which the modification layer 40 is disposed on the surface of the transparent substrate 10, and the optical film layer 20 and the first color layer 30 are disposed far away from the modification layer 40. The surface of the transparent substrate 10. In the direction from the modification layer 40 to the optical film layer 20, the position corresponding to the hollow part presents the visual effect of the optical film layer 20, the second color layer 41, and the coating layer 42. The other positions present the optical film layer 20 and the first color layer. The superimposed visual effects of 30 make it possible for the housing assembly 100 to present the appearance of different colors and textures. Both of these two setting methods can achieve appearance effects of different colors and textures in a certain direction of the housing assembly 100.
请继续参阅图1,其中,与镀膜层42相比,第二颜色层41更靠近光学膜层20,此时,第二颜色层41的光学透过率大于30%,以便可以呈现镀膜层42的外观效果。第二颜色层41与第一颜色层30的颜色不同,同时,第二颜色层41的透过率大于第一颜色层30,更加明显的区别两种颜色,形成更明显的撞色效果。在一实施例中,第二颜色层41仅覆盖镂空部露出的光学膜层20的表面。例如,第二颜色层41远离光学膜层20的表面可以与第一颜色层30远离光学膜层20的表面齐平,节省第二颜色层41材质的使用。在另一实施例中,第二颜色层41可以部分覆盖镂空部露出的光学膜层20的表面,部分覆盖第一颜色层30,此时,第一颜色层30和第二颜色层41之间不会产生明显的界限,更不会产生错位现象,外观效果良好,同时在制备过程中更容易操作和实现。当修饰层40还包括第二纹理层43时,请参阅图2,第二纹理层43设置在第二颜色层41和镀膜层42之间。第二纹理层43的光学透过率大于30%,以便可以呈现镀膜层42的外观效果。Please continue to refer to FIG. 1, where, compared with the coating layer 42, the second color layer 41 is closer to the optical film layer 20. At this time, the optical transmittance of the second color layer 41 is greater than 30%, so that the coating layer 42 can be displayed. The appearance of the effect. The second color layer 41 and the first color layer 30 have different colors. At the same time, the transmittance of the second color layer 41 is greater than that of the first color layer 30, which distinguishes the two colors more clearly and forms a more obvious color contrast effect. In an embodiment, the second color layer 41 only covers the surface of the optical film layer 20 exposed by the hollow portion. For example, the surface of the second color layer 41 away from the optical film layer 20 may be flush with the surface of the first color layer 30 away from the optical film layer 20, saving the use of materials for the second color layer 41. In another embodiment, the second color layer 41 may partially cover the surface of the optical film layer 20 exposed by the hollow portion and partially cover the first color layer 30. At this time, the first color layer 30 and the second color layer 41 There is no obvious boundary, no dislocation phenomenon, good appearance effect, and easier operation and realization in the preparation process. When the modification layer 40 further includes the second texture layer 43, referring to FIG. 2, the second texture layer 43 is disposed between the second color layer 41 and the coating layer 42. The optical transmittance of the second texture layer 43 is greater than 30%, so that the appearance effect of the coating layer 42 can be presented.
请参阅图4,为本申请另一实施例的壳体组件的结构示意图,其与图1提供的壳体组件大体相同,不同之处在于,与第二颜色层41相比,镀膜层42更靠近光学膜层20,此时,镀膜层42的光学透过率大于30%,以便可以呈现第二颜色层41的外观效果。在一实施例中,镀膜层42仅覆盖镂空部露出的光学膜层20的表面。例如,镀膜层42远离光学膜层20的表面可以与第一颜色层30远离光学膜层20的表面齐平,节省镀膜层42材质的使用。在另一实施例中,镀膜层42可以部分覆盖镂空部露出的光学膜层20的表面,部分覆盖第一颜色层30,此时,第一颜色层30和镀膜层42之间不会产生明显的界限,更不会产生错位现象,外观效果良好,同时在制备过程中更容易操作和实现。当修饰层40还包括第二纹理层43时,请参阅图5,为本申请另一实施例的壳体组件的结构示意图,其与图2提供的壳体组件大体相同,不同之处在于,与第二颜色层41相比,镀膜层42更靠近光学膜层20,此时,镀膜层42的光学透过率大于30%,以便可以呈现第二颜色层41的外观效果。此时第二纹理层43设置在光学膜层20和镀膜层42之间。第二纹理层43的光学透过率大于30%,以便可以呈现镀膜层42的外观效果。在一实施例中,第二纹理层43仅覆盖镂空部露出的光学膜层20的表面。例如,第二纹理层43远离光学膜层20的表面可以与第一颜色层30远离光学膜层20的表面齐平,节省第二纹理层43材质的使用。在另一实施例中,第二纹理层43可以部分覆盖镂空部露出的光学膜层20的表面,部分覆盖第一颜色层30,此时,第一颜色层30和第二纹理层43之间不会产生明显的界限,更不会产生错位现象,外观效果良好,同时在制备过程中更容易操作和实现。Please refer to FIG. 4, which is a schematic structural diagram of a housing assembly according to another embodiment of the application, which is substantially the same as the housing assembly provided in FIG. 1, except that, compared with the second color layer 41, the coating layer 42 is more Close to the optical film layer 20, at this time, the optical transmittance of the coating layer 42 is greater than 30%, so that the appearance effect of the second color layer 41 can be presented. In one embodiment, the coating layer 42 only covers the surface of the optical film layer 20 exposed by the hollow portion. For example, the surface of the coating layer 42 away from the optical film layer 20 may be flush with the surface of the first color layer 30 away from the optical film layer 20, saving the use of the material of the coating layer 42. In another embodiment, the coating layer 42 may partially cover the surface of the optical film layer 20 exposed in the hollow portion, and partially cover the first color layer 30. At this time, there will be no obvious difference between the first color layer 30 and the coating layer 42. It will not produce dislocation phenomenon, the appearance effect is good, and it is easier to operate and realize in the preparation process. When the modification layer 40 further includes the second texture layer 43, please refer to FIG. 5, which is a schematic structural diagram of a housing assembly according to another embodiment of the application, which is substantially the same as the housing assembly provided in FIG. 2, except that: Compared with the second color layer 41, the coating layer 42 is closer to the optical film layer 20. At this time, the optical transmittance of the coating layer 42 is greater than 30%, so that the appearance effect of the second color layer 41 can be presented. At this time, the second texture layer 43 is disposed between the optical film layer 20 and the coating layer 42. The optical transmittance of the second texture layer 43 is greater than 30%, so that the appearance effect of the coating layer 42 can be presented. In an embodiment, the second texture layer 43 only covers the surface of the optical film layer 20 exposed by the hollow portion. For example, the surface of the second texture layer 43 away from the optical film layer 20 may be flush with the surface of the first color layer 30 away from the optical film layer 20, saving the use of the material of the second texture layer 43. In another embodiment, the second texture layer 43 may partially cover the surface of the optical film layer 20 exposed by the hollow portion, and partially cover the first color layer 30. At this time, the first color layer 30 and the second texture layer 43 may be separated from each other. There is no obvious boundary, no dislocation phenomenon, good appearance effect, and easier operation and realization in the preparation process.
