WO2020200168A1 - Amoled display screen, display device and mobile terminal - Google Patents

Amoled display screen, display device and mobile terminal Download PDF

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Publication number
WO2020200168A1
WO2020200168A1 PCT/CN2020/082076 CN2020082076W WO2020200168A1 WO 2020200168 A1 WO2020200168 A1 WO 2020200168A1 CN 2020082076 W CN2020082076 W CN 2020082076W WO 2020200168 A1 WO2020200168 A1 WO 2020200168A1
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Prior art keywords
electrode
display screen
wiring
pixel
amoled display
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PCT/CN2020/082076
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French (fr)
Chinese (zh)
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文亮
李冠恒
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维沃移动通信有限公司
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Publication of WO2020200168A1 publication Critical patent/WO2020200168A1/en

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/131Interconnections, e.g. wiring lines or terminals
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00

Definitions

  • the present disclosure relates to the field of display technology, and in particular to an AMOLED display screen, a display device and a mobile terminal.
  • the current mobile terminal such as a mobile phone has developed to a stage of full screen.
  • the display interface of a full-screen mobile phone is completely covered by the display screen, and components such as photosensitive elements or light sources are designed under the screen. As shown in Fig.
  • the pixel structure of an active matrix organic light emitting diode or an active matrix organic light emitting diode (AMOLED) display screen in the related art specifically includes: a glass substrate 1 , Buffer layer 2, polysilicon layer 3, first gate insulating layer 4, gate1 wiring 5, second gate insulating layer 6, gate2 wiring 7, interlayer insulating layer 8, M2 source and drain wiring layer 9,
  • the PLN planarization layer 10 the anode 11, the first electrode 12 of the storage capacitor, and the second electrode 13 of the storage capacitor.
  • the metal material molybdenum Mo is generally used to form the gate1 wiring, the gate2 wiring layer and the storage capacitor corresponding to each pixel. Due to the poor light transmission performance of Mo metal materials, the light transmission requirements of components such as photosensitive elements or light sources cannot be met, and components such as photosensitive elements or light-emitting elements cannot be integrated under the screen, which is not conducive to the overall structural layout.
  • the embodiments of the present disclosure provide an AMOLED display screen and a mobile terminal for a display device to solve the problem that the display screen cannot meet the light transmittance requirement, which causes the photosensitive element or the light emitting element and other components cannot be integrated under the screen, which is not conducive to the overall structure layout.
  • embodiments of the present disclosure provide an AMOLED display screen, including a plurality of pixels, at least one of which is a first pixel, and the first pixel includes a first wiring layer and a second wiring layer.
  • the first wiring layer and the second wiring layer are arranged separately, a first electrode wiring and a first electrode sheet are formed on the first wiring layer, and a second electrode wiring is formed on the second wiring layer And a second electrode sheet, the first electrode sheet and the second electrode sheet at least partially overlap to form a first storage capacitor, and at least one of the first electrode trace, the second electrode trace, and the first storage capacitor
  • the item is made of light-transmitting conductive material.
  • an embodiment of the present disclosure provides a display device including the above-mentioned AMOLED display screen.
  • an embodiment of the present disclosure provides a mobile terminal including a display screen and a photosensitive element.
  • the display screen is the above-mentioned AMOLED display screen
  • the photosensitive element is arranged below the AMOLED display screen
  • the AMOLED display screen corresponds to
  • the pixels at the position of the photosensitive element are all the first pixels.
  • an embodiment of the present disclosure provides a mobile terminal, including a display screen and a light-emitting element, the display screen is the above-mentioned AMOLED display screen, the light-emitting element is disposed under the AMOLED display screen, and the AMOLED display screen The pixels corresponding to the position of the light-emitting element are all the first pixels.
  • the first electrode wiring, the second electrode wiring and the first storage capacitor in the first pixel is made of a light-transmitting conductive material, the light transmission of the first pixel area can be improved. degree. Therefore, the light transmission requirements of components such as photosensitive elements or light sources can be met, and components such as photosensitive elements and light-emitting elements can be integrated under the screen, which is beneficial to the overall structure layout.
  • Figure 1 is a schematic diagram of the pixel structure of a traditional AMOLED display screen
  • Figure 2 shows the layout of polysilicon pixels
  • Figure 3 shows the pixel layout of gate1
  • Figure 4 is a pixel layout of AMOLED pixel unit used to form gate2 gate and pixel circuit storage capacitor
  • FIG. 5 is a pixel layout of an AMOLED pixel unit with openings in an interlayer insulating layer
  • FIG. 6 is a schematic diagram of a pixel distribution structure in an AMOLED display screen provided by an embodiment of the disclosure.
  • FIG. 7 is one of the connection structure diagrams of the first pixel and the second pixel in the AMOLED display screen provided by an embodiment of the disclosure.
  • FIG. 8 is a schematic cross-sectional view of the connection structure of the first pixel and the second pixel in the AMOLED display screen provided by an embodiment of the disclosure
  • FIG. 9 is the second diagram of the connection structure of the first pixel and the second pixel in the AMOLED display screen provided by an embodiment of the disclosure.
  • FIG. 10 is the third diagram of the connection structure of the first pixel and the second pixel in the AMOLED display screen provided by an embodiment of the disclosure.
  • Some mobile terminals in related technologies are designed for non-full screen.
  • the cameras and LED lights on the mobile phones are all set outside the screen.
  • mobile phone screens have gradually entered the era of full screens from non-full screens.
  • the full-screen occupies most of the front surface of the mobile phone, and the light-emitting elements such as the camera and LED lights on the mobile phone are placed under the screen.
  • the light emitted by the light below the screen (light of various bands including visible light) needs to be emitted through the screen, and the outside light needs to pass through the screen to be received by photosensitive elements such as cameras, photosensitive sensors, or infrared sensors.
  • Light includes visible light, infrared light, X-ray, etc.
  • the light needs to pass through AMOLED pixels, so the higher the light transmittance of the AMOLED display, the better.
  • AMOLED pixel design includes LTPS TFT pixel drive circuit part, and OLED light-emitting diode part.
  • the main paths for light to pass are: 1. Pass through the gap area of the pixel where there is no metal trace to shield the light; 2.
  • the organic light emitting diode has a certain light transmittance and penetrates the light emitting diode area.
  • the AMOLED screen pixel design and manufacturing process mainly have the following steps:
  • the buffer layer made of SiOx is made on glass or flexible polyimide PI material, the thickness is about 300nm.
  • an amorphous silicon layer with a thickness of about 50 nm is formed on the buffer layer by chemical vapor deposition, and a polysilicon layer is formed by laser annealing.
  • the patterning process flow of photolithography, etching, and de-glue is completed.
  • the main steps are: coating photoresist on the polysilicon layer, exposing and developing using the mask of the polysilicon pixel layout design of Figure 2 to form the pattern of the pixel layout design; Plasma etching is used to form a polysilicon pattern, and then the photoresist is removed to form the polysilicon pattern designed in FIG. 2.
  • the photolithography technology is used to form via holes on the planarized organic film layer with a thickness of about 1.5 ⁇ m made by the coating process for electrical connection.
  • the metal Mg, Ag alloy is evaporated onto the organic layer as a cathode.
  • the AMOLED screen manufactured through the design and process of the above related technologies will have the following problems:
  • the metal layer will also block the light from penetrating the screen.
  • the present disclosure uses light-transmitting conductive materials to make connection lines, and designs a new pixel with high transmittance. New pixels with high transmittance are set in areas that require high transmittance, and traditional pixels are set in other areas. Thus, without affecting the overall display effect, applications such as under-screen cameras can be achieved.
