WO2020244732A1 - Procédé de traitement d'un revêtement sur un substrat flexible, dispositif à particules chargées pour le traitement d'un revêtement, et appareil de traitement d'un substrat flexible - Google Patents

Procédé de traitement d'un revêtement sur un substrat flexible, dispositif à particules chargées pour le traitement d'un revêtement, et appareil de traitement d'un substrat flexible Download PDF

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Publication number
WO2020244732A1
WO2020244732A1 PCT/EP2019/064369 EP2019064369W WO2020244732A1 WO 2020244732 A1 WO2020244732 A1 WO 2020244732A1 EP 2019064369 W EP2019064369 W EP 2019064369W WO 2020244732 A1 WO2020244732 A1 WO 2020244732A1
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WO
WIPO (PCT)
Prior art keywords
energy
coating
flexible substrate
linear source
kev
Prior art date
Application number
PCT/EP2019/064369
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English (en)
Inventor
Roland Trassl
Original Assignee
Applied Materials, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Applied Materials, Inc. filed Critical Applied Materials, Inc.
Priority to PCT/EP2019/064369 priority Critical patent/WO2020244732A1/fr
Publication of WO2020244732A1 publication Critical patent/WO2020244732A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/068—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using ionising radiations (gamma, X, electrons)
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
    • B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2252/00—Sheets
    • B05D2252/02—Sheets of indefinite length
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M7/00—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
    • B41M7/0081—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using electromagnetic radiation or waves, e.g. ultraviolet radiation, electron beams

Definitions

  • Embodiments of the present disclosure relate to methods, devices and apparatuses for processing of a flexible substrate, particularly treating a coating on a flexible substrate using charged particles.
  • embodiments of the present disclosure relate to methods, devices and apparatuses for treating a liquid monomer coating on a flexible substrate in vacuum conditions using an electron beam.
  • processing can include coating a flexible substrate with a desired material for a particular application.
  • materials used for coating flexible substrates can include polymers, dyes, metals, semiconductors or dielectric materials.
  • systems performing this task include a process drum for transporting the substrate through a processing region, e.g. in order to coat or print the substrate.
  • processing systems are typically referred to as rotary systems or roll-to-roll (R2R) systems.
  • a method of treating a coating on a flexible substrate includes providing a first beam of charged particles with a first energy El on the coating, providing a second beam of charged particles with a second energy on the coating, and providing a third beam of charged particles with a third energy E3 on the coating.
  • the third energy E3 is different from at least one of the first energy El and the second energy E2.
  • a charged particle device for treatment of a coating on a flexible substrate includes a first linear source for providing a first beam of charged particles with a first energy on the coating. Additionally, the charged particle device includes a second linear source for providing a second beam of charged particles with a second energy E2 on the coating. Further, the particle device includes a third linear source for providing a third beam of charged particles with a third energy E3 on the coating. The third energy E3 is different from at least one of the first energy El and the second energy E2.
  • an apparatus for processing of a flexible substrate includes a processing drum for guiding the flexible substrate. Additionally, the apparatus includes a printing arrangement for printing a coating on the flexible substrate. Further, the apparatus includes a charged particle device for treatment of the coating on the flexible substrate. The charged particle device includes a first linear source for providing a first beam of charged particles with a first energy on the coating. Additionally, the charged particle device includes a second linear source for providing a second beam of charged particles with a second energy E2 on the coating. Further, the particle device includes a third linear source for providing a third beam of charged particles with a third energy E3 on the coating. The third energy E3 is different from at least one of the first energy El and the second energy E2.
  • the apparatus for processing of a flexible substrate includes a charged particle device according to any embodiments described herein.
  • a method of manufacturing a device including a coated flexible substrate includes using a method of treating a coating on a flexible substrate.
  • the method of treating a coating on a flexible substrate includes providing a first beam of charged particles with a first energy El on the coating, providing a second beam of charged particles with a second energy on the coating, and providing a third beam of charged particles with a third energy E3 on the coating The third energy E3 is different from at least one of the first energy El and the second energy E2.
  • the method of manufacturing a device including a coated flexible substrate includes using a charged particle device for treatment of a coating on a flexible substrate.
