CN108822738A - A kind of coloured glaze chemical polishing solution - Google Patents
A kind of coloured glaze chemical polishing solution Download PDFInfo
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- CN108822738A CN108822738A CN201810863757.1A CN201810863757A CN108822738A CN 108822738 A CN108822738 A CN 108822738A CN 201810863757 A CN201810863757 A CN 201810863757A CN 108822738 A CN108822738 A CN 108822738A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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Abstract
The present invention relates to a kind of polishing fluids, and in particular to a kind of chemical polishing solution applied to coloured glaze field belongs to coloured glaze polishing field.Coloured glaze chemical polishing solution of the present invention includes the component of following parts by weight：20-30 parts by weight micron carbonyl nickel powder, 20-30 parts by weight polishing powder, 20-30 parts by weight of lemon acid, 60-80 parts by weight hydrofluoric acid, 20-30 parts by weight of glycerin, 10-20 parts of deionized waters, parts by weight of activated dose of 20-30.By using micron carbonyl nickel powder, as magnetic-particle, and polishing powder and citric acid, hydrofluoric acid is added in the present invention, and the coloured glaze chemical polishing solution physical stability enabled to is strong and polishing effect is good.
Description
Invention field
The present invention relates to a kind of polishing fluids, and in particular to a kind of chemical polishing solution applied to coloured glaze field belongs to coloured glaze
Polishing field.
Background technique
Glass polishing solution used in the production of current glass processing enterprise is mainly thrown with large particle rare-earth oxide powder
Light rubbing agent, overall polishing rates are low, and dispersion stabilization is poor, are easy to cause serious surface scratching, and there is also graduation polishings to imitate
The low defect of rate.Polishing often substantially reduces polishing efficiency for a long time, causes the rapid abrasion of polishing machine, and production efficiency is low, with
And a large amount of consumptive material consumption.The size controlling of polishing powder is usually to be completed by multistage pneumatic separation.Due to micron and sub-micron
Agent solid particle have very high specific surface activation energy, agglomeration cause selection by winnowing can not strict control polishing powder grinding agent grain
Degree and distribution, cause performance of the polishing powder in terms of scuffing to be difficult to stability contorting.
Summary of the invention
The present invention in view of the above-mentioned problems existing in the prior art, proposes that a kind of dispersion stabilization is good, graduation polishing efficiency
High coloured glaze chemical polishing solution.
The purpose of the present invention realizes that a kind of coloured glaze chemical polishing solution, the coloured glaze chemistry is thrown by following technical solution
Light liquid includes the component of following parts by weight：20-30 parts by weight micron carbonyl nickel powder, 20-30 parts by weight polishing powder, 20-30 weight
Amount part citric acid, 60-80 parts by weight hydrofluoric acid, 20-30 parts by weight of glycerin, 10-20 parts of deionized waters, 20-30 are parts by weight of activated
Agent.
By using micron carbonyl nickel powder, as magnetic-particle, and polishing powder and citric acid, hydrofluoric acid, energy is added in the present invention
The coloured glaze chemical polishing solution physical stability enough made is strong and polishing effect is good.
In a kind of above-mentioned coloured glaze chemical polishing solution, the partial size of the micron carbonyl nickel powder is 10-14 μm.The present invention uses
The micron carbonyl nickel powder of above-mentioned partial size as magnetic-particle, effective volume fraction of the particle in suspension then with particle aggregation,
Dispersity tight association, the liquid wrapped up in aggregation increase the effective volume fraction of particle in suspension；Under the same terms
Particle dispersion is more abundant, and effective volume fraction is smaller.Therefore the partial size and effective volume fraction of the magnetic-particle used have closely
Connection, partial size is excessive, then volume is excessive, and it is excessive to be dispersed in effective volume fraction in polishing fluid, is easy to cause polishing fluid not
Stability enhancing；And partial size is too small, then volume reduces, and the effective volume fraction being dispersed in polishing fluid reduces, and is unfavorable for this
The purpose of invention.
