WO2021031487A1 - 基于混合型等离子体结构的平板式等离子体发生装置 - Google Patents

基于混合型等离子体结构的平板式等离子体发生装置 Download PDF

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WO2021031487A1
WO2021031487A1 PCT/CN2019/127950 CN2019127950W WO2021031487A1 WO 2021031487 A1 WO2021031487 A1 WO 2021031487A1 CN 2019127950 W CN2019127950 W CN 2019127950W WO 2021031487 A1 WO2021031487 A1 WO 2021031487A1
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plasma
flat
plate
discharge
plasma generator
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PCT/CN2019/127950
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English (en)
French (fr)
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李兵
姜涛
尚中昱
李昂
辛朝
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西安交通大学
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes

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  • the invention relates to the field of plasma technology, in particular to a flat-plate plasma generator based on a hybrid plasma structure.
  • plasma is widely used in the field of disinfection and sterilization and clinical medicine with its characteristics of ionized gas, excited active particles, and radiated ultraviolet rays. In recent years, it has continued to become a research hotspot in the application field.
  • the first is a direct plasma source, which directly uses the target area as an auxiliary electrode to trigger discharge to generate plasma.
  • This method mainly adopts a floating electrode-based dielectric barrier discharge technology to achieve relatively uniform plasma and High concentration of active substances.
  • the direct plasma generator has the advantage of highly controllable plasma trigger position due to its structural characteristics, but it also has limitations such as a fixed trigger distance.
  • This kind of dielectric barrier discharge structure based on floating electrodes as an emerging technology that has emerged in recent years, has been widely studied in the field of direct plasma generators.
  • the second is an indirect plasma source, which generates plasma between two electrodes inside the generating device, and then transfers the plasma to the target area by means of carrier gas or diffusion.
  • the carrier gas By controlling the carrier gas, the composition of the active material generated by the plasma in the gas can be changed, and the ejection position of the plasma jet can be controlled.
  • Indirect plasma generation equipment can be realized by using plasma syringe, plasma nozzle, large-size plasma torch and other structures. It has the advantage of flexible application size, but on the other hand, due to its indirect plasma generation mechanism and other problems, This type of equipment also has disadvantages such as weak controllability and low concentration of active substances generated by plasma.
  • the third type is a hybrid plasma source, which is a hybrid structure that combines direct and indirect plasma sources.
  • This method mainly uses surface microdischarge technology to trigger microdischarges in a grounded multi-electrode array and generate The advantage of plasma is that the area of the electrode array is larger and the coverage of the target area is stronger. However, due to the smaller resistance value of the wire grid in the electrode array, the filament micro-discharge beam generated in the target area penetrates The penetration ability is weak and it is difficult to pass through the target area completely.
  • the purpose of the present invention is to provide a flat-plate plasma generator based on a hybrid plasma structure, which is suitable for both atmospheric and low-pressure environments, has a wide range of applications, and does not generate arcs and ensure safety. It improves the flexibility and processing efficiency of the hybrid plasma generating device in processing objects of different sizes and materials.
  • a flat-plate plasma generator based on a hybrid plasma structure includes a discharge vessel with gas supply ports and exhaust ports on the left and right sides, respectively.
  • An AC pulse power supply is set up inside the discharge vessel and connected to it The plasma discharge assembly and the replaceable working platform below.
  • the frequency of the AC pulse power supply is 10-350kHz and the voltage amplitude is 0.5-2kV.
  • the upper part of the plasma discharge assembly is an upper protective shell made of polytetrafluoroethylene.
  • the bottom surface of the upper protective shell is composed of a three-layer structure of an upper dielectric layer, a copper main discharge plate and a lower dielectric layer.
  • the upper dielectric layer and The lower dielectric layer is filled with insulating materials such as ceramic or quartz, and the top right side of the main discharge plate is connected with an AC pulse power supply.
  • the replaceable work platform is composed of a placed object, a fixture base, an object fixture, a rotating track, and a stepping motor.
  • the fixture base is provided with three sets of parallel object fixtures, and the placed object is fixed by the object fixture, Below the object fixture is the fixture base, which is set on the rotating track.
  • the fixture base is driven by a stepping motor to rotate counterclockwise along the rotating track.
  • Under the replaceable working platform is a detachable lower protective shell.
  • the rotating orbit is a circular rotating orbit.
