WO2020206826A1

WO2020206826A1 - Ultra-thin atomic force microscope head

Info

Publication number: WO2020206826A1
Application number: PCT/CN2019/089280
Authority: WO
Inventors: 吴森; 卢念航; 胡晓东
Original assignee: 天津大学
Priority date: 2019-04-09
Filing date: 2019-05-30
Publication date: 2020-10-15
Also published as: CN110045153B; CN110045153A

Abstract

An ultra-thin atomic force microscope head. The atomic force microscope head employs an ultra-thin probe fixing module (I). The probe fixing module (I) comprises a cantilever probe (1), piezoelectric ceramic (2), a probe holder (3), a first reflecting surface (4), a first reflecting unit, and a second reflecting unit. The cantilever probe (1) is mounted in the probe holder (3), and the tip of the cantilever probe (1) is located at the lowest portion of the probe fixing module (I). The first reflecting surface (4) is located on one side of the cantilever probe (1). The first reflecting unit is located between the cantilever probe (1) and the first reflecting surface (4). The second reflecting unit is located between the cantilever probe (1) and a laser. A third laser beam is reflected by the second reflecting unit and then is emitted from the probe fixing module (I) to form a fourth laser beam. The Z-direction effective thickness of the probe fixing module (I) in the atomic force microscope head is only several millimeters, and therefore, the atomic force microscope head can be directly mounted below an optical or electron microscope having a working distance greater than the thickness to achieve integrated combination of different devices.

Description

An ultra-thin atomic force microscope probe

Technical field

The invention belongs to the technical field of atomic force microscopes, and in particular relates to a probe fixing module with an ultra-thin thickness in the vertical direction and an atomic force microscope probe based on the probe fixing module.

Background technique

The emergence of atomic force microscopes in the 1980s allowed people to break through the limitations of the diffraction limit on traditional optical microscopes, and to realize the three-dimensional characterization of various materials with sub-nanometer resolution. Not only that, this technology can also perform in-situ detection of material physical properties and even atomic-level manipulation and processing. After more than 30 years of development, atomic force microscopes have been widely used in the semiconductor industry, new materials, life sciences and other fields, and are one of the necessary tools for micro- and nano-scale scientific research.

The integration of different types of detection devices to achieve in-situ multi-physics detection is one of the important trends in the development of the current instrument industry. The combination of atomic force microscope and various optical microscopes and electron microscopes can perform in-situ high-resolution characterization of morphology, composition and physical and chemical properties, and can significantly improve detection efficiency. It has very broad application prospects in life sciences, microelectronics and other fields. However, due to the limitation of the size of the structure, there are certain technical difficulties in integrating the atomic force microscope with other types of microscopes.

The current mainstream atomic force microscope systems generally use micro cantilever probes to sense samples. When the probe is scanned on the surface of the sample, the force between the tip and the sample causes the micro cantilever to bend and deform. This small deformation is caused by the optical lever in the probe. The optical path is amplified and converted into electrical signals by the photodetector. As the core part of the atomic force microscope, the probe is usually large in size, and its thickness in the Z direction can reach several centimeters. The working distance between the electron microscope and the optical microscope (the distance between the exit of the electron gun or the lower surface of the optical objective lens and the sample) is generally only a few millimeters to ten millimeters, which makes it difficult for the existing atomic force microscope probe devices to be directly integrated into the electron microscope and optical microscope. On the workbench. Most of the existing atomic force microscope-electron microscope combined systems on the market use self-inducing tuning fork probes or piezoresistive probes. This type of probe does not require an additional detection light path and occupies a small space, but it is susceptible to interference in the atmospheric environment and has many application restrictions. In recent years, the atomic force microscope-Raman/fluorescence microscope combination equipment introduced by some companies mostly adopts an inverted optical microscope system. This solution can avoid the mechanical interference between the optical microscope and the atomic force probe in structure, but the disadvantage is that it can only detect Transparent sample.

