CN108864949A - A kind of rare earth polishing and preparation method thereof for polished glass - Google Patents

A kind of rare earth polishing and preparation method thereof for polished glass Download PDF

Info

Publication number
CN108864949A
CN108864949A CN201810995131.6A CN201810995131A CN108864949A CN 108864949 A CN108864949 A CN 108864949A CN 201810995131 A CN201810995131 A CN 201810995131A CN 108864949 A CN108864949 A CN 108864949A
Authority
CN
China
Prior art keywords
grinding agent
agent
rare earth
accounts
grinding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201810995131.6A
Other languages
Chinese (zh)
Other versions
CN108864949B (en
Inventor
周利虎
刘宇杰
宋军
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dmitr (suzhou) Electronic Environmental Protection Material Co Ltd
Original Assignee
Dmitr (suzhou) Electronic Environmental Protection Material Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dmitr (suzhou) Electronic Environmental Protection Material Co Ltd filed Critical Dmitr (suzhou) Electronic Environmental Protection Material Co Ltd
Priority to CN201810995131.6A priority Critical patent/CN108864949B/en
Publication of CN108864949A publication Critical patent/CN108864949A/en
Application granted granted Critical
Publication of CN108864949B publication Critical patent/CN108864949B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09GPOLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00Polishing compositions
    • C09G1/02Polishing compositions containing abrasives or grinding agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

The rare earth polishing and preparation method thereof that the invention discloses a kind of for polished glass, including:Abrasive material, surfactant, dispersing agent, pH adjusting agent and water, abrasive material include the first grinding agent, the second grinding agent and the third grinding agent that average grain diameter successively reduces;First grinding agent is made of the ceria of average grain diameter d1,1 d1≤3.5 μm <, second grinding agent is made of the ceria of average grain diameter d2 and zirconium dioxide, 0.5 d2≤1 μm <, third grinding agent is made of the ceria of average grain diameter d3, zirconium dioxide and silica, 0 d3≤0.5 μm <;Preparation:First grinding agent is added in the water of part, part dispersing agent and surfactant is added, obtains mixed liquor, the second grinding agent is added, third grinding agent, remaining dispersing agent and surfactant is added, pH adjusting agent and water is added, is made;The present invention has both high cutting output, great surface quality and the use that can reduce organic matter, environmentally friendly.

