WO2020199525A1 - 支撑组件及采用该支撑组件的掩膜板支架 - Google Patents

支撑组件及采用该支撑组件的掩膜板支架 Download PDF

Info

Publication number
WO2020199525A1
WO2020199525A1 PCT/CN2019/107063 CN2019107063W WO2020199525A1 WO 2020199525 A1 WO2020199525 A1 WO 2020199525A1 CN 2019107063 W CN2019107063 W CN 2019107063W WO 2020199525 A1 WO2020199525 A1 WO 2020199525A1
Authority
WO
WIPO (PCT)
Prior art keywords
hole
block
adjusting
support assembly
adjustment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2019/107063
Other languages
English (en)
French (fr)
Inventor
司纪禹
王宝友
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kunshan Govisionox Optoelectronics Co Ltd
Original Assignee
Kunshan Govisionox Optoelectronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kunshan Govisionox Optoelectronics Co Ltd filed Critical Kunshan Govisionox Optoelectronics Co Ltd
Publication of WO2020199525A1 publication Critical patent/WO2020199525A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Definitions

  • This application relates to the technical field of coating equipment, and in particular to a support assembly and a mask holder using the support assembly.
  • the coating process is an important method for preparing thin film materials.
  • the organic light-emitting diode (OLED) organic material can be deposited on a predetermined position on the substrate through a coating process such as evaporation.
  • the coating process needs to use a corresponding mask.
  • Mask The mask holder of the existing coating equipment that carries the Mask realizes the support and positioning of the Mask through a corresponding support structure and positioning pins (Pin).
  • the position adjustment of the positioning pins is inconvenient and the on-site operation is complicated.
  • the purpose of the present application is to provide a support assembly and a mask bracket adopting the support assembly to facilitate position adjustment and fixation of positioning pins.
  • this application provides a supporting assembly, including:
  • the adjustment block is movably arranged on the base
  • a first adjustment mechanism capable of driving the adjustment block to move in a first direction, the first direction being parallel to the surface of the support assembly for supporting the object to be supported;
  • a second adjustment mechanism capable of driving the adjustment block to move in a second direction, the second direction being parallel to the surface of the support assembly for supporting the object to be supported and perpendicular to the first direction;
  • the locking mechanism can lock the adjusting block on the base.
  • the present application also provides a mask holder for positioning and carrying a corresponding mask.
  • the mask holder includes a supporting frame, the supporting component and a positioning pin, and the supporting component is fixed to the supporting frame The positioning pin is installed on the adjusting block.
  • the beneficial effects of the present application are: using the supporting assembly and the mask bracket of the present application, the horizontal position of the adjusting block and the positioning pin can be adjusted through the first adjusting mechanism and the second adjusting mechanism, which improves the efficiency of on-site maintenance and reduces equipment Downtime, improve the utilization rate; the adjustment block is also fixed by a locking mechanism to avoid possible position deviation in the working process, improve the possible jam phenomenon when the mask is taken and put, and improve the input accuracy.
  • Figure 1 is a schematic diagram of the structure of the mask holder of this application.
  • Fig. 2 is a schematic diagram of an enlarged structure of area A in Fig. 1;
  • Figure 3 is a schematic diagram of the structure of the supporting component of the application.
  • Fig. 4 is a schematic diagram of an exploded structure of the supporting assembly in Fig. 3;
  • Figure 5 is a schematic diagram of the structure of the base in the supporting assembly of the present application.
  • the mask holder 100 provided by the present application is used to position and carry a corresponding mask (not shown), and the mask holder 100 includes a supporting frame 10 and fixed on the The supporting assembly 20 on the supporting frame 10 is supported.
  • the supporting assembly 20 includes a base 21 and an adjusting block 22 movably arranged on the base 21 in a horizontal direction.
  • the mask holder 100 further includes a positioning pin 30 installed on the adjusting block 22, and the position of the positioning pin 30 can be adjusted by the movement of the adjusting block 22.
  • the mask is provided with a number of positioning holes, and the positioning pins 30 correspond to the positions of the positioning holes.
  • the mask is placed horizontally for description. However, this application is not limited to placing the mask plate horizontally. It can be understood that regardless of whether the mask plate or other supported objects are placed horizontally, the movable direction of the adjustment block 22 is parallel to the direction in which the supporting assembly 20 is used to support the supported object. The surface of the object is sufficient.
  • the support assembly 100 further includes a first adjustment mechanism for driving the adjustment block 22 to move in a first horizontal direction, and a second adjustment mechanism for driving the adjustment block 22 to move in a second horizontal direction perpendicular to the first horizontal direction.
