WO2021009057A1 - Dispositif de séparation de particules, système de revêtement et procédé - Google Patents

Dispositif de séparation de particules, système de revêtement et procédé Download PDF

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Publication number
WO2021009057A1
WO2021009057A1 PCT/EP2020/069586 EP2020069586W WO2021009057A1 WO 2021009057 A1 WO2021009057 A1 WO 2021009057A1 EP 2020069586 W EP2020069586 W EP 2020069586W WO 2021009057 A1 WO2021009057 A1 WO 2021009057A1
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WO
WIPO (PCT)
Prior art keywords
particles
particle
coating
separation
stage
Prior art date
Application number
PCT/EP2020/069586
Other languages
German (de)
English (en)
Inventor
Maik Vieluf
Daniel Fritsche
David Tucholski
Original Assignee
VON ARDENNE Asset GmbH & Co. KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by VON ARDENNE Asset GmbH & Co. KG filed Critical VON ARDENNE Asset GmbH & Co. KG
Publication of WO2021009057A1 publication Critical patent/WO2021009057A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/36—Selection of substances as active materials, active masses, active liquids
    • H01M4/362—Composites
    • H01M4/366—Composites as layered products
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C7/00—Separating solids from solids by electrostatic effect
    • B03C7/02—Separators
    • B03C7/12—Separators with material falling free
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/10—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
    • B22F1/102—Metallic powder coated with organic material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/14—Treatment of metallic powder
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/16—Metallic particles coated with a non-metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4417—Methods specially adapted for coating powder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/04—Processes of manufacture in general
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
    • B01J2/006—Coating of the granules without description of the process or the device by which the granules are obtained
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
    • H01M4/139—Processes of manufacture
    • H01M4/1391—Processes of manufacture of electrodes based on mixed oxides or hydroxides, or on mixtures of oxides or hydroxides, e.g. LiCoOx
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries

Definitions

  • Various exemplary embodiments relate to a particle separation device, a coating arrangement and a method.
  • a solid e.g. its surface
  • Functionalized solids such as particles
  • PEM fuel cell
  • soot particles graphite
  • a lithium-ion battery e.g. a battery based on liquid electrolyte or solid electrolyte (so-called “solid state” or “all solid state”)
  • active materials as part of the battery electrodes form the essential components for maximizing the energy storage capacity and thus the volume density, energy density and power density.
  • Their ionic or electrical properties are determined by the type of active material selected for the anode or the cathode in conjunction with the
  • Active material in the form of particles offers an opportunity to influence this interaction.
  • the electrical connection of particles to one another or in interaction with the current collector of the cathode is particularly difficult on the cathode side.
  • the surface of the particles is in the electrochemical potential of a cell
  • a free-fall fluidized bed granulator or a sol-gel process is conventionally used, which, for example, coats particles of lithium-nickel-manganese-cobalt oxide (LNMC) with a very thin LiNb0 3 layer, which is extremely time-consuming .
  • a PVD process PVD - physical vapor deposition
  • CVD chemical vapor deposition
  • ALD atomic layer deposition
  • spatial ALD spatial ALD
  • a powder membrane coating device can be used, which belongs to the technical field of membrane coating equipment and is included in the
  • This “rebound vibration device” is arranged in such a way that the ion beam from the ion source is directed onto a vibrating crucible (filled with powder) as the target.
  • a vibrating powder membrane increases the distance between neighboring particles of the powder so that an almost spherical 3D particle coating can be achieved.
  • the wet chemical process is limited in terms of layer thickness and the number of possible material combinations.
  • a coating arrangement and a method are provided which enable the coating of particles in a vacuum at low cost, with a high throughput and a large layer thickness, and are accessible for a large number of material combinations.
  • the coated particles can, for example, be used to store an energy store, for example a battery (e.g. a
  • the coating arrangement and the method essentially enable one
  • Coherent and reverse coating (e.g. two-sided or more, i.e. from two or more directions, e.g. three-sided) of particles.
  • the coating can be used to functionalize the surface of individual and / or particles isolated from one another. This coating on the reverse side is achieved in that the particles can clearly fall freely. The free fall favors, for example, that the particles are turned over so that they continuously change their orientation and / or are exposed to the coating material on the reverse side. If, on the other hand, the particles clump together, this coating on the reverse side can be more difficult. This can be counteracted by separating the particles.
  • Separation stage has an impact surface and is set up to accelerate the particles in the direction of an impact surface, so that an impact of the particles on the impact surface caused thereby separates them from one another.
  • FIG. 1 shows a particle separation device according to various embodiments in a schematic side view or cross-sectional view
  • Figure 2 shows a coating arrangement according to various embodiments in one
  • FIG. 3 shows the kinetics of the electrical isolation according to various embodiments in a schematic flow chart
  • FIG. 4, FIG. 5 and FIG. 21A each show a coating arrangement according to various
  • Figure 6A, Figure 7, Figure 8, Figure 9A, Figures 11 to 15 each have one
  • FIG. 6B and FIG. 6C each show the kinetics of mechanical separation in one
  • FIG. 9B, FIG. 10A, FIG. 10B and FIG. 16 each show the kinetics of the electrical isolation in a schematic diagram
  • FIGS. 17 to 20 each show a coating arrangement according to various
  • FIG. 21B shows the kinetics of the uniformly distributed feed in a schematic diagram
  • FIGS. 22 to 24 each show a coating arrangement according to various
  • FIGS. 25 and 26 each show a method according to various embodiments in a schematic flow diagram.
  • FIGS. 25 and 26 each show a method according to various embodiments in a schematic flow diagram.
  • Embodiments are shown in which the invention can be practiced.
  • directional terminology such as “top”, “bottom”, “front”, “back”, “front”, “back”, etc. is used with reference to the orientation of the character (s) being described.
  • components of embodiments come in a number of different orientations
  • Connection e.g. ohmic and / or electrically conductive, e.g. an electrically conductive
  • Coupled may be used in the sense of a (e.g. mechanical, hydrostatic, thermal and / or electrical), e.g.
  • connection and / or interaction are understood.
  • Several elements can, for example, be coupled to one another along an interaction chain, along which the interaction (e.g. a signal) can be transmitted.
  • two elements that are coupled to one another can exchange an interaction with one another, e.g. mechanical, hydrostatic, thermal and / or electrical
  • Coupled can be understood to mean a mechanical (e.g. physical) coupling, e.g., by means of direct physical contact.
  • a clutch can be set up to transmit a mechanical interaction (e.g. force, torque, etc.).
  • a gas coupling can enable a gas to be exchanged.
  • a vacuum coupling can have a gas coupling that is encapsulated in a vacuum-tight manner.
  • Controlling can be understood as an intended influencing of a system.
  • the state of the system can be changed according to a specification. Rules can be used as taxes be understood, in addition, a change in the state of the system is counteracted by disturbances.
  • the controller can clearly have a control path directed towards the front and thus clearly implement a sequence control which is a
  • the control path can, however, also be part of a control loop, so that regulation is implemented.
  • the regulation has a continuous influence of the output variable on the input variable, which is effected by the control loop (feedback).
  • a regulation can be used as an alternative or in addition to the control or regulation can take place as an alternative or in addition to the control.
  • an actual value of the controlled variable e.g.
  • a measured value is compared with a reference value (a setpoint or a specification or a default value) and the controlled variable can be influenced accordingly by means of a manipulated variable (using an actuator) that there is as little deviation as possible of the respective actual value of the controlled variable from the reference value.
  • a reference value a setpoint or a specification or a default value
  • particles can be understood as bodies (clearly grains) which have a solid or are formed from it, ie matter present in a solid state of aggregation (whereby the matter can have several atoms and / or molecules) .
  • a large number of particles can clearly be present as a loose amount (also referred to as a mixture or conglomerate), i.e. isolated, e.g. as granules (e.g. powder).
  • the particles can have an extension (clearly particle size) greater than 5 nm (nanometers), for example greater than 0.1 ⁇ m (micrometers) and / or less than 1 mm (millimeters), for example in a range from approximately 10 nm to approximately 500 pm or in a range from about 0.1 pm to about 1 mm.
  • the particle size of an individual particle can clearly correspond to the diameter of a sphere which has the volume of the particle.
  • the particle size related to a large number of particles can correspond to the particle size averaged over the individual particles.
  • a single particle is referred to in a simplified manner. What has been described can apply analogously to each particle of the plurality of particles. Depending on the progress of their processing, two or more particles can be individually (i.e. separated from one another) or
  • particle clusters adhering to one another (also referred to as particle clusters).
  • particle clusters can also apply analogously to each particle cluster of the plurality of particles.
  • a plurality of particles can each be coated by means of a coating material, so that each particle is composed of a layer (also referred to as a particle coating)
  • Coating material is surrounded (eg enveloped), with the coated particles again can be present as a conglomerate (ie sporadically).
  • the coated particles can differ from one another and / or from the coating material in their chemical
  • Metal oxide or a transition metal oxide Metal oxide or a transition metal oxide
  • a dielectric Metal oxide or a transition metal oxide
  • inorganic polymer e.g. a carbon-based polymer or a silicon-based polymer
  • the carbon can be in a carbon configuration, e.g., graphite or nano-crystalline amorphous carbon.
  • the coating material can be at least one metal (e.g. aluminum,
  • Zirconium, lanthanum, nickel, titanium and / or chromium comprising or formed therefrom) have or be formed therefrom.
  • Coating material have a battery active material or be formed therefrom.
  • a battery active material also referred to simply as active material
  • active material a material can be understood which absorbs or releases electrical charges under a chemical reaction (in other words, which converts electrical energy into chemical energy, and vice versa).
  • the active material can be a lithium-ion battery
  • Examples of a battery active material of the cathode are for example nickel-manganese-cobalt (NMC), lithium-iron-phosphate (LFP), lithium-nickel-cobalt-aluminum oxide (NCA), lithium manganese oxide (LMO) and / or lithium nickel manganese oxide (LNMO).
  • Examples of a battery active material of the anode are graphite (or carbon in a different configuration), nanocrystalline and / or amorphous silicon, a silicon-carbon composite, lithium-titanate (spinel) oxide, metallic lithium or tin dioxide (SnO ?).
  • the large number of particles (e.g. to be coated) (also referred to as powder or powder material) are collectively guided and separated in a vertical arrangement of several successive mechanical and / or electrostatic dispersion stages. Alternatively or in addition, a uniform
  • a coating device for example a material vapor source.
  • the coating device can, for example, provide one or more than one electron beam-induced material vapor, by means of which an almost uniform all-round coating of the particles can be achieved.
  • the corresponding material vapor source can alternatively or additionally also be arranged laterally.
  • a loosening device can be a
  • the vibration source or one of the vibration sources described herein can be set up to couple a vibration into the particle support (also referred to as a vibratable particle support).
