WO2020172962A1 - 一种显示面板及其制作方法、显示装置 - Google Patents

一种显示面板及其制作方法、显示装置 Download PDF

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Publication number
WO2020172962A1
WO2020172962A1 PCT/CN2019/082795 CN2019082795W WO2020172962A1 WO 2020172962 A1 WO2020172962 A1 WO 2020172962A1 CN 2019082795 W CN2019082795 W CN 2019082795W WO 2020172962 A1 WO2020172962 A1 WO 2020172962A1
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WO
WIPO (PCT)
Prior art keywords
barrier
layer
display area
walls
circle
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PCT/CN2019/082795
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English (en)
French (fr)
Inventor
郑园
张兴永
Original Assignee
武汉华星光电半导体显示技术有限公司
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Application filed by 武汉华星光电半导体显示技术有限公司 filed Critical 武汉华星光电半导体显示技术有限公司
Priority to US16/488,596 priority Critical patent/US20200274094A1/en
Publication of WO2020172962A1 publication Critical patent/WO2020172962A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details

Definitions

  • This application relates to the technical field of display panels, and in particular to a display panel, a manufacturing method thereof, and a display device.
  • AMOLED Active-matrix organic light emitting diode
  • AMOLED is an active matrix organic light emitting diode panel. It has the characteristics of self-luminescence, using very thin organic material coating and glass substrate, when there is current through, these organic materials will emit light.
  • AMOLED panels are self-luminous, do not require backlight, wide viewing angle, high color saturation, especially its low driving voltage and low power consumption, plus fast response, light weight, thin thickness, simple structure, low cost, etc., are considered One of the most promising products.
  • AMOLED display technology has become a technology that many consumers pay attention to, but the failure phenomenon of OLED devices has always plagued many researchers.
  • OLED light-emitting materials are particularly sensitive to oxygen and water vapor, and organic materials are easily corroded by oxygen and water vapor. Eventually it fails. Therefore, the lifetime and stability of AMOLED devices are still key issues for AMOLED technology.
  • the purpose of this application is to provide a display panel, a manufacturing method thereof, and a display device, so as to more effectively block the leakage of the thin film packaging material, and protect the organic materials in the display area from being corroded by water and oxygen, thereby improving stability And prolong life.
  • the display panel includes: a base substrate, the base substrate includes a display area and a non-display area around the display area; a first barrier layer located The second barrier layer is located on the first barrier layer, and the second barrier layer includes at least two circles of first barrier walls, and the first barrier walls are arranged around the periphery of the display area.
  • the first barrier layer includes at least one circle of second barrier walls, the second barrier walls are arranged around the edge of the display area, and at least one circle of first barrier walls is provided on each circle of the second barrier walls.
  • the first barrier layer includes a first circle of second barrier walls and a second circle of second barrier walls arranged at intervals on the non-display area, the first circle of second barrier walls are arranged around the edge of the display area, and the second The second barrier wall of the loop is arranged around the second barrier wall of the first loop, and the height of the second barrier wall of the second loop is higher than the height of the second barrier wall of the first loop.
  • the display panel further includes a metal layer, a first insulating layer, and a pixel first electrode layer sequentially disposed on the base substrate, and the metal layer, the first insulating layer and the pixel first electrode layer are on the base substrate
  • the stack forms a channel and protrusions on both sides of the channel, wherein the first ring of second barrier walls are arranged in the channel, and the second ring of second barrier walls are arranged on the protrusions.
  • two circles of first blocking walls are arranged on the first circle of second blocking walls at intervals, and two circles of first blocking walls are arranged on the second circle of second blocking walls at intervals.
  • the display panel further includes: a metal layer, a first insulating layer, a pixel first electrode layer, a pixel defining layer, and a support pad sequentially disposed on the base substrate, wherein the first barrier layer and the pixel defining The layers are the same layer and the same material, and the second barrier layer and the support pad are the same layer and the same material.
  • the total width of the at least two circles of the first barrier wall is smaller than the width of the first barrier layer.
  • the display panel further includes a thin film transistor array, pixels, and a thin film packaging structure sequentially arranged on the display area of the base substrate, wherein the thin film packaging structure includes a first inorganic layer, an organic layer, and a second Two inorganic layers.
  • embodiments of the present application also provide a method for manufacturing a display panel.
  • the method for manufacturing the display panel includes: providing a base substrate, the base substrate including a display area and a display area around the display area. Display area; forming a first barrier layer surrounding the edge of the display area on the non-display area; forming a second barrier layer on the first barrier layer, wherein the second barrier layer includes at least two circles of the first barrier wall, the first barrier wall Set around the display area.
  • the step of forming a first barrier layer surrounding the edge of the display area on the non-display area includes: sequentially forming a metal layer, a first insulating layer, and a pixel first electrode layer on a base substrate, and A second insulating layer is formed on the first electrode layer and the first insulating layer that is not covered by the first electrode layer of the pixel.
  • the second insulating layer is divided into blocks by exposure and etching to obtain a pixel defining layer in the display area.
  • the non-display area obtains a first barrier layer; the step of forming a second barrier layer on the first barrier layer specifically includes: forming a third insulating layer on the first barrier layer, and dividing the third insulating layer into blocks by exposure and etching In order to obtain a support pad in the display area, and a second barrier layer in the non-display area.
  • the first barrier layer includes at least one circle of second barrier walls, the second barrier walls are arranged around the edge of the display area, and at least one circle of first barrier walls is formed on each circle of the second barrier walls.
  • the first barrier layer includes a first circle of second barrier walls and a second circle of second barrier walls arranged at intervals on the non-display area, the first circle of second barrier walls are arranged around the edge of the display area, and the second The second barrier wall of the loop is arranged around the second barrier wall of the first loop, and the height of the second barrier wall of the second loop is higher than the height of the second barrier wall of the first loop.
  • two circles of first blocking walls are arranged on the first circle of second blocking walls at intervals, and two circles of first blocking walls are arranged on the second circle of second blocking walls at intervals.
  • embodiments of the present application also provide a display device, the display device includes a drive circuit and a display panel, the drive circuit is used to provide a drive voltage to the display panel, wherein the display panel includes: a base substrate , The base substrate includes a display area and a non-display area located around the display area; a first barrier layer located on the non-display area and arranged around the edge of the display area; a second barrier layer located on the first barrier layer, wherein the second barrier layer
  • the barrier layer includes at least two circles of first barrier walls, and the first barrier walls are arranged around the periphery of the display area.
  • the first barrier layer includes at least one circle of second barrier walls, the second barrier walls are arranged around the edge of the display area, and at least one circle of first barrier walls is provided on each circle of the second barrier walls.
  • the first barrier layer includes a first circle of second barrier walls and a second circle of second barrier walls arranged at intervals on the non-display area, the first circle of second barrier walls are arranged around the edge of the display area, and the second The second barrier wall of the loop is arranged around the second barrier wall of the first loop, and the height of the second barrier wall of the second loop is higher than the height of the second barrier wall of the first loop.
  • the display panel further includes a metal layer, a first insulating layer, and a pixel first electrode layer sequentially arranged on the base substrate, and the metal layer, the first insulating layer and the pixel first electrode layer are on the base substrate
  • the stack forms a channel and protrusions on both sides of the channel, wherein the first ring of second barrier walls are arranged in the channel, and the second ring of second barrier walls are arranged on the protrusions.