  • the horizontal positions of the adjusting block 22 and the positioning pin 30 are precisely adjusted by the first adjusting mechanism and the second adjusting mechanism, which can avoid friction with the positioning pin 30 during the pick-up and place process of the mask, which may cause jamming , To ensure the position accuracy of the mask plate into the coating chamber.
  • the adjustment block 22 is fixed by the locking mechanism, which can keep the position of the positioning pin 30 stable, preventing the positioning pin 30 from shifting in position when contacting and colliding with the mask, and reducing maintenance requirements.
  • the base 21 has a supporting part 211 for installing the adjusting block 22 and a fixing part 212 fixed to the supporting frame 10.
  • the height of the adjusting block 22 is not lower than the supporting portion 211 of the base 21, so as to prevent the base 21 from affecting the positioning and placing of the mask, and even causing the mask. Surface damage.
  • the upper end of the positioning pin 30 (that is, the end in contact with the mask plate) is provided in a ball shape (Ball Pin), and the portion of the upper end spherical surface of the positioning pin 30 is larger than that of the aforementioned mask plate.
  • Positioning holes that is, when the mask is placed on the supporting station of the mask holder 100, the mask does not contact the base 21 and the adjusting block 22, but only presses against the The positioning pin 30 is on.
  • the spherical surface of the upper end of the positioning pin 30 can play a guiding role in the process of taking and placing the mask, effectively avoiding the phenomenon of blocking of the mask.
  • the adjusting block 22 is formed with a mounting hole 221 along the vertical direction, the shape of the mounting hole 21 can be adapted to the shape of the positioning pin 30, so that the positioning pin 30 can Inserted into the mounting hole 221.
  • the mounting hole 21 is circular.
  • the base 21 is further formed with a first through hole 213 corresponding to the position of the mounting hole 221 along the vertical direction. The size of the first through hole 213 is such that when the adjusting block 22 performs position adjustment, The moving range of the mounting hole 221 in the horizontal direction does not exceed the range defined by the first through hole 213, that is, so that the base 21 will not affect the mounting of the positioning pin 30.
  • the first adjusting mechanism may include a first adjusting bolt 23 extending in a first horizontal direction, and the first adjusting bolt 23 is fixed in position relative to the base 21 in the first horizontal direction.
  • the second adjusting mechanism may include a second adjusting bolt 24 that extends along a second horizontal direction and is fixedly disposed relative to the base 21 in the second horizontal direction. The adjustment of the position of the adjustment block 22 in the horizontal direction can be achieved by the rotation of the first adjustment bolt 23 and/or the second adjustment bolt 24.
  • the adjusting block 22 may be formed with a first adjusting hole 222 which cooperates with the first adjusting bolt 23 along the first horizontal direction.
  • the first adjusting bolt 23 extends into the first adjusting hole 222 and can be rotated by rotating the The first adjusting bolt 23 moves the adjusting block 22 in the first horizontal direction.
  • the first adjusting bolt 23 may be threadedly connected with the first adjusting hole 222.
  • the adjusting block 22 in order to match the height position of the first adjusting bolt 23, the adjusting block 22 may be formed with a downwardly protruding protrusion 223, and the first adjusting hole 222 may be opened in the protrusion 223 on.
  • the first adjustment mechanism may further include a first fixing block 25 fixed on the base 21.
  • the first fixing block 25 can be detachably fixed on the base 21.
  • the first fixing block 25 and the base 21 may jointly define a sliding through groove 26, the opening direction of the sliding through groove 26 may be the first horizontal direction, and the length direction of the sliding through groove 26 may be the The second horizontal direction.
  • One end of the first adjusting bolt 23 may pass through the sliding through slot 26 to extend into the first adjusting hole 222.
  • the first adjusting bolt 23 can move in the second horizontal direction in the sliding through groove 26.
  • the second adjusting mechanism drives the adjusting block 22 to move in the second horizontal direction
  • the first adjusting bolt 23 is driven by the adjusting block 22 in the sliding passage 26 along the second horizontal direction. mobile.
  • the second adjustment mechanism may further include a driving block 27 that is fixed in a second horizontal direction and relative to the adjustment block 22, and the driving block 27 is relative to the base 21 in the second horizontal direction. it can move. Further, the adjusting block 22 can also move back and forth in a first horizontal direction relative to the driving block 27.
  • the driving block 27 is formed with a second adjusting hole 271 that cooperates with the second adjusting bolt 24 along the second horizontal direction, and the second adjusting bolt 24 extends into the second adjusting hole 271 so that it can pass through the rotating shaft.
  • the second adjusting bolt 24 drives the driving block 27 and the adjusting block 22 to move along the second horizontal direction.
  • the base 21 is formed with a first sliding groove 214 that cooperates with the driving block 27, and the first sliding groove 214 may extend along the second horizontal direction.
  • the driving block 27 may be disposed in the first sliding groove 214 and movable along the second horizontal direction in the first sliding groove 214.