  • the vibration can die
  • the loosening device can also have another drive which is set up to mechanically stimulate the particle support (e.g. by means of impacts (from inside or outside), rotation of the particle support or others
  • the particle support can, for example, comprise a membrane, a flat plate (e.g. a disk) or an everted plate (e.g. a plate).
  • the particle layer can, for example, be deformed periodically, e.g. according to a vibration mode.
  • the particles stimulated to move can experience impacts with one another and with the particle support, which increases their distance from one another and thus clearly “loosens” them.
  • the loosening can have that binding and / or
  • Adhesion forces of the particles to one another and / or to the particle support by means of mechanical excitation are reduced or eliminated.
  • the loosened particles can behave like a fluid (also referred to as fluidized particles or particle fluid).
  • the particles can flow in their entirety (i.e. all of the particle fluid) and the particle fluid can continuously deform under the influence of shear forces.
  • the particle fluid can alternatively or additionally (to the transfer of kinetic energy to this) be made available by blowing a gas between the particles.
  • the gas can make it difficult to maintain a vacuum.
  • the oscillation source can be set up to vary the coupled oscillation (e.g. temporally and / or spatially) so that the oscillation mode of the particle layer oscillates according to several oscillation modes.
  • the vibration source can be set up, for example, to generate various frequencies (also referred to as vibration frequencies).
  • the vibration source can be set up to couple the vibration at different points (also referred to as coupling points) of the particle support.
  • the vibration source can generally have one or more than one actuator (also referred to as a converter) which is set up to transmit an electrical signal (for example an electrical Vibration, e.g. an alternating voltage) into a mechanical vibration.
  • the or each actuator can for example have a piezo actuator, an eccentric, an unbalance motor and / or an electrical coil.
  • the multiple coupling points (for example supplied from inside or outside) can be provided, for example, by means of multiple actuators.
  • the plurality of oscillation frequencies can be provided, for example, by controlling an actuator (for example piezo actuators) with different signals.
  • the particle support can be excited by means of an oscillation in accordance with a (e.g. cyclic) scheme, the scheme having several phases that differ from one another in terms of the frequency and / or the location of the coupled-in oscillation.
  • a (e.g. cyclic) scheme the scheme having several phases that differ from one another in terms of the frequency and / or the location of the coupled-in oscillation.
  • the different frequencies or points do not necessarily have to be coupled in cyclically in a fixed sequence, but can also be varied randomly.
  • the particle support can be excited to oscillate in accordance with individual and / or multiple oscillation modes, which, for example, are continuously changed. This prevents the formation of standing wave crests or troughs by changing the oscillation pattern (e.g. the Chladni’s figure) locally and temporally, whereby the fluid-like
  • the suspended state of the particles is maintained constant and longer.
  • the vibration of the particle support can optionally cause a separation of the particles (or
  • the vibration source can be controlled, for example, by means of a control device, for example according to the diagram.
  • An electron source described herein can be configured to deliver electrons, e.g., into a vacuum or into a solid.
  • the electron source can for example be set up for thermal emission of electrons into the vacuum, for
  • the electron source can also have a plasma source.
  • the electron source can do this with a power supply be coupled, which supplies the electron source with an electric current so that the electrons released are tracked.
  • microwave radiation can be used to separate or loosen particle agglomerations.
  • the particle agglomerations pass through - preferably in free fall - an area in which microwave radiation acts, for example in the usual frequency range of 2.45 GHz.
  • the residual moisture contained in the particle agglomerations is heated and evaporated by the microwave radiation, the agglomeration being broken up and disintegrating into individual particles.
  • a coating material can be evaporated by means of an electron beam (also referred to as electron beam evaporation).
  • the coating material also referred to as evaporation material
  • the coating material can be or will be provided in the form of subliming (or semi-subliming) material, e.g.
  • Fig.l illustrates a particle separation device 100 according to various
  • Embodiments in a schematic side view or cross-sectional view Embodiments in a schematic side view or cross-sectional view.
  • the particle singulation device 100 may have an inlet opening 102e and a
  • Isolation stages 104 can guide the particles 106 picked up through the inlet opening 102e to the outlet opening 102a, for example along a path 111 (also referred to as a guide path 111).
  • the particles 106 can be picked up at the inlet opening 102e continuously or in batches.
  • the guide path 111 can describe, for example, the path that the mean center of gravity of the plurality of particles 106 takes.
  • the multiple separation stages 104 can be arranged, for example, in series, for example one behind the other. However, immediately successive separation stages 104 can also interlock along the guide path 111 or at least have common components.
  • the multiple isolation stages 104 can have at least a first isolation stage 104a and a second isolation stage 104b.
  • the first isolation stage 104a can be of the electrical isolation type (also simplified as an electrical isolation stage 104a designated).
  • the second separation stage 104b can be of the mechanical separation type (also referred to in simplified form as a mechanical separation stage 104b).
  • Isolation stage 104a and the second isolation stage 104b can optionally be provided by means of a common arrangement in which one or more than one component is optionally a component of the first isolation stage 104a and the second second second
  • Isolation stage 104b can be. This will be described in more detail later.
  • Electrons 113 can be introduced into the multiplicity of particles 106 by means of the electrical isolation stage 104a, a charge caused thereby separating the particles 106 from one another (also referred to as electrical isolation 10lv or electrical isolation 10lv).
  • electrons can be supplied 101 to the particles (also referred to as electron inflow 101 or “introduction 101 of electrons”).
  • the isolation stage 104a can have an electron source, as will be described in more detail below, which provides the electrons 113.
  • the electrons can for example be or are provided as free electrons, e.g. by means of a non-thermal
  • the particles 106 can be electrically charged by means of the electrons, so that an electrical force is imparted between them (for example according to Coulomb's law), which repels the particles 106 from one another (also referred to as a repulsive force).
  • the electrical power introduced into the particles 106 can be so small that a temperature of the particles 106 remains lower than a temperature at which the particles 106 their
  • Change state of aggregation e.g. melt, evaporate and / or sublimate.
  • the particles 106 can remain solid during the electrical isolation.
  • the particles 106 can be accelerated 103 in the direction of an impact surface 104p.
  • kinetic energy can be supplied 103 to the particles 106, which accelerates 103 the particles 106 (also referred to as acceleration 103).
  • the acceleration 103 can for example take place obliquely to or against the direction 155 of the gravitational force (also referred to as vertical 155) and / or in addition to an acceleration by the gravitational force.
  • the particles 106 can be given a mechanical force (also referred to as impact force) which separates the particles 106 from one another (also referred to as mechanical separation 103v or mechanical separation 103v).
  • the particles 106 can remain fixed during the mechanical separation 103v.
  • Impact surface 104p can be provided, for example, by means of an impact wall 104p (for example a impact plate 104p).
  • the (for example mechanical and / or electrical) isolation 10lv, 103v can have the effect that two or more particles that adhere to one another are separated from one another (ie separated) (also referred to as an isolation process). The individual particles can be preserved in their integrity (also referred to as non-destructive separation).
  • Two or more particles adhering to one another are also referred to herein as particle clusters or particle aggregates.
  • particle clusters or particle aggregates By means of isolation, one or more than one particle can be detached from a particle cluster, so that a particle cluster with fewer particles or a single particle results.
  • isolation By means of isolation, one or more than one particle can be detached from a particle cluster, so that a particle cluster with fewer particles or a single particle results.
  • Separation stages a plurality of separation processes can take place, so that the number and / or size of the particle clusters which are fed to the separation stage is greater than the number or size of the particle clusters which are discharged from the separation stage.
  • the number and / or size of the particle clusters can be related to a time interval, for example.
  • each isolation stage of the plurality of isolation stages 104 a vacuum can be provided through which the guide path 111 leads.
  • the isolation 10lv, 103v can take place in a vacuum.
  • the sequence of the isolation stages 104a, 104b shown here can also be different.
  • Both mechanical isolation stages 104b can also be connected in parallel to one another.
  • the particle singulation device 100 can be more than one electrical
  • Separation stage 104a and / or more than one mechanical separation stage 104b e.g. to improve the reliability of the separation.
  • the or each mechanical separation stage 104b (also referred to as a mechanical dispersion stage) can bring about the acceleration 103 of the particle clusters by means of a rotational movement, the rotational movement transferring a centrifugal force to a particle or particle cluster (also referred to as an agglomerate), which accelerates 103 causes.
  • the particle cluster accelerated in this way can absorb a sufficiently large impulse and can be effectively broken up when it hits the impact surface 104p.
  • the separated particles 106 can subsequently be processed, e.g. this material can be added (e.g. by means of coating), this material can be removed (e.g.
  • the separated particles 106 can be fed, for example, to a coating arrangement for coating, as will be described below. If the particles are isolated before they are coated, this can result in smaller units, the one provide larger functionalized surface. This increases the effect of the coating or the functionalization provided thereby.
  • the separation of the particles does not have to be
  • FIG. 2 illustrates a coating arrangement 200 according to various
  • Embodiments in a schematic side view or cross-sectional view Embodiments in a schematic side view or cross-sectional view.
  • the coating arrangement 200 can have a particle feed 202 and a collecting container 204, between which a cavity 206 (also referred to as coating space 206) is formed. Furthermore, the coating arrangement 200 can have a coating material source 208 which, for example, has a coating material with which the particles 106 are to be coated.
  • the coating material source 208 may generally be a coating material holding device (e.g., a crucible) for holding the
  • the coating material source can have a drive for rotating and / or tracking the coating material in order to ensure a stable process.
  • the coating material source 208 can be used to perform a
  • PVD physical vapor deposition
  • the coating material source 208 may be part of a coating device such as a PVD coating device or CVD coating device, as will be described in more detail below.
  • Coating apparatus may also include a power supply (e.g. a battery
  • Electron beam gun a gas discharge device or a heating device in the form of a boat evaporator, which is set up to evaporate the
  • Coating 2600 of particles which are exposed to the coating material emitted by the coating device For example, the
  • Coating device for providing a gaseous coating material (for example material vapor) be set up, which for example on the particles to form a layer can be deposited.
  • a coating device can include at least one of
  • a sputtering device e.g., a laser beam evaporator, an arc evaporator, a boat evaporator, an electron beam evaporator, and / or a resistive thermal evaporator.
  • a thermal evaporation device e.g., a laser beam evaporator, an arc evaporator, a boat evaporator, an electron beam evaporator, and / or a resistive thermal evaporator.
  • Sputtering device can be set up for atomizing the coating material by means of a plasma.
  • a thermal evaporation device can be used to evaporate the
  • Coating material be set up by means of thermal energy.
  • the thermal energy can for example by means of an electron beam and / or by means of a resistive
  • Heating device e.g. with the so-called boat evaporation
  • the coating material e.g. with the so-called boat evaporation
  • thermal evaporation i.e. a thermal transfer from a liquid state (liquid phase) to a gaseous state (gaseous phase)
  • Sublimation i.e. a thermal transfer of a solid state (solid phase) into a gaseous state
  • the thermal evaporation device can also sublime the coating material.