  • the AMOLED display screen of the embodiment of the present disclosure is described in detail below.
  • an AMOLED display screen which includes a plurality of pixels, at least one of which is a first pixel 101, and the first pixel 101 includes a first wiring layer and a second wiring layer.
  • Two wiring layers, the first wiring layer and the second wiring layer are arranged separately, a first electrode wiring 1011 and a first electrode sheet are formed on the first wiring layer, the second wiring layer A second electrode trace 1012 and a second electrode sheet are formed thereon.
  • the first electrode sheet and the second electrode sheet at least partially overlap to form a first storage capacitor 1013.
  • the first electrode trace 1011 and the second electrode At least one of the wiring 1012 and the first storage capacitor 1013 is made of a transparent conductive material.
  • the AMOLED display screen provided by the embodiments of the present disclosure includes a plurality of pixels, and the plurality of pixels may be arranged in a matrix, and part or all of the pixels of the AMOLED display screen may be designed as first pixels.
  • the first electrode wiring 1011 is the gate1 wiring in the first pixel; the second electrode wiring 1012 is the gate2 wiring in the first pixel.
  • the specific type of the above-mentioned transparent conductive material can be set according to actual needs.
  • the above-mentioned transparent conductive material may be a transparent indium tin oxide ITO conductive film.
  • the above-mentioned first pixel may include a variety of design solutions, which will be described in detail through four specific examples below:
  • the first electrode trace 1011 is made of light-transmitting conductive material, and the second electrode trace 1012 and the first storage capacitor 1013 are made of the metallic material molybdenum Mo;
  • the light transmittance of the electrode wiring 1011 increases the light transmittance of the first pixel 101.
  • the second electrode wiring 1012 is made of light-transmitting conductive material, and the first electrode wiring 1011 and the first storage capacitor 1013 are made of the metallic material molybdenum Mo;
  • the light transmittance of the electrode wiring 1012 increases the light transmittance of the first pixel 101.
  • the first storage capacitor 1013 is made of a light-transmitting conductive material, and the first electrode wiring 1011 and the second electrode wiring 1012 are made of the metallic material molybdenum Mo. In this way, since the light transmittance of the first storage capacitor 1013 is enhanced, the light transmittance of the first pixel 101 is increased.
  • the first electrode wiring 1011, the second electrode wiring 1012, and the first storage capacitor 1013 are all made of light-transmitting conductive material, which can maximize the light transmittance of the first pixel 101.
  • the area of the first pixel can be increased. Light transmittance. Therefore, the light transmission requirements of components such as photosensitive elements or light sources can be met, and components such as photosensitive elements and light-emitting elements can be integrated under the screen, which is beneficial to the overall structure layout.
  • At least one of the above-mentioned multiple pixels is the second pixel 102, and the second pixel 102 includes a third wiring layer and a fourth wiring layer.
  • a third electrode trace 1021 and a third electrode sheet are formed on the wiring layer, and a fourth electrode trace 1022 and a fourth electrode sheet are formed on the fourth wiring layer.
  • the third electrode sheet and the first electrode sheet are The four electrode sheets at least partially overlap to form a second storage capacitor 1023; the first electrode wiring 1011 and the third electrode wiring 1021 are located in the same layer, and the first electrode wiring 1011 and the third electrode wiring 1021 Conductive connection; the second electrode trace 1012 and the fourth electrode trace 1022 are located in the same layer, and the second electrode trace 1012 and the fourth electrode trace 1022 are conductively connected.
  • the materials used for the third electrode wiring 1021, the fourth electrode wiring 1022, and the second storage capacitor 1023 can be set according to actual needs.
  • the third electrode wiring The wire 1021, the fourth electrode wire 1022, and the second storage capacitor 1023 may all be made of the metallic material molybdenum Mo.
  • the third electrode wiring 1021 is a gate1 wiring in the second pixel; the fourth electrode wiring 1032 is a gate2 wiring in the second pixel.
  • the conductive connection between the first electrode trace 1011 and the third electrode trace 1021 can be set according to actual needs.
  • the first electrode trace 1011 can be connected to the third electrode trace 1021.
  • 1021 partially overlaps, and the first electrode trace 1011 and the third electrode trace 1021 are conductively connected at the overlapping portion.
  • the third electrode trace 1021 can be made first.
  • the specific process is: first make the MO metal layer, and then lithography, etch, and de-glue to form the metal trace of gate1 (that is, the third electrode trace ); Then a thin film of ITO is formed, and finally ITO traces are formed by photolithography, etching, and de-glueing (that is, the first electrode traces mentioned above), and the ITO traces overlap the Mo traces to form a conductive connection.
  • the first electrode wiring 1011 and the third electrode wiring 1021 are partially overlapped, and the first electrode wiring 1011 and the third electrode wiring 1021 are conductively connected at the overlapping portion, such
  • the first electrode wiring 1011 can be made directly after the third electrode wiring 1021 is made, and the first electrode wiring 1011 is overlapped with the third electrode wiring 1021 to achieve conductive connection. This makes the manufacturing process simple and reduces the AMOLED display The difficulty of manufacturing the screen.
  • the first pixel 101 and the second pixel 102 exist on the AMOLED display screen at the same time, it is possible to avoid the problem of using ITO materials on the screen, which leads to excessive wiring resistance of gate1 and poor display.
  • the second electrode trace 1012 and the fourth electrode trace 1022 partially overlap, and are electrically connected at the overlapping portion.
  • the manufacturing process of the second electrode wiring 1012 and the fourth electrode wiring 1022 can refer to the manufacturing process of the first electrode wiring 1011 and the third electrode wiring 1021, which will not be repeated here.
  • the first pixel 101 and the second pixel 102 exist on the AMOLED display screen at the same time, it is possible to avoid the problem of using ITO materials on the screen, which leads to excessive wiring resistance of gate2 and poor display.
  • the first storage capacitor 1013 is set as an ITO material, and specifically the gate1 electrode and/or gate2 electrode of the first storage capacitor are set as an ITO material at the same time. Since the area of the first storage capacitor 1013 is relatively large, making the first storage capacitor 1013 a transparent electrode made of ITO material can greatly increase the light transmittance of the first pixel 101.
  • the number of the first pixels 101 and the second pixels 102 can be set according to actual needs.
  • the number of the first pixels 101 is smaller than the number of the electrodes of the second pixel 102.
  • the pixels in the small area can be set as the first pixel 101, and the remaining pixels can be set as the second pixel 102.
  • the 4 pixels in the area A are the first pixel 101, and the remaining pixels It is the second pixel 102.
  • This ensures that the first electrode trace 1011 and/or the second electrode trace 1012 and/or the first storage capacitor 1013 of a small part of the pixels are made of ITO material, so that a small part of the area uses high-transmittance pixels, which is very important for the overall screen
  • the display effect is small, and the light transmittance of the device screen area under the screen is greatly improved.
  • the above-mentioned AMOLED display screen further includes source-drain wiring, and the source-drain wiring is made of the transparent conductive material.
  • the embodiment of the present disclosure also provides a display device, which includes an AMOLED display screen.
  • the AMOLED display screen is the AMOLED display screen in the foregoing embodiment, and its structure can refer to the AMOLED display screen in the foregoing embodiment. Since the AMOLED display screen in the above-mentioned embodiment is adopted, the display device provided in the embodiment of the present disclosure also has all the beneficial effects of the AMOLED display screen in the above-mentioned embodiment, which will not be repeated here.
  • the embodiment of the present disclosure also provides a mobile terminal, the mobile terminal includes an AMOLED display screen and a photosensitive element, the photosensitive element is arranged under the AMOLED display screen, the AMOLED display screen corresponds to the pixels of the photosensitive element position The first pixel.
