WO2020192054A1

WO2020192054A1 - Transparent array substrate, transparent display panel, display panel, and display terminal

Info

Publication number: WO2020192054A1
Application number: PCT/CN2019/108243
Authority: WO
Inventors: 许立雄; 张露
Original assignee: 昆山国显光电有限公司
Priority date: 2019-03-25
Filing date: 2019-09-26
Publication date: 2020-10-01
Also published as: CN110767714A; CN110767714B

Abstract

A transparent array substrate, a transparent display panel, a display panel, and a display terminal. The transparent array substrate comprises: a substrate (1) and a pixel circuit (2) disposed thereon; a first electrode layer (4) disposed on the pixel circuit (2) and comprising a plurality of first electrodes; and scanning lines (5) and data lines (6) respectively connected to the pixel circuit (2). The data lines (6) and/or scanning lines (5) are provided below the first electrode layer (4). A projection of the data lines (6) on the substrate (1) is a first projection (61), a projection of the scanning lines (5) on the substrate (1) is a second projection (51), and a projection of the plurality of first electrodes on the substrate (1) is a third projection (41). The first projection (61) partially overlaps with the third projection (41), and/or the second projection (51) partially overlaps with the third projection (41). The first electrodes, the scanning lines (5), and the data lines (6) are all made of transparent conductive materials. The data lines (6) and the scanning lines (5) are provided in layers different from the first electrodes, and projections of the data lines (6) and the scanning lines (5) are located at the edge of the first electrodes so that diffraction is reduced, the effective light-emitting area of the first electrodes is increased, and the aperture ratio can be increased.

Description

Transparent array substrate, transparent display panel, display panel and display terminal

Technical field

This application relates to the field of display technology, in particular to a transparent array substrate, a transparent display panel, a display panel, and a display terminal.

Background technique

With the rapid development of display terminals, users have higher and higher requirements for the screen ratio. As components such as cameras, sensors, and earpieces need to be installed at the top of the screen, in the prior art, a part of the area above the screen is usually reserved for installation. Components, such as the front notch area of the iPhone X, cannot achieve full-screen display, which affects the overall consistency of the screen.

Summary of the invention

Based on this, it is necessary to provide a transparent array substrate, a transparent display panel, a display panel, and a display terminal in response to the above technical problems.

According to the first aspect, an embodiment of the present application provides a transparent array substrate, including: a substrate, and a pixel circuit disposed on the substrate; a first electrode layer disposed on the pixel circuit, the first electrode The layer includes a plurality of first electrodes; scan lines and data lines connected to the pixel circuit, wherein the data lines and/or the scan lines are arranged below the first electrode layer, and the data The projection of the line on the substrate is the first projection, the projection of the scan line on the substrate is the second projection, and the projections of the plurality of first electrodes on the substrate are the third projection. The first projection and the third projection are partially overlapped, and/or the second projection and the third projection are partially overlapped; the first electrodes, scan lines and data lines are all transparent conductive materials.

According to a second aspect, an embodiment of the present application provides a transparent display panel, including the transparent array substrate as described in any one of the embodiments of the first aspect of the present application.

In one of the embodiments, the transparent display panel includes: a plurality of film layers sequentially arranged on the substrate, at least one of the film layers has a patterned structure, and the transparent display panel has at least a first position and different In the second position of the first position, the film layers passing along the thickness direction of the transparent display panel are different at the first position and the second position, and the transparent display panel is different at the first position. The number of film layers passing through the thickness direction of the panel is i, the thickness of each film layer is d1, d2...di, the number of film layers passing along the thickness direction of the transparent display panel at the second position is j, each The film thicknesses are D1, D2...Dj, i, j are natural numbers, and the optical path of the light passing through the first position and the second position meets the following conditions:

L1=d1*n1+d2*n2+…+di*ni,

L2=D1*N1+D2*N2+…+Dj*Nj,

(m-δ)λ≤L1-L2≤(m+δ)λ,

Wherein n1, n2...ni are respectively the film layer coefficients corresponding to the film layer passing along the thickness direction of the transparent display panel at the first position, and N1, N2...Ni are respectively the same as those at the second position The film layer coefficient corresponding to the film layer passing along the thickness direction of the transparent display panel, n1, n2...ni, N1, N2...Nj are constants between 1 and 2; λ is a constant between 380 and 780 nm ; M is a natural number; δ is a constant between 0 and 0.2.

According to a third aspect, an embodiment of the present application provides a display panel, the display panel includes at least a first display area and a second display area, the first display area and the second display area are used to display dynamic or static pictures A photosensitive device may be arranged under the first display area; wherein the first display area is provided with a transparent display panel as described in the second aspect of the present application, and the display panel provided in the second display area is A PMOLED display panel or an AMOLED display panel or a transparent display panel as described in the second aspect of the present application.

According to a fourth aspect, an embodiment of the present application provides a display terminal, including: a device body having a device area; the display panel as described in the fourth aspect of the present application, covering the device body; wherein The device area is located below the first display area, and a photosensitive device that transmits light through the first display area is arranged in the device area.

The technical solution of this application has the following advantages:

(1) In the transparent array substrate, data lines and/or scan lines are arranged below the first electrode layer, and their projections on the substrate at least partially overlap with the projections of the edges of the first electrodes on the substrate; The distance between the first electrodes in the first electrode layer becomes larger, which reduces diffraction; by arranging the data lines, scan lines and the first electrodes on different layers and their projections are located at the edges of the first electrodes, the diffraction is reduced and the diffraction is improved. The photosensitive effect of the photosensitive element under the transparent array substrate is improved; at the same time, on the basis of avoiding diffraction, the effective light-emitting area of the first electrode can be increased, the aperture ratio can be increased, or the pixel density can be increased.

(2) The transparent display panel provided in the embodiments of the present application has a graphic structure in the film layer, the display panel has at least a first position and a second position different from the first position, and the first position The position and the second position satisfy the following condition (m-0.2)λ<L1-L2<(m+0.2)λ. Since the film layers passing through the first position and the second position satisfy the above relationship, when the light exits the display panel through two paths, the phase difference is relatively small. With the solution in this embodiment, after the light of the same phase passes through the display panel through two paths, the phase difference is within a preset range, which reduces the diffraction phenomenon caused by the phase difference, so that the light passes through the display panel due to diffraction. The image distortion is small, and the clarity of the image perceived by the camera behind the display panel is improved, so that the photosensitive element behind the display panel can obtain a clear and true image, realizing a full-screen display.

(3) In the transparent display panel provided in the embodiments of the present application, the first position and the second position correspond to the position where light is incident on each path, and the path of light passing through the display panel is multiple paths, and the number of paths is based on the vertical The type of path that the light of the display panel passes when passing through the display panel is determined, and different paths include different layers. Therefore, when there are multiple paths, the difference between the optical path formed by the two paths of the incident light and the error of the integral multiple of the wavelength of the incident light is within a preset range, and the light passing through these paths passes through the display panel. The subsequent diffraction can be effectively reduced, and the more paths that meet the conditions, the weaker the diffraction phenomenon after the light passes through the display panel. As the most preferred solution, the error between the difference between the optical path formed by the light passing through any two paths and the integer multiple of the incident light wavelength in all paths is within a preset range. In this way, the phase difference caused by the optical path difference after the light passes through the display panel can be eliminated, which can greatly reduce the occurrence of diffraction.

Description of the drawings

In order to more clearly describe the technical solutions of the specific embodiments of the present application, the following will briefly introduce the drawings that need to be used in the description of the specific embodiments. Obviously, the drawings in the following description are some embodiments of the present application. For those of ordinary skill in the art, other drawings can be obtained from these drawings without creative work.

