WO2020248803A1

WO2020248803A1 - Cover plate and manufacturing method therefor, and electronic device

Info

Publication number: WO2020248803A1
Application number: PCT/CN2020/092015
Authority: WO
Inventors: 邱惊龙; 郑俊威; 陈明仁
Original assignee: Oppo广东移动通信有限公司
Priority date: 2019-06-10
Filing date: 2020-05-25
Publication date: 2020-12-17
Also published as: CN110253406B; CN110253406A

Abstract

A cover plate (100), a manufacturing method for the cover plate, and an electronic device comprising the cover plate. The cover plate (100) comprises a glass substrate (110). A first surface (112) of the glass substrate is provided with a smooth area (112a) and a rough area (112b). The optical transmittance of at least a part of the smooth area (112a) of the glass substrate (110) is greater than 90%. The method for manufacturing the cover plate comprises the following steps: providing a glass substrate having a first surface (112) and a second surface (114) opposite each other; performing polishing treatment on the first surface and the second surface to make the optical transmittance of the glass substrate greater than 90%; forming an acid-resistant film on both the second surface and a part of the first surface; etching the area of the first surface where the acid-resistant film is not formed to form a rough area; and removing the acid-resistant film to obtain a cover plate. Further disclosed is an electronic device, the position of a camera lens corresponding to the position of the area of a glass substrate where the optical transmittance is greater than 90%.

Description

Cover plate and its manufacturing method and electronic equipment

Technical field

The present invention relates to the technical field of electronic equipment, in particular to a cover plate, a manufacturing method thereof, and electronic equipment.

Background technique

The current mobile phone glass cover either adopts a glossy effect as a whole, and then achieves a matte effect through coating or pasting; or the whole surface is designed with a matte effect, with a single effect. In addition, the current mobile phone camera usually adopts the method of disassembly, by opening a hole in the glass cover to install the camera, the raised camera will directly affect the overall smoothness of the streamline, and as people’s requirements for camera increase , The size and number of cameras are constantly increasing, the openings of the glass cover are getting bigger and bigger, and the raised cameras are more and more obtrusive.

Summary of the invention

Based on this, it is necessary to provide a cover plate, a manufacturing method thereof, and electronic equipment.

A cover plate includes a glass substrate, the glass substrate has a first surface, the first surface has a smooth area and a rough area, and the optical transmittance of at least a part of the glass substrate at the smooth area is within more than 90 percent.

A method for manufacturing a cover plate includes the following steps:

Providing a glass substrate, the glass substrate having opposite first and second surfaces;

Polishing the first surface and the second surface so that the optical transmittance of the glass substrate is above 90%;

Forming an acid-resistant film on part of the first surface and the second surface;

Etching the area of the first surface where the acid-resistant film is not formed to form a roughened area; and

The acid-resistant film is removed to obtain a cover plate.

An electronic device, comprising a cover plate and a camera, the cover plate being the cover plate or the cover plate obtained by the method of manufacturing the cover plate, the camera is arranged close to the side of the glass substrate away from the first surface The camera has a lens, and the position of the lens corresponds to the position of an area where the optical transmittance of the glass substrate is above 90%.

An electronic device including:

battery;

A camera module, the battery can supply power to the camera module; and

A cover plate, the cover plate includes a glass substrate, the glass substrate has a first surface and a second surface opposite, the cover plate covers the battery and the camera module, and the second surface faces the Camera module; the first surface has a smooth area and a rough area, the optical transmittance of at least part of the smooth area is above 90%, the position of the camera and the optical transmittance of the glass substrate Corresponding to the location of more than 90% of the area.

Description of the drawings

In order to explain the embodiments of the present invention or the technical solutions in the prior art more clearly, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only These are some embodiments of the present invention. For those of ordinary skill in the art, without creative work, the drawings of other embodiments can also be obtained based on these drawings.

Fig. 1 is a schematic structural diagram of a cover plate according to an embodiment;

Figure 2 is a partial cross-sectional view of the cover shown in Figure 1;

Fig. 3 is a schematic structural view of the cover plate shown in Fig. 1 from another angle;

4 is a partial schematic diagram of the glass substrate of the cover plate shown in FIG. 1;

Fig. 5 is a flowchart of a manufacturing method of a cover plate according to an embodiment.

Detailed ways

In order to facilitate the understanding of the present invention, the present invention will be described more fully below with reference to the relevant drawings. The drawings show preferred embodiments of the present invention. However, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the understanding of the disclosure of the present invention more thorough and comprehensive.

Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those skilled in the technical field of the present invention. The terms used in the description of the present invention herein are only for the purpose of describing specific embodiments, and are not intended to limit the present invention.

As shown in FIG. 1, the cover 100 of an embodiment can be used as a cover for electronic devices, such as mobile phones, tablet computers, etc., and the cover 100 can be used without opening a hole on the cover 100 to install a camera , Can avoid the abrupt problem caused by the installation of the camera. Please also refer to FIG. 2, the cover plate 100 includes a glass substrate 110 and an antireflection film 120.

Please also refer to FIG. 3, the glass substrate 110 has a first surface 112 and a second surface 114 opposite to each other. Specifically, the glass substrate 110 is curved glass. The first surface 112 is a convex surface, and the second surface 114 is a concave surface. It can be understood that the glass substrate 110 is not limited to curved glass, and may also be flat glass. Wherein, the first surface 112 has a smooth area 112a and a rough area 112b, and the optical transmittance of at least a part of the smooth area 112a of the glass substrate 110 is above 90%, so that the glass substrate 110 can be used as a lens of a camera. And it will not affect the expressiveness of camera photography. Among them, the optical transmittance referred to herein refers to the optical transmittance in the wavelength band of 420 nanometers to 680 nanometers for visible light.

Further, the resolution of the region where the optical transmittance at the smooth area 112a is above 90% conforms to the following evaluation (SFR, Spatial Frequency Response) (wherein, the average reference value is 1:75, the average reference value is 2:78, and the reference The average value of the value is 3:63, the average value of the reference value is 4:65, and the average value of the reference value is 5:74. The test equipment is Sunny Optical's SFR detector, and the field of view of the entire camera is 100%):

0F (central field of view) contrast attenuation≤3, (that is, the test value is 73-75);

0.15F (15% field of view) contrast attenuation ≤ 3, (that is, the test value is 76-78);

0.3F (30% field of view) contrast attenuation≤3, (that is, the test value is 61-63);

0.6F (60% field of view) contrast attenuation≤5, (that is, the test value is 61-65);

0.8F (80% field of view) contrast attenuation≤5, (that is, the test value is 70-74).

In the illustrated embodiment, the rough area 112b is arranged around the smooth area 112a. There are two smooth areas 112a, and the two smooth areas 112a are spaced apart. One of the smooth areas 112a is used for installing the camera, and the other smooth area 112a is used for subsequent pattern setting. Wherein, the pattern can be set on the second surface 114 of the glass substrate 110 by arranging a pattern layer, and the pattern can be a logo, symbol, number, animal pattern, etc., or a gradient pattern or a non-gradient pattern. Alternatively, the pattern can also be directly formed on the smooth region 112a or the rough region 112b of the first surface 112 through the AG etching process.

