WO2021100369A1 - Chemical polishing agent and chemical polishing method - Google Patents

Chemical polishing agent and chemical polishing method Download PDF

Info

Publication number
WO2021100369A1
WO2021100369A1 PCT/JP2020/038853 JP2020038853W WO2021100369A1 WO 2021100369 A1 WO2021100369 A1 WO 2021100369A1 JP 2020038853 W JP2020038853 W JP 2020038853W WO 2021100369 A1 WO2021100369 A1 WO 2021100369A1
Authority
WO
WIPO (PCT)
Prior art keywords
water
chemical polishing
alkali metal
chemical
aluminum
Prior art date
Application number
PCT/JP2020/038853
Other languages
French (fr)
Japanese (ja)
Inventor
佑也 山口
朋 森口
原　健二
田中　克幸
Original Assignee
奥野製薬工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 奥野製薬工業株式会社 filed Critical 奥野製薬工業株式会社
Priority to JP2021558221A priority Critical patent/JPWO2021100369A1/ja
Priority to CN202080080247.2A priority patent/CN114729459A/en
Publication of WO2021100369A1 publication Critical patent/WO2021100369A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/32—Alkaline compositions
    • C23F1/36—Alkaline compositions for etching aluminium or alloys thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00—Brightening metals by chemical means
    • C23F3/02—Light metals