In a kind of above-mentioned coloured glaze chemical polishing solution, micron carbonyl nickel powder surface is coated with nanometer iron powder.The present invention
Nanometer iron powder is coated to micron carbonyl nickel powder surface, wherein the partial size of nanometer iron powder is much smaller than micron carbonyl nickel powder, can be in nickel
Powder surface forms complete clad, so that final coloured glaze chemical polishing solution obtained forms the chain structure of orientation, presents
The characteristic of similar solid.Also, in the interaction of two kinds of molecules, both particles are easily assembled, and are mixing
There are particle aggregation, the dynamic process for dispersing, reassociating in journey, different admixtures correspond to different particle aggregations, dispersion
State causes this key parameters of the effective volume fraction of particle in polishing fluid to change, from the rheology of the improvement polishing fluid
Performance.
Preferably, the quality of the nanometer iron powder is the 0.14-0.16% of micron carbonyl nickel powder quality.In coloured glaze of the present invention
In glass chemical polishing solution, if the covering amount of nanometer iron powder is excessive, it is excessive to will lead to its volume, causes to polish in dynamic process
Effective volume fraction in liquid reduces, and the rheological property for improving polishing fluid is unobvious；If the covering amount of nanometer iron powder is very few, reach
Less than the purpose of cladding, therefore the nanometer iron powder of the preferably above-mentioned quality of the present invention.
In a kind of above-mentioned coloured glaze chemical polishing solution, the micron carbonyl nickel powder be by methyl methacrylate-grafted at
The micron carbonyl nickel powder of reason.The present invention carries out combined processing, the micron carbonyl nickel powder table enabled to micron carbonyl nickel powder
There are the clad and cotton-shaped graft of completion in face, and improve polishing fluid resistance to settling energy and its in water-based system
Inoxidizability.
In a kind of above-mentioned coloured glaze chemical polishing solution, the polishing powder includes the component of following mass percent：10-20%
Ce1-xTixO2, 10-20% crystallite frosted, surplus is silica.Ce is added in polishing powder composition of the present invention1-xTixO2, rare earth
Oxide is widely used in polishing field as polishing powder, and the present invention adulterates Ti in the oxide of cerium, obtained Ce1- xTixO2Even particle size, surface corner angle are reduced, and can be reduced and be scratched to coloured glaze surface of polished, and polished surface quality is improved；
Furthermore Ce1-xTixO2The chemical activity of Ce in particle is higher than CeO2The activity of middle Ce, Ce-O key is easier during the polishing process
Fracture and SiO in polishing powder3 2-Complexing occurs to form complex compound and be removed, thus throwing can also be enhanced to a certain extent
The chemical polishing activity of light liquid.
Preferably, the Ce1-xTixO2It is made using high energy wet ball grinding and spray drying.The Ce1-xTixO2System
Preparation Method includes the following steps：In Ce (NO3)3Ti (SO is added for x/ (1-x) according to the molar ratio of Ti/Ce in solution4)2, constant temperature
H is added after stirring in water bath2O2And NH3.H2O reacts 2-3h after adjusting pH to 9-10, uses after filtering and washing and stir at low speed ball milling
Machine grinding, and introduce after high-speed horizontal ball mill carries out ultra fine and be spray-dried and obtain.
The basic step that traditional precipitation method prepare cerium rouge is：Precipitation reaction, centrifugal drying, calcining and grinding screen
Point.Wherein most distinct issues are that particle agglomeration caused by the drying and calcination stage is difficult to solve, and big hard aggregation particle is difficult to
It is refined by general mechanical crushing method, in polishing process, easily forms severe marking in workpiece surface, influence surface polishing matter
Amount.Therefore the present invention uses high energy wet ball grinding, and sub-micron even nanoscale levels are effectively treated in large-particle cerium oxide,
Obtain the cerium oxide abrasive particle of size uniformity and almost spherical.Variable grain degree, energy can be obtained by changing Ball-milling Time
Realize the controllable dispersion to product particle.It needs herein in conjunction with large-scale production, using drying process with atomizing, fine is aoxidized
Cerium slurry carries out low temperature spray drying processing, reduces the secondary agglomeration in fine cerium oxide micelle drying process, thus acquisition
Particle size is uniform, hard aggregation-free bulky grain high-performance cerium oxide powder polishing material.