It can be understood that the number and area of the smooth areas 112a can be set as required, for example, determined according to the number of cameras installed. Alternatively, the arrangement of the rough area 112b and the smooth area 112a is not limited to the above method, for example, one of the rough area 112b and the smooth area 112a is located above the first surface 112 and the other is located below the first surface 112; or the smooth area 112a It is arranged around the rough area 112b.

Specifically, the optical transmittance at the smooth area 112a of the glass substrate 110 is above 91% to ensure that the smooth area 112a has a better optical transmittance.

Specifically, the roughness of the smooth region 112a is 0.02 micrometers to 0.03 micrometers, and the roughness of the rough regions 112b is 0.1 micrometers to 0.2 micrometers, so that the smooth regions 112a and the rough regions 112b are distinct. In this article, roughness refers to surface roughness, which is measured by a roughness meter. Surface roughness (Surface Roughness) refers to the small spacing and small peaks and valleys of the processed surface.

Further, the haze at the rough area 112b is 20%-30%, so that the rough area 112b has a suitable haze. Generally, the haze of the cover of the mobile phone is required to be 20%-30%. In this article, haze is the percentage of the transmitted light intensity that deviates from the incident light by more than 2.5° of the total transmitted light intensity. The greater the haze, the lower the gloss and transparency of the glass, especially the decrease in image quality.

Please also refer to FIG. 4, in one of the embodiments, the rough area 112b is full of protrusions 112c, and the distance H from the end of the protrusion 112c away from the first surface 112 to the plane of the first surface 112 at the smooth area 112a is Below 8 mm, that is, the distance H from the end of the highest protrusion 112c opposite to the first surface 112 away from the first surface to the plane where the first surface 112 is in the smooth area 112a is below 8 mm, that is, the rough area 112b and the smooth area The height difference of 112a is less than 8 mm, and the height difference is small to reduce the scratching feeling.

The anti-reflection film 120 is disposed on the second surface 114 of the glass substrate 110, and the position of the anti-reflection film 120 corresponds to the area where the optical transmittance of the smooth area 112a is above 90%. The provision of the antireflection film 120 can increase the optical transmittance at the smooth area 112a of the cover plate 100 and improve the sharpness of the camera.

In one of the embodiments, the antireflection film 120 includes a multilayer titanium dioxide film (not shown) and a multilayer silicon dioxide film (not shown). The multilayer titanium dioxide film and the multilayer silicon dioxide film are alternately arranged, and wherein A layer of titanium dioxide film is disposed close to the second surface 114.

Specifically, the titanium dioxide film and the silicon dioxide film have 5 layers respectively, and the thickness of the 5 layers of titanium dioxide film is 5.99nm-7.99nm, 19.98nm-21.98nm, 38.28, from close to the second surface 114 to far away from the second surface 114. nm-40.28nm, 77.94nm-79.94nm and 23.84nm-25.84nm, the thickness of the 5-layer silicon dioxide film is 54.84nm-56.84nm, 33.13nm-35.13nm, 9.21nm-11.21nm, 17.12nm-19.12 nm and 102.41nm-104.41nm, among them, the titanium dioxide film of 5.99nm-7.99nm nm is closest to the second surface 114. By controlling the thickness of each film layer, it can be ensured that the obtained antireflection film 120 can well improve the optical transmittance of the glass substrate 110.

Further, from close to the second surface 114 to far away from the second surface 114, the thickness of the 5 layers of titanium dioxide film is 6.99 nm, 20.98 nm, 39.28 nm, 78.94 nm and 24.84 nm, respectively, and the thickness of the 5 layers of silicon dioxide film is respectively They are 55.84 nm, 34.13 nm, 10.21 nm, 18.12 nm, and 103.41 nm. The titanium dioxide film with a thickness of 6.99 nm is closest to the second surface 114. The structure of the antireflection film 120 can increase the optical transmittance of the smooth region 112a of the glass substrate 110 to above 94%.

It can be understood that the anti-reflection film 120 is not limited to the above structure, and the anti-reflection film 120 can also be arranged according to specific needs.

Further, the above-mentioned cover plate 100 further includes a film layer (not shown in the figure) provided on the second surface 114 of the glass substrate 110 for decoration, shading and the like.

The above-mentioned cover plate 100 has at least the following advantages:

The first surface 112 of the glass substrate 110 of the cover plate 100 has a smooth area 112a and a rough area 112b, and the optical transmittance of at least part of the smooth area 112a is above 90%, so that this part of the glass substrate 110 can Used directly as the lens of the camera, then, when in use, the camera can be directly set on the side close to the second surface 114 of the glass substrate 110, and the position of the camera lens and the optical transmittance of the glass substrate 110 are 90 % Or more of the area corresponds to the position without opening a hole to install the camera, which not only enables the above-mentioned cover 100 to have both a glossy effect and a matte effect, but also avoids the abrupt problem caused by the installation of the camera.

It should be noted that the anti-reflection film 120 may also be omitted, and the cover plate 100 may not have the anti-reflection film 120.

As shown in FIG. 5, the manufacturing method of the cover plate in one embodiment is a manufacturing method of the above-mentioned cover plate, and the manufacturing method of the cover plate includes the following steps:

Step S21: Provide a glass substrate, the glass substrate has a first surface and a second surface opposite to each other.

Specifically, the glass substrate is curved glass, and the glass substrate is obtained by bending flat glass, such as hot bending. Flat glass is glass with good optical transmittance, such as white glass, such as Corning's GG5 white glass. Among them, the first surface is a convex surface, and the second surface is a concave surface. In one of the embodiments, the thickness of the flat glass is 0.6 mm. It can be understood that the thickness of the flat glass can be set as required.

It can be understood that the glass substrate is not limited to curved glass, and may also be flat glass.

Step S22: polishing the first surface and the second surface to make the optical transmittance of the glass substrate above 90%.

Further, after the polishing process of step S22, the resolution of the glass substrate meets the following evaluation (SFR, Spatial Frequency Response) lens (wherein, the average value of the reference value is 1:75, the average value of the reference value is 2:78, and the average value of the reference value is 3:63, the average benchmark value 4:65, the average benchmark value 5:74, the test equipment is Sunny Optical's SFR detector, the field of view of the entire camera is 100%):

Specifically, step S22 includes: polishing the first surface and the second surface using at least one of a dermabrasion brush, nylon glue thread, and polypropylene fiber, respectively, to remove various lines (especially curved lines) on the surface of the glass substrate. The impression and orange pattern formed by molding), so that the optical transmittance of the glass substrate is above 90%.

Furthermore, the first surface is polished by using a mixture of a grinding brush and nylon glue thread or polypropylene fiber. The nylon glue thread has a higher hardness, which can ensure the polishing cutting volume and improve the cutting efficiency, but the nylon glue thread texture It is hard and easy to scratch the glass surface, while the grinding brush is soft and has a small amount of cutting. By polishing the first surface of the glass substrate with a mixture of the grinding brush and nylon glue wire, it can not only effectively reduce the scratches on the glass surface. The chance of injury, but also has a higher polishing efficiency. Furthermore, the polypropylene fiber is used to polish the first surface. The polypropylene fiber has more suitable hardness, better polishing effect, and higher polishing effect.