FIG. 1 is a schematic diagram of a specific example of a transparent array substrate in an embodiment of the application;

2 is a schematic diagram of another specific example of the transparent array substrate in the embodiment of the application;

3 is a schematic diagram of another specific example of a transparent array substrate in an embodiment of the application;

4 is a schematic diagram of another specific example of the transparent array substrate in the embodiment of the application;

5 is a schematic diagram of another specific example of the transparent array substrate in the embodiment of the application;

6 is a schematic diagram of another specific example of a transparent array substrate in an embodiment of the application;

FIG. 7 is a schematic diagram of another specific example of a transparent array substrate in an embodiment of the application;

8 is a schematic diagram of another specific example of a transparent array substrate in an embodiment of the application;

FIG. 9 is a schematic diagram of another specific example of a transparent array substrate in an embodiment of the application;

10 is a schematic diagram of a specific example of the first electrode of the transparent array substrate in the embodiment of the application;

11 is a schematic diagram of another specific example of the first electrode of the transparent array substrate in the embodiment of the application;

12 is a schematic diagram of another specific example of the first electrode of the transparent array substrate in the embodiment of the application;

FIG. 13 is a schematic diagram of a specific example of scan lines of a transparent array substrate in an embodiment of the application;

FIG. 14 is a schematic diagram of another specific example of the scan line of the transparent array substrate in the embodiment of the application;

15 is a schematic diagram of another specific example of scan lines of a transparent array substrate in an embodiment of the application;

16 is a schematic diagram of another specific example of the transparent array substrate in the embodiment of the application;

FIG. 17 is a schematic diagram of another specific example of a transparent array substrate in an embodiment of the application;

FIG. 18 is a schematic diagram of a specific example of a transistor in an embodiment of the application;

FIG. 19 is a flowchart of a specific example of a method for preparing a transparent array substrate in an embodiment of the application;

20 is a flowchart of another specific example of a method for preparing a transparent array substrate in an embodiment of the application;

FIG. 21 is a flowchart of another specific example of a method for preparing a transparent array substrate in an embodiment of the application;

22 is a schematic diagram of a specific example of a transparent display panel in an embodiment of the application;

FIG. 23 is a schematic diagram of another specific example of a transparent display panel in an embodiment of the application;

24 is a schematic diagram of another specific example of a transparent display panel in an embodiment of the application;

25 is a schematic diagram of another specific example of a transparent display panel in an embodiment of the application;

FIG. 26 is a schematic diagram of another specific example of a transparent display panel in an embodiment of the application;

FIG. 27 is a schematic diagram of another specific example of a transparent display panel in an embodiment of the application;

FIG. 28 is a schematic diagram of another specific example of a transparent display panel in an embodiment of the application;

FIG. 29 is a schematic diagram of another specific example of a transparent display panel in an embodiment of the application;

FIG. 30 is a schematic diagram of a specific example of a display panel in an embodiment of the application;

FIG. 31 is a schematic diagram of a specific example of a display terminal in an embodiment of the application;

FIG. 32 is a schematic diagram of the structure of the device body in an embodiment of the application.

Reference signs:

detailed description

In order to make the objectives, technical solutions, and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be described clearly and completely in conjunction with the drawings in the embodiments of the present application.

In the description of this application, the terms "center", "lateral", "upper", "lower", "left", "right", "vertical", "horizontal", "top", "bottom", "inner The orientation or positional relationship indicated by "" and "outside" is based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific The orientation, construction and operation in a specific orientation, therefore cannot be understood as a limitation of the application. In addition, when an element is referred to as being "formed on another element," it may be directly connected to the other element or a centering element may be present at the same time. When an element is considered to be "connected" to another element, it can be directly connected to the other element or an intermediate element can exist at the same time. In contrast, when an element is referred to as being "directly on" another element, there are no intervening elements.

In the description of this application, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" shall be interpreted broadly. For example, it may be a fixed connection, a detachable connection, or an integral Connection; it can be a mechanical connection or an electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, and it can be the internal communication between two components. For those of ordinary skill in the art, the specific meanings of the above-mentioned terms in this application can be understood under specific circumstances.

In addition, the technical features involved in the different embodiments of the present application described below can be combined with each other as long as they do not conflict with each other.

In order to achieve a full-screen display, a certain degree of transparency of the display screen is required to meet the transparency requirements of cameras and others. However, the inventor found that when the photosensitive element such as a camera is placed under the display panel, the image obtained by taking pictures often suffers from a large degree of blurring. The inventor discovered through research that the reason for this problem is that because there are conductive traces in the display screen of the electronic device, external light passing through these conductive traces will cause a more complicated diffraction intensity distribution, resulting in diffraction fringes, which will affect the camera. Wait for the normal operation of the photosensitive device. For example, a transparent display screen forms a two-dimensional grating due to the metal traces in the screen and the pattern in the layer, which will diffract the incident light, which will make the image blurry, and there will be ghosts and color fringing. In addition, The refractive index difference and pattern difference of each layer of the transparent display screen, there is also a two-dimensional grating-like diffraction effect, there will be diffraction when the light passes through, which seriously affects the imaging quality, which causes the distortion of the picture taken by the camera . Specifically, after the incident light is emitted through the display panel, it will form multi-order diffracted light. After these diffracted lights of different orders enter the photosensitive element such as the camera, bright and dark stripes are formed in the photosensitive element, thereby making the image captured by the camera Distortion seriously affects the image quality.

The embodiment of the present application provides a transparent array substrate, as shown in FIGS. 1, 2 and 3, the transparent array substrate includes: a substrate 1, and a pixel circuit 2 provided on the substrate 1; The first electrode layer 4, the first electrode layer 4 includes a plurality of first electrodes; the scan line 5 and the data line 6 connected to the pixel circuit 2, wherein the data line 6 and/or the scan line 5 are arranged on the first electrode layer Below 4, and the projection of the data line 6 on the substrate 1 is the first projection 61, the projection of the scan line 5 on the substrate 1 is the second projection 51, and the projections of the multiple first electrodes on the substrate 1 are the third projection 41. The first projection 61 and the third projection 41 partially overlap, and/or the second projection 51 and the third projection 41 partially overlap; the first electrode, the scan line 5 and the data line 6 are all transparent conductive materials.

In an embodiment, the first projection 61 and the third projection 41 partially overlap, that is, the projection of the data line 6 on the substrate 1 and the projection of the first electrode on the substrate 1 partially overlap, as shown in FIG. 2; and The projection 51 and the third projection 41 partially overlap, that is, the projection 51 of the scan line 5 on the substrate 1 and the projection 41 of the first electrode on the substrate 1 partially overlap, as shown in FIG. 3. Of course, in other embodiments, only the first projection 61 and the third projection 41 may be partially overlapped, or only the second projection 51 and the third projection 41 may be partially overlapped, which can be set reasonably according to actual needs in practical applications. This embodiment is only illustratively described, and is not limited thereto.

In an embodiment, the substrate 1 may be a rigid substrate, such as a transparent substrate such as a glass substrate, a quartz substrate, or a plastic substrate; the substrate 1 may also be a flexible substrate, such as a PI film, to improve the transparency of the device.

In an embodiment, as shown in FIG. 1, the scan line 5 and the data line 6 are both arranged in the film layer below the first electrode layer 4. The data line 6, the scan line 5 and the first electrode are arranged in different layers Of course, in other embodiments, only any one of the data line 6 and the scan line 5 may be disposed under the first electrode layer 4.

In one embodiment, as shown in FIG. 2 or as shown in FIG. 3, the data line is located under the first electrode. Compared with the data line and the first electrode being formed on the same layer, the arrangement in this embodiment is The area of one electrode can be made relatively larger, increasing the aperture ratio of the first electrode, and improving the luminous efficiency of the array substrate; and the projection of the data line on the substrate partially overlaps the projection of the first electrode on the substrate, and/ Or, the projection of the scan line on the substrate partially overlaps the projection of the first electrode on the substrate; that is, the projection of the data line 6 on the substrate 1, that is, the projection of the first projection 61 and the projection of the first electrode on the substrate 1, that is, the projection of the data line 6 on the substrate 1. The three projections 41 partially overlap, or the projection of the scan line 5 on the substrate 1, that is, the projection of the second projection 51 and the first electrode on the substrate 1, that is, the third projection 41 is partially overlapped, which can reduce diffraction, The effective light-emitting area of the first electrode can also be increased, the aperture ratio of the first electrode can be increased, or the pixel density can be increased.

In an embodiment, as shown in FIG. 1, a buffer layer is formed on a substrate 1 using silicon oxide or silicon nitride, and a pixel circuit 2 is disposed on the buffer layer. The transparent array substrate further includes a flat substrate disposed on the pixel circuit 2. The flattening layer 3 makes the first electrode layer 4 arranged on the flattening layer 3 more flat. Specifically, the first electrode in the first electrode layer 4 may be an anode.

In an embodiment, at least one side of the first projection 61 overlaps with the edge of the third projection 41, and/or at least one side of the second projection 51 overlaps with the edge of the third projection 41. Specifically, as shown in FIGS. 2 and 3, one side of the first projection 61 overlaps with the edge of the third projection 41, and/or one side of the second projection 51 overlaps with the edge of the third projection 41. Of course, in other embodiments, the other side of the first projection 61 may overlap with the edge of the third projection 41, as shown in FIG. 4; or one side of the second projection 51 and the edge of the third projection 41 may overlap. Overlap, this makes the distance between the first electrodes in the first electrode layer larger, reducing diffraction; at the same time, it can reduce the formation of two-dimensional gratings in the vertical direction between the data line and/or scan line and the first electrode. The diffraction is further reduced, and the photosensitive effect of the photosensitive element under the transparent array substrate is improved. Moreover, this arrangement can also increase the effective area of the first electrode, increase the aperture ratio, or increase the pixel density. In actual applications, it can be set reasonably according to actual needs.

In an embodiment, the edge of the third projection 41 falls within the first projection 61 and/or the second projection 51, so that the edge of the projection of the first electrode on the substrate is projected on the data line and/or scan line on the substrate In the area, reduce diffraction and optimize the imaging effect. Specifically, as shown in FIGS. 5 and 6, the edge of the third projection 41 falls into the first projection 61, and/or the edge of the third projection 41 falls into the second projection 51. In actual applications, it can be set reasonably according to actual needs.