  • the width of the first sliding groove 214 in the first horizontal direction is adapted to the width of the driving block 27 in the first horizontal direction, so that the driving block 27 is positioned in the first sliding groove. Movement within 214 is more stable.
  • the upper surface of the driving block 27 is formed with a second sliding groove 272 extending along the first horizontal direction, and the adjusting block 22 is protruding downward to form a second sliding groove 272 inserted into it.
  • the driving block 27 remains stationary, and the sliding part 224 slides in the second sliding groove 272 along the first horizontal direction.
  • the cross-sections of the second sliding groove 272 and the sliding portion 224 perpendicular to the first horizontal direction and the second horizontal direction are all trapezoids with a narrow top and a wide bottom, so that the sliding portion 224 is engaged. In the second sliding groove 272, it is avoided that the sliding portion 224 and the second sliding groove 272 are accidentally separated.
  • the second adjusting mechanism further includes a second fixing block 28 fixed on the base 21, and the second adjusting bolt 24 is disposed between the second fixing block 28 and the base 21.
  • the second fixing block 28 can be detachably fixed on the base 21.
  • the second fixing block 28 and the base 21 may jointly define a second through hole 282, and one end of the second adjusting bolt 24 may pass through the second through hole 282 to extend into the second adjusting hole 271 in.
  • the second adjusting bolt 24 may also be directly connected to the adjusting block 22 to adjust the position of the adjusting block 22 in the second horizontal direction; the first adjusting mechanism may also be equipped with Another driving block (not shown) is provided.
  • the first adjusting bolt 23 can be connected to another driving block, and the adjusting block 22 is driven to move along the first horizontal direction by the other driving block, which will not be repeated here. .
  • the base 21, the first fixing block 25, and the second fixing block 28 jointly define an installation groove, and the adjustment block 22 may be disposed in the installation groove.
  • the base 21, the first fixing block 25 and the second fixing block 28 may also be integrally formed.
  • the locking mechanism may include a locking bolt 29.
  • a first strip-shaped hole 225 may be formed on the adjusting block 22, the opening direction of the first strip-shaped hole 225 may be a vertical direction, and the length direction may be the first horizontal direction.
  • a second strip-shaped hole 215 may be formed on the base 21. The opening direction of the first strip-shaped hole 225 may be a vertical direction, and the length direction may be the second horizontal direction. The position of the first strip hole 225 may correspond to the position of the second strip hole 215, so that when the adjustment block 22 moves, the first strip hole 225 and the second strip hole The holes 215 can always remain partially overlapped.
  • the locking bolt 29 can pass through the first strip hole 225 and enter the second strip hole 215, so that the adjusting block 222 can neither move in the first horizontal direction nor along the The second direction movement.
  • the widths of the first strip hole 225 and the second strip hole 215 are matched with the diameter of the locking bolt 29 to lock the adjustment block 22 more effectively.
  • the locking bolt 29 does not exceed the upper surface of the adjusting block 22 in the vertical direction, so as to prevent the locking bolt 29 from contacting the mask plate.
  • the first strip hole 225 is formed with a first step 226 that cooperates with the locking bolt 29, and the nut of the locking bolt 29 can abut against the first step 226
  • the width of the first strip-shaped hole 225 corresponds to the width of the first step 226 in the first strip-shaped hole 225 along the second horizontal direction.
  • a corresponding second step 216 (as shown in FIG. 5) can also be formed in the second strip hole 215 on the base 21, and the lower end of the locking bolt 29 can abut the second step 216 , So that the lower end of the locking bolt 29 does not exceed the lower surface of the base 21.
  • the first strip hole 225 and the second strip hole 215 are both set to four (the locking bolts 29 are not all shown).
  • the adjustment block 22, the base The specification structure of the seat 21 reasonably adjusts and designs the number and positions of the first strip-shaped holes 225 and the second strip-shaped holes 215, so that the adjustment block 22 can achieve position lock after the adjustment in the horizontal direction is completed.
  • the side wall of the mounting hole 221 may also be formed with a pressing hole 227, the pressing hole 227 is equipped with a corresponding jack bolt (not shown), and the jack bolt is held against the mounting hole 221
  • the positioning pin 30 installed inside can more effectively prevent the positioning pin 30 from moving.
  • the support assembly 20 of the mask holder 100 of the present application can adjust the horizontal position of the adjustment block 22 through the first adjustment mechanism and the second adjustment mechanism, thereby realizing the position adjustment of the positioning pin 30 installed on the adjustment block 22. Improve on-site maintenance efficiency, reduce equipment downtime, increase utilization rate and actual production capacity.
  • the adjustment block 22 can also be fixed by a locking mechanism to avoid possible position deviation of the positioning pin 30 during the mask picking and placing process, reduce possible jams, and improve the accuracy of mask introduction .

