WO2021097957A1 - Package structure of image sensor chip - Google Patents

Package structure of image sensor chip Download PDF

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Publication number
WO2021097957A1
WO2021097957A1 PCT/CN2019/123923 CN2019123923W WO2021097957A1 WO 2021097957 A1 WO2021097957 A1 WO 2021097957A1 CN 2019123923 W CN2019123923 W CN 2019123923W WO 2021097957 A1 WO2021097957 A1 WO 2021097957A1
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WO
WIPO (PCT)
Prior art keywords
image sensor
sensor chip
light
substrate
filter layer
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Application number
PCT/CN2019/123923
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French (fr)
Chinese (zh)
Inventor
王凯厚
杨剑宏
朱程亮
吴明轩
Original Assignee
苏州晶方半导体科技股份有限公司
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Application filed by 苏州晶方半导体科技股份有限公司 filed Critical 苏州晶方半导体科技股份有限公司
Publication of WO2021097957A1 publication Critical patent/WO2021097957A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures

Definitions

  • This application relates to the field of image acquisition technology, for example, to a packaging structure of an image sensor chip.
  • image sensor components such as a lens and an image sensor chip are integrated in the electronic device to enable the electronic device to have a biological recognition function, for example, iris recognition.
  • Iris recognition is not easy to copy and steal, and has the advantage of higher security for identity recognition. Therefore, image sensor chips have been more and more widely used.
  • the existing packaging structure of the image sensor chip is not conducive to the miniaturization of electronic devices.
  • the present application provides a packaging structure of an image sensor chip to facilitate the miniaturization of electronic equipment.
  • An image sensor chip packaging structure including:
  • a substrate the substrate includes a light-transmitting area and a non-transmitting area surrounding the light-transmitting area, the non-transmitting area is provided with wiring lines;
  • the substrate includes a filter layer, the filter layer is located on the substrate The light-transmitting area and the non-light-transmitting area on the upper part;
  • the filter layer is arranged on the substrate and located in the light-transmitting area and the non-light-transmitting area.
  • the image sensor chip is flip-chip arranged on the side of the substrate away from the filter layer, and the sensing area is arranged toward the side of the substrate. The area corresponds to the light-transmitting area, so that all light transmitted to the image sensor chip passes through the filter layer.
  • the optical filter in the electronic device is clamped on the lens, and the thickness of the optical filter is thicker to be able to be mechanically connected with the lens. In addition, the size of the clamped component is also large. Therefore, the existing The setting of the filter is not conducive to the miniaturization of electronic equipment.
  • the embodiment of the present application arranges the filter layer in the packaging structure of the image sensor chip. Therefore, compared with the related technology, on the one hand, the embodiment of the present application can use a bonding process to attach the filter layer. On the substrate, since the lamination process requires a lower thickness of the filter layer, the thickness of the filter layer can be set to be thinner to facilitate the lighter and thinner package structure of the image sensor chip; on the other hand, the present invention The application embodiment can adopt the bonding process without using the card connection component, which avoids the card connection component occupying the space of the electronic device.
  • the packaging structure of the image sensor chip provided by the embodiments of the present application is beneficial to the miniaturization of electronic devices.
  • the base further includes a light-transmitting substrate, the filter layer is disposed on the surface of the light-transmitting substrate, and the wiring line is disposed on a side of the base close to the image sensor chip.
  • the material of the light-transmitting substrate may be, for example, glass, and the structure of the light-transmitting substrate + filter layer constitutes IR glass.
  • the light-transmitting substrate covers the light-transmitting area and the non-light-transmitting area, plays a role of supporting the filter layer and wiring lines, and improves the stability of the packaging structure of the image sensor chip.
  • the filter layer includes a first filter layer and a second filter layer, and the first filter layer and the second filter layer are respectively disposed on the front and back of the light-transmitting substrate.
  • the front of the light-transmitting substrate refers to the side of the light-transmitting substrate away from the image sensor chip;
  • the back of the light-transmitting substrate refers to the side of the light-transmitting substrate close to the image sensor chip. That is, the filter layer provided on the front surface of the transparent substrate is called the first filter layer, and the filter layer provided on the back surface of the transparent substrate is called the second filter layer.
  • the material of the light-transmitting substrate may be, for example, glass, and the structure of the first filter layer+the light-transmitting substrate+the second filter layer constitutes IR glass.
  • both sides of the transparent substrate are provided with filter layers, which is equivalent to increasing the thickness of the filter layer, which is beneficial to improve the filter effect of the filter layer.
  • the wiring line is arranged on a side of the second filter layer close to the image sensor chip. That is, the wiring line is arranged on the side of the IR glass close to the image sensor chip.
  • the arrangement of the embodiment of the application in this way not only makes the location of the wiring line closer to the image sensor chip, thereby facilitating the connection between the image sensor chip and the wiring line; moreover, there is no need to provide a wiring line between the filter layer and the light-transmitting substrate. It is conducive to the bonding of the filter layer and the light-transmitting substrate, thereby reducing the process cost and improving the production efficiency.
  • the thickness of the filter layer ranges from 100 um to 150 um. This arrangement is not only beneficial to thin the packaging structure of the image sensor chip, but also can ensure the filtering effect of the filter layer.
  • the material of the bumps may be metals such as gold (Au), silver (Ag), aluminum (Al), titanium (Ti), or copper (Cu), and may be gold (Au).
  • One end of the bump is in contact with the image sensor chip.
  • the image sensor chip is provided with a pad at a position corresponding to the bump, and the pad is in contact with one end of the bump.
  • the bumps and the pads can be electrically connected by soldering or heating and melting.
  • the other end of the bump is in contact with the wiring line.
  • the wiring line is provided with a pad at a position corresponding to the bump, and the pad is in contact with the other end of the bump.
  • the bumps and the pads on the wiring lines can be electrically connected by soldering or heating and melting.
  • soldering pad located in the non-transmissive area, the soldering pad is electrically connected to the wiring line, and the surface of the soldering pad away from the light-transmitting substrate has a smaller vertical distance from the light-transmitting substrate than the chip The vertical distance between the side far away from the light-transmitting substrate and the light-transmitting substrate.
  • the soldering pad is used for electrically connecting with an external circuit through conductive glue.
  • the conductive adhesive refers to a colloid with conductive properties, for example, it may be an anisotropic conductive film (ACF).
  • ACF anisotropic conductive film
  • the thickness of the conductive adhesive is thinner, which is beneficial to reduce the thickness of the package structure of the image sensor chip.
  • the overall thickness of the package structure of the image sensor chip is about 800um
  • the conductive glue is used as the connection medium between the wiring lines and the external circuit, the image of the filter layer is included.
  • the thickness of the package structure of the sensor chip is less than or equal to 300 um.
  • the embodiment of the present application can reduce the thickness of the package structure of the image sensor chip.
  • the embodiments of the present application can reduce the heat generated in the bonding process, thereby facilitating the selection of a sealant with better airtightness, and improving the sealant's ability to isolate water vapor.
  • the substrate further includes an insulating layer covering the wiring line; a part of the insulating layer that exposes the wiring line constitutes the bonding pad.
  • the insulating layer includes an opening, and the opening exposes a part of the wiring line, thereby forming a bonding pad.
  • an insulating layer is provided to cover the wiring lines, and a part of the insulating layer that exposes the wiring lines constitutes solder pads.
  • the insulation layer The arrangement is beneficial to provide support for the packaging structure of the image sensor chip and improve the stability of the packaging structure of the image sensor chip.
  • the soldering pad includes a first soldering pad and a second soldering pad; the first soldering pad is located on a side of the second soldering pad away from the light-transmitting area; the first soldering pad and the second soldering pad
  • the insulating layer is arranged between the pads.
  • the first solder pad is electrically connected to the second solder pad.
  • the side of the first solder pad away from the second solder pad is exposed. That is, the side surface of the first solder pad away from the second solder pad is not provided with an insulating layer.
  • the embodiment of the present application is arranged in such a way that the operable space for the conductive adhesive connection of the first soldering pad is relatively large, the operation difficulty is reduced, and the conductive adhesive is beneficial to stick the soldering pad and the external circuit more firmly.
  • the insulating layer is provided on a side of the wiring line close to the light-transmitting area, that is, an insulating layer is also provided on the inner side of the wiring line. Compared with the uneven surface of the wiring line, the surface of the insulating layer is flatter, which facilitates the reflection of the biometric light to the sensing area of the image sensor chip through the surface of the insulating layer.
  • the bonding pads are arranged on one side or both sides of the peripheral area of the chip.
  • the thickness of the packaging structure is less than or equal to 300 um, so that the thickness of the packaging structure of the image sensor chip is thinner.
  • a sealant is provided on the periphery of the image sensor chip, and the sealant seals the image sensor chip and the substrate.
  • the embodiment of the present application is arranged in this way, on the one hand, it can prevent the sensing area of the image sensor chip from being contaminated by external water vapor; on the other hand, the sealant can prevent the image sensor chip from falling off the substrate.
  • the filter layer is located on the substrate, and is located in the light-transmitting area and the non-light-transmitting area.
  • the image sensor chip is flip-chip arranged on the side of the substrate away from the filter layer, and the sensing area is set toward the side of the substrate.
  • the light-transmitting area corresponds so that the light transmitted to the image sensor chip will pass through the filter layer.
  • the optical filter in the electronic device is clamped on the lens, and the thickness of the optical filter is thicker to be able to be mechanically connected with the lens. In addition, the size of the clamped component is also large. Therefore, the existing The setting of the filter is not conducive to the miniaturization of electronic equipment.
  • the present application sets the filter layer in the packaging structure of the image sensor chip. Therefore, compared with the related technology, on the one hand, the present application can use a laminating process to attach the filter layer to the substrate. Since the bonding process requires relatively low thickness of the filter layer, the thickness of the filter layer can be set to be thinner to facilitate the lighter and thinner packaging structure of the image sensor chip; on the other hand, the application can adopt the pasting
  • the technology is integrated without the use of card connection components, which avoids the space of electronic equipment occupied by the card connection components.
  • the packaging structure of the image sensor chip provided by the present application is beneficial to the miniaturization of electronic devices.
  • FIG. 1 is a schematic diagram of an image sensor chip packaging structure provided by an embodiment of the application
  • FIG. 2 is a schematic diagram of another image sensor chip packaging structure provided by an embodiment of the application.
  • FIG. 3 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application.
  • FIG. 4 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application.
  • FIG. 5 is a schematic diagram of the structure of FIG. 4 along the direction C.
  • FIG. 5 is a schematic diagram of the structure of FIG. 4 along the direction C.
  • FIG. 6 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application.