In an embodiment, the third projection 41 is divided into two parts by the first projection 61, or the third projection 41 is divided into two parts by the second projection 51, or the third projection 41 is divided into two parts by the first projection 61 and the second projection. 51 is divided into multiple parts at the same time. The first projection and the second projection fall inside the third projection and do not overlap with the edge of the third projection. There is a certain distance between the edge of the first projection and the second projection and the edge of the third projection, so that the first projection , The second projection completely falls into the third projection area, which can achieve the effect of reducing diffraction.

Specifically, as shown in FIG. 7, the first projection 61 falls inside the third projection 41 and the edge of the first projection 61 does not coincide with the edge of the third projection 41, and the third projection 41 is divided by the first projection 61 There are two parts; as shown in Figure 8, the second projection 51 falls inside the third projection 41 and the edge of the second projection 51 does not coincide with the edge of the third projection 41, and the third projection 41 is the second projection 51 Divided into two parts; it can also be shown in Figure 9, the first projection 61 and the second projection 51 both fall into the interior of the third projection 41 and do not coincide with the edge of the third projection 41, the third projection 41 is the first The projection 61 and the second projection 51 are simultaneously divided into a plurality of parts. The specific positions of the first projection and the second projection in the third projection in this embodiment are merely illustrative, and not limited thereto. In addition, the specific shape and arrangement of the first electrode in this embodiment are only illustratively described, and there are no restrictions on it, and can be set reasonably according to actual needs in the actual application process.

In an embodiment, the data line 6 is located between the scan line 5 and the first electrode layer 4, or the scan line 5 is located between the data line 6 and the first electrode layer 4; the transparent array substrate further includes: The first insulating layer between the first electrode layer 4 and the first insulating layer; the second insulating layer between the scan line 5 and the first electrode layer 4. The data line, the scan line and the first electrode are all made of a transparent conductive material, and the electrical insulation between the data line and the first electrode or the electrical insulation between the scan line and the first electrode is achieved through an insulating layer.

Specifically, as shown in FIG. 1, the transparent array substrate includes two insulating layers, namely a first insulating layer 21 and a second insulating layer 22, and the scan line 5 is located between the data line 6 and the first electrode layer 4. The second insulating layer 22 is disposed between the data line 6 and the first electrode layer 4, the scan line 5 is disposed on the second insulating layer 22, and the first insulating layer 21 is disposed between the scan line 5 and the first electrode layer 4. The data line and the first electrode are arranged in the same layer, so that the aperture ratio produced is small. The transparent array substrate provided by the embodiment of the present application can be used for subsequent production by arranging the first electrode, the scan line, and the data line in different layers. The pixel provides a larger area for design, which increases the aperture ratio and reduces diffraction, thereby improving the display effect and shooting effect of this part of the area. The above is only taken as an example and not limited to this. In other embodiments, the specific positions of the data lines and scan lines can be adjusted according to actual needs, and are not limited to this.

In a specific embodiment, when the data line is located between the scan line and the first electrode layer, the first insulating layer is a flattening layer to make the surface of the first electrode flat; the flattening layer is used as the difference between the data line and the first electrode. The insulating layer in between makes the surface of the first electrode prepared on the planarization layer smooth, and the light-emitting structure layer prepared on the first electrode is correspondingly smoother and uniform, the light-emitting structure layer emits more uniformly, and the display effect is better; At the same time, the preparation of an insulating layer is saved, and the production cost is reduced. Of course, in another specific embodiment, when the scan line is located between the data line and the first electrode layer, the second insulating layer is a planarization layer to make the surface of the first electrode flat.

The data lines and scan lines in this embodiment are located below the planarization layer, specifically, they can be located between the planarization layer and the pixel circuit, or can be located in the pixel circuit layer; in this case, the planarization layer It also functions as an insulating layer, and because the thickness of the planarization layer is thicker than the insulating layer, the use of the planarization layer as the insulating layer makes the parasitic capacitance formed between the metal layers smaller, the coupling effect is small, and the crosstalk between signals can be reduced; for example, , The thickness of the planarization layer is 1um, and the thickness of the insulating layer is 300nm-500nm. In other embodiments, the data line and the scan line may be located between the planarization layer and the first electrode. In this case, an insulating layer needs to be provided between the data line, the scan line and the first electrode.

In one embodiment, the materials of the first insulating layer and the second insulating layer are transparent insulating materials; the first insulating layer and the second insulating layer are prepared by using transparent insulating materials to increase the transparency of the transparent array substrate, so that the transparent array The light received by the photosensitive device under the substrate is increased, which improves the sensitivity of the photosensitive device.

In one embodiment, the data line and the scan line are made of the same material as the first electrode layer, the preparation process is simple, convenient, easy to operate, and the production cost is low. In one embodiment, in order to maximize the overall transparency of the transparent array substrate, the first electrode, the data line, and the scan line in the first electrode layer are all made of transparent conductive material, and the light transmittance of the transparent conductive material is greater than 80 %, so that the light transmittance of the entire array substrate can meet the requirements, and the transparency of the array substrate is higher, so that the photosensitive device, such as a camera, arranged below it has a better photosensitive effect.

Specifically, the transparent conductive material can be indium tin oxide (ITO), indium zinc oxide (IZO), or silver-doped indium tin oxide (Ag+ITO), or silver-doped indium zinc oxide ( Ag+IZO). Due to the mature ITO technology and low cost, the conductive material is preferably indium tin oxide. Further, in order to reduce the resistance of each conductive trace on the basis of ensuring high light transmittance, the transparent conductive material adopts materials such as aluminum-doped zinc oxide, silver-doped ITO, or silver-doped IZO. In other alternative embodiments, the transparent conductive material can also be other materials, and can be set reasonably according to actual needs, which is not limited in this embodiment. In an alternative embodiment, at least one of the first electrode layer, the data line and the scan line is made of a transparent conductive material.

In an embodiment, each side of the first electrode is a curve. Specifically, the shape of the first electrode may be a circle as shown in FIG. 10, or an ellipse as shown in FIG. 11, or a dumbbell shape as shown in FIG. 12. It is understood that the first electrode may also be composed of other various shapes. There are curves with different radii of curvature. When light passes through obstacles such as slits, small holes or discs, it will spread to different degrees and deviate from the original straight line. This phenomenon is called diffraction. During the diffraction process, the distribution of the diffraction fringes will be affected by the size of the obstacles, such as the width of the slit, the size of the small hole, etc. The positions of the diffraction fringes generated at the positions with the same width are consistent, which will cause a more obvious diffraction effect. . By changing the shape of the first electrode to a circle, an ellipse, or a dumbbell shape, it can be ensured that when light passes through the first electrode layer, diffraction fringes with different positions and diffusion directions can be generated at different width positions of the first electrode, thereby weakening The diffraction effect further ensures that when the camera is set under the display panel, the graphics obtained by taking pictures have high definition.

In an embodiment, the plurality of scan lines extend in the first direction, the plurality of data lines extend in the second direction, the first direction and the second direction intersect, and the scan lines and/or data lines extend in at least One side is wavy. In an embodiment, the scan line extends in the X direction, the data line extends in the Y direction, the projections of the data line and the scan line on the substrate are perpendicular to each other, and the two sides of the scan line in the extending direction are wavy, In addition, the two sides of the data line in the extending direction are also wave-shaped. The wave-shaped data line and scan line can produce diffraction fringes with different positions and diffusion directions, thereby weakening the diffraction effect and ensuring that the camera is set on the display panel. When below, the picture obtained by taking pictures has higher definition.

In one embodiment, since the scan lines are wavy, there is a first interval between adjacent scan lines, and the first interval varies continuously or intermittently; the width of the scan line varies continuously or intermittently. Continuous width change means that the widths at any two adjacent positions on the scan line are not the same. In FIG. 13, the extension direction of the scan line is its length direction. The width of the scan line changes continuously in the extending direction. The intermittent change in width means that the width of two adjacent positions in a partial area on the scan line is the same, but the width of two adjacent positions in a partial area is not the same. In this embodiment, multiple scan lines are regularly arranged on the substrate. Therefore, the gap between two adjacent scan lines also exhibits continuous or intermittent changes in the extending direction parallel to the scan lines. Regardless of whether the width of the scan line changes continuously or intermittently in the extending direction, it can be changed periodically.

The two sides of the scan line in the extending direction are both wave-shaped, the wave crests of the two sides are arranged oppositely, and the wave troughs are arranged oppositely. As shown in Figure 13, the crests T of the two sides in the extension direction are arranged oppositely and the troughs B are arranged oppositely. The width between the crests of the same scan line is W1, and the width between the troughs of the same scan line is W2. The distance between two scan line crests is D1, and the distance between two adjacent scan line crests is D2. In this embodiment, both sides are connected by the same arc-shaped side. In other embodiments, the two sides may also be connected by the same elliptical side, as shown in FIG. 14. By setting the two sides of the scan line into a wave shape formed by a circular arc or an ellipse, it can be ensured that the diffraction fringes generated on the scan line can be diffused in different directions, and no obvious diffraction effect will be produced.