  • the AMOLED display screen is the AMOLED display screen in the foregoing embodiment, and its structure can refer to the AMOLED display screen in the foregoing embodiment.
  • the mobile terminal provided by the embodiment of the present disclosure sets the pixel corresponding to the position of the photosensitive element as the first pixel, so that the light transmittance requirement of the photosensitive element can be met, so that the photosensitive element can be Integration into the screen is conducive to the overall structure layout.
  • the above-mentioned photosensitive element may be a camera, a photosensitive sensor or an infrared sensor.
  • the embodiment of the present disclosure also provides a mobile terminal, the mobile terminal includes an AMOLED display screen and a light-emitting element, the light-emitting element is arranged under the AMOLED display screen, the AMOLED display screen corresponds to the pixels of the light-emitting element position The first pixel.
  • the AMOLED display screen is the AMOLED display screen in the foregoing embodiment, and its structure can refer to the AMOLED display screen in the foregoing embodiment.
  • the mobile terminal provided by the embodiment of the present disclosure sets the pixel corresponding to the position of the light-emitting element as the first pixel, so that the light-transmitting requirement of the light-emitting element can be met, so that the light-emitting element can Integration into the screen is conducive to the overall structure layout.
  • the mobile terminals in the embodiments of the present disclosure include, but are not limited to, mobile phones, tablet computers, notebook computers, palmtop computers, vehicle-mounted terminals, wearable devices, and pedometers.

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Abstract

Provided are an AMOLED display screen, a display device and a mobile terminal. The AMOLED display screen comprises a plurality of pixels, wherein at least one pixel is a first pixel (101); the first pixel (101) comprises a first wiring layer and a second wiring layer; the first wiring layer and the second wiring layer are arranged separately; a first electrode wiring (1011) and a first electrode sheet are formed on the first wiring layer; a second electrode wiring (1012) and a second electrode sheet are formed on the second wiring layer; the first electrode sheet and the second electrode sheet at least partially overlap to form a first storage capacitor (1013); and at least one of the first electrode wiring (1011), the second electrode wiring (1012) and the first storage capacitor (1013) is made of a light-transmitting conductive material.

Description

AMOLED显示屏、显示设备及移动终端AMOLED displays, display equipment and mobile terminals
相关申请的交叉引用Cross references to related applications
本申请主张在2019年4月3日在中国提交的中国专利申请号No.201910266309.8的优先权,其全部内容通过引用包含于此。This application claims the priority of Chinese Patent Application No. 201910266309.8 filed in China on April 3, 2019, the entire content of which is incorporated herein by reference.
技术领域Technical field
本公开涉及显示技术领域,尤其涉及一种AMOLED显示屏、显示设备及移动终端。The present disclosure relates to the field of display technology, and in particular to an AMOLED display screen, a display device and a mobile terminal.
背景技术Background technique
随着通信技术的发展,为了提高移动终端显示屏的视觉效果,目前移动终端比如手机已发展到全面屏的阶段。全面屏手机的显示界面被显示屏完全覆盖,感光元件或者光源等部件均采用屏下设计。如图1所示,相关技术中的有源矩阵有机发光二极体或主动矩阵有机发光二极体(Active-matrix Organic Light-Emitting Diode,AMOLED)显示屏的像素的结构具体包括:玻璃基板1、缓冲层2、多晶硅层3、第一栅极绝缘层4、gate1走线5、第二栅极绝缘层6、gate2走线7、层间绝缘层8、M2源漏极走线层9、PLN平坦化层10、阳极11、存储电容第一电极12和存储电容第二电极13。通常采用金属材料钼Mo形成gate1走线、gate2走线层以及对应每一像素设置的存储电容。由于Mo金属材料的透光性能较差,导致无法满足感光元件或者光源等部件的透光性需求,感光元件或者发光元件等部件无法集成到屏下,不利于整体结构布局。With the development of communication technology, in order to improve the visual effect of the display screen of the mobile terminal, the current mobile terminal such as a mobile phone has developed to a stage of full screen. The display interface of a full-screen mobile phone is completely covered by the display screen, and components such as photosensitive elements or light sources are designed under the screen. As shown in Fig. 1, the pixel structure of an active matrix organic light emitting diode or an active matrix organic light emitting diode (AMOLED) display screen in the related art specifically includes: a glass substrate 1 , Buffer layer 2, polysilicon layer 3, first gate insulating layer 4, gate1 wiring 5, second gate insulating layer 6, gate2 wiring 7, interlayer insulating layer 8, M2 source and drain wiring layer 9, The PLN planarization layer 10, the anode 11, the first electrode 12 of the storage capacitor, and the second electrode 13 of the storage capacitor. The metal material molybdenum Mo is generally used to form the gate1 wiring, the gate2 wiring layer and the storage capacitor corresponding to each pixel. Due to the poor light transmission performance of Mo metal materials, the light transmission requirements of components such as photosensitive elements or light sources cannot be met, and components such as photosensitive elements or light-emitting elements cannot be integrated under the screen, which is not conducive to the overall structural layout.
发明内容Summary of the invention
本公开实施例提供一种AMOLED显示屏、显示设备移动终端,以解决显示屏无法满足透光性需求,导致感光元件或者发发光元件等部件无法集成到屏下,不利于整体结构布局的问题。The embodiments of the present disclosure provide an AMOLED display screen and a mobile terminal for a display device to solve the problem that the display screen cannot meet the light transmittance requirement, which causes the photosensitive element or the light emitting element and other components cannot be integrated under the screen, which is not conducive to the overall structure layout.
为了解决上述技术问题,本公开是这样实现的:In order to solve the above technical problems, the present disclosure is implemented as follows:
第一方面,本公开实施例提供了一种AMOLED显示屏,包括多个像素,其中至少一个像素为第一像素,所述第一像素包括第一走线层和第二走线层,所述第一走线层和第二走线层分隔设置,所述第一走线层上形成有第一电极走线和第一电极片,所述第二走线层上形成有第二电极走线和第二电极片,所述第一电极片和所述第二电极片至少部分重叠形成第一存储电容,所述第一电极走线、第二电极走线和第一存储电容中的至少一项采用透光导电材料制成。In a first aspect, embodiments of the present disclosure provide an AMOLED display screen, including a plurality of pixels, at least one of which is a first pixel, and the first pixel includes a first wiring layer and a second wiring layer. The first wiring layer and the second wiring layer are arranged separately, a first electrode wiring and a first electrode sheet are formed on the first wiring layer, and a second electrode wiring is formed on the second wiring layer And a second electrode sheet, the first electrode sheet and the second electrode sheet at least partially overlap to form a first storage capacitor, and at least one of the first electrode trace, the second electrode trace, and the first storage capacitor The item is made of light-transmitting conductive material.
第二方面,本公开实施例提供了一种显示设备,该显示设备包括上述AMOLED显示屏。In a second aspect, an embodiment of the present disclosure provides a display device including the above-mentioned AMOLED display screen.
第三方面,本公开实施例提供了一种移动终端,包括显示屏和感光元件,所述显示屏上述AMOLED显示屏,所述感光元件设于所述AMOLED显示屏下方,所述AMOLED显示屏对应所述感光元件位置的像素均为所述第一像素。In a third aspect, an embodiment of the present disclosure provides a mobile terminal including a display screen and a photosensitive element. The display screen is the above-mentioned AMOLED display screen, the photosensitive element is arranged below the AMOLED display screen, and the AMOLED display screen corresponds to The pixels at the position of the photosensitive element are all the first pixels.
