CN107629701A - Polishing fluid and preparation method thereof - Google Patents
Polishing fluid and preparation method thereof Download PDFInfo
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- CN107629701A CN107629701A CN201711062417.0A CN201711062417A CN107629701A CN 107629701 A CN107629701 A CN 107629701A CN 201711062417 A CN201711062417 A CN 201711062417A CN 107629701 A CN107629701 A CN 107629701A
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- polishing fluid
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Abstract
The present invention relates to glass manufacturing area, more particularly to a kind of polishing fluid and preparation method thereof, wherein described polishing fluid contains abrasive material, oxidant, dispersant and pH adjusting agent, with abrasive material, on the basis of the total amount of oxidant and dispersant, abrasive content is 55 80 weight %, oxygenate content is 2 20 weight %, dispersant is 6 25 weight %, the preparation method includes abrasive material and dispersant being dissolved in the water, it is stirring evenly and then adding into oxidant, it is stirring evenly and then adding into pH adjusting agent, the invention further relates to glass polishing method, glass is processed by shot blasting including the use of polishing fluid of the present invention.The made polishing fluid of the present invention, solution dispersion stabilization, polishing efficiency are high, surface roughness is low after glass polishing, glass surface is smooth, and polishing fluid passes through high-strength mechanical friction, enhance close contact and the interaction of various compounding ingredients, each component Synergistic function is given full play to, makes polishing fluid more excellent performance.
Description
Technical field
The present invention relates to glass manufacturing area, and in particular to a kind of polishing fluid and preparation method thereof.
Background technology
Optical glass requires very high to glass surface finishes, and during post-processing, polishing process determines into glass sheet
Quality, at present polishing fluid on the market occur that condensation, polishing efficiency are low, glass surface is of poor quality in use etc. and ask
Topic, and the suspension of existing polishing fluid and dispersiveness are poor.
The content of the invention
The invention aims to overcome present in prior art, polishing efficiency is low, glass surface is of poor quality and existing
A kind of the problem of suspension and poor dispersiveness of some polishing fluids, there is provided polishing fluid and preparation method thereof.
To achieve these goals, one aspect of the present invention provides a kind of polishing fluid, wherein, the polishing fluid contains mill
Material, oxidant, dispersant and pH adjusting agent, on the basis of the total amount of abrasive material, oxidant and dispersant, the content of the abrasive material is
55-80 weight %, the content of the oxidant is 2-20 weight %, and the content of the dispersant is 6-25 weight %..
Another aspect of the present invention provides a kind of preparation method of above-mentioned polishing fluid, wherein, methods described includes first will mill
Material and dispersant are dissolved in the water, and are stirring evenly and then adding into oxidant, are stirring evenly and then adding into pH adjusting agent.
Third aspect present invention provides a kind of glass polishing method, wherein, methods described is including the use of of the present invention
Polishing fluid glass is processed by shot blasting.
Polishing fluid of the present invention is advantageous to the polishing of glass in alkalescence；Oxidant is added in polishing fluid, can be short
The weak oxide-film of one layer of adhesion is formed in glass surface in time, is advantageous to mechanical removal, improves glass clearance, is saved
Polishing time；Dispersant is added, ensures that solution has enough dispersion stabilizations, burnishing surface is not easy to scratch, not damage polish machine.
Compared with existing polishing fluid, the made polishing fluid of the present invention, solution dispersion stabilization, polishing efficiency are high, surface after glass polishing
Roughness is low, glass surface is smooth.In addition, polishing fluid of the present invention is various compound by high-strength mechanical friction, enhancing
The close contact of component and interaction, give full play to the Synergistic function of various compounding ingredients so that polishing fluid performance is more
To be excellent.
Embodiment
The end points of disclosed scope and any value are not limited to the accurate scope or value herein, these scopes or
Value should be understood to comprising the value close to these scopes or value.For number range, between the endpoint value of each scope, respectively
It can be combined with each other between the endpoint value of individual scope and single point value, and individually between point value and obtain one or more
New number range, these number ranges should be considered as specific open herein.
One aspect of the present invention provides a kind of polishing fluid, wherein, the polishing fluid contain abrasive material, oxidant, dispersant and
PH adjusting agent, on the basis of the total amount of abrasive material, oxidant and dispersant, the content of the abrasive material is 55-80 weight %, the oxygen
The content of agent is 2-20 weight %, and the content of the dispersant is 6-25 weight %.
Preferably, on the basis of the total amount of abrasive material, oxidant and dispersant, the polishing fluid contains 56-70 weight %'s
The dispersant of abrasive material, 5-15 weight % oxidant and 10-20 weight %.