  • two circles of first blocking walls are arranged on the first circle of second blocking walls at intervals, and two circles of first blocking walls are arranged on the second circle of second blocking walls at intervals.
  • the display panel further includes a metal layer, a first insulating layer, a pixel first electrode layer, a pixel defining layer, and a support pad sequentially disposed on the base substrate, wherein the first barrier layer and the pixel defining layer The same layer and the same material, and the second barrier layer and the support pad are the same layer and the same material.
  • the total width of the at least two circles of the first barrier wall is smaller than the width of the first barrier layer.
  • the display panel provided by the present application includes a base substrate, the base substrate includes a display area and a non-display area located around the display area, and the display panel also includes a non-display area A first barrier layer on the area and surrounding the edge of the display area, and a second barrier layer on the first barrier layer, wherein the second barrier layer includes at least two circles of first barrier walls, and the first barrier walls surround the periphery of the display area
  • the height of the barrier layer can be increased, and the number of barrier walls can be increased at the same time, thereby more effectively blocking the leakage of the film packaging material, and protecting the organic material in the display area from being corroded by water and oxygen, which is beneficial to improve the stability and extend your life.
  • FIG. 1 is a schematic top view of the structure of a display panel provided by an embodiment of the present application.
  • FIG. 2 is a schematic cross-sectional structural view taken along the line O-O' in FIG. 1;
  • FIG. 3 is another schematic top view of the structure of the display panel provided by the embodiment of the present application.
  • FIG. 4 is a schematic diagram of a cross-sectional structure taken along the line O-O' in FIG. 3;
  • FIG. 5 is another schematic structural diagram of a display panel provided by an embodiment of the present application.
  • FIG. 6 is a schematic flowchart of a manufacturing method of a display panel provided by an embodiment of the present application.
  • FIG. 7 is another schematic flow chart of the manufacturing method of the display panel provided by the embodiment of the present application.
  • FIG. 8 is a schematic structural diagram of a display device provided by an embodiment of the present application.
  • the present application provides a display panel, which optimizes the structure of the barrier layer surrounding the edge of the display area, increases the height of the barrier layer, and increases the number of barrier walls at the same time. It can more effectively block the leakage of the film packaging material, and protect the organic materials in the display area from being corroded by water and oxygen, which is beneficial to improve stability and extend life.
  • FIG. 1 is a schematic top view of a display panel provided by an embodiment of the present application
  • FIG. 2 is a schematic cross-sectional view taken along the line O-O' in FIG.
  • the display panel 10 includes a base substrate 11, and the base substrate 11 includes a display area C1 and a non-display area C2 located around the display area C1.
  • the display panel 10 further includes a first barrier layer 12 disposed on the non-display area C2 and surrounding the edge of the display area C1, and a second barrier layer 13 disposed on the first barrier layer 12.
  • the second barrier layer 13 includes at least two circles of first barrier walls 131/132, and the first barrier walls 131/132 are arranged around the display area C1.
  • the display panel in this embodiment is provided with a second barrier layer on the first barrier layer, and the second barrier layer includes at least two circles of first barriers surrounding the display area of the base substrate.
  • the wall can increase the height of the barrier layer and at the same time increase the number of barrier walls, thereby more effectively blocking the leakage of the film packaging material, and protecting the organic materials in the display area from being corroded by water and oxygen, which is beneficial to improve stability and extend life .
  • FIG. 3 is another schematic top view of the display panel provided by an embodiment of the present application
  • FIG. 4 is a schematic cross-sectional view taken along the line O-O' in FIG.
  • the display panel 20 includes a base substrate 21 that includes a display area C1 and a non-display area C2 located around the display area C1.
  • the display panel 20 further includes a first barrier layer 22 disposed on the non-display area C2 and surrounding the edge of the display area C1, and a second barrier layer 23 disposed on the first barrier layer 22.
  • the second barrier layer 23 includes at least two circles of first barrier walls 231/232/233/234, and the barrier walls 231/232/233/234 are arranged around the display area C1.
  • the base substrate 21 may be a glass substrate or a rigid resin substrate, and may also be a flexible substrate for preparing a flexible display panel.
  • the first barrier layer 22 and the second barrier layer 23 can be made of organic insulating materials such as polyimide and epoxy resin, or can be made of inorganic insulating materials such as SiNx and SiOx.
  • the display panel 20 further includes a thin film transistor array (not shown in the figure), a pixel 24, a thin film packaging structure 25, and a thin film packaging structure sequentially arranged on the display area C1 of the base substrate 21
  • the structure 25 includes a first inorganic layer 251, an organic layer 252, and a second inorganic layer 253 that are stacked, and the organic layer 252 is prepared by an inkjet printing device.
  • a first barrier layer 22 and a second barrier layer 23 are provided on the base substrate 21 at positions corresponding to the ink printing boundary to define the boundary of the organic layer 252 to avoid the problem of leakage of the organic layer 252 that cannot be shaped and flowed everywhere.
  • the first barrier layer 22 and the second barrier layer 23 can also block water and oxygen to protect the organic materials in the display area from being corroded by water and oxygen.
  • the first inorganic layer 251 covers the display area C1, and at least partially contacts the first and second barrier layers 22/23.
  • the organic layer 252 covers the display area C1, and its edge does not exceed the edge of the first inorganic layer 251.
  • the second inorganic layer 253 covers the first and second barrier layers 22/23 and the organic layer 252, and the edges thereof extend beyond the edges of the organic layer 252 to prevent water and oxygen from entering the display area C1.
  • the first barrier layer 22 includes at least one circle of second barrier walls, the second barrier walls are arranged around the edge of the display area C1, and multiple circles of second barrier walls are spaced apart on the base substrate 21.
  • the second barrier wall has different barrier areas.
  • the first barrier layer 22 includes two circles of second barrier walls, a first circle of second barrier walls 221 and a second circle of second barrier walls 222, the second circle of second barrier walls 222 surrounding The first ring of second barrier walls 221 are provided, the projection of the area blocked by the first ring of second barrier walls 221 on the base substrate 21 covers the display area C1, and the area blocked by the second ring of second barrier walls 222 is on the base substrate 21.
  • the upper projection covers the interval between the first circle of second blocking wall 221 and the second circle of second blocking wall 222.
  • the first barrier layer 22 may further include a third ring of second barrier walls (not shown in the figure), the third ring of second barrier walls are arranged around the second ring of second barrier walls 222, the third ring of second barrier walls
  • the projection of the area blocked by the barrier wall on the base substrate 21 covers the interval between the second ring of second barrier wall 222 and the third ring of second barrier wall, and so on.
  • At least one circle of first blocking walls is provided on each circle of second blocking walls.
  • at least two circles of first blocking walls are provided on each circle of second blocking walls, so that one circle of second blocking walls can achieve the effect of multiple blocking.
  • the first barrier layer 22 includes a first ring of second barrier walls 221 and a second ring of second barrier walls 222
  • the second barrier layer 23 includes a second barrier layer disposed on the first ring.