Definitions

  • the present invention relates to a chemical polishing agent for aluminum or an aluminum alloy, and a chemical polishing method.
  • Aluminum or aluminum alloy is processed to manufacture various articles. Since an oxide film is formed on the surface of aluminum or the like, an etching process is performed to remove the oxide film.
  • a chemical polishing method for aluminum or an aluminum alloy a method using an acidic abrasive containing phosphoric acid is the mainstream (Patent Documents 1 and 2).
  • An object of the present invention is to provide a chemical polishing agent having excellent chemical polishing property and bright treatment property for aluminum or an aluminum alloy, and a chemical polishing method.
  • the present invention includes, for example, the subjects described in the following sections.
  • Item 1. (A) Water, (B) Alkali metal salt and (C) A chemical abrasive for aluminum or an aluminum alloy containing a water-soluble organic solvent or a sugar alcohol having 4 to 9 hydroxyl groups. A chemical abrasive having a mass ratio of the alkali metal salt to water (alkali metal salt / water) of 0.075 or more.
  • Item 2. The chemical polishing agent according to Item 1, wherein the concentration of the alkali metal salt in the chemical polishing agent is 30 g / L or more.
  • Item 3. Item 2.
  • the chemical abrasive according to Item 1 or 2 wherein the volume ratio of the water to the water-soluble organic solvent (water: water-soluble organic solvent) is 10:90 to 90:10.
  • Item 4. Item 2. The chemical polishing agent according to Item 1 or 2, wherein the concentration of the sugar alcohol in the chemical polishing agent is 100 g / L or more.
  • Item 5. Item 2. The chemical abrasive according to any one of Items 1 to 4, wherein the alkali metal salt is an alkali metal hydroxide.
  • Item 7. (A) Water, (B) Alkali metal salt and (C) A method for chemically polishing aluminum or an aluminum alloy, which comprises a step of immersing aluminum or an aluminum alloy in a water-soluble organic solvent or a chemical polishing agent for aluminum or an aluminum alloy containing a sugar alcohol having 4 to 9 hydroxyl groups. There, A chemical polishing method in which the mass ratio of the alkali metal salt to the water (alkali metal salt / water) is 0.075 or more.
  • Item 8. Item 2. The chemical polishing method according to Item 7, wherein the concentration of the alkali metal salt in the chemical polishing agent is 30 g / L or more.
  • Item 10. Item 7.
  • Item 11. Item 8.
  • the chemical polishing method according to any one of Items 7 to 11, wherein the water-soluble organic solvent is at least one selected from the group consisting of a water-soluble organic solvent having 1 to 4 hydroxyl groups and polyglycerin.
  • the chemical polishing agent of the present invention is excellent in chemical polishing property (also called brilliant treatment property) for aluminum or aluminum alloy.
  • chemical polishing method of the present invention can impart excellent brilliance to aluminum or an aluminum alloy.
  • the chemical abrasives included in the present invention are characterized by containing (A) water, (B) alkali metal salts, (C) water-soluble organic solvents, or sugar alcohols having 4 to 9 hydroxyl groups. It is a chemical abrasive.
  • the chemical polishing agent may be referred to as "the chemical polishing agent of the present invention”.
  • the chemical abrasive is sometimes called a brilliant treatment agent.
  • the chemical abrasive of the present invention contains (A) water, (B) an alkali metal salt, and (C) a water-soluble organic solvent, or a sugar alcohol having 4 to 9 hydroxyl groups, thereby forming an aluminum or aluminum alloy surface. Since smoothing is promoted, it is excellent in chemical abrasiveness (brilliant treatment property) with respect to aluminum or aluminum alloy. Therefore, the aluminum or aluminum alloy treated with the chemical abrasive of the present invention has excellent brilliance.
  • alkali metal salt examples include alkali metal hydroxides such as sodium hydroxide, potassium hydroxide and lithium hydroxide; alkali metal carbonates such as sodium carbonate, potassium carbonate and lithium carbonate; sodium hydrogen carbonate and carbonate. Examples thereof include alkali metal bicarbonates such as potassium hydrogen and lithium hydrogen carbonate. Moreover, these hydrates may be used. Among them, alkali metal hydroxides such as sodium hydroxide, potassium hydroxide, and lithium hydroxide are preferable because they are excellent in chemical polishing property (brightness treatment property). Further, the alkali metal salt (B) can be used alone or in combination of two or more.
  • the mass ratio of (A) alkali metal salt to (B) alkali metal salt (alkali metal salt / water) contained in the chemical abrasive of the present invention is 0.075 or more. If the mass ratio is less than 0.075, the brilliance is inferior.
  • the mass ratio is preferably 0.5 or more, more preferably 0.7 or more.
  • the mass ratio is preferably 1.0 or less, for example.
  • the concentration of (B) alkali metal salt is preferably 30 g / L or more.
  • the concentration of the alkali metal salt (B) is preferably 200 g / L or more, more preferably 280 g / L or more.
  • the upper limit is not particularly limited, but for example, 1000 g / L or less is exemplified.
  • the concentration of the alkali metal salt (B) is preferably 500 g / L or less.
  • the (C) water-soluble organic solvent for example, a water-soluble organic solvent having 1 to 4 hydroxyl groups, polyglycerin, or the like can be used.
  • the water-soluble organic solvent having 1 to 4 hydroxyl groups is not particularly limited as long as the number of hydroxyl groups is 1 to 4, and a known water-soluble organic solvent can be used.
  • monohydric alcohols such as methanol, ethanol and 1-propanol
  • dihydric alcohols such as ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol, 1,3-propanediol and 1,4-butanediol
  • trihydric alcohols such as glycerin.
  • the water-soluble organic solvent other than polyethylene glycol, polypropylene glycol, and polyglycerin preferably has, for example, 1 to 6 carbon atoms, and carbon.
  • the number is more preferably 1 to 5, and the number of carbon atoms is even more preferably 1 to 4.
  • polyethylene glycol preferably has a molecular weight of, for example, about 200 to 400, and more preferably about 200 to 300.
  • the molecular weight of polyglycerin is preferably, for example, about 150 to 800, and more preferably about 150 to 350.
  • polypropylene glycol preferably has a molecular weight of, for example, about 130 to 700, and more preferably about 130 to 400. These can be used alone or in combination of two or more.
  • the sugar alcohol having 4 to 9 hydroxyl groups is not particularly limited as long as the number of hydroxyl groups is 4 to 9, and known sugar alcohols can be used.
  • sorbitol having 6 hydroxyl groups, xylitol having 5 hydroxyl groups, lactitol having 9 hydroxyl groups and the like can be mentioned.
  • the sugar alcohol preferably has, for example, 4 to 12 carbon atoms, and more preferably 4 to 6 carbon atoms. These can be used alone or in combination of two or more.
  • the volume ratio (water: water-soluble organic solvent) of (A) water and (C) water-soluble organic solvent contained in the chemical abrasive of the present invention is preferably 10:90 to 90:10.
  • the upper limit of the range may be, for example, 20:80, 30:70, 40:60, 50:50, 60:40, 70:30, or 80:20.
  • the lower limit of the range may be, for example, 20:80, 30:70, 40:60, 50:50, 60:40, 70:30, or 80:20.
  • the volume ratio of water to ethylene glycol is preferably 40:60.
  • the volume ratio of water to glycerin is preferably 60:40.
  • the content of (C) water-soluble organic solvent is not particularly limited, and for example, 100 ml or more is exemplified per 1 L of the total amount of (A) water and (C) water-soluble organic solvent.
  • the content of the water-soluble organic solvent (C) is preferably about 500 to 900 ml, more preferably about 600 to 800 ml, for example, in the case of a blast material (A1050, A5052, etc.). Further, in the case of a water hair material (A1050 or the like), about 300 to 600 ml is preferable, and about 400 to 500 ml is more preferable.
  • the upper limit is not particularly limited, but for example, 900 ml or less is exemplified.
  • the concentration of (C) sugar alcohol is not particularly limited, but is preferably 100 g / L or more.
  • the concentration of the sugar alcohol (C) is more preferably 300 g / L or more.
  • the upper limit is not particularly limited, but for example, 1000 g / L or less is exemplified.
  • the concentration of the sugar alcohol (C) is preferably 700 g / L or less.
  • the content of (A) water is not particularly limited, but for example, 100 ml or more is exemplified per 1 L of the total amount of (A) water and (C) water-soluble organic solvent.
  • the water content is preferably about 100 to 500 ml, more preferably 200 to 400 ml.
  • a water hair material (A1050 or the like)
  • about 400 to 700 ml is preferable, and about 500 to 600 ml is more preferable.
  • the upper limit is not particularly limited, but for example, 900 ml or less is exemplified.
  • the chemical abrasive of the present invention may contain other components such as a clinker inhibitor, if necessary.
  • other components include organic acids such as tartaric acid and gluconic acid, or salts thereof, sorbitol and the like.
  • the chemical abrasive of the present invention may or may not contain phosphorus.
  • the chemical polishing agent of the present invention can be suitably used as a chemical polishing agent for aluminum or an aluminum alloy.
  • the aluminum alloy is not particularly limited, and various aluminum-based alloys are exemplified. Specific examples of aluminum alloys include, for example, JIS-A wrought alloys specified in the JIS-A 1,000 to 7,000 series, casting materials shown in each of AC and ADC, and die casting materials. Examples thereof include various aluminum-based alloy groups represented by the above. Further, as the aluminum or aluminum alloy, for example, an aluminum or an aluminum alloy that has been subjected to a treatment such as a blast treatment or a water hair treatment can be used.
  • the present invention comprises a chemical polishing agent containing (A) water, (B) an alkali metal salt, and (C) a water-soluble organic solvent, or a sugar alcohol having 4 to 9 hydroxyl groups, and an aluminum or aluminum alloy.
  • a method of chemically polishing aluminum or an aluminum alloy, which comprises a step of immersing the aluminum or aluminum alloy, is preferably included.
  • the chemical polishing agent method may be referred to as "the chemical polishing method of the present invention”.
  • the chemical polishing method is sometimes called a brilliant treatment method.
  • the chemical polishing method of the present invention is used for a chemical polishing agent for aluminum or an aluminum alloy containing (A) water, (B) an alkali metal salt, and (C) a water-soluble organic solvent, or a sugar alcohol having 4 to 9 hydroxyl groups.
  • A water
  • B an alkali metal salt
  • C a water-soluble organic solvent
  • sugar alcohol having 4 to 9 hydroxyl groups.
  • the chemical abrasive is as described in 1 above, and the above description can be incorporated.
  • the chemical abrasive may be agitated or the aluminum or the aluminum alloy may be shaken, if necessary.
  • the stirring method and the rocking method are not particularly limited, and conventionally known stirring methods and rocking methods can be carried out.
  • the bath temperature of the chemical abrasive can be adjusted as appropriate. For example, it can be 40 to 80 ° C, 40 to 60 ° C, or the like.
  • the time for immersing the aluminum or the aluminum alloy in the chemical abrasive can be appropriately set according to the desired degree of brilliance. For example, it can be 30 seconds to 30 minutes, 30 seconds to 5 minutes, and the like.
  • the film thickness (dissolved film thickness) of aluminum or aluminum alloy melted by the chemical polishing treatment of the present invention is appropriately adjusted according to the material of the aluminum or aluminum alloy to be chemically polished, the purpose of use after the chemical polishing treatment, and the like. can do.
  • A1050 blast material
  • A7075 it is about 1 to 5 ⁇ m.
  • the brilliance can be evaluated by measuring the glossiness with a glossiness meter (GMX-202: manufactured by Murakami Color Technology Research Institute Co., Ltd.). The larger the glossiness value, the higher the brilliance. Further, the larger the glossiness with respect to the dissolved film thickness, the more excellent the chemical polishing property (brightness treatment property) of the chemical polishing agent.
  • the glossiness can be appropriately adjusted according to the material of the aluminum or aluminum alloy to be chemically polished, the purpose of use after the chemical polishing, and the like. For example, in the case of A1050 (blast material), it is preferable that the glossiness is 50 or more when the dissolved film thickness is about 5 to 25 ⁇ m. Further, in the case of A7075, it is preferable that the glossiness at a dissolution film thickness of about 1 to 5 ⁇ m is 400 or more.
  • the chemical polishing method of the present invention may include a degreasing treatment step before the step of immersing aluminum or an aluminum alloy in the chemical polishing agent.
  • the purpose of the degreasing treatment is, for example, to remove dirt and oil adhering to the aluminum surface.
  • the degreasing treatment method is not particularly limited, and a conventionally known degreasing treatment method can be carried out.
  • the chemical polishing method of the present invention may include an etching treatment step before the step of immersing aluminum or an aluminum alloy in the chemical polishing agent.
  • the purpose of the etching treatment is, for example, to remove a natural oxide film formed on the aluminum surface.
  • the etching treatment method is not particularly limited, and a conventionally known etching treatment method can be carried out.
  • the chemical polishing method of the present invention may include a desmat treatment after the etching treatment and / or the chemical polishing treatment.
  • the purpose of the desmat treatment is, for example, to remove the smut generated by etching or chemical polishing.
  • the desmat treatment method is not particularly limited, and a conventionally known desmat treatment method can be carried out.
  • Aluminum test pieces (blasted A1050) used in the following examples and comparative examples were prepared according to the following conditions.
  • the degreasing treatment was carried out at 55 ° C. of Top ADD-100 (manufactured by Okuno Pharmaceutical Industry Co., Ltd.) for 2 minutes.
  • the etching treatment after the degreasing treatment was carried out at 55 ° C. of 100 g / L of sodium hydroxide and 5 ml / L of Alsatin SK (manufactured by Okuno Pharmaceutical Industry Co., Ltd.) for 30 seconds.
  • a desmat treatment was performed after the etching treatment and the chemical polishing treatment.
  • the desmat treatment was performed on Top Desmat N-20 (manufactured by Okuno Pharmaceutical Industry Co., Ltd.) at 20 to 25 ° C. for 1 to 2 minutes.
  • Analytical method (dissolution film thickness, dissolution rate, and glossiness) The weight of the test piece before and after the chemical polishing treatment was measured, and the dissolution film thickness ( ⁇ m) and the dissolution rate ( ⁇ m / min) were calculated from the weight difference and the specific weight of aluminum.
  • the glossiness was measured by a glossiness meter (GMX-202: manufactured by Murakami Color Technology Laboratory Co., Ltd.). The results are shown in Table 1.
  • the glossiness of the test piece subjected to the degreasing treatment or the etching treatment is shown in Table 1 as Reference Examples 1 and 2. Since the glossiness increases as the dissolution film thickness increases, it is possible to compare the glossiness of test pieces having the same dissolution film thickness (particularly, the dissolution film thickness of about 15 to 25 ⁇ m). The performance of the abrasives was compared.
  • Examples 1 to 6 The test piece subjected to the degreasing treatment and the etching treatment by the above-mentioned method is immersed in a chemical polishing agent containing sodium hydroxide as an alkali metal salt, ethylene glycol having two hydroxyl groups as a water-soluble organic solvent, and water. Chemical polishing treatment was performed. The bath temperature during the chemical polishing treatment was 55 ° C. Table 2 shows the contents of sodium hydroxide, ethylene glycol and water contained in the chemical polishing agent, and the immersion time of the test piece in the chemical polishing agent. The results of analysis according to the above-mentioned analysis method are also shown in Table 2.
  • test pieces subjected to the chemical polishing treatment were evaluated by the same method as in Examples 1 to 6.
  • Table 3 shows the contents of sodium hydroxide, ethylene glycol and water contained in the chemical polishing agent, and the immersion time of the test piece in the chemical polishing agent.
  • test piece subjected to the degreasing treatment and the etching treatment by the above-mentioned method contains sodium hydroxide as an alkali metal salt, polyethylene glycol-200 having two hydroxyl groups (average molecular weight 200) as a water-soluble organic solvent, and water. It was immersed in a chemical polishing agent and subjected to a chemical polishing treatment. The bath temperature during the chemical polishing treatment was 55 ° C. or 80 ° C. Table 4 shows the contents of sodium hydroxide, polyethylene glycol-200 and water contained in the chemical polishing agent, the immersion time of the test piece in the chemical polishing agent, and the bath temperature. The results of analysis according to the above-mentioned analysis method are also shown in Table 4.
  • Example 12 to 31 Chemical polishing treatment was performed in the same manner as in Examples 9 to 11, and the test pieces were evaluated. Instead of polyethylene glycol-200 as a water-soluble organic solvent, diethylene glycol, 1,3-propanediol, 1,4-butanediol, dipropylene glycol, glycerin, diglycerin, polyglycerin (average molecular weight 310), polypropylene glycol (Average molecular weight 300) was used. Tables 5 to 12 show the contents of sodium hydroxide, water-soluble organic solvent and water contained in the chemical polishing agent, the immersion time of the test piece in the chemical polishing agent, and the bath temperature.
  • Example 32 The test piece subjected to the degreasing treatment and the etching treatment by the above-mentioned method was immersed in a chemical polishing agent containing sodium hydroxide as an alkali metal salt, sorbitol as a sugar alcohol, and water to perform the chemical polishing treatment.
  • the bath temperature during the chemical polishing treatment was 70 ° C.
  • Table 13 shows the contents of sodium hydroxide, sorbitol and water contained in the chemical polishing agent, and the immersion time of the test piece in the chemical polishing agent. The results of analysis according to the above-mentioned analysis method are also shown in Table 13.
  • gloss can be obtained by treating with a chemical abrasive containing sorbitol, which is a sugar alcohol having 6 hydroxyl groups.
  • Examples 33 to 37 Comparative Examples 4 to 5
  • the test piece was evaluated by performing a chemical polishing treatment in the same manner as in Example 32.
  • Lactitol and xylitol were used as sugar alcohols instead of sorbitol.
  • glucose and carboxymethyl cellulose sodium salt were used for comparison.
  • Tables 14 to 16 show the contents of sodium hydroxide, sugar alcohol, glucose and water contained in the chemical abrasive, and the immersion time of the test piece in the chemical abrasive.
  • gloss can be obtained by treating with a chemical abrasive containing lactitol, which is a sugar alcohol having 9 hydroxyl groups, or xylitol, which is a sugar alcohol having 5 hydroxyl groups. Furthermore, it was found that increasing the amount of sugar alcohol increased the glossiness. It was also found that when glucose is used, it is carbonized and therefore difficult to put into practical use. In addition, no clear increase in glossiness could be confirmed even when carboxymethyl cellulose / sodium salt was used.
  • Examples 38 and 39 Comparative Examples 6 and 7
  • a chemical abrasive containing potassium hydroxide or lithium hydroxide monohydrate as an alkali metal salt, ethylene glycol as a water-soluble organic solvent, and water in a test piece that has been degreased and etched by the method described above. was immersed in and chemically polished.
  • the bath temperature during the chemical polishing treatment was 55 ° C.
  • Tables 17 and 18 show the contents of potassium hydroxide or lithium hydroxide monohydrate, ethylene glycol and water contained in the chemical abrasive, and the immersion time of the test piece in the chemical abrasive, respectively.
  • the results of analysis according to the above-mentioned analysis method are also shown in Tables 17 and 18.
  • Examples 40 to 46, reference examples 3 to 8 Chemical polishing treatment was performed under the same conditions as in Example 5, and the test pieces were evaluated.
  • Table 19 shows the contents of sodium hydroxide, ethylene glycol and water contained in the chemical polishing agent, and the immersion time of the test piece in the chemical polishing agent.
  • the results of confirming the effect of the difference in the material of the test piece using water-haired A1050, blasted A5052, or unprocessed A7075 instead of the blasted A1050 are shown in the table.
  • 20 to 22 are shown.
  • the contents of sodium hydroxide, ethylene glycol and water contained in the chemical polishing agent and the immersion time of the test piece in the chemical polishing agent are shown in Tables 20 to 22.
  • the glossiness of the test piece subjected to the degreasing treatment or the etching treatment is shown in Tables 20 to 22 as Reference Examples 3 to 8.
  • the chemical abrasive containing water, an alkali metal salt, and a water-soluble organic solvent is aluminum or aluminum regardless of the type of aluminum or aluminum alloy and the processing method of aluminum or aluminum alloy. It was found that the alloy can be imparted with brilliance.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

Provided are a novel chemical polishing agent and a chemical polishing method. Specifically, the present invention provides: a chemical polishing agent for aluminum or aluminum alloys that includes water (A), an alkali metal salt (B), and a water soluble organic solvent or a sugar alcohol having 4–9 hydroxyl groups (C), said chemical polishing agent having a mass ratio (alkali metal salt/water) of alkali metal salt to water that is at least 0.075; and a chemical polishing method for aluminum or aluminum alloys that includes a step in which aluminum or an aluminum alloy is soaked in a chemical polishing agent for aluminum or aluminum alloys that includes water (A), an alkali metal salt (B), and a water soluble organic solvent or a sugar alcohol having 4–9 hydroxyl groups (C) , said chemical polishing method providing a mass ratio (alkali metal salt/water) of alkali metal salt to water of at least 0.075.