  • the constituent material of the clamp base is aluminum
  • the constituent materials of the object clamp and the rotating track are all polytetrafluoroethylene
  • the detachable lower protective shell is made of polytetrafluoroethylene.
  • the discharge vessel is used to provide a confined space
  • the AC pulse power supply provides the discharge voltage for the copper main discharge plate
  • the working platform is used to place the processed object and as a floating electrode to trigger the glow discharge of the dielectric barrier, so that when the device discharges, the plasma
  • the body is generated between the copper main discharge plate and the replaceable work platform.
  • the discharge path is directly induced by the placed object or the aluminum fixture base composed of conductive materials. It has a good surface fit and has a wide range of applications.
  • the plasma processing efficiency is improved on the premise of generating an arc and ensuring safety.
  • Figure 1 is a schematic diagram of a flat-plate plasma generator with a hybrid plasma structure.
  • Figure 2 is a schematic diagram of the internal structure of the rotating track in the plasma generator.
  • FIG. 3 is an isometric schematic diagram of the plasma discharge assembly 4 and the replaceable work platform 2.
  • 1- discharge vessel 2- replaceable working platform; 3- AC pulse power supply; 4- plasma discharge assembly; 5- copper main discharge plate; 6-upper dielectric layer; 7-lower dielectric layer; 8 -Stepper motor; 9-plasma; 10-gas supply port; 11-exhaust port; 12-upper protective shell; 13-placed object; 14-rotating track; 15-fixture base; 16-object fixture; 17 -Removable lower protective shell.
  • a layer/element when referred to as being "on" another layer/element, the layer/element may be directly on the other layer/element, or there may be an intermediate layer/element between them. element.
  • the layer/element may be located “under” the other layer/element when the orientation is reversed.
  • a flat-plate plasma generator with a hybrid plasma structure includes a discharge vessel 1 with gas supply ports 10 and exhaust ports 11 on the left and right sides.
  • An AC pulse power supply 3, a plasma discharge assembly 4 connected to it, and a replaceable working platform 2 below are provided.
  • the frequency of the AC pulse power supply 3 is 10-350kHz and the voltage amplitude is 0.5-2kV.
  • the upper part of the plasma discharge assembly 4 is an upper protective shell 12 made of polytetrafluoroethylene.
  • the bottom surface of the upper protective shell 12 is composed of a three-layer structure of an upper dielectric layer 6, a copper main discharge plate 5, and a lower dielectric layer 7.
  • the upper dielectric layer 6 and the lower dielectric layer 7 are both filled with insulating materials such as ceramic or quartz.
  • the top right side of the main discharge plate 5 is connected to the AC pulse power supply 3, and the right side of the replaceable work platform 2 is connected to the stepping motor 8. Phase connection.
  • the replaceable work platform 2 is composed of an object 13, a rotating track 14, a fixture base 15, an object fixture 16, and the fixture base 15 is composed of aluminum, the rotating track 14 and the object
  • the jig 16 is made of polytetrafluoroethylene.
  • the lower part of the replaceable work platform 2 is a detachable lower protective shell 17, which is made of polytetrafluoroethylene. It protects the replaceable work platform 2 and detachable lower
  • the size of the housing 17 is adjusted, and the flat-plate plasma generator can handle objects of different sizes and shapes.
  • Figure 2 (bottom) shows the left side view of the device.
  • Figure 2 (bottom) shows the initial position of the placed object 13
  • Figure 2 (bottom) shows the rotated position of the placed object 13.
  • the placed object 13 is fixed by three sets of object fixtures 16 arranged in parallel on the fixture base 15. After a working processing cycle is over, the placed object 13 is driven by the stepping motor 8 to connect the fixture base 15 of the object fixture 16 along the rotating track 14 Rotate 180 degrees counterclockwise to continue processing for one working cycle, thereby ensuring that the surface of the placed object 13 is completely covered.
  • Fig. 3 is an axonometric diagram of the plasma discharge assembly 4 and the replaceable work platform 2.
  • the placed object 13 is represented by a dark stick-like object.
  • the fixture base 15 and the three object fixtures 16 are all the same as those shown in Figure 3 In the initial position, the size of the area of the detachable lower protective shell 17 can be adjusted according to the actual shape and size of the placed object 13 and the radius of the circular rotating track 14 in the work platform 2.