In an embodiment, a first connecting portion is formed at the opposite side of the valley of the wave-shaped scan line, and the first connecting portion may be a straight line or a curve. As shown in FIG. 15, the first connecting portion is strip-shaped, and the first connecting portion is an area where the scan line and the switching device are electrically connected, that is, the position where the control terminal of the switching device is connected to the first connecting portion. In other embodiments, the connecting portion may also adopt other irregular structures, such as a shape with a small middle and large ends, or a shape with a large middle and small ends.

In one embodiment, since the data lines are wavy, there is a second distance between adjacent data lines, and the second distance changes continuously or intermittently; the width of the data lines changes continuously or intermittently. The data line is similar to the scan line, please refer to the specific description of the scan line for details, which will not be repeated here. The data line can adopt any wave shape shown in Figure 13-15. The two sides of the data line in the extending direction are both wave-shaped, the crests of the two sides are arranged oppositely, and the troughs are arranged oppositely; the second connecting part is formed at the opposite side of the trough of the data line, and the second connecting part is the data line and the switch In the electrical connection area of the device, the settings of the data line and the scan line are similar.

The scan lines and data lines on the transparent array substrate adopt any of the wavy shapes in Figure 13-15, which can ensure that in the extension direction of the data lines and scan line traces, light passes at different width positions and adjacent traces Diffraction stripes with different positions can be formed at different gaps, thereby reducing the diffraction effect, so that the photosensitive device placed under the display panel can work normally.

In one embodiment, as shown in FIG. 16, the data line 6 and the scan line 5 are arranged on the same layer, and the same mask is used to complete it at one time, reducing the number of manufacturing steps and improving the manufacturing efficiency. A larger area is provided for the pixel design. The data line 6 is disconnected at the overlapping part of the scan line 5, and the disconnected part is connected through the bridge structure 8, preventing the data line 6 and the scan line 5 from directly contacting and forming Short circuit, the bridge structure 8 can be connected to other layers by forming conductive pillars on the data line 6, such as the source-drain layer M3, which connects the disconnected part of the data line 6, and the source-drain layer M3 and the data line 6 There is an insulating layer between them to prevent short circuits. The above is only an example and is not limited to this. In other embodiments, the scan line 5 may be disconnected at the overlapped portion of the data line 6, and conductive pillars are formed through openings to connect the scan lines to other layers. The disconnected part of 5 is connected.

In one embodiment, the above-mentioned array substrate, as shown in FIG. 17, further includes: a pixel defining layer 7 disposed on the first electrode layer 4; the pixel defining layer 7 has a plurality of openings, and the openings are the same as the first electrode. In a corresponding relationship, the projection of the pixel defining layer 7 on the substrate is the fourth projection, the overlapping area of the first projection and the third projection falls within the overlapping area of the third projection and the fourth projection, and/or, the second projection and the The overlapping area of the third projection falls within the overlapping area of the third projection and the fourth projection.

The overlap area of the projection of the data line and/or the scan line on the substrate and the projection of the first electrode on the substrate is within the overlap area of the pixel defining layer and the projection of the first electrode on the substrate. During the manufacturing process of the first electrode, the edge of the first electrode is burrs or damaged due to the limitation of the manufacturing process. The pixel defining layer usually covers a part of the edge of the first electrode. This coverage area is called the edging area, the third projection and the fourth projection The overlapped area is the edging area, and the first electrode on the edging area is not exposed at the opening of the pixel defining layer, so that the luminescent material subsequently fabricated on the first electrode is more uniform, and the luminous effect of the luminescent material is improved. The data lines and scan lines are arranged in the encapsulation area, and the pixel defining layer blocks the data lines and scan lines to further improve the diffraction effect, and the subsequently produced light-emitting structure layer does not cover the edge of the first electrode, so that the light-emitting structure layer is flat and emits light. Evenly. In FIG. 17, an opening is taken as an example for description, and it is not limited thereto.

Each side of the projection of the plurality of openings on the substrate is a curve, and the shape of the plurality of openings may be at least one of a circle, an ellipse, a gourd shape, a dumbbell shape, or other curves with varying curvatures. The openings on the conventional pixel defining layer are all rectangular or square according to the pixel size. Taking a rectangular opening as an example for description, since the rectangular has two sets of sides parallel to each other, it has the same width in both the length and width directions. Therefore, when external light passes through the opening, diffraction fringes with the same position and the same spreading direction are generated at different positions in the length direction or the width direction, so that a significant diffraction effect will appear, making the photosensitive element located under the transparent array substrate can not work normally. In this embodiment, the sides of the opening are curved. When light passes through the opening, the diffraction fringes generated will not diffuse in one direction, but diffuse in a 360-degree direction, so that the diffraction is extremely inconspicuous and has a better Diffraction improvement effect. The transparent array substrate in this embodiment can solve this problem well and ensure that the photosensitive element under the transparent array substrate can work normally.

In one embodiment, the pixel circuit includes 2T1C, 3T1C, or 3T2C, or 7T1T, or 7T2C, or 1T; as shown in FIG. 18, the pixel circuit only includes transistors, as a switching device, does not include storage capacitors and other components, The number of transistors in is one. The transistor includes a first terminal 2a, a second terminal 2b and a control terminal 2c. The scan line 5 is connected to the control terminal 2c of the transistor, and the data line 6 is connected to the first terminal 2a of the transistor. The electrode is connected to the second terminal 2b of the transistor. The pixel circuit includes a transistor, the transistor and the first electrode are arranged in one-to-one correspondence, the data line 6 is connected to the first terminal 2a of the transistor, the scan line 5 is connected to the control terminal 2c of the transistor, and a plurality of sub-pixels correspond to a plurality of transistors one to one, That is, one sub-pixel corresponds to one transistor. The data line 6 is connected to the first end 2a of the transistor, and the scan line 5 is connected to the control end of the transistor, reducing the number of transistors in the pixel circuit to one. During operation, the scan line 5 only needs to input the switching voltage of the TFT instead of The load current of the OLED is input, thereby greatly reducing the load current of the scan line, so that the scan line 5 in this embodiment can be made of transparent materials such as ITO. In addition, the data line 6 only needs to supply the current of one OLED pixel at each moment, and the load is also very small. Therefore, the data line 6 can also be made of transparent materials such as ITO, thereby improving the light transmittance of the display screen.

This embodiment also provides a method for preparing a transparent array substrate, as shown in FIG. 19, including the following steps S1-S2.

Step S1: forming pixel circuits and scan lines and data lines connected to the pixel circuits on the substrate.

In an embodiment, the substrate 1 may be a rigid substrate, such as a transparent substrate such as a glass substrate, a quartz substrate, or a plastic substrate; the substrate 1 may also be a flexible substrate, such as a PI film.

In one embodiment, silicon oxide or silicon nitride is used to form a buffer layer on the substrate 1, and the pixel circuit 2 is formed on the buffer layer.

In one embodiment, as shown in FIG. 16, the data lines 6 and the scan lines 5 are arranged on the same layer, and the same mask is used to complete them at one time, which reduces the number of manufacturing steps, improves the manufacturing efficiency, and can be used for subsequent manufacturing. Pixels have a larger area to design, thereby increasing the pixel aperture ratio. The data line 6 is disconnected at the overlapping part with the scan line 5, and the disconnected part is connected through the bridge structure 8 to prevent the data line 6 and the scan line 5 from directly contacting to form a short circuit.

In the embodiment of the present application, the planarization layer 3 formed above the pixel circuit 2 makes the first electrode layer 4 subsequently formed thereon more flat.

Step S2: forming a first electrode layer on the pixel circuit, the first electrode layer including a plurality of first electrodes; the first electrode layer is located above the data line and/or the scan line, and the projection of the data line on the substrate is the first Projection, the projection of the scan line on the substrate is the second projection, the projection of the first electrode on the substrate is the third projection, the first projection and the third projection are partially overlapped, and/or the second projection and the third projection are partially overlapped , The first electrode, scan line and data line are all transparent conductive materials. In this embodiment, the first electrode layer includes multiple first electrodes, that is, multiple anodes.

In the preparation method of the transparent array substrate provided in this embodiment, the anode, the data line, and the scan line are arranged in different layers, which can effectively reduce diffraction, and at the same time, can provide a larger area for the subsequent production of pixels for design, thereby improving the camera The aperture ratio of the area, and at the same time, the anode, data line and scan line are all made of transparent conductive materials to make the transparent array substrate more transparent, improve the display effect and shooting effect of the transparent array substrate; and place the data line and/or scan line in The projection on the substrate and the projection of the edge of the first electrode on the substrate at least partially overlap, so that the distance between the first electrodes in the first electrode layer becomes larger, and diffraction is reduced.