  • FIG. 7 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application.
  • FIG. 8 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application.
  • FIG. 1 is a schematic diagram of an image sensor chip packaging structure provided by an embodiment of the application.
  • the packaging structure of the image sensor includes: a substrate 100 and an image sensor chip 300.
  • the substrate 100 includes a light-transmitting area 110 and a non-light-transmitting area 120 surrounding the light-transmitting area 110, and the non-light-transmitting area 120 is provided with wiring lines 104.
  • the substrate 100 includes a filter layer 101, and the filter layer 101 is located in a light-transmitting area 110 and a non-light-transmitting area 120 on the substrate 100.
  • the image sensor chip 300 is flip-chip mounted on the side of the substrate 100 away from the filter layer 101.
  • the image sensor chip 300 includes a sensing area 310 that is disposed toward the side of the substrate 100, and the sensing area 310 corresponds to the light-transmitting area 110.
  • the substrate 100 provides support and electrical support for the image sensor chip 300.
  • the wiring line 104 may include, for example, at least one of electronic components such as resistors, inductors, capacitors, integrated circuit blocks, and optical components, and the wiring lines 104 may also include connecting wires between the electronic components.
  • the light-transmitting area 110 of the substrate 100 can transmit light, so that biometric light such as iris passes through the substrate 100 and is transmitted to the sensing area 310 of the image sensor chip 300.
  • the non-transmissive area 120 can be arranged around the transmissive area 110 in various forms. Illustratively, FIG. 1 shows that the transmissive area 110 is located in the middle of the non-transmissive area 120. In other embodiments, the transmissive area may also be provided.
  • the light zone 110 is located at other positions of the substrate 100, and can be determined according to the position of the image sensor chip 300 in the electronic device, the arrangement of the wiring line 104, and the alignment position of the image sensor chip 300 and the lens in practical applications.
  • the external circuit refers to the circuit structure electrically connected to the packaging structure of the image sensor chip.
  • the external circuit may be, for example, a flexible printed circuit (FPC) integrated with other electronic components.
  • the FPC circuit board may include an image processing chip.
  • the image processing chip performs imaging according to the light information collected by the image sensor chip 300 to facilitate biometric identification.
  • the image sensor chip 300 may include a plurality of pixels 311 for collecting image sensing light information, and the plurality of pixels 311 constitute the sensing area 310 of the image sensor chip 300.
  • the sensing area 310 corresponds to the light-transmitting area 110.
  • the light-transmitting area 110 completely exposes the sensing area 310, so that the infrared light is not blocked by the non-transmitting area of the substrate 100.
  • the filter layer 101 is disposed on the side where the pixel points 311 of the image sensor chip 300 collect light, and is used to filter the light transmitted to the image sensor chip 300.
  • the filter layer 101 may be, for example, an infrared light filter layer 101 (Infrared Radiation, IR), and the infrared light filter layer 101 may transmit infrared light and filter light of other wavelength bands.
  • the filter layer 101 is located in the light-transmitting area 110 and the non-light-transmitting area 120 on the substrate 100, that is to say, the filter layer 101 covers the light-transmitting areas 110 and 120. Therefore, the light transmitted to the image sensor chip 300 will pass through the filter
  • the layer 101 helps to improve the quality of image sensing.
  • the outer edge of the filter layer 101 coincides with the epitaxial extension of the substrate 100. This arrangement allows the entire surface of the filter layer 101 to be formed on the substrate 100. There is no need to cut the filter layer 101 separately and then set it on the substrate. Conducive to simplifying the production process.
  • the filter layer 101 may be plated on the substrate 100.
  • the thickness of the filter layer 101 is in the range of 100 um to 150 um. This configuration is not only beneficial to thin the packaging structure of the image sensor chip, but also can ensure the filtering effect of the filter layer 101.
  • the filter layer 101 is located on the substrate 100 and located in the light-transmitting area 110 and the non-light-transmitting area 120.
  • the image sensor chip 300 is flip-chip mounted on the substrate 100 on the side away from the filter layer 101, and the sensing area 310 Disposed on the side facing the substrate 100, the sensing area 310 corresponds to the light-transmitting area 110, so that all light transmitted to the image sensor chip 300 will pass through the filter layer 101.
  • the optical filter in the electronic device is clamped on the lens, and the thickness of the optical filter is thicker to be able to be mechanically connected with the lens. In addition, the size of the clamped component is also large.
  • the embodiment of the present application arranges the filter layer 101 in the packaging structure of the image sensor chip. Therefore, compared with the related art, on the one hand, the embodiment of the present application may adopt a bonding process to attach the filter layer to the package structure of the image sensor chip. 101 is bonded to the substrate 100.
  • the thickness of the filter layer 101 can be set to be thinner, which is beneficial to the lighter and thinner package structure of the image sensor chip;
  • the embodiment of the present application can adopt a bonding process without using a snap-on component, which avoids the snap-on component occupying the space of the electronic device.
  • the packaging structure of the image sensor chip provided by the embodiments of the present application is beneficial to the miniaturization of electronic devices.
  • the base 100 further includes a light-transmitting substrate 102, the filter layer 101 is disposed on the surface of the light-transmitting substrate 102, and the base 100 is close to the side of the image sensor chip 300 A wiring line 104 is provided.
  • the material of the light-transmitting substrate 102 may be glass, for example, and the structure of the light-transmitting substrate 102 + the filter layer 101 constitutes IR glass.
  • the light-transmitting substrate 102 covers the light-transmitting area 110 and the non-light-transmitting area 120, plays a role of supporting the filter layer 101 and the wiring line 104, and improves the stability of the packaging structure of the image sensor chip.
  • the base 100 further includes a base material layer 103.
  • the base material layer 103 may include, for example, a dielectric material layer. It is helpful to provide the base material layer 103 For the installation of the wiring line 104. In addition, since the base material layer 103 generally does not transmit light, the area covered by the base material layer 103 forms a non-transmissive area 120.
  • the number of layers of the filter layer 101 is exemplarily shown as one layer, which is not a limitation of the present application. In other embodiments, the number of layers of the filter layer 101 can also be set to two as required. Layer or multiple layers. Hereinafter, a detailed description will be given assuming that the number of layers of the filter layer 101 is two.
  • FIG. 2 is a schematic diagram of another image sensor chip packaging structure provided by an embodiment of the application.
  • the filter layer 101 includes a first filter layer and a second filter layer, and the first filter layer and the second filter layer are respectively disposed on the transparent layer.
  • the front surface 130 and the back surface 140 of the optical substrate 102 refers to the side of the light-transmitting substrate 102 away from the image sensor chip 300; the back side 140 of the light-transmitting substrate 102 refers to the side of the light-transmitting substrate 102 close to the image sensor chip 300.
  • the filter layer 101 provided on the front surface 130 of the transparent substrate 102 is called a first filter layer
  • the filter layer 101 provided on the back surface 140 of the transparent substrate 102 is called a second filter layer.
  • the material of the transparent substrate 102 may be, for example, glass, and the structure of the first filter layer + the transparent substrate 102 + the second filter layer constitutes IR glass.
  • the first filter layer and the second filter layer may be plated on the front surface 130 and the back surface 140 of the light-transmitting substrate 102, respectively.
  • both sides of the transparent substrate 102 include the filter layer 101.
  • the filter layer 101 is When the light layer 101 is plated on the light-transmitting substrate 102, stress will be generated on the surface of the light-transmitting substrate 102.
  • the front 130 and back 140 of the light-transmitting substrate 102 are both coated with the filter layer 101 to balance the stress on the light-transmitting substrate 102 Therefore, it is beneficial to prevent warping of the filter layer 101 due to deformation of the light-transmitting substrate 102.
  • the wiring line 104 is disposed on the side of the second filter layer close to the image sensor chip 300, that is, the wiring line 104 is disposed on the IR glass close to the image sensor chip. 300 on the side.
  • the arrangement of the embodiment of the application in this way not only makes the wiring line 104 closer to the image sensor chip 300, thereby facilitating the connection between the image sensor chip 300 and the wiring line 104; but also between the filter layer 101 and the light-transmitting substrate 102 There is no need to provide wiring lines, which facilitates the bonding of the filter layer 101 and the light-transmitting substrate 102, thereby reducing the process cost and improving the production efficiency.
  • the packaging structure of the image sensor chip further includes bumps 330, one end of the bumps 330 is electrically connected to the image sensor chip 300, the bumps 330 The other end is electrically connected to the wiring line 104.
  • the image sensor chip 300 has conductive traces (not shown in the figure) electrically connected to the pixel points 311, and the conductive traces are electrically connected to the wiring lines 104 through bumps 330.
  • the material of the bump 330 may be, for example, gold (Au), silver (Ag), aluminum (Al), titanium (Ti), or copper (Cu), and may be gold (Au).
  • One end of the bump 330 is in contact with the image sensor chip 300.
  • the image sensor chip 300 is provided with a pad 340 at a position corresponding to the bump 330, and the pad 340 is in contact with one end of the bump 330.
  • the bump 330 and the pad 340 may be electrically connected by soldering or heating and melting.
  • the wiring line 104 is provided with a pad (not shown in the figure) at a position corresponding to the bump 330, and the pad abuts against the other end of the bump 330.
  • the bump 330 and the pad on the wiring line 104 can be electrically connected by soldering or heating and melting.
  • the number of bumps 330 is multiple, corresponding to multiple pins of the image sensor chip 300 respectively.
  • the distribution relationship between the bumps 330 and the image sensor chip 300 is that a plurality of bumps 330 are symmetrically distributed on both sides of the image sensor chip 300, or a plurality of bumps 330 surround the periphery of the image sensor chip 300.
  • FIG. 3 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application.
  • the packaging structure of the image sensor chip further includes a bonding pad 1041 located in the non-transmissive area 120, the bonding pad 1041 is electrically connected to the wiring line 104, and the bonding pad 1041
  • the vertical distance between the side away from the light-transmitting substrate 102 and the light-transmitting substrate 102 is smaller than the vertical distance between the side of the chip away from the light-transmitting substrate 102 and the light-transmitting substrate 102.
  • the bonding pad 1041 may be, for example, a section of wire or a pad in the wiring line 104, that is, the bonding pad 1041 may be formed by the wiring line 104 and is a part of the wiring line 104.
  • the pad 1041 is used for electrical connection between the wiring line 104 and the external circuit
  • the bump 330 is used for the electrical connection between the image sensor chip 300 and the wiring line 104, so that the image sensor chip 300 is connected to the external circuit through the wiring line 104 Carry out the transmission of electrical signals.