  • the charged particle device includes a first linear source for providing a first beam of charged particles with a first energy on the coating. Additionally, the charged particle device includes a second linear source for providing a second beam of charged particles with a second energy E2 on the coating. Further, the particle device includes a third linear source for providing a third beam of charged particles with a third energy E3 on the coating. The third energy E3 is different from at least one of the first energy El and the second energy E2.
  • the method of manufacturing a device including a coated flexible substrate includes using at least one of the method of treating a coating on a flexible substrate according to any embodiments described herein and the charged particle device according to any embodiments described herein.
  • Embodiments are also directed at apparatuses for carrying out the disclosed methods and include apparatus parts for performing the described method aspect. These method aspects may be performed by way of hardware components, a computer programmed by appropriate software, by any combination of the two or in any other manner. Furthermore, embodiments according to the disclosure are also directed at methods for operating the described apparatus. The methods for operating the described apparatus include method aspects for carrying out every function of the apparatus.
  • FIG. 1 shows a schematic representation for illustrating a method of treating a coating on a flexible substrate according to embodiments described herein;
  • FIGS. 2 to 5 show schematic representations for illustrating a method of treating a coating on a flexible substrate according to further embodiments described herein;
  • FIGS. 6 A and 6B show flowcharts for illustrating a method of treating a coating on a flexible substrate according to embodiments described herein;
  • FIG. 7 shows a diagram for illustrating an exemplary energy dose distribution in a coating by employing the method of treating a coating according to embodiments described herein;
  • FIG. 8 shows a schematic view of a charged particle device for treatment of a coating on a flexible substrate according to embodiments described herein;
  • FIG. 9 shows a schematic view of a charged particle device for treatment of a coating on a flexible substrate according to further embodiments described herein;
  • FIG. 10 shows a schematic view of a linear source according to embodiments described herein;
  • FIG. 11 shows a schematic view of an apparatus for processing of a flexible substrate according to embodiments described herein.
  • FIG. 12 shows a flowchart for illustrating a method of manufacturing a device including a coated flexible substrate according to embodiments described herein.
  • the method includes providing a first beam 111 of charged particles with a first energy Ei on the coating 11. Additionally, the method includes providing a second beam 112 of charged particles with a second energy on the coating 11. Further, the method includes providing a third beam 113 of charged particles with a third energy E on the coating 11. The third energy E 3 is different from at least one of the first energy Ei and the second energy E 2 . [13] Accordingly, it is to be understood that the energy dose applied to the coating can be adjusted, particularly by selecting the first energy Ei, the second energy E2, and the third energy E .
  • the method of treating a coating on a flexible substrate as described herein beneficially provides for improved curing of the coating.
  • the energy absorption in the coating e.g. for curing and/or polymerization of the coating
  • embodiments of the method of treating a coating as described herein provide for improved curing quality, e.g. in terms of curing homogeneity.
  • the method of treating a coating as described herein is particularly well suited for curing and/or polymerizing coatings having a coating thickness of less than 1 pm, particularly less than 0.5 pm, or even less than 0.3 pm.
  • embodiments of the method of treating a coating as described herein can also be used for curing and/or polymerizing coatings having a coating thickness of more than 1 pm.
  • the curing and/or polymerization efficiency can be optimized for a particular selected coating thickness.
  • the curing speed and/or polymerization speed of coatings can be increased.
  • embodiments of the method of treating a coating as described herein provide for a reduction of curing time and/or polymerization time.
  • embodiments of the present disclosure beneficially provide for improved curing and/or polymerization of thin coatings (e.g. coatings with a coating thickness of less than 1 pm, particularly a coating thickness of less than 0.5 pm) while curing time and/or polymerization time can be reduced, such that the overall process costs can be decreased.
  • thin coatings e.g. coatings with a coating thickness of less than 1 pm, particularly a coating thickness of less than 0.5 pm
  • the method of treating the coating on the flexible substrate may include moving the flexible substrate in a transport direction T.