Preferably, the Ce1-xTixO2For the Ce Jing Guo the ethylenediamine triacetic acid modification of N- lauroyl1-xTixO2,
The modification specifically comprises the following steps：Ce is added in 50-60 DEG C of N- lauroyl ethylenediamine triacetic acid1-xTixO2,
It is stirred to react 10-12h centrifugal filtration and washs filter cake, grind and obtain after dry.The N- lauroyl ethylenediamine triacetic acid and
Ce1-xTixO2Mass ratio be (10-20)：1.
The present invention is to Ce1-xTixO2It is modified, modified particle alignment is close, has one layer of fiber in adsorption
The substance of shape, so that the interface between particle is fuzzy and has bonding phenomenon, this is because organic long chain of polyether-based, is easy
It is intertwined, forms network structure between particles.The organic molecule chain of introducing forms network structure, network-like dispersion
Mutually inherently there is flexibility, resilient after certain deformation, therefore the structure is more stable in certain range of strain, and and
Chain structure, which interacts, strengthens the stability of structure in MR polishing fluid, and deformation variation is smaller under biggish strain, i.e. table
It is now linear viscoelasticity mechanical behavior.
In a kind of above-mentioned coloured glaze chemical polishing solution, the concentration of the citric acid is 200-300g/L.Citric acid is medium
The organic acid of intensity has 3 H+It can ionize, the acidity of citric acid is low, large viscosity, can play dissolution during the polishing process and make
With again passivating film can be formed in substrate surface, substrate is prevented to be corroded.When citric acid concentration is lower than 200g/L, polishing fluid viscosity
Small, ion diffusion velocity is fast, and dissolving metal is fast, is unfavorable for the leveling and polishing of substrate surface, and there are a large amount of points on surface；When it contains
When amount is higher than 300g/L, solution viscosity is big, and surface forms lateral water wave, and polishing velocity is low, and at high cost.
In a kind of above-mentioned coloured glaze chemical polishing solution, the concentration of the hydrofluoric acid is 100-140mL/L.Hydrofluoric acid is inorganic
Strong acid has good dispersibility, can ionize completely in the solution, help to improve the conductivity of polishing fluid, dispersibility and
Anodic current efficiency keeps substrate surface polishing uniform.After heating, the erosiveness of hydrofluoric acid is greatly improved, and contributes to form expansion
Dissipate layer.When fluohydric acid content is lower than 100mL/L, sample is difficult to achieve the effect that leveling；When fluohydric acid content is more than 140mL/L,
Coloured glaze substrate surface excessive erosion, surface smoothness reduce, polishing fluid reduced service life.
In a kind of above-mentioned coloured glaze chemical polishing solution, the concentration of the glycerol is 60-70mL/L.Glycerol is adsorbed on anode
Surface may advantageously facilitate the formation of diffusion layer, can form thin film in stainless steel surface with citric acid, prevent coloured glaze substrate
Excessive erosion, and keep the coloured glaze substrate surface after polishing bright, careful.When glycerol content is lower than 60mL/L, the polishing of coloured glaze substrate
Face is bright, but roughness is poor；When its content is more than 70mL/L, solution viscosity increases, and operation difficulty improves.
In a kind of above-mentioned coloured glaze chemical polishing solution, the activating agent is one or both of oleic acid or polyethylene glycol.