Description

A kind of rare earth polishing and preparation method thereof for polished glass
Technical field
The invention belongs to polishing fluid technical fields, more particularly to the polishing fluid that glass is polished, and in particular to a kind of Rare earth polishing and preparation method thereof for polished glass.
Background technique
Currently, the method for glass polishing mainly has chemical polishing, mechanical polishing, chemically mechanical polishing, but due to glass Glass matter itself is crisp, therefore the effect of chemical polishing is unobvious, great difficulty is brought to material surface planarization processing, wherein adding Preferable effect may be implemented relatively added with the method with mechanical polishing effect of abrasive material, it is main using oxidation currently on the market The powder of cerium although the preferable polishing for crisp glass of confronting can be realized to a certain extent, but still is deposited as polishing abrasive material Polishing defect or to environment it is unfriendly, such as more or less exist stock removal rate is insufficient, glass surface it is defective (have scratch or Pit etc.), containing excessive organic matter the problems such as.
Summary of the invention
It is a kind of improved for polishing the technical problem to be solved by the present invention is to overcome the deficiencies of the prior art and provide The rare earth polishing of glass can be realized high stock removal rate, glass surface zero defect, and environmentally friendly.
The present invention additionally provides a kind of preparation method of rare earth polishing for polished glass simultaneously.
In order to solve the above technical problems, a kind of technical solution that the present invention takes is as follows:
A kind of rare earth polishing for polished glass, including abrasive material, surfactant, dispersing agent, pH adjusting agent and Water, the abrasive material include the first grinding agent, the second grinding agent and the third grinding agent that average grain diameter successively reduces;Wherein, described First grinding agent is greater than 1 μm of ceria less than or equal to 3.5 μm by average grain diameter and constitutes, and second grinding agent is by average grain Diameter is respectively greater than 0.5 μm of ceria and zirconium dioxide less than or equal to 1 μm and constitutes, and the third grinding agent is by average grain diameter point It great Yu not zero ceria, zirconium dioxide and the silica composition less than or equal to 0.5 μm.
Some preferred aspects according to the present invention, the particle size difference of first grinding agent and second grinding agent Greater than 0.8 μm, and/or, the particle size difference of second grinding agent and the third grinding agent is greater than 0.5 μm.
Some preferred aspects according to the present invention, in second grinding agent, in terms of mass percentage, the titanium dioxide Cerium accounts for 40-60%, and the zirconium dioxide accounts for 40-60%.It is highly preferred that in second grinding agent, in terms of mass percentage, The ceria accounts for 45-55%, and the zirconium dioxide accounts for 45-55%.A specific aspect according to the present invention, described second In grinding agent, in terms of mass percentage, the ceria accounts for 50%, and the zirconium dioxide accounts for 50%.
Some preferred aspects according to the present invention, in the third grinding agent, in terms of mass percentage, the titanium dioxide Cerium accounts for 40-60%, and the zirconium dioxide accounts for 20-40%, and the silica accounts for 10-30%.It is highly preferred that the third grinding In agent, in terms of mass percentage, the ceria accounts for 45-55%, and the zirconium dioxide accounts for 25-35%, the titanium dioxide Silicon accounts for 15-25%.A specific aspect according to the present invention, in the third grinding agent, in terms of mass percentage, described two Cerium oxide accounts for 50%, and the zirconium dioxide accounts for 30%, and the silica accounts for 20%.
Some preferred aspects according to the present invention, first grinding agent, second grinding agent and third grinding The mass ratio that feeds intake of agent is 1 ︰ 1-30 of 1-30 ︰.
Some preferred aspects according to the present invention are by the pH value that the pH adjusting agent controls the rare earth polishing 9-12.One according to the present invention specific and preferred aspect, the pH adjusting agent includes but is not limited to glycine, hydroxyl paddy Propylhomoserin, triethylamine, hexamethylene diamine.
One according to the present invention specifically and preferably aspect, the dispersing agent are how interior with polyalcohol.
Some preferred aspects according to the present invention, the surfactant are nonionic surface active agent.According to this hair In terms of bright one is specific and preferred, the nonionic surface active agent is selected from fatty alcohol polyoxyethylene ether, alkylol The mixture of one or both of amide.