  • the sputtering device for sputtering can for example be arranged centrally in the coating room, e.g. by means of a vertical arrangement of sputtering targets (e.g. tubular magnetrons which are driven, for example, according to a planetary motion.
  • a coating device in the form of a thermal evaporation device (also referred to in simplified terms as an evaporation device). What has been described can also apply analogously to a coating device of another type, as described above.
  • the coating material may be vaporized 109 (more generally emitted 109) into cavity 206.
  • a subliming or semi-subliming coating material it is also possible to vaporize into the coating room from a lateral direction, e.g. at any angle to the vertical.
  • the particle feed 202 can have a feed gap 202s.
  • the feed gap 202s can be provided in the form of an annular gap and / or adjoin the outlet opening 102a.
  • annular gap can be understood here as a gap which extends along a self-contained path 202p (also referred to as gap path 202p), for example over more than 90% of gap path 202p.
  • the annular gap can be contiguous.
  • the annular gap can be interrupted one or more than once or have at least several segments separated from one another.
  • the annular gap can have at least two sections arranged on opposite sides of the gap path 202p (for example, segments separated from one another).
  • the cavity 206 can have a plurality of regions, for example a first region 206a and a second region 206b, or be formed therefrom.
  • the first region 206a can extend from the feed gap 202s to the collecting container 204 and surround the second region 206b (for example adjacent to it).
  • the second area 206b also called
  • Vapor expansion region 206b can adjoin the coating material source 208.
  • the first area 206a (also referred to as the fall area 206a) can be cut out on the inside, and the steam spreading area 206b can be arranged in the cutout.
  • the steam spreading area 206b can, for example, be cylindrical (e.g. with the cylinder axis parallel to the vertical 155) or at least have a lateral surface which is completely covered by the falling area 206a.
  • a vacuum into which the coating material is evaporated can be formed in the cavity 206.
  • a plurality of particles 106 can be introduced into the cavity 206 (e.g. the vacuum therein), e.g. into the drop area 206a and / or through the feed gap 202s.
  • the particles 106 can then be accelerated (also referred to as falling) by the force of gravity, e.g.
  • Collection container 204 towards and / or along a free fall path 211 which, for example, continues the guide path 111.
  • the falling of the particles 106 can cause this on the
  • Pass steam expansion area 206b For example, the particles 106 can fall outside of the vapor spreading region 206b. Due to the acceleration, the distances between the particles can increase when they fall, which makes it easier, for example, that they are exposed to the coating material on the reverse side.
  • the free fall path 211 can run essentially perpendicularly (ie parallel to the vertical 155) in the cavity 206 (for example with less than 10 ° deviation therefrom).
  • the deviation can occur when electrons and / or the coating material interact with the particles 106, for example drive them slightly outwards. Under certain circumstances, this can also be done to a greater extent.
  • particularly small particles for example nanoparticles with a particle size of much less than 1 ⁇ m, can get into motion and be carried outwards (ie in the direction of the chamber wall), right down to areas with lower metal vapor densities.
  • a ring electrode or an electrical potential can be arranged in this way be or will be (for example directly on / the insert) that a force is transmitted downwards to the charged particles.
  • the particles 106 can be introduced through the feed gap 202s along the free fall path 211.
  • the feed gap 202s can be set up in such a way that the
  • Free fall path 211 leads from gap path 202p (e.g. from any point of gap path 202p) past steam expansion area 206b and / or is arranged within fall area 206a, e.g. into collecting container 204.
  • the coating material evaporated into the vapor spreading area 206b can thus flow radially outward from the steam spreading area 206b through the falling particles 106, so that the plurality of particles 106 is coated 2600 with the coating material (also referred to as coating 2600).
  • Feed gap 202s may be essentially statistical (also referred to as statistical distribution) (along gap path 202p).
  • the particles 106 can clearly be distributed evenly along the entire feed gap 202s. This achieves the most uniform possible utilization of the coating material in the cavity 206.
  • the amount of particles that are summed up over a time interval through the gap section converge towards the same value with increasing length of the time interval.
  • the probability that a specific particle 106 will make its way through the gap section can be essentially the same for each gap section (also referred to as uniform distribution).
  • This type of feed (also referred to as uniformly distributed feed) of the particles 106 can be provided by means of the particle feed 202, as will be described in more detail below.
  • the mean distance between directly adjacent particles in the case also referred to as a particle curtain
  • the statistical deviation from this mean distance is minimized. This achieves a coating of the particles that is as homogeneous as possible.
  • the particle separation device 100 can be part of the Coating arrangement 200. However, these can also be provided separately from one another, for example if the individual particles are to be processed otherwise or if particle clusters are to be coated.
  • the vapor spreading area 206b can for example remain free of particles and / or at least be arranged next to the free fall path.
  • FIG. 3 illustrates the kinetics of the electrical isolation 10lv according to various embodiments in a schematic flow diagram 300, the time profile pointing downwards.
  • a particle cluster 106c which consists of two particles 106 (also referred to as a dicluster 106c). What has been described for the dicluster 106c can also apply analogously to a particle cluster composed of more than two particles.
  • the electrical separation 10v can for example take place electrostatically (also referred to as electrostatic separation or electrostatic dispersion).
  • the electrical isolation can take place by loading the particles 106 with (e.g. free) electrons, so that the particle cluster 106c can be broken down into smaller subunits (e.g. into two particle clusters 106c and / or individual particles).
  • the electrical isolation lOlv can be based on Coulomb's repulsion, which describes the driving electrostatic force that drives two or more particles (assumed charge centers) away from each other (through electrostatic charging) and thus stimulates their separation.
  • the radius r of a particle of any shape and size can correspond to the radius of a sphere (i.e. a spherical particle) which has the same volume as the particle of any shape and size.
  • a spherical (e.g. electrically conductive) particle with the radius r can be considered.
  • the electrostatically induced charge q and repulsion force Fc on this particle 106 can satisfy the following relation:
  • the repulsive force Fc induced by the charge q counteracts an adhesive force FH, which describes how strongly the particles 106 adhere to one another. If the repulsive force Fc exceeds the adhesive force FH, the particles 106 separate from each other (ie these are separated from each other).
  • the adhesive force F H can be estimated with the Hamaker constant A of the surfaces, the molecular distance s of the surfaces (approximately 0.4 nm) as: being with
  • FIG. 4 illustrates a coating arrangement 400 according to various
  • Embodiments in a schematic side view or cross-sectional view Embodiments in a schematic side view or cross-sectional view.
  • the vertically extending coating arrangement 400 may have a chamber housing 802k in which one or more than one vacuum chamber 802 is provided.
  • Vacuum chambers 802 can, for example, be coupled to one another in terms of vacuum technology and connected to one another by means of an opening 202s (e.g. the feed gap 202s).
  • the chamber housing 802k can be configured to be rotationally symmetrical, for example.
  • the chamber housing 802k may, for example, be grounded or on another
  • Reference potential can, for example be electric earth.
  • An electrical voltage described herein can be related to the reference potential, for example.
  • the electrical voltage can correspond, for example, to an electrical potential which has a difference from the reference potential in the amount of the voltage.
  • Each vacuum chamber 802 can provide one or more than one cavity (also referred to as a processing space) through which the particles 106 are passed and in which they are processed (e.g., coated). Processing in the processing room can take place by means of a processing stage 400a to 400f, which has the respective processing room.
  • a processing space also referred to as a processing space
  • Processing in the processing room can take place by means of a processing stage 400a to 400f, which has the respective processing room.
  • Material tracking can take place by means of a first processing stage 400a.
  • the first processing stage 400a can have a tracking mechanism 402 which is set up to continuously convey powder material into a processing space of a second processing stage 400b or an alternative or additional third processing stage 400c.
  • the particles 106 can be separated by means of the second processing stage 400b and the alternative or additional third processing stage 400c.
  • the second processing stage 400b can have or be formed from one or more than one mechanical separation stage 104b.
  • the third processing stage 400c can have one or more than one electrical isolation stage 104a or be formed therefrom.
  • the electrical isolation stage 104a shown here can be used for example
  • Be provided emitting free electrons also referred to as electron emitter isolation stage 104a, as will be described in more detail later.
  • only one mechanical separation stage 104b or only one electrical separation stage 104a may be sufficient.
  • the uniformly distributed supply can take place by means of a fourth processing stage 400d (then also referred to as uniform distribution stage 400d).
  • a fourth processing stage 400d (then also referred to as uniform distribution stage 400d).
  • Equal distribution stage 400d have the particle feed 202, as described above.
  • the uniform distribution stage 400d can clearly show a homogenized powder supply and supply into a processing room 206 (also as a coating room 206 or
  • Coating stage 400e designated) provide.
  • the uniform distribution stage 400d can optionally have a vibratable and / or rotatable circular membrane 202m or disk 202m (for example comprising or formed from metal).
  • the membrane 202m (for example its outer circular contour) can form the feed gap 202s (e.g. its inner contour).
  • the uniform distribution stage 400d can clearly provide a particle curtain falling thinly through the feed gap 202s.
  • the functionalization of the particles 106 can take place by means of the coating material source 208.
  • the coating material source 208 can, for example, be set up for electron beam evaporation (EB evaporation) or be part of another high-rate evaporation device.
  • EB evaporation electron beam evaporation
  • Coating space 206 can, for example, fall area 206a and / or the
  • the coating device can also be provided by means of a PVD chamber (with, for example, vertically arranged tubular magnetrons) or a CVD chamber.
  • Coating apparatus can also perform boat evaporation.
  • Coating material by means of an electron beam Coating material by means of an electron beam.
  • the particles 106 can fall through the coating space 206 into the collecting container 204 (also referred to as a collector) of a sixth processing stage 400f.
  • the particles can be collected and / or concentrated and optionally discharged 204a out of or into this.
  • the coating device which has the coating material source 208, can furthermore have an electron beam source 404, which is configured to generate an electron beam 23 in the direction of the coating material source 208.
  • Electron beam source 404 can also be part of an electron beam gun 404, which further comprises a deflection system 142 a for deflecting the electron beam 23 in the direction of the coating material source 208.
  • the deflection system 142a may include one or more than one electrical coil or one or more than one capacitor, for example.
  • the electron beam source 404 may include a primary electrode (e.g., a primary cathode, e.g., a hot cathode) and a beam shaping unit (e.g., a primary anode).
  • a primary electrode e.g., a primary cathode, e.g., a hot cathode
  • a beam shaping unit e.g., a primary anode
  • one or more than one electron beam source can be used, of which
  • a first electron beam source 404 vaporizes the coating material 208m and a second or the first electron beam source 404 provides electrons for separation.