  • a confined space is provided by the discharge vessel, a working platform is used to place the processed conductor or insulator material at the same time as an auxiliary electrode, an AC pulse power supply provides a discharge voltage for the plasma discharge, and a plasma discharge plate is used for the main discharge.
  • This structure discharges in the device When the plasma is generated between the discharge plate and the working platform below, the discharge is directly induced by the conductor itself or the fixture base of the working platform. In this way, the device can deal with conductors with complex surface shapes and special dimensions for complete surface bonding treatment.
  • the surface of the insulator under similar conditions is processed with a higher degree of adhesion, and the design is designed to address the limitation of the treatment target distance of the generating electrode in the direct plasma, and combine the advantages of the hybrid plasma structure in the treatment coverage
  • the replaceable working platform is suitable for objects of different sizes.
  • the device is suitable for both atmospheric and low-pressure environments. It has a wide range of applications. It improves the handling of different scales of the hybrid plasma generator without arcing and ensuring safety. The flexibility and processing efficiency of objects and materials.
  • the working principle of the present invention is:
  • the object 13 to be placed is delivered through the disassembly area of the detachable lower protective shell 17 and fixed in the object fixture 16, and the work platform 2 is placed on the outer surface of the lower dielectric layer 7 near the bottom of the main discharge plate 5.
  • the power supply 3 provides the discharge voltage for the discharge.
  • the working gas is introduced into the discharge vessel 1 through the gas supply port 10 and the exhaust port 11, and the pressure inside the vessel is controlled according to the processing requirements.
  • the working gas In the standard atmospheric pressure environment, the working gas is air; Under atmospheric pressure, the working gas is inert gas such as helium or argon.
  • the entire work platform 2 and the discharge assembly 4 are insulated from each other, so the work platform 2 is regarded as a floating electrode.