  • the original two barriers of the first barrier layer 22 are increased to four barriers after the second barrier layer 23 is provided, and the width of the barrier layer remains unchanged.
  • the height of the barrier layer is increased, which can more effectively block the leakage of the film packaging material and prevent the organic materials in the display area from being corroded by water and oxygen.
  • the first barrier layer 22 in order to pursue a high screen-to-body ratio of the display panel, only includes a circle of second barrier walls, and a second barrier layer 23 is provided on the second barrier wall.
  • the barrier layer 23 includes at least two circles of first barrier walls.
  • the plurality of circles of the first barrier wall may be spaced apart on the second barrier wall and have an interval width. the same.
  • the total width of at least two circles of the first barrier wall included in the second barrier layer 23 is not greater than the width of the first barrier layer 22, that is, by disposing the second barrier layer 22 on the first barrier layer 22.
  • the barrier layer 23 only increases the height of the barrier layer, but does not increase the width of the barrier layer.
  • the display panel 20 includes a base substrate 21, and a buffer layer 26, a metal layer 27, a first insulating layer 28, a pixel first electrode layer 241, a pixel defining layer 242, and a supporting pad (in the figure (Not shown), the pixel 24, the pixel second electrode layer 243, the first inorganic layer 251, the organic layer 252, and the second inorganic layer 253, wherein the first barrier layer 22 and the pixel defining layer 242 are arranged in the same layer and have the same material,
  • the second barrier layer 23 and the support pad are arranged in the same layer and have the same material, that is, the first barrier layer 22 and the pixel defining layer 242 can be formed by a patterning process, and the second barrier layer 23 and the support pad can be formed by a patterning process.
  • the pixel first electrode layer 241 is the pixel anode electrode layer
  • the pixel second electrode layer 243 is the pixel cathode electrode layer
  • the pixel defining layer 242 and the supporting pad can be made of inorganic insulating materials such as SiNx and SiOx.
  • the first barrier layer 22 includes a first ring of second barrier walls 221 and a second ring of second barrier walls 222 surrounding the first ring of second barrier walls 221, the second ring of second barrier walls
  • the height of the 222 relative to the base substrate 21 is greater than the height of the first ring of the second blocking wall 221 relative to the base substrate 21.
  • the metal layer 27, the first insulating layer 28 and the pixel first electrode layer 241 are in a patterned layer structure, and the buffer layer 26, the metal layer 27, the first insulating layer 28, and the pixel are sequentially arranged on the base substrate 21.
  • the metal layer 27, the first insulating layer 28, and the pixel first electrode layer 241 are stacked on the base substrate 21 to form a channel and protrusions located on both sides of the channel.
  • the second stop wall 221 is arranged in the channel, and the second stop wall 222 is arranged on the protrusion, so that the height of the second stop wall 222 of the second ring is higher than the height of the second stop wall 221 of the first ring, In this way, it is advantageous for the second ring of the second barrier wall 222 to buffer and further block the film packaging material overflowing the first ring of the second barrier wall 221.
  • the display panel in this embodiment is provided with a second barrier layer on the first barrier layer, and the second barrier layer includes at least two circles of first barriers surrounding the display area of the base substrate.
  • the wall can increase the height of the barrier layer and at the same time increase the number of barrier walls, thereby more effectively blocking the leakage of the film packaging material, and protecting the organic materials in the display area from being corroded by water and oxygen, which is beneficial to improve stability and extend life .
  • FIG. 6 is a schematic flowchart of a manufacturing method of a display panel provided by an embodiment of the present application.
  • the manufacturing method of the display panel includes the following steps:
  • S61 Provide a base substrate, the base substrate including a display area and a non-display area located around the display area.
  • the base substrate may be a glass substrate or a rigid resin substrate, and may also be a flexible substrate for preparing a flexible display panel.
  • S62 forming a first barrier layer surrounding the edge of the display area on the non-display area.
  • this step specifically includes the following sub-steps:
  • S621 sequentially forming a metal layer, a first insulating layer, and a pixel first electrode layer on the base substrate;
  • S622 A second insulating layer is formed on the first electrode layer of the pixel and the first insulating layer not covered by the first electrode layer of the pixel, and the second insulating layer is divided into blocks by exposure and etching, so as to be in the display area. Obtain the pixel defining layer, and obtain the first barrier layer in the non-display area.
  • the first barrier layer includes at least one circle of second barrier walls formed in the non-display area and surrounding the edge of the display area, and multiple circles of second barrier walls are formed at intervals on the base substrate.
  • the second barrier wall has different barrier areas.
  • the first barrier layer includes two circles of second barrier walls, namely, a first circle of second barrier walls and a second circle of second barrier walls.
  • the second circle of second barrier walls surrounds the first circle of second barrier walls.
  • the projection of the area blocked by the second barrier wall of a circle on the base substrate covers the display area, and the projection of the area blocked by the second barrier wall of the second circle on the base substrate covers the first circle of the second barrier wall and the second circle of the second barrier. The interval between the two barrier walls.
  • the first barrier layer may further include a third ring of second barrier walls, the third ring of second barrier walls are arranged around the second ring of second barrier walls, and the area blocked by the third ring of second barrier walls is on the base substrate.
  • the projection on covers the interval between the second barrier wall of the second circle and the second barrier wall of the third circle, and so on.
  • S63 Form a second barrier layer on the first barrier layer, where the second barrier layer includes at least two circles of first barrier walls, and the first barrier walls are arranged around the display area.
  • This step may specifically include:
  • S631 A third insulating layer is formed on the first barrier layer, and the third insulating layer is divided into blocks by exposure and etching to obtain a support pad in the display area and a second barrier layer in the non-display area.
  • At least one circle of first barrier walls is formed on each circle of second barrier walls of the first barrier layer.
  • at least two circles of first barrier walls are formed on each circle of second barrier walls, so that one circle of second barrier walls can achieve multiple blocking effects.
  • the multiple turns of first barrier walls may be spaced apart on the second barrier wall and have the same spacing width .
  • the total width of the at least two circles of the first barrier wall included in the second barrier layer is not greater than the width of the first barrier layer, that is, after the second barrier layer is formed on the first barrier layer , It will only increase the height of the barrier layer, but will not increase the width of the barrier layer.
  • the method for manufacturing the display panel further includes sequentially fabricating thin film transistors, pixels, and thin film packaging structures on the display area of the base substrate.
  • the thin film packaging structure includes a first inorganic layer and an organic layer that are stacked.
  • the second inorganic layer, the organic layer is prepared using inkjet printing equipment.
  • the first barrier layer and the second barrier layer are formed on the base substrate at positions corresponding to the ink printing boundary, and are used to define the boundary of the organic layer, so as to avoid the problem of leakage of the organic layer that cannot be shaped and flowed everywhere.
  • the first barrier layer and the second barrier layer can also block water and oxygen to protect the pixels from being corroded by water and oxygen.
  • the first inorganic layer covers the display area and at least partially contacts the first and second barrier layers.
  • the organic layer covers the display area, and its edge does not exceed the edge of the first inorganic layer.
  • the second inorganic layer covers the first and second barrier layers and the organic layer, and its edges extend beyond the edges of the organic layer to prevent water and oxygen from outside from intruding into the display area.