Further, the second surface is polished using a mixture of a dermabrasion brush and nylon glue filament. Since the second surface is concave, the polypropylene fiber is harder and difficult to bend, and it is difficult to polish the arc surface of the second surface of the concave structure. The same surface is polished with the same material to ensure the uniformity of polishing on the surface. Therefore, the second surface is preferably polished with a mixture of a dermabrasion brush and nylon glue filament.

In one of the embodiments, in the step of polishing the first surface, the pressure is 25 kg-30 kg, and the time is 37 minutes-43 minutes; in the step of polishing the second surface, the pressure is 25 kg- 30 kg, the time is 57 minutes-63 minutes, by controlling the above pressure and time, so that the optical transmittance of the glass substrate is above 90%. During the bending and forming process of the glass substrate, the second surface (concave surface) has a heavier mold print relative to the first surface (convex surface). Therefore, the polishing time of the second surface is longer than that of the first surface.

Step S23: Use a sponge with a Rockwell hardness of 45°-50° to polish the first surface and the second surface respectively.

The first surface and the second surface are polished by using the sponge with the above hardness to further optimize the surface quality of the glass substrate, so that the micro scratches on the surface of the glass substrate can be further repaired (because the micro scratches are generally invisible to the naked eye, but After subsequent chemical exposure, it will be magnified into visible scratches).

Specifically, in the step of using a sponge to polish the first surface, the pressure is 25 kg-30 kg, and the time is 7 minutes to 13 minutes; in the step of using a sponge to polish the second surface, the pressure is 25 kg- 30 kg, the time is 7 minutes to 13 minutes.

In one of the embodiments, after the step of polishing the first surface with a sponge, the roughness of the first surface is 0.02 micron-0.03 micron; after the step of polishing the second surface with a sponge, the roughness of the second surface The roughness is 0.02 microns-0.03 microns.

Step S24: forming an acid-resistant film on a partial area of the first surface and the second surface of the glass substrate.

Wherein, the area on the first surface where the acid-resistant film is formed is the smooth area. The number of regions where the acid-resistant film is formed on the first surface can be selected as required.

Specifically, step S24 includes: forming an acid-resistant film on a partial area of the first surface by screen printing; and spraying an acid-resistant film on the second surface.

In one of the embodiments, in the step of forming an acid-resistant film by screen printing on a partial area of the first surface, the dimensional accuracy is ±0.05 mm, and the position accuracy is ±0.08 mm. That is, in the process of screen printing acid-resistant film, the size of the screen-printed acid-resistant film is different from the size of the preset smooth area (that is, the above-mentioned partial area) of the first surface by ±0.05 mm, and the position of the printed acid-resistant film is the same as that of the first surface The position difference of the preset smooth zone is ±0.08 mm. In order to ensure the accuracy of the subsequent adhesion of the AR coating and the installation of the camera, and minimize the abnormal position.

Specifically, in the step of screen printing on a partial area of the first surface to form an acid-resistant film, a full brake screen printer with CCD function is used to screen the partial area (smooth area) of the first surface to ensure that the screen-printed acid-resistant film Dimensional accuracy and positional accuracy. More specifically, during the silk screen printing process, the accuracy of the screen printing position is controlled by ±0.05 mm to ensure that the above-mentioned dimensional accuracy and position accuracy are met, and the process is stable.

Specifically, the material of the acid-resistant film formed on the first surface is an acid-resistant ink, such as an acid-resistant ink of model WE-4500F from Guangzhou Yisheng Environmental Protection Technology Co., Ltd.

Specifically, the material of the acid-resistant film formed on the second surface is a UV curable ink, such as an acid-resistant ink of model 335-6688 from Zhou Yisheng Environmental Protection Technology Co., Ltd. Since the second surface is a concave surface, a uniform acid-resistant film cannot be formed by silk screen printing. Therefore, an acid-resistant film is formed on the second surface by spraying.

Step S25: etching the area of the first surface where the acid-resistant film is not formed to form a rough area.

Specifically, step S25 includes: spraying the area where the acid-resistant film is not formed on the first surface of the glass substrate with an etching solution, so that the area where the acid-resistant film is not formed is raised to form a rough area, wherein the etching Liquid includes HF, sulfate and ammonium bifluoride. The HF, sulfate and ammonium bifluoride in the etching solution can react with the silica, alumina, etc. on the glass surface to form bumps on the glass surface. Among them, the sulfate is, for example, barium sulfate. The spraying method is beneficial to form uniform protrusions.

It can be understood that the method of etching the glass substrate to form the rough area is not limited to spraying. In other embodiments, the method of immersion may also be used. However, the immersion may easily lead to inconsistent roughness at both ends, and the first contact etching One end of the liquid will leave the etching liquid last, so that the end that first contacts the etching liquid has a longer reaction time than the other end, and spraying can ensure the overall uniformity.

Among them, the etching solution may be an AG etching solution commonly used in the field. In one of the embodiments, according to mass parts, the etching solution includes the following components: 10 parts to 15 parts of HF, 15 parts to 30 parts of ammonium bifluoride, 5 parts to 8 parts of ammonium fluoride, 10 parts to 15 parts Parts of barium sulfate, 5 parts to 8 parts of dextrin and water.

In one of the embodiments, after step S25, the roughness of the rough area is 0.3 μm-0.5 μm.

Step S26: Use a chemical polishing liquid containing HF to chemically polish the glass substrate.

Step S26 is single polishing, that is, chemically polishing the rough area. The rough area is chemically polished to increase the height difference between the smooth area and the rough area, so that the smooth area and the rough area have a suitable height difference (below 8 microns). ), so that the smooth zone and the rough zone have a clear level. At the same time, single polishing can also make the rough zone have suitable haze and suitable roughness, so that the glass substrate can meet the required requirements.

In one of the embodiments, in the step of chemically polishing the glass substrate using a chemical polishing solution containing HF, the chemical polishing time is 1 minute to 1.5 minutes, and the mass percentage of HF in the chemical polishing solution is 2%- 3%. By controlling the time of chemical polishing and the content of HF in the chemical polishing liquid to control the haze and roughness of the rough area, control the height difference between the smooth area and the rough area, and control the greater the incidence of scratches on the glass substrate. The greater the HF content in the chemical polishing liquid for single polishing, the longer the chemical polishing time, and the greater the height difference between the smooth area and the rough area. In addition, the HF content of the single polishing liquid will also directly affect the scratch incidence of the glass substrate. The greater the HF content, the longer the chemical polishing time and the greater the scratch incidence. The greater the HF content, the longer the chemical polishing time, the smaller the haze, and the smaller the roughness of the rough area.

Further, the chemical polishing liquid also includes H ₂ SO ₄ with a mass percentage of 10%-40%. The sulfuric acid content can remove the glass chips produced on the glass substrate in the chemical polishing process in time to ensure the polishing quality .

In one of the embodiments, after step S26, the roughness of the rough area is 0.2 μm-0.35 μm, and the haze is 30%-40%.

Step S27: Remove the acid-resistant film.

That is, the acid-resistant film on the first surface and the second surface is removed.