In an embodiment, as shown in FIG. 20, executing step S1 may specifically include steps S11-S13.

Step S11: forming a conductive material on the substrate.

Step S12: the conductive material is patterned through the mask to form the data line and the scan line, and the data line is disconnected at the overlap portion with the scan line.

In practical applications, conductive materials can be formed on any layer in the process of making pixel circuits, and the conductive materials can be patterned by using a mask to form data lines and scan lines at one time, reducing process steps and saving costs.

Step S13: Connect the disconnected part of the data line by forming a bridge structure.

In a specific embodiment, the bridge structure can be connected to other layers by forming conductive pillars on the data line, such as the source and drain layer, to connect the disconnected part of the data line, and the source and drain layer is connected to the data line. Equipped with an insulating layer to prevent short circuits. The above is only an example and is not limited to this. In other embodiments, the scan line may be disconnected at the overlapping portion with the data line, and the conductive pillars are formed through openings to connect to other layers to disconnect the scan lines. Open part to connect.

In an embodiment, after step S2 is performed, as shown in FIG. 21, step S3 is further included.

Step S3: forming a pixel defining layer on the first electrode layer, the pixel defining layer has a plurality of openings, and the openings have a one-to-one correspondence with the first electrode; the projection of the pixel defining layer on the substrate is the fourth projection, the first projection The overlap area with the third projection falls within the overlap area between the third projection and the fourth projection, and/or the overlap area between the second projection and the third projection falls within the overlap area between the third projection and the fourth projection.

In this embodiment, a plurality of openings are formed on the pixel defining layer 7, and the openings are in a one-to-one correspondence with the first electrode. The projections of the plurality of openings on the substrate 1 are circles, ellipses, and other curves with varying curvatures. At least one of them. When the light passes through the opening, the generated diffraction fringes will not diffuse in one direction, but in a 360-degree direction, so that the diffraction is extremely inconspicuous and has a better diffraction improvement effect. The transparent array substrate in this embodiment can solve this problem well and ensure that the photosensitive element under the transparent array substrate can work normally.

This embodiment also provides a transparent display panel, which includes the transparent array substrate mentioned in any of the above embodiments.

Furthermore, the inventor found that the area with the patterned film layer and the area without the patterned film layer form different cross-sectional structures. Therefore, when light enters the display screen to reach the photosensitive element, the light path through which it passes is different. When light passes through different areas of the transparent screen, different film structures produce differences in optical path lengths due to differences in refractive index and thickness. When the light passes through these different areas, the original light of the same phase will have a phase difference. This phase difference is one of the important reasons for diffraction. This phase difference will cause obvious diffraction phenomena, causing the light to pass through the display panel. Diffraction fringes are generated afterwards, which distorts and blurs the picture.

In an embodiment, the transparent display panel includes: a plurality of film layers sequentially arranged on a substrate, at least one film layer has a patterned structure, and the transparent display panel has at least a first position and a second position different from the first position. Position, the film layers passing along the thickness direction of the transparent display panel are different at the first position and the second position, the number of film layers passing along the thickness direction of the transparent display panel at the first position is i, and the thickness of each film layer is respectively d1, d2...di, the number of film layers passing along the thickness direction of the transparent display panel at the second position is j, the thickness of each film layer is D1, D2...Dj, i, j are natural numbers, and the first position And the optical path of the second position meets the following conditions:

L1=d1*n1+d2*n2+…+di*ni,

L2=D1*N1+D2*N2+…+Dj*Nj,

(m-δ)λ≤L1-L2≤(m+δ)λ,

Where n1, n2...ni are the film layer coefficients corresponding to the film layer passing along the thickness direction of the transparent display panel at the first position, and N1, N2...Ni are the film coefficients corresponding to the film layer along the transparent display panel at the second position. The layer coefficients corresponding to the layers passing through the thickness direction, n1, n2...ni, N1, N2...Nj are constants between 1 and 2; λ is a constant between 380 and 780 nm; m is a natural number; δ is 0 A constant between ~0.2.

Since the film thicknesses of the first position and the second position are different, multiple light-transmissive paths are formed in the display panel, and each path here includes a different film layer. The path in this embodiment refers to the path where external incident light enters the display panel in a direction perpendicular to the surface of the substrate. The paths of light passing through the display panel mentioned later all refer to the path when light passes through the surface of the substrate perpendicularly. In this embodiment, the path through which the light at the first position passes is marked as path a, and the path through which the light at the second position passes is marked as path b, and the film layers included in path a and path b are different.

The optical path is equal to the refractive index of the medium multiplied by the distance the light travels in the medium. The calculation formula of the optical path is: optical path = refractive index × path. According to the calculation formula, the optical path of path a is L1=d1*n1+d2*n2+…+di*ni, the optical path of path b is L2=D1*N1+D2*N2+…+Dj*Nj, the light passes through The difference L1-L2 between the optical path lengths of path a and path b is an integer multiple of the wavelength of the light. Specifically, the value of the optical path difference L1-L2 may fluctuate in a small range near the integer multiple of the wavelength. , Such as (m-δ)λ≤L1-L2≤(m+δ)λ.

The light here can be any monochromatic light or white light in visible light. The above-mentioned light can be selected as visible light, and the wavelength of the light is 380 nanometers to 780 nanometers. Preferably, the wavelength of the light is 500 nanometers to 600 nanometers. The light in this range (ie, green light) is more sensitive to human eyes. Since the human eye is most sensitive to green, the incident light can be selected based on green light, that is, when adjusting the optical path through each path, λ can select the wavelength of green light from 500 nm to 560 nm, such as 540 nm, 550 nm, 560 Nano. Since the wavelength of green light is between red and blue, choosing green light can take both red and blue light into consideration.

By adjusting the thickness and/or refractive index of one or more film layers that are different in the two paths, so that after the external incident light passes through the two paths, the obtained optical path difference is the wavelength of the external incident light An integer multiple of.

In the above-mentioned transparent display panel, the film layer with a patterned structure is different at different positions. By adjusting the difference of the optical path between the different paths to an integer multiple of the wavelength of the light, when the light is emitted from the display panel through different paths, the The phase difference is zero. After the light of the same phase passes through the transparent display panel through two paths, the phase remains the same, and no phase difference occurs. The diffraction phenomenon caused by the phase difference is eliminated, so that the light does not occur after passing through the transparent display panel. The above-mentioned image distortion caused by diffraction improves the clarity of the image perceived by the camera behind the transparent display panel, so that the photosensitive element behind the transparent display panel can obtain a clear and true image and realize a full-screen display.

In this embodiment, δ is a constant between 0 and 0.1; the value of L1-L2 is 0, and the difference between L1-L2 is selected as 0, that is, the optical length of different paths is 0, which is more than integer multiples. Good operation, better realization.

As another embodiment, the above-mentioned film layer may be multiple film layers, one or more of the film layers have a patterned structure, so that when light passes through the transparent display panel vertically, multiple paths are formed, each path The included film layers are different, and the difference between the optical paths of the light passing through at least two paths is an integer multiple of the wavelength of the light, so that the diffraction phenomenon after the light passing through the two paths can be reduced. In a further solution, there may be multiple paths, such as three, four, and five paths, and the difference between the optical paths formed by any two paths is an integer multiple of the wavelength of the incident light. In this way, the diffraction of light passing through these paths after passing through the transparent display panel can be effectively reduced. The more paths that satisfy the conditions, the weaker the diffraction phenomenon after the light passing through the transparent display panel. As a further preferred solution, after the external incident light enters the transparent display panel in a direction perpendicular to the surface of the substrate and passes through any two of the multiple paths, the obtained optical path difference is that of the external incident light. Integer multiples of the wavelength. In this way, the phase difference caused by the optical path difference after the light passes through the display panel can be eliminated, which can greatly reduce the occurrence of diffraction.

In an embodiment, the transparent display panel is an AMOLED display panel or a PMOLED display panel, and the film layer includes an encapsulation layer, a second electrode layer, a light-emitting layer, and a first electrode layer and a pixel defining layer; the first position or the second position passes through The film layers respectively include a first path, a second path, and a third path, where the first path includes an encapsulation layer, a second electrode layer, a light-emitting layer, a first electrode layer, and a substrate; the second path includes an encapsulation layer, a second The electrode layer, the pixel defining layer, the first electrode layer and the substrate; the third path includes the encapsulation layer, the second electrode layer, the pixel defining layer and the substrate.

In an embodiment, as shown in FIG. 22, the first path includes an encapsulation layer 11, a second electrode layer 10, a light-emitting layer 9, a first electrode layer 4, and a substrate 1. The second path includes an encapsulation layer 11, a second electrode Layer 10, pixel defining layer 7, first electrode layer 4 and substrate 1; the third path includes encapsulation layer 11, second electrode layer 10, pixel defining layer 7 and substrate 1; the fourth path includes encapsulation layer 11, second electrode Layer 10, pixel defining layer 7, first electrode layer 4, data line 6 or scan line 5, and substrate 1.