A kind of preparation method of coloured glaze chemical polishing solution, the preparation method include the following steps：
Ultrasonic disperse：It disperses polishing powder in deionized water in high-power ultrasonic method and obtains slurry；
Adjust pH, centrifugation：Micron carbonyl nickel powder, slurry, citric acid, hydrofluoric acid, glycerol and activating agent are mixed, pH is adjusted
For 3.0-4.0, precipitating is centrifuged off after stirring and is obtained.
Compared with prior art, the invention has the advantages that：
1, by using micron carbonyl nickel powder as magnetic-particle and polishing powder and citric acid, hydrofluoric acid is added in the present invention,
The coloured glaze chemical polishing solution physical stability enabled to is strong and polishing effect is good；
2, the present invention pre-processes micron carbonyl nickel powder and polishing powder, can enhance finally obtained chemistry and throw
The stability of light liquid, and it is closer that the particle alignment in polishing fluid can be made to be distributed.
Specific embodiment
The following is specific embodiments of the present invention, and technical scheme of the present invention will be further described, but the present invention is simultaneously
It is not limited to these embodiments.
Table 1：The component and part of embodiment 1-5 coloured glaze chemical polishing solution
Embodiment 1
Ultrasonic disperse：Deionized water is dispersed in high-power ultrasonic method by polishing powder according to the component in 1 embodiment 1 of table
In slurry；The polishing powder includes the component of following mass percent：10%Ce1-xTixO2, 10% crystallite frosted, surplus is
Silica；The Ce1-xTixO2Preparation method include the following steps：In Ce (NO3)3According to the molar ratio of Ti/Ce in solution
Ti (SO is added for x/ (1-x)4)2, H is added after water bath with thermostatic control stirring2O2And NH3.H2O reacts 2h after adjusting pH to 9, and suction filtration is washed
Using stirring at low speed ball mill grinding after washing, and introduces high-speed horizontal ball mill and be spray-dried after ultra fine obtaining；
The Ce1-xTixO2For the Ce Jing Guo the ethylenediamine triacetic acid modification of N- lauroyl1-xTixO2, the modification is specific
Include the following steps：Ce is added in 50 DEG C of N- lauroyl ethylenediamine triacetic acid1-xTixO2, it is stirred to react 10h centrifugal filtration
And filter cake is washed, and it grinds and obtains after dry, the N- lauroyl ethylenediamine triacetic acid and Ce1-xTixO2Mass ratio be 10：1；
Adjust pH, centrifugation：By micron carbonyl nickel powder, slurry, citric acid, hydrofluoric acid, glycerol and the work in 1 embodiment 1 of table
Property agent mixing, adjust pH be 3.0, be centrifuged off precipitating after stirring and obtain；Wherein, the partial size of micron carbonyl nickel powder is 10 μm, institute
It states a micron carbonyl nickel powder surface and is coated with nanometer iron powder, the quality of the nanometer iron powder is micron carbonyl nickel powder quality
0.14%, the micron carbonyl nickel powder is the micron carbonyl nickel powder handled by methyl methacrylate-grafted；The citric acid
Concentration be 200g/L, the concentration of the hydrofluoric acid is 100mL/L, and the concentration of the glycerol is 60mL/L.