  • the manufacturing method of the display panel provided by the embodiment of the present application can be specifically implemented as the following steps:
  • S102 depositing a metal layer using a physical vapor deposition process; using exposure and etching processes to pattern the metal layer;
  • S103 using a coating process to fabricate the first insulating layer, and using an exposure and development process to pattern the first insulating layer;
  • S104 using a physical vapor deposition process to fabricate the pixel anode electrode, and using an exposure and etching process to divide the pixel anode electrode into blocks;
  • S105 using a chemical vapor deposition process to fabricate a second insulating layer, using exposure and etching processes to form a pixel defining layer in the display area, and forming a first barrier layer around the edge of the display area in the non-display area;
  • S106 using a chemical vapor deposition process to fabricate a third insulating layer, using exposure and etching processes to form a support pad in the display area, and forming a second barrier layer surrounding the display area in the non-display area;
  • an organic layer is formed by inkjet printing, the organic layer covers the display area and the edge of the organic layer does not exceed the edge of the first inorganic layer.
  • S109 forming a second inorganic layer by a chemical vapor deposition method, the second inorganic layer covers the organic layer, and the coverage area of the second inorganic layer is the same as that of the first inorganic layer.
  • the manufacturing method of the display panel in this embodiment is by forming a second barrier layer on the first barrier layer, and the second barrier layer includes at least two circles surrounding the display area of the base substrate.
  • the first barrier wall can increase the height of the barrier layer and at the same time increase the number of barrier walls, thereby more effectively blocking the leakage of the film packaging material, and protecting the organic material in the display area from being corroded by water and oxygen, which is beneficial to improve stability And prolong life.
  • an embodiment of the present application also provides a display device.
  • the display device 80 includes a driving circuit and any one of the above-mentioned display panels 81, wherein the driving circuit is used to provide a driving voltage to the display panel 81.
  • the display panel 81 includes a base substrate, and the base substrate includes a display area and a non-display area located around the display area.
  • the display panel further includes a first barrier layer disposed on the non-display area and surrounding the edge of the display area, and a second barrier layer disposed on the first barrier layer.
  • the second barrier layer includes at least two circles of first barrier walls, and the first barrier walls are arranged around the display area.
  • the display device provided by the present application is provided by providing a second barrier layer on the first barrier layer, and the second barrier layer includes at least two circles of first barrier walls surrounding the display area of the base substrate ,