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

本申请提供了一种支撑组件及采用该支撑组件的掩膜板支架，所述支撑组件包括基座；调节块，可移动地设置在所述基座上；第一调节机构，能够驱使所述调节块沿第一方向移动，所述第一方向平行于所述支撑组件用于支撑被支撑物的表面；第二调节机构，能够驱使所述调节块沿第二方向移动，所述第二方向平行于所述支撑组件用于支撑所述被支撑物的所述表面且垂直于所述第一方向；和锁紧机构，能够将所述调节块锁定在所述基座上。所述支撑组件及掩膜板支架便于所述定位销的位置调节，提高工作效率，降低维护时间。

Description

支撑组件及采用该支撑组件的掩膜板支架
相关申请
本申请要求2019年03月29日申请的，申请号为201920414848.7，名称为“支撑组件及采用该支撑组件的掩膜板支架”的中国专利申请的优先权，在此将其全文引入作为参考。
技术领域
本申请涉及镀膜设备技术领域，特别涉及一种支撑组件及采用该支撑组件的掩膜板支架。
背景技术
镀膜工艺是一种重要的薄膜材料制备方法，例如有机发光二极管(Organic Light-Emitting Diode，OLED)的有机材料就可以通过蒸镀等镀膜工艺沉积在基板的既定位置，镀膜工艺需采用相应的掩膜板(Mask)。现有镀膜设备承载Mask的掩膜板支架通过相应的支撑结构及定位销(Pin)实现Mask的支撑与定位，然而定位销的位置调节不便，现场操作复杂。
申请内容
本申请目的在于提供一种支撑组件及采用该支撑组件的掩膜板支架，便于对定位销进行位置调节与固定。
为实现上述申请目的，本申请提供一种支撑组件，包括：
基座；
调节块，可移动地设置在所述基座上；
第一调节机构，能够驱使所述调节块沿第一方向移动，所述第一方向平行于所述支撑组件用于支撑被支撑物的表面；
第二调节机构，能够驱使所述调节块沿第二方向移动，所述第二方向平行于所述支撑组件用于支撑所述被支撑物的所述表面且垂直于所述第一方向；
锁紧机构，能够将所述调节块锁定在所述基座上。
本申请还提供一种掩膜板支架，用以定位并承载相应的掩膜板，所述掩膜板支架包括承载框架、所述支撑组件以及定位销，所述支撑组件固定在所述承载框架上，所述定位销安装在所述调节块上。
本申请的有益效果是：采用本申请支撑组件及掩膜板支架，通过所述第一调节机构与第二调节机构可对调节块及定位销的水平位置进行调节，提升现场维护效率，减少设备宕机时间，提高稼动率；所述调节块还通过锁紧机构进行固定，避免工作进程中可能出现的位置偏移，改善掩膜板取放时可能出现的卡顿现象，提高传入精度。
附图说明
图1为本申请掩膜板支架的结构示意图；
图2为图1中A区域的放大结构示意图；
图3为本申请支撑组件的结构示意图；
图4为图3中支撑组件的分解结构示意图；
图5为本申请支撑组件中基座的结构示意图。
具体实施方式
为了使本申请的目的、技术方案及优点更加清楚明白，以下通过实施例，并结合附图，对本申请进行进一步详细说明。应当理解，此处所描述的具体实施例仅用以解释本申请，并不用于限定本申请。
参图1与图2所示，本申请提供的掩膜板支架100用以定位并承载相应的掩膜板(图未示)，所述掩膜板支架100包括承载框架10和固定在所述承载框架10上的支撑组件20。所述支撑组件20包括基座21和沿水平方向可移动设置在所述基座21上的调节块22。所述掩膜板支架100还包括安装在所述调节块22上的定位销30，通过所述调节块22的移动即可实现所述定位销30的位置调整。所述掩膜板设有若干定位孔，所述定位销30与定位孔的位置相对应。本申请以掩膜板为水平放置来进行描述。但是本申请不限于将掩膜板水平放置，可以理解，无论掩膜板或者其他被支撑物是否水平放置，所述调节块22可移动的方向平行于所述支撑组件20的用于支撑被支撑物的表面即可。
实际应用中，若干掩膜板可沿高度方向间隔排放在所述掩膜板支架100上，即所述掩膜板支架100形成有若干支撑工位，每一所述支撑工位均设有若干所述支撑组件20与定位销30。所述支撑组件100还包括用以驱使所述调节块22沿第一水平方向移动的第一调节机构、驱使所述调节块22沿垂直于第一水平方向的第二水平方向移动的第二调节机构及用以将所述调节块22锁定在所述基座21上的锁紧机构。通过所述第一调节机构和所述第二调节机构对所述调节块22及定位销30的水平位置进行精确调节，能够避免掩膜板取放过程中与定位 销30发生摩擦，出现卡顿现象，保证掩膜板传入镀膜腔室的位置精度。并且，通过锁紧机构对调节块22进行固定，可使得所述定位销30的位置保持稳定，防止所述定位销30在与掩膜板接触碰撞时产生位置偏移，降低维护需求。