Specifically, the de-inking liquid is used to remove the acid-resistant film, and the de-inking liquid is an alkaline syrup (containing hydroxide). Among them, the deinking liquid can be a deinking liquid commonly used in the field, such as the win-18 type deinking liquid of Guangdong Shanzhifeng Environmental Protection Technology Co., Ltd. Specifically, the step of removing the acid-resistant film is carried out below 70°C to prevent the glass substrate from being corroded and scratched due to excessive temperature, reduce the incidence of scratches on the glass substrate, and at the same time avoid excessive ink removal temperature The blue surface of the glass substrate caused by high temperature causes a slight decrease in the transmittance of the smooth area of the glass substrate, thereby ensuring the quality of the glass surface.

Step S28: chemically polishing the first surface and the second surface of the glass substrate using a polishing liquid containing HF.

Step S28 is double polishing. The deinked glass substrate is chemically polished by using a polishing liquid containing HF to ensure a smooth transition between the smooth area and the rough area, so as to reduce the scratching of the cover and make the smooth and rough areas natural Transition, at the same time, improve and further adjust the surface roughness and haze of the rough area to adapt it to the needs of the application scenario.

In one of the embodiments, after the step of chemically polishing the first surface and the second surface of the glass substrate using a polishing liquid containing HF, the roughness of the rough area is 0.1 micron-0.2 micron, and the haze is 20%-30 %, the roughness and haze are currently required parameters for mobile phone covers.

In one of the embodiments, the mass percentage of HF in the polishing liquid containing HF is 2%-4%, and the chemical polishing time is 2 minutes-4 minutes. The HF content of double polishing will directly affect the surface roughness and haze of the rough area of the glass substrate. The greater the HF content, the longer the polishing time, the smaller the haze and the smaller the roughness.

Step S29: An anti-reflection film is provided on the second surface of the glass substrate, and the position of the anti-reflection film corresponds to the position of the partial area.

That is, the position of the anti-reflection film corresponds to the position of one of the smooth areas, and the provision of the anti-reflection film can increase the corresponding optical transmittance at the smooth area of the cover plate and improve the sharpness of the camera.

In one of the embodiments, the antireflection film includes a multilayer titanium dioxide film and a multilayer silicon dioxide film, the multilayer titanium dioxide film and the multilayer silicon dioxide film are alternately arranged, and one of the titanium dioxide films is arranged close to the second surface.

Specifically, there are 5 layers of titanium dioxide film and silicon dioxide film, from close to the second surface to far away from the second surface, the thickness of the 5 layers of titanium dioxide film is 5.99nm-7.99nm, 19.98nm-21.98nm, 38.28nm- 40.28nm, 77.94nm-79.94nm and 23.84nm-25.84nm, the thickness of the 5-layer silicon dioxide film is 54.84nm-56.84nm, 33.13nm-35.13nm, 9.21nm-11.21nm, 17.12nm-19.12nm and 102.41nm-104.41nm, of which, the 5.99nm-7.99nm titanium dioxide film is closest to the second surface. By controlling the thickness of each film layer, it can be ensured that the obtained antireflection film can well improve the optical transmittance of the glass substrate.

Further, from close to the second surface to far away from the second surface, the thickness of the five-layer titanium dioxide film is 6.99 nm, 20.98 nm, 39.28 nm, 78.94 nm and 24.84 nm, and the thickness of the five-layer silicon dioxide film is 55.84, respectively. nm, 34.13nm, 10.21nm, 18.12nm and 103.41nm, among them, the titanium dioxide film with a thickness of 6.99nm is closest to the second surface. The antireflection film structure can increase the optical transmittance of the smooth area of the glass substrate to above 94%.

Further, after step S28 and before step S29, it further includes the steps of chemically strengthening the glass substrate, forming a pattern layer (such as a logo, etc.) on the second surface, and sticking a film on the second surface. Among them, the position of the pattern layer corresponds to the position of another smooth area. The pattern layer may be a gradient pattern formed by a yellow light process or a printing process. Alternatively, a logo is formed by AG etching in another smooth area.

The manufacturing method of the above cover plate has at least the following advantages:

(1) By polishing the glass substrate to an optical transmittance of 90% or more, and then forming an acid-resistant film on part of the first surface and the second surface of the glass substrate, the parts of the glass substrate that do not need to be roughened are protected. Then the glass is etched to form a rough area, and the area protected by the acid-resistant film forms a smooth area. The smooth area is convenient for installing the camera directly without opening the camera mounting hole, that is, the cover produced by the above-mentioned cover plate manufacturing method. The board can have both a glossy effect and a matte effect at the same time, and can avoid the abrupt problems caused by the installation of the camera.

(2) After the step of polishing the glass substrate to an optical transmittance above 90%, use a sponge with a Rockwell hardness of 45°-50° to polish the first surface and the second surface to further optimize The surface quality of the glass substrate allows the micro-scratches on the surface of the glass substrate to be further repaired (because the micro-scratches are generally invisible to the naked eye, but will be magnified into visible scratches after subsequent chemical exposure), which is beneficial Improve production yield.

(3) Before removing the acid-resistant film, chemically polish the rough area. The rough area is chemically polished to increase the height difference between the smooth area and the rough area, so that the smooth area and the rough area have a suitable height difference ( Below 8 microns), and the smooth zone and rough zone are distinct. At the same time, single polishing can also make the rough zone have suitable haze and suitable roughness; after removing the acid-resistant film, use a polishing liquid containing HF Chemically polish the first surface and the second surface of the glass substrate to ensure smooth transition between the smooth area and the rough area to reduce the scratching of the cover, to make the smooth area and the rough area transition naturally, and at the same time, to further adjust the rough area The surface roughness and haze of the cover plate can adapt to the needs of the application scene. Through two chemical polishing, the smooth transition of the matt and the smooth layer are ensured, so that the cover plate can adapt to the needs of the application scene.

It should be noted that the manufacturing method of the cover plate is not limited to the above steps. Among them, the steps S23, S26, S28, and S29 may be partially omitted or all of them may be omitted.

According to an embodiment of the electronic device, the electronic device is a mobile phone, a tablet computer, or the like. The electronic device includes a cover and a camera.

The cover plate is a cover plate obtained by the aforementioned cover plate 100 or the aforementioned cover plate manufacturing method.

The camera is arranged close to the second surface of the glass substrate, the camera has a lens, and the position of the lens corresponds to the position of the area where the optical transmittance of the glass substrate is above 90%.

That is, the optical transmittance of a part of the cover is above 90%, so that this part of the cover can be directly used as a camera lens, so that the camera lens can be directly installed in this area without opening the cover The camera lens is installed through the hole, and there is no need to additionally install the cover glass of the camera lens, so that the above-mentioned electronic equipment does not have the abrupt problem caused by the installation of the camera. Since the camera installation has no opening, the waterproof performance is better.

The following is a specific embodiment part (the following embodiment is an example of the manufacturing method of the above cover plate, and the technical solution of the present invention is not limited to the following embodiment):

Example 1

The preparation process of the cover plate of this embodiment is as follows:

(1) Provide a glass substrate with a thickness of 0.6 mm. The glass substrate is Corning's GG5 white glass. The glass substrate is formed by hot bending to form curved glass. The curved glass has a first surface and a second surface opposite to the surface. One surface is convex and the second surface is concave.

(2) Use a mixture of a dermabrasion brush and nylon glue filament to polish the second surface, the polishing pressure is 28 kg, and the time is 60 minutes; use a mixture of a dermabrasion brush and nylon glue filament to polish the first surface, The polishing pressure is 28 kg and the time is 40 minutes.