Description

化学研磨剤、及び化学研磨方法Chemical polishing agent and chemical polishing method
　本発明は、アルミニウム又はアルミニウム合金用化学研磨剤、及び化学研磨方法に関する。 The present invention relates to a chemical polishing agent for aluminum or an aluminum alloy, and a chemical polishing method.
　アルミニウム又アルミニウム合金が加工されて様々な物品が製造されている。アルミニウム等は、表面に酸化皮膜が形成されているので、当該酸化皮膜を除去するために、エッチング処理が施される。アルミニウム又はアルミニウム合金の化学研磨方法としては、リン酸を含有する酸性の研磨剤を用いる方法が主流である（特許文献１、２）。 Aluminum or aluminum alloy is processed to manufacture various articles. Since an oxide film is formed on the surface of aluminum or the like, an etching process is performed to remove the oxide film. As a chemical polishing method for aluminum or an aluminum alloy, a method using an acidic abrasive containing phosphoric acid is the mainstream (Patent Documents 1 and 2).
　これまでに、リンの排出規制の強化への対応や化学研磨剤の性能向上を目的として、リン酸を主体としない化学研磨剤の開発が行われているが、その性能（化学研磨性、光輝処理性）は十分ではなかった（特許文献３～５）。 So far, chemical abrasives that do not mainly contain phosphoric acid have been developed for the purpose of responding to the tightening of phosphorus emission regulations and improving the performance of chemical abrasives. (Processability) was not sufficient (Patent Documents 3 to 5).
特開２００２－１８７３９８号公報Japanese Unexamined Patent Publication No. 2002-187398 特公昭５５－４４１１６号公報Special Publication No. 55-44116 特公昭５０－９７３２号公報Special Publication No. 50-9732 特公昭５９－４５７５６号公報Special Publication No. 59-45756 特公平５－３０９１４号公報Special Fair 5-30914 Gazette
　本発明は、アルミニウム又はアルミニウム合金に対する化学研磨性、光輝処理性に優れた化学研磨剤、及び化学研磨方法を提供することを目的とする。 An object of the present invention is to provide a chemical polishing agent having excellent chemical polishing property and bright treatment property for aluminum or an aluminum alloy, and a chemical polishing method.
　本発明者らは、鋭意研究を重ねた結果、（Ａ）水、（Ｂ）アルカリ金属塩、及び、（Ｃ）水溶性有機溶媒、又は４～９つの水酸基を有する糖アルコールを含む化学研磨剤を用いることによって、アルミニウム又はアルミニウム合金の光沢度を増加させることができることを見出し、さらに改良を重ねて本発明を完成するに至った。 As a result of intensive studies, the present inventors have conducted a chemical polishing agent containing (A) water, (B) an alkali metal salt, and (C) a water-soluble organic solvent, or a sugar alcohol having 4 to 9 hydroxyl groups. It has been found that the glossiness of aluminum or an aluminum alloy can be increased by using the above, and further improvements have been made to complete the present invention.
　本発明は例えば以下の項に記載の主題を包含する。
項１．
（Ａ）水、
（Ｂ）アルカリ金属塩、及び、
（Ｃ）水溶性有機溶媒、又は４～９つの水酸基を有する糖アルコール
を含む、アルミニウム又はアルミニウム合金用化学研磨剤であって、
前記水に対する前記アルカリ金属塩の質量比（アルカリ金属塩／水）が、０．０７５以上である、化学研磨剤。
項２．
前記化学研磨剤中、前記アルカリ金属塩の濃度が３０ｇ／Ｌ以上である、項１に記載の化学研磨剤。
項３．
前記水と、前記水溶性有機溶媒との体積比（水：水溶性有機溶媒）が、１０：９０～９０：１０である、項１又は２に記載の化学研磨剤。
項４．
前記化学研磨剤中、前記糖アルコールの濃度が１００ｇ／Ｌ以上である、項１又は２に記載の化学研磨剤。
項５．
前記アルカリ金属塩が、アルカリ金属水酸化物である、項１～４のいずれかに記載の化学研磨剤。
項６．
前記水溶性有機溶媒が、１～４つの水酸基を有する水溶性有機溶媒、及びポリグリセリンからなる群より選択される１種以上である、項１～５のいずれかに記載の化学研磨剤。
項７．
（Ａ）水、
（Ｂ）アルカリ金属塩、及び、
（Ｃ）水溶性有機溶媒、又は４～９つの水酸基を有する糖アルコール
を含むアルミニウム又はアルミニウム合金用化学研磨剤に、アルミニウム又はアルミニウム合金を浸漬する工程を含む、アルミニウム又はアルミニウム合金の化学研磨方法であって、
前記水に対する前記アルカリ金属塩の質量比（アルカリ金属塩／水）が、０．０７５以上である、化学研磨方法。
項８．
前記化学研磨剤中、前記アルカリ金属塩の濃度が３０ｇ／Ｌ以上である、項７に記載の化学研磨方法。
項９．
前記水と、前記水溶性有機溶媒との体積比（水：水溶性有機溶媒）が、１０：９０～９０：１０である、項７又は８記載の化学研磨方法。
項１０．
前記化学研磨剤中、前記糖アルコールの濃度が１００ｇ／Ｌ以上である、項７又は８に記載の化学研磨方法。
項１１．
前記アルカリ金属塩が、アルカリ金属水酸化物である、項７～１０のいずれかに記載の化学研磨方法。
項１２．
前記水溶性有機溶媒が、１～４つの水酸基を有する水溶性有機溶媒、及びポリグリセリンからなる群より選択される１種以上である、項７～１１のいずれかに記載の化学研磨方法。 The present invention includes, for example, the subjects described in the following sections.
Item 1.
(A) Water,
(B) Alkali metal salt and
(C) A chemical abrasive for aluminum or an aluminum alloy containing a water-soluble organic solvent or a sugar alcohol having 4 to 9 hydroxyl groups.
A chemical abrasive having a mass ratio of the alkali metal salt to water (alkali metal salt / water) of 0.075 or more.
Item 2.
Item 2. The chemical polishing agent according to Item 1, wherein the concentration of the alkali metal salt in the chemical polishing agent is 30 g / L or more.
Item 3.
Item 2. The chemical abrasive according to Item 1 or 2, wherein the volume ratio of the water to the water-soluble organic solvent (water: water-soluble organic solvent) is 10:90 to 90:10.
Item 4.
Item 2. The chemical polishing agent according to Item 1 or 2, wherein the concentration of the sugar alcohol in the chemical polishing agent is 100 g / L or more.
Item 5.
Item 2. The chemical abrasive according to any one of Items 1 to 4, wherein the alkali metal salt is an alkali metal hydroxide.
Item 6.
Item 2. The chemical abrasive according to any one of Items 1 to 5, wherein the water-soluble organic solvent is at least one selected from the group consisting of a water-soluble organic solvent having 1 to 4 hydroxyl groups and polyglycerin.
Item 7.
(A) Water,
(B) Alkali metal salt and
(C) A method for chemically polishing aluminum or an aluminum alloy, which comprises a step of immersing aluminum or an aluminum alloy in a water-soluble organic solvent or a chemical polishing agent for aluminum or an aluminum alloy containing a sugar alcohol having 4 to 9 hydroxyl groups. There,
A chemical polishing method in which the mass ratio of the alkali metal salt to the water (alkali metal salt / water) is 0.075 or more.
Item 8.
Item 2. The chemical polishing method according to Item 7, wherein the concentration of the alkali metal salt in the chemical polishing agent is 30 g / L or more.
Item 9.
Item 7. The chemical polishing method according to Item 7 or 8, wherein the volume ratio of the water to the water-soluble organic solvent (water: water-soluble organic solvent) is 10:90 to 90:10.
Item 10.
Item 7. The chemical polishing method according to Item 7 or 8, wherein the concentration of the sugar alcohol in the chemical polishing agent is 100 g / L or more.
Item 11.
Item 8. The chemical polishing method according to any one of Items 7 to 10, wherein the alkali metal salt is an alkali metal hydroxide.
Item 12.
Item 2. The chemical polishing method according to any one of Items 7 to 11, wherein the water-soluble organic solvent is at least one selected from the group consisting of a water-soluble organic solvent having 1 to 4 hydroxyl groups and polyglycerin.
　本発明の化学研磨剤は、アルミニウム又はアルミニウム合金に対する化学研磨性（光輝処理性とも呼ばれる）に優れている。また、本発明の化学研磨方法は、アルミニウム又はアルミニウム合金に対して優れた光輝性を付与することができる。 The chemical polishing agent of the present invention is excellent in chemical polishing property (also called brilliant treatment property) for aluminum or aluminum alloy. In addition, the chemical polishing method of the present invention can impart excellent brilliance to aluminum or an aluminum alloy.
　以下、本発明に包含される各実施形態について、さらに詳細に説明する。 Hereinafter, each embodiment included in the present invention will be described in more detail.
１．化学研磨剤
　本発明に包含される化学研磨剤は、（Ａ）水、（Ｂ）アルカリ金属塩、（Ｃ）水溶性有機溶媒、又は４～９つの水酸基を有する糖アルコールを含むことを特徴とする化学研磨剤である。以下、当該化学研磨剤を、「本発明の化学研磨剤」と表記することがある。なお、化学研磨剤は、光輝処理剤と呼ばれることもある。 1. 1. Chemical Abrasives The chemical abrasives included in the present invention are characterized by containing (A) water, (B) alkali metal salts, (C) water-soluble organic solvents, or sugar alcohols having 4 to 9 hydroxyl groups. It is a chemical abrasive. Hereinafter, the chemical polishing agent may be referred to as "the chemical polishing agent of the present invention". The chemical abrasive is sometimes called a brilliant treatment agent.
　本発明の化学研磨剤は、（Ａ）水、（Ｂ）アルカリ金属塩、及び（Ｃ）水溶性有機溶媒、又は４～９つの水酸基を有する糖アルコールを含むことにより、アルミニウム又アルミニウム合金表面の平滑化が促進されるため、アルミニウム又アルミニウム合金に対する、化学研磨性（光輝処理性）に優れている。このため、本発明の化学研磨剤を用いて処理されたアルミニウム又アルミニウム合金は、光輝性に優れている。 The chemical abrasive of the present invention contains (A) water, (B) an alkali metal salt, and (C) a water-soluble organic solvent, or a sugar alcohol having 4 to 9 hydroxyl groups, thereby forming an aluminum or aluminum alloy surface. Since smoothing is promoted, it is excellent in chemical abrasiveness (brilliant treatment property) with respect to aluminum or aluminum alloy. Therefore, the aluminum or aluminum alloy treated with the chemical abrasive of the present invention has excellent brilliance.
　（Ｂ）アルカリ金属塩としては、例えば、水酸化ナトリウム、水酸化カリウム、水酸化リチウム等のアルカリ金属水酸化物；炭酸ナトリウム、炭酸カリウム、炭酸リチウム等のアルカリ金属炭酸塩；炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素リチウム等のアルカリ金属炭酸水素塩などが挙げられる。また、これらの水和物であってもよい。中でも、化学研磨性（光輝処理性）に優れる点で、水酸化ナトリウム、水酸化カリウム、水酸化リチウム等のアルカリ金属水酸化物が好ましい。また、（Ｂ）アルカリ金属塩は、１種単独で又は２種以上を組み合わせて用いることができる。 (B) Examples of the alkali metal salt include alkali metal hydroxides such as sodium hydroxide, potassium hydroxide and lithium hydroxide; alkali metal carbonates such as sodium carbonate, potassium carbonate and lithium carbonate; sodium hydrogen carbonate and carbonate. Examples thereof include alkali metal bicarbonates such as potassium hydrogen and lithium hydrogen carbonate. Moreover, these hydrates may be used. Among them, alkali metal hydroxides such as sodium hydroxide, potassium hydroxide, and lithium hydroxide are preferable because they are excellent in chemical polishing property (brightness treatment property). Further, the alkali metal salt (B) can be used alone or in combination of two or more.
　本発明の化学研磨剤に含まれる、（Ａ）水に対する（Ｂ）アルカリ金属塩の質量比（アルカリ金属塩／水）は、０．０７５以上である。上記質量比が０．０７５未満であると光輝性に劣る。上記質量比は、０．５以上が好ましく、０．７以上がより好ましい。また、上記質量比は、例えば１．０以下であることが好ましい。 The mass ratio of (A) alkali metal salt to (B) alkali metal salt (alkali metal salt / water) contained in the chemical abrasive of the present invention is 0.075 or more. If the mass ratio is less than 0.075, the brilliance is inferior. The mass ratio is preferably 0.5 or more, more preferably 0.7 or more. The mass ratio is preferably 1.0 or less, for example.
　本発明の化学研磨剤中、（Ｂ）アルカリ金属塩の濃度（アルカリ金属塩／水及び水溶性有機溶媒）が、３０ｇ／Ｌ以上であることが好ましい。（Ｂ）アルカリ金属塩の濃度は、２００ｇ／Ｌ以上が好ましく、２８０ｇ／Ｌ以上がより好ましい。上限は特に限定されないが、例えば、１０００ｇ／Ｌ以下が例示される。（Ｂ）アルカリ金属塩の濃度は、５００ｇ／Ｌ以下が好ましい。 In the chemical abrasive of the present invention, the concentration of (B) alkali metal salt (alkali metal salt / water and water-soluble organic solvent) is preferably 30 g / L or more. The concentration of the alkali metal salt (B) is preferably 200 g / L or more, more preferably 280 g / L or more. The upper limit is not particularly limited, but for example, 1000 g / L or less is exemplified. The concentration of the alkali metal salt (B) is preferably 500 g / L or less.