所述基座21具有用以安装所述调节块22的支撑部211及与所述承载框架10相固定的固定部212。在一实施例中，所述调节块22的高度设置不低于所述基座21的支撑部211，以避免所述基座21影响所述掩膜板的定位取放，甚而造成掩膜板表面损伤。本实施例中，所述定位销30的上端(即与掩膜板接触的一端)设置呈球面状(Ball Pin)，并且，所述定位销30的上端球面设置的部分大于前述掩膜板的定位孔，即使得所述掩膜板放置在所述掩膜板支架100的支撑工位上时，所述掩膜板不接触所述基座21与调节块22，而是仅抵压在所述定位销30上。所述定位销30上端的球形面可在掩膜板取放过程中起着导引作用，有效避免掩膜板出现卡顿现象。
参阅图3和图4，所述调节块22沿竖直方向形成有安装孔221，所述安装孔21的形状可以与所述定位销30的形状相适配，以使所述定位销30能够插设于所述安装孔221内。在一实施例中，所述安装孔21呈圆形。所述基座21沿竖直方向还形成有与所述安装孔221位置相对应的第一通孔213，所述第一通孔213的大小使得所述调节块22在进行位置调节时，所述安装孔221沿水平方向的移动范围不超出所述第一通孔213所限定的范围，即，使得所述基座21不会影响所述定位销30的安装。
所述第一调节机构可以包括沿第一水平方向延伸的第一调节螺栓23，所述第一调节螺栓23在所述第一水平方向上相对所述基座21保持位置固定。所述第二调节机构可以包括沿第二水平方向延伸且在所述第二水平方向相对所述基座21固定设置的第二调节螺栓24。可以通过第一调节螺栓23和/或第二调节螺栓24的旋转实现所述调节块22在水平方向的位置调节。
所述调节块22沿第一水平方向可以形成有与所述第一调节螺栓23相配合的第一调节孔222，所述第一调节螺栓23伸入第一调节孔222，可以通过转动所述第一调节螺栓23来使所述调节块22沿所述第一水平方向移动。所述第一调节螺栓23可以与所述第一调节孔222螺纹连接。在一实施例中，为配合所述第一调节螺栓23的高度位置，所述调节块22可以形成有向下突伸的突出部223，所述第一调节孔222可以开设于所述突出部223上。
所述第一调节机构还可以包括固定在所述基座21上的第一固定块25。第一固定块25可以可拆卸地固定在所述基座21上。所述第一固定块25与基座21可以共同限定滑行通槽26，所述滑行通槽26的开口方向可以为所述第一水平方向，所述滑行通槽26的长度方向可以为 所述第二水平方向。所述第一调节螺栓23的一端可以穿过所述滑行通槽26以伸入所述第一调节孔222中。所述第一调节螺栓23可以在所述滑行通槽26中沿所述第二水平方向移动。当所述第二调节机构驱使所述调节块22沿第二水平方向移动时，所述第一调节螺栓23在所述调节块22的带动下在所述滑行通槽26内沿第二水平方向移动。
所述第二调节机构还可以包括在第二水平方向与相对于所述调节块22位置固定的驱动块27，且所述驱动块27在所述第二水平方向上相对于所述基座21可移动。进一步地，所述调节块22还可以相对所述驱动块27沿第一水平方向往复移动。所述驱动块27沿第二水平方向形成有与所述第二调节螺栓24相配合的第二调节孔271，所述第二调节螺栓24伸入第二调节孔271，以使得可以通过旋转所述第二调节螺栓24来驱使所述驱动块27与调节块22一起沿所述第二水平方向移动。
在一实施例中，所述基座21形成有与所述驱动块27相配合的第一滑行凹槽214，所述第一滑行凹槽214可以沿所述第二水平方向延伸。所述驱动块27可以设置于所述第一滑行凹槽214中并且在所述第一滑行凹槽214中沿所述第二水平方向可移动。所述第一滑行凹槽214沿第一水平方向的设置宽度与所述驱动块27沿所述第一水平方向的宽度相适配，以使得所述驱动块27在所述第一滑行凹槽214内的移动更为平稳。