请参考图6,图6为本申请另一实施例的壳体组件的结构示意图,其与图1提供的壳体组件大体相同,不同之处在于,还包括连接层60,连接层60设置在透明衬底10和光学膜层20之间,以连接透明衬底10和光学膜层20。请参考图7,图7为本申请另一实施例的壳体组件的结构示意图,其与图3提供的壳体组件大体相同,不同之处在于,还包括连接层60,连接层60设置在透明衬底10和修饰层40之间,以连接透明衬底10和修饰层40。在本申请中,连接层60的光学透过率大于30%。进一步的,连接层60的光学透过率大于50%、70%、80%或90%。在本申请中,连接层60的厚度可以为5μm-15μm,具体的可以但不限于为6μm、7μm、8μm、9μm、10μm、12μm、15μm等。连接层60的材质可以但不限于为紫外光固化胶。在一实施例中,淋涂紫外光固化胶,经固化后形成连接层60。 具体的,固化能量可以为400mJ/cm 2-1200mJ/cm 2。可选的,连接层60的材质包括聚氨酯丙烯酸酯、有机硅树脂、全氟聚醚丙烯酸酯中的至少一种,使得连接层60的表面硬度提高。可选的,连接层60的表面硬度为1H-6H,进而可以对壳体组件100中的膜层结构起到一定的保护作用。 Please refer to FIG. 6, which is a schematic structural diagram of a housing assembly according to another embodiment of the application, which is substantially the same as the housing assembly provided in FIG. Between the transparent substrate 10 and the optical film layer 20 to connect the transparent substrate 10 and the optical film layer 20. Please refer to FIG. 7, which is a schematic structural diagram of a housing assembly according to another embodiment of the application, which is substantially the same as the housing assembly provided in FIG. Between the transparent substrate 10 and the modified layer 40 to connect the transparent substrate 10 and the modified layer 40. In this application, the optical transmittance of the connecting layer 60 is greater than 30%. Further, the optical transmittance of the connecting layer 60 is greater than 50%, 70%, 80% or 90%. In the present application, the thickness of the connection layer 60 may be 5 μm-15 μm, specifically but not limited to 6 μm, 7 μm, 8 μm, 9 μm, 10 μm, 12 μm, 15 μm, etc. The material of the connection layer 60 can be, but is not limited to, a UV curable glue. In one embodiment, the UV curable adhesive is spray coated, and the connection layer 60 is formed after curing. Specifically, the curing energy may be 400 mJ/cm 2 -1200 mJ/cm 2 . Optionally, the material of the connection layer 60 includes at least one of urethane acrylate, silicone resin, and perfluoropolyether acrylate, so that the surface hardness of the connection layer 60 is improved. Optionally, the surface hardness of the connecting layer 60 is 1H-6H, which can further protect the film structure in the housing assembly 100 to a certain extent.
请参阅图8,为本申请另一实施例的壳体组件的结构示意图,其与图1提供的壳体组件大体相同,不同之处在于,还包括保护层70,保护层70设置在透明衬底10远离光学膜层20的表面。请参阅图9,为本申请另一实施例的壳体组件的结构示意图,其与图3提供的壳体组件大体相同,不同之处在于,还包括保护层70,保护层70设置在光学膜层20远离透明衬底10的表面。上述为保护层70的两种设置方式,保护层70用于对壳体组件100各个膜层起到保护作用。Please refer to FIG. 8, which is a schematic structural diagram of a housing assembly according to another embodiment of the application, which is substantially the same as the housing assembly provided in FIG. 1, except that it further includes a protective layer 70, which is disposed on the transparent liner. The bottom 10 is away from the surface of the optical film layer 20. Please refer to FIG. 9, which is a schematic structural diagram of a housing assembly according to another embodiment of the application, which is substantially the same as the housing assembly provided in FIG. 3, except that it also includes a protective layer 70, which is disposed on the optical film The layer 20 is far away from the surface of the transparent substrate 10. The above are two ways of setting the protective layer 70, and the protective layer 70 is used to protect each film layer of the housing assembly 100.
在本申请一实施例中,保护层70的光学透过率大于30%。进一步的,保护层70的光学透过率大于50%、70%、80%或90%。在本申请中,保护层70的厚度可以为3μm-20μm,具体的可以但不限于为4μm、6μm、8μm、11μm、15μm、16μm、18μm等。可选的,保护层70包括硬化层和抗指纹层中的至少一种。硬化层的材质可以但不限于为紫外光固化胶。在一实施例中,淋涂紫外光固化胶,经固化后形成硬化层。具体的,固化能量可以为400mJ/cm 2-1200mJ/cm 2。可选的,硬化层的材质包括聚氨酯丙烯酸酯、有机硅树脂、全氟聚醚丙烯酸酯中的至少一种。可选的,硬化层的表面硬度为3H-6H,进而可以对壳体组件100中的膜层结构起到一定的保护作用。抗指纹层具有防污、防指纹附着的作用。可选的,抗指纹层的材质包括含氟抗指纹剂。具体的,抗指纹层的材质可以但不限于为全氟聚醚类、聚四氟乙烯、氟烷基醚-硅氧烷、氟化镁铝氧等。具体的,抗指纹层表面的接触角可以但不限于为大于105°,有利于提高防指纹、污染物附着表面的能力。 In an embodiment of the present application, the optical transmittance of the protective layer 70 is greater than 30%. Further, the optical transmittance of the protective layer 70 is greater than 50%, 70%, 80% or 90%. In the present application, the thickness of the protective layer 70 may be 3 μm-20 μm, specifically, but not limited to 4 μm, 6 μm, 8 μm, 11 μm, 15 μm, 16 μm, 18 μm, etc. Optionally, the protective layer 70 includes at least one of a hardened layer and an anti-fingerprint layer. The material of the hardened layer can be, but is not limited to, ultraviolet curing glue. In one embodiment, the UV curable adhesive is spray coated and cured to form a hardened layer. Specifically, the curing energy may be 400 mJ/cm 2 -1200 mJ/cm 2 . Optionally, the material of the hardening layer includes at least one of urethane acrylate, silicone resin, and perfluoropolyether acrylate. Optionally, the surface hardness of the hardened layer is 3H-6H, which can further protect the film structure in the housing assembly 100 to a certain extent. The anti-fingerprint layer has the functions of anti-fouling and anti-fingerprint adhesion. Optionally, the material of the anti-fingerprint layer includes a fluorine-containing anti-fingerprint agent. Specifically, the material of the anti-fingerprint layer can be, but is not limited to, perfluoropolyethers, polytetrafluoroethylene, fluoroalkyl ether-siloxane, magnesium aluminum oxide fluoride, and the like. Specifically, the contact angle of the surface of the anti-fingerprint layer can be, but is not limited to, greater than 105°, which is beneficial to improve the ability of preventing fingerprints and contaminants from adhering to the surface.
请参阅图10,为本申请另一实施例的壳体组件的结构示意图,其与图1提供的壳体组件大体相同,不同之处在于,还包括遮光层80,遮光层80设置在修饰层40远离透明衬底10的表面。请参阅图11,为本申请另一实施例的壳体组件的结构示意图,其与图3提供的壳体组件大体相同,不同之处在于,还包括遮光层80,遮光层80设置在透明衬底10远离光学膜层20的表面。上述为遮光层80的两种设置方式,遮光层80起到遮挡作用,进而使得壳体组件100在应用时,例如用于电子设备时,对电子设备内部的电子元器件进行遮挡。对遮光层80的厚度不受特别限制,只要满足要求,本领域技术人员可以根据需要进行灵活选择。可选的,遮光层80的厚度为10μm-30μm。具体的,遮光层80的厚度可以但不限于为10μm、12μm、18μm、22μm、28μm或30μm。可选的,遮光层80的光学透过率小于10%。对遮光层80的颜色不受特别限制,只要满足要求,本领域技术人员可以根据需要进行灵活选择,例如可以包括但不限于红色、橙色、灰色、黑色、白色等。由此,可以选择任意不同的颜色,以满足不同用户的使用需求。具体的,可以通过多次涂覆等方式,以防止漏光,提高遮挡效果。在一实施例中,遮光层80为油墨层,可以包括但不限于通过丝网印刷或喷墨打印形成。例如,通过将油墨丝网印刷形成遮光层80,该方法可以适用多种类型的油墨,墨层覆盖力强,不受承印物表面形状的限制及面积大小的限制,具有很大的灵活性和广泛的适用性。Please refer to FIG. 10, which is a schematic structural diagram of a housing assembly according to another embodiment of the application, which is substantially the same as the housing assembly provided in FIG. 1, except that it also includes a light-shielding layer 80, which is disposed on the modification layer. 40 is far away from the surface of the transparent substrate 10. Please refer to FIG. 11, which is a schematic structural diagram of a housing assembly according to another embodiment of the present application. It is substantially the same as the housing assembly provided in FIG. 3, except that it also includes a light-shielding layer 80, which is disposed on the transparent lining. The bottom 10 is away from the surface of the optical film layer 20. The above are two ways of disposing the light shielding layer 80. The light shielding layer 80 plays a role of shielding, so that when the housing assembly 100 is used, for example, when used in an electronic device, the electronic components inside the electronic device are shielded. The thickness of the light-shielding layer 80 is not particularly limited, as long as the requirements are met, those skilled in the art can flexibly choose according to needs. Optionally, the thickness of the light shielding layer 80 is 10 μm-30 μm. Specifically, the thickness of the light shielding layer 80 may be, but is not limited to, 10 μm, 12 μm, 18 μm, 22 μm, 28 μm, or 30 μm. Optionally, the optical transmittance of the light shielding layer 80 is less than 10%. The color of the light-shielding layer 80 is not particularly limited, as long as the requirements are met, those skilled in the art can flexibly choose according to needs, for example, it may include but not limited to red, orange, gray, black, white, and the like. Thus, any different colors can be selected to meet the needs of different users. Specifically, multiple coatings can be used to prevent light leakage and improve the shielding effect. In an embodiment, the light shielding layer 80 is an ink layer, which may include but is not limited to being formed by screen printing or inkjet printing. For example, by screen printing the ink to form the light-shielding layer 80, this method can be applied to various types of inks. The ink layer has strong covering power and is not limited by the surface shape and area size of the substrate. It has great flexibility and Broad applicability.