(3) Use a sponge with a Rockwell hardness of 48° to polish the first surface for 10 minutes and a polishing pressure of 28 kg; use a sponge with a Rockwell hardness of 48° to polish the second surface for 10 minutes and a polishing pressure of 28 kg .

(4) Use a full brake screen printer with CCD function to screen-print acid-resistant ink on a part of the first surface to form an acid-resistant film. The screen printing size accuracy is ±0.05 mm, and the screen printing position accuracy is ±0.08 mm. In, the inspection and control are carried out according to the position accuracy of ±0.05 mm, and the area where the acid-resistant film is formed on the first surface is recorded as the smooth area.

(5) Spraying UV ink on the second surface of the glass substrate and curing by UV to form an acid-resistant film on the second surface.

(6) The area where the acid-resistant film is not formed on the first surface of the glass substrate is sprayed with an etching solution, so that the area where the acid-resistant film is not formed is raised to form a rough area. Among them, in terms of parts by mass, the composition of the etching solution is as follows: 12 parts of HF, 22 parts of ammonium bifluoride, 6 parts of ammonium fluoride, 12 parts of barium sulfate, 6 parts of dextrin, and 100 parts of water.

(7) Single polishing: use chemical polishing liquid to chemically polish the glass substrate for 1.2 minutes, wherein, in terms of mass percentage, the composition of the chemical polishing liquid is as follows: 3% HF, 25% H ₂ SO ₄ and water.

(8) Deinking: Use a deinking solution to remove the acid-resistant film on the first surface and the second surface of the glass substrate at 50°C.

(9) Double polishing: use polishing liquid to chemically polish the glass substrate for 3 minutes. Among them, in terms of mass percentage, the composition of the polishing liquid is as follows: 3% HF, 25% H ₂ SO ₄ and water.

(10) The glass substrate is chemically strengthened, logo and film are set, and then an anti-reflection film is set on the second surface of the glass substrate, and the position of the anti-reflection film and the smooth area of the first surface (that is, the first surface is formed before Part of the acid-resistant film) to obtain a cover. Among them, the anti-reflection coating is alternately arranged five layers of titanium dioxide film and five layers of silicon dioxide film. From close to the second surface to far away from the second surface, the thickness of the five layers of titanium dioxide film is 6.99nm, 20.98nm, 39.28nm, respectively. 78.94nm and 24.84nm, the thickness of the 5-layer silicon dioxide film is 55.84nm, 34.13nm, 10.21nm, 18.12nm and 103.41nm, respectively, the titanium dioxide film with a thickness of 6.99nm is closest to the second surface, and the cover plate is obtained.

Example 2

The preparation process of the cover plate of this embodiment is as follows:

(2) Use a mixture of a dermabrasion brush and nylon glue wire to polish the second surface at a polishing pressure of 25 kg and a time of 63 minutes; use a mixture of a dermabrasion brush and nylon glue wire to polish the first surface. The polishing pressure is 25 kg and the time is 43 minutes.

(3) Use a sponge with Rockwell hardness of 45° to polish the first surface for 13 minutes and a polishing pressure of 25 kg; use a sponge with Rockwell hardness of 45° to polish the second surface for 13 minutes and a polishing pressure of 25 kg .

(6) The area where the acid-resistant film is not formed on the first surface of the glass substrate is sprayed with an etching solution, so that the area where the acid-resistant film is not formed is raised to form a rough area. Among them, in terms of parts by mass, the composition of the etching solution is as follows: 10 parts of HF, 30 parts of ammonium bifluoride, 8 parts of ammonium fluoride, 10 parts of barium sulfate, 5 parts of dextrin, and 100 parts of water.

(7) Single polishing: use chemical polishing liquid to chemically polish the glass substrate for 1.5 minutes, wherein, in terms of mass percentage, the composition of the chemical polishing liquid is as follows: 2% HF, 10% H ₂ SO ₄ and water.

(8) Deinking: Use a deinking solution to remove the acid-resistant film on the first surface and the second surface of the glass substrate at 60°C.

(9) Double polishing: Use polishing liquid to chemically polish the glass substrate for 2 minutes. Among them, in terms of mass percentage, the composition of the polishing liquid is as follows: 4% HF, 40% H ₂ SO ₄ and water.

(10) The glass substrate is chemically strengthened, logo and film are set, and then an anti-reflection film is set on the second surface of the glass substrate, and the position of the anti-reflection film and the smooth area of the first surface (that is, the first surface is formed before Part of the acid-resistant film) to obtain a cover. Among them, the anti-reflection coating is alternately arranged 5 layers of titanium dioxide film and 5 layers of silicon dioxide film. From close to the second surface to far away from the second surface, the thickness of the 5 layers of titanium dioxide film is 5.99nm, 19.98nm, 38.28nm, respectively. 77.94nm and 23.84nm, the thickness of the five-layer silicon dioxide film is 54.84nm, 33.13nm, 9.21nm, 17.12nm, and 102.41nm, respectively, and the titanium dioxide film with a thickness of 5.99nm is closest to the second surface to obtain the cover plate.

Example 3

The preparation process of the cover plate of this embodiment is as follows:

(2) Use a mixture of a dermabrasion brush and nylon glue filament to polish the second surface at a polishing pressure of 30 kg and a time of 57 minutes; use a mixture of a dermabrasion brush and nylon glue filament to polish the first surface, The polishing pressure is 30 kg and the time is 37 minutes.

(3) Use a sponge with Rockwell hardness of 50° to polish the first surface for 7 minutes at a polishing pressure of 30 kg; use a sponge with Rockwell hardness of 50° to polish the second surface for 7 minutes at a polishing pressure of 30 kg .

(6) The area where the acid-resistant film is not formed on the first surface of the glass substrate is sprayed with an etching solution, so that the area where the acid-resistant film is not formed is raised to form a rough area. Among them, in terms of parts by mass, the composition of the etching solution is as follows: 15 parts of HF, 15 parts of ammonium bifluoride, 5 parts of ammonium fluoride, 10 parts of barium sulfate, 8 parts of dextrin, and 100 parts of water.

(7) Single polishing: use chemical polishing liquid to chemically polish the glass substrate for 1 minute, wherein, in terms of mass percentage, the composition of the chemical polishing liquid is as follows: 3% HF, 40% H ₂ SO ₄ and water.

(8) Deinking: Use a deinking solution to remove the acid-resistant film on the first surface and the second surface of the glass substrate at 70°C.

(9) Double polishing: Use polishing liquid to chemically polish the glass substrate for 4 minutes. Among them, in terms of mass percentage, the composition of the polishing liquid is as follows: 2% HF, 10% H ₂ SO ₄ and water.

(10) The glass substrate is chemically strengthened, logo and film are set, and then an anti-reflection film is set on the second surface of the glass substrate, and the position of the anti-reflection film and the smooth area of the first surface (that is, the first surface is formed before Part of the acid-resistant film) to obtain a cover. Among them, the anti-reflection coating is alternately arranged 5 layers of titanium dioxide film and 5 layers of silicon dioxide film. From close to the second surface to far away from the second surface, the thickness of the 5 layers of titanium dioxide film is 7.99nm, 21.98nm, 40.28nm, respectively. 79.94nm and 25.84nm, the thickness of the 5-layer silicon dioxide film is 56.84nm, 35.13nm, 11.21nm, 19.12nm, and 104.41nm, respectively, and the 7.99nm titanium dioxide film is closest to the second surface to obtain the cover plate.