在一实施例中，所述驱动块27的上表面形成有沿第一水平方向延伸的第二滑行凹槽272，所述调节块22向下突伸形成有嵌入所述第二滑行凹槽272的滑动部224，旋转所述第一调节螺栓23时，所述驱动块27保持不动，所述滑动部224沿第一水平方向在所述第二滑行凹槽272内滑动。在一实施例中，所述第二滑行凹槽272和滑动部224在垂直于第一水平方向和第二水平方向上的截面均呈上窄下宽的梯形，使得所述滑动部224卡合于所述第二滑行凹槽272中，以避免所述滑动部224与第二滑行凹槽272两者意外脱离。
所述第二调节机构还包括固定在所述基座21上的第二固定块28，所述第二调节螺栓24设置于所述第二固定块28与基座21之间。第二固定块28可以可拆卸地固定在所述基座21上。所述第二固定块28和所述基座21可共同限定第二通孔282，所述第二调节螺栓24的一端可以穿过所述第二通孔282以伸入所述第二调节孔271中。所述调节块22在第一水平方向上移动时，所述第二调节螺栓24与驱动块27保持位置不变，即所述第二调节螺栓24可在所述第一水平方向上也与所述基座21保持相对位置固定。
在其他实施例中，所述第二调节螺栓24也可直接连接至所述调节块22以对所述调节块22在第二水平方向上的位置进行调节；所述第一调节机构亦可配设另一驱动块(未图示)，所述第一调节螺栓23可连接至另一驱动块，并通过另一驱动块驱使所述调节块22沿第一水 平方向移动，在此不再赘述。
在一实施例中，所述基座21、所述第一固定块25和所述第二固定块28共同限定一安装槽，所述调节块22可以设置于所述安装槽中。在其他实施例中，所述基座21、所述第一固定块25和所述第二固定块28也可以一体成型。
所述锁紧机构可以包括锁紧螺栓29。所述调节块22上可以形成有第一条形孔225，所述第一条形孔225的开孔方向可以为竖直方向，长度方向可以为所述第一水平方向。所述基座21上可以形成有第二条形孔215，所述第一条形孔225的开孔方向可以为竖直方向，长度方向可以为所述第二水平方向。所述第一条形孔225的位置可以与所述第二条形孔215的位置相对应，使得当所述调节块22移动时，所述第一条形孔225与所述第二条形孔215可以始终保持部分叠置。所述锁紧螺栓29可以穿过所述第一条形孔225并进入所述第二条形孔215中，使得所述调节块222既不能沿所述第一水平方向移动，也不能沿所述第二方向移动。在一实施例中，所述第一条形孔225与第二条形孔215的宽度均与所述锁紧螺栓29的直径相匹配，以对调节块22进行更有效的锁定。在一实施例中，所述锁紧螺栓29沿竖直方向不超出所述调节块22的上表面，以避免所述锁紧螺栓29与掩膜板接触。
在一实施例中，所述第一条形孔225内形成有与所述锁紧螺栓29相配合的第一台阶226，所述锁紧螺栓29的螺帽可以与所述第一台阶226相抵接，所述第一条形孔225的宽度相应是指该第一条形孔225中第一台阶226部分沿所述第二水平方向的设置宽度。所述基座21上的第二条形孔215内亦可形成有相应的第二台阶216(如图5所示)，所述锁紧螺栓29的下端可以与所述第二台阶216相抵接，以使得所述锁紧螺栓29的下端不超出所述基座21的下表面。
在一实施例中，所述第一条形孔225与第二条形孔215均设置为四个(锁紧螺栓29未全部示出)，实际应用中，可根据所述调节块22、基座21的规格结构对第一条形孔225与第二条形孔215的数目与位置进行合理调整与设计，以使得所述调节块22完成水平方向的调整后能够实现位置锁定即可。
所述安装孔221的侧壁还可以形成有顶压孔227，所述顶压孔227配设有相应的顶丝螺栓(未图示)，所述顶丝螺栓抵持在所述安装孔221内所安装的定位销30上，更有效地避免所述定位销30移动。
本申请掩膜板支架100的支撑组件20可以通过第一调节机构与第二调节机构对调节块22进行水平位置的调节，进而实现安装在所述调节块22上的定位销30的位置调节，提升现场维护效率，减少设备宕机时间，提高稼动率与实际产能。所述调节块22还可通过锁紧机 构进行固定，避免所述定位销30在掩膜板取放过程中可能出现的位置偏移，减少可能出现的卡顿现象，提高掩膜板的传入精度。
以上实施例的各技术特征可以进行任意的组合。
以上所述实施例仅表达了本申请的几种实施方式，其描述较为具体和详细，但并不能因此而理解为对本申请专利范围的限制。应当指出的是，对于本领域的普通技术人员来说，在不脱离本申请构思的前提下，还可以做出若干变形和改进，这些都属于本申请的保护范围。因此，本申请专利的保护范围应以所附权利要求为准。