Embodiment 2
Ultrasonic disperse：Deionized water is dispersed in high-power ultrasonic method by polishing powder according to the component in 1 embodiment 2 of table
In slurry；The polishing powder includes the component of following mass percent：12%Ce1-xTixO2, 12% crystallite frosted, surplus is
Silica；The Ce1-xTixO2Preparation method include the following steps：In Ce (NO3)3According to the molar ratio of Ti/Ce in solution
Ti (SO is added for x/ (1-x)4)2, H is added after water bath with thermostatic control stirring2O2And NH3.H2O reacts 2.2h after adjusting pH to 9.2, takes out
It is used after filter washing and stirs at low speed ball mill grinding, and introduced after high-speed horizontal ball mill carries out ultra fine and be spray-dried
It arrives；The Ce1-xTixO2For the Ce Jing Guo the ethylenediamine triacetic acid modification of N- lauroyl1-xTixO2, the modification tool
Body includes the following steps：Ce is added in 52 DEG C of N- lauroyl ethylenediamine triacetic acid1-xTixO2, it is stirred to react 10.5h centrifugation
Filter cake is filtered and washed, grinds and obtains after dry.The N- lauroyl ethylenediamine triacetic acid and Ce1-xTixO2Mass ratio be
12：1；
Adjust pH, centrifugation：By micron carbonyl nickel powder, slurry, citric acid, hydrofluoric acid, glycerol and the work in 1 embodiment 2 of table
Property agent mixing, adjust pH be 3.2, be centrifuged off precipitating after stirring and obtain；Wherein, the partial size of micron carbonyl nickel powder is 11 μm, institute
It states a micron carbonyl nickel powder surface and is coated with nanometer iron powder, the quality of the nanometer iron powder is micron carbonyl nickel powder quality
0.145%, the micron carbonyl nickel powder is the micron carbonyl nickel powder handled by methyl methacrylate-grafted；The citric acid
Concentration be 225g/L, the concentration of the hydrofluoric acid is 110mL/L, and the concentration of the glycerol is 62mL/L.
Embodiment 3
Ultrasonic disperse：Deionized water is dispersed in high-power ultrasonic method by polishing powder according to the component in 1 embodiment 3 of table
In slurry；The polishing powder includes the component of following mass percent：15%Ce1-xTixO2, 15% crystallite frosted, surplus is
Silica；The Ce1-xTixO2Preparation method include the following steps：In Ce (NO3)3According to the molar ratio of Ti/Ce in solution
Ti (SO is added for x/ (1-x)4)2, H is added after water bath with thermostatic control stirring2O2And NH3.H2O reacts 2.5h after adjusting pH to 9.5, takes out
It is used after filter washing and stirs at low speed ball mill grinding, and introduced after high-speed horizontal ball mill carries out ultra fine and be spray-dried
It arrives；The Ce1-xTixO2For the Ce Jing Guo the ethylenediamine triacetic acid modification of N- lauroyl1-xTixO2, the modification tool
Body includes the following steps：Ce is added in 55 DEG C of N- lauroyl ethylenediamine triacetic acid1-xTixO2, it is stirred to react 11h and was centrifuged
Filter cake is filtered and washed, grinds and obtains after dry, the N- lauroyl ethylenediamine triacetic acid and Ce1-xTixO2Mass ratio be 15：
1；
Adjust pH, centrifugation：By micron carbonyl nickel powder, slurry, citric acid, hydrofluoric acid, glycerol and the work in 1 embodiment 3 of table
Property agent mixing, adjust pH be 3.5, be centrifuged off precipitating after stirring and obtain；Wherein, the partial size of micron carbonyl nickel powder is 12 μm, institute
It states a micron carbonyl nickel powder surface and is coated with nanometer iron powder, the quality of the nanometer iron powder is micron carbonyl nickel powder quality
0.15%, the micron carbonyl nickel powder is the micron carbonyl nickel powder handled by methyl methacrylate-grafted；The citric acid
Concentration be 250g/L, the concentration of the hydrofluoric acid is 120mL/L, and the concentration of the glycerol is 65mL/L.