The volume of the atomic force probe mainly depends on the design of the optical lever optical path. The existing optical lever optical path can be roughly divided into several typical forms as shown in Figures 1 to 4. In the light path shown in Figures 1 and 2, the laser beam passes through the right-angle prism 20 or lens group 23 and strikes the cantilever probe vertically downwards along the Z direction. The light reflected by the cantilever beam passes through one or more plane mirrors 21. Reflected on the photodetector. For atomic force microscopes using this type of optical path, optical microscopes can be installed above or on the side. However, in order not to mechanically interfere with the optical components in the optical path of the optical lever, a low-power objective lens with a long working distance must be used. In the optical path shown in Figure 3, the optical lever and the optical microscope optical path share an objective lens. The optical lever laser beam is focused on the probe cantilever beam through the objective lens. The reflected light of the cantilever beam is collected by the objective lens and converted into parallel light, and then passes through The polarization beam splitter 24 and other elements located above the objective lens are projected onto the photodetector (the optical path between the objective lens and the polarization beam splitter is provided with a dichroic mirror 22 and a quarter wave plate 25). This form of optical path can minimize the space occupied by the atomic force probe, allowing the use of high magnification objectives with large numerical apertures and short working distances. However, due to the need to couple the optical lever optical path to the optical microscope, the atomic force probe cannot be integrated with a packaged commercial optical system. In addition, in the solutions shown in Figures 1 to 3, optical elements are arranged directly above the probe and the sample, which will hinder the propagation of the electron beam, so these three types of atomic force probes are not suitable for integration with an electron microscope. In the structure shown in Figure 4, the laser beam is incident on the probe obliquely, and the reflected light is symmetrically emitted to the photodetector. The advantage of this design is that the area directly above the probe is released, which can be installed with either an optical microscope or an electron microscope or other types of equipment. However, in order to prevent the laser beam from being blocked by the optical objective lens housing or the electron microscope pole piece, the laser beam must be directed toward the cantilever probe with a large inclination angle. When the inclination angle is too large, the shape and intensity of the reflected light spot on the cantilever beam will deteriorate, which will affect the output signal quality of the photodetector. Therefore, the atomic force probe in Figure 4 can only be used for low magnification systems with long working distances.

As mentioned above, the existing several optical path forms make the Z-direction of the probe part of the atomic force microscope occupy too much space, which is not conducive to the integration of optical microscopes (especially upright high-power optical microscopes), electron microscopes and other equipment. In order to reduce the volume of the atomic force probe and make it have better compatibility and integration, it is necessary to design a new type of probe structure with a more compact vertical (Z-direction) size.

Summary of the invention

Aiming at the problem that the atomic force microscope is difficult to integrate with other types of equipment due to its size, the purpose of the present invention is to provide a probe fixing module which can reduce the Z-direction thickness of the probe of the atomic force microscope.

Another object of the present invention is to provide an atomic force microscope probe, which is based on the above-mentioned probe fixing module and can be directly installed on the workbench of high-power optical microscopes, electron microscopes and other equipment without affecting the original equipment's own functions And performance indicators.

The purpose of the present invention is achieved through the following technical solutions.

A probe fixing module, comprising: a cantilever beam probe, a piezoelectric ceramic, a probe holder, a first reflection surface, a first reflection device and a second reflection device, the cantilever beam probe is mounted on the probe holder In the holder, the tip of the cantilever beam probe is located at the lowest point of the probe fixing module, and the first reflective surface is located on one side of the cantilever beam probe for receiving the cantilever beam probe on the other side. The first laser beam emitted by the laser reflects the first laser beam to form a second laser beam, and the acute angle between the first reflective surface and the first laser beam is 60°-67.5°; The reflection device is located between the cantilever beam probe and the first reflection surface, and the second laser beam is reflected by the first reflection device and irradiated on the cantilever beam probe and reflected by the cantilever beam probe to form a third laser beam The second reflecting device is located between the cantilever beam probe and the laser, the third laser beam is reflected by the second reflecting device and then emitted from the probe fixing module to form a fourth laser bundle.

In the above technical solution, the first reflecting device is a second reflecting surface parallel to the first laser beam, and the second reflecting surface and the cantilever probe are respectively located on both sides of the first laser beam and the second The mirror surface of the reflecting surface faces the first laser beam, and the second laser beam is reflected by the second reflecting surface and irradiated on the cantilever beam probe.