Some preferred aspects according to the present invention, the rare earth polishing further includes dispersing agent and pH adjusting agent, with matter Percentage composition meter is measured, in the rare earth polishing, first grinding agent accounts for 5-15%, and second grinding agent accounts for 0.5-5%, The third grinding agent accounts for 5-15%, and the surfactant accounts for 0.1-0.5%, and the dispersing agent accounts for 1-5%, the pH value tune Section agent accounts for 0.5-2.5%, and the water accounts for 60-85%.
In the present invention, the water is deionized water.
Another technical solution provided by the invention:A kind of preparation of the rare earth polishing for polished glass described above Method, the preparation method include the following steps:Each component is weighed by formula, first grinding agent is added to described in part In water, the part dispersing agent, the part surfactant is added, stirring obtains mixed liquor, institute is added into the mixed liquor The second grinding agent is stated, is stirred, the third grinding agent is added and the remaining dispersing agent, the remaining surface is lived Property agent, add the 80-90% of the water to formula ratio, stir, the pH adjusting agent is added and adjusts pH to 9-12, formula is added The residue water of amount to get.
Due to the use of above technical scheme, the present invention has the following advantages that compared with prior art:
Rare earth polishing of the invention by the grinding agent of echelon partial size, and control each echelon grinding agent it is specific at Point, during modifying glass surface, reduce the generation of scratch and defect, while also improving cutting force, mentions High polishing efficiency, and also make powder suspension more preferable, is conducive to the stability of polishing fluid, realizes polishing fluid and has both height and cuts The amount of cutting, great surface quality also make polishing fluid suspension stability good, and the phase interworking between the grinding agent for passing through echelon partial size Conjunction also reduces use of the organic matter in polishing fluid, and then to more environment-friendly, meet now to environmental protection in terms of High standards.
Detailed description of the invention
Fig. 1 is the metallographic microscope figure (20 times) that the glass of polishing fluid polishing is not used;
Fig. 2 is the metallographic microscope figure (20 times) of the glass after the polishing fluid polishing treatment prepared using embodiment 1;
Fig. 3 is the metallographic microscope figure (20 times) of the glass after the polishing fluid polishing treatment prepared using embodiment 2;
Fig. 4 is the metallographic microscope figure (20 times) for making the glass after polishing fluid polishing treatment prepared with embodiment 3;
Fig. 5 is the metallographic microscope figure (20 times) of the glass after the polishing fluid polishing treatment prepared using comparative example 1;
Fig. 6 is the metallographic microscope figure (20 times) of the glass after the polishing fluid polishing treatment prepared using comparative example 2;
Fig. 7 is the metallographic microscope figure (20 times) of the glass after the polishing fluid polishing treatment prepared using comparative example 3;
Fig. 8 is the metallographic microscope figure (20 times) of the glass after the polishing fluid polishing treatment prepared using comparative example 4;
Fig. 9 is the metallographic microscope figure (20 times) of the glass after the polishing fluid polishing treatment prepared using comparative example 5.
Specific embodiment
Above scheme is described further below in conjunction with specific embodiment;It should be understood that these embodiments are for illustrating The basic principles, principal features and advantages of the present invention, and the present invention is not by the scope limitation of following embodiment;It is used in embodiment Implementation condition further adjustment can be done according to specific requirement, the implementation condition being not specified is usually the item in routine experiment Part.
In following, unless otherwise specified, all raw materials are both from conventional method system commercially available or by this field It is standby and obtain.In following, in the second grinding agent, in terms of mass percentage, ceria accounts for 50%, and zirconium dioxide accounts for 50%;The In three grinding agents, in terms of mass percentage, ceria accounts for 50%, and zirconium dioxide accounts for 30%, and silica accounts for 20%.Fat Alcohol polyoxyethylene ether is purchased from Jiangsu Province Hai'an petrochemical industry;Alkylolamides can (Shanghai) Shanghai Chemical Co., Ltd. purchased from promise; It is mostly interior to be purchased from BYK with polyalcohol.
Embodiment 1
The present embodiment provides a kind of rare earth polishings for polished glass comprising following component:First grinding agent 10 Part (average grain diameter is 3 μm), the second 5 parts of grinding agent (average grain diameter is 0.9 μm), 10 parts of (average grain diameters 0.3 of third grinding agent μm), it is 0.5 part of fatty alcohol polyoxyethylene ether, mostly interior to match 3 parts of polyalcohol, 1 part of triethylamine, 70.5 parts of deionized water.
The preparation method of rare earth polishing includes the following steps:
Each component is weighed by formula, it is 1 ︰ 2 that the first grinding agent, which is added, and is configured to solid-to-liquid ratio into portions of de-ionized water, is added Enter more than 1/2 in polyalcohol, 1/2 fatty alcohol polyoxyethylene ether, stirs 70min in high speed disperser (2000rpm/min), obtain Mixed liquor, is added the second grinding agent into the mixed liquor, stirs 45min, add third grinding agent and it is remaining it is more It is interior to match polyalcohol, remaining fatty alcohol polyoxyethylene ether, add 90% of deionized water to formula ratio, high speed disperser 40min is stirred in (3000rpm/min), is adjusted the revolving speed of high speed disperser to 1000rpm/min, triethylamine is added, addition is matched The remaining deionized water just measured, 2000rpm/min continue stir 100min to get.
Embodiment 2
The present embodiment provides a kind of rare earth polishings for polished glass comprising following component:First grinding agent 12 Part (average grain diameter is 2 μm), the second 3 parts of grinding agent (average grain diameter is 0.9 μm), 10 parts of (average grain diameters 0.2 of third grinding agent μm), it is 0.5 part of alkylolamides, mostly interior to match 2 parts of polyalcohol, 1 part of glycine, 71.5 parts of deionized water.
Preparation method while example 1.
Embodiment 3
The present embodiment provides a kind of rare earth polishings for polished glass comprising following component:First 9 parts of grinding agent (average grain diameter is 1.6 μm), the second 5 parts of grinding agent (average grain diameter is 0.7 μm), 15 parts of (average grain diameters 0.1 of third grinding agent μm), it is 0.5 part of fatty alcohol polyoxyethylene ether, mostly interior to match 4 parts of polyalcohol, 1 part of hydroxygultamic acid, 65.5 parts of deionized water.
Preparation method while example 1.
Comparative example 1
Substantially with embodiment 1, difference, which is only that, is not added the first grinding agent, and the additive amount of water is adaptively adjusted.
Comparative example 2
Substantially with embodiment 1, difference, which is only that, is not added the second grinding agent, and the additive amount of water is adaptively adjusted.
Comparative example 3
Substantially with embodiment 1, difference, which is only that, is not added third grinding agent, and the additive amount of water is adaptively adjusted.
Comparative example 4
Substantially with embodiment 1, it is single that difference is only that the first grinding agent, the second grinding agent and third grinding agent are all made of Ceria.
Comparative example 5
Substantially with embodiment 1, it is same that difference is only that the first grinding agent, the second grinding agent and third grinding agent are all made of The abrasive material that 2 μm of partial size.
Application example
The embodiment 1-3 and comparative example 1-5 polishing fluid prepared is used to polish glass, concrete technology is:Make Glass polishing (pressure 0.8bar is carried out with Twp-sided polishing machine;Time 15 minutes, revolving speed 1000rpm), it is as follows to measure performance Respectively as shown in figs 1-9, Fig. 1 is that polishing fluid polishing is not used to metallographic microscope figure shown in table one, while before and after glass treatment Glass metallographic microscope figure, Fig. 2 is the metallographic microscope of the glass after the polishing fluid polishing treatment prepared using embodiment 1 Figure, Fig. 3 are the metallographic microscope figure of the glass after the polishing fluid polishing treatment prepared using embodiment 2, and Fig. 4 is to use embodiment The metallographic microscope figure of glass after the polishing fluid polishing treatment of 3 preparations, Fig. 5 are that the polishing fluid prepared using comparative example 1 is polished The metallographic microscope figure of treated glass, Fig. 6 are the metallographic of the glass after the polishing fluid polishing treatment prepared using comparative example 2 Microscope figure, Fig. 7 are the metallographic microscope figure of the glass after the polishing fluid polishing treatment prepared using comparative example 3, and Fig. 8 is to use The metallographic microscope figure of glass after polishing fluid polishing treatment prepared by comparative example 4, Fig. 9 is the polishing prepared using comparative example 5 The metallographic microscope of glass after liquid polishing treatment.
For surface quality with the digital representation of 1-10, numerical value shows that more greatly polished surface quality is better.
Polishing fluid stability:By the polishing fluid of preparation in same standing 1 month under room temperature, whether polishing fluid is observed There is precipitating and whether have peculiar smell, generate foam or breed bacterium.
Table one
The above embodiments merely illustrate the technical concept and features of the present invention, and its object is to allow person skilled in the art Scholar cans understand the content of the present invention and implement it accordingly, and it is not intended to limit the scope of the present invention, it is all according to the present invention Equivalent change or modification made by Spirit Essence, should be covered by the protection scope of the present invention.