  • moving the flexible substrate may include moving the flexible substrate at a speed v s of 1 m/s ⁇ v s ⁇ 15 m/s, particularly 2 m/s ⁇ v s ⁇ 10 m/s, more particularly 3 m/s ⁇ v s ⁇ 7 m/s, e.g.
  • the speed v s at which the flexible substrate is moved can be 12 m/s ⁇ v s ⁇ 15 m/s.
  • the speed for moving the flexible substrate can be increased.
  • a“coating” can be understood as a layer or film provided on a substrate as described herein.
  • the coating can be a liquid coating provided on the substrate.
  • the coating is a monomer coating, particularly a liquid monomer coating.
  • the coating can be a liquid acrylic monomer coating.
  • the coating has a coating thickness T c of 0.1 pm ⁇ T c ⁇ 1.0 pm, particularly 0.1 pm ⁇ T c ⁇ 0.7 pm, more particularly 0.1 pm ⁇ T c ⁇ 0.5 pm.
  • the coating may have a coating thickness T c of more than 1.0 pm, e.g. 1.0 pm ⁇ T c ⁇ 10 pm.
  • a“flexible substrate” may be characterized in that the substrate is bendable.
  • the flexible substrate may be a foil or a web.
  • embodiments as described herein can be utilized for processing any kind of flexible substrates, e.g. for manufacturing coatings or electronic devices on flexible substrates.
  • a substrate as described herein may include materials like PET, HC-PET, PE, PI, PU, OPP, CPP, PLA, PHA, TaC, one or more metals, paper, combinations thereof, and already coated substrates like Hard Coated PET (e.g. HC-PET, HC-TAC) and the like.
  • the flexible substrate is a polymeric flexible substrate.
  • charged particles can be understood as particles with an electric charge.
  • charged particles can be ions or electrons.
  • the charged particles are electrons.
  • the method of treating the coating 11 on the flexible substrate 10 further includes at least partially superimposing the first beam 111, the second beam 112 and the third beam 113.
  • the first beam 111 with the first energy Ei can be at least partially superimposed with the second beam 112 with the second energy E2.
  • FIG. 1 shows that the second beam 112 with the second energy E2 can be at least partially superimposed with the third beam 113 with the third energy E .
  • the individual beams i.e.
  • the first beam 111, the second beam 112 and the third beam 113) of charge particles may have a cone-like shape.
  • the cone-like shape can be substantially symmetric with respect to a main direction of the respective beam.
  • the first main direction 11M of the first beam 111, the second main direction 12M of the second beam 112, and the third main direction 13M of the third beam 113 are indicated.
  • the first beam 111, the second beam 112 and the third beam 113 can be separated. In other words, the first beam 111, the second beam 112 and the third beam 113 may not be superimposed.
  • the first beam 111 with the first energy Ei can be at least partially superimposed with the second beam 112 with the second energy E 2 as well as with the third beam 113 with the third energy E 3 .
  • the second beam 112 with the second energy E can be at least partially superimposed with the first beam 111 with the first energy Ei as well as with the third beam 113 with the third energy E 3 .
  • the third beam 113 with the third energy E 3 can be at least partially superimposed with the first beam 111 with the first energy Ei as well as with the second beam 112 with the second energy E .
  • the first beam 111, the second beam 112 and the third beam 113 may be inclined towards each other, such that the first beam 111, the second beam 112 and the third beam 113 are at least partially superimposed with each other.
  • the first beam 111 has a first main direction 11M
  • the second beam 112 has a second main direction 12M
  • the third beam 113 has a third main direction 13M.
  • a first inclination angle (X12 may be provided between the first main direction 11M and the second main direction 12M.
  • the first inclination angle (X12 can be 2° ⁇ (X12 £ 60°, particularly 5° ⁇ cq 2 £ 45°, more particularly 10° ⁇ a £ 30°.
  • a second inclination angle a 23 may be provided between the second main direction 12M and the third main direction 13M.
  • the second inclination angle (X 23 can be 2° ⁇ ⁇ 3 ⁇ 4 ⁇ 60°, particularly 5° ⁇ a 23 ⁇ 45°, more particularly 10° ⁇ a 23 ⁇ 30°.
  • the absolute value of the first inclination angle ai 2 corresponds to the absolute value of the second inclination angle a 23.