  • the vertical distance between the side of the solder pad 1041 away from the transparent substrate 102 and the transparent substrate 102 is smaller than the vertical distance between the side of the chip away from the transparent substrate 102 and the transparent substrate 102, that is, the size of the solder pad 1041 Without exceeding the image sensor chip 300, the thickness of the packaging structure of the image sensor chip is the sum of the thickness of the substrate 100, the bumps 330 and the sensor chip 300.
  • the number of solder pads 1041 is multiple, which respectively correspond to multiple connection terminals of the external circuit.
  • the distribution relationship between the bonding pads 1041 and the image sensor chip 300 is that a plurality of bonding pads 1041 are symmetrically distributed on one side and two sides of the image sensor chip 300, or a plurality of bonding pads 1041 surround the periphery of the image sensor chip 300.
  • the solder pad 1041 there are many ways to electrically connect the solder pad 1041 with the external circuit, such as soldering through solder balls, or connecting through conductive glue.
  • the solder pad 1041 is used to electrically connect with an external circuit through conductive glue.
  • the conductive adhesive refers to a colloid with conductive properties, such as an anisotropic conductive film (ACF). Compared with solder balls, the thickness of the conductive adhesive is thinner, which is beneficial to reduce the thickness of the package structure of the image sensor chip.
  • the overall thickness of the package structure of the image sensor chip is about 800um, and if the conductive glue is used as the connection medium between the wiring circuit 104 and the external circuit, the optical filter layer is included.
  • the thickness of the packaging structure of the image sensor chip of 101 is less than or equal to 300 um. It can be seen that the embodiment of the present application can reduce the thickness of the packaging structure of the image sensor chip.
  • solder pad 1041 there are multiple structural forms of the solder pad 1041, and several of the structural forms will be described below, but they are not intended to limit the application.
  • FIG. 4 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application
  • FIG. 5 is a schematic diagram of the structure of FIG. 4 along the direction C.
  • the substrate 100 further includes an insulating layer 400 covering the wiring line 104, and the insulating layer 400 exposes a part of the wiring line 104 to constitute a bonding pad 1041.
  • the insulating layer 400 includes an opening 401, and the opening 401 exposes a part of the wiring line 104, thereby forming a bonding pad 1041.
  • an insulating layer 400 is provided to cover the wiring line 104, and a part of the insulating layer 400 that exposes the wiring line 104 constitutes a solder pad 1041.
  • a part of the insulating layer 400 that exposes the wiring line 104 constitutes a solder pad 1041.
  • the arrangement of the insulating layer 400 is beneficial to provide support for the packaging structure of the image sensor chip, and improve the stability of the packaging structure of the image sensor chip.
  • FIG. 6 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application.
  • the soldering pad 1041 includes a first soldering pad 1041A and a second soldering pad 1041B; the first soldering pad 1041A is located on the second soldering pad 1041B away from the light-transmitting area 110 One side of the first pad 1041A is located outside of the second pad 1041B.
  • An insulating layer 400 is provided between the first bonding pad 1041A and the second bonding pad 1041B.
  • the second soldering pad 1041B is located in the opening of the insulating layer 400, corresponding to the position of the second soldering pad 1041B, and the connecting terminal of the external circuit is provided with bumps so that the connecting terminal can be connected to the second soldering pad 1041B. Together, it facilitates the fixed connection between the wiring line 104 and the external circuit.
  • the first bonding pad 1041A and the second bonding pad 1041B are electrically connected.
  • the second bonding pad 1041B is also provided, which is equivalent to increasing the contact area between the first bonding pad 1041A and the external circuit, and further improves the connection between the wiring line 104 and the external circuit. The stability of the connection between.
  • the side of the first bonding pad 1041A away from the second bonding pad 1041B is exposed. That is, the side surface of the first solder pad 1041A away from the second solder pad 1041B is not provided with the insulating layer 400.
  • the arrangement of the embodiment of the present application makes the first solder pad 1041A have a larger operating space for conductive adhesive connection, reduces the difficulty of operation, and facilitates the conductive adhesive to adhere the solder pad 1041 and the external circuit more firmly.
  • FIG. 7 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application.
  • an insulating layer 400 is provided on the side of the wiring line 104 close to the light-transmitting area 110, that is, an insulating layer 400 is also provided on the inner side of the wiring line 104.
  • the surface of the insulating layer 400 is flatter, which facilitates the reflection of the biometric light through the surface of the insulating layer 400 to the sensing area 310 of the image sensor chip 300.
  • FIG. 8 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application.
  • a sealant 500 is provided on the periphery of the image sensor chip 300, and the sealant 500 seals the image sensor chip 300 and the substrate 100.
  • the embodiment of the present application is arranged in this way, on the one hand, it can prevent the sensing area 311 of the image sensor chip 300 from being contaminated by external water vapor; on the other hand, the sealant 500 can prevent the image sensor chip 300 from falling off the substrate 100.
  • the packaging structure of the image sensor chip is severely heated during the soldering process, and the sealant 500 with better air permeability needs to be used.
  • the sealant 500 has the effect of reduced barrier performance, and the sensing area 311 of the image sensor chip 300 is susceptible to contamination by external water vapor.
  • a better sealant 500 is beneficial to improve the ability of the sealant 500 to isolate water vapor.

Abstract

A package structure of an image sensor chip (300). The package structure of the image sensor chip (300) comprises: a substrate (100), wherein the substrate (100) comprises a light-transmissive region (110) and a non-light-transmissive region (120) surrounding the light-transmissive region (110), a wiring line (104) is disposed in the non-light-transmissive region (120), and the substrate (100) further comprises a filter layer (101) located in the light-transmissive region (110) and the non-light-transmissive region (120) of the substrate (100); and the image sensor chip (300) inversely disposed on a side of the substrate (100) facing away from the filter layer (101), wherein the image sensor chip (300) comprises a sensing region (310), and the sensing region (310) is disposed on a side facing the substrate (100) and corresponds to the light-transmissive region (110).

Description

影像传感芯片的封装结构Packaging structure of image sensor chip
本公开要求在2019年11月18日提交中国专利局、申请号为201921993340.3的中国专利申请的优先权,以上申请的全部内容通过引用结合在本公开中。The present disclosure claims the priority of a Chinese patent application filed with the Chinese Patent Office with an application number of 201921993340.3 on November 18, 2019, and the entire content of the above application is incorporated into the present disclosure by reference.
技术领域Technical field
本申请涉及图像采集技术领域,例如涉及一种影像传感芯片的封装结构。This application relates to the field of image acquisition technology, for example, to a packaging structure of an image sensor chip.
背景技术Background technique
随着科学技术的不断发展,越来越多的电子设备广泛应用于人们的日常生活和工作当中,为人们带来了极大的便利,成为人们不可或缺的重要工具。With the continuous development of science and technology, more and more electronic devices are widely used in people's daily life and work, bringing great convenience to people and becoming indispensable and important tools for people.
在相关技术中,通过在电子设备集成镜头和影像传感器芯片等影像传感组件,以使电子设备具备生物识别功能,例如,虹膜识别。虹膜识别不易复制和盗取,具有对身份识别的安全性较高的优势,因此,影像传感器芯片得到了越来越广泛的应用。然而,现有的影像传感器芯片的封装结构不利于电子设备的小型化。In related technologies, image sensor components such as a lens and an image sensor chip are integrated in the electronic device to enable the electronic device to have a biological recognition function, for example, iris recognition. Iris recognition is not easy to copy and steal, and has the advantage of higher security for identity recognition. Therefore, image sensor chips have been more and more widely used. However, the existing packaging structure of the image sensor chip is not conducive to the miniaturization of electronic devices.
发明内容Summary of the invention
本申请提供一种影像传感芯片的封装结构,以有利于电子设备的小型化。The present application provides a packaging structure of an image sensor chip to facilitate the miniaturization of electronic equipment.
一种影像传感芯片的封装结构,包括:An image sensor chip packaging structure, including:
基底,所述基底包括透光区以及围绕所述透光区的非透光区,所述非透光区设置有布线线路;所述基底包括滤光层,所述滤光层位于所述基底上的所述透光区和所述非透光区;A substrate, the substrate includes a light-transmitting area and a non-transmitting area surrounding the light-transmitting area, the non-transmitting area is provided with wiring lines; the substrate includes a filter layer, the filter layer is located on the substrate The light-transmitting area and the non-light-transmitting area on the upper part;
倒装设置于所述基底上远离所述滤光层的一侧的影像传感器芯片,所述影像传感器芯片包括感应区,所述感应区朝向所述基底的一侧设置,所述感应区与所述透光区对应。An image sensor chip flip-chip arranged on the side of the substrate away from the filter layer, the image sensor chip includes a sensing area, the sensing area is disposed toward one side of the substrate, the sensing area and the The light-transmitting area corresponds.
本申请实施例设置滤光层位于基底上,且位于透光区和非透光区,影像传感器芯片倒装设置于基底上远离滤光层的一侧,感应区朝向基底的一侧设置,感应区与透光区对应,以使传输至影像传感器芯片的光线均会通过滤光层。在相关技术中,电子设备中的滤光片卡接在镜头上,且滤光片的厚度较厚,以能够与镜头进行机械连接,另外,卡接组件的尺寸也较大,因此,现有的滤光片的 设置方式不利于电子设备的小型化。与相关技术不同的是,本申请实施例将滤光层设置在影像传感器芯片的封装结构中,因此,与相关技术相比,一方面,本申请实施例可以采用贴合工艺将滤光层贴合在基底上,由于贴合工艺对滤光层的厚度要求较低,因此可以将滤光层的厚度设置的较薄,以有利于影像传感器芯片的封装结构的轻薄化;另一方面,本申请实施例可以采用贴合工艺,而无需使用卡接组件,避免了卡接组件占用电子设备的空间。综上,本申请实施例提供的影像传感器芯片的封装结构有利于电子设备的小型化。In the embodiment of the present application, the filter layer is arranged on the substrate and located in the light-transmitting area and the non-light-transmitting area. The image sensor chip is flip-chip arranged on the side of the substrate away from the filter layer, and the sensing area is arranged toward the side of the substrate. The area corresponds to the light-transmitting area, so that all light transmitted to the image sensor chip passes through the filter layer. In the related art, the optical filter in the electronic device is clamped on the lens, and the thickness of the optical filter is thicker to be able to be mechanically connected with the lens. In addition, the size of the clamped component is also large. Therefore, the existing The setting of the filter is not conducive to the miniaturization of electronic equipment. Different from the related art, the embodiment of the present application arranges the filter layer in the packaging structure of the image sensor chip. Therefore, compared with the related technology, on the one hand, the embodiment of the present application can use a bonding process to attach the filter layer. On the substrate, since the lamination process requires a lower thickness of the filter layer, the thickness of the filter layer can be set to be thinner to facilitate the lighter and thinner package structure of the image sensor chip; on the other hand, the present invention The application embodiment can adopt the bonding process without using the card connection component, which avoids the card connection component occupying the space of the electronic device. In summary, the packaging structure of the image sensor chip provided by the embodiments of the present application is beneficial to the miniaturization of electronic devices.