Claims (10)

1. a kind of rare earth polishing for polished glass, including abrasive material, surfactant, dispersing agent, pH adjusting agent and water, It is characterized in that, the abrasive material includes the first grinding agent, the second grinding agent and the third grinding agent that average grain diameter successively reduces;Its In, first grinding agent is greater than 1 μm of ceria less than or equal to 3.5 μm by average grain diameter and constitutes, second grinding agent It is respectively greater than 0.5 μm of ceria and zirconium dioxide less than or equal to 1 μm by average grain diameter to constitute, the third grinding agent is by putting down Equal partial size is respectively greater than zero ceria, zirconium dioxide and the silica less than or equal to 0.5 μm and constitutes.
2. the rare earth polishing according to claim 1 for polished glass, which is characterized in that first grinding agent with The particle size difference of second grinding agent is greater than 0.8 μm, and/or, second grinding agent and the third grinding agent Particle size difference is greater than 0.5 μm.
3. the rare earth polishing according to claim 1 for polished glass, which is characterized in that second grinding agent In, in terms of mass percentage, the ceria accounts for 40-60%, and the zirconium dioxide accounts for 40-60%.
4. the rare earth polishing according to claim 1 for polished glass, which is characterized in that the third grinding agent In, in terms of mass percentage, the ceria accounts for 40-60%, and the zirconium dioxide accounts for 20-40%, and the silica accounts for 10-30%。
5. the rare earth polishing according to claim 1 for polished glass, which is characterized in that first grinding agent, The mass ratio that feeds intake of second grinding agent and the third grinding agent is 1 ︰ 1-30 of 1-30 ︰.
6. the rare earth polishing according to claim 1 for polished glass, which is characterized in that adjusted by the pH value The pH value that agent controls the rare earth polishing is 9-12.
7. the rare earth polishing according to claim 1 for polished glass, which is characterized in that the dispersing agent is mostly It is interior to match polyalcohol.
8. the rare earth polishing according to claim 1 for polished glass, which is characterized in that the surfactant is Nonionic surface active agent, the nonionic surface active agent are in fatty alcohol polyoxyethylene ether, alkylolamides One or two kinds of mixtures.
9. the rare earth polishing according to claim 1 for polished glass, which is characterized in that with mass percentage It counts, in the rare earth polishing, first grinding agent accounts for 5-15%, and second grinding agent accounts for 0.5-5%, the third grinding Agent accounts for 5-15%, and the surfactant accounts for 0.1-0.5%, and the dispersing agent accounts for 1-5%, and the pH adjusting agent accounts for 0.5-2.5%, The water accounts for 60-85%.
10. the preparation side described in a kind of any one of claim 1-9 claim for the rare earth polishing of polished glass Method, which is characterized in that the preparation method includes the following steps:Each component is weighed by formula, first grinding agent is added Into the part water, the part dispersing agent, the part surfactant is added, stirring obtains mixed liquor, to the mixing Second grinding agent is added in liquid, stirs, adds the third grinding agent and the remaining dispersing agent, remaining The surfactant adds the 80-90% of the water to formula ratio, stirring, and the pH adjusting agent is added and adjusts pH to 9- 12, be added the residue water of formula ratio to get.
CN201810995131.6A 2018-08-29 2018-08-29 Rare earth polishing solution for polishing glass and preparation method thereof Active CN108864949B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810995131.6A CN108864949B (en) 2018-08-29 2018-08-29 Rare earth polishing solution for polishing glass and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810995131.6A CN108864949B (en) 2018-08-29 2018-08-29 Rare earth polishing solution for polishing glass and preparation method thereof

Publications (2)

Publication Number Publication Date
CN108864949A true CN108864949A (en) 2018-11-23
CN108864949B CN108864949B (en) 2020-07-28

Family

ID=64322240

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810995131.6A Active CN108864949B (en) 2018-08-29 2018-08-29 Rare earth polishing solution for polishing glass and preparation method thereof

Country Status (1)

Country Link
CN (1) CN108864949B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111117792A (en) * 2019-11-22 2020-05-08 北海市龙浩光电科技有限公司 Grinding fluid for cleaning large-size glass cover plate
CN111777951A (en) * 2020-08-11 2020-10-16 陕西国防工业职业技术学院 Chemical mechanical polishing solution for microcrystalline glass
CN112724835A (en) * 2020-12-17 2021-04-30 苏州丰倍生物科技有限公司 Liquid polishing wax for stainless steel and preparation method and application thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD89188A (en) *
CN101096571A (en) * 2006-06-30 2008-01-02 天津晶岭电子材料科技有限公司 Polishing liquid for glass material and preparation method thereof
CN103965790A (en) * 2014-04-25 2014-08-06 泰安麦丰新材料科技有限公司 Zr-Al-Ce polishing solution and preparation method thereof
CN103992743A (en) * 2014-05-09 2014-08-20 杰明纳微电子股份有限公司 Polishing solution containing ceric oxide powder/colloid silicon dioxide mixed abrasive and preparing process thereof
CN104312441A (en) * 2014-10-29 2015-01-28 安阳方圆研磨材料有限责任公司 Silicon-cerium polishing liquid and preparation method thereof