In the above technical solution, the first reflective device is a first reflective structure and a second reflective structure, and the first reflective structure is one reflective surface or multiple reflective surfaces located on the same plane and the number is greater than one, so The second reflective structure is one reflective surface or multiple reflective surfaces located on the same plane and the number is greater than one, and the first reflective structure and the second reflective structure are parallel to each other and mirror-faced.

In the above technical solution, the second reflecting device is a fourth reflecting surface parallel to the first laser beam, and the fourth reflecting surface and the cantilever probe are respectively located on both sides of the first laser beam and the fourth reflecting surface The mirror surface of the reflecting surface faces the first laser beam, and the third laser beam is reflected by the fourth reflecting surface to form the fourth laser beam.

In the above technical solution, the second reflecting device is a third reflecting structure and a fourth reflecting structure, and the third reflecting structure is one reflecting surface or a plurality of reflecting surfaces located on the same plane and the number is greater than 1, so The fourth reflective structure is one reflective surface or multiple reflective surfaces located on the same plane and the number is greater than one, and the third reflective structure and the fourth reflective structure are parallel to each other and mirror-faced.

In the above technical solution, a light through hole is formed between the first reflecting device and the second reflecting device for passing through the imaging light path.

In the above technical solution, it further includes: a first adjustment frame mounted with the first reflection surface, for adjusting the angle between the first reflection surface and the first laser beam.

In the above technical solution, it further includes: piezoelectric ceramics fixed to the probe holder, used to excite the cantilever beam probe to vibrate or perform Z-direction scanning.

An atomic force microscope measuring head, comprising: the probe fixing module and a laser transceiving module, the laser transceiving module includes: a laser emitting structure and a laser receiving structure, the laser emitting structure includes: the laser and the first laser A first converging lens on the beam path, so that the first laser beam passes through the first converging lens and the second laser beam is focused on the cantilever probe; the laser receiving structure includes: a photodetector And a second convergent lens located on the optical path of the fourth laser beam, so that the fourth laser beam passes through the second convergent lens and is projected on the photosensitive surface of the photodetector.

In the above technical solution, a filter is installed on the optical path after the fourth laser beam passes through the second condensing lens to reduce stray light interference.

In the above technical solution, the photodetector is installed on a two-dimensional adjustment table, and the two-dimensional adjustment table is used to adjust the position of the photodetector.

In the above technical solution, it further includes: a second adjustment frame on which the laser is installed, and the second adjustment frame is used to adjust the position and angle of the laser.

1. The Z-direction effective thickness (the vertical distance from the upper surface of the second reflecting surface 5 to the tip of the cantilever probe 1) of the probe fixing module in the atomic force microscope probe of the present invention is only a few millimeters, which can be directly installed at the working distance The integrated use of different devices can be realized under an optical or electron microscope larger than this thickness.

2. The probe of the atomic force microscope has a compact structure, and the Z-direction thickness is significantly reduced compared with the conventional atomic force microscope, and it is easy to integrate with other equipment.

3. When the AFM probe is integrated with an optical microscope or an electron microscope, it can be directly installed between the optical objective lens or electron microscope pole piece and the sample without modifying the existing microscope body. The optical paths of the two are not coupled, and their functions are not affected. influences.

4. The probe of the atomic force microscope adopts modular design, each module is relatively independent, easy to install, debug, maintain and upgrade.