Embodiment 4
Ultrasonic disperse：Deionized water is dispersed in high-power ultrasonic method by polishing powder according to the component in 1 embodiment 4 of table
In slurry；The polishing powder includes the component of following mass percent：18%Ce1-xTixO2, 17% crystallite frosted, surplus is
Silica；The Ce1-xTixO2Preparation method include the following steps：In Ce (NO3)3According to the molar ratio of Ti/Ce in solution
Ti (SO is added for x/ (1-x)4)2, H is added after water bath with thermostatic control stirring2O2And NH3.H2O reacts 2.8h after adjusting pH to 9.8, takes out
It is used after filter washing and stirs at low speed ball mill grinding, and introduced after high-speed horizontal ball mill carries out ultra fine and be spray-dried
It arrives；The Ce1-xTixO2For the Ce Jing Guo the ethylenediamine triacetic acid modification of N- lauroyl1-xTixO2, the modification tool
Body includes the following steps：Ce is added in 58 DEG C of N- lauroyl ethylenediamine triacetic acid1-xTixO2, it is stirred to react 11.5h centrifugation
Filter cake is filtered and washed, grinds and obtains after dry.The N- lauroyl ethylenediamine triacetic acid and Ce1-xTixO2Mass ratio be
18：1；
Adjust pH, centrifugation：By micron carbonyl nickel powder, slurry, citric acid, hydrofluoric acid, glycerol and the work in 1 embodiment 4 of table
Property agent mixing, adjust pH be 3.8, be centrifuged off precipitating after stirring and obtain；Wherein, the partial size of micron carbonyl nickel powder is 13 μm, institute
It states a micron carbonyl nickel powder surface and is coated with nanometer iron powder, the quality of the nanometer iron powder is micron carbonyl nickel powder quality
0.155%, the micron carbonyl nickel powder is the micron carbonyl nickel powder handled by methyl methacrylate-grafted；The citric acid
Concentration be 280g/L, the concentration of the hydrofluoric acid is 130mL/L, and the concentration of the glycerol is 68mL/L.
Embodiment 5
Ultrasonic disperse：Deionized water is dispersed in high-power ultrasonic method by polishing powder according to the component in 1 embodiment 5 of table
In slurry；The polishing powder includes the component of following mass percent：20%Ce1-xTixO2, 20% crystallite frosted, surplus is
Silica；The Ce1-xTixO2Preparation method include the following steps：In Ce (NO3)3According to the molar ratio of Ti/Ce in solution
Ti (SO is added for x/ (1-x)4)2, H is added after water bath with thermostatic control stirring2O2And NH3.H2O reacts 3h after adjusting pH to 10, and suction filtration is washed
Using stirring at low speed ball mill grinding after washing, and introduces high-speed horizontal ball mill and be spray-dried after ultra fine obtaining；
The Ce1-xTixO2For the Ce Jing Guo the ethylenediamine triacetic acid modification of N- lauroyl1-xTixO2, the modification is specific
Include the following steps：Ce is added in 60 DEG C of N- lauroyl ethylenediamine triacetic acid1-xTixO2, it is stirred to react 12h centrifugal filtration
And filter cake is washed, it grinds and obtains after dry.The N- lauroyl ethylenediamine triacetic acid and Ce1-xTixO2Mass ratio be 20：1；
Adjust pH, centrifugation：By micron carbonyl nickel powder, slurry, citric acid, hydrofluoric acid, glycerol and the work in 1 embodiment 5 of table
Property agent mixing, adjust pH be 4.0, be centrifuged off precipitating after stirring and obtain；Wherein, the partial size of micron carbonyl nickel powder is 14 μm, institute
It states a micron carbonyl nickel powder surface and is coated with nanometer iron powder, the quality of the nanometer iron powder is micron carbonyl nickel powder quality
0.16%, the micron carbonyl nickel powder is the micron carbonyl nickel powder handled by methyl methacrylate-grafted；The citric acid
Concentration be 300g/L, the concentration of the hydrofluoric acid is 140mL/L, and the concentration of the glycerol is 70mL/L.
Embodiment 6
Difference with embodiment 3 is only that, the partial size of micron carbonyl nickel powder is 9.5 μm in the embodiment, other and implementation
Example 3 is identical, and details are not described herein again.
Embodiment 7
Difference with embodiment 3 is only that, the partial size of micron carbonyl nickel powder is 14.5 μm in the embodiment, other and implementation
Example 3 is identical, and details are not described herein again.