本申请还提供了一种壳体组件的制备方法,该制备方法制备上述任一实施例的壳体组件100,包括:The present application also provides a method for preparing the housing assembly. The method for preparing the housing assembly 100 of any of the above embodiments includes:
提供透明衬底10,在透明衬底10上成型光学膜层20、第一颜色层30和修饰层40,其中,第一颜色层30设置在光学膜层20的表面,第一颜色层30具有镂空部;修饰层40部分设置在第一颜色层30远离光学膜层20的表面,部分设置在镂空部露出的光学膜层20的表面,修饰层40包括第二颜色层41和设置在第二颜色层41表面的镀膜层42,所述第二颜色层41靠近所述光学膜层20且光学透过率大于30%,或者所述镀膜层42靠近所述光学膜层20且光学透过率大于30%,第一颜色层30的光学透过率小于10%,第二颜色层 41和第一颜色层30的颜色不同。A transparent substrate 10 is provided, and an optical film layer 20, a first color layer 30 and a modification layer 40 are formed on the transparent substrate 10. The first color layer 30 is provided on the surface of the optical film layer 20, and the first color layer 30 has Hollowed part; the modification layer 40 is partly arranged on the surface of the first color layer 30 away from the optical film layer 20, and partly arranged on the surface of the optical film layer 20 exposed in the hollow part. The modification layer 40 includes a second color layer 41 and arranged on the second color layer 41. The coating layer 42 on the surface of the color layer 41, the second color layer 41 is close to the optical film layer 20 and has an optical transmittance greater than 30%, or the coating layer 42 is close to the optical film layer 20 and has an optical transmittance If it is greater than 30%, the optical transmittance of the first color layer 30 is less than 10%, and the colors of the second color layer 41 and the first color layer 30 are different.
请参阅图12,图12为本申请一实施例的壳体组件的制备方法的流程示意图,包括如下步骤:Please refer to FIG. 12, which is a schematic flowchart of a method for manufacturing a housing assembly according to an embodiment of the application, including the following steps:
操作101:在所述透明衬底的表面成型光学膜层。Operation 101: forming an optical film layer on the surface of the transparent substrate.
在操作101中,透明衬底10具有一定的透光性,对其形状、尺寸、材质等不做限制,根据实际需要进行选择。在本申请中,透明衬底10可以但不限于为电子设备的后壳和/或中框。例如,透明衬底10可以直接作为电子设备的壳体使用,也可以在透明衬底10上形成功能膜层后,再将其作为壳体使用。在一实施例中,可以在透明衬底10上成型光学膜层20、第一颜色层30和修饰层40后,通过高压成型工艺形成所需形状的壳体组件100。例如,可以在高压成型机中进行3D热弯成型,获得所需弧度的3D壳体组件100。具体的,可以但不限于为在130℃-240℃、成型压力15Bar-100Bar,热压0.3min-2min。当所需要的壳体组件100是具有一定弧度的形状,如2.5D、3D等,可以选择在透明衬底10上成型各个膜层后进行热压成型,一方面有利于各个膜层的制备,另一方面可以使得壳体组件100上各个膜层的分布均匀,视觉效果优异;当所需要的壳体组件100为平板状时,则可以直接提供所需形状的透明衬底10,再进行各个膜层的制备,也可以在透明衬底10上成型各个膜层后,再进行热压成型。In operation 101, the transparent substrate 10 has a certain light transmittance, and its shape, size, material, etc. are not limited, and the selection is made according to actual needs. In the present application, the transparent substrate 10 can be, but is not limited to, a back shell and/or a middle frame of an electronic device. For example, the transparent substrate 10 can be used directly as a casing of an electronic device, or it can be used as a casing after a functional film layer is formed on the transparent substrate 10. In an embodiment, after the optical film layer 20, the first color layer 30, and the modification layer 40 are molded on the transparent substrate 10, the housing assembly 100 of a desired shape can be formed by a high pressure molding process. For example, 3D hot bending forming can be performed in a high-pressure forming machine to obtain a 3D shell assembly 100 with a desired curvature. Specifically, it can be, but not limited to, 130°C-240°C, molding pressure 15Bar-100Bar, and hot pressing for 0.3min-2min. When the required housing assembly 100 is in a shape with a certain curvature, such as 2.5D, 3D, etc., you can choose to form each film layer on the transparent substrate 10 and then perform hot press molding. On the one hand, it is beneficial to the preparation of each film layer, and on the other hand, On the one hand, the distribution of the various film layers on the housing assembly 100 can be made uniform, and the visual effect is excellent; when the required housing assembly 100 is in the shape of a flat plate, the transparent substrate 10 of the required shape can be directly provided, and then each film layer For the preparation of, it is also possible to form each film layer on the transparent substrate 10, and then perform hot press forming.
在本申请中,光学膜层20的形成方法不受特别限制,例如可以通过物理气相沉积法形成,也可以通过真空镀膜法形成。在一实施例中,光学膜层20通过真空不导电电镀工艺形成。在本申请中,光学膜层20的材质包括TiO 2、NbO 2、Nb 2O 3、Nb 2O 2、Nb 2O 5、SiO 2和ZrO 2或者其他不导电氧化物中的至少一种。可选的,光学膜层20的厚度为80nm-500nm。在一实施例中,操作101还包括在透明衬底10表面丝印图案。具体的,可以但不限于丝印商标图案(Logo)、文字等,提高壳体组件100的视觉效果。 In the present application, the method of forming the optical film layer 20 is not particularly limited. For example, it may be formed by a physical vapor deposition method or a vacuum coating method. In one embodiment, the optical film layer 20 is formed by a vacuum non-conductive electroplating process. In the present application, the material of the optical film layer 20 includes at least one of TiO 2 , NbO 2 , Nb 2 O 3 , Nb 2 O 2 , Nb 2 O 5 , SiO 2 and ZrO 2 or other non-conductive oxides. Optionally, the thickness of the optical film layer 20 is 80 nm-500 nm. In an embodiment, operation 101 further includes silk-printing a pattern on the surface of the transparent substrate 10. Specifically, the visual effect of the housing assembly 100 can be improved by, but not limited to, silk-screened logos, texts, and the like.
操作102:在所述光学膜层远离所述透明衬底的表面成型第一颜色层,所述第一颜色层具有镂空部,所述第一颜色层的光学透过率小于10%。Operation 102: forming a first color layer on the surface of the optical film layer away from the transparent substrate, the first color layer has a hollow portion, and the optical transmittance of the first color layer is less than 10%.