Description of the drawings

Figure 1 is a schematic diagram of the probe structure 1 of an atomic force microscope;

Figure 2 is a schematic diagram of the probe structure 2 of an atomic force microscope;

Figure 3 is a schematic diagram of the probe structure 3 of the atomic force microscope:

Figure 4 is a schematic diagram of the probe structure 4 of the atomic force microscope:

5 is a schematic diagram of the structure of the probe of the atomic force microscope of the present invention;

Fig. 6 is a schematic diagram of the structure of the probe of the atomic force microscope of the present invention.

among them,

Ⅰ: Probe fixed module Ⅱ: Laser transceiver module

1: Cantilever beam probe; 2: Piezoelectric ceramic;

3: Probe holder; 4: The first reflective surface;

5: Second reflective surface; 6: Third reflective surface;

7: Fourth reflecting surface; 8: Fifth reflecting surface;

9: First adjustment frame; 10: Laser;

11: Second adjustment frame; 12: First convergent lens;

13: Second convergent lens; 14: Photodetector;

15: Two-dimensional adjustment platform; 16: Motor coarse positioning platform;

17: Piezoelectric scanner; 18: Sample stage;

19: Objective lens; 20: Right-angle prism;

21: Plane mirror; 22: Dichroic mirror;

23: Lens group; 24: Polarization beam splitter;

25: Quarter wave plate.

detailed description

The technical solution of the present invention will be further described below in conjunction with specific embodiments.

Example 1

A probe fixing module includes: a cantilever beam probe 1, a piezoelectric ceramic 2, a probe holder 3, a first reflection surface 4, a first reflection device and a second reflection device. The cantilever beam probe 1 is installed on In the probe holder 3, the tip of the cantilever probe 1 is located at the lowest point of the probe fixing module I, and the first reflective surface 4 is located on one side of the cantilever probe 1 for receiving another The first laser beam emitted by the laser 10 on one side reflects the first laser beam to form a second laser beam, and the acute angle between the first reflective surface 4 and the first laser beam is 60°-67.5°.

The first reflection device is located between the cantilever beam probe 1 and the first reflection surface 4. The second laser beam is reflected by the first reflection device and irradiated on the cantilever beam probe 1 at an inclination angle of 45°-60° and is The probe 1 reflects to form a third laser beam; the second reflecting device is located between the cantilever beam probe 1 and the laser 10. The third laser beam is reflected by the second reflecting device and then emitted from the probe fixing module I and forms a fourth laser beam .

Example 2

On the basis of Embodiment 1, a light through hole is formed between the first reflecting device and the second reflecting device for passing through the imaging light path;

It also includes: a first adjustment frame 9 mounted with a first reflective surface 4, for adjusting the angle between the first reflective surface 4 and the first laser beam;

It also includes: the piezoelectric ceramic 2 fixed to the probe holder 3, which is used to excite the cantilever beam probe 1 to vibrate or perform Z-direction scanning (Z-direction: the direction perpendicular to the first laser beam).

Example 3

As shown in FIG. 5, on the basis of Embodiment 2, the first reflection device is a first reflection structure and a second reflection structure, the first reflection structure is a reflection surface, and the second reflection structure is a reflection surface. In this embodiment, the first reflective structure is the second reflective surface 5, the second reflective structure is the third reflective surface 6, the first reflective structure and the second reflective structure are parallel to each other, and the second reflective surface 5 and the third reflective surface 6 They are located on the upper and lower sides of the first laser beam and the distance between them is 3.7 mm.

The second reflection device is a third reflection structure and a fourth reflection structure, the third reflection structure is a reflection surface, the fourth reflection structure is a reflection surface, the third reflection structure is a fourth reflection surface 7, and the fourth reflection structure It is the fifth reflective surface 8, and the third reflective structure and the fourth reflective structure are parallel to each other. The fourth reflection surface 7 and the fifth reflection surface 8 are respectively located on the upper and lower sides of the first laser beam with a vertical distance of 3.7 mm; the second reflection surface 5 and the fourth reflection surface 7 have a horizontal distance of 7.5 mm as light passing holes.

In this embodiment, the first to fifth reflective surfaces are all silver-coated flat mirrors. Among them, the silver-plated plane mirror used for the first reflecting surface 4 has a size of 15mm×4.5mm×1mm, which is pasted on a fixed inclined surface at an angle of 112.5° with the horizontal plane, and the reflection surface faces the second upper right side. The reflecting surface 5 (as shown in Figure 5); the second reflecting surface 5 and the fourth reflecting surface 7 can belong to different areas of the same reflecting mirror (that is, integrated), or they can be two different reflecting mirrors. When the reflecting surface 5 and the fourth reflecting surface 7 are integrally formed, the size can be 15mm×20mm×1mm, placed horizontally above the cantilever probe, and a through hole with a diameter of 7.5mm is processed in the middle of the reflector for light transmission Hole, the second reflection surface 5 and the fourth reflection surface 7 are located on the left and right sides of the through hole.