Embodiment 8
Difference with embodiment 3 is only that micron carbonyl nickel powder surface does not have cladding iron powder in the embodiment, other and reality
Apply that example 3 is identical, and details are not described herein again.
Embodiment 9
Difference with embodiment 3 is only that the embodiment micron carbonyl nickel powder does not pass through methyl methacrylate-grafted
Processing, other are same as Example 3, and details are not described herein again.
Embodiment 10
Difference with embodiment 3 is only that the composition of the embodiment polishing powder is only cerium oxide, other and 3 phase of embodiment
Together, details are not described herein again.
Embodiment 11
Difference with embodiment 3 is only that, Ce is not contained in the embodiment polishing powder1-xTixO2, other and 3 phase of embodiment
Together, details are not described herein again.
Embodiment 12
Difference with embodiment 3 is only that, crystallite frosted is not contained in the embodiment polishing powder, other and 3 phase of embodiment
Together, details are not described herein again.
Embodiment 13
Difference with embodiment 3 is only that, Ce in the embodiment polishing powder1-xTixO2Using commonsense method be made, other with
Embodiment 3 is identical, and details are not described herein again.
Embodiment 14
Difference with embodiment 3 is only that, Ce in the embodiment polishing powder1-xTixO2Not pass through modification, other with
Embodiment 3 is identical, and details are not described herein again.
Comparative example 1
Difference with embodiment 3 is only that, which is common commercially available polishing fluid, other and 3 phase of embodiment
Together, details are not described herein again.
Comparative example 2
Difference with embodiment 3 is only that, micron carbonyl nickel powder is not contained in the comparative example coloured glaze chemical polishing solution, other
Same as Example 3, details are not described herein again.
The coloured glaze chemical polishing solution that embodiment 1-14 and comparative example 1-2 are obtained carries out dispersion performance detection, testing result
As shown in table 2.Wherein, it is 0.4T, shearing rate 50S that mangneto shear strength, which is constant in magnetic field strength,-1When measure.
Table 2：The dispersion performance testing result for the coloured glaze chemical polishing solution that embodiment 1-14 and comparative example 1-2 are obtained
The obtained coloured glaze chemical polishing solution of embodiment 1-14 and comparative example 1-2 is used to coloured glaze surface to polish, and right
Coloured glaze surface after polishing carries out performance detection, and testing result is as shown in table 2.
Table 2：Coloured glaze Surface testing result in embodiment 1-14 and comparative example 1-2
It can be seen from the results above that the present invention by using micron carbonyl nickel powder as magnetic-particle, and polishing is added
Powder and citric acid, hydrofluoric acid, the coloured glaze chemical polishing solution physical stability enabled to is strong and polishing effect is good；Also, this
Invention all pre-processes micron carbonyl nickel powder and polishing powder, can enhance the stabilization of finally obtained chemical polishing solution
Property, and it is closer that the particle alignment in polishing fluid can be made to be distributed.
Specific embodiment described herein is only an example for the spirit of the invention.The neck of technology belonging to the present invention
The technical staff in domain can do various modifications or supplement or is substituted in a similar manner to described specific embodiment, but simultaneously
Spirit or beyond the scope defined by the appended claims of the invention is not deviated by.
It is skilled to this field although present invention has been described in detail and some specific embodiments have been cited
For technical staff, as long as it is obvious for can making various changes or correct without departing from the spirit and scope of the present invention.
Claims (10)
1. a kind of coloured glaze chemical polishing solution, which is characterized in that the coloured glaze chemical polishing solution includes the component of following parts by weight：
20-30 parts by weight micron carbonyl nickel powder, 20-30 parts by weight polishing powder, 20-30 parts by weight of lemon acid, 60-80 parts by weight hydrogen fluorine
Acid, 20-30 parts by weight of glycerin, 10-20 parts of deionized waters, parts by weight of activated dose of 20-30.
2. a kind of coloured glaze chemical polishing solution according to claim 1, which is characterized in that the partial size of the micron carbonyl nickel powder
It is 10-14 μm.