在操作102中,可以通过胶印、丝印、打印和热转印中至少一种工艺成型第一颜色层30,例如可以通过丝印控制第一颜色层30材料的位置,直接形成具有镂空部的第一颜色层30;也可以在光学膜层20的表面涂覆整层的第一颜色层30材料,经固化后通过刻蚀处理形成镂空部;还可以预先在光学膜层20上设置掩膜板,直接丝印形成具有镂空部的第一颜色层30。在一实施例中,可以通过控制菲林片来控制镂空部的形成,以在光学膜层20上成型具有镂空部的第一颜色层30。在一具体实施例中,控制丝印的菲林片图案,在光学膜层20上涂覆4μm-8μm厚的颜色油墨,在60℃-90℃烘烤30min-60min后形成具有镂空部的第一颜色层30。进一步的,在65℃-90℃烘烤30min-50min后形成具有镂空部的第一颜色层30。In operation 102, the first color layer 30 can be formed by at least one of offset printing, silk screen printing, printing and thermal transfer. For example, the position of the material of the first color layer 30 can be controlled by silk screen printing to directly form the first color layer 30 with a hollow part. Color layer 30; it is also possible to coat a whole layer of the first color layer 30 material on the surface of the optical film layer 20, and form a hollow part by etching after curing; it is also possible to pre-set a mask on the optical film layer 20, Direct silk-printing forms the first color layer 30 with a hollow part. In an embodiment, the formation of the hollow part can be controlled by controlling the film, so as to form the first color layer 30 with the hollow part on the optical film layer 20. In a specific embodiment, the silk-screened film pattern is controlled, the optical film layer 20 is coated with a 4 μm-8 μm thick color ink, and the first color with a hollow part is formed after baking at 60° C.-90° C. for 30 min-60 min. Layer 30. Further, after baking at 65° C.-90° C. for 30 min-50 min, the first color layer 30 with the hollow part is formed.
操作103:在所述第一颜色层远离所述光学膜层的表面成型修饰层,所述修饰层部分设置在所述第一颜色层远离所述光学膜层的表面,部分设置在所述镂空部露出的所述光学膜层的表面,所述修饰层包括第二颜色层和设置在所述第二颜色层表面的镀膜层,所述第二颜色层41靠近所述光学膜层20且光学透过率大于30%,或者所述镀膜层42靠近所述光学膜层20且光学透过率大于30%,所述第二颜色层和所述第一颜色层的颜色不同。Operation 103: molding a modified layer on the surface of the first color layer away from the optical film layer, the modified layer is partially disposed on the surface of the first color layer away from the optical film layer, and partially disposed on the hollow Part of the exposed surface of the optical film layer, the modification layer includes a second color layer and a coating layer disposed on the surface of the second color layer, the second color layer 41 is close to the optical film layer 20 and is optically The transmittance is greater than 30%, or the coating layer 42 is close to the optical film layer 20 and the optical transmittance is greater than 30%, the second color layer and the first color layer have different colors.
在操作103中,修饰层40包括第二颜色层41和镀膜层42。可以通过胶印、丝印、打印和热转印中至少一种工艺成型第二颜色层41。在一具体实施例中,通过丝印4μm-8μm厚的颜色油墨,在60℃-90℃烘烤30min-60min后形成第二颜色层41。进一步的,在70℃-85℃烘烤35min-55min后形成第二颜色层41。在一实施例中,镀膜层42的材质包括In、Sn、TiO 2、NbO 2、Nb 2O 3、Nb 2O 2、Nb 2O 5、SiO 2和ZrO 2或者其他不导电氧化物中的至少一种。进一步的,镀膜层42的材质为In-Sn,产生高反射率的金属质感效果。在本申请中,镀膜层42的形成方法不受特别限制,例如可以通过物理气相沉积法形成,也可以通 过真空镀膜法形成。镀膜设备可以为磁控溅射炉或者电子枪蒸发镀。在一实施例中,镀膜层42通过真空不导电电镀工艺形成。 In operation 103, the modification layer 40 includes a second color layer 41 and a plating layer 42. The second color layer 41 may be formed by at least one process of offset printing, silk screen printing, printing, and thermal transfer. In a specific embodiment, the second color layer 41 is formed by silk-screening a color ink with a thickness of 4 μm-8 μm and baking at 60° C.-90° C. for 30 min-60 min. Further, the second color layer 41 is formed after baking at 70° C.-85° C. for 35 min-55 min. In an embodiment, the material of the coating layer 42 includes In, Sn, TiO 2 , NbO 2 , Nb 2 O 3 , Nb 2 O 2 , Nb 2 O 5 , SiO 2 and ZrO 2 or other non-conductive oxides. At least one. Further, the material of the coating layer 42 is In-Sn, which produces a metallic texture effect with high reflectivity. In the present application, the method of forming the coating layer 42 is not particularly limited. For example, it can be formed by a physical vapor deposition method or a vacuum coating method. The coating equipment can be a magnetron sputtering furnace or an electron gun evaporation coating. In one embodiment, the coating layer 42 is formed by a vacuum non-conductive electroplating process.
在本申请壳体组件100的制备方法中,通过制备具有镂空部的第一颜色层30,以使得后续第二颜色层41的制备可以无需进行套印的操作,避免了套印产生的颜色分界线明显、或发生错位等问题,避免产生外观视觉效果不协调的情况,使得撞色区域颜色搭接自然,实现了无缝搭接,提高外观表现力。In the manufacturing method of the housing assembly 100 of the present application, the first color layer 30 with the hollow part is prepared, so that the subsequent preparation of the second color layer 41 can be made without overprinting, which avoids the obvious color boundary line caused by overprinting. , Or occurrence of misalignment and other problems, to avoid the appearance of inconsistent visual effects, so that the color overlap in the color collision area is natural, seamless overlap is realized, and the appearance expressiveness is improved.
请参阅图13,图13为本申请另一实施例的壳体组件100的制备方法的流程示意图,包括如下步骤:Please refer to FIG. 13. FIG. 13 is a schematic flowchart of a manufacturing method of the housing assembly 100 according to another embodiment of the application, including the following steps:
操作201:在所述透明衬底的表面成型修饰层,所述修饰层包括第二颜色层和设置在所述第二颜色层表面的镀膜层。Operation 201: forming a modified layer on the surface of the transparent substrate, the modified layer including a second color layer and a coating layer provided on the surface of the second color layer.
在操作201中,与操作101不同的是在透明衬底10上成型修饰层40,修饰层40包括了第二颜色层41和镀膜层42。可以通过胶印、丝印、打印和热转印中至少一种工艺成型第二颜色层41。可以通过物理气相沉积法,也可以通过真空镀膜法形成镀膜层42。具体的,在修饰层40中远离透明衬底10的表面具有凸起结构,即修饰层40远离透明衬底10的表面不平整,可以通过控制成型工艺,例如胶印、丝印、打印和热转印、沉积、蒸镀等直接制得具有凸起结构的平面,也可以在成型修饰层40后,对修饰层40远离透明衬底10的表面进行刻蚀,以形成凸起结构。In operation 201, the difference from operation 101 is that a modification layer 40 is formed on the transparent substrate 10, and the modification layer 40 includes a second color layer 41 and a coating layer 42. The second color layer 41 may be formed by at least one process of offset printing, silk screen printing, printing, and thermal transfer. The coating layer 42 can be formed by a physical vapor deposition method or a vacuum coating method. Specifically, the surface of the modified layer 40 away from the transparent substrate 10 has a convex structure, that is, the surface of the modified layer 40 away from the transparent substrate 10 is uneven. The molding process can be controlled, such as offset printing, silk screen printing, printing, and thermal transfer. , Deposition, evaporation, etc., directly produce a plane with raised structures. Alternatively, after the modified layer 40 is formed, the surface of the modified layer 40 away from the transparent substrate 10 may be etched to form the raised structure.
操作202:在所述修饰层远离所述透明衬底的表面成型第一颜色层,所述第一颜色层具有镂空部,所述修饰层部分填充所述镂空部,所述第一颜色层和所述第二颜色层的颜色不同,所述第一颜色层的光学透过率小于10%。Operation 202: forming a first color layer on the surface of the modification layer away from the transparent substrate, the first color layer has a hollow part, the modification layer partially fills the hollow part, the first color layer and The colors of the second color layer are different, and the optical transmittance of the first color layer is less than 10%.