  • the height of the barrier layer can be increased, and the number of barrier walls can be increased at the same time, thereby more effectively blocking the leakage of the film packaging material, and protecting the organic material in the display area from being corroded by water and oxygen, which is beneficial to improve stability and prolong life.

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Abstract

本申请涉及一种显示面板及其制作方法、显示装置，该显示面板包括：衬底基板，衬底基板包括显示区域以及位于显示区域周边的非显示区域；第一阻挡层，位于非显示区域上且环绕显示区域边缘设置；第二阻挡层，位于第一阻挡层上，其中，第二阻挡层包括至少两圈第一阻挡壁，第一阻挡壁环绕显示区域四周设置。

Description

[根据细则26改正21.05.2019]　一种显示面板及其制作方法、显示装置 技术领域
[0001] 本申请涉及显示面板技术领域，具体涉及一种显示面板及其制作方法、显示装置。
 背景技术
[0002] Active-matrix organic light emitting diode，简称AMOLED，也就是有源矩阵有机发光二极体面板。它具有自发光的特性，采用非常薄的有机材料涂层和玻璃基板，当有电流通过时，这些有机材料就会发光。AMOLED面板是自发光，不需要背光源，视角广，色饱和度高，尤其其驱动电压低且功耗低，加上反应快、重量轻、厚度薄，构造简单，成本低等，被视为最具前途的产品之一。
[0003] 目前，AMOLED显示技术已经成为众多消费者关注的技术，但OLED器件的失效现象一直困扰着很多研究者，OLED发光材料对氧气、水蒸气特别敏感，有机材料易受到氧气、水蒸气侵蚀最终失效，因此，AMOLED器件的寿命和稳定性仍然是AMOLED技术的关键问题。
 技术问题
[0004] 本申请的目的在于提供一种显示面板及其制作方法、显示装置，以更加有效地阻挡薄膜封装材料外漏，并保护显示区域内的有机材料不被水氧侵蚀，从而提高稳定性和延长寿命。
 技术解决方案
[0005] 为了解决上述问题，本申请实施例提供了一种显示面板，该显示面板包括：衬底基板，衬底基板包括显示区域以及位于显示区域四周的非显示区域；第一阻挡层，位于非显示区域上且环绕显示区域边缘设置；第二阻挡层，位于第一阻挡层上，其中，第二阻挡层包括至少两圈第一阻挡壁，第一阻挡壁环绕显示区域四周设置。
[0006] 进一步地，第一阻挡层包括至少一圈第二阻挡壁，第二阻挡壁环绕显示区域边缘设置，并且在每圈第二阻挡壁上设置有至少一圈第一阻挡壁。
[0007] 进一步地，第一阻挡层包括在非显示区域上间隔设置的第一圈第二阻挡壁和第二圈第二阻挡壁，第一圈第二阻挡壁环绕显示区域边缘设置，第二圈第二阻挡壁环绕第一圈第二阻挡壁设置，第二圈第二阻挡壁的高度高于第一圈第二阻挡壁的高度。
[0008] 进一步地，显示面板还包括在衬底基板上依次设置的金属层、第一绝缘层和像素第一电极层，金属层、第一绝缘层和像素第一电极层在衬底基板上堆叠形成沟道、以及位于沟道两侧的凸起部，其中，第一圈第二阻挡壁设置于沟道中，第二圈第二阻挡壁设置于凸起部上。
[0009] 进一步地，在第一圈第二阻挡壁上间隔设置有两圈第一阻挡壁，在第二圈第二阻挡壁上间隔设置有两圈第一阻挡壁。
[0010] 进一步地，显示面板还包括：在衬底基板上依次设置的金属层、第一绝缘层、像素第一电极层、像素界定层、以及支撑垫，其中，第一阻挡层与像素界定层同层同材料，第二阻挡层与支撑垫同层同材料。
[0011] 进一步地，至少两圈第一阻挡壁的总宽度小于第一阻挡层的宽度。
[0012] 进一步地，显示面板还包括在衬底基板的显示区域上依次设置的薄膜晶体管阵列、像素、以及薄膜封装结构，其中，薄膜封装结构包括层叠设置的第一无机层、有机层和第二无机层。
[0013] 为了解决上述问题，本申请实施例还提供了一种显示面板的制作方法，该显示面板的制作方法，包括：提供衬底基板，衬底基板包括显示区域以及位于显示区域四周的非显示区域；在非显示区域上形成环绕显示区域边缘的第一阻挡层；在第一阻挡层上形成第二阻挡层，其中，第二阻挡层包括至少两圈第一阻挡壁，第一阻挡壁环绕显示区域四周设置。
[0014] 进一步地，在非显示区域上形成环绕显示区域边缘的第一阻挡层的步骤，具体包括：在衬底基板上依次形成金属层、第一绝缘层和像素第一电极层，在像素第一电极层和未被像素第一电极层覆盖的第一绝缘层上形成第二绝缘层，通过曝光、蚀刻将第二绝缘层分割成块状，以在显示区域得到像素界定层，并在非显示区域得到第一阻挡层；在第一阻挡层上形成第二阻挡层的步骤，具体包括：在第一阻挡层上形成第三绝缘层，通过曝光、蚀刻将第三绝缘层分割成块状，以在显示区域得到支撑垫，并在非显示区域得到第二阻挡层。
[0015] 进一步地，第一阻挡层包括至少一圈第二阻挡壁，第二阻挡壁环绕显示区域边缘设置，并且在每圈第二阻挡壁上形成有至少一圈第一阻挡壁。
[0016] 进一步地，第一阻挡层包括在非显示区域上间隔设置的第一圈第二阻挡壁和第二圈第二阻挡壁，第一圈第二阻挡壁环绕显示区域边缘设置，第二圈第二阻挡壁环绕第一圈第二阻挡壁设置，第二圈第二阻挡壁的高度高于第一圈第二阻挡壁的高度。
[0017] 进一步地，在第一圈第二阻挡壁上间隔设置有两圈第一阻挡壁，在第二圈第二阻挡壁上间隔设置有两圈第一阻挡壁。
[0018] 为了解决上述问题，本申请实施例还提供了一种显示装置，该显示装置包括驱动电路和显示面板，驱动电路用于向显示面板提供驱动电压，其中，显示面板包括：衬底基板，衬底基板包括显示区域以及位于显示区域四周的非显示区域；第一阻挡层，位于非显示区域上且环绕显示区域边缘设置；第二阻挡层，位于第一阻挡层上，其中，第二阻挡层包括至少两圈第一阻挡壁，第一阻挡壁环绕显示区域四周设置。
[0019] 进一步地，第一阻挡层包括至少一圈第二阻挡壁，第二阻挡壁环绕显示区域边缘设置，并且在每圈第二阻挡壁上设置有至少一圈第一阻挡壁。
[0020] 进一步地，第一阻挡层包括在非显示区域上间隔设置的第一圈第二阻挡壁和第二圈第二阻挡壁，第一圈第二阻挡壁环绕显示区域边缘设置，第二圈第二阻挡壁环绕第一圈第二阻挡壁设置，第二圈第二阻挡壁的高度高于第一圈第二阻挡壁的高度。
[0021] 进一步地，显示面板还包括在衬底基板上依次设置的金属层、第一绝缘层和像素第一电极层，金属层、第一绝缘层和像素第一电极层在衬底基板上堆叠形成沟道、以及位于沟道两侧的凸起部，其中，第一圈第二阻挡壁设置于沟道中，第二圈第二阻挡壁设置于凸起部上。
[0022] 进一步地，在第一圈第二阻挡壁上间隔设置有两圈第一阻挡壁，在第二圈第二阻挡壁上间隔设置有两圈第一阻挡壁。
[0023] 进一步地，显示面板还包括在衬底基板上依次设置的金属层、第一绝缘层、像素第一电极层、像素界定层、以及支撑垫，其中，第一阻挡层与像素界定层同层同材料，第二阻挡层与支撑垫同层同材料。
[0024] 进一步地，至少两圈第一阻挡壁的总宽度小于第一阻挡层的宽度。
 有益效果