　（Ｃ）水溶性有機溶媒としては、例えば、１～４つの水酸基を有する水溶性有機溶媒、ポリグリセリンなどを用いることができる。１～４つの水酸基を有する水溶性有機溶媒は、水酸基の数が１～４つである限り特に限定せず、公知の水溶性有機溶媒を用いることができる。例えば、メタノール、エタノール、１－プロパノール等の一価アルコール；エチレングリコール、ジエチレングリコール、プロピレングリコール、ジプロピレングリコール、１，３－プロパンジオール、１，４－ブタンジオール等の二価アルコール；グリセリン等の三価アルコール；ポリエチレングリコール；ポリプロピレングリコール；ジグリセリン等が挙げられる。化学研磨剤の性状（例えば、分離の有無、安定性など）の観点から、ポリエチレングリコール、ポリプロピレングリコール、ポリグリセリン以外の水溶性有機溶媒は、例えば炭素数が１～６であることが好ましく、炭素数が１～５であることがより好ましく、炭素数が１～４であることがさらに好ましい。また、化学研磨剤の性状（例えば、分離の有無、安定性など）の観点から、ポリエチレングリコールは、分子量が例えば２００～４００程度であることが好ましく、２００～３００程度であることがより好ましい。また、化学研磨剤の性状（例えば、分離の有無、安定性など）の観点から、ポリグリセリンは、分子量が例えば１５０～８００程度であることが好ましく、１５０～３５０程度であることがより好ましい。また、化学研磨剤の性状（例えば、分離の有無、安定性など）の観点から、ポリプロピレングリコールは、分子量が例えば１３０～７００程度であることが好ましく、１３０～４００程度であることがより好ましい。これらは、１種単独で又は２種以上を組み合わせて用いることができる。 As the (C) water-soluble organic solvent, for example, a water-soluble organic solvent having 1 to 4 hydroxyl groups, polyglycerin, or the like can be used. The water-soluble organic solvent having 1 to 4 hydroxyl groups is not particularly limited as long as the number of hydroxyl groups is 1 to 4, and a known water-soluble organic solvent can be used. For example, monohydric alcohols such as methanol, ethanol and 1-propanol; dihydric alcohols such as ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol, 1,3-propanediol and 1,4-butanediol; and trihydric alcohols such as glycerin. Hypoalcohol; polyethylene glycol; polypropylene glycol; diglycerin and the like. From the viewpoint of the properties of the chemical abrasive (for example, the presence or absence of separation, stability, etc.), the water-soluble organic solvent other than polyethylene glycol, polypropylene glycol, and polyglycerin preferably has, for example, 1 to 6 carbon atoms, and carbon. The number is more preferably 1 to 5, and the number of carbon atoms is even more preferably 1 to 4. Further, from the viewpoint of the properties of the chemical abrasive (for example, presence / absence of separation, stability, etc.), polyethylene glycol preferably has a molecular weight of, for example, about 200 to 400, and more preferably about 200 to 300. Further, from the viewpoint of the properties of the chemical abrasive (for example, the presence or absence of separation, stability, etc.), the molecular weight of polyglycerin is preferably, for example, about 150 to 800, and more preferably about 150 to 350. Further, from the viewpoint of the properties of the chemical abrasive (for example, the presence or absence of separation, stability, etc.), polypropylene glycol preferably has a molecular weight of, for example, about 130 to 700, and more preferably about 130 to 400. These can be used alone or in combination of two or more.
　（Ｃ）４～９つの水酸基を有する糖アルコールは、水酸基の数が４～９つである限り特に限定せず、公知の糖アルコールを用いることができる。例えば、水酸基を６つ有するソルビトール、水酸基を５つ有するキシリトール、水酸基を９つ有するラクチトール等が挙げられる。化学研磨剤の性状（例えば、分離の有無、安定性など）の観点から、糖アルコールは、例えば炭素数が４～１２であることが好ましく、炭素数が４～６であることがより好ましい。これらは、１種単独で又は２種以上を組み合わせて用いることができる。 (C) The sugar alcohol having 4 to 9 hydroxyl groups is not particularly limited as long as the number of hydroxyl groups is 4 to 9, and known sugar alcohols can be used. For example, sorbitol having 6 hydroxyl groups, xylitol having 5 hydroxyl groups, lactitol having 9 hydroxyl groups and the like can be mentioned. From the viewpoint of the properties of the chemical abrasive (for example, the presence or absence of separation, stability, etc.), the sugar alcohol preferably has, for example, 4 to 12 carbon atoms, and more preferably 4 to 6 carbon atoms. These can be used alone or in combination of two or more.
　本発明の化学研磨剤に含まれる、（Ａ）水と（Ｃ）水溶性有機溶媒との体積比（水：水溶性有機溶媒）は、１０：９０～９０：１０であることが好ましい。当該範囲の上限は、例えば、２０：８０、３０：７０、４０：６０、５０：５０、６０：４０、７０：３０、又は８０：２０であってもよい。また、当該範囲の下限は、例えば、２０：８０、３０：７０、４０：６０、５０：５０、６０：４０、７０：３０、又は８０：２０であってもよい。例えば、ブラスト材（A１０５０、A５０５２等）において水溶性有機溶媒をエチレングリコールとした場合、水とエチレングリコールの体積比は４０：６０が好ましい。又、例えば、水溶性有機溶媒をグリセリンとした場合、水とグリセリンの体積比は６０：４０が好ましい。 The volume ratio (water: water-soluble organic solvent) of (A) water and (C) water-soluble organic solvent contained in the chemical abrasive of the present invention is preferably 10:90 to 90:10. The upper limit of the range may be, for example, 20:80, 30:70, 40:60, 50:50, 60:40, 70:30, or 80:20. Further, the lower limit of the range may be, for example, 20:80, 30:70, 40:60, 50:50, 60:40, 70:30, or 80:20. For example, when ethylene glycol is used as the water-soluble organic solvent in the blast material (A1050, A5052, etc.), the volume ratio of water to ethylene glycol is preferably 40:60. Further, for example, when the water-soluble organic solvent is glycerin, the volume ratio of water to glycerin is preferably 60:40.
　（Ｃ）水溶性有機溶媒の含有量は、特に限定されないが、（Ａ）水及び（Ｃ）水溶性有機溶媒の総量１Ｌあたり、例えば１００ｍｌ以上が例示される。（Ｃ）水溶性有機溶媒の含有量は、例えば、ブラスト材（A１０５０、A５０５２等）の場合、５００～９００ｍｌ程度が好ましく、６００～８００ｍｌ程度がより好ましい。又、水ヘアー材（A１０５０等）の場合は、３００～６００ｍｌ程度が好ましく、４００～５００ｍｌ程度がより好ましい。上限も特に限定されないが、例えば、９００ｍｌ以下が例示される。 The content of (C) water-soluble organic solvent is not particularly limited, and for example, 100 ml or more is exemplified per 1 L of the total amount of (A) water and (C) water-soluble organic solvent. The content of the water-soluble organic solvent (C) is preferably about 500 to 900 ml, more preferably about 600 to 800 ml, for example, in the case of a blast material (A1050, A5052, etc.). Further, in the case of a water hair material (A1050 or the like), about 300 to 600 ml is preferable, and about 400 to 500 ml is more preferable. The upper limit is not particularly limited, but for example, 900 ml or less is exemplified.
　本発明の化学研磨剤中、（Ｃ）糖アルコールの濃度（糖アルコール／水及び水溶性有機溶媒）は、特に限定されないが、１００ｇ／Ｌ以上であることが好ましい。（Ｃ）糖アルコールの濃度は、３００ｇ／Ｌ以上がより好ましい。上限は特に限定されないが、例えば、１０００ｇ／Ｌ以下が例示される。（Ｃ）糖アルコールの濃度は、７００ｇ／Ｌ以下が好ましい。 In the chemical abrasive of the present invention, the concentration of (C) sugar alcohol (sugar alcohol / water and water-soluble organic solvent) is not particularly limited, but is preferably 100 g / L or more. The concentration of the sugar alcohol (C) is more preferably 300 g / L or more. The upper limit is not particularly limited, but for example, 1000 g / L or less is exemplified. The concentration of the sugar alcohol (C) is preferably 700 g / L or less.
　（Ａ）水の含有量は、特に限定されないが、（Ａ）水及び（Ｃ）水溶性有機溶媒の総量１Ｌあたり、例えば１００ｍｌ以上が例示される。水の含有量は、例えば、ブラスト材（A１０５０、A５０５２等）の場合、１００～５００ｍｌ程度が好ましく、２００～４００ｍｌがより好ましい。又、水ヘアー材（A１０５０等）の場合は、４００～７００ｍｌ程度が好ましく、５００～６００ｍｌ程度がより好ましい。上限も特に限定されないが、例えば、９００ｍｌ以下が例示される。 The content of (A) water is not particularly limited, but for example, 100 ml or more is exemplified per 1 L of the total amount of (A) water and (C) water-soluble organic solvent. For example, in the case of a blast material (A1050, A5052, etc.), the water content is preferably about 100 to 500 ml, more preferably 200 to 400 ml. Further, in the case of a water hair material (A1050 or the like), about 400 to 700 ml is preferable, and about 500 to 600 ml is more preferable. The upper limit is not particularly limited, but for example, 900 ml or less is exemplified.
　本発明の化学研磨剤は、必要に応じてクリンカ防止剤等の他の成分を含んでいてもよい。他の成分としては、例えば、酒石酸、グルコン酸等の有機酸、又はその塩、ソルビトール等が挙げられる。また、本発明の化学研磨剤は、リンを含んでいてもよく、リンを含んでいなくてもよい。 The chemical abrasive of the present invention may contain other components such as a clinker inhibitor, if necessary. Examples of other components include organic acids such as tartaric acid and gluconic acid, or salts thereof, sorbitol and the like. Further, the chemical abrasive of the present invention may or may not contain phosphorus.
　本発明の化学研磨剤は、アルミニウム又はアルミニウム合金用の化学研磨剤として、好適に用いることができる。アルミニウム合金としては特に限定的ではなく、各種のアルミニウム主体の合金が例示される。アルミニウム合金の具体例としては、例えば、ＪＩＳに規定されているＪＩＳ－Ａ　１千番台～７千番台で示される展伸材系合金、ＡＣ、ＡＤＣの各番程で示される鋳物材、ダイカスト材等を代表とするアルミニウム主体の各種合金群等が挙げられる。また、アルミニウム又はアルミニウム合金としては、例えば、ブラスト処理、水ヘアー処理等の処理が施されたアルミニウム又はアルミニウム合金を用いることができる。 The chemical polishing agent of the present invention can be suitably used as a chemical polishing agent for aluminum or an aluminum alloy. The aluminum alloy is not particularly limited, and various aluminum-based alloys are exemplified. Specific examples of aluminum alloys include, for example, JIS-A wrought alloys specified in the JIS-A 1,000 to 7,000 series, casting materials shown in each of AC and ADC, and die casting materials. Examples thereof include various aluminum-based alloy groups represented by the above. Further, as the aluminum or aluminum alloy, for example, an aluminum or an aluminum alloy that has been subjected to a treatment such as a blast treatment or a water hair treatment can be used.
２．化学研磨方法
　本発明は、（Ａ）水、（Ｂ）アルカリ金属塩、及び、（Ｃ）水溶性有機溶媒、又は４～９つの水酸基を有する糖アルコールを含む化学研磨剤に、アルミニウム又はアルミニウム合金を浸漬する工程を含む、アルミニウム又はアルミニウム合金の化学研磨方法を好ましく包含する。以下、当該化学研磨剤方法を、「本発明の化学研磨方法」と表記することがある。なお、化学研磨方法は、光輝処理方法と呼ばれることもある。 2. Chemical polishing method The present invention comprises a chemical polishing agent containing (A) water, (B) an alkali metal salt, and (C) a water-soluble organic solvent, or a sugar alcohol having 4 to 9 hydroxyl groups, and an aluminum or aluminum alloy. A method of chemically polishing aluminum or an aluminum alloy, which comprises a step of immersing the aluminum or aluminum alloy, is preferably included. Hereinafter, the chemical polishing agent method may be referred to as "the chemical polishing method of the present invention". The chemical polishing method is sometimes called a brilliant treatment method.
　本発明の化学研磨方法は（Ａ）水、（Ｂ）アルカリ金属塩、及び、（Ｃ）水溶性有機溶媒、又は４～９つの水酸基を有する糖アルコールを含むアルミニウム又はアルミニウム合金用化学研磨剤に、アルミニウム又はアルミニウム合金を浸漬することによって、アルミニウム又はアルミニウム合金を化学研磨（光輝処理）することができ、アルミニウム又はアルミニウム合金に所望の光輝性を付与することができる。このため、本発明の化学研磨方法により処理されたアルミニウム又アルミニウム合金は、光輝性に優れている。 The chemical polishing method of the present invention is used for a chemical polishing agent for aluminum or an aluminum alloy containing (A) water, (B) an alkali metal salt, and (C) a water-soluble organic solvent, or a sugar alcohol having 4 to 9 hydroxyl groups. By immersing the aluminum or aluminum alloy, the aluminum or aluminum alloy can be chemically polished (brilliantly treated), and the aluminum or aluminum alloy can be imparted with desired brilliance. Therefore, the aluminum or aluminum alloy treated by the chemical polishing method of the present invention has excellent brilliance.
　化学研磨剤は、上記１に記載した通りであり、上記記載を援用することができる。 The chemical abrasive is as described in 1 above, and the above description can be incorporated.
　化学研磨剤にアルミニウム又はアルミニウム合金を浸漬する工程において、必要に応じて、化学研磨剤を撹拌してもよく、アルミニウム又アルミニウム合金を揺動させてもよい。攪拌方法、及び揺動方法としては、特に限定されず、従来公知の攪拌方法、及び揺動方法を実施することができる。 In the step of immersing the aluminum or the aluminum alloy in the chemical abrasive, the chemical abrasive may be agitated or the aluminum or the aluminum alloy may be shaken, if necessary. The stirring method and the rocking method are not particularly limited, and conventionally known stirring methods and rocking methods can be carried out.
　化学研磨剤にアルミニウム又はアルミニウム合金を浸漬する工程において、化学研磨剤の浴温は、適宜調整することができる。例えば、４０～８０℃、４０～６０℃等とすることができる。 In the process of immersing aluminum or an aluminum alloy in the chemical abrasive, the bath temperature of the chemical abrasive can be adjusted as appropriate. For example, it can be 40 to 80 ° C, 40 to 60 ° C, or the like.
　化学研磨剤にアルミニウム又はアルミニウム合金を浸漬する工程において、化学研磨剤にアルミニウム又はアルミニウム合金を浸漬する時間は、所望の光輝性の程度に応じて適宜設定することができる。例えば、３０秒～３０分、３０秒～５分等とすることができる。 In the step of immersing the aluminum or the aluminum alloy in the chemical abrasive, the time for immersing the aluminum or the aluminum alloy in the chemical abrasive can be appropriately set according to the desired degree of brilliance. For example, it can be 30 seconds to 30 minutes, 30 seconds to 5 minutes, and the like.