在操作202中,成型的第一颜色层30具有镂空部。具体的,修饰层40远离透明衬底10的表面具有凸起结构,通过控制制备工艺,使得第一颜色层30成型在修饰层40远离透明衬底10的表面,且成型后的第一颜色层30的表面与凸起结构的表面齐平。具体的,可以通过胶印、丝印、打印和热转印中至少一种工艺成型第一颜色层30。In operation 202, the formed first color layer 30 has a hollow portion. Specifically, the surface of the modified layer 40 away from the transparent substrate 10 has a convex structure. By controlling the preparation process, the first color layer 30 is formed on the surface of the modified layer 40 away from the transparent substrate 10, and the formed first color layer The surface of 30 is flush with the surface of the raised structure. Specifically, the first color layer 30 can be formed by at least one of offset printing, silk screen printing, printing, and thermal transfer.
操作203:在所述第一颜色层和所述镂空部露出的所述修饰层的表面成型光学膜层,所述第二颜色层41靠近所述光学膜层20且光学透过率大于30%,或者所述镀膜层42靠近所述光学膜层20且光学透过率大于30%。Operation 203: forming an optical film layer on the surface of the first color layer and the modified layer exposed by the hollow portion, the second color layer 41 is close to the optical film layer 20 and the optical transmittance is greater than 30% , Or the coating layer 42 is close to the optical film layer 20 and the optical transmittance is greater than 30%.
在操作203中,光学膜层20的形成方法不受特别限制,例如可以通过物理气相沉积法形成,也可以通过真空镀膜法形成。在一实施例中,光学膜层20通过真空不导电电镀(NVCM)工艺形成。In operation 203, the method of forming the optical film layer 20 is not particularly limited. For example, it may be formed by a physical vapor deposition method, or may be formed by a vacuum coating method. In one embodiment, the optical film layer 20 is formed by a vacuum non-conductive electroplating (NVCM) process.
在本申请一实施例中,修饰层40的制备方法包括在镂空部露出的光学膜层20的表面成型第二颜色层41,第二颜色层41的光学透过率大于30%;在第二颜色层41的表面成型镀膜层42,镀膜层42在光学膜层20上的正投影完全覆盖镂空区在光学膜层20上的正投影。在本申请另一实施例中,修饰层40的制备方法包括在镂空部露出的光学膜层20的表面成型镀膜层42,镀膜层42的光学透过率大于30%;在镀膜层42的表面成型第二颜色层41,第二颜色层41在光学膜层20上的正投影完全覆盖镂空区在光学膜层20上的正投影。在本申请一实施例中,修饰层40的制备方法还包括在镀膜层42靠近光学膜层20的表面成型第二纹理层43。可以但不限于通过UV转印光学纹理处理在镀膜层42上形成第二纹理层43。可选的,通过高抗刮型UV转印胶、高硬度型UV转印胶、高弹性型UV转印胶或通用型UV转印胶在镀膜层42上形成第二纹理层43。具体的,UV转印胶的材质包括聚氨酯丙烯酸树脂等。具体的,将UV转印胶涂覆后经固化形成第二纹理层43。可选的,固化包括在LED或汞灯固化,其中,LED固化能量800mJ/cm 2-2500mJ/cm 2,汞灯固化能量550mJ/cm 2-1500mJ/cm 2。进一步的,LED固化能量1000mJ/cm 2-2000mJ/cm 2,汞灯固化能量600mJ/cm 2-1200mJ/cm 2In an embodiment of the present application, the preparation method of the modified layer 40 includes forming a second color layer 41 on the surface of the optical film layer 20 exposed at the hollow portion, and the optical transmittance of the second color layer 41 is greater than 30%; A coating layer 42 is formed on the surface of the color layer 41, and the orthographic projection of the coating layer 42 on the optical film layer 20 completely covers the orthographic projection of the hollow area on the optical film layer 20. In another embodiment of the present application, the preparation method of the modified layer 40 includes forming a coating layer 42 on the surface of the optical film layer 20 exposed at the hollow portion, and the optical transmittance of the coating layer 42 is greater than 30%; on the surface of the coating layer 42 The second color layer 41 is formed, and the orthographic projection of the second color layer 41 on the optical film layer 20 completely covers the orthographic projection of the hollow area on the optical film layer 20. In an embodiment of the present application, the preparation method of the modification layer 40 further includes forming a second texture layer 43 on the surface of the coating layer 42 close to the optical film layer 20. The second texture layer 43 can be formed on the coating layer 42 through UV transfer optical texture processing, but is not limited to. Optionally, the second texture layer 43 is formed on the coating layer 42 by a high-scratch-resistant UV transfer glue, a high-hardness UV transfer glue, a high-elastic UV transfer glue or a general-purpose UV transfer glue. Specifically, the material of the UV transfer adhesive includes polyurethane acrylic resin and the like. Specifically, the UV transfer glue is coated and cured to form the second texture layer 43. Alternatively, curing comprises curing the LED or a mercury lamp, wherein, LED curing energy 800mJ / cm 2 -2500mJ / cm 2 , a mercury lamp curing energy 550mJ / cm 2 -1500mJ / cm 2 . Further, LED curing energy 1000mJ / cm 2 -2000mJ / cm 2 , a mercury lamp curing energy 600mJ / cm 2 -1200mJ / cm 2 .
在本申请一实施例中,壳体组件100的制备方法还包括在光学膜层20远离修饰层40 的表面成型第一纹理层50。可以但不限于通过UV转印光学纹理处理成型第一纹理层50。可选的,通过高抗刮型UV转印胶、高硬度型UV转印胶、高弹性型UV转印胶或通用型UV转印胶在光学膜层20上形成第一纹理层50。具体的,UV转印胶的材质包括聚氨酯丙烯酸树脂等。具体的,将UV转印胶涂覆后经固化形成第一纹理层50。可选的,固化包括在LED或汞灯固化,其中,LED固化能量800mJ/cm 2-2500mJ/cm 2,汞灯固化能量550mJ/cm 2-1500mJ/cm 2。进一步的,LED固化能量900mJ/cm 2-2200mJ/cm 2,汞灯固化能量600mJ/cm 2-1000mJ/cm 2。第一纹理层50的纹理可以但不限于为纳米级的幻彩细纹理,提高壳体组件100的视觉效果。 In an embodiment of the present application, the manufacturing method of the housing assembly 100 further includes forming the first texture layer 50 on the surface of the optical film layer 20 away from the modification layer 40. The first texture layer 50 can be formed but not limited to UV transfer optical texture processing. Optionally, the first texture layer 50 is formed on the optical film layer 20 by a high-scratch-resistant UV transfer glue, a high-hardness UV transfer glue, a high-elastic UV transfer glue or a general-purpose UV transfer glue. Specifically, the material of the UV transfer adhesive includes polyurethane acrylic resin and the like. Specifically, the UV transfer glue is coated and cured to form the first texture layer 50. Alternatively, curing comprises curing the LED or a mercury lamp, wherein, LED curing energy 800mJ / cm 2 -2500mJ / cm 2 , a mercury lamp curing energy 550mJ / cm 2 -1500mJ / cm 2 . Further, LED curing energy 900mJ / cm 2 -2200mJ / cm 2 , a mercury lamp curing energy 600mJ / cm 2 -1000mJ / cm 2 . The texture of the first texture layer 50 can be, but is not limited to, a nano-level illusion fine texture, which improves the visual effect of the housing assembly 100.
在本申请一实施例中,当成型第一纹理层50和第二纹理层43时,无需进行套印等操作,两个纹理层的效果均可以很好的成型在壳体组件100上,避免套印产生的界限明显、搭接线不良等问题,提高壳体组件100的视觉效果。In an embodiment of the present application, when forming the first texture layer 50 and the second texture layer 43, there is no need to perform operations such as overprinting, and the effects of the two texture layers can be well formed on the housing assembly 100, avoiding overprinting. The resulting problems such as obvious boundaries and poor bonding wires can improve the visual effect of the housing assembly 100.