By measuring the thickness and refractive index of each layer, the optical path of each path can be calculated.

In order to adjust the film layers in the path to meet the requirements of the above-mentioned difference between the optical path lengths, it is first necessary to determine which of the film layers in the layer affect the optical path length, although each path passes through more layers However, when calculating the difference between the optical path lengths, if the same film layer exists in the path, and the material and thickness of the film layer are the same, it will not affect the difference between the optical path lengths between the two paths . Only films of different materials, or films of the same material but different thicknesses, will affect the difference between the optical paths.

Specifically, for the first path and the second path, the encapsulation layer 11, the second electrode layer 10, the first electrode layer 4, and the substrate 1 are made of the same material and have the same thickness, which can be ignored. The difference between the first path and the second path is that there is a light-emitting layer 9 in the first path and a pixel-defining layer 7 in the second path. By adjusting the thickness and/or refractive index of the light-emitting layer 9, or adjusting the pixel-defining layer 7 Or adjust the light-emitting layer 9 and the pixel defining layer 7 at the same time so that the difference between the optical paths of the first path and the second path is an integer multiple of the wavelength.

For the first path and the third path, the encapsulation layer 11, the second electrode layer 10, and the substrate 1 are made of the same material and have the same thickness, which can be ignored. The difference between the first path and the third path is that the first path has the light-emitting layer 9 and the first electrode layer 4, and the third path has the pixel defining layer 7. By adjusting the thickness and/or refractive index of the light-emitting layer 9, Or adjust the thickness and/or refractive index of the first electrode layer 4, or adjust the thickness and/or refractive index of the pixel defining layer 7, or adjust at least two layers of the light emitting layer 9, the first electrode layer 4 and the pixel defining layer 7 at the same time The difference between the optical paths of the first path and the third path is an integer multiple of the wavelength.

For the first path and the fourth path, the encapsulation layer 11, the second electrode layer 10, and the substrate 1 are made of the same material and have the same thickness, which can be ignored. The difference between the first path and the fourth path is that there is a light-emitting layer 9 in the first path, a pixel defining layer 7, a data line 6 or a scan line 5 in the fourth path, and the flattening in the first path and the fourth path The thickness of the layer 3 is different. By adjusting the thickness and/or refractive index of the light-emitting layer 9, or adjusting the thickness and/or refractive index of the pixel defining layer 7, or adjusting the thickness and/or refractive index of the data line 6 or the scanning line 5, Or adjust the thickness and/or refractive index of the planarization layer 3, or adjust at least two layers of the light-emitting layer 9, the data line 6 or the scan line 5, the planarization layer 3, and the pixel defining layer 7 at the same time to make the first path and the fourth path The difference between the optical paths is an integer multiple of the wavelength.

For the second path and the third path, the encapsulation layer 11, the second electrode layer 10, and the substrate 1 are made of the same material and have the same thickness, so there is no need to consider. The difference between the second path and the third path is that there is the first electrode layer 4 in the second path, and the thickness of the pixel defining layer 7 in the second path and the third path are different. By adjusting the thickness of the first electrode layer 4 and / Or refractive index, or adjust the thickness and/or refractive index of the pixel defining layer 7, or simultaneously adjust the first electrode layer 4 and the pixel defining layer 7 so that the difference between the optical path lengths of the second path and the third path is wavelength Integer multiples.

For the second path and the fourth path, the encapsulation layer 11, the second electrode layer 10, the pixel defining layer 7 and the substrate 1 are made of the same material and have the same thickness, so there is no need to consider. The difference between the second path and the fourth path is that there are data lines 6 or scan lines 5 in the fourth path, and the thickness of the planarization layer 3 in the second path and the fourth path are different. By adjusting the data line 6 or scan The thickness and/or refractive index of the line 5, or adjust the thickness and/or refractive index of the planarization layer 3, or adjust the data line 6 or the scan line 5 and the planarization layer 3 at the same time so that the optical length of the second path and the fourth path The difference between is an integer multiple of the wavelength.

For the third path and the fourth path, the encapsulation layer 11, the second electrode layer 10, and the substrate 1 are made of the same material and have the same thickness, which can be ignored. The difference between the third path and the fourth path is that the fourth path has the first electrode layer 4, the data line 6 or the scan line 5, and the planarization layer 3 and the pixel defining layer 7 in the third path and the fourth path By adjusting the thickness and/or refractive index of the data line 6 or the scanning line 5, or adjusting the thickness and/or refractive index of the first electrode layer 4, or adjusting the thickness and/or refractive index of the planarization layer 3, Or adjust the thickness and/or refractive index of the pixel defining layer 7, or simultaneously adjust at least two of the data line 6 or scan line 5, the first electrode layer 4, the pixel defining layer 7, and the planarization layer 3 so that the third path and The difference between the optical paths of the fourth path is an integer multiple of the wavelength.

According to the idea of the present application, it is only necessary to adjust the thickness and/or refractive index of one or more film layers with differences in different paths so that the difference between the optical paths of at least two paths meets the integral multiple of the wavelength of the light , It can reduce the diffraction of light after passing through these two paths. The more paths that meet the conditions, the better the diffraction can be reduced. Optionally, by adjusting the thickness and/or refractive index of one or more of the encapsulation layer, the light-emitting layer, the first electrode layer, the pixel defining layer, the planarization layer, the data line, or the scan line, the light One or more differences between the distances are integer multiples of the wavelength of the light. The specific adjustment methods have been separately introduced in the foregoing embodiments, and will not be repeated here.

In one embodiment, the transparent display panel is a flexible screen or a hard screen using a thin film packaging method, the packaging layer includes a thin film packaging layer, and the thin film packaging layer includes an organic material packaging layer. The thickness of the organic material packaging layer in the first path is greater than that of other paths. The thickness of the organic material encapsulation layer. By adjusting the thickness of the organic material encapsulation layer, the difference between the optical paths of different paths meets the integer multiple of the wavelength, avoiding the diffraction caused by the phase difference.

The encapsulation layer can be a hard screen encapsulation or an organic film encapsulation. The transparent display panel in FIG. 23 is a hard screen adopting glass powder packaging (ie Frit packaging). The packaging layer includes a vacuum gap layer 13 and an packaging layer 11. The vacuum gap layer 13 is filled with inert gas, and the packaging layer is The packaging substrate is a packaging glass. Hard-screen packaging is suitable for glass substrates to form hard-screen display panels.

In addition to the above-mentioned hard packaging method, a thin-film packaging method can also be used. As shown in FIGS. 24 and 25, thin-film packaging is performed on the outside of the second electrode layer 10 to form a thin-film packaging layer. The thin-film packaging layer includes inorganic materials. The encapsulation layer 112, the organic material encapsulation layer 111, and the inorganic material encapsulation layer 112 are arranged on the entire surface and have a uniform thickness, and therefore have no influence on the difference between the optical paths of each path. The organic material encapsulation layer 111 fills the pixel openings, and forms an entire encapsulation layer after filling the pixel openings. Therefore, in different paths, the thickness of the organic material encapsulation layer is different, so by adjusting the thickness of the organic material encapsulation layer 111 in the pixel opening, or the refractive index of the organic material encapsulation layer, the light transmission can be adjusted. The optical path through the path. The thickness and refractive index of the organic material encapsulation layer can also be adjusted at the same time, or combined with other methods. The thickness of the organic material encapsulation layer in the path at the pixel opening position is greater than the thickness of the organic material encapsulation layer in other paths.

In another embodiment, the transparent display panel is PMOLED. Because PMOLED and AMOLED have different structures, when light passes through PMOLED, different paths are formed. As shown in FIG. 26, the PMOLED includes a substrate 1, a first electrode layer 4, a pixel defining layer 7, a spacer 14, a light emitting layer 9, and a second electrode layer 10. The first electrode layer 4 includes a plurality of first electrodes. The electrode is an anode, and a plurality of anodes are regularly arranged on the substrate 1. A light-emitting layer 9 is formed on the anode, a second electrode layer 10 is formed on the light-emitting layer 9, and the second electrode is a cathode. The isolation pillar 14 is formed on the pixel defining layer 7 and is disposed between adjacent first electrodes. The isolation column 14 is used to separate the cathodes of two adjacent sub-pixel regions. As shown in FIG. 26, the isolation column 14 has an inverted trapezoidal structure and is made of a transparent material, such as a transparent photoresist. The surface of the spacer 14 will be higher than the surface height of the adjacent area. Therefore, when the cathode is prepared on the surface of the display panel, the cathode formed above the spacer 14 is disconnected from the cathode on the adjacent pixel area, so as to achieve relative The isolation of the cathodes of adjacent sub-pixel regions ultimately ensures that each sub-pixel region can be driven normally.