  • the multiple processing stages 400a to 400f can clearly be stacked one on top of the other, so that they are arranged one behind the other along a particle path 111, 211, which has the guide path 111 and / or the free fall path 211.
  • the coating material source 208 By means of the coating material source 208, the evaporation of the
  • Coating material 208m and the coupled functionalization of a flow of falling particles 106 (also referred to as particle flow) take place.
  • the particles 106 can, for example, be separated before coating, for example by means of one or more than one separation stage 104a, 104b.
  • the evaporation 109 of the coating material can take place by means of the electron beam 23.
  • the electron beam 23 can be directed onto the coating material 208m to be evaporated.
  • the coating material 208m can be evaporated from a crucible (also referred to as an evaporation crucible) and / or consist of a strand. For example, this can
  • Coating material can be arranged in the evaporation crucible. If the strand is fed in from below, the evaporation crucible can be of tubular design and extend through the collecting container 204 or be surrounded by it.
  • the electron beam 23 can be fed into a channel 406 (also called
  • Designated beam guiding channel 406 e.g. a pipeline, also simplified as
  • Beam guide tube 406 which for example leads for the most part through the entire structure and / or is arranged centrally in the chamber housing 802k.
  • the electron beam 23 can primarily be directed onto the coating material of the coating material source 208 in order to vaporize the coating material which is arranged in the lower part of the chamber housing 802k.
  • Provision of free electrons can be used.
  • the electrical isolation can take place by means of the free electrons, i.e. adhering (i.e. agglomerated) particles can be electrostatically dispersed.
  • adhering i.e. agglomerated particles can be electrostatically dispersed.
  • Electron beam 23 optionally the or each electrical isolation stage 104a are electrically supplied.
  • one or more than one sacrificial sheet 408 can be arranged within the chamber housing 802k. At least one shield 408 can, for example, between the
  • Chamber wall and the fall area 206a be or will be arranged.
  • the at least one shield 408 can be conical and / or designed in the form of an exchangeable insert (also referred to as an inlay).
  • at least one additional shield can be arranged on other important components and / or can be exchanged.
  • the insert 408 it can clearly be achieved that the interior of the chamber housing, seen as the outer jacket, remains free of the accumulated coating material, whereas the insert (e.g. a sheet metal cone) acts as a stray steam victim and can be replaced at regular intervals.
  • a fluid chamber can be arranged on the chamber housing, for example its chamber wall, and / or between the chamber wall and the insert 408. The fluid chamber can, for example, to a
  • Temperature control device e.g. having a cooling and / or heating circuit
  • the coating arrangement 400 can be a
  • the depositor or a separate one can be taken into account
  • Ringel electrode carry an electrical potential so that the intrinsically (for example via secondary electron bombardment) or separately charged particles can be consciously influenced in their trajectory.
  • the intrinsically for example via secondary electron bombardment
  • separately charged particles can be consciously influenced in their trajectory.
  • a process gas can be supplied to the vacuum chamber housing 802k by means of the gas supply device 1716 in order to form a process atmosphere in the
  • the process gas can, for example, comprise a precursor gas, a reactive gas and / or an inert gas or be formed therefrom.
  • the inert gas can, for example, comprise argon or be formed from it.
  • the reactive gas can for example contain nitrogen or oxygen or be formed from them.
  • the precursor gas can, for example, have gas molecules that have more than 4 atoms.
  • the gas supply device 1716 can be coupled to a gas source for a chemical-physical reaction process.
  • the vacuum chamber housing 802k can be coupled to a pump system 804 (having at least one rough vacuum pump and optionally at least one high vacuum pump).
  • the pump system 804 can be configured to withdraw a gas (eg the process gas) from the vacuum chamber housing 802k, so that a vacuum (ie a pressure less than 0.3 bar) and / or a pressure in a range of approximately 1 mbar to about 10 3 mbar (in other words fine vacuum) and / or a pressure in a range from about 10 3 mbar to about 10 7 mbar (in other words high vacuum) or a pressure less than high vacuum, e.g. less than about 10 7 mbar (in other words ultra-high vacuum) be provided or can be provided.
  • a vacuum ie a pressure less than 0.3 bar
  • the process pressure can form from an equilibrium of process gas which is supplied by means of the gas supply device 1716 and withdrawn by means of the pump system 804.
  • the coating material source 208 can have a plurality of spatially separated coating materials, each of which coating material can be evaporated to coat the particles 106.
  • the coating material source 208 can be or are actively cooled, for example by means of a cooling fluid, which the or each crucible 208t of the coating material source 208 flows through.
  • the lateral extent of the coating material source 208 can be smaller than the distance between opposing sections of the feed gap 202s (e.g. the
  • Diameter of the dissemination membrane 202m Diameter of the dissemination membrane 202m). This enables contamination of the coating material source 208 by the particle flow to be inhibited.
  • the electron beam 23 collides with the coating material (also referred to as evaporation material), it can (e.g. due to elastic and inelastic collisions with the core atoms or
  • Electrons of the coating material also come to the emission of secondary electrons from the coating material.
  • the secondary electrons can, for example, electrically charge the particles in the falling region 206a (also referred to as a particle curtain or particle curtain). This allows a
  • Electron pressure (clearly also referred to as wind) arise, which drives the particles away from the coating material source 208.
  • a high power of the electron beam 23 and the comparatively fast evaporation of the coating material result in a rapid tracking of the material vapor.
  • the coating material 208m e.g. a metal rod
  • the coating material source can have a magazine (e.g. within the vacuum chamber) in which several rods are removed from the
  • Coating material are recorded and can be tracked from this.
  • the gas delivery device 1716 may include one or more than one gas inlet valve (e.g., located on the chamber walls of the chamber housing 802k).
  • a reactive gas can be fed into the coating space 206, e.g. for a chemical-physical
  • Material vapor 109 e.g. metal vapor
  • evaporation rate can be controlled and / or regulated (e.g. by means of the control device) via the power of the coupled-in electron beam 23. This allows the thickness of the particle coating (also called
  • Coating thickness After the coated particles Having crossed the coating space 206 (also referred to as the functionalization zone), these can be fed to the sixth processing stage 400f.
  • the collecting container 204 (also referred to as a collector) can provide the function of collecting the coated particles 106, concentrating them and using a
  • the bottom of the receptacle 204 may provide a particle support which is inclined, i.e., inclined in an illustrative manner.
  • the particle support can enclose an angle (also referred to as an angle of inclination) with the horizontal.
  • the collecting container 204 can be designed to be able to vibrate, for example by means of a vibration source 1704 (see FIG. 18).
  • the collection container 204 can provide a loosening device.
  • the inclination and certain vibration frequencies can guide the particles in the collecting container 204 in a fluid and gentle manner into a recessed section of the collecting container 204, instead of which they can be discharged by means of the discharging mechanism 1710 through an outlet opening of the collecting container 204.
  • the discharge mechanism 1710 can, for example, have a screw conveyor (then also referred to as a screw conveyor) which, for example, compresses the particles and thus helps to maintain the existing vacuum in the chamber housing 802k.
  • a screw conveyor herein also referred to as a screw conveyor
  • the collecting container 204 can for example by means of a flange connection with the
  • Chamber housing 802k be connected so that it can be rotated to one side if necessary. This makes it easier to replace the shield 408 (this can then be removed downwards).
  • FIG. 5 illustrates a coating arrangement 500 according to various
  • Embodiments in a schematic detailed view e.g. their first processing stage 400a.
  • the particles can be removed from a bed 511 (clearly a supply of particles) by means of the feed mechanism 402 and brought through an opening into one of the processing spaces, ie fed to it. This can take place, for example, through an opening 102e, 202s.
  • the opening 102e, 202s can be the inlet opening 102e or the feed gap 202s.
  • the particles can, for example, be fed to one or more than one separation stage 104a, 104b or to the coating stage 400e.
  • the opening 102e, 202s can optionally be provided in the form of an annular gap.
  • the bed 511 can be arranged in a storage container 504.
  • the tracking mechanism 402 can have a screw conveyor 502 (then also referred to as screw conveyor 402).
  • the particles 106 which are moved by the screw conveyor 502, are compressed and thereby and due to the structural shape (length, circumference, etc.) of the screw conveyor 502 provide a gas separation from the atmospheric environment 501, so that not
  • Conveyor screw 502 for example, the particles 106 can be fed in continuously.
  • a so-called stack filling can take place.
  • a supply container 404 under negative pressure can be continuously filled with material via an inward and outward transfer mechanism, for example a shorter screw conveyor 502 and / or a conveyor belt transporting the particles from the negative pressure container 504 through the opening 102e, 202s.
  • the feed mechanism 402 can have a metering plate (e.g. having the annular gap).
  • the powder material to be functionalized can also be - and remain - in the form of a storage and collecting container in a vacuum.
  • FIG. 6A illustrates a particle isolation device 600 according to various embodiments in a schematic detailed view, for example with a view of a mechanical isolation stage 104b thereof.
  • FIG. 6B and FIG. 6C each illustrate the kinetics of the mechanical isolation in a schematic diagram 600b, 600c.
  • the still partially aggregated particles 106 (clearly the agglomerate-containing powder) can be brought to a mechanical acceleration device 602, for example by means of the feed mechanism 402.
  • the mechanical acceleration device 602 can be set up to effect a mechanical acceleration 103 of the particles.
  • the mechanical acceleration device 602 can for this purpose a rotatably mounted
  • the particle support 602 can, for example, have a flat rotary disk 602 or an uneven rotary plate 602 or be formed therefrom.
  • the particle support 602 can alternatively or additionally to the rotatable mounting with a vibration source be coupled to set the particle pad 602 in vibration. In that case, the particle support 602 can be turned out upwards, for example convexly or concavely.
  • a rotatably mounted rotary disk 602 is referred to in a simplified manner, whereby the same can also apply to a differently shaped particle support 602.
  • the baffle 104p can be, for example, a surface of the chamber housing 802k, e.g., a chamber wall thereof, or can be provided by means of a baffle (e.g. a baffle) attached to the chamber housing 802k.
  • Diagram 600b shows the speed 601 of the rotating disk 602 (e.g. in 1 / s) above the
  • Particle size 603 which causes a separation.
  • This mechanical action of the second isolation stage 104b e.g. its rotating disk 602, can be sufficient to effectively break up larger agglomerates, as is illustrated schematically in diagram 600b using the example of a particle cluster 106c consisting of two particles (also referred to as dicluster 106c) different diameter d the
  • n 2 is the number
  • p is the mass density and thus the molecular distance between the particles 106 of the cluster 106c.
  • n can also be greater than 2.
  • This speed v can then be converted into a speed 601 based on the design of the rotating disk (e.g. the disk diameter d). So it turns out
  • the speed 601 illustrated in diagram 600b decreases with increasing particle size 603 and illustrates the case that the entire kinetic energy of the cluster 106c is expended to overcome the adhesive force HF (also referred to as energy transfer). For a smaller particle size 603, a higher kinetic energy or a higher
  • Speed of the dicluster 106c may be required for dispersing, since the energy transfer does not consume all of the kinetic energy.