[0025] 本申请的有益效果是：区别于现有技术，本申请提供的显示面板包括衬底基板，衬底基板包括显示区域以及位于显示区域四周的非显示区域，显示面板还包括位于非显示区域上且环绕显示区域边缘设置的第一阻挡层、以及位于第一阻挡层上的第二阻挡层，其中，第二阻挡层包括至少两圈第一阻挡壁，第一阻挡壁环绕显示区域四周设置，如此，可以增加阻挡层的高度，并同时增加阻挡壁的数量，进而更加有效地阻挡薄膜封装材料外漏，并保护显示区域内的有机材料不被水氧侵蚀，有利于提高稳定性和延长寿命。
 附图说明
[0026] 为了更清楚地说明本申请实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
[0027] 图1是本申请实施例提供的显示面板的俯视结构示意图；
[0028] 图2是沿图1中的线O-O’截取的横截面结构示意图；
[0029] 图3是本申请实施例提供的显示面板的另一俯视结构示意图；
[0030] 图4是沿图3中的线O-O’截取的横截面结构示意图；
[0031] 图5是本申请实施例提供的显示面板的又一结构示意图；
[0032] 图6是本申请实施例提供的显示面板的制作方法的一流程示意图；
[0033] 图7是本申请实施例提供的显示面板的制作方法的又一流程示意图；
[0034] 图8是本申请实施例提供的显示装置的结构示意图。
 本发明的实施方式
[0035] 下面结合附图和实施例，对本申请作进一步的详细描述。特别指出的是，以下实施例仅用于说明本申请，但不对本申请的范围进行限定。同样的，以下实施例仅为本申请的部分实施例而非全部实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其它实施例，都属于本申请保护的范围。
[0036] 为了进一步提高器件的寿命和稳定性，本申请提供一种显示面板，对环绕显示区域边缘的阻挡层的结构进行优化设计，增加阻挡层的高度，并同时增加阻挡壁的数量，能够更加有效地阻挡薄膜封装材料外漏，并保护显示区域内的有机材料不被水氧侵蚀，有利于提高稳定性和延长寿命。
[0037] 请参阅图1和图2，图1是本申请实施例提供的显示面板的俯视结构示意图，图2是沿图1中的线O-O’截取的横截面结构示意图。该显示面板10包括衬底基板11，衬底基板11包括显示区域C1以及位于显示区域C1四周的非显示区域C2。该显示面板10还包括位于非显示区域C2上且环绕显示区域C1边缘设置的第一阻挡层12、以及设置于第一阻挡层12上的第二阻挡层13。在本实施例中，第二阻挡层13包括至少两圈第一阻挡壁131/132，第一阻挡壁131/132环绕显示区域C1四周设置。
[0038] 区别于现有技术，本实施例中的显示面板，通过在第一阻挡层上设置第二阻挡层，并且第二阻挡层包括至少两圈环绕衬底基板显示区域四周的第一阻挡壁，可以增加阻挡层的高度，并同时增加阻挡壁的数量，进而更加有效地阻挡薄膜封装材料外漏，并保护显示区域内的有机材料不被水氧侵蚀，有利于提高稳定性和延长寿命。
[0039] 请参阅图3和图4，图3是本申请实施例提供的显示面板的另一俯视结构示意图，图4是沿图3中的线O-O’截取的横截面结构示意图。该显示面板20包括衬底基板21，衬底基板21包括显示区域C1以及位于显示区域C1四周的非显示区域C2。该显示面板20还包括位于非显示区域C2上且环绕显示区域C1边缘设置的第一阻挡层22、以及设置于第一阻挡层22上的第二阻挡层23。其中，第二阻挡层23包括至少两圈第一阻挡壁231/232/233/234，阻挡壁231/232/233/234环绕显示区域C1四周设置。
[0040] 在本实施例中，衬底基板21可以为玻璃基板或者硬质的树脂基板，也可以为用于制备柔性显示面板的柔性基板。第一阻挡层22和第二阻挡层23可以为聚酰亚胺、环氧树脂等有机绝缘材质，也可以为SiNx、SiOx等无机绝缘材质。
[0041] 具体地，请参阅图5，显示面板20还包括在衬底基板21的显示区域C1上依次设置的薄膜晶体管阵列（图中未示出）、像素24、薄膜封装结构25，薄膜封装结25构包括层叠设置的第一无机层251、有机层252和第二无机层253，有机层252采用喷墨打印设备进行制备。在衬底基板21上对应墨水打印边界的位置设置第一阻挡层22和第二阻挡层23，用于限定有机层252的边界，以避免有机层252不能定型、随处流动而出现外漏的问题，同时第一阻挡层22和第二阻挡层23还能阻隔水氧，以保护显示区域内的有机材料不被水氧侵蚀。
[0042] 其中，第一无机层251覆盖显示区域C1，且至少与第一、第二阻挡层22/23部分相接触。有机层252覆盖显示区域C1，且其边缘不超出第一无机层251的边缘。第二无机层253覆盖第一、第二阻挡层22/23以及有机层252，且其边缘超出有机层252的边缘，用以阻挡外界的水氧侵入所述显示区域C1中。
[0043] 进一步地，第一阻挡层22包括至少一圈第二阻挡壁，所述第二阻挡壁环绕显示区域C1边缘设置，多圈第二阻挡壁在衬底基板21上间隔设置，不同的第二阻挡壁具有不同的阻挡区域。例如，如图4所示，第一阻挡层22包括两圈第二阻挡壁，分别为第一圈第二阻挡壁221和第二圈第二阻挡壁222，第二圈第二阻挡壁222环绕第一圈第二阻挡壁221设置，第一圈第二阻挡壁221阻挡的区域在衬底基板21上的投影覆盖显示区域C1，第二圈第二阻挡壁222阻挡的区域在衬底基板21上的投影覆盖第一圈第二阻挡壁221和第二圈第二阻挡壁222之间的间隔。依次类推，第一阻挡层22还可以进一步包括第三圈第二阻挡壁（图中未示出），第三圈第二阻挡壁环绕第二圈第二阻挡壁222设置，第三圈第二阻挡壁阻挡的区域在衬底基板21上的投影覆盖第二圈第二阻挡壁222和第三圈第二阻挡壁之间的间隔，等等。
[0044] 其中，第一阻挡层22包括的第二阻挡壁越多，对薄膜封装材料以及水氧的阻挡效果越好，但第二阻挡壁的数量越多意味着非显示区域对应的显示面板边框宽度越大，不利于提高显示面板的屏占比。
[0045] 在本实施例中，在每一圈第二阻挡壁上设置有至少一圈第一阻挡壁。例如，在每一圈第二阻挡壁上设置有至少两圈第一阻挡壁，从而使得一圈第二阻挡壁能够实现多道阻挡的效果。
[0046] 例如，继续参阅图3和图4，第一阻挡层22包括第一圈第二阻挡壁221和第二圈第二阻挡壁222，第二阻挡层23包括设置于第一圈第二阻挡壁221上的第一圈第一阻挡壁231和第二圈第一阻挡壁232、以及设置于第二圈第二阻挡壁222上的第三圈第一阻挡壁233和第四圈第一阻挡壁234。如此，通过在第一阻挡层22上设置第二阻挡层23，将原来第一阻挡层22的两道阻挡增加至了设置第二阻挡层23之后的四道阻挡，阻挡层的宽度不变，并同时增加了阻挡层的高度，能够更加有效地阻挡薄膜封装材料外漏以及防止显示区域内的有机材料被水氧侵蚀。
[0047] 在一些实施例中，为了追求显示面板的高屏占比，第一阻挡层22只包括一圈第二阻挡壁，并在该第二阻挡壁上设置第二阻挡层23，第二阻挡层23包括至少两圈第一阻挡壁，如此，虽然第一阻挡层22包括的第二阻挡壁的数量变少了，但通过在第一阻挡层22上设置第二阻挡层23，第二阻挡层23包括至少两圈第一阻挡壁，也能实现多道阻挡的效果。
[0048] 其中，当第一阻挡层22的一圈第二阻挡壁上设置有多圈第一阻挡壁时，所述多圈第一阻挡壁可以在该第二阻挡壁上间隔分布且间隔宽度相同。
[0049] 在一个具体实施例中，第二阻挡层23包括的至少两圈第一阻挡壁的总宽度不大于第一阻挡层22的宽度，即，通过在第一阻挡层22上设置第二阻挡层23，只会增加阻挡层的高度，并不会增加阻挡层的宽度。