3. a kind of coloured glaze chemical polishing solution according to claim 1 or 2, which is characterized in that the micron carbonyl nickel powder table
Bread is covered with nanometer iron powder.
4. being a kind of coloured glaze chemical polishing solution according to claim 3, which is characterized in that the quality of the nanometer iron powder is micro-
The 0.14-0.16% of rice carbonyl nickel powder quality.
5. a kind of coloured glaze chemical polishing solution according to claim 1 or 2, which is characterized in that the micron carbonyl nickel powder is
The micron carbonyl nickel powder handled by methyl methacrylate-grafted.
6. a kind of coloured glaze chemical polishing solution according to claim 1, which is characterized in that the polishing powder includes following quality
The component of percentage：10-20%Ce1-xTixO2, 10-20% crystallite frosted, surplus is silica.
7. a kind of coloured glaze chemical polishing solution according to claim 6, which is characterized in that the Ce1-xTixO2It is wet using high energy
Method ball milling and spray drying are made.
8. a kind of coloured glaze chemical polishing solution according to claim 6 or 7, which is characterized in that the Ce1-xTixO2To pass through
The Ce of N- lauroyl ethylenediamine triacetic acid modification1-xTixO2。
9. a kind of coloured glaze chemical polishing solution according to claim 8, which is characterized in that the N- lauroyl ethylenediamine three
Acetic acid and Ce1-xTixO2Mass ratio be (10-20)：1.
10. a kind of coloured glaze chemical polishing solution according to claim 1, which is characterized in that the concentration of the citric acid is
200-300g/L, the concentration of the hydrofluoric acid are 100-140mL/L, and the concentration of the glycerol is 60-70mL/L.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109732438A (en) * | 2019-01-24 | 2019-05-10 | 泉州市友腾光电科技有限公司 | A kind of good miniature stick mirror plane ring polishing apparatus of polishing effect |
| CN115353808A (en) * | 2022-07-13 | 2022-11-18 | 锦矽半导体(上海)有限公司 | Polishing solution for nickel coating |
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| CN101250380A (en) * | 2008-03-25 | 2008-08-27 | 中国人民解放军国防科学技术大学 | Water-based magneto-rheological polishing liquid for optical processing and preparation method thereof |
| CN103192297A (en) * | 2012-08-24 | 2013-07-10 | 广东工业大学 | Combined machining method for chemistry cluster magneto-rheological of monocrystal silicon carbide wafer |
| US20180200862A1 (en) * | 2017-01-13 | 2018-07-19 | Kunshan Nano New Material Technology Co., Ltd. | 3D Magnetorheological Polishing Device and Magnetorheological Polishing Fluid |
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| CN101250380A (en) * | 2008-03-25 | 2008-08-27 | 中国人民解放军国防科学技术大学 | Water-based magneto-rheological polishing liquid for optical processing and preparation method thereof |
| CN103192297A (en) * | 2012-08-24 | 2013-07-10 | 广东工业大学 | Combined machining method for chemistry cluster magneto-rheological of monocrystal silicon carbide wafer |
| US20180200862A1 (en) * | 2017-01-13 | 2018-07-19 | Kunshan Nano New Material Technology Co., Ltd. | 3D Magnetorheological Polishing Device and Magnetorheological Polishing Fluid |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109732438A (en) * | 2019-01-24 | 2019-05-10 | 泉州市友腾光电科技有限公司 | A kind of good miniature stick mirror plane ring polishing apparatus of polishing effect |
| CN115353808A (en) * | 2022-07-13 | 2022-11-18 | 锦矽半导体(上海)有限公司 | Polishing solution for nickel coating |
| CN115353808B (en) * | 2022-07-13 | 2024-01-23 | 锦矽半导体(上海)有限公司 | Polishing solution for nickel plating |
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| Publication number | Publication date |
|---|---|
| CN108822738B (en) | 2020-05-19 |
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