所述基底还包括透光基板,所述滤光层设置于所述透光基板的表面,所述基底靠近所述影像传感器芯片一侧设置有所述布线线路。其中,透光基板的材料例如可以是玻璃,透光基板+滤光层的结构构成IR玻璃。透光基板覆盖透光区和非透光区,起到了支撑滤光层和布线线路的作用,提升了影像传感器芯片的封装结构的稳固性。The base further includes a light-transmitting substrate, the filter layer is disposed on the surface of the light-transmitting substrate, and the wiring line is disposed on a side of the base close to the image sensor chip. Among them, the material of the light-transmitting substrate may be, for example, glass, and the structure of the light-transmitting substrate + filter layer constitutes IR glass. The light-transmitting substrate covers the light-transmitting area and the non-light-transmitting area, plays a role of supporting the filter layer and wiring lines, and improves the stability of the packaging structure of the image sensor chip.
所述滤光层包括第一滤光层和第二滤光层,所述第一滤光层和所述第二滤光层分别设置于透光基板的正面和背面。其中,透光基板的正面是指,透光基板远离影像传感器芯片的一面;透光基板的背面是指,透光基板靠近影像传感器芯片的一面。即设置于透光基板的正面的滤光层称为第一滤光层,设置于透光基板的背面的滤光层称为第二滤光层。透光基板的材料例如可以是玻璃,第一滤光层+透光基板+第二滤光层的结构构成IR玻璃。本申请实施例设置透光基板的两面均包括滤光层,相当于增加了滤光层的厚度,有利于提升滤光层的滤光效果。The filter layer includes a first filter layer and a second filter layer, and the first filter layer and the second filter layer are respectively disposed on the front and back of the light-transmitting substrate. Wherein, the front of the light-transmitting substrate refers to the side of the light-transmitting substrate away from the image sensor chip; the back of the light-transmitting substrate refers to the side of the light-transmitting substrate close to the image sensor chip. That is, the filter layer provided on the front surface of the transparent substrate is called the first filter layer, and the filter layer provided on the back surface of the transparent substrate is called the second filter layer. The material of the light-transmitting substrate may be, for example, glass, and the structure of the first filter layer+the light-transmitting substrate+the second filter layer constitutes IR glass. In the embodiment of the present application, both sides of the transparent substrate are provided with filter layers, which is equivalent to increasing the thickness of the filter layer, which is beneficial to improve the filter effect of the filter layer.
所述布线线路设置于所述第二滤光层靠近所述影像传感器芯片的一侧。即布线线路设置于IR玻璃靠近影像传感器芯片的一侧。本申请实施例这样设置,不仅可以使布线线路的设置位置更加靠近影像传感器芯片,从而有利于影像传感器芯片和布线线路的连接;而且在滤光层和透光基板之间,无需设置布线线路,有利于滤光层与透光基板的贴合,从而降低了工艺成本,提高了生产效率。The wiring line is arranged on a side of the second filter layer close to the image sensor chip. That is, the wiring line is arranged on the side of the IR glass close to the image sensor chip. The arrangement of the embodiment of the application in this way not only makes the location of the wiring line closer to the image sensor chip, thereby facilitating the connection between the image sensor chip and the wiring line; moreover, there is no need to provide a wiring line between the filter layer and the light-transmitting substrate. It is conducive to the bonding of the filter layer and the light-transmitting substrate, thereby reducing the process cost and improving the production efficiency.
所述滤光层的厚度范围为100um-150um,这样设置既有利于减薄影像传感器芯片的封装结构,又能够确保滤光层的滤光效果。The thickness of the filter layer ranges from 100 um to 150 um. This arrangement is not only beneficial to thin the packaging structure of the image sensor chip, but also can ensure the filtering effect of the filter layer.
还包括凸块,所述凸块的一端与所述影像传感器芯片电连接,所述凸块的另一端与所述布线线路电连接。其中,凸块的材料例如可以是金(Au)、银(Ag)、铝(Al)、钛(Ti)或铜(Cu)等金属,可选为金(Au)。凸块的一端与影像 传感器芯片抵接,示例性地,影像传感器芯片对应凸块的位置设置有焊盘,焊盘与凸块的一端抵接。可以通过焊接的方式或加热熔融的方式将凸块和焊盘电连接。凸块的另一端与布线线路抵接,示例性地,布线线路对应凸块的位置设置有焊盘,焊盘与凸块的另一端抵接。可以通过焊接的方式或加热熔融的方式凸块和布线线路上的焊盘电连接。It also includes a bump, one end of the bump is electrically connected to the image sensor chip, and the other end of the bump is electrically connected to the wiring line. Among them, the material of the bumps may be metals such as gold (Au), silver (Ag), aluminum (Al), titanium (Ti), or copper (Cu), and may be gold (Au). One end of the bump is in contact with the image sensor chip. Illustratively, the image sensor chip is provided with a pad at a position corresponding to the bump, and the pad is in contact with one end of the bump. The bumps and the pads can be electrically connected by soldering or heating and melting. The other end of the bump is in contact with the wiring line. Illustratively, the wiring line is provided with a pad at a position corresponding to the bump, and the pad is in contact with the other end of the bump. The bumps and the pads on the wiring lines can be electrically connected by soldering or heating and melting.
还包括位于所述非透光区的焊垫,所述焊垫与所述布线线路电连接,所述焊垫远离所述透光基板的一面距离所述透光基板的垂直距离小于所述芯片远离所述透光基板的一面距离所述透光基板的垂直距离。It also includes a soldering pad located in the non-transmissive area, the soldering pad is electrically connected to the wiring line, and the surface of the soldering pad away from the light-transmitting substrate has a smaller vertical distance from the light-transmitting substrate than the chip The vertical distance between the side far away from the light-transmitting substrate and the light-transmitting substrate.
所述焊垫用于通过导电胶与外部电路电连接。其中,导电胶是指具有导电性能的胶体,例如可以是异方性导电胶膜(Anisotropic Conductive Film,ACF)。相比于焊球,导电胶的厚度较薄,有利于减小影像传感器芯片的封装结构的厚度。示例性地,若采用焊球作为布线线路和外部电路的连接介质,影像传感器芯片的封装结构总体厚度约800um,而若采用导电胶作为布线线路和外部电路的连接介质,包括滤光层的影像传感器芯片的封装结构的厚度小于等于300um,由此可见,本申请实施例可以减小影像传感器芯片的封装结构的厚度。另外,本申请实施例能够降低邦定过程中产生的热量,从而有利于选择气密性较好的密封胶,有利于提升密封胶隔绝水汽的能力。The soldering pad is used for electrically connecting with an external circuit through conductive glue. Among them, the conductive adhesive refers to a colloid with conductive properties, for example, it may be an anisotropic conductive film (ACF). Compared with solder balls, the thickness of the conductive adhesive is thinner, which is beneficial to reduce the thickness of the package structure of the image sensor chip. Exemplarily, if solder balls are used as the connection medium between the wiring lines and the external circuit, the overall thickness of the package structure of the image sensor chip is about 800um, and if the conductive glue is used as the connection medium between the wiring lines and the external circuit, the image of the filter layer is included. The thickness of the package structure of the sensor chip is less than or equal to 300 um. It can be seen that the embodiment of the present application can reduce the thickness of the package structure of the image sensor chip. In addition, the embodiments of the present application can reduce the heat generated in the bonding process, thereby facilitating the selection of a sealant with better airtightness, and improving the sealant's ability to isolate water vapor.
所述基底还包括覆盖所述布线线路的绝缘层;所述绝缘层暴露出所述布线线路的一部分构成所述焊垫。其中,示例性地,绝缘层包括开口,开口暴露布线线路的一部分,从而形成焊垫。本申请实施例设置绝缘层覆盖布线线路,绝缘层暴露出布线线路的一部分构成焊垫,一方面有利于避免布线线路除焊垫外的其他部分与外部电路发生短接,另一方面绝缘层的设置有利于为影像传感器芯片的封装结构提供支撑,提升影像传感器芯片的封装结构的稳固性。The substrate further includes an insulating layer covering the wiring line; a part of the insulating layer that exposes the wiring line constitutes the bonding pad. Wherein, for example, the insulating layer includes an opening, and the opening exposes a part of the wiring line, thereby forming a bonding pad. In the embodiment of the present application, an insulating layer is provided to cover the wiring lines, and a part of the insulating layer that exposes the wiring lines constitutes solder pads. On the one hand, it is beneficial to avoid short-circuiting of other parts of the wiring lines with the external circuit except for the solder pads. On the other hand, the insulation layer The arrangement is beneficial to provide support for the packaging structure of the image sensor chip and improve the stability of the packaging structure of the image sensor chip.
所述焊垫包括第一焊垫和第二焊垫;所述第一焊垫位于所述第二焊垫远离所述透光区的一侧;所述第一焊垫和所述第二焊垫之间设置有所述绝缘层。The soldering pad includes a first soldering pad and a second soldering pad; the first soldering pad is located on a side of the second soldering pad away from the light-transmitting area; the first soldering pad and the second soldering pad The insulating layer is arranged between the pads.
所述第一焊垫与所述第二焊垫电连接。The first solder pad is electrically connected to the second solder pad.
所述第一焊垫远离所述第二焊垫的侧面裸露。即第一焊垫远离第二焊垫的侧面未设置有绝缘层。本申请实施例这样设置,使得第一焊垫进行导电胶连接的可操作空间较大,降低了作业难度,有利于导电胶更加牢固的粘贴焊垫和外部电路。The side of the first solder pad away from the second solder pad is exposed. That is, the side surface of the first solder pad away from the second solder pad is not provided with an insulating layer. The embodiment of the present application is arranged in such a way that the operable space for the conductive adhesive connection of the first soldering pad is relatively large, the operation difficulty is reduced, and the conductive adhesive is beneficial to stick the soldering pad and the external circuit more firmly.
所述布线线路靠近所述透光区的一侧设置有所述绝缘层,即,在布线线路的内侧还设置有绝缘层。相比于布线线路凹凸不平的表面,绝缘层的表面更加平整,有利于生物识别光线经过绝缘层的表面反射至影像传感器芯片的感应区。The insulating layer is provided on a side of the wiring line close to the light-transmitting area, that is, an insulating layer is also provided on the inner side of the wiring line. Compared with the uneven surface of the wiring line, the surface of the insulating layer is flatter, which facilitates the reflection of the biometric light to the sensing area of the image sensor chip through the surface of the insulating layer.