The size of the reflector used for the fifth reflecting surface 8 is 15mm×20mm×1mm, and it is placed horizontally on the right side of the cantilever probe 1. The first laser beam is emitted from the first condensing lens 12 and then passes through the first reflection surface 4, the first reflection surface 5, the third reflection surface 6 and the second reflection surface 5, and then converges on On the cantilever beam probe 1, the third laser beam reflected by the cantilever beam probe 1 passes through the first reflection of the fourth reflection surface 7, the second reflection of the fifth reflection surface 8 and the fourth reflection surface 7 in turn. The probe fixing module 1 emits and forms a fourth laser beam at the bottom right. The distance between the two reflection points on each of the second reflection surface 5 and the fourth reflection surface 7 is about 14 mm.

After measurement, the thickness of the probe fixing module in this embodiment is 6.8 mm.

Example 4

As shown in FIG. 6, on the basis of Embodiment 2, the first reflecting device is a second reflecting surface 5 parallel to the first laser beam, and the second reflecting surface 5 and the cantilever beam probe 1 are respectively located at the side of the first laser beam. The upper and lower sides and the mirror surfaces of the second reflection surface 5 face the first laser beam, and the second laser beam is reflected by the second reflection surface 5 and irradiated on the cantilever probe 1.

The second reflection device is a third reflection structure and a fourth reflection structure, the third reflection structure is a reflection surface, the fourth reflection structure is a reflection surface, the third reflection structure is a fourth reflection surface 7, and the fourth reflection structure It is the fifth reflection surface 8. The third reflection structure and the fourth reflection structure are respectively located on the upper and lower sides of the first laser beam and are parallel to each other and mirror-faced.

The size of the first reflective surface 4 is 12mm (width) x 5mm (length) x 1mm (thickness); the angle between the first reflective surface 4 and the horizontal plane is 112.5°; the size of the second reflective surface 5 is 20mm (width) x 9mm (Length) x 1mm (thickness); the size of the fourth reflective surface 7 is 20mm (width) x 5.5mm (length) x 1mm (thickness); the size of the fifth reflective surface 8 is 20mm (width) x 9mm (length) x 1mm (thickness); the vertical distance between the fourth reflective surface 7 and the fifth reflective surface 8 is 3.7mm; the horizontal distance between the second reflective surface 5 and the fourth reflective surface 7 is 7.5mm.

Example 5

An atomic force microscope probe, including: the probe fixing module I and the laser transceiver module II of the above-mentioned embodiment 3. The laser transceiver module II includes: a laser emitting structure and a laser receiving structure, the laser emitting structure includes: a laser 10 and a laser The first condensing lens 12 on the optical path of the laser beam (the first condensing lens 12 is located outside the probe fixing module), so that the first laser beam passes through the first condensing lens 12 and the second laser beam is projected on the cantilever probe 1 The laser receiving structure includes: a photodetector 14 and a second converging lens 13 located on the optical path of the fourth laser beam, so that the fourth laser beam passes through the second converging lens 13 and is projected on the photosensitive surface of the photodetector 14.

Preferably, a filter (not shown in the figure) is installed on the optical path of the fourth laser beam after passing through the second condensing lens 13 to reduce stray light interference.

Preferably, the photodetector 14 is installed on a two-dimensional adjustment table 15, and the two-dimensional adjustment table 15 is used to adjust the position of the photodetector 14;

It also includes a second adjustment frame 11 on which the laser 10 is installed, and the second adjustment frame 11 is used to adjust the position and angle of the laser 10.