　本発明の化学研磨処理によって、溶解されるアルミニウム又はアルミニウム合金の膜厚（溶解膜厚）は、化学研磨処理するアルミニウム又はアルミニウム合金の材質、化学研磨処理後の使用目的等に応じて、適宜調整することができる。例えばA１０５０（ブラスト材）の場合、５～２５μｍ程度、A７０７５の場合は、１～５μｍ程度が例示される。 The film thickness (dissolved film thickness) of aluminum or aluminum alloy melted by the chemical polishing treatment of the present invention is appropriately adjusted according to the material of the aluminum or aluminum alloy to be chemically polished, the purpose of use after the chemical polishing treatment, and the like. can do. For example, in the case of A1050 (blast material), it is about 5 to 25 μm, and in the case of A7075, it is about 1 to 5 μm.
　光輝性は、光沢度計（GMX-２０２：株式会社村上色彩技術研究所製）によって光沢度を測定することにより評価することができる。光沢度の数値が大きいほど、高い光輝性を有することを示す。また、溶解膜厚に対する光沢度が大きいほど、化学研磨剤の化学研磨性（光輝処理性）が優れていることを示す。光沢度は、化学研磨処理するアルミニウム又はアルミニウム合金の材質、化学研磨処理後の使用目的等に応じて、適宜調整することができる。例えば、A１０５０（ブラスト材）の場合、溶解膜厚が５～２５μｍ程度における光沢度が５０以上であることが好ましい。又、A７０７５の場合は、溶解膜厚１～５μｍ程度における光沢度が４００以上であることが好ましい。 The brilliance can be evaluated by measuring the glossiness with a glossiness meter (GMX-202: manufactured by Murakami Color Technology Research Institute Co., Ltd.). The larger the glossiness value, the higher the brilliance. Further, the larger the glossiness with respect to the dissolved film thickness, the more excellent the chemical polishing property (brightness treatment property) of the chemical polishing agent. The glossiness can be appropriately adjusted according to the material of the aluminum or aluminum alloy to be chemically polished, the purpose of use after the chemical polishing, and the like. For example, in the case of A1050 (blast material), it is preferable that the glossiness is 50 or more when the dissolved film thickness is about 5 to 25 μm. Further, in the case of A7075, it is preferable that the glossiness at a dissolution film thickness of about 1 to 5 μm is 400 or more.
　本発明の化学研磨方法は、化学研磨剤にアルミニウム又はアルミニウム合金を浸漬する工程の前に、脱脂処理工程が含まれていてもよい。脱脂処理の目的は、例えばアルミ表面に付着した汚れや油分を除去すること等である。脱脂処理方法としては、特に限定されず、従来公知の脱脂処理方法を実施することができる。 The chemical polishing method of the present invention may include a degreasing treatment step before the step of immersing aluminum or an aluminum alloy in the chemical polishing agent. The purpose of the degreasing treatment is, for example, to remove dirt and oil adhering to the aluminum surface. The degreasing treatment method is not particularly limited, and a conventionally known degreasing treatment method can be carried out.
　本発明の化学研磨方法は、化学研磨剤にアルミニウム又はアルミニウム合金を浸漬する工程の前に、エッチング処理工程が含まれていてもよい。エッチング処理の目的は、例えばアルミ表面に形成された自然酸化皮膜を除去すること等である。エッチング処理方法としては、特に限定されず、従来公知のエッチング処理方法を実施することができる。 The chemical polishing method of the present invention may include an etching treatment step before the step of immersing aluminum or an aluminum alloy in the chemical polishing agent. The purpose of the etching treatment is, for example, to remove a natural oxide film formed on the aluminum surface. The etching treatment method is not particularly limited, and a conventionally known etching treatment method can be carried out.
　本発明の化学研磨方法は、エッチング処理、及び／又は化学研磨処理の後に、デスマット処理が含まれていてもよい。デスマット処理の目的は、例えばエッチング、化学研磨により生成したスマットを除去すること等である。デスマット処理方法としては、特に限定されず、従来公知のデスマット処理方法を実施することができる。 The chemical polishing method of the present invention may include a desmat treatment after the etching treatment and / or the chemical polishing treatment. The purpose of the desmat treatment is, for example, to remove the smut generated by etching or chemical polishing. The desmat treatment method is not particularly limited, and a conventionally known desmat treatment method can be carried out.
　本発明の内容を以下の実施例及び比較例を用いて具体的に説明する。但し、本発明はこれらに何ら限定されるものではない。下記において、特に言及する場合を除いて、実験は大気圧及び常温条件下で行っている。また特に言及する場合を除いて、「％」は「質量％」を意味する。また、各表に記載される各成分の配合量値も特に断らない限り「質量％」を示す。 The contents of the present invention will be specifically described with reference to the following examples and comparative examples. However, the present invention is not limited thereto. In the following, the experiments are carried out under atmospheric pressure and normal temperature conditions, unless otherwise specified. Also, unless otherwise specified, "%" means "mass%". In addition, the blending amount value of each component described in each table also indicates "mass%" unless otherwise specified.
　以下の条件に従って、下記の実施例及び比較例に用いるアルミニウム試験片（ブラスト加工されたＡ１０５０）を調製した。 Aluminum test pieces (blasted A1050) used in the following examples and comparative examples were prepared according to the following conditions.
　脱脂処理はトップADD-１００（奥野製薬工業株式会社製）の５５℃で２分間処理した。脱脂処理後のエッチング処理は水酸化ナトリウムの100g/LとアルサテンSK（奥野製薬工業株式会社製）5ml/Lの５５℃で３０秒間処理した。なお、エッチング処理後と化学研磨処理の後にはデスマット処理を行った。デスマット処理はトップデスマットN-20（奥野製薬工業株式会社製）の２０～２５℃で１～２分間行った。 The degreasing treatment was carried out at 55 ° C. of Top ADD-100 (manufactured by Okuno Pharmaceutical Industry Co., Ltd.) for 2 minutes. The etching treatment after the degreasing treatment was carried out at 55 ° C. of 100 g / L of sodium hydroxide and 5 ml / L of Alsatin SK (manufactured by Okuno Pharmaceutical Industry Co., Ltd.) for 30 seconds. A desmat treatment was performed after the etching treatment and the chemical polishing treatment. The desmat treatment was performed on Top Desmat N-20 (manufactured by Okuno Pharmaceutical Industry Co., Ltd.) at 20 to 25 ° C. for 1 to 2 minutes.
（比較例１～２）
　上述した方法により、脱脂処理、及びエッチング処理を施した試験片を、アルカリ金属塩として水酸化ナトリウム、及び水を含む化学研磨剤に浸漬し、化学研磨処理を行った。なお、化学研磨剤の浴温は５５℃とした。化学研磨剤に含まれる水酸化ナトリウム、及び水の含有量、試験片の化学研磨剤への浸漬時間を表１に示す。 (Comparative Examples 1 and 2)
The test piece subjected to the degreasing treatment and the etching treatment by the above-mentioned method was immersed in a chemical polishing agent containing sodium hydroxide and water as an alkali metal salt to perform the chemical polishing treatment. The bath temperature of the chemical abrasive was 55 ° C. Table 1 shows the contents of sodium hydroxide and water contained in the chemical polishing agent and the immersion time of the test piece in the chemical polishing agent.
分析方法（溶解膜厚、溶解速度、及び光沢度）
　化学研磨処理前後の試験片の重量を測定し、重量差とアルミニウムの比重より、溶解膜厚（μｍ）、溶解速度（μｍ／ｍｉｎ）を算出した。また、光沢度を光沢度計（GMX-２０２：株式会社村上色彩技術研究所製）により測定した。結果を表１に合わせて示す。また、脱脂処理、又はエッチング処理のみを施した試験片の光沢度を参考例１、２として表１に示す。なお、溶解膜厚の増加に伴って、光沢度も増加するため、同程度の溶解膜厚（特に、１５～２５μｍ程度の溶解膜厚）の試験片同士の光沢度を比較することによって、化学研磨剤の性能を比較した。 Analytical method (dissolution film thickness, dissolution rate, and glossiness)
The weight of the test piece before and after the chemical polishing treatment was measured, and the dissolution film thickness (μm) and the dissolution rate (μm / min) were calculated from the weight difference and the specific weight of aluminum. The glossiness was measured by a glossiness meter (GMX-202: manufactured by Murakami Color Technology Laboratory Co., Ltd.). The results are shown in Table 1. The glossiness of the test piece subjected to the degreasing treatment or the etching treatment is shown in Table 1 as Reference Examples 1 and 2. Since the glossiness increases as the dissolution film thickness increases, it is possible to compare the glossiness of test pieces having the same dissolution film thickness (particularly, the dissolution film thickness of about 15 to 25 μm). The performance of the abrasives was compared.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
　表１に示す通り、水溶性有機溶媒、糖アルコールを含まない場合、化学研磨剤に含まれる水酸化ナトリウム量を変化させても明らかな光沢度の増加は確認できなかった。 As shown in Table 1, when the water-soluble organic solvent and sugar alcohol were not contained, no clear increase in glossiness could be confirmed even if the amount of sodium hydroxide contained in the chemical abrasive was changed.
（実施例１～６）
　上述した方法により、脱脂処理、及びエッチング処理を施した試験片を、アルカリ金属塩として水酸化ナトリウム、水溶性有機溶媒として２つの水酸基を有するエチレングリコール、及び水を含む化学研磨剤に浸漬し、化学研磨処理を行った。なお、化学研磨処理時の浴温は５５℃とした。化学研磨剤に含まれる水酸化ナトリウム、エチレングリコール及び水の含有量、試験片の化学研磨剤への浸漬時間は表２に示す。また、上述した分析方法に従って分析した結果を表２に合わせて示す。 (Examples 1 to 6)
The test piece subjected to the degreasing treatment and the etching treatment by the above-mentioned method is immersed in a chemical polishing agent containing sodium hydroxide as an alkali metal salt, ethylene glycol having two hydroxyl groups as a water-soluble organic solvent, and water. Chemical polishing treatment was performed. The bath temperature during the chemical polishing treatment was 55 ° C. Table 2 shows the contents of sodium hydroxide, ethylene glycol and water contained in the chemical polishing agent, and the immersion time of the test piece in the chemical polishing agent. The results of analysis according to the above-mentioned analysis method are also shown in Table 2.
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
　水溶性有機溶媒（エチレングリコール）を含む化学研磨剤で処理することによって、光沢が得られることが分かった。また、水溶性有機溶媒（エチレングリコール）の量を増やすことによって、光沢度が増加することが分かった（実施例１～４）。また、実施例３及び５、又は実施例２及び６の結果から、化学研磨剤に含まれる水酸化ナトリウム量が多いほど、光沢度が増加することが分かった。 It was found that gloss can be obtained by treating with a chemical abrasive containing a water-soluble organic solvent (ethylene glycol). It was also found that the glossiness was increased by increasing the amount of the water-soluble organic solvent (ethylene glycol) (Examples 1 to 4). Further, from the results of Examples 3 and 5 or Examples 2 and 6, it was found that the greater the amount of sodium hydroxide contained in the chemical abrasive, the higher the glossiness.
（実施例７、８、比較例３） (Examples 7 and 8, Comparative Example 3)
　実施例１～６と同様の方法により、化学研磨処理を行った試験片について評価した。化学研磨剤に含まれる水酸化ナトリウム、エチレングリコール及び水の含有量、試験片の化学研磨剤への浸漬時間は表３に示す。
Figure JPOXMLDOC01-appb-T000003
 The test pieces subjected to the chemical polishing treatment were evaluated by the same method as in Examples 1 to 6. Table 3 shows the contents of sodium hydroxide, ethylene glycol and water contained in the chemical polishing agent, and the immersion time of the test piece in the chemical polishing agent.
Figure JPOXMLDOC01-appb-T000003
　水と水溶性有機溶媒を併用する場合においても、水酸化ナトリウム量が多いほど、光沢度が増加することが分かった。さらに水酸化ナトリウムの濃度が２５ｇ／Ｌの場合には、浸漬時間を延長しても、光沢度の増加率は小さいことが分かった（比較例３）。また比較例２及び３の結果から、水酸化ナトリウムの濃度が２５ｇ／Ｌの場合、有機溶媒の有無によって、光沢度に差が見られないことから、化学研磨剤中の水酸化ナトリウムの濃度が２５ｇ／Ｌ以下の場合には、付与される光輝性が不十分であることが分かった。 It was found that even when water and a water-soluble organic solvent were used in combination, the glossiness increased as the amount of sodium hydroxide increased. Further, when the concentration of sodium hydroxide was 25 g / L, it was found that the rate of increase in glossiness was small even if the immersion time was extended (Comparative Example 3). Further, from the results of Comparative Examples 2 and 3, when the concentration of sodium hydroxide was 25 g / L, there was no difference in glossiness depending on the presence or absence of the organic solvent, so that the concentration of sodium hydroxide in the chemical abrasive was high. In the case of 25 g / L or less, it was found that the imparted brilliance was insufficient.
（実施例９～１１）
　上述した方法により、脱脂処理、及びエッチング処理を施した試験片を、アルカリ金属塩として水酸化ナトリウム、水溶性有機溶媒として２つの水酸基を有するポリエチレングリコール－２００（平均分子量２００）、及び水を含む化学研磨剤に浸漬し、化学研磨処理を行った。なお、化学研磨処理時の浴温は５５℃、又は８０℃とした。化学研磨剤に含まれる水酸化ナトリウム、ポリエチレングリコール－２００及び水の含有量、試験片の化学研磨剤への浸漬時間、浴温は表４に示す。また、上述した分析方法に従って分析した結果を表４に合わせて示す。 (Examples 9 to 11)