第四方面,本公开实施例提供了一种移动终端,包括显示屏和发光元件,所述显示屏为上述AMOLED显示屏,所述发光元件设于所述AMOLED显示屏下方,所述AMOLED显示屏对应所述发光元件位置的像素均为所述第一像素。In a fourth aspect, an embodiment of the present disclosure provides a mobile terminal, including a display screen and a light-emitting element, the display screen is the above-mentioned AMOLED display screen, the light-emitting element is disposed under the AMOLED display screen, and the AMOLED display screen The pixels corresponding to the position of the light-emitting element are all the first pixels.
本实施例中,由于将第一像素中的第一电极走线、第二电极走线和第一存储电容中至少一项采用透光导电材料制成,这样可以提高第一像素区域的透光度。因此可以满足感光元件或者光源等部件的透光性需求,感光元件和发光元件等部件可以集成到屏下,利于整体结构布局。In this embodiment, since at least one of the first electrode wiring, the second electrode wiring and the first storage capacitor in the first pixel is made of a light-transmitting conductive material, the light transmission of the first pixel area can be improved. degree. Therefore, the light transmission requirements of components such as photosensitive elements or light sources can be met, and components such as photosensitive elements and light-emitting elements can be integrated under the screen, which is beneficial to the overall structure layout.
附图说明Description of the drawings
为了更清楚地说明本公开实施例的技术方案,下面将对本公开实施例中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本公开的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动性的前提下,还可以根据这些附图获得其他的附图。In order to explain the technical solutions of the embodiments of the present disclosure more clearly, the following will briefly introduce the drawings needed in the embodiments of the present disclosure. Obviously, the drawings in the following description are only some embodiments of the present disclosure. For those of ordinary skill in the art, without creative labor, other drawings can be obtained from these drawings.
图1为传统AMOLED显示屏的像素结构示意图;Figure 1 is a schematic diagram of the pixel structure of a traditional AMOLED display screen;
图2为多晶硅像素版图;Figure 2 shows the layout of polysilicon pixels;
图3为gate1像素版图;Figure 3 shows the pixel layout of gate1;
图4为AMOLED像素单元用于制作形成gate2栅极以及像素电路存储电容 的像素版图;Figure 4 is a pixel layout of AMOLED pixel unit used to form gate2 gate and pixel circuit storage capacitor;
图5为AMOLED像素单元中设置层间绝缘层开孔的像素版图;FIG. 5 is a pixel layout of an AMOLED pixel unit with openings in an interlayer insulating layer;
图6为本公开实施例提供的AMOLED显示屏中像素分布结构示意图;6 is a schematic diagram of a pixel distribution structure in an AMOLED display screen provided by an embodiment of the disclosure;
图7为本公开实施例提供的AMOLED显示屏中第一像素和第二像素连接结构图之一;FIG. 7 is one of the connection structure diagrams of the first pixel and the second pixel in the AMOLED display screen provided by an embodiment of the disclosure;
图8为本公开实施例提供的AMOLED显示屏中第一像素和第二像素连接结构剖面示意图;8 is a schematic cross-sectional view of the connection structure of the first pixel and the second pixel in the AMOLED display screen provided by an embodiment of the disclosure;
图9为本公开实施例提供的AMOLED显示屏中第一像素和第二像素连接结构图之二;9 is the second diagram of the connection structure of the first pixel and the second pixel in the AMOLED display screen provided by an embodiment of the disclosure;
图10为本公开实施例提供的AMOLED显示屏中第一像素和第二像素连接结构图之三。FIG. 10 is the third diagram of the connection structure of the first pixel and the second pixel in the AMOLED display screen provided by an embodiment of the disclosure.
具体实施方式detailed description
为了更清楚地说明本公开实施例的技术方案,下面将对本公开实施例中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本公开的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动性的前提下,还可以根据这些附图获得其他的附图。In order to explain the technical solutions of the embodiments of the present disclosure more clearly, the following will briefly introduce the drawings that need to be used in the embodiments of the present disclosure. Obviously, the drawings in the following description are only some embodiments of the present disclosure. For those of ordinary skill in the art, without creative labor, other drawings can be obtained from these drawings.
为了方便理解,以下对本公开实施例涉及的一些内容进行说明:In order to facilitate understanding, some content involved in the embodiments of the present disclosure is described below:
相关技术中的部分移动终端为非全面屏设计,例如,在非全面屏手机中,手机上的摄像头,LED灯等都是设置在屏幕外面。为了进一步满足大屏占比的需求,手机屏幕逐渐从非全面屏进入到了全面屏时代。Some mobile terminals in related technologies are designed for non-full screen. For example, in non-full screen mobile phones, the cameras and LED lights on the mobile phones are all set outside the screen. In order to further meet the needs of large screens, mobile phone screens have gradually entered the era of full screens from non-full screens.
在全面屏手机中,全面屏占据了手机正面的绝大部分面积,手机上的摄像头和LED灯等发光元件设置在了屏幕的下方。屏幕下方的灯发出的光(包括可见光在内的各波段的光)需要穿过屏幕发射出去,另外外面的光线需要穿过屏幕被摄像头、光敏传感器或红外线传感器等感光元件接收到。光线包括可见光、红外光和X光等,光线需要穿过AMOLED像素,因此需要AMOLED显示屏的透光率越高越好。AMOLED像素设计包括LTPS TFT像素驱动电路部分,以及OLED发光二极管部分。光线通过的路径主要为:1、通过像素的没有金属走线遮光的缝隙区域;2、有机发光二极管具有一定的透光性,穿透发 光二极管区域。In a full-screen mobile phone, the full-screen occupies most of the front surface of the mobile phone, and the light-emitting elements such as the camera and LED lights on the mobile phone are placed under the screen. The light emitted by the light below the screen (light of various bands including visible light) needs to be emitted through the screen, and the outside light needs to pass through the screen to be received by photosensitive elements such as cameras, photosensitive sensors, or infrared sensors. Light includes visible light, infrared light, X-ray, etc. The light needs to pass through AMOLED pixels, so the higher the light transmittance of the AMOLED display, the better. AMOLED pixel design includes LTPS TFT pixel drive circuit part, and OLED light-emitting diode part. The main paths for light to pass are: 1. Pass through the gap area of the pixel where there is no metal trace to shield the light; 2. The organic light emitting diode has a certain light transmittance and penetrates the light emitting diode area.
相关技术中,AMOLED屏幕像素设计以及工艺制造过程主要有以下步骤:In related technologies, the AMOLED screen pixel design and manufacturing process mainly have the following steps:
一、在玻璃或者柔性聚酰亚胺PI材质上制作SiOx材质的缓冲层,厚度约300nm左右。之后在缓冲层上利用化学气相沉积法形成约50nm厚度的非晶硅层,通过激光退火的方式形成多晶硅层。之后完成光刻、刻蚀、去胶的图形化工艺流程,主要步骤为:在多晶硅层上涂上光刻胶,利用图2的多晶硅像素版图设计的mask曝光、显影,形成像素版图设计的图形;然后利用等离子体刻蚀技术形成多晶硅图形,之后去光刻胶,即形成图2设计的多晶硅图形。1. The buffer layer made of SiOx is made on glass or flexible polyimide PI material, the thickness is about 300nm. After that, an amorphous silicon layer with a thickness of about 50 nm is formed on the buffer layer by chemical vapor deposition, and a polysilicon layer is formed by laser annealing. After that, the patterning process flow of photolithography, etching, and de-glue is completed. The main steps are: coating photoresist on the polysilicon layer, exposing and developing using the mask of the polysilicon pixel layout design of Figure 2 to form the pattern of the pixel layout design; Plasma etching is used to form a polysilicon pattern, and then the photoresist is removed to form the polysilicon pattern designed in FIG. 2.