In this embodiment, the laser uses a diode laser with a wavelength of 780 nm and a power of 4.5 mW, and its exit spot is a circle with a diameter of 2.5 mm. The first convergent lens is installed at the exit of the laser, using a precision polished aspheric lens plated with a 780nm antireflection coating, with an effective focal length of 79mm and a numerical aperture of 0.143. The second convergent lens is an ordinary spherical lens with a 780nm antireflection coating, with an effective focal length of 25mm and a numerical aperture of 0.23. The photodetector uses Hamamatsu's four-quadrant photodetector, and the photosensitive surface is a square area with a side length of 10mm. The photodetector is fixed on the two-dimensional adjustment table 15. The two-dimensional adjustment stage is a two-dimensional manual translation stage, and its X and Y strokes are both 6mm, and the displacement resolution is better than 10μm. In this solution, the effective Z-direction thickness of the probe fixing module, that is, the vertical distance from the upper surface of the second reflective surface 5 to the tip of the cantilever probe 1 is 6.8 mm. The optical microscope above the probe of the atomic force microscope can use Mitutoyo's 50X plan apochromatic objective lens with a working distance of 13mm and a numerical aperture of 0.55.

The fourth laser beam emitted from the probe fixing module I enters the second convergent lens 13 in the laser transceiver module II and is projected onto the photodetector 14.

Example 6

An atomic force microscope, comprising: the probe of the atomic force microscope in embodiment 5, a motor coarse positioning platform 16, a piezoelectric scanner 17, a sample stage 18, and an objective lens 19 located outside the probe of the atomic force microscope, and the objective lens 19 is fixed on the probe Just above the module I, the tip of the cantilever probe 1 is positioned in the field of view of the objective lens 19 through the light-passing hole.

The motor coarse positioning platform 16, the piezoelectric scanner 17, and the sample stage 18 are located below the probe fixing module I, which can drive the sample to move three-dimensionally relative to the needle tip and scan and image.

The sample stage is installed on a piezoelectric ceramic scanner (piezoelectric scanner) with three-dimensional scanning capability. The piezoelectric ceramic scanner is installed on the motor coarse positioning platform. The atomic force microscope probe is located above the sample stage, and the probe is fixed Module I is located directly above the sample, and laser transceiver module II is located on the side of probe fixing module I (the right side is shown in Figure 5).

The motor coarse positioning platform 16 adopts a combined stepping motor, and the three-axis stepping resolution is less than 1μm.

The piezoelectric ceramic scanner uses PI's three-dimensional nano-positioning stage P-517.3C, with a closed loop stroke of 100μm in the X and Y directions, a displacement resolution of 0.3nm, and a closed loop stroke of 20μm in the Z direction and a displacement resolution of 0.1nm.

The cantilever beam probe is installed in the probe holder and the cantilever beam is inclined at 10° with the horizontal plane to ensure that the needle tip is located at the lowest point of the probe fixing module 1.

The probe holder is fixed on the bottom of the piezoelectric ceramic. The size of the piezoelectric ceramic is 5mm×5mm×1mm. When the atomic force microscope works in the dynamic mode, the piezoelectric ceramic resonance can drive the cantilever beam probe 1 to generate resonance.

The probe of the atomic force microscope proposed by the present invention must cooperate with an external three-dimensional scanner (motor coarse positioning platform 16 and piezoelectric scanner 17) to realize the scanning imaging function. When scanning imaging, the probe of the atomic force microscope is fixed and the piezoelectric scanner carries the sample for three-dimensional scanning. When the atomic force microscope is used in conjunction with other instruments such as an optical microscope, the probe of the atomic force microscope is located between the sample and the objective lens, and the Z-direction thickness of the probe of the atomic force microscope is smaller than the working distance of the objective lens used.

The present invention has been exemplarily described above. It should be noted that, without departing from the core of the present invention, any simple deformation, modification, or other equivalent substitutions that can be made without creative labor by those skilled in the art fall into this The scope of protection of the invention.