Since the PMOLED also includes the isolation column 14, the isolation column 14 is also included in a part of the path through which the light passes. As shown in FIG. 26, the path C at the position of the isolation column includes the second electrode layer 10, the isolation column 14, the pixel defining layer 7 and the substrate 1, and the path D at the position of the non-isolation column includes the second electrode layer 10, light emitting Layer 9, first electrode layer 4 and substrate 1. In path C and path D, different film layers include spacers 14, pixel defining layer 7, light-emitting layer 9, and first electrode layer 4. The light can be adjusted by adjusting the thickness and/or refractive index of one or more of the layers. The difference between the optical path through the path C and the path D. In each path, the optical path through which the light passes can be adjusted by adjusting the thickness and/or refractive index of the different film layers. The adjustment methods of the remaining paths are the same as those in the foregoing embodiment, and will not be repeated.

In this embodiment, a transparent display panel is also provided. A groove 301 is formed on the film layer of the transparent display panel. As shown in FIG. 27, the groove 301 is filled with a compensation material, and the transparent display panel is formed There are multiple paths through which light passes, and each path passes through a different structural layer. Since the compensation material is provided in the groove 301, by adjusting the thickness or refractive index of the compensation material, or simultaneously adjusting the thickness and refractive index of the compensation material, the difference between the first optical path length a and the second optical path length e is the wavelength of light An integer multiple of. The compensation material may be an organic transparent material, such as photoresist.

In this embodiment, a groove 301 is opened on the film layer of the second optical path e, and supplementary material is filled in the groove 301 to adjust the optical path of the light passing through the path, so that the optical path of the path is The difference between the optical path lengths of other paths meets an integer multiple of the wavelength, so that the phase difference of the light after passing through the two paths is 0, avoiding the diffraction caused by the phase difference, thereby improving the transmission of light through the transparent display panel. The degree of clarity reduces the degree of distortion and meets the requirements of setting cameras and other photosensitive elements under the transparent screen.

As some optional implementations, when opening the groove, adjust the path of the optical path to select a suitable position and a suitable depth according to the needs. It is also possible to pre-open a groove with a larger depth, and when filling the material inside, The thickness of the filling material is set as required. Here, one or more grooves are set according to the needs, and the positions and numbers are set reasonably according to the needs. In this way, the optical path on each path can be conveniently adjusted, so that the difference between the optical paths meets the requirements.

As a preferred embodiment, by opening grooves at specific positions, the difference between the optical path lengths of any two paths in the display panel is an integer multiple of the wavelength of the light. In this way, after the light passes through the display panel, no phase difference occurs in all paths, and no diffraction phenomenon due to the phase difference occurs, thereby reducing diffraction.

In a specific embodiment, for an AMOLED display panel, the groove 301 may also be a pixel opening in the pixel defining layer. By multiplexing the pixel opening and filling the compensation material inside it, the light passing through the path can be adjusted. The light path. In the pixel opening formed by the pixel defining layer, a light-emitting structure layer, a cathode layer, and a light extraction layer (optional) are sequentially arranged. These layers are prepared by evaporation, and a layer is deposited on the bottom and edges of the pixel opening After the film layers are formed, there is still a groove 301 in the pixel opening, and the depth of the groove 301 is equal to the depth of the pixel opening. A compensation material is arranged in the groove 301 of the pixel opening, and the thickness of the compensation material may be less than or equal to the depth of the groove 301. In this solution, by multiplexing the groove formed in the pixel opening, the optical path of the light passing through the path is adjusted. The thickness of the compensation material filled in the groove may be smaller than the thickness of the groove. By adjusting the thickness or refractive index of the compensation material, or adjusting the thickness and refractive index of the compensation material at the same time, the optical path of the light passing through the path is adjusted so that the difference between the optical path and the optical path of other paths is optical Integer multiples of the wavelength.

As another embodiment, the above-mentioned film layer may be multiple film layers, one or more of the film layers have a patterned structure, so that when light passes through the transparent display panel vertically, multiple paths are formed. The included film layers are different, and the difference between the optical paths of the light passing through at least two paths is an integer multiple of the wavelength of the light, so that the diffraction phenomenon after the light passing through the two paths can be reduced. In a further solution, there may be multiple paths, such as three, four, and five paths, and the difference between the optical paths formed by any two paths is an integer multiple of the wavelength of the incident light. In this way, the diffraction of the light passing through these paths after passing through the display panel can be effectively reduced. The more paths that satisfy the condition, the weaker the diffraction phenomenon of the light passing through the display panel. As a further preferred solution, after the external incident light enters the transparent display panel in a direction perpendicular to the surface of the substrate and passes through any two of the multiple paths, the obtained optical path difference is the external incident An integer multiple of the wavelength of light. In this way, the phase difference caused by the optical path difference after the light passes through the transparent display panel can be eliminated, which can greatly reduce the occurrence of diffraction.

The groove may be provided in any film layer at the first position, or may be provided in any film layer at the second position. This embodiment is only illustratively described and is not limited thereto. In practice It can be set reasonably according to actual needs in the application.

In an embodiment, when the film packaging method is adopted, the compensation material provided in the groove 301 of the pixel opening may be a packaging material, which is performed through a thin film packaging process without using a separate processing process. As shown in FIG. 28, the thin-film encapsulation layer includes an inorganic material encapsulation layer 112 and an organic material encapsulation layer 111 disposed on the outside of the second electrode layer 10. Since the inorganic material encapsulation layer 112 is vapor-deposited as a whole layer, the thickness is the same in each path through which the light passes, so it will not affect the difference between the optical paths. Since the organic material encapsulation layer 111 is mostly formed by inkjet printing or evaporation film formation, the thickness of different areas can be adjusted as needed. Therefore, the organic encapsulation material will level and fill the groove 301 after the film is formed during encapsulation. The entire surface of the organic material encapsulation layer 111. In this way, the organic material in the groove is used as the compensation material, the groove is filled, and the thickness of the compensation material is equal to the thickness of the groove. By adjusting the thickness or refractive index of the filled organic material or adjusting the thickness and refractive index at the same time, Adjust the path length of the light passing through the path. The film packaging method is suitable for flexible substrates. Of course, in other embodiments, the groove 301 can also be filled with supplementary materials to adjust the optical path of the light passing through the path, so that the difference between the optical path of the path and the optical path of other paths satisfies The integral multiple of the wavelength makes the phase difference of the light passing through the two paths 0, avoiding the diffraction caused by the phase difference, thereby improving the clarity of the light after passing through the transparent display panel, reducing the degree of distortion, and satisfying transparency. Set the requirements of photosensitive components such as cameras under the screen.

In an embodiment, the transparent display panel is a hard screen encapsulated by glass powder, the encapsulation layer includes a vacuum gap layer and a encapsulation substrate, and the thickness of the vacuum gap layer in the first path is greater than that in other paths The thickness of the layer.

In the display panel shown in FIG. 29, a hard encapsulation layer is adopted. After the compensation material is filled in the groove 301, a vacuum gap layer 13 is formed on the outside of the second electrode layer 10 and the compensation material, and the outermost is the encapsulation layer of the package. 11. The thickness of the vacuum gap layer in the first path is greater than the thickness of the vacuum gap layer in the other paths, so that the difference between the optical path length of this path and the optical path length of other paths meets an integer multiple of the wavelength, so that the two paths pass through The optical path difference of the rear light is 0, avoiding diffraction caused by the optical path difference. Hard-screen packaging is suitable for glass substrates to form hard-screen display panels.

This embodiment also provides a display panel, which includes at least: a first display area and a second display area. The first display area and the second display area are used for displaying dynamic or static pictures, and a photosensitive device can be arranged under the first display area; Wherein, the first display area is provided with the transparent display panel mentioned in any of the foregoing embodiments, and the display panel provided in the second display area is a PMOLED display panel or an AMOLED display panel or any of the foregoing embodiments. Transparent display panel.

Since the first display area adopts the transparent display panel in the foregoing embodiment, it has higher transparency and better overall consistency of the display screen; and when light passes through the display area, no obvious diffraction effect will be produced. Therefore, it can be ensured that the photosensitive device located under the first display area can work normally. The first display area can normally display dynamic or static images when the photosensitive device is not working, and needs to be in a non-display state when the photosensitive device is working, so as to ensure that the photosensitive device can normally collect light through the array substrate. The transparency of the first display area is significantly improved, which solves the problem of the contradiction between the wiring of the transparent screen and the cathode resistance and transparency, and is compatible with the manufacturing process of the normal display screen, and the production cost is low. First of all, the data lines and/or scan lines and the first electrode are not arranged on the same layer, which can effectively reduce diffraction; and, since at least two paths of light pass through the display panel in the above display panel, no phase is generated. The difference reduces the diffraction interference. If the light passes through all the paths in the display panel, there will be no phase difference due to the optical path difference, so that diffraction interference caused by the phase difference can be avoided, and the camera below the screen can obtain clear and true image information.

In one embodiment, as shown in FIG. 30, the display screen includes a first display area 161 and a second display area 162. Both the first display area 161 and the second display area 162 are used to display static or dynamic pictures. A display area 161 adopts the transparent display panel mentioned in any of the above embodiments, and the first display area 161 is located on the upper part of the display screen.