  • the dielectric barrier glow discharge generated by the main discharge plate 5 is placed The object 13 is directly triggered and subjected to plasma treatment; when the placed object 13 is an insulator or a material with poor conductivity, the dielectric barrier glow discharge generated by the main discharge plate 5 penetrates the placed object 13 by the aluminum fixture base 15 Trigger and perform plasma treatment.
  • the discharge vessel 1 is used to provide a confined space
  • the AC pulse power supply 3 provides the discharge voltage for the copper main discharge plate 5
  • the working platform 2 is used to place the object to be processed and as a floating electrode to trigger the glow discharge of the dielectric barrier, thus the device
  • the plasma 9 is generated between the copper main discharge plate 5 and the replaceable work platform 2.
  • the discharge path is directly induced by the placed object 13 made of conductive material or the aluminum fixture base 15, which has a good surface mount. It is suitable for a wide range of applications, and improves the processing efficiency of plasma without generating arcs and ensuring safety.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

基于混合型等离子体结构的平板式等离子体发生装置，包括左右两侧分别带有供气口(10)和排气口(11)的放电容器(1)，在放电容器(1)内部自上而下依次设置交流脉冲电源(3)、与其相连接的等离子体放电总成(4)以及下方的可更换式工作平台(2)。首先通过可拆卸式下保护壳(17)的拆卸区域送入被放置物体(13)并固定在物件夹具(16)中，通过交流脉冲电源(3)为放电提供放电电压，通过供气口(10)和排气口(11)向放电容器(1)中通入工作气体并根据处理要求控制放电容器(1)内部的气压。从而实现能够同时适用于大气压和低气压环境，应用范围广泛。

Description

基于混合型等离子体结构的平板式等离子体发生装置 【技术领域】
本发明涉及等离子体技术领域，特别涉基于混合型等离子体结构的平板式等离子体发生装置。
【背景技术】
等离子体作为物质的第四态，其离子化气体、激发活性粒子、辐射紫外线等特性被广泛应用于消毒杀菌领域和临床医学中，近年来持续成为应用领域的研究热点。
在实际应用中，工作于低温(通常低于40摄氏度)和大气压或低气压环境下的等离子体发生装置被经常使用，该种类型设备的工作原理主要分为以下几类：
第一种是直接型等离子体发生源，直接利用目标区域作为辅助电极进行触发放电产生等离子体，该种方法主要采用基于浮动式电极的介质阻挡放电技术为实现，能够产生相对均匀的等离子体以及高浓度活性物质。同时相对于其他两种类型的装置，直接型等离子体发生源因其结构特点有着对等离子体的触发位置高度可控的优势，但也有着触发距离须为固定距离等局限。该种基于浮动式电极的介质阻挡放电结构作为近年出现的新兴技术，在直接型等离子体发生装置领域有着诸多研究，其被广泛。
第二种是间接型等离子体发生源，是在发生设备内部的两个电极之间产生等离子体，进而通过载体气体或扩散的方式将等离子体传递至目标区域。通过控制载体气体可改变该气体中等离子体产生的活性物质的成分，以及控制等离子体射流的射出位置。间接性等离子体发生设备可采用等离子体针筒、等离子体喷嘴、 大尺寸等离子体火炬等结构实现，其具有应用尺寸灵活的优势，但另一方面由于其等离子体的间接式发生机理等问题，该类型设备也存在着可控性较弱、等离子体产生的活性物质浓度较低等不足。
第三种是混合型等离子体发生源，是一种结合直接型和间接型等离子体发生源的混合结构，该方法主要利用表面微放电技术，在接地的多电极阵列中触发微放电现象并产生等离子体，其优势在于电极阵列的面积较大，对目标区域的覆盖能力较强，但由于电极阵列中的导线网格电阻值较小，其在目标区域产生的丝状微放电电束的穿透能力较弱，难以完全穿过目标区域。