当光学膜层20在透明衬底10和修饰层40之间时,在本申请一实施例中,壳体组件100的制备方法还包括在光学膜层20和透明衬底10之间成型连接层60。连接层60用于连接透明衬底10和光学膜层20。连接层60的材质可以但不限于为紫外光固化胶。在一实施例中,淋涂紫外光固化胶,经固化后形成连接层60。具体的,固化能量可以为400mJ/cm 2-1200mJ/cm 2。在本申请另一实施例中,壳体组件100的制备方法还包括在透明衬底10远离光学膜层20的表面成型保护层70。在一实施例中,保护层70包括硬化层和抗指纹层。在一实施例中,淋涂紫外光固化胶,经固化后形成硬化层。具体的,固化能量可以为400mJ/cm 2-1200mJ/cm 2。可选的,硬化层的表面硬度为3H-6H,进而可以对壳体组件100中的膜层结构起到一定的保护作用。抗指纹层具有防污、防指纹附着的作用。具体的,抗指纹层表面的接触角可以但不限于为大于105°,有利于提高防指纹、污染物附着表面的能力。在本申请另一实施例中,壳体组件100的制备方法还包括在修饰层40远离透明衬底10的表面成型遮光层80。可以包括但不限于通过丝网印刷或喷墨打印形成。具体的,可以通过多次涂覆等方式,以防止漏光,提高遮挡效果。 When the optical film layer 20 is between the transparent substrate 10 and the modification layer 40, in an embodiment of the present application, the method for preparing the housing assembly 100 further includes forming a connecting layer between the optical film layer 20 and the transparent substrate 10 60. The connection layer 60 is used to connect the transparent substrate 10 and the optical film layer 20. The material of the connection layer 60 can be, but is not limited to, a UV curable glue. In one embodiment, the UV curable adhesive is spray coated, and the connection layer 60 is formed after curing. Specifically, the curing energy may be 400 mJ/cm 2 -1200 mJ/cm 2 . In another embodiment of the present application, the manufacturing method of the housing assembly 100 further includes forming a protective layer 70 on the surface of the transparent substrate 10 away from the optical film layer 20. In one embodiment, the protective layer 70 includes a hardened layer and an anti-fingerprint layer. In one embodiment, the UV curable adhesive is spray coated and cured to form a hardened layer. Specifically, the curing energy may be 400 mJ/cm 2 -1200 mJ/cm 2 . Optionally, the surface hardness of the hardened layer is 3H-6H, which can further protect the film structure in the housing assembly 100 to a certain extent. The anti-fingerprint layer has the functions of anti-fouling and anti-fingerprint adhesion. Specifically, the contact angle of the surface of the anti-fingerprint layer can be, but is not limited to, greater than 105°, which is beneficial to improve the ability of preventing fingerprints and contaminants from adhering to the surface. In another embodiment of the present application, the manufacturing method of the housing assembly 100 further includes forming a light-shielding layer 80 on the surface of the modification layer 40 away from the transparent substrate 10. It may include but is not limited to being formed by screen printing or inkjet printing. Specifically, multiple coatings can be used to prevent light leakage and improve the shielding effect.
当修饰层40在透明衬底10和光学膜层20之间时,在本申请一实施例中,壳体组件100的制备方法还包括在修饰层40和透明衬底10之间成型连接层60。在本申请另一实施例中,壳体组件100的制备方法还包括在光学膜层20远离透明衬底10的表面成型保护层70。在一实施例中,保护层70包括硬化层和抗指纹层。在本申请另一实施例中,壳体组件100的制备方法还包括在透明衬底10远离修饰层40的表面成型遮光层80。连接层60、保护层70和遮光层80的选择以及制备方法可以在上述相关描述中进行选择,对此不作限定。When the modification layer 40 is between the transparent substrate 10 and the optical film layer 20, in an embodiment of the present application, the method for preparing the housing assembly 100 further includes forming a connecting layer 60 between the modification layer 40 and the transparent substrate 10 . In another embodiment of the present application, the manufacturing method of the housing assembly 100 further includes forming a protective layer 70 on the surface of the optical film layer 20 away from the transparent substrate 10. In one embodiment, the protective layer 70 includes a hardened layer and an anti-fingerprint layer. In another embodiment of the present application, the manufacturing method of the housing assembly 100 further includes forming a light-shielding layer 80 on the surface of the transparent substrate 10 away from the modification layer 40. The selection and preparation method of the connection layer 60, the protection layer 70 and the light shielding layer 80 can be selected in the above related description, and there is no limitation on this.
在本申请一实施例中,壳体组件100的制备方法还包括对壳体组件100进行计算机数字化控制精密机械加工(CNC加工)。CNC加工可以铣去多余的边角料,获得最终所需组装配合尺寸的壳体组件100。In an embodiment of the present application, the method for preparing the housing assembly 100 further includes performing computer digital control precision machining (CNC processing) on the housing assembly 100. CNC machining can mill off the excess leftover material to obtain the final housing assembly 100 with a matching size to be assembled.
本申请还提供了一种电子设备,包括上述任一实施例的壳体组件100。可以理解的,电子设备可以但不限于为手机、平板电脑、笔记本电脑、手表、MP3、MP4、GPS导航仪、数码相机等。下面以手机为例进行说明。The present application also provides an electronic device, including the housing assembly 100 of any of the above embodiments. It is understandable that electronic devices can be, but are not limited to, mobile phones, tablet computers, notebook computers, watches, MP3, MP4, GPS navigators, digital cameras, and the like. Let's take a mobile phone as an example for description.
请参阅图14,图14为本申请另一实施例的电子设备的结构示意图,电子设备包括显示屏200,以及设置在显示屏200相对两侧的盖板300和壳体组件100,壳体组件100包括透明衬底10和设置在透明衬底10上的光学膜层20、第一颜色层30和修饰层40;第一颜色层30设置在光学膜层20的表面,第一颜色层30具有镂空部;修饰层40部分设置在第一颜色层30远离光学膜层20的表面,部分设置在镂空部露出的光学膜层20的表面,修饰层40包括第二颜色层41和设置在第二颜色层41表面的镀膜层42,所述第二颜色层41靠近所述光学膜层20且光学透过率大于30%,或者所述镀膜层42靠近所述光学膜层20且光学透过率大于30%,第一颜色层30的光学透过率小于10%,第二颜色层41和第一 颜色层30的颜色不同,壳体组件100具有相对设置的内表面和外表面,光学膜层20至修饰层40的方向与外表面至内表面的方向一致。可以理解的,壳体组件100具有相对设置的内表面和外表面,其中,内表面和外表面是以壳体组件100的使用状态为参照。壳体组件100应用于电子设备,朝向电子设备内部的一面为内表面,朝向电子设备外部的一面为外表面。在镂空部对应的壳体组件100的外表面处呈现了光学膜层20、第二颜色层41和镀膜层42叠加的视觉效果,其他位置呈现了光学膜层20和第一颜色层30叠加的视觉效果,撞色区域实现了无缝搭接,外观效果优异,使得电子设备呈现不同颜色和质感的外观,形成明显的撞色效果,丰富电子设备的外观表现力。Please refer to FIG. 14, which is a schematic structural diagram of an electronic device according to another embodiment of the application. The electronic device includes a display screen 200, and a cover 300 and a housing assembly 100 disposed on opposite sides of the display screen 200. The housing assembly 100 includes a transparent substrate 10 and an optical film layer 20, a first color layer 30, and a modification layer 40 disposed on the transparent substrate 10; the first color layer 30 is disposed on the surface of the optical film layer 20, and the first color layer 30 has Hollowed part; the modification layer 40 is partly arranged on the surface of the first color layer 30 away from the optical film layer 20, and partly arranged on the surface of the optical film layer 20 exposed in the hollow part. The modification layer 40 includes a second color layer 41 and arranged on the second color layer 41. The coating layer 42 on the surface of the color layer 41, the second color layer 41 is close to the optical film layer 20 and has an optical transmittance greater than 30%, or the coating layer 42 is close to the optical film layer 20 and has an optical transmittance Greater than 30%, the optical transmittance of the first color layer 30 is less than 10%, the second color layer 41 and the first color layer 30 have different colors, the housing assembly 100 has opposite inner and outer surfaces, and the optical film layer The direction from 20 to the modification layer 40 is consistent with the direction from the outer surface to the inner surface. It can be understood that the housing assembly 100 has an inner surface and an outer surface that are opposed to each other, wherein the inner surface and the outer surface are based on the use state of the housing assembly 100. The housing assembly 100 is applied to an electronic device, and the side facing the inside of the electronic device is the inner surface, and the side facing the outside of the electronic device is the outer surface. On the outer surface of the housing assembly 100 corresponding to the hollow part, the visual effect of the superposition of the optical film layer 20, the second color layer 41 and the coating layer 42 is presented, and the superposition of the optical film layer 20 and the first color layer 30 is presented in other positions. For visual effects, the color collision area is seamlessly overlapped, and the appearance effect is excellent, so that the electronic device presents the appearance of different colors and textures, forming an obvious color collision effect, and enriching the appearance of the electronic device.