In an alternative embodiment, the display screen may also include three or more display areas, such as including three display areas (a first display area, a second display area, and a third display area). The first display area is For the transparent display panel mentioned in any of the above embodiments, which display panel is used in the second display area and the third display area, this embodiment does not limit this, and it may be a PMOLED display panel or an AMOLED display panel. Of course, the transparent display panel in this embodiment can also be used.

This embodiment also provides a display terminal including the above-mentioned display screen covered on the device body. The above-mentioned display terminal may be a product or component with a display function such as a mobile phone, a tablet, a TV, a display, a palmtop computer, an iPod, a digital camera, a navigator, and the like.

FIG. 31 is a schematic structural diagram of a display terminal in an embodiment. The display terminal includes a device body 810 and a display screen 820. The display screen 820 is disposed on the device body 810 and is connected to the device body 810 with each other. Wherein, the display screen 820 may be a display screen prepared by the display panel in any one of the foregoing embodiments to display static or dynamic pictures.

FIG. 32 is a schematic diagram of the structure of the device body 810 in an embodiment. In this embodiment, the device body 810 may be provided with a device area 812 and a non-device area 814 where the non-device is located. In the device area 812, photosensitive devices such as a camera 930, a light sensor, and a light sensor may be provided. At this time, the transparent display panels in the first display area of the display screen 820 are bonded together corresponding to the device area 812, so that the aforementioned photosensitive devices such as the camera 930 and the light sensor can transmit external light through the first display area. Collection and other operations. Since the transparent display panel in the first display area can effectively improve the diffraction phenomenon caused by the transmission of external light through the first display area, it can effectively improve the quality of images captured by the camera 930 on the display terminal, and avoid the effects of diffraction. The image is distorted, and it can also improve the accuracy and sensitivity of the light sensor to sense external light.

Although the embodiments of the present application are described in conjunction with the accompanying drawings, those skilled in the art can make various modifications and variations without departing from the spirit and scope of the application, and such modifications and variations fall within the scope of the appended claims. Within the limited range.

Claims

A transparent array substrate, which includes:

A substrate, and a pixel circuit arranged on the substrate;

A first electrode layer disposed on the pixel circuit, the first electrode layer including a plurality of first electrodes;

The scan line and the data line connected to the pixel circuit, wherein the data line and/or the scan line are disposed under the first electrode layer, and the projection of the data line on the substrate is The first projection, the projection of the scan line on the substrate is a second projection, the projections of the plurality of first electrodes on the substrate are a third projection, and the first projection is the same as the third projection Partially overlap, and/or, the second projection and the third projection partially overlap;

The first electrode, scan line and data line are all transparent conductive materials.
The transparent array substrate according to claim 1, wherein at least one side of the first projection overlaps with the edge of the third projection, and/or at least one side of the second projection overlaps with the third projection. The projected edges overlap;

Or, the edge of the third projection falls within the first projection and/or the second projection;

Alternatively, the third projection is divided into two parts by the first projection, or the third projection is divided into two parts by the second projection, or the third projection is divided into two parts by the first projection and The second projection is divided into multiple parts at the same time.
The transparent array substrate according to claim 1, wherein the data line is located between the scan line and the first electrode layer, or the scan line is located between the data line and the first electrode layer between;

The transparent array substrate further includes:

A first insulating layer disposed between the data line and the first electrode layer;

A second insulating layer disposed between the scan line and the first electrode layer.
3. The transparent array substrate according to claim 3, wherein when the data line is located between the scan line and the first electrode layer, the first insulating layer is a planarization layer, so that the first The electrode surface is flat;

When the scan line is located between the data line and the first electrode layer, the second insulating layer is a planarization layer to make the surface of the first electrode flat.
4. The transparent array substrate according to claim 3, wherein the materials of the first insulating layer and the second insulating layer are transparent insulating materials.
The transparent array substrate according to claim 1, wherein each side of the first electrode is a curve.
The transparent array substrate according to claim 1, wherein the scan line extends in a first direction, the data line extends in a second direction, the first direction and the second direction intersect, and the scan At least one side of the line and/or the data line in the extending direction is wavy.
The transparent array substrate of claim 1, wherein the light transmittance of the transparent conductive material is greater than 80%.
8. The transparent array substrate according to any one of claims 1-8, further comprising: a pixel defining layer disposed on the first electrode layer; the pixel defining layer has a plurality of openings, the openings and The first electrode is in a one-to-one correspondence; the projection of the pixel defining layer on the substrate is a fourth projection, and the overlapping area of the first projection and the third projection falls into the third projection and Within the overlapping area of the fourth projection, and/or, the overlapping area of the second projection and the third projection falls within the overlapping area of the third projection and the fourth projection.
A transparent display panel, wherein the transparent display panel comprises the transparent array substrate according to any one of claims 1-9.
10. The transparent display panel according to claim 10, comprising: a plurality of film layers sequentially arranged on the substrate, at least one of the film layers has a patterned structure, and the transparent display panel has at least a first position Unlike the second position, which is different from the first position, the film layer that passes along the thickness direction of the transparent display panel at the first position and the second position is different. The number of film layers passing through the thickness direction of the transparent display panel is i, the thickness of each film layer is d1, d2...di, and the number of film layers passing along the thickness direction of the transparent display panel at the second position is j, the thickness of each film layer is D1, D2...Dj, i, j are natural numbers, and the optical path of the light passing through the first position and the second position meets the following conditions:

L1=d1*n1+d2*n2+…+di*ni,

L2=D1*N1+D2*N2+…+Dj*Nj,

(m-δ)λ≤L1-L2≤(m+δ)λ,

Wherein n1, n2...ni are respectively the film layer coefficients corresponding to the film layer passing along the thickness direction of the transparent display panel at the first position, and N1, N2...Ni are respectively the same as those at the second position The film layer coefficient corresponding to the film layer passing along the thickness direction of the transparent display panel, n1, n2...ni, N1, N2...Nj are constants between 1 and 2; λ is a constant between 380 and 780 nm ; M is a natural number; δ is a constant between 0 and 0.2.
11. The transparent display panel of claim 11, wherein δ is a constant between 0 and 0.1; and the value of L1-L2 is 0.
The transparent display panel of claim 11, wherein the transparent display panel is an AMOLED display panel or a PMOLED display panel, and the film layer includes an encapsulation layer, a second electrode layer, a light-emitting layer, and a first electrode layer and pixel definition Floor;

The film layer passing through the first position or the second position respectively includes a first path, a second path, and a third path, wherein,

The first path includes an encapsulation layer, a second electrode layer, a light emitting layer, a first electrode layer, and a substrate;

The second path includes an encapsulation layer, a second electrode layer, a pixel defining layer, a first electrode layer and a substrate;

The third path includes an encapsulation layer, a second electrode layer, a pixel defining layer, and a substrate.
The transparent display panel according to claim 13, wherein the transparent display panel is a flexible screen or a rigid screen adopting a thin film packaging method, the packaging layer includes a thin film packaging layer, and the thin film packaging layer includes an organic material packaging layer, The thickness of the organic material encapsulation layer in the first path is greater than the thickness of the organic material encapsulation layer in other paths.
The transparent display panel according to claim 13, wherein the transparent display panel is a hard screen using glass frit packaging, the packaging layer includes a vacuum gap layer and a packaging substrate, and the vacuum in the first path The thickness of the gap layer is greater than the thickness of the vacuum gap layer in other paths.
15. The transparent display panel according to any one of claims 11-15, wherein a compensation layer is provided in the film layer corresponding to the first position and/or the film layer corresponding to the second position of the transparent display panel ；

External incident light enters the transparent display panel in a direction perpendicular to the surface of the substrate, and passes through the first path, the second path, and the third path. The difference is an integer multiple of the wavelength of the external incident light.
11. The transparent display panel of claim 11, wherein a groove is provided in the film layer corresponding to the first position and/or the film layer corresponding to the second position of the transparent display panel, The compensation layer is arranged in the groove.
The transparent display panel of claim 17, wherein the thickness of the compensation layer is less than or equal to the depth of the groove; the compensation layer is a transparent material layer.
The transparent display panel according to claim 17, wherein the transparent display panel is a flexible screen or a rigid screen adopting a thin film packaging method, the packaging layer comprises a thin film packaging layer, and the thin film packaging layer comprises an organic material packaging layer, The material of the compensation layer is the same as that of the organic material encapsulation layer, and the thickness of the organic material encapsulation layer in the first path is greater than the thickness of the organic material encapsulation layer in other paths.
A display panel, wherein the display panel includes at least a first display area and a second display area. The first display area and the second display area are used to display dynamic or static pictures. Set up photosensitive devices;

The first display area is provided with the transparent display panel according to any one of claims 11-19, and the display panel provided in the second display area is a PMOLED display panel, or an AMOLED display panel or as claimed in claim 11. -19 The transparent display panel described in any one.