所述焊垫设置于所述芯片的周边区域的一侧或者两侧。The bonding pads are arranged on one side or both sides of the peripheral area of the chip.
所述封装结构的厚度小于等于300um,从而使得影像传感器芯片的封装结构的厚度较薄。The thickness of the packaging structure is less than or equal to 300 um, so that the thickness of the packaging structure of the image sensor chip is thinner.
所述影像传感器芯片的周缘设置有密封胶,所述密封胶将所述影像传感器芯片与所述基底之间密封。本申请实施例这样设置,一方面,可以防止影像传感器芯片的感应区受到外界水汽的污染;另一方面,密封胶可以防止影像传感器芯片从基底上脱落。A sealant is provided on the periphery of the image sensor chip, and the sealant seals the image sensor chip and the substrate. The embodiment of the present application is arranged in this way, on the one hand, it can prevent the sensing area of the image sensor chip from being contaminated by external water vapor; on the other hand, the sealant can prevent the image sensor chip from falling off the substrate.
本申请设置滤光层位于基底上,且位于透光区和非透光区,影像传感器芯片倒装设置于基底上远离滤光层的一侧,感应区朝向基底的一侧设置,感应区与透光区对应,以使传输至影像传感器芯片的光线均会通过滤光层。在相关技术中,电子设备中的滤光片卡接在镜头上,且滤光片的厚度较厚,以能够与镜头进行机械连接,另外,卡接组件的尺寸也较大,因此,现有的滤光片的设置方式不利于电子设备的小型化。与相关技术不同的是,本申请将滤光层设置在影像传感器芯片的封装结构中,因此,与相关技术相比,一方面,本申请可以采用贴合工艺将滤光层贴合在基底上,由于贴合工艺对滤光层的厚度要求较低,因此可以将滤光层的厚度设置的较薄,以有利于影像传感器芯片的封装结构的轻薄化;另一方面,本申请可以采用贴合工艺,而无需使用卡接组件,避免了卡接组件占用电子设备的空间。综上,本申请提供的影像传感器芯片的封装结构有利于电子设备的小型化。In this application, the filter layer is located on the substrate, and is located in the light-transmitting area and the non-light-transmitting area. The image sensor chip is flip-chip arranged on the side of the substrate away from the filter layer, and the sensing area is set toward the side of the substrate. The light-transmitting area corresponds so that the light transmitted to the image sensor chip will pass through the filter layer. In the related art, the optical filter in the electronic device is clamped on the lens, and the thickness of the optical filter is thicker to be able to be mechanically connected with the lens. In addition, the size of the clamped component is also large. Therefore, the existing The setting of the filter is not conducive to the miniaturization of electronic equipment. Different from the related technology, the present application sets the filter layer in the packaging structure of the image sensor chip. Therefore, compared with the related technology, on the one hand, the present application can use a laminating process to attach the filter layer to the substrate. Since the bonding process requires relatively low thickness of the filter layer, the thickness of the filter layer can be set to be thinner to facilitate the lighter and thinner packaging structure of the image sensor chip; on the other hand, the application can adopt the pasting The technology is integrated without the use of card connection components, which avoids the space of electronic equipment occupied by the card connection components. In summary, the packaging structure of the image sensor chip provided by the present application is beneficial to the miniaturization of electronic devices.
附图说明Description of the drawings
图1为本申请实施例提供的一种影像传感芯片的封装结构的示意图;FIG. 1 is a schematic diagram of an image sensor chip packaging structure provided by an embodiment of the application;
图2为本申请实施例提供的另一种影像传感器芯片的封装结构的示意图;2 is a schematic diagram of another image sensor chip packaging structure provided by an embodiment of the application;
图3为本申请实施例提供的又一种影像传感器芯片的封装结构的示意图;3 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application;
图4为本申请实施例提供的又一种影像传感器芯片的封装结构的示意图;4 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application;
图5为图4沿方向C的结构示意图。FIG. 5 is a schematic diagram of the structure of FIG. 4 along the direction C. FIG.
图6为本申请实施例提供的又一种影像传感器芯片的封装结构的示意图;6 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application;
图7为本申请实施例提供的又一种影像传感器芯片的封装结构的示意图;FIG. 7 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application;
图8为本申请实施例提供的又一种影像传感器芯片的封装结构的示意图。FIG. 8 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application.
具体实施方式Detailed ways
下面结合附图和实施例对本申请作进一步的详细说明。本申请实施例提供了一种影像传感器的封装结构,可适用于电子设备的生物识别。图1为本申请实施例提供的一种影像传感芯片的封装结构的示意图。参见图1,该影像传感器的封装结构包括:基底100和影像传感器芯片300。基底100包括透光区110以及围绕透光区110的非透光区120,非透光区120设置有布线线路104。基底100包括滤光层101,滤光层101位于基底100上的透光区110和非透光区120。影像传感器芯片300倒装设置于基底100上远离滤光层101的一侧,影像传感器芯片300包括感应区310,感应区310朝向基底100的一侧设置,感应区310与透光区110对应。The application will be further described in detail below with reference to the drawings and embodiments. The embodiment of the present application provides an image sensor packaging structure, which can be applied to biological identification of electronic devices. FIG. 1 is a schematic diagram of an image sensor chip packaging structure provided by an embodiment of the application. Referring to FIG. 1, the packaging structure of the image sensor includes: a substrate 100 and an image sensor chip 300. The substrate 100 includes a light-transmitting area 110 and a non-light-transmitting area 120 surrounding the light-transmitting area 110, and the non-light-transmitting area 120 is provided with wiring lines 104. The substrate 100 includes a filter layer 101, and the filter layer 101 is located in a light-transmitting area 110 and a non-light-transmitting area 120 on the substrate 100. The image sensor chip 300 is flip-chip mounted on the side of the substrate 100 away from the filter layer 101. The image sensor chip 300 includes a sensing area 310 that is disposed toward the side of the substrate 100, and the sensing area 310 corresponds to the light-transmitting area 110.
其中,基底100为影像传感器芯片300提供支撑和电气支持。布线线路104例如可以包括电阻、电感、电容、集成电路块和光学组件等电子元器件中的至少一种,以及布线线路104还包括各电子元器件之间的连接导线。Among them, the substrate 100 provides support and electrical support for the image sensor chip 300. The wiring line 104 may include, for example, at least one of electronic components such as resistors, inductors, capacitors, integrated circuit blocks, and optical components, and the wiring lines 104 may also include connecting wires between the electronic components.
基底100的透光区110能够透光,以使虹膜等生物识别光线透过基底100,传输至影像传感器芯片300的感应区310。非透光区120围绕透光区110的设置形式有多种,示例性地,图1中示出了透光区110位于非透光区120的中部,在其他实施例中,还可以设置透光区110位于基底100的其他位置,在实际应用中可以根据影像传感器芯片300在电子设备中的位置、布线线路104的设置方式以及影像传感器芯片300和镜头的对位位置来确定。The light-transmitting area 110 of the substrate 100 can transmit light, so that biometric light such as iris passes through the substrate 100 and is transmitted to the sensing area 310 of the image sensor chip 300. The non-transmissive area 120 can be arranged around the transmissive area 110 in various forms. Illustratively, FIG. 1 shows that the transmissive area 110 is located in the middle of the non-transmissive area 120. In other embodiments, the transmissive area may also be provided. The light zone 110 is located at other positions of the substrate 100, and can be determined according to the position of the image sensor chip 300 in the electronic device, the arrangement of the wiring line 104, and the alignment position of the image sensor chip 300 and the lens in practical applications.
外部电路是指与影像传感器芯片的封装结构电连接的电路结构,外部电路例如可以是集成有其他电子元器件的柔性电路板(Flexible Printed Circuit,FPC),该FPC电路板可以包括图像处理芯片,图像处理芯片根据影像传感器芯片300采集的光线信息进行成像,以便于进行生物识别。The external circuit refers to the circuit structure electrically connected to the packaging structure of the image sensor chip. The external circuit may be, for example, a flexible printed circuit (FPC) integrated with other electronic components. The FPC circuit board may include an image processing chip. The image processing chip performs imaging according to the light information collected by the image sensor chip 300 to facilitate biometric identification.
影像传感器芯片300可包括多个像素点311,用于采集影像传感光信息,多个像素点311构成了影像传感器芯片300的感应区310。感应区310与透光区110对应,可选地,透光区110完全暴露感应区310,以使红外光不受 基底100的非透光区的遮挡。The image sensor chip 300 may include a plurality of pixels 311 for collecting image sensing light information, and the plurality of pixels 311 constitute the sensing area 310 of the image sensor chip 300. The sensing area 310 corresponds to the light-transmitting area 110. Optionally, the light-transmitting area 110 completely exposes the sensing area 310, so that the infrared light is not blocked by the non-transmitting area of the substrate 100.
滤光层101设置于影像传感器芯片300的像素点311采集光线的一侧,用于过滤传输至影像传感器芯片300的光线。滤光层101例如可以是红外光滤光层101(Infrared Radiation,IR),红外光滤光层101可以使红外光透过,过滤其他波段的光线。滤光层101位于基底100上的透光区110和非透光区120,也就是说滤光层101覆盖透光区110和120,因此,传输至影像传感器芯片300的光线均会通过滤光层101,有利于提高影像传感的质量。滤光层101的外缘和基底100的外延重合,这样设置,可以使得滤光层101整面形成于基底100,无需进行滤光层101单独切割的然后再设置于基底上工艺步骤,从而有利于简化制作工艺。示例性地,滤光层101可以镀在基底100上。可选地,滤光层101的厚度范围为100um-150um,这样设置既有利于减薄影像传感器芯片的封装结构,又能够确保滤光层101的滤光效果。The filter layer 101 is disposed on the side where the pixel points 311 of the image sensor chip 300 collect light, and is used to filter the light transmitted to the image sensor chip 300. The filter layer 101 may be, for example, an infrared light filter layer 101 (Infrared Radiation, IR), and the infrared light filter layer 101 may transmit infrared light and filter light of other wavelength bands. The filter layer 101 is located in the light-transmitting area 110 and the non-light-transmitting area 120 on the substrate 100, that is to say, the filter layer 101 covers the light-transmitting areas 110 and 120. Therefore, the light transmitted to the image sensor chip 300 will pass through the filter The layer 101 helps to improve the quality of image sensing. The outer edge of the filter layer 101 coincides with the epitaxial extension of the substrate 100. This arrangement allows the entire surface of the filter layer 101 to be formed on the substrate 100. There is no need to cut the filter layer 101 separately and then set it on the substrate. Conducive to simplifying the production process. Illustratively, the filter layer 101 may be plated on the substrate 100. Optionally, the thickness of the filter layer 101 is in the range of 100 um to 150 um. This configuration is not only beneficial to thin the packaging structure of the image sensor chip, but also can ensure the filtering effect of the filter layer 101.