  • coatings with a coating thickness of less than 1 pm, particularly a coating thickness of equal to or less than 0.5 pm), e.g. with respect to a reduction of curing/ polymerization time, curing/ polymerization homogeneity and curing/ polymerization quality. It is to be understood that the values for the first energy Ei, the second energy E 2 , and the third energy E can be adjusted according to the material employed for the coating and/or according to the thickness of the coating.
  • moving the flexible substrate in the transport direction T may include using a processing drum 310.
  • the processing drum 310 is configured for guiding the flexible substrate.
  • a “processing drum” can be understood as a drum or a roller having a substrate support surface for contacting the flexible substrate.
  • the processing drum can be rotatable about a rotation axis 311 in a rotation direction R, as exemplarily indicated in FIG. 3.
  • the processing drum includes a substrate guiding region.
  • the substrate guiding region is a curved substrate support surface, e.g. a cylindrically symmetric surface, of the processing drum.
  • the curved substrate support surface of the processing drum may be adapted to be (at least partly) in contact with the flexible substrate during guiding of the flexible substrate.
  • the method of treating the coating 11 on the flexible substrate 10 further includes providing a fourth beam 114 of charged particles with a fourth energy E 4 on the coating 11.
  • the fourth energy E 4 is different from at least one of the first energy Ei, the second energy E 2 and the third energy E 3 . Accordingly, the curing/ polymerization quality of the coating can further be improved.
  • the method of treating the coating 11 on the flexible substrate 10 further includes at least partially superimposing the fourth beam 114 with at least one of the first beam 111, the second beam 112 and the third beam 113.
  • the fourth beam 114 with the fourth energy E 4 may be at least partially superimposed with the third beam 113 of third energy E 3 .
  • the fourth beam 114 may additionally or alternatively be superimposed with the first beam 111 and/or the second beam 112.
  • the fourth beam 114 may be separated from the first beam 111, the second beam 112 and the third beam 113. In other words, the fourth beam 114 may not be superimposed with one or more of the first beam 111, the second beam 112 and the third beam 113.
  • the first beam 111 with the first energy Ei can be at least partially superimposed with the second beam 112 with the second energy E 2 as well as with the third beam 113 with the third energy E 3 and the fourth beam 114 with the fourth energy E 4 .
  • the second beam 112 with the second energy E can be at least partially superimposed with the first beam 111 with the first energy Ei as well as with the third beam 113 with the third energy E and the fourth beam 114 with the fourth energy E 4 .
  • the third beam 113 with the third energy E 3 can be at least partially superimposed with the first beam 111 with the first energy Ei as well as with the second beam 112 with the second energy E 2 and the fourth beam 114 with the fourth energy E 4 .
  • the first beam 111, the second beam 112, the third beam 113 and the fourth beam 114 may be inclined towards each other, such that the first beam 111, the second beam 112, the third beam 113 and the fourth beam 114 can be at least partially superimposed with each other.
  • the fourth beam 114 has a fourth main direction 14M.
  • a third inclination angle 0 34 may be provided between the third main direction 13M and the fourth main direction 14M.
  • the third inclination angle (X34 can be 2° ⁇ 0. 34 ⁇ 60°, particularly 5° ⁇ (X34 ⁇ 45°, more particularly 10° ⁇ (X34 ⁇ 30°.
  • the absolute value of the third inclination angle (X34 corresponds to the absolute value of the first inclination angle (X12 and/or to the absolute value of the second inclination angle (X23.
  • FIGS. 6A and 6B show flowcharts for illustrating a method 160 of treating a coating on a flexible substrate according to embodiments of the present disclosure.
  • Block 161 in FIGS. 6 A and 6B represents providing a first beam 111 of charged particles with a first energy El on the coating 11, as described herein.
  • Block 162 in FIGS. 6 A and 6B represents providing a second beam 112 of charged particles with a second energy E2 on the coating 11, as described herein.
  • Block 163 in FIGS. 6 A and 6B represents providing a third beam 113 of charged particles with a third energy E3 on the coating 11, as described herein.