Claims (19)

  1. 一种支撑组件，包括：
    基座；
    调节块，可移动地设置在所述基座上；
    第一调节机构，能够驱使所述调节块沿第一方向移动，所述第一方向平行于所述支撑组件用于支撑被支撑物的表面；
    第二调节机构，能够驱使所述调节块沿第二方向移动，所述第二方向平行于所述支撑组件用于支撑所述被支撑物的所述表面且垂直于所述第一方向；
    锁紧机构，将所述调节块锁定在所述基座上。
  2. 根据权利要求1所述的支撑组件，其中，所述第一调节机构包括沿所述第一方向延伸且在所述第一方向上相对所述基座固定设置的第一调节螺栓；
    所述调节块沿所述第一方向形成有与所述第一调节螺栓相配合的第一调节孔；
    所述第一调节螺栓伸入所述第一调节孔中，以使得能够通过旋转所述第一调节螺栓来驱使所述调节块沿所述第一方向移动。
  3. 根据权利要求2所述的支撑组件，其中，所述第一调节机构还包括固定设置在所述基座上的第一固定块，所述第一固定块与所述基座共同限定滑行通槽，所述滑行通槽的开口方向为所述第一方向，所述滑行通槽的长度方向为所述第二方向，所述第一调节螺栓的一端穿过所述滑行通槽以伸入所述第一调节孔中，且所述第一调节螺栓能够沿所述第二方向在所述滑行通槽内滑动。
  4. 根据权利要求1所述的支撑组件，其中，所述第二调节机构包括沿所述第二方向延伸且在所述第二方向上相对所述基座固定设置的第二调节螺栓；
    所述调节块沿所述第二方向形成有与所述第二调节螺栓相配合的第二调节孔；
    所述第二调节螺栓伸入所述第二调节孔中，以使得能够通过旋转所述第二调节螺栓来驱使所述调节块沿所述第二方向移动。
  5. 根据权利要求1所述的支撑组件，其中，所述第二调节机构包括：
    第二调节螺栓，所述第二调节螺栓沿所述第二方向延伸且在所述第二方向上相对于所述基座固定设置；和
    驱动块，所述驱动块在所述第二方向上相对于所述调节块位置固定，且在所述第二方向上相对于所述基座可移动；
    其中，所述驱动块沿第二水平方向形成有与所述第二调节螺栓相配合的第二调节孔，所 述第二调节螺栓伸入所述第二调节孔中，以使得能够通过旋转所述第二调节螺栓来驱使所述调节块和所述驱动块一起相对于所述基座沿所述第二方向移动。
  6. 根据权利要求5所述的支撑组件，其中，所述基座形成有沿所述第二方向延伸的第一滑行凹槽，所述驱动块设置于所述第一滑行凹槽中且能够在所述第一滑行凹槽中沿所述第二方向移动。
  7. 根据权利要求5所述的支撑组件，其中，所述驱动块远离所述第一滑行凹槽的表面形成有沿所述第一方向延伸的第二滑行凹槽，所述调节块靠近所述第一滑行凹槽的一侧形成突出的滑行部，所述滑行部设置于所述第二滑行凹槽中且能够在所述第二滑行凹槽中沿所述第一方向移动。
  8. 根据权利要求7所述的支撑组件，其中，所述滑行部和所述第二滑行凹槽在垂直于所述第一方向和所述第二方向的截面上均呈上窄下宽的梯形，以使所述滑行部卡合在所述第二滑行凹槽中。
  9. 根据权利要求4-8中任一项所述的支撑组件，其特征在于：所述第二调节机构还包括固定在所述基座上的第二固定块，所述基座与所述第二固定块共同限定第二通孔，所述第二调节螺栓的一端穿过所述第二通孔以伸入所述第二调节孔中。
  10. 根据权利要求1所述的支撑组件，其特征在于：所述锁紧机构包括锁紧螺栓；
    所述调节块上形成有第一条形孔，所述第一条形孔的开孔方向垂直于所述第一方向和所述第二方向，所述第一条形孔的长度方向为所述第一方向；
    所述基座上形成有第二条形孔，所述第一条形孔的开孔方向垂直于所述第一方向和所述第二方向，所述第二条形孔的长度方向为所述第二方向；
    所述第一条形孔的位置与所述第二条形孔的位置相对应，使得当所述调节块移动时，所述第一条形孔与所述第二条形孔始终保持部分叠置；
    所述锁紧螺栓能够穿过所述第一条形孔并进入所述第二条形孔中，使得所述调节块既不能沿所述第一方向移动，也不能沿所述第二方向移动。
  11. 根据权利要求10所述的支撑组件，其中，所述第一条形孔内形成有第一台阶，所述锁紧螺栓的螺帽能够抵接在所述第一台阶上，且所述锁紧螺栓的所述螺帽不突出于所述第一条形孔。
  12. 根据权利要求11所述的支撑组件，其中，所述第二条形孔内形成有第二台阶，当所述锁紧螺栓的一端穿过所述第一条形孔并进入所述第二条形孔时抵接在所述第二台阶上。
  13. 根据权利要求1所述的支撑组件，其中，所述调节块在垂直于所述第一方向和所述 第二方向的方向上形成有用于安装定位销的安装孔。
  14. 根据权利要求2所述的支撑组件，其中，所述基座在垂直于所述第一方向和所述第二方向的方向上形成有与所述安装孔位置相对应的第一通孔，其中，所述第一通孔的大小使得在所述调节块移动期间，所述安装孔在所述第一方向和/或所述第二方向的移动范围不超出所述第一通孔所限定的范围。
  15. 一种掩膜板支架，用以定位并承载相应的掩膜板，包括承载框架、如权利要求1-15中任一项所述的支撑组件以及定位销，所述支撑组件固定在所述承载框架上，所述定位销安装在所述调节块上。
  16. 根据权利要求15所述的掩膜板支架，其中，所述定位销用于与掩膜板接触的一端设置呈球面状。
  17. 根据权利要求15所述的掩膜板支架，其中，所述掩膜板支架形成有多个支撑工位，每一支撑工位设置多个所述支撑组件和多个所述定位销。
  18. 根据权利要求15所述的掩膜板支架，其中，所述调节块上形成有安装孔，所述定位销插入于所述安装孔中。
  19. 根据权利要求18所述的掩膜板支架，其中，所述安装孔的侧壁形成有顶压孔，所述顶压孔内配设有顶丝螺栓，所述顶丝螺栓抵持在所述安装孔内的所述定位销上。
PCT/CN2019/107063 2019-03-29 2019-09-20 支撑组件及采用该支撑组件的掩膜板支架 Ceased WO2020199525A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201920414848.7 2019-03-29
CN201920414848.7U CN209722281U (zh) 2019-03-29 2019-03-29 支撑组件及采用该支撑组件的掩膜板支架