本申请实施例设置滤光层101位于基底100上,且位于透光区110和非透光区120,影像传感器芯片300倒装设置于基底100上远离滤光层101的一侧,感应区310朝向基底100的一侧设置,感应区310与透光区110对应,以使传输至影像传感器芯片300的光线均会通过滤光层101。在相关技术中,电子设备中的滤光片卡接在镜头上,且滤光片的厚度较厚,以能够与镜头进行机械连接,另外,卡接组件的尺寸也较大,因此,现有的滤光片的设置方式不利于电子设备的小型化。与相关技术不同的是,本申请实施例将滤光层101设置在影像传感器芯片的封装结构中,因此,与相关技术相比,一方面,本申请实施例可以采用贴合工艺将滤光层101贴合在基底100上,由于贴合工艺对滤光层101的厚度要求较低,因此可以将滤光层101的厚度设置的较薄,以有利于影像传感器芯片的封装结构的轻薄化;另一方面,本申请实施例可以采用贴合工艺,而无需使用卡接组件,避免了卡接组件占用电子设备的空间。综上,本申请实施例提供的影像传感器芯片的封装结构有利于电子设备的小型化。According to the embodiment of the present application, the filter layer 101 is located on the substrate 100 and located in the light-transmitting area 110 and the non-light-transmitting area 120. The image sensor chip 300 is flip-chip mounted on the substrate 100 on the side away from the filter layer 101, and the sensing area 310 Disposed on the side facing the substrate 100, the sensing area 310 corresponds to the light-transmitting area 110, so that all light transmitted to the image sensor chip 300 will pass through the filter layer 101. In the related art, the optical filter in the electronic device is clamped on the lens, and the thickness of the optical filter is thicker to be able to be mechanically connected with the lens. In addition, the size of the clamped component is also large. Therefore, the existing The setting of the filter is not conducive to the miniaturization of electronic equipment. Different from the related art, the embodiment of the present application arranges the filter layer 101 in the packaging structure of the image sensor chip. Therefore, compared with the related art, on the one hand, the embodiment of the present application may adopt a bonding process to attach the filter layer to the package structure of the image sensor chip. 101 is bonded to the substrate 100. Since the bonding process requires a relatively low thickness of the filter layer 101, the thickness of the filter layer 101 can be set to be thinner, which is beneficial to the lighter and thinner package structure of the image sensor chip; On the other hand, the embodiment of the present application can adopt a bonding process without using a snap-on component, which avoids the snap-on component occupying the space of the electronic device. In summary, the packaging structure of the image sensor chip provided by the embodiments of the present application is beneficial to the miniaturization of electronic devices.
继续参见图1,在本申请的一种实施方式中,可选地,基底100还包括透光基板102,滤光层101设置于透光基板102的表面,基底100靠近影像传感器芯片300一侧设置有布线线路104。其中,透光基板102的材料例如可以是玻璃,透光基板102+滤光层101的结构构成IR玻璃。透光基板102 覆盖透光区110和非透光区120,起到了支撑滤光层101和布线线路104的作用,提升了影像传感器芯片的封装结构的稳固性。Continuing to refer to FIG. 1, in an embodiment of the present application, optionally, the base 100 further includes a light-transmitting substrate 102, the filter layer 101 is disposed on the surface of the light-transmitting substrate 102, and the base 100 is close to the side of the image sensor chip 300 A wiring line 104 is provided. The material of the light-transmitting substrate 102 may be glass, for example, and the structure of the light-transmitting substrate 102 + the filter layer 101 constitutes IR glass. The light-transmitting substrate 102 covers the light-transmitting area 110 and the non-light-transmitting area 120, plays a role of supporting the filter layer 101 and the wiring line 104, and improves the stability of the packaging structure of the image sensor chip.
继续参见图1,在本申请的一种实施方式中,可选地,基底100还包括衬底材料层103,衬底材料层103例如可以包括介电材料层,设置衬底材料层103有助于布线线路104的设置。另外,由于衬底材料层103一般不透光,因此,衬底材料层103覆盖的区域形成非透光区120。Continuing to refer to FIG. 1, in an embodiment of the present application, optionally, the base 100 further includes a base material layer 103. The base material layer 103 may include, for example, a dielectric material layer. It is helpful to provide the base material layer 103 For the installation of the wiring line 104. In addition, since the base material layer 103 generally does not transmit light, the area covered by the base material layer 103 forms a non-transmissive area 120.
在上述各实施例中,示例性地示出了滤光层101的层数为一层,并非对本申请的限定,在其他实施例中,还可以根据需要设置滤光层101的层数为两层或多层。下面以滤光层101的层数为两层的情况进行详细说明。In the foregoing embodiments, the number of layers of the filter layer 101 is exemplarily shown as one layer, which is not a limitation of the present application. In other embodiments, the number of layers of the filter layer 101 can also be set to two as required. Layer or multiple layers. Hereinafter, a detailed description will be given assuming that the number of layers of the filter layer 101 is two.
图2为本申请实施例提供的另一种影像传感器芯片的封装结构的示意图。参见图2,在本申请的一种实施方式中,可选地,滤光层101包括第一滤光层和第二滤光层,第一滤光层和第二滤光层分别设置于透光基板102的正面130和背面140。其中,透光基板102的正面130是指,透光基板102远离影像传感器芯片300的一面;透光基板102的背面140是指,透光基板102靠近影像传感器芯片300的一面。即设置于透光基板102的正面130的滤光层101称为第一滤光层,设置于透光基板102的背面140的滤光层101称为第二滤光层。透光基板102的材料例如可以是玻璃,第一滤光层+透光基板102+第二滤光层的结构构成IR玻璃。示例性地,第一滤光层和第二滤光层可以分别镀在透光基板102的正面130和背面140上。本申请实施例设置透光基板102的两面均包括滤光层101,一方面,相当于增加了滤光层101的厚度,有利于提升滤光层101的滤光效果;另一方面,将滤光层101镀在透光基板102上时,在透光基板102的表面会产生应力,透光基板102的正面130和背面140均镀有滤光层101有利于平衡透光基板102受到的应力,从而有利于防止透光基板102因发生变形而导致滤光层101发生翘曲。FIG. 2 is a schematic diagram of another image sensor chip packaging structure provided by an embodiment of the application. Referring to FIG. 2, in an embodiment of the present application, optionally, the filter layer 101 includes a first filter layer and a second filter layer, and the first filter layer and the second filter layer are respectively disposed on the transparent layer. The front surface 130 and the back surface 140 of the optical substrate 102. Wherein, the front side 130 of the light-transmitting substrate 102 refers to the side of the light-transmitting substrate 102 away from the image sensor chip 300; the back side 140 of the light-transmitting substrate 102 refers to the side of the light-transmitting substrate 102 close to the image sensor chip 300. That is, the filter layer 101 provided on the front surface 130 of the transparent substrate 102 is called a first filter layer, and the filter layer 101 provided on the back surface 140 of the transparent substrate 102 is called a second filter layer. The material of the transparent substrate 102 may be, for example, glass, and the structure of the first filter layer + the transparent substrate 102 + the second filter layer constitutes IR glass. Exemplarily, the first filter layer and the second filter layer may be plated on the front surface 130 and the back surface 140 of the light-transmitting substrate 102, respectively. In the embodiment of the present application, both sides of the transparent substrate 102 include the filter layer 101. On the one hand, it is equivalent to increasing the thickness of the filter layer 101, which is beneficial to improve the filtering effect of the filter layer 101; on the other hand, the filter layer 101 is When the light layer 101 is plated on the light-transmitting substrate 102, stress will be generated on the surface of the light-transmitting substrate 102. The front 130 and back 140 of the light-transmitting substrate 102 are both coated with the filter layer 101 to balance the stress on the light-transmitting substrate 102 Therefore, it is beneficial to prevent warping of the filter layer 101 due to deformation of the light-transmitting substrate 102.
继续参见图2,在本申请的一种实施方式中,可选地,布线线路104设置于第二滤光层靠近影像传感器芯片300的一侧,即布线线路104设置于IR玻璃靠近影像传感器芯片300的一侧。本申请实施例这样设置,不仅可以使布线线路104的设置位置更加靠近影像传感器芯片300,从而有利于影像传感器芯片300和布线线路104的连接;而且在滤光层101和透光基板102之 间,无需设置布线线路,有利于滤光层101与透光基板102的贴合,从而降低了工艺成本,提高了生产效率。Continuing to refer to FIG. 2, in an embodiment of the present application, optionally, the wiring line 104 is disposed on the side of the second filter layer close to the image sensor chip 300, that is, the wiring line 104 is disposed on the IR glass close to the image sensor chip. 300 on the side. The arrangement of the embodiment of the application in this way not only makes the wiring line 104 closer to the image sensor chip 300, thereby facilitating the connection between the image sensor chip 300 and the wiring line 104; but also between the filter layer 101 and the light-transmitting substrate 102 There is no need to provide wiring lines, which facilitates the bonding of the filter layer 101 and the light-transmitting substrate 102, thereby reducing the process cost and improving the production efficiency.
在上述各实施例中,影像传感器芯片300与布线线路104的连接方式有多种,例如,通过打线连接或者通过凸块连接等。In the foregoing embodiments, there are multiple ways to connect the image sensor chip 300 to the wiring line 104, for example, wire bonding or bump connection.
结合图1和图2,在本申请的一种实施方式中,可选地,影像传感器芯片的封装结构还包括凸块330,凸块330的一端与影像传感器芯片300电连接,凸块330的另一端与布线线路104电连接。1 and FIG. 2, in an embodiment of the present application, optionally, the packaging structure of the image sensor chip further includes bumps 330, one end of the bumps 330 is electrically connected to the image sensor chip 300, the bumps 330 The other end is electrically connected to the wiring line 104.