[0050] 继续参阅图5，下面将结合显示面板的具体结构对本实施例作详细说明。显示面板20包括衬底基板21，以及在衬底基板21上依次设置的缓冲层26、金属层27、第一绝缘层28、像素第一电极层241、像素界定层242、支撑垫（图中未示出）、像素24、像素第二电极层243、第一无机层251、有机层252、第二无机层253，其中，第一阻挡层22与像素界定层242同层设置且材料相同，第二阻挡层23与支撑垫同层设置且材料相同，即，第一阻挡层22与像素界定层242可以通过一次构图工艺形成，第二阻挡层23与支撑垫可以通过一次构图工艺形成。
[0051] 在本实施例中，像素第一电极层241为像素阳极电极层，像素第二电极层243为像素阴极电极层，像素界定层242和支撑垫可以为SiNx、SiOx等无机绝缘材质。
[0052] 在一个实施例中，第一阻挡层22包括第一圈第二阻挡壁221和环绕第一圈第二阻挡壁221的第二圈第二阻挡壁222，第二圈第二阻挡壁222相对于衬底基板21的高度大于第一圈第二阻挡壁221相对衬底基板21的高度。具体地，金属层27、第一绝缘层28和像素第一电极层241为图案化的层结构，在衬底基板21上依次设置缓冲层26、金属层27、第一绝缘层28、以及像素第一电极层241后，金属层27、第一绝缘层28和像素第一电极层241会在衬底基板21上堆叠形成沟道、以及位于沟道两侧的凸起部，其中，第一圈第二阻挡壁221设置于沟道中，第二圈第二阻挡壁222设置于凸起部上，从而第二圈第二阻挡壁222的高度高于第一圈第二阻挡壁221的高度，如此，有利于第二圈第二阻挡壁222对溢出第一圈第二阻挡壁221的薄膜封装材料进行缓冲和进一步地阻挡。
[0053] 区别于现有技术，本实施例中的显示面板，通过在第一阻挡层上设置第二阻挡层，并且第二阻挡层包括至少两圈环绕衬底基板显示区域四周的第一阻挡壁，可以增加阻挡层的高度，并同时增加阻挡壁的数量，进而更加有效地阻挡薄膜封装材料外漏，并保护显示区域内的有机材料不被水氧侵蚀，有利于提高稳定性和延长寿命。
[0054] 请参阅图6，图6是本申请实施例提供的显示面板的制作方法的流程示意图。该显示面板的制作方法包括以下步骤：
[0055] S61：提供衬底基板，衬底基板包括显示区域以及位于显示区域四周的非显示区域。
[0056] 在本实施例中，衬底基板可以为玻璃基板或者硬质的树脂基板，也可以为用于制备柔性显示面板的柔性基板。
[0057] S62：在非显示区域上形成环绕显示区域边缘的第一阻挡层。
[0058] 请参阅图7，该步骤具体包括以下子步骤：
[0059] S621：在衬底基板上依次形成金属层、第一绝缘层和像素第一电极层；
[0060] S622：在像素第一电极层和未被像素第一电极层覆盖的第一绝缘层上形成第二绝缘层，通过曝光、蚀刻将第二绝缘层分割成块状，以在显示区域得到像素界定层，并在非显示区域得到第一阻挡层。
[0061] 其中，第一阻挡层包括至少一圈第二阻挡壁，所述第二阻挡壁形成于非显示区域且环绕显示区域边缘，多圈第二阻挡壁在衬底基板上间隔形成，不同的第二阻挡壁具有不同的阻挡区域。例如，第一阻挡层包括两圈第二阻挡壁，分别为第一圈第二阻挡壁和第二圈第二阻挡壁，第二圈第二阻挡壁环绕第一圈第二阻挡壁设置，第一圈第二阻挡壁阻挡的区域在衬底基板上的投影覆盖显示区域，第二圈第二阻挡壁阻挡的区域在衬底基板上的投影覆盖第一圈第二阻挡壁和第二圈第二阻挡壁之间的间隔。依次类推，第一阻挡层还可以进一步包括第三圈第二阻挡壁，第三圈第二阻挡壁环绕第二圈第二阻挡壁设置，第三圈第二阻挡壁阻挡的区域在衬底基板上的投影覆盖第二圈第二阻挡壁和第三圈第二阻挡壁之间的间隔，等等。
[0062] S63：在第一阻挡层上形成第二阻挡层，其中，第二阻挡层包括至少两圈第一阻挡壁，第一阻挡壁环绕显示区域四周设置。
[0063] 该步骤具体可以包括：
[0064] S631：在第一阻挡层上形成第三绝缘层，通过曝光、蚀刻将第三绝缘层分割成块状，以在显示区域得到支撑垫，并在非显示区域得到第二阻挡层。
[0065] 在本实施例中，在第一阻挡层的每一圈第二阻挡壁上形成有至少一圈第一阻挡壁。例如，在每一圈第二阻挡壁上形成有至少两圈第一阻挡壁，从而使得一圈第二阻挡壁能够实现多道阻挡的效果。
[0066] 其中，当第一阻挡层的一圈第二阻挡壁上形成有多圈第一阻挡壁时，所述多圈第一阻挡壁可以在该第二阻挡壁上间隔分布且间隔宽度相同。
[0067] 在一个具体实施例中，上述第二阻挡层包括的至少两圈第一阻挡壁的总宽度不大于第一阻挡层的宽度，即，在第一阻挡层上形成第二阻挡层后，只会增加阻挡层的高度，并不会增加阻挡层的宽度。
[0068] 在上述实施例中，该显示面板的制作方法还包括在衬底基板的显示区域上依次制作薄膜晶体管、像素、薄膜封装结构，薄膜封装结构包括层叠设置的第一无机层、有机层和第二无机层，有机层采用喷墨打印设备进行制备。其中，第一阻挡层和第二阻挡层形成于衬底基板上对应墨水打印边界的位置，用于限定有机层的边界，以避免有机层不能定型、随处流动而出现外漏的问题，同时第一阻挡层和第二阻挡层还能阻隔水氧，以保护像素不被水氧侵蚀。
[0069] 具体地，第一无机层覆盖显示区域，且至少与第一、第二阻挡层部分相接触。有机层覆盖显示区域，且其边缘不超出第一无机层的边缘。第二无机层覆盖第一、第二阻挡层以及有机层，且其边缘超出有机层的边缘，用以阻挡外界的水氧侵入所述显示区域中。
[0070] 举例而言，本申请实施例提供的显示面板的制作方法可以被具体实施为以下步骤：
[0071] S101，利用化学气相沉积工艺在衬底基板上生长SiNx/SiOx缓冲层；
[0072] S102，利用物理气相沉积工艺沉积金属层；利用曝光、蚀刻工艺将金属层图形化；
[0073] S103，利用涂布工艺制作第一绝缘层，利用曝光显影工艺将第一绝缘层图形化；
[0074] S104，利用物理气相沉积工艺制作像素阳极电极，使用曝光、蚀刻工艺将像素阳极电极分割成块状；
[0075] S105，利用化学气相沉积工艺制作第二绝缘层，利用曝光、蚀刻工艺在显示区域形成像素界定层，并在非显示区域形成环绕显示区域边缘的第一阻挡层；
[0076] S106，利用化学气相沉积工艺制作第三绝缘层，利用曝光、蚀刻工艺在显示区域形成支撑垫，并在非显示区域形成环绕显示区域四周的第二阻挡层；
[0077] S107，通过原子层沉积或者化学气相沉积工艺形成第一无机层，使得第一无机层覆盖显示区域以及至少部分第一阻挡层和第二阻挡层；
[0078] S108，通过喷墨打印的方式形成有机层，有机层覆盖显示区域且其边缘不超过第一无机层的边缘。
[0079] S109，通过化学气相沉积法形成第二无机层，第二无机层覆盖有机层，第二无机层与第一无机层的覆盖区域相同。
[0080] 区别于现有技术，本实施例中的显示面板的制作方法，通过在第一阻挡层上形成第二阻挡层，并且第二阻挡层包括至少两圈环绕衬底基板显示区域四周的第一阻挡壁，可以增加阻挡层的高度，并同时增加阻挡壁的数量，进而更加有效地阻挡薄膜封装材料外漏，并保护显示区域内的有机材料不被水氧侵蚀，有利于提高稳定性和延长寿命。
[0081] 请参阅图8，本申请实施例还提供了一种显示装置，该显示装置80包括驱动电路和上述任一项显示面板81，其中，驱动电路用于向显示面板81提供驱动电压。
[0082] 显示面板81包括衬底基板，衬底基板包括显示区域以及位于显示区域四周的非显示区域。该显示面板还包括位于非显示区域上且环绕显示区域边缘设置的第一阻挡层、以及设置于第一阻挡层上的第二阻挡层。其中，第二阻挡层包括至少两圈第一阻挡壁，第一阻挡壁环绕显示区域四周设置。