The test piece subjected to the degreasing treatment and the etching treatment by the above-mentioned method contains sodium hydroxide as an alkali metal salt, polyethylene glycol-200 having two hydroxyl groups (average molecular weight 200) as a water-soluble organic solvent, and water. It was immersed in a chemical polishing agent and subjected to a chemical polishing treatment. The bath temperature during the chemical polishing treatment was 55 ° C. or 80 ° C. Table 4 shows the contents of sodium hydroxide, polyethylene glycol-200 and water contained in the chemical polishing agent, the immersion time of the test piece in the chemical polishing agent, and the bath temperature. The results of analysis according to the above-mentioned analysis method are also shown in Table 4.
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
　エチレングリコールと同様、水溶性有機溶媒として、２つの水酸基を有するポリエチレングリコール－２００を用いた場合にも、光沢が得られることが分かった。 Similar to ethylene glycol, it was found that gloss can be obtained even when polyethylene glycol-200 having two hydroxyl groups is used as the water-soluble organic solvent.
（実施例１２～３１）
　実施例９～１１と同様の方法により、化学研磨処理を行い、試験片を評価した。なお、水溶性有機溶媒としてポリエチレングリコール－２００に代えて、ジエチレングリコール、１，３－プロパンジオール、１，４－ブタンジオール、ジプロピレングリコール、グリセリン、ジグリセリン、ポリグリセリン（平均分子量３１０）、ポリプロピレングリコール（平均分子量３００）を用いた。化学研磨剤に含まれる水酸化ナトリウム、水溶性有機溶媒及び水の含有量、試験片の化学研磨剤への浸漬時間、浴温は表５～１２に示す。 (Examples 12 to 31)
Chemical polishing treatment was performed in the same manner as in Examples 9 to 11, and the test pieces were evaluated. Instead of polyethylene glycol-200 as a water-soluble organic solvent, diethylene glycol, 1,3-propanediol, 1,4-butanediol, dipropylene glycol, glycerin, diglycerin, polyglycerin (average molecular weight 310), polypropylene glycol (Average molecular weight 300) was used. Tables 5 to 12 show the contents of sodium hydroxide, water-soluble organic solvent and water contained in the chemical polishing agent, the immersion time of the test piece in the chemical polishing agent, and the bath temperature.
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000009
Figure JPOXMLDOC01-appb-T000009
Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000011
Figure JPOXMLDOC01-appb-T000011
Figure JPOXMLDOC01-appb-T000012
Figure JPOXMLDOC01-appb-T000012
　２つの水酸基を有する水溶性有機溶媒である、ジエチレングリコール、ポリプロピレングリコール、１，３－プロパンジオール、１，４－ブタンジオール、及びジプロピレングリコール；３つの水酸基を有する水溶性有機溶媒であるグリセリン；４つの水酸基を有する水溶性有機溶媒であるジグリセリン；ポリグリセリンを用いた場合にも、光沢が得られることが分かった。 Diethylene glycol, polypropylene glycol, 1,3-propanediol, 1,4-butanediol, and dipropylene glycol, which are water-soluble organic solvents having two hydroxyl groups; glycerin, which is a water-soluble organic solvent having three hydroxyl groups; 4 It was found that gloss can be obtained even when diglycerin, which is a water-soluble organic solvent having two hydroxyl groups; polyglycerin is used.
　なお、水溶性有機溶媒として、水酸基を１つ有する水溶性有機溶媒である、メタノール及びエタノール、１－プロパノールを用いた場合にも、光沢が得られることが分かった。一方、水酸基を有しない水溶性有機溶媒であるDMSOを用いた場合には、酸化ナトリウム存在下で相分離し、実験、及び実用化が難しいことが分かった。 It was also found that gloss can be obtained even when methanol, ethanol, or 1-propanol, which are water-soluble organic solvents having one hydroxyl group, are used as the water-soluble organic solvent. On the other hand, when DMSO, which is a water-soluble organic solvent having no hydroxyl group, was used, phase separation occurred in the presence of sodium oxide, and it was found that it was difficult to carry out experiments and practical use.
（実施例３２）
　上述した方法により、脱脂処理、及びエッチング処理を施した試験片を、アルカリ金属塩として水酸化ナトリウム、糖アルコールとしてソルビトール、及び水を含む化学研磨剤に浸漬し、化学研磨処理を行った。なお、化学研磨処理時の浴温は７０℃とした。化学研磨剤に含まれる水酸化ナトリウム、ソルビトール及び水の含有量、試験片の化学研磨剤への浸漬時間は表１３に示す。また、上述した分析方法に従って分析した結果を表１３に合わせて示す。 (Example 32)
The test piece subjected to the degreasing treatment and the etching treatment by the above-mentioned method was immersed in a chemical polishing agent containing sodium hydroxide as an alkali metal salt, sorbitol as a sugar alcohol, and water to perform the chemical polishing treatment. The bath temperature during the chemical polishing treatment was 70 ° C. Table 13 shows the contents of sodium hydroxide, sorbitol and water contained in the chemical polishing agent, and the immersion time of the test piece in the chemical polishing agent. The results of analysis according to the above-mentioned analysis method are also shown in Table 13.
Figure JPOXMLDOC01-appb-T000013
Figure JPOXMLDOC01-appb-T000013
　６つの水酸基を有する糖アルコールである、ソルビトールを含む化学研磨剤で処理することによって、光沢が得られることが分かった。 It was found that gloss can be obtained by treating with a chemical abrasive containing sorbitol, which is a sugar alcohol having 6 hydroxyl groups.
（実施例３３～３７、比較例４～５）
　実施例３２と同様の方法により、化学研磨処理を行い、試験片を評価した。なお、糖アルコールとしてソルビトールに代えて、ラクチトール、キシリトールを用いた。また、糖アルコールに代えて、グルコース、カルボキシメチルセルロース・ナトリウム塩（糖アルコールではない）を用いて比較した。化学研磨剤に含まれる水酸化ナトリウム、糖アルコール、又はグルコース及び水の含有量、試験片の化学研磨剤への浸漬時間は表１４～１６に示す。 (Examples 33 to 37, Comparative Examples 4 to 5)
The test piece was evaluated by performing a chemical polishing treatment in the same manner as in Example 32. Lactitol and xylitol were used as sugar alcohols instead of sorbitol. In addition, instead of sugar alcohol, glucose and carboxymethyl cellulose sodium salt (not sugar alcohol) were used for comparison. Tables 14 to 16 show the contents of sodium hydroxide, sugar alcohol, glucose and water contained in the chemical abrasive, and the immersion time of the test piece in the chemical abrasive.
　９つの水酸基を有する糖アルコールであるラクチトール、又は５つの水酸基を有する糖アルコールであるキシリトールを含む化学研磨剤で処理することによって、光沢が得られることが分かった。さらに、糖アルコールの量を増やすことによって、光沢度が増加することが分かった。また、グルコースを用いた場合には、炭化してしまうため、実用化が難しいことが分かった。また、カルボキシメチルセルロース・ナトリウム塩を用いた場合にも、光沢度の明らかな増加は確認できなかった。 It was found that gloss can be obtained by treating with a chemical abrasive containing lactitol, which is a sugar alcohol having 9 hydroxyl groups, or xylitol, which is a sugar alcohol having 5 hydroxyl groups. Furthermore, it was found that increasing the amount of sugar alcohol increased the glossiness. It was also found that when glucose is used, it is carbonized and therefore difficult to put into practical use. In addition, no clear increase in glossiness could be confirmed even when carboxymethyl cellulose / sodium salt was used.
Figure JPOXMLDOC01-appb-T000014
Figure JPOXMLDOC01-appb-T000014
Figure JPOXMLDOC01-appb-T000015
Figure JPOXMLDOC01-appb-T000015
Figure JPOXMLDOC01-appb-T000016
Figure JPOXMLDOC01-appb-T000016
（実施例３８、３９、比較例６、７）
　上述した方法により、脱脂処理、及びエッチング処理を施した試験片を、アルカリ金属塩として水酸化カリウムまたは水酸化リチウム・１水和物、水溶性有機溶媒としてエチレングリコール、及び水を含む化学研磨剤に浸漬し、化学研磨処理を行った。なお、化学研磨処理時の浴温は５５℃とした。化学研磨剤に含まれる水酸化カリウムまたは水酸化リチウム・１水和物、エチレングリコール及び水の含有量、試験片の化学研磨剤への浸漬時間は表１７、１８にそれぞれ示す。また、上述した分析方法に従って分析した結果を表１７、１８に合わせて示す。 (Examples 38 and 39, Comparative Examples 6 and 7)
A chemical abrasive containing potassium hydroxide or lithium hydroxide monohydrate as an alkali metal salt, ethylene glycol as a water-soluble organic solvent, and water in a test piece that has been degreased and etched by the method described above. Was immersed in and chemically polished. The bath temperature during the chemical polishing treatment was 55 ° C. Tables 17 and 18 show the contents of potassium hydroxide or lithium hydroxide monohydrate, ethylene glycol and water contained in the chemical abrasive, and the immersion time of the test piece in the chemical abrasive, respectively. The results of analysis according to the above-mentioned analysis method are also shown in Tables 17 and 18.
Figure JPOXMLDOC01-appb-T000017
Figure JPOXMLDOC01-appb-T000017
Figure JPOXMLDOC01-appb-T000018
Figure JPOXMLDOC01-appb-T000018
　アルカリ金属塩として、水酸化ナトリウムに代えて、水酸化カリウム、及び水酸化リチウム・１水和物を用いた場合にも、水と水溶性有機溶媒を併用することによって、光沢度が増加することが確認された。 Even when potassium hydroxide and lithium hydroxide monohydrate are used instead of sodium hydroxide as the alkali metal salt, the glossiness is increased by using water and a water-soluble organic solvent in combination. Was confirmed.
（実施例４０～４６、参考例３～８）
　実施例５と同様の条件により、化学研磨処理を行い、試験片を評価した。化学研磨剤に含まれる水酸化ナトリウム、エチレングリコール及び水の含有量、試験片の化学研磨剤への浸漬時間は表１９に示す。また、試験片をブラスト加工されたＡ１０５０に代えて、水ヘアー加工されたＡ１０５０、ブラスト加工されたＡ５０５２、又は未加工のＡ７０７５を用いて、試験片の材質の違いによる影響を確認した結果を表２０～表２２に示す。なお、化学研磨剤に含まれる水酸化ナトリウム、エチレングリコール及び水の含有量、試験片の化学研磨剤への浸漬時間は表２０～表２２に示す。また、脱脂処理、又はエッチング処理のみを施した試験片の光沢度を参考例３～８として表２０～２２に示す。 (Examples 40 to 46, reference examples 3 to 8)
Chemical polishing treatment was performed under the same conditions as in Example 5, and the test pieces were evaluated. Table 19 shows the contents of sodium hydroxide, ethylene glycol and water contained in the chemical polishing agent, and the immersion time of the test piece in the chemical polishing agent. In addition, the results of confirming the effect of the difference in the material of the test piece using water-haired A1050, blasted A5052, or unprocessed A7075 instead of the blasted A1050 are shown in the table. 20 to 22 are shown. The contents of sodium hydroxide, ethylene glycol and water contained in the chemical polishing agent and the immersion time of the test piece in the chemical polishing agent are shown in Tables 20 to 22. The glossiness of the test piece subjected to the degreasing treatment or the etching treatment is shown in Tables 20 to 22 as Reference Examples 3 to 8.
Figure JPOXMLDOC01-appb-T000019
Figure JPOXMLDOC01-appb-T000019
Figure JPOXMLDOC01-appb-T000020
Figure JPOXMLDOC01-appb-T000020
Figure JPOXMLDOC01-appb-T000021
Figure JPOXMLDOC01-appb-T000021
Figure JPOXMLDOC01-appb-T000022
Figure JPOXMLDOC01-appb-T000022
　実施例４０～４６の結果から、水、アルカリ金属塩、及び、水溶性有機溶媒を含む化学研磨剤は、アルミニウム又はアルミニウム合金の種類、及びアルミニウム又はアルミニウム合金の加工方法に関わらず、アルミニウム又はアルミニウム合金に対して、光輝性を付与できることが分かった。 From the results of Examples 40 to 46, the chemical abrasive containing water, an alkali metal salt, and a water-soluble organic solvent is aluminum or aluminum regardless of the type of aluminum or aluminum alloy and the processing method of aluminum or aluminum alloy. It was found that the alloy can be imparted with brilliance.
（比較例８～１１）
　上述した方法により、脱脂処理、及びエッチング処理を施した試験片を、９８％硫酸、及び水溶性有機溶媒としてエチレングリコールを含む化学研磨剤に浸漬し、化学研磨処理を行った。なお、化学研磨処理時の浴温は８０℃とした。化学研磨剤に含まれる９８％硫酸、エチレングリコールの含有量、試験片の化学研磨剤への浸漬時間は表２３に示す。また、上述した分析方法に従って分析した結果を表２３に合わせて示す。 (Comparative Examples 8 to 11)
The test piece subjected to the degreasing treatment and the etching treatment by the above-mentioned method was immersed in a chemical polishing agent containing 98% sulfuric acid and ethylene glycol as a water-soluble organic solvent to perform the chemical polishing treatment. The bath temperature during the chemical polishing treatment was 80 ° C. Table 23 shows the contents of 98% sulfuric acid and ethylene glycol contained in the chemical polishing agent, and the immersion time of the test piece in the chemical polishing agent. The results of analysis according to the above-mentioned analysis method are also shown in Table 23.
Figure JPOXMLDOC01-appb-T000023
Figure JPOXMLDOC01-appb-T000023
　表２３に示す通り、アルカリ金属塩に代えて、９８％硫酸を用いると、光沢度が増加しないことが分かった。また、９８％硫酸と水溶性有機溶媒を併用した場合にも、光沢度の増加は確認されなかった。 As shown in Table 23, it was found that the glossiness did not increase when 98% sulfuric acid was used instead of the alkali metal salt. In addition, no increase in glossiness was confirmed when 98% sulfuric acid and a water-soluble organic solvent were used in combination.

