WO2021054109A1 - Pin terminal, connector, wire harness with connector, and control unit - Google Patents
Pin terminal, connector, wire harness with connector, and control unit Download PDFInfo
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- WO2021054109A1 WO2021054109A1 PCT/JP2020/032933 JP2020032933W WO2021054109A1 WO 2021054109 A1 WO2021054109 A1 WO 2021054109A1 JP 2020032933 W JP2020032933 W JP 2020032933W WO 2021054109 A1 WO2021054109 A1 WO 2021054109A1
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- base material
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- thickness
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B7/00—Insulated conductors or cables characterised by their form
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
Definitions
- the present disclosure relates to pin terminals, connectors, wire harnesses with connectors, and control units.
- This application claims the priority based on Japanese Patent Application No. 2019-170932 of the Japanese application dated September 19, 2019, and incorporates all the contents described in the Japanese application.
- a rod-shaped pin terminal is used as a terminal for connecting the other side terminal and the circuit board.
- the pin terminal typically has a base material made of a copper alloy and a tin-plated layer covering the surface of the base material, as described in the specification [0002] of Patent Document 1.
- Patent Document 1 discloses a plating layer constituting the outermost layer in which a Sn—Pd-based alloy phase is present in the Sn matrix and the Pd content in the outermost layer is in a specific range. ..
- the pin terminals of this disclosure are A pin terminal including a rod-shaped base material and a plating layer covering a predetermined region of the base material.
- the plating layer includes a tin-based layer composed of a metal containing tin.
- One end side of the base material is provided with a tip covering portion that covers the entire circumferential region of the base material.
- the tin-based layer includes the tip covering portion and contains the tip covering portion.
- the tip covering portion includes a thin film portion and a thick film portion at different positions in the circumferential direction of the base material.
- the constituent material of the base material is a copper alloy having a Zn content of 20% by mass or less, or pure copper.
- the connectors of the present disclosure are The pin terminal of the present disclosure is provided.
- the wire harness with a connector of the present disclosure is The connector of the present disclosure and the wire harness are provided.
- the wire harness is connected to the region on the other end side of the pin terminal.
- the control unit of the present disclosure is The connector of the present disclosure or the wire harness with the connector of the present disclosure and a circuit board are provided.
- the circuit board and the region on one end side of the pin terminal are connected by solder.
- FIG. 1 is a perspective view showing an outline of a pin terminal according to an embodiment.
- FIG. 2 is a cross-sectional view taken along the II-II cutting line shown in FIG.
- FIG. 3 is a cross-sectional view taken along the III-III cutting line shown in FIG.
- FIG. 4 is a side view showing an outline of the connector according to the embodiment.
- FIG. 5 is a side view showing an outline of the wire harness with a connector according to the embodiment.
- FIG. 6 is a side view showing an outline of the control unit according to the embodiment.
- FIG. 7 is a process diagram illustrating a method for manufacturing a pin terminal.
- FIG. 8A shows the sample No. prepared in Test Example 1.
- FIG. 8B is a diagram showing a magnified micrograph of a region surrounded by a broken line rectangle B in the photomicrograph of FIG. 8A.
- FIG. 8C is a diagram showing a magnified micrograph of a region surrounded by a broken line rectangle C in the photomicrograph of FIG. 8A.
- FIG. 8D is a diagram showing a magnified micrograph of a region surrounded by a broken line rectangle D in the photomicrograph of FIG. 8A.
- FIG. 8B is a diagram showing a magnified micrograph of a region surrounded by a broken line rectangle B in the photomicrograph of FIG. 8A.
- FIG. 8C is a diagram showing a magnified micrograph of a region surrounded by a broken line rectangle C in the photomicrograph of FIG. 8A.
- FIG. 8D is a diagram showing a magnified micrograph of a region surrounded by a broken line rectangle D in the photomicrograph of FIG. 8A.
- FIG. 8E is a diagram showing a magnified micrograph of a region surrounded by a broken line rectangle E in the photomicrograph of FIG. 8A.
- FIG. 9 is a graph showing the relationship between the heat treatment temperature, the maximum wetting force, and the number of tin protrusions for the pin terminals of each sample prepared in Test Example 2.
- FIG. 10 is a graph showing the relationship between the thickness of the outer layer made of pure tin and the maximum wetting force among the tin-based layers existing in the region on one end side of the base material for the pin terminals of each sample prepared in Test Example 2. Is. FIG.
- FIG. 11 shows the thickness of the inner layer made of an alloy containing tin and copper and the number of tin protrusions among the tin-based layers existing in the region on one end side of the base material for the pin terminals of each sample prepared in Test Example 2. It is a graph which shows the relationship with.
- FIG. 12A shows the sample No. 2 which was not heat-treated after the secondary plating in Test Example 2. It is a figure which shows the micrograph which photographed the surface of the thin film part about the pin terminal of 1.
- FIG. 12B shows the sample No. 2 in Test Example 2 in which the heat treatment temperature after the secondary plating was set to 200 ° C. It is a figure which shows the micrograph which photographed the surface of the thin film part about 2 pin terminals.
- FIG. 12C shows the sample No.
- FIG. 12D shows the sample No. 2 in Test Example 2 in which the heat treatment temperature after the secondary plating was 240 ° C. It is a figure which shows the micrograph which photographed the surface of the thin film part about 50 pin terminals.
- Pin terminals that can prevent defective soldering are desired. Further, it is desirable to use a pin terminal which is excellent in solder wettability and also has excellent insertability when connecting to the mating terminal.
- the area on one end side of the pin terminal is used for the area connected to the circuit board.
- the area on the other end of the pin terminal is used for the area connected to the other terminal.
- Solder is generally used to connect the pin terminal and the through hole of the circuit board. With conventional pin terminals, solder icicles may occur when solder is applied. Solder icicles are icicle-shaped protrusions that are formed by the molten solder dripping and solidifying when soldering. In applications where a large number of pin terminals are arranged close to each other, if there is a pin terminal with long solder icicles, the solder icicles conduct conduction between this pin terminal and the pin terminal adjacent to this pin terminal. That is, a short circuit is conceivable.
- the post-plating method is a method in which a plate material is punched out or plastically processed to form a base material having a predetermined shape, and then a plating layer is formed on the base material.
- the outer peripheral surface of the base material is covered with a plating layer substantially over the entire circumference. Therefore, in the region on one end side of the pin terminal to which the solder is applied, the solder comes into contact with the tin plating layer without directly contacting the base material. Therefore, the pin terminals produced by the post-plating method are excellent in solder wettability.
- the portion of the plating layer that covers the edge of the base material may be locally thickened, that is, an enlarged portion may be formed. If there is an enlarged portion in the region on the other end side of the pin terminal, the frictional force when the pin terminal is inserted into the mating terminal and connected tends to increase. If the frictional force is large, a large insertion force is required. As a result, the insertability of the pin terminal tends to decrease.
- Some connectors have a large number of pin terminals.
- the insertion force at the connector increases in proportion to the number of pin terminals. Therefore, in applications such as those in which a large number of pin terminals are arranged close to each other as described above, the insertability of the connector tends to be further lowered. Therefore, it is desired to keep the insertion force low.
- Patent Document 1 states that by providing the above-mentioned specific outermost layer, the above-mentioned insertion force can be lowered and good solder wettability can be ensured. However, if the outermost layer is formed by the post-plating method, the above-mentioned enlarged portion may occur. Therefore, there is room for improvement in reducing the insertion force. Further, in the manufacturing process, it is necessary to form a Pd plating layer. Therefore, there is room for improvement in terms of manufacturability.
- one of the purposes of this disclosure is to provide a pin terminal capable of preventing soldering defects.
- Another object of the present disclosure is to provide a connector, a wire harness with a connector, and a control unit capable of preventing soldering defects.
- the pin terminals of the present disclosure, the connectors of the present disclosure, the wire harness with the connector of the present disclosure, and the control unit of the present disclosure can prevent soldering defects.
- the pin terminal according to one aspect of the present disclosure is A pin terminal including a rod-shaped base material and a plating layer covering a predetermined region of the base material.
- the plating layer includes a tin-based layer composed of a metal containing tin.
- One end side of the base material is provided with a tip covering portion that covers the entire circumferential region of the base material.
- the tin-based layer includes the tip covering portion and contains the tip covering portion.
- the tip covering portion includes a thin film portion and a thick film portion at different positions in the circumferential direction of the base material.
- the constituent material of the base material is a copper alloy having a Zn content of 20% by mass or less, or pure copper.
- pin terminals of the present disclosure when solder is applied to the tip coating, soldering defects, especially solder icicles, are unlikely to occur. The reason for this is that the Zn content in the base material is low.
- the pin terminals of the present disclosure in an application in which a large number of pin terminals are arranged close to each other, for example, in an application connected to a circuit board of various control units, adjacent pin terminals are short-circuited by solder icicles. Can be prevented. Therefore, the pin terminals of the present disclosure are suitable for connectors and the like having a large number of pin terminals.
- the pin terminal of the present disclosure has excellent solder wettability on one end side of the base material.
- the reason for this is that the tip covering portion that covers the surface on one end side of the base material over the entire circumference can be used for the bonding region with the solder.
- the pin terminal of the present disclosure is excellent in insertability into the mating terminal on the other end side of the base material.
- One of the reasons for this is as follows.
- a pin terminal provided with a tip covering portion having different thicknesses of a thin film portion and a thick film portion on one end side of the base material does not have the above-mentioned enlarged portion on the other end side of the base material. With such a pin terminal, the insertion force when connecting the region on the other end side of the base material to the mating terminal is small.
- Such a pin terminal of the present disclosure may be manufactured by the following manufacturing method.
- This manufacturing method uses not the above-mentioned post-plating method but a so-called pre-plating method and a post-plating method in which a plating formation region is partially used in combination, and a specific heat treatment is performed after the post-plating.
- this manufacturing method may be referred to as a multi-stage plating manufacturing method. Details of the multi-stage plating method will be described later.
- the pre-plating method is a method of forming a base material having a predetermined shape by forming a tin-based layer on a plate as a material of the base material and then punching a plate with the tin-based layer.
- Such pin terminals of the present disclosure can prevent short circuits between adjacent pin terminals due to whiskers in applications where a large number of pin terminals are arranged close to each other.
- the pin terminals of the present disclosure are also excellent in manufacturability.
- One of the reasons for this is that it is not necessary to form a Pd plating layer.
- the tip covering portion includes an outer layer and an inner layer, and has an outer layer and an inner layer.
- the constituent material of the outer layer is pure tin.
- Examples of the constituent material of the inner layer include a form of an alloy containing tin and copper.
- the outer layer is excellent in solder wettability, and the inner layer can reduce the generation of whiskers.
- a point 1 mm from one end of the pin terminal along the longitudinal direction of the pin terminal is set as a measurement point, and the difference between the maximum value t 1 and the minimum value t 2 of the thickness of the tip covering portion measured at the measurement point.
- Examples thereof include a form in which (t 1 ⁇ t 2) is 0.20 ⁇ m or more.
- the above form can be manufactured by a multi-stage plating method.
- the number of whiskers in the thin film portion tends to decrease.
- the above-mentioned form is excellent in insertability into the mating terminal.
- the thickness of the tin-based layer formed by the pre-plating method generally corresponds to the difference (t 1- t 2). That is, the region on the other end side of the base material includes a tin-based layer having a thickness of 0.20 ⁇ m or more in a part of the base material in the circumferential direction.
- Such a pin terminal of the present disclosure can also reduce the connection resistance with the terminal on the other side.
- a point 1 mm from one end of the pin terminal along the longitudinal direction of the pin terminal is set as a measurement point, and the ratio of the maximum value t 1 and the minimum value t 2 of the thickness of the tip coating portion measured at the measurement point.
- Examples thereof include a form in which t 2 / t 1 is 0.2 or more and less than 0.8.
- the above form can be manufactured by a multi-stage plating method.
- the number of whiskers in the thin film portion tends to decrease.
- the above-mentioned form is excellent in insertability into the mating terminal.
- the thin film portion is provided in contact with the base material and has the minimum value t 2 .
- Examples of the thick film portion include a form having the maximum value t 1.
- the above form is excellent in solder wettability, and it is easier to reduce the occurrence of whiskers in the thick film portion.
- the portion provided with the tip covering portion is cut in a plane orthogonal to the axis thereof.
- the shape of the base material is rectangular and
- the outer peripheral surfaces of the base material include a first surface and a second surface arranged to face each other, and a third surface and a fourth surface arranged to face each other.
- the portion of the tip covering portion that covers at least one of the first surface and the second surface has the maximum value t 1 .
- a portion of the tip covering portion that covers at least one of the third surface and the fourth surface may have a form having the minimum value t 2.
- the above form can be manufactured by the multi-stage plating method, so it is excellent in manufacturability.
- the first surface and the second surface are surfaces on which a plating layer is formed by a pre-plating method.
- the third and fourth surfaces are cut surfaces by punching.
- the plating layer includes a base layer between a portion of the tip covering portion that covers the first surface and the second surface and the base material.
- the portion of the tip covering portion that covers the third surface and the fourth surface is provided in contact with the base material.
- the constituent material of the base layer include a form of pure nickel or a nickel alloy.
- the generation of whiskers is likely to be reduced by the underlying layer.
- a point 1 mm, a point 3 mm, and a point 5 mm along the longitudinal direction of the pin terminal from one end of the pin terminal Is a measurement point for the thickness of the tip covering portion, and the difference between the maximum thickness and the minimum thickness is taken at the three measurement points, and the maximum value of this difference is 1.0 ⁇ m or less.
- the thickness of the outer layer in the thin film portion is 0.5 ⁇ m or more.
- the thickness of the inner layer in the thin film portion may be 0.1 ⁇ m or more.
- the outer layer is excellent in solder wettability, and the inner layer can reduce the generation of whiskers.
- the number of whiskers existing on the surface of the thin film portion is 15 or less in a square field of view having a side length of 0.35 mm.
- the maximum wetting force of the tip covering portion measured by the meniscograph tester may be 0.25 mN or more.
- the above form has a high maximum wetting force and is excellent in solder wettability. Further, in the above embodiment, the number of whiskers is small in the thin film portion even when the thin film portion is in contact with the base material. Therefore, in the above-mentioned applications in which a large number of pin terminals are arranged close to each other, it is possible to prevent short circuits between adjacent pin terminals due to whiskers. Such a form is more suitable for a connector or the like having a large number of pin terminals.
- the other end side of the base material is provided with a rear end covering portion and an exposed region at different positions in the circumferential direction of the base material.
- the tin-based layer includes the rear end covering portion.
- the rear end covering portion covers a part of the circumferential direction on the other end side of the base material. In the exposed region, a form in which the plating layer is not provided and the base material is exposed can be mentioned.
- the region on one end side of the base material is a region connected to the circuit board, and the region on the other end side of the base material is a region connected to the terminal on the other side, so that the solder wettability is excellent. It also has excellent insertability into the terminal on the other side. Further, in the above embodiment, the connection resistance with the mating terminal can be reduced by the rear end covering portion.
- the connector according to one aspect of the present disclosure is It is provided with any one of the pin terminals (1) to (11) above.
- the region on one end side of the pin terminal and the circuit board can be satisfactorily connected by solder by the tip coating portion.
- soldering defects such as solder icicles are unlikely to occur. Therefore, the connector of the present disclosure can prevent short circuits between adjacent pin terminals due to solder icicles even when a large number of pin terminals are arranged close to each other.
- the region on the other end side of the pin terminal can be easily inserted into the mating terminal. If the multi-stage plating method is used, the number of whiskers on the surface of the tip coating is small.
- the wire harness with a connector is The connector of (12) above and the wire harness are provided.
- the wire harness is connected to the region on the other end side of the pin terminal.
- the wire harness with a connector of the present disclosure the area on one end side of the pin terminal and the circuit board can be satisfactorily connected by soldering.
- solder when solder is applied to the region on one end side of the pin terminal, soldering defects such as solder icicles are unlikely to occur. Therefore, the wire harness with a connector of the present disclosure can prevent short circuits between adjacent pin terminals due to solder icicles even when a large number of pin terminals are arranged close to each other.
- the wire harness with a connector of the present disclosure is excellent in insertion workability because it is easy to insert the region on the other end side of the pin terminal into a terminal attached to the end of the wire harness, that is, a terminal on the other side.
- the wire harness with a connector of the present disclosure if the multi-stage plating method is used, the number of whiskers at each pin terminal is small, so that it is possible to prevent the adjacent pin terminals from being short-circuited by the whiskers.
- the control unit is The connector of the above (12) or the wire harness with the connector of the above (13) and a circuit board are provided.
- the circuit board and the region on one end side of the pin terminal are connected by solder.
- the control unit of the present disclosure the area on one end side of the pin terminal and the circuit board are satisfactorily connected by solder. Therefore, the connection resistance between the pin terminal and the circuit board is low. In particular, when solder is applied to the region on one end side of the pin terminal, soldering defects such as solder icicles are unlikely to occur. Therefore, the control unit of the present disclosure can prevent short circuits between adjacent pin terminals due to solder icicles even when a large number of pin terminals are arranged close to each other. Further, the control unit of the present disclosure is excellent in insertion workability because the region on the other end side of the pin terminal can be easily inserted into a terminal attached to the end of the wire harness, that is, a terminal on the other side.
- the insertion force when connecting to the mating terminal is not too large, and the insertion work can be easily performed.
- the control unit of the present disclosure is provided with a large number of pin terminals, if the multi-stage plating method is used, the number of whiskers at each pin terminal is small, so that adjacent pin terminals are prevented from being short-circuited by the whiskers. it can.
- Examples of the circuit board include a form in which at least one of engine fuel injection and engine ignition is controlled.
- the above form may include a large number, for example, 200 or more, and further 250 or more pin terminals. Even in this case, the above-described embodiment can prevent the adjacent pin terminals from being short-circuited by solder icicles. Further, in the above form, the insertion force when connecting to the other end terminal is not too large, and the insertability is excellent. Further, if the multi-stage plating method is used, a short circuit between adjacent pin terminals due to whiskers is unlikely to occur.
- the pin terminal 1 of the embodiment is a rod-shaped metal member as shown in FIG.
- the pin terminal 1 is typically supported by the housing 60 of the connector 6 as shown in FIG. 4 to be described later, and is used as an electrical connection member.
- the area on one end side of the pin terminal 1 is used as a connection area with the terminal on the other side.
- the region on the other end side of the pin terminal 1 is used as a connection region with the circuit board 80 as shown in FIG. 6 to be described later.
- the pin terminal 1 includes a rod-shaped base material 2 and a plating layer 3.
- the plating layer 3 covers a predetermined region of the base material 2.
- the plating layer 3 includes a tin-based layer 30 made of a metal containing tin (Sn).
- the range in which the surface of the base material 2 is covered by the tin-based layer 30 differs between the region on one end side and the region on the other end side of the base material 2.
- the tin-based layer 30 covers the entire circumference of the base material 2 in the circumferential direction.
- the tin-based layer 30 covers a part of the base material 2 in the circumferential direction and does not cover the other part.
- the plating layer 3 is not provided and a part of the base material 2 is exposed.
- the region of the base material 2 exposed from the plating layer 3 is referred to as an exposed region 26.
- the constituent material of the base material 2 is a copper alloy having a Zn content of 20% by mass or less, or pure copper.
- the overall configuration of the base material 2 and the plating layer 3 will be described first. Next, the region on one end side and the region on the other end side of the base material 2 will be described in order.
- the base material 2 which is the main body of the pin terminal 1 is made of pure copper or a copper alloy.
- Pure copper contains 99.9% by mass or more of copper (Cu), and the balance is composed of unavoidable impurities.
- the base material 2 made of pure copper has high conductivity and tends to have low connection resistance.
- Copper alloy is an alloy that contains additive elements, the balance is composed of Cu and unavoidable impurities, and contains the largest amount of Cu.
- the constituent material of the base material 2 is a copper alloy
- the content of zinc (Zn) in the copper alloy is 20% by mass or less.
- the Zn in the copper alloy constituting the base material 2 easily promotes the formation of solder icicles. Further, it is considered that the smaller the Zn content in the copper alloy, the less likely it is that solder icicles will be generated. As a result, in an application in which a large number of pin terminals 1 are arranged close to each other, it is easy to prevent short circuits between adjacent pin terminals 1 due to solder icicles. From the viewpoint of preventing short circuits due to solder icicles, the Zn content is preferably 15% by mass or less, more preferably 12% by mass or less, and 10% by mass or less.
- Copper alloys having a Zn content of 1% by mass or less and further 0.5% by mass or less are preferable because they are less likely to cause solder icicles and are superior to pure copper in terms of mechanical strength and the like. It is considered that pure copper containing substantially no Zn is less likely to cause solder icicles.
- additive elements other than Zn include tin (Sn), phosphorus (P), iron (Fe) and the like.
- the total content of the additive elements is, for example, 0.05% by mass or more and 15% by mass or less.
- Specific copper alloys include iron-containing copper containing Fe and phosphor bronze containing Sn and P.
- copper containing iron include alloy number C1940 specified in JIS.
- phosphor bronze include alloy numbers C5911 and C5210.
- C1940 contains Fe in an amount of 2.1% by mass or more and 2.6% by mass or less, Zn in an amount of 0.05% by mass or more and 0.20% by mass or less, and P in an amount of 0.015% by mass or more and 0.150% by mass or less.
- C5191 and C5210 contain Sn of 5.5% by mass or more and 7.0% by mass or less, 7.0% by mass or more and 9.0% by mass or less, and P of 0.03% by mass or more and 0.35% by mass or less.
- Zn content is 0.20% by mass or less.
- the specific composition of C1940 is specified in JIS H 3100: 2018.
- the specific composition of C5911 is specified in JIS H 3110: 2018.
- the specific composition of C5210 is specified in JIS H 3130: 2018.
- the outer shape of the base material 2 is typically a rectangular parallelepiped shape. Although not shown, the base material 2 may have a locally overhanging portion at an appropriate position in the longitudinal direction thereof. The overhanging portion is used for positioning with respect to the housing 60 and the like.
- the outer shape of the base material 2 may be a polygonal columnar shape such as a hexagonal columnar shape, a columnar shape having a curved outer peripheral surface such as a columnar column or an elliptical columnar shape, or the like.
- the outer shape of the base material 2 is a rectangular parallelepiped, as shown in FIGS. 2 and 3, the cross-sectional shape of the base material 2 cut by a plane orthogonal to the axis of the base material 2 is rectangular. Can be mentioned. Typically, the cross-sectional shape is square.
- the outer peripheral surface of the base material 2 includes a first surface 21 and a second surface 22 arranged to face each other and a third surface 23 and a fourth surface 24 arranged to face each other in the above cross section. ..
- the third surface 23 and the fourth surface 24 are provided so as to be substantially orthogonal to the first surface 21 and the second surface 22.
- the first surface 21 and the second surface 22 are the upper surface and the lower surface of the paper surface
- the third surface 23 and the fourth surface 24 are the left surface and the right surface of the paper surface.
- the size of the base material 2, for example, length, width, height and the like can be appropriately selected.
- the length of the base material 2 is the length along the axis of the base material 2.
- the width of the base material 2 is a length along a direction orthogonal to the axis of the base material 2, for example, in the cross sections shown in FIGS. 2 and 3, the length of the first surface 21 and the length of the second surface 22.
- the height of the base material 2 is a length along a direction orthogonal to both the axial direction and the width direction of the base material 2, for example, in the above cross section, the length of the third surface 23 and the length of the fourth surface 24.
- the width and height of the base material 2 are 0.3 mm or more and 5.0 mm or less, respectively.
- plating layer (Plating layer) ⁇ Overview> A predetermined region on the surface of the base material 2 is covered with a plating layer 3 including a tin-based layer 30.
- One end side of the base material 2 includes a tip covering portion 31.
- the other end side of the base material 2 is provided with a rear end covering portion 32.
- the tin-based layer 30 includes a front end covering portion 31 and a rear end covering portion 32.
- the tip covering portion 31 covers the entire area in the circumferential direction on one end side of the base material 2.
- the tip covering portion 31 containing tin is excellent in solder wettability. With such a tip covering portion 31, the region on one end side of the base material 2 can be satisfactorily wetted with the solder over the entire circumference of the base material 2 in the circumferential direction.
- the rear end covering portion 32 covers a part of the circumferential direction on the other end side of the base material 2.
- the rear end covering portion 32 containing tin is soft and easily deformed. With such a rear end covering portion 32, the region on the other end side of the base material 2 can reduce the connection resistance with the mating terminal.
- the tin-based layer 30 includes an outer layer 302 and an inner layer 301.
- the constituent material of the outer layer 302 is pure tin.
- the constituent material of the inner layer 301 is an alloy containing tin and copper.
- the outer layer 302 is provided on the outer periphery of the inner layer 301 in contact with the inner layer 301.
- Pure tin contains 99% by mass or more of Sn, and the balance is composed of unavoidable impurities. Further, pure tin may contain Sn in an amount of 99.8% by mass or more.
- the alloy containing tin and copper is typically a binary alloy of Sn and Cu, and the balance may be composed of unavoidable impurities.
- the alloy may contain an element such as Zn in addition to Sn and Cu.
- the outer layer 302 made of pure tin has excellent solder wettability. Therefore, when the tip covering portion 31 includes the outer layer 302, the region on one end side of the base material 2 can be satisfactorily wetted with the solder. When the rear end covering portion 32 includes the outer layer 302, the connection resistance with the mating terminal can be reduced.
- the inner layer 301 made of the above alloy reduces the generation of whiskers on the surface of the tin-based layer 30. Therefore, when the front end covering portion 31 and the rear end covering portion 32 are provided with the inner layer 301, it is possible to prevent the adjacent pin terminals 1 from being short-circuited by the whisker in an application in which a large number of pin terminals 1 are arranged close to each other. be able to.
- the tin-based layer 30 including the inner layer 301 which is an alloy layer and the outer layer 302 which is a pure tin layer can be typically manufactured by forming a pure tin layer by various plating methods and then performing a heat treatment. Can be mentioned.
- the plating layer 3 may include a layer other than the tin-based layer 30.
- the plating layer 3 may include a base layer 300 between the tin-based layer 30 and the base material 2.
- Examples of the constituent material of the base layer 300 include pure nickel and nickel alloy.
- the base layer 300 made of pure nickel or a nickel alloy reduces the generation of whiskers on the surface of the tin-based layer 30.
- the pin terminal 1 including the base layer 300 and the tin-based layer 30 including the inner layer 301 can more effectively prevent the short circuit caused by the whiskers described above.
- the base layer 300 increases the rigidity of the plating layer 3 and contributes to the improvement of wear resistance.
- Ni nickel
- pure nickel contains 99% by mass or more of nickel (Ni), and the balance is composed of unavoidable impurities. Further, pure nickel may contain 99.9% by mass or more of Ni.
- the nickel alloy is an alloy containing an additive element, the balance of which is Ni and unavoidable impurities, and which contains the largest amount of Ni. Examples of the additive element include Sn, Zn, Cu and the like.
- the region on one end side of the base material 2 is covered with the tip covering portion 31 which is a tin-based layer 30, and the base material 2 is not exposed.
- the tip covering portion 31 is not a uniform thickness in the circumferential direction of the base material 2 but is partially different at a predetermined point along the longitudinal direction of the pin terminal 1, for example, 1 mm from one end of the pin terminal 1. Has a thickness. That is, the tip covering portion 31 includes the thin film portion 34 and the thick film portion 35 at different positions in the circumferential direction of the base material 2.
- the existence of the thin film portion 34 and the thick film portion 35 at the predetermined point can be typically confirmed by observing a cross section cut in a plane orthogonal to the axis of the pin terminal 1 at the predetermined point.
- the thin film portion 34 is a region where the thickness of the tip covering portion 31 is relatively thin.
- the thick film portion 35 is a region where the thickness of the tip covering portion 31 is relatively thick.
- the pin terminal 1 satisfies at least one of the following conditions (1) and (2) with respect to the maximum value t 1 and the minimum value t 2 of the thickness of the tip covering portion 31 measured at the following measurement points, for example. Can be mentioned.
- the difference (t 1 ⁇ t 2 ) between the maximum value t 1 and the minimum value t 2 is 0.20 ⁇ m or more.
- the ratio t 2 / t 1 of the maximum value t 1 and the minimum value t 2 is 0.2 or more and less than 0.8.
- the measurement point is a point 1 mm along the longitudinal direction of the pin terminal 1 from one end of the pin terminal 1 in the area where the tip covering portion 31 is provided in the pin terminal 1.
- Maximum value t 1 the minimum value t 2
- the details of the measurement method of the thickness t 31, t 32, t i , t o which will be described later, it will be described in Test Examples below.
- the thickness of the tip covering portion 31 is the total thickness of the thickness of the inner layer 301 and the thickness of the outer layer 302.
- the thin film portion 34 has a minimum value t 2 .
- the thick film portion 35 has a maximum value t 1 .
- the thin film portion 34 is typically provided in contact with the base material 2.
- the pin terminal 1 that satisfies at least one of the conditions (1) and (2) is excellent in solder wettability due to the tip coating portion 31 on one end side of the base material 2, and is connected to the mating terminal on the other end side of the base material 2.
- Excellent insertability One of the reasons for the excellent insertability is that the rear end covering portion 32 does not have a locally thick enlarged portion on the other end side of the base material 2, preferably a uniform thickness in the longitudinal direction of the base material 2. Because it has.
- a tin-based layer 30 having a non-uniform thickness in the circumferential direction of the base material 2 is provided on one end side of the base material 2, as described above.
- a pin terminal 1 having a tin-based layer 30 having no enlarged portion on the other end side of the base material 2 can be obtained. That is, the pin terminal 1 satisfying at least one of the conditions (1) and (2) can be obtained. Therefore, the pin terminal 1 having the tip covering portion 31 satisfying a specific thickness condition on one end side of the base material 2 is provided with the rear end covering portion 32 having no enlarged portion on the other end side of the base material 2. I can say.
- the difference (t 1 ⁇ t 2 ) may be, for example, 0.30 ⁇ m or more, 0.50 ⁇ m or more, and 0.80 ⁇ m or more.
- the pin terminal 1 can easily maintain good solder wettability.
- the difference (t 1- t 2) is, for example, 5.0 ⁇ m or less, 4.5 ⁇ m or less, 4.0 ⁇ m or less.
- the difference (t 1 ⁇ t 2 ) is 0.20 ⁇ m or more and 5.0 ⁇ m or less, and further 1.0 ⁇ m or more and 4.0 ⁇ m or less, the pin terminal 1 is excellent in solder wettability, insertability, and manufacturability. Further, the connection resistance between the pin terminal 1 and the other terminal tends to be low.
- the ratio t 2 / t 1 may be, for example, 0.25 or more, 0.30 or more, 0.35 or more, 0.40 or more. Further, the ratio t 2 / t 1 may be, for example, 0.75 or less, 0.70 or less, and 0.60 or less.
- the pin terminal 1 is excellent in solder wettability, insertability, and manufacturability.
- the pin terminal 1 that satisfies both the conditions (1) and (2) is more excellent in solder wettability due to the tip coating portion 31 on one end side of the base material 2, and is inserted into the mating terminal on the other end side of the base material 2. Better in sex.
- the absolute value of the maximum value t 1 is, for example, 1.0 ⁇ m or more and 7.0 ⁇ m or less.
- the absolute value of the minimum value t 2 is, for example, 0.8 ⁇ m or more and 4.0 ⁇ m or less. However, t 2 ⁇ t 1 .
- a portion of the tip covering portion 31 that covers at least one of the first surface 21 and the second surface 22 has a maximum value of t 1 . Further, it can be mentioned that the portion of the tip covering portion 31 that covers at least one of the third surface 23 and the fourth surface 24 has a minimum value t 2.
- the first surface 21 and the second surface 22 are each provided with a thick film portion 35, and the third surface 23 and the fourth surface 24 are provided with a thin film portion 34, respectively.
- At least one thick film portion 35 has a maximum value t 1 .
- At least one thin film portion 34 has a minimum value t 2 .
- the tip covering portion 31 having such a thin film portion 34 and a thick film portion 35 can be obtained by using, for example, a multi-stage plating method.
- a tin-based layer by the pre-plating method and a tin-based layer by the post-plating method are formed on the first surface 21 and the second surface 22. That is, a thick tin-based layer is formed.
- This thick tin-based layer finally forms the thick film portion 35.
- a tin-based layer by a post-plating method is formed in contact with each surface on the third surface 23 and the fourth surface 24, which are cut surfaces by punching.
- the third surface 23 and the fourth surface 24 do not have a tin-based layer formed by the pre-plating method. That is, on the third surface 23 and the fourth surface 24, a thin tin-based layer formed by the post-plating method is formed in contact with each surface.
- This thin tin-based layer finally forms the thin film portion 34.
- the thickness of the thick film portion 35 provided on the first surface 21 and the second surface 22, and the thickness of the thin film portion 34 provided on the third surface 23 and the fourth surface 24 are respectively. It can be mentioned that the thickness is uniform along the surface.
- the uniform thickness along each surface means that the difference between the following maximum thickness and minimum thickness is less than 0.20 ⁇ m.
- a plurality of measurement points are taken with respect to the tip covering portion 31 on each surface from one end of the pin terminal 1 along the longitudinal direction of the pin terminal 1, for example, at a point of 1 mm. The difference between the maximum thickness and the minimum thickness of the thickness of the tip covering portion 31 measured at the measurement points on each surface is taken.
- the thick film portion 35 and the thin film portion 34 have a more uniform thickness at the above points. If the thick film portion 35 and the thin film portion 34 have uniform thicknesses, the thickness of the solder tends to be uniform.
- the thickness of the thick film portion 35 on the first surface 21 and the thickness of the thick film portion 35 on the second surface 22 are substantially equal.
- the thickness of the thin film portion 34 on the third surface 23 and the thickness of the thin film portion 34 on the fourth surface 24 are substantially equal to each other.
- this form can be said to have a symmetrical shape centered on the bisector in the width direction and the bisector in the height direction of the pin terminal 1.
- the symmetrically shaped pin terminal 1 is easy to adjust molding conditions and plating conditions, and is excellent in manufacturability.
- the difference in thickness in the longitudinal direction of the pin terminal 1 is small. In this form, it is easy to secure a long region in the tip covering portion 31 to which the solder is applied in the longitudinal direction of the pin terminal 1. Therefore, the pin terminal 1 can easily apply solder to the region on one end side of the base material 2.
- the maximum value of the above difference may be 0.95 ⁇ m or less, further 0.90 ⁇ m or less, 0.85 ⁇ m or less, and 0.80 ⁇ m or less.
- the thickness t 31 of the inner layer 301 in the thin film portion 34 may be 0.1 ⁇ m or more. Further, the thickness t 32 of the outer layer 302 in the thin film portion 34 is 0.5 ⁇ m or more.
- the thickness t 31 of the inner layer 301 is 0.1 ⁇ m or more, whiskers are unlikely to be generated on the surface of the thin film portion 34 by the inner layer 301 even if the thin film portion 34 is provided in contact with the base material 2. If the number of whiskers is small, preferably if there are virtually no whiskers, it is possible to prevent the adjacent pin terminals 1 from being short-circuited by the whiskers.
- the thickness t 31 may be, for example, 0.11 ⁇ m or more and 0.15 ⁇ m or more. Further, when the thickness t 31 is 0.2 ⁇ m or more, the occurrence of whiskers is further reduced.
- the thickness t 32 of the outer layer 302 is 0.5 ⁇ m or more, the portion of the base material 2 provided with the thin film portion 34, that is, the third surface 23 and the fourth surface 24 in FIG. 2 are well wetted with the solder by the outer layer 302. Can be done.
- the thickness t 32 may be, for example, 0.6 ⁇ m or more and 0.8 ⁇ m or more. Further, when the thickness t 32 is 1.0 ⁇ m or more, the portion of the base material 2 provided with the thin film portion 34 can be better wetted with the solder.
- the upper limit of the thickness t 31 of the inner layer 301 and the upper limit of the thickness t 32 of the outer layer 302 are not particularly set. However, as the thicknesses t 31 and t 32 are larger, the plating time becomes longer and the manufacturability tends to decrease. From the viewpoint of good manufacturability, the thickness t 31 of the inner layer 301 is, for example, 1.0 ⁇ m or less and 0.8 ⁇ m or less.
- the thickness t 32 of the outer layer 302 is, for example, 3.9 ⁇ m or less and 3.5 ⁇ m or less.
- the pin terminal 1 can reduce the occurrence of whiskers and is excellent in manufacturability.
- the thickness t 32 of the outer layer 302 is, for example, 0.5 ⁇ m or more and 3.9 ⁇ m or less, and further 1.0 ⁇ m or more and 3.5 ⁇ m or less, the pin terminal 1 is excellent in solder wettability and also excellent in manufacturability.
- the thickness of the outer layer 302 in the thick film portion 35 is thicker than the thickness t 32 of the outer layer 302 in the thin film portion 34, for example, 1.0 ⁇ m or more, 1.5 ⁇ m or more, 2.0 ⁇ m or more.
- the thickness of the inner layer 301 in the thick film portion 35 is thicker than the thickness t 31 of the inner layer 301 in the thin film portion 34, for example, 0.20 ⁇ m or more, further 0.25 ⁇ m or more, 0.30 ⁇ m or more.
- the thickness of the base layer 300 is, for example, 0.3 ⁇ m or more and 4.0 ⁇ m or less, and further 0.5 ⁇ m or more and 2.0 ⁇ m or less.
- the tip covering portion 31 may be provided in contact with the base material 2 over the entire circumference of the base material 2 in the circumferential direction.
- both the thin film portion 34 and the thick film portion 35 include an inner layer 301 and an outer layer 302.
- the reason for this is that the outer layer 302 is excellent in solder wettability, while the inner layer 301 can reduce the generation of whiskers on an arbitrary surface of the tip covering portion 31.
- the thickness t 31 of the inner layer 301 of the thin film portion 34 is more preferably 0.1 ⁇ m or more.
- the reason for this is that the generation of whiskers can be reduced in the thin film portion 34 as described above, and the thickness of the inner layer 301 of the thick film portion 35 is thicker than the thickness t 31 , so that the generation of whiskers can be further reduced. Is.
- the tip covering portion 31 may be provided so as to be in contact with the base material 2 at a part in the circumferential direction of the base material 2 and not to be in contact with the base material 2 at another portion.
- An underlayer 300 may be provided at a portion of the tip covering portion 31 that does not come into contact with the base material 2.
- the thin film portion 34 is provided in contact with the base material 2, and the thick film portion 35 is provided in contact with the base layer 300 without contacting the base material 2.
- the thickness t 31 of the inner layer 301 of the thin film portion 34 is 0.1 ⁇ m or more, the thin film portion 34 can reduce the generation of whiskers.
- the generation of whiskers can be further reduced by the base layer 300 in addition to the relatively thick inner layer 301.
- This form can be produced by forming a base layer 300 made of pure nickel or a nickel alloy in the pre-plating method and then forming a tin-based layer when the multi-stage plating method is used.
- the plating layer 3 is located between the portion of the tip covering portion 31 that covers the first surface 21 and the second surface 22 and the base material 2.
- the base layer 300 is provided and the above-mentioned portion is the thick film portion 35.
- the portion of the tip covering portion 31 that covers the third surface 23 and the fourth surface 24 is provided in contact with the base material 2, and the above-mentioned portion is the thin film portion 34. That is, the first surface 21 and the second surface 22 are provided with the base layer 300 and the thick film portion 35 in this order.
- the third surface 23 and the fourth surface 24 include a thin film portion 34 and do not include a base layer 300.
- the tip covering portion 31 may be provided so as not to come into contact with the base material 2 over the entire circumference in the circumferential direction of the base material 2. That is, the base layer 300 is provided over the entire circumference of the base material 2 in the circumferential direction, and the tip covering portion 31 is provided on the base layer 300. In this case, the base layer 300 reduces the generation of whiskers on any surface of the tip covering portion 31.
- this form is manufactured by using the multi-stage plating method, masking is required and the manufacturability is lowered. Specifically, after forming the base layer 300 and the tin-based layer by the pre-plating method, punching is performed.
- the base layer 300 is provided in a part of the base material 2 in the circumferential direction.
- the tip covering portion 31 has a small number of whiskers.
- the whiskers are protrusions made of tin, and are relatively long protrusions specified in JIS C 60068-2-82: 2009, for example, needle-shaped protrusions having a length of 10 ⁇ m or more.
- the thin film portion 34 which is a relatively thin portion of the tip covering portion 31, is in contact with the base material 2 containing copper, whiskers are more likely to occur in the thin film portion 34 than in the thick film portion 35.
- the thickness t 31 of the inner layer 301 provided in the thin film portion 34 as described above tends to be thinner than the thickness of the inner layer 301 provided in the thick film portion 35.
- the number of whiskers present in the thin film portion 34 is 15 or less in the following field of view.
- the field of view is a square region having a side length of 0.35 mm. The method for measuring the number of whiskers will be described in a test example described later.
- the number of whiskers is 15 or less in the region of 0.35 mm ⁇ 0.35 mm, the number of whiskers in the thin film portion 34 is small. Therefore, in an application in which a large number of pin terminals 1 are arranged close to each other, it is possible to prevent short circuits between adjacent pin terminals 1 due to whiskers.
- the number of whiskers is preferably 10 or less, 5 or less, 3 or less, and more preferably 0, that is, no whiskers are present in the region.
- nodule As the protrusion made of tin, there is a spherical protrusion called a nodule, that is, a relatively short protrusion. Although nodules are present, the short circuit is unlikely to occur if the whiskers, which are the relatively long protrusions described above, are few, preferably not present.
- the pin terminals 1 having 15 or less whiskers in the above region typically have an inner layer 301 provided in the thin film portion 34 having a thickness t 31 of 0.1 ⁇ m or more. Further, such a pin terminal 1 can be manufactured by, for example, a multi-stage plating method.
- the tip covering portion 31 is excellent in solder wettability. Quantitatively, the maximum wetting force of the tip covering portion 31 measured by the Meniscograph tester is 0.25 mN or more. The method for measuring the maximum wetting force will be described in a test example described later.
- the maximum wetting force is 0.25 mN or more, the region on one end side of the base material 2 can be well wetted with the solder by the tip coating portion 31, and the solder wettability is excellent.
- the larger the maximum wetting force the better the solder wetting property.
- the maximum wetting force is preferably 0.26 mN or more, more preferably 0.28 mN or more, and more preferably 0.30 mN or more.
- the pin terminal 1 having a maximum wetting force of 0.25 mN or more typically includes an outer layer 302 over the entire circumference of the base material 2 in the circumferential direction in a region on one end side of the base material 2, and is provided in the thin film portion 34. It can be mentioned that the thickness t 32 of the outer layer 302 is 0.5 ⁇ m or more.
- Such a pin terminal 1 can be manufactured by, for example, a multi-stage plating method.
- the other end side of the base material 2 includes a rear end covering portion 32 and an exposed region 26.
- the rear end covering portion 32 and the exposed region 26 are provided at different positions in the circumferential direction of the base material 2. In the exposed region 26, the plating layer 3 is not provided and the base material 2 is exposed.
- the rear end covering portion 32 is continuous with the front end covering portion 31 and constitutes an integral tin-based layer 30.
- the thickness t 35 of the rear end covering portion 32 and the thickness of the thick film portion 35 of the front end covering portion 31, typically the maximum value t 1 are often different.
- the tin-based layer 30 has a step in the longitudinal direction of the base material 2.
- the rear end covering portion 32 and the exposed region 26 As a specific position of the rear end covering portion 32 and the exposed region 26, when the cross-sectional shape of the base material 2 is the above-mentioned rectangular shape, the rear end covering is performed on the first surface 21 and the second surface 22 as shown in FIG. It has a portion 32, and the third surface 23 and the fourth surface 24 are exposed regions 26.
- the thick film portion 35 of the tip covering portion 31 is provided in the region on one end side of the base material 2 on the first surface 21 and the second surface 22, and the rear end covering portion 32 is provided in the region on the other end side of the base material 2.
- the thin film portion 34 is provided in the region on one end side of the third surface 23 and the fourth surface 24, and the base material 2 is exposed in the region on the other end side of the base material 2.
- the thickness of the rear end covering portion 32 provided on the first surface 21 and the second surface 22, respectively, is a uniform thickness in the longitudinal direction of the base material 2.
- the uniform thickness in the longitudinal direction means that the maximum value of the difference between the following maximum thickness and minimum thickness is less than 0.2 ⁇ m.
- a point 1 mm, a point 3 mm, and a point 5 mm are rearward along the longitudinal direction of the pin terminal 1 from the other end of the pin terminal 1. It is used as a measurement point for the thickness of the end covering portion 32. Take the difference between the maximum thickness and the minimum thickness at the three measurement points on each surface. Take the maximum value out of the two differences obtained for the two sides.
- the rear end covering portion 32 has a more uniform thickness. If the rear end covering portion 32 has a uniform thickness in the longitudinal direction, the pin terminal 1 does not have the above-mentioned enlarged portion, and the region on the other end side of the base material 2 is inserted into the mating terminal. Easy to do.
- the thickness of the rear end covering portion 32 provided on the first surface 21 and the second surface 22, respectively, is a uniform thickness along each surface.
- the uniform thickness along each surface means that the following difference between the maximum thickness and the minimum thickness satisfies less than 0.20 ⁇ m.
- a plurality of measurement points are taken from the other end of the pin terminal 1 along the longitudinal direction of the pin terminal 1 with respect to the rear end covering portion 32 on each surface, for example, at a point of 1 mm. The difference between the maximum thickness and the minimum thickness of the thickness of the rear end covering portion 32 measured at the measurement points on each surface is taken.
- the rear end covering portion 32 has a more uniform thickness at the above points. If the rear end covering portion 32 has a uniform thickness, it is easy to appropriately secure a contact area with the mating terminal, and the connection resistance tends to be low.
- the thickness of the rear end covering portion 32 on the first surface 21 and the thickness of the rear end covering portion 32 on the second surface 22 are substantially equal.
- this form can be said to have a symmetrical shape centered on the bisector in the width direction and the bisector in the height direction of the pin terminal 1.
- the symmetrically shaped pin terminal 1 is easy to adjust molding conditions and plating conditions, and is excellent in manufacturability.
- the rear end covering portion 32 is manufactured by a tin-based layer formed by the pre-plating method.
- the thickness of this tin-based layer corresponds to the difference (t 1 ⁇ t 2 ) in the tip covering portion 31 as described above.
- the thickness t 35 of the rear end covering portion 32 is the difference (t 1 ⁇ t 2 ) or more, it is easy to appropriately secure the contact area with the mating terminal, and the connection resistance with the mating terminal is likely to be low.
- the thickness of the thick film portion 35 of the front end covering portion 31 of the front end covering portion 31, typically thinner than the maximum value t 1 can be mentioned.
- the rear cover portion 32 comprises an inner layer 301 and outer layer 302
- the thickness t i of the inner layer 301 of the rear cover portion 32 thicker than the thickness t 31 of the inner layer 301 of the thin film portion 34, a thick film It is mentioned that it is thinner than the thickness of the inner layer 301 of the portion 35.
- the thickness t o of the outer layer 302 of the rear cover portion 32 is thicker than the thickness t 32 of the outer layer 302 of the thin film portion 34, thinner include than the thickness of the outer layer 302 of the thick portion 35 Be done.
- Such a pin terminal 1 can be manufactured by, for example, a multi-stage plating method.
- the connector 6 of the embodiment includes the pin terminal 1 of the embodiment.
- the connector 6 includes a plurality of pin terminals 1 and a housing 60. Each pin terminal 1 is held in the housing 60 in a state of being bent in an L shape.
- the housing 60 is a molded body made of an electrically insulating material such as resin.
- the housing 60 has a bottom portion and a peripheral wall portion.
- a plurality of through holes are provided on the bottom in an aligned state. By press-fitting each pin terminal 1 into each through hole, the bottom portion holds the pin terminal 1.
- the pin terminals 1 held at the bottom are arranged at predetermined intervals in the vertical direction of the paper surface and the vertical direction of the paper surface of FIG. 4, respectively.
- the peripheral wall portion is erected from the peripheral edge of the bottom portion and is continuous in an annular shape.
- a mating connector having a mating terminal for example, a connector 76 shown in FIG. 5, which will be described later, is inserted into the internal space surrounded by the bottom portion and the peripheral wall portion. Note that FIG. 4 and FIG. 6 described later are shown by cutting out a part of the housing 60.
- each pin terminal 1 the area on one end side including the tip covering portion 31 is exposed to the outside of the housing 60.
- the other end region including the rear end covering portion 32 is arranged in the internal space of the housing 60.
- Each pin terminal 1 is attached to the housing 60 so that the portion of the base material 2 where the rear end covering portion 32 is provided, for example, the first surface 21 and the second surface 22 are arranged on the upper side and the lower side of the paper surface of FIG. Be retained.
- the connector 76 is inserted, the rear end covering portion 32 is electrically connected by contacting the mating terminal which is a female terminal.
- the number of pin terminals 1 in the connector 6, the arrangement position of the pin terminals 1 with respect to the bottom of the housing 60, the shape of the housing 60, the constituent materials of the housing 60, and the like can be appropriately selected.
- the wire harness 7 with a connector of the embodiment includes the connector 6 of the embodiment and the wire harness 70.
- a wire harness 70 is connected to the region on the other end side of the pin terminal 1 where the rear end covering portion 32 is provided.
- the region of the pin terminal 1 on the one end side where the tip covering portion 31 is provided is connected to the circuit board 80.
- One end of the wire harness 70 is electrically connected to the circuit board 80 by the connector 6.
- the other end of the wire harness 70 is electrically connected to an electronic device (not shown) controlled by the circuit board 80.
- the wire harness 70 includes one or more electric wires 71 and connectors 74 and 75 attached to each end of the electric wires 71.
- the electric wire 71 includes a conductor and an electrically insulating layer.
- the conductor is typically composed of a conductive material such as copper, aluminum, or an alloy thereof.
- the electrically insulating layer is made of an electrically insulating material such as resin and covers the outer periphery of the conductor. Appropriate male and female connectors can be used for the connectors 74 and 75.
- the wire harness 7 with a connector may include another connector 76 between the connector 75 of the wire harness 70 and the connector 6 of the embodiment as illustrated in FIG.
- the connector 75 is a male connector and the connector 76 is a female connector.
- control unit 8 of the embodiment includes the connector 6 of the embodiment, the wire harness 7 with the connector of the embodiment, and the circuit board 80.
- the region on one end side of the pin terminal 1 provided with the tip covering portion 31 and the circuit board 80 are connected by solder 85.
- the control unit 8 shown in FIG. 6 includes the connector 6 of the embodiment.
- the control unit 8 including the wire harness 7 with a connector of the embodiment may refer to the alternate long and short dash line of FIG.
- the circuit board 80 includes a plurality of through holes 81. A region on one end side of each pin terminal 1 is inserted into each through hole 81. The region on one end side of the pin terminal 1 and the through hole 81 are conducted by the solder 85. Note that FIG. 6 shows a part of the circuit board 80 cut out. Further, FIG. 6 shows only a cross section of one through hole 81 as a representative.
- the circuit board 80 controls the electronic device connected to the connector 74 side of the wire harness 70 by the wire harness 70 connected to the region on the other end side of the pin terminal 1.
- the circuit board 80 is housed in a case (not shown).
- the circuit board 80 may, for example, control at least one of engine fuel injection and engine ignition.
- the control unit 8 provided with such a circuit board 80 is called an engine control unit.
- the engine control unit may include a large number, for example 200 or more, and 250 or more pin terminals 1.
- a control unit 8 other than the engine control unit may also have a large number of pin terminals 1.
- the pin terminal 1 of the embodiment can prevent soldering defects. Further, the pin terminal 1 is excellent in solder wettability and also excellent in insertability into the mating terminal. Such a pin terminal 1 can be manufactured with high productivity if it is manufactured by a multi-stage plating method. Further, the pin terminal 1 typically has a small number of whiskers on the tip covering portion 31.
- the pin terminal 1 of such an embodiment has the following effects (a) to (c), particularly in an application including a large number of pin terminals 1 described above. (A) It is possible to prevent short circuits between adjacent pin terminals 1 due to solder icicles. (B) It is suppressed that the insertion force when connecting to the other end terminal becomes too large. (C) It is prevented that the adjacent pin terminals 1 are short-circuited by the whisker.
- the connector 6 of the embodiment, the wire harness 7 with the connector of the embodiment, and the control unit 8 of the embodiment include the pin terminal 1 of the embodiment, it is possible to prevent soldering defects. Further, the connector 6, the wire harness 7 with a connector, and the control unit 8 are excellent in solder wettability and also excellent in insertability into the terminal on the other side. Further, the connector 6, the wire harness 7 with a connector, and the control unit 8 typically have a small number of whiskers on the tip covering portion 31.
- the connector 6 of the embodiment, the wire harness 7 with the connector of the embodiment, and the control unit 8 of the embodiment are described above when the number of the connectors 6 is large, for example, 200 or more, and 250 or more pin terminals 1. The effects of (a) to (c) are exhibited.
- the pin terminal 1 of the embodiment may be manufactured as follows, for example. First, a plated base material is molded by a so-called pre-plating method. A tin-based layer is formed by plating only in the region on one end side of the obtained plated base material. A tin-based layer is not formed in the region on the other end side of the base material. After this plating, heat treatment is performed under specific conditions.
- the multi-stage plating manufacturing method is based on the following findings.
- the thickness of the tin-based layer tends to be uniform.
- a cut surface is generated by punching. The cut surface is a surface on which the base material is exposed and does not have a tin-based layer. Due to the exposed portion of the base material, the molded product is inferior in solder wettability.
- the tin plating layer is further formed so as to cover only the region on one end side of the base material including the cut surface of the molded body, the solder wettability is improved. However, whiskers are likely to occur on the surface of the tin-plated layer provided directly above the base material.
- the generation of whiskers can be reduced.
- the reflow treatment melts the tin-based layer by the pre-plating method existing on the other end side of the base material, particularly the pure tin layer.
- a temperature exceeding the melting point of tin for example, about 300 ° C. to 400 ° C. is used as described in Patent Document 1. Due to the melting of the pure tin layer described above, on the other end side of the base material, a thick portion, that is, an enlarged portion is locally generated in the tin-based layer, and the insertability into the mating terminal is lowered.
- the multi-stage plating method may include, for example, the following steps.
- ⁇ Molding Step> The plated plate 91 is punched into a predetermined shape to produce a molding material 92 in which a plurality of rod-shaped portions 920 are arranged in parallel.
- the plated plate 91 includes a tin-based layer made of a metal containing tin.
- ⁇ Secondary Plating Step> A secondary plating layer 931 is formed in a region on one end side of each rod-shaped portion 920.
- the secondary plating layer 931 includes a pure tin layer composed of pure tin.
- ⁇ Heat treatment step> The partial plating material 93 including the secondary plating layer 931 is heat-treated. The heat treatment temperature is below the melting point of tin. The melting point of tin is about 232 ° C.
- the molding step is a step of manufacturing the molding material 92 by a so-called pre-plating method.
- the plated plate 91 used in the molding process includes a material plate 90 and a primary plating layer (not shown).
- FIG. 7 shows a long plate material wound into a coil as the material plate 90 and the plated plate 91.
- the constituent material of the material plate 90 is pure copper or a copper alloy.
- pure copper and copper alloy refer to the above-mentioned (base material) ⁇ composition> section.
- the primary plating layer is provided on the front and back surfaces of the material plate 90.
- the primary plating layer may be only a tin-based layer or may include a plating layer other than the tin-based layer.
- the tin-based layer may include only a pure tin layer, or may include a pure tin layer and an alloy layer.
- the alloy layer is composed of an alloy containing tin and copper. A part of the pure tin layer can be transformed into an alloy layer by the heat treatment described later.
- Examples of the plating layer other than the tin-based layer include a base layer 300 provided between the tin-based layer and the material plate 90. For details of the base layer 300, refer to the above-mentioned (plating layer) ⁇ composition> section.
- the thickness of the tin-based layer in the primary plating layer roughly corresponds to the above-mentioned difference (t 1- t 2). Therefore, the thickness of the tin-based layer in the primary plating layer is adjusted so that the difference (t 1 to t 2) is within a predetermined range.
- the thickness of the tin-based layer in the primary plating layer is, for example, 0.20 ⁇ m or more and 5.0 ⁇ m or less.
- the primary plating conditions are adjusted so that the thickness of the base layer 300 is, for example, within the above-mentioned predetermined range.
- the plated plate 91 may be manufactured by a known manufacturing method.
- the primary plating layer may be formed by various plating methods, typically an electroplating method.
- the molding material 92 includes a plurality of rod-shaped portions 920 and a connecting portion 925.
- the plurality of rod-shaped portions 920 are arranged in parallel at predetermined intervals so that the axes of the rod-shaped portions 920 are parallel to each other.
- the material plate 90 is exposed except for the portion where the connecting portion 925 is formed.
- the front and back surfaces of each rod-shaped portion 920 are provided with a primary plating layer.
- the cross-sectional shape cut by a plane orthogonal to the axis of each rod-shaped portion 920 includes the rectangular shape shown in FIGS. 2 and 3.
- the connecting portion 925 connects adjacent rod-shaped portions 920.
- the connecting portion 925 is provided at or near the center position in the longitudinal direction of the rod-shaped portion 920.
- the molding material 92 may be manufactured by a known press molding method. If the above-mentioned cross-sectional shape is rectangular, the molding material 92 can be easily molded by punching.
- the secondary plating step is a step of partially plating the molding material 92 by the pre-plating method to form the secondary plating layer 931, that is, a step of performing a partial post-plating method.
- the secondary plating layer 931 is formed in the region on one end side of each rod-shaped portion 920.
- the secondary plating layer 931 is not formed in the region on the other end side of each rod-shaped portion 920. Therefore, in the region on the other end side of each rod-shaped portion 920, the region where the material plate 90 is exposed and the region provided with the primary plating layer exist at different positions in the circumferential direction of each rod-shaped portion 920.
- the secondary plating layer 931 is formed so as to cover the entire circumference of each rod-shaped portion 920 in the circumferential direction in the region on one end side of each rod-shaped portion 920. As a result, in the region on one end side of each rod-shaped portion 920, the secondary plating layer 931 is in contact with the first coating portion provided in contact with the exposed region of the material plate 90 and the primary plating layer instead of the material plate 90. It is provided with a second covering portion provided in the above. The first coated portion and the second coated portion exist at different positions in the circumferential direction of each rod-shaped portion 920.
- the first coated portion finally constitutes the above-mentioned thin film portion 34. Since the first coating portion includes the secondary plating layer 931 and does not include the primary plating layer, it tends to have the above-mentioned minimum value t 2 .
- the second coated portion finally constitutes the above-mentioned thick film portion 35. Since the second coating portion includes the tin-based layer of the primary plating layer and the pure tin layer in the secondary plating layer 931, it tends to have the above-mentioned maximum value t 1.
- the thickness of the pure tin layer in the secondary plating layer 931 typically corresponds to the above-mentioned minimum value t 2. Therefore, the thickness of the pure tin layer in the secondary plating layer 931 is adjusted so that the minimum value t 2 is within a predetermined range.
- the thickness of the pure tin layer in the secondary plating layer 931 is, for example, 0.8 ⁇ m or more and 4.0 ⁇ m or less.
- the secondary plating layer 931 may be formed by various plating methods, typically an electroplating method. Prior to the formation of the secondary plating layer 931, pretreatment such as degreasing and acid cleaning may be performed.
- the heat treatment step is a step of performing a heat treatment for alloying a part of the pure tin layer in the secondary plating layer 931 existing in the region on one end side of the partial plating material 93.
- a heat treatment temperature is set to be equal to or lower than the melting point of tin so that the pure tin layer in the primary plating layer existing in the region on the other end side of the partial plating material 93 is hard to be melted.
- the heat treatment temperature is less than 230 ° C.
- the lower the heat treatment temperature the easier it is to prevent the above-mentioned melting.
- the layer made of pure tin tends to remain thick.
- a tin-based layer 30 having excellent solder wettability can be obtained.
- the higher the heat treatment temperature the more the alloying is promoted, and the thicker the layer composed of the alloy is likely to be.
- the generation of whiskers is likely to be reduced in the tin-based layer 30.
- the heat treatment temperature is preferably 225 ° C. or lower and 220 ° C. or lower.
- the heat treatment temperature is preferably 150 ° C. or higher, more preferably 180 ° C. or higher, 190 ° C. or higher, and 200 ° C. or higher.
- the heat treatment temperature holding time can be appropriately selected according to the size of the rod-shaped portion 920 and the like.
- the holding time is 5 seconds or more and 60 seconds or less.
- the heat treatment material 94 obtained through the heat treatment step includes a heat treatment layer 941 manufactured from the secondary plating layer 931 in a region on one end side of the rod-shaped portion 920.
- the heat treatment layer 941 includes a layer made of the above-mentioned alloy and a layer made of pure tin provided in contact with the alloy layer. That is, the heat treatment layer 941 corresponds to the tin-based layer 30 including the above-mentioned inner layer 301 and outer layer 302. At least a part of the alloy layer is provided in contact with the material plate 90.
- the pin terminal 1 of the embodiment is obtained by cutting the connecting portion 925 with respect to the heat treatment material 94 and separating the adjacent rod-shaped portions 920.
- the heat treatment layer 941 on one end side of the rod-shaped portion 920 constitutes the tip covering portion 31.
- the tin-based layer constitutes the rear end covering portion 32, and the region where the material plate 90 is exposed constitutes the exposed region 26 shown in FIG.
- Sample No. 1 to No. 4, No. 50 Sample No. 1 to No. 4, No. The pin terminal of 50 is a sample manufactured by using the above-mentioned multi-stage plating method. Three or more samples were prepared for each sample.
- a plated plate on which a primary plating layer is formed is punched into a predetermined shape to produce a molding material having a plurality of rod-shaped portions and connecting portions.
- a secondary plating layer is formed in a region on one end side of each rod-shaped portion to be parallel so as to cover the entire circumference of each rod-shaped portion in the circumferential direction.
- sample No. Heat treatment is performed except for 1.
- a pin terminal can be obtained by cutting the connecting portion connecting the adjacent rod-shaped portions. Sample No. In No. 1, after the secondary plating, the connecting portion was cut without performing heat treatment.
- the plated plate has a tin-based layer on the front and back surfaces of the copper alloy plate, and does not have a layer other than the tin-based layer such as a base layer.
- the tin-based layer includes an alloy layer containing tin and copper on the copper alloy plate side, and a pure tin layer on the alloy layer.
- a plate composed of brass of JIS alloy number C2600 and a plate composed of phosphor bronze of JIS alloy number C1940 were prepared.
- a copper alloy plate having a thickness of 0.64 mm was prepared.
- the secondary plating layer is a pure tin layer and does not include layers other than the pure tin layer such as the base layer.
- the pin terminal of each sample includes a rod-shaped base material and a tin-based layer covering a predetermined area of the base material, and a part of the base material is exposed.
- the cross-sectional shape of the base material is square.
- the length of one side of the square in the cross section is 0.64 mm. This pin terminal is called a 0.64 type.
- the outer peripheral surface of the base material includes a first surface, a second surface, a third surface, and a fourth surface constituting each surface of the square.
- the first surface is a surface on which a punch is pressed during punching, a so-called sagging surface.
- the second surface is the surface facing the first surface, which is the so-called burr surface.
- the third and fourth surfaces are surfaces that face each other and are orthogonal to the first and second surfaces.
- the third and fourth surfaces are cut surfaces produced by punching.
- the region on one end side of the base material includes a tin-based layer covering all the circumferential directions of the base material, here, the first surface to the fourth surface.
- the base material is not exposed on one end side of the base material.
- the region on the other end side of the base material includes a tin-based layer covering a part of the base material in the circumferential direction, here, the first surface and the second surface.
- the other part in the circumferential direction of the base material, here, the third surface and the fourth surface is exposed without a plating layer including a tin-based layer.
- Both the tin-based layer on one end side and the tin-based layer on the other end side of the base material include an outer layer made of pure tin and an inner layer made of an alloy containing tin and copper.
- Sample No. 1 to No. 4, No. Reference numeral 50 denotes a 0.64 type pin terminal, which was manufactured by using a plated plate in which the copper alloy plate is a phosphor bronze plate. That is, the sample No. 1 to No. 4, No. Each of the 50 substrates is composed of phosphor bronze having a Zn content of 20% by mass or less in the copper alloy.
- Sample No. As 3-1 except that the copper alloy plate is a brass plate the sample No. A product prepared in the same manner as in No. 3 was prepared. That is, the sample No. The base material of 3-1 is composed of brass having a Zn content of more than 20% in the copper alloy.
- Sample No. No. 1 is not heat-treated after the secondary plating, and a hyphen "-" is described in the table.
- the heat treatment temperature after the secondary plating is different, and is 200 ° C., 210 ° C., 220 ° C., and 240 ° C., respectively.
- the holding time of each heat treatment is 30 seconds.
- Sample No. 101 Sample No. The pin terminal of 101 is a sample provided with a tin-based layer by a so-called post-plating method.
- the pin terminal includes a tin-based layer that covers the entire surface of the base material from one end to the other end of the base material. The base material is not exposed at this pin terminal.
- the pin terminals of 102 are all 0.64 type pin terminals, and were manufactured by using a plated plate in which the copper alloy plate is a brass plate.
- the pin terminal of 102 is a sample provided with a tin-based layer by a so-called pre-plating method.
- the pin terminal includes a tin-based layer covering the first surface and the second surface of the base material from one end to the other end of the base material.
- the third and fourth surfaces of the base material are exposed without a tin-based layer from one end to the other end of the base material.
- a tin-based layer covering the base material at the pin terminals of each sample can be confirmed, for example, by taking the above-mentioned cross section and analyzing the cross section in terms of components.
- component analysis for example, the energy dispersive X-ray spectroscope (SEM-EDX) attached to the scanning electron microscope can be used.
- the length of the solder icicles was measured by observing the area on one end side of the pin terminal of each sample with a commercially available microscope and using this observation image.
- the solder icicles are the distance from one end of the pin terminal to the tip of the solder icicles. It can be said that the shorter the length of the solder icicles, the better the soldering.
- a tin-based layer exists over the entire circumference of the base material in the circumferential direction as described above.
- a point 1 mm from one end of the pin terminal along the longitudinal direction of the pin terminal is defined as a measurement point for the thickness of the tin-based layer.
- Measurement points are set for each of the first to fourth surfaces of the base material. The measurement points on each surface should be opposite to each other. Specifically, the first surface and the second surface have measurement points at the center position in the width direction of each surface and its vicinity. The third and fourth surfaces have measurement points at the center position in the height direction of each surface and its vicinity.
- the thickness of the tin-based layer was measured here using a commercially available fluorescent X-ray film thickness meter.
- the thickness of the inner layer, which is the alloy layer, and the thickness of the outer layer, which is the pure tin layer were measured at each of the above-mentioned measurement points by using the component analysis by the fluorescent X-ray film thickness meter.
- the thickness of the tin-based layer is the total thickness of the inner layer and the outer layer.
- the thickness of the tin-based layer may be measured by taking a cross section of the pin terminal and using an image obtained by observing this cross section with an SEM or the like.
- the thickness of the tin-based layer was measured even at a position away from one end of the pin terminal. Specifically, in the tin-based layer existing on one end side of the above-mentioned base material, the thickness of the tin-based layer is measured at 3 mm points and 5 mm points along the longitudinal direction of the pin terminals from one end of the pin terminals. It is a place. At each measurement point, the above-mentioned measurement points are taken for each of the four surfaces of the base material. The thickness of the tin-based layer was measured at each measurement point.
- the number of samples of each sample was set to 3, and the thickness of the tin-based layer was measured for each sample. Furthermore, the sample No. 1 to No. 4, No. At 50, the thickness of the inner layer and the thickness of the outer layer were measured for each of the three samples. Table 1 shows the average values of the three samples for each of the tin layer thickness, the inner layer thickness, and the outer layer thickness.
- Tables 2 and 3 show the maximum value t 1 ( ⁇ m) and the minimum value t 2 ( ⁇ m) of the thickness of the tin-based layer at the above-mentioned point 1 mm from the tip.
- Tables 2 and 3 show the difference between the maximum value t 1 and the minimum value t 2 (t 1- t 2 ) ( ⁇ m) and the ratio of the minimum value t 2 to the maximum value t 1 (t 2 / t 1). Shown.
- the minimum thickness of the inner layer among the tin-based layers covering the third and fourth surfaces of the base material is set to the thickness t 31 ( ⁇ m) at a point 1 mm from the tip, and the thickness of the outer layer is set to t 31 ( ⁇ m).
- the minimum value of tin is shown in Tables 2 and 3 as the thickness t 32 ( ⁇ m).
- sample No. 1 to No. 4, No. For 50 the difference in the longitudinal thickness of the base material in the tin-based layer was examined. Specifically, in the tin-based layer existing in the region on one end side of the base material, the above-mentioned 1 mm point, 3 mm point, and 5 mm point from one end are set as measurement points for the thickness of the tin-based layer, and each measurement point. In, a measurement point is taken as described above. The difference between the maximum thickness and the minimum thickness is taken for the thickness of the tin-based layer measured at three measurement points on each surface of the base material, for example, the first surface. Of the total of four differences obtained for each surface of the base material, the maximum value is shown in the item "One end side, thickness difference in the longitudinal direction" in Table 2.
- the maximum wetting force is measured using a commercially available meniscograph tester.
- the test is carried out according to the test procedure of JIS C 60068-2-54: 2009 as described in JIS C 5402-12-7: 2005.
- the test conditions are set as follows with reference to JIS C 60068-2-54: 2009.
- the solder used for the test is a lead-free solder alloy.
- rosin flux which is a low activity flux, is used.
- This rosin flux is an IPA solution in which 25% rosin by mass fraction is dissolved in 75% isopropyl alcohol (IPA) by mass fraction.
- the immersion temperature is 245 ° C ⁇ 10 ° C.
- the immersion speed is 4 mm / sec ⁇ 2 mm / sec.
- the immersion depth is 1.5 mm ⁇ 0.5 mm.
- the time from applying the flux to immersing it in the solder is constant.
- the number of tin protrusions is measured under the following conditions.
- the pin terminals of each sample are held in the following hot and humid environment for a predetermined time to prepare a test piece.
- the environmental conditions are a temperature of 85 ° C. and a humidity of 85%.
- the holding time is 60 hours.
- the surface of the tin-based layer existing in the region on one end side of the base material is observed with a commercially available three-dimensional laser microscope.
- the observation region on the surface of the tin-based layer is a portion of the tin-based layer that covers the third or fourth surface of the base material, and is 0. Select from the range from the 5 mm point to the 1.5 mm point.
- the observation field of view is a square having a side length of 0.35 mm.
- the observation magnification is adjusted so that nodules on the order of several ⁇ m can be measured.
- the length of the solder icicles of 3-1 is 0.77 mm.
- the length of the solder icicles of Sample No. 3 whose base material is phosphor bronze is 0.17 mm, and Sample No. 3 has a length of 0.17 mm. Shorter than 3-1.
- the base material of No. 3 has a Zn content of 20% by mass or less, here 0.05% by mass or more and 0.20% by mass or less, which is less than brass having a Zn content of more than 28% by mass. Be done.
- Sample No. In No. 3 it is considered that the formation of solder icicles was suppressed due to the low Zn content.
- the thickness of the tin-based layer will be described. As shown in Tables 2 and 3, the sample No. 1 to No. 4, No. In all of 50, the difference (t 1- t 2 ) was 0.20 ⁇ m or more, and the sample No. 50 prepared by the post-plating method. It can be seen that it has a larger difference (t 1- t 2) than 101. In addition, sample No. 1 to No. 4, No. At 50, the thickness of the tin-based layer existing on the first or second surface of the base material has a maximum value t 1 , and the thickness of the tin-based layer existing on the third or fourth surface of the base material. It can be seen that stakes the minimum value t 2. That is, the sample No. 1 to No. 4, No. It can be said that the pin terminal of 50 has a thin film portion having a minimum value t 2 and a thick film portion having a maximum value t 1 at different positions in the circumferential direction of the base material in the region on one end side of the base material.
- the sample No. 1 to No. 4, No. At 50 the ratio (t 2 / t 1 ) was 0.2 or more and less than 0.8, and the sample No. It can be seen that the ratio (t 2 / t 1) is smaller than that of 101. That is, the sample No. 1 to No. 4, No. At 50, it can be said that the difference between the maximum value t 1 and the minimum value t 2 of the tin-based layer is large to some extent in the region on one end side of the pin terminal.
- the sample No. 1 to No. 4, No. In No. 50 in the region on one end side of the base material, there is a tin-based layer that covers all of the circumferential direction of the base material, and the thickness of the tin-based layer is different in the circumferential direction of the base material. It can be said that the difference is large to some extent.
- FIG. 8A shows the sample No. It is an SEM image which observed the cross section by SEM about one of the samples among the pin terminals of 3.
- the cross section is obtained by cutting a point 3 mm along the longitudinal direction of the pin terminal from one end of the pin terminal in a plane parallel to the axis of the base material in the region on one end side of the base material.
- FIGS. 8B-8E show an enlarged area surrounded by a white dashed rectangle in FIG. 8A.
- 8B to 8E show tin-based layers covering the first surface, the second surface, the third surface, and the fourth surface of the base material in this order.
- the dark gray region is the base material 2
- the black region is the embedded resin.
- the gray region existing between the base material 2 and the embedded resin is the tin-based layer 30.
- the region of the tin-based layer 30 on the side closer to the base material 2 is the inner layer 301 made of an alloy containing tin and copper.
- the light gray region in contact with the inner layer 301 is the outer layer 302 made of pure tin. Only FIG. 8B is shown with a reference numeral.
- the thickness of the tin-based layer covering the first and second surfaces of the base material, the thickness of the inner layer, and the thickness of the outer layer are all tin-based covering the third and fourth surfaces of the base material. It can be seen that it is thicker than the thickness of the layer, the thickness of the inner layer, and the thickness of the outer layer.
- the matter concerning this difference in thickness is the same when the cutting position is set to a point 1 mm along the longitudinal direction of the pin terminal from one end of the pin terminal.
- the matter concerning this difference in thickness the sample No. 1, No. 2, No. The same applies to 4.
- the maximum wetting force is 0.25 mN or more, and it can be seen that the solder wetting property is excellent.
- Sample No. 1 to No. 4 One of the reasons why the maximum wetting force of 4 is high is that it has a tin-based layer that covers the entire circumferential direction of the base material in the region on one end side of the base material.
- this tin-based layer contains an outer layer made of pure tin, and the thickness of the outer layer is appropriate.
- the thickness t 32 of the outer layer provided in the thin film portion is 0.5 ⁇ m or more, and here 1.0 ⁇ m or more.
- the thickness of the outer layer provided in the thick film portion is thicker than the thickness t 32 of the outer layer of the thin film portion. That is, it can be said that in the region on one end side of the base material, a pure tin layer having excellent solder wettability is appropriately present over the entire circumference in the circumferential direction of the base material.
- sample No. The maximum wetting force of 50 is less than 0.25 mN. Sample No. One of the reasons why the maximum wetting force of 50 is low is that the sample No.
- the heat treatment temperature of 50 is the sample No. 2-No. It is considered that the temperature is higher than the heat treatment temperature of 4.
- sample No. 102 cannot measure the maximum wetting force and is inferior in solder wettability.
- the sample No. In 102 it is considered that a part of the base material, here, the third surface and the fourth surface of the base material are exposed in the region on one end side of the base material.
- the tin-based layer is provided in contact with the third and fourth surfaces, which are the exposed regions of the base material, but includes the following inner layers.
- the inner layer is made of an alloy containing tin and copper and has an appropriate thickness.
- the thickness t 31 of the inner layer in the thin film portion provided in contact with the third and fourth surfaces of the base material is 0.1 ⁇ m or more.
- the thickness of the inner layer provided in the thick film portion is thicker than the thickness t 31 of the inner layer of the thin film portion.
- sample No. In 1 the number of nodules in 0.35 mm ⁇ 0.35 mm is more than 15.
- sample No. In No. 1 the thickness t 31 of the inner layer of the thin film portion is less than 0.1 ⁇ m.
- Sample No. In No. 1 it is considered that the number of nodules increased because the thickness t 31 of the inner layer was thin.
- the sample No. It is considered that No. 1 is not heat-treated after the secondary plating.
- the maximum value of the above difference is 1 ⁇ m or less. In the region on one end side of the base material, it can be said that the difference in the thickness of the tin-based layer in the longitudinal direction of the base material is small.
- sample No. At 50 the maximum value of the above difference is as large as more than 3 ⁇ m.
- the heat treatment temperature of 50 is the sample No. 2-No. It is considered that the temperature is higher than the heat treatment temperature of 4, and particularly higher than the melting point of tin. It is considered that the heat treatment temperature was higher than the melting point of tin, so that the secondary plating layer was melted during the heat treatment and the thickness of the tin-based layer became non-uniform after the heat treatment.
- sample No. 1 to No. 4 No.
- the thickness of the tin-based layer existing on the first surface and the second surface of the base material was examined for the region on the other end side of the base material that was not subjected to the secondary plating.
- the maximum value of the difference between the maximum thickness and the minimum thickness was examined in the same manner as in the case of evaluating the thickness difference in the longitudinal direction described above.
- the sample No. 1 to No. In No. 4 the maximum value of the above difference is less than 0.2 ⁇ m, and it can be said that the tin-based layer has a uniform thickness in the longitudinal direction of the base material.
- the maximum value of 50 is 0.2 ⁇ m or more, and it can be said that the tin-based layer has an enlarged portion.
- the heat treatment temperature of 50 is the sample No. 2-No. It is higher than the heat treatment temperature of No. 4, and particularly higher than the melting point of tin. It is considered that when the heat treatment temperature was higher than the melting point of tin, the primary plating layer covering the first surface and the second surface was melted during the heat treatment, and the thickness of the tin-based layer became non-uniform after the heat treatment.
- the constituent material of the base material is a copper alloy and the Zn content is 20% by mass or less, the solder icicles are short and soldering defects are reduced.
- a tin-based layer covering the entire circumference of the base material in the circumferential direction is provided in the region on one end side of the base material, and pin terminals having different thicknesses of the tin-based layer in the circumferential direction of the base material, particularly the tin-based layer.
- the thickness t 32 of the pure tin layer in the thin film portion provided in the above was 0.5 ⁇ m or more, the solder wettability was excellent.
- the thickness t 31 of the alloy layer in the thin film portion was 0.1 ⁇ m or more, not only the whiskers but also the number of nodules was small.
- the solder wettability and the number of tin protrusions will be described in more detail in Test Example 2 described later.
- the sample No. shown in Table 3 51 and No. 52 will be described in Test Example 2.
- the above-mentioned pin terminal having excellent solder wettability is provided with a tin-based layer having a uniform thickness in the longitudinal direction of the base material in the region on the other end side of the base material.
- Such a pin terminal can be said to be excellent in insertability because the region on the other end side can be easily inserted into the mating terminal.
- the pin terminals having excellent solder wettability and also having excellent insertability into the mating terminal, and the pin terminals having a small number of whiskers use the above-mentioned multi-stage plating method, in particular, two. It was shown that it is produced by setting the heat treatment temperature after the next plating to be equal to or lower than the melting point of tin. The heat treatment temperature will be described in more detail in Test Example 2 described later.
- the measurement points for the thickness of the tin-based layer are taken as follows.
- the measurement point is the center position in the width direction and its vicinity with respect to any one surface of the base material at a point 1 mm from the tip described above. The position facing this measurement point is also used as the measurement point.
- the points facing each other in the direction orthogonal to the straight line connecting the two measurement points are also set as the measurement points.
- the measurement points are a point facing an arbitrary diametrical direction and a point facing the diametrical direction deviated by 90 ° from the diametrical direction at a point 1 mm from the tip described above.
- Sample No. 51, No. 52 is the sample No. With respect to No. 3, except that the heat treatment temperature after the secondary plating was changed to 150 ° C. or 180 ° C., the sample No. It was produced in the same manner as in 3.
- Sample No. 51, No. Table 3 shows the heat treatment temperature (° C.) after the secondary plating, the maximum wetting force (mN), and the number of tin protrusions (pieces / (0.35 mm ⁇ 0.35 mm)) for 52.
- sample No. With respect to 51 the maximum value t 1 ( ⁇ m) and the minimum value t 2 ( ⁇ m) of the tin-based layer existing in the region on one end side of the base material, and the thin film portions existing on the third and fourth surfaces of the base material.
- Table 3 shows the thickness t 31 ( ⁇ m) of the inner layer and the thickness t 32 ( ⁇ m) of the outer layer.
- FIG. 9 is a graph showing the relationship between the heat treatment temperature after secondary plating, the maximum wetting force, and the number of tin protrusions.
- the horizontal axis represents the heat treatment temperature (° C.).
- the left vertical axis shows the maximum wetting force (mN), and the legend is a circle.
- the right vertical axis shows the number of tin protrusions (pieces / (0.35 mm ⁇ 0.35 mm)), and the legend is a diamond mark.
- FIG. 10 is a graph showing the relationship between the thickness t 32 of the outer layer of each sample and the maximum wetting force.
- the horizontal axis represents the thickness of the outer layer t 32 ( ⁇ m).
- the vertical axis indicates the maximum wetting force (mN).
- FIG. 11 is a graph showing the relationship between the thickness t 31 of the inner layer of each sample and the number of tin protrusions.
- the horizontal axis represents the inner layer thickness t 31 ( ⁇ m).
- the vertical axis shows the number of tin protrusions (pieces / (0.35 mm ⁇ 0.35 mm)).
- FIGS. 12A to 12D show the sample numbers in order. 1, No. 2, No. 4, It is a microscope observation image used for measuring the number of tin protrusions in the pin terminal of No. 50.
- the microscopic observation images of FIGS. 12A to 12D are all images observed by the above-mentioned three-dimensional laser microscope, and show a square observation field of view having a side length of 0.35 mm.
- the maximum wetting force is substantially constant in the range of the heat treatment temperature up to 210 ° C., decreases as the heat treatment temperature rises, and extremely decreases when the heat treatment temperature is 240 ° C.
- the thicker the thickness t 32 of the outer layer made of pure tin the thicker the thin film portion provided in contact with the base material.
- the maximum wetting power tends to be high.
- the thickness t 32 of the outer layer is 1.0 ⁇ m or more, the maximum wetting force is 0.3 mN or more, and there are many samples of 0.4 mN or more. If the thickness t 32 of the outer layer is 0.5 ⁇ m or more, a maximum wetting force of 0.25 mN or more can be expected.
- the heat treatment temperature is preferably less than 240 ° C.
- the heat treatment temperature is preferably less than the melting point of tin (about 232 ° C.) from the tendency of the graph shown in FIG.
- the heat treatment temperature is more preferably 220 ° C. or lower.
- the number of tin protrusions shown in FIGS. 9 and 11 is the number of nodules.
- the number of nodules described below is a number existing in a field of view of 0.35 mm ⁇ 0.35 mm.
- the number of tin protrusions is large without heat treatment and decreases as the heat treatment temperature rises.
- FIG. 12A the sample No. which has not been heat-treated.
- the whiskers which are the above-mentioned needle-shaped protrusions, do not exist, the number of spherical nodules is large and exceeds 30.
- the white dashed circle attached to FIG. 12A surrounds a part of the nodules among the plurality of nodules. It should be noted that even if the number of nodules is as large as 30 or more, short circuits between pin terminals due to nodules are unlikely to occur. However, if there are too many nodules, there is a concern that they will grow into whiskers, which are needle-shaped protrusions. Therefore, the number of nodules alone is preferably 40 or less as in this example.
- the heat treatment temperature exceeds 180 ° C., especially when the temperature is 200 ° C. or higher, the number of nodules is 15 or less, and here, 10 or less.
- the granular portion at the center of the plurality of circular regions is a nodule.
- the heat treatment temperature exceeds 200 ° C., the number of nodules is 0, and whiskers and nodules are substantially absent.
- the above-mentioned circular region is not observed.
- the thickness of the inner layer made of an alloy containing tin and copper in the thin film portion provided in contact with the base material.
- the thicker t 31, the smaller the number of nodules.
- the thickness t 31 of the inner layer is 0.1 ⁇ m or more, the number of nodules is 30 or less. If the thickness t 31 of the inner layer is 0.2 ⁇ m or more, the number of nodules is 20 or less. Further, if the thickness t 31 of the inner layer is more than 0.2 ⁇ m, the number of nodules is 15 or less, and here, 10 or less.
- the heat treatment temperature is preferably more than 180 ° C. and more preferably 200 ° C. or higher.
- the composition of the base material of Test Examples 1 and 2 the size of the base material, the composition and thickness of the plating layer, the heat treatment conditions, and the like can be appropriately changed.
- a plate containing a base layer between the tin-based layer and the copper alloy plate can be mentioned.
- the region on one end side of the base material includes a base layer under the thick film portion of the tip coating portion.
- the region on the other end side of the base material includes a base layer under the rear end covering portion which is a tin-based layer.
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Abstract
This pin terminal comprises a stick-shaped substrate and a plated layer that covers a prescribed area of the substrate, wherein: the plated layer comprises a tin-based layer formed of a metal including tin; one end of the substrate includes a leading end covering part that covers a region of the substrate, the region fully extending in the peripheral direction; the tin-based layer includes the leading end covering part; the leading end covering part includes a thin film section and a thick film section at different locations in the peripheral direction of the substrate; and the material constituting the substrate is pure copper or a copper alloy having a Zn content of not more than 20 mass%.
Description
本開示は、ピン端子、コネクタ、コネクタ付きワイヤーハーネス、及びコントロールユニットに関する。
本出願は、2019年9月19日付の日本国出願の特願2019-170932に基づく優先権を主張し、前記日本国出願に記載された全ての記載内容を援用するものである。 The present disclosure relates to pin terminals, connectors, wire harnesses with connectors, and control units.
This application claims the priority based on Japanese Patent Application No. 2019-170932 of the Japanese application dated September 19, 2019, and incorporates all the contents described in the Japanese application.
本出願は、2019年9月19日付の日本国出願の特願2019-170932に基づく優先権を主張し、前記日本国出願に記載された全ての記載内容を援用するものである。 The present disclosure relates to pin terminals, connectors, wire harnesses with connectors, and control units.
This application claims the priority based on Japanese Patent Application No. 2019-170932 of the Japanese application dated September 19, 2019, and incorporates all the contents described in the Japanese application.
相手側端子と回路基板とを接続する端子として、棒状のピン端子が利用されている。ピン端子は、代表的には、特許文献1の明細書[0002]に記載されるように、銅合金からなる基材と、基材の表面を覆う錫めっき層とを有する。
A rod-shaped pin terminal is used as a terminal for connecting the other side terminal and the circuit board. The pin terminal typically has a base material made of a copper alloy and a tin-plated layer covering the surface of the base material, as described in the specification [0002] of Patent Document 1.
特許文献1は、最外層を構成するめっき層として、Sn母相中にSn-Pd系合金相が存在しており、かつ最外層中のPdの含有率が特定の範囲であるものを開示する。
Patent Document 1 discloses a plating layer constituting the outermost layer in which a Sn—Pd-based alloy phase is present in the Sn matrix and the Pd content in the outermost layer is in a specific range. ..
本開示のピン端子は、
棒状の基材と、前記基材の所定の領域を覆うめっき層とを備えるピン端子であって、
前記めっき層は、錫を含む金属から構成される錫系層を備え、
前記基材の一端側は、前記基材の周方向の全ての領域を覆う先端被覆部を備え、
前記錫系層は、前記先端被覆部を含み、
前記先端被覆部は、前記基材の周方向の異なる位置に薄膜部と厚膜部とを備え、
前記基材の構成材料は、Znの含有量が20質量%以下である銅合金、又は純銅である。 The pin terminals of this disclosure are
A pin terminal including a rod-shaped base material and a plating layer covering a predetermined region of the base material.
The plating layer includes a tin-based layer composed of a metal containing tin.
One end side of the base material is provided with a tip covering portion that covers the entire circumferential region of the base material.
The tin-based layer includes the tip covering portion and contains the tip covering portion.
The tip covering portion includes a thin film portion and a thick film portion at different positions in the circumferential direction of the base material.
The constituent material of the base material is a copper alloy having a Zn content of 20% by mass or less, or pure copper.
棒状の基材と、前記基材の所定の領域を覆うめっき層とを備えるピン端子であって、
前記めっき層は、錫を含む金属から構成される錫系層を備え、
前記基材の一端側は、前記基材の周方向の全ての領域を覆う先端被覆部を備え、
前記錫系層は、前記先端被覆部を含み、
前記先端被覆部は、前記基材の周方向の異なる位置に薄膜部と厚膜部とを備え、
前記基材の構成材料は、Znの含有量が20質量%以下である銅合金、又は純銅である。 The pin terminals of this disclosure are
A pin terminal including a rod-shaped base material and a plating layer covering a predetermined region of the base material.
The plating layer includes a tin-based layer composed of a metal containing tin.
One end side of the base material is provided with a tip covering portion that covers the entire circumferential region of the base material.
The tin-based layer includes the tip covering portion and contains the tip covering portion.
The tip covering portion includes a thin film portion and a thick film portion at different positions in the circumferential direction of the base material.
The constituent material of the base material is a copper alloy having a Zn content of 20% by mass or less, or pure copper.
本開示のコネクタは、
本開示のピン端子を備える。 The connectors of the present disclosure are
The pin terminal of the present disclosure is provided.
本開示のピン端子を備える。 The connectors of the present disclosure are
The pin terminal of the present disclosure is provided.
本開示のコネクタ付きワイヤーハーネスは、
本開示のコネクタと、ワイヤーハーネスとを備え、
前記ワイヤーハーネスは、前記ピン端子の他端側の領域に接続される。 The wire harness with a connector of the present disclosure is
The connector of the present disclosure and the wire harness are provided.
The wire harness is connected to the region on the other end side of the pin terminal.
本開示のコネクタと、ワイヤーハーネスとを備え、
前記ワイヤーハーネスは、前記ピン端子の他端側の領域に接続される。 The wire harness with a connector of the present disclosure is
The connector of the present disclosure and the wire harness are provided.
The wire harness is connected to the region on the other end side of the pin terminal.
本開示のコントロールユニットは、
本開示のコネクタ、又は本開示のコネクタ付きワイヤーハーネスと、回路基板とを備え、
前記回路基板と前記ピン端子の一端側の領域とは、はんだによって接続される。 The control unit of the present disclosure is
The connector of the present disclosure or the wire harness with the connector of the present disclosure and a circuit board are provided.
The circuit board and the region on one end side of the pin terminal are connected by solder.
本開示のコネクタ、又は本開示のコネクタ付きワイヤーハーネスと、回路基板とを備え、
前記回路基板と前記ピン端子の一端側の領域とは、はんだによって接続される。 The control unit of the present disclosure is
The connector of the present disclosure or the wire harness with the connector of the present disclosure and a circuit board are provided.
The circuit board and the region on one end side of the pin terminal are connected by solder.
[本開示が解決しようとする課題]
はんだ付けの不良を防止できるピン端子が望まれている。更に、はんだ濡れ性に優れる上に、相手側端子に接続する際の挿入性にも優れるピン端子が望ましい。 [Issues to be solved by this disclosure]
Pin terminals that can prevent defective soldering are desired. Further, it is desirable to use a pin terminal which is excellent in solder wettability and also has excellent insertability when connecting to the mating terminal.
はんだ付けの不良を防止できるピン端子が望まれている。更に、はんだ濡れ性に優れる上に、相手側端子に接続する際の挿入性にも優れるピン端子が望ましい。 [Issues to be solved by this disclosure]
Pin terminals that can prevent defective soldering are desired. Further, it is desirable to use a pin terminal which is excellent in solder wettability and also has excellent insertability when connecting to the mating terminal.
ピン端子の一端側の領域は、回路基板に接続される領域に利用される。ピン端子の他端側の領域は、相手側端子に接続される領域に利用される。
The area on one end side of the pin terminal is used for the area connected to the circuit board. The area on the other end of the pin terminal is used for the area connected to the other terminal.
ピン端子と回路基板のスルーホールとの接続には、一般にはんだが利用される。従来のピン端子では、はんだを塗布した場合にはんだつららが生じることがある。はんだつららとは、はんだ付けを行った際に、溶融されたはんだが垂れた状態で固まる等して形成される、つらら状にとがった突起物である。多数のピン端子が近接して配置される用途等において、長いはんだつららが生じたピン端子があれば、このピン端子と、このピン端子に隣り合うピン端子との間がはんだつららによって導通すること、即ち短絡することが考えられる。
Solder is generally used to connect the pin terminal and the through hole of the circuit board. With conventional pin terminals, solder icicles may occur when solder is applied. Solder icicles are icicle-shaped protrusions that are formed by the molten solder dripping and solidifying when soldering. In applications where a large number of pin terminals are arranged close to each other, if there is a pin terminal with long solder icicles, the solder icicles conduct conduction between this pin terminal and the pin terminal adjacent to this pin terminal. That is, a short circuit is conceivable.
また、従来、良好なはんだ濡れ性を確保するために、特許文献1に記載されるように、いわゆる後めっき法が利用されている。後めっき法は、板材を打ち抜いたり、板材に塑性加工を施したりして所定の形状の基材を成形した後、基材にめっき層を形成する方法である。後めっき法では、基材の外周面が実質的に全周にわたってめっき層で覆われる。そのため、はんだが塗布されるピン端子の一端側の領域において、はんだは、基材に直接接すること無く、錫めっき層に接する。従って、後めっき法によるピン端子は、はんだ濡れ性に優れる。
Further, conventionally, in order to ensure good solder wettability, a so-called post-plating method is used as described in Patent Document 1. The post-plating method is a method in which a plate material is punched out or plastically processed to form a base material having a predetermined shape, and then a plating layer is formed on the base material. In the post-plating method, the outer peripheral surface of the base material is covered with a plating layer substantially over the entire circumference. Therefore, in the region on one end side of the pin terminal to which the solder is applied, the solder comes into contact with the tin plating layer without directly contacting the base material. Therefore, the pin terminals produced by the post-plating method are excellent in solder wettability.
しかし、後めっき法では、めっき層における基材の端部を覆う箇所が局所的に厚くなること、即ち肥大箇所が形成されることがある。ピン端子の他端側の領域に肥大箇所があれば、ピン端子を相手側端子に挿入して接続する際の摩擦力が大きくなり易い。摩擦力が大きければ、大きな挿入力が必要である。その結果、ピン端子の挿入性が低下し易い。
However, in the post-plating method, the portion of the plating layer that covers the edge of the base material may be locally thickened, that is, an enlarged portion may be formed. If there is an enlarged portion in the region on the other end side of the pin terminal, the frictional force when the pin terminal is inserted into the mating terminal and connected tends to increase. If the frictional force is large, a large insertion force is required. As a result, the insertability of the pin terminal tends to decrease.
コネクタには、多数のピン端子を備えるものがある。ピン端子の数に比例して、コネクタにおける上記挿入力が大きくなる。そのため、上述のように多数のピン端子が近接して配置される用途等では、コネクタの挿入性が更に低下し易い。従って、上記挿入力を低く抑えることが望まれる。
Some connectors have a large number of pin terminals. The insertion force at the connector increases in proportion to the number of pin terminals. Therefore, in applications such as those in which a large number of pin terminals are arranged close to each other as described above, the insertability of the connector tends to be further lowered. Therefore, it is desired to keep the insertion force low.
特許文献1は、上述の特定の最外層を備えることで、上記挿入力を低くできる上に、良好なはんだ濡れ性を確保できるとする。しかし、後めっき法によって上記最外層が形成されれば、上述の肥大箇所が生じ得る。従って、上記挿入力を低くすることに対して、改善の余地がある。また、製造過程では、Pdめっき層を形成する必要がある。そのため、製造性の点でも、改善の余地がある。
Patent Document 1 states that by providing the above-mentioned specific outermost layer, the above-mentioned insertion force can be lowered and good solder wettability can be ensured. However, if the outermost layer is formed by the post-plating method, the above-mentioned enlarged portion may occur. Therefore, there is room for improvement in reducing the insertion force. Further, in the manufacturing process, it is necessary to form a Pd plating layer. Therefore, there is room for improvement in terms of manufacturability.
そこで、本開示は、はんだ付けの不良を防止できるピン端子を提供することを目的の一つとする。また、本開示は、はんだ付けの不良を防止できるコネクタ、コネクタ付きワイヤーハーネス、コントロールユニットを提供することを他の目的とする。
Therefore, one of the purposes of this disclosure is to provide a pin terminal capable of preventing soldering defects. Another object of the present disclosure is to provide a connector, a wire harness with a connector, and a control unit capable of preventing soldering defects.
[本開示の効果]
本開示のピン端子、本開示のコネクタ、本開示のコネクタ付きワイヤーハーネス、及び本開示のコントロールユニットは、はんだ付けの不良を防止できる。 [Effect of the present disclosure]
The pin terminals of the present disclosure, the connectors of the present disclosure, the wire harness with the connector of the present disclosure, and the control unit of the present disclosure can prevent soldering defects.
本開示のピン端子、本開示のコネクタ、本開示のコネクタ付きワイヤーハーネス、及び本開示のコントロールユニットは、はんだ付けの不良を防止できる。 [Effect of the present disclosure]
The pin terminals of the present disclosure, the connectors of the present disclosure, the wire harness with the connector of the present disclosure, and the control unit of the present disclosure can prevent soldering defects.
[本開示の実施形態の説明]
最初に本開示の実施形態の内容を列記して説明する。
(1)本開示の一態様に係るピン端子は、
棒状の基材と、前記基材の所定の領域を覆うめっき層とを備えるピン端子であって、
前記めっき層は、錫を含む金属から構成される錫系層を備え、
前記基材の一端側は、前記基材の周方向の全ての領域を覆う先端被覆部を備え、
前記錫系層は、前記先端被覆部を含み、
前記先端被覆部は、前記基材の周方向の異なる位置に薄膜部と厚膜部とを備え、
前記基材の構成材料は、Znの含有量が20質量%以下である銅合金、又は純銅である。 [Explanation of Embodiments of the present disclosure]
First, the contents of the embodiments of the present disclosure will be listed and described.
(1) The pin terminal according to one aspect of the present disclosure is
A pin terminal including a rod-shaped base material and a plating layer covering a predetermined region of the base material.
The plating layer includes a tin-based layer composed of a metal containing tin.
One end side of the base material is provided with a tip covering portion that covers the entire circumferential region of the base material.
The tin-based layer includes the tip covering portion and contains the tip covering portion.
The tip covering portion includes a thin film portion and a thick film portion at different positions in the circumferential direction of the base material.
The constituent material of the base material is a copper alloy having a Zn content of 20% by mass or less, or pure copper.
最初に本開示の実施形態の内容を列記して説明する。
(1)本開示の一態様に係るピン端子は、
棒状の基材と、前記基材の所定の領域を覆うめっき層とを備えるピン端子であって、
前記めっき層は、錫を含む金属から構成される錫系層を備え、
前記基材の一端側は、前記基材の周方向の全ての領域を覆う先端被覆部を備え、
前記錫系層は、前記先端被覆部を含み、
前記先端被覆部は、前記基材の周方向の異なる位置に薄膜部と厚膜部とを備え、
前記基材の構成材料は、Znの含有量が20質量%以下である銅合金、又は純銅である。 [Explanation of Embodiments of the present disclosure]
First, the contents of the embodiments of the present disclosure will be listed and described.
(1) The pin terminal according to one aspect of the present disclosure is
A pin terminal including a rod-shaped base material and a plating layer covering a predetermined region of the base material.
The plating layer includes a tin-based layer composed of a metal containing tin.
One end side of the base material is provided with a tip covering portion that covers the entire circumferential region of the base material.
The tin-based layer includes the tip covering portion and contains the tip covering portion.
The tip covering portion includes a thin film portion and a thick film portion at different positions in the circumferential direction of the base material.
The constituent material of the base material is a copper alloy having a Zn content of 20% by mass or less, or pure copper.
本開示のピン端子では、先端被覆部にはんだを塗布した場合に、はんだ付け不良、特にはんだつららが生じ難い。この理由は、基材中のZnの含有量が少ないからである。このような本開示のピン端子は、多数のピン端子が近接して配置される用途、例えば各種のコントロールユニットの回路基板に接続される用途等において、隣り合うピン端子間がはんだつららによって短絡することを防止できる。従って、本開示のピン端子は、多数のピン端子を備えるコネクタ等に好適である。
With the pin terminals of the present disclosure, when solder is applied to the tip coating, soldering defects, especially solder icicles, are unlikely to occur. The reason for this is that the Zn content in the base material is low. In such a pin terminal of the present disclosure, in an application in which a large number of pin terminals are arranged close to each other, for example, in an application connected to a circuit board of various control units, adjacent pin terminals are short-circuited by solder icicles. Can be prevented. Therefore, the pin terminals of the present disclosure are suitable for connectors and the like having a large number of pin terminals.
また、本開示のピン端子は、基材の一端側において、はんだ濡れ性に優れる。この理由は、基材の一端側の表面を全周にわたって覆う先端被覆部をはんだとの接合領域に利用できるからである。
Further, the pin terminal of the present disclosure has excellent solder wettability on one end side of the base material. The reason for this is that the tip covering portion that covers the surface on one end side of the base material over the entire circumference can be used for the bonding region with the solder.
更に、本開示のピン端子は、基材の他端側において、相手側端子への挿入性に優れる。この理由の一つとして、以下のことが挙げられる。基材の一端側に、薄膜部と厚膜部という異なる厚さを有する先端被覆部を備えるピン端子は、基材の他端側に上述の肥大箇所を有さない。このようなピン端子では、基材の他端側の領域を相手側端子に接続する際の挿入力が小さい。
Further, the pin terminal of the present disclosure is excellent in insertability into the mating terminal on the other end side of the base material. One of the reasons for this is as follows. A pin terminal provided with a tip covering portion having different thicknesses of a thin film portion and a thick film portion on one end side of the base material does not have the above-mentioned enlarged portion on the other end side of the base material. With such a pin terminal, the insertion force when connecting the region on the other end side of the base material to the mating terminal is small.
このような本開示のピン端子は、以下の製造方法によって製造することが挙げられる。この製造方法は、上述の後めっき法ではなく、いわゆる先めっき法とめっきの形成領域を部分的とする後めっき法とを複合的に利用すると共に、後めっき後に特定の熱処理を行う。以下、この製造方法を多段めっき製法と呼ぶことがある。多段めっき製法の詳細は、後述する。先めっき法は、基材の素材となる板に錫系層を形成した後、錫系層付きの板を打ち抜く等して、所定の形状を有する基材を成形する方法である。部分的な後めっき後に特定の熱処理を行うことで、先めっき法によって形成された錫系層、特に純錫から構成される層の溶融が防止される。その結果、上記肥大箇所の発生が防止される。
Such a pin terminal of the present disclosure may be manufactured by the following manufacturing method. This manufacturing method uses not the above-mentioned post-plating method but a so-called pre-plating method and a post-plating method in which a plating formation region is partially used in combination, and a specific heat treatment is performed after the post-plating. Hereinafter, this manufacturing method may be referred to as a multi-stage plating manufacturing method. Details of the multi-stage plating method will be described later. The pre-plating method is a method of forming a base material having a predetermined shape by forming a tin-based layer on a plate as a material of the base material and then punching a plate with the tin-based layer. By performing a specific heat treatment after the partial post-plating, the tin-based layer formed by the pre-plating method, particularly the layer composed of pure tin, is prevented from melting. As a result, the occurrence of the enlarged portion is prevented.
また、多段めっき製法によれば、特定の熱処理によって、錫系層の表面にウィスカが生じることも低減される。このような本開示のピン端子は、多数のピン端子が近接して配置される用途等において、隣り合うピン端子間がウィスカによって短絡することを防止できる。
In addition, according to the multi-stage plating method, it is possible to reduce the occurrence of whiskers on the surface of the tin-based layer due to a specific heat treatment. Such pin terminals of the present disclosure can prevent short circuits between adjacent pin terminals due to whiskers in applications where a large number of pin terminals are arranged close to each other.
加えて、本開示のピン端子は、製造性にも優れる。この理由の一つとして、Pdめっき層の形成が不要であることが挙げられる。
In addition, the pin terminals of the present disclosure are also excellent in manufacturability. One of the reasons for this is that it is not necessary to form a Pd plating layer.
(2)本開示のピン端子の一例として、
前記先端被覆部は、外層と内層とを備え、
前記外層の構成材料は、純錫であり、
前記内層の構成材料は、錫と銅とを含む合金である形態が挙げられる。 (2) As an example of the pin terminals of the present disclosure,
The tip covering portion includes an outer layer and an inner layer, and has an outer layer and an inner layer.
The constituent material of the outer layer is pure tin.
Examples of the constituent material of the inner layer include a form of an alloy containing tin and copper.
前記先端被覆部は、外層と内層とを備え、
前記外層の構成材料は、純錫であり、
前記内層の構成材料は、錫と銅とを含む合金である形態が挙げられる。 (2) As an example of the pin terminals of the present disclosure,
The tip covering portion includes an outer layer and an inner layer, and has an outer layer and an inner layer.
The constituent material of the outer layer is pure tin.
Examples of the constituent material of the inner layer include a form of an alloy containing tin and copper.
上記形態は、外層によってはんだ濡れ性に優れると共に、内層によってウィスカの発生を低減できる。
In the above form, the outer layer is excellent in solder wettability, and the inner layer can reduce the generation of whiskers.
(3)上記(2)のピン端子の一例として、
前記ピン端子の一端から前記ピン端子の長手方向に沿って1mmの地点を測定箇所とし、前記測定箇所で測定された前記先端被覆部の厚さの最大値t1と最小値t2との差(t1-t2)が0.20μm以上である形態が挙げられる。 (3) As an example of the pin terminal of (2) above,
Apoint 1 mm from one end of the pin terminal along the longitudinal direction of the pin terminal is set as a measurement point, and the difference between the maximum value t 1 and the minimum value t 2 of the thickness of the tip covering portion measured at the measurement point. Examples thereof include a form in which (t 1 − t 2) is 0.20 μm or more.
前記ピン端子の一端から前記ピン端子の長手方向に沿って1mmの地点を測定箇所とし、前記測定箇所で測定された前記先端被覆部の厚さの最大値t1と最小値t2との差(t1-t2)が0.20μm以上である形態が挙げられる。 (3) As an example of the pin terminal of (2) above,
A
上記形態は、多段めっき製法によって製造できる。この場合、薄膜部のウィスカの数が少なくなり易い。また、この場合、上述のように肥大箇所の発生が防止されるため、上記形態は相手側端子への挿入性に優れる。更に、この場合、先めっき法によって形成される錫系層の厚さは、概ね、差(t1-t2)に相当する。つまり、基材の他端側の領域は、基材の周方向の一部に厚さが0.20μm以上の錫系層を備える。このような本開示のピン端子は、相手側端子との接続抵抗も低減できる。
The above form can be manufactured by a multi-stage plating method. In this case, the number of whiskers in the thin film portion tends to decrease. Further, in this case, since the occurrence of the enlarged portion is prevented as described above, the above-mentioned form is excellent in insertability into the mating terminal. Further, in this case, the thickness of the tin-based layer formed by the pre-plating method generally corresponds to the difference (t 1- t 2). That is, the region on the other end side of the base material includes a tin-based layer having a thickness of 0.20 μm or more in a part of the base material in the circumferential direction. Such a pin terminal of the present disclosure can also reduce the connection resistance with the terminal on the other side.
(4)上記(2)又は(3)のピン端子の一例として、
前記ピン端子の一端から前記ピン端子の長手方向に沿って1mmの地点を測定箇所とし、前記測定箇所で測定された前記先端被覆部の厚さの最大値t1と最小値t2との比t2/t1が0.2以上0.8未満である形態が挙げられる。 (4) As an example of the pin terminal of (2) or (3) above,
Apoint 1 mm from one end of the pin terminal along the longitudinal direction of the pin terminal is set as a measurement point, and the ratio of the maximum value t 1 and the minimum value t 2 of the thickness of the tip coating portion measured at the measurement point. Examples thereof include a form in which t 2 / t 1 is 0.2 or more and less than 0.8.
前記ピン端子の一端から前記ピン端子の長手方向に沿って1mmの地点を測定箇所とし、前記測定箇所で測定された前記先端被覆部の厚さの最大値t1と最小値t2との比t2/t1が0.2以上0.8未満である形態が挙げられる。 (4) As an example of the pin terminal of (2) or (3) above,
A
上記形態は、多段めっき製法によって製造できる。この場合、薄膜部のウィスカの数が少なくなり易い。また、この場合、上述のように肥大箇所の発生が防止されるため、上記形態は相手側端子への挿入性に優れる。
The above form can be manufactured by a multi-stage plating method. In this case, the number of whiskers in the thin film portion tends to decrease. Further, in this case, since the occurrence of the enlarged portion is prevented as described above, the above-mentioned form is excellent in insertability into the mating terminal.
(5)上記(3)又は(4)のピン端子の一例として、
前記薄膜部は、前記基材に接して設けられると共に、前記最小値t2を有し、
前記厚膜部は、前記最大値t1を有する形態が挙げられる。 (5) As an example of the pin terminal of (3) or (4) above,
The thin film portion is provided in contact with the base material and has the minimum value t 2 .
Examples of the thick film portion include a form having the maximum value t 1.
前記薄膜部は、前記基材に接して設けられると共に、前記最小値t2を有し、
前記厚膜部は、前記最大値t1を有する形態が挙げられる。 (5) As an example of the pin terminal of (3) or (4) above,
The thin film portion is provided in contact with the base material and has the minimum value t 2 .
Examples of the thick film portion include a form having the maximum value t 1.
上記形態は、はんだ濡れ性に優れると共に、厚膜部ではウィスカの発生をより低減し易い。
The above form is excellent in solder wettability, and it is easier to reduce the occurrence of whiskers in the thick film portion.
(6)上記(3)から(5)のいずれか一つのピン端子の一例として、
前記基材において前記先端被覆部を備える箇所をその軸に直交する平面で切断した断面において、
前記基材の形状は、長方形状であり、
前記基材の外周面は、互いに向かい合って配置される第一面及び第二面と、互いに向かい合って配置される第三面及び第四面とを備え、
前記先端被覆部における前記第一面及び前記第二面の少なくとも一方を覆う箇所は、前記最大値t1を有し、
前記先端被覆部における前記第三面及び前記第四面の少なくとも一方を覆う箇所は、前記最小値t2を有する形態が挙げられる。 (6) As an example of any one of the pin terminals (3) to (5) above,
In the cross section of the base material, in which the portion provided with the tip covering portion is cut in a plane orthogonal to the axis thereof.
The shape of the base material is rectangular and
The outer peripheral surfaces of the base material include a first surface and a second surface arranged to face each other, and a third surface and a fourth surface arranged to face each other.
The portion of the tip covering portion that covers at least one of the first surface and the second surface has the maximum value t 1 .
A portion of the tip covering portion that covers at least one of the third surface and the fourth surface may have a form having the minimum value t 2.
前記基材において前記先端被覆部を備える箇所をその軸に直交する平面で切断した断面において、
前記基材の形状は、長方形状であり、
前記基材の外周面は、互いに向かい合って配置される第一面及び第二面と、互いに向かい合って配置される第三面及び第四面とを備え、
前記先端被覆部における前記第一面及び前記第二面の少なくとも一方を覆う箇所は、前記最大値t1を有し、
前記先端被覆部における前記第三面及び前記第四面の少なくとも一方を覆う箇所は、前記最小値t2を有する形態が挙げられる。 (6) As an example of any one of the pin terminals (3) to (5) above,
In the cross section of the base material, in which the portion provided with the tip covering portion is cut in a plane orthogonal to the axis thereof.
The shape of the base material is rectangular and
The outer peripheral surfaces of the base material include a first surface and a second surface arranged to face each other, and a third surface and a fourth surface arranged to face each other.
The portion of the tip covering portion that covers at least one of the first surface and the second surface has the maximum value t 1 .
A portion of the tip covering portion that covers at least one of the third surface and the fourth surface may have a form having the minimum value t 2.
上記形態は、多段めっき製法によって製造できるため、製造性に優れる。代表的には、第一面及び第二面は、先めっき法によるめっき層が形成される面である。第三面及び第四面は、打ち抜きによる切断面である。
The above form can be manufactured by the multi-stage plating method, so it is excellent in manufacturability. Typically, the first surface and the second surface are surfaces on which a plating layer is formed by a pre-plating method. The third and fourth surfaces are cut surfaces by punching.
(7)上記(6)のピン端子の一例として、
前記めっき層は、前記先端被覆部における前記第一面及び前記第二面を覆う箇所と前記基材との間に下地層を備え、
前記先端被覆部における前記第三面及び前記第四面を覆う箇所は、前記基材に接して設けられ、
前記下地層の構成材料は、純ニッケル又はニッケル合金である形態が挙げられる。 (7) As an example of the pin terminal of (6) above,
The plating layer includes a base layer between a portion of the tip covering portion that covers the first surface and the second surface and the base material.
The portion of the tip covering portion that covers the third surface and the fourth surface is provided in contact with the base material.
Examples of the constituent material of the base layer include a form of pure nickel or a nickel alloy.
前記めっき層は、前記先端被覆部における前記第一面及び前記第二面を覆う箇所と前記基材との間に下地層を備え、
前記先端被覆部における前記第三面及び前記第四面を覆う箇所は、前記基材に接して設けられ、
前記下地層の構成材料は、純ニッケル又はニッケル合金である形態が挙げられる。 (7) As an example of the pin terminal of (6) above,
The plating layer includes a base layer between a portion of the tip covering portion that covers the first surface and the second surface and the base material.
The portion of the tip covering portion that covers the third surface and the fourth surface is provided in contact with the base material.
Examples of the constituent material of the base layer include a form of pure nickel or a nickel alloy.
特に厚膜部では、下地層によってウィスカの発生が低減され易い。
Especially in the thick film part, the generation of whiskers is likely to be reduced by the underlying layer.
(8)上記(6)又は(7)のピン端子の一例として、
前記第一面、前記第二面、前記第三面、及び前記第四面において、前記ピン端子の一端から前記ピン端子の長手方向に沿って1mmの地点と、3mmの地点と、5mmの地点とを前記先端被覆部の厚さの測定箇所とし、三つの前記測定箇所において最大厚さと最小厚さとの差をとり、この差の最大値が1.0μm以下である形態が挙げられる。 (8) As an example of the pin terminal of (6) or (7) above,
On the first surface, the second surface, the third surface, and the fourth surface, apoint 1 mm, a point 3 mm, and a point 5 mm along the longitudinal direction of the pin terminal from one end of the pin terminal. Is a measurement point for the thickness of the tip covering portion, and the difference between the maximum thickness and the minimum thickness is taken at the three measurement points, and the maximum value of this difference is 1.0 μm or less.
前記第一面、前記第二面、前記第三面、及び前記第四面において、前記ピン端子の一端から前記ピン端子の長手方向に沿って1mmの地点と、3mmの地点と、5mmの地点とを前記先端被覆部の厚さの測定箇所とし、三つの前記測定箇所において最大厚さと最小厚さとの差をとり、この差の最大値が1.0μm以下である形態が挙げられる。 (8) As an example of the pin terminal of (6) or (7) above,
On the first surface, the second surface, the third surface, and the fourth surface, a
上記形態は、はんだが塗布される領域をピン端子の長手方向に長く確保し易く、はんだを塗布し易い。
In the above form, it is easy to secure a long area to which the solder is applied in the longitudinal direction of the pin terminal, and it is easy to apply the solder.
(9)上記(2)から(8)のいずれか一つのピン端子の一例として、
前記薄膜部における前記外層の厚さは、0.5μm以上であり、
前記薄膜部における前記内層の厚さは、0.1μm以上である形態が挙げられる。 (9) As an example of any one of the pin terminals (2) to (8) above,
The thickness of the outer layer in the thin film portion is 0.5 μm or more.
The thickness of the inner layer in the thin film portion may be 0.1 μm or more.
前記薄膜部における前記外層の厚さは、0.5μm以上であり、
前記薄膜部における前記内層の厚さは、0.1μm以上である形態が挙げられる。 (9) As an example of any one of the pin terminals (2) to (8) above,
The thickness of the outer layer in the thin film portion is 0.5 μm or more.
The thickness of the inner layer in the thin film portion may be 0.1 μm or more.
上記形態は、外層によってはんだ濡れ性に優れると共に、内層によってウィスカの発生を低減できる。
In the above form, the outer layer is excellent in solder wettability, and the inner layer can reduce the generation of whiskers.
(10)本開示のピン端子の一例として、
前記薄膜部の表面に存在するウィスカの数は、一辺の長さが0.35mmである正方形の視野内に15個以下であり、
メニスコグラフ試験機によって測定される前記先端被覆部の最大濡れ力は、0.25mN以上である形態が挙げられる。 (10) As an example of the pin terminals of the present disclosure,
The number of whiskers existing on the surface of the thin film portion is 15 or less in a square field of view having a side length of 0.35 mm.
The maximum wetting force of the tip covering portion measured by the meniscograph tester may be 0.25 mN or more.
前記薄膜部の表面に存在するウィスカの数は、一辺の長さが0.35mmである正方形の視野内に15個以下であり、
メニスコグラフ試験機によって測定される前記先端被覆部の最大濡れ力は、0.25mN以上である形態が挙げられる。 (10) As an example of the pin terminals of the present disclosure,
The number of whiskers existing on the surface of the thin film portion is 15 or less in a square field of view having a side length of 0.35 mm.
The maximum wetting force of the tip covering portion measured by the meniscograph tester may be 0.25 mN or more.
上記形態は、高い最大濡れ力を有しており、はんだ濡れ性に優れる。また、上記形態では、薄膜部が基材に接している場合でも、薄膜部においてウィスカの数が少ない。そのため、上述の多数のピン端子が近接して配置される用途等において、隣り合うピン端子間がウィスカによって短絡することが防止される。このような上記形態は、多数のピン端子を備えるコネクタ等に更に好適である。
The above form has a high maximum wetting force and is excellent in solder wettability. Further, in the above embodiment, the number of whiskers is small in the thin film portion even when the thin film portion is in contact with the base material. Therefore, in the above-mentioned applications in which a large number of pin terminals are arranged close to each other, it is possible to prevent short circuits between adjacent pin terminals due to whiskers. Such a form is more suitable for a connector or the like having a large number of pin terminals.
(11)本開示のピン端子の一例として、
前記基材の他端側は、前記基材の周方向の異なる位置に後端被覆部と露出領域とを備え、
前記錫系層は、前記後端被覆部を含み、
前記後端被覆部は、前記基材の他端側における周方向の一部の領域を覆い、
前記露出領域では、前記めっき層が設けられず前記基材が露出される形態が挙げられる。 (11) As an example of the pin terminals of the present disclosure,
The other end side of the base material is provided with a rear end covering portion and an exposed region at different positions in the circumferential direction of the base material.
The tin-based layer includes the rear end covering portion.
The rear end covering portion covers a part of the circumferential direction on the other end side of the base material.
In the exposed region, a form in which the plating layer is not provided and the base material is exposed can be mentioned.
前記基材の他端側は、前記基材の周方向の異なる位置に後端被覆部と露出領域とを備え、
前記錫系層は、前記後端被覆部を含み、
前記後端被覆部は、前記基材の他端側における周方向の一部の領域を覆い、
前記露出領域では、前記めっき層が設けられず前記基材が露出される形態が挙げられる。 (11) As an example of the pin terminals of the present disclosure,
The other end side of the base material is provided with a rear end covering portion and an exposed region at different positions in the circumferential direction of the base material.
The tin-based layer includes the rear end covering portion.
The rear end covering portion covers a part of the circumferential direction on the other end side of the base material.
In the exposed region, a form in which the plating layer is not provided and the base material is exposed can be mentioned.
上記形態は、基材の一端側の領域を回路基板に接続される領域とし、基材の他端側の領域を相手側端子に接続される領域とすることで、はんだ濡れ性に優れる上に、相手側端子への挿入性にも優れる。また、上記形態は、後端被覆部によって、相手側端子との接続抵抗を低減できる。
In the above embodiment, the region on one end side of the base material is a region connected to the circuit board, and the region on the other end side of the base material is a region connected to the terminal on the other side, so that the solder wettability is excellent. It also has excellent insertability into the terminal on the other side. Further, in the above embodiment, the connection resistance with the mating terminal can be reduced by the rear end covering portion.
(12)本開示の一態様に係るコネクタは、
上記(1)から(11)のいずれか一つのピン端子を備える。 (12) The connector according to one aspect of the present disclosure is
It is provided with any one of the pin terminals (1) to (11) above.
上記(1)から(11)のいずれか一つのピン端子を備える。 (12) The connector according to one aspect of the present disclosure is
It is provided with any one of the pin terminals (1) to (11) above.
本開示のコネクタは、先端被覆部によって、ピン端子の一端側の領域と回路基板とをはんだによって良好に接続できる。特に、先端被覆部にはんだを塗布した場合に、はんだつらら等のはんだ付け不良が生じ難い。そのため、本開示のコネクタは、多数のピン端子が近接して配置される場合でも、隣り合うピン端子間がはんだつららによって短絡することを防止できる。また、本開示のコネクタは、ピン端子の他端側の領域を相手側端子に挿入し易い。多段めっき製法を利用すれば、先端被覆部の表面にウィスカの数が少ない。
In the connector of the present disclosure, the region on one end side of the pin terminal and the circuit board can be satisfactorily connected by solder by the tip coating portion. In particular, when solder is applied to the tip coating portion, soldering defects such as solder icicles are unlikely to occur. Therefore, the connector of the present disclosure can prevent short circuits between adjacent pin terminals due to solder icicles even when a large number of pin terminals are arranged close to each other. Further, in the connector of the present disclosure, the region on the other end side of the pin terminal can be easily inserted into the mating terminal. If the multi-stage plating method is used, the number of whiskers on the surface of the tip coating is small.
(13)本開示の一態様に係るコネクタ付きワイヤーハーネスは、
上記(12)のコネクタと、ワイヤーハーネスとを備え、
前記ワイヤーハーネスは、前記ピン端子の他端側の領域に接続される。 (13) The wire harness with a connector according to one aspect of the present disclosure is
The connector of (12) above and the wire harness are provided.
The wire harness is connected to the region on the other end side of the pin terminal.
上記(12)のコネクタと、ワイヤーハーネスとを備え、
前記ワイヤーハーネスは、前記ピン端子の他端側の領域に接続される。 (13) The wire harness with a connector according to one aspect of the present disclosure is
The connector of (12) above and the wire harness are provided.
The wire harness is connected to the region on the other end side of the pin terminal.
本開示のコネクタ付きワイヤーハーネスは、ピン端子の一端側の領域と回路基板とをはんだによって良好に接続できる。特に、ピン端子の一端側の領域にはんだを塗布した場合に、はんだつらら等のはんだ付け不良が生じ難い。そのため、本開示のコネクタ付きワイヤーハーネスは、多数のピン端子が近接して配置される場合でも、隣り合うピン端子間がはんだつららによって短絡することを防止できる。また、本開示のコネクタ付きワイヤーハーネスは、ピン端子の他端側の領域をワイヤーハーネスの端部に取り付けられる端子、即ち相手側端子に挿入し易く、挿入作業性に優れる。更に、本開示のコネクタ付きワイヤーハーネスは、多段めっき製法を利用すれば、各ピン端子のウィスカの数が少ないため、隣り合うピン端子間がウィスカによって短絡することを防止できる。
In the wire harness with a connector of the present disclosure, the area on one end side of the pin terminal and the circuit board can be satisfactorily connected by soldering. In particular, when solder is applied to the region on one end side of the pin terminal, soldering defects such as solder icicles are unlikely to occur. Therefore, the wire harness with a connector of the present disclosure can prevent short circuits between adjacent pin terminals due to solder icicles even when a large number of pin terminals are arranged close to each other. Further, the wire harness with a connector of the present disclosure is excellent in insertion workability because it is easy to insert the region on the other end side of the pin terminal into a terminal attached to the end of the wire harness, that is, a terminal on the other side. Further, in the wire harness with a connector of the present disclosure, if the multi-stage plating method is used, the number of whiskers at each pin terminal is small, so that it is possible to prevent the adjacent pin terminals from being short-circuited by the whiskers.
(14)本開示の一態様に係るコントロールユニットは、
上記(12)のコネクタ、又は上記(13)のコネクタ付きワイヤーハーネスと、回路基板とを備え、
前記回路基板と前記ピン端子の一端側の領域とは、はんだによって接続される。 (14) The control unit according to one aspect of the present disclosure is
The connector of the above (12) or the wire harness with the connector of the above (13) and a circuit board are provided.
The circuit board and the region on one end side of the pin terminal are connected by solder.
上記(12)のコネクタ、又は上記(13)のコネクタ付きワイヤーハーネスと、回路基板とを備え、
前記回路基板と前記ピン端子の一端側の領域とは、はんだによって接続される。 (14) The control unit according to one aspect of the present disclosure is
The connector of the above (12) or the wire harness with the connector of the above (13) and a circuit board are provided.
The circuit board and the region on one end side of the pin terminal are connected by solder.
本開示のコントロールユニットでは、ピン端子の一端側の領域と回路基板とがはんだによって良好に接続される。そのため、ピン端子と回路基板との接続抵抗が低い。特に、ピン端子の一端側の領域にはんだを塗布した場合に、はんだつらら等のはんだ付け不良が生じ難い。そのため、本開示のコントロールユニットは、多数のピン端子が近接して配置される場合でも、隣り合うピン端子間がはんだつららによって短絡することを防止できる。また、本開示のコントロールユニットは、ピン端子の他端側の領域をワイヤーハーネスの端部に取り付けられる端子、即ち相手側端子に挿入し易く、挿入作業性に優れる。特に、多数、例えば200以上、更に250以上のピン端子を備える場合でも、相手側端子に接続する際の挿入力が大き過ぎず、挿入作業が容易に行える。更に、本開示のコントロールユニットは、多数のピン端子を備える場合でも、多段めっき製法を利用すれば、各ピン端子のウィスカの数が少ないため、隣り合うピン端子同士がウィスカによって短絡することを防止できる。
In the control unit of the present disclosure, the area on one end side of the pin terminal and the circuit board are satisfactorily connected by solder. Therefore, the connection resistance between the pin terminal and the circuit board is low. In particular, when solder is applied to the region on one end side of the pin terminal, soldering defects such as solder icicles are unlikely to occur. Therefore, the control unit of the present disclosure can prevent short circuits between adjacent pin terminals due to solder icicles even when a large number of pin terminals are arranged close to each other. Further, the control unit of the present disclosure is excellent in insertion workability because the region on the other end side of the pin terminal can be easily inserted into a terminal attached to the end of the wire harness, that is, a terminal on the other side. In particular, even when a large number, for example, 200 or more, and 250 or more pin terminals are provided, the insertion force when connecting to the mating terminal is not too large, and the insertion work can be easily performed. Further, even when the control unit of the present disclosure is provided with a large number of pin terminals, if the multi-stage plating method is used, the number of whiskers at each pin terminal is small, so that adjacent pin terminals are prevented from being short-circuited by the whiskers. it can.
(15)本開示のコントロールユニットの一例として、
前記回路基板は、エンジンの燃料噴射及びエンジン点火の少なくとも一方の制御を行う形態が挙げられる。 (15) As an example of the control unit of the present disclosure,
Examples of the circuit board include a form in which at least one of engine fuel injection and engine ignition is controlled.
前記回路基板は、エンジンの燃料噴射及びエンジン点火の少なくとも一方の制御を行う形態が挙げられる。 (15) As an example of the control unit of the present disclosure,
Examples of the circuit board include a form in which at least one of engine fuel injection and engine ignition is controlled.
上記形態は、多数、例えば200以上、更に250以上のピン端子を備えることがある。この場合でも、上記形態は、隣り合うピン端子間がはんだつららによって短絡することを防止できる。また、上記形態は、相手側端子に接続する際の挿入力が大き過ぎず、挿入性に優れる。更に、多段めっき製法を利用すれば、ウィスカによる隣り合うピン端子間の短絡が生じ難い。
The above form may include a large number, for example, 200 or more, and further 250 or more pin terminals. Even in this case, the above-described embodiment can prevent the adjacent pin terminals from being short-circuited by solder icicles. Further, in the above form, the insertion force when connecting to the other end terminal is not too large, and the insertability is excellent. Further, if the multi-stage plating method is used, a short circuit between adjacent pin terminals due to whiskers is unlikely to occur.
[本開示の実施形態の詳細]
以下、図面を参照して、本開示の実施の形態を詳細に説明する。図中の同一符号は、同一名称物を示す。 [Details of Embodiments of the present disclosure]
Hereinafter, embodiments of the present disclosure will be described in detail with reference to the drawings. The same reference numerals in the figures indicate the same names.
以下、図面を参照して、本開示の実施の形態を詳細に説明する。図中の同一符号は、同一名称物を示す。 [Details of Embodiments of the present disclosure]
Hereinafter, embodiments of the present disclosure will be described in detail with reference to the drawings. The same reference numerals in the figures indicate the same names.
[ピン端子]
(概要)
以下、主に図1~図3を参照して、実施形態のピン端子を説明する。
実施形態のピン端子1は、図1に示すように棒状の金属部材である。ピン端子1は、代表的には、後述する図4に示すようにコネクタ6の筐体60に支持されて、電気的接続部材として利用される。ピン端子1の一端側の領域は、相手側端子との接続領域として利用される。ピン端子1の他端側の領域は、後述する図6に示すように回路基板80との接続領域として利用される。 [Pin terminal]
(Overview)
Hereinafter, the pin terminals of the embodiment will be described mainly with reference to FIGS. 1 to 3.
Thepin terminal 1 of the embodiment is a rod-shaped metal member as shown in FIG. The pin terminal 1 is typically supported by the housing 60 of the connector 6 as shown in FIG. 4 to be described later, and is used as an electrical connection member. The area on one end side of the pin terminal 1 is used as a connection area with the terminal on the other side. The region on the other end side of the pin terminal 1 is used as a connection region with the circuit board 80 as shown in FIG. 6 to be described later.
(概要)
以下、主に図1~図3を参照して、実施形態のピン端子を説明する。
実施形態のピン端子1は、図1に示すように棒状の金属部材である。ピン端子1は、代表的には、後述する図4に示すようにコネクタ6の筐体60に支持されて、電気的接続部材として利用される。ピン端子1の一端側の領域は、相手側端子との接続領域として利用される。ピン端子1の他端側の領域は、後述する図6に示すように回路基板80との接続領域として利用される。 [Pin terminal]
(Overview)
Hereinafter, the pin terminals of the embodiment will be described mainly with reference to FIGS. 1 to 3.
The
詳しくは、ピン端子1は、棒状の基材2と、めっき層3とを備える。めっき層3は、基材2の所定の領域を覆う。めっき層3は、錫(Sn)を含む金属から構成される錫系層30を備える。
Specifically, the pin terminal 1 includes a rod-shaped base material 2 and a plating layer 3. The plating layer 3 covers a predetermined region of the base material 2. The plating layer 3 includes a tin-based layer 30 made of a metal containing tin (Sn).
実施形態のピン端子1では、基材2の一端側の領域と他端側の領域とにおいて錫系層30によって基材2の表面が被覆される範囲が異なる。基材2の一端側の領域では、図2に示すように、錫系層30は基材2の周方向の全周を覆う。基材2の他端側の領域では、図3に示すように、錫系層30は基材2の周方向の一部を覆い、他部を覆わない。基材2の他端側の領域では、めっき層3が設けられず基材2の一部が露出されている。以下、基材2におけるめっき層3から露出された領域を露出領域26と呼ぶ。特に、実施形態のピン端子1では、基材2の構成材料は、Znの含有量が20質量%以下である銅合金、又は純銅である。
以下、基材2、めっき層3の全体構成をまず説明する。次に、基材2の一端側の領域、他端側の領域を順に説明する。 In thepin terminal 1 of the embodiment, the range in which the surface of the base material 2 is covered by the tin-based layer 30 differs between the region on one end side and the region on the other end side of the base material 2. In the region on one end side of the base material 2, as shown in FIG. 2, the tin-based layer 30 covers the entire circumference of the base material 2 in the circumferential direction. In the region on the other end side of the base material 2, as shown in FIG. 3, the tin-based layer 30 covers a part of the base material 2 in the circumferential direction and does not cover the other part. In the region on the other end side of the base material 2, the plating layer 3 is not provided and a part of the base material 2 is exposed. Hereinafter, the region of the base material 2 exposed from the plating layer 3 is referred to as an exposed region 26. In particular, in the pin terminal 1 of the embodiment, the constituent material of the base material 2 is a copper alloy having a Zn content of 20% by mass or less, or pure copper.
Hereinafter, the overall configuration of thebase material 2 and the plating layer 3 will be described first. Next, the region on one end side and the region on the other end side of the base material 2 will be described in order.
以下、基材2、めっき層3の全体構成をまず説明する。次に、基材2の一端側の領域、他端側の領域を順に説明する。 In the
Hereinafter, the overall configuration of the
(基材)
〈組成〉
ピン端子1の主体である基材2は、純銅又は銅合金から構成される。 (Base material)
<composition>
Thebase material 2 which is the main body of the pin terminal 1 is made of pure copper or a copper alloy.
〈組成〉
ピン端子1の主体である基材2は、純銅又は銅合金から構成される。 (Base material)
<composition>
The
純銅は、99.9質量%以上の銅(Cu)を含み、残部が不可避不純物からなる。純銅からなる基材2は、導電率が高く、接続抵抗を低くし易い。
Pure copper contains 99.9% by mass or more of copper (Cu), and the balance is composed of unavoidable impurities. The base material 2 made of pure copper has high conductivity and tends to have low connection resistance.
銅合金は、添加元素を含み、残部がCu及び不可避不純物からなり、Cuを最も多く含む合金である。特に、基材2の構成材料が銅合金である場合、銅合金中の亜鉛(Zn)の含有量は20質量%以下である。
Copper alloy is an alloy that contains additive elements, the balance is composed of Cu and unavoidable impurities, and contains the largest amount of Cu. In particular, when the constituent material of the base material 2 is a copper alloy, the content of zinc (Zn) in the copper alloy is 20% by mass or less.
基材2を構成する銅合金中のZnは、はんだつららの生成を促進し易いと考えられる。また、上記銅合金中のZnの含有量が少ないほど、はんだつららが生成され難いと考えられる。その結果、多数のピン端子1が近接して配置される用途において、隣り合うピン端子1間がはんだつららによって短絡することが防止され易い。はんだつららによる短絡を防止する観点から、Znの含有量は15質量%以下、更に12質量%以下、10質量%以下が好ましい。Znの含有量が1質量%以下、更に0.5質量%以下である銅合金は、はんだつららが生じ難い上に、純銅よりも機械的強度等に優れて好ましい。なお、Znを実質的に含まない純銅は、はんだつららが生じ難いと考えられる。
It is considered that Zn in the copper alloy constituting the base material 2 easily promotes the formation of solder icicles. Further, it is considered that the smaller the Zn content in the copper alloy, the less likely it is that solder icicles will be generated. As a result, in an application in which a large number of pin terminals 1 are arranged close to each other, it is easy to prevent short circuits between adjacent pin terminals 1 due to solder icicles. From the viewpoint of preventing short circuits due to solder icicles, the Zn content is preferably 15% by mass or less, more preferably 12% by mass or less, and 10% by mass or less. Copper alloys having a Zn content of 1% by mass or less and further 0.5% by mass or less are preferable because they are less likely to cause solder icicles and are superior to pure copper in terms of mechanical strength and the like. It is considered that pure copper containing substantially no Zn is less likely to cause solder icicles.
Znの含有量が20質量%以下である銅合金において、Zn以外の添加元素は、例えば、錫(Sn)、リン(P)、鉄(Fe)等が挙げられる。添加元素の合計含有量は例えば0.05質量%以上15質量%以下が挙げられる。
In a copper alloy having a Zn content of 20% by mass or less, examples of additive elements other than Zn include tin (Sn), phosphorus (P), iron (Fe) and the like. The total content of the additive elements is, for example, 0.05% by mass or more and 15% by mass or less.
具体的な銅合金として、Feを含む鉄入り銅、SnとPとを含むリン青銅が挙げられる。鉄入り銅は、JISに規定される合金番号C1940が挙げられる。リン青銅は、上記合金番号C5191、C5210が挙げられる。
Specific copper alloys include iron-containing copper containing Fe and phosphor bronze containing Sn and P. Examples of copper containing iron include alloy number C1940 specified in JIS. Examples of phosphor bronze include alloy numbers C5911 and C5210.
C1940はFeを2.1質量%以上2.6質量%以下、Znを0.05質量%以上0.20質量%以下、Pを0.015質量%以上0.150質量%以下含む。
C1940 contains Fe in an amount of 2.1% by mass or more and 2.6% by mass or less, Zn in an amount of 0.05% by mass or more and 0.20% by mass or less, and P in an amount of 0.015% by mass or more and 0.150% by mass or less.
C5191、C5210はそれぞれSnを5.5質量%以上7.0質量%以下、7.0質量%以上9.0質量%以下含むと共に、Pを0.03質量%以上0.35質量%以下含み、Znの含有量が0.20質量%以下である。
C5191 and C5210 contain Sn of 5.5% by mass or more and 7.0% by mass or less, 7.0% by mass or more and 9.0% by mass or less, and P of 0.03% by mass or more and 0.35% by mass or less. , Zn content is 0.20% by mass or less.
C1940の具体的な組成は、JIS H 3100:2018に規定される。C5191の具体的な組成は、JIS H 3110:2018に規定される。C5210の具体的な組成は、JIS H 3130:2018に規定される。
The specific composition of C1940 is specified in JIS H 3100: 2018. The specific composition of C5911 is specified in JIS H 3110: 2018. The specific composition of C5210 is specified in JIS H 3130: 2018.
〈形状〉
基材2の外形は、代表的には直方体状が挙げられる。図示しないが、基材2は、その長手方向の適宜な位置に局所的に張り出した箇所を有してもよい。上記張り出し箇所は、筐体60に対する位置決め等に利用される。その他、基材2の外形は、六角柱状といった多角柱状、円柱状や楕円柱状といった外周面が曲面からなる柱状等が挙げられる。 <shape>
The outer shape of thebase material 2 is typically a rectangular parallelepiped shape. Although not shown, the base material 2 may have a locally overhanging portion at an appropriate position in the longitudinal direction thereof. The overhanging portion is used for positioning with respect to the housing 60 and the like. In addition, the outer shape of the base material 2 may be a polygonal columnar shape such as a hexagonal columnar shape, a columnar shape having a curved outer peripheral surface such as a columnar column or an elliptical columnar shape, or the like.
基材2の外形は、代表的には直方体状が挙げられる。図示しないが、基材2は、その長手方向の適宜な位置に局所的に張り出した箇所を有してもよい。上記張り出し箇所は、筐体60に対する位置決め等に利用される。その他、基材2の外形は、六角柱状といった多角柱状、円柱状や楕円柱状といった外周面が曲面からなる柱状等が挙げられる。 <shape>
The outer shape of the
基材2の外形が直方体状である場合、図2,図3に示すように、基材2における各端部側の領域を基材2の軸に直交する平面で切断した断面形状は長方形状が挙げられる。代表的には、上記断面形状は、正方形状である。この場合、基材2の外周面は、上記断面において、互いに向かい合って配置される第一面21及び第二面22と、互いに向かい合って配置される第三面23及び第四面24とを備える。第三面23、第四面24は、第一面21、第二面22に対して概ね直交するように設けられる。図2,図3では、第一面21、第二面22は、紙面の上面、下面であり、第三面23、第四面24は、紙面の左面、右面である。
When the outer shape of the base material 2 is a rectangular parallelepiped, as shown in FIGS. 2 and 3, the cross-sectional shape of the base material 2 cut by a plane orthogonal to the axis of the base material 2 is rectangular. Can be mentioned. Typically, the cross-sectional shape is square. In this case, the outer peripheral surface of the base material 2 includes a first surface 21 and a second surface 22 arranged to face each other and a third surface 23 and a fourth surface 24 arranged to face each other in the above cross section. .. The third surface 23 and the fourth surface 24 are provided so as to be substantially orthogonal to the first surface 21 and the second surface 22. In FIGS. 2 and 3, the first surface 21 and the second surface 22 are the upper surface and the lower surface of the paper surface, and the third surface 23 and the fourth surface 24 are the left surface and the right surface of the paper surface.
〈大きさ〉
基材2の大きさ、例えば長さ、幅、高さ等は適宜選択できる。基材2の長さは、基材2の軸に沿った長さである。基材2の幅は、基材2の軸に直交する方向に沿った長さであり、例えば図2,図3に示す断面において、第一面21の長さ及び第二面22の長さである。基材2の高さは、基材2の軸及び幅方向の双方に直交する方向に沿った長さであり、例えば上記断面において、第三面23の長さ及び第四面24の長さである。例えば、基材2の幅及び高さはそれぞれ、0.3mm以上5.0mm以下が挙げられる。 <size>
The size of thebase material 2, for example, length, width, height and the like can be appropriately selected. The length of the base material 2 is the length along the axis of the base material 2. The width of the base material 2 is a length along a direction orthogonal to the axis of the base material 2, for example, in the cross sections shown in FIGS. 2 and 3, the length of the first surface 21 and the length of the second surface 22. Is. The height of the base material 2 is a length along a direction orthogonal to both the axial direction and the width direction of the base material 2, for example, in the above cross section, the length of the third surface 23 and the length of the fourth surface 24. Is. For example, the width and height of the base material 2 are 0.3 mm or more and 5.0 mm or less, respectively.
基材2の大きさ、例えば長さ、幅、高さ等は適宜選択できる。基材2の長さは、基材2の軸に沿った長さである。基材2の幅は、基材2の軸に直交する方向に沿った長さであり、例えば図2,図3に示す断面において、第一面21の長さ及び第二面22の長さである。基材2の高さは、基材2の軸及び幅方向の双方に直交する方向に沿った長さであり、例えば上記断面において、第三面23の長さ及び第四面24の長さである。例えば、基材2の幅及び高さはそれぞれ、0.3mm以上5.0mm以下が挙げられる。 <size>
The size of the
(めっき層)
〈概要〉
基材2の表面における所定の領域は、錫系層30を含むめっき層3によって覆われている。基材2の一端側は、先端被覆部31を備える。基材2の他端側は、後端被覆部32を備える。錫系層30は、先端被覆部31と後端被覆部32とを含む。 (Plating layer)
<Overview>
A predetermined region on the surface of thebase material 2 is covered with a plating layer 3 including a tin-based layer 30. One end side of the base material 2 includes a tip covering portion 31. The other end side of the base material 2 is provided with a rear end covering portion 32. The tin-based layer 30 includes a front end covering portion 31 and a rear end covering portion 32.
〈概要〉
基材2の表面における所定の領域は、錫系層30を含むめっき層3によって覆われている。基材2の一端側は、先端被覆部31を備える。基材2の他端側は、後端被覆部32を備える。錫系層30は、先端被覆部31と後端被覆部32とを含む。 (Plating layer)
<Overview>
A predetermined region on the surface of the
先端被覆部31は、図2に示すように基材2の一端側における周方向の全ての領域を覆う。錫を含む先端被覆部31ははんだ濡れ性に優れる。このような先端被覆部31によって、基材2の一端側の領域は、基材2の周方向の全周にわたってはんだと良好に濡れることができる。
As shown in FIG. 2, the tip covering portion 31 covers the entire area in the circumferential direction on one end side of the base material 2. The tip covering portion 31 containing tin is excellent in solder wettability. With such a tip covering portion 31, the region on one end side of the base material 2 can be satisfactorily wetted with the solder over the entire circumference of the base material 2 in the circumferential direction.
後端被覆部32は、図3に示すように基材2の他端側における周方向の一部の領域を覆う。錫を含む後端被覆部32は柔らかく変形し易い。このような後端被覆部32によって、基材2の他端側の領域は、相手側端子との接続抵抗を低減できる。
As shown in FIG. 3, the rear end covering portion 32 covers a part of the circumferential direction on the other end side of the base material 2. The rear end covering portion 32 containing tin is soft and easily deformed. With such a rear end covering portion 32, the region on the other end side of the base material 2 can reduce the connection resistance with the mating terminal.
〈組成〉
錫系層30は、図2,図3に示すように外層302と内層301とを備えることが挙げられる。外層302の構成材料は純錫である。内層301の構成材料は、錫と銅とを含む合金である。外層302は、内層301に接して、内層301の外周に設けられる。 <composition>
As shown in FIGS. 2 and 3, the tin-basedlayer 30 includes an outer layer 302 and an inner layer 301. The constituent material of the outer layer 302 is pure tin. The constituent material of the inner layer 301 is an alloy containing tin and copper. The outer layer 302 is provided on the outer periphery of the inner layer 301 in contact with the inner layer 301.
錫系層30は、図2,図3に示すように外層302と内層301とを備えることが挙げられる。外層302の構成材料は純錫である。内層301の構成材料は、錫と銅とを含む合金である。外層302は、内層301に接して、内層301の外周に設けられる。 <composition>
As shown in FIGS. 2 and 3, the tin-based
純錫は、Snを99質量%以上含み、残部が不可避不純物からなる。更に、純錫は、Snを99.8質量%以上含んでもよい。錫と銅とを含む合金は、代表的にはSnとCuとの二元合金であり、残部が不可避不純物からなるものが挙げられる。上記合金は、Sn及びCuの他に、Zn等の元素を含んでもよい。
Pure tin contains 99% by mass or more of Sn, and the balance is composed of unavoidable impurities. Further, pure tin may contain Sn in an amount of 99.8% by mass or more. The alloy containing tin and copper is typically a binary alloy of Sn and Cu, and the balance may be composed of unavoidable impurities. The alloy may contain an element such as Zn in addition to Sn and Cu.
純錫からなる外層302は、はんだ濡れ性に優れる。そのため、先端被覆部31が外層302を備えると、基材2の一端側の領域ははんだと良好に濡れることができる。後端被覆部32が外層302を備えると、相手側端子との接続抵抗を低減できる。
The outer layer 302 made of pure tin has excellent solder wettability. Therefore, when the tip covering portion 31 includes the outer layer 302, the region on one end side of the base material 2 can be satisfactorily wetted with the solder. When the rear end covering portion 32 includes the outer layer 302, the connection resistance with the mating terminal can be reduced.
上記合金からなる内層301は、錫系層30の表面においてウィスカの発生を低減する。そのため、先端被覆部31、後端被覆部32が内層301を備えると、多数のピン端子1が近接して配置される用途等において、隣り合うピン端子1間がウィスカによって短絡することを防止することができる。
The inner layer 301 made of the above alloy reduces the generation of whiskers on the surface of the tin-based layer 30. Therefore, when the front end covering portion 31 and the rear end covering portion 32 are provided with the inner layer 301, it is possible to prevent the adjacent pin terminals 1 from being short-circuited by the whisker in an application in which a large number of pin terminals 1 are arranged close to each other. be able to.
合金層である内層301と純錫層である外層302とを備える錫系層30は、代表的には、各種のめっき法によって純錫層を形成した後、熱処理を施すことで製造することが挙げられる。
The tin-based layer 30 including the inner layer 301 which is an alloy layer and the outer layer 302 which is a pure tin layer can be typically manufactured by forming a pure tin layer by various plating methods and then performing a heat treatment. Can be mentioned.
めっき層3は、錫系層30以外の層を備えてもよい。例えば、めっき層3は、錫系層30と基材2との間に下地層300を備えることが挙げられる。下地層300の構成材料は、例えば純ニッケル又はニッケル合金が挙げられる。純ニッケル又はニッケル合金からなる下地層300は、錫系層30の表面においてウィスカの発生を低減する。下地層300を備えると共に錫系層30が内層301を含むピン端子1は、上述のウィスカによる短絡をより効果的に防止できる。その他、下地層300は、めっき層3の剛性を高め、耐摩耗性の向上に寄与する。
The plating layer 3 may include a layer other than the tin-based layer 30. For example, the plating layer 3 may include a base layer 300 between the tin-based layer 30 and the base material 2. Examples of the constituent material of the base layer 300 include pure nickel and nickel alloy. The base layer 300 made of pure nickel or a nickel alloy reduces the generation of whiskers on the surface of the tin-based layer 30. The pin terminal 1 including the base layer 300 and the tin-based layer 30 including the inner layer 301 can more effectively prevent the short circuit caused by the whiskers described above. In addition, the base layer 300 increases the rigidity of the plating layer 3 and contributes to the improvement of wear resistance.
純ニッケルは、ニッケル(Ni)を99質量%以上含み、残部が不可避不純物からなる。更に、純ニッケルは、Niを99.9質量%以上含んでもよい。ニッケル合金は、添加元素を含み、残部がNi及び不可避不純物からなり、Niを最も多く含む合金である。添加元素は、例えばSn、Zn、Cu等が挙げられる。
Pure nickel contains 99% by mass or more of nickel (Ni), and the balance is composed of unavoidable impurities. Further, pure nickel may contain 99.9% by mass or more of Ni. The nickel alloy is an alloy containing an additive element, the balance of which is Ni and unavoidable impurities, and which contains the largest amount of Ni. Examples of the additive element include Sn, Zn, Cu and the like.
(一端側の領域)
基材2の一端側の領域は、錫系層30である先端被覆部31に覆われて、基材2が露出していない。先端被覆部31は、ピン端子1の一端からピン端子1の長手方向に沿った所定の地点、例えば1mmの地点において、基材2の周方向に均一的な厚さではなく、部分的に異なる厚さを有する。つまり、先端被覆部31は、基材2の周方向の異なる位置に薄膜部34と厚膜部35とを備える。上記所定の地点において薄膜部34と厚膜部35とが存在することは、代表的には上記所定の地点において、ピン端子1の軸に直交する平面で切断した断面を観察すれば確認できる。薄膜部34は、先端被覆部31の厚さが相対的に薄い領域である。厚膜部35は、先端被覆部31の厚さが相対的に厚い領域である。 (Area on one end side)
The region on one end side of thebase material 2 is covered with the tip covering portion 31 which is a tin-based layer 30, and the base material 2 is not exposed. The tip covering portion 31 is not a uniform thickness in the circumferential direction of the base material 2 but is partially different at a predetermined point along the longitudinal direction of the pin terminal 1, for example, 1 mm from one end of the pin terminal 1. Has a thickness. That is, the tip covering portion 31 includes the thin film portion 34 and the thick film portion 35 at different positions in the circumferential direction of the base material 2. The existence of the thin film portion 34 and the thick film portion 35 at the predetermined point can be typically confirmed by observing a cross section cut in a plane orthogonal to the axis of the pin terminal 1 at the predetermined point. The thin film portion 34 is a region where the thickness of the tip covering portion 31 is relatively thin. The thick film portion 35 is a region where the thickness of the tip covering portion 31 is relatively thick.
基材2の一端側の領域は、錫系層30である先端被覆部31に覆われて、基材2が露出していない。先端被覆部31は、ピン端子1の一端からピン端子1の長手方向に沿った所定の地点、例えば1mmの地点において、基材2の周方向に均一的な厚さではなく、部分的に異なる厚さを有する。つまり、先端被覆部31は、基材2の周方向の異なる位置に薄膜部34と厚膜部35とを備える。上記所定の地点において薄膜部34と厚膜部35とが存在することは、代表的には上記所定の地点において、ピン端子1の軸に直交する平面で切断した断面を観察すれば確認できる。薄膜部34は、先端被覆部31の厚さが相対的に薄い領域である。厚膜部35は、先端被覆部31の厚さが相対的に厚い領域である。 (Area on one end side)
The region on one end side of the
〈厚さ〉
以下、錫系層30である先端被覆部31の厚さを詳細に説明する。
ピン端子1は、例えば、以下の測定箇所で測定された先端被覆部31の厚さの最大値t1と最小値t2とについて以下の条件(1),(2)の少なくとも一方を満たすことが挙げられる。
(1)最大値t1と最小値t2との差(t1-t2)が0.20μm以上である。
(2)最大値t1と最小値t2との比t2/t1が0.2以上0.8未満である。
上記測定箇所は、ピン端子1において先端被覆部31が設けられている領域のうち、ピン端子1の一端からピン端子1の長手方向に沿って1mmの地点とする。最大値t1、最小値t2、後述する厚さt31、t32、ti、toの測定方法の詳細は、後述の試験例で説明する。なお、先端被覆部31が内層301と外層302とを備える場合、先端被覆部31の厚さは、内層301の厚さと外層302の厚さとの合計厚さである。 <thickness>
Hereinafter, the thickness of thetip covering portion 31 which is the tin-based layer 30 will be described in detail.
Thepin terminal 1 satisfies at least one of the following conditions (1) and (2) with respect to the maximum value t 1 and the minimum value t 2 of the thickness of the tip covering portion 31 measured at the following measurement points, for example. Can be mentioned.
(1) The difference (t 1 − t 2 ) between the maximum value t 1 and the minimum value t 2 is 0.20 μm or more.
(2) The ratio t 2 / t 1 of the maximum value t 1 and the minimum value t 2 is 0.2 or more and less than 0.8.
The measurement point is apoint 1 mm along the longitudinal direction of the pin terminal 1 from one end of the pin terminal 1 in the area where the tip covering portion 31 is provided in the pin terminal 1. Maximum value t 1, the minimum value t 2, the details of the measurement method of the thickness t 31, t 32, t i , t o , which will be described later, it will be described in Test Examples below. When the tip covering portion 31 includes the inner layer 301 and the outer layer 302, the thickness of the tip covering portion 31 is the total thickness of the thickness of the inner layer 301 and the thickness of the outer layer 302.
以下、錫系層30である先端被覆部31の厚さを詳細に説明する。
ピン端子1は、例えば、以下の測定箇所で測定された先端被覆部31の厚さの最大値t1と最小値t2とについて以下の条件(1),(2)の少なくとも一方を満たすことが挙げられる。
(1)最大値t1と最小値t2との差(t1-t2)が0.20μm以上である。
(2)最大値t1と最小値t2との比t2/t1が0.2以上0.8未満である。
上記測定箇所は、ピン端子1において先端被覆部31が設けられている領域のうち、ピン端子1の一端からピン端子1の長手方向に沿って1mmの地点とする。最大値t1、最小値t2、後述する厚さt31、t32、ti、toの測定方法の詳細は、後述の試験例で説明する。なお、先端被覆部31が内層301と外層302とを備える場合、先端被覆部31の厚さは、内層301の厚さと外層302の厚さとの合計厚さである。 <thickness>
Hereinafter, the thickness of the
The
(1) The difference (t 1 − t 2 ) between the maximum value t 1 and the minimum value t 2 is 0.20 μm or more.
(2) The ratio t 2 / t 1 of the maximum value t 1 and the minimum value t 2 is 0.2 or more and less than 0.8.
The measurement point is a
代表的には、図2に示すように薄膜部34は最小値t2を有する。厚膜部35は最大値t1を有する。また、薄膜部34は、代表的には基材2に接して設けられることが挙げられる。
Typically, as shown in FIG. 2, the thin film portion 34 has a minimum value t 2 . The thick film portion 35 has a maximum value t 1 . Further, the thin film portion 34 is typically provided in contact with the base material 2.
条件(1),(2)の少なくとも一方を満たすピン端子1は、基材2の一端側では先端被覆部31によってはんだ濡れ性に優れると共に、基材2の他端側では相手側端子への挿入性に優れる。挿入性に優れる理由の一つは、基材2の他端側において後端被覆部32が局所的に厚い肥大箇所を有さない、好ましくは基材2の長手方向に均一的な厚さを有するからである。ここで、多段のめっきと特定の熱処理とを行う多段めっき製法を利用すれば、基材2の周方向に不均一な厚さを有する錫系層30を基材2の一端側に備え、上記肥大箇所が無い錫系層30を基材2の他端側に備えるピン端子1が得られる。即ち、条件(1),(2)の少なくとも一方を満たすピン端子1が得られる。従って、特定の厚さ条件を満たす先端被覆部31を基材2の一端側に備えるピン端子1は、上記肥大箇所を有さない後端被覆部32を基材2の他端側に備えるといえる。
The pin terminal 1 that satisfies at least one of the conditions (1) and (2) is excellent in solder wettability due to the tip coating portion 31 on one end side of the base material 2, and is connected to the mating terminal on the other end side of the base material 2. Excellent insertability. One of the reasons for the excellent insertability is that the rear end covering portion 32 does not have a locally thick enlarged portion on the other end side of the base material 2, preferably a uniform thickness in the longitudinal direction of the base material 2. Because it has. Here, if a multi-stage plating method in which multi-stage plating and a specific heat treatment are performed is used, a tin-based layer 30 having a non-uniform thickness in the circumferential direction of the base material 2 is provided on one end side of the base material 2, as described above. A pin terminal 1 having a tin-based layer 30 having no enlarged portion on the other end side of the base material 2 can be obtained. That is, the pin terminal 1 satisfying at least one of the conditions (1) and (2) can be obtained. Therefore, the pin terminal 1 having the tip covering portion 31 satisfying a specific thickness condition on one end side of the base material 2 is provided with the rear end covering portion 32 having no enlarged portion on the other end side of the base material 2. I can say.
差(t1-t2)は例えば0.30μm以上、0.50μm以上、0.80μm以上でもよい。差(t1-t2)が1.0μm以上であれば、ピン端子1は良好なはんだ濡れ性を維持し易い。
The difference (t 1 − t 2 ) may be, for example, 0.30 μm or more, 0.50 μm or more, and 0.80 μm or more. When the difference (t 1 − t 2 ) is 1.0 μm or more, the pin terminal 1 can easily maintain good solder wettability.
差(t1-t2)の上限は特に設けない。但し、差(t1-t2)が大きいほど先めっき法によるめっき時間が長くなる等、製造性が低下し易い。良好な製造性の観点から、差(t1-t2)は例えば5.0μm以下、4.5μm以下、4.0μm以下が挙げられる。差(t1-t2)が0.20μm以上5.0μm以下、更に1.0μm以上4.0μm以下であると、ピン端子1は、はんだ濡れ性、挿入性、製造性に優れる。また、ピン端子1と相手側端子との接続抵抗が低くなり易い。
There is no particular upper limit for the difference (t 1- t 2). However, the larger the difference (t 1- t 2 ), the longer the plating time by the pre-plating method, and the lower the manufacturability. From the viewpoint of good manufacturability, the difference (t 1- t 2 ) is, for example, 5.0 μm or less, 4.5 μm or less, 4.0 μm or less. When the difference (t 1 − t 2 ) is 0.20 μm or more and 5.0 μm or less, and further 1.0 μm or more and 4.0 μm or less, the pin terminal 1 is excellent in solder wettability, insertability, and manufacturability. Further, the connection resistance between the pin terminal 1 and the other terminal tends to be low.
比t2/t1が上記範囲で大きいほど、薄膜部34が厚いといえる。そのため、基材2の一端側の領域は、先端被覆部31によってはんだとより確実に濡れることができる。比t2/t1が上記範囲で小さいほど、先めっき法によるめっき厚さが適切に確保され易い。これらの点から、比t2/t1は例えば0.25以上、0.30以上、0.35以上、0.40以上でもよい。また、比t2/t1は例えば0.75以下、0.70以下、0.60以下でもよい。比t2/t1が0.25以上0.75以下、更に0.40以上0.60以下であると、ピン端子1は、はんだ濡れ性、挿入性、製造性に優れる。
It can be said that the larger the ratio t 2 / t 1 is in the above range, the thicker the thin film portion 34 is. Therefore, the region on one end side of the base material 2 can be more reliably wetted with the solder by the tip covering portion 31. The smaller the ratio t 2 / t 1 is in the above range, the easier it is to properly secure the plating thickness by the pre-plating method. From these points, the ratio t 2 / t 1 may be, for example, 0.25 or more, 0.30 or more, 0.35 or more, 0.40 or more. Further, the ratio t 2 / t 1 may be, for example, 0.75 or less, 0.70 or less, and 0.60 or less. When the ratio t 2 / t 1 is 0.25 or more and 0.75 or less, and further 0.40 or more and 0.60 or less, the pin terminal 1 is excellent in solder wettability, insertability, and manufacturability.
条件(1)及び(2)の双方を満たすピン端子1は、基材2の一端側では先端被覆部31によってはんだ濡れ性により優れると共に、基材2の他端側では相手側端子への挿入性により優れる。
The pin terminal 1 that satisfies both the conditions (1) and (2) is more excellent in solder wettability due to the tip coating portion 31 on one end side of the base material 2, and is inserted into the mating terminal on the other end side of the base material 2. Better in sex.
基材2の大きさにもよるが、最大値t1の絶対値は、例えば1.0μm以上7.0μm以下が挙げられる。最小値t2の絶対値は、例えば0.8μm以上4.0μm以下が挙げられる。但し、t2<t1である。
Although it depends on the size of the base material 2, the absolute value of the maximum value t 1 is, for example, 1.0 μm or more and 7.0 μm or less. The absolute value of the minimum value t 2 is, for example, 0.8 μm or more and 4.0 μm or less. However, t 2 <t 1 .
最大値t1,最小値t2の具体的な位置として、基材2の断面形状が上述の長方形である場合、先端被覆部31における第一面21及び第二面22の少なくとも一方を覆う箇所が最大値t1を有することが挙げられる。また、先端被覆部31における第三面23及び第四面24の少なくとも一方を覆う箇所が最小値t2を有することが挙げられる。
As specific positions of the maximum value t 1 and the minimum value t 2 , when the cross-sectional shape of the base material 2 is the above-mentioned rectangular shape, a portion of the tip covering portion 31 that covers at least one of the first surface 21 and the second surface 22. Has a maximum value of t 1 . Further, it can be mentioned that the portion of the tip covering portion 31 that covers at least one of the third surface 23 and the fourth surface 24 has a minimum value t 2.
より具体的な形態として、図2に示すように第一面21及び第二面22にそれぞれ厚膜部35を備えると共に、第三面23及び第四面24にそれぞれ薄膜部34を備えることが挙げられる。少なくとも一方の厚膜部35が最大値t1を有する。少なくとも一方の薄膜部34が最小値t2を有する。このような薄膜部34、厚膜部35を有する先端被覆部31は、例えば多段めっき製法を利用すれば得られる。第一面21及び第二面22には、先めっき法による錫系層と後めっき法による錫系層とが形成される。つまり、厚い錫系層が形成される。この厚い錫系層が最終的に厚膜部35をなす。打ち抜きによる切断面である第三面23及び第四面24には、後めっき法による錫系層が各面に接して形成される。第三面23及び第四面24は、先めっき法による錫系層を有しない。つまり、第三面23及び第四面24には、後めっき法による薄い錫系層が各面に接して形成される。この薄い錫系層が最終的に薄膜部34をなす。
As a more specific form, as shown in FIG. 2, the first surface 21 and the second surface 22 are each provided with a thick film portion 35, and the third surface 23 and the fourth surface 24 are provided with a thin film portion 34, respectively. Can be mentioned. At least one thick film portion 35 has a maximum value t 1 . At least one thin film portion 34 has a minimum value t 2 . The tip covering portion 31 having such a thin film portion 34 and a thick film portion 35 can be obtained by using, for example, a multi-stage plating method. A tin-based layer by the pre-plating method and a tin-based layer by the post-plating method are formed on the first surface 21 and the second surface 22. That is, a thick tin-based layer is formed. This thick tin-based layer finally forms the thick film portion 35. A tin-based layer by a post-plating method is formed in contact with each surface on the third surface 23 and the fourth surface 24, which are cut surfaces by punching. The third surface 23 and the fourth surface 24 do not have a tin-based layer formed by the pre-plating method. That is, on the third surface 23 and the fourth surface 24, a thin tin-based layer formed by the post-plating method is formed in contact with each surface. This thin tin-based layer finally forms the thin film portion 34.
第一面21、第二面22にそれぞれ設けられる厚膜部35の厚さ、第三面23、第四面24にそれぞれ設けられる薄膜部34の厚さは、図2に示すように、各面に沿って均一的な厚さであることが挙げられる。各面に沿って均一的な厚さであるとは、以下の最大厚さと最小厚さとの差が0.20μm未満であることが挙げられる。ピン端子1の一端からピン端子1の長手方向に沿って、例えば1mmの地点において、各面上の先端被覆部31に対して複数の測定箇所をとる。各面の測定箇所で測定された先端被覆部31の厚さのうち、最大厚さと最小厚さとの差をとる。上記差が0.15μm以下、0.10μm以下であると、上記地点において、厚膜部35、薄膜部34はより均一的な厚さを有するといえる。厚膜部35、薄膜部34がそれぞれ均一的な厚さであれば、はんだの厚さが均一的になり易い。
As shown in FIG. 2, the thickness of the thick film portion 35 provided on the first surface 21 and the second surface 22, and the thickness of the thin film portion 34 provided on the third surface 23 and the fourth surface 24 are respectively. It can be mentioned that the thickness is uniform along the surface. The uniform thickness along each surface means that the difference between the following maximum thickness and minimum thickness is less than 0.20 μm. A plurality of measurement points are taken with respect to the tip covering portion 31 on each surface from one end of the pin terminal 1 along the longitudinal direction of the pin terminal 1, for example, at a point of 1 mm. The difference between the maximum thickness and the minimum thickness of the thickness of the tip covering portion 31 measured at the measurement points on each surface is taken. When the above difference is 0.15 μm or less and 0.10 μm or less, it can be said that the thick film portion 35 and the thin film portion 34 have a more uniform thickness at the above points. If the thick film portion 35 and the thin film portion 34 have uniform thicknesses, the thickness of the solder tends to be uniform.
第一面21上の厚膜部35の厚さと第二面22上の厚膜部35の厚さとが実質的に等しいことが挙げられる。また、第三面23上の薄膜部34の厚さと第四面24上の薄膜部34の厚さとが実質的に等しいことが挙げられる。この形態は、図2に示す断面において、ピン端子1の幅方向の二等分線及び高さ方向の二等分線をそれぞれ中心として対称な形状といえる。対称形状のピン端子1は、成形条件やめっき条件を調整し易く、製造性に優れる。
It can be mentioned that the thickness of the thick film portion 35 on the first surface 21 and the thickness of the thick film portion 35 on the second surface 22 are substantially equal. Further, it can be mentioned that the thickness of the thin film portion 34 on the third surface 23 and the thickness of the thin film portion 34 on the fourth surface 24 are substantially equal to each other. In the cross section shown in FIG. 2, this form can be said to have a symmetrical shape centered on the bisector in the width direction and the bisector in the height direction of the pin terminal 1. The symmetrically shaped pin terminal 1 is easy to adjust molding conditions and plating conditions, and is excellent in manufacturability.
第一面21から第四面24にそれぞれ設けられる錫系層30の厚さにおいて、ピン端子1の長手方向における厚さの差が小さいことが挙げられる。この形態は、先端被覆部31においてはんだが塗布される領域をピン端子1の長手方向に長く確保し易い。そのため、このピン端子1は、基材2の一端側の領域にはんだを塗布し易い。
Regarding the thickness of the tin-based layer 30 provided on the first surface 21 to the fourth surface 24, the difference in thickness in the longitudinal direction of the pin terminal 1 is small. In this form, it is easy to secure a long region in the tip covering portion 31 to which the solder is applied in the longitudinal direction of the pin terminal 1. Therefore, the pin terminal 1 can easily apply solder to the region on one end side of the base material 2.
定量的には、第一面21、第二面22、第三面23、及び第四面24において、ピン端子1の一端からピン端子1の長手方向に沿って1mmの地点と、3mmの地点と、5mmの地点とを先端被覆部31の厚さの測定箇所とする。各面の三つの測定箇所において最大厚さと最小厚さとの差をとる。四面について求めた四つの差のうち、最大値が1.0μm以下である。
Quantitatively, on the first surface 21, the second surface 22, the third surface 23, and the fourth surface 24, a point 1 mm and a point 3 mm along the longitudinal direction of the pin terminal 1 from one end of the pin terminal 1. And 5 mm are used as measurement points for the thickness of the tip covering portion 31. Take the difference between the maximum thickness and the minimum thickness at the three measurement points on each surface. Of the four differences obtained for the four surfaces, the maximum value is 1.0 μm or less.
上記差の最大値は、0.95μm以下、更に0.90μm以下、0.85μm以下、0.80μm以下でもよい。
The maximum value of the above difference may be 0.95 μm or less, further 0.90 μm or less, 0.85 μm or less, and 0.80 μm or less.
先端被覆部31が内層301と外層302とを備える場合に、薄膜部34における内層301の厚さt31は0.1μm以上が挙げられる。また、薄膜部34における外層302の厚さt32は0.5μm以上が挙げられる。
When the tip covering portion 31 includes the inner layer 301 and the outer layer 302, the thickness t 31 of the inner layer 301 in the thin film portion 34 may be 0.1 μm or more. Further, the thickness t 32 of the outer layer 302 in the thin film portion 34 is 0.5 μm or more.
内層301の厚さt31が0.1μm以上であれば、薄膜部34が基材2に接して設けられていても、内層301によって薄膜部34の表面にウィスカが発生し難い。ウィスカの数が少なければ、好ましくはウィスカが実質的に存在しなければ、隣り合うピン端子1間がウィスカによって短絡することが防止される。厚さt31は例えば0.11μm以上、0.15μm以上でもよい。更に、厚さt31が0.2μm以上であれば、ウィスカの発生がより低減される。
If the thickness t 31 of the inner layer 301 is 0.1 μm or more, whiskers are unlikely to be generated on the surface of the thin film portion 34 by the inner layer 301 even if the thin film portion 34 is provided in contact with the base material 2. If the number of whiskers is small, preferably if there are virtually no whiskers, it is possible to prevent the adjacent pin terminals 1 from being short-circuited by the whiskers. The thickness t 31 may be, for example, 0.11 μm or more and 0.15 μm or more. Further, when the thickness t 31 is 0.2 μm or more, the occurrence of whiskers is further reduced.
外層302の厚さt32が0.5μm以上であれば、基材2において薄膜部34を備える箇所、図2では第三面23、第四面24は、外層302によってはんだと良好に濡れることができる。厚さt32は例えば0.6μm以上、0.8μm以上でもよい。更に、厚さt32が1.0μm以上であれば、基材2において薄膜部34を備える箇所は、はんだとより良好に濡れることができる。
When the thickness t 32 of the outer layer 302 is 0.5 μm or more, the portion of the base material 2 provided with the thin film portion 34, that is, the third surface 23 and the fourth surface 24 in FIG. 2 are well wetted with the solder by the outer layer 302. Can be done. The thickness t 32 may be, for example, 0.6 μm or more and 0.8 μm or more. Further, when the thickness t 32 is 1.0 μm or more, the portion of the base material 2 provided with the thin film portion 34 can be better wetted with the solder.
内層301の厚さt31の上限、外層302の厚さt32の上限は特に設けない。但し、厚さt31、t32が大きいほど、めっき時間が長くなる等、製造性が低下し易い。良好な製造性の観点から、内層301の厚さt31は例えば1.0μm以下、0.8μm以下が挙げられる。外層302の厚さt32は例えば3.9μm以下、3.5μm以下が挙げられる。内層301の厚さt31が例えば0.1μm以上1.0μm以下、更に0.15μm以上0.8μm以下であれば、ピン端子1はウィスカの発生を低減できる上に、製造性にも優れる。外層302の厚さt32が例えば0.5μm以上3.9μm以下、更に1.0μm以上3.5μm以下であれば、ピン端子1ははんだ濡れ性に優れる上に、製造性にも優れる。
The upper limit of the thickness t 31 of the inner layer 301 and the upper limit of the thickness t 32 of the outer layer 302 are not particularly set. However, as the thicknesses t 31 and t 32 are larger, the plating time becomes longer and the manufacturability tends to decrease. From the viewpoint of good manufacturability, the thickness t 31 of the inner layer 301 is, for example, 1.0 μm or less and 0.8 μm or less. The thickness t 32 of the outer layer 302 is, for example, 3.9 μm or less and 3.5 μm or less. When the thickness t 31 of the inner layer 301 is, for example, 0.1 μm or more and 1.0 μm or less, and further 0.15 μm or more and 0.8 μm or less, the pin terminal 1 can reduce the occurrence of whiskers and is excellent in manufacturability. When the thickness t 32 of the outer layer 302 is, for example, 0.5 μm or more and 3.9 μm or less, and further 1.0 μm or more and 3.5 μm or less, the pin terminal 1 is excellent in solder wettability and also excellent in manufacturability.
厚膜部35における外層302の厚さは、薄膜部34における外層302の厚さt32よりも厚いこと、例えば1.0μm以上、更に1.5μm以上、2.0μm以上が挙げられる。厚膜部35における内層301の厚さは、薄膜部34における内層301の厚さt31よりも厚いこと、例えば0.20μm以上、更に0.25μm以上、0.30μm以上が挙げられる。
The thickness of the outer layer 302 in the thick film portion 35 is thicker than the thickness t 32 of the outer layer 302 in the thin film portion 34, for example, 1.0 μm or more, 1.5 μm or more, 2.0 μm or more. The thickness of the inner layer 301 in the thick film portion 35 is thicker than the thickness t 31 of the inner layer 301 in the thin film portion 34, for example, 0.20 μm or more, further 0.25 μm or more, 0.30 μm or more.
下地層300を備える場合、下地層300の厚さは、例えば0.3μm以上4.0μm以下、更に0.5μm以上2.0μm以下が挙げられる。
When the base layer 300 is provided, the thickness of the base layer 300 is, for example, 0.3 μm or more and 4.0 μm or less, and further 0.5 μm or more and 2.0 μm or less.
〈構造〉
先端被覆部31は、基材2の周方向の全周にわたって基材2と接して設けられていてもよい。この場合、薄膜部34、厚膜部35はいずれも、内層301と外層302とを備えることが好ましい。この理由は、外層302によってはんだ濡れ性に優れつつ、内層301によって先端被覆部31の任意の表面においてウィスカの発生を低減できるからである。薄膜部34の内層301の厚さt31は0.1μm以上がより好ましい。この理由は、上述のように薄膜部34においてウィスカの発生を低減できる上に、厚膜部35の内層301の厚さが厚さt31よりも厚いため、ウィスカの発生を更に低減し易いからである。 <Construction>
Thetip covering portion 31 may be provided in contact with the base material 2 over the entire circumference of the base material 2 in the circumferential direction. In this case, it is preferable that both the thin film portion 34 and the thick film portion 35 include an inner layer 301 and an outer layer 302. The reason for this is that the outer layer 302 is excellent in solder wettability, while the inner layer 301 can reduce the generation of whiskers on an arbitrary surface of the tip covering portion 31. The thickness t 31 of the inner layer 301 of the thin film portion 34 is more preferably 0.1 μm or more. The reason for this is that the generation of whiskers can be reduced in the thin film portion 34 as described above, and the thickness of the inner layer 301 of the thick film portion 35 is thicker than the thickness t 31 , so that the generation of whiskers can be further reduced. Is.
先端被覆部31は、基材2の周方向の全周にわたって基材2と接して設けられていてもよい。この場合、薄膜部34、厚膜部35はいずれも、内層301と外層302とを備えることが好ましい。この理由は、外層302によってはんだ濡れ性に優れつつ、内層301によって先端被覆部31の任意の表面においてウィスカの発生を低減できるからである。薄膜部34の内層301の厚さt31は0.1μm以上がより好ましい。この理由は、上述のように薄膜部34においてウィスカの発生を低減できる上に、厚膜部35の内層301の厚さが厚さt31よりも厚いため、ウィスカの発生を更に低減し易いからである。 <Construction>
The
先端被覆部31は、基材2の周方向の一部において基材2と接し、他部において基材2に接しないように設けられていてもよい。先端被覆部31において基材2と接しない箇所には、下地層300が設けられることが挙げられる。一例として、薄膜部34は基材2に接して設けられ、厚膜部35は基材2に接触せず、下地層300に接して設けられることが挙げられる。上述のように薄膜部34の内層301の厚さt31は0.1μm以上であれば、薄膜部34は、ウィスカの発生を低減できる。厚膜部35は、比較的厚い内層301に加えて下地層300によって、ウィスカの発生を更に低減し易い。この形態は、多段めっき製法を利用する場合に、先めっき法において純ニッケル又はニッケル合金からなる下地層300を形成した後、錫系層を形成することで製造できる。
The tip covering portion 31 may be provided so as to be in contact with the base material 2 at a part in the circumferential direction of the base material 2 and not to be in contact with the base material 2 at another portion. An underlayer 300 may be provided at a portion of the tip covering portion 31 that does not come into contact with the base material 2. As an example, the thin film portion 34 is provided in contact with the base material 2, and the thick film portion 35 is provided in contact with the base layer 300 without contacting the base material 2. As described above, if the thickness t 31 of the inner layer 301 of the thin film portion 34 is 0.1 μm or more, the thin film portion 34 can reduce the generation of whiskers. In the thick film portion 35, the generation of whiskers can be further reduced by the base layer 300 in addition to the relatively thick inner layer 301. This form can be produced by forming a base layer 300 made of pure nickel or a nickel alloy in the pre-plating method and then forming a tin-based layer when the multi-stage plating method is used.
より具体的な形態として、基材2の断面形状が上述の長方形である場合、めっき層3は先端被覆部31における第一面21及び第二面22を覆う箇所と基材2との間に下地層300を備え、上記箇所が厚膜部35であることが挙げられる。また、先端被覆部31における第三面23及び第四面24を覆う箇所は基材2に接して設けられ、上記箇所が薄膜部34であることが挙げられる。即ち、第一面21と第二面22とは、下地層300と厚膜部35とを順に備える。第三面23と第四面24とは、薄膜部34を備え、下地層300を備えていない。
As a more specific form, when the cross-sectional shape of the base material 2 is the above-mentioned rectangular shape, the plating layer 3 is located between the portion of the tip covering portion 31 that covers the first surface 21 and the second surface 22 and the base material 2. It is mentioned that the base layer 300 is provided and the above-mentioned portion is the thick film portion 35. Further, the portion of the tip covering portion 31 that covers the third surface 23 and the fourth surface 24 is provided in contact with the base material 2, and the above-mentioned portion is the thin film portion 34. That is, the first surface 21 and the second surface 22 are provided with the base layer 300 and the thick film portion 35 in this order. The third surface 23 and the fourth surface 24 include a thin film portion 34 and do not include a base layer 300.
先端被覆部31は、基材2の周方向の全周にわたって基材2に接しないように設けられていてもよい。つまり、基材2の周方向の全周にわたって下地層300が設けられ、この下地層300の上に先端被覆部31が設けられることが挙げられる。この場合、先端被覆部31の任意の表面において、下地層300によってウィスカの発生が低減される。但し、多段めっき製法を利用してこの形態を製造する場合、マスキングが必要であり、製造性が低下する。詳しくは、先めっき法によって下地層300及び錫系層を形成した後、打ち抜く。次に、基材2の周方向の一部をマスキングしてから、下地層300を形成する。その後、マスキングを除去して、基材2の全周を覆うように錫系層30を形成する。良好な製造性の観点から、下地層300は、基材2の周方向の一部に設けられることが好ましい。
The tip covering portion 31 may be provided so as not to come into contact with the base material 2 over the entire circumference in the circumferential direction of the base material 2. That is, the base layer 300 is provided over the entire circumference of the base material 2 in the circumferential direction, and the tip covering portion 31 is provided on the base layer 300. In this case, the base layer 300 reduces the generation of whiskers on any surface of the tip covering portion 31. However, when this form is manufactured by using the multi-stage plating method, masking is required and the manufacturability is lowered. Specifically, after forming the base layer 300 and the tin-based layer by the pre-plating method, punching is performed. Next, a part of the base material 2 in the circumferential direction is masked, and then the base layer 300 is formed. After that, the masking is removed to form the tin-based layer 30 so as to cover the entire circumference of the base material 2. From the viewpoint of good manufacturability, it is preferable that the base layer 300 is provided in a part of the base material 2 in the circumferential direction.
〈ウィスカ〉
先端被覆部31にはウィスカの数が少ないことが望ましい。ここでのウィスカは、錫からなる突起物であり、JIS C 60068-2-82:2009に規定される比較的長い突起物、例えば長さ10μm以上の針状の突起物である。 <Whisker>
It is desirable that thetip covering portion 31 has a small number of whiskers. The whiskers here are protrusions made of tin, and are relatively long protrusions specified in JIS C 60068-2-82: 2009, for example, needle-shaped protrusions having a length of 10 μm or more.
先端被覆部31にはウィスカの数が少ないことが望ましい。ここでのウィスカは、錫からなる突起物であり、JIS C 60068-2-82:2009に規定される比較的長い突起物、例えば長さ10μm以上の針状の突起物である。 <Whisker>
It is desirable that the
特に、先端被覆部31において相対的に薄い箇所である薄膜部34が銅を含む基材2に接していると、薄膜部34では厚膜部35に比較してウィスカが生じ易い。上述のように薄膜部34に備えられる内層301の厚さt31は、厚膜部35に備えられる内層301の厚さよりも薄くなり易いからである。定量的には、薄膜部34に存在するウィスカの数が以下の視野内に15個以下であることが挙げられる。上記視野は、一辺の長さが0.35mmである正方形の領域である。ウィスカの数の測定方法は、後述の試験例で説明する。
In particular, when the thin film portion 34, which is a relatively thin portion of the tip covering portion 31, is in contact with the base material 2 containing copper, whiskers are more likely to occur in the thin film portion 34 than in the thick film portion 35. This is because the thickness t 31 of the inner layer 301 provided in the thin film portion 34 as described above tends to be thinner than the thickness of the inner layer 301 provided in the thick film portion 35. Quantitatively, the number of whiskers present in the thin film portion 34 is 15 or less in the following field of view. The field of view is a square region having a side length of 0.35 mm. The method for measuring the number of whiskers will be described in a test example described later.
ウィスカの数が0.35mm×0.35mmの領域内に15個以下であれば、薄膜部34にウィスカの数が少ない。そのため、多数のピン端子1が近接して配置される用途等において、隣り合うピン端子1間がウィスカによって短絡することが防止される。ウィスカの数が少ないほど、上述の短絡をより確実に防止できる。上記短絡の防止の観点から、ウィスカの数は上記領域内に10個以下、5個以下、3個以下が好ましく、0個、即ちウィスカが存在しないことがより好ましい。なお、錫からなる突起物として、ノジュールと呼ばれる球状の突起物、即ち比較的短い突起物がある。ノジュールが存在するものの、上述の比較的長い突起物であるウィスカが少なければ、好ましくは存在しなければ、上記短絡が生じ難い。
If the number of whiskers is 15 or less in the region of 0.35 mm × 0.35 mm, the number of whiskers in the thin film portion 34 is small. Therefore, in an application in which a large number of pin terminals 1 are arranged close to each other, it is possible to prevent short circuits between adjacent pin terminals 1 due to whiskers. The smaller the number of whiskers, the more reliable the above-mentioned short circuit can be prevented. From the viewpoint of preventing the short circuit, the number of whiskers is preferably 10 or less, 5 or less, 3 or less, and more preferably 0, that is, no whiskers are present in the region. As the protrusion made of tin, there is a spherical protrusion called a nodule, that is, a relatively short protrusion. Although nodules are present, the short circuit is unlikely to occur if the whiskers, which are the relatively long protrusions described above, are few, preferably not present.
ウィスカの数が上記領域内に15個以下であるピン端子1は、代表的には薄膜部34に備えられる内層301の厚さt31が0.1μm以上であることが挙げられる。また、このようなピン端子1は、例えば多段めっき製法によって製造できる。
The pin terminals 1 having 15 or less whiskers in the above region typically have an inner layer 301 provided in the thin film portion 34 having a thickness t 31 of 0.1 μm or more. Further, such a pin terminal 1 can be manufactured by, for example, a multi-stage plating method.
〈濡れ力〉
先端被覆部31は、はんだ濡れ性に優れる。定量的には、メニスコグラフ試験機によって測定される先端被覆部31の最大濡れ力が0.25mN以上であることが挙げられる。最大濡れ力の測定方法は、後述の試験例で説明する。 <Wet power>
Thetip covering portion 31 is excellent in solder wettability. Quantitatively, the maximum wetting force of the tip covering portion 31 measured by the Meniscograph tester is 0.25 mN or more. The method for measuring the maximum wetting force will be described in a test example described later.
先端被覆部31は、はんだ濡れ性に優れる。定量的には、メニスコグラフ試験機によって測定される先端被覆部31の最大濡れ力が0.25mN以上であることが挙げられる。最大濡れ力の測定方法は、後述の試験例で説明する。 <Wet power>
The
最大濡れ力が0.25mN以上であれば、基材2の一端側の領域は、先端被覆部31によってはんだと良好に濡れることができ、はんだ濡れ性に優れる。最大濡れ力が大きいほど、はんだ濡れ性に優れる。良好なはんだ濡れ性の観点から、最大濡れ力は0.26mN以上、更に0.28mN以上が好ましく、0.30mN以上がより好ましい。
When the maximum wetting force is 0.25 mN or more, the region on one end side of the base material 2 can be well wetted with the solder by the tip coating portion 31, and the solder wettability is excellent. The larger the maximum wetting force, the better the solder wetting property. From the viewpoint of good solder wettability, the maximum wetting force is preferably 0.26 mN or more, more preferably 0.28 mN or more, and more preferably 0.30 mN or more.
最大濡れ力の上限は特に設けない。
There is no particular upper limit on the maximum wetting force.
最大濡れ力が0.25mN以上であるピン端子1は、代表的には基材2の一端側の領域において、基材2の周方向の全周にわたって外層302を備え、薄膜部34に備えられる外層302の厚さt32が0.5μm以上であることが挙げられる。このようなピン端子1は、例えば多段めっき製法によって製造できる。
The pin terminal 1 having a maximum wetting force of 0.25 mN or more typically includes an outer layer 302 over the entire circumference of the base material 2 in the circumferential direction in a region on one end side of the base material 2, and is provided in the thin film portion 34. It can be mentioned that the thickness t 32 of the outer layer 302 is 0.5 μm or more. Such a pin terminal 1 can be manufactured by, for example, a multi-stage plating method.
(他端側の領域)
基材2の他端側は、後端被覆部32と露出領域26とを備える。後端被覆部32と露出領域26とは、基材2の周方向の異なる位置に設けられる。露出領域26では、めっき層3が設けられず基材2が露出されている。 (Area on the other end side)
The other end side of thebase material 2 includes a rear end covering portion 32 and an exposed region 26. The rear end covering portion 32 and the exposed region 26 are provided at different positions in the circumferential direction of the base material 2. In the exposed region 26, the plating layer 3 is not provided and the base material 2 is exposed.
基材2の他端側は、後端被覆部32と露出領域26とを備える。後端被覆部32と露出領域26とは、基材2の周方向の異なる位置に設けられる。露出領域26では、めっき層3が設けられず基材2が露出されている。 (Area on the other end side)
The other end side of the
後端被覆部32は、先端被覆部31に連続しており、一体の錫系層30を構成する。但し、後端被覆部32の厚さt35と先端被覆部31の厚膜部35の厚さ、代表的には最大値t1とは、異なることが多い。この厚さの差に応じて、錫系層30は基材2の長手方向に段差を有する。
The rear end covering portion 32 is continuous with the front end covering portion 31 and constitutes an integral tin-based layer 30. However, the thickness t 35 of the rear end covering portion 32 and the thickness of the thick film portion 35 of the front end covering portion 31, typically the maximum value t 1 , are often different. Depending on this difference in thickness, the tin-based layer 30 has a step in the longitudinal direction of the base material 2.
後端被覆部32、露出領域26の具体的な位置として、基材2の断面形状が上述の長方形である場合、図3に示すように第一面21及び第二面22上に後端被覆部32を有し、第三面23及び第四面24が露出領域26であることが挙げられる。この形態は、第一面21及び第二面22において基材2の一端側の領域に先端被覆部31の厚膜部35を備え、基材2の他端側の領域に後端被覆部32を備える。また、この形態は、第三面23及び第四面24において一端側の領域に薄膜部34を備え、基材2の他端側の領域では基材2が露出されている。
As a specific position of the rear end covering portion 32 and the exposed region 26, when the cross-sectional shape of the base material 2 is the above-mentioned rectangular shape, the rear end covering is performed on the first surface 21 and the second surface 22 as shown in FIG. It has a portion 32, and the third surface 23 and the fourth surface 24 are exposed regions 26. In this form, the thick film portion 35 of the tip covering portion 31 is provided in the region on one end side of the base material 2 on the first surface 21 and the second surface 22, and the rear end covering portion 32 is provided in the region on the other end side of the base material 2. To be equipped. Further, in this form, the thin film portion 34 is provided in the region on one end side of the third surface 23 and the fourth surface 24, and the base material 2 is exposed in the region on the other end side of the base material 2.
第一面21、第二面22にそれぞれ設けられる後端被覆部32の厚さは、基材2の長手方向に均一的な厚さであることが挙げられる。長手方向に均一的な厚さであるとは、以下の最大厚さと最小厚さとの差の最大値が0.2μm未満であることが挙げられる。ピン端子1において後端被覆部32が設けられている領域のうち、ピン端子1の他端からピン端子1の長手方向に沿って1mmの地点と、3mmの地点と、5mmの地点とを後端被覆部32の厚さの測定箇所とする。各面の三つの測定箇所において最大厚さと最小厚さとの差をとる。二面について求めた二つの差のうち、最大値をとる。この最大値が0.15μm以下、更に0.1μm以下であると、後端被覆部32はより均一的な厚さを有するといえる。後端被覆部32が長手方向に均一的な厚さであれば、このピン端子1は、上述の肥大箇所を有しておらず、基材2の他端側の領域を相手側端子に挿入し易い。
The thickness of the rear end covering portion 32 provided on the first surface 21 and the second surface 22, respectively, is a uniform thickness in the longitudinal direction of the base material 2. The uniform thickness in the longitudinal direction means that the maximum value of the difference between the following maximum thickness and minimum thickness is less than 0.2 μm. In the area where the rear end covering portion 32 is provided in the pin terminal 1, a point 1 mm, a point 3 mm, and a point 5 mm are rearward along the longitudinal direction of the pin terminal 1 from the other end of the pin terminal 1. It is used as a measurement point for the thickness of the end covering portion 32. Take the difference between the maximum thickness and the minimum thickness at the three measurement points on each surface. Take the maximum value out of the two differences obtained for the two sides. When this maximum value is 0.15 μm or less and further 0.1 μm or less, it can be said that the rear end covering portion 32 has a more uniform thickness. If the rear end covering portion 32 has a uniform thickness in the longitudinal direction, the pin terminal 1 does not have the above-mentioned enlarged portion, and the region on the other end side of the base material 2 is inserted into the mating terminal. Easy to do.
第一面21、第二面22にそれぞれ設けられる後端被覆部32の厚さは、図3に示すように、各面に沿って均一的な厚さであることが挙げられる。各面に沿って均一的な厚さであるとは、以下の最大厚さと最小厚さとの差が0.20μm未満を満たすことが挙げられる。ピン端子1の他端からピン端子1の長手方向に沿って、例えば1mmの地点において各面上の後端被覆部32に対して、複数の測定箇所をとる。各面の測定箇所で測定された後端被覆部32の厚さのうち、最大厚さと最小厚さとの差をとる。上記差が0.15μm以下、0.10μm以下であると、上記地点において、後端被覆部32はより均一的な厚さを有するといえる。後端被覆部32が均一的な厚さであれば、相手側端子との接触面積を適切に確保し易く、接続抵抗が低くなり易い。
As shown in FIG. 3, the thickness of the rear end covering portion 32 provided on the first surface 21 and the second surface 22, respectively, is a uniform thickness along each surface. The uniform thickness along each surface means that the following difference between the maximum thickness and the minimum thickness satisfies less than 0.20 μm. A plurality of measurement points are taken from the other end of the pin terminal 1 along the longitudinal direction of the pin terminal 1 with respect to the rear end covering portion 32 on each surface, for example, at a point of 1 mm. The difference between the maximum thickness and the minimum thickness of the thickness of the rear end covering portion 32 measured at the measurement points on each surface is taken. When the above difference is 0.15 μm or less and 0.10 μm or less, it can be said that the rear end covering portion 32 has a more uniform thickness at the above points. If the rear end covering portion 32 has a uniform thickness, it is easy to appropriately secure a contact area with the mating terminal, and the connection resistance tends to be low.
第一面21上の後端被覆部32の厚さと第二面22上の後端被覆部32の厚さとが実質的に等しいことが挙げられる。この形態は、図3に示す断面において、ピン端子1の幅方向の二等分線及び高さ方向の二等分線をそれぞれ中心として対称な形状といえる。対称形状のピン端子1は、成形条件やめっき条件を調整し易く、製造性に優れる。
It can be mentioned that the thickness of the rear end covering portion 32 on the first surface 21 and the thickness of the rear end covering portion 32 on the second surface 22 are substantially equal. In the cross section shown in FIG. 3, this form can be said to have a symmetrical shape centered on the bisector in the width direction and the bisector in the height direction of the pin terminal 1. The symmetrically shaped pin terminal 1 is easy to adjust molding conditions and plating conditions, and is excellent in manufacturability.
多段めっき製法を利用する場合、後端被覆部32は、先めっき法によって形成される錫系層によって製造される。この錫系層の厚さは、上述のように先端被覆部31における差(t1-t2)に対応する。後端被覆部32の厚さt35が差(t1-t2)以上であれば、相手側端子との接触面積を適切に確保し易く、相手側端子との接続抵抗が低くなり易い。
When the multi-stage plating method is used, the rear end covering portion 32 is manufactured by a tin-based layer formed by the pre-plating method. The thickness of this tin-based layer corresponds to the difference (t 1 − t 2 ) in the tip covering portion 31 as described above. When the thickness t 35 of the rear end covering portion 32 is the difference (t 1 − t 2 ) or more, it is easy to appropriately secure the contact area with the mating terminal, and the connection resistance with the mating terminal is likely to be low.
後端被覆部32の具体的な厚さとして、先端被覆部31の厚膜部35の厚さ、代表的には最大値t1よりも薄いことが挙げられる。また、後端被覆部32が内層301と外層302とを備える場合、後端被覆部32の内層301の厚さtiは、薄膜部34の内層301の厚さt31よりも厚く、厚膜部35の内層301の厚さよりも薄いことが挙げられる。また、この場合、後端被覆部32の外層302の厚さtoは、薄膜部34の外層302の厚さt32よりも厚く、厚膜部35の外層302の厚さよりも薄いことが挙げられる。このようなピン端子1は、例えば多段めっき製法によって製造できる。
As a specific thickness of the rear end covering portion 32, the thickness of the thick film portion 35 of the front end covering portion 31, typically thinner than the maximum value t 1 , can be mentioned. Further, if the rear cover portion 32 comprises an inner layer 301 and outer layer 302, the thickness t i of the inner layer 301 of the rear cover portion 32 thicker than the thickness t 31 of the inner layer 301 of the thin film portion 34, a thick film It is mentioned that it is thinner than the thickness of the inner layer 301 of the portion 35. In this case, the thickness t o of the outer layer 302 of the rear cover portion 32 is thicker than the thickness t 32 of the outer layer 302 of the thin film portion 34, thinner include than the thickness of the outer layer 302 of the thick portion 35 Be done. Such a pin terminal 1 can be manufactured by, for example, a multi-stage plating method.
[コネクタ]
以下、主に図4を参照して、実施形態のコネクタ6を説明する。
実施形態のコネクタ6は、実施形態のピン端子1を備える。代表的には、コネクタ6は、複数のピン端子1と筐体60とを備える。各ピン端子1は、L字状に屈曲された状態で筐体60に保持される。 [connector]
Hereinafter, theconnector 6 of the embodiment will be described mainly with reference to FIG.
Theconnector 6 of the embodiment includes the pin terminal 1 of the embodiment. Typically, the connector 6 includes a plurality of pin terminals 1 and a housing 60. Each pin terminal 1 is held in the housing 60 in a state of being bent in an L shape.
以下、主に図4を参照して、実施形態のコネクタ6を説明する。
実施形態のコネクタ6は、実施形態のピン端子1を備える。代表的には、コネクタ6は、複数のピン端子1と筐体60とを備える。各ピン端子1は、L字状に屈曲された状態で筐体60に保持される。 [connector]
Hereinafter, the
The
筐体60は、樹脂等の電気絶縁材料からなる成形体である。筐体60は、底部と周壁部とを有する。底部には、図示しない複数の貫通孔が整列状態で設けられる。各貫通孔に各ピン端子1が圧入されることで、底部はピン端子1を保持する。底部に保持された各ピン端子1は、図4の紙面上下方向及び紙面垂直方向にそれぞれ、所定の間隔をあけて並ぶ。周壁部は、底部の周縁から立設されて環状に連続する。底部と周壁部とで囲まれる内部空間には、相手側端子を備える相手側のコネクタ、例えば後述する図5に示すコネクタ76が挿入される。なお、図4、後述する図6は、筐体60の一部を切り欠いて示す。
The housing 60 is a molded body made of an electrically insulating material such as resin. The housing 60 has a bottom portion and a peripheral wall portion. A plurality of through holes (not shown) are provided on the bottom in an aligned state. By press-fitting each pin terminal 1 into each through hole, the bottom portion holds the pin terminal 1. The pin terminals 1 held at the bottom are arranged at predetermined intervals in the vertical direction of the paper surface and the vertical direction of the paper surface of FIG. 4, respectively. The peripheral wall portion is erected from the peripheral edge of the bottom portion and is continuous in an annular shape. A mating connector having a mating terminal, for example, a connector 76 shown in FIG. 5, which will be described later, is inserted into the internal space surrounded by the bottom portion and the peripheral wall portion. Note that FIG. 4 and FIG. 6 described later are shown by cutting out a part of the housing 60.
各ピン端子1において、先端被覆部31を備える一端側の領域は筐体60外に露出される。各ピン端子1において、後端被覆部32を備える他端側の領域は筐体60の内部空間に配置される。基材2における後端被覆部32が設けられた箇所、例えば第一面21及び第二面22が図4の紙面上側、下側に配置されるように、各ピン端子1は筐体60に保持される。コネクタ76が挿入されると、後端被覆部32は、雌端子である相手側端子に接触することで電気的に接続される。
In each pin terminal 1, the area on one end side including the tip covering portion 31 is exposed to the outside of the housing 60. In each pin terminal 1, the other end region including the rear end covering portion 32 is arranged in the internal space of the housing 60. Each pin terminal 1 is attached to the housing 60 so that the portion of the base material 2 where the rear end covering portion 32 is provided, for example, the first surface 21 and the second surface 22 are arranged on the upper side and the lower side of the paper surface of FIG. Be retained. When the connector 76 is inserted, the rear end covering portion 32 is electrically connected by contacting the mating terminal which is a female terminal.
コネクタ6におけるピン端子1の数、筐体60の底部に対するピン端子1の配置位置、筐体60の形状、筐体60の構成材料等は適宜選択できる。
The number of pin terminals 1 in the connector 6, the arrangement position of the pin terminals 1 with respect to the bottom of the housing 60, the shape of the housing 60, the constituent materials of the housing 60, and the like can be appropriately selected.
[コネクタ付きワイヤーハーネス]
以下、主に図5を参照して、実施形態のコネクタ付きワイヤーハーネス7を説明する。
実施形態のコネクタ付きワイヤーハーネス7は、実施形態のコネクタ6と、ワイヤーハーネス70とを備える。ピン端子1において後端被覆部32が設けられた他端側の領域はワイヤーハーネス70が接続される。ピン端子1において先端被覆部31が設けられた一端側の領域は、回路基板80に接続される。コネクタ6によって、ワイヤーハーネス70の一端は、回路基板80に電気的に接続される。ワイヤーハーネス70の他端は、回路基板80に制御される図示しない電子機器に電気的に接続される。 [Wire harness with connector]
Hereinafter, thewire harness 7 with a connector of the embodiment will be described mainly with reference to FIG.
Thewire harness 7 with a connector of the embodiment includes the connector 6 of the embodiment and the wire harness 70. A wire harness 70 is connected to the region on the other end side of the pin terminal 1 where the rear end covering portion 32 is provided. The region of the pin terminal 1 on the one end side where the tip covering portion 31 is provided is connected to the circuit board 80. One end of the wire harness 70 is electrically connected to the circuit board 80 by the connector 6. The other end of the wire harness 70 is electrically connected to an electronic device (not shown) controlled by the circuit board 80.
以下、主に図5を参照して、実施形態のコネクタ付きワイヤーハーネス7を説明する。
実施形態のコネクタ付きワイヤーハーネス7は、実施形態のコネクタ6と、ワイヤーハーネス70とを備える。ピン端子1において後端被覆部32が設けられた他端側の領域はワイヤーハーネス70が接続される。ピン端子1において先端被覆部31が設けられた一端側の領域は、回路基板80に接続される。コネクタ6によって、ワイヤーハーネス70の一端は、回路基板80に電気的に接続される。ワイヤーハーネス70の他端は、回路基板80に制御される図示しない電子機器に電気的に接続される。 [Wire harness with connector]
Hereinafter, the
The
ワイヤーハーネス70は、一つ又は複数の電線71と、電線71の各端部に取り付けられるコネクタ74,75とを備える。電線71は、導体と、電気絶縁層とを備える。導体は、代表的には、銅やアルミニウム、これらの合金等の導電性材料から構成される。電気絶縁層は、樹脂等の電気絶縁材料から構成され、導体の外周を覆う。コネクタ74,75には、適宜な雄コネクタ、雌コネクタが利用できる。
The wire harness 70 includes one or more electric wires 71 and connectors 74 and 75 attached to each end of the electric wires 71. The electric wire 71 includes a conductor and an electrically insulating layer. The conductor is typically composed of a conductive material such as copper, aluminum, or an alloy thereof. The electrically insulating layer is made of an electrically insulating material such as resin and covers the outer periphery of the conductor. Appropriate male and female connectors can be used for the connectors 74 and 75.
コネクタ付きワイヤーハーネス7は、図5に例示するようにワイヤーハーネス70のコネクタ75と実施形態のコネクタ6との間に別のコネクタ76を備えてもよい。例えば、コネクタ75が雄コネクタであり、コネクタ76が雌コネクタであることが挙げられる。
The wire harness 7 with a connector may include another connector 76 between the connector 75 of the wire harness 70 and the connector 6 of the embodiment as illustrated in FIG. For example, the connector 75 is a male connector and the connector 76 is a female connector.
[コントロールユニット]
以下、主に図6を参照して、実施形態のコントロールユニット8を説明する。
実施形態のコントロールユニット8は、実施形態のコネクタ6、又は実施形態のコネクタ付きワイヤーハーネス7と、回路基板80とを備える。ピン端子1における先端被覆部31が設けられた一端側の領域と回路基板80とは、はんだ85によって接続される。図6に示すコントロールユニット8は、実施形態のコネクタ6を備える。実施形態のコネクタ付きワイヤーハーネス7を備えるコントロールユニット8は、図5の二点鎖線を参照するとよい。 [control unit]
Hereinafter, thecontrol unit 8 of the embodiment will be described mainly with reference to FIG.
Thecontrol unit 8 of the embodiment includes the connector 6 of the embodiment, the wire harness 7 with the connector of the embodiment, and the circuit board 80. The region on one end side of the pin terminal 1 provided with the tip covering portion 31 and the circuit board 80 are connected by solder 85. The control unit 8 shown in FIG. 6 includes the connector 6 of the embodiment. The control unit 8 including the wire harness 7 with a connector of the embodiment may refer to the alternate long and short dash line of FIG.
以下、主に図6を参照して、実施形態のコントロールユニット8を説明する。
実施形態のコントロールユニット8は、実施形態のコネクタ6、又は実施形態のコネクタ付きワイヤーハーネス7と、回路基板80とを備える。ピン端子1における先端被覆部31が設けられた一端側の領域と回路基板80とは、はんだ85によって接続される。図6に示すコントロールユニット8は、実施形態のコネクタ6を備える。実施形態のコネクタ付きワイヤーハーネス7を備えるコントロールユニット8は、図5の二点鎖線を参照するとよい。 [control unit]
Hereinafter, the
The
回路基板80は、複数のスルーホール81を備える。各スルーホール81には各ピン端子1の一端側の領域が挿入される。このピン端子1の一端側の領域とスルーホール81とがはんだ85によって導通する。なお、図6は、回路基板80の一部を切り欠いて示す。また、図6は、代表して一つのスルーホール81の断面のみを示す。
The circuit board 80 includes a plurality of through holes 81. A region on one end side of each pin terminal 1 is inserted into each through hole 81. The region on one end side of the pin terminal 1 and the through hole 81 are conducted by the solder 85. Note that FIG. 6 shows a part of the circuit board 80 cut out. Further, FIG. 6 shows only a cross section of one through hole 81 as a representative.
回路基板80は、ピン端子1の他端側の領域に接続されるワイヤーハーネス70によって、ワイヤーハーネス70のコネクタ74側に接続される電子機器を制御する。回路基板80は図示しないケースに収納される。
The circuit board 80 controls the electronic device connected to the connector 74 side of the wire harness 70 by the wire harness 70 connected to the region on the other end side of the pin terminal 1. The circuit board 80 is housed in a case (not shown).
回路基板80は、例えば、エンジンの燃料噴射及びエンジンの点火の少なくとも一方の制御を行うことが挙げられる。このような回路基板80を備えるコントロールユニット8は、エンジンコントロールユニットと呼ばれる。エンジンコントロールユニットは、多数、例えば200以上、更に250以上のピン端子1を備えることがある。エンジンコントロールユニット以外のコントロールユニット8でも、多数のピン端子1を備えることがある。
The circuit board 80 may, for example, control at least one of engine fuel injection and engine ignition. The control unit 8 provided with such a circuit board 80 is called an engine control unit. The engine control unit may include a large number, for example 200 or more, and 250 or more pin terminals 1. A control unit 8 other than the engine control unit may also have a large number of pin terminals 1.
(主な効果)
実施形態のピン端子1は、はんだ付け不良を防止できる。また、ピン端子1は、はんだ濡れ性に優れる上に、相手側端子への挿入性に優れる。このようなピン端子1は、多段めっき製法で製造すれば生産性よく製造できる。また、ピン端子1は代表的には先端被覆部31にウィスカの数が少ない。このような実施形態のピン端子1は、特に、上述の多数のピン端子1を備える用途において、以下の効果(a)~(c)を奏する。
(a)隣り合うピン端子1間がはんだつららによって短絡することが防止される。
(b)相手側端子に接続する際の挿入力が大きくなり過ぎることが抑制される。
(c)隣り合うピン端子1間がウィスカによって短絡することが防止される。 (Main effect)
Thepin terminal 1 of the embodiment can prevent soldering defects. Further, the pin terminal 1 is excellent in solder wettability and also excellent in insertability into the mating terminal. Such a pin terminal 1 can be manufactured with high productivity if it is manufactured by a multi-stage plating method. Further, the pin terminal 1 typically has a small number of whiskers on the tip covering portion 31. The pin terminal 1 of such an embodiment has the following effects (a) to (c), particularly in an application including a large number of pin terminals 1 described above.
(A) It is possible to prevent short circuits betweenadjacent pin terminals 1 due to solder icicles.
(B) It is suppressed that the insertion force when connecting to the other end terminal becomes too large.
(C) It is prevented that theadjacent pin terminals 1 are short-circuited by the whisker.
実施形態のピン端子1は、はんだ付け不良を防止できる。また、ピン端子1は、はんだ濡れ性に優れる上に、相手側端子への挿入性に優れる。このようなピン端子1は、多段めっき製法で製造すれば生産性よく製造できる。また、ピン端子1は代表的には先端被覆部31にウィスカの数が少ない。このような実施形態のピン端子1は、特に、上述の多数のピン端子1を備える用途において、以下の効果(a)~(c)を奏する。
(a)隣り合うピン端子1間がはんだつららによって短絡することが防止される。
(b)相手側端子に接続する際の挿入力が大きくなり過ぎることが抑制される。
(c)隣り合うピン端子1間がウィスカによって短絡することが防止される。 (Main effect)
The
(A) It is possible to prevent short circuits between
(B) It is suppressed that the insertion force when connecting to the other end terminal becomes too large.
(C) It is prevented that the
実施形態のコネクタ6、実施形態のコネクタ付きワイヤーハーネス7、実施形態のコントロールユニット8は、実施形態のピン端子1を備えるため、はんだ付け不良を防止できる。また、コネクタ6、コネクタ付きワイヤーハーネス7、コントロールユニット8は、はんだ濡れ性に優れる上に、相手側端子への挿入性に優れる。更に、コネクタ6、コネクタ付きワイヤーハーネス7、コントロールユニット8は、代表的には先端被覆部31にウィスカの数が少ない。このような実施形態のコネクタ6、実施形態のコネクタ付きワイヤーハーネス7、実施形態のコントロールユニット8は、特に、コネクタ6が多数、例えば200以上、更に250以上のピン端子1を備える場合、上述の(a)~(c)の効果を奏する。
Since the connector 6 of the embodiment, the wire harness 7 with the connector of the embodiment, and the control unit 8 of the embodiment include the pin terminal 1 of the embodiment, it is possible to prevent soldering defects. Further, the connector 6, the wire harness 7 with a connector, and the control unit 8 are excellent in solder wettability and also excellent in insertability into the terminal on the other side. Further, the connector 6, the wire harness 7 with a connector, and the control unit 8 typically have a small number of whiskers on the tip covering portion 31. The connector 6 of the embodiment, the wire harness 7 with the connector of the embodiment, and the control unit 8 of the embodiment are described above when the number of the connectors 6 is large, for example, 200 or more, and 250 or more pin terminals 1. The effects of (a) to (c) are exhibited.
(ピン端子の製造方法)
以下、図7を適宜参照して、ピン端子の製造方法の一例を説明する。
実施形態のピン端子1は、例えば、以下のように製造することが挙げられる。まず、いわゆる先めっき法によってめっき付き基材を成形する。得られためっき付き基材の一端側の領域にのみ、めっきによって錫系層を形成する。基材の他端側の領域には錫系層を形成しない。このめっき後に特定の条件で熱処理を施す。 (Manufacturing method of pin terminals)
Hereinafter, an example of a method for manufacturing a pin terminal will be described with reference to FIG. 7 as appropriate.
Thepin terminal 1 of the embodiment may be manufactured as follows, for example. First, a plated base material is molded by a so-called pre-plating method. A tin-based layer is formed by plating only in the region on one end side of the obtained plated base material. A tin-based layer is not formed in the region on the other end side of the base material. After this plating, heat treatment is performed under specific conditions.
以下、図7を適宜参照して、ピン端子の製造方法の一例を説明する。
実施形態のピン端子1は、例えば、以下のように製造することが挙げられる。まず、いわゆる先めっき法によってめっき付き基材を成形する。得られためっき付き基材の一端側の領域にのみ、めっきによって錫系層を形成する。基材の他端側の領域には錫系層を形成しない。このめっき後に特定の条件で熱処理を施す。 (Manufacturing method of pin terminals)
Hereinafter, an example of a method for manufacturing a pin terminal will be described with reference to FIG. 7 as appropriate.
The
上記の製造方法、即ち多段めっき製法は、以下の知見に基づくものである。
先めっき法では、錫系層の厚さが均一的になり易い。しかし、先めっき法で得られる成形体では、打ち抜きによる切断面が生じる。切断面は、基材が露出された面であり、錫系層を有さない。この基材の露出部分によって、上記成形体は、はんだ濡れ性に劣る。 The above manufacturing method, that is, the multi-stage plating manufacturing method is based on the following findings.
In the pre-plating method, the thickness of the tin-based layer tends to be uniform. However, in the molded product obtained by the pre-plating method, a cut surface is generated by punching. The cut surface is a surface on which the base material is exposed and does not have a tin-based layer. Due to the exposed portion of the base material, the molded product is inferior in solder wettability.
先めっき法では、錫系層の厚さが均一的になり易い。しかし、先めっき法で得られる成形体では、打ち抜きによる切断面が生じる。切断面は、基材が露出された面であり、錫系層を有さない。この基材の露出部分によって、上記成形体は、はんだ濡れ性に劣る。 The above manufacturing method, that is, the multi-stage plating manufacturing method is based on the following findings.
In the pre-plating method, the thickness of the tin-based layer tends to be uniform. However, in the molded product obtained by the pre-plating method, a cut surface is generated by punching. The cut surface is a surface on which the base material is exposed and does not have a tin-based layer. Due to the exposed portion of the base material, the molded product is inferior in solder wettability.
上記成形体のうち、例えば上記切断面を含めて基材の一端側の領域のみを覆うように錫めっき層を更に形成すれば、はんだ濡れ性が高くなる。但し、基材の直上に設けられた錫めっき層の表面にウィスカが生じ易い。
If the tin plating layer is further formed so as to cover only the region on one end side of the base material including the cut surface of the molded body, the solder wettability is improved. However, whiskers are likely to occur on the surface of the tin-plated layer provided directly above the base material.
例えば上記成形体に施す二回目のめっき後にリフロー処理を施せば、ウィスカの発生が低減される。しかし、リフロー処理によって、基材の他端側に存在する先めっき法による錫系層、特に純錫層が溶融する。
For example, if a reflow treatment is performed after the second plating applied to the molded product, the generation of whiskers can be reduced. However, the reflow treatment melts the tin-based layer by the pre-plating method existing on the other end side of the base material, particularly the pure tin layer.
ここで、従来、錫めっき後のリフロー処理では、特許文献1に記載されるように錫の融点を超える温度、例えば300℃~400℃程度が利用されている。上述の純錫層の溶融によって、基材の他端側では、錫系層に局所的に厚い箇所、即ち肥大箇所が生じて、相手側端子への挿入性が低下する。
Here, conventionally, in the reflow treatment after tin plating, a temperature exceeding the melting point of tin, for example, about 300 ° C. to 400 ° C. is used as described in Patent Document 1. Due to the melting of the pure tin layer described above, on the other end side of the base material, a thick portion, that is, an enlarged portion is locally generated in the tin-based layer, and the insertability into the mating terminal is lowered.
一方、上記二回目のめっき後に特定の条件で熱処理を施せば、基材の各端部において、上記の溶融を防止して肥大箇所の発生を低減しつつ、ウィスカの数が効果的に低減される。
On the other hand, if heat treatment is performed under specific conditions after the second plating, the number of whiskers is effectively reduced at each end of the base material while preventing the above-mentioned melting and reducing the occurrence of enlarged portions. To.
多段めっき製法は、例えば、以下の工程を備えることが挙げられる。
〈成形工程〉めっき付き板91を所定の形状に打ち抜いて、複数の棒状部920が並列された成形材92を作製する。めっき付き板91は、錫を含む金属から構成される錫系層を備える。
〈二次めっき工程〉各棒状部920の一端側の領域に、二次めっき層931を形成する。二次めっき層931は、純錫から構成される純錫層を備える。
〈熱処理工程〉二次めっき層931を備える部分めっき材93に熱処理を施す。
熱処理温度は、錫の融点未満である。錫の融点は、約232℃である。 The multi-stage plating method may include, for example, the following steps.
<Molding Step> The platedplate 91 is punched into a predetermined shape to produce a molding material 92 in which a plurality of rod-shaped portions 920 are arranged in parallel. The plated plate 91 includes a tin-based layer made of a metal containing tin.
<Secondary Plating Step> Asecondary plating layer 931 is formed in a region on one end side of each rod-shaped portion 920. The secondary plating layer 931 includes a pure tin layer composed of pure tin.
<Heat treatment step> Thepartial plating material 93 including the secondary plating layer 931 is heat-treated.
The heat treatment temperature is below the melting point of tin. The melting point of tin is about 232 ° C.
〈成形工程〉めっき付き板91を所定の形状に打ち抜いて、複数の棒状部920が並列された成形材92を作製する。めっき付き板91は、錫を含む金属から構成される錫系層を備える。
〈二次めっき工程〉各棒状部920の一端側の領域に、二次めっき層931を形成する。二次めっき層931は、純錫から構成される純錫層を備える。
〈熱処理工程〉二次めっき層931を備える部分めっき材93に熱処理を施す。
熱処理温度は、錫の融点未満である。錫の融点は、約232℃である。 The multi-stage plating method may include, for example, the following steps.
<Molding Step> The plated
<Secondary Plating Step> A
<Heat treatment step> The
The heat treatment temperature is below the melting point of tin. The melting point of tin is about 232 ° C.
以下、多段めっき製法を工程ごとに説明する。
〈成形工程〉
成形工程は、いわゆる先めっき法によって成形材92を製造する工程である。 Hereinafter, the multi-stage plating manufacturing method will be described for each process.
<Molding process>
The molding step is a step of manufacturing themolding material 92 by a so-called pre-plating method.
〈成形工程〉
成形工程は、いわゆる先めっき法によって成形材92を製造する工程である。 Hereinafter, the multi-stage plating manufacturing method will be described for each process.
<Molding process>
The molding step is a step of manufacturing the
《めっき付き板》
成形工程において用いるめっき付き板91は、素材板90と図示しない一次めっき層とを備える。図7は、素材板90、めっき付き板91として、コイル状に巻き取られた長尺な板材を示す。 《Plated plate》
The platedplate 91 used in the molding process includes a material plate 90 and a primary plating layer (not shown). FIG. 7 shows a long plate material wound into a coil as the material plate 90 and the plated plate 91.
成形工程において用いるめっき付き板91は、素材板90と図示しない一次めっき層とを備える。図7は、素材板90、めっき付き板91として、コイル状に巻き取られた長尺な板材を示す。 《Plated plate》
The plated
素材板90の構成材料は、純銅又は銅合金である。純銅及び銅合金の詳細は、上述の(基材)〈組成〉の項を参照するとよい。
The constituent material of the material plate 90 is pure copper or a copper alloy. For details of pure copper and copper alloy, refer to the above-mentioned (base material) <composition> section.
一次めっき層は、素材板90の表裏面に設けられる。一次めっき層は、錫系層のみでもよいし、錫系層以外のめっき層を含んでもよい。錫系層は、純錫層のみでも、純錫層と合金層とを含んでもよい。合金層は、錫と銅とを含む合金から構成される。なお、純錫層の一部は、後述の熱処理によって合金層に変化し得る。錫系層以外のめっき層は、例えば、錫系層と素材板90との間に設けられる下地層300が挙げられる。下地層300の詳細は、上述の(めっき層)〈組成〉の項を参照するとよい。
The primary plating layer is provided on the front and back surfaces of the material plate 90. The primary plating layer may be only a tin-based layer or may include a plating layer other than the tin-based layer. The tin-based layer may include only a pure tin layer, or may include a pure tin layer and an alloy layer. The alloy layer is composed of an alloy containing tin and copper. A part of the pure tin layer can be transformed into an alloy layer by the heat treatment described later. Examples of the plating layer other than the tin-based layer include a base layer 300 provided between the tin-based layer and the material plate 90. For details of the base layer 300, refer to the above-mentioned (plating layer) <composition> section.
一次めっき層中の錫系層の厚さは、上述の差(t1-t2)に概ね相当する。そのため、差(t1-t2)が所定の範囲となるように、一次めっき層中の錫系層の厚さを調整する。一次めっき層中の錫系層の厚さは例えば0.20μm以上5.0μm以下が挙げられる。
The thickness of the tin-based layer in the primary plating layer roughly corresponds to the above-mentioned difference (t 1- t 2). Therefore, the thickness of the tin-based layer in the primary plating layer is adjusted so that the difference (t 1 to t 2) is within a predetermined range. The thickness of the tin-based layer in the primary plating layer is, for example, 0.20 μm or more and 5.0 μm or less.
一次めっき層が下地層300を備える場合、下地層300の厚さが例えば上述の所定の範囲となるように、一次めっき条件を調整する。
When the primary plating layer includes the base layer 300, the primary plating conditions are adjusted so that the thickness of the base layer 300 is, for example, within the above-mentioned predetermined range.
めっき付き板91は、公知の製造方法によって製造することが挙げられる。一次めっき層は、各種のめっき法、代表的には電気めっき法によって形成することが挙げられる。
The plated plate 91 may be manufactured by a known manufacturing method. The primary plating layer may be formed by various plating methods, typically an electroplating method.
《成形材》
成形材92は、複数の棒状部920と連結部925とを備える。
複数の棒状部920は、各棒状部920の軸が平行するように、所定の間隔をあけて並列される。各棒状部920において隣り合う棒状部920に向かい合う箇所では、連結部925の形成箇所を除いて、素材板90が露出される。各棒状部920の表裏面は、一次めっき層を備える。代表的には、各棒状部920において、各棒状部920の軸に直交する平面で切断した断面形状は、図2,図3に示す長方形状が挙げられる。 << Molding material >>
Themolding material 92 includes a plurality of rod-shaped portions 920 and a connecting portion 925.
The plurality of rod-shapedportions 920 are arranged in parallel at predetermined intervals so that the axes of the rod-shaped portions 920 are parallel to each other. At the portion of each rod-shaped portion 920 facing the adjacent rod-shaped portions 920, the material plate 90 is exposed except for the portion where the connecting portion 925 is formed. The front and back surfaces of each rod-shaped portion 920 are provided with a primary plating layer. Typically, in each rod-shaped portion 920, the cross-sectional shape cut by a plane orthogonal to the axis of each rod-shaped portion 920 includes the rectangular shape shown in FIGS. 2 and 3.
成形材92は、複数の棒状部920と連結部925とを備える。
複数の棒状部920は、各棒状部920の軸が平行するように、所定の間隔をあけて並列される。各棒状部920において隣り合う棒状部920に向かい合う箇所では、連結部925の形成箇所を除いて、素材板90が露出される。各棒状部920の表裏面は、一次めっき層を備える。代表的には、各棒状部920において、各棒状部920の軸に直交する平面で切断した断面形状は、図2,図3に示す長方形状が挙げられる。 << Molding material >>
The
The plurality of rod-shaped
連結部925は、隣り合う棒状部920を接続する。代表的には、連結部925は、棒状部920の長手方向の中心位置及びその近傍に設けられる。
The connecting portion 925 connects adjacent rod-shaped portions 920. Typically, the connecting portion 925 is provided at or near the center position in the longitudinal direction of the rod-shaped portion 920.
成形材92は、公知のプレス成形法によって製造することが挙げられる。上述の断面形状が長方形状であれば、打ち抜き加工によって成形材92を容易に成形することができる。
The molding material 92 may be manufactured by a known press molding method. If the above-mentioned cross-sectional shape is rectangular, the molding material 92 can be easily molded by punching.
〈二次めっき工程〉
二次めっき工程は、先めっき法による成形材92に対して、部分的にめっきを施して二次めっき層931を形成する工程、即ち部分的な後めっき法を行う工程である。 <Secondary plating process>
The secondary plating step is a step of partially plating themolding material 92 by the pre-plating method to form the secondary plating layer 931, that is, a step of performing a partial post-plating method.
二次めっき工程は、先めっき法による成形材92に対して、部分的にめっきを施して二次めっき層931を形成する工程、即ち部分的な後めっき法を行う工程である。 <Secondary plating process>
The secondary plating step is a step of partially plating the
詳しくは、成形材92において各棒状部920の一端側の領域に二次めっき層931を形成する。各棒状部920の他端側の領域には二次めっき層931を形成しない。そのため、各棒状部920の他端側の領域では、素材板90が露出された領域と、一次めっき層を備える領域とが各棒状部920の周方向の異なる位置に存在する。
Specifically, in the molding material 92, the secondary plating layer 931 is formed in the region on one end side of each rod-shaped portion 920. The secondary plating layer 931 is not formed in the region on the other end side of each rod-shaped portion 920. Therefore, in the region on the other end side of each rod-shaped portion 920, the region where the material plate 90 is exposed and the region provided with the primary plating layer exist at different positions in the circumferential direction of each rod-shaped portion 920.
二次めっき層931は、各棒状部920の一端側の領域において、各棒状部920の周方向の全周を覆うように形成する。その結果、各棒状部920の一端側の領域では、二次めっき層931は、素材板90が露出された領域に接して設けられる第一被覆箇所と、素材板90ではなく一次めっき層に接して設けられる第二被覆箇所とを備える。第一被覆箇所と第二被覆箇所とは、各棒状部920の周方向の異なる位置に存在する。
The secondary plating layer 931 is formed so as to cover the entire circumference of each rod-shaped portion 920 in the circumferential direction in the region on one end side of each rod-shaped portion 920. As a result, in the region on one end side of each rod-shaped portion 920, the secondary plating layer 931 is in contact with the first coating portion provided in contact with the exposed region of the material plate 90 and the primary plating layer instead of the material plate 90. It is provided with a second covering portion provided in the above. The first coated portion and the second coated portion exist at different positions in the circumferential direction of each rod-shaped portion 920.
第一被覆箇所は、最終的に上述の薄膜部34を構成する。第一被覆箇所は、二次めっき層931を備え、かつ一次めっき層を備えていないため、上述の最小値t2を有し易い。
The first coated portion finally constitutes the above-mentioned thin film portion 34. Since the first coating portion includes the secondary plating layer 931 and does not include the primary plating layer, it tends to have the above-mentioned minimum value t 2 .
第二被覆箇所は、最終的に上述の厚膜部35を構成する。第二被覆箇所は、一次めっき層の錫系層と二次めっき層931中の純錫層とを備えるため、上述の最大値t1を有し易い。
The second coated portion finally constitutes the above-mentioned thick film portion 35. Since the second coating portion includes the tin-based layer of the primary plating layer and the pure tin layer in the secondary plating layer 931, it tends to have the above-mentioned maximum value t 1.
二次めっき層931中の純錫層の厚さは、代表的には上述の最小値t2に概ね相当する。そのため、最小値t2が所定の範囲となるように、二次めっき層931中の純錫層の厚さを調整する。二次めっき層931中の純錫層の厚さは例えば0.8μm以上4.0μm以下が挙げられる。
The thickness of the pure tin layer in the secondary plating layer 931 typically corresponds to the above-mentioned minimum value t 2. Therefore, the thickness of the pure tin layer in the secondary plating layer 931 is adjusted so that the minimum value t 2 is within a predetermined range. The thickness of the pure tin layer in the secondary plating layer 931 is, for example, 0.8 μm or more and 4.0 μm or less.
二次めっき層931は、各種のめっき法、代表的には電気めっき法によって形成することが挙げられる。二次めっき層931の形成前に、脱脂、酸洗浄等の前処理を行うことが挙げられる。
The secondary plating layer 931 may be formed by various plating methods, typically an electroplating method. Prior to the formation of the secondary plating layer 931, pretreatment such as degreasing and acid cleaning may be performed.
〈熱処理工程〉
熱処理工程は、部分めっき材93の一端側の領域に存在する二次めっき層931中の純錫層の一部を合金化するための熱処理を行う工程である。合金化によって、錫と銅とを含む合金からなる層が形成されることで、錫系層30の表面にウィスカが発生することを低減することができる。特に、この熱処理は、部分めっき材93の他端側の領域に存在する一次めっき層中の純錫層が溶融され難いように、熱処理温度を錫の融点以下とする。 <Heat treatment process>
The heat treatment step is a step of performing a heat treatment for alloying a part of the pure tin layer in thesecondary plating layer 931 existing in the region on one end side of the partial plating material 93. By forming a layer made of an alloy containing tin and copper by alloying, it is possible to reduce the generation of whiskers on the surface of the tin-based layer 30. In particular, in this heat treatment, the heat treatment temperature is set to be equal to or lower than the melting point of tin so that the pure tin layer in the primary plating layer existing in the region on the other end side of the partial plating material 93 is hard to be melted.
熱処理工程は、部分めっき材93の一端側の領域に存在する二次めっき層931中の純錫層の一部を合金化するための熱処理を行う工程である。合金化によって、錫と銅とを含む合金からなる層が形成されることで、錫系層30の表面にウィスカが発生することを低減することができる。特に、この熱処理は、部分めっき材93の他端側の領域に存在する一次めっき層中の純錫層が溶融され難いように、熱処理温度を錫の融点以下とする。 <Heat treatment process>
The heat treatment step is a step of performing a heat treatment for alloying a part of the pure tin layer in the
定量的には、熱処理温度は230℃未満である。熱処理温度が低いほど、上述の溶融が防止され易い。また、熱処理後において、純錫からなる層が厚く残存し易い。結果として、はんだ濡れ性に優れる錫系層30が得られる。熱処理温度が高いほど、合金化が促進され、上記合金から構成される層が厚くなり易い。結果として、錫系層30においてウィスカの発生が低減され易い。溶融の防止、及び良好なはんだ濡れ性の観点から、熱処理温度は225℃以下、220℃以下が好ましい。ウィスカの発生の低減の観点から、熱処理温度は150℃以上が好ましく、180℃超、190℃以上、200℃以上がより好ましい。
Quantitatively, the heat treatment temperature is less than 230 ° C. The lower the heat treatment temperature, the easier it is to prevent the above-mentioned melting. Further, after the heat treatment, the layer made of pure tin tends to remain thick. As a result, a tin-based layer 30 having excellent solder wettability can be obtained. The higher the heat treatment temperature, the more the alloying is promoted, and the thicker the layer composed of the alloy is likely to be. As a result, the generation of whiskers is likely to be reduced in the tin-based layer 30. From the viewpoint of preventing melting and good solder wettability, the heat treatment temperature is preferably 225 ° C. or lower and 220 ° C. or lower. From the viewpoint of reducing the generation of whiskers, the heat treatment temperature is preferably 150 ° C. or higher, more preferably 180 ° C. or higher, 190 ° C. or higher, and 200 ° C. or higher.
熱処理温度の保持時間は、棒状部920の大きさ等に応じて適宜選択できる。例えば、保持時間は5秒以上60秒以下が挙げられる。所定の保持時間が経過したら、加熱をやめて、熱処理工程を終了する。
The heat treatment temperature holding time can be appropriately selected according to the size of the rod-shaped portion 920 and the like. For example, the holding time is 5 seconds or more and 60 seconds or less. When the predetermined holding time has elapsed, the heating is stopped and the heat treatment step is completed.
熱処理工程を経て得られる熱処理材94は、棒状部920の一端側の領域に、二次めっき層931から製造された熱処理層941を備える。熱処理層941は、上述の合金から構成される層と、この合金層に接して設けられる純錫から構成される層とを備える。即ち、熱処理層941は、上述の内層301と外層302とを備える錫系層30に相当する。上記合金層の少なくとも一部は、素材板90に接して設けられる。
The heat treatment material 94 obtained through the heat treatment step includes a heat treatment layer 941 manufactured from the secondary plating layer 931 in a region on one end side of the rod-shaped portion 920. The heat treatment layer 941 includes a layer made of the above-mentioned alloy and a layer made of pure tin provided in contact with the alloy layer. That is, the heat treatment layer 941 corresponds to the tin-based layer 30 including the above-mentioned inner layer 301 and outer layer 302. At least a part of the alloy layer is provided in contact with the material plate 90.
〈その他の工程〉
熱処理材94に対して、連結部925を切断し、隣り合う棒状部920を切り離すことで、実施形態のピン端子1が得られる。棒状部920の一端側の熱処理層941は、先端被覆部31を構成する。棒状部920の他端側の領域において、錫系層は、後端被覆部32を構成し、素材板90が露出された領域は、図3に示す露出領域26を構成する。 <Other processes>
Thepin terminal 1 of the embodiment is obtained by cutting the connecting portion 925 with respect to the heat treatment material 94 and separating the adjacent rod-shaped portions 920. The heat treatment layer 941 on one end side of the rod-shaped portion 920 constitutes the tip covering portion 31. In the region on the other end side of the rod-shaped portion 920, the tin-based layer constitutes the rear end covering portion 32, and the region where the material plate 90 is exposed constitutes the exposed region 26 shown in FIG.
熱処理材94に対して、連結部925を切断し、隣り合う棒状部920を切り離すことで、実施形態のピン端子1が得られる。棒状部920の一端側の熱処理層941は、先端被覆部31を構成する。棒状部920の他端側の領域において、錫系層は、後端被覆部32を構成し、素材板90が露出された領域は、図3に示す露出領域26を構成する。 <Other processes>
The
[試験例1]
種々の製造条件で、基材の表面の少なくとも一部を覆う錫系層を備えるピン端子を作製して、はんだ付けの良否、錫系層の厚さ、はんだ濡れ性、錫の突起物の数を調べた。 [Test Example 1]
Under various manufacturing conditions, pin terminals having a tin-based layer covering at least a part of the surface of the base material were prepared, and the quality of soldering, the thickness of the tin-based layer, the solder wettability, and the number of tin protrusions were examined. It was.
種々の製造条件で、基材の表面の少なくとも一部を覆う錫系層を備えるピン端子を作製して、はんだ付けの良否、錫系層の厚さ、はんだ濡れ性、錫の突起物の数を調べた。 [Test Example 1]
Under various manufacturing conditions, pin terminals having a tin-based layer covering at least a part of the surface of the base material were prepared, and the quality of soldering, the thickness of the tin-based layer, the solder wettability, and the number of tin protrusions were examined. It was.
(試料No.1~No.4,No.50)
試料No.1~No.4,No.50のピン端子は、上述の多段めっき製法を用いて製造した試料である。試料ごとに、3以上のサンプルを用意した。 (Samples No. 1 to No. 4, No. 50)
Sample No. 1 to No. 4, No. The pin terminal of 50 is a sample manufactured by using the above-mentioned multi-stage plating method. Three or more samples were prepared for each sample.
試料No.1~No.4,No.50のピン端子は、上述の多段めっき製法を用いて製造した試料である。試料ごとに、3以上のサンプルを用意した。 (Samples No. 1 to No. 4, No. 50)
Sample No. 1 to No. 4, No. The pin terminal of 50 is a sample manufactured by using the above-mentioned multi-stage plating method. Three or more samples were prepared for each sample.
製造過程の概略を述べると、一次めっき層が形成されためっき付き板を所定の形状に打ち抜いて、複数の棒状部と連結部とを有する成形材を作製する。成形材において、並列される各棒状部の一端側の領域に、各棒状部の周方向の全周を覆うように二次めっき層を形成する。二次めっき後、試料No.1を除いて熱処理を施す。熱処理後、隣り合う棒状部をつなぐ連結部を切断することで、ピン端子が得られる。試料No.1は、二次めっき後、熱処理を施さずに連結部を切断した。
To outline the manufacturing process, a plated plate on which a primary plating layer is formed is punched into a predetermined shape to produce a molding material having a plurality of rod-shaped portions and connecting portions. In the molding material, a secondary plating layer is formed in a region on one end side of each rod-shaped portion to be parallel so as to cover the entire circumference of each rod-shaped portion in the circumferential direction. After secondary plating, sample No. Heat treatment is performed except for 1. After the heat treatment, a pin terminal can be obtained by cutting the connecting portion connecting the adjacent rod-shaped portions. Sample No. In No. 1, after the secondary plating, the connecting portion was cut without performing heat treatment.
めっき付き板は、銅合金板の表裏面に錫系層を備え、下地層といった錫系層以外の層を備えていない。錫系層は、錫と銅とを含む合金層を銅合金板側に備え、合金層の上に純錫層を備える。
The plated plate has a tin-based layer on the front and back surfaces of the copper alloy plate, and does not have a layer other than the tin-based layer such as a base layer. The tin-based layer includes an alloy layer containing tin and copper on the copper alloy plate side, and a pure tin layer on the alloy layer.
銅合金板は、JIS合金番号C2600の黄銅から構成される板と、JIS合金番号C1940のリン青銅から構成される板とを用意した。
As the copper alloy plate, a plate composed of brass of JIS alloy number C2600 and a plate composed of phosphor bronze of JIS alloy number C1940 were prepared.
銅合金板は、0.64mmの厚さを有するものを用意した。
A copper alloy plate having a thickness of 0.64 mm was prepared.
二次めっき層は、純錫層であり、下地層といった純錫層以外の層を含まない。
The secondary plating layer is a pure tin layer and does not include layers other than the pure tin layer such as the base layer.
各試料のピン端子は、棒状の基材と、基材の所定の領域を覆う錫系層とを備え、基材の一部が露出されている。各ピン端子の各端部側の領域を基材の長手方向に直交する平面で切断した断面において、基材の断面形状は正方形状である。ここでは、上記断面において正方形の一辺の長さが0.64mmである。このピン端子を0.64型と呼ぶ。
The pin terminal of each sample includes a rod-shaped base material and a tin-based layer covering a predetermined area of the base material, and a part of the base material is exposed. In the cross section obtained by cutting the region on each end side of each pin terminal with a plane orthogonal to the longitudinal direction of the base material, the cross-sectional shape of the base material is square. Here, the length of one side of the square in the cross section is 0.64 mm. This pin terminal is called a 0.64 type.
上述の断面において、基材の外周面は、正方形の各面を構成する第一面、第二面、第三面、第四面を備える。
第一面は、打ち抜き加工時にパンチが押し付けられる面、いわゆるダレ面である。
第二面は、第一面に向かい合う面であり、いわゆるバリ面である。
第三面、第四面は、互いに向かい合う面であると共に、第一面及び第二面に直交する面である。第三面、第四面は、打ち抜き加工によって生じる切断面である。 In the above-mentioned cross section, the outer peripheral surface of the base material includes a first surface, a second surface, a third surface, and a fourth surface constituting each surface of the square.
The first surface is a surface on which a punch is pressed during punching, a so-called sagging surface.
The second surface is the surface facing the first surface, which is the so-called burr surface.
The third and fourth surfaces are surfaces that face each other and are orthogonal to the first and second surfaces. The third and fourth surfaces are cut surfaces produced by punching.
第一面は、打ち抜き加工時にパンチが押し付けられる面、いわゆるダレ面である。
第二面は、第一面に向かい合う面であり、いわゆるバリ面である。
第三面、第四面は、互いに向かい合う面であると共に、第一面及び第二面に直交する面である。第三面、第四面は、打ち抜き加工によって生じる切断面である。 In the above-mentioned cross section, the outer peripheral surface of the base material includes a first surface, a second surface, a third surface, and a fourth surface constituting each surface of the square.
The first surface is a surface on which a punch is pressed during punching, a so-called sagging surface.
The second surface is the surface facing the first surface, which is the so-called burr surface.
The third and fourth surfaces are surfaces that face each other and are orthogonal to the first and second surfaces. The third and fourth surfaces are cut surfaces produced by punching.
試料No.1~No.4,No.50のピン端子において、基材の一端側の領域は基材の周方向の全て、ここでは第一面から第四面を覆う錫系層を備える。基材の一端側では、基材が露出していない。基材の他端側の領域は、基材の周方向の一部、ここでは第一面及び第二面を覆う錫系層を備える。基材の周方向の他部、ここでは第三面及び第四面は、錫系層を含むめっき層が設けられておらず露出されている。基材の一端側の錫系層、及び他端側の錫系層はいずれも、純錫から構成される外層と、錫と銅とを含む合金から構成される内層とを備える。
Sample No. 1 to No. 4, No. In the pin terminal of 50, the region on one end side of the base material includes a tin-based layer covering all the circumferential directions of the base material, here, the first surface to the fourth surface. The base material is not exposed on one end side of the base material. The region on the other end side of the base material includes a tin-based layer covering a part of the base material in the circumferential direction, here, the first surface and the second surface. The other part in the circumferential direction of the base material, here, the third surface and the fourth surface, is exposed without a plating layer including a tin-based layer. Both the tin-based layer on one end side and the tin-based layer on the other end side of the base material include an outer layer made of pure tin and an inner layer made of an alloy containing tin and copper.
〈端子サイズと基材の組成〉
試料No.1~No.4,No.50は、0.64型のピン端子であり、銅合金板がリン青銅板であるめっき付き板を用いて作製した。即ち、試料No.1~No.4,No.50の基材はいずれも、銅合金中のZnの含有量が20質量%以下であるリン青銅から構成される。
試料No.3-1として、銅合金板が黄銅板であることを除いて、試料No.3と同様にして作製したものを用意した。即ち、試料No.3-1の基材は、銅合金中のZnの含有量が20%超である黄銅から構成される。 <Terminal size and base material composition>
Sample No. 1 to No. 4, No.Reference numeral 50 denotes a 0.64 type pin terminal, which was manufactured by using a plated plate in which the copper alloy plate is a phosphor bronze plate. That is, the sample No. 1 to No. 4, No. Each of the 50 substrates is composed of phosphor bronze having a Zn content of 20% by mass or less in the copper alloy.
Sample No. As 3-1 except that the copper alloy plate is a brass plate, the sample No. A product prepared in the same manner as in No. 3 was prepared. That is, the sample No. The base material of 3-1 is composed of brass having a Zn content of more than 20% in the copper alloy.
試料No.1~No.4,No.50は、0.64型のピン端子であり、銅合金板がリン青銅板であるめっき付き板を用いて作製した。即ち、試料No.1~No.4,No.50の基材はいずれも、銅合金中のZnの含有量が20質量%以下であるリン青銅から構成される。
試料No.3-1として、銅合金板が黄銅板であることを除いて、試料No.3と同様にして作製したものを用意した。即ち、試料No.3-1の基材は、銅合金中のZnの含有量が20%超である黄銅から構成される。 <Terminal size and base material composition>
Sample No. 1 to No. 4, No.
Sample No. As 3-1 except that the copper alloy plate is a brass plate, the sample No. A product prepared in the same manner as in No. 3 was prepared. That is, the sample No. The base material of 3-1 is composed of brass having a Zn content of more than 20% in the copper alloy.
〈熱処理条件〉
試料No.1は、二次めっき後に熱処理を行っておらず、表中にはハイフン「-」を記載する。
試料No.2~No.4,No.50では、二次めっき後の熱処理温度が異なり、順に200℃、210℃、220℃、240℃である。
熱処理の保持時間はいずれも、30秒である。 <Heat treatment conditions>
Sample No. No. 1 is not heat-treated after the secondary plating, and a hyphen "-" is described in the table.
Sample No. 2-No. 4, No. At 50, the heat treatment temperature after the secondary plating is different, and is 200 ° C., 210 ° C., 220 ° C., and 240 ° C., respectively.
The holding time of each heat treatment is 30 seconds.
試料No.1は、二次めっき後に熱処理を行っておらず、表中にはハイフン「-」を記載する。
試料No.2~No.4,No.50では、二次めっき後の熱処理温度が異なり、順に200℃、210℃、220℃、240℃である。
熱処理の保持時間はいずれも、30秒である。 <Heat treatment conditions>
Sample No. No. 1 is not heat-treated after the secondary plating, and a hyphen "-" is described in the table.
Sample No. 2-No. 4, No. At 50, the heat treatment temperature after the secondary plating is different, and is 200 ° C., 210 ° C., 220 ° C., and 240 ° C., respectively.
The holding time of each heat treatment is 30 seconds.
(試料No.101)
試料No.101のピン端子は、いわゆる後めっき法によって錫系層を設けた試料である。このピン端子は、基材の一端から他端にわたって基材の表面全体を覆う錫系層を備える。このピン端子では、基材が露出していない。 (Sample No. 101)
Sample No. The pin terminal of 101 is a sample provided with a tin-based layer by a so-called post-plating method. The pin terminal includes a tin-based layer that covers the entire surface of the base material from one end to the other end of the base material. The base material is not exposed at this pin terminal.
試料No.101のピン端子は、いわゆる後めっき法によって錫系層を設けた試料である。このピン端子は、基材の一端から他端にわたって基材の表面全体を覆う錫系層を備える。このピン端子では、基材が露出していない。 (Sample No. 101)
Sample No. The pin terminal of 101 is a sample provided with a tin-based layer by a so-called post-plating method. The pin terminal includes a tin-based layer that covers the entire surface of the base material from one end to the other end of the base material. The base material is not exposed at this pin terminal.
試料No.101のピン端子、及び後述の試料No.102のピン端子はいずれも、0.64型のピン端子であり、銅合金板が黄銅板であるめっき付き板を用いて作製した。
Sample No. The pin terminal of 101 and the sample No. described later. The pin terminals of 102 are all 0.64 type pin terminals, and were manufactured by using a plated plate in which the copper alloy plate is a brass plate.
(試料No.102)
試料No.102のピン端子は、いわゆる先めっき法によって錫系層を設けた試料である。このピン端子は、基材の一端から他端にわたって基材の第一面及び第二面を覆う錫系層を備える。基材の第三面及び第四面は、基材の一端から他端にわたって錫系層が設けられておらず露出されている。 (Sample No. 102)
Sample No. The pin terminal of 102 is a sample provided with a tin-based layer by a so-called pre-plating method. The pin terminal includes a tin-based layer covering the first surface and the second surface of the base material from one end to the other end of the base material. The third and fourth surfaces of the base material are exposed without a tin-based layer from one end to the other end of the base material.
試料No.102のピン端子は、いわゆる先めっき法によって錫系層を設けた試料である。このピン端子は、基材の一端から他端にわたって基材の第一面及び第二面を覆う錫系層を備える。基材の第三面及び第四面は、基材の一端から他端にわたって錫系層が設けられておらず露出されている。 (Sample No. 102)
Sample No. The pin terminal of 102 is a sample provided with a tin-based layer by a so-called pre-plating method. The pin terminal includes a tin-based layer covering the first surface and the second surface of the base material from one end to the other end of the base material. The third and fourth surfaces of the base material are exposed without a tin-based layer from one end to the other end of the base material.
なお、各試料のピン端子において基材を覆う錫系層が存在することは、例えば、上述の断面をとり、断面を成分分析することで確認することが挙げられる。成分分析は、例えば走査型電子顕微鏡に付属されるエネルギー分散型X線分光装置(SEM-EDX)を利用することが挙げられる。
The existence of a tin-based layer covering the base material at the pin terminals of each sample can be confirmed, for example, by taking the above-mentioned cross section and analyzing the cross section in terms of components. For component analysis, for example, the energy dispersive X-ray spectroscope (SEM-EDX) attached to the scanning electron microscope can be used.
(はんだ付けの良否)
基材がリン青銅である試料No.3のピン端子と、基材が黄銅である試料No.3-1のピン端子において、はんだつららの長さ(mm)を調べた。ここでは、基材の周方向の全周にわたって錫系層が存在する基材の一端側の領域にはんだ付けを行った後、以下のようにして、はんだつららの長さを測定する。はんだ付けに用いるはんだは、鉛フリーはんだ合金である。 (Good or bad soldering)
Sample No. whose base material is phosphor bronze. No. 3 pin terminal and sample No. 3 whose base material is brass. The length (mm) of the solder icicles was examined at the pin terminal of 3-1. Here, after soldering is performed on the region on one end side of the base material where the tin-based layer exists over the entire circumference in the circumferential direction of the base material, the lengths of the solder shavings are measured as follows. The solder used for soldering is a lead-free solder alloy.
基材がリン青銅である試料No.3のピン端子と、基材が黄銅である試料No.3-1のピン端子において、はんだつららの長さ(mm)を調べた。ここでは、基材の周方向の全周にわたって錫系層が存在する基材の一端側の領域にはんだ付けを行った後、以下のようにして、はんだつららの長さを測定する。はんだ付けに用いるはんだは、鉛フリーはんだ合金である。 (Good or bad soldering)
Sample No. whose base material is phosphor bronze. No. 3 pin terminal and sample No. 3 whose base material is brass. The length (mm) of the solder icicles was examined at the pin terminal of 3-1. Here, after soldering is performed on the region on one end side of the base material where the tin-based layer exists over the entire circumference in the circumferential direction of the base material, the lengths of the solder shavings are measured as follows. The solder used for soldering is a lead-free solder alloy.
はんだつららの長さは、各試料のピン端子において一端側の領域を市販のマイクロスコープで拡大して観察し、この観察像を用いて測定した。はんだつららは、ピン端子の一端からはんだつららの先端までの距離とする。はんだつららの長さが短いほど、はんだ付けが良好になされているといえる。
The length of the solder icicles was measured by observing the area on one end side of the pin terminal of each sample with a commercially available microscope and using this observation image. The solder icicles are the distance from one end of the pin terminal to the tip of the solder icicles. It can be said that the shorter the length of the solder icicles, the better the soldering.
(錫系層の厚さの測定)
各試料のピン端子において、基材の一端側の領域に存在する錫系層の厚さを測定した。先めっき法を用いて作製した試料No.102については、錫系層の厚さを測定していない。 (Measurement of tin layer thickness)
At the pin terminals of each sample, the thickness of the tin-based layer existing in the region on one end side of the base material was measured. Sample No. prepared by using the pre-plating method. For 102, the thickness of the tin-based layer has not been measured.
各試料のピン端子において、基材の一端側の領域に存在する錫系層の厚さを測定した。先めっき法を用いて作製した試料No.102については、錫系層の厚さを測定していない。 (Measurement of tin layer thickness)
At the pin terminals of each sample, the thickness of the tin-based layer existing in the region on one end side of the base material was measured. Sample No. prepared by using the pre-plating method. For 102, the thickness of the tin-based layer has not been measured.
試料No.1~No.4,No.50,No.101のピン端子における基材の一端側の領域では、上述のように基材の周方向の全周にわたって錫系層が存在する。この基材の一端側の領域において、ピン端子の一端からピン端子の長手方向に沿って1mmの地点を錫系層の厚さの測定箇所とする。
基材の第一面から第四面の各面に対して、測定点をとる。
各面の測定点は向かい合う位置にとる。具体的には第一面及び第二面は、各面の幅方向の中心位置及びその近傍に測定点をとる。第三面及び第四面は、各面の高さ方向の中心位置及びその近傍に測定点をとる。 Sample No. 1 to No. 4, No. 50, No. In the region on one end side of the base material at the pin terminal of 101, a tin-based layer exists over the entire circumference of the base material in the circumferential direction as described above. In the region on one end side of this base material, apoint 1 mm from one end of the pin terminal along the longitudinal direction of the pin terminal is defined as a measurement point for the thickness of the tin-based layer.
Measurement points are set for each of the first to fourth surfaces of the base material.
The measurement points on each surface should be opposite to each other. Specifically, the first surface and the second surface have measurement points at the center position in the width direction of each surface and its vicinity. The third and fourth surfaces have measurement points at the center position in the height direction of each surface and its vicinity.
基材の第一面から第四面の各面に対して、測定点をとる。
各面の測定点は向かい合う位置にとる。具体的には第一面及び第二面は、各面の幅方向の中心位置及びその近傍に測定点をとる。第三面及び第四面は、各面の高さ方向の中心位置及びその近傍に測定点をとる。 Sample No. 1 to No. 4, No. 50, No. In the region on one end side of the base material at the pin terminal of 101, a tin-based layer exists over the entire circumference of the base material in the circumferential direction as described above. In the region on one end side of this base material, a
Measurement points are set for each of the first to fourth surfaces of the base material.
The measurement points on each surface should be opposite to each other. Specifically, the first surface and the second surface have measurement points at the center position in the width direction of each surface and its vicinity. The third and fourth surfaces have measurement points at the center position in the height direction of each surface and its vicinity.
錫系層の厚さの測定は、ここでは市販の蛍光X線膜厚計を用いて行った。また、蛍光X線膜厚計による成分分析を利用して、上述の各測定点において合金層である内層の厚さ、純錫層である外層の厚さをそれぞれ測定した。錫系層の厚さは、内層の厚さと外層の厚さとの合計厚さである。なお、錫系層の厚さの測定は、ピン端子の断面をとり、この断面をSEM等で観察した像を用いて行ってよい。
The thickness of the tin-based layer was measured here using a commercially available fluorescent X-ray film thickness meter. In addition, the thickness of the inner layer, which is the alloy layer, and the thickness of the outer layer, which is the pure tin layer, were measured at each of the above-mentioned measurement points by using the component analysis by the fluorescent X-ray film thickness meter. The thickness of the tin-based layer is the total thickness of the inner layer and the outer layer. The thickness of the tin-based layer may be measured by taking a cross section of the pin terminal and using an image obtained by observing this cross section with an SEM or the like.
更に、試料No.1~No.4,No.50では、ピン端子の一端から離れた位置においても錫系層の厚さを測定した。具体的には、上述した基材の一端側に存在する錫系層において、ピン端子の一端からピン端子の長手方向に沿って3mmの地点、5mmの地点をそれぞれ錫系層の厚さの測定箇所とする。各測定箇所において、基材の四面の各面に対して上述の測定点をとる。各測定点において錫系層の厚さを測定した。
Furthermore, sample No. 1 to No. 4, No. In No. 50, the thickness of the tin-based layer was measured even at a position away from one end of the pin terminal. Specifically, in the tin-based layer existing on one end side of the above-mentioned base material, the thickness of the tin-based layer is measured at 3 mm points and 5 mm points along the longitudinal direction of the pin terminals from one end of the pin terminals. It is a place. At each measurement point, the above-mentioned measurement points are taken for each of the four surfaces of the base material. The thickness of the tin-based layer was measured at each measurement point.
各試料のサンプル数を3とし、サンプル毎に錫系層の厚さを測定した。更に、試料No.1~No.4,No.50では、3つのサンプルについてそれぞれ、内層の厚さ及び外層の厚さを測定した。錫系層の厚さ、内層の厚さ、外層の厚さのそれぞれについて、3つのサンプルの平均値を表1に示す。
The number of samples of each sample was set to 3, and the thickness of the tin-based layer was measured for each sample. Furthermore, the sample No. 1 to No. 4, No. At 50, the thickness of the inner layer and the thickness of the outer layer were measured for each of the three samples. Table 1 shows the average values of the three samples for each of the tin layer thickness, the inner layer thickness, and the outer layer thickness.
上述の先端から1mmの地点について、錫系層の厚さの最大値t1(μm)及び最小値t2(μm)を表2,表3に示す。また、最大値t1と最小値t2との差(t1-t2)(μm)、最大値t1に対する最小値t2の比(t2/t1)を表2,表3に示す。
Tables 2 and 3 show the maximum value t 1 (μm) and the minimum value t 2 (μm) of the thickness of the tin-based layer at the above-mentioned point 1 mm from the tip. Tables 2 and 3 show the difference between the maximum value t 1 and the minimum value t 2 (t 1- t 2 ) (μm) and the ratio of the minimum value t 2 to the maximum value t 1 (t 2 / t 1). Shown.
更に、試料No.1~No.4,No.50では、上述の先端から1mmの地点について、基材の第三面及び第四面を覆う錫系層のうち、内層の厚さの最小値を厚さt31(μm)とし、外層の厚さの最小値を厚さt32(μm)として表2,表3に示す。
Furthermore, the sample No. 1 to No. 4, No. In No. 50, the minimum thickness of the inner layer among the tin-based layers covering the third and fourth surfaces of the base material is set to the thickness t 31 (μm) at a point 1 mm from the tip, and the thickness of the outer layer is set to t 31 (μm). The minimum value of tin is shown in Tables 2 and 3 as the thickness t 32 (μm).
更に、試料No.1~No.4,No.50について、錫系層における基材の長手方向の厚さの差を調べた。具体的には、基材の一端側の領域に存在する錫系層において、上述の一端から1mmの地点、3mmの地点、5mmの地点を錫系層の厚さの測定箇所とし、各測定箇所において上述のように測定点をとる。基材の各面、例えば第一面における三つの測定点で測定された錫系層の厚さについて、最大厚さと最小厚さとの差をとる。基材の各面について求めた合計四つの差のうち、最大値を表2の項目「一端側 長手方向の厚さ差」に示す。
Furthermore, sample No. 1 to No. 4, No. For 50, the difference in the longitudinal thickness of the base material in the tin-based layer was examined. Specifically, in the tin-based layer existing in the region on one end side of the base material, the above-mentioned 1 mm point, 3 mm point, and 5 mm point from one end are set as measurement points for the thickness of the tin-based layer, and each measurement point. In, a measurement point is taken as described above. The difference between the maximum thickness and the minimum thickness is taken for the thickness of the tin-based layer measured at three measurement points on each surface of the base material, for example, the first surface. Of the total of four differences obtained for each surface of the base material, the maximum value is shown in the item "One end side, thickness difference in the longitudinal direction" in Table 2.
(はんだ濡れ性)
各試料のピン端子において、基材の一端側の領域の最大濡れ力(mN)を測定した。
最大濡れ力の測定は、各試料のサンプル数を3とし、サンプル毎に最大濡れ力を測定し、3つの測定値を平均した値を表3に示す。後めっき法を用いて作製した試料No.101については、最大濡れ力を測定していない。 (Solder wettability)
At the pin terminals of each sample, the maximum wetting force (mN) of the region on one end side of the base material was measured.
For the measurement of the maximum wetting force, the number of samples of each sample is set to 3, the maximum wetting force is measured for each sample, and the average value of the three measured values is shown in Table 3. Sample No. prepared by using the post-plating method. For 101, the maximum wetting force has not been measured.
各試料のピン端子において、基材の一端側の領域の最大濡れ力(mN)を測定した。
最大濡れ力の測定は、各試料のサンプル数を3とし、サンプル毎に最大濡れ力を測定し、3つの測定値を平均した値を表3に示す。後めっき法を用いて作製した試料No.101については、最大濡れ力を測定していない。 (Solder wettability)
At the pin terminals of each sample, the maximum wetting force (mN) of the region on one end side of the base material was measured.
For the measurement of the maximum wetting force, the number of samples of each sample is set to 3, the maximum wetting force is measured for each sample, and the average value of the three measured values is shown in Table 3. Sample No. prepared by using the post-plating method. For 101, the maximum wetting force has not been measured.
最大濡れ力の測定は、市販のメニスコグラフ試験機を用いて測定する。
試験は、JIS C 5402-12-7:2005に記載されるようにJIS C 60068-2-54:2009の試験手順に従って行う。試験条件は、JIS C 60068-2-54:2009を参照して、以下のように設定する。 The maximum wetting force is measured using a commercially available meniscograph tester.
The test is carried out according to the test procedure of JIS C 60068-2-54: 2009 as described in JIS C 5402-12-7: 2005. The test conditions are set as follows with reference to JIS C 60068-2-54: 2009.
試験は、JIS C 5402-12-7:2005に記載されるようにJIS C 60068-2-54:2009の試験手順に従って行う。試験条件は、JIS C 60068-2-54:2009を参照して、以下のように設定する。 The maximum wetting force is measured using a commercially available meniscograph tester.
The test is carried out according to the test procedure of JIS C 60068-2-54: 2009 as described in JIS C 5402-12-7: 2005. The test conditions are set as follows with reference to JIS C 60068-2-54: 2009.
〈試験条件〉
試験に用いるはんだは、鉛フリーはんだ合金である。
試験に用いるフラックスは、低活性フラックスであるロジンフラックスを用いる。このロジンフラックスは、質量分率でロジン25%を質量分率で75%イソプロピルアルコール(IPA)に溶解したIPA溶液である。
浸漬温度は、245℃±10℃である。
浸漬速度は、4mm/sec±2mm/secである。
浸漬深さは、1.5mm±0.5mmである。
フラックスを塗布してから、はんだに浸漬するまでの時間は、一定である。 <Test conditions>
The solder used for the test is a lead-free solder alloy.
As the flux used in the test, rosin flux, which is a low activity flux, is used. This rosin flux is an IPA solution in which 25% rosin by mass fraction is dissolved in 75% isopropyl alcohol (IPA) by mass fraction.
The immersion temperature is 245 ° C ± 10 ° C.
The immersion speed is 4 mm / sec ± 2 mm / sec.
The immersion depth is 1.5 mm ± 0.5 mm.
The time from applying the flux to immersing it in the solder is constant.
試験に用いるはんだは、鉛フリーはんだ合金である。
試験に用いるフラックスは、低活性フラックスであるロジンフラックスを用いる。このロジンフラックスは、質量分率でロジン25%を質量分率で75%イソプロピルアルコール(IPA)に溶解したIPA溶液である。
浸漬温度は、245℃±10℃である。
浸漬速度は、4mm/sec±2mm/secである。
浸漬深さは、1.5mm±0.5mmである。
フラックスを塗布してから、はんだに浸漬するまでの時間は、一定である。 <Test conditions>
The solder used for the test is a lead-free solder alloy.
As the flux used in the test, rosin flux, which is a low activity flux, is used. This rosin flux is an IPA solution in which 25% rosin by mass fraction is dissolved in 75% isopropyl alcohol (IPA) by mass fraction.
The immersion temperature is 245 ° C ± 10 ° C.
The immersion speed is 4 mm / sec ± 2 mm / sec.
The immersion depth is 1.5 mm ± 0.5 mm.
The time from applying the flux to immersing it in the solder is constant.
メニスコグラフ試験機にはんだの浸漬温度、浸漬速度、浸漬深さを設定して試験を実施し、濡れ波形のグラフを得る。市販のメニスコグラフ試験機を利用すれば、このグラフから、最大濡れ力が自動的に得られる。
Set the solder immersion temperature, immersion speed, and immersion depth in the meniscograph tester, perform the test, and obtain a graph of the wet waveform. If a commercially available meniscograph tester is used, the maximum wetting force can be automatically obtained from this graph.
(錫の突起物の数)
各試料のピン端子において、基材の一端側の領域に存在する錫系層に生じる錫の突起物の数を測定した。
錫の突起物の数の測定は、各試料のサンプル数を3とし、サンプル毎に上述の針状の突起物であるウィスカ及び球状の突起物であるノジュールの合計数を測定し、3つの測定値を平均した値を表3に示す。試料No.101,No.102については、錫の突起物の数を測定していない。 (Number of tin protrusions)
At the pin terminals of each sample, the number of tin protrusions formed on the tin-based layer existing in the region on one end side of the base material was measured.
To measure the number of tin protrusions, the number of samples of each sample is set to 3, and the total number of whiskers, which are needle-shaped protrusions, and nodules, which are spherical protrusions, is measured for each sample, and the three measured values are measured. The averaged values are shown in Table 3. Sample No. 101, No. For 102, the number of tin protrusions has not been measured.
各試料のピン端子において、基材の一端側の領域に存在する錫系層に生じる錫の突起物の数を測定した。
錫の突起物の数の測定は、各試料のサンプル数を3とし、サンプル毎に上述の針状の突起物であるウィスカ及び球状の突起物であるノジュールの合計数を測定し、3つの測定値を平均した値を表3に示す。試料No.101,No.102については、錫の突起物の数を測定していない。 (Number of tin protrusions)
At the pin terminals of each sample, the number of tin protrusions formed on the tin-based layer existing in the region on one end side of the base material was measured.
To measure the number of tin protrusions, the number of samples of each sample is set to 3, and the total number of whiskers, which are needle-shaped protrusions, and nodules, which are spherical protrusions, is measured for each sample, and the three measured values are measured. The averaged values are shown in Table 3. Sample No. 101, No. For 102, the number of tin protrusions has not been measured.
錫の突起物の数の測定は、以下の条件で行う。
各試料のピン端子を以下の高温多湿な環境に所定時間保持して、試験片を作製する。
環境条件は、温度が85℃であり、湿度が85%である。保持時間は60時間である。
作製した各試験片において、基材の一端側の領域に存在する錫系層の表面を市販の三次元レーザ顕微鏡で観察する。この錫系層の表面の観察領域は、上記錫系層のうち、基材の第三面又は第四面を覆う箇所であって、ピン端子の一端からピン端子の長手方向に沿って0.5mmの地点から1.5mmの地点までの範囲から選択する。
この顕微鏡観察像において、ノジュール及びウィスカの数を数える。
観察視野は、一辺の長さが0.35mmである正方形とする。観察倍率は、数μmオーダーのノジュールが測定可能なように調整する。 The number of tin protrusions is measured under the following conditions.
The pin terminals of each sample are held in the following hot and humid environment for a predetermined time to prepare a test piece.
The environmental conditions are a temperature of 85 ° C. and a humidity of 85%. The holding time is 60 hours.
In each of the prepared test pieces, the surface of the tin-based layer existing in the region on one end side of the base material is observed with a commercially available three-dimensional laser microscope. The observation region on the surface of the tin-based layer is a portion of the tin-based layer that covers the third or fourth surface of the base material, and is 0. Select from the range from the 5 mm point to the 1.5 mm point.
In this microscopic image, the number of nodules and whiskers is counted.
The observation field of view is a square having a side length of 0.35 mm. The observation magnification is adjusted so that nodules on the order of several μm can be measured.
各試料のピン端子を以下の高温多湿な環境に所定時間保持して、試験片を作製する。
環境条件は、温度が85℃であり、湿度が85%である。保持時間は60時間である。
作製した各試験片において、基材の一端側の領域に存在する錫系層の表面を市販の三次元レーザ顕微鏡で観察する。この錫系層の表面の観察領域は、上記錫系層のうち、基材の第三面又は第四面を覆う箇所であって、ピン端子の一端からピン端子の長手方向に沿って0.5mmの地点から1.5mmの地点までの範囲から選択する。
この顕微鏡観察像において、ノジュール及びウィスカの数を数える。
観察視野は、一辺の長さが0.35mmである正方形とする。観察倍率は、数μmオーダーのノジュールが測定可能なように調整する。 The number of tin protrusions is measured under the following conditions.
The pin terminals of each sample are held in the following hot and humid environment for a predetermined time to prepare a test piece.
The environmental conditions are a temperature of 85 ° C. and a humidity of 85%. The holding time is 60 hours.
In each of the prepared test pieces, the surface of the tin-based layer existing in the region on one end side of the base material is observed with a commercially available three-dimensional laser microscope. The observation region on the surface of the tin-based layer is a portion of the tin-based layer that covers the third or fourth surface of the base material, and is 0. Select from the range from the 5 mm point to the 1.5 mm point.
In this microscopic image, the number of nodules and whiskers is counted.
The observation field of view is a square having a side length of 0.35 mm. The observation magnification is adjusted so that nodules on the order of several μm can be measured.
まず、はんだ付けの良否について述べる。
基材が黄銅から構成される試料No.3-1のはんだつららの長さは、0.77mmである。基材がリン青銅から構成される試料No.3のはんだつららの長さは0.17mmであり、試料No.3-1に比較して短い。この理由の一つとして、試料No.3の基材ではZnの含有量が20質量%以下、ここでは0.05質量%以上0.20質量%以下であり、Znの含有量が28質量%超である黄銅よりも少ないことが考えられる。試料No.3では、Znの含有量が少ないことで、はんだつららの形成が抑制されたと考えられる。 First, the quality of soldering will be described.
Sample No. whose base material is made of brass. The length of the solder icicles of 3-1 is 0.77 mm. The length of the solder icicles of Sample No. 3 whose base material is phosphor bronze is 0.17 mm, and Sample No. 3 has a length of 0.17 mm. Shorter than 3-1. One of the reasons for this is the sample No. It is considered that the base material of No. 3 has a Zn content of 20% by mass or less, here 0.05% by mass or more and 0.20% by mass or less, which is less than brass having a Zn content of more than 28% by mass. Be done. Sample No. In No. 3, it is considered that the formation of solder icicles was suppressed due to the low Zn content.
基材が黄銅から構成される試料No.3-1のはんだつららの長さは、0.77mmである。基材がリン青銅から構成される試料No.3のはんだつららの長さは0.17mmであり、試料No.3-1に比較して短い。この理由の一つとして、試料No.3の基材ではZnの含有量が20質量%以下、ここでは0.05質量%以上0.20質量%以下であり、Znの含有量が28質量%超である黄銅よりも少ないことが考えられる。試料No.3では、Znの含有量が少ないことで、はんだつららの形成が抑制されたと考えられる。 First, the quality of soldering will be described.
Sample No. whose base material is made of brass. The length of the solder icicles of 3-1 is 0.77 mm. The length of the solder icicles of Sample No. 3 whose base material is phosphor bronze is 0.17 mm, and Sample No. 3 has a length of 0.17 mm. Shorter than 3-1. One of the reasons for this is the sample No. It is considered that the base material of No. 3 has a Zn content of 20% by mass or less, here 0.05% by mass or more and 0.20% by mass or less, which is less than brass having a Zn content of more than 28% by mass. Be done. Sample No. In No. 3, it is considered that the formation of solder icicles was suppressed due to the low Zn content.
次に、錫系層の厚さについて述べる。
表2,表3に示すように、試料No.1~No.4,No.50ではいずれも、差(t1-t2)が0.20μm以上であり、後めっき法を用いて作製した試料No.101よりも大きな差(t1-t2)を有することが分かる。また、試料No.1~No.4,No.50では、基材の第一面又は第二面上に存在する錫系層の厚さが最大値t1をとり、基材の第三面又は第四面上に存在する錫系層の厚さが最小値t2をとることが分かる。即ち、試料No.1~No.4,No.50のピン端子は、基材の一端側の領域において、最小値t2をとる薄膜部と、最大値t1をとる厚膜部とを基材の周方向の異なる位置に有するといえる。 Next, the thickness of the tin-based layer will be described.
As shown in Tables 2 and 3, the sample No. 1 to No. 4, No. In all of 50, the difference (t 1- t 2 ) was 0.20 μm or more, and the sample No. 50 prepared by the post-plating method. It can be seen that it has a larger difference (t 1- t 2) than 101. In addition, sample No. 1 to No. 4, No. At 50, the thickness of the tin-based layer existing on the first or second surface of the base material has a maximum value t 1 , and the thickness of the tin-based layer existing on the third or fourth surface of the base material. It can be seen that stakes the minimum value t 2. That is, the sample No. 1 to No. 4, No. It can be said that the pin terminal of 50 has a thin film portion having a minimum value t 2 and a thick film portion having a maximum value t 1 at different positions in the circumferential direction of the base material in the region on one end side of the base material.
表2,表3に示すように、試料No.1~No.4,No.50ではいずれも、差(t1-t2)が0.20μm以上であり、後めっき法を用いて作製した試料No.101よりも大きな差(t1-t2)を有することが分かる。また、試料No.1~No.4,No.50では、基材の第一面又は第二面上に存在する錫系層の厚さが最大値t1をとり、基材の第三面又は第四面上に存在する錫系層の厚さが最小値t2をとることが分かる。即ち、試料No.1~No.4,No.50のピン端子は、基材の一端側の領域において、最小値t2をとる薄膜部と、最大値t1をとる厚膜部とを基材の周方向の異なる位置に有するといえる。 Next, the thickness of the tin-based layer will be described.
As shown in Tables 2 and 3, the sample No. 1 to No. 4, No. In all of 50, the difference (t 1- t 2 ) was 0.20 μm or more, and the sample No. 50 prepared by the post-plating method. It can be seen that it has a larger difference (t 1- t 2) than 101. In addition, sample No. 1 to No. 4, No. At 50, the thickness of the tin-based layer existing on the first or second surface of the base material has a maximum value t 1 , and the thickness of the tin-based layer existing on the third or fourth surface of the base material. It can be seen that stakes the minimum value t 2. That is, the sample No. 1 to No. 4, No. It can be said that the pin terminal of 50 has a thin film portion having a minimum value t 2 and a thick film portion having a maximum value t 1 at different positions in the circumferential direction of the base material in the region on one end side of the base material.
また、表2,表3に示すように、試料No.1~No.4,No.50ではいずれも、比(t2/t1)が0.2以上0.8未満であり、試料No.101よりも、比(t2/t1)が小さいことが分かる。つまり、試料No.1~No.4,No.50では、ピン端子の一端側の領域において、錫系層の最大値t1と最小値t2との差がある程度大きいといえる。
In addition, as shown in Tables 2 and 3, the sample No. 1 to No. 4, No. At 50, the ratio (t 2 / t 1 ) was 0.2 or more and less than 0.8, and the sample No. It can be seen that the ratio (t 2 / t 1) is smaller than that of 101. That is, the sample No. 1 to No. 4, No. At 50, it can be said that the difference between the maximum value t 1 and the minimum value t 2 of the tin-based layer is large to some extent in the region on one end side of the pin terminal.
以上のことから、試料No.1~No.4,No.50では、基材の一端側の領域において、基材の周方向の全てを覆う錫系層を有し、かつこの錫系層の厚さが基材の周方向に異なっており、厚さの差がある程度大きいといえる。これらのことは、図8A~図8Eに示す顕微鏡写真からも裏付けられる。
From the above, the sample No. 1 to No. 4, No. In No. 50, in the region on one end side of the base material, there is a tin-based layer that covers all of the circumferential direction of the base material, and the thickness of the tin-based layer is different in the circumferential direction of the base material. It can be said that the difference is large to some extent. These facts are also supported by the micrographs shown in FIGS. 8A-8E.
図8Aは、試料No.3のピン端子のうち、サンプルの一つについて、断面をSEMで観察したSEM像である。上記断面は、基材の一端側の領域において、ピン端子の一端からピン端子の長手方向に沿って3mmの地点を基材の軸に平行な平面で切断したものである。
FIG. 8A shows the sample No. It is an SEM image which observed the cross section by SEM about one of the samples among the pin terminals of 3. The cross section is obtained by cutting a point 3 mm along the longitudinal direction of the pin terminal from one end of the pin terminal in a plane parallel to the axis of the base material in the region on one end side of the base material.
図8B~図8Eは、図8Aにおいて白い破線の長方形で囲まれた領域を拡大して示す。
図8B~図8Eは、順に基材の第一面、第二面、第三面、第四面を覆う錫系層を示す。図8B~図8Eにおいて、濃い灰色の領域は基材2であり、黒色の領域は埋め込み樹脂である。基材2と埋め込み樹脂との間に存在する灰色の領域は錫系層30である。錫系層30のうち、基材2に近い側の領域は、錫と銅とを含む合金からなる内層301である。錫系層30のうち、内層301に接する薄い灰色の領域は、純錫からなる外層302である。図8Bにのみ、符号を付して示す。 8B-8E show an enlarged area surrounded by a white dashed rectangle in FIG. 8A.
8B to 8E show tin-based layers covering the first surface, the second surface, the third surface, and the fourth surface of the base material in this order. In FIGS. 8B to 8E, the dark gray region is thebase material 2, and the black region is the embedded resin. The gray region existing between the base material 2 and the embedded resin is the tin-based layer 30. The region of the tin-based layer 30 on the side closer to the base material 2 is the inner layer 301 made of an alloy containing tin and copper. In the tin-based layer 30, the light gray region in contact with the inner layer 301 is the outer layer 302 made of pure tin. Only FIG. 8B is shown with a reference numeral.
図8B~図8Eは、順に基材の第一面、第二面、第三面、第四面を覆う錫系層を示す。図8B~図8Eにおいて、濃い灰色の領域は基材2であり、黒色の領域は埋め込み樹脂である。基材2と埋め込み樹脂との間に存在する灰色の領域は錫系層30である。錫系層30のうち、基材2に近い側の領域は、錫と銅とを含む合金からなる内層301である。錫系層30のうち、内層301に接する薄い灰色の領域は、純錫からなる外層302である。図8Bにのみ、符号を付して示す。 8B-8E show an enlarged area surrounded by a white dashed rectangle in FIG. 8A.
8B to 8E show tin-based layers covering the first surface, the second surface, the third surface, and the fourth surface of the base material in this order. In FIGS. 8B to 8E, the dark gray region is the
図8B及び図8Cと、図8D及び図8Eとを比較する。この比較から、基材の第一面及び第二面を覆う錫系層の厚さ、内層の厚さ、外層の厚さはいずれも、基材の第三面及び第四面を覆う錫系層の厚さ、内層の厚さ、外層の厚さよりも厚いことが分かる。この厚さの相違に関する事項は、切断位置をピン端子の一端からピン端子の長手方向に沿って1mmの地点とした場合も同様である。また、この厚さの相違に関する事項は、試料No.1,No.2,No.4についても同様である。
Compare FIGS. 8B and 8C with FIGS. 8D and 8E. From this comparison, the thickness of the tin-based layer covering the first and second surfaces of the base material, the thickness of the inner layer, and the thickness of the outer layer are all tin-based covering the third and fourth surfaces of the base material. It can be seen that it is thicker than the thickness of the layer, the thickness of the inner layer, and the thickness of the outer layer. The matter concerning this difference in thickness is the same when the cutting position is set to a point 1 mm along the longitudinal direction of the pin terminal from one end of the pin terminal. In addition, regarding the matter concerning this difference in thickness, the sample No. 1, No. 2, No. The same applies to 4.
そして、表3に示すように試料No.1~No.4では、最大濡れ力が0.25mN以上であり、はんだ濡れ性に優れることが分かる。試料No.1~No.4の最大濡れ力が高い理由の一つとして、基材の一端側の領域において基材の周方向の全てを覆う錫系層を有することが挙げられる。特にこの錫系層が純錫からなる外層を含み、外層の厚さが適切であることが挙げられる。定量的には、上記錫系層のうち、薄膜部に備えられる外層の厚さt32が0.5μm以上であり、ここでは1.0μm以上である。厚膜部に備えられる外層の厚さは、薄膜部の外層の厚さt32よりも厚い。即ち、基材の一端側の領域では、基材の周方向の全周にわたって、はんだ濡れ性に優れる純錫層が適切に存在するといえる。
Then, as shown in Table 3, the sample No. 1 to No. In No. 4, the maximum wetting force is 0.25 mN or more, and it can be seen that the solder wetting property is excellent. Sample No. 1 to No. One of the reasons why the maximum wetting force of 4 is high is that it has a tin-based layer that covers the entire circumferential direction of the base material in the region on one end side of the base material. In particular, this tin-based layer contains an outer layer made of pure tin, and the thickness of the outer layer is appropriate. Quantitatively, among the tin-based layers, the thickness t 32 of the outer layer provided in the thin film portion is 0.5 μm or more, and here 1.0 μm or more. The thickness of the outer layer provided in the thick film portion is thicker than the thickness t 32 of the outer layer of the thin film portion. That is, it can be said that in the region on one end side of the base material, a pure tin layer having excellent solder wettability is appropriately present over the entire circumference in the circumferential direction of the base material.
一方、試料No.50の最大濡れ力は、0.25mN未満である。試料No.50の最大濡れ力が低い理由の一つとして、試料No.50の熱処理温度が試料No.2~No.4の熱処理温度よりも高いことが考えられる。
On the other hand, sample No. The maximum wetting force of 50 is less than 0.25 mN. Sample No. One of the reasons why the maximum wetting force of 50 is low is that the sample No. The heat treatment temperature of 50 is the sample No. 2-No. It is considered that the temperature is higher than the heat treatment temperature of 4.
他方、試料No.102は、最大濡れ力を測定できず、はんだ濡れ性に劣る。この理由の一つとして、試料No.102では、基材の一端側の領域において基材の一部、ここでは基材の第三面及び第四面が露出されていることが考えられる。
On the other hand, sample No. 102 cannot measure the maximum wetting force and is inferior in solder wettability. One of the reasons for this is the sample No. In 102, it is considered that a part of the base material, here, the third surface and the fourth surface of the base material are exposed in the region on one end side of the base material.
試料No.1~No.4,No.50では、上述の針状の突起物であるウィスカが観察されなかった。一部の試料において、球状の突起物であるノジュールのみが観察された。従って、表3に示す錫の突起物の数は、ノジュールの数である。表3に示すように試料No.2~No.4,No.50では、0.35mm×0.35mmにおけるノジュールの数が15個以下であり、ウィスカが存在しない上にノジュールの数も少ないことが分かる。特に、試料No.3,No.4,No.50におけるノジュールの数は0個であり、ウィスカ及びノジュールが実質的に存在していない。試料No.2~No.4,No.50ではウィスカ及びノジュールの数が少ない理由の一つは、次の通りである。錫系層は、基材の露出領域である第三面及び第四面に接して設けられているものの、以下の内層を含むからである。上記内層は、錫と銅とを含む合金からなると共に、適切な厚さを有する。定量的には、基材の第三面及び第四面に接して設けられている薄膜部中の内層の厚さt31が0.1μm以上である。厚膜部に備えられる内層の厚さは、薄膜部の内層の厚さt31よりも厚い。即ち、基材の一端側の領域では、基材の周方向の全周にわたって、ウィスカ及びノジュールの発生を抑制する作用を有する合金層が適切に存在するといえる。そのため、試料No.2~No.4,No.50は下地層を備えていなくても、錫系層の表面にウィスカ及びノジュールが生じ難いといえる。
Sample No. 1 to No. 4, No. At 50, the whiskers, which are the above-mentioned needle-shaped protrusions, were not observed. In some samples, only nodules, which are spherical protrusions, were observed. Therefore, the number of tin protrusions shown in Table 3 is the number of nodules. As shown in Table 3, the sample No. 2-No. 4, No. At 50, the number of nodules at 0.35 mm × 0.35 mm is 15 or less, and it can be seen that there is no whisker and the number of nodules is small. In particular, sample No. 3, No. 4, No. The number of nodules at 50 is 0, and whiskers and nodules are virtually absent. Sample No. 2-No. 4, No. One of the reasons why the number of whiskers and nodules is small in 50 is as follows. This is because the tin-based layer is provided in contact with the third and fourth surfaces, which are the exposed regions of the base material, but includes the following inner layers. The inner layer is made of an alloy containing tin and copper and has an appropriate thickness. Quantitatively, the thickness t 31 of the inner layer in the thin film portion provided in contact with the third and fourth surfaces of the base material is 0.1 μm or more. The thickness of the inner layer provided in the thick film portion is thicker than the thickness t 31 of the inner layer of the thin film portion. That is, it can be said that in the region on one end side of the base material, an alloy layer having an action of suppressing the generation of whiskers and nodules appropriately exists over the entire circumference in the circumferential direction of the base material. Therefore, the sample No. 2-No. 4, No. It can be said that whiskers and nodules are unlikely to occur on the surface of the tin-based layer of No. 50 even if the base layer is not provided.
一方、試料No.1では、0.35mm×0.35mmにおけるノジュールの数が15個超である。また、試料No.1では、薄膜部の内層の厚さt31が0.1μm未満である。試料No.1では、内層の厚さt31が薄いことでノジュールの数が多くなったと考えられる。この理由の一つとして、試料No.1は二次めっき後に熱処理を行っていないことが考えられる。
On the other hand, sample No. In 1, the number of nodules in 0.35 mm × 0.35 mm is more than 15. In addition, sample No. In No. 1, the thickness t 31 of the inner layer of the thin film portion is less than 0.1 μm. Sample No. In No. 1, it is considered that the number of nodules increased because the thickness t 31 of the inner layer was thin. One of the reasons for this is the sample No. It is considered that No. 1 is not heat-treated after the secondary plating.
その他、表2の項目「一端側 長手方向の厚さ差」に示すように試料No.1~No.4では、上述の差の最大値が1μm以下である。基材の一端側の領域では、基材の長手方向における錫系層の厚さの差が小さいといえる。一方、試料No.50では、上記差の最大値が3μm超と大きい。上記差の最大値が大きい理由の一つとして、試料No.50の熱処理温度が試料No.2~No.4の熱処理温度よりも高く、特に錫の融点よりも高いことが考えられる。熱処理温度が錫の融点よりも高いことで、二次めっき層が熱処理時に溶融されて、熱処理後に錫系層の厚さの不均一が生じたと考えられる。
In addition, as shown in the item "One end side, thickness difference in the longitudinal direction" in Table 2, the sample No. 1 to No. In No. 4, the maximum value of the above difference is 1 μm or less. In the region on one end side of the base material, it can be said that the difference in the thickness of the tin-based layer in the longitudinal direction of the base material is small. On the other hand, sample No. At 50, the maximum value of the above difference is as large as more than 3 μm. One of the reasons why the maximum value of the above difference is large is that the sample No. The heat treatment temperature of 50 is the sample No. 2-No. It is considered that the temperature is higher than the heat treatment temperature of 4, and particularly higher than the melting point of tin. It is considered that the heat treatment temperature was higher than the melting point of tin, so that the secondary plating layer was melted during the heat treatment and the thickness of the tin-based layer became non-uniform after the heat treatment.
また、試料No.1~No.4,No.50のピン端子について、二次めっきを行わなかった基材の他端側の領域について、基材の第一面及び第二面に存在する錫系層の厚さを調べた。ここでは、上述の長手方向の厚さ差を評価する場合と同様にして、最大厚さと最小厚さとの差の最大値を調べた。その結果、試料No.1~No.4では、上記差の最大値は0.2μm未満であり、錫系層は基材の長手方向に均一的な厚さを有するといえる。試料No.50の最大値は0.2μm以上であり、錫系層は肥大箇所を有するといえる。この理由の一つとして、試料No.50の熱処理温度が試料No.2~No.4の熱処理温度よりも高く、特に錫の融点よりも高いことが挙げられる。熱処理温度が錫の融点よりも高いことで、第一面及び第二面を覆う一次めっき層が熱処理時に溶融されて、熱処理後に錫系層の厚さの不均一が生じたと考えられる。
Also, sample No. 1 to No. 4, No. For the pin terminals of 50, the thickness of the tin-based layer existing on the first surface and the second surface of the base material was examined for the region on the other end side of the base material that was not subjected to the secondary plating. Here, the maximum value of the difference between the maximum thickness and the minimum thickness was examined in the same manner as in the case of evaluating the thickness difference in the longitudinal direction described above. As a result, the sample No. 1 to No. In No. 4, the maximum value of the above difference is less than 0.2 μm, and it can be said that the tin-based layer has a uniform thickness in the longitudinal direction of the base material. Sample No. The maximum value of 50 is 0.2 μm or more, and it can be said that the tin-based layer has an enlarged portion. One of the reasons for this is the sample No. The heat treatment temperature of 50 is the sample No. 2-No. It is higher than the heat treatment temperature of No. 4, and particularly higher than the melting point of tin. It is considered that when the heat treatment temperature was higher than the melting point of tin, the primary plating layer covering the first surface and the second surface was melted during the heat treatment, and the thickness of the tin-based layer became non-uniform after the heat treatment.
以上のことから、基材の構成材料が銅合金である場合にZnの含有量が20質量%以下であると、はんだつららが短く、はんだ付け不良が低減されることが示された。
From the above, it was shown that when the constituent material of the base material is a copper alloy and the Zn content is 20% by mass or less, the solder icicles are short and soldering defects are reduced.
また、基材の一端側の領域に、基材の周方向の全周を覆う錫系層を備え、この錫系層の厚さが基材の周方向に異なるピン端子、特にこの錫系層に備えられる薄膜部中の純錫層の厚さt32が0.5μm以上であると、はんだ濡れ性に優れることが示された。更に、上記薄膜部中の合金層の厚さt31が0.1μm以上であると、ウィスカだけでなく、ノジュールの数も少ないことが示された。はんだ濡れ性及び錫の突起物の数については、後述の試験例2でより詳細に説明する。表3に示す試料No.51,No.52については、試験例2で説明する。
Further, a tin-based layer covering the entire circumference of the base material in the circumferential direction is provided in the region on one end side of the base material, and pin terminals having different thicknesses of the tin-based layer in the circumferential direction of the base material, particularly the tin-based layer. It was shown that when the thickness t 32 of the pure tin layer in the thin film portion provided in the above was 0.5 μm or more, the solder wettability was excellent. Furthermore, it was shown that when the thickness t 31 of the alloy layer in the thin film portion was 0.1 μm or more, not only the whiskers but also the number of nodules was small. The solder wettability and the number of tin protrusions will be described in more detail in Test Example 2 described later. The sample No. shown in Table 3 51 and No. 52 will be described in Test Example 2.
加えて、上述のはんだ濡れ性に優れるピン端子は、基材の他端側の領域に、基材の長手方向に均一的な厚さを有する錫系層を備えることが示された。このようなピン端子は、相手側端子に他端側の領域を挿入し易く、挿入性に優れるといえる。
In addition, it was shown that the above-mentioned pin terminal having excellent solder wettability is provided with a tin-based layer having a uniform thickness in the longitudinal direction of the base material in the region on the other end side of the base material. Such a pin terminal can be said to be excellent in insertability because the region on the other end side can be easily inserted into the mating terminal.
そして、上述のようにはんだ濡れ性に優れる上に、相手側端子への挿入性にも優れるピン端子、更にはウィスカの数が少ないピン端子は、上述の多段めっき製法を利用すること、特に二次めっき後の熱処理温度を錫の融点以下とすることで製造されることが示された。熱処理温度については、後述する試験例2でより詳細に説明する。
As described above, the pin terminals having excellent solder wettability and also having excellent insertability into the mating terminal, and the pin terminals having a small number of whiskers, use the above-mentioned multi-stage plating method, in particular, two. It was shown that it is produced by setting the heat treatment temperature after the next plating to be equal to or lower than the melting point of tin. The heat treatment temperature will be described in more detail in Test Example 2 described later.
なお、基材の断面形状が正方形以外の長方形や多角形、円形等である場合には、錫系層の厚さの測定点を以下のようにとる。基材の断面形状が正方形以外の長方形や多角形の場合、上述の先端からの1mmの地点等において、基材の任意の一面について幅方向の中心位置及びその近傍を測定点とする。この測定点に向かい合う位置も測定点とする。また、両測定点をつなぐ直線に対して、直交する方向に位置する向かい合う箇所も測定点とする。基材の断面形状が円形の場合、上述の先端からの1mmの地点等において、任意の直径方向に向かい合う箇所、及びこの直径方向と90°ずれた直径方向に向かい合う箇所をそれぞれ測定点とする。
If the cross-sectional shape of the base material is a rectangle, polygon, circle, etc. other than a square, the measurement points for the thickness of the tin-based layer are taken as follows. When the cross-sectional shape of the base material is a rectangle or polygon other than a square, the measurement point is the center position in the width direction and its vicinity with respect to any one surface of the base material at a point 1 mm from the tip described above. The position facing this measurement point is also used as the measurement point. In addition, the points facing each other in the direction orthogonal to the straight line connecting the two measurement points are also set as the measurement points. When the cross-sectional shape of the base material is circular, the measurement points are a point facing an arbitrary diametrical direction and a point facing the diametrical direction deviated by 90 ° from the diametrical direction at a point 1 mm from the tip described above.
[試験例2]
二次めっき後の熱処理温度と、ピン端子の最大濡れ力及び錫の突起物の数との関係を調べた。 [Test Example 2]
The relationship between the heat treatment temperature after secondary plating, the maximum wetting force of the pin terminals, and the number of tin protrusions was investigated.
二次めっき後の熱処理温度と、ピン端子の最大濡れ力及び錫の突起物の数との関係を調べた。 [Test Example 2]
The relationship between the heat treatment temperature after secondary plating, the maximum wetting force of the pin terminals, and the number of tin protrusions was investigated.
ここでは、試験例1で作製した試料に加えて、以下の試料No.51,No.52を作製した。試料No.51,No.52は、試料No.3に対して、二次めっき後の熱処理温度を150℃又は180℃に変えたことを除いて、試料No.3と同様にして作製した。
Here, in addition to the sample prepared in Test Example 1, the following sample No. 51, No. 52 was made. Sample No. 51, No. 52 is the sample No. With respect to No. 3, except that the heat treatment temperature after the secondary plating was changed to 150 ° C. or 180 ° C., the sample No. It was produced in the same manner as in 3.
試料No.51,No.52について、二次めっき後の熱処理温度(℃)、最大濡れ力(mN)、錫の突起物の数(個/(0.35mm×0.35mm))を表3に示す。また、試料No.51について、基材の一端側の領域に存在する錫系層の最大値t1(μm)、最小値t2(μm)、基材の第三面及び第四面に存在する薄膜部中の内層の厚さt31(μm)及び外層の厚さt32(μm)を表3に示す。差(t1-t2)、比(t2/t1)を求め、その結果も表3に示す。最大濡れ力、錫の突起物の数、錫系層の厚さの測定方法は、試験例1と同様である。
Sample No. 51, No. Table 3 shows the heat treatment temperature (° C.) after the secondary plating, the maximum wetting force (mN), and the number of tin protrusions (pieces / (0.35 mm × 0.35 mm)) for 52. In addition, sample No. With respect to 51, the maximum value t 1 (μm) and the minimum value t 2 (μm) of the tin-based layer existing in the region on one end side of the base material, and the thin film portions existing on the third and fourth surfaces of the base material. Table 3 shows the thickness t 31 (μm) of the inner layer and the thickness t 32 (μm) of the outer layer. The difference (t 1- t 2 ) and the ratio (t 2 / t 1 ) were obtained, and the results are also shown in Table 3. The method for measuring the maximum wetting force, the number of tin protrusions, and the thickness of the tin-based layer is the same as in Test Example 1.
図9は、二次めっき後の熱処理温度と、最大濡れ力及び錫の突起物の数との関係を示すグラフである。このグラフにおいて、横軸は、熱処理温度(℃)を示す。左縦軸は、最大濡れ力(mN)を示し、凡例は丸印である。右縦軸は、錫の突起物の数(個/(0.35mm×0.35mm))を示し、凡例は菱形印である。
FIG. 9 is a graph showing the relationship between the heat treatment temperature after secondary plating, the maximum wetting force, and the number of tin protrusions. In this graph, the horizontal axis represents the heat treatment temperature (° C.). The left vertical axis shows the maximum wetting force (mN), and the legend is a circle. The right vertical axis shows the number of tin protrusions (pieces / (0.35 mm × 0.35 mm)), and the legend is a diamond mark.
図10は、各試料の外層の厚さt32と、最大濡れ力との関係を示すグラフである。このグラフにおいて、横軸は、外層の厚さt32(μm)を示す。縦軸は、最大濡れ力(mN)を示す。
FIG. 10 is a graph showing the relationship between the thickness t 32 of the outer layer of each sample and the maximum wetting force. In this graph, the horizontal axis represents the thickness of the outer layer t 32 (μm). The vertical axis indicates the maximum wetting force (mN).
図11は、各試料の内層の厚さt31と、錫の突起物の数との関係を示すグラフである。このグラフにおいて、横軸は、内層の厚さt31(μm)を示す。縦軸は、錫の突起物の数(個/(0.35mm×0.35mm))を示す。
FIG. 11 is a graph showing the relationship between the thickness t 31 of the inner layer of each sample and the number of tin protrusions. In this graph, the horizontal axis represents the inner layer thickness t 31 (μm). The vertical axis shows the number of tin protrusions (pieces / (0.35 mm × 0.35 mm)).
図12A~図12Dは、順に試料No.1,No.2,No.4,No.50のピン端子において、錫の突起物の数の測定に利用する顕微鏡観察像である。図12A~図12Dの顕微鏡観察像はいずれも、上述の三次元レーザ顕微鏡で観察した像であり、一辺の長さが0.35mmである正方形の観察視野を示す。
12A to 12D show the sample numbers in order. 1, No. 2, No. 4, It is a microscope observation image used for measuring the number of tin protrusions in the pin terminal of No. 50. The microscopic observation images of FIGS. 12A to 12D are all images observed by the above-mentioned three-dimensional laser microscope, and show a square observation field of view having a side length of 0.35 mm.
上述の表3,図9に示すように、最大濡れ力及び錫の突起物の数は、二次めっき後の熱処理温度に影響を受けるといえる。
As shown in Tables 3 and 9 above, it can be said that the maximum wetting force and the number of tin protrusions are affected by the heat treatment temperature after the secondary plating.
最大濡れ力に着目する。
最大濡れ力は、熱処理温度が210℃までの範囲において概ね一定であり、熱処理温度の上昇に伴って低下し、熱処理温度が240℃であると極端に低下する。 Focus on maximum wetting power.
The maximum wetting force is substantially constant in the range of the heat treatment temperature up to 210 ° C., decreases as the heat treatment temperature rises, and extremely decreases when the heat treatment temperature is 240 ° C.
最大濡れ力は、熱処理温度が210℃までの範囲において概ね一定であり、熱処理温度の上昇に伴って低下し、熱処理温度が240℃であると極端に低下する。 Focus on maximum wetting power.
The maximum wetting force is substantially constant in the range of the heat treatment temperature up to 210 ° C., decreases as the heat treatment temperature rises, and extremely decreases when the heat treatment temperature is 240 ° C.
また、図10に示すように、基材の一端側の領域に存在する錫系層のうち、基材に接して設けられた薄膜部において、純錫からなる外層の厚さt32が厚いほど最大濡れ力が高い傾向にある。ここでは、外層の厚さt32が1.0μm以上であると、最大濡れ力は0.3mN以上であり、0.4mN以上の試料も多い。外層の厚さt32が0.5μm以上であれば、0.25mN以上の最大濡れ力が期待できる。
Further, as shown in FIG. 10, among the tin-based layers existing in the region on one end side of the base material, the thicker the thickness t 32 of the outer layer made of pure tin, the thicker the thin film portion provided in contact with the base material. The maximum wetting power tends to be high. Here, when the thickness t 32 of the outer layer is 1.0 μm or more, the maximum wetting force is 0.3 mN or more, and there are many samples of 0.4 mN or more. If the thickness t 32 of the outer layer is 0.5 μm or more, a maximum wetting force of 0.25 mN or more can be expected.
以上のことから、熱処理温度が低いほど、二次めっきによって形成した純錫層が熱処理後に残存して、外層の厚さt32が厚くなり易いことで、最大濡れ力が高められるといえる。ここでは、熱処理温度は、240℃未満が好ましいといえ、図9に示すグラフの傾向から錫の融点(約232℃)未満が好ましいといえる。また、最大濡れ力の向上の観点からは、熱処理温度は220℃以下がより好ましいといえる。
From the above, it can be said that the lower the heat treatment temperature, the more the pure tin layer formed by the secondary plating remains after the heat treatment, and the thickness t 32 of the outer layer tends to be thicker, so that the maximum wetting force can be increased. Here, it can be said that the heat treatment temperature is preferably less than 240 ° C., and it can be said that the heat treatment temperature is preferably less than the melting point of tin (about 232 ° C.) from the tendency of the graph shown in FIG. Further, from the viewpoint of improving the maximum wetting force, it can be said that the heat treatment temperature is more preferably 220 ° C. or lower.
次に、錫の突起物の数に着目する。
いずれの試料も、上述の針状の突起物であるウィスカが観察されず、一部の試料に、球状の突起物であるノジュールのみが観察された。従って、図9,図11に示す錫の突起物の数は、ノジュールの数である。また、以下に述べるノジュールの数は、0.35mm×0.35mmの視野内に存在する数である。 Next, we focus on the number of tin protrusions.
Whiskers, which are the above-mentioned needle-shaped protrusions, were not observed in any of the samples, and only nodules, which are spherical protrusions, were observed in some samples. Therefore, the number of tin protrusions shown in FIGS. 9 and 11 is the number of nodules. The number of nodules described below is a number existing in a field of view of 0.35 mm × 0.35 mm.
いずれの試料も、上述の針状の突起物であるウィスカが観察されず、一部の試料に、球状の突起物であるノジュールのみが観察された。従って、図9,図11に示す錫の突起物の数は、ノジュールの数である。また、以下に述べるノジュールの数は、0.35mm×0.35mmの視野内に存在する数である。 Next, we focus on the number of tin protrusions.
Whiskers, which are the above-mentioned needle-shaped protrusions, were not observed in any of the samples, and only nodules, which are spherical protrusions, were observed in some samples. Therefore, the number of tin protrusions shown in FIGS. 9 and 11 is the number of nodules. The number of nodules described below is a number existing in a field of view of 0.35 mm × 0.35 mm.
錫の突起物の数は、熱処理を行わないと多く、熱処理温度の上昇に伴って少なくなる。図12Aに示すように、熱処理を行っていない試料No.1では、上述の針状の突起物であるウィスカが存在しないものの、球状のノジュールの数が多く、30個を超える。図12Aに付した白い破線の丸は、複数のノジュールのうち、一部のノジュールを囲んでいる。なお、ノジュールであれば30個超と多くても、ノジュールに起因するピン端子同士の短絡が生じ難い。但し、ノジュールが多過ぎると、針状の突起物であるウィスカに成長することが危惧される。そのため、ノジュールのみの数は、本例のように40個以下が好ましい。
The number of tin protrusions is large without heat treatment and decreases as the heat treatment temperature rises. As shown in FIG. 12A, the sample No. which has not been heat-treated. In No. 1, although the whiskers, which are the above-mentioned needle-shaped protrusions, do not exist, the number of spherical nodules is large and exceeds 30. The white dashed circle attached to FIG. 12A surrounds a part of the nodules among the plurality of nodules. It should be noted that even if the number of nodules is as large as 30 or more, short circuits between pin terminals due to nodules are unlikely to occur. However, if there are too many nodules, there is a concern that they will grow into whiskers, which are needle-shaped protrusions. Therefore, the number of nodules alone is preferably 40 or less as in this example.
これに対し、熱処理温度が180℃を超えると、特に200℃以上であるとノジュールの数は15個以下、ここでは更に10個以下である。図12Bにおいて複数の円形状領域の中心にある粒状の部分がノジュールである。この試験では、熱処理温度が200℃を超えるとノジュールの数は0個であり、ウィスカ及びノジュールが実質的に存在していない。図12C,図12Dでは、上述の円形状の領域が観察されない。
On the other hand, when the heat treatment temperature exceeds 180 ° C., especially when the temperature is 200 ° C. or higher, the number of nodules is 15 or less, and here, 10 or less. In FIG. 12B, the granular portion at the center of the plurality of circular regions is a nodule. In this test, when the heat treatment temperature exceeds 200 ° C., the number of nodules is 0, and whiskers and nodules are substantially absent. In FIGS. 12C and 12D, the above-mentioned circular region is not observed.
また、図11に示すように、基材の一端側の領域に存在する錫系層のうち、基材に接して設けられた薄膜部において、錫と銅とを含む合金からなる内層の厚さt31が厚いほど、ノジュールの数が少ない。ここでは、内層の厚さt31が0.1μm以上であると、ノジュールの数が30個以下である。内層の厚さt31が0.2μm以上であればノジュールの数は20個以下である。更に、内層の厚さt31が0.2μm超であればノジュールの数が15個以下、ここでは更に10個以下である。
Further, as shown in FIG. 11, among the tin-based layers existing in the region on one end side of the base material, the thickness of the inner layer made of an alloy containing tin and copper in the thin film portion provided in contact with the base material. The thicker t 31, the smaller the number of nodules. Here, when the thickness t 31 of the inner layer is 0.1 μm or more, the number of nodules is 30 or less. If the thickness t 31 of the inner layer is 0.2 μm or more, the number of nodules is 20 or less. Further, if the thickness t 31 of the inner layer is more than 0.2 μm, the number of nodules is 15 or less, and here, 10 or less.
以上のことから、熱処理温度が高いほど、二次めっきによって形成した純錫層が熱処理によって合金化して内層の厚さt31が厚くなり易いことで、ノジュールを含めてウィスカの数が少なくなるといえる。ここでは、熱処理温度は180℃超、更に200℃以上が好ましいといえる。
From the above, it can be said that the higher the heat treatment temperature, the more the pure tin layer formed by the secondary plating is alloyed by the heat treatment and the inner layer thickness t 31 tends to be thicker, so that the number of whiskers including nodules decreases. .. Here, it can be said that the heat treatment temperature is preferably more than 180 ° C. and more preferably 200 ° C. or higher.
本発明はこれらの例示に限定されるものではなく、請求の範囲によって示され、請求の範囲と均等の意味及び範囲内での全ての変更が含まれることが意図される。
The present invention is not limited to these examples, but is indicated by the claims and is intended to include all modifications within the meaning and scope equivalent to the claims.
例えば、試験例1,2の基材の組成、基材の大きさ、めっき層の組成や厚さ、熱処理条件等を適宜変更できる。
めっき層の組成の変形例として、試験例1,2で用いためっき付き板として、錫系層と銅合金板との間に下地層を含むものを用いることが挙げられる。この場合、基材の一端側の領域は、先端被覆部の厚膜部の下に下地層を含む。基材の他端側の領域は、錫系層である後端被覆部の下に下地層を含む。 For example, the composition of the base material of Test Examples 1 and 2, the size of the base material, the composition and thickness of the plating layer, the heat treatment conditions, and the like can be appropriately changed.
As a modification of the composition of the plating layer, as the plated plate used in Test Examples 1 and 2, a plate containing a base layer between the tin-based layer and the copper alloy plate can be mentioned. In this case, the region on one end side of the base material includes a base layer under the thick film portion of the tip coating portion. The region on the other end side of the base material includes a base layer under the rear end covering portion which is a tin-based layer.
めっき層の組成の変形例として、試験例1,2で用いためっき付き板として、錫系層と銅合金板との間に下地層を含むものを用いることが挙げられる。この場合、基材の一端側の領域は、先端被覆部の厚膜部の下に下地層を含む。基材の他端側の領域は、錫系層である後端被覆部の下に下地層を含む。 For example, the composition of the base material of Test Examples 1 and 2, the size of the base material, the composition and thickness of the plating layer, the heat treatment conditions, and the like can be appropriately changed.
As a modification of the composition of the plating layer, as the plated plate used in Test Examples 1 and 2, a plate containing a base layer between the tin-based layer and the copper alloy plate can be mentioned. In this case, the region on one end side of the base material includes a base layer under the thick film portion of the tip coating portion. The region on the other end side of the base material includes a base layer under the rear end covering portion which is a tin-based layer.
1 ピン端子
2 基材
21 第一面、22 第二面、23 第三面、24 第四面
26 露出領域
3 めっき層
30 錫系層、31 先端被覆部、32 後端被覆部
34 薄膜部、35 厚膜部
300 下地層、301 内層、302 外層
6 コネクタ
60 筐体
7 コネクタ付きワイヤーハーネス
70 ワイヤーハーネス、71 電線
74,75,76 コネクタ
8 コントロールユニット
80 回路基板、81 スルーホール、85 はんだ
90 素材板、91 めっき付き板、92 成形材
93 部分めっき材、94 熱処理材
920 棒状部、925 連結部
931 二次めっき層、941 熱処理層
t1 最大値、t2 最小値、t31,t32,ti,to 厚さ 1pin terminal 2 base material 21 1st surface, 22 2nd surface, 23 3rd surface, 24 4th surface 26 Exposed area 3 Plating layer 30 Tin-based layer, 31 Tip coating part, 32 Rear end coating part 34 Thin film part, 35 Thick film part 300 Base layer, 301 Inner layer, 302 Outer layer 6 Connector 60 Housing 7 Wire harness with connector 70 Wire harness, 71 Wire 74,75,76 Connector 8 Control unit 80 Circuit board, 81 Through hole, 85 Solder 90 Material Plate, 91 Plated plate, 92 Molding material 93 Partial plating material, 94 Heat treatment material 920 Rod-shaped part, 925 connector 931 Secondary plating layer, 941 Heat treatment layer t 1 maximum value, t 2 minimum value, t 31 , t 32 , t i, t o thickness
2 基材
21 第一面、22 第二面、23 第三面、24 第四面
26 露出領域
3 めっき層
30 錫系層、31 先端被覆部、32 後端被覆部
34 薄膜部、35 厚膜部
300 下地層、301 内層、302 外層
6 コネクタ
60 筐体
7 コネクタ付きワイヤーハーネス
70 ワイヤーハーネス、71 電線
74,75,76 コネクタ
8 コントロールユニット
80 回路基板、81 スルーホール、85 はんだ
90 素材板、91 めっき付き板、92 成形材
93 部分めっき材、94 熱処理材
920 棒状部、925 連結部
931 二次めっき層、941 熱処理層
t1 最大値、t2 最小値、t31,t32,ti,to 厚さ 1
Claims (15)
- 棒状の基材と、前記基材の所定の領域を覆うめっき層とを備えるピン端子であって、
前記めっき層は、錫を含む金属から構成される錫系層を備え、
前記基材の一端側は、前記基材の周方向の全ての領域を覆う先端被覆部を備え、
前記錫系層は、前記先端被覆部を含み、
前記先端被覆部は、前記基材の周方向の異なる位置に薄膜部と厚膜部とを備え、
前記基材の構成材料は、Znの含有量が20質量%以下である銅合金、又は純銅である、
ピン端子。 A pin terminal including a rod-shaped base material and a plating layer covering a predetermined region of the base material.
The plating layer includes a tin-based layer composed of a metal containing tin.
One end side of the base material is provided with a tip covering portion that covers the entire circumferential region of the base material.
The tin-based layer includes the tip covering portion and contains the tip covering portion.
The tip covering portion includes a thin film portion and a thick film portion at different positions in the circumferential direction of the base material.
The constituent material of the base material is a copper alloy having a Zn content of 20% by mass or less, or pure copper.
Pin terminal. - 前記先端被覆部は、外層と内層とを備え、
前記外層の構成材料は、純錫であり、
前記内層の構成材料は、錫と銅とを含む合金である請求項1に記載のピン端子。 The tip covering portion includes an outer layer and an inner layer, and has an outer layer and an inner layer.
The constituent material of the outer layer is pure tin.
The pin terminal according to claim 1, wherein the constituent material of the inner layer is an alloy containing tin and copper. - 前記ピン端子の一端から前記ピン端子の長手方向に沿って1mmの地点を測定箇所とし、前記測定箇所で測定された前記先端被覆部の厚さの最大値t1と最小値t2との差(t1-t2)が0.20μm以上である請求項2に記載のピン端子。 A point 1 mm from one end of the pin terminal along the longitudinal direction of the pin terminal is set as a measurement point, and the difference between the maximum value t 1 and the minimum value t 2 of the thickness of the tip covering portion measured at the measurement point. (t 1 -t 2) the pin terminal according to claim 2 is at least 0.20 [mu] m.
- 前記ピン端子の一端から前記ピン端子の長手方向に沿って1mmの地点を測定箇所とし、前記測定箇所で測定された前記先端被覆部の厚さの最大値t1と最小値t2との比t2/t1が0.2以上0.8未満である請求項2又は請求項3に記載のピン端子。 A point 1 mm from one end of the pin terminal along the longitudinal direction of the pin terminal is set as a measurement point, and the ratio of the maximum value t 1 and the minimum value t 2 of the thickness of the tip covering portion measured at the measurement point. The pin terminal according to claim 2 or 3, wherein t 2 / t 1 is 0.2 or more and less than 0.8.
- 前記薄膜部は、前記基材に接して設けられると共に、前記最小値t2を有し、
前記厚膜部は、前記最大値t1を有する請求項3又は請求項4に記載のピン端子。 The thin film portion is provided in contact with the base material and has the minimum value t 2 .
The pin terminal according to claim 3 or 4, wherein the thick film portion has the maximum value t 1. - 前記基材において前記先端被覆部を備える箇所をその軸に直交する平面で切断した断面において、
前記基材の形状は、長方形状であり、
前記基材の外周面は、互いに向かい合って配置される第一面及び第二面と、互いに向かい合って配置される第三面及び第四面とを備え、
前記先端被覆部における前記第一面及び前記第二面の少なくとも一方を覆う箇所は、前記最大値t1を有し、
前記先端被覆部における前記第三面及び前記第四面の少なくとも一方を覆う箇所は、前記最小値t2を有する請求項3から請求項5のいずれか1項に記載のピン端子。 In the cross section of the base material, in which the portion provided with the tip covering portion is cut in a plane orthogonal to the axis thereof.
The shape of the base material is rectangular and
The outer peripheral surfaces of the base material include a first surface and a second surface arranged to face each other, and a third surface and a fourth surface arranged to face each other.
The portion of the tip covering portion that covers at least one of the first surface and the second surface has the maximum value t 1 .
The pin terminal according to any one of claims 3 to 5, wherein the portion of the tip covering portion that covers at least one of the third surface and the fourth surface is the pin terminal having the minimum value t 2. - 前記めっき層は、前記先端被覆部における前記第一面及び前記第二面を覆う箇所と前記基材との間に下地層を備え、
前記先端被覆部における前記第三面及び前記第四面を覆う箇所は、前記基材に接して設けられ、
前記下地層の構成材料は、純ニッケル又はニッケル合金である請求項6に記載のピン端子。 The plating layer includes a base layer between a portion of the tip covering portion that covers the first surface and the second surface and the base material.
The portion of the tip covering portion that covers the third surface and the fourth surface is provided in contact with the base material.
The pin terminal according to claim 6, wherein the constituent material of the base layer is pure nickel or a nickel alloy. - 前記第一面、前記第二面、前記第三面、及び前記第四面において、前記ピン端子の一端から前記ピン端子の長手方向に沿って1mmの地点と、3mmの地点と、5mmの地点とを前記先端被覆部の厚さの測定箇所とし、三つの前記測定箇所において最大厚さと最小厚さとの差をとり、この差の最大値が1.0μm以下である請求項6又は請求項7に記載のピン端子。 On the first surface, the second surface, the third surface, and the fourth surface, a point 1 mm, a point 3 mm, and a point 5 mm along the longitudinal direction of the pin terminal from one end of the pin terminal. 6 or 7 where the difference between the maximum thickness and the minimum thickness is taken at the three measurement points, and the maximum value of the difference is 1.0 μm or less. Pin terminal described in.
- 前記薄膜部における前記外層の厚さは、0.5μm以上であり、
前記薄膜部における前記内層の厚さは、0.1μm以上である請求項2から請求項8のいずれか1項に記載のピン端子。 The thickness of the outer layer in the thin film portion is 0.5 μm or more.
The pin terminal according to any one of claims 2 to 8, wherein the thickness of the inner layer in the thin film portion is 0.1 μm or more. - 前記薄膜部の表面に存在するウィスカの数は、一辺の長さが0.35mmである正方形の視野内に15個以下であり、
メニスコグラフ試験機によって測定される前記先端被覆部の最大濡れ力は、0.25mN以上である請求項1から請求項9のいずれか1項に記載のピン端子。 The number of whiskers existing on the surface of the thin film portion is 15 or less in a square field of view having a side length of 0.35 mm.
The pin terminal according to any one of claims 1 to 9, wherein the maximum wetting force of the tip coating portion measured by a meniscograph tester is 0.25 mN or more. - 前記基材の他端側は、前記基材の周方向の異なる位置に後端被覆部と露出領域とを備え、
前記錫系層は、前記後端被覆部を含み、
前記後端被覆部は、前記基材の他端側における周方向の一部の領域を覆い、
前記露出領域では、前記めっき層が設けられず前記基材が露出される請求項1から請求項10のいずれか1項に記載のピン端子。 The other end side of the base material is provided with a rear end covering portion and an exposed region at different positions in the circumferential direction of the base material.
The tin-based layer includes the rear end covering portion.
The rear end covering portion covers a part of the circumferential direction on the other end side of the base material.
The pin terminal according to any one of claims 1 to 10, wherein the plating layer is not provided in the exposed region and the base material is exposed. - 請求項1から請求項11のいずれか1項に記載のピン端子を備える、
コネクタ。 The pin terminal according to any one of claims 1 to 11 is provided.
connector. - 請求項12に記載のコネクタと、ワイヤーハーネスとを備え、
前記ワイヤーハーネスは、前記ピン端子の他端側の領域に接続される、
コネクタ付きワイヤーハーネス。 The connector according to claim 12 and a wire harness are provided.
The wire harness is connected to the region on the other end side of the pin terminal.
Wire harness with connector. - 請求項12に記載のコネクタ、又は請求項13に記載のコネクタ付きワイヤーハーネスと、回路基板とを備え、
前記回路基板と前記ピン端子の一端側の領域とは、はんだによって接続される、
コントロールユニット。 The connector according to claim 12 or the wire harness with a connector according to claim 13 and a circuit board are provided.
The circuit board and the region on one end side of the pin terminal are connected by solder.
control unit. - 前記回路基板は、エンジンの燃料噴射及びエンジン点火の少なくとも一方の制御を行う請求項14に記載のコントロールユニット。 The control unit according to claim 14, wherein the circuit board controls at least one of engine fuel injection and engine ignition.
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JP2006249509A (en) * | 2005-03-10 | 2006-09-21 | Shimizu:Kk | Surface treatment method and method for producing electronic component using the same |
JP2008274364A (en) * | 2007-05-01 | 2008-11-13 | Kobe Steel Ltd | Terminal for engaging type connector and manufacturing method therefor |
JP2015155560A (en) * | 2014-02-20 | 2015-08-27 | 株式会社神戸製鋼所 | Copper alloy sheet strip with surface coating layer excellent in heat resistance |
WO2018150641A1 (en) * | 2017-02-15 | 2018-08-23 | Jx金属株式会社 | Metallic material for electronic component, method for manufacturing said metallic material, and connector terminal, connector, and electronic component in which said metallic material is used |
WO2018221089A1 (en) * | 2017-05-30 | 2018-12-06 | オリエンタル鍍金株式会社 | Pcb terminal production method and pcb terminal |
JP2019046690A (en) * | 2017-09-04 | 2019-03-22 | 株式会社デンソー | Press-fit terminal and electronic apparatus |
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JP2006249509A (en) * | 2005-03-10 | 2006-09-21 | Shimizu:Kk | Surface treatment method and method for producing electronic component using the same |
JP2008274364A (en) * | 2007-05-01 | 2008-11-13 | Kobe Steel Ltd | Terminal for engaging type connector and manufacturing method therefor |
JP2015155560A (en) * | 2014-02-20 | 2015-08-27 | 株式会社神戸製鋼所 | Copper alloy sheet strip with surface coating layer excellent in heat resistance |
WO2018150641A1 (en) * | 2017-02-15 | 2018-08-23 | Jx金属株式会社 | Metallic material for electronic component, method for manufacturing said metallic material, and connector terminal, connector, and electronic component in which said metallic material is used |
WO2018221089A1 (en) * | 2017-05-30 | 2018-12-06 | オリエンタル鍍金株式会社 | Pcb terminal production method and pcb terminal |
JP2019046690A (en) * | 2017-09-04 | 2019-03-22 | 株式会社デンソー | Press-fit terminal and electronic apparatus |
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