  • 6B represents providing a fourth beam 114 of charged particles with a fourth energy E4 on the coating 11, as described herein. It is to be understood that typically the flexible substrate is moved in a transport direction while the first beam 111 and/or the second beam 112 and/or the third beam 113 and or the fourth beam 114 are provided on the coating 11 on the flexible substrate 10.
  • embodiments of the present disclosure are not limited to three or four sources for providing respective beams of charged particles with respective energies on the coating.
  • the embodiments described herein are for explanation of the concept of the method of treating a coating on a flexible substrate, the charged particle device for treatment of a coating on a flexible substrate, and the apparatus for processing of a flexible substrate as described herein. Accordingly, it is to be understood that more than four sources (i.e. a multitude of more than four sources) for providing respective beams of charged particles with a respective energies on the coating can be implemented.
  • FIG. 7 shows a diagram for illustrating an exemplary energy dose distribution in a coating by employing a method of treating a coating according to embodiments described herein.
  • FIG. 7 shows the normalized energy dose as a function of penetration depth x.
  • the first curve Cl represents the energy dose distribution in the coating and the substrate resulting by conducting the method as described herein with a first energy Ec of E
  • the variation of the electron energies changes the penetration depth of the electrons into the material to be cured and hence can be optimized to deposit the energy precisely where the curing is supposed to happen.
  • the area under the respective curves for 0 nm ⁇ x ⁇ 500 nm reflects the dose, i.e. the amount of energy deposited in the mass of the coating, and is higher for the first curve Ci compared to the second curve C 2 .
  • FIG. 7 only shows a non-limiting example for illustrating the advantage of the embodiments of the present disclosure.
  • the energy dose absorption in the coating can be increased, such that curing and/or polymerization of the coating can be improved.
  • the charged particle device 100 includes a first linear source 110 for providing a first beam 111 of charged particles with a first energy El on the coating 11. Additionally, the charged particle device 100 includes a second linear source 120 for providing a second beam 112 of charged particles with a second energy E2 on the coating 11. Further, the charged particle device 100 includes a third linear source 130 for providing a third beam 113 of charged particles with a third energy E3 on the coating 11.
  • each of the first linear source 110, the second linear source 120 and the third linear source 130 is a source for forming a beam of charged particles for the treatment of the coating on the substrate moving along a transport direction T.
  • a“linear source” as described herein is an electron source.
  • the charged particle device may be used in polymerization reactions that may, for example, form polymer films on flexible substrates.
  • the charged particle device can be used for polymerization of a monomer coating as described herein.
  • the first linear source 110 has a first slit opening 115 extending along a length L of the first linear source 110.
  • the second linear source 120 has a second slit opening 125 extending along a length L of the second linear source 120.
  • the third linear source 130 has a third slit opening 135 extending along a length L of the third linear source 130.
  • the length L of the first linear source is substantially equal to the length L of the second linear source and/or the length of the third linear source.
  • the first slit opening 115, the second slit opening 125, and the third slit opening 135 are substantially parallel.
  • typically a slit opening as described herein has a width W.
  • the length of a slit opening as described herein is at least 80% of the length L of a linear source as described herein, particularly at least 90% of the length L of a linear source as described herein.
  • the aspect ratio AR of the width of the slit opening as described herein to the length of the slit opening as described herein is AR ⁇ 1/5, particularly AR ⁇ 1/10, more particularly AR ⁇ 1/20.
  • the first slit opening 115, the second slit opening 125, and the third slit opening 135 are inclined towards each other.
  • the first linear source 110, the second linear source 120 and the third linear source can be arranged such that the first slit opening 115 provides for a first main direction 11M, the second slit opening 125 provides for second main direction 12M, and the third slit opening 135 provides for a third main direction 13M, as exemplarily described with reference to FIG. 2.
  • the charged particle device includes a fourth linear source 140 for providing a fourth beam 114 of charged particles with a fourth energy E4 on the coating 11.
  • the fourth energy E4 is different from at least one of the first energy El, the second energy E2 and the third energy E3.
  • the fourth linear source 140 has a fourth slit opening 145 extending along a length of the fourth linear source 140.