Example 4

The preparation process of the cover plate of this embodiment is as follows:

(2) Use a mixture of a dermabrasion brush and nylon glue wire to polish the second surface at a polishing pressure of 26 kg and a time of 58 minutes; use a mixture of a dermabrasion brush and nylon glue wire to polish the first surface, The polishing pressure is 26 kg and the time is 42 minutes.

(3) Use a sponge with Rockwell hardness of 47° to polish the first surface for 9 minutes and a polishing pressure of 26 kg; use a sponge with Rockwell hardness of 47° to polish the second surface for 9 minutes and a polishing pressure of 26 kg .

(6) The area where the acid-resistant film is not formed on the first surface of the glass substrate is sprayed with an etching solution, so that the area where the acid-resistant film is not formed is raised to form a rough area. Among them, in terms of parts by mass, the composition of the etching solution is as follows: 13 parts of HF, 20 parts of ammonium bifluoride, 7 parts of ammonium fluoride, 11 parts of barium sulfate, 7 parts of dextrin, and 100 parts of water.

(7) Single polishing: use chemical polishing liquid to chemically polish the glass substrate for 1 minute, wherein, in terms of mass percentage, the composition of the chemical polishing liquid is as follows: 2.5% HF, 20% H ₂ SO ₄ and water.

(8) Deinking: Use a deinking solution to remove the acid-resistant film on the first surface and the second surface of the glass substrate at 30°C.

(9) Double polishing: use polishing liquid to chemically polish the glass substrate for 3 minutes. Among them, in terms of mass percentage, the composition of the polishing liquid is as follows: 2.5% HF, 20% H ₂ SO ₄ and water.

(10) The glass substrate is chemically strengthened, logo and film are set, and then an anti-reflection film is set on the second surface of the glass substrate, and the position of the anti-reflection film and the smooth area of the first surface (that is, the first surface is formed before Part of the acid-resistant film) to obtain a cover. Among them, the anti-reflection coating is alternately arranged with 5 layers of titanium dioxide film and 5 layers of silicon dioxide film. The thickness of the 5 layers of titanium dioxide film is 7nm, 20nm, 39nm, 79nm and 25nm from close to the second surface to far away from the second surface. The thickness of the 5-layer silicon dioxide film is 56 nm, 34 nm, 10 nm, 18 nm, and 103 nm, respectively, and the 7 nm titanium dioxide film is closest to the second surface to obtain the cover plate.

Example 5

The manufacturing process of the cover plate of this embodiment is roughly the same as the manufacturing process of the cover plate of Example 1. The difference is that this embodiment does not perform step (3) sponge polishing, but directly enters step (2) after step (2). 4) That is, the manufacturing process of the cover plate of this embodiment is as follows:

(1)-(2), the same as the steps (1) and (2) of Example 1.

(3) Same as step (4) of Example 1.

(4)-(9), same as the steps (5)-(10) of Example 1.

Example 6

The manufacturing process of the cover plate of this embodiment is roughly the same as the manufacturing process of the cover plate of Example 1. The difference is that this embodiment does not perform the double polishing of step (9), but directly performs step (8) after step (8). 10) That is, the manufacturing process of the cover plate of this embodiment is as follows:

(1)-(8), same as the steps (1)-(8) of Example 1.

(9) Same as step (10) of embodiment 1.

Example 7

The manufacturing process of the cover plate of this embodiment is roughly the same as the manufacturing process of the cover plate of embodiment 1. The difference is that this embodiment does not perform step (7) single throwing, but directly performs step (6) after step (6). 8) That is, the manufacturing process of the cover plate of this embodiment is as follows:

(1)-(6), same as the steps (1)-(6) of Example 1.

(7)-(9), same as the steps (8)-(10) of Example 1.

Example 8

The manufacturing process of the cover plate of this embodiment is substantially the same as the manufacturing process of the cover plate of Example 1, except that the mass percentage of HF in the chemical polishing liquid during the single polishing in step (7) is 1%.

Example 9

The manufacturing process of the cover plate of this embodiment is substantially the same as the manufacturing process of the cover plate of Example 1, except that the mass percentage of HF in the chemical polishing liquid during the single polishing in step (7) is 4%.

Example 10

The manufacturing process of the cover plate of this embodiment is substantially the same as the manufacturing process of the cover plate of Example 1, except that the mass percentage of HF in the chemical polishing liquid during the double polishing in step (9) is 1%.

Example 11

The manufacturing process of the cover plate of this embodiment is substantially the same as the manufacturing process of the cover plate of Example 1, except that the mass percentage of HF in the chemical polishing liquid during double polishing in step (9) is 5%.

Example 12

The manufacturing process of the cover plate of this embodiment is substantially the same as the manufacturing process of the cover plate of Example 1, except that the temperature at step (8) during deinking is 75°C.

test:

1. SFR evaluation:

(1) Use Sunny Optical's SFR detector to compare the curved glass substrate obtained in step (1) of Example 1, and the steps of Example 1-4 (2) Steps to obtain the glass substrate, Example 1-4 (9) The resolution of the smooth area of the obtained glass substrate, the smooth area of the glass substrate obtained in step (8) of Examples 5-7, and the smooth area of step (9) of Examples 8-12 were evaluated by SFR ,As shown in Table 1.

Among them, the field of view of the entire camera is 100%, the reference value average is 1:75, the reference value average is 2:78, the reference value average is 3:63, the reference value average is 4:65, and the reference value average is 5:74 , If the contrast attenuation of 0F (central field of view) is ≤3, (that is, the test value is 73-75); if the contrast attenuation of 0.15F (15% field of view) is ≤3, (that is, the test value is 76-78); 0.3 The contrast attenuation of F (30% field of view) is ≤3, (that is, the test value is 61-63); the contrast attenuation of 0.6F (60% field of view) is ≤5, (that is, the test value is 61-65); 0.8F( If the contrast attenuation of 80% field of view is less than or equal to 5, (that is, the test value is 70-74), the SFR test is passed, and the test is OK.

Table 1

It can be seen from Table 1 that the step (2) of Example 1-4 obtains the glass substrate, the step (9) of Example 1-4 at the smooth area of the glass substrate, the step (8) of Example 5-7 The resolution of the smooth area of the obtained glass substrate and the smooth area of the step (9) of Examples 8-12 all passed the SFR evaluation.

2. Using SCINCO vms-1s to detect and test the transmittance of the smooth area of the glass substrate of the step (9) of the step (9) of the glass substrate in Examples 1-4 and Example 8-12, and the antireflection film formed in step (10) The transmittance of the smooth area, as shown in Table 2, the transmittance of the smooth area of the glass substrate in the step (8) of Example 5-7 and the antireflection film formed in the step (9) of the Example 5-7 The transmittance of the smooth area is shown in Table 3.