Publications (1)

Publication Number Publication Date
WO2020199525A1 true WO2020199525A1 (zh) 2020-10-08

Family

ID=68689345

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2019/107063 Ceased WO2020199525A1 (zh) 2019-03-29 2019-09-20 支撑组件及采用该支撑组件的掩膜板支架

Country Status (2)

Country Link
CN (1) CN209722281U (zh)
WO (1) WO2020199525A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115449746A (zh) * 2022-09-15 2022-12-09 中国科学院力学研究所 一种具有实现批量镀膜的夹具工装的镀膜装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111690896B (zh) * 2020-06-24 2022-12-13 京东方科技集团股份有限公司 一种掩膜板支撑装置
CN113878493A (zh) * 2021-09-07 2022-01-04 中山市中科智能制造研究院有限公司 一种风电叶片打磨机支撑座的位置调节结构

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102879997A (zh) * 2012-09-06 2013-01-16 友达光电股份有限公司 可调式固定装置
WO2017158925A1 (ja) * 2016-03-18 2017-09-21 コニカミノルタ株式会社 マスク保持機構及びこれを備えるパターニング装置
CN107254673A (zh) * 2017-06-12 2017-10-17 京东方科技集团股份有限公司 蒸镀系统和蒸镀系统的蒸镀方法
JP2018040872A (ja) * 2016-09-06 2018-03-15 株式会社ブイ・テクノロジー マスク保持装置
CN207300085U (zh) * 2017-09-13 2018-05-01 沈阳来金汽车零部件有限公司 检具球形支撑快速调节机构

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102879997A (zh) * 2012-09-06 2013-01-16 友达光电股份有限公司 可调式固定装置
WO2017158925A1 (ja) * 2016-03-18 2017-09-21 コニカミノルタ株式会社 マスク保持機構及びこれを備えるパターニング装置
JP2018040872A (ja) * 2016-09-06 2018-03-15 株式会社ブイ・テクノロジー マスク保持装置
CN107254673A (zh) * 2017-06-12 2017-10-17 京东方科技集团股份有限公司 蒸镀系统和蒸镀系统的蒸镀方法
CN207300085U (zh) * 2017-09-13 2018-05-01 沈阳来金汽车零部件有限公司 检具球形支撑快速调节机构

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115449746A (zh) * 2022-09-15 2022-12-09 中国科学院力学研究所 一种具有实现批量镀膜的夹具工装的镀膜装置
CN115449746B (zh) * 2022-09-15 2024-01-26 中国科学院力学研究所 一种具有实现批量镀膜的夹具工装的镀膜装置

Also Published As

Publication number Publication date
CN209722281U (zh) 2019-12-03

Similar Documents

Publication Publication Date Title
WO2020199525A1 (zh) 支撑组件及采用该支撑组件的掩膜板支架
KR102079170B1 (ko) 증착 장치 및 그에 적용되는 마스크 조립체
KR20150049645A (ko) 박막 증착 장치
CN111534809A (zh) 一种半导体工艺设备
US9299958B2 (en) Device for detecting evaporation source and method for applying the same
KR20140135594A (ko) 로드 포트 장치
CN104828498A (zh) 一种输送装置
US20210351017A1 (en) Vapor deposition baffle mechanism and vapor deposition apparatus
CN116552142B (zh) 一种拼接式喷头模组及显示面板喷印设备
CN106429374B (zh) 轴承自动上料机的第一轴承送料装置
GB2622542A (en) Systems and methods for handling control lines in well operations
CN104754878A (zh) 一种新式双头贴片机
CN219003564U (zh) 一种点胶设备
JP2013110072A (ja) 有機ｅｌ発光装置の製造方法及び製造装置
WO2011106959A1 (zh) 移动式旋转装载机构
KR101521501B1 (ko) 기판 이송장치
CN117344273B (zh) 蒸镀装置
CN204652791U (zh) 一种新式双头贴片机
KR101549113B1 (ko) 기판의 얼라인 장치 및 이를 이용한 기판의 증착 방법
CN201942475U (zh) 往复升降机构
TW201323313A (zh) 升降機構
CN219155956U (zh) 一种冷却皮带机
CN109954810A (zh) 冲压模具的辅助上料装置
CN215641160U (zh) 一种硬盘壳体内部检测设备
CN224107780U (zh) 一种工业管道安装托架

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19923404

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 19923404

Country of ref document: EP

Kind code of ref document: A1