二、在多晶硅图形上化学气相沉积约60nm厚度SiOx膜层以及约60nm厚度的SiNx膜层作为栅极绝缘层。然后物理气相沉积约200nm厚度的Mo金属层,利用图3中gate1走线层的像素版图设计的mask,利用光刻、刻蚀、去胶流程完成gate1栅极图形化过程,制作gate1栅极以及像素电路存储电容的第一电极。2. Chemical vapor deposition of a SiOx film with a thickness of about 60 nm and a SiNx film with a thickness of about 60 nm on the polysilicon pattern as a gate insulating layer. Then physical vapor deposition of a Mo metal layer with a thickness of about 200nm, using the mask designed by the pixel layout of the gate1 wiring layer in Figure 3, completing the gate1 gate patterning process using photolithography, etching, and de-glueing processes, and fabricating the gate1 gate and The first electrode of the storage capacitor of the pixel circuit.
三、在以上基础上沉积约130nm厚度SiNx作为栅极绝缘层2,之后物理气相沉积约250nm厚度的Mo金属层作为gate2走线层,利用光刻、显影、刻蚀、去胶工艺完成其图形化过程。制作gate2栅极以及像素电路存储电容的第二电极,具体如图4所示。3. On the basis of the above, deposit SiNx with a thickness of about 130nm as the gate insulating layer 2, and then physical vapor deposit a Mo metal layer with a thickness of about 250nm as the gate2 wiring layer, and complete the pattern by photolithography, development, etching, and de-glue process The process. Fabricate the gate 2 of gate2 and the second electrode of the storage capacitor of the pixel circuit, as shown in Figure 4.
四、化学气相沉积约250nm厚度SiN、约300nm厚度SiOx作为层间绝缘层,利用图5的设计,完成层间绝缘层开孔的图形化制程,形成连接孔。4. Chemical vapor deposition of SiN with a thickness of about 250nm and SiOx with a thickness of about 300nm as the interlayer insulating layer. Using the design shown in Figure 5, the patterning process of opening the interlayer insulating layer is completed to form connection holes.
五、物理气相沉积50nm Ti、500nm厚度Al、100nm厚度Ti的M2金属层,利用版图设计的图形,完成源漏电极层的图形化过程,即M2层。形成数据线走线等各种电气连线。5. Physical vapor deposition of 50nm Ti, 500nm thick Al, 100nm thick Ti M2 metal layer, using the pattern designed by the layout, complete the patterning process of the source and drain electrode layers, that is, the M2 layer. Form various electrical connections such as data line routing.
六、利用版图设计的图形mask,在涂布工艺制作的厚约1.5μm的平坦化有机膜层上,利用光刻技术形成过孔,用于电连接。6. Using the pattern mask designed by the layout, the photolithography technology is used to form via holes on the planarized organic film layer with a thickness of about 1.5 μm made by the coating process for electrical connection.
七、物理气相沉积约50nm厚ITO膜层、15nm厚度Ag膜层、50nm厚度ITO膜层,并且完成其图形化过程,制作阳极,用于有机发光二极管的正电极。7. Physical vapor deposition of about 50nm thick ITO film, 15nm thick Ag film, and 50nm thick ITO film, and complete the patterning process to make anode, which is used as the positive electrode of organic light emitting diode.
八、涂布约1.5μm厚度的透明有机膜层作为像素定义层,完成其图形化 过程。像素定义层去掉的部分,露出的阳极,即为有机发光二极管正电极电流注入的有效区域。8. Coating a transparent organic film layer with a thickness of about 1.5μm as the pixel definition layer to complete the patterning process. The part removed from the pixel definition layer and the exposed anode is the effective area for current injection from the positive electrode of the organic light emitting diode.
九、涂布约1.5μm厚度的透明有机膜层作为像素定义层,完成其图形化过程。像素定义层去掉的部分,露出的阳极,即为有机发光二极管正电极电流注入的有效区域。9. Coating a transparent organic film layer with a thickness of about 1.5μm as the pixel definition layer to complete the patterning process. The part removed from the pixel definition layer and the exposed anode is the effective area for current injection from the positive electrode of the organic light emitting diode.
10、按照版图设计制作的金属网格的mask,利用热蒸镀的方式,将OLED有机层蒸镀在像素定义层露出的阳极上。10. The mask of the metal grid made according to the layout design, using the thermal evaporation method, the OLED organic layer is evaporated on the exposed anode of the pixel definition layer.
11、利用热蒸发的方式,将金属Mg、Ag合金蒸发到有机层上作为阴极。11. Using thermal evaporation, the metal Mg, Ag alloy is evaporated onto the organic layer as a cathode.
通过以上相关技术中的设计及工艺过程制造的AMOLED屏幕,会有以下问题发生:The AMOLED screen manufactured through the design and process of the above related technologies will have the following problems:
1、当包括可见光在内的光线从上穿过屏幕,例如需要被屏下的摄像头接收时,AMOLED像素中的金属会阻挡光线,导致摄像头接收不到足够的光。1. When light including visible light passes through the screen from above, for example, when it needs to be received by the camera under the screen, the metal in the AMOLED pixel will block the light, causing the camera to not receive enough light.
2、当屏下的LED灯发出光线需要穿透屏幕时,金属层也会阻挡光线穿透屏幕。2. When the LED light under the screen needs to penetrate the screen, the metal layer will also block the light from penetrating the screen.
基于上述问题,本公开利用透光导电材料制作连接线,设计了一种高透过率的新像素,在需要高穿透率的区域设置高穿透率新像素,其他区域设置传统的像素。从而不影响整体显示效果的情况下,达到应用例如屏下摄像头等目的。Based on the above-mentioned problems, the present disclosure uses light-transmitting conductive materials to make connection lines, and designs a new pixel with high transmittance. New pixels with high transmittance are set in areas that require high transmittance, and traditional pixels are set in other areas. Thus, without affecting the overall display effect, applications such as under-screen cameras can be achieved.
下面详细描述本公开实施例的AMOLED显示屏。The AMOLED display screen of the embodiment of the present disclosure is described in detail below.
参见图6至图10所示,本公开实施例提供了一种AMOLED显示屏,包括多个像素,其中至少一个像素为第一像素101,所述第一像素101包括第一走线层和第二走线层,所述第一走线层和第二走线层分隔设置,所述第一走线层上形成有第一电极走线1011和第一电极片,所述第二走线层上形成有第二电极走线1012和第二电极片,所述第一电极片和所述第二电极片至少部分重叠形成第一存储电容1013,所述第一电极走线1011、第二电极走线1012和第一存储电容1013中的至少一项采用透光导电材料制成。Referring to FIGS. 6 to 10, embodiments of the present disclosure provide an AMOLED display screen, which includes a plurality of pixels, at least one of which is a first pixel 101, and the first pixel 101 includes a first wiring layer and a second wiring layer. Two wiring layers, the first wiring layer and the second wiring layer are arranged separately, a first electrode wiring 1011 and a first electrode sheet are formed on the first wiring layer, the second wiring layer A second electrode trace 1012 and a second electrode sheet are formed thereon. The first electrode sheet and the second electrode sheet at least partially overlap to form a first storage capacitor 1013. The first electrode trace 1011 and the second electrode At least one of the wiring 1012 and the first storage capacitor 1013 is made of a transparent conductive material.