[0083] 区别于现有技术，本申请提供的显示装置，通过在第一阻挡层上设置第二阻挡层，并且第二阻挡层包括至少两圈环绕衬底基板显示区域四周的第一阻挡壁，可以增加阻挡层的高度，并同时增加阻挡壁的数量，进而更加有效地阻挡薄膜封装材料外漏，并保护显示区域内的有机材料不被水氧侵蚀，有利于提高稳定性和延长寿命。
[0084] 以上所述仅为本发明的较佳实施例而已，并不用以限制本发明，凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等，均应包含在本发明的保护范围之内。

Claims (20)

  1. 一种显示面板，其包括：
    衬底基板，所述衬底基板包括显示区域以及位于所述显示区域四周的非显示区域；
    第一阻挡层，位于所述非显示区域上且环绕所述显示区域边缘设置；
    第二阻挡层，位于所述第一阻挡层上，其中，所述第二阻挡层包括至少两圈第一阻挡壁，所述第一阻挡壁环绕所述显示区域四周设置。
  2. 根据权利要求1所述的显示面板，其中，所述第一阻挡层包括至少一圈第二阻挡壁，所述第二阻挡壁环绕所述显示区域边缘设置，并且在每圈所述第二阻挡壁上设置有至少一圈所述第一阻挡壁。
  3. 根据权利要求2所述的显示面板，其中，所述第一阻挡层包括在所述非显示区域上间隔设置的第一圈第二阻挡壁和第二圈第二阻挡壁，所述第一圈第二阻挡壁环绕所述显示区域边缘设置，所述第二圈第二阻挡壁环绕所述第一圈第二阻挡壁设置，所述第二圈第二阻挡壁的高度高于所述第一圈第二阻挡壁的高度。
  4. 根据权利要求3所述的显示面板，其中，所述显示面板还包括：
    在所述衬底基板上依次设置的金属层、第一绝缘层和像素第一电极层，所述金属层、所述第一绝缘层和所述像素第一电极层在所述衬底基板上堆叠形成沟道、以及位于所述沟道两侧的凸起部，其中，所述第一圈第二阻挡壁设置于所述沟道中，所述第二圈第二阻挡壁设置于所述凸起部上。
  5. 根据权利要求3所述的显示面板，其中，在所述第一圈第二阻挡壁上间隔设置有两圈第一阻挡壁，在所述第二圈第二阻挡壁上间隔设置有两圈所述第一阻挡壁。
  6. 根据权利要求1所述的显示面板，其中，所述显示面板还包括：
    在所述衬底基板上依次设置的金属层、第一绝缘层、像素第一电极层、像素界定层、以及支撑垫，
    其中，所述第一阻挡层与所述像素界定层同层同材料，所述第二阻挡层与所述支撑垫同层同材料。
  7. 根据权利要求1所述的显示面板，其中，所述至少两圈第一阻挡壁的总宽度小于所述第一阻挡层的宽度。
  8. 根据权利要求1所述的显示面板，其中，所述显示面板还包括在所述衬底基板的所述显示区域上依次设置的薄膜晶体管阵列、像素、以及薄膜封装结构，其中，所述薄膜封装结构包括层叠设置的第一无机层、有机层和第二无机层。
  9. 一种显示面板的制作方法，其包括：
    提供衬底基板，所述衬底基板包括显示区域以及位于所述显示区域四周的非显示区域；
    在所述非显示区域上形成环绕所述显示区域边缘的第一阻挡层；
    在所述第一阻挡层上形成第二阻挡层，其中，所述第二阻挡层包括至少两圈第一阻挡壁，所述第一阻挡壁环绕所述显示区域四周设置。
  10. 根据权利要求9所述的制作方法，其中，所述在所述非显示区域上形成环绕所述显示区域边缘的第一阻挡层的步骤，具体包括：
    在所述衬底基板上依次形成金属层、第一绝缘层和像素第一电极层；
    在所述像素第一电极层和未被所述像素第一电极层覆盖的所述第一绝缘层上形成第二绝缘层，通过曝光、蚀刻将所述第二绝缘层分割成块状，以在所述显示区域得到像素界定层，并在所述非显示区域得到所述第一阻挡层；
    所述在所述第一阻挡层上形成第二阻挡层的步骤，具体包括：
    在所述第一阻挡层上形成第三绝缘层，通过曝光、蚀刻将所述第三绝缘层分割成块状，以在所述显示区域得到支撑垫，并在所述非显示区域得到所述第二阻挡层。
  11. 根据权利要求9所述的制作方法，其中，所述第一阻挡层包括至少一圈第二阻挡壁，所述第二阻挡壁环绕所述显示区域边缘设置，并且在每圈所述第二阻挡壁上形成有至少一圈所述第一阻挡壁。
  12. 根据权利要求11所述的制作方法，其中，所述第一阻挡层包括在所述非显示区域上间隔设置的第一圈第二阻挡壁和第二圈第二阻挡壁，所述第一圈第二阻挡壁环绕所述显示区域边缘设置，所述第二圈第二阻挡壁环绕所述第一圈第二阻挡壁设置，所述第二圈第二阻挡壁的高度高于所述第一圈第二阻挡壁的高度。
  13. 根据权利要求12所述的制作方法，其中，在所述第一圈第二阻挡壁上间隔设置有两圈第一阻挡壁，在所述第二圈第二阻挡壁上间隔设置有两圈所述第一阻挡壁。
  14. 一种显示装置，其包括驱动电路和显示面板，所述驱动电路用于向所述显示面板提供驱动电压，
    其中，所述显示面板包括：
    衬底基板，所述衬底基板包括显示区域以及位于所述显示区域四周的非显示区域；
    第一阻挡层，位于所述非显示区域上且环绕所述显示区域边缘设置；
    第二阻挡层，位于所述第一阻挡层上，其中，所述第二阻挡层包括至少两圈第一阻挡壁，所述第一阻挡壁环绕所述显示区域四周设置。
  15. 根据权利要求14所述的显示装置，其中，所述第一阻挡层包括至少一圈第二阻挡壁，所述第二阻挡壁环绕所述显示区域边缘设置，并且在每圈所述第二阻挡壁上设置有至少一圈所述第一阻挡壁。
  16. 根据权利要求15所述的显示装置，其中，所述第一阻挡层包括在所述非显示区域上间隔设置的第一圈第二阻挡壁和第二圈第二阻挡壁，所述第一圈第二阻挡壁环绕所述显示区域边缘设置，所述第二圈第二阻挡壁环绕所述第一圈第二阻挡壁设置，所述第二圈第二阻挡壁的高度高于所述第一圈第二阻挡壁的高度。
  17. 根据权利要求16所述的显示装置，其中，所述显示面板还包括在所述衬底基板上依次设置的金属层、第一绝缘层和像素第一电极层，所述金属层、所述第一绝缘层和所述像素第一电极层在所述衬底基板上堆叠形成沟道、以及位于所述沟道两侧的凸起部，其中，所述第一圈第二阻挡壁设置于所述沟道中，所述第二圈第二阻挡壁设置于所述凸起部上。
  18. 根据权利要求16所述的显示装置，其中，在所述第一圈第二阻挡壁上间隔设置有两圈第一阻挡壁，在所述第二圈第二阻挡壁上间隔设置有两圈所述第一阻挡壁。
  19. 根据权利要求14所述的显示装置，其中，所述显示面板还包括在所述衬底基板上依次设置的金属层、第一绝缘层、像素第一电极层、像素界定层、以及支撑垫，其中，所述第一阻挡层与所述像素界定层同层同材料，所述第二阻挡层与所述支撑垫同层同材料。
  20. 根据权利要求14所述的显示装置，其中，所述至少两圈第一阻挡壁的总宽度小于所述第一阻挡层的宽度。
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CN110492016B (zh) * 2019-07-30 2020-10-27 武汉华星光电半导体显示技术有限公司 阵列基板及显示面板
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CN107046105A (zh) * 2017-06-08 2017-08-15 京东方科技集团股份有限公司 Oled显示基板、制作方法、封装结构及显示装置
CN108962953A (zh) * 2018-07-20 2018-12-07 武汉华星光电半导体显示技术有限公司 Oled显示面板及oled显示器

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