In the present invention, it is preferred to the abrasive material is rare earth oxide, it is further preferred that the abrasive material is CeO2With/
Or La2O3.The cerium oxide and lanthana abrasive hardness of the present invention is moderate, fine size and even particle size distribution, suitable for precision instrument
Polishing.
In the present invention, CeO2And La2O3Weight ratio can be 2-5:0.5-2, preferably 1.5-4:0.55-1.8.This
CeO in invention2And La2O3The compound abrasive that abrasive material is mixed to form, it is more beneficial for raising and is polished material remove rate and smooth
Degree.
In the present invention, the granularity of the abrasive material can be 0.5-0.7 μm, preferably 0.55-0.65 μm.It is described herein
The granularity of abrasive material refer to：The diameter of mineral or particle (millimeter, micron) size.
In situations where it is preferred, oxidant of the present invention is at least one of potassium permanganate, manganese dioxide.The present invention
Described in oxidant can form the weak oxide-film of one layer of adhesion in glass surface in a short time, be advantageous to machinery and go
Remove, improve glass clearance, save polishing time.
In situations where it is preferred, dispersant of the present invention is neopelex, dodecyl sodium sulfate, poly- second
At least one of alkene pyrrolidone and lauric acid amide of ethanol.These dispersants cause the polishing fluid prepared by the present invention to hang
Buoyancy is strong, be not easy deposition and dispersion stabilization is good.
In the present invention, it is preferred to the pH adjusting agent is in sodium carbonate, potassium carbonate, sodium hydroxide and potassium hydroxide
It is at least one.PH adjusting agent can adjust the pH value of polishing fluid, make polishing fluid pH value for alkalescence, preferably pH 7-8.Polishing fluid
PH for alkalescence so that in polishing process, mechanism and chemical action reach peering state, in this case, chemistry
The uniformity of effect is good so that surface tension is small, and processing uniformity is good, can obtain good surface finish.
In the present invention, the pH value of the polishing fluid can be alkalescence, it is highly preferred that pH value is 7-8.
The second aspect of the present invention is related to a kind of preparation method of polishing fluid of the present invention, and this method includes：First will
Abrasive material and dispersant are dissolved in the water, and are stirring evenly and then adding into oxidant, are stirring evenly and then adding into pH adjusting agent.
The third aspect of the present invention is related to a kind of glass polishing method, and this method is including the use of polishing fluid of the present invention
Glass is processed by shot blasting.
The present invention will be described in detail by way of examples below.
Embodiment 1-7
Abrasive material, dispersant and oxidant are weighed according to the content of each component in polishing fluid.Abrasive material, dispersant are dissolved in right amount
Water in, carry out mechanical agitation, after being uniformly dispersed, continuously add oxidant, carry out mechanical agitation, then, add appropriate
The pH value of pH value regulator regulation polishing fluid is to 7-8, you can obtains described alkalescence polishing liquid A1-A6.
Comparative example 1-3
The components such as commercially available cerium oxide powder are dissolved in appropriate water, polishing fluid D1-D3 is made.
Table 1
Embodiment 12-18 and comparative example 19-22
Identical glass is polished respectively using polishing fluid A1-A7 and D1-D4, then carries out following test, as a result
It is illustrated in table 2.
Clearance：After the completion of polishing, after cleaning glass, glass surface quality and polishing speed are detected, is surveyed with precision balance
Front and rear of poor quality, the calculating clearance of amount polishing.
Surface roughness：Using the surface roughness of the glass after surface roughness tester detection polishing.
Universal testing machine and Vickers measure glass breakage toughness K are used with reference to ASTM E-1820IC。
Table 2
It can be seen that by the result of table 1 after being polished using polishing fluid of the present invention to glass, glass surface
Roughness is low, clearance is high, glass surface is smooth.Moreover, polishing fluid of the present invention passes through high-strength mechanical friction, enhancing
The close contact of various compounding ingredients and interaction, the Synergistic function of various compounding ingredients is given full play to so that throw
Light fluidity can be more excellent.
The preferred embodiment of the present invention described in detail above, still, the present invention is not limited thereto.In the skill of the present invention
In art concept, technical scheme can be carried out a variety of simple variants, including each technical characteristic with it is any its
Its suitable method is combined, and these simple variants and combination should equally be considered as content disclosed in this invention, belong to
Protection scope of the present invention.
Claims (10)
1. a kind of polishing fluid, it is characterised in that the polishing fluid contains abrasive material, oxidant, dispersant and pH adjusting agent, with mill
On the basis of the total amount of material, oxidant and dispersant, the content of the abrasive material is 55-80 weight %, and the content of the oxidant is
2-20 weight %, the content of the dispersant is 6-25 weight %.