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD89188A (en) *
CN101096571A (en) * 2006-06-30 2008-01-02 天津晶岭电子材料科技有限公司 Polishing liquid for glass material and preparation method thereof
CN103965790A (en) * 2014-04-25 2014-08-06 泰安麦丰新材料科技有限公司 Zr-Al-Ce polishing solution and preparation method thereof
CN103992743A (en) * 2014-05-09 2014-08-20 杰明纳微电子股份有限公司 Polishing solution containing ceric oxide powder/colloid silicon dioxide mixed abrasive and preparing process thereof
CN104312441A (en) * 2014-10-29 2015-01-28 安阳方圆研磨材料有限责任公司 Silicon-cerium polishing liquid and preparation method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111117792A (en) * 2019-11-22 2020-05-08 北海市龙浩光电科技有限公司 Grinding fluid for cleaning large-size glass cover plate
CN111777951A (en) * 2020-08-11 2020-10-16 陕西国防工业职业技术学院 Chemical mechanical polishing solution for microcrystalline glass
CN112724835A (en) * 2020-12-17 2021-04-30 苏州丰倍生物科技有限公司 Liquid polishing wax for stainless steel and preparation method and application thereof

Also Published As

Publication number Publication date
CN108864949B (en) 2020-07-28

Similar Documents

Publication Publication Date Title
CN107987731A (en) A kind of polishing fluid for sapphire 3D polishings and preparation method thereof
CN108864949A (en) A kind of rare earth polishing and preparation method thereof for polished glass
CN109135580B (en) Polishing solution for glass and preparation method thereof
CN107189693B (en) Polishing solution for chemical mechanical polishing of A-direction sapphire and preparation method thereof
CN102643613B (en) Grinding liquid for sapphire substrate and preparation method of grinding liquid
CN109929460A (en) A kind of glass polishing water base cerium oxide polishing slurry and preparation method thereof
CN103030151B (en) Neutral large-particle-size high-concentration and high-purity silica solution, and preparation and use of the same
CN108864948A (en) Glass polishing powder, polishing fluid and preparation method thereof, glass and electronic product
CN104830236A (en) C-axis sapphire polishing solution and preparation method thereof
CN107629701B (en) Polishing solution and preparation method thereof
CN111100559B (en) Water-based magnetorheological polishing solution and preparation method thereof
CN108034360A (en) A kind of CMP planarization liquid and its application in GaAs wafer polishings
CN101671538A (en) Method for preparing silica/ceria composite abrasive grains
CN114231182A (en) Easy-to-cleave gallium oxide wafer chemical mechanical polishing process, polishing solution and preparation method thereof
JP2004155913A (en) Abrasive grain for polishing, manufacturing method therefor, and abrasive
CN101544871B (en) Efficient scratch-free glass polishing solution and manufacturing method thereof
CN114591684A (en) Environment-friendly chemical mechanical polishing solution based on high-purity spherical silica sol, and preparation method and polishing method thereof
CN110041831A (en) A kind of nano-cerium oxide polishing fluid and preparation method thereof
CN108864947A (en) A kind of nano diamond polishing liquid and preparation method thereof
CN115926747B (en) Concentrated aqueous grinding aid and preparation method thereof
CN108655965A (en) Composition for polishing
CN108329842A (en) Polishing fluid composition and preparation method thereof and glass polishing method
CN108822738A (en) A kind of coloured glaze chemical polishing solution
CN114456718A (en) Aluminum oxide polishing solution and preparation method thereof
CN108821324A (en) A kind of nano-cerium oxide and its preparation method and application

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant