WO2021053164A1 - Facettenspiegel für eine beleuchtungsoptik einer projektionsbelichtungsanlage - Google Patents
Facettenspiegel für eine beleuchtungsoptik einer projektionsbelichtungsanlage Download PDFInfo
- Publication number
- WO2021053164A1 WO2021053164A1 PCT/EP2020/076137 EP2020076137W WO2021053164A1 WO 2021053164 A1 WO2021053164 A1 WO 2021053164A1 EP 2020076137 W EP2020076137 W EP 2020076137W WO 2021053164 A1 WO2021053164 A1 WO 2021053164A1
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- WIPO (PCT)
- Prior art keywords
- facet
- base body
- facets
- stop
- stop elements
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
Definitions
- the invention relates to a facet mirror for an illumination optics of a projection exposure system.
- the invention further relates to a single facet for a facet mirror of an illumination optics of a projection exposure system.
- the invention also relates to lighting optics, a lighting system, an optical system and a projection exposure system with a corresponding facet mirror.
- the invention relates to a method for producing a micro- or nanostructured component and a component produced according to the method.
- Facet mirrors for lighting optics of Giionsbe lighting systems with a large number of displaceable individual facets are known from the prior art.
- the individual facets are designed in such a way that they do not interfere with one another in the event of a controlled displacement.
- the facets are designed in particular in such a way that they do not touch one another when they are displaced.
- a mechanism is known from the prior art in order to protect the facets of the facet mirror, in particular when it is being transported, against undesired movements.
- the mechanism does not protect the facets during normal operation of the facet mirror.
- the essence of the invention is to design the individual facets of the facet mirror in such a way that they touch a stop surface in one or more displacement positions.
- the individual facets of the facet mirror can in particular be designed in such a way that they touch a stop surface in reversibly adjustable displacement positions.
- Such a reversibly adjustable displacement position is also called an active or actuatable displacement position designated.
- the individual facets can in particular have one or more discrete active displacement positions. They can also be designed such that they only touch a stop surface in the event of an undesired deflection, in particular in the event of a parasitic movement, in particular in the event of a transport and / or earthquake.
- Such a deflection is also referred to as a passive displacement position.
- the shift position is understood to mean both the actively possible and the passively possible shift positions.
- the facets touch the stop surface with their base body or a stop element arranged on or in this.
- the reflection surfaces of the individual facets preferably remain in contact with each other.
- the stop surface is in particular a defined, in particular a specific stop surface.
- the stop surface is in particular a stop surface for the mutual stop of two adjacent facets.
- the stop surface is in particular spaced apart from the reflection surface of the respective individual facet.
- the stop surface and the reflection surface of an individual facet form, in particular, disjoint areas.
- the stop surface is in particular formed in or on the facet base body.
- the stop surface can in particular be designed or arranged in or on the facet base body in such a way that, when projected in the direction of a surface normal to the reflection surface of the individual facet, in particular in the case of a projection in the direction of a surface normal through the centroid of the reflection surface of the individual facet, it forms an outer edge of the Forms projection of the facet base body or protrudes over such in at least one direction perpendicular to the surface normal.
- the projection is in particular a parallel projection, in particular an orthogonal projection.
- the projection is, in particular, a projection into a projection plane which, in particular, is perpendicular to the surface normal. According to the invention, it was recognized that this can prevent the facets from hitting one another in an uncontrolled manner.
- An uncontrolled clash is understood here to mean a clash of the facets in an uncontrolled, in particular an undesired area.
- the individual facets can in particular be designed in such a way that they only touch a stop surface in actuatable, adjustable displacement positions.
- the prerequisite for touching the stop surface is not an undesirable or unforeseeable external effect on the individual facets.
- the individual facets can also be designed in such a way that they touch the stop surface in the event of an undesired or unpredictable external influence, in particular exclusively in the case of an undesired or unpredictable external influence.
- At least a subset of the individual facets in particular all of the individual facets, can have displacement areas such that adjacent individual facets touch one another in one or more displacement positions.
- the individual facets can touch each other, especially in passive displacement positions.
- the individual facets are preferably arranged without contact, in particular at a distance from one another.
- they can be in at least one active displacement position, in particular in all active displacement positions, in relation to all stop surfaces.
- the idea according to the invention relates to an optical module with a plurality of displaceable optical elements.
- adjacent individual facets in a basic or neutral position are each spaced apart from one another by a gap.
- a corresponding gap can also be in predetermined switching positions, in particular in any desired switching position to be available.
- the reflection surfaces of the individual facets are preferably arranged at a distance from one another in the basic or neutral position.
- the individual facets are in particular also spaced apart from all stop surfaces by a gap.
- the gaps are sufficiently large to enable the individual facets to be shifted in the shifting area. On the other hand, the gaps are as narrow as possible in order to enable the individual facets to be packed tightly.
- the width of the gaps between adjacent individual facets can in particular be less than 1 mm, in particular less than 0.5 mm.
- the width of the column is in particular no more than 50%, in particular no more than 30%, in particular no more than 20%, in particular no more than 15%, in particular no more than 10%, in particular no more than 5%, in particular no more than 3%, in particular no more than 2%, in particular no more than 1% of the He stretching the individual facets, in particular their base bodies or their reflective surfaces, in the corresponding direction.
- the area within which the facet can be actuated displaceably is referred to as the displacement area of an individual facet.
- This area is also known as the active relocation area.
- the individual facets are displaced by external influences, for example vibrations, in particular when the facetted mirror is being transported.
- the area possible here is called the passive displacement area. In particular, it can be larger than the active displacement range.
- the displacement area of a facet is understood to mean the largest displacement area in each case, in particular the larger of the active and passive displacement area in each case.
- the total area of the gaps between adjacent individual facets is at most, in particular, at most 50%, in particular at most 30%, in particular at most 20%, in particular at most 15%, in particular at most 10%, in particular at most 5%, in particular at most 3%, in particular at most 2%, in particular at most 1% of the total area of the facet mirror or the sum of the reflection surfaces of all the individual facets of the facet mirror.
- the individual facets in particular have one, two or more degrees of freedom of displacement. In particular, they have two degrees of freedom of tilting. In particular, they can be tilted around two, in particular special, tilting axes that run perpendicular to one another. They can also be linearly displaceable in the direction parallel to a surface normal, in particular in a central point of the reflection surface.
- the individual facets in particular their facet base bodies, can each be formed monolithically.
- the component of an individual facet on which the reflective surface is applied is referred to here as the facet base body.
- the facet base body has, in particular, a cross section which essentially corresponds to the reflection surface.
- the cross section of the facet base body deviates in particular by a maximum of 30%, in particular a maximum of 20%, in particular a maximum of 10% from the dimensions of the reflective surface of the respective facet.
- the facet base body points in particular in a projection, in particular in a parallel projection, in particular in an orthogonal projection, in the direction of a surface normal to the reflection surface, in particular in the area of one of the stop surfaces and / or in the area of one of the stop elements in the direction perpendicular to a surface normal on the reflection surface of the respective individual facet has a cross section which deviates by at most 30%, in particular at most 20%, in particular at most 10% from the dimensions of the reflective surface of the respective facet.
- This can in particular be a square, in particular special elongated cross-section.
- the cross section can have straight or curved Beran applications.
- the aspect ratio of this cross section of the basic facet body corresponds, in particular within the specified maximum deviations, to that of the reflection surface of the respective individual facet. In this regard, reference is made to the following description.
- the individual facets can also have further components, for example elements of an actuator device for displacing the respective facet and / or elements for supporting the facet.
- an actuator device for displacing the respective facet and / or elements for supporting the facet.
- the individual facets are preferably elongated. They preferably have an aspect ratio (greatest extent in the longitudinal direction: greatest extent perpendicular thereto, that is to say in the transverse direction) of at least 3: 1, in particular at least at least
- the aspect ratio is preferably at most 100: 1, in particular at most 50: 1, in particular at most 30: 1, in particular at most 20: 1.
- the stop surface which is touched by a single facet in a certain displacement position, is formed by another single facet, in particular its base body, in particular a predetermined area of the base body, or by a separate stop element.
- the facet mirror can in particular be designed in such a way that contact between two adjacent individual facets is only possible when non-actuatable degrees of freedom are excited. Such a deflection of the individual facets can occur, for example, in the event of an earthquake or transport load.
- the contact with the separate stop element can also be limited to a stimulation of non-actuatable degrees of freedom, in particular in the event of an earthquake or transport load.
- the facet base body of the individual facets is designed in such a way that adjacent individual facets touch each other in certain deflection or displacement positions in a predetermined area of the facet base body.
- the area of the facet base body in which contact can occur is preferably at a distance from the reflection surface of the respective individual facets, in particular from their edges. This reduces the risk of damage to the reflection surface, in particular its edges, due to a collision of adjacent individual facets. This also applies in particular to unplanned, in particular unpredictable, collisions such as those that can occur, for example, when transporting the facet mirror and / or in the event of an earthquake.
- the predetermined area of the facet base body forms, in particular, the stop surface.
- the facet base bodies are designed in such a way that a distance between the facet base bodies of two adjacent individual facets is less than a distance between their reflection surfaces.
- one or more stop elements are provided on or in the facet base body.
- the stop elements serve as a buffer. In a sense, they serve as bumpers. They enable a targeted specification of the areas in which adjacent individual facets can touch, in particular they enable the targeted specification of the stop surfaces.
- the stop elements can be designed as separate elements and each connected to the faceted base body. You can in particular be positively connected to the faceted base body. According to one aspect of the invention, the stop elements are connected to the facet base body by gluing, soldering, welding, screwing, clipping, shrinking or plugging. In principle, all conceivable connection techniques for connecting the attachment elements to the facet base bodies are possible.
- the stop elements can in particular be exchangeable.
- the stop elements can also be designed in one piece with the facet base bodies. This enables a particularly simple and stable production.
- the stop elements are preferably arranged at predetermined positions, in particular in the region of vertices, corners, edges or other predetermined positions of the facet base body.
- the stop elements can extend over the entire width and / or over the entire length of the facet base body. In particular, they can extend over the entire circumference of the facet base body. As an alternative to this, it is possible to provide a plurality of stop elements, each of which has a smaller extension. This can save weight. This has a positive effect on the mechanical properties of the individual facets.
- one or more stop elements can be arranged at the end of the facet base body, in particular in the region of its ends in the longitudinal direction. It is also possible to arrange one or more stop elements in a central area, in particular in a central area with regard to the longitudinal direction, on the facet base body. This can be particularly advantageous in the case of curved facets.
- the stop elements can in particular be provided in the areas in which collisions are most likely to occur. They can in particular be arranged in the areas in which the distance between the respective facet base body and an adjacent facet base body is minimal. This information can relate to the position of the facet base bodies in a neutral, that is to say undeflected basic state and / or to a displacement position of adjacent facet base bodies in which their spacing is minimal.
- the stop elements can be formed from the same material as the facet base body. In particular, they can be formed from copper or a copper alloy. They can also be made or consist of other materials. Other materials that can be used for the stop elements are, for example, Zerodur, ULE, aluminum, ceramic, quartz, silicon.
- the stop elements can be provided with a coating, in particular a wear-resistant coating. In this way, particle abrasion can be reduced, in particular prevented.
- the stop elements are laterally over the Re flexionsthesis. In particular, they protrude laterally over the reflection surface when viewed from above. In particular, they protrude laterally over the reflection surface in the transverse direction.
- the stop elements in particular have an extension in the direction parallel to the reflection surface, which is greater than the extension of the reflection surface in this direction.
- the stop elements in particular have an extension in the direction parallel to the width of the reflection surface, which is greater than the width of the reflection surface.
- the stop elements protrude over the facet base body in the opposite direction to the surface normal of the reflection surface.
- they protrude above the facet base on the side of the facet base opposite the reflective surface.
- the stop elements can also have an extension in the direction parallel to a surface normal paint of the reflection surface, which is smaller than the extension of the facet base body in this direction.
- all of the individual facets of the facet mirror each have identical stop elements and / or stop elements at essentially identical positions.
- different individual facets can have different stop elements and / or stop elements at different positions.
- the equality and / or the differences of the stop elements can relate to their shape and / or their arrangement on the respective individual facets.
- the stop elements have an extension which extends over the entire length of an individual facet.
- the stop elements can in particular extend over the entire circumference of an individual facet.
- the individual facets in particular their base bodies, have means for weight reduction and / or a weight-reduced design.
- bores, recesses, pockets, thinnings or bevels can serve as means for reducing weight.
- the facet mirror has one or more means for limiting the displacement range of the individual facets.
- the facet mirror can in particular have one or more means for limiting undesired deflection, in particular for limiting parasitic movements of the individual facets.
- the means for limiting the displacement range in particular the means for limiting the undesired parasitic movements of the individual facets, can form the stop surface.
- the means for limiting the displacement range of the individual facets can be formed out as pins, wel che are in particular also referred to as snubbers, forks, pockets or U-profiles.
- the game of the respective stop surfaces is preferably smaller than the facet gap to be adjacent individual facets.
- the free end of the means for limiting the displacement area of an individual facet is arranged in the area of the axis of rotation.
- the means or means for limiting the displacement range of the individual facets are adjusted.
- Another object of the invention is to improve individual facets for a facet mirror of an illumination optics of a projection exposure system, in particular in accordance with the preceding description.
- one or more stop surfaces and / or stop elements are provided on or in the facet base body which, when projected in the direction of a surface normal onto the reflection surface, protrude beyond the reflection surface in at least one direction perpendicular to this surface normal.
- the surface normal is in particular the surface normal through the centroid of the reflection surface.
- the individual facets have one or more stop surfaces and / or stop elements which, when projected in the direction of a surface normal onto the reflection surface, protrude both in at least one direction perpendicular to this surface normal and in an opposite direction over the reflection surface.
- the individual facets have one or more stop surfaces and / or stop elements which, when projected in the direction of a surface normal onto the reflection surface, protrude beyond the reflection surface over the entire circumference of the reflection surface.
- the stop elements can be a special design of the Facettengrundkör pers, in particular a thickening of the same.
- the base body is preferably wider, at least in some areas, than the reflection surface of the individual facet.
- the stop elements can also be separate components which are connected to the facet base body.
- the reflection surfaces of the individual facets can be planar. They can also have a positive or negative refractive power. They can also be designed toric.
- the reflection surfaces of the individual facets can in particular be rectangular, trapezoidal or curved, in particular in the shape of a circular ring.
- the facet base body has at least one free end, in particular two free ends, and is designed in such a way that its cross section decreases towards the free end or towards the free ends.
- the cross section of the facet base body is reduced in particular at least partially starting from a fastening area towards the free end or ends.
- the cross section can in particular continuously, in particular monotonically, decrease towards the free end. This allows the mass moment of inertia to be reduced.
- the cross section of the facet base body can also contribute to increasing the rigidity of the facet base body.
- the cross section can also increase again on the very outside, in the area of the free end.
- the facet base body can in particular have a stop element.
- the facet base body has means for reducing its mass moment of inertia and / or means for increasing its rigidity.
- Recesses, bores or, in general, a weight-reduced design of the facet base can serve as a means for reducing the mass moment of inertia of the facet base.
- the facet base body can in particular have at least partially a T-shaped, a U-shaped or an H-shaped cross section.
- the Fa cettengrundSuper can also be manufactured additively. In particular, it can have hollow structures. This allows the mass moment of inertia of the facet base body to be reduced particularly effectively.
- Further objects of the invention are to provide an illumination optics for a projection exposure system, an illumination system for a projection exposure system, an optical one Improve system for a projection exposure system and a projection exposure system.
- the designs according to the invention offer in particular improved protection, in particular the optical surfaces, during transport and in the event of an earthquake load.
- Further objects of the invention consist in improving a method for producing a micro- or nanostructured component and a correspondingly produced component.
- Fig. 1 schematically shows the components and the beam path of a Gyroscope
- 3 and 4 schematically an actuator device for shifting a field facet about two independent tilting axes
- 5 schematically shows a further detail to illustrate the relative position of the tilt axis of a field facet relative to its reflection surface
- FIG. 6 shows schematically and by way of example the collision of two adjacent facets during a rotation about an axis parallel to their surface normals
- FIG. 8 shows an example of a cross section of a stop element for protecting a facet
- FIG. 9 shows an example of a side view through a facet according to FIG. 7 with two stop elements arranged at the end,
- Fig. 10 schematically shows a representation according to FIG. 6, wherein the facets are protected by stop elements
- 11 to 13 are schematic representations to illustrate different tilting situations of two adjacent facets
- FIG. 16 shows an example of a perspective view of a structure-optimized facet
- FIG. 17 schematically shows a perspective partial view of a facet, the base body of which has means for reducing the mass moment of inertia and means for increasing the rigidity
- FIG. 18 schematically shows a perspective view of a facet with a balancing element
- 19 shows an exemplary detailed view of the arrangement of an exemplary stop element on the base body of a facet
- FIG. 24 schematically shows a cross section through adjacent facets with anchoring elements according to FIG. 23,
- FIG. 25 schematically shows a longitudinal section through a facet to illustrate a preferred arrangement of the stop element according to FIG. 23 relative to a tilt axis of the facet and
- stop element is designed as a separate, lateral stop
- FIG. 27 shows, by way of example, a further cross section of a stop element for
- FIG. 28 shows an example of a perspective view of a facet with three attachment elements.
- the projection exposure system 1 includes an illumination optics la for illuminating an object field 2 in an object plane 3 with illuminating radiation 4.
- the projection exposure system 1 also includes a projection optics lb for imaging one not shown in FIG shown, arranged in the area of the object plane 3 with structures to be imaged on a wafer, also not shown in FIG. 1, which is arranged in an image plane 31. Many details are known from the prior art.
- the illuminating radiation 4 can in particular be EU V radiation, in particular illuminating radiation with a wavelength of at most 30 nm, in particular 13.5 nm or less.
- the illuminating radiation 4 is generated by a radiation source 5.
- a plasma source or a free electrode laser (FEL) can serve as the radiation source 5.
- FEL free electrode laser
- the combination of the lighting optics la and the radiation source 5 is also referred to as a lighting system lc.
- the illumination radiation 4 emitted by the radiation source 5 is collected by a collector 6.
- the collector 6 reflects the illumination radiation 4 and leads it to the subsequent components of the illumination optics la.
- the illuminating radiation 4 strikes a first optical element in the form of a first facet mirror 7, which is also referred to as a field facet mirror.
- the first facet mirror 7 is used to generate secondary light sources in the lighting system lc.
- a total reflection surface of the first facet mirror 7 acted upon by the illumination radiation 4 is subdivided into a plurality of first facets 8i, which are also referred to as field facets.
- first facets 8i which are also referred to as field facets.
- four first facets 8i to 8 4 are shown schematically.
- Partial bundles 12i of illuminating radiation 4 are also shown schematically and by way of example in FIG.
- the first facets are usually elongated. You can be formed from rectangular. They can also be curved, in particular configured in the shape of a circular ring segment.
- the first facets can all have identical dimensions. It is also possible to design the first facet mirror 7 with first facets of different dimensions.
- the first facets can in particular have an aspect ratio of at least 5: 1, in particular at least 8: 1, in particular at least 12: 1, in particular at least 13: 1.
- the aspect ratio of the first facets is in particular at most 100: 1, in particular at most 50: 1.
- the shape of the first facets can in particular be adapted to the shape of the object field 2. In particular, it can be geometrically similar to the shape of the object field 2.
- the shape of the first facets is in particular such that the illumination radiation 4 reflected by them illuminates the object field 2 or certain subregions thereof as precisely as possible when the projection exposure system 1 is in operation.
- Each of the first facets can be displaced, in particular tilted, in order to set different lighting settings.
- the first facets can in particular be tilted about two axes perpendicular to one another.
- a Cartesian (x, y, z) coordinate system is used to describe positional relationships.
- the first facets can each be tilted about a tilt axis running in the x direction and about a tilt axis running in the y direction.
- the z-axis is in particular parallel or almost parallel to a surface normal of the respective facet.
- actuators are provided, of which an actuator 16 is indicated in FIG. 1 as a representative.
- the actuator 16 is connected to a central control device 19 via a control line 18.
- the control device 19 is connected to all other actuators assigned to the first facets.
- a second optical element in the form of a second facet mirror 20 is arranged at the location of the secondary light sources generated by the first facet mirror, that is, in an image plane to the radiation source 5, a second optical element in the form of a second facet mirror 20 is arranged.
- the second facet mirror 20 is also referred to as a pupil facet mirror.
- the illuminating radiation 4 is applied to the pupil facet mirror via the first facet mirror 7.
- the surface of the second facet mirror 20 that can be acted upon is subdivided into a plurality of second facets 2L, of which four second facets 2h to 2h are shown in FIG. 1 by way of example.
- the second facets 2h to 2h are each assigned to one of the first facets 8 to 11, so that a secondary light source is generated at the location of the respectively acted upon second facets 2h to 2h.
- the second facets can also be tiltable by actuators.
- An actuator 25 assigned to the second facet 21 is shown as an example of this in FIG.
- the actuator 25 is in signal connection with the control device 19 via a beam line 18.
- transmission optics 27 with wide ren mirrors 28, 29 are arranged.
- the mirror 28 can be hit by the illuminating radiation 4 with a small angle of incidence, for example an angle of incidence of less than 30 °.
- the mirror 29 can be acted upon in grazing incidence, for example with an incidence angle of more than 60 °.
- FIG. 2 the top view of a section of the surface of the first facet mirror 7 is shown as an example.
- many facets 8i are arranged next to one another on the facet mirror 7.
- adjacent facets 8i, 8i + i are each separated from one another by a gap 32.
- the gaps 32 run parallel to the x or y direction.
- the gaps 32 are as narrow as possible.
- the gap width is in particular at most 1 mm.
- the gap width is in particular no more than 50%, in particular no more than 30%, in particular no more than 20%, in particular no more than 15%, in particular no more than 10%, in particular no more than 5%, in particular no more than 3%, in particular no more than 2%, in particular no more than 1% of the extension of the facets 8i in the corresponding direction.
- a maximum of 50% in particular a maximum of 30%, in particular a maximum of 20%, in particular a maximum of 15%, in particular a maximum of 10%, in particular a maximum of 5%, in particular a maximum of 3%, in particular a maximum of 2%, in particular a maximum of 1% of the total area of the first facet mirror 7 covered by columns 32.
- the illuminating radiation 4 cannot be reflected at the gaps 32. Column 32 thus lead to transmission losses.
- the gaps 32 are necessary in order to enable a certain actuation range of the facets 8i.
- FIGS. 3 and 4 details of the actuators 16 for displacing the facets 8i are shown by way of example and schematically.
- the actuation takes place via a lever 33. This can be done by magnetic forces.
- the magnet is located in particular on the underside of the lever 33. Below this, energized coils are provided, which can lead to a deflection of the lever 33 and thus to a tilting of the facet 8i.
- the actuator 16 can also have one or more restoring elements, for example in the form of leaf springs 34.
- the facets 8i each have a facet base 35 and a reflection surface 36.
- the reflective surface 36 has edges 40 on the edge.
- the facets 8i can be attached to a common frame or a common plate. It is also possible to fix the facets 8i in groups on modular plates.
- the reflection surface 36 which is also generally referred to as an optical surface, can be designed to be flat. However, it can also be curved. In particular, it can have a particularly concave or convex design. It can also be toroidal or have any other shape.
- the tilt axes 37 can lie in the region of the reflection surface 36 (FIG. 5, left).
- the tilt axis 37 can also lie below, that is to say behind the reflection surface 36 (FIG. 5, center).
- the tilt axis 37 can also lie above, that is to say in front of the reflection surface 36 (FIG. 5, right).
- the position of the tilt axis 37 relative to the reflective surface 36 has an influence on the required width of the gap 32 in order to ensure that adjacent facets 8i, 8i + i are free from collisions over a specified tilt angle range (tilt range).
- the facet base body 35 can preferably, at least in sections, have a cross-section that decreases in the direction perpendicular to the reflection surface 36, for example a trapezoidal cross-section.
- a side angle b can in particular be as large as the maximum tilt angle to be set. It can also be bigger.
- the dimensions of the facet base body 35, in particular its mass moment of inertia, can be reduced by a larger side angle b, in particular a stronger bevel, of the facet base body 35.
- the individual facets 8i can have a low natural frequency that is excited, for example, during transport or in the event of unexpected vibrations, for example during an earthquake. This can lead to collisions between adjacent facets 8i, 8i + i .
- FIG. 6 shows an example of a collision of two adjacent facets when they rotate about their z-axis, which runs parallel to a surface normal on a central point of the reflection surface 36. Such a collision can lead to indentations on the optical edges, that is to say in the edge region of the reflection surface 36.
- facets 8i, 8i + i control can be tilted about the x- and y-axes
- rotation about the z-axis is undesirable during normal operation of the projection exposure system 1.
- Such a rotation around the z-axis can, however, be stimulated in the event of a transport or earthquake. This can lead to damage to the facets 8i, 8i + i , which should preferably be avoided.
- the facet base body 35 and the reflection surface 36 are each designed in such a way that the reflection surface 36 is not damaged in the event of a collision.
- the facet base body 35 is provided with defined stop surfaces which are spaced from the reflection surface 36 of the respective facet 8i and in the area of which contact can occur.
- separate stop elements, to which the facet base body 35 can strike can also serve as stop surfaces.
- the stop surface can in particular be formed by a predetermined area of an adjacent facet or by an additional mechanical component.
- the distance of the facet base body from the respective associated stop surface is in particular special smaller than the width of the gap 32 in the corresponding direction.
- the distance between the facet base body 35 and the associated stop surface is in particular smaller than the distance between the reflection surface 36 and the stop surface or the reflection surface 36 of the adjacent facet. This ensures that, in the event of a collision, it is not the optical edges, that is to say the edges of the reflective surface 36, but the desired stop areas that collide.
- FIG. 7 a perspective view of a facet 8i is shown as an example.
- anchoring elements 38 are provided at the end of the facet base body 35.
- a side view through the facet according to FIG. 7 is shown by way of example in FIG.
- a cross section of the stop element 38 is shown in detail in FIG.
- the stop element 38 has, in particular, stop edges 39.
- the stop edges 39 are ver in the direction perpendicular to the tilt axis 37 to the edges 40 of the reflective surface 36 to the outside.
- FIG. 27 shows a cross section of a variant of the stop element 38.
- the stop element 38 according to FIG. 27 has a shoulder 48 on both sides of the reflective surface 36.
- the shoulder 48 extends in particular in a direction parallel to a width of the facet. It leads to improved protection of the reflective surface 36, in particular its edges 40.
- the shoulder 48 can in particular be oriented at an angle c in the range from 90 ° to 150 °, in particular in the range from 90 ° to 135 °, preferably of at least 100 °, to a vertical direction 49.
- the vertical direction 49 runs in particular parallel to a surface normal 50 through a central point 51 of the reflection surface 36.
- the stop edge 39 can be rounded or chamfered.
- the stop elements 38 project downwards, that is to say on the side of the facet base body 35 facing away from the reflection surface 36, beyond the facet base body 35.
- the vertical protrusion can be determined on the basis of the desired tilting range of the facets 8i.
- the tilting range of the facets 8i can, for example, be up to 100 mrad.
- the stop elements 38 can be plate-shaped. They can also be designed so that they can be pushed onto the facet base body 35 in the manner of a sleeve.
- the stop elements 38 can each end on the free ends of the Facettengrundkör pers 35 be arranged in the longitudinal direction.
- the stop elements 38 are preferably designed and / or arranged on the basic facet body 36 such that in any tilt position, in particular in any operating switch position, any, in particular unexpected, stimuli of the facets 8i, for example also around the z- Axis, at most leads to collisions in the area of the stop elements 38, but not in the area of the edges 40 of the reflective surface 36.
- stop elements 38 can also be arranged in a central region on the facet base body 35. This can be advantageous in particular in the case of arcuate facets 8i.
- the stop elements 38 are preferably arranged in the area or areas in which the distance between the respective facet base body 35 and the adjacent facet base body 35 or the adjacent stop element 38 is the smallest.
- the stop elements 38 are arranged in particular in the areas of the facet base body 35 in which collisions are most likely to occur.
- the stop elements 38 arranged in the region of the free ends of the facet base body 35 do not need to be arranged completely at the end of the facet base body 35 either.
- different stop elements 38 can have different geometrical designs.
- stop elements 38 arranged in the central areas of the facet base body 35 can be configured as thickened portions of the facet base body 35.
- the stop elements 38 arranged in the central regions of the facet base body 35 can only be arranged on a single side of the facet base body 35. It is also possible to arrange corresponding stop elements 38 on two sides, that is to say on opposite sides of the facet base body 35.
- stop elements 38 are designed in particular in such a way that when the facets 8i are displaced and / or due to unexpected stimuli of the facets 8i, contact with a stop surface can occur, the facets 8i being the stop surface in a predetermined area which is affected by the reflection surface 36 is spaced, touch.
- FIGS. 11 to 13 different constellations are shown by way of example when adjacent facets 8i, 8i + i are tilted.
- the adjacent edges 40 are not endangered or at least less endangered.
- the stop elements 38 are designed in such a way that the stop edge 39 of one stop element 38 comes into contact with the other stop element 38.
- the stop element 38 in particular its stop edge 39, can also come into contact with another area of the facet base body 35 of the adjacent facet 8i.
- the area in which contact (collision) of a facet 8i can occur is at a distance from the reflection surface 36 of the respective facet 8i.
- the protrusion e by which the stop edge 39 protrudes laterally over the reflective surface 36, has at least a ratio to the height h of the reflective surface 36 above the plane through the stop edges 39 in the illustrated embodiment of the stop element 38 must be as large as the tangent of the triple side angle b: e: h> tan (3b).
- e: h> tan (3b) With a side angle b of 40 mrad, the following applies in particular: e: h> 120 pm / mm.
- this also applies to the case of additional actuation about the second tilt axis. In the present case, this primarily leads to a relative displacement of the two facets 8i, 8i + i in the z-direction. This can lead to the other facet 8i then being endangered. However, in the illustrated embodiment of the stop elements 38, this is also protected by the stop elements, in particular in such a way that the edges 40 of their reflective surface 36 cannot collide.
- the extent of the stop elements 38 in the z-direction is dependent on the maximum tilting range about the y-axis.
- a sufficient extension of the stop elements 38 in the z-direction can ensure that the stop elements 38 provide a stop surface regardless of the tilt position about the y-axis in order to protect the edges 40 of the reflective surface 36 against collisions.
- Manufacturing tolerances in the manufacture of the facet base body 35 are usually in the range from 10 ⁇ m to 50 ⁇ m.
- the stop elements 35 can wear out over the service life of the facets 8i. In the event of a collision, there may be a maximum indentation of the stop edge 39 in the range of at most a few pm. This depends, among other things, on the material of the stop elements 38 and / or on the angle of incidence in the event of a collision. As will be described in more detail below, provision can be made for the stop edges 39 to be rounded. This can reduce the Hertzian pressure in the event of a collision.
- the protrusion e is particularly dependent on the displacement range (actuation range) of the facets 8i.
- the absolute value of the protrusion e is dependent on the distance between the stop edge 39 and the edge 40 of the reflective surface 36 to be protected, in particular on the height h. The smaller this distance or the height h, the smaller the over stand e can be selected.
- a protrusion e in the range from 20 gm to 100 gm has been found to be particularly useful.
- the distance between adjacent facet base bodies 35 in a neutral position of the facets 8i, 8i + i in particular a distance between the adjacent stop edges 39 of adjacent facets 8i, 8i + i ⁇ 100 gm, in particular at most 50 gm.
- These specifications preferably apply for the distance between two adjacent reflection surfaces 36, in particular in the neutral position of the facets 8i, 8i + i, or in particular in a position of the same in which their surface normals run parallel to one another.
- This aspect relates to the arrangement of the stop elements 38 on the facet base body 35.
- the narrow point that is, the point of the smallest distance between the two adjacent facets 8i, 8i + i
- the nominal width of the gap 32 between adjacent facets 8i, 8i + i varies over the length of the facets 8i, 8i + i.
- stop elements 38 on the facet base body 35 depending on the position of the narrow point.
- the stop elements 38 can in particular not only be arranged at the end of the facet base body 35. This is shown by way of example in FIG. 14 for the facets 8i, 8 2 .
- the stop elements 38 can, however, also be arranged centrally on the facet base body 35. This is shown by way of example in FIG. 14 for the facets 82, 83.
- the dimension of the protrusion e can be chosen differently. This is shown as an example in FIG.
- the protrusion e of the stop elements 38 between tween the facets 8 2 and 8 3 is chosen greater than the amount of the protrusion e between the facets th 8i and 8 2 . This also makes it possible to take into account the small gap width in the central area of the facets 8 2 , 8 3.
- the stop elements 38 it is possible to flexibly select the position of the arrangement of the stop elements 38 as required.
- the dimension of the protrusion e can be flexibly adapted to the gap width.
- a predetermined position of the arrangement of the stop elements 38 on the facet base body 35, which is the same for all facets 8i, has the advantage that the variety of facet features is reduced. This makes programming the facet contours easier.
- the stop edge 39 is formed over the entire length of the facets 8i.
- the stop edge 39 can in particular be formed over the entire circumferential area of the facet base body 35.
- the stop edge 39 can here be formed continuously. It can also be designed to be interrupted. This can save weight.
- stop elements 38 In particular for reasons of weight saving, it can be advantageous to arrange stop elements 38 only in the critical areas on the facet base body 35. In particular in the case of a relatively large tilting range, for example a tilting range of more than 40 mrad, it can be advantageous to arrange stop elements 38 exclusively in the region of the free ends of the facets 8i.
- the stop elements 38 can in particular only be arranged at discrete locations in the longitudinal direction of the facet base body 35. In particular, a maximum of 10, in particular a maximum of 8, in particular a maximum of 6, in particular a maximum of 4, in particular 2 attachment elements 38 can be arranged on the facet base bodies 35.
- the stop elements 38 can each have an extension in the longitudinal direction of the facet base 35 which is at most 10%, in particular at most 5%, in particular at most 3%, in particular at most 2% of the length of the facet base 35.
- the stop elements 38 can be designed and arranged on the facet base body 35 in such a way that the mass moment of inertia of the facet base body 35 is increased by a maximum of 10%, in particular a maximum of 5%, in particular a maximum of 3% due to the arrangement of the stop elements 38.
- Another aspect of the invention relates to an advantageous embodiment of the facet base body 35. It was recognized that a facet that is as lightly weighted as possible is advantageous for dynamic reasons. On the one hand, this keeps the amplitudes low in the event of an excitation, and on the other hand, the collision energy is reduced in the event of collisions. Even if, according to the invention, contact between a facet 8i and a stop surface is permitted, care must be taken that such collisions do not lead to negative consequences, in particular do not lead to damage to the facet 8i or to particle formation.
- the facet base bodies 35 can be designed in a structure-optimized manner.
- the facet base body 35 can in particular have means for reducing the weight, in particular special means for reducing the mass moment of inertia.
- means for reducing the weight of the facet base body 35 and for reducing its mass moment of inertia it can be provided, for example, to design the facet base body 35 with a cross-section that reduces towards the free end.
- a corresponding design is shown as an example in FIG.
- the angle of incidence w between the inner side of the facet base body 35 and the front side thereof is in particular in the range from 2 ° to 10 °, in particular in the range from 4 ° to 6 °.
- the rigidity of the facet base body 35 can be increased.
- the rigidity of the facet base body 35 can in particular be increased in that the cross-sectional area increases towards the support point of the facet.
- the total mass of the facet base body 35 increases, but that From the moment of inertia, as the cross-section is reduced towards the free end.
- the mass moment of inertia is reduced and the rigidity is increased.
- the sagging due to the inherent weight of the facet base body 35 can be improved by a factor of more than two, in particular more than three.
- This information relates, for example, to a facet with a length of 120 mm, a width of 6.6 mm and an average height of 14 mm.
- the necessary rigidity can be shifted towards the actuator axis.
- a further means for reducing the weight, in particular for reducing the mass moment of inertia of the facet base body 35, is shown as an example in FIG.
- 35 bores are provided in the facet base body.
- the holes also lead to weight savings.
- pockets can also be provided, in particular from the underside of the facet base body 35 or from the side surfaces of the same.
- tapering of the cross section is also possible in other ways, for example by means of bevels on the sides.
- FIG. 35 Another means for optimizing the facet base body 35 is shown in FIG. According to this variant, the facet base body 35 is mounted in a strongly asymmetrical manner. A balancing element 41 is provided in the area of the shorter free end.
- the mass moments of inertia of the facet base body 35, in particular by Rx, can be reduced by up to 30%.
- the stop elements 38 preferably have a small extent in the x direction, that is to say in the longitudinal direction of the facet base body 35.
- the stop elements 38 can in particular have an extension in the range from 1 mm to 3 mm in the x direction.
- the previously exemplarily described facets 8i in particular together with the other moving masses of the manipulator, have a total moment of inertia I yy of approximately 180,000 g ⁇ mm 2 .
- the additional total moment of inertia I yy due to the stop elements 38 is less than 5000 m ⁇ mm 2 , that is to say less than 3% of the total moment of inertia
- Such weight savings can be introduced into the stop element 38 in particular at the end face in the x direction.
- the relative proportion of the mass moment of inertia of the stop elements 38 in the total moment of inertia I yy of the facets 8i can be reduced to less than 2%.
- the stop elements 38 serve in particular to protect the facets 8i, in particular to protect their reflective surfaces 36, in the event of unexpected stimuli and / or vibrations. They protect the facets in particular against seismic load cases in which the excited oscillation amplitudes can be a multiple of the width of the intended column 32.
- the stop elements 38 can be designed as separate components. In particular, they can be placed on the facet base body 35. They are generally connected to the facet base body 35. Essentially all conceivable connection techniques are possible here.
- the stop elements 38 can in particular be glued, soldered, welded, screwed, clipped or shrunk onto or slipped onto the facet base body 35.
- the formation of the stop elements 38 as separate components has the advantage that the stop elements 38 can be made from a different material than the facet base body 35. They can also be made from the same material. They can in particular be made of copper or a copper alloy. This is particularly advantageous with regard to particle formation.
- the use of copper or a copper alloy to produce the stop elements 38 has the advantage that due to the relatively low hardness of copper results in a slight indentation in a non-disruptive point in the event of a collision. The formation of particles is largely prevented.
- stop elements 38 can be formed in particular by the geometric details, in particular the shape of the facet base body 35. This enables a particularly simple and robust production.
- the design of the stop elements 38 in particular their stop edge 39, can be sharp-edged (FIG. 20), not sharp-edged, in particular tapering flat (FIG. 21) or rounded (FIG. 22).
- a rounded, preferably chamfered training makes it possible to reduce the Hertzian pressure. It is a preferred embodiment.
- the height h by which the reflection surface 36 is offset in the direction of its surface normal relative to a plane through the stop edges 39 of the stop element 38 can also approach zero.
- the used optical surface of the facets 8 i does not extend to their geometric edge, in particular not to the edge of the facet base body 35.
- the reflective surfaces 36 do not collide with one another.
- the reflection surfaces 36 are surrounded by an edge region which is not used to reflect the illumination radiation 4. This reduces the degree of filling of the facet mirror 7 and thus the degree of efficiency with regard to transmission is reduced.
- the stop surface is formed by a means for limiting the displacement range of the facets 8i.
- a pin 42 which is also referred to as a snubber, serves as such a means.
- the pin 42 dips into a pocket 43 on the underside of the facet base body 35.
- the immersion depth is large enough to cover the entire tilting area.
- the pin 42 can also be tilted together with the facet base body 35.
- the pin 42 and a bearing 46 of the facet 8 i, which is only shown in FIG. 23, are arranged on a common base plate 47.
- the precise positioning of the pin 42, in particular of the free end of the same which plunges into the pocket 43, can advantageously be adjustable.
- the play between the pin 42 and a stop side 44 on the inside of the pocket 43 is smaller than the distance between two adjacent facets 8i, 8i + i , in particular smaller than the width of the gap 32 between two adjacent facets 8i, 8i + i .
- the play between the pin 42 and the stop side 44 is in particular smaller than the part of the gap 32 available for the TO tolerances. This ensures that the protective effect for the edges 40 of the reflective surface 36 is also guaranteed in this variant.
- the pin 42 can be adjusted.
- the pin 42 can in particular be designed to be adjustable.
- the pin 24 can be designed in particular spherical at its free end. This prevents the tilting of the facets from being hindered
- the snubber is shown as a pin 42. It is also conceivable to design the snubber as a fork, that is to say with several free ends which grip around the facets. According to a further variant shown by way of example in FIG. 25, a lateral stop 45 is provided instead of the pin 42.
- the facets 8i in particular their facet base bodies 35, have a displacement area such that they touch a stop surface in certain displacement positions.
- the shift positions can be reversibly actuatable shift positions. It can also involve undesired deflection positions which can occur in the event of transport or in the event of an earthquake, in particular exclusively in the event of transport or earthquake, but not in the case of controlled relocation.
- the stop surface can in this case be formed by a surface on a further optical element, in particular a further facet base body 35 or a stop element 38 arranged thereon. It can also be formed by a separate mechanical detail, for example the pin 42 or the side stop 45.
- all stop surfaces are made of wear-resistant materials. They can also have a wear-resistant coating. This can prevent the generation of particles in the event of a collision. Any particles that are nevertheless generated could be collected in a collecting container or in pockets that are formed by neighboring components.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Elements Other Than Lenses (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020227012426A KR20220066313A (ko) | 2019-09-19 | 2020-09-18 | 투영 노광 장치의 조명 광학 유닛용 파셋 미러 |
EP20775847.5A EP4031937A1 (de) | 2019-09-19 | 2020-09-18 | Facettenspiegel für eine beleuchtungsoptik einer projektionsbelichtungsanlage |
JP2022517978A JP2022548962A (ja) | 2019-09-19 | 2020-09-18 | 投影露光装置の照明光学ユニットのファセットミラー |
CN202080079949.9A CN114730136A (zh) | 2019-09-19 | 2020-09-18 | 用于投射曝光设备的照明光学单元的多分面反射镜 |
US17/695,402 US11789367B2 (en) | 2019-09-19 | 2022-03-15 | Facet mirror for an illumination optical unit of a projection exposure apparatus |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE102019214269.9A DE102019214269A1 (de) | 2019-09-19 | 2019-09-19 | Facettenspiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage |
DE102019214269.9 | 2019-09-19 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US17/695,402 Continuation US11789367B2 (en) | 2019-09-19 | 2022-03-15 | Facet mirror for an illumination optical unit of a projection exposure apparatus |
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WO2021053164A1 true WO2021053164A1 (de) | 2021-03-25 |
Family
ID=72613911
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Application Number | Title | Priority Date | Filing Date |
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PCT/EP2020/076137 WO2021053164A1 (de) | 2019-09-19 | 2020-09-18 | Facettenspiegel für eine beleuchtungsoptik einer projektionsbelichtungsanlage |
Country Status (7)
Country | Link |
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US (1) | US11789367B2 (de) |
EP (1) | EP4031937A1 (de) |
JP (1) | JP2022548962A (de) |
KR (1) | KR20220066313A (de) |
CN (1) | CN114730136A (de) |
DE (1) | DE102019214269A1 (de) |
WO (1) | WO2021053164A1 (de) |
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DE102021211619A1 (de) * | 2021-10-14 | 2023-04-20 | Carl Zeiss Smt Gmbh | EUV- Mehrfachspiegelanordnung |
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US20030086524A1 (en) | 1998-05-05 | 2003-05-08 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Illumination system particularly for microlithography |
DE102010003169A1 (de) * | 2010-03-23 | 2011-02-10 | Carl Zeiss Smt Ag | Feldfacettenspiegel zum Einsetzen einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Projektions-Lithografie |
US20160216509A1 (en) * | 2015-01-28 | 2016-07-28 | Seiko Epson Corporation | Digital mirror device, method of manufacturing digital mirror device, and image display apparatus |
DE102016220669A1 (de) * | 2016-10-21 | 2017-08-31 | Carl Zeiss Smt Gmbh | Spiegelanordnung, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
DE102016214785A1 (de) * | 2016-08-09 | 2018-02-15 | Carl Zeiss Smt Gmbh | Optisches Modul mit einer Antikollisionseinrichtung für Modulkomponenten |
DE102018201877A1 (de) * | 2017-06-20 | 2018-12-20 | Carl Zeiss Smt Gmbh | Spiegelanordnung, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
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AU2002364975A1 (en) * | 2002-02-09 | 2003-09-02 | Carl Zeiss Smt Ag | Multi-faceted mirror |
EP1642173A1 (de) * | 2003-07-09 | 2006-04-05 | Carl Zeiss SMT AG | Spiegelfacette und herstellverfahren dafür |
DE102008001511A1 (de) * | 2008-04-30 | 2009-11-05 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
DE102009054888A1 (de) | 2009-12-17 | 2011-06-22 | Carl Zeiss SMT GmbH, 73447 | Optisches Element mit einer Mehrzahl von refletiven Facettenelementen |
DE102010001388A1 (de) * | 2010-01-29 | 2011-08-04 | Carl Zeiss SMT GmbH, 73447 | Facettenspiegel zum Einsatz in der Mikrolithografie |
DE102012204273B4 (de) * | 2012-03-19 | 2015-08-13 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithografie |
DE102012207377A1 (de) * | 2012-05-03 | 2013-11-07 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik sowie optisches System für die EUV-Projektionslithographie |
DE102014216801A1 (de) * | 2014-08-25 | 2016-02-25 | Carl Zeiss Smt Gmbh | Facettenspiegel für eine Beleuchtungsoptik für die Projektionslithographie |
DE102015221209A1 (de) * | 2015-10-29 | 2017-05-04 | Carl Zeiss Smt Gmbh | Optische Baugruppe mit einem Schutzelement und optische Anordnung damit |
WO2020221763A1 (de) * | 2019-04-29 | 2020-11-05 | Carl Zeiss Smt Gmbh | Mess-beleuchtungsoptik zur führung von beleuchtungslicht in ein objektfeld einer projektionsbelichtungsanlage für die euv-lithografie |
-
2019
- 2019-09-19 DE DE102019214269.9A patent/DE102019214269A1/de active Pending
-
2020
- 2020-09-18 EP EP20775847.5A patent/EP4031937A1/de active Pending
- 2020-09-18 KR KR1020227012426A patent/KR20220066313A/ko unknown
- 2020-09-18 WO PCT/EP2020/076137 patent/WO2021053164A1/de unknown
- 2020-09-18 JP JP2022517978A patent/JP2022548962A/ja active Pending
- 2020-09-18 CN CN202080079949.9A patent/CN114730136A/zh active Pending
-
2022
- 2022-03-15 US US17/695,402 patent/US11789367B2/en active Active
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US20030086524A1 (en) | 1998-05-05 | 2003-05-08 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Illumination system particularly for microlithography |
DE102010003169A1 (de) * | 2010-03-23 | 2011-02-10 | Carl Zeiss Smt Ag | Feldfacettenspiegel zum Einsetzen einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Projektions-Lithografie |
US20160216509A1 (en) * | 2015-01-28 | 2016-07-28 | Seiko Epson Corporation | Digital mirror device, method of manufacturing digital mirror device, and image display apparatus |
DE102016214785A1 (de) * | 2016-08-09 | 2018-02-15 | Carl Zeiss Smt Gmbh | Optisches Modul mit einer Antikollisionseinrichtung für Modulkomponenten |
DE102016220669A1 (de) * | 2016-10-21 | 2017-08-31 | Carl Zeiss Smt Gmbh | Spiegelanordnung, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
DE102018201877A1 (de) * | 2017-06-20 | 2018-12-20 | Carl Zeiss Smt Gmbh | Spiegelanordnung, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
Also Published As
Publication number | Publication date |
---|---|
CN114730136A (zh) | 2022-07-08 |
DE102019214269A1 (de) | 2021-03-25 |
JP2022548962A (ja) | 2022-11-22 |
US11789367B2 (en) | 2023-10-17 |
EP4031937A1 (de) | 2022-07-27 |
KR20220066313A (ko) | 2022-05-24 |
US20220206398A1 (en) | 2022-06-30 |
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