其中,影像传感器芯片300具有与像素点311电连接的导电走线(图中未示出),通过凸块330将导电走线与布线线路104电连接。凸块330的材料例如可以是金(Au)、银(Ag)、铝(Al)、钛(Ti)或铜(Cu)等金属,可选为金(Au)。凸块330的一端与影像传感器芯片300抵接,示例性地,影像传感器芯片300对应凸块330的位置设置有焊盘340,焊盘340与凸块330的一端抵接。可以通过焊接的方式或加热熔融的方式将凸块330和焊盘340电连接。凸块330的另一端与布线线路104抵接,示例性地,布线线路104对应凸块330的位置设置有焊盘(图中未示出),焊盘与凸块330的另一端抵接。可以通过焊接的方式或加热熔融的方式凸块330和布线线路104上的焊盘电连接。Wherein, the image sensor chip 300 has conductive traces (not shown in the figure) electrically connected to the pixel points 311, and the conductive traces are electrically connected to the wiring lines 104 through bumps 330. The material of the bump 330 may be, for example, gold (Au), silver (Ag), aluminum (Al), titanium (Ti), or copper (Cu), and may be gold (Au). One end of the bump 330 is in contact with the image sensor chip 300. Illustratively, the image sensor chip 300 is provided with a pad 340 at a position corresponding to the bump 330, and the pad 340 is in contact with one end of the bump 330. The bump 330 and the pad 340 may be electrically connected by soldering or heating and melting. The other end of the bump 330 abuts against the wiring line 104. For example, the wiring line 104 is provided with a pad (not shown in the figure) at a position corresponding to the bump 330, and the pad abuts against the other end of the bump 330. The bump 330 and the pad on the wiring line 104 can be electrically connected by soldering or heating and melting.
可选地,凸块330的数量为多个,分别对应影像传感器芯片300的多个引脚。凸块330与影像传感器芯片300的分布关系为,多个凸块330对称分布在影像传感器芯片300的两侧,或者多个凸块330围绕影像传感器芯片300的四周。Optionally, the number of bumps 330 is multiple, corresponding to multiple pins of the image sensor chip 300 respectively. The distribution relationship between the bumps 330 and the image sensor chip 300 is that a plurality of bumps 330 are symmetrically distributed on both sides of the image sensor chip 300, or a plurality of bumps 330 surround the periphery of the image sensor chip 300.
图3为本申请实施例提供的又一种影像传感器芯片的封装结构的示意图。参见图3,在本申请的一种实施方式中,可选地,影像传感器芯片的封装结构还包括位于非透光区120的焊垫1041,焊垫1041与布线线路104电连接,焊垫1041远离透光基板102的一面距离透光基板102的垂直距离小于芯片远离透光基板102的一面距离透光基板102的垂直距离。FIG. 3 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application. 3, in an embodiment of the present application, optionally, the packaging structure of the image sensor chip further includes a bonding pad 1041 located in the non-transmissive area 120, the bonding pad 1041 is electrically connected to the wiring line 104, and the bonding pad 1041 The vertical distance between the side away from the light-transmitting substrate 102 and the light-transmitting substrate 102 is smaller than the vertical distance between the side of the chip away from the light-transmitting substrate 102 and the light-transmitting substrate 102.
其中,焊垫1041例如可以是布线线路104中的一段导线或者一个焊盘,即焊垫1041可由布线线路104形成,是布线线路104的一部分。焊垫1041用于布线线路104与外部电路之间的电连接,另外凸块330用于影像传感器 芯片300与布线线路104之间的电连接,以使影像传感器芯片300通过布线线路104与外部电路进行电信号的传输。本申请实施例设置焊垫1041远离透光基板102的一面距离透光基板102的垂直距离小于芯片远离透光基板102的一面距离透光基板102的垂直距离,也就是说,焊垫1041的尺寸不会超出影像传感器芯片300,影像传感器芯片的封装结构的厚度即为基板100、凸块330和传感器芯片300的厚度之和。The bonding pad 1041 may be, for example, a section of wire or a pad in the wiring line 104, that is, the bonding pad 1041 may be formed by the wiring line 104 and is a part of the wiring line 104. The pad 1041 is used for electrical connection between the wiring line 104 and the external circuit, and the bump 330 is used for the electrical connection between the image sensor chip 300 and the wiring line 104, so that the image sensor chip 300 is connected to the external circuit through the wiring line 104 Carry out the transmission of electrical signals. In the embodiment of the present application, the vertical distance between the side of the solder pad 1041 away from the transparent substrate 102 and the transparent substrate 102 is smaller than the vertical distance between the side of the chip away from the transparent substrate 102 and the transparent substrate 102, that is, the size of the solder pad 1041 Without exceeding the image sensor chip 300, the thickness of the packaging structure of the image sensor chip is the sum of the thickness of the substrate 100, the bumps 330 and the sensor chip 300.
在本申请的一种实施方式中,可选地,焊垫1041的数量为多个,分别对应外部电路的多个连接端子。焊垫1041与影像传感器芯片300的分布关系为,多个焊垫1041对称分布在影像传感器芯片300的一侧、两侧,或者多个焊垫1041围绕影像传感器芯片300的四周。In an embodiment of the present application, optionally, the number of solder pads 1041 is multiple, which respectively correspond to multiple connection terminals of the external circuit. The distribution relationship between the bonding pads 1041 and the image sensor chip 300 is that a plurality of bonding pads 1041 are symmetrically distributed on one side and two sides of the image sensor chip 300, or a plurality of bonding pads 1041 surround the periphery of the image sensor chip 300.
在上述各实施例中,焊垫1041与外部电路电连接的方式有多种,例如通过焊球焊接,或者通过导电胶连接。在本申请的一种实施方式中,可选地,焊垫1041用于通过导电胶与外部电路电连接。其中,导电胶是指具有导电性能的胶体,例如可以是异方性导电胶膜(Anisotropic Conductive Film,ACF)。相比于焊球,导电胶的厚度较薄,有利于减小影像传感器芯片的封装结构的厚度。示例性地,若采用焊球作为布线线路104和外部电路的连接介质,影像传感器芯片的封装结构总体厚度约800um,而若采用导电胶作为布线线路104和外部电路的连接介质,包括滤光层101的影像传感器芯片的封装结构的厚度小于等于300um,由此可见,本申请实施例可以减小影像传感器芯片的封装结构的厚度。In the foregoing embodiments, there are many ways to electrically connect the solder pad 1041 with the external circuit, such as soldering through solder balls, or connecting through conductive glue. In an embodiment of the present application, optionally, the solder pad 1041 is used to electrically connect with an external circuit through conductive glue. Among them, the conductive adhesive refers to a colloid with conductive properties, such as an anisotropic conductive film (ACF). Compared with solder balls, the thickness of the conductive adhesive is thinner, which is beneficial to reduce the thickness of the package structure of the image sensor chip. Exemplarily, if solder balls are used as the connection medium between the wiring circuit 104 and the external circuit, the overall thickness of the package structure of the image sensor chip is about 800um, and if the conductive glue is used as the connection medium between the wiring circuit 104 and the external circuit, the optical filter layer is included. The thickness of the packaging structure of the image sensor chip of 101 is less than or equal to 300 um. It can be seen that the embodiment of the present application can reduce the thickness of the packaging structure of the image sensor chip.
在上述各实施例中,焊垫1041的结构形式有多种,下面就其中几种结构形式进行说明,但不作为对本申请的限定。In the foregoing embodiments, there are multiple structural forms of the solder pad 1041, and several of the structural forms will be described below, but they are not intended to limit the application.
图4为本申请实施例提供的又一种影像传感器芯片的封装结构的示意图,图5为图4沿方向C的结构示意图。参见图4和图5,在本申请的一种实施方式中,可选地,基底100还包括覆盖布线线路104的绝缘层400,绝缘层400暴露出布线线路104的一部分构成焊垫1041。其中,示例性地,绝缘层400包括开口401,开口401暴露布线线路104的一部分,从而形成焊垫1041。本申请实施例设置绝缘层400覆盖布线线路104,绝缘层400暴露出布线线路104的一部分构成焊垫1041,一方面有利于避免布线线路104除焊垫1401 外的其他部分与外部电路发生短接,另一方面绝缘层400的设置有利于为影像传感器芯片的封装结构提供支撑,提升影像传感器芯片的封装结构的稳固性。FIG. 4 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application, and FIG. 5 is a schematic diagram of the structure of FIG. 4 along the direction C. Referring to FIGS. 4 and 5, in an embodiment of the present application, optionally, the substrate 100 further includes an insulating layer 400 covering the wiring line 104, and the insulating layer 400 exposes a part of the wiring line 104 to constitute a bonding pad 1041. Wherein, for example, the insulating layer 400 includes an opening 401, and the opening 401 exposes a part of the wiring line 104, thereby forming a bonding pad 1041. In the embodiment of the application, an insulating layer 400 is provided to cover the wiring line 104, and a part of the insulating layer 400 that exposes the wiring line 104 constitutes a solder pad 1041. On the one hand, it is beneficial to avoid short-circuiting of other parts of the wiring line 104 with the external circuit except for the solder pad 1401. On the other hand, the arrangement of the insulating layer 400 is beneficial to provide support for the packaging structure of the image sensor chip, and improve the stability of the packaging structure of the image sensor chip.
图6为本申请实施例提供的又一种影像传感器芯片的封装结构的示意图。参见图6,在本申请的一种实施方式中,可选地,焊垫1041包括第一焊垫1041A和第二焊垫1041B;第一焊垫1041A位于第二焊垫1041B远离透光区110的一侧,即第一焊垫1041A位于第二焊垫1041B的外侧。第一焊垫1041A和第二焊垫1041B之间设置有绝缘层400。示例性地,第二焊垫1041B位于绝缘层400的开口内,对应第二焊垫1041B的位置,外部电路的连接端子设置有凸起,以使连接端子能够与第二焊垫1041B卡接在一起,有利于布线线路104与外部电路之间的固定连接。FIG. 6 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application. Referring to FIG. 6, in an embodiment of the present application, optionally, the soldering pad 1041 includes a first soldering pad 1041A and a second soldering pad 1041B; the first soldering pad 1041A is located on the second soldering pad 1041B away from the light-transmitting area 110 One side of the first pad 1041A is located outside of the second pad 1041B. An insulating layer 400 is provided between the first bonding pad 1041A and the second bonding pad 1041B. Exemplarily, the second soldering pad 1041B is located in the opening of the insulating layer 400, corresponding to the position of the second soldering pad 1041B, and the connecting terminal of the external circuit is provided with bumps so that the connecting terminal can be connected to the second soldering pad 1041B. Together, it facilitates the fixed connection between the wiring line 104 and the external circuit.
在本申请的一种实施方式中,可选地,第一焊垫1041A与第二焊垫1041B电连接。本申请实施例在设置第一焊垫1041A之外,还设置了第二焊垫1041B,相当于增大了第一焊垫1041A与外部电路的接触面积,进一步提升了布线线路104与外部电路之间的连接的稳固性。In an embodiment of the present application, optionally, the first bonding pad 1041A and the second bonding pad 1041B are electrically connected. In the embodiment of the application, in addition to the first bonding pad 1041A, the second bonding pad 1041B is also provided, which is equivalent to increasing the contact area between the first bonding pad 1041A and the external circuit, and further improves the connection between the wiring line 104 and the external circuit. The stability of the connection between.