  • the fourth slit opening 145 is substantially parallel to the first slit opening 115, the second slit opening 125, and the third slit opening 135.
  • the fourth slit opening 145 can be inclined to at least one of the first slit opening 115, the second slit opening 125, and the third slit opening 135.
  • the fourth linear source 140 can be arranged such that the fourth slit opening 145 provides for a fourth main direction 14M, as exemplarily described with reference to FIG. 5.
  • linear source 200 according to embodiments of the present disclosure is described. It is to be understood that features described with reference to the linear source shown in FIG. 10 may apply to the first linear source 110 and/or the second linear source 120 and/or the third linear source 130 and/or the and/or the fourth linear source 140, as described herein.
  • FIG. 10 shows a section of a linear source 200 for providing a beam of charged particles for treatment of a coating on a flexible substrate treatment.
  • the section shown in FIG. 10 is in a cross-section along a direction, which is perpendicular to a longitudinal axis of the linear source.
  • the longitudinal axis of the linear source may be defined as the direction into and out of the page.
  • the linear source 200 may include a housing 210.
  • the housing 210 may provide a first electrode.
  • the first electrode may be the anode, which may optionally be grounded.
  • the housing 210 may have a back wall 212 and a front wall 214.
  • the front wall 214 and the back wall 212 of the housing 210 may be connected to each other via a first side wall 211 and a second side wall 213.
  • the first side wall 211 and the second side wall 213 may be arranged parallel to each other.
  • the front wall 214 of the housing 210 includes an extraction aperture, which may also be referred to as slit opening 216.
  • the slit opening 216 may be adapted for enabling a beam of charged particles passing from the inside of the housing to the outside of the housing.
  • the slit opening 216 may divide the front wall 214 of the housing 210 into a first front wall portion 215 and a second front wall portion 217.
  • the first front wall portion 215 and the second front wall portion 217 may be symmetric with respect to the line of symmetry 201 defined as a plane dividing the linear source 200 into equal halves.
  • the line of symmetry 201 may be perpendicular to the back wall 212 of the housing 210 of the linear source 200.
  • the slit opening 216 typically extends along the length direction of the linear source 200.
  • the length direction of the linear source 200 may be described as the direction into or out of the page.
  • the front wall 214 of the housing 210 including the first front wall portion 215 and/or the second front wall portion 217 may be configured to be arranged towards a second electrode 220.
  • the first front wall portion 215 and/or the second front wall portion 217 may be inclined towards the second electrode 220, particularly with an inclination having a first end of the front wall portion adjacent to the slit opening closer to the cathode as compared to an opposing end of the respective front wall portion.
  • the linear source 200 may include at least one connection element selected from the group consisting of: a connection element for electrical power, a connection element for a gas, and a connection element for a cooling fluid.
  • the second electrode 220 may be arranged within the housing 210.
  • the second electrode may be the cathode and may include materials with a low sputter rate but a high secondary electron co-efficient such as, for example, graphite and carbon fibre composites (CFC).
  • CFC carbon fibre composites
  • the second electrode may extend in a direction parallel to the length direction of the linear source.
  • the second electrode 220 has at least a first side 222 facing the slit opening 216 of the housing 210 (i.e. the first side of the second electrode may also be referred to as a front side of the second electrode).
  • the first side 222 may be curved.
  • the curvature of the first side 222 may increase the extraction efficiency of the linear source 200.
  • the first side 222 may be curved away from the slit opening 216 and be referred to as a concave first side, which may increase the surface area of the second electrode 220 and which may help to focus the beam of charged particles emitted from the second electrode towards the slit opening 216.
  • the second electrode 220 may also have a second side 224 facing the back wall 212 of the housing 210 (i.e. the second side of the second electrode may also be referred to as a rear side of the second electrode).
  • the second electrode 220 has one or more beam shaping extensions 225.
  • the one or more beam shaping extensions 225 protrude from the second electrode 220 in a direction towards the front wall 214 of the housing 210.
  • the second electrode including the beam shaping protrusions may have a U-shape or C-shape form.
  • the one or more beam shaping extensions may extend in a direction parallel to the longitudinal direction of the second electrode 220.