2. polishing fluid according to claim 1, it is characterised in that the abrasive material is rare earth oxide, preferably CeO2With/
Or La2O3。
3. polishing fluid according to claim 1, it is characterised in that CeO2And La2O3Weight ratio be 2-5:0.5-2.
4. according to the polishing fluid described in any one in claim 1-3, it is characterised in that the granularity of the abrasive material is 0.5-
0.7μm。
5. polishing fluid according to claim 1, it is characterised in that the oxidant is potassium permanganate and/or manganese dioxide.
6. polishing fluid according to claim 1, it is characterised in that the dispersant is neopelex, 12
At least one of sodium alkyl sulfonate, polyvinylpyrrolidone and lauric acid amide of ethanol.
7. polishing fluid according to claim 1, it is characterised in that the pH adjusting agent is sodium carbonate, potassium carbonate, hydroxide
At least one of sodium and potassium hydroxide.
8. according to the polishing fluid described in any one in claim 1-6, it is characterised in that the pH value of the polishing fluid is 7-8.
9. the preparation method of the polishing fluid in a kind of claim 1-7 described in any one, it is characterised in that this method includes：
First abrasive material and dispersant are dissolved in the water, are stirring evenly and then adding into oxidant, is stirring evenly and then adding into pH adjusting agent.
10. a kind of glass polishing method, it is characterised in that this method is including the use of described in any one in claim 1-7
Polishing fluid is processed by shot blasting to glass.
Priority Applications (1)
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|---|---|---|---|
| CN201711062417.0A CN107629701B (en) | 2017-11-02 | 2017-11-02 | Polishing solution and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711062417.0A CN107629701B (en) | 2017-11-02 | 2017-11-02 | Polishing solution and preparation method thereof |
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| CN107629701A true CN107629701A (en) | 2018-01-26 |
| CN107629701B CN107629701B (en) | 2021-04-13 |
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| CN201711062417.0A Active CN107629701B (en) | 2017-11-02 | 2017-11-02 | Polishing solution and preparation method thereof |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108587479A (en) * | 2018-07-04 | 2018-09-28 | 江西汇诺科技有限公司 | A kind of novel sapphire polishing liquid |
| CN113249035A (en) * | 2020-02-10 | 2021-08-13 | 中国科学院长春光学精密机械与物理研究所 | Chemical mechanical polishing liquid and application thereof |
| CN113292928A (en) * | 2021-05-20 | 2021-08-24 | 内蒙古大学 | Preparation method of nano cerium dioxide polishing solution (powder) |
| CN115433520A (en) * | 2022-08-29 | 2022-12-06 | 内蒙古广禾元纳米高科技有限公司 | Green and environment-friendly chemical mechanical polishing solution for quartz glass and preparation method and application thereof |
| WO2023168780A1 (en) * | 2022-03-08 | 2023-09-14 | 中国机械总院集团海西(福建)分院有限公司 | Polishing solution having low abrasive material content and weak acidity for ultra-precise machining of optical glass, preparation method therefor |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108587479A (en) * | 2018-07-04 | 2018-09-28 | 江西汇诺科技有限公司 | A kind of novel sapphire polishing liquid |
| CN108587479B (en) * | 2018-07-04 | 2021-01-15 | 江西汇诺科技有限公司 | Sapphire polishing solution |
| CN113249035A (en) * | 2020-02-10 | 2021-08-13 | 中国科学院长春光学精密机械与物理研究所 | Chemical mechanical polishing liquid and application thereof |
| CN113249035B (en) * | 2020-02-10 | 2024-05-24 | 长春长光圆辰微电子技术有限公司 | Chemical mechanical polishing solution and application thereof |
| CN113292928A (en) * | 2021-05-20 | 2021-08-24 | 内蒙古大学 | Preparation method of nano cerium dioxide polishing solution (powder) |
| WO2023168780A1 (en) * | 2022-03-08 | 2023-09-14 | 中国机械总院集团海西(福建)分院有限公司 | Polishing solution having low abrasive material content and weak acidity for ultra-precise machining of optical glass, preparation method therefor |
| CN115433520A (en) * | 2022-08-29 | 2022-12-06 | 内蒙古广禾元纳米高科技有限公司 | Green and environment-friendly chemical mechanical polishing solution for quartz glass and preparation method and application thereof |
| CN115433520B (en) * | 2022-08-29 | 2023-11-21 | 内蒙古广禾元纳米高科技有限公司 | Green and environment-friendly chemical mechanical polishing solution for quartz glass and preparation method and application thereof |
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