以上对本申请实施方式所提供的内容进行了详细介绍,本文对本申请的原理及实施方式进行了阐述与说明,以上说明只是用于帮助理解本申请的方法及其核心思想;同时,对于本领域的一般技术人员,依据本申请的思想,在具体实施方式及应用范围上均会有改变之处,综上所述,本说明书内容不应理解为对本申请的限制。The above provides a detailed introduction to the content provided by the implementation of the application. This article explains and explains the principles and implementations of the application. The above description is only used to help understand the methods and core ideas of the application; at the same time, for the field General technical personnel, based on the idea of this application, will have changes in the specific implementation and scope of application. In summary, the content of this specification should not be construed as a limitation to this application.

Claims (20)

  1. 一种壳体组件,其特征在于,包括透明衬底和设置在所述透明衬底上的光学膜层、第一颜色层和修饰层;A housing assembly, which is characterized by comprising a transparent substrate and an optical film layer, a first color layer and a modification layer arranged on the transparent substrate;
    所述第一颜色层设置在所述光学膜层的表面,所述第一颜色层具有镂空部;The first color layer is arranged on the surface of the optical film layer, and the first color layer has a hollow part;
    所述修饰层部分设置在所述第一颜色层远离所述光学膜层的表面,部分设置在所述镂空部露出的所述光学膜层的表面,所述修饰层包括第二颜色层和设置在所述第二颜色层表面的镀膜层,所述第二颜色层靠近所述光学膜层且光学透过率大于30%,或者所述镀膜层靠近所述光学膜层且光学透过率大于30%,所述第一颜色层的光学透过率小于10%,所述第一颜色层和所述第二颜色层的颜色不同。The modification layer is partly arranged on the surface of the first color layer away from the optical film layer, and partly arranged on the surface of the optical film layer exposed by the hollow part, and the modification layer includes a second color layer and The coating layer on the surface of the second color layer, the second color layer is close to the optical film layer and the optical transmittance is greater than 30%, or the coating layer is close to the optical film layer and the optical transmittance is greater than 30%, the optical transmittance of the first color layer is less than 10%, and the colors of the first color layer and the second color layer are different.
  2. 如权利要求1所述的壳体组件,其特征在于,所述光学膜层设置在所述透明衬底的表面,所述第一颜色层和所述修饰层设置在所述光学膜层远离所述透明衬底的表面。The housing assembly according to claim 1, wherein the optical film layer is disposed on the surface of the transparent substrate, and the first color layer and the modification layer are disposed on the optical film layer away from the surface of the transparent substrate. The surface of the transparent substrate.
  3. 如权利要求1所述的壳体组件,其特征在于,所述修饰层设置在所述透明衬底的表面,所述光学膜层和所述第一颜色层设置在所述修饰层远离所述透明衬底的表面。The housing assembly of claim 1, wherein the modification layer is disposed on the surface of the transparent substrate, and the optical film layer and the first color layer are disposed on the modification layer away from the The surface of the transparent substrate.
  4. 如权利要求1所述的壳体组件,其特征在于,还包括第一纹理层,所述第一纹理层设置在所述光学膜层远离所述修饰层的表面。The housing assembly of claim 1, further comprising a first texture layer, the first texture layer being disposed on a surface of the optical film layer away from the modification layer.
  5. 如权利要求4所述的壳体组件,其特征在于,所述第一纹理层的光学透过率大于30%,所述第一纹理层的厚度可以为5μm-15μm。The housing assembly of claim 4, wherein the optical transmittance of the first texture layer is greater than 30%, and the thickness of the first texture layer may be 5 μm-15 μm.
  6. 如权利要求1所述的壳体组件,其特征在于,所述修饰层还包括第二纹理层,所述第二纹理层设置在所述镀膜层靠近所述光学膜层的表面。The housing assembly of claim 1, wherein the modification layer further comprises a second texture layer, and the second texture layer is disposed on a surface of the coating layer close to the optical film layer.
  7. 如权利要求6所述的壳体组件,其特征在于,所述第二纹理层的光学透过率大于30%,所述第二纹理层的厚度为5μm-15μm。The housing assembly of claim 6, wherein the optical transmittance of the second texture layer is greater than 30%, and the thickness of the second texture layer is 5 μm-15 μm.
  8. 如权利要求6所述的壳体组件,其特征在于,所述第二纹理层设置在所述镂空部对应的修饰层表面。7. The housing assembly of claim 6, wherein the second texture layer is disposed on the surface of the modification layer corresponding to the hollow portion.
  9. 如权利要求6所述的壳体组件,其特征在于,所述第二纹理层在所述镀膜层上的正投影完全覆盖所述镂空部在所述镀膜层上的正投影,并且部分覆盖所述第一颜色层在所述镀膜层的正投影。The housing assembly of claim 6, wherein the orthographic projection of the second texture layer on the coating layer completely covers the orthographic projection of the hollow portion on the coating layer, and partially covers all The orthographic projection of the first color layer on the coating layer.
  10. 如权利要求1所述的壳体组件,其特征在于,所述光学膜层的材质包括TiO 2、NbO 2、Nb 2O 3、Nb 2O 2、Nb 2O 5、SiO 2和ZrO 2中的至少一种。 The housing assembly of claim 1, wherein the material of the optical film layer includes TiO 2 , NbO 2 , Nb 2 O 3 , Nb 2 O 2 , Nb 2 O 5 , SiO 2 and ZrO 2 At least one of.
  11. 如权利要求1所述的壳体组件,其特征在于,所述光学膜层由至少两种具有不同折射率的光学薄膜交替层叠形成,所述光学膜层的厚度为80nm-500nm。The housing assembly of claim 1, wherein the optical film layer is formed by alternately laminating at least two optical films with different refractive indexes, and the thickness of the optical film layer is 80 nm-500 nm.
  12. 如权利要求1所述的壳体组件,其特征在于,所述镀膜层的材质包括In、Sn、TiO 2、NbO 2、Nb 2O 3、Nb 2O 2、Nb 2O 5、SiO 2和ZrO 2中的至少一种,所述镀膜层的厚度为20nm-500nm。 The housing assembly of claim 1, wherein the material of the coating layer includes In, Sn, TiO 2 , NbO 2 , Nb 2 O 3 , Nb 2 O 2 , Nb 2 O 5 , SiO 2 and at least one of ZrO 2, the thickness of the plated layer is 20nm-500nm.
  13. 如权利要求12所述的壳体组件,其特征在于,所述镀膜层由至少两种具有不同折射率的薄膜周期性地交替层叠形成。The housing assembly of claim 12, wherein the coating layer is formed by periodically alternately laminating at least two kinds of films with different refractive indexes.