  • Diagram 600c shows the speed 605 of the dicluster 106c (e.g. in 1 / s) over the particle size 603, to which this is accelerated 103 for separation.
  • particle size 603 and the required kinetic energy can furthermore occur microphysical effects which are difficult to determine and which influence the energy transfer predicted by the theory.
  • the actual energy transfer i.e. the amount of energy that is converted from the speed when a dicluster 106c hits the impact surface 104p into energy for breaking the adhesion, can also be from
  • the impact surface 104p can be uneven.
  • the impact surface 104p can have a large number of macroscopic cones, pyramids and / or hemispheres or other protuberances or depressions.
  • the rotary disk 602 can be different
  • one or more than one mechanical shredding process can take place
  • the mechanical isolation stage 104b can be an optional
  • Have guide device 604 which, for example, has a plurality of beveled and / or inclined guide surfaces (e.g. deflector plates) between which a gap 604s is provided.
  • the gap 604s can be in the form of an annular gap, for example.
  • the guide surfaces 604 can focus the particles 106 to a (e.g., rotationally symmetrical) particle curtain and / or, more generally, guide them to the next processing stage.
  • the guide device 604 can have a switchable vibration source that excites the guide surfaces to vibrate (e.g. up to ultrasound excitation), which improves the flowability of the powder.
  • the mechanical isolation stage 104b can be used as
  • Pre-isolation stage act and preferably separate larger agglomerates in the macroscopic range.
  • FIG. 7 illustrates a particle isolation device 700 according to various
  • the electrical isolation stage 104a can have at least one (i.e. one or more than one) electrode 104e, which is provided with a first electrical potential.
  • Guide path 111 can lead to the at least one electrode 104e, so that the particles 106 are brought into physical contact with the electrode 104e.
  • the particles 106 can absorb electrical charges therefrom, which excites an electrical isolation 110v of the particles 106 electrically charged in this way.
  • the mechanical isolation stage 104b can have an electrical acceleration device 602 which is set up to provide an electrical field 602e.
  • the electric field 602e can transmit a force to the electrically charged particles 106 which accelerates the particles 106 towards the acceleration device 602 (clearly attracts them).
  • the force can be proportional to the charge q received by the particle 106 and proportional to the field strength of the electric field 602e.
  • the electrical acceleration device 602 can, for example, have a counter-electrode 602 (e.g. anode) which is assigned to the electrode 104e (e.g. cathode) and to which a second electrical potential is provided.
  • the second electrical potential can differ from the first electrical potential (and optionally from the potential of the chamber wall 802k), so that the electrical field 602e (or an electrical voltage) between them
  • the counter electrode can have the baffle surface 104p.
  • the particles 106 can be separated mechanically on contact with the impact surface 104p and at the same time theirs at least partially transfer electrical charges to them (clearly discharged).
  • the particles 106 discharged in this way can ricochet off the impact surface 104p and / or be accelerated by the electric field 602e to the electrode 104e, where they are recharged so that the process begins anew.
  • a channel 702 (also referred to as guide channel 702s) can be formed, through which the particles 106 are guided under the action of their weight and alternately makes one or more than one contact with each channel wall of the two channel walls 104e, 602.
  • the guide channel 702s can, for example, be designed as an annular gap.
  • the guide path 111 can be extended through the guide channel 702s.
  • the particles can optionally be crushed upon contact with electrode 104e.
  • one side of the channel can be or become electrically positively charged and the other electrically negatively charged, so that the particles 106 falling through are each accelerated 103 towards both channel walls 104p and are broken up when they impact.
  • the particles fluctuate more or less back and forth between the channel walls 104e, 104p and thus experience a large number of impacts that stimulate isolation.
  • FIG. 8 illustrates a particle separation device 800 according to various
  • a mechanical isolation stage 104b can have a rotary disk 602 or provide mechanical acceleration of the particles 106 by means of the rotating rotary disk 602.
  • An electrical isolation stage 104a can be a
  • An additional mechanical isolation stage 114a can have a counter electrode 602 of the guide channel 702s, and by means of this provide an electric field, so that the particles 106 are accelerated by means of the electric field.
  • FIG. 9A illustrates a particle separation device 900 according to various embodiments in a schematic detailed view, at least on one electrical separation stage 104a of this.
  • the electrical isolation stage 104a of the particle isolation device 900 can be provided in electron emitter configuration (then also referred to as electron emitter isolation stage 104a).
  • the particles which, for example, fall out of a preceding processing stage can be guided through a vacuum area 911 (also referred to as charging area 911) in which free electrons are located.
  • the free electrons can be emitted from an electron source 902, for example a glow electrode 902, wound around the beam guiding channel 406 and / or with its full circumference.
  • the glow cathode 902 can be set up to provide thermally emitted electrons.
  • the hot cathode 902 can, for example, have a heating device which is set up to release thermal energy.
  • a field emission cathode can also be used. What is described for the hot cathode 902 can also apply analogously to the field emission cathode.
  • the field emission cathode can
  • a field emission cathode reduces the generation of heat.
  • the glow electrode 902 can, for example, be electrically isolated from the beam guiding channel 406, e.g. by means of a dielectric layer which separates them from one another.
  • a dielectric layer which separates them from one another.
  • the first electrode 904 associated with the glow electrode 902 (e.g. perforated) is accelerated
  • the electrons emitted by the glow electrode 902 outwards (e.g. rotationally symmetrical and / or in a radial direction), e.g. in
  • the first electrode 904 (e.g., an accelerating electrode 904) can, for example, comprise or be formed from a metallic extraction grid 904.
  • a (e.g. perforated) second electrode 906 (e.g., a delimitation electrode) assigned to the glow electrode 902 and arranged, for example, on the chamber wall 802k, accelerates and limits the free electrons to the charging area 911, through which the guide path 111 extends.
  • the first electrode 904 and the second electrode 906 can differ from one another, for example, in terms of their electrical potential.
  • FIG. 9B illustrates the kinetics of electrical isolation in a schematic diagram 900b using the glow electrode 902 as an example. The one described for this purpose
  • Correlation can also apply analogously to electrical isolation, which introduces electrons into the particles 106 in a different way.
  • the electrical voltage 901 of the glow electrode 902 (based on the limiting electrode 906 or a reference potential) is plotted against the particle size 603 of the particles 106, which causes electrical isolation.
  • a potential difference 901 of 30 V can already be sufficient to electrostatically separate two 1 ⁇ m particles 106 from one another. Because of the great influences of air humidity and surface topology, the adhesive force FH between two or more particles 106 is not always exact
  • the consideration of the adhesive force FH can, however, be based on the proportionality of the adhesive force FH to the particle size 603 of the particles 106 (eg their radius r) and their decrease with s 2 .
  • the decrease with s 2 reflects that the adhesive force FH or the adhesive constant ⁇ decreases very quickly if the distance s between the particles 106 (or between their surfaces) is increased, as described above.
  • FIGS. 10A and 10B each illustrate the kinetics of electrical isolation in a schematic diagram 1000a, 1000b.
  • the electrical charge 1001 introduced per particle 106 of a particle cluster also referred to as charge, in coulombs
  • the electric field 1003 is between the glow electrode 902 and the
  • Boundary electrode 906 applied over the particle size 603 of the particles.
  • the glow electrode 902 can be electrically supplied in such a way that it generates enough free electrons to load each particle 106, for example with up to 30 V (or even more).
  • Particle current with mass m (whose time derivative is m), can satisfy the following relation: j _ 3mq (r)
  • a current I of up to 0.03 A results for a mass flow of 35 g / s, a density P of 2.4 g / cm 3 and an electrical potential of 30 V.
  • the current I represents Depending on the material of the glow electrode 902 (also referred to as electrode material), a temperature of the glow electrode 902 (eg a
  • Filament such as a filament
  • Filament which generates enough free thermally emitted electrons, which is described by the following relation.
  • the Richardson constant Ao can be, for example, 600,000 A / m 2 K 2 (amperes per meter squared and Kelvin squared) for tungsten or, for example, 100 A / m 2 K 2 for barium strontium oxide (BaO-SrO).
  • the Boltzmann constant k is 8.617-10 5 eV / K (electron volts per Kelvin).
  • D is the diameter of the hot cathode
  • H the height of the hot electrode 902 (also referred to in simplified form as hot cathode 902)
  • S the wire diameter
  • Hot cathode 902 is supplied, the recommended temperature TA of the hot cathode 902 (also referred to as working temperature, in Kelvin), and the expected service life tL (in hours) of the hot cathode 902.
  • the recommended temperature TA of the hot cathode 902 also referred to as working temperature, in Kelvin
  • the expected service life tL in hours
  • the hot cathode 902 can be supplied with a current I greater than 30 mA until its working temperature TA is reached.
  • a tungsten wire can be operated at up to 2600 Kelvin, which can correspond to a current I of up to 8.3 amps.
  • the working temperature can correspond to a current I of approximately 3 amperes.
  • the current I which corresponds to the working temperature TA, can thus deliver enough free electrons to electrostatically separate (i.e. disperse) a particle flow of 35 g / s.
  • FIG. 11 illustrates a particle separation device 1100 according to various embodiments in a schematic detailed view (for example with a view along the Guide path 111 and / or along the vertical 155), to an electron emitter isolation stage 104a of this.
  • the particle singulation device 1100 can have: a beam guide channel 406 through which an electron beam 23 can be guided, and the
  • Electron emitter isolation stage 104a may include: a holding device 1102 for holding the electron emitting
  • Glow electrode 902 also referred to as hot cathode 902
  • acceleration electrode 904 also referred to as acceleration anode 904
  • limiting electrode 906 Between the limiting electrode 906 and the acceleration electrode 904, the
  • Charging area 911 may be arranged, e.g., surrounding accelerating electrode 904.
  • the glow electrode 902 can for example have a glow wire or be formed from it.
  • the charging area 911 can be provided, for example, in the form of an annular gap.
  • the acceleration electrode 904 can, for example, have a grid or the like or be formed therefrom.
  • the glow electrode 902 can, for example, be coupled to a power supply (not shown), for example by means of a power cable.
  • FIG. 12 illustrates a particle separation device 1200 according to various embodiments in a schematic detailed view, for example of an electron emitter separation stage 104a thereof.
  • the electron emitter isolation stage 104a can be set up to emit free electrons in the form of secondary electrons (also referred to as free secondary electrons).
  • free secondary electrons can be used for the electrostatic dispersion, which are generated by direct coupling of the electron beam 23 into the electron source 902, for example a secondary electron emitter electrode 902 (also referred to as an electron beam-supplied secondary electrode 902 or secondary electrode 902 for short).