Table 2

table 3

It can be seen from Table 2 and Table 3 that the transmittance of the smooth area of the glass substrate of Example 1 to Example 11 is 91%-92%, while the transmittance of the glass substrate of Example 12 is 90%. %-91%, which means that the HF concentration of single polishing and double polishing and the sponge polishing step have almost no effect on the transmittance of the smooth area of the glass substrate, while the transmittance of the smooth area of the glass substrate of Example 12 The lower is because the ink fading temperature is too high, which will cause the glass surface to turn blue, and cause the transmittance of the smooth area of the glass substrate to slightly decrease.

3. Use Mitutoyo's SJ-310 roughness meter to test the roughness of the smooth and rough areas of the glass substrate in steps (9) of Examples 1-4 and 8-12, and the steps of Example 5-7 (8) ) The roughness of the smooth area and rough area of the glass substrate, as shown in Table 4;

Use the SGW-820 light transmittance haze meter/haze meter of Shanghai INESA to test the rough area of the glass substrate of the step (9) of Examples 1-4 and 8-12 and the steps of Example 5-7 (8) The haze of the rough area of the glass substrate is shown in Table 4.

Table 4

For mobile phones, the roughness and haze of the rough area are usually required to be 0.1 micron-0.2 micron and 20%-30% respectively. It can be seen from Table 4 that the glass substrates of Examples 1-5 and 12 have The roughness of the rough area is 0.1 micron-0.2 micron, and the haze is 20%-30%. The roughness of the rough area of Example 6 without double polishing and Example 7 without single polishing are both higher Large; and the roughness of the rough area of Example 8-Example 11 is not larger but smaller, which shows that the concentration of HF in single and double polishing will directly affect the roughness and haze of the rough area of the glass substrate.

Among them, the roughness of the smooth area of the glass substrate in the step (9) of the embodiment 1-12 and the smooth area of the glass substrate in the step (8) of the embodiment 5-7 are both 0.02 microns to 0.03 microns, which shows that the single polishing Steps, double polishing steps and sponge polishing steps have almost no effect on the roughness of the smooth area.

4. Use Mitutoyo's SJ-310 roughness tester to test the glass obtained in Example 1-Step (9) of Example 4, Step (9) of Example 8-12, and Step (8) of Example 5-7 The height difference between the smooth area and the rough area of the substrate (that is, the length of H in FIG. 4) is shown in Table 5.

table 5

It can be seen from Table 5 that the height difference between the smooth area and the rough area of the glass substrates of Examples 1-8 and 10-12 is less than 8 microns. Example 7 without single polishing and single polishing liquid polishing The height difference between the smooth area and the rough area of the glass substrate of Example 8 with too low HF concentration is below 4 microns and less than 6 microns, while the HF concentration of the single polishing liquid is too large for the glass substrate of Example 9 The height difference between the smooth zone and the rough zone is more than 10 microns, which means that the concentration of the single polishing step will directly affect the height difference between the smooth zone and the rough zone of the glass substrate. If the single polishing concentration is too large, the height difference between the smooth zone and the rough zone will be caused. Larger.

5. Observe the smooth area of the glass substrate after the double polishing in step (9) of Examples 1-4 and 8-12 and after the double polishing in step (8) of Example 5-7 under a light with an illuminance of 1000 lux. Table 6 shows the scratch situation and the incidence rate of uniform plan.

Table 6

To	划伤发生率Scratch incidence
实施例1Example 1	≤5％≤5%
实施例2Example 2	≤5％≤5%
实施例3Example 3	≤5％≤5%
实施例4Example 4	≤5％≤5%
实施例5Example 5	≥10％≥10%
实施例6Example 6	≤4％≤4%
实施例7Example 7	≥8％≥8%
实施例8Example 8	≤4％≤4%
实施例9Example 9	≥8％≥8%
实施例10Example 10	≤4％≤4%
实施例11Example 11	≥8％≥8%
实施例12Example 12	≥8％≥8%

It can be seen from Table 6 that the incidence of scratches in the smooth area of the glass substrate after double polishing in step (9) of Examples 1-4 is at most 5%, while the incidence of scratches in the smooth area of the glass substrate of Example 5 The incidence rate of damage is above 10%. This is because sponge polishing can effectively remove tiny scratches on the glass surface (further reduce the scratches). Under certain polishing conditions, the scratches are not significantly enlarged, thereby effectively improving the production yield.

Among them, the scratch incidence of Example 6, Example 8, and Example 10 is below 4%, and the incidence of scratches of Examples 7, 9, 11 and 12 are all above 8%, which shows that single throwing and double throwing The concentration of HF will directly affect the incidence of scratches on the glass substrate. If the concentration of HF is too large, the probability of scratches is greater, that is, the greater the incidence of scratches, if the concentration of HF is small, the probability of scratches is smaller. That is, the smaller the incidence of scratches; and too high a deinking temperature will increase the probability of scratches on the glass substrate, resulting in an increase in the incidence of scratches on the glass substrate.

The technical features of the above-mentioned embodiments can be combined arbitrarily. In order to make the description concise, all possible combinations of the technical features in the above-mentioned embodiments are not described. However, as long as there is no contradiction in the combination of these technical features, All should be considered as the scope of this specification.

The above-mentioned embodiments only express several embodiments of the present invention, and the descriptions are more specific and detailed, but they should not be understood as limiting the scope of the invention patent. It should be pointed out that for those of ordinary skill in the art, without departing from the concept of the present invention, several modifications and improvements can be made, and these all fall within the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention should be subject to the appended claims.

Claims

A cover plate includes a glass substrate, the glass substrate has a first surface, the first surface has a smooth area and a rough area, and the optical transmittance of at least a part of the glass substrate at the smooth area is within more than 90 percent.
The cover plate according to claim 1, wherein the optical transmittance at the smooth area is above 91%.
The cover plate according to claim 1, wherein the roughness at the smooth area is 0.02 μm-0.03 μm; the roughness at the rough area is 0.1 μm-0.2 μm.
The cover plate according to claim 1, wherein the haze at the rough area is 20%-30%.
The cover plate according to claim 1, wherein the rough area is full of protrusions, and the end of the protrusions away from the first surface to the plane where the first surface is in the smooth area The distance is less than 8 mm.
The cover plate according to any one of claims 1-5, wherein the glass substrate further has a second surface opposite to the first surface, the cover plate further comprises an antireflection film, and the glass substrate The transparent film is arranged on the second surface, and the position of the antireflection film corresponds to the position of the region where the optical transmittance of the smooth area is above 90%.
The cover plate according to claim 6, wherein the antireflection film comprises a multilayer titanium dioxide film and a multilayer silicon dioxide film, and the multiple layers of the titanium dioxide film and the multiple layers of the silicon dioxide film are alternately arranged, And one layer of the titanium dioxide film is disposed close to the second surface.
The cover plate according to claim 7, wherein the titanium dioxide film and the silicon dioxide film are each composed of 5 layers, from close to the second surface to far away from the second surface, 5 layers of the The thickness of the titanium dioxide film is 5.99nm-7.99nm, 19.98nm-21.98nm, 38.28nm-40.28nm, 77.94nm-79.94nm and 23.84nm-25.84nm, and the thickness of the 5 layers of silicon dioxide film is 54.84nm. nm-56.84nm, 33.13nm-35.13nm, 9.21nm-11.21nm, 17.12nm-19.12nm and 102.41nm-104.41nm, wherein the titanium dioxide film with a thickness of 5.99nm-7.99nm is closest to the second surface .
The cover plate according to claim 8, wherein the thickness of the five layers of the titanium dioxide film is 6.99nm, 20.98nm, 39.28nm, 78.94, from close to the second surface to far away from the second surface. nm and 24.84 nm, the thickness of the five layers of the silicon dioxide film are 55.84 nm, 34.13 nm, 10.21 nm, 18.12 nm and 103.41 nm, respectively, wherein the titanium dioxide film with a thickness of 6.99 nm is closest to the second surface.
A method for manufacturing a cover plate includes the following steps:

Providing a glass substrate, the glass substrate having opposite first and second surfaces;

Polishing the first surface and the second surface so that the optical transmittance of the glass substrate is above 90%;

Forming an acid-resistant film on part of the first surface and the second surface;

Etching the area of the first surface where the acid-resistant film is not formed to form a roughened area; and

The acid-resistant film is removed to obtain a cover plate.
The method of manufacturing a cover plate according to claim 10, wherein the first surface and the second surface are polished to make the optical transmittance of the glass substrate above 90% The steps include: polishing the first surface and the second surface by using at least one of a dermabrasion brush, nylon glue thread and polypropylene fiber respectively.
The manufacturing method of the cover plate according to claim 11, wherein in the step of polishing the first surface, the pressure is 25 kg-30 kg, and the time is 37 minutes-43 minutes; In the step of polishing the two surfaces, the pressure is 25 kg-30 kg, and the time is 57 minutes-63 minutes.
The method of manufacturing a cover plate according to claim 10, wherein the first surface and the second surface are polished to make the optical transmittance of the glass substrate above 90% After the step, before the step of forming an acid-resistant film on a partial area of the first surface and the second surface, the method further includes:

The step of polishing the first surface and the second surface using a sponge with a Rockwell hardness of 45°-50°.
The manufacturing method of the cover plate according to claim 13, wherein in the step of polishing the first surface with the sponge, the pressure is 25 kg-30 kg, and the time is 7 minutes-13 minutes; In the step of using the sponge to polish the second surface, the pressure is 25 kg-30 kg, and the time is 7 minutes-13 minutes.
The manufacturing method of the cover plate according to claim 13, wherein after the step of respectively polishing the first surface and the second surface using the sponge, the roughness of the first surface is 0.02 micrometers to 0.03 micrometers, and the roughness of the second surface is 0.02 micrometers to 0.03 micrometers.
The manufacturing method of the cover plate according to claim 10, wherein the glass substrate is curved glass, the first surface is convex, and the second surface is concave; The step of forming an acid-resistant film on both a partial area and the second surface includes: forming the acid-resistant film on the partial area of the first surface by screen printing; and spraying the second surface to form the acid-resistant film .
The manufacturing method of the cover plate according to claim 16, wherein in the step of forming the acid-resistant film by screen printing on the partial area of the first surface, the dimensional accuracy is ±0.05 mm, and the position accuracy It is ±0.08 mm.
The method of manufacturing a cover plate according to claim 10, wherein the step of etching the area of the first surface where the acid-resistant film is not formed to form a roughened area comprises:

Spraying an etching solution on the area where the acid-resistant film is not formed on the first surface of the glass substrate, so that the area where the acid-resistant film is not formed is raised to form the rough area, Wherein, the etching solution includes HF, sulfate and ammonium bifluoride.
The manufacturing method of the cover plate according to claim 10, wherein the roughness of the rough area is 0.3 μm-0.5 μm.
The method of manufacturing a cover plate according to claim 10, wherein after the step of etching the area of the first surface where the acid-resistant film is not formed to form a rough area, the removing Before the step of the acid-resistant film, it also includes a step of chemically polishing the glass substrate using a chemical polishing solution containing HF.
20. The method of manufacturing a cover plate according to claim 20, wherein in the step of chemically polishing the glass substrate with a chemical polishing liquid containing HF, the chemical polishing time is 1 minute to 1.5 minutes The mass percentage of HF in the chemical polishing liquid is 2%-3%.
The manufacturing method of the cover plate according to claim 20, wherein the chemical polishing liquid further includes H 2 SO 4 with a mass percentage of 10%-40%.
20. The manufacturing method of the cover plate according to claim 20, wherein after the step of chemically polishing the glass substrate with a chemical polishing liquid containing HF, the roughness of the rough area is 0.2 micrometers to 0.35 microns Micron, haze is 30%-40%.
The manufacturing method of the cover plate according to any one of claims 10-23, wherein in the step of removing the acid-resistant film, the processing temperature is below 70°C.
The method for manufacturing a cover plate according to any one of claims 10-23, wherein after the step of removing the acid-resistant film, it further comprises using a polishing solution containing HF to treat the first surface and the The second surface is chemically polished.
The manufacturing method of the cover plate according to claim 25, wherein the mass percentage of HF in the polishing liquid containing HF is 2%-4%, and the chemical polishing time is 2 minutes-4% minute.
25. The method for manufacturing a cover plate according to claim 25, wherein after the step of chemically polishing the first surface and the second surface with a polishing liquid containing HF, the roughness of the rough area The degree is 0.1 micron-0.2 micron, and the haze is 20%-30%.
The method for manufacturing a cover plate according to any one of claims 10-23, wherein after the step of removing the acid-resistant film, it further comprises arranging an increaser on the second surface of the glass substrate. The step of transmissive film, and the position of the antireflection film corresponds to the position of the partial area.
The manufacturing method of the cover plate according to claim 28, wherein the antireflection film comprises a multilayer titanium dioxide film and a multilayer silicon dioxide film, and the multiple layers of the titanium dioxide film and the multiple layers of the silicon dioxide film Alternately arranged, and one of the titanium dioxide films is arranged close to the second surface.
An electronic device, comprising a cover plate and a camera, the cover plate being the cover plate according to any one of claims 1-9 or the cover plate obtained by the method of manufacturing the cover plate according to any one of claims 10-29, The camera is arranged close to the side of the glass substrate far away from the first surface, the camera has a lens, and the position of the lens corresponds to the position of the region where the optical transmittance of the glass substrate is above 90% correspond.
An electronic device including:

battery;

A camera module, the battery can supply power to the camera module; and

A cover plate, the cover plate includes a glass substrate, the glass substrate has a first surface and a second surface opposite, the cover plate covers the battery and the camera module, and the second surface faces the Camera module; the first surface has a smooth area and a rough area, the optical transmittance of at least part of the smooth area is above 90%, the position of the camera and the optical transmittance of the glass substrate Corresponding to the location of more than 90% of the area.
The electronic device according to claim 31, wherein the cover plate further comprises an antireflection film, the antireflection film is disposed on the second surface, and the optical transmittance of the smooth area is 90% The above area is covered by the antireflection film.
The electronic device according to claim 32, wherein the antireflection film comprises a multilayer titanium dioxide film and a multilayer silicon dioxide film, the multiple layers of the titanium dioxide film and the multiple layers of the silicon dioxide film are alternately arranged, And one of the titanium dioxide films is disposed on the second surface.
The electronic device of claim 31, wherein the glass substrate is a curved glass, the first surface is a convex surface, and the second surface is a concave surface.