  • the second electrode may include a single beam shaping extension, two beam shaping extensions or a plurality of beam shaping extensions.
  • the one or more beam shaping extensions 225 may be configured to guide a charged particle beam emanating from the second electrode 220 through the slit opening 216 in order to further increase the extraction efficiency of the linear source 200.
  • the one or more beam shaping extensions may be adapted such that during operation, electric field lines are formed between the one or more beam shaping extensions 225 and the housing 210 of the linear source 200 guide electrons, which are generated by the interaction of ions from the plasma with the second electrode 220, towards the slit opening 216.
  • An exemplary trajectory of the beam of charged particles including the Coulomb repulsion of electrons by space charge is illustrated in FIG. 10 (see reference number 205).
  • the second electrode 220 of the linear source 200 may include a first beam shaping extension and a second beam shaping extension.
  • the first beam shaping extension and the second beam shaping extension may be arranged at opposite ends of the second electrode 220.
  • the first beam shaping extension and/or the second beam shaping extension may be integrally formed with the second electrode or be manufactured separately and connected to the second electrode during assembly of the second electrode.
  • the one or more beam shaping extensions 225 of the second electrode 220 may be arranged to be spaced away from the first side wall 211 and the second side wall 213 of the housing 210 respectively.
  • the second electrode 220 may also be spaced away from the back wall 212 of the housing 210. Accordingly, a dark space may be formed between the beam shaping extensions 225 and the interior surfaces of the housing 210.
  • the dark space may prevent plasma generation, which may increase the energy efficiency of the linear source 200 due to reducing the formation of plasma in unwanted spaces within the housing 210 of the linear source 200.
  • a further advantageous effect of the dark space, which contributes to the overall improved energy efficiency of the linear source 200, may be to prevent energy loss due to excessive heating of the housing 210.
  • the linear source 200 may include a cooling system 250 for cooling the housing 210, which may further improve the energy efficiency of the linear source 200.
  • the cooling system 250 can include at least one passageway to accommodate a cooling fluid.
  • the cooling system 250 may be arranged to cool the back wall 212 of the housing 210.
  • the cooling system may further be configured to cool at least one of the first side wall 211, second side wall 213 and front wall 214 of the housing 210.
  • the apparatus 300 includes a processing drum 310 for guiding the flexible substrate. Additionally, the apparatus 300 includes a printing arrangement 320 for printing a coating on the flexible substrate. Further, the apparatus 300 includes a charged particle device 100 for treatment of the coating 11 on the flexible substrate 10.
  • the charged particle device 100 is a charged particle device 100 according to any embodiments described herein.
  • the printing arrangement 320 may include a supply device 321 for supplying a liquid coating material.
  • the supply device 321 can be a monomer reservoir.
  • the printing arrangement 320 may include a first roller 322 (e.g. an anilox roller) and a second roller 324 (e.g. a transfer roller).
  • the first roller 322 may be arranged parallel to the processing drum 310 and the second roller 324.
  • the flexible substrate may be transported during processing, e.g. coating or printing of the flexible substrate. Accordingly, it is to be understood that the liquid coating material can be applied to the surface of the first roller 322, e.g.
  • the printing arrangement 320 includes a doctor blade assembly 323 having at least one elongated doctor blade extending in a parallel direction to the rotation axis of the first roller 322.
  • the method 400 of manufacturing a device including a coated flexible substrate includes using the method of treating a coating 11 on a flexible substrate 10 according to any embodiments described herein (represented by block 410 in FIG. 12). Additionally or alternatively, the method 400 of manufacturing a device including a coated flexible substrate includes using a charged particle device 100 according to any embodiments described herein (represented by block 420 in FIG. 12).
  • embodiments of the present disclosure beneficially provide for improved curing and/or polymerization of a coating.
  • embodiments of the present disclosure provide for an optimized energy absorption in the coating, e.g. for curing and/or polymerization of the coating, such that curing quality can be improved, e.g. in terms of curing homogeneity.
  • embodiments of the present disclosure are particularly well suited for curing and/or polymerizing coatings having a coating thickness of less than 1 pm, more particularly less than 0.5 pm.