本公开实施例提供的AMOLED显示屏包括多个像素,该多个像素可以呈矩阵设置,该AMOLED显示屏的部分或者全部像素都可以设计为第一像素。上述第一电极走线1011为第一像素中gate1走线;上述第二电极走线1012为第 一像素中gate2走线。The AMOLED display screen provided by the embodiments of the present disclosure includes a plurality of pixels, and the plurality of pixels may be arranged in a matrix, and part or all of the pixels of the AMOLED display screen may be designed as first pixels. The first electrode wiring 1011 is the gate1 wiring in the first pixel; the second electrode wiring 1012 is the gate2 wiring in the first pixel.
应当说明的是,上述透光导电材料的具体类型可以根据实际需要进行设置,例如在一可选实施例中,上述透明导电材料可以为透明氧化铟锡ITO导电薄膜。It should be noted that the specific type of the above-mentioned transparent conductive material can be set according to actual needs. For example, in an optional embodiment, the above-mentioned transparent conductive material may be a transparent indium tin oxide ITO conductive film.
在本实施例中,上述第一像素可以包括多种设计方案,以下通过四个具体实例进行详细说明:In this embodiment, the above-mentioned first pixel may include a variety of design solutions, which will be described in detail through four specific examples below:
方案1:如图7所示,第一电极走线1011采用透光导电材料制成,上述第二电极走线1012和第一存储电容1013采用金属材料钼Mo制成;这样由于增强了第一电极走线1011的透光性,从而增加了第一像素101的透光性。Solution 1: As shown in Figure 7, the first electrode trace 1011 is made of light-transmitting conductive material, and the second electrode trace 1012 and the first storage capacitor 1013 are made of the metallic material molybdenum Mo; The light transmittance of the electrode wiring 1011 increases the light transmittance of the first pixel 101.
方案2:如图9所示,第二电极走线1012采用透光导电材料制成,上述第一电极走线1011和第一存储电容1013采用金属材料钼Mo制成;这样由于增强了第二电极走线1012的透光性,从而增加了第一像素101的透光性。Solution 2: As shown in Figure 9, the second electrode wiring 1012 is made of light-transmitting conductive material, and the first electrode wiring 1011 and the first storage capacitor 1013 are made of the metallic material molybdenum Mo; The light transmittance of the electrode wiring 1012 increases the light transmittance of the first pixel 101.
方案3,如图10所示,第一存储电容1013采用透光导电材料制成,第一电极走线1011和第二电极走线1012采用金属材料钼Mo制成。这样由于增强了第一存储电容1013的透光性,从而增加了第一像素101的透光性。 Scheme 3, as shown in FIG. 10, the first storage capacitor 1013 is made of a light-transmitting conductive material, and the first electrode wiring 1011 and the second electrode wiring 1012 are made of the metallic material molybdenum Mo. In this way, since the light transmittance of the first storage capacitor 1013 is enhanced, the light transmittance of the first pixel 101 is increased.
方案4,第一电极走线1011、第二电极走线1012和第一存储电容1013均采用透光导电材料制成,这样可以最大限度地增加了第一像素101的透光性。 Solution 4, the first electrode wiring 1011, the second electrode wiring 1012, and the first storage capacitor 1013 are all made of light-transmitting conductive material, which can maximize the light transmittance of the first pixel 101.
本实施例中,由于将第一像素中的第一电极走线1011、第二电极走线1012和第一存储电容1013中至少一项采用透光导电材料制成,这样可以提高第一像素区域的透光度。因此可以满足感光元件或者光源等部件的透光性需求,感光元件和发光元件等部件可以集成到屏下,利于整体结构布局。In this embodiment, since at least one of the first electrode wiring 1011, the second electrode wiring 1012 and the first storage capacitor 1013 in the first pixel is made of light-transmitting conductive material, the area of the first pixel can be increased. Light transmittance. Therefore, the light transmission requirements of components such as photosensitive elements or light sources can be met, and components such as photosensitive elements and light-emitting elements can be integrated under the screen, which is beneficial to the overall structure layout.
进一步的,基于上述实施例,本实施例中,上述多个像素中至少一个像素为第二像素102,所述第二像素102包括第三走线层和第四走线层,所述第三走线层上形成有第三电极走线1021和第三电极片,所述第四走线层上形成有第四电极走线1022和第四电极片,所述第三电极片和所述第四电极片至少部分重叠形成第二存储电容1023;所述第一电极走线1011和第三电极走线1021位于同一层,且所述第一电极走线1011与所述第三电极走线1021导电连接;所述第二电极走线1012和所述第四电极走线1022位于同一层,且 所述第二电极走线1012和所述第四电极走线1022导电连接。Further, based on the above-mentioned embodiment, in this embodiment, at least one of the above-mentioned multiple pixels is the second pixel 102, and the second pixel 102 includes a third wiring layer and a fourth wiring layer. A third electrode trace 1021 and a third electrode sheet are formed on the wiring layer, and a fourth electrode trace 1022 and a fourth electrode sheet are formed on the fourth wiring layer. The third electrode sheet and the first electrode sheet are The four electrode sheets at least partially overlap to form a second storage capacitor 1023; the first electrode wiring 1011 and the third electrode wiring 1021 are located in the same layer, and the first electrode wiring 1011 and the third electrode wiring 1021 Conductive connection; the second electrode trace 1012 and the fourth electrode trace 1022 are located in the same layer, and the second electrode trace 1012 and the fourth electrode trace 1022 are conductively connected.
应当说明的是,上述第三电极走线1021、第四电极走线1022和所述第二存储电容1023所采用的材质可以根据实际需要进行设置,例如,在本实施例中,第三电极走线1021、第四电极走线1022和所述第二存储电容1023可以均采用金属材料钼Mo制成。It should be noted that the materials used for the third electrode wiring 1021, the fourth electrode wiring 1022, and the second storage capacitor 1023 can be set according to actual needs. For example, in this embodiment, the third electrode wiring The wire 1021, the fourth electrode wire 1022, and the second storage capacitor 1023 may all be made of the metallic material molybdenum Mo.
上述第三电极走线1021为第二像素中gate1走线;上述第四电极走线1032为第二像素中gate2走线。The third electrode wiring 1021 is a gate1 wiring in the second pixel; the fourth electrode wiring 1032 is a gate2 wiring in the second pixel.
上述第一电极走线1011与所述第三电极走线1021导电连接的方式可以根据实际需要进行设置,例如,在本实施例中,可以第一电极走线1011与所述第三电极走线1021部分重叠,且所述第一电极走线1011与所述第三电极走线1021在重叠部位导电连接。The conductive connection between the first electrode trace 1011 and the third electrode trace 1021 can be set according to actual needs. For example, in this embodiment, the first electrode trace 1011 can be connected to the third electrode trace 1021. 1021 partially overlaps, and the first electrode trace 1011 and the third electrode trace 1021 are conductively connected at the overlapping portion.
在一可选实施例中,可以首先做第三电极走线1021,具体流程为:首先做MO金属层,然后光刻、刻蚀、去胶形成gate1的金属走线(即第三电极走线);接着形成ITO的薄膜,最后通过光刻、刻蚀、去胶形成ITO的走线(即上述第一电极走线),ITO走线搭接在Mo走线上形成导电连接。In an alternative embodiment, the third electrode trace 1021 can be made first. The specific process is: first make the MO metal layer, and then lithography, etch, and de-glue to form the metal trace of gate1 (that is, the third electrode trace ); Then a thin film of ITO is formed, and finally ITO traces are formed by photolithography, etching, and de-glueing (that is, the first electrode traces mentioned above), and the ITO traces overlap the Mo traces to form a conductive connection.