  14. 如权利要求1所述的壳体组件,其特征在于,所述透明衬底的材质包括聚碳酸酯、聚甲基丙烯酸甲酯、聚对苯二甲酸乙二醇酯和热塑性聚氨酯的至少一种,所述透明衬底的厚度为0.05mm-0.8mm。The housing assembly of claim 1, wherein the material of the transparent substrate comprises at least one of polycarbonate, polymethyl methacrylate, polyethylene terephthalate, and thermoplastic polyurethane , The thickness of the transparent substrate is 0.05mm-0.8mm.
  15. 一种壳体组件的制备方法,其特征在于,包括:A method for preparing a housing assembly, which is characterized in that it comprises:
    提供透明衬底,在所述透明衬底上成型光学膜层、第一颜色层和修饰层,其中,所述第一颜色层设置在所述光学膜层的表面,所述第一颜色层具有镂空部;所述修饰层部分设置在所述第一颜色层远离所述光学膜层的表面,部分设置在所述镂空部露出的所述光学膜层的表面,所述修饰层包括第二颜色层和设置在所述第二颜色层表面的镀膜层,所述第二颜色层靠近所述光学膜层且光学透过率大于30%,或者所述镀膜层靠近所述光学膜层且光学透光率大于30%,所述第一颜色层的光学透过率小于10%,所述第二颜色层和所述第一颜色层的颜色不同。A transparent substrate is provided, and an optical film layer, a first color layer and a modified layer are formed on the transparent substrate, wherein the first color layer is disposed on the surface of the optical film layer, and the first color layer has Hollow part; the modification layer is partly arranged on the surface of the first color layer away from the optical film layer, and partly arranged on the surface of the optical film layer exposed by the hollow part, the modification layer includes a second color Layer and a coating layer disposed on the surface of the second color layer, the second color layer is close to the optical film layer and the optical transmittance is greater than 30%, or the coating layer is close to the optical film layer and is optically transparent The light rate is greater than 30%, the optical transmittance of the first color layer is less than 10%, and the colors of the second color layer and the first color layer are different.
  16. 如权利要求15所述的制备方法,其特征在于,包括:The preparation method according to claim 15, characterized in that it comprises:
    在所述透明衬底的表面成型光学膜层;Forming an optical film layer on the surface of the transparent substrate;
    在所述光学膜层远离所述透明衬底的表面成型第一颜色层,所述第一颜色层具有镂空部,所述第一颜色层的光学透过率小于10%;Forming a first color layer on the surface of the optical film layer away from the transparent substrate, the first color layer has a hollow portion, and the optical transmittance of the first color layer is less than 10%;
    在所述第一颜色层远离所述光学膜层的表面成型修饰层,所述修饰层部分设置在所述第一颜色层远离所述光学膜层的表面,部分设置在所述镂空部露出的所述光学膜层的表面,所述修饰层包括第二颜色层和设置在所述第二颜色层表面的镀膜层,所述第二颜色层靠近所述光学膜层且光学透过率大于30%,或者所述镀膜层靠近所述光学膜层且光学透过率大于30%,所述第二颜色层和所述第一颜色层的颜色不同。A modification layer is formed on the surface of the first color layer away from the optical film layer, and the modification layer is partly disposed on the surface of the first color layer away from the optical film layer, and partly disposed on the exposed surface of the hollow part. The surface of the optical film layer, the modification layer includes a second color layer and a coating layer disposed on the surface of the second color layer, the second color layer is close to the optical film layer and has an optical transmittance greater than 30 %, or the coating layer is close to the optical film layer and the optical transmittance is greater than 30%, and the colors of the second color layer and the first color layer are different.
  17. 如权利要求15所述的制备方法,其特征在于,包括:The preparation method according to claim 15, characterized in that it comprises:
    在所述透明衬底的表面成型修饰层,所述修饰层包括第二颜色层和设置在所述第二颜色层表面的镀膜层;Forming a modification layer on the surface of the transparent substrate, the modification layer including a second color layer and a coating layer provided on the surface of the second color layer;
    在所述修饰层远离所述透明衬底的表面成型第一颜色层,所述第一颜色层具有镂空部,所述修饰层部分填充所述镂空部,所述第一颜色层和所述第二颜色层的颜色不同,所述第一颜色层的光学透过率小于10%;A first color layer is formed on the surface of the modification layer away from the transparent substrate, the first color layer has a hollow portion, the modification layer partially fills the hollow portion, the first color layer and the first color layer The colors of the two color layers are different, and the optical transmittance of the first color layer is less than 10%;
    在所述第一颜色层和所述镂空部露出的所述修饰层的表面成型光学膜层,所述第二颜色层靠近所述光学膜层且光学透过率大于30%,或者所述镀膜层靠近所述光学膜层且光学透过率大于30%。An optical film layer is formed on the surface of the first color layer and the modified layer exposed by the hollow portion, the second color layer is close to the optical film layer and the optical transmittance is greater than 30%, or the coating The layer is close to the optical film layer and the optical transmittance is greater than 30%.
  18. 如权利要求15所述的制备方法,其特征在于,所述成型修饰层包括:The preparation method according to claim 15, wherein the molding modification layer comprises:
    在所述镂空部露出的所述光学膜层的表面成型第二颜色层;Forming a second color layer on the surface of the optical film layer exposed at the hollow portion;
    在所述第二颜色层的表面成型镀膜层,所述镀膜层在所述光学膜层上的正投影完全覆盖所述镂空区在所述光学膜层上的正投影。A coating layer is formed on the surface of the second color layer, and the orthographic projection of the coating layer on the optical film layer completely covers the orthographic projection of the hollow area on the optical film layer.
  19. 如权利要求15所述的制备方法,其特征在于,所述成型修饰层包括:The preparation method according to claim 15, wherein the molding modification layer comprises:
    在所述镂空部露出的所述光学膜层的表面成型镀膜层;Forming a coating layer on the surface of the optical film layer exposed at the hollow portion;
    在所述镀膜层的表面成型第二颜色层,所述第二颜色层在所述光学膜层上的正投影完全覆盖所述镂空区在所述光学膜层上的正投影。A second color layer is formed on the surface of the coating layer, and the orthographic projection of the second color layer on the optical film layer completely covers the orthographic projection of the hollow area on the optical film layer.
  20. 一种电子设备,其特征在于,包括显示屏,以及设置在所述显示屏相对两侧的盖板和壳体组件,所述壳体组件包括透明衬底和设置在所述透明衬底上的光学膜层、第一颜色层和修饰层;所述第一颜色层设置在所述光学膜层的表面,所述第一颜色层具有镂空部;所述修饰层部分设置在所述第一颜色层远离所述光学膜层的表面,部分设置在所述镂空部露出的所述光学膜层的表面,所述修饰层包括第二颜色层和设置在所述第二颜色层表面的镀膜层,所述第二颜色层靠近所述光学膜层且光学透过率大于30%,或者所述镀膜层靠近所述光学膜层且光学透过率大于30%,所述第一颜色层的光学透过率小于10%,所述第二颜色层和所述第一颜色层的颜色不同,所述壳体组件具有相对设置的内表面和外表面,所述光学膜层至所述修饰层的方向与所述外表面至所述内表面的方向一致。An electronic device, which is characterized in that it comprises a display screen, and a cover plate and a housing assembly arranged on opposite sides of the display An optical film layer, a first color layer and a modified layer; the first color layer is arranged on the surface of the optical film layer, the first color layer has a hollow part; the modification layer is partially arranged in the first color The layer is away from the surface of the optical film layer, and is partially disposed on the surface of the optical film layer exposed by the hollow part. The modification layer includes a second color layer and a coating layer disposed on the surface of the second color layer, The second color layer is close to the optical film layer and the optical transmittance is greater than 30%, or the coating layer is close to the optical film layer and the optical transmittance is greater than 30%, the optical transmittance of the first color layer is The overrate is less than 10%, the colors of the second color layer and the first color layer are different, the housing assembly has opposite inner and outer surfaces, and the direction from the optical film layer to the modification layer It is consistent with the direction from the outer surface to the inner surface.
PCT/CN2020/140883 2019-12-30 2020-12-29 Casing body assembly, casing body assembly preparation method, and electronic device WO2021136273A1 (en)

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