  • the emission of secondary electrons can be understood as the emission of electrons from the surface of a solid, which is caused by "primary" electrons (also referred to as primary electrons).
  • the primary electrons can be provided by means of the electron beam 23, which is directed onto the secondary electrode 902.
  • another radiation can be used, e.g. X-ray or
  • the secondary electrons generated by the electron beam 23 can be in the
  • Charging area 911 (ie into the particle flow) are emitted.
  • the secondary electrode 902 can be (for example, beveled, concave, convex and / or conical) so that the electron beam 23 is reflected in the direction of the charging area 911 by means of the secondary electrode 902. Part of the power of the electron beam 23 can thus be used for electrical isolation.
  • the secondary electrode 902 can, for example, have or be formed from a metal ring, onto which the electron beam 23 is directed. The charge of the by the in the
  • Electrons emitted into charging area 911 may be sufficient to generate a
  • the electron emitter isolation stage 104a can have: the secondary electrode 902, the optional beam guidance channel 406, and the
  • Electron beam source 404 The electron emitter isolation stage 104a can be configured to emit free electrons 1202 into the charging area 911.
  • the free electrons 1202 can electrons of the reflected from the secondary electrode 902
  • the metal ring 902 of the electron emitter isolation stage 104a can, for example, have a beveled ring-shaped metal blank.
  • the beam guiding channel 406 can have two dielectric segments 1302, between which the secondary electrode 902 is arranged.
  • the electron beam 23 can be controlled according to a cycle, the cycle having several phases (for example each of a few milliseconds in duration), of which the electron beam 23 is directed onto the secondary electrode 902 in a first phase, and of which in a second phase the Electron beam 23 is directed onto the coating material source 208 (for example through a passage opening of the secondary electrode 902 or past it).
  • the cycle having several phases (for example each of a few milliseconds in duration), of which the electron beam 23 is directed onto the secondary electrode 902 in a first phase, and of which in a second phase the Electron beam 23 is directed onto the coating material source 208 (for example through a passage opening of the secondary electrode 902 or past it).
  • FIG. 14 illustrates a particle isolation device 1400 according to various embodiments in a schematic detailed view, e.g. of several isolation stages 104a, 114a thereof.
  • particles 106 can be processed particularly well, all of which have a similar particle size (e.g. not
  • the electrostatic isolation can take place by means of secondary electrons, which are emitted from a metal ring 902 in that the latter is bombarded with the electron beam 23.
  • a additional electrical isolation stage 114a an electrostatic isolation by means of thermally emitted electrons from a glow electrode 902.
  • the coating arrangement 1400 can have a selection chamber 1401.
  • the particles 106 which are still agglomerated are guided into the selection chamber 1401, for example, by means of a metering unit of the tracking mechanism 402.
  • the bottom of the selection chamber 1401 can be vibratable and / or electrically conductive
  • Particle support 602 (e.g. having a membrane 202m) which is enclosed, for example, in a rigid and / or electrically insulated or electrically conductive and / or electrically insulated or electrically conductive frame.
  • the electrostatic emission can make it possible, for example, to supply mainly (or only) dispersed, that is to say completely isolated, particles 106 to the downstream processing space, as will be described in more detail below.
  • FIG. 15 illustrates a particle isolation device 1500 according to various embodiments in a schematic detailed view, e.g. of several isolation stages 104a, 114a thereof.
  • the particle support 602 can provide a floor of the selection chamber 1401, for example.
  • the selection chamber 1401 can, for example, have an oscillating and / or electrically conductive chamber floor 602 (also referred to as emission floor 602).
  • the chamber bottom 602 can, for example, have a membrane 202m and / or a plate 602b (e.g. disc, e.g. vibrating disc) or be formed therefrom.
  • the particles 106 to be separated can be fed to the selection chamber 1401, for example by means of the tracking mechanism 402.
  • the selection chamber 140 e.g. its emission base 602 and / or upper chamber part 1402, can be made by means of one or more than one dielectric (clearly electrically isolated)
  • Connection piece 1504 be stored.
  • Each connecting piece 1504 can, for example, comprise or be formed from a ceramic. Alternatively or additionally, the
  • Emission base 602 and the upper chamber part 1402 can be coupled to one another by means of the one or more than one connecting piece 1504.
  • at least one connecting piece 1504 can provide a chamber side wall of the selection chamber 1401, which extends from the emission base 602 to the chamber upper part 1402.
  • the at least one chamber side wall can have one or more than one lateral outlet opening 1501.
  • the outlet opening 1501 can be provided, for example, in the form of an annular gap.
  • the membrane 202m can provide an electrode and the upper chamber part 1402 can provide a counterelectrode, assigned to it, of the additional electrical isolation stage 114a.
  • the membrane 202m can be or will be provided with an electrical potential (then also referred to as a contact electrode 202m) which, as described above, can be set up as a function of the particle size 603 and / or the adhesion constant ⁇ .
  • An electrical charge can be introduced into the particles 106 by means of the electrical potential of the membrane 202m.
  • the upper chamber part 1402 can for example be electrically grounded (or more generally have the reference potential) and clearly provide the counter potential to the electrically charged membrane 202m.
  • the potential difference i.e. electrical voltage
  • the electric field inside the chamber can transmit a force to the electrically charged particles 106, so that they move along the field lines of the electric field towards the upper chamber part 1402 (e.g. analogous to the opposing polarity
  • the effect of the adhesion of the particles 106 to one another and to the chamber floor 602 has an influence on the kinetics of the charged particles 106. If the particle size exceeds a threshold value, the field strength can no longer decrease coherently with the particle, but above the threshold value depending on the Increase the liability constant.
  • Fig. 16 illustrates the kinetics of electrical isolation in a schematic
  • Diagram 1600 In diagram 1600 the electric field 1003 (in volts / meter) is im
  • a vibration can be coupled into the selection chamber 1401, for example its chamber bottom 602, by means of the vibration disk 602b or, more generally, a vibration source.
  • the plate 602b can couple the vibration source to the diaphragm 202m or have the vibration source (e.g. a coil).
  • the vibration source can be set up to excite the membrane 202m to vibrate.
  • the oscillation may be able to detonate the particles 106 on the chamber floor 602 (e.g., the
  • the electric field E can be
  • Electrode spacing and electrical voltage can be used.
  • an electrode spacing of 10 cm or more can have the effect that mainly smaller particles are accelerated sufficiently in such a way that they overcome the exemplary electrode spacing of 10 cm.
  • the movement of larger particles or particle clusters can be dominated by their weight, whereupon they fall down again after they have lifted off. This clearly makes it possible to control the particle size of the particles 106 brought out of the lateral openings 1501 of the selection chamber 1401 (e.g. by means of the voltage).
  • free electrons 1202 can also be emitted into the interior of the chamber (clearly an electron wind is provided), e.g. by means of electron beam bombardment of a metal ring 902 and / or thermally emitted electrons from a glow electrode 902.
  • the free electrons 1202 can electrically charge the particles 106 inside the chamber, for example above the emission potential until the Coulomb repulsion is reached.
  • Agglomerated particles 106 are thus effectively separated so that they too can now overcome the exemplary electrode spacing (e.g. of 10 cm).
  • the gradually provided composition of the particles inside the chamber (clearly a powder mist) can be attracted (also referred to as electrostatic attraction) through the lateral openings 1501 of the selection chamber 1401 by the limiting electrode 906 of the electrical isolation stage 104a (e.g. on the chamber wall 802k).
  • Particles emitted from the selection chamber 1401 hit an impact surface 104p of the Limiting electrode 906, to which they give off their electrical charge and then fall down and can be guided into the next process space.
  • a plasma source can be arranged in the interior of the chamber, for example as an alternative or in addition to electrical isolation stage 104a and / or the additional electrical isolation stage 114a.
  • the plasma source can for example at the
  • Secondary electrode 902 e.g. glow electrode 902
  • the falling particles 106 can experience collisions with electrons and / or ions of the plasma by means of a plasma formed inside the chamber (e.g. as an alternative or in addition to the free electrons). This effect supports the dispersion of agglomerates while at the same time
  • FIG. 17 illustrates a coating arrangement 1700 according to various
  • Embodiments in a schematic side view or cross-sectional view Embodiments in a schematic side view or cross-sectional view.
  • Coating arrangement 1700 can include rotating disk 602 and a glow electrode 902.
  • the coating arrangement 1700 can have a vibration source 1704 (e.g. vibration disk) which is coupled to the collecting container 204 and optionally carries an electrical potential which charges the particles and can thus be influenced in the course of their trajectory.
  • the coating arrangement 1700 can furthermore have a holding device 1702 for holding (e.g. screw connection point) the shield 408, which can be introduced into the shield 408 in a form-fitting manner.
  • the coating arrangement 1700 can furthermore have a discharge channel 1710 coupled to the collecting container 204 for discharging 204a the particles 106 after they have been coated.
  • FIG. 18 illustrates a coating arrangement 1800 according to various
  • Embodiments in a schematic side view or cross-sectional view Embodiments in a schematic side view or cross-sectional view.
  • Coating arrangement 1800 can have the selection chamber 1401, in which the electron beam-supplied secondary electrode 902 and a horizontally extending contact electrode 202m have.
  • An electrically charged impact surface 104p can be arranged next to the selection chamber 1401.
  • 19 illustrates a coating arrangement 1900 according to various
  • the Coating arrangement 1900 can have the rotating disk 602 and an electron beam supplied secondary electrode 902.
  • FIG. 20 illustrates a coating arrangement 2000 according to various
  • Embodiments in a schematic side view or cross-sectional view Embodiments in a schematic side view or cross-sectional view.
  • Coating arrangement 2000 can exemplarily include the rotating disk 602 and a
  • a lateral coupling of the electron beam 23 into the vacuum chamber 802 can be provided.
  • the beam guiding channel 406 can be arranged on the upper third of the coating space 206.
  • Vacuum chamber 802 may not be necessary. This simplifies the upper components of the coating arrangement 2000, e.g. the assemblies for dispersion and / or for dissemination.
  • the electron beam 23 When the electron beam 23 is coupled in from the side, it can be guided through the falling area 206a and thereby come into contact with the vertically falling particles 106.
  • the particles 106 When the particles 106 come into contact with the electron beam 23, they can be heated strongly, so that there can be an evaporation of material from the particles 106, as a result of which material is partially volatilized and the system or the particle coating can be contaminated. This can be desirable but can also be compensated for by interrupting the feed gap 202s locally above the beam guiding channel 406 so that a narrow shadowing is provided in the particle curtain 106. This reduces the risk of particle-electron collisions.
  • 21A illustrates a coating arrangement 2100 according to various
  • FIG. 21B illustrates the kinetics of the uniformly distributed feed in a schematic diagram 2100b.
  • the uniform distribution stage 400d can have a particle support 1602 which has a membrane 202m, for example.
  • the particle support 1602 can delimit the feed gap 202s or the feed gap 202s can surround the particle support 1602.