本实施例中,由于将第一电极走线1011与所述第三电极走线1021部分重叠,且所述第一电极走线1011与所述第三电极走线1021在重叠部位导电连接,这样可以在制作完第三电极走线1021后直接制作第一电极走线1011,利用第一电极走线1011与第三电极走线1021搭接从而实现导电连接,这样制作工艺简单,降低了AMOLED显示屏的制造难度。In this embodiment, since the first electrode wiring 1011 and the third electrode wiring 1021 are partially overlapped, and the first electrode wiring 1011 and the third electrode wiring 1021 are conductively connected at the overlapping portion, such The first electrode wiring 1011 can be made directly after the third electrode wiring 1021 is made, and the first electrode wiring 1011 is overlapped with the third electrode wiring 1021 to achieve conductive connection. This makes the manufacturing process simple and reduces the AMOLED display The difficulty of manufacturing the screen.
本实施例,由于在AMOLED显示屏上同时存在第一像素101和第二像素102,这样,可以避免屏幕全面采用ITO材料,导致gate1走线电阻过大导致显示不良的问题。In this embodiment, since the first pixel 101 and the second pixel 102 exist on the AMOLED display screen at the same time, it is possible to avoid the problem of using ITO materials on the screen, which leads to excessive wiring resistance of gate1 and poor display.
同样的,上述第二电极走线1012与所述第四电极走线1022部分重叠,且在重叠部位导电连接。具体的,第二电极走线1012与第四电极走线1022的制作过程可以参照第一电极走线1011与第三电极走线1021的制作过程,在此不再赘述。Similarly, the second electrode trace 1012 and the fourth electrode trace 1022 partially overlap, and are electrically connected at the overlapping portion. Specifically, the manufacturing process of the second electrode wiring 1012 and the fourth electrode wiring 1022 can refer to the manufacturing process of the first electrode wiring 1011 and the third electrode wiring 1021, which will not be repeated here.
本实施例,由于在AMOLED显示屏上同时存在第一像素101和第二像素102,这样,可以避免屏幕全面采用ITO材料,导致gate2走线电阻过大导致 显示不良的问题。In this embodiment, since the first pixel 101 and the second pixel 102 exist on the AMOLED display screen at the same time, it is possible to avoid the problem of using ITO materials on the screen, which leads to excessive wiring resistance of gate2 and poor display.
在上述方案3中,将第一存储电容1013设置为ITO材料,具体的将第一存储电容的gate1电极和/或gate2电极同时设置为ITO材料。由于第一存储电容1013的面积较大,将第一存储电容1013采用ITO材料制作成透明电极可以大幅度增加第一像素101的透光率。In the above solution 3, the first storage capacitor 1013 is set as an ITO material, and specifically the gate1 electrode and/or gate2 electrode of the first storage capacitor are set as an ITO material at the same time. Since the area of the first storage capacitor 1013 is relatively large, making the first storage capacitor 1013 a transparent electrode made of ITO material can greatly increase the light transmittance of the first pixel 101.
应当说明的,上述第一像素101和第二像素102的数量可以根据实际需要进行设置,例如,在本实施例中,上述第一像素101的数量小于所述第二像素102电极的数量。It should be noted that the number of the first pixels 101 and the second pixels 102 can be set according to actual needs. For example, in this embodiment, the number of the first pixels 101 is smaller than the number of the electrodes of the second pixel 102.
在本实施例中,可以将小区域内的像素设置的第一像素101,其余部分的像素设置为第二像素102,如图6所示,A区域的4个像素为第一像素101,其余像素为第二像素102。这样保证小部分像素的第一电极走线1011和/或第二电极走线1012和/或第一存储电容1013采用ITO材料,使得小块的部分区域使用高穿透率像素,对屏幕整体的显示影响较小,同时大幅度提高屏下器件屏区域的透光率。In this embodiment, the pixels in the small area can be set as the first pixel 101, and the remaining pixels can be set as the second pixel 102. As shown in FIG. 6, the 4 pixels in the area A are the first pixel 101, and the remaining pixels It is the second pixel 102. This ensures that the first electrode trace 1011 and/or the second electrode trace 1012 and/or the first storage capacitor 1013 of a small part of the pixels are made of ITO material, so that a small part of the area uses high-transmittance pixels, which is very important for the overall screen The display effect is small, and the light transmittance of the device screen area under the screen is greatly improved.
进一步的,基于上述实施例,本实施例中,上述AMOLED显示屏还包括源漏极走线,所述源漏极走线采用所述透光导电材料制成。Further, based on the above-mentioned embodiment, in this embodiment, the above-mentioned AMOLED display screen further includes source-drain wiring, and the source-drain wiring is made of the transparent conductive material.
需要说明的是,本公开实施例中介绍的多种可选的实施方式,彼此可以相互结合实现,也可以单独实现,对此本公开实施例不作限定。It should be noted that the various optional implementation manners introduced in the embodiments of the present disclosure can be implemented in combination with each other or can be implemented separately, and the embodiments of the present disclosure are not limited.
本公开实施例还提供一种显示设备,该显示设备包括AMOLED显示屏。该AMOLED显示屏为上述实施例中的AMOLED显示屏,其结构可以参照上述实施例中的AMOLED显示屏。由于采用上述实施例中的AMOLED显示屏,因此本公开实施例提供的显示设也同样具有上述实施例中AMOLED显示屏全部的有益效果,在此不再赘述。The embodiment of the present disclosure also provides a display device, which includes an AMOLED display screen. The AMOLED display screen is the AMOLED display screen in the foregoing embodiment, and its structure can refer to the AMOLED display screen in the foregoing embodiment. Since the AMOLED display screen in the above-mentioned embodiment is adopted, the display device provided in the embodiment of the present disclosure also has all the beneficial effects of the AMOLED display screen in the above-mentioned embodiment, which will not be repeated here.
本公开实施例还提供一种移动终端,该移动终端包括AMOLED显示屏和感光元件,所述感光元件设于所述AMOLED显示屏下方,所述AMOLED显示屏对应所述感光元件位置的像素均为所述第一像素。该AMOLED显示屏为上述实施例中的AMOLED显示屏,其结构可以参照上述实施例中的AMOLED显示屏。由于采用上述实施例中的AMOLED显示屏,因此本公开实施例提供的移动终端由于将感光元件位置对于的像素设置为第一像素,从而可以满足感光元件的透 光性需求,从而使得感光元件可以集成到屏下,利于整体结构布局。The embodiment of the present disclosure also provides a mobile terminal, the mobile terminal includes an AMOLED display screen and a photosensitive element, the photosensitive element is arranged under the AMOLED display screen, the AMOLED display screen corresponds to the pixels of the photosensitive element position The first pixel. The AMOLED display screen is the AMOLED display screen in the foregoing embodiment, and its structure can refer to the AMOLED display screen in the foregoing embodiment. Since the AMOLED display screen in the above-mentioned embodiment is adopted, the mobile terminal provided by the embodiment of the present disclosure sets the pixel corresponding to the position of the photosensitive element as the first pixel, so that the light transmittance requirement of the photosensitive element can be met, so that the photosensitive element can be Integration into the screen is conducive to the overall structure layout.
可以理解的是,上述感光元件可以为摄像头、光敏传感器或红外线传感器。It can be understood that the above-mentioned photosensitive element may be a camera, a photosensitive sensor or an infrared sensor.