继续参见图6,在本申请的一种实施方式中,可选地,第一焊垫1041A远离第二焊垫1041B的侧面裸露。即第一焊垫1041A远离第二焊垫1041B的侧面未设置有绝缘层400。本申请实施例这样设置,使得第一焊垫1041A进行导电胶连接的可操作空间较大,降低了作业难度,有利于导电胶更加牢固的粘贴焊垫1041和外部电路。Continuing to refer to FIG. 6, in an embodiment of the present application, optionally, the side of the first bonding pad 1041A away from the second bonding pad 1041B is exposed. That is, the side surface of the first solder pad 1041A away from the second solder pad 1041B is not provided with the insulating layer 400. The arrangement of the embodiment of the present application makes the first solder pad 1041A have a larger operating space for conductive adhesive connection, reduces the difficulty of operation, and facilitates the conductive adhesive to adhere the solder pad 1041 and the external circuit more firmly.
图7为本申请实施例提供的又一种影像传感器芯片的封装结构的示意图。参见图7,在本申请的一种实施方式中,可选地,布线线路104靠近透光区110的一侧设置有绝缘层400,即,在布线线路104的内侧还设置有绝缘层400。相比于布线线路104凹凸不平的表面,绝缘层400的表面更加平整,有利于生物识别光线经过绝缘层400的表面反射至影像传感器芯片300的感应区310。FIG. 7 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application. Referring to FIG. 7, in an embodiment of the present application, optionally, an insulating layer 400 is provided on the side of the wiring line 104 close to the light-transmitting area 110, that is, an insulating layer 400 is also provided on the inner side of the wiring line 104. Compared with the uneven surface of the wiring line 104, the surface of the insulating layer 400 is flatter, which facilitates the reflection of the biometric light through the surface of the insulating layer 400 to the sensing area 310 of the image sensor chip 300.
图8为本申请实施例提供的又一种影像传感器芯片的封装结构的示意图。参见图8,在本申请的一种实施方式中,可选地,影像传感器芯片300的周缘设置有密封胶500,密封胶500将影像传感器芯片300与基底100之间密 封。本申请实施例这样设置,一方面,可以防止影像传感器芯片300的感应区311受到外界水汽的污染;另一方面,密封胶500可以防止影像传感器芯片300从基底100上脱落。FIG. 8 is a schematic diagram of yet another image sensor chip packaging structure provided by an embodiment of the application. Referring to FIG. 8, in an embodiment of the present application, optionally, a sealant 500 is provided on the periphery of the image sensor chip 300, and the sealant 500 seals the image sensor chip 300 and the substrate 100. The embodiment of the present application is arranged in this way, on the one hand, it can prevent the sensing area 311 of the image sensor chip 300 from being contaminated by external water vapor; on the other hand, the sealant 500 can prevent the image sensor chip 300 from falling off the substrate 100.
在上述实施例中,若采用焊球将布线线路104和外部电路电连接,在焊接的过程中,影像传感器芯片的封装结构的受热严重,需要采用透气性较好的密封胶500,然而密封胶500的透气性好带来的影响是阻隔性能降低,影像传感器芯片300的感应区311易受外界水汽的污染。若采用焊垫1041和导电胶的实施方式将布线线路104与外部电路电连接,能够降低邦定过程中产生的热量,避免了影像传感器芯片的封装结构产生热量的现象,从而可以选择气密性较好的密封胶500,有利于提升密封胶500隔绝水汽的能力。In the above-mentioned embodiment, if solder balls are used to electrically connect the wiring circuit 104 and the external circuit, the packaging structure of the image sensor chip is severely heated during the soldering process, and the sealant 500 with better air permeability needs to be used. However, the sealant The good air permeability of 500 has the effect of reduced barrier performance, and the sensing area 311 of the image sensor chip 300 is susceptible to contamination by external water vapor. If the bonding pad 1041 and conductive adhesive are used to electrically connect the wiring line 104 with the external circuit, the heat generated in the bonding process can be reduced, and the heat generated by the packaging structure of the image sensor chip can be avoided, so that the air tightness can be selected A better sealant 500 is beneficial to improve the ability of the sealant 500 to isolate water vapor.

Claims (16)

  1. 一种影像传感芯片的封装结构,包括:An image sensor chip packaging structure, including:
    基底,所述基底包括透光区以及围绕所述透光区的非透光区,所述非透光区设置有布线线路;所述基底包括滤光层,所述滤光层位于所述基底上的所述透光区和所述非透光区;A substrate, the substrate includes a light-transmitting area and a non-transmitting area surrounding the light-transmitting area, the non-transmitting area is provided with wiring lines; the substrate includes a filter layer, the filter layer is located on the substrate The light-transmitting area and the non-light-transmitting area on the upper part;
    倒装设置于所述基底上远离所述滤光层的一侧的影像传感器芯片,所述影像传感器芯片包括感应区,所述感应区朝向所述基底的一侧设置,所述感应区与所述透光区对应。An image sensor chip flip-chip arranged on the side of the substrate away from the filter layer, the image sensor chip includes a sensing area, the sensing area is disposed toward one side of the substrate, the sensing area and the The light-transmitting area corresponds.
  2. 根据权利要求1所述的影像传感芯片的封装结构,其中,所述基底还包括透光基板,所述滤光层设置于所述透光基板的表面,所述基底靠近所述影像传感器芯片一侧设置有所述布线线路。The image sensor chip packaging structure according to claim 1, wherein the base further comprises a light-transmitting substrate, the filter layer is disposed on a surface of the light-transmitting substrate, and the base is close to the image sensor chip The wiring line is provided on one side.
  3. 根据权利要求2所述的影像传感芯片的封装结构,其中,所述滤光层包括第一滤光层和第二滤光层,所述第一滤光层和所述第二滤光层分别设置于透光基板的正面和背面。The packaging structure of the image sensor chip according to claim 2, wherein the filter layer comprises a first filter layer and a second filter layer, and the first filter layer and the second filter layer They are respectively arranged on the front and back of the light-transmitting substrate.
  4. 根据权利要求3所述的影像传感芯片的封装结构,其中,所述布线线路设置于所述第二滤光层靠近所述影像传感器芯片的一侧。3. The image sensor chip packaging structure of claim 3, wherein the wiring line is disposed on a side of the second filter layer close to the image sensor chip.
  5. 根据权利要求1所述的影像传感芯片的封装结构,其中,所述滤光层的厚度范围为100um-150um。The packaging structure of the image sensor chip according to claim 1, wherein the thickness of the filter layer ranges from 100 um to 150 um.
  6. 根据权利要求1所述的影像传感芯片的封装结构,还包括凸块,所述凸块的一端与所述影像传感器芯片电连接,所述凸块的另一端与所述布线线路电连接。The packaging structure of the image sensor chip according to claim 1, further comprising a bump, one end of the bump is electrically connected to the image sensor chip, and the other end of the bump is electrically connected to the wiring line.
  7. 根据权利要求2所述的影像传感芯片的封装结构,还包括位于所述非透光区的焊垫,所述焊垫与所述布线线路电连接,所述焊垫远离所述透光基板的一面距离所述透光基板的垂直距离小于所述芯片远离所述透光基板的一面距离所述透光基板的垂直距离。The image sensor chip package structure according to claim 2, further comprising solder pads located in the non-transmissive area, the solder pads are electrically connected to the wiring lines, and the solder pads are away from the light-transmitting substrate The vertical distance between one side of the chip and the light-transmitting substrate is smaller than the vertical distance between the side of the chip away from the light-transmitting substrate and the light-transmitting substrate.
  8. 根据权利要求7所述的影像传感芯片的封装结构,其中,所述焊垫用于通过导电胶与外部电路电连接。8. The packaging structure of the image sensor chip according to claim 7, wherein the bonding pad is used for electrically connecting with an external circuit through a conductive glue.
  9. 根据权利要求7所述的影像传感芯片的封装结构,其中,所述基底还包括覆盖所述布线线路的绝缘层;8. The packaging structure of the image sensor chip according to claim 7, wherein the substrate further comprises an insulating layer covering the wiring line;
    所述绝缘层暴露出所述布线线路的一部分构成所述焊垫。A part of the insulating layer that exposes the wiring line constitutes the bonding pad.
  10. 根据权利要求9所述的影像传感芯片的封装结构,其中,所述焊垫包括第一焊垫和第二焊垫;所述第一焊垫位于所述第二焊垫远离所述透光区的一侧;9. The image sensor chip package structure according to claim 9, wherein the solder pad comprises a first solder pad and a second solder pad; the first solder pad is located on the second solder pad away from the light-transmitting One side of the area
    所述第一焊垫和所述第二焊垫之间设置有所述绝缘层。The insulating layer is provided between the first solder pad and the second solder pad.
  11. 根据权利要求10所述的影像传感芯片的封装结构,其中,所述第一焊垫与所述第二焊垫电连接。10. The image sensor chip packaging structure of claim 10, wherein the first bonding pad is electrically connected to the second bonding pad.
  12. 根据权利要求10或11所述的影像传感芯片的封装结构,其中,所述第一焊垫远离所述第二焊垫的侧面裸露。The package structure of the image sensor chip according to claim 10 or 11, wherein the side of the first bonding pad away from the second bonding pad is exposed.
  13. 根据权利要求9所述的影像传感芯片的封装结构,其中,所述布线线路靠近所述透光区的一侧设置有所述绝缘层。9. The packaging structure of the image sensor chip according to claim 9, wherein the insulating layer is provided on a side of the wiring line close to the light-transmitting area.
  14. 根据权利要求7所述的影像传感芯片的封装结构,其中,所述焊垫设置于所述芯片的周边区域的一侧或者两侧。8. The packaging structure of the image sensor chip according to claim 7, wherein the bonding pads are provided on one side or both sides of the peripheral area of the chip.
  15. 根据权利要求7所述的影像传感芯片的封装结构,其中,所述封装结构的厚度小于或等于300um。8. The packaging structure of the image sensor chip according to claim 7, wherein the thickness of the packaging structure is less than or equal to 300um.
  16. 根据权利要求1所述的影像传感芯片的封装结构,其中,所述影像传感器芯片的周缘设置有密封胶,所述密封胶将所述影像传感器芯片与所述基底之间密封。The packaging structure of the image sensor chip according to claim 1, wherein a sealant is provided on the periphery of the image sensor chip, and the sealant seals the image sensor chip and the substrate.
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