Claims (12)

  1. （Ａ）水、
    （Ｂ）アルカリ金属塩、及び、
    （Ｃ）水溶性有機溶媒、又は４～９つの水酸基を有する糖アルコール
    を含む、アルミニウム又はアルミニウム合金用化学研磨剤であって、
    前記水に対する前記アルカリ金属塩の質量比（アルカリ金属塩／水）が、０．０７５以上である、化学研磨剤。     (A) Water,
    (B) Alkali metal salt and
    (C) A chemical abrasive for aluminum or an aluminum alloy containing a water-soluble organic solvent or a sugar alcohol having 4 to 9 hydroxyl groups.
    A chemical abrasive having a mass ratio of the alkali metal salt to water (alkali metal salt / water) of 0.075 or more.
  2. 前記化学研磨剤中、前記アルカリ金属塩の濃度が３０ｇ／Ｌ以上である、請求項１に記載の化学研磨剤。 The chemical polishing agent according to claim 1, wherein the concentration of the alkali metal salt in the chemical polishing agent is 30 g / L or more.
  3. 前記水と、前記水溶性有機溶媒との体積比（水：水溶性有機溶媒）が、１０：９０～９０：１０である、請求項１又は２に記載の化学研磨剤。 The chemical abrasive according to claim 1 or 2, wherein the volume ratio of the water to the water-soluble organic solvent (water: water-soluble organic solvent) is 10:90 to 90:10.
  4. 前記化学研磨剤中、前記糖アルコールの濃度が１００ｇ／Ｌ以上である、請求項１又は２に記載の化学研磨剤。 The chemical abrasive according to claim 1 or 2, wherein the concentration of the sugar alcohol in the chemical abrasive is 100 g / L or more.
  5. 前記アルカリ金属塩が、アルカリ金属水酸化物である、請求項１～４のいずれかに記載の化学研磨剤。 The chemical abrasive according to any one of claims 1 to 4, wherein the alkali metal salt is an alkali metal hydroxide.
  6. 前記水溶性有機溶媒が、１～４つの水酸基を有する水溶性有機溶媒、及びポリグリセリンからなる群より選択される１種以上である、請求項１～５のいずれかに記載の化学研磨剤。 The chemical abrasive according to any one of claims 1 to 5, wherein the water-soluble organic solvent is at least one selected from the group consisting of a water-soluble organic solvent having 1 to 4 hydroxyl groups and polyglycerin.
  7. （Ａ）水、
    （Ｂ）アルカリ金属塩、及び、
    （Ｃ）水溶性有機溶媒、又は４～９つの水酸基を有する糖アルコール
    を含むアルミニウム又はアルミニウム合金用化学研磨剤に、アルミニウム又はアルミニウム合金を浸漬する工程を含む、アルミニウム又はアルミニウム合金の化学研磨方法であって、
    前記水に対する前記アルカリ金属塩の質量比（アルカリ金属塩／水）が、０．０７５以上である、化学研磨方法。     (A) Water,
    (B) Alkali metal salt and
    (C) A method for chemically polishing aluminum or an aluminum alloy, which comprises a step of immersing aluminum or an aluminum alloy in a water-soluble organic solvent or a chemical polishing agent for aluminum or an aluminum alloy containing a sugar alcohol having 4 to 9 hydroxyl groups. There,
    A chemical polishing method in which the mass ratio of the alkali metal salt to the water (alkali metal salt / water) is 0.075 or more.
  8. 前記化学研磨剤中、前記アルカリ金属塩の濃度が３０ｇ／Ｌ以上である、請求項７に記載の化学研磨方法。 The chemical polishing method according to claim 7, wherein the concentration of the alkali metal salt in the chemical polishing agent is 30 g / L or more.
  9. 前記水と、前記水溶性有機溶媒との体積比（水：水溶性有機溶媒）が、１０：９０～９０：１０である、請求項７又は８記載の化学研磨方法。 The chemical polishing method according to claim 7 or 8, wherein the volume ratio of the water to the water-soluble organic solvent (water: water-soluble organic solvent) is 10:90 to 90:10.
  10. 前記化学研磨剤中、前記糖アルコールの濃度が１００ｇ／Ｌ以上である、請求項７又は８に記載の化学研磨方法。 The chemical polishing method according to claim 7 or 8, wherein the concentration of the sugar alcohol in the chemical polishing agent is 100 g / L or more.
  11. 前記アルカリ金属塩が、アルカリ金属水酸化物である、請求項７～１０のいずれかに記載の化学研磨方法。 The chemical polishing method according to any one of claims 7 to 10, wherein the alkali metal salt is an alkali metal hydroxide.
  12. 前記水溶性有機溶媒が、１～４つの水酸基を有する水溶性有機溶媒、及びポリグリセリンからなる群より選択される１種以上である、請求項７～１１のいずれかに記載の化学研磨方法。  The chemical polishing method according to any one of claims 7 to 11, wherein the water-soluble organic solvent is at least one selected from the group consisting of a water-soluble organic solvent having 1 to 4 hydroxyl groups and polyglycerin.
PCT/JP2020/038853 2019-11-21 2020-10-15 Chemical polishing agent and chemical polishing method WO2021100369A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2021558221A JPWO2021100369A1 (en) 2019-11-21 2020-10-15
CN202080080247.2A CN114729459A (en) 2019-11-21 2020-10-15 Chemical polishing agent and chemical polishing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-210612 2019-11-21
JP2019210612 2019-11-21