Claims

A probe fixing module, which is characterized by comprising: a cantilever beam probe (1), a piezoelectric ceramic (2), a probe holder (3), a first reflecting surface (4), a first reflecting device and The second reflecting device, the cantilever beam probe (1) is installed in the probe holder (3), the tip of the cantilever beam probe (1) is located at the lowest point of the probe fixing module (I), and the first A reflecting surface (4) is located on one side of the cantilever probe (1), and is used to receive the first laser beam emitted by the laser (10) on the other side of the cantilever probe (1) The first laser beam is reflected to form a second laser beam, and the acute angle between the first reflecting surface (4) and the first laser beam is 60-67.5°; the first reflecting device is located in the cantilever beam probe Between the needle (1) and the first reflecting surface (4), the second laser beam is reflected by the first reflecting device and irradiated on the cantilever probe (1) and reflected by the cantilever probe (1) A third laser beam is formed; the second reflection device is located between the cantilever probe (1) and the laser (10), and the third laser beam is reflected by the second reflection device from the The probe fixing module (I) emits and forms a fourth laser beam.
The probe fixing module according to claim 1, wherein the first reflecting device is a second reflecting surface (5) parallel to the first laser beam, and the second reflecting surface (5) is connected to the cantilever beam. The probes (1) are respectively located on both sides of the first laser beam and the mirror surface of the second reflection surface (5) faces the first laser beam, and the second laser beam is reflected by the second reflection surface (5) and then irradiated On the cantilever probe (1).
The probe fixing module according to claim 1, wherein the first reflecting device is a first reflecting structure and a second reflecting structure, and the first reflecting structure is a reflecting surface or is located on the same plane and A number of reflective surfaces greater than 1, the second reflective structure is one reflective surface or multiple reflective surfaces located on the same plane with a number greater than 1, the first reflective structure and the second reflective structure are parallel to each other and mirrored relatively.
The probe fixing module according to claim 2 or 3, wherein the second reflecting device is a fourth reflecting surface (7) parallel to the first laser beam, and the fourth reflecting surface (7) is connected to The cantilever probes (1) are respectively located on both sides of the first laser beam and the mirror surface of the fourth reflection surface (7) faces the first laser beam, and the third laser beam is reflected by the fourth reflection surface (7) Then, the fourth laser beam is formed.
The probe fixing module according to claim 2 or 3, wherein the second reflection device is a third reflection structure and a fourth reflection structure, and the third reflection structure is a reflection surface or is located on the same plane The fourth reflective structure is one reflective surface or multiple reflective surfaces on the same plane with a number greater than 1, and the third reflective structure and the fourth reflective structure are parallel to each other And the mirror faces are opposite.
The probe fixing module according to claim 4 or 5, wherein a light through hole is formed between the first reflecting device and the second reflecting device for passing through the imaging light path.
The probe fixing module according to claim 6, further comprising: a first adjusting frame (9) mounted with the first reflecting surface (4), for adjusting the first reflecting surface (4) The included angle with the first laser beam.
The probe fixing module according to claim 7, further comprising: a piezoelectric ceramic (2) fixed to the probe holder (3) for exciting the cantilever beam probe (1) Vibrate or scan in Z direction.
An atomic force microscope probe, characterized by comprising: the probe fixing module (I) and the laser transceiver module (II) as claimed in claim 1, the laser transceiver module (II) comprising: a laser emitting structure and a laser A receiving structure, the laser emitting structure includes: the laser (10) and a first converging lens (12) located on the optical path of the first laser beam, so that the first laser beam passes through the first converging lens ( 12) And the second laser beam is focused on the cantilever beam probe (1); the laser receiving structure includes: a photodetector (14) and a second converging lens (13) located on the optical path of the fourth laser beam, So that the fourth laser beam passes through the second condensing lens (13) and is projected on the photosensitive surface of the photodetector (14).
The AFM probe according to claim 9, characterized in that a filter is installed on the optical path after the fourth laser beam passes through the second condensing lens (13) to reduce stray light interference .
The atomic force microscope probe according to claim 10, wherein the photodetector (14) is installed on a two-dimensional adjustment table (15), and the two-dimensional adjustment table (15) is used to adjust the photodetector ( 14) Location.
The AFM probe according to claim 11, further comprising: a second adjustment frame (11), the laser (10) is mounted on the second adjustment frame (11), and the second adjustment frame (11) ) Is used to adjust the position and angle of the laser (10).