  • the curing speed and/or polymerization speed of coatings can be increased, such that beneficially a reduction of curing time and/or polymerization time can be provided. Accordingly, beneficially the overall process costs can be decreased.

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Abstract

Procédé de traitement d'un revêtement (11) sur un substrat flexible (10). Le procédé consiste à fournir un premier faisceau (111) de particules chargées avec une première énergie E1 sur le revêtement (11), à fournir un deuxième second faisceau (112) de particules chargées avec une deuxième énergie E2 sur le revêtement (11), et à fournir un troisième faisceau (113) de particules chargées avec une troisième énergie E3 sur le revêtement (11). La troisième énergie E3 est différente de la première énergie E1 et de la deuxième énergie E2. En outre, l'invention concerne un dispositif à particules chargées pour le traitement d'un revêtement sur un substrat flexible et un appareil pour le traitement d'un substrat flexible.
PCT/EP2019/064369 2019-06-03 2019-06-03 Procédé de traitement d'un revêtement sur un substrat flexible, dispositif à particules chargées pour le traitement d'un revêtement, et appareil de traitement d'un substrat flexible WO2020244732A1 (fr)

Priority Applications (1)

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PCT/EP2019/064369 WO2020244732A1 (fr) 2019-06-03 2019-06-03 Procédé de traitement d'un revêtement sur un substrat flexible, dispositif à particules chargées pour le traitement d'un revêtement, et appareil de traitement d'un substrat flexible

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PCT/EP2019/064369 WO2020244732A1 (fr) 2019-06-03 2019-06-03 Procédé de traitement d'un revêtement sur un substrat flexible, dispositif à particules chargées pour le traitement d'un revêtement, et appareil de traitement d'un substrat flexible

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1286824A (en) * 1968-08-29 1972-08-23 British Iron Steel Research Formation of polymer coatings on substrates
US3846149A (en) * 1969-06-13 1974-11-05 Conservatome Methods,means and compositions for painting objects
US4210701A (en) * 1972-08-14 1980-07-01 Precision Thin Film Corporation Method and apparatus for depositing film on a substrate, and products produced thereby
WO1999052650A1 (fr) * 1998-04-11 1999-10-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Procede pour bombarder electroniquement des couches appliquees sur des surfaces d'objets, et dispositif pour mettre en oeuvre ledit procede
EP2168691A1 (fr) * 2008-09-26 2010-03-31 Camvac Limited Revêtements durcis par rayonnement
WO2016070939A1 (fr) * 2014-11-07 2016-05-12 Applied Materials, Inc. Appareil et procédé pour le traitement de substrats souples à l'aide d'un faisceau d'électrons
US20160176227A1 (en) * 2005-03-24 2016-06-23 Richard Lavosky Electron-beam coating device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1286824A (en) * 1968-08-29 1972-08-23 British Iron Steel Research Formation of polymer coatings on substrates
US3846149A (en) * 1969-06-13 1974-11-05 Conservatome Methods,means and compositions for painting objects
US4210701A (en) * 1972-08-14 1980-07-01 Precision Thin Film Corporation Method and apparatus for depositing film on a substrate, and products produced thereby
WO1999052650A1 (fr) * 1998-04-11 1999-10-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Procede pour bombarder electroniquement des couches appliquees sur des surfaces d'objets, et dispositif pour mettre en oeuvre ledit procede
US20160176227A1 (en) * 2005-03-24 2016-06-23 Richard Lavosky Electron-beam coating device
EP2168691A1 (fr) * 2008-09-26 2010-03-31 Camvac Limited Revêtements durcis par rayonnement
WO2016070939A1 (fr) * 2014-11-07 2016-05-12 Applied Materials, Inc. Appareil et procédé pour le traitement de substrats souples à l'aide d'un faisceau d'électrons

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
LEONHARDT D ET AL: "Plasma enhanced surface treatments using electron beam-generated plasmas", SURFACE AND COATINGS TECHNOLOGY, ELSEVIER BV, AMSTERDAM, NL, vol. 188-189, 1 November 2004 (2004-11-01), pages 299 - 306, XP027184833, ISSN: 0257-8972, [retrieved on 20041115] *

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