【发明内容】
为了解决以上技术问题，本发明的目的在于提供基于混合型等离子体结构的平板式等离子体发生装置，装置同时适用于大气压和低气压环境，应用范围广泛，在不产生电弧、保证安全性的前提下提高了混合型等离子体发生装置在处理不同尺度和材料的物件上的灵活度和处理效能。
为了实现上述目的，本发明采用的技术方案是：
基于混合型等离子体结构的平板式等离子体发生装置，包括左右两侧分别带有供气口和排气口的放电容器，在放电容器内部自上而下一次设置交流脉冲电源、与其相连接的等离子体放电总成以及下方的可更换式工作平台。
所述的交流脉冲电源的频率为10-350kHz且电压幅值为0.5-2kV。
所述的等离子体放电总成上部为聚四氟乙烯材料的上保护外壳，上保护外壳的底表面由上介质层、铜制主放电板以及下介质层三层式结构组成，上介质层和下介质层均由陶瓷或石英等绝缘材料填充构成，主放电板右侧顶端与交流脉冲电源相连接。
所述的可更换式工作平台由被放置物体、夹具底座、物件夹具、旋转轨道、步进电机共同组成，夹具底座上设置有三个一组平行设置的物件夹具，被放置物件由物件夹具固定，物件夹具下方为夹具底座，夹具底座设置在旋转轨道上，夹具底座通过步进电机带动沿旋转轨道逆时针旋转，可更换式工作平台下方为可拆卸式下保护外壳。
所述的旋转轨道为圆形旋转轨道。
所述的可拆卸式下保护外壳区域的大小可根据实际被放置物件的形状尺寸与工作平台中圆形旋转轨道的半径进行调整。
所述的夹具底座的构成材料为铝，物件夹具和旋转轨道的构成材料均为聚四氟乙烯，所述的可拆卸式下保护外壳由聚四氟乙烯材料构成。
本发明的有益效果：
利用放电容器提供密闭空间、交流脉冲电源为铜质主放电板提供放电电压、工作平台用于放置被处理物和作为悬浮式电极以触发介质阻挡的辉光放电，由此该装置放电时，等离子体产生于铜质主放电板与可更换式工作平台之间，放电路径随由导体材料构成的被放置物体或铝制夹具底座直接诱发，具有良好的表面贴合度，应用范围广泛，在不产生电弧、保证安全性的前提下提高了等离子体的处理效能。
【附图说明】
图1为混合型等离子体结构的平板式等离子体发生装置示意图。
图2为等离子体发生装置中旋转轨道的内部结构示意图。
图3为等离子放电总成4与可更换式工作平台2的轴测示意图。
其中，1-放电容器；2-可更换式工作平台；3-交流脉冲电源；4-等离子体放 电总成；5-铜制主放电板；6-上介质层；7-下介质层；8-步进电机；9-等离子体；10-供气口；11-排气口；12-上保护外壳；13-被放置物体；14-旋转轨道；15-夹具底座；16-物件夹具；17-可拆卸式下保护外壳。
【具体实施方式】
为了使本技术领域的人员更好地理解本发明方案，下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分的实施例，不是全部的实施例，而并非要限制本发明公开的范围。此外，在以下说明中，省略了对公知结构和技术的描述，以避免不必要的混淆本发明公开的概念。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都应当属于本发明保护的范围。
在附图中示出了根据本发明公开实施例的各种结构示意图。这些图并非是按比例绘制的，其中为了清楚表达的目的，放大了某些细节，并且可能省略了某些细节。图中所示出的各种区域、层的形状及它们之间的相对大小、位置关系仅是示例性的，实际中可能由于制造公差或技术限制而有所偏差，并且本领域技术人员根据实际所需可以另外设计具有不同形状、大小、相对位置的区域/层。
本发明公开的上下文中，当将一层/元件称作位于另一层/元件“上”时，该层/元件可以直接位于该另一层/元件上，或者它们之间可以存在居中层/元件。另外，如果在一种朝向中一层/元件位于另一层/元件“上”，那么当调转朝向时，该层/元件可以位于该另一层/元件“下”。
下面结合附图对本发明作进一步详细说明。
如图1所示，混合型等离子体结构的平板式等离子体发生装置，包括左右两 侧分别带有供气口10和排气口11的放电容器1，在放电容器1内部自上而下一次设置交流脉冲电源3、与其相连接的等离子体放电总成4以及下方的可更换式工作平台2。
所述的交流脉冲电源3的频率为10-350kHz且电压幅值为0.5-2kV。
所述的等离子体放电总成4上部为聚四氟乙烯材料的上保护外壳12，上保护外壳12的底表面由上介质层6、铜制主放电板5以及下介质层7三层式结构组成，上介质层6和下介质层7均由陶瓷或石英等绝缘材料填充构成，主放电板5右侧顶端与交流脉冲电源3相连接，可更换式工作平台2右侧与步进电机8相连接。
如图2所示，所述的可更换式工作平台2由被放置物体13、旋转轨道14、夹具底座15、物件夹具16、共同组成，夹具底座15的构成材料为铝，旋转轨道14和物件夹具16的构成材料均为聚四氟乙烯，可更换式工作平台2下方为可拆卸式下保护外壳17，由聚四氟乙烯材料构成，通过对可更换式工作平台2和可拆卸式下保护外壳17的尺寸调整，该平板式等离子体发生装置可处理不同尺寸和形状的物件。
如图2(下)所示为装置的左视图，图2(下)上图为被放置物件13的初始位置，图2(下)下图为被放置物件13的旋转后位置，被放置物件13由在夹具底座15上三个一组平行设置的物件夹具16固定，在一个工作处理周期结束后，被放置物件13经由步进电机8带动连接物件夹具16的夹具底座15沿着旋转轨道14逆时针旋转180度，继续处理一个工作周期，从而保证了对被放置物件13的表面进行完全覆盖处理。
图3为等离子放电总成4与可更换式工作平台2的轴测示意图，被放置物件13以深色棍状物体表示，夹具底座15与三个物件夹具16均在与图3上图相同的 初始位置，可拆卸式下保护外壳17区域的大小可根据实际被放置物件13的形状尺寸与工作平台2中圆形旋转轨道14的半径进行调整。
通过放电容器提供密闭空间、工作平台用于放置被处理导体或绝缘体材料同时作为辅助电极、交流脉冲电源为等离子体放电提供放电电压、等离子体放电板用于主放电，这样的结构在该装置放电时，等离子体产生于放电板与下方工作平台之间，由被处理导体本身或工作平台的夹具底座直接诱发放电，这样该装置可以应对表面形状复杂、尺寸特殊的导体进行表面完全贴合处理，或对相似情况下的绝缘体表面进行贴合度较高的处理，并且针对直接型等离子体中发生电极在处理目标距离上的限制，结合混合型等离子体结构的在处理覆盖率上的优势，设计了适用于不同尺寸物件的可更换式工作平台，装置同时适用于大气压和低气压环境，应用范围广泛，在不产生电弧、保证安全性的前提下提高了混合型等离子体发生装置在处理不同尺度和材料的物件上的灵活度和处理效能。
本发明的工作原理为：
首先通过可拆卸式下保护壳17的拆卸区域送入被放置物件13并固定在物件夹具16中，并将工作平台2置于靠近主放电板5底部的下介质层7外表面，通过交流脉冲电源3为放电提供放电电压，通过供气口10和排气口11向放电容器1中通入工作气体并根据处理要求控制容器内部的气压，在标准大气压环境下，工作气体为空气；在低气压环境下，工作气体采用氦气或氩气等惰性气体。整个工作平台2与放电总成4相互绝缘隔离，因此工作平台2被视为悬浮式电极，当被放置物件13为导体材料时，主放电板5所发生的介质阻挡的辉光放电被被放置物件13直接触发并进行等离子体处理；当被放置物件13为绝缘体或导电性能较差材料时，主放电板5所发生的介质阻挡的辉光放电击穿被放置物件13被铝 制夹具底座15触发并进行等离子体处理。
利用放电容器1提供密闭空间、交流脉冲电源3为铜质主放电板5提供放电电压、工作平台2用于放置被处理物和作为悬浮式电极以触发介质阻挡的辉光放电，由此该装置放电时，等离子体9产生于铜质主放电板5与可更换式工作平台2之间，放电路径随由导体材料构成的被放置物体13或铝制夹具底座15直接诱发，具有良好的表面贴合度，应用范围广泛，在不产生电弧、保证安全性的前提下提高了等离子体的处理效能。
以上内容仅为说明本发明的技术思想，不能以此限定本发明的保护范围，凡是按照本发明提出的技术思想，在技术方案基础上所做的任何改动，均落入本发明权利要求书的保护范围之内。

Claims (8)

  1. 基于混合型等离子体结构的平板式等离子体发生装置，其特征在于，包括左右两侧分别带有供气口(10)和排气口(11)的放电容器(1)，在放电容器(1)内部自上而下依次设置交流脉冲电源(3)、与其相连接的等离子体放电总成(4)以及下方的可更换式工作平台(2)。
  2. 根据权利要求1所述的基于混合型等离子体结构的平板式等离子体发生装置，其特征在于，所述的交流脉冲电源(3)的频率为10-350kHz且电压幅值为0.5-2kV。
  3. 根据权利要求1所述的基于混合型等离子体结构的平板式等离子体发生装置，其特征在于，等离子体发生装置在标准大气压环境工作时，经由供气口(10)和排气口(11)通过放电容器(1)的工作气体为空气；等离子体发生装置在低气压环境工作时，经由供气口(10)和排气口(11)通过放电容器(1)的工作气体采用氦气或氩气等惰性气体。
  4. 根据权利要求1所述的基于混合型等离子体结构的平板式等离子体发生装置，其特征在于，所述的等离子体放电总成(4)上部为聚四氟乙烯材料的上保护外壳(12)，上保护外壳(12)的底表面由上介质层(6)、铜制主放电板(5)以及下介质层(7)三层式结构组成，上介质层(6)和下介质层(7)均由陶瓷或石英等绝缘材料填充构成，主放电板(5)右侧顶端与交流脉冲电源(3)相连接。
  5. 根据权利要求1所述的基于混合型等离子体结构的平板式等离子体发生装置，其特征在于，所述的可更换式工作平台(2)由夹具底座(15)、物件夹具(16)、旋转轨道(14)、步进电机(8)共同组成，夹具底座(15)上设置有三个一组平行设置的物件夹具(16)，被放置物件(13)由物件夹具(16)固定， 物件夹具(16)下方为夹具底座(15)，夹具底座(15)设置在旋转轨道(14)上，夹具底座(15)通过步进电机(8)带动沿旋转轨道(14)逆时针旋转，可更换式工作平台(2)下方为可拆卸式下保护外壳(17)。
  6. 根据权利要求4所述的基于混合型等离子体结构的平板式等离子体发生装置，其特征在于，所述的旋转轨道(14)为圆形旋转轨道，旋转运动范围为180度。
  7. 根据权利要求4所述的基于混合型等离子体结构的平板式等离子体发生装置，其特征在于，所述的可拆卸式下保护外壳(17)区域的大小可根据实际被放置物件(13)的形状尺寸与工作平台(2)中圆形旋转轨道的半径进行调整和定制。
  8. 根据权利要求4所述的基于混合型等离子体结构的平板式等离子体发生装置，其特征在于，所述的夹具底座(15)的构成材料为铝，物件夹具(16)和旋转轨道(14)的构成材料均为聚四氟乙烯，所述的可拆卸式下保护外壳(17)由聚四氟乙烯材料构成。
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