  • Feed gap 202s can be formed, for example, between the particle support 1602 and a wall element 2104 surrounding the particle support 1602.
  • the wall element 2104 can be part of the chamber housing 802k, for example.
  • the particle support 1602 can have a circular outer edge which delimits the feed gap 202s, ie can be rotationally symmetrical. The outer edge of the
  • Particle pad 1602 may also have a different symmetry.
  • the particle support 1602 can be set up to couple a force (also referred to as an output force) into the particles 106 resting thereon, which force is directed towards the feed gap 202s.
  • a force also referred to as an output force
  • the output force can have the same symmetry as the outer edge of the particle support 1602.
  • the output force can, for example, be set up essentially radially symmetrically, wherein the center of symmetry can be arranged in the interior (e.g. in the center of the circular outer edge) of the particle support 1602.
  • the output force can be or be provided in various ways, as will be described by way of example below.
  • the particle support 1602 can, for example, have a convex (e.g. conical or at least tapering) upper surface, i.e. sloping towards the edge.
  • a concave top surface can also be used.
  • particles can also move uphill. This can bring dosage benefits.
  • the particle support 1602 can form an angle (also referred to as an angle of inclination) with the horizontal 153, 151. This can provide the particles 106 with a downhill force, which can be part of the downhill force.
  • the particle support 1602 can, for example, be set in a rotary movement so that the particles revolve around the center of symmetry. This can couple a centrifugal force to the particles 106, which can be part of the output force.
  • the uniform distribution stage 400d can have a vibration source 202v which is set up to vibrate the particle support 1602 (e.g. the membrane 202m)
  • particles from at least one (ie one or more than one) isolation stage 104a, 104b can be fed to the uniform distribution stage 400d, for example along the
  • the falling stream of particles 106 from the at least one isolation stage 104a, 104b can, for example, fall onto an inclinable and vibratable plane 202m in the form of an vibratable membrane 202m.
  • the particles 106 emitted by the uniform distribution stage 400d can be fed to the coating space 206, for example by falling into the coating space 206 over the outer edge of the particle support 1602.
  • the particle support 1602 can optionally have a clamping frame 2106 (e.g. a rigid frame) in which the membrane 202m is enclosed (also referred to as an edge restraint).
  • the tenter frame 2106 may have the outer edge.
  • the edge of the membrane 202m, which is coupled to the tensioning frame 2106, can be configured, for example, corrugated and / or profiled (e.g. provided as a bead), as clearly shown in the case of a loudspeaker.
  • the edge of the membrane 202m can for example comprise an elastic material, for example an elastomer.
  • the edge restraint of the membrane 202m i.e. that the edge of the membrane 202m is not open) can provide defined boundary conditions so that the
  • the vibration source 202v can be set up, for example, to vary the coupled vibration over time, i.e. provide the particle support 1602 with multiple vibration modes.
  • the vibration source 202v can be set up, for example, to generate different frequencies (also referred to as vibration frequencies).
  • the vibration source 202v can be set up to couple the vibration at different points 202e (also referred to as coupling points) of the particle support 1602.
  • a continuous, radially symmetrical particle flow to the outer edge of the particle support 1602 (for example a disk 1602) can be provided.
  • the membrane 202m of the particle support 1602 can be higher in the center than at the edge.
  • the particle support 1602 can have a multiplicity of depressions and / or grooves which are systematically or stochastically distributed over their entire surface. This creates a directed flow of particles over the edge of the particle support 1602 also many smaller, locally concentrated particles flow, which increase the particle throughput and thus improve the economy.
  • the space filling of the particles 106 falling over the outer edge of the particle support 1602 can be controlled and / or regulated, e.g. by changing the amount of particles supplied (e.g. their number and / or mass) per time.
  • the space filling of the particles 106 can be controlled and / or regulated by changing the distance between the particle support 1602 or the feed gap 202s from the coating material source 208. This can be done for example by means of
  • Control device take place.
  • the volume of the particles 106 clearly describes the amount of particles per unit volume.
  • the particle support 1602 can, for example, be mounted displaceably (e.g. along the vertical and / or horizontal) and / or inclined so that, for example, its relative position and / or orientation relative to the coating material source 208 can be changed, e.g. their distance from one another. This can be done for example by means of
  • Control device take place.
  • the diagram 2100b shows a normalized spatial filling 2101 of the particles 106 along the free fall path 211 above the position 2103 on the free fall path for different distances hstart of the particle support 1602 from a reference position. This shows the effect of the linear expansion or the change in the volume of a particle flow caused by the length of the fall.
  • 22 illustrates a coating arrangement 2200 according to various
  • the particle support 1602 can have a multiplicity of through openings 2204 which, for example, are systematically or stochastically distributed over their entire area.
  • the through opening 2204 of the particle support 1602 can, for example, by means of
  • Protective plates 2206 are protected from vapor deposition and sealing.
  • Through openings 2204 can be provided, for example, in the form of an annular gap and / or concentric to one another.
  • the particle support 1602 (e.g. its frame) can optionally be enclosed in a water-cooled housing.
  • the lower part of the case can optionally be replaced with a replaceable
  • Heat shield 2206 be shielded, which can also have the function of a sacrificial shield, so that the particle support 1602 (eg its dissemination membrane 202m) from directed coating vapor is shielded.
  • the sacrificial shield 2206 can also be optional
  • the particle support 1602 e.g. its membrane
  • Decoupling and cooling protect the particle support 1602 (e.g. its membrane 202m) from the material vapor and the temperature resulting from it. If the particles 106 get over the outer edge of the particle support 1602, gravity takes hold of them and the particles 106 fall through the material vapor below, the material vapor being the
  • Comprises or is formed from coating material also referred to as coating material vapor, e.g. a metal vapor.
  • coating material vapor also referred to as coating material vapor, e.g. a metal vapor.
  • the thickness of the particle coating also called
  • Coating thickness can be influenced by means of at least two parameters.
  • the first parameter is the rate at which the coating material is evaporated (also referred to as the evaporation rate), or a corresponding vapor density.
  • the second parameter is the distance of the particle support 1602 (e.g. its dissemination membrane 202m) from the coating material source 208 (e.g. evaporation source), which corresponds to the flight or residence time of the particles 106 in the material vapor.
  • the beam guide channel 406 (e.g. a central electron beam tube) to which the particle support 1602 is attached or at least arranged (e.g. its dissemination membrane) can for example be set up so as to be adjustable in height, e.g. by means of a telescopic connection.
  • the evaporation rate can be controlled and / or regulated by means of the power introduced into the coating material source 208 (e.g. the electron beam 23).
  • the particle support 1602 can have a multiplicity of segments, of which segments directly adjacent to one another are separated from one another by means of a feed gap 202s.
  • the segments can be arranged concentrically, for example, and / or offset in height relative to one another.
  • the segments can, for example, provide two or more particle streams radially symmetrically into the fall region 206a.
  • Coating space 206 has, and thus different
  • Functionalization areas referred to may be arranged offset in height, such as, for example, over several feed gaps 202s arranged in a stepped manner. It also becomes a free-falling
  • the first particle stream pulled apart over the length of its fall or the distance from particle 106 to the next particle increases. Elm to inhibit a first stream of particles
  • the second particles located behind it are shaded by the material vapor, the first particle stream can be supplied from a higher position from the free fall into the fall region 206a than the second particle flows.
  • the second particle stream can in turn be supplied from a higher position than an optional additional third particle stream, etc.
  • the material vapor (coating material vapor) can thus flow through the front and less dense first particle and is also able to functionalize one or more than one second particle flow located behind it.
  • each particle stream can be exposed to a plasma (e.g. prior to coating) so that additional pretreatment and / or better dispersion can be provided.
  • FIG. 23 illustrates a coating arrangement 2300 and FIG. 24 illustrates a coating arrangement 2400 in each case according to various embodiments in a schematic detailed view, which several cascade-like interconnected
  • Coating stages 400e of which each coating stage 400e has one
  • the coating stages 400e can be mutually by means of a
  • Particle feed 202 which for example has the feed gap 202s, and / or a uniform distribution device.
  • the or each coating room 206 can clearly be set up for a coating process (or for the formation of precisely one particle coating). In the event that a
  • Layer system with several layers is to be applied to the particles 106, several coating stages 400e can also be arranged sequentially. Optionally, after the second coating stage, no additional separation stage may be necessary.
  • the method 2500 can comprise, in 101, introducing electrons into the plurality of particles, a charge caused thereby separating the particles from one another; and in 103, accelerating the plurality of particles toward an impact surface, an impact thereby caused separating the particles from one another.
  • Accelerating 103 can take place in a vacuum, that is to say that the particles are arranged in the vacuum when electrons are introduced 101 and when accelerating 103. After the impact, the particles can move away from the impact surface (ie it is not necessarily coated with the particles).
  • the method 2500 can optionally comprise, in 2600, one-time or more than one-time coating of the plurality of particles after the introduction 101 of electrons and the acceleration 103.
  • 26 illustrates a method 2600 (e.g. for coating 2600 the plurality of particles) according to various embodiments in a schematic flow diagram.
  • the method 2600 can optionally include, in 2600, singling out a plurality of particles once or more than once 2500, for example by means of the introduction 101 of electrons and the acceleration 103 of the particles against the impact surface.
  • the method 2600 may include, in 107, introducing a plurality of particles into a vacuum, and in 109, evaporating a coating material into the vacuum such that the plurality of particles are coated with the coating material.
  • the multitude of particles can move past the vapor expansion area, accelerated by a gravitational force.
  • the particles can be introduced into the vacuum, for example, through the feed gap 202s, which extends, for example, along a path that is closed in itself, so that the multiplicity of particles surrounds the vapor expansion area.
  • Example 1 is a particle separation device, comprising: an inlet opening and an outlet opening, one or more separation stages, which are set up (e.g. in a vacuum) to separate particles (e.g. in a vacuum) guided from the inlet opening to the outlet opening, whereby of the one or more Separation levels: a first
  • the separation stage is set up to introduce electrons into the particles (e.g. in a vacuum) so that the particles are charged up and separate them from one another; and / or a second isolation stage has an impact surface and is set up to accelerate the particles (e.g. in a vacuum) in the direction of an impact surface, so that an impact of the particles on the impact surface caused thereby separates them from one another, the impact surface being concave, for example ( eg curved and / or angled, eg circumferential), is provided for example by means of a hollow body (eg its inner surface) and / or is penetrated by a through opening, for example.
  • Example 2 is the particle separation device according to Example 1, the first
  • the Electron source has: a cathode for thermal emission (also referred to as thermal emission cathode or hot cathode) (e.g. for providing free electrons, e.g. by means of thermal emission), a cathode for cold emission (also referred to as field emission cathode) (e.g. for providing free electrons, e.g. by means of cold emission), wherein the electron source has, for example, a gas discharge device (e.g. a plasma source) to provide a gas discharge (e.g. a plasma) that has the electrons, the electron source, for example, having a contact electrode (which the electrons in contact with the particles in this brings in, e.g. in physical contact with them).