Publications (1)

Publication Number Publication Date
WO2021100369A1 true WO2021100369A1 (en) 2021-05-27

Family

ID=75980614

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2020/038853 WO2021100369A1 (en) 2019-11-21 2020-10-15 Chemical polishing agent and chemical polishing method

Country Status (3)

Country Link
JP (1) JPWO2021100369A1 (en)
CN (1) CN114729459A (en)
WO (1) WO2021100369A1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001523753A (en) * 1997-11-13 2001-11-27 日本パーカライジング株式会社 Composition and method for cleaning and deoxidizing aluminum
CN104962920A (en) * 2015-07-27 2015-10-07 马鞍山市华冶铝业有限责任公司 Aluminum profile alkaline corrosion solution as well as preparation method, application and application method thereof
CN110093608A (en) * 2019-05-29 2019-08-06 东北大学 A kind of surface polishing liquid of increasing material manufacturing aluminium alloy and application

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4417949A (en) * 1982-09-07 1983-11-29 Mcdonnell Douglas Corporation Enhanced aluminum etchant
CN105780006A (en) * 2014-12-17 2016-07-20 王叶苗 Anti-corrosion aluminum alloy polishing solution
CN105506633A (en) * 2015-12-31 2016-04-20 芜湖市金宇石化设备有限公司 Alkali etching method of aluminum section bar
CN108884586A (en) * 2016-03-28 2018-11-23 奥野制药工业株式会社 Anodic oxidation overlay film sealing pores liquid, concentrate and the sealing pores method of aluminium alloy
CN110050053B (en) * 2016-12-28 2022-04-01 霓达杜邦股份有限公司 Polishing composition and polishing method
CN108950565B (en) * 2018-08-16 2021-02-05 广州波耳化工科技有限公司 Aluminum alloy chemical polishing agent and aluminum alloy surface polishing method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001523753A (en) * 1997-11-13 2001-11-27 日本パーカライジング株式会社 Composition and method for cleaning and deoxidizing aluminum
CN104962920A (en) * 2015-07-27 2015-10-07 马鞍山市华冶铝业有限责任公司 Aluminum profile alkaline corrosion solution as well as preparation method, application and application method thereof
CN110093608A (en) * 2019-05-29 2019-08-06 东北大学 A kind of surface polishing liquid of increasing material manufacturing aluminium alloy and application

Also Published As

Publication number Publication date
JPWO2021100369A1 (en) 2021-05-27
CN114729459A (en) 2022-07-08

Similar Documents

Publication Publication Date Title
JP2007136469A (en) Fine surface finish and high efficiency descaling method of hot-rolled steel strip
CN103852358B (en) The display packing of a kind of ultra low carbon IF thin plate metallographic structure
US6309556B1 (en) Method of manufacturing enhanced finish sputtering targets
JP2008121118A (en) Electropolishing process
Sun Kinetics of layer growth during plasma nitriding of nickel based alloy Inconel 600
EP2458033B1 (en) Procedure of dynamic deep etching and particle extraction from aluminium alloys
CN107629701A (en) Polishing fluid and preparation method thereof
JP2006348368A (en) Method for surface treating aluminum and aluminum alloy
WO2021100369A1 (en) Chemical polishing agent and chemical polishing method
JP2019090085A (en) Electrolytic polishing liquid and method for manufacturing processed metal
CN110016706A (en) Aluminum alloy treatment process and aluminum alloy
US2287050A (en) mummert
CN108486573A (en) A kind of environment-friendly type stainless steel chemical polishing solution and its preparation and polishing method
KR101131146B1 (en) Composition for desmut treatment and method of desmut treatment of aluminum alloy using the same
BRPI0708890B1 (en) PROCESS FOR PRODUCTION OF A METAL COMPONENT
CN110954388A (en) Metallographic corrosive agent for laser cladding layer of titanium alloy containing rare earth and tissue display method
US20160168742A1 (en) Method for anodizing aluminum alloy workpiece, method for surface treating aluminum alloy workpiece, and anodizing solution mixes
JP5023477B2 (en) Pickling method of stainless hot rolled steel strip and stainless hot rolled steel strip
TW201723232A (en) Rust-removal composition and acidic rust-removal method using same which comprises: phosphoric aqueous solution, polyacid, polyol aqueous solution, polyphosphate, corrosion inhibitor, surfactant and water
JP2009226535A (en) Zinc alloy shot
US1678359A (en) Method of treating metal articles
RU2301286C1 (en) Composition for removal of the corrosion products from the surfaces of the details produced out of the zinc-coated and cadmium-plated carbon steel
JP2004325190A (en) Method of making austenitic grain boundary of steel emerged
US2418955A (en) Process of removing foreign matter from magnesium surfaces
JP7074382B1 (en) Aluminum satin treatment liquid and aluminum satin treatment method

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 20889862

Country of ref document: EP

Kind code of ref document: A1

DPE1 Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101)
ENP Entry into the national phase

Ref document number: 2021558221

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 20889862

Country of ref document: EP

Kind code of ref document: A1