本公开实施例还提供一种移动终端,该移动终端包括AMOLED显示屏和发光元件,所述发光元件设于所述AMOLED显示屏下方,所述AMOLED显示屏对应所述发光元件位置的像素均为所述第一像素。该AMOLED显示屏为上述实施例中的AMOLED显示屏,其结构可以参照上述实施例中的AMOLED显示屏。由于采用上述实施例中的AMOLED显示屏,因此本公开实施例提供的移动终端由于将发光元件位置对于的像素设置为第一像素,从而可以满足发光元件的透光性需求,从而使得发光元件可以集成到屏下,利于整体结构布局。The embodiment of the present disclosure also provides a mobile terminal, the mobile terminal includes an AMOLED display screen and a light-emitting element, the light-emitting element is arranged under the AMOLED display screen, the AMOLED display screen corresponds to the pixels of the light-emitting element position The first pixel. The AMOLED display screen is the AMOLED display screen in the foregoing embodiment, and its structure can refer to the AMOLED display screen in the foregoing embodiment. Since the AMOLED display screen in the above-mentioned embodiment is adopted, the mobile terminal provided by the embodiment of the present disclosure sets the pixel corresponding to the position of the light-emitting element as the first pixel, so that the light-transmitting requirement of the light-emitting element can be met, so that the light-emitting element can Integration into the screen is conducive to the overall structure layout.
需说明的是,本公开实施例中的移动终端包括但不限于手机、平板电脑、笔记本电脑、掌上电脑、车载终端、可穿戴设备以及计步器等。It should be noted that the mobile terminals in the embodiments of the present disclosure include, but are not limited to, mobile phones, tablet computers, notebook computers, palmtop computers, vehicle-mounted terminals, wearable devices, and pedometers.
上面结合附图对本公开的实施例进行了描述,但是本公开并不局限于上述的具体实施方式,上述的具体实施方式仅仅是示意性的,而不是限制性的,本领域的普通技术人员在本公开的启示下,在不脱离本公开宗旨和权利要求所保护的范围情况下,还可做出很多形式,均属于本公开的保护之内。The embodiments of the present disclosure are described above with reference to the accompanying drawings, but the present disclosure is not limited to the above-mentioned specific embodiments. The above-mentioned specific embodiments are only illustrative and not restrictive. Those of ordinary skill in the art are Under the enlightenment of the present disclosure, many forms can be made without departing from the purpose of the present disclosure and the scope of protection of the claims, all of which fall within the protection of the present disclosure.

Claims (11)

  1. 一种AMOLED显示屏,包括多个像素,其中至少一个像素为第一像素,所述第一像素包括第一走线层和第二走线层,所述第一走线层和第二走线层分隔设置,所述第一走线层上形成有第一电极走线和第一电极片,所述第二走线层上形成有第二电极走线和第二电极片,所述第一电极片和所述第二电极片至少部分重叠形成第一存储电容,所述第一电极走线、第二电极走线和第一存储电容中的至少一项采用透光导电材料制成。An AMOLED display screen includes a plurality of pixels, at least one of which is a first pixel, the first pixel includes a first wiring layer and a second wiring layer, the first wiring layer and the second wiring layer Layer separation, the first wiring layer is formed with a first electrode wiring and a first electrode sheet, the second wiring layer is formed with a second electrode wiring and a second electrode sheet, the first The electrode sheet and the second electrode sheet at least partially overlap to form a first storage capacitor, and at least one of the first electrode trace, the second electrode trace, and the first storage capacitor is made of a light-transmitting conductive material.
  2. 根据权利要求1所述的AMOLED显示屏,其中,所述透光导电材料为透明氧化铟锡ITO导电薄膜。The AMOLED display screen of claim 1, wherein the light-transmitting conductive material is a transparent indium tin oxide ITO conductive film.
  3. 根据权利要求1所述的AMOLED显示屏,其中,所述多个像素中至少一个像素为第二像素,所述第二像素包括第三走线层和第四走线层,所述第三走线层上形成有第三电极走线和第三电极片,所述第四走线层上形成有第四电极走线和第四电极片,所述第三电极片和所述第四电极片至少部分重叠形成第二存储电容;所述第一电极走线和第三电极走线位于同一层,且所述第一电极走线与所述第三电极走线导电连接;所述第二电极走线和所述第四电极走线位于同一层,且所述第二电极走线和所述第四电极走线导电连接。The AMOLED display screen of claim 1, wherein at least one pixel of the plurality of pixels is a second pixel, and the second pixel includes a third wiring layer and a fourth wiring layer, and the third wiring layer A third electrode trace and a third electrode sheet are formed on the wire layer, a fourth electrode trace and a fourth electrode sheet are formed on the fourth wiring layer, the third electrode sheet and the fourth electrode sheet At least partially overlapped to form a second storage capacitor; the first electrode wiring and the third electrode wiring are located on the same layer, and the first electrode wiring and the third electrode wiring are conductively connected; the second electrode The wiring and the fourth electrode wiring are located on the same layer, and the second electrode wiring and the fourth electrode wiring are conductively connected.
  4. 根据权利要求3所述的AMOLED显示屏,其中,所述第三电极走线、第四电极走线和所述第二存储电容均采用金属材料钼制成。4. The AMOLED display screen of claim 3, wherein the third electrode wiring, the fourth electrode wiring and the second storage capacitor are all made of molybdenum, a metal material.
  5. 根据权利要求3所述的AMOLED显示屏,其中,所述第一电极走线与所述第三电极走线部分重叠,且所述第一电极走线与所述第三电极走线在重叠部位电连接。The AMOLED display screen according to claim 3, wherein the first electrode trace and the third electrode trace partially overlap, and the first electrode trace and the third electrode trace are in the overlapping portion Electric connection.
  6. 根据权利要求3所述的AMOLED显示屏,其中,所述第二电极走线与所述第四电极走线部分重叠,且所述第二电极走线与所述第四电极走线在重叠部位电连接。The AMOLED display screen according to claim 3, wherein the second electrode trace and the fourth electrode trace partially overlap, and the second electrode trace and the fourth electrode trace are in the overlapping position Electric connection.
  7. 根据权利要求1-6中任一项所述的AMOLED显示屏,还包括源漏极走线,所述源漏极走线采用所述透光导电材料制成。The AMOLED display screen according to any one of claims 1 to 6, further comprising source and drain wirings, and the source and drain wirings are made of the transparent conductive material.
  8. 一种显示设备,包括如权利要求1-7中任一项所述的AMOLED显示屏。A display device comprising the AMOLED display screen according to any one of claims 1-7.
  9. 一种移动终端,包括显示屏和感光元件,所述显示屏为根据权利要求 1-7中任一项所述的AMOLED显示屏,所述感光元件设于所述AMOLED显示屏下方,所述AMOLED显示屏对应所述感光元件位置的像素均为所述第一像素。A mobile terminal, comprising a display screen and a photosensitive element, the display screen being the AMOLED display screen according to any one of claims 1-7, the photosensitive element being arranged below the AMOLED display screen, and the AMOLED The pixels at the position of the display screen corresponding to the photosensitive element are all the first pixels.
  10. 根据权利要求9所述的移动终端,其中,所述感光元件为摄像头、光敏传感器或红外线传感器。The mobile terminal according to claim 9, wherein the photosensitive element is a camera, a photosensitive sensor or an infrared sensor.
  11. 一种移动终端,包括显示屏和发光元件,所述显示屏为根据权利要求1-7中任一项所述的AMOLED显示屏,所述发光元件设于所述AMOLED显示屏下方,所述AMOLED显示屏对应所述发光元件位置的像素均为所述第一像素。A mobile terminal, comprising a display screen and a light-emitting element, the display screen is the AMOLED display screen according to any one of claims 1-7, the light-emitting element is arranged under the AMOLED display screen, and the AMOLED The pixels at the position of the display screen corresponding to the light-emitting element are all the first pixels.
PCT/CN2020/082076 2019-04-03 2020-03-30 Amoled display screen, display device and mobile terminal WO2020200168A1 (en)

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