  • a gas discharge device e.g. a plasma source
  • Example 3 is the particle separation device according to Example 2, furthermore a
  • the electron beam gun is set up to electrically supply the secondary electron emission cathode by means of an electron beam (so that secondary electrons are emitted, for example).
  • Example 4 is the particle separation device according to Example 3, wherein the
  • a secondary electron emission cathode has a through opening and an emission (e.g., conical) surface surrounding the through opening; and where the
  • the electron beam gun is set up to alternately target the electron beam
  • Example 5 is the particle separation device according to one of Examples 1 to 4, the second separation stage having a rotatably mounted support surface by means of which the acceleration takes place, the support surface (e.g. completely) being surrounded by the impact surface.
  • Example 6 is the particle separation device according to Example 5, the particle support having: a rotationally symmetrical surface and / or outer edge; has a structured surface; has a morphology and / or has a topography. This increases the acceleration or the transfer of momentum to the particles (clearly a smaller area leads to a higher pressure during a collision).
  • Example 7 is the particle separation device according to one of Examples 1 to 6, the second separation stage being set up to provide an electric field by means of the (eg positively charged) impact surface to accelerate the particles by means of the electrical field towards the impact surface.
  • Example 8 is the particle separation device according to one of Examples 1 to 7, the first separation stage having, for example, an electron source in the form of an electrode, with a (e.g. annular) gap being provided between the electron source and the impact surface through which the particles are guided.
  • Example 9 is the particle singulation device according to any of Examples 1 to 8, further comprising: a (e.g. vacuum-tight or open) container having the inlet opening.
  • a (e.g. vacuum-tight or open) container having the inlet opening.
  • Example 10 is the particle separation device according to one of Examples 1 to 9, further comprising: a screw conveyor which is arranged within the inlet opening (which is for example channel-shaped).
  • Example 11 is the particle separation device according to one of Examples 1 to 10, further comprising: a vacuum chamber in which the one or more separation stages are arranged; and / or a microwave generator and an area in which
  • Microwave radiation acts on the particles.
  • Example 12 is the particle singulation device according to one of Examples 1 to 11, the inlet opening (e.g. vertically) being arranged above the outlet opening, so that a gravitational force acting on the particles guides the particles from the inlet opening to the outlet opening.
  • Example 13 is the particle singulation device according to one of Examples 1 to 12, further comprising: a guide device for feeding the particles to the first
  • the guide device having at least one funnel-shaped surface and / or a drive (e.g. vibration source), the drive of the guide device, for example, being set up to mechanically excite the funnel-shaped surface (e.g. by means of a mechanical vibration coupled to it).
  • a drive e.g. vibration source
  • Example 14 is the particle separation device according to one of Examples 1 to 13, the first separation stage and / or the second separation stage having a (e.g. rotatably mounted) particle support and a drive, the drive being set up to mechanically excite the particle support, so that, for example the particle support falling particles are driven in the direction of an edge of the particle support, wherein the
  • Particle support for example, the electron source or at least one electrode of the
  • Example 15 is the particle separation device according to Example 14, wherein the particle support is convex or concave and / or wherein the drive is set up
  • Example 16 is the particle separation device according to one of Examples 1 to 15, the charging of the particles imparting an electrical repulsive force between them which, for example, repels the particles charged by the electrons introduced from one another.
  • Example 17 is the particle separation device according to one of Examples 1 to 16, the impact imparting a force impulse between the particles, for example which the particles accelerated against the impact surface experience.
  • Example 18 is a coating arrangement, comprising: a particle separation device according to one of Examples 1 to 17, a coating device which has a cavity, towards which the exit opening of the particle separation device is directed, the coating device having a coating material source for evaporating a coating material in the Cavity into it.
  • Example 19 is the coating arrangement according to Example 18, comprising: a
  • Cavity is formed; wherein the particle feed adjoins the outlet opening on the inlet side and / or has a feed gap on the outlet side which extends along a path that is closed in itself; wherein the cavity optionally has a first region and a second region, the first region from the feed gap to the
  • Collection container is extended and surrounds the second region, and wherein the second region is adjacent to the coating material source (which is arranged, for example, at a distance from the first region).
  • Example 20 is the coating arrangement according to Example 18 or 19, the
  • Coating material source is extended through the collecting container.
  • Example 21 is the coating arrangement according to any one of Examples 18-20, wherein the coating material source comprises an evaporation crucible which is separated from the
  • Example 22 is the coating arrangement according to any of Examples 18-21, wherein the coating material source has a coating material supply mechanism which extends from the evaporation crucible through the receptacle.
  • Example 23 is the coating arrangement according to one of Examples 18 to 22, the collecting container having an outlet opening and / or depression on the bottom.
  • Example 24 is the coating arrangement according to one of Examples 18 to 23, further comprising: a first drive (e.g. a vibration source) which is set up to mechanically excite the collecting container (e.g. by means of a mechanical vibration coupled to it).
  • a first drive e.g. a vibration source
  • the collecting container e.g. by means of a mechanical vibration coupled to it.
  • Example 25 is the coating arrangement according to one of Examples 18 to 24, the particle feed having a particle support which delimits the feed gap and a second drive (e.g. a vibration source) which is set up to mechanically excite the particle support (e.g. by means of a mechanical Vibration).
  • a second drive e.g. a vibration source
  • Example 26 is the coating arrangement according to any one of Examples 18-25, wherein the path is circular.
  • Example 27 is the coating arrangement according to any of Examples 18-26, Figs.
  • a coating apparatus further comprising: an electron beam gun configured to direct an electron beam onto the coating material source.
  • Example 28 is the coating arrangement according to any of Examples 18-27, a channel through which the electron beam is directed onto the coating material source, with the feed gap extending around the channel; and / or wherein the channel extends through the particle feed and / or the particle separation device.
  • Example 29 is the coating arrangement according to one of Examples 18 to 28, the particle feed having an additional feed gap which is surrounded by the feed gap and follows the feed gap in its course and / or is concentric to it.
  • Example 30 is the coating arrangement according to one of Examples 18 to 29, further comprising: a vacuum chamber in which the cavity is arranged, wherein the
  • Vacuum chamber is coupled to the particle separation device, for example by vacuum technology, for example by means of the outlet opening.
  • Example 31 is a method for singulating a multiplicity of particles, the method comprising: introducing electrons into the multiplicity of particles, a charge caused thereby separating the particles from one another; and accelerating the plurality of particles toward an impact surface, an impact caused thereby separating the particles; The introduction of electrons and the acceleration of the particles take place in a vacuum.
  • Example 32 is a method comprising: singulating a multiplicity of particles by means of the method according to example 31; and coating the plurality of particles after
  • Example 33 is the method of Example 32, comprising coating: placing the plurality of particles in a vacuum, in which the plurality of particles of one
  • Accelerated gravitational force for example, move past a vapor expansion area
  • the particles being introduced, for example, through a gap which extends, for example, along a self-contained path so that the plurality of particles surrounds the vapor expansion area; and / or evaporation of a coating material into the vapor spreading area, so that the plurality of particles are coated with the coating material.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Composite Materials (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Battery Electrode And Active Subsutance (AREA)

Abstract

L'invention concerne un dispositif de séparation de particules (100) qui peut comprendre, selon divers modes de réalisations : une ouverture d'entrée et une ouverture de sortie, plusieurs niveaux de séparation (104a, 104b) agencés pour séparer des particules (106) guidées de l'ouverture d'entrée à l'ouverture de sortie. Parmi la pluralité des niveaux de séparation (104a, 104b) : un niveau de séparation (104b) comprend une surface d'impact (104p) et est conçu pour accélérer les particules (106) dans la direction d'une surface d'impact (104p), de sorte qu'un impact résultant des particules (106) sur la surface d'impact (104p) les sépare les unes des autres. ; un niveau de séparation supplémentaire (104a) est disposé pour introduire des électrons dans les particules (106), de sorte qu'une charge des particules (106) ainsi provoquée les sépare les unes des autres.
PCT/EP2020/069586 2019-07-12 2020-07-10 Dispositif de séparation de particules, système de revêtement et procédé WO2021009057A1 (fr)

Applications Claiming Priority (2)

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DE102019118934.9 2019-07-12
DE102019118934.9A DE102019118934A1 (de) 2019-07-12 2019-07-12 Partikelvereinzelungsvorrichtung, Beschichtungsanordnung und Verfahren

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3212878A (en) * 1961-08-04 1965-10-19 Bouteille Charles Yves Joseph Physical or chemical treatment of fine powdery materials having a controlled granulometry
US3239717A (en) * 1962-02-26 1966-03-08 Goodrich High Voltage Astronau Method and apparatus for dispersing glomerate particles
DE1809314A1 (de) * 1968-05-28 1969-12-04 Schwermaschb Ernst Thaelmann V Schleuderrad mit rotierender Aufgabeeinrichtung fuer schnellaufende Zerkleinerungsmaschinen
DE4007855A1 (de) * 1990-03-13 1991-09-19 Reinhard Schulze Verfahren zur mikrowellenbehandlung von stoffen und zugehoerige anwendung sowie einrichtung
US20030148027A1 (en) * 2002-02-05 2003-08-07 Holcomb Matthew J. Method and apparatus for forming coated units

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7626602B2 (en) * 2006-09-15 2009-12-01 Mcshane Robert J Apparatus for electrostatic coating
DE102016101013A1 (de) * 2016-01-21 2017-07-27 Von Ardenne Gmbh Verfahren, Beschichtungsvorrichtung und Prozessieranordnung
DE102017109249B4 (de) * 2017-04-28 2022-08-11 VON ARDENNE Asset GmbH & Co. KG Feststoffpartikel-Quelle, Prozessieranordnung und Verfahren

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3212878A (en) * 1961-08-04 1965-10-19 Bouteille Charles Yves Joseph Physical or chemical treatment of fine powdery materials having a controlled granulometry
US3239717A (en) * 1962-02-26 1966-03-08 Goodrich High Voltage Astronau Method and apparatus for dispersing glomerate particles
DE1809314A1 (de) * 1968-05-28 1969-12-04 Schwermaschb Ernst Thaelmann V Schleuderrad mit rotierender Aufgabeeinrichtung fuer schnellaufende Zerkleinerungsmaschinen
DE4007855A1 (de) * 1990-03-13 1991-09-19 Reinhard Schulze Verfahren zur mikrowellenbehandlung von stoffen und zugehoerige anwendung sowie einrichtung
US20030148027A1 (en) * 2002-02-05 2003-08-07 Holcomb Matthew J. Method and apparatus for forming coated units

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DE102019118934